TW202018038A - Adhesive tape - Google Patents

Adhesive tape Download PDF

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Publication number
TW202018038A
TW202018038A TW108120301A TW108120301A TW202018038A TW 202018038 A TW202018038 A TW 202018038A TW 108120301 A TW108120301 A TW 108120301A TW 108120301 A TW108120301 A TW 108120301A TW 202018038 A TW202018038 A TW 202018038A
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TW
Taiwan
Prior art keywords
adhesive tape
adhesive
structural formula
compound
weight
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TW108120301A
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Chinese (zh)
Inventor
岡村和泉
石丸維敏
川村真教
西海由季
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日商積水化學工業股份有限公司
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Publication of TW202018038A publication Critical patent/TW202018038A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]

Abstract

The purpose of the present invention is to provide an adhesive tape that is capable of easily peeled off from an adherend which can react by irradiation with light and leaves less residues on the adherend. The present invention pertains to an adhesive tape comprising an adhesive layer that contains a photocurable adhesive. When the adhesive layers of two of these adhesive tapes are laminated and then photocured, the peeling force between these two tapes is not more than 75 gf/inch. When this adhesive tape is applied to a polymethyl methacrylate plate and photocured, and the adhesive tape is then peeled off, the difference between the contact angle versus water of the region on the polymethyl methacrylate plate where the adhesive tape was applied and the contact angle versus water of the polymethyl methacrylate plate prior to application of the adhesive tape is within ±20%.

Description

黏著帶Adhesive tape

本發明係關於一種黏著帶,該黏著帶對「可能藉由光照射而進行反應的被黏著體」可容易地剝離,並且抑制對被黏著體之污染。The present invention relates to an adhesive tape that can easily peel off an "adhered body that may react by light irradiation" and suppress contamination of the adhered body.

黏著膜可簡便地接合,故而用於各種產業領域。於建築領域中黏著膜用於固化片之暫時固定、內裝材料之貼合等,於汽車領域中黏著膜用於片、感測器等內裝零件之固定、側防護條、車窗側擋雨板等外裝零件之固定等,於電氣電子領域中黏著膜用於模組組裝、模組對殼體之貼合等。更具體而言,例如,黏著膜亦廣泛用作用於保護光學器件、金屬板、塗裝過之金屬板、樹脂板、玻璃板等構件之表面的表面保護膜(例如,專利文獻1~3)。The adhesive film can be easily joined, so it is used in various industrial fields. In the construction field, the adhesive film is used for the temporary fixation of the curing sheet, the bonding of the interior materials, etc. In the automotive field, the adhesive film is used for the fixing of the interior parts such as sheets and sensors, side protection strips, window side stops The fixing of rainboards and other external parts is used in the field of electrical and electronic adhesive films for module assembly, module bonding to the housing, etc. More specifically, for example, the adhesive film is also widely used as a surface protective film for protecting the surfaces of optical devices, metal plates, coated metal plates, resin plates, glass plates, and other members (for example, Patent Documents 1 to 3) .

對於表面保護膜所使用之黏著帶,要求保護時不會剝落之高黏著力,另一方面,亦要求無需保護時可簡單地剝離之輕剝離性(以下,亦稱為「高接著輕剝離」)。 作為實現了高接著易剝離之接著劑組成物,於專利文獻4中揭示有一種使用光硬化型黏著劑之黏著帶,該光硬化型黏著劑藉由照射紫外線等光而硬化且黏著力降低。藉由使用光硬化型黏著劑作為黏著劑,可於加工步驟中確實地固定被黏著體,並且可藉由照射紫外線等而容易地剝離。 先前技術文獻 專利文獻The adhesive tape used for the surface protection film requires high adhesion that does not peel off when protection is required. On the other hand, it also requires light peelability that can be easily peeled off without protection (hereinafter, also referred to as "high adhesion light peeling") ). As an adhesive composition that achieves high adhesion and easy peeling, Patent Document 4 discloses an adhesive tape using a photo-curable adhesive that is cured by irradiation of light such as ultraviolet rays and has reduced adhesive strength. By using a photo-curable adhesive as the adhesive, the adherend can be reliably fixed in the processing step, and can be easily peeled off by irradiating ultraviolet rays or the like. Prior technical literature Patent Literature

專利文獻1:日本特開平1-129085號公報 專利文獻2:日本特開平6-1958號公報 專利文獻3:日本特開平8-12952號公報 專利文獻4:日本特開平5-32946號公報Patent Document 1: Japanese Patent Laid-Open No. 1-129085 Patent Document 2: Japanese Patent Laid-Open No. 6-1958 Patent Document 3: Japanese Patent Laid-Open No. 8-12952 Patent Document 4: Japanese Patent Laid-Open No. 5-32946

[發明所欲解決之課題][Problems to be solved by the invention]

近年來,由於技術之進步而於電子學領域中構件小型化、薄化,若為此種薄化過之構件,一旦使力剝離則構件變形、損傷,故而對於黏著帶要求更高之輕剝離性。習知之黏著帶摻合有聚矽氧化合物等脫模劑,使脫模劑滲出於黏著帶與被黏著體之界面,藉此提高輕剝離性。又,上述脫模劑為了減少由脫模劑之殘留所導致之被黏著體之污染而具有可與黏著劑鍵結之官能基。脫模劑具有可與黏著劑反應之官能基,藉此抑制使黏著帶光硬化時與黏著劑鍵結而脫模劑殘留於被黏著體。In recent years, due to the advancement of technology, components have been miniaturized and thinned in the field of electronics. If such thinned components are deformed or damaged once the force is peeled off, the adhesive strips require higher light peeling. Sex. The conventional adhesive tape is blended with a release agent such as polysiloxane compound, so that the release agent penetrates the interface between the adhesive tape and the adherend, thereby improving light peelability. In addition, in order to reduce the contamination of the adhesive body caused by the residue of the mold release agent, the mold release agent has a functional group that can bond with the adhesive. The mold release agent has a functional group that can react with the adhesive, thereby suppressing the bonding of the adhesive tape to the adhesive when the adhesive tape is hardened and the release agent remaining in the adherend.

另一方面,被黏著體中存在表面具有由透明樹脂等所構成之硬塗層等者。於將習知之黏著帶用於此種具有硬塗層之被黏著體之情形時,存在使黏著帶光硬化時脫模劑不僅與黏著劑反應,亦與硬塗層之樹脂反應,從而黏著帶變得難以剝離之問題。On the other hand, the adherend has a hard coat layer made of transparent resin or the like on the surface. When the conventional adhesive tape is used for such an adherend with a hard coating, there is a release agent that not only reacts with the adhesive but also reacts with the resin of the hard coating when the adhesive tape is hardened, thereby adhering the tape The problem becomes difficult to peel.

本發明之目的在於鑒於上述現狀而提供一種黏著帶,該黏著帶對「可能藉由光照射而進行反應的被黏著體」可容易地剝離,並且抑制對被黏著體之污染。 [解決課題之技術手段]The object of the present invention is to provide an adhesive tape in view of the above-mentioned current situation, which can easily peel off the "adherent body that may react by light irradiation" and suppress contamination of the adherend. [Technical means to solve the problem]

本發明係一種黏著帶,其具有黏著劑層,上述黏著劑層含有光硬化型黏著劑,將2個上述黏著帶之黏著劑層相互貼合並進行光硬化後,2個上述黏著帶之剝離力為75 gf/inch以下,將上述黏著帶貼附於聚甲基丙烯酸甲酯板並進行光硬化,剝離上述黏著帶後,上述聚甲基丙烯酸甲酯板之貼附過上述黏著帶之部分對水之接觸角與貼附上述黏著帶前之聚甲基丙烯酸甲酯板對水之接觸角的差為±20%以內。 以下,對本發明進行詳細說明。The present invention is an adhesive tape having an adhesive layer that contains a photo-curable adhesive. After the two adhesive layers of the adhesive tape are attached to each other and photo-cured, the peeling force of the two adhesive tapes 75 gf/inch or less, attach the adhesive tape to the polymethyl methacrylate board and photo-harden it. After peeling the adhesive tape, the part of the polymethyl methacrylate board pasted the adhesive tape The difference between the contact angle of water and the contact angle of the polymethyl methacrylate board before attaching the above adhesive tape to water is within ±20%. Hereinafter, the present invention will be described in detail.

本發明之黏著帶具有黏著劑層,上述黏著劑層含有光硬化型黏著劑。 黏著帶具有光硬化型黏著劑,藉此能夠以充分之黏著力貼附於被黏著體而保護被黏著體,並且藉由於貼附後使黏著劑層硬化,可於無需保護後不損傷被黏著體而容易地剝離黏著帶。The adhesive tape of the present invention has an adhesive layer, and the adhesive layer contains a photo-curable adhesive. The adhesive tape has a light-curing adhesive, which can be attached to the adherend with sufficient adhesive force to protect the adherend, and by hardening the adhesive layer after attachment, it can be adhered without damage without protection Peel off the adhesive tape easily.

本發明之黏著帶將2個上述黏著帶之黏著劑層相互貼合並進行光硬化後,2個上述黏著帶之剝離力(以下,稱為貼合剝離力)為75 gf/inch以下。 藉由使貼合剝離力為75 gf/inch以下,而即便於用於可藉由光照射而反應之被黏著體之情形時,被黏著體亦難以被污染且可容易地剝離。又,即便於用於保護脆弱之被黏著體之情形時,亦可不損傷被黏著體而剝離黏著帶。就可進一步提高輕剝離性能之方面而言,上述貼合剝離力較佳為55 gf/inch以下,更佳為20 gf/inch以下,進而較佳為10 gf/inch以下,特佳為5 gf/inch以下,最佳為4 gf/inch以下。上述貼合剝離力通常為0.01 gf/inch以上。上述貼合剝離力具體可藉由以下之方法進行測定。 以橡膠輥將雙面膠帶(壓克力泡沫基材強接著雙面膠帶,HYPERJOINT H9004,日東電工公司製造)貼附於聚甲基丙烯酸甲酯板(PMMA板)之整面。去除所貼附之雙面膠帶之剝離紙,以橡膠輥貼附切割為與PMMA板相同大小之黏著帶之基材側,藉此以雙面膠帶將PMMA板與黏著帶之基材側貼合。使用2 kg之壓接橡膠輥以10 mm/sec之速度將貼附於PMMA板之黏著帶之黏著層側與切割為25 mm寬度之同類黏著帶之黏著層側貼合而獲得試驗樣品。對所獲得之試驗樣品,使用高壓水銀UV照射機,以對黏著帶表面之照射強度成為50 mW/cm2 之方式調節照度而照射365 nm之紫外線8秒。其後,對切割為25 mm寬度之黏著帶,使用拉伸試驗機(角度自由型黏著,皮膜剝離分析裝置VPA-2S,協和界面科學公司製造),依據JIS Z0237,以剝離速度2400 mm/分鐘進行180°方向之拉伸試驗,測定180°剝離強度(gf/25 mm),獲得貼合剝離力。In the adhesive tape of the present invention, after the two adhesive layers of the adhesive tape are adhered to each other and photo-hardened, the peeling force (hereinafter, referred to as the bonding peeling force) of the two adhesive tapes is 75 gf/inch or less. By making the bonding peeling force 75 gf/inch or less, even when it is used for an adherend that can react by light irradiation, the adherend is difficult to be contaminated and can be easily peeled off. Furthermore, even when used to protect a fragile adherend, the adhesive tape can be peeled without damaging the adherend. In terms of further improving the light peeling performance, the above-mentioned bonding peeling force is preferably 55 gf/inch or less, more preferably 20 gf/inch or less, further preferably 10 gf/inch or less, and particularly preferably 5 gf Below /inch, the best is below 4 gf/inch. The above-mentioned bonding peeling force is usually 0.01 gf/inch or more. The above-mentioned bonding peeling force can be specifically measured by the following method. Attach the double-sided tape (acrylic foam substrate strongly followed by double-sided tape, HYPERJOINT H9004, manufactured by Nitto Denko Corporation) to the entire surface of the polymethyl methacrylate board (PMMA board) with a rubber roller. Remove the peeling paper of the attached double-sided tape, and use a rubber roller to cut and cut the substrate side of the adhesive tape of the same size as the PMMA board, thereby bonding the PMMA board and the substrate side of the adhesive tape with double-sided tape . Using a 2 kg pressure-bonding rubber roller at a speed of 10 mm/sec, the adhesive layer side of the adhesive tape attached to the PMMA board was laminated to the adhesive layer side of the same adhesive tape cut to a width of 25 mm to obtain a test sample. The obtained test sample was irradiated with ultraviolet light at 365 nm for 8 seconds using a high-pressure mercury UV irradiator to adjust the illuminance so that the irradiation intensity on the surface of the adhesive tape became 50 mW/cm 2 . Thereafter, for the adhesive tape cut to a width of 25 mm, a tensile tester (angle-free adhesion, film peeling analysis device VPA-2S, manufactured by Kyowa Interface Science Co., Ltd.) was used at a peeling speed of 2400 mm/min according to JIS Z0237 A tensile test in the 180° direction was carried out, and the 180° peel strength (gf/25 mm) was measured to obtain the peeling force.

本發明之黏著帶係將上述黏著帶貼附於聚甲基丙烯酸甲酯板(PMMA板)並進行光硬化,剝離上述黏著帶後,上述聚甲基丙烯酸甲酯板之貼附過上述黏著帶之部分對水之接觸角與貼附上述黏著帶前之聚甲基丙烯酸甲酯板對水之接觸角的差為±20%以內。 將黏著帶貼附於PMMA板並進行光硬化,剝離後,PMMA板之貼附過黏著帶之部分對水之接觸角與貼附黏著帶前之PMMA板對水之接觸角之差較小,藉此可製成抑制對被黏著體之糊劑殘留且低污染性優異之黏著帶。就相同觀點而言,上述接觸角之差較佳為±10%以內,更佳為±4%以內,進而較佳為±2%以內。上述接觸角可藉由依據JIS R3257之方法進行測定,具體而言,可藉由以下之方法進行測定。 使用2 kg之壓接橡膠輥以10 mm/sec之速度將25 mm寬度之黏著帶貼附於PMMA板(Delaglas A999,透明,2 mm×50 mm×100 mm,旭化成公司製造)。其後,於室溫23℃、相對濕度50%靜置1天,獲得試驗樣品。對所獲得之試驗樣品,使用高壓水銀UV照射機,以對黏著帶表面之照射強度成為50 mW/cm2 之方式調節照度而照射365 nm之紫外線8秒,其後剝離黏著帶。依據JIS R3257 靜滴法,使用KRUSS公司製造之全自動手持接觸角計/表面自由能分析MSA,對PMMA板之貼附過黏著帶之部分對水之接觸角A進行測定。其次,對未貼附過黏著帶之PMMA板之接觸角B進行測定,藉由下述式(I)算出接觸角變化率。再者,水之滴加量設為3 μL。 接觸角變化率(%)=((接觸角A/接觸角B)-1)×100           (I)In the adhesive tape of the present invention, the adhesive tape is attached to a polymethyl methacrylate board (PMMA board) and light-hardened, and after the adhesive tape is peeled off, the polymethyl methacrylate board is pasted through the adhesive tape The difference between the contact angle of the part with water and the contact angle of the polymethyl methacrylate board before attaching the above adhesive tape to water is within ±20%. Attach the adhesive tape to the PMMA board and photo-harden it. After peeling, the difference between the contact angle of the part of the PMMA board pasted with the adhesive tape to water and the contact angle of the PMMA board before the adhesive tape to water is small. Thereby, it is possible to produce an adhesive tape which suppresses the paste remaining on the adherend and is excellent in low pollution. From the same viewpoint, the difference in the contact angle is preferably within ±10%, more preferably within ±4%, and even more preferably within ±2%. The above-mentioned contact angle can be measured by a method according to JIS R3257, and specifically, can be measured by the following method. Use a 2 kg pressure-bonding rubber roller to attach a 25 mm wide adhesive tape to the PMMA board (Delaglas A999, transparent, 2 mm×50 mm×100 mm, manufactured by Asahi Kasei Corporation) at a speed of 10 mm/sec. Thereafter, it was allowed to stand at room temperature 23°C and 50% relative humidity for 1 day to obtain a test sample. The obtained test sample was irradiated with ultraviolet light at 365 nm for 8 seconds by adjusting the illuminance so that the irradiation intensity on the surface of the adhesive tape became 50 mW/cm 2 using a high-pressure mercury UV irradiator, and then the adhesive tape was peeled off. According to the JIS R3257 static drop method, a fully automatic handheld contact angle meter/surface free energy analysis MSA manufactured by KRUSS is used to measure the contact angle A of the water on the part of the PMMA board to which the adhesive tape is attached. Next, the contact angle B of the PMMA board to which the adhesive tape has not been attached is measured, and the contact angle change rate is calculated by the following formula (I). In addition, the drop amount of water was set to 3 μL. Change rate of contact angle (%) = ((contact angle A/contact angle B)-1)×100 (I)

作為上述光硬化型黏著劑,例如可列舉以聚合性聚合物為主成分且含有紫外線聚合起始劑作為聚合起始劑之光硬化型黏著劑。上述聚合性聚合物例如可藉由如下方式獲得:預先合成分子內具有官能基之(甲基)丙烯酸系聚合物(以下,稱為含有官能基之(甲基)丙烯酸系聚合物),使之與分子內具有與上述官能基反應之官能基及自由基聚合性之不飽和鍵之化合物(以下,稱為含有官能基之不飽和化合物)反應。Examples of the photo-curable adhesive include photo-curable adhesives containing a polymerizable polymer as a main component and containing an ultraviolet polymerization initiator as a polymerization initiator. The above polymerizable polymer can be obtained, for example, by synthesizing a (meth)acrylic polymer having a functional group in the molecule (hereinafter, referred to as a (meth)acrylic polymer containing a functional group) in advance and making it It reacts with a compound having a functional group that reacts with the above functional group and a radically polymerizable unsaturated bond in the molecule (hereinafter, referred to as a functional group-containing unsaturated compound).

上述含有官能基之(甲基)丙烯酸系聚合物係藉由如下方式獲得者:以烷基之碳數通常處於2~18之範圍內之丙烯酸烷基酯及/或甲基丙烯酸烷基酯為主要單體,藉由常規方法使該主要單體、含有官能基之單體、及進而視需要之可與該等共聚之其他改質用單體進行共聚。上述含有官能基之(甲基)丙烯酸系聚合物之重量平均分子量通常為20萬~200萬左右。再者,於本說明書中,重量平均分子量可藉由GPC法來決定,例如,可於40℃使用作為溶出液之THF、作為管柱之HSPgel HR MB-M 6.0×150 mm(Waters公司製造),藉由聚苯乙烯標準來決定。The functional group-containing (meth)acrylic polymer is obtained as follows: alkyl acrylate and/or alkyl methacrylate whose carbon number of the alkyl group is usually in the range of 2 to 18 is The main monomer is copolymerized with the main monomer, the functional group-containing monomer, and, if necessary, other copolymerizable monomers copolymerized with these by conventional methods. The weight average molecular weight of the functional group-containing (meth)acrylic polymer is usually about 200,000 to 2 million. In addition, in this specification, the weight average molecular weight can be determined by the GPC method. For example, THF as an eluent and HSPgel HR MB-M 6.0×150 mm (manufactured by Waters) as a column can be used at 40°C. , Determined by polystyrene standards.

作為上述含有官能基之單體,例如可列舉:含有羧基之單體、或含有羥基之單體、或含有環氧基之單體、或含有異氰酸基之單體、或含有胺基之單體等。作為上述含有羧基之單體,可列舉:丙烯酸、甲基丙烯酸等。作為上述含有羥基之單體,可列舉:丙烯酸羥基乙酯、甲基丙烯酸羥基乙酯等。作為上述含有環氧基之單體,可列舉:丙烯酸縮水甘油酯、甲基丙烯酸縮水甘油酯等。作為上述含有異氰酸基之單體,可列舉:丙烯酸異氰酸基乙酯、甲基丙烯酸異氰酸基乙酯等。作為上述含有胺基之單體,可列舉:丙烯酸胺基乙酯、甲基丙烯酸胺基乙酯等。Examples of the functional group-containing monomer include: a carboxyl group-containing monomer, a hydroxyl group-containing monomer, an epoxy group-containing monomer, an isocyanate group-containing monomer, or an amine group-containing monomer Monomer etc. Examples of the carboxyl group-containing monomer include acrylic acid and methacrylic acid. Examples of the hydroxyl group-containing monomer include hydroxyethyl acrylate and hydroxyethyl methacrylate. Examples of the epoxy group-containing monomers include glycidyl acrylate and glycidyl methacrylate. Examples of the isocyanate group-containing monomer include isocyanatoethyl acrylate and isocyanatoethyl methacrylate. Examples of the amine group-containing monomer include amino ethyl acrylate and amino ethyl methacrylate.

作為上述可共聚之其他改質用單體,例如可列舉:乙酸乙烯酯、丙烯腈、苯乙烯等一般之(甲基)丙烯酸系聚合物所使用之各種單體。Examples of the other copolymerizable monomers for modification include various monomers used in general (meth)acrylic polymers such as vinyl acetate, acrylonitrile, and styrene.

作為與上述含有官能基之(甲基)丙烯酸系聚合物反應之含有官能基之不飽和化合物,可視上述含有官能基之(甲基)丙烯酸系聚合物之官能基,而使用與上述含有官能基之單體相同者。例如,於上述含有官能基之(甲基)丙烯酸系聚合物之官能基為羧基之情形時,使用含有環氧基之單體或含有異氰酸基之單體。於該官能基為羥基之情形時,使用含有異氰酸基之單體。於該官能基為環氧基之情形時,使用含有羧基之單體或丙烯醯胺等含有醯胺基之單體。於該官能基為胺基之情形時,使用含有環氧基之單體。As the functional group-containing unsaturated compound that reacts with the functional group-containing (meth)acrylic polymer, the functional group-containing (meth)acrylic polymer can be used as the functional group-containing unsaturated compound. The same monomer. For example, when the functional group of the functional group-containing (meth)acrylic polymer is a carboxyl group, an epoxy group-containing monomer or an isocyanate group-containing monomer is used. When the functional group is a hydroxyl group, an isocyanate group-containing monomer is used. When the functional group is an epoxy group, a carboxyl group-containing monomer or acrylamide-containing monomer such as acrylamide is used. When the functional group is an amine group, an epoxy group-containing monomer is used.

上述紫外線聚合起始劑例如可列舉:藉由照射200~410 nm之波長之紫外線而活化者。作為此種紫外線聚合起始劑,例如可列舉:苯乙酮衍生物化合物、或安息香醚系化合物、縮酮衍生物化合物、氧化膦衍生物化合物、雙(η5-環戊二烯基)二茂鈦衍生物化合物、二苯甲酮、米其勒酮、氯9-氧硫

Figure 108120301-A0304-12-01
、十二烷基9-氧硫
Figure 108120301-A0304-12-01
、二甲基9-氧硫
Figure 108120301-A0304-12-01
、二乙基9-氧硫
Figure 108120301-A0304-12-01
、α-羥基環己基苯基酮、2-羥基甲基苯基丙烷等。作為上述苯乙酮衍生物化合物,可列舉甲氧基苯乙酮等。作為上述安息香醚系化合物,可列舉安息香丙醚、安息香異丁醚等。作為上述縮酮衍生物化合物,可列舉二苯乙二酮二甲基縮酮(benzil dimethyl ketal)、苯乙酮二乙基縮酮等。該等紫外線聚合起始劑可單獨使用,亦可併用2種以上。Examples of the above-mentioned ultraviolet polymerization initiator include those activated by irradiation of ultraviolet rays with a wavelength of 200 to 410 nm. Examples of such an ultraviolet polymerization initiator include acetophenone derivative compounds, benzoin ether-based compounds, ketal derivative compounds, phosphine oxide derivative compounds, and bis(η5-cyclopentadienyl)diocene Titanium derivative compounds, benzophenone, Michler's ketone, chlorine 9-oxosulfur
Figure 108120301-A0304-12-01
、Dodecyl 9-oxysulfur
Figure 108120301-A0304-12-01
Dimethyl 9-oxysulfur
Figure 108120301-A0304-12-01
, Diethyl 9-oxysulfur
Figure 108120301-A0304-12-01
, Α-hydroxycyclohexyl phenyl ketone, 2-hydroxymethyl phenyl propane, etc. Examples of the acetophenone derivative compounds include methoxyacetophenone and the like. Examples of the benzoin ether-based compound include benzoin propyl ether and benzoin isobutyl ether. Examples of the ketal derivative compounds include benzil dimethyl ketal, acetophenone diethyl ketal, and the like. These ultraviolet polymerization initiators may be used alone or in combination of two or more.

上述黏著劑層較佳為含有自由基聚合性之多官能低聚物或單體。藉由使上述黏著劑層含有自由基聚合性之多官能低聚物或單體,而提高紫外線硬化性。 上述多官能低聚物或單體較佳為重量平均分子量為1萬以下者,更佳為其重量平均分子量為5000以下且分子內之自由基聚合性之不飽和鍵之數量為2~20個者以利用紫外線照射而高效率地實現黏著劑層之三維網狀化。上述重量平均分子量例如可使用GPC測定法來決定。The adhesive layer is preferably a polyfunctional oligomer or monomer containing radical polymerizability. By making the adhesive layer contain a radically polymerizable polyfunctional oligomer or monomer, the ultraviolet curability is improved. The polyfunctional oligomer or monomer is preferably one having a weight average molecular weight of 10,000 or less, and more preferably has a weight average molecular weight of 5000 or less and the number of radically polymerizable unsaturated bonds in the molecule is 2 to 20 In order to use ultraviolet irradiation, the three-dimensional network of the adhesive layer can be efficiently achieved. The weight average molecular weight can be determined using GPC measurement, for example.

上述多官能低聚物或單體例如可列舉:三羥甲基丙烷三丙烯酸酯、四羥甲基甲烷四丙烯酸酯、新戊四醇三丙烯酸酯、新戊四醇四丙烯酸酯、二新戊四醇單羥基五丙烯酸酯、二新戊四醇六丙烯酸酯或與上述相同之甲基丙烯酸酯類等。此外,可列舉:1,4-丁二醇二丙烯酸酯、1,6-己二醇二丙烯酸酯、聚乙二醇二丙烯酸酯、市售之寡酯丙烯酸酯、與上述相同之甲基丙烯酸酯類等。該等多官能低聚物或單體可單獨使用,亦可併用2種以上。Examples of the polyfunctional oligomers or monomers include trimethylolpropane triacrylate, tetramethylolmethane tetraacrylate, neopentyl alcohol triacrylate, neopentyl alcohol tetraacrylate, and di neopentyl alcohol. Tetraol monohydroxy pentaacrylate, dipentaerythritol hexaacrylate, or the same methacrylates as described above. In addition, there may be mentioned 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, polyethylene glycol diacrylate, commercially available oligoester acrylate, and the same methacrylic acid as described above Ester etc. These polyfunctional oligomers or monomers may be used alone or in combination of two or more.

上述黏著劑層亦可含有交聯劑,以提高光硬化型黏著劑之凝聚力。 作為上述交聯劑,例如可列舉:異氰酸酯系交聯劑、環氧系交聯劑、氮丙啶系交聯劑、金屬螯合物系交聯劑等。其中,就光硬化型黏著劑之凝聚力進一步提高之方面而言,較佳為異氰酸酯系交聯劑。The adhesive layer may also contain a cross-linking agent to improve the cohesion of the light-curing adhesive. Examples of the crosslinking agent include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, aziridine-based crosslinking agents, and metal chelate-based crosslinking agents. Among them, in terms of further improving the cohesive force of the photo-curable adhesive, an isocyanate-based crosslinking agent is preferred.

上述交聯劑較佳為於上述黏著劑層中含有0.1~20重量%。 藉由以上述範圍含有交聯劑,可適度地交聯光硬化型黏著劑,而一面維持較高之黏著力一面進一步提高光硬化型黏著劑之凝聚力。就相同觀點而言,上述交聯劑之含量之更佳之下限為0.5重量%,進而較佳之下限為1.0重量%,且更佳之上限為15重量%,進而較佳之上限為10重量%。The cross-linking agent preferably contains 0.1 to 20% by weight in the adhesive layer. By containing the cross-linking agent in the above range, the photo-curing adhesive can be cross-linked moderately, and the cohesion of the photo-curing adhesive can be further improved while maintaining a high adhesive force. From the same viewpoint, the more preferable lower limit of the content of the above-mentioned crosslinking agent is 0.5% by weight, the more preferable lower limit is 1.0% by weight, and the more preferable upper limit is 15% by weight, and the more preferable upper limit is 10% by weight.

上述黏著劑層較佳為含有「具有矽原子及/或氟原子之化合物」,更佳為含有「具有矽原子及氟原子之化合物」。 若黏著劑層含有「具有矽及/或氟原子之化合物(更佳為具有矽原子及氟原子之化合物)」,則具有矽及/或氟原子之化合物滲出於黏著劑層表面而抑制接著增強,故而可易於將上述貼合剝離力調節至上述範圍,可更加容易地剝離黏著帶。The adhesive layer preferably contains "a compound having silicon atoms and/or fluorine atoms", and more preferably contains "a compound having silicon atoms and fluorine atoms". If the adhesive layer contains "a compound having silicon and/or fluorine atoms (more preferably a compound having silicon atoms and fluorine atoms)", the compound having silicon and/or fluorine atoms penetrates the surface of the adhesive layer to suppress and then strengthen Therefore, the above-mentioned peeling force can be easily adjusted to the above range, and the adhesive tape can be peeled off more easily.

作為上述具有矽及/或氟原子之化合物,例如可列舉具有矽及/或氟原子之烴化合物等。上述烴化合物可為飽和烴化合物,亦可為不飽和烴化合物。其中,就輕剝離性優異之方面而言,較佳為含有「具有矽及氟原子之官能基」,且上述具有矽及氟之官能基之分子量為100以上之烴化合物。Examples of the compound having silicon and/or fluorine atoms include hydrocarbon compounds having silicon and/or fluorine atoms. The hydrocarbon compound may be a saturated hydrocarbon compound or an unsaturated hydrocarbon compound. Among them, in terms of excellent light releasability, a hydrocarbon compound containing a “functional group having silicon and fluorine atoms” and having a molecular weight of the functional group having silicon and fluorine of 100 or more is preferable.

上述具有矽及/或氟原子之化合物較佳為具有碳-碳雙鍵。 若上述具有矽及/或氟原子之化合物具有碳-碳雙鍵,則藉由刺激黏著劑層,可使具有矽及/或氟原子之化合物與光硬化型黏著劑化學鍵結,故而可減少由具有矽及/或氟原子之化合物殘留所導致之被黏著體之污染。又,可減少被黏著體之污染,故而可易於將上述接觸角之範圍調節至上述範圍。The compound having silicon and/or fluorine atoms preferably has a carbon-carbon double bond. If the above compound with silicon and/or fluorine atoms has a carbon-carbon double bond, by stimulating the adhesive layer, the compound with silicon and/or fluorine atoms can be chemically bonded to the light-curing adhesive, so the number of Contamination by adherends caused by residues of silicon and/or fluorine atoms. In addition, the contamination by the adherend can be reduced, so that the range of the contact angle can be easily adjusted to the above range.

上述黏著劑層較佳為含有交聯劑,上述具有矽原子及/或氟原子之化合物較佳為具有可與上述交聯劑反應之官能基。 藉由使上述具有矽原子及/或氟原子之化合物具有可與交聯劑反應之官能基,具有矽原子及/或氟原子之化合物可經由交聯劑與光硬化型黏著劑鍵結,故而可減少被黏著體之污染而易於將上述接觸角之範圍調節至上述範圍。又,上述具有矽原子及/或氟原子之化合物與交聯劑之反應並非藉由光照射發生之反應。因此,即便於用於具有硬塗層等可藉由光照射而反應之表面的被黏著體之情形時,亦難以與被黏著體反應,而可更加容易地剝離黏著帶。 上述具有矽原子及/或氟原子之化合物更佳為具有可與上述交聯劑反應之官能基,且不具有碳-碳雙鍵。於該情形時,即便於用於具有硬塗層等可藉由光照射而反應之表面的被黏著體之情形時,更難以與被黏著體反應,而可更加容易地剝離黏著帶。The adhesive layer preferably contains a cross-linking agent, and the compound having silicon atoms and/or fluorine atoms preferably has a functional group that can react with the cross-linking agent. By making the above-mentioned compound having a silicon atom and/or fluorine atom have a functional group that can react with a crosslinking agent, the compound having a silicon atom and/or fluorine atom can be bonded to the light-curing adhesive via the crosslinking agent, so It is possible to reduce the contamination by the adherend and easily adjust the range of the contact angle to the above range. In addition, the reaction between the compound having silicon atoms and/or fluorine atoms and the crosslinking agent is not a reaction that occurs by light irradiation. Therefore, even when applied to an adherend having a surface that can react with light irradiation, such as a hard coat, it is difficult to react with the adherend, and the adhesive tape can be more easily peeled off. The compound having a silicon atom and/or fluorine atom preferably has a functional group that can react with the cross-linking agent, and does not have a carbon-carbon double bond. In this case, even in the case of an adherend having a surface that can react by light irradiation, such as a hard coat, it is more difficult to react with the adherend, and the adhesive tape can be peeled off more easily.

上述可與交聯劑反應之官能基根據上述交聯劑之官能基適宜地選擇,例如可列舉:羥基、羧基、胺基、硫醇基等。其中,就可製成可更加容易地將上述接觸角之範圍調節至上述範圍並且被黏著體之低污染性與輕剝離性優異之黏著帶之方面而言,較佳為羥基。The functional group that can react with the crosslinking agent is appropriately selected according to the functional group of the crosslinking agent, and examples thereof include a hydroxyl group, a carboxyl group, an amine group, and a thiol group. Among them, in terms of making it possible to easily adjust the range of the contact angle to the above range and to provide an adhesive tape excellent in low contamination and light peelability of the adherend, hydroxyl groups are preferred.

上述具有矽及/或氟原子之化合物就被黏著體之低污染性與輕剝離性之觀點而言,較佳為具有矽及/或氟與選自由羥基、羧基、胺基及環氧基所組成之群中之至少1個官能基之(甲基)丙烯酸化合物(亦簡稱為「具有矽等之(甲基)丙烯酸化合物」)。於本發明之較佳之實施態樣中,具有矽等之(甲基)丙烯酸化合物於其側鏈具有矽及/或氟與選自由羥基、羧基、胺基及環氧基所組成之群中之至少1個官能基。其中,就可製成被黏著體之低污染性與輕剝離性優異之黏著帶之方面而言,較佳為具有下述結構式(1-1)、下述結構式(1-2)及下述結構式(1-3)所表示之結構之(甲基)丙烯酸化合物。From the viewpoint of low contamination and light peelability of the adherend, the compound having silicon and/or fluorine atoms is preferably selected from the group consisting of hydroxyl, carboxyl, amine, and epoxy groups. (Meth)acrylic compound with at least one functional group in the group (also referred to as "(meth)acrylic compound with silicon"). In a preferred embodiment of the present invention, the (meth)acrylic compound having silicon and the like has silicon and/or fluorine in its side chain and is selected from the group consisting of hydroxyl, carboxyl, amine and epoxy groups At least 1 functional group. Among them, in view of the fact that an adhesive tape excellent in low pollution and light peelability of the adherend can be produced, it is preferable to have the following structural formula (1-1), the following structural formula (1-2) and The (meth)acrylic compound of the structure represented by the following structural formula (1-3).

Figure 02_image001
Figure 02_image001

於結構式(1-1)、結構式(1-2)、結構式(1-3)中,R1 ~R3 分別獨立地表示氫或甲基。R4 表示具有選自由羥基、羧基、胺基及環氧基所組成之群中之至少1種之碳數1~20之烴基或氫。R5 表示具有矽及/或氟之基。R6 表示氫或碳數1~20之烴基。In Structural Formula (1-1), Structural Formula (1-2), and Structural Formula (1-3), R 1 to R 3 each independently represent hydrogen or methyl. R 4 represents at least one kind of hydrocarbon group having 1 to 20 carbon atoms or hydrogen selected from the group consisting of hydroxyl group, carboxyl group, amine group and epoxy group. R 5 represents a group having silicon and/or fluorine. R 6 represents hydrogen or a hydrocarbon group having 1 to 20 carbon atoms.

R4 中之烴基之碳數就將玻璃轉移溫度設為室溫以下而使剝離時之黏著劑表面具有柔軟性之觀點而言,較佳為1~20個,更佳為2~10個,進而較佳為3~7個。The carbon number of the hydrocarbon group in R 4 is preferably from 1 to 20, more preferably from 2 to 10, from the viewpoint that the glass transition temperature is set to room temperature or less and the surface of the adhesive during peeling has flexibility. Furthermore, it is preferably 3 to 7.

於R5 中,具有矽及/或氟之基就抑制接著增強及與光硬化型黏著劑之相容性之觀點而言,較佳為含有:具有分子量100~2000之矽之基及/或氟的碳數1~20之烴基。又,更佳為含有:具有分子量300~1000之矽之基及/或氟的碳數2~10之烴基,進而較佳為具有分子量500~800之矽及/或氟之碳數3~8之烴基。作為上述結構式(1)所表示之化合物中之具有矽及/或氟之基,例如可列舉:矽氧烷基、氟烷基等。In R 5 , a group having silicon and/or fluorine preferably contains a silicon group having a molecular weight of 100 to 2000 and/or from the viewpoint of suppressing the subsequent enhancement and compatibility with a photocurable adhesive. The hydrocarbon group of 1 to 20 carbon atoms of fluorine. Furthermore, it is more preferable to contain: a silicon group having a molecular weight of 300 to 1000 and/or a hydrocarbon group having a carbon number of 2 to 10, and more preferably a silicon group having a molecular weight of 500 to 800 and/or a carbon number of 3 to 8 Of hydrocarbon. Examples of the group having silicon and/or fluorine in the compound represented by the structural formula (1) include, for example, siloxyalkyl groups and fluoroalkyl groups.

R6 中之烴基之碳數就玻璃轉移溫度之觀點而言,較佳為1~20個,更佳為3~10個,進而較佳為4~8個。From the viewpoint of the glass transition temperature, the carbon number of the hydrocarbon group in R 6 is preferably 1-20, more preferably 3-10, and still more preferably 4-8.

具有上述結構式(1-1)、上述結構式(1-2)及上述結構式(1-3)所表示之結構之(甲基)丙烯酸化合物可為含有各結構式所表示之結構之嵌段的嵌段共聚物,亦可為無規地含有各結構式所表示之結構的無規共聚物。其中,就可進一步抑制糊劑殘留,且黏著帶之剝離性進一步提高之方面而言,較佳為無規共聚物。又,亦可具有上述結構式(1-1)、上述結構式(1-2)及上述結構式(1-3)所表示之結構以外之其他單體單元結構。The (meth)acrylic compound having the structure represented by the above structural formula (1-1), the above structural formula (1-2) and the above structural formula (1-3) may be an embedding containing the structure represented by each structural formula The segmented block copolymer may also be a random copolymer that randomly contains the structure represented by each structural formula. Among them, a random copolymer is preferable in that the residue of the paste can be further suppressed and the peelability of the adhesive tape is further improved. In addition, it may have a structure of a monomer unit other than the structures represented by the structural formula (1-1), the structural formula (1-2), and the structural formula (1-3).

具有上述結構式(1-1)、上述結構式(1-2)及上述結構式(1-3)所表示之結構之(甲基)丙烯酸化合物中之各結構式所表示之結構單元之組成比(整數比)並無特別限定,就與丙烯酸聚合物之相容性之觀點而言,各結構單元之組成比(整數比)較佳為1以上之整數。更佳為10以上之整數,進而較佳為20以上之整數。各結構單元之組成比(整數比)通常較佳為成為100以下之整數。 各結構單元之組成比(整數比)可藉由利用NMR之結構分析等算出。Composition of the structural unit represented by each structural formula in the (meth)acrylic compound having the structure represented by the above structural formula (1-1), the above structural formula (1-2) and the above structural formula (1-3) The ratio (integer ratio) is not particularly limited, and from the viewpoint of compatibility with the acrylic polymer, the composition ratio (integer ratio) of each structural unit is preferably an integer of 1 or more. It is more preferably an integer of 10 or more, and further preferably an integer of 20 or more. The composition ratio (integer ratio) of each structural unit is usually preferably an integer of 100 or less. The composition ratio (integer ratio) of each structural unit can be calculated by structural analysis using NMR or the like.

上述具有矽及/或氟原子之化合物較佳為重量平均分子量為500以上且200000以下。 若上述具有矽及/或氟原子之化合物之重量平均分子量為上述範圍,則可製成輕剝離性與低污染性更加優異之黏著帶。就相同觀點而言,上述具有矽及/或氟原子之化合物之重量平均分子量之更佳之下限為1000,進而較佳之下限為3000,且更佳之上限為100000,進而較佳之上限為50000。The compound having silicon and/or fluorine atoms preferably has a weight average molecular weight of 500 or more and 200,000 or less. If the weight average molecular weight of the compound having silicon and/or fluorine atoms is within the above range, an adhesive tape with more excellent light peelability and low pollution can be produced. From the same viewpoint, the more preferable lower limit of the weight average molecular weight of the above-mentioned compound having silicon and/or fluorine atoms is 1,000, the more preferable lower limit is 3000, and the more preferable upper limit is 100,000, and the more preferable upper limit is 50,000.

上述黏著劑層中之上述具有矽及/或氟原子之化合物之含量,較佳之下限為0.1重量%,更佳之下限為1重量%,且較佳之上限為20重量%,更佳之上限為10重量%。藉由使上述具有矽及/或氟原子之化合物之含量為該等範圍,可更加容易地剝離黏著帶。The content of the compound having silicon and/or fluorine atoms in the adhesive layer is preferably a lower limit of 0.1% by weight, more preferably a lower limit of 1% by weight, and a preferable upper limit of 20% by weight, and more preferably an upper limit of 10% by weight %. By making the content of the above-mentioned compound having silicon and/or fluorine atoms within these ranges, the adhesive tape can be peeled off more easily.

上述黏著劑層亦可含有發煙二氧化矽等無機填料、塑化劑、樹脂、界面活性劑、蠟、微粒子填充劑等公知之添加劑。The adhesive layer may contain well-known additives such as fumed silica and other inorganic fillers, plasticizers, resins, surfactants, waxes, and particulate fillers.

上述黏著劑層之厚度並無特別限定,較佳為下限為5 μm,上限為100 μm。若上述黏著劑層之厚度為上述範圍,則能夠以充分之黏著力保護被黏著體,進而亦可抑制剝離時之糊劑殘留。上述黏著劑層之厚度之更佳之下限為10 μm,且更佳之上限為60 μm。The thickness of the adhesive layer is not particularly limited, but the lower limit is preferably 5 μm, and the upper limit is 100 μm. If the thickness of the adhesive layer is within the above range, the adherend can be protected with sufficient adhesive force, and the paste residue during peeling can also be suppressed. The more preferable lower limit of the thickness of the adhesive layer is 10 μm, and the more preferable upper limit is 60 μm.

本發明之黏著帶較佳為於黏著劑層之一面具有基材。 上述基材並無特別限定,例如可列舉:聚烯烴系樹脂膜、聚酯系樹脂膜、乙烯-乙酸乙烯酯共聚物、改質烯烴系樹脂膜、聚氯乙烯系樹脂膜、聚胺酯(polyurethane)系樹脂膜、環烯烴聚合物樹脂膜、丙烯酸樹脂膜、聚碳酸酯膜、ABS(丙烯腈-丁二烯-苯乙烯)樹脂膜、聚醯胺膜、聚胺酯膜、聚醯亞胺膜等。作為上述聚烯烴系樹脂膜,可列舉:聚乙烯膜、聚丙烯膜等。作為上述聚酯系樹脂膜,可列舉:聚對苯二甲酸乙二酯(PET)膜、聚萘二甲酸乙二酯(PEN)膜等。作為上述改質烯烴系樹脂膜,可列舉乙烯-丙烯酸酯共聚物等。再者,為了發揮更高之剝離性,較佳為彈性模數較高之基材。又,於想越過表面保護膠帶確認被黏著體之狀態之情形時,較佳為霧度值較低(例如,霧度為2以下)之基材。The adhesive tape of the present invention preferably has a substrate on one side of the adhesive layer. The above-mentioned substrate is not particularly limited, and examples thereof include polyolefin-based resin films, polyester-based resin films, ethylene-vinyl acetate copolymers, modified olefin-based resin films, polyvinyl chloride-based resin films, and polyurethanes. Resin film, cycloolefin polymer resin film, acrylic resin film, polycarbonate film, ABS (acrylonitrile-butadiene-styrene) resin film, polyamide film, polyurethane film, polyimide film, etc. Examples of the polyolefin-based resin film include polyethylene films and polypropylene films. Examples of the polyester resin film include polyethylene terephthalate (PET) film, polyethylene naphthalate (PEN) film, and the like. Examples of the modified olefin-based resin film include ethylene-acrylate copolymers. In addition, in order to exert higher releasability, a substrate with a higher elastic modulus is preferable. In addition, when it is desired to check the state of the adherend across the surface protection tape, a substrate with a low haze value (for example, a haze of 2 or less) is preferable.

上述基材亦可含有抗靜電劑、脫模劑、抗氧化劑、耐候劑、結晶成核劑等添加劑或聚烯烴、聚酯、聚醯胺、彈性體等樹脂改質劑等。The above substrate may also contain additives such as antistatic agents, mold release agents, antioxidants, weathering agents, crystal nucleating agents, and resin modifiers such as polyolefins, polyesters, polyamides, and elastomers.

上述基材之厚度並無特別限定,較佳之下限為25 μm,且較佳之上限為200 μm。藉由使上述基材之厚度為上述範圍,而可製成操作性優異之表面保護膜。就相同觀點而言,上述基材之厚度之更佳之下限為50 μm,且更佳之上限為188 μm。The thickness of the above substrate is not particularly limited, and the lower limit is preferably 25 μm, and the upper limit is preferably 200 μm. By making the thickness of the above-mentioned base material within the above-mentioned range, a surface protective film excellent in operability can be produced. From the same viewpoint, the better lower limit of the thickness of the above-mentioned substrate is 50 μm, and the more preferable upper limit is 188 μm.

本發明之黏著帶較佳為光硬化後對聚甲基丙烯酸甲酯板之剝離力為50 gf/inch以下。 藉由使光硬化後對PMMA板之剝離力為50 gf/inch以下,而能夠以更輕之力剝離黏著帶。就相同觀點而言,上述光硬化後對PMMA板之剝離力更佳為30 gf/inch以下,進而較佳為10 gf/inch以下,通常為0.01 gf/inch以上。上述光硬化後對PMMA板之剝離力可藉由以下之方法進行測定。 將黏著帶裁剪為25 mm寬度之短條狀而製作試片。以黏著劑層成為對向於PMMA板之狀態之方式將試片置於PMMA板(Delaglas A999,透明,2 mm×50 mm×100 mm,旭化成公司製造)上。其次,於試片上以10 mm/sec之速度使2 kg之橡膠輥往返一次,藉此將試片與PMMA板貼合而製成試驗樣品。對所獲得之試驗樣品,使用高壓水銀UV照射機,以對黏著帶表面之照射強度成為50 mW/cm2 之方式調節照度而照射365 nm之紫外線8秒。其後,使用拉伸試驗機(角度自由型黏著,皮膜剝離分析裝置VPA-2S,協和界面科學公司製造),依據JIS Z0237,以剝離速度2400 mm/分鐘進行180°方向之拉伸試驗,測定180°剝離強度(N/25 mm)。The adhesive tape of the present invention preferably has a peeling force of less than 50 gf/inch on the polymethyl methacrylate board after light curing. By making the peeling force on the PMMA board after light curing 50 gf/inch or less, the adhesive tape can be peeled off with a lighter force. From the same viewpoint, the peeling force to the PMMA board after the photo-curing is more preferably 30 gf/inch or less, further preferably 10 gf/inch or less, and usually 0.01 gf/inch or more. The peeling force on the PMMA board after the photo-curing can be measured by the following method. The adhesive tape was cut into short strips with a width of 25 mm to prepare test pieces. Place the test piece on the PMMA board (Delaglas A999, transparent, 2 mm×50 mm×100 mm, manufactured by Asahi Kasei Corporation) in such a manner that the adhesive layer becomes opposed to the PMMA board. Next, a 2 kg rubber roller was made to reciprocate once on the test piece at a speed of 10 mm/sec, thereby bonding the test piece to the PMMA board to make a test sample. The obtained test sample was irradiated with ultraviolet light at 365 nm for 8 seconds using a high-pressure mercury UV irradiator to adjust the illuminance so that the irradiation intensity on the surface of the adhesive tape became 50 mW/cm 2 . Thereafter, a tensile tester (angle-free adhesion, film peeling analysis device VPA-2S, manufactured by Kyowa Interface Science Co., Ltd.) was used to perform a tensile test in the direction of 180° at a peeling speed of 2400 mm/min in accordance with JIS Z0237 to measure 180° peel strength (N/25 mm).

製造本發明之黏著帶之方法並無特別限定。例如可藉由如下方法進行製造:使用溶劑將上述光硬化型黏著劑、交聯劑、上述具有矽及/或氟原子之化合物及視需要之添加劑溶解混合而製成黏著劑溶液,塗佈黏著劑溶液並使其乾燥後積層於基材層上之方法;或直接塗佈於基材層上並使其乾燥之方法。The method for manufacturing the adhesive tape of the present invention is not particularly limited. For example, it can be manufactured by the following method: using a solvent to dissolve and mix the above-mentioned photocurable adhesive, crosslinking agent, the above-mentioned compound having silicon and/or fluorine atoms, and optionally additives to make an adhesive solution, and apply the adhesive Method of drying the solution and stacking it on the substrate layer after drying; or directly coating and drying the substrate layer.

本發明之黏著帶之用途並無特別限定,即便於用於具有如硬塗層般可藉由光照射而反應之表面且脆弱之被黏著體之情形時,亦具有可不損傷被黏著體而剝離之輕剝離性與糊劑難以殘留之低污染性,故而可特別適合地用作保護光學器件或光學膜等電子零件之保護膠帶。此種用於製造電子零件之本發明之黏著帶亦為本發明之一。於本發明之較佳之實施態樣中,提供用於保護可藉由光照射而反應之表面之上述黏著帶。 [發明之效果]The application of the adhesive tape of the present invention is not particularly limited, and even when used in a case where the surface has a hard-coated surface that can react by light irradiation and is fragile, it can be peeled without damaging the adherend The light releasability and the low contamination that the paste is difficult to remain, so it can be particularly suitable for protecting tapes used to protect electronic components such as optical devices or optical films. The adhesive tape of the present invention for manufacturing electronic parts is also one of the present invention. In a preferred embodiment of the present invention, the above-mentioned adhesive tape for protecting a surface that can react by light irradiation is provided. [Effect of invention]

根據本發明,可提供一種黏著帶,該黏著帶對「可能藉由光照射而進行反應的被黏著體」可容易地剝離,並且抑制對被黏著體之污染。According to the present invention, it is possible to provide an adhesive tape that can easily peel off the "adherent body that may react by light irradiation" and suppress contamination of the adherend.

以下,列舉實施例對本發明之態樣進一步詳細地說明,但本發明並不僅限定於該等實施例。Hereinafter, the present invention will be described in further detail with reference to examples, but the present invention is not limited to these examples.

(脫模劑A之製造) 準備具備溫度計、攪拌機、冷凝管、氮氣導入管、三通閥之反應器。向該反應器內添加作為(甲基)丙烯酸烷基酯之甲基丙烯酸異莰基酯30重量份、甲基丙烯酸-2-乙基己酯30重量份、作為具有矽原子及/或氟原子之單體之末端甲基丙烯酸改質聚二甲基矽氧烷(矽氧烷重量平均分子量為1×103 )20重量份。又,添加作為具有氟之單體之2-全氟甲基丙烯酸己基乙酯20重量份、作為含有官能基之單體之甲基丙烯酸羥基乙酯1重量份。進而向反應器內添加月桂硫醇0.01重量份、乙酸乙酯80重量份後,加熱反應器而開始回流。繼而,向上述反應器內添加作為聚合起始劑之偶氮雙二甲基戊腈0.01重量份、2-甲基-2-丁基碲基(tellanyl)-丙酸乙酯0.01重量份,於設定為75℃之熱水浴中加溫反應器,藉此開始聚合。然後,於聚合開始8小時後,獲得以固形物成分55重量%含有脫模劑A之乙酸乙酯溶液,該脫模劑A為無規地具有下述結構式(2-1)、下述結構式(2-2)、下述結構式(2-3)、下述結構式(2-4)及下述結構式(2-5)所表示之結構的具有矽原子及氟原子之化合物。具有矽原子及氟原子之化合物中之下述結構式(2-1)、下述結構式(2-2)、下述結構式(2-3)、下述結構式(2-4)及下述結構式(2-5)所表示之結構單元之組成比(整數比)為1:20:20:30:1。又,具有矽原子及氟原子之化合物之重量平均分子量約為2×104(Manufacture of release agent A) Prepare a reactor equipped with a thermometer, agitator, condenser tube, nitrogen introduction tube, and three-way valve. To this reactor, 30 parts by weight of isobornyl methacrylate as alkyl (meth)acrylate, 30 parts by weight of 2-ethylhexyl methacrylate, as having silicon atoms and/or fluorine atoms are added The terminal methacrylic acid modified polydimethylsiloxane (the weight average molecular weight of the siloxane is 1×10 3 ) is 20 parts by weight. Furthermore, 20 parts by weight of 2-perfluorohexyl ethyl methacrylate as a monomer having fluorine and 1 part by weight of hydroxyethyl methacrylate as a monomer containing functional groups were added. Furthermore, after 0.01 part by weight of lauryl mercaptan and 80 parts by weight of ethyl acetate were added to the reactor, the reactor was heated to start reflux. Then, 0.01 parts by weight of azobisdimethylvaleronitrile and 0.01 parts by weight of 2-methyl-2-butyltellanyl-ethyl propionate as polymerization initiators were added to the above reactor in The reactor was heated in a hot water bath set at 75°C, thereby starting polymerization. Then, 8 hours after the start of polymerization, an ethyl acetate solution containing 55% by weight of a solid component containing a mold release agent A, which had the following structural formula (2-1) and the following randomly Compound having a silicon atom and a fluorine atom in the structure represented by the structural formula (2-2), the following structural formula (2-3), the following structural formula (2-4) and the following structural formula (2-5) . Among the compounds having silicon atoms and fluorine atoms, the following structural formula (2-1), the following structural formula (2-2), the following structural formula (2-3), the following structural formula (2-4) and The composition ratio (integer ratio) of the structural units represented by the following structural formula (2-5) is 1:20:20:30:1. In addition, the weight average molecular weight of the compound having silicon atoms and fluorine atoms is about 2×10 4 .

Figure 02_image003
Figure 02_image003

(脫模劑B之製造) 使2-全氟甲基丙烯酸己基乙酯之摻合量為40重量份,不添加末端甲基丙烯酸改質聚二甲基矽氧烷,除此以外,與脫模劑A之製造相同。獲得脫模劑B之乙酸乙酯溶液,該脫模劑B為無規地具有下述結構式(3-1)、下述結構式(3-2)、下述結構式(3-3)及下述結構式(3-4)所表示之結構的具有氟原子之化合物。具有氟原子之化合物中之下述結構式(3-1)、下述結構式(3-2)、下述結構式(3-3)及下述結構式(3-4)所表示之結構單元之組成比(整數比)為1:40:30:30。(Manufacture of release agent B) The blending amount of 2-perfluorohexyl ethyl methacrylate was 40 parts by weight, and it was the same as the production of the release agent A except that the terminal methacrylic acid modified polydimethylsiloxane was not added. An ethyl acetate solution of a mold release agent B was obtained. The mold release agent B randomly had the following structural formula (3-1), the following structural formula (3-2), and the following structural formula (3-3) And a compound having a fluorine atom of the structure represented by the following structural formula (3-4). The structure represented by the following structural formula (3-1), the following structural formula (3-2), the following structural formula (3-3) and the following structural formula (3-4) in the compound having a fluorine atom The composition ratio (integer ratio) of the units is 1:40:30:30.

Figure 02_image005
Figure 02_image005

(脫模劑C之製造) 使末端甲基丙烯酸改質聚二甲基矽氧烷之摻合量為40重量份,不添加2-全氟甲基丙烯酸己基乙酯,除此以外,與脫模劑A之製造相同。獲得脫模劑C之乙酸乙酯溶液,該脫模劑C為無規地具有下述結構式(4-1)、下述結構式(4-2)、下述結構式(4-3)及下述結構式(4-4)所表示之結構的具有矽原子之化合物。具有矽原子之化合物中之下述結構式(4-1)、下述結構式(4-2)、下述結構式(4-3)及下述結構式(4-4)所表示之結構單元之組成比(整數比)為1:40:30:30。(Manufacture of release agent C) The blending amount of the terminal methacrylic acid modified polydimethylsiloxane is 40 parts by weight, and the production of the release agent A is the same except that hexyl ethyl 2-perfluoromethacrylate is not added. An ethyl acetate solution of a mold release agent C was obtained. The mold release agent C randomly had the following structural formula (4-1), the following structural formula (4-2), and the following structural formula (4-3) And a compound having a silicon atom with a structure represented by the following structural formula (4-4). The structure represented by the following structural formula (4-1), the following structural formula (4-2), the following structural formula (4-3) and the following structural formula (4-4) in the compound having a silicon atom The composition ratio (integer ratio) of the units is 1:40:30:30.

Figure 02_image007
Figure 02_image007

(脫模劑D之製造) 相對於脫模劑C之乙酸乙酯溶液之樹脂固形物成分100重量份,添加3.5重量份之甲基丙烯酸2-異氰酸基乙酯而進行反應。獲得脫模劑D之乙酸乙酯溶液,該脫模劑D為無規地具有下述結構式(5-1)、下述結構式(5-2)、下述結構式(5-3)及下述結構式(5-4)所表示之結構的具有碳-碳雙鍵基及矽原子之化合物。具有碳-碳雙鍵基及矽原子之化合物中之下述結構式(5-1)、下述結構式(5-2)、下述結構式(5-3)及下述結構式(5-4)所表示之結構單元之組成比(整數比)為1:40:30:30。(Manufacture of release agent D) To 100 parts by weight of the resin solid content of the ethyl acetate solution of the mold release agent C, 3.5 parts by weight of 2-isocyanatoethyl methacrylate was added and reacted. An ethyl acetate solution of a mold release agent D was obtained. The mold release agent D had the following structural formula (5-1), the following structural formula (5-2), and the following structural formula (5-3) randomly. And the compound represented by the following structural formula (5-4) having a carbon-carbon double bond group and a silicon atom. In the compound having a carbon-carbon double bond group and a silicon atom, the following structural formula (5-1), the following structural formula (5-2), the following structural formula (5-3), and the following structural formula (5 -4) The composition ratio (integer ratio) of the represented structural units is 1:40:30:30.

Figure 02_image009
Figure 02_image009

(脫模劑E之製造) 使末端甲基丙烯酸改質聚二甲基矽氧烷之摻合量為40重量份,使甲基丙烯酸羥基乙酯之摻合量為2重量份,除此以外,以與脫模劑A之製造相同之方式,獲得含有「含有官能基之(甲基)丙烯酸系聚合物」之乙酸乙酯溶液。相對於所獲得之含有「含有官能基之(甲基)丙烯酸系聚合物」之乙酸乙酯溶液之樹脂固形物成分100重量份,添加1.3重量份之甲基丙烯酸2-異氰酸基乙酯而進行反應。獲得脫模劑E之乙酸乙酯溶液,該脫模劑E為無規地具有下述結構式(6-1)、下述結構式(6-2)、下述結構式(6-3)、下述結構式(6-4)及下述結構式(6-5)所表示之結構的具有碳-碳雙鍵基、羥基及矽原子之化合物。具有碳-碳雙鍵基、羥基及矽原子之化合物中之下述結構式(6-1)、下述結構式(6-2)、下述結構式(6-3)、下述結構式(6-4)及下述結構式(6-5)所表示之結構單元之組成比(整數比)為1:1:40:30:30。(Manufacture of release agent E) The blending amount of the terminal methacrylic acid modified polydimethylsiloxane is 40 parts by weight, and the blending amount of hydroxyethyl methacrylate is 2 parts by weight. In the same manner as above, an ethyl acetate solution containing "(meth)acrylic polymer containing functional groups" was obtained. 1.3 parts by weight of 2-isocyanatoethyl methacrylate was added to 100 parts by weight of the resin solid content of the obtained ethyl acetate solution containing "(meth)acrylic polymer containing functional groups" And react. An ethyl acetate solution of a mold release agent E was obtained. The mold release agent E randomly had the following structural formula (6-1), the following structural formula (6-2), and the following structural formula (6-3) , A compound having a carbon-carbon double bond group, a hydroxyl group, and a silicon atom having the structure represented by the following structural formula (6-4) and the following structural formula (6-5). The following structural formula (6-1), the following structural formula (6-2), the following structural formula (6-3), the following structural formula in the compound having a carbon-carbon double bond group, a hydroxyl group and a silicon atom The composition ratio (integer ratio) of structural units represented by (6-4) and the following structural formula (6-5) is 1:1:40:30:30.

Figure 02_image011
Figure 02_image011

(實施例1) (光硬化型黏著劑之製造) 準備具備溫度計、攪拌機、冷凝管之反應器,向該反應器內添加作為(甲基)丙烯酸烷基酯之丙烯酸-2-乙基己酯94重量份、作為含有官能基之單體之甲基丙烯酸羥基乙酯6重量份、月桂硫醇0.01重量份及乙酸乙酯80重量份後,加熱反應器而開始回流。繼而,向上述反應器內添加作為聚合起始劑之1,1-雙(過氧化第三己基)-3,3,5-三甲基環己烷0.01重量份,於回流下開始聚合。其次,於聚合開始1小時後及2小時後,亦各添加0.01重量份之1,1-雙(過氧化第三己基)-3,3,5-三甲基環己烷,進而,於聚合開始4小時後添加過氧化特戊酸第三己酯0.05重量份並繼續聚合反應。然後,於聚合開始8小時後,獲得固形物成分為55重量%、重量平均分子量為60萬之含有官能基之(甲基)丙烯酸系聚合物之乙酸乙酯溶液。 相對於所獲得之含有「含有官能基之(甲基)丙烯酸系聚合物」之乙酸乙酯溶液之樹脂固形物成分100重量份,添加作為含有官能基之不飽和化合物之甲基丙烯酸2-異氰酸基乙酯3.5重量份並使其反應而獲得聚合性聚合物之乙酸乙酯溶液。 相對於所獲得之聚合性聚合物之乙酸乙酯溶液之樹脂固形物成分100重量份,將脫模劑A5重量份、異氰酸酯系交聯劑15.0重量份、光聚合起始劑2重量份加以混合,獲得構成黏著劑層之光硬化型黏著劑之乙酸乙酯溶液。再者,異氰酸酯系交聯劑、光聚合起始劑係使用下述者。 異氰酸酯系交聯劑:Coronate L,Nippon Urethane Industry公司製造 光聚合起始劑:Irgacure 369,BASF公司製造(Example 1) (Manufacture of light-curing adhesive) A reactor equipped with a thermometer, a stirrer, and a condenser is prepared, and 94 parts by weight of 2-ethylhexyl acrylate as an alkyl (meth)acrylate and methyl as a functional group-containing monomer are added to the reactor After 6 parts by weight of hydroxyethyl acrylate, 0.01 parts by weight of lauryl mercaptan, and 80 parts by weight of ethyl acetate, the reactor was heated to start reflux. Then, 0.01 parts by weight of 1,1-bis(third hexyl peroxide)-3,3,5-trimethylcyclohexane as a polymerization initiator was added to the above-mentioned reactor, and polymerization was started under reflux. Secondly, after 1 hour and 2 hours after the start of the polymerization, 0.01 parts by weight of 1,1-bis(trihexyl peroxide)-3,3,5-trimethylcyclohexane were also added, and then, the polymerization Four hours after the start, 0.05 parts by weight of trihexyl peroxypivalate was added and the polymerization reaction was continued. Then, 8 hours after the start of polymerization, an ethyl acetate solution of a functional group-containing (meth)acrylic polymer having a solid content of 55% by weight and a weight average molecular weight of 600,000 was obtained. To 100 parts by weight of the resin solid content of the obtained ethyl acetate solution containing "(meth)acrylic polymer containing functional group", 2-isomethacrylic acid, which is an unsaturated compound containing functional group, is added 3.5 parts by weight of ethyl cyanoacetate was reacted to obtain an ethyl acetate solution of a polymerizable polymer. 5 parts by weight of the release agent A, 15.0 parts by weight of the isocyanate-based crosslinking agent, and 2 parts by weight of the photopolymerization initiator were mixed with respect to 100 parts by weight of the resin solid content of the ethyl acetate solution of the obtained polymerizable polymer To obtain an ethyl acetate solution of the light-curing adhesive that constitutes the adhesive layer. In addition, the isocyanate-based crosslinking agent and the photopolymerization initiator system used the following. Isocyanate-based crosslinking agent: Coronate L, manufactured by Nippon Urethane Industry Photopolymerization initiator: Irgacure 369, manufactured by BASF

(黏著帶之製造) 作為基材,準備75 μm之聚對苯二甲酸乙二酯(PET)膜,將所獲得之光硬化型黏著劑之乙酸乙酯溶液用刮刀以乾燥皮膜之厚度成為75 μm之方式塗佈於基材上,於110℃加熱5分鐘而使塗佈溶液乾燥,獲得黏著帶。(Manufacture of adhesive tape) As a base material, a 75 μm polyethylene terephthalate (PET) film was prepared, and the ethyl acetate solution of the obtained photocurable adhesive was applied to the dry film with a doctor blade so that the thickness of the dry film became 75 μm. On the substrate, the coating solution was dried by heating at 110°C for 5 minutes to obtain an adhesive tape.

(貼合剝離力之測定) 以橡膠輥將雙面膠帶(壓克力泡沫基材強接著雙面膠帶,HYPERJOINT H9004,日東電工公司製造)貼附於聚甲基丙烯酸甲酯板(PMMA板)之整面。去除所貼附之雙面膠帶之剝離紙,以橡膠輥貼附切割為與PMMA板相同大小之黏著帶之基材側,藉此以雙面膠帶將PMMA板與黏著帶之基材側貼合。使用2 kg之壓接橡膠輥以10 mm/sec之速度將貼附於PMMA板之黏著帶之黏著層側與切割為25 mm寬度之同類黏著帶之黏著層側貼合,獲得試驗樣品。對所獲得之試驗樣品,使用高壓水銀UV照射機,以對黏著帶表面之照射強度成為50 mW/cm2 之方式調節照度而照射365 nm之紫外線8秒。其後,對切割為25 mm寬度之黏著帶,使用拉伸試驗機(角度自由型黏著,皮膜剝離分析裝置VPA-2S,協和界面科學公司製造),依據JIS Z0237,以剝離速度2400 mm/分鐘進行180°方向之拉伸試驗,測定180°剝離強度(gf/25 mm),獲得貼合剝離力。(Measurement of the peeling force of lamination) The double-sided tape (acrylic foam base material strongly adhered to the double-sided tape, HYPERJOINT H9004, manufactured by Nitto Denko Corporation) is attached to the polymethyl methacrylate board (PMMA board) with a rubber roller The whole face. Remove the peeling paper of the attached double-sided tape, and use a rubber roller to cut and cut the substrate side of the adhesive tape of the same size as the PMMA board, thereby bonding the PMMA board and the substrate side of the adhesive tape with double-sided tape . Using a 2 kg pressure-bonding rubber roller at a speed of 10 mm/sec, the adhesive layer side of the adhesive tape attached to the PMMA board was bonded to the adhesive layer side of the same adhesive tape cut to a width of 25 mm to obtain a test sample. The obtained test sample was irradiated with ultraviolet light at 365 nm for 8 seconds using a high-pressure mercury UV irradiator to adjust the illuminance so that the irradiation intensity on the surface of the adhesive tape became 50 mW/cm 2 . Thereafter, for the adhesive tape cut to a width of 25 mm, a tensile tester (angle-free adhesion, film peeling analysis device VPA-2S, manufactured by Kyowa Interface Science Co., Ltd.) was used at a peeling speed of 2400 mm/min according to JIS Z0237 A tensile test in the 180° direction was carried out, and the 180° peel strength (gf/25 mm) was measured to obtain the peeling force.

(光硬化後之剝離力之測定) 將黏著帶裁剪為25 mm寬度之短條狀而製作試片。以黏著劑層成為對向於PMMA板之狀態之方式將試片置於PMMA板(Delaglas A999,透明,2 mm×50 mm×100 mm,旭化成公司製造)上。其次,於試片上以10 mm/sec之速度使2 kg之橡膠輥往返一次,藉此將試片與PMMA板貼合而製成試驗樣品。對所獲得之試驗樣品,使用高壓水銀UV照射機,以對黏著帶表面之照射強度成為50 mW/cm2 之方式調節照度而照射365 nm之紫外線8秒。其後,使用拉伸試驗機(角度自由型黏著,皮膜剝離分析裝置VPA-2S,協和界面科學公司製造),於溫度23℃、相對濕度50%靜置24小時,依據JIS Z0237,以剝離速度2400 mm/分鐘進行180°方向之拉伸試驗,測定180°剝離強度(N/25 mm)。(Measurement of peeling force after light curing) Cut the adhesive tape into a short strip of 25 mm width to prepare a test piece. Place the test piece on the PMMA board (Delaglas A999, transparent, 2 mm×50 mm×100 mm, manufactured by Asahi Kasei Corporation) in such a manner that the adhesive layer becomes opposed to the PMMA board. Next, a 2 kg rubber roller was made to reciprocate once on the test piece at a speed of 10 mm/sec, thereby bonding the test piece to the PMMA board to make a test sample. The obtained test sample was irradiated with ultraviolet light at 365 nm for 8 seconds using a high-pressure mercury UV irradiator to adjust the illuminance so that the irradiation intensity on the surface of the adhesive tape became 50 mW/cm 2 . After that, using a tensile tester (angle-free adhesion, film peeling analysis device VPA-2S, manufactured by Kyowa Interface Science Co., Ltd.), it was allowed to stand at a temperature of 23° C. and a relative humidity of 50% for 24 hours, at a peeling speed according to JIS Z0237 The tensile test at 180° direction was conducted at 2400 mm/min, and the 180° peel strength (N/25 mm) was measured.

(接觸角變化率之測定) 使用PMMA板(Delaglas A999,透明,2 mm×50 mm×100 mm,旭化成公司製造)。使用2 kg之壓接橡膠輥以10 mm/sec之速度將25 mm寬度之黏著帶貼附於PMMA板。其後,於室溫23℃、相對濕度50%靜置1天而獲得試驗樣品。對所獲得之試驗樣品,使用高壓水銀UV照射機,以對黏著帶表面之照射強度成為50 mW/cm2 之方式調節照度而照射365 nm之紫外線8秒,其後剝離黏著帶。依據JIS R3257 靜滴法,使用KRUSS公司製造之全自動手持接觸角計/表面自由能分析MSA,對PMMA板之貼附過黏著帶之部分對水之接觸角A進行測定。其次,對未貼附過黏著帶之PMMA板之接觸角B進行測定,藉由下述式(I)算出接觸角變化率。再者,水之滴加量設為3 μL。 接觸角變化率(%)=((接觸角A/接觸角B)-1)×100           (I)(Measurement of contact angle change rate) PMMA board (Delaglas A999, transparent, 2 mm×50 mm×100 mm, manufactured by Asahi Kasei Corporation) was used. Use a 2 kg pressure-bonded rubber roller to attach a 25 mm wide adhesive tape to the PMMA board at a speed of 10 mm/sec. Thereafter, the test sample was obtained by standing at room temperature 23° C. and 50% relative humidity for 1 day. The obtained test sample was irradiated with ultraviolet light at 365 nm for 8 seconds by adjusting the illuminance so that the irradiation intensity on the surface of the adhesive tape became 50 mW/cm 2 using a high-pressure mercury UV irradiator, and then the adhesive tape was peeled off. According to the JIS R3257 static drop method, a fully automatic handheld contact angle meter/surface free energy analysis MSA manufactured by KRUSS is used to measure the contact angle A of the water on the part of the PMMA board to which the adhesive tape is attached. Next, the contact angle B of the PMMA board to which the adhesive tape has not been attached is measured, and the contact angle change rate is calculated by the following formula (I). In addition, the drop amount of water was set to 3 μL. Change rate of contact angle (%) = ((contact angle A/contact angle B)-1)×100 (I)

(實施例2~12、比較例1、2) 使所使用之脫模劑、交聯劑之種類及摻合量為表1、2記載者,除此以外,以與實施例1相同之方式獲得黏著帶。再者,環氧系交聯劑使用綜研化學公司製造之E-5XM。(Examples 2 to 12, Comparative Examples 1, 2) The adhesive tape was obtained in the same manner as in Example 1 except that the types and blending amounts of the mold release agent and crosslinking agent used were as described in Tables 1 and 2. In addition, as the epoxy-based cross-linking agent, E-5XM manufactured by Soken Chemical Co., Ltd. was used.

<評價> 對實施例、比較例中獲得之表面保護膜進行以下之評價。將結果示於表1、2。<Evaluation> The surface protection films obtained in Examples and Comparative Examples were evaluated as follows. The results are shown in Tables 1 and 2.

(剝離性之評價) 將所獲得之黏著帶裁剪為25 mm寬度。於室溫23℃、相對濕度50%使用2 kg之壓接橡膠輥以10 mm/sec之速度將所裁剪之黏著帶貼附於具有硬塗層之PMMA板(Acrylite MR-200,三菱化學公司製造)。放置30分鐘後,使用高壓水銀UV照射機,以對黏著帶表面之照射強度成為50 mW/cm2 之方式調節照度而自基材側照射365 nm之紫外線8秒,從而使黏著劑層硬化。其後,依據JIS Z0237,以2400 mm/分鐘之速度剝離黏著帶而測定180度剝離強度。對於所獲得之180度剝離強度,將4.5 gf/inch以下之情況設為「◎」、大於4.5 gf/inch且9.0 gf/inch以下之情況設為「〇」、大於9.0 gf/inch且30.0 gf/inch以下之情況設為「Δ」、大於30.0 gf/inch之情況設為「×」而評價剝離性。(Evaluation of peelability) The obtained adhesive tape was cut to a width of 25 mm. Attach the cut adhesive tape to the PMMA board with hard coating (Acrylite MR-200, Mitsubishi Chemical Corporation) at a room temperature of 23°C and a relative humidity of 50% using a 2 kg pressure-bonded rubber roller at a speed of 10 mm/sec manufacture). After being left for 30 minutes, using a high-pressure mercury UV irradiator, the illuminance was adjusted so that the irradiation intensity on the surface of the adhesive tape became 50 mW/cm 2 , and 365 nm ultraviolet rays were irradiated from the substrate side for 8 seconds to harden the adhesive layer. Thereafter, in accordance with JIS Z0237, the adhesive tape was peeled at a speed of 2400 mm/min to measure the 180-degree peel strength. Regarding the obtained 180-degree peel strength, the case of 4.5 gf/inch or less is set to "◎", the case of greater than 4.5 gf/inch and less than 9.0 gf/inch is set to "〇", the case of greater than 9.0 gf/inch and 30.0 gf The case of /inch or less is set to "Δ", and the case of more than 30.0 gf/inch is set to "×", and the peelability is evaluated.

(黏著力之變化率之評價) 將所獲得之黏著帶裁剪為25 mm寬度。於室溫23℃、相對濕度50%使用2 kg之壓接橡膠輥以10 mm/sec之速度將所裁剪之黏著帶貼附於PMMA板(Delaglas A999,透明,2 mm×50 mm×100 mm,旭化成公司製造)。其後,於室溫23℃、相對濕度50%靜置1天,剝離黏著帶。其次,於室溫23℃、相對濕度50%使用2 kg之壓接橡膠輥以10 mm/sec之速度將18 mm寬度之透明隱形膠帶(810-3-18,3M公司製造)貼附於PMMA板之貼附過黏著帶之部分。其後,依據JIS Z0237,以300 mm/分鐘之速度剝離隱形膠帶而測定180度剝離強度A。又,於室溫23℃、相對濕度50%使用2 kg之壓接橡膠輥以10 mm/sec之速度將上述隱形膠帶貼附於未貼附過黏著帶之PMMA板。其後,依據JIS Z0237,以300 mm/分鐘之速度剝離隱形膠帶而測定180度剝離強度B。將所獲得之隱形膠帶之180度剝離強度B與隱形膠帶對貼附上述黏著帶後之PMMA板之180度剝離強度A進行比較,藉由下述式(II)評價黏著力之變化率。 黏著力變化率(%)=((180度剝離強度A/180度剝離強度B)-1)×100             (II) 將剝離強度之差為±5%以內之情況設為「◎」、大於±5%且為±10%以內之情況設為「〇」、大於±10%且為±30%以內之情況設為「Δ」、大於±30%之情況設為「×」而評價黏著力之變化率。(Evaluation of change rate of adhesion) The obtained adhesive tape was cut to a width of 25 mm. Attach the cut adhesive tape to the PMMA board (Delaglas A999, transparent, 2 mm×50 mm×100 mm) at a room temperature of 23° C. and a relative humidity of 50% using a 2 kg crimping rubber roller at a speed of 10 mm/sec , Manufactured by Asahi Kasei Corporation). Thereafter, it was allowed to stand at room temperature 23°C and 50% relative humidity for 1 day, and the adhesive tape was peeled off. Secondly, at a room temperature of 23°C and a relative humidity of 50%, use a 2 kg pressure-bonded rubber roller to attach an 18 mm wide transparent invisible tape (810-3-18, manufactured by 3M) to PMMA at a speed of 10 mm/sec. The part of the board pasted the adhesive tape. Thereafter, in accordance with JIS Z0237, the invisible tape was peeled at a speed of 300 mm/min to measure the 180-degree peel strength A. At a room temperature of 23°C and a relative humidity of 50%, a 2 kg pressure-bonded rubber roller was used to attach the above-mentioned invisible tape to the PMMA board to which no adhesive tape had been attached at a speed of 10 mm/sec. Thereafter, in accordance with JIS Z0237, the invisible tape was peeled at a speed of 300 mm/min to measure the 180-degree peel strength B. The 180-degree peel strength B of the obtained invisible tape was compared with the 180-degree peel strength A of the PMMA board after the above-mentioned adhesive tape was attached to the invisible tape, and the change rate of the adhesive force was evaluated by the following formula (II). Adhesive force change rate (%) = ((180 degree peel strength A/180 degree peel strength B)-1)×100 100 (II) When the difference in peel strength is within ±5% is set to "◎", when it is greater than ±5% and within ±10%, it is set to "〇", and when it is greater than ±10% and within ±30%, it is set to When "Δ" and more than ±30% are set as "×", the change rate of adhesive force is evaluated.

[表1]

Figure 108120301-A0304-0001
[Table 1]
Figure 108120301-A0304-0001

[表2]

Figure 108120301-A0304-0002
[產業上之可利用性][Table 2]
Figure 108120301-A0304-0002
[Industry availability]

根據本發明,可提供一種黏著帶,該黏著帶對「可能藉由光照射而進行反應的被黏著體」可容易地剝離,並且抑制對被黏著體之污染。According to the present invention, it is possible to provide an adhesive tape that can easily peel off the "adherent body that may react by light irradiation" and suppress contamination of the adherend.

no

no

Claims (8)

一種黏著帶,其具有黏著劑層,上述黏著劑層含有光硬化型黏著劑, 將2個上述黏著帶之黏著劑層相互貼合並進行光硬化後,2個上述黏著帶之剝離力為75 gf/inch以下,將上述黏著帶貼附於聚甲基丙烯酸甲酯板並進行光硬化,剝離上述黏著帶後,上述聚甲基丙烯酸甲酯板之貼附過上述黏著帶之部分對水之接觸角與貼附上述黏著帶前之聚甲基丙烯酸甲酯板對水之接觸角的差為±20%以內。An adhesive tape having an adhesive layer, the adhesive layer containing a light-curing adhesive, After two adhesive layers of the above-mentioned adhesive tape are attached to each other and photo-hardened, the peeling force of the two above-mentioned adhesive tapes is 75 gf/inch or less, and the above-mentioned adhesive tape is attached to a polymethyl methacrylate board and subjected to light After hardening and peeling the adhesive tape, the contact angle of the part of the polymethyl methacrylate board past the adhesive tape to water and the contact angle of the polymethyl methacrylate board before the adhesive tape to water The difference is within ±20%. 如請求項1所述之黏著帶,其中,上述黏著劑層含有0.1~20重量%之交聯劑。The adhesive tape according to claim 1, wherein the adhesive layer contains 0.1 to 20% by weight of a cross-linking agent. 如請求項1或2所述之黏著帶,其中,上述黏著劑層含有:具有矽原子及/或氟原子之化合物。The adhesive tape according to claim 1 or 2, wherein the adhesive layer contains a compound having silicon atoms and/or fluorine atoms. 如請求項3所述之黏著帶,其中,上述具有矽原子及/或氟原子之化合物具有碳-碳雙鍵。The adhesive tape according to claim 3, wherein the compound having a silicon atom and/or a fluorine atom has a carbon-carbon double bond. 如請求項3所述之黏著帶,其中,上述黏著劑層含有交聯劑,上述具有矽原子及/或氟原子之化合物具有可與上述交聯劑反應之官能基。The adhesive tape according to claim 3, wherein the adhesive layer contains a crosslinking agent, and the compound having a silicon atom and/or a fluorine atom has a functional group that can react with the crosslinking agent. 2、3、4或5所述之黏著帶,其中,於上述黏著劑層之一面具有基材。2. The adhesive tape according to 2, 3, 4 or 5, wherein a substrate is provided on one surface of the adhesive layer. 2、3、4、5或6所述之黏著帶,其光硬化後對聚甲基丙烯酸甲酯板之剝離力為50 gf/inch以下。2. The adhesive tape as described in 2, 3, 4, 5 or 6 has a peeling force of less than 50 gf/inch on the polymethyl methacrylate board after light curing. 2、3、4、5、6或7所述之黏著帶,其用於製造電子零件。2. The adhesive tape as described in 2, 3, 4, 5, 6 or 7 is used to manufacture electronic parts.
TW108120301A 2018-06-13 2019-06-12 Adhesive tape TW202018038A (en)

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JP2005320377A (en) * 2004-05-06 2005-11-17 Sekisui Chem Co Ltd Adhesive tape with metal foil and circuit transfer tape
JP2007091818A (en) * 2005-09-27 2007-04-12 Fujifilm Corp Ultraviolet-curing type removable pressure bonding composition and removable adhesive converted paper
KR100942363B1 (en) * 2007-12-03 2010-02-12 제일모직주식회사 UV Curable PSAPressure-Sensitive Adhesive Acrylic Binder Resin containing fluorine and Adhesive Tape Using the Same
JP2015063587A (en) * 2013-09-24 2015-04-09 東洋インキScホールディングス株式会社 Re-releasable adhesive agent
JP6383211B2 (en) * 2014-08-01 2018-08-29 三星エスディアイ株式会社SAMSUNG SDI Co., LTD. Adhesive composition, optical member and adhesive sheet
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