TW202010716A - Continuous methods of making glass ribbon and as-drawn glass articles from the same - Google Patents
Continuous methods of making glass ribbon and as-drawn glass articles from the same Download PDFInfo
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- TW202010716A TW202010716A TW108120831A TW108120831A TW202010716A TW 202010716 A TW202010716 A TW 202010716A TW 108120831 A TW108120831 A TW 108120831A TW 108120831 A TW108120831 A TW 108120831A TW 202010716 A TW202010716 A TW 202010716A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
- C03B17/067—Forming glass sheets combined with thermal conditioning of the sheets
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/068—Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
Abstract
Description
本揭露內容大體係關於製造玻璃條帶之方法,且更特定言之,自具有相對低液相線黏度之玻璃組成物製造具有高尺寸穩定性之玻璃條帶之連續方法。The present disclosure contains a large system of methods for manufacturing glass ribbons, and more specifically, a continuous method for manufacturing glass ribbons with high dimensional stability from glass compositions having relatively low liquidus viscosity.
自具有低液相線黏度之玻璃組成物(包括具有高折射率之組成物)製造透鏡及其他光學組件之習知方法成本非常高,並具有自此等方法生產的熔化玻璃之低利用。典型地,此等方法包括將組成物鑄造成具有在厚度上實質上大於最終產品之一厚度的長條。亦即,此等形成方法生產需要額外處理以獲得最終產品形式及尺寸之一鑄條。Conventional methods for manufacturing lenses and other optical components from glass compositions with low liquidus viscosity (including compositions with high refractive index) are very costly and have low utilization of molten glass produced by these methods. Typically, such methods include casting the composition into a strip having a thickness that is substantially greater than the thickness of one of the final products. That is, the production of these forming methods requires additional processing to obtain one of the cast bars in the final product form and size.
此等鑄條之額外處理常常花費高。詳言之,鑄條接著經鋸切成碟片。接下來,該等碟片經研磨以將其外直徑拋光至最終產品透鏡之最終外尺寸。該等碟片接著經線鋸至大約最終透鏡最終產品之一厚度,且接著經受一連串重要的研磨及拋光步驟以達成最終產品透鏡之所需之翹曲及尺寸均勻性。因此,用於自此等玻璃組成物形成透鏡及其他光學組件之習知製程成本高且熔化玻璃之利用率低。The extra processing of these cast bars is often expensive. In detail, the cast strip is then sawed into discs. Next, the discs are ground to polish their outer diameter to the final outer dimensions of the final product lens. The discs are then wire sawed to approximately one thickness of the final product of the final lens, and then subjected to a series of important grinding and polishing steps to achieve the desired warpage and dimensional uniformity of the final product lens. Therefore, the conventional manufacturing process for forming lenses and other optical components from these glass compositions is costly and the utilization rate of molten glass is low.
根據本揭露內容之一些態樣,提供一種製造一玻璃條帶之方法,包括:使一玻璃流動至具有自約100 mm至約5 m之一寬度(Wcast )及自約1 mm至約500 mm之一厚度(t )的一鑄造機內以形成一鑄造玻璃;將該鑄造機中之該鑄造玻璃冷卻至至少108 泊之一黏度;自該鑄造機傳送該鑄造玻璃;拉製該鑄造玻璃,該拉製包含將該鑄造玻璃加熱至小於107 泊之一平均黏度及將該鑄造玻璃拉製成具有小於Wcast 之一寬度(Wribbon )的一玻璃條帶;及其後將該玻璃條帶冷卻至環境溫度。另外,在該冷卻、傳送及拉製步驟期間的該鑄造玻璃處於約50℃或更高。According to some aspects of the present disclosure, a method of manufacturing a glass strip is provided, including: flowing a glass to have a width ( W cast ) from about 100 mm to about 5 m and from about 1 mm to about 500 within one mm thickness (t) of a casting machine to form a cast glass; the cast glass was cooled to the casting machine at least one of the viscosity of 108 poise; from the casting machine to transmit the cast glass; drawn the casting glass, which comprises drawing the cast glass was heated to an average of less than one 107 poise and the viscosity pull made of cast glass having a width of less than one W cast (W ribbon) of a glass ribbon; and after the The glass strip is cooled to ambient temperature. In addition, the cast glass during the cooling, conveying, and drawing steps is at about 50°C or higher.
根據本揭露內容之一些態樣,提供一種玻璃物件,包括:一未拋光之玻璃條帶,具有自約1 mm至約25 mm之一厚度及25 mm至約200 mm之一寬度。該條帶包含選自由以下各者組成之群組的一玻璃:硼矽酸鹽玻璃、鋁硼矽酸鹽玻璃、鋁矽酸鹽玻璃、氟矽酸鹽玻璃、磷矽酸鹽玻璃、氟磷酸鹽玻璃、硫磷酸鹽玻璃、鍺酸鹽玻璃、釩酸鹽玻璃、硼酸鹽玻璃及磷酸鹽玻璃。另外,組成物包含小於5×105 泊之一上限液相線黏度。此外,該玻璃條帶能夠被切片成具有自約0.01 μm至約50 μm之一厚度變化及自約0.01 μm至約200 μm之一翹曲的玻璃晶圓。According to some aspects of the present disclosure, a glass object is provided, including: an unpolished glass strip having a thickness from about 1 mm to about 25 mm and a width from 25 mm to about 200 mm. The strip includes a glass selected from the group consisting of: borosilicate glass, aluminoborosilicate glass, aluminosilicate glass, fluorosilicate glass, phosphosilicate glass, fluorophosphoric acid Salt glass, thiophosphate glass, germanate glass, vanadate glass, borate glass and phosphate glass. In addition, the composition contains an upper limit liquidus viscosity of less than 5×10 5 poise. In addition, the glass strip can be sliced into a glass wafer having a thickness variation from about 0.01 μm to about 50 μm and warping from about 0.01 μm to about 200 μm.
根據本揭露內容之一些態樣,提供一種玻璃物件,包括:一未拋光之玻璃晶圓,具有自約1 mm至約25 mm之一厚度及100 mm至約200 mm之一寬度。該條帶包含選自由以下各者組成之群組的一玻璃:硼矽酸鹽玻璃、鋁硼矽酸鹽玻璃、鋁矽酸鹽玻璃、氟矽酸鹽玻璃、磷矽酸鹽玻璃、氟磷酸鹽玻璃、硫磷酸鹽玻璃、鍺酸鹽玻璃、釩酸鹽玻璃、硼酸鹽玻璃及磷酸鹽玻璃。另外,組成物包含小於5×105 泊之一上限液相線黏度。此外,該玻璃晶圓具有自約0.01 μm至約50 μm之一厚度變化及自約0.01 μm至約200 μm之一翹曲。According to some aspects of the present disclosure, a glass object is provided, including: an unpolished glass wafer having a thickness from about 1 mm to about 25 mm and a width from 100 mm to about 200 mm. The strip includes a glass selected from the group consisting of: borosilicate glass, aluminoborosilicate glass, aluminosilicate glass, fluorosilicate glass, phosphosilicate glass, fluorophosphoric acid Salt glass, thiophosphate glass, germanate glass, vanadate glass, borate glass and phosphate glass. In addition, the composition contains an upper limit liquidus viscosity of less than 5×10 5 poise. In addition, the glass wafer has a thickness variation from about 0.01 μm to about 50 μm and a warpage from about 0.01 μm to about 200 μm.
額外特徵及優勢將在接下來之詳細描述中闡述,且將易於為熟習此項技術者自彼描述而顯而易見,或藉由實踐如本文中描述之實施例來認識,包括接下來之詳細描述、申請專利範圍以及隨附圖式。Additional features and advantages will be set forth in the detailed description that follows, and will be readily apparent to those skilled in the art from their own descriptions, or will be recognized by practicing the embodiments described herein, including the detailed description that follows, Scope of patent application and accompanying drawings.
應理解,前述大體描述及以下詳細描述皆描述各種實施例,且意欲提供理解所主張主題之本質及特性的綜述或框架。It should be understood that the foregoing general description and the following detailed description describe various embodiments, and are intended to provide an overview or framework for understanding the nature and characteristics of the claimed subject matter.
包括隨附圖式以提供對各種實施例之進一步理解,且其併入本說明書內且構成本說明書之一部分。該等圖式說明本文中描述之各種實施例,且與描述一起用以解釋主張之標的之原理及操作。The accompanying drawings are included to provide a further understanding of various embodiments, and are incorporated in and constitute a part of this specification. These drawings illustrate various embodiments described herein, and together with the description serve to explain the principles and operation of the claimed subject matter.
額外特徵及優勢將在接下來之詳細描述中闡述,且自該描述,將對熟習此項技術者顯而易見,或藉由實踐如在以下描述連同申請專利範圍及隨附圖式中描述之實施例來認識。Additional features and advantages will be described in the following detailed description, and from this description, it will be obvious to those skilled in the art, or by practice as described in the following description together with the scope of the patent application and the accompanying drawings. Come to know.
如本文中所使用,術語「及/或」當在兩個或更多個項目之清單中使用時,意謂所列出項目中之任何一個可自身使用,或可使用所列出項目中之兩個或更多個之任何組合。舉例而言,若將一組成描述為含有組件A、B及/或C,則該組成可含有單獨A;單獨B;單獨C;A與B組合;A與C組合;B與C組合;或A、B與C組合。As used herein, the term "and/or" when used in a list of two or more items means that any one of the listed items can be used by itself, or one of the listed items can be used Any combination of two or more. For example, if a composition is described as containing components A, B, and/or C, the composition may contain A alone; B alone; C alone; A combined with B; A combined with C; B combined with C; or A, B and C are combined.
在本文件中,諸如第一及第二、頂部及底部及類似者之關係術語僅用以區分一個實體或動作與另一實體或動作,而不必需要或暗示此等實體或動作之間的任何實際此關係或次序。In this document, relational terms such as first and second, top and bottom, and the like are only used to distinguish one entity or action from another entity, and do not necessarily need or imply any of these entities or actions Actually this relationship or order.
本揭露內容之修改將為熟習此項技術者及製造或使用本揭露內容之人士想到。因此,應理解,在圖式中展示及以上描述之實施例僅用於說明性目的,且不意欲限制本揭露內容之範疇,該範疇由如根據專利法之原理解釋的以下申請專利範圍(包括等效內容之教條)定義。The modification of the content of this disclosure will come to mind for those who are familiar with this technology and those who make or use this content. Therefore, it should be understood that the embodiments shown in the drawings and described above are for illustrative purposes only, and are not intended to limit the scope of this disclosure, which is covered by the following patent applications (including The dogma of equivalent content) definition.
如本文中所使用,術語「約」意謂數量、大小、配方、參數及其他量及特性並不且不需要準確,但可按需要為近似值及/或較大或較小,反映公差、轉換因數、捨入、量測誤差及類似者及熟習此項技術者已知之其他因素。當術語「約」在描述一範圍之值或端點時使用時,本揭露內容應理解為包括提及之該具體值或端點。不管是否將說明書中的一範圍之一數值或端點敘述為「約」,一範圍之該數值或端點皆意欲包括兩個實施例:由「約」修飾之實施例,及不由「約」修飾之實施例。應進一步理解,該等範圍中之每一者之端點關於另一端點及獨立於另一端點皆為重要的。As used herein, the term "approximately" means that the quantity, size, formula, parameters, and other quantities and characteristics are not and need not be accurate, but may be approximate and/or larger or smaller as necessary, reflecting tolerances, conversions Factors, rounding, measurement errors and the like and other factors known to those skilled in the art. When the term "about" is used in describing a range of values or endpoints, the disclosure should be understood to include the specific value or endpoint mentioned. Regardless of whether a value or endpoint of a range in the specification is described as "about", the value or endpoint of a range is intended to include two embodiments: the embodiment modified by "about" and not by "about" Modified embodiment. It should be further understood that the endpoint of each of these ranges is important with respect to and independent of the other endpoint.
如本文中使用之術語「實質上(substantial、substantially)」及其變型意欲指出,一描述之特徵等於或大致等於一值或描述。舉例而言,一「實質上平坦」表面意欲表示平坦或大致平坦之一表面。此外,「實質上」意欲表示兩個值相等或大致相等。在一些實施例中,「實質上」可表示在彼此之約10%內的值,諸如,在彼此之約5%內,或在彼此之約2%內。As used herein, the term "substantially, substantially" and its variations are intended to indicate that the features of a description are equal to or substantially equal to a value or description. For example, a "substantially flat" surface is intended to mean a flat or substantially flat surface. In addition, "substantially" is intended to mean that two values are equal or approximately equal. In some embodiments, "substantially" may represent values within about 10% of each other, such as within about 5% of each other, or within about 2% of each other.
如本文中使用之方向術語(例如,上、下、右、左、前、後、頂部、底部)僅參看如所繪製之圖來作出,且並不意欲暗示絕對定向。Directional terms as used herein (eg, up, down, right, left, front, back, top, bottom) are only made with reference to the drawing as drawn, and are not intended to imply absolute orientation.
如本文中使用,術語「該」、「一(a或an)」意謂「至少一個」,且不應限於「僅一個」,除非明確地有相反指示。因此,舉例而言,對「一組件」之參考包括具有兩個或更多個此等組件之實施例,除非上下文另有清晰指示。As used herein, the terms "the", "one (a or an)" mean "at least one" and should not be limited to "only one" unless clearly indicated to the contrary. Thus, for example, reference to "a component" includes embodiments having two or more such components, unless the context clearly indicates otherwise.
如本文中所使用,術語「上限液相線黏度」及「上限液相線溫度」指在本揭露內容之物件及方法中使用的玻璃之各別黏度及溫度,在該黏度及溫度下,玻璃形成無晶體之均質熔化物。另外,術語「上限液相線黏度」與「液相線黏度」在本文中可互換地使用;且術語「上限液相線溫度」與「液相線溫度」在本文中亦可互換地使用。As used herein, the terms "upper limit liquidus viscosity" and "upper limit liquidus temperature" refer to the respective viscosities and temperatures of the glass used in the objects and methods of the present disclosure. At these viscosities and temperatures, the glass Form a homogeneous melt without crystals. In addition, the terms "upper limit liquidus viscosity" and "liquid line viscosity" are used interchangeably herein; and the terms "upper limit liquidus temperature" and "liquid line temperature" are also used interchangeably herein.
亦如本文中所使用,術語「下限液相線黏度」及「下限液相線溫度」指在本揭露內容之物件及方法中使用的玻璃之各別黏度及溫度,在該黏度及溫度下,玻璃可易於有一或多個結晶相之生長。As also used herein, the terms "lower liquidus viscosity" and "lower liquidus temperature" refer to the respective viscosities and temperatures of the glass used in the objects and methods of this disclosure, at which viscosities and temperatures, Glass can easily grow with one or more crystalline phases.
如本文中所使用,在本揭露內容之物件及方法中使用的玻璃之「去玻化地帶」為由上限液相線溫度至下限液相線溫度給出之溫度範圍,例如,玻璃經歷高於0.01 μm/min的一或多個結晶相之晶體生產之溫度範圍。As used herein, the “devitrification zone” of the glass used in the objects and methods of the present disclosure is the temperature range given from the upper liquidus temperature to the lower liquidus temperature, for example, the glass experiences higher than The temperature range for the production of crystals with one or more crystalline phases of 0.01 μm/min.
如本文中所使用,在本揭露內容之物件及方法中使用的玻璃之「平均黏度」指本揭露內容之玻璃、玻璃條帶、玻璃薄片或其他物件之黏度,如在提及之製程或方法步驟(例如,拉製)期間在物件之一區域上且在足以根據一般熟習本揭露內容之技術者理解之分析及量測方法確定平均黏度值之一持續時間上所量測。As used herein, the "average viscosity" of the glass used in the objects and methods of this disclosure refers to the viscosity of the glass, glass ribbon, glass flakes, or other objects of this disclosure, such as the mentioned processes or methods Measured during a step (eg, drawing) on an area of the object and over a duration sufficient to determine the average viscosity value according to analysis and measurement methods understood by those skilled in the art who are familiar with the disclosure.
如本文中所使用,術語「連續」指本揭露內容之經組態以形成玻璃薄片、條帶及其他物件而不需要任何中間及/或後冷卻熱處理(諸如,退火或重新拉製)的方法及製程。換言之,本揭露內容之製程及方法經組態以形成在其拉製步驟前未切割或切片之玻璃薄片、玻璃條帶及其他物件。As used herein, the term "continuous" refers to methods of the disclosure configured to form glass sheets, ribbons, and other objects without any intermediate and/or post-cooling heat treatment (such as annealing or redrawing) And process. In other words, the processes and methods of the present disclosure are configured to form glass sheets, glass strips, and other objects that were not cut or sliced before their drawing step.
如本文中所使用,「最大晶體生長速率」指在本揭露內容之物件及方法中使用的玻璃在一參考之溫度下或在一參考之溫度範圍內的任何結晶相之最大生長速率,例如,以μm/min為單位。如本文中所使用,「晶體生長速率」指在本揭露內容之物件及方法中使用的玻璃在一參考之溫度下或在一參考之溫度範圍內的任何結晶相之生長速率,例如,以μm/min為單位。As used herein, "maximum crystal growth rate" refers to the maximum growth rate of any crystalline phase of the glass used in the objects and methods of the present disclosure at a reference temperature or within a reference temperature range, for example, The unit is μm/min. As used herein, "crystal growth rate" refers to the growth rate of any crystalline phase of the glass used in the objects and methods of the present disclosure at a reference temperature or within a reference temperature range, for example, in μm /min is the unit.
如本文中所使用,本揭露內容之玻璃晶圓、玻璃條帶、玻璃薄片或其他物件之「厚度變化」係藉由由一機械接觸卡鉗或測微計或一非接觸式雷射測徑儀(對於具有1 mm或更大之一厚度的物件)判定玻璃晶圓、玻璃條帶、玻璃薄片或其他物件之最小厚度與最大厚度之間的差來量測。As used herein, the "thickness change" of glass wafers, glass strips, glass flakes or other objects of the present disclosure is by a mechanical contact caliper or micrometer or a non-contact laser caliper (For objects with a thickness of 1 mm or greater) Determine the difference between the minimum thickness and maximum thickness of glass wafers, glass strips, glass flakes, or other objects to measure.
如本文中所使用,本揭露內容之玻璃晶圓、玻璃條帶、玻璃薄片或其他物件之「翹曲」係根據含有該物件之兩個平面之間的距離減去物件之平均厚度來量測。對於具有實質上矩形形狀的本揭露內容之玻璃條帶、玻璃薄片及其他玻璃物件,根據由一般熟習本揭露內容之技術者理解之原理量測該翹曲。詳言之,自具有由物件之珠粒之間的品質區減去距珠粒中之每一者之內邊緣五(5)mm定義之一長度的一正方形量測區來評估翹曲。類似地,對於具有實質上圓碟狀形狀的本揭露內容之玻璃晶圓,亦根據由一般熟習本揭露內容之技術者理解之原理量測該翹曲。詳言之,自具有由晶圓之外半徑減去五(5)mm定義之一半徑的圓形量測區來評估翹曲。As used herein, the "warpage" of glass wafers, glass strips, glass flakes, or other objects of this disclosure is measured based on the distance between two planes containing the object minus the average thickness of the object . For glass strips, glass flakes, and other glass objects having a substantially rectangular shape of the present disclosure, the warpage is measured according to principles understood by those skilled in the art who are familiar with the disclosure. In detail, warpage is evaluated from a square measurement area having a length defined by the quality area between the beads of the object minus five (5) mm from the inner edge of each of the beads. Similarly, for a glass wafer having a substantially disc-like shape of the present disclosure, the warpage is also measured according to the principles understood by those skilled in the art who are familiar with the disclosure. In detail, warpage is evaluated from a circular measurement area with a radius defined by the outer radius of the wafer minus one (5) mm.
如本文中所使用,本揭露內容之玻璃、玻璃條帶、玻璃薄片或其他物件之「臨界冷卻速率」係藉由將玻璃、玻璃薄片或其他物件之多個樣本按各種選定冷卻速率降溫熔化至其玻璃轉變溫度來判定。該等樣本接著根據標準切片及拋光技術來橫切,且藉由處於100x下之光學顯微術來評估,以確定在塊體中及在其自由表面(亦即,具有與坩堝或類似者之一界面的頂表面、暴露之表面及底表面)處的晶體之存在。臨界冷卻速度對應於具有不展現在其表面及塊體處之晶體之最低冷卻速率的樣本。As used herein, the "critical cooling rate" of glass, glass ribbon, glass flakes, or other objects of the present disclosure is achieved by cooling and melting multiple samples of glass, glass flakes, or other objects at various selected cooling rates to The glass transition temperature is determined. The samples were then cross-sectioned according to standard slicing and polishing techniques, and evaluated by optical microscopy at 100x to determine in the block and on its free surface (i.e., having a crucible or similar The existence of crystals at the top surface, exposed surface and bottom surface of an interface). The critical cooling rate corresponds to the sample with the lowest cooling rate of crystals not exhibiting on its surface and bulk.
一般地參看該等圖式,且特定參看第1圖,應理解,該等圖示僅為了描述特定實施例之目的,且並不意欲將揭露之所附申請專利範圍限於此。該等圖式未必按比例,且該等圖式之某些特徵及某些視圖可能在比例上或在示意圖中經誇大地展示,以為了清晰且簡潔。Referring generally to these drawings, and specifically to FIG. 1, it should be understood that these drawings are only for the purpose of describing specific embodiments and are not intended to limit the scope of the disclosed attached patent applications. These drawings are not necessarily to scale, and some features and some views of these drawings may be exaggeratedly shown in scale or in schematic diagrams for clarity and conciseness.
在本揭露內容中所描述為製造玻璃條帶之方法,且更特定言之,自具有相對低液相線黏度(例如,> 5×105 泊)及/或相對高折射率之玻璃組成物製造用於透鏡及其他光學組件之玻璃條帶之連續方法。根據此等方法生產之玻璃條帶具有高尺寸穩定性及低翹曲,且在與所意欲之最終產品之尺寸相當之最終尺寸下生產。結果,根據本揭露內容之方法生產的玻璃條帶需要有限後處理。因此,與在自具有低液相線黏度之玻璃組成物製造透鏡時使用之習知玻璃形成製程相比,本揭露內容之方法擁有顯著更低之製造成本。另外,本揭露內容之方法具有所熔化之玻璃的顯著更高之利用率,具有低浪費。Described in this disclosure as a method of manufacturing glass ribbons, and more specifically, a glass composition having a relatively low liquidus viscosity (eg,> 5×10 5 poise) and/or a relatively high refractive index A continuous method of manufacturing glass strips for lenses and other optical components. The glass strips produced according to these methods have high dimensional stability and low warpage, and are produced at a final size comparable to the size of the intended final product. As a result, glass strips produced according to the method of the present disclosure require limited post-processing. Therefore, the method of the present disclosure has a significantly lower manufacturing cost compared to conventional glass forming processes used when manufacturing lenses from glass compositions with low liquidus viscosity. In addition, the method of the present disclosure has a significantly higher utilization of the melted glass, with low waste.
值得注意地,本揭露內容之製造一玻璃條帶之方法在其不需要任何後生產退火或其他後生產熱處理之意義上係連續的。該等方法使用經由去玻化地帶至高於環境之一溫度(例如,> 50℃)之冷卻,例如,藉由傳送鑄造玻璃穿過一鑄造機。在將玻璃冷卻至高於環境之一溫度後,該等方法使用一額外拉製步驟,具有至去玻化地帶內之某一再加熱。該拉製步驟導致具有大約在最終產品中意欲之厚度尺寸的厚度尺寸之玻璃條帶,例如,晶圓、透鏡或具有高折射率之其他光學組件。另外,在一玻璃黏度且最小化或消除去玻化之任何可能性之溫度下,有利地在一有限持續時間內進行拉製步驟。此外,該等方法在不需要任何後冷卻(亦即,在達到環境溫度後)熱處理(諸如,退火或重新拉製)以獲得最終產品(例如,玻璃條帶、晶圓、透鏡或其他玻璃物件)之意義上特別有利。亦有利地,本揭露內容之方法之態樣導致不需要任何額外機械處理(例如,拋光、研磨等)來符合光學組件之翹曲及/或厚度變化等級的玻璃條帶、晶圓、透鏡或其他玻璃物件。Notably, the method of manufacturing a glass strip of the present disclosure is continuous in the sense that it does not require any post-production annealing or other post-production heat treatment. These methods use cooling through the devitrification zone to a temperature above the environment (eg, >50°C), for example, by transferring the cast glass through a casting machine. After cooling the glass to a temperature higher than one of the surroundings, these methods use an additional drawing step with some reheating into the devitrified zone. This drawing step results in a glass strip having a thickness dimension approximately the thickness dimension intended in the final product, for example, a wafer, lens, or other optical component with a high refractive index. In addition, at a temperature where the viscosity of the glass minimizes or eliminates any possibility of devitrification, the drawing step is advantageously performed for a limited duration. In addition, these methods do not require any post-cooling (ie, after reaching ambient temperature) and heat treatment (such as annealing or redrawing) to obtain the final product (eg, glass strip, wafer, lens, or other glass object) ) Is particularly advantageous in the sense. It is also advantageous that the aspect of the method of the present disclosure results in glass ribbons, wafers, lenses or glass bands that do not require any additional mechanical treatment (eg, polishing, grinding, etc.) to conform to the warpage and/or thickness variation levels of optical components Other glass objects.
現參看第1圖,提供製造一玻璃條帶30b之方法100之示意圖。如在第1圖中所展示,提供製造一玻璃條帶30b之方法100,其包括以下步驟110:使一玻璃30自熔化設備10流動至具有自約200 mm至約5 m之一寬度(Wcast
)22及1 mm或更大之一厚度(t
)24(見第2圖)的鑄造機20內以形成一鑄造玻璃30a。製造一玻璃條帶30b之方法100進一步包括將鑄造機20中之鑄造玻璃30a冷卻至至少108
泊之一黏度及不低於50℃之一溫度的一步驟120。製造一玻璃條帶30b之方法100亦包括自鑄造機20傳送鑄造玻璃30a之一步驟130。此外,製造一玻璃條帶30b之方法100進一步包括將處於小於107
泊之一平均黏度下之鑄造玻璃30a拉製成具有小於鑄造玻璃30a之寬度(Wcast
)22的一寬度(Wribbon
)32及最終厚度24(t
)之一玻璃條帶30b之一步驟140。另外,拉製步驟140包含將鑄造玻璃30a加熱至小於107
泊之一平均黏度。製造一玻璃條帶30b之方法100進一步包括將玻璃條帶30b冷卻至環境溫度之一步驟150。Referring now to FIG. 1, a schematic diagram of a
關於在第1圖中展示的使玻璃流動之步驟110,一合適的熔化設備10可經由具有最大尺寸12之一出口元件4傳遞玻璃30,該最大尺寸為玻璃30在其離開熔化設備10且流動至鑄造機20內時之大致寬度。取決於自熔化設備10流動的玻璃30之黏度,其可具有與出口元件4之最大尺寸12約相同或比最大尺寸12小之一寬度。根據製造一玻璃條帶30b之方法100之一些實施例,出口元件4之最大尺寸12小於或等於鑄造機20之寬度(Wcast
)22。在其他實施例中,出口元件4之最大尺寸12可大於鑄造機20之寬度(Wcast
)22,例如,對於具有相對低上限液相線黏度(例如,5泊至5000泊)的玻璃30之組成物。詳言之,此等玻璃在熔化後在其離開熔化設備10之出口元件4時可「頸縮」,從而允許其流動至具有在尺寸上小於熔化設備10之出口元件4之最大尺寸12的一寬度22之鑄造機20內。With respect to the
再次參考在第1圖中描繪的製造一玻璃條帶30b之方法100,熔化設備10之實施例包括一溢流形成裝置(其中出口元件4用以分佈玻璃30)或一熔化器(具有呈一孔口之形式的一出口元件4)。在後者實施例中,熔化設備10可包括一溢流堰,其允許玻璃30沿著呈溢流槽之形式的一出口元件4溢流且散佈(例如,見具有在第3A圖及第3B圖中描繪之溢流槽的溢流形成裝置)。在此等實施例中,玻璃30可在溢流槽之一側或兩側上散佈。至於前者實施例,熔化設備10可包括具有一孔口之一熔化器,該孔口在熔化玻璃30離開熔化設備10時將其分佈。另外,一般熟習本揭露內容之技術者可建構適合於在製造一玻璃條帶30b之方法100中使用的其他熔化設備10。Referring again to the
在第1圖中描繪的製造一玻璃條帶30b之方法100之實施例中,玻璃30係自包括以下各者之玻璃組成物得出:硼矽酸鹽玻璃、鋁硼矽酸鹽玻璃、鋁矽酸鹽玻璃、氟矽酸鹽玻璃、磷矽酸鹽玻璃、氟磷酸鹽玻璃、硫磷酸鹽玻璃、鍺酸鹽玻璃、釩酸鹽玻璃、硼酸鹽玻璃及磷酸鹽玻璃。根據一實施例,玻璃30係自如展現適合於透鏡及光學組件之光學性質(例如,透射率、折射率、熱膨脹係數等)的玻璃組成物中之任何者得出。根據一實施例,玻璃30係自以下玻璃組成物得出(本文中被稱作「玻璃A」):40.2莫耳% SiO2
;2.4莫耳% B2
O3
;11.3莫耳% Li2
O;22.9莫耳% CaO;5.4莫耳% La2
O3
;3.8莫耳% ZrO2
;4.8莫耳% Nb2
O5
;及9.3莫耳% TiO2
。根據另一實施例,玻璃30係自以下玻璃組成物得出(本文中被稱作「玻璃B」):42.7莫耳% SiO2
;3.9莫耳% B2
O3
;4.7莫耳% BaO;26.6莫耳% CaO;4.5莫耳% La2
O3
;2.2莫耳% ZrO3
;6.1莫耳% Nb2
O5
;及9.3莫耳% TiO2
。In the embodiment of the
在第1圖中描繪的製造一玻璃條帶30b之方法100之一些實施例中,玻璃30包含小於5×105
泊之一上限液相線黏度。根據一些實施,玻璃30可由展現以下之一上限液相線黏度之組成物組成:小於5×105
泊、小於1×105
泊、小於5×104
泊、小於1×104
泊、小於5×103
泊、小於1×103
泊、小於5×102
泊、小於100泊、小於50泊、小於40泊、小於30泊、小於20泊、小於10泊及在此等等級之間的所有上限液相線黏度。根據該方法之一些實施,在步驟110期間的玻璃30之上限液相線黏度範圍自約5泊至約50000泊。另外,在方法100之某些實施中,玻璃30係自具有自約1.5至約2.1之折射率的一玻璃組成導出。在一些實施例中,玻璃30係自具有自約1.6至約2.0、自約1.65至約1.9、自約1.7至約1.85之一折射率及在此等等級之間的所有折射率值的一玻璃組成導出。In some embodiments of the
現參考第1圖中描繪的製造一玻璃條帶30b之方法100之流動步驟110,可進行此步驟,使得使玻璃30在1000℃或更大之一溫度下流動。玻璃30可在自約1000℃至約1500℃、自約1000℃至約1400℃、自約1000℃至約1300℃、自約1000℃至約1250℃、自約1000℃至約1200℃、自約1000℃至約1150℃之一溫度及在此等等級之間的所有值下流動。可進行該流動步驟110,使得玻璃30在其自熔化設備10流動時具有小於5×104
泊之一黏度。在一些實施中,玻璃30在其離開熔化設備10之出口元件4且流動至鑄造機20內時具有以下之一黏度:小於5×104
泊、小於1×104
泊、小於5×103
泊、小於1×103
泊、小於5×102
泊、小於100泊、小於50泊、小於40泊、小於30泊、小於20泊、小於10泊及在此等等級之間的所有黏度。根據方法100之一些實施,玻璃30在其離開熔化設備10時在步驟110期間具有範圍自約10泊至約1000泊或自約10泊至約50,000泊之一黏度。Referring now to the
再次參考第1圖中描繪的製造一玻璃條帶30b之方法100之步驟110,該步驟包括使玻璃30流動至具有自約200 mm至約5公尺(m)之一寬度(Wcast
)22及自約1 mm至約500 mm之一厚度(t
)24的鑄造機20內以形成鑄造玻璃30a(見第2圖)。在一些實施例中,鑄造機20之寬度(Wcast
)22為自約200 mm至約5公尺(m)、自約250 mm至約5 m、自約300 mm至約5 m、自約350 mm至約5 m、自約400 mm至約5 m、自約450 mm至約5 m、自約500 mm至約5 m及在此等等級之間的所有寬度值。根據一些實施,鑄造機20之寬度(Wcast
)22為自約200 mm至約5 m、自約200 mm至約4 m、自約200 mm至約3 m、自約200 mm至約2 m、自約200 mm至約1 m、自約200 mm至約0.9 m、自約200 mm至約0.8 m、自約200 mm至約0.7 m、自約200 mm至約0.6 m、自約200 mm至約0.5 m及在此等等級之間的所有寬度值。另外,在一些實施例中,鑄造機20之厚度(t
)24(見第2圖)為約1 mm或更大、約2 mm或更大、約3 mm或更大、約4 mm或更大、約5 mm或更大、約7 mm或更大、約8 mm或更大、約9 mm或更大、約10 mm或更大、約15 mm或更大、約20 mm或更大、約25 mm或更大、約30 mm或更大、約35 mm或更大、約40 mm或更大、約45 mm或更大、約50 mm或更大或直到約500 mm之任一厚度。Referring again to step 110 of the
現在參考第1圖中描繪的製造一玻璃條帶30b之方法100之步驟120,此步驟係用於將鑄造機20中之鑄造玻璃30a冷卻至至少108
泊之一黏度及不低於50℃之一溫度。因而,鑄造機20可具有例如具有或不具有額外冷卻能力之各種材料的變化之構造,如由一般熟習本揭露內容之技術者所理解,其限制性條件為,該構造能夠經由其去玻化地帶冷卻玻璃30以將鑄造玻璃30a冷卻至不低於50℃之一溫度,例如,當其正由曳引機40在第1圖中展示的箭頭之方向上傳送時。冷卻鑄造玻璃30a之步驟120可經進行使得任何結晶相之最大生長速率自玻璃30a之上限液相線黏度至下限液相線黏度(在本文中亦被稱作「去玻化地帶」)小於10 μm/min。在一些實施中,冷卻鑄造玻璃30a之步驟120經進行使得玻璃30經由去玻化地帶的任何結晶相之最大生長速率小於10 μm/min、小於9 μm/min、小於8 μm/min、小於7 μm/min、小於6 μm/min、小於5 μm/min、小於4 μm/min、小於3 μm/min、小於2 μm/min、小於1 μm/min、小於0.5 μm/min、小於0.1 μm/min、小於0.01 μm/min及低於此等速率及/或在此等速率之間的所有生長速率。值得注意地,玻璃A及玻璃B組成物之最大晶體生長速率(Vmax)分別為在1030℃下約6-7 μm/min及在1050℃下約2-3 μm/min。因此,方法100之態樣包括執行冷卻步驟120,使得當自玻璃A或玻璃B組成物製造時,玻璃30之晶體生長速率小於此等最大晶體生長速率(Vmax)值。Referring now to FIG. 1 of manufacture depicted in
根據第1圖中描繪的製造一玻璃條帶30b之方法100之另一態樣,冷卻步驟120可經進行以按或高於鑄造玻璃30a之一臨界冷卻速率將鑄造玻璃30a冷卻至一溫度(亦即,不低於50℃)。如本文中所使用,藉由以各種選定冷卻速率將給定玻璃組成物之多個樣本降溫熔化至其玻璃轉變溫度來判定「臨界冷卻速率」。該等樣本接著根據標準切片及拋光技術來橫切,且藉由處於100x下之光學顯微術來評估,以確定在塊體中及在其自由表面(亦即,具有與坩堝或類似者之一界面的頂表面、暴露之表面及底表面)處的晶體之存在。臨界冷卻速度對應於具有不展現在其表面及塊體處之晶體之最慢冷卻速率的樣本。According to another aspect of the
根據一實施例,曳引機40包括一或多個輥,用於在鑄造玻璃30a分別在冷卻步驟120及傳送步驟130期間行進穿過及退出鑄造機20時控制該鑄造玻璃之速度。有利地,按一方式進行冷卻步驟120,以確保鑄造玻璃30a不落至低於50℃,以確保方法100可保持連續(鑒於分別在隨後傳送步驟130及拉製步驟140期間發生之額外加熱)。在一些態樣中,在冷卻步驟120後鑄造玻璃30a中剩餘之熱能用以分別在隨後傳送步驟130及拉製步驟140期間將鑄造玻璃30a自其核心朝向其表面再加熱。According to an embodiment, the
在第1圖中描繪之方法100之一些實施中,在冷卻步驟120期間之溫度不低於50℃、不低於100℃、不低於150℃、不低於200℃、不低於250℃、不低於300℃、不低於350℃、不低於400℃、不低於450℃、不低於500℃及在此等下限臨限值等級之間的所有溫度值。在方法100之一實施中,冷卻步驟120包含將鑄造機20中之鑄造玻璃30a冷卻至小於800℃且不低於50℃之一溫度。根據方法100之一實施,流動、冷卻、拉動及拉製步驟110-140經進行使得鑄造玻璃30a不達到低於50℃之一溫度,例如,以確保方法100可以一連續方式執行。根據方法100之一些實施例,冷卻之步驟120經進行使得鑄造機20中之鑄造玻璃30a處於至少108
泊、至少5×108
泊、至少109
泊、至少5×109
泊、至少1010
泊、至少5×1010
泊或更高黏度之一黏度。在製造一玻璃條帶30b之方法100之一些態樣中,冷卻步驟120經進行使得將鑄造玻璃30a維持於在約650℃與約750℃之間的一溫度及至少109
泊之一黏度下。In some implementations of the
再次參考第1圖中描繪的製造一玻璃條帶30b之方法100,該方法進一步包括用於自鑄造機20傳送鑄造玻璃30a之一傳送步驟130。步驟130之傳送態樣可部分藉由曳引機40之動作來實現。詳言之,在步驟130期間,鑄造玻璃30a可由曳引機40自鑄造機20之端部朝向一組可選加熱器50及邊緣輥60移動或以其他方式傳送。根據方法100之實施例,傳送步驟130可經進行以控制鑄造玻璃30a之速度,例如,使得鑄造玻璃30a之流動速率變化不大於1%。Referring again to the
製造一玻璃條帶30b之方法100亦包括在小於在傳送步驟130中的鑄造玻璃30a之黏度之一平均黏度下(例如,在小於107
泊之一平均黏度下)拉製鑄造玻璃30a之步驟140。步驟140亦包含將鑄造玻璃30a加熱至小於107
泊之一平均黏度,例如,藉由該組可選加熱器50。當存在時,加熱器50可包括用於將鑄造玻璃30a加熱至小於107
泊之一平均黏度的各種結構及組件中之任何者,包括但不限於電阻加熱元件、電感加熱元件、紅外線加熱元件及如由一般熟習本揭露內容之技術者理解之其他元件。在一些實施例中,涉及將鑄造玻璃30a加熱至小於107
泊之一平均黏度的步驟140之態樣不對鑄造玻璃30a賦予任何額外熱能。舉例而言,拉製步驟140可經進行使得鑄造玻璃30a之核心將鑄造玻璃30a之表面至少部分加熱至小於107
泊之一平均黏度。Manufacturing a ribbon of
另外,拉製鑄造玻璃30a之拉製步驟140經進行以將鑄造玻璃30a拉製成具有小於或等於鑄造機20之寬度22(Wcast
)的一寬度32(Wribbon
)及小於或等於鑄造玻璃30a之厚度(t
)24的一最終厚度(t
)34之一玻璃條帶30b。在一些態樣中,玻璃條帶30b之寬度32(Wribbon
)為自約10 mm至約5 mm、自約20 mm至約5 mm、自約30 mm至約5 mm、自約40 mm至約5 mm、自約50 mm至約5 mm、自約100 mm至約5 mm、自約200 mm至約5 mm、自約250 mm至約5 mm、自約300 mm至約5 mm、自約350 mm至約5 mm、自約400 mm至約5 mm及在此等等級之間的所有寬度值。將鑄造玻璃30a拉製成條帶30b之步驟140之態樣可部分藉由在第1圖中描繪的邊緣輥60之動作來實現。In addition, the drawing
根據製造一玻璃條帶30b之方法100之一些實施,拉製步驟140在鑄造玻璃30a上進行不多於30分鐘(亦即,在用於冷卻鑄造玻璃30a之步驟120及用於傳送鑄造玻璃30a之步驟130後,且在用於將玻璃條帶30b冷卻至環境溫度之一隨後步驟150前)。應理解,根據方法100,在步驟110-140中之每一者期間,鑄造玻璃30a處於約50℃或更高之一溫度下。在一些實施中,拉製步驟140可進行達30分鐘或更少、25分鐘或更少、20分鐘或更少、15分鐘或更少、10分鐘或更少、5分鐘或更少及少於此等上限臨限持續時間值同時維持至少30秒之持續時間的所有持續時間。如較早先指出,製造一玻璃條帶30b之方法100之態樣經進行使得在拉製步驟140期間之溫度及/或時間經有利地最小化以確保鑄造玻璃30a不經歷任何或非常小的結晶,同時將鑄造玻璃30a維持在足夠低之黏度下以實現此步驟之拉製態樣——亦即,將鑄造玻璃30a變換成具有小於鑄造玻璃30a之寬度22的一寬度32之一玻璃條帶30b。According to some implementations of the
根據第1圖中描繪的製造一玻璃條帶30b之方法100之一些實施例,傳送步驟130及拉製步驟140經進行使得鑄造玻璃30a經維持在小於107
泊、小於5×106
泊、小於106
泊、小於5×105
泊、小於105
泊、小於5×104
泊同時不低於104
泊及在此等等級之間的所有平均黏度之一平均黏度下。在方法100之一些實施中,在傳送步驟130及拉製步驟140期間將鑄造玻璃30a之平均黏度維持在106
泊與104
泊之間,處於約750℃與900℃之間的溫度下。A method of manufacturing a
再次參考第1圖中描繪的製造一玻璃條帶30b之方法100,該方法之最終冷卻步驟150可包括將玻璃條帶30b冷卻至環境溫度。如較早先所指出,方法100之實施例經進行使得在步驟110-140期間,玻璃30及鑄造玻璃30a經維持在不低於50℃之一溫度下,因此確保可以一連續方式執行方法100。根據方法100之一些實施例,步驟110-140係在不低於50℃、不低於75℃、不低於100℃、不低於150℃、不低於200℃、不低於250℃、不低於300℃之一溫度及在此等下限溫度極限之間的所有下限溫度臨限值下進行。另外,如一般熟習本揭露內容之技術者理解,可藉由或無外部冷卻來進行用於冷卻玻璃條帶30b之步驟150。另外,在方法100之一些實施例中,邊緣輥60可包括用於實現在冷卻步驟150內之一些或所有冷卻之一冷卻能力。Referring again to the
仍然參考第1圖中描繪的製造一玻璃條帶30b之方法100,該方法100之實施例經進行使得玻璃條帶30b具有小於200 μm之一厚度變化。根據一些實施例,玻璃條帶30b可具有小於200 μm、小於150 μm、小於100 μm、小於75 μm、小於50 μm、小於40 μm、小於30 μm、小於20 μm、小於10 μm、小於5 μm、小於4 μm、小於3 μm、小於2 μm、小於1 μm、小於0.5 μm之一厚度變化,及在此等等級之間的所有厚度變化等級。自一實踐觀點,根據方法100製造之玻璃條帶30b可具有低為0.01 μm之一厚度變化。在方法100之一些實施中,藉由方法100生產之玻璃條帶30b具有小於500 μm之一翹曲。根據一些實施,藉由方法100生產之玻璃條帶30b具有小於500 μm、小於400 μm、小於300 μm、小於200 μm、小於150 μm、小於100 μm、小於50 μm、小於40 μm、小於30 μm、小於20 μm、小於10 μm、小於5 μm、小於0.1 μm、高於0.05 μm之一翹曲,及在此等等級之間的所有翹曲值。自一實踐觀點,根據方法100製造之玻璃條帶30b可具有低為0.01 μm之一翹曲。再另外,方法100之一些實施例經進行使得玻璃條帶30b具有小於5 μm(如在任何後處理前量測)之一表面粗糙度(Ra)。根據一些實施,藉由方法100生產之玻璃條帶30b具有小於5 μm、小於4 μm、小於3 μm、小於2 μm、小於1 μm、小於0.75 μm、小於0.5 μm、小於0.25 μm、小於0.1 μm、小於50 nm、低為10 nm之一表面粗糙度(Ra),及在此等等級之間的所有表面粗糙度值。根據一實施例,藉由方法100生產之玻璃條帶30b具有小於1 μm、小於0.9 μm、小於0.8 μm、小於0.7 μm、小於0.6 μm、小於0.5 μm、小於0.4 μm、小於0.3 μm、小於0.2 μm、低為0.1 μm、小於90 nm、小於80 nm、小於70 nm、小於60 nm、小於50 nm、小於40 nm、小於30 nm、小於20 nm、低為10 nm之一表面粗糙度(Ra),及在此等等級之間的所有表面粗糙度值。Still referring to the
現在參看第2圖,提供根據本揭露內容的可根據製造一玻璃條帶30b之方法100(見第1圖)使用之設備之示意圖。詳言之,第2圖描繪具有一孔口4a之一熔化設備10a、一鑄造機20及加熱器50,外加其他特徵。在所有其他態樣中,第2圖中描繪之設備與用於供製造一玻璃條帶30b之方法100(見第1圖及較早先描述)使用的在第1圖中描繪之設備相同或實質上類似。因此,在第2圖中的編號相似之元件具有與在第1圖中描述之編號相似之元件相同或實質上類似之功能及結構。另外,根據方法100(見第1圖)之一實施例,可藉由使玻璃30自具有小於5公尺(m)之一最大尺寸12的熔化設備10a(見第2圖)之一孔口4a流動來進行流動步驟110。孔口4a之最大尺寸12可小於或等於鑄造機20之寬度(Wcast
)22。另外,孔口4a之寬度14可為約1 mm或更大、約2 mm或更大、約3 mm或更大、約4 mm或更大、約5 mm或更大、約7 mm或更大、約8 mm或更大、約9 mm或更大、約10 mm或更大、約15 mm或更大、約20 mm或更大、約25 mm或更大、約30 mm或更大、約35 mm或更大、約40 mm或更大、約45 mm或更大、約50 mm或更大或直到約500 mm之任一寬度。Referring now to FIG. 2, a schematic diagram of equipment that can be used according to the method 100 (see FIG. 1) of manufacturing a
再次參看第2圖,取決於在流動步驟110(見第1圖)期間自熔化設備10a流動的玻璃30之黏度,玻璃30可具有約與孔口4a之最大尺寸12相同或比該最大尺寸12小的一寬度。因而,孔口4a之最大尺寸12可小於或等於鑄造機20之寬度(Wcast
)22。在其他實施例中,孔口4a之最大尺寸12可大於鑄造機20之寬度(Wcast
)22,例如,對於上限液相線黏度相對低(例如,5泊至50000泊)的玻璃30之組成物。詳言之,此等玻璃在熔化後在其離開熔化設備10a之孔口4a時可「頸縮」,從而允許其流動至具有在尺寸上小於熔化設備10a之孔口4a之最大尺寸12的一寬度22之鑄造機20內。Referring again to FIG. 2, depending on the viscosity of the
如亦在第2圖中展示,玻璃條帶30b可經切片成具有範圍自實質上等效於玻璃條帶30b之寬度32(Wribbon
)至玻璃條帶30b之寬度32之約50%的外直徑之晶圓36。在實施例中,可在較早先概述且在第1圖中展示的方法100之冷卻步驟150後進行自玻璃條帶30b切片晶圓36之步驟。如在第2圖中以例示性形式展示,晶圓36呈碟之形式。然而,晶圓36可呈多種形狀中之任一者,包括但不限於正方形、矩形、圓、橢圓及其他。根據一些實施例,晶圓36可具有約2 mm或更小之一厚度34(t
)及約100 mm至約500 mm之一最大尺寸(例如,直徑、寬度或其他最大尺寸)。在一些態樣中,晶圓36具有約1 mm或更小之一厚度34(t
)及150 mm至約300 mm之一最大尺寸。晶圓36亦可具有範圍自約1 mm至約50 mm或約1 mm至約25 mm之一厚度。晶圓36亦可具有範圍自約25 mm至約300 mm、自約50 mm至約250 mm、自約50 mm至約200 mm或約100 mm至約200 mm之一最大尺寸。有利地,根據方法100形成之晶圓36在無任何額外表面拋光之情況下可展現較早先結合玻璃條帶30b概述之相同厚度變化等級、表面粗糙度及/或翹曲等級。在實施例中,晶圓36可經受其外直徑之某一有限研磨及拋光,以獲得最終產品(例如,用於光學應用之透鏡)之最終尺寸。As also shown in FIG. 2, the
現參看第3A圖及第3B圖,根據一實施例,提供如在製造一玻璃條帶30b之方法100(見第1圖)中使用的具有用於使玻璃30流動之一溢流槽8之一溢流熔化設備10b之示意圖。詳言之,在使玻璃30流動之步驟110期間,可使用溢流熔化設備10b。根據一實施例,玻璃30可根據方法100之一熔化態樣來熔化,且自槽6流動至溢流槽8內。槽6包括由一般熟習用於玻璃之熔化的本揭露內容之技術者理解的多種加熱元件中之任一者。當玻璃30自溢流槽8之溢流堰或類似態樣溢流時,其在溢流槽8上流動且向下至鑄造機20(未展示)內。如在第3A圖及第3B圖中以例示性形式展示,溢流熔化設備10b可包括在溢流槽8內之一溢流堰,其允許玻璃30溢流且沿著溢流槽8之外表面散佈。在此等實施例中,玻璃30可散佈於溢流槽8之一側或兩側上至寬度4b。如在第3A圖及第3B圖中展示,溢流槽8具有與垂直線按角度9成角度之一個側。典型地,角度9在約0°與30°之間,較佳地,0°至20°。根據製造一玻璃條帶30b之方法100(見第1圖)之一實施例,溢流熔化設備10b具有小於5 m之一寬度4b,其小於或等於鑄造機20之寬度22(Wcast
)。Referring now to FIGS. 3A and 3B, according to an embodiment, there is provided an
雖然已為了說明之目的而闡述例示性實施例及實例,但前述描述決不意欲限制揭露內容及隨附申請專利範圍之範疇。因此,在不實質上脫離本揭露內容之精神及各種原理之情況下,可進行對以上描述之實施例及實例之變化及修改。在本揭示內容之範疇內,所有此等修改及變化意欲包括於本文中,且受到以下申請專利範圍保護。Although the illustrative embodiments and examples have been described for illustrative purposes, the foregoing description is by no means intended to limit the scope of the disclosure and accompanying patent applications. Therefore, changes and modifications to the embodiments and examples described above can be made without substantially departing from the spirit and various principles of the present disclosure. Within the scope of this disclosure, all such modifications and changes are intended to be included herein and are protected by the following patent applications.
4:出口元件
4a:孔口
4b:寬度
6:槽
8:溢流槽
9:角度
10:熔化設備
10a:熔化設備
10b:溢流熔化設備
12:最大尺寸
14:孔口之寬度
20:鑄造機
22:寬度
24:厚度
30:玻璃
30a:鑄造玻璃
30b:玻璃條帶
32:寬度
34:最終厚度
36:晶圓
40:曳引機
50:加熱器
60:邊緣輥
100:製造玻璃條帶之方法
110:流動步驟
120:冷卻步驟
130:傳送步驟
140:拉製步驟
150:最終冷卻步驟4:
以下為隨附圖式中的圖之描述。該等圖未必按比例,且該等圖之某些特徵及某些視圖可在比例上或在示意圖中經誇大地展示,以為了清晰且簡潔。The following is a description of the figures in the accompanying drawings. The drawings are not necessarily to scale, and certain features and certain views of the drawings may be exaggeratedly shown in scale or in schematic diagrams for clarity and conciseness.
在圖式中:In the diagram:
第1圖為根據一實施例的製造一玻璃條帶之方法之示意圖。FIG. 1 is a schematic diagram of a method of manufacturing a glass strip according to an embodiment.
第2圖為根據一實施例的可根據製造一玻璃條帶之方法使用的設備之示意圖,特定言之,具有一孔口之一熔化設備、一鑄造機及一加熱設備。FIG. 2 is a schematic diagram of an apparatus that can be used according to a method of manufacturing a glass strip according to an embodiment, specifically, a melting apparatus having an orifice, a casting machine, and a heating apparatus.
第3A圖及第3B圖為根據一實施例的如在製造一玻璃條帶之方法中使用的具有用於使玻璃流動之一溢流槽(isopipe)之一溢流形成裝置之示意圖。FIGS. 3A and 3B are schematic diagrams of an overflow forming device having an isopipe for flowing glass as used in a method of manufacturing a glass ribbon according to an embodiment.
當結合圖來閱讀時,將更好地理解前述發明內容以及接下來的某些發明性技術之詳細描述。應理解,該等申請專利範圍並不限於在圖中展示之佈置及手段。此外,在該等圖中展示之外觀為可用以達成該設備之所陳述功能的許多裝飾外觀中之一者。When read in conjunction with the drawings, the foregoing summary of the invention and a detailed description of some of the following inventive techniques will be better understood. It should be understood that the scope of these patent applications is not limited to the arrangements and means shown in the figures. In addition, the appearance shown in these figures is one of many decorative appearances that can be used to achieve the stated functions of the device.
國內寄存資訊 (請依寄存機構、日期、號碼順序註記) 無Domestic storage information (please note in order of storage institution, date, number) no
國外寄存資訊 (請依寄存國家、機構、日期、號碼順序註記) 無Overseas hosting information (please note in order of hosting country, institution, date, number) no
4:出口元件 4: export components
10:熔化設備 10: Melting equipment
12:最大尺寸 12: Maximum size
20:鑄造機 20: Casting machine
22:寬度 22: Width
30:玻璃 30: glass
30a:鑄造玻璃 30a: Cast glass
30b:玻璃條帶 30b: glass strip
32:寬度 32: width
40:曳引機 40: Traction machine
50:加熱器 50: heater
60:邊緣輥 60: edge roller
100:製造玻璃條帶之方法 100: Method for manufacturing glass strip
110:流動步驟 110: Flow step
120:冷卻步驟 120: cooling step
130:傳送步驟 130: Transmission steps
140:拉製步驟 140: drawing steps
150:最終冷卻步驟 150: final cooling step
Claims (10)
Applications Claiming Priority (4)
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US201862691031P | 2018-06-28 | 2018-06-28 | |
US62/691,031 | 2018-06-28 | ||
NL2021322A NL2021322B1 (en) | 2018-06-28 | 2018-07-17 | Continuous methods of making glass ribbon and as-drawn glass articles from the same |
NL2021322 | 2018-07-17 |
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TW202010716A true TW202010716A (en) | 2020-03-16 |
TWI828709B TWI828709B (en) | 2024-01-11 |
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TW108120831A TWI828709B (en) | 2018-06-28 | 2019-06-17 | Continuous methods of making glass ribbon and as-drawn glass articles from the same |
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JP (1) | JP2021529718A (en) |
KR (1) | KR20210024558A (en) |
CN (1) | CN112334419B (en) |
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Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
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US3635687A (en) * | 1970-05-26 | 1972-01-18 | Owens Illinois Inc | Downdrawing method for producing very thin glass sheets |
JPS62283831A (en) * | 1986-05-30 | 1987-12-09 | Hoya Corp | Method for molding plate glass |
CN101023040B (en) * | 2004-08-23 | 2011-08-03 | 赫罗伊斯石英玻璃股份有限两合公司 | Coated component consisting of quartz glass, and method for producing said component |
JP4445419B2 (en) * | 2005-03-18 | 2010-04-07 | Hoya株式会社 | Method for producing glass molded body, method for producing glass material for press molding, and method for producing optical element |
EP1710212A1 (en) * | 2005-04-06 | 2006-10-11 | Corning Incorporated | process and device for manufacturing flat sheets of a glass-based material |
JP4466955B2 (en) * | 2005-07-15 | 2010-05-26 | Hoya株式会社 | Optical glass, glass gob for press molding, and optical element |
KR101334019B1 (en) * | 2005-12-15 | 2013-12-02 | 브루스 테크놀로지 엘엘씨 | Overflow downdraw glass forming method and apparatus |
JP5177790B2 (en) * | 2006-10-24 | 2013-04-10 | 日本電気硝子株式会社 | Glass ribbon manufacturing apparatus and manufacturing method thereof |
WO2008050605A1 (en) * | 2006-10-24 | 2008-05-02 | Nippon Electric Glass Co., Ltd. | Glass ribbon producing apparatus and process for producing the same |
US9670089B2 (en) * | 2009-07-08 | 2017-06-06 | Nippon Electric Glass Co., Ltd. | Glass sheet |
CN104185611B (en) * | 2011-11-09 | 2018-02-06 | 康宁股份有限公司 | The method and apparatus for manufacturing glass tape |
US9458044B2 (en) * | 2012-07-13 | 2016-10-04 | Corning Incorporated | Methods and apparatuses for producing laminated glass sheets |
KR101611393B1 (en) * | 2013-03-29 | 2016-04-11 | 아반스트레이트 가부시키가이샤 | Method for manufacturing glass substrate, and apparatus for manufacturing glass substrate |
DE102014100750B4 (en) * | 2013-04-30 | 2023-08-17 | Schott Ag | Process for the manufacture of glass components |
KR20170093922A (en) * | 2014-12-08 | 2017-08-16 | 코닝 인코포레이티드 | Laminated Glass Article with Low Compaction and Method for Forming the Same |
WO2017104513A1 (en) * | 2015-12-17 | 2017-06-22 | 日本電気硝子株式会社 | Method of manufacturing a glass support plate |
JP6613905B2 (en) * | 2016-01-12 | 2019-12-04 | 日本電気硝子株式会社 | Glass ribbon manufacturing method and manufacturing apparatus |
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2018
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CN112334419A (en) | 2021-02-05 |
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