TW201944147A - Optical sheet for liquid crystal display featuring light guide plate, backlight unit for liquid crystal display featuring light guide plate and liquid crystal display featuring light guide plate including a first optical film (light guide plate), a low refractive index layer and a second optical film (reflecting plate) - Google Patents

Optical sheet for liquid crystal display featuring light guide plate, backlight unit for liquid crystal display featuring light guide plate and liquid crystal display featuring light guide plate including a first optical film (light guide plate), a low refractive index layer and a second optical film (reflecting plate)

Info

Publication number
TW201944147A
TW201944147A TW107112389A TW107112389A TW201944147A TW 201944147 A TW201944147 A TW 201944147A TW 107112389 A TW107112389 A TW 107112389A TW 107112389 A TW107112389 A TW 107112389A TW 201944147 A TW201944147 A TW 201944147A
Authority
TW
Taiwan
Prior art keywords
gel
light guide
guide plate
refractive index
liquid crystal
Prior art date
Application number
TW107112389A
Other languages
Chinese (zh)
Other versions
TWI783986B (en
Inventor
服部大輔
中村恒三
吉川貴博
Original Assignee
日商日東電工股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日東電工股份有限公司 filed Critical 日商日東電工股份有限公司
Priority to TW107112389A priority Critical patent/TWI783986B/en
Publication of TW201944147A publication Critical patent/TW201944147A/en
Application granted granted Critical
Publication of TWI783986B publication Critical patent/TWI783986B/en

Links

Landscapes

  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Laminated Bodies (AREA)

Abstract

The present invention provides an optical sheet for a liquid crystal display featuring a light guide plate having a low refractive index layer having an extremely low refractive index. The optical sheet for a liquid crystal display featuring a light guide plate of the present invention is characterized by having a first optical film (light guide plate), a low refractive index layer and a second optical film (reflecting plate) that are laminated in the above-described order. The refractive index of the low refractive index layer is 1.25 or less.

Description

導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display

本發明涉及一種導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器。The present invention relates to an optical sheet for a light guide plate type liquid crystal display, a backlight unit for a light guide plate type liquid crystal display, and a light guide plate type liquid crystal display.

發明背景 在導光板方式LCD(Liquid Crystal Display,亦稱液晶顯示裝置或液晶顯示器)等光學器件中,譬如係利用低折射率之空氣層作為全反射層。具體上,譬如液晶器件中之各光學薄膜構件(譬如導光板及反射板)係隔著空氣層積層。然而,隨著器件之薄型化趨勢,各構件之一體化乃眾所期望。因此,多半執行不夾空氣層而以黏接著劑使各構件一體化的方法(譬如專利文獻1)。但,一旦沒有發揮全反射作用的空氣層,斜角入射光就不會被全反射而變得無法利用復歸反射(retroreflection),恐會降低光的利用效率。BACKGROUND OF THE INVENTION In optical devices such as a light guide plate LCD (Liquid Crystal Display, also known as a liquid crystal display device or a liquid crystal display), for example, an air layer with a low refractive index is used as a total reflection layer. Specifically, for example, each optical film member (such as a light guide plate and a reflection plate) in a liquid crystal device is laminated with air therebetween. However, as devices become thinner, the integration of various components is expected. Therefore, the method of integrating each member with an adhesive without interposing an air layer is performed mostly (for example, patent document 1). However, once the air layer that does not have a total reflection function is used, oblique incident light will not be totally reflected and retroreflection cannot be used, which may reduce the light utilization efficiency.

爰此,有文獻提議使用低折射率層來替代空氣層。譬如,在專利文獻2中便記載一種在導光板與反射板之間插入折射率比導光板低之層的結構。Therefore, some literatures have proposed using a low refractive index layer instead of the air layer. For example, Patent Document 2 describes a structure in which a layer having a lower refractive index than the light guide plate is inserted between the light guide plate and the reflection plate.

先前技術文獻 專利文獻 專利文獻1:日本特開2012-156082號公報 專利文獻2:日本特開平10-62626號公報Prior Art Literature Patent Literature Patent Literature 1: Japanese Patent Application Laid-Open No. 2012-156082 Patent Literature 2: Japanese Patent Application Laid-Open No. 10-62626

發明概要 發明欲解決之課題 但,低折射率層的折射率比空氣層高出許多,所以無法充分發揮作為空氣層的替代作用,依舊無法避免光學特性降低。SUMMARY OF THE INVENTION Problems to be Solved by the Invention However, since the refractive index of the low-refractive index layer is much higher than that of the air layer, it is not possible to fully play the role of replacement of the air layer, and it is still impossible to avoid degradation of optical characteristics.

爰此,本發明目的在於提供一種具有折射率極低之低折射率層的導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器。 用以解決課題之手段Therefore, an object of the present invention is to provide an optical sheet for a light guide plate type liquid crystal display, a light guide plate type liquid crystal display backlight unit, and a light guide plate type liquid crystal display having a low refractive index layer having an extremely low refractive index. Means to solve the problem

為了達成前述目的,本發明之導光板方式液晶顯示器用光學片材的特徵在於:第1光學薄膜、低折射率層與第2光學薄膜按前述順序積層,且前述低折射率層之折射率為1.25以下。In order to achieve the foregoing object, the optical sheet for a light guide plate type liquid crystal display of the present invention is characterized in that the first optical film, the low refractive index layer, and the second optical film are laminated in the aforementioned order, and the refractive index of the low refractive index layer is Below 1.25.

本發明之導光板方式液晶顯示器用背光單元包含前述本發明之導光板方式液晶顯示器用光學片材、側光及導光板。The backlight unit for a light guide plate type liquid crystal display of the present invention includes the optical sheet for a light guide plate type liquid crystal display of the present invention, a side light, and a light guide plate.

本發明之導光板方式液晶顯示器包含前述本發明之導光板方式液晶顯示器用背光單元。The light guide plate type liquid crystal display of the present invention includes the aforementioned backlight unit for a light guide plate type liquid crystal display of the present invention.

發明效果 根據本發明,可提供一種具有折射率極低之低折射率層的導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器。Advantageous Effects of Invention According to the present invention, it is possible to provide an optical sheet for a light guide plate type liquid crystal display, a backlight unit for a light guide plate type liquid crystal display, and a light guide plate type liquid crystal display having a low refractive index layer having an extremely low refractive index.

用以實施發明之形態 接下來,舉例進一步具體說明本發明。惟,本發明不受以下說明任何限定。Modes for Carrying Out the Invention The present invention will be described in more detail by way of examples. However, this invention is not limited at all by the following description.

本發明之導光板方式液晶顯示器用光學片材中,譬如前述第1光學薄膜及前述第2光學薄膜可分別為下板偏光板、增亮薄膜、稜鏡片、擴散板、導光板或反射板。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, the first optical film and the second optical film may be a lower polarizing plate, a brightness enhancing film, a cymbal, a diffusion plate, a light guide plate, or a reflecting plate, respectively.

本發明之導光板方式液晶顯示器用光學片材中,譬如前述第1光學薄膜及前述第2光學薄膜之至少一者可為導光板。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, at least one of the first optical film and the second optical film may be a light guide plate.

本發明之導光板方式液晶顯示器用光學片材中,譬如可以是前述第1光學薄膜及前述第2光學薄膜之一者為導光板,且另一者為導光板以外之光學構件。前述導光板以外之光學構件譬如可為反射板、擴散板或是稜鏡片或附擴散機能之稜鏡片。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, one of the first optical film and the second optical film may be a light guide plate, and the other may be an optical member other than the light guide plate. The optical components other than the light guide plate may be, for example, a reflection plate, a diffusion plate, or a cymbal or a cymbal with a diffusion function.

又,本發明之導光板方式液晶顯示器用光學片材譬如可含有一或多個前述第1光學薄膜及前述第2光學薄膜以外之其他光學薄膜。The optical sheet for a light guide plate type liquid crystal display of the present invention may contain, for example, one or more of the first optical film and the second optical film other than the second optical film.

本發明之導光板方式液晶顯示器用光學片材中,譬如前述第1光學薄膜及前述第2光學薄膜之至少一者可以隔著黏接著層與前述低折射率層積層。另,以下當前述低折射率層與前述第1光學薄膜隔著黏接著層而積層時,有時會將前述黏接著層稱作「第1黏接著層」。又,以下當前述低折射率層與前述第2光學薄膜隔著黏接著層而積層時,有時會將前述黏接著層稱作「第2黏接著層」。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, at least one of the first optical film and the second optical film may be laminated with the low refractive index layer through an adhesive layer. In addition, when the low refractive index layer and the first optical film are laminated with an adhesive layer interposed therebetween, the adhesive layer may be referred to as a "first adhesive layer" in some cases. In addition, when the low refractive index layer and the second optical film are laminated with an adhesive layer interposed therebetween, the adhesive layer may be referred to as a "second adhesive layer".

在本發明之導光板方式液晶顯示器用光學片材,譬如前述低折射率層可為空隙層。又,譬如前述低折射率層可為空隙率35體積%以上之空隙層。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, the aforementioned low refractive index layer may be a void layer. In addition, for example, the low refractive index layer may be a void layer having a porosity of 35% by volume or more.

在本發明之導光板方式液晶顯示器用光學片材,譬如相對於前述第1黏接著層、前述低折射率層及前述第2黏接著層的合計厚度,前述第1黏接著層及前述第2黏接著層的合計厚度譬如可為85%以上、88%以上、90%以上或92%以上,且譬如可為99.9%以下、99.5%以下、99.3%以下或99.2%以下。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, the first adhesive layer and the second adhesive layer are thicker than the total thickness of the first adhesive layer, the low refractive index layer, and the second adhesive layer. The total thickness of the adhesive layer may be, for example, 85% or more, 88% or more, 90% or more, or 92% or more, and may be, for example, 99.9% or less, 99.5% or less, 99.3% or less, or 99.2% or less.

在本發明之導光板方式液晶顯示器用光學片材,譬如前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體的透光率可以在80%以上。又譬如前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體的霧度可以在3%以下。前述透光率譬如可為82%以上、84%以上、86%以上或88%以上,且上限並無特別限定,理想為100%,譬如可為95%以下、92%以下、91%以下或90%以下。前述積層體之霧度測定譬如可以與後述低折射率層之霧度測定同樣的方法進行。又,前述透光率係波長550nm的光透射率,譬如可利用以下測定方法進行測定。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, the light transmittance of a laminate of the first adhesive layer, the low refractive index layer, and the second adhesive layer may be 80% or more. For example, the haze of the laminated body of the first adhesive layer, the low refractive index layer, and the second adhesive layer may be 3% or less. The light transmittance may be, for example, 82% or more, 84% or more, 86% or more, or 88% or more, and the upper limit is not particularly limited, and is preferably 100%, for example, 95% or less, 92% or less, 91% or less 90% or less. The haze measurement of the laminated body can be performed, for example, by the same method as the haze measurement of the low refractive index layer described later. The light transmittance is a light transmittance at a wavelength of 550 nm, and can be measured by, for example, the following measurement method.

(透光率之測定方法) 使用分光光度計U-4100((股)日立製作所之商品名),以含低折射率層之黏接著片沒有貼分離件的狀態(前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體),作為測定對象的試樣。接著,測定令空氣之全光線透光率為100%時的前述試樣之全光線透光率(透光率)。前述全光線透光率(透光率)之值係以波長550nm下的測定值作為其值。(Measurement method of light transmittance) Using a spectrophotometer U-4100 (trade name of Hitachi, Ltd.), the adhesive sheet containing a low refractive index layer is not attached with a separator (the first adhesive layer, A laminate of the low refractive index layer and the second adhesive layer) was used as a sample to be measured. Next, the total light transmittance (light transmittance) of the aforementioned sample when the total light transmittance of air was 100% was measured. The value of the total light transmittance (light transmittance) is a value measured at a wavelength of 550 nm.

本發明之導光板方式液晶顯示器用光學片材的製造方法並無特別限定,譬如可以是包含下列步驟的製造方法:低折射率層形成步驟,於轉印用樹脂薄膜基材上形成前述低折射率層;及轉印步驟,將前述低折射率層轉印至前述黏接著層上。另,以下有時會將該製造方法稱作「第1導光板方式液晶顯示器用光學片材之製造方法」。又,一般有時會將厚度較小之物稱作「薄膜」且厚度較大之物稱作「薄片」以做區分,不過在本發明中,「薄膜」及「薄片」並無特別區分。The manufacturing method of the optical sheet for a light guide plate type liquid crystal display of the present invention is not particularly limited. For example, the manufacturing method may include the following steps: a low-refractive-index layer forming step to form the aforementioned low-refractive index on a resin film substrate for transfer Rate layer; and a transfer step, transferring the aforementioned low refractive index layer onto the aforementioned adhesive layer. In addition, this manufacturing method may be called "the manufacturing method of the optical sheet for 1st light-guide plate-type liquid crystal display" hereafter. In addition, a thing with a small thickness is sometimes referred to as a "film" and a thing with a large thickness is sometimes referred to as a "sheet", but in the present invention, the "film" and the "sheet" are not particularly distinguished.

本發明之第1導光板方式液晶顯示器用光學片材的製造方法,譬如亦可進一步具有分離件貼附步驟,其係在前述黏接著層之與前述低折射率層相反側之面附添前述分離件。The method for manufacturing an optical sheet for a liquid crystal display device of the first light guide plate method of the present invention may further include a step of attaching a separator, for example, adding the foregoing to the side of the adhesive layer opposite to the low refractive index layer. Separate pieces.

本發明之第1導光板方式液晶顯示器用光學片材的製造方法,譬如亦可進一步具有轉印用樹脂薄膜基材剝離步驟,其係在前述分離件貼附步驟後,將前述轉印用樹脂薄膜基材剝離。在此情況下,前述分離件與前述黏接著層之剝離力宜大於前述轉印用樹脂薄膜基材與前述低折射率層之剝離力。又譬如可進一步具有分離件剝離步驟及於其後具有光學薄膜附添步驟,前者係將前述分離件自前述黏接著層剝離,後者係將前述第1光學薄膜或前述第2光學薄膜貼附至前述黏接著層。另,譬如亦可不使用前述分離件,而在前述第1光學薄膜或前述第2光學薄膜上直接貼附至前述黏接著層以替代前述分離件。The first method for producing an optical sheet for a liquid crystal display of the light guide plate method of the present invention may further include a step of peeling off a resin film substrate for transfer, which is a step of attaching the resin for transfer after the step of attaching the separator The film substrate is peeled. In this case, the peeling force between the separator and the adhesive layer should be greater than the peeling force between the transfer resin film substrate and the low refractive index layer. For another example, it is possible to further include a step of peeling off the separator and a step of attaching an optical film, the former is to peel the separator from the adhesive layer, and the latter is to attach the first optical film or the second optical film to The aforementioned adhesive layer. For example, instead of using the separator, the first optical film or the second optical film may be directly attached to the adhesive layer instead of the separator.

在本發明之第1導光板方式液晶顯示器用光學片材的製造方法,譬如前述轉印用樹脂薄膜基材可以由含脂環式結構樹脂或含脂肪族結構樹脂所形成。若從針對低折射率層形成時之加熱乾燥等的耐久性觀點來看,特別期許為耐熱性優異的含脂環式結構樹脂。前述含脂肪族結構樹脂並無特別限定,可舉如聚烯烴、聚丙烯、聚甲基戊烯等。前述含脂環式結構樹脂並無特別限定,可舉如聚降莰烯、環狀烯烴共聚物等。In the method for producing an optical sheet for a liquid crystal display device of the first light guide plate method of the present invention, for example, the resin film substrate for transfer may be formed of an alicyclic structure resin or an aliphatic structure resin. From the viewpoint of durability such as heat drying when the low refractive index layer is formed, an alicyclic structure resin having excellent heat resistance is particularly expected. The aforementioned aliphatic structure-containing resin is not particularly limited, and examples thereof include polyolefin, polypropylene, and polymethylpentene. The aforementioned alicyclic structure-containing resin is not particularly limited, and examples thereof include polynorbornene and a cyclic olefin copolymer.

另,本發明之導光板方式液晶顯示器用光學片材的製造方法亦可為包含下列步驟之製造方法:塗覆步驟,於前述黏接著層上直接塗覆前述低折射率層之原料的塗覆液;及乾燥步驟,將前述塗覆液予以乾燥。又,以下有時會將該製造方法稱作「第2導光板方式液晶顯示器用光學片材之製造方法」。In addition, the method for manufacturing an optical sheet for a light guide plate type liquid crystal display of the present invention may also be a manufacturing method including the following steps: a coating step of directly coating the raw material of the low refractive index layer on the adhesive layer; And a drying step of drying the coating liquid. In addition, this manufacturing method may be called "the manufacturing method of the optical sheet for 2nd light-guide plate-type liquid crystal display" hereafter.

另,本發明之導光板方式液晶顯示器用光學片材的製造方法亦可為包含下列步驟之製造方法:塗覆步驟,於前述第1光學薄膜上或前述第2光學薄膜上直接塗覆前述低折射率層之原料的塗覆液;及乾燥步驟,將前述塗覆液予以乾燥。又,以下有時會將該製造方法稱作「第3導光板方式液晶顯示器用光學片材之製造方法」。此外,以下有時會將本發明之第1、第2及第3導光板方式液晶顯示器用光學片材的製造方法統稱為「本發明之導光板方式液晶顯示器用光學片材之製造方法」。In addition, the method for manufacturing an optical sheet for a light guide plate type liquid crystal display of the present invention may also be a manufacturing method including the following steps: a coating step in which the aforementioned low optical layer is directly coated on the first optical film or the second optical film. A coating liquid for the raw material of the refractive index layer; and a drying step of drying the coating liquid. In addition, this manufacturing method may be called "the manufacturing method of the optical sheet for 3rd light guide plate type liquid crystal display" hereafter. In addition, below, the manufacturing method of the optical sheet for 1st, 2nd, and 3rd light guide plate type liquid crystal displays of this invention may be collectively called "the manufacturing method of the optical sheet for light guide plate type liquid crystal displays of this invention."

在導光板方式液晶顯示器(以下有時會稱作「導光板方式LCD」),譬如有於背光(側光)使用LED(light emitting diode:發光二極體)的LED導光板方式LCD。譬如,在比導光板方式LCD之下板偏光板更靠近背光側的各光學薄膜中,可隔著空氣層積層各光學薄膜,該空氣層發揮將以光學上某一定程度以上之角度入射進來之光予以反射的作用。在LED導光板方式LCD中,譬如可依序積層反射板、導光板(含LED)、擴散板、稜鏡片、附擴散之稜鏡片、增亮薄膜(反射偏光薄膜)、下板偏光板。In a light guide plate type liquid crystal display (hereinafter sometimes referred to as a “light guide plate type LCD”), for example, an LED light guide plate type LCD using an LED (light emitting diode) as a backlight (side light) is used. For example, each optical film closer to the backlight side than the polarizer of the lower plate of the light guide plate LCD can be laminated with air through the air layer. The air layer will be incident at an angle above a certain degree optically. The effect of light reflection. In the LED light guide plate type LCD, for example, a reflective plate, a light guide plate (including LED), a diffusion plate, a cymbal, a diffuser with a diffuser, a brightness enhancement film (reflective polarizing film), and a lower polarizer can be sequentially laminated.

但,前述空氣層存在時,譬如藉由光學薄膜伴隨LCD大型化而起之撓曲,恐引起光學特性降低等情況。又,譬如可能因異物進入前述空氣層,而降低導光板方式LCD於組裝步驟時的成品率。爰此,為了解決該等問題,能想到的是企圖不用空氣層便將各光學薄膜一體化並減少組裝步驟時之積層所需的各光學薄膜數。但,屆時若單純利用黏接著劑進行一體化,便可能會因為沒有發揮全反射作用的空氣層,而如前述變成斜角入射光不能被全反射而無法利用復歸反射。而且,藉此可能會降低光的利用效率。However, when the above-mentioned air layer is present, for example, the optical film may be deflected due to the enlargement of the LCD, which may cause degradation of optical characteristics. In addition, for example, foreign matter may enter the air layer, thereby reducing the yield of the light guide plate type LCD during the assembly step. Therefore, in order to solve these problems, it is conceivable to attempt to integrate the optical films without using an air layer and reduce the number of optical films required for the lamination during the assembly step. However, if the adhesive is used for integration at that time, there may not be an air layer that exerts the function of total reflection, and as described above, the incident light that becomes oblique angle cannot be totally reflected and the retroreflection cannot be used. Furthermore, this may reduce the efficiency of light utilization.

另一方面,為了解決前述問題,亦可考慮插入低折射率層來替代空氣層。但如前述,習知之低折射率層的折射率比空氣層高出許多,所以無法充分發揮作為空氣層的替代作用,依舊無法避免光學特性降低。相對於此,本發明之導光板方式液晶顯示器用光學片材的前述低折射率層之折射率極低為1.25以下,所以可發揮良好的光學特性。On the other hand, in order to solve the aforementioned problems, it is also conceivable to insert a low refractive index layer instead of the air layer. However, as mentioned above, the refractive index of the conventional low-refractive-index layer is much higher than that of the air layer, so the substitute function of the air layer cannot be fully exerted, and the degradation of optical characteristics cannot be avoided. In contrast, the low-refractive index layer of the optical sheet for a light guide plate type liquid crystal display of the present invention has an extremely low refractive index of 1.25 or less, and thus can exhibit good optical characteristics.

藉由本發明之導光板方式液晶顯示器用光學片材,譬如可使比LED導光板方式LCD之下板偏光板更靠背光側的光學薄膜一體化。又譬如,利用本發明使LED導光板方式LCD之各光學薄膜(譬如導光板與反射板或是導光板、反射板與擴散板)一體化,可減少LCD組裝步驟時的構件件數,所以可減少異物混入構件間的機會,改善組裝成品率。又譬如,可消除當光學薄膜(譬如反射板)隨著LCD大型化而因設置於構件時之撓曲造成光學特性降低(譬如亮度不均等)。According to the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, the optical film on the backlight side can be integrated more than the polarizer plate on the lower plate of the LED light guide plate type LCD. For another example, by using the present invention to integrate the optical films of the LED light guide plate type LCD (such as the light guide plate and the reflection plate or the light guide plate, the reflection plate and the diffusion plate), the number of components during the LCD assembly step can be reduced, so Reduce the chance of foreign matter mixing into components, and improve assembly yield. For another example, it is possible to eliminate the decrease in optical characteristics (such as uneven brightness) caused by the deflection when an optical film (such as a reflective plate) is installed on a member as the LCD is enlarged.

另,若想將低折射率層固定在基材上直接使用,包含低折射率層之總厚度會隨基材厚度的量而增加,所以將低折射率層組裝至導光板方式LCD中使用時,導光板方式LCD本身的厚度也會增加。相對於此,譬如因為本發明之導光板方式液晶顯示器用光學片材不含基材,所以能夠薄型化。具體而言,譬如不含基材便幾乎沒有前述黏接著層本身厚度以外的厚度增加,從而可將低折射率層機能導入導光板方式LCD中。惟,本發明不限於此,譬如本發明之導光板方式液晶顯示器用光學片材亦可包含基材。In addition, if you want to use the low refractive index layer directly on the substrate, the total thickness including the low refractive index layer will increase with the thickness of the substrate. Therefore, when the low refractive index layer is assembled into a light guide plate LCD for use The thickness of the light guide plate LCD itself will also increase. On the other hand, for example, since the optical sheet for a light guide plate type liquid crystal display of the present invention does not include a substrate, it can be made thin. Specifically, for example, there is almost no increase in thickness other than the thickness of the adhesive layer itself without the base material, so that the function of the low refractive index layer can be introduced into the light guide plate type LCD. However, the present invention is not limited to this. For example, the optical sheet for a light guide plate type liquid crystal display of the present invention may include a substrate.

又如前述,本發明之導光板方式液晶顯示器用光學片材譬如可以是前述低折射率層與前述第1光學薄膜及前述第2光學薄膜分別隔著黏接著層而積層。藉此,前述黏接著層可實質提升前述低折射率層的強度,保護其免受物理性的損傷。因此,可防止低折射率層的脆性變成致命的問題點。前述物理性的損傷具體來說,譬如當利用低折射率層使各光學薄膜一體化時,可能有低折射率層之強度不足的情況,以及因為各光學薄膜之熱膨脹係數的不同而造成低折射率層無法承受光學薄膜間之應變的情況。利用前述黏接著層,即可保護低折射率層免受前述光學薄膜間之應變影響。又譬如,藉由前述黏接著層,可彌補前述低折射率層的耐擦傷性,進而可保護前述低折射率層免於擦傷。而且,本發明之導光板方式液晶顯示器用光學片材可藉由前述黏接著層而貼附至其他構件上,因此很容易將前述低折射率層本身導入導光板方式LCD中。即,根據本發明之導光板方式液晶顯示器用光學片材,譬如可在維持具有高空隙率之低折射率層的狀態下,做到薄型化及低折射率層的物理性保護,更可在同時維持高透明性的狀態下,輕易地於其他導光板方式LCD中導入具有低折射率層的功能。As mentioned above, the optical sheet for a light guide plate type liquid crystal display of the present invention may be, for example, a laminate of the low refractive index layer, the first optical film, and the second optical film via an adhesive layer. Thereby, the adhesive layer can substantially enhance the strength of the low refractive index layer and protect it from physical damage. Therefore, it is possible to prevent the brittleness of the low refractive index layer from becoming a fatal problem. Specifically, the physical damage described above, for example, when the optical films are integrated by using a low refractive index layer, the strength of the low refractive index layer may be insufficient, and the low refractive index may be caused by the difference in the thermal expansion coefficients of the optical films. The rate layer cannot withstand the strain between the optical films. By using the adhesive layer, the low refractive index layer can be protected from the strain between the optical films. For another example, the abrasion resistance of the low-refractive index layer can be compensated by the adhesive layer, and the low-refractive index layer can be protected from abrasion. In addition, the optical sheet for a light guide plate type liquid crystal display of the present invention can be attached to other members by the aforementioned adhesive layer, so it is easy to introduce the low refractive index layer itself into a light guide plate type LCD. That is, according to the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, a thin layer and a low refractive index layer can be physically protected while maintaining a low refractive index layer having a high porosity. While maintaining high transparency, it is easy to introduce the function of a low-refractive-index layer into other light guide plate LCDs.

[1.導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器] 以下利用圖1、2及6,舉例說明本發明之導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器的構成。另,圖1、2及6雖為截面圖,但為了簡略圖示,省略了影線。[1. Light guide plate type liquid crystal display optical sheet, light guide plate type liquid crystal display backlight unit and light guide plate type liquid crystal display] The following uses FIGS. 1, 2 and 6 to illustrate the light guide plate type liquid crystal display optical sheet of the present invention by way of example. Material, the structure of a light guide plate type liquid crystal display backlight unit and a light guide plate type liquid crystal display. In addition, although FIGS. 1, 2 and 6 are sectional views, hatching is omitted for the sake of simplicity.

首先,於圖6之截面圖顯示不使用低折射率層的導光板方式液晶顯示器(導光板方式LCD)之構成一例。如同圖示,該導光板方式LCD6000係單元A1~A6由下按前述順序積層所構成。單元A1係由反射板1020所構成。單元A2係由導光板1010所構成。導光板1010具有側光。單元A3係由擴散板1090所構成。單元A4係稜鏡片1030及擴散片(附擴散之稜鏡片)1040由下按前述順序積層所構成。單元A5係由增亮薄膜1050所構成。單元A6係下板偏光板1060、黏著劑(黏接著層)1070及液晶面板1080由下按前述順序積層所構成。又,單元A1與A2之間及單元A2與A3之間分別配置有空氣層。First, an example of the configuration of a light guide plate type liquid crystal display (light guide plate type LCD) without using a low refractive index layer is shown in the cross-sectional view of FIG. 6. As shown in the figure, the LCD6000 series units A1 to A6 of the light guide plate method are formed by laminating in the above order. The unit A1 is composed of a reflection plate 1020. The unit A2 is composed of a light guide plate 1010. The light guide plate 1010 has side light. The unit A3 is composed of a diffusion plate 1090. The unit A4 series cymbal 1030 and the diffusion sheet (the cymbal with a diffusion sheet) 1040 are composed of laminated layers in the aforementioned order. The unit A5 is composed of a brightness enhancement film 1050. The unit A6 series lower plate polarizing plate 1060, the adhesive (adhesive layer) 1070, and the liquid crystal panel 1080 are formed by laminating layers in the aforementioned order. In addition, air layers are arranged between the units A1 and A2 and between the units A2 and A3, respectively.

又,於圖1之截面圖顯示本發明之導光板方式液晶顯示器(導光板方式LCD)之構成一例。如同圖示,該導光板方式LCD1000係單元A1及單元A2隔著黏接著層及低折射率層被一體化而形成了單元A12,除此以外與圖6之導光板方式LCD6000相同。較具體而言,該導光板方式LCD1000在單元A1與A2之間具有低折射率層20與黏接著層30之積層體來替代空氣層。該積層體於低折射率層20之兩面分別直接積層有黏接著層30。單元A1之反射板1020及單元A2之導光板1010則分別透過黏接著層30而接著(黏著)於低折射率層20上。如前述,藉此讓單元A1及單元A2被一體化而形成了單元A12。又,低折射率層20的折射率為1.25以下。單元A12相當於本發明之導光板方式液晶顯示器用光學片材。導光板1010及反射板1020可視為其任一者為前述第1光學薄膜,另一者為前述第2光學薄膜。又,單元A12為導光板方式液晶顯示器用光學片材,含有導光板1010,且導光板1010如前述具有側光。因此,單元A12也相當於本發明之導光板方式液晶顯示器用背光單元。An example of the configuration of the light guide plate type liquid crystal display (light guide plate type LCD) of the present invention is shown in the cross-sectional view in FIG. 1. As shown in the figure, the light guide plate type LCD1000 series unit A1 and unit A2 are integrated through the adhesive layer and the low refractive index layer to form a unit A12, except that it is the same as the light guide plate type LCD6000 in FIG. 6. More specifically, the light guide plate type LCD 1000 has a laminated body of the low refractive index layer 20 and the adhesive layer 30 between the units A1 and A2 instead of the air layer. The laminated body is directly laminated with an adhesive layer 30 on both sides of the low refractive index layer 20 respectively. The reflective plate 1020 of the unit A1 and the light guide plate 1010 of the unit A2 respectively pass through the adhesive layer 30 and are then (adhered) to the low refractive index layer 20. As described above, unit A1 and unit A2 are thereby integrated to form unit A12. The refractive index of the low refractive index layer 20 is 1.25 or less. The unit A12 corresponds to an optical sheet for a light guide plate type liquid crystal display of the present invention. One of the light guide plate 1010 and the reflection plate 1020 can be regarded as the aforementioned first optical film and the other as the aforementioned second optical film. Unit A12 is an optical sheet for a light guide plate type liquid crystal display, and includes a light guide plate 1010, and the light guide plate 1010 has side light as described above. Therefore, the unit A12 also corresponds to the backlight unit for a light guide plate type liquid crystal display of the present invention.

圖1之導光板方式LCD1000中,低折射率層20之折射率極低為1.25以下,近似空氣層之折射率,因此可發揮良好的光學特性。In the light guide plate type LCD 1000 of FIG. 1, the refractive index of the low refractive index layer 20 is extremely low of 1.25 or less, which is similar to the refractive index of the air layer, so it can exhibit good optical characteristics.

又,圖1之導光板方式LCD1000沒有用以固定低折射率層20的基材,所以能夠導入低折射率層20且不會有來自基材的厚度增加。藉此,可做到導光板方式LCD的薄型化。In addition, since the light guide plate type LCD 1000 of FIG. 1 does not have a base material for fixing the low refractive index layer 20, the low refractive index layer 20 can be introduced without increasing the thickness from the base material. This makes it possible to reduce the thickness of the light guide plate type LCD.

此外,圖1之導光板方式LCD1000在低折射率層20之兩面積層有黏接著層30,因此能夠保護低折射率層20免受物理性的損傷。具體上,譬如可保護低折射率層20免受因為導光板1010及反射板1020之熱膨脹係數差異而來的應變影響。又,在將低折射率層20組裝至導光板方式LCD1000內的作業期間,可保護低折射率層20免於擦傷。In addition, the LCD 1000 of the light guide plate method of FIG. 1 has an adhesive layer 30 on both areas of the low-refractive index layer 20, so that the low-refractive index layer 20 can be protected from physical damage. Specifically, for example, the low-refractive-index layer 20 can be protected from strain due to the difference in thermal expansion coefficients of the light guide plate 1010 and the reflective plate 1020. In addition, during the operation of assembling the low refractive index layer 20 into the light guide plate type LCD 1000, the low refractive index layer 20 can be protected from scratches.

此外,圖1之導光板方式LCD1000在導光板1010及反射板1020之間沒有空氣層,因此可減少異物混入導光板1010及反射板1020之間的機會,改善組裝成品率。In addition, the light guide plate LCD 1000 of FIG. 1 does not have an air layer between the light guide plate 1010 and the reflection plate 1020, so the chance of foreign objects being mixed between the light guide plate 1010 and the reflection plate 1020 can be reduced, and the assembly yield can be improved.

又,於圖2之截面圖顯示本發明之導光板方式液晶顯示器(導光板方式LCD)之構成另一例。如同圖示,該導光板方式LCD2000係單元A12及單元A3隔著黏接著層及低折射率層被一體化而形成了單元A123,除此以外與圖1之導光板方式LCD1000相同。較具體而言,該導光板方式LCD2000在單元A12與A3之間具有低折射率層20與黏接著層30之積層體來替代空氣層。該積層體於低折射率層20之兩面分別直接積層有黏接著層30。單元A12之導光板1010及單元A3之擴散板1090則分別透過黏接著層30而接著(黏著)於低折射率層20上。如前述,藉此讓單元A12及單元A3被一體化而形成了單元A123。又,低折射率層20的折射率為1.25以下。單元A123相當於本發明之導光板方式液晶顯示器用光學片材。導光板1010及擴散板1090可視為其任一者為前述第1光學薄膜,另一者為前述第2光學薄膜。此外,與圖1之導光板方式LCD1000同樣地,導光板1010及反射板1020亦可視為其任一者為前述第1光學薄膜,另一者為前述第2光學薄膜。又,單元A123為導光板方式液晶顯示器用光學片材,含有導光板1010,且導光板1010如前述具有側光。因此,單元A123也相當於本發明之導光板方式液晶顯示器用背光單元。In addition, the sectional view of FIG. 2 shows another example of the configuration of the light guide plate type liquid crystal display (light guide plate type LCD) of the present invention. As shown in the figure, the unit A12 and unit A3 of the light guide plate method LCD2000 are integrated through the adhesive layer and the low refractive index layer to form unit A123, except that the unit A123 is the same as the light guide plate type LCD1000 of FIG. 1. More specifically, the light guide plate LCD2000 has a laminated body of the low refractive index layer 20 and the adhesive layer 30 between the units A12 and A3 instead of the air layer. The laminated body is directly laminated with an adhesive layer 30 on both sides of the low refractive index layer 20 respectively. The light guide plate 1010 of the unit A12 and the diffusion plate 1090 of the unit A3 respectively pass through the adhesive layer 30 and are then (adhered) on the low refractive index layer 20. As described above, the unit A12 and the unit A3 are integrated to form the unit A123. The refractive index of the low refractive index layer 20 is 1.25 or less. The unit A123 corresponds to an optical sheet for a light guide plate type liquid crystal display of the present invention. One of the light guide plate 1010 and the diffusion plate 1090 may be regarded as the aforementioned first optical film, and the other as the aforementioned second optical film. In addition, similarly to the light guide plate type LCD 1000 in FIG. 1, either of the light guide plate 1010 and the reflection plate 1020 can be regarded as the aforementioned first optical film and the other as the aforementioned second optical film. The unit A123 is an optical sheet for a light guide plate type liquid crystal display, includes a light guide plate 1010, and the light guide plate 1010 has side light as described above. Therefore, the unit A123 also corresponds to the backlight unit for a light guide plate type liquid crystal display of the present invention.

圖2之導光板方式LCD2000係藉由導光板1010及反射板1020分別透過黏接著層30而接著(黏著)至低折射率層20上,而可與圖1之導光板方式LCD1000發揮同樣的有利效果。又,圖2之導光板方式LCD2000係藉由導光板1010及擴散板1090分別透過黏接著層30而接著(黏著)至低折射率層20上,而可進一步發揮與前述同樣的有利效果。The light guide plate method LCD2000 of FIG. 2 can exert the same advantages as the light guide plate method LCD1000 of FIG. 1 through the light guide plate 1010 and the reflection plate 1020 respectively through the adhesive layer 30 and then (adhesive) to the low refractive index layer 20 effect. In the light guide plate LCD2000 of FIG. 2, the light guide plate 1010 and the diffuser plate 1090 pass through the adhesive layer 30 and are then adhered (adhered) to the low-refractive index layer 20 to further exert the same advantageous effects as described above.

[2.導光板方式液晶顯示器用光學片材及其製造方法] 本發明之導光板方式液晶顯示器用光學片材的製造方法無特別限定,譬如可藉由下述方法來進行:前述本發明之第1導光板方式液晶顯示器用光學片材的製造方法、前述本發明之第2導光板方式液晶顯示器用光學片材的製造方法、或前述本發明之第3導光板方式液晶顯示器用光學片材的製造方法(本發明之導光板方式液晶顯示器用光學片材的製造方法)。以下舉例說明。另,以下有時會將本發明之導光板方式液晶顯示器用光學片材之構成要素的低折射率層稱作「本發明之低折射率層」。此外,有時會將製造本發明之低折射率層的方法稱作「本發明之低折射率層的製造方法」。[2. Optical sheet for light guide plate type liquid crystal display and manufacturing method thereof] The manufacturing method of the optical sheet for light guide plate type liquid crystal display of the present invention is not particularly limited, and it can be performed by, for example, the following method: Method for producing optical sheet for first light guide plate type liquid crystal display, method for producing optical sheet for second light guide plate type liquid crystal display of the present invention, or optical sheet for third light guide plate type liquid crystal display of the present invention (A method for producing an optical sheet for a light guide plate type liquid crystal display of the present invention). Here are some examples. In addition, the low-refractive-index layer which is a component of the optical sheet for light-guide plate-type liquid crystal displays of this invention may be called the "low-refractive-index layer of this invention" hereafter. In addition, the method of manufacturing the low-refractive-index layer of this invention may be called "the manufacturing method of the low-refractive-index layer of this invention."

[2-1.低折射率層及其製造方法] 本發明之低折射率層譬如亦可由矽化合物所形成。另,本發明之低折射率層譬如亦可以為藉由微細孔粒子彼此之化學鍵結所形成的低折射率層。譬如,前述微細孔粒子亦可為凝膠的粉碎物。[2-1. Low-refractive index layer and manufacturing method thereof] The low-refractive index layer of the present invention may be formed of, for example, a silicon compound. The low-refractive index layer of the present invention may be, for example, a low-refractive index layer formed by chemically bonding fine-pored particles to each other. For example, the fine-pored particles may be a pulverized product of a gel.

在本發明之低折射率層的製造方法中,譬如用以粉碎前述多孔體之凝膠的凝膠粉碎步驟亦可為1階段,不過宜分成多個粉碎階段進行。前述粉碎階段數並無特別限定,譬如可為2階段,亦可為3階段以上。In the method for producing a low-refractive index layer according to the present invention, for example, the gel pulverization step for pulverizing the gel of the porous body may be one step, but it is preferably performed by dividing into a plurality of pulverization steps. The number of the pulverization stages is not particularly limited, and may be, for example, two stages or three or more stages.

在本發明之低折射率層的製造方法中,譬如亦可前述多個粉碎階段包含用以粉碎前述凝膠之第1粉碎階段及第2粉碎階段,前述第1粉碎階段係將前述凝膠粉碎做成體積平均粒徑0.5~100μm之粒子的階段,前述第2粉碎階段則係於前述第1粉碎階段後將前述粒子進一步粉碎做成體積平均粒徑10~1000nm之粒子的階段。又,在此情況下,前述多個粉碎階段可含或可不含前述第1粉碎階段及前述第2粉碎階段以外的粉碎階段。In the method for producing a low refractive index layer of the present invention, for example, the plurality of pulverization stages may include a first pulverization stage and a second pulverization stage for pulverizing the gel, and the first pulverization stage is pulverizing the gel. A stage in which particles having a volume average particle diameter of 0.5 to 100 μm are made, and the second pulverization stage is a stage in which the particles are further pulverized into particles having a volume average particle diameter of 10 to 1000 nm after the first pulverization stage. In this case, the plurality of pulverization stages may or may not include pulverization stages other than the first pulverization stage and the second pulverization stage.

另,本發明中,「粒子」(譬如前述凝膠之粉碎物的粒子等)之形狀並無特別限定,例如可為球狀亦可為非球狀系等。又,在本發明中,前述粉碎物之粒子例如亦可為溶膠凝膠串珠狀粒子、奈米粒子(空心奈米二氧化矽・奈米球粒子)、奈米纖維等。In addition, in the present invention, the shape of the "particles" (such as particles of the pulverized product of the gel) is not particularly limited, and may be, for example, a spherical or non-spherical system. Furthermore, in the present invention, the particles of the pulverized material may be, for example, sol-gel beaded particles, nano particles (hollow nano silica, nano ball particles), nano fibers, and the like.

在本發明中,譬如前述凝膠宜為多孔質凝膠,且前述凝膠之粉碎物宜為多孔質,但不受此限。In the present invention, for example, the gel is preferably a porous gel, and the pulverized material of the gel is preferably porous, but is not limited thereto.

在本發明中,前述凝膠粉碎物亦可由具有譬如粒狀、纖維狀、平板狀之至少一種形狀之結構所構成。前述粒狀及平板狀之構成單元例如可由無機物所構成。又,前述粒狀構成單元之構成元素可含有例如選自於由Si、Mg、Al、Ti、Zn及Zr所構成群組中之至少一種元素。形成粒狀之結構體(構成單元)可為實心粒子亦可為中空粒子,具體上可列舉聚矽氧粒子或具有微細孔之聚矽氧粒子,二氧化矽中空奈米粒子或二氧化矽中空奈米球等。前述纖維狀之構成單元例如係直徑為奈米尺寸之奈米纖維,具體上可列舉纖維素奈米纖維或氧化鋁奈米纖維等。平板狀之構成單元可舉如奈米黏土,具體上可列舉奈米尺寸之膨土(例如Kunipia F[商品名])等。前述纖維狀之構成單元無特別限定,例如可為選自於由下列纖維所構成群組中之至少一種纖維狀物質:碳奈米纖維、纖維素奈米纖維、氧化鋁奈米纖維、幾丁質奈米纖維、幾丁聚醣奈米纖維、聚合物奈米纖維、玻璃奈米纖維及二氧化矽奈米纖維。In the present invention, the pulverized gel may have a structure having at least one of a granular shape, a fibrous shape, and a flat shape. The granular and flat structural units may be made of, for example, an inorganic substance. The constituent elements of the granular constituent unit may include, for example, at least one element selected from the group consisting of Si, Mg, Al, Ti, Zn, and Zr. The granular structure (constituting unit) can be solid particles or hollow particles. Specific examples include polysilicon particles or polysilicon particles with fine pores, hollow silica particles, or hollow silica particles. Nano ball and so on. The fibrous structural unit is, for example, a nanofiber having a nanometer diameter, and specific examples thereof include a cellulose nanofiber and an alumina nanofiber. Examples of the flat-shaped constituent unit are nanoclay, and specifically, nano-sized bentonite (for example, Kunipia F [trade name]) and the like are mentioned. The aforementioned fibrous constituent unit is not particularly limited, and may be, for example, at least one fibrous substance selected from the group consisting of carbon nanofiber, cellulose nanofiber, alumina nanofiber, and chitin. Quality nanofiber, chitosan nanofiber, polymer nanofiber, glass nanofiber and silicon dioxide nanofiber.

在本發明之低折射率層的製造方法中,前述凝膠粉碎步驟(譬如為前述多個粉碎階段,如前述第1粉碎階段及前述第2粉碎階段)譬如亦可在前述「其他溶劑」中進行。另,關於前述「其他溶劑」之詳細容後詳述。In the method for manufacturing a low-refractive index layer of the present invention, the gel pulverization step (for example, the plurality of pulverization stages, such as the first pulverization stage and the second pulverization stage) may be included in the "other solvent", for example. get on. In addition, the details of the aforementioned "other solvents" will be described later.

另,在本發明中,「溶劑」(譬如凝膠製造用溶劑、低折射率層製造用溶劑、置換用溶劑等)可以不用溶解凝膠或其粉碎物等,譬如亦可使前述凝膠或其粉碎物等分散或沉澱在前述溶劑中。In the present invention, the "solvent" (for example, a solvent for producing a gel, a solvent for producing a low-refractive index layer, a solvent for replacement, etc.) may be used without dissolving the gel or its pulverized matter. For example, the aforementioned gel or The pulverized material and the like are dispersed or precipitated in the aforementioned solvent.

前述第1粉碎階段後之前述凝膠的體積平均粒徑譬如可為0.5~100μm、1~100μm、1~50μm、2~20μm或3~10μm。前述第2粉碎階段後之前述凝膠的體積平均粒徑譬如可為10~1000nm、100~500nm或200~300nm。前述體積平均粒徑係表示含有前述凝膠之液體(含凝膠液體)中的前述粉碎物之粒度參差。前述體積平均粒徑例如可藉由動態光散射法、雷射繞射法等粒度分布評估裝置及掃描型電子顯微鏡(SEM)、穿透型電子顯微鏡(TEM)等電子顯微鏡等進行測定。The volume average particle diameter of the gel after the first pulverization step may be, for example, 0.5 to 100 μm, 1 to 100 μm, 1 to 50 μm, 2 to 20 μm, or 3 to 10 μm. The volume average particle diameter of the gel after the second pulverization step may be, for example, 10 to 1000 nm, 100 to 500 nm, or 200 to 300 nm. The above-mentioned volume average particle diameter means that the particle size of the pulverized material in the gel-containing liquid (gel-containing liquid) varies. The volume average particle diameter can be measured by, for example, a particle size distribution evaluation device such as a dynamic light scattering method or a laser diffraction method, and an electron microscope such as a scanning electron microscope (SEM) or a transmission electron microscope (TEM).

又,前述第1粉碎階段後當下的前述液體之剪切黏度在10001/s之剪切速度下譬如可為50mPa/s以上、1000mPa・s以上、2000mPa・s以上或3000mPa・s以上,且可譬如為100Pa・s以下、50Pa・s以下或10Pa・s以下。前述第2粉碎階段後當下的前述液體之剪切黏度譬如可為1mPa・s以上、2mPa・s以上或3mPa・s以上,且可譬如為1000mPa・s以下、100mPa・s以下或50mPa・s以下。另,剪切黏度之測定方法無特別限定,譬如可如後述實施例中記載使用振動式黏度測定機(Sekonic Co.製、商品名FEM-1000V)進行測定。In addition, the shear viscosity of the liquid at the present time after the first pulverization step may be 50 mPa / s or higher, 1000 mPa · s or higher, 2000 mPa · s or higher, or 3000 mPa · s or higher at a shear rate of 10001 / s, and may be For example, it is 100 Pa · s or less, 50 Pa · s or less, or 10 Pa · s or less. The shear viscosity of the liquid immediately after the second pulverization stage may be, for example, 1 mPa · s or more, 2 mPa · s or more, or 3 mPa · s or more, and may be, for example, 1000 mPa · s or less, 100 mPa · s or less, or 50 mPa · s or less. . The method for measuring the shear viscosity is not particularly limited. For example, it can be measured using a vibration viscosity measuring machine (manufactured by Sekonic Co., trade name: FEM-1000V) as described in Examples described later.

在前述第1粉碎階段後,譬如可以是含有前述粒子之液體的剪切黏度為50mPa・s以上,且前述粒子之體積平均粒徑為0.5~50μm。After the first pulverization step, for example, the shear viscosity of the liquid containing the particles may be 50 mPa · s or more, and the volume average particle diameter of the particles may be 0.5 to 50 μm.

本發明之低折射率層的製造方法譬如宜於前述溶劑置換步驟後且最初的粉碎階段開始前包含濃度調整步驟,惟不含亦可,該濃度調整步驟係進行調整含有前述凝膠之液體的濃度。包含前述濃度調整步驟時,譬如在最初的粉碎階段開始時以後不宜進行含有前述凝膠之液體的濃度調整。The manufacturing method of the low-refractive-index layer of the present invention includes, for example, a concentration adjustment step after the aforementioned solvent replacement step and before the beginning of the initial pulverization phase, but it does not need to include the concentration adjustment step. concentration. When the concentration adjustment step is included, it is not appropriate to adjust the concentration of the liquid containing the gel, for example, after the start of the first pulverization stage.

在前述濃度調整步驟中,可將含有前述多孔體凝膠之液體的凝膠濃度調整在譬如1重量%以上、1.5重量%以上、1.8重量%以上、2.0重量%以上或2.8重量%以上,且可調整在譬如5重量%以下、4.5重量%以下、4.0重量%以下、3.8重量%以下或3.4重量%以下。在前述濃度調整步驟中,可將含有前述凝膠之液體的凝膠濃度調整至譬如1~5重量%、1.5~4.0重量%、2.0~3.8重量%或2.8~3.4重量%。從在凝膠粉碎步驟中容易處理的觀點來看,為了不使黏度變得太高,前述凝膠濃度不宜過高。又,若從作為後述塗覆液使用的觀點來看,為了不使黏度變得太低,前述凝膠濃度不宜過低。含有前述凝膠之液體的凝膠濃度,譬如可測定前述液體之重量及去除前述液體之溶劑後的固體成分(凝膠)重量後,再將後者之測定值除以前者之測定值來算出。In the foregoing concentration adjustment step, the gel concentration of the liquid containing the porous body gel may be adjusted to, for example, 1% by weight or more, 1.5% by weight or more, 1.8% by weight or more, 2.0% by weight or 2.8% by weight or more, and It can be adjusted to, for example, 5 wt% or less, 4.5 wt% or less, 4.0 wt% or less, 3.8 wt% or less, or 3.4 wt% or less. In the foregoing concentration adjustment step, the gel concentration of the liquid containing the gel can be adjusted to, for example, 1 to 5 wt%, 1.5 to 4.0 wt%, 2.0 to 3.8 wt%, or 2.8 to 3.4 wt%. From the viewpoint of easy handling in the gel pulverization step, in order not to make the viscosity too high, the aforementioned gel concentration should not be too high. In addition, from the viewpoint of use as a coating solution to be described later, in order to prevent the viscosity from becoming too low, the gel concentration should not be too low. The gel concentration of the liquid containing the gel can be calculated by, for example, measuring the weight of the liquid and the weight of the solid component (gel) after removing the solvent of the liquid, and then dividing the measured value of the latter by the measured value of the former.

另,前述濃度調整步驟譬如為了適當調整含有前述凝膠之液體的凝膠濃度,亦可藉由添加溶劑來降低濃度或使溶劑揮發來提升濃度等。或譬如,前述濃度調整步驟中,如果測定含有前述凝膠之液體之凝膠濃度的結果,凝膠濃度適當,亦可無需降低濃度或提升濃度(濃度調整)便將含有前述凝膠之液體直接供於下一個步驟。又或者譬如,前述濃度調整步驟中,含有前述凝膠之液體的凝膠濃度無須測定便明白地可知是恰當的,則亦可不進行任何測定及濃度調整便將含有前述凝膠之液體直接供於下一個步驟。In addition, the concentration adjustment step may, for example, appropriately adjust the gel concentration of the liquid containing the gel, or may increase the concentration by adding a solvent to reduce the concentration or evaporating the solvent. Or, for example, in the aforementioned concentration adjustment step, if the gel concentration of the liquid containing the aforementioned gel is measured, the gel concentration is appropriate, and the liquid containing the aforementioned gel can be directly used without reducing the concentration or increasing the concentration (concentration adjustment). For the next step. Or, for example, in the above-mentioned concentration adjustment step, the gel concentration of the liquid containing the gel is clearly known to be appropriate without measurement, and the liquid containing the gel may be directly supplied to the liquid without the measurement and concentration adjustment. The next step.

在前述凝膠粉碎步驟中,從最初的粉碎階段要開始之前起算至最後的粉碎階段結束後之當下為止,含有前述凝膠之液體的重量%濃度變化譬如亦可為±3%以內、±2.8%以內、±2.6%以內、±2.4%以內或±2.2%以內。In the aforementioned gel pulverization step, the weight% concentration change of the liquid containing the gel may be, for example, within ± 3%, ± 2.8, from the time before the initial pulverization phase begins to immediately after the end of the final pulverization phase. Within%, within ± 2.6%, within ± 2.4%, or within ± 2.2%.

在本發明之低折射率層的製造方法中,宜在前述溶劑置換步驟之前進一步包含凝膠形態控制步驟,其係控制前述凝膠的形狀及大小。在前述凝膠形態控制步驟中,宜進行控制不讓凝膠的大小變得太小。因為,只要凝膠的大小沒有太小,便可藉由在被粉碎得很細的凝膠周圍附著多量的溶劑,來輕易地防止溶劑濃度的測定值比實際濃度低、溶劑殘留而變得比實際濃度高或進一步測定參差變大等問題。也因為在前述溶劑置換步驟之前,只要凝膠的大小沒有太大,溶劑置換效率即佳。又,在前述凝膠形態控制步驟後,宜進行控制讓各凝膠的大小幾乎均一。因為,只要各凝膠的大小幾乎均一,便可抑制含凝膠粉碎物液體之各批次(lot)間的凝膠粉碎物粒徑及凝膠濃度等的參差,而輕易地獲得均一性極佳的含凝膠粉碎物液體。In the method for manufacturing a low-refractive index layer of the present invention, it is preferable that a gel morphology control step is further included before the solvent replacement step, which controls the shape and size of the gel. In the aforementioned gel morphology controlling step, it is desirable to control so that the size of the gel does not become too small. Because as long as the size of the gel is not too small, it is possible to easily prevent the measured value of the solvent concentration from being lower than the actual concentration and the solvent remaining by attaching a large amount of solvent around the finely pulverized gel. Problems such as high actual concentration or further variation in measurement. It is also because the solvent replacement efficiency is good as long as the size of the gel is not too large before the aforementioned solvent replacement step. In addition, after the gel morphology control step, it is desirable to perform control so that the sizes of the gels are almost uniform. This is because as long as the size of each gel is almost uniform, it is possible to suppress variations in the particle size and gel concentration of the pulverized gel between the lots containing the pulverized gel liquid, and to easily obtain uniformity. Best gel-containing liquid.

在前述凝膠形態控制步驟中,可將前述凝膠之短徑控制成譬如0.5cm以上、0.6cm以上、0.7cm以上或0.8cm以上,且亦可控制成譬如15cm以下、13cm以下、10cm以下或8cm以下。又,在前述凝膠形態控制步驟中,可將前述凝膠之長徑控制成譬如30cm以下、小於30cm、28cm以下、25cm以下或20cm以下,且亦可控制成譬如1cm以上、2cm以上、3cm以上、4cm以上或5cm以上。另,在本發明中,立體(3維體)的「短徑」係指在可測定前述立體之長度的部位,於長度變最短之處測得的長度。而且在本發明中,立體(3維體)的「長徑」係指在可測定前述立體之長度的部位,於長度變最長之處測得的長度。In the gel shape control step, the short diameter of the gel can be controlled to be, for example, 0.5 cm or more, 0.6 cm or more, 0.7 cm or more, or 0.8 cm or more, and can be controlled to be 15 cm or less, 13 cm or less, and 10 cm or less. Or below 8cm. In the gel shape control step, the length of the gel may be controlled to be, for example, 30 cm or less, less than 30 cm, 28 cm or less, 25 cm or less, or 20 cm or less, and may be controlled to be 1 cm or more, 2 cm or more, and 3 cm, for example. Above, above 4cm or above 5cm. In the present invention, the "short diameter" of a three-dimensional body (three-dimensional body) refers to a length measured at a portion where the length of the three-dimensional body can be measured and where the length becomes the shortest. Further, in the present invention, the "long diameter" of a three-dimensional body (three-dimensional body) refers to a length measured at a portion where the length of the three-dimensional body can be measured and where the length becomes the longest.

前述凝膠在前述凝膠形態控制步驟後的形狀並無特別限定,譬如控制成長方體(亦含立方體)、圓柱形、多角形立體(譬如三角柱、六角柱等多角柱)、球型或橢圓球(譬如像橄欖球的形狀)等即可。在前述凝膠形態控制步驟後,將前述凝膠之形狀控制成長方體或幾乎是長方體,既簡便又理想。在前述凝膠形態控制步驟中,將前述凝膠控制成長方體時,可將短邊控制成譬如0.5cm以上、0.6cm以上、0.7cm以上或0.8cm以上,且亦可控制成譬如15cm以下、13cm以下、10cm以下或8cm以下。又,在前述凝膠形態控制步驟中,將前述凝膠控制成長方體時,可將長邊控制成譬如30cm以下、小於30cm、28cm以下、25cm以下或20cm以下,且亦可控制成譬如1cm以上、2cm以上、3cm以上、4cm以上或5cm以上。另,在本發明中,長方體的「短邊」指最短邊,「長邊」指最長邊。The shape of the gel after the gel shape control step is not particularly limited, such as controlling a growing cube (including a cube), a cylinder, a polygonal cube (such as a polygonal column such as a triangular column, a hexagonal column), a spherical shape, or an oval ball (Such as the shape of a football). After the gel morphology control step, controlling the shape of the gel to a rectangular parallelepiped or an almost rectangular parallelepiped is simple and desirable. In the gel shape control step, when the gel is controlled to grow into a rectangular parallelepiped, the short side can be controlled to be, for example, 0.5 cm or more, 0.6 cm or more, 0.7 cm or more, or 0.8 cm or more, and can also be controlled to be 15 cm or less 13 cm or less, 10 cm or less, or 8 cm or less. In the gel shape control step, when the gel is controlled into a rectangular parallelepiped, the long side may be controlled to be, for example, 30 cm or less, less than 30 cm, 28 cm or less, 25 cm or less, or 20 cm or less, and may be controlled to be 1 cm or more. , 2cm or more, 3cm or more, 4cm or more, or 5cm or more. In the present invention, the "short side" of the cuboid refers to the shortest side, and the "long side" refers to the longest side.

前述凝膠形態控制步驟譬如可在製造前述凝膠之前述凝膠製造步驟後進行,亦可在前述凝膠製造步驟中(與前述凝膠製造步驟同時)進行。較具體來說,如以下所述。The gel morphology controlling step may be performed, for example, after the gel producing step for producing the gel, or may be performed during the gel producing step (same time as the gel producing step). More specifically, it is as follows.

在前述凝膠形態控制步驟中,譬如亦可在前述凝膠被固定之狀態下將前述凝膠予以裁切,藉以將前述凝膠控制成前述立體。在前述凝膠之脆性極高的情況下,裁切凝膠時,不管裁切方向如何,都有凝膠可能發生不均勻崩裂之虞。爰此,藉由固定凝膠四周,於裁切時施加的壓縮方向之壓力就能均勻地加在凝膠本身上,因此可沿裁切方向將凝膠均勻地裁切。譬如,前述凝膠在前述溶劑置換步驟前的形狀幾乎是長方體,則亦可在前述凝膠形態控制步驟中,藉由前述幾乎是長方體的凝膠表面之6面中有5面與其他物質相接觸來固定前述凝膠,並且在其他1面露出之狀態下從前述露出面對前述凝膠插入裁切夾具,來裁切前述凝膠。前述裁切夾具並無特別限定,可舉如切刀、金屬線狀的細條形狀的夾具、薄且銳利的板狀形狀的夾具等。又,前述凝膠之裁切譬如亦可在前述其他溶劑中進行。In the gel shape control step, for example, the gel can be cut in a state where the gel is fixed, so as to control the gel into the solid. In the case where the brittleness of the gel is extremely high, there is a possibility that the gel may be unevenly cracked regardless of the cutting direction when the gel is cut. Therefore, by fixing the gel around, the pressure in the compression direction applied during cutting can be uniformly applied to the gel itself, so the gel can be uniformly cut along the cutting direction. For example, the shape of the gel before the solvent replacement step is almost a rectangular parallelepiped. In the gel shape control step, 5 of the 6 faces of the almost rectangular parallelepiped gel surface may be in phase with other substances. The gel was fixed by contact, and a cutting jig was inserted from the exposed surface to the gel with the other surface exposed to cut the gel. The cutting jig is not particularly limited, and examples thereof include a cutter, a wire-like thin strip-shaped jig, and a thin and sharp plate-like jig. The cutting of the gel may be performed in the other solvent, for example.

又譬如在前述凝膠製造步驟中,亦可使前述凝膠之原料在與前述立體之形狀及大小對應的模板(容器)內固化,藉以將前述凝膠控制成前述立體。藉此,即使凝膠之脆性極高,也無須裁切前述凝膠即可將前述凝膠控制成預定的形狀及大小,因此在裁切凝膠時,可防止凝膠無關乎裁切方向發生不均勻崩壞的情況。For another example, in the gel manufacturing step, the raw material of the gel may be cured in a template (container) corresponding to the shape and size of the three-dimensional body, thereby controlling the gel to the three-dimensional body. With this, even if the gel is extremely brittle, the gel can be controlled to a predetermined shape and size without cutting the gel. Therefore, when the gel is cut, the gel can be prevented from occurring regardless of the cutting direction. Case of uneven collapse.

又,在本發明之低折射率層的製造方法中,譬如亦可於最初的粉碎階段結束後、最後的粉碎階段結束前,測定含有前述凝膠之液體(含凝膠液體)的凝膠濃度,並僅將前述凝膠濃度在預定數值範圍內的前述液體供給於其後之粉碎階段。另,在測定凝膠濃度時必須為均勻的液體,所以於前述粉碎階段結束後,宜已成為具有某程度之高黏度且不易發生固液分離的液體。如前述,若從含凝膠液體之易處置性的觀點來看,為了不使黏度變得太過,凝膠濃度不宜過高;若從作為塗覆液使用的觀點來看,為了不使黏度變得太低,凝膠濃度不宜過低。譬如,若從這類的觀點來看,則亦可一貫地僅供給前述凝膠濃度在預定數值範圍內之液體,直到最終的粉碎階段結束後為止。前述凝膠濃度之預定數值範圍係如同前述,譬如可亦可為2.8重量%以上且3.4重量%以下,惟不限於此。又,前述凝膠濃度測定(濃度管理)如前述可在最初的粉碎階段結束後、最後的粉碎階段結束前進行,不過亦可另外於前述溶劑置換步驟後且前述凝膠粉碎步驟前與最終的粉碎階段(譬如前述第2粉碎階段)後之其中一者或兩者進行,或乾脆取而代之。而且,於前述凝膠濃度測定後,譬如僅將前述凝膠濃度在預定數值範圍內之前述液體供給於其後的粉碎階段,或是提供作為完成品的含凝膠粉碎物液體。又,於前述溶劑置換步驟後且前述凝膠粉碎步驟前進行前述凝膠濃度測定時,其後亦可視需求進行前述濃度調整步驟。In the method for producing a low-refractive index layer of the present invention, for example, the gel concentration of the gel-containing liquid (gel-containing liquid) may be measured after the end of the first pulverization stage and before the end of the final pulverization stage. And only the aforementioned liquid having the aforementioned gel concentration within a predetermined numerical range is supplied to the subsequent pulverization stage. In addition, it is necessary to be a homogeneous liquid when measuring the gel concentration. Therefore, after the above-mentioned pulverization stage is completed, it should be a liquid with a certain degree of high viscosity and less prone to solid-liquid separation. As mentioned above, if from the viewpoint of easy handling of the gel-containing liquid, the gel concentration should not be too high in order not to make the viscosity too high; from the viewpoint of use as a coating liquid, in order not to make the viscosity Becomes too low, the gel concentration should not be too low. For example, from such a point of view, it is also possible to consistently supply only the liquid having the aforementioned gel concentration within a predetermined numerical range until the end of the final pulverization stage. The predetermined numerical range of the aforementioned gel concentration is as described above, for example, it may be 2.8% by weight or more and 3.4% by weight or less, but is not limited thereto. As described above, the gel concentration measurement (concentration management) may be performed after the end of the first pulverization stage and before the end of the last pulverization stage, but may also be performed after the solvent replacement step and before the gel pulverization step and the final One or both of the pulverization stages (for example, the aforementioned second pulverization stage) are performed, or they may be simply replaced. After the gel concentration is measured, for example, only the liquid having the gel concentration within a predetermined numerical range is supplied to a subsequent pulverization stage, or a gel-containing pulverized product-containing liquid is provided as a finished product. When the gel concentration measurement is performed after the solvent replacement step and before the gel pulverization step, the concentration adjustment step may be performed thereafter if necessary.

另,在前述溶劑置換步驟後且前述凝膠粉碎步驟前的濃度管理,因為附著於凝膠的溶劑量不穩定,所以濃度測定值之每一測定的參差可能會變大。因此,宜於前述溶劑置換步驟後且前述凝膠粉碎步驟前之濃度管理之前,藉由前述的凝膠形態控制步驟將前述凝膠之形狀及大小控制成幾乎均一。藉此,便可穩定地測定濃度。又,藉此,譬如可單一地且精度良好地管理前述含凝膠液體的凝膠濃度。In addition, since the concentration management after the solvent replacement step and before the gel pulverization step is not stable due to the amount of the solvent attached to the gel, there may be a large variation in each measurement of the concentration measurement value. Therefore, it is preferable to control the shape and size of the gel to be almost uniform by the aforementioned gel morphology control step after the solvent replacement step and before the concentration management before the gel pulverization step. Thereby, the concentration can be measured stably. In addition, for example, the gel concentration of the gel-containing liquid can be managed individually and accurately.

在本發明之低折射率層的製造方法中,前述多個粉碎階段之至少一個宜與其他的至少一個粉碎階段在粉碎方式上互異。前述多個粉碎階段的粉碎方式可全部互異,亦可為以相同的粉碎方式進行的粉碎階段。譬如,前述多個粉碎階段為3階段時,可以3階段全部互異的方式(即使用3種粉碎方式)進行,亦可以相同的粉碎方式來進行其中任2個粉碎階段,且僅有其他的1個粉碎階段以不同的粉碎方式進行。另,粉碎方式並無特別限定,譬如有後述之空蝕方式、無介質(medialess)方式等。In the method for manufacturing a low-refractive index layer of the present invention, it is preferred that at least one of the plurality of pulverization stages is different from at least one other pulverization stage in a pulverization manner. The pulverization methods of the plurality of pulverization steps may all be different from each other, or may be pulverization steps performed by the same pulverization method. For example, when the above-mentioned multiple crushing stages are three stages, all three stages can be performed in different ways (that is, using three crushing ways), or any two of the crushing stages can be performed in the same crushing way, and only other One crushing stage is performed in different crushing methods. The pulverization method is not particularly limited, and examples thereof include a cavitation method and a medialess method described later.

在本發明之低折射率層的製造方法中,前述含凝膠粉碎物液體譬如為含有將前述凝膠粉碎所得粒子(粉碎物之粒子)的溶膠液。In the method for producing a low-refractive index layer according to the present invention, the gel-containing pulverized material-containing liquid is, for example, a sol liquid containing particles (particles of the pulverized material) obtained by pulverizing the gel.

在本發明之低折射率層的製造方法中,亦可前述多個粉碎階段包含粗粉碎階段及正式粉碎階段,藉由前述粗粉碎階段取得塊狀溶膠粒子後,利用前述正式粉碎階段取得維持多孔質凝膠網狀結構的溶膠粒子。In the method for manufacturing a low-refractive index layer of the present invention, the plurality of pulverization stages may include a coarse pulverization stage and a formal pulverization stage. After obtaining massive sol particles through the coarse pulverization stage, the formal pulverization stage is used to obtain and maintain porosity. Sol particles in the gel-like network.

本發明之低折射率層的製造方法譬如於前述多個階段之粉碎階段的至少一者(譬如前述第1粉碎階段及前述第2粉碎階段之至少一者)後,進一步包含將前述凝膠之粒子進行分級的分級步驟。The method for producing a low-refractive index layer of the present invention includes, for example, after at least one of the pulverization stages of the plurality of stages (for example, at least one of the first pulverization stage and the second pulverization stage), further comprising: The particles are subjected to a classification step.

本發明之低折射率層的製造方法包含譬如凝膠化步驟,其係使塊狀多孔體在溶劑中凝膠化而做成前述凝膠。此時,譬如在前述多個階段之粉碎階段中最初的粉碎階段(譬如前述第1粉碎階段)中,會使用藉由前述凝膠化步驟而凝膠化的前述凝膠。The method for producing a low-refractive index layer of the present invention includes, for example, a gelation step, which is performed by gelatinizing a bulk porous body in a solvent to form the aforementioned gel. At this time, for example, in the first pulverization stage (for example, the first pulverization stage) among the pulverization stages of the plurality of stages, the gel that is gelled by the gelation step is used.

本發明之低折射率層的製造方法包含譬如熟成步驟,其係使已凝膠化之前述凝膠在溶劑中熟成。此時,譬如在前述多個階段之粉碎階段中最初的粉碎階段(譬如前述第1粉碎階段)中,會使用前述熟成步驟後之前述凝膠。The method for producing a low-refractive index layer according to the present invention includes, for example, a aging step, in which the gelatinized gel is cured in a solvent. At this time, for example, in the first pulverization stage (for example, the first pulverization stage) among the pulverization stages of the plurality of stages, the gel after the maturation step is used.

本發明之低折射率層的製造方法譬如會在前述凝膠化步驟後進行前述溶劑置換步驟,即將前述溶劑置換成其他溶劑。此時,譬如在前述多個階段之粉碎階段中最初的粉碎階段(譬如前述第1粉碎階段)中,會使用前述其他溶劑中之前述凝膠。For example, in the method for producing a low-refractive index layer of the present invention, the solvent replacement step is performed after the gelation step, that is, the solvent is replaced with another solvent. At this time, for example, in the first pulverization stage (for example, the first pulverization stage) among the pulverization stages of the plurality of stages, the gel in the other solvent is used.

在本發明之低折射率層的製造方法中之前述多階段之粉碎階段的至少一者(譬如前述第1粉碎階段及前述第2粉碎階段之至少一者)中,譬如會在測定前述液體之剪切黏度的同時,控制前述多孔體之粉碎。In the method for producing a low-refractive index layer of the present invention, at least one of the aforementioned multi-stage pulverization stages (for example, at least one of the aforementioned first pulverization stage and the aforementioned second pulverization stage), for example, the The shear viscosity is controlled while the pulverization of the porous body is controlled.

譬如,藉由高壓無介質粉碎,來進行本發明之低折射率層的製造方法中之前述多階段之粉碎階段的至少一者(譬如前述第1粉碎階段及前述第2粉碎階段之至少一者)。For example, at least one of the aforementioned multi-stage pulverizing stages (for example, at least one of the first pulverizing stage and the second pulverizing stage) in the method for manufacturing a low-refractive index layer of the present invention is performed by high-pressure non-media pulverization ).

在本發明之低折射率層的製造方法中,前述凝膠係譬如至少含有3官能以下之飽和鍵官能基的矽化合物之凝膠。In the method for producing a low-refractive index layer according to the present invention, the gel is, for example, a gel of a silicon compound containing a saturated bond functional group having at least three functions.

另,以下在本發明之低折射率層的製造方法中,藉由包含前述凝膠粉碎步驟之步驟製得的含凝膠粉碎物液體有時會稱作「本發明之含凝膠粉碎物液體」。In addition, in the method for producing a low-refractive index layer of the present invention, the gel-containing pulverized substance-containing liquid prepared by the step including the gel pulverization step may be referred to as "gel-containing pulverized substance-containing liquid of the present invention" ".

根據本發明之含凝膠粉碎物液體,譬如可藉由形成其塗覆膜,使前述塗覆膜中之前述粉碎物彼此行化學鍵結,來形成作為機能性多孔體的前述本發明之低折射率層。根據本發明之含凝膠粉碎物液體,譬如可對各種對象物賦予前述本發明之低折射率層。因此,本發明之含凝膠粉碎物液體及其製造方法譬如在製造前述本發明之低折射率層時相當有用。According to the gel-containing pulverized material liquid of the present invention, for example, by forming a coating film thereof, the pulverized materials in the coating film can be chemically bonded to each other to form the low refractive index of the present invention as a functional porous body. Rate layer. According to the gel-containing pulverized material liquid of the present invention, for example, the low refractive index layer of the present invention can be provided to various objects. Therefore, the gel-containing pulverized material-containing liquid of the present invention and a method for producing the same are useful, for example, when manufacturing the low-refractive index layer of the present invention.

本發明之含凝膠粉碎物液體具有譬如極佳的均勻性,因此譬如將前述本發明之低折射率層應用在光學構件等用途時,其外觀相當良好。The gel-containing pulverized material-containing liquid of the present invention has, for example, excellent uniformity. Therefore, when the low-refractive index layer of the present invention is applied to an application such as an optical member, its appearance is quite good.

本發明之含凝膠粉碎物液體譬如亦可為用來將前述含凝膠粉碎物液體塗覆(塗佈)於基板上並進一步乾燥,而製得具有高空隙率之層(低折射率層)的含凝膠粉碎物液體。又,本發明之含凝膠粉碎物液體譬如亦可為用來製得高空隙率多孔體(厚度大或塊狀的成批物(bulk body))的含凝膠粉碎物液體。前述成批物譬如可使用前述含凝膠粉碎物液體進行成批製膜而製得。For example, the gel-containing pulverized material-containing liquid of the present invention may be used to coat (coat) the aforementioned gel-containing pulverized material-containing liquid on a substrate and further dry to obtain a layer (low refractive index layer) having a high porosity. ) Liquid containing pulverized gel. Further, the gel-containing pulverized material-containing liquid of the present invention may be, for example, a gel-containing pulverized material-containing liquid used to obtain a porous body having a high porosity (a thick body or a bulk body). The batch can be produced, for example, by batch-forming a film using the gel-containing pulverized material-containing liquid.

如前述,本發明之低折射率層亦可為空隙層。以下,本發明之低折射率層為空隙層時,有時會稱作「本發明之空隙層」。譬如可藉由包含下列步驟之製造方法來製造具有高空隙率的前述本發明之空隙層:製造前述本發明之含凝膠粉碎物液體的步驟、將前述含凝膠粉碎物液體塗覆於基板上形成塗覆膜的步驟、及使前述塗覆膜乾燥的步驟。As mentioned above, the low refractive index layer of the present invention may also be a void layer. Hereinafter, when the low refractive index layer of the present invention is a void layer, it may be referred to as "a void layer of the present invention". For example, the void layer of the present invention having a high porosity can be manufactured by a manufacturing method including the following steps: a step of manufacturing the gel-containing pulverized substance liquid of the present invention, and coating the gel-containing pulverized substance liquid on a substrate Forming a coating film thereon, and drying the coating film.

又,譬如亦可藉由包含下列步驟之製造方法來製造積層薄膜捲料:製造前述本發明之含凝膠粉碎物液體;旋出捲狀之前述樹脂薄膜;於被旋出之前述樹脂薄膜上塗覆前述含凝膠粉碎物液體,以形成塗覆膜;使前述塗覆膜乾燥;及,於前述乾燥步驟後,將前述樹脂薄膜上形成有前述本發明之低折射率層之積層薄膜予以捲取。這種製造方法以下有時會稱為「本發明之積層薄膜捲料的製造方法」。又,以下藉由本發明之積層薄膜捲料的製造方法製得的積層薄膜捲料有時會稱為「本發明之積層薄膜捲料」。In addition, for example, a laminated film roll can be manufactured by a manufacturing method including the following steps: manufacturing the gel-containing pulverized liquid of the present invention; unrolling the aforementioned resin film in a roll form; and coating the uncoated resin film. Covering the gel-containing pulverized material liquid to form a coating film; drying the coating film; and, after the drying step, rolling up the laminated film having the low refractive index layer of the present invention formed on the resin film, take. This manufacturing method is hereinafter sometimes referred to as "the manufacturing method of the laminated film roll of this invention." In addition, the laminated film roll manufactured by the manufacturing method of the laminated film roll of this invention below may be called "the laminated film roll of this invention."

[2-2.含凝膠粉碎物液體及其製造方法] 本發明之含凝膠粉碎物液體含有譬如利用前述凝膠粉碎步驟(譬如前述第1粉碎階段及前述第2粉碎階段)粉碎的凝膠粉碎物及前述其他溶劑。[2-2. Gel-containing pulverized material-containing liquid and method for producing the same] The gel-containing pulverized material-containing liquid of the present invention contains, Ground rubber and other solvents mentioned above.

本發明之低折射率層的製造方法譬如同前述,可包含多階段用以粉碎前述凝膠(譬如多孔體凝膠)的凝膠粉碎步驟,譬如可包含前述第1粉碎階段及前述第2粉碎階段。以下,主要舉例來說明本發明之含凝膠粉碎物液體的製造方法包含前述第1粉碎階段及前述第2粉碎階段之情況。以下主要說明前述凝膠為多孔體(多孔體凝膠)之情況。但,本發明不限於此,前述凝膠為多孔體以外之情況亦可類推適用前述凝膠為多孔體(多孔體凝膠)之情況的說明。另,以下本發明之低折射率層的製造方法中的前述多個粉碎階段(譬如前述第1粉碎階段及前述第2粉碎階段)有時會合併稱作「凝膠粉碎步驟」。The manufacturing method of the low-refractive index layer of the present invention may include a gel pulverizing step for pulverizing the gel (for example, a porous body gel) in multiple stages, such as the foregoing, and may include the first pulverizing stage and the second pulverizing, for example. stage. Hereinafter, the case where the manufacturing method of the gel-containing pulverized material liquid of this invention contains the said 1st pulverization stage and the said 2nd pulverization stage is mainly demonstrated. The case where the gel is a porous body (porous body gel) will be mainly described below. However, the present invention is not limited to this, and the description of the case where the gel is a porous body (porous body gel) can be similarly applied to the case where the gel is a porous body. The plurality of pulverization stages (for example, the first pulverization stage and the second pulverization stage) in the method for producing a low-refractive index layer of the present invention may be collectively referred to as a "gel pulverization step".

本發明之含凝膠粉碎物液體如後述可用於製造能發揮與空氣層相同機能(譬如低折射性)的機能性多孔體。前述機能性多孔體譬如亦可為本發明之低折射率層。具體上,藉由本發明製造方法製得之含凝膠粉碎物液體含有前述多孔體凝膠之粉碎物,前述粉碎物係未粉碎之前述多孔體凝膠的三維結構被破壞,而得以形成與前述未粉碎之多孔體凝膠迥異的新型三維結構。因此,譬如使用前述含凝膠粉碎物液體形成的塗覆膜(機能性多孔體之前驅物),就變成形成有以使用前述未粉碎之多孔體凝膠形成之層所無法取得的新型孔結構(新型的空隙結構)之層。藉此,前述層可發揮與空氣層相同的機能(譬如相同的低折射性)。又,本發明之含凝膠粉碎物液體譬如可藉由前述粉碎物含有殘留矽烷醇基,形成了作為前述塗覆膜(機能性多孔體之前驅物)之新型的三維結構後,使前述粉碎物彼此行化學鍵結。藉此,所形成的機能性多孔體雖為具有空隙的結構,仍可維持充分的強度及可撓性。因此,根據本發明,可容易且簡便地將機能性多孔體賦予給各種對象物。藉由本發明製造方法製得的含凝膠粉碎物液體譬如在可作為空氣層之代替品的前述多孔質結構之製造中非常有用。又,前述空氣層必須像是使構件與構件兩者間隔著隔件等設置間隙予以積層,藉以在前述構件間形成空氣層。但,使用本發明之含凝膠粉碎物液體形成的前述機能性多孔體,只要配置在該目的部位上,便可發揮與前述空氣層相同的機能。因此,如前述,可比形成前述空氣層更容易且簡便地將與前述空氣層相同的機能賦予給各種對象物。The gel-containing pulverized material-containing liquid of the present invention can be used for producing a functional porous body capable of exhibiting the same function as the air layer (for example, low refraction) as described later. The functional porous body may be, for example, the low refractive index layer of the present invention. Specifically, the gel-containing pulverized material liquid prepared by the production method of the present invention contains the pulverized material of the porous body gel, and the three-dimensional structure of the pulverized material is not pulverized, and the three-dimensional structure of the porous body gel is destroyed. The new three-dimensional structure of unpulverized porous gels is quite different. Therefore, for example, a coating film (precursor of a functional porous body) formed by using the gel-containing pulverized material liquid becomes a new pore structure that cannot be obtained by forming a layer formed by using the gel of the non-pulverized porous body. (New type of void structure). Thereby, the said layer can exhibit the same function (for example, the same low refractive index) as an air layer. The gel-containing pulverized material liquid of the present invention may, for example, form a new three-dimensional structure as the coating film (functional porous body precursor) after the pulverized material contains a residual silanol group, and then pulverize the pulverized material. The substances are chemically bonded to each other. Thereby, although the formed functional porous body has a structure having voids, it can maintain sufficient strength and flexibility. Therefore, according to the present invention, a functional porous body can be easily and simply provided to various objects. The gel-containing pulverized material-containing liquid produced by the production method of the present invention is very useful, for example, in the production of the aforementioned porous structure which can be used as a substitute for the air layer. In addition, the air layer must be laminated by providing a gap between the member and the member with a spacer or the like therebetween, so as to form an air layer between the members. However, the functional porous body formed using the gel-containing pulverized material-containing liquid of the present invention can exhibit the same function as the air layer as long as the functional porous body is disposed at the target portion. Therefore, as described above, it is easier and simpler to provide the same functions as the air layer to various objects than to form the air layer.

本發明之含凝膠粉碎物液體亦可為譬如前述機能性多孔體的形成用溶液或低折射層的形成用溶液。在本發明之含凝膠粉碎物液體中,前述多孔體為其粉碎物。The pulverized gel-containing liquid of the present invention may be, for example, the aforementioned solution for forming a functional porous body or the solution for forming a low-refractive layer. In the gel pulverized material-containing liquid of the present invention, the porous body is a pulverized material.

在本發明之含凝膠粉碎物液體中,粉碎物(多孔體凝膠之粒子)的體積平均粒徑範圍譬如為10~1000nm,或100~500nm,或200~300nm。前述體積平均粒徑表示前述粉碎物在本發明之含凝膠粉碎物液體中的粒度參差。前述體積平均粒徑如前述,例如可藉由動態光散射法、雷射繞射法等粒度分布評估裝置及掃描型電子顯微鏡(SEM)、穿透型電子顯微鏡(TEM)等電子顯微鏡等進行測定。In the gel-containing pulverized substance-containing liquid of the present invention, the volume average particle diameter range of the pulverized substance (particles of the porous body gel) is, for example, 10 to 1000 nm, or 100 to 500 nm, or 200 to 300 nm. The volume average particle size indicates that the particle size of the pulverized material in the gel-containing pulverized material liquid of the present invention varies. The volume average particle diameter is as described above, and can be measured, for example, by a particle size distribution evaluation device such as a dynamic light scattering method or a laser diffraction method, and an electron microscope such as a scanning electron microscope (SEM) or a transmission electron microscope (TEM). .

又,在本發明之含凝膠粉碎物液體中,前述粉碎物之凝膠濃度並無特別限制,譬如粒徑10~1000nm之粒子為2.5~4.5重量%,或2.7~4.0重量%,或2.8~3.2重量%。In the gel-containing pulverized material liquid of the present invention, the gel concentration of the pulverized material is not particularly limited. For example, particles having a particle size of 10 to 1000 nm are 2.5 to 4.5% by weight, or 2.7 to 4.0% by weight, or 2.8. ~ 3.2% by weight.

在本發明之含凝膠粉碎物液體中,前述凝膠(譬如多孔體凝膠)並無特別限制,可舉如矽化合物等。In the gel-containing pulverized material liquid of the present invention, the aforementioned gel (for example, a porous body gel) is not particularly limited, and examples thereof include a silicon compound.

前述矽化合物無特別限制,可舉如含有至少3官能以下之飽和鍵官能基的矽化合物。前述「含有3官能基以下之飽和鍵官能基」意指矽化合物具有3個以下官能基且該等官能基與矽(Si)呈飽和鍵結之狀態。The silicon compound is not particularly limited, and examples thereof include a silicon compound containing a saturated bond functional group having at least three functions. The aforementioned "functional group containing a saturated bond having 3 or less functional groups" means a state in which the silicon compound has 3 or less functional groups and the functional groups are saturated with silicon (Si).

前述矽化合物譬如為下述式(2)所示化合物。 [化學式1] The silicon compound is, for example, a compound represented by the following formula (2). [Chemical Formula 1]

前述式(2)中,例如X為2、3或4, R1 及R2 分別為直鏈烷基或支鏈烷基, R1 及R2 可相同亦可互異, R1 在X為2時,可彼此相同亦可互異, R2 可彼此相同亦可互異。In the foregoing formula (2), for example, X is 2, 3, or 4, R 1 and R 2 are respectively a linear alkyl group or a branched alkyl group, R 1 and R 2 may be the same or different from each other, and R 1 at X is At 2, it may be the same or different from each other, and R 2 may be the same or different from each other.

前述X及R1 譬如與前述式(1)中之X及R1 相同。又,前述R2 可援引譬如後述式(1)中之R1 的例示。The X and R 1 are, for example, the same as X and R 1 in the formula (1). The aforementioned R 2 may be exemplified by, for example, R 1 in the formula (1) described later.

前述式(2)所示矽化合物之具體例可舉如X為3之下述式(2')所示化合物。在下述式(2')中,R1 及R2 分別與前述式(2)相同。R1 及R2 為甲基時,前述矽化合物為三甲氧基(甲基)矽烷(以下亦稱「MTMS」)。 [化學式2] Specific examples of the silicon compound represented by the formula (2) include compounds represented by the following formula (2 ′) in which X is 3. In the following formula (2 '), R 1 and R 2 are respectively the same as the aforementioned formula (2). When R 1 and R 2 are methyl, the silicon compound is trimethoxy (methyl) silane (hereinafter also referred to as "MTMS"). [Chemical Formula 2]

在本發明之含凝膠粉碎物液體中,前述多孔體凝膠在前述溶劑中之粉碎物濃度並無特別限制,譬如為0.3~50%(v/v)、0.5~30%(v/v)、1.0~10%(v/v)。前述粉碎物之濃度若太高,譬如可能前述含凝膠粉碎物液體之流動性顯著下降而於塗覆時發生凝結物・塗痕。另一方面,前述粉碎物之濃度若太低,不僅在溶劑乾燥上會耗費相當程度的時間,乾燥後的殘留溶劑也會提高,因而有空隙率降低之可能。In the gel-containing pulverized material liquid of the present invention, the pulverized material concentration of the porous body gel in the solvent is not particularly limited, and is, for example, 0.3 to 50% (v / v), 0.5 to 30% (v / v). ), 1.0 ~ 10% (v / v). If the concentration of the pulverized material is too high, for example, the fluidity of the gel-containing pulverized material liquid may significantly decrease, and condensate or coating marks may occur during coating. On the other hand, if the concentration of the above-mentioned pulverized material is too low, not only a considerable amount of time will be spent on drying the solvent, but also the residual solvent after drying will be increased, and thus the porosity may be reduced.

本發明之含凝膠粉碎物液體的物性無特別限制。前述含凝膠粉碎物液體之剪切黏度譬如在10001/s之剪切速度下,譬如為下述範圍:1mPa・s~1Pa・s、1mPa・s~500mPa・s、1mPa・s~50mPa・s、1mPa・s~30mPa・s、1mPa・s~10mPa・s、10mPa・s~1Pa・s、10mPa・s~500mPa・s、10mPa・s~50mPa・s、10mPa・s~30mPa・s、30mPa・s~1Pa・s、30mPa・s~500mPa・s、30mPa・s~50mPa・s、50mPa・s~1Pa・s、50mPa・s~500mPa・s或500mPa・s~1Pa・s。前述剪切黏度若太高,例如可能產生塗痕而有凹版塗覆之轉印率下降等不良狀況發生。相反的,剪切黏度若太低,譬如可能無法加厚塗覆時的濕塗厚度,而無法在乾燥後獲得所需厚度。The physical properties of the pulverized gel-containing liquid of the present invention are not particularly limited. The shear viscosity of the gel-containing pulverized material liquid is, for example, at the shearing speed of 10001 / s, for example, the following ranges: 1mPa · s ~ 1Pa · s, 1mPa · s ~ 500mPa · s, 1mPa · s ~ 50mPa · s, 1mPa ・ s ~ 30mPa ・ s, 1mPa ・ s ~ 10mPa ・ s, 10mPa ・ s ~ 1Pa ・ s, 10mPa ・ s ~ 500mPa ・ s, 10mPa ・ s ~ 50mPa ・ s, 10mPa ・ s ~ 30mPa ・ s, 30mPa · s ~ 1Pa · s, 30mPa · s ~ 500mPa · s, 30mPa · s ~ 50mPa · s, 50mPa · s ~ 1Pa · s, 50mPa · s ~ 500mPa · s, or 500mPa · s ~ 1Pa · s. If the above-mentioned shear viscosity is too high, for example, a coating mark may be generated and a transfer rate of gravure coating may be reduced, and other undesirable conditions may occur. Conversely, if the shear viscosity is too low, for example, it may not be possible to thicken the wet coating thickness during coating, and it may not be possible to obtain the desired thickness after drying.

在本發明之含凝膠粉碎物液體中,前述溶劑可舉如分散媒等。前述分散媒(以下亦稱「塗覆用溶劑」)無特別限制,可舉如後述凝膠化溶劑及粉碎用溶劑,且宜為前述粉碎用溶劑。前述塗覆用溶劑包含沸點為70℃以上且低於180℃,且在20℃下之飽和蒸氣壓為15kPa以下的有機溶劑。In the gel-containing pulverized material-containing liquid of the present invention, the solvent may be, for example, a dispersion medium. The dispersion medium (hereinafter also referred to as "solvent for coating") is not particularly limited, and examples thereof include a gelling solvent and a solvent for pulverization as described later, and the solvent for pulverization is preferable. The coating solvent includes an organic solvent having a boiling point of 70 ° C. or higher and lower than 180 ° C. and a saturated vapor pressure at 20 ° C. of 15 kPa or less.

前述有機溶劑可舉如四氯化碳、1,2-二氯乙烷、1,1,2,2-四氯乙烷、三氯乙烯、異丁醇、異丙醇、異戊醇、1-戊醇(pentyl alcohol;pentanol)、乙醇(ethyl alcohol;ethanol)、乙二醇單乙基醚、乙二醇單乙基醚乙酸鹽、乙二醇單正丁基醚、乙二醇單甲基醚、二甲苯、甲酚、氯苯、乙酸異丁酯、乙酸異丙酯、乙酸異戊酯、乙酸乙酯、乙酸正丁酯、乙酸正丙酯、乙酸正戊酯、環己醇、環己酮、1,4-二烷、N,N-二甲基甲醯胺、苯乙烯、四氯乙烯、1,1,1-三氯乙烷、甲苯、1-丁醇、2-丁醇、甲基異丁基酮、甲基乙基酮、甲基環己醇、甲基環己酮、甲基-正丁基酮、異戊醇等。又,前述分散媒中亦可適量含有能使表面張力降低之全氟系界面活性劑或矽系界面活性劑等。Examples of the aforementioned organic solvent include carbon tetrachloride, 1,2-dichloroethane, 1,1,2,2-tetrachloroethane, trichloroethylene, isobutanol, isopropanol, isoamyl alcohol, 1 -Pentyl alcohol (pentanol), ethyl alcohol (ethanol), ethylene glycol monoethyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether, ethylene glycol monomethyl ether Ether, xylene, cresol, chlorobenzene, isobutyl acetate, isopropyl acetate, isoamyl acetate, ethyl acetate, n-butyl acetate, n-propyl acetate, n-pentyl acetate, cyclohexanol, Cyclohexanone, 1,4-bis Alkane, N, N-dimethylformamide, styrene, tetrachloroethylene, 1,1,1-trichloroethane, toluene, 1-butanol, 2-butanol, methyl isobutyl ketone, Methyl ethyl ketone, methyl cyclohexanol, methyl cyclohexanone, methyl-n-butyl ketone, isoamyl alcohol, and the like. In addition, the dispersion medium may contain a suitable amount of a perfluoro-based surfactant, a silicon-based surfactant, or the like which can reduce the surface tension.

本發明之含凝膠粉碎物液體可舉如已分散在前述分散媒中之溶膠狀前述粉碎物的溶膠粒子液等。本發明之含凝膠粉碎物液體譬如在塗覆於基材上且乾燥後,藉由後述之結合步驟進行化學交聯,可連續成膜具有一定程度以上之膜強度的空隙層。又,本發明之「溶膠」係指藉由將凝膠之三維結構粉碎,使粉碎物(亦即,保持有部分空隙結構的奈米三維結構之多孔體溶膠粒子)分散在溶劑中而顯示流動性的狀態。The gel-containing pulverized material-containing liquid of the present invention may be, for example, a sol-like particle liquid of the pulverized material in a sol form dispersed in the dispersion medium. For example, the gel-containing pulverized material-containing liquid of the present invention is coated on a substrate and dried, and then chemically cross-linked by a bonding step described later to continuously form a void layer having a film strength of a certain degree or more. In addition, the "sol" of the present invention means that the three-dimensional structure of the gel is pulverized, and the pulverized material (that is, the porous three-dimensional structured porous body sol particles having a partially voided structure) is dispersed in a solvent to show flow. Sexual status.

本發明之含凝膠粉碎物液體亦可含有譬如用以使前述凝膠之粉碎物彼此行化學鍵結的觸媒。前述觸媒之含有率無特別限定,相對於前述凝膠之粉碎物重量譬如為0.01~20重量%、0.05~10重量%或0.1~5重量%。The gel-containing pulverized material liquid of the present invention may contain, for example, a catalyst for chemically bonding the pulverized materials of the gel to each other. The content ratio of the catalyst is not particularly limited, and it is, for example, 0.01 to 20% by weight, 0.05 to 10% by weight, or 0.1 to 5% by weight with respect to the weight of the ground material of the gel.

又,本發明之含凝膠粉碎物液體更可含有譬如用以使前述凝膠之粉碎物彼此間接鍵結的交聯輔助劑。前述交聯輔助劑之含有率無特別限定,譬如相對於前述凝膠之粉碎物重量為0.01~20重量%、0.05~15重量%或0.1~10重量%。The gel-containing pulverized material-containing liquid of the present invention may further contain, for example, a crosslinking auxiliary agent for indirectly bonding the pulverized materials of the gel. The content of the cross-linking adjuvant is not particularly limited, and for example, it is 0.01 to 20% by weight, 0.05 to 15% by weight, or 0.1 to 10% by weight based on the weight of the pulverized material of the gel.

另,在本發明之含凝膠粉碎物液體,前述凝膠之構成單元單體的官能基中,無助於無助於凝膠內交聯結構的官能基比率譬如可為30mol%以下、25mol%以下、20mol%以下、15mol%以下,且譬如可為1mol%以上、2mol%以上、3mol%以上、4mol%以上。無助於前述凝膠內交聯結構的官能基比率譬如可以下述方式進行測定。In the gel-containing pulverized material-containing liquid of the present invention, the functional group ratio of the functional unit monomers of the gel may not contribute to the cross-linking structure in the gel. For example, the functional group ratio may be 30 mol% or less and 25 mol. % Or less, 20 mol% or less, 15 mol% or less, and may be, for example, 1 mol% or more, 2 mol% or more, 3 mol% or more, and 4 mol% or more. The ratio of the functional groups not contributing to the cross-linked structure in the gel can be measured, for example, in the following manner.

(無助於凝膠內交聯結構的官能基比率之測定方法) 將凝膠乾燥後,測定固體NMR(Si-NMR),從NMR的峰值比算出無助於交聯結構的殘留矽烷醇基(無助於凝膠內交聯結構的官能基)比率。又,即使前述官能基為矽烷醇基以外之情況,亦可據此從NMR之峰值比算出無助於凝膠內交聯結構的官能基比率。(Method for measuring the ratio of functional groups that does not contribute to the cross-linked structure in the gel) After drying the gel, the solid NMR (Si-NMR) is measured, and the residual silanol groups that do not contribute to the cross-linked structure are calculated from the peak ratio of NMR. (Functional groups that do not contribute to the cross-linked structure in the gel) ratio. Moreover, even if the said functional group is other than a silanol group, the ratio of the functional group which does not contribute to the crosslinking structure in a gel can be calculated from the peak ratio of NMR based on this.

以下舉例說明本發明含凝膠粉碎物液體之製造方法。本發明之含凝膠粉碎物液體在未特別記載之前提下可援引以下說明。The following is an example to illustrate the method for producing the gel-containing pulverized product liquid of the present invention. The gel-containing pulverized material-containing liquid of the present invention is referred to the following description unless specifically described.

在本發明之含凝膠粉碎物液體的製造方法中,混合步驟係將前述多孔體凝膠之粒子(粉碎物)與前述溶劑予以混合之步驟,可有可無。前述混合步驟之具體例可舉如將凝膠狀矽化合物(矽化合物凝膠)之粉碎物與分散媒混合之步驟,前述凝膠狀矽化合物係由含有至少3官能以下之飽和鍵官能基的矽化合物製得。在本發明中,前述多孔體凝膠之粉碎物可藉由後述凝膠粉碎步驟從前述多孔體凝膠製得。又,前述多孔體凝膠之粉碎物譬如可從已施行後述熟成步驟之熟成處理後的前述多孔體凝膠製得。In the method for producing a gel-containing pulverized material liquid of the present invention, the mixing step is a step of mixing the particles (pulverized material) of the porous body gel with the solvent, and it is optional. Specific examples of the mixing step include a step of mixing a pulverized substance of a gel-like silicon compound (silicon compound gel) with a dispersing medium. The gel-like silicon compound is composed of Manufactured from silicon compounds. In the present invention, the pulverized material of the porous body gel can be obtained from the porous body gel by a gel pulverization step described later. The pulverized material of the porous body gel can be produced, for example, from the porous body gel that has been subjected to a ripening process described later.

在本發明之含凝膠粉碎物液體的製造方法中,凝膠化步驟係譬如在溶劑中使塊狀多孔體凝膠化而做成前述多孔體凝膠的步驟,前述凝膠化步驟之具體例譬如係在溶劑中使含有前述至少3官能以下之飽和鍵官能基的矽化合物凝膠化,而生成矽化合物凝膠的步驟。In the method for producing a gel-containing pulverized product liquid of the present invention, the gelation step is, for example, a step of gelling a porous porous body in a solvent to form the aforementioned porous body gel, and the details of the aforementioned gelation step For example, it is a step of forming a silicon compound gel by gelling a silicon compound containing a saturated bond functional group having at least three functions described above in a solvent.

以下將以前述多孔體為矽化合物之情況為例來說明前述凝膠化步驟。The gelation step will be described below by taking the case where the porous body is a silicon compound as an example.

前述凝膠化步驟譬如係使單體之前述矽化合物在脫水縮合觸媒之存在下藉由脫水縮合反應進行凝膠化之步驟,藉此可製得矽化合物凝膠。前述矽化合物凝膠譬如具有殘留矽烷醇基,前述殘留矽烷醇基宜因應後述之前述矽化合物凝膠之粉碎物彼此的化學鍵結進行適當調整。The gelation step is, for example, a step of gelling the silicon compound of the monomer by a dehydration condensation reaction in the presence of a dehydration condensation catalyst, thereby preparing a silicon compound gel. The silicon compound gel has, for example, a residual silanol group, and the residual silanol group should be appropriately adjusted in accordance with the chemical bonding between the ground particles of the silicon compound gel described later.

在前述凝膠化步驟中,前述矽化合物無特別限制,只要是藉由脫水縮合反應進行凝膠化之物即可。譬如,藉由前述脫水縮合讓前述矽化合物間鍵結。前述矽化合物間之鍵結譬如為氫鍵結或分子間力鍵結。In the aforementioned gelation step, the aforementioned silicon compound is not particularly limited as long as it is a substance that is gelled by a dehydration condensation reaction. For example, the silicon compounds are bonded to each other by the dehydration condensation. The bonding between the aforementioned silicon compounds is, for example, hydrogen bonding or intermolecular bonding.

前述矽化合物可舉如下述式(1)所示矽化合物。下述式(1)之矽化合物具有羥基,因此下述式(1)之矽化合物間可透過這些羥基達成氫鍵結或分子間力鍵結。Examples of the silicon compound include a silicon compound represented by the following formula (1). Since the silicon compound of the following formula (1) has a hydroxyl group, the silicon compound of the following formula (1) can achieve hydrogen bonding or intermolecular force bonding through these hydroxyl groups.

[化學式3] [Chemical Formula 3]

前述式(1)中,例如X為2、3或4,R1 為直鏈烷基或支鏈烷基。前述R1 之碳數例如為1~6、1~4、1~2。前述直鏈烷基可舉如甲基、乙基、丙基、丁基、戊基、己基等,前述支鏈烷基可舉如異丙基、異丁基等。前述X例如為3或4。In the aforementioned formula (1), for example, X is 2, 3, or 4, and R 1 is a linear alkyl group or a branched alkyl group. The carbon number of the R 1 is , for example, 1 to 6, 1 to 4, or 1 to 2. Examples of the linear alkyl group include methyl, ethyl, propyl, butyl, pentyl, and hexyl, and examples of the branched alkyl group include isopropyl and isobutyl. The X is, for example, 3 or 4.

前述式(1)所示矽化合物之具體例可舉如X為3之下述式(1')所示化合物。下述式(1')中,R1 與前述式(1)相同,例如為甲基。R1 為甲基時,前述矽化合物為參(羥)甲基矽烷。前述X為3時,前述矽化合物例如為具有3個官能基之3官能矽烷。Specific examples of the silicon compound represented by the aforementioned formula (1) include compounds represented by the following formula (1 ′) in which X is 3. In the following formula (1 ′), R 1 is the same as the formula (1), and is, for example, a methyl group. When R 1 is a methyl group, the silicon compound is ginsyl (hydroxy) methyl silane. When X is 3, the silicon compound is, for example, a trifunctional silane having three functional groups.

[化學式4] [Chemical Formula 4]

又,前述式(1)所示矽化合物之具體例可列舉如X為4之化合物。此時,前述矽化合物例如為具有4個官能基之4官能矽烷。Specific examples of the silicon compound represented by the formula (1) include compounds in which X is 4. In this case, the silicon compound is, for example, a tetrafunctional silane having four functional groups.

前述矽化合物譬如亦可為藉由水解形成前述式(1)之矽化合物的前驅物。前述前驅物譬如只要是可藉由水解生成前述矽化合物者即可,具體例可列舉前述式(2)所示化合物。The silicon compound may be, for example, a precursor that forms the silicon compound of the formula (1) by hydrolysis. The precursor may be, for example, one capable of generating the silicon compound by hydrolysis, and specific examples include the compound represented by the formula (2).

前述矽化合物為前述式(2)所示前驅物時,本發明之製造方法譬如亦可包含在前述凝膠化步驟之前將前述前驅物水解的步驟。When the silicon compound is a precursor represented by the formula (2), the production method of the present invention may include, for example, a step of hydrolyzing the precursor before the gelation step.

前述水解方法無特別限制,例如可在觸媒存在下藉由化學反應來進行。前述觸媒可列舉如草酸、乙酸等酸等。前述水解反應譬如可在室溫環境下將草酸水溶液緩慢地滴下混合至前述矽化合物前驅物之二甲亞碸溶液中以後,直接攪拌30分鐘左右來進行。在水解前述矽化合物前驅物時,例如可將前述矽化合物前驅物之烷氧基完全水解,以便更有效率地顯現其後之凝膠化、熟成、空隙結構形成後的加熱及固定化。The aforementioned hydrolysis method is not particularly limited, and may be carried out by a chemical reaction in the presence of a catalyst, for example. Examples of the catalyst include acids such as oxalic acid and acetic acid. The hydrolysis reaction can be performed, for example, by slowly dropping and mixing the oxalic acid aqueous solution into the dimethylarsin solution of the silicon compound precursor at room temperature, followed by directly stirring for about 30 minutes. When the aforementioned silicon compound precursor is hydrolyzed, for example, the alkoxy group of the aforementioned silicon compound precursor can be completely hydrolyzed in order to more effectively visualize subsequent gelation, maturation, and heating and immobilization after formation of a void structure.

在本發明中,前述矽化合物可舉如三甲氧基(甲基)矽烷之水解物。In the present invention, the aforementioned silicon compound may be a hydrolyzate of trimethoxy (methyl) silane.

前述單體之矽化合物無特別限制,譬如可因應要製造之機能性多孔體的用途適當選擇。在前述機能性多孔體之製造中,譬如在重視低折射率性之情況下,從低折射率性優異的觀點來看,前述矽化合物宜為前述3官能矽烷;又在重視強度(譬如耐擦傷性)之情況下,從耐擦傷性優異的觀點來看,前述矽化合物則宜為前述4官能矽烷。又,前述矽化合物為前述矽化合物凝膠之原料,譬如可僅使用一種,亦可將二種以上併用。就具體例而言,作為前述矽化合物例如可僅含有前述3官能矽烷,亦可僅含有前述4官能矽烷,或可含有前述3官能矽烷及前述4官能矽烷兩者,更可含有其它的矽化合物。使用二種以上矽化合物作為前述矽化合物時,其比率並無特別限制,可適宜設定。The silicon compound of the aforementioned monomer is not particularly limited, and can be appropriately selected, for example, according to the application of the functional porous body to be produced. In the production of the above-mentioned functional porous body, for example, when low-refractive index properties are valued, from the viewpoint of excellent low-refractive index properties, the silicon compound is preferably the trifunctional silane; and strength (such as scratch resistance) is also important. In the case of the above-mentioned properties, the silicon compound is preferably the aforementioned tetrafunctional silane from the viewpoint of excellent scratch resistance. The silicon compound is a raw material of the silicon compound gel. For example, only one kind may be used, or two or more kinds may be used in combination. As a specific example, the silicon compound may contain, for example, only the aforementioned trifunctional silane, only the aforementioned tetrafunctional silane, or both the aforementioned trifunctional silane and the aforementioned tetrafunctional silane, and may further include other silicon compounds. . When two or more silicon compounds are used as the silicon compound, the ratio is not particularly limited and can be appropriately set.

前述矽化合物等多孔體的凝膠化譬如可藉由前述多孔體間之脫水縮合反應進行。前述脫水縮合反應例如宜在觸媒存在下進行,前述觸媒可舉例如酸觸媒及鹼性觸媒等脫水縮合觸媒,前述酸觸媒有鹽酸、草酸、硫酸等,前述鹼性觸媒有氨、氫氧化鉀、氫氧化鈉、氫氧化銨等。前述脫水縮合觸媒可為酸觸媒亦可為鹼性觸媒,且以鹼性觸媒為佳。在前述脫水縮合反應中,前述觸媒相對於前述多孔體的添加量並無特別限制,譬如,相對於前述多孔體1莫耳,觸媒為0.01~10莫耳、0.05~7莫耳、0.1~5莫耳。The gelation of the porous body such as the silicon compound can be performed, for example, by a dehydration condensation reaction between the porous bodies. The dehydration condensation reaction is preferably performed in the presence of a catalyst. The catalyst may be, for example, an acid catalyst and an alkaline catalyst, such as hydrochloric acid, oxalic acid, sulfuric acid, etc., and the alkaline catalyst. There are ammonia, potassium hydroxide, sodium hydroxide, and ammonium hydroxide. The dehydration condensation catalyst may be an acid catalyst or an alkaline catalyst, and an alkaline catalyst is preferred. In the dehydration condensation reaction, the amount of the catalyst added to the porous body is not particularly limited. For example, the catalyst is 0.01 to 10 moles, 0.05 to 7 moles, 0.1 to 1 mole of the porous body. ~ 5 moles.

前述矽化合物等多孔體的凝膠化譬如宜在溶劑中進行。前述多孔體在前述溶劑中所佔比率無特別限制。前述溶劑可舉如二甲亞碸(DMSO)、N-甲基吡咯啶酮(NMP)、N,N-二甲基乙醯胺(DMAc)、二甲基甲醯胺(DMF)、γ-丁內酯(GBL)、乙腈(MeCN)、乙二醇乙基醚(EGEE)等。前述溶劑例如可為1種亦可將2種以上併用。用來進行前述凝膠化的溶劑以下亦稱作「凝膠化用溶劑」。The gelation of the porous body such as the silicon compound is preferably performed in a solvent, for example. The proportion of the porous body in the solvent is not particularly limited. Examples of the aforementioned solvent include dimethylsulfinium (DMSO), N-methylpyrrolidone (NMP), N, N-dimethylacetamide (DMAc), dimethylformamide (DMF), γ- Butyrolactone (GBL), acetonitrile (MeCN), ethylene glycol ethyl ether (EGEE), etc. The said solvent may be 1 type, and 2 or more types may be used together, for example. The solvent used for the above-mentioned gelation is hereinafter also referred to as a "solvent for gelation".

前述凝膠化之條件並無特別限制。含有前述多孔體之前述溶劑的處理溫度例如為20~30℃、22~28℃、24~26℃,處理時間例如為1~60分鐘、5~40分鐘、10~30分鐘。進行前述脫水縮合反應時,其處理條件無特別限制,可援引該等例示。當前述多孔體為矽化合物時,藉由進行前述凝膠化,譬如可使矽氧烷鍵結成長而形成前述矽化合物之一次粒子,再藉由反應進行,使前述一次粒子彼此連接成串珠狀,生成三維結構之凝膠。The conditions for the aforementioned gelation are not particularly limited. The processing temperature of the solvent containing the porous body is, for example, 20 to 30 ° C, 22 to 28 ° C, or 24 to 26 ° C, and the processing time is, for example, 1 to 60 minutes, 5 to 40 minutes, or 10 to 30 minutes. When the aforementioned dehydration condensation reaction is performed, the treatment conditions are not particularly limited, and these examples can be cited. When the porous body is a silicon compound, by performing the gelation, for example, the siloxane bond can be grown to form primary particles of the silicon compound, and then the reaction is performed to connect the primary particles to each other in a bead shape. To generate a three-dimensional structured gel.

在前述凝膠化步驟中製得的前述多孔體之凝膠形態無特別限制。一般而言,「凝膠」係指溶質具有因相互作用失去獨立的運動性而集結成之結構,且呈現固化狀態。此外,凝膠中一般而言,濕凝膠係指含有分散媒且在分散媒中溶質採一樣的結構者,乾凝膠則指去除溶劑且溶質採具有空隙之網目結構者。在本發明中,前述矽化合物凝膠宜使用例如濕凝膠。前述多孔體凝膠為矽化合物凝膠時,前述矽化合物凝膠之殘留矽烷醇基並無特別限制,譬如可同樣列舉後述之範圍。There is no particular limitation on the gel form of the porous body obtained in the gelation step. Generally speaking, "gel" refers to a structure in which a solute has agglomerates due to the loss of independent motility due to interaction, and has a solidified state. In general, in a gel, a wet gel refers to a person that contains a dispersing medium and has the same structure as a solute in the dispersing medium, and a xerogel refers to a solvent that removes the solvent and has a network structure with voids. In the present invention, the aforementioned silicon compound gel is preferably a wet gel, for example. When the porous body gel is a silicon compound gel, there is no particular limitation on the residual silanol groups of the silicon compound gel, and for example, the ranges described below can be similarly cited.

藉由前述凝膠化製得之前述多孔體凝膠譬如可直接供給至前述溶劑置換步驟及前述第1粉碎階段,或可在前述第1粉碎階段之前,在前述熟成步驟施行熟成處理。前述熟成步驟係使已凝膠化之前述多孔體(多孔體凝膠)在溶劑中熟成。在前述熟成步驟中,前述熟成處理之條件無特別限制,譬如在溶劑中將前述多孔體凝膠以預定溫度進行培育即可。藉由前述熟成處理,譬如可針對以凝膠化製得的具有三維結構之多孔體凝膠,使前述一次粒子進一步成長,藉此可增加前述粒子本身的尺寸。而且,結果上可將前述粒子彼此接觸之頸部的接觸狀態從點接觸增加到面接觸。經過上述熟成處理的多孔體凝膠例如會增加凝膠本身的強度,結果便可更加提升粉碎後的前述粉碎物之三維基本結構之強度。藉此,使用前述本發明之含凝膠粉碎物液體形成塗覆膜時,譬如即使在塗覆後之乾燥步驟中,亦可抑制前述三維基本結構堆積而成的空隙結構之細孔尺寸,隨前述乾燥步驟中發生之前述塗覆膜中的溶劑揮發而收縮的情況。For example, the porous body gel obtained by the gelation may be directly supplied to the solvent replacement step and the first pulverization step, or may be subjected to aging treatment in the aging step before the first pulverization step. The maturing step is a step of maturing the gelled porous body (porous body gel) in a solvent. In the maturing step, the conditions for the maturing treatment are not particularly limited, and for example, the porous body gel may be grown at a predetermined temperature in a solvent. According to the aforementioned aging treatment, for example, the porous body gel having a three-dimensional structure prepared by gelation can be used to further grow the primary particles, thereby increasing the size of the particles themselves. Furthermore, as a result, the contact state of the neck portion where the particles contact each other can be increased from point contact to surface contact. The porous body gel subjected to the above-mentioned aging treatment, for example, can increase the strength of the gel itself, and as a result, the strength of the three-dimensional basic structure of the pulverized material can be further improved. Thus, when the coating film is formed by using the gel-containing pulverized material liquid of the present invention, for example, even in the drying step after coating, the pore size of the void structure formed by stacking the three-dimensional basic structure can be suppressed. In the drying step, the solvent in the coating film is evaporated and shrinks.

前述熟成處理之溫度,其下限譬如為30℃以上、35℃以上、40℃以上,其上限譬如為80℃以下、75℃以下、70℃以下,其範圍譬如為30~80℃、35~75℃、40~70℃。前述預定時間無特別限制,其下限例如為5小時以上、10小時以上、15小時以上,其上限例如為50小時以下、40小時以下、30小時以下,其範圍例如為5~50小時、10~40小時、15~30小時。另外,關於熟成的最佳條件,譬如宜如前述設定成可獲得前述多孔體凝膠中之前述一次粒子之尺寸增大及前述頸部接觸面積之增大的條件。又,在前述熟成步驟中,前述熟成處理之溫度譬如宜考量要使用的溶劑沸點。前述熟成處理譬如熟成溫度過高時,前述溶劑可能會過度揮發,而因為前述塗覆液之濃縮,產生三維空隙結構之細孔閉口等不良狀況。另一方面,前述熟成處理譬如熟成溫度過低時,不僅無法充分獲得藉前述熟成所得的效果,量產製程的歷時溫度偏差還會增大,可能製出品質不良的製品。The lower limit of the temperature for the ripening treatment is, for example, 30 ° C or higher, 35 ° C or higher, or 40 ° C or higher. The upper limit is, for example, 80 ° C or lower, 75 ° C or lower, or 70 ° C or lower, and the ranges are, for example, 30 to 80 ° C, 35 to 75 °. ℃, 40 ~ 70 ℃. The predetermined time is not particularly limited, and its lower limit is, for example, 5 hours or more, 10 hours or more, 15 hours or more, and its upper limit is, for example, 50 hours or less, 40 hours or less, and 30 hours or less, and its range is, for example, 5 to 50 hours, 10 to 40 hours, 15-30 hours. In addition, as for the optimal conditions for ripening, for example, the conditions for increasing the size of the primary particles in the porous body gel and increasing the contact area of the neck are preferably set as described above. Moreover, in the said aging process, the temperature of the said aging process should consider the boiling point of the solvent to be used, for example. For example, when the ripening temperature is too high, the solvent may be excessively volatilized, and due to the concentration of the coating solution, a disadvantage such as pores with a three-dimensional void structure may occur. On the other hand, when the ripening process is too low, for example, when the ripening temperature is too low, not only the effect obtained by the ripening cannot be fully obtained, but also the temperature deviation of the mass production process may increase, and a product of poor quality may be produced.

前述熟成處理例如可使用與前述凝膠化步驟相同的溶劑,具體上宜對前述凝膠處理後的反應物(亦即,含有前述多孔體凝膠之前述溶劑)直接實施。譬如,前述多孔體凝膠為前述矽化合物凝膠時,結束凝膠化後之熟成處理的前述矽化合物凝膠中所含殘留矽烷醇基之莫耳數,係在令用於凝膠化之原材料(譬如前述矽化合物或其前驅物)的烷氧基莫耳數為100時的殘留矽烷醇基之比率,其下限譬如為50%以上、40%以上、30%以上,其上限譬如為1%以下、3%以下、5%以下,其範圍譬如為1~50%、3~40%、5~30%。在提高前述矽化合物凝膠之硬度之目的下,例如殘留矽烷醇基之莫耳數愈低愈佳。殘留矽烷醇基之莫耳數若太高,譬如在形成前述機能性多孔體時,可能無法將空隙結構保持到使前述機能性多孔體之前驅物進行交聯。另一方面,殘留矽烷醇基之莫耳數若太低,譬如在前述結合步驟中,前述機能性多孔體之前驅物可能無法交聯,從而無法賦予充分的膜強度。另,上述為殘留矽烷醇基之例,譬如使用前述矽化合物已以各種反應性官能基修飾過之物作為前述矽化合物凝膠之原材料時,對於各官能基亦可適用相同的現象。The said aging process can use the same solvent as the said gelatinization process, and, specifically, it is suitable to perform directly on the reactant after the said gel processing (namely, the said solvent containing the said porous body gel). For example, when the porous body gel is the silicon compound gel, the number of moles of the residual silanol groups contained in the silicon compound gel after the gelation and maturation treatment is completed is used for gelation. The lower limit of the ratio of residual silanol groups when the alkoxy mole number of the raw material (such as the aforementioned silicon compound or its precursor) is 100, for example, the lower limit is 50% or more, 40%, or 30% or more, and the upper limit is 1 % Or less, 3% or less, and 5% or less. The ranges are, for example, 1 to 50%, 3 to 40%, and 5 to 30%. For the purpose of increasing the hardness of the aforementioned silicon compound gel, for example, the lower the mole number of the residual silanol group, the better. If the molar number of the residual silanol group is too high, for example, when the functional porous body is formed, the void structure may not be maintained to crosslink the precursor of the functional porous body. On the other hand, if the molar number of the residual silanol groups is too low, for example, in the aforementioned bonding step, the precursor of the functional porous body may not be crosslinked, and thus sufficient film strength may not be imparted. In addition, the above is an example of a residual silanol group. For example, when the silicon compound that has been modified with various reactive functional groups is used as a raw material of the silicon compound gel, the same phenomenon can be applied to each functional group.

藉由前述凝膠化製得的前述多孔體凝膠譬如在前述熟成步驟中施行熟成處理後,施行溶劑置換步驟,再於其後供給至前述凝膠粉碎步驟。前述溶劑置換步驟可將前述溶劑置換成其他溶劑。For example, the porous body gel obtained by the gelation is subjected to a ripening process in the ripening step, for example, a solvent replacement step is performed, and is then supplied to the gel pulverizing step. The solvent replacement step may replace the solvent with another solvent.

在本發明中,前述凝膠粉碎步驟如前述為粉碎前述多孔體凝膠之步驟。前述粉碎譬如可對前述凝膠化步驟後之前述多孔體凝膠施行,更可對已施行前述熟成處理之前述熟成後的多孔體凝膠施行。In the present invention, the gel pulverization step is the step of pulverizing the porous body gel as described above. The pulverization may be performed, for example, on the porous body gel after the gelation step, or may be performed on the mature porous body gel that has been subjected to the aging treatment.

又如前述,亦可在前述溶劑置換步驟之前(譬如前述熟成步驟後)進行控制前述凝膠之形狀及大小的凝膠形態控制步驟。前述凝膠形態控制步驟中所控制的前述凝膠之形狀及大小並無特別限定,如同前述。前述凝膠形態控制步驟譬如亦可將前述凝膠分割(譬如切開)成適當的大小及形狀之立體(3維體)來進行。As described above, the gel shape control step for controlling the shape and size of the gel may be performed before the solvent replacement step (for example, after the ripening step). The shape and size of the gel controlled in the gel shape control step are not particularly limited, as described above. The gel shape control step may be performed by dividing (eg, cutting) the gel into a three-dimensional (three-dimensional body) having an appropriate size and shape, for example.

此外,如前述在對前述凝膠施行前述溶劑置換步驟後,再施行前述凝膠粉碎步驟。前述溶劑置換步驟可將前述溶劑置換成其他溶劑。因為如果不將前述溶劑置換成前述其他溶劑,譬如凝膠化步驟中所使用的觸媒及溶劑到前述熟成步驟後繼續殘留,則恐影響進一步歷時發生凝膠化而最終製得的含凝膠粉碎物液體之使用期限,或可能降低使用前述含凝膠粉碎物液體所形成的塗覆膜於乾燥時之乾燥效率等。又,前述凝膠粉碎步驟中之前述其他溶劑以下亦稱作「粉碎用溶劑」。In addition, as described above, after the solvent replacement step is performed on the gel, the gel pulverization step is performed. The solvent replacement step may replace the solvent with another solvent. This is because if the aforementioned solvent is not replaced with the aforementioned other solvent, for example, the catalyst and solvent used in the gelation step continue to remain after the aforementioned maturation step, it may affect the gel containing the gel which is finally produced over time. The useful life of the pulverized material liquid may reduce the drying efficiency of the coating film formed by using the gel-containing pulverized material liquid during drying. The other solvents in the gel pulverization step are hereinafter also referred to as "solvents for pulverization".

前述粉碎用溶劑(其他溶劑)無特別限制,例如可使用有機溶劑。前述有機溶劑可舉如沸點140℃以下、沸點130℃以下、沸點100℃以下、沸點85℃以下之溶劑。具體例可舉如異丙醇(IPA)、乙醇、甲醇、正丁醇、2-丁醇、異丁醇、戊醇、丙二醇單甲基醚(PGME)、甲賽璐蘇、丙酮等。前述粉碎用溶劑例如可為1種亦可將2種以上併用。The pulverizing solvent (other solvents) is not particularly limited, and for example, an organic solvent can be used. Examples of the organic solvent include solvents having a boiling point of 140 ° C or lower, a boiling point of 130 ° C or lower, a boiling point of 100 ° C or lower, and a boiling point of 85 ° C or lower. Specific examples include isopropyl alcohol (IPA), ethanol, methanol, n-butanol, 2-butanol, isobutanol, pentanol, propylene glycol monomethyl ether (PGME), methylcellulose, and acetone. The above-mentioned pulverizing solvent may be, for example, one kind or a combination of two or more kinds.

又,在前述粉碎用溶劑之極性很低等的情況下,譬如亦可將前述溶劑置換步驟分成多階段的溶劑置換階段執行,且在前述溶劑置換階段中,且前述其他溶劑的親水性在後行階段比先行階段更低。藉由這種設定,譬如可提升溶劑置換效率,極度降低前述凝膠中之凝膠製造用溶劑(譬如DMSO)的殘存量。就具體例而言,譬如可將前述溶劑置換步驟分成3階段的溶劑置換階段進行,在第1溶劑置換階段中首先將凝膠中之DMSO置換成水,接著在第2溶劑置換階段中將凝膠中之前述水置換成IPA,再於第3置換階段中將凝膠中之前述IPA置換成異丁醇。In the case where the polarity of the solvent for pulverization is very low, for example, the solvent replacement step may be divided into a plurality of steps of the solvent replacement step, and in the solvent replacement step, the hydrophilicity of the other solvents is later. The running phase is lower than the preceding phase. With this setting, for example, the solvent replacement efficiency can be improved, and the residual amount of the gel-producing solvent (for example, DMSO) in the gel can be extremely reduced. For a specific example, for example, the aforementioned solvent replacement step can be divided into three steps for the solvent replacement step. In the first solvent replacement step, DMSO in the gel is first replaced with water, and then the coagulation is performed in the second solvent replacement step. The aforementioned water in the gel was replaced with IPA, and the aforementioned IPA in the gel was replaced with isobutanol in the third replacement stage.

前述凝膠化用溶劑與前述粉碎用溶劑之組合並無特別限制,可舉如DMSO與IPA之組合、DMSO與乙醇之組合、DMSO與異丁醇之組合、DMSO與正丁醇之組合等。如此一來,藉由將前述凝膠化用溶劑換成前述粉碎用溶劑,例如可在後述之塗膜形成中形成較均一的塗覆膜。The combination of the gelling solvent and the pulverizing solvent is not particularly limited, and examples thereof include a combination of DMSO and IPA, a combination of DMSO and ethanol, a combination of DMSO and isobutanol, and a combination of DMSO and n-butanol. In this way, by changing the solvent for gelation to the solvent for pulverization, for example, a more uniform coating film can be formed in the coating film formation described later.

前述溶劑置換步驟無特別限定,譬如可以下述方式進行。即,首先將利用前述凝膠製造步驟製得的凝膠(譬如前述熟成處理後之凝膠)浸漬或接觸前述其他溶劑,使前述凝膠中之凝膠製造用觸媒、藉縮合反應所生成之醇成分、水等溶解至前述其他溶劑中。其後丟棄已浸漬或接觸前述凝膠的溶劑,使前述凝膠再度浸漬或接觸新的溶劑。重複此程序直到前述凝膠中之凝膠製造用溶劑的殘存量成為期望之量為止。每1次之浸漬時間譬如為0.5小時以上、1小時以上或1.5小時以上,上限值並無特別限定,譬如為10小時以下。又,上述溶劑之浸漬亦可以使前述溶劑連續接觸凝膠的方式來對應。又,前述浸漬中之溫度並無特別限定,譬如可為20~70℃、25~65℃或30~60℃。進行加熱能使溶劑置換快速進展,置換所需的必要溶劑量只需少量即可,不過亦可在室溫下簡便地進行溶劑置換。又,譬如將前述溶劑置換步驟分成多階段的溶劑置換階段執行時,前述多階段的溶劑置換階段之各階段亦可以如前述方式進行。The said solvent replacement process is not specifically limited, For example, it can perform it as follows. That is, first, the gel produced by the gel manufacturing step (such as the gel after the aging process) is immersed or contacted with the other solvent, and the gel manufacturing catalyst in the gel is generated by a condensation reaction. The alcohol component, water, and the like are dissolved in the other solvents. Thereafter, the solvent which has been impregnated or contacted with the gel is discarded, and the gel is impregnated or contacted with a new solvent again. This procedure is repeated until the remaining amount of the gel-producing solvent in the gel becomes a desired amount. The immersion time per time is, for example, 0.5 hours or more, 1 hour or more, or 1.5 hours or more. The upper limit value is not particularly limited, and is, for example, 10 hours or less. In addition, the impregnation of the solvent may be adapted so that the solvent continuously contacts the gel. The temperature during the dipping is not particularly limited, and may be, for example, 20 to 70 ° C, 25 to 65 ° C, or 30 to 60 ° C. Heating can make the solvent replacement progress rapidly, and the amount of necessary solvent required for the replacement can be small, but the solvent replacement can be easily performed at room temperature. In addition, for example, when the solvent replacement step is divided into a plurality of stages of the solvent replacement stage and executed, each stage of the multi-stage solvent replacement stage may be performed as described above.

另,譬如亦可將前述溶劑置換步驟分成多階段的溶劑置換階段執行,且前述其他溶劑的親水性在後行階段比先行階段更低。如此一來,便可將置換用溶劑(前述其他溶劑)從親水性高的溶劑慢慢地換成親水性低(疏水性高)的溶劑,藉此可使凝膠中之凝膠製造用溶劑的殘存量變得極少。以上述方法,譬如可進一步製造空隙率高(因此,譬如低折射率)的空隙層。In addition, for example, the solvent replacement step may be divided into a plurality of stages of the solvent replacement stage and the hydrophilicity of the other solvents may be lower in the later stage than in the preceding stage. In this way, the solvent for replacement (the other solvents mentioned above) can be gradually changed from a solvent having a high hydrophilicity to a solvent having a low hydrophilicity (high hydrophobicity), thereby enabling a solvent for producing a gel in a gel. The amount of residuals has become extremely small. According to the above method, for example, a void layer having a high porosity (and therefore, a low refractive index) can be further produced, for example.

進行前述溶劑置換步驟後,前述凝膠中之凝膠製造用溶劑殘存量宜為0.005g/ml以下,更宜為0.001g/ml以下,尤宜為0.0005g/ml以下。前述凝膠中之凝膠製造用溶劑殘存量的殘存量下限值並無特別限定,譬如可為零、檢測極限值以下或小於。After the solvent replacement step is performed, the residual amount of the solvent for producing a gel in the gel is preferably 0.005 g / ml or less, more preferably 0.001 g / ml or less, and particularly preferably 0.0005 g / ml or less. The lower limit of the remaining amount of the remaining amount of the solvent for producing a gel in the gel is not particularly limited, and may be, for example, zero, less than or less than a detection limit.

進行前述溶劑置換步驟後,前述凝膠中之凝膠製造用溶劑殘存量譬如可以下述方法測定。After the solvent replacement step is performed, the residual amount of the solvent for producing a gel in the gel can be measured, for example, by the following method.

(凝膠中之凝膠製造用溶劑的殘存量測定方法) 採取凝膠0.2g並添加丙酮10ml,在室溫下使用振盪器以120rpm振盪3日進行萃取。將其1μl萃取液注入氣相層析分析器(Aglent公司製、商品名7890A)中進行分析。另,為了確認測定的重現性,譬如亦可以n=2(測定次數2次)或其以上之測定次數進行採樣來測定。進一步從試樣製作檢測線,求出凝膠每1g中之各成分量,算出凝膠每1g中的凝膠製造溶劑之殘存量。(Method for measuring the remaining amount of the gel-producing solvent in the gel) 0.2 g of the gel was added, 10 ml of acetone was added, and extraction was performed by shaking at 120 rpm with a shaker at room temperature for 3 days. 1 μl of the extract was injected into a gas chromatography analyzer (manufactured by Aglent, trade name 7890A) and analyzed. In addition, in order to confirm the reproducibility of the measurement, for example, the measurement may be performed by sampling at a measurement number of n = 2 (two measurement times) or more. Further, a test line was prepared from the sample, and the amount of each component per 1 g of the gel was determined, and the remaining amount of the gel-producing solvent per 1 g of the gel was calculated.

將前述溶劑置換步驟分成多階段的溶劑置換階段執行,且前述其他溶劑的親水性在後行階段比先行階段更低時,前述其他溶劑(置換用溶劑)無特別限定。惟在最後執行的前述溶劑置換階段中,前述其他溶劑(置換用溶劑)宜為空隙層製造用溶劑。前述空隙層製造用溶劑可舉如沸點140℃以下之溶劑。又,前述空隙層製造用溶劑可舉如醇、醚、酮、酯系溶劑、脂肪族烴系溶劑、芳香族系溶劑等。沸點140℃以下之醇的具體例可舉如異丙醇(IPA)、乙醇、甲醇、正丁醇、2-丁醇、異丁醇(IBA)、1-戊醇、2-戊醇等。沸點140℃以下之醚的具體例可舉如丙二醇單甲基醚(PGME)、甲賽璐蘇、乙賽璐蘇等。沸點140℃以下之酮的具體例可舉如丙酮、甲基乙基酮、甲基異丁基酮、環戊酮等。沸點140℃以下之酯系溶劑的具體例可舉如乙酸乙酯、乙酸丁酯、乙酸異丙酯、乙酸正丙酯等。沸點140℃以下之脂肪族烴系溶劑的具體例可舉如己烷、環己烷、庚烷、辛烷等。沸點140℃以下之芳香族系溶劑的具體例可舉如甲苯、苯、二甲苯、大茴香醚等。在塗覆時,若從不易侵蝕基材(譬如樹脂薄膜)的觀點來看,前述空隙層製造用溶劑宜為醇、醚或脂肪族烴系溶劑。又,前述粉碎用溶劑例如可為1種亦可將2種以上併用。尤其,從室溫下為低揮發性的面向來看,以異丙醇(IPA)、乙醇、正丁醇、2-丁醇、異丁醇(IBA)、戊醇、丙二醇單甲基醚(PGME)、甲賽璐蘇、庚烷、辛烷為宜。尤其為了抑制凝膠材質之粒子(譬如二氧化矽化合物)飛散,前述空隙層製造用溶劑之飽和蒸氣壓不宜過高(揮發性不過高)。這類的溶劑,譬如以具有碳數3或4以上之脂肪族基的溶劑為宜,且具有碳數4以上之脂肪族基的溶劑較佳。前述具有碳數3或4以上之脂肪族基的溶劑譬如亦可為醇。這類的溶劑具體上譬如以異丙醇(IPA)、異丁醇(IBA)、正丁醇、2-丁醇、1-戊醇、2-戊醇為佳,且異丁醇(IBA)尤佳。When the solvent replacement step is divided into a plurality of steps of the solvent replacement step and the hydrophilicity of the other solvent is lower in the later stage than in the preceding stage, the other solvent (the solvent for replacement) is not particularly limited. However, in the solvent replacement stage performed last, the other solvent (solvent for replacement) is preferably a solvent for producing a void layer. Examples of the solvent for producing the void layer include solvents having a boiling point of 140 ° C or lower. Examples of the solvent for producing the void layer include alcohols, ethers, ketones, ester solvents, aliphatic hydrocarbon solvents, and aromatic solvents. Specific examples of the alcohol having a boiling point of 140 ° C or lower include isopropyl alcohol (IPA), ethanol, methanol, n-butanol, 2-butanol, isobutanol (IBA), 1-pentanol, and 2-pentanol. Specific examples of the ether having a boiling point of 140 ° C or lower include propylene glycol monomethyl ether (PGME), methylcellulose, and ethylcellulose. Specific examples of the ketone having a boiling point of 140 ° C. or lower include acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclopentanone. Specific examples of the ester-based solvent having a boiling point of 140 ° C or lower include ethyl acetate, butyl acetate, isopropyl acetate, and n-propyl acetate. Specific examples of the aliphatic hydrocarbon-based solvent having a boiling point of 140 ° C or lower include hexane, cyclohexane, heptane, and octane. Specific examples of the aromatic solvent having a boiling point of 140 ° C or lower include toluene, benzene, xylene, and anisole. From the viewpoint of preventing the substrate (for example, a resin film) from being easily eroded during coating, the solvent for producing the void layer is preferably an alcohol, an ether, or an aliphatic hydrocarbon-based solvent. The pulverizing solvent may be, for example, one kind or a combination of two or more kinds. In particular, from the viewpoint of low volatility at room temperature, isopropyl alcohol (IPA), ethanol, n-butanol, 2-butanol, isobutanol (IBA), pentanol, propylene glycol monomethyl ether ( PGME), methylcellulose, heptane, and octane are preferred. In particular, in order to suppress the scattering of particles of a gel material (such as a silicon dioxide compound), the saturation vapor pressure of the aforementioned solvent for producing a void layer should not be too high (the volatility is not too high). Such a solvent is preferably a solvent having an aliphatic group having 3 or more carbon atoms, and a solvent having an aliphatic group of 4 or more carbon atoms is preferred. The solvent having an aliphatic group having 3 or 4 or more carbon atoms may be, for example, an alcohol. Examples of such solvents include isopropyl alcohol (IPA), isobutanol (IBA), n-butanol, 2-butanol, 1-pentanol, and 2-pentanol, and isobutanol (IBA) It's better.

最後進行之前述溶劑置換階段以外的前述其他溶劑(置換用溶劑)無特別限定,可舉如醇、醚、酮等。醇之具體例可舉如異丙醇(IPA)、乙醇、甲醇、正丁醇、2-丁醇、異丁醇(IBA)、戊醇等。醚之具體例可舉如丙二醇單甲基醚(PGME)、甲賽璐蘇、乙賽璐蘇等。酮之具體例可舉如丙酮等。前述其他溶劑(置換用溶劑)只要能置換前述凝膠製造用溶劑或其前面階段之前述其他溶劑(置換用溶劑)即可。又,最後進行之前述溶劑置換階段以外的前述其他溶劑(置換用溶劑)以最終不會殘留在凝膠中或是即使殘留但在塗覆時不易侵蝕基材(譬如樹脂薄膜)的溶劑為宜。若從塗覆時不易侵蝕基材(譬如樹脂薄膜)的觀點來看,最後進行之前述溶劑置換階段以外的前述其他溶劑(置換用溶劑)宜為醇。如此一來,在前述多階段的溶劑置換階段之至少一段的前述其他溶劑為醇為佳。The other solvents (solvent for replacement) other than the solvent replacement step performed last are not particularly limited, and examples thereof include alcohols, ethers, and ketones. Specific examples of the alcohol include isopropyl alcohol (IPA), ethanol, methanol, n-butanol, 2-butanol, isobutanol (IBA), and pentanol. Specific examples of the ether include propylene glycol monomethyl ether (PGME), methylcellulose, and ethylcellulose. Specific examples of the ketone include acetone. The other solvent (solvent for replacement) may be substituted for the solvent for gel production or the other solvent (replacement solvent) at a previous stage. In addition, it is preferable that the other solvents (replacement solvents) other than the aforementioned solvent replacement stage are solvents that will not remain in the gel eventually or that will not easily attack the substrate (such as a resin film) during coating. . From the viewpoint of not easily attacking the substrate (such as a resin film) during coating, it is preferable that the other solvent (replacement solvent) other than the solvent replacement stage performed last is an alcohol. As such, it is preferred that the other solvent in at least one of the multi-stage solvent replacement stages is an alcohol.

在最初進行之前述溶劑置換階段中,前述其他溶劑譬如可為水或是以任意比率含有水之混合溶劑。只要是水或含有水之混合溶劑,與親水性高的凝膠製造用溶劑(譬如DMSO)之相溶性即高,因此容易置換前述凝膠製造用溶劑,而且從成本面來看亦佳。In the aforementioned solvent replacement stage, the other solvents may be, for example, water or a mixed solvent containing water in an arbitrary ratio. As long as it is water or a mixed solvent containing water, it has high compatibility with a highly hydrophilic gel-producing solvent (for example, DMSO), so it is easy to replace the aforementioned gel-producing solvent, and it is also excellent in terms of cost.

前述多階段的溶劑置換階段亦可包含下列階段:前述其他溶劑為水之階段;其後進行之前述其他溶劑為具有碳數3以下脂肪族基之溶劑的階段;及再於其後進行之前述其他溶劑為具有碳數4以上脂肪族基之溶劑的階段。又,前述具有碳數3以下脂肪族基之溶劑與前述具有碳數4以上脂肪族基之溶劑中的至少一者亦可為醇。具有碳數3以下脂肪族基之醇並無特別限定,可舉如異丙醇(IPA)、乙醇、甲醇、正丙基醇等。具有碳數4以上脂肪族基之醇並無特別限定,可舉如正丁醇、2-丁醇、異丁醇(IBA)、戊醇等。譬如,亦可以是前述具有碳數3以下脂肪族基之溶劑為異丙醇,而前述具有碳數4以上脂肪族基之溶劑為異丁醇。The aforementioned multi-stage solvent replacement stage may also include the following stages: the stage where the other solvent is water; the stage where the aforementioned other solvent is a solvent having an aliphatic group having a carbon number of 3 or less; and the aforementioned stage which is performed thereafter The other solvent is a step of a solvent having an aliphatic group having 4 or more carbon atoms. In addition, at least one of the solvent having an aliphatic group with a carbon number of 3 or less and the solvent having an aliphatic group with a carbon number of 4 or more may be an alcohol. The alcohol having an aliphatic group having a carbon number of 3 or less is not particularly limited, and examples thereof include isopropyl alcohol (IPA), ethanol, methanol, and n-propyl alcohol. The alcohol having an aliphatic group having 4 or more carbon atoms is not particularly limited, and examples thereof include n-butanol, 2-butanol, isobutanol (IBA), and pentanol. For example, the solvent having an aliphatic group having a carbon number of 3 or less may be isopropanol, and the solvent having an aliphatic group having a carbon number of 4 or more may be isobutanol.

本發明人等發現,譬如若要在200℃以下之較溫和的條件下形成具有膜強度的空隙層,聚焦在前述凝膠製造用溶劑之殘存量上就非常重要。此見解在前述包含專利文獻及非專利文獻之先前技術中皆尚未揭示,乃本發明人等獨自發掘之解釋。The present inventors have found that it is important to focus on the remaining amount of the aforementioned solvent for gel production if a void layer having film strength is to be formed under relatively mild conditions of 200 ° C or lower. This insight has not been disclosed in the aforementioned prior art including patent literature and non-patent literature, and it is an explanation that the present inventors have independently explored.

如此一來,藉由減低凝膠中之凝膠製造用溶劑的殘存量可製造低折射率之空隙層的理由(機制)尚不明確,不過,譬如可推測如下。即,如前述,為了進行凝膠化反應,凝膠製造用溶劑宜為高沸點溶劑(譬如DMSO等)。而且,在塗覆從前述凝膠製得之溶膠液並予以乾燥來製造空隙層時,以通常的乾燥溫度及乾燥時間(未特別限定,不過譬如係在100℃下進行1分鐘等)很難完全去除前述高沸點溶劑。因為,一旦乾燥溫度過高或乾燥時間過長,便可能發生基材劣化等問題。而且,於前述塗覆乾燥時所殘留的前述高沸點溶劑會進入前述凝膠之粉碎物彼此之間,使前述粉碎物彼此產生滑動而讓前述粉碎物彼此緊密地堆積,減少空隙率,因而推測很難顯現低折射率。亦即,相反地只要減少前述高沸點溶劑之殘存量,便可抑制這種現象,從而可顯現低折射率。惟,該等僅為推測機制之一例,對本發明不具任何限定。In this way, the reason (mechanism) for producing a low-refractive void layer by reducing the remaining amount of the gel-producing solvent in the gel is not clear, but it can be estimated as follows, for example. That is, as described above, in order to perform the gelation reaction, the solvent for gel production is preferably a high-boiling-point solvent (such as DMSO). In addition, when a sol solution prepared from the gel is applied and dried to produce a void layer, it is difficult to use a normal drying temperature and drying time (not particularly limited, but for example, performed at 100 ° C for 1 minute). The aforementioned high-boiling solvents are completely removed. This is because if the drying temperature is too high or the drying time is too long, problems such as deterioration of the substrate may occur. In addition, the high-boiling-point solvent remaining during the coating and drying will enter between the pulverized materials of the gel, cause the pulverized materials to slide with each other, and cause the pulverized materials to closely accumulate, thereby reducing the void ratio. It is difficult to develop a low refractive index. That is, if the remaining amount of the high-boiling-point solvent is reduced on the contrary, this phenomenon can be suppressed and a low refractive index can be exhibited. However, these are only examples of the speculative mechanism and do not limit the present invention in any way.

另,在本發明中,「溶劑」(譬如凝膠製造用溶劑、空隙層製造用溶劑、置換用溶劑等)可以不用溶解凝膠或其粉碎物等,譬如亦可使前述凝膠或其粉碎物等分散或沉澱在前述溶劑中。In addition, in the present invention, the "solvent" (for example, a solvent for producing a gel, a solvent for producing a void layer, a solvent for replacement, etc.) can be used without dissolving the gel or its pulverized substance. The substance or the like is dispersed or precipitated in the aforementioned solvent.

前述凝膠製造用溶劑如前述,譬如亦可以沸點在140℃以上。As mentioned above, the said gel manufacturing solvent may have a boiling point of 140 degreeC or more, for example.

前述凝膠製造用溶劑譬如為水溶性溶劑。另,在本發明中,「水溶性溶劑」意指可以任意比率與水混合之溶劑。The gel-making solvent is, for example, a water-soluble solvent. In the present invention, the "water-soluble solvent" means a solvent that can be mixed with water at any ratio.

將前述溶劑置換步驟分成多階段的溶劑置換階段進行時,其方法無特別限定,譬如可以下述方式進行各階段的溶劑置換階段。即,首先使前述凝膠浸漬或接觸前述其他溶劑,使前述凝膠中之凝膠製造用觸媒、藉縮合反應所生成之醇成分、水等溶解至前述其他溶劑中。其後丟棄已浸漬或接觸前述凝膠的溶劑,使前述凝膠再度浸漬或接觸新的溶劑。重複此程序直到前述凝膠中之凝膠製造用溶劑的殘存量成為期望之量為止。每1次之浸漬時間譬如為0.5小時以上、1小時以上或1.5小時以上,上限值並無特別限定,譬如為10小時以下。又,上述溶劑之浸漬亦可以使前述溶劑連續接觸凝膠的方式來對應。又,前述浸漬中之溫度並無特別限定,譬如可為20~70℃、25~65℃或30~60℃。進行加熱能使溶劑置換快速進展,置換所需的必要溶劑量只需少量即可,不過亦可在室溫下簡便地進行溶劑置換。將該溶劑置換階段進行數次,並將前述其他溶劑(置換用溶劑)慢慢地從親水性高的溶劑換成親水性低(疏水性高)的溶劑。為了去除親水性高的凝膠製造用溶劑(譬如DMSO等),譬如同前述,於一開始用水作為置換用溶劑,既簡易且效率佳。接著,以水去除DMSO等後,將凝膠中之水譬如按異丙醇⇒異丁醇(塗覆用溶劑)之順序進行置換。即,水與異丁醇之相溶性低,所以先暫且置換成異丙醇後,再置換成塗覆溶劑之異丁醇,便可有效率地進行溶劑置換。惟,此為一例,如前述,前述其他溶劑(置換用溶劑)並無特別限定。When the solvent replacement step is divided into a plurality of steps of the solvent replacement step, the method is not particularly limited. For example, the solvent replacement step of each step can be performed in the following manner. That is, first, the gel is immersed or contacted with the other solvent, and the gel-making catalyst in the gel, the alcohol component produced by the condensation reaction, water, and the like are dissolved in the other solvent. Thereafter, the solvent which has been impregnated or contacted with the gel is discarded, and the gel is impregnated or contacted with a new solvent again. This procedure is repeated until the remaining amount of the gel-producing solvent in the gel becomes a desired amount. The immersion time per time is, for example, 0.5 hours or more, 1 hour or more, or 1.5 hours or more. The upper limit value is not particularly limited, and is, for example, 10 hours or less. In addition, the impregnation of the solvent may be adapted so that the solvent continuously contacts the gel. The temperature during the dipping is not particularly limited, and may be, for example, 20 to 70 ° C, 25 to 65 ° C, or 30 to 60 ° C. Heating can make the solvent replacement progress rapidly, and the amount of necessary solvent required for the replacement can be small, but the solvent replacement can be easily performed at room temperature. This solvent replacement step was performed several times, and the other solvent (the solvent for replacement) was gradually changed from a solvent with high hydrophilicity to a solvent with low hydrophilicity (high hydrophobicity). In order to remove a highly hydrophilic gel-producing solvent (for example, DMSO), as described above, it is simple and efficient to use water as a solvent for replacement at the beginning. Next, after removing DMSO and the like with water, the water in the gel is replaced in the order of isopropyl alcohol ⇒ isobutanol (solvent for coating), for example. That is, the compatibility between water and isobutanol is low. Therefore, the solvent can be efficiently replaced by isopropyl alcohol and then isobutanol as a coating solvent. However, this is an example. As mentioned above, the other solvents (solvent for replacement) are not particularly limited.

在本發明中,凝膠之製造方法譬如同前述,亦可將前述溶劑置換階段進行數次,並將前述其他溶劑(置換用溶劑)慢慢地從親水性高的溶劑換成親水性低(疏水性高)的溶劑。藉此,如前述,可極度降低前述凝膠中之凝膠製造用溶劑的殘存量。不僅如此,譬如比起僅使用塗覆用溶劑以1階段進行溶劑置換,更能極致壓低減少溶劑之使用量,因而還可做到低成本化。In the present invention, the method for producing a gel is, for example, as described above, and the solvent replacement stage may be performed several times, and the other solvent (the solvent for replacement) may be slowly changed from a solvent with high hydrophilicity to a solvent with low hydrophilicity ( Highly hydrophobic) solvents. Thereby, as described above, the residual amount of the gel-producing solvent in the gel can be extremely reduced. In addition, for example, it is possible to reduce the amount of solvent used to reduce the amount of solvent used more than the solvent replacement in one stage by using only the coating solvent, thereby reducing the cost.

然後,於前述溶劑置換步驟後進行凝膠粉碎步驟,即在前述粉碎用溶劑中將前述凝膠予以粉碎。又譬如同前述,亦可於前述溶劑置換步驟後且前述凝膠粉碎步驟之前,視需求進行凝膠濃度測定,再於其後視需求進行前述凝膠濃度調整步驟。前述溶劑置換步驟後且前述凝膠粉碎步驟前的凝膠濃度測定譬如可以下述方式進行。即,首先於前述溶劑置換步驟後,從前述其他溶劑(粉碎用溶劑)中取出凝膠。該凝膠譬如已經由前述凝膠形態控制步驟控制成適當的形狀及大小(譬如塊狀)的團塊。接著去除附著在前述凝膠之團塊周圍的溶劑後,利用重量乾燥法測定一個凝膠團塊中所占的固體成分濃度。此時,為了取得測定值的重現性,以隨機取出之多個(譬如6個)團塊進行測定,並算出其平均值與值之參差。前述濃度調整步驟譬如可藉由進一步添加前述其他溶劑(粉碎用溶劑),來降低前述含凝膠液體之凝膠濃度。又,前述濃度調整步驟亦可相反地藉由使前述其他溶劑(粉碎用溶劑)蒸發,來提升前述含凝膠液體之凝膠濃度。Then, a gel pulverization step is performed after the solvent replacement step, that is, the gel is pulverized in the pulverization solvent. For another example, as described above, after the solvent replacement step and before the gel pulverization step, the gel concentration measurement may be performed as required, and then the gel concentration adjustment step may be performed as required thereafter. The gel concentration measurement after the solvent replacement step and before the gel pulverization step can be performed, for example, in the following manner. That is, first, after the solvent replacement step, the gel is taken out of the other solvents (solvent for pulverization). The gel is, for example, agglomerates having an appropriate shape and size (for example, lumps) that have been controlled by the aforementioned gel morphology controlling step. Next, the solvent adhering to the agglomerates of the gel was removed, and then the concentration of solid components in one agglomerate of the gel was measured by a weight drying method. At this time, in order to obtain the reproducibility of the measured value, a plurality of (for example, 6) clumps taken out at random are measured, and the difference between the average value and the value is calculated. The concentration adjustment step may, for example, further reduce the gel concentration of the gel-containing liquid by further adding the other solvent (solvent for pulverization). In addition, the concentration adjustment step may conversely increase the gel concentration of the gel-containing liquid by evaporating the other solvent (solvent for pulverization).

在本發明之含凝膠粉碎物液體的製造方法中,如前述,前述凝膠粉碎步驟可以1階段進行,不過宜分成多個粉碎階段進行。具體上,譬如可進行前述第1粉碎階段及前述第2粉碎階段。又,前述凝膠粉碎步驟除了前述第1粉碎階段及前述第2粉碎階段外,亦可進一步施行凝膠粉碎步驟。即,在本發明之製造方法中,前述凝膠粉碎步驟不限於2階段的粉碎階段,亦可包含3階段以上的粉碎階段。In the method for producing a gel-pulverized product-containing liquid according to the present invention, as described above, the gel pulverization step may be performed in one stage, but it may be performed in a plurality of pulverization stages. Specifically, for example, the first pulverization stage and the second pulverization stage can be performed. The gel pulverization step may be further performed in addition to the first pulverization step and the second pulverization step. That is, in the manufacturing method of the present invention, the gel pulverization step is not limited to a two-stage pulverization stage, and may include a pulverization stage of three or more stages.

以下針對前述第1粉碎階段及前述第2粉碎階段加以說明。The first crushing stage and the second crushing stage will be described below.

前述第1粉碎階段係將前述多孔體凝膠予以粉碎之步驟。前述第2粉碎階段係於前述第1粉碎階段後,將前述多孔體凝膠之粒子進一步粉碎的步驟。The first pulverization step is a step of pulverizing the porous body gel. The second pulverization step is a step of further pulverizing the particles of the porous body gel after the first pulverization step.

經由前述第1粉碎階段製得之前述多孔體凝膠之粒子的體積平均粒徑,及經由前述第2粉碎階段製得之前述多孔體凝膠之粒子的體積平均粒徑譬如同前述。關於前述體積平均粒徑之測定方法亦譬如同前述。The volume average particle diameter of the particles of the porous body gel obtained in the first pulverization step and the volume average particle diameter of the particles of the porous body gel obtained in the second pulverization step are as described above. The measurement method of the said volume average particle diameter is also the same as the above.

前述含凝膠粉碎物液體在前述第1粉碎階段後當下的剪切黏度及前述第2粉碎階段後當下的剪切黏度譬如同前述。關於前述剪切黏度之測定方法亦譬如同前述。The shear viscosity of the gel-containing pulverized material-containing liquid after the first pulverization step and the shear viscosity of the liquid after the second pulverization step are as described above. The method for measuring the aforementioned shear viscosity is similar to that described above.

另,譬如同前述,亦可於前述第1粉碎階段後當下即測定含凝膠液體之凝膠濃度,並僅將前述凝膠濃度為預定數值範圍內之前述液體供給至前述第2粉碎階段,藉以進行前述含凝膠液體之濃度管理。In addition, for example, as described above, the gel concentration of the gel-containing liquid may be measured immediately after the first pulverization stage, and only the liquid having the gel concentration within a predetermined numerical range may be supplied to the second pulverization stage. Thereby, the concentration control of the aforementioned gel-containing liquid is performed.

前述多孔體凝膠之粉碎方法無特別限制,譬如可藉由下列裝置進行:高壓無介質粉碎裝置、超音波均質機、高速旋轉均質機、高壓擠出粉碎裝置、其他利用空蝕現象之濕式無介質粉碎裝置等。前述第1粉碎階段及前述第2粉碎階段可施行相同的粉碎方法,亦可施行彼此互異的粉碎方法,不過宜施行彼此互異的粉碎方法。There is no particular limitation on the pulverization method of the aforementioned porous body gel. For example, it can be performed by the following devices: high-pressure medium-free pulverizer, ultrasonic homogenizer, high-speed rotary homogenizer, high-pressure extrusion pulverizer, and other wet methods that use cavitation No media pulverizer, etc. The first pulverization stage and the second pulverization stage may be performed with the same pulverization method or with a pulverization method that is different from each other.

就前述粉碎方法而言,宜藉由利用控制能量來粉碎前述多孔體凝膠之方法,施行前述第1粉碎階段及前述第2粉碎階段中之至少一者。前述利用控制能量來粉碎前述多孔體凝膠之方法,可舉如利用高壓無介質粉碎裝置等進行之方法。As for the pulverization method, it is preferable to perform at least one of the first pulverization step and the second pulverization step by a method of pulverizing the porous body gel by controlling energy. The method for pulverizing the porous body gel by controlling energy may be a method using a high-pressure medium-free pulverizer or the like.

在利用超音波粉碎前述多孔體凝膠之方法中,粉碎強度雖強但難以控制(調節)粉碎。相對地,若是利用控制能量來粉碎前述多孔體凝膠之方法,則可在控制(調節)前述粉碎的情況下進行粉碎。藉此,可在限定的作業量下製造均勻的含凝膠粉碎物液體。因此,譬如可以量產步調來製造前述含凝膠粉碎物液體。In the method for pulverizing the porous body gel by ultrasonic waves, although the pulverization strength is strong, it is difficult to control (adjust) the pulverization. In contrast, if the porous body gel is pulverized by controlling energy, the pulverization can be performed while controlling (adjusting) the pulverization. Thereby, a uniform gel-containing pulverized product liquid can be produced with a limited operation amount. Therefore, for example, the above-mentioned gel-containing pulverized material liquid can be produced at a step of mass production.

珠磨機等進行介質粉碎的裝置係譬如於粉碎時以物理性破壞凝膠空隙結構,與之相對的,譬如均質機等空蝕方式粉碎裝置則因為是無介質方式,故是以高速的剪切力將早已內包在凝膠三維結構中之結合力較微弱的多孔質粒子接合面剝離。如此一來,藉由粉碎前述多孔體凝膠可製得新的溶膠三維結構,前述三維結構譬如在形成塗覆膜時,可保持具有一定範圍之粒度分布的空隙結構,可藉由塗覆、乾燥時的堆積再形成空隙結構。前述粉碎條件無特別限制,例如宜藉由瞬間賦予高速的流動,以不使溶劑揮發的方式將凝膠粉碎。例如,宜以成為如前述之粒度參差(例如體積平均粒徑或粒度分布)的粉碎物的方式進行粉碎。假設當粉碎時間、強度等作業量不足時,譬如像殘留有粗粒,不僅無法形成緻密的細孔,還有可能增加外觀缺陷,從而無法獲得高品質。另一方面,當前述作業量過多時,例如可能會形成比期望的粒度分布更微細的溶膠粒子,使塗覆、乾燥後堆積而成的空隙尺寸變微細,而無法達成期望的空隙率。A device such as a bead mill for pulverizing a medium physically breaks the void structure of the gel during pulverization. In contrast, a cavitation-type pulverizing device such as a homogenizer is a medium-free method, so it uses high-speed shearing. Shear force peels off the weakly-associated porous particle junction that is already contained in the three-dimensional structure of the gel. In this way, a new sol three-dimensional structure can be obtained by pulverizing the porous body gel. The three-dimensional structure can maintain a void structure with a certain range of particle size distribution, for example, when forming a coating film. The accumulation during drying again forms a void structure. The aforementioned pulverization conditions are not particularly limited, and for example, it is preferable to pulverize the gel in such a manner that the solvent is not volatilized by instantaneously imparting a high-speed flow. For example, it is preferable to grind | pulverize so that it may become the grind | pulverized material of the particle size dispersion | variation as mentioned above (for example, a volume average particle diameter or a particle size distribution). It is assumed that when the amount of work such as pulverization time and strength is insufficient, for example, coarse particles remain, not only dense pores cannot be formed, but also appearance defects may be increased, so that high quality cannot be obtained. On the other hand, when the aforementioned amount of work is excessive, for example, sol particles having a finer particle size distribution than a desired particle size distribution may be formed, and the void size formed by coating and drying may become fine, and the desired void ratio may not be achieved.

在前述第1粉碎階段及前述第2粉碎階段之至少一者中,宜在測定前述液體之剪切黏度的同時,控制前述多孔體之粉碎。具體的方法可舉如,在前述粉碎階段之中間階段調整已兼具期望之剪切黏度及極為優異之均勻性的溶膠液的方法、以聯機(in-line)監測前述液體之剪切黏度並反饋給前述粉碎階段之方法。藉此可製造已兼具期望之剪切黏度及極為優異的均勻性之含凝膠粉碎物液體。所以,譬如可將前述含凝膠粉碎物液體因應其用途來控制特性。In at least one of the first pulverization stage and the second pulverization stage, it is desirable to control the pulverization of the porous body while measuring the shear viscosity of the liquid. The specific method may be, for example, a method of adjusting a sol liquid having both desired shear viscosity and extremely excellent uniformity in the middle stage of the aforementioned pulverization stage, monitoring the shear viscosity of the aforementioned liquid in-line, and Feedback to the method of the aforementioned crushing stage. This makes it possible to produce a gel-containing pulverized material-containing liquid that has both the desired shear viscosity and extremely excellent uniformity. Therefore, for example, the above-mentioned gel-containing pulverized material-containing liquid can be controlled in accordance with its use.

於前述粉碎階段後,前述多孔體凝膠為前述矽化合物凝膠時,前述粉碎物中所含殘留矽烷醇基之比率並無特別限制,譬如與針對前述熟成處理後之矽化合物凝膠所示範圍相同。After the pulverization stage, when the porous body gel is the silicon compound gel, the ratio of the residual silanol groups contained in the pulverized material is not particularly limited. For example, as shown with the silicon compound gel after the aging treatment, The range is the same.

在本發明之製造方法中,亦可進一步於前述凝膠粉碎步驟(前述第1粉碎階段及前述第2粉碎階段)之至少一者後進行分級步驟。前述分級步驟係將前述多孔體凝膠之粒子予以分級。前述「分級」譬如係按照粒徑來分別前述多孔體凝膠之粒子。分級方法無特別限制,可用篩進行。如此一來,藉由以多個階段施行粉碎處理,如同前述,前述多孔體凝膠之粉碎物會成為均勻性極為優異之物。因此,將前述多孔體凝膠之粉碎物應用在光學構件等用途時,可讓前述光學構件等有良好的外觀。此外,藉由對前述多孔體凝膠之粉碎物施行分級處理,可讓前述光學構件等有良好的外觀。In the manufacturing method of the present invention, the classification step may be further performed after at least one of the gel pulverization step (the first pulverization step and the second pulverization step). The classification step is to classify particles of the porous body gel. The "classification" refers to, for example, separating the particles of the porous body gel according to the particle size. The classification method is not particularly limited, and can be carried out with a sieve. In this way, by performing the pulverization treatment in a plurality of stages, as described above, the pulverized material of the aforementioned porous body gel becomes a material having extremely excellent uniformity. Therefore, when the pulverized material of the porous body gel is applied to an application such as an optical member, the optical member or the like can have a good appearance. In addition, by classifying the pulverized material of the porous body gel, the optical member and the like can have a good appearance.

於前述凝膠粉碎步驟及任意之前述分級步驟後,含有前述粉碎物之前述溶劑中的前述粉碎物比率並無特別限制,譬如可列舉前述之前述本發明之含凝膠粉碎物液體中的條件。前述比率譬如可為含有前述凝膠粉碎步驟後之前述粉碎物的溶劑本身的條件,亦可係在前述凝膠粉碎步驟後且在作為前述含凝膠粉碎物液體使用之前被予以調整的條件。After the gel pulverization step and any of the classification steps, the ratio of the pulverized material in the solvent containing the pulverized material is not particularly limited. For example, the conditions in the gel-containing pulverized liquid of the present invention may be exemplified. . The ratio may be, for example, a condition including a solvent of the pulverized material after the gel pulverization step, or a condition that is adjusted after the gel pulverization step and before being used as the gel-containing pulverized material-containing liquid.

以上述方式可製作含有前述微細孔粒子(凝膠狀化合物之粉碎物)之液體(譬如懸浮液)。又,藉由於製造出含有前述微細孔粒子之液體後或是在製作步驟中,添加使前述微細孔粒子彼此行化學鍵結的觸媒,可製造含有前述微細孔粒子及前述觸媒之含有液。前述觸媒之添加量無特別限定,相對於前述凝膠狀矽化合物之粉碎物的重量,譬如為0.01~20重量%、0.05~10重量%或0.1~5重量%。前述觸媒亦可為譬如促進前述微細孔粒子彼此之交聯鍵結的觸媒。使前述微細孔粒子彼此行化學鍵結之化學反應,宜利用二氧化矽溶膠分子中所含殘留矽烷醇基的脫水縮合反應。藉前述觸媒促進矽烷醇基之羥基彼此的反應,可做到在短時間內使空隙結構硬化的連續成膜。前述觸媒可列舉如光活性觸媒及熱活性觸媒。藉由前述光活性觸媒,例如在前述空隙層形成步驟中不用加熱就可讓前述微細孔粒子彼此行化學鍵結(例如交聯鍵結)。藉此,例如在前述空隙層形成步驟中就不容易引起前述空隙層全體的收縮,所以可維持較高的空隙率。又,除了前述觸媒以外,亦可使用產生觸媒之物質(觸媒產生劑)或乾脆取而代之。譬如,除了前述光活性觸媒以外,亦可使用藉由光產生觸媒之物質(光觸媒產生劑)或乾脆取而代之,又除了前述熱活性觸媒以外,亦可使用藉由熱產生觸媒之物質(熱觸媒產生劑)或乾脆取而代之。前述光觸媒產生劑無特別限定,可舉如光鹼產生劑(藉由光照射產生鹼性觸媒之物質)、光酸產生劑(藉由光照射產生酸性觸媒之物質)等,以光鹼產生劑為宜。前述光鹼產生劑可舉例如9-蒽基甲基N,N-二乙基胺甲酸酯(9-anthrylmethyl N,N-diethylcarbamate,商品名WPBG-018),(E)-1-[3-(2-羥基苯基)-2-丙烯醯基]哌啶((E)-1-[3-(2-hydroxyphenyl)-2-propenoyl]piperidine,商品名WPBG-027),1-(蒽醌-2-基)乙基咪唑羧酸酯(1-(anthraquinon-2-yl)ethyl imidazolecarboxylate,商品名WPBG-140),2-硝基苯甲基-4-甲基丙醯氧基哌啶-1-羧酸酯(商品名WPBG-165),1,2-二異丙基-3-[雙(二甲基胺基)亞甲基鈲]2-(3-苯甲醯基苯基)丙酸鹽(商品名WPBG-266),1,2-二環己基4,4,5,5-四甲基二鈲正丁基三苯基硼酸鹽(商品名WPBG-300),及2-(9-側氧基二苯并哌喃(xanthene)-2-基)丙酸1,5,7-三氮雜雙環[4.4.0]癸-5-烯(東京化成工業股份有限公司),含4-哌啶甲醇之化合物(商品名HDPD-PB100:Heraeus公司製)等。又,前述含有「WPBG」之商品名皆為和光純藥工業股份有限公司之商品名。前述光酸產生劑可舉如芳香族鋶鹽(商品名SP-170:ADEKA公司)、三芳基鋶鹽(商品名CPI101A:San-Apro Ltd.)、芳香族錪鹽(商品名Irgacure250:Ciba Japan公司)等。此外,使前述微細孔粒子彼此行化學鍵結之觸媒不限於前述光活性觸媒及前述光觸媒產生劑,例如亦可為熱活性觸媒或熱觸媒產生劑。使前述微細孔粒子彼此行化學鍵結之觸媒可舉如氫氧化鉀、氫氧化鈉、氫氧化銨等鹼性觸媒,及鹽酸、乙酸、草酸等酸觸媒等。該等中以鹼性觸媒為宜。使前述微細孔粒子彼此行化學鍵結之觸媒或觸媒產生劑,譬如可在正要進行塗覆前才添加至含有前述粉碎物(微細孔粒子)之溶膠粒子液(例如懸浮液)中作使用,或可作成已將前述觸媒或觸媒產生劑混合至溶劑中之混合液來使用。前述混合液例如可為:直接添加溶解於前述溶膠粒子液的塗覆液、使前述觸媒或觸媒產生劑溶解於溶劑的溶液、或使前述觸媒或觸媒產生劑分散於溶劑的分散液。前述溶劑無特別限制,可列舉如水、緩衝液等。In the manner described above, a liquid (for example, a suspension) containing the fine pores (a pulverized product of a gel-like compound) can be prepared. In addition, by producing a liquid containing the fine pore particles or adding a catalyst for chemically bonding the fine pore particles to each other after the liquid containing the fine pore particles is produced, a containing liquid containing the fine pore particles and the catalyst can be manufactured. The addition amount of the catalyst is not particularly limited, and it is, for example, 0.01 to 20% by weight, 0.05 to 10% by weight, or 0.1 to 5% by weight with respect to the weight of the pulverized product of the gelled silicon compound. The catalyst may be, for example, a catalyst that promotes cross-linking and bonding between the fine pore particles. The chemical reaction for chemically bonding the aforementioned fine pore particles to each other is preferably a dehydration condensation reaction of a residual silanol group contained in the silica sol molecule. By using the aforementioned catalyst to promote the reaction between the hydroxyl groups of the silanol group, continuous film formation that hardens the void structure in a short time can be achieved. Examples of the catalyst include a photoactive catalyst and a thermally active catalyst. With the aforementioned photoactive catalyst, for example, the microporous particles can be chemically bonded (eg, cross-linked) to each other without heating in the step of forming the void layer. Thereby, for example, it is not easy to cause the entire shrinkage of the void layer in the void layer forming step, so that a high void ratio can be maintained. In addition to the catalyst, a catalyst-generating substance (catalyst generating agent) may be used or simply replaced. For example, in addition to the aforementioned photoactive catalyst, a substance that generates a catalyst by light (photocatalyst generating agent) may be used or simply replaced, and in addition to the aforementioned thermoactive catalyst, a substance that generates a catalyst by heat may also be used (Thermal catalyst generator) or simply replace it. The aforementioned photocatalyst generator is not particularly limited, and examples thereof include a photobase generator (a substance that generates an alkaline catalyst by light irradiation), a photoacid generator (a substance that generates an acidic catalyst by light irradiation), and the like. The generating agent is suitable. Examples of the aforementioned photobase generator include 9-anthrylmethyl N, N-diethylcarbamate (trade name WPBG-018), (E) -1- [3 -(2-hydroxyphenyl) -2-propenyl] piperidine ((E) -1- [3- (2-hydroxyphenyl) -2-propenoyl] piperidine, trade name WPBG-027), 1- (anthracene Quinone-2-yl) ethyl imidazole carboxylate (1- (anthraquinon-2-yl) ethyl imidazole carboxylate, trade name WPBG-140), 2-nitrobenzyl-4-methylpropanyloxypiperidine -1-carboxylic acid ester (trade name WPBG-165), 1,2-diisopropyl-3- [bis (dimethylamino) methylenefluorene] 2- (3-benzylidenephenyl) ) Propionate (trade name WPBG-266), 1,2-dicyclohexyl 4,4,5,5-tetramethyldifluorene n-butyltriphenylborate (trade name WPBG-300), and 2 -(9-oxo dibenzopiperan (xanthene) -2-yl) propanoic acid 1,5,7-triazabicyclo [4.4.0] dec-5-ene (Tokyo Chemical Industry Co., Ltd.) , A compound containing 4-piperidinemethanol (trade name HDPD-PB100: manufactured by Heraeus) and the like. In addition, the aforementioned product names containing "WPBG" are the product names of Wako Pure Chemical Industries, Ltd. Examples of the photoacid generator include an aromatic sulfonium salt (trade name SP-170: ADEKA), a triarylsulfonium salt (trade name CPI101A: San-Apro Ltd.), and an aromatic sulfonium salt (trade name Irgacure250: Ciba Japan). Company) and so on. In addition, the catalyst for chemically bonding the fine pore particles to each other is not limited to the photoactive catalyst and the photocatalyst generating agent, and may be, for example, a thermally active catalyst or a thermal catalyst generating agent. Examples of the catalyst for chemically bonding the fine pore particles to each other include basic catalysts such as potassium hydroxide, sodium hydroxide, and ammonium hydroxide, and acid catalysts such as hydrochloric acid, acetic acid, and oxalic acid. Of these, alkaline catalysts are preferred. The catalyst or catalyst generator for chemically bonding the fine pores to each other, for example, can be added to a sol particle liquid (such as a suspension) containing the pulverized material (fine pores) just before coating. It can be used, or it can be used as a mixed liquid in which the aforementioned catalyst or catalyst generator is mixed into a solvent. The mixed solution may be, for example, a dispersion in which a coating solution dissolved in the sol particle liquid is directly added, a solution in which the catalyst or catalyst generator is dissolved in a solvent, or the catalyst or catalyst generator is dispersed in a solvent. liquid. The solvent is not particularly limited, and examples thereof include water and a buffer solution.

[2-3.低折射率層之製造方法及導光板方式液晶顯示器用光學片材之製造方法] 以下將舉例說明本發明之低折射率層之製造方法及導光板方式液晶顯示器用光學片材之製造方法。以下主要針對前述本發明之低折射率層為藉由矽化合物所形成之聚矽氧多孔體的情況加以說明。但,本發明之低折射率層不限於聚矽氧多孔體。本發明之低折射率層為聚矽氧多孔體以外的情況時,在未特別說明之前提下可適用以下說明。[2-3. Manufacturing method of low refractive index layer and manufacturing method of optical sheet for light guide plate type liquid crystal display] Hereinafter, the manufacturing method of the low refractive index layer and optical sheet for light guiding plate type liquid crystal display of the present invention will be exemplified below. Of manufacturing method. Hereinafter, the case where the low-refractive index layer of the present invention is a polysilicon porous body formed of a silicon compound will be described below. However, the low-refractive index layer of the present invention is not limited to a polysilicon porous body. When the low-refractive index layer of the present invention is other than a polysiloxane porous body, the following explanations can be applied without mentioning otherwise.

本發明之低折射率層的製造方法譬如包含下列步驟:前驅物形成步驟,使用前述本發明之含凝膠粉碎物液體,來形成前述低折射率層之前驅物;及結合步驟,使前述前驅物中所含前述含凝膠粉碎物液體之前述粉碎物彼此行化學鍵結。前述前驅物譬如亦可稱作塗覆膜。The manufacturing method of the low-refractive index layer of the present invention includes, for example, the following steps: a precursor forming step, using the gel-containing pulverized substance-containing liquid of the present invention, to form the low-refractive index layer precursor; and a combining step to make the precursor The aforementioned pulverized material containing the aforementioned pulverized gel-containing liquid contained therein is chemically bonded to each other. The precursor may be referred to as a coating film, for example.

根據本發明之低折射率層的製造方法,譬如可形成能發揮與空氣層相同機能的多孔質結構。其理由推測如下,惟本發明不受此推測限制。以下舉例說明本發明之低折射率層為聚矽氧多孔體的情況。According to the method for producing a low-refractive index layer of the present invention, for example, a porous structure capable of exhibiting the same function as the air layer can be formed. The reason is speculated as follows, but the present invention is not limited by this speculation. The case where the low refractive index layer of the present invention is a polysilicon porous body is exemplified below.

前述聚矽氧多孔體之製造方法中使用的前述本發明之含凝膠粉碎物液體含有前述矽化合物凝膠之粉碎物,所以前述凝膠狀二氧化矽化合物之三維結構呈現分散為三維基本結構的狀態。因此,以前述聚矽氧多孔體之製造方法,譬如若使用前述含凝膠粉碎物液體來形成前述前驅物(譬如塗覆膜),則前述三維基本結構便會堆積而形成以前述三維基本結構為主體的空隙結構。亦即,利用前述聚矽氧多孔體之製造方法,可形成一種與前述矽化合物凝膠之三維結構截然不同且由前述三維基本結構之前述粉碎物形成的新型三維結構。又,在前述聚矽氧多孔體之製造方法中會進一步使前述粉碎物彼此行化學鍵結,所以前述新型三維結構可被固定化。因此,藉由前述聚矽氧多孔體之製造方法製得的前述聚矽氧多孔體雖為具有空隙之結構,仍舊可維持充分的強度及可撓性。藉由本發明製得之低折射率層(譬如聚矽氧多孔體),譬如可作為利用空隙之構件應用在廣泛領域之製品上,如絕熱材、吸音材、光學構件、印墨影像接收層等,此外也可製作已賦有各種機能的積層薄膜。The gel-containing pulverized material liquid of the present invention used in the aforementioned method for producing a porous polysiloxane contains the pulverized material of the silicon compound gel, so the three-dimensional structure of the gel-like silicon dioxide compound is dispersed into a three-dimensional basic structure. status. Therefore, in the method for manufacturing a polysilicone porous body, for example, if the precursor (such as a coating film) is formed by using the gel-containing pulverized material liquid, the three-dimensional basic structure is stacked to form the three-dimensional basic structure. The main void structure. That is, by using the method for manufacturing a polysilicon porous body described above, a new three-dimensional structure that is completely different from the three-dimensional structure of the silicon compound gel and is formed by the pulverized product of the three-dimensional basic structure can be formed. In addition, in the method for manufacturing a polysilicon porous body, the pulverized materials are further chemically bonded to each other, so the new three-dimensional structure can be fixed. Therefore, although the aforementioned polysiloxane porous body produced by the method for producing the aforementioned polysiloxane porous body has a structure having voids, it can still maintain sufficient strength and flexibility. The low-refractive index layer (such as a polysilicon porous body) prepared by the present invention can be used as a member using a gap in products in a wide range of fields, such as a heat-insulating material, a sound-absorbing material, an optical member, and a printing ink image receiving layer In addition, laminated films with various functions can also be produced.

本發明之低折射率層的製造方法在未特別記載之前提下,可援引前述本發明之含凝膠粉碎物液體的說明。The method for producing the low-refractive index layer of the present invention is mentioned before the special description, and the above description of the gel-containing pulverized liquid of the present invention can be cited.

在前述多孔體之前驅物的形成步驟中,譬如係將前述本發明之含凝膠粉碎物液體塗覆於前述基材上。本發明之含凝膠粉碎物液體譬如在塗覆於基材上並使前述塗覆膜乾燥後,藉由前述結合步驟使前述粉碎物彼此行化學鍵結(譬如交聯),可連續成膜具有一定程度以上之膜強度的低折射率層。In the step of forming the precursor of the porous body, for example, the gel-containing pulverized material-containing liquid of the present invention is applied to the substrate. The gel-containing pulverized material liquid of the present invention can be continuously formed into a film by, for example, coating the base material and drying the coating film, and then chemically bonding the pulverized materials to each other (for example, cross-linking) through the bonding step. Low-refractive-index layer with a certain degree of film strength.

前述含凝膠粉碎物液體於前述基材上之塗覆量並無特別限制,譬如可因應期望之前述本發明之低折射率層的厚度等適宜設定。就具體例而言,在形成厚度0.1~1000μm之前述聚矽氧多孔體時,前述含凝膠粉碎物液體於前述基材上之塗覆量在前述基材之每1m2 面積,譬如有前述粉碎物0.01~60000μg、0.1~6000μg、1~50μg。前述含凝膠粉碎物液體的理想塗覆量譬如與液體濃度或塗覆方式等有關,因此很難做單義定義,若考慮到生產性,宜盡量塗成薄層。塗佈量若太多,譬如溶劑在揮發前即在乾燥爐中乾燥的可能性會變高。藉此,奈米粉碎溶膠粒子在溶劑中沉降、堆積形成空隙結構之前,可能因溶劑乾燥而阻礙空隙形成,使空隙率大幅降低。另一方面,塗佈量一旦過薄,因基材之凹凸、親疏水性之參差等,產生塗覆收縮(cissing)的風險可能變高。The coating amount of the gel-containing pulverized material-containing liquid on the substrate is not particularly limited. For example, it can be appropriately set according to the desired thickness of the low-refractive index layer of the present invention. As a specific example, when forming the aforementioned polysilica porous body having a thickness of 0.1 to 1000 μm, the coating amount of the gel-containing pulverized material liquid on the substrate is per 1 m 2 of the area of the substrate. The crushed material is 0.01 to 60,000 μg, 0.1 to 6000 μg, and 1 to 50 μg. The ideal coating amount of the gel-containing pulverized material liquid is related to, for example, the liquid concentration or the coating method, so it is difficult to make a single definition. If productivity is taken into consideration, it should be coated as thin as possible. If the coating amount is too large, for example, the possibility that the solvent is dried in a drying furnace before the solvent is volatilized becomes high. Thereby, before the nano-pulverized sol particles are settled in the solvent and deposited to form a void structure, the drying of the solvent may hinder the formation of voids, thereby greatly reducing the void ratio. On the other hand, if the coating amount is too thin, the risk of coating shrinkage (cissing) may increase due to unevenness of the substrate, variations in hydrophilicity, and the like.

於前述基材上塗覆前述含凝膠粉碎物液體後,亦可對前述多孔體之前驅物(塗覆膜)施行乾燥處理。藉由前述乾燥處理,目的不僅在於去除前述多孔體之前驅物中的前述溶劑(前述含凝膠粉碎物液體中所含溶劑),還有在乾燥處理中使溶膠粒子沉降、堆積而形成空隙結構。前述乾燥處理之溫度例如為50~250℃、60~150℃、70~130℃,前述乾燥處理之時間則例如為0.1~30分鐘、0.2~10分鐘、0.3~3分鐘。關於乾燥處理溫度及時間,例如在顯現連續生產性或高空隙率的相關性來看,以低溫且短時間較佳。條件若過度嚴苛,例如在基材為樹脂薄膜的情況下,接近前述基材之玻璃轉移溫度時,前述基材會在乾燥爐中伸展而可能於剛塗覆後就在已形成的空隙結構產生裂痕等缺點。另一方面,條件若太過寬鬆,例如因為在離開乾燥爐的時間點含有殘留溶劑,所以在下一步驟中與輥件摩擦時可能發生混入刮傷等外觀上的不良情況。After the gel-containing pulverized material-containing liquid is coated on the substrate, the porous body precursor (coating film) may be dried. The purpose of the drying process is not only to remove the solvent (the solvent contained in the gel-containing pulverized substance-containing liquid) in the porous body precursor, but also to settle and accumulate sol particles to form a void structure during the drying process. . The temperature of the drying process is, for example, 50 to 250 ° C, 60 to 150 ° C, or 70 to 130 ° C. The time of the drying process is, for example, 0.1 to 30 minutes, 0.2 to 10 minutes, or 0.3 to 3 minutes. Regarding the drying process temperature and time, for example, in view of the correlation between continuous productivity and high porosity, a low temperature and a short time are preferred. If the conditions are too severe, for example, when the substrate is a resin film, when the glass transition temperature of the substrate is near, the substrate will stretch in a drying furnace and may form a void structure immediately after coating. Defects such as cracks. On the other hand, if the conditions are too loose, for example, because the residual solvent is contained at the time of leaving the drying furnace, there may be appearance defects such as scratches when rubbing against the roller in the next step.

前述乾燥處理例如可為自然乾燥,可為加熱乾燥,亦可為減壓乾燥。前述乾燥方法無特別限制,例如可使用一般的加熱機構。前述加熱機構可舉如熱風器、加熱輥、遠紅外線加熱器等。其中,在工業上連續生產的前提下,宜使用加熱乾燥。又,關於可使用的溶劑,當目的為抑制乾燥時隨溶劑揮發而產生的收縮應力以及隨之而來的低折射率層(前述聚矽氧多孔體)之裂痕現象時,以表面張力低的溶劑為佳。前述溶劑可舉如以異丙醇(IPA)為代表之低級醇、己烷、全氟己烷等,惟不限於該等。The drying treatment may be, for example, natural drying, heating drying, or drying under reduced pressure. The drying method is not particularly limited, and for example, a general heating mechanism can be used. Examples of the heating means include a hot air heater, a heating roller, and a far-infrared heater. Among them, under the premise of continuous industrial production, heating and drying should be used. In addition, regarding the usable solvents, when the purpose is to suppress the shrinkage stress caused by the solvent volatilization during drying and the subsequent cracking phenomenon of the low refractive index layer (the aforementioned polysiloxane porous body), the solvent having a low surface tension is used. Solvents are preferred. Examples of the aforementioned solvent include lower alcohols such as isopropyl alcohol (IPA), hexane, and perfluorohexane, but are not limited thereto.

前述基材無特別限制,譬如適宜使用:熱可塑性樹脂製基材、玻璃製基材、以矽為代表的無機基板、以熱硬化性樹脂等成形的塑膠、半導體等元件、以奈米碳管為代表的碳纖維系材料等,惟不限於該等。前述基材之形態可舉如薄膜、薄板等。前述熱可塑性樹脂可舉如聚對苯二甲酸乙二酯(PET)、丙烯酸、乙酸丙酸纖維素(CAP)、環烯烴聚合物(COP)、三乙酸酯(TAC)、聚萘二甲酸乙二酯(PEN)、聚乙烯(PE)、聚丙烯(PP)等。The substrate is not particularly limited. For example, it is suitable to use a substrate made of a thermoplastic resin, a substrate made of glass, an inorganic substrate typified by silicon, a plastic such as a thermosetting resin, a semiconductor, and a carbon nanotube. The representative carbon fiber materials and the like are not limited thereto. The form of the aforementioned substrate may be a film, a sheet, or the like. Examples of the thermoplastic resin include polyethylene terephthalate (PET), acrylic acid, cellulose acetate propionate (CAP), cycloolefin polymer (COP), triacetate (TAC), and polynaphthalene dicarboxylic acid. Ethylene glycol (PEN), polyethylene (PE), polypropylene (PP), etc.

在本發明之低折射率層的製造方法中,前述結合步驟係使前述多孔體之前驅物(塗覆膜)中所含前述粉碎物彼此行化學鍵結的步驟。藉由前述結合步驟,譬如可使前述多孔體之前驅物的前述粉碎物之三維結構被固定化。利用習知之燒結進行固定化時,例如係以施行200℃以上之高溫處理來激發矽烷醇基之脫水縮合,形成矽氧烷鍵結。在本發明之前述結合步驟中,藉由使催化上述脫水縮合反應之各種添加劑進行反應,譬如當基材為樹脂薄膜時,得以不損及前述基材,並可在100℃前後之較低的乾燥溫度及僅數分鐘的短暫處理時間下,連續形成空隙結構並進行固定化。In the method for manufacturing a low-refractive index layer according to the present invention, the bonding step is a step of chemically bonding the pulverized materials contained in the precursor (coating film) of the porous body to each other. By the aforementioned bonding step, for example, the three-dimensional structure of the pulverized material of the precursor of the porous body can be fixed. When the conventional sintering is used for immobilization, for example, the dehydration condensation of the silanol group is excited by performing a high temperature treatment of 200 ° C or higher to form a siloxane bond. In the foregoing combining step of the present invention, various additives that catalyze the above-mentioned dehydration condensation reaction are reacted, for example, when the substrate is a resin film, the aforementioned substrate is not damaged, and the temperature can be lowered around 100 ° C. At the drying temperature and a short processing time of only a few minutes, a void structure is continuously formed and fixed.

前述行化學鍵結之方法並無特別限制,譬如可因應前述凝膠(譬如矽化合物凝膠)之種類適宜決定。就具體例來說,前述化學鍵結例如可藉由前述粉碎物彼此之化學交聯鍵結來進行,其他亦可考慮像是將氧化鈦等無機粒子等添加於前述粉碎物,使前述無機粒子與前述粉碎物行化學交聯鍵結。另外,也有載持酵素等生物觸媒之情況,或是使有別於觸媒活性點之其他部位與前述粉碎物進行化學交聯鍵結。因此,本發明不僅只譬如以前述溶膠粒子彼此形成之低折射率層,也可擴展應用於有機無機混成低折射率層、主客(host-guest)低折射率層等,惟不限於該等。The method for performing the chemical bonding is not particularly limited. For example, it can be appropriately determined according to the type of the gel (such as a silicon compound gel). As a specific example, the chemical bonding can be performed, for example, by chemical cross-linking of the pulverized materials with each other, and other considerations such as adding inorganic particles such as titanium oxide to the pulverized materials can make the inorganic particles and The pulverized material is chemically cross-linked. In addition, there is a case where a biocatalyst such as an enzyme is carried, or other parts different from the active sites of the catalyst are chemically cross-linked with the crushed material. Therefore, the present invention is not only limited to the low-refractive index layer formed by the aforementioned sol particles, but can also be extended to apply to organic-inorganic mixed low-refractive index layers, host-guest low-refractive index layers, etc.

前述結合步驟譬如可因應前述凝膠(譬如矽化合物凝膠)之粉碎物的種類,藉由觸媒存在下之化學反應進行。本發明之化學反應宜利用前述矽化合物凝膠之粉碎物中所含殘留矽烷醇基的脫水縮合反應。藉前述觸媒促進矽烷醇基之羥基彼此的反應,可做到在短時間內使空隙結構硬化的連續成膜。前述觸媒可舉如氫氧化鉀、氫氧化鈉、氫氧化銨等鹼性觸媒及鹽酸、乙酸、草酸等酸觸媒等,惟不限於該等。前述脫水縮合反應之觸媒以鹼性觸媒尤佳。又,亦適合使用利用照射光(譬如紫外線)來顯現觸媒活性之光酸產生觸媒或光鹼產生觸媒等。光酸產生觸媒及光鹼產生觸媒無特別限定,譬如同前述。前述觸媒如同前述,宜於正要進行塗覆前才添加於含有前述粉碎物之溶膠粒子液中作使用,或宜作成已使前述觸媒混合於溶劑中之混合液來使用。前述混合液例如可為:直接添加溶解於前述溶膠粒子液的塗覆液、使前述觸媒溶解於溶劑的溶液、或使前述觸媒分散於溶劑的分散液。前述溶劑無特別限制,如前述,可列舉如水、緩衝液等。The aforementioned bonding step can be performed, for example, by a chemical reaction in the presence of a catalyst in accordance with the type of the pulverized material of the aforementioned gel (such as a silicon compound gel). The chemical reaction of the present invention is preferably a dehydration condensation reaction of a residual silanol group contained in the pulverized material of the aforementioned silicon compound gel. By using the aforementioned catalyst to promote the reaction between the hydroxyl groups of the silanol group, continuous film formation that hardens the void structure in a short time can be achieved. The aforementioned catalysts include, but are not limited to, alkaline catalysts such as potassium hydroxide, sodium hydroxide, and ammonium hydroxide, and acid catalysts such as hydrochloric acid, acetic acid, and oxalic acid. The catalyst for the aforementioned dehydration condensation reaction is particularly preferably a basic catalyst. It is also suitable to use a photoacid-generating catalyst or a photobase-generating catalyst that exhibits catalytic activity by irradiating light (for example, ultraviolet rays). The photoacid-generating catalyst and the photobase-generating catalyst are not particularly limited, as described above. The catalyst is the same as described above, and it is suitable to be added to the sol particle liquid containing the pulverized material just before coating, or it may be used as a mixed liquid in which the catalyst is mixed in a solvent. The mixed solution may be, for example, a coating solution dissolved in the sol particle liquid, a solution in which the catalyst is dissolved in a solvent, or a dispersion in which the catalyst is dispersed in a solvent. The solvent is not particularly limited, and examples thereof include water and a buffer solution.

又,譬如亦可於本發明之含凝膠液體中進一步添加用以使前述凝膠之粉碎物彼此間接結合的交聯輔助劑。該交聯輔助劑會介入粒子(前述粉碎物)彼此之間,使粒子與交聯輔助劑各自相互作用或結合,讓距離上略為分開的粒子彼此也得以鍵結,進而可有效率地提高強度。前述交聯輔助劑以多交聯矽烷單體為佳。前述多交聯矽烷單體具體上具有例如2以上且3以下之烷氧矽基,且烷氧矽基間之鏈長可為碳數1以上且10以下,並可含有碳以外之元素。前述交聯輔助劑可舉如:雙(三甲氧矽基)乙烷、雙(三乙氧矽基)乙烷、雙(三甲氧矽基)甲烷、雙(三乙氧矽基)甲烷、雙(三乙氧矽基)丙烷、雙(三甲氧矽基)丙烷、雙(三乙氧矽基)丁烷、雙(三甲氧矽基)丁烷、雙(三乙氧矽基)戊烷、雙(三甲氧矽基)戊烷、雙(三乙氧矽基)己烷、雙(三甲氧矽基)己烷、雙(三甲氧矽基)-N-丁基-N-丙基-乙烷-1,2-二胺、參-(3-三甲氧矽基丙基)三聚異氰酸酯、參-(3-三乙氧矽基丙基)三聚異氰酸酯等。該交聯輔助劑之添加量並無特別限定,譬如相對於前述矽化合物之粉碎物重量為0.01~20重量%、0.05~15重量%或0.1~10重量%。Further, for example, a cross-linking assistant may be further added to the gel-containing liquid of the present invention to indirectly bond the pulverized matter of the gel. The cross-linking auxiliary agent intervenes between the particles (the above-mentioned pulverized material), so that the particles and the cross-linking auxiliary agent interact or combine with each other, so that the particles that are slightly separated from each other can also be bonded to each other, which can effectively improve the strength . The crosslinking assistant is preferably a polycrosslinking silane monomer. The polycrosslinked silane monomer specifically has, for example, an alkoxysilyl group of 2 or more and 3 or less, and the chain length between the alkoxysilyl groups may be 1 or more and 10 or less, and may contain elements other than carbon. The aforementioned cross-linking assistants can be exemplified by: bis (trimethoxysilyl) ethane, bis (triethoxysilyl) ethane, bis (trimethoxysilyl) methane, bis (triethoxysilyl) methane, bis (Triethoxysilyl) propane, bis (trimethoxysilyl) propane, bis (triethoxysilyl) butane, bis (trimethoxysilyl) butane, bis (triethoxysilyl) pentane, Bis (trimethoxysilyl) pentane, bis (triethoxysilyl) hexane, bis (trimethoxysilyl) hexane, bis (trimethoxysilyl) -N-butyl-N-propyl-ethyl Alkane-1,2-diamine, ginseng- (3-trimethoxysilylpropyl) trimeric isocyanate, ginseng- (3-triethoxysilylpropyl) trimeric isocyanate, and the like. The addition amount of the cross-linking auxiliary is not particularly limited, and for example, it is 0.01 to 20% by weight, 0.05 to 15% by weight, or 0.1 to 10% by weight with respect to the weight of the pulverized product of the silicon compound.

前述觸媒存在下之化學反應譬如可藉由下列方式進行:對含有事先添加至前述含凝膠粉碎物液體中之前述觸媒或觸媒產生劑的前述塗覆膜進行光照射或加熱;或是對前述塗覆膜噴附前述觸媒後進行光照射或加熱;又或是噴附前述觸媒或觸媒產生劑後進行光照射或加熱。譬如當前述觸媒為光活性觸媒時,可藉由光照射使前述微細孔粒子彼此行化學鍵結,而形成前述聚矽氧多孔體。又,當前述觸媒為熱活性觸媒,可藉由加熱使前述微細孔粒子彼此行化學鍵結,而形成前述聚矽氧多孔體。前述光照射之光照射量(能量)並無特別限定,在@360nm換算下譬如為200~800mJ/cm2 、250~600mJ/cm2 或300~400mJ/cm2 。若從為了防止因照射量不足使利用觸媒產生劑之光吸收的分解無法進展而效果不彰的觀點來看,以200mJ/cm2 以上之累積光量為佳。又,基於防止低折射率層下之基材受損傷產生熱皺痕的觀點,以800mJ/cm2 以下之累積光量為宜。前述光照射的光波長並無特別限定,譬如為200~500nm、300~450nm。前述光照射的光照射時間並無特別限定,譬如為0.1~30分鐘、0.2~10分鐘、0.3~3分鐘。前述加熱處理之條件無特別限制,前述加熱溫度例如為50~250℃、60~150℃、70~130℃,前述加熱時間則例如為0.1~30分鐘、0.2~10分鐘、0.3~3分鐘。此外,關於可使用的溶劑,例如當目的為抑制乾燥時隨溶劑揮發而產生的收縮應力及隨之而來的低折射率層之裂痕現象時,以低表面張力的溶劑為佳。可舉如以異丙醇(IPA)為代表的低級醇、己烷、全氟己烷等,惟不限於該等。The chemical reaction in the presence of the catalyst can be performed, for example, by: irradiating or heating the coating film containing the catalyst or catalyst generator previously added to the gel-containing pulverized material liquid; or Light irradiation or heating is performed after spraying the catalyst onto the coating film; or light irradiation or heating is performed after spraying the catalyst or catalyst generator. For example, when the catalyst is a photoactive catalyst, the microporous particles can be chemically bonded to each other by light irradiation to form the polysilica porous body. When the catalyst is a thermally active catalyst, the microporous particles can be chemically bonded to each other by heating to form the polysilica porous body. The light irradiation amount (energy) of the light irradiation is not particularly limited, and is, for example, 200 to 800 mJ / cm 2 , 250 to 600 mJ / cm 2, or 300 to 400 mJ / cm 2 in terms of @ 360nm. From the standpoint of preventing the effect of degradation of light absorption by the catalyst generator from progressing due to insufficient irradiation amount, the cumulative light amount of 200 mJ / cm 2 or more is preferred. In addition, from the viewpoint of preventing damage to the base material under the low-refractive index layer from generating thermal wrinkles, it is preferable to use a cumulative light amount of 800 mJ / cm 2 or less. The wavelength of the light irradiated by the light is not particularly limited, and is, for example, 200 to 500 nm and 300 to 450 nm. The light irradiation time of the light irradiation is not particularly limited, and is, for example, 0.1 to 30 minutes, 0.2 to 10 minutes, and 0.3 to 3 minutes. The conditions for the heat treatment are not particularly limited. The heating temperature is, for example, 50 to 250 ° C., 60 to 150 ° C., or 70 to 130 ° C., and the heating time is, for example, 0.1 to 30 minutes, 0.2 to 10 minutes, or 0.3 to 3 minutes. In addition, the usable solvent is, for example, a solvent having a low surface tension when the purpose is to suppress shrinkage stress caused by solvent volatilization during drying and subsequent cracking of the low refractive index layer. Examples include, but are not limited to, lower alcohols such as isopropyl alcohol (IPA), hexane, and perfluorohexane.

以上述方式可製造本發明之低折射率層(譬如聚矽氧多孔體)。惟,本發明之低折射率層的製造方法不限於上述。另,為聚矽氧多孔體之本發明之低折射率層以下有時會稱作「本發明之聚矽氧多孔體」。The low-refractive index layer (for example, a polysilicon porous body) of the present invention can be manufactured in the above-mentioned manner. However, the manufacturing method of the low refractive index layer of the present invention is not limited to the above. The low-refractive index layer of the present invention which is a polysilicon porous body may be hereinafter referred to as a "polysilicon porous body of the present invention".

又,如同前述,在本發明之導光板方式液晶顯示器用光學片材的製造中,亦可於本發明之低折射率層上進一步形成黏接著層(黏接著層形成步驟)。具體上,例如可於本發明之低折射率層上塗佈(塗覆)黏著劑或接著劑來形成前述黏接著層。或是,亦可將基材上積層有前述黏接著層之黏著膠帶等的前述黏接著層側貼合到本發明之低折射率層上,藉此於本發明之低折射率層上形成前述黏接著層。此時,前述黏著膠帶等之基材可維持在直接貼合之狀態,亦可自前述黏接著層剝離。尤其,如同前述,藉由從前述低折射率剝離基材做成無基材(不具基材),可大幅減低厚度,抑制器件等的厚度增加。本發明中,「黏著劑」及「黏著層」係指以被黏體之再剝離為前提的溶劑或層。在本發明中,「接著劑」及「接著層」係指不以被黏體之再剝離為前提之溶劑或層。惟,本發明中「黏著劑」及「接著劑」並非可明確區別者,「黏著層」及「接著層」亦非可明確區別者。在本發明中,形成前述黏接著層之黏著劑或接著劑無特別限定,譬如可使用一般的黏著劑或接著劑等。前述黏著劑或接著劑可舉如丙烯酸系、乙烯醇系、聚矽氧系、聚酯系、聚胺甲酸乙酯系、聚醚系等聚合物製接著劑及橡膠系接著劑等。此外,亦可列舉由戊二醛、三聚氰胺、草酸等乙烯醇系聚合物之水溶性交聯劑等構成的接著劑等。該等黏著劑及接著劑可僅使用1種亦可將複數種類併用(例如混合、積層等)。如同前述,藉由前述黏接著層可保護前述低折射率層免受物理性的損傷(尤其是擦傷)。又,前述黏接著層宜為即使作為不具基材(無基材)的導光板方式液晶顯示器用光學片材,也是耐壓性佳不致壓碎前述低折射率層之物,不過並無特別限定。又,前述黏接著層之厚度無特別限制,例如為0.1~100μm、5~50μm、10~30μm或12~25μm。As described above, in the production of the optical sheet for a light guide plate type liquid crystal display of the present invention, an adhesive layer may be further formed on the low refractive index layer of the present invention (adhesive layer forming step). Specifically, for example, an adhesive or an adhesive may be applied (coated) on the low refractive index layer of the present invention to form the aforementioned adhesive layer. Alternatively, the side of the adhesive layer such as an adhesive tape laminated with the aforementioned adhesive layer on the substrate may be laminated to the low refractive index layer of the present invention, thereby forming the aforementioned on the low refractive index layer of the present invention. Adhesive layer. At this time, the substrate such as the aforementioned adhesive tape may be maintained in a state of being directly bonded, or may be peeled from the aforementioned adhesive layer. In particular, as described above, by making the base material without a base material (without a base material) by peeling the base material from the low refractive index, the thickness can be significantly reduced, and the increase in thickness of devices and the like can be suppressed. In the present invention, the "adhesive" and "adhesive layer" refer to a solvent or layer premised on the re-peeling of the adherend. In the present invention, the "adhesive" and "adhesive layer" refer to a solvent or a layer that is not premised on the re-peeling of the adherend. However, in the present invention, "adhesive" and "adhesive" are not clearly distinguishable, and "adhesive layer" and "adhesive layer" are not clearly distinguishable. In the present invention, the adhesive or the adhesive forming the adhesive layer is not particularly limited, and for example, a general adhesive or an adhesive can be used. Examples of the adhesive or adhesive include polymer-based adhesives such as acrylic, vinyl alcohol-based, polysiloxane-based, polyester-based, polyurethane-based, and polyether-based adhesives, and rubber-based adhesives. Moreover, the adhesive agent which consists of water-soluble crosslinking agents, such as a vinyl alcohol polymer, such as glutaraldehyde, melamine, and oxalic acid, etc. are mentioned. These adhesives and adhesives may be used singly or in combination (for example, mixing, laminating, etc.). As described above, the low-refractive index layer can be protected from physical damage (especially abrasion) by the adhesive layer. The adhesive layer is preferably an optical sheet for a light guide plate type liquid crystal display without a substrate (without a substrate), which is excellent in pressure resistance and will not crush the low refractive index layer, but it is not particularly limited. . The thickness of the adhesive layer is not particularly limited, and is, for example, 0.1 to 100 μm, 5 to 50 μm, 10 to 30 μm, or 12 to 25 μm.

以上述方式製得之本發明之低折射率層亦可進一步將前述第1光學薄膜及前述第2光學薄膜積層,來製造本發明之導光板方式液晶顯示器用光學片材。此時,前述低折射率層、前述第1光學薄膜及前述第2光學薄膜譬如如同前述,亦可隔著前述黏接著層(黏著劑或接著劑)而積層。The low-refractive index layer of the present invention obtained as described above can further be laminated with the first optical film and the second optical film to produce an optical sheet for a light guide plate type liquid crystal display of the present invention. In this case, the low refractive index layer, the first optical film, and the second optical film may be laminated, for example, as described above, with the adhesive layer (adhesive or adhesive) interposed therebetween.

基於效率,本發明之導光板方式液晶顯示器用光學片材的前述各構成要素之積層,例如可藉由使用長條薄膜的連續處理(所謂的捲對捲(Roll to Roll)等)進行積層,當基材為成形物、元件等時,亦可將經過分批處理者予以積層。Based on the efficiency, the above-mentioned constituent elements of the optical sheet for a light guide plate type liquid crystal display of the present invention can be laminated by, for example, continuous processing using a long film (so-called roll to roll, etc.), When the base material is a molded article, an element, or the like, it may be laminated after being subjected to batch processing.

以下針對使用轉印用樹脂薄膜基材(以下有時會僅稱作「基材」)來製造本發明之低折射率層及導光板方式液晶顯示器用光學片材的方法,以圖3~5舉例說明。另,所圖示之製造方法僅為一例,不受限於該等。The following is a method for manufacturing a low-refractive index layer and a light guide plate-type optical sheet for a liquid crystal display of the present invention using a resin film substrate for transfer (hereinafter sometimes referred to simply as a "substrate"). for example. In addition, the manufacturing method shown is an example, and it is not limited to these.

於圖3之截面圖示意顯示使用前述基材來製造本發明之低折射率層及導光板方式液晶顯示器用光學片材的步驟一例。圖3中,前述低折射率層之形成方法包含下列步驟:塗覆步驟(1),於基材10上塗覆前述本發明之含凝膠粉碎物液體20'';塗覆膜形成步驟(乾燥步驟)(2),使含凝膠粉碎物液體20''乾燥而形成塗覆膜20’,該塗覆膜20’為前述低折射率層之前驅層;及化學處理步驟(譬如交聯處理步驟)(3),對塗覆膜20'進行化學處理(譬如交聯處理)而形成低折射率層20。如此一來,即可如圖示使用基材10形成低折射率層20。另,前述低折射率層之形成方法可適宜包含前述步驟(1)~(3)以外之步驟,未含亦無大礙。此外,如圖示,藉由進行下列步驟,可製造含有積層體的導光板方式液晶顯示器用光學片材,且該積層體於低折射率層20之單面或兩面直接積層有黏接著層30:黏接著層塗覆步驟(4),於低折射率層20之與基材10相反側的面上塗覆黏接著層30;被覆步驟(5),以光學薄膜40被覆黏接著層30;剝離步驟(6),從低折射率層20剝離去除基材10;黏接著層塗覆步驟(7),於低折射率層20之已剝離基材10之側的面上塗覆其他的黏接著層30;及被覆步驟(8),以其他的光學薄膜40被覆前述其他的黏接著層30。兩個光學薄膜40可視為其任一者相當於前述第1光學薄膜,另一者相當於前述第2光學薄膜。又,接著(黏著)有前述第1光學薄膜與低折射率層20的黏接著層30可視為前述第1黏接著層。接著(黏著)有前述第2光學薄膜與低折射率層20的黏接著層30可視為前述第2黏接著層。另,在圖3中係顯示出將黏接著層塗覆步驟(4)及被覆步驟(5)個別進行之方法,不過,亦可將預先賦予有光學薄膜40之黏接著層30(譬如光學薄膜40及黏接著層30成為一體之黏著膠帶)貼附至低折射率層20上,藉以同時進行黏接著層塗覆步驟(4)及被覆步驟(5)。關於黏接著層塗覆步驟(7)及被覆步驟(8)亦同。另,前述導光板方式液晶顯示器用光學片材之形成方法亦可適宜包含前述步驟(1)~(8)以外的步驟,未含亦無大礙。又譬如在圖3中,亦可貼附分離件來替代光學薄膜40,保護黏接著層30。譬如,亦可將保護黏接著層30的前述分離件予以剝離後,於黏接著層30貼附前述第1光學薄膜或前述第2光學薄膜,來製造本發明之導光板方式液晶顯示器用光學片材。又譬如在圖3中,亦可不用基材10,且不在基材10上而是於第1光學薄膜或第2光學薄膜40上直接進行前述步驟(1)~(3),形成前述低折射率層。此時,換掉基材10所用的光學薄膜40與低折射率層20會變成未隔著黏接著層30而直接積層。An example of the process of manufacturing the low-refractive-index layer of this invention and the optical sheet for light-guide-plate-type liquid crystal displays of this invention using the said base material is shown in the sectional view of FIG. In FIG. 3, the method for forming the aforementioned low refractive index layer includes the following steps: a coating step (1), applying the aforementioned gel-containing pulverized material liquid 20 '' of the present invention on a substrate 10; a coating film forming step (drying) Step) (2), drying the gel-containing pulverized material liquid 20 "to form a coating film 20 ', which is a precursor layer of the aforementioned low refractive index layer; and a chemical treatment step (such as a crosslinking treatment) Step) (3): The coating film 20 'is subjected to a chemical treatment (such as a cross-linking treatment) to form a low-refractive index layer 20. In this way, the low refractive index layer 20 can be formed using the substrate 10 as shown in the figure. In addition, the method for forming the low-refractive index layer may suitably include steps other than the steps (1) to (3) described above, and it is not necessary to have any problem. In addition, as shown in the figure, an optical sheet for a light guide plate type liquid crystal display including a laminated body can be manufactured by performing the following steps, and the laminated body is directly laminated with the adhesive layer 30 on one or both sides of the low refractive index layer 20 : Adhesive layer coating step (4), coating the adhesive layer 30 on the surface of the low refractive index layer 20 opposite to the substrate 10; coating step (5), coating the adhesive layer 30 with an optical film 40; peeling Step (6), peeling and removing the substrate 10 from the low-refractive index layer 20; and adhesive layer coating step (7), applying another adhesive layer on the surface of the low-refractive index layer 20 on the side of the peeled substrate 10 30; and a covering step (8), covering the other adhesive layer 30 with another optical film 40. The two optical films 40 can be regarded as either one corresponding to the first optical film and the other corresponding to the second optical film. The adhesive layer 30 having the first optical film and the low-refractive index layer 20 adhered (adhered) can be regarded as the first adhesive layer. Next (adhesive) the adhesive layer 30 having the second optical film and the low refractive index layer 20 can be regarded as the second adhesive layer. In addition, FIG. 3 shows a method of separately performing the adhesive layer coating step (4) and the covering step (5). However, an adhesive film 30 (such as an optical film) previously provided with an optical film 40 may be used. 40 and the adhesive layer 30 as an integrated adhesive tape) are attached to the low refractive index layer 20, thereby performing the adhesive layer coating step (4) and the covering step (5) simultaneously. The same applies to the adhesive layer coating step (7) and the covering step (8). In addition, the method for forming an optical sheet for a light guide plate-type liquid crystal display may suitably include steps other than the steps (1) to (8), and it is not necessary to include them. For another example, in FIG. 3, a separating member may be attached to replace the optical film 40 to protect the adhesive layer 30. For example, the first optical film or the second optical film may be attached to the adhesive layer 30 after the separation member of the protective adhesive layer 30 is peeled off to manufacture the optical sheet for a light guide plate type liquid crystal display of the present invention. material. For another example, in FIG. 3, the aforementioned steps (1) to (3) may be performed directly on the first optical film or the second optical film 40 without using the substrate 10 and not on the substrate 10, so as to form the aforementioned low refractive index. Rate layer. At this time, the optical film 40 and the low-refractive index layer 20 used for the substrate 10 are replaced without being laminated with the adhesive layer 30 interposed therebetween.

在前述塗覆步驟(1)中,含凝膠粉碎物液體20''之塗覆方法並無特別限定,可採用一般的塗覆方法。前述塗覆方法可舉如狹縫式模塗(slot die)法、反向凹版塗佈(reverse gravure coat)法、微凹版(micro gravure)法(微凹版塗佈(micro gravure coat)法)、浸漬法(浸漬塗佈法)、旋塗法、刷塗法、輥塗法、柔版印刷法、線棒塗佈法、噴塗法、擠壓塗佈法、淋幕式塗佈法、反向塗佈法等。該等中,基於生產性、塗膜之平滑性等觀點,以擠壓塗佈法、淋幕式塗佈法、輥塗法、微凹版塗佈法等為佳。含凝膠粉碎物液體20''之塗覆量並無特別限定,譬如可以使多孔質結構(低折射率層)20成為適當厚度的方式來適宜設定。多孔質結構(低折射率層)20之厚度無特別限定,如同前述。In the aforementioned coating step (1), the coating method for the gel-containing pulverized liquid 20 "is not particularly limited, and a general coating method can be adopted. The aforementioned coating method may be, for example, a slot die method, a reverse gravure coat method, a micro gravure method (micro gravure coat method), Dipping method (dip coating method), spin coating method, brush coating method, roll coating method, flexographic printing method, wire rod coating method, spray coating method, extrusion coating method, curtain coating method, reverse Coating method, etc. Among these, from the viewpoints of productivity and smoothness of the coating film, an extrusion coating method, a curtain coating method, a roll coating method, a micro gravure coating method, and the like are preferred. The coating amount of the gel-pulverized material-containing liquid 20 "is not particularly limited, and it can be appropriately set such that the porous structure (low-refractive index layer) 20 can have an appropriate thickness. The thickness of the porous structure (low refractive index layer) 20 is not particularly limited, as described above.

在前述乾燥步驟(2)中,使含凝膠粉碎物液體20''乾燥(即,去除含凝膠粉碎物液體20''中所含分散媒)而形成塗覆膜(前驅層)20'。乾燥處理之條件無特別限定,如同前述。In the aforementioned drying step (2), the gel-containing pulverized material-containing liquid 20 ″ is dried (that is, the dispersion medium contained in the gel-containing pulverized material-containing liquid 20 ″ is removed) to form a coating film (precursor layer) 20 ′. . The conditions for the drying treatment are not particularly limited, as described above.

此外,在前述化學處理步驟(3)中,對含有塗覆前已添加之前述觸媒(譬如光活性觸媒、光觸媒產生劑、熱活性觸媒或熱觸媒產生劑)的塗覆膜20'進行光照射或加熱,使塗覆膜(前驅物)20'中之前述粉碎物彼此行化學鍵結(譬如使該等交聯)而形成低折射率層20。前述化學處理步驟(3)中之光照射或加熱條件無特別限定,如前述。In addition, in the aforementioned chemical processing step (3), the coating film 20 containing the aforementioned catalyst (such as a photoactive catalyst, a photocatalyst generating agent, a thermally active catalyst, or a thermal catalyst generating agent) added before coating is applied. 'Light irradiation or heating is performed so that the above-mentioned pulverized materials in the coating film (precursor) 20' are chemically bonded to each other (for example, such cross-linking) to form the low refractive index layer 20. The light irradiation or heating conditions in the aforementioned chemical processing step (3) are not particularly limited, as described above.

接著,於圖4示意顯示狹縫模塗法之塗覆裝置及使用其之前述低折射率層之形成方法的一例。另外,圖4為截面圖,但為了便於觀看,省略了影線。Next, FIG. 4 schematically shows an example of a coating device of a slit die coating method and a method of forming the aforementioned low refractive index layer using the coating device. In addition, FIG. 4 is a cross-sectional view, but hatching is omitted for easy viewing.

如圖示,使用該裝置之方法的各步驟係藉由輥件將基材10朝一方向搬送的同時一邊進行。搬送速度無特別限定,例如為1~100m/分鐘、3~50m/分鐘、5~30m/分鐘。As shown in the figure, each step of the method using the apparatus is performed while conveying the substrate 10 in one direction by a roller. The conveying speed is not particularly limited, and is, for example, 1 to 100 m / minute, 3 to 50 m / minute, or 5 to 30 m / minute.

首先,從送出輥101輸出基材10並同時搬運,在塗覆輥102進行於基材塗覆本發明之含凝膠粉碎物液體20''的塗覆步驟(1)後,接著在烘箱區110內過渡到乾燥步驟(2)。在圖4之塗覆裝置中,於塗覆步驟(1)後進入乾燥步驟(2)前,先進行預乾燥步驟。預乾燥步驟無須加熱,可在室溫下進行。在乾燥步驟(2)中係使用加熱機構111。加熱機構111如同前述,可適宜使用熱風器、加熱輥、遠紅外線加熱器等。又,例如可將乾燥步驟(2)分成複數個步驟,愈接近後續的乾燥步驟,乾燥溫度愈高。First, the substrate 10 is output from the sending-out roller 101 and conveyed at the same time. After the coating roller 102 performs the coating step (1) for coating the gel-containing pulverized material-containing liquid 20 "of the present invention on the substrate, then in the oven area Within 110, a transition is made to the drying step (2). In the coating apparatus of FIG. 4, a pre-drying step is performed before the drying step (2) after the coating step (1). The pre-drying step does not require heating and can be performed at room temperature. In the drying step (2), a heating mechanism 111 is used. As described above, the heating mechanism 111 is preferably a hot air heater, a heating roller, a far-infrared heater, or the like. For example, the drying step (2) can be divided into a plurality of steps, and the closer to the subsequent drying step, the higher the drying temperature.

於乾燥步驟(2)後,在化學處理區120內進行化學處理步驟(3)。在化學處理步驟(3)中,例如當乾燥後之塗覆膜20’含有光活性觸媒時,係以配置在基材10上下的燈(光照射機構)121進行光照射。或者,例如在乾燥後之塗覆膜20’含有熱活性觸媒時,係使用熱風器(加熱機構)取代燈(光照射裝置)121,以配置在基材10上下的熱風器121將基材10加熱。藉由該交聯處理,引發塗覆膜20’中之前述粉碎物彼此的化學鍵結,使低折射率層20硬化、強化。此外,雖省略了圖示,不過圖3之前述步驟(4)~(8)可利用捲對捲(Roll to Roll)法進行,來製造前述導光板方式液晶顯示器用光學片材。然後,利用捲取輥105捲取所製得的前述導光板方式液晶顯示器用光學片材。After the drying step (2), a chemical treatment step (3) is performed in the chemical treatment zone 120. In the chemical treatment step (3), for example, when the dried coating film 20 'contains a photoactive catalyst, light is irradiated with a lamp (light irradiation means) 121 disposed above and below the substrate 10. Alternatively, for example, when the dried coating film 20 'contains a thermally active catalyst, a hot air heater (heating mechanism) is used instead of the lamp (light irradiation device) 121, and the hot air heater 121 disposed above and below the base material 10 is used to separate the base material. 10 热。 10 heating. By this cross-linking treatment, chemical bonding of the pulverized materials in the coating film 20 'is initiated, and the low refractive index layer 20 is hardened and strengthened. In addition, although illustration is omitted, the steps (4) to (8) in FIG. 3 can be performed by a roll to roll method to manufacture the optical sheet for a light guide plate type liquid crystal display. Then, the obtained optical sheet for a light guide plate type liquid crystal display is taken up by a take-up roll 105.

於圖5示意顯示微凹版法(微凹版塗佈法)之塗覆裝置及使用其之前述多孔質結構的形成方法一例。另外,同圖雖為截面圖,但為了便於觀看,省略了影線。An example of a coating apparatus for a micro gravure method (micro gravure coating method) and a method for forming the porous structure using the micro gravure method (micro gravure coating method) is shown schematically in FIG. 5. In addition, although the same figure is a cross-sectional view, hatching has been omitted for easy viewing.

如圖示,使用該裝置之方法的各步驟與圖4同樣地係藉由輥件將基材10朝一方向搬送的同時一邊進行。搬送速度無特別限定,例如為1~100m/分鐘、3~50m/分鐘、5~30m/分鐘。As shown in the figure, each step of the method using the apparatus is performed while conveying the substrate 10 in one direction by a roller member in the same manner as in FIG. 4. The conveying speed is not particularly limited, and is, for example, 1 to 100 m / minute, 3 to 50 m / minute, or 5 to 30 m / minute.

首先,從送出輥201輸出基材10的同時一邊搬送,執行塗覆步驟(1),亦即於基材10上塗覆本發明之含凝膠粉碎物液體20''。含凝膠粉碎物液體20''之塗覆如圖示,係使用儲液區202、刮刀(doctor knife)203及微凹版204進行。具體上,係使儲留在儲液區202中的含凝膠粉碎物液體20”附著於微凹版204表面,再以刮刀203控制成預定的厚度並同時以微凹版204塗覆於基材10表面。另外,微凹版204為示例,不限於此,亦可使用其它的任意塗覆機構。First, the substrate 10 is conveyed while being conveyed from the sending-out roller 201, and the coating step (1) is performed, that is, the gel-containing pulverized material-containing liquid 20 ″ of the present invention is coated on the substrate 10. As shown in the figure, the gel-containing pulverized liquid 20 "is applied using a liquid storage area 202, a doctor knife 203, and a microgravure 204. Specifically, the gel-containing pulverized material liquid 20 "stored in the liquid storage area 202 is attached to the surface of the microgravure 204, and then controlled to a predetermined thickness by a doctor blade 203, and simultaneously coated on the substrate 10 with the microgravure 204 In addition, the micro gravure 204 is an example, and is not limited thereto, and any other coating mechanism may be used.

接著進行乾燥步驟(2)。具體上,如圖示在烘箱區210中搬送已塗覆含凝膠粉碎物液體20”之基材10,並藉由烘箱區210內之加熱機構211加熱、進行乾燥。加熱機構211例如可與圖4相同。又,例如亦可藉由將烘箱區210分成多個區塊,使乾燥步驟(2)分成多個步驟,令乾燥溫度隨著後續的乾燥步驟愈來愈高。於乾燥步驟(2)後,在化學處理區220內進行化學處理步驟(3)。在化學處理步驟(3)中,例如當乾燥後之塗覆膜20’含有光活性觸媒時,係以配置在基材10上下的燈(光照射機構)221進行光照射。或者,例如當乾燥後之塗覆膜20’含有熱活性觸媒時,會使用熱風器(加熱機構)來替代燈(光照射裝置)221,以配置在基材10下方的熱風器(加熱機構)221將基材10加熱。藉由該交聯處理,引發塗覆膜20'中之前述粉碎物彼此的化學鍵結,可形成低折射率層20。This is followed by a drying step (2). Specifically, as shown in the figure, the substrate 10 coated with the gel-containing pulverized liquid 20 "is transported in the oven region 210, and is heated and dried by a heating mechanism 211 in the oven region 210. The heating mechanism 211 may be Figure 4 is the same. Also, for example, by dividing the oven area 210 into multiple blocks, the drying step (2) can be divided into multiple steps, so that the drying temperature becomes higher with the subsequent drying step. In the drying step ( 2) Then, a chemical treatment step (3) is performed in the chemical treatment zone 220. In the chemical treatment step (3), for example, when the dried coating film 20 'contains a photoactive catalyst, it is disposed on the substrate 10 upper and lower lamps (light irradiation means) 221 for light irradiation. Or, for example, when the dried coating film 20 'contains a thermally active catalyst, a hot air heater (heating means) is used instead of the lamp (light irradiation means) 221. The substrate 10 is heated by a hot air heater (heating mechanism) 221 disposed below the substrate 10. By this cross-linking treatment, chemical bonding between the aforementioned pulverized materials in the coating film 20 'is initiated, and a low refractive index can be formed. Layer 20.

此外,雖省略了圖示,不過圖3之前述步驟(4)~(8)可利用捲對捲(Roll to Roll)法進行,來製造前述導光板方式液晶顯示器用光學片材。然後,利用捲取輥251捲取所製得的前述導光板方式液晶顯示器用光學片材。In addition, although illustration is omitted, the steps (4) to (8) in FIG. 3 can be performed by a roll to roll method to manufacture the optical sheet for a light guide plate type liquid crystal display. Then, the obtained optical sheet for a light guide plate type liquid crystal display is taken up by a take-up roll 251.

[3.空隙層] 以下舉例說明本發明之低折射率層為空隙層的情況(本發明之空隙層)。[3. Void layer] The case where the low refractive index layer of the present invention is a void layer (the void layer of the present invention) is exemplified below.

本發明之空隙層譬如亦可以是空隙率為35體積%以上,且峰值細孔徑為50nm以下。惟,此為示例,本發明之空隙層不受此限。The void layer of the present invention may have, for example, a void ratio of 35 vol% or more and a peak pore diameter of 50 nm or less. However, this is an example, and the void layer of the present invention is not limited to this.

前述空隙率譬如可為35體積%以上、38體積%以上或40體積%以上,亦可為90體積%以下、80體積%以下或75體積%以下。前述本發明之空隙層譬如亦可以是空隙率為60體積%以上的高空隙層。The porosity may be, for example, 35 vol% or more, 38 vol% or more, or 40 vol% or more, and may be 90 vol% or less, 80 vol% or less, or 75 vol% or less. The void layer of the present invention may be, for example, a high void layer having a void ratio of 60% by volume or more.

前述空隙率譬如可利用下述測定方法進行測定。The porosity can be measured by, for example, the following measurement method.

(空隙率之測定方法) 成為空隙率測定對象的層若為單一層且僅含有空隙,則層之構成物質與空氣之比率(體積比)可利用常法(譬如測定重量及體積來算出密度)算出,所以藉此可算出空隙率(體積%)。又,折射率與空隙率具有相關關係,所以譬如亦可從做為層之折射率之值算出空隙率。具體上,譬如可從以橢圓偏光計測得之折射率之值,利用勞洛公式(Lorentz‐Lorenz's formula)算出空隙率。(Measurement method of porosity) If the layer to be measured for porosity is a single layer and contains only voids, the ratio (volume ratio) of the constituent material of the layer to the air can be measured by conventional methods (such as measuring weight and volume to calculate density). Since it is calculated, the porosity (volume%) can be calculated from this. Since the refractive index has a correlation with the porosity, the porosity can also be calculated from the value of the refractive index as a layer, for example. Specifically, for example, the porosity can be calculated from the value of the refractive index measured by an ellipsometer using Lorentz-Lorenz's formula.

本發明之空隙層譬如同前述,可藉由凝膠粉碎物(微細孔粒子)之化學鍵結而製得。此時,空隙層之空隙方便上可分成下述(1)~(3)之3種類型。 (1)原料凝膠本身(粒子內)具有的空隙 (2)凝膠粉碎物單元具有的空隙 (3)藉由凝膠粉碎物堆積而產生之粉碎物間之空隙The void layer of the present invention can be produced, for example, as described above, by chemical bonding of pulverized gel (fine-pored particles). At this time, the voids of the void layer can be conveniently divided into the following three types (1) to (3). (1) The voids in the raw gel itself (inside the particles) (2) The voids in the gel pulverized substance unit (3) The voids between the pulverized substances generated by the accumulation of the pulverized gel

前述(2)之空隙係在不論凝膠粉碎物(微細孔粒子)之尺寸、大小等,將藉由粉碎前述凝膠所生成之各粒子群視為一個團塊(塊體)時,可能形成於各塊體內部且有別於前述(1)之在粉碎時形成的空隙。另,前述(3)之空隙係在粉碎(譬如無介質粉碎等)時,凝膠粉碎物(微細孔粒子)之尺寸、大小等變得參差不齊所產生的空隙。本發明之空隙層譬如因為具有前述(1)~(3)之空隙,而具有適當的空隙率及峰值細孔徑。The voids in the above (2) may be formed when each particle group generated by pulverizing the gel is regarded as a clump (block) regardless of the size and size of the pulverized gel (fine-pored particles). The voids formed inside each block are different from those described in (1) above during crushing. In addition, the voids in the above (3) are voids generated when the size, size, and the like of the pulverized gel (fine-pored particles) become uneven during pulverization (for example, non-media pulverization, etc.). The void layer of the present invention has an appropriate porosity and peak pore diameter, for example, because it has the voids (1) to (3).

又,前述峰值細孔徑譬如可為5nm以上、10nm以上或20nm以上,亦可為50nm以下、40nm以下或30nm以下。在空隙層,如果在空隙率高的狀態下峰值細孔徑又太大,光會散射而變得不透明。又,在本發明中,空隙層之峰值細孔徑的下限值並無特別限定,但峰值細孔徑若太小,便很難提高空隙率,因此峰值細孔徑不宜過小。在本發明中,峰值細孔徑譬如可利用下述方法進行測定。The peak pore diameter may be, for example, 5 nm or more, 10 nm or more, or 20 nm or more, and may be 50 nm or less, 40 nm or less, or 30 nm or less. In the void layer, if the peak pore diameter is too large when the void ratio is high, light will be scattered and become opaque. In the present invention, the lower limit value of the peak pore diameter of the void layer is not particularly limited, but if the peak pore diameter is too small, it is difficult to increase the void ratio, so the peak pore diameter should not be too small. In the present invention, the peak pore diameter can be measured by, for example, the following method.

(峰值細孔徑之測定方法) 使用細孔分布/比表面積測定裝置(BELLSORP MINI/Micromeritics Japan公司之商品名),利用氮吸附取得BJH製圖、BET製圖及等溫吸附線並由從中求得之結果算出峰值細孔徑。(Measurement method of peak pore size) Using a pore size distribution / specific surface area measuring device (BELLSORP MINI / Micromeritics Japan), nitrogen adsorption was used to obtain BJH drawings, BET drawings, and isothermal adsorption lines, and the results obtained therefrom Calculate the peak pore diameter.

又,本發明之空隙層的厚度並無特別限定,譬如可為100nm以上、200nm以上或300nm以上,亦可為10000nm以下、5000nm以下或2000nm以下。The thickness of the void layer of the present invention is not particularly limited, and may be, for example, 100 nm or more, 200 nm or more, or 300 nm or more, and may be 10,000 nm or less, 5000 nm or less, or 2000 nm or less.

又,本發明之空隙層譬如利用顯示膜強度之BEMCOT(註冊商標)所得的耐擦傷性為60~100%,利用顯示可撓性之MIT試驗所得的耐折次數為100次以上,惟不限於此。In addition, the void layer of the present invention has, for example, a scratch resistance of 60 to 100% using BEMCOT (registered trademark) showing the strength of the film, and a folding resistance number of 100 or more obtained by using the MIT test showing flexibility, but it is not limited to this.

本發明之空隙層使用了前述多孔體凝膠的粉碎物,所以前述多孔體凝膠之三維結構被破壞,而形成了與前述多孔體凝膠迥異的新型三維結構。如此一來,本發明之空隙層藉由成為形成有以由前述多孔體凝膠形成之層所無法取得的新型孔結構(新型空隙結構)之層,而可形成空隙率高之奈米等級的空隙層。又,本發明之空隙層譬如當前述空隙層惟聚矽氧多孔體時,譬如可一邊調節矽化合物凝膠之矽氧烷鍵官能基數的同時,一邊使前述粉碎物彼此行化學鍵結。此外,在形成有新型的三維結構作為前述空隙層之前驅物後,還會在結合步驟進行化學鍵結(譬如交聯),所以本發明之空隙層譬如當前述空隙層為機能性多孔體時,雖是具有空隙的結構,仍可維持充分的強度及可撓性。因此,根據本發明,可輕鬆且簡便地對各種對象物賦予空隙層。The void layer of the present invention uses the pulverized product of the porous body gel, so the three-dimensional structure of the porous body gel is destroyed, and a new three-dimensional structure that is different from the porous body gel is formed. As such, the void layer of the present invention can be formed into a layer having a high porosity nanometer grade by forming a layer having a new pore structure (new void structure) that cannot be obtained with the layer formed from the porous body gel described above. Interstitial layer. In addition, in the void layer of the present invention, for example, when the void layer is a polysilicon porous body, for example, the pulverized materials can be chemically bonded to each other while adjusting the number of siloxane bond functional groups of the silicon compound gel. In addition, after a new three-dimensional structure is formed as a precursor of the void layer, chemical bonding (such as cross-linking) is performed in a bonding step. Therefore, when the void layer of the present invention is a functional porous body, for example, Although it has a void structure, it can maintain sufficient strength and flexibility. Therefore, according to the present invention, it is possible to easily and simply provide a void layer to various objects.

本發明之空隙層譬如同前述含有多孔體凝膠之粉碎物,且前述粉碎物彼此呈化學鍵結狀態。在本發明之空隙層中,前述粉碎物彼此的化學鍵結(化學鍵)形態並無特別限制,前述化學鍵之具體例可舉如交聯鍵結等。又,使前述粉碎物彼此行化學鍵結之方法,就如同在前述空隙層之製造方法中所詳述。The void layer of the present invention is, for example, the aforementioned pulverized material containing a porous body gel, and the pulverized materials are in a chemically bonded state. In the void layer of the present invention, the chemical bonding (chemical bond) form of the pulverized materials is not particularly limited, and specific examples of the chemical bonding include cross-linking bonding and the like. The method of chemically bonding the pulverized materials to each other is as described in detail in the method for manufacturing the void layer.

前述交聯鍵結譬如為矽氧烷鍵。矽氧烷鍵可舉如以下所示T2鍵、T3鍵、T4鍵。本發明之聚矽氧多孔體具有矽氧烷鍵時,例如可具有其中任一種鍵,可具有其中任二種鍵,也可具有三種全部的鍵。前述矽氧烷鍵中,T2及T3之比率愈多,愈富可撓性,也就愈可期待凝膠本來的特性,但膜強度會變弱。另一方面,前述矽氧烷鍵中T4比率一多,雖易於顯現膜強度,但空隙尺寸會變小,可撓性變弱。因此,例如宜因應用途來調整T2、T3、T4比率。The cross-linking bond is, for example, a siloxane bond. Examples of the siloxane bond include a T2 bond, a T3 bond, and a T4 bond. When the polysiloxane porous body of the present invention has a siloxane bond, for example, it may have any one of the bonds, may have any two of the bonds, or may have all three of the bonds. In the aforementioned siloxane bond, the more the ratio of T2 and T3 is, the more flexible it is, and the more original properties of the gel can be expected, but the film strength becomes weaker. On the other hand, the T4 ratio in the siloxane bond is large, and although the strength of the film is easily developed, the void size is reduced and the flexibility is weakened. Therefore, for example, the T2, T3, and T4 ratio should be adjusted according to the application.

[化學式5] [Chemical Formula 5]

本發明之空隙層具有前述矽氧烷鍵時,T2、T3及T4的比例譬如在相對以「1」表示T2時,T2:T3:T4=1:[1~100]:[0~50]、1:[1~80]:[1~40]、1:[5~60]:[1~30]。When the void layer of the present invention has the aforementioned siloxane bond, the ratio of T2, T3, and T4 is, for example, when T2 is represented by "1", T2: T3: T4 = 1: [1 ~ 100]: [0 ~ 50] , 1: [1 ~ 80]: [1 ~ 40], 1: [5 ~ 60]: [1 ~ 30].

此外,本發明之空隙層以例如所含矽原子呈矽氧烷鍵結為佳。就具體例而言,前述聚矽氧多孔體中所含總矽原子中,未鍵結之矽原子(亦即殘留矽烷醇)的比率例如為小於50%、30%以下、15%以下。The void layer of the present invention is preferably, for example, when the silicon atoms contained therein are siloxane bonded. As a specific example, the ratio of unbonded silicon atoms (that is, residual silanols) in the total silicon atoms contained in the aforementioned polysilica porous body is, for example, less than 50%, 30% or less, and 15% or less.

本發明之空隙層具有孔結構,孔的空隙尺寸係指空隙(孔)之長軸直徑及短軸直徑中之前述長軸直徑。空孔尺寸譬如為5nm~50nm。前述空隙尺寸中,其下限譬如為5nm以上、10nm以上、20nm以上,其上限譬如為50nm以下、40nm以下、30nm以下,且其範圍譬如為5nm~50nm、10nm~40nm。空隙尺寸係因應使用空隙結構之用途來決定適當的空隙尺寸,例如必須因應目的調整成期望的空隙尺寸。空隙尺寸例如可以下述方法作評估。The void layer of the present invention has a pore structure, and the pore void size refers to the aforementioned long axis diameter of the major axis diameter and the minor axis diameter of the void (hole). The pore size is, for example, 5 nm to 50 nm. In the aforementioned gap size, the lower limit thereof is, for example, 5 nm or more, 10 nm or more, and 20 nm or more. The upper limit thereof is, for example, 50 nm or less, 40 nm or less, and 30 nm or less, and the range is, for example, 5 nm to 50 nm, 10 nm to 40 nm. The gap size is determined by the use of the gap structure. For example, the gap size must be adjusted to the desired gap size according to the purpose. The void size can be evaluated, for example, by the following method.

(空隙層之截面SEM觀察) 在本發明中,空隙層之形態可用SEM(掃描型電子顯微鏡)來進行觀察及解析。具體上,譬如可將前述空隙層在冷卻下進行FIB加工(加速電壓:30kV),並針對所得截面試樣利用FIB-SEM(FEI公司製:商品名Helios NanoLab600、加速電壓:1kV),以觀察倍率100,000倍取得截面電子像。(Sectional SEM Observation of the Void Layer) In the present invention, the morphology of the void layer can be observed and analyzed with a SEM (scanning electron microscope). Specifically, for example, the aforementioned void layer can be subjected to FIB processing under cooling (acceleration voltage: 30 kV), and FIB-SEM (made by FEI Corporation: trade name Helios NanoLab600, acceleration voltage: 1 kV) can be used for the obtained cross-sectional sample to observe A cross-section electron image was obtained at a magnification of 100,000 times.

(評估空隙尺寸) 在本發明中,前述空隙尺寸可藉由BET試驗法予以定量。具體上,係於細孔分布/比表面積測定裝置(BELLSORP MINI/Micromeritics Japan公司之商品名)之毛細管投入0.1g之試樣(本發明之空隙層)後,在室溫下進行24小時的減壓乾燥,將空隙結構內之氣體脫氣。然後,使氮氣吸附於前述試樣上,繪出BET製圖及BJH製圖、吸附等溫線以求算細孔分布。藉此可評估空隙尺寸。(Evaluation of void size) In the present invention, the aforementioned void size can be quantified by a BET test method. Specifically, a 0.1 g sample (a void layer of the present invention) was placed in a capillary tube of a pore distribution / specific surface area measuring device (a brand name of BELLSORP MINI / Micromeritics Japan), and then reduced at room temperature for 24 hours. Pressure drying to degas the gas in the void structure. Then, nitrogen was adsorbed on the sample, and a BET chart, a BJH chart, and an adsorption isotherm were drawn to calculate a pore distribution. This allows the gap size to be evaluated.

本發明之空隙層譬如利用顯示膜強度之BEMCOT(註冊商標)所得的耐擦傷性為60~100%。本發明例如因為具有這種強度,所以在各種製程中皆具有卓越的耐擦傷性。本發明在例如製出前述空隙層後的捲取及處置製品薄膜時的生產製程中具有耐致傷性。另一方面,本發明之空隙層譬如用以替代減少空隙率,還可利用後述加熱步驟中之觸媒反應,提升前述矽化合物凝膠之粉碎物的粒子尺寸、及前述粉碎物彼此結合後之頸部的結合力。藉此,本發明之空隙層就可對例如本來脆弱的空隙結構賦予一定程度的強度。The void layer of the present invention has a scratch resistance of 60 to 100%, for example, using BEMCOT (registered trademark), which shows film strength. Because the present invention has such strength, it has excellent scratch resistance in various processes. The present invention has, for example, wound resistance in a production process when a product film is wound up and disposed after the aforementioned void layer is produced. On the other hand, in the void layer of the present invention, for example, instead of reducing the porosity, the catalyst reaction in the heating step described later can be used to increase the particle size of the pulverized material of the silicon compound gel and the pulverized material combined with The binding force of the neck. With this, the void layer of the present invention can impart a certain degree of strength to, for example, an inherently weak void structure.

前述耐擦傷性其下限例如為60%以上、80%以上、90%以上,其上限例如為100%以下、99%以下、98%以下,其範圍例如為60~100%、80~99%、90~98%。The lower limit of the abrasion resistance is, for example, 60% or more, 80% or more, 90% or more, and the upper limit is, for example, 100% or less, 99% or less, or 98% or less, and the ranges are, for example, 60 to 100%, 80 to 99%, 90 ~ 98%.

前述耐擦傷性譬如可藉由以下方法測定。The abrasion resistance can be measured, for example, by the following method.

(耐擦傷性評估) (1)將塗覆、成膜於丙烯酸薄膜上的空隙層(本發明之空隙層)採樣出直徑15mm左右的圓狀物。 (2)接著針對前述試樣以螢光X射線(島津製作所公司製:ZSX PrimusII)鑑定矽,以測定Si塗佈量(Si0 )。然後就前述丙烯酸薄膜上的前述空隙層,從前述進行採樣的周遭將前述空隙層裁切成50mm×100mm並將其固定於玻璃板(厚3mm)後,以BEMCOT(註冊商標)進行滑動試驗。滑動條件係設為砝碼100g進行10往復。 (3)從結束滑動的前述空隙層以與前述(1)同樣的方式進行採樣及螢光X測定,測定擦傷試驗後的Si殘存量(Si1 )。耐擦傷性係以BEMCOT(註冊商標)試驗前後的Si殘存率(%)為定義,可以下述式表示。 耐擦傷性(%)=[殘存Si量(Si1 )/Si塗佈量(Si0 )]×100(%)(Evaluation of abrasion resistance) (1) A space-shaped object having a diameter of about 15 mm was sampled from a space layer (the space layer of the present invention) coated and formed on an acrylic film. (2) Next, the sample was identified by fluorescent X-rays (manufactured by Shimadzu Corporation: ZSX Primus II), and the Si coating amount (Si 0 ) was measured. Then, with respect to the void layer on the acrylic film, the void layer was cut into a size of 50 mm × 100 mm from the periphery of the sample and fixed to a glass plate (thickness 3 mm), and then a sliding test was performed using BEMCOT (registered trademark). The sliding conditions were set to 10 reciprocating weights of 100 g. (3) Sampling and fluorescent X measurement were performed from the void layer that had finished sliding in the same manner as in (1) above, and the residual amount of Si (Si 1 ) after the abrasion test was measured. The abrasion resistance is defined by the Si residual ratio (%) before and after the BEMCOT (registered trademark) test, and can be expressed by the following formula. Scratch resistance (%) = [Residual Si amount (Si 1 ) / Si coating amount (Si 0 )] × 100 (%)

本發明之空隙層譬如利用顯示可撓性之MIT試驗所得耐折次數為100次以上。因為本發明具有這種可撓性,所以譬如在製造時之捲取及使用時等之處置性良好。The void layer of the present invention has, for example, 100 times of folding resistance obtained by the MIT test showing flexibility. Since the present invention has such flexibility, it has good disposability, such as winding and manufacturing.

前述耐折次數其下限例如為100次以上、500次以上、1000次以上,其上限無特別限制,例如為10000次以下,其範圍例如為100~10000次、500~10000次、1000~10000次。The lower limit of the number of times of folding resistance is, for example, 100 times or more, 500 times, or 1,000 times or more. The upper limit is not particularly limited. For example, the upper limit is 10,000 times or less. .

前述可撓性係表示物質的易變形性。前述利用MIT試驗所得耐折次數例如可以下述方法測定。The aforementioned flexibility refers to a material's easy deformability. The number of times of folding resistance obtained by the MIT test can be measured, for example, by the following method.

(耐折試驗評估) 將前述空隙層(本發明之空隙層)裁切成20mm×80mm之短籤狀後,安裝於MIT耐折試驗機(TESTER SANGYO CO,. LTD.製:BE-202)並附加1.0N之荷重。包夾前述空隙層的夾頭部係使用R2.0mm,耐折次數最多進行10000次,並以前述空隙層破斷之時間點的次數作為耐折次數。(Folding test evaluation) The above-mentioned void layer (the void layer of the present invention) was cut into a short signature of 20 mm × 80 mm, and then installed on a MIT folding tester (manufactured by TESTER SANGYO CO ,. LTD .: BE-202) And attach a load of 1.0N. The clamping head for enclosing the gap layer uses R2.0mm, and the number of times of folding resistance is 10,000 times at most, and the number of times of breaking the gap layer is regarded as the number of folding resistance.

在本發明之空隙層中,表示空隙率之膜密度並無特別限制,其下限譬如為1g/cm3 以上、5g/cm3 以上、10g/cm3 以上、15g/cm3 以上,其上限譬如為50g/cm3 以下、40g/cm3 以下、30g/cm3 以下、2.1g/cm3 以下,其範圍譬如為5~50g/cm3 、10~40g/cm3 、15~30g/cm3 、1~2.1g/cm3In the void layer of the present invention, the film density indicating the porosity is not particularly limited, and its lower limit is, for example, 1 g / cm 3 or more, 5 g / cm 3 or more, 10 g / cm 3 or more, and 15 g / cm 3 or more. 50 g / cm 3 or less, 40 g / cm 3 or less, 30 g / cm 3 or less, 2.1 g / cm 3 or less, and the ranges are, for example, 5 to 50 g / cm 3 , 10 to 40 g / cm 3 , 15 to 30 g / cm 3 , 1 ~ 2.1g / cm 3 .

前述膜密度例如可以下述方法測定。The said film density can be measured with the following method, for example.

(評估膜密度) 於丙烯酸薄膜形成空隙層(本發明之空隙層)後,使用X射線繞射裝置(RIGAKU公司製:RINT-2000)測定全反射區的X射線反射率。在調配好Intensity與2θ以後,從空隙層、基材之全反射臨界角算出空孔率(P%)。膜密度可以下述式表示。 膜密度(%)=100(%)-空孔率(P%)(Evaluation of film density) After forming a void layer (the void layer of the present invention) on an acrylic film, the X-ray reflectance of the total reflection region was measured using an X-ray diffraction device (manufactured by RIGAKU: RINT-2000). After the Intensity and 2θ are adjusted, the porosity (P%) is calculated from the critical angle of the total reflection of the void layer and the substrate. The film density can be expressed by the following formula. Membrane density (%) = 100 (%)-porosity (P%)

本發明之空隙層只要如前述具有孔結構(多孔質結構)即可,例如可為前述孔結構連續構成的開放性發泡結構體。前述開放性發泡結構體例如係表示在前述空隙層中孔結構以三維型態連結,亦可說是前述孔結構之內部空隙連接在一起的狀態。多孔質體具有開放性發泡結構時,雖可藉此提高在整體中所佔的空隙率,不過當使用如中空二氧化矽之類的閉胞(close-cell)粒子時,無法形成開放性發泡結構。相對地,本發明之空隙層由於溶膠粒子(形成溶膠的多孔體凝膠粉碎物)具有三維樹狀結構,所以在塗覆膜(含有前述多孔體凝膠之粉碎物的溶膠塗覆膜)中藉由前述樹狀粒子沉降、堆積,可輕易地形成開放性發泡結構。此外,較理想係本發明之空隙層形成開放性發泡結構具有多個細孔分布的單塊(monolith)結構。前述單塊結構係指例如具奈米尺寸之微細空隙的結構及以相同的奈米空隙集結而成之開放性發泡結構存在的階層結構。在形成前述單塊結構的時,係例如以微細空隙賦予膜強度同時以粗大的開放性發泡空隙賦予高空隙率,而能夠兼顧膜強度及高空隙率。要形成這些單塊結構,重點在於,譬如首先在粉碎成前述粉碎物之前階段的前述多孔體凝膠中,控制所生成之空隙結構的細孔分布。又,譬如在粉碎前述多孔體凝膠時,藉由將前述粉碎物之粒度分布控制在期望的尺寸之下,可形成前述單塊結構。The void layer of the present invention is only required to have a pore structure (porous structure) as described above, and may be, for example, an open-cell foam structure having a continuous pore structure. The open foamed structure indicates, for example, a state in which the pore structures are connected in a three-dimensional manner in the void layer, and the internal voids of the pore structure are connected together. When the porous body has an open foam structure, it can increase the porosity in the whole, but when closed-cell particles such as hollow silica are used, the openness cannot be formed. Foam structure. In contrast, the void layer of the present invention has a three-dimensional tree structure because the sol particles (the pulverized porous body gel forming sol) have a three-dimensional tree structure. By the sedimentation and accumulation of the dendritic particles, an open foam structure can be easily formed. In addition, it is preferable that the void layer of the present invention forms a monolithic structure having an open foam structure having a plurality of fine pore distributions. The monolithic structure refers to a hierarchical structure in which, for example, a structure having fine voids having a nanometer size and an open foaming structure formed by aggregating the same nanovoids exists. When the monolithic structure is formed, for example, the film strength is imparted with fine voids and the high open porosity is provided with coarse open foamed voids, so that both film strength and high void fraction can be achieved. In order to form these monolithic structures, it is important, for example, to control the pore distribution of the generated void structure in the porous body gel at a stage before crushing into the crushed material. When the porous body gel is pulverized, for example, the monolithic structure can be formed by controlling the particle size distribution of the pulverized material to a desired size.

在本發明之空隙層中,顯示柔軟性之開裂裂縫形成伸長率並無特別限制,其下限譬如為0.1%以上、0.5%以上、1%以上,其上限譬如為3%以下。前述開裂裂縫形成伸長率之範圍譬如為0.1~3%、0.5~3%、1~3%。In the void layer of the present invention, there is no particular limitation on the elongation rate of the crack formation exhibiting flexibility, and the lower limit thereof is, for example, 0.1% or more, 0.5% or more, and 1% or more, and the upper limit thereof is, for example, 3% or less. The ranges of the crack formation elongation are, for example, 0.1 to 3%, 0.5 to 3%, and 1 to 3%.

前述開裂裂縫形成伸長率譬如可以下述方法測定。The crack formation elongation can be measured, for example, by the following method.

(評估開裂裂縫形成伸長率) 於丙烯酸薄膜上形成空隙層(本發明之空隙層)後,採樣出5mm×140mm之短籤狀。接著,於拉伸試驗機(島津製作所公司製:AG-Xplus)以夾具間距離為100mm的方式夾持前述試樣後,在0.1mm/s之拉伸速度下進行拉伸試驗。仔細觀察試驗中之前述試樣,並在前述試樣之部分上形成裂縫之時間點結束試驗,以形成裂縫之時間點的伸長率(%)作為開裂裂縫形成伸長率。(Evaluation of the crack formation elongation) After forming a void layer (the void layer of the present invention) on an acrylic film, a 5 mm × 140 mm short signature was sampled. Next, the sample was clamped in a tensile tester (manufactured by Shimadzu Corporation: AG-Xplus) so that the distance between the clamps was 100 mm, and then the tensile test was performed at a tensile speed of 0.1 mm / s. Carefully observe the aforesaid sample in the test, and end the test at the time point when a crack is formed on the part of the sample, and use the elongation (%) at the time point of crack formation as the crack formation elongation.

在本發明之空隙層中,表示透明性之霧度並無特別限制,其下限譬如為0.1%以上、0.2%以上、0.3%以上,其上限譬如為10%以下、5%以下、3%以下,其範圍譬如為0.1~10%、0.2~5%、0.3~3%。In the void layer of the present invention, the haze indicating transparency is not particularly limited, and the lower limit thereof is, for example, 0.1% or more, 0.2% or more, and 0.3% or more, and the upper limit thereof is, for example, 10% or less, 5% or less, and 3% or less. The range is, for example, 0.1 to 10%, 0.2 to 5%, and 0.3 to 3%.

前述霧度例如可以下述方法測定。The haze can be measured, for example, by the following method.

(評估霧度) 將空隙層(本發明之空隙層)裁切成50mm×50mm的尺寸並設置於霧度計(村上色彩技術研究所公司製:HM-150)上,測定霧度。關於霧度值可利用下式算出。 霧度(%)=[擴散透射率(%)/全光線透光率(%)]×100(%)(Evaluation of Haze) The void layer (the void layer of the present invention) was cut into a size of 50 mm × 50 mm and set on a haze meter (manufactured by Murakami Color Technology Research Institute: HM-150), and the haze was measured. The haze value can be calculated by the following formula. Haze (%) = [diffusive transmittance (%) / total light transmittance (%)] × 100 (%)

一般來說,前述折射率係以在真空中之光於波面的傳遞速度與在介質內之傳播速度之比,稱為該介質之折射率。本發明之聚矽氧多孔體的折射率並無特別限制,其上限譬如為1.3以下、小於1.3、1.25以下、1.2以下、1.15以下,其下限譬如為1.05以上、1.06以上、1.07以上,其範圍譬如為1.05以上且1.3以下、1.05以上且小於1.3、1.05以上且1.25以下、1.06以上~小於1.2、1.07以上~1.15以下。Generally, the aforementioned refractive index refers to the ratio of the transmission speed of light in a vacuum to the wavefront to the propagation speed in a medium, and is called the refractive index of the medium. The refractive index of the polysilica porous body of the present invention is not particularly limited, and its upper limit is, for example, 1.3 or less, less than 1.3, 1.25 or less, 1.2 or less, 1.15 or less, and its lower limit is, for example, 1.05 or more, 1.06 or more, and 1.07 or more. For example, it is 1.05 or more and 1.3 or less, 1.05 or more and less than 1.3, 1.05 or more and 1.25 or less, 1.06 or more and less than 1.2, and 1.07 or more and 1.15 or less.

本發明中,在未特別言及之前提下,前述折射率指波長550nm下所測定之折射率。又,折射率之測定方法無特別限定,例如可利用下述方法測定。In the present invention, unless otherwise mentioned, the aforementioned refractive index refers to a refractive index measured at a wavelength of 550 nm. The method for measuring the refractive index is not particularly limited, and it can be measured by the following method, for example.

(評估折射率) 於丙烯酸薄膜上形成空隙層(本發明之空隙層)後,裁切成50mm×50mm的大小並將其以黏著層貼合於玻璃板(厚度:3mm)的表面。將前述玻璃板的背面中央部(直徑20mm左右)以黑色麥克筆塗黑而調製出不會在前述玻璃板之背面反射的試樣。將前述試樣安裝於橢圓偏光儀(J.A. Woollam Japan公司製:VASE)上,在波長500nm且入射角50~80度之條件下測定折射率,並以其平均值作為折射率。(Evaluation of refractive index) After forming a void layer (the void layer of the present invention) on an acrylic film, it was cut into a size of 50 mm × 50 mm and bonded to the surface of a glass plate (thickness: 3 mm) with an adhesive layer. A central portion (about 20 mm in diameter) of the back surface of the glass plate was blackened with a black marker to prepare a sample that was not reflected on the back surface of the glass plate. The aforementioned sample was mounted on an ellipsometer (manufactured by J.A. Woollam Japan: VASE), and the refractive index was measured at a wavelength of 500 nm and an incident angle of 50 to 80 degrees, and the average value was used as the refractive index.

本發明之空隙層的厚度並無特別限制,其下限譬如為0.05μm以上、0.1μm以上,其上限譬如為1000μm以下、100μm以下,其範圍譬如為0.05~1000μm、0.1~100μm。The thickness of the void layer of the present invention is not particularly limited. The lower limit thereof is, for example, 0.05 μm or more and 0.1 μm or more. The upper limit is, for example, 1000 μm or less and 100 μm or less.

本發明之空隙層形態並無特別限制,譬如可為薄膜形狀亦可為塊體形狀等。The shape of the void layer of the present invention is not particularly limited, and may be, for example, a film shape or a block shape.

本發明之空隙層的製造方法無特別限制,譬如可利用前述之前述空隙層之製造方法來製造。 實施例The method for producing the void layer of the present invention is not particularly limited, and for example, it can be produced by the aforementioned method for producing the void layer. Examples

接下來,針對本發明之實施例加以說明。惟,本發明不受以下實施例限定。Next, an embodiment of the present invention will be described. However, the present invention is not limited to the following examples.

[參考例1] 首先,進行矽化合物之凝膠化(下述步驟(1))及熟成步驟(下述步驟(2)),製造具有多孔質結構的凝膠(聚矽氧多孔體)。接著,於其後進行下述(3)形態控制步驟、(4)溶劑置換步驟、(5)濃度測定(濃度管理)及濃度調整步驟、(6)凝膠粉碎步驟,製得低折射率層形成用塗覆液(含凝膠粉碎物液體)。另,在本參考例中如下述,係以有別於下述步驟(1)的其他步驟來進行下述(3)形態控制步驟。但,本發明不受此限,譬如亦可在下述步驟(1)中進行下述(3)形態控制步驟。[Reference Example 1] First, gelation of a silicon compound (the following step (1)) and aging step (the following step (2)) were performed to produce a gel (polysiloxane porous body) having a porous structure. Next, the following (3) morphology control step, (4) solvent replacement step, (5) concentration measurement (concentration management) and concentration adjustment step, and (6) gel pulverization step are performed thereafter to obtain a low refractive index layer. Formation coating liquid (liquid containing pulverized gel). In addition, in this reference example, as described below, the following (3) form control step is performed with steps different from the following step (1). However, the present invention is not limited to this. For example, the following (3) form control step may be performed in the following step (1).

(1)矽化合物之凝膠化 使9.5kg之矽化合物之前驅物的MTMS溶解於DMSO 22kg中。於前述混合液添加5kg的0.01mol/L之草酸水溶液後,在室溫下進行120分鐘之攪拌,使MTMS水解而生成參(羥)甲基矽烷。(1) Gelation of silicon compound MTMS of 9.5 kg of precursor of silicon compound was dissolved in 22 kg of DMSO. After adding 5 kg of a 0.01 mol / L oxalic acid aqueous solution to the mixed solution, stirring was performed at room temperature for 120 minutes, and MTMS was hydrolyzed to produce ginsyl (hydroxy) methylsilane.

於DMSO 55kg中添加28%濃度之氨水3.8kg及純水2kg後,進一步追加前述經水解處理之前述混合液,並在室溫下攪拌60分鐘。將攪拌60分鐘後的液體倒入長30cm×寬30cm×高5cm之不鏽鋼容器中並靜置在室溫下,藉以進行參(羥)甲基矽烷之凝膠化而製得凝膠狀矽化合物。After adding 3.8 kg of 28% ammonia water and 2 kg of pure water to 55 kg of DMSO, the aforementioned hydrolyzed mixed solution was further added and stirred at room temperature for 60 minutes. The liquid after stirring for 60 minutes was poured into a stainless steel container having a length of 30 cm × width 30 cm × height 5 cm and was left at room temperature to gelate the ginsyl (hydroxy) methylsilane to obtain a gel-like silicon compound. .

(2)熟成步驟 將進行前述凝膠化處理所得凝膠狀矽化合物在40℃下培育20小時,進行熟成處理而製得前述長方體形狀之團塊凝膠。由於原料中之DMSO(沸點130℃以上之高沸點溶劑)的使用量佔原料整體約83重量%,由此可知,該凝膠含有50重量%以上之沸點130℃以上的高沸點溶劑。又,由於原料中之MTMS(為凝膠構成單元之單體)的使用量佔原料整體約8重量%,由此可知,該凝膠中藉由凝膠構成單元之單體(MTMS)水解而生成的沸點低於130℃之溶劑(此時為甲醇)含量為20重量%以下。(2) Maturation step The gelatinous silicon compound obtained by performing the aforementioned gelation treatment was incubated at 40 ° C for 20 hours, and then subjected to an aging treatment to obtain the aforementioned cuboid-shaped agglomerate gel. Since the amount of DMSO (high boiling point solvent above 130 ° C) used in the raw material accounts for about 83% by weight of the entire raw material, it can be seen that the gel contains 50% by weight or higher boiling point solvent at 130 ° C or higher. In addition, since the amount of MTMS (a monomer constituting the gel constituting unit) in the raw material accounts for about 8% by weight of the entire raw material, it can be seen that the gel is hydrolyzed by the monomer (MTMS) constituting the gel constituting unit. The content of the solvent (in this case, methanol) having a boiling point lower than 130 ° C is 20% by weight or less.

(3)形態控制步驟 在藉由前述步驟(1)、(2)於前述30cm×30cm×5cm之不鏽鋼容器中所合成的凝膠上,倒入置換溶劑之水。接著,在前述不鏽鋼容器中對凝膠從上部緩慢地插入裁切用夾具之裁切刀,將凝膠裁切成大小1.5cm×2cm×5cm的長方體。(3) Morphology control step On the gel synthesized in the aforementioned stainless steel container of 30 cm x 30 cm x 5 cm by the above steps (1) and (2), water for replacing the solvent was poured. Next, the gel was slowly inserted from above into the cutting blade of the cutting jig in the stainless steel container, and the gel was cut into a rectangular parallelepiped having a size of 1.5 cm × 2 cm × 5 cm.

(4)溶劑置換步驟 接下來,以如下述(4-1)~(4-3)的方式進行溶劑置換步驟。(4) Solvent replacement step Next, the solvent replacement step is performed in the following manner (4-1) to (4-3).

(4-1) 在前述「(3)形態控制步驟」後,將前述凝膠狀矽化合物浸漬於前述凝膠狀矽化合物之8倍重量的水中,並在只有水對流的方式下慢慢地攪拌1h。1h後將水與同份量的水做交換,再攪拌3h。其後又進一步再度交換水,然後在60℃下緩慢地攪拌並同時加熱3h。(4-1) After the "(3) morphology control step", the gel-like silicon compound is immersed in 8 times the weight of the gel-like silicon compound in water, and slowly with only water convection. Stir for 1h. After 1 h, the water was exchanged with the same amount of water and stirred for another 3 h. After that, water was exchanged again, and then slowly stirred at 60 ° C while heating for 3h.

(4-2) 於(4-1)後,將水交換成前述凝膠狀矽化合物之4倍重量的異丙醇,並同樣在60℃下攪拌且加熱6h攪拌。(4-2) After (4-1), exchange water for 4 times the weight of isopropyl alcohol of the aforementioned gelatinous silicon compound, and also stir at 60 ° C and heat for 6h.

(4-3) 於(4-2)後,將異丙醇交換成相同重量的異丁醇,並同樣在60℃下加熱6h,將前述凝膠狀矽化合物中所含溶劑取代成異丁醇。以如上述方法來製造本發明之空隙層製造用凝膠。(4-3) After (4-2), isopropyl alcohol is exchanged for isobutanol of the same weight, and the same is heated at 60 ° C for 6 hours to replace the solvent contained in the aforementioned gel-like silicon compound with isobutyl alcohol. alcohol. The void layer manufacturing gel of the present invention is produced by the method described above.

(5)濃度測定(濃度管理)及濃度調整步驟 於前述(4)之溶劑置換步驟後取出前述塊體狀的凝膠,並去除附著於凝膠四周的溶劑。然後以重量乾燥法測定一個凝膠塊體中所占固體成分濃度。此時,為了取得測定值的重現性,以隨機取出之6個塊體進行測定,並算出其平均值及值之參差。此時,凝膠中固體成分之濃度(凝膠濃度)的平均值為5.20重量%,6個凝膠中之前述凝膠濃度之值之參差則為±0.1%以內。以該測定值為基礎,添加異丁醇溶劑做調整,以使凝膠固體成分之濃度(凝膠濃度)成為約3.0重量%。(5) Concentration measurement (concentration management) and concentration adjustment steps After the solvent replacement step of the above (4), the block-shaped gel is taken out, and the solvent attached to the periphery of the gel is removed. Then, the concentration of the solid content in one gel block was determined by the weight drying method. At this time, in order to obtain the reproducibility of the measured value, the six blocks taken out at random were measured, and the average value and the difference between the values were calculated. At this time, the average value of the solid content concentration (gel concentration) in the gel was 5.20% by weight, and the variation in the aforementioned gel concentration values in the six gels was within ± 0.1%. Based on the measured value, an isobutanol solvent was added to adjust so that the concentration of the gel solid content (gel concentration) was about 3.0% by weight.

(6)凝膠粉碎步驟 針對前述(5)濃度測定(濃度管理)及濃度調整步驟後的前述凝膠(凝膠狀矽化合物),係以第1粉碎階段中利用連續式乳化分散(太平洋機工公司製、Milder MDN304型),且第2粉碎階段利用高壓無介質粉碎(SUGINO MACHINE Ltd.製、Star Burst HJP-25005型)之2階段來進行粉碎。該粉碎處理係針對溶劑含有前述經溶劑置換之凝膠狀矽化合物的凝膠43.4kg,秤量追加異丁醇26.6kg後,在第1粉碎階段以循環粉碎進行20分鐘,且第2粉碎階段進行粉碎壓力100MPa之粉碎。如此一來便製得奈米尺寸之粒子(前述凝膠之粉碎物)分散其中的異丁醇分散液(含凝膠粉碎物液體)。(6) Gel pulverization step The gel (gel-like silicon compound) after the concentration measurement (concentration management) and the concentration adjustment step (5) is performed by continuous emulsification and dispersion (Pacific Engineering Company, Milder MDN304 type), and the second pulverization stage uses two stages of high-pressure non-media pulverization (SUGINO MACHINE Ltd., Star Burst HJP-25005 type) for pulverization. This pulverization treatment was performed on a gel containing 43.4 kg of the gel containing the gel-like silicon compound substituted with the solvent, and 26.6 kg of isobutanol was weighed, and then circulated in the first pulverization stage for 20 minutes, and the second pulverization stage was performed. The crushing pressure is 100 MPa. In this way, an isobutanol dispersion (a gel-containing pulverized liquid) in which nano-sized particles (the pulverized product of the gel) are dispersed is prepared.

又,於前述第1粉碎階段(粗粉碎步驟)後且前述第2粉碎階段(奈米粉碎步驟)前,測定前述液體(高黏度凝膠粉碎液)之固體成分濃度(凝膠濃度),結果得3.01重量%。於前述第1粉碎階段(粗粉碎步驟)後且前述第2粉碎階段(奈米粉碎步驟)前,前述凝膠之粉碎物的體積平均粒徑為3~5μm,前述液體之剪切黏度為4,000mPa・s。此時,高黏度凝膠粉碎液為高黏度,所以不會固液分離而可做到做成均勻液體的處理,因此可直接採用前述第1粉碎階段(粗粉碎步驟)後的測定值。此外,在前述第2粉碎階段(奈米粉碎步驟)後,前述凝膠之粉碎物的體積平均粒徑為250~350nm,前述液體之剪切黏度為5m~10mPa・s。再者,在前述第2粉碎階段(奈米粉碎步驟)後,再次測定前述液體(含凝膠粉碎物液體)之固體成分濃度(凝膠濃度),結果得3.01重量%,與前述第1粉碎階段(粗粉碎步驟)後不變。The solid content concentration (gel concentration) of the liquid (high-viscosity gel pulverization solution) was measured after the first pulverization step (coarse pulverization step) and before the second pulverization step (nano pulverization step). 3.01% by weight was obtained. After the first pulverization step (coarse pulverization step) and before the second pulverization step (nano pulverization step), the volume average particle size of the pulverized material of the gel is 3 to 5 μm, and the shear viscosity of the liquid is 4,000. mPa ・ s. At this time, the high-viscosity gel pulverized liquid has a high viscosity, so it can be treated as a homogeneous liquid without solid-liquid separation. Therefore, the measured value after the first pulverization step (coarse pulverization step) can be directly used. In addition, after the second pulverization step (nano pulverization step), the volume average particle diameter of the pulverized material of the gel is 250 to 350 nm, and the shear viscosity of the liquid is 5 m to 10 mPa · s. In addition, after the second pulverization step (nano pulverization step), the solid content concentration (gel concentration) of the liquid (gel-containing pulverized product liquid) was measured again, and as a result, 3.01% by weight was obtained, which was the same as the first pulverization. It does not change after the stage (coarse crushing step).

另,在本參考例中,前述第1粉碎階段後及前述第2粉碎階段後之前述凝膠的粉碎物(溶膠粒子)平均粒徑,係以動態光散射式Nanotrac粒度分析計(日機裝公司製、商品名UPA-EX150型)做確認。又,在本實施例中,前述第1粉碎階段後及前述第2粉碎階段後之前述液體的剪切黏度係以振動式黏度測定機(Sekonic Co.製、商品名FEM-1000V)做確認。在以下各實施例及比較例亦同。In this reference example, the average particle size of the pulverized material (sol particles) of the gel after the first pulverization stage and after the second pulverization stage is based on a dynamic light scattering Nanotrac particle size analyzer (Nikkiso equipment Company system, brand name UPA-EX150)). In this embodiment, the shear viscosity of the liquid after the first pulverization stage and after the second pulverization stage are confirmed with a vibration viscosity measuring machine (manufactured by Sekonic Co., trade name: FEM-1000V). The same applies to the following Examples and Comparative Examples.

另,於前述第1粉碎步驟(粗粉碎步驟)後,在前述含凝膠粉碎物液體之固體成分(凝膠)中,測定(算出)構成單元單體的官能基(矽烷醇基)中無助於凝膠內交聯結構的官能基(殘留矽烷醇基)比率,結果得到11mol%之測定值。又,前述無助於凝膠內交聯結構之官能基(殘留矽烷醇基)比率係藉由下述方法進行測定:將凝膠乾燥後測定固體NMR(Si-NMR),並從NMR之峰值比算出無助於交聯結構之殘留矽烷醇基的比率。In addition, after the first pulverization step (coarse pulverization step), in the solid content (gel) of the gel-containing pulverized material liquid, the functional group (silanol group) constituting the unit monomer was measured (calculated) for the absence of The ratio of the functional groups (residual silanol groups) contributing to the cross-linking structure in the gel was measured as a result of 11 mol%. The ratio of the functional group (residual silanol group) that does not contribute to the cross-linked structure in the gel is measured by measuring the solid NMR (Si-NMR) after drying the gel, and the peak value of the NMR is measured. The ratio is calculated from the residual silanol groups that do not contribute to the crosslinked structure.

以上述方法來製造本參考例(參考例1)之空隙層形成用塗覆液(含凝膠粉碎物液體)。又,以前述方法測定空隙層形成用塗覆液(含凝膠粉碎物液體)中之凝膠粉碎物(微細孔粒子)的峰值細孔徑,結果得12nm。The coating liquid (containing a pulverized gel-containing liquid) for forming a void layer of the present reference example (Reference Example 1) was produced by the above method. The peak pore diameter of the pulverized gel (fine-pored particles) in the coating liquid (gel-containing pulverized liquid) for forming a void layer was measured by the method described above, and it was 12 nm.

[實施例1] 於參考例1中所製作之低折射率層形成用塗覆液3g添加混合光鹼產生劑(WPBG266[和光純藥工業股份有限公司商品名]:1.5%濃度MIBK溶液)0.36g、雙(三甲氧基矽基)乙烷(TCI)(5%濃度MIBK溶液)0.11g,並將所得液體塗覆至由100μm之含脂環式結構樹脂薄膜(日本ZEON股份有限公司、商品名「ZEONOR:ZF16薄膜」)所構成的基材(基材薄膜)上並使其乾燥後,形成膜厚約800nm的低折射率層(折射率:1.18、空隙率:59體積%)。接著從低折射率層面側進行UV照射(300mJ)後,將厚度12μm之附分離件(75μm)之黏著劑(第1黏接著層)貼合至低折射率層面上。然後將前述含脂環式結構樹脂薄膜(基材薄膜)自前述黏著劑(黏接著層)與低折射率層的一體物品剝離。其後,於已剝離前述基材薄膜之面上進一步貼合另一個厚5μm之附分離件的黏著劑(第2黏接著層),而製得總厚度(整體厚度)為約18μm的含低折射率層之黏接著片。又,總厚度(整體厚度)係指前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體[不計分離件]的合計厚度,在以下各實施例及比較例中亦同。該含低折射率層之黏接著片中,黏著劑(黏接著層)之厚度(前述第1黏接著層及前述第2黏接著層的合計厚度)相對於總厚度(整體厚度)的所占比率為約95%。再來,自前述含低折射率層之黏接著片剝離前述分離件,並以前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體,將背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板貼合並一體化,而製得本實施例之導光板方式液晶顯示器用光學片材。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Example 1] 3 g of the coating solution for forming a low refractive index layer prepared in Reference Example 1 was added with a mixed photobase generator (WPBG266 [Wako Pure Chemical Industries, Ltd.]: 1.5% concentration MIBK solution) 0.36 g, 0.11 g of bis (trimethoxysilyl) ethane (TCI) (5% concentration MIBK solution), and apply the obtained liquid to a 100 μm alicyclic structure resin film (Japan Zeon Corporation, product A low refractive index layer (refractive index: 1.18, porosity: 59% by volume) having a film thickness of about 800 nm was formed on a substrate (substrate film) composed of “ZEONOR: ZF16 film”) and dried. Next, UV irradiation (300 mJ) was performed from the low-refractive-index layer side, and then an adhesive (first adhesive layer) with a separator (75 μm) with a thickness of 12 μm was bonded to the low-refractive-index layer. Then, the alicyclic structure-containing resin film (substrate film) is peeled from the integrated article of the adhesive (adhesive layer) and the low refractive index layer. Thereafter, another 5 μm-thick adhesive (second adhesive layer) was further attached to the surface on which the substrate film had been peeled off, and a total thickness (overall thickness) of about 18 μm was obtained. Adhesive sheet of refractive index layer. The total thickness (overall thickness) refers to the total thickness of the laminated body [excluding the separator] of the first adhesive layer, the low-refractive index layer, and the second adhesive layer. In the following Examples and Comparative Examples, The same. The ratio of the thickness of the adhesive (adhesive layer) (total thickness of the first adhesive layer and the second adhesive layer) to the total thickness (overall thickness) in the adhesive sheet with a low refractive index layer The ratio is about 95%. Then, the separation member is peeled from the adhesive sheet containing the low refractive index layer, and the backlight LED side light type is laminated with the laminated body of the first adhesive layer, the low refractive index layer, and the second adhesive layer. The light guide plate of the liquid crystal display (light guide plate type LCD) is integrated with the reflection plate, and an optical sheet for the light guide plate type liquid crystal display of this embodiment is prepared. Table 1 shows the evaluation results of the brightness characteristics and the like of the optical sheet for the light guide plate type liquid crystal display.

[實施例2] 除了藉由直接塗覆於前述反射板上來形成前述低折射率層以外,以與實施例1同樣方式將背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板一體化,而製得導光板方式液晶顯示器用光學片材。亦即,本實施例之導光板方式液晶顯示器用光學片材於前述反射板與前述低折射率層之間不存在黏著劑(黏接著層),且前述反射板與前述低折射率層直接積層,除此以外皆與實施例1相同。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Example 2] A light guide plate and a reflection of a backlight LED edge-lit liquid crystal display (light guide plate type LCD) were reflected in the same manner as in Example 1 except that the low refractive index layer was formed by directly coating the reflection plate. An optical sheet for a light guide plate type liquid crystal display was obtained by integrating the plates. That is, the optical sheet for the light guide plate type liquid crystal display of this embodiment does not have an adhesive (adhesive layer) between the reflective plate and the low refractive index layer, and the reflective plate and the low refractive index layer are directly laminated. Otherwise, it is the same as in Example 1. Table 1 shows the evaluation results of the brightness characteristics and the like of the optical sheet for the light guide plate type liquid crystal display.

[實施例3] 將前述低折射率層塗覆液,換成於低折射率層形成用塗覆液3g添加混合光鹼產生劑(WPBG266[和光純藥工業股份有限公司商品名]:1.5%濃度MIBK溶液)0.18g、雙(三甲氧基矽基)乙烷(TCI)(5%濃度MIBK溶液)0.05g之液體,並將之形成為折射率1.14(空隙率:61%),除此以外以與實施例1同樣的方式,將背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板一體化,而製得導光板方式液晶顯示器用光學片材。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Example 3] The foregoing low-refractive index layer coating liquid was replaced with 3 g of the low-refractive index layer-forming coating liquid, and a mixed photobase generator (WPBG266 [Wako Pure Chemical Industries, Ltd.] trade name] was added: 1.5%. MIBK concentration solution) 0.18g, bis (trimethoxysilyl) ethane (TCI) (5% concentration MIBK solution) 0.05g liquid, and formed into a refractive index of 1.14 (void ratio: 61%), except for this Other than in the same manner as in Example 1, the light guide plate of the backlight LED edge-lit liquid crystal display (light guide plate type LCD) and the reflection plate were integrated to obtain an optical sheet for the light guide plate type liquid crystal display. Table 1 shows the evaluation results of the brightness characteristics and the like of the optical sheet for the light guide plate type liquid crystal display.

[實施例4] 將實施例1之導光板方式液晶顯示器用光學片材的導光板,進一步以與實施例1同樣的方法隔著前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體與擴散板貼合,而製得本實施例之導光板方式液晶顯示器用光學片材(反射板/導光板/擴散板一體化薄片)。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Example 4] The light guide plate of the light guide plate type liquid crystal display optical sheet of Example 1 was further subjected to the first adhesive layer, the low-refractive index layer, and the second through the same method as in Example 1. The laminated body of the adhesive layer is bonded to the diffusion plate, and an optical sheet (reflection plate / light guide plate / diffusion plate integrated sheet) for the light guide plate type liquid crystal display of this embodiment is prepared. Table 1 shows the evaluation results of the brightness characteristics and the like of the optical sheet for the light guide plate type liquid crystal display.

[實施例5] 使用厚40μm之丙烯酸薄膜作為基材薄膜來替代實施例1中所用基材薄膜,及未剝離前述基材薄膜即在與前述基材薄膜之前述低折射率層相反側之面上貼合前述厚5μm之附分離件的黏著劑(第2黏接著層),除此以外以與實施例1同樣方式,將背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板一體化而製得導光板方式液晶顯示器用光學片材。亦即,本實施例之導光板方式液晶顯示器用光學片材在前述低折射率層與前述第2黏接著層之間存在有前述厚40μm之丙烯酸薄膜(基材薄膜),除此以外與實施例1相同。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Example 5] An acrylic film with a thickness of 40 μm was used as the substrate film instead of the substrate film used in Example 1, and the substrate film was not peeled off, that is, the surface on the side opposite to the low refractive index layer of the substrate film. A 5 μm-thick adhesive with a separator (second adhesive layer) was attached to the light guide plate and a light guide plate of a backlight LED edge-lit liquid crystal display (light guide plate LCD) in the same manner as in Example 1 except that The reflecting plate is integrated to obtain an optical sheet for a light guide plate type liquid crystal display. That is, in the optical sheet for a light guide plate type liquid crystal display of this embodiment, the aforementioned acrylic film (substrate film) having a thickness of 40 μm is present between the low refractive index layer and the second adhesive layer. Example 1 is the same. Table 1 shows the evaluation results of the brightness characteristics and the like of the optical sheet for the light guide plate type liquid crystal display.

[比較例1] 將背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板未夾低折射率層且僅與厚12μm之黏著劑貼合而一體化,除此以外以與實施例1同樣方式製得導光板方式液晶顯示器用光學片材。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Comparative Example 1] A light guide plate and a reflective plate of a backlight LED edge-lit liquid crystal display (light guide plate type LCD) are integrated with a 12 μm thick adhesive without interposing a low-refractive index layer and a reflective plate. In the same manner as in Example 1, an optical sheet for a light guide plate type liquid crystal display was obtained. Table 1 shows the evaluation results of the brightness characteristics and the like of the optical sheet for the light guide plate type liquid crystal display.

[比較例2] 與實施例1同樣地,未使背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板一體化而隔著空氣層積層。亦即,在本比較例中,於前述導光板與前述反射板之間除空氣層外未配置其他層,且未使用前述低折射率層及前述黏接著層(黏著劑)。此時的亮度特性等評估結果列於表1。[Comparative Example 2] As in Example 1, the light guide plate of the backlight LED edge-lit liquid crystal display (light guide plate type LCD) and the reflection plate were not integrated, and were laminated with air therebetween. That is, in this comparative example, no layer other than the air layer is disposed between the light guide plate and the reflection plate, and the low refractive index layer and the adhesive layer (adhesive) are not used. The evaluation results of the brightness characteristics at this time are shown in Table 1.

[表1] [Table 1]

另,表1中,亮度特性(亮度均勻性)係以下述方式測定。In Table 1, the luminance characteristics (luminance uniformity) were measured in the following manner.

(亮度特性之測定方法) 對具有LED側光型背光之電視機,使用以前述各實施例或比較例之任一者製造之使導光板與稜鏡片一體化(惟,比較例2中係隔著空氣層而積層,未行一體化)而成的導光板方式液晶顯示器用光學片材,使電視機進行白顯示(white display),再利用分光放射計SR-UL2(TOPCON TECHNOHOUSE Co.之商品名)從導光板之LED入射側朝向終端側測定各座標的每個亮度。(Measurement method of brightness characteristics) For a television having an LED edge-light type backlight, a light guide plate and a cymbal were manufactured by using any one of the foregoing embodiments or comparative examples (however, the comparative example 2 An optical sheet for a light guide plate type liquid crystal display, which is laminated with an air layer and is not integrated), makes the television display a white display, and then uses a spectroradiometer SR-UL2 (TOPCON TECHNOHOUSE Co.'s product) (Name) Each brightness of each coordinate is measured from the incident side of the LED of the light guide plate toward the terminal side.

如表1所示,使用實施例1~5之導光板方式液晶顯示器用光學片材使導光板與反射板一體化時,來自LED的光會從導光板之入射側傳播至終端側,亮度特性良好(亮度均勻)。又,使導光板與反射板一體化時,既無異物混入,組裝步驟時的成品率亦佳。As shown in Table 1, when the light guide plate and the reflective plate are integrated using the optical sheet for the light guide plate method of Examples 1 to 5, light from the LED will propagate from the incident side of the light guide plate to the terminal side, and the brightness characteristics Good (even brightness). In addition, when the light guide plate and the reflecting plate are integrated, no foreign matter is mixed in, and the yield during the assembly step is also good.

相對於此,在比較例中,光在傳播至導光板之終端側之前便發生漏光,得到光無法貫穿至終端側的結果。即,比較例1未使用低折射率層而僅以黏著劑(黏接著層)使導光板與反射板一體化,比起實施例,亮度有降低。又,比較例2係未使導光板與反射板一體化而隔著空氣層積層,結果不僅發生亮度不均(亮度不均勻),且有異物混入,組裝步驟時的成品率降低。On the other hand, in the comparative example, light leaks before the light propagates to the terminal side of the light guide plate, and a result is obtained that the light cannot penetrate to the terminal side. That is, Comparative Example 1 does not use a low-refractive index layer, but integrates the light guide plate and the reflective plate only with an adhesive (adhesive layer), and the brightness is lower than that of the example. In Comparative Example 2, the light guide plate and the reflective plate were not laminated, but were laminated with air therebetween. As a result, not only brightness unevenness (uniformity in brightness) occurred, but foreign matter was mixed in, and the yield during the assembly step was reduced.

另,在實施例5中有將基材薄膜組裝至導光板方式液晶顯示器用光學片材之中,不過在其他的實施例則未將基材薄膜裝至導光板方式液晶顯示器用光學片材(剝離基材)來製造,而得以使導光板方式液晶顯示器用光學片材薄型化。 產業上之可利用性In addition, in Example 5, the base film was assembled into an optical sheet for a light guide plate type liquid crystal display, but in other examples, the base film was not attached to an optical sheet for a light guide plate type liquid crystal display ( The substrate is peeled off, and the optical sheet for a light guide plate type liquid crystal display is reduced in thickness. Industrial availability

以上如同說明,根據本發明,可提供一種具有折射率極低之低折射率層的導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器。As described above, according to the present invention, it is possible to provide an optical sheet for a light guide plate type liquid crystal display, a backlight unit for a light guide plate type liquid crystal display, and a light guide plate type liquid crystal display having a low refractive index layer having an extremely low refractive index.

10‧‧‧基材10‧‧‧ Substrate

20‧‧‧低折射率層20‧‧‧ Low refractive index layer

20'‧‧‧塗覆膜(前驅層)20'‧‧‧ coated film (precursor layer)

20''‧‧‧含凝膠粉碎物液體20``‧‧‧ Liquid containing gel smash

30‧‧‧黏接著層(黏著劑)30‧‧‧ Adhesive layer (adhesive)

40‧‧‧光學薄膜(第1光學薄膜或第2光學薄膜)40‧‧‧Optical film (first optical film or second optical film)

101‧‧‧送出輥101‧‧‧feed out roller

102‧‧‧塗覆輥102‧‧‧Coating roller

105‧‧‧捲取輥105‧‧‧ take-up roll

110‧‧‧烘箱區110‧‧‧Oven area

111‧‧‧熱風器(加熱機構)111‧‧‧hot air heater (heating mechanism)

120‧‧‧化學處理區120‧‧‧Chemical treatment zone

121‧‧‧燈(光照射機構)或熱風器(加熱機構)121‧‧‧ lamp (light irradiation mechanism) or hot air heater (heating mechanism)

201‧‧‧送出輥201‧‧‧feed out roller

202‧‧‧儲液區202‧‧‧Liquid storage area

203‧‧‧刮刀(doctor knife)203‧‧‧ doctor knife

204‧‧‧微凹版204‧‧‧Micro-gravure

210‧‧‧烘箱區210‧‧‧ Oven area

211‧‧‧加熱機構211‧‧‧Heating mechanism

220‧‧‧化學處理區220‧‧‧Chemical treatment zone

221‧‧‧燈(光照射機構)或熱風器(加熱機構)221‧‧‧ lamp (light irradiation mechanism) or hot air heater (heating mechanism)

251‧‧‧捲取輥251‧‧‧ take-up roller

1000、2000、6000‧‧‧導光板方式液晶顯示器(導光板方式LCD)1000, 2000, 6000 ‧‧‧ light guide plate type liquid crystal display (light guide plate type LCD)

A1~A6、A12、A123‧‧‧單元A1 ~ A6, A12, A123‧‧‧Unit

1010‧‧‧導光板(第1或第2光學薄膜)1010‧‧‧light guide (first or second optical film)

1020‧‧‧反射板(第1或第2光學薄膜)1020‧‧‧Reflector (first or second optical film)

1030‧‧‧稜鏡片1030‧‧‧ 稜鏡

1040‧‧‧擴散片(附擴散之稜鏡片)1040‧‧‧ diffuser (with diffuser diaphragm)

1050‧‧‧增亮薄膜1050‧‧‧brightening film

1060‧‧‧下板偏光板1060‧‧‧Lower polarizer

1070‧‧‧黏著劑(黏接著層)1070‧‧‧Adhesive (adhesive layer)

1080‧‧‧液晶面板1080‧‧‧ LCD panel

1090‧‧‧擴散板(第1或第2光學薄膜)1090‧‧‧ diffuser (first or second optical film)

圖1係顯示本發明之導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器之構成一例的截面圖。 圖2係顯示本發明之導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器之構成另一例的截面圖。 圖3係示意顯示本發明之導光板方式液晶顯示器用光學片材之製造方法一例的步驟截面圖。 圖4係示意顯示本發明之導光板方式液晶顯示器用光學片材之製造方法的部分步驟及其所用裝置之一例之圖。 圖5係示意顯示本發明之導光板方式液晶顯示器用光學片材之製造方法的部分步驟及其所用裝置之另一例之圖。 圖6係顯示不具本發明之導光板方式液晶顯示器用光學片材的導光板方式液晶顯示器之構成一例的截面圖。1 is a cross-sectional view showing an example of the configuration of an optical sheet for a light guide plate type liquid crystal display, a backlight unit for a light guide plate type liquid crystal display, and a light guide plate type liquid crystal display of the present invention. 2 is a cross-sectional view showing another configuration of the optical sheet for a light guide plate type liquid crystal display, a backlight unit for a light guide plate type liquid crystal display, and a light guide plate type liquid crystal display according to the present invention. 3 is a cross-sectional view schematically showing an example of a method of manufacturing an optical sheet for a light guide plate type liquid crystal display of the present invention. FIG. 4 is a diagram schematically showing a part of the steps of a method for manufacturing an optical sheet for a light guide plate type liquid crystal display of the present invention and an example of an apparatus used therefor. FIG. 5 is a diagram schematically showing some steps of a method for manufacturing an optical sheet for a light guide plate type liquid crystal display according to the present invention and another example of a device used in the method. 6 is a cross-sectional view showing an example of the configuration of a light guide plate type liquid crystal display without the optical sheet for a light guide plate type liquid crystal display of the present invention.

Claims (9)

一種導光板方式液晶顯示器用光學片材,其特徵在於:第1光學薄膜、低折射率層與第2光學薄膜按前述順序積層,且前述低折射率層之折射率為1.25以下。An optical sheet for a light guide plate type liquid crystal display, wherein the first optical film, the low refractive index layer, and the second optical film are laminated in the aforementioned order, and the refractive index of the low refractive index layer is 1.25 or less. 如請求項1之導光板方式液晶顯示器用光學片材,其中前述第1光學薄膜及前述第2光學薄膜分別為下板偏光板、增亮薄膜、稜鏡片、擴散板、導光板或反射板。For example, the optical sheet for a light guide plate type liquid crystal display according to claim 1, wherein the first optical film and the second optical film are a lower plate polarizing plate, a brightness enhancing film, a cymbal plate, a diffusion plate, a light guide plate, or a reflecting plate, respectively. 如請求項1或2之導光板方式液晶顯示器用光學片材,其中前述第1光學薄膜及前述第2光學薄膜之至少一者為導光板。The optical sheet for a light guide plate type liquid crystal display according to claim 1 or 2, wherein at least one of the first optical film and the second optical film is a light guide plate. 如請求項1或2之導光板方式液晶顯示器用光學片材,其中前述第1光學薄膜及前述第2光學薄膜之一者為導光板,另一者為導光板以外的光學構件。The optical sheet for a light guide plate type liquid crystal display according to claim 1 or 2, wherein one of the first optical film and the second optical film is a light guide plate, and the other is an optical member other than the light guide plate. 如請求項1或2之導光板方式液晶顯示器用光學片材,其中前述第1光學薄膜及前述第2光學薄膜之至少一者係隔著黏接著層與前述低折射率層積層。The optical sheet for a light guide plate type liquid crystal display according to claim 1 or 2, wherein at least one of the first optical film and the second optical film is an laminated layer with an adhesive layer and the low refractive index layer interposed therebetween. 如請求項1或2之導光板方式液晶顯示器用光學片材,其中前述低折射率層為空隙率35體積%以上之空隙層。The optical sheet for a light guide plate type liquid crystal display according to claim 1 or 2, wherein the aforementioned low refractive index layer is a void layer having a porosity of 35% by volume or more. 一種導光板方式液晶顯示器用背光單元,包含如請求項1至6中任一項之導光板方式液晶顯示器用光學片材、側光及導光板。A backlight unit for a light guide plate type liquid crystal display includes the optical sheet for a light guide plate type liquid crystal display according to any one of claims 1 to 6, an edge light, and a light guide plate. 如請求項7之導光板方式液晶顯示器用背光單元,其中前述側光為LED側光。The backlight unit for a light guide plate type liquid crystal display according to claim 7, wherein the aforementioned side light is an LED side light. 一種導光板方式液晶顯示器,包含如請求項7或8之導光板方式液晶顯示器用背光單元。A light guide plate type liquid crystal display includes a backlight unit for a light guide plate type liquid crystal display according to claim 7 or 8.
TW107112389A 2018-04-11 2018-04-11 Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display TWI783986B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW107112389A TWI783986B (en) 2018-04-11 2018-04-11 Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW107112389A TWI783986B (en) 2018-04-11 2018-04-11 Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display

Publications (2)

Publication Number Publication Date
TW201944147A true TW201944147A (en) 2019-11-16
TWI783986B TWI783986B (en) 2022-11-21

Family

ID=69184713

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107112389A TWI783986B (en) 2018-04-11 2018-04-11 Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display

Country Status (1)

Country Link
TW (1) TWI783986B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115379949A (en) * 2020-04-24 2022-11-22 日本瑞翁株式会社 Laminated film and film with hard coat layer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006215542A (en) * 2005-01-07 2006-08-17 Pentax Corp Anti-reflection coating and optical element having such anti-reflection coating for imaging system
EP2534509B1 (en) * 2010-02-10 2019-07-24 3M Innovative Properties Company Illumination device having viscoelastic layer
TW201431685A (en) * 2012-11-14 2014-08-16 Fujifilm Corp Photosensitive transfer material, substrate having photosensitive low refractive transfer layer, method for fabricating photosensitive low refractive transfer layer, method for forming permanent film, optical device and method for fabricating the same
TWI691732B (en) * 2014-12-26 2020-04-21 日商日東電工股份有限公司 Laminated film coil and its manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115379949A (en) * 2020-04-24 2022-11-22 日本瑞翁株式会社 Laminated film and film with hard coat layer

Also Published As

Publication number Publication date
TWI783986B (en) 2022-11-21

Similar Documents

Publication Publication Date Title
JP7182358B2 (en) Adhesive sheet containing low refractive index layer, method for producing adhesive sheet containing low refractive index layer, and optical device
TWI756341B (en) Adhesive sheet containing low refractive index layer, manufacturing method of adhesive sheet containing low refractive index layer, and optical component
JP6612563B2 (en) Silicone porous body and method for producing the same
JP6606518B2 (en) Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display
TWI784062B (en) Void layer, laminated body, manufacturing method of void layer, optical member, and optical device
JP2017054111A (en) Low refractive index layer, laminated film, manufacturing method of low refractive index layer, manufacturing method of laminated film, optical member, and image display device
JP2018123233A (en) Void layer, void layer-containing adhesive sheet, method for producing void layer, method for producing void layer-containing adhesive sheet, and optical device
KR102265851B1 (en) Manufacturing method of optical laminate and optical laminate intermediate
JP2017047677A (en) Optical laminate, method for manufacturing optical laminate, optical member, image display device, method for manufacturing optical member and method for manufacturing image display device
TWI691732B (en) Laminated film coil and its manufacturing method
WO2016104762A1 (en) Porous silicone object and process for producing same
JP2017047678A (en) Laminate film, method for manufacturing laminate film, optical member, image display device, method for manufacturing optical member and method for manufacturing image display device
TW202200726A (en) Optical laminate with double-sided adhesive layer, and optical device
WO2017043496A1 (en) Low-refractive-index layer, laminated film, method for producing low-refractive-index layer, method for producing laminated film, optical member, and image display device
CN112771413B (en) Optical laminate with adhesive layer on both sides
TW201944147A (en) Optical sheet for liquid crystal display featuring light guide plate, backlight unit for liquid crystal display featuring light guide plate and liquid crystal display featuring light guide plate including a first optical film (light guide plate), a low refractive index layer and a second optical film (reflecting plate)
JP2017064954A (en) Method for producing laminated film and method for producing image display device
TWI691559B (en) Paint and its manufacturing method
CN112771414B (en) Optical laminate with adhesive layer on both sides
WO2017051831A1 (en) Gel for producing low-refractive-index film, production method for gel for producing low-refractive-index film, coating material for producing low-refractive-index film, production method for coating material for producing low-refractive-index film, production method for laminate film, and production method for image display device
JP7450552B2 (en) optical laminate
JP6609721B1 (en) Void layer, laminate, method for producing gap layer, optical member and optical device
JP2018125153A (en) Optical sheet for direct-type liquid crystal display, backlight unit for direct-type liquid crystal display, and direct-type liquid crystal display
WO2017131220A1 (en) Method for producing liquid that contains pulverized gel