TW202007787A - Method of airtighting and waterproofing using CVD and silane compound - Google Patents

Abstract

The present invention provides a method of airtighting and waterproofing by using CVD to deposit a long chain silane compound layer between a panel and a frame, including steps: depositing long chain silane compound between a panel and a frame, wherein the long chain silane compound precursor solution comprises long chain silane 1v/v% and IPA 99v/v%. The long chain silane compound is tetraethyl orthosilicate (TEOS).

Description

Using chemical vapor deposition to deposit long carbon chain silane compounds as a gas-tight and waterproof method

The field of the invention relates to the field of panel assembly, in particular to the field of panel waterproof assembly technology.

Before leaving the factory, many components must be tested for air tightness (Air Leak Test, ALT) between the cover glass (CG) and the frame (Frame). The purpose is to test the waterproofness of the component. The airtightness detection method is to place the glass and the frame in a cavity, and form a sealed space between the glass and the frame, and then inflate the space to detect whether there is air pressure (as shown in Figure 1) ). Connecting the leak meter 1 in FIG. 1 will exhaust the gas charged by the test gas source 2; the positive pressure of the inflation may be, for example, 1.25 atmospheric pressure. If the colloid between the glass surface and the loading frame is defective, the leak detector 1 will automatically detect the gas pressure of the leak.

Occasionally, some sporadic batches in the industrial production data will cause about 0.2% of the air tightness test (ALT Fail) due to the process. Therefore, in order to improve the production yield and achieve a more precise waterproof effect, the product can be processed with a waterproof airtight layer before leaving the factory to ensure the airtight quality.

Silane Compound has a hydrolysis sensitive center and can be used as a bridge between organic and inorganic materials. In research, the functional groups of silane compounds are often used to change the hydrophilicity and hydrophobicity of the substrate surface. The reaction is divided into four steps: hydrolysis, condensation, hydrogen bonding, and bond formation ( bond formation), as shown in Figure 2. The initial step of these four steps, "hydrolysis", is the rate-determining step. After this step, the next two steps are spontaneous reactions. Water must be removed when the last bond is formed. There are usually two methods used, one is heating, for example, placed in an oven at 120 ℃ for about 30 to 90 minutes, and the second is to evacuate for 2 to 6 hours to form a covalent bond of silicon-oxygen (Si-O). This type of surface modification method is also commonly referred to as surface assembly monolayer (SAM), which can be performed at ordinary room temperature and is a convenient process.

Therefore, in order to achieve a waterproof design, the present invention is based on a clean dry process. Moreover, the applied substrate has a better reaction rate to the silicon oxide compound, so the present invention uses a long carbon chain silane compound as the airtight waterproof layer.

The present invention uses chemical vapor deposition (CVD) method to use long carbon chain silane compound for panel assembly, especially touch panel. After the lamination process in the front section of the panel is completed, long carbon silane compound chemical vapor deposition is performed, and then the air tightness test is performed. The flow is shown in Figure 3 below. In this way, the waterproof and airtight effect of the panel is achieved.

The invention provides a method for chemically vapor-depositing a long carbon chain silane compound as an airtight and waterproof method, comprising the steps of: pressing a frame and a panel to form an assembly; covering a part of the surface of the panel with a photomask and exposing it A surface to be deposited; modifying the surface to be deposited with ozone plasma; placing the assembly in a vacuum reaction chamber, heating the vacuum reaction chamber to 30-70ºC, and introducing a gas of a precursor solution; and static deposition 90-180 minutes to form a long carbon chain silane compound deposition layer to be deposited, wherein the precursor solution contains long carbon chain silane compound 0.5-1.5v/v% and isopropyl alcohol 98.5-99.5v/v%.

Preferably, the frame is a plastic frame.

Preferably, the degree of vacuum <-2E.

The method of the present invention uses a chemical vapor deposition method to deposit a long carbon chain silane compound on the edge of the connection between the frame and the panel, so as to achieve the effect of airtightness and waterproofness.

The present invention also requests an airtight waterproof structure including a frame, a glass surface, and a long carbon chain silane compound deposition layer, wherein the frame body is pressed against the glass surface to form an assembly, and the long carbon chain silane compound deposition layer It is deposited on the connecting edge of the frame and the glass surface by the method described in the present invention. The long carbon chain silane compound deposition layer is formed by depositing gaseous molecules of a precursor solution. The precursor solution contains a long carbon chain silane compound 0.5-1.5v/v% and isopropyl alcohol 98.5-99.5 v/v%.

Preferably, the long carbon chain silane layer is a nano-level single-layer adsorption layer. The thickness of the long carbon chain silane compound deposited layer is preferably 10 nm to 30 nm. The thickness can be adjusted reasonably according to requirements.

The present invention also provides a method for chemically vapor-depositing a long carbon chain silane compound as an airtight and waterproof method, comprising the steps of: laminating a frame and a panel to form an assembly; covering a part of the surface of the panel with a photomask, and Exposing a place to be deposited; modifying the surface to be deposited with ozone plasma; placing the assembly in a 120ºC oven and introducing a gas of a precursor solution; and standing to deposit for 2 hours to form a long carbon chain silane compound deposition layer Where it is to be deposited, the precursor solution contains a long carbon chain silane compound 0.5-1.5v/v% and isopropanol 98.5-99.5v/v%.

The method requested by the present invention is to deposit a waterproof long carbon chain silane compound layer between the glass surface and the loading frame, thereby reducing the failure rate of airtightness detection, and improving the product yield to achieve the effect of airtightness and waterproofness.

Preferably, the long carbon chain silane layer is a nano-level single-layer adsorption layer, and the frame body is a rubber frame.

The waterproof panel prepared by the method requested by the present invention can improve the airtight quality between the glass surface and the loading frame.

The waterproof technology requested by the present invention can be applied to the 3C field, such as mobile phones and cameras, and can be extended to wearable 3C products; it can also be applied to the transportation industry, such as the automotive industry, aircraft industry, shipbuilding industry, etc., military and basic industry. In addition, the medical industry, semiconductor manufacturing, printed circuit boards and other industries that will be applied to waterproof technology can also use the technology of the present invention.

In order to make those skilled in the art understand the purpose of the present invention, the preferred embodiments of the present invention are described in detail as follows.

Referring to FIG. 4, in one embodiment, the long carbon chain silane compound is deposited on the edge of the junction between a panel 3 and a frame 4 by vacuum chemical vapor deposition. The panel is a glass panel. The panel 3 and the frame 4 are pressed together first, and the panel 3 and the frame 4 are joined with the glue 5 to form an assembly. Then, a part of the panel 3 is covered with a mask 6 to expose the surface to be deposited. Then the ozone plasma 12 is used to modify the surface to be deposited.

Place the assembly in a vacuum reaction chamber 11 to ensure that no other gases in the reaction chamber interfere with the subsequent reaction, and heat the vacuum reaction chamber to 40ºC and introduce a gas 7 containing a precursor solution of a long carbon chain compound. Let the assembly stand for two hours to deposit the long carbon chain silane compound molecules on the surface to be deposited to form a long carbon chain silane compound deposition layer. As shown in FIG. 4, the introduction method may use a hole grid to evaporate the gas 7 of the precursor solution into the reaction chamber.

In another embodiment, a general vacuum system can also be used to directly inject the gas of the precursor solution into the vacuum system.

In another embodiment, the underside of the panel 3 is also covered by a photomask 6, as shown in FIG. 5, by which the area under the panel 3 not covered by the photomask 6 can also be modified to make The long carbon chain silane compound deposition layer can also be deposited inside the panel.

In other embodiments, the deposition surface modification method may also be UV direct irradiation on the surface or argon (Ar) plasma modification treatment, or other surface modification methods used in the field.

The precursor solution of the long carbon chain compound contains a long carbon chain silane compound 1v/v% and isopropyl alcohol 99v/v%.

In a preferred embodiment, the long carbon chain silane compound deposition layer is a nano-level single-layer deposition layer.

In a preferred embodiment, the long carbon chain silane compound is tetraethyl orthosilicate (TEOS).

In another embodiment, the long carbon chain silane compound is 4-phenylbutyltrichlorosilane (4-PHENYLBUTYLTRICHLOROSILANE, 4PBTS), or hexadecyltrimethoxysilane (HEXADECYLTRIMETHOXYSILANE, HDTMS).

As shown in FIG. 6, the place to be deposited is the edge of the connection between the frame and the panel, whereby the deposition layer 10 can cover the gap between the connection between the frame and the panel, thereby preventing moisture or other contaminants from passing through The gap enters the inside of the panel. Therefore, the effect of airtightness and waterproofness can be achieved.

In an embodiment, the frame 4 is a plastic frame, or other frame that can carry the material of the panel.

In another embodiment, the deposited layer 10 is located outside and/or inside between the panel 3 and the frame 4 to cover the gap between the panel and the frame, as shown in FIG. 6 to prevent moisture or other pollution Objects enter the inside of the panel and affect the internal structure.

The isopropanol can also be replaced by common solvents in the art such as ethanol, methanol, acetone, etc., which is not limited thereto.

In another embodiment, the long carbon chain silane compound is deposited on the edge of the junction between a panel and a frame by a heated chemical vapor deposition method. As shown in FIG. 4, the panel 3 and the frame 4 are pressed in advance, and the panel 3 and the frame 4 are joined with the glue 5 to form an assembly. Then, a part of the panel 3 is covered with a mask 6 to expose the surface to be deposited. Then the ozone plasma 12 is used to modify the surface to be deposited.

Place the assembly in a reaction chamber and introduce a gas containing the precursor solution of the long carbon chain compound; then place the assembly in an oven at 120°C for 60-90 minutes to deposit the long carbon chain silane compound molecules on the surface to be deposited On the surface, a long carbon chain silane compound deposition layer is formed.

The precursor solution of the long carbon chain compound contains a long carbon chain silane compound 1v/v% and isopropyl alcohol 99v/v%.

Preferably, the long carbon chain silane compound deposited layer is a nano-level single layer.

In one embodiment, the long carbon chain silane compound is tetraethyl orthosilicate (TEOS), or other organic silane compounds that can be applied in the art, such as 4-phenylbutyltrichlorosilane (4- PHENYLBUTYLTRICHLOROSILANE, 4PBTS), or cetyl trimethoxysilane (HEXADECYLTRIMETHOXYSILANE, HDTMS).

As shown in FIG. 6, the place to be deposited is the edge where the panel is connected to the frame.

In one embodiment, the frame is a plastic frame, or other frame that can carry the material of the panel.

In another embodiment, the deposited layer is located outside and/or inside between the panel and the frame to cover the gap between the panel and the frame to prevent moisture or other contaminants from entering the inside of the panel.

The panel described in the present invention may be a glass panel, a touch panel, or a glass touch panel. In a preferred embodiment, the panel is a glass touch panel.

In another embodiment, the place to be deposited is located outside and/or inside between the panel and the frame to encapsulate the panel and the frame to prevent moisture or other contaminants from entering the inside of the panel.

The invention can also use plasma to enhance the effect of the chemical vapor deposition method to achieve the invention.

After the above detailed description, it has been fully shown that the present invention has the progress of implementation, and it is unprecedented, fully meets the requirements of the invention patent, and the application is submitted according to law. However, the above is only an embodiment of the present invention, and should not be used to limit the scope of implementation of the present invention, that is, equal changes and modifications made in accordance with the patent scope of the present invention should all fall within the scope of the patent of the present invention.

1‧‧‧ Connect leak instrument 2‧‧‧ Test gas source 3‧‧‧ Panel 4‧‧‧Frame 5‧‧‧Colloid 6‧‧‧ Mask 7‧‧‧Long carbon chain silane compound gas molecule 8‧‧ ‧Hole grid 9‧‧‧Long carbon chain silane compound solution 10‧‧‧Long carbon chain silane compound deposition layer 11‧‧‧Vacuum reaction chamber 12‧‧‧Ozone

Figure 1 is a schematic diagram of air tightness detection; Figure 2 is a mechanism of hydrophilicity and hydrophobicity of silane compound modified substrate surface; Figure 3 is a flow chart of panel pressing, deposition, and air tightness test; and Figure 4 is a long carbon chain silane compound Schematic diagram of the deposition process. 5 is a schematic diagram of another panel mask combination. FIG. 6 is a schematic diagram of the position of the long carbon chain silane compound deposition layer.

3‧‧‧Panel

4‧‧‧Frame

5‧‧‧Colloid

6‧‧‧mask

7‧‧‧Long carbon chain silane compound gas molecules

8‧‧‧hole grid

9‧‧‧Long carbon chain silane compound solution

11‧‧‧Vacuum reaction chamber

12‧‧‧Ozone

Claims (10)

A method for chemically vapor-depositing long carbon chain silane compounds as a gas-tight and waterproof method, comprising: pressing a frame and a panel to form an assembly; covering a part of the surface of the panel with a photomask and exposing a surface to be deposited Modifying the surface to be deposited with ozone plasma; placing the assembly in a vacuum reaction chamber, heating the vacuum reaction chamber to a predetermined temperature, and introducing a gas of a long carbon chain silane compound solution; and static deposition A long carbon chain silane compound deposition layer is formed on the place to be deposited for a predetermined time, wherein the long carbon chain silane compound solution contains a long carbon chain silane compound 0.5-1.5v/v% and isopropyl alcohol 98.5-99.5v/v% . For example, the method of claim 1 of the patent application, wherein the predetermined temperature is 30-70ºC For example, the method of claim 2 of the patent application, where the predetermined temperature is 40ºC For example, the method of claim 1 of the patent scope, wherein the predetermined time is 90-180 minutes. For example, the method of claim 4 of the patent scope, wherein the predetermined time is 120 minutes. For example, in the method of claim 1, the long carbon chain silane compound deposition layer is a nano-level single layer. As in the method of claim 1, the long carbon chain silane compound is tetraethyl orthosilicate (TEOS). As in the method of claim 1, the panel is a glass touch panel. For example, in the method of claim 1, the frame is a plastic frame. For example, the method of applying for item 1 of the patent scope, which also includes: removing the photomask.

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