TW202005993A - Composition, film, lens, solid-state imaging element, and compound - Google Patents

Abstract

Provided is a composition capable of forming a film that exhibits a high refractive index and high transparency and also has exceptional appearance characteristics. Also provided is a film that exhibits a high refractive index and high transparency and also has exceptional appearance characteristics. Also provided is a lens in which the film is used, and a solid-state imaging element in which the film or the lens is used. In addition, a composition that provides a novel compound includes a compound X having a plurality of residues formed by removing one or more hydrogen atoms from a compound represented by general formula (I), and a solvent. However, when R1 represents a hydrogen atom and the residues were formed by removing the hydrogen atom, the residues do not link with an aromatic hydrocarbon ring.

Description

Composition, film, lens, solid-state imaging element, compound

The present invention relates to compositions, films, lenses, solid-state imaging elements, and compounds.

Since the carbazole-based compound can be applied to various uses, its development research is being actively carried out. For example, Patent Document 1 discloses a polymer containing a repeating unit containing a carbazole derivative group as a functional polymer applied to an organic EL (electro luminescence) element. [Prior Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2004-185967

For example, compounds for optical materials such as microlens forming materials mounted on image sensors and refractive index modifiers for color filters require high transparency and high refractive index. The inventors refer to Patent Document 1 to produce a polymer containing a repeating unit containing a carbazole derivative group, and studied the applicability of the carbazole-based compound to the use of the optical material as described above, and as a result, it became clear that further improvement is needed The refractive index and transparency (especially, transparency after heating) of a film formed from a composition containing a carbazole-based compound. In addition, it has been found that the appearance characteristics of the above-mentioned film are sometimes poor due to cracking, and it is also clear that the appearance characteristics of the above-mentioned film need to be further improved.

Therefore, an object of the present invention is to provide a composition capable of forming a film exhibiting high refractive index and high transparency and also having excellent appearance characteristics. Therefore, an object of the present invention is to provide a film exhibiting high refractive index and high transparency and also having excellent appearance characteristics. In addition, an object of the present invention is to provide a lens using the film and a solid-state imaging element using the film or the lens. Moreover, the objective of this invention is to provide a novel compound.

As a result of intensive studies to achieve the above-mentioned problems, the present inventors discovered that the above-mentioned problems can be solved by using the following composition, and completed the present invention. That is, it was found that the above-mentioned problems can be achieved by the following structure.

[1] A composition comprising: a compound X having a plurality of residues formed by removing one or more hydrogen atoms from a compound represented by the general formula (I) described later; and a solvent. [2] The composition according to [1], wherein A ¹ represents a single bond. [3] The composition according to [1] or [2], wherein m ¹ represents an integer of 2 to 4. [4] The composition according to [3], wherein one or more of C ¹ in the above general formula (I) is selected from the group including the group represented by the general formula (III) described below and the general The group in the group of groups represented by formula (IV). [5] The composition according to [4], wherein two or more of C ¹ in the above general formula (I) are selected from the group including the group represented by the above general formula (III) and the above general formula ( IV) Groups in the group of groups represented. [6] The composition according to any one of [1] to [5], which further contains a polymerizable compound. [7] The composition according to any one of [1] to [6], which further contains a polymerization initiator. [8] The composition as described in any one of [1] to [7], wherein the above-mentioned compound X is selected from a compound including a repeating unit represented by the general formula (A) described later, and a general One or more compounds in the group of the repeating unit compound represented by the formula (B), the compound containing the repeating unit represented by the general formula (C) described later, and the compound represented by the general formula (D) described later. [9] The composition as described in [8], wherein the compound X is selected from the group consisting of a compound containing a repeating unit represented by the general formula (A) and a compound represented by the general formula (D) More than one species. [10] A film comprising a compound X having a plurality of residues formed by removing one or more hydrogen atoms from a compound represented by the general formula (I) described later. [11] The film according to [10], wherein the above A ¹ represents a single bond. [12] The film according to [10] or [11], wherein m ¹ represents an integer of 2 to 4. [13] The film according to [12], wherein at least one of C ¹ in the general formula (I) is selected from the group including the group represented by the general formula (III) described later and the general formula described later (IV) The group in the group of groups represented. [14] The film according to [13], wherein two or more of C ¹ in the general formula (I) are selected from the group including the group represented by the general formula (III) and the general formula (IV) ) Represents a group in the group of groups. [15] The film according to any one of [10] to [14], which comprises a compound selected from the group including a repeating unit represented by the above general formula (A) and a compound represented by the above general formula (D) More than one of the group. [16] A lens composed of the film according to any one of [10] to [15]. [17] A solid-state imaging element comprising the film described in any one of [10] to [15] or the lens described in [16]. [18] A compound containing a repeating unit represented by the general formula (A) described later, a repeating unit represented by the general formula (B) described later, or a repeating unit represented by the general formula (C) described later. [19] A compound represented by the general formula (D) described later. [20] The compound according to [18] or [19], wherein the compound represented by the above general formula (I) is a compound represented by the following general formula (V). [Effect of the invention]

According to the present invention, it is possible to provide a composition capable of forming a film that exhibits high refractive index and high transparency and is excellent in appearance characteristics. Furthermore, according to the present invention, it is possible to provide a film that exhibits high refractive index and high transparency and is excellent in appearance characteristics. Furthermore, according to the present invention, it is possible to provide a lens using the film and a solid-state imaging element using the film or the lens. Furthermore, according to the present invention, a novel compound can be provided.

Hereinafter, the present invention will be described in detail. In this specification, the numerical range indicated by "~" refers to a range in which the numerical values described before and after "~" are included as the lower limit value and the upper limit value. In this specification, "actinic rays" or "radiation" refers to, for example, the bright line spectrum of a mercury lamp, far-ultraviolet (EUV) light, X-rays, and electron beams represented by excimer laser. In the present invention, light refers to actinic rays or radiation. Unless otherwise stated, "exposure" in this specification refers to not only the bright line spectrum of the mercury lamp, but also the exposure based on far ultraviolet, X-ray, and EUV light represented by the excimer laser, and the particle beam such as electron beam and ion beam. The painting is also included in the exposure. In this specification, "(meth)acrylate" means acrylate and methacrylate, "(meth)acrylic acid" means acrylic acid and methacrylic acid, and "(meth)acrylic" means acrylic and methacrylic基propene acryl. In this specification, the term "step" includes not only independent steps, but even if it cannot be clearly distinguished from other steps, as long as it can achieve the desired effect of the step, it is included in the term. In this specification, the weight average molecular weight and the number average molecular weight are defined in terms of polystyrene conversion measured by gel permeation chromatography (GPC). In this specification, the weight average molecular weight (Mw) and the number average molecular weight (Mn) can be determined as, for example, measuring devices by using HLC-8220 (manufactured by Tosoh Corporation) and using TSKgel Super AWM as a column- H (manufactured by Tosoh Corporation, 6.0 mmID (inner diameter)×15.0 cm), and a 10 mmol/L lithium bromide NMP (N-methylpyrrolidone) solution was used as the eluent. In this specification, the polymerizable compound refers to a compound having a polymerizable group, and may be a monomer or a polymer. The polymerizable group refers to a group related to polymerization reaction. In this specification, the total solid content refers to the total mass of the components from which all solvents are removed.

In the label of the group (atomic group) in this specification, the label that is not labeled with substituted and unsubstituted includes a group that does not have a substituent and has a substituent. For example, "alkyl" includes not only unsubstituted alkyl groups (unsubstituted alkyl groups), but also substituted alkyl groups (substituted alkyl groups). Examples of the substituent include a group selected from the following substituent group T.

(Substituent T) Examples of the substituent T include halogen atoms, alkyl groups, cycloalkyl groups, alkenyl groups, cycloalkenyl groups, alkynyl groups, aryl groups, heterocyclic groups, cyano groups, hydroxyl groups, nitro groups, carboxyl groups, alkoxy groups, and aromatic groups. Oxygen group, siloxy group, heterocyclic oxy group, amide group, carbamoyl group, amine group (including alkyl amine group and aniline group), amide group, aminocarbonyl amine group, alkoxycarbonylamine Group, aryloxycarbonylamino group, sulfamoylamino group, alkyl or arylsulfonylamino group, mercapto group, acetyloxy group, alkylthio group, heterocyclic thio group, sulfamoyl group, sulfonic acid group , Alkyl or arylsulfonyl, alkyl or arylsulfonyl, acetyl, aryloxycarbonyl, alkoxycarbonyl, methamyl, aryl or heterocyclic azo, imidate , Phosphinyl, phosphinyl, phosphinyloxy, phosphinylamino, silyl, etc. The details are described below.

Examples include halogen atoms (for example, fluorine atom, chlorine atom, bromine atom and iodine atom), Straight-chain or branched-chain alkyl group (straight-chain or branched substituted or unsubstituted alkyl group, preferably C1-C30 alkyl group. For example, methyl, ethyl, n-propyl, isopropyl Group, tertiary butyl, n-octyl, 2-chloroethyl, 2-cyanoethyl, 2-ethylhexyl, etc.), Cycloalkyl (preferably substituted or unsubstituted cycloalkyl having 3 to 30 carbon atoms. For example, cyclohexyl and cyclopentyl may be mentioned, and polycycloalkyl (e.g., bicycloalkyl ( Preferably, it is a substituted or unsubstituted bicycloalkyl having 5 to 30 carbon atoms, more specifically, bicyclo[1,2,2]heptan-2-yl and bicyclo[2,2,2]heptane-3 -Groups, etc.) and polycyclic structures such as tricyclic alkyl groups). Among them, monocyclic cycloalkyl groups or bicyclic alkyl groups are preferred, and monocyclic cycloalkyl groups are more preferred),

Straight-chain or branched alkenyl (straight-chain or branched substituted or unsubstituted alkenyl, preferably C2-C30 alkenyl. For example, vinyl, allyl, isoprenyl , Geranyl and oleyl)), Cycloalkenyl (preferably substituted or unsubstituted cycloalkenyl having 3 to 30 carbon atoms. For example, 2-cyclopenten-1-yl and 2-cyclopenten-1-yl may also be mentioned It is a polycyclic alkenyl group (bicycloalkenyl group (preferably a substituted or unsubstituted bicycloalkenyl group having 5 to 30 carbon atoms. More specifically, bicyclo[2,2,1]hept-2-ene-1- Group and bicyclic [2,2,2]oct-2-en-4-yl, etc.) and tricyclic alkenyl and other polycyclic structures). Among them, monocyclic cycloalkenyl is preferred), Alkynyl (preferably substituted or unsubstituted alkynyl having 2 to 30 carbon atoms. For example, ethynyl, propargyl and trimethylsilylethynyl),

Aryl (preferably a substituted or unsubstituted aryl group having 6 to 30 carbon atoms. For example, phenyl, p-tolyl, naphthyl, m-chlorophenyl, o-hexadecylaminophenyl, pyrenyl, Biphenyl and triphenyl), Heterocyclic groups (substituted or unsubstituted heterocyclic groups of 5 to 7 members are preferred. Heterocyclic groups are saturated or unsaturated. Heterocyclic systems are aromatic or non-aromatic. Heterocyclic systems are monocyclic or condensed rings. In the heterocyclic group, the ring structure atom is selected from a carbon atom, a nitrogen atom, and a sulfur atom, and a heterocyclic group having at least one hetero atom among a nitrogen atom, an oxygen atom, and a sulfur atom is more preferable, and the carbon number is 3-30 The 5 or 6 membered aromatic heterocyclic group is further preferred. For example, 2-furyl, 2-thienyl, 2-pyridyl, 4-pyridyl, 2-pyrimidinyl, and 2-benzothiazolyl ), Cyano, hydroxyl, nitro, carboxyl,

Alkoxy (preferably substituted or unsubstituted alkoxy having 1 to 30 carbon atoms. For example, methoxy, ethoxy, isopropoxy, third butoxy, n-octyloxy and 2 -Methoxyethoxy), Aryloxy (preferably substituted or unsubstituted aryloxy having 6 to 30 carbon atoms. For example, phenoxy, 2-methylphenoxy, 2,4-di-third pentylphenoxy , 4-tert-butylphenoxy, 3-nitrophenoxy and 2-tetradecylaminophenoxy), Siloxy (preferably siloxy having 3 to 20 carbon atoms. For example, trimethylsiloxy and tert-butyldimethylsiloxy), Heterocyclic oxy group (preferably a substituted or unsubstituted heterocyclic oxy group having 2 to 30 carbon atoms. The heterocyclic part is preferably the heterocyclic part described in the aforementioned heterocyclic group. For example, 1-phenyltetra Azole-5-oxy and 2-tetrahydropyranyloxy),

Acyloxy (preferably, methyloxy, substituted or unsubstituted alkylcarbonyloxy having 2 to 30 carbon atoms or substituted or unsubstituted arylcarbonyloxy having 6 to 30 carbon atoms. For example, Methoxy, ethoxy, trimethylethoxy, stearyloxy, benzyloxy, p-methoxyphenylcarbonyloxy, propenyloxy and methacryloyloxy base), Carboxamide (preferably C 1-30 substituted or unsubstituted carboxamide. For example, N,N-dimethylamine carboxamide, N,N-diethylamine Acyloxy, morpholinylcarbonyloxy, N,N-di-n-octylaminocarbonyloxy and N-n-octylaminomethyloxy), Alkoxycarbonyloxy (preferably substituted or unsubstituted alkoxycarbonyloxy having 2 to 30 carbon atoms. For example, methoxycarbonyloxy, ethoxycarbonyloxy, third butoxycarbonyl Oxygen and n-octylcarbonyloxy), Aryloxycarbonyloxy (preferably C7-30 substituted or unsubstituted aryloxycarbonyloxy. For example, phenoxycarbonyloxy, p-methoxyphenoxycarbonyloxy and p N-hexadecyloxyphenoxycarbonyloxy),

Amino groups (preferably amine groups, substituted or unsubstituted alkylamine groups having 1 to 30 carbon atoms, substituted or unsubstituted arylamine groups having 6 to 30 carbon atoms or heterocycles having 0 to 30 carbon atoms Cyclic amino groups. For example, amino groups, methylamino groups, dimethylamino groups, aniline groups, N-methyl-aniline groups, dianiline groups, and N-1,3,5-Sankoujing-2-ylamino groups) , Acylamino group (preferably, a carboxamido group, a substituted or unsubstituted alkylcarbonylamino group having 1 to 30 carbon atoms or a substituted or unsubstituted arylcarbonylamino group having 6 to 30 carbon atoms. For example, Formamide, acetamido, trimethylacetamido, lauramide, benzamide, 3,4,5-tri-n-octyloxyphenylcarbonylamino, acryloyl Amine group and methacryl amide group), Aminocarbonylamino group (preferably a substituted or unsubstituted aminocarbonylamino group having 1 to 30 carbon atoms. For example, carbamoylamino group, N,N-dimethylaminocarbonylamino group, N,N -Diethylaminocarbonylamino and morpholinylcarbonylamino), Alkoxycarbonylamino group (preferably a substituted or unsubstituted alkoxycarbonylamino group having 2 to 30 carbon atoms. For example, methoxycarbonylamino group, ethoxycarbonylamino group, third butoxycarbonyl group Amino group, n-octadecyloxycarbonylamino group and N-methyl-methoxycarbonylamino group),

Aryloxycarbonylamino group (preferably a substituted or unsubstituted aryloxycarbonylamino group having 7 to 30 carbon atoms. For example, phenoxycarbonylamino group, p-chlorophenoxycarbonylamino group and m-octyl Oxyphenoxycarbonylamino group), Sulfasylamino (preferably substituted or unsubstituted sulfamoylamino with 0-30 carbon atoms. For example, sulfamoylamino, N,N-dimethylaminosulfamoylamino Group and N-n-octylaminosulfonylamino group), Alkyl or aryl sulfonamides (preferably substituted or unsubstituted alkyl sulfonamides with 1 to 30 carbon atoms or substituted or unsubstituted aryl sulfonamides with 6 to 30 carbon atoms) Amino group, for example, methylsulfonamide, butylsulfonamide, phenylsulfonamide, 2,3,5-trichlorophenylsulfonamide and p-methylbenzene Sulfamoylamino)), Mercapto,

Acyloxy (preferably substituted or unsubstituted acyloxy having 1 to 30 carbon atoms. For example, methylthio, ethylthio and n-hexadecylthio), Alkylthio (preferably substituted or unsubstituted alkylthio having 6 to 30 carbon atoms). For example, phenylthio, p-chlorophenylthio and m-methoxyphenylthio)), Heterocyclic thio group (preferably a substituted or unsubstituted heterocyclic thio group having 2 to 30 carbon atoms). The heterocyclic portion is preferably the heterocyclic portion described in the aforementioned heterocyclic group. For example, 2-benzothiazolylthio and 1-phenyltetrazol-5-ylthio), Sulfasamide (preferably substituted or unsubstituted sulfamoyl with 0-30 carbon atoms. For example, N-ethylsulfamoyl, N-(3-dodecyloxypropyl) sulfa Acyl, N,N-dimethylamine sulfonamide, N-ethenyl sulfonamide, N-benzyl sulfonamide, and N-(N'-phenylamine sulfonamide) sulfonamide醯基), Sulfonic acid group,

Alkyl or arylsulfinyl (preferably C 1-30 substituted or unsubstituted alkyl sulfinyl or 6-30 substituted or unsubstituted aryl sulfinyl. For example , Methylsulfinyl, ethylsulfinyl, phenylsulfinyl and p-methylphenylsulfinyl), Alkyl or arylsulfonyl (preferably C 1-30 substituted or unsubstituted alkyl sulfonyl or C 6-30 substituted or unsubstituted aryl sulfonyl. For example, Methanesulfonyl, ethylsulfonyl, phenylsulfonyl and p-methylphenylsulfonyl), Acyl group (preferably, methyl acetyl group, substituted or unsubstituted alkylcarbonyl group having 2 to 30 carbon atoms or substituted or unsubstituted arylcarbonyl group having 7 to 30 carbon atoms. For example, acetyl group, trimethyl group Ethyl acetyl group, 2-chloroethyl acetyl group, stearyl acetyl group, benzoyl acetyl group, p-n-octyloxyphenyl carbonyl group, propenyl acetyl group and methacryl acetyl group), Aryloxycarbonyl (preferably a substituted or unsubstituted aryloxycarbonyl having 7 to 30 carbon atoms. For example, phenoxycarbonyl, o-chlorophenoxycarbonyl, m-nitrophenoxycarbonyl and p-third Butylphenoxycarbonyl),

Alkoxycarbonyl (preferably substituted or unsubstituted alkoxycarbonyl having 2 to 30 carbon atoms. For example, methoxycarbonyl, ethoxycarbonyl, third butoxycarbonyl and n-octadecyloxycarbonyl ), Carboxamide (preferably a substituted or unsubstituted carboxamide having 1 to 30 carbon atoms. For example, carboxamide, N-methylaminecarboxamide, N,N-dimethylamine) Acyl, N,N-di-n-octylamine methylamide and N-(methylsulfonylaminomethylamide), Aryl or heterocyclic azo (preferably C6-30 substituted or unsubstituted arylazo or C3-30 substituted or unsubstituted heterocyclic azo (heterocyclic The heterocyclic portion of the azo group is preferably the heterocyclic portion described in the aforementioned heterocyclic group). For example, phenylazo, p-chlorophenylazo and 5-ethylthio-1,3, 4-thiadiazol-2-ylazo), Amide imino group (preferably substituted or unsubstituted amide imino group having 2 to 30 carbon atoms. For example, N-succinimide group and N-phthalimide group), Phosphonyl (preferably substituted or unsubstituted phosphino with 2 to 30 carbon atoms. For example, dimethylphosphino, diphenylphosphino and methylphenoxyphosphino), Phosphinyl groups (preferably substituted or unsubstituted phosphinyl groups having 2 to 30 carbon atoms. For example, phosphinyl groups, dioctyloxyphosphinyl groups and diethoxyphosphinyl groups),

Phosphinyloxy (preferably substituted or unsubstituted phosphinyloxy having 2 to 30 carbon atoms. For example, diphenoxyphosphinyloxy and dioctyloxyphosphinyloxy), Phosphinylamino groups (preferably substituted or unsubstituted phosphinylamino groups having 2 to 30 carbon atoms. For example, dimethoxyphosphinylamino groups and dimethylaminophosphinylamino groups) and Silyl (preferably substituted or unsubstituted silyl having 3 to 30 carbon atoms. For example, trimethylsilyl, tertiary butyldimethylsilyl and phenyldimethylsilyl ).

Among the above-mentioned functional groups, the group having a hydrogen atom may be a part of the hydrogen atom in the functional group substituted by any of the above groups. Examples of the functional group which can be introduced as a substituent include alkylcarbonylaminosulfonyl, arylcarbonylaminosulfonyl, alkylsulfonylaminocarbonyl and arylsulfonylaminocarbonyl More specifically, methylsulfonylaminocarbonyl, p-methylphenylsulfonylaminocarbonyl, acetamidosulfonyl, and benzamidesulfonamide can be mentioned.

[[Composition of composition-forming composition] [[composition]] [[composition] [component]] The composition of the present invention includes: a compound X having a plurality of residues formed by removing one or more hydrogen atoms from a compound represented by the general formula (I) described later; and a solvent.

Compound X is, for example, a high refractive index material. The compound X has a plurality of residues formed by removing one or more hydrogen atoms from a compound represented by the general formula (I) described later. Among the compounds represented by the general formula (I), due to its structure, the molecular phase error is small and the polarizability is high, so as a result, the compound X including the residue derived from the compound represented by the above general formula (I) shows High refractive index. In addition, in the film formed by the composition containing Compound X, Compound X shows excellent compatibility with each other, and therefore has excellent transparency (in other words, it is difficult to produce white turbidity due to aggregation), and furthermore, Compound X shows excellent intermolecular Interaction, so heat resistance is also excellent. Therefore, the film formed of the composition containing the compound X shows high transparency even after heating, and further has excellent appearance characteristics because cracks caused by heating can be suppressed.

Hereinafter, each component contained in the above-mentioned composition will be described in detail. 〔Compound X〕 The above composition contains compound X. The compound X is a compound having a plurality of residues formed by removing one or more hydrogen atoms from the compound represented by the following general formula (I). Hereinafter, the compound represented by the general formula (I) will be described in detail. <Compound represented by general formula (I)>

[Chemical Formula 1]

In the general formula (I), A ¹ represents a single bond, -O-, -S-, -SO ₂ -or -CO-. As the above A ¹ , in the film formed by the above composition, the effect from any one or more of the group including refractive index, transparency and heat resistance is more excellent (hereinafter also referred to as “the effect of the present invention is more excellent ".) From the point of view, single bonds, -O- or -S- are preferred, and single bonds are more preferred.

B ¹ represents a single bond, -CO-, -S-, -O-, -SO ₂ -or -NH-. As the above B ¹ , in the film formed by the above composition, a single bond or -CO- is preferable from the viewpoint of more excellent effects of the present invention.

C ¹ represents a group or heterocyclic group represented by the following general formula (II).

[Chemical Formula 2]

In the general formula (II), D ¹ represents a monovalent substituent. The monovalent substituent represented by D ¹ is not particularly limited, and examples thereof include the groups exemplified by the above-mentioned substituent group T, where, from the viewpoint of a higher refractive index, for example, a A group with a double bond in the conjugation (for example, an aryl group may be mentioned. The aryl group may further have a substituent. As a substituent, for example, a group exemplified in the substituent group T, of which a phenyl group is preferred.), Halogen atom (fluorine atom, chlorine atom, bromine atom or iodine atom), cyano group, alkyl group (alkyl group having 1 to 15 carbon atoms is preferred, alkyl group having 1 to 10 carbon atoms is more preferred.), alkoxy group Group (alkoxy groups with 1 to 15 carbon atoms are preferred.), mercapto or -SR ¹¹ (as R ¹¹ , alkyl groups with 1 to 15 carbon atoms and aryl groups with 6 to 20 carbon atoms are preferred. The alkyl group of 1 to 10 is more preferable. The above-mentioned alkyl group and aryl group further have a substituent (as the substituent, for example, a group exemplified by the above-mentioned substituent group T.)) is preferable. As a monovalent substituent represented by D ¹ , among them, a group having a conjugated double bond, a halogen atom, a cyano group or -SR ¹¹ is more preferable, and a phenyl group, a biphenyl group, a cyano group or -SR ¹¹ is Very good.

n ¹ represents an integer of 0 to 4. There is no particular limitation on n ¹ , but from the viewpoint that the effect of the present invention is more excellent, 1 to 4 is preferred, and 1 or 2 is further preferred.

* Indicates the position of connection with B ¹ in the general formula (I).

In the general formula (II), n ¹ is at least the case 1, becomes higher from the viewpoint of the refractive index, D is substituted at position ¹ with respect to at least one formula (I) in link B ¹ Position is better.

Further, the general formula (II), D ¹ the presence of a plurality, the plurality of D ¹ also may be the same or different. In addition, a plurality of D ¹ may be bonded to each other to form a ring. Examples of the ring formed by bonding a plurality of D ^{1 to} each other include an aromatic ring (aromatic hydrocarbon ring or aromatic heterocyclic ring) and a non-aromatic ring. Moreover, you may contain a hetero atom. Examples of aromatic rings include benzene rings.

Among the groups represented by the above general formula (II), the group represented by the following general formula (III) or the group represented by the following general formula (IV) from the viewpoint that the effect of the present invention is more excellent Group is better.

[Chemical Formula 3]

In the general formula (III), D ² represents a monovalent substituent. The monovalent substituent represented by D ² is not particularly limited, and examples thereof include the groups exemplified by the above-mentioned substituent group T, where, from the viewpoint of a higher refractive index, for example, it has a common A group with a double bond in the conjugation (for example, an aryl group may be mentioned. The aryl group may further have a substituent. As a substituent, for example, a group exemplified in the substituent group T, of which a phenyl group is preferred.), Halogen atom (fluorine atom, chlorine atom, bromine atom or iodine atom), cyano group, alkyl group (alkyl group having 1 to 15 carbon atoms is preferred, alkyl group having 1 to 10 carbon atoms is more preferred.), alkoxy group Group (alkoxy groups with 1 to 15 carbon atoms are preferred.), mercapto or -SR ¹¹ (as R ¹¹ , alkyl groups with 1 to 15 carbon atoms and aryl groups with 6 to 20 carbon atoms are preferred. The alkyl group of 1 to 10 is more preferable. The above-mentioned alkyl group and aryl group further have a substituent (as the substituent, for example, a group exemplified by the above-mentioned substituent group T.) is preferable. As a monovalent substituent represented by D ¹ , among them, a group having a conjugated double bond, a halogen atom, a cyano group or -SR ¹¹ , more preferably, a phenyl group, a biphenyl group, a cyano group or -SR ¹¹ It is especially good.

n ² represents an integer of 1-4. There is no particular limitation on n ² , but from the viewpoint that the effect of the present invention is more excellent, 1 or 2 is preferable.

n ³ represents an integer of 0-5. N ³ is not particularly limited, but from the viewpoint of more excellent effects of the present invention, 0 to 3 is preferable, and 1 or 2 is more preferable.

E ¹ represents a monovalent substituent. The monovalent substituent represented by E ¹ has the same meaning as the monovalent substituent represented by D ¹ described above, and the preferred aspects are also the same.

n ⁴ represents an integer of 0 to 3. There is no particular limitation on n ⁴ , but from the viewpoint that the effect of the present invention is more excellent, 0 or 1 is preferable, and 0 is more preferable. However, n ² +n ⁴ is an integer of 1-4.

* Indicates the position of connection with B ¹ in the general formula (I).

Further, the general formula (III), D ² the presence of a plurality of, respectively, a plurality of D ² also may be the same or different. In addition, a plurality of D ² may be bonded to each other to form a ring. And, where E ¹ in the presence of a plurality, the plurality of E ¹ also may be the same or different. Moreover, a plurality of E ¹ may be bonded to each other to form a ring. Examples of the ring formed by bonding a plurality of D ² and E ^{1 to} each other include an aromatic ring (aromatic hydrocarbon ring or aromatic heterocyclic ring) and a non-aromatic ring. Moreover, you may contain a hetero atom. Examples of aromatic rings include benzene rings.

From the viewpoint that the refractive index becomes higher, in the general formula (III), the bonding position of the benzene ring that can be substituted with E ^{1 and} the benzene ring that can be substituted with D ² with respect to B ¹ in the general formula (I) The linking position is better. In addition, from the viewpoint that the refractive index becomes higher, in the general formula (III), when n ³ is 1 or more, at least one of the substitution positions of D ² is connected to the benzene ring that can be substituted with E ¹ Position is better.

The group represented by the general formula (III) is preferably a group represented by the following general formula (III-1) from the viewpoint that the effect of the present invention is more excellent.

[Chemical Formula 4]

In the general formula (III-1), D ² , E ¹ , n ³ , n ⁴ and * have the same meanings as D ² , E ¹ , n ³ , n ⁴ and * in the general formula (III), preferably The appearance is the same.

From the viewpoint of a higher refractive index, in the general formula (III-1), when n ³ is 1 or more, at least one of the substitution positions of D ² is connected to the benzene ring that can be substituted with E ¹ Position is better.

[Chemical Formula 5]

In the general formula (IV), D ³ represents cyano or -SR ¹¹ . R ¹¹ represents a C 1-15 alkyl group or a C 6-20 aryl group, and a C 1-10 alkyl group is preferred. In addition, the above-mentioned alkyl group and aryl group further have a substituent (as the substituent, for example, a group exemplified by the above-mentioned substituent group T.).

n ⁵ represents an integer of 1-4. There is no particular limitation on n ⁵ , but from the viewpoint that the effect of the present invention is more excellent, 1 or 2 is preferable.

E ² represents a monovalent substituent. The monovalent substituent represented by E ² has the same meaning as the monovalent substituent represented by D ¹ described above, and the preferred aspects are also the same.

n ⁶ represents an integer of 0 to 3. There is no particular limitation on n ⁶ , but from the viewpoint that the effect of the present invention is more excellent, 0 or 1 is preferable, and 0 is more preferable. However, n ⁵ +n ⁶ is an integer of 1-4.

* Indicates the position of connection with B ¹ in the general formula (I).

Further, the general formula (IV), D ³ in the presence of a plurality of cases, a plurality of D ³ also may be the same or different. In addition, a plurality of D ³ may be bonded to each other to form a ring. And, E ² the presence of a plurality, the plurality of E ² respectively, may be also the same or different. In addition, a plurality of E ² may be bonded to each other to form a ring.

From the viewpoint that the refractive index becomes higher, in the general formula (IV), it is preferable that at least one of the substitution positions of D ³ is para to the connection position with B ¹ in the general formula (I).

In the general formula (II), the heterocyclic group represented by C ¹ is not particularly limited, but examples thereof include aliphatic heterocyclic groups and aromatic heterocyclic groups. Examples of the aliphatic heterocyclic ring forming the aliphatic heterocyclic group include a 5-membered ring, a 6-membered ring, or a 7-membered ring or a condensed ring thereof. In addition, examples of the aromatic heterocyclic ring forming the aromatic heterocyclic group include a 5-membered ring, a 6-membered ring, or a 7-membered ring or a condensed ring thereof. In addition, the condensed ring may include a ring other than a heterocyclic group such as a benzene ring.

Examples of the hetero atom included in the aliphatic heterocyclic group include a nitrogen atom, an oxygen atom, and a sulfur atom. The carbon number of the aliphatic heterocyclic ring is not particularly limited, but 3 to 20 is preferred. Specific examples of the above-mentioned aliphatic heterocyclic ring are not particularly limited, but examples thereof include an oxopentane, oxane ring, piperidine ring, and piperazine ring. In addition, the aforementioned aliphatic heterocyclic ring is formed by removing one hydrogen atom from the ring to constitute an aliphatic heterocyclic group.

Examples of the hetero atom included in the aromatic heterocyclic group include a nitrogen atom, an oxygen atom, and a sulfur atom. The carbon number of the aromatic heterocyclic group is not particularly limited, but 3 to 20 is preferred. Specific examples of the above-mentioned aromatic heterocyclic ring are not particularly limited, but examples thereof include a furan ring, a thiophene ring, a pyrrole ring, an oxazole ring, an isoxazole ring, an oxadiazole ring, a thiazole ring, an isothiazole ring, and a thiazole ring. Diazole ring, imidazole ring, pyrazole ring, triazole ring, furan ring, tetrazole ring, pyridine ring, pyridazine ring, pyrimidine ring, pyrazine ring, Mitsui ring, tetrazine ring, benzofuran ring, Isobenzofuran ring, benzothiophene ring, indole ring, indoline ring, isoindole ring, benzoxazole ring, benzothiazole ring, indazole ring, benzimidazole ring, quinoline ring, iso Quinoline ring, cinnoline ring, phthalazine ring, quinazoline ring, quinoxaline ring, dibenzofuran ring, dibenzothiophene ring, carbazole ring, acridine ring, poridine ring, porphyrin ring, Phorazine ring, naphthyridine ring, purine ring, pteridyl ring, etc. In addition, the aromatic heterocyclic ring is formed by removing one hydrogen atom from the ring to form an aromatic heterocyclic group.

As the heterocyclic group represented by C ¹ , an aromatic heterocyclic group is preferable from the viewpoint that the effect of the present invention is more excellent. As C ¹ , from the viewpoint that the effect of the present invention is more excellent, the group represented by the general formula (II) is preferred, and the group represented by the general formula (III) or represented by the general formula (IV) The group is better. In addition, in the compound represented by the general formula (I), when m ¹ described later represents an integer of 2 to 4 (in other words, the group represented by -B ¹ -C ^{1 in} the compound represented by the general formula (I) In the case of 2 to 4 groups), from the viewpoint that the effect of the present invention is more excellent, one or more of C ¹ is selected from the group including the group represented by the general formula (III) and represented by the general formula (IV) The group in the group of groups is preferably, and two or more of C ¹ are selected from the group including a group represented by the general formula (III) and a group represented by the general formula (IV) The group is better.

R ¹ represents a hydrogen atom or an alkyl group which may contain a hetero atom. The alkyl group represented by R ¹ which may contain a hetero atom may be linear, branched or cyclic, preferably having 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and carbon Numbers 1 to 10 are further preferred, and carbon numbers 1 to 6 are particularly preferred. In addition, the type of hetero atom is not particularly limited, but examples thereof include an oxygen atom, a nitrogen atom, and a sulfur atom. Among them, from the viewpoint that the effect of the present invention is more excellent, -Y ¹ -, -N(Ra)-, -C(=Y ² )-, -CON(Rb)-, -C(=Y ³ )Y ^It is preferable that the form of -, -SOt-, -SO ₂ N(Rc)- or a combination of these is included. Y ¹ to Y ⁴ each independently represent an oxygen atom or a sulfur atom. t represents an integer of 1-3. Ra, Rb, and Rc each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. In addition, when the above alkyl group contains a heteroatom, -CH ₂ -is substituted with a heteroatom.

m ¹ represents an integer of 1-4. There is no particular limitation on m ¹ , but from the viewpoint that the effect of the present invention is more excellent, 2 to 4 is preferable, and 2 is more preferable.

Further, the general formula (I), B ¹ the presence of a plurality, the plurality of B ¹ s may be the same or different also. And, C ¹ the presence of a plurality of, three C ¹ complex also may be the same or different.

In addition, from the viewpoint of being more excellent in the effect of the present invention, the compound represented by the general formula (I) has at least a position represented by -B ¹ at the position shown by * in the following general formula (IA) or general formula (IB) The group represented by -C ¹ is preferred.

[Chemical Formula 6]

The compound represented by the general formula (I) is preferably a compound represented by the following general formula (V).

[Chemical Formula 7]

In the general formula (V), B ² represents a single bond or -CO-. m ² represents an integer of 1 to 4, and from the viewpoint that the effect of the present invention is more excellent, 2 to 4 is preferable, and 2 is more preferable. In the general formula (V), R ¹ the same meaning as the general formula ^(I), R ^1, the preferred aspects are also the same. And in the general formula (V), D ^2, and n ³ the same meaning as formula (III) in D ² and n ³ are the same, the preferred aspects are also the same. Further, the general formula (V), where B ² in the presence of a plurality, the plurality of B ² respectively, may be also the same or different. And, D ² the presence of a plurality of, respectively, a plurality of D ² also may be the same or different. In addition, a plurality of D ² may be bonded to each other to form a ring.

<Compound X> The compound X is a compound having a plurality of residues formed by removing one or more hydrogen atoms from the compound represented by the general formula (I) (hereinafter also referred to as "general formula (I) residue"). The compound X may be a structure in which a plurality of residues of the general formula (I) are directly bonded to each other, or a structure in which a plurality of residues of the general formula (I) are bonded through a linking group. In addition, the plurality of residues of the general formula (I) present in the compound X may be the same or different. In the compound X, the number of residues of the general formula (I) is not particularly limited, but 2 to 10,000 are preferred. The molecular weight of the compound X (when it has a molecular weight distribution is a weight average molecular weight) is not particularly limited, but it is, for example, 450 to 500,000, preferably 450 to 20,000, and more preferably 450 to 15,000. In addition, when compound X has a molecular weight distribution, the weight average molecular weight (Mw) is defined in terms of GPC-based polystyrene conversion. Hereinafter, the residue of the general formula (I) will be described first.

The residue of the general formula (I) is a group formed by removing one or more hydrogen atoms from the compound represented by the general formula (I) as described above. The position of the hydrogen atom removed from the compound represented by the above general formula (I) in order to form the residue of the above general formula (I) is not particularly limited, but is selected from R ¹ including the above general formula (I) (where, It is limited to the case where R ¹ has a hydrogen atom.), C ¹ (wherein, it is limited to the case where C ¹ has a hydrogen atom.), and the position in the group of hydrogen atoms on the benzene ring explicitly expressed in the general formula (I) is more good. Wherein, in the general formula (I) is a residue of a monovalent case, formula (I) by removing the residues of formula (I) of R ¹ (wherein R ¹ has the limited hydrogen atoms. ) Is better formed by hydrogen atoms. Further, the above-mentioned formula (I) is a residue of a divalent case, formula (I) by removing the residues of each of the above general formula (I) is C ¹ (wherein, C ¹ having a limited hydrogen atoms Case.) and the group formed by the hydrogen atom on the benzene ring shown in the general formula (I) is more preferable.

Where R ¹ represents a hydrogen atom and the above-mentioned hydrogen atom (that is, the hydrogen atom represented by R ¹ ) is removed to form the above-mentioned general formula (I) residue, the above-mentioned general formula (I) residue is not compatible with an aromatic hydrocarbon Ring link.

As the compound X, from the viewpoint that the effect of the present invention is more excellent, it is selected from compounds including a repeating unit represented by the following general formula (A), compounds including a repeating unit represented by the following general formula (B), It is preferable that one or more compounds in the group containing a repeating unit represented by the following general formula (C) and a compound represented by the following general formula (D). In addition, a compound containing a repeating unit represented by the following general formula (A), a compound containing a repeating unit represented by the following general formula (B), and a compound containing a repeating unit represented by the following general formula (C) may It is any form of oligomer and polymer. When the compound including the repeating unit represented by the following general formula (A) is an oligomer, the number of repeating units represented by the general formula (A) in the compound is preferably 3 or more, and 5 or more Better. In addition, the upper limit value is not particularly limited, but is, for example, 20. In addition, the case where the compound containing the repeating unit represented by the following general formula (B) and the compound containing the repeating unit represented by the following general formula (C) are oligomers is also the same.

In addition, the compound represented by the following general formula (D) may be in the form of an oligomer or a polymer as described later. Hereinafter, each compound will be described.

(Compounds containing repeating units represented by general formula (A))

[Chemical Formula 8]

In the general formula (A), X ¹ represents a linker formed by polymerization. In this specification, "a linking group formed by polymerization" refers to a portion where a repeating unit corresponding to a main chain formed by a polymerization reaction is formed. Examples of X ¹ include known linking groups formed from polymerizable monomers. For example, linking groups represented by (XX-1) to (XX-24) shown below are preferred, (XX-1 ), (XX-2), (XX-10) ~ (XX-17) or (XX-24) is better.

Further, the (XX-1) shown below ~ (XX-24), * represents a coupling position to L ^1. In addition, Me represents a methyl group, and R in (XX-18) and (XX-19) represents a hydrogen atom, a C 1-5 alkyl group or a phenyl group.

[Chemical Formula 9]

[Chemical Formula 10]

L ¹ represents a single bond or a divalent linking group. The divalent linking group represented by L ¹ is not particularly limited, but for example, a divalent hydrocarbon group (which may be a divalent aliphatic hydrocarbon group or a divalent aromatic hydrocarbon ring group. As a divalent Aliphatic hydrocarbon group (which may be linear, branched, or cyclic.), for example, an alkylene group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, and a carbon number 2-20. Alkynyl groups. Further, as a divalent aromatic hydrocarbon ring group, 6 to 20 carbon atoms are preferred, and examples include a phenylene group.), a divalent heterocyclic group, -O-, -S-, -SO ₂ -, -NR ^A -, -CO- and a combination of two or more of these groups. Among them, R ^A represents a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms). In addition, as the above-mentioned heterocyclic group, a 5- to 7-membered ring having at least one nitrogen atom, oxygen atom or sulfur atom in the ring structure is preferred, and a 5- to 6-membered ring is more preferred. In addition, the above-mentioned heterocyclic group may be either aromatic or non-aromatic. The above-mentioned divalent linking group can be further substituted. The substituent is not particularly limited, but examples exemplified by the above-mentioned substituent group T may be mentioned. W represents a residue of the general formula (I), specifically, a residue formed by removing one hydrogen atom from the compound represented by the general formula (I).

"Other Repeating Units" The compound containing the repeating unit represented by the above general formula (A) may contain a repeating unit other than the repeating unit represented by the general formula (A). There is no particular limitation on other repeating units that can be contained in the compound containing the repeating unit represented by the above general formula (A), and for example, a repeating unit represented by the following general formula (P) is preferable.

[Chemical Formula 11]

In the above general formula (P), R ^a to R ^c each independently represent a hydrogen atom or a monovalent substituent. The monovalent substituent represented by R ^a to R ^c is not particularly limited, and examples thereof include the groups exemplified by the above substituent group T, in which the carbon number is 1 to 10 (preferably carbon number 1 The alkyl group of ~6) is preferred.

L ^a represents a single bond or a divalent linking group. As the divalent represented by a linking group L ^a, the meaning of L ¹ of the above-described formula (A) are the same, the preferred aspects are also the same. As L ^a, or a combination selected from the group comprising a single bond -O -, - NR ^A -, and -CO- of the above group of one kind or two kinds of groups are preferred from. Among them, R ^A represents a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms).

Y ^a represents a monovalent substituent. The monovalent substituent represented by Y ^a is not particularly limited, but from the viewpoint of more excellent substrate adhesion of the film, it represents an acid group (for example, a carboxyl group, a sulfonic acid group, a phosphoric acid group, etc.) or may contain a hetero atom The alkyl group is preferred. In addition, as a group containing a hetero atom, it has the same meaning as R ¹ in the general formula (I), and the preferred aspect is also the same. The above-mentioned Y ^a and the above-mentioned Y ^{b may} be bonded to each other to form a ring together with two carbon atoms clearly shown in the main chain of the general formula (P). The number of ring members as the ring is not particularly limited, but 5 to 6 members are preferred.

As the repeating unit represented by the above general formula (P), from the viewpoint that the substrate adhesion of the film is more excellent, the repeating unit derived from (meth)acrylic acid, crotonic acid, itaconic acid, etc. is derived from ( Methacrylate monomers (such as 2-(meth)acryloyloxyethyl succinate, ω-carboxy-polycaprolactone (n≈2) monoacrylate and 2-methacryloyl ethyl Phthalic acid esters, etc.) or repeating units derived from (meth)acrylamide monomers are preferred.

In the compound containing the repeating unit represented by the general formula (A), the content of the repeating unit represented by the general formula (A) relative to the total repeating unit is, for example, 30 mol% or more, preferably 50 mol% or more, More than 70 mol% is more preferable, and more than 80 mol% is more preferable. In addition, the upper limit is, for example, 100 mol% or less. In the case where the compound containing the repeating unit represented by the general formula (A) contains the repeating unit represented by the general formula (P), the content of the repeating unit represented by the general formula (P) relative to the total repeating unit is, for example, 5 Mole% or more, more preferably 10 mole %. In addition, the upper limit thereof is, for example, 40 mol% or less, preferably 30 mol% or less. In the compound containing the repeating unit represented by the general formula (A), the repeating unit represented by the general formula (A) may contain one or more types or two or more types. In addition, the repeating unit represented by the general formula (P) may include one or more types or two or more types.

The compound containing the repeating unit represented by the general formula (A) can be synthesized according to a known method.

(A compound containing a repeating unit represented by the general formula (B)) [Chemical Formula 12]

In the general formula (B), X ² , L ² and W have the same meanings as X ¹ , L ¹ and W in the general formula (A), respectively, and the preferred aspects are also the same.

Y ² represents an ionic structural part. The ionic structural part refers to a part where an anionic group and a cationic group form a salt structure by ionic bonding (*-(M ^n- )(N ⁿ⁺ )-*: M ^n- represents an anionic group, N ⁿ⁺ represents Cationic group, n represents the valence, * represents the bonding position with L ² or W.). Examples of the anionic group, and examples thereof include a sulfonic acid group (-SO ₃ ^-), a carboxylic acid group (-CO ₃ ^-), phosphoric acid group (-PO ₄ ^3-), acyl imino group (-SO ₂ N ^- SO ₂ -R ^X , -CON ^- CO-R ^Y , -CON ^- SO ₂ -R ^Z or -SO ₂ N ^- CO-R ^Z ) etc. In addition, each of R ^X , R ^Y and R ^Z independently represents a monovalent substituent. ^Examples of the monovalent substituent represented by R ^X , R ^Y and R ^Z include alkyl groups having 1 to 15 carbon atoms. The alkyl group may further have a substituent (for example, a group exemplified by the substituent group T, and a halogen atom is preferable.). Among R ^X , R ^Y and R ^Z , fluoroalkyl groups having 1 to 15 carbon atoms are preferred, and fluoroalkyl groups having 1 to 10 carbon atoms are more preferred. Examples of the cationic group include a 4-level ammonium group and a 4-level phosphonium group. Among the ionic structural parts, the structural parts represented by the following general formula (B1) to general formula (B4) are preferred.

[Chemical Formula 13]

In the general formula (B1) and the general formula (B3), R ¹⁰¹ to R ¹⁰³ each independently represent a hydrogen atom or a monovalent substituent. The monovalent substituent represented by R ¹⁰¹ to R ¹⁰³ is not particularly limited, but is, for example, an alkyl group having 1 to 10 carbon atoms (which may be linear, branched, or cyclic.) Preferably, the C1-C6 alkyl group is more preferable, and the C1-C3 alkyl group is still more preferable. In addition, two of R ¹⁰¹ to R ¹⁰³ may be bonded to form a ring structure, or a hetero atom may be included in the ring.

In the general formula (B2) and the general formula (B4), R ²⁰¹ to R ²⁰³ each independently represent a hydrogen atom or a monovalent substituent. The monovalent substituent represented by R ²⁰¹ to R ²⁰³ is not particularly limited, but is, for example, an alkyl group having 1 to 10 carbon atoms (which may be linear, branched, or cyclic.) Preferably, the C1-C6 alkyl group is more preferable, and the C1-C3 alkyl group is still more preferable. In addition, two of R ²⁰¹ to R ²⁰³ may be bonded to form a ring structure, or a hetero atom may be included in the ring.

In general formula (B3) and general formula (B4), R ^X represents a monovalent substituent. Examples of the monovalent substituent represented by R ^X include a C 1-15 alkyl group. The alkyl group may further have a substituent (for example, a group exemplified by the substituent group T, and a halogen atom is preferable.). Among them, R ^X is preferably a fluoroalkyl group having 1 to 15 carbon atoms, and more preferably a fluoroalkyl group having 1 to 10 carbon atoms.

In the general formulae (B1) to (B4), * represents a bonding position with L ² or W.

"Other Repeating Units" The compound containing the repeating unit represented by the above general formula (B) may also contain a repeating unit other than the repeating unit represented by the general formula (B). Other repeating units that can be contained as the compound containing the repeating unit represented by the above general formula (B) are not particularly limited, and for example, the repeating unit represented by the above general formula (P) is preferable.

In the compound containing the repeating unit represented by the general formula (B), the content of the repeating unit represented by the general formula (B) relative to the total repeating unit is, for example, 30 mol% or more, preferably 50 mol% or more, More than 70 mol% is more preferable, and more than 80 mol% is more preferable. In addition, the upper limit is, for example, 100 mol% or less. In the case where the compound containing the repeating unit represented by the general formula (B) contains the repeating unit represented by the general formula (P), the content of the repeating unit represented by the general formula (P) relative to the total repeating unit is, for example, 5 Mole% or more, more preferably 10 mole %. In addition, the upper limit thereof is, for example, 40 mol% or less, preferably 30 mol% or less. In the compound containing the repeating unit represented by the general formula (B), the repeating unit represented by the general formula (B) may contain one or more types or two or more types. In addition, the repeating unit represented by the general formula (P) may include one or more types or two or more types.

The compound containing the repeating unit represented by the general formula (B) can be synthesized according to a known method.

(A compound containing a repeating unit represented by the general formula (C)) [Chemical Formula 14]

In the general formula (C), W represents a residue of the general formula (I), specifically, a residue formed by removing two hydrogen atoms from the compound represented by the general formula (I). L ³ represents a divalent linking group. The divalent linking group represented by L ³ is not particularly limited, but for example, a divalent linking group exemplified by L ¹ of the above general formula (A) and represented by the following general formula (C1) 2-valent linking group, etc.

[Chemical Formula 15]

In the general formula (C1), Ar ²⁰¹ and Ar ²⁰² each independently represent an aromatic ring group. Examples of the aromatic ring group include aromatic hydrocarbon groups and aromatic heterocyclic groups. Specific examples of the ring constituting the aromatic hydrocarbon group include benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, stilbene ring, triphenylene ring, pyrene ring, tetracene ring, and biphenyl ring ( 2 phenyl groups can be connected in any connection style) and terphenyl ring (3 phenyl groups can be connected in any connection style), etc. The aromatic heterocyclic group has the same meaning as the aromatic heterocyclic group represented by C ¹ in the above general formula (I), and the preferred aspects are also the same. In addition, the aromatic ring group may have a substituent.

Among the aromatic ring groups represented by Ar ²⁰¹ and Ar ²⁰² , from the viewpoint that the effect of the present invention is more excellent, it is preferable that they are each independently an aromatic hydrocarbon ring group, and the phenylene group is more preferable.

Ar ²⁰³ and Ar ²⁰⁴ each form an aromatic ring by including two carbon atoms in the general formula (C1). As the above-mentioned aromatic ring, an aromatic ring constituting an aromatic ring group represented by Ar ²⁰¹ and Ar ²⁰² can be exemplified. In addition, the aromatic ring may have a substituent. Among the aromatic rings represented by Ar ²⁰³ and Ar ²⁰⁴ , from the viewpoint that the effect of the present invention is more excellent, it is preferably an aromatic hydrocarbon ring independently, and a benzene ring is more preferable.

The divalent linking group represented by L ²⁰¹ and L ²⁰² is not particularly limited, but, for example, the divalent linking group exemplified by L ¹ of the above-mentioned general formula (A) may be mentioned.

In the general formula (C), L ⁴ represents a single bond or a divalent linking group. The divalent linking group represented by L ⁴ has the same meaning as the divalent linking group represented by L ³ in the above general formula (C), and the preferred aspects are also the same. In addition, in the general formula (C), when both L ³ and L ⁴ represent a divalent linking group, L ³ and L ⁴ may be the same or different.

* Indicates the bonding position.

The compound containing the repeating unit represented by the general formula (C) can be synthesized according to a known method.

(The compound represented by the general formula (D)) [Chemical formula 16]

In the general formula (D), W has the same meaning as W in the general formula (A), and the preferred aspects are also the same. In the general formula (D), L ⁵ represents a p+q-valent linking group. p represents an integer of 0-100. As p, from the viewpoint that the effect of the present invention is more excellent, 1 to 50 is preferable, 1 to 10 is more preferable, 1 to 4 is still more preferable, and 1 to 3 is particularly preferable. q represents an integer of 2-100. As q, from the viewpoint that the effect of the present invention is more excellent, 2 to 50 is preferred, 2 to 10 is more preferred, 2 to 4 is further preferred, and 2 to 3 is particularly preferred. As p+q, from the viewpoint that the effect of the present invention is more excellent, 3 to 100 is preferable, 3 to 20 is more preferable, 3 to 10 is even more preferable, and 3 to 6 is particularly preferable.

The linking group represented by L ⁵ is not particularly limited, but examples thereof include the linking groups shown below. In the following, when L ⁵ is a divalent linking group, it will be described differently from the case of a trivalent or higher linking group. (Divalent linking group) The divalent linking group represented by L ⁵ is not particularly limited, but examples include a divalent hydrocarbon group (which may be a divalent saturated hydrocarbon group or a divalent aromatic hydrocarbon ring As a divalent saturated hydrocarbon group, it may be linear, branched or cyclic, preferably having 1 to 20 carbon atoms, for example, an alkylene group. In addition, as a divalent aromatic hydrocarbon ring group The carbon number is preferably 6-20, for example, phenylene. For example, it can also be an alkenyl group (preferably carbon number 2-20), an alkynyl group (preferably carbon number 2~ 20).), divalent heterocyclic group, -O-, -S-, -SO ₂ -, -NR ^A -, -CO-, and a combination of two or more of these groups. Among them, R ^A represents a hydrogen atom or an alkyl group (preferably carbon number 1-10), an acetyl group (preferably carbon number 2-12), an aryl group (preferably carbon number 1-16) or a heteroaryl group (Preferably carbon number 2 to 13). In addition, as the above-mentioned heterocyclic ring and heteroaryl group, a 5- to 7-membered ring having at least one nitrogen atom, oxygen atom, or sulfur atom in the ring structure is preferred, and a 5- to 6-membered ring is more preferred. The above-mentioned divalent linking group can be further substituted. The substituent is not particularly limited, but examples exemplified by the above-mentioned substituent group T may be mentioned.

(Linker group of 3 or more valences) The linker group of 3 or more valences represented by L ⁵ is not particularly limited, but for example, carbon atom, silicon atom, nitrogen atom, p+q valence (where, in this case, p +q is an integer of 3 or more.) An aliphatic hydrocarbon ring, a p+q-valent aromatic hydrocarbon ring, or a p+q-valent heterocyclic ring. The number of carbons contained in the aliphatic hydrocarbon ring is preferably 3 to 15, more preferably 3 to 10, and still more preferably 5 to 10. The number of carbons contained in the aromatic hydrocarbon ring is preferably 6-18, more preferably 6-14, and even more preferably 6-10. As the above heterocyclic ring, a 5- to 7-membered ring having at least one nitrogen atom, oxygen atom or sulfur atom in the ring structure is preferred, and a 5- to 6-membered ring is more preferred.

Examples of the trivalent or higher linking group represented by L ⁵ include groups represented by the following formula (M1) to formula (M10). In addition, in the following formulas (M1) to (M11), L ³⁰¹ to L ³⁴³ each independently represent a single bond or a divalent linking group. The divalent linking group represented by L ³⁰¹ to L ³⁴³ is not particularly limited, but for example, the same as the divalent linking group represented by L ⁵ described above. R ^B represents a monovalent substituent. The monovalent substituent represented by R ^B is not particularly limited, but for example, those exemplified in the above-mentioned substituent group T may be mentioned. r represents an integer of 1-20, the integer of 1-3 is more preferable, and 1 or 2 is more preferable. * Indicates the connection position with Z or W mentioned above.

[Chemical Formula 17]

[Chemical Formula 18]

Z represents a monovalent substituent containing repeating units. As a monovalent substituent containing a repeating unit represented by Z, from the viewpoint that the substrate adhesion of the film is more excellent, a monovalent substituent containing a vinyl-based repeating unit and an ester-based repeating unit Monovalent substituents, monovalent substituents containing ether-based repeating units, monovalent substituents containing amine ester-based repeating units, or monovalent substituents containing amide-based repeating units, etc., but from the substrate of the film From the viewpoint of more excellent adhesion, a monovalent substituent containing a vinyl-based repeating unit is preferable, and it contains a repeating unit selected from monomers derived from (meth)acrylic acid, crotonic acid, and itaconic acid. From (meth)acrylate monomers (such as 2-(meth)acryl oxyethyl succinate, ω-carboxy-polycaprolactone (n≈2) monoacrylate and 2-methacrylic (Ethyl ethyl phthalate, etc.) repeating units and one or more types of monovalent substituents from the group of repeating units derived from (meth)acrylamide monomers are more preferred.

In addition, the compound represented by the general formula (D) may be in the form of an oligomer or a polymer. When the compound represented by the general formula (D) is an oligomer having a monovalent substituent including a repeating unit represented by Z, the number of repeating units included in Z is, for example, 3-20.

Hereinafter, specific examples of Compound X are shown, but the present invention is not limited thereto. In the following specific examples, a and b represent the number of each group, and a+b=6. In addition, * indicates a bonding position with any #.

[Chemical Formula 19]

[Chemical Formula 20]

[Chemical Formula 21]

[Chemical Formula 22]

[Chemical Formula 23]

[Chemical Formula 24]

[Chemical Formula 25]

[Chemical Formula 26]

[Chemical Formula 27]

[Chemical Formula 28]

[Chemical Formula 29]

[Chemical Formula 30]

In the above composition, Compound X may be used alone or in combination of two or more. In the above composition, the content of Compound X (total in the case of plural types) is usually 80.0% by mass or more relative to the total solid content of the composition, preferably 85.0% by mass or more, and 90.0% by mass The above is better. The upper limit is not particularly limited, and 99.9% by mass or less is more preferable, and 99.5% by mass or less is more preferable.

〔Solvent〕 The above composition contains a solvent. Examples of the solvent include ethyl cellosolve acetate, ethyl carbitol acetate, butyl carbitol acetate, ethylene glycol monomethyl ether acetate, and ethylene glycol monoacetate. Ethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monoethyl ether acetate, 3-methoxypropyl acetate, 3- Methoxybutyl acetate, methyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, propylene glycol diacetate, diethylene glycol mono Butyl ether acetate, γ-butyrolactone, ethyl acetate, butyl acetate, methyl lactate, ethyl lactate, cyclohexyl acetate and other esters; ethylene glycol monomethyl ether, ethylene glycol monoethyl ether , Ethylene glycol dimethyl ether, propylene glycol monomethyl ether (PGME), propylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, 3-methoxypropanol, 1-methoxy-2-propanol, Alcohols such as methoxymethoxyethanol, dipropylene glycol dimethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether and diethylene glycol diethyl ether ; Aromatic hydrocarbons such as benzene, xylene, ethylbenzene, toluene and anisole; aliphatic hydrocarbons such as cyclohexane; nitriles such as acetonitrile; acetone, methyl ethyl ketone, ethyl acetone, cyclohexanone Ketones such as 2-heptanone, cyclopentanone and diacetone alcohol; halogen compounds such as dichloroethane; ethers such as cyclohexyl methyl ether and dibutyl ether; 3-methoxy-N,N-dimethyl Acrylamide, N-ethyl-2-pyrrolidone, and 3-butoxy-N,N-dimethylpropylamide, and other amides; etc. In addition, the details of the above-mentioned solvent can be referred to the description of paragraph 0223 of International Publication No. WO2015/166779, and this content is incorporated in this specification. However, the aromatic hydrocarbons used as solvents may be reduced to be better for reasons such as environmental protection (for example, relative to the total amount of solvent, it can be set to 50 mass ppm (parts per million) or less). It can be set to 10 mass ppm or less, and can also be set to 1 mass ppm or less).

In the above composition, the above solvents may be used alone or in combination of two or more.

In the present invention, it is preferable to use a solvent with a small metal content, and the metal content of the solvent is, for example, 10 mass ppb (parts per billion) or less. A solvent with a quality ppt (parts per trillion) grade can also be used as needed. This high-purity solvent is provided by TOYO Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015).

Examples of methods for removing impurities such as metals from solvents include distillation (molecular distillation, thin film distillation, etc.) or filtration using a filter. The filter pore size of the filter used for filtration is preferably 10 nm or less, more preferably 5 nm or less, and further preferably 3 nm or less. The material of the filter is preferably Teflon, polyethylene or nylon.

The solvent may also contain isomers (compounds with the same number of atoms and different structures). In addition, the isomer may contain only one kind or plural kinds.

In the present invention, the content of the peroxide in the solvent is preferably 0.8 mmol/L or less, and it is more preferable to substantially exclude the peroxide.

Regarding the content of the solvent, the solid content concentration of the composition is preferably 1.0 to 90% by mass, the solid content concentration of the composition is preferably 1 to 50% by mass, and the solid content concentration of the composition is 5.0 to The amount of 30% by mass is more preferably, and the amount of 5.0 to 20% by mass is particularly preferable. In addition, the solid content concentration of the composition refers to the concentration of the total solid content relative to the total mass of the composition (that is, refers to the concentration of the film-forming component in the composition). In addition, the definition of the total solid content is as described above.

〔Other ingredients〕 The above composition may contain other components in addition to the above components. Examples of other components include curable compounds (including polymerizable compounds), polymerization initiators, antioxidants, silane coupling agents, polymerization inhibitors, surfactants, ultraviolet absorbers, fillers (such as inorganic particles), Various additives such as developability improvers such as hardening accelerators, plasticizers, low molecular weight organic carboxylic acids, and aggregation inhibitors.

<Hardening compound> It is preferable that the above composition contains a curable compound. As the curable compound, a known compound that can be cured by free radicals, acid, or heat can be used. For example, a compound having a group containing an ethylenic unsaturated bond, a compound having an epoxy group, and a compound having a reactive group such as a methylol group and a thiol group, etc. may be mentioned. Examples of the group having an ethylenically unsaturated bond include vinyl, (meth)allyl, (meth)acryloyl and (meth)acryloyloxy, etc., (meth)acryloyl. Or (meth)acryloyloxy is preferred. The curable compound-based polymerizable compound is preferred, and the radical polymerizable compound is more preferred. Examples of the polymerizable compound include compounds having an ethylenically unsaturated bond-containing group.

The content of the curable compound is preferably 1 to 80% by mass relative to the total solid content of the composition. The lower limit is more preferably 3% by mass or more, and further preferably 4% by mass or more. The upper limit is more preferably 70% by mass or less, further preferably 60% by mass or less, and particularly preferably 30% by mass or less. In the above composition, the curable compound may be one kind alone, or two or more kinds may be used in combination. When the said composition contains 2 or more types of curable compounds, it is preferable that the total content is in the said range.

・Compounds containing ethylenically unsaturated bonds (polymerizable compounds) In the present invention, as the curable compound, a compound having a group containing an ethylenically unsaturated bond (hereinafter also referred to as a polymerizable compound) can be used. Polymerizable compound-based monomers are preferred. The molecular weight of the polymerizable compound is preferably 100 to 3000. The upper limit is preferably 2000 or less, and 1500 or less. The lower limit is more preferably 150 or more, and more preferably 250 or more. The polymerizable compound is preferably a 3 to 15-functional (meth)acrylate compound, and more preferably a 3 to 6-functional (meth)acrylate compound.

As an example of the polymerizable compound, reference can be made to the description of paragraphs 0033 to 0034 of Japanese Patent Application Laid-Open No. 2013-253224, and this content is incorporated in this specification. As a polymerizable compound, ethyleneoxy-modified neopentaerythritol tetraacrylate (as a commercial product, NK ESTER ATM-35E; manufactured by Shin-Nakamura Chemical Co., Ltd.), dipentaerythritol triacrylate ( As a commercial product, KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (as a commercial product, KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), di Neopentaerythritol penta(meth)acrylate (as a commercial product, KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (as a commercial product, KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., A-DPH-12E; manufactured by Shin-Nakamura Chemical Co., Ltd.) and these (meth)acryloyl groups via ethylene glycol residues and/or propylene glycol residues The structure of the base bond is preferred. In addition, these oligomer types can also be used. In addition, the description of paragraphs 0034 to 0038 of JP-A-2013-253224 can be referred to, and this content is incorporated in this specification. In addition, polymerizable monomers and the like of paragraph 0477 of Japanese Patent Application Laid-Open No. 2012-208494 (corresponding to paragraph 0585 of the specification of US Patent Application Publication No. 2012/0235099) are incorporated in this specification. In addition, diglycerin EO (ethylene oxide) modified (meth)acrylate (as a commercial product, M-460; manufactured by TOAGOSEI CO., LTD.), neopentaerythritol tetraacrylate (Shin-Nakamura Chemical Co., Ltd., A-TMMT), 1,6-hexanediol diacrylate (Nippon Kayaku Co., Ltd., KAYARAD HDDA) are also preferred. These oligomer types can also be used. For example, RP-1040 (manufactured by Nippon Kayaku Co., Ltd.) and the like can be mentioned.

The polymerizable compound may have an acid group such as a carboxyl group, a sulfonic acid group, and a phosphoric acid group. Examples of the polymerizable compound having an acid group include esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids. It is preferable to react a non-aromatic carboxylic acid anhydride on an unreacted hydroxyl group of an aliphatic polyhydroxy compound to have a polymerizable compound having an acid group. Among the esters, the aliphatic polyhydroxy compound is neopentyl alcohol and/ Or dipentaerythritol. As a commercially available product, for example, polybasic acid-modified acrylic oligomers manufactured by TOAGOSEI CO., LTD. include ARONIX series M-305, M-510, and M-520. The acid value of the polymerizable compound having an acid group is preferably 0.1 to 40 mgKOH/g. The lower limit is preferably 5 mgKOH/g or more. The upper limit is preferably 30 mgKOH/g or less.

The polymerizable compound is a compound having a caprolactone structure and is also a preferred aspect. The polymerizable compound having a caprolactone structure is not particularly limited as long as it has a caprolactone structure in the molecule, but examples thereof include trimethylolethane, ditrimethylolethane, and trimethylol Polyvalent alcohols such as alkyl propane, ditrimethylolpropane, neopentaerythritol, dipentaerythritol, tripentaerythritol, glycerin, diglycerin, and trimethylolmelamine, and (meth)acrylic acid and ε -Ε-caprolactone modified polyfunctional (meth)acrylate obtained by esterification of caprolactone. As a polymerizable compound having a caprolactone structure, reference can be made to the description of paragraphs 0044 to 0045 of JP-A-2013-253224, and the contents are incorporated in this specification. Examples of the compound having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120 commercially available from Nippon Kayaku Co., Ltd. as KAYARAD DPCA series and manufactured by Sartomer Company, Inc. The 4-functional acrylate with 4 ethoxylated chains is SR-494 and the 3-functional acrylate with 3 isobutoxylated chains is TPA-330.

As the polymerizable compound, it is the amino acid described in Japanese Patent Laid-Open No. 48-041708, Japanese Patent Laid-Open No. 51-037193, Japanese Patent No. 2-032293 and Japanese Patent No. 2-016765 Ester acrylates, as well as those described in Japanese Patent Publication No. 58-049860, Japanese Patent Publication No. 56-017654, Japanese Patent Publication No. 62-039417 and Japanese Patent Publication No. 62-039418 The amine ester compounds of the skeleton are also preferred. In addition, those having an amine group structure and/or a sulfide structure in the molecule described in Japanese Patent Laid-Open No. 63-277653, Japanese Patent Laid-Open No. 63-260909, and Japanese Patent Laid-Open No. 1-105238 can be used. Additive polymerizable compounds. Examples of commercially available products include urethane oligomers UAS-10 and UAB-140 (manufactured by Sanyo Kokusaku Pulp Co., Ltd.), UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.) and UA-306H, UA-306T, UA-306I, AH-600, T-600, and AI-600 (manufactured by Kyoeisha chemical Co., Ltd.), etc.

・Compounds with epoxy groups As the curable compound, a compound having an epoxy group can also be used. Examples of the compound having an epoxy group include compounds having one or more epoxy groups in one molecule, and compounds having two or more epoxy groups in one molecule are preferred. It is preferable that the epoxy group has 1 to 100 in one molecule. The upper limit system can be set to 10 or less, for example, or 5 or less. The lower limit is preferably two or more.

Regarding the compound having an epoxy group, the epoxy equivalent weight (= molecular weight of the compound having an epoxy group/number of epoxy groups) is preferably 500 g/equivalent or less, and 100 to 400 g/equivalent is more preferable, 100 to 300 g/ The equivalent is further preferred.

The compound having an epoxy group may be a low-molecular compound (for example, a molecular weight of less than 1000) or a macromolecule (for example, in the case of a polymer with a molecular weight of 1,000 or more, the weight average molecular weight is 1,000 or more). The weight average molecular weight of the compound having an epoxy group is preferably 200 to 100,000, and more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and particularly preferably 3,000 or less.

A commercially available product can also be used for the compound having an epoxy group. For example, EHPE3150 (made by Daicel Chemical Industries Ltd.) and EPICLON N-695 (made by DIC CORPORATION CO., LTD.), etc. are mentioned. In addition, for compounds having an epoxy group, paragraphs 0034 to 0036 of Japanese Patent Laid-Open No. 2013-011869, paragraphs 0147 to 0156 of Japanese Patent Laid-Open No. 2014-043556 and 0085 of Japanese Patent Laid-Open No. 2014-089408 can also be used The compound described in paragraph 0092. These contents are incorporated into this manual.

<polymerization initiator> The above-mentioned composition may also contain a polymerization initiator, preferably a photopolymerization initiator. The photopolymerization initiator is not particularly limited, and can be appropriately selected from known photopolymerization initiators. For example, the photopolymerization initiator is preferably a compound having sensitivity to light from the ultraviolet region to the visible region.

Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, a compound having a three-well skeleton and a compound having an azodiazole skeleton, etc.), an acylphosphine compound such as an acylphosphine oxide, and a hexaaryl group. Oxime compounds such as biimidazole and oxime derivatives, organic peroxides, sulfur compounds, ketone compounds, aromatic onium salts, ketoxime ethers, aminoacetophenone compounds, hydroxyacetophenone, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is selected from the group consisting of trihalomethyl tri-well compounds, benzyl dimethyl ketal compounds, α-hydroxy ketone compounds, α-amino ketone compounds, acetylphosphine compounds, Phosphine oxide compounds, metallocene compounds, oxime compounds, triarylimidazole dimers, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halogens The compounds in the group consisting of methine oxadiazole compounds and 3-aryl-substituted coumarin compounds are preferred, and are selected from the group consisting of oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds and acetylphosphine The compounds in the group of compounds are better. From the viewpoint that the resulting film is more excellent, the oxime compound is more preferable. As the photopolymerization initiator, reference can be made to the descriptions of paragraphs 0065 to 0111 of Japanese Patent Laid-Open No. 2014-130173, and the contents are incorporated in this specification.

As the photopolymerization initiator, α-hydroxyketone compounds, α-aminoketone compounds, and acetylphosphine compounds can also be preferably used. For example, the α-aminoketone compound described in Japanese Patent Laid-Open No. 10-291969 and the acetylphosphine compound described in Japanese Patent No. 4225898 can also be used. Examples of commercially available α-hydroxyketone compounds include IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, and IRGACURE-127 (above, manufactured by BASF). Examples of commercially available products of α-aminoketone compounds include IRGACURE-907, IRGACURE-369, IRGACURE-379, and IRGACURE-379EG (above, manufactured by BASF). Examples of the commercially available products of the acetylphosphine compound include IRGACURE-819 and DAROCUR-TPO (above, manufactured by BASF) as commercially available products. Examples of commercially available products of oxime compounds include IRGACURE-OXE01, IRGACURE-OXE02, IRGACURE-OXE03, and IRGACURE-OXE04 (above, manufactured by BASF), TR-PBG-304 (Changzhou Tronly New Electronic Materials CO., LTD. Manufacturing), ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION), ADEKA ARKLS NCI-930 (manufactured by ADEKA CORPORATION), and ADEKA OPTOMER N-1919 (manufactured by ADEKA CORPORATION, JP 2012-014052) Starting agent 2) etc.

In the present invention, as the photopolymerization initiator, an oxime compound having a stilbene ring can also be used. As a specific example of the oxime compound having a stilbene ring, the compound described in Japanese Patent Laid-Open No. 2014-137466 can be mentioned. This content is incorporated into this manual.

In the present invention, as the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include the compounds described in Japanese Patent Laid-Open No. 2010-262028, the compounds 24, 36 to 40 described in Japanese Patent Laid-Open No. 2014-500852, and Japanese Patent Laid-Open The compound (C-3) described in 2013-164471, etc. These contents are incorporated into this manual.

In the present invention, an oxime compound having a nitro group can be used as a photopolymerization initiator. The oxime compound having a nitro group is preferably a dimer. As specific examples of the oxime compound having a nitro group, the compounds described in paragraphs 0031 to 0047 of JP-A-2013-114249, paragraphs 0008-0012 and JP-007-0079 of JP-A-2014-137466 can be cited. , The compound described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071 and ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION).

Specific examples of the oxime compound preferably used in the present invention are shown below, but the present invention is not limited to these.

[Chemical Formula 31]

[Chemical Formula 32]

The oxime compound is preferably a compound having a maximum absorption in the wavelength region of 350 to 500 nm, and more preferably a compound having a maximum absorption in the wavelength region of 360 to 480 nm. In addition, oxime compound-based compounds having high absorbance at 365 nm and 405 nm are preferred. From the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at 365 nm or 405 nm is preferably 1,000 to 300,000, more preferably 2,000 to 300,000, and further preferably 5,000 to 200,000. The molar absorption coefficient of a compound can be measured using a well-known method. For example, an ultraviolet-visible spectrophotometer (Cary-5 spectrophotometer manufactured by Varian) and an ethyl acetate solvent at a concentration of 0.01 g/L are preferred.

It is also preferable that the photopolymerization initiator includes an oxime compound and an α-aminoketone compound. By using the two together, the developability is improved, and it is easy to form a pattern with excellent rectangularity. When the oxime compound and the α-aminoketone compound are used in combination, it is preferably 50 to 600 parts by mass of the α-aminoketone compound relative to 100 parts by mass of the oxime compound, and more preferably 150 to 400 parts by mass.

The content of the photopolymerization initiator is preferably 0.1 to 50% by mass relative to the total solid content in the composition, more preferably 0.5 to 30% by mass, and even more preferably 1 to 20% by mass, and 1 to 10% by mass It is especially good. When the content of the photopolymerization initiator is within the above range, it is easy to form a pattern with more excellent sensitivity and excellent rectangularity. The above-mentioned composition may contain only one kind of photopolymerization initiator, or may contain two or more kinds. When the above composition contains two or more types of photopolymerization initiators, the total content is preferably within the above range.

(Antioxidants) The above composition may contain an antioxidant. Examples of antioxidants include phenol compounds, phosphite compounds, and thioether compounds. As the antioxidant, phenol compounds having a molecular weight of 500 or more, phosphite compounds having a molecular weight of 500 or more, or thioether compounds having a molecular weight of 500 or more are preferred. These can also be used by mixing 2 or more types. As the phenol compound, any phenol compound known as a phenol antioxidant can be used, and polysubstituted phenol compounds are preferred. Multi-substituted phenol compounds are roughly classified into three types with different substitution positions and structures (blocked type, semi-blocked type and low-blocked type). As the antioxidant, a compound having a phenol group and a phosphite group in the same molecule is preferably used. In addition, as the antioxidant, a phosphorus-based antioxidant is also preferably used. As the antioxidant, commercially available products can also be used. Examples of commercially available antioxidants include ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80 and ADK STAB AO-330 (ADEKA CORPORATION), etc. In addition, as an antioxidant, the description of paragraphs 0033 to 0043 of Japanese Patent Laid-Open No. 2014-032380 can be referred to, and this content is incorporated in this specification.

The content of the antioxidant is preferably 0.01 to 20% by mass relative to the total solid content in the composition, and more preferably 0.3 to 15% by mass. The antioxidant may be only one kind or two or more kinds. When the above-mentioned composition contains two or more kinds of antioxidants, the total content is preferably within the above range.

(Silane coupling agent) The above composition may also contain a silane coupling agent. In the present invention, the silane coupling agent refers to a silane compound having a hydrolyzable group and other functional groups. In addition, the hydrolyzable group refers to a substituent directly connected to a silicon atom and capable of generating a siloxane bond by at least any one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include halogen atoms, alkoxy groups, and alkoxy groups, and alkoxy groups are preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, functional groups other than hydrolyzable groups are groups that form interactions or bonds between resins and show affinity. For example, vinyl, styryl, (meth)acryloyl, mercapto, epoxy, oxetanyl, amine, urea, thioether, isocyanate and phenyl groups, etc. Radical) acrylamide or epoxy is preferred.

Specific examples of the silane coupling agent include 3-methacryloxypropylmethyldimethoxysilane and the like. In addition, examples of the silane coupling agent include the compounds described in paragraphs 0018 to 0036 of JP 2009-288703 and the compounds described in paragraphs 0056 to 0066 of JP 2009-242604, and these The contents are incorporated into this manual. A commercially available product can also be used for the silane coupling agent. Examples of commercially available products of silane coupling agents include KBM-13, KBM-22, KBM-103, KBE-13, KBE-22, KBE-103, and KBM-3033 manufactured by Shin-Etsu Chemical Co., Ltd. , KBE-3033, KBM-3063, KBM-3066, KBM-3086, KBE-3063, KBE-3083, KBM-3103, KBM-7103, SZ-31, KPN-3504, KBM-1003, KBE-1003, KBM -303, KBM-402, KBM-403, KBE-402, KBE-403, KBM-1403, KBM-502, KBM-503, KBE-502, KBE-503, KBM-5103, KBM-602, KBM-603 , KBM-903, KBE-903, KBE-9103, KBM-573, KBM-575, KBM-9659, KBE-585, KBM-802, KBM-803, KBE-846, KBE-9007, X-40-1053 , X-41-1059A, X-41-1056, X-41-1805, X-41-1818, X-41-1810, X-40-2651, X-40-2655A, KR-513, KC-89S , KR-500, KR-516, KR-517, X-40-9296, X-40-9225, X-40-9246, X-40-9250, KR-401N, X-40-9227, X-40 -9247, KR-510, KR-9218, KR-213, X-40-2308 and X-40-9238, etc.

The content of the silane coupling agent is preferably 0.01 to 15.0% by mass relative to the total solid content in the composition, and more preferably 0.05 to 10.0% by mass. The silane coupling agent may be only one kind or two or more kinds. When the said composition contains 2 or more types of silane coupling agents, it is preferable that the total content is in the said range.

<polymerization inhibitor> The above composition may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-third butyl-p-cresol, pyrogallol, tertiary butyl catechol, benzoquinone, and 4,4′-thio Bis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-tert-butylphenol) and N-nitrosophenylhydroxylamine salt (Ammonium salt and cerium salt, etc.). Among them, p-methoxyphenol is preferred. In addition, polymerization inhibitors sometimes function as antioxidants.

The content of the polymerization inhibitor is preferably 0.01 to 10 parts by mass relative to 100 parts by mass of the photopolymerization initiator, more preferably 0.01 to 8 parts by mass, and even more preferably 0.01 to 5 parts by mass.

<surfactant> From the viewpoint of further improving coating properties, the above-mentioned composition may contain various surfactants. As the surfactant, various surfactants such as a fluorine-based surfactant, a non-ionic surfactant, a cationic surfactant, an anionic surfactant, and a polysiloxane-based surfactant can be used. For the surfactant, refer to paragraphs 0238 to 0245 of International Publication No. WO2015/166779, and this content is incorporated in this specification.

When the above composition contains a fluorine-based surfactant, the liquid characteristics (particularly fluidity) at the time of preparation as a coating liquid are further improved, and the uniformity of coating thickness and liquid saving can be further improved. When a coating solution using a composition containing a fluorine-based surfactant is used for film formation, the interfacial tension between the coated surface and the coating liquid is reduced, and the wettability of the coated surface is improved. The coatability of the coated surface is improved. Therefore, film formation with a uniform thickness with a small thickness unevenness can be preferably performed.

The fluorine content in the fluorine-based surfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass. The fluorine-based surfactant having a fluorine content in this range is effective from the viewpoint of the uniformity of the thickness of the coating film and the liquid-saving property, and the solubility in the composition is also good.

Specific examples of the fluorine-based surfactants include the interface activities described in paragraphs 0060 to 0064 of Japanese Patent Application Laid-Open No. 2014-041318 (corresponding paragraphs 0060 to 0064 of International Publication No. 2014/017669), etc. The agent and the surfactant described in paragraphs 0117 to 0132 of Japanese Patent Laid-Open No. 2011-132503 are incorporated into this specification. Examples of commercially available products of fluorine-based surfactants include MEGAFACE F171, MEGAFACE F172, MEGAFACE F173, MEGAFACE F176, MEGAFACE F177, MEGAFACE F141, MEGAFACE F142, MEGAFACE F143, MEGAFACE F144, MEGAFACE R30, MEGAFACE F437, MEGAFACE F475 , MEGAFACE F479, MEGAFACE F482, MEGAFACE F554 and MEGAFACE F780 (above, manufactured by DIC Corporation Co., Ltd.), FLUORAD FC430, FLUORAD FC431, and FLUORAD FC171 (above, manufactured by Sumitomo 3M Limited), SURFLON S-382, SURFLON SC- 101, SURFLON SC-103, SURFLON SC-104, SURFLON SC-105, SURFLON SC-1068, SURFLON SC-381, SURFLON SC-383, SURFLON S-393 and SURFLON KH-40 (above, ASAHI GLASS CO., LTD .Manufactured) and PolyFox PF636, PF656, PF6320, PF6520 and PF7002 (above, manufactured by OMNOVA SOLUTIONS INC. Solutions Inc.), etc.

In addition, as the fluorine-based surfactant, an acrylic compound can be suitably used. The acrylic compound has a molecular structure of a functional group containing a fluorine atom, and when a heat is applied, the functional group containing a fluorine atom is partially cut and the fluorine atom volatilizes. Examples of such fluorine-based surfactants include MEGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily, February 22, 2016) (Nikkei Industry News, February 23, 2016), such as MEGAFACE DS-21 .

As the fluorine-based surfactant, a block polymer can also be used. For example, the compound described in Japanese Patent Laid-Open No. 2011-089090 can be mentioned. The fluorine-based surfactant can also preferably use a fluorine-containing polymer compound containing a repeating unit derived from a (meth)acrylate compound having a fluorine atom or derived from having 2 or more (preferably It is a repeating unit of (meth)acrylic acid ester compound of 5 or more) alkoxy groups (preferably ethoxy groups and propylene groups). The following compounds can also be exemplified as the fluorine-based surfactant used in the present invention.

[Chemical Formula 33]

The weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example, specifically 14,000. In the above compound,% representing the ratio of repeating units is mass%.

In addition, as the fluorine-based surfactant, a fluorine-containing polymer having an ethylenically unsaturated group on the side chain can also be used. Specific examples include compounds described in paragraphs 0050 to 0090 and paragraphs 0289 to 0295 of Japanese Patent Application Laid-Open No. 2010-164965, for example, MEGAFACE RS-101, RS-102, RS-718K and RS manufactured by DIC Corporation -72-K etc. As the fluorine-based surfactant, the compounds described in paragraphs 0015 to 0158 of JP-A-2015-117327 can also be used.

Examples of nonionic surfactants include glycerin, trimethylolpropane, trimethylolethane, and these ethoxylates and propoxylates (for example, glycerin propoxylates and glycerol ethoxylates). Chemical, etc.) etc. Also, polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether, polyethylene glycol Dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, PLURONIC L10, L31, L61, L62, 10R5, 17R2 and 25R2 (manufactured by BASF), TETRONIC 304, 701, 704, 901, 904 and 150R1 (manufactured by BASF), SOLSPERSE 20000 (manufactured by Lubrizol Japan Limited.), NCW-101, NCW-1001 and NCW-1002 (manufactured by Wako Pure Chemical Industries, Ltd.), PIONIN D-6112, D- 6112-W and D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.) and OLFINE E1010, SURFYNOL 104, 400 and 440 (manufactured by Nissin Chemical Co., Ltd.), etc.

In addition, as the fluorine-based surfactant, a vinyl ether polymerization type fluorine-based surfactant can also be used. Examples of the vinyl ether polymerization type fluorine-based surfactants include the surfactants described in the example column of Japanese Patent Application Laid-Open No. 2016-216602 (for example, fluorine-based surfactant (1)).

The content of the surfactant is preferably 0.0001 to 5.0% by mass relative to the total solid content in the composition, and more preferably 0.0005 to 3.0% by mass. The surfactant may be only one kind or two or more kinds. When the composition contains two or more surfactants, the total content is preferably within the above range.

<UV absorber> The above-mentioned composition may contain an ultraviolet absorber. Examples of the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, and hydroxyphenyl Mitsui compounds. For details of these, refer to paragraphs 0052-0072 of JP-A-2012-208374 and paragraphs 0317-0334 of JP-A-2013-68814. These contents are incorporated in this specification. Examples of commercially available products of conjugated diene compounds include UV-503 (manufactured by DAITO CHEMICAL CO., LTD.) and the like. As the benzotriazole compound, MYUA series manufactured by MIYOSHI OIL & FAT CO., LTD. (Chemical Industry Daily, February 1, 2016) can be used. The content of the ultraviolet absorber is preferably 0.1 to 10% by mass relative to the total solid content in the composition, more preferably 0.1 to 5% by mass, and even more preferably 0.1 to 3% by mass. In addition, the ultraviolet absorber may be only one kind, or two or more kinds. When the said composition contains 2 or more types of ultraviolet absorbers, it is preferable that the total content is in the said range.

<Filling material> Examples of the filling material include inorganic particles. As the inorganic particles, inorganic particles having a high refractive index, colorless, white or transparent are preferred, and titanium (Ti), zirconium (Zr), aluminum (Al), silicon (Si), zinc (Zn) or magnesium (Mg), etc. Oxide particles are preferred, and titanium dioxide (TiO ₂ ) particles, zirconium oxide (ZrO ₂ ) particles, or silicon dioxide (SiO ₂ ) particles are more preferred. The primary particle diameter of the inorganic particles is not particularly limited, and it is preferably 1 to 100 nm, more preferably 1 to 80 nm, and still more preferably 1 to 50 nm. If the primary particle diameter of the inorganic particles is within the above range, the dispersibility is more excellent and the refractive index and transmittance are further improved. The refractive index of the inorganic particles is not particularly limited, but from the viewpoint of obtaining a high refractive index, 1.75 to 2.70 is preferable, and 1.90 to 2.70 is more preferable. The specific surface area of the inorganic particles is not particularly limited, but 10 ~ 400m ² / g is preferred, 20 ~ 200m ² / g is more preferably, 30 ~ 150m ² / g is further preferred. In addition, the shape of the inorganic particles is not particularly limited, and examples thereof include rice grain shape, spherical shape, cubic shape, spindle shape, and indefinite shape. The inorganic particles may be particles that are surface-treated by organic compounds. Examples of the organic compound used for surface treatment include polyhydric alcohols, alkanolamines, stearic acid, silane coupling agents, and titanic acid coupling agents. Among them, stearic acid or silane coupling agents are preferred. In addition, from the viewpoint of further improving weather resistance, it is also preferable to cover the surface of the inorganic particles with oxides such as aluminum, silicon, and zirconium dioxide. As the inorganic particles, commercially available ones can be preferably used. In the above composition, one kind of inorganic particles may be used alone, or two or more kinds may be used in combination.

<hardening accelerator> When the above-mentioned composition has a compound containing a cationic polymerizable group (for example, a compound having an epoxy group) as the curable compound, it is preferable that the composition contain a curing accelerator. Examples of curing accelerators for increasing the curing rate include acid anhydrides, bases (aliphatic amines, aromatic amines, modified amines, etc.), acids (sulfonic acid, phosphoric acid, carboxylic acid, etc.), polythiols, and the like. Among them, acid anhydride is preferred, and aliphatic acid anhydride is further preferred.

[Method for preparing composition] The above composition can be prepared by mixing the aforementioned components. When preparing the composition, the components may be blended together, or the components may be gradually dissolved after being dissolved or dispersed in the solvent. For example, the composition can be prepared by simultaneously dissolving or dispersing the total components in the solvent. In addition, a component exhibiting particle properties is dispersed in a solvent and a resin to prepare a composition, and the obtained composition and other components (for example, compound X and a curable compound, etc.) may be mixed.

In the case where the above-mentioned composition contains a component exhibiting particle properties, in the preparation method of the composition, a process including dispersed particles is preferred. In the process of dispersing particles, as the mechanical force for dispersing particles, compression, pressing, impact, cutting, cavitation, etc. may be mentioned. Specific examples of such processes include bead milling, sand milling, roller milling, ball milling, paint mixing, microjet, high-speed impeller, sand mixing, jet mixing, high-pressure wet micronization, and ultrasonic dispersion. In addition, in the grinding of the particles in sand milling (bead milling), it is preferable to use microbeads with a small diameter and a high filling rate of the microbeads under the conditions for improving the grinding efficiency. In addition, it is preferable to remove coarse particles by filtration, centrifugal separation, etc. after the crushing treatment. In addition, as a process and a dispersing machine for dispersing particles, it is possible to use "Dispersion Technology Encyclopedia, JOHOKIKO CO., LTD. release, July 15, 2005" and "Suspension (solid/liquid dispersion system) as the center Practical comprehensive data set for the application of decentralized technology and industry, issued by the Publishing Department of the Management Development Center, October 10, 1978, and the process and decentralized machine described in paragraph 0022 of Japanese Patent Laid-Open No. 2015-157893. In addition, in the process of dispersing the particles, the particles can be finely processed in the salt milling step. For the raw materials, equipment, and processing conditions used in the salt milling step, for example, refer to the descriptions in Japanese Patent Laid-Open No. 2015-194521 and Japanese Patent Laid-Open No. 2012-046629.

Compared to the preparation of the above-mentioned composition, it is preferable to filter the composition with a filter for the purpose of removing foreign substances and reducing defects. As the filter, as long as it is a filter that has hitherto been used for filtering purposes, etc., it can be used without particular limitation. For example, fluorine resins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (for example, nylon-6 and nylon-6,6), and polyolefin resins such as polyethylene and polypropylene (PP) are used. (Including high-density and/or ultra-high molecular weight polyolefin resin) and other raw material filters. Among these raw materials, polypropylene (including high-density polypropylene) and nylon are preferred. The pore size of the filter is preferably about 0.01 to 7.0 μm, more preferably about 0.01 to 3.0 μm, and even more preferably about 0.05 to 0.5 μm. If the pore size of the filter is within the above range, fine foreign matter can be reliably removed. It is also preferable to use fibrous filter materials. Examples of fibrous filter materials include polypropylene fibers, nylon fibers, and glass fibers. Specifically, there are SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.) and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD.

When using filters, you can also combine different filters (for example, the first filter and the second filter, etc.). At this time, the filtration in each filter may be performed only once, or may be performed twice or more. In addition, filters with different pore sizes may be combined within the above range. The pore size can refer to the nominal value of the filter manufacturer. As a commercially available filter, for example, it is possible to select from various filters provided by NIHON PALL LTD. (DFA4201 NIEY, etc.), Advantec Toyo Kaisha, Ltd., Nihon Entegris K.K. (Formerly Nippon Mykrolis Corporation), and KITZ MICROFILTER CORPORATION. As the second filter, a filter made of the same raw materials as the first filter can be used. In addition, the filtration in the first filter is performed on the mixed liquid in which only the resin and the solvent are mixed, and after mixing other components, the filtration may be performed in the second filter.

<Use> The applications of the above-mentioned composition and the compound of the present invention (Compound X) are not particularly limited, but for example, as a high-refractive member of a solid-state imaging element (such as a microlens, a base layer and adjacent layers of a color filter, and a transparent film and color filter) White pixels of the camera, lenses) (lenses for spectacle lenses, digital cameras, Fresnel lenses, prism lenses, etc.), optical coating agents, hard coating agents, anti-reflection films, optical fibers, optical waveguides, LEDs (Light Emitting Diode (Light Emitting Diode) is useful for sealing materials, flattening materials for LEDs, and coating materials for solar cells.

[membrane] The film of the present invention contains the above-mentioned compound X. The aforementioned film can be formed using the aforementioned composition. Here, the above “film” refers to a cured film formed by curing a coating film (uncured film) and a coating film. That is, for example, when the above-mentioned film is formed using the above-mentioned composition, it may be a coating film of the above-mentioned composition, or a cured film formed by curing the coating film. In addition, when the curable compound is included in the composition, the cured film is obtained by subjecting the coating film formed of the composition to a curing treatment.

The refractive index (wavelength of 589 nm) of the above film is not particularly limited, but 1.55 or more is preferable, and 1.6 to 2.0 is more preferable. The light transmittance of the film is not particularly limited, but it is preferably 90% or more over the entire wavelength range of 400 to 700 nm, more preferably 95% or more, and further preferably 100%. The thickness of the film is not particularly limited, but 0.1-20 μm is preferable, 0.1-10 μm is more preferable, and 0.5-4 μm is more preferable.

The method of curing the above composition is not particularly limited, and examples thereof include heating and exposure. The device for heating is not particularly limited, and a blower dryer, oven, infrared dryer, heating roller, etc. can be used. The device used for exposure is not particularly limited, and mercury lamps, metal halide lamps, Xe lamps, chemical lamps, and carbon arc lamps can be used.

In the above film, Compound X may be used alone or in combination of two or more. In the above-mentioned film, the content of Compound X (the total amount when there are plural kinds) is usually 80.0% by mass or more relative to the film, preferably 85.0% by mass or more, and more preferably 90.0% by mass or more. The upper limit is not particularly limited, but it is preferably 99.9% by mass or less, and more preferably 99.5% by mass or less.

In addition, the film may contain other components in addition to the above components. Examples of other components include various types of binder components, antioxidants, surfactants, ultraviolet absorbers, fillers (such as inorganic particles), plasticizers, low molecular weight organic carboxylic acids, and other developing enhancers and aggregation inhibitors. additive.

[Manufacturing method of patterned cured film] Hereinafter, as an example of a method of manufacturing a cured film, a method of manufacturing a patterned cured film will be described in detail.

The method for manufacturing a patterned cured film includes the steps of applying the above-mentioned composition on a substrate to form a composition layer (coating film) (hereinafter, abbreviated as "composition layer formation step" as appropriate.); via a mask The step of exposing the above-mentioned composition layer (hereinafter, appropriately referred to as "exposure step"); and the step of developing the patterned cured film after developing the exposed composition layer (hereinafter, appropriately referred to as "development step"). ). In addition, the composition used in the above generally contains a polymerizable compound and a photopolymerization initiator.

Specifically, the above-mentioned composition is applied to the substrate directly or through another layer to form a composition layer (composition layer formation step), and only a portion of the composition layer irradiated with light is hardened by exposure through a predetermined mask pattern ( (Exposure step), developing with a developing solution (development step), whereby a patterned hardened film including pixels can be formed. Hereinafter, each step will be described.

・Composition layer formation steps In the composition layer forming step, the above composition is applied on the substrate to form a composition layer (coating film).

The substrate is not particularly limited, and examples thereof include alkali-free glass used in liquid crystal display devices, soda glass, PYREX (registered trademark) glass, quartz glass, and glass with a transparent conductive film attached thereto, and solid-state imaging devices. Such as photoelectric conversion element substrates (such as silicon substrates, etc.), CCD (Charge Coupled Device, charge coupled device) substrates and CMOS (Complementary Metal Oxide Semiconductor, complementary metal oxide semiconductor) substrates, etc.

As a method of applying the above-mentioned composition on the substrate, various coating methods such as slit coating, inkjet method, spin coating, cast coating, roll coating, or screen printing method can be applied.

The coating film thickness of the composition can be appropriately selected according to the application, but it is, for example, 0.1 to 20 μm, more preferably 0.1 to 10 μm, and further preferably 0.5 to 4 μm.

The composition applied to the substrate is usually dried at 70 to 110° C. for about 2 to 4 minutes. Thus, a composition layer can be formed.

・Exposure step In the exposure step, the composition layer (coating film) formed in the composition layer forming step is exposed through a mask, and the portion of the coating film irradiated with light is cured. The exposure is preferably performed by irradiation with actinic rays or radiation, and in particular, ultraviolet rays such as g rays, h rays, or i rays are more preferable. The irradiation intensity is preferably 5 to 1500 mJ/cm ^{2, and more} preferably 10 to 1000 mJ/cm ² .

・Development steps After the exposure step, an alkaline development process (development step) is performed, and the unirradiated portion of the exposure step is dissolved in the alkaline aqueous solution. Thus, only the photohardened portion (the portion of the coating film irradiated with light) remains. As the developer, an organic alkaline developer that does not cause damage to the circuit of the substrate or the like is desired. The development temperature is usually 20 to 30°C, and the development time is 20 to 90 seconds.

Examples of the alkaline aqueous solution include inorganic developers and organic developers. Examples of the inorganic developer include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate or sodium methylsilicate dissolved to a concentration of 0.001 to 10% by mass, preferably 0.01 to 1% by mass of alkaline aqueous solution. Examples of the organic developer include ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide (TMAH), tetraethylammonium hydroxide, choline, pyrrole, piperidine or 1 , 8-Diacbicyclo-[5.4.0]-7-undecene and other basic compounds are dissolved into an alkaline aqueous solution with a concentration of 0.001 to 10% by mass, preferably 0.01 to 1% by mass. An appropriate amount of water-soluble organic solvent such as methanol or ethanol and/or surfactant can also be added to the alkaline aqueous solution. In addition, in the case of using a developer solution containing such an alkaline aqueous solution, it is usually washed (rinsed) with pure water after development.

As the development method, for example, a spin-on immersion development method or a shower development method can be used.

[lens] The film of the present invention (preferably a cured film) can also be used as a lens. As the lens, among them, a microlens for the solid-state imaging element described above can be suitably used.

[Solid image sensor] The film of the present invention (preferably a cured film) can be suitably applied to a solid-state imaging element. As the structure of the solid-state imaging element of the present invention, for example, the following structure may be mentioned: a plurality of photodiodes including a light-receiving region constituting the solid-state imaging element (CCD image sensor, CMOS image sensor, etc.) on the substrate And polysilicon and other light-receiving elements, and the undercoating film of the film of the present invention is provided under the color filter. [Example]

Hereinafter, the present invention will be described in detail based on examples. The materials, usage amounts, ratios, processing contents, processing steps, etc. shown in the following examples can be appropriately changed without departing from the gist of the present invention. Therefore, the scope of the present invention is not limitedly interpreted by the embodiments shown below.

[Synthesis Example] <Synthesis Example 1: Synthesis of Compound (A-1)> [Chemical Formula 34]

A mixed solution of 24.0 parts by mass of compound (IM-1), 200 parts by mass of dichloromethane, 0.52 parts by mass of tetrabutylammonium bromide, 28 parts by mass of potassium hydroxide, and 22.1 parts by mass of potassium carbonate was heated at 50°C. 8 hour. After cooling, the solid was removed by filtration, and the filtrate was washed twice with 25 parts by mass of water. The obtained organic solution was concentrated with an evaporator, 120 parts by mass of ethanol was added, and stirred at room temperature for 1 hour. The precipitated solid was collected by filtration, and 17.5 parts by mass of compound (A-1) was obtained by drying.

<Synthesis Example 2: Synthesis of Compound (A-2)> [Chemical Formula 35]

At 80°C, 24.0 parts by mass of compound (IM-1), 23.6 parts by mass of compound (IM-2), 200 parts by mass of toluene, 0.52 parts by mass of tetrabutylammonium bromide, and 56 parts by mass of 50% by mass potassium hydroxide solution The mixed solution was heated for 8 hours. After cooling, the organic layer was washed twice with 50 parts by mass of water. The obtained organic solution was concentrated with an evaporator, 120 parts by mass of ethanol was added, and stirred at room temperature for 1 hour. The precipitated solid was collected by filtration, and 29.3 parts by mass of compound (A-2) was obtained by drying.

<Synthesis Examples 3-17: Synthesis of Compounds (A-3) to (A-17)> Except that the compound (IM-1) of Synthesis Example 1 was changed to each raw material corresponding to the compounds (A-3) to (A-17), the same operation as in Synthesis Example 1 was carried out to obtain the compound (A -3) ~ (A-17).

The structures of compounds (A-1) to (A-17) are shown below.

[Chemical Formula 36]

<Synthesis Examples 18 to 26: Synthesis of Compounds (A-18) to (A-26)> Except that the compound (IM-1) and compound (IM-2) of Synthesis Example 2 were changed to the respective raw materials corresponding to the compounds (A-18) to (A-26), the same operations as those of Synthesis Example 2 were carried out. To obtain compounds (A-18) to (A-26). In addition, compound (IM-2) was used in Synthesis Example 18, Synthesis Example 25, and Synthesis Example 26, Compound (IM-3) was used in Synthesis Example 19 and Synthesis Example 24, and Compound (IM was used in Synthesis Example 20 and Synthesis Example 23 -4), Synthesis Example 21 uses (IM-5), Synthesis Example 22 uses (IM-6).

The structures of the compounds (IM-2) to (IM-6) used when synthesizing the compounds (A-18) to (A-26) and the compounds (A-18) to (A-26) are shown below.

[Chemical Formula 37]

[Chemical Formula 38]

<Synthesis Example 27: Synthesis of Compound (J-1)> [Chemical Formula 39]

Under a nitrogen stream, a mixed liquid composed of 5.0 parts by mass of compound (A-1) and 45 parts by mass of cyclohexanone was heated to 110°C. Next, 0.1 parts by mass of 2,2'-azobis(N-butyl-2-methylpropylamide) was added and heated for 2 hours. Furthermore, 0.1 part by mass of 2,2'-azobis(N-butyl-2-methylpropionamide) was added, and after heating for 2 hours, it was cooled to room temperature. This solution was added to 200 parts by mass of methanol, the solid was collected by filtration, and 4.9 parts by mass of compound (J-1) was obtained by drying.

<Synthesis Examples 28 to 54: Synthesis of Compounds (J-2) to (J-28)> Except for using the polymerized monomers and comonomers described in Table 1 below, the same operations as those in Synthesis Example 27 were carried out to obtain compound (J-2) to compound (J-28 ). In the table, "ARONIX M5300" is an acrylic monomer manufactured by TOAGOSEI CO., LTD.

The following Table 1 shows the composition of the compounds (J-1) to (J-28) and the weight average molecular weight (polystyrene conversion value) measured by GPC.

[Table 1] Table 1

<Synthesis Example 55: Synthesis of Compound (A-27)> [Chemical Formula 40]

24.0 parts by mass of the compound (IM-1) was dissolved in 200 parts by mass of tetrahydrofuran, and cooled to 0°C. Next, 4.8 parts by mass (50% by mass) of sodium hydride was added in portions and stirred for 3 hours. 10.2 parts by mass of butane sultone was added, and heated at an external temperature of 70°C for 24 hours. After cooling, the precipitated solid was collected by filtration and washed with acetone, and then 18.5 parts by mass of compound (A-27) was obtained by drying.

<Synthesis Examples 56, 57: Synthesis of Compounds (A-28) and (A-29)> Except that the compound (IM-1) of Synthesis Example 55 was changed to the raw materials corresponding to Compounds (A-28) and (A-29), the same operations as those of Synthesis Example 55 were carried out to obtain Compound (A- 28) and compound (A-29).

The structures of compound (A-28) and compound (A-29) are shown below.

[Chemical Formula 41]

<Synthesis Example 58: Synthesis of Compound (J-29)> [Chemical Formula 42]

Under a nitrogen stream, 26 parts by mass of methacryloyl chloride (80% by mass aqueous solution), 20 parts by mass of 2-ethylhexyl methacrylate, and 360 parts by mass of isopropyl alcohol were heated at an external temperature of 85°C. Next, 1 part by mass of 2,2'-azobis(2-methylpropionic acid methyl ester) was added and heated for 2 hours. Furthermore, 1 mass part of 2,2'-azobis (2-methyl propionic acid methyl ester) was added, and it heated for 2 hours. After cooling to 50°C, 48 parts by mass of compound (A-27) and 360 parts by mass of isopropyl alcohol were added, and the mixture was stirred for 3 hours. After cooling to room temperature, the resulting reaction liquid was added to 1000 parts by mass of water, the solid was filtered, and 65 parts by mass of compound (J-29) was obtained by drying. The weight average molecular weight is 7800.

<Synthesis Example 59 and Synthesis Example 60: Synthesis of Compound (J-30) and Compound (J-31)> The compound (A-27) of Synthesis Example 58 was changed to the compound (A-28) and the compound (A-29), and otherwise the same operation was carried out to obtain the compound (J-30) (weight average molecular weight 6900 ) And compound (J-31) (weight average molecular weight 7500).

<Synthesis Example 61: Synthesis of Compound (J-32)> [Chemical Formula 43]

At an external temperature of 130° C., a mixed solution of 56.0 parts by mass of compound (A-30), 21.8 parts by mass of pyromellitic anhydride, and 145.8 parts by mass of N-methylpyrrolidone was heated for 48 hours. After cooling, 1000 mass parts of 3.5 mass% hydrochloric acid aqueous solution was added, the solid was filtered, and after washing with water, 59.2 parts by mass (weight average molecular weight 7300) of compound (J-32) was obtained by drying.

<Synthesis Example 62: Synthesis of Compound (J-33)> [Chemical Formula 44]

58.8 parts by mass of compound (A-31), 46.2 parts by mass of 9,9-bis(4-glycidoxyphenyl) stilbene, 420 parts by mass of N-methylpyrrolidone, and tetrabutylammonium bromide 1.0 The mass part of the mixed solution was heated to 120°C and heated and stirred for 48 hours. After cooling, 2000 mass parts of 3.5 mass% hydrochloric acid aqueous solution was added, the solid was filtered, and after washing with water, 97.9 mass parts (weight average molecular weight 12,300) of compound (J-33) was obtained by drying.

<Synthesis Example 63 and Synthesis Example 64: Synthesis of Compound (A-32) and Compound (A-33)> The compound (IM-1) of Synthesis Example 2 was changed to each raw material corresponding to the compound (A-32) and the compound (A-33), and the compound (IM-2) was changed to allyl bromide and 2-bromo Except for ethanol, the same operation as in Synthesis Example 2 was carried out to obtain compound (A-32) and compound (A-33).

[Chemical Formula 45]

<Synthesis Example 65: Synthesis of Compound (J-34)> [Chemical Formula 46]

Under a nitrogen flow, 7.8 parts by mass of dipentaerythritol hexa(3-mercaptopropionate), 20.4 parts by mass of compound (A-32), and 180 parts by mass of cyclohexanone were heated to 140°C. Next, 0.1 parts by mass of 2,2'-azobis(N-butyl-2-methylpropionamide) was added and stirred for 2 hours. Furthermore, 0.12 parts by mass of 2,2'-azobis(N-butyl-2-methylpropylamide) was added and heated for 4 hours. After cooling to room temperature, 2,000 parts by mass of hexane was added, the solid was filtered, and 24.5 parts by mass of compound (J-34) was obtained by drying. In the compound, * is the bonding position with any #, and a:b=2:4. In addition, a and b represent the number of each group.

<Synthesis Example 66: Synthesis of Compound (J-35)> Except that 30.6 parts by mass of the compound (A-32) of Synthesis Example 61 was used, the same operation was carried out to obtain the compound (J-35) (a:b=0:6).

<Synthesis Example 67: Synthesis of Compound (J-36)> [Chemical Formula 47]

14.2 parts by mass of compound (J-34), 0.8 parts by mass of methacrylic acid, 5.0 parts by mass of methyl methacrylate, and 128 parts by mass of cyclohexanone were added, and heated to 120°C. 0.1 parts by mass of 2,2'-azobis(N-butyl-2-methylpropionamide) was added and stirred for 2 hours. Furthermore, 0.12 parts by mass of 2,2'-azobis(N-butyl-2-methylpropylamide) was added, and after stirring for 4 hours, it was allowed to cool. The resulting solution was added to a mixed solution of 300 parts by mass of water and 700 parts by mass of methanol. The solid was filtered, and 18.3 parts by mass (weight average molecular weight 4,500, acid value 0.62 mmol/g) of compound (J-36) was obtained by drying.

<Synthesis Example 68: Synthesis of Compound (J-37)> [Chemical Formula 48]

A mixed solution of 51.6 parts by mass of compound (A-33), 10.9 parts by mass of pyromellitic anhydride, and 145.8 parts by mass of N-methylpyrrolidone was heated at an external temperature of 130° C. for 48 hours. After cooling, 1000 parts by mass of 3.5% by mass hydrochloric acid aqueous solution was added, the solid was filtered and washed with water, and then 60.0 parts by mass of compound (J-37) was obtained by drying.

<Synthesis for Comparative Examples: Synthesis of Compound (H-1) and Compound (H-2)> The same operation as in Synthesis Example 27 was carried out to obtain compound (H-1) (weight average molecular weight: 7,300) and compound (H-2) (weight average molecular weight: 8,900).

[Chemical Formula 49]

[Examples 1 to 48, Comparative Examples 1 to 4] <Preparation of Compositions 1 to 48 and Comparative Compositions 1 to 4> Each component was dissolved and mixed at the blending ratio described in Table 2 and filtered through a filter made of polytetrafluoroethylene with a diameter of 0.2 μm to prepare compositions 1 to 48 and comparative compositions 1 to 4, respectively. The solvent is a mixed solvent of cyclohexanone/γ butyrolactone=50:50 (mass %), and the surfactant is MEGAFACE R-40 (manufactured by DIC CORPORATION). Using the obtained compositions 1 to 48 and comparative compositions 1 to 4 as examples 1 to 48 and comparative examples 1 to 4, various evaluations described below (transparency evaluation after heat resistance test, refractive index evaluation, and appearance characteristics) were carried out Evaluation).

The polymerizable compounds (M-1 to M-4) and polymerization initiators (I-1 or I-2) used in Table 2 are shown below. [Chemical Formula 50]

[Chemical Formula 51]

The second table is shown below. In addition, in the remarks column of the table, "Structure of Compound X" means a compound containing a repeating unit represented by the general formula (A), a compound containing a repeating unit represented by the general formula (B), and a compound containing the general formula ( C) The structure of the compound represented by the repeating unit and the compound represented by the general formula (D) corresponds to compound X. Also, "C ¹ of the type" denotes the group and heterocyclic group C ¹ Suo quite a group represented by the general formula of (II).

[table 2-1]

[Table 2-2]

[Table 2-3]

[Table 2-4]

[Evaluation of composition] Regarding each composition of Examples and Comparative Examples, transparency, refractive index, and appearance characteristics (film surface characteristics) were evaluated.

<Transparency evaluation after heat resistance test> After spin coating each composition of Examples and Comparative Examples on a glass substrate of 10 cm×10 cm in which an epoxy resin layer was formed using epoxy resin (JER-827, manufactured by Japan Epoxy Resins Co., Ltd.), after The obtained composition layer was baked (heated) at 100° C. for 3 minutes, and then baked at 260° C. for 5 minutes, thereby obtaining a film with a thickness of 3 μm. U-4150 (manufactured by Hitachi High-Technologies Corporation) was used to measure the transmittance at a wavelength of 400 to 800 nm of the glass substrate having the above film, and the evaluation was carried out by the following evaluation criteria. The results are shown in Table 3. In addition, as a reference sample, a glass substrate having an epoxy resin layer with the same conditions was used except that no film was formed.

(Evaluation criteria) "A": The minimum transmittance of 400 to 800 nm is 99% or more. "B": The minimum transmittance of 400 to 800 nm is 98% or more and less than 99%. "C": The minimum transmittance of 400 to 800 nm is 95% or more and less than 98%. "D": The minimum transmittance from 400 to 800 nm is less than 95%.

<Refractive Index Evaluation> For the film obtained in the above transparency evaluation, using VASE manufactured by JA Woollam Co., Inc., the refractive index at a wavelength of 300 to 1500 nm was measured, and the refractive index n _{589 nm at} a wavelength of 589 nm was obtained. Based on the measured refractive index (n _{589 nm} ), the evaluation was carried out by the following evaluation criteria. The results are shown in Table 3. (Evaluation criteria) "A": Refractive index (n _{589 nm} ) is 1.75 or more. "B": The refractive index (n _589nm ) is 1.70 or more and less than 1.75. "C": refractive index (n _589nm ) is 1.65 or more and less than 1.70. "D": The refractive index (n _589nm ) is less than 1.65.

<Appearance characteristics evaluation (film surface evaluation)> The film obtained in the above-mentioned transparency evaluation was observed with an optical microscope, and the evaluation was performed according to the following evaluation criteria. The results are shown in Table 3. (Evaluation criteria) "A": The film surface is smooth. "B": Some minor cracks were found on the film surface, but there was no problem in practical use. "C": Some large cracks were found on the film surface, but there was no problem in practical use. "D": Cracks were found on the film surface, which was a practically problematic grade.

[Table 3-1]

[Table 3-2]

<Evaluation of adhesion (substrate adhesion)> Using Compositions 36 to 44, Composition 47, Composition 48, Comparative Composition 3 and Comparative Composition 4 as Examples 49 to 59, Comparative Example 5 and Comparative Example 6, substrate adhesion was carried out by the following steps (Adhesion of the film to the substrate).

The composition 36-44, the composition 47, the composition 48, the comparative composition 3, and the comparative composition 4 were coated with epoxy resin (JER-827, Japan Epoxy Resins Co. , Ltd.) to form a 10 cm × 10 cm glass substrate of epoxy resin layer, irradiated with 1000 mJ/cm ² using a high-pressure mercury lamp. Next, 10×10 squares were made at an interval of 1.0 mm, and a transparent tape was attached and stretched upward to confirm the peeling status. Count the undivided squares. It is evaluated that the more the number of remaining squares, the better the substrate adhesion. The results are shown in Table 4.

(Evaluation criteria) "A": 100 squares left "B": 96-99 residual squares "C": 91~95 residual squares "D": The remaining squares are less than 90

[Table 4]

From the results of Tables 3 and 4, it is clear that the composition according to the present invention can form a film that exhibits high refractive index and high transparency and is also excellent in appearance characteristics. In addition, it is clear that the film obtained by the composition of the present invention is also excellent in substrate adhesion. Furthermore, from the results of Examples 1 to 48, it was confirmed that compound X is a compound containing a repeating unit represented by general formula (A), a compound containing a repeating unit represented by general formula (C), or represented by general formula (D) In the case of a compound (preferably a compound containing a repeating unit represented by the general formula (A) or a compound represented by the general formula (D)), the appearance characteristics of the obtained film are more excellent.

Furthermore, from the results of Examples 49 to 57, it was confirmed that compound X is a compound containing a repeating unit represented by general formula (A), a compound containing a repeating unit represented by general formula (C), or represented by general formula (D) In the case of a compound (preferably a compound containing a repeating unit represented by the general formula (A) or a compound represented by the general formula (D)), the resulting film has more excellent substrate adhesion.

Furthermore, from the results of Examples 1 to 48, it was confirmed that the compound represented by the general formula (I) among the residues formed by removing one or more hydrogen atoms from the compound represented by the general formula (I) in the compound X M ^{1 in} is 2 to 4 (in other words, 2 to 4 groups represented by -B ¹ -C ^{1 in} the compound represented by the general formula (I)) and more than ¹ of C ¹ represents the general formula (III) The group represented (in other words, one or more of C ¹ represents a group represented by the general formula (II) and D ¹ in the above general formula (II) represents a phenyl group or biphenyl group which may have a substituent , N ¹ represents an integer of 1 to 4) or one or more of C ¹ represents a group represented by the general formula (IV) (in other words, one or more of C ¹ represents a group represented by the general formula (II) and the above In the case where D ¹ in the general formula (II) represents a cyano group or -SR ¹¹ , and n ¹ represents an integer of 1 to 4, the refractive index of the obtained film is more excellent. Also, it was confirmed that in the residue formed by removing one or more hydrogen atoms from the compound represented by the general formula (I) in the compound X, A ^{1 in} the compound represented by the general formula (I) is a single bond Next, the resulting film also showed high transparency after heating.

On the other hand, when the composition of the comparative example is used, the resulting film does not satisfy any desired requirements of refractive index, transparency, and appearance characteristics. Also, it does not meet any desired requirements for substrate adhesion.

Claims (20)

A composition comprising: Compound X, having a plurality of residues formed by removing one or more hydrogen atoms from a compound represented by the following general formula (I); and a solvent,

In the general formula (I), A ¹ represents a single bond, -O-, -S-, -SO ₂ -or -CO-, and B ¹ represents a single bond, -CO-, -S-, -O-, -SO ₂ -or -NH-, C ¹ represents a group or heterocyclic group represented by the following general formula (II), R ¹ represents a hydrogen atom or an alkyl group that may contain a hetero atom, and m ¹ represents an integer of 1 to 4, Further, the general formula (I), B ¹ the presence of a plurality, the plurality of B ¹ s may be the same or different also, and, C ¹ the presence of a plurality of, three C ¹ complex also may be the same or different ,

In the general formula (II), D ¹ represents a monovalent substituent, n ¹ represents an integer of 0 to 4, * represents the position of attachment to B ¹ in the general formula (I), and in the general formula (II), D ¹ in the presence of a plurality of cases, a plurality of D ¹ may be the same can also be different, and, a plurality of D ¹ from each other may be mutually bonded to form a ring, wherein, R ¹ represents a hydrogen atom and removing represented of which R ¹ When a hydrogen atom forms the aforementioned residue, the aforementioned residue is not linked to the aromatic hydrocarbon ring. The composition as described in item 1 of the scope of patent application, wherein A ¹ represents a single bond. The composition as described in item 1 or item 2 of the patent application scope, wherein m ¹ represents an integer of 2 to 4. The composition as described in item 1 or item 2 of the patent application scope, wherein one or more of C ¹ in the aforementioned general formula (I) is selected from the group including the group represented by the following general formula (III) and The group in the group of groups represented by the following general formula (IV),

In the general formula (III), D ² and E ¹ each independently represent a monovalent substituent, n ² represents an integer of 1-4, n ³ represents an integer of 0-5, n ⁴ represents an integer of 0-3, wherein , N ² +n ⁴ is an integer of 1 to 4, * represents the connection position with B ¹ in the general formula (I), and in the general formula (III), when there are plural D ² , plural D ² may be the same can also be different, and, a plurality of D ² to each other may be bonded to each other to form a ring, and, E ¹ the presence of a plurality, the plurality of E ¹ may be the same can also be different, and, a plurality of E ¹ can be bonded to each other to form a ring,

In the general formula (IV), D ³ represents a cyano group or -SR ¹¹ , E ² represents a monovalent substituent, n ⁵ represents an integer of 1 to 4, n ⁶ represents an integer of 0 to 3, where n ⁵ +n ⁶ is an integer of 1 to 4, * represents the position of attachment to B ¹ in the general formula (I), R ¹¹ represents a C 1-15 alkyl group or a C 6-20 aryl group which may have a substituent, Further, the general formula (IV), D ³ of the case where there is a plurality, a plurality of D ³ also may be the same or different, and, a plurality of D ³ may be mutually bonded to each other to form a ring, and, E ² complex exists In this case, the plurality of E ² may be the same or different, and the plurality of E ² may be bonded to each other to form a ring. The composition according to item 4 of the patent application scope, wherein m ¹ represents an integer of 2 to 4, and 2 or more of C ¹ in the general formula (I) are selected from the group consisting of the general formula (III) The group represented by and the group selected from the group represented by the aforementioned general formula (IV). The composition as described in item 1 or item 2 of the scope of patent application also contains a polymerizable compound. The composition as described in item 1 or item 2 of the scope of patent application further includes a polymerization initiator. The composition as described in item 1 or item 2 of the scope of patent application, wherein the aforementioned compound X is selected from compounds including a repeating unit represented by the following general formula (A), and includes a compound represented by the following general formula (B) One or more of the compounds represented by the repeating unit, the compound containing the repeating unit represented by the following general formula (C) and the compound represented by the following general formula (D),

In the general formula (A), X ¹ represents a linking group formed by polymerization, L ¹ represents a single bond or a divalent linking group, and W represents a compound formed by removing one hydrogen atom from the compound represented by the foregoing general formula (I) Residues,

In the general formula (B), X ² represents a linking group formed by polymerization, L ² represents a single bond or a divalent linking group, Y ² represents an ionic structural site, and W represents from the above-mentioned formula (I) The residue formed by removing 1 hydrogen atom from the compound,

In the general formula (C), L ³ represents a divalent linking group, L ⁴ represents a single bond or a divalent linking group, and W represents a residue formed by removing 2 hydrogen atoms from the compound represented by the aforementioned general formula (I) base,

In the general formula (D), L ⁵ represents a p+q-valent linking group, W represents a residue formed by removing one hydrogen atom from the compound represented by the aforementioned general formula (I), and Z represents a monovalent including a repeating unit , P represents an integer of 0 to 100, and q represents an integer of 2 to 100. The composition as described in item 8 of the patent application scope, in which The aforementioned compound X is one or more kinds selected from the group consisting of a compound including a repeating unit represented by the aforementioned general formula (A) and a compound represented by the aforementioned general formula (D). A film comprising a compound X having a plurality of residues formed by removing one or more hydrogen atoms from a compound represented by the following general formula (I),

In the general formula (I), A ¹ represents a single bond, -O-, -S-, -SO ₂ -or -CO-, and B ¹ represents a single bond, -CO-, -S-, -O-, -SO ₂ -or -NH-, C ¹ represents a group or heterocyclic group represented by the following general formula (II), R ¹ represents a hydrogen atom or an alkyl group that may contain a hetero atom, and m ¹ represents an integer of 1 to 4, Further, the general formula (I), B ¹ the presence of a plurality, the plurality of B ¹ s may be the same or different also, and, C ¹ the presence of a plurality of, three C ¹ complex also may be the same or different ,

In the general formula (II), D ¹ represents a monovalent substituent, n ¹ represents an integer of 0 to 4, * represents the position of attachment to B ¹ in the general formula (I), and in the general formula (II), D ¹ in the presence of a plurality of cases, a plurality of D ¹ may be the same can also be different, and, a plurality of D ¹ from each other may be mutually bonded to form a ring, wherein, R ¹ represents a hydrogen atom and removing represented of which R ¹ When a hydrogen atom forms the aforementioned residue, the aforementioned residue is not linked to the aromatic hydrocarbon ring. The film as described in item 10 of the patent application scope, wherein the aforementioned A ¹ represents a single bond. The film according to item 10 or item 11 of the patent application scope, wherein m ¹ represents an integer of 2 to 4. The film as described in item 10 or item 11 of the patent application scope, wherein one or more of C ¹ in the aforementioned general formula (I) is selected from the group including the group represented by the following general formula (III) and Groups in the group of groups represented by the following general formula (IV),

In the general formula (III), D ² and E ¹ each independently represent a monovalent substituent, n ² represents an integer of 1-4, n ³ represents an integer of 0-5, n ⁴ represents an integer of 0-3, wherein , N ² +n ⁴ is an integer of 1 to 4, * represents the connection position with B ¹ in the general formula (I), and in the general formula (III), when there are plural D ² , plural D ² may be the same can also be different, and, a plurality of D ² to each other may be bonded to each other to form a ring, and, E ¹ the presence of a plurality, the plurality of E ¹ may be the same can also be different, and, a plurality of E ¹ can be bonded to each other to form a ring,

In the general formula (IV), D ³ represents a cyano group or -SR ¹¹ , E ² represents a monovalent substituent, n ⁵ represents an integer of 1 to 4, n ⁶ represents an integer of 0 to 3, where n ⁵ +n ⁶ is an integer of 1 to 4, * represents the position of attachment to B ¹ in the general formula (I), R ¹¹ represents a C 1-15 alkyl group or a C 6-20 aryl group which may have a substituent, Further, the general formula (IV), D ³ of the case where there is a plurality, a plurality of D ³ also may be the same or different, and, a plurality of D ³ may be mutually bonded to each other to form a ring, and, E ² complex exists In this case, the plurality of E ² may be the same or different, and the plurality of E ² may be bonded to each other to form a ring. The film according to item 13 of the patent application range, wherein m ¹ represents an integer of 2 to 4, and two or more of C ¹ in the general formula (I) are selected from the group consisting of the general formula (III) Group and the group in the group represented by the aforementioned general formula (IV). The film according to item 10 or item 11 of the patent application scope, which is selected from the group consisting of a compound including a repeating unit represented by the aforementioned general formula (A) and a compound represented by the aforementioned general formula (D) More than one kind,

In the general formula (A), X ¹ represents a linking group formed by polymerization, L ¹ represents a single bond or a divalent linking group, and W represents a compound formed by removing one hydrogen atom from the compound represented by the foregoing general formula (I) Residues,

In the general formula (B), X ² represents a linking group formed by polymerization, L ² represents a single bond or a divalent linking group, Y ² represents an ionic structural site, and W represents from the above-mentioned formula (I) The compound removes one hydrogen atom to form a residue. A lens composed of the film described in any one of patent application items 10 to 15. A solid-state imaging element equipped with the film described in any one of patent application items 10 to 15 or the lens described in any patent application item 16. A compound comprising a repeating unit represented by the following general formula (A), a repeating unit represented by the following general formula (B) or a repeating unit represented by the following general formula (C),

In the general formula (A), X ¹ represents a linking group formed by polymerization, L ¹ represents a single bond or a divalent linking group, and W represents one hydrogen atom is removed from the compound represented by the following general formula (I) Residues formed,

In the general formula (I), A ¹ represents a single bond, -O-, -S-, -SO ₂ -or -CO-, and B ¹ represents a single bond, -CO-, -S-, -O-, -SO ₂ -or -NH-, C ¹ represents a group or heterocyclic group represented by the following general formula (II), R ¹ represents a hydrogen atom or an alkyl group that may contain a hetero atom, and m ¹ represents an integer of 1 to 4, Further, the general formula (I), B ¹ the presence of a plurality, the plurality of B ¹ s may be the same or different also, and, C ¹ the presence of a plurality of, three C ¹ complex also may be the same or different ,

In the general formula (II), D ¹ represents a monovalent substituent, n ¹ represents an integer of 0 to 4, * represents the position of attachment to B ¹ in the general formula (I), and in the general formula (II), D ¹ in the presence of a plurality of cases, a plurality of D ¹ may be the same can also be different, and, a plurality of D ¹ from each other may be mutually bonded to form a ring, wherein, R ¹ represents a hydrogen atom and removing represented of which R ¹ When a hydrogen atom forms the aforementioned residue, the aforementioned residue is not linked to the aromatic hydrocarbon ring,

In the general formula (B), X ² represents a linking group formed by polymerization, L ² represents a single bond or a divalent linking group, Y ² represents an ionic structural part, and W represents from the above-mentioned formula (I) The residue formed by removing 1 hydrogen atom from the compound,

In the general formula (C), L ³ represents a divalent linking group, L ⁴ represents a single bond or a divalent linking group, and W represents a residue formed by removing 2 hydrogen atoms from the compound represented by the aforementioned general formula (I) base. A compound represented by the following general formula (D),

In the general formula (D), L ⁵ represents a p+q-valent linking group, Z represents a monovalent substituent including a repeating unit, p represents an integer from 0 to 100, q represents an integer from 2 to 100, and W represents from The residue represented by the compound represented by the following general formula (I) by removing one hydrogen atom,

In the general formula (I), A ¹ represents a single bond, -O-, -S-, -SO ₂ -or -CO-, and B ¹ represents a single bond, -CO-, -S-, -O-, -SO ₂ -or -NH-, C ¹ represents a group or heterocyclic group represented by the following general formula (II), R ¹ represents a hydrogen atom or an alkyl group that may contain a hetero atom, and m ¹ represents an integer of 1 to 4, Further, the general formula (I), B ¹ the presence of a plurality, the plurality of B ¹ s may be the same or different also, and, C ¹ the presence of a plurality of, three C ¹ complex also may be the same or different ,

In the general formula (II), D ¹ represents a monovalent substituent, n ¹ represents an integer of 0 to 4, * represents the position of attachment to B ¹ in the general formula (I), and in the general formula (II), D ¹ in the presence of a plurality of cases, a plurality of D ¹ may be the same can also be different, and, a plurality of D ¹ from each other may be mutually bonded to form a ring, wherein, R ¹ represents a hydrogen atom and removing represented of which R ¹ When a hydrogen atom forms the aforementioned residue, the aforementioned residue is not linked to the aromatic hydrocarbon ring. The compound as described in Item 18 or Item 19 of the patent application scope, wherein the compound represented by the aforementioned general formula (I) is a compound represented by the following general formula (V),

In the general formula (V), B ² represents a single bond or -CO-, R ¹ represents a hydrogen atom or an alkyl group that may contain a hetero atom, D ² represents a monovalent substituent, n ³ represents an integer of 0 to 5, m ² represents an integer of 1-4. In addition, in the general formula (V), when there are plural B ² , plural B ² may be the same or different, and when there are plural D ² , plural D ² may be the same or different, and a plurality of D ² may be bonded to each other to form a ring.