TW202029486A - Cmos phtosensitive unit, protection glass module thereof and manufaturing method of the same - Google Patents
Cmos phtosensitive unit, protection glass module thereof and manufaturing method of the same Download PDFInfo
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本發明是關於一種能在防護玻璃上準確形成遮光圈的互補式金屬氧化物半導體感光元件、其所用的防護玻璃模組及該防護玻璃模組的製法。The invention relates to a complementary metal oxide semiconductor photosensitive element capable of accurately forming a light-shielding ring on a protective glass, a protective glass module used in the protective glass module, and a manufacturing method of the protective glass module.
互補式金屬氧化物半導體(以下簡稱CMOS)被廣泛使用在感光元件中,進而被應用在手機、車載鏡頭等領域。Complementary metal oxide semiconductors (hereinafter referred to as CMOS) are widely used in photosensitive elements, and then applied in mobile phones, car lenses and other fields.
此類CMOS感光元件常見的問題在於,當CMOS感光元件從陰暗處瞬間進入光亮處時(例如出入隧道時),CMOS容易產生雜訊。為了解決這樣的問題,目前有人提出將鉬、鉻等黑色金屬蒸鍍在CMOS感光元件的防護玻璃上,後續再透過塗布抗蝕劑、抗蝕劑圖形化、將前述黑色金屬加以蝕刻、最後將抗蝕劑加以剝離的製程,在防護玻璃上形成一遮光圈,藉此減少CMOS感光元件產生雜訊的情形。The common problem with this type of CMOS sensor is that when the CMOS sensor enters a bright place from a dark place instantaneously (such as when entering or exiting a tunnel), CMOS is prone to noise. In order to solve this problem, it has been proposed to vapor-deposit ferrous metals such as molybdenum and chromium on the cover glass of CMOS photosensitive elements, and then apply resist, pattern the resist, and etch the aforementioned ferrous metal. The resist stripping process forms a light-shielding ring on the cover glass, thereby reducing the noise generated by the CMOS sensor.
然而,前述製程有其缺陷在於,為了避免防護玻璃上留有蝕刻殘留物,且為了形成邊緣整齊的遮光圈,防護玻璃必須被長時間浸漬在蝕刻液中,而這導致防護玻璃表面易被一併蝕刻,造成後續產生反射光斑,且會降低解析度。However, the aforementioned manufacturing process has its drawbacks in that, in order to avoid leaving etching residues on the protective glass and to form a neatly-edged light-shielding ring, the protective glass must be immersed in the etching solution for a long time, which causes the surface of the protective glass to be easily damaged. And etching, causing subsequent reflection spots, and will reduce the resolution.
另有人提出使用特製的鋼板將遮光圈印刷在防護玻璃的製程,但此法容易衍生防護玻璃被鋼板刮傷,且為了維持印刷的精準度,鋼板每使用十至二十次就必須要做替換。Others have proposed to use a special steel plate to print the light-shielding ring on the protective glass process, but this method is likely to cause the protective glass to be scratched by the steel plate, and in order to maintain the printing accuracy, the steel plate must be replaced every ten to twenty times. .
有鑑於此,如何解決前述問題,實有待本領域技術人員思量。In view of this, how to solve the aforementioned problems really needs to be considered by those skilled in the art.
本發明之主要目的在於提供一種能在防護玻璃上準確形成遮光圈的互補式金屬氧化物半導體感光元件、其所用的防護玻璃模組及該防護玻璃模組的製法。The main purpose of the present invention is to provide a complementary metal oxide semiconductor photosensitive element capable of accurately forming a light-shielding ring on a protective glass, a protective glass module used therefor, and a manufacturing method of the protective glass module.
為了達成上述及其他目的,本發明提供一種互補式金屬氧化物半導體感光元件,其包括一斗狀的殼體、一互補式金屬氧化物半導體感光晶片、一防護玻璃及一遮光乾膜圈,該殼體具有一開口部,該互補式金屬氧化物半導體感光晶片設於該殼體內,該防護玻璃密封該殼體的開口部,且該防護玻璃具有一光入射面,該遮光乾膜圈設於該防護玻璃的光入射面,且該遮光乾膜圈中界定一光學區,該光學區正對該互補式金屬氧化物半導體感光晶片。In order to achieve the above and other objectives, the present invention provides a complementary metal oxide semiconductor photosensitive element, which includes a bucket-shaped housing, a complementary metal oxide semiconductor photosensitive chip, a cover glass and a light-shielding dry film ring. The casing has an opening, the complementary metal oxide semiconductor photosensitive chip is disposed in the casing, the cover glass seals the opening of the casing, and the cover glass has a light incident surface, and the light-shielding dry film ring is disposed at The light incident surface of the protective glass and the light-shielding dry film ring define an optical zone, and the optical zone faces the complementary metal oxide semiconductor photosensitive chip.
為了達成上述及其他目的,本發明提供一種用於互補式金屬氧化物半導體感光元件的防護玻璃模組,該互補式金屬氧化物半導體感光元件包括一斗狀的殼體及一互補式金屬氧化物半導體感光晶片設於該殼體內,該防護玻璃模組包括一防護玻璃及一遮光乾膜圈,該防護玻璃具有一光入射面,該遮光乾膜圈設於該防護玻璃的光入射面,且該遮光乾膜圈中界定一光學區,該光學區用以正對該互補式金屬氧化物半導體感光晶片。In order to achieve the above and other objectives, the present invention provides a protective glass module for a complementary metal oxide semiconductor photosensitive element. The complementary metal oxide semiconductor photosensitive element includes a bucket-shaped housing and a complementary metal oxide The semiconductor photosensitive chip is arranged in the housing, the protective glass module includes a protective glass and a light-shielding dry film ring, the protective glass has a light incident surface, and the light-shielding dry film ring is arranged on the light incident surface of the protective glass, and The light-shielding dry film ring defines an optical zone, and the optical zone is used to face the complementary metal oxide semiconductor photosensitive chip.
為了達成上述及其他目的,本發明提供一種用於互補式金屬氧化物半導體感光元件的防護玻璃模組的製法,該互補式金屬氧化物半導體感光元件包括一斗狀的殼體及一互補式金屬氧化物半導體感光晶片設於該殼體內,該製法包括:A)在一載體膜上塗布一遮光乾膜漿料;B)將載體膜上的遮光乾膜漿料乾燥為遮光乾膜層;C)將載體膜上的遮光乾膜層層合於一防護玻璃的一光入射面;以及D)移除遮光乾膜層的一部份,使遮光乾膜層界定一光學區,該光學區用以正對該互補式金屬氧化物半導體感光晶片。In order to achieve the above and other objectives, the present invention provides a method for manufacturing a protective glass module for a complementary metal oxide semiconductor photosensitive element. The complementary metal oxide semiconductor photosensitive element includes a bucket-shaped housing and a complementary metal. The oxide semiconductor photosensitive wafer is arranged in the housing, and the manufacturing method includes: A) coating a light-shielding dry film slurry on a carrier film; B) drying the light-shielding dry film slurry on the carrier film into a light-shielding dry film layer; C ) Laminating the light-shielding dry film layer on the carrier film on a light incident surface of a protective glass; and D) Remove part of the light-shielding dry film layer so that the light-shielding dry film layer defines an optical zone, which is used for To face the complementary metal oxide semiconductor photosensitive wafer.
藉由上述設計,本發明提出一種具有遮光乾膜圈的互補式金屬氧化物半導體感光元件,其遮光乾膜圈容易成型,且不易損傷防護玻璃表面。With the above design, the present invention proposes a complementary metal oxide semiconductor photosensitive element with a light-shielding dry film ring. The light-shielding dry film ring is easy to shape and does not easily damage the surface of the protective glass.
第1圖為本發明防護玻璃模組其中一實施例的構成說明圖,其中第1(a)圖是防護玻璃模組1的平面圖,第1(b)圖是其縱剖面示意圖。第2圖則為本發明互補式金屬氧化物半導體感光元件其中一實施例的縱剖面示意圖。Fig. 1 is an explanatory diagram of the structure of one embodiment of the cover glass module of the present invention, wherein Fig. 1(a) is a plan view of the
防護玻璃模組1包括一防護玻璃10及一遮光乾膜圈20,防護玻璃10具有一光入射面11及一光出射面12。防護玻璃10對於預定通過的光波具有高透光率,且優選的但不限於能將非預定通過的光波加以吸收或反射;舉例而言,防護玻璃10例如是含有Cu2+
的紅外線吸收玻璃(例如氟磷酸鹽系玻璃),其可維持可見光域的高透光率,同時又能吸收近紅外線。The
遮光乾膜圈20形成於防護玻璃10的光入射面11,成框狀的遮光乾膜圈20中央界定一光學區21,防護玻璃10光入射面11的一部份被遮光乾膜圈20遮住,而可將不必要的光遮蔽除去,使絕大部分光線只能在遮光乾膜圈20所界定的光學區21穿透防護玻璃10。The light-shielding
如第2圖所示,互補式金屬氧化物半導體感光元件100包括一斗狀的殼體30、一互補式金屬氧化物半導體感光晶片40及如前所述的防護玻璃模組1。斗狀的殼體30具有一開口部31,光線可經由開口部31進入殼體30內部。互補式金屬氧化物半導體感光晶片40設於殼體30內,其具有一受光面41,當光線投射至受光面41時,互補式金屬氧化物半導體感光晶片可產生相應的感光訊號。As shown in FIG. 2, the complementary metal oxide semiconductor
此外,前述防護玻璃10通過黏合劑密封殼體30的開口部31,其光出射面12面向互補式金屬氧化物半導體感光晶片40,其光入射面11則面向遠離互補式金屬氧化物半導體感光晶片40的方向。遮光乾膜圈20的光學區21正對互補式金屬氧化物半導體感光晶片40,且其正投影大於互補式金屬氧化物半導體感光晶片40的受光面41,使所需的光線能夠通過防護玻璃10射向受光面41,但又可避免向互補式金屬氧化物半導體感光晶片投射不必要的光,減少重影、反射光斑或雜訊的發生。需說明的是,光學區21的大小會根據配置在互補式金屬氧化物半導體感光元件100外側的透鏡等光學元件、互補式金屬氧化物半導體感光晶片40的尺寸及防護玻璃10的尺寸而定,並不以本實施例所示者為限。In addition, the
以下說明本發明防護玻璃模組的製法。The manufacturing method of the protective glass module of the present invention will be described below.
如第3圖所示,在一載體膜200上塗布一遮光乾膜漿料300;載體膜200可為但不限於聚乙烯對苯二甲酸酯(PET)或其他聚酯薄膜、聚醯亞胺薄膜、聚醯胺醯亞胺薄膜、聚丙烯薄膜或聚苯乙烯薄膜,其厚度較佳介於10-150 µm,其表面可為光滑面或霧面,所述塗布例如使用唇形塗布機進行;所述遮光乾膜漿料例如是黑色的環氧樹脂類化合物或以矽膠為基質的化合物;所述遮光乾膜漿料例如具有光固化或熱固化特性、或同時具有光固化及熱固化特性。As shown in Figure 3, a light-shielding
接著,如第4圖所示,令前述載體膜200通過烘乾機,將遮光乾膜漿料300乾燥為遮光乾膜層300’;Next, as shown in Figure 4, the
接著,如第5圖所示,將載體膜200上的遮光乾膜層300’在完全固化前通過層合機層合於防護玻璃10的光入射面11;Next, as shown in Figure 5, the light-shielding dry film layer 300' on the
接著,請一併參考第1、2圖,利用雷射切割方式移除遮光乾膜層300’的一部份,使遮光乾膜層300’界定一用以正對互補式金屬氧化物半導體感光晶片40的光學區21,所述光學區21的正投影大於互補式金屬氧化物半導體感光晶片40的受光面41;所述雷射切割是通過雷射切割機執行,可準確地切割遮光乾膜層300’,切割邊能夠維持平整,且不易損傷玻璃表面。雷射切割前,載體膜200可先自遮光乾膜層300’表面剝離。遮光乾膜層300’可在雷射切割之前或之後被光固化、熱固化或同時光固化及熱固化。形成光學區且被加以固化後,所述遮光乾膜層300’即成為如前所述的遮光乾膜圈。Then, please refer to Figures 1 and 2, using laser cutting to remove a part of the light-shielding dry film layer 300', so that the light-shielding dry film layer 300' defines a light-sensitive surface for the complementary metal oxide semiconductor The
1:防護玻璃模組 10:防護玻璃 11:光入射面 12:光出射面 20:遮光乾膜圈 21:光學區 30:殼體 31:開口部 40:互補式金屬氧化物半導體感光晶片 41:受光面 100:互補式金屬氧化物半導體感光元件 200:載體膜 300:遮光乾膜漿料 300’:遮光乾膜層 1: Protective glass module 10: Protective glass 11: Light incident surface 12: Light exit surface 20: Shading dry film ring 21: Optical Zone 30: shell 31: Opening 40: Complementary metal oxide semiconductor photosensitive wafer 41: Light-receiving surface 100: Complementary metal oxide semiconductor photosensitive element 200: carrier film 300: Shading dry film paste 300’: Shading dry film layer
第1圖為本發明防護玻璃模組其中一實施例的構成說明圖。Figure 1 is an explanatory diagram of the structure of one embodiment of the cover glass module of the present invention.
第2圖為本發明互補式金屬氧化物半導體感光元件其中一實施例的縱剖面示意圖。Figure 2 is a schematic longitudinal cross-sectional view of one embodiment of the complementary metal oxide semiconductor photosensitive element of the present invention.
第3至5圖為本發明防護玻璃模組其中一實施例的製作示意圖。Figures 3 to 5 are schematic diagrams of manufacturing one embodiment of the protective glass module of the present invention.
1:防護玻璃模組 1: Protective glass module
10:防護玻璃 10: Protective glass
11:光入射面 11: Light incident surface
12:光出射面 12: Light exit surface
20:遮光乾膜圈 20: Shading dry film ring
21:光學區 21: Optical Zone
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