TW202001310A - Glass articles including elongate polymeric microstructures - Google Patents

Glass articles including elongate polymeric microstructures Download PDF

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Publication number
TW202001310A
TW202001310A TW108119285A TW108119285A TW202001310A TW 202001310 A TW202001310 A TW 202001310A TW 108119285 A TW108119285 A TW 108119285A TW 108119285 A TW108119285 A TW 108119285A TW 202001310 A TW202001310 A TW 202001310A
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Taiwan
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microstructures
elongated
light guide
guide plate
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TW108119285A
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Chinese (zh)
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崔西琳 加爾頓
曼達基尼 卡農戈
瀋平 李
凱文瑞 馬斯林
帕梅拉阿琳 莫瑞
普蘭汀 瑪贊德
瓦吉夏 瑟那拉特涅
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美商康寧公司
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Publication of TW202001310A publication Critical patent/TW202001310A/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0033Means for improving the coupling-out of light from the light guide
    • G02B6/005Means for improving the coupling-out of light from the light guide provided by one optical element, or plurality thereof, placed on the light output side of the light guide
    • G02B6/0053Prismatic sheet or layer; Brightness enhancement element, sheet or layer
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0033Means for improving the coupling-out of light from the light guide
    • G02B6/0035Means for improving the coupling-out of light from the light guide provided on the surface of the light guide or in the bulk of it
    • G02B6/0038Linear indentations or grooves, e.g. arc-shaped grooves or meandering grooves, extending over the full length or width of the light guide
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0065Manufacturing aspects; Material aspects

Abstract

Light guide plates are disclosed that can be used in a backlight unit suitable for use as an illuminator for liquid crystal display devices and methods for their manufacture are disclosed. The light guide plates can comprise a plurality of elongate polymeric microstructures on a major surface of a glass substrate. The microstructures can be polymeric multilayer microstructures to provide lenticular features.

Description

包含伸長聚合物微結構之玻璃物件Glass object containing elongated polymer microstructure

本發明大體上係關於可用作用於照明液晶顯示裝置之背光單元中之光導板的玻璃物件,且特別地,可用作經配置用於一維調光之背光單元中之光導板的玻璃物件。The present invention relates generally to glass objects that can be used as light guide plates in backlight units for illuminating liquid crystal display devices, and in particular, glass objects that can be used as light guide plates in backlight units configured for one-dimensional dimming.

儘管有機發光二極體(organic light emitting diode; OLED)顯示裝置之受歡迎度正在增加,但生產此等顯示裝置之成本仍然高,且液晶顯示器(liquid crystal display; LCD)裝置仍包含銷售之大部分顯示裝置,特別地,諸如電視機之大面板大小裝置及諸如商業標誌之其他大幅面裝置。不同於OLED顯示面板,LCD面板本身不發光,且因此依賴於位於LCD面板後的包括光導板(light guide plate;LGP)之背光單元(backlight unit;BLU)將透射光提供至LCD面板。來自BLU之光照明LCD面板且LCD面板充當光閥,該光閥選擇性地允許光穿過LCD面板之像素或被阻斷,由此形成可視影像。Although the popularity of organic light emitting diode (OLED) display devices is increasing, the cost of producing such display devices is still high, and liquid crystal display (LCD) devices still include large sales Some display devices, in particular, large panel size devices such as televisions and other large format devices such as commercial signs. Unlike the OLED display panel, the LCD panel itself does not emit light, and therefore relies on a backlight unit (BLU) including a light guide plate (LGP) located behind the LCD panel to provide transmitted light to the LCD panel. The light from the BLU illuminates the LCD panel and the LCD panel acts as a light valve that selectively allows light to pass through the pixels of the LCD panel or be blocked, thereby forming a visible image.

在不擴增之情況下,利用LCD顯示器可達成之天然對比率係影像之最亮部分與影像之最暗部分的比。最簡單之對比度擴增藉由增加亮影像之總體照明及減少暗影像之總體照明來進行。不幸地,此導致暗影像中之柔和亮部分,且洗去亮影像中之暗部分。為了克服此限制,製造商可併入對影像之主動區域調光,其中在顯示器之預界定區域內的照明可視顯示中之影像而相對於顯示面板之其他區域加以區域性調光。當光源直接位於例如LED之二維陣列的LCD面板後面時,此等區域調光可相對容易併入。區域調光更難以與邊緣照明BLU之合併入,其中LED之陣列係沿著併入至BLU中之光導板之邊緣配置。Without amplification, the natural contrast ratio that can be achieved with an LCD display is the ratio of the brightest part of the image to the darkest part of the image. The simplest contrast enhancement is performed by increasing the overall illumination of bright images and reducing the overall illumination of dark images. Unfortunately, this results in soft and bright parts in the dark image, and the dark parts in the bright image are washed away. To overcome this limitation, manufacturers can incorporate active area dimming of the image, where the illumination in a predefined area of the display can visually display the image in the display relative to other areas of the display panel. When the light source is located directly behind an LCD panel such as a two-dimensional array of LEDs, such area dimming can be relatively easily incorporated. Regional dimming is more difficult to incorporate with edge lighting BLU, where the array of LEDs is arranged along the edge of the light guide plate incorporated into the BLU.

典型光導板併有諸如聚甲基丙烯酸甲酯(poly methyl methacrylate; PMMA)之聚合物光導。PMMA容易形成,且可經過模製或加工以利於區域調光。然而,PMMA可遭受熱降解,包含相對大之熱膨脹係數,遭受濕氣吸收且容易變形。另一方面,玻璃在尺寸上穩定(包含相對低之熱膨脹係數),且可生產成適合提高大型薄TV之普及度之巨大薄片。A typical light guide plate also has a polymer light guide such as polymethyl methacrylate (PMMA). PMMA is easy to form and can be molded or processed to facilitate area dimming. However, PMMA can suffer from thermal degradation, including a relatively large coefficient of thermal expansion, suffers from moisture absorption and is easily deformed. On the other hand, glass is dimensionally stable (including a relatively low coefficient of thermal expansion) and can be produced as a huge sheet suitable for increasing the popularity of large thin TVs.

相應地,將希望生產包括能夠利於區域調光之薄玻璃光導板之BLU。此外,將希望提供具有經改良之區域調光效率之玻璃LGP,例如,在至少一個表面上具有微結構之玻璃LGP,該等微結構可減小色移,而且解決習知可靠性問題。亦提供具有類似於邊緣照明BLU之厚度的厚度之背光件,同時亦提供類似於背面照明BLU之區域調光能力的區域調光能力可為有利的。Accordingly, it will be desirable to produce BLUs that include thin glass light guide plates that can facilitate area dimming. In addition, it would be desirable to provide glass LGPs with improved regional dimming efficiency, for example, glass LGPs with microstructures on at least one surface. These microstructures can reduce color shift and solve conventional reliability problems. It may also be advantageous to provide a backlight having a thickness similar to the thickness of the edge-illuminated BLU, while also providing an area dimming capability similar to that of the back-illuminated BLU.

本發明之第一態樣係關於一種光導板,該光導板包含:一玻璃基板,該玻璃基板包括一邊緣表面及兩個主表面;及在該等主表面中之至少一者上的複數個伸長聚合物多層微結構,每一伸長多層微結構具有一最大高度H及在該最大高度之一半(H/2)處量測的一寬度W,且進一步包含在約0.1至約10之一範圍內之一縱橫比W/H。The first aspect of the present invention relates to a light guide plate including: a glass substrate including an edge surface and two main surfaces; and a plurality of at least one of the main surfaces Elongated polymer multilayer microstructures, each elongated multilayer microstructure has a maximum height H and a width W measured at one-half (H/2) of the maximum height, and is further included in a range of about 0.1 to about 10 One of the aspect ratio W/H.

本發明之第二態樣係關於一種光導板,該光導板包含:一玻璃基板,該玻璃基板包括一邊緣表面及至少兩個主表面;及在該等主表面中之至少一者上的複數個伸長聚合物微結構,每一伸長聚合物微結構包含小於15度之一表面傾斜角,且其中該表面傾斜角係藉由形成於以下兩者之間的一角界定:平行於該玻璃基板之發光表面之一線,及在處於最大高度H1 的該伸長聚合物微結構之一第一最上表面與處於最小高度H2 的該伸長聚合物微結構之一第二最上表面之間延伸的一線。The second aspect of the present invention relates to a light guide plate including: a glass substrate including an edge surface and at least two main surfaces; and a plurality on at least one of the main surfaces Elongated polymer microstructures, each elongated polymer microstructure including a surface tilt angle of less than 15 degrees, and wherein the surface tilt angle is defined by an angle formed between: parallel to the glass substrate A line of light-emitting surfaces, and a line extending between a first uppermost surface of one of the elongated polymer microstructures at a maximum height H 1 and a second uppermost surface of the elongated polymer microstructure at a minimum height H 2 .

本發明之第三態樣係關於一種製造一光導板之方法,該方法包含以下步驟:在一玻璃基板之一主表面上沉積一第一層可固化液體以作為伸長液體珠粒之一第一陣列;至少部分地輻射固化該第一層可固化液體,以提供間隔分開距離S的至少部分固化之伸長微結構之一陣列;在至少部分固化之伸長珠粒之該第一陣列上沉積一第二層可固化液體以作為伸長液體珠粒之一第二陣列;至少部分地輻射固化該第二層可固化液體,以提供至少部分固化之伸長微結構之一雙層陣列;及在至少部分固化之伸長微結構之該雙層陣列上視情況形成一額外層可固化液體,以提供包含n個層的伸長聚合物多層微結構之一多層陣列,其中n在2至10之一範圍內。The third aspect of the present invention relates to a method for manufacturing a light guide plate. The method includes the following steps: depositing a first layer of curable liquid on a main surface of a glass substrate as a first of the elongated liquid beads An array; at least partially radiation curing the first layer of curable liquid to provide an array of at least partially cured elongated microstructures separated by a distance S; depositing a first on the first array of at least partially cured elongated beads Two layers of curable liquid to serve as a second array of elongated liquid beads; at least partially radiation curing the second layer of curable liquid to provide at least partially cured a two-layer array of elongated microstructures; and at least partially cured An additional layer of curable liquid is optionally formed on the bilayer array of elongated microstructures to provide a multilayer array of n layers of elongated polymer multilayer microstructures, where n is in the range of 2-10.

本發明之第四態樣係關於一種形成一光導板之方法,該方法包含以下步驟:在一玻璃基板之一主表面上沉積一可固化液體,以提供伸長的間隔分開之第一可固化液體層之一陣列;至少部分地固化伸長的間隔分開之可固化液體層之該陣列,以形成間隔分開的至少部分固化之聚合物層之一陣列;在間隔分開的至少部分固化之聚合物層之該陣列上沉積額外可固化液體,以形成伸長的間隔分開之第二可固化液體層之一陣列;至少部分地固化伸長的間隔分開之第二可固化液體層之該陣列,以形成至少部分固化之伸長聚合物多層微結構之一陣列;及在至少部分固化之伸長聚合物多層微結構之該陣列上視情況形成至少部分固化之伸長聚合物微結構之一額外陣列,使得至少部分固化之伸長聚合物多層微結構之該陣列包含n個層,其中n在2至10之一範圍內。The fourth aspect of the present invention relates to a method of forming a light guide plate. The method includes the following steps: depositing a curable liquid on a main surface of a glass substrate to provide a first curable liquid separated by an extended interval An array of layers; at least partially curing the array of elongated spaced apart curable liquid layers to form an array of spaced apart at least partially cured polymer layers; spaced apart at least partially cured polymer layers Depositing additional curable liquid on the array to form an array of second spaced apart curable liquid layers; at least partially curing the array of second spaced apart curable liquid layers to form at least partially cured An array of elongated polymer multilayer microstructures; and optionally forming an additional array of at least partially cured elongated polymer microstructures on the array of at least partially cured elongated polymer multilayer microstructures so that the at least partially cured elongated The array of polymer multilayer microstructures contains n layers, where n is in the range of 2 to 10.

本文中所揭示之實施例之額外特徵將在隨後之實施方式中闡述,且將部分地自描述對熟習此項技術者顯而易見或藉由實踐如本文中所描述之實施例來認識,包括隨後之詳細描述、申請專利範圍以及附圖。Additional features of the embodiments disclosed herein will be described in subsequent embodiments, and will be partially clear from the description to those skilled in the art or recognized by practice of the embodiments described herein, including subsequent Detailed description, patent application scope and drawings.

包括附圖以提供進一步理解,且該等附圖併入至本說明書中且構成本說明書之一部分。該等圖圖示本發明之各種實施例,且與描述一起用於解釋本發明之原理及操作。The drawings are included to provide further understanding, and such drawings are incorporated into and constitute a part of this specification. The drawings illustrate various embodiments of the present invention, and together with the description serve to explain the principles and operation of the present invention.

現在詳細參考本發明之實施例,該等實施例之實例係在附圖中圖示。只要有可能,將遍及圖式使用相同元件符號來指代相同或相似部分。然而,本發明可以許多不同形式體現且不應解釋為限於本文中所闡述之實施例。Reference is now made in detail to the embodiments of the present invention, examples of which are illustrated in the drawings. Wherever possible, the same element symbols will be used throughout the drawings to refer to the same or similar parts. However, the present invention can be embodied in many different forms and should not be interpreted as being limited to the embodiments set forth herein.

本發明之態樣係關於光導板,該等光導板包含:玻璃基板,該玻璃基板包括一邊緣表面及兩個主表面;及在該等主表面中之至少一者上的複數個伸長聚合物多層微結構,每一伸長多層微結構具有最大高度H及在該最大高度之一半(H/2)處量測的寬度W,且進一步包含在約0.1至約10、約2至約9、約2至約8、約2至約7或約2.5至約6之範圍內之縱橫比W/H。在一些實施例中,每一伸長聚合物多層微結構包含至少兩層、至少三層、至少四層、至少五層、至少六層、至少七層、至少八層、至少九層或至少十層。在一些實施例中,該等層中之每一者至少部分地係部分固化之層。在一或多個實施例中,該複數個伸長聚合物微結構中之每一者之高度H不超過100微米(μm),例如在約5 μm至約100μm之範圍內。在一些實施例中,在兩個鄰近伸長聚合物微結構之間存在在第一方向上之第一間隔S,該第一間隔在約0.01*W至約4*W或約0.01*W至約3*W或約0.01*W至約2.5*W或約0.01*W至約2*W或約0.01*W至約1.5*W或約0.01*W至約1*W之範圍內。The aspect of the present invention relates to a light guide plate including: a glass substrate including an edge surface and two main surfaces; and a plurality of elongated polymers on at least one of the main surfaces Multi-layer microstructures, each elongated multi-layer microstructure has a maximum height H and a width W measured at one-half (H/2) of the maximum height, and further includes about 0.1 to about 10, about 2 to about 9, about An aspect ratio W/H in the range of 2 to about 8, about 2 to about 7, or about 2.5 to about 6. In some embodiments, each elongated polymer multilayer microstructure includes at least two layers, at least three layers, at least four layers, at least five layers, at least six layers, at least seven layers, at least eight layers, at least nine layers, or at least ten layers . In some embodiments, each of the layers is at least partially a partially cured layer. In one or more embodiments, the height H of each of the plurality of elongated polymer microstructures does not exceed 100 microns (μm), for example, in the range of about 5 μm to about 100 μm. In some embodiments, there is a first spacing S in the first direction between two adjacent elongated polymer microstructures, the first spacing being between about 0.01*W to about 4*W or about 0.01*W to about 3*W or about 0.01*W to about 2.5*W or about 0.01*W to about 2*W or about 0.01*W to about 1.5*W or about 0.01*W to about 1*W.

在一些實施例中,第一間隔S在該複數個伸長聚合物微結構之所有鄰近伸長聚合物微結構之間相同。在替代實施例中,一對兩個鄰近伸長聚合物微結構之間的第一間隔S不同於另一對鄰近伸長聚合物微結構之間的第一間隔。在一或多個實施例中,在兩個鄰近伸長聚合物微結構之間存在在正交於第一方向之第二方向上的第二間隔S2,該第二間隔在約10 μm至約5000 μm之範圍內。在一些實施例中,第二間隔S2在該複數個伸長聚合物微結構之所有鄰近伸長聚合物微結構之間相同。在替代實施例中,一對兩個鄰近伸長聚合物微結構之間的第二間隔S2不同於另一對鄰近伸長聚合物微結構之間的第二間隔S2。In some embodiments, the first interval S is the same between all adjacent elongated polymer microstructures of the plurality of elongated polymer microstructures. In an alternative embodiment, the first interval S between a pair of two adjacent elongated polymer microstructures is different from the first interval between another pair of adjacent elongated polymer microstructures. In one or more embodiments, there is a second interval S2 in a second direction orthogonal to the first direction between two adjacent elongated polymer microstructures, the second interval being between about 10 μm and about 5000 Within the range of μm. In some embodiments, the second interval S2 is the same between all adjacent elongated polymer microstructures of the plurality of elongated polymer microstructures. In an alternative embodiment, the second interval S2 between a pair of two adjacent elongated polymer microstructures is different from the second interval S2 between another pair of adjacent elongated polymer microstructures.

在一或多個實施例中,該複數個伸長聚合物多層微結構中之至少一者進一步包含一長度L, 且其中該複數個伸長聚合物多層微結構中之另一者具有不同於L之一長度L2。In one or more embodiments, at least one of the plurality of elongated polymer multilayer microstructures further includes a length L, and wherein the other of the plurality of elongated polymer multilayer microstructures has a different One length L2.

在一些實施例中,存在該複數個微結構中之至少一者的端表面之傾斜角,該傾斜角小於約15度。In some embodiments, there is an inclination angle of the end surface of at least one of the plurality of microstructures, the inclination angle is less than about 15 degrees.

在一或多個實施例中,該基板與該複數個微結構之間的折射率差小於10%。In one or more embodiments, the refractive index difference between the substrate and the plurality of microstructures is less than 10%.

在一些實施例中,基於莫耳%氧化物,該玻璃基板包含: 50至90莫耳% SiO2 , 0至20莫耳% Al2 O3 , 0至20莫耳% B2 O3 ,及 0至25莫耳% Rx O, 其中x為2,且R係選自Li、Na、K、Rb、Cs及其組合,或其中x為1,且R係選自Zn、Mg、Ca、Sr、Ba及其組合。In some embodiments, based on the mole% oxide, the glass substrate includes: 50 to 90 mole% SiO 2 , 0 to 20 mole% Al 2 O 3 , 0 to 20 mole% B 2 O 3 , and 0 to 25 mol% R x O, where x is 2, and R is selected from Li, Na, K, Rb, Cs, and combinations thereof, or where x is 1, and R is selected from Zn, Mg, Ca, Sr, Ba and their combinations.

在一些實施例中,該玻璃基板之厚度d1 在約0.1毫米(mm)至約3 mm之範圍內。在一或多個實施例中,該聚合物膜包含一UV可固化或熱可固化聚合物。在一些實施例中,該聚合物膜係微複製、網版印刷、噴墨印刷、雷射黏合、印刷或生長至該玻璃基板之發光表面上。In some embodiments, the thickness d 1 of the glass substrate is in the range of about 0.1 millimeter (mm) to about 3 mm. In one or more embodiments, the polymer film includes a UV-curable or heat-curable polymer. In some embodiments, the polymer film is microreplicated, screen printed, inkjet printed, laser bonded, printed, or grown onto the light emitting surface of the glass substrate.

一或多個實施例包括一光導板,該光導板包含:一玻璃基板,該玻璃基板具有一邊緣表面及一發光表面;一多層聚合物膜,該多層聚合物膜包含安置於該玻璃基板之該發光表面上的複數個微結構,及針對在約420至750 nm範圍內之波長的小於約5 dB/m之組合光衰減α’。One or more embodiments include a light guide plate including: a glass substrate having an edge surface and a light emitting surface; a multilayer polymer film including the multilayer polymer film disposed on the glass substrate The plurality of microstructures on the light-emitting surface, and the combined light attenuation α′ of less than about 5 dB/m for wavelengths in the range of about 420 to 750 nm.

本發明之另一態樣係關於一種光導板,該光導板包含:一玻璃基板,該玻璃基板包括一邊緣表面及一發光表面;及複數個伸長聚合物微結構,該複數個伸長聚合物微結構中之每一者包含小於15度、小於10度、小於4度或小於2度之一表面傾斜角。該表面傾斜角係藉由形成於以下兩者之間的一角界定:平行於該玻璃基板之該發光表面之一線,及在處於最大高度H1 的該伸長聚合物微結構之一第一最上表面與處於最小高度H2 的該伸長聚合物微結構之一第二最上表面之間延伸的一線。Another aspect of the present invention relates to a light guide plate including: a glass substrate including an edge surface and a light emitting surface; and a plurality of elongated polymer microstructures, the plurality of elongated polymer microstructures Each of the structures includes a surface tilt angle of less than 15 degrees, less than 10 degrees, less than 4 degrees, or less than 2 degrees. The surface tilt angle is defined by an angle formed between: a line parallel to the light-emitting surface of the glass substrate, and a first uppermost surface at one of the elongated polymer microstructures at a maximum height H 1 A line extending between the second uppermost surface of one of the elongated polymer microstructures at the minimum height H 2 .

在一些實施例中,該等伸長聚合物微結構包含多個層,且因此為伸長聚合物多層微結構。在特定實施例中,伸長聚合物多層微結構具有小於15度、小於10度、小於4度或小於2度之表面傾斜角,且每一伸長聚合物多層微結構具有定義縱橫比之高度H1及寬度W,其中該縱橫比表示為W/H且在約0.1至約10、約2至約9、約2至約8、約2至約7或約2.5至約6之範圍內。In some embodiments, the elongated polymer microstructures include multiple layers, and thus are elongated polymer multilayer microstructures. In certain embodiments, the elongated polymer multilayer microstructure has a surface tilt angle of less than 15 degrees, less than 10 degrees, less than 4 degrees, or less than 2 degrees, and each elongated polymer multilayer microstructure has a height H1 and Width W, where the aspect ratio is expressed as W/H and is in the range of about 0.1 to about 10, about 2 to about 9, about 2 to about 8, about 2 to about 7, or about 2.5 to about 6.

本發明之其他實施例包括製造包含一多層聚合物膜之光導板之方法,該多層聚合物膜包含安置於該玻璃基板之一發光表面上的複數個微結構。本發明之額外實施例係關於包含一光導板之光導組合件,該光導板包括:一玻璃基板,該玻璃基板具有一邊緣表面及一發光表面;一多層聚合物膜,該多層聚合物膜包含安置於該玻璃基板之一發光表面上的複數個伸長微結構;及至少一個光源,該至少一個光源光學耦合至該玻璃基板之該邊緣表面。Other embodiments of the present invention include a method of manufacturing a light guide plate including a multilayer polymer film including a plurality of microstructures disposed on a light emitting surface of the glass substrate. An additional embodiment of the present invention relates to a light guide assembly including a light guide plate, the light guide plate comprising: a glass substrate having an edge surface and a light emitting surface; a multilayer polymer film, the multilayer polymer film Including a plurality of elongated microstructures disposed on a light emitting surface of the glass substrate; and at least one light source, the at least one light source is optically coupled to the edge surface of the glass substrate.

本文中亦揭示包含此等光導之各種裝置,諸如顯示器、燈具及電子裝置,例如僅舉幾例:電視、電腦、電話、平板裝置及其他顯示面板、照明器具、固態燈具、告示牌以及其他建築要素。This article also discloses various devices including these light guides, such as displays, lamps and electronic devices, for example to name a few: TVs, computers, telephones, tablet devices and other display panels, lighting fixtures, solid state lamps, billboards and other buildings Elements.

現將參考諸圖來論述本發明之各種實施例,該等圖圖示微結構陣列及光導板之例示性實施例。以下一般描述意欲提供對所主張裝置的概述,且將參考所描繪之非限制性實施例貫穿本發明更具體地論述各種態樣,在本發明之上下文內,此等實施例可彼此互換。Various embodiments of the present invention will now be discussed with reference to the drawings, which illustrate exemplary embodiments of microstructure arrays and light guide plates. The following general description is intended to provide an overview of the claimed device, and various aspects will be discussed more specifically throughout the present invention with reference to the non-limiting embodiments depicted, and within the context of the present invention, such embodiments are interchangeable with each other.

在第1圖中展示了一例示性LCD顯示裝置10,該LCD顯示裝置包含一LCD顯示面板12,該LCD顯示面板由藉由黏合材料18結合之第一基板14及第二基板16形成,該黏合材料位於該第一基板與該第二基板之間且圍繞該第一及該第二基板之一周邊邊緣部分。第一及第二基板14、16與黏合材料18形成在其間之含有液晶材料的間隙20。亦可在該間隙內之各種位置處使用間隔物(未圖示)以維持該間隙之一致間隔。第一基板14可包括彩色濾光材料。相應地,第一基板14可被稱為彩色濾光基板。另一方面,第二基板16包括用於控制液晶材料之偏光狀態之薄膜電晶體(thin film transistor; TFT),且可被稱為背板。LCD面板12可進一步包括位於其表面上之一或多個偏光濾光器22。In FIG. 1, an exemplary LCD display device 10 is shown. The LCD display device includes an LCD display panel 12 formed by a first substrate 14 and a second substrate 16 bonded by an adhesive material 18. The adhesive material is located between the first substrate and the second substrate and surrounds a peripheral edge portion of the first and second substrates. The first and second substrates 14, 16 and the adhesive material 18 form a gap 20 containing a liquid crystal material therebetween. Spacers (not shown) can also be used at various locations within the gap to maintain a uniform gap in the gap. The first substrate 14 may include a color filter material. Accordingly, the first substrate 14 may be referred to as a color filter substrate. On the other hand, the second substrate 16 includes a thin film transistor (TFT) for controlling the polarization state of the liquid crystal material, and may be referred to as a backplane. The LCD panel 12 may further include one or more polarizing filters 22 on its surface.

LCD顯示裝置10進一步包含BLU 24,該BLU經配置以自後方、即自LCD面板之背板側照明LCD面板12。在一些實施例中,BLU可與LCD面板間隔分開,儘管在其他實施例中,BLU可與LCD面板接觸或耦接至LCD面板,諸如利用透明黏合劑。BLU 24包含由玻璃基板28形成之玻璃光導板(light guide plate; LGP) 26以作為光導,玻璃基板28包括第一主表面30、第二主表面32及在該第一主表面與該第二主表面之間延伸的複數個邊緣表面。在實施例中,玻璃基板28可為例如正方形或矩形之平行四邊形,其包含如第2圖所示的在該第一主表面與該第二主表面之間延伸的四個邊緣表面34a、34b、34c及34d,該等邊緣表面界定玻璃基板28之X-Y平面,如X-Y-Z座標所示。舉例而言,邊緣表面34a可與邊緣表面34c對置,且邊緣表面34b可與邊緣表面34d對置地定位。邊緣表面34a可與對置之邊緣表面34c平行,且邊緣表面34b可與對置之邊緣表面34d平行。邊緣表面34a及34c可正交於邊緣表面34b及34d。邊緣表面34a至34d可為平坦的且正交於或實質上正交於(例如,90 +/- 1度,例如90 +/- 0.1度)主表面30、32,儘管在其他實施例中,該等邊緣表面可包括倒角,例如正交於或實質上正交於主表面30、32且藉由兩個鄰近傾斜表面部分結合至該第一及該第二主表面的平坦中心部分。The LCD display device 10 further includes a BLU 24 configured to illuminate the LCD panel 12 from the rear, that is, from the back panel side of the LCD panel. In some embodiments, the BLU may be spaced apart from the LCD panel, although in other embodiments, the BLU may be in contact with or coupled to the LCD panel, such as using a transparent adhesive. The BLU 24 includes a glass light guide plate (LGP) 26 formed of a glass substrate 28 as a light guide. The glass substrate 28 includes a first main surface 30, a second main surface 32, and the first main surface and the second A plurality of edge surfaces extending between the main surfaces. In an embodiment, the glass substrate 28 may be a parallelogram such as a square or a rectangle, which includes four edge surfaces 34a, 34b extending between the first main surface and the second main surface as shown in FIG. 2 , 34c and 34d, these edge surfaces define the XY plane of the glass substrate 28, as shown by the XYZ coordinates. For example, the edge surface 34a may be opposed to the edge surface 34c, and the edge surface 34b may be positioned opposite to the edge surface 34d. The edge surface 34a may be parallel to the opposed edge surface 34c, and the edge surface 34b may be parallel to the opposed edge surface 34d. The edge surfaces 34a and 34c may be orthogonal to the edge surfaces 34b and 34d. The edge surfaces 34a to 34d may be flat and orthogonal or substantially orthogonal (e.g., 90 +/- 1 degree, such as 90 +/- 0.1 degrees) to the main surfaces 30, 32, although in other embodiments, The edge surfaces may include chamfers, such as orthogonal or substantially orthogonal to the main surfaces 30, 32 and joined to the flat central portion of the first and second main surfaces by two adjacent inclined surface portions.

第一及/或第二主表面30、32可包括在約0.1奈米(nm)至約0.6 nm之範圍內、例如小於約0.6 nm、小於約0.5 nm、小於約0.4 nm、小於約0.3 nm、小於約0.2 nm或小於約0.1 nm之平均粗糙度(Ra)。該等邊緣表面之平均粗糙度(Ra)可等於或小於約0.05微米(μm),例如在約0.005微米至約0.05微米之範圍內。The first and/or second major surfaces 30, 32 may be included in the range of about 0.1 nanometer (nm) to about 0.6 nm, such as less than about 0.6 nm, less than about 0.5 nm, less than about 0.4 nm, less than about 0.3 nm , An average roughness (Ra) of less than about 0.2 nm or less than about 0.1 nm. The average roughness (Ra) of the edge surfaces may be equal to or less than about 0.05 microns (μm), for example, in the range of about 0.005 microns to about 0.05 microns.

前述位準之主表面粗糙度可例如藉由使用融合拉製程序或浮法玻璃程序、繼而拋光來達成。表面粗糙度可例如藉由利用商用系統(諸如由Zygo製造之商用系統)的原子力顯微術、白光干涉術或藉由利用商用系統(諸如由Keyence提供之商用系統)的雷射共焦顯微術來量測。來自表面之散射可藉由製備一系列除表面粗糙度外相同之樣本、然後量測每一樣本之內透光率來量測。樣本之間的內透光率上之差異可歸因於由粗糙表面引起之散射損失。邊緣粗糙度可藉由研磨及/或拋光來達成。The main surface roughness of the aforementioned level can be achieved, for example, by using a fusion drawing process or a float glass process, followed by polishing. The surface roughness can be obtained, for example, by atomic force microscopy using a commercial system (such as a commercial system manufactured by Zygo), white light interferometry, or by laser confocal microscopy using a commercial system (such as a commercial system provided by Keyence) Measure. The scattering from the surface can be measured by preparing a series of samples except for the surface roughness, and then measuring the internal transmittance of each sample. The difference in internal light transmittance between samples can be attributed to the scattering loss caused by the rough surface. Edge roughness can be achieved by grinding and/or polishing.

玻璃基板28進一步包含在正交於第一主表面30及第二主表面32之方向上的最大玻璃基板厚度t。在一些實施例中,玻璃基板厚度t可等於或小於約3 mm,例如等於或小於約2 mm或等於或小於約1 mm,儘管在其他實施例中,玻璃基板厚度t可在約0.1 mm至約3 mm之範圍內,例如在約0.1 mm至約2.5 mm之範圍內、在約0.3 mm至約2.1 mm之範圍內、在約0.5 mm至約2.1 mm範圍內、在約0.6 mm至約2.1 mm範圍內或在約0.6 mm至約1.1 mm範圍內,包括所有範圍及其間的子範圍。The glass substrate 28 further includes a maximum glass substrate thickness t in a direction orthogonal to the first main surface 30 and the second main surface 32. In some embodiments, the thickness t of the glass substrate may be equal to or less than about 3 mm, for example, equal to or less than about 2 mm or equal to or less than about 1 mm, although in other embodiments, the thickness t of the glass substrate may range from about 0.1 mm to In the range of about 3 mm, for example in the range of about 0.1 mm to about 2.5 mm, in the range of about 0.3 mm to about 2.1 mm, in the range of about 0.5 mm to about 2.1 mm, in the range of about 0.6 mm to about 2.1 mm range or in the range of about 0.6 mm to about 1.1 mm, including all ranges and subranges therebetween.

在各種實施例中,玻璃基板28之玻璃組合物可包含在60至80莫耳%之間的SiO2 、在0至20莫耳%之間的Al2 O3 及在0至15莫耳%之間的B2 O3 ,且包含小於約50 ppm之鐵(Fe)濃度。在一些實施例中,可存在小於25 ppm之Fe,或在一些實施例中,Fe濃度可為約20 ppm或更小。在各種實施例中,玻璃基板28之熱導率可大於0.5 W/m/K,例如在約0.5至約0.8 W/m/K範圍內。在額外實施例中,玻璃基板28可藉由拋光浮法玻璃、融合拉製程序、狹縫拉製程序、重新拉製程序或另一合適之玻璃基板形成程序來形成。In various embodiments, the glass composition of the glass substrate 28 may include between 60 and 80 mol% SiO 2 , between 0 and 20 mol% Al 2 O 3 and between 0 and 15 mol% B 2 O 3 in between, and contains an iron (Fe) concentration of less than about 50 ppm. In some embodiments, less than 25 ppm of Fe may be present, or in some embodiments, the Fe concentration may be about 20 ppm or less. In various embodiments, the thermal conductivity of the glass substrate 28 may be greater than 0.5 W/m/K, for example, in the range of about 0.5 to about 0.8 W/m/K. In additional embodiments, the glass substrate 28 may be formed by polishing float glass, a fusion drawing process, a slit drawing process, a redrawing process, or another suitable glass substrate forming process.

在一些實施例中,玻璃基板28包含在約65.79莫耳%至約78.17莫耳%範圍內之SiO2 、在約2.94莫耳%至約12.12莫耳%範圍內之Al2 O3 、在0莫耳%至約11.16莫耳%範圍內之B2 O3 、在0莫耳%至約2.06莫耳%範圍內之Li2 O、在約3.52莫耳%至約13.25莫耳%範圍內之Na2 O、在0莫耳%至約4.83莫耳%範圍內之K2 O、在0莫耳%至約3.01莫耳%範圍內之ZnO、在約0莫耳%至約8.72莫耳%範圍內之MgO、在約0莫耳%至約4.24莫耳%範圍內之CaO、在約0莫耳%至約6.17莫耳%範圍內之SrO、在約0莫耳%至約4.3莫耳%範圍內之BaO及在約0.07莫耳%至約0.11莫耳%範圍內之SnO2 。在一些實施例中,該玻璃基板可展現小於約0.008、例如小於約0.005之色移。在一些實施例中,該玻璃基板包含在約0.95至約3.23範圍內之Rx O/Al2 O3 ,其中R係Li、Na、K、Rb及Cs中之任何一或多個,且x為2。在一些實施例中,該玻璃基板包含介於1.18與5.68之間的Rx O/Al2 O3 ,其中R係Li、Na、K、Rb、Cs中之任何一或多個且為2,或Zn、Mg、Ca、Sr或Ba且x為1。在一些實施例中,該玻璃基板包含在約-4.25至約4.0範圍內之Rx O – Al2 O3 - MgO,其中R係Li、Na、K、Rb及Cs中之任何一或多個,且x為2。In some embodiments, the glass substrate 28 comprises SiO 2 in the range of about 65.79 mol% to about 78.17 mol%, Al 2 O 3 in the range of about 2.94 mol% to about 12.12 mol%, at 0 B 2 O 3 in the range of mole% to about 11.16 mole %, Li 2 O in the range of 0 mole% to about 2.06 mole %, and in the range of about 3.52 mole% to about 13.25 mole% Na 2 O, K 2 O in the range of 0 mol% to about 4.83 mol%, ZnO in the range of 0 mol% to about 3.01 mol%, in the range of about 0 mol% to about 8.72 mol% MgO in the range, CaO in the range of about 0 mol% to about 4.24 mol%, SrO in the range of about 0 mol% to about 6.17 mol%, in the range of about 0 mol% to about 4.3 mol BaO in the range of% and SnO 2 in the range of about 0.07 mol% to about 0.11 mol%. In some embodiments, the glass substrate may exhibit a color shift of less than about 0.008, such as less than about 0.005. In some embodiments, the glass substrate includes R x O/Al 2 O 3 in the range of about 0.95 to about 3.23, where R is any one or more of Li, Na, K, Rb, and Cs, and x Is 2. In some embodiments, the glass substrate includes R x O/Al 2 O 3 between 1.18 and 5.68, where R is any one or more of Li, Na, K, Rb, and Cs and is 2, Or Zn, Mg, Ca, Sr or Ba and x is 1. In some embodiments, the glass substrate includes R x O-Al 2 O 3 -MgO in the range of about -4.25 to about 4.0, wherein R is any one or more of Li, Na, K, Rb, and Cs And x is 2.

在其他實施例中,該玻璃基板可包含在約0.1莫耳%至約3.0莫耳%範圍內之ZnO、在約0.1莫耳%至約1.0莫耳%範圍內之TiO2 、在約0.1莫耳%至約1.0莫耳%範圍內之V2 O3 、在約0.1莫耳%至約1.0莫耳%範圍內之Nb2 O5 、在約0.1莫耳%至約1.0莫耳%範圍內之MnO、在約0.1莫耳%至約1.0莫耳%範圍內之ZrO2 、在約0.1莫耳%至約1.0莫耳%範圍內之As2 O3 、在約0.1莫耳%至約1.0莫耳%範圍內之SnO2 、在約0.1莫耳%至約1.0莫耳%範圍內之MoO3 、在約0.1莫耳%至約1.0莫耳%範圍內之Sb2 O3 或在約0.1莫耳%至約1.0莫耳%範圍內之CeO2 。在額外實施例中,該玻璃基板可包含介於0.1莫耳%至不大於約3.0莫耳%的以下各者中之一者或其中任一者之組合:ZnO、TiO2 、V2 O3 、Nb2 O5 、MnO、ZrO2 、As2 O3 、SnO2 、MoO3 、Sb2 O3 及CeO2In other embodiments, the glass substrate may include ZnO in the range of about 0.1 mol% to about 3.0 mol%, TiO 2 in the range of about 0.1 mol% to about 1.0 mol%, in about 0.1 mol% V 2 O 3 in the range of% ear to about 1.0 mol %, Nb 2 O 5 in the range of about 0.1 mole% to about 1.0 mol %, in the range of about 0.1 mol% to about 1.0 mol% MnO, ZrO 2 in the range of about 0.1 mol% to about 1.0 mol%, As 2 O 3 in the range of about 0.1 mol% to about 1.0 mol%, in the range of about 0.1 mol% to about 1.0 SnO 2 in the range of mol %, MoO 3 in the range of about 0.1 mol% to about 1.0 mol %, Sb 2 O 3 in the range of about 0.1 mol% to about 1.0 mol %, or about 0.1 CeO 2 in the range of mole% to about 1.0 mole %. In additional embodiments, the glass substrate may include one or a combination of any of the following from 0.1 mol% to no more than about 3.0 mol%: ZnO, TiO 2 , V 2 O 3 , Nb 2 O 5 , MnO, ZrO 2 , As 2 O 3 , SnO 2 , MoO 3 , Sb 2 O 3 and CeO 2 .

然而,應理解,本文中所描述之實施例不受玻璃組合物限制,且前述組合實施例就此而言係非限制性的。However, it should be understood that the embodiments described herein are not limited by the glass composition, and the foregoing combination embodiments are non-limiting in this regard.

根據本文中所描述之實施例,BLU 24進一步包含沿著玻璃基板28之至少一個邊緣表面(光射入邊緣表面) (例如邊緣表面34a)配置的一陣列之發光二極體(light emitting diode; LED) 36。應注意,儘管第1圖中所描繪之實施例展示有光射入之單一邊緣表面34a,但所主張之標的不應有此限制,此係因為例示性玻璃基板28之邊緣中的任何一個或幾個可有光射入。舉例而言,在一些實施例中,邊緣表面34a及其對置之邊緣表面34c均可有光射入。額外實施例可在邊緣表面34b及其對置之邊緣表面34d處射入光,而非邊緣表面34a及/或其對置之邊緣表面34c或除該等邊緣表面以外。光射入表面可經配置以散射在小於12.8度透射半高全寬(full width half maximum; FWHM)之角度內之光。According to the embodiments described herein, the BLU 24 further includes an array of light emitting diodes (light emitting diodes) arranged along at least one edge surface (light incident edge surface) (eg, edge surface 34a) of the glass substrate 28; LED) 36. It should be noted that although the embodiment depicted in FIG. 1 shows a single edge surface 34a where light enters, the claimed subject matter should not have this limitation because any one of the edges of the exemplary glass substrate 28 or A few can have light incident. For example, in some embodiments, both the edge surface 34a and its opposite edge surface 34c can have light incident. Additional embodiments may inject light at the edge surface 34b and its opposite edge surface 34d instead of or in addition to the edge surface 34a and/or its opposite edge surface 34c. The light incident surface can be configured to scatter light within an angle of less than 12.8 degrees transmission full width half maximum (FWHM).

在一些實施例中,LED 36可與光射入邊緣表面(例如,邊緣表面34a)相距小於約0.5 mm之距離δ而定位。根據一或多個實施例,LED 36可包含小於或等於玻璃基板28之厚度t之厚度或高度,以提供至玻璃基板中之有效光耦合。In some embodiments, the LED 36 may be positioned at a distance δ of less than about 0.5 mm from the light incident edge surface (eg, edge surface 34a). According to one or more embodiments, the LED 36 may include a thickness or height less than or equal to the thickness t of the glass substrate 28 to provide effective optical coupling into the glass substrate.

由LED之陣列發射之光係經由至少一個邊緣表面34a射入且根據全內反射在玻璃基板中導引,且例如藉由在玻璃基板28之一個或兩個主表面30、32上之提取特徵提取以照明LCD面板12。此等提取特徵中斷全內反射,且導致玻璃基板28內之光傳播經由一個或兩個主表面30、32而退出該玻璃基板。相應地,BLU 24可進一步包括位於玻璃基板28後面、與LCD面板12對置之反射器板38,以將自該玻璃基板之背面(例如,主表面32)提取的光重新引導至向前方向(朝向LCD面板12)。合適之光提取特徵可包括該玻璃基板上之粗糙表面,該粗糙表面係藉由直接糙化該玻璃基板之一表面或藉由用例如漫射膜之合適塗層塗佈片材而產生。在一些實施例中,光提取特徵可例如藉由用諸如UV可固化墨水之合適墨水印刷反射性離散區域(例如,白點)及乾燥及/或固化該墨水來獲得。在一些實施例中,可使用前述提取特徵之組合,或可使用此項技術中已知之其他提取特徵。The light emitted by the array of LEDs is incident through at least one edge surface 34a and guided in the glass substrate according to total internal reflection, and for example by extracting features on one or both main surfaces 30, 32 of the glass substrate 28 Extract to illuminate the LCD panel 12. These extracted features interrupt total internal reflection and cause light within the glass substrate 28 to propagate through one or both major surfaces 30, 32 and exit the glass substrate. Accordingly, the BLU 24 may further include a reflector plate 38 located behind the glass substrate 28 and opposite the LCD panel 12 to redirect light extracted from the back surface (eg, the main surface 32) of the glass substrate to the forward direction (Toward the LCD panel 12). Suitable light extraction features may include a rough surface on the glass substrate, which is produced by directly roughening a surface of the glass substrate or by coating the sheet with a suitable coating such as a diffusion film. In some embodiments, light extraction features may be obtained, for example, by printing reflective discrete areas (eg, white spots) with a suitable ink, such as UV curable ink, and drying and/or curing the ink. In some embodiments, a combination of the aforementioned extracted features may be used, or other extracted features known in the art may be used.

BLU可進一步包括沉積在該玻璃基板之一主表面上之一或多個膜或塗層(未圖示),例如量子點膜、漫射膜及反射性偏光膜或其組合。The BLU may further include one or more films or coatings (not shown) deposited on one main surface of the glass substrate, such as quantum dot films, diffusion films, and reflective polarizing films, or combinations thereof.

例如一維(1D)調光之區域調光可藉由在照明鄰近區域之其他LED 36關閉時打開沿著玻璃基板28之至少一個邊緣表面34a的照明第一區域之選定LED 36來實現。相反地,1D區域調光可藉由在照明鄰近區域之LED打開時關閉照明該第一區域之選定LED來實現。For example, one-dimensional (1D) dimming area dimming can be achieved by turning on selected LEDs 36 that illuminate the first area along at least one edge surface 34a of the glass substrate 28 when other LEDs 36 that illuminate the adjacent area are turned off. Conversely, 1D area dimming can be achieved by turning off selected LEDs that illuminate the first area when the LEDs that illuminate the adjacent area are turned on.

第2圖展示一例示性LGP 26之一部分,該部分包含沿著玻璃基板28之邊緣表面34a配置的LED之第一子陣列40a、沿著玻璃基板28之邊緣表面34a配置的LED之第二子陣列40b及沿著玻璃基板28之邊緣表面34a配置的LED 36之第三子陣列40c。由該三個子陣列照明之該玻璃基板之三個不同區域經標記為A、B及C,其中A區域係中間區域,且B及C區域鄰近A區域。區域A、B及C分別由LED子陣列40a、40b及40c照明。在子陣列40a之LED處於「開」狀態下且例如子陣列40b及40c之其他子陣列的所有其他LED處於「關」狀態下之情況下,區域調光指數LDI可定義為1 - (B、C區域之平均明度)/(A區域之明度)。判定LDI之更全面解釋可例如在Jung等人之「用於邊緣型LED背光單元之區域調光設計及最佳化(Local Dimming Design and Optimization for Edge-Type LED Backlight Unit)」(SID 2011 Digest,2011,第1430至1432頁)中發現,該文章之內容係以全文引用之方式併入本文中。FIG. 2 shows a portion of an exemplary LGP 26 that includes a first sub-array 40a of LEDs disposed along the edge surface 34a of the glass substrate 28 and a second sub-array of LEDs disposed along the edge surface 34a of the glass substrate 28 An array 40b and a third sub-array 40c of LEDs 36 arranged along the edge surface 34a of the glass substrate 28. Three different regions of the glass substrate illuminated by the three sub-arrays are labeled A, B, and C, where region A is the middle region, and regions B and C are adjacent to region A. Regions A, B, and C are illuminated by LED sub-arrays 40a, 40b, and 40c, respectively. In the case where the LED of the sub-array 40a is in the "on" state and all the other LEDs of the other sub-arrays such as the sub-arrays 40b and 40c are in the "off" state, the regional dimming index LDI can be defined as 1-(B, Average brightness of area C)/(lightness of area A). A more comprehensive explanation for determining LDI can be found, for example, in Jung et al. "Local Dimming Design and Optimization for Edge-Type LED Backlight Unit" (SID 2011 Digest, In 2011, pages 1430 to 1432), it was found that the content of this article was incorporated into this article by full text citation.

應注意,任何一個陣列或子陣列內之LED的數目或甚至子陣列之數目至少係顯示裝置之大小的函數,且第2圖中所描繪之LED之數目僅用於說明,而不意欲為限制性的。相應地,每一子陣列可包括單一LED或多於一個LED,或複數個子陣列可以照明特定LCD面板所必需之方式設置,諸如三個子陣列、四個子陣列、五個子陣列等。舉例而言,典型的具有1D區域調光官能之55'' (139.7 cm) LCD TV可具有8至12個區帶。區帶寬度通常在約100 mm至約150 mm之範圍內,儘管在一些實施例中,區帶寬度可更小。區帶長度與玻璃基板28之長度大致相同。It should be noted that the number of LEDs or even the number of sub-arrays in any one array or sub-array is at least a function of the size of the display device, and the number of LEDs depicted in Figure 2 is for illustration only and is not intended to be limiting Sexual. Accordingly, each sub-array may include a single LED or more than one LED, or a plurality of sub-arrays may be arranged in a manner necessary to illuminate a particular LCD panel, such as three sub-arrays, four sub-arrays, five sub-arrays, and so on. For example, a typical 55” (139.7 cm) LCD TV with 1D area dimming function may have 8 to 12 zones. The zone width is generally in the range of about 100 mm to about 150 mm, although in some embodiments, the zone width may be smaller. The length of the zone is approximately the same as the length of the glass substrate 28.

現在參考展示光導板之各種實施例之第3A圖至第3E圖,光導板26包含玻璃基板28,該玻璃基板具有玻璃基板厚度t及複數個聚合物微結構70。在特定實施例中,該等聚合物微結構70係聚合物多層微結構70。如第3A圖所示,複數個聚合物多層微結構70提供位於玻璃基板之一表面(例如第一主表面30)上的複數個矩形或正方形通道60,儘管在其他實施例中,該複數個通道可形成於第二主表面32中,或第一主表面30及第二主表面32兩者中。在一些實施例中,光提取特徵可形成於第一主表面30及第二主表面32中之一者或兩者中。在一些實施例中,該複數個通道60中之每一通道實質上平行於該複數個通道60中之一鄰近通道。每一聚合物多層微結構70包含一最大高度H及在H/2 (聚合物多層微結構70之高度H的一半)處界定之一寬度W,該寬度藉由第3A圖至第3E圖中之線H/2來指示。每一聚合物多層微結構70具有一寬度W,且鄰近聚合物多層微結構70在H/2處(在聚合物多層微結構70之最大高度H的一半處)分開距離S。光導板厚度T係藉由玻璃基板厚度t及聚合物多層微結構70之最大高度H界定。鄰近聚合物多層微結構70界定通道60,該等通道與鄰近聚合物多層微結構分開距離S。Referring now to FIGS. 3A to 3E showing various embodiments of the light guide plate, the light guide plate 26 includes a glass substrate 28 having a glass substrate thickness t and a plurality of polymer microstructures 70. In certain embodiments, the polymer microstructures 70 are polymer multilayer microstructures 70. As shown in FIG. 3A, the plurality of polymer multilayer microstructures 70 provide a plurality of rectangular or square channels 60 on one surface (eg, the first major surface 30) of the glass substrate, although in other embodiments, the plurality of channels 60 The channel may be formed in the second main surface 32, or in both the first main surface 30 and the second main surface 32. In some embodiments, light extraction features may be formed in one or both of the first major surface 30 and the second major surface 32. In some embodiments, each channel of the plurality of channels 60 is substantially parallel to an adjacent channel of the plurality of channels 60. Each polymer multilayer microstructure 70 includes a maximum height H and a width W defined at H/2 (half the height H of the polymer multilayer microstructure 70), the width is shown in FIGS. 3A to 3E Indicated by the line H/2. Each polymer multilayer microstructure 70 has a width W, and the adjacent polymer multilayer microstructure 70 is separated by a distance S at H/2 (at half of the maximum height H of the polymer multilayer microstructure 70). The thickness T of the light guide plate is defined by the thickness t of the glass substrate and the maximum height H of the polymer multilayer microstructure 70. The adjacent polymer multilayer microstructure 70 defines channels 60 that are separated by a distance S from the adjacent polymer multilayer microstructure.

一或多個聚合物多層微結構70具有非零最大高度H。舉例而言,H可在約5 μm至約300 μm之範圍內,諸如約10 μm至約250 μm、約15 μm至約200 μm、約20 μm至約150 μm、約30 μm至約100 μm、約20 μm至約90 μm,包括所有範圍及其間的子範圍,儘管視聚合物多層微結構70之橫截面形狀而定,亦考慮其他高度。在一些實施例中,寬度W可在約50 μm至約1 mm之範圍內,諸如約50 μm至約500 μm、約100 μm至約400 μm、約100 μm至約300 μm、約100 μm至約250 μm、約100 μm至約200 μm、約100 μm至約190 μm、約100 μm至約180 μm、約100 μm至約175 μm或約100 μm至約150 μm,包括所有範圍及其間的子範圍,儘管亦考慮其他寬度,該等聚合物多層微結構70之橫截面形狀。聚合物多層微結構70在H/2處(在每一通道之最大深度H的一半處)可具有橫截面尺寸W。One or more polymer multilayer microstructures 70 have a non-zero maximum height H. For example, H may be in the range of about 5 μm to about 300 μm, such as about 10 μm to about 250 μm, about 15 μm to about 200 μm, about 20 μm to about 150 μm, about 30 μm to about 100 μm , About 20 μm to about 90 μm, including all ranges and subranges therebetween, although depending on the cross-sectional shape of the polymer multilayer microstructure 70, other heights are also considered. In some embodiments, the width W may range from about 50 μm to about 1 mm, such as about 50 μm to about 500 μm, about 100 μm to about 400 μm, about 100 μm to about 300 μm, about 100 μm to About 250 μm, about 100 μm to about 200 μm, about 100 μm to about 190 μm, about 100 μm to about 180 μm, about 100 μm to about 175 μm, or about 100 μm to about 150 μm, including all ranges and in between The sub-range, although other widths are also considered, the cross-sectional shapes of the polymer multilayer microstructures 70. The polymer multilayer microstructure 70 may have a cross-sectional dimension W at H/2 (at half of the maximum depth H of each channel).

該等聚合物多層微結構70可為週期性的,且週期P = W+S,儘管在其他實施例中,該等聚合物多層微結構70可為非週期性的。該等聚合物多層微結構70可具有多種橫截面形狀。舉例而言,在第3A圖之實施例中,聚合物多層微結構70之一橫截面具有矩形形狀,該橫截面垂直於在X-Y平面中的每一聚合物多層微結構70之縱向軸線。在第3B圖之實施例中,每一聚合物多層微結構70具有例如一彎曲橫截面形狀,使得每一通道60具有諸如半圓形之圓形橫截面,而在第3C圖之實施例中,每一聚合物多層微結構70包含梯形橫截面形狀。在第3D圖中,每一聚合物多層微結構70包含位於玻璃基板28上之半圓形扁豆狀透鏡。在一些實施例中,一聚合物平台(未圖示)可位於玻璃基板28與每一聚合物多層微結構70之間。然而,第3A圖至第3D圖之橫截面形狀係非限制性的,且該等聚合物多層微結構70可包含其他形狀,或橫截面形狀之組合,諸如稜鏡或圓稜鏡。舉例而言,在第3E圖所示之實施例中,每一聚合物多層微結構70包含一稜鏡橫截面形狀,且該稜鏡可具有在約60º至約120º範圍內之一稜鏡角θ,諸如約70º至約110º、約80º至約100º或約90º,包括所有範圍及其間的子範圍。在第3E圖中,該等聚合物多層微結構70係安置於具有聚合物平台厚度t2之聚合物平台72上,該聚合物平台安置於玻璃基板28上。第3圖中之光導板厚度T係玻璃基板厚度t、聚合物平台厚度t2及聚合物多層微結構70之高度H的總和。聚合物多層微結構70之其他合適橫截面形狀包括半圓形、半橢圓形、抛物線或其他類似之圓形狀。此外,儘管第3A圖至第3E圖圖示規則(或週期性)陣列,但亦可能使用不規則(或非週期性)陣列。舉例而言,第3F圖係包含聚合物多層稜鏡之非週期性陣列之微結構化表面的SEM影像。The polymer multilayer microstructures 70 may be periodic, and the period P=W+S, although in other embodiments, the polymer multilayer microstructures 70 may be non-periodic. The polymer multilayer microstructures 70 can have various cross-sectional shapes. For example, in the embodiment of FIG. 3A, one cross section of the polymer multilayer microstructure 70 has a rectangular shape, which is perpendicular to the longitudinal axis of each polymer multilayer microstructure 70 in the X-Y plane. In the embodiment of FIG. 3B, each polymer multilayer microstructure 70 has, for example, a curved cross-sectional shape such that each channel 60 has a circular cross-section such as a semi-circle, while in the embodiment of FIG. 3C Each polymer multilayer microstructure 70 includes a trapezoidal cross-sectional shape. In FIG. 3D, each polymer multilayer microstructure 70 includes a semi-circular lenticular lens on a glass substrate 28. In some embodiments, a polymer platform (not shown) may be located between the glass substrate 28 and each polymer multilayer microstructure 70. However, the cross-sectional shapes of FIGS. 3A to 3D are non-limiting, and the polymer multilayer microstructures 70 may include other shapes, or a combination of cross-sectional shapes, such as prism or prism. For example, in the embodiment shown in FIG. 3E, each polymer multilayer microstructure 70 includes a prism cross-sectional shape, and the prism can have a prism angle in the range of about 60º to about 120º θ, such as about 70º to about 110º, about 80º to about 100º, or about 90º, includes all ranges and subranges therebetween. In FIG. 3E, the polymer multilayer microstructures 70 are disposed on a polymer platform 72 having a polymer platform thickness t2, and the polymer platform is disposed on a glass substrate 28. The thickness T of the light guide plate in FIG. 3 is the sum of the thickness t of the glass substrate, the thickness t2 of the polymer platform, and the height H of the polymer multilayer microstructure 70. Other suitable cross-sectional shapes for the polymer multilayer microstructure 70 include semi-circular, semi-elliptical, parabolic, or other similar circular shapes. In addition, although FIGS. 3A to 3E illustrate a regular (or periodic) array, an irregular (or aperiodic) array may also be used. For example, Figure 3F is an SEM image of the microstructured surface of a non-periodic array of polymer multilayer prisms.

在一些實施例中,複數個聚合物多層微結構70中之每一聚合物多層微結構70的比W/H在約0.1至約10之範圍內,例如約2至9、約2至約8、約2至約7、約2.5至約6或約2.5至約5,包括所有範圍及其間的子範圍。在一些實施例中,當W/H大於約10時,該等聚合物多層微結構70對於1D區域調光可變得無效。在一些實施例中,當W/H小於約0.1時,該等聚合物多層微結構70可難以製造。In some embodiments, the ratio W/H of each of the plurality of polymer multilayer microstructures 70 is in the range of about 0.1 to about 10, for example, about 2 to 9, about 2 to about 8 , About 2 to about 7, about 2.5 to about 6, or about 2.5 to about 5, including all ranges and subranges therebetween. In some embodiments, when W/H is greater than about 10, the polymer multilayer microstructures 70 may become ineffective for 1D area dimming. In some embodiments, when the W/H is less than about 0.1, the polymer multilayer microstructures 70 may be difficult to manufacture.

如本文中所使用,術語「微結構」、「微結構化」及其變體意欲指代由一樹脂組合物形成之固化膜的表面起伏特徵,該等特徵具有至少一個尺寸(例如,高度、寬度、長度等),該至少一個尺寸小於約500 μm,諸如小於約400 μm、小於約300 μm、小於約200 μm、小於約100 μm、小於約50 μm或甚至更小,例如在約10 μm至約500 μm之範圍內,包括所有範圍及其間的子範圍。在一些實施例中,固化膜形成聚合物微結構,該等聚合物微結構在特定實施例中可具有規則或不規則形狀,該等形狀在給定陣列中可相同或不同。儘管第3A圖至第3E圖大體上圖示以實質上相同的間距(例如,週期性)均勻地間隔分開之相同大小及形狀之聚合物多層微結構70,但將理解,並非給定陣列內之全部聚合物多層微結構必須具有相同的大小及/或形狀及/或間距。可使用聚合物多層微結構形狀及/或大小之組合,且此等組合可以週期性或非週期性方式配置。As used herein, the terms "microstructure", "microstructured" and variations thereof are intended to refer to surface relief features of a cured film formed from a resin composition, such features having at least one dimension (eg, height, Width, length, etc.), the at least one dimension is less than about 500 μm, such as less than about 400 μm, less than about 300 μm, less than about 200 μm, less than about 100 μm, less than about 50 μm or even smaller, for example at about 10 μm The range up to about 500 μm includes all ranges and subranges therebetween. In some embodiments, the cured film forms polymer microstructures, which in certain embodiments may have regular or irregular shapes, which may be the same or different in a given array. Although FIGS. 3A through 3E generally illustrate polymer multilayer microstructures 70 of the same size and shape that are evenly spaced at substantially the same pitch (eg, periodicity), it will be understood that it is not within a given array All polymer multilayer microstructures must have the same size and/or shape and/or spacing. Combinations of polymer multilayer microstructure shapes and/or sizes can be used, and these combinations can be configured in a periodic or aperiodic manner.

此外,該等聚合物多層微結構之大小及/或形狀可視LGP之所要光輸出及/或光學功能性而改變。舉例而言,不同之聚合物多層微結構形狀可產生不同之區域調光效率,亦被稱為區域調光指數(local dimming index; LDI)。藉助於非限制性實例,稜鏡聚合物多層微結構之週期性陣列可產生至多約70%之LDI值,而扁豆狀透鏡之週期性陣列可產生至多約83%之LDI值。微結構大小及/或形狀及/或間距可改變以達成不同之LDI值。不同之聚合物多層微結構形狀亦可提供提供額外的光學功能性。舉例而言,具有90º稜鏡角之稜鏡陣列不僅可導致更有效率的區域調光,而且由於光線之再循環及重定向可部分地聚焦垂直於稜柱脊部之方向上的光。In addition, the size and/or shape of the polymer multilayer microstructures can vary depending on the desired light output and/or optical functionality of the LGP. For example, different polymer multilayer microstructure shapes can produce different regional dimming efficiencies, also known as local dimming index (LDI). By way of non-limiting example, a periodic array of multi-layer microstructures of 稜鏡 polymers can produce an LDI value of up to about 70%, while a periodic array of lentil lenses can produce an LDI value of up to about 83%. The microstructure size and/or shape and/or spacing can be changed to achieve different LDI values. Different polymer multilayer microstructure shapes can also provide additional optical functionality. For example, a prism array with a 90° prism angle can not only lead to more efficient area dimming, but also can partially focus light in a direction perpendicular to the prism ridge due to light recycling and redirection.

第3A圖至第3F圖所示之聚合物微結構中之每一者可形成於一玻璃基板上,以提供如關於第4圖所描述之光導板。因此,關於第3A圖至第3F圖所描述的該等結構中之每一者可充當對引導經由光導板之主表面發射的光有效之扁豆狀結構、扁豆狀透鏡或扁豆狀特徵。因此,術語「扁豆狀」不限於特定形狀或橫截面形狀,而可包括具有凸面或凹面彎曲之橫截面形狀的伸長微結構,諸如第3B圖及第3D圖中所示之形狀、如第3A圖所示之正方形矩形或正方形、如第3C圖所示之梯形或如第3E圖所示之三角形。Each of the polymer microstructures shown in FIGS. 3A to 3F can be formed on a glass substrate to provide the light guide plate as described in relation to FIG. 4. Therefore, each of the structures described with respect to FIGS. 3A to 3F can serve as a lentil-like structure, lentil-like lens, or lentil-like feature effective for guiding light emitted through the main surface of the light guide plate. Therefore, the term "lentil-shaped" is not limited to a specific shape or a cross-sectional shape, but may include an elongated microstructure having a convex or concave curved cross-sectional shape, such as the shape shown in FIGS. 3B and 3D, such as the 3A The square or rectangle shown in the figure, the trapezoid as shown in Figure 3C, or the triangle as shown in Figure 3E.

現在參考第4圖,展示包括至少一個光源40之光導板26,該至少一個光源可光學耦合至玻璃基板28之邊緣表面29,例如,鄰近於邊緣表面29定位。如本文中所使用,術語「光學耦合」意欲指示光源係位於LGP之邊緣處,以便將光引入至LGP中。光源可光學耦合至LGP,即使該光源不與LGP實體接觸。額外光源(未圖示)亦可光學耦合至LGP之其他邊緣表面,諸如鄰近或對置之邊緣表面。Referring now to FIG. 4, there is shown a light guide plate 26 including at least one light source 40 that can be optically coupled to an edge surface 29 of a glass substrate 28, for example, positioned adjacent to the edge surface 29. As used herein, the term "optical coupling" is intended to indicate that the light source is located at the edge of the LGP in order to introduce light into the LGP. The light source can be optically coupled to the LGP, even if the light source is not in physical contact with the LGP. Additional light sources (not shown) can also be optically coupled to other edge surfaces of the LGP, such as adjacent or opposed edge surfaces.

自光源40射入至LGP中之光可由於全內反射(total internal reflection; TIR)而沿著如箭頭161所指示的LGP之長度L傳播,直至光以小於臨界角之入射角照在界面上。TIR係在包含第一折射率之第一材料(例如,玻璃、塑膠等)中傳播之光可在具有包含小於第一折射率之第二折射率的第二材料(例如,空氣等)之界面處全部反射之現象。TIR可使用斯涅耳定律來解釋:Light incident into the LGP from the light source 40 can propagate along the length L of the LGP as indicated by arrow 161 due to total internal reflection (TIR) until the light strikes the interface at an incident angle less than the critical angle . TIR is that light propagating in a first material (for example, glass, plastic, etc.) containing a first refractive index can pass through an interface with a second material (for example, air, etc.) containing a second refractive index less than the first refractive index The phenomenon of total reflection. TIR can be explained using Snell's law:

(1)

Figure 02_image001
, 該定律描述折射率不同之兩種材料之間的界面處的光折射。根據斯涅耳定律,n1 係第一材料之折射率,n2 係第二材料之折射率,θi 係界面處入射的光相對於界面之法線之角度(入射角),且θr 係折射光相對於法線的折射角。當折射角(θr )為90º,例如,sin(θr ) = 1時,斯涅耳定律可表達為:(1)
Figure 02_image001
This law describes the refraction of light at the interface between two materials with different refractive indices. According to Snell's law, n 1 is the refractive index of the first material, n 2 is the refractive index of the second material, θ i is the angle (incident angle) of light incident at the interface relative to the normal of the interface, and θ r The angle of refraction of the refracted light relative to the normal. When the angle of refraction (θ r ) is 90º, for example, sin(θ r ) = 1, Snell's law can be expressed as:

(2)

Figure 02_image003
(2)
Figure 02_image003

此等條件下之入射角θi亦可被稱為臨界角θc 。具有大於臨界角之入射角(θi > θc )的光將在第一材料內全內反射,而具有等於或小於臨界角之入射角(θi > θc )的光將大部分由第一材料透射。The incident angle θi under these conditions may also be referred to as the critical angle θ c . Light with an incident angle greater than the critical angle (θ i > θ c ) will be totally internally reflected in the first material, while light with an incident angle equal to or less than the critical angle (θ i > θ c ) will mostly One material transmits.

在空氣(n1 =1)與玻璃(n2 =1.5)之間的例示性界面之情況下,臨界角(θc )可計算為41º。因此,若在玻璃中傳播之光以大於41º之入射角照在空氣-玻璃界面上,則全部入射光將以等於入射角之角度自界面反射。若反射光碰到包含與第一界面相同之折射率關係的第二界面,則入射在第二界面上之光將以等於入射角之反射角再次反射。In the case of an exemplary interface between air (n 1 =1) and glass (n 2 =1.5), the critical angle (θ c ) can be calculated as 41º. Therefore, if the light propagating in the glass impinges on the air-glass interface at an angle of incidence greater than 41º, all the incident light will be reflected from the interface at an angle equal to the angle of incidence. If the reflected light hits a second interface containing the same refractive index relationship as the first interface, the light incident on the second interface will be reflected again at a reflection angle equal to the incident angle.

在一些實施例中,聚合物平台72可安置於玻璃基板28之一主表面(諸如與第二主表面170對置之發光表面160)上。微結構70之陣列可與安置於LGP之表面160及170上之其他光學膜(例如,一反射器膜及一或多個漫射器膜,未圖示)一起在如虛箭頭162所指示的向前方向上(例如,朝向使用者)引導光透射。在一些實施例中,光源40可為朗伯光源,諸如發光二極體(light emitting diode; LED)。來自LED之光可在LGP內快速地展開,此對實現區域調光(例如,藉由關閉一或多個LED)可成為挑戰。然而,藉由提供在LGP之表面上的在光傳播方向(如第4圖中之箭頭161所指示)上伸長之一或多個微結構,可有可能限制光之展開,使得每一LED源僅有效地照明LGP之窄條帶。經照明之條帶可例如自LED處之起始點延伸至對置邊緣上的類似終點。因而,使用各種微結構配置,可有可能以相對有效之方式實現對LGP之至少一部分的一維(1D)區域調光。In some embodiments, the polymer platform 72 may be disposed on one of the major surfaces of the glass substrate 28 (such as the light emitting surface 160 opposite the second major surface 170). The array of microstructures 70 can be shown as indicated by the dashed arrow 162 along with other optical films (eg, a reflector film and one or more diffuser films, not shown) disposed on the surfaces 160 and 170 of the LGP The light transmission is directed in the forward direction (for example, towards the user). In some embodiments, the light source 40 may be a Lambertian light source, such as a light emitting diode (LED). The light from the LEDs can quickly expand within the LGP, which can be a challenge to achieve area dimming (eg, by turning off one or more LEDs). However, by providing one or more microstructures extending on the surface of the LGP in the direction of light propagation (as indicated by arrow 161 in Figure 4), it may be possible to limit the spread of light so that each LED source Only effectively illuminate the narrow strip of LGP. The illuminated strip may, for example, extend from the starting point at the LED to a similar end point on the opposite edge. Thus, using various microstructure configurations, it may be possible to achieve one-dimensional (1D) area dimming of at least a portion of the LGP in a relatively efficient manner.

根據一或多個實施例,光導板係藉由塗覆一輻射可固化材料來製造,該輻射可固化材料例如允許圖案化在玻璃基板表面上之伸長聚合物微結構以提供玻璃LGP之充足光學性質及高溫度及濕度中之可靠性以及機械強度之樹脂組合物。如本文中所使用,「輻射可固化」係指利用由紫外線、紅外線或可見光提供之光能或熱能來引發固化反應之材料。在一些實施例中,由輻射源發射之光與樹脂組合物中之光引發劑反應,以形成聚合物微結構。輻射可固化材料之實例包括丙烯酸酯(例如,甲基丙烯酸酯)及環氧物。在一或多個實施例中,提供一方法,該方法允許圖案化以提供複數個多層微結構,至少一個微結構具有一最大高度H、在該最大高度之一半(H/2)處量測的一寬度W及在約0.1至約10之一範圍內之一比W/H。該比W/H亦可被稱為該伸長聚合物微結構之縱橫比。According to one or more embodiments, the light guide plate is manufactured by coating a radiation curable material, such as an elongated polymer microstructure that allows patterning on the surface of the glass substrate to provide sufficient optics for the glass LGP Resin composition with properties and reliability in high temperature and humidity and mechanical strength. As used herein, "radiation curable" refers to a material that uses light energy or heat energy provided by ultraviolet, infrared, or visible light to initiate a curing reaction. In some embodiments, the light emitted by the radiation source reacts with the photoinitiator in the resin composition to form a polymer microstructure. Examples of radiation curable materials include acrylates (eg, methacrylates) and epoxy. In one or more embodiments, a method is provided that allows patterning to provide a plurality of multilayer microstructures, at least one microstructure having a maximum height H, measured at one-half (H/2) of the maximum height A width W and a ratio W/H in the range of about 0.1 to about 10. The ratio W/H may also be referred to as the aspect ratio of the elongated polymer microstructure.

現在參考第5圖,一或多個實施例提供係安置於玻璃基板28上之聚合物多層微結構70的伸長聚合物微結構。第5圖根據本發明之一實施例展示在玻璃基板28上之單一聚合物多層微結構70的放大橫截面圖。儘管第5圖中所示之實施例具有類似於第3D圖中所示之聚合物多層微結構70的半圓形橫截面,但將理解,該等聚合物多層微結構可為適合光導板使用之任何橫截面形狀,諸如第3A圖至第3E圖中所示之彼等橫截面形狀。在第5圖中,聚合物多層微結構70包含安置於玻璃基板28上之第一聚合物層70a、安置於第一聚合物層70a上之第二聚合物層70b及安置於第二聚合物層70b上之第三聚合物層70c。個別聚合物層之數目「n」不限於第5圖中所示之三個層70a、70b及70c。在一或多個實施例中,個別層之數目「n」可在2至25之一範圍內,例如3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19或20。如下文將進一步描述,本發明之實施例提供包含一玻璃基板之一光導板,該玻璃基板包含複數個聚合物多層微結構,其中層之數目「n」在2至20或2至15或2至10或2至5之範圍內。在一些實施例中,個別層中之每一者在沉積下一層之前部分地固化。在一或多個實施例中,「部分地固化」包括在20%至80%、20%至70%、20%至60%、20%至50%、20%至40%、40%至60%、40%至80%、50%至60%、50%至80%或60%至80%之範圍內之固化。Referring now to FIG. 5, one or more embodiments provide an elongated polymer microstructure that is a polymer multilayer microstructure 70 disposed on a glass substrate 28. FIG. 5 shows an enlarged cross-sectional view of a single polymer multilayer microstructure 70 on a glass substrate 28 according to an embodiment of the present invention. Although the embodiment shown in FIG. 5 has a semicircular cross-section similar to the polymer multilayer microstructure 70 shown in FIG. 3D, it will be understood that the polymer multilayer microstructures may be suitable for use in light guide plates Any cross-sectional shape, such as those shown in FIGS. 3A to 3E. In FIG. 5, the polymer multilayer microstructure 70 includes a first polymer layer 70a disposed on the glass substrate 28, a second polymer layer 70b disposed on the first polymer layer 70a, and a second polymer The third polymer layer 70c on layer 70b. The number "n" of individual polymer layers is not limited to the three layers 70a, 70b, and 70c shown in FIG. In one or more embodiments, the number "n" of individual layers may be in the range of 2 to 25, such as 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14 , 15, 16, 17, 18, 19 or 20. As will be described further below, an embodiment of the present invention provides a light guide plate including a glass substrate including a plurality of polymer multilayer microstructures, wherein the number of layers "n" is between 2 and 20 or between 2 and 15 or 2. To 10 or 2 to 5. In some embodiments, each of the individual layers is partially cured before depositing the next layer. In one or more embodiments, "partially cured" includes 20% to 80%, 20% to 70%, 20% to 60%, 20% to 50%, 20% to 40%, 40% to 60 %, 40% to 80%, 50% to 60%, 50% to 80% or 60% to 80% in the range of curing.

現在參考第6A圖,示意性地展示了聚合物多層微結構之一實施例之例示性非限制性橫截面,在此情況下,該橫截面係圓之截面,其中W、H及θ分別為該形狀之寬度、高度及接觸角。第6B圖係隨縱橫比W/H (寬度/高度)變化之接觸角的圖。扁豆狀特徵之光學設計需要低縱橫比,至少W/H > 10。一般而言,根據一或多個實施例,W/H之值愈低,波導對光之限制效應愈大。根據一些實施例,接觸角θ反而大於對應於W/H > 5之45°。然而,藉由用前驅液體組合物進行印刷來創建此結構可具有挑戰性。對於此高接觸角值,印刷之液體線由於瑞利-泰勒不穩定性而變得不穩定,且如第7B圖及第7C圖中所描繪地分解成小滴。Referring now to FIG. 6A, an exemplary non-limiting cross-section of an embodiment of a polymer multilayer microstructure is schematically shown. In this case, the cross-section is a circular cross-section, where W, H, and θ are respectively The width, height and contact angle of the shape. Fig. 6B is a diagram of the contact angle varying with the aspect ratio W/H (width/height). Lentil-like optical design requires a low aspect ratio, at least W/H> 10. Generally speaking, according to one or more embodiments, the lower the value of W/H, the greater the limiting effect of the waveguide on light. According to some embodiments, the contact angle θ is instead greater than 45° corresponding to W/H>5. However, creating this structure by printing with a precursor liquid composition can be challenging. For this high contact angle value, the printed liquid line becomes unstable due to Rayleigh-Taylor instability and breaks down into droplets as depicted in Figures 7B and 7C.

第7A圖展示可形成聚合物微結構70之材料的穩定、未受干擾之連續伸長珠粒。第7B圖展示具有接觸角θ之擾動液體珠粒,該接觸角在接觸線自由移動時保持固定在平衡值。第7C圖展示具有取決於沉積速度,但在零速度下減小至平衡值之接觸角的液體珠粒,及具有在接觸角自由改變時停止在平行狀態之接觸線的珠粒。關於在固體表面上之液體珠粒穩定性之其他細節,參見Schiaffaino及Sonin的在固體表面上之液體及熔融珠粒之形成及穩定性(Formation and stability of liquid and molten beads on a solid surface) (J. Fluid Mech.第343卷第95至110頁(1997))。比凝固機制進行更快之不穩定性將導致珠粒不均勻。Figure 7A shows stable, undisturbed, continuous elongated beads of material that can form the polymer microstructure 70. Figure 7B shows a disturbed liquid bead with a contact angle θ, which remains fixed at an equilibrium value when the contact line moves freely. Figure 7C shows liquid beads with a contact angle that depends on the deposition rate, but decreases to an equilibrium value at zero speed, and beads with a contact line that stops in a parallel state when the contact angle changes freely. For other details about the stability of liquid beads on a solid surface, see Schiaffeaino and Sonin's Formation and stability of liquid and molten beads on a solid surface (Formation and stability of liquid and molten beads on a solid surface) ( J. Fluid Mech. Vol. 343, pages 95 to 110 (1997)). Instability that proceeds faster than the coagulation mechanism will result in uneven beads.

判定存在用於減輕珠粒不穩定性之兩種方式。一種方法涉及糙化用於形成光導板之基板的玻璃表面,使得接觸線保持固定。然而,此需要用於獲得粗糙玻璃表面之額外處理。判定珠粒不穩定性可藉由至少部分地固化沉積之可固化材料以增大材料之黏性且防止不穩定性在沉積期間演變來避免。藉由依序沉積且至少部分地固化沉積之個別層,繼而以相同方式沉積且固化額外個別層,發現可形成複數個多層微結構,其中至少一個微結構具有一最大高度H及在該最大高度之一半(H/2)處量測的一寬度W,且包含在約0.1至約10、例如約2至9、約2至約8、約2至約7、約2.5至約6或約2.5至約5之一範圍內之一比W/H。It is determined that there are two ways to reduce bead instability. One method involves roughening the glass surface of the substrate used to form the light guide plate so that the contact lines remain fixed. However, this requires additional treatment for obtaining a rough glass surface. The determination of bead instability can be avoided by at least partially curing the deposited curable material to increase the viscosity of the material and prevent the instability from evolving during deposition. By sequentially depositing and at least partially curing the deposited individual layers, and then depositing and curing additional individual layers in the same manner, it was found that a plurality of multilayer microstructures can be formed, at least one of which has a maximum height H and a maximum height at the maximum height A width W measured at half (H/2), and included in about 0.1 to about 10, such as about 2 to 9, about 2 to about 8, about 2 to about 7, about 2.5 to about 6, or about 2.5 to The ratio W/H is within a range of about 5.

本發明之一或多個實施例提供方法,該等方法包含以下步驟:在液體已沉積之後幾乎立即或瞬時地連續地分配藉由輻射(例如,紫外線(ultraviolet; UV)照明、紅外線(infrared; IR)或熱能)至少部分地固化之一可固化液體。在一或多個實施例中,「在沉積之後幾乎立即」及「在沉積之後瞬時地」意味著該可固化液體係在沉積該可固化液體之後小於30秒、小於20秒、小於10秒、小於5秒、小於4秒、小於3秒、小於2秒、小於0.9秒、小於0.8秒、小於0.7秒、小於0.6秒、小於0.5秒、小於0.4秒、小於0.3秒、小於0.2秒或小於0.1秒固化。在沉積聚合物液體之後開始固化的時間將取決於液體之黏度及液體在玻璃面板上之穩定性,該兩者可用實驗方式判定。然而,一般而言,固化程度及固化時間應經選擇以防止珠粒變得不穩定。One or more embodiments of the present invention provide methods including the steps of: distributing by radiation (eg, ultraviolet (ultraviolet; UV) illumination, infrared (infrared) continuously, almost immediately or instantaneously after the liquid has been deposited IR) or thermal energy) at least partially curing one of the curable liquids. In one or more embodiments, "almost immediately after deposition" and "instantaneously after deposition" means that the curable liquid system is less than 30 seconds, less than 20 seconds, less than 10 seconds after depositing the curable liquid, Less than 5 seconds, less than 4 seconds, less than 3 seconds, less than 2 seconds, less than 0.9 seconds, less than 0.8 seconds, less than 0.7 seconds, less than 0.6 seconds, less than 0.5 seconds, less than 0.4 seconds, less than 0.3 seconds, less than 0.2 seconds, or less than 0.1 Seconds curing. The time to start curing after depositing the polymer liquid will depend on the viscosity of the liquid and the stability of the liquid on the glass panel, both of which can be determined experimentally. However, in general, the degree of curing and curing time should be selected to prevent the beads from becoming unstable.

一或多個實施例包括形成伸長聚合物微結構之一程序,該程序包含沉積一可固化液體(例如,光學清透之UV可固化墨水)及在沉積之後瞬時地至少部分地固化該可固化液體。在一些實施例中,使用一連續可固化液體分配器及一瞬輻射時固化(例如,UV固化、IR固化或熱固化)程序在一玻璃基板之一主表面上連續地製造伸長聚合物微結構。在一或多個實施例中,提供伸長聚合物微結構之連續形成,其涉及分配之可固化液體的原位固化,從而固定墨水之接觸線。「接觸線」係指沉積在玻璃基板上之可固化材料之接觸線。另外,在一或多個實施例中,該方法可重複多於一次,以創建包含多個層之微結構(在本文中被稱為伸長聚合物多層微結構),由此創建用於1D調光之所要縱橫比。One or more embodiments include a process of forming an elongated polymer microstructure that includes depositing a curable liquid (eg, optically clear UV curable ink) and curing the curable at least partially instantaneously after deposition liquid. In some embodiments, a continuous curable liquid dispenser and an instant radiation curing (eg, UV curing, IR curing, or thermal curing) process are used to continuously manufacture elongated polymer microstructures on a major surface of a glass substrate. In one or more embodiments, continuous formation of an elongated polymer microstructure is provided, which involves in-situ curing of the dispensable curable liquid, thereby fixing the contact line of the ink. "Contact line" refers to the contact line of the curable material deposited on the glass substrate. Additionally, in one or more embodiments, the method can be repeated more than once to create a microstructure containing multiple layers (referred to herein as an elongated polymer multilayer microstructure), thereby creating a The aspect ratio of light.

在特定實施例中,將商業連續液體分配器(可自GPD Global, Inc. (Grand Junction, Colorado)獲得之GPD Max系列PCD3H)用於在玻璃上製造伸長聚合物微結構,及在形成具有用於1D調光之所要縱橫比的光導板時製造扁豆狀圖案。In a specific embodiment, a commercial continuous liquid dispenser (GPD Max series PCD3H available from GPD Global, Inc. (Grand Junction, Colorado)) is used to manufacture elongated polymer microstructures on glass and is useful in forming Lentil-like patterns are produced on the light guide plate of the desired aspect ratio for 1D dimming.

根據一或多個實施例,連續分配程序避免在可固化液體自分配器彈出時形成離散液滴。在一些實施例中,設備包括一液體分配器及直接跟在該分配器之後的一累積輻射(例如,UV能或熱能)固化系統。此允許在該可固化液體分配在玻璃表面上之後即至少部分地固化該可固化液體(例如,墨水),此又防止墨水之脫濕。在一些實施例中,在原位固化不存在之情況下,墨水並不保持為直線,且由於瑞利-浦拉托不穩定性而產生正弦形狀或甚至離散液滴。According to one or more embodiments, the continuous dispensing procedure avoids the formation of discrete droplets when the curable liquid is ejected from the dispenser. In some embodiments, the device includes a liquid dispenser and a cumulative radiation (eg, UV energy or thermal energy) curing system directly following the dispenser. This allows the curable liquid (eg, ink) to be at least partially cured after the curable liquid is dispensed on the glass surface, which in turn prevents dewetting of the ink. In some embodiments, in the absence of in-situ curing, the ink does not maintain a straight line, and a sinusoidal shape or even discrete droplets are generated due to Rayleigh-Purato instability.

在一或多個實施例中,伸長聚合物微結構及伸長聚合物多層微結構可使用具有固化頭之噴墨印表機形成。舉例而言,進行實驗以使用具有1440 dpi之解析度的商用壓電噴墨印表機及光學清透之UV可固化墨水使用噴墨印刷製程形成在玻璃基板上建立之伸長聚合物微結構。該噴墨印表機具有在每個遍次中使UV墨水固化之內建LED UV固化系統。在每一遍次之後的原位固化幫助將液滴「固定」至表面。根據一些實施例,在第一步驟中,藉由使用Adobe® illustrator繪圖軟體檔案及將該檔案轉換成幕後排版檔案來建立寬150微米之具有150微米間隙微結構線的影像檔案。在第二步驟中,使用尺寸為8.5吋乘11吋之清透玻璃基板用作為用於印刷之基板。使用一可選矽烷層以控制噴墨滴在玻璃表面上之散佈。在第三步驟中,逐層地進行該光學清透UV墨水之噴墨印刷,且在每一層形成具有各種縱橫比之伸長多層微結構之後執行固化。輪廓儀量測係以50 μm/秒之掃描速度、100Hz之取樣速率及8000 μm之掃描長度使用Tencor P11進行。該等伸長微結構之高度自單層之8至10微米增加至雙層微結構之18微米。三層噴墨印刷之伸長微結構提供56微米之高度,且四層噴墨印刷之伸長微結構提供68微米之高度。伸長微結構之寬度係根據相同輪廓儀量測結果計算為168微米,從而產生用於三層噴墨印刷之伸長微結構的3:1之縱橫比及用於四層噴墨印刷之伸長微結構的2:1之縱橫比。三層及四層伸長產生1D調光效應。In one or more embodiments, the elongated polymer microstructure and the elongated polymer multilayer microstructure can be formed using an inkjet printer with a curing head. For example, experiments were conducted to use commercial piezoelectric inkjet printers with a resolution of 1440 dpi and optically clear UV curable inks to form elongated polymer microstructures established on glass substrates using an inkjet printing process. The inkjet printer has a built-in LED UV curing system that cures the UV ink in each pass. In-situ solidification after each pass helps "fix" the droplet to the surface. According to some embodiments, in the first step, an image file with a microstructure line with a gap of 150 micrometers and a width of 150 micrometers is created by using the Adobe® Illustrator drawing software file and converting the file into a behind-the-scenes typesetting file. In the second step, a clear glass substrate measuring 8.5 inches by 11 inches was used as the substrate for printing. An optional silane layer is used to control the spread of inkjet drops on the glass surface. In the third step, inkjet printing of the optically clear UV ink is performed layer by layer, and curing is performed after each layer forms an elongated multilayer microstructure having various aspect ratios. The profilometer measurement was performed using Tencor P11 at a scan speed of 50 μm/sec, a sampling rate of 100 Hz, and a scan length of 8000 μm. The height of these elongated microstructures increased from 8 to 10 microns in a single layer to 18 microns in a double-layered microstructure. The three-layer inkjet printed elongated microstructure provides a height of 56 microns, and the four-layer inkjet printed elongated microstructure provides a height of 68 microns. The width of the elongated microstructure is calculated as 168 microns based on the measurement results of the same profilometer, resulting in a 3:1 aspect ratio of the elongated microstructure for three-layer inkjet printing and the elongated microstructure for four-layer inkjet printing Aspect ratio of 2:1. Three-layer and four-layer elongation produce 1D dimming effect.

本文中所描述之該等方法允許藉由進行多個沉積與固化循環來形成具有地W/H比之扁豆狀結構。第8A圖至第8C圖係玻璃上之伸長聚合物微結構之俯視圖(第8A圖)及橫截面圖(第8B圖及第8C圖)的掃描電子顯微鏡(scanning electron microscope; SEM)照片。液氮冷凍斷裂導致該等扁豆狀結構自玻璃表面分層。第8A圖至第8C圖中所示之結構係使用利用原位UV固化之GPD Max系列PCD3H分配器藉由四個沉積與固化循環製造。每一扁豆狀線係藉由四個連續循環形成。對第8C圖之仔細檢查展示四個離散的個別層:在玻璃基板上之第一層70a、在第一層70a上之第二層70b、在第二層70b上之第三層70c及在第三層70c上之第四層70d。自第8A圖清楚可見,該等扁豆狀特徵相當直,而不具有不穩定之任何外觀。該等橫截面視圖展示四層遍次中之每一層。在每一遍次之後的固化鎖定特徵之形狀。此允許逐層地建立該等特徵以達到極低W/H比。舉例而言,在此情況下,寬度(W) = 170 μm,高度(H) = 60 μm,且W/H =2.8,此比率比所要的最大臨限值5低得多。可固化液體之細節包括光學墨水Norland 68TH低黏度、Norland 123TKHGA高黏度及MPOSS奈米氧化矽 + 1 wt% 1173 (光引發劑) + 2 wt% Texanol、MPOSS奈米氧化矽 + 1 wt% 1173 (光引發劑)+ 2 wt% Texanol +2 wt% IPA及MPOSS奈米氧化矽 + 1 wt% 1173 (光引發劑) + 2 wt% IPA。PCD3H分配器參數:74.3rpm之螺鑽速度及23mm/秒之線分配速度。在最後層已沉積之後,聚合物多層微結構可曝露於輻射以使聚合物多層微結構經歷額外固化,以增加固化程度。聚合物微結構之固化程度或百分比可藉由紅外線光譜法來判定。在一些實施例中,微結構之固化程度或百分比係藉由關聯樹脂之介電性質或藉由微結構的折射率之變化來判定。The methods described herein allow the formation of lentil-like structures with a ground W/H ratio by performing multiple deposition and curing cycles. Figures 8A to 8C are scanning electron microscope (SEM) photographs of a top view (Figure 8A) and a cross-sectional view (Figures 8B and 8C) of the elongated polymer microstructure on the glass. Liquid nitrogen freeze fracture causes the lentil-like structures to delaminate from the glass surface. The structures shown in Figures 8A through 8C are manufactured using four deposition and curing cycles using GPD Max series PCD3H dispensers that utilize in-situ UV curing. Each lentil line is formed by four consecutive cycles. A close inspection of Figure 8C shows four discrete individual layers: the first layer 70a on the glass substrate, the second layer 70b on the first layer 70a, the third layer 70c on the second layer 70b, and the The fourth layer 70d on the third layer 70c. It is clear from Figure 8A that the lentil-like features are fairly straight, without any unstable appearance. These cross-sectional views show each of the four layer passes. The shape of the locking feature after each pass is cured. This allows these features to be established layer by layer to achieve extremely low W/H ratios. For example, in this case, width (W) = 170 μm, height (H) = 60 μm, and W/H = 2.8, this ratio is much lower than the desired maximum threshold of 5. The details of the curable liquid include optical ink Norland 68TH low viscosity, Norland 123TKHGA high viscosity and MPOSS nanosilica + 1 wt% 1173 (photoinitiator) + 2 wt% Texanol, MPOSS nanosilica + 1 wt% 1173 ( Photoinitiator) + 2 wt% Texanol + 2 wt% IPA and MPOSS Nanosilica + 1 wt% 1173 (photoinitiator) + 2 wt% IPA. PCD3H distributor parameters: 74.3rpm auger speed and 23mm/sec line distribution speed. After the last layer has been deposited, the polymer multilayer microstructure may be exposed to radiation to subject the polymer multilayer microstructure to additional curing to increase the degree of curing. The degree or percentage of cure of the polymer microstructure can be determined by infrared spectroscopy. In some embodiments, the degree or percentage of cure of the microstructure is determined by the dielectric properties of the associated resin or by the change in the refractive index of the microstructure.

第9A圖及第9B圖展示利用原位UV固化使用GPD Max系列PCD3H分配器在自Corning, Inc. (Corning, NY)獲得之8吋乘11吋(20.3 cm乘27.9 cm) IRIS玻璃基板上建立的扁豆狀特徵之光學影像。利用四個沉積與固化循環。此實例中所使用之墨水係具有約20,000百分泊(cp)之低黏度的Norland光學68TH墨水。該等扁豆狀線具有約150 μm之寬度,該等特徵之間具有約150 μm之分離間隙。自此等影像清楚可見,可藉由此方法在大基板上製造界定良好之扁豆狀特徵。Figures 9A and 9B show the use of in-situ UV curing using the GPD Max series PCD3H dispenser built on an 8-inch by 11-inch (20.3 cm by 27.9 cm) IRIS glass substrate obtained from Corning, Inc. (Corning, NY) The optical image of the lentil-like features. Four deposition and curing cycles are utilized. The ink used in this example is Norland Optical 68TH ink with a low viscosity of about 20,000 percent poise (cp). The lentil-shaped lines have a width of about 150 μm, and there is a separation gap of about 150 μm between the features. From these images, it can be clearly seen that well-defined lentil-like features can be produced on large substrates by this method.

第10A圖及第10B圖展示與第9A圖及第9B中所示之結構類似的結構,但該等結構係由具有約500,000百分泊之黏度的高黏度Norland光學123TKHGA墨水製成。利用原位UV固化使用GPD Max系列PCD3H分配器在可自Corning, Inc. (Corning, NY)獲得之8吋乘11吋IRIS玻璃基板上建立扁豆狀特徵。利用四個沉積與固化循環。在此情況下,扁豆狀線寬度為約200 μm且分離間隙為約109 μm。第9A圖及第9B及第10A圖及第10B圖中所示之該等結構展示有可能利用具有在約20,000 cp至約500,000 cp範圍內之變化黏度的墨水來建立結構。具有約20,000 cp至約500,000 cp之變化黏度之商用墨水展示可分配且建立扁豆狀特徵的能力。Figures 10A and 10B show structures similar to those shown in Figures 9A and 9B, but these structures are made of high-viscosity Norland Optical 123TKHGA ink with a viscosity of approximately 500,000 percent poise. Lentil-like features were established on an 8-inch by 11-inch IRIS glass substrate available from Corning, Inc. (Corning, NY) using GPD Max series PCD3H dispensers using in-situ UV curing. Four deposition and curing cycles are utilized. In this case, the lenticular line width is about 200 μm and the separation gap is about 109 μm. The structures shown in Figures 9A and 9B and 10A and 10B show that it is possible to build structures using inks with varying viscosities ranging from about 20,000 cp to about 500,000 cp. Commercial inks with varying viscosities of about 20,000 cp to about 500,000 cp demonstrate the ability to dispense and establish lentil-like characteristics.

使用Zygo儀器量測第9A圖及第9B及第10A圖及第10B圖中所示之樣本的峰至谷(peak-to-valley; PV)高度。在第9A圖及第9B中,該等峰至谷高度為48微米,且在第10A圖及第10B中,該等峰至谷高度為58微米。視分配之材料的黏度、基板之表面張力及表面能而定,可將分配參數最佳化以在一個遍次或多個循環或遍次中印刷所需高度。The peak-to-valley (PV) heights of the samples shown in Figures 9A, 9B, 10A, and 10B were measured using a Zygo instrument. In Figures 9A and 9B, the peak-to-valley heights are 48 microns, and in Figures 10A and 10B, the peak-to-valley heights are 58 microns. Depending on the viscosity of the material being dispensed, the surface tension of the substrate and the surface energy, the dispense parameters can be optimized to print the desired height in one pass or multiple cycles or passes.

對280 mm x 215 mm裸玻璃樣本以及根據第9A圖至第9B圖及第10A圖至第10B圖製造之樣本實行的光局限性量測係使用CCD相機獲得。分配之樣本含有50至58微米之分配高度(H)、208至220微米之分配寬度(W),對應間隔(S)為120、92、80微米。如根據第11A圖至第11C圖中之影像可見,裸玻璃樣本(第11A圖,頂部)展示無光局限性,層壓扁豆狀結構(第11A圖,底部)展示光局限性(準直),且利用原位UV固化使用GPD Max系列PCD3H分配器製造的所有連續分散之樣本展示類似效應(第11B圖及第11C圖)。另外,與在輸出邊緣處之層壓樣本相比,利用原位UV固化使用GPD Max系列PCD3H分配器製造的所有連續分散之樣本展示無黃化(色移)。The measurement of the optical limitations of the 280 mm x 215 mm bare glass samples and the samples manufactured according to Figures 9A to 9B and 10A to 10B was obtained using a CCD camera. The distributed sample contains a distribution height (H) of 50 to 58 microns, a distribution width (W) of 208 to 220 microns, and corresponding intervals (S) of 120, 92, and 80 microns. As can be seen from the images in Figures 11A to 11C, the bare glass sample (Figure 11A, top) shows no light limitations, and the laminated lentil-like structure (Figure 11A, bottom) shows the light limitations (collimation) And, using in-situ UV curing using the GPD Max series of PCD3H dispensers, all continuously dispersed samples showed similar effects (Figure 11B and Figure 11C). In addition, compared to the laminated samples at the output edge, all continuously dispersed samples made using GPD Max series PCD3H dispensers using in-situ UV curing showed no yellowing (color shift).

第12A圖至第12B圖及第13圖展示以隨位置(mm)變化的正規化光學亮度之曲線表示的光局限性。所有樣本展示類似於層壓扁豆狀膜之窄光分佈。對於與輸入邊緣相距250 mm之所有樣本,達成用於150 mm調光寬度的大於80%之區域調光指數(local dimming index; LDI)。特別地,在與輸入邊緣相距250 mm之樣本WS01448中,達成用於150 mm調光寬度的大於87%之WS01448 LDI。在第12A圖及第12B圖中,樣本WS0 1448之光學限制量測結果展示1D調光之效應。裸玻璃及層壓扁豆狀膜展示為對照物。利用原位UV固化使用GPD Max系列PCD3H分配器製造的連續分散之扁豆狀結構展示類似於層壓膜之光局限性,但具有光學色移減小之附加優點。FIGS. 12A to 12B and FIG. 13 show the optical limitations expressed by a curve of normalized optical brightness that varies with position (mm). All samples showed a narrow light distribution similar to laminated lentil-shaped film. For all samples 250 mm away from the input edge, a local dimming index (LDI) greater than 80% for a 150 mm dimming width is achieved. In particular, in the sample WS01448 250 mm away from the input edge, a WS01448 LDI greater than 87% for a dimming width of 150 mm was achieved. In Figures 12A and 12B, the optical limit measurement results of sample WS0 1448 show the effect of 1D dimming. Bare glass and laminated lentil-shaped films are shown as controls. Continuous dispersion of lentil-like structures made with GPD Max series PCD3H dispensers using in-situ UV curing exhibits light limitations similar to laminated films, but has the added advantage of reduced optical color shift.

在第13圖中,樣本WS01443、WS01449、WS01448、WS01453之光學限制量測結果展示1D調光之效應。利用原位UV固化使用GPD Max系列PCD3H分配器製造的所有連續分散之扁豆狀結構展示類似於層壓膜之光局限性,但具有光學色移減小之附加優點。對於與輸入邊緣相距250 mm之所有樣本,達成用於150 mm寬度的大於80%之LDI。In Figure 13, the optical limit measurement results of samples WS01443, WS01449, WS01448, and WS01453 show the effect of 1D dimming. All continuously dispersed lentil-like structures manufactured using GPD Max series PCD3H dispensers using in-situ UV curing exhibit light limitations similar to laminated films, but with the added advantage of reduced optical color shift. For all samples 250 mm away from the input edge, an LDI greater than 80% for a width of 150 mm is achieved.

第14圖係根據本發明之一實施例的可用於連續地分配及固化一可固化液體之設備200之一實施例的方塊圖。泵或流體分配裝置216用於分配一可固化液體,該可固化液體可藉由輻射而固化至在箭頭234之方向上移動之玻璃基板上。在一些實施例中,泵或流體分配裝置216可為螺鑽泵或噴射閥或其他氣動或電氣控制之泵或閥,其中分配結構取決於提供至分配裝置之入口的流體。可使用其他類型之泵或流體分配機構,諸如時間-壓力系統。FIG. 14 is a block diagram of an embodiment of an apparatus 200 that can be used to continuously dispense and cure a curable liquid according to an embodiment of the present invention. The pump or fluid distribution device 216 is used to dispense a curable liquid that can be cured by radiation onto the glass substrate moving in the direction of arrow 234. In some embodiments, the pump or fluid distribution device 216 may be an auger pump or injection valve or other pneumatic or electrically controlled pump or valve, where the distribution structure depends on the fluid provided to the inlet of the distribution device. Other types of pumps or fluid distribution mechanisms can be used, such as time-pressure systems.

在一些實施例中,儲集器215儲存一定量之可固化液體且經由流體供應線223將該可固化液體供應至泵或流體分配裝置216。在一或多個實施例中,儲集器215可為注射器、筒或更大之容器。在第14圖中所示之實施例中,藉由由藉由調壓器閥220調節之空氣供應線218連接的外部供氣源219 (例如空氣壓縮機)對儲集器215加壓,以幫助將來自儲集器215之流體遞送至泵或流體分配裝置216之入口。在一些實施例中,可藉由其他機械設備對儲集器加壓,該等機械設備諸如注射器機構或液壓或電氣裝置,例如馬達或其他電氣運動裝置。In some embodiments, the reservoir 215 stores a certain amount of curable liquid and supplies the curable liquid to the pump or fluid distribution device 216 via the fluid supply line 223. In one or more embodiments, the reservoir 215 may be a syringe, barrel, or larger container. In the embodiment shown in FIG. 14, the reservoir 215 is pressurized by an external air supply source 219 (eg, an air compressor) connected by an air supply line 218 regulated by a regulator valve 220, to Helps deliver fluid from the reservoir 215 to the inlet of a pump or fluid distribution device 216. In some embodiments, the reservoir may be pressurized by other mechanical devices, such as syringe mechanisms or hydraulic or electrical devices, such as motors or other electrical motion devices.

在一或多個實施例中,壓力感測器217可用於偵測處於儲集器215與至泵或流體分配裝置216之入口之間的流體供應線223中的流體壓力。壓力感測器217可用於調節供應至儲集器215之空氣壓力,在一些實施例中,該調節可藉由偵測流體壓力之變化來達成。In one or more embodiments, the pressure sensor 217 can be used to detect the fluid pressure in the fluid supply line 223 between the reservoir 215 and the inlet to the pump or fluid distribution device 216. The pressure sensor 217 may be used to adjust the air pressure supplied to the reservoir 215. In some embodiments, the adjustment may be achieved by detecting changes in fluid pressure.

在一些實施例中,控制器221接收來自壓力感測器217之呈數位或類比格式之壓力讀數226。在第14圖中所示之實施例中,控制器221係配置為以壓力感測器信號226作為回饋信號之一回饋控制器。控制器221之輸出係施加至在自供氣源219通向儲集器215之空氣壓力線218中的調壓器閥220之控制信號227 (即,控制電壓),如第14圖所示。此回饋配置(包括壓力感測器217、控制器221及調壓器閥220)回應於藉由壓力感測器217量測之流體壓力來有效地調節供應至儲集器215之空氣壓力以維持流體供應線中之預定流體壓力,且由此幫助維持至泵216的恆定輸入流體壓力。反過來,此幫助在分配器尖端或噴嘴228處維持藉由泵或流體分配裝置216分配之流體圖案的更均勻性質(例如,關於第一分配、液滴大小、線寬度及體積與重量重複性)。替代地,若儲集器215係藉由其他手段加壓,則控制器221可用於調變及調節施加至儲集器215之壓力。In some embodiments, the controller 221 receives the pressure reading 226 from the pressure sensor 217 in a digital or analog format. In the embodiment shown in FIG. 14, the controller 221 is configured as a feedback controller that uses the pressure sensor signal 226 as one of the feedback signals. The output of the controller 221 is applied to the control signal 227 (ie, control voltage) of the regulator valve 220 in the air pressure line 218 leading from the air supply source 219 to the reservoir 215, as shown in FIG. This feedback configuration (including the pressure sensor 217, the controller 221, and the regulator valve 220) responds to the fluid pressure measured by the pressure sensor 217 to effectively adjust the air pressure supplied to the reservoir 215 to maintain The predetermined fluid pressure in the fluid supply line, and thus helps maintain a constant input fluid pressure to the pump 216. In turn, this helps maintain more uniform properties of the fluid pattern dispensed by the pump or fluid dispensing device 216 at the dispenser tip or nozzle 228 (e.g., with respect to the first dispensing, droplet size, line width, and volume and weight repeatability ). Alternatively, if the reservoir 215 is pressurized by other means, the controller 221 may be used to modulate and adjust the pressure applied to the reservoir 215.

應理解,可使用多種不同類型之控制器。此外,廣泛多種控制演算法中之任一者可供控制器221使用。舉例而言,控制器221可經配置以調節空氣壓力以維持量測之流體壓力中的預定設定點。此可在具有或不具圍繞所要設定點之死帶之情況下進行,以避免對至儲集器215之空氣壓力的過度調節。若量測之流體壓力落在預定下限之下,則控制器221向上調整空氣供應壓力。若量測流體壓力升高超過預定上限,則控制器221向下調整空氣供應壓力。比例積分微分(proportional, integral, differential; PID)控制演算法亦可用於使用流體壓力作為回饋信號來調節空氣供應壓力。.It should be understood that many different types of controllers can be used. In addition, any one of a wide variety of control algorithms can be used by the controller 221. For example, the controller 221 may be configured to adjust the air pressure to maintain a predetermined set point in the measured fluid pressure. This can be done with or without a dead band around the desired set point to avoid excessive adjustment of the air pressure to the reservoir 215. If the measured fluid pressure falls below a predetermined lower limit, the controller 221 adjusts the air supply pressure upward. If the measured fluid pressure rises above a predetermined upper limit, the controller 221 adjusts the air supply pressure downward. Proportional integral differential (proportional, integral, differential; PID) control algorithms can also be used to adjust the air supply pressure using fluid pressure as a feedback signal. .

例如紫外線固化燈、紅外線固化燈或熱能源之輻射源230係鄰近分配器尖端或噴嘴228定位,使得當基板移動經過分配器尖端或噴嘴228時,可固化聚合物流體分配在玻璃基板上,接著在該液體已沉積之後幾乎立即或瞬時地藉由輻射(例如,紫外線(ultraviolet; UV)照明或熱能)至少部分地固化。在一或多個實施例中,「在沉積之後幾乎立即」及「在沉積之後瞬時地」意味著可固化液體在該可固化液體沉積之後小於30秒、小於20秒、小於10秒、小於5秒、小於4秒、小於3秒、小於2秒、小於0.9秒、小於0.8秒、小於0.7秒、小於0.6秒、小於0.5秒、小於0.4秒、小於0.3秒、小於0.2秒或小於0.1秒固化。玻璃基板可置放於一合適設備上,以允許該基板以所要速率移動經過分配器尖端或噴嘴228、然後經過輻射源230,使得該輻射源可使該可固化液體至少部分地固化。輻射源230與控制器221通信,該控制器經由一硬線或無線連接來發送控制信號,以打開及關閉輻射源且判定將由輻射源230發射以使該可固化液體至少部分地固化的輻射之量。The radiation source 230, such as an ultraviolet curing lamp, an infrared curing lamp, or a thermal energy source, is positioned adjacent to the dispenser tip or nozzle 228 so that when the substrate moves past the dispenser tip or nozzle 228, the curable polymer fluid is distributed on the glass substrate, and then After the liquid has been deposited, it is at least partially cured by radiation (for example, ultraviolet (UV) lighting or thermal energy) almost immediately or instantaneously. In one or more embodiments, "almost immediately after deposition" and "instantaneously after deposition" means that the curable liquid is less than 30 seconds, less than 20 seconds, less than 10 seconds, less than 5 after deposition of the curable liquid Seconds, less than 4 seconds, less than 3 seconds, less than 2 seconds, less than 0.9 seconds, less than 0.8 seconds, less than 0.7 seconds, less than 0.6 seconds, less than 0.5 seconds, less than 0.4 seconds, less than 0.3 seconds, less than 0.2 seconds or less than 0.1 seconds . The glass substrate can be placed on a suitable device to allow the substrate to move through the dispenser tip or nozzle 228 at a desired rate and then through the radiation source 230 so that the radiation source can at least partially cure the curable liquid. The radiation source 230 communicates with the controller 221, which sends a control signal via a hard-wired or wireless connection to turn the radiation source on and off and determine the radiation that will be emitted by the radiation source 230 to at least partially cure the curable liquid the amount.

儘管單一分配器尖端或噴嘴228及輻射源230展示於第14圖中,但所示之實施例並非限制性的。舉例而言,第14圖中所示之設備可包括一陣列之分配器尖端或噴嘴228以分配可固化液體之多個珠粒,以在玻璃基板上形成複數個伸長聚合物微結構。舉例而言,該設備可包括間隔分開的2、3、4、5、6、7、8、9、10、11、12、13、14、15或至多25個分配器尖端噴嘴228,以在玻璃基板上分配聚合物流體且形成可用於形成具有1D調光特徵之光導板的複數個伸長聚合物微結構。輻射源230可為具有可固化多於單一伸長聚合物微結構之寬度的365 nm LED固化源,諸如Dymax UV固化光源38105-2000EC。在一些實施例中,可利用一陣列之輻射源,且該陣列之輻射源230與控制器221通信。在一些實施例中,該等伸長聚合物微結構之固化程度或百分比可在原位監測。換言之,利用一固化監測設備(例如一紅外線量測系統)或硬度量測。在一或多個實施例中,在聚合物多層微結構已藉由沉積多個層形成之後,該多層微結構進一步固化以增大聚合物材料之固化程度或百分比。Although a single distributor tip or nozzle 228 and radiation source 230 are shown in Figure 14, the illustrated embodiment is not limiting. For example, the apparatus shown in Figure 14 may include an array of dispenser tips or nozzles 228 to dispense multiple beads of curable liquid to form a plurality of elongated polymer microstructures on the glass substrate. For example, the device may include 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, or up to 25 dispenser tip nozzles 228 spaced apart to The polymer fluid is distributed on the glass substrate and forms a plurality of elongated polymer microstructures that can be used to form a light guide plate with 1D dimming characteristics. The radiation source 230 may be a 365 nm LED curing source having a width that can cure more than a single elongated polymer microstructure, such as a Dymax UV curing light source 38105-2000EC. In some embodiments, an array of radiation sources can be utilized, and the array of radiation sources 230 communicates with the controller 221. In some embodiments, the degree or percentage of curing of the elongated polymer microstructures can be monitored in situ. In other words, using a curing monitoring device (such as an infrared measurement system) or hardness measurement. In one or more embodiments, after the polymer multilayer microstructure has been formed by depositing multiple layers, the multilayer microstructure is further cured to increase the degree or percentage of cure of the polymer material.

在一或多個實施例中,該等伸長聚合物微結構係由高含矽聚合物(例如,大於15 wt.%,例如,15至50 wt.%或15-30 wt. %)製成,該等伸長聚合物微結構在可見波長下高度透明且提供具有較低色移之扁豆狀透鏡。在關於光導板之一或多個實施例中,該等伸長聚合物微結構形成具有以下吸光損失之扁豆狀透鏡:在可見波長範圍中小於10 dB/m,或在可見波長範圍中小於5 dB/m,或在可見波長範圍中小於2 dB/m。一或多個實施例提供一光導板,其中該玻璃基板與該等伸長聚合物微結構之間存在小於10%之折射率差。在一或多個實施例中,該等伸長聚合物微結構具有大於4H、例如大於6H之鉛筆硬度(如根據ASTM D3363 -針對膜硬度之標準測試方法-量測)。在一些實施例中,該等伸長聚合物微結構展現良好附著力,例如,使用帶附著力測試量測的大於3 B或大於5 B之附著力,使用ASTM D3359 - 根據帶測試的針對額定附著力之標準測試方法-量測之附著力。在一或多個實施例中,該等伸長聚合物微結構未展示環境老化情況下之色移,例如,基於該色移展現在可見波長範圍中小於10 dB/m或小於5 dB/m或小於2 dB/m之吸光損失。In one or more embodiments, the elongated polymer microstructures are made of highly silicon-containing polymers (eg, greater than 15 wt.%, eg, 15 to 50 wt.% or 15-30 wt.%) These elongated polymer microstructures are highly transparent at visible wavelengths and provide lenticular lenses with lower color shift. In one or more embodiments regarding the light guide plate, the elongated polymer microstructures form a lentil lens with the following absorption loss: less than 10 dB/m in the visible wavelength range, or less than 5 dB in the visible wavelength range /m, or less than 2 dB/m in the visible wavelength range. One or more embodiments provide a light guide plate in which there is a refractive index difference of less than 10% between the glass substrate and the elongated polymer microstructures. In one or more embodiments, the elongated polymer microstructures have a pencil hardness greater than 4H, for example greater than 6H (as measured according to ASTM D3363-Standard Test Method for Film Hardness). In some embodiments, the elongated polymer microstructures exhibit good adhesion, for example, using a tape adhesion test to measure adhesion greater than 3 B or greater than 5 B, using ASTM D3359-according to the tape test for rated adhesion Standard test method for force-measuring adhesion. In one or more embodiments, the elongated polymer microstructures do not exhibit color shift under environmental aging, for example, based on the color shift exhibiting less than 10 dB/m or less than 5 dB/m in the visible wavelength range or Less than 2 dB/m absorption loss.

在本發明之一些實施例中,該等伸長聚合物微結構係使用網版印刷及固化個別層而形成於玻璃基板上,以形成逐層多層微結構。在特定實施例中,在玻璃基板上網版印刷之伸長聚合物微結構長100至200 μm且在玻璃LGP之表面上的兩個伸長聚合物微結構之間以在50至100 μm寬度之範圍內之距離間隔分開。在一或多個實施例中,網版印刷及固化提供控制高度之能力,此允許縱橫比(定義為特徵之寬度/高度)自3/1改變至10/1。具有較高特徵實現高縱橫比(例如,更接近2/1),從而允許調節低至20 mm之區帶寬度。此將玻璃上之光傳播距離減至最小,減小由扁豆狀特徵引入之色移,且幫助減少由扁豆狀材料與玻璃之間的CTE失配引起之可靠性問題。In some embodiments of the present invention, the elongated polymer microstructures are formed on a glass substrate using screen printing and curing individual layers to form a layer-by-layer multilayer microstructure. In a particular embodiment, the elongated polymer microstructures screen-printed on the glass substrate are 100 to 200 μm long and between two elongated polymer microstructures on the surface of the glass LGP to be in the range of 50 to 100 μm width The distance is separated. In one or more embodiments, screen printing and curing provide the ability to control the height, which allows the aspect ratio (defined as the width/height of the feature) to be changed from 3/1 to 10/1. Having higher features achieves a high aspect ratio (for example, closer to 2/1), allowing adjustment of zone widths as low as 20 mm. This minimizes the light propagation distance on the glass, reduces the color shift introduced by the lentil-like features, and helps reduce reliability issues caused by the CTE mismatch between the lentil-like material and the glass.

在一些實施例中,具有有機(聚合物)伸長微結構構造之無機(玻璃)基板減小當將不同材料用於扁豆狀結構時沿著該結構出現的不同色彩之光(R、G、B)之色散或速度變化。此使得能夠使用射入白光LED。此外,已知聚合物體系特別在連續曝露於高光通量之情況下老化或「黃化」。此折射率變化係亦可伴隨增加之吸光之失效模式。In some embodiments, an inorganic (glass) substrate with an organic (polymer) elongated microstructure structure reduces the different colors of light (R, G, B) that appear along the structure when different materials are used for the lentil-like structure ) The dispersion or speed changes. This enables the use of white LEDs. In addition, known polymer systems age or "yellowing" especially under continuous exposure to high light flux. This refractive index change can also be accompanied by an increased light absorption failure mode.

在一些實施例中,為網版印刷選擇之該等輻射可固化材料含有無機組份及有機組份兩者。舉例而言,Si與C、H、O一起存在於聚合物材料中,其中大於15 wt.%之矽含量及小於45 wt.%之碳含量提供良好結果。藉由兩種方法來增加實驗基質中之矽含量:藉由(1)添加SiO2 奈米粒子(分散於基質中的約20 nm粒子,0至30 wt.%);或藉由(2)添加呈現聚矽倍半氧烷(RSiO3/2 )n 或聚矽烷(R2 SiO)n 形式之有機矽氧烷或有機矽酸鹽化學。In some embodiments, the radiation curable materials selected for screen printing contain both inorganic and organic components. For example, Si is present in polymer materials with C, H, and O, where a silicon content greater than 15 wt.% and a carbon content less than 45 wt.% provide good results. Increase the silicon content in the experimental matrix by two methods: by (1) adding SiO 2 nanoparticles (about 20 nm particles dispersed in the matrix, 0 to 30 wt.%); or by (2) Add organic siloxane or organosilicate chemistry in the form of polysilsesquioxane (RSiO 3/2 ) n or polysilane (R 2 SiO) n .

矽倍半氧烷係矽酸鹽材料,其中R係經由Si-C鍵鍵接至氧化矽之有機基團(或H)。矽倍半氧烷之結構已報告為隨機、籠狀及部分籠狀的(矽倍半氧烷,Suzuki 等人,Chem. Rev. (1995,95 (5),第1409至1430頁)。在一些實施例中,使用包含籠狀(T8)及隨機結構兩者之矽倍半氧烷,但許多其他結構在本發明之範疇內。在一些實施例中,可固化材料係利用UV光引發劑使用R基團之丙烯酸酯官能性來聚合及/或交聯,或使用R=羥基(-OH)官能性使用IR/熱來熱聚合及/或交聯(Hybrid Plastics及Gelest)。Silsesquioxane-based silicate materials, where R is bonded to the organic group (or H) of silicon oxide via Si-C bond. The structure of silsesquioxane has been reported to be random, cage-like and partially cage-like (silsesquioxane, Suzuki et al., Chem. Rev. (1995, 95 (5), pages 1409 to 1430). In some embodiments, silsesquioxanes containing both cage (T8) and random structures are used, but many other structures are within the scope of the present invention. In some embodiments, the curable materials utilize UV photoinitiators Use the acrylate functionality of the R group to polymerize and/or crosslink, or use the R=hydroxy (-OH) functionality to use IR/heat to thermally polymerize and/or crosslink (Hybrid Plastics and Gelest).

在一些實施例中,矽酮材料可用於形成該等伸長聚合物微結構。矽酮通常具有經由Si-C鍵附接至矽之兩個R基團,由於其黏彈性質而亦被稱為彈性體。矽酮可藉由熱引發劑來固化,其中高分子量直鏈藉由交聯而自高黏性塑膠狀態轉換成主要彈性狀態(合適材料可自Dow Corning及Gelest獲得)。In some embodiments, silicone materials can be used to form the elongated polymer microstructures. Silicones usually have two R groups attached to the silicon via Si-C bonds and are also called elastomers due to their viscoelastic properties. Silicones can be cured by thermal initiators, where high molecular weight linear chains are converted from a highly viscous plastic state to a mainly elastic state by crosslinking (suitable materials are available from Dow Corning and Gelest).

有機矽材料由於其針對許多進階光子及LED應用所需的熱及氧化穩定性而傾向於具有良好之熱穩定性(耐熱且耐冷、耐熱衝擊)、氧化、濕氣、化學品及紫外線輻射穩定性、光學清晰度以及透光度及環境老化情況下之低色移。第15圖展示使用具有大於10μm厚度之厚度的各種材料製造之經塗佈樣本的色移(在320 mm下之差量色度y值)。特別地,在老化前後量測在150 mm x 400 mm玻璃基板上的棒塗佈之樣本之色移。老化條件係持續4天處在90% RH、60℃下。左側Y軸描繪在320 mm距離下之色移差量y。關於RHS之Y軸描繪色移隨老化之增量%。Silicone materials tend to have good thermal stability (heat and cold resistance, thermal shock resistance), oxidation, moisture, chemicals, and ultraviolet radiation stability due to the thermal and oxidation stability required for many advanced photonics and LED applications Properties, optical clarity, light transmittance, and low color shift under aging conditions. Figure 15 shows the color shift (difference chromaticity y value at 320 mm) of coated samples made with various materials having a thickness greater than 10 μm thickness. In particular, the color shift of the bar-coated sample on a 150 mm x 400 mm glass substrate was measured before and after aging. The aging conditions were 90% RH and 60°C for 4 days. The Y axis on the left depicts the color shift difference y at a distance of 320 mm. The Y-axis of RHS depicts the% increase in color shift with aging.

在一或多個實施例中,如藉由使用分光輻射計(PR670,Photo Research)量測之色移在老化前後低於0.01/320 mm。使用聚甲基丙烯酸甲酯(polymethyl methacrylate; PMMA)及NEA 121 (UV可固化噻吩體系(UV固化,Norland opticals))作為用於比較之對照物。第15圖中所示之剩餘材料係含矽材料。PMMA展示極低之色移,且NEA121材料展示隨老化產生的相當明顯之黃化。In one or more embodiments, the color shift as measured by using a spectroradiometer (PR670, Photo Research) before and after aging is less than 0.01/320 mm. Polymethyl methacrylate (PMMA) and NEA 121 (UV curable thiophene system (UV curing, Norland opticals)) were used as controls for comparison. The remaining materials shown in Figure 15 are silicon-containing materials. PMMA shows very low color shift, and NEA121 material shows quite obvious yellowing with aging.

基於色移資料,判定三種含矽聚合物提供可接受之結果:聚二苯基矽氧烷(矽酮,熱固化120至250℃);具有氧化矽之UV可固化聚八面體矽倍半氧烷(MPOSS奈米,UV固化,365 nm UV曝光)及聚苯基矽倍半氧烷(熱固化,150至420℃固化)。所有三種含矽材料展示低色移。另外,矽酮提供密封裝置且保護裝置免於濕氣、灰塵及由衝擊及振動導致的機械應力所需的附著力、可撓性及彈性。Based on the color shift data, it was determined that the three silicon-containing polymers provided acceptable results: polydiphenylsiloxane (silicone, thermally cured at 120 to 250°C); UV-curable polyoctahedral silicon with silica Oxyalkylene (MPOSS nanometer, UV curing, 365 nm UV exposure) and polyphenylsilsesquioxane (thermal curing, curing at 150 to 420°C). All three silicon-containing materials exhibit low color shift. In addition, silicone provides a sealing device and protects the device from the adhesion, flexibility, and elasticity required by moisture, dust, and mechanical stress caused by shock and vibration.

根據一或多個實施例,一陣列之伸長聚合物微結構可形成於一玻璃基板上以提供如下所述形成之扁豆狀結構。IRIS™ LGP板表面展示於第16圖中,該圖展示一例示性四步驟程序。將理解,本發明不限於特定數目之步驟序列。在第一步驟中,獲得厚1.1 mm、8.5吋乘11吋 IRIS™玻璃基板(可自Corning, Incorporated獲得),且使用標準玻璃清潔程序使用半清透清潔劑、繼而使用去離子水來沖洗該玻璃基板,且在任何後續處理步驟之前將該玻璃基板儲存在恰當條件下。在第二步驟中,選擇用於網版印刷之具有形成光導板之扁豆狀透鏡結構的合適性質之可固化材料,且選擇具有恰當篩孔大小及百分比開口之篩網以達成具有所需印刷特徵之所要乳液厚度。接著,用用於印刷步驟之聚合物(一光學清透墨水)淹沒篩孔區域,且在達成篩網表面之充分潤濕時,使用變化之印刷速度(mm/秒)、間隙(mm)及印刷壓力來應用該印刷步驟。在此步驟中,印刷之墨水之濕厚度係受控的。在第三步驟中,將輻射施加至印刷之可固化材料,例如,直接應用於印刷之表面的UV或烘烤後步驟。額外步驟包括重複第二及第三步驟以達成重複之所要潤濕或固化厚度。According to one or more embodiments, an array of elongated polymer microstructures can be formed on a glass substrate to provide lentil-like structures formed as described below. The surface of the IRIS™ LGP board is shown in Figure 16, which shows an exemplary four-step procedure. It will be understood that the invention is not limited to a specific number of step sequences. In the first step, obtain a 1.1 mm thick, 8.5-inch by 11-inch IRIS™ glass substrate (available from Corning, Incorporated), and use standard glass cleaning procedures to use semi-clear cleaner, followed by deionized water to rinse the A glass substrate, and store the glass substrate under proper conditions before any subsequent processing steps. In the second step, select a curable material with suitable properties for the lenticular lens structure that forms the light guide plate for screen printing, and select a screen with the appropriate mesh size and percentage opening to achieve the desired printing characteristics Desired emulsion thickness. Next, the screen area is flooded with the polymer used in the printing step (an optical clear ink), and when sufficient wetting of the screen surface is achieved, varying printing speed (mm/sec), gap (mm) and Print pressure to apply this printing step. In this step, the wet thickness of the printed ink is controlled. In the third step, radiation is applied to the printed curable material, for example, a UV or post-bake step applied directly to the printed surface. Additional steps include repeating the second and third steps to achieve the desired wetted or cured thickness.

為了增大伸長聚合物微結構之印刷高度,網版印刷且評估使用具有感興趣之印刷特徵之不銹鋼材料的幾種篩孔大小(篩網厚度及打開面積)。下面之表中列出之濕厚度係使用由材料供應商提供之公式計算。濕厚度=篩網厚度*打開面積+乳液厚度。在全部情況下,印刷寬度隨乳液厚度增加而增大,此影響印刷高度。在縱橫比(W/H)為約8.3之情況下,所獲得之最大印刷高度為約29 μm。In order to increase the printing height of the elongated polymer microstructure, screen printing and evaluation of several mesh sizes (screen thickness and open area) using stainless steel materials with the printing characteristics of interest. The wet thickness listed in the table below is calculated using the formula provided by the material supplier. Wet thickness = screen thickness * opening area + emulsion thickness. In all cases, the printing width increases as the emulsion thickness increases, which affects the printing height. With an aspect ratio (W/H) of about 8.3, the maximum print height obtained is about 29 μm.

表1

Figure 108119285-A0304-0001
Table 1
Figure 108119285-A0304-0001

表2Table 2

實例A至O係基於MPOSS奈米/Texanol/引發劑配方;實例P至Q係基於MPOSS奈米/Dowanol/引發劑配方

Figure 108119285-A0304-0002
Examples A to O are based on MPOSS nano/Texanol/initiator formulations; Examples P to Q are based on MPOSS nano/Dowanol/initiator formulations
Figure 108119285-A0304-0002

執行可固化材料之流變篩選。對所選材料執行剪切掃掠(隨剪切速率0至100 s-1 及時間改變之黏度)量測及穩定剪切恢復量測兩者以理解網版印刷期間之黏度行為。Perform rheological screening of curable materials. Perform shear sweep (viscosity change with shear rate 0 to 100 s -1 and time) and stable shear recovery measurement on the selected material to understand the viscosity behavior during screen printing.

量測0.1/s至100/s之剪切掃掠以避免流動不穩定性。結果展示於第17圖及第18圖中。第17圖係表示含有Texanol溶劑之網版印刷墨水之穩定剪切掃掠(剪切黏度對剪切速率)的圖。第18圖係表示含有二乙二醇單甲基(Dowanol DPM™溶劑)之網版印刷墨水之穩定剪切掃掠(剪切黏度對剪切速率)的圖。結果展示所有無溶劑之MPOSS奈米氧化矽、MPOSS奈米氧化矽 + 1 wt% 1173 (光引發劑) + 2 wt% Texanol、MPOSS奈米氧化矽 + 1 wt% 1173 (光引發劑)+ 2 wt% Texanol +2 wt% IPA及MPOSS奈米氧化矽 + 1 wt% 1173 (光引發劑) + 2 wt% IPA係輕微剪切減黏的,且全部展示少量的觸變行為。此外,隨著Texanol (酯醇,Eastman Chemical Company)及/或異丙醇(IPA)量增加,黏度減小。相比之下,展現剪切減黏之樣本係利用MPOSS奈米氧化矽 + 1 wt% 1173 (光引發劑)體系由二丙烯甘醇單甲醚2 wt% (DiPGME, Dowanol DPM™)製成Measure the shear sweep from 0.1/s to 100/s to avoid flow instability. The results are shown in Figure 17 and Figure 18. Figure 17 is a graph showing the stable shear sweep (shear viscosity versus shear rate) of screen printing inks containing Texanol solvent. Figure 18 is a graph showing the stable shear sweep (shear viscosity versus shear rate) of screen printing inks containing diethylene glycol monomethyl (Dowanol DPM™ solvent). The results show all solvent-free MPOSS nanosilica, MPOSS nanosilica + 1 wt% 1173 (photoinitiator) + 2 wt% Texanol, MPOSS nanosilica + 1 wt% 1173 (photoinitiator) + 2 wt% Texanol + 2 wt% IPA and MPOSS Nanosilica + 1 wt% 1173 (photoinitiator) + 2 wt% IPA is slightly sheared and reduced viscosity, and all show a small amount of thixotropic behavior. In addition, as the amount of Texanol (ester alcohol, Eastman Chemical Company) and/or isopropyl alcohol (IPA) increases, the viscosity decreases. In contrast, the samples exhibiting shear thinning are made from MPOSS nanosilica + 1 wt% 1173 (photoinitiator) system made of dipropylene glycol monomethyl ether 2 wt% (DiPGME, Dowanol DPM™)

具有恢復之穩定剪切僅根據黏度來監控且用於查看該等結構如何恢復。使用23 C之50 mm錐板來進行測試。測試序列自60秒保持、繼之以60秒低剪切力(0.5 s-1)時間掃掠開始以建立黏度基線。接著使該等樣本經受高剪切力(100 s-1)歷時60秒,繼而經受低剪切力歷時1000秒,以監測混合物之恢復:(1) MPOSS奈米氧化矽 + 1173 1 wt% + Texanol 2 wt%,(2) MPOSS奈米氧化矽 + 1173 1 wt% + Texanol 4 wt%,(3) MPOSS奈米氧化矽 + 1173 1 wt% +Texanol 2 wt% + IPA 3 wt%,及(4) MPOSS奈米氧化矽 + 1173 1 wt % + DiPGME 2 wt %或5 wt%或10 wt%。上文標記為1至4之所有四種樣本似乎具有可量測之恢復時間,其中(2) MPOSS奈米氧化矽 1173 1% Tex 4%樣本最快,為大約90秒。混合物(1)及(3)用時較長,為大約10分鐘。混合物(4)之恢復在具有2 wt% DiPGME之情況下用時900秒,在具有5 wt% DiPGME之情況下用時大於1000秒,且在具有10 wt% DiPGME之情況下用時約900秒。此等樣本由於其黏度比其他三種樣本高得多而在第19圖至第20圖中單獨地繪製。Stable shear with recovery is only monitored based on viscosity and used to see how the structures recover. Use a 50 mm cone plate of 23 C for testing. The test sequence begins with a 60 second hold followed by a 60 second low shear (0.5 s-1) time sweep to establish a viscosity baseline. The samples were then subjected to high shear force (100 s-1) for 60 seconds and then to low shear force for 1000 seconds to monitor the recovery of the mixture: (1) MPOSS Nanosilica + 1173 1 wt% + Texanol 2 wt%, (2) MPOSS nanosilica + 1173 1 wt% + Texanol 4 wt%, (3) MPOSS nanosilica + 1173 1 wt% + Texanol 2 wt% + IPA 3 wt%, and ( 4) MPOSS Nanosilica + 1173 1 wt% + DiPGME 2 wt% or 5 wt% or 10 wt%. All four samples labeled 1 to 4 above seem to have measurable recovery times, with (2) MPOSS Nanosilica 1173 1% Tex 4% samples being the fastest, at about 90 seconds. Mixtures (1) and (3) took longer, about 10 minutes. The recovery of the mixture (4) took 900 seconds with 2 wt% DiPGME, more than 1000 seconds with 5 wt% DiPGME, and about 900 seconds with 10 wt% DiPGME . These samples are plotted separately in Figures 19 to 20 because their viscosity is much higher than the other three samples.

第21圖展示與裸玻璃LGP(左)及具有層壓扁豆狀膜之玻璃LGP (右)相比的對具有根據本發明之一或多個實施例製造之網版印刷式微結構的玻璃LGP (中間,WS01486)實行的光局限性量測之結果。第22圖係以與輸入邊緣相距250 mm之具有網版印刷式微結構之玻璃LGP的隨位置(mm)變化的正規化光學亮度之曲線表示的光局限性,及其用於計算LDI之勞侖茲擬合曲線。在與輸入邊緣相距250 mm時達成用於150 mm調光寬度的約81%之LDI。第23A圖係使用MPOSS奈米/Texanol/引發劑體系之網版印刷之伸長聚合物微結構的俯視圖之SEM照片:印刷之150 μm寬度結構,1印刷層導致約20 μm (接觸角為約22至29度)。Figure 21 shows a pair of glass LGP (with a screen-printed microstructure manufactured according to one or more embodiments of the present invention compared to bare glass LGP (left) and glass LGP with laminated lentil-like film (right) ( In the middle, WS01486) the results of the optical limitation measurement. Figure 22 shows the optical limitations expressed by the normalized optical brightness curve of the glass LGP with screen-printed microstructures at a distance of 250 mm from the input edge as a function of position (mm), and its Laurent used to calculate LDI Now fit the curve. At a distance of 250 mm from the input edge, an LDI of about 81% for a dimming width of 150 mm is achieved. Figure 23A is a SEM photograph of the top view of the screen-printed elongated polymer microstructure using the MPOSS nano/Texanol/initiator system: the printed 150 μm width structure, 1 printed layer results in about 20 μm (contact angle is about 22 To 29 degrees).

第23B圖係第23A圖中所示之網版印刷之伸長聚合物微結構之側視圖的SEM照片。Figure 23B is a SEM photograph of a side view of the screen-printed elongated polymer microstructure shown in Figure 23A.

第23C圖係第23B圖中所示之網版印刷之伸長聚合物微結構中之單獨一個的放大側視圖之SEM照片。Figure 23C is an SEM photograph of an enlarged side view of a single one of the screen-printed elongated polymer microstructures shown in Figure 23B.

第24A圖係使用MPOSS奈米/Texanol/引發劑體系之網版印刷之伸長聚合物微結構的俯視圖之SEM照片:印刷之2層達成約30 μm (接觸角為約40至42度)且3層導致40 μm特徵高度。Figure 24A is a SEM photograph of the top view of the screen-printed elongated polymer microstructure using the MPOSS nano/Texanol/initiator system: the printed two layers achieve about 30 μm (contact angle is about 40 to 42 degrees) and 3 The layer results in a 40 μm feature height.

第24B圖係第24A圖中所示之網版印刷之伸長聚合物微結構之側視圖的SEM照片。Figure 24B is a SEM photograph of a side view of the screen-printed elongated polymer microstructure shown in Figure 24A.

第24C圖係第24B圖中所示之網版印刷之伸長聚合物微結構中之單獨一個的放大側視圖之SEM照片。Figure 24C is an SEM photograph of an enlarged side view of a single one of the screen-printed elongated polymer microstructures shown in Figure 24B.

三個層導致40 μm特徵高度。Three layers result in a 40 μm feature height.

第25A圖係基於一個印刷層的使用MPOSS奈米/Dowanol/引發劑體系之網版印刷之伸長聚合物微結構的側視圖之SEM照片。該等印刷式伸長聚合物微結構寬120 μm。一個印刷層導致具有近似22 μm之高度及近似26度之接觸角的微結構。Figure 25A is a SEM photograph of a side view of a printed layer based on a side view of a microstructure of an elongated polymer microstructure printed using the MPOSS nano/Dowanol/initiator system. The microstructures of these printed elongated polymers are 120 μm wide. One printed layer results in a microstructure with a height of approximately 22 μm and a contact angle of approximately 26 degrees.

第25B圖係基於兩個印刷層的使用MPOSS奈米/Dowanol/引發劑體系之網版印刷之伸長聚合物微結構的側視圖之SEM照片。兩個印刷層達成近似30 μm之微結構高度及在26至34度之範圍內之接觸角。Figure 25B is a SEM photograph of a side view of the microstructure of an elongated polymer printed by screen printing using the MPOSS nano/Dowanol/initiator system based on two printed layers. The two printed layers achieve a microstructure height of approximately 30 μm and a contact angle in the range of 26 to 34 degrees.

根據一或多個實施例,伸長聚合物微結構包含在約20度至約50度之一範圍內之接觸角。According to one or more embodiments, the elongated polymer microstructure includes a contact angle in the range of about 20 degrees to about 50 degrees.

根據本發明之另一態樣,發現玻璃基板上之伸長聚合物微結構之波紋的表面傾斜角之減小會減少自含有用作扁豆狀特徵之伸長聚合物微結構的光導板之漏光。另外,區域調光指數及直度(光局限性)隨表面傾斜角減小。基於模型化結果,判定該等伸長聚合物微結構之波紋之表面傾斜角小於15度、小於10度、小於9度、小於8度、小於7度、小於6度、小於5度、小於4度、小於3度或小於2度。According to another aspect of the present invention, it has been found that a reduction in the surface tilt angle of the corrugations of the elongated polymer microstructures on the glass substrate reduces light leakage from light guide plates containing elongated polymer microstructures used as lentil-like features. In addition, the area dimming index and straightness (light limitation) decrease with the surface tilt angle. Based on the modeling results, it is determined that the surface tilt angle of the corrugations of the elongated polymer microstructures is less than 15 degrees, less than 10 degrees, less than 9 degrees, less than 8 degrees, less than 7 degrees, less than 6 degrees, less than 5 degrees, less than 4 degrees , Less than 3 degrees or less than 2 degrees.

模型化係基於包含一玻璃基板之一光導板,該玻璃基板具有1.5之折射率、1.1 mm之厚度及500 mm乘500 mm之長度乘寬度,以及形成於玻璃基板28之主表面30上的形成扁豆狀特徵之伸長微結構70。該等伸長聚合物微結構類似於第3D圖中所示之彼等伸長聚合物微結構,其中扁豆狀特徵之寬度W及高度H為W=0.3 mm及H=0.15mm,且該等伸長聚合物微結構之橫截面具有半圓形形狀。模型化亦包括在兩個伸長聚合物微結構之間的0.15mm的間隔S。如第26圖所示,模型化係進一步基於區段250在與耦接至光源(未圖示)之邊緣表面29相距200 mm之位置開始。根據該模型,區段250具有長度4 mm,其中伸長聚合物微結構之表面沿著扁豆狀方向(第26圖中之Z方向)波動或呈波狀。根據一或多個實施例,術語「波動」、「呈波狀」或「波紋」係指伸長聚合物微結構70之最上方表面71包括擾動,使得沿著伸長聚合物微結構之長度L存在高度差,且如第27圖中所示,存在大於最小高度H2 的伸長聚合物微結構之最大高度H1 ,第27圖展示沿著第26圖之線27-27截取的伸長聚合物微結構70之的橫截面圖。根據該模型,伸長聚合物微結構之截面250之波紋包含週期為1mm之四個波週期250a、250b、250c及250d。第27圖中之放大視圖展示四個波週期250a中之一者。根據該模型,波紋幅度係由藉由扁豆狀表面與軸線Z之間的角度界定之表面傾斜角α判定,該角度可藉由形成於以下兩者之間的角度判定:平行於玻璃基板28之主表面30的z軸,及在處於最大高度H1 的該伸長聚合物微結構之一第一最上表面71a與處於最小高度H2 的該伸長聚合物微結構之一第二最上表面71b之間延伸的一線,如第27圖所示。The modeling is based on a light guide plate including a glass substrate having a refractive index of 1.5, a thickness of 1.1 mm, and a length of 500 mm by 500 mm by width, and the formation on the main surface 30 of the glass substrate 28 Lentil-like features of elongated microstructure 70. The microstructures of the elongated polymers are similar to those of the elongated polymers shown in FIG. 3D, in which the width W and height H of the lentil-like features are W=0.3 mm and H=0.15 mm, and the elongated polymers The cross-section of the object microstructure has a semi-circular shape. Modeling also included a gap S of 0.15 mm between the two elongated polymer microstructures. As shown in FIG. 26, the modeling is further based on the section 250 being located at a distance of 200 mm from the edge surface 29 coupled to the light source (not shown). According to this model, the segment 250 has a length of 4 mm, in which the surface of the elongated polymer microstructure fluctuates or is wavy along the lentil-like direction (Z direction in Fig. 26). According to one or more embodiments, the term "wavy", "wavy" or "corrugated" means that the uppermost surface 71 of the elongated polymer microstructure 70 includes disturbances such that it exists along the length L of the elongated polymer microstructure difference in height, and as shown in FIG. 27, there is a minimum height H greater than the maximum height of the elongated polymer microstructure 2 H 1, figure 27 shows the elongation of the polymeric microelements 26 taken along line 27-27 of FIG. Cross-sectional view of structure 70. According to the model, the corrugation of the cross section 250 of the elongated polymer microstructure includes four wave periods 250a, 250b, 250c and 250d with a period of 1 mm. The enlarged view in Figure 27 shows one of the four wave periods 250a. According to the model, the ripple amplitude is determined by the surface inclination angle α defined by the angle between the lentil-shaped surface and the axis Z, which can be determined by the angle formed between: parallel to the glass substrate 28 major surface 30 of the z-axis, and the maximum height H is between one of the elongated polymer microstructure 1 of the first uppermost surface 71a of one of the elongated second uppermost polymer microstructure at a minimum height H 2 of the surface 71b The extended line is shown in Figure 27.

用於1D光局限性(或1D區域調光)之區域調光光學件之效能可藉由兩個參數:區域調光指數(LDI)及直度來評估。如第28圖所示,第28圖係用於描述區域調光指數(LDI)及直度之定義之示意圖,與LED輸入邊緣相距距離Z處的LDI及直度分別定義為The performance of area dimming optics for 1D light limitations (or 1D area dimming) can be evaluated by two parameters: area dimming index (LDI) and straightness. As shown in Figure 28, Figure 28 is a schematic diagram used to describe the definition of the area dimming index (LDI) and straightness. The LDI and straightness at a distance Z from the LED input edge are defined as

Figure 02_image005
Figure 02_image005

Figure 02_image007
Figure 02_image007

其中,Lm 係與LED輸入邊緣相距距離Z之區帶m (m=n-2、n-1、n、n+1、n+2)之區域Am 的明度。Where L m is the brightness of the area A m in the zone m (m=n-2, n-1, n, n+1, n+2) at a distance Z from the LED input edge.

第29圖係展示基於模型化的沿著扁豆狀方向隨扁豆狀波紋之表面傾斜角變化的漏光(耦合至LGP中全部光的百分比)光的圖。明顯地看出,隨著扁豆狀特徵之波紋之表面傾斜角增大,漏光增加。Figure 29 is a graph showing light leakage (percentage of total light coupled into the LGP) along the lentil-shaped direction as a function of the inclination angle of the surface of the lentil-shaped ripples. Obviously, as the angle of inclination of the lentil-like corrugated surface increases, light leakage increases.

第30圖及第31圖係展示基於模型化的沿著扁豆狀方向隨扁豆狀波紋之表面傾斜角變化的在與輸入邊緣相距450 mm時之LDI (用於150 mm調光寬度)及直度的圖。隨著表面傾斜角增大,LDI減小且直度增大。Figures 30 and 31 show the model-based LDI (for 150 mm dimming width) and straightness at a distance of 450 mm from the input edge along the lentil-shaped direction with the surface inclination angle of the lentil-shaped corrugation. Figure. As the surface tilt angle increases, the LDI decreases and the straightness increases.

基於以上模型化結果,判定提供扁豆狀特徵之該等伸長聚合物微結構70之波紋的表面傾斜角具有小於15度、小於10度、小於9度、小於8度、小於7度、小於6度、小於5度、小於4度、小於3度或小於2度之一表面傾斜角,其中該表面傾斜角係藉由形成於以下兩者之間的一角界定:平行於玻璃基板28之主表面30 (在一些實施例中,該主表面係一發光表面)之一線,及在處於最大高度H1 的該伸長聚合物微結構之一第一最上表面71a與處於最小高度H2 的該伸長聚合物微結構之一第二最上表面71b之間延伸的一線。Based on the above modeling results, it is determined that the surface inclination angle of the corrugations of the elongated polymer microstructures 70 providing lentil-like features is less than 15 degrees, less than 10 degrees, less than 9 degrees, less than 8 degrees, less than 7 degrees, less than 6 degrees , Less than 5 degrees, less than 4 degrees, less than 3 degrees or less than 2 degrees of surface tilt angle, wherein the surface tilt angle is defined by an angle formed between the following two: parallel to the main surface 30 of the glass substrate 28 (In some embodiments, the main surface is a light-emitting surface) a line, and a first uppermost surface 71a of the elongated polymer microstructure at the maximum height H 1 and the elongated polymer at the minimum height H 2 A line extending between the second uppermost surface 71b of one of the microstructures.

根據一或多個實施例,提供光導板,該等光導板包含一玻璃基板及在該玻璃基板之一主表面上之伸長聚合物微結構。該等伸長聚合物微結構70具有在約0.1至約10、例如約2至9、約2至約8、約2至約7、約2.5至約6或約2.5至約5之範圍內(包括所有範圍及其間的子範圍)之一W/H,且具有小於15度、小於10度、小於9度、小於8度、小於7度、小於6度、小於5度、小於4度、小於3度或小於2度之一表面傾斜角,其中該表面傾斜角係藉由形成於以下兩者之間的一角界定:平行於玻璃基板28之主表面30 (在一些實施例中,該主表面係一發光表面)之一線,及在處於最大高度H1 的該伸長聚合物微結構之一第一最上表面71a與處於最小高度H2 的該伸長聚合物微結構之一第二最上表面71b之間延伸的一線。此外,根據本發明之實施例的具有小於此等值之一表面傾斜角之伸長聚合物微結構70展現最小波紋。According to one or more embodiments, light guide plates are provided that include a glass substrate and an elongated polymer microstructure on one major surface of the glass substrate. The elongated polymer microstructures 70 have a range of about 0.1 to about 10, such as about 2 to 9, about 2 to about 8, about 2 to about 7, about 2.5 to about 6, or about 2.5 to about 5 (including All ranges and subranges therebetween) one of W/H, and have less than 15 degrees, less than 10 degrees, less than 9 degrees, less than 8 degrees, less than 7 degrees, less than 6 degrees, less than 5 degrees, less than 4 degrees, less than 3 Degree or less than 2 degrees of surface tilt angle, wherein the surface tilt angle is defined by an angle formed between the following two: parallel to the main surface 30 of the glass substrate 28 (in some embodiments, the main surface is a light emitting surface) of the line, and the maximum height H is between one of the elongated polymer microstructure 1 of the first uppermost surface 71a of one of the elongated second uppermost polymer microstructure at a minimum height H 2 of the surface 71b An extended line. Furthermore, the elongated polymer microstructure 70 having a surface inclination angle less than these values according to an embodiment of the present invention exhibits the smallest ripples.

此處所描述之該等光導板可在製造顯示器、照明或電子裝置時使用。The light guide plates described herein can be used when manufacturing displays, lighting, or electronic devices.

本發明之另一態樣係關於一種製造一光導板之方法。根據第一實施例之方法包含:在一玻璃基板之一主表面上沉積包含第一層可固化液體之伸長珠粒的陣列;利用輻射至少部分地固化包含第一層可固化液體之伸長珠粒的陣列,以提供間隔分開距離S的複數個至少部分固化之伸長第一層;在該複數個至少部分固化之伸長第一層上沉積包含第二層可固化液體之伸長珠粒的陣列;及至少部分地固化該第二層可固化液體,以形成伸長聚合物多層微結構之一陣列,該等伸長聚合物多層微結構包含n個層,其中n在2至10之一範圍內。Another aspect of the invention relates to a method of manufacturing a light guide plate. The method according to the first embodiment includes: depositing an array of elongated beads containing a first layer of curable liquid on a main surface of a glass substrate; at least partially curing the elongated beads containing the first layer of curable liquid using radiation Array to provide a plurality of at least partially cured elongated first layers separated by a distance S; depositing an array of elongated beads comprising a second layer of curable liquid on the plurality of at least partially cured elongated first layers; and The second layer of curable liquid is at least partially cured to form an array of elongated polymer multilayer microstructures including n layers, where n is in the range of 2 to 10.

在該方法之一些實施例中,至少部分地輻射固化在該第一層及該第二層已沉積之後小於30秒、10秒或1秒發生。In some embodiments of the method, at least partial radiation curing occurs less than 30 seconds, 10 seconds, or 1 second after the first layer and the second layer have been deposited.

在該方法之一些實施例中,該第一層及該第二層係藉由一網版印刷製程沉積。在一些實施例中,該第一層及該第二層係在流體壓力下利用一噴嘴連續地沉積。在一些實施例中,該輻射包含一紫外線燈。In some embodiments of the method, the first layer and the second layer are deposited by a screen printing process. In some embodiments, the first layer and the second layer are continuously deposited using a nozzle under fluid pressure. In some embodiments, the radiation includes an ultraviolet lamp.

根據一些實施例的藉由本文中所描述之該等方法形成之光導板包含在該玻璃基板之該主表面上的複數個伸長聚合物多層微結構,該複數個伸長聚合物多層微結構中之每一者包含小於15度之一表面傾斜角,且其中該表面傾斜角係藉由形成於以下兩者之間的一角界定:平行於該玻璃基板之該主表面之一線,及在處於最大高度H1 的該伸長聚合物微結構之一第一最上表面71a與處於最小高度H2 的該伸長聚合物多層微結構之一第二最上表面71b之間延伸的一線。According to some embodiments, a light guide plate formed by the methods described herein includes a plurality of elongated polymer multilayer microstructures on the main surface of the glass substrate, one of the plurality of elongated polymer multilayer microstructures Each includes a surface tilt angle of less than 15 degrees, and wherein the surface tilt angle is defined by an angle formed between: a line parallel to the main surface of the glass substrate, and at a maximum height one of the elongated polymer H microstructure 1 of the first uppermost surface 71a and at a minimum height H of the elongated microstructures one second polymeric multilayer line extending between the uppermost surface 71b 2.

根據一些實施例的藉由本文中所描述之該等方法形成之光導板包含在該玻璃基板之該主表面上的複數個伸長聚合物多層微結構,該複數個伸長聚合物多層微結構中之每一者、該複數個伸長聚合物多層微結構中之每一者具有一最大高度H及在該最大高度之一半(H/2)處量測的一寬度W,且包含在約0.1至約10之一範圍內之一縱橫比W/H。According to some embodiments, a light guide plate formed by the methods described herein includes a plurality of elongated polymer multilayer microstructures on the main surface of the glass substrate, one of the plurality of elongated polymer multilayer microstructures Each, each of the plurality of elongated polymer multilayer microstructures has a maximum height H and a width W measured at one-half (H/2) of the maximum height, and is included in about 0.1 to about An aspect ratio W/H within a range of 10.

在一些實施例中,藉由本文中所描述之該等方法形成之光導板包含在該玻璃基板之該主表面上的複數個伸長聚合物多層微結構,該複數個伸長聚合物多層微結構中之每一者、該複數個伸長聚合物多層微結構中之每一者具有最大高度H及在該最大高度之一半(H/2)處量測的寬度W,且包含在約0.1至約10之範圍內之縱橫比W/H。In some embodiments, the light guide plate formed by the methods described herein includes a plurality of elongated polymer multilayer microstructures on the main surface of the glass substrate, the plurality of elongated polymer multilayer microstructures Each of the plurality of elongated polymer multilayer microstructures has a maximum height H and a width W measured at one-half (H/2) of the maximum height, and is included in about 0.1 to about 10 The aspect ratio W/H within the range.

本發明之另一態樣係關於一種形成光導板之方法,該方法包含以下步驟:在玻璃基板之主表面上沉積可固化液體,以形成伸長的間隔分開之第一可固化液體層之一陣列;至少部分地固化伸長的間隔分開之可固化液體層之該陣列,以提供間隔分開的至少部分固化之聚合物層之陣列;在間隔分開的至少部分固化之聚合物層之該陣列上沉積可固化液體,以形成伸長的間隔分開之第二可固化液體層之陣列;及至少部分地固化在間隔分開的至少部分固化之聚合物層之該陣列上的該可固化液體,以形成伸長聚合物多層微結構之陣列,該陣列之伸長聚合物多層微結構包含n個層,其中n在2至10之範圍內。在當前方法之一些實施例中,該陣列之伸長聚合物多層微結構中之每一者具有最大高度H及在該最大高度之一半(H/2)處量測的寬度W,使得該等伸長聚合物微結構具有用於LED光之1D調光之縱橫比W/H。在當前方法之一些實施例中,藉由該方法形成之光導板包含在該玻璃基板之該主表面上的複數個伸長聚合物多層微結構,該複數個伸長聚合物多層微結構中之每一者包含小於15度之表面傾斜角,且其中該表面傾斜角係藉由形成於以下兩者之間的角界定:平行於該玻璃基板之該主表面之線,及在處於最大高度H1 的該伸長聚合物微結構之第一最上表面71a與處於最小高度H2 的該伸長聚合物多層微結構之第二最上表面71b之間延伸的線。Another aspect of the present invention relates to a method of forming a light guide plate, the method comprising the steps of: depositing a curable liquid on a main surface of a glass substrate to form an array of first curable liquid layers separated by elongated spaces ; At least partially curing the array of elongated spaced apart curable liquid layers to provide an array of spaced apart at least partially cured polymer layers; deposited on the array of spaced apart at least partially cured polymer layers Curing the liquid to form an array of elongated spaced apart second curable liquid layers; and at least partially curing the curable liquid on the array of spaced apart at least partially cured polymer layers to form an elongated polymer An array of multilayer microstructures, the array of elongated polymer multilayer microstructures includes n layers, where n is in the range of 2 to 10. In some embodiments of the current method, each of the elongated polymer multilayer microstructures of the array has a maximum height H and a width W measured at one-half (H/2) of the maximum height, such that the extensions The polymer microstructure has an aspect ratio W/H for 1D dimming of LED light. In some embodiments of the current method, the light guide plate formed by the method includes a plurality of elongated polymer multilayer microstructures on the main surface of the glass substrate, each of the plurality of elongated polymer multilayer microstructures Includes a surface tilt angle of less than 15 degrees, and wherein the surface tilt angle is defined by the angle formed between: a line parallel to the main surface of the glass substrate, and at a maximum height H 1 the first surface 71a and the uppermost line extending between the surface 71b is at a minimum height H of the elongated second uppermost multilamellar structures of the polymer microstructure 2 of the elongated polymer.

在該方法之一些實施例中,藉由該方法形成之光導板包含在該玻璃基板之該主表面上的複數個伸長聚合物多層微結構,該複數個伸長聚合物多層微結構中之每一者、該複數個伸長聚合物多層微結構中之每一者具有最大高度H及在該最大高度之一半(H/2)處量測的寬度W,且包含在約0.1至約10之範圍內之縱橫比W/H。In some embodiments of the method, the light guide plate formed by the method includes a plurality of elongated polymer multilayer microstructures on the main surface of the glass substrate, each of the plurality of elongated polymer multilayer microstructures , Each of the plurality of elongated polymer multilayer microstructures has a maximum height H and a width W measured at one-half (H/2) of the maximum height, and is included in the range of about 0.1 to about 10 The aspect ratio W/H.

範圍在本文中表述為自「約」一個特定值及/或至「約」另一特定值。當表述此範圍時,另一實施例包括自該一個特定值及/或至該另一特定值。類似地,當值藉由使用前述詞「約」表述為近似值時,將理解,特定值形成另一實施例。將進一步理解,該等範圍中之每一者之端點不僅對於另一端點有重大意義,而且獨立於另一端點。Ranges are expressed herein as "about" one specific value and/or to "about" another specific value. When expressing this range, another embodiment includes from the one specific value and/or to the other specific value. Similarly, when a value is expressed as an approximate value by using the aforementioned word "about", it will be understood that the specific value forms another embodiment. It will be further understood that the endpoint of each of these ranges is not only significant for the other endpoint, but is independent of the other endpoint.

如本文中所使用的例如上、下、右、左、前、後、頂部、底部之方向術語僅參考所繪製之諸圖,且不欲暗示絕對定向。Directional terms such as up, down, right, left, front, back, top, bottom as used herein refer only to the drawings drawn and are not intended to imply absolute orientation.

除非另有明確說明,否則絕不意圖本文中所陳述之任何方法應解釋為需要方法之步驟以一特定次序執行,也不要求任何設備具有特定定向。相應地,在方法請求項未實際列舉方法之步驟應遵循之次序,或任何設備請求項未實際列舉個別組件之次序或定向,或在申請專利範圍或說明書中未另外特別說明該等步驟應限於一特定次序,或未列舉設備之組件之特定次序或定向的情況下,在任何方面,絕不意圖推斷次序或定向。如本文中所使用,單數形式「一」及「該」包括複數參照物,除非上下文另有明確指示。因此,例如,對「一」組件之引用包括具有兩個或更多此組件之態樣,除非上下文另有明確指示。Unless expressly stated otherwise, it is by no means intended that any method set forth herein should be interpreted as requiring the steps of the method to be performed in a specific order, nor does it require any equipment to have a specific orientation. Accordingly, the order in which the method steps should not be actually listed in the method request item, or the order or orientation of any device request item that does not actually list the individual components, or the patent application or the specification does not specifically state that these steps should be limited to In the event that a specific order, or a specific order or orientation of the components of the device is not listed, in no way is it intended to infer the order or orientation. As used herein, the singular forms "a" and "the" include plural references unless the context clearly indicates otherwise. Thus, for example, reference to "a" component includes the appearance of having two or more such components, unless the context clearly indicates otherwise.

熟習此項技術者將瞭解,在不背離本發明之精神及範疇的情況下,可對本發明之實施例作出各種修改及改變。因此,希望本發明涵蓋此等修改及改變,限制條件為此等修改及改變在所附申請專利範圍及其等效物之範疇內。Those skilled in the art will understand that various modifications and changes can be made to the embodiments of the present invention without departing from the spirit and scope of the invention. Therefore, it is hoped that the present invention covers such modifications and changes, and the limitation is that such modifications and changes are within the scope of the appended patent applications and their equivalents.

10‧‧‧LCD顯示裝置 12‧‧‧LCD顯示面板 14‧‧‧第一基板 16‧‧‧第二基板 18‧‧‧黏合材料 20‧‧‧間隙 22‧‧‧偏光濾光器 24‧‧‧背光單元(BLU) 26‧‧‧玻璃光導板(LGP) 27-27‧‧‧線 28‧‧‧玻璃基板 29‧‧‧邊緣表面 30‧‧‧第一主表面 32‧‧‧第二主表面 34a‧‧‧邊緣表面 34b‧‧‧邊緣表面 34c‧‧‧邊緣表面 34d‧‧‧邊緣表面 36‧‧‧發光二極體(LED) 38‧‧‧反射器板 40‧‧‧光源 40a‧‧‧LED之第一子陣列 40b‧‧‧LED之第二子陣列 40c‧‧‧LED之第三子陣列 60‧‧‧通道 70‧‧‧聚合物微結構/聚合物多層微結構 70a‧‧‧第一聚合物層 70b‧‧‧第二聚合物層 70c‧‧‧第三聚合物層 71‧‧‧最上方表面 71a‧‧‧第一最上表面 71b‧‧‧第二最上表面 72‧‧‧聚合物平台 160‧‧‧發光表面 161‧‧‧箭頭 162‧‧‧虛箭頭 170‧‧‧第二主表面 200‧‧‧設備 215‧‧‧儲集器 216‧‧‧泵或流體分配裝置 217‧‧‧壓力感測器 218‧‧‧空氣供應線/空氣壓力線 219‧‧‧供氣源 220‧‧‧調壓器閥 221‧‧‧控制器 223‧‧‧流體供應線 234‧‧‧箭頭 226‧‧‧壓力讀數/壓力感測器信號 227‧‧‧控制信號 228‧‧‧分配器尖端或噴嘴 230‧‧‧輻射源 234‧‧‧箭頭 250‧‧‧區段 250a‧‧‧波週期 250b‧‧‧波週期 250c‧‧‧波週期 250d‧‧‧波週期 A‧‧‧區域 B‧‧‧區域 C‧‧‧區域 d1‧‧‧厚度 S‧‧‧第一間隔/距離 S2‧‧‧第二間隔 T‧‧‧光導板厚度 t‧‧‧最大玻璃基板厚度 t2‧‧‧聚合物平台厚度 H‧‧‧最大高度 H1‧‧‧最大高度 H2‧‧‧最小高度 L‧‧‧LGP長度 L2‧‧‧第二長度 W‧‧‧寬度 θ‧‧‧接觸角10‧‧‧LCD display device 12‧‧‧LCD display panel 14‧‧‧ first substrate 16‧‧‧second substrate 18‧‧‧ adhesive material 20‧‧‧gap 22‧‧‧polarizing filter 24‧‧ ‧Backlight unit (BLU) 26‧‧‧Glass light guide plate (LGP) 27-27‧‧‧Line 28‧‧‧Glass substrate 29‧‧‧Edge surface 30‧‧‧Main surface 32‧‧‧Main Surface 34a‧‧‧Edge surface 34b‧‧‧Edge surface 34c‧‧‧Edge surface 34d‧‧‧Edge surface 36‧‧‧Light emitting diode (LED) 38‧‧‧Reflector plate 40‧‧‧Light source 40a‧ ‧‧The first sub-array 40b of LED‧‧‧‧The second sub-array 40c of LED‧‧‧‧The third sub-array of LED 60‧‧‧Channel 70‧‧‧ Polymer microstructure/Polymer multilayer microstructure 70a‧‧ ‧The first polymer layer 70b‧‧‧The second polymer layer 70c‧‧‧The third polymer layer 71‧‧‧The uppermost surface 71a‧‧‧The first uppermost surface 71b‧‧‧The second uppermost surface 72‧‧ ‧Polymer platform 160‧‧‧Luminous surface 161‧‧‧Arrow 162‧‧‧Dummy arrow 170‧‧‧Second main surface 200‧‧‧Equipment 215‧‧‧Reservoir 216‧‧‧Pump or fluid distribution device 217‧‧‧ pressure sensor 218‧‧‧ air supply line/air pressure line 219‧‧‧ air supply source 220‧‧‧ regulator valve 221‧‧‧controller 223‧‧‧ fluid supply line 234‧‧ ‧Arrow 226‧‧‧Pressure reading/pressure sensor signal 227‧‧‧Control signal 228‧‧‧Distributor tip or nozzle 230‧‧‧Radiation source 234‧‧‧Arrow 250‧‧‧Section 250a‧‧‧ Wave period 250b‧wave period 250c‧‧‧wave period 250d‧‧‧wave period A‧‧‧region B‧‧‧region C‧‧‧region d 1 ‧‧‧thickness S‧‧‧ first interval/distance S2‧‧‧Second interval T‧‧‧Light guide plate thickness t‧‧‧Maximum glass substrate thickness t2‧‧‧Polymer platform thickness H‧‧‧Maximum height H 1 ‧‧‧Maximum height H 2 ‧‧‧Minimum height L‧‧‧LGP length L2‧‧‧second length W‧‧‧width θ‧‧‧contact angle

第1圖係例示性LCD顯示裝置之橫截面圖;Figure 1 is a cross-sectional view of an exemplary LCD display device;

第2圖係例示性光導板之俯視圖;Figure 2 is a plan view of an exemplary light guide plate;

第3A圖係玻璃基板之橫截面圖,該玻璃基板包含在其表面上的複數個聚合物多層微結構且適合與第2圖之玻璃光導板一起使用;Figure 3A is a cross-sectional view of a glass substrate including a plurality of polymer multilayer microstructures on its surface and suitable for use with the glass light guide plate of Figure 2;

第3B圖係另一玻璃基板之橫截面圖,該玻璃基板包含在其表面上的複數個聚合物多層微結構且適合與第2圖之玻璃光導板一起使用;Figure 3B is a cross-sectional view of another glass substrate, which contains a plurality of polymer multilayer microstructures on its surface and is suitable for use with the glass light guide plate of Figure 2;

第3C圖係更另一玻璃基板之橫截面圖,該玻璃基板包含在其表面上的複數個聚合物多層微結構且適合與第2圖之玻璃光導板一起使用;Figure 3C is a cross-sectional view of yet another glass substrate, which includes a plurality of polymer multilayer microstructures on its surface and is suitable for use with the glass light guide plate of Figure 2;

第3D圖係更另一玻璃基板之橫截面圖,該玻璃基板包含在其表面上的複數個聚合物多層微結構且適合與第2圖之玻璃光導板一起使用;Figure 3D is a cross-sectional view of yet another glass substrate including a plurality of polymer multilayer microstructures on its surface and suitable for use with the glass light guide plate of Figure 2;

第3E圖係更另一玻璃基板之橫截面圖,該玻璃基板包含在其表面上之聚合物平台上的複數個聚合物多層微結構且適合與第2圖之玻璃光導板一起使用;Figure 3E is a cross-sectional view of yet another glass substrate, which includes a plurality of polymer multilayer microstructures on a polymer platform on its surface and is suitable for use with the glass light guide plate of Figure 2;

第3F圖係包含聚合物多層稜鏡之非週期性陣列之微結構化表面的SEM影像;Figure 3F is an SEM image of the microstructured surface of a non-periodic array of polymer multilayers;

第4圖圖示根據本發明之特定實施例之光導板;Figure 4 illustrates a light guide plate according to a specific embodiment of the invention;

第5圖圖示根據本發明之特定實施例之聚合物多層微結構;Figure 5 illustrates a polymer multilayer microstructure according to a specific embodiment of the invention;

第6A圖圖示根據本發明之特定實施例之聚合物多層微結構;Figure 6A illustrates a polymer multilayer microstructure according to a specific embodiment of the invention;

第6B圖係根據一實施例的隨縱橫比W/H變化之接觸角的圖;FIG. 6B is a diagram of the contact angle varying with the aspect ratio W/H according to an embodiment;

第7A圖係可形成根據本發明之實施例之聚合物微結構的材料之穩定、未受干擾之連續伸長珠粒的示意圖;Figure 7A is a schematic diagram of stable, undisturbed continuous elongated beads that can form a polymer microstructure material according to an embodiment of the present invention;

第7B圖係具有接觸角θ之液體珠粒之示意圖,該接觸角在接觸線自由移動時保持固定在平衡值;Figure 7B is a schematic diagram of a liquid bead with a contact angle θ, which remains fixed at a balanced value when the contact line moves freely;

第7C圖係具有取決於接觸線速度、但在零速度下減小至平衡值之接觸角的液體珠粒及具有在接觸角自由改變時停止在平行狀態之接觸線的珠粒的示意圖;Figure 7C is a schematic diagram of liquid beads with a contact angle that depends on the contact linear velocity but decreases to an equilibrium value at zero speed and beads with a contact line that stops in a parallel state when the contact angle changes freely;

第8A圖係在玻璃基板上之伸長聚合物微結構之俯視圖的掃描電子顯微鏡(scanning electron microscope; SEM)照片;Figure 8A is a scanning electron microscope (SEM) photograph of a top view of an elongated polymer microstructure on a glass substrate;

第8B圖係在玻璃基板上之伸長聚合物微結構之橫截面圖的掃描電子顯微鏡(scanning electron microscope; SEM)照片;Figure 8B is a scanning electron microscope (SEM) photograph of a cross-sectional view of an elongated polymer microstructure on a glass substrate;

第8C圖係在玻璃基板上之伸長聚合物微結構之放大橫截面圖的掃描電子顯微鏡(scanning electron microscope; SEM)照片;Figure 8C is a scanning electron microscope (SEM) photograph of an enlarged cross-sectional view of an elongated polymer microstructure on a glass substrate;

第9A圖展示在20.3 cm x 27.9 cm IRIS玻璃基板上產生之扁豆狀特徵之光學影像;Figure 9A shows an optical image of lentil-like features generated on a 20.3 cm x 27.9 cm IRIS glass substrate;

第9B圖展示在20.3 cm x 27.9 cm IRIS玻璃基板上產生之扁豆狀特徵之光學影像;Figure 9B shows an optical image of lentil-like features generated on a 20.3 cm x 27.9 cm IRIS glass substrate;

第10A圖展示在20.3 cm x 27.9 cm IRIS玻璃基板上產生之扁豆狀特徵之光學影像;Figure 10A shows an optical image of lentil-like features generated on a 20.3 cm x 27.9 cm IRIS glass substrate;

第10B圖展示在20.3 cm x 27.9 cm IRIS玻璃基板上產生之扁豆狀特徵之光學影像;Figure 10B shows an optical image of lentil-like features generated on a 20.3 cm x 27.9 cm IRIS glass substrate;

第11A圖展示對280 mm x 215 mm裸玻璃樣本及280 mm x 215 mm玻璃樣本上之層壓扁豆狀透鏡結構實行的光局限性量測之結果;Figure 11A shows the results of optical limitation measurements on the 280 mm x 215 mm bare glass sample and the laminated lentil lens structure on the 280 mm x 215 mm glass sample;

第11B圖展示對280 mm x 215 mm玻璃樣本上之連續分散之微結構進行的光局限性量測之結果;Figure 11B shows the results of light limitation measurements of continuously dispersed microstructures on a 280 mm x 215 mm glass sample;

第11C圖展示對280 mm x 215 mm玻璃樣本上之連續分散之微結構實行的光局限性量測之結果;Figure 11C shows the results of the measurement of light limitations on continuously dispersed microstructures on a 280 mm x 215 mm glass sample;

第12A圖展示以隨位置(mm)變化的與輸入邊緣相距250 mm之裸玻璃LGP、具有層壓扁豆狀膜之玻璃LGP及具有分散之微結構之玻璃LGP的正規化光學亮度之曲線表示的光局限性;Figure 12A shows the normalized optical brightness curves of bare glass LGP with a distance of 250 mm from the input edge, glass LGP with laminated lentil film, and glass LGP with dispersed microstructures Optical limitations;

第12B圖展示以隨位置(mm)變化的與輸入邊緣相距250 mm之具有分散之微結構之玻璃LGP的正規化光學亮度之曲線表示的光局限性,及所得之勞侖茲擬合曲線;Figure 12B shows the light limitations expressed by the normalized optical brightness curve of the glass LGP with dispersed microstructures that are 250 mm away from the input edge as a function of position (mm), and the resulting Lorentz fit curve;

第13圖展示以隨位置(mm)變化的與輸入邊緣相距250 mm之具有層壓扁豆狀膜之玻璃LGP及具有分散之微結構之玻璃LGP的正規化光學亮度之曲線表示的光局限性;Figure 13 shows the light limitations expressed by the normalized optical brightness curves of the glass LGP with laminated lentil-like film and the glass LGP with dispersed microstructures that vary with the position (mm) by 250 mm from the input edge;

第14圖係根據本發明之實施例的可用於連續地分配及固化可固化液體之設備200之一實施例的方塊圖;FIG. 14 is a block diagram of an embodiment of an apparatus 200 that can be used to continuously dispense and solidify a curable liquid according to an embodiment of the present invention;

第15圖係展示使用各種材料製造之具有大於10 μm厚度之厚度的經塗佈樣本之色移(在320 mm下之差量色度y值)的圖;Figure 15 is a graph showing the color shift (difference chromaticity y value at 320 mm) of coated samples with a thickness greater than 10 μm manufactured using various materials;

第16圖係對可用於網版印刷根據本發明之實施例之伸長聚合物微結構的步驟之描繪;Figure 16 is a depiction of the steps that can be used to screen print the elongated polymer microstructure according to an embodiment of the present invention;

第17圖係表示含有Texanol溶劑之網版印刷墨水之穩定剪切掃掠(剪切黏度對剪切速率)的圖;Figure 17 is a graph showing the stable shear sweep (shear viscosity versus shear rate) of screen printing ink containing Texanol solvent;

第18圖係表示含有二乙二醇單甲基(Dowanol DPM™溶劑)之網版印刷墨水之穩定剪切掃掠(剪切黏度對剪切速率)的圖;Figure 18 is a graph showing the stable shear sweep (shear viscosity versus shear rate) of screen printing inks containing diethylene glycol monomethyl (Dowanol DPM™ solvent);

第19圖係展示含有Texanol™溶劑之兩種網版印刷墨水之剪切黏度對時間的圖;Figure 19 is a graph showing the shear viscosity of two screen printing inks containing Texanol™ solvent versus time;

第20圖係展示含有Dowanol DPM™溶劑之三種網版印刷墨水之剪切黏度對時間的圖;Figure 20 is a graph showing the shear viscosity of three screen printing inks containing Dowanol DPM™ solvent versus time;

第21圖展示與裸玻璃LGP及具有層壓扁豆狀膜之玻璃LGP相比的對具有根據本發明之一或多個實施例製造之網版印刷式微結構的玻璃LGP實行的光局限性量測之結果;Figure 21 shows the optical limitation measurements performed on glass LGP with screen-printed microstructures manufactured according to one or more embodiments of the present invention compared to bare glass LGP and glass LGP with laminated lentil-like films Result

第22圖係圖示繪圖隨位置(mm)變化的與輸入邊緣相距250 mm之具有網版印刷式微結構之玻璃LGP的正規化光學亮度之光局限性及勞侖茲擬合曲線的圖;Figure 22 is a graph showing the light limitations of the normalized optical brightness and the Lorentz fitting curve of the glass LGP with screen-printed microstructures 250 mm away from the input edge as a function of position (mm);

第23A圖係網版印刷之伸長聚合物微結構之俯視圖的SEM照片;Figure 23A is a SEM photograph of the top view of the screen-printed elongated polymer microstructure;

第23B圖係第23A圖中所示的網版印刷之伸長聚合物微結構之側視圖的SEM照片;Figure 23B is a SEM photograph of a side view of the screen-printed elongated polymer microstructure shown in Figure 23A;

第23C圖係第23B圖中所示的網版印刷之伸長聚合物微結構中的單獨一個之放大側視圖的SEM照片;Figure 23C is an SEM photograph of an enlarged side view of a single one of the screen-printed elongated polymer microstructures shown in Figure 23B;

第24A圖係網版印刷之伸長聚合物微結構之俯視圖的SEM照片;Figure 24A is a SEM photograph of the top view of the screen-printed elongated polymer microstructure;

第24B圖係第24A圖中所示的網版印刷之伸長聚合物微結構之側視圖的SEM照片;Figure 24B is a SEM photograph of a side view of the screen-printed elongated polymer microstructure shown in Figure 24A;

第24C圖係第24B圖中所示的網版印刷之伸長聚合物微結構中的單獨一個之放大側視圖的SEM照片;Figure 24C is an SEM photograph of an enlarged side view of a single one of the screen-printed elongated polymer microstructures shown in Figure 24B;

第25A圖係網版印刷之伸長聚合物微結構之側視圖的SEM照片;Figure 25A is a SEM photograph of a side view of the screen-printed elongated polymer microstructure;

第25B圖係網版印刷之伸長聚合物微結構之側視圖的SEM照片;Figure 25B is a SEM photograph of a side view of the screen-printed elongated polymer microstructure;

第26圖係具有在玻璃基板上之伸長聚合物微結構之光導板的俯視平面圖;Figure 26 is a top plan view of a light guide plate with an elongated polymer microstructure on a glass substrate;

第27圖展示沿著第26圖之線27-27截取的伸長聚合物微結構70之橫截面圖;Figure 27 shows a cross-sectional view of the elongated polymer microstructure 70 taken along the line 27-27 of Figure 26;

第28圖係用於描述區域調光指數(local dimming index; LDI)及直度之定義之示意圖;Figure 28 is a schematic diagram for describing the definitions of local dimming index (LDI) and straightness;

第29圖係展示基於模型化的沿著扁豆狀方向隨扁豆狀波紋之表面傾斜角變化的漏光(耦合至LGP中之全部光之百分比)的圖;Figure 29 is a graph showing light leakage (percentage of total light coupled into the LGP) along the lentil-shaped direction with the tilt angle of the surface of the lentil-shaped corrugation based on the model;

第30圖係展示基於模型化的沿著扁豆狀方向隨扁豆狀波紋之表面傾斜角變化的在與輸入邊緣相距450 mm時之LDI (用於150 mm調光寬度)的圖;及Figure 30 is a graph showing LDI (for 150 mm dimming width) at a distance of 450 mm from the input edge based on the modeled change in the lentil-shaped direction with the surface inclination angle of the lentil-shaped corrugations;

第31圖係展示基於模型化的沿著扁豆狀方向隨扁豆狀波紋之表面傾斜角變化的在與輸入邊緣相距450 mm時之直度的圖。Figure 31 is a graph showing the straightness of the lentil-shaped corrugation along the lentil-shaped corrugated surface with a tilt angle of 450 mm away from the input edge based on the model.

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200‧‧‧設備 200‧‧‧Equipment

215‧‧‧儲集器 215‧‧‧reservoir

216‧‧‧泵或流體分配裝置 216‧‧‧Pump or fluid distribution device

217‧‧‧壓力感測器 217‧‧‧ pressure sensor

218‧‧‧空氣供應線/空氣壓力線 218‧‧‧Air supply line/air pressure line

219‧‧‧供氣源 219‧‧‧ gas supply

220‧‧‧調壓器閥 220‧‧‧ Regulator valve

221‧‧‧控制器 221‧‧‧Controller

223‧‧‧流體供應線 223‧‧‧Fluid supply line

226‧‧‧壓力讀數/壓力感測器信號 226‧‧‧pressure reading/pressure sensor signal

227‧‧‧控制信號 227‧‧‧Control signal

228‧‧‧分配器尖端或噴嘴 228‧‧‧Distributor tip or nozzle

230‧‧‧輻射源 230‧‧‧radiation source

234‧‧‧箭頭 234‧‧‧arrow

Claims (41)

一種光導板,該光導板包含: 一玻璃基板,該玻璃基板包括一邊緣表面及兩個主表面;及在該等主表面中之至少一者上的複數個伸長聚合物多層微結構,每一伸長多層微結構具有一最大高度H及在該最大高度之一半(H/2)處量測的一寬度W,且進一步包含在約0.1至約10之一範圍內之一縱橫比W/H。A light guide plate includes: A glass substrate including an edge surface and two major surfaces; and a plurality of elongated polymer multilayer microstructures on at least one of the major surfaces, each elongated multilayer microstructure having a maximum height H And a width W measured at one-half (H/2) of the maximum height, and further includes an aspect ratio W/H in a range of about 0.1 to about 10. 如請求項1所述之光導板,其中該縱橫比在約2至約8之一範圍內。The light guide plate according to claim 1, wherein the aspect ratio is in a range of about 2 to about 8. 如請求項1所述之光導板,其中該縱橫比在約2.5至約6之一範圍內。The light guide plate according to claim 1, wherein the aspect ratio is in a range of about 2.5 to about 6. 如請求項1所述之光導板,其中每一伸長聚合物多層微結構之該高度H不超過50 μm。The light guide plate according to claim 1, wherein the height H of each elongated polymer multilayer microstructure does not exceed 50 μm. 如請求項1所述之光導板,其中W在約50 μm與約500 μm之間。The light guide plate of claim 1, wherein W is between about 50 μm and about 500 μm. 如請求項1所述之光導板,其中每一伸長聚合物多層微結構包含n層,其中n在3至10之一範圍內。The light guide plate of claim 1, wherein each elongated polymer multilayer microstructure comprises n layers, where n is in the range of 3 to 10. 如請求項1所述之光導板,其中該複數個微結構之兩個鄰近伸長聚合物多層微結構之間的在一第一方向上之一第一間隔S在約0.01*W與4*W之一範圍內。The light guide plate according to claim 1, wherein a first interval S in a first direction between two adjacent elongated polymer multilayer microstructures of the plurality of microstructures is between about 0.01*W and 4*W Within one. 如請求項1所述之光導板,其中該複數個伸長聚合物多層微結構中之至少一者進一步包含一長度L,且其中該複數個伸長聚合物多層微結構中之另一者具有不同於L之一長度L2。The light guide plate of claim 1, wherein at least one of the plurality of elongated polymer multilayer microstructures further includes a length L, and wherein the other of the plurality of elongated polymer multilayer microstructures has a different One of L is length L2. 如請求項1所述之光導板,其中基於莫耳%氧化物,該玻璃基板包含: 50至90莫耳% SiO2 ,0至20莫耳% Al2 O3 ,0至20莫耳% B2 O3 ,及0至25莫耳% Rx O,其中x為2,且R係選自Li、Na、K、Rb、Cs及其組合,或其中x為1,且R係選自Zn、Mg、Ca、Sr、Ba及其組合。The light guide plate according to claim 1, wherein the glass substrate includes: 50 to 90 mol% SiO 2 , 0 to 20 mol% Al 2 O 3 , 0 to 20 mol% B based on mol% oxide 2 O 3 , and 0 to 25 mol% R x O, where x is 2, and R is selected from Li, Na, K, Rb, Cs, and combinations thereof, or where x is 1, and R is selected from Zn , Mg, Ca, Sr, Ba and their combinations. 如請求項1所述之光導板,其中該玻璃基板之一厚度t在約0.1 mm至約3 mm之範圍內。The light guide plate according to claim 1, wherein a thickness t of the glass substrate is in the range of about 0.1 mm to about 3 mm. 如請求項1所述之光導板,其中該複數個伸長聚合物多層微結構包含一UV可固化或熱可固化聚合物。The light guide plate of claim 1, wherein the plurality of elongated polymer multilayer microstructures comprise a UV-curable or heat-curable polymer. 如請求項1所述之光導板,其中該玻璃基板進一步包含複數個光提取特徵,該複數個光提取特徵圖案化在與發光表面對置的該玻璃基板之一主表面上。The light guide plate according to claim 1, wherein the glass substrate further includes a plurality of light extraction features patterned on one main surface of the glass substrate opposite to the light emitting surface. 如請求項1所述之光導板,其中每一伸長聚合物多層微結構包含小於15度之一表面傾斜角,且其中該表面傾斜角係藉由形成於以下兩者之間的一角界定:平行於該玻璃基板之該發光表面之一線,及在處於最大高度H1 的該伸長聚合物微結構之一第一最上表面與處於最小高度H2 的該伸長聚合物微結構之一第二最上表面之間延伸的一線。The light guide plate of claim 1, wherein each elongated polymer multilayer microstructure includes a surface tilt angle of less than 15 degrees, and wherein the surface tilt angle is defined by an angle formed between: parallel A line on the light emitting surface of the glass substrate, and a first uppermost surface of one of the elongated polymer microstructures at a maximum height H 1 and a second uppermost surface of the elongated polymer microstructures at a minimum height H 2 A line extending between. 如請求項13所述之光導板,其中該表面傾斜角小於10度。The light guide plate according to claim 13, wherein the inclination angle of the surface is less than 10 degrees. 如請求項13所述之光導板,其中該表面傾斜角小於4度。The light guide plate according to claim 13, wherein the inclination angle of the surface is less than 4 degrees. 如請求項13所述之光導板,其中該表面傾斜角小於2度。The light guide plate according to claim 13, wherein the inclination angle of the surface is less than 2 degrees. 一種光導板,該光導板包含: 一玻璃基板,該玻璃基板包括一邊緣表面及至少兩個主表面;及在該等主表面中之至少一者上的複數個伸長聚合物微結構,每一伸長聚合物微結構包含小於15度之一表面傾斜角,且其中該表面傾斜角係藉由形成於以下兩者之間的一角界定:平行於該玻璃基板之發光表面之一線,及在處於最大高度H1 的該伸長聚合物微結構之一第一最上表面與處於最小高度H2 的該伸長聚合物微結構之一第二最上表面之間延伸的一線。A light guide plate includes: a glass substrate including an edge surface and at least two main surfaces; and a plurality of elongated polymer microstructures on at least one of the main surfaces, each The elongated polymer microstructure includes a surface tilt angle of less than 15 degrees, and wherein the surface tilt angle is defined by an angle formed between: a line parallel to the light-emitting surface of the glass substrate, and at the maximum one of the height H of the elongated polymer micro structure of the first surface is uppermost line extending between one of the minimum height H 2 of the microstructure of the polymer elongate second outermost surface. 如請求項17所述之光導板,其中該表面傾斜角小於10度。The light guide plate according to claim 17, wherein the surface tilt angle is less than 10 degrees. 如請求項17所述之光導板,其中該表面傾斜角小於4度。The light guide plate according to claim 17, wherein the inclination angle of the surface is less than 4 degrees. 如請求項17所述之光導板,其中該表面傾斜角小於2度。The light guide plate according to claim 17, wherein the surface tilt angle is less than 2 degrees. 如請求項17所述之光導板,其中每一伸長聚合物微結構包含n層,且其中n在2至10之一範圍內。The light guide plate of claim 17, wherein each elongated polymer microstructure includes n layers, and wherein n is in the range of 2 to 10. 如請求項21所述之光導板,其中n在2至5之一範圍內。The light guide plate according to claim 21, wherein n is in a range of 2 to 5. 一種製造一光導板之方法,該方法包含以下步驟: 在一玻璃基板之一主表面上沉積一第一層可固化液體以作為伸長液體珠粒之一第一陣列;至少部分地輻射固化該第一層可固化液體,以提供間隔分開距離S的至少部分固化之伸長微結構之一陣列;在至少部分固化之伸長珠粒之該第一陣列上沉積一第二層可固化液體以作為伸長液體珠粒之一第二陣列;至少部分地輻射固化該第二層可固化液體,以提供至少部分固化之伸長微結構之一雙層陣列;及在至少部分固化之伸長微結構之該雙層陣列上視情況形成一額外層可固化液體,以提供包含n個層的伸長聚合物多層微結構之一多層陣列,其中n在2至10之一範圍內。A method for manufacturing a light guide plate, the method includes the following steps: Depositing a first layer of curable liquid on a major surface of a glass substrate as a first array of elongated liquid beads; at least partially radiation curing the first layer of curable liquid to provide at least a separation distance S An array of partially cured elongated microstructures; depositing a second layer of curable liquid on the first array of at least partially cured elongated beads as a second array of elongated liquid beads; at least partially radiation curing the A second layer of curable liquid to provide a bilayer array of at least partially cured elongated microstructures; and optionally forming an additional layer of curable liquid on the at least partially cured elongated microstructures of the bilayer array to provide A multilayer array of n layers of elongated polymer multilayer microstructures, where n is in the range of 2 to 10. 如請求項23所述之方法,其中至少部分地輻射固化在該第一層可固化液體已沉積之後小於30秒及在該第二層可固化液體已沉積之後小於30秒發生。The method of claim 23, wherein at least partial radiation curing occurs less than 30 seconds after the first layer of curable liquid has been deposited and less than 30 seconds after the second layer of curable liquid has been deposited. 如請求項23所述之方法,其中至少部分地輻射固化在該第一層可固化液體已沉積之後小於10秒及在該第二層可固化液體已沉積之後小於10秒發生。The method of claim 23, wherein at least partial radiation curing occurs less than 10 seconds after the first layer of curable liquid has been deposited and less than 10 seconds after the second layer of curable liquid has been deposited. 如請求項23所述之方法,其中至少部分地輻射固化在該第一層可固化液體已沉積之後小於5秒及在該第二層可固化液體已沉積之後小於5秒發生。The method of claim 23, wherein at least partial radiation curing occurs less than 5 seconds after the first layer of curable liquid has been deposited and less than 5 seconds after the second layer of curable liquid has been deposited. 如請求項23所述之方法,其中至少部分地輻射固化在該第一層可固化液體已沉積之後小於1秒及在該第二層可固化液體已沉積之後小於1秒發生。The method of claim 23, wherein at least partial radiation curing occurs less than 1 second after the first layer of curable liquid has been deposited and less than 1 second after the second layer of curable liquid has been deposited. 如請求項23所述之方法,其中該第一層及該第二層係藉由一網版印刷製程沉積。The method of claim 23, wherein the first layer and the second layer are deposited by a screen printing process. 如請求項28所述之方法,其中該輻射包含紫外線光。The method of claim 28, wherein the radiation comprises ultraviolet light. 如請求項28所述之方法,其中每一伸長聚合物多層微結構包含小於15度之一表面傾斜角,且其中該表面傾斜角係藉由形成於以下兩者之間的一角界定:平行於該玻璃基板之該主表面之一線,及在處於最大高度H1 的該伸長聚合物微結構之一第一最上表面與處於最小高度H2 的該伸長聚合物多層微結構之一第二最上表面之間延伸的一線。The method of claim 28, wherein each elongated polymer multilayer microstructure includes a surface tilt angle of less than 15 degrees, and wherein the surface tilt angle is defined by an angle formed between: parallel to A line of the main surface of the glass substrate, and a first uppermost surface of one of the elongated polymer microstructures at the maximum height H 1 and a second uppermost surface of the elongated polymer multilayer microstructures at the minimum height H 2 A line extending between. 如請求項28所述之方法,每一伸長聚合物多層微結構具有一最大高度H及在該最大高度之一半(H/2)處量測的一寬度W,且包含在約0.1至約10之一範圍內之一縱橫比W/H。The method of claim 28, each of the elongated polymer multilayer microstructures has a maximum height H and a width W measured at one-half (H/2) of the maximum height, and is included in about 0.1 to about 10 One aspect ratio W/H within one range. 如請求項23所述之方法,其中該第一層及該第二層係在流體壓力下利用一噴嘴連續地沉積。The method of claim 23, wherein the first layer and the second layer are continuously deposited using a nozzle under fluid pressure. 如請求項32所述之方法,其中該輻射包含紫外線光。The method of claim 32, wherein the radiation comprises ultraviolet light. 如請求項33所述之方法,其中每一伸長聚合物多層微結構包含小於15度之一表面傾斜角,且其中該表面傾斜角係藉由形成於以下兩者之間的一角界定:平行於該玻璃基板之該主表面之一線,及在處於最大高度H1 的該伸長聚合物微結構之一第一最上表面與處於最小高度H2 的該伸長聚合物多層微結構之一第二最上表面之間延伸的一線。The method of claim 33, wherein each elongated polymer multilayer microstructure includes a surface tilt angle of less than 15 degrees, and wherein the surface tilt angle is defined by an angle formed between: parallel to A line of the main surface of the glass substrate, and a first uppermost surface of one of the elongated polymer microstructures at the maximum height H 1 and a second uppermost surface of the elongated polymer multilayer microstructures at the minimum height H 2 A line extending between. 如請求項33所述之方法,其中每一伸長聚合物多層微結構具有一最大高度H及在該最大高度之一半(H/2)處量測的一寬度W,且進一步包含在約0.1至約10之一範圍內之一縱橫比W/H。The method of claim 33, wherein each elongated polymer multilayer microstructure has a maximum height H and a width W measured at one-half (H/2) of the maximum height, and further includes about 0.1 to An aspect ratio W/H within a range of about 10. 如請求項23所述之方法,其中將一噴墨印表機用於沉積該第一層及沉積該第二層。The method of claim 23, wherein an inkjet printer is used to deposit the first layer and the second layer. 一種形成一光導板之方法,該方法包含以下步驟: 在一玻璃基板之一主表面上沉積一可固化液體,以提供伸長的間隔分開之第一可固化液體層之一陣列;至少部分地固化伸長的間隔分開之可固化液體層之該陣列,以形成間隔分開的至少部分固化之聚合物層之一陣列;在間隔分開的至少部分固化之聚合物層之該陣列上沉積額外可固化液體,以形成伸長的間隔分開之第二可固化液體層之一陣列;至少部分地固化伸長的間隔分開之第二可固化液體層之該陣列,以形成至少部分固化之伸長聚合物多層微結構之一陣列;及在至少部分固化之伸長聚合物多層微結構之該陣列上視情況形成至少部分固化之伸長聚合物微結構之一額外陣列,使得至少部分固化之伸長聚合物多層微結構之該陣列包含n個層,其中n在2至10之一範圍內。A method for forming a light guide plate, the method includes the following steps: Depositing a curable liquid on a major surface of a glass substrate to provide an array of first spaced apart curable liquid layers; at least partially curing the array of spaced apart spaced curable liquid layers, to Forming an array of spaced apart at least partially cured polymer layers; depositing additional curable liquid on the array of spaced apart at least partially cured polymer layers to form an elongated spaced apart second curable liquid layer An array; an array of at least partially cured elongated spaced apart second curable liquid layers to form an array of at least partially cured elongated polymer multilayer microstructures; and at least partially cured elongated polymer multilayer microstructures An additional array of at least partially cured elongated polymer microstructures is optionally formed on the array such that the array of at least partially cured elongated polymer multilayer microstructures includes n layers, where n is in the range of 2 to 10 . 如請求項37所述之方法,其中每一伸長聚合物多層微結構具有一最大高度H、在該最大高度之一半(H/2)處量測的一寬度W及用於LED光之1D調光之一縱橫比W/H。The method of claim 37, wherein each elongated polymer multilayer microstructure has a maximum height H, a width W measured at one-half (H/2) of the maximum height, and a 1D adjustment for LED light One aspect ratio of light is W/H. 如請求項37所述之方法,其中每一伸長聚合物多層微結構包含小於15度之一表面傾斜角,且其中該表面傾斜角係藉由形成於以下兩者之間的一角界定:平行於該玻璃基板之該主表面之一線,及在處於最大高度H1 的該伸長聚合物微結構之一第一最上表面與處於最小高度H2 的該伸長聚合物多層微結構之一第二最上表面之間延伸的一線。The method of claim 37, wherein each elongated polymer multilayer microstructure includes a surface tilt angle of less than 15 degrees, and wherein the surface tilt angle is defined by an angle formed between: parallel to A line of the main surface of the glass substrate, and a first uppermost surface of one of the elongated polymer microstructures at the maximum height H 1 and a second uppermost surface of the elongated polymer multilayer microstructures at the minimum height H 2 A line extending between. 如請求項37所述之方法,其中每一伸長聚合物多層微結構具有一最大高度H及在該最大高度之一半(H/2)處量測的一寬度W,以及在約0.1至約10之一範圍內之一縱橫比W/H。The method of claim 37, wherein each elongated polymer multilayer microstructure has a maximum height H and a width W measured at one-half (H/2) of the maximum height, and at about 0.1 to about 10 One aspect ratio W/H within one range. 如請求項37所述之方法,其中將一噴墨印表機用於沉積該可固化液體及沉積該額外可固化液體。The method of claim 37, wherein an inkjet printer is used to deposit the curable liquid and deposit the additional curable liquid.
TW108119285A 2018-06-08 2019-06-04 Glass articles including elongate polymeric microstructures TW202001310A (en)

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