TW202011453A - Exposure apparatus and method of manufacturing article - Google Patents

Abstract

The present invention provides an exposure apparatus which exposes a substrate while scanning an original and the substrate, comprising: a stage that includes a first surface in which a first concave portion and a second concave portion to be supplied with a purge gas are formed, and is movable while holding the original; and a member including a second surface facing the first surface, wherein the first concave portion is provided in the first surface of the stage so as to define a first space in which the original is arranged, and at least one second concave portion is provided outside the first concave portion in the first surface of the stage so as to define a second space having a smaller volume than the first space.

Description

Exposure device and method of manufacturing articles

The invention relates to an exposure device and a method for manufacturing an article.

As a type of apparatus used in a manufacturing method (lithography method) of a liquid crystal panel or a semiconductor device, there is an exposure apparatus that projects the pattern of the original plate irradiated by the illumination optical system onto the substrate and exposes the substrate. It is known that the original plate (mask or reticle) used in the exposure device is blurred due to, for example, reaction with acid, alkali or organic impurities existing in the atmosphere around the original plate. It is also known that the original blur is accelerated by moisture in the atmosphere. When the original is blurred in this way, problems such as underexposure may occur, which may make it difficult to accurately transfer the pattern of the original to the substrate. Accordingly, in the exposure apparatus, it is desirable to fill the space in which the original plate is arranged with the flushing gas whose impurities and humidity have been adjusted (reduced). Japanese Patent Publication No. 2015-228519 proposes an arrangement in which the movable area of the original platen holding the original plate is covered with a plate, and the internal space formed by the plate is supplied with a flushing gas having reduced impurities and humidity.

In the exposure apparatus, it is desirable to reduce the amount of flushing gas used from the viewpoint of operating cost and the like. However, the invention described in Japanese Patent Publication No. 2015-228519 has an arrangement in which the entire movable area of the original platen table is covered with a plate, so that the internal space formed by the plate is very large compared to the volume of the original plate. Therefore, in order to prevent outside air from intruding into the internal space formed by the plates, it is necessary to continuously supply a large amount of flushing gas to the internal space, which is disadvantageous for reducing the amount of flushing gas used.

For example, the present invention provides an advantageous technique in terms of the amount of flushing gas used to fill the space in which the original plate is placed.

According to an aspect of the present invention, there is provided an exposure device that exposes a substrate while scanning an original plate and a substrate. The exposure device includes: a stage including a first surface and capable of moving while maintaining the original plate and formed in the first surface A first concave portion and a second concave portion to be supplied with flushing gas; and a member including a second surface facing the first surface, wherein the first concave portion is provided in the first surface of the stage to define The first space in which the original plate is arranged, and at least one second concave portion is provided outside the first concave portion in the first surface of the stage so as to define a second space having a smaller size than the first space volume.

Further features of the present invention will become clear from the following description of exemplary embodiments with reference to the attached drawings.

Exemplary embodiments of the present invention will be described below with reference to the drawings. It should be noted that the same reference numerals denote the same components in all drawings, and repeated descriptions thereof will not be given.

<First embodiment> [Layout of Exposure Device] The first embodiment according to the present invention will be described. FIG. 1 is a view showing the overall arrangement of the exposure apparatus 100 of this embodiment. The exposure apparatus 100 of this embodiment is a step-and-scan exposure apparatus which exposes the substrate W while scanning the original plate M and the substrate W, thereby transferring the pattern of the original plate M onto the substrate. The exposure device 100 is also called a scanning exposure device or a scanner. In this embodiment, for example, the original M is a mask (reticle) made of quartz on which each of the multiple exposure areas to be transferred onto the substrate W has been formed Circuit pattern. The substrate W is a wafer coated with photoresist, and for example, a single crystal silicon substrate or the like can be used.

The exposure apparatus 100 may include an illumination optical system 1, an original plate stage 2 that can move while holding the original plate M, a projection optical system 3, a substrate table 4 that can move while holding the substrate W, and a control unit 5. The control unit 5 is formed by, for example, a computer including a CPU and a memory, and is electrically connected to each unit in the device, thereby comprehensively controlling the overall operation of the device. Here, in the following description, it is assumed that the direction parallel to the optical axis of the light emitted from the illumination optical system 1 and incident on the original M is the Z direction, and two orthogonal to each other on a plane perpendicular to the optical axis are assumed The directions are the X direction and the Y direction, respectively.

The illumination optical system 1 shapes the light emitted from the light source 6 (for example, mercury lamp, ArF excimer laser, or KrF excimer laser, etc.) into, for example, light in the form of a band or bow slit, and uses this slit shape Part of the original M. The light transmitted through a part of the original plate M enters the projection optical system 3 as pattern light reflecting the pattern of this part of the original plate M. The projection optical system 3 has a predetermined projection magnification and uses the pattern light to project the pattern of the original plate M onto the substrate (more specifically, the resist on the substrate). The original plate M and the substrate W are held by the original plate table 2 and the substrate table 4, respectively, and are arranged in an optical conjugate position (object plane and image plane of the projection optical system 3) via the projection optical system 3. The control unit 5 scans the original stage 2 and the substrate stage 4 in synchronization with each other at a speed ratio matching the projection magnification of the projection optical system (in this embodiment, it is assumed that the scanning direction of the original M and the scanning direction of the substrate W are X Direction (first direction)). With this arrangement, the pattern of the original plate M can be transferred onto the substrate.

[Peripheral layout of the original platform] In general, it is known that the original plate M used in the exposure device is blurred by, for example, reacting with acids, alkalis, or organic impurities present in the atmosphere around the original plate M. It is also known that this blur of the original M is accelerated by moisture in the atmosphere. When the master M is blurred in this way, problems such as underexposure may occur, which may make it difficult to accurately transfer the pattern of the master M to the substrate. Accordingly, in the exposure apparatus, it is desirable to fill the space in which the original plate M is arranged with the flushing gas whose impurities and humidity have been adjusted (reduced). In addition, in the exposure apparatus, it is desirable to reduce the amount of flushing gas used from the viewpoint of operating cost and the like. Therefore, the exposure apparatus 100 of the present embodiment is configured to fill the space in which the original plate M is arranged with flushing gas, and can reduce the amount of flushing gas used at this time. Here, the flushing gas is a gas adjusted to reduce acids, alkalis, organic impurities, and humidity, and can also be used, for example, clean dry air or nitrogen.

The detailed arrangement of the exposure apparatus 100 according to this embodiment will be described below. 2A and 2B are views showing the peripheral arrangement of the original stage 2 in the exposure apparatus 100 of this embodiment. 2A is a diagram showing the peripheral arrangement (XZ section) of the original plate 2 in the exposure apparatus 100, and the illumination optical system 1, the original plate 2, the projection optical system 3, the second plate 7, and the supply unit 8a (first supply unit) View. FIG. 2B is a view of the original platen 2 of this embodiment when viewed from above (+Z direction side).

First, the arrangement of the original stage 2 will be described. As shown in FIGS. 2A and 2B, the upper surface (first surface 20) of the original platen 2 is formed with a first concave portion 20a and a second concave portion 20b, which are recessed from the supply unit 8a, which will be described later, toward the first The part 20a and the second concave part 20b supply flushing gas. The first concave portion 20a is provided on the upper surface (first surface 20) of the original platen 2 so as to define a first space (original plate arrangement space) in which the original plate M is arranged. When the original plate stage 2 is viewed from above, the first concave portion 20a may be formed to have a size larger than that of the original plate M and have a depth equal to or greater than the thickness of the original plate M.

Each second concave portion 20b is provided outside the first concave portion 20a in the upper surface (first surface 20) of the original platen 2 so as to define a second space having a smaller volume than the first space. In this embodiment, a plurality of second concave portions 20b are provided so as to sandwich the first concave in the scanning direction (±X direction, or may be referred to as "scanning direction" hereinafter) of the original stage 2 during scanning exposure Into part 20a. That is, the second concave portion 20b is provided in the scanning direction (on the ±X direction side) of the first concave portion 20a in the upper surface of the original platen.

When the original platen 2 is viewed from above, the second concave portion 20b is arranged such that the length in the scanning direction (X direction) is smaller than the direction perpendicular to the scanning direction (±Y direction, or may be referred to as "vertical direction" hereinafter) ) On the length. That is, the second concave portion 20b is a groove portion extending in the upper surface of the original platen 2 in the vertical direction (Y direction). The second concave portion 20b of this embodiment has a rectangular shape whose longitudinal direction is the vertical direction (Y direction), but its shape is not limited thereto, and may have a curved shape.

Here, the detailed layout of the original stage 2 will be described. The original plate stage 2 may include, for example, a holding portion 21 that holds the original plate M, and a first plate 22 that forms the upper surface (first surface 20) of the original plate stage 2.

The holding portion 21 is formed of a base portion 21a, a first protruding portion 21b, and a second protruding portion 21c, and can be driven in at least ±X direction by a driving mechanism (not shown) like a linear motor. The base 21a is configured to maintain the peripheral area of the original plate M by vacuum suction, electrostatic attraction, etc., and in the portion where the central area of the original plate M (the area where the circuit pattern is formed) is arranged An opening is formed so that light transmitted through the original plate M enters the projection optical system. The opening may be provided with, for example, a transparent member like glass.

Each first protruding portion 21b is a portion protruding upward (in the +Z direction) from the base 21a in the periphery of the original M, so that the first recess 21b is used as a bottom and the first protruding portion 21b is used as a side wall to define a first recess Part 20a (first space). The first protruding portion 21b may be arranged to have a height equal to or greater than the thickness of the original plate M. Each second protruding portion 21c is a portion protruding upward (in the +Z direction) from the base 21a outside the first protruding portion 21b, so that the base 21a is used as the bottom and the first protruding portion 21b and the second protruding portion 21c are used as The side wall defines a second concave portion 20b (second space). The second protruding portion 21c may be arranged to have the same height as the first protruding portion 21b. That is, the second concave portion 20b may be arranged to have the same depth as the first concave portion 20a. Here, the depth of the second concave portion 20b may be equal to or less than the depth of the first concave portion 20a.

The first plate 22 is a member including a first surface 20 perpendicular to the optical axis direction of light emitted from the illumination optical system 1, and the upper surface of the original platen 2 is formed by the first surface 20. The first plate 22 is connected to the ends of the first protruding portion 21b and the second protruding portion 21c of the holding portion 21, and is arranged to include extension regions 22a, each extending region 22a from the second protruding portion 21c along the scanning direction Of the end extends. In addition, the first plate 22 is provided with an opening at a portion where the first concave portion 20a (first space) is formed and at a portion where the second concave portion 20b (second space) is formed. It should be noted that although the sheet-shaped first plate 22 is used as the member including the first surface 20 in this embodiment, members other than the sheet-shaped plate may also be used.

Here, the first plate 22 may be arranged to be able to reduce the flow into the first concave portion 20a from the gap between the extension area 22a and the second plate 7 which will be described later as the original platen 2 moves during scanning exposure And the outside air of the second concave portion 20b. For example, the first plate 22 may be arranged to include, in each extension area 22a, a portion having the smallest distance from the second plate 7 (second surface 70) which will be described later. In addition, the extension area 22a may be set so that the length in the scanning direction is equal to or greater than half of the movement stroke (movement distance) of the original stage 2 during scanning exposure, and more preferably equal to or greater than the length of the movement stroke. That is, the second concave portion can be set so as not to fall out of the outer shape of the second plate 7 during the movement of the original platen 2.

Next, the second board 7 and the supply unit 8a will be described.

The second plate 7 is a member including a second surface 70 perpendicular to the optical axis direction of the light emitted from the illumination optical system 1, and is arranged above the original platen 2 to be spaced apart from the original platen 2 so that the second surface 70 faces The first surface 20 of the original platen 2 (first board). For example, the second plate 7 is provided in the illumination optical system 1 or other structure so as not to move with the original platen 2. In this embodiment, the second board 7 is fixed to the illumination optical system 1.

Furthermore, the second plate 7 may be arranged such that the gap between the first surface 20 of the original platen 2 (first plate 22) and the second surface 70 of the second plate 7 is as small as possible (i.e. gap). With this arrangement, it is possible to reduce the temporality of the gas pressure that occurs in the second concave portion 20b when the flushing gas supplied to the second concave portion 20b escapes through the gap between the first surface 20 and the second surface 70 Variety. For example, the second plate 7 may be arranged so that the gap between the first surface 20 and the second surface 70 is as small as possible, so that even by vibrating during the movement of the original platen 2 (in the ±Z direction Above), the first surface 20 and the second surface 70 cannot contact each other. As an example, the second plate 7 may be arranged so that the distance between the first surface 20 and the second surface 70 is equal to or less than the length of the second concave portion 20b in the scanning direction. It should be noted that although the sheet-like second plate 7 is used as the member including the second surface 70 in this embodiment, a member other than the sheet-like plate may also be used, or this member may be used by the illumination optical system 1 Part of the structure is formed.

Each supply unit 8a supplies the flushing gas to the space between the first plate 22 and the second plate 7, and to the first concave portion 20a and the second concave portion 20b of the original platen 2. For example, the supply unit 8a is configured to blow the flushing gas from the outlet 71 provided in the second plate 7 (second surface 70), thereby supplying the flushing gas to the first concave portion 20a during the movement of the original platen 2 And the second concave portion 20b. In this embodiment, multiple (two) outlets 71 for flushing gas are provided to sandwich the illumination optical system 1 in the scanning direction.

[Supply of Rinse Gas to Original Plate Table] FIGS. 3A to 3C are views for explaining the supply of rinse gas to the original plate table 2 (first concave portion 20a and second concave portion 20b) at the time of scanning exposure. First, as shown in FIG. 3A, the original platen 2 is driven so that the second concave portion 20b ₁ on the -X direction side is arranged below the outlet 71b on the +X direction side. At this time, the flushing gas is supplied from the supply unit 8a through the outlet 71b to the second concave portion 20b ₁ on the -X direction side, so that the second concave portion 20b ₁ is filled with the flushing gas, and the gas pressure therein becomes high Air pressure outside the original platen 2. In this state, the flushing gas supplied to the second concave portion 20b ₁ gradually escapes through the gap between the first surface 20 and the second surface 70, making it possible to prevent outside air from flowing through the gap. In addition, when the original platen 2 is moved in the -X direction in this state, external air may invade through the gap between the first surface 20 and the second surface 70 as the original platen 2 moves, but the external air may Before flowing into the first concave portion 20a, it flows into the concave portion 20b and is diluted. That is, the outside air can be reduced (prevented) from flowing into the first concave portion 20a.

Next, as shown in FIG. 3B, the original plate 2 is driven so that the original plate M is arranged below the illumination optical system 1, and the scanning exposure is performed while moving the original plate 2 in the -X direction. When the original platen 2 moves from the state shown in FIG. 3A to the state shown in FIG. 3B, the second concave portion 20b ₁ is filled with the flushing gas supplied from the outlet 71a of the supply unit 8a. Since the second concave portion 20b ₁ is filled with flushing gas, the air pressure therein becomes higher than the air pressure outside the original platen 2. At this time, the first concave portion 20a is arranged below the outlet 71 (71a and 71b), and the flushing gas is supplied from the outlet 71 (71a and 71b) by the supply unit 8a. Therefore, the first concave portion 20a is filled with flushing gas and has a gas pressure higher than that of the outside of the original platen 2, making it possible to prevent outside air from flowing into the first concave through the gap between the first surface 20 and the second surface 70 Part 20a.

When the scanning exposure in the -X direction (scanning of the original stage 2) is completed, the scanning exposure in the reverse direction (+X direction) (scanning of the original stage 2) is performed. According to this, as shown in FIG. 3C, the original platen 2 is driven so that the second concave portion 20b ₂ on the +X direction side is arranged below the outlet 71a on the −X direction side. At this time, similar to the state shown in FIG. 3A, flushing gas is supplied from the supply unit 8a through the outlet 71a to the second concave portion 20b ₂ on the +X direction side, so that the air pressure therein becomes higher than the outside of the original platen 2 Air pressure. In this state, similar to the state described with reference to FIG. 3A, it is possible to prevent outside air from flowing through the gap, and it is also possible to reduce (prevent) outside air from passing between the first surface 20 and the second surface 70 as the original platen 2 moves The gap between them flows into the first concave portion 20a. Next, the original plate 2 is driven so that the original plate M is arranged below the illumination optical system 1, and the scanning exposure is performed while moving the original plate 2 in the +X direction. When the original platen 2 moves from the state shown in FIG. 3C in the +X direction, the second concave portion 20b _{2 is} filled with the flushing gas supplied from the outlet 71b of the supply unit 8a. Since the second concave portion 20b _{2 is} filled with flushing gas, the gas pressure therein becomes higher than the gas pressure outside the original platen 2.

In this way, in the original platen 2 of this embodiment, the second concave portion 20b (second space) is provided in the scanning direction of the first concave portion 20a (first space) where the original plate M is arranged, and The second concave portion 20b is used as a space for reducing (preventing) outside air from flowing into the first concave portion 20a. According to this, the second concave portion 20b may be arranged on both sides of the first concave portion 20a in the scanning direction (±X direction), but the second concave portion 20b may also be arranged on only one side. It should be noted that when the second concave portion 20b is arranged only on one side of the first concave portion 20a, its effect may be halved. However, in an environment where the flow of outside air around the original plate 2 constitutes a large tailwind or headwind with respect to the moving speed of the original plate 2, by installing on the side where the inflow of outside air should be prevented Only one second concave portion 20b can expect a sufficient effect.

Further, from the viewpoint of preventing outside air from flowing into the first concave portion 20a by the second concave portion 20b, the length of the second concave portion 20b in the vertical direction (Y direction) may be equal to or greater than the first concave The length of the entrance portion 20a in the vertical direction. The second concave portion 20b may have a volume which allows the second concave portion 20b to be filled with the flushing gas at a flow rate of the flushing gas supplied from the supply unit 8a via the outlet 71 during scanning of the original platen 2. Within this range, the length of the second concave portion 20b in the scanning direction, the length in the vertical direction, and the depth can be determined.

In the exposure apparatus 100 of this embodiment, if the air pressure is increased only at a partial portion of the second concave portion 20b, outside air may flow into the first concave portion 20a through the portion where the air pressure is not increased. Therefore, it is desirable that the range in which the flushing gas is supplied from the supply unit 8a via the outlet 71 and the range (length) of the second concave portion 20b are approximately equal (eg, coincident) in the vertical direction, so that the second concave portion 20b The air pressure of the whole becomes uniformly high. That is, in the vertical direction, the range of the outlet 71 provided in the second plate 7 may be equal to or larger than the range of the second concave portion 20b, so that the flushing gas is uniformly supplied to the second concave portion 20b. In addition, the outlet 71 may be provided in the second plate 7 so as to be symmetrical with respect to the center position of the movement range of the reciprocating motion of the original platen 2.

Here, the effect of providing the second concave portion 20b in the original platen 2 will be described. When the second concave portion 20b is not provided in the original platen 2, the flushing gas must be supplied to the first concave portion 20a to increase the gas pressure in the first concave portion 20a to be able to fill the first concave with the flushing gas Into the portion 20a and reduce the level of outside air flowing into the first recessed portion 20a. In this case, since the first concave portion 20a has a larger volume than the second concave portion 20b, a large amount of flushing gas is required to increase the air pressure in the first concave portion 20a to such a level. On the other hand, when the second concave portion 20b having a smaller volume than the first concave portion 20a is provided in the scanning direction of the first concave portion 20a as in this embodiment, it is possible to increase the first concave The amount of the flushing gas of the gas pressure into the portion 20a is smaller to increase the gas pressure in the second concave portion 20b. Since the second concave portion 20b having a high air pressure has a function of temporarily introducing outside air that has passed through the gap between the first surface 20 and the second surface 70 to reduce the concentration of the outside air, it can be reduced (prevented) Outside air flows into the first concave portion 20a. That is, when the second concave portion 20b is provided in the original platen 2 as in this embodiment, the amount of flushing gas can be reduced, and the flow of external air into the first concave portion 20a can be reduced (prevented) Prevent blurring of the original M.

[Specific example of the layout around the original plate] Next, a specific example of the peripheral arrangement of the original platen 2 will be described. For example, the moving speed of the original platen 2 ranges from, for example, a low speed of 100 mm/s to, for example, a high speed of 10,000 mm/s, and the moving stroke of the original platen 2 ranges from tens of millimeters to several meters. The distance between the first surface 20 and the second surface 70 ranges from a few microns to a few millimeters. The width of the original platen 2 in the vertical direction ranges from tens of millimeters to about 1 meter. The flow rate of the flushing gas supplied from the supply unit 8a via the outlet 71 ranges from tens of L/min to thousands of L/min.

In such a numerical range, the second concave portion 20b may have a volume which allows the second concave portion 20b to be filled with the flow rate of the flushing gas supplied from the supply unit 8a via the outlet 71 during scanning of the original platen 2 Flush the gas. For example, ideally, the volume V of the second concave portion 20b has a relationship of V≦V1+V2. Here, "V1" is the volume of gas supplied from the outlet 71 when the second concave portion 20b passes below the outlet 71, and "V2" is where the second concave portion 20b is not passing through the outlet 71 The volume of the gas supplied from the outlet 71 when downward. Within this range, the length of the second concave portion 20b in the scanning direction, the length in the vertical direction, and the depth can be determined. It should be noted that the depth of the second concave portion 20b may be equal to or greater than the thickness of the original plate M. In addition, the depth of the second concave portion 20b may be substantially equal to the depth of the first concave portion 20a, and more preferably greater than the depth of the first concave portion 20a.

Even when the second concave portion 20b has a volume that cannot be filled with flushing gas when the original platen 2 moves, the function of the second concave portion 20b can be maintained, for example, by temporarily introducing outside air into the second concave To reduce the concentration of outside air. A preferable condition for the function of the second concave portion 20b (for example, to reduce the concentration of the external air by temporarily introducing external air into the second concave portion) may be a relationship of d×W×L≦V. Here, "V" is the volume of the second concave portion 20b, "d" is the distance between the first surface 20 and the second surface 70, and "W" is the vertical direction of the second concave portion 20b The length, and "L" is the distance that the scan moves when the outlet 71 is located inside the second concave portion.

Although the above is a preferable condition, depending on the shape of the second plate 7, the shape of the second concave portion 20b, the shape of the original stage 2, and the surrounding environment, there may be a stricter relationship or a looser relationship. For example, when the depth of the second concave portion 20b is extremely large with respect to the length in the scanning direction or the length in the vertical direction, or when the internal space of the second concave portion 20b is large with respect to the opening shape, The entire volume of the second concave portion 20b cannot be effectively used. Therefore, the relationship may be stricter. In addition, when the surrounding environment is an exhaust environment or when a local strong wind blows toward the original platen 2, the relational expression may change.

It is also desirable that the flow rate of the flushing gas that escapes from the second concave portion 20b to the gap between the first surface 20 and the second surface 70 is higher than the moving speed of the original platen 2. The flow velocity v of the flushing gas that escapes from the second concave portion 20b to the gap between the first surface 20 and the second surface 70 with a distance d is generally expressed as v = F/{(d×W)×2 +(d×D)×2}, where “D” is the length of the second concave portion 20b in the scanning direction, “W” is the length of the second concave portion 20b in the vertical direction, and “F” is The supply from export 71 per unit time. According to this, when the moving speed of the original stage 2 is set to VR, it is desirable to satisfy the relationship of v ≥ VR. Therefore, the supply from the supply unit 8a to the second concave portion 20b can be determined based on the opening shape of the second concave portion 20b, the distance d between the first surface 20 and the second surface 70, and the moving speed of the original platen 2 The flow rate of the flushing gas. Even when the flow velocity of the flushing gas escaping from the second concave portion 20b is not higher than the moving speed of the original platen 2, the function of the second concave portion 20b can be maintained, for example, by temporarily introducing outside air to The second concave portion reduces the concentration of outside air.

In addition, the length of the second concave portion 20b in the vertical direction may be equal to or greater than the length of the first concave portion 20a in the vertical direction. With this arrangement, the second concave portion 20b can reduce (prevent) the outside air flowing in from the scanning direction side of the original stage 2 from flowing into the first concave portion 20a. It should be noted that, depending on the length of the second concave portion 20b in the vertical direction, the effect of preventing outside air from flowing into the first concave portion 20a may change. For example, when the length of the second concave portion 20b in the vertical direction is 50% of the length of the first concave portion 20a in the vertical direction, the effect of preventing outside air from flowing into the first concave portion 20a is also possible Reduced to 50%. Here, the length of the opening shape of the outlet 71 in the vertical direction may be equal to the length of the second concave portion 20b in the vertical direction. However, as long as the entire second concave portion can be supplied, the length of the opening shape of the outlet 71 in the vertical direction may be smaller than the length of the second concave portion 20b in the vertical direction.

Next, the effect of the exposure apparatus 100 of this embodiment arranged under the above conditions will be described. As an example, when the flow rate of the flushing gas supplied from the supply unit 8a is set to 500 L/min, the humidity in the first concave portion 20a is 0.15%RH, and the humidity outside the original platen 2 is 50%RH. On the other hand, in the arrangement where the second concave portion 20b is not provided, even when the flow rate of the flushing gas supplied from the supply unit 8a is increased to 550 L/min, the humidity in the first concave portion 20a is 1.5 %. This result also shows that when the second concave portion 20b is provided in the original platen 2 as in this embodiment, the outside air can be prevented (reduced) from flowing into the first concave portion 20a, and the amount of flushing gas used can be reduced.

Here, in a space outside the original platen 2, a measurement unit (for example, a laser interferometer) that measures the position of the original platen 2 may be provided to control the position of the original platen 2. In such a measurement unit, when the optical path environment of laser light (for example, temperature, air pressure, humidity, etc.) changes, a measurement error may occur accordingly. That is, when a large amount of flushing gas supplied to the first concave portion 20a and the second concave portion 20b flows out to the space outside the original platen 2, the optical path environment of the laser light changes accordingly, and measurement errors may occur . In the arrangement of the exposure apparatus 100 of this embodiment, since the amount of flushing gas can be reduced, this measurement error can also be reduced.

<Second embodiment> The second embodiment according to the present invention will be described. 4A and 4B are views showing the peripheral arrangement of the original stage 2 in the exposure apparatus 200 of this embodiment. 4A is a view showing the peripheral arrangement (X-Z section) of the original plate 2 in the exposure device 200, and the illumination optical system 1, the original plate 2, the projection optical system 3, the second plate 7, and the supply unit 8a. FIG. 4B is a view of the original platen 2 of this embodiment when viewed from above (+Z direction side). It should be noted that parts not specifically mentioned in the following description are similar to those in the first embodiment.

The exposure apparatus 200 of this embodiment is characterized in that the shape of the second concave portion 20b (second space) is different from the shape of the second concave portion in the first embodiment. In this embodiment, the second concave portion 20b is provided in the original platen 2 (first plate 22 or first surface 20) to surround the outside of the first concave portion 20a (first space). The second concave portion 20b may be formed as a groove portion having the same width on the scanning direction side and the vertical direction side of the first concave portion 20a, or may be formed on the scanning direction side and the first concave portion The groove portions of different widths on the vertical direction side of 20a. In addition, the second concave portion 20b may be formed as one continuous groove portion, or may be formed as a plurality of groove portions separated from each other. Also in the second concave portion 20b of this embodiment, as described in the first embodiment, the second concave portion 20b may be filled with flushing gas to increase the air pressure, and external air may be temporarily introduced into the second The concave portion 20b is lowered to reduce the concentration of outside air. Therefore, it is possible to reduce (prevent) the outside air from flowing into the first concave portion 20a.

In the original platen 2 of the present embodiment, by providing the second concave portion 20b to surround the outside of the first concave portion 20a, it is possible to reduce (prevent) the inflow of external air from the vertical direction (±Y direction). For example, this is effective when the airflow from the vertical direction is relatively large relative to the original platen 2. In this case, it is possible to supply flushing gas from the supply unit 8a via the outlet 71 to a portion of the second concave portion 20b arranged in the vertical direction of the first concave portion 20a, so that this portion is filled with flushing gas, To increase air pressure. That is, with regard to the shape of the second concave portion 20b, it is desirable to design the length (width) in the scanning direction and the length (width) in the vertical direction so that the air pressure in the second concave portion 20b becomes higher. In addition, depending on the arrangement space and arrangement position of the supply unit 8a, the shape of the second concave portion 20b may be designed such that the air pressure in the second concave portion 20b becomes higher.

In the original platen 2 of this embodiment, as the second concave portion 20b is also provided in the vertical direction, the amount of flushing gas used tends to be larger than that of the first embodiment, and the second concave The layout space in the portion 20b tends to be larger. Further, when the second concave portion 20b is formed as a continuous groove portion, the volume of the second concave portion 20b becomes larger than the volume of the second concave portion in the first embodiment, so that The amount of flushing gas in the two concave portions 20b to increase the air pressure may become larger. However, the second concave portion 20b is arranged such that the space defined by it (second space) is smaller than the space defined by the first concave portion 20a (first space). Therefore, compared to the arrangement in which only the first concave portion 20a is provided in the original platen 2 and the flushing gas is supplied to the first concave portion 20a, the second concave can be easily increased with a smaller amount of flushing gas usage The air pressure in the portion 20b, thereby effectively reducing (preventing) outside air from flowing into the first concave portion 20a. Even when the second concave portion 20b is formed of a plurality of groove portions (small spaces), the same effect can be obtained.

<Third Embodiment> A third embodiment according to the present invention will be described. 5A and 5B are views showing the peripheral arrangement of the original stage 2 in the exposure apparatus 300 of this embodiment. 5A is a view showing the peripheral arrangement (X-Z cross section) of the original plate 2 in the exposure device 300, and the illumination optical system 1, the original plate 2, the projection optical system 3, the second plate 7, and the supply unit 8a. FIG. 5B is a view of the original platen 2 of this embodiment when viewed from above (+Z direction side). It should be noted that parts not specifically mentioned in the following description are similar to those in the first embodiment.

In the exposure apparatus 300 of this embodiment, as compared with the first embodiment, a second concave portion 20c is provided outside the second concave portion 20b in the original platen 2 (first plate 22 or first surface 20) ( It may also be referred to as the third concave portion 20c). Each of the second concave portions 20c is formed in the original platen 2 as a groove portion defining a third space having a smaller volume than the first space (first concave portion 20a), and is provided in the second In the scanning direction of the concave portion 20b. In this embodiment, a plurality (two or more) of second concave portions 20c are provided in the original platen 2 to sandwich the first concave portions 20a and the second in the scanning direction (±X direction) The concave portion 20b. Here, it is desirable that the second recessed portion 20c has the same volume as the second recessed portion 20b, or that it allows the second recessed portion 20c to be taken from the supply unit 8a via the outlet 71 during scanning of the original platen 2 The flow rate of the supplied flushing gas is filled with the volume of the flushing gas. The shape of the second concave portion 20c may be the same as the shape of the second concave portion 20b.

In the original platen 2 of this embodiment, by further providing the second concave portion 20c, the inflow of outside air into the first concave portion 20a can be more effectively reduced (prevented). This is particularly effective when the movement path of the original platen 2 in the scanning direction is large and the movement time is long. In the original platen 2 of this embodiment, while the original platen 2 moves, the second concave portion 20c, the second concave portion 20b, and the first concave portion 20a are sequentially provided in order from the supply unit 8a via the outlet 71 Supply flushing gas. Each of these parts is filled with flushing gas in the above order, and the gas pressure therein is increased. Therefore, outside air may be temporarily introduced into the second concave portion 20c to reduce the concentration of the outside air, and outside air escaping from the second concave portion 20c may be temporarily introduced into the second concave portion 20b to further Reduce the concentration of outside air. That is, it is possible to more effectively reduce (prevent) outside air from flowing into the first concave portion 20a. Furthermore, compared to the first embodiment, even when the second concave portion 20c is further provided in the original platen 2 as described above, there is no need to change the position of the supply unit 8a (outlet 71). That is, in the exposure apparatus 300 of the present embodiment, by only changing the arrangement of the original stage 2, the effect of reducing the inflow of outside air into the first concave portion 20a can be further enhanced.

<Fourth embodiment> A fourth embodiment according to the present invention will be described. 6A and 6B are views showing the peripheral arrangement of the original stage 2 in the exposure apparatus 400 of this embodiment. 6A is a view showing the peripheral arrangement (X-Z cross section) of the original plate 2 in the exposure device 400, and the illumination optical system 1, the original plate 2, the projection optical system 3, the second plate 7, and the supply unit 8a. 6B is a view of the original platen 2 of this embodiment when viewed from above (+Z direction side). It should be noted that parts not specifically mentioned in the following description are similar to those in the first and second embodiments.

In the exposure apparatus 400 of this embodiment, compared to the second embodiment, a second concave portion 20c (which may also be referred to as a third) is provided in the original platen 2 (first plate 22 or first surface 20) The concave portion 20c) surrounds the outside of the second concave portion 20b. The second concave portion 20c is formed in the original platen 2 as a groove portion defining a third space having a smaller volume than the first space (first concave portion 20a), and is disposed to surround the second concave portion The exterior of 20b. Here, the second concave portion 20c may have the same shape (width and depth) as the second concave portion 20b.

In the original platen 2 of this embodiment, as in the third embodiment, by further providing the second concave portion 20c, the inflow of outside air into the first concave portion 20a can be more effectively reduced (prevented). In addition, compared to the second embodiment, in the original platen 2 of this embodiment, the second concave portion 20c is also provided to surround the outside of the second concave portion 20b, making it possible to reduce (prevent) the outside more effectively Air flows in from the vertical direction (±Y direction). Here, in the original platen 2 of this embodiment, in order to suppress the increase in the usage amount of the flushing gas due to the provision of the second concave portion 20c as much as possible, the second concave portions 20c may be formed to be separated from each other Of multiple grooves. By forming the second concave portion 20c as a plurality of groove portions in this way, the flushing gas can be locally supplied from the supply unit 8a to locally increase the air pressure in the second concave portion 20c.

<Fifth Embodiment> A fifth embodiment according to the present invention will be described. 7A and 7B are views showing the peripheral arrangement of the original stage 2 in the exposure apparatus 500 of this embodiment. 7A is a view showing the peripheral arrangement (X-Z cross section) of the original plate 2 in the exposure apparatus 500, and the illumination optical system 1, the original plate 2, the projection optical system 3, the second plate 7, and the supply unit 8a. 7B is a view of the original stage 2 of this embodiment when viewed from above (+Z direction side). It should be noted that parts not specifically mentioned in the following description are similar to those in the first embodiment. Further, the arrangement of the original stage 2 is not limited to the arrangement described in the first embodiment, and the arrangement described in any of the second to fourth embodiments can be applied.

The original platen 2 of this embodiment is provided with second supply units 8b, each of which supplies flushing gas to one of the second concave portions 20b (second space). Each of the second supply units 8b may be configured to always supply flushing gas to the second recessed portion 20b, or may be configured to supply flushing gas to the second recessed portion 20b for a specific period of time. The specific period may be a period in which the original platen 2 moves along the arrangement direction of the first concave portion 20a and the second concave portion 20b (that is, the scanning direction (±X direction)). With this arrangement, the flushing gas can be supplied to the second concave portion 20b so that the air pressure in the second concave portion 20b is higher than the air pressure outside the original platen 2, thereby reducing (preventing) outside air from flowing into the first concave portion 20a.

<Sixth Embodiment> The sixth embodiment according to the present invention will be described. 8A and 8B are views showing the peripheral arrangement of the original stage 2 in the exposure apparatus 600 of this embodiment. 8A is a view showing the peripheral arrangement (X-Z cross section) of the original plate 2 in the exposure device 600, and the illumination optical system 1, the original plate 2, the projection optical system 3, the second plate 7, and the supply unit 8a. 8B is a view of the original platen 2 of this embodiment when viewed from above (+Z direction side). It should be noted that parts not specifically mentioned in the following description are similar to those in the fifth embodiment. Further, the arrangement of the original stage 2 is not limited to the arrangement described in the first embodiment, and the arrangement described in any of the second to fourth embodiments can be applied.

In the original platen 2 of this embodiment, second supply units 8b are provided, each of which supplies flushing gas to one of the second concave portions 20b (second space), and is also provided with a The flushing gas is supplied to the third supply unit 8c of the first concave portion 20a (first space). In this embodiment, since the flushing gas is supplied to the first concave portion 20a by the third supply unit 8c, it is not provided to supply the flushing gas to the first by blowing the flushing gas from the outlet 71 in the second plate 7. A supply unit 8a of a concave portion 20a. Therefore, for example, when the supply unit 8a (outlet 71) cannot be provided in the second plate 7 due to the arrangement space or the like, the arrangement of this embodiment is useful.

In this way, by providing the third supply unit 8c that supplies the flushing gas to the first concave portion 20a in the original platen 2, the supply to the first concave during the movement of the original platen 2 (for example, during the scanning exposure) The flow rate of the flushing gas into the portion 20a can be kept constant. Therefore, the humidity distribution in the first concave portion 20a can be made uniform, and the amount of flushing gas used to fill the first concave portion 20a can be reduced.

<Seventh Embodiment> The seventh embodiment according to the present invention will be described. In the first to sixth embodiments, it has been described that the member (second plate 7) including the second surface 70 is provided on the illumination optical system side of the original stage 2, and the upper surface of the original stage 2 is used as the first An example of a surface 20 to form a first concave portion 20a and a second concave portion 20b. On the other hand, the exposure apparatus may have an arrangement in which the lower surface of the original platen 2 is used as the first surface 20 to form the first concave portion 20a and the second concave portion 20b, and includes a surface facing the first surface 20 The member of the second surface of is provided on the projection optical system side of the original stage 2. In the exposure apparatus arranged here, for example, as shown in FIGS. 2A to 8B, for example, a member (plate 9) including the surface 90 as the second surface is provided on the projection optical system side of the original stage 2. Next, the original platen 2 has an arrangement in which the upper side and the lower side are reversed with respect to the arrangement shown in FIGS. 2A to 8B. That is, the original platen 2 may be arranged so that the first surface 20 provided with the first concave portion 20a and the second concave portion 20b faces the surface 90 of the plate 9 provided in the projection optical system. Even in this arrangement, the same effects as in the first to sixth embodiments can be obtained.

<Example of method of manufacturing article> A method of manufacturing an article according to an embodiment of the present invention is suitable for manufacturing an article, for example, a micro device such as a semiconductor device or an element having a micro structure. The method of manufacturing an article according to this embodiment includes the steps of forming a latent image pattern on the photosensitizer applied to the substrate (step of exposing the substrate) using the above-described exposure device, and developing using the latent image pattern formed in the above steps (Processing) the step of the substrate. This manufacturing method also includes other known steps (oxidation, deposition, vapor deposition, doping, planarization, etching, resist separation, cutting, bonding, packaging, etc.). Compared with the conventional method, the method of manufacturing an article according to this embodiment is advantageous in at least one of performance, quality, productivity, and production cost of the article.

<Other embodiments> Embodiments of the present invention can also be implemented by a computer of a system or device. The computer of the system or device reads and executes recorded on a storage medium (which can also be more completely called "non-transitory" Computer-readable storage medium") computer-executable instructions (eg, one or more programs) to perform the functions of one or more of the above-described embodiments, and/or include functions for performing one or more of the above-described implementations One or more circuits (eg, application specific integrated circuit (ASIC)), and embodiments of the present invention can be implemented by a computer of a system or device, for example, a computer that reads and executes from a storage medium can The method is executed by executing instructions to perform the functions of one or more of the above embodiments, and/or controlling one or more circuits to perform the functions of one or more of the above embodiments. The computer may include one or more processors (eg, central processing unit (CPU), micro-processing unit (MPU)), and may include a network of separate computers or separate processors to read and execute the computer executable instruction. Computer executable instructions, for example, can be provided to the computer from a network or storage medium. Storage media may include, for example, hard drives, random access memory (RAM), read-only memory (ROM), storage for distributed computing systems, optical discs (eg, compact discs (CD), diversified digital discs) One or more of (DVD) or Blu-ray Disc (BD) ^TM ), flash memory device, memory card, etc.

Although the invention has been described with reference to exemplary embodiments, it should be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following patent application scope should be given the broadest interpretation to cover all such types of modifications and equivalent structures and functions.

1: Illumination optical system 2: Original table 3: Projection optical system 4: Substrate table 5: Control unit 6: Light source 7: Second board 8a: Supply unit 8b: Second supply unit 8c: Third supply unit 9: Board 20 : First surface 20a: First concave portion 20b: Second concave portion 20b ₁ : Second concave portion 20b ₂ : Second concave portion 20c: Second concave portion 21: Holding portion 21a: Base 21b: First protruding portion 21c: second protruding portion 22: first plate 22a: extended area 70: second surface 71: outlet 71a: outlet 71b: outlet 90: surface 100: exposure device 200: exposure device 300: exposure device 400: Exposure device 500: Exposure device 600: Exposure device M: Original W: Substrate

FIG. 1 is a view showing the overall arrangement of an exposure device;

2A and 2B are views showing the peripheral arrangement of the original platen according to the first embodiment;

3A to 3C are views for explaining the supply of flushing gas during scanning exposure;

4A and 4B are views showing the peripheral arrangement of the original platen table according to the second embodiment;

5A and 5B are views showing the peripheral arrangement of the original plate according to the third embodiment;

6A and 6B are views showing the peripheral arrangement of the original plate according to the fourth embodiment;

7A and 7B are views showing the peripheral layout of the original platen according to the fifth embodiment; and

8A and 8B are views showing the peripheral arrangement of the original plate according to the sixth embodiment.

1: Illumination optical system

2: Original edition table

3: projection optical system

7: Second board

8a: supply unit

9: Board

20: first surface

20a: first recessed part

20b: Second recessed part

21: Keep part

21a: base

21b: First highlight

21c: Second prominent part

22: First board

70: Second surface

71: Exit

90: surface

100: exposure device

M: Original

Claims (16)

An exposure device that exposes the substrate while scanning the original plate and the substrate. The exposure device includes: The stage includes a first surface and can move while maintaining the original plate, and a first concave portion and a second concave portion to be supplied with flushing gas are formed in the first surface; and A member, including a second surface facing the first surface, Wherein, the first concave portion is provided in the first surface of the table, so as to define a first space in which the original plate is arranged, and At least one second recessed portion is provided outside the first recessed portion in the first surface of the stage so as to define a second space having a smaller volume than the first space. An exposure apparatus as claimed in item 1 of the patent scope, wherein the second concave portion is provided in the scanning direction of the stage during the scanning exposure with respect to the first concave portion. An exposure apparatus as claimed in item 2 of the patent application, wherein the length of the second concave portion in the scanning direction is smaller than the length of the second concave portion in the direction perpendicular to the scanning direction. An exposure device as claimed in item 2 of the patent application, wherein in the direction perpendicular to the scanning direction, the length of the second concave portion is not less than the length of the first concave portion. An exposure device as claimed in item 2 of the patent application, wherein the distance between the first surface and the second surface is smaller than the length of the second concave portion in the scanning direction. An exposure apparatus as claimed in item 1 of the patent scope, wherein the second concave portion is provided to surround the outside of the first concave portion in the second surface. An exposure apparatus as claimed in item 1 of the patent scope, wherein, on the first surface of the stage, the area outside the second concave portion includes a portion where the distance between the first surface and the second surface is the smallest. An exposure apparatus as claimed in claim 1 of the patent application, wherein each of the first concave portion and the second concave portion has a depth not less than the thickness of the original plate. As in the exposure device of claim 1, the depth of the second concave portion is not greater than the depth of the first concave portion. An exposure apparatus as claimed in item 1 of the patent scope, wherein, in the first surface, a plurality of second concave portions are provided outside the first concave portion, each of the plurality of second concave portions The second concave portion has a smaller volume than the first concave portion. The exposure apparatus as claimed in item 1 of the patent scope further includes a supply unit configured to blow the flushing gas from the outlet provided in the first surface of the member to the first during the movement of the stage The recessed portion and the second recessed portion supply the flushing gas. The exposure device as claimed in item 1 of the patent scope further includes a second supply unit, which is provided in the stage and is configured to supply flush gas to the second recessed portion. An exposure apparatus as claimed in item 12 of the patent application further includes a third supply unit, which is provided in the stage and is configured to supply flush gas to the first concave portion. For example, the exposure device according to item 1 of the patent application scope further includes an illumination optical system configured to illuminate the original, Wherein, the member is provided on the side of the illumination optical system with respect to the stage. For example, the exposure device according to item 1 of the patent application scope further includes a projection optical system configured to project the original pattern onto the substrate, Wherein, the member is arranged on the side of the projection optical system with respect to the stage. A method of manufacturing an article, the method comprising: Expose the substrate using the exposure device as described in any one of patent application items 1 to 15; Develop the exposed substrate; and The developed substrate is processed to manufacture the article.

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