TW201943697A - Compound, light absorber, composition, and optical filter - Google Patents

Compound, light absorber, composition, and optical filter Download PDF

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TW201943697A
TW201943697A TW108104400A TW108104400A TW201943697A TW 201943697 A TW201943697 A TW 201943697A TW 108104400 A TW108104400 A TW 108104400A TW 108104400 A TW108104400 A TW 108104400A TW 201943697 A TW201943697 A TW 201943697A
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TWI798353B (en
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金原有希子
中屋敷哲千
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日商艾迪科股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04Indoles; Hydrogenated indoles
    • C07D209/10Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
    • C07D209/18Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04Indoles; Hydrogenated indoles
    • C07D209/10Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
    • C07D209/18Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D209/24Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals with an alkyl or cycloalkyl radical attached to the ring nitrogen atom
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D403/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
    • C07D403/06Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D403/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/14Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing three or more hetero rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/14Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters

Abstract

A compound of a specific structure represented by general formula (A), said compound having an indole ring and a cyanoethenyl structure. (In the formula, Ar is an indole ring, R1 represents a cyano group, -COOR, or the like, each R independently represents a hydrogen atom, C1-40 alkyl group, C6-30 aryl group, C7-30 arylalkyl group, or the like, R2 represents a hydrogen atom, C1-40 alkyl group, or the like, n represents an integer of 1-10, and X represents an n-valent group.).

Description

化合物、光吸收劑、組合物及光學濾光器Compound, light absorber, composition and optical filter

本發明係關於一種400 nm附近之光之吸收性優異之化合物。The present invention relates to a compound having excellent light absorptivity near 400 nm.

對特定之光具有強度較大之吸收之化合物用作CD-R(Compact Disc-Recordable,可錄光碟)、DVD-R(Digital Versatile Disc-Recordable,可錄數位多功能光碟)、DVD+R(Digital Versatile Disc+Recordable,高級可錄數位多功能光碟)、藍色雷射記錄光碟等光學記錄介質之記錄層、或液晶顯示裝置(LCD)、電漿顯示面板(PDP)、電致發光顯示器(ELD)、陰極管顯示裝置(CRT)、螢光顯示管、場發射型顯示器等之圖像顯示裝置之光學要素。Compounds with strong absorption of specific light are used as CD-R (Compact Disc-Recordable), DVD-R (Digital Versatile Disc-Recordable), DVD + R ( Digital Versatile Disc + Recordable, a recording layer for optical recording media such as blue laser recording discs, or liquid crystal display (LCD), plasma display panel (PDP), electroluminescent display ( ELD), cathode tube display device (CRT), fluorescent display tube, field emission display and other image display device optical elements.

於液晶顯示裝置(LCD)、電漿顯示面板(PDP)、電致發光顯示器(ELD)、陰極管顯示裝置(CRT)、螢光顯示管、場發射型顯示器等之圖像顯示裝置用之光學濾光器中,吸收300~1100 nm之波長之光之各種化合物用作光吸收劑。Optical for image display devices such as liquid crystal display (LCD), plasma display panel (PDP), electroluminescence display (ELD), cathode tube display (CRT), fluorescent display tube, field emission display, etc. In the filter, various compounds that absorb light having a wavelength of 300 to 1100 nm are used as light absorbers.

例如,於專利文獻1中報告有一種有機EL(Electroluminescence,電致發光)顯示器元件用濾光器,其含有紫外線吸收劑,遮斷200 nm~410 nm之光。
[先前技術文獻]
[專利文獻]
For example, Patent Document 1 reports a filter for an organic EL (Electroluminescence) display element, which contains an ultraviolet absorber and blocks light from 200 nm to 410 nm.
[Prior technical literature]
[Patent Literature]

專利文獻1:日本專利特開2004-102223號公報Patent Document 1: Japanese Patent Laid-Open No. 2004-102223

然而,專利文獻1記載之紫外線吸收劑存在400 nm附近之光之吸收不充分之情況。其結果,例如專利文獻1記載之濾光器存在有時無法充分地抑制有機EL顯示器元件之劣化之不良情況。However, the ultraviolet absorbent described in Patent Document 1 may have insufficient absorption of light near 400 nm. As a result, the filter described in Patent Document 1, for example, has a problem that the degradation of the organic EL display element cannot be sufficiently suppressed in some cases.

本發明係鑒於上述問題點而完成者,主要目的在於提供一種400 nm附近之光之吸收優異之化合物。The present invention has been made in view of the above problems, and a main object thereof is to provide a compound having excellent absorption of light near 400 nm.

本發明者等人為了解決上述問題進行了努力研究,結果發現具有吲哚環及氰基乙烯基結構之特定結構之化合物能夠有效率地吸收400 nm附近之光,從而完成本發明。The present inventors conducted diligent research in order to solve the above-mentioned problems, and as a result, they found that a compound having a specific structure of an indole ring and a cyanovinyl structure can efficiently absorb light around 400 nm, thereby completing the present invention.

即,本發明係下述通式(A)所表示之化合物(以下,有時稱為化合物A)。That is, this invention is a compound represented by the following general formula (A) (henceforth a compound A).

[化1]

(式中,Ar為吲哚環,
R1 表示氰基、-COOR、-OCOR、-CONHR、-NHCOR、-COONHR、-NHCOOR、-COR、-SO2 R、-SOR、-SO2 NRR'、鹵素原子、硝基或膦醯基,
R及R'分別獨立表示氫原子、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基,
R2 表示氫原子、鹵素原子、氰基、硝基、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基,
R及R'以及R2 所表示之烷基、芳基、芳烷基及含雜環基中之亞甲基可被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR''-、>P=O、-S-S-、-SO2 -或該等之組合,R''表示氫原子或碳原子數1~8之烷基,
R及R'以及R2 所表示之烷基、芳基、芳烷基及含雜環基中之氫原子可被取代為乙烯性不飽和基、鹵素原子、醯基、醯氧基、取代胺基、磺醯胺基、磺醯基、羧基、氰基、磺基、羥基、硝基、巰基、醯亞胺基、胺甲醯基、磺醯胺基、膦酸基、磷酸基、以及羧基、磺基、膦酸基及磷酸基之鹽,
n表示1~10之整數,
X表示n價基)
[Chemical 1]

(Wherein Ar is an indole ring,
R 1 represents cyano, -COOR, -OCOR, -CONHR, -NHCOR, -COONHR, -NHCOOR, -COR, -SO 2 R, -SOR, -SO 2 NRR ', halogen atom, nitro or phosphino ,
R and R 'each independently represent a hydrogen atom, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms or an impurity containing 2 to 20 carbon atoms Ring base,
R 2 represents a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or 2 carbon atoms ~ 20 containing heterocyclic group,
The alkyl, aryl, aralkyl, and heterocyclic group-containing methylene groups represented by R and R 'and R 2 may be substituted with a carbon-carbon double bond, -O-, -S-, -CO- , -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-,- O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR ''-,> P = O, -SS-, -SO 2 -or whatever In combination, R '' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
The hydrogen atom in the alkyl group, aryl group, aralkyl group and heterocyclic group represented by R and R ′ and R 2 may be substituted with ethylenically unsaturated group, halogen atom, fluorenyl group, fluorenyloxy group, and substituted amine Sulfoamino, sulfoamido, sulfoamido, carboxyl, cyano, sulfo, hydroxy, nitro, mercapto, amidoimino, carbamate, sulfoamido, phosphonic acid, phosphate, and carboxy , Sulfo, phosphonic and phosphate salts,
n represents an integer from 1 to 10,
X represents n-valent basis)

本發明之化合物A由於具有上述特定之結構,因此400 nm附近之光之吸收性優異。Since the compound A of the present invention has the above-mentioned specific structure, it has excellent light absorptivity near 400 nm.

上述化合物A較佳為下述通式(A1)、(A2)或(A3)所表示之化合物。其原因在於400 nm附近之光之吸收性更優異。The compound A is preferably a compound represented by the following general formula (A1), (A2), or (A3). The reason for this is that the light absorption around 400 nm is more excellent.

[化2]

(式中,R1 、R2 、R、R'、n及X與通式(A)中之R1 、R2 、R、R'、n及X相同,
R3 及R4 表示氫原子、鹵素原子、氰基、硝基、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基,
R5 及R55 分別獨立表示鹵素原子、氰基、硝基、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基,
R3 及R4 以及R5 及R55 所表示之烷基、芳基、芳烷基及含雜環基中之亞甲基可被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR''-、>P=O、-S-S-、-SO2 -或該等之組合,R''表示氫原子或碳原子數1~8之烷基,
R3 及R4 以及R5 及R55 所表示之烷基、芳基、芳烷基及含雜環基中之氫原子可被取代為乙烯性不飽和基、鹵素原子、醯基、醯氧基、取代胺基、磺醯胺基、磺醯基、羧基、氰基、磺基、羥基、硝基、巰基、醯亞胺基、胺甲醯基、磺醯胺基、膦酸基、磷酸基、以及羧基、磺基、膦酸基及磷酸基之鹽,
5a表示0~4之整數,
55a表示0~3之整數)
[Chemical 2]

(Wherein, R 1, R 2, R , R ', n and X in the general formula (A), the R 1, R 2, R, R', and n and X,
R 3 and R 4 represent a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms or carbon Heterocyclic group containing 2 to 20 atoms,
R 5 and R 55 each independently represent a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms or a carbon atom, respectively Heterocyclic group containing 2 to 20,
The alkyl, aryl, aralkyl, and methylene groups in the heterocyclic group represented by R 3 and R 4 and R 5 and R 55 may be substituted with a carbon-carbon double bond, -O-, -S- , -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO- O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR ''-,> P = O, -SS-, -SO 2- Or a combination thereof, R '' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
The hydrogen atoms in the alkyl group, aryl group, aralkyl group and heterocyclic group represented by R 3 and R 4 and R 5 and R 55 may be substituted with ethylenically unsaturated groups, halogen atoms, fluorenyl groups, and fluorenyl oxides. Group, substituted amino group, sulfoamido group, sulfoamido group, carboxyl group, cyano group, sulfo group, hydroxyl group, nitro group, mercapto group, fluorenimine group, carbamate group, sulfonamido group, phosphonic acid group, phosphoric acid And carboxyl, sulfo, phosphonic and phosphate salts,
5a represents an integer from 0 to 4,
55a represents an integer from 0 to 3)

上述化合物A之常壓下之10%重量減少溫度較佳為250℃以上。其原因在於上述化合物A成為揮散性較低之化合物。The 10% weight reduction temperature of the aforementioned compound A at normal pressure is preferably 250 ° C or higher. The reason for this is that the above-mentioned compound A is a compound having low volatility.

上述n較佳為2~10之整數。其原因在於上述化合物A成為400 nm附近之光之吸收性優異、揮散性較低之化合物。The above-mentioned n is preferably an integer of 2-10. The reason for this is that the above-mentioned compound A is a compound having excellent light absorptivity and low volatility around 400 nm.

上述X較佳為碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或該等基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-之基。其原因在於上述化合物A成為400 nm附近之光之吸收性優異、揮散性較低之化合物。The X is preferably an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a methylene group in these groups is substituted by -O-, -S-, -CO- , -COO-, -OCO-. The reason for this is that the above-mentioned compound A is a compound having excellent light absorptivity and low volatility around 400 nm.

較佳為上述R3 、R4 、R5 及R55 之至少1者為碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或者碳原子數2~20之含雜環基中之氫原子被取代為乙烯性不飽和基之基、或碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或者碳原子數2~20之含雜環基中之亞甲基被取代為碳-碳雙鍵之基。其原因在於上述化合物A成為揮散性較低之化合物。Preferably, at least one of R 3 , R 4 , R 5 and R 55 is an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, and an aralkyl group having 7 to 30 carbon atoms. Or a hydrogen atom in a heterocyclic group having 2 to 20 carbon atoms is substituted with an ethylenically unsaturated group, or an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, or a carbon atom An aralkyl group having 7 to 30 or a methylene group in a heterocyclic group having 2 to 20 carbon atoms is substituted with a carbon-carbon double bond group. The reason for this is that the above-mentioned compound A is a compound having low volatility.

上述化合物A較佳為滿足下述(1)或(2)者。
(1)為上述通式(A1)所表示之化合物,且n為2或3之整數,X為碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或該等基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-之基。
(2)為上述通式(A3)所表示之化合物,且n為1,R4 為碳原子數1~10之烷基或者該等基中之1個氫原子被取代為乙烯性不飽和基之基、或碳原子數1~40之烷基中之亞甲基被取代為-COO-或者-OCO-且基中之氫原子被取代為乙烯性不飽和基之基。
其原因在於:上述化合物A成為400 nm附近之光之吸收性優異、揮散性較低之化合物。
The compound A is preferably one that satisfies the following (1) or (2).
(1) is a compound represented by the general formula (A1), n is an integer of 2 or 3, X is an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or the The methylene group in the isopropyl group is substituted with a -O-, -S-, -CO-, -COO-, -OCO- group.
(2) is a compound represented by the above general formula (A3), and n is 1, and R 4 is an alkyl group having 1 to 10 carbon atoms or one hydrogen atom in these groups is substituted with an ethylenically unsaturated group The methylene group in the alkyl group or the alkyl group having 1 to 40 carbon atoms is substituted with -COO- or -OCO-, and the hydrogen atom in the group is substituted with an ethylenically unsaturated group.
The reason is that the above-mentioned compound A is a compound having excellent light absorptivity and low volatility around 400 nm.

上述化合物A於250 nm以上、600 nm以下之範圍中之最大吸收波長較佳為350 nm以上且420 nm以下。其原因在於上述化合物A成為400 nm附近之光之吸收性更優異者。The maximum absorption wavelength of the compound A in a range of 250 nm to 600 nm is preferably 350 nm to 420 nm. The reason for this is that the above-mentioned compound A is more excellent in light absorption in the vicinity of 400 nm.

本發明提供一種光吸收劑,其特徵在於包含上述化合物A。藉由包含上述化合物A,該光吸收劑成為400 nm附近之光之吸收性更優異者。The present invention provides a light absorber, which comprises the above-mentioned compound A. By including the above-mentioned compound A, the light absorber becomes more excellent in the absorbance of light in the vicinity of 400 nm.

本發明提供一種組合物,其特徵在於包含上述化合物A、及樹脂。藉由包含上述化合物A,該組合物成為400 nm附近之光之吸收性更優異者。The present invention provides a composition comprising the above-mentioned compound A and a resin. By including the above-mentioned compound A, the composition becomes a more excellent absorber of light in the vicinity of 400 nm.

本發明提供一種光學濾光器,其特徵在於具有包含上述化合物A之光吸收層。藉由上述光吸收層包含上述化合物A,該光學濾光器成為400 nm附近之光之吸收性更優異者。The present invention provides an optical filter having a light absorbing layer containing the compound A described above. When the light absorbing layer contains the compound A, the optical filter becomes more excellent in light absorption around 400 nm.

本發明係關於一種化合物、光吸收劑、組合物及光學濾光器。
以下,針對本發明之化合物、光吸收劑、組合物及光學濾光器詳細地進行說明。
The invention relates to a compound, a light absorber, a composition and an optical filter.
Hereinafter, the compound, the light absorber, the composition, and the optical filter of the present invention will be described in detail.

A.化合物
首先,針對本發明之化合物進行說明。
本發明之化合物之特徵在於以上述通式(A)表示。
A. Compound First, the compound of the present invention will be described.
The compound of the present invention is characterized by being represented by the general formula (A).

本發明之化合物由於具有上述特定之結構,即於吲哚環上鍵結有氰基乙烯基(-CR2 =C(CN)R1 )之結構,故而400 nm附近之光之吸收性優異。關於因具有上述特定之結構而成為400 nm附近之光之吸收性優異者之原因,並不明確,推測如下。Since the compound of the present invention has the above-mentioned specific structure, that is, a structure in which a cyanovinyl group (-CR 2 = C (CN) R 1 ) is bonded to an indole ring, it has excellent light absorptivity near 400 nm. The reason why the light absorption near 400 nm is excellent due to the above-mentioned specific structure is not clear, but it is estimated as follows.

關於吲哚環,若為單獨成分,則於250 nm~300 nm具有最大吸收波長。藉由向其中導入氰基乙烯基,而共軛系變長,產生最大吸收波長之長波長位移。其結果為,能夠吸收400 nm附近之光。又,上述化合物A可使用二氰基乙烯基作為氰基乙烯基。其結果為,上述化合物A容易於400 nm附近、尤其是350 nm以上且420 nm以下顯示出陡峭之吸收峰。根據此種情況,認為上述化合物A會藉由具有上述特定之結構而成為400 nm附近之光之吸收性優異者。The indole ring has a maximum absorption wavelength from 250 nm to 300 nm if it is a separate component. By introducing a cyanovinyl group therein, the conjugated system becomes long, and a long wavelength shift of the maximum absorption wavelength occurs. As a result, light in the vicinity of 400 nm can be absorbed. Moreover, as said compound A, a dicyanovinyl group can be used as a cyanovinyl group. As a result, it is easy for the compound A to show a steep absorption peak near 400 nm, especially from 350 nm to 420 nm. In this case, it is considered that the compound A is excellent in light absorption around 400 nm by having the specific structure described above.

包含上述化合物A之光學濾光器藉由化合物A之如上述之特性,成為能夠穩定地吸收特定之光者。因此,該光學濾光器例如在與有機電致發光元件一起使用之情形時,能夠有效地抑制有機EL元件之劣化。The optical filter containing the compound A is capable of stably absorbing specific light due to the characteristics of the compound A as described above. Therefore, when the optical filter is used together with an organic electroluminescence element, for example, it is possible to effectively suppress deterioration of the organic EL element.

以下,針對本發明之化合物詳細地進行說明。
本發明之化合物係上述通式(A)所表示者,於上述吲哚環Ar上直接鍵結有氰基乙烯基(-CR2 =C(CN)R1 )及n價基X。作為鍵結位置,只要為氰基乙烯基可鍵結之部位,則無限制,較佳為下述式(a1)中「**」所表示之吲哚環之第3位之位置。其原因在於:藉由為該鍵結位置,上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:上述化合物A成為容易合成者。
Hereinafter, the compound of this invention is demonstrated in detail.
The compound of the present invention is represented by the general formula (A), and a cyanovinyl group (-CR 2 = C (CN) R 1 ) and an n-valent group X are directly bonded to the indole ring Ar. The bonding position is not limited as long as it is a position where the cyanovinyl group can be bonded, and it is preferably the third position of the indole ring represented by "**" in the following formula (a1). The reason for this is that by being the bonding position, the above-mentioned compound A becomes an excellent absorber of light around 400 nm. The reason is that the above compound A becomes an easy synthesizer.

[化3]
[Chemical 3]

上述吲哚環Ar係與氰基乙烯基及n價基X直接鍵結,但除該等基所鍵結之部位以外之氫原子亦可經取代基取代。The aforementioned indole ring Ar is directly bonded to a cyanovinyl group and an n-valent group X, but hydrogen atoms other than the sites to which these groups are bonded may be substituted with a substituent.

上述化合物A於n為2以上之情形時,與n價基X之鍵結位置之種類可為2種以上,但較佳為1種。其原因在於:上述化合物A成為容易合成者。所謂上述化合物A中之與n價基X之鍵結位置之種類為2種以上,意指如下情況等:例如於n為2之情形時,2價基X與一個吲哚環Ar在第1位之位置上鍵結,與另一個吲哚環Ar在第2位之位置上鍵結。又,所謂上述化合物A之與n價基X之鍵結位置之種類為1種,意指如下情況等:例如於n為2之情形時,2價基X與兩個吲哚環Ar分別在第1位之位置上鍵結。In the case where n is 2 or more, the number of types of the bonding positions with the n-valent group X may be two or more, but one is preferable. The reason is that the above-mentioned compound A becomes an easy synthesizer. The above-mentioned compound A has two or more types of bonding positions with the n-valent group X, which means that, for example, when n is 2, the divalent group X and an indole ring Ar are in the first position. It is bonded to the position of the second position and is bonded to the position of the second indole ring Ar at the second position. The type of the bonding position between the compound A and the n-valent group X is one, which means that, for example, when n is 2, the divalent group X and the two indole rings Ar are respectively Bonded at the first position.

關於上述化合物A,更具體而言,較佳為上述通式(A1)、(A2)或(A3)所表示之化合物(以下,有時分別稱為化合物A1、化合物A2及化合物A3)。其中,上述化合物A更佳為化合物A1。其原因在於:化合物A1藉由與n價基X之鍵結位置為上述吲哚環Ar之第1位之位置,而400 nm附近之光之吸收性優異。又,其原因在於:化合物A1容易合成。The compound A is more specifically a compound represented by the general formula (A1), (A2), or (A3) (hereinafter, sometimes referred to as a compound A1, a compound A2, and a compound A3). Among them, the compound A is more preferably a compound A1. The reason is that the compound A1 is excellent in the absorbance of light near 400 nm because the bonding position with the n-valent group X is the first position of the indole ring Ar. The reason is that the compound A1 is easy to synthesize.

化合物A2係與n價基X之鍵結位置為上述吲哚環Ar之第2位之位置之例,化合物A3係與n價基X之鍵結位置為第4位~第7位之例。又,化合物A1~A3係與n價基X之鍵結位置之種類為1種之例。The compound A2 is an example in which the bonding position with the n-valent group X is the position at the second position of the indole ring Ar, and the compound A3 is the example with the bonding position in the n-valent group X at positions 4 to 7. In addition, the compounds A1 to A3 are examples in which the type of the bonding position to the n-valent group X is one.

作為R、R'、R2 、R3 、R4 、R5 及R55 所表示之碳原子數1~40之烷基,可列舉甲基、乙基、丙基、異丙基、丁基、第二丁基、第三丁基、異丁基、戊基、異戊基、第三戊基、環戊基、己基、2-己基、3-己基、環己基、4-甲基環己基、庚基、2-庚基、3-庚基、異庚基、第三庚基、1-辛基、異辛基、第三辛基及金剛烷基等。Examples of the alkyl group having 1 to 40 carbon atoms represented by R, R ', R 2 , R 3 , R 4 , R 5 and R 55 include methyl, ethyl, propyl, isopropyl, and butyl , Second butyl, third butyl, isobutyl, pentyl, isopentyl, third pentyl, cyclopentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 4-methylcyclohexyl , Heptyl, 2-heptyl, 3-heptyl, isoheptyl, third heptyl, 1-octyl, isooctyl, third octyl, adamantyl and the like.

作為R、R'、R2 、R3 、R4 、R5 及R55 所表示之碳原子數6~30之芳基,可列舉苯基、萘基及蒽基等。Examples of the aryl group having 6 to 30 carbon atoms represented by R, R ′, R 2 , R 3 , R 4 , R 5 and R 55 include a phenyl group, a naphthyl group and an anthryl group.

作為R、R'、R2 、R3 、R4 、R5 及R55 所表示之碳原子數7~30之芳烷基,可列舉苄基、茀基、茚基及9-茀基甲基等。Examples of the aralkyl group having 7 to 30 carbon atoms represented by R, R ′, R 2 , R 3 , R 4 , R 5 and R 55 include benzyl, fluorenyl, indenyl and 9-fluorenylmethyl Base etc.

作為R、R'、R2 、R3 、R4 、R5 及R55 所表示之碳原子數2~20之含雜環基,可列舉吡啶基、嘧啶基、嗒基、哌啶基、吡喃基、吡唑基、三基、吡咯基、喹啉基、異喹啉基、咪唑基、苯并咪唑基、三唑基、呋喃基(furyl)、呋喃基(furanyl)、苯并呋喃基、噻吩基(thienyl)、苯硫基(thiophenyl)、苯并噻吩基、噻二唑基、噻唑基、苯并噻唑基、㗁唑基、苯并㗁唑基、異噻唑基、異㗁唑基、吲哚基、2-吡咯啶酮-1-基、2-哌啶酮-1-基、2,4-二氧基咪唑啶-3-基及2,4-二氧基㗁唑啶-3-基等。Examples of the heterocyclic group having 2 to 20 carbon atoms represented by R, R ', R 2 , R 3 , R 4 , R 5 and R 55 include pyridyl, pyrimidinyl, daphthyl, piperidinyl, Pyranyl, pyrazolyl, triyl, pyrrolyl, quinolinyl, isoquinolinyl, imidazolyl, benzimidazolyl, triazolyl, furyl, furanyl, benzofuran , Thienyl, thiophenyl, benzothienyl, thiadiazolyl, thiazolyl, benzothiazolyl, oxazolyl, benzoxazolyl, isothiazolyl, isoxazolyl Base, indolyl, 2-pyrrolidinone-1-yl, 2-piperidone-1-yl, 2,4-dioxyimidazol-3-yl, and 2,4-dioxyoxazolidine -3-yl, etc.

作為R2 、R3 、R4 、R5 及R55 所表示之鹵素原子,可列舉氟、氯、溴及碘等。Examples of the halogen atom represented by R 2 , R 3 , R 4 , R 5, and R 55 include fluorine, chlorine, bromine, and iodine.

R、R'、R2 、R3 、R4 、R5 及R55 所表示之烷基、芳基、芳烷基及含雜環基中之亞甲基可被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR''-、>P=O、-S-S-、-SO2 -或該等之組合。R, R ', R 2 , R 3 , R 4 , R 5 and R 55 represented by the alkyl, aryl, aralkyl and heterocyclic methylene groups may be substituted with carbon-carbon double bonds , -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO- S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR ''-,> P = O, -SS-, -SO 2 -or a combination of these.

即,R、R'、R2 、R3 、R4 、R5 及R55 可為烷基、芳基、芳烷基及含雜環基中之亞甲基被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR''-、>P=O、-S-S-、-SO2 -或該等之組合而成之基。That is, R, R ', R 2 , R 3 , R 4 , R 5 and R 55 may be an alkyl group, an aryl group, an aralkyl group, and a methylene group in a heterocyclic group is substituted with a carbon-carbon double bond , -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO- S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR ''-,> P = O, -SS-, -SO 2 -or a combination thereof.

上述R''表示氫原子或碳原子數1~8之烷基,作為碳原子數1~8之烷基,可列舉作為R2 等所例示者之中滿足特定之碳原子數者。
作為上述碳-碳雙鍵,更具體而言,可列舉-CH=CH-、-C(CH3 )=CH-、-C(CH3 )=C(CH3 )-等。
The above-mentioned "R" represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. Examples of the alkyl group having 1 to 8 carbon atoms include those satisfying a specific number of carbon atoms among those exemplified by R 2 and the like.
Specific examples of the carbon-carbon double bond include -CH = CH-, -C (CH 3 ) = CH-, -C (CH 3 ) = C (CH 3 )-, and the like.

R、R'、R2 、R3 、R4 、R5 及R55 所表示之烷基、芳基、芳烷基及含雜環基中之亞甲基被上述之碳-碳雙鍵等取代的數量並不限定於1,亦可為2以上。R, R ', R 2 , R 3 , R 4 , R 5 and R 55 represent alkyl, aryl, aralkyl and heterocyclic group-containing methylene groups by the above-mentioned carbon-carbon double bonds, etc. The number of substitutions is not limited to one, and may be two or more.

於本發明中,關於基之碳原子數,於基中之亞甲基被取代為上述碳-碳雙鍵等之情形時,係規定其取代後之基之碳原子數。例如,本說明書中,於碳原子數1~40之烷基中之亞甲基被取代為上述碳-碳雙鍵等之情形時,該「碳原子數1~40」係指亞甲基被取代後之碳原子數,並非指亞甲基被取代之前之碳原子數。因此,例如如下文所述之化合物(41)之R1 般,丙基中之1個亞甲基被取代為-CO-O-而成之基的碳原子數成為3。In the present invention, regarding the number of carbon atoms of the group, when the methylene group in the group is substituted with the above carbon-carbon double bond, etc., the number of carbon atoms of the substituted group is specified. For example, in the present specification, when a methylene group in an alkyl group having 1 to 40 carbon atoms is replaced with the above carbon-carbon double bond, etc., the "carbon number 1 to 40" means that the methylene group is replaced by The number of carbon atoms after substitution does not refer to the number of carbon atoms before the methylene group is substituted. Therefore, for example, as in R 1 of the compound (41) described below, the number of carbon atoms in a group in which one methylene group in a propyl group is substituted with -CO-O- is three.

R、R'、R2 、R3 、R4 、R5 及R55 所表示之烷基、芳基、芳烷基及含雜環基可具有取代基。上述化合物A只要無特別說明,則包含不具有取代基者及具有取代基者。The alkyl group, aryl group, aralkyl group, and heterocyclic group represented by R, R ′, R 2 , R 3 , R 4 , R 5, and R 55 may have a substituent. The compound A includes those having no substituent and those having a substituent unless otherwise specified.

R、R'、R2 、R3 、R4 、R5 及R55 所表示之烷基、芳基、芳烷基及含雜環基中之氫原子可被取代為乙烯基、烯丙基、丙烯醯基及甲基丙烯醯基等乙烯性不飽和基;氟、氯、溴及碘等鹵素原子;乙醯基、2-氯乙醯基、丙醯基、辛醯基、丙烯醯基、甲基丙烯醯基、苯基羰基(苯甲醯基)、酞醯基、4-三氟甲基苯甲醯基、三甲基乙醯基、鄰羥苯甲醯基、草醯基、硬脂醯基、甲氧基羰基、乙氧基羰基、第三丁氧基羰基、正十八烷氧基羰基及胺甲醯基等醯基;乙醯氧基及苯甲醯氧基等醯氧基;胺基、乙基胺基、二甲基胺基、二乙基胺基、丁基胺基、環戊基胺基、2-乙基己基胺基、十二烷基胺基、苯胺基、氯苯基胺基、甲苯胺基、甲氧苯胺、N-甲基-苯胺基、二苯基胺基、萘基胺基、2-吡啶基胺基、甲氧基羰基胺基、苯氧基羰基胺基、乙醯基胺基、苯甲醯基胺基、甲醯基胺基、三甲基乙醯基胺基、月桂醯基胺基、胺甲醯基胺基、N,N-二甲基胺基羰基胺基、N,N-二乙基胺基羰基胺基、啉基羰基胺基、甲氧基羰基胺基、乙氧基羰基胺基、第三丁氧基羰基胺基、正十八烷氧基羰基胺基、N-甲基-甲氧基羰基胺基、苯氧基羰基胺基、胺磺醯基胺基、N,N-二甲基胺基磺醯基胺基、甲基磺醯基胺基、丁基磺醯基胺基及苯基磺醯基胺基等取代胺基;磺醯胺基、磺醯基、羧基、氰基、磺基、羥基、硝基、巰基、醯亞胺基、胺甲醯基、磺醯胺基、膦酸基、磷酸基、以及羧基、磺基、膦酸基及磷酸基之鹽等。The hydrogen atom in the alkyl group, aryl group, aralkyl group and heterocyclic group represented by R, R ', R 2 , R 3 , R 4 , R 5 and R 55 may be substituted with vinyl, allyl , Ethylenically unsaturated groups such as propylene, methacryl and methacryl; halogen atoms such as fluorine, chlorine, bromine, and iodine; ethenyl, 2-chloroethyl, propyl, octyl, acryl, and acryl Propylene amidino, phenylcarbonyl (benzylidene), phthalofluorenyl, 4-trifluoromethylbenzyl, trimethylethylamyl, o-hydroxybenzyl, oxalyl, stearyl Fluorenyl groups such as fluorenyl, methoxycarbonyl, ethoxycarbonyl, tert-butoxycarbonyl, n-octadecyloxycarbonyl, and carbamoyl; fluorenyl groups such as ethanyloxy and benzyloxy ; Amino, ethylamino, dimethylamino, diethylamino, butylamino, cyclopentylamino, 2-ethylhexylamino, dodecylamino, aniline, Chlorophenylamine, toluidine, methoxyaniline, N-methyl-aniline, diphenylamino, naphthylamine, 2-pyridylamino, methoxycarbonylamino, phenoxy Carbonylamino, ethylamino, benzamidoamino, methylamido Group, trimethylethylamino, laurylamino, aminomethylamino, N, N-dimethylaminocarbonylamino, N, N-diethylaminocarbonylamino, Phenylcarbonylamino, methoxycarbonylamino, ethoxycarbonylamino, tert-butoxycarbonylamino, n-octadecyloxycarbonylamino, N-methyl-methoxycarbonylamino , Phenoxycarbonylamino, sulfamoylamino, N, N-dimethylaminosulfoamidoamino, methylsulfoamidoamino, butylsulfoamidoamine, and phenylsulfoamido Substituted amino groups such as sulfonylamino groups; sulfonamido, sulfofluorenyl, carboxyl, cyano, sulfo, hydroxyl, nitro, thiol, fluorenimine, carbamoyl, sulfonamido, phosphonic acid groups , Phosphate, and salts of carboxyl, sulfo, phosphonic and phosphate groups.

即,R、R'、R2 、R3 、R4 、R5 及R55 可為烷基、芳基、芳烷基及含雜環基中之氫原子被取代為乙烯性不飽和基、鹵素原子、醯基、醯氧基、取代胺基、磺醯胺基、磺醯基、羧基、氰基、磺基、羥基、硝基、巰基、醯亞胺基、胺甲醯基、磺醯胺基、膦酸基、磷酸基、或羧基、磺基、膦酸基或者磷酸基之鹽之基。That is, R, R ', R 2 , R 3 , R 4 , R 5 and R 55 may be an alkyl group, an aryl group, an aralkyl group, and a hydrogen atom in a heterocyclic group may be substituted with an ethylenically unsaturated group, Halogen atom, fluorenyl, fluorenyloxy, substituted amino, sulfonamido, sulfonamido, carboxyl, cyano, sulfo, hydroxyl, nitro, mercapto, fluorenimine, carbamoyl, sulfamo Amino, phosphonic, phosphoric, or carboxy, sulfo, phosphonic, or phosphate salts.

R、R'、R2 、R3 、R4 、R5 及R55 所表示之烷基、芳基、芳烷基及含雜環基中之氫原子經取代基取代之數量不限定於1,亦可為2以上。The number of the alkyl group, aryl group, aralkyl group, and heterocyclic group-containing hydrogen atom substituted with a substituent group represented by R, R ', R 2 , R 3 , R 4 , R 5 and R 55 is not limited to 1 It can also be 2 or more.

於本發明中,關於基之碳原子數,於基中之氫原子經取代基取代之情形時,係規定其取代後之基之碳原子數。例如,於上述碳原子數1~40之烷基之氫原子經取代之情形時,碳原子數1~40係指氫原子經取代後之碳原子數,並非指氫原子經取代前之碳原子數。因此,例如如下文所述之化合物(40)之R4 般,丙基之末端之1個氫原子被取代為-CH=CH2 而成之基的碳原子數成為5。又,下文所述之化合物(103)及化合物(104)之R4 之碳原子數分別成為13及17。In the present invention, regarding the number of carbon atoms of a radical, when a hydrogen atom in the radical is substituted with a substituent, the number of carbon atoms of the radical after the substitution is specified. For example, in the case where the hydrogen atom of the alkyl group having 1 to 40 carbon atoms is substituted, the carbon number 1 to 40 refers to the number of carbon atoms after the hydrogen atom is substituted, not the carbon atom before the hydrogen atom is substituted. number. Therefore, for example, as in R 4 of the compound (40) described below, the number of carbon atoms in a group in which one hydrogen atom at the terminal of the propyl group is substituted with -CH = CH 2 is five. The number of carbon atoms of R 4 in the compound (103) and the compound (104) described below is 13 and 17, respectively.

上述R1 係表示氰基、-COOR、-OCOR、-CONHR、-NHCOR、-COONHR、-NHCOOR、-COR、-SO2 R、-SOR、-SO2 NRR'、鹵素原子、硝基或膦醯基者,其中較佳為氰基、-COOR,尤佳為氰基。其原因在於:藉由上述R1 為該等基,上述化合物A成為400 nm附近之光之吸收性優異者。進而,其原因在於:上述化合物A成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡優異者。The above R 1 represents cyano, -COOR, -OCOR, -CONHR, -NHCOR, -COONHR, -NHCOOR, -COR, -SO 2 R, -SOR, -SO 2 NRR ', halogen atom, nitro or phosphine Among the fluorenyl groups, cyano and -COOR are preferred, and cyano is particularly preferred. The reason for this is that, with the above-mentioned R 1 being such a group, the above-mentioned compound A becomes an excellent absorber of light around 400 nm. Furthermore, the reason is that the above-mentioned compound A is excellent in the balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm.

上述R及R'係分別獨立表示氫原子、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基者,較佳為碳原子數1~40之烷基、碳原子數7~30之芳烷基,其中較佳為碳原子數1~40之烷基,尤佳為碳原子數1~10之烷基,其中尤佳為甲基、乙基、丙基等碳原子數1~5之烷基。其原因在於:藉由上述R及R'為該等基,上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:上述化合物A成為容易合成者。進而,其原因在於:上述化合物A成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡優異者。The above-mentioned R and R 'independently represent a hydrogen atom, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms or 2 to 20 carbon atoms, respectively. Those having a heterocyclic group are preferably an alkyl group having 1 to 40 carbon atoms and an aralkyl group having 7 to 30 carbon atoms. Among them, an alkyl group having 1 to 40 carbon atoms is preferred, and a carbon number is particularly preferred. The alkyl group having 1 to 10 is particularly preferably an alkyl group having 1 to 5 carbon atoms such as methyl, ethyl, and propyl. The reason for this is that by using R and R ′ as these groups, the compound A is excellent in light absorption around 400 nm. The reason is that the above compound A becomes an easy synthesizer. Furthermore, the reason is that the above-mentioned compound A is excellent in the balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm.

上述R及R'較佳為分別獨立為碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基及碳原子數2~20之含雜環基中之氫原子被取代為乙烯性不飽和基之基、或碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基中之亞甲基被取代為碳-碳雙鍵之基。其中,較佳為碳原子數1~40之烷基中之氫原子被取代為乙烯性不飽和基之基、或上述碳原子數1~40之烷基中之亞甲基被取代為碳-碳雙鍵之基,尤佳為碳原子數1~10之烷基中之氫原子被取代為乙烯性不飽和基之基、或上述碳原子數1~10之烷基中之亞甲基被取代為碳-碳雙鍵之基。其中尤佳為碳原子數3~7之烷基中之氫原子被取代為乙烯性不飽和基之基、或上述碳原子數3~7之烷基中之亞甲基被取代為碳-碳雙鍵之基。其原因在於:藉由上述R等為上述基,上述化合物A成為揮散性較低之化合物。又,其原因在於:上述化合物A成為容易合成者。The above-mentioned R and R ′ are each preferably an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms and 2 to 20 carbon atoms. A hydrogen atom in a heterocyclic group is substituted with an ethylenically unsaturated group, or an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or The methylene group in the heterocyclic group having 2 to 20 carbon atoms is substituted with a carbon-carbon double bond group. Among them, it is preferable that a hydrogen atom in an alkyl group having 1 to 40 carbon atoms is substituted with an ethylenically unsaturated group, or a methylene group in the alkyl group having 1 to 40 carbon atoms is substituted with carbon- The carbon double bond group is particularly preferably a group in which a hydrogen atom in an alkyl group having 1 to 10 carbon atoms is replaced with an ethylenically unsaturated group, or a methylene group in the alkyl group having 1 to 10 carbon atoms is substituted. Substituted by a carbon-carbon double bond. Among them, it is particularly preferred that a hydrogen atom in an alkyl group having 3 to 7 carbon atoms is replaced with an ethylenically unsaturated group, or a methylene group in the above alkyl group having 3 to 7 carbon atoms is replaced with a carbon-carbon The base of double bonds. The reason for this is that, when R and the like are the above-mentioned groups, the above-mentioned compound A becomes a compound having low volatility. The reason is that the above compound A becomes an easy synthesizer.

上述R2 係表示氫原子、鹵素原子、氰基、硝基、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基者,較佳為氫原子、氰基或碳原子數1~40之烷基,其中,較佳為氫原子。其原因在於:藉由上述R2 為該等基,上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:上述化合物A成為容易合成者。The R 2 is a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a carbon atom. The heterocyclic group containing 2 to 20 is preferably a hydrogen atom, a cyano group, or an alkyl group having 1 to 40 carbon atoms, and among these, a hydrogen atom is preferred. The reason is that, with the above R 2 being such a group, the above-mentioned compound A becomes an excellent absorber of light around 400 nm. The reason is that the above compound A becomes an easy synthesizer.

上述R3 及R4 係分別獨立表示氫原子、鹵素原子、氰基、硝基、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基者,較佳為氫原子、碳原子數1~40之烷基。其原因在於:上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:上述化合物A成為揮散性較低之化合物,進而,成為容易合成者。
於本發明中,於R3 為不具有下文所述之聚合性基之基之情形時,較佳為氫原子、碳原子數1~40之烷基或碳原子數6~30之芳基,其中,較佳為氫原子、碳原子數1~10之烷基或碳原子數6~15之芳基,尤佳為氫原子、碳原子數1~5之烷基或碳原子數6~12之芳基。其原因在於:上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:上述化合物A成為揮散性較低之化合物,進而,成為容易合成者。又,就使400 nm附近之光之吸收性、低揮散性及合成容易性之平衡優異之觀點而言,較佳為R3 為氫原子。
又,於本發明中,於R4 為不具有下文所述之聚合性基之基之情形時,較佳為碳原子數1~40之烷基,其中,較佳為碳原子數1~20之烷基,尤佳為碳原子數1~5之烷基。其原因在於:藉由上述R4 為上述基,上述化合物A成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡優異者。
The above R 3 and R 4 each independently represent a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, and an aromatic group having 7 to 30 carbon atoms. The alkyl group or the heterocyclic group containing 2 to 20 carbon atoms is preferably a hydrogen atom or an alkyl group having 1 to 40 carbon atoms. The reason is that the above-mentioned compound A is excellent in light absorptivity near 400 nm. The reason is that the above-mentioned compound A is a compound having low volatility, and further, it is easy to synthesize.
In the present invention, when R 3 is a group without a polymerizable group described below, a hydrogen atom, an alkyl group having 1 to 40 carbon atoms, or an aryl group having 6 to 30 carbon atoms is preferred, Among them, a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 15 carbon atoms is preferred, and a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or 6 to 12 carbon atoms is particularly preferred. Of aryl. The reason is that the above-mentioned compound A is excellent in light absorptivity near 400 nm. The reason is that the above-mentioned compound A is a compound having low volatility, and further, it is easy to synthesize. In addition, from the viewpoint of achieving an excellent balance of the light absorptivity, low volatility, and ease of synthesis in the vicinity of 400 nm, R 3 is preferably a hydrogen atom.
In addition, in the present invention, when R 4 is a group having no polymerizable group described below, an alkyl group having 1 to 40 carbon atoms is preferred, and among them, 1 to 20 carbon atoms are preferred. The alkyl group is particularly preferably an alkyl group having 1 to 5 carbon atoms. The reason is that, with the R 4 being the above-mentioned group, the compound A is excellent in a balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm.

上述R5 及R55 係分別獨立表示鹵素原子、氰基、硝基、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基者,較佳為氫原子、碳原子數1~40之烷基,尤佳為氫原子。其原因在於:成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡優異者。上述R5 及R55 於存在複數個之情形時,可相同亦可不同。The R 5 and R 55 each independently represent a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or The heterocyclic group containing 2 to 20 carbon atoms is preferably a hydrogen atom and an alkyl group having 1 to 40 carbon atoms, and particularly preferably a hydrogen atom. The reason is that it is excellent in the balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm. When plural R 5 and R 55 are present, they may be the same or different.

其原因在於:藉由上述R3 、R4 、R5 及R55 為該等基,上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:上述化合物A成為容易合成者。進而,其原因在於:上述化合物A成為揮散性較低之化合物。The reason is that, with the above-mentioned R 3 , R 4 , R 5 and R 55 as these groups, the above-mentioned compound A becomes an excellent absorber of light near 400 nm. The reason is that the above compound A becomes an easy synthesizer. Furthermore, the reason is that the above-mentioned compound A is a compound having low volatility.

上述化合物A較佳為上述R3 、R4 、R5 及R55 之至少1者為具有聚合性基者。藉此,上述化合物A成為揮散性較低之化合物。更具體而言,其原因在於:上述化合物A例如藉由化合物A彼此之聚合能夠多聚化,藉由與丙烯酸酯單體等聚合性化合物之聚合等能夠高分子量化,結果,成為揮散性較低之化合物。作為上述聚合性基,只要為利用聚合性基彼此進行聚合能夠高分子量化者即可,例如可列舉自由基聚合性基、陽離子聚合性基、陰離子聚合性基等。
於本發明中,較佳為僅上述R3 、R4 、R5 及R55 之任一者為具有聚合性基者,其中,較佳為僅R4 具有聚合性基者。其原因在於:上述化合物A成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡優異者。
The compound A is preferably one in which at least one of R 3 , R 4 , R 5, and R 55 is a polymerizable group. Thereby, the said compound A becomes a compound with low volatility. More specifically, the reason is that the aforementioned compound A can be polymerized by, for example, polymerizing the compounds A with each other, and can be polymerized by polymerizing with a polymerizable compound such as an acrylate monomer. As a result, the volatility is relatively low. Low compounds. The polymerizable group may be any polymer that can be polymerized by polymerizing the polymerizable groups with each other, and examples thereof include a radical polymerizable group, a cation polymerizable group, and an anionic polymerizable group.
In the present invention, it is preferred that only one of R 3 , R 4 , R 5, and R 55 be a polymerizable group, and among them, only R 4 has a polymerizable group. The reason is that the above-mentioned compound A is excellent in the balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm.

作為上述自由基聚合性基,可列舉(甲基)丙烯醯基、乙烯基等乙烯性不飽和基等。又,作為上述自由基聚合性基,亦可使用取代亞甲基之上述碳-碳雙鍵。作為上述陽離子聚合性基,可列舉環氧基、氧雜環丁烷基、乙烯醚基等。作為上述陰離子聚合性基,可列舉環氧基、內酯基等。作為上述聚合性基,其中,較佳為乙烯性不飽和基、碳-碳雙鍵等自由基聚合性基。其原因在於:上述化合物A容易製成揮散性較低之化合物。Examples of the radically polymerizable group include a (meth) acrylfluorenyl group and an ethylenically unsaturated group such as a vinyl group. Moreover, as said radically polymerizable group, you may use the said carbon-carbon double bond which substituted methylene. Examples of the cationically polymerizable group include an epoxy group, an oxetanyl group, and a vinyl ether group. Examples of the anionic polymerizable group include an epoxy group and a lactone group. As said polymerizable group, a radically polymerizable group, such as an ethylenically unsaturated group and a carbon-carbon double bond, is preferable. The reason is that the above-mentioned compound A is easily made into a compound having low volatility.

上述化合物A更具體而言較佳為上述R3 、R4 、R5 及R55 之至少1者為碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基、或碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或者碳原子數2~20之含雜環基中之氫原子被取代為乙烯性不飽和基之基、或上述碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或者碳原子數2~20之含雜環基中之亞甲基被取代為碳-碳雙鍵之基,其中,較佳為上述R3 、R4 、R5 及R55 之至少1者為碳原子數1~40之烷基、或碳原子數1~40之烷基中之氫原子被取代為乙烯性不飽和基之基、或碳原子數1~40之烷基中之亞甲基被取代為碳-碳雙鍵之基,尤佳為R4 為碳原子數1~40之烷基、或碳原子數1~40之烷基中之氫原子被取代為乙烯性不飽和基之基、或碳原子數1~40之烷基中之亞甲基被取代為碳-碳雙鍵之基,其中尤佳為R4 為碳原子數1~10之烷基、或碳原子數1~10之烷基中之氫原子被取代為乙烯性不飽和基之基、或碳原子數1~10之烷基中之亞甲基被取代為碳-碳雙鍵之基,較佳為R4 為碳原子數3~10之烷基、或碳原子數3~10之烷基中之1個氫原子被取代為乙烯性不飽和基之基、或碳原子數3~10之烷基中之1個亞甲基被取代為碳-碳雙鍵之基。其原因在於:藉由上述R3 等為上述基,上述化合物A成為揮散性較低之化合物。又,其原因在於:上述化合物A成為容易合成者。The compound A is more specifically preferably such that at least one of R 3 , R 4 , R 5, and R 55 is an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, and carbon number. Aryl groups of 7 to 30 or heterocyclic groups containing 2 to 20 carbon atoms, alkyl groups of 1 to 40 carbon atoms, aryl groups of 6 to 30 carbon atoms, and aralkyl groups of 7 to 30 carbon atoms Group or a hydrogen atom in a heterocyclic group containing 2 to 20 carbon atoms is substituted with an ethylenically unsaturated group, or the alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, An aralkyl group having 7 to 30 carbon atoms or a methylene group in a heterocyclic group having 2 to 20 carbon atoms is substituted with a carbon-carbon double bond group. Among them, the above-mentioned R 3 , R 4 , At least one of R 5 and R 55 is an alkyl group having 1 to 40 carbon atoms, or a hydrogen atom in an alkyl group having 1 to 40 carbon atoms is substituted with an ethylenically unsaturated group, or 1 carbon atom The methylene group in the alkyl group of ~ 40 is substituted with a carbon-carbon double bond group, and it is particularly preferred that R 4 is a hydrogen group in the alkyl group having 1 to 40 carbon atoms, or a hydrogen group in the alkyl group having 1 to 40 carbon atoms. Atoms substituted with ethylenically unsaturated groups, or 1 carbon atom The alkyl group in the 40-substituted methylene group is a carbon - carbon double bond group, wherein R 4 is particularly preferably an alkyl group having 1 to 10 carbon atoms, the carbon atoms or an alkyl group of 1 to 10 in the hydrogen A group in which an atom is substituted with an ethylenically unsaturated group, or a methylene group in an alkyl group having 1 to 10 carbon atoms is replaced with a carbon-carbon double bond group, preferably R 4 is 3 to 10 carbon atoms An alkyl group, or a hydrogen atom in an alkyl group having 3 to 10 carbon atoms is substituted with an ethylenically unsaturated group, or a methylene group in an alkyl group having 3 to 10 carbon atoms is substituted It is the base of carbon-carbon double bond. The reason for this is that the above compound A is a compound having a lower volatility when the above R 3 and the like are the above-mentioned groups. The reason is that the above compound A becomes an easy synthesizer.

於本發明中,於R4 為碳原子數1~40之烷基、或碳原子數1~40之烷基中之氫原子被取代為乙烯性不飽和基之基、或碳原子數1~40之烷基中之亞甲基被取代為碳-碳雙鍵之基的情形時,作為R4 ,亦較佳為碳原子數1~40之烷基中之2個以上氫原子被取代為乙烯性不飽和基之基、或上述碳原子數1~40之烷基中之2個以上亞甲基被取代為碳-碳雙鍵之基。其中,較佳為碳原子數5~25之烷基中之2個以上氫原子被取代為乙烯性不飽和基之基、或碳原子數5~25之烷基中之2個以上亞甲基被取代為碳-碳雙鍵之基,尤佳為碳原子數8~22之烷基中之2~5個氫原子被取代為乙烯性不飽和基之基、或碳原子數8~22之烷基中之2~5個亞甲基被取代為碳-碳雙鍵之基,尤佳為碳原子數10~20之烷基中之2~4個氫原子被取代為乙烯性不飽和基之基、或碳原子數10~20之烷基中之2~4個亞甲基被取代為碳-碳雙鍵之基。其原因在於:藉由上述R4 為上述基,上述化合物A成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡優異者。In the present invention, a hydrogen atom in which R 4 is an alkyl group having 1 to 40 carbon atoms, or an alkyl group having 1 to 40 carbon atoms is substituted with an ethylenically unsaturated group, or a carbon number of 1 to When the methylene group in the alkyl group of 40 is substituted with a carbon-carbon double bond group, as R 4 , it is also preferable that two or more hydrogen atoms in the alkyl group having 1 to 40 carbon atoms are substituted with A group having two or more methylene groups in the ethylenically unsaturated group or the alkyl group having 1 to 40 carbon atoms is substituted with a carbon-carbon double bond group. Among them, it is preferable that two or more hydrogen atoms in an alkyl group having 5 to 25 carbon atoms be substituted with an ethylenically unsaturated group or two or more methylene groups in an alkyl group having 5 to 25 carbon atoms. A group substituted with a carbon-carbon double bond, particularly preferably a group in which 2 to 5 hydrogen atoms in an alkyl group having 8 to 22 carbon atoms are replaced with an ethylenically unsaturated group, or an alkyl group having 8 to 22 carbon atoms 2 to 5 methylene groups in an alkyl group are substituted with a carbon-carbon double bond group, particularly preferably 2 to 4 hydrogen atoms in an alkyl group with 10 to 20 carbon atoms are substituted with an ethylenically unsaturated group A group having 2 to 4 methylene groups or an alkyl group having 10 to 20 carbon atoms is substituted with a carbon-carbon double bond group. The reason is that, with the R 4 being the above-mentioned group, the compound A is excellent in a balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm.

又,於R4 為碳原子數1~40之烷基中之2個以上氫原子被取代為乙烯性不飽和基之基、或上述碳原子數1~40之烷基中之2個以上亞甲基被取代為碳-碳雙鍵之基的情形時,較佳為進而該等基中之亞甲基分別獨立被取代為-COO-或-OCO-之基。其原因在於:藉由上述R4 為上述基,上述化合物A成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡優異者。In addition, in the case where R 4 is an alkyl group having 1 to 40 carbon atoms, two or more hydrogen atoms are substituted with an ethylenically unsaturated group, or two or more sub groups in the alkyl group having 1 to 40 carbon atoms. When a methyl group is substituted with a carbon-carbon double bond group, it is preferred that the methylene groups in these groups are independently substituted with a -COO- or -OCO- group. The reason is that, with the R 4 being the above-mentioned group, the compound A is excellent in a balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm.

上述碳原子數1~40之烷基中之亞甲基被取代為碳-碳雙鍵之基之碳數係指亞甲基被取代為碳-碳雙鍵後之碳原子數,並非指亞甲基被取代為碳-碳雙鍵之前之碳原子數。其他基中之亞甲基被取代之情形時亦相同。
又,上述碳原子數1~40之烷基中之氫原子經取代基取代之基之碳原子數係指氫原子經取代基取代後之碳原子數,並非指氫原子被取代為取代基之前之碳原子數。其他基中之氫原子經取代之情形時亦相同。
The carbon number of the methylene group in the above-mentioned alkyl group having 1 to 40 carbon atoms is replaced by a carbon-carbon double bond refers to the number of carbon atoms after the methylene group is replaced with a carbon-carbon double bond, and does not refer to the methylene group. The number of carbon atoms before the methyl group was replaced with a carbon-carbon double bond. The same applies to the case where the methylene group in the other group is substituted.
In addition, the number of carbon atoms of the hydrogen atom substituted by a substituent in the alkyl group having 1 to 40 carbon atoms refers to the number of carbon atoms after the hydrogen atom is substituted with the substituent, and does not mean that the hydrogen atom is substituted before the substituent. Of carbon atoms. The same applies to the case where a hydrogen atom in another group is substituted.

上述n為1~10之整數,較佳為2~10之整數,其中較佳為2~6之整數,尤佳為2~4之整數。其原因在於:藉由上述n為上述範圍,上述化合物A成為400 nm附近之光之吸收性優異、揮散性較低之化合物。The aforementioned n is an integer of 1 to 10, preferably an integer of 2 to 10, of which an integer of 2 to 6 is preferred, and an integer of 2 to 4 is particularly preferred. The reason for this is that when n is in the above range, the compound A is a compound having excellent light absorptivity and low volatility around 400 nm.

上述5a表示0~4之整數,較佳為0或1之整數。
上述55a表示0~3之整數,較佳為0或1之整數。
其原因在於:藉由5a及55a為上述範圍,上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:上述化合物A成為容易合成者。
The above 5a represents an integer of 0 to 4, preferably an integer of 0 or 1.
The above 55a represents an integer of 0 to 3, preferably an integer of 0 or 1.
The reason is that when 5a and 55a are in the above range, the above-mentioned compound A becomes an excellent absorber of light near 400 nm. The reason is that the above compound A becomes an easy synthesizer.

上述通式(A)所表示之化合物A具有X所表示之n價基與n個包含吲哚環Ar及氰基乙烯基結構之特定之結構鍵結的結構。該n個特定之結構存在相互相同之情況,亦存在不同之情況。The compound A represented by the general formula (A) has a structure in which an n-valent group represented by X is bonded to n specific structures including an indole ring Ar and a cyanovinyl structure. The n specific structures may be the same or different from each other.

上述X表示n價基。
作為上述X,具體而言,可列舉直接鍵、氫原子、氮原子、氧原子、硫原子、磷原子、下述(II-a)或者(II-b)所表示之基、>C=O、>NR53 、-OR53 、-SR53 、-NR53 R54 或具有與n相同數目之價數之碳原子數1~120之脂肪族烴基、碳原子數6~35之含芳香環烴基或者碳原子數2~35之含雜環基。
The X represents an n-valent group.
Specific examples of the X include a direct bond, a hydrogen atom, a nitrogen atom, an oxygen atom, a sulfur atom, a phosphorus atom, a group represented by the following (II-a) or (II-b), and> C = O ,> NR 53 , -OR 53 , -SR 53 , -NR 53 R 54 or an aliphatic hydrocarbon group having 1 to 120 carbon atoms having the same number of valence as n, and an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms Or a heterocyclic group containing 2 to 35 carbon atoms.

上述R53 及R54 分別獨立表示氫原子、碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基。上述X、R53 及R54 所表示之脂肪族烴基、含芳香環烴基及含雜環基中之亞甲基亦可被取代為-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NH-CO-O-、-NR' -、-S-S-、-SO2 -、氮原子或該等之組合。供取代之亞甲基之數不限定於1個,亦可為2個以上。
即,上述X、R53 及R54 亦可為碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基中之亞甲基被取代為-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NH-CO-O-、-NR' -、-S-S-、-SO2 -、氮原子或該等之組合而成之基。
又,上述芳香環或雜環亦可與其他環進行縮合。
The R 53 and R 54 each independently represent a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a heterocyclic group containing 2 to 35 carbon atoms. The methylene groups in the aliphatic hydrocarbon group, the aromatic ring-containing hydrocarbon group and the heterocyclic group represented by the above X, R 53 and R 54 may be substituted with -O-, -S-, -CO-, -O-CO -, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S -, -CO-NH-, -NH-CO-, -NH-CO-O-, -NH-CO-O-, -NR ' -, -SS-, -SO 2- , nitrogen atom or the like combination. The number of substituted methylene groups is not limited to one, and may be two or more.
That is, the above-mentioned X, R 53 and R 54 may be one of an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or a heterocyclic group containing 2 to 35 carbon atoms. Methyl is substituted with -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO- , -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NH-CO-O- , -NR ' -, -SS-, -SO 2- , a nitrogen atom, or a combination thereof.
The aromatic ring or heterocyclic ring may be condensed with another ring.

於X為氮原子、磷原子或下述(II-a)或(II-b)所表示之鍵結基之情形時,n為3,於X為直接鍵、氧原子或硫原子、>C=O、-NH-CO-、-CO-NH-或>NR53 之情形時,n為2,於X為-OR53 、-SR53 或-NR53 R54 之情形時,n為1,X亦可與苯環一起形成環。When X is a nitrogen atom, a phosphorus atom, or a bonding group represented by the following (II-a) or (II-b), n is 3, and X is a direct bond, an oxygen atom or a sulfur atom, and> C = O, -NH-CO-, -CO-NH-, or> NR 53 , n is 2, and when X is -OR 53 , -SR 53, or -NR 53 R 54 , n is 1, X may also form a ring with a benzene ring.

[化4]

(*意指於*部分與鄰接之基鍵結)
[Chemical 4]

(* Means that the * part is bonded to the adjacent base)

關於上述X所表示之具有與n相同數目之價數之碳原子數1~120之脂肪族烴基,作為1價者,可列舉:甲基、乙基、丙基、異丙基、環丙基、丁基、第二丁基、第三丁基、異丁基、戊基、異戊基、第三戊基、環戊基、己基、2-己基、3-己基、環己基、聯環己基、1-甲基環己基、庚基、2-庚基、3-庚基、異庚基、第三庚基、正辛基、異辛基、第三辛基、2-乙基己基、壬基、異壬基及癸基等烷基;甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、第二丁氧基、第三丁氧基、異丁氧基、戊氧基、異戊氧基、第三戊氧基、己氧基、環己氧基、庚氧基、異庚氧基、第三庚氧基、正辛氧基、異辛氧基、第三辛氧基、2-乙基己氧基、壬氧基及癸氧基等烷氧基;甲硫基、乙硫基、丙硫基、異丙硫基、丁硫基、第二丁硫基、第三丁硫基、異丁硫基、戊硫基、異戊硫基、第三戊硫基、己硫基、環己硫基、庚硫基、異庚硫基、第三庚硫基、正辛硫基、異辛硫基、第三辛硫基及2-乙基己硫基等烷硫基;乙烯基、1-甲基乙烯基、2-甲基乙烯基、2-丙烯基、1-甲基-3-丙烯基、3-丁烯基、1-甲基-3-丁烯基、異丁烯基、3-戊烯基、4-己烯基、環己烯基、二環己烯基、庚烯基、辛烯基、癸烯基、十五碳烯基、二十碳烯基及二十三烯基等烯基;以及該等基之氫原子被取代為下文所述之取代基而成之基等。Regarding the aliphatic hydrocarbon group having 1 to 120 carbon atoms having the same number of valences as represented by X in the above X, the monovalent ones include methyl, ethyl, propyl, isopropyl, and cyclopropyl. , Butyl, second butyl, third butyl, isobutyl, pentyl, isopentyl, third pentyl, cyclopentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, bicyclohexyl , 1-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, isoheptyl, third heptyl, n-octyl, isooctyl, third octyl, 2-ethylhexyl, nonyl Alkyl groups such as alkyl, isononyl and decyl; methoxy, ethoxy, propoxy, isopropoxy, butoxy, second butoxy, third butoxy, isobutoxy, Pentyloxy, isopentyloxy, third pentyloxy, hexyloxy, cyclohexyloxy, heptyloxy, isoheptyloxy, third heptyloxy, n-octyloxy, isooctyloxy, Alkoxy groups such as trioctyloxy, 2-ethylhexyloxy, nonyloxy and decyloxy; methylthio, ethylthio, propylthio, isopropylthio, butylthio, second butylthio Base, third butylthio, isobutylthio, pentylthio, isopentylthio, third pentylthio Alkyl sulfides such as hexylthio, cyclohexylthio, heptylthio, isoheptylthio, third heptylthio, n-octylthio, isooctylthio, third octylthio and 2-ethylhexylthio Vinyl; 1-methylvinyl, 2-methylvinyl, 2-propenyl, 1-methyl-3-propenyl, 3-butenyl, 1-methyl-3-butenyl , Isobutenyl, 3-pentenyl, 4-hexenyl, cyclohexenyl, dicyclohexenyl, heptenyl, octenyl, decenyl, pentadecenyl, eicosenyl And alkenyl groups such as behenyl alkenyl; and groups in which a hydrogen atom of these groups is substituted with a substituent described below.

關於上述X所表示之具有與n相同數目之價數之碳原子數1~120之脂肪族烴基,作為2價者,可列舉自上述1價脂肪族烴基除去1個氫原子而成之基,具體而言,可列舉:亞甲基、伸乙基、伸丙基、伸丁基及丁基二基等伸烷基;上述伸烷基中之亞甲基被取代為-O-、-S-、-CO-O-、-O-CO-而成之基;乙二醇、丙二醇、丁二醇、戊二醇、己二醇等二醇基之殘基;乙二硫醇、丙二硫醇、丁二硫醇、戊二硫醇、己二硫醇等二硫醇基之殘基及該等基之氫原子被取代為下文所述之取代基而成之基等。Regarding the aliphatic hydrocarbon group having 1 to 120 carbon atoms having the same number of valences as represented by X in the above-mentioned X, as the divalent group, a group obtained by removing one hydrogen atom from the above-mentioned monovalent aliphatic hydrocarbon group, Specific examples include: alkylene groups such as methylene, ethylene, propyl, butyl, and butyldiyl; the methylene in the alkylene is substituted with -O-, -S -, -CO-O-, -O-CO-; residues of glycol groups such as ethylene glycol, propylene glycol, butanediol, pentanediol, and hexanediol; ethylenedithiol, propylene glycol Residues of dithiol groups such as thiol, butanethiol, glutar dithiol, hexamethylene dithiol, and the hydrogen atom of these groups are substituted with the substituents described below.

關於上述X所表示之具有與n相同數目之價數之碳原子數1~120之脂肪族烴基,作為3價者,可列舉自上述1價脂肪族烴基除去2個氫原子而成之基,例如可列舉次丙基及1,1,3-次丁基次丙基等次烷基;以及該等基之氫原子被取代為下文所述之取代基而成之基等。
作為3價者,不限定於如次烷基般自丙烷、丁烷等脂肪族烴中之1個碳原子除去3個氫原子而成之基,亦可列舉自脂肪族烴中之2個碳原子合計除去3個氫原子而成之基、自脂肪族烴中之不同之3個碳原子分別各除去1個氫原子而成之基。
Regarding the aliphatic hydrocarbon group having 1 to 120 carbon atoms having the same number of valences as represented by X in the above X, as the trivalent group, a group obtained by removing two hydrogen atoms from the above monovalent aliphatic hydrocarbon group may be mentioned. For example, an oxyalkylene group such as propylidene group and 1,1,3-butylidene propylidene group; and a group in which a hydrogen atom of these groups is substituted with a substituent described below, and the like are mentioned.
The trivalent group is not limited to a group obtained by removing three hydrogen atoms from one carbon atom in an aliphatic hydrocarbon such as propane and butane, as in the case of an alkylene group, and may include two carbon atoms in an aliphatic hydrocarbon. A group obtained by removing three hydrogen atoms in total, and a group obtained by removing one hydrogen atom from each of three different carbon atoms in the aliphatic hydrocarbon.

關於上述X所表示之具有與n相同數目之價數之碳原子數6~35之含芳香環烴基,作為1價者,可列舉:苄基、苯乙基、二苯甲基、三苯甲基、苯乙烯基及肉桂基等芳烷基;苯基及萘基等芳基;苯氧基及萘氧基等芳氧基;苯硫基及萘硫基等芳硫基:以及該等基之氫原子被取代為下文所述之取代基而成之基等。Regarding the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms having the same number of valences as represented by X in the above X, examples of the monovalent group include benzyl, phenethyl, benzyl, and trityl. Aryl groups such as phenyl, styryl, and cinnamyl; aryl groups such as phenyl and naphthyl; aryloxy groups such as phenoxy and naphthyloxy; arylthio groups such as phenylthio and naphthylthio: and such groups A hydrogen atom is substituted with a substituent described below, and the like.

關於上述X所表示之具有與n相同數目之價數之碳原子數6~35之含芳香環烴基,作為2價者,可列舉伸苯基及伸萘基等伸芳基;兒茶酚基、雙酚基等二官能苯酚基之殘基;2,4,8,10-四氧雜螺[5,5]十一烷基;伸烷基、伸芳基及伸烷基依序鍵結而成之基等將伸烷基及伸芳基組合而成之基;以及該等基之氫原子被取代為下文所述之取代基而成之基等。
作為伸烷基,可列舉與上述X所表示之伸烷基相同者。
Regarding the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms having the same number of valences as represented by X in the above X, as the divalent group, arylene groups such as phenylene and naphthyl; catechol groups Residues of bifunctional phenol groups such as bisphenol and bisphenol; 2,4,8,10-tetraoxaspiro [5,5] undecyl; sequential alkylene, alkylene, and alkylene bonds A base formed by combining an alkylene group and an alkylene group; and a base in which a hydrogen atom of these groups is replaced with a substituent described below.
Examples of the alkylene group include the same as the alkylene group represented by X.

關於上述X所表示之具有與n相同數目之價數之碳原子數6~35之含芳香環烴基,作為3價者,可列舉苯基-1,3,5-三亞甲基及該基之氫原子被取代為下文所述之取代基而成之基等。Regarding the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms having the same number of valences as that represented by X described above, examples of the trivalent group include phenyl-1,3,5-trimethylene and the group A hydrogen atom is substituted with a substituent described below, and the like.

關於上述X所表示之具有與n相同數目之價數之碳原子數2~35之含雜環基,作為n為1價者,可列舉:吡啶基、嘧啶基、嗒基、哌啶基、吡喃基、吡唑基、三基、吡咯基、喹啉基、異喹啉基、咪唑基、苯并咪唑基、三唑基、呋喃基(furyl)、呋喃基(furanyl)、苯并呋喃基、噻吩基(thienyl)、噻吩基(thiophenyl)、苯并噻吩基、噻二唑基、噻唑基、苯并噻唑基、㗁唑基、苯并㗁唑基、異噻唑基、異㗁唑基、吲哚基、2-吡咯啶酮-1-基、2-哌啶酮-1-基、2,4-二氧基咪唑啶-3-基、2,4-二氧基㗁唑啶-3-基及苯并三唑基、以及該等基之氫原子被取代為下文所述之取代基而成之基等。As for the heterocyclic group containing 2 to 35 carbon atoms having the same number of valences as represented by X in the above X, those in which n is monovalent include pyridyl, pyrimidinyl, daphthyl, piperidinyl, Pyranyl, pyrazolyl, triyl, pyrrolyl, quinolinyl, isoquinolinyl, imidazolyl, benzimidazolyl, triazolyl, furyl, furanyl, benzofuran , Thienyl, thiophenyl, benzothienyl, thiadiazolyl, thiazolyl, benzothiazolyl, oxazolyl, benzoxazolyl, isothiazolyl, isoxazolyl , Indolyl, 2-pyrrolidone-1-yl, 2-piperidone-1-yl, 2,4-dioxyimidazol-3-yl, 2,4-dioxyoxazolidine- 3-yl, benzotriazolyl, and the like in which a hydrogen atom of these groups is substituted with a substituent described below.

關於上述X所表示之具有與n相同數目之價數之碳原子數2~35之含雜環基,作為n為2價者,可列舉具有吡啶環、嘧啶環、哌啶環、哌環、三環、呋喃環、噻吩環及吲哚環之2價基、以及該等基之氫原子被取代為下文所述之取代基而成之基等。Regarding the heterocyclic group having 2 to 35 carbon atoms having the same number of valences as represented by X in the above X, those in which n is divalent include a pyridine ring, a pyrimidine ring, a piperidine ring, a piperidine ring, The trivalent, furan ring, thiophene ring, and indole ring are divalent groups, and those groups in which a hydrogen atom is substituted with a substituent described below, and the like.

關於上述X所表示之具有與n相同數目之價數之碳原子數2~35之含雜環基,作為n為3價者,可列舉具有異三聚氰酸環之3價基、具有三環之3價基及該等基之氫原子被取代為下文所述之取代基而成之基等。Regarding the heterocyclic group containing 2 to 35 carbon atoms having the same number of valences as represented by X in the above X, as n is a trivalent group, a trivalent group having an isotricyanate ring and The trivalent radical of the ring and the hydrogen atom of these radicals are substituted with a substituent described below, and the like.

作為R53 及R54 所表示之碳原子數1~35之脂肪族烴基,可列舉上述X所表示之脂肪族烴基或上述脂肪族烴基之氫原子被取代為下文所述之取代基而成之基中碳原子數為1~35者。Examples of the aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by R 53 and R 54 include those in which the aliphatic hydrocarbon group represented by X or the hydrogen atom of the aliphatic hydrocarbon group is substituted with a substituent described below. The number of carbon atoms in the group is 1 to 35.

作為R53 及R54 所表示之碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基,可列舉上述X所表示之碳原子數6~35之含芳香環烴基或者碳原子數2~35之含雜環基或該等基之氫原子被取代為下文所述之取代基而成之基。Examples of the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or the heterocyclic group containing 2 to 35 carbon atoms represented by R 53 and R 54 include the aromatic ring containing 6 to 35 carbon atoms represented by X described above. A hydrocarbon group or a heterocyclic group containing 2 to 35 carbon atoms or a hydrogen atom of such a group is substituted with a substituent described below.

上述X、R53 、R54 等所表示之脂肪族烴基、含芳香環烴基及含雜環基等各官能基亦可具有取代基。作為此種取代脂肪族烴基、含芳香環烴基及含雜環基等之氫原子之取代基,例如可列舉與取代R2 等所表示之烷基等之氫原子之取代基相同者。本發明之化合物A只要無特別說明,則包含不具有取代基者及具有取代基者。Each functional group such as an aliphatic hydrocarbon group, an aromatic ring-containing hydrocarbon group and a heterocyclic group represented by X, R 53 , R 54 and the like may have a substituent. Examples of such a substituent substituted for a hydrogen atom such as an aliphatic hydrocarbon group, an aromatic ring-containing hydrocarbon group, and a heterocyclic group include the same substituents as those substituted for a hydrogen atom such as an alkyl group represented by R 2 and the like. The compound A of the present invention includes those having no substituent and those having a substituent unless otherwise specified.

作為上述X,於n為2時,可列舉下述通式(1)所表示之基。
作為上述X,於n為3時,可列舉下述通式(2)所表示之基。
作為上述X,於n為4時,可列舉下述通式(3)所表示之基。
作為上述X,於n為5時,可列舉下述通式(4)所表示之基。
作為上述X,於n為6時,可列舉下述通式(5)所表示之基。
As said X, when n is 2, the group represented by the following general formula (1) is mentioned.
As said X, when n is 3, the group represented by following General formula (2) is mentioned.
As said X, when n is 4, the group represented by the following general formula (3) is mentioned.
As said X, when n is 5, the group represented by the following general formula (4) is mentioned.
As said X, when n is 6, the group represented by the following general formula (5) is mentioned.

[化5]

(上述通式(1)中,Y1 表示-CR55 R56 -、-NR57 -、2價之碳原子數1~35之脂肪族烴基、2價之碳原子數6~35之含芳香環烴基、2價之碳原子數2~35之含雜環基、或下述(1-1)~(1-3)所表示之任一基,
R55 及R56 分別獨立表示氫原子、碳原子數1~8之烷基、碳原子數6~20之芳基或碳原子數7~20之芳烷基,
Z1 及Z2 分別獨立表示直接鍵、-O-、-S-、>CO、-CO-O-、-O-CO-、-SO2 -、-SS-、-SO-、>NR57 或>PR58
R57 及R58 表示氫原子、碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基,
上述Y1 、R55 、R56 及R57 所表示之脂肪族烴基、碳原子數6~35之含芳香環烴基及碳原子數2~35之含雜環基中之亞甲基亦可被取代為-O-、-S-、-CO-、-COO-、-OCO-或者-NH-或該等之組合之基,
*意指於*部分與鄰接之基鍵結)
[Chemical 5]

(In the above general formula (1), Y 1 represents -CR 55 R 56- , -NR 57- , a divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, and a divalent aromatic group containing 6 to 35 carbon atoms. A cyclic hydrocarbon group, a divalent heterocyclic group containing 2 to 35 carbon atoms, or any of the groups (1-1) to (1-3) below,
R 55 and R 56 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 20 carbon atoms or an aralkyl group having 7 to 20 carbon atoms,
Z 1 and Z 2 independently represent a direct bond, -O-, -S-,> CO, -CO-O-, -O-CO-, -SO 2- , -SS-, -SO-,> NR 57 Or > PR 58
R 57 and R 58 represent a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a heterocyclic group containing 2 to 35 carbon atoms,
The aliphatic hydrocarbon group represented by the above Y 1 , R 55 , R 56, and R 57 , the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, and the methylene group in the heterocyclic group containing 2 to 35 carbon atoms can also be replaced by Substituted with -O-, -S-, -CO-, -COO-, -OCO-, or -NH- or a combination of these,
(* Means that the * part is bonded to the adjacent base)

[化6]

(上述式中,R59 表示氫原子、可具有取代基之苯基、或可具有取代基之碳原子數3~10之環烷基,
R60 表示碳原子數1~10之烷基、碳原子數1~10之烷氧基、碳原子數2~10之烯基或鹵素原子,上述烷基、烷氧基及烯基可具有取代基,
c1表示0~5之整數,
*意指於*部分與鄰接之基鍵結)
[Chemical 6]

(In the above formula, R 59 represents a hydrogen atom, a phenyl group which may have a substituent, or a cycloalkyl group having 3 to 10 carbon atoms which may have a substituent.
R 60 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkenyl group or halogen atom having 2 to 10 carbon atoms, and the alkyl group, alkoxy group, and alkenyl group may have a substituent. base,
c1 represents an integer from 0 to 5,
(* Means that the * part is bonded to the adjacent base)

[化7]

(*意指於*部分與鄰接之基鍵結)
[Chemical 7]

(* Means that the * part is bonded to the adjacent base)

[化8]

(上述式中,R61 及R62 分別獨立表示碳原子數1~10之烷基、碳原子數6~20之芳基、碳原子數6~20之芳氧基、碳原子數6~20之芳硫基、碳原子數6~20之芳基烯基、碳原子數7~20之芳烷基、碳原子數2~20之含雜環基或鹵素原子,
上述R61 及R62 所表示之烷基及芳烷基中之亞甲基亦可被取代為碳-碳雙鍵、-O-或-S-,
R61 亦可利用鄰接之R61 彼此形成環,
c2表示0~4之數,
c3表示0~8之數,
c4表示0~4之數,
c5表示0~4之數,
c4與c5之數之合計為2~4,
*意指於*部分與鄰接之基鍵結)
[Chemical 8]

(In the above formula, R 61 and R 62 each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aryloxy group having 6 to 20 carbon atoms, and 6 to 20 carbon atoms. An arylthio group, an arylalkenyl group having 6 to 20 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, a heterocyclic group or halogen atom having 2 to 20 carbon atoms,
The methylene group in the alkyl group and the aralkyl group represented by the above R 61 and R 62 may be substituted with a carbon-carbon double bond, -O- or -S-,
R 61 can also form a ring with each other by using adjacent R 61 ,
c2 represents a number from 0 to 4,
c3 represents a number from 0 to 8,
c4 is a number from 0 to 4,
c5 is a number from 0 to 4,
The total number of c4 and c5 is 2 to 4,
(* Means that the * part is bonded to the adjacent base)

[化9]

(上述通式(2)中,Y11 表示3價之碳原子數3~35之脂肪族烴基、碳原子數3~35之脂環族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基,
Z1 、Z2 及Z3 分別獨立表示與上述通式(1)中之Z1 ~Z2 所表示之基相同之範圍之基,
上述Y11 所表示之脂肪族烴基、碳原子數6~35之含芳香環烴基及碳原子數2~35之含雜環基之亞甲基亦可被取代為碳-碳雙鍵、-O-、-CO-、-O-CO-、-CO-O-或-SO2 -)
[Chemical 9]

(In the above general formula (2), Y 11 represents a trivalent aliphatic hydrocarbon group having 3 to 35 carbon atoms, an alicyclic hydrocarbon group having 3 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or Heterocyclic group containing 2 to 35 carbon atoms,
Z 1 , Z 2 and Z 3 each independently represent a group in the same range as the group represented by Z 1 to Z 2 in the general formula (1),
The aliphatic hydrocarbon group represented by the above Y 11 , the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, and the heterocyclic group-containing methylene group having 2 to 35 carbon atoms may be substituted with a carbon-carbon double bond, -O -, -CO-, -O-CO-, -CO-O- or -SO 2- )

[化10]

(上述通式(3)中,Y12 表示碳原子、4價之碳原子數1~35之脂肪族烴基、4價之碳原子數6~35之含芳香環烴基、或4價之碳原子數2~35之含雜環基,
上述Y12 所表示之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基之亞甲基亦可被取代為-COO-、-O-、-OCO-、-NHCO-、-NH-或-CONH-,
Z1 ~Z4 分別獨立為與上述通式(1)中之Z1 ~Z2 所表示之基相同之範圍之基)
[Chemical 10]

(In the general formula (3), Y 12 represents a carbon atom, a tetravalent carbon atom having 1 to 35 carbon atoms, a tetravalent carbon atom having 6 to 35 carbon atoms, or an aromatic ring-containing hydrocarbon group, or a tetravalent carbon atom. Heterocyclic group containing 2 to 35,
The aliphatic hydrocarbon group represented by the above Y 12 , the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or the heterocyclic group-containing methylene group having 2 to 35 carbon atoms may be substituted with -COO-, -O-, -OCO-, -NHCO-, -NH- or -CONH-,
Z 1 to Z 4 are each independently a base in the same range as the base represented by Z 1 to Z 2 in the general formula (1))

[化11]

(上述通式(4)中,Y13 表示5價之碳原子數2~35之脂肪族烴基、5價之碳原子數6~30之含芳香環烴基或5價之碳原子數2~30之含雜環基,
上述Y13 所表示之脂肪族烴基、碳原子數6~35之含芳香環烴基或者碳原子數2~35之含雜環基之亞甲基亦可被取代為-COO-、-O-、-OCO-、-NHCO-、-NH-或-CONH-,
Z1 ~Z5 分別獨立為與上述通式(1)中之Z1 ~Z2 所表示之基相同之範圍之基)
[Chemical 11]

(In the above general formula (4), Y 13 represents a pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, a pentavalent carbon atom having 6 to 30 aromatic ring-containing hydrocarbon groups, or a pentavalent carbon atom having 2 to 30 Heterocyclic group,
The aliphatic hydrocarbon group represented by the above Y 13 , the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or the heterocyclic group-containing methylene group having 2 to 35 carbon atoms may be substituted with -COO-, -O-, -OCO-, -NHCO-, -NH- or -CONH-,
Z 1 to Z 5 are each independently a base in the same range as the base represented by Z 1 to Z 2 in the general formula (1))

[化12]

(上述通式(5)中,Y14 表示6價之碳原子數2~35之脂肪族烴基、6價之碳原子數6~35之含芳香環烴基或6價之碳原子數2~35之含雜環基,
上述Y14 所表示之脂肪族烴基、碳原子數6~35之含芳香環烴基或者碳原子數2~35之含雜環基之亞甲基亦可被取代為-COO-、-O-、-OCO-、-NHCO-、-NH-或-CONH-,
Z1 ~Z6 分別獨立為與上述通式(1)中之Z1 ~Z2 所表示之基相同之範圍之基)
[Chemical 12]

(In the general formula (5), Y 14 represents a hexavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, a hexavalent aromatic ring group having 6 to 35 carbon atoms, or a hexavalent carbon atom having 2 to 35 Heterocyclic group,
The aliphatic hydrocarbon group represented by the above Y 14 , the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or the heterocyclic group-containing methylene group having 2 to 35 carbon atoms may be substituted with -COO-, -O-, -OCO-, -NHCO-, -NH- or -CONH-,
Z 1 to Z 6 are each independently a group in the same range as the group represented by Z 1 to Z 2 in the general formula (1))

作為上述通式(1)所表示之基中之Y1 所表示之2價之碳原子數1~35之脂肪族烴基,可列舉上述X所表示之2價之脂肪族烴基之中為特定之碳原子數之基,例如可列舉甲烷、乙烷、丙烷、異丙烷、丁烷、第二丁烷、第三丁烷、異丁烷、己烷、2-甲基己烷、3-甲基己烷、庚烷、2-甲基庚烷、3-甲基庚烷、異庚烷、第三庚烷、1-甲基辛烷、異辛烷、第三辛烷、環丙烷、環丁烷、環戊烷、環己烷、環庚烷、2,4-二甲基環丁烷、4-甲基環己烷等脂肪族烴之氫原子被取代為Z1 及Z2 而成之2價基。該等基中之亞甲基亦可被取代為-O-、-S-、-CO-、-COO-、-OCO-、-NH-或將該等組合而成之基。Among the divalent aliphatic hydrocarbon groups having 1 to 35 carbon atoms represented by Y 1 in the group represented by the general formula (1), specific examples of the divalent aliphatic hydrocarbon groups represented by X are listed. Examples of the carbon number group include methane, ethane, propane, isopropane, butane, second butane, third butane, isobutane, hexane, 2-methylhexane, and 3-methyl. Hexane, heptane, 2-methylheptane, 3-methylheptane, isoheptane, third heptane, 1-methyloctane, isooctane, third octane, cyclopropane, cyclobutane Hydrogen atoms of aliphatic hydrocarbons such as alkane, cyclopentane, cyclohexane, cycloheptane, 2,4-dimethylcyclobutane, 4-methylcyclohexane are substituted with Z 1 and Z 2 2-valent base. The methylene group in these groups may be substituted with -O-, -S-, -CO-, -COO-, -OCO-, -NH- or a combination of these groups.

作為上述通式(1)所表示之基中之Y1 所表示之2價之碳原子數6~35之含芳香環烴基,可列舉上述X所表示之2價之含芳香環烴基,例如可列舉苯、萘、聯苯等含芳香環烴之氫原子被取代為Z1 及Z2 而成之2價基等。Examples of the divalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms having a divalent number represented by Y 1 in the group represented by the general formula (1) include a divalent aromatic ring-containing hydrocarbon group represented by the above X. For example, Examples include divalent groups in which a hydrogen atom containing an aromatic cyclic hydrocarbon such as benzene, naphthalene, and biphenyl is substituted with Z 1 and Z 2 .

作為上述通式(1)所表示之基中之Y1 所表示之2價之碳原子數2~35之含雜環基,可列舉上述X所表示之2價之含雜環基,例如可列舉哌啶、哌、嘧啶、嗒、三、六氫三、呋喃、四氫呋喃、唍、、噻吩、四氫噻吩(thiolane)等含雜環化合物之氫原子被取代為Z1 及Z2 而成之2價基。Examples of the divalent heterocyclic group having 2 to 35 carbon atoms represented by Y 1 in the group represented by the general formula (1) include a divalent heterocyclic group having a divalent number represented by X. For example, List piperidine, piperidine, pyrimidine, da, tri, hexahydrotri, furan, tetrahydrofuran, pyrene, A bivalent group in which a hydrogen atom of a heterocyclic compound such as thiophene, tetrahydrothiophene (thiolane) is substituted with Z 1 and Z 2 .

上述通式(1)所表示之基中之Y1 所表示之脂肪族烴基、含芳香環烴基及含雜環基之氫原子亦可被取代為鹵素原子、氰基、硝基或碳原子數1~8之烷氧基。作為此種取代脂肪族烴基、含芳香環烴基及含雜環基等之氫原子之取代基,可列舉與取代R2 等所表示之烷基等之氫原子之取代基相同者。上述脂肪族烴基、含芳香環烴基及含雜環基等各官能基亦可具有取代基,只要無特別說明,則為不具有取代基之未經取代者或具有取代基者。Among the groups represented by the general formula (1), the aliphatic hydrocarbon group, the aromatic ring-containing hydrocarbon group and the heterocyclic group-containing hydrogen atom represented by Y 1 may be substituted with a halogen atom, a cyano group, a nitro group, or a carbon atom number. 1 to 8 alkoxy groups. Examples of such a substituent substituted for a hydrogen atom such as an aliphatic hydrocarbon group, an aromatic ring-containing hydrocarbon group, and a heterocyclic group include the same substituents as those substituted for a hydrogen atom such as an alkyl group represented by R 2 and the like. Each of the functional groups such as the aliphatic hydrocarbon group, the aromatic ring-containing hydrocarbon group, and the heterocyclic group may have a substituent. Unless otherwise specified, they are unsubstituted or substituted without a substituent.

作為上述通式(1)所表示之基中之R55 及R56 所表示之碳原子數1~8之烷基,可列舉:甲基、乙基、丙基、異丙基、丁基、第二丁基、第三丁基、異丁基、戊基、異戊基、第三戊基、己基、2-己基、3-己基、環己基、4-甲基環己基、庚基、2-庚基、3-庚基、異庚基、第三庚基、1-辛基、異辛基及第三辛基等。Examples of the alkyl group having 1 to 8 carbon atoms represented by R 55 and R 56 among the groups represented by the general formula (1) include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, Second butyl, third butyl, isobutyl, pentyl, isopentyl, third pentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 4-methylcyclohexyl, heptyl, 2 -Heptyl, 3-heptyl, isoheptyl, third heptyl, 1-octyl, isooctyl, third octyl, etc.

作為上述通式(1)所表示之基中之R55 及R56 所表示之碳原子數6~20之芳基,可列舉:苯基、萘基、2-甲基苯基、3-甲基苯基、4-甲基苯基、4-乙烯基苯基、3-異丙基苯基、4-異丙基苯基、4-丁基苯基、4-異丁基苯基、4-第三丁基苯基、4-己基苯基、4-環己基苯基、4-辛基苯基、4-(2-乙基己基)苯基、2,3-二甲基苯基、2,4-二甲基苯基、2,5-二甲基苯基、2,6-二甲基苯基、3,4-二甲基苯基、3,5-二甲基苯基、2,4-二-第三丁基苯基、2,5-二-第三丁基苯基、2,6-二-第三丁基苯基、2,4-二-第三戊基苯基、2,5-二-第三戊基苯基及2,4,5-三甲基苯基等。Examples of the aryl group having 6 to 20 carbon atoms represented by R 55 and R 56 among the groups represented by the general formula (1) include a phenyl group, a naphthyl group, a 2-methylphenyl group, and a 3-methyl group. Phenyl, 4-methylphenyl, 4-vinylphenyl, 3-isopropylphenyl, 4-isopropylphenyl, 4-butylphenyl, 4-isobutylphenyl, 4 -Third butylphenyl, 4-hexylphenyl, 4-cyclohexylphenyl, 4-octylphenyl, 4- (2-ethylhexyl) phenyl, 2,3-dimethylphenyl, 2,4-dimethylphenyl, 2,5-dimethylphenyl, 2,6-dimethylphenyl, 3,4-dimethylphenyl, 3,5-dimethylphenyl, 2,4-di-tertiary-butylphenyl, 2,5-di-tertiary-butylphenyl, 2,6-di-tertiary-butylphenyl, 2,4-di-tertiary-pentylbenzene Group, 2,5-di-third-pentylphenyl, 2,4,5-trimethylphenyl and the like.

作為上述通式(1)所表示之基中之R55 及R56 所表示之碳原子數7~20之芳烷基,可列舉苄基、苯乙基、2-苯基丙烷-2-基、二苯甲基、三苯基甲基、苯乙烯基、苯烯丙基等。Examples of the aralkyl group having 7 to 20 carbon atoms represented by R 55 and R 56 in the group represented by the general formula (1) include a benzyl group, a phenethyl group, and a 2-phenylpropane-2-yl group. , Diphenylmethyl, triphenylmethyl, styryl, phenallyl and the like.

上述通式(1)所表示之基中之R57 及R58 所表示之碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基可列舉與作為R53 及R54 所例示者相同者。Among the groups represented by the general formula (1), R 57 and R 58 represent aliphatic hydrocarbon groups having 1 to 35 carbon atoms, aromatic ring hydrocarbon groups having 6 to 35 carbon atoms, or 2 to 35 carbon atoms. The heterocyclic group may be the same as those exemplified as R 53 and R 54 .

作為上述通式(1-1)所表示之基中之R59 所表示之碳原子數3~10之環烷基,可列舉環丙基、環丁基、環戊基、環庚基、環辛基等及該等基之氫原子被取代為碳原子數1~10之烷基或者碳原子數1~10之烷氧基而成之基等。Examples of the cycloalkyl group having 3 to 10 carbon atoms represented by R 59 among the groups represented by the general formula (1-1) include cyclopropyl, cyclobutyl, cyclopentyl, cycloheptyl, and cyclo An octyl group and the like are substituted with a hydrogen atom of an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms.

作為上述通式(1-1)所表示之基中之R60 所表示之碳原子數1~10之烷基,可列舉上述作為R2 等所表示之烷基所例示者之中碳原子數為1~10者。Examples of the alkyl group having 1 to 10 carbon atoms represented by R 60 among the groups represented by the general formula (1-1) include carbon atoms among those exemplified as the alkyl group represented by R 2 and the like. For 1 to 10.

作為上述通式(1-1)所表示之基中之R60 所表示之碳原子數1~10之烷氧基,可使用上述作為R2 等所表示之烷基所例示之基之末端之亞甲基被取代為-O-而成者之中碳原子數為1~10者。作為上述烷氧基,例如可列舉甲氧基、乙氧基、異丙氧基等。As the alkoxy group having 1 to 10 carbon atoms represented by R 60 in the group represented by the above-mentioned general formula (1-1), the above-mentioned terminal of the group exemplified as the alkyl group represented by R 2 and the like can be used. Among those in which methylene is substituted with -O-, the number of carbon atoms is 1 to 10. Examples of the alkoxy group include a methoxy group, an ethoxy group, and an isopropoxy group.

作為上述通式(1-1)所表示之基中之R60 所表示之碳原子數2~10之烯基,可列舉乙烯基、烯丙基、1-丙烯基、異丙烯基、2-丁烯基、1,3-丁二烯基、2-戊烯基及2-辛烯基等。Examples of the alkenyl group having 2 to 10 carbon atoms represented by R 60 among the groups represented by the general formula (1-1) include vinyl, allyl, 1-propenyl, isopropenyl, 2- Butenyl, 1,3-butadienyl, 2-pentenyl, and 2-octenyl.

上述R60 所表示之烷基、烷氧基及烯基之氫原子亦可被取代為鹵素原子,其取代位置並無限制。作為上述鹵素原子,可列舉上述作為R2 等所例示者。The hydrogen atom of the alkyl group, alkoxy group, and alkenyl group represented by R 60 may be substituted with a halogen atom, and the substitution position is not limited. Examples of the halogen atom include those exemplified above as R 2 and the like.

作為上述通式(1-3)所表示之基中之R61 及R62 所表示之碳原子數1~10之烷基、碳原子數6~20之芳基、碳原子數7~20之芳烷基、鹵素原子,可列舉上述作為R2 等所例示者之中滿足特定之碳原子數者。Among the groups represented by the general formula (1-3), R 61 and R 62 represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, and an alkyl group having 7 to 20 carbon atoms. Examples of the aralkyl group and the halogen atom include those satisfying a specific number of carbon atoms among those exemplified as R 2 described above.

作為上述通式(1-3)所表示之基中之R61 及R62 所表示之碳原子數6~20之芳氧基,可列舉:苯氧基、萘氧基、2-甲基苯氧基、3-甲基苯氧基、4-甲基苯氧基、4-乙烯基苯氧基、3-異丙基苯氧基、4-異丙基苯氧基、4-丁基苯氧基、4-第三丁基苯氧基、4-己基苯氧基、4-環己基苯氧基、4-辛基苯氧基、4-(2-乙基己基)苯氧基、2,3-二甲基苯氧基、2,4-二甲基苯氧基、2,5-二甲基苯氧基、2,6-二甲基苯氧基、3,4-二甲基苯氧基、3,5-二甲基苯氧基、2,4-二-第三丁基苯氧基、2,5-二-第三丁基苯氧基、2,6-二-第三丁基苯氧基、2,4-二-第三戊基苯氧基、2,5-第三戊基苯氧基、4-環己基苯氧基、2,4,5-三甲基苯氧基及二茂鐵基氧基及該等基之氫原子被取代為鹵素原子而成之基。Examples of the aryloxy group having 6 to 20 carbon atoms represented by R 61 and R 62 in the group represented by the general formula (1-3) include a phenoxy group, a naphthyloxy group, and 2-methylbenzene. Oxy, 3-methylphenoxy, 4-methylphenoxy, 4-vinylphenoxy, 3-isopropylphenoxy, 4-isopropylphenoxy, 4-butylbenzene Oxy, 4-tert-butylphenoxy, 4-hexylphenoxy, 4-cyclohexylphenoxy, 4-octylphenoxy, 4- (2-ethylhexyl) phenoxy, 2 , 3-dimethylphenoxy, 2,4-dimethylphenoxy, 2,5-dimethylphenoxy, 2,6-dimethylphenoxy, 3,4-dimethyl Phenoxy, 3,5-dimethylphenoxy, 2,4-di-third-butylphenoxy, 2,5-di-third-butylphenoxy, 2,6-di-th Tributylphenoxy, 2,4-di-tertiarypentylphenoxy, 2,5-tertiarypentylphenoxy, 4-cyclohexylphenoxy, 2,4,5-trimethyl A phenoxy group and a ferrocenyloxy group and a group in which a hydrogen atom is substituted with a halogen atom.

作為上述通式(1-3)所表示之基中之R61 及R62 所表示之碳原子數6~20之芳硫基,可列舉將上述可經鹵素原子取代之碳原子數6~20之芳氧基之氧原子取代為硫原子而成者。Examples of the arylthio group having 6 to 20 carbon atoms represented by R 61 and R 62 in the group represented by the general formula (1-3) include a carbon atom having 6 to 20 carbon atoms which may be substituted with a halogen atom. The oxygen atom of the aryloxy group is substituted by a sulfur atom.

作為上述通式(1-3)所表示之基中之R61 及R62 所表示之碳原子數8~20之芳基烯基,可列舉將上述可經鹵素原子取代之碳原子數6-20之芳氧基之氧原子取代為乙烯基、烯丙基、1-丙烯基、異丙烯基、2-丁烯基、1,3-丁二烯基、2-戊烯基、2-辛烯基等烯基而成之基等。Examples of the arylalkenyl group having 8 to 20 carbon atoms represented by R 61 and R 62 in the group represented by the general formula (1-3) include 6 to 6 carbon atoms which may be substituted with a halogen atom. The oxygen atom of the aryloxy group of 20 is substituted with vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl, 2-pentenyl, 2-octyl Alkenyl and other alkenyl groups.

作為上述通式(1-3)所表示之基中之R61 及R62 所表示之碳原子數2~20之含雜環基,可列舉吡啶基、吡基、哌啶基、哌基、嘧啶基、嗒基、三基、六氫三基、呋喃基、四氫呋喃基、唍基、基、噻吩基及硫呋喃基以及將該等基之氫原子取代為鹵素原子而成之基等。Examples of the heterocyclic group having 2 to 20 carbon atoms represented by R 61 and R 62 in the group represented by the general formula (1-3) include pyridyl, pyridyl, piperidinyl, piperidinyl, Pyrimidinyl, daphyl, triyl, hexahydrotriyl, furyl, tetrahydrofuryl, fluorenyl, Group, thienyl group, thiofuranyl group, and a group obtained by substituting a hydrogen atom of these groups with a halogen atom, and the like.

上述通式(1-3)所表示之基中之R61 及R62 所表示之芳氧基、芳硫基、芳基烯基、含雜環基等各官能基亦可具有取代基,只要無特別說明,則為不具有取代基之未經取代者或具有取代基者。作為將芳氧基、芳硫基、芳基烯基、含雜環基等之氫原子取代之取代基,可列舉與將R2 等所表示之烷基等之氫原子取代之取代基相同之基。Each functional group such as an aryloxy group, an arylthio group, an arylalkenyl group, and a heterocyclic group-containing group represented by R 61 and R 62 in the group represented by the general formula (1-3) may have a substituent, as long as Unless otherwise specified, they are unsubstituted or substituted. Examples of the substituent that replaces a hydrogen atom such as an aryloxy group, an arylthio group, an arylalkenyl group, and a heterocyclic group include the same substituents as those substituted with a hydrogen atom such as an alkyl group represented by R 2 and the like. base.

作為上述通式(2)所表示之基中之Y11 所表示之3價之碳原子數3~35之脂肪族烴基,可列舉上述X所表示之3價之脂肪族烴基中為特定之碳原子數之基,例如可列舉上述通式(1)中之Y1 之說明中所例示之脂肪族烴之氫原子被取代為Z1 、Z2 及Z3 而成之3價基。該等基中之亞甲基亦可被取代為-O-、-S-、-CO-、-CO-O-、-O-CO-、-SO2 -、-NH-或將該等組合而成之基。Examples of the trivalent aliphatic hydrocarbon group having 3 to 35 carbon atoms represented by Y 11 in the group represented by the general formula (2) include specific carbons among the trivalent aliphatic hydrocarbon groups represented by X described above. The atomic number group includes, for example, a trivalent group in which a hydrogen atom of the aliphatic hydrocarbon exemplified in the description of Y 1 in the general formula (1) is substituted with Z 1 , Z 2, and Z 3 . The methylene groups in these groups may also be substituted with -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO 2- , -NH- or a combination thereof A base.

作為上述通式(2)所表示之基中之Y11 所表示之3價之碳原子數6~35之含芳香環烴基,可列舉上述X所表示之3價之含芳香環烴基,例如可列舉上述通式(1)中之Y1 之說明中所例示之含芳香環烴之氫原子被取代為Z1 、Z2 及Z3 而成之3價基。Examples of the trivalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 11 in the group represented by the general formula (2) include a trivalent aromatic ring-containing hydrocarbon group represented by the above X. For example, The trivalent group in which the hydrogen atom of the aromatic ring-containing hydrocarbon exemplified in the description of Y 1 in the general formula (1) is substituted with Z 1 , Z 2 and Z 3 is listed.

作為上述通式(2)所表示之基中之Y11 所表示之3價之碳原子數2~35之含雜環基,可列舉上述X所表示之3價之含雜環基,例如可列舉上述通式(1)中之Y1 之說明中所例示之含雜環化合物之氫原子被取代為Z1 、Z2 及Z3 而成之3價基。Examples of the trivalent heterocyclic group having 2 to 35 carbon atoms represented by Y 11 in the group represented by the general formula (2) include a trivalent heterocyclic group containing X represented by the above X. For example, The trivalent group in which the hydrogen atom of the heterocyclic compound exemplified in the description of Y 1 in the general formula (1) is substituted with Z 1 , Z 2 and Z 3 is listed.

作為上述通式(3)所表示之基中之Y12 所表示之4價之碳原子數1~35之脂肪族烴基,可列舉自上述X所表示之1價之脂肪族烴基除去3個氫原子而成之基,例如可列舉上述通式(1)中之Y1 之說明中所例示之脂肪族烴之氫原子被取代為Z1 、Z2 、Z3 及Z4 而成之4價基。該等基中之亞甲基亦可被取代為-O-、-S-、-CO-、-COO-、-OCO-、-NH-或將該等組合而成之基。Examples of the tetravalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 12 in the group represented by the general formula (3) include the removal of 3 hydrogens from the monovalent aliphatic hydrocarbon group represented by X. An atomic group may be, for example, a tetravalent group in which the hydrogen atom of the aliphatic hydrocarbon exemplified in the description of Y 1 in the general formula (1) is substituted with Z 1 , Z 2 , Z 3, and Z 4 base. The methylene group in these groups may be substituted with -O-, -S-, -CO-, -COO-, -OCO-, -NH- or a combination of these groups.

作為上述通式(3)所表示之基中之Y12 所表示之4價之碳原子數6~35之含芳香環烴基,可列舉自上述X所表示之1價之含芳香環烴基除去3個氫原子而成之基,例如可列舉上述通式(1)中之Y1 之說明中所例示之含芳香環烴之氫原子被取代為Z1 、Z2 、Z3 及Z4 而成之4價基。Examples of the tetravalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 12 in the group represented by the above general formula (3) include a monovalent aromatic ring-containing hydrocarbon group represented by X which is removed by 3 Examples of the group consisting of three hydrogen atoms include the aromatic ring-containing hydrogen atom exemplified in the description of Y 1 in the general formula (1), which is substituted with Z 1 , Z 2 , Z 3, and Z 4 . 4-valent base.

作為上述通式(3)所表示之基中之Y12 所表示之4價之碳原子數2~35之含雜環基,可列舉自上述X所表示之1價之含雜環基除去3個氫原子而成之基,例如可列舉上述通式(1)中之Y1 之說明中所例示之含雜環化合物之氫原子被取代為Z1 、Z2 、Z3 及Z4 而成之4價基。As the tetravalent heterocyclic group having 2 to 35 carbon atoms represented by Y 12 in the group represented by the above general formula (3), a monovalent heterocyclic group containing 3 represented by X may be removed except for 3 Examples of the group consisting of three hydrogen atoms include those in which the hydrogen atom of the heterocyclic compound exemplified in the description of Y 1 in the above general formula (1) is substituted with Z 1 , Z 2 , Z 3 and Z 4 4-valent base.

作為上述通式(4)所表示之基中之Y13 所表示之5價之碳原子數2~35之脂肪族烴基,可列舉自上述X所表示之1價之脂肪族烴基除去4個氫原子而成之基,例如可列舉上述通式(1)中之Y1 之說明中所例示之脂肪族烴之氫原子被取代為Z1 、Z2 、Z3 、Z4 及Z5 而成之5價基。該等基中之亞甲基亦可被取代為-O-、-S-、-CO-、-CO-O-、-O-CO-、-SO2 -、-NH-或將該等組合而成之基。Examples of the 5-valent aliphatic hydrocarbon group having 2 to 35 carbon atoms represented by Y 13 in the group represented by the general formula (4) include the removal of 4 hydrogens from the monovalent aliphatic hydrocarbon group represented by X. Atom-based groups include, for example, those in which the hydrogen atom of the aliphatic hydrocarbon exemplified in the description of Y 1 in the general formula (1) is substituted with Z 1 , Z 2 , Z 3 , Z 4 and Z 5 5 valent base. The methylene groups in these groups may also be substituted with -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO 2- , -NH- or a combination thereof A base.

作為上述通式(4)所表示之基中之Y13 所表示之5價之碳原子數6~35之含芳香環烴基,可列舉自上述X所表示之1價之含芳香環烴基除去4個氫原子而成之基,例如可列舉上述通式(1)中之Y1 之說明中所例示之含芳香環烴之氫原子被取代為Z1 、Z2 、Z3 、Z4 及Z5 而成之5價基。Examples of the 5-valent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 13 in the group represented by the general formula (4) include the removal of 4 from the monovalent aromatic ring-containing hydrocarbon group represented by X described above. Examples of the group consisting of three hydrogen atoms include the aromatic ring-containing hydrogen atom exemplified in the description of Y 1 in the general formula (1), which is substituted with Z 1 , Z 2 , Z 3 , Z 4, and Z. 5 into a 5-valent base.

作為上述通式(4)所表示之基中之Y13 所表示之5價之碳原子數2~35之含雜環基,可列舉自上述X所表示之1價之含雜環基除去4個氫原子而成之基,例如可列舉上述通式(1)中之Y1 之說明中所例示之含雜環化合物之氫原子被取代為Z1 、Z2 、Z3 、Z4 及Z5 而成之5價基。Examples of the 5-valent heterocyclic group having 2 to 35 carbon atoms represented by Y 13 in the group represented by the above general formula (4) include the removal of 4 from the monovalent heterocyclic group containing X represented by the above X. Examples of the group consisting of three hydrogen atoms include the hydrogen atoms of the heterocyclic compound exemplified in the description of Y 1 in the general formula (1), which are substituted with Z 1 , Z 2 , Z 3 , Z 4, and Z. 5 into a 5-valent base.

作為上述通式(5)中之Y14 所表示之6價之碳原子數2~35之脂肪族烴基,可列舉自上述X所表示之1價之脂肪族烴基除去5個氫原子而成之基,例如可列舉上述通式(1)中之Y1 之說明中所例示之脂肪族烴之氫原子被取代為Z1 、Z2 、Z3 、Z4 、Z5 及Z6 而成之6價基,基中之亞甲基亦可被取代為-O-、-S-、-CO-、-COO-、-OCO-、-SO2 -、-NH-或將該等組合而成之基。Examples of the hexavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms represented by Y 14 in the general formula (5) include those obtained by removing 5 hydrogen atoms from the monovalent aliphatic hydrocarbon group represented by X described above. For example, the hydrogen atom of the aliphatic hydrocarbon exemplified in the description of Y 1 in the above general formula (1) may be substituted with Z 1 , Z 2 , Z 3 , Z 4 , Z 5 and Z 6 . 6-valent group, the methylene group in the group may also be substituted with -O-, -S-, -CO-, -COO-, -OCO-, -SO 2- , -NH- or a combination of these The base.

作為上述通式(5)中之Y14 所表示之6價之碳原子數6~35之含芳香環烴基,可列舉自上述X所表示之1價之含芳香環烴基除去5個氫原子而成之基,例如可列舉上述通式(1)中之Y1 之說明中所例示之含芳香環烴之氫原子被取代為Z1 、Z2 、Z3 、Z4 、Z5 及Z6 而成之6價基。Examples of the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms having a valence of 6 to 35 represented by Y 14 in the general formula (5) include removal of 5 hydrogen atoms from the monovalent aromatic ring-containing hydrocarbon group represented by the above X For example, the aromatic ring-containing hydrogen atom exemplified in the description of Y 1 in the above general formula (1) may be substituted with Z 1 , Z 2 , Z 3 , Z 4 , Z 5, and Z 6. Into a 6-valent base.

作為上述通式(5)中之Y14 所表示之6價之碳原子數2~35之含雜環基,可列舉自上述X所表示之1價之含雜環基除去5個氫原子而成之基,例如可列舉上述通式(1)中之Y1 之說明中所例示之含雜環化合物之氫原子被取代為Z1 、Z2 、Z3 、Z4 、Z5 及Z6 而成之6價基。Examples of the hexavalent heterocyclic group containing 2 to 35 carbon atoms represented by Y 14 in the above general formula (5) include the removal of 5 hydrogen atoms from the monovalent heterocyclic group represented by X described above, and For example, the hydrogen atom of the heterocyclic-containing compound exemplified in the description of Y 1 in the general formula (1) above may be substituted with Z 1 , Z 2 , Z 3 , Z 4 , Z 5, and Z 6. Into a 6-valent base.

上述X較佳為碳原子數1~120之脂肪族烴基,其中,較佳為碳原子數1~10之脂肪族烴基。其原因在於:藉由上述X為上述基,上述化合物A成為容易合成者。The X is preferably an aliphatic hydrocarbon group having 1 to 120 carbon atoms, and among them, an aliphatic hydrocarbon group having 1 to 10 carbon atoms is preferred. The reason is that the above compound A becomes an easy synthesizer when X is the aforementioned group.

於n為2~10之情形時,上述X較佳為碳原子數1~120之脂肪族烴基,尤佳為碳原子數1~10之脂肪族烴基。又,上述X亦可較佳地使用碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或該等基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-而成之基。其原因在於:藉由上述X為上述基,上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:藉由上述化合物A容易製成揮散性較低之化合物,並且成為合成容易者。When n is 2 to 10, X is preferably an aliphatic hydrocarbon group having 1 to 120 carbon atoms, and particularly preferably an aliphatic hydrocarbon group having 1 to 10 carbon atoms. In addition, as the X, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a methylene group in these groups can be preferably substituted with -O-, -S. -, -CO-, -COO-, -OCO-. The reason is that, when X is the above-mentioned group, the compound A is excellent in light absorption around 400 nm. The reason is that the compound A is easy to be made into a compound with low volatility and is easy to synthesize.

於n為2之情形時,上述X較佳為2價之碳原子數1~120之脂肪族烴基,尤佳為2價之碳原子數1~10之脂肪族烴基,其中,尤佳為2價之碳原子數4~10之脂肪族烴基,其中,尤佳為基中之氫原子及亞甲基未被取代之碳原子數5~10之2價之脂肪族烴基(未經取代之碳原子數5~10之2價之脂肪族烴基)。其中,尤佳為基中之氫原子及亞甲基未被取代之直鏈之碳原子數5~10之2價之脂肪族烴基(為直鏈且未經取代之碳原子數5~10之脂肪族烴基),其中,尤佳為基中之氫原子及亞甲基未被取代之直鏈之碳原子數5~10之伸烷基(為直鏈且未經取代之碳原子數5~10之伸烷基)。其原因在於:藉由上述X為上述基,上述化合物A成為容易合成者。上述脂肪族烴基可為直鏈狀亦可為支鏈狀,但較佳為直鏈狀。其原因在於:上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:上述化合物A成為容易合成者。又,其原因在於:上述化合物A容易製成揮散性較低之化合物。When n is 2, the above-mentioned X is preferably a divalent aliphatic hydrocarbon group having 1 to 120 carbon atoms, particularly preferably a divalent aliphatic hydrocarbon group having 1 to 10 carbon atoms, and particularly preferably 2 Valent aliphatic hydrocarbon groups having 4 to 10 carbon atoms, of which hydrogen atoms in the base and unsubstituted methylene unsubstituted carbon atoms having 5 to 10 divalent aliphatic hydrocarbon groups (unsubstituted carbon) are particularly preferred. A bivalent aliphatic hydrocarbon group having 5 to 10 atoms). Among them, a hydrogen atom in a radical and a straight chain of methylene group which is unsubstituted are preferably a bivalent aliphatic hydrocarbon group having 5 to 10 carbon atoms (a straight chain and an unsubstituted carbon atom having 5 to 10 carbon atoms). Aliphatic hydrocarbon group), among which, a hydrogen atom in the group and an unsubstituted linear alkylene group having 5 to 10 carbon atoms (a straight chain and unsubstituted carbon atom having 5 to 10) 10 alkylene). The reason is that the above compound A becomes an easy synthesizer when X is the aforementioned group. The aliphatic hydrocarbon group may be linear or branched, but is preferably linear. The reason is that the above-mentioned compound A is excellent in light absorptivity near 400 nm. The reason is that the above compound A becomes an easy synthesizer. The reason is that the compound A is easily made into a compound having low volatility.

又,於n為2之情形時,上述X亦較佳為2價之碳原子數1~35之脂肪族烴基或2價之碳原子數6~35之含芳香環烴基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-而成之基,其中,較佳為二價之碳原子數3~20之脂肪族烴基或2價之碳原子數8~20之含芳香環烴基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-而成之基,其中尤佳為2價之碳原子數5~15之脂肪族烴基或2價之碳原子數10~20之含芳香環烴基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-而成之基,其中尤佳為2價之碳原子數5~15之脂肪族烴基或2價之碳原子數10~20之含芳香環烴基中之亞甲基被取代為-O-、-CO-、-COO-、-OCO-而成之基,其中尤佳為碳原子數5~15之伸烷基或碳原子數10~20之將伸烷基及伸芳基組合而成之基中之亞甲基被取代為-O-、-CO-、-COO-、-OCO-而成之基,其中尤佳為碳原子數5~15之直鏈或分支之伸烷基或上述碳原子數12~18之伸烷基、伸芳基及伸烷基依序鍵結而成的基中之亞甲基被取代為-O-、-CO-、-COO-、-OCO-而成之基。
其原因在於:藉由上述X為上述基,上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:上述化合物A容易製成揮散性較低之化合物,並且成為合成容易者。
When n is 2, the X is also preferably a divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms or a divalent methylene group in an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms. Substituted by -O-, -S-, -CO-, -COO-, -OCO-, among them, a divalent aliphatic hydrocarbon group having 3 to 20 carbon atoms or a divalent carbon atom is preferred. The methylene group in the aromatic ring-containing hydrocarbon group having a number of 8 to 20 is substituted by -O-, -S-, -CO-, -COO-, -OCO- 5 to 15 aliphatic hydrocarbon groups or divalent aromatic ring-containing hydrocarbon groups having 10 to 20 carbon atoms are substituted with -O-, -S-, -CO-, -COO-, -OCO- The formed group is particularly preferably a divalent aliphatic hydrocarbon group having 5 to 15 carbon atoms or a divalent aromatic ring-containing hydrocarbon group having 10 to 20 carbon atoms is substituted with -O-,- CO-, -COO-, -OCO-, especially preferred are those having 5 to 15 carbon atoms or those having 10 to 20 carbon atoms which are a combination of alkylene and alkylene The methylene group is substituted with -O-, -CO-, -COO-, -OCO-, and particularly preferred is a linear or branched alkylene having 5 to 15 carbon atoms. Or the methylene group in the above-mentioned alkylene group having 12 to 18 carbon atoms, an arylene group, and an alkylene group are sequentially substituted by -O-, -CO-, -COO-, -OCO -Creating the base.
The reason is that, when X is the above-mentioned group, the compound A is excellent in light absorption around 400 nm. The reason is that the above-mentioned compound A is easily made into a compound having low volatility and is easy to synthesize.

又,於本發明中,於n為3之情形時,上述X較佳為3價之碳原子數1~35之脂肪族烴基或該脂肪族烴基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-而成之基,尤佳為3價之碳原子數5~15之脂肪族烴基或該脂肪族烴基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-而成之基,其中尤佳為3價之碳原子數8~15之脂肪族烴基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-而成之基,其中尤佳為3價之碳原子數8~15之脂肪族烴基中之亞甲基被取代為-O-、-CO-、-COO-、-OCO-而成之基,其中尤佳為碳原子數為8~15、為自脂肪族烴中之不同之3個碳原子分別各去除1個氫原子而成之基且亞甲基被取代為-O-、-CO-、-COO-、-OCO-而成之基。其原因在於:藉由上述X為上述基,上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:上述化合物A容易製成揮散性較低之化合物,並且成為合成容易者。In the present invention, when n is 3, the X is preferably a trivalent aliphatic hydrocarbon group having 1 to 35 carbon atoms or a methylene group in the aliphatic hydrocarbon group is substituted with -O-, -S-, -CO-, -COO-, -OCO-, particularly preferably a trivalent aliphatic hydrocarbon group having 5 to 15 carbon atoms or a methylene group in the aliphatic hydrocarbon group is substituted by- O-, -S-, -CO-, -COO-, -OCO-, in which the methylene group in a trivalent aliphatic hydrocarbon group having 8 to 15 carbon atoms is more preferably substituted with -O -, -S-, -CO-, -COO-, -OCO-, in which the methylene group in a trivalent aliphatic hydrocarbon group having 8 to 15 carbon atoms is more preferably substituted with -O- , -CO-, -COO-, -OCO-. Among them, it is particularly preferable that the number of carbon atoms is 8 to 15, and each of the three carbon atoms in the aliphatic hydrocarbon is removed by one hydrogen atom. And a methylene group is substituted with -O-, -CO-, -COO-, -OCO-. The reason is that, when X is the above-mentioned group, the compound A is excellent in light absorption around 400 nm. The reason is that the above-mentioned compound A is easily made into a compound having low volatility and is easy to synthesize.

再者,於本發明中,於n為1之情形時,上述X為1價基,例如,於上述化合物A以通式(A1)表示之情形時,上述X較佳為氫原子或碳原子數1~40之烷基等與R4 之較佳之基相同之基,於上述化合物A以通式(A2)表示之情形時,上述X較佳為氫原子、碳原子數1~40之烷基或碳原子數6~30之芳基等與R3 之較佳之基相同之基,於上述化合物A以通式(A3)表示之情形時,上述X較佳為氫原子、碳原子數1~40之烷基等與R55 之較佳之基相同之基。其原因在於:上述化合物A成為400 nm附近之光之吸收性優異者。又,其原因在於:上述化合物A容易製成揮散性較低之化合物,並且成為合成容易者。In the present invention, when n is 1, the X is a monovalent group. For example, when the compound A is represented by the general formula (A1), the X is preferably a hydrogen atom or a carbon atom. The alkyl group having a number of 1 to 40 is the same as a preferable group of R 4. When the compound A is represented by the general formula (A2), the X is preferably an alkyl group having a hydrogen atom and 1 to 40 carbon atoms. Group or an aryl group having 6 to 30 carbon atoms, and the same group as the preferred group of R 3. When the compound A is represented by the general formula (A3), X is preferably a hydrogen atom and a carbon number of 1 An alkyl group such as -40 is the same as a preferable group of R 55 . The reason is that the above-mentioned compound A is excellent in light absorptivity near 400 nm. The reason is that the above-mentioned compound A is easily made into a compound having low volatility and is easy to synthesize.

作為上述化合物A之具體例,例如可列舉下述式(1)~(75)所表示之化合物。Specific examples of the compound A include compounds represented by the following formulae (1) to (75).

[化13]
[Chemical 13]

[化14]
[Chemical 14]

[化15]
[Chemical 15]

[化16]
[Chemical 16]

[化17]
[Chemical 17]

[化18]
[Chemical 18]

[化19]
[Chemical 19]

本發明之化合物較佳為上述通式(A1)所表示之化合物,且較佳為式中之n為2或3、X為碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或該等基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-而成之基。其原因在於:上述化合物A成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡更優異者。The compound of the present invention is preferably a compound represented by the above general formula (A1), and more preferably n is 2 or 3, X is an aliphatic hydrocarbon group having 1 to 35 carbon atoms, and 6 to 35 carbon atoms The aromatic ring-containing hydrocarbon group or the methylene group in these groups is substituted with -O-, -S-, -CO-, -COO-, -OCO-. The reason is that the above-mentioned compound A is more excellent in the balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm.

其中於本發明中,較佳為上述通式(A1)中之R1 為氰基或-COOR,R為碳原子數1~10之烷基或碳原子數1~10之烷基中之1個氫原子被取代為乙烯性不飽和基而成之基,R2 為氫原子,R3 為氫原子、碳原子數1~10之烷基或碳原子數6~15之芳基,X為碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或該等基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-而成之基,5a為0,n為2或3。其原因在於:上述化合物A成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡更優異者。Among them, in the present invention, R 1 in the general formula (A1) is preferably a cyano group or -COOR, and R is an alkyl group having 1 to 10 carbon atoms or an alkyl group having 1 to 10 carbon atoms. A hydrogen atom is substituted with an ethylenically unsaturated group, R 2 is a hydrogen atom, R 3 is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 15 carbon atoms, and X is An aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a methylene group in these groups is substituted with -O-, -S-, -CO-, -COO-, -OCO-, 5a is 0 and n is 2 or 3. The reason is that the above-mentioned compound A is more excellent in the balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm.

進而,於上述通式(A1)所表示之化合物中,較佳為式中之R1 為氰基或-COOR,R為碳原子數1~5之烷基或碳原子數1~5之烷基中之1個氫原子被取代為乙烯性不飽和基而成之基,R2 為氫原子,R3 為氫原子、碳原子數1~5之烷基或碳原子數6~12之芳基,X為碳原子數5~10之脂肪族烴基、或碳原子數5~15之脂肪族烴基或碳原子數10~20之含芳香環烴基,且該等基中之亞甲基被取代為-COO-或-OCO-之基,5a為0,n為2或3。其原因在於:上述化合物A成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡更優異者。Further, in the compound represented by the general formula (A1), it is preferable that R 1 in the formula is a cyano group or -COOR, and R is an alkyl group having 1 to 5 carbon atoms or an alkane having 1 to 5 carbon atoms. A group in which one hydrogen atom is substituted with an ethylenically unsaturated group, R 2 is a hydrogen atom, R 3 is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an aromatic group having 6 to 12 carbon atoms X is an aliphatic hydrocarbon group having 5 to 10 carbon atoms, or an aliphatic hydrocarbon group having 5 to 15 carbon atoms or an aromatic ring-containing hydrocarbon group having 10 to 20 carbon atoms, and the methylene group in these groups is substituted Is a base of -COO- or -OCO-, 5a is 0, and n is 2 or 3. The reason is that the above-mentioned compound A is more excellent in the balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm.

又,本發明之化合物亦較佳為上述通式(A3)所表示之化合物,其中,較佳為n為1、R4 為碳原子數1~10之烷基或者該等基中之氫原子之1個被取代為乙烯性不飽和基之基、或碳原子數1~40之烷基中之亞甲基之1個或者2個以上分別獨立被取代為-COO-或者-OCO-且基中之氫原子之2個以上被取代為乙烯性不飽和基之基的化合物,尤佳為式中之R1 為氰基或-COOR,R為碳原子數1~10之烷基或碳原子數1~10之烷基中之氫原子之1個被取代為乙烯性不飽和基之基,R2 為氫原子,R3 為氫原子、碳原子數1~10之烷基或碳原子數6~15之芳基,R4 為碳原子數1~10之烷基或者該等基中之氫原子之1個被取代為乙烯性不飽和基之基或碳原子數1~40之烷基中之亞甲基之1個或者2個以上分別獨立被取代為-COO-或者-OCO-且基中之氫原子之2個以上被取代為乙烯性不飽和基之基,X為氫原子,5a為0,n為1。其原因在於:上述化合物A成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡更優異者。The compound of the present invention is also preferably a compound represented by the general formula (A3). Among them, n is 1 and R 4 is preferably an alkyl group having 1 to 10 carbon atoms or a hydrogen atom in these groups. One of the groups is substituted with an ethylenically unsaturated group, or one or two or more of the methylene groups in the alkyl group having 1 to 40 carbon atoms are independently substituted with -COO- or -OCO- Compounds in which two or more hydrogen atoms in the group are substituted with an ethylenically unsaturated group, particularly preferably wherein R 1 is a cyano group or -COOR, and R is an alkyl group or carbon atom having 1 to 10 carbon atoms One of the hydrogen atoms in the alkyl group of 1 to 10 is substituted with an ethylenically unsaturated group, R 2 is a hydrogen atom, R 3 is a hydrogen atom, an alkyl group of 1 to 10 carbon atoms, or a carbon atom 6 to 15 aryl groups, R 4 is an alkyl group having 1 to 10 carbon atoms or one of the hydrogen atoms in these groups is substituted with an ethylenically unsaturated group or an alkyl group having 1 to 40 carbon atoms One or two or more of the methylene groups in the group are independently substituted with -COO- or -OCO- and two or more hydrogen atoms in the group are substituted with an ethylenically unsaturated group, and X is a hydrogen atom, 5a is 0 and n is 1 The reason is that the above-mentioned compound A is more excellent in the balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm.

進而,於上述通式(A3)所表示之化合物中,較佳為式中之R1 為氰基或-COOR,R為碳原子數1~5之烷基或碳原子數1~5之烷基中之氫原子之1個被取代為乙烯性不飽和基而成之基,R2 為氫原子,R3 為氫原子、碳原子數1~5之烷基或碳原子數6~12之芳基,R4 為碳原子數1~5之烷基、碳原子數3~10之烷基中之氫原子之1個被取代為乙烯性不飽和基之基、或碳原子數5~25之烷基中之亞甲基之1個或者2個以上分別獨立被取代為-COO-或者-OCO-且基中之氫原子之2個以上被取代為乙烯性不飽和基之基,X為氫原子,5a為0,n為1。其原因在於:上述化合物A成為400 nm附近之光之吸收性、低揮散性及合成容易性之平衡更優異者。Further, in the compound represented by the general formula (A3), it is preferable that R 1 in the formula is a cyano group or -COOR, and R is an alkyl group having 1 to 5 carbon atoms or an alkane having 1 to 5 carbon atoms. One of the hydrogen atoms in the group is substituted with an ethylenically unsaturated group, R 2 is a hydrogen atom, R 3 is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl group having 6 to 12 carbon atoms Aryl, R 4 is an alkyl group having 1 to 5 carbon atoms, one of hydrogen atoms in an alkyl group having 3 to 10 carbon atoms is substituted with an ethylenically unsaturated group, or 5 to 25 carbon atoms One or two or more methylene groups in the alkyl group are independently substituted with -COO- or -OCO- and two or more hydrogen atoms in the group are substituted with an ethylenically unsaturated group, X is For a hydrogen atom, 5a is 0 and n is 1. The reason is that the above-mentioned compound A is more excellent in the balance of light absorption, low volatility, and ease of synthesis in the vicinity of 400 nm.

作為上述化合物A之製造方法,只要為能夠獲得所需結構之化合物A之方法,則無特別限定。作為上述製造方法,例如可列舉如下方法:準備如日本專利特開平11-246627號公報等所記載之具有醛結構之化合物(化合物(1)),對化合物1添加含氰基化合物使之進行反應。作為上述化合物(1),可列舉具有吲哚-3-甲醛結構之化合物等。又,作為上述含氰基化合物,可列舉氰基乙酸乙酯或丙二腈等。The manufacturing method of the said compound A is not specifically limited if it is a method which can obtain the compound A of a desired structure. Examples of the production method include a method of preparing a compound (compound (1)) having an aldehyde structure as described in Japanese Patent Application Laid-Open No. 11-246627, and adding a cyano-containing compound to Compound 1 for reaction. . Examples of the compound (1) include compounds having an indole-3-carbaldehyde structure. Examples of the cyano-containing compound include ethyl cyanoacetate and malononitrile.

作為上述化合物A之最大吸收波長,只要為能夠吸收400 nm附近之光者,則無限制,可設為350 nm以上且420 nm以下。最大吸收波長較佳為設為360 nm以上且420 nm以下,較佳為380 nm以上且410 nm以下,較佳為390 nm以上且410 nm以下,較佳為395 nm以上且405 nm以下。其原因在於:藉由上述最大吸收波長為上述範圍內,上述化合物A能夠有效地吸收400 nm附近之光。The maximum absorption wavelength of the compound A is not limited as long as it can absorb light in the vicinity of 400 nm, and it can be set to 350 nm or more and 420 nm or less. The maximum absorption wavelength is preferably 360 nm or more and 420 nm or less, preferably 380 nm or more and 410 nm or less, preferably 390 nm or more and 410 nm or less, and more preferably 395 nm or more and 405 nm or less. The reason is that the above-mentioned compound A can effectively absorb light around 400 nm by the above-mentioned maximum absorption wavelength being within the above-mentioned range.

上述最大吸收波長可藉由依據JIS K0115測定吸光度而獲得。上述最大吸收波長例如可藉由如下方式而獲得:準備以成為1.0×10-5 mol/L之濃度之方式將化合物A溶解於溶劑(氯仿)中而得者作為評價用樣品,繼而,將評價用樣品填充於石英槽(光程長度10 mm,厚度1.25 mm),使用吸光光度計(例如,U-3900(Hitachi High-Tech Science公司製造)對吸光度進行測定。最大吸收波長可於250 nm以上且600 nm以下之範圍進行測定。The maximum absorption wavelength can be obtained by measuring the absorbance in accordance with JIS K0115. The above-mentioned maximum absorption wavelength can be obtained, for example, by preparing Compound A dissolved in a solvent (chloroform) so as to have a concentration of 1.0 × 10 -5 mol / L as a sample for evaluation, and then evaluating A sample is filled in a quartz cell (optical path length 10 mm, thickness 1.25 mm), and the absorbance is measured using an absorbance photometer (for example, U-3900 (manufactured by Hitachi High-Tech Science). The maximum absorption wavelength can be above 250 nm The measurement was performed in a range of 600 nm or less.

作為上述化合物A之400 nm下之吸光度,可視上述化合物A之用途等適當地設定,例如較佳為0.3以上,其中,較佳為0.4以上,尤佳為0.5以上。其原因在於:上述化合物A能夠有效率地吸收400 nm附近之光。作為吸光度之測定方法,可使用與最大吸收波長之測定方法相同之方法。The absorbance at 400 nm of the above-mentioned compound A can be appropriately set depending on the use of the above-mentioned compound A. For example, it is preferably 0.3 or more, of which 0.4 or more is preferable, and 0.5 or more is particularly preferable. The reason is that the above-mentioned compound A can efficiently absorb light around 400 nm. As a method for measuring the absorbance, the same method as that for measuring the maximum absorption wavelength can be used.

作為上述化合物A之450 nm下之吸光度,只要為能夠吸收400 nm附近之光者,則無限制,可設為0.1以下,其中,較佳為0.05以下,尤佳為0.01以下。The absorbance at 450 nm of the compound A is not limited as long as it can absorb light in the vicinity of 400 nm, and may be set to 0.1 or less. Among them, 0.05 or less is preferred, and 0.01 or less is particularly preferred.

作為上述化合物A之350 nm下之吸光度,只要為能夠吸收400 nm附近之光者即可,可設為0.4以下,其中,較佳為0.3以下,尤佳為0.2以下。As the absorbance at 350 nm of the compound A, any material capable of absorbing light in the vicinity of 400 nm may be used, and may be set to 0.4 or less. Among them, 0.3 or less is preferred, and 0.2 or less is particularly preferred.

作為上述化合物A之300 nm下之吸光度,只要為能夠吸收400 nm附近之光者即可,可設為0.3以下,其中,較佳為0.1以下,尤佳為0.05以下。As the absorbance at 300 nm of the compound A, any material capable of absorbing light in the vicinity of 400 nm may be used, and it may be set to 0.3 or less. Among them, 0.1 or less is preferable, and 0.05 or less is particularly preferable.

作為上述化合物A之包含最大吸收波長之吸收峰之半值寬,只要為能夠吸收400 nm附近之光者,則無限制,例如可設為100 nm以下,其中,較佳為80 nm以下,尤佳為10 nm以上且60 nm以下。其原因在於:藉由上述半值寬為上述範圍,上述化合物A成為能夠有效率地吸收400 nm附近之光者。作為吸收峰之測定方法,可使用與最大吸收波長之測定方法相同之方法。又,半值寬可設為於包含最大吸收波長之吸收峰中成為最大吸收波長下之吸光度(最大吸收峰)之一半之波長之寬度。The half-value width of the absorption peak including the maximum absorption wavelength of the compound A is not limited as long as it can absorb light around 400 nm. For example, it can be set to 100 nm or less. Among them, 80 nm or less is more preferable. It is 10 nm or more and 60 nm or less. The reason is that, as the half-value width is in the above range, the compound A can efficiently absorb light in the vicinity of 400 nm. As a method for measuring the absorption peak, the same method as that for measuring the maximum absorption wavelength can be used. The half-value width may be a width of a wavelength that becomes one half of the absorbance (maximum absorption peak) at the maximum absorption wavelength among the absorption peaks including the maximum absorption wavelength.

作為上述化合物A之常壓下之10%重量減少溫度,只要為具有所需揮散性者,則無限制,可視化合物A之用途等適當設定,例如較佳為250℃以上,其中,較佳為300℃以上,尤佳為350℃以上。其原因在於:上述化合物A成為揮散性較低者。作為上述10%重量減少溫度之上限,由於越高越佳,因此無特別限定,例如可設為450℃以下。
關於常壓下之重量減少溫度,可使用示差熱-熱重量同步測定裝置針對試樣約5 mg於氮氣200 mL/min氛圍下以升溫初始溫度30℃、升溫結束溫度500℃、升溫速度10℃/min進行升溫時之試樣測定熱減少量,將相對於30℃時點之試樣重量減量10%之時點之溫度設為10%重量減少溫度。作為示差熱-熱重量同步測定裝置,只要為能夠精度良好地測定熱減少量者即可,例如可使用SII NanoTechnology公司製造之型號:EXSTAR TG/DTA6200。
As the 10% weight reduction temperature of the above-mentioned compound A under normal pressure, there is no limitation as long as it has the required volatility, and it can be appropriately set depending on the application of the compound A, for example, preferably 250 ° C or higher. Above 300 ° C, particularly preferably above 350 ° C. The reason for this is that the above-mentioned compound A has a lower volatility. The upper limit of the 10% weight reduction temperature is not particularly limited because it is higher, and may be, for example, 450 ° C or lower.
Regarding the weight reduction temperature under normal pressure, a differential thermal-thermogravimetric simultaneous measurement device can be used for a sample of about 5 mg in a nitrogen atmosphere of 200 mL / min at an initial temperature of 30 ° C, an end temperature of 500 ° C, and a rate of 10 ° C. The heat reduction amount of the sample was measured when the temperature was raised, and the temperature at the time when the weight loss of the sample was 10% relative to the time point at 30 ° C was set as the 10% weight reduction temperature. The differential thermal-thermogravimetric simultaneous measurement device may be any device that can accurately measure the heat reduction amount. For example, a model manufactured by SII NanoTechnology: EXSTAR TG / DTA6200 can be used.

作為上述化合物A之吸光度維持率,可視化合物A之用途等適當設定,越高越佳,例如較佳為60%以上,較佳為70%以上,其中,較佳為80%以上,尤佳為90%以上。其原因在於:上述化合物A成為耐光性優異者。
吸光度維持率可使用下述(1)~(3)之方法。
(1)將化合物A及熱塑性之聚甲基丙烯酸甲酯(PMMA)溶解於二氯甲烷中,並加入至培養皿中使之乾燥,準備作為評價用樣品之化合物A之濃度為3.8質量%之PMMA膜(100 μm)。
(2)對評價用樣品照射氙光240小時。
(3)針對氙光照射前後之評價用樣品,測定化合物A之上述最大吸收波長下之吸光度變化,並計算吸光度維持率(照射後吸光度/照射前吸光度)。
The absorbance maintenance rate of the above compound A can be appropriately set depending on the use of the compound A, and the higher the better, for example, it is preferably 60% or more, preferably 70% or more, of which 80% or more is particularly preferable More than 90. The reason is that the above-mentioned compound A is excellent in light resistance.
The following methods (1) to (3) can be used for the absorbance maintenance ratio.
(1) Compound A and thermoplastic polymethyl methacrylate (PMMA) are dissolved in dichloromethane and added to a petri dish to be dried, and the concentration of Compound A to be prepared as an evaluation sample is 3.8% by mass. PMMA film (100 μm).
(2) The sample for evaluation was irradiated with xenon light for 240 hours.
(3) For evaluation samples before and after irradiation with xenon light, the change in absorbance at the above-mentioned maximum absorption wavelength of Compound A was measured, and the absorbance maintenance ratio (absorbance after irradiation / absorbance before irradiation) was calculated.

氙光之照射例如可使用氙氣耐候試驗機「ATLAS Weather-Ometer Ci4000」(東洋精機製作所(股)製造)。
作為氙光之照射條件,可列舉以下條件。
放射照度:0.55 W/m2 (波長340 nm)
試驗槽內溫度:62℃
試驗槽內相對濕度:50%
For the irradiation of xenon light, for example, a xenon weather tester "ATLAS Weather-Ometer Ci4000" (manufactured by Toyo Seiki Seisakusho Co., Ltd.) can be used.
Examples of the irradiation conditions of xenon light include the following conditions.
Irradiance: 0.55 W / m 2 (wavelength 340 nm)
Temperature in test tank: 62 ℃
Relative humidity in the test tank: 50%

作為上述化合物A之用途,可用作吸收400 nm附近之光之光吸收劑。作為使用此種光吸收劑之更具體之用途,例如可列舉CD-R、DVD-R、DVD+R、BD-R(Blu-ray Disc Recordable,藍光可錄光碟)等光學記錄介質之記錄層等光記錄材料、液晶顯示裝置(LCD)、電漿顯示面板(PDP)、電致發光顯示器(ELD)、陰極管顯示裝置(CRT)、螢光顯示管、場發射型顯示器等圖像顯示裝置、分析裝置、半導體裝置製造用、天文觀測用、光通信用、眼鏡片、窗等各種用途中所使用之光學濾光器、墨水、塗料、塗佈劑、密封劑、光纖、汽車內外裝材料、建材等。
作為上述液晶顯示裝置(LCD)中所使用之光學濾光器,可列舉彩色濾光片等。又,作為上述電致發光顯示器中所使用之光學濾光器,可列舉防止彩色濾光片、有機電致發光元件(有機EL元件)之光劣化之用途等。
上述用途之中,較佳為上述光學濾光器,其中,較佳為防止有機EL元件之光劣化之用途中所使用之光學濾光器。其原因在於:能夠穩定地保護上述有機EL元件免於光劣化。
As the above-mentioned compound A, it can be used as a light absorber that absorbs light near 400 nm. As a more specific application using such a light absorber, for example, a recording layer of an optical recording medium such as CD-R, DVD-R, DVD + R, or BD-R (Blu-ray Disc Recordable) And other optical recording materials, liquid crystal display devices (LCD), plasma display panels (PDP), electroluminescence displays (ELD), cathode tube display devices (CRT), fluorescent display tubes, field emission displays and other image display devices Optical filters, inks, coatings, coating agents, sealants, optical fibers, automotive interior and exterior materials used in various applications such as analysis equipment, semiconductor device manufacturing, astronomical observation, optical communication, eyeglass lenses, and windows , Building materials, etc.
Examples of the optical filter used in the liquid crystal display device (LCD) include a color filter and the like. Moreover, as an optical filter used for the said electroluminescent display, the use which prevents the light deterioration of a color filter and an organic electroluminescence element (organic EL element), etc. are mentioned.
Among the above applications, the above-mentioned optical filter is preferred, and among them, an optical filter used in an application for preventing light degradation of an organic EL element is preferred. The reason is that the organic EL element can be stably protected from light deterioration.

B.光吸收劑
繼而,針對本發明之光吸收劑進行說明。
本發明之光吸收劑之特徵在於包含上述化合物A。藉由包含上述化合物A,上述光吸收劑成為400 nm附近之光之吸收性更優異者。
以下,針對本發明之光吸收劑所包含之各成分詳細地進行說明。
B. Light Absorbent Next, the light absorbent of the present invention will be described.
The light absorber of the present invention is characterized by including the above-mentioned compound A. By including the above-mentioned compound A, the above-mentioned light absorber becomes more excellent in light absorptivity in the vicinity of 400 nm.
Hereinafter, each component contained in the light absorber of this invention is demonstrated in detail.

1.化合物A
作為上述化合物A之含量,只要為能夠對光吸收劑賦予所需光吸收性者,則無特別限定。作為上述含量,可於光吸收劑100質量份中設為100質量份,即上述光吸收劑設為上述化合物A。又,上述含量亦可於光吸收劑100質量份中包含未達100質量份,即光吸收劑亦可為包含上述化合物A及其他成分之組合物,例如可設為多於10質量份且99質量份以下,較佳為50質量份以上且95質量份以下。
於本說明書中,於未特別申明之情形時,含量為質量基準。
Compound A
The content of the compound A is not particularly limited as long as it can provide a desired light absorbency to the light absorber. The content can be 100 parts by mass in 100 parts by mass of the light absorbent, that is, the light absorber can be the compound A. In addition, the above-mentioned content may include less than 100 parts by mass in 100 parts by mass of the light absorbent, that is, the light absorber may be a composition containing the above-mentioned compound A and other components. For example, it may be more than 10 parts by mass and 99 It is preferably 50 parts by mass or more and 95 parts by mass or less.
In this specification, when there is no special declaration, the content is a mass basis.

上述光吸收劑中所包含之上述化合物A之種類可僅為1種,亦可為2種以上。上述種類例如可設為2種以上且5種以下。作為上述光吸收劑包含2種上述化合物A之例,例如可列舉包含上述化合物A1及化合物A2者、包含n=1之化合物A及n=2之化合物A者、包含取代吲哚環之氫原子之取代基具有聚合性基之化合物及不具有聚合性基之化合物者等。The type of the compound A contained in the light absorber may be only one kind, or two or more kinds. The above-mentioned types may be, for example, two or more and five or less. Examples of the light absorber containing the two types of the above-mentioned compound A include, for example, those containing the above-mentioned compound A1 and compound A2, those containing the compound A of n = 1 and compound A of the n = 2, and hydrogen atoms including a substituted indole ring. Compounds in which the substituent has a polymerizable group, compounds without a polymerizable group, and the like.

關於上述化合物A,由於可設為與「A.化合物」項中記載之內容相同,因此省略此處之說明。The above compound A can be the same as that described in the item "A. Compound", and therefore description thereof will be omitted.

2.其他成分
上述光吸收劑係包含上述化合物A者,但亦可為視需要而包含其他成分者。作為此種其他成分,例如可列舉下文所述「C.組合物」之「2.樹脂」及「3.其他成分」項中記載之內容等。
2. Other Components The light absorber includes the compound A described above, but may include other components as necessary. Examples of such other components include those described in the items "2. Resin" and "3. Other components" in the "C. Composition" described below.

上述光吸收劑之形狀可為粉末狀,亦可為顆粒狀。
於為顆粒狀之情形時,作為上述光吸收劑之製造方法,例如可使用如下方法:使用擠出機等將上述化合物A及樹脂進行混合,其後,成型為顆粒狀。
The shape of the light absorbing agent may be powder or granular.
In the case of a pellet, as the method for producing the light absorber, for example, the following method can be used: the compound A and the resin are mixed using an extruder or the like, and then molded into a pellet.

C.組合物
繼而,針對本發明之組合物進行說明。
本發明之組合物之特徵在於包含上述化合物A、及樹脂。藉由包含上述化合物A,上述組合物成為400 nm附近之光之吸收性更優異者。
以下,針對本發明之組合物中所包含之各成分詳細地進行說明。
C. Composition Next, the composition of the present invention will be described.
The composition of the present invention is characterized by including the above-mentioned compound A and a resin. By including the above-mentioned compound A, the above-mentioned composition becomes a more excellent absorber of light in the vicinity of 400 nm.
Hereinafter, each component contained in the composition of this invention is demonstrated in detail.

1.化合物A
作為上述化合物A之含量,只要為能夠對組合物賦予所需光吸收性者,則無特別限定。作為上述含量,例如可相對於組合物之固形物成分100質量份設為0.05質量份以上且10質量份以下,較佳為0.1質量份以上且5質量份以下。其原因在於:藉由上述含量為上述範圍,能夠對樹脂等有效率地賦予400 nm附近之光之吸收能。所謂固形物成分,係包含除溶劑以外之所有成分者。
Compound A
The content of the compound A is not particularly limited as long as it can provide a desired light absorption property to the composition. The content may be, for example, 0.05 parts by mass or more and 10 parts by mass or less with respect to 100 parts by mass of the solid component of the composition, and preferably 0.1 parts by mass or more and 5 parts by mass or less. The reason is that, when the content is in the above range, it is possible to efficiently give resin or the like the absorption energy of light in the vicinity of 400 nm. The so-called solid component refers to all components except for the solvent.

上述組合物中所包含之上述化合物A之種類可僅為1種,亦可為2種以上。上述種類例如可設為2種以上且5種以下。The kind of the compound A contained in the composition may be only one kind, or two or more kinds. The above-mentioned types may be, for example, two or more and five or less.

關於上述化合物A,由於可設為與「A.化合物」項中記載之內容相同,因此省略此處之說明。The above compound A can be the same as that described in the item "A. Compound", and therefore description thereof will be omitted.

2.樹脂
藉由上述組合物包含上述樹脂,能夠穩定地保持上述化合物A。其結果,上述組合物例如容易形成包含上述化合物A之膜、成形體等。作為此種樹脂,只要為能夠穩定地保持化合物A者即可,例如可列舉具有聚合性基之聚合性化合物、不具有聚合性基之聚合物等。
2. Resin The compound A can stably hold the compound A by including the resin. As a result, the composition can easily form, for example, a film, a molded body, or the like containing the compound A. As such a resin, any compound can be used as long as it can stably hold Compound A, and examples thereof include a polymerizable compound having a polymerizable group and a polymer having no polymerizable group.

(1)聚合性化合物
上述聚合性化合物係具有聚合性基者,藉由使聚合性基彼此聚合,可進行高分子量化,而能夠穩定地保持上述化合物A。上述聚合性化合物係根據上述聚合性基之種類、即聚合反應之種類而不同者,例如可列舉具有自由基聚合性基之自由基聚合性化合物、具有陽離子聚合性基之陽離子聚合性化合物、具有陰離子聚合性基之陰離子聚合性化合物等。
(1) Polymerizable compound The polymerizable compound has a polymerizable group. By polymerizing the polymerizable groups with each other, the molecular weight can be increased, and the compound A can be stably held. The polymerizable compound is different depending on the type of the polymerizable group, that is, the type of the polymerization reaction, and examples thereof include a radical polymerizable compound having a radical polymerizable group, a cationic polymerizable compound having a cation polymerizable group, and An anionic polymerizable compound and the like.

(1-1)自由基聚合性化合物
自由基聚合性化合物係具有自由基聚合性基者。
作為上述自由基聚合性基,只要為能夠藉由自由基進行聚合者,則無限制,例如可列舉(甲基)丙烯醯基、乙烯基等乙烯性不飽和基等。(甲基)丙烯醯基可以包括丙烯醯基及甲基丙烯醯基之含義來使用。
上述自由基聚合性化合物可設為具有1個以上自由基聚合性基者,可使用具有1個自由基聚合性基之單官能化合物、具有2個以上自由基聚合性基之多官能化合物。
(1-1) Radical Polymerizable Compound A radical polymerizable compound is one having a radical polymerizable group.
The radical polymerizable group is not limited as long as it can be polymerized by a radical, and examples thereof include ethylenically unsaturated groups such as a (meth) acrylfluorenyl group and a vinyl group. The (meth) acrylfluorenyl group can be used including the meaning of acrylmethylene and methacrylmethyl.
The radical polymerizable compound may be one having one or more radical polymerizable groups, and a monofunctional compound having one radical polymerizable group or a polyfunctional compound having two or more radical polymerizable groups may be used.

作為上述自由基聚合性化合物,可使用具有酸值之化合物、不具有酸值之化合物等。作為上述具有酸值之化合物,例如可列舉(甲基)丙烯酸等具有羧基等之(甲基)丙烯酸酯化合物。作為上述不具有酸值之化合物,可列舉環氧丙烯酸酯樹脂、(甲基)丙烯酸-2-羥基乙酯等不具有羧基等之(甲基)丙烯酸酯化合物。As said radically polymerizable compound, the compound which has an acid value, the compound which does not have an acid value, etc. can be used. Examples of the compound having an acid value include a (meth) acrylate compound having a carboxyl group and the like such as (meth) acrylic acid. Examples of the compound having no acid value include (meth) acrylate compounds having no carboxyl group, such as epoxy acrylate resin and 2-hydroxyethyl (meth) acrylate.

上述自由基聚合性化合物可單獨使用或將2種以上混合使用。例如,自由基聚合性化合物可將具有乙烯性不飽和基且具有酸值之化合物及具有乙烯性不飽和基且不具有酸值之化合物組合使用。關於自由基聚合性化合物,於將2種以上混合使用之情形時,亦可預先使該等共聚而製成共聚物來使用。作為此種自由基聚合性化合物等,更具體而言,可列舉日本專利特開2016-176009號公報所記載之自由基聚合性化合物等。The said radically polymerizable compound can be used individually or in mixture of 2 or more types. For example, the radically polymerizable compound may be a combination of a compound having an ethylenically unsaturated group and an acid value and a compound having an ethylenically unsaturated group and a non-acid value. Regarding the radically polymerizable compound, when two or more kinds are mixed and used, they may be copolymerized in advance to be used as a copolymer. Specific examples of such a radical polymerizable compound include the radical polymerizable compound described in Japanese Patent Laid-Open No. 2016-176009.

(1-2)陽離子聚合性化合物
陽離子聚合性化合物係具有陽離子聚合性基者。
作為上述陽離子聚合性基,只要為能夠藉由陽離子進行聚合者,則無限制,例如可列舉環氧基、氧雜環丁烷基、乙烯醚基等。作為陽離子聚合性化合物,例如可列舉具有環氧基之環氧化合物及具有氧雜環丁烷基之氧雜環丁烷化合物等具有環狀醚基之化合物、以及具有乙烯醚基之乙烯基醚化合物等。
(1-2) Cationic polymerizable compound A cationically polymerizable compound is one having a cationic polymerizable group.
The cation polymerizable group is not limited as long as it can be polymerized by a cation, and examples thereof include an epoxy group, an oxetanyl group, and a vinyl ether group. Examples of the cationically polymerizable compound include a compound having a cyclic ether group such as an epoxy compound having an epoxy group and an oxetane compound having an oxetanyl group, and a vinyl ether having a vinyl ether group. Compounds etc.

上述陽離子聚合性化合物可設為具有1個以上陽離子聚合性基者,可使用具有1個陽離子聚合性基之單官能化合物、具有2個以上陽離子聚合性基之多官能化合物。作為此種陽離子聚合性化合物等,更具體而言,可列舉日本專利特開2016-176009號公報所記載之陽離子聚合性化合物等。
關於陽離子聚合性化合物,於將2種以上混合使用之情形時,亦可預先使該等共聚而製成共聚物來使用。
陽離子聚合性化合物可與光陽離子起始劑、熱陽離子起始劑等陽離子起始劑一起使用。
The cationically polymerizable compound may be one having one or more cationically polymerizable groups, and a monofunctional compound having one cationically polymerizable group or a polyfunctional compound having two or more cationically polymerizable groups may be used. Specific examples of such a cationically polymerizable compound include a cationically polymerizable compound described in Japanese Patent Laid-Open No. 2016-176009.
Regarding the cationically polymerizable compound, when two or more kinds are mixed and used, these may be copolymerized in advance to be used as a copolymer.
The cationically polymerizable compound can be used together with a cationic initiator such as a photocationic initiator and a thermal cationic initiator.

(1-3)陰離子聚合性化合物
陰離子聚合性化合物係具有陰離子聚合性基者。
作為上述陰離子聚合性基,只要為能夠藉由陰離子進行聚合者即可,可列舉環氧基、內酯基等。作為上述陰離子聚合性化合物,例如可列舉具有環氧基之環氧化合物、具有內酯基之內酯化合物、具有(甲基)丙烯醯基之化合物等。
上述陰離子聚合性化合物可設為具有1個以上陰離子聚合性基者,可使用具有1個上述聚合性基之單官能化合物、具有2個以上上述聚合性基之多官能化合物。
作為上述內酯化合物,可列舉β-丙內酯、ε-己內酯等。
作為環氧化合物,可使用上述作為陽離子聚合性化合物所例示之環氧化合物。又,作為具有(甲基)丙烯醯基之化合物,可使用上述作為自由基聚合性化合物所例示者。
關於陰離子聚合性化合物,於將2種以上混合使用之情形時,亦可預先使該等共聚而製成共聚物來使用。
(1-3) Anionic polymerizable compound The anionic polymerizable compound is an anionic polymerizable group.
The anionic polymerizable group may be any polymer that can be polymerized by an anion, and examples thereof include an epoxy group and a lactone group. Examples of the anionic polymerizable compound include an epoxy compound having an epoxy group, a lactone compound having a lactone group, and a compound having a (meth) acrylfluorenyl group.
The anionic polymerizable compound may be one having one or more anionic polymerizable groups, and a monofunctional compound having one of the polymerizable groups and a polyfunctional compound having two or more of the polymerizable groups may be used.
Examples of the lactone compound include β-propiolactone and ε-caprolactone.
As the epoxy compound, the epoxy compounds exemplified above as the cationically polymerizable compound can be used. As the compound having a (meth) acrylfluorenyl group, those exemplified as the radical polymerizable compound described above can be used.
Regarding an anionic polymerizable compound, when two or more kinds are mixed and used, they may be copolymerized in advance to be used as a copolymer.

(2)不具有聚合性基之聚合物
上述聚合物係不具有聚合性基者。
作為此種聚合物,只要為包含重複結構者即可,可列舉具有感光性之感光性樹脂、不具有感光性之非感光性樹脂等。
(2) Polymer without polymerizable group The polymer described above does not have a polymerizable group.
As such a polymer, any polymer may be used as long as it includes a repeating structure, and examples thereof include a photosensitive resin having a photosensitive property and a non-photosensitive resin having no photosensitive property.

(2-1)感光性樹脂
上述感光性樹脂係具有感光性者,例如可列舉與酸產生劑一起使用、並藉由酸之作用實現酯基或縮醛基等之化學鍵之切斷等,而向對顯影液之溶解性增加之方向變化的正型樹脂。作為正型樹脂,例如可使用日本專利特開2016-89085號公報所記載之抗蝕劑基質樹脂或化合物等。
(2-1) Photosensitive resin The above-mentioned photosensitive resin is photosensitive, and examples thereof include use with an acid generator and cleavage of chemical bonds such as an ester group or an acetal group by the action of an acid. Positive resin that changes in the direction of increasing solubility in the developer. As the positive resin, for example, a resist matrix resin or a compound described in Japanese Patent Laid-Open No. 2016-89085 can be used.

(2-2)非感光性樹脂
作為上述非感光性樹脂,只要為不具有感光性者即可,例如可列舉:聚碳酸酯(PC)、聚對苯二甲酸乙二酯(PET)、聚醚碸、聚乙烯醇縮丁醛、聚乙烯基吡咯啶酮、聚乙烯醇、聚氯乙烯、苯乙烯-丁二烯共聚物、聚苯乙烯、聚苯醚、聚醯胺、聚醯胺醯亞胺、聚醚醯亞胺、降烯系樹脂、丙烯酸系樹脂、聚甲基丙烯酸甲酯等甲基丙烯酸樹脂、異丁烯順丁烯二酸酐共聚樹脂、環狀烯烴系等熱塑性樹脂。又,亦可使用明膠、酪蛋白、澱粉、纖維素衍生物、海藻酸等天然高分子材料。進而,亦可使用上述聚合性化合物之聚合物。即,上述組合物亦可為包含上述化合物A、及聚合性化合物之組合物之硬化物。
(2-2) Non-photosensitive resin As the above-mentioned non-photosensitive resin, as long as it does not have photosensitivity, examples thereof include polycarbonate (PC), polyethylene terephthalate (PET), and polyethylene. Ether ether, polyvinyl butyral, polyvinyl pyrrolidone, polyvinyl alcohol, polyvinyl chloride, styrene-butadiene copolymer, polystyrene, polyphenylene ether, polyamine, polyamine Methacrylic resins such as imine, polyetherimide, norbornene-based resins, acrylic resins, polymethyl methacrylate, isobutylene maleic anhydride copolymer resins, and cyclic olefin-based thermoplastic resins. In addition, natural polymer materials such as gelatin, casein, starch, cellulose derivatives, and alginic acid can also be used. Furthermore, a polymer of the polymerizable compound may be used. That is, the said composition may be hardened | cured of the composition containing the said compound A and a polymerizable compound.

(2-3)聚合物
上述聚合物之重量平均分子量(Mw)係視組合物之用途等適當設定,例如可設為1500以上,可設為1500以上且300000以下。
上述重量平均分子量Mw例如可使用Tosoh(股)製造之HLC-8120GPC,將溶出溶劑設為添加有0.01莫耳/公升之臭化鋰之N-甲基吡咯啶酮,將校正曲線用聚苯乙烯標準設為Mw377400、210500、96000、50400、20650、10850、5460、2930、1300、580(以上為Polymer Laboratories公司製造之Easi PS-2系列)及Mw1090000(Tosoh(股)製造),將測定管柱設為TSK-GEL ALPHA-M×2根(Tosoh(股)製造)進行測定而獲得。測定溫度可設為40℃,流速可設為1.0 mL/min。
(2-3) Polymer The weight average molecular weight (Mw) of the polymer is appropriately set depending on the use of the composition and the like, and may be, for example, 1,500 or more, and 1,500 or more and 300,000 or less.
The weight average molecular weight Mw can be, for example, HLC-8120GPC manufactured by Tosoh Co., Ltd., the dissolution solvent is N-methylpyrrolidone to which 0.01 mol / liter lithium odor is added, and polystyrene for the calibration curve The standards are set to Mw377400, 210500, 96000, 50400, 20650, 10850, 5460, 2930, 1300, 580 (the above is the Easi PS-2 series manufactured by Polymer Laboratories) and Mw1090000 (manufactured by Tosoh). TSK-GEL ALPHA-M x 2 (manufactured by Tosoh) was measured and obtained. The measurement temperature can be set to 40 ° C, and the flow rate can be set to 1.0 mL / min.

(3)其他樹脂
作為上述樹脂,亦可使用矽系、胺基甲酸酯系、丙烯酸系等之黏著劑、聚乙烯醇縮丁醛接著劑、乙烯-乙酸乙烯酯系接著劑等公知之黏合劑。於使用上述黏合劑之情形時,可視需要使用金屬螯合物系、異氰酸酯系、環氧系等之交聯劑作為硬化劑。
(3) Other resins As the above resins, well-known adhesives such as silicon-based, urethane-based, acrylic-based adhesives, polyvinyl butyral adhesives, ethylene-vinyl acetate-based adhesives, etc. can also be used. Agent. When the above-mentioned adhesive is used, a cross-linking agent such as a metal chelate system, an isocyanate system, or an epoxy system may be used as a hardener, if necessary.

(4)其他
上述組合物係包含上述化合物A、及樹脂者,化合物A及樹脂可使用未藉由共價鍵鍵結者,亦可為藉由共價鍵鍵結者。
例如,作為樹脂,可列舉於其結構中具備環氧基、胺基、羧基及羥基等反應性官能基之丙烯酸系樹脂或甲基丙烯酸樹脂,可使具有能夠與上述反應性官能基反應而形成共價鍵之基之化合物A對該樹脂進行反應,以化合物A及樹脂之鍵結體之形式而使用。
例如,於下文所述之實施例1中,可添加3-溴丙酸等代替1,8-二溴辛烷,製作具有羧基之化合物A,並使其鍵結於具有羥基之樹脂。
又,亦可使用具有羥基之化合物作為化合物A,並使其鍵結於具有環氧基、胺基、羧基等之樹脂。
作為上述具有反應性官能基之樹脂,可為具有聚合性基者,亦可為不具有聚合性基者。
又,作為上述具有反應性官能基之樹脂,可使用聚合物。作為此種聚合物之重量平均分子量,可設為與上述「(2)不具有聚合性基之聚合物」項所記載之內容相同。
關於可作為上述具有反應性官能基之樹脂而使用之具有反應性官能基之聚合物之具體例,可列舉東亞合成公司製造之ARUFON UG-4035、ARUFON UG-4010、ARUFON UG-4070、ARUFON UH-2000、ARUFON UH-2041、ARUFON UH-2170、ARUFON UP-1000等。
(4) The other composition includes the compound A and the resin. The compound A and the resin may be those which are not bonded by a covalent bond, or those which are bonded by a covalent bond.
For example, examples of the resin include an acrylic resin or a methacrylic resin having a reactive functional group such as an epoxy group, an amine group, a carboxyl group, and a hydroxyl group in the structure, and the resin can be formed by having a reaction with the reactive functional group. Covalently bonded compound A reacts with this resin, and is used in the form of compound A and a bonded body of the resin.
For example, in Example 1 described below, 3-bromopropanoic acid or the like may be added instead of 1,8-dibromooctane to prepare a compound A having a carboxyl group and bond it to a resin having a hydroxyl group.
A compound having a hydroxyl group may be used as the compound A and bonded to a resin having an epoxy group, an amine group, a carboxyl group, or the like.
The resin having a reactive functional group may be one having a polymerizable group or one having no polymerizable group.
As the resin having a reactive functional group, a polymer can be used. The weight-average molecular weight of such a polymer may be the same as that described in the item "(2) A polymer having no polymerizable group".
Specific examples of the polymer having a reactive functional group that can be used as the resin having a reactive functional group include ARUFON UG-4035, ARUFON UG-4010, ARUFON UG-4070, and ARUFON UH manufactured by Toa Kosei Corporation. -2000, ARUFON UH-2041, ARUFON UH-2170, ARUFON UP-1000, etc.

3.其他成分
上述組合物係包含上述化合物A者,亦可視需要包含其他成分。作為此種成分,可列舉紫外線吸收劑、起始劑等。
3. Other Ingredients Where the above composition contains the above-mentioned compound A, other ingredients may also be included as necessary. Examples of such components include ultraviolet absorbers and initiators.

(1)紫外線吸收劑
上述組合物藉由包含紫外線吸收劑,能夠穩定地吸收紫外線區域至400 nm附近之高能量之光。其結果,上述組合物例如於用作為了防止有機EL元件之劣化所使用之光學濾光器之情形時,能夠有效地防止劣化。
作為上述紫外線吸收劑,可使用作為紫外線吸收劑而普遍使用者。例如,可較佳地使用最大吸收波長未達350 nm者。關於最大吸收波長之測定方法,可設為與上述「A.化合物」項記載之方法相同。
(1) Ultraviolet absorbent The composition described above can stably absorb high-energy light in the ultraviolet region to around 400 nm by including an ultraviolet absorber. As a result, when the composition is used as an optical filter for preventing deterioration of an organic EL element, for example, the composition can effectively prevent the deterioration.
As the said ultraviolet absorber, it is common to use as an ultraviolet absorber. For example, those whose maximum absorption wavelength is less than 350 nm can be preferably used. The measurement method of the maximum absorption wavelength can be the same as the method described in the above-mentioned "A. Compound".

作為上述紫外線吸收劑,具體而言,可列舉日本專利特開2017-008221號公報中記載之2-羥基二苯甲酮類、2-(2'-羥基苯基)苯并三唑類、苯甲酸酯類及三芳基三類等、或日本專利特開2002-97224號公報中記載之苯并三唑系紫外線吸收劑及二苯甲酮系紫外線吸收劑等。
又,作為上述紫外線吸收劑,亦可使用藉由加熱處理等表現出紫外線吸收能力之潛在性紫外線吸收劑。作為此種潛在性紫外線吸收劑,例如可使用國際公開第2014/021023號公報中記載之作為潛在性添加劑而記載者。
Specific examples of the ultraviolet absorber include 2-hydroxybenzophenones, 2- (2'-hydroxyphenyl) benzotriazoles, and benzene described in Japanese Patent Laid-Open No. 2017-008221. Formates, triaryls, etc., or benzotriazole-based ultraviolet absorbers and benzophenone-based ultraviolet absorbers described in Japanese Patent Laid-Open No. 2002-97224.
Moreover, as said ultraviolet absorber, a latent ultraviolet absorber which shows an ultraviolet absorption ability by heat processing etc. can also be used. As such a latent ultraviolet absorber, for example, those described in International Publication No. 2014/021023 can be used as a latent additive.

作為上述紫外線吸收劑之含量,只要為能夠對組合物賦予所需紫外線吸收性者,則無限制,例如可設為與作為上述化合物A之含量而記載之內容相同。作為上述紫外線吸收劑相對於化合物A之質量比率(紫外線吸收劑/化合物A),只要為能夠對組合物賦予所需光吸收性者即可,為1以上或1以下均不存在問題,例如可設為0.1以上且10以下。The content of the ultraviolet absorber is not limited as long as it can impart desired ultraviolet absorbency to the composition, and for example, it may be the same as that described as the content of the compound A. The mass ratio of the ultraviolet absorber to the compound A (ultraviolet absorber / compound A) may be any material capable of imparting a desired light absorbency to the composition, and there is no problem if it is 1 or more. It is set to 0.1 or more and 10 or less.

(2)起始劑
上述組合物藉由包含起始劑,例如容易用作硬化性組合物。
作為此種起始劑,只要為能夠使聚合性化合物進行聚合者即可,例如可列舉:可與自由基聚合性化合物一起添加之自由基聚合起始劑、可與陽離子聚合性化合物一起添加、或可與感光性化合物一起製成酸產生劑而添加之陽離子聚合起始劑、可與陰離子聚合性化合物一起添加之陰離子聚合起始劑等。
作為上述自由基聚合起始劑及陽離子聚合起始劑等,更具體而言,可使用日本專利特開2016-176009號公報中記載之自由基聚合起始劑及陽離子起始劑等。又,作為上述陰離子聚合起始劑等,更具體而言,可列舉日本專利特開2017-073389號公報中記載之光陰離子聚合起始劑、熱陰離子聚合起始劑等。
(2) Initiator The above-mentioned composition is easily used as a curable composition, for example, by including an initiator.
As such an initiator, any polymer that can polymerize a polymerizable compound may be used, and examples thereof include a radical polymerization initiator that can be added together with a radical polymerizable compound, a polymerizable compound that can be added together with a cationic polymerizable compound, Or a cationic polymerization initiator which can be added together with a photosensitive compound as an acid generator, an anionic polymerization initiator which can be added together with an anionic polymerizable compound, and the like.
As the above-mentioned radical polymerization initiator, cationic polymerization initiator, and the like, more specifically, a radical polymerization initiator and a cationic initiator described in Japanese Patent Application Laid-Open No. 2016-176009 can be used. Moreover, as said anionic polymerization initiator etc., more specifically, the photoanion polymerization initiator, thermal anion polymerization initiator, etc. which are described in Unexamined-Japanese-Patent No. 2017-073389 are mentioned.

(3)其他
作為上述其他成分,亦可包含除紫外線吸收劑、起始劑以外之成分,例如可列舉溶劑、著色劑、無機化合物、使著色劑、無機化合物等分散之分散劑、鏈轉移劑、增感劑、界面活性劑、矽烷偶合劑等添加劑。關於上述添加劑,可使用公知之材料,例如可使用國際公開第2014/021023號公報中記載者。
再者,溶劑亦可包含能夠使上述各成分溶解或分散之溶劑。作為溶劑,係於25℃、大氣壓下為液狀且能夠使組合物之各成分分散或溶解者。又,溶劑係不與化合物A及樹脂等反應者。因此,例如分類為聚合性化合物者即便於25℃、大氣壓下為液狀,於本發明之組合物中亦不屬於溶劑。
又,作為上述其他成分,亦可包含消光劑、光穩定劑。
作為上述消光劑及光穩定劑,例如可列舉日本專利特開2016-160387號公報中記載之鎳衍生物等消光劑、受阻胺化合物(HALS)等。
(3) Others As the other components described above, components other than the ultraviolet absorber and the initiator may be included, and examples thereof include solvents, colorants, inorganic compounds, dispersants, and chain transfer agents that disperse colorants and inorganic compounds. , Sensitizer, surfactant, silane coupling agent and other additives. About the said additive, a well-known thing can be used, For example, what is described in International Publication No. 2014/021023 can be used.
The solvent may include a solvent capable of dissolving or dispersing the above-mentioned components. The solvent is a liquid at 25 ° C. under atmospheric pressure and capable of dispersing or dissolving each component of the composition. In addition, solvents are those which do not react with compound A, resin, and the like. Therefore, for example, even if it is classified as a polymerizable compound at 25 ° C and atmospheric pressure, it is not a solvent in the composition of the present invention.
Moreover, as said other component, a matting agent and a light stabilizer may be contained.
Examples of the matting agent and light stabilizer include matting agents such as nickel derivatives described in Japanese Patent Application Laid-Open No. 2016-160387, and hindered amine compounds (HALS).

4.組合物
作為上述組合物之製造方法,只要為能夠將上述各成分分散性良好地混合之方法,則無限制,可使用藉由公知之攪拌手段進行混合之方法。例如,於樹脂為熱塑性樹脂之情形時,可使用一面使用擠出機等使樹脂塑化一面將樹脂及化合物A進行混合之方法。又,於包含聚合性化合物之聚合物作為樹脂之情形時,可列舉如下方法:準備包含上述化合物A及聚合性化合物、及視需要之起始劑之組合物,其後,對上述組合物進行硬化處理。作為硬化處理,於包含光聚合起始劑作為起始劑之情形時,可列舉曝光處理,於包含熱聚合起始劑作為起始劑之情形時,可列舉加熱處理。
4. Composition As a method for producing the composition, as long as it is a method capable of mixing the above-mentioned components with good dispersibility, there is no limitation, and a method of mixing by a known stirring means can be used. For example, when the resin is a thermoplastic resin, a method of mixing the resin and the compound A while plasticizing the resin using an extruder or the like can be used. In the case where a polymer containing a polymerizable compound is used as a resin, a method may be mentioned in which a composition containing the above-mentioned compound A and a polymerizable compound and an optional starter is prepared, and then the composition is subjected to Hardened. As the hardening treatment, when a photopolymerization initiator is included as the initiator, exposure treatment may be mentioned, and when a thermal polymerization initiator is included as the initiator, heat treatment may be mentioned.

作為上述組合物之用途,可設為與上述「1.化合物A」項記載之內容相同。The use of the composition can be the same as that described in the above item "1. Compound A".

D.光學濾光器
繼而,針對本發明之光學濾光器進行說明。
本發明之光學濾光器之特徵在於具有包含上述化合物A之光吸收層。藉由上述光吸收層包含上述化合物A,上述光學濾光器成為400 nm附近之光之吸收性更優異者。
以下,針對本發明之光學濾光器所包含之光吸收層詳細地進行說明。
D. Optical Filter Next, the optical filter of the present invention will be described.
The optical filter of the present invention is characterized by having a light absorbing layer containing the compound A described above. When the light absorbing layer contains the compound A, the optical filter is more excellent in light absorption around 400 nm.
Hereinafter, the light absorbing layer included in the optical filter of the present invention will be described in detail.

1.光吸收層
上述光吸收層係包含上述化合物A者。
關於上述化合物A及其含量等,由於可設為與上述「C.組合物」項記載之內容相同,因此省略此處之說明。
上述光吸收層只要為包含化合物A者,則無限制,亦可為包含樹脂者。又,亦可為除化合物A及樹脂以外視需要包含其他成分者。關於此種樹脂及其他成分,可設為與上述「C.組合物」項記載之「2.樹脂」、「3.其他成分」項記載之內容相同。
1. Light absorbing layer The light absorbing layer includes the compound A described above.
About the said compound A, its content, etc., since it can be set as the content described in the said "C. composition" item, description here is abbreviate | omitted.
The light-absorbing layer is not limited as long as it contains Compound A, and it may also be a resin. In addition, other components may be included in addition to the compound A and the resin as necessary. Such a resin and other components may be the same as those described in the items "2. Resin" and "3. Other components" described in the above-mentioned "C. Composition".

關於上述光吸收層之俯視形狀、面積及厚度等形狀,可視光學濾光器之用途等適當設定。
作為上述光吸收層之形成方法,只要為能夠形成所需形狀、厚度之光吸收層者即可,可使用公知之塗膜之形成方法。作為上述形成方法,例如可使用如下方法:塗佈上述「C.組合物」項記載之組合物,並對塗膜進行乾燥處理、硬化處理等。
The shape, such as the planar shape, area, and thickness of the light absorbing layer, is appropriately set depending on the application of the optical filter.
As the method for forming the light absorbing layer, any one that can form a light absorbing layer having a desired shape and thickness may be used, and a known method for forming a coating film can be used. As the formation method, for example, a method of applying the composition described in the above-mentioned "C. Composition" item, and applying a drying treatment, a hardening treatment, or the like to the coating film can be used.

2.光學濾光器
上述光學濾光器可為僅包含上述光吸收層者,亦可為包含除上述光吸收層以外之其他層者。作為上述其他層,可列舉透明支持體、底塗層、抗反射層、硬塗層、潤滑層、黏著劑層等。關於此種各層之內容及其形成方法等,可設為於光學濾光器中普遍所使用者,例如可設為與日本專利特開2011-144280號公報、國際公開第2016/158639號等中記載之內容相同。
上述光吸收層例如亦可為用作將上述透明支持體及任意之各層之間接著之接著層等者。此時,上述光學濾光器亦可於作為接著層之光吸收層之表面設置易密接之聚對苯二甲酸乙二酯膜等公知之隔離膜。
2. Optical filter The optical filter may include only the light absorbing layer described above, or may include other layers other than the light absorbing layer described above. Examples of the other layers include a transparent support, an undercoat layer, an anti-reflection layer, a hard coat layer, a lubricant layer, and an adhesive layer. The contents of such layers and the method of forming them can be generally used in optical filters. For example, they can be used in Japanese Patent Laid-Open No. 2011-144280 and International Publication No. 2016/158639. The content is the same.
The light absorbing layer may be used as, for example, an adhesive layer for adhering the transparent support and any of the layers. At this time, the above-mentioned optical filter may be provided with a well-known isolation film such as a polyethylene terephthalate film which is easily adhered on the surface of the light absorbing layer as an adhesive layer.

上述光學濾光器於用作圖像顯示裝置用之情形時,通常可配置於顯示器之正面。例如,即便將光學濾光器直接貼附於顯示器之表面亦不存在問題,於在顯示器之前面設置有前面板或電磁波遮罩之情形時,可於前面板或電磁波遮罩之正側(外側)或背面側(顯示器側)貼附光學濾光器。又,亦可用作圖像顯示裝置所包含之各構件,例如彩色濾光片、偏光板等光學構件。進而,亦可為直接積層於上述圖像顯示裝置所包含之各構件者。When the above-mentioned optical filter is used for an image display device, it can usually be arranged on the front of the display. For example, there is no problem even if the optical filter is directly attached to the surface of the display. When a front panel or electromagnetic wave shield is provided on the front of the display, it can be on the front side (outside of the front panel or electromagnetic wave shield). ) Or the back side (display side) is attached with an optical filter. It can also be used as various members included in an image display device, for example, optical members such as a color filter and a polarizing plate. Furthermore, it is also possible to directly laminate each component included in the image display device.

本發明並不限定於上述實施形態。上述實施形態係例示,具有與本發明之申請專利範圍所記載之技術思想實質上相同之構成並發揮相同之作用效果者不論為何種形態,均包含於本發明之技術範圍中。
[實施例]
The invention is not limited to the embodiments described above. The embodiment described above is an example, and a person having substantially the same configuration and exhibiting the same effect as the technical idea described in the patent application scope of the present invention is included in the technical scope of the present invention regardless of the form.
[Example]

以下,列舉實施例及比較例進一步詳細地說明本發明,但本發明並不限定於該等實施例等。Hereinafter, the present invention will be described in more detail with examples and comparative examples, but the present invention is not limited to these examples and the like.

[實施例1]
將吲哚-3-甲醛(0.044 mol)及碳酸鉀(0.050 mol)加入至DMF(N,N-dimethylformamide,二甲基甲醯胺)(25 mL)中,並滴加1,8-二溴辛烷(0.020 mol)。於80℃下加熱9小時,其後,利用乙酸乙酯提取反應液,並將油層進行水洗。對來自油層之析出物進行過濾,並利用甲醇進行洗淨,獲得中間物。
繼而,將中間物(0.010 mol)、丙二腈(0.022 mol)、哌啶(0.0020 mol)加入至乙醇(50 mL)中,於80℃下加熱5小時。利用乙醇將反應液進行稀釋並對析出物進行過濾、乾燥,獲得下述式(11)所表示之化合物(以下,有時稱為化合物11)。
利用1 H-NMR及IR(Infrared Radiation,紅外線輻射)確認所獲得之固體為目標物。
將所獲得之化合物之1 H-NMR及IR測定結果示於下述表1及表2。
[Example 1]
Add indole-3-formaldehyde (0.044 mol) and potassium carbonate (0.050 mol) to DMF (N, N-dimethylformamide, dimethylformamide) (25 mL), and dropwise add 1,8-dibromo Octane (0.020 mol). After heating at 80 ° C for 9 hours, the reaction solution was extracted with ethyl acetate, and the oil layer was washed with water. The precipitate from the oil layer was filtered and washed with methanol to obtain an intermediate.
Then, the intermediate (0.010 mol), malononitrile (0.022 mol), and piperidine (0.0020 mol) were added to ethanol (50 mL), and the mixture was heated at 80 ° C. for 5 hours. The reaction solution was diluted with ethanol, and the precipitate was filtered and dried to obtain a compound represented by the following formula (11) (hereinafter, sometimes referred to as compound 11).
1 H-NMR and IR (Infrared Radiation) confirmed that the obtained solid was a target.
The 1 H-NMR and IR measurement results of the obtained compound are shown in Tables 1 and 2 below.

[實施例2]
使用5-溴-1-戊烯代替1,8-二溴辛烷,使用氰基乙酸乙酯代替丙二腈,除此以外,以與實施例1相同之方式獲得下述式(40)所表示之化合物(以下,有時稱為化合物40)。
利用1 H-NMR及IR確認所獲得之固體為目標物。
[Example 2]
Except that 5-bromo-1-pentene was used instead of 1,8-dibromooctane, and ethyl cyanoacetate was used instead of malononitrile, the same procedure as in Example 1 was carried out to obtain the compound represented by the following formula (40): (Hereinafter, sometimes referred to as compound 40).
The obtained solid was confirmed to be the target by 1 H-NMR and IR.

[實施例3]
使用氰基乙酸乙酯代替丙二腈,除此以外,以與實施例1相同之方式獲得下述式(41)所表示之化合物(以下,有時稱為化合物41)。
利用1 H-NMR及IR確認所獲得之固體為目標物。
[Example 3]
A compound represented by the following formula (41) (hereinafter, sometimes referred to as compound 41) was obtained in the same manner as in Example 1 except that ethyl cyanoacetate was used instead of malononitrile.
The obtained solid was confirmed to be the target by 1 H-NMR and IR.

[實施例4]
使用2-甲基吲哚-3-甲醛代替吲哚-3-甲醛,使用碘乙烷代替1,8-二溴辛烷,使用氰基乙酸烯丙酯代替丙二腈,除此以外,以與實施例1相同之方式獲得下述式(62)所表示之化合物(以下,有時稱為化合物62)。
利用1 H-NMR及IR確認所獲得之固體為目標物。
[Example 4]
In addition to using 2-methylindole-3-carboxaldehyde instead of indole-3-carboxaldehyde, iodoethane instead of 1,8-dibromooctane, and allyl cyanoacetate instead of malononitrile, A compound represented by the following formula (62) (hereinafter, sometimes referred to as compound 62) was obtained in the same manner as in Example 1.
The obtained solid was confirmed to be the target by 1 H-NMR and IR.

[實施例5]
使用2-苯基吲哚-3-甲醛代替吲哚-3-甲醛,使用2-溴甲基丙烯酸乙酯代替1,8-二溴辛烷,除此以外,以與實施例1相同之方式獲得下述式(64)所表示之化合物(以下,有時稱為化合物64)。
利用1 H-NMR及IR確認所獲得之固體為目標物。
[Example 5]
Except that 2-phenylindole-3-carbaldehyde was used instead of indole-3-carbaldehyde, and ethyl 2-bromomethacrylate was used instead of 1,8-dibromooctane, in the same manner as in Example 1 A compound represented by the following formula (64) (hereinafter, sometimes referred to as compound 64) is obtained.
The obtained solid was confirmed to be the target by 1 H-NMR and IR.

[實施例6]
使用3-溴丙酸代替1,8-二溴辛烷,除此以外,以與實施例1相同之方式獲得化合物。
繼而,將所獲得之化合物、三羥甲基乙烷(0.010 mol)及4-(二甲基胺基)吡啶(0.010 mol)加入至二氯甲烷(50 mL)中並冷卻至0℃。一面攪拌一面向其中加入二環己基碳二醯亞胺(0.035 mol)。其後,升溫至室溫,並攪拌5小時。自反應液過濾析出物,並利用稀鹽酸、飽和碳酸氫鈉水溶液對濾液進行洗淨。將有機層於減壓下進行脫溶劑,並利用甲醇進行晶析。將析出物進行過濾並進行乾燥,獲得下述式(68)所表示之化合物(以下,有時稱為化合物68)。
利用1 H-NMR及IR確認所獲得之固體為目標物。
[Example 6]
A compound was obtained in the same manner as in Example 1 except that 3-bromopropanoic acid was used instead of 1,8-dibromooctane.
Then, the obtained compound, trimethylolethane (0.010 mol) and 4- (dimethylamino) pyridine (0.010 mol) were added to dichloromethane (50 mL) and cooled to 0 ° C. While stirring, dicyclohexylcarbodiimide (0.035 mol) was added thereto. Thereafter, the temperature was raised to room temperature and stirred for 5 hours. The precipitate was filtered from the reaction solution, and the filtrate was washed with dilute hydrochloric acid and a saturated aqueous sodium hydrogen carbonate solution. The organic layer was desolvated under reduced pressure, and crystallized with methanol. The precipitate was filtered and dried to obtain a compound represented by the following formula (68) (hereinafter, sometimes referred to as compound 68).
The obtained solid was confirmed to be the target by 1 H-NMR and IR.

[化20]
[Chemical 20]

[表1]
[Table 1]

[表2]
[Table 2]

[實施例101]
使用3-溴丙酸代替1,8-二溴辛烷,除此以外,於以與實施例1相同之方式所獲得之化合物(0.020 mol)中加入1,4-苯二甲醇(0.010 mol)、THF(tetrahydrofuran,四氫呋喃)(50 mL)、及4-(二甲基胺基)吡啶(0.010 mol),並冷卻至0℃。一面攪拌一面向其中加入二環己基碳二醯亞胺(0.035 mol)。將溶劑進行蒸餾去除,並利用二氧化矽管柱(氯仿/甲醇=10/1)進行精製,其後,利用甲醇進行再結晶並進行乾燥,獲得下述式(101)所表示之化合物(以下,有時稱為化合物101)。
利用1 H-NMR及IR確認所獲得之固體為目標物。
[Example 101]
Except that 3-bromopropanoic acid was used instead of 1,8-dibromooctane, 1,4-benzenedimethanol (0.010 mol) was added to the compound (0.020 mol) obtained in the same manner as in Example 1. , THF (tetrahydrofuran, tetrahydrofuran) (50 mL), and 4- (dimethylamino) pyridine (0.010 mol), and cooled to 0 ° C. While stirring, dicyclohexylcarbodiimide (0.035 mol) was added thereto. The solvent was distilled off and purified using a silica column (chloroform / methanol = 10/1), and then, recrystallization was performed using methanol and dried to obtain a compound represented by the following formula (101) (hereinafter , Sometimes referred to as compound 101).
The obtained solid was confirmed to be the target by 1 H-NMR and IR.

[實施例102]
使用1,3-丙二醇代替1,4-苯二甲醇,除此以外,以與實施例101相同之方式獲得下述式(102)所表示之化合物(以下,有時稱為化合物102)。
利用1 H-NMR及IR確認所獲得之固體為目標物。
[Example 102]
A compound represented by the following formula (102) (hereinafter, sometimes referred to as compound 102) was obtained in the same manner as in Example 101 except that 1,3-propanediol was used instead of 1,4-benzenedimethanol.
The obtained solid was confirmed to be the target by 1 H-NMR and IR.

[實施例103]
使用甲基丙烯酸2-羥基-3-丙烯醯氧基丙酯代替1,4-苯二甲醇,除此以外,以與實施例101相同之方式獲得下述式(103)所表示之化合物(以下,有時稱為化合物103)。
利用1 H-NMR及IR確認所獲得之固體為目標物。
[Example 103]
A compound represented by the following formula (103) was obtained in the same manner as in Example 101 except that 2-hydroxy-3-propenyloxypropyl methacrylate was used instead of 1,4-benzenedimethanol. , Sometimes referred to as compound 103).
The obtained solid was confirmed to be the target by 1 H-NMR and IR.

[實施例104]
使用季戊四醇三丙烯酸酯代替1,4-苯二甲醇,除此以外,以與實施例101相同之方式獲得下述式(104)所表示之化合物(以下,有時稱為化合物104)。
[Example 104]
A compound represented by the following formula (104) (hereinafter, sometimes referred to as compound 104) was obtained in the same manner as in Example 101 except that pentaerythritol triacrylate was used instead of 1,4-benzenedimethanol.

[化21]
[Chemical 21]

[表3]
[table 3]

[表4]
[Table 4]

[比較例1]
準備下述通式(B1)所表示之化合物(以下,化合物B1)。
[Comparative Example 1]
A compound (hereinafter, compound B1) represented by the following general formula (B1) was prepared.

[化22]
[Chemical 22]

[評價1]
針對實施例及比較例之化合物進行吸光光譜測定,針對常壓下之10%重量減少溫度及吸光度維持率進行評價。
[Evaluation 1]
The compounds of the Examples and Comparative Examples were measured for absorption spectra, and evaluated for a 10% weight reduction temperature and absorbance maintenance rate at normal pressure.

1.吸光光譜
依據JIS K0115對實施例及比較例之化合物之吸光度進行測定。
具體而言,以成為1.0×10-5 mol/L之濃度之方式溶解於溶劑(氯仿)中,獲得評價用樣品。繼而,將所獲得之評價用樣品填充於石英池(光程長度10 mm、厚度1.25 mm)中,使用吸光光度計(例如,U-3900(Hitachi High-Tech Science公司製造))對各波長下之吸光度進行測定。將實施例1及比較例1之化合物之測定結果分別示於圖1及圖2。又,將實施例1之化合物即化合物11、實施例103之化合物即化合物103及比較例之化合物即化合物B1之最大吸收波長、半值寬及各波長下之吸光度之測定結果示於下述表3。吸光度測定係於250 nm以上且600 nm以下之範圍內進行測定。
1. Absorbance spectrum The absorbances of the compounds of Examples and Comparative Examples were measured in accordance with JIS K0115.
Specifically, it was dissolved in a solvent (chloroform) so as to have a concentration of 1.0 × 10 -5 mol / L, and a sample for evaluation was obtained. Next, the obtained evaluation sample is filled in a quartz cell (optical path length 10 mm, thickness 1.25 mm), and an absorbance photometer (for example, U-3900 (manufactured by Hitachi High-Tech Science)) is used for each wavelength. The absorbance was measured. The measurement results of the compounds of Example 1 and Comparative Example 1 are shown in FIG. 1 and FIG. 2, respectively. In addition, the measurement results of the maximum absorption wavelength, half-value width, and absorbance at each wavelength of the compound 11 of Example 1 as the compound of Example 103, the compound of Example 103 as the compound of Example 103, and the compound of Comparative Example as the compound B1 are shown in the following table. 3. The absorbance is measured within a range of 250 nm to 600 nm.

2.常壓下之10%重量減少溫度
針對實施例及比較例之化合物,以下述條件測定10%重量減少溫度。將結果示於下述表4。10%重量減少溫度越高,表示揮散性越低。
2. 10% weight reduction temperature under normal pressure For the compounds of Examples and Comparative Examples, the 10% weight reduction temperature was measured under the following conditions. The results are shown in Table 4 below. The higher the 10% weight reduction temperature, the lower the volatility.

(10%重量減少溫度之測定條件)
作為示差熱-熱重量同步測定裝置,使用SII NanoTechnology公司製造之型號:EXSTAR TG/DTA6200。
關於測定條件,將試樣約5 mg於氮氣200 mL/min氛圍下且於常壓下以升溫初始溫度30℃、升溫結束溫度500℃、升溫速度10℃/min進行升溫,針對此時之試樣測定熱減量,將相對於30℃時點之試樣重量減量了10%之時點之溫度設為10%重量減少溫度。
(10% weight reduction temperature measurement conditions)
As a differential thermal-thermogravimetric simultaneous measurement device, a model manufactured by SII NanoTechnology: EXSTAR TG / DTA6200 was used.
Regarding the measurement conditions, a sample of about 5 mg was heated under a nitrogen atmosphere of 200 mL / min and under normal pressure at an initial temperature of 30 ° C, an end temperature of 500 ° C, and a temperature increase rate of 10 ° C / min. The sample was measured for heat loss, and the temperature at the time when the weight was reduced by 10% relative to the weight of the sample at 30 ° C was set as the 10% weight reduction temperature.

3.吸光度維持率
針對實施例及比較例之化合物,以下述條件測定吸光度維持率,並以下述評價基準進行評價。將結果示於下述表5。吸光度維持率越高,表示耐光性越優異。
<評價基準>
○:超過60%
△:55%以上且60%以下
×:未達55%
3. Absorbance maintenance ratio For the compounds of Examples and Comparative Examples, the absorbance maintenance ratio was measured under the following conditions, and evaluated based on the following evaluation criteria. The results are shown in Table 5 below. The higher the absorbance maintenance rate, the better the light resistance.
< Evaluation criteria >
○: More than 60%
△: 55% or more and 60% or less ×: less than 55%

(吸光度維持率測定條件)
吸光度維持率係使用依序進行下述(1)~(3)之方法。
(1)準備添加有3.8質量%之化合物之聚甲基丙烯酸甲酯(PMMA)膜(100 μm)並作為評價用樣品。
(2)對評價用樣品照射氙光240小時。
(3)對氙光照射前後之評價用樣品之化合物A之最大吸收波長下之吸光度變化進行測定,並計算吸光度維持率(照射後吸光度/照射前吸光度)。
再者,氙光之照射係使用氙氣耐候試驗機「ATLAS Weather-Ometer Ci4000」(東洋精機製作所(股)製造)。
又,氙光照射條件係使用以下條件。
(Measurement conditions of absorbance maintenance rate)
The absorbance maintenance ratio is a method in which the following (1) to (3) are sequentially performed.
(1) A polymethylmethacrylate (PMMA) film (100 μm) to which 3.8% by mass of the compound was added was prepared as a sample for evaluation.
(2) The sample for evaluation was irradiated with xenon light for 240 hours.
(3) The absorbance change at the maximum absorption wavelength of the compound A of the evaluation sample before and after irradiation with xenon light was measured, and the absorbance maintenance ratio (absorbance after irradiation / absorbance before irradiation) was calculated.
The xenon light was irradiated using a xenon weathering tester "ATLAS Weather-Ometer Ci4000" (manufactured by Toyo Seiki Seisakusho Co., Ltd.).
The following conditions were used for the xenon light irradiation conditions.

(氙光照射條件)
放射照度:0.55 W/m2 (波長340 nm)
試驗槽內溫度:62℃
試驗槽內相對濕度:50%
(Xenon light irradiation conditions)
Irradiance: 0.55 W / m 2 (wavelength 340 nm)
Temperature in test tank: 62 ℃
Relative humidity in the test tank: 50%

[表5]
[table 5]

[表6]
[TABLE 6]

[表7]
[TABLE 7]

[評價2]
針對使用實施例及比較例之化合物之聚合性組合物,對硬化性、化合物與樹脂之相溶性、硬化時之釋氣及硬化物之吸光度維持率進行評價。
[Evaluation 2]
The polymerizable compositions using the compounds of the examples and comparative examples were evaluated for the hardenability, the compatibility between the compound and the resin, the outgassing during hardening, and the absorbance maintenance rate of the hardened product.

(聚合性組合物之製備)
將三羥甲基丙烷三丙烯酸酯42質量份、雙酚A型環氧丙烯酸酯(DAICEL-ALLNEX公司製造 EB3700)16質量份、三丙二醇二丙烯酸酯42質量份、調平劑(SH-29A)0.5質量份及自由基起始劑(Irgacure 907)5質量份進行混合,其後,添加將5質量份之化合物A或化合物B1與N,N-二甲基乙醯胺(DMAc)50質量份進行混合而成之溶液,於40℃下攪拌10分鐘,製備聚合性組合物。
(Preparation of polymerizable composition)
42 parts by mass of trimethylolpropane triacrylate, 16 parts by mass of bisphenol A epoxy acrylate (EB3700 manufactured by DAICEL-ALLNEX Corporation), 42 parts by mass of tripropylene glycol diacrylate, and leveling agent (SH-29A) 0.5 parts by mass and 5 parts by mass of a radical initiator (Irgacure 907) were mixed, and then 5 parts by mass of Compound A or Compound B1 and 50 parts by mass of N, N-dimethylacetamide (DMAc) were added. The mixed solution was stirred at 40 ° C for 10 minutes to prepare a polymerizable composition.

1.硬化性
於玻璃基板上旋轉塗佈(500 rpm,7秒鐘)上述聚合性組合物,並使用加熱板於90℃下進行120秒鐘預烘烤。使用高壓水銀燈(20 mW/cm2 )作為光源並以200 mJ/cm2 進行曝光,獲得評價用塗膜。
針對所獲得之評價用塗膜確認褶皺之有無,並以下述評價基準評價硬化性。將結果示於下述表6。
<評價基準>
〇:無褶皺。
×:殘留有褶皺。
可判斷:褶皺越少,由化合物A而引起之聚合性組合物之硬化阻礙越少。又,可判斷:其結果,可獲得穩定地保持有化合物A之硬化物。
1. Curability: The polymerizable composition was spin-coated (500 rpm, 7 seconds) on a glass substrate, and pre-baked at 90 ° C for 120 seconds using a hot plate. A high-pressure mercury lamp (20 mW / cm 2 ) was used as a light source and exposure was performed at 200 mJ / cm 2 to obtain a coating film for evaluation.
The presence or absence of wrinkles was confirmed about the obtained coating film for evaluation, and the curability was evaluated by the following evaluation criteria. The results are shown in Table 6 below.
< Evaluation criteria >
〇: No wrinkles.
×: Wrinkles remain.
It can be judged that the less the wrinkles, the less the hardening hindrance of the polymerizable composition caused by the compound A. Furthermore, it can be judged that as a result, a hardened material in which the compound A is stably held can be obtained.

2.相溶性
使用將5質量份之化合物A或化合物B1與5~150質量份之DMAc進行混合而成之溶液,除此以外,與上述聚合性組合物之製備相同地獲得聚合性組合物。於利用目視觀察所獲得之聚合性組合物時,根據用以製備無化合物A或化合物B1之析出之聚合性組合物所必需之DMAc之添加量,以下述評價基準評價化合物A或化合物B1與樹脂之相溶性。將結果示於下述表6。
〇:DMAc之添加量未達10質量份。
△:DMAc之添加量為10質量份以上且未達100質量份。
×:DMAc之添加量為100質量份以上。
可判斷:DMAc之添加量越少,化合物A與樹脂之相溶性越優異。又,可判斷:藉由化合物A於硬化物中更均勻地分散並保持,可獲得能夠穩定地吸收所需波長之光之硬化物。
2. Compatibility A polymerizable composition was obtained in the same manner as in the preparation of the polymerizable composition except that a solution obtained by mixing 5 parts by mass of Compound A or Compound B1 and 5 to 150 parts by mass of DMAc was used. When visually observing the obtained polymerizable composition, the compound A or the compound B1 and the resin were evaluated on the basis of the following evaluation criteria based on the amount of DMAc necessary to prepare a polymerizable composition without the precipitation of the compound A or compound B1. Of compatibility. The results are shown in Table 6 below.
〇: The amount of DMAc added is less than 10 parts by mass.
Δ: The amount of DMAc added is 10 parts by mass or more and less than 100 parts by mass.
×: The added amount of DMAc is 100 parts by mass or more.
It can be judged that the smaller the amount of DMAc added, the better the compatibility between Compound A and the resin. In addition, it can be judged that by compound A being more uniformly dispersed and held in the hardened material, a hardened material capable of stably absorbing light of a desired wavelength can be obtained.

3.釋氣
於玻璃基板上旋轉塗佈(500 rpm,7秒鐘)上述聚合性組合物,並使用加熱板於90℃下進行120秒鐘預烘烤。使用高壓水銀燈(20 mW/cm2 )作為光源,以200 mJ/cm2 進行曝光,獲得硬化膜。
於該硬化膜上設置0.7 mm之間隔物及玻璃基板,並使用加熱板以230℃進行2小時加熱。
加熱後,對設置於硬化膜上之玻璃基板之吸收光譜(400 nm)進行測定。根據400 nm之吸光度,以下述基準評價釋氣性。將結果示於下述表6。
〇:400 nm之吸光度未達0.1。
△:400 nm之吸光度為0.1以上且未達0.5。
×:400 nm之吸光度為0.5以上。
可判斷:400 nm之吸光度越低,化合物A之揮散性越低,化合物A越可於硬化物中穩定地保持。
3. The above polymerizable composition was spin-coated (500 rpm, 7 seconds) out of gas on a glass substrate, and pre-baked at 90 ° C for 120 seconds using a hot plate. A high-pressure mercury lamp (20 mW / cm 2 ) was used as a light source, and exposure was performed at 200 mJ / cm 2 to obtain a cured film.
A 0.7 mm spacer and a glass substrate were placed on the cured film, and heated at 230 ° C. for 2 hours using a hot plate.
After heating, the absorption spectrum (400 nm) of the glass substrate provided on the cured film was measured. Based on the absorbance at 400 nm, the outgassing property was evaluated on the following basis. The results are shown in Table 6 below.
〇: The absorbance at 400 nm does not reach 0.1.
Δ: The absorbance at 400 nm is 0.1 or more and less than 0.5.
×: The absorbance at 400 nm is 0.5 or more.
It can be judged that the lower the absorbance at 400 nm, the lower the volatility of Compound A, and the more stable Compound A can be maintained in the hardened material.

4.硬化物之吸光度維持率
使用藉由與上述「1.硬化性」之評價相同之方法所製作之評價用塗膜代替評價用樣品,除此以外,以與上述[評價1]之「1.吸光度維持率」相同之條件求出吸光度維持率。根據所獲得之吸光度維持率,以下述評價基準評價硬化物之吸光度維持率。將結果示於下述表6。
〇:超過60%
△:55%以上且60%以下
×:未達55%
再者,可判斷:吸光度維持率越高,硬化物中之化合物A之揮散性越低,化合物A越可於硬化物中穩定地保持。
4. The absorbance maintenance rate of the cured product is replaced by the evaluation coating film produced by the same method as the evaluation of "1. Hardenability" described above, except that "1 of" Evaluation 1 "is used. The "absorbance maintenance ratio" was obtained under the same conditions. Based on the obtained absorbance maintenance rate, the absorbance maintenance rate of the hardened | cured material was evaluated by the following evaluation criteria. The results are shown in Table 6 below.
〇: more than 60%
△: 55% or more and 60% or less ×: less than 55%
Furthermore, it can be judged that the higher the absorbance maintenance rate, the lower the volatility of the compound A in the hardened material, and the more stable the compound A can be maintained in the hardened material.

[表8]
[TABLE 8]

[彙總]
根據表3及圖1,可確認:實施例1之化合物11例如於400 nm下之吸光度較比較例1之化合物B1高,400 nm附近之光之吸收性優異。根據表4,可確認:實施例1之化合物11及實施例101~103之化合物101~103為耐熱性優異者。
根據表5,可確認:實施例之化合物為吸光度維持率優異者。
根據表6,可確認:使用實施例之化合物之聚合性組合物為硬化性、化合物與樹脂之相溶性優異、化合物A之揮散性較低、硬化物之吸光度維持率優異者。
根據以上結果,可確認:包含化合物A及樹脂之組合物會穩定地吸收400 nm附近之光,例如,於將該組合物用作光學濾光器之情形時,能夠穩定地阻止400 nm附近之光之透過。
[產業上之可利用性]
[Summary]
From Table 3 and FIG. 1, it can be confirmed that, for example, the compound 11 of Example 1 has a higher absorbance at 400 nm than the compound B1 of Comparative Example 1, and has excellent absorbance of light near 400 nm. From Table 4, it was confirmed that the compound 11 of Example 1 and the compounds 101 to 103 of Examples 101 to 103 were excellent in heat resistance.
From Table 5, it can be confirmed that the compounds of the examples are those having excellent absorbance maintenance.
From Table 6, it can be confirmed that the polymerizable composition using the compound of the example is one having excellent curability, excellent compatibility between the compound and the resin, low volatility of the compound A, and excellent absorbance maintenance rate of the cured product.
From the above results, it was confirmed that the composition containing Compound A and the resin can stably absorb light near 400 nm. For example, when the composition is used as an optical filter, it can stably block the light near 400 nm. The transmission of light.
[Industrial availability]

本發明會發揮出能夠提供400 nm附近之光之吸收性優異之化合物的效果。The present invention exerts an effect of providing a compound having excellent light absorptivity in the vicinity of 400 nm.

圖1係實施例1之化合物之吸光光譜。FIG. 1 is an absorption spectrum of the compound of Example 1. FIG.

圖2係比較例1之化合物之吸光光譜。 FIG. 2 is an absorption spectrum of the compound of Comparative Example 1. FIG.

Claims (11)

一種化合物,其以下述通式(A)表示: [化1] (式中,Ar為吲哚環, R1 表示氰基、-COOR、-OCOR、-CONHR、-NHCOR、-COONHR、-NHCOOR、-COR、-SO2 R、-SOR、-SO2 NRR'、鹵素原子、硝基或膦醯基, R及R'分別獨立表示氫原子、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基, R2 表示氫原子、鹵素原子、氰基、硝基、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基, R及R'以及R2 所表示之烷基、芳基、芳烷基及含雜環基中之亞甲基可被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR''-、>P=O、-S-S-、-SO2 -或該等之組合,R''表示氫原子或碳原子數1~8之烷基, R及R'以及R2 所表示之烷基、芳基、芳烷基及含雜環基中之氫原子可被取代為乙烯性不飽和基、鹵素原子、醯基、醯氧基、取代胺基、磺醯胺基、磺醯基、羧基、氰基、磺基、羥基、硝基、巰基、醯亞胺基、胺甲醯基、磺醯胺基、膦酸基、磷酸基、或羧基、磺基、膦酸基或者磷酸基之鹽, n表示1~10之整數, X表示n價基)。A compound represented by the following general formula (A): (In the formula, Ar is an indole ring, and R 1 represents cyano, -COOR, -OCOR, -CONHR, -NHCOR, -COONHR, -NHCOOR, -COR, -SO 2 R, -SOR, -SO 2 NRR ' , Halogen atom, nitro or phosphino, R and R 'each independently represent a hydrogen atom, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, and an arane having 7 to 30 carbon atoms Or a heterocyclic group containing 2 to 20 carbon atoms, R 2 represents a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, carbon Aralkyl groups having 7 to 30 atoms or heterocyclic groups having 2 to 20 carbon atoms, alkyl groups, aryl groups, aralkyl groups, and methylene groups containing heterocyclic groups represented by R and R ′ and R 2 Can be substituted with carbon-carbon double bonds, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O- , -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-,- NR ''-,> P = O, -SS-, -SO 2 -or a combination thereof, R '' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and R and R 'and R 2 represent Hydrogen atoms in alkyl, aryl, aralkyl and heterocyclic groups can be substituted with ethylenically unsaturated groups, halogens Element atom, fluorenyl, fluorenyloxy, substituted amine, sulfonamido, sulfonium, carboxyl, cyano, sulfo, hydroxyl, nitro, thiol, sulfinolimino, carbamoyl, sulfonium Amine group, phosphonic acid group, phosphate group, or salt of carboxyl group, sulfo group, phosphonic acid group or phosphate group, n represents an integer of 1 to 10, and X represents an n-valent group). 如請求項1之化合物,其中上述化合物為下述通式(A1)、(A2)或(A3)所表示之化合物: [化2] (式中,R1 、R2 、R、R'、n及X係與通式(A)中之R1 、R2 、R、R'、n及X相同, R3 及R4 表示氫原子、鹵素原子、氰基、硝基、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基, R5 及R55 分別獨立表示鹵素原子、氰基、硝基、碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或碳原子數2~20之含雜環基, R3 及R4 以及R5 及R55 所表示之烷基、芳基、芳烷基及含雜環基中之亞甲基可被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR''-、>P=O、-S-S-、-SO2 -或該等之組合,R''表示氫原子或碳原子數1~8之烷基, R3 及R4 以及R5 及R55 所表示之烷基、芳基、芳烷基及含雜環基中之氫原子可被取代為乙烯性不飽和基、鹵素原子、醯基、醯氧基、取代胺基、磺醯胺基、磺醯基、羧基、氰基、磺基、羥基、硝基、巰基、醯亞胺基、胺甲醯基、磺醯胺基、膦酸基、磷酸基、或羧基、磺基、膦酸基或者磷酸基之鹽, 5a表示0~4之整數, 55a表示0~3之整數)。The compound according to claim 1, wherein the compound is a compound represented by the following general formula (A1), (A2) or (A3): [化 2] (Wherein, R 1, R 2, R , R ', n and X-based formula (A), the R 1, R 2, R, R', and n and X, R 3 and R 4 represent hydrogen Atom, halogen atom, cyano, nitro, alkyl group with 1 to 40 carbon atoms, aryl group with 6 to 30 carbon atoms, aralkyl group with 7 to 30 carbon atoms or 2 to 20 carbon atoms Heterocyclic groups, R 5 and R 55 each independently represent a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, and an arane having 7 to 30 carbon atoms Or a heterocyclic group containing 2 to 20 carbon atoms, and the alkyl group, aryl group, aralkyl group, and methylene group in the heterocyclic group group represented by R 3 and R 4 and R 5 and R 55 may be substituted Carbon-carbon double bond, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S- CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR ''- ,> P = O, -SS-, -SO 2 -or a combination thereof, R "represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and R 3 and R 4 and R 5 and R 55 represent Hydrogen atoms in alkyl, aryl, aralkyl, and heterocyclic groups can be substituted with ethylenically unsaturated groups, halogen atoms, fluorenyl, and fluorene Group, substituted amino group, sulfoamido group, sulfoamido group, carboxyl group, cyano group, sulfo group, hydroxyl group, nitro group, mercapto group, fluorenimine group, carbamate group, sulfonamido group, phosphonic acid group, phosphoric acid 5a represents an integer of 0 to 4 and 55a represents an integer of 0 to 3), or a salt of a carboxyl group, a carboxyl group, a sulfo group, a phosphonic acid group, or a phosphate group. 如請求項1之化合物,其中上述化合物之常壓下之10%重量減少溫度為250℃以上。For example, the compound of claim 1, wherein the 10% weight reduction temperature of the above-mentioned compound under normal pressure is 250 ° C or more. 如請求項1之化合物,其中上述n為2~10之整數。The compound of claim 1, wherein n is an integer of 2-10. 如請求項4之化合物,其中上述X為碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或該等基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-而成之基。The compound of claim 4, wherein X is an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a methylene group in these groups is substituted with -O-,- S-, -CO-, -COO-, -OCO-. 如請求項2之化合物,其中上述R3 、R4 、R5 及R55 之至少1者為碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或者碳原子數2~20之含雜環基中之氫原子被取代為乙烯性不飽和基而成之基、或 碳原子數1~40之烷基、碳原子數6~30之芳基、碳原子數7~30之芳烷基或者碳原子數2~20之含雜環基中之亞甲基被取代為碳-碳雙鍵而成之基。The compound of claim 2, wherein at least one of the above R 3 , R 4 , R 5 and R 55 is an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 30 carbon atoms, and 7 to 30 carbon atoms. An aralkyl group of 30 or a hydrogen atom in a heterocyclic group containing 2 to 20 carbon atoms is substituted with an ethylenically unsaturated group, or an alkyl group having 1 to 40 carbon atoms and 6 to 6 carbon atoms An aryl group of 30, an aralkyl group of 7 to 30 carbon atoms, or a methylene group in a heterocyclic group containing 2 to 20 carbon atoms is substituted with a carbon-carbon double bond. 如請求項2之化合物,其中上述化合物為滿足下述(1)或(2)者: (1)為上述通式(A1)所表示之化合物,且n為2或3之整數,X為碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或該等基中之亞甲基被取代為-O-、-S-、-CO-、-COO-、-OCO-而成之基; (2)為上述通式(A3)所表示之化合物,且n為1,R4 為碳原子數1~10之烷基或者該等基中之1個氫原子被取代為乙烯性不飽和基而成之基、或碳原子數1~40之烷基中之亞甲基被取代為-COO-或者-OCO-且基中之氫原子被取代為乙烯性不飽和基而成之基。For example, the compound of claim 2, wherein the above compound satisfies the following (1) or (2): (1) is a compound represented by the above general formula (A1), and n is an integer of 2 or 3, and X is carbon An aliphatic hydrocarbon group having 1 to 35 atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a methylene group in these groups is substituted with -O-, -S-, -CO-, -COO-,- OCO-based group; (2) is a compound represented by the above general formula (A3), and n is 1, R 4 is an alkyl group having 1 to 10 carbon atoms or one hydrogen atom of these groups is A group substituted with an ethylenically unsaturated group or a methylene group in an alkyl group having 1 to 40 carbon atoms is replaced with -COO- or -OCO- and a hydrogen atom in the group is replaced with an ethylenically unsaturated group Base into base. 如請求項1之化合物,其中上述化合物於250 nm以上且600 nm以下之範圍內之最大吸收波長為350 nm以上且420 nm以下。For example, the compound of claim 1, wherein the maximum absorption wavelength of the above compound in a range of 250 nm to 600 nm is 350 nm to 420 nm. 一種光吸收劑,其含有如請求項1至8中任一項之化合物。A light absorbent containing the compound according to any one of claims 1 to 8. 一種組合物,其含有如請求項1至8中任一項之化合物、及 樹脂。A composition containing the compound according to any one of claims 1 to 8, and Resin. 一種光學濾光器,其具有含有如請求項1至8中任一項之化合物之光吸收層。An optical filter having a light absorbing layer containing the compound according to any one of claims 1 to 8.
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