TW202017087A - Conveying method and device of chip stripping-folding process, and equipment using the same by using a second conveying module to convey the strip-like chip on the temporary placement portion to be placed in a material basket for collection - Google Patents

Conveying method and device of chip stripping-folding process, and equipment using the same by using a second conveying module to convey the strip-like chip on the temporary placement portion to be placed in a material basket for collection Download PDF

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TW202017087A
TW202017087A TW107137379A TW107137379A TW202017087A TW 202017087 A TW202017087 A TW 202017087A TW 107137379 A TW107137379 A TW 107137379A TW 107137379 A TW107137379 A TW 107137379A TW 202017087 A TW202017087 A TW 202017087A
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wafer
strip
peeling process
conveying
seat
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TW107137379A
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Chinese (zh)
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TWI683389B (en
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董聖鑫
黃子葳
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萬潤科技股份有限公司
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Priority to TW107137379A priority Critical patent/TWI683389B/en
Priority to CN201821853052.3U priority patent/CN209177569U/en
Priority to CN201811337179.4A priority patent/CN111086879A/en
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Publication of TW202017087A publication Critical patent/TW202017087A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Folding Of Thin Sheet-Like Materials, Special Discharging Devices, And Others (AREA)

Abstract

The present invention provides a conveying method and device of chip stripping-folding process, and equipment using the same. The conveying method includes: placing a strip-like chip after stripping-folding on a positioning portion of a positioning device; performing a first conveying step for using a first conveying module to convey the strip-like chip on the positioning portion to a temporary placement portion of a placement seat; and performing a second conveying step for using a second conveying module to convey the strip-like chip on the temporary placement portion to be placed in a material basket for collection. Thus, the strip-like chip may be conveyed and collected after stripping-folding.

Description

晶片剝折製程的搬送方法、裝置及使用該裝置的設備Method and device for conveying wafer peeling process and equipment using the same

本發明係有關於一種搬送方法、裝置及使用該裝置的設備,尤指一種使用在晶片型電阻的製程中,用以將待剝條晶片剝折成條狀晶片後進行搬送收集的晶片剝折製程的搬送方法、裝置及使用該裝置的設備。The present invention relates to a conveying method, device and equipment using the device, in particular to a wafer stripping method used in the process of wafer-type resistors for stripping wafers to be stripped into strip-shaped wafers for transportation and collection Process transportation method, device and equipment using the device.

按,一般晶片型的電阻通常採用片狀的晶片加工多層的電鍍 層後,再經剝折成條狀晶片,然後再由條狀晶片剝折成粒狀電阻,此類由片狀晶片剝折成條狀晶片的設備一般稱為堆疊機,由條狀晶片剝折成粒狀電阻的設備一般稱為折粒機;由片狀的晶片剝折成條狀晶片的製程可參考例如申請人取得的新型第M448052號「晶片的剝離裝置」、第M445766號「晶片的傳送裝置」、第M445761號「晶片的收集裝置」、第M445762號「晶片的堆疊裝置」等專利案;此類由片狀晶片剝折成條狀晶片的製程中,常將片狀晶片置於例如該第M448052號「晶片的剝離裝置」中的一剝折機構中一擺座上受一推送機構推送,使片狀晶片前端受一搬送裝置定位後,藉受偏心輪驅動的連桿帶動該剝折機構的該擺座作上、下擺動,來使片狀晶片受該搬送裝置定位的部份被剝折成條狀晶片;其中,該搬送裝置例如該第M445766號「晶片的傳送裝置」中的傳送輪,該傳送輪受一驅動機構所驅動而可作間歇性轉動;傳送輪的圓周上開設多數嵌槽,傳送輪形成一入料側及一出料側;使物料於傳送輪入料側進入嵌槽,並經傳送輪傳送至出料側受一收集裝置攫取並堆疊收集;其中,該收集裝置例如該第M445761號「晶片的收集裝置」,其係以一取料機構自該傳送輪出料側提取條狀晶片,再由置料機構吸取以置入料框中收集。According to the general wafer-type resistance, usually a chip wafer is used to process a multi-layer electroplated layer, and then stripped into a strip wafer, and then stripped from the strip wafer into a granular resistor, such stripped from the chip wafer The equipment for strip wafers is generally called a stacker, and the equipment for stripping wafers into granular resistors is generally called a pelletizer; the process for stripping wafers into strips can be obtained by referring to the applicant, for example Patent Nos. M448052 "Wafer Stripping Device", M445766 "Wafer Transfer Device", M445761 "Wafer Collection Device", M445762 "Wafer Stacking Device" and other patent cases; such In the process of peeling a wafer into a strip wafer, the wafer is often placed on a swing seat in a peeling mechanism in the M448052 "wafer peeling device", for example, and pushed by a pushing mechanism to make the wafer wafer After the front end is positioned by a transport device, the connecting rod driven by the eccentric wheel drives the swing seat of the peeling mechanism to swing up and down, so that the portion of the chip wafer that is positioned by the transport device is stripped into a strip shape Wafer; wherein, the conveying device is, for example, the conveying wheel in the M445766 "wafer conveying device", the conveying wheel is driven by a driving mechanism and can be intermittently rotated; a plurality of insertion grooves are provided on the circumference of the conveying wheel to convey The wheel forms a feed side and a discharge side; the material enters the insertion groove on the feed side of the transfer wheel, and is transferred to the discharge side through the transfer wheel to be grabbed by a collection device and stacked for collection; wherein, the collection device such as the first M445761 "wafer collection device", which uses a retrieving mechanism to extract the strip-shaped wafers from the discharge side of the conveying wheel, and then sucks the material into the material frame for collection.

惟第M445761號「晶片的收集裝置」的先前技術中,該取料機構自該傳送輪出料側提取條狀晶片係採越過該傳送輪出料側而倒鉤移出並提取該條狀晶片的方式,該方式僅適用於該剝折機構所配合之定位方式係採傳送輪方式者,因該傳送輪圓周上的嵌槽設有呈輻射狀朝外開口,故可越過該傳送輪出料側而以倒鉤移出,若定位方式並非採傳送輪方式,則無法實施;次者該先前技術中,必須該取料機構先自該傳送輪出料側提取條狀晶片,才能再換由置料機構吸取以置入料框中收集,條狀晶片的搬送效率低,無法適用高效率的生產需求,仍有待改進之處。However, in the prior art of No. M445761 "Wafer Collection Device", the retrieving mechanism extracts the strip wafer from the discharge side of the transfer wheel, and moves across the discharge side of the transfer wheel to barb out and extract the strip wafer. This method is only applicable if the positioning method of the peeling mechanism adopts the conveying wheel method. Since the groove on the circumference of the conveying wheel is provided with a radial outward opening, it can cross the discharge side of the conveying wheel However, if the positioning method is not the transfer wheel method, it cannot be implemented. Secondly, in the prior art, the retrieving mechanism must first extract the strip wafer from the discharge side of the transfer wheel before changing the material. The mechanism draws and puts it into the material frame for collection. The transfer efficiency of the strip wafers is low, and it is not suitable for high-efficiency production needs. There is still room for improvement.

爰是,本發明的目的,在於提供一種可用以搬送剝折後條狀晶片的晶片剝折製程的搬送方法。It is an object of the present invention to provide a transfer method for a wafer peeling process that can be used to transport stripped wafers after peeling.

本發明的另一目的,在於提供一種可用以搬送剝折後條狀晶片的晶片剝折製程的搬送裝置。Another object of the present invention is to provide a transfer device for a wafer stripping process that can be used to transfer stripped wafers after stripping.

本發明的又一目的,在於提供一種用以執行如所述晶片剝折製程的搬送方法之裝置。Another object of the present invention is to provide an apparatus for carrying out the transfer method of the wafer peeling process.

本發明的再一目的,在於提供一種使用如所述晶片剝折製程的搬送裝置之設備。Still another object of the present invention is to provide an apparatus using the conveying device of the wafer peeling process.

依據本發明目的之晶片剝折製程的搬送方法,包括:使剝折後的一條狀晶片留置於一定位裝置的一定位部上;執行一第一搬送步驟,以一第一搬送模組將該定位部上的該條狀晶片搬送置於一置放座的一暫置部中;一第二搬送步驟,以一第二搬送模組將該暫置部上的該條狀晶片搬送置於一料框中收集。The transport method of the wafer peeling process according to the purpose of the present invention includes: leaving the stripped wafers on a positioning portion of a positioning device; performing a first transport step, using a first transport module to The strip wafer on the positioning part is transported and placed in a temporary part of a placement base; a second transport step is to transport the strip wafer on the temporary part with a second transport module in a Collect in the feed box.

依據本發明另一目的之晶片剝折製程的搬送裝置,包括:用以將 一定位裝置上一定位部留置的剝折後一條狀晶片搬送至一料框,包括:一置放座,其上設有一暫置部;一第一搬送模組,設有相隔間距的二托架,該托架上設有一托接部,該托接部可位移於該定位裝置的該定位部與該置放座的該暫置部間;一第二搬送模組,設有相隔間距的二吸嘴,該吸嘴可位移於該置放座的該暫置部與該料框間。According to another object of the present invention, a wafer peeling process transfer device includes: a strip device for transferring a stripped wafer left by a positioning portion of a positioning device to a material frame, including: a placement base on which There is a temporary part; a first conveying module is provided with two brackets spaced apart, and a bracket is provided on the bracket, the bracket can be displaced between the positioning part and the placement of the positioning device Between the temporary part of the seat; a second conveying module is provided with two suction nozzles spaced apart, and the suction nozzle can be displaced between the temporary part of the placement seat and the material frame.

依據本發明又一目的之晶片剝折製程的搬送裝置,包括:用以執行如所述晶片剝折製程的搬送方法之裝置。A transport device for a wafer peeling process according to another object of the present invention includes: a device for performing the transport method of the wafer peeling process as described above.

依據本發明再一目的之晶片剝折製程的搬送裝置,使用如所述晶片剝折製程的搬送裝置,包括將一待剝條晶片進行剝折成該條狀晶片的一剝折機構、置放一片狀晶片的一置料機構、將片狀晶片的剝折成該待剝條晶片的一折邊機構、進行搬送該片狀晶片或該待剝條晶片的一搬送機構。According to a further object of the present invention, a wafer peeling process transfer device, using the wafer peeling process transfer device as described above, includes a stripping device for stripping a wafer to be stripped into the strip wafer, and placing A loading mechanism for a sheet wafer, a hemming mechanism for peeling the sheet wafer into the wafer to be stripped, and a transport mechanism for transporting the sheet wafer or the wafer to be stripped.

本發明實施例之晶片剝折製程的搬送方法、裝置及使用該裝置的設備,雖然該剝折後的該條狀晶片留置於該定位裝置的該定位部上,在執行以該第一搬送模組將該定位部上的該條狀晶片搬送置於該置放座的該暫置部中的該第一搬送步驟,及以一第二搬送模組將該暫置部上的該條狀晶片搬送置於一料框中收集的該第二搬送步驟後,可以將順利完成該條狀晶片的搬送、收集,使剝折製程的定位方式無需採傳送輪方式,增加搬送的可應用機會。The method, device and equipment for wafer peeling process of the embodiment of the present invention and the equipment using the device, although the stripped wafer after the peeling is left on the positioning part of the positioning device, the first conveying die is executed The first transfer step of transferring the strip wafer on the positioning part into the temporary part of the placement seat, and using a second transfer module to transfer the strip wafer on the temporary part After the second transfer step of collecting in a material frame is transferred, the transfer and collection of the strip wafer can be successfully completed, so that the positioning method of the peeling process does not need to adopt the transfer wheel method, which increases the application opportunities of the transfer.

請參閱圖1,本發明實施例中用以剝折的晶片為一矩形的片狀晶片A,其具有一矩形區域且表面具積層電鍍層的電阻部位A1,依進行剝折成條狀的剝折順序,該電阻部位A1之X軸向前端形成一段無積層電鍍層的廢料部A2,該電阻部位A1之X軸向後端形成一段無積層電鍍層的夾持部A3,該電阻部位A1之Y軸向兩側分別各形成一段較廢料部A2、夾持部A3狹窄的無積層電鍍層的側邊部A4 、A5;其中,在本發明實施例中,使該側邊部A4、A5分別各區分出包括靠該電阻部位A1的內側邊A41、A51,以及靠電阻部位A1外側的外側邊A42、A52;其中,該外側邊A42、A52包括電阻部位A1、廢料部A2、夾持部A3的邊側部份,而該內側邊A41、A51則僅包括該電阻部位A1的邊側部份;各部位間的分界係如圖1、2所示地分別各在片狀晶片A下表面刻劃有凹溝狀的線痕A6,該電阻部位A1的下表面劃的線痕A6則呈矩陣排列的矩形格狀(圖中未示),每一矩形格為一電阻元件,未來將剝折成格粒狀的電阻元件。Please refer to FIG. 1, the wafer used for peeling in the embodiment of the present invention is a rectangular sheet-shaped wafer A, which has a rectangular area and a resistance portion A1 with a layered plating layer on the surface, which is stripped according to stripping In the order of folding, the front end of the resistance portion A1 in the X-axis direction forms a scrap portion A2 without build-up plating layer, the rear end of the resistance portion A1 in the X-axis direction forms a gripping portion A3 without build-up plating layer, and the resistance portion A1 Each side of the Y-axis is formed with a side section A4 and A5 that are narrower than the scrap section A2 and the clamping section A3 and have no build-up plating layer; in the embodiment of the present invention, the side sections A4 and A5 are respectively made Each division includes the inner sides A41, A51 near the resistance portion A1, and the outer sides A42, A52 outside the resistance portion A1; wherein, the outer sides A42, A52 include the resistance portion A1, the scrap portion A2, and the clip The side portion of the holding portion A3, and the inner sides A41 and A51 include only the side portion of the resistance portion A1; the boundary between each portion is as shown in FIGS. The lower surface of A is engraved with groove-shaped line marks A6, and the line marks A6 of the lower surface of the resistance portion A1 are in the form of rectangular grids arranged in a matrix (not shown), each rectangular grid is a resistive element, In the future, it will be stripped into grid-shaped resistance elements.

請參閱圖3、4,在進行剝折成條狀晶片A8前,本發明實施例先執行一將該片狀晶片A的該外側邊A42、A52及該廢料部A2列為待剝除部位,並執行一折邊剝除該待剝除部位的程序,使該片狀晶片A剝折該待剝除部位後,該片狀晶片A形成一僅包括該電阻部位A1、夾持部A3及內側邊A41、A51的待剝條晶片A7, 本發明實施例中之晶片剝折製程係將該待剝條晶片A7剝折成其上包括有一部份該電阻部位A1連同其二內側邊A41、A51條狀區域部位的條狀晶片A8。Please refer to FIGS. 3 and 4. Before stripping into the strip wafer A8, the embodiment of the present invention first executes the outer edges A42 and A52 of the chip wafer A and the scrap part A2 as the parts to be stripped , And execute a procedure of peeling off the part to be stripped by folding, so that the chip wafer A strips the part to be stripped, the chip wafer A forms a part including only the resistance part A1, the clamping part A3 and The wafer A7 to be stripped on the inner side A41, A51. The wafer peeling process in the embodiment of the present invention is to strip the wafer A7 to be stripped to include a part of the resistance portion A1 together with the two inner sides A41, A51 Strip wafer A8 in the strip region.

請參閱圖4、5,本發明實施例可以圖中所示的堆疊機來作說明,該堆疊機為一進行晶片剝折製程的設備,其設有一剝折機構B,在該待剝條晶片A7被送入該剝折機構B進行剝折成該條狀晶片A8前,該片狀晶片A係置於一置料機構C中,並被一搬送機構D的一提座D1提取並移送至一折邊機構E中,並在該折邊機構E中將片狀晶片A的剝折成待剝條晶片A7後,再由該搬送機構D的該提座D1將該待剝條晶片A7移送並越經該折邊機構E,而置於該剝折機構B的該擺座B1進行剝折成該條狀晶片A8;而完成剝折的該條狀晶片A8則被送至一收集裝置F中的一料框F1中受收集。Please refer to FIGS. 4 and 5. The embodiment of the present invention can be illustrated by the stacker shown in the figure. The stacker is a device for performing a wafer peeling process, which is provided with a peeling mechanism B, which is used to strip wafers Before A7 is fed into the stripping mechanism B to be stripped into the strip-shaped wafer A8, the wafer-shaped wafer A is placed in a stocking mechanism C, and is extracted and transferred to a lifting seat D1 of a transport mechanism D to In a hemming mechanism E, and in the hemming mechanism E, the flake wafer A is peeled into the wafer A7 to be stripped, and then the carrier D1 of the transport mechanism D transfers the wafer A7 to be stripped And passing the hemming mechanism E, the pendulum B1 placed in the debonding mechanism B is stripped into the strip wafer A8; and the stripped wafer A8 after the stripping is sent to a collection device F Collected in a box F1 in

請參閱圖4、6,該剝折機構B包括:一擺座B1及依待剝折晶片A7在擺座B1上的輸送方向為位於該擺座B1後端可作前後位移的一推夾B2,該擺座B1以兩側的二樞臂B11、B12分別各藉一樞軸部B111共同樞設於一載座B3兩側的二側座B31上,二樞臂B11、B12間設有一供該待剝條晶片A7置於其中並可被該推夾B2推送的輸送道B13;該載座B3下方受立設於一底座B32上的一旁側座B33及一後側座B34所架高,該擺座B1下方的該底座B32上設有一料盒B4供盛放該待剝條晶片A7被剝剩掉落的該支持部A3;該擺座B1的該輸送道B13前端設一定位裝置G,該擺座B1受以驅動件B5驅動的一偏心輪B6連動一連桿B7而帶動該擺座B1作上、下擺動,藉將待剝條晶片A7置於該擺座B1後,使該待剝條晶片A7後端的該夾持部A3受該推夾B2夾持沿一直線推送流路向前推送,直到該待剝條晶片A7前端受該定位裝置G定位,並藉受該偏心輪B6驅動該連桿B7帶動該擺座B1作上、下擺動,使待剝條晶片A7受該定位裝置G定位的部份被剝折成該條狀晶片A8。Please refer to FIGS. 4 and 6, the peeling mechanism B includes: a swing base B1 and a pushing clip B2 that can be moved back and forth at the rear end of the swing base B1 according to the transport direction of the wafer A7 to be peeled off on the swing base B1 The swing seat B1 is pivotally mounted on the two side seats B31 on both sides of a carrier B3 with two pivot arms B11 and B12 on both sides respectively via a pivot portion B111. A supply is provided between the two pivot arms B11 and B12 The wafer A7 to be stripped is placed in the conveying path B13 which can be pushed by the push clip B2; the side of the carrier B3 is elevated by a side seat B33 and a rear side seat B34 standing on a base B32, The base B32 under the swing seat B1 is provided with a material box B4 for holding the supporting part A3 where the wafer A7 to be stripped is dropped; a positioning device G is provided at the front end of the conveying path B13 of the swing seat B1 , The oscillating base B1 is driven by an eccentric wheel B6 driven by a driving member B5 to link a connecting rod B7 to drive the oscillating base B1 to swing up and down, by placing the wafer A7 to be stripped behind the oscillating base B1, the The clamping part A3 at the rear end of the wafer A7 to be stripped is clamped by the pushing clip B2 and pushed forward along the straight push flow path until the front end of the wafer A7 to be stripped is positioned by the positioning device G and driven by the eccentric wheel B6 The connecting rod B7 drives the swing seat B1 to swing up and down, so that the portion of the wafer A7 to be stripped by the positioning device G is stripped into the strip-shaped wafer A8.

請參閱圖7,本發明實施例中晶片剝折製程的定位裝置G,包括:一上定位機構G1及一下定位機構G2,其中:       該上定位機構G1,設有一ㄇ型的座架G11及一設於該座架G11上的一上定位模組G12;其中,該座架G11包括一上座架G111及位於該上座架G111兩側之二側架G112、G113,該座架G11以該二側架G112、G113分別固設於該載座B3的二側座B31上;該二側架G112、G113間形成一空間G114;該上定位模組G12包括一設於該上座架G111上方的一驅動件G121以及設於該二側架G112、G113間之該空間G114中受該驅動件G121驅動可作上、下位移的一壓模G122。Referring to FIG. 7, the positioning device G of the wafer peeling process in the embodiment of the present invention includes: an upper positioning mechanism G1 and a lower positioning mechanism G2, in which: the upper positioning mechanism G1 is provided with a pedestal G11 and a An upper positioning module G12 disposed on the seat frame G11; wherein, the seat frame G11 includes an upper seat frame G111 and two side frames G112 and G113 located on both sides of the upper seat frame G111, and the seat frame G11 uses the two sides The frames G112 and G113 are respectively fixed on the two side seats B31 of the carrier B3; a space G114 is formed between the two side frames G112 and G113; the upper positioning module G12 includes a drive disposed above the upper seat frame G111 A pressing die G122 that can be moved up and down is driven by the driving member G121 in the space G114 between the component G121 and the two side frames G112 and G113.

請參閱圖8,該下定位機構G2設有一約略矩形立方體之模座G21,該模座G21設於該載座B3的一橫設於該二側座B31間的一第一肋部B35上,並位於該二側座B31間,且對應地位於該擺座B輸送方向的前方固設之定位;該模座G21上表面設有一Y軸向長條凸起狀的對位部G211,而使該對位部G211與該模座G21前側面G212間形成設有一段寬度與該條狀晶片A8的X軸向寬度約略相當且較該對位部G211為低的水平長條面狀之定位部G213;該條狀晶片A8的Y軸向長度較該模座G21及定位部G213長,而使該條狀晶片A8的該內側邊A41、A51外露於該模座G21及定位部G213的兩側之外。Please refer to FIG. 8, the lower positioning mechanism G2 is provided with a mold base G21 of approximately rectangular cube shape, the mold base G21 is disposed on a first rib B35 of the carrier B3 disposed horizontally between the two side seats B31, It is located between the two side seats B31 and is correspondingly positioned in front of the swinging seat B in the conveying direction; the upper surface of the mold base G21 is provided with a Y-axis elongated convex positioning portion G211, so that A positioning section is formed between the alignment portion G211 and the front side surface G212 of the mold base G21, and has a horizontally long planar positioning portion with a width approximately equal to the X-axis width of the strip wafer A8 and lower than that of the alignment portion G211 G213; the Y-axis length of the strip-shaped wafer A8 is longer than that of the mold base G21 and the positioning portion G213, so that the inside edges A41, A51 of the strip-shaped wafer A8 are exposed to both of the mold base G21 and the positioning portion G213 Outside the side.

請參閱圖8、9,該對位部G211朝該定位部G213的一側形成一往後傾斜一θ角的下前上後之擋邊G214,該對位部G211朝相對於該定位部G213的另一側形成一傾斜的外緣G215。Referring to FIGS. 8 and 9, the positioning portion G211 forms a lower front, upper, and rear rib G214 inclined backward by an angle of θ toward the side of the positioning portion G213, and the positioning portion G211 faces the positioning portion G213. The other side forms an inclined outer edge G215.

請參閱圖10,當該待剝條晶片A7被由該擺座B1中推出向前時,準備被剝折的最前端該條狀晶片A8部位將前移至該定位裝置G的下定位機構G2中該模座G21的定位部G213上,該條狀晶片A8前端並抵及該擋邊G214而止位;請參閱圖10,然後該上定位機構G1驅動該壓模G122下抵,使該壓模G122的一壓抵面G1221靠抵該下定位機構G2中該模座G21的上表面,並以該壓抵面G1221上的一扣槽G1222扣罩該對位部G211,此時該壓模G122之該扣槽G1222與前側面G1223間的一抵模 G1224底面貼靠但未壓抵該定位部G213上的該條狀晶片A8,使該條狀晶片A8被拘束限制在定位部G213上方與該抵模 G1224底面間作定位,再藉該擺座B1被驅動作、上下偏擺,而將該最前端該條狀晶片A8剝折,剝折後的該條狀晶片A8則留置於該定位部G213上方與該抵模 G1224底面間,並在該壓模G122上昇後,該條狀晶片A8仍留置於該定位部G213上。Referring to FIG. 10, when the to-be-stripped wafer A7 is pushed forward from the swing seat B1, the strip-shaped wafer A8 at the front end to be peeled will move forward to the lower positioning mechanism G2 of the positioning device G In the positioning part G213 of the mold base G21, the front end of the strip-shaped wafer A8 is in contact with the rib G214 to stop; please refer to FIG. 10, and then the upper positioning mechanism G1 drives the stamper G122 to lower, so that the pressure A pressing surface G1221 of the mold G122 abuts the upper surface of the mold base G21 in the lower positioning mechanism G2, and a positioning groove G1222 on the pressing surface G1221 is used to cover the alignment portion G211. The bottom surface of a die G1224 between the buckle groove G1222 of the G122 and the front side G1223 abuts but does not press against the strip-shaped wafer A8 on the positioning portion G213, so that the strip-shaped wafer A8 is restrained and restricted above the positioning portion G213 Position the bottom surface of the die G1224, and then drive the pendulum base B1 to oscillate up and down, and strip the frontmost strip wafer A8, and the strip wafer A8 after the stripping is left at the positioning Between the upper part G213 and the bottom surface of the mold G1224, and after the stamper G122 rises, the strip wafer A8 remains on the positioning part G213.

請參閱圖8、11,留置於該定位部G213上的該條狀晶片A8將經由一搬送裝置H被搬送至該料框F1;其中,該搬送裝置H包括:       一置放座H1,設於該載座B3的一橫設於該二側座B31間的一第二肋部B36上,並位於該二側座B31間,且對應地位於該擺座B輸送方向的前方固設之定位,並位於該條狀晶片A8之X軸向直線搬送路徑的該模座G21與該料框F1之間,該模座G21、置放座H1、料框F1三者呈X軸向直線相間隔依序排列,且該模座G21、置放座H1、料框F1三者本身分別各提供該條狀晶片A8呈Y軸向置放;該置放座H1於靠該模座G21的一側上表面設有相隔間距並分設該置放座H1兩端之呈凹設狀的二暫置部H11,可供該條狀晶片A8以中央懸空而兩端置放二暫置部H11中的方式被盛放,該置放座H1於該二暫置部H11外側對應於該外露的該條狀晶片A8兩端的二內側邊A41、A51下方分別各設有一槽間H12,該條狀晶片A8兩端的二內側邊A41、A51在置放時分別各露於該槽間H12上方,該置放座H1兩側的該槽間H12分別各與該模座G21兩側之該肋部G35所各開設的槽間B351在同一X軸向直線移動路徑上;該置放座H1下方設有相隔間距作Y軸向排列的二感應元件H13,其位置分別各偏靠近二側該暫置部H11並向上伸至該置放座H1上表面,對置放該二暫置部H11中的該條狀晶片A8進行偵測;該置放座H1兩側的該槽間H12外,分別各於該載座B3兩側之該二側座B31上設有氣壓噴嘴B37,可分別在未置放該條狀晶片A8時進行噴氣清潔該暫置部H11;該二暫置部H11間的該置放座H1上設有一鏤空的吹氣空間H14,該吹氣空間H14恰對應位於該條狀晶片A8置放於該二暫置部H11間時的下方。Referring to FIGS. 8 and 11, the strip wafer A8 left on the positioning portion G213 will be transferred to the material frame F1 via a transfer device H; wherein, the transfer device H includes: a placement seat H1, which is provided at A side of the carrier B3 is horizontally disposed on a second rib B36 between the two side seats B31, and is located between the two side seats B31, and is correspondingly located in a fixed position forward of the swinging seat B in the transport direction, And located between the mold base G21 and the material frame F1 in the X-axis linear transfer path of the strip wafer A8, the mold base G21, the placement seat H1, and the material frame F1 are linearly spaced along the X-axis The mold base G21, the placement base H1, and the material frame F1 each provide the strip-shaped wafer A8 to be placed in the Y axis direction; the placement base H1 is on the side near the mold base G21. The surface is provided with two temporary portions H11 which are spaced apart and have two concave portions H11 at the two ends of the placement seat H1, which can be used to suspend the strip wafer A8 in the center and place the two temporary portions H11 at both ends When being held, the placement seat H1 is respectively provided with a slot H12 under the two inner sides A41 and A51 of the two ends of the strip-shaped wafer A8 corresponding to the exposed sides of the strip-shaped wafer A8, the strip-shaped wafer A8 The two inner sides A41 and A51 of the two ends are respectively exposed above the slot H12 when placed, and the slot H12 on both sides of the placement seat H1 are respectively connected to the ribs G35 on both sides of the die base G21 Each of the opened slots B351 is on the same X-axis linear movement path; two sensing elements H13 arranged in the Y-axis spaced apart at a distance from the placement base H1 are located, and their positions are respectively closer to the two sides of the temporary portion H11 And extend upward to the upper surface of the placement seat H1 to detect the strip-shaped wafer A8 placed in the two temporary portions H11; outside the grooves H12 on both sides of the placement seat H1, respectively The two side seats B31 on both sides of the carrier B3 are provided with air pressure nozzles B37, which can be used to clean the temporary part H11 when the strip wafer A8 is not placed; the placement between the two temporary parts H11 A hollow blow-out space H14 is provided on the seat H1, and the blow-off space H14 is correspondingly located below when the strip-shaped wafer A8 is placed between the two temporary portions H11.

請參閱圖8、11、12,該搬送裝置H另設有:       一第一搬送模組H2,設於一垂直立設並可作X軸向位移的移動座H3上,包括呈Y軸向水平伸設的一第一座架H21,以及固設於該移動座H3上並與其連動的一驅動件H22,該驅動件H22可驅動該第一座架H21作Z軸向的上下位移,該第一座架H21上以相隔間距並呈垂直的Z軸向朝上立設的二托架H23,該二托架H23相隔之間距恰約為該條狀晶片A8兩端的二內側邊A41、A51相隔之間距;該二托架H23之間的該第一座架H21下方設有一噴氣座H24,其以一固定件H241固設於該後側座B34上,該固定件H241上設有一氣閥H242,該氣閥H242恰位於該吹氣空間H14下方,可朝上對置於該置放座H1兩側之該二暫置部H11上的橫亙於該吹氣空間H14之該條狀晶片A8懸空部位由下而上吹氣;每一托架H23上端朝該模座G21的一側端緣處,凹設一段呈Y軸向水平設置的一托接部H25,該托接部H25中設有一吸口H251(請同時配合參閱圖13),可由該第一座架H21下方設置的氣壓接頭H252接設負壓而提供吸力,該托接部H25之X、Z截面呈L形缺槽狀,設有一前高後低與水平面成一夾角α的承載部H253,及一下前上後傾斜一夾角β的擋邊H254(請同時配合參閱圖14);該移動座H3的X軸向位移可連動該第一座架H21及其上的二托架H23,使該二托架H23位移於該置放座H1二側的該槽間H12與該模座G21兩側的該槽間B351之間的移動路徑上;       一第二搬送模組H4,設於該移動座H3上,包括呈Y軸向水平伸設的一第二座架H41,以及固設於該移動座H3上並與其連動的一驅動件H42,該驅動件H42可驅動該第二座架H41作Z軸向的上下位移,該第二座架H41上以相隔間距並呈垂直的Z軸向朝下立設的二吸嘴H43,該二吸嘴H43位於該二托架H23的上方,該二吸嘴H43相隔之間距恰約為該條狀晶片A8兩端的二內側邊A41、A51相隔之間距,使該二吸嘴H43下方分別各對應該置放座H1二側的該二暫置部H11上方;該移動座H3的X軸向位移可連動該第二座架H41及其上的二吸嘴H43,使該二吸嘴H43位移於該置放座H1二側的該二暫置部H11與該料框F1之間的移動路徑上;        該第二搬送模組H4的該吸嘴H43與該第一搬送模組H2的該托接部H25藉該移動座H3而同步作X軸向水平直線位移,但分別可各自作Z軸向位移,惟該第二搬送模組H4與該第一搬送模組H2進行位移時,該吸嘴H43與該托接部H25在Y軸向則保持定位,該二吸嘴H43間或該二托接部H25間亦分別各保持固定間距;        該移動座H3與該搬送機構D同設於一固定座K上,該提座D1設於該固定座K背側一X軸向水平的滑軌K1上,藉可受驅動的一第一皮帶K2連動而作X軸向往復滑移;該移動座H3則貼設於該固定座K前側一可作X軸向水平滑移的滑動缸K3上,並藉可受一驅動件(圖中未示)驅動的一第二皮帶K4連動而作X軸向往復滑移,使僅藉一驅動源即可使該第二搬送模組H4的該吸嘴H43與該第一搬送模組H2的該托接部H25藉該移動座H3同步作X軸向直線位移;其中,該移動座H3與該搬送機構D亦可設於不同的固定座上而分別各自獨立運作。Please refer to Figs. 8, 11, and 12, the conveying device H is further provided with: a first conveying module H2, which is arranged on a vertically standing movable seat H3 which can be displaced in the X-axis direction, including being horizontal in the Y-axis direction A first seat H21 extended, and a driving member H22 fixed on the moving seat H3 and linked with it, the drive member H22 can drive the first seat H21 to move up and down along the Z axis, the first Two brackets H23 standing upright on a rack H21 with a spaced-apart vertical Z axis facing up, the spacing between the two brackets H23 is just about the two inner sides A41, A51 of the two ends of the strip wafer A8 The distance between the two brackets H23 is provided below the first seat frame H21 is a jet seat H24, which is fixed on the rear side seat B34 with a fixing member H241, the fixing member H241 is provided with an air valve H242, the air valve H242 is located just under the blowing space H14, and can face upwardly on the two temporary portions H11 on both sides of the placement seat H1, the strip wafer A8 transverse to the blowing space H14 The air-hanging part is blown from bottom to top; each bracket H23 has an upper end facing the side of the mold base G21, and a bracket H25 horizontally arranged in the Y axis is recessed in the bracket H25. There is a suction port H251 (please also refer to FIG. 13), the suction can be provided by the pneumatic connector H252 provided under the first seat H21 to provide suction, and the X and Z cross sections of the receiving portion H25 are L-shaped grooves. There is a bearing part H253 with an angle α between the front high and the back and the horizontal plane, and a rib H254 inclined at an angle β with the front, back and top (please also refer to FIG. 14); the X axial displacement of the moving seat H3 can be linked to the The first frame H21 and the two brackets H23 on it move the two brackets H23 between the slot H12 on both sides of the placement seat H1 and the slot B351 on both sides of the mold base G21 On the path; a second conveying module H4, which is arranged on the moving seat H3, includes a second seat frame H41 extending horizontally in the Y axis, and a drive fixed on the moving seat H3 and interlocking therewith H42, the driving member H42 can drive the second seat frame H41 to move up and down in the Z-axis direction, the second seat frame H41 has two suction nozzles H43 standing down with a vertical Z axis spaced apart at intervals, The two nozzles H43 are located above the two brackets H23, and the distance between the two nozzles H43 is just about the distance between the two inner sides A41, A51 at both ends of the strip wafer A8, so that the two nozzles H43 are below Each corresponding to the two temporary portions H11 on the two sides of the seat H1; the X-axis displacement of the moving seat H3 can link the second seat H41 and the second suction nozzle H43 thereon to make the second suction nozzle H43 is displaced on the moving path between the two temporary portions H11 and the material frame F1 on the two sides of the placement seat H1; the suction nozzle H43 of the second conveying module H4 and the first conveying module H2 The receiving portion H25 is synchronized with the horizontal displacement of the X axis by the moving seat H3 However, the Z-axis displacement can be performed separately, but when the second conveying module H4 and the first conveying module H2 are displaced, the suction nozzle H43 and the receiving portion H25 remain positioned in the Y-axis direction. The two nozzles H43 or the two supporting parts H25 also maintain a fixed distance respectively; the mobile seat H3 and the transport mechanism D are both arranged on a fixed seat K, and the lifting seat D1 is arranged on the back side of the fixed seat K An X-axis horizontal slide rail K1 is reciprocated along the X-axis by a first belt K2 that can be driven; the moving seat H3 is attached to the front side of the fixed seat K and can be used as the X-axis The sliding cylinder K3 moves horizontally and is reciprocated in the X axis by a second belt K4 that can be driven by a driving member (not shown), so that only a driving source can make the first The suction nozzle H43 of the second conveying module H4 and the receiving portion H25 of the first conveying module H2 synchronize linear displacement in the X axis by the moving seat H3; wherein, the moving seat H3 and the conveying mechanism D may also Set on different fixed bases and operate independently.

請參閱圖15,該經由剝折而留置於該定位裝置G的下定位機構G2之該模座G21上該定位部G213的該條狀晶片A8,將經由以下兩步驟進行搬送,包括:        一第一搬送步驟,該第一搬送模組H2以該托架H23循X軸向承接路徑L1前進至該定位部G213下方,以該托接部H25吸附並托接的方式提取該條狀晶片A8,該托架H23再使該托接部H25循X軸向位於該承接路徑L1上方的該返送路徑L2返回至該置放座H1的該暫置部H11上方,將該條狀晶片A8置於該暫置部H11中,此時該條狀晶片A8並被該感應元件H13所偵測及被氣壓接頭H252所供應的負壓吸附;        一第二搬送步驟,當該托架H23循該承接路徑L1前進至該定位部G213下方時,該第二搬送模組H4的該吸嘴H43將同時循X軸向卸載路徑L3位移至該置放座H1的該暫置部H11上方吸取該暫置部H11上的該條狀晶片A8;當該托架H23循該返送路徑L2返回至該置放座H1的該暫置部H11上方時,該第二搬送模組H4的該吸嘴H43將提取該暫置部H11上的該條狀晶片A8同時循X軸向位移至該料框F1置放收集。Referring to FIG. 15, the strip-shaped wafer A8 of the positioning part G213 on the mold base G21 of the lower positioning mechanism G2 of the positioning device G that is left by peeling will be transported through the following two steps, including: a first In a conveying step, the first conveying module H2 advances the bracket H23 along the X-axis receiving path L1 to below the positioning portion G213, and extracts the strip-shaped wafer A8 in such a manner that the receiving portion H25 is sucked and received. The bracket H23 returns the receiving portion H25 to the return path L2 located above the receiving path L1 along the X axis to the temporary portion H11 of the placement seat H1, and the strip wafer A8 is placed on the In the temporary part H11, at this time, the strip-shaped chip A8 is detected by the sensing element H13 and sucked by the negative pressure supplied by the pneumatic connector H252; a second conveying step, when the carrier H23 follows the receiving path L1 When advancing below the positioning portion G213, the suction nozzle H43 of the second conveying module H4 will simultaneously move along the X-axis unloading path L3 above the temporary portion H11 of the placement seat H1 to suck the temporary portion H11 The strip wafer A8 on the top; when the carriage H23 returns to the temporary portion H11 of the placement seat H1 via the return path L2, the suction nozzle H43 of the second transport module H4 will extract the temporary The strip-shaped wafer A8 on the placement portion H11 is simultaneously displaced in the X-axis direction to the stock frame F1 for placement and collection.

請參閱圖16,該第一搬送模組H2的該托架H23之該托接部H25高度較置放座H1的該暫置部H11及該模座G21的該定位部G213低,故該承接路徑L1包括一水平位移至該定位部G213下方的水平直線行程L11,及一由該定位部G213下方垂直向上托起該條狀晶片A8的垂直位移行程L12;該返送路徑L2包括一水平位移至該置放座H1的該暫置部H11上方的水平直線行程L21,及一由該暫置部H11上方垂直向下落置該條狀晶片A8的垂直位移行程L22。Referring to FIG. 16, the height of the receiving portion H25 of the bracket H23 of the first transport module H2 is lower than the temporary portion H11 of the placement seat H1 and the positioning portion G213 of the mold base G21, so the receiving The path L1 includes a horizontal linear stroke L11 that is displaced horizontally below the positioning portion G213, and a vertical displacement stroke L12 that vertically lifts the strip wafer A8 from below the positioning portion G213; the return path L2 includes a horizontal displacement to A horizontal linear stroke L21 above the temporary portion H11 of the placement seat H1, and a vertical displacement stroke L22 that vertically drops the strip-shaped wafer A8 from above the temporary portion H11.

請參閱圖17,該第二搬送模組H4的該吸嘴H43提取該暫置部H11上的該條狀晶片A8時,係以水平移動至該暫置部H11上方保持停滯在該高度定位,而藉該氣閥H242朝上對置於該置放座H1兩側之該暫置部H11上的橫亙之該條狀晶片A8懸空部位由下而上吹氣,使該條狀晶片A8一方面被氣閥H242吹氣上浮,另一方面被該吸嘴H43負壓吸附,增加該第二搬送模組H4的該吸嘴H43提取的迅速性,而該吸嘴H43底部端口則與該暫置部H11開口保持在剩餘間隙不易在該條狀晶片A8上浮時飄翻落出的寬度。Referring to FIG. 17, when the suction nozzle H43 of the second transport module H4 extracts the strip wafer A8 on the temporary portion H11, it moves horizontally above the temporary portion H11 and stays at the height position, With the air valve H242 facing upwards, the suspended portion of the strip-shaped wafer A8 on the temporary portion H11 on both sides of the placement seat H1 is blown from below to make the strip-shaped wafer A8 on the one hand The air is blown up by the air valve H242, and on the other hand is sucked by the suction nozzle H43 under negative pressure, which increases the speed of extraction of the suction nozzle H43 of the second conveying module H4, and the bottom port of the suction nozzle H43 is connected to the temporary The opening of the portion H11 is maintained at a width where the remaining gap is unlikely to fall over when the strip wafer A8 floats.

本發明實施例晶片剝折製程的搬送方法、裝置及使用該裝置的設備,雖然該剝折後的該條狀晶片A8留置於該定位裝置G的該定位部G213上,在執行以該第一搬送模組H2將該定位部G213上的該條狀晶片A8搬送置於該置放座H1的該暫置部H11中的該第一搬送步驟,及以一第二搬送模組H4將該暫置部H11上的該條狀晶片A8搬送置於一料框F中收集的該第二搬送步驟後,可以將順利完成該條狀晶片的搬送、收集,使剝折製程的定位方式無需採傳送輪方式,增加搬送的可應用機會。In the embodiment of the present invention, the method and device for transferring the wafer peeling process and the equipment using the device, although the strip wafer A8 after the peeling is left on the positioning part G213 of the positioning device G, the first The transfer module H2 transfers the strip wafer A8 on the positioning part G213 to the first transfer step in the temporary part H11 of the placement seat H1, and uses a second transfer module H4 to transfer the temporary After the strip wafer A8 on the placement part H11 is transferred to the second transfer step collected in a material frame F, the transfer and collection of the strip wafer can be successfully completed, so that the positioning method of the stripping process does not need to be transferred Wheel mode, increase the application opportunities for transportation.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此 限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。However, the above are only the preferred embodiments of the present invention, which should not be used to limit the scope of the implementation of the present invention, that is, simple equivalent changes and modifications made according to the scope of the patent application of the present invention and the description of the invention, All of them are still covered by the patent of the present invention.

A:片狀晶片A1:電阻部位A2:廢料部A3:夾持部A4:側邊部A41:內側邊A42:外側邊A5:側邊部A51:內側邊A52:外側邊A6:線痕A7:待剝條晶片A8:條狀晶片B:剝折機構B1:擺座B11:樞臂B111:樞軸部B12:樞臂B13:輸送道B2:推夾B3:載座B31:側座B32:底座B33:旁側座B34:後側座B35:第一肋部B351:槽間B36:第二肋部B4:料盒B5:驅動件B6:偏心輪B7:連桿C:置料機構D:搬送機構D1:提座E:折邊機構F:收集裝置F1:料框G:定位裝置G1:上定位機構G11:座架G111:上座架G112:側架G113:側架G114:空間G12:上定位模組G121:驅動件G122:壓模G1221:壓抵面G1222:扣槽G1223:前側面G1224:抵模G2:下定位機構G21:模座G211:對位部G212:前側面G213:定位部G214:擋邊G215:外緣H:搬送裝置H1:置放座H11:暫置部H12:槽間H13:感應元件H14:吹氣空間H2:第一搬送模組H21:第一座架H22: 驅動件H23:托架H24:噴氣座H241:固定件H242:氣閥H25:托接部H251:吸口H252:氣壓接頭H253:承載部H254:擋邊H3:移動座H4:第二搬送模組H41:第二座架H42:驅動件H43:吸嘴K:固定座K1:滑軌K2:第一皮帶K3:滑動缸K4:第二皮帶L1:承接路徑L11:水平直線行程L12:垂直位移行程L2:返送路徑L21:水平直線行程L22:垂直位移行程L3:卸載路徑 A: Chip wafer A1: Resistor part A2: Scrap part A3: Clamping part A4: Side part A41: Inside side A42: Outside side A5: Side side part A51: Inside side A52: Outside side A6: Line mark A7: Strip wafer A8: Strip wafer B: Stripping mechanism B1: Swing seat B11: Pivot arm B111: Pivot part B12: Pivot arm B13: Conveyor B2: Push clip B3: Carrier B31: Side Seat B32: Base B33: Side seat B34: Rear seat B35: First rib B351: Inter-slot B36: Second rib B4: Material box B5: Drive part B6: Eccentric wheel B7: Connecting rod C: Material Mechanism D: Transport mechanism D1: Lifting seat E: Folding mechanism F: Collecting device F1: Material frame G: Positioning device G1: Upper positioning mechanism G11: Seat frame G111: Upper seat frame G112: Side frame G113: Side frame G114: Space G12: upper positioning module G121: driver G122: stamper G1221: pressing surface G1222: buckle groove G1223: front side G1224: countermolding G2: lower positioning mechanism G21: mold base G211: alignment part G212: front side G213 : Positioning part G214: Rib G215: Outer edge H: Transport device H1: Placement seat H11: Temporary part H12: Between slots H13: Induction element H14: Air blowing space H2: First transport module H21: First seat Frame H22: Drive part H23: Bracket H24: Jet seat H241: Fixing part H242: Air valve H25: Supporting part H251: Suction port H252: Air pressure joint H253: Carrying part H254: Rib H3: Moving seat H4: Second conveyance Module H41: Second seat frame H42: Driver H43: Nozzle K: Fixing seat K1: Slide rail K2: First belt K3: Sliding cylinder K4: Second belt L1: Acceptance path L11: Horizontal linear stroke L12: Vertical Displacement stroke L2: Return path L21: Horizontal linear stroke L22: Vertical displacement stroke L3: Unload path

圖1係本發明實施例中片狀晶片之立體示意圖。 圖2係本發明實施例中片狀晶片部份放大之立體示意圖。 圖3係本發明實施例中片狀晶片之立體分解示意圖。 圖4係本發明實施例中待剝條晶片之立體分解示意圖。 圖5係本發明實施例中晶片剝折製程的設備立體示意圖。 圖6係本發明實施例中剝折機構之立體示意圖。 圖7係本發明實施例中定位裝置之立體分解示意圖。 圖8係本發明實施例中載座上之下定位模組與搬送裝置之置放座的立體分解示意圖。 圖9係本發明實施例中待剝條晶片的剝折定位操作之示意圖(一)。 圖10係本發明實施例中待剝條晶片的剝折定位操作之示意圖(二)。 圖11係本發明實施例中搬送裝置與搬送機構之示意圖。 圖12係本發明實施例中搬送裝置的第一、二搬送模組之立體示意圖。 圖13係本發明實施例中第一搬送模組的托架上托接部之放大立體示意圖。 圖14係本發明實施例中第一搬送模組的托架上托接部之側面放大示意圖。 圖15係本發明實施例中第一、二搬送模組之搬送路徑示意圖。 圖16係本發明實施例中第一搬送模組之搬送路徑細部示意圖。 圖17係本發明實施例中第二搬送模組中吸嘴提取條狀晶片之部份放大示意圖。FIG. 1 is a schematic perspective view of a chip wafer in an embodiment of the present invention. FIG. 2 is an enlarged schematic perspective view of a portion of a chip wafer in an embodiment of the present invention. FIG. 3 is a three-dimensional exploded schematic view of a chip wafer in an embodiment of the present invention. FIG. 4 is a three-dimensional exploded schematic view of a wafer to be stripped in an embodiment of the present invention. FIG. 5 is a schematic perspective view of equipment in a wafer peeling process in an embodiment of the present invention. 6 is a perspective schematic view of a peeling mechanism in an embodiment of the present invention. 7 is an exploded perspective view of the positioning device in the embodiment of the present invention. 8 is an exploded perspective view of the positioning module on the upper and lower positioning modules and the placement base of the conveying device in the embodiment of the present invention. 9 is a schematic diagram (1) of the peeling and positioning operation of the wafer to be stripped in the embodiment of the present invention. 10 is a schematic diagram (2) of the peeling positioning operation of the wafer to be stripped in the embodiment of the present invention. FIG. 11 is a schematic diagram of a conveying device and a conveying mechanism in an embodiment of the present invention. 12 is a schematic perspective view of the first and second conveying modules of the conveying device in the embodiment of the present invention. FIG. 13 is an enlarged schematic perspective view of the supporting portion on the bracket of the first conveying module in the embodiment of the present invention. FIG. 14 is an enlarged schematic side view of the supporting portion of the bracket of the first conveying module in the embodiment of the present invention. 15 is a schematic diagram of the conveying path of the first and second conveying modules in the embodiment of the present invention. 16 is a detailed schematic diagram of the conveying path of the first conveying module in the embodiment of the present invention. FIG. 17 is an enlarged schematic view of a part of a strip wafer extracted by a suction nozzle in a second conveying module in an embodiment of the present invention.

H:搬送裝置 H: conveying device

H2:第一搬送模組 H2: First transport module

H21:第一座架 H21: first stand

H22:驅動件 H22: drive parts

H23:托架 H23: bracket

H24:噴氣座 H24: Jet Block

H241:固定件 H241: fixing

H242:氣閥 H242: Air valve

H25:托接部 H25: Supporting Department

H252:氣壓接頭 H252: pneumatic connector

H3:移動座 H3: Mobile seat

H4:第二搬送模組 H4: Second transport module

H41:第二座架 H41: Second seat

H42:驅動件 H42: driver

H43:吸嘴 H43: Nozzle

K3:滑動缸 K3: sliding cylinder

K4:第二皮帶 K4: second belt

Claims (17)

一種晶片剝折製程的搬送方法,包括:        使剝折後的一條狀晶片留置於一定位裝置的一定位部上;執行        一第一搬送步驟,以一第一搬送模組將該定位部上的該條狀晶片搬送置於一置放座的一暫置部中;        一第二搬送步驟,以一第二搬送模組將該暫置部上的該條狀晶片搬送置於一料框中收集。A method for transporting a wafer peeling process includes: leaving stripped wafers on a positioning portion of a positioning device; performing a first transport step, and using a first transport module to place the wafers on the positioning portion The strip-shaped wafer is transported and placed in a temporary part of a placement base; a second transporting step, the strip-shaped wafer on the temporary part is transported and collected in a material frame by a second transport module . 如申請專利範圍第1項所述晶片剝折製程的搬送方法,其中, 該第一搬送步驟中,該第一搬送模組以一承接路徑前進至該定位部下方托接該條狀晶片,再循位於該承接路徑上方的一返送路徑返回至該置放座的該暫置部上方,將該條狀晶片置於該暫置部中。The method for transferring a wafer peeling process as described in item 1 of the patent application scope, wherein, in the first transfer step, the first transfer module advances through a receiving path to support the strip wafer under the positioning portion, and then Return to the temporary part of the placement base through a return path located above the receiving path, and place the strip-shaped wafer in the temporary part. 如申請專利範圍第2項所述晶片剝折製程的搬送方法,其中, 該承接路徑包括一水平位移至該定位部下方的水平直線行程,及一由該定位部下方垂直向上托起該條狀晶片的垂直位移行程。The transfer method of the wafer peeling process as described in item 2 of the patent application scope, wherein the receiving path includes a horizontal linear stroke that is horizontally displaced to below the positioning portion, and a strip that is vertically lifted from below the positioning portion The vertical displacement of the wafer. 如申請專利範圍第2項所述晶片剝折製程的搬送方法,其中, 該返送路徑包括一水平位移至該置放座的該暫置部上方的水平直線行程,及一由該暫置部上方垂直向下落置該條狀晶片的垂直位移行程。The transfer method of the wafer peeling process as described in item 2 of the patent application scope, wherein the return path includes a horizontal linear stroke that is horizontally displaced above the temporary portion of the placement base, and a path from the temporary portion The vertical displacement stroke of the strip-shaped wafer is dropped vertically. 如申請專利範圍第1項所述晶片剝折製程的搬送方法,其中, 該第一搬送步驟與該第二搬送步驟同時進行。The transfer method of the wafer peeling process described in item 1 of the patent application scope, wherein the first transfer step and the second transfer step are performed simultaneously. 如申請專利範圍第1項所述晶片剝折製程的搬送方法,其中, 該第二搬送步驟中,該第二搬送模組係以水平移動至該暫置部上方保持停滯在該高度定位,而藉由下而上吹氣,使該條狀晶片一方面上浮,另一方面以一吸嘴吸附而提取該條狀晶片。The transfer method of the wafer peeling process as described in item 1 of the patent application scope, wherein, in the second transfer step, the second transfer module moves horizontally above the temporary portion to remain at the height position, and By blowing air from the bottom up, the strip-shaped wafer is floated on the one hand, and sucked by a suction nozzle to extract the strip-shaped wafer on the other hand. 如申請專利範圍第1項所述晶片剝折製程的搬送方法,其中, 在未置放該條狀晶片時,進行噴氣清潔該暫置部。The method for transferring a wafer peeling process as described in item 1 of the scope of the patent application, wherein, when the strip-shaped wafer is not placed, the temporary part is cleaned by air jet. 一種晶片剝折製程的搬送裝置,用以將 一定位裝置上一定位部留置的剝折後一條狀晶片搬送至一料框,包括:       一置放座,其上設有一暫置部;       一第一搬送模組,設有相隔間距的二托架,該托架上設有一托接部,該托接部可位移於該定位裝置的該定位部與該置放座的該暫置部間;        一第二搬送模組,設有相隔間距的二吸嘴,該吸嘴可位移於該置放座的該暫置部與該料框間。A conveying device for wafer peeling process, used for conveying stripped wafers left by a positioning part on a positioning device to a material frame, including: a placement seat on which a temporary part is provided; a first part A conveying module is provided with two brackets spaced apart, and a bracket is provided on the bracket, and the bracket can be displaced between the positioning part of the positioning device and the temporary part of the placement base; A second conveying module is provided with two suction nozzles spaced apart, and the suction nozzle can be displaced between the temporary part of the placement base and the material frame. 如申請專利範圍第8項所述晶片剝折製程的搬送裝置,其中, 該第一搬送模組的該托架之該托接部設有一吸口,可提供吸力。As described in Item 8 of the patent application scope, the transfer device of the wafer peeling process, wherein the receiving portion of the bracket of the first transfer module is provided with a suction port, which can provide suction force. 如申請專利範圍第8項所述晶片剝折製程的搬送裝置,其中, 該第一搬送模組設於一可作位移的移動座上,包括一第一座架,以及固設於該移動座上並與其連動的一驅動件,該驅動件可驅動該第一座架作位移,該第一座架上設該二托架。The conveying device of the wafer peeling process as described in item 8 of the patent scope, wherein the first conveying module is provided on a movable base capable of displacement, including a first base frame, and fixed on the movable base A driving member connected to the upper part and connected with the driving member can drive the first seat frame to be displaced, and the first bracket is provided with the two brackets. 如申請專利範圍第10項所述晶片剝折製程的搬送裝置,其中, 該二托架間的該第一座架下方設有一噴氣座,其設有一氣閥可朝上吹氣。As described in Item 10 of the patent application scope, a conveying device for a wafer peeling process, wherein an air jet seat is provided under the first seat frame between the two brackets, and an air valve is provided to blow air upward. 如申請專利範圍第8項所述晶片剝折製程的搬送裝置,其中, 該第二搬送模組設於一可作位移的移動座上,包括一第二座架,以及固設於該移動座上並與其連動的一驅動件,該驅動件可驅動該第二座架作位移,該第二座架上設該二吸嘴。The conveying device of the wafer peeling process as described in item 8 of the patent application scope, wherein the second conveying module is provided on a movable seat capable of displacement, including a second seat frame, and fixed on the movable seat A driving member linked to the upper part and connected with the driving member can drive the second seat frame to be displaced, and the second suction frame is provided with the two suction nozzles. 如申請專利範圍第8項所述晶片剝折製程的搬送裝置,其中, 該二吸嘴位於該二托架的上方。The conveying device of the wafer peeling process described in item 8 of the patent application scope, wherein the two nozzles are located above the two brackets. 如申請專利範圍第8項所述晶片剝折製程的搬送裝置,其中, 該第一搬送模組與該第二搬送模組同設於一可作位移的移動座上,  該吸嘴與該托接部同步作X軸向水平直線位移。The conveying device of the wafer peeling process as described in item 8 of the patent application scope, wherein the first conveying module and the second conveying module are co-located on a movable seat capable of displacement, the suction nozzle and the bracket The joint is synchronized with the horizontal displacement of the X axis. 如申請專利範圍第8項所述晶片剝折製程的搬送裝置,其中, 該置放座位於該條狀晶片之X軸向直線搬送路徑的該模座與該料框之間,該模座、置放座、料框三者呈X軸向直線相間隔依序排列,且該模座、置放座、料框三者本身分別各提供該條狀晶片呈Y軸向置放。The transfer device of the wafer peeling process described in item 8 of the patent application range, wherein the placement seat is located between the mold base and the material frame in the X-axis linear transfer path of the strip wafer, the mold base, The placement base and the material frame are arranged in a sequence of X-axis linear intervals, and the mold base, the placement base and the material frame each provide the strip-shaped wafers to be placed in the Y-axis direction. 一種晶片剝折製程的搬送裝置,包括:用以執行如申請專利範圍第1至5項中任一項所述晶片剝折製程的搬送方法之裝置。A conveying device for a wafer peeling process includes: a device for performing the conveying method of the wafer peeling process as described in any one of items 1 to 5 of the patent application. 一種晶片剝折製程的設備,使用如申請專利範圍第8至16項中任一項所述晶片剝折製程的搬送裝置,包括將一待剝條晶片進行剝折成該條狀晶片的一剝折機構、置放一片狀晶片的一置料機構、將片狀晶片的剝折成該待剝條晶片的一折邊機構、進行搬送該片狀晶片或該待剝條晶片的一搬送機構。An apparatus for a wafer peeling process, using the conveying device of the wafer peeling process as described in any one of claims 8 to 16, including peeling a wafer to be stripped into the strip wafer Folding mechanism, a feeding mechanism for placing a piece of wafer, a hemming mechanism for peeling the sheet wafer into the wafer to be stripped, a transport mechanism for carrying the sheet wafer or the wafer to be stripped .
TW107137379A 2018-10-23 2018-10-23 Method and device for conveying wafer peeling process and equipment using the same TWI683389B (en)

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TW547754U (en) * 2002-05-09 2003-08-11 Guang Jian Shin Entpr Co Ltd Stacked mechanism of chip resistor
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