TWI783986B - Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display - Google Patents
Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display Download PDFInfo
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Abstract
本發明提供一種具有折射率極低之低折射率層的導光板方式液晶顯示器用光學片材。 本發明之導光板方式液晶顯示器用光學片材的特徵在於:第1光學薄膜(導光板)、低折射率層及第2光學薄膜(反射板)係按前述順序積層,且低折射率層之折射率為1.25以下。The present invention provides an optical sheet for a light guide plate type liquid crystal display having a low refractive index layer having an extremely low refractive index. The optical sheet for a light guide plate type liquid crystal display of the present invention is characterized in that: the first optical film (light guide plate), the low refractive index layer and the second optical film (reflection plate) are laminated in the aforementioned order, and the low refractive index layer The refractive index is 1.25 or less.
Description
本發明涉及一種導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器。The present invention relates to an optical sheet for a light guide plate type liquid crystal display, a backlight unit for a light guide plate type liquid crystal display, and a light guide plate type liquid crystal display.
發明背景 在導光板方式LCD(Liquid Crystal Display,亦稱液晶顯示裝置或液晶顯示器)等光學器件中,譬如係利用低折射率之空氣層作為全反射層。具體上,譬如液晶器件中之各光學薄膜構件(譬如導光板及反射板)係隔著空氣層積層。然而,隨著器件之薄型化趨勢,各構件之一體化乃眾所期望。因此,多半執行不夾空氣層而以黏接著劑使各構件一體化的方法(譬如專利文獻1)。但,一旦沒有發揮全反射作用的空氣層,斜角入射光就不會被全反射而變得無法利用復歸反射(retroreflection),恐會降低光的利用效率。Background of the Invention In optical devices such as a light guide plate LCD (Liquid Crystal Display, also known as a liquid crystal display device or a liquid crystal display), for example, an air layer with a low refractive index is used as a total reflection layer. Specifically, for example, each optical film member (such as a light guide plate and a reflection plate) in a liquid crystal device is laminated through air. However, with the thinning trend of devices, the integration of various components is desired. Therefore, a method of integrating components with an adhesive without interposing an air layer is often carried out (for example, Patent Document 1). However, if there is no air layer for total reflection, the incident light at an oblique angle will not be totally reflected and retroreflection cannot be used, which may reduce the utilization efficiency of light.
爰此,有文獻提議使用低折射率層來替代空氣層。譬如,在專利文獻2中便記載一種在導光板與反射板之間插入折射率比導光板低之層的結構。Therefore, there are literatures that propose to use a low-refractive index layer instead of the air layer. For example, Patent Document 2 describes a structure in which a layer having a lower refractive index than the light guide plate is inserted between the light guide plate and the reflection plate.
先前技術文獻 專利文獻 專利文獻1:日本特開2012-156082號公報 專利文獻2:日本特開平10-62626號公報Prior Art Documents Patent Documents Patent Document 1: Japanese Patent Laid-Open No. 2012-156082 Patent Document 2: Japanese Patent Laid-Open No. H10-62626
發明概要 發明欲解決之課題 但,低折射率層的折射率比空氣層高出許多,所以無法充分發揮作為空氣層的替代作用,依舊無法避免光學特性降低。Outline of the Invention Problems to be Solved by the Invention However, the low-refractive index layer has a much higher refractive index than the air layer, so it cannot fully play the role of replacing the air layer, and the reduction in optical characteristics cannot be avoided.
爰此,本發明目的在於提供一種具有折射率極低之低折射率層的導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器。 用以解決課題之手段Therefore, an object of the present invention is to provide an optical sheet for a light guide plate type liquid crystal display, a backlight unit for a light guide plate type liquid crystal display, and a light guide plate type liquid crystal display having a low refractive index layer having an extremely low refractive index. means to solve problems
為了達成前述目的,本發明之導光板方式液晶顯示器用光學片材的特徵在於:第1光學薄膜、低折射率層與第2光學薄膜按前述順序積層,且前述低折射率層之折射率為1.25以下。In order to achieve the aforementioned object, the optical sheet for a light guide plate type liquid crystal display of the present invention is characterized in that: the first optical film, the low refractive index layer and the second optical film are laminated in the aforementioned order, and the refractive index of the aforementioned low refractive index layer is Below 1.25.
本發明之導光板方式液晶顯示器用背光單元包含前述本發明之導光板方式液晶顯示器用光學片材、側光及導光板。The backlight unit for a light guide plate type liquid crystal display of the present invention comprises the aforementioned optical sheet for a light guide plate type liquid crystal display of the present invention, a side light and a light guide plate.
本發明之導光板方式液晶顯示器包含前述本發明之導光板方式液晶顯示器用背光單元。The light guide plate type liquid crystal display of the present invention includes the aforementioned backlight unit for a light guide plate type liquid crystal display of the present invention.
發明效果 根據本發明,可提供一種具有折射率極低之低折射率層的導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器。Effects of the Invention According to the present invention, an optical sheet for a light guide plate type liquid crystal display, a backlight unit for a light guide plate type liquid crystal display, and a light guide plate type liquid crystal display having a low refractive index layer having an extremely low refractive index can be provided.
用以實施發明之形態 接下來,舉例進一步具體說明本發明。惟,本發明不受以下說明任何限定。Modes for Carrying Out the Invention Next, the present invention will be described in more detail with examples. However, the present invention is not limited in any way by the following description.
本發明之導光板方式液晶顯示器用光學片材中,譬如前述第1光學薄膜及前述第2光學薄膜可分別為下板偏光板、增亮薄膜、稜鏡片、擴散板、導光板或反射板。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, the first optical film and the second optical film may be a lower polarizing plate, a brightness enhancement film, an embossed sheet, a diffuser plate, a light guide plate or a reflective plate, respectively.
本發明之導光板方式液晶顯示器用光學片材中,譬如前述第1光學薄膜及前述第2光學薄膜之至少一者可為導光板。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, at least one of the first optical film and the second optical film may be a light guide plate.
本發明之導光板方式液晶顯示器用光學片材中,譬如可以是前述第1光學薄膜及前述第2光學薄膜之一者為導光板,且另一者為導光板以外之光學構件。前述導光板以外之光學構件譬如可為反射板、擴散板或是稜鏡片或附擴散機能之稜鏡片。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, one of the first optical film and the second optical film may be a light guide plate, and the other may be an optical member other than the light guide plate. The optical components other than the aforementioned light guide plate can be, for example, reflective plates, diffuser plates, or lamella sheets or lamina sheets with a diffusing function.
又,本發明之導光板方式液晶顯示器用光學片材譬如可含有一或多個前述第1光學薄膜及前述第2光學薄膜以外之其他光學薄膜。Also, the optical sheet for a light guide plate type liquid crystal display of the present invention may contain, for example, one or more optical films other than the aforementioned first optical film and the aforementioned second optical film.
本發明之導光板方式液晶顯示器用光學片材中,譬如前述第1光學薄膜及前述第2光學薄膜之至少一者可以隔著黏接著層與前述低折射率層積層。另,以下當前述低折射率層與前述第1光學薄膜隔著黏接著層而積層時,有時會將前述黏接著層稱作「第1黏接著層」。又,以下當前述低折射率層與前述第2光學薄膜隔著黏接著層而積層時,有時會將前述黏接著層稱作「第2黏接著層」。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, at least one of the first optical film and the second optical film may be laminated with the low refractive index layer via an adhesive layer. In addition, below, when the said low-refractive-index layer and the said 1st optical film are laminated|stacked via an adhesive layer, the said adhesive layer may be called a "1st adhesive layer." In addition, below, when the said low-refractive-index layer and the said 2nd optical film are laminated|stacked through an adhesive layer, the said adhesive layer may be called a "2nd adhesive layer."
在本發明之導光板方式液晶顯示器用光學片材,譬如前述低折射率層可為空隙層。又,譬如前述低折射率層可為空隙率35體積%以上之空隙層。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, the aforementioned low refractive index layer may be a void layer. Also, for example, the aforementioned low refractive index layer may be a void layer having a porosity of 35% by volume or more.
在本發明之導光板方式液晶顯示器用光學片材,譬如相對於前述第1黏接著層、前述低折射率層及前述第2黏接著層的合計厚度,前述第1黏接著層及前述第2黏接著層的合計厚度譬如可為85%以上、88%以上、90%以上或92%以上,且譬如可為99.9%以下、99.5%以下、99.3%以下或99.2%以下。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, the thickness of the first adhesive layer and the second adhesive layer relative to the total thickness of the first adhesive layer, the low refractive index layer, and the second adhesive layer The total thickness of the adhesive layer may be, for example, 85% or more, 88% or more, 90% or more, or 92% or more, and may be, for example, 99.9% or less, 99.5% or less, 99.3% or less, or 99.2% or less.
在本發明之導光板方式液晶顯示器用光學片材,譬如前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體的透光率可以在80%以上。又譬如前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體的霧度可以在3%以下。前述透光率譬如可為82%以上、84%以上、86%以上或88%以上,且上限並無特別限定,理想為100%,譬如可為95%以下、92%以下、91%以下或90%以下。前述積層體之霧度測定譬如可以與後述低折射率層之霧度測定同樣的方法進行。又,前述透光率係波長550nm的光透射率,譬如可利用以下測定方法進行測定。In the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, the light transmittance of the laminate of the first adhesive layer, the low refractive index layer, and the second adhesive layer may be 80% or more. Also, for example, the haze of the laminate of the first adhesive layer, the low refractive index layer, and the second adhesive layer may be 3% or less. The aforementioned light transmittance can be, for example, more than 82%, more than 84%, more than 86%, or more than 88%, and the upper limit is not particularly limited, ideally 100%, for example, it can be less than 95%, less than 92%, less than 91%, or Below 90%. The haze measurement of the said laminate can be performed by the same method as the haze measurement of the low-refractive-index layer mentioned later, for example. In addition, the said light transmittance refers to the light transmittance of wavelength 550nm, and can be measured by the following measuring method, for example.
(透光率之測定方法) 使用分光光度計U-4100((股)日立製作所之商品名),以含低折射率層之黏接著片沒有貼分離件的狀態(前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體),作為測定對象的試樣。接著,測定令空氣之全光線透光率為100%時的前述試樣之全光線透光率(透光率)。前述全光線透光率(透光率)之值係以波長550nm下的測定值作為其值。(Measurement method of light transmittance) Using a spectrophotometer U-4100 (trade name of Hitachi, Ltd.), the state of the adhesive sheet containing the low refractive index layer without the separator (the aforementioned first adhesive layer, A laminate of the aforementioned low refractive index layer and the aforementioned second adhesive layer) was used as a sample to be measured. Next, the total light transmittance (light transmittance) of the above-mentioned sample when the total light transmittance of air was 100% was measured. The value of the aforementioned total light transmittance (light transmittance) is a value measured at a wavelength of 550 nm.
本發明之導光板方式液晶顯示器用光學片材的製造方法並無特別限定,譬如可以是包含下列步驟的製造方法:低折射率層形成步驟,於轉印用樹脂薄膜基材上形成前述低折射率層;及轉印步驟,將前述低折射率層轉印至前述黏接著層上。另,以下有時會將該製造方法稱作「第1導光板方式液晶顯示器用光學片材之製造方法」。又,一般有時會將厚度較小之物稱作「薄膜」且厚度較大之物稱作「薄片」以做區分,不過在本發明中,「薄膜」及「薄片」並無特別區分。The manufacturing method of the optical sheet for a light guide plate type liquid crystal display of the present invention is not particularly limited, for example, it may be a manufacturing method comprising the following steps: a step of forming a low refractive index layer, forming the aforementioned low refractive index layer on a resin film substrate for transfer printing. index layer; and a transfer printing step, transferring the aforementioned low refractive index layer onto the aforementioned adhesive layer. In addition, below, this manufacturing method may be called "the manufacturing method of the optical sheet for 1st light guide plate type liquid crystal displays." Also, generally, a thinner thing is sometimes called a "film" and a thicker thing is called a "sheet" for distinction, but in the present invention, "film" and "sheet" are not particularly distinguished.
本發明之第1導光板方式液晶顯示器用光學片材的製造方法,譬如亦可進一步具有分離件貼附步驟,其係在前述黏接著層之與前述低折射率層相反側之面附添前述分離件。The method for manufacturing an optical sheet for a liquid crystal display in the form of a light guide plate according to the present invention may further include, for example, a step of attaching a separator, which is to attach the aforementioned separate pieces.
本發明之第1導光板方式液晶顯示器用光學片材的製造方法,譬如亦可進一步具有轉印用樹脂薄膜基材剝離步驟,其係在前述分離件貼附步驟後,將前述轉印用樹脂薄膜基材剝離。在此情況下,前述分離件與前述黏接著層之剝離力宜大於前述轉印用樹脂薄膜基材與前述低折射率層之剝離力。又譬如可進一步具有分離件剝離步驟及於其後具有光學薄膜附添步驟,前者係將前述分離件自前述黏接著層剝離,後者係將前述第1光學薄膜或前述第2光學薄膜貼附至前述黏接著層。另,譬如亦可不使用前述分離件,而在前述第1光學薄膜或前述第2光學薄膜上直接貼附至前述黏接著層以替代前述分離件。The method for producing an optical sheet for a liquid crystal display in the form of a light guide plate according to the present invention may further include, for example, a step of peeling off the resin film substrate for transfer, which is to apply the resin for transfer after the step of attaching the separator. Film substrate peeled off. In this case, the peeling force between the separator and the adhesive layer is preferably greater than the peeling force between the transfer resin film substrate and the low-refractive index layer. For another example, there may be further a step of peeling off the separator and a step of attaching an optical film thereafter. The former is to peel the aforementioned separator from the aforementioned adhesive layer, and the latter is to attach the aforementioned first optical film or the aforementioned second optical film to the The aforementioned adhesive layer. In addition, for example, instead of using the separator, the first optical film or the second optical film may be directly attached to the adhesive layer instead of the separator.
在本發明之第1導光板方式液晶顯示器用光學片材的製造方法,譬如前述轉印用樹脂薄膜基材可以由含脂環式結構樹脂或含脂肪族結構樹脂所形成。若從針對低折射率層形成時之加熱乾燥等的耐久性觀點來看,特別期許為耐熱性優異的含脂環式結構樹脂。前述含脂肪族結構樹脂並無特別限定,可舉如聚烯烴、聚丙烯、聚甲基戊烯等。前述含脂環式結構樹脂並無特別限定,可舉如聚降莰烯、環狀烯烴共聚物等。In the first method of manufacturing an optical sheet for a light guide plate type liquid crystal display of the present invention, for example, the resin film substrate for transfer may be formed of an alicyclic structure-containing resin or an aliphatic structure-containing resin. In particular, an alicyclic structure-containing resin excellent in heat resistance is desired from the viewpoint of durability against heating and drying during formation of the low refractive index layer. The aliphatic structure-containing resin is not particularly limited, and examples thereof include polyolefin, polypropylene, polymethylpentene, and the like. The aforementioned alicyclic structure-containing resin is not particularly limited, and examples thereof include polynorbornene, cyclic olefin copolymer, and the like.
另,本發明之導光板方式液晶顯示器用光學片材的製造方法亦可為包含下列步驟之製造方法:塗覆步驟,於前述黏接著層上直接塗覆前述低折射率層之原料的塗覆液;及乾燥步驟,將前述塗覆液予以乾燥。又,以下有時會將該製造方法稱作「第2導光板方式液晶顯示器用光學片材之製造方法」。In addition, the manufacturing method of the optical sheet for liquid crystal display in the form of a light guide plate of the present invention may also be a manufacturing method including the following steps: coating step, coating the raw material for directly coating the aforementioned low refractive index layer on the aforementioned adhesive layer liquid; and a drying step of drying the aforementioned coating liquid. In addition, below, this manufacturing method may be referred to as "the manufacturing method of the optical sheet for 2nd light guide plate type liquid crystal displays."
另,本發明之導光板方式液晶顯示器用光學片材的製造方法亦可為包含下列步驟之製造方法:塗覆步驟,於前述第1光學薄膜上或前述第2光學薄膜上直接塗覆前述低折射率層之原料的塗覆液;及乾燥步驟,將前述塗覆液予以乾燥。又,以下有時會將該製造方法稱作「第3導光板方式液晶顯示器用光學片材之製造方法」。此外,以下有時會將本發明之第1、第2及第3導光板方式液晶顯示器用光學片材的製造方法統稱為「本發明之導光板方式液晶顯示器用光學片材之製造方法」。In addition, the manufacturing method of the optical sheet for liquid crystal display in the form of a light guide plate of the present invention may also be a manufacturing method comprising the following steps: a coating step, directly coating the aforementioned low-density film on the aforementioned first optical film or the aforementioned second optical film. a coating solution for the raw material of the refractive index layer; and a drying step of drying the aforementioned coating solution. In addition, below, this manufacturing method may be referred to as "the manufacturing method of the optical sheet for 3rd light guide plate type liquid crystal displays." In addition, the manufacturing method of the 1st, 2nd, and 3rd optical sheet for liquid crystal displays of light guide plate type of this invention is collectively referred to as "the manufacturing method of optical sheet for liquid crystal displays of light guide plate type of this invention" below sometimes.
在導光板方式液晶顯示器(以下有時會稱作「導光板方式LCD」),譬如有於背光(側光)使用LED(light emitting diode:發光二極體)的LED導光板方式LCD。譬如,在比導光板方式LCD之下板偏光板更靠近背光側的各光學薄膜中,可隔著空氣層積層各光學薄膜,該空氣層發揮將以光學上某一定程度以上之角度入射進來之光予以反射的作用。在LED導光板方式LCD中,譬如可依序積層反射板、導光板(含LED)、擴散板、稜鏡片、附擴散之稜鏡片、增亮薄膜(反射偏光薄膜)、下板偏光板。In the light guide plate type liquid crystal display (hereinafter sometimes referred to as "light guide plate type LCD"), for example, there is an LED light guide plate type LCD that uses LED (light emitting diode: light emitting diode) for backlight (side light). For example, in each optical film on the backlight side of the lower plate polarizer of a light guide plate type LCD, each optical film can be laminated with an air layer interposed therebetween. The effect of light reflection. In LCD with LED light guide plate, for example, reflective plate, light guide plate (including LED), diffuser plate, diffuser plate, diffuser plate with diffuser, brightening film (reflective polarizing film), and lower plate polarizer can be laminated sequentially.
但,前述空氣層存在時,譬如藉由光學薄膜伴隨LCD大型化而起之撓曲,恐引起光學特性降低等情況。又,譬如可能因異物進入前述空氣層,而降低導光板方式LCD於組裝步驟時的成品率。爰此,為了解決該等問題,能想到的是企圖不用空氣層便將各光學薄膜一體化並減少組裝步驟時之積層所需的各光學薄膜數。但,屆時若單純利用黏接著劑進行一體化,便可能會因為沒有發揮全反射作用的空氣層,而如前述變成斜角入射光不能被全反射而無法利用復歸反射。而且,藉此可能會降低光的利用效率。However, when the aforementioned air layer exists, for example, the optical properties may be lowered due to the deflection of the optical film accompanying the enlargement of the LCD. In addition, for example, foreign matters may enter the aforementioned air layer, which may lower the yield rate of the light guide plate type LCD during the assembly process. Therefore, in order to solve these problems, it is conceivable to attempt to integrate the optical films without using an air layer and to reduce the number of optical films required for lamination at the assembling step. However, if the integration is performed simply by using adhesives at that time, there may be no air layer for total reflection, and as mentioned above, the incident light at an oblique angle cannot be totally reflected, so retroreflection cannot be used. Moreover, there is a possibility that the utilization efficiency of light may be lowered thereby.
另一方面,為了解決前述問題,亦可考慮插入低折射率層來替代空氣層。但如前述,習知之低折射率層的折射率比空氣層高出許多,所以無法充分發揮作為空氣層的替代作用,依舊無法避免光學特性降低。相對於此,本發明之導光板方式液晶顯示器用光學片材的前述低折射率層之折射率極低為1.25以下,所以可發揮良好的光學特性。On the other hand, in order to solve the aforementioned problems, it may also be considered to insert a low refractive index layer instead of the air layer. However, as mentioned above, the refractive index of the known low-refractive index layer is much higher than that of the air layer, so it cannot fully play the role of replacing the air layer, and still cannot avoid the reduction of optical properties. On the other hand, in the optical sheet for a light guide plate type liquid crystal display of the present invention, the refractive index of the low refractive index layer is as low as 1.25 or less, so that good optical characteristics can be exhibited.
藉由本發明之導光板方式液晶顯示器用光學片材,譬如可使比LED導光板方式LCD之下板偏光板更靠背光側的光學薄膜一體化。又譬如,利用本發明使LED導光板方式LCD之各光學薄膜(譬如導光板與反射板或是導光板、反射板與擴散板)一體化,可減少LCD組裝步驟時的構件件數,所以可減少異物混入構件間的機會,改善組裝成品率。又譬如,可消除當光學薄膜(譬如反射板)隨著LCD大型化而因設置於構件時之撓曲造成光學特性降低(譬如亮度不均等)。With the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, an optical film that is closer to the backlight side than the polarizing plate of the lower plate of an LED light guide plate type LCD can be integrated. For another example, using the present invention to integrate the various optical films (such as light guide plate and reflector plate or light guide plate, reflector plate and diffuser plate) of LED light guide plate type LCD can reduce the number of components during the LCD assembly process, so it can Reduce the chance of foreign matter mixing between components and improve assembly yield. For another example, it can eliminate the reduction of optical properties (such as uneven brightness, etc.) caused by the deflection when the optical film (such as a reflector) is installed on the component as the size of the LCD increases.
另,若想將低折射率層固定在基材上直接使用,包含低折射率層之總厚度會隨基材厚度的量而增加,所以將低折射率層組裝至導光板方式LCD中使用時,導光板方式LCD本身的厚度也會增加。相對於此,譬如因為本發明之導光板方式液晶顯示器用光學片材不含基材,所以能夠薄型化。具體而言,譬如不含基材便幾乎沒有前述黏接著層本身厚度以外的厚度增加,從而可將低折射率層機能導入導光板方式LCD中。惟,本發明不限於此,譬如本發明之導光板方式液晶顯示器用光學片材亦可包含基材。In addition, if you want to fix the low-refractive index layer on the substrate and use it directly, the total thickness including the low-refractive index layer will increase with the thickness of the substrate. Therefore, when the low-refractive index layer is assembled into a light guide plate type LCD and used , The thickness of the LCD itself in the light guide plate method will also increase. On the other hand, for example, since the optical sheet for light guide plate type liquid crystal displays of this invention does not contain a base material, thickness reduction is possible. Specifically, for example, if the base material is not included, there is almost no increase in thickness other than the thickness of the adhesive layer itself, so that the function of the low-refractive index layer can be introduced into the light guide plate type LCD. However, the present invention is not limited thereto. For example, the optical sheet for a light guide plate type liquid crystal display of the present invention may also include a substrate.
又如前述,本發明之導光板方式液晶顯示器用光學片材譬如可以是前述低折射率層與前述第1光學薄膜及前述第2光學薄膜分別隔著黏接著層而積層。藉此,前述黏接著層可實質提升前述低折射率層的強度,保護其免受物理性的損傷。因此,可防止低折射率層的脆性變成致命的問題點。前述物理性的損傷具體來說,譬如當利用低折射率層使各光學薄膜一體化時,可能有低折射率層之強度不足的情況,以及因為各光學薄膜之熱膨脹係數的不同而造成低折射率層無法承受光學薄膜間之應變的情況。利用前述黏接著層,即可保護低折射率層免受前述光學薄膜間之應變影響。又譬如,藉由前述黏接著層,可彌補前述低折射率層的耐擦傷性,進而可保護前述低折射率層免於擦傷。而且,本發明之導光板方式液晶顯示器用光學片材可藉由前述黏接著層而貼附至其他構件上,因此很容易將前述低折射率層本身導入導光板方式LCD中。即,根據本發明之導光板方式液晶顯示器用光學片材,譬如可在維持具有高空隙率之低折射率層的狀態下,做到薄型化及低折射率層的物理性保護,更可在同時維持高透明性的狀態下,輕易地於其他導光板方式LCD中導入具有低折射率層的功能。Also as mentioned above, in the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, the low refractive index layer, the first optical film and the second optical film may be laminated via an adhesive layer. In this way, the aforementioned adhesive layer can substantially increase the strength of the aforementioned low refractive index layer and protect it from physical damage. Therefore, the brittleness of the low-refractive index layer can be prevented from becoming a fatal problem. The aforementioned physical damage, specifically, for example, when using a low refractive index layer to integrate the optical films, the strength of the low refractive index layer may be insufficient, and the low refractive index may be caused by the difference in thermal expansion coefficient of each optical film. The case where the layer cannot bear the strain between the optical films. By using the aforementioned adhesive layer, the low refractive index layer can be protected from the influence of the strain between the aforementioned optical films. For another example, the scratch resistance of the aforementioned low-refractive index layer can be supplemented by the aforementioned adhesive layer, thereby protecting the aforementioned low-refractive index layer from being scratched. Furthermore, since the optical sheet for a light guide plate type liquid crystal display of the present invention can be attached to other members through the aforementioned adhesive layer, it is easy to introduce the aforementioned low refractive index layer itself into a light guide plate type LCD. That is, according to the optical sheet for a light guide plate type liquid crystal display of the present invention, for example, it can achieve thinning and physical protection of the low refractive index layer while maintaining the low refractive index layer with a high porosity. While maintaining high transparency, it is easy to introduce the function of having a low refractive index layer into other light guide plate LCDs.
[1.導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器] 以下利用圖1、2及6,舉例說明本發明之導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器的構成。另,圖1、2及6雖為截面圖,但為了簡略圖示,省略了影線。[1. Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display] Hereinafter, the optical sheet for light guide plate type liquid crystal display of the present invention will be described as examples using FIGS. 1, 2 and 6. materials, a backlight unit for a light guide plate type liquid crystal display, and a configuration of a light guide plate type liquid crystal display. 1, 2, and 6 are cross-sectional views, but hatching is omitted for simplicity of illustration.
首先,於圖6之截面圖顯示不使用低折射率層的導光板方式液晶顯示器(導光板方式LCD)之構成一例。如同圖示,該導光板方式LCD6000係單元A1~A6由下按前述順序積層所構成。單元A1係由反射板1020所構成。單元A2係由導光板1010所構成。導光板1010具有側光。單元A3係由擴散板1090所構成。單元A4係稜鏡片1030及擴散片(附擴散之稜鏡片)1040由下按前述順序積層所構成。單元A5係由增亮薄膜1050所構成。單元A6係下板偏光板1060、黏著劑(黏接著層)1070及液晶面板1080由下按前述順序積層所構成。又,單元A1與A2之間及單元A2與A3之間分別配置有空氣層。First, an example of the configuration of a light guide plate type liquid crystal display (light guide plate type LCD) that does not use a low refractive index layer is shown in a cross-sectional view in FIG. 6 . As shown in the figure, the light guide plate type LCD6000 series units A1~A6 are formed by stacking the layers in the above order. Unit A1 is constituted by
又,於圖1之截面圖顯示本發明之導光板方式液晶顯示器(導光板方式LCD)之構成一例。如同圖示,該導光板方式LCD1000係單元A1及單元A2隔著黏接著層及低折射率層被一體化而形成了單元A12,除此以外與圖6之導光板方式LCD6000相同。較具體而言,該導光板方式LCD1000在單元A1與A2之間具有低折射率層20與黏接著層30之積層體來替代空氣層。該積層體於低折射率層20之兩面分別直接積層有黏接著層30。單元A1之反射板1020及單元A2之導光板1010則分別透過黏接著層30而接著(黏著)於低折射率層20上。如前述,藉此讓單元A1及單元A2被一體化而形成了單元A12。又,低折射率層20的折射率為1.25以下。單元A12相當於本發明之導光板方式液晶顯示器用光學片材。導光板1010及反射板1020可視為其任一者為前述第1光學薄膜,另一者為前述第2光學薄膜。又,單元A12為導光板方式液晶顯示器用光學片材,含有導光板1010,且導光板1010如前述具有側光。因此,單元A12也相當於本發明之導光板方式液晶顯示器用背光單元。1 shows an example of the configuration of a light guide plate type liquid crystal display (light guide plate type LCD) of the present invention. As shown in the figure, this light guide plate type LCD1000 is the same as the light guide plate type LCD6000 of FIG. More specifically, this light guide plate type LCD1000 has the laminated body of the low-refractive-
圖1之導光板方式LCD1000中,低折射率層20之折射率極低為1.25以下,近似空氣層之折射率,因此可發揮良好的光學特性。In the light
又,圖1之導光板方式LCD1000沒有用以固定低折射率層20的基材,所以能夠導入低折射率層20且不會有來自基材的厚度增加。藉此,可做到導光板方式LCD的薄型化。In addition, the light
此外,圖1之導光板方式LCD1000在低折射率層20之兩面積層有黏接著層30,因此能夠保護低折射率層20免受物理性的損傷。具體上,譬如可保護低折射率層20免受因為導光板1010及反射板1020之熱膨脹係數差異而來的應變影響。又,在將低折射率層20組裝至導光板方式LCD1000內的作業期間,可保護低折射率層20免於擦傷。In addition, the light
此外,圖1之導光板方式LCD1000在導光板1010及反射板1020之間沒有空氣層,因此可減少異物混入導光板1010及反射板1020之間的機會,改善組裝成品率。In addition, the light
又,於圖2之截面圖顯示本發明之導光板方式液晶顯示器(導光板方式LCD)之構成另一例。如同圖示,該導光板方式LCD2000係單元A12及單元A3隔著黏接著層及低折射率層被一體化而形成了單元A123,除此以外與圖1之導光板方式LCD1000相同。較具體而言,該導光板方式LCD2000在單元A12與A3之間具有低折射率層20與黏接著層30之積層體來替代空氣層。該積層體於低折射率層20之兩面分別直接積層有黏接著層30。單元A12之導光板1010及單元A3之擴散板1090則分別透過黏接著層30而接著(黏著)於低折射率層20上。如前述,藉此讓單元A12及單元A3被一體化而形成了單元A123。又,低折射率層20的折射率為1.25以下。單元A123相當於本發明之導光板方式液晶顯示器用光學片材。導光板1010及擴散板1090可視為其任一者為前述第1光學薄膜,另一者為前述第2光學薄膜。此外,與圖1之導光板方式LCD1000同樣地,導光板1010及反射板1020亦可視為其任一者為前述第1光學薄膜,另一者為前述第2光學薄膜。又,單元A123為導光板方式液晶顯示器用光學片材,含有導光板1010,且導光板1010如前述具有側光。因此,單元A123也相當於本發明之導光板方式液晶顯示器用背光單元。Also, another example of the configuration of the light guide plate type liquid crystal display (light guide plate type LCD) of the present invention is shown in the cross-sectional view of FIG. 2 . As shown in the figure, this light guide plate type LCD2000 is the same as the light guide plate type LCD1000 of FIG. More specifically, this light guide plate type LCD2000 has the laminated body of the low-refractive-
圖2之導光板方式LCD2000係藉由導光板1010及反射板1020分別透過黏接著層30而接著(黏著)至低折射率層20上,而可與圖1之導光板方式LCD1000發揮同樣的有利效果。又,圖2之導光板方式LCD2000係藉由導光板1010及擴散板1090分別透過黏接著層30而接著(黏著)至低折射率層20上,而可進一步發揮與前述同樣的有利效果。The light guide plate LCD2000 in FIG. 2 uses the
[2.導光板方式液晶顯示器用光學片材及其製造方法] 本發明之導光板方式液晶顯示器用光學片材的製造方法無特別限定,譬如可藉由下述方法來進行:前述本發明之第1導光板方式液晶顯示器用光學片材的製造方法、前述本發明之第2導光板方式液晶顯示器用光學片材的製造方法、或前述本發明之第3導光板方式液晶顯示器用光學片材的製造方法(本發明之導光板方式液晶顯示器用光學片材的製造方法)。以下舉例說明。另,以下有時會將本發明之導光板方式液晶顯示器用光學片材之構成要素的低折射率層稱作「本發明之低折射率層」。此外,有時會將製造本發明之低折射率層的方法稱作「本發明之低折射率層的製造方法」。[2. Optical sheet for light guide plate type liquid crystal display and its manufacturing method] The manufacturing method of the optical sheet for light guide plate type liquid crystal display of the present invention is not particularly limited, for example, it can be carried out by the following method: the aforementioned method of the present invention Method for producing the first optical sheet for a light guide plate type liquid crystal display, method for producing the aforementioned second optical sheet for a light guide plate type liquid crystal display of the present invention, or the aforementioned third optical sheet for a light guide plate type liquid crystal display of the present invention The production method (the production method of the optical sheet for the light guide plate type liquid crystal display of the present invention). The following example illustrates. In addition, below, the low-refractive-index layer which is a component of the optical sheet for light guide plate type liquid crystal displays of this invention may be called "the low-refractive-index layer of this invention." In addition, the method of manufacturing the low-refractive-index layer of this invention may be called "the manufacturing method of the low-refractive-index layer of this invention."
[2-1.低折射率層及其製造方法] 本發明之低折射率層譬如亦可由矽化合物所形成。另,本發明之低折射率層譬如亦可以為藉由微細孔粒子彼此之化學鍵結所形成的低折射率層。譬如,前述微細孔粒子亦可為凝膠的粉碎物。[2-1. Low-refractive-index layer and its manufacturing method] The low-refractive-index layer of the present invention may be formed of, for example, a silicon compound. In addition, the low-refractive-index layer of the present invention may also be, for example, a low-refractive-index layer formed by chemical bonding between microporous particles. For example, the aforementioned microporous particles may be a ground product of gel.
在本發明之低折射率層的製造方法中,譬如用以粉碎前述多孔體之凝膠的凝膠粉碎步驟亦可為1階段,不過宜分成多個粉碎階段進行。前述粉碎階段數並無特別限定,譬如可為2階段,亦可為3階段以上。In the method for producing the low-refractive index layer of the present invention, for example, the gel pulverization step for pulverizing the gel of the porous body may be performed in one stage, but it is preferably divided into a plurality of pulverization stages. The number of the aforementioned pulverization stages is not particularly limited, and may be, for example, two stages, or may be three or more stages.
在本發明之低折射率層的製造方法中,譬如亦可前述多個粉碎階段包含用以粉碎前述凝膠之第1粉碎階段及第2粉碎階段,前述第1粉碎階段係將前述凝膠粉碎做成體積平均粒徑0.5~100μm之粒子的階段,前述第2粉碎階段則係於前述第1粉碎階段後將前述粒子進一步粉碎做成體積平均粒徑10~1000nm之粒子的階段。又,在此情況下,前述多個粉碎階段可含或可不含前述第1粉碎階段及前述第2粉碎階段以外的粉碎階段。In the method for producing a low-refractive index layer of the present invention, for example, the plurality of pulverization stages may include a first pulverization stage and a second pulverization stage for pulverizing the gel, and the first pulverization stage is to pulverize the gel The stage of making particles with a volume average particle diameter of 0.5~100μm, the above-mentioned second crushing stage is the stage of further crushing the above-mentioned particles to make particles with a volume average particle diameter of 10~1000nm after the above-mentioned first crushing stage. Also, in this case, the plurality of pulverization stages may or may not include pulverization stages other than the first pulverization stage and the second pulverization stage.
另,本發明中,「粒子」(譬如前述凝膠之粉碎物的粒子等)之形狀並無特別限定,例如可為球狀亦可為非球狀系等。又,在本發明中,前述粉碎物之粒子例如亦可為溶膠凝膠串珠狀粒子、奈米粒子(空心奈米二氧化矽・奈米球粒子)、奈米纖維等。In addition, in the present invention, the shape of "particles" (such as particles of the above-mentioned pulverized gel) is not particularly limited, for example, it may be spherical or non-spherical. In addition, in the present invention, the particles of the pulverized product may be, for example, sol-gel beaded particles, nanoparticles (hollow nano-silicon dioxide/nanosphere particles), nanofibers, and the like.
在本發明中,譬如前述凝膠宜為多孔質凝膠,且前述凝膠之粉碎物宜為多孔質,但不受此限。In the present invention, for example, the aforementioned gel is preferably a porous gel, and the pulverized product of the aforementioned gel is preferably porous, but not limited thereto.
在本發明中,前述凝膠粉碎物亦可由具有譬如粒狀、纖維狀、平板狀之至少一種形狀之結構所構成。前述粒狀及平板狀之構成單元例如可由無機物所構成。又,前述粒狀構成單元之構成元素可含有例如選自於由Si、Mg、Al、Ti、Zn及Zr所構成群組中之至少一種元素。形成粒狀之結構體(構成單元)可為實心粒子亦可為中空粒子,具體上可列舉聚矽氧粒子或具有微細孔之聚矽氧粒子,二氧化矽中空奈米粒子或二氧化矽中空奈米球等。前述纖維狀之構成單元例如係直徑為奈米尺寸之奈米纖維,具體上可列舉纖維素奈米纖維或氧化鋁奈米纖維等。平板狀之構成單元可舉如奈米黏土,具體上可列舉奈米尺寸之膨土(例如Kunipia F[商品名])等。前述纖維狀之構成單元無特別限定,例如可為選自於由下列纖維所構成群組中之至少一種纖維狀物質:碳奈米纖維、纖維素奈米纖維、氧化鋁奈米纖維、幾丁質奈米纖維、幾丁聚醣奈米纖維、聚合物奈米纖維、玻璃奈米纖維及二氧化矽奈米纖維。In the present invention, the above-mentioned pulverized gel may also be constituted by a structure having at least one shape such as granular, fibrous, and flat. The above-mentioned granular and planar structural units can be composed of inorganic substances, for example. In addition, the constituent elements of the aforementioned granular constituent units may contain, for example, at least one element selected from the group consisting of Si, Mg, Al, Ti, Zn, and Zr. The granular structures (constituent units) can be solid particles or hollow particles, specifically polysiloxane particles or polysiloxane particles with fine pores, silica hollow nanoparticles or silica hollow particles. Nanospheres etc. The aforementioned fibrous constituent units are, for example, nanofibers with a diameter of nanometers, specifically cellulose nanofibers or alumina nanofibers. Examples of flat plate-shaped constituent units include nanoclay, and specifically, nanometer-sized bentonite (eg, Kunipia F [trade name]) and the like. The aforementioned fibrous constituent units are not particularly limited, for example, they may be at least one fibrous substance selected from the group consisting of the following fibers: carbon nanofibers, cellulose nanofibers, alumina nanofibers, chitin Fiber nanofibers, chitosan nanofibers, polymer nanofibers, glass nanofibers and silica nanofibers.
在本發明之低折射率層的製造方法中,前述凝膠粉碎步驟(譬如為前述多個粉碎階段,如前述第1粉碎階段及前述第2粉碎階段)譬如亦可在前述「其他溶劑」中進行。另,關於前述「其他溶劑」之詳細容後詳述。In the manufacturing method of the low-refractive index layer of the present invention, the above-mentioned gel pulverization step (for example, the aforementioned multiple pulverization stages, such as the aforementioned first pulverization stage and the aforementioned second pulverization stage) can also be carried out in the aforementioned "other solvents". conduct. In addition, details about the aforementioned "other solvents" will be described in detail later.
另,在本發明中,「溶劑」(譬如凝膠製造用溶劑、低折射率層製造用溶劑、置換用溶劑等)可以不用溶解凝膠或其粉碎物等,譬如亦可使前述凝膠或其粉碎物等分散或沉澱在前述溶劑中。In addition, in the present invention, "solvent" (such as a solvent for gel production, a solvent for low refractive index layer production, a solvent for replacement, etc.) does not need to dissolve the gel or its pulverized product, for example, the aforementioned gel or The pulverized product thereof is dispersed or precipitated in the aforementioned solvent.
前述第1粉碎階段後之前述凝膠的體積平均粒徑譬如可為0.5~100μm、1~100μm、1~50μm、2~20μm或3~10μm。前述第2粉碎階段後之前述凝膠的體積平均粒徑譬如可為10~1000nm、100~500nm或200~300nm。前述體積平均粒徑係表示含有前述凝膠之液體(含凝膠液體)中的前述粉碎物之粒度參差。前述體積平均粒徑例如可藉由動態光散射法、雷射繞射法等粒度分布評估裝置及掃描型電子顯微鏡(SEM)、穿透型電子顯微鏡(TEM)等電子顯微鏡等進行測定。The volume average particle diameter of the gel after the first crushing stage may be, for example, 0.5-100 μm, 1-100 μm, 1-50 μm, 2-20 μm, or 3-10 μm. The volume average particle diameter of the gel after the second pulverization stage may be, for example, 10-1000 nm, 100-500 nm, or 200-300 nm. The above-mentioned volume average particle diameter means the particle size variation of the above-mentioned pulverized material in the liquid containing the above-mentioned gel (gel-containing liquid). The volume average particle diameter can be measured, for example, by a particle size distribution evaluation device such as a dynamic light scattering method or a laser diffraction method, and an electron microscope such as a scanning electron microscope (SEM) or a transmission electron microscope (TEM).
又,前述第1粉碎階段後當下的前述液體之剪切黏度在10001/s之剪切速度下譬如可為50mPa/s以上、1000mPa・s以上、2000mPa・s以上或3000mPa・s以上,且可譬如為100Pa・s以下、50Pa・s以下或10Pa・s以下。前述第2粉碎階段後當下的前述液體之剪切黏度譬如可為1mPa・s以上、2mPa・s以上或3mPa・s以上,且可譬如為1000mPa・s以下、100mPa・s以下或50mPa・s以下。另,剪切黏度之測定方法無特別限定,譬如可如後述實施例中記載使用振動式黏度測定機(Sekonic Co.製、商品名FEM-1000V)進行測定。In addition, the shear viscosity of the liquid immediately after the first pulverization stage can be, for example, 50 mPa/s or more, 1000 mPa s or more, 2000 mPa s or 3000 mPa s or more at a shear rate of 1000 1/s, and can be For example, it is 100 Pa·s or less, 50 Pa·s or less, or 10 Pa·s or less. The shear viscosity of the liquid immediately after the second crushing stage may be, for example, 1 mPa·s or more, 2 mPa·s or more, or 3 mPa·s or more, and may be, for example, 1000 mPa·s or less, 100 mPa·s or less, or 50 mPa·s or less . In addition, the measuring method of a shear viscosity is not specifically limited, For example, it can measure using a vibratory viscosity measuring machine (made by Sekonic Co., trade name FEM-1000V) as described in the Example mentioned later.
在前述第1粉碎階段後,譬如可以是含有前述粒子之液體的剪切黏度為50mPa・s以上,且前述粒子之體積平均粒徑為0.5~50μm。After the first crushing stage, for example, the shear viscosity of the liquid containing the particles may be 50 mPa·s or more, and the volume average particle diameter of the particles may be 0.5 to 50 μm.
本發明之低折射率層的製造方法譬如宜於前述溶劑置換步驟後且最初的粉碎階段開始前包含濃度調整步驟,惟不含亦可,該濃度調整步驟係進行調整含有前述凝膠之液體的濃度。包含前述濃度調整步驟時,譬如在最初的粉碎階段開始時以後不宜進行含有前述凝膠之液體的濃度調整。The method for producing the low-refractive index layer of the present invention, for example, preferably includes a concentration adjustment step after the above-mentioned solvent replacement step and before the initial pulverization stage, but it may not be included. The concentration adjustment step is to adjust the concentration of the liquid containing the above-mentioned gel. concentration. When the concentration adjustment step is included, it is not appropriate to adjust the concentration of the gel-containing liquid after the initial pulverization stage, for example.
在前述濃度調整步驟中,可將含有前述多孔體凝膠之液體的凝膠濃度調整在譬如1重量%以上、1.5重量%以上、1.8重量%以上、2.0重量%以上或2.8重量%以上,且可調整在譬如5重量%以下、4.5重量%以下、4.0重量%以下、3.8重量%以下或3.4重量%以下。在前述濃度調整步驟中,可將含有前述凝膠之液體的凝膠濃度調整至譬如1~5重量%、1.5~4.0重量%、2.0~3.8重量%或2.8~3.4重量%。從在凝膠粉碎步驟中容易處理的觀點來看,為了不使黏度變得太高,前述凝膠濃度不宜過高。又,若從作為後述塗覆液使用的觀點來看,為了不使黏度變得太低,前述凝膠濃度不宜過低。含有前述凝膠之液體的凝膠濃度,譬如可測定前述液體之重量及去除前述液體之溶劑後的固體成分(凝膠)重量後,再將後者之測定值除以前者之測定值來算出。In the concentration adjusting step, the gel concentration of the liquid containing the porous body gel can be adjusted to, for example, 1% by weight or more, 1.5% by weight or more, 1.8% by weight or more, 2.0% by weight or more, or 2.8% by weight or more, and It can be adjusted to, for example, 5% by weight or less, 4.5% by weight or less, 4.0% by weight or less, 3.8% by weight or less, or 3.4% by weight or less. In the concentration adjusting step, the gel concentration of the liquid containing the gel can be adjusted to, for example, 1 to 5% by weight, 1.5 to 4.0% by weight, 2.0 to 3.8% by weight, or 2.8 to 3.4% by weight. From the viewpoint of ease of handling in the gel crushing step, the aforementioned gel concentration should not be too high in order not to make the viscosity too high. Also, from the viewpoint of use as a coating liquid described later, the aforementioned gel concentration should not be too low in order not to make the viscosity too low. The gel concentration of the liquid containing the gel can be calculated by, for example, measuring the weight of the liquid and the weight of the solid content (gel) after removing the solvent of the liquid, and dividing the measured value of the latter by the measured value of the former.
另,前述濃度調整步驟譬如為了適當調整含有前述凝膠之液體的凝膠濃度,亦可藉由添加溶劑來降低濃度或使溶劑揮發來提升濃度等。或譬如,前述濃度調整步驟中,如果測定含有前述凝膠之液體之凝膠濃度的結果,凝膠濃度適當,亦可無需降低濃度或提升濃度(濃度調整)便將含有前述凝膠之液體直接供於下一個步驟。又或者譬如,前述濃度調整步驟中,含有前述凝膠之液體的凝膠濃度無須測定便明白地可知是恰當的,則亦可不進行任何測定及濃度調整便將含有前述凝膠之液體直接供於下一個步驟。In addition, in the concentration adjusting step, for example, in order to properly adjust the gel concentration of the liquid containing the gel, the concentration may be decreased by adding a solvent or increased by volatilizing the solvent. Or for example, in the aforementioned concentration adjustment step, if the result of measuring the gel concentration of the liquid containing the aforementioned gel shows that the gel concentration is appropriate, the liquid containing the aforementioned gel can be directly mixed with the liquid without reducing the concentration or increasing the concentration (concentration adjustment). for the next step. Or for example, in the above-mentioned concentration adjustment step, the gel concentration of the liquid containing the above-mentioned gel is clearly known to be appropriate without measurement, and the liquid containing the above-mentioned gel can be directly supplied to the next step.
在前述凝膠粉碎步驟中,從最初的粉碎階段要開始之前起算至最後的粉碎階段結束後之當下為止,含有前述凝膠之液體的重量%濃度變化譬如亦可為±3%以內、±2.8%以內、±2.6%以內、±2.4%以內或±2.2%以內。In the above-mentioned gel pulverization step, from immediately before the first pulverization stage to the moment after the final pulverization stage, the weight % concentration change of the liquid containing the gel may be within ±3%, ±2.8%, for example. Within %, within ±2.6%, within ±2.4%, or within ±2.2%.
在本發明之低折射率層的製造方法中,宜在前述溶劑置換步驟之前進一步包含凝膠形態控制步驟,其係控制前述凝膠的形狀及大小。在前述凝膠形態控制步驟中,宜進行控制不讓凝膠的大小變得太小。因為,只要凝膠的大小沒有太小,便可藉由在被粉碎得很細的凝膠周圍附著多量的溶劑,來輕易地防止溶劑濃度的測定值比實際濃度低、溶劑殘留而變得比實際濃度高或進一步測定參差變大等問題。也因為在前述溶劑置換步驟之前,只要凝膠的大小沒有太大,溶劑置換效率即佳。又,在前述凝膠形態控制步驟後,宜進行控制讓各凝膠的大小幾乎均一。因為,只要各凝膠的大小幾乎均一,便可抑制含凝膠粉碎物液體之各批次(lot)間的凝膠粉碎物粒徑及凝膠濃度等的參差,而輕易地獲得均一性極佳的含凝膠粉碎物液體。In the manufacturing method of the low-refractive index layer of the present invention, it is preferable to further include a gel morphology control step before the solvent replacement step, which is to control the shape and size of the gel. In the aforementioned gel morphology control step, control is preferably performed so that the size of the gel does not become too small. Because, as long as the size of the gel is not too small, a large amount of solvent can be attached around the finely pulverized gel to easily prevent the measured value of the solvent concentration from being lower than the actual concentration. The actual concentration is high or the further measurement variation becomes larger and other problems. Also because before the aforementioned solvent replacement step, as long as the size of the gel is not too large, the solvent replacement efficiency is good. Also, after the aforementioned gel shape control step, it is preferable to control so that the size of each gel is almost uniform. Because, as long as the size of each gel is almost uniform, it is possible to suppress the variation in the particle size of the gel pulverized product and the concentration of the gel between batches (lots) of the liquid containing the gel pulverized product, and obtain extremely uniformity easily. The best liquid containing gel powder.
在前述凝膠形態控制步驟中,可將前述凝膠之短徑控制成譬如0.5cm以上、0.6cm以上、0.7cm以上或0.8cm以上,且亦可控制成譬如15cm以下、13cm以下、10cm以下或8cm以下。又,在前述凝膠形態控制步驟中,可將前述凝膠之長徑控制成譬如30cm以下、小於30cm、28cm以下、25cm以下或20cm以下,且亦可控制成譬如1cm以上、2cm以上、3cm以上、4cm以上或5cm以上。另,在本發明中,立體(3維體)的「短徑」係指在可測定前述立體之長度的部位,於長度變最短之處測得的長度。而且在本發明中,立體(3維體)的「長徑」係指在可測定前述立體之長度的部位,於長度變最長之處測得的長度。In the aforementioned gel shape control step, the short axis of the aforementioned gel can be controlled to be, for example, 0.5 cm or more, 0.6 cm or more, 0.7 cm or more, or 0.8 cm or more, and can also be controlled, for example, to be less than 15 cm, less than 13 cm, or less than 10 cm. Or less than 8cm. Also, in the aforementioned gel shape control step, the long axis of the aforementioned gel can be controlled to be, for example, less than 30 cm, less than 30 cm, less than 28 cm, less than 25 cm, or less than 20 cm, and can also be controlled to be, for example, more than 1 cm, more than 2 cm, or 3 cm. Above, above 4cm or above 5cm. In addition, in the present invention, the "short axis" of a solid (three-dimensional body) refers to the length measured at the shortest point at the position where the length of the aforementioned solid can be measured. Furthermore, in the present invention, the "major axis" of a solid (3-dimensional body) refers to the length measured at the point where the length of the solid (three-dimensional body) becomes longest at the position where the length of the aforementioned solid can be measured.
前述凝膠在前述凝膠形態控制步驟後的形狀並無特別限定,譬如控制成長方體(亦含立方體)、圓柱形、多角形立體(譬如三角柱、六角柱等多角柱)、球型或橢圓球(譬如像橄欖球的形狀)等即可。在前述凝膠形態控制步驟後,將前述凝膠之形狀控制成長方體或幾乎是長方體,既簡便又理想。在前述凝膠形態控制步驟中,將前述凝膠控制成長方體時,可將短邊控制成譬如0.5cm以上、0.6cm以上、0.7cm以上或0.8cm以上,且亦可控制成譬如15cm以下、13cm以下、10cm以下或8cm以下。又,在前述凝膠形態控制步驟中,將前述凝膠控制成長方體時,可將長邊控制成譬如30cm以下、小於30cm、28cm以下、25cm以下或20cm以下,且亦可控制成譬如1cm以上、2cm以上、3cm以上、4cm以上或5cm以上。另,在本發明中,長方體的「短邊」指最短邊,「長邊」指最長邊。The shape of the above-mentioned gel after the above-mentioned gel shape control step is not particularly limited, for example, it is controlled into a cuboid (also including a cube), a cylinder, a polygonal three-dimensional (such as a triangular prism, a hexagonal prism, etc.), spherical or ellipsoid (such as the shape of a football) and so on. After the aforementioned gel shape control step, it is convenient and ideal to control the shape of the aforementioned gel into a cuboid or almost a cuboid. In the above-mentioned gel shape control step, when the above-mentioned gel is controlled into a cuboid, the short side can be controlled to be, for example, 0.5 cm or more, 0.6 cm or more, 0.7 cm or more, or 0.8 cm or more, and can also be controlled to be, for example, 15 cm or less, Below 13cm, below 10cm or below 8cm. In addition, in the aforementioned gel shape control step, when the aforementioned gel is controlled into a cuboid, the long side can be controlled to be, for example, less than 30 cm, less than 30 cm, less than 28 cm, less than 25 cm, or less than 20 cm, and can also be controlled to be more than 1 cm, for example. , 2cm or more, 3cm or more, 4cm or more or 5cm or more. In addition, in the present invention, the "short side" of a cuboid means the shortest side, and the "long side" means the longest side.
前述凝膠形態控制步驟譬如可在製造前述凝膠之前述凝膠製造步驟後進行,亦可在前述凝膠製造步驟中(與前述凝膠製造步驟同時)進行。較具體來說,如以下所述。The aforementioned gel morphology control step may be performed, for example, after the aforementioned gel manufacturing step for manufacturing the aforementioned gel, or may be performed during the aforementioned gel manufacturing step (simultaneously with the aforementioned gel manufacturing step). More specifically, it is as follows.
在前述凝膠形態控制步驟中,譬如亦可在前述凝膠被固定之狀態下將前述凝膠予以裁切,藉以將前述凝膠控制成前述立體。在前述凝膠之脆性極高的情況下,裁切凝膠時,不管裁切方向如何,都有凝膠可能發生不均勻崩裂之虞。爰此,藉由固定凝膠四周,於裁切時施加的壓縮方向之壓力就能均勻地加在凝膠本身上,因此可沿裁切方向將凝膠均勻地裁切。譬如,前述凝膠在前述溶劑置換步驟前的形狀幾乎是長方體,則亦可在前述凝膠形態控制步驟中,藉由前述幾乎是長方體的凝膠表面之6面中有5面與其他物質相接觸來固定前述凝膠,並且在其他1面露出之狀態下從前述露出面對前述凝膠插入裁切夾具,來裁切前述凝膠。前述裁切夾具並無特別限定,可舉如切刀、金屬線狀的細條形狀的夾具、薄且銳利的板狀形狀的夾具等。又,前述凝膠之裁切譬如亦可在前述其他溶劑中進行。In the aforementioned step of controlling the shape of the gel, for example, the aforementioned gel may be cut while the aforementioned gel is fixed, so as to control the aforementioned stereoscopic shape of the aforementioned gel. In the case of the above-mentioned extremely high brittleness of the gel, when cutting the gel, there is a possibility that the gel may crack unevenly regardless of the cutting direction. Therefore, by fixing the surrounding of the gel, the pressure in the compression direction applied during cutting can be evenly applied to the gel itself, so the gel can be cut uniformly along the cutting direction. For example, the shape of the aforementioned gel before the aforementioned solvent replacement step is almost a cuboid, and in the aforementioned gel shape control step, 5 of the 6 faces of the aforementioned almost rectangular parallelepiped gel surface are in contact with other substances. The gel is fixed by contact, and the gel is cut by inserting a cutting jig from the exposed surface with the other side exposed. The cutting jig is not particularly limited, and examples thereof include a cutter, a wire-like strip-shaped jig, a thin and sharp plate-shaped jig, and the like. In addition, the cutting of the above-mentioned gel can also be performed in the above-mentioned other solvents, for example.
又譬如在前述凝膠製造步驟中,亦可使前述凝膠之原料在與前述立體之形狀及大小對應的模板(容器)內固化,藉以將前述凝膠控制成前述立體。藉此,即使凝膠之脆性極高,也無須裁切前述凝膠即可將前述凝膠控制成預定的形狀及大小,因此在裁切凝膠時,可防止凝膠無關乎裁切方向發生不均勻崩壞的情況。For another example, in the aforementioned gel manufacturing step, the raw material of the aforementioned gel can also be solidified in a template (container) corresponding to the shape and size of the aforementioned three-dimensional, so as to control the aforementioned gel into the aforementioned three-dimensional. In this way, even if the gel is extremely brittle, the gel can be controlled into a predetermined shape and size without cutting the gel, so when cutting the gel, it can prevent the gel from occurring irrespective of the cutting direction. The case of uneven collapse.
又,在本發明之低折射率層的製造方法中,譬如亦可於最初的粉碎階段結束後、最後的粉碎階段結束前,測定含有前述凝膠之液體(含凝膠液體)的凝膠濃度,並僅將前述凝膠濃度在預定數值範圍內的前述液體供給於其後之粉碎階段。另,在測定凝膠濃度時必須為均勻的液體,所以於前述粉碎階段結束後,宜已成為具有某程度之高黏度且不易發生固液分離的液體。如前述,若從含凝膠液體之易處置性的觀點來看,為了不使黏度變得太過,凝膠濃度不宜過高;若從作為塗覆液使用的觀點來看,為了不使黏度變得太低,凝膠濃度不宜過低。譬如,若從這類的觀點來看,則亦可一貫地僅供給前述凝膠濃度在預定數值範圍內之液體,直到最終的粉碎階段結束後為止。前述凝膠濃度之預定數值範圍係如同前述,譬如可亦可為2.8重量%以上且3.4重量%以下,惟不限於此。又,前述凝膠濃度測定(濃度管理)如前述可在最初的粉碎階段結束後、最後的粉碎階段結束前進行,不過亦可另外於前述溶劑置換步驟後且前述凝膠粉碎步驟前與最終的粉碎階段(譬如前述第2粉碎階段)後之其中一者或兩者進行,或乾脆取而代之。而且,於前述凝膠濃度測定後,譬如僅將前述凝膠濃度在預定數值範圍內之前述液體供給於其後的粉碎階段,或是提供作為完成品的含凝膠粉碎物液體。又,於前述溶劑置換步驟後且前述凝膠粉碎步驟前進行前述凝膠濃度測定時,其後亦可視需求進行前述濃度調整步驟。In addition, in the method for producing the low-refractive index layer of the present invention, for example, the gel concentration of the liquid containing the gel (gel-containing liquid) may be measured after the first pulverization stage is completed and before the final pulverization stage is completed. , and only the aforementioned liquid having the aforementioned gel concentration within a predetermined numerical range is supplied to the subsequent crushing stage. In addition, when measuring the gel concentration, it must be a uniform liquid. Therefore, after the above-mentioned pulverization stage is completed, it should become a liquid with a certain degree of high viscosity and is not prone to solid-liquid separation. As mentioned above, from the point of view of the ease of handling of the gel-containing liquid, in order not to make the viscosity too high, the gel concentration should not be too high; from the point of view of use as a coating liquid, in order not to make the viscosity becomes too low, the gel concentration should not be too low. For example, from such a point of view, it is also possible to supply only the liquid whose gel concentration is within a predetermined numerical range until the final pulverization stage is completed. The predetermined numerical range of the aforementioned gel concentration is the same as the aforementioned, for example, it may also be more than 2.8% by weight and less than 3.4% by weight, but it is not limited thereto. In addition, the above-mentioned gel concentration measurement (concentration management) can be carried out after the completion of the first pulverization stage and before the completion of the final pulverization stage as described above, but it can also be performed after the aforementioned solvent replacement step and before the aforementioned gel pulverization step. One or both of them after the crushing stage (such as the aforementioned second crushing stage), or simply replace them. Furthermore, after the measurement of the gel concentration, for example, only the liquid having the gel concentration within a predetermined numerical range is supplied to the subsequent pulverization stage, or a liquid containing a gel pulverized product is provided as a finished product. In addition, when the gel concentration measurement is performed after the solvent replacement step and before the gel pulverization step, the concentration adjustment step may be performed thereafter if necessary.
另,在前述溶劑置換步驟後且前述凝膠粉碎步驟前的濃度管理,因為附著於凝膠的溶劑量不穩定,所以濃度測定值之每一測定的參差可能會變大。因此,宜於前述溶劑置換步驟後且前述凝膠粉碎步驟前之濃度管理之前,藉由前述的凝膠形態控制步驟將前述凝膠之形狀及大小控制成幾乎均一。藉此,便可穩定地測定濃度。又,藉此,譬如可單一地且精度良好地管理前述含凝膠液體的凝膠濃度。In addition, in the concentration management after the solvent replacement step and before the gel pulverization step, since the amount of solvent adhered to the gel is not stable, there is a possibility that the concentration measurement value may vary greatly from one measurement to another. Therefore, it is preferable to control the shape and size of the gel to be almost uniform by the gel shape control step after the solvent replacement step and before the concentration management before the gel pulverization step. Thereby, the concentration can be measured stably. Also, by this, for example, the gel concentration of the gel-containing liquid can be managed uniformly and with high precision.
在本發明之低折射率層的製造方法中,前述多個粉碎階段之至少一個宜與其他的至少一個粉碎階段在粉碎方式上互異。前述多個粉碎階段的粉碎方式可全部互異,亦可為以相同的粉碎方式進行的粉碎階段。譬如,前述多個粉碎階段為3階段時,可以3階段全部互異的方式(即使用3種粉碎方式)進行,亦可以相同的粉碎方式來進行其中任2個粉碎階段,且僅有其他的1個粉碎階段以不同的粉碎方式進行。另,粉碎方式並無特別限定,譬如有後述之空蝕方式、無介質(medialess)方式等。In the manufacturing method of the low-refractive index layer of the present invention, at least one of the aforementioned plurality of pulverization stages is preferably different from the other at least one pulverization stage in the pulverization method. The pulverization methods of the aforementioned plurality of pulverization stages may all be different, or may be pulverization stages performed in the same pulverization method. For example, when the aforesaid multiple crushing stages are three stages, it can be carried out in a manner in which all three stages are different (that is, using three crushing methods), or any two crushing stages can be carried out in the same crushing method, and only the other A crushing stage is carried out with different crushing methods. In addition, the pulverization method is not particularly limited, and there are, for example, a cavitation method and a medialess method described later.
在本發明之低折射率層的製造方法中,前述含凝膠粉碎物液體譬如為含有將前述凝膠粉碎所得粒子(粉碎物之粒子)的溶膠液。In the method for producing a low-refractive index layer of the present invention, the liquid containing the pulverized gel is, for example, a sol solution containing particles obtained by pulverizing the gel (particles of the pulverized product).
在本發明之低折射率層的製造方法中,亦可前述多個粉碎階段包含粗粉碎階段及正式粉碎階段,藉由前述粗粉碎階段取得塊狀溶膠粒子後,利用前述正式粉碎階段取得維持多孔質凝膠網狀結構的溶膠粒子。In the manufacturing method of the low-refractive index layer of the present invention, the above-mentioned multiple pulverization stages may also include a coarse pulverization stage and a main pulverization stage. Sol particles with a gel network structure.
本發明之低折射率層的製造方法譬如於前述多個階段之粉碎階段的至少一者(譬如前述第1粉碎階段及前述第2粉碎階段之至少一者)後,進一步包含將前述凝膠之粒子進行分級的分級步驟。The manufacturing method of the low-refractive index layer of the present invention, for example, after at least one of the pulverizing stages of the aforementioned multiple stages (for example, at least one of the aforementioned first pulverizing stage and the aforementioned second pulverizing stage), further comprises mixing the aforementioned gel Particles are classified in a classification step.
本發明之低折射率層的製造方法包含譬如凝膠化步驟,其係使塊狀多孔體在溶劑中凝膠化而做成前述凝膠。此時,譬如在前述多個階段之粉碎階段中最初的粉碎階段(譬如前述第1粉碎階段)中,會使用藉由前述凝膠化步驟而凝膠化的前述凝膠。The method for producing the low-refractive index layer of the present invention includes, for example, a gelation step of gelling the bulky porous body in a solvent to form the aforementioned gel. In this case, for example, in the first pulverization stage (for example, the first pulverization stage) among the pulverization stages described above, the gel gelled in the gelation step is used.
本發明之低折射率層的製造方法包含譬如熟成步驟,其係使已凝膠化之前述凝膠在溶劑中熟成。此時,譬如在前述多個階段之粉碎階段中最初的粉碎階段(譬如前述第1粉碎階段)中,會使用前述熟成步驟後之前述凝膠。The method for producing the low-refractive index layer of the present invention includes, for example, a curing step of curing the gelled gel in a solvent. In this case, for example, the gel after the aging step is used in the first pulverization stage (for example, the first pulverization stage) among the pulverization stages of the aforementioned plurality of stages.
本發明之低折射率層的製造方法譬如會在前述凝膠化步驟後進行前述溶劑置換步驟,即將前述溶劑置換成其他溶劑。此時,譬如在前述多個階段之粉碎階段中最初的粉碎階段(譬如前述第1粉碎階段)中,會使用前述其他溶劑中之前述凝膠。The manufacturing method of the low-refractive-index layer of the present invention, for example, performs the solvent replacement step after the gelation step, that is, replaces the solvent with another solvent. In this case, for example, in the first pulverization stage (for example, the first pulverization stage) among the pulverization stages described above, the aforementioned gel in the aforementioned other solvent is used.
在本發明之低折射率層的製造方法中之前述多階段之粉碎階段的至少一者(譬如前述第1粉碎階段及前述第2粉碎階段之至少一者)中,譬如會在測定前述液體之剪切黏度的同時,控制前述多孔體之粉碎。In at least one of the aforementioned multi-stage crushing stages (for example, at least one of the aforementioned first crushing stage and the aforementioned second crushing stage) in the manufacturing method of the low-refractive index layer of the present invention, for example, in the measurement of the aforementioned liquid While shearing the viscosity, the pulverization of the aforementioned porous body is controlled.
譬如,藉由高壓無介質粉碎,來進行本發明之低折射率層的製造方法中之前述多階段之粉碎階段的至少一者(譬如前述第1粉碎階段及前述第2粉碎階段之至少一者)。For example, at least one of the above-mentioned multi-stage pulverization stages (such as at least one of the aforementioned first pulverization stage and the aforementioned second pulverization stage) in the manufacturing method of the low refractive index layer of the present invention is carried out by high-pressure medium-free pulverization. ).
在本發明之低折射率層的製造方法中,前述凝膠係譬如至少含有3官能以下之飽和鍵官能基的矽化合物之凝膠。In the manufacturing method of the low-refractive-index layer of the present invention, the above-mentioned gel is, for example, a gel of a silicon compound containing at least a trifunctional or less saturated bond functional group.
另,以下在本發明之低折射率層的製造方法中,藉由包含前述凝膠粉碎步驟之步驟製得的含凝膠粉碎物液體有時會稱作「本發明之含凝膠粉碎物液體」。In addition, hereinafter in the method for producing a low-refractive index layer of the present invention, the gel-containing pulverized product liquid obtained by the step including the aforementioned gel pulverizing step may be referred to as "the gel-containing pulverized product liquid of the present invention." ".
根據本發明之含凝膠粉碎物液體,譬如可藉由形成其塗覆膜,使前述塗覆膜中之前述粉碎物彼此行化學鍵結,來形成作為機能性多孔體的前述本發明之低折射率層。根據本發明之含凝膠粉碎物液體,譬如可對各種對象物賦予前述本發明之低折射率層。因此,本發明之含凝膠粉碎物液體及其製造方法譬如在製造前述本發明之低折射率層時相當有用。According to the gel pulverized product liquid of the present invention, for example, by forming its coating film, the aforementioned pulverized products in the coating film are chemically bonded to each other to form the aforementioned low-refractive material of the present invention as a functional porous body. rate layer. According to the gel pulverized product-containing liquid of the present invention, for example, the low-refractive index layer of the present invention can be provided to various objects. Therefore, the gel pulverized product-containing liquid of the present invention and its production method are very useful, for example, in the production of the aforementioned low-refractive index layer of the present invention.
本發明之含凝膠粉碎物液體具有譬如極佳的均勻性,因此譬如將前述本發明之低折射率層應用在光學構件等用途時,其外觀相當良好。The liquid containing the pulverized gel of the present invention has, for example, excellent uniformity, so for example, when the low-refractive index layer of the present invention is applied to applications such as optical components, its appearance is quite good.
本發明之含凝膠粉碎物液體譬如亦可為用來將前述含凝膠粉碎物液體塗覆(塗佈)於基板上並進一步乾燥,而製得具有高空隙率之層(低折射率層)的含凝膠粉碎物液體。又,本發明之含凝膠粉碎物液體譬如亦可為用來製得高空隙率多孔體(厚度大或塊狀的成批物(bulk body))的含凝膠粉碎物液體。前述成批物譬如可使用前述含凝膠粉碎物液體進行成批製膜而製得。The gel-containing pulverized product liquid of the present invention, for example, can also be used to apply (coat) the above-mentioned gel-containing pulverized product liquid on a substrate and further dry it to obtain a layer with a high porosity (low-refractive index layer) ) liquid containing gel powder. In addition, the gel-containing pulverized product liquid of the present invention may be, for example, a gel-containing pulverized product liquid for producing a high-porosity porous body (large thickness or bulk body). The aforementioned batch product can be produced, for example, by performing batch film formation using the aforementioned liquid containing the pulverized gel.
如前述,本發明之低折射率層亦可為空隙層。以下,本發明之低折射率層為空隙層時,有時會稱作「本發明之空隙層」。譬如可藉由包含下列步驟之製造方法來製造具有高空隙率的前述本發明之空隙層:製造前述本發明之含凝膠粉碎物液體的步驟、將前述含凝膠粉碎物液體塗覆於基板上形成塗覆膜的步驟、及使前述塗覆膜乾燥的步驟。As mentioned above, the low refractive index layer of the present invention can also be a void layer. Hereinafter, when the low refractive index layer of the present invention is a void layer, it may be referred to as "the void layer of the present invention". For example, the void layer of the present invention having a high porosity can be produced by a production method comprising the steps of producing the liquid containing the pulverized gel of the present invention, and applying the liquid containing the pulverized gel to a substrate. A step of forming a coating film, and a step of drying the coating film.
又,譬如亦可藉由包含下列步驟之製造方法來製造積層薄膜捲料:製造前述本發明之含凝膠粉碎物液體;旋出捲狀之前述樹脂薄膜;於被旋出之前述樹脂薄膜上塗覆前述含凝膠粉碎物液體,以形成塗覆膜;使前述塗覆膜乾燥;及,於前述乾燥步驟後,將前述樹脂薄膜上形成有前述本發明之低折射率層之積層薄膜予以捲取。這種製造方法以下有時會稱為「本發明之積層薄膜捲料的製造方法」。又,以下藉由本發明之積層薄膜捲料的製造方法製得的積層薄膜捲料有時會稱為「本發明之積層薄膜捲料」。Also, for example, a laminated film roll can also be produced by a production method comprising the following steps: producing the liquid containing the pulverized gel of the present invention; unwinding the roll-shaped aforementioned resin film; coating the unwound aforementioned resin film. Coating the above-mentioned liquid containing the pulverized gel to form a coating film; drying the above-mentioned coating film; and, after the above-mentioned drying step, rolling the laminated film in which the above-mentioned low-refractive index layer of the present invention is formed on the above-mentioned resin film Pick. Hereinafter, this manufacturing method may be referred to as "the manufacturing method of the laminated film coil of the present invention". In addition, the laminated film coil produced by the manufacturing method of the laminated film coil of this invention is sometimes called "the laminated film coil of this invention" below.
[2-2.含凝膠粉碎物液體及其製造方法] 本發明之含凝膠粉碎物液體含有譬如利用前述凝膠粉碎步驟(譬如前述第1粉碎階段及前述第2粉碎階段)粉碎的凝膠粉碎物及前述其他溶劑。[2-2. Gel-containing pulverized product liquid and its production method] The gel-containing pulverized product liquid of the present invention contains, for example, the gel pulverized by the aforementioned gel pulverization step (for example, the aforementioned first pulverization stage and the aforementioned second pulverization stage). Gum powder and other solvents mentioned above.
本發明之低折射率層的製造方法譬如同前述,可包含多階段用以粉碎前述凝膠(譬如多孔體凝膠)的凝膠粉碎步驟,譬如可包含前述第1粉碎階段及前述第2粉碎階段。以下,主要舉例來說明本發明之含凝膠粉碎物液體的製造方法包含前述第1粉碎階段及前述第2粉碎階段之情況。以下主要說明前述凝膠為多孔體(多孔體凝膠)之情況。但,本發明不限於此,前述凝膠為多孔體以外之情況亦可類推適用前述凝膠為多孔體(多孔體凝膠)之情況的說明。另,以下本發明之低折射率層的製造方法中的前述多個粉碎階段(譬如前述第1粉碎階段及前述第2粉碎階段)有時會合併稱作「凝膠粉碎步驟」。The method for producing the low-refractive index layer of the present invention, for example, may include a multi-stage gel pulverization step for pulverizing the aforementioned gel (such as a porous body gel), such as the aforementioned first pulverization stage and the aforementioned second pulverization step. stage. Hereinafter, the case where the method for producing a gel-containing pulverized product liquid of the present invention includes the aforementioned first pulverizing step and the aforementioned second pulverizing step will be mainly described by way of example. Hereinafter, the case where the aforementioned gel is a porous body (porous body gel) will be mainly described. However, the present invention is not limited thereto, and the description of the case where the aforementioned gel is a porous body (porous body gel) can also be analogously applied to cases other than the aforementioned gel being a porous body. In addition, the above-mentioned multiple pulverization stages (for example, the aforementioned first pulverization stage and the aforementioned second pulverization stage) in the manufacturing method of the low-refractive index layer of the present invention are sometimes collectively referred to as the "gel pulverization step".
本發明之含凝膠粉碎物液體如後述可用於製造能發揮與空氣層相同機能(譬如低折射性)的機能性多孔體。前述機能性多孔體譬如亦可為本發明之低折射率層。具體上,藉由本發明製造方法製得之含凝膠粉碎物液體含有前述多孔體凝膠之粉碎物,前述粉碎物係未粉碎之前述多孔體凝膠的三維結構被破壞,而得以形成與前述未粉碎之多孔體凝膠迥異的新型三維結構。因此,譬如使用前述含凝膠粉碎物液體形成的塗覆膜(機能性多孔體之前驅物),就變成形成有以使用前述未粉碎之多孔體凝膠形成之層所無法取得的新型孔結構(新型的空隙結構)之層。藉此,前述層可發揮與空氣層相同的機能(譬如相同的低折射性)。又,本發明之含凝膠粉碎物液體譬如可藉由前述粉碎物含有殘留矽烷醇基,形成了作為前述塗覆膜(機能性多孔體之前驅物)之新型的三維結構後,使前述粉碎物彼此行化學鍵結。藉此,所形成的機能性多孔體雖為具有空隙的結構,仍可維持充分的強度及可撓性。因此,根據本發明,可容易且簡便地將機能性多孔體賦予給各種對象物。藉由本發明製造方法製得的含凝膠粉碎物液體譬如在可作為空氣層之代替品的前述多孔質結構之製造中非常有用。又,前述空氣層必須像是使構件與構件兩者間隔著隔件等設置間隙予以積層,藉以在前述構件間形成空氣層。但,使用本發明之含凝膠粉碎物液體形成的前述機能性多孔體,只要配置在該目的部位上,便可發揮與前述空氣層相同的機能。因此,如前述,可比形成前述空氣層更容易且簡便地將與前述空氣層相同的機能賦予給各種對象物。The liquid containing the pulverized gel of the present invention can be used to produce a functional porous body that can exhibit the same function as an air layer (such as low refractivity) as described later. The aforementioned functional porous body may also be the low refractive index layer of the present invention, for example. Specifically, the gel-containing pulverized product liquid obtained by the production method of the present invention contains the pulverized product of the porous body gel, and the three-dimensional structure of the unground porous body gel is destroyed to form a A new three-dimensional structure with different gels in the uncompressed porous body. Therefore, for example, the coating film (precursor of the functional porous body) formed by using the liquid containing the above-mentioned pulverized gel has a new type of pore structure that cannot be obtained by using the layer formed by using the non-pulverized porous gel. (new type of void structure) layer. Thereby, the aforementioned layer can exhibit the same function (for example, the same low refractivity) as that of the air layer. In addition, the liquid containing the gel pulverized product of the present invention can be made, for example, after the pulverized product contains residual silanol groups to form a new three-dimensional structure as the aforementioned coating film (precursor of a functional porous body), and then the pulverized product can be substances chemically bond to each other. Thereby, although the formed functional porous body has a structure having voids, sufficient strength and flexibility can be maintained. Therefore, according to the present invention, a functional porous body can be provided to various objects easily and simply. The gel-containing pulverized product liquid obtained by the production method of the present invention is very useful, for example, in the production of the aforementioned porous structure that can be used as a substitute for an air layer. In addition, the air layer must be stacked between the members with a space provided such as a spacer to form an air layer between the members. However, the functional porous body formed by using the liquid containing the pulverized gel of the present invention can exhibit the same function as the air layer as long as it is placed on the target site. Therefore, as described above, the same function as the air layer can be imparted to various objects more easily and simply than forming the air layer.
本發明之含凝膠粉碎物液體亦可為譬如前述機能性多孔體的形成用溶液或低折射層的形成用溶液。在本發明之含凝膠粉碎物液體中,前述多孔體為其粉碎物。The gel pulverized product-containing liquid of the present invention may be, for example, the above-mentioned solution for forming a functional porous body or a solution for forming a low-refractive layer. In the gel pulverized product-containing liquid of the present invention, the aforementioned porous body is its pulverized product.
在本發明之含凝膠粉碎物液體中,粉碎物(多孔體凝膠之粒子)的體積平均粒徑範圍譬如為10~1000nm,或100~500nm,或200~300nm。前述體積平均粒徑表示前述粉碎物在本發明之含凝膠粉碎物液體中的粒度參差。前述體積平均粒徑如前述,例如可藉由動態光散射法、雷射繞射法等粒度分布評估裝置及掃描型電子顯微鏡(SEM)、穿透型電子顯微鏡(TEM)等電子顯微鏡等進行測定。In the gel pulverized product-containing liquid of the present invention, the volume average particle diameter of the pulverized product (particles of the porous gel) is, for example, in the range of 10 to 1000 nm, or 100 to 500 nm, or 200 to 300 nm. The aforementioned volume average particle diameter represents the particle size variation of the aforementioned pulverized product in the liquid containing the gel pulverized product of the present invention. The above-mentioned volume average particle diameter can be measured, for example, by particle size distribution evaluation devices such as dynamic light scattering method and laser diffraction method, and electron microscopes such as scanning electron microscope (SEM) and transmission electron microscope (TEM). .
又,在本發明之含凝膠粉碎物液體中,前述粉碎物之凝膠濃度並無特別限制,譬如粒徑10~1000nm之粒子為2.5~4.5重量%,或2.7~4.0重量%,或2.8~3.2重量%。In addition, in the gel-containing pulverized product liquid of the present invention, the gel concentration of the aforementioned pulverized product is not particularly limited, for example, 2.5 to 4.5% by weight, or 2.7 to 4.0% by weight, or 2.8 ~3.2% by weight.
在本發明之含凝膠粉碎物液體中,前述凝膠(譬如多孔體凝膠)並無特別限制,可舉如矽化合物等。In the gel pulverized product-containing liquid of the present invention, the above-mentioned gel (such as a porous gel) is not particularly limited, and examples thereof include silicon compounds and the like.
前述矽化合物無特別限制,可舉如含有至少3官能以下之飽和鍵官能基的矽化合物。前述「含有3官能基以下之飽和鍵官能基」意指矽化合物具有3個以下官能基且該等官能基與矽(Si)呈飽和鍵結之狀態。The aforementioned silicon compound is not particularly limited, and examples include silicon compounds containing at least trifunctional or less saturated bond functional groups. The aforementioned "containing three or less functional groups with saturated bond functional groups" means that the silicon compound has three or less functional groups and these functional groups are in a saturated bonded state with silicon (Si).
前述矽化合物譬如為下述式(2)所示化合物。 [化學式1] The aforementioned silicon compound is, for example, a compound represented by the following formula (2). [chemical formula 1]
前述式(2)中,例如X為2、3或4, R1 及R2 分別為直鏈烷基或支鏈烷基, R1 及R2 可相同亦可互異, R1 在X為2時,可彼此相同亦可互異, R2 可彼此相同亦可互異。In the aforementioned formula (2), for example, X is 2, 3 or 4, R 1 and R 2 are straight-chain alkyl or branched-chain alkyl respectively, R 1 and R 2 can be the same or different, and R 1 is when X is 2 , they may be the same or different from each other, and R2 may be the same or different from each other.
前述X及R1 譬如與前述式(1)中之X及R1 相同。又,前述R2 可援引譬如後述式(1)中之R1 的例示。The aforementioned X and R 1 are, for example, the same as X and R 1 in the aforementioned formula (1). In addition, the aforementioned R 2 can be exemplified by, for example, R 1 in the formula (1) described later.
前述式(2)所示矽化合物之具體例可舉如X為3之下述式(2')所示化合物。在下述式(2')中,R1 及R2 分別與前述式(2)相同。R1 及R2 為甲基時,前述矽化合物為三甲氧基(甲基)矽烷(以下亦稱「MTMS」)。 [化學式2] Specific examples of the silicon compound represented by the aforementioned formula (2) include compounds represented by the following formula (2′) in which X is 3. In the following formula (2'), R 1 and R 2 are respectively the same as the aforementioned formula (2). When R 1 and R 2 are methyl groups, the aforementioned silicon compound is trimethoxy(methyl)silane (hereinafter also referred to as “MTMS”). [chemical formula 2]
在本發明之含凝膠粉碎物液體中,前述多孔體凝膠在前述溶劑中之粉碎物濃度並無特別限制,譬如為0.3~50%(v/v)、0.5~30%(v/v)、1.0~10%(v/v)。前述粉碎物之濃度若太高,譬如可能前述含凝膠粉碎物液體之流動性顯著下降而於塗覆時發生凝結物・塗痕。另一方面,前述粉碎物之濃度若太低,不僅在溶劑乾燥上會耗費相當程度的時間,乾燥後的殘留溶劑也會提高,因而有空隙率降低之可能。In the liquid containing the ground gel of the present invention, the concentration of the ground material of the porous gel in the solvent is not particularly limited, for example, 0.3-50% (v/v), 0.5-30% (v/v ), 1.0~10% (v/v). If the concentration of the aforementioned pulverized matter is too high, for example, the fluidity of the liquid containing the aforementioned gel pulverized matter may be significantly reduced, and condensation and smear marks may occur during coating. On the other hand, if the concentration of the aforementioned pulverized product is too low, not only will it take a considerable amount of time to dry the solvent, but also the residual solvent after drying will increase, so there is a possibility that the porosity will decrease.
本發明之含凝膠粉碎物液體的物性無特別限制。前述含凝膠粉碎物液體之剪切黏度譬如在10001/s之剪切速度下,譬如為下述範圍:1mPa・s~1Pa・s、1mPa・s~500mPa・s、1mPa・s~50mPa・s、1mPa・s~30mPa・s、1mPa・s~10mPa・s、10mPa・s~1Pa・s、10mPa・s~500mPa・s、10mPa・s~50mPa・s、10mPa・s~30mPa・s、30mPa・s~1Pa・s、30mPa・s~500mPa・s、30mPa・s~50mPa・s、50mPa・s~1Pa・s、50mPa・s~500mPa・s或500mPa・s~1Pa・s。前述剪切黏度若太高,例如可能產生塗痕而有凹版塗覆之轉印率下降等不良狀況發生。相反的,剪切黏度若太低,譬如可能無法加厚塗覆時的濕塗厚度,而無法在乾燥後獲得所需厚度。The physical properties of the gel pulverized product-containing liquid of the present invention are not particularly limited. The shear viscosity of the liquid containing the ground gelatin, for example, is in the following ranges at a shear rate of 10001/s: 1mPa・s~1Pa・s, 1mPa・s~500mPa・s, 1mPa・s~50mPa・s, 1mPa・s~30mPa・s, 1mPa・s~10mPa・s, 10mPa・s~1Pa・s, 10mPa・s~500mPa・s, 10mPa・s~50mPa・s, 10mPa・s~30mPa・s, 30mPa・s~1Pa・s, 30mPa・s~500mPa・s, 30mPa・s~50mPa・s, 50mPa・s~1Pa・s, 50mPa・s~500mPa・s or 500mPa・s~1Pa・s. If the above-mentioned shear viscosity is too high, for example, smear marks may occur and the transfer rate of gravure coating may decrease and other adverse conditions may occur. On the contrary, if the shear viscosity is too low, for example, it may not be possible to thicken the wet coating thickness during coating, and it may not be possible to obtain the desired thickness after drying.
在本發明之含凝膠粉碎物液體中,前述溶劑可舉如分散媒等。前述分散媒(以下亦稱「塗覆用溶劑」)無特別限制,可舉如後述凝膠化溶劑及粉碎用溶劑,且宜為前述粉碎用溶劑。前述塗覆用溶劑包含沸點為70℃以上且低於180℃,且在20℃下之飽和蒸氣壓為15kPa以下的有機溶劑。In the gel pulverized product-containing liquid of the present invention, the solvent may be, for example, a dispersion medium. The above-mentioned dispersion medium (hereinafter also referred to as "coating solvent") is not particularly limited, and examples thereof include gelling solvents and pulverization solvents described later, and are preferably the aforementioned pulverization solvents. The coating solvent includes an organic solvent having a boiling point of 70°C to less than 180°C and a saturated vapor pressure at 20°C of 15 kPa or less.
前述有機溶劑可舉如四氯化碳、1,2-二氯乙烷、1,1,2,2-四氯乙烷、三氯乙烯、異丁醇、異丙醇、異戊醇、1-戊醇(pentyl alcohol;pentanol)、乙醇(ethyl alcohol;ethanol)、乙二醇單乙基醚、乙二醇單乙基醚乙酸鹽、乙二醇單正丁基醚、乙二醇單甲基醚、二甲苯、甲酚、氯苯、乙酸異丁酯、乙酸異丙酯、乙酸異戊酯、乙酸乙酯、乙酸正丁酯、乙酸正丙酯、乙酸正戊酯、環己醇、環己酮、1,4-二烷、N,N-二甲基甲醯胺、苯乙烯、四氯乙烯、1,1,1-三氯乙烷、甲苯、1-丁醇、2-丁醇、甲基異丁基酮、甲基乙基酮、甲基環己醇、甲基環己酮、甲基-正丁基酮、異戊醇等。又,前述分散媒中亦可適量含有能使表面張力降低之全氟系界面活性劑或矽系界面活性劑等。The aforementioned organic solvents can be exemplified as carbon tetrachloride, 1,2-dichloroethane, 1,1,2,2-tetrachloroethane, trichloroethylene, isobutanol, isopropanol, isoamyl alcohol, 1 -Pentyl alcohol (pentanol), ethyl alcohol (ethanol), ethylene glycol monoethyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether, ethylene glycol monomethyl Base ether, xylene, cresol, chlorobenzene, isobutyl acetate, isopropyl acetate, isopentyl acetate, ethyl acetate, n-butyl acetate, n-propyl acetate, n-pentyl acetate, cyclohexanol, Cyclohexanone, 1,4-di alkanes, N,N-dimethylformamide, styrene, tetrachloroethylene, 1,1,1-trichloroethane, toluene, 1-butanol, 2-butanol, methyl isobutyl ketone, Methyl ethyl ketone, methyl cyclohexanol, methyl cyclohexanone, methyl-n-butyl ketone, isoamyl alcohol, etc. In addition, the aforementioned dispersion medium may contain an appropriate amount of a perfluorinated surfactant or a silicon-based surfactant capable of reducing surface tension.
本發明之含凝膠粉碎物液體可舉如已分散在前述分散媒中之溶膠狀前述粉碎物的溶膠粒子液等。本發明之含凝膠粉碎物液體譬如在塗覆於基材上且乾燥後,藉由後述之結合步驟進行化學交聯,可連續成膜具有一定程度以上之膜強度的空隙層。又,本發明之「溶膠」係指藉由將凝膠之三維結構粉碎,使粉碎物(亦即,保持有部分空隙結構的奈米三維結構之多孔體溶膠粒子)分散在溶劑中而顯示流動性的狀態。The liquid containing the pulverized product of gel in the present invention includes, for example, a sol particle liquid of the pulverized product in the form of a sol dispersed in the above-mentioned dispersion medium. For example, the liquid containing the pulverized gel of the present invention is coated on a base material and dried, and then chemically cross-linked in a bonding step described later to continuously form a void layer having a film strength of more than a certain level. In addition, the "sol" in the present invention means that the three-dimensional structure of the gel is pulverized, and the pulverized product (that is, porous body sol particles with a nano-three-dimensional structure maintaining a part of the void structure) is dispersed in a solvent to show fluidity. sexual state.
本發明之含凝膠粉碎物液體亦可含有譬如用以使前述凝膠之粉碎物彼此行化學鍵結的觸媒。前述觸媒之含有率無特別限定,相對於前述凝膠之粉碎物重量譬如為0.01~20重量%、0.05~10重量%或0.1~5重量%。The liquid containing the pulverized gel of the present invention may also contain, for example, a catalyst for chemically bonding the pulverized gel to each other. The content of the catalyst is not particularly limited, but is, for example, 0.01 to 20% by weight, 0.05 to 10% by weight, or 0.1 to 5% by weight relative to the weight of the pulverized product of the gel.
又,本發明之含凝膠粉碎物液體更可含有譬如用以使前述凝膠之粉碎物彼此間接鍵結的交聯輔助劑。前述交聯輔助劑之含有率無特別限定,譬如相對於前述凝膠之粉碎物重量為0.01~20重量%、0.05~15重量%或0.1~10重量%。Furthermore, the liquid containing the pulverized gel of the present invention may further contain, for example, a cross-linking auxiliary agent for indirectly bonding the pulverized gels to each other. The content rate of the aforementioned cross-linking auxiliary agent is not particularly limited, and is, for example, 0.01 to 20% by weight, 0.05 to 15% by weight, or 0.1 to 10% by weight relative to the weight of the pulverized product of the aforementioned gel.
另,在本發明之含凝膠粉碎物液體,前述凝膠之構成單元單體的官能基中,無助於無助於凝膠內交聯結構的官能基比率譬如可為30mol%以下、25mol%以下、20mol%以下、15mol%以下,且譬如可為1mol%以上、2mol%以上、3mol%以上、4mol%以上。無助於前述凝膠內交聯結構的官能基比率譬如可以下述方式進行測定。In addition, in the gel pulverized product liquid of the present invention, among the functional groups of the constituent unit monomers of the gel, the proportion of functional groups that do not contribute to the crosslinking structure in the gel can be, for example, 30 mol % or less, 25 mol % or less. % or less, 20 mol% or less, 15 mol% or less, and for example, 1 mol% or more, 2 mol% or more, 3 mol% or more, 4 mol% or more. The ratio of functional groups that do not contribute to the crosslinked structure in the gel can be measured, for example, as follows.
(無助於凝膠內交聯結構的官能基比率之測定方法) 將凝膠乾燥後,測定固體NMR(Si-NMR),從NMR的峰值比算出無助於交聯結構的殘留矽烷醇基(無助於凝膠內交聯結構的官能基)比率。又,即使前述官能基為矽烷醇基以外之情況,亦可據此從NMR之峰值比算出無助於凝膠內交聯結構的官能基比率。(Measurement method of the ratio of functional groups that do not contribute to the cross-linking structure in the gel) After drying the gel, measure the solid NMR (Si-NMR), and calculate the remaining silanol groups that do not contribute to the cross-linking structure from the NMR peak ratio (functional groups that do not contribute to the cross-linked structure in the gel) ratio. In addition, even if the aforementioned functional groups are other than silanol groups, the ratio of functional groups that do not contribute to the crosslinked structure in the gel can be calculated from the NMR peak ratio.
以下舉例說明本發明含凝膠粉碎物液體之製造方法。本發明之含凝膠粉碎物液體在未特別記載之前提下可援引以下說明。The following examples illustrate the production method of the gel pulverized product-containing liquid of the present invention. The gel pulverized product-containing liquid of the present invention can be referred to the following description unless otherwise specified.
在本發明之含凝膠粉碎物液體的製造方法中,混合步驟係將前述多孔體凝膠之粒子(粉碎物)與前述溶劑予以混合之步驟,可有可無。前述混合步驟之具體例可舉如將凝膠狀矽化合物(矽化合物凝膠)之粉碎物與分散媒混合之步驟,前述凝膠狀矽化合物係由含有至少3官能以下之飽和鍵官能基的矽化合物製得。在本發明中,前述多孔體凝膠之粉碎物可藉由後述凝膠粉碎步驟從前述多孔體凝膠製得。又,前述多孔體凝膠之粉碎物譬如可從已施行後述熟成步驟之熟成處理後的前述多孔體凝膠製得。In the method for producing a liquid containing a ground gel of the present invention, the mixing step is a step of mixing the particles (ground material) of the porous gel with the solvent, which is optional. A specific example of the above-mentioned mixing step may be a step of mixing the pulverized product of a gel-like silicon compound (silicon compound gel) with a dispersion medium. made of silicon compounds. In the present invention, the pulverized product of the aforementioned porous gel can be obtained from the aforementioned porous gel by the gel pulverization step described later. In addition, the pulverized product of the aforementioned porous gel can be obtained, for example, from the aforementioned porous gel subjected to an aging treatment in an aging step described later.
在本發明之含凝膠粉碎物液體的製造方法中,凝膠化步驟係譬如在溶劑中使塊狀多孔體凝膠化而做成前述多孔體凝膠的步驟,前述凝膠化步驟之具體例譬如係在溶劑中使含有前述至少3官能以下之飽和鍵官能基的矽化合物凝膠化,而生成矽化合物凝膠的步驟。In the method for producing a liquid containing a pulverized gel of the present invention, the gelation step is, for example, a step of gelling a block-shaped porous body in a solvent to form the porous body gel. The specific details of the gelation step For example, it is a step of gelling a silicon compound containing a saturated bond functional group having at least three or less functions in a solvent to form a silicon compound gel.
以下將以前述多孔體為矽化合物之情況為例來說明前述凝膠化步驟。The aforementioned gelation step will be described below by taking the case where the aforementioned porous body is a silicon compound as an example.
前述凝膠化步驟譬如係使單體之前述矽化合物在脫水縮合觸媒之存在下藉由脫水縮合反應進行凝膠化之步驟,藉此可製得矽化合物凝膠。前述矽化合物凝膠譬如具有殘留矽烷醇基,前述殘留矽烷醇基宜因應後述之前述矽化合物凝膠之粉碎物彼此的化學鍵結進行適當調整。The aforementioned gelation step is, for example, a step of gelling the aforementioned silicon compound as a monomer by a dehydration condensation reaction in the presence of a dehydration condensation catalyst, whereby a silicon compound gel can be obtained. The aforementioned silicon compound gel has, for example, residual silanol groups, and the aforementioned residual silanol groups are suitably adjusted in accordance with the chemical bonding between pulverized products of the aforementioned silicon compound gels to be described later.
在前述凝膠化步驟中,前述矽化合物無特別限制,只要是藉由脫水縮合反應進行凝膠化之物即可。譬如,藉由前述脫水縮合讓前述矽化合物間鍵結。前述矽化合物間之鍵結譬如為氫鍵結或分子間力鍵結。In the aforementioned gelling step, the aforementioned silicon compound is not particularly limited as long as it is gelled by a dehydration condensation reaction. For example, the aforementioned silicon compounds are bonded by the aforementioned dehydration condensation. The bond between the aforementioned silicon compounds is, for example, hydrogen bond or intermolecular force bond.
前述矽化合物可舉如下述式(1)所示矽化合物。下述式(1)之矽化合物具有羥基,因此下述式(1)之矽化合物間可透過這些羥基達成氫鍵結或分子間力鍵結。The aforementioned silicon compound can be exemplified by a silicon compound represented by the following formula (1). The silicon compound of the following formula (1) has hydroxyl groups, so the silicon compounds of the following formula (1) can form hydrogen bonding or intermolecular force bonding through these hydroxyl groups.
[化學式3] [chemical formula 3]
前述式(1)中,例如X為2、3或4,R1 為直鏈烷基或支鏈烷基。前述R1 之碳數例如為1~6、1~4、1~2。前述直鏈烷基可舉如甲基、乙基、丙基、丁基、戊基、己基等,前述支鏈烷基可舉如異丙基、異丁基等。前述X例如為3或4。In the aforementioned formula (1), for example, X is 2, 3 or 4, and R 1 is a straight-chain alkyl group or a branched-chain alkyl group. The carbon number of the aforementioned R 1 is, for example, 1~6, 1~4, 1~2. Examples of the aforementioned straight-chain alkyl group include methyl, ethyl, propyl, butyl, pentyl, and hexyl, and examples of the aforementioned branched-chain alkyl group include isopropyl and isobutyl. The aforementioned X is 3 or 4, for example.
前述式(1)所示矽化合物之具體例可舉如X為3之下述式(1')所示化合物。下述式(1')中,R1 與前述式(1)相同,例如為甲基。R1 為甲基時,前述矽化合物為參(羥)甲基矽烷。前述X為3時,前述矽化合物例如為具有3個官能基之3官能矽烷。Specific examples of the silicon compound represented by the aforementioned formula (1) include compounds represented by the following formula (1′) in which X is 3. In the following formula (1'), R 1 is the same as the above-mentioned formula (1), for example, a methyl group. When R 1 is a methyl group, the aforementioned silicon compound is para(hydroxy)methylsilane. When the aforementioned X is 3, the aforementioned silicon compound is, for example, a trifunctional silane having three functional groups.
[化學式4] [chemical formula 4]
又,前述式(1)所示矽化合物之具體例可列舉如X為4之化合物。此時,前述矽化合物例如為具有4個官能基之4官能矽烷。In addition, specific examples of the silicon compound represented by the aforementioned formula (1) include compounds in which X is 4. In this case, the aforementioned silicon compound is, for example, a tetrafunctional silane having four functional groups.
前述矽化合物譬如亦可為藉由水解形成前述式(1)之矽化合物的前驅物。前述前驅物譬如只要是可藉由水解生成前述矽化合物者即可,具體例可列舉前述式(2)所示化合物。The aforementioned silicon compound may also be, for example, a precursor for forming the aforementioned silicon compound of formula (1) by hydrolysis. For example, the aforementioned precursor may be any one that can generate the aforementioned silicon compound by hydrolysis, and specific examples include the compound represented by the aforementioned formula (2).
前述矽化合物為前述式(2)所示前驅物時,本發明之製造方法譬如亦可包含在前述凝膠化步驟之前將前述前驅物水解的步驟。When the aforementioned silicon compound is the precursor represented by the aforementioned formula (2), the production method of the present invention may also include, for example, a step of hydrolyzing the aforementioned precursor before the aforementioned gelling step.
前述水解方法無特別限制,例如可在觸媒存在下藉由化學反應來進行。前述觸媒可列舉如草酸、乙酸等酸等。前述水解反應譬如可在室溫環境下將草酸水溶液緩慢地滴下混合至前述矽化合物前驅物之二甲亞碸溶液中以後,直接攪拌30分鐘左右來進行。在水解前述矽化合物前驅物時,例如可將前述矽化合物前驅物之烷氧基完全水解,以便更有效率地顯現其後之凝膠化、熟成、空隙結構形成後的加熱及固定化。The aforementioned hydrolysis method is not particularly limited, for example, it can be carried out by chemical reaction in the presence of a catalyst. Examples of the catalyst include acids such as oxalic acid and acetic acid. The aforementioned hydrolysis reaction can be performed, for example, by slowly mixing the aqueous oxalic acid solution dropwise into the dimethyl oxyphenone solution of the silicon compound precursor at room temperature, and then directly stirring it for about 30 minutes. When the aforementioned silicon compound precursor is hydrolyzed, for example, the alkoxy group of the aforementioned silicon compound precursor can be completely hydrolyzed, so as to more efficiently display the subsequent gelation, aging, heating and immobilization after the formation of the void structure.
在本發明中,前述矽化合物可舉如三甲氧基(甲基)矽烷之水解物。In the present invention, the aforementioned silicon compound can be, for example, a hydrolyzate of trimethoxy(methyl)silane.
前述單體之矽化合物無特別限制,譬如可因應要製造之機能性多孔體的用途適當選擇。在前述機能性多孔體之製造中,譬如在重視低折射率性之情況下,從低折射率性優異的觀點來看,前述矽化合物宜為前述3官能矽烷;又在重視強度(譬如耐擦傷性)之情況下,從耐擦傷性優異的觀點來看,前述矽化合物則宜為前述4官能矽烷。又,前述矽化合物為前述矽化合物凝膠之原料,譬如可僅使用一種,亦可將二種以上併用。就具體例而言,作為前述矽化合物例如可僅含有前述3官能矽烷,亦可僅含有前述4官能矽烷,或可含有前述3官能矽烷及前述4官能矽烷兩者,更可含有其它的矽化合物。使用二種以上矽化合物作為前述矽化合物時,其比率並無特別限制,可適宜設定。The silicon compound of the aforementioned monomer is not particularly limited, and can be appropriately selected according to the application of the functional porous body to be produced, for example. In the production of the aforementioned functional porous body, for example, when emphasis is placed on low refractive index properties, the aforementioned silicon compound is preferably the aforementioned trifunctional silane from the viewpoint of excellent low refractive index properties; In the case of resistance), the aforementioned silicon compound is preferably the aforementioned tetrafunctional silane from the viewpoint of excellent scratch resistance. In addition, the aforementioned silicon compound is a raw material of the aforementioned silicon compound gel, and for example, only one type may be used, or two or more types may be used in combination. As a specific example, the aforementioned silicon compound may contain, for example, only the aforementioned trifunctional silane, or only the aforementioned tetrafunctional silane, or may contain both the aforementioned trifunctional silane and the aforementioned tetrafunctional silane, or may further contain other silicon compounds. . When two or more kinds of silicon compounds are used as the silicon compound, the ratio is not particularly limited and can be appropriately set.
前述矽化合物等多孔體的凝膠化譬如可藉由前述多孔體間之脫水縮合反應進行。前述脫水縮合反應例如宜在觸媒存在下進行,前述觸媒可舉例如酸觸媒及鹼性觸媒等脫水縮合觸媒,前述酸觸媒有鹽酸、草酸、硫酸等,前述鹼性觸媒有氨、氫氧化鉀、氫氧化鈉、氫氧化銨等。前述脫水縮合觸媒可為酸觸媒亦可為鹼性觸媒,且以鹼性觸媒為佳。在前述脫水縮合反應中,前述觸媒相對於前述多孔體的添加量並無特別限制,譬如,相對於前述多孔體1莫耳,觸媒為0.01~10莫耳、0.05~7莫耳、0.1~5莫耳。The gelation of the porous body such as the aforementioned silicon compound can be performed by, for example, a dehydration condensation reaction between the aforementioned porous bodies. The above-mentioned dehydration condensation reaction, for example, should be carried out in the presence of a catalyst, and the above-mentioned catalyst can be dehydration condensation catalysts such as acid catalyst and alkaline catalyst. The aforementioned acid catalyst has hydrochloric acid, oxalic acid, sulfuric acid, etc., and the aforementioned alkaline catalyst Ammonia, potassium hydroxide, sodium hydroxide, ammonium hydroxide, etc. The aforementioned dehydration condensation catalyst can be an acid catalyst or an alkaline catalyst, and the alkaline catalyst is preferred. In the aforementioned dehydration condensation reaction, the addition amount of the aforementioned catalyst relative to the aforementioned porous body is not particularly limited. For example, relative to 1 mole of the aforementioned porous body, the amount of the catalyst is 0.01-10 moles, 0.05-7 moles, 0.1 ~5 moles.
前述矽化合物等多孔體的凝膠化譬如宜在溶劑中進行。前述多孔體在前述溶劑中所佔比率無特別限制。前述溶劑可舉如二甲亞碸(DMSO)、N-甲基吡咯啶酮(NMP)、N,N-二甲基乙醯胺(DMAc)、二甲基甲醯胺(DMF)、γ-丁內酯(GBL)、乙腈(MeCN)、乙二醇乙基醚(EGEE)等。前述溶劑例如可為1種亦可將2種以上併用。用來進行前述凝膠化的溶劑以下亦稱作「凝膠化用溶劑」。The gelation of the porous body such as the aforementioned silicon compound is preferably carried out in a solvent, for example. The ratio of the aforementioned porous body to the aforementioned solvent is not particularly limited. The aforementioned solvents can be exemplified as dimethylsulfoxide (DMSO), N-methylpyrrolidone (NMP), N,N-dimethylacetamide (DMAc), dimethylformamide (DMF), γ- Butyrolactone (GBL), acetonitrile (MeCN), ethylene glycol ethyl ether (EGEE), etc. The said solvent may be used, for example by 1 type or in combination of 2 or more types. The solvent used for the aforementioned gelation is also referred to as "solvent for gelation" hereinafter.
前述凝膠化之條件並無特別限制。含有前述多孔體之前述溶劑的處理溫度例如為20~30℃、22~28℃、24~26℃,處理時間例如為1~60分鐘、5~40分鐘、10~30分鐘。進行前述脫水縮合反應時,其處理條件無特別限制,可援引該等例示。當前述多孔體為矽化合物時,藉由進行前述凝膠化,譬如可使矽氧烷鍵結成長而形成前述矽化合物之一次粒子,再藉由反應進行,使前述一次粒子彼此連接成串珠狀,生成三維結構之凝膠。The aforementioned gelation conditions are not particularly limited. The treatment temperature of the solvent containing the porous body is, for example, 20-30°C, 22-28°C, 24-26°C, and the treatment time is, for example, 1-60 minutes, 5-40 minutes, or 10-30 minutes. When performing the aforementioned dehydration condensation reaction, the treatment conditions are not particularly limited, and such examples can be cited. When the aforementioned porous body is a silicon compound, by performing the aforementioned gelation, for example, siloxane can be bonded and grown to form the primary particles of the aforementioned silicon compound, and then the aforementioned primary particles can be connected to each other in a beaded shape through the reaction. , to generate a three-dimensional gel.
在前述凝膠化步驟中製得的前述多孔體之凝膠形態無特別限制。一般而言,「凝膠」係指溶質具有因相互作用失去獨立的運動性而集結成之結構,且呈現固化狀態。此外,凝膠中一般而言,濕凝膠係指含有分散媒且在分散媒中溶質採一樣的結構者,乾凝膠則指去除溶劑且溶質採具有空隙之網目結構者。在本發明中,前述矽化合物凝膠宜使用例如濕凝膠。前述多孔體凝膠為矽化合物凝膠時,前述矽化合物凝膠之殘留矽烷醇基並無特別限制,譬如可同樣列舉後述之範圍。The gel form of the aforementioned porous body produced in the aforementioned gelation step is not particularly limited. Generally speaking, "gel" refers to a structure in which solutes have lost their independent mobility due to interactions and are in a solidified state. In addition, among gels, generally speaking, a wet gel refers to one containing a dispersion medium and the solute adopts the same structure in the dispersion medium, and a dry gel refers to one having a network structure in which the solute has voids after removing the solvent. In the present invention, it is preferable to use, for example, a wet gel as the silicon compound gel. When the aforementioned porous body gel is a silicon compound gel, the residual silanol groups of the aforementioned silicon compound gel are not particularly limited, and for example, the ranges described below can also be mentioned.
藉由前述凝膠化製得之前述多孔體凝膠譬如可直接供給至前述溶劑置換步驟及前述第1粉碎階段,或可在前述第1粉碎階段之前,在前述熟成步驟施行熟成處理。前述熟成步驟係使已凝膠化之前述多孔體(多孔體凝膠)在溶劑中熟成。在前述熟成步驟中,前述熟成處理之條件無特別限制,譬如在溶劑中將前述多孔體凝膠以預定溫度進行培育即可。藉由前述熟成處理,譬如可針對以凝膠化製得的具有三維結構之多孔體凝膠,使前述一次粒子進一步成長,藉此可增加前述粒子本身的尺寸。而且,結果上可將前述粒子彼此接觸之頸部的接觸狀態從點接觸增加到面接觸。經過上述熟成處理的多孔體凝膠例如會增加凝膠本身的強度,結果便可更加提升粉碎後的前述粉碎物之三維基本結構之強度。藉此,使用前述本發明之含凝膠粉碎物液體形成塗覆膜時,譬如即使在塗覆後之乾燥步驟中,亦可抑制前述三維基本結構堆積而成的空隙結構之細孔尺寸,隨前述乾燥步驟中發生之前述塗覆膜中的溶劑揮發而收縮的情況。The porous gel obtained by the gelation may be directly supplied to the solvent replacement step and the first pulverization step, or may be subjected to aging treatment in the aging step before the first pulverization step, for example. In the aging step, the gelled porous body (porous body gel) is aged in a solvent. In the aforementioned aging step, the conditions of the aforementioned aging treatment are not particularly limited, for example, the aforementioned porous body gel may be incubated in a solvent at a predetermined temperature. Through the aforementioned aging treatment, for example, for a porous body gel having a three-dimensional structure obtained by gelation, the aforementioned primary particles can be further grown, thereby increasing the size of the aforementioned particles themselves. Also, as a result, the contact state of the aforementioned neck portion where the particles are in contact with each other can be increased from point contact to surface contact. For example, the strength of the gel itself is increased by the aging treatment of the porous gel, and as a result, the strength of the three-dimensional basic structure of the pulverized product after pulverization can be further enhanced. Thus, when a coating film is formed using the gel-containing pulverized product liquid of the present invention, for example, even in the drying step after coating, the pore size of the void structure formed by the accumulation of the aforementioned three-dimensional basic structure can be suppressed, and the The situation that the solvent in the aforementioned coating film volatilizes and shrinks in the aforementioned drying step.
前述熟成處理之溫度,其下限譬如為30℃以上、35℃以上、40℃以上,其上限譬如為80℃以下、75℃以下、70℃以下,其範圍譬如為30~80℃、35~75℃、40~70℃。前述預定時間無特別限制,其下限例如為5小時以上、10小時以上、15小時以上,其上限例如為50小時以下、40小時以下、30小時以下,其範圍例如為5~50小時、10~40小時、15~30小時。另外,關於熟成的最佳條件,譬如宜如前述設定成可獲得前述多孔體凝膠中之前述一次粒子之尺寸增大及前述頸部接觸面積之增大的條件。又,在前述熟成步驟中,前述熟成處理之溫度譬如宜考量要使用的溶劑沸點。前述熟成處理譬如熟成溫度過高時,前述溶劑可能會過度揮發,而因為前述塗覆液之濃縮,產生三維空隙結構之細孔閉口等不良狀況。另一方面,前述熟成處理譬如熟成溫度過低時,不僅無法充分獲得藉前述熟成所得的效果,量產製程的歷時溫度偏差還會增大,可能製出品質不良的製品。The lower limit of the temperature of the aforementioned aging treatment is, for example, 30°C or higher, 35°C or higher, or 40°C or higher, and the upper limit is, for example, 80°C or lower, 75°C or lower, 70°C or lower, and the range is, for example, 30~80°C, 35~75°C. ℃, 40~70℃. The aforementioned predetermined time is not particularly limited, its lower limit is, for example, more than 5 hours, more than 10 hours, more than 15 hours, its upper limit is, for example, less than 50 hours, less than 40 hours, less than 30 hours, and its range is, for example, 5 to 50 hours, 10 to 10 hours. 40 hours, 15~30 hours. In addition, regarding the optimum conditions for aging, for example, it is preferable to set conditions such that the size increase of the primary particles in the porous body gel and the increase of the neck contact area can be obtained as described above. Also, in the aforementioned aging step, the temperature of the aforementioned aging treatment should take into consideration, for example, the boiling point of the solvent to be used. For example, when the aging process is too high, the solvent may volatilize excessively, and because of the concentration of the coating liquid, there will be unfavorable conditions such as closed pores of the three-dimensional void structure. On the other hand, if the aforementioned aging treatment, for example, when the aging temperature is too low, not only the effect obtained by the aforementioned aging cannot be fully obtained, but also the temperature deviation during the mass production process will increase, and products of poor quality may be produced.
前述熟成處理例如可使用與前述凝膠化步驟相同的溶劑,具體上宜對前述凝膠處理後的反應物(亦即,含有前述多孔體凝膠之前述溶劑)直接實施。譬如,前述多孔體凝膠為前述矽化合物凝膠時,結束凝膠化後之熟成處理的前述矽化合物凝膠中所含殘留矽烷醇基之莫耳數,係在令用於凝膠化之原材料(譬如前述矽化合物或其前驅物)的烷氧基莫耳數為100時的殘留矽烷醇基之比率,其下限譬如為50%以上、40%以上、30%以上,其上限譬如為1%以下、3%以下、5%以下,其範圍譬如為1~50%、3~40%、5~30%。在提高前述矽化合物凝膠之硬度之目的下,例如殘留矽烷醇基之莫耳數愈低愈佳。殘留矽烷醇基之莫耳數若太高,譬如在形成前述機能性多孔體時,可能無法將空隙結構保持到使前述機能性多孔體之前驅物進行交聯。另一方面,殘留矽烷醇基之莫耳數若太低,譬如在前述結合步驟中,前述機能性多孔體之前驅物可能無法交聯,從而無法賦予充分的膜強度。另,上述為殘留矽烷醇基之例,譬如使用前述矽化合物已以各種反應性官能基修飾過之物作為前述矽化合物凝膠之原材料時,對於各官能基亦可適用相同的現象。For example, the aging treatment can use the same solvent as that used in the gelation step, and it is preferable to directly perform the reaction product after the gel treatment (ie, the solvent containing the porous gel) directly. For example, when the aforementioned porous body gel is the aforementioned silicon compound gel, the number of moles of residual silanol groups contained in the aforementioned silicon compound gel after aging treatment after gelation is determined by the number of moles used for gelation. The ratio of residual silanol groups when the molar number of alkoxy groups of the raw material (such as the aforementioned silicon compound or its precursor) is 100, the lower limit is, for example, 50% or more, 40% or more, or 30% or more, and the upper limit is, for example, 1 % or less, 3% or less, and 5% or less, the ranges are, for example, 1-50%, 3-40%, 5-30%. For the purpose of increasing the hardness of the silicon compound gel, for example, the lower the molar number of residual silanol groups, the better. If the molar number of residual silanol groups is too high, for example, when forming the aforementioned functional porous body, the void structure may not be maintained until the precursor of the aforementioned functional porous body is cross-linked. On the other hand, if the molar number of residual silanol groups is too low, for example, in the aforementioned bonding step, the precursor of the functional porous body may not be cross-linked, thus failing to impart sufficient film strength. In addition, the above is an example of residual silanol groups. For example, when the aforementioned silicon compound modified with various reactive functional groups is used as the raw material of the aforementioned silicon compound gel, the same phenomenon can be applied to each functional group.
藉由前述凝膠化製得的前述多孔體凝膠譬如在前述熟成步驟中施行熟成處理後,施行溶劑置換步驟,再於其後供給至前述凝膠粉碎步驟。前述溶劑置換步驟可將前述溶劑置換成其他溶劑。The aforementioned porous body gel obtained by the aforementioned gelation is, for example, subjected to an aging treatment in the aforementioned aging step, then subjected to a solvent replacement step, and then supplied to the aforementioned gel crushing step. In the aforementioned solvent replacement step, the aforementioned solvent may be replaced with other solvents.
在本發明中,前述凝膠粉碎步驟如前述為粉碎前述多孔體凝膠之步驟。前述粉碎譬如可對前述凝膠化步驟後之前述多孔體凝膠施行,更可對已施行前述熟成處理之前述熟成後的多孔體凝膠施行。In the present invention, the aforementioned gel crushing step is a step of crushing the aforementioned porous body gel as described above. The pulverization may be performed, for example, on the porous gel after the gelation step, or on the aged porous gel that has been subjected to the aging treatment.
又如前述,亦可在前述溶劑置換步驟之前(譬如前述熟成步驟後)進行控制前述凝膠之形狀及大小的凝膠形態控制步驟。前述凝膠形態控制步驟中所控制的前述凝膠之形狀及大小並無特別限定,如同前述。前述凝膠形態控制步驟譬如亦可將前述凝膠分割(譬如切開)成適當的大小及形狀之立體(3維體)來進行。As mentioned above, a gel morphology control step for controlling the shape and size of the gel may also be performed before the solvent replacement step (eg, after the aging step). The shape and size of the aforementioned gel controlled in the aforementioned gel shape controlling step are not particularly limited, as described above. The aforementioned gel shape control step can also be performed, for example, by dividing (for example, cutting) the aforementioned gel into three-dimensional (three-dimensional bodies) of appropriate size and shape.
此外,如前述在對前述凝膠施行前述溶劑置換步驟後,再施行前述凝膠粉碎步驟。前述溶劑置換步驟可將前述溶劑置換成其他溶劑。因為如果不將前述溶劑置換成前述其他溶劑,譬如凝膠化步驟中所使用的觸媒及溶劑到前述熟成步驟後繼續殘留,則恐影響進一步歷時發生凝膠化而最終製得的含凝膠粉碎物液體之使用期限,或可能降低使用前述含凝膠粉碎物液體所形成的塗覆膜於乾燥時之乾燥效率等。又,前述凝膠粉碎步驟中之前述其他溶劑以下亦稱作「粉碎用溶劑」。In addition, as described above, after the aforementioned solvent replacement step is performed on the aforementioned gel, the aforementioned gel crushing step is performed. In the aforementioned solvent replacement step, the aforementioned solvent may be replaced with other solvents. Because if the aforementioned solvent is not replaced with the aforementioned other solvents, such as the catalyst and solvent used in the gelation step and the solvent remaining after the aforementioned ripening step, it may affect the further gelation over time and finally produce the gel containing The service life of the pulverized product liquid may reduce the drying efficiency of the coating film formed by using the aforementioned gel-containing pulverized product liquid. In addition, the above-mentioned other solvents in the above-mentioned gel pulverization step are also referred to as "solvent for pulverization" hereinafter.
前述粉碎用溶劑(其他溶劑)無特別限制,例如可使用有機溶劑。前述有機溶劑可舉如沸點140℃以下、沸點130℃以下、沸點100℃以下、沸點85℃以下之溶劑。具體例可舉如異丙醇(IPA)、乙醇、甲醇、正丁醇、2-丁醇、異丁醇、戊醇、丙二醇單甲基醚(PGME)、甲賽璐蘇、丙酮等。前述粉碎用溶劑例如可為1種亦可將2種以上併用。The above-mentioned pulverization solvent (other solvent) is not particularly limited, and for example, an organic solvent can be used. Examples of the aforementioned organic solvents include solvents having a boiling point of 140°C or lower, a boiling point of 130°C or lower, a boiling point of 100°C or lower, and a boiling point of 85°C or lower. Specific examples include isopropanol (IPA), ethanol, methanol, n-butanol, 2-butanol, isobutanol, pentanol, propylene glycol monomethyl ether (PGME), methylcelluco, acetone, and the like. The aforementioned pulverizing solvent may be used alone, for example, or in combination of two or more.
又,在前述粉碎用溶劑之極性很低等的情況下,譬如亦可將前述溶劑置換步驟分成多階段的溶劑置換階段執行,且在前述溶劑置換階段中,且前述其他溶劑的親水性在後行階段比先行階段更低。藉由這種設定,譬如可提升溶劑置換效率,極度降低前述凝膠中之凝膠製造用溶劑(譬如DMSO)的殘存量。就具體例而言,譬如可將前述溶劑置換步驟分成3階段的溶劑置換階段進行,在第1溶劑置換階段中首先將凝膠中之DMSO置換成水,接著在第2溶劑置換階段中將凝膠中之前述水置換成IPA,再於第3置換階段中將凝膠中之前述IPA置換成異丁醇。Also, in the case where the polarity of the solvent for pulverization is very low, for example, the aforementioned solvent replacement step can be divided into multi-stage solvent replacement stages, and in the aforementioned solvent replacement stage, the hydrophilicity of the aforementioned other solvents is lower than that of the aforementioned other solvents. The running stage is lower than the preceding stage. With this setting, for example, the efficiency of solvent replacement can be improved, and the remaining amount of the gel-making solvent (such as DMSO) in the aforementioned gel can be extremely reduced. For a specific example, for example, the aforementioned solvent replacement step can be divided into three stages of solvent replacement. In the first solvent replacement stage, the DMSO in the gel is first replaced with water, and then in the second solvent replacement stage. The aforementioned water in the gel was replaced with IPA, and then the aforementioned IPA in the gel was replaced with isobutanol in the third replacement stage.
前述凝膠化用溶劑與前述粉碎用溶劑之組合並無特別限制,可舉如DMSO與IPA之組合、DMSO與乙醇之組合、DMSO與異丁醇之組合、DMSO與正丁醇之組合等。如此一來,藉由將前述凝膠化用溶劑換成前述粉碎用溶劑,例如可在後述之塗膜形成中形成較均一的塗覆膜。The combination of the solvent for gelation and the solvent for pulverization is not particularly limited, and examples include combinations of DMSO and IPA, combinations of DMSO and ethanol, combinations of DMSO and isobutanol, combinations of DMSO and n-butanol, and the like. In this way, by replacing the solvent for gelation with the solvent for pulverization, a relatively uniform coating film can be formed, for example, in the coating film formation described later.
前述溶劑置換步驟無特別限定,譬如可以下述方式進行。即,首先將利用前述凝膠製造步驟製得的凝膠(譬如前述熟成處理後之凝膠)浸漬或接觸前述其他溶劑,使前述凝膠中之凝膠製造用觸媒、藉縮合反應所生成之醇成分、水等溶解至前述其他溶劑中。其後丟棄已浸漬或接觸前述凝膠的溶劑,使前述凝膠再度浸漬或接觸新的溶劑。重複此程序直到前述凝膠中之凝膠製造用溶劑的殘存量成為期望之量為止。每1次之浸漬時間譬如為0.5小時以上、1小時以上或1.5小時以上,上限值並無特別限定,譬如為10小時以下。又,上述溶劑之浸漬亦可以使前述溶劑連續接觸凝膠的方式來對應。又,前述浸漬中之溫度並無特別限定,譬如可為20~70℃、25~65℃或30~60℃。進行加熱能使溶劑置換快速進展,置換所需的必要溶劑量只需少量即可,不過亦可在室溫下簡便地進行溶劑置換。又,譬如將前述溶劑置換步驟分成多階段的溶劑置換階段執行時,前述多階段的溶劑置換階段之各階段亦可以如前述方式進行。The aforementioned solvent replacement step is not particularly limited, and can be performed, for example, in the following manner. That is, first, the gel (such as the gel after the aforementioned aging treatment) prepared by the aforementioned gel manufacturing step is immersed or contacted with the aforementioned other solvents, so that the catalyst for gel manufacturing in the aforementioned gel is formed by condensation reaction. Alcohol components, water, etc. are dissolved in the aforementioned other solvents. Thereafter, the solvent that has impregnated or contacted the aforementioned gel is discarded, and the aforementioned gel is impregnated or exposed to a new solvent again. This procedure is repeated until the remaining amount of the solvent for gel production in the aforementioned gel reaches the desired amount. The immersion time per one time is, for example, 0.5 hours or more, 1 hour or more, or 1.5 hours or more, and the upper limit is not particularly limited, for example, it is 10 hours or less. In addition, the impregnation with the above-mentioned solvent can also be handled in such a manner that the above-mentioned solvent is continuously brought into contact with the gel. Moreover, the temperature in the said immersion is not specifically limited, For example, it may be 20-70 degreeC, 25-65 degreeC, or 30-60 degreeC. Heating enables rapid progress of the solvent exchange, which requires only a small amount of solvent necessary for the exchange, but the solvent exchange can also be easily performed at room temperature. Also, for example, when the aforementioned solvent replacement step is divided into multi-stage solvent replacement stages, each stage of the aforementioned multi-stage solvent replacement steps can also be performed in the same manner as described above.
另,譬如亦可將前述溶劑置換步驟分成多階段的溶劑置換階段執行,且前述其他溶劑的親水性在後行階段比先行階段更低。如此一來,便可將置換用溶劑(前述其他溶劑)從親水性高的溶劑慢慢地換成親水性低(疏水性高)的溶劑,藉此可使凝膠中之凝膠製造用溶劑的殘存量變得極少。以上述方法,譬如可進一步製造空隙率高(因此,譬如低折射率)的空隙層。In addition, for example, the above-mentioned solvent replacement step may be divided into multi-stage solvent replacement stages, and the hydrophilicity of the aforementioned other solvents is lower in the subsequent stages than in the preceding stages. In this way, the replacement solvent (other solvents mentioned above) can be gradually changed from a highly hydrophilic solvent to a low hydrophilic (high hydrophobic) solvent, thereby making the gel-making solvent in the gel The remaining amount has become very small. With the method described above, for example, a further voided layer with a high porosity (and thus, for example, a low refractive index) can be produced.
進行前述溶劑置換步驟後,前述凝膠中之凝膠製造用溶劑殘存量宜為0.005g/ml以下,更宜為0.001g/ml以下,尤宜為0.0005g/ml以下。前述凝膠中之凝膠製造用溶劑殘存量的殘存量下限值並無特別限定,譬如可為零、檢測極限值以下或小於。After the aforementioned solvent replacement step, the residual amount of the gel-making solvent in the aforementioned gel is preferably less than 0.005 g/ml, more preferably less than 0.001 g/ml, and especially preferably less than 0.0005 g/ml. The lower limit of the residual amount of the solvent for gel production in the aforementioned gel is not particularly limited, for example, it may be zero, the detection limit value or less.
進行前述溶劑置換步驟後,前述凝膠中之凝膠製造用溶劑殘存量譬如可以下述方法測定。After performing the solvent replacement step, the remaining amount of the solvent for gel production in the gel can be measured, for example, by the following method.
(凝膠中之凝膠製造用溶劑的殘存量測定方法) 採取凝膠0.2g並添加丙酮10ml,在室溫下使用振盪器以120rpm振盪3日進行萃取。將其1μl萃取液注入氣相層析分析器(Aglent公司製、商品名7890A)中進行分析。另,為了確認測定的重現性,譬如亦可以n=2(測定次數2次)或其以上之測定次數進行採樣來測定。進一步從試樣製作檢測線,求出凝膠每1g中之各成分量,算出凝膠每1g中的凝膠製造溶劑之殘存量。(Measurement method of remaining amount of solvent for gel production in gel) 0.2 g of gel was collected, 10 ml of acetone was added, and it was extracted by shaking at room temperature at 120 rpm for 3 days using a shaker. 1 µl of the extract was injected into a gas chromatography analyzer (manufactured by Aglent, trade name 7890A) for analysis. In addition, in order to confirm the reproducibility of the measurement, for example, n=2 (the number of times of measurement is 2 times) or more may be sampled and measured. Further, a test line was prepared from the sample, and the amount of each component per 1 g of the gel was obtained, and the remaining amount of the gel-making solvent per 1 g of the gel was calculated.
將前述溶劑置換步驟分成多階段的溶劑置換階段執行,且前述其他溶劑的親水性在後行階段比先行階段更低時,前述其他溶劑(置換用溶劑)無特別限定。惟在最後執行的前述溶劑置換階段中,前述其他溶劑(置換用溶劑)宜為空隙層製造用溶劑。前述空隙層製造用溶劑可舉如沸點140℃以下之溶劑。又,前述空隙層製造用溶劑可舉如醇、醚、酮、酯系溶劑、脂肪族烴系溶劑、芳香族系溶劑等。沸點140℃以下之醇的具體例可舉如異丙醇(IPA)、乙醇、甲醇、正丁醇、2-丁醇、異丁醇(IBA)、1-戊醇、2-戊醇等。沸點140℃以下之醚的具體例可舉如丙二醇單甲基醚(PGME)、甲賽璐蘇、乙賽璐蘇等。沸點140℃以下之酮的具體例可舉如丙酮、甲基乙基酮、甲基異丁基酮、環戊酮等。沸點140℃以下之酯系溶劑的具體例可舉如乙酸乙酯、乙酸丁酯、乙酸異丙酯、乙酸正丙酯等。沸點140℃以下之脂肪族烴系溶劑的具體例可舉如己烷、環己烷、庚烷、辛烷等。沸點140℃以下之芳香族系溶劑的具體例可舉如甲苯、苯、二甲苯、大茴香醚等。在塗覆時,若從不易侵蝕基材(譬如樹脂薄膜)的觀點來看,前述空隙層製造用溶劑宜為醇、醚或脂肪族烴系溶劑。又,前述粉碎用溶劑例如可為1種亦可將2種以上併用。尤其,從室溫下為低揮發性的面向來看,以異丙醇(IPA)、乙醇、正丁醇、2-丁醇、異丁醇(IBA)、戊醇、丙二醇單甲基醚(PGME)、甲賽璐蘇、庚烷、辛烷為宜。尤其為了抑制凝膠材質之粒子(譬如二氧化矽化合物)飛散,前述空隙層製造用溶劑之飽和蒸氣壓不宜過高(揮發性不過高)。這類的溶劑,譬如以具有碳數3或4以上之脂肪族基的溶劑為宜,且具有碳數4以上之脂肪族基的溶劑較佳。前述具有碳數3或4以上之脂肪族基的溶劑譬如亦可為醇。這類的溶劑具體上譬如以異丙醇(IPA)、異丁醇(IBA)、正丁醇、2-丁醇、1-戊醇、2-戊醇為佳,且異丁醇(IBA)尤佳。When the aforementioned solvent replacement step is divided into multi-stage solvent replacement steps, and the hydrophilicity of the aforementioned other solvent is lower in the later stage than in the preceding stage, the aforementioned other solvent (solvent for replacement) is not particularly limited. However, in the aforementioned solvent replacement stage performed last, the aforementioned other solvent (solvent for replacement) is preferably a solvent for the formation of the void layer. Examples of the aforementioned solvent for forming the void layer include solvents having a boiling point of 140° C. or lower. In addition, examples of the aforementioned solvent for void layer production include alcohols, ethers, ketones, ester-based solvents, aliphatic hydrocarbon-based solvents, aromatic-based solvents, and the like. Specific examples of alcohols having a boiling point of 140° C. or less include isopropanol (IPA), ethanol, methanol, n-butanol, 2-butanol, isobutanol (IBA), 1-pentanol, and 2-pentanol. Specific examples of ethers having a boiling point of 140° C. or lower include propylene glycol monomethyl ether (PGME), methylcelluloid, and ethylcelluloid. Specific examples of ketones having a boiling point of 140° C. or lower include acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclopentanone. Specific examples of ester-based solvents having a boiling point of 140° C. or less include ethyl acetate, butyl acetate, isopropyl acetate, and n-propyl acetate. Specific examples of the aliphatic hydrocarbon solvent having a boiling point of 140° C. or less include hexane, cyclohexane, heptane, octane, and the like. Specific examples of the aromatic solvent having a boiling point of 140° C. or less include toluene, benzene, xylene, anisole, and the like. During coating, the solvent for forming the void layer is preferably an alcohol, ether or aliphatic hydrocarbon solvent from the viewpoint of not easily corroding the substrate (such as a resin film). Moreover, the above-mentioned pulverizing solvent may be used, for example, by 1 type or in combination of 2 or more types. In particular, isopropanol (IPA), ethanol, n-butanol, 2-butanol, isobutanol (IBA), pentanol, propylene glycol monomethyl ether ( PGME), methyl celluloid, heptane, octane are suitable. In particular, in order to suppress the scattering of the particles of the gel material (such as silicon dioxide compound), the saturated vapor pressure of the solvent for forming the void layer should not be too high (the volatility should not be too high). Such solvents are preferably solvents having aliphatic groups having 3 or more carbon atoms, and solvents having aliphatic groups having 4 or more carbon atoms are more preferable. The aforementioned solvent having an aliphatic group having 3 or more carbon atoms may also be, for example, alcohol. Such solvents are specifically such as isopropanol (IPA), isobutanol (IBA), n-butanol, 2-butanol, 1-pentanol, 2-pentanol, and isobutanol (IBA) Excellent.
最後進行之前述溶劑置換階段以外的前述其他溶劑(置換用溶劑)無特別限定,可舉如醇、醚、酮等。醇之具體例可舉如異丙醇(IPA)、乙醇、甲醇、正丁醇、2-丁醇、異丁醇(IBA)、戊醇等。醚之具體例可舉如丙二醇單甲基醚(PGME)、甲賽璐蘇、乙賽璐蘇等。酮之具體例可舉如丙酮等。前述其他溶劑(置換用溶劑)只要能置換前述凝膠製造用溶劑或其前面階段之前述其他溶劑(置換用溶劑)即可。又,最後進行之前述溶劑置換階段以外的前述其他溶劑(置換用溶劑)以最終不會殘留在凝膠中或是即使殘留但在塗覆時不易侵蝕基材(譬如樹脂薄膜)的溶劑為宜。若從塗覆時不易侵蝕基材(譬如樹脂薄膜)的觀點來看,最後進行之前述溶劑置換階段以外的前述其他溶劑(置換用溶劑)宜為醇。如此一來,在前述多階段的溶劑置換階段之至少一段的前述其他溶劑為醇為佳。The aforementioned other solvents (solvents for substitution) other than the aforementioned solvent substitution stage performed last are not particularly limited, and examples thereof include alcohols, ethers, and ketones. Specific examples of the alcohol include isopropanol (IPA), ethanol, methanol, n-butanol, 2-butanol, isobutanol (IBA), pentanol, and the like. Specific examples of ethers include propylene glycol monomethyl ether (PGME), methyl-celluloid, ethyl-celluloid, and the like. Specific examples of ketones include acetone and the like. The aforementioned other solvent (solvent for replacement) may be used as long as it can replace the aforementioned solvent for gel production or the aforementioned other solvent (solvent for replacement) in the previous stage. In addition, it is preferable that the other solvents (replacement solvents) other than the above-mentioned solvent replacement step performed last are solvents that do not remain in the gel at the end or that are less likely to corrode the substrate (such as a resin film) during coating even if they remain. . From the viewpoint of not easily corroding the base material (such as a resin film) during coating, the other solvent (replacement solvent) other than the above-mentioned solvent replacement stage carried out at the end is preferably alcohol. In this way, it is preferable that the aforementioned other solvent in at least one stage of the aforementioned multi-stage solvent replacement stage is alcohol.
在最初進行之前述溶劑置換階段中,前述其他溶劑譬如可為水或是以任意比率含有水之混合溶劑。只要是水或含有水之混合溶劑,與親水性高的凝膠製造用溶劑(譬如DMSO)之相溶性即高,因此容易置換前述凝膠製造用溶劑,而且從成本面來看亦佳。In the initial solvent replacement stage, the other solvent may be, for example, water or a mixed solvent containing water in any ratio. As long as it is water or a mixed solvent containing water, it has high compatibility with a highly hydrophilic gel-making solvent (such as DMSO), so it is easy to replace the above-mentioned gel-making solvent, and it is also preferable in terms of cost.
前述多階段的溶劑置換階段亦可包含下列階段:前述其他溶劑為水之階段;其後進行之前述其他溶劑為具有碳數3以下脂肪族基之溶劑的階段;及再於其後進行之前述其他溶劑為具有碳數4以上脂肪族基之溶劑的階段。又,前述具有碳數3以下脂肪族基之溶劑與前述具有碳數4以上脂肪族基之溶劑中的至少一者亦可為醇。具有碳數3以下脂肪族基之醇並無特別限定,可舉如異丙醇(IPA)、乙醇、甲醇、正丙基醇等。具有碳數4以上脂肪族基之醇並無特別限定,可舉如正丁醇、2-丁醇、異丁醇(IBA)、戊醇等。譬如,亦可以是前述具有碳數3以下脂肪族基之溶劑為異丙醇,而前述具有碳數4以上脂肪族基之溶劑為異丁醇。The aforementioned multi-stage solvent replacement stage may also include the following stages: the stage in which the aforementioned other solvent is water; the subsequent stage in which the aforementioned other solvent is a solvent having an aliphatic group with a carbon number of 3 or less; and the subsequent aforementioned Other solvents are solvents having an aliphatic group having 4 or more carbon atoms. Also, at least one of the solvent having an aliphatic group having 3 or less carbon atoms and the solvent having an aliphatic group having 4 or more carbon atoms may be an alcohol. The alcohol having an aliphatic group having 3 or less carbon atoms is not particularly limited, and examples thereof include isopropanol (IPA), ethanol, methanol, and n-propyl alcohol. The alcohol having an aliphatic group having 4 or more carbon atoms is not particularly limited, and examples thereof include n-butanol, 2-butanol, isobutanol (IBA), and pentanol. For example, the solvent having an aliphatic group having 3 or less carbon atoms may be isopropanol, while the solvent having an aliphatic group having 4 or more carbon atoms may be isobutanol.
本發明人等發現,譬如若要在200℃以下之較溫和的條件下形成具有膜強度的空隙層,聚焦在前述凝膠製造用溶劑之殘存量上就非常重要。此見解在前述包含專利文獻及非專利文獻之先前技術中皆尚未揭示,乃本發明人等獨自發掘之解釋。The inventors of the present invention have found that it is very important to focus on the remaining amount of the aforementioned solvent for gel production in order to form a void layer having film strength under relatively mild conditions of, for example, 200°C or lower. This insight has not been disclosed in the aforementioned prior art including patent documents and non-patent documents, and is an explanation independently discovered by the inventors.
如此一來,藉由減低凝膠中之凝膠製造用溶劑的殘存量可製造低折射率之空隙層的理由(機制)尚不明確,不過,譬如可推測如下。即,如前述,為了進行凝膠化反應,凝膠製造用溶劑宜為高沸點溶劑(譬如DMSO等)。而且,在塗覆從前述凝膠製得之溶膠液並予以乾燥來製造空隙層時,以通常的乾燥溫度及乾燥時間(未特別限定,不過譬如係在100℃下進行1分鐘等)很難完全去除前述高沸點溶劑。因為,一旦乾燥溫度過高或乾燥時間過長,便可能發生基材劣化等問題。而且,於前述塗覆乾燥時所殘留的前述高沸點溶劑會進入前述凝膠之粉碎物彼此之間,使前述粉碎物彼此產生滑動而讓前述粉碎物彼此緊密地堆積,減少空隙率,因而推測很難顯現低折射率。亦即,相反地只要減少前述高沸點溶劑之殘存量,便可抑制這種現象,從而可顯現低折射率。惟,該等僅為推測機制之一例,對本發明不具任何限定。In this way, the reason (mechanism) for producing a low-refractive-index void layer by reducing the remaining amount of the gel-forming solvent in the gel is not clear, but it can be speculated as follows, for example. That is, as mentioned above, in order to carry out the gelation reaction, the solvent for gel production is preferably a high boiling point solvent (such as DMSO, etc.). In addition, when the sol solution obtained from the aforementioned gel is applied and dried to form a void layer, it is difficult to use the usual drying temperature and drying time (not particularly limited, but for example, at 100° C. for 1 minute, etc.) The aforementioned high boiling point solvent was completely removed. Because, once the drying temperature is too high or the drying time is too long, problems such as substrate degradation may occur. In addition, the high-boiling-point solvent remaining during the coating and drying process will enter between the pulverized products of the gel, causing the pulverized products to slide against each other so that the pulverized products can be packed closely to reduce the porosity. Therefore, it is speculated that Difficult to visualize low refractive index. That is, conversely, by reducing the residual amount of the above-mentioned high boiling point solvent, this phenomenon can be suppressed and a low refractive index can be exhibited. However, these are only examples of the presumed mechanism and do not limit the present invention in any way.
另,在本發明中,「溶劑」(譬如凝膠製造用溶劑、空隙層製造用溶劑、置換用溶劑等)可以不用溶解凝膠或其粉碎物等,譬如亦可使前述凝膠或其粉碎物等分散或沉澱在前述溶劑中。In addition, in the present invention, the "solvent" (such as a solvent for gel production, a solvent for void layer production, a solvent for replacement, etc.) does not need to dissolve the gel or its pulverization, for example, the aforementioned gel or its pulverization may be dissolved. substances, etc. are dispersed or precipitated in the aforementioned solvents.
前述凝膠製造用溶劑如前述,譬如亦可以沸點在140℃以上。The above-mentioned solvent for gel production may have a boiling point of 140° C. or higher, for example, as described above.
前述凝膠製造用溶劑譬如為水溶性溶劑。另,在本發明中,「水溶性溶劑」意指可以任意比率與水混合之溶劑。The aforementioned solvent for gel production is, for example, a water-soluble solvent. In addition, in the present invention, the "water-soluble solvent" means a solvent that can be mixed with water at any ratio.
將前述溶劑置換步驟分成多階段的溶劑置換階段進行時,其方法無特別限定,譬如可以下述方式進行各階段的溶劑置換階段。即,首先使前述凝膠浸漬或接觸前述其他溶劑,使前述凝膠中之凝膠製造用觸媒、藉縮合反應所生成之醇成分、水等溶解至前述其他溶劑中。其後丟棄已浸漬或接觸前述凝膠的溶劑,使前述凝膠再度浸漬或接觸新的溶劑。重複此程序直到前述凝膠中之凝膠製造用溶劑的殘存量成為期望之量為止。每1次之浸漬時間譬如為0.5小時以上、1小時以上或1.5小時以上,上限值並無特別限定,譬如為10小時以下。又,上述溶劑之浸漬亦可以使前述溶劑連續接觸凝膠的方式來對應。又,前述浸漬中之溫度並無特別限定,譬如可為20~70℃、25~65℃或30~60℃。進行加熱能使溶劑置換快速進展,置換所需的必要溶劑量只需少量即可,不過亦可在室溫下簡便地進行溶劑置換。將該溶劑置換階段進行數次,並將前述其他溶劑(置換用溶劑)慢慢地從親水性高的溶劑換成親水性低(疏水性高)的溶劑。為了去除親水性高的凝膠製造用溶劑(譬如DMSO等),譬如同前述,於一開始用水作為置換用溶劑,既簡易且效率佳。接著,以水去除DMSO等後,將凝膠中之水譬如按異丙醇⇒異丁醇(塗覆用溶劑)之順序進行置換。即,水與異丁醇之相溶性低,所以先暫且置換成異丙醇後,再置換成塗覆溶劑之異丁醇,便可有效率地進行溶劑置換。惟,此為一例,如前述,前述其他溶劑(置換用溶劑)並無特別限定。When the aforementioned solvent replacement step is divided into multi-stage solvent replacement steps, the method is not particularly limited. For example, each solvent replacement step can be performed in the following manner. That is, firstly, the aforementioned gel is immersed or contacted with the aforementioned other solvent, and the catalyst for gel production, the alcohol component produced by the condensation reaction, water, etc. in the aforementioned gel are dissolved in the aforementioned other solvent. Thereafter, the solvent that has impregnated or contacted the aforementioned gel is discarded, and the aforementioned gel is impregnated or exposed to a new solvent again. This procedure is repeated until the remaining amount of the solvent for gel production in the aforementioned gel reaches the desired amount. The immersion time per one time is, for example, 0.5 hours or more, 1 hour or more, or 1.5 hours or more, and the upper limit is not particularly limited, for example, it is 10 hours or less. In addition, the impregnation with the above-mentioned solvent can also be handled in such a manner that the above-mentioned solvent is continuously brought into contact with the gel. Moreover, the temperature in the said immersion is not specifically limited, For example, it may be 20-70 degreeC, 25-65 degreeC, or 30-60 degreeC. Heating enables rapid progress of the solvent exchange, which requires only a small amount of solvent necessary for the exchange, but the solvent exchange can also be easily performed at room temperature. This solvent replacement step is carried out several times, and the aforementioned other solvent (replacement solvent) is gradually replaced from a highly hydrophilic solvent to a low hydrophilic (high hydrophobic) solvent. In order to remove the highly hydrophilic gel-making solvent (such as DMSO, etc.), as mentioned above, it is simple and efficient to use water as the replacement solvent at the beginning. Next, after removing DMSO and the like with water, the water in the gel is replaced, for example, in the order of isopropanol⇒isobutanol (solvent for coating). That is, the compatibility between water and isobutanol is low, so after replacing it with isopropanol for a while, and then replacing it with isobutanol for coating the solvent, the solvent replacement can be performed efficiently. However, this is an example, and as mentioned above, the said other solvent (solvent for substitution) is not specifically limited.
在本發明中,凝膠之製造方法譬如同前述,亦可將前述溶劑置換階段進行數次,並將前述其他溶劑(置換用溶劑)慢慢地從親水性高的溶劑換成親水性低(疏水性高)的溶劑。藉此,如前述,可極度降低前述凝膠中之凝膠製造用溶劑的殘存量。不僅如此,譬如比起僅使用塗覆用溶劑以1階段進行溶劑置換,更能極致壓低減少溶劑之使用量,因而還可做到低成本化。In the present invention, the manufacturing method of the gel is as described above, and the above-mentioned solvent replacement stage can also be carried out several times, and the above-mentioned other solvents (replacement solvents) are slowly changed from a highly hydrophilic solvent to a low-hydrophilic ( highly hydrophobic solvents. Thereby, as mentioned above, the residual amount of the solvent for gel production in the said gel can be extremely reduced. Not only that, but for example, compared to one-stage solvent replacement using only the solvent for coating, the amount of solvent used can be reduced to an extreme level, and thus the cost can also be reduced.
然後,於前述溶劑置換步驟後進行凝膠粉碎步驟,即在前述粉碎用溶劑中將前述凝膠予以粉碎。又譬如同前述,亦可於前述溶劑置換步驟後且前述凝膠粉碎步驟之前,視需求進行凝膠濃度測定,再於其後視需求進行前述凝膠濃度調整步驟。前述溶劑置換步驟後且前述凝膠粉碎步驟前的凝膠濃度測定譬如可以下述方式進行。即,首先於前述溶劑置換步驟後,從前述其他溶劑(粉碎用溶劑)中取出凝膠。該凝膠譬如已經由前述凝膠形態控制步驟控制成適當的形狀及大小(譬如塊狀)的團塊。接著去除附著在前述凝膠之團塊周圍的溶劑後,利用重量乾燥法測定一個凝膠團塊中所占的固體成分濃度。此時,為了取得測定值的重現性,以隨機取出之多個(譬如6個)團塊進行測定,並算出其平均值與值之參差。前述濃度調整步驟譬如可藉由進一步添加前述其他溶劑(粉碎用溶劑),來降低前述含凝膠液體之凝膠濃度。又,前述濃度調整步驟亦可相反地藉由使前述其他溶劑(粉碎用溶劑)蒸發,來提升前述含凝膠液體之凝膠濃度。Then, after the solvent replacement step, a gel pulverization step is performed, that is, the gel is pulverized in the pulverization solvent. For another example, as mentioned above, after the solvent replacement step and before the gel pulverization step, the gel concentration measurement may be performed as required, and then the gel concentration adjustment step may be performed as required. The measurement of the gel concentration after the solvent replacement step and before the gel pulverization step can be performed, for example, as follows. That is, first, after the above-mentioned solvent replacement step, the gel is taken out from the above-mentioned other solvent (solvent for pulverization). The gel, for example, has been controlled into an agglomerate of appropriate shape and size (eg block) by the aforementioned gel shape control step. Next, after removing the solvent adhering to the agglomerate of the gel, the concentration of the solid content in one gel agglomerate was measured by the gravimetric drying method. At this time, in order to obtain the reproducibility of the measured value, a plurality of (for example, 6) agglomerates taken out at random are used for measurement, and the average value and the variance of the value are calculated. In the concentration adjustment step, for example, the gel concentration of the gel-containing liquid can be reduced by further adding the other solvent (solvent for pulverization). In addition, in the aforementioned concentration adjustment step, conversely, the gel concentration of the aforementioned gel-containing liquid may be increased by evaporating the aforementioned other solvent (solvent for pulverization).
在本發明之含凝膠粉碎物液體的製造方法中,如前述,前述凝膠粉碎步驟可以1階段進行,不過宜分成多個粉碎階段進行。具體上,譬如可進行前述第1粉碎階段及前述第2粉碎階段。又,前述凝膠粉碎步驟除了前述第1粉碎階段及前述第2粉碎階段外,亦可進一步施行凝膠粉碎步驟。即,在本發明之製造方法中,前述凝膠粉碎步驟不限於2階段的粉碎階段,亦可包含3階段以上的粉碎階段。In the method for producing a liquid containing a ground gel product of the present invention, as described above, the gel pulverization step may be performed in one stage, but it is preferably divided into a plurality of pulverization stages. Specifically, for example, the aforementioned first pulverization stage and the aforementioned second pulverization stage can be performed. In addition, in the above-mentioned gel pulverization step, a gel pulverization step may be further performed in addition to the aforementioned first pulverization step and the aforementioned second pulverization step. That is, in the production method of the present invention, the above-mentioned gel pulverization step is not limited to two pulverization stages, but may include three or more pulverization stages.
以下針對前述第1粉碎階段及前述第2粉碎階段加以說明。Hereinafter, the above-mentioned first crushing stage and the above-mentioned second crushing stage will be described.
前述第1粉碎階段係將前述多孔體凝膠予以粉碎之步驟。前述第2粉碎階段係於前述第1粉碎階段後,將前述多孔體凝膠之粒子進一步粉碎的步驟。The aforementioned first pulverization step is a step of pulverizing the aforementioned porous body gel. The second crushing stage is a step of further crushing the particles of the porous body gel after the first crushing stage.
經由前述第1粉碎階段製得之前述多孔體凝膠之粒子的體積平均粒徑,及經由前述第2粉碎階段製得之前述多孔體凝膠之粒子的體積平均粒徑譬如同前述。關於前述體積平均粒徑之測定方法亦譬如同前述。The volume average particle diameter of the particles of the porous gel obtained through the first pulverization step and the volume average particle diameter of the particles of the porous gel obtained through the second pulverization step are as described above. The method for measuring the above-mentioned volume average particle diameter is also the same as above, for example.
前述含凝膠粉碎物液體在前述第1粉碎階段後當下的剪切黏度及前述第2粉碎階段後當下的剪切黏度譬如同前述。關於前述剪切黏度之測定方法亦譬如同前述。The shear viscosity of the gel-containing pulverized product liquid immediately after the first pulverization stage and the shear viscosity immediately after the second pulverization stage are, for example, as described above. The method for measuring the aforementioned shear viscosity is, for example, the same as described above.
另,譬如同前述,亦可於前述第1粉碎階段後當下即測定含凝膠液體之凝膠濃度,並僅將前述凝膠濃度為預定數值範圍內之前述液體供給至前述第2粉碎階段,藉以進行前述含凝膠液體之濃度管理。In addition, as mentioned above, it is also possible to measure the gel concentration of the gel-containing liquid immediately after the first crushing stage, and only supply the liquid whose gel concentration is within a predetermined value range to the second crushing stage, In order to manage the concentration of the aforementioned gel-containing liquid.
前述多孔體凝膠之粉碎方法無特別限制,譬如可藉由下列裝置進行:高壓無介質粉碎裝置、超音波均質機、高速旋轉均質機、高壓擠出粉碎裝置、其他利用空蝕現象之濕式無介質粉碎裝置等。前述第1粉碎階段及前述第2粉碎階段可施行相同的粉碎方法,亦可施行彼此互異的粉碎方法,不過宜施行彼此互異的粉碎方法。The pulverization method of the aforementioned porous body gel is not particularly limited, for example, it can be carried out by the following devices: high-pressure non-media pulverization device, ultrasonic homogenizer, high-speed rotary homogenizer, high-pressure extrusion pulverization device, other wet-type methods using cavitation phenomenon No medium crushing device etc. The aforementioned first pulverization stage and the aforementioned second pulverization stage may be performed by the same pulverization method, or mutually different pulverization methods may be performed, but it is preferable to perform mutually different pulverization methods.
就前述粉碎方法而言,宜藉由利用控制能量來粉碎前述多孔體凝膠之方法,施行前述第1粉碎階段及前述第2粉碎階段中之至少一者。前述利用控制能量來粉碎前述多孔體凝膠之方法,可舉如利用高壓無介質粉碎裝置等進行之方法。As for the pulverization method, at least one of the first pulverization step and the second pulverization step is preferably performed by a method of pulverizing the porous body gel by controlling energy. The aforementioned method of pulverizing the porous gel by controlling energy may, for example, be performed using a high-pressure medialess pulverizing device.
在利用超音波粉碎前述多孔體凝膠之方法中,粉碎強度雖強但難以控制(調節)粉碎。相對地,若是利用控制能量來粉碎前述多孔體凝膠之方法,則可在控制(調節)前述粉碎的情況下進行粉碎。藉此,可在限定的作業量下製造均勻的含凝膠粉碎物液體。因此,譬如可以量產步調來製造前述含凝膠粉碎物液體。In the method of crushing the aforementioned porous gel by ultrasonic wave, although the crushing strength is strong, it is difficult to control (adjust) the crushing. On the other hand, in the method of pulverizing the porous gel by controlling energy, pulverization can be performed while controlling (adjusting) the pulverization. Thereby, a uniform gel-containing pulverized product liquid can be produced with a limited amount of work. Therefore, for example, it is possible to manufacture the liquid containing the pulverized gel in mass production steps.
珠磨機等進行介質粉碎的裝置係譬如於粉碎時以物理性破壞凝膠空隙結構,與之相對的,譬如均質機等空蝕方式粉碎裝置則因為是無介質方式,故是以高速的剪切力將早已內包在凝膠三維結構中之結合力較微弱的多孔質粒子接合面剝離。如此一來,藉由粉碎前述多孔體凝膠可製得新的溶膠三維結構,前述三維結構譬如在形成塗覆膜時,可保持具有一定範圍之粒度分布的空隙結構,可藉由塗覆、乾燥時的堆積再形成空隙結構。前述粉碎條件無特別限制,例如宜藉由瞬間賦予高速的流動,以不使溶劑揮發的方式將凝膠粉碎。例如,宜以成為如前述之粒度參差(例如體積平均粒徑或粒度分布)的粉碎物的方式進行粉碎。假設當粉碎時間、強度等作業量不足時,譬如像殘留有粗粒,不僅無法形成緻密的細孔,還有可能增加外觀缺陷,從而無法獲得高品質。另一方面,當前述作業量過多時,例如可能會形成比期望的粒度分布更微細的溶膠粒子,使塗覆、乾燥後堆積而成的空隙尺寸變微細,而無法達成期望的空隙率。Devices that perform media crushing such as bead mills, for example, physically destroy the gel void structure during crushing. In contrast, cavitation crushing devices such as homogenizers use high-speed shearing because they are media-free. The shearing force peels off the joint surfaces of the porous particles that have already been included in the three-dimensional structure of the gel and have a weaker binding force. In this way, a new three-dimensional structure of the sol can be obtained by pulverizing the aforementioned porous body gel. The aforementioned three-dimensional structure, for example, can maintain a void structure with a particle size distribution within a certain range when forming a coating film. The build-up on drying re-forms the void structure. The aforementioned pulverization conditions are not particularly limited. For example, it is preferable to pulverize the gel without volatilizing the solvent by instantaneously imparting a high-speed flow. For example, it is preferable to pulverize so as to become a pulverized product with uneven particle size (for example, volume average particle diameter or particle size distribution) as described above. Assuming that when the amount of work such as crushing time and intensity is insufficient, for example, if there are coarse particles remaining, not only the dense pores cannot be formed, but also the appearance defects may increase, so that high quality cannot be obtained. On the other hand, if the above-mentioned workload is too much, for example, sol particles with a finer particle size distribution than desired may be formed, and the size of voids accumulated after coating and drying may be fined, so that the desired porosity may not be achieved.
在前述第1粉碎階段及前述第2粉碎階段之至少一者中,宜在測定前述液體之剪切黏度的同時,控制前述多孔體之粉碎。具體的方法可舉如,在前述粉碎階段之中間階段調整已兼具期望之剪切黏度及極為優異之均勻性的溶膠液的方法、以聯機(in-line)監測前述液體之剪切黏度並反饋給前述粉碎階段之方法。藉此可製造已兼具期望之剪切黏度及極為優異的均勻性之含凝膠粉碎物液體。所以,譬如可將前述含凝膠粉碎物液體因應其用途來控制特性。In at least one of the first pulverization stage and the second pulverization stage, it is preferable to control the pulverization of the porous body while measuring the shear viscosity of the liquid. Specific methods can be exemplified by adjusting the sol liquid with desired shear viscosity and excellent uniformity in the middle stage of the aforementioned pulverization stage, monitoring the shear viscosity of the aforementioned liquid on-line (in-line) and Feedback to the method of the aforementioned crushing stage. Thereby, it is possible to manufacture a gel-containing pulverized product liquid having both desired shear viscosity and extremely excellent uniformity. Therefore, for example, the properties of the liquid containing the above-mentioned pulverized gel can be controlled according to its use.
於前述粉碎階段後,前述多孔體凝膠為前述矽化合物凝膠時,前述粉碎物中所含殘留矽烷醇基之比率並無特別限制,譬如與針對前述熟成處理後之矽化合物凝膠所示範圍相同。After the aforementioned pulverization stage, when the aforementioned porous body gel is the aforementioned silicon compound gel, the ratio of residual silanol groups contained in the aforementioned pulverized product is not particularly limited, for example, as shown for the aforementioned silicon compound gel after aging treatment Same range.
在本發明之製造方法中,亦可進一步於前述凝膠粉碎步驟(前述第1粉碎階段及前述第2粉碎階段)之至少一者後進行分級步驟。前述分級步驟係將前述多孔體凝膠之粒子予以分級。前述「分級」譬如係按照粒徑來分別前述多孔體凝膠之粒子。分級方法無特別限制,可用篩進行。如此一來,藉由以多個階段施行粉碎處理,如同前述,前述多孔體凝膠之粉碎物會成為均勻性極為優異之物。因此,將前述多孔體凝膠之粉碎物應用在光學構件等用途時,可讓前述光學構件等有良好的外觀。此外,藉由對前述多孔體凝膠之粉碎物施行分級處理,可讓前述光學構件等有良好的外觀。In the production method of the present invention, a classification step may be further performed after at least one of the aforementioned gel pulverization steps (the aforementioned first pulverization stage and the aforementioned second pulverization stage). The aforementioned classification step is to classify the particles of the aforementioned porous body gel. The aforementioned "classification" refers to, for example, classifying the particles of the aforementioned porous body gel according to their particle diameters. The classification method is not particularly limited, and it can be carried out with a sieve. In this way, by performing the pulverization process in multiple stages, as described above, the pulverized product of the porous body gel can be extremely uniform. Therefore, when the pulverized product of the aforementioned porous body gel is applied to applications such as optical members, the appearance of the aforementioned optical members and the like can be improved. In addition, by classifying the pulverized material of the porous gel, the optical member and the like can have a good appearance.
於前述凝膠粉碎步驟及任意之前述分級步驟後,含有前述粉碎物之前述溶劑中的前述粉碎物比率並無特別限制,譬如可列舉前述之前述本發明之含凝膠粉碎物液體中的條件。前述比率譬如可為含有前述凝膠粉碎步驟後之前述粉碎物的溶劑本身的條件,亦可係在前述凝膠粉碎步驟後且在作為前述含凝膠粉碎物液體使用之前被予以調整的條件。After the above-mentioned gel pulverization step and any of the above-mentioned classification steps, the ratio of the aforementioned pulverized product in the aforementioned solvent containing the aforementioned pulverized product is not particularly limited, for example, the above-mentioned conditions in the above-mentioned gel pulverized product-containing liquid of the present invention can be cited. . The ratio may be, for example, a condition of the solvent itself containing the pulverized product after the gel pulverizing step, or may be a condition adjusted after the gel pulverizing step and before use as a liquid containing the pulverized gel.
以上述方式可製作含有前述微細孔粒子(凝膠狀化合物之粉碎物)之液體(譬如懸浮液)。又,藉由於製造出含有前述微細孔粒子之液體後或是在製作步驟中,添加使前述微細孔粒子彼此行化學鍵結的觸媒,可製造含有前述微細孔粒子及前述觸媒之含有液。前述觸媒之添加量無特別限定,相對於前述凝膠狀矽化合物之粉碎物的重量,譬如為0.01~20重量%、0.05~10重量%或0.1~5重量%。前述觸媒亦可為譬如促進前述微細孔粒子彼此之交聯鍵結的觸媒。使前述微細孔粒子彼此行化學鍵結之化學反應,宜利用二氧化矽溶膠分子中所含殘留矽烷醇基的脫水縮合反應。藉前述觸媒促進矽烷醇基之羥基彼此的反應,可做到在短時間內使空隙結構硬化的連續成膜。前述觸媒可列舉如光活性觸媒及熱活性觸媒。藉由前述光活性觸媒,例如在前述空隙層形成步驟中不用加熱就可讓前述微細孔粒子彼此行化學鍵結(例如交聯鍵結)。藉此,例如在前述空隙層形成步驟中就不容易引起前述空隙層全體的收縮,所以可維持較高的空隙率。又,除了前述觸媒以外,亦可使用產生觸媒之物質(觸媒產生劑)或乾脆取而代之。譬如,除了前述光活性觸媒以外,亦可使用藉由光產生觸媒之物質(光觸媒產生劑)或乾脆取而代之,又除了前述熱活性觸媒以外,亦可使用藉由熱產生觸媒之物質(熱觸媒產生劑)或乾脆取而代之。前述光觸媒產生劑無特別限定,可舉如光鹼產生劑(藉由光照射產生鹼性觸媒之物質)、光酸產生劑(藉由光照射產生酸性觸媒之物質)等,以光鹼產生劑為宜。前述光鹼產生劑可舉例如9-蒽基甲基N,N-二乙基胺甲酸酯(9-anthrylmethyl N,N-diethylcarbamate,商品名WPBG-018),(E)-1-[3-(2-羥基苯基)-2-丙烯醯基]哌啶((E)-1-[3-(2-hydroxyphenyl)-2-propenoyl]piperidine,商品名WPBG-027),1-(蒽醌-2-基)乙基咪唑羧酸酯(1-(anthraquinon-2-yl)ethyl imidazolecarboxylate,商品名WPBG-140),2-硝基苯甲基-4-甲基丙醯氧基哌啶-1-羧酸酯(商品名WPBG-165),1,2-二異丙基-3-[雙(二甲基胺基)亞甲基鈲]2-(3-苯甲醯基苯基)丙酸鹽(商品名WPBG-266),1,2-二環己基4,4,5,5-四甲基二鈲正丁基三苯基硼酸鹽(商品名WPBG-300),及2-(9-側氧基二苯并哌喃(xanthene)-2-基)丙酸1,5,7-三氮雜雙環[4.4.0]癸-5-烯(東京化成工業股份有限公司),含4-哌啶甲醇之化合物(商品名HDPD-PB100:Heraeus公司製)等。又,前述含有「WPBG」之商品名皆為和光純藥工業股份有限公司之商品名。前述光酸產生劑可舉如芳香族鋶鹽(商品名SP-170:ADEKA公司)、三芳基鋶鹽(商品名CPI101A:San-Apro Ltd.)、芳香族錪鹽(商品名Irgacure250:Ciba Japan公司)等。此外,使前述微細孔粒子彼此行化學鍵結之觸媒不限於前述光活性觸媒及前述光觸媒產生劑,例如亦可為熱活性觸媒或熱觸媒產生劑。使前述微細孔粒子彼此行化學鍵結之觸媒可舉如氫氧化鉀、氫氧化鈉、氫氧化銨等鹼性觸媒,及鹽酸、乙酸、草酸等酸觸媒等。該等中以鹼性觸媒為宜。使前述微細孔粒子彼此行化學鍵結之觸媒或觸媒產生劑,譬如可在正要進行塗覆前才添加至含有前述粉碎物(微細孔粒子)之溶膠粒子液(例如懸浮液)中作使用,或可作成已將前述觸媒或觸媒產生劑混合至溶劑中之混合液來使用。前述混合液例如可為:直接添加溶解於前述溶膠粒子液的塗覆液、使前述觸媒或觸媒產生劑溶解於溶劑的溶液、或使前述觸媒或觸媒產生劑分散於溶劑的分散液。前述溶劑無特別限制,可列舉如水、緩衝液等。A liquid (such as a suspension) containing the aforementioned microporous particles (crushed product of a gel-like compound) can be produced in the above-mentioned manner. In addition, a liquid containing the microporous particles and the catalyst can be produced by adding a catalyst for chemically bonding the microporous particles to each other after producing the liquid containing the microporous particles or during the production step. The amount of the catalyst added is not particularly limited, but is, for example, 0.01 to 20% by weight, 0.05 to 10% by weight, or 0.1 to 5% by weight relative to the weight of the ground product of the gel-like silicon compound. The aforementioned catalyst may be, for example, a catalyst that promotes the cross-linking of the microporous particles. The chemical reaction for chemically bonding the microporous particles to each other preferably utilizes the dehydration condensation reaction of the residual silanol groups contained in the silica sol molecules. By using the aforementioned catalyst to promote the reaction between the hydroxyl groups of the silanol groups, it is possible to achieve continuous film formation that hardens the void structure in a short period of time. The above-mentioned catalysts include, for example, photoactive catalysts and thermally active catalysts. By means of the photoactive catalyst, for example, the microporous particles can be chemically bonded (eg, cross-linked) to each other without heating in the step of forming the void layer. Thereby, for example, in the step of forming the void layer, shrinkage of the entire void layer is less likely to occur, so that a high porosity can be maintained. Also, in addition to the aforementioned catalyst, a substance generating a catalyst (catalyst generating agent) may also be used or simply replaced. For example, in addition to the aforementioned photoactive catalysts, substances that generate catalysts by light (photocatalyst generators) can also be used or simply replaced, and in addition to the aforementioned thermally active catalysts, substances that generate catalysts by heat can also be used (thermal catalyst generator) or simply replace it. The aforementioned photocatalyst generators are not particularly limited, and may include, for example, photobase generators (substances that produce alkaline catalysts by light irradiation), photoacid generators (substances that produce acidic catalysts by light irradiation), and the like. Generator is appropriate. The aforementioned photobase generator can be for example 9-anthrylmethyl N, N-diethylcarbamate (9-anthrylmethyl N, N-diethylcarbamate, trade name WPBG-018), (E)-1-[3 -(2-Hydroxyphenyl)-2-acryloyl]piperidine ((E)-1-[3-(2-hydroxyphenyl)-2-propenoyl]piperidine, trade name WPBG-027), 1-(anthracene Quinone-2-yl)ethyl imidazolecarboxylate (1-(anthraquinon-2-yl)ethyl imidazolecarboxylate, trade name WPBG-140), 2-nitrobenzyl-4-methylpropionyloxypiperidine -1-carboxylate (trade name WPBG-165), 1,2-diisopropyl-3-[bis(dimethylamino)methyleneguanidine]2-(3-benzoylphenyl ) propionate (trade name WPBG-266), 1,2-dicyclohexyl 4,4,5,5-tetramethyldiguanidinium n-butyltriphenyl borate (trade name WPBG-300), and 2 -(9-oxodibenzopyran-2-yl)propanoic acid 1,5,7-triazabicyclo[4.4.0]dec-5-ene (Tokyo Chemical Industry Co., Ltd.) , a compound containing 4-piperidinemethanol (trade name HDPD-PB100: manufactured by Heraeus), etc. In addition, the aforementioned trade names containing "WPBG" are all trade names of Wako Pure Chemical Industries, Ltd. The aforementioned photoacid generators can be exemplified as aromatic percited salts (trade name SP-170: ADEKA Company), triaryl percited salts (trade name CPI101A: San-Apro Ltd.), aromatic iodonium salts (trade name Irgacure250: Ciba Japan company), etc. In addition, the catalyst for chemically bonding the aforementioned microporous particles is not limited to the aforementioned photoactive catalyst and the aforementioned photocatalyst generating agent, for example, it may also be a thermally active catalyst or a thermal catalyst generating agent. The catalysts for chemically bonding the aforementioned microporous particles include alkaline catalysts such as potassium hydroxide, sodium hydroxide, and ammonium hydroxide, and acid catalysts such as hydrochloric acid, acetic acid, and oxalic acid. Among them, an alkaline catalyst is suitable. The catalyst or catalyst generating agent for chemically bonding the microporous particles to each other can be added to the sol particle liquid (such as a suspension) containing the pulverized material (microporous particles) just before coating, for example. It can be used, or it can be used as a mixture in which the aforementioned catalyst or catalyst generating agent has been mixed into a solvent. The aforementioned mixed solution may be, for example, directly adding a coating solution dissolved in the aforementioned sol particle liquid, a solution in which the aforementioned catalyst or catalyst generating agent is dissolved in a solvent, or a dispersion in which the aforementioned catalyst or catalyst generating agent is dispersed in a solvent. liquid. The aforementioned solvent is not particularly limited, and examples thereof include water, buffer solution, and the like.
[2-3.低折射率層之製造方法及導光板方式液晶顯示器用光學片材之製造方法] 以下將舉例說明本發明之低折射率層之製造方法及導光板方式液晶顯示器用光學片材之製造方法。以下主要針對前述本發明之低折射率層為藉由矽化合物所形成之聚矽氧多孔體的情況加以說明。但,本發明之低折射率層不限於聚矽氧多孔體。本發明之低折射率層為聚矽氧多孔體以外的情況時,在未特別說明之前提下可適用以下說明。[2-3. Manufacturing method of low refractive index layer and manufacturing method of optical sheet for light guide plate type liquid crystal display] The method of manufacturing low refractive index layer and the optical sheet for light guide plate type liquid crystal display of the present invention will be described below with examples The manufacturing method. The following description will mainly focus on the case where the low refractive index layer of the present invention is a porous polysiloxane body formed of a silicon compound. However, the low refractive index layer of the present invention is not limited to the porous polysiloxane. When the low-refractive-index layer of the present invention is other than the polysiloxane porous body, the following description is applicable unless otherwise specified.
本發明之低折射率層的製造方法譬如包含下列步驟:前驅物形成步驟,使用前述本發明之含凝膠粉碎物液體,來形成前述低折射率層之前驅物;及結合步驟,使前述前驅物中所含前述含凝膠粉碎物液體之前述粉碎物彼此行化學鍵結。前述前驅物譬如亦可稱作塗覆膜。The manufacturing method of the low refractive index layer of the present invention includes the following steps, for example: a step of forming a precursor, using the liquid containing pulverized gel of the present invention to form the precursor of the low refractive index layer; and a combining step of making the precursor The above-mentioned pulverized products contained in the above-mentioned gel pulverized product-containing liquid are chemically bonded to each other. The foregoing precursor may also be called a coating film, for example.
根據本發明之低折射率層的製造方法,譬如可形成能發揮與空氣層相同機能的多孔質結構。其理由推測如下,惟本發明不受此推測限制。以下舉例說明本發明之低折射率層為聚矽氧多孔體的情況。According to the manufacturing method of the low-refractive-index layer of the present invention, for example, a porous structure capable of functioning as an air layer can be formed. The reason is presumed as follows, but the present invention is not limited by this presumption. The following examples illustrate the case where the low-refractive index layer of the present invention is a polysiloxane porous body.
前述聚矽氧多孔體之製造方法中使用的前述本發明之含凝膠粉碎物液體含有前述矽化合物凝膠之粉碎物,所以前述凝膠狀二氧化矽化合物之三維結構呈現分散為三維基本結構的狀態。因此,以前述聚矽氧多孔體之製造方法,譬如若使用前述含凝膠粉碎物液體來形成前述前驅物(譬如塗覆膜),則前述三維基本結構便會堆積而形成以前述三維基本結構為主體的空隙結構。亦即,利用前述聚矽氧多孔體之製造方法,可形成一種與前述矽化合物凝膠之三維結構截然不同且由前述三維基本結構之前述粉碎物形成的新型三維結構。又,在前述聚矽氧多孔體之製造方法中會進一步使前述粉碎物彼此行化學鍵結,所以前述新型三維結構可被固定化。因此,藉由前述聚矽氧多孔體之製造方法製得的前述聚矽氧多孔體雖為具有空隙之結構,仍舊可維持充分的強度及可撓性。藉由本發明製得之低折射率層(譬如聚矽氧多孔體),譬如可作為利用空隙之構件應用在廣泛領域之製品上,如絕熱材、吸音材、光學構件、印墨影像接收層等,此外也可製作已賦有各種機能的積層薄膜。The above-mentioned gel-containing pulverized product liquid of the present invention used in the above-mentioned production method of the polysiloxane porous body contains the above-mentioned silicon compound gel pulverized product, so the three-dimensional structure of the above-mentioned gel-like silica compound is dispersed into a three-dimensional basic structure status. Therefore, in the production method of the aforementioned polysiloxane porous body, for example, if the aforementioned precursor (such as a coating film) is formed using the liquid containing the aforementioned gel pulverized product, the aforementioned three-dimensional basic structure will be piled up to form the aforementioned three-dimensional basic structure. as the main void structure. That is, by using the aforementioned method for producing a polysiloxane porous body, it is possible to form a novel three-dimensional structure that is completely different from the three-dimensional structure of the aforementioned silicon compound gel and formed from the aforementioned pulverized product of the aforementioned three-dimensional basic structure. In addition, in the production method of the aforementioned polysiloxane porous body, the aforementioned pulverized materials are further chemically bonded to each other, so the aforementioned novel three-dimensional structure can be immobilized. Therefore, although the aforementioned porous polysiloxane body produced by the method for producing the aforementioned porous polysiloxane body has a structure having voids, it can still maintain sufficient strength and flexibility. The low-refractive-index layer (such as polysiloxane porous body) obtained by the present invention can be used, for example, as a member utilizing voids in products in a wide range of fields, such as heat-insulating materials, sound-absorbing materials, optical components, printing ink image-receiving layers, etc. , In addition, it is also possible to produce laminated films that have been endowed with various functions.
本發明之低折射率層的製造方法在未特別記載之前提下,可援引前述本發明之含凝膠粉碎物液體的說明。Unless otherwise specified, the method for producing the low-refractive index layer of the present invention can refer to the above-mentioned description of the pulverized gel-containing liquid of the present invention.
在前述多孔體之前驅物的形成步驟中,譬如係將前述本發明之含凝膠粉碎物液體塗覆於前述基材上。本發明之含凝膠粉碎物液體譬如在塗覆於基材上並使前述塗覆膜乾燥後,藉由前述結合步驟使前述粉碎物彼此行化學鍵結(譬如交聯),可連續成膜具有一定程度以上之膜強度的低折射率層。In the step of forming the precursor of the porous body, for example, the gel-containing pulverized product of the present invention is liquid-coated on the substrate. For example, after the gel-containing pulverized product liquid of the present invention is coated on a substrate and the aforementioned coating film is dried, the aforementioned pulverized products are chemically bonded (such as cross-linked) through the aforementioned combining step, and can be continuously formed into a film with A low-refractive index layer with film strength above a certain level.
前述含凝膠粉碎物液體於前述基材上之塗覆量並無特別限制,譬如可因應期望之前述本發明之低折射率層的厚度等適宜設定。就具體例而言,在形成厚度0.1~1000μm之前述聚矽氧多孔體時,前述含凝膠粉碎物液體於前述基材上之塗覆量在前述基材之每1m2 面積,譬如有前述粉碎物0.01~60000μg、0.1~6000μg、1~50μg。前述含凝膠粉碎物液體的理想塗覆量譬如與液體濃度或塗覆方式等有關,因此很難做單義定義,若考慮到生產性,宜盡量塗成薄層。塗佈量若太多,譬如溶劑在揮發前即在乾燥爐中乾燥的可能性會變高。藉此,奈米粉碎溶膠粒子在溶劑中沉降、堆積形成空隙結構之前,可能因溶劑乾燥而阻礙空隙形成,使空隙率大幅降低。另一方面,塗佈量一旦過薄,因基材之凹凸、親疏水性之參差等,產生塗覆收縮(cissing)的風險可能變高。The coating amount of the liquid containing the pulverized gel on the substrate is not particularly limited, and can be appropriately set according to the desired thickness of the low-refractive index layer of the present invention, for example. As a specific example, when forming the aforementioned polysiloxane porous body with a thickness of 0.1 to 1000 μm, the coating amount of the liquid containing the pulverized gel on the aforementioned base material is per 1 m of the aforementioned base material area, for example, the aforementioned Crushed matter 0.01~60000μg, 0.1~6000μg, 1~50μg. The ideal coating amount of the above-mentioned liquid containing pulverized gel is related to, for example, the concentration of the liquid or the method of coating, so it is difficult to make a univocal definition. In consideration of productivity, it is better to apply as thin a layer as possible. If the coating amount is too large, for example, the possibility of drying in a drying oven before the solvent evaporates becomes high. In this way, before the nano-pulverized sol particles settle and accumulate in the solvent to form a void structure, the solvent may dry to hinder the formation of voids and greatly reduce the void ratio. On the other hand, once the coating amount is too thin, the risk of coating shrinkage (cissing) may increase due to unevenness of the substrate, unevenness of hydrophilicity and hydrophobicity, etc.
於前述基材上塗覆前述含凝膠粉碎物液體後,亦可對前述多孔體之前驅物(塗覆膜)施行乾燥處理。藉由前述乾燥處理,目的不僅在於去除前述多孔體之前驅物中的前述溶劑(前述含凝膠粉碎物液體中所含溶劑),還有在乾燥處理中使溶膠粒子沉降、堆積而形成空隙結構。前述乾燥處理之溫度例如為50~250℃、60~150℃、70~130℃,前述乾燥處理之時間則例如為0.1~30分鐘、0.2~10分鐘、0.3~3分鐘。關於乾燥處理溫度及時間,例如在顯現連續生產性或高空隙率的相關性來看,以低溫且短時間較佳。條件若過度嚴苛,例如在基材為樹脂薄膜的情況下,接近前述基材之玻璃轉移溫度時,前述基材會在乾燥爐中伸展而可能於剛塗覆後就在已形成的空隙結構產生裂痕等缺點。另一方面,條件若太過寬鬆,例如因為在離開乾燥爐的時間點含有殘留溶劑,所以在下一步驟中與輥件摩擦時可能發生混入刮傷等外觀上的不良情況。After coating the liquid containing the pulverized gel on the substrate, drying may be performed on the precursor (coating film) of the porous body. The purpose of the drying process is not only to remove the solvent in the precursor of the porous body (solvent contained in the liquid containing the ground gel), but also to settle and accumulate the sol particles to form a void structure during the drying process. . The temperature of the aforementioned drying treatment is, for example, 50~250°C, 60~150°C, 70~130°C, and the time of the aforementioned drying treatment is, for example, 0.1~30 minutes, 0.2~10 minutes, 0.3~3 minutes. Regarding the drying treatment temperature and time, for example, low temperature and short time are preferable in terms of continuous productivity and high porosity. If the conditions are too severe, for example, when the substrate is a resin film, when it is close to the glass transition temperature of the substrate, the substrate will be stretched in the drying oven and the void structure may be formed immediately after coating. Defects such as cracks. On the other hand, if the conditions are too loose, for example, because the residual solvent is contained at the time of leaving the drying oven, it may cause appearance defects such as scratches when rubbing against the roller in the next step.
前述乾燥處理例如可為自然乾燥,可為加熱乾燥,亦可為減壓乾燥。前述乾燥方法無特別限制,例如可使用一般的加熱機構。前述加熱機構可舉如熱風器、加熱輥、遠紅外線加熱器等。其中,在工業上連續生產的前提下,宜使用加熱乾燥。又,關於可使用的溶劑,當目的為抑制乾燥時隨溶劑揮發而產生的收縮應力以及隨之而來的低折射率層(前述聚矽氧多孔體)之裂痕現象時,以表面張力低的溶劑為佳。前述溶劑可舉如以異丙醇(IPA)為代表之低級醇、己烷、全氟己烷等,惟不限於該等。The aforementioned drying treatment may be, for example, natural drying, heat drying, or reduced-pressure drying. The aforementioned drying method is not particularly limited, for example, a general heating mechanism can be used. The aforementioned heating mechanism can be, for example, a hot air heater, a heating roller, a far-infrared heater, and the like. Among them, under the premise of continuous industrial production, heating and drying should be used. Also, regarding the solvents that can be used, when the purpose is to suppress the shrinkage stress that occurs with the volatilization of the solvent during drying and the subsequent cracking of the low-refractive index layer (the aforementioned polysiloxane porous body), the solvent with low surface tension should be used. Solvents are preferred. The above-mentioned solvents can be, for example, lower alcohols represented by isopropanol (IPA), hexane, perfluorohexane, etc., but are not limited thereto.
前述基材無特別限制,譬如適宜使用:熱可塑性樹脂製基材、玻璃製基材、以矽為代表的無機基板、以熱硬化性樹脂等成形的塑膠、半導體等元件、以奈米碳管為代表的碳纖維系材料等,惟不限於該等。前述基材之形態可舉如薄膜、薄板等。前述熱可塑性樹脂可舉如聚對苯二甲酸乙二酯(PET)、丙烯酸、乙酸丙酸纖維素(CAP)、環烯烴聚合物(COP)、三乙酸酯(TAC)、聚萘二甲酸乙二酯(PEN)、聚乙烯(PE)、聚丙烯(PP)等。The above-mentioned substrates are not particularly limited, for example, it is suitable to use: thermoplastic resin substrates, glass substrates, inorganic substrates represented by silicon, plastics formed by thermosetting resins, semiconductors and other components, carbon nanotubes Representative carbon fiber-based materials, etc., but not limited to these. The form of the above-mentioned substrate can be, for example, a film, a thin plate, and the like. The aforementioned thermoplastic resins can be exemplified such as polyethylene terephthalate (PET), acrylic acid, cellulose acetate propionate (CAP), cycloolefin polymer (COP), triacetate (TAC), polyethylene naphthalate Ethylene glycol (PEN), polyethylene (PE), polypropylene (PP), etc.
在本發明之低折射率層的製造方法中,前述結合步驟係使前述多孔體之前驅物(塗覆膜)中所含前述粉碎物彼此行化學鍵結的步驟。藉由前述結合步驟,譬如可使前述多孔體之前驅物的前述粉碎物之三維結構被固定化。利用習知之燒結進行固定化時,例如係以施行200℃以上之高溫處理來激發矽烷醇基之脫水縮合,形成矽氧烷鍵結。在本發明之前述結合步驟中,藉由使催化上述脫水縮合反應之各種添加劑進行反應,譬如當基材為樹脂薄膜時,得以不損及前述基材,並可在100℃前後之較低的乾燥溫度及僅數分鐘的短暫處理時間下,連續形成空隙結構並進行固定化。In the manufacturing method of the low-refractive-index layer of the present invention, the bonding step is a step of chemically bonding the pulverized matter contained in the precursor (coating film) of the porous body to each other. By the bonding step, for example, the three-dimensional structure of the pulverized product of the precursor of the porous body can be immobilized. When using conventional sintering for immobilization, for example, high temperature treatment above 200°C is used to stimulate the dehydration condensation of silanol groups to form siloxane bonds. In the aforementioned bonding step of the present invention, by reacting various additives that catalyze the above-mentioned dehydration condensation reaction, for example, when the base material is a resin film, the aforementioned base material can not be damaged, and it can be used at a lower temperature around 100°C. At drying temperature and short processing time of only a few minutes, the void structure is continuously formed and immobilized.
前述行化學鍵結之方法並無特別限制,譬如可因應前述凝膠(譬如矽化合物凝膠)之種類適宜決定。就具體例來說,前述化學鍵結例如可藉由前述粉碎物彼此之化學交聯鍵結來進行,其他亦可考慮像是將氧化鈦等無機粒子等添加於前述粉碎物,使前述無機粒子與前述粉碎物行化學交聯鍵結。另外,也有載持酵素等生物觸媒之情況,或是使有別於觸媒活性點之其他部位與前述粉碎物進行化學交聯鍵結。因此,本發明不僅只譬如以前述溶膠粒子彼此形成之低折射率層,也可擴展應用於有機無機混成低折射率層、主客(host-guest)低折射率層等,惟不限於該等。The aforementioned method of chemical bonding is not particularly limited, for example, it can be appropriately determined according to the type of the aforementioned gel (such as silicon compound gel). As a specific example, the aforementioned chemical bonding can be performed, for example, by chemical cross-linking between the aforementioned pulverized objects. Other considerations include adding inorganic particles such as titanium oxide to the aforementioned pulverized objects so that the aforementioned inorganic particles and The aforementioned pulverized products are chemically cross-linked. In addition, there are also cases where biocatalysts such as enzymes are supported, or other parts other than the active sites of the catalyst are chemically cross-linked with the above-mentioned pulverized material. Therefore, the present invention is not limited to the low-refractive-index layer formed by the above-mentioned sol particles, but also can be extended to organic-inorganic hybrid low-refractive-index layer, host-guest low-refractive-index layer, etc., but not limited thereto.
前述結合步驟譬如可因應前述凝膠(譬如矽化合物凝膠)之粉碎物的種類,藉由觸媒存在下之化學反應進行。本發明之化學反應宜利用前述矽化合物凝膠之粉碎物中所含殘留矽烷醇基的脫水縮合反應。藉前述觸媒促進矽烷醇基之羥基彼此的反應,可做到在短時間內使空隙結構硬化的連續成膜。前述觸媒可舉如氫氧化鉀、氫氧化鈉、氫氧化銨等鹼性觸媒及鹽酸、乙酸、草酸等酸觸媒等,惟不限於該等。前述脫水縮合反應之觸媒以鹼性觸媒尤佳。又,亦適合使用利用照射光(譬如紫外線)來顯現觸媒活性之光酸產生觸媒或光鹼產生觸媒等。光酸產生觸媒及光鹼產生觸媒無特別限定,譬如同前述。前述觸媒如同前述,宜於正要進行塗覆前才添加於含有前述粉碎物之溶膠粒子液中作使用,或宜作成已使前述觸媒混合於溶劑中之混合液來使用。前述混合液例如可為:直接添加溶解於前述溶膠粒子液的塗覆液、使前述觸媒溶解於溶劑的溶液、或使前述觸媒分散於溶劑的分散液。前述溶劑無特別限制,如前述,可列舉如水、緩衝液等。For example, the above-mentioned combining step can be performed by a chemical reaction in the presence of a catalyst according to the type of the pulverized product of the above-mentioned gel (such as silicon compound gel). The chemical reaction of the present invention preferably utilizes the dehydration condensation reaction of the residual silanol groups contained in the pulverized silicon compound gel. By using the aforementioned catalyst to promote the reaction between the hydroxyl groups of the silanol groups, it is possible to achieve continuous film formation that hardens the void structure in a short period of time. The aforementioned catalysts may include alkaline catalysts such as potassium hydroxide, sodium hydroxide, and ammonium hydroxide, and acid catalysts such as hydrochloric acid, acetic acid, and oxalic acid, but are not limited thereto. The catalyst for the aforementioned dehydration condensation reaction is particularly preferably an alkaline catalyst. In addition, a photoacid generating catalyst, a photobase generating catalyst, or the like that exhibits catalytic activity by irradiation with light (for example, ultraviolet rays) is also suitably used. The photoacid generation catalyst and the photobase generation catalyst are not particularly limited, and are as described above, for example. As mentioned above, the above-mentioned catalyst is preferably added to the sol particle liquid containing the above-mentioned pulverized material just before coating, or it is preferably used as a mixed liquid in which the above-mentioned catalyst is mixed in a solvent. The mixed liquid may be, for example, a coating liquid in which the sol particle liquid is directly added, a solution in which the catalyst is dissolved in a solvent, or a dispersion liquid in which the catalyst is dispersed in a solvent. The aforementioned solvent is not particularly limited, and as mentioned above, examples thereof include water, buffer solution, and the like.
又,譬如亦可於本發明之含凝膠液體中進一步添加用以使前述凝膠之粉碎物彼此間接結合的交聯輔助劑。該交聯輔助劑會介入粒子(前述粉碎物)彼此之間,使粒子與交聯輔助劑各自相互作用或結合,讓距離上略為分開的粒子彼此也得以鍵結,進而可有效率地提高強度。前述交聯輔助劑以多交聯矽烷單體為佳。前述多交聯矽烷單體具體上具有例如2以上且3以下之烷氧矽基,且烷氧矽基間之鏈長可為碳數1以上且10以下,並可含有碳以外之元素。前述交聯輔助劑可舉如:雙(三甲氧矽基)乙烷、雙(三乙氧矽基)乙烷、雙(三甲氧矽基)甲烷、雙(三乙氧矽基)甲烷、雙(三乙氧矽基)丙烷、雙(三甲氧矽基)丙烷、雙(三乙氧矽基)丁烷、雙(三甲氧矽基)丁烷、雙(三乙氧矽基)戊烷、雙(三甲氧矽基)戊烷、雙(三乙氧矽基)己烷、雙(三甲氧矽基)己烷、雙(三甲氧矽基)-N-丁基-N-丙基-乙烷-1,2-二胺、參-(3-三甲氧矽基丙基)三聚異氰酸酯、參-(3-三乙氧矽基丙基)三聚異氰酸酯等。該交聯輔助劑之添加量並無特別限定,譬如相對於前述矽化合物之粉碎物重量為0.01~20重量%、0.05~15重量%或0.1~10重量%。Also, for example, a crosslinking auxiliary agent for indirect bonding of the above-mentioned pulverized gels may be further added to the gel-containing liquid of the present invention. The cross-linking auxiliary agent will intervene between the particles (the above-mentioned pulverized products), so that the particles and the cross-linking auxiliary agent can interact or combine each other, so that the particles that are slightly separated by distance can also be bonded to each other, thereby effectively increasing the strength. . The aforementioned crosslinking auxiliary agent is preferably a multi-crosslinking silane monomer. The aforementioned multi-crosslinked silane monomer specifically has, for example, 2 or more and 3 or less alkoxysilyl groups, and the chain length between the alkoxysilyl groups may be 1 or more and 10 or less, and may contain elements other than carbon. The aforementioned cross-linking auxiliary agent can be exemplified for example: bis(trimethoxysilyl)ethane, bis(triethoxysilyl)ethane, bis(trimethoxysilyl)methane, bis(triethoxysilyl)methane, bis(trimethoxysilyl)methane, bis(trimethoxysilyl)methane, (triethoxysilyl)propane, bis(trimethoxysilyl)propane, bis(triethoxysilyl)butane, bis(trimethoxysilyl)butane, bis(triethoxysilyl)pentane, Bis(trimethoxysilyl)pentane, bis(trimethoxysilyl)hexane, bis(trimethoxysilyl)hexane, bis(trimethoxysilyl)-N-butyl-N-propyl-ethyl Alkane-1,2-diamine, ginseng-(3-trimethoxysilylpropyl) isocyanate, ginseng-(3-triethoxysilylpropyl) isocyanate, etc. The addition amount of the crosslinking auxiliary agent is not particularly limited, for example, it is 0.01-20% by weight, 0.05-15% by weight or 0.1-10% by weight relative to the weight of the pulverized silicon compound.
前述觸媒存在下之化學反應譬如可藉由下列方式進行:對含有事先添加至前述含凝膠粉碎物液體中之前述觸媒或觸媒產生劑的前述塗覆膜進行光照射或加熱;或是對前述塗覆膜噴附前述觸媒後進行光照射或加熱;又或是噴附前述觸媒或觸媒產生劑後進行光照射或加熱。譬如當前述觸媒為光活性觸媒時,可藉由光照射使前述微細孔粒子彼此行化學鍵結,而形成前述聚矽氧多孔體。又,當前述觸媒為熱活性觸媒,可藉由加熱使前述微細孔粒子彼此行化學鍵結,而形成前述聚矽氧多孔體。前述光照射之光照射量(能量)並無特別限定,在@360nm換算下譬如為200~800mJ/cm2 、250~600mJ/cm2 或300~400mJ/cm2 。若從為了防止因照射量不足使利用觸媒產生劑之光吸收的分解無法進展而效果不彰的觀點來看,以200mJ/cm2 以上之累積光量為佳。又,基於防止低折射率層下之基材受損傷產生熱皺痕的觀點,以800mJ/cm2 以下之累積光量為宜。前述光照射的光波長並無特別限定,譬如為200~500nm、300~450nm。前述光照射的光照射時間並無特別限定,譬如為0.1~30分鐘、0.2~10分鐘、0.3~3分鐘。前述加熱處理之條件無特別限制,前述加熱溫度例如為50~250℃、60~150℃、70~130℃,前述加熱時間則例如為0.1~30分鐘、0.2~10分鐘、0.3~3分鐘。此外,關於可使用的溶劑,例如當目的為抑制乾燥時隨溶劑揮發而產生的收縮應力及隨之而來的低折射率層之裂痕現象時,以低表面張力的溶劑為佳。可舉如以異丙醇(IPA)為代表的低級醇、己烷、全氟己烷等,惟不限於該等。The chemical reaction in the presence of the aforementioned catalyst can be carried out, for example, by irradiating or heating the aforementioned coating film containing the aforementioned catalyst or catalyst generator previously added to the aforementioned liquid containing the pulverized gel; or The method is to irradiate or heat the coating film after spraying the catalyst; or to irradiate or heat the coating film after spraying the catalyst or catalyst generating agent. For example, when the aforementioned catalyst is a photoactive catalyst, the aforementioned microporous particles can be chemically bonded to each other by light irradiation to form the aforementioned polysiloxane porous body. In addition, when the aforementioned catalyst is a thermally active catalyst, the aforementioned microporous particles can be chemically bonded to each other by heating to form the aforementioned polysiloxane porous body. The light irradiation amount (energy) of the aforementioned light irradiation is not particularly limited, and is, for example, 200-800 mJ/cm 2 , 250-600 mJ/cm 2 , or 300-400 mJ/cm 2 in conversion of @360 nm. From the viewpoint of preventing the decomposition by the light absorption of the catalyst generating agent from progressing due to insufficient irradiation dose, the accumulated light dose is preferably 200 mJ/cm 2 or more. In addition, from the viewpoint of preventing the substrate under the low-refractive index layer from being damaged and causing thermal wrinkles, the cumulative light intensity of 800 mJ/cm 2 or less is suitable. The light wavelength of the aforementioned light irradiation is not particularly limited, for example, it is 200-500 nm, 300-450 nm. The light irradiation time of the aforementioned light irradiation is not particularly limited, and is, for example, 0.1 to 30 minutes, 0.2 to 10 minutes, or 0.3 to 3 minutes. The conditions of the aforementioned heat treatment are not particularly limited. The aforementioned heating temperature is, for example, 50~250°C, 60~150°C, 70~130°C, and the aforementioned heating time is, for example, 0.1~30 minutes, 0.2~10 minutes, 0.3~3 minutes. In addition, regarding the usable solvent, for example, when the purpose is to suppress the shrinkage stress caused by solvent volatilization during drying and the subsequent crack phenomenon of the low-refractive index layer, a solvent with low surface tension is preferable. Examples include lower alcohols represented by isopropanol (IPA), hexane, perfluorohexane, etc., but are not limited thereto.
以上述方式可製造本發明之低折射率層(譬如聚矽氧多孔體)。惟,本發明之低折射率層的製造方法不限於上述。另,為聚矽氧多孔體之本發明之低折射率層以下有時會稱作「本發明之聚矽氧多孔體」。The low-refractive-index layer (for example, polysiloxane porous body) of the present invention can be produced in the above-mentioned manner. However, the manufacturing method of the low refractive index layer of the present invention is not limited to the above. In addition, the low-refractive-index layer of this invention which is a polysiloxane porous body may be referred to as "the polysiloxane porous body of this invention" hereafter.
又,如同前述,在本發明之導光板方式液晶顯示器用光學片材的製造中,亦可於本發明之低折射率層上進一步形成黏接著層(黏接著層形成步驟)。具體上,例如可於本發明之低折射率層上塗佈(塗覆)黏著劑或接著劑來形成前述黏接著層。或是,亦可將基材上積層有前述黏接著層之黏著膠帶等的前述黏接著層側貼合到本發明之低折射率層上,藉此於本發明之低折射率層上形成前述黏接著層。此時,前述黏著膠帶等之基材可維持在直接貼合之狀態,亦可自前述黏接著層剝離。尤其,如同前述,藉由從前述低折射率剝離基材做成無基材(不具基材),可大幅減低厚度,抑制器件等的厚度增加。本發明中,「黏著劑」及「黏著層」係指以被黏體之再剝離為前提的溶劑或層。在本發明中,「接著劑」及「接著層」係指不以被黏體之再剝離為前提之溶劑或層。惟,本發明中「黏著劑」及「接著劑」並非可明確區別者,「黏著層」及「接著層」亦非可明確區別者。在本發明中,形成前述黏接著層之黏著劑或接著劑無特別限定,譬如可使用一般的黏著劑或接著劑等。前述黏著劑或接著劑可舉如丙烯酸系、乙烯醇系、聚矽氧系、聚酯系、聚胺甲酸乙酯系、聚醚系等聚合物製接著劑及橡膠系接著劑等。此外,亦可列舉由戊二醛、三聚氰胺、草酸等乙烯醇系聚合物之水溶性交聯劑等構成的接著劑等。該等黏著劑及接著劑可僅使用1種亦可將複數種類併用(例如混合、積層等)。如同前述,藉由前述黏接著層可保護前述低折射率層免受物理性的損傷(尤其是擦傷)。又,前述黏接著層宜為即使作為不具基材(無基材)的導光板方式液晶顯示器用光學片材,也是耐壓性佳不致壓碎前述低折射率層之物,不過並無特別限定。又,前述黏接著層之厚度無特別限制,例如為0.1~100μm、5~50μm、10~30μm或12~25μm。Also, as described above, in the production of the optical sheet for a light guide plate type liquid crystal display of the present invention, an adhesive layer may be further formed on the low refractive index layer of the present invention (adhesive layer forming step). Specifically, for example, an adhesive or an adhesive may be coated (coated) on the low refractive index layer of the present invention to form the aforementioned adhesive layer. Alternatively, the aforementioned adhesive layer side of an adhesive tape or the like on which the aforementioned adhesive layer is laminated can also be bonded to the low refractive index layer of the present invention, thereby forming the above-mentioned adhesive layer on the low refractive index layer of the present invention. Adhesive layer. At this time, the base materials such as the above-mentioned adhesive tape may be maintained in a directly bonded state, or may be peeled off from the above-mentioned adhesive layer. In particular, as described above, by peeling off the base material from the aforementioned low refractive index to create a base material-less (no base material), the thickness can be significantly reduced, and an increase in the thickness of devices and the like can be suppressed. In the present invention, "adhesive" and "adhesive layer" refer to a solvent or a layer that presupposes re-peeling of an adherend. In the present invention, "adhesive" and "adhesive layer" refer to a solvent or a layer that does not presuppose re-peeling of the adherend. However, in the present invention, "adhesive" and "adhesive" are not clearly distinguishable, nor are "adhesive layer" and "adhesive layer" clearly distinguishable. In the present invention, the adhesive or adhesive agent for forming the aforementioned adhesive layer is not particularly limited, and for example, general adhesive agents or adhesive agents can be used. The above-mentioned adhesive or adhesive agent can be, for example, polymer adhesives such as acrylic, vinyl alcohol, polysiloxane, polyester, polyurethane, and polyether, and rubber adhesives. In addition, adhesives etc. which consist of a water-soluble crosslinking agent of vinyl alcohol polymers, such as glutaraldehyde, melamine, and oxalic acid, etc. are mentioned. These adhesives and bonding agents may be used alone or in combination (for example, mixing, lamination, etc.). As mentioned above, the aforementioned low-refractive index layer can be protected from physical damage (especially scratches) by the aforementioned adhesive layer. In addition, the above-mentioned adhesive layer is preferably an optical sheet for a light guide plate type liquid crystal display without a base material (no base material), which is good in pressure resistance and does not crush the aforementioned low-refractive index layer, but it is not particularly limited. . Moreover, the thickness of the aforementioned adhesive layer is not particularly limited, for example, it is 0.1-100 μm, 5-50 μm, 10-30 μm or 12-25 μm.
以上述方式製得之本發明之低折射率層亦可進一步將前述第1光學薄膜及前述第2光學薄膜積層,來製造本發明之導光板方式液晶顯示器用光學片材。此時,前述低折射率層、前述第1光學薄膜及前述第2光學薄膜譬如如同前述,亦可隔著前述黏接著層(黏著劑或接著劑)而積層。The low-refractive index layer of the present invention obtained in the above manner can also be further laminated with the first optical film and the second optical film to produce the optical sheet for a light guide plate type liquid crystal display of the present invention. In this case, the low refractive index layer, the first optical film, and the second optical film may be laminated via the adhesive layer (adhesive or adhesive) as described above.
基於效率,本發明之導光板方式液晶顯示器用光學片材的前述各構成要素之積層,例如可藉由使用長條薄膜的連續處理(所謂的捲對捲(Roll to Roll)等)進行積層,當基材為成形物、元件等時,亦可將經過分批處理者予以積層。Based on the efficiency, the lamination of the above-mentioned components of the optical sheet for the light guide plate type liquid crystal display of the present invention, for example, can be carried out by continuous processing (so-called roll-to-roll (Roll to Roll) etc.) using a long film, When the base material is a molded object, a component, etc., it is also possible to laminate those that have been processed in batches.
以下針對使用轉印用樹脂薄膜基材(以下有時會僅稱作「基材」)來製造本發明之低折射率層及導光板方式液晶顯示器用光學片材的方法,以圖3~5舉例說明。另,所圖示之製造方法僅為一例,不受限於該等。The method for producing the optical sheet for the low refractive index layer and light guide plate type liquid crystal display of the present invention using the resin film substrate for transfer (hereinafter sometimes referred to simply as the "substrate") will be described with reference to Figs. 3 to 5 for example. In addition, the manufacturing method shown in figure is only an example, and is not limited to these.
於圖3之截面圖示意顯示使用前述基材來製造本發明之低折射率層及導光板方式液晶顯示器用光學片材的步驟一例。圖3中,前述低折射率層之形成方法包含下列步驟:塗覆步驟(1),於基材10上塗覆前述本發明之含凝膠粉碎物液體20'';塗覆膜形成步驟(乾燥步驟)(2),使含凝膠粉碎物液體20''乾燥而形成塗覆膜20’,該塗覆膜20’為前述低折射率層之前驅層;及化學處理步驟(譬如交聯處理步驟)(3),對塗覆膜20'進行化學處理(譬如交聯處理)而形成低折射率層20。如此一來,即可如圖示使用基材10形成低折射率層20。另,前述低折射率層之形成方法可適宜包含前述步驟(1)~(3)以外之步驟,未含亦無大礙。此外,如圖示,藉由進行下列步驟,可製造含有積層體的導光板方式液晶顯示器用光學片材,且該積層體於低折射率層20之單面或兩面直接積層有黏接著層30:黏接著層塗覆步驟(4),於低折射率層20之與基材10相反側的面上塗覆黏接著層30;被覆步驟(5),以光學薄膜40被覆黏接著層30;剝離步驟(6),從低折射率層20剝離去除基材10;黏接著層塗覆步驟(7),於低折射率層20之已剝離基材10之側的面上塗覆其他的黏接著層30;及被覆步驟(8),以其他的光學薄膜40被覆前述其他的黏接著層30。兩個光學薄膜40可視為其任一者相當於前述第1光學薄膜,另一者相當於前述第2光學薄膜。又,接著(黏著)有前述第1光學薄膜與低折射率層20的黏接著層30可視為前述第1黏接著層。接著(黏著)有前述第2光學薄膜與低折射率層20的黏接著層30可視為前述第2黏接著層。另,在圖3中係顯示出將黏接著層塗覆步驟(4)及被覆步驟(5)個別進行之方法,不過,亦可將預先賦予有光學薄膜40之黏接著層30(譬如光學薄膜40及黏接著層30成為一體之黏著膠帶)貼附至低折射率層20上,藉以同時進行黏接著層塗覆步驟(4)及被覆步驟(5)。關於黏接著層塗覆步驟(7)及被覆步驟(8)亦同。另,前述導光板方式液晶顯示器用光學片材之形成方法亦可適宜包含前述步驟(1)~(8)以外的步驟,未含亦無大礙。又譬如在圖3中,亦可貼附分離件來替代光學薄膜40,保護黏接著層30。譬如,亦可將保護黏接著層30的前述分離件予以剝離後,於黏接著層30貼附前述第1光學薄膜或前述第2光學薄膜,來製造本發明之導光板方式液晶顯示器用光學片材。又譬如在圖3中,亦可不用基材10,且不在基材10上而是於第1光學薄膜或第2光學薄膜40上直接進行前述步驟(1)~(3),形成前述低折射率層。此時,換掉基材10所用的光學薄膜40與低折射率層20會變成未隔著黏接著層30而直接積層。The cross-sectional view in FIG. 3 schematically shows an example of the steps of manufacturing the optical sheet for a low-refractive index layer and a light guide plate type liquid crystal display of the present invention using the above-mentioned base material. In Fig. 3, the forming method of the aforementioned low refractive index layer comprises the following steps: coating step (1), coating the aforementioned liquid 20'' containing the pulverized gel of the present invention on the
在前述塗覆步驟(1)中,含凝膠粉碎物液體20''之塗覆方法並無特別限定,可採用一般的塗覆方法。前述塗覆方法可舉如狹縫式模塗(slot die)法、反向凹版塗佈(reverse gravure coat)法、微凹版(micro gravure)法(微凹版塗佈(micro gravure coat)法)、浸漬法(浸漬塗佈法)、旋塗法、刷塗法、輥塗法、柔版印刷法、線棒塗佈法、噴塗法、擠壓塗佈法、淋幕式塗佈法、反向塗佈法等。該等中,基於生產性、塗膜之平滑性等觀點,以擠壓塗佈法、淋幕式塗佈法、輥塗法、微凹版塗佈法等為佳。含凝膠粉碎物液體20''之塗覆量並無特別限定,譬如可以使多孔質結構(低折射率層)20成為適當厚度的方式來適宜設定。多孔質結構(低折射率層)20之厚度無特別限定,如同前述。In the aforementioned coating step (1), the coating method of the liquid 20 ″ containing the pulverized gel is not particularly limited, and a general coating method can be used. The above-mentioned coating method can be, for example, a slot die coating (slot die) method, a reverse gravure coating (reverse gravure coat) method, a micro gravure (micro gravure) method (micro gravure coating (micro gravure coat) method), Dipping (Dip Coating), Spin Coating, Brush Coating, Roll Coating, Flexo Printing, Wire Bar Coating, Spray Coating, Extrusion Coating, Curtain Coating, Reverse coating method, etc. Among them, the extrusion coating method, the curtain coating method, the roll coating method, the micro gravure coating method and the like are preferable from the viewpoint of productivity and the smoothness of the coating film. The application amount of the gel pulverized product-containing
在前述乾燥步驟(2)中,使含凝膠粉碎物液體20''乾燥(即,去除含凝膠粉碎物液體20''中所含分散媒)而形成塗覆膜(前驅層)20'。乾燥處理之條件無特別限定,如同前述。In the aforementioned drying step (2), the liquid 20 ″ containing the pulverized gel is dried (that is, the dispersion medium contained in the liquid 20 ″ containing the pulverized gel is removed) to form a coating film (precursor layer) 20 ′ . The conditions of the drying treatment are not particularly limited, as described above.
此外,在前述化學處理步驟(3)中,對含有塗覆前已添加之前述觸媒(譬如光活性觸媒、光觸媒產生劑、熱活性觸媒或熱觸媒產生劑)的塗覆膜20'進行光照射或加熱,使塗覆膜(前驅物)20'中之前述粉碎物彼此行化學鍵結(譬如使該等交聯)而形成低折射率層20。前述化學處理步驟(3)中之光照射或加熱條件無特別限定,如前述。In addition, in the aforementioned chemical treatment step (3), the
接著,於圖4示意顯示狹縫模塗法之塗覆裝置及使用其之前述低折射率層之形成方法的一例。另外,圖4為截面圖,但為了便於觀看,省略了影線。Next, an example of the coating apparatus of the slit die coating method and the formation method of the said low-refractive-index layer using it is shown schematically in FIG. In addition, although FIG. 4 is a cross-sectional view, hatching is omitted for convenience of viewing.
如圖示,使用該裝置之方法的各步驟係藉由輥件將基材10朝一方向搬送的同時一邊進行。搬送速度無特別限定,例如為1~100m/分鐘、3~50m/分鐘、5~30m/分鐘。As shown in the figure, each step of the method using the device is carried out while conveying the
首先,從送出輥101輸出基材10並同時搬運,在塗覆輥102進行於基材塗覆本發明之含凝膠粉碎物液體20''的塗覆步驟(1)後,接著在烘箱區110內過渡到乾燥步驟(2)。在圖4之塗覆裝置中,於塗覆步驟(1)後進入乾燥步驟(2)前,先進行預乾燥步驟。預乾燥步驟無須加熱,可在室溫下進行。在乾燥步驟(2)中係使用加熱機構111。加熱機構111如同前述,可適宜使用熱風器、加熱輥、遠紅外線加熱器等。又,例如可將乾燥步驟(2)分成複數個步驟,愈接近後續的乾燥步驟,乾燥溫度愈高。First, the
於乾燥步驟(2)後,在化學處理區120內進行化學處理步驟(3)。在化學處理步驟(3)中,例如當乾燥後之塗覆膜20’含有光活性觸媒時,係以配置在基材10上下的燈(光照射機構)121進行光照射。或者,例如在乾燥後之塗覆膜20’含有熱活性觸媒時,係使用熱風器(加熱機構)取代燈(光照射裝置)121,以配置在基材10上下的熱風器121將基材10加熱。藉由該交聯處理,引發塗覆膜20’中之前述粉碎物彼此的化學鍵結,使低折射率層20硬化、強化。此外,雖省略了圖示,不過圖3之前述步驟(4)~(8)可利用捲對捲(Roll to Roll)法進行,來製造前述導光板方式液晶顯示器用光學片材。然後,利用捲取輥105捲取所製得的前述導光板方式液晶顯示器用光學片材。After the drying step (2), the chemical treatment step (3) is performed in the
於圖5示意顯示微凹版法(微凹版塗佈法)之塗覆裝置及使用其之前述多孔質結構的形成方法一例。另外,同圖雖為截面圖,但為了便於觀看,省略了影線。FIG. 5 schematically shows an example of a coating apparatus of the microgravure method (microgravure coating method) and a method of forming the aforementioned porous structure using the same. In addition, although the same figure is a cross-sectional view, hatching is omitted for convenience.
如圖示,使用該裝置之方法的各步驟與圖4同樣地係藉由輥件將基材10朝一方向搬送的同時一邊進行。搬送速度無特別限定,例如為1~100m/分鐘、3~50m/分鐘、5~30m/分鐘。As shown in the figure, each step of the method using this device is carried out while conveying the
首先,從送出輥201輸出基材10的同時一邊搬送,執行塗覆步驟(1),亦即於基材10上塗覆本發明之含凝膠粉碎物液體20''。含凝膠粉碎物液體20''之塗覆如圖示,係使用儲液區202、刮刀(doctor knife)203及微凹版204進行。具體上,係使儲留在儲液區202中的含凝膠粉碎物液體20”附著於微凹版204表面,再以刮刀203控制成預定的厚度並同時以微凹版204塗覆於基材10表面。另外,微凹版204為示例,不限於此,亦可使用其它的任意塗覆機構。First, while conveying the
接著進行乾燥步驟(2)。具體上,如圖示在烘箱區210中搬送已塗覆含凝膠粉碎物液體20”之基材10,並藉由烘箱區210內之加熱機構211加熱、進行乾燥。加熱機構211例如可與圖4相同。又,例如亦可藉由將烘箱區210分成多個區塊,使乾燥步驟(2)分成多個步驟,令乾燥溫度隨著後續的乾燥步驟愈來愈高。於乾燥步驟(2)後,在化學處理區220內進行化學處理步驟(3)。在化學處理步驟(3)中,例如當乾燥後之塗覆膜20’含有光活性觸媒時,係以配置在基材10上下的燈(光照射機構)221進行光照射。或者,例如當乾燥後之塗覆膜20’含有熱活性觸媒時,會使用熱風器(加熱機構)來替代燈(光照射裝置)221,以配置在基材10下方的熱風器(加熱機構)221將基材10加熱。藉由該交聯處理,引發塗覆膜20'中之前述粉碎物彼此的化學鍵結,可形成低折射率層20。Then the drying step (2) is carried out. Specifically, as shown in the figure, the
此外,雖省略了圖示,不過圖3之前述步驟(4)~(8)可利用捲對捲(Roll to Roll)法進行,來製造前述導光板方式液晶顯示器用光學片材。然後,利用捲取輥251捲取所製得的前述導光板方式液晶顯示器用光學片材。In addition, although illustration is omitted, the aforementioned steps (4) to (8) in FIG. 3 can be performed by a roll-to-roll (Roll to Roll) method to manufacture the aforementioned optical sheet for a light guide plate type liquid crystal display. Then, the prepared optical sheet for a light guide plate type liquid crystal display is wound up by a winding
[3.空隙層] 以下舉例說明本發明之低折射率層為空隙層的情況(本發明之空隙層)。[3. Void Layer] The case where the low refractive index layer of the present invention is a void layer (void layer of the present invention) will be described below with an example.
本發明之空隙層譬如亦可以是空隙率為35體積%以上,且峰值細孔徑為50nm以下。惟,此為示例,本發明之空隙層不受此限。The void layer of the present invention may have, for example, a porosity of 35 volume % or more and a peak pore diameter of 50 nm or less. However, this is an example, and the void layer of the present invention is not limited thereto.
前述空隙率譬如可為35體積%以上、38體積%以上或40體積%以上,亦可為90體積%以下、80體積%以下或75體積%以下。前述本發明之空隙層譬如亦可以是空隙率為60體積%以上的高空隙層。The aforementioned porosity may be, for example, 35 vol % or more, 38 vol % or more, or 40 vol % or more, and may be 90 vol % or less, 80 vol % or less, or 75 vol % or less. The aforementioned void layer of the present invention may be, for example, a high void layer having a porosity of 60% by volume or more.
前述空隙率譬如可利用下述測定方法進行測定。The aforementioned porosity can be measured, for example, by the following measuring method.
(空隙率之測定方法) 成為空隙率測定對象的層若為單一層且僅含有空隙,則層之構成物質與空氣之比率(體積比)可利用常法(譬如測定重量及體積來算出密度)算出,所以藉此可算出空隙率(體積%)。又,折射率與空隙率具有相關關係,所以譬如亦可從做為層之折射率之值算出空隙率。具體上,譬如可從以橢圓偏光計測得之折射率之值,利用勞洛公式(Lorentz‐Lorenz's formula)算出空隙率。(Measurement method of porosity) If the layer to be measured for porosity is a single layer containing only voids, the ratio (volume ratio) of the constituent substances of the layer to air can be calculated by a normal method (such as measuring weight and volume to calculate density) Calculated, so the porosity (volume %) can be calculated by this. In addition, since the refractive index and the porosity have a correlation, for example, the porosity can be calculated from the value of the refractive index as a layer. Specifically, for example, the porosity can be calculated using Lorentz-Lorenz's formula from the value of the refractive index measured by an ellipsometer.
本發明之空隙層譬如同前述,可藉由凝膠粉碎物(微細孔粒子)之化學鍵結而製得。此時,空隙層之空隙方便上可分成下述(1)~(3)之3種類型。 (1)原料凝膠本身(粒子內)具有的空隙 (2)凝膠粉碎物單元具有的空隙 (3)藉由凝膠粉碎物堆積而產生之粉碎物間之空隙The interstitial layer of the present invention can be produced by chemical bonding of ground gelatin (microporous particles) as described above, for example. At this time, the voids in the void layer can be conveniently classified into the following three types (1) to (3). (1) Voids in the raw material gel itself (inside the particles) (2) Voids in the unit of the ground gel (3) Spaces between the grounds caused by the accumulation of ground gels
前述(2)之空隙係在不論凝膠粉碎物(微細孔粒子)之尺寸、大小等,將藉由粉碎前述凝膠所生成之各粒子群視為一個團塊(塊體)時,可能形成於各塊體內部且有別於前述(1)之在粉碎時形成的空隙。另,前述(3)之空隙係在粉碎(譬如無介質粉碎等)時,凝膠粉碎物(微細孔粒子)之尺寸、大小等變得參差不齊所產生的空隙。本發明之空隙層譬如因為具有前述(1)~(3)之空隙,而具有適當的空隙率及峰值細孔徑。The voids in the aforementioned (2) may be formed when the particle groups generated by pulverizing the aforementioned gel are regarded as one mass (lump) regardless of the size and size of the gel pulverized matter (micropore particles). The void formed during crushing is inside each block and is different from the aforementioned (1). In addition, the voids in the above (3) are voids generated when the size, size, etc. of the gel pulverized matter (micropore particles) become uneven during pulverization (such as medialess pulverization, etc.). The void layer of the present invention, for example, has appropriate porosity and peak pore diameter due to the aforementioned voids (1) to (3).
又,前述峰值細孔徑譬如可為5nm以上、10nm以上或20nm以上,亦可為50nm以下、40nm以下或30nm以下。在空隙層,如果在空隙率高的狀態下峰值細孔徑又太大,光會散射而變得不透明。又,在本發明中,空隙層之峰值細孔徑的下限值並無特別限定,但峰值細孔徑若太小,便很難提高空隙率,因此峰值細孔徑不宜過小。在本發明中,峰值細孔徑譬如可利用下述方法進行測定。In addition, the aforementioned peak pore diameter may be, for example, 5 nm or more, 10 nm or more, or 20 nm or more, or may be 50 nm or less, 40 nm or less, or 30 nm or less. In the void layer, if the peak pore diameter is too large in the state of high porosity, light will be scattered and become opaque. Also, in the present invention, the lower limit of the peak pore diameter of the void layer is not particularly limited, but if the peak pore diameter is too small, it will be difficult to increase the porosity, so the peak pore diameter should not be too small. In the present invention, the peak pore diameter can be measured, for example, by the following method.
(峰值細孔徑之測定方法) 使用細孔分布/比表面積測定裝置(BELLSORP MINI/Micromeritics Japan公司之商品名),利用氮吸附取得BJH製圖、BET製圖及等溫吸附線並由從中求得之結果算出峰值細孔徑。(Measurement method of peak pore diameter) Using a pore distribution/specific surface area measuring device (BELLSORP MINI/Trade name of Micromeritics Japan Co., Ltd.), BJH diagram, BET diagram and isotherm adsorption line were obtained by nitrogen adsorption and the results obtained therefrom Calculate the peak pore diameter.
又,本發明之空隙層的厚度並無特別限定,譬如可為100nm以上、200nm以上或300nm以上,亦可為10000nm以下、5000nm以下或2000nm以下。Also, the thickness of the void layer in the present invention is not particularly limited, and may be, for example, 100 nm or more, 200 nm or more, or 300 nm or more, or may be 10000 nm or less, 5000 nm or less, or 2000 nm or less.
又,本發明之空隙層譬如利用顯示膜強度之BEMCOT(註冊商標)所得的耐擦傷性為60~100%,利用顯示可撓性之MIT試驗所得的耐折次數為100次以上,惟不限於此。In addition, the void layer of the present invention, for example, has a scratch resistance of 60 to 100% obtained by using BEMCOT (registered trademark) that shows film strength, and a fold resistance of more than 100 times by using MIT test that shows flexibility, but is not limited to this.
本發明之空隙層使用了前述多孔體凝膠的粉碎物,所以前述多孔體凝膠之三維結構被破壞,而形成了與前述多孔體凝膠迥異的新型三維結構。如此一來,本發明之空隙層藉由成為形成有以由前述多孔體凝膠形成之層所無法取得的新型孔結構(新型空隙結構)之層,而可形成空隙率高之奈米等級的空隙層。又,本發明之空隙層譬如當前述空隙層惟聚矽氧多孔體時,譬如可一邊調節矽化合物凝膠之矽氧烷鍵官能基數的同時,一邊使前述粉碎物彼此行化學鍵結。此外,在形成有新型的三維結構作為前述空隙層之前驅物後,還會在結合步驟進行化學鍵結(譬如交聯),所以本發明之空隙層譬如當前述空隙層為機能性多孔體時,雖是具有空隙的結構,仍可維持充分的強度及可撓性。因此,根據本發明,可輕鬆且簡便地對各種對象物賦予空隙層。The void layer of the present invention uses the pulverized product of the porous gel, so that the three-dimensional structure of the porous gel is destroyed, and a new three-dimensional structure different from the porous gel is formed. In this way, the void layer of the present invention can form a nanoscale layer with a high porosity by forming a layer having a new type of pore structure (new type of void structure) that cannot be obtained by the layer formed of the aforementioned porous gel. void layer. In addition, in the void layer of the present invention, for example, when the void layer is only a polysiloxane porous body, the pulverized materials can be chemically bonded to each other while adjusting the number of siloxane bond functional groups in the silicon compound gel, for example. In addition, after forming a new three-dimensional structure as the precursor of the aforementioned void layer, chemical bonding (such as cross-linking) will also be carried out in the bonding step, so the void layer of the present invention, for example, when the aforementioned void layer is a functional porous body, Although it is a structure with voids, it can still maintain sufficient strength and flexibility. Therefore, according to the present invention, it is possible to easily and simply provide a void layer to various objects.
本發明之空隙層譬如同前述含有多孔體凝膠之粉碎物,且前述粉碎物彼此呈化學鍵結狀態。在本發明之空隙層中,前述粉碎物彼此的化學鍵結(化學鍵)形態並無特別限制,前述化學鍵之具體例可舉如交聯鍵結等。又,使前述粉碎物彼此行化學鍵結之方法,就如同在前述空隙層之製造方法中所詳述。The void layer of the present invention is, for example, the aforementioned pulverized product containing porous gel, and the aforementioned pulverized products are in a state of chemical bonding with each other. In the interstitial layer of the present invention, there is no particular limitation on the form of chemical bonding (chemical bond) between the above-mentioned pulverized objects, and specific examples of the above-mentioned chemical bonding include cross-linking bonds and the like. In addition, the method of chemically bonding the above-mentioned pulverized materials is as described in detail in the above-mentioned manufacturing method of the void layer.
前述交聯鍵結譬如為矽氧烷鍵。矽氧烷鍵可舉如以下所示T2鍵、T3鍵、T4鍵。本發明之聚矽氧多孔體具有矽氧烷鍵時,例如可具有其中任一種鍵,可具有其中任二種鍵,也可具有三種全部的鍵。前述矽氧烷鍵中,T2及T3之比率愈多,愈富可撓性,也就愈可期待凝膠本來的特性,但膜強度會變弱。另一方面,前述矽氧烷鍵中T4比率一多,雖易於顯現膜強度,但空隙尺寸會變小,可撓性變弱。因此,例如宜因應用途來調整T2、T3、T4比率。The aforementioned crosslinks are, for example, siloxane bonds. Examples of the siloxane bond include T2 bond, T3 bond, and T4 bond shown below. When the polysiloxane porous body of the present invention has siloxane bonds, it may have, for example, any one of them, any two of them, or all three of them. Among the aforementioned siloxane bonds, the more the ratio of T2 and T3 is, the more flexible it is, and the more you can expect the original characteristics of the gel, but the film strength will be weaker. On the other hand, if the ratio of T4 in the above-mentioned siloxane bonds is too high, although it is easy to show the film strength, the void size will be smaller and the flexibility will be weaker. Therefore, for example, the ratios of T2, T3, and T4 should be adjusted according to the application.
[化學式5] [chemical formula 5]
本發明之空隙層具有前述矽氧烷鍵時,T2、T3及T4的比例譬如在相對以「1」表示T2時,T2:T3:T4=1:[1~100]:[0~50]、1:[1~80]:[1~40]、1:[5~60]:[1~30]。When the gap layer of the present invention has the aforementioned siloxane bonds, the ratio of T2, T3 and T4 is, for example, when T2 is represented by "1", T2:T3:T4=1:[1~100]:[0~50] , 1: [1~80]: [1~40], 1: [5~60]: [1~30].
此外,本發明之空隙層以例如所含矽原子呈矽氧烷鍵結為佳。就具體例而言,前述聚矽氧多孔體中所含總矽原子中,未鍵結之矽原子(亦即殘留矽烷醇)的比率例如為小於50%、30%以下、15%以下。In addition, the interstitial layer of the present invention preferably contains silicon atoms that are bonded by siloxane, for example. As a specific example, the ratio of unbonded silicon atoms (that is, residual silanol) among the total silicon atoms contained in the polysiloxane porous body is, for example, less than 50%, less than 30%, and less than 15%.
本發明之空隙層具有孔結構,孔的空隙尺寸係指空隙(孔)之長軸直徑及短軸直徑中之前述長軸直徑。空孔尺寸譬如為5nm~50nm。前述空隙尺寸中,其下限譬如為5nm以上、10nm以上、20nm以上,其上限譬如為50nm以下、40nm以下、30nm以下,且其範圍譬如為5nm~50nm、10nm~40nm。空隙尺寸係因應使用空隙結構之用途來決定適當的空隙尺寸,例如必須因應目的調整成期望的空隙尺寸。空隙尺寸例如可以下述方法作評估。The void layer of the present invention has a pore structure, and the pore size refers to the aforementioned major-axis diameter among the major-axis diameter and the minor-axis diameter of the void (pore). The pore size is, for example, 5 nm to 50 nm. Among the aforementioned void sizes, the lower limit is, for example, 5 nm or more, 10 nm or more, and 20 nm or more, and the upper limit is, for example, 50 nm or less, 40 nm or less, and 30 nm or less, and the range thereof is, for example, 5 nm to 50 nm or 10 nm to 40 nm. The void size is determined according to the application of the void structure, for example, it must be adjusted to a desired void size according to the purpose. The void size can be evaluated, for example, by the following method.
(空隙層之截面SEM觀察) 在本發明中,空隙層之形態可用SEM(掃描型電子顯微鏡)來進行觀察及解析。具體上,譬如可將前述空隙層在冷卻下進行FIB加工(加速電壓:30kV),並針對所得截面試樣利用FIB-SEM(FEI公司製:商品名Helios NanoLab600、加速電壓:1kV),以觀察倍率100,000倍取得截面電子像。(Cross-section SEM observation of void layer) In the present invention, the form of the void layer can be observed and analyzed by SEM (scanning electron microscope). Specifically, for example, the aforementioned void layer can be subjected to FIB processing (accelerating voltage: 30kV) under cooling, and FIB-SEM (manufactured by FEI Corporation: trade name Helios NanoLab600, accelerating voltage: 1kV) can be used for the obtained cross-sectional sample to observe A cross-sectional electronic image was obtained at a magnification of 100,000 times.
(評估空隙尺寸) 在本發明中,前述空隙尺寸可藉由BET試驗法予以定量。具體上,係於細孔分布/比表面積測定裝置(BELLSORP MINI/Micromeritics Japan公司之商品名)之毛細管投入0.1g之試樣(本發明之空隙層)後,在室溫下進行24小時的減壓乾燥,將空隙結構內之氣體脫氣。然後,使氮氣吸附於前述試樣上,繪出BET製圖及BJH製圖、吸附等溫線以求算細孔分布。藉此可評估空隙尺寸。(Evaluation of void size) In the present invention, the aforementioned void size can be quantified by BET test method. Specifically, after putting 0.1 g of the sample (the void layer of the present invention) into the capillary of a pore distribution/specific surface area measuring device (BELLSORP MINI/Micromeritics Japan company's trade name), the reduction was carried out at room temperature for 24 hours. Press dry to degas the gas in the void structure. Then, nitrogen gas is adsorbed on the above-mentioned sample, and the BET diagram and BJH diagram are drawn, and the adsorption isotherm is calculated to calculate the pore distribution. From this the void size can be assessed.
本發明之空隙層譬如利用顯示膜強度之BEMCOT(註冊商標)所得的耐擦傷性為60~100%。本發明例如因為具有這種強度,所以在各種製程中皆具有卓越的耐擦傷性。本發明在例如製出前述空隙層後的捲取及處置製品薄膜時的生產製程中具有耐致傷性。另一方面,本發明之空隙層譬如用以替代減少空隙率,還可利用後述加熱步驟中之觸媒反應,提升前述矽化合物凝膠之粉碎物的粒子尺寸、及前述粉碎物彼此結合後之頸部的結合力。藉此,本發明之空隙層就可對例如本來脆弱的空隙結構賦予一定程度的強度。The void layer of the present invention has a scratch resistance of 60 to 100%, for example, obtained by using BEMCOT (registered trademark) which shows film strength. The present invention, for example, has excellent scratch resistance in various processes because of its strength. The present invention has resistance to injury in the production process such as winding up and handling the product film after the aforementioned void layer is produced. On the other hand, the void layer of the present invention, for example, is used instead of reducing the porosity, and can also use the catalytic reaction in the heating step described later to increase the particle size of the pulverized silicon compound gel and the combination of the pulverized products. The binding force of the neck. Thereby, the void layer of the present invention can impart a certain degree of strength to, for example, an inherently weak void structure.
前述耐擦傷性其下限例如為60%以上、80%以上、90%以上,其上限例如為100%以下、99%以下、98%以下,其範圍例如為60~100%、80~99%、90~98%。The lower limit of the aforementioned scratch resistance is, for example, 60% or more, 80% or more, and 90% or more, and the upper limit is, for example, 100% or less, 99% or less, and 98% or less. The range is, for example, 60-100%, 80-99%, 90~98%.
前述耐擦傷性譬如可藉由以下方法測定。The aforementioned scratch resistance can be measured, for example, by the following method.
(耐擦傷性評估) (1)將塗覆、成膜於丙烯酸薄膜上的空隙層(本發明之空隙層)採樣出直徑15mm左右的圓狀物。 (2)接著針對前述試樣以螢光X射線(島津製作所公司製:ZSX PrimusII)鑑定矽,以測定Si塗佈量(Si0 )。然後就前述丙烯酸薄膜上的前述空隙層,從前述進行採樣的周遭將前述空隙層裁切成50mm×100mm並將其固定於玻璃板(厚3mm)後,以BEMCOT(註冊商標)進行滑動試驗。滑動條件係設為砝碼100g進行10往復。 (3)從結束滑動的前述空隙層以與前述(1)同樣的方式進行採樣及螢光X測定,測定擦傷試驗後的Si殘存量(Si1 )。耐擦傷性係以BEMCOT(註冊商標)試驗前後的Si殘存率(%)為定義,可以下述式表示。 耐擦傷性(%)=[殘存Si量(Si1 )/Si塗佈量(Si0 )]×100(%)(Evaluation of Scratch Resistance) (1) Sampling a circular object with a diameter of about 15 mm from the void layer coated and formed on the acrylic film (the void layer of the present invention). (2) Next, silicon was identified with fluorescent X-rays (manufactured by Shimadzu Corporation: ZSX Primus II) with respect to the above-mentioned samples to measure the Si coating amount (Si 0 ). Then, the void layer on the acrylic film was cut into 50 mm x 100 mm from the sampled periphery, fixed to a glass plate (thickness 3 mm), and then subjected to a sliding test with BEMCOT (registered trademark). Sliding conditions were 10 reciprocations with a weight of 100 g. (3) Sampling and fluorescence X measurement were performed in the same manner as in (1) above from the void layer where sliding was completed, and the amount of remaining Si (Si 1 ) after the scratch test was measured. Scratch resistance is defined by the remaining Si ratio (%) before and after the BEMCOT (registered trademark) test, and can be represented by the following formula. Scratch resistance (%)=[Residual Si amount (Si 1 )/Si coating amount (Si 0 )]×100(%)
本發明之空隙層譬如利用顯示可撓性之MIT試驗所得耐折次數為100次以上。因為本發明具有這種可撓性,所以譬如在製造時之捲取及使用時等之處置性良好。The void layer of the present invention has a folding endurance of 100 or more times, for example, by using the MIT test showing flexibility. Since the present invention has such flexibility, handling properties such as winding up during manufacture and use are good.
前述耐折次數其下限例如為100次以上、500次以上、1000次以上,其上限無特別限制,例如為10000次以下,其範圍例如為100~10000次、500~10000次、1000~10000次。The lower limit of the aforementioned folding times is, for example, more than 100 times, more than 500 times, and more than 1,000 times, and the upper limit is not particularly limited, such as less than 10,000 times, and its range is, for example, 100 to 10,000 times, 500 to 10,000 times, or 1,000 to 10,000 times .
前述可撓性係表示物質的易變形性。前述利用MIT試驗所得耐折次數例如可以下述方法測定。The aforementioned flexibility refers to the easy deformability of a substance. The number of folding endurance obtained by the aforementioned MIT test can be measured, for example, by the following method.
(耐折試驗評估) 將前述空隙層(本發明之空隙層)裁切成20mm×80mm之短籤狀後,安裝於MIT耐折試驗機(TESTER SANGYO CO,. LTD.製:BE-202)並附加1.0N之荷重。包夾前述空隙層的夾頭部係使用R2.0mm,耐折次數最多進行10000次,並以前述空隙層破斷之時間點的次數作為耐折次數。(Evaluation of folding test) After cutting the aforementioned void layer (the void layer of the present invention) into a 20mm x 80mm short stick, install it on an MIT folding tester (manufactured by TESTER SANGYO CO,. LTD.: BE-202) And add a load of 1.0N. The collet that sandwiches the aforementioned void layer uses R2.0mm, and the maximum number of times of folding is 10,000, and the number of times when the aforementioned void layer breaks is taken as the number of folding endurance.
在本發明之空隙層中,表示空隙率之膜密度並無特別限制,其下限譬如為1g/cm3 以上、5g/cm3 以上、10g/cm3 以上、15g/cm3 以上,其上限譬如為50g/cm3 以下、40g/cm3 以下、30g/cm3 以下、2.1g/cm3 以下,其範圍譬如為5~50g/cm3 、10~40g/cm3 、15~30g/cm3 、1~2.1g/cm3 。In the void layer of the present invention, the film density representing the porosity is not particularly limited, and its lower limit is, for example, 1 g/cm 3 or more, 5 g/cm 3 or more, 10 g/cm 3 or more, 15 g/cm 3 or more, and its upper limit is, for example, 50g/cm 3 or less, 40g/cm 3 or less, 30g/cm 3 or less, 2.1g/cm 3 or less, the range is, for example, 5~50g/cm 3 , 10~40g/cm 3 , 15~30g/cm 3 , 1~2.1g/cm 3 .
前述膜密度例如可以下述方法測定。The aforementioned film density can be measured, for example, by the following method.
(評估膜密度) 於丙烯酸薄膜形成空隙層(本發明之空隙層)後,使用X射線繞射裝置(RIGAKU公司製:RINT-2000)測定全反射區的X射線反射率。在調配好Intensity與2θ以後,從空隙層、基材之全反射臨界角算出空孔率(P%)。膜密度可以下述式表示。 膜密度(%)=100(%)-空孔率(P%)(Evaluation of Film Density) After forming a void layer (void layer of the present invention) on the acrylic film, the X-ray reflectance in the total reflection region was measured using an X-ray diffraction device (manufactured by RIGAKU: RINT-2000). After adjusting the Intensity and 2θ, calculate the porosity (P%) from the total reflection critical angle of the void layer and the substrate. The film density can be represented by the following formula. Membrane density (%)=100(%)-porosity (P%)
本發明之空隙層只要如前述具有孔結構(多孔質結構)即可,例如可為前述孔結構連續構成的開放性發泡結構體。前述開放性發泡結構體例如係表示在前述空隙層中孔結構以三維型態連結,亦可說是前述孔結構之內部空隙連接在一起的狀態。多孔質體具有開放性發泡結構時,雖可藉此提高在整體中所佔的空隙率,不過當使用如中空二氧化矽之類的閉胞(close-cell)粒子時,無法形成開放性發泡結構。相對地,本發明之空隙層由於溶膠粒子(形成溶膠的多孔體凝膠粉碎物)具有三維樹狀結構,所以在塗覆膜(含有前述多孔體凝膠之粉碎物的溶膠塗覆膜)中藉由前述樹狀粒子沉降、堆積,可輕易地形成開放性發泡結構。此外,較理想係本發明之空隙層形成開放性發泡結構具有多個細孔分布的單塊(monolith)結構。前述單塊結構係指例如具奈米尺寸之微細空隙的結構及以相同的奈米空隙集結而成之開放性發泡結構存在的階層結構。在形成前述單塊結構的時,係例如以微細空隙賦予膜強度同時以粗大的開放性發泡空隙賦予高空隙率,而能夠兼顧膜強度及高空隙率。要形成這些單塊結構,重點在於,譬如首先在粉碎成前述粉碎物之前階段的前述多孔體凝膠中,控制所生成之空隙結構的細孔分布。又,譬如在粉碎前述多孔體凝膠時,藉由將前述粉碎物之粒度分布控制在期望的尺寸之下,可形成前述單塊結構。The void layer of the present invention is only required to have a pore structure (porous structure) as described above, and may be, for example, an open foam structure in which the pore structure is continuously formed. The aforementioned open foam structure means, for example, that the pore structure in the pore layer is connected in a three-dimensional manner, and it can also be said that the internal voids of the pore structure are connected together. When the porous body has an open foam structure, although it can increase the porosity in the whole, it cannot form openness when using closed-cell particles such as hollow silica. foam structure. On the other hand, since the void layer of the present invention has a three-dimensional dendritic structure of the sol particles (the pulverized product of the porous body gel forming the sol), in the coating film (sol-coated film containing the pulverized product of the aforementioned porous body gel), The open foam structure can be easily formed by the settlement and accumulation of the aforementioned dendritic particles. In addition, it is preferable that the interstitial layer of the present invention forms a monolithic structure with an open foam structure and a plurality of pores distributed therein. The aforementioned monolithic structure refers to, for example, a structure with nanometer-sized fine voids and a hierarchical structure in which an open foam structure formed by gathering the same nanoscale voids exists. When forming the above-mentioned monolithic structure, for example, fine voids provide film strength and coarse open foam voids provide high porosity, so that both film strength and high porosity can be achieved. To form these monolithic structures, it is important, for example, to firstly control the pore distribution of the generated void structure in the aforementioned porous body gel in the stage before pulverization into the aforementioned pulverized product. Also, for example, when pulverizing the porous gel, the monolithic structure can be formed by controlling the particle size distribution of the pulverized product to a desired size.
在本發明之空隙層中,顯示柔軟性之開裂裂縫形成伸長率並無特別限制,其下限譬如為0.1%以上、0.5%以上、1%以上,其上限譬如為3%以下。前述開裂裂縫形成伸長率之範圍譬如為0.1~3%、0.5~3%、1~3%。In the void layer of the present invention, the elongation at crack formation showing flexibility is not particularly limited, and its lower limit is, for example, 0.1%, 0.5%, or 1%, and its upper limit is, for example, 3% or less. The range of elongation at the formation of cracks above is, for example, 0.1-3%, 0.5-3%, 1-3%.
前述開裂裂縫形成伸長率譬如可以下述方法測定。The aforementioned elongation at crack formation can be measured, for example, by the following method.
(評估開裂裂縫形成伸長率) 於丙烯酸薄膜上形成空隙層(本發明之空隙層)後,採樣出5mm×140mm之短籤狀。接著,於拉伸試驗機(島津製作所公司製:AG-Xplus)以夾具間距離為100mm的方式夾持前述試樣後,在0.1mm/s之拉伸速度下進行拉伸試驗。仔細觀察試驗中之前述試樣,並在前述試樣之部分上形成裂縫之時間點結束試驗,以形成裂縫之時間點的伸長率(%)作為開裂裂縫形成伸長率。(Evaluation of crack formation elongation) After forming a void layer (void layer of the present invention) on the acrylic film, a short stick shape of 5 mm x 140 mm was sampled. Next, the sample was clamped by a tensile testing machine (manufactured by Shimadzu Corporation: AG-Xplus) so that the distance between grips was 100 mm, and then a tensile test was performed at a tensile speed of 0.1 mm/s. Carefully observe the aforementioned samples in the test, and end the test at the time point when cracks are formed on the part of the aforementioned sample, and use the elongation (%) at the time point when the cracks are formed as the crack formation elongation rate.
在本發明之空隙層中,表示透明性之霧度並無特別限制,其下限譬如為0.1%以上、0.2%以上、0.3%以上,其上限譬如為10%以下、5%以下、3%以下,其範圍譬如為0.1~10%、0.2~5%、0.3~3%。In the void layer of the present invention, the haze indicating transparency is not particularly limited, and its lower limit is, for example, 0.1% or more, 0.2% or more, and 0.3% or more, and its upper limit is, for example, 10% or less, 5% or less, and 3% or less , and its range is, for example, 0.1~10%, 0.2~5%, 0.3~3%.
前述霧度例如可以下述方法測定。The said haze can be measured by the following method, for example.
(評估霧度) 將空隙層(本發明之空隙層)裁切成50mm×50mm的尺寸並設置於霧度計(村上色彩技術研究所公司製:HM-150)上,測定霧度。關於霧度值可利用下式算出。 霧度(%)=[擴散透射率(%)/全光線透光率(%)]×100(%)(Evaluation of Haze) The void layer (the void layer of the present invention) was cut into a size of 50 mm×50 mm and set on a haze meter (manufactured by Murakami Color Technology Laboratory Co., Ltd.: HM-150) to measure the haze. The haze value can be calculated by the following formula. Haze (%)=[diffuse transmittance (%)/total light transmittance (%)]×100(%)
一般來說,前述折射率係以在真空中之光於波面的傳遞速度與在介質內之傳播速度之比,稱為該介質之折射率。本發明之聚矽氧多孔體的折射率並無特別限制,其上限譬如為1.3以下、小於1.3、1.25以下、1.2以下、1.15以下,其下限譬如為1.05以上、1.06以上、1.07以上,其範圍譬如為1.05以上且1.3以下、1.05以上且小於1.3、1.05以上且1.25以下、1.06以上~小於1.2、1.07以上~1.15以下。Generally speaking, the aforementioned refractive index is the ratio of the transmission speed of light on the wave front in vacuum to the propagation speed in the medium, which is called the refractive index of the medium. The refractive index of the polysiloxane porous body of the present invention is not particularly limited, and its upper limit is, for example, 1.3 or less, less than 1.3, 1.25 or less, 1.2 or less, and 1.15 or less, and its lower limit is, for example, 1.05 or more, 1.06 or more, and 1.07 or more. For example, it is 1.05 to 1.3, 1.05 to 1.3, 1.05 to 1.25, 1.06 to 1.2, 1.07 to 1.15.
本發明中,在未特別言及之前提下,前述折射率指波長550nm下所測定之折射率。又,折射率之測定方法無特別限定,例如可利用下述方法測定。In the present invention, the above-mentioned refractive index refers to the refractive index measured at a wavelength of 550 nm unless otherwise specified. Moreover, the measuring method of a refractive index is not specifically limited, For example, it can measure by the following method.
(評估折射率) 於丙烯酸薄膜上形成空隙層(本發明之空隙層)後,裁切成50mm×50mm的大小並將其以黏著層貼合於玻璃板(厚度:3mm)的表面。將前述玻璃板的背面中央部(直徑20mm左右)以黑色麥克筆塗黑而調製出不會在前述玻璃板之背面反射的試樣。將前述試樣安裝於橢圓偏光儀(J.A. Woollam Japan公司製:VASE)上,在波長500nm且入射角50~80度之條件下測定折射率,並以其平均值作為折射率。(Evaluation of Refractive Index) After forming a void layer (the void layer of the present invention) on the acrylic film, it was cut into a size of 50mm×50mm and attached to the surface of a glass plate (thickness: 3mm) with an adhesive layer. A sample that does not reflect on the back surface of the glass plate was prepared by blackening the center portion of the back surface of the glass plate (about 20 mm in diameter) with a black marker. The aforementioned sample was mounted on an ellipsometer (manufactured by J.A. Woollam Japan: VASE), and the refractive index was measured at a wavelength of 500 nm and an incident angle of 50 to 80 degrees, and the average value was used as the refractive index.
本發明之空隙層的厚度並無特別限制,其下限譬如為0.05μm以上、0.1μm以上,其上限譬如為1000μm以下、100μm以下,其範圍譬如為0.05~1000μm、0.1~100μm。The thickness of the void layer in the present invention is not particularly limited, and its lower limit is, for example, 0.05 μm or more and 0.1 μm or more, and its upper limit is, for example, 1000 μm or less and 100 μm or less, and its range is, for example, 0.05 to 1000 μm or 0.1 to 100 μm.
本發明之空隙層形態並無特別限制,譬如可為薄膜形狀亦可為塊體形狀等。The form of the void layer in the present invention is not particularly limited, for example, it may be in the form of a thin film or a bulk.
本發明之空隙層的製造方法無特別限制,譬如可利用前述之前述空隙層之製造方法來製造。 實施例The manufacturing method of the air gap layer of the present invention is not particularly limited, for example, it can be manufactured by using the above-mentioned manufacturing method of the aforementioned air gap layer. Example
接下來,針對本發明之實施例加以說明。惟,本發明不受以下實施例限定。Next, an embodiment of the present invention will be described. However, the present invention is not limited by the following examples.
[參考例1] 首先,進行矽化合物之凝膠化(下述步驟(1))及熟成步驟(下述步驟(2)),製造具有多孔質結構的凝膠(聚矽氧多孔體)。接著,於其後進行下述(3)形態控制步驟、(4)溶劑置換步驟、(5)濃度測定(濃度管理)及濃度調整步驟、(6)凝膠粉碎步驟,製得低折射率層形成用塗覆液(含凝膠粉碎物液體)。另,在本參考例中如下述,係以有別於下述步驟(1)的其他步驟來進行下述(3)形態控制步驟。但,本發明不受此限,譬如亦可在下述步驟(1)中進行下述(3)形態控制步驟。[Reference Example 1] First, the gelation of the silicon compound (step (1) below) and the aging step (step (2) below) were performed to produce a gel (polysiloxane porous body) having a porous structure. Next, the following (3) morphology control step, (4) solvent replacement step, (5) concentration measurement (concentration management) and concentration adjustment step, (6) gel pulverization step are performed to obtain a low refractive index layer Coating liquid for formation (liquid containing pulverized gel). In addition, in this reference example, as described below, the following (3) form control step is performed in a different step from the following step (1). However, the present invention is not limited thereto. For example, the following (3) morphology control step can also be performed in the following step (1).
(1)矽化合物之凝膠化 使9.5kg之矽化合物之前驅物的MTMS溶解於DMSO 22kg中。於前述混合液添加5kg的0.01mol/L之草酸水溶液後,在室溫下進行120分鐘之攪拌,使MTMS水解而生成參(羥)甲基矽烷。(1) Gelation of silicon compound Dissolve 9.5kg of MTMS which is the precursor of silicon compound in 22kg of DMSO. After adding 5 kg of 0.01 mol/L oxalic acid aqueous solution to the aforementioned mixture, it was stirred at room temperature for 120 minutes to hydrolyze MTMS to generate para(hydroxy)methylsilane.
於DMSO 55kg中添加28%濃度之氨水3.8kg及純水2kg後,進一步追加前述經水解處理之前述混合液,並在室溫下攪拌60分鐘。將攪拌60分鐘後的液體倒入長30cm×寬30cm×高5cm之不鏽鋼容器中並靜置在室溫下,藉以進行參(羥)甲基矽烷之凝膠化而製得凝膠狀矽化合物。After adding 3.8 kg of 28% ammonia water and 2 kg of pure water to 55 kg of DMSO, the aforementioned mixed solution subjected to hydrolysis treatment was further added, and stirred at room temperature for 60 minutes. Pour the liquid after stirring for 60 minutes into a stainless steel container of length 30cm×width 30cm×height 5cm and let it stand at room temperature, so as to gel the ginseng (hydroxy)methylsilane to obtain a gel-like silicon compound .
(2)熟成步驟 將進行前述凝膠化處理所得凝膠狀矽化合物在40℃下培育20小時,進行熟成處理而製得前述長方體形狀之團塊凝膠。由於原料中之DMSO(沸點130℃以上之高沸點溶劑)的使用量佔原料整體約83重量%,由此可知,該凝膠含有50重量%以上之沸點130℃以上的高沸點溶劑。又,由於原料中之MTMS(為凝膠構成單元之單體)的使用量佔原料整體約8重量%,由此可知,該凝膠中藉由凝膠構成單元之單體(MTMS)水解而生成的沸點低於130℃之溶劑(此時為甲醇)含量為20重量%以下。(2) Aging step The gel-like silicon compound obtained by the above-mentioned gelation treatment was incubated at 40°C for 20 hours to perform an aging treatment to obtain the aforementioned cuboid-shaped lump gel. Since the amount of DMSO (a high boiling point solvent with a boiling point of 130° C. or higher) used in the raw material accounts for about 83% by weight of the entire raw material, it can be seen that the gel contains more than 50% by weight of a high boiling point solvent with a boiling point of 130° C. or higher. Also, since the amount of MTMS (a monomer that is a gel constituting unit) used in the raw material accounts for about 8% by weight of the whole raw material, it can be seen that the hydrolysis of the gel constituting monomer (MTMS) in the gel The content of the generated solvent having a boiling point lower than 130° C. (methanol in this case) is 20% by weight or less.
(3)形態控制步驟 在藉由前述步驟(1)、(2)於前述30cm×30cm×5cm之不鏽鋼容器中所合成的凝膠上,倒入置換溶劑之水。接著,在前述不鏽鋼容器中對凝膠從上部緩慢地插入裁切用夾具之裁切刀,將凝膠裁切成大小1.5cm×2cm×5cm的長方體。(3) Morphological control step On the gel synthesized by the aforementioned steps (1) and (2) in the aforementioned 30cm x 30cm x 5cm stainless steel container, pour water to replace the solvent. Next, slowly insert the cutting knife of the jig for cutting into the gel in the aforementioned stainless steel container from above, and cut the gel into cuboids with a size of 1.5 cm x 2 cm x 5 cm.
(4)溶劑置換步驟 接下來,以如下述(4-1)~(4-3)的方式進行溶劑置換步驟。(4) Solvent replacement step Next, the solvent replacement step was performed as described in (4-1) to (4-3) below.
(4-1) 在前述「(3)形態控制步驟」後,將前述凝膠狀矽化合物浸漬於前述凝膠狀矽化合物之8倍重量的水中,並在只有水對流的方式下慢慢地攪拌1h。1h後將水與同份量的水做交換,再攪拌3h。其後又進一步再度交換水,然後在60℃下緩慢地攪拌並同時加熱3h。(4-1) After the aforementioned "(3) Morphology Controlling Step", immerse the aforementioned gel-like silicon compound in water that is 8 times the weight of the aforementioned gel-like silicon compound, and slowly Stir for 1h. After 1h, exchange the water with the same amount of water, and stir for another 3h. Thereafter, the water was further exchanged again, and then stirred slowly at 60° C. while heating for 3 h.
(4-2) 於(4-1)後,將水交換成前述凝膠狀矽化合物之4倍重量的異丙醇,並同樣在60℃下攪拌且加熱6h攪拌。(4-2) After (4-1), exchange the water with isopropanol which is 4 times the weight of the aforementioned gel-like silicon compound, and also stir and heat at 60°C for 6 hours.
(4-3) 於(4-2)後,將異丙醇交換成相同重量的異丁醇,並同樣在60℃下加熱6h,將前述凝膠狀矽化合物中所含溶劑取代成異丁醇。以如上述方法來製造本發明之空隙層製造用凝膠。(4-3) After (4-2), exchange isopropanol with isobutanol of the same weight, and heat at 60°C for 6 hours to replace the solvent contained in the aforementioned gel-like silicon compound with isobutanol alcohol. The gel for forming a void layer of the present invention was produced as described above.
(5)濃度測定(濃度管理)及濃度調整步驟 於前述(4)之溶劑置換步驟後取出前述塊體狀的凝膠,並去除附著於凝膠四周的溶劑。然後以重量乾燥法測定一個凝膠塊體中所占固體成分濃度。此時,為了取得測定值的重現性,以隨機取出之6個塊體進行測定,並算出其平均值及值之參差。此時,凝膠中固體成分之濃度(凝膠濃度)的平均值為5.20重量%,6個凝膠中之前述凝膠濃度之值之參差則為±0.1%以內。以該測定值為基礎,添加異丁醇溶劑做調整,以使凝膠固體成分之濃度(凝膠濃度)成為約3.0重量%。(5) Concentration measurement (concentration management) and concentration adjustment steps After the solvent replacement step in (4) above, take out the bulk gel, and remove the solvent attached to the periphery of the gel. Then the concentration of solid components in a gel block is determined by gravimetric drying method. At this time, in order to obtain the reproducibility of the measured value, the measurement was performed with 6 blocks taken out at random, and the average value and the variation of the value were calculated. At this time, the average value of the concentration of the solid content in the gel (gel concentration) was 5.20% by weight, and the variation of the value of the aforementioned gel concentration among the 6 gels was within ±0.1%. Based on this measured value, an isobutanol solvent was added and adjusted so that the concentration of the gel solid content (gel concentration) would be about 3.0% by weight.
(6)凝膠粉碎步驟 針對前述(5)濃度測定(濃度管理)及濃度調整步驟後的前述凝膠(凝膠狀矽化合物),係以第1粉碎階段中利用連續式乳化分散(太平洋機工公司製、Milder MDN304型),且第2粉碎階段利用高壓無介質粉碎(SUGINO MACHINE Ltd.製、Star Burst HJP-25005型)之2階段來進行粉碎。該粉碎處理係針對溶劑含有前述經溶劑置換之凝膠狀矽化合物的凝膠43.4kg,秤量追加異丁醇26.6kg後,在第1粉碎階段以循環粉碎進行20分鐘,且第2粉碎階段進行粉碎壓力100MPa之粉碎。如此一來便製得奈米尺寸之粒子(前述凝膠之粉碎物)分散其中的異丁醇分散液(含凝膠粉碎物液體)。(6) Gel pulverization step For the aforementioned gel (gel-like silicon compound) after the concentration measurement (concentration management) and concentration adjustment steps of (5) above, the first pulverization step uses continuous emulsification and dispersion (Pacific Machine Works) Company-made, Milder MDN304 type), and the second pulverization stage was pulverized by two stages of high-pressure medialess pulverization (SUGINO MACHINE Ltd., Star Burst HJP-25005 type). The pulverization treatment is for 43.4 kg of the gel containing the above-mentioned gel-like silicon compound replaced by the solvent. After weighing and adding 26.6 kg of isobutanol, the first pulverization stage is carried out in a circular pulverization for 20 minutes, and the second pulverization stage is carried out. The crushing pressure is 100MPa. In this way, an isobutanol dispersion (liquid containing the ground gel) in which nano-sized particles (the ground gel) were dispersed was prepared.
又,於前述第1粉碎階段(粗粉碎步驟)後且前述第2粉碎階段(奈米粉碎步驟)前,測定前述液體(高黏度凝膠粉碎液)之固體成分濃度(凝膠濃度),結果得3.01重量%。於前述第1粉碎階段(粗粉碎步驟)後且前述第2粉碎階段(奈米粉碎步驟)前,前述凝膠之粉碎物的體積平均粒徑為3~5μm,前述液體之剪切黏度為4,000mPa・s。此時,高黏度凝膠粉碎液為高黏度,所以不會固液分離而可做到做成均勻液體的處理,因此可直接採用前述第1粉碎階段(粗粉碎步驟)後的測定值。此外,在前述第2粉碎階段(奈米粉碎步驟)後,前述凝膠之粉碎物的體積平均粒徑為250~350nm,前述液體之剪切黏度為5m~10mPa・s。再者,在前述第2粉碎階段(奈米粉碎步驟)後,再次測定前述液體(含凝膠粉碎物液體)之固體成分濃度(凝膠濃度),結果得3.01重量%,與前述第1粉碎階段(粗粉碎步驟)後不變。Also, the solid content concentration (gel concentration) of the liquid (high-viscosity gel pulverization liquid) was measured after the first pulverization step (coarse pulverization step) and before the second pulverization step (nano pulverization step), and the result was 3.01% by weight was obtained. After the aforementioned first crushing stage (coarse crushing step) and before the aforementioned second crushing stage (nano crushing step), the volume average particle diameter of the crushed product of the aforementioned gel is 3-5 μm, and the shear viscosity of the aforementioned liquid is 4,000 mPa·s. At this time, the high-viscosity gel pulverization liquid has a high viscosity, so it can be processed into a uniform liquid without solid-liquid separation, so the measured value after the first pulverization stage (coarse pulverization step) can be directly used. In addition, after the second pulverization stage (nano pulverization step), the volume average particle diameter of the pulverized product of the gel is 250-350 nm, and the shear viscosity of the liquid is 5 m-10 mPa·s. Furthermore, after the second pulverization step (nano pulverization step), the solid content concentration (gel concentration) of the aforementioned liquid (liquid containing pulverized gel) was measured again. No change after the stage (coarse crushing step).
另,在本參考例中,前述第1粉碎階段後及前述第2粉碎階段後之前述凝膠的粉碎物(溶膠粒子)平均粒徑,係以動態光散射式Nanotrac粒度分析計(日機裝公司製、商品名UPA-EX150型)做確認。又,在本實施例中,前述第1粉碎階段後及前述第2粉碎階段後之前述液體的剪切黏度係以振動式黏度測定機(Sekonic Co.製、商品名FEM-1000V)做確認。在以下各實施例及比較例亦同。In addition, in this reference example, the average particle diameter of the pulverized product (sol particles) of the aforementioned gel after the aforementioned first pulverizing stage and after the aforementioned second pulverizing stage was determined by a dynamic light scattering Nanotrac particle size analyzer (Nikkiso Company system, brand name UPA-EX150 type)I confirm it. Also, in this example, the shear viscosity of the liquid after the first pulverization stage and after the second pulverization stage was confirmed with a vibrating viscometer (manufactured by Sekonic Co., trade name FEM-1000V). The same applies to the following Examples and Comparative Examples.
另,於前述第1粉碎步驟(粗粉碎步驟)後,在前述含凝膠粉碎物液體之固體成分(凝膠)中,測定(算出)構成單元單體的官能基(矽烷醇基)中無助於凝膠內交聯結構的官能基(殘留矽烷醇基)比率,結果得到11mol%之測定值。又,前述無助於凝膠內交聯結構之官能基(殘留矽烷醇基)比率係藉由下述方法進行測定:將凝膠乾燥後測定固體NMR(Si-NMR),並從NMR之峰值比算出無助於交聯結構之殘留矽烷醇基的比率。In addition, after the first pulverization step (coarse pulverization step), in the solid content (gel) of the liquid containing the pulverized gel, it is measured (calculated) that there are no functional groups (silanol groups) in the constituent unit monomers. The proportion of functional groups (residual silanol groups) contributing to the crosslinking structure in the gel resulted in a measured value of 11 mol%. In addition, the ratio of the functional groups (residual silanol groups) that do not contribute to the crosslinking structure in the gel is measured by the following method: after drying the gel, measure the solid state NMR (Si-NMR), and from the peak value of the NMR Calculate the ratio of residual silanol groups that do not contribute to the crosslinked structure.
以上述方法來製造本參考例(參考例1)之空隙層形成用塗覆液(含凝膠粉碎物液體)。又,以前述方法測定空隙層形成用塗覆液(含凝膠粉碎物液體)中之凝膠粉碎物(微細孔粒子)的峰值細孔徑,結果得12nm。The coating liquid (liquid containing pulverized gel) of this reference example (Reference Example 1) for forming a void layer was produced by the method described above. Also, the peak pore diameter of the ground gel (micropore particles) in the coating solution for forming a void layer (liquid containing the ground gel) was measured by the method described above, and found to be 12 nm.
[實施例1] 於參考例1中所製作之低折射率層形成用塗覆液3g添加混合光鹼產生劑(WPBG266[和光純藥工業股份有限公司商品名]:1.5%濃度MIBK溶液)0.36g、雙(三甲氧基矽基)乙烷(TCI)(5%濃度MIBK溶液)0.11g,並將所得液體塗覆至由100μm之含脂環式結構樹脂薄膜(日本ZEON股份有限公司、商品名「ZEONOR:ZF16薄膜」)所構成的基材(基材薄膜)上並使其乾燥後,形成膜厚約800nm的低折射率層(折射率:1.18、空隙率:59體積%)。接著從低折射率層面側進行UV照射(300mJ)後,將厚度12μm之附分離件(75μm)之黏著劑(第1黏接著層)貼合至低折射率層面上。然後將前述含脂環式結構樹脂薄膜(基材薄膜)自前述黏著劑(黏接著層)與低折射率層的一體物品剝離。其後,於已剝離前述基材薄膜之面上進一步貼合另一個厚5μm之附分離件的黏著劑(第2黏接著層),而製得總厚度(整體厚度)為約18μm的含低折射率層之黏接著片。又,總厚度(整體厚度)係指前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體[不計分離件]的合計厚度,在以下各實施例及比較例中亦同。該含低折射率層之黏接著片中,黏著劑(黏接著層)之厚度(前述第1黏接著層及前述第2黏接著層的合計厚度)相對於總厚度(整體厚度)的所占比率為約95%。再來,自前述含低折射率層之黏接著片剝離前述分離件,並以前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體,將背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板貼合並一體化,而製得本實施例之導光板方式液晶顯示器用光學片材。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Example 1] A photobase generator (WPBG266 [trade name of Wako Pure Chemical Industries, Ltd.]: 1.5% concentration MIBK solution) was added to 3 g of the coating solution for forming a low-refractive index layer prepared in Reference Example 1. 0.36 g, bis(trimethoxysilyl)ethane (TCI) (5% concentration MIBK solution) 0.11g, and the gained liquid is coated on the resin film containing the alicyclic structure of 100 μm (Japan ZEON Co., Ltd., commodity Name "ZEONOR: ZF16 film") on the substrate (substrate film) and dried to form a low refractive index layer (refractive index: 1.18, porosity: 59% by volume) with a film thickness of about 800nm. Next, after UV irradiation (300 mJ) was performed from the low-refractive-index layer side, an adhesive (first adhesive layer) with a separator (75 μm) having a thickness of 12 μm was attached to the low-refractive-index layer. Then, the aforesaid alicyclic structure-containing resin film (substrate film) is peeled off from the integrated article of the aforesaid adhesive (adhesive layer) and low refractive index layer. Thereafter, another adhesive with a thickness of 5 μm (the second adhesive layer) is further pasted on the surface of the peeled base film to obtain a low-density film with a total thickness (overall thickness) of about 18 μm. Adhesive sheet for refractive index layer. In addition, the total thickness (overall thickness) refers to the total thickness of the laminate [excluding separators] of the aforementioned first adhesive layer, aforementioned low-refractive index layer, and aforementioned second adhesive layer. In each of the following examples and comparative examples Same. In the adhesive sheet containing the low refractive index layer, the ratio of the thickness of the adhesive (adhesive layer) (the total thickness of the aforementioned first adhesive layer and the aforementioned second adhesive layer) to the total thickness (overall thickness) The ratio is about 95%. Next, peel off the separator from the adhesive sheet containing the low-refractive index layer, and use the laminate of the first adhesive layer, the low-refractive index layer, and the second adhesive layer to place the backlight LED side-light type The light guide plate and the reflection plate of the liquid crystal display (light guide plate type LCD) were laminated and integrated to obtain the optical sheet for the light guide plate type liquid crystal display of this embodiment. Table 1 lists the evaluation results of the brightness characteristics of the optical sheet for liquid crystal displays of the light guide plate type.
[實施例2] 除了藉由直接塗覆於前述反射板上來形成前述低折射率層以外,以與實施例1同樣方式將背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板一體化,而製得導光板方式液晶顯示器用光學片材。亦即,本實施例之導光板方式液晶顯示器用光學片材於前述反射板與前述低折射率層之間不存在黏著劑(黏接著層),且前述反射板與前述低折射率層直接積層,除此以外皆與實施例1相同。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Example 2] Except that the aforementioned low-refractive index layer was formed by directly coating on the aforementioned reflective plate, the light guide plate of the backlight LED side-light liquid crystal display (light guide plate type LCD) was combined with the reflector in the same manner as in Example 1. Plates were integrated to produce an optical sheet for a light guide plate type liquid crystal display. That is, in the optical sheet for a light guide plate type liquid crystal display of this embodiment, there is no adhesive (adhesive layer) between the reflective plate and the low refractive index layer, and the reflective plate and the low refractive index layer are directly laminated. , other than that are the same as in Example 1. Table 1 lists the evaluation results of the brightness characteristics of the optical sheet for liquid crystal displays of the light guide plate type.
[實施例3] 將前述低折射率層塗覆液,換成於低折射率層形成用塗覆液3g添加混合光鹼產生劑(WPBG266[和光純藥工業股份有限公司商品名]:1.5%濃度MIBK溶液)0.18g、雙(三甲氧基矽基)乙烷(TCI)(5%濃度MIBK溶液)0.05g之液體,並將之形成為折射率1.14(空隙率:61%),除此以外以與實施例1同樣的方式,將背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板一體化,而製得導光板方式液晶顯示器用光學片材。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Example 3] The aforementioned low-refractive index layer coating solution was replaced by adding a mixed photobase generator (WPBG266 [Wako Pure Chemical Industries, Ltd. trade name]: 1.5% to 3 g of the low-refractive index layer-forming coating solution) Concentration MIBK solution) 0.18g, bis(trimethoxysilyl) ethane (TCI) (5% concentration MIBK solution) 0.05g liquid, and form it to a refractive index of 1.14 (porosity: 61%), except Other than that, in the same manner as in Example 1, the light guide plate and the reflection plate of the backlight LED side-light liquid crystal display (light guide plate type LCD) were integrated to obtain an optical sheet for a light guide plate type liquid crystal display. Table 1 lists the evaluation results of the brightness characteristics of the optical sheet for liquid crystal displays of the light guide plate type.
[實施例4] 將實施例1之導光板方式液晶顯示器用光學片材的導光板,進一步以與實施例1同樣的方法隔著前述第1黏接著層、前述低折射率層及前述第2黏接著層之積層體與擴散板貼合,而製得本實施例之導光板方式液晶顯示器用光學片材(反射板/導光板/擴散板一體化薄片)。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Example 4] The light guide plate of the light guide plate type optical sheet for liquid crystal displays of Example 1 was further separated by the first adhesive layer, the aforementioned low refractive index layer, and the aforementioned second adhesive layer in the same manner as in Example 1. The laminated body of the adhesive layer was bonded to the diffusion plate to obtain the optical sheet for the light guide plate type liquid crystal display (integrated sheet of reflective plate/light guide plate/diffusion plate) of this embodiment. Table 1 lists the evaluation results of the brightness characteristics of the optical sheet for liquid crystal displays of the light guide plate type.
[實施例5] 使用厚40μm之丙烯酸薄膜作為基材薄膜來替代實施例1中所用基材薄膜,及未剝離前述基材薄膜即在與前述基材薄膜之前述低折射率層相反側之面上貼合前述厚5μm之附分離件的黏著劑(第2黏接著層),除此以外以與實施例1同樣方式,將背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板一體化而製得導光板方式液晶顯示器用光學片材。亦即,本實施例之導光板方式液晶顯示器用光學片材在前述低折射率層與前述第2黏接著層之間存在有前述厚40μm之丙烯酸薄膜(基材薄膜),除此以外與實施例1相同。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Example 5] An acrylic film with a thickness of 40 μm was used as the base film instead of the base film used in Example 1, and the base film was not peeled off, that is, on the side opposite to the aforementioned low refractive index layer of the base film. The above-mentioned adhesive (second adhesive layer) with a separator with a thickness of 5 μm was pasted on it, and in the same manner as in Example 1, the light guide plate of the backlight LED side-light liquid crystal display (light guide plate type LCD) was combined with the An optical sheet for a light guide plate type liquid crystal display was produced by integrating the reflecting plate. That is, the optical sheet for a light guide plate type liquid crystal display of this example has the aforementioned 40 μm thick acrylic film (substrate film) between the aforementioned low refractive index layer and the aforementioned second adhesive layer, and is similar to that of the embodiment except that Example 1 is the same. Table 1 lists the evaluation results of the brightness characteristics of the optical sheet for liquid crystal displays of the light guide plate type.
[比較例1] 將背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板未夾低折射率層且僅與厚12μm之黏著劑貼合而一體化,除此以外以與實施例1同樣方式製得導光板方式液晶顯示器用光學片材。該導光板方式液晶顯示器用光學片材之亮度特性等評估結果列於表1。[Comparative Example 1] The light guide plate and the reflector plate of the backlight LED side-light liquid crystal display (light guide plate type LCD) are not sandwiched between the low refractive index layer and are only bonded with an adhesive with a thickness of 12 μm to integrate. An optical sheet for a liquid crystal display in the form of a light guide plate was prepared in the same manner as in Example 1. Table 1 lists the evaluation results of the brightness characteristics of the optical sheet for liquid crystal displays of the light guide plate type.
[比較例2] 與實施例1同樣地,未使背光LED側光型液晶顯示器(導光板方式LCD)之導光板與反射板一體化而隔著空氣層積層。亦即,在本比較例中,於前述導光板與前述反射板之間除空氣層外未配置其他層,且未使用前述低折射率層及前述黏接著層(黏著劑)。此時的亮度特性等評估結果列於表1。[Comparative Example 2] In the same manner as in Example 1, the light guide plate and the reflection plate of the backlight LED side-light liquid crystal display (light guide plate type LCD) were not integrated, and layers were laminated through air. That is, in this comparative example, no layers other than the air layer were disposed between the light guide plate and the reflection plate, and the low refractive index layer and the adhesive layer (adhesive) were not used. Table 1 shows the evaluation results of brightness characteristics and the like at this time.
[表1] [Table 1]
另,表1中,亮度特性(亮度均勻性)係以下述方式測定。In addition, in Table 1, the luminance characteristics (uniformity of luminance) were measured as follows.
(亮度特性之測定方法) 對具有LED側光型背光之電視機,使用以前述各實施例或比較例之任一者製造之使導光板與稜鏡片一體化(惟,比較例2中係隔著空氣層而積層,未行一體化)而成的導光板方式液晶顯示器用光學片材,使電視機進行白顯示(white display),再利用分光放射計SR-UL2(TOPCON TECHNOHOUSE Co.之商品名)從導光板之LED入射側朝向終端側測定各座標的每個亮度。(Measurement method of luminance characteristics) For a TV set with an LED side-light backlight, use any one of the aforementioned embodiments or comparative examples to integrate the light guide plate and the sapphire sheet (however, in comparative example 2, it is separated Optical sheets for light guide plate type liquid crystal displays that are laminated with an air layer and not integrated) are used to make white displays on TVs, and then use the spectroradiometer SR-UL2 (product of TOPCON TECHNOHOUSE Co. Name) Each luminance of each coordinate is measured from the LED incident side of the light guide plate toward the terminal side.
如表1所示,使用實施例1~5之導光板方式液晶顯示器用光學片材使導光板與反射板一體化時,來自LED的光會從導光板之入射側傳播至終端側,亮度特性良好(亮度均勻)。又,使導光板與反射板一體化時,既無異物混入,組裝步驟時的成品率亦佳。As shown in Table 1, when the light guide plate and the reflection plate are integrated using the optical sheet for liquid crystal display of the light guide plate method of Examples 1 to 5, the light from the LED will propagate from the incident side of the light guide plate to the terminal side, and the luminance characteristics Good (uniform brightness). In addition, when the light guide plate and the reflector are integrated, foreign matter does not get mixed in, and the yield rate during the assembly process is also good.
相對於此,在比較例中,光在傳播至導光板之終端側之前便發生漏光,得到光無法貫穿至終端側的結果。即,比較例1未使用低折射率層而僅以黏著劑(黏接著層)使導光板與反射板一體化,比起實施例,亮度有降低。又,比較例2係未使導光板與反射板一體化而隔著空氣層積層,結果不僅發生亮度不均(亮度不均勻),且有異物混入,組裝步驟時的成品率降低。On the other hand, in the comparative example, the light leaked before propagating to the terminal side of the light guide plate, and the result was that the light could not penetrate to the terminal side. That is, in Comparative Example 1, the light guide plate and the reflection plate were integrated only with an adhesive (adhesive layer) without using a low-refractive index layer, and the luminance was lower than that of Examples. In addition, in Comparative Example 2, the light guide plate and the reflection plate were not integrated, but the layers were laminated through the air. As a result, not only brightness unevenness (brightness unevenness) occurred, but also foreign matter was mixed in, and the yield during the assembly process was reduced.
另,在實施例5中有將基材薄膜組裝至導光板方式液晶顯示器用光學片材之中,不過在其他的實施例則未將基材薄膜裝至導光板方式液晶顯示器用光學片材(剝離基材)來製造,而得以使導光板方式液晶顯示器用光學片材薄型化。 產業上之可利用性In addition, in Example 5, the base film was assembled into the optical sheet for the light guide plate type liquid crystal display, but in other embodiments, the base film was not incorporated into the optical sheet for the light guide plate type liquid crystal display ( The base material) was manufactured, and the thickness of the optical sheet for light guide plate type liquid crystal displays was reduced. Industrial availability
以上如同說明,根據本發明,可提供一種具有折射率極低之低折射率層的導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器。As explained above, according to the present invention, an optical sheet for a light guide plate type liquid crystal display, a backlight unit for a light guide plate type liquid crystal display, and a light guide plate type liquid crystal display having a low refractive index layer having an extremely low refractive index can be provided.
10‧‧‧基材20‧‧‧低折射率層20'‧‧‧塗覆膜(前驅層)20''‧‧‧含凝膠粉碎物液體30‧‧‧黏接著層(黏著劑)40‧‧‧光學薄膜(第1光學薄膜或第2光學薄膜)101‧‧‧送出輥102‧‧‧塗覆輥105‧‧‧捲取輥110‧‧‧烘箱區111‧‧‧熱風器(加熱機構)120‧‧‧化學處理區121‧‧‧燈(光照射機構)或熱風器(加熱機構)201‧‧‧送出輥202‧‧‧儲液區203‧‧‧刮刀(doctor knife)204‧‧‧微凹版210‧‧‧烘箱區211‧‧‧加熱機構220‧‧‧化學處理區221‧‧‧燈(光照射機構)或熱風器(加熱機構)251‧‧‧捲取輥1000、2000、6000‧‧‧導光板方式液晶顯示器(導光板方式LCD)A1~A6、A12、A123‧‧‧單元1010‧‧‧導光板(第1或第2光學薄膜)1020‧‧‧反射板(第1或第2光學薄膜)1030‧‧‧稜鏡片1040‧‧‧擴散片(附擴散之稜鏡片)1050‧‧‧增亮薄膜1060‧‧‧下板偏光板1070‧‧‧黏著劑(黏接著層)1080‧‧‧液晶面板1090‧‧‧擴散板(第1或第2光學薄膜)10‧‧‧substrate 20‧‧‧low refractive index layer 20'‧‧‧coating film (precursor layer) 20''‧‧‧liquid containing ground gel 30‧‧‧adhesive layer (adhesive) 40 ‧‧‧optical film (first optical film or second optical film) 101‧‧‧delivery roller 102‧‧‧coating roller 105‧‧‧winding roller 110‧‧‧oven area 111‧‧‧heater (heating Mechanism) 120‧‧‧chemical treatment area 121‧‧‧lamp (light irradiation mechanism) or heater (heating mechanism) 201‧‧‧delivery roller 202‧‧‧liquid storage area 203‧‧‧scraper (doctor knife) 204‧ ‧‧Microgravure 210‧‧‧Oven area 211‧‧‧Heating mechanism 220‧‧‧Chemical treatment area 221‧‧‧Lamp (light irradiation mechanism) or heater (heating mechanism) 251‧‧‧Take-up roller 1000, 2000 , 6000‧‧‧Light guide plate method liquid crystal display (light guide plate method LCD) A1~A6, A12, A123‧‧‧Unit 1010‧‧‧Light guide plate (1st or 2nd optical film) 1020‧‧‧reflector plate (No. 1 or 2nd optical film) 1030‧‧‧稜菡 1040‧‧‧diffusion sheet (with diffuser) 1050‧‧‧brightness enhancement film 1060‧‧‧lower plate polarizer 1070‧‧‧adhesive (adhesive layer) 1080‧‧‧LCD panel 1090‧‧‧diffusion plate (1st or 2nd optical film)
圖1係顯示本發明之導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器之構成一例的截面圖。 圖2係顯示本發明之導光板方式液晶顯示器用光學片材、導光板方式液晶顯示器用背光單元及導光板方式液晶顯示器之構成另一例的截面圖。 圖3係示意顯示本發明之導光板方式液晶顯示器用光學片材之製造方法一例的步驟截面圖。 圖4係示意顯示本發明之導光板方式液晶顯示器用光學片材之製造方法的部分步驟及其所用裝置之一例之圖。 圖5係示意顯示本發明之導光板方式液晶顯示器用光學片材之製造方法的部分步驟及其所用裝置之另一例之圖。 圖6係顯示不具本發明之導光板方式液晶顯示器用光學片材的導光板方式液晶顯示器之構成一例的截面圖。1 is a cross-sectional view showing an example of the configuration of an optical sheet for a light guide plate type liquid crystal display, a backlight unit for a light guide plate type liquid crystal display, and a light guide plate type liquid crystal display of the present invention. 2 is a cross-sectional view showing another example of the configuration of the optical sheet for a light guide plate type liquid crystal display, the backlight unit for a light guide plate type liquid crystal display, and the light guide plate type liquid crystal display of the present invention. Fig. 3 is a cross-sectional view schematically showing an example of a method of manufacturing an optical sheet for a light guide plate type liquid crystal display of the present invention. Fig. 4 is a diagram schematically showing some steps of the method for producing an optical sheet for a light guide plate type liquid crystal display according to the present invention and an example of an apparatus used therefor. Fig. 5 is a diagram schematically showing some steps of the manufacturing method of the optical sheet for liquid crystal display of the light guide plate type according to the present invention and another example of the device used therefor. Fig. 6 is a cross-sectional view showing an example of a configuration of a light guide plate type liquid crystal display not having the optical sheet for a light guide plate type liquid crystal display of the present invention.
20‧‧‧低折射率層 20‧‧‧Low refractive index layer
30‧‧‧黏接著層(黏著劑) 30‧‧‧adhesive layer (adhesive)
1000‧‧‧導光板方式液晶顯示器(導光板方式LCD) 1000‧‧‧Light guide plate liquid crystal display (Light guide plate LCD)
A3~A6、A12‧‧‧單元 Units A3~A6, A12‧‧‧
1010‧‧‧導光板(第1或第2光學薄膜) 1010‧‧‧Light guide plate (1st or 2nd optical film)
1020‧‧‧反射板(第1或第2光學薄膜) 1020‧‧‧reflector (1st or 2nd optical film)
1030‧‧‧稜鏡片 1030‧‧‧稜珡
1040‧‧‧擴散片(附擴散之稜鏡片) 1040‧‧‧diffusion sheet (with diffuser sheet)
1050‧‧‧增亮薄膜 1050‧‧‧Brightness enhancement film
1060‧‧‧下板偏光板 1060‧‧‧Lower plate polarizer
1070‧‧‧黏著劑(黏接著層) 1070‧‧‧Adhesive (adhesive layer)
1080‧‧‧液晶面板 1080‧‧‧LCD panel
1090‧‧‧擴散板(第1或第2光學薄膜) 1090‧‧‧diffusion plate (1st or 2nd optical film)
Claims (7)
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TW107112389A TWI783986B (en) | 2018-04-11 | 2018-04-11 | Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display |
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TW107112389A TWI783986B (en) | 2018-04-11 | 2018-04-11 | Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display |
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TW201944147A TW201944147A (en) | 2019-11-16 |
TWI783986B true TWI783986B (en) | 2022-11-21 |
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CN115379949A (en) * | 2020-04-24 | 2022-11-22 | 日本瑞翁株式会社 | Laminated film and film with hard coat layer |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006215542A (en) * | 2005-01-07 | 2006-08-17 | Pentax Corp | Anti-reflection coating and optical element having such anti-reflection coating for imaging system |
CN102754003A (en) * | 2010-02-10 | 2012-10-24 | 3M创新有限公司 | Illumination device having viscoelastic layer |
TW201431685A (en) * | 2012-11-14 | 2014-08-16 | Fujifilm Corp | Photosensitive transfer material, substrate having photosensitive low refractive transfer layer, method for fabricating photosensitive low refractive transfer layer, method for forming permanent film, optical device and method for fabricating the same |
TW201638612A (en) * | 2014-12-26 | 2016-11-01 | Nitto Denko Corp | Laminated film roll and method for producing same |
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2018
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006215542A (en) * | 2005-01-07 | 2006-08-17 | Pentax Corp | Anti-reflection coating and optical element having such anti-reflection coating for imaging system |
CN102754003A (en) * | 2010-02-10 | 2012-10-24 | 3M创新有限公司 | Illumination device having viscoelastic layer |
TW201431685A (en) * | 2012-11-14 | 2014-08-16 | Fujifilm Corp | Photosensitive transfer material, substrate having photosensitive low refractive transfer layer, method for fabricating photosensitive low refractive transfer layer, method for forming permanent film, optical device and method for fabricating the same |
TW201638612A (en) * | 2014-12-26 | 2016-11-01 | Nitto Denko Corp | Laminated film roll and method for producing same |
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