TW202018130A - Electrolytic treatment device - Google Patents

Abstract

To provide a work-piece holding member enabling an operator to easily monitor the state of power supply in a work-piece holding member that holds a work-piece and constitutes a power supply route to the work-piece, a power supply monitoring system of an electrolytic treatment device comprising the work-piece holding member, and an electrolytic treatment device comprising the work-piece holding member. The work-piece holding member that holds a work-piece in a state of being emersed in an electrolytic treatment solution and supplies the work-piece with electricity, which is characterized by comprising an electric-current sensor that monitors an amount of electricity supplied to the work-piece, is employed to solve the problem.

Description

Workpiece holding member, power supply monitoring system of electrolytic processing apparatus including the workpiece holding member, and electrolytic processing apparatus including the workpiece holding member

The present invention relates to a work holding member, an electric power supply monitoring system of an electrolytic processing apparatus including the workpiece holding member, and an electrolytic processing apparatus including the workpiece holding member.

Conventionally, when an electrolytic treatment such as electrolytic plating is applied to the surface of an electronic component, an electrolytic treatment apparatus such as a batch type or a continuous type is used. Here, when mass producing workpieces such as electronic components subjected to electrolytic treatment, a general continuous electrolytic treatment apparatus is used. In this continuous electrolytic processing apparatus, when processing a rectangular plate-shaped workpiece, the upper end of the workpiece is held by a workpiece holding member provided with a holding member such as a clamp, and the workpiece is immersed in an electrolytic processing solution in an electrolytic processing tank. While moving the workpiece holding member along the conveyance rail, a continuous electrolytic treatment is performed by flowing current into the workpiece.

For example, as such an electrolytic treatment device, a surface treatment device shown in Patent Document 1 is mentioned. The surface treatment device of the above-mentioned Patent Document 1 has a conveying means, a jig supported by a guide rail extending in the conveying direction, and a workpiece held by the jig can be conveyed; and a power supply means, which supplies power to the workpiece being conveyed through the jig; While the workpiece is continuously transported and power is supplied in the surface treatment tank, surface treatment is performed on the workpiece. As the jig is supported by the guide rail through the rotation joint mechanism, the power supply means is formed, including the power supply rail extending in the transport direction and the installation to A current collector that can collect current on the side of the above jig and is in sliding contact with the power supply rail. [Advanced technical literature] [Patent Literature]

[Patent Document 1] Japanese Invention Patent Publication No. 2003-13296

[Problems to be solved by the invention]

As described above, in the surface treatment apparatus of Patent Document 1, a jig (workpiece holding member) that mounts a workpiece to a guide rail, continuously conveys the workpiece in the surface treatment tank, and supplies power to the workpiece via the jig to perform surface treatment of the workpiece. Even if the jig holding the workpiece is not directly immersed in the electroplating bath, it will be corroded due to the oxidation of the steam generated by the electroplating bath. In addition, the jig that swells due to oxidation causes loosening of fixing means such as screws that constitute the jig. When there is a slack or corrosion in the fixing means in the jig that constitutes the path for supplying power to the workpiece, poor conduction occurs in the aforementioned space, and the plating layer formed on the surface of the workpiece is locally thinned.

In addition, the invention disclosed in Patent Document 1 does not confirm that a predetermined current is surely flowing into each work. The workpiece holding member having a higher resistance value than the other, because the set current value cannot be secured, the thickness of the plating layer formed on the workpiece held by the workpiece holding member becomes uneven, and there is a problem that the entire surface of the workpiece to be processed cannot be uniformly plated .

In view of the above-mentioned conventional problems, the market expects a stable electrolysis process, and it is easy to monitor the power supply state in the workpiece holding member that holds the workpiece and constitutes a path for supplying power to the workpiece.

Accordingly, an object of the present invention is to provide a workpiece holding member that can easily monitor and hold a workpiece and constitutes a path for supplying power to the workpiece, a workpiece holding member, a power supply monitoring system for an electrolytic processing apparatus including the workpiece holding member, and a workpiece including the workpiece Electrolysis treatment device for holding members. [Means to solve the problem]

According to the work holding member of the present invention, the work is held in a state where the work is immersed in the electrolytic treatment solution and the power is supplied to the work, characterized by including a current sensing device to monitor the power supply to the work.

The power supply monitoring system of the electrolytic processing apparatus according to the present invention is a power supply monitoring system of the electrolytic processing apparatus including the workpiece holding member, characterized in that the current sensing device is used to monitor the power supply amount to the workpiece holding member, and the power supply amount is abnormal When the value is set, the power supply to the workpiece holding member is detected.

The electrolytic processing apparatus according to the present invention is an electrolytic processing apparatus including the above-mentioned workpiece holding member, characterized in that it includes a drive chain that vertically transports and drives the workpiece holding member along the guide rail, and has power supply to the current sensing device from the outside Power supply path. [Effect of the invention]

According to the workpiece holding member of the present invention, the power supply monitoring system of the electrolytic processing apparatus including the workpiece holding member, and the electrolytic processing apparatus including the workpiece holding member, it is possible to easily monitor the workpiece holding member that holds the workpiece and constitutes a path for supplying power to the workpiece Power supply status. Therefore, according to the present invention, when a defect occurs in the electrolytic treatment of the workpiece, it can be quickly responded to, and stable electrolytic treatment can be performed.

Hereinafter, a power supply monitoring system for an electrolytic processing apparatus including a plurality of workpiece holding members of the present invention will be described using drawings. The plural workpiece holding members in this embodiment each include a current sensing device. The power supply monitoring system of the present invention, in such a configuration, can communicate with the main control device constituting the power supply monitoring system through each current sensing device, can monitor whether the workpiece held by each workpiece holding member is in good electrolytic treatment, and can ensure the Traceability. Hereinafter, after describing the above-mentioned electrolytic processing apparatus, the power supply monitoring system will be described.

>Electrolytic treatment device> According to the electrolytic processing apparatus 10 of the present invention, the configuration includes the workpiece holding member 1 described later, and the workpiece holding member 1 is vertically transported and driven along the guide rail 13.

The electrolytic processing apparatus 10 of the present embodiment supplies power to the workpiece W (cathode) and anode electrode 12 (anode) in a state where the workpiece W is immersed in the electrolytic treatment tank 11 storing the electrolytic treatment solution (electroplating treatment solution) 50. During the electrolytic treatment (electroplating treatment), the surface WS of the workpiece W is treated. The above-mentioned electrolytic treatment apparatus 10 is a so-called continuous electrolytic treatment apparatus 10 in which a plurality of workpieces W are immersed in the electrolytic treatment solution 50 by the workpiece holding member 1 and these workpieces W are transported while supplying power to each workpiece W . The electrolytic treatment apparatus 10 of the present embodiment includes an electrolytic treatment tank 11 storing an electrolytic treatment solution 50, a pair of anode electrodes 12, 12 immersed in the electrolytic treatment solution 50 to form an anode surface, and carrying a workpiece W The workpiece holding member 1 conducts power to the guide rail 13. Hereinafter, each of these constituent elements will be described.

Electrolytic treatment tank: The electrolytic treatment tank 11 of the present embodiment is provided with an opening on its upper surface, and is configured to continuously electrolytically process the workpiece W in the direction in which the workpiece W is conveyed. The electrolytic treatment solution 50 stored in the electrolytic treatment tank 11 can be appropriately selected and used in order to form a desired electrolytic treatment layer on the surface WS of the workpiece W to be treated.

Anode electrode: The anode electrodes 12 and 12 of the present embodiment are electrically connected to an anode of an external power source (not shown), and are arranged to face each other at a predetermined interval along the longitudinal direction of the electrolytic treatment cell 11. At this time, between the anode electrodes 12 and 12, a work conveying path 15 is formed. Each anode electrode 12 is generally made of an insoluble material such as stainless steel, platinum, and carbon that are formed in a rectangular plate shape. However, in this embodiment, the material constituting each anode electrode 12 may be any material that is generally used as an insoluble electrode, and is not limited to these materials.

Guide rail: The guide rail 13 of this embodiment is arranged along the above-mentioned work conveying path 15. Here, the guide rail 13 may be provided with a power supply rail (not shown) electrically connected to an external power source (not shown). In this case, since the workpiece holding member 1 is provided with a power-receiving portion (not shown) that can be in contact with the power supply rail, the current applied to the plurality of workpieces W during transportation can always be fixed.

In addition, the guide rail 13 provided in the electrolytic processing apparatus 10 of the present embodiment is provided with a drive chain 14 for moving the workpiece holding member 1 along the guide rail 13 at a constant speed. In the electrolytic processing apparatus 10 of the present embodiment, since the work holding member 1 includes a structure (support means) that the drive chain 14 can support, the work W can be moved in the conveying direction as the drive chain 14 is driven.

In the electrolytic processing apparatus 10 of the present embodiment, the drive chain 14 is provided with a power supply path for externally supplying the current sensing device 2 described later. The electrolytic treatment apparatus 10 of the present embodiment is configured such that the current flowing into the power supply path provided in the drive chain 14 can supply power to the current sensing device 2 without hindrance, for example, via the support means.

The above description relates to the electrolytic processing apparatus 10 of the present embodiment. However, since the electrolytic processing apparatus 10 includes a plurality of workpiece holding members 1 having technical features described later, it is possible to reliably supply power to the plurality of workpieces W, and it is possible to detect the plurality of workpieces early. The defective electrolytic treatment in the workpiece W occurs. Hereinafter, the work holding member 1 included in the electrolytic processing apparatus 10 of the present invention will be described.

>Workpiece holding member> The work holding member 1 of the present invention is held in a state where the work W is immersed in the electrolytic treatment solution 50, and supplies power to the work W described above. In this embodiment, as the workpiece W, a workpiece W having a rectangular plate shape is used. However, the work W used in the present invention is not limited to assume a rectangular plate shape. The workpiece W may be of any shape as long as power is supplied via the workpiece holding member 1 while it is held by the workpiece holding member 1.

The work holding member 1 of the present invention includes a current sensing device 2 to be described later, which monitors the amount of power supplied to the work W described above.

The workpiece holding member 1 of this embodiment includes an arm 4 in addition to the current sensing device 2 and is supported by the driving chain 14 in order to vertically transport and drive the workpiece holding member 1 along the guide rail 13; , Fixed to the arm 4 for power supply to make the workpiece W substantially uniform in the surface WS to be processed; and a plurality of gripping members (clamps) 6 are fixed to the power supply rod 5 to detachably clamp the workpiece W. Therefore, since the electrolytic treatment layer is formed on the surface WS of the workpiece W, the workpiece W is held in the state of being immersed in the electrolytic treatment solution 50. The following describes these constituent elements.

Arm: The arm 4 of the present embodiment is provided with support means for vertically transporting and driving the workpiece holding member 1 along the guide rail 13, and is attached to the guide rail 13 so as to engage and drive the drive chain 14 that drives the workpiece holding member 1. As the support means, for example, a structure in which a gear 7 capable of engaging with the drive chain 14 or the like can be adopted. When the gear 7 is used as the support means, it is desirable to stabilize the conveyance of the work holding member 1 by using the gear 7 of the one-way clutch system.

Power-supply bar: The power-supply bar 5 of this embodiment has a fixed cross-sectional shape and extends linearly in the longitudinal direction. The power supply rod 5 is arranged along the longitudinal direction of the electrolytic treatment tank 11. The power supply rod 5 is fixed to the arm 4 using, for example, fixing means such as screws.

The holding member, the holding member 6 of this embodiment, is provided in plural along the longitudinal direction of the power supply bar 5 in order to detachably hold the workpiece W. The holding member 6 may be any one as long as the work W can be attached and detached, and the structure is not particularly concerned. The holding member 6 is fixed to the power supply bar 5 using, for example, fixing means such as screws.

The arm 4, the power supply rod 5 and the holding member 6 constitute a power supply path from the guide rail 13 to the workpiece W. Therefore, these arms 4, power supply rod 5, and grip member 6 are usually made of a conductive material.

Current sensing device: The current sensing device 2 of the present embodiment is installed in the workpiece holding member 1 in order to monitor the amount of power supplied to the workpiece W. The current sensing device 2 of this embodiment is installed in a plurality of workpiece holding members 1 (refer to the current sensing devices 2A, 2B, 2C~2n shown in FIG. 4), so that each workpiece holding member can be monitored in sequence. 1 The amount of power supplied to the workpiece W. Here, as long as the current sensing device 2 can grasp the amount of power supplied to the workpiece W held by the workpiece holding member 1, the structure and the like are not particularly limited.

In the structure of the work holding member 1 of the present invention, it is desirable that the current sensing device 2 includes a current value acquisition unit 20 to acquire a current value flowing into the power supply path; the communication unit 22 wirelessly transmits the current acquired by the current value acquisition unit 20 Value information; the control unit 21 controls the operation of the current value acquisition unit 20 and the communication unit 22; and the power supply unit 23 supplies power to at least one of the current value acquisition unit 20, the communication unit 22 and the control unit 21 (See Figure 4). Hereinafter, these configurations will be described.

The current value acquisition unit 20 of the present invention is installed to acquire the current value flowing into the power supply path provided in the work holding member 1. Here, the current value acquisition unit 20 may include a voltage detection unit (not shown), and when acquiring the current value, connect the shunt resistor 3 to the power supply path to detect the voltage value output from the shunt resistor 3; and the calculation unit ( (Not shown), the current value flowing into the power supply path is calculated based on the voltage value detected by the voltage detection unit and the resistance value of the voltage dividing resistor 3. Since the current value acquisition unit 20 of the present invention includes the shunt resistor 3, even if a large current flows into the power supply path, it is possible to accurately determine whether the amount of power supply to the workpiece W is good. In addition, since the shunt resistor 3 is well known, detailed description is omitted here. The above shows that the shunt resistor 3 is used in the current value acquisition unit 20 of the present invention. However, in order to obtain the current value flowing into the power supply path, the current value acquisition unit 20 of the present invention may use the shunt resistor 3 instead of the conventionally known one. Current sensor.

The communication unit 22 of the present invention wirelessly transmits information on the current value acquired by the current value acquisition unit 20 to, for example, a control device 40 on the power supply monitoring system side such as a PC or a smartphone. Here, the information on the current value transmitted to the control device 40 can be confirmed by the operator in real time with a display (not shown) installed in the control device 40, and when a problem occurs in the electrolytic treatment, it can be quickly responded to. For example, the communication unit 22 may suitably use a conventional short-range wireless method as a wireless communication method.

The control unit 21 of the present invention is constituted by a general-purpose microcomputer such as a CPU and RAM. The control unit 21 has the input side connected to the current value acquisition unit 20 and the output side connected to the communication unit 22 to control the operations of the current value acquisition unit 20 and the communication unit 22. The control unit 21 transmits information about the current value acquired from the current value acquisition unit 20 to the communication unit 22.

In addition, when the current value acquisition unit 20 is configured by the voltage detection unit and the calculation unit as described above, the control unit 21 may also serve as the calculation unit. At this time, the control unit 21 performs calculation processing based on the voltage value detected by the voltage detection unit to calculate the current value. For example, when the current value acquisition unit 20 connects the shunt resistor 3 to the power supply path in the workpiece holding member 1, the control unit 21 uses the information acquired by the current value acquisition unit 20 (voltage value across the shunt resistor 3) and the shunt resistor 3 itself The resistance value of is calculated, and the current value flowing into the power supply path is calculated.

In addition, the control unit 21 compares the reference information with which the current value acquired by the current value acquisition unit 20 is recorded in advance, and determines whether there is a problem with the electrolytic treatment applied to each workpiece W, and can also communicate the result to the communication unit 22 .

The power supply unit 23 of the present invention supplies power to the current value acquisition unit 20, the communication unit 22, and/or the control unit 21, so that these can be operated. The power supply unit 23 only needs to be capable of supplying power to these current value acquisition units 20, the communication unit 22, and/or the control unit 21, and the structure and the like are not particularly limited.

Here, the power supply unit 23 of the present invention is preferably constituted by a battery. Since the power supply unit 23 is a battery, the current sensing device 2 achieves downsizing and excellent versatility. Therefore, in the continuous-type electrolytic processing apparatus 10, it is possible to monitor the presence or absence of abnormality in the power supply amount of all the work holding members 1 that was conventionally considered difficult. In addition, since the power supply unit 23 of the present invention is a battery, the maintainability of the current sensing device 2 can be excellent.

The basic structure of the current sensing device 2 of the present invention has been described above. However, the current sensing device 2 preferably further includes an on-off switch 24, and the first proximity switch 30a provided in the previous stage of the step of electrolytically processing the workpiece holding member 1 The energization of the current value acquisition unit 20 is started, and the energization of the current value acquisition unit 20 is stopped by the second proximity switch 30b provided after the step of electrolytically processing the workpiece holding member 1. Since the current value acquisition unit 20 of the present invention includes the on-off switch 24, the proximity switch 30 is used to switch the conductive state of the current value acquisition unit 20 by the proximity switch 30 to reduce power consumption. In addition, the proximity switch 30 will be described below.

>Power supply monitoring system> Next, the power supply monitoring system of the electrolytic processing device 10 of the present invention will be described. The power supply monitoring system of the present invention is a power supply monitoring system in which the electrolytic treatment device 10 of the workpiece holding member 1 is provided. Therefore, the power supply monitoring system of the present invention monitors the power supply amount to the workpiece holding member 1 using the current sensing device 2 and detects that the power supply to the workpiece holding member 1 is defective when the obtained power supply amount is an abnormal value.

In the power supply monitoring system of the present invention, since the above-mentioned work holding member 1 is provided in the configuration, it is possible to immediately detect abnormal power supply to the work W subjected to the electrolytic treatment. Specifically, in the power supply monitoring system of the present invention, when the current value obtained by the current sensing device 2 is outside the preset threshold value range, it detects a poor power supply to the workpiece W. Therefore, according to the power supply monitoring system of the present invention, for example, even if the number of workpiece holding members 1 used increases, the amount of power supply to all workpiece holding members 1 can be monitored. Moreover, in this case, the amount of power supply to all the work holding members 1 may be monitored in real time.

In addition, in the power supply monitoring system of the present invention, when a poor power supply to the workpiece holding member 1 is detected, it is desirable to perform an alarm operation. The power supply monitoring system of the present invention is equipped with an alarm means (not shown), and performs an alarm action when a poor power supply to the workpiece holding member 1 is detected, which can reduce the operator's monitoring burden. In the power supply monitoring system of the present invention, for example, the output side of the power supply monitoring system-side control device may be connected to a display device that also serves as an element for displaying an alarm means for an abnormality, and a buzzer may be connected as an alarm means.

Therefore, the power supply monitoring system of the present invention, as described above, when the current sensing device 2 includes the on-off switch 24, may include the proximity switch 30 that switches the on-state of the on-off switch 24. Here, the proximity switch 30 is a position detection switch based on the position of the movable part without mechanical contact operation. Examples of the proximity switch 30 include an inductive proximity switch that detects a magnetic field change in the detection area, and a magnetic proximity switch that detects a change in the magnetic beam when the detection object approaches based on the combination of the magnetic detection element and the magnet. . Since these proximity switches are well known, detailed descriptions are omitted here.

The above description relates to the power supply monitoring system of the present invention, and the following describes the operation of the power supply monitoring system of the present embodiment configured as described above. The following is an example of an electrolytic plating process flow using a general continuous electrolytic processing device, and the effects of the present invention can be described as appropriate.

The work W of this embodiment has a rectangular plate shape. First, the work W is attached to the grip member 6 of the work holding member 1 and suspended by the work holding member 1. Here, since the holding member 6 is provided at least one at each end of the power supply rod 5, the work holding member 1 can stably hold the work W. In the power supply monitoring system of this embodiment, the continuous electrolytic processing device 10 is used. Therefore, the plurality of workpiece holding members 1 hold the workpieces W that are plated.

Then, the workpiece holding member 1 holding the workpiece W is supported by the guide rail 13 via the arm 4. In the operation of the power supply monitoring system of the present embodiment, the workpiece holding member 1 is supported by the drive chain 14 attached to the guide rail 13 via the gear 7 of the support means, and is transported along the guide rail 13 to the electrolytic plating treatment tank by the drive chain 14 11. In this case, since the gear 7 is a one-way clutch type gear that rotates in only one direction, a plurality of workpiece holding members 1 can be transported at substantially equal intervals, and the quality can be stabilized. In addition, the electrolytic processing apparatus 10 of the present embodiment includes a processing tank for performing a plurality of processes (surface degreasing treatment, heat treatment on the surface of the workpiece W) on the upstream side of the electrolytic plating processing tank 11 in the conveying direction of the workpiece W Washing treatment, washing treatment, pickling, etc.).

In the operation of the power supply monitoring system of the present embodiment, as shown in FIG. 5, the workpiece holding member 1 transported in the electrolytic processing apparatus 10 along the guide rail 13 descends to the hanging place directly above the electrolytic plating processing tank 11 and transfers to the liquid The guide rail 13a for intermediate conveyance conveys the workpiece W again in a state immersed in the plating solution 50. In addition, when the workpiece is taken out from the electroplating treatment solution 50, the workpiece holding member 1 is raised toward the positive and negative sides of the electroplating treatment tank 11 at the suspension near the end of the electroplating treatment tank 11 and transferred to the guide rail 13 again.

When the workpiece W is immersed in the electroplating treatment solution 50 stored in the electrolytic plating treatment tank 11, the workpiece W moves in the workpiece conveyance path 15 between the anode electrodes 12 and 12 disposed oppositely in the electrolytic plating treatment tank 11. At this time, by supplying power between the anode electrodes 12 and 12 and the cathode workpiece W aligned above, the electroplating solution 50 in the electroplating bath 11 forms a plating layer on the surface WS of the workpiece W . Here, the arm 4 of the workpiece holding member 1 holding the workpiece W is in contact with the power supply rail attached to the guide rail 13, and is electrically connected to the cathode via the power supply path through the arm 4, the power supply rod 5, and the gripping member 6, and is applied to the workpiece W Constant voltage. Then, the surface of the workpiece W that faces the anode electrodes 12 becomes the surface to be treated WS.

Here, the power supply monitoring system of the present embodiment includes the current sensing device 2 and determines whether the amount of power supply to the workpiece W is good during the period from the immersion of the workpiece W to the electrolytic treatment solution 50. The current sensing device 2 includes a current value acquisition unit 20 in the configuration to acquire the current value flowing into the power supply path of the workpiece holding member 1; the communication unit 22 wirelessly transmits information about the current value acquired by the current value acquisition unit 20; The unit 21 controls the current value acquisition unit 20 and the communication unit 22; and the power supply unit 23 supplies power to at least one of the current value acquisition unit 20, the communication unit 22, and the control unit 21. According to the current sensing device 2 described above, it is possible to confirm the average thickness of the electrolytically processed layer on the surface WS of the workpiece W without using a film thickness meter or the like. In addition, since the current sensing device 2 includes a calculation unit, the current value acquisition unit 20 connects the shunt resistor 3 to the power supply path of the workpiece holding member 1, detects the voltage value across the shunt resistor 3, and determines the shunt resistor 3 based on the voltage value The resistance value of, calculates the current value flowing into the power supply path, and can accurately and stably determine whether the amount of power supply to the workpiece W is good. The above-mentioned shunt resistor 3 is selected as a condition suitable for the magnitude of the current flowing into the power supply path of the workpiece holding member 1.

However, in the power supply monitoring system of the present embodiment, the power supply to the current sensing device 2 is provided, and the power supply unit 23 provided in the current sensing device 2 can be used as a battery or the like to form a power supply path for the drive chain 14 and can also supply power from the outside. . In addition, the battery may be a rechargeable battery, and the rechargeable battery may be charged from the drive chain 14. The power supply monitoring system of the present embodiment can achieve a long service life of the battery due to such a configuration, and the maintainability of the work holding member 1 can be improved. In addition, a current sensing device 2 is provided in each of the plural workpiece holding members 1, and the monitoring of the processing failure of all the workpieces held by these plural workpiece holding members 1 can be continued stably for a long time.

In addition, in the power supply monitoring system of this embodiment, a control device 40 for transmitting information from the communication unit 22 is externally installed, and an alarm means (not shown) is provided on the output side of the control device 40. Therefore, in the power supply monitoring system of the present embodiment, when the current sensing device 2 detects that the amount of power supply to the workpiece W is abnormal, an alarm operation such as a buzzer is performed to reduce the monitoring burden on the operator. In addition, in the power supply monitoring system described above, when the alarm operation is performed, while the conveyance of the workpiece W is stopped, an emergency stop operation to stop power supply from an external power source (not shown) may be performed. In addition, in the above power supply monitoring system, for example, the robot may select the workpiece holding member 1 whose power supply abnormality is detected.

Therefore, in the power supply monitoring system of the present embodiment, the current sensing device 2 includes the on-off switch 24, the first proximity switch 30a is arranged near the workpiece conveyance path 15 in front of the electrolytically processed workpiece holding member 1, and the current value acquisition unit 20 is started. For the power supply, the second proximity switch 30b is arranged in the vicinity of the workpiece conveyance path 15 after the electrolytic treatment of the workpiece holding member 1 to end the power supply to the current value acquisition unit 20. The power supply monitoring system of the electrolytic processing apparatus 10 of the present embodiment can reduce the power consumption and reduce the manufacturing cost by adopting such a configuration. At this time, the control unit 21 controls the operation of the communication unit 22, and by stopping the wireless communication of the information on the current value, the communication amount of the entire power supply monitoring system of the electrolytic treatment device 10 is reduced, and interference can be suppressed.

In addition, FIG. 5 shows that the first proximity switch 30a is arranged in the vicinity of the workpiece transfer path 15 immediately before transferring the workpiece holding member 1 to the guide rail 13a for liquid transfer, and the second proximity switch 30b is arranged again immediately The workpiece holding member 1 is transferred to the vicinity of the workpiece transport path 15 after the guide rail 13 is transferred. However, the arrangement positions of the first proximity switch 30a and the second proximity switch 30b are not limited to the positions shown in FIG. 5. For example, the first proximity switch 30a may be arranged in the vicinity of the workpiece transfer path 15 immediately after transferring the workpiece holding member 1 to the rail 13a for liquid transfer, and the second proximity switch 30b may be arranged to transfer the workpiece again Near the workpiece transfer path 15 before the member 1 to the guide rail 13.

The operation of the power supply monitoring system of this embodiment has been described above. However, in the present invention, since the current sensing device 2 is provided in each of the plurality of workpiece holding members 1, the power supply amount to each workpiece holding member 1 is managed in a unified manner, and the operator can be notified quickly The workpiece holding member 1 having an abnormality in the amount of power supply described above.

The above has described the work holding member 1, the power supply monitoring system of the electrolytic processing apparatus 10 including the workpiece holding member 1, and the electrolytic processing apparatus 10 including the workpiece holding member 1. According to the present invention, the electrolytic treatment can be detected in real time Workpiece W where the defect occurred. Therefore, according to the present invention, it is possible to avoid the occurrence of a partial electrolytic layer thickness in the workpiece W caused by poor conduction of the workpiece holding member 1, and it is possible to uniformly electrolytically treat the entire surface WS of the workpiece W to be processed. In addition, according to the present invention, since the workpiece W in which the electrolytic treatment failure has occurred is clearly specified, it is possible to respond quickly, and quality control becomes easy.

In addition, the electrolytic treatment apparatus 10 of the present invention has been described as being used as a plating apparatus, but it is not limited thereto. For example, the electrolytic processing apparatus 10 of the present invention can also be used as an etching processing apparatus. In addition, above, the electrolytic processing apparatus 10 of the present embodiment has explained only the continuous electrolytic processing apparatus, but the electrolytic processing apparatus 10 of the present invention is not limited to this, for example, batch type or horizontal transport type electrolytic processing may be used. Device. [Industry use possibility]

In the present invention, it is avoided that insufficient local electrolytic thickness due to poor conduction of the work holding member 1 occurs. Therefore, according to the present invention, the quality of all electrolytically treated products can be stabilized and the price can be reduced.

1: Workpiece holding member 2: Current sensing device 3: Shunt resistance 4: arm 5: Power supply rod 6: holding member 7: Gear (support means) 10: electrolytic treatment device 11: electrolytic treatment tank (electrolytic plating treatment tank) 12: anode electrode (anode) 13: Guide rail 13a: Guide rail (for electrolytic solution transport) 14: Drive chain (power supply path) 15: Workpiece transport path 20: Current value acquisition unit 21: Control Department 22: Ministry of Communications 23: Power Supply Department 24: On-off switch 30: Proximity switch 30a: 1st proximity switch 30b: 2nd proximity switch 40: control device (power supply monitoring system side) 50: electrolytic treatment solution (plating treatment solution) W: Workpiece (cathode) WS: processed surface

[Figure 1] is a schematic configuration diagram of an electrolytic processing apparatus according to an embodiment of the present invention; [Figure 2] is a front view of a work holding member according to an embodiment of the present invention; [Figure 3] is a side view of a work holding member according to an embodiment of the present invention; [Figure 4] is a control block diagram illustrating the configuration of a current sensing device according to an embodiment of the present invention; and [FIG. 5] It is a schematic diagram explaining the operation of the power supply monitoring system according to an embodiment of the present invention.

1: Workpiece holding member

2: Current sensing device

3: Shunt resistance

4: arm

5: Power supply rod

6: holding member

7: Gear (support means)

Claims (10)

A workpiece holding member that holds and supplies power to the workpiece in a state where the workpiece is immersed in an electrolytic treatment solution; Its characteristics include: The current sensing device monitors the power supply to the workpiece. The workpiece holding member according to item 1 of the patent application scope, wherein, The above current sensing device includes: The current value acquisition unit acquires the current value flowing into the path that supplies power to the workpiece. The workpiece holding member according to item 2 of the patent application scope, wherein, The above current value acquisition unit includes: A voltage detection unit that connects the shunt resistor to the path for supplying power to the workpiece, and detects the voltage value output from the shunt resistor; and The calculation unit calculates the current value flowing into the power supply path based on the voltage value detected by the voltage detection unit and the resistance value of the voltage dividing resistor. The workpiece holding member according to item 2 of the patent application scope, wherein, The above current sensing device includes: The communication part, wirelessly transmitting information about the current value obtained by the current value obtaining part; and The control unit controls the operations of the current value acquisition unit and the communication unit. The workpiece holding member according to item 2 of the patent application scope, wherein, The above current sensing device includes: The power supply unit supplies power to the current value acquisition unit, the communication unit, and/or the control unit. The workpiece holding member according to item 2 of the patent application scope, wherein, The above current sensing device further includes: The on-off switch uses the first proximity switch provided in the first stage of the step of electrolytically processing the workpiece holding member to start energization to the current value acquisition section, and the second proximity switch provided in the second stage of the step of electrolytically processing the workpiece holding member to stop Energize the current value acquisition unit. The workpiece holding member according to item 5 or 6 of the patent application scope, wherein, The power supply unit is composed of a battery. A power supply monitoring system for an electrolytic processing device, which is a power supply monitoring system for an electrolytic processing device including a workpiece holding member described in item 1 of the patent scope, is characterized by: The power supply amount to the workpiece holding member is monitored using the current sensing device. When the detected power supply amount is an abnormal value, a poor power supply to the workpiece holding member is detected. The power supply monitoring system of the electrolytic treatment device as described in item 8 of the patent scope, wherein, In the case of detecting poor power supply to the workpiece holding member, an alarm action is performed. An electrolytic processing device is an electrolytic processing device including a workpiece holding member as described in item 1 of the patent scope, characterized in that: include: The drive chain vertically transports and drives the workpiece holding member along the guide rail, and has a power supply path for externally supplying power to the current sensing device.

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