TW201922717A - Compound, latent ultraviolet light absorber, composition, cured product, and cured product production method - Google Patents

Compound, latent ultraviolet light absorber, composition, cured product, and cured product production method Download PDF

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TW201922717A
TW201922717A TW107135078A TW107135078A TW201922717A TW 201922717 A TW201922717 A TW 201922717A TW 107135078 A TW107135078 A TW 107135078A TW 107135078 A TW107135078 A TW 107135078A TW 201922717 A TW201922717 A TW 201922717A
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金原有希子
岡田光裕
中屋敷哲千
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日商艾迪科股份有限公司
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    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D249/00Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
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    • C07D251/02Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
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    • C07ORGANIC CHEMISTRY
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    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
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    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
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Abstract

A compound shown in general formula (I-1). (In the formula, A represents an atom group having ultraviolet light absorption capacity, B represents a photoelimination group, and k represents an integer from 1 to 10). A composition containing a compound shown in general formula (I-2) and an elimination product derived from the photoelimination group. (In the formula, A represents the atom group having ultraviolet light absorption capacity, and k represents an integer from 1 to 10).

Description

化合物、潛在性紫外線吸收劑、組合物、硬化物及硬化物之製造方法Compound, latent ultraviolet absorber, composition, hardened material and method for manufacturing hardened material

本發明係關於一種硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。The present invention relates to a compound which has less resistance to hardening and can easily provide a UV-absorbing function to a hardened material.

為了提高硬化性組合物之紫外線吸收功能或耐熱性,已知有於硬化性組合物中添加紫外線吸收劑或抗氧化劑使其穩定化之方法(專利文獻1~3)。
先前技術文獻
專利文獻
In order to improve the ultraviolet absorbing function or heat resistance of the curable composition, a method is known in which a UV absorbent or an antioxidant is added to the curable composition and stabilized (Patent Documents 1 to 3).
Prior art literature patent literature

專利文獻1:日本專利特開2011-048382號公報
專利文獻2:US2016016919A1
專利文獻3:日本專利特開2015-108649號公報
Patent Document 1: Japanese Patent Laid-Open No. 2011-048382 Patent Document 2: US2016016919A1
Patent Document 3: Japanese Patent Laid-Open No. 2015-108649

然而,專利文獻1~3所記載之紫外線吸收劑存在有時會阻礙硬化性組合物之硬化之課題。
針對此種課題,本發明者等人發現:紫外線吸收劑具有吸收為了使硬化性組合物硬化而照射之光之作用;及由於具有此種作用,故而存在若將紫外線吸收劑添加於聚合系內,則會產生硬化阻礙之情形。
However, the ultraviolet absorbers described in Patent Documents 1 to 3 have a problem that they may hinder the curing of the curable composition.
In response to such a problem, the present inventors have found that an ultraviolet absorbent has a function of absorbing light irradiated to harden a curable composition; and because of such an effect, there is a case where an ultraviolet absorbent is added to a polymerization system. , There will be a situation of hardening obstacles.

作為上述課題之解決方法,已知有於聚合系內能夠將上述吸收光之作用不活性化且於硬化後將其活化之潛在性添加劑。
然而,能夠於硬化後活化之潛在性添加劑之活化存在必須加熱等之情形,結果存在要求更容易之活化之情形。
As a solution to the above-mentioned problem, a potential additive capable of deactivating the light absorption function in a polymerization system and activating it after curing is known.
However, the activation of a potential additive that can be activated after hardening may require heating or the like, and as a result, there may be a case where an easier activation is required.

本發明係鑒於上述課題而完成者,其主要目的在於提供一種硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。The present invention has been made in view of the above-mentioned problems, and its main object is to provide a compound which has less resistance to hardening and can easily provide a UV-absorbing function to a hardened material.

本發明者等人為了解決上述課題而進行了銳意研究,結果發現,藉由使用光脫離基作為保護基,利用該光脫離基保護紫外線吸收劑所含之酚性羥基,變得容易調整表現紫外線吸收功能之時期,而可解決上述課題,從而完成本發明。The present inventors conducted intensive research in order to solve the above-mentioned problems, and as a result, it was found that by using a light-releasing group as a protective group and using the light-releasing group to protect the phenolic hydroxyl group contained in the ultraviolet absorber, it becomes easy to adjust the expression of ultraviolet rays. The above-mentioned problems can be solved at the time of the absorption function, and the present invention has been completed.

即,本發明提供下述通式(I-1)所表示之化合物。That is, the present invention provides a compound represented by the following general formula (I-1).

[化1]
[Chemical 1]

(式中,A表示具有紫外線吸收功能之原子團,B表示光脫離基,k表示1~10之整數)(In the formula, A represents an atomic group having an ultraviolet absorbing function, B represents a light-releasing group, and k represents an integer of 1 to 10)

又,本發明提供含有上述通式(I-1)所表示之化合物之潛在性紫外線吸收劑。The present invention also provides a latent ultraviolet absorber containing a compound represented by the general formula (I-1).

又,本發明提供含有上述通式(I-1)所表示之化合物之組合物。The present invention also provides a composition containing a compound represented by the general formula (I-1).

又,本發明提供含有上述通式(I-1)所表示之化合物與聚合性化合物之組合物之硬化物。Moreover, this invention provides the hardened | cured material of the composition containing the compound represented by the said General formula (I-1) and a polymerizable compound.

又,本發明提供一種硬化物之製造方法,該硬化物之製造方法包括:使含有上述通式(I-1)所表示之化合物與聚合性化合物之組合物硬化而形成硬化物之步驟;及對上述硬化物照射光而使上述通式(I-1)所表示之化合物所含之光脫離基脫離之步驟。Moreover, this invention provides the manufacturing method of the hardened | cured material including the process of hardening the composition containing the compound represented by the said General formula (I-1) and a polymerizable compound, and forming a hardened | cured material; and A step of irradiating the hardened material with light to remove light-releasing groups contained in the compound represented by the general formula (I-1).

又,本發明提供含有下述通式(I-2)所表示之化合物(以下有時稱為「化合物I-2」)與源自光脫離基之脫離物(以下有時稱為「化合物B'」)之組合物(以下有時稱為「第2組合物」)。The present invention also provides a compound (hereinafter sometimes referred to as "compound B") containing a compound represented by the following general formula (I-2) (hereinafter sometimes referred to as "compound I-2") '") (Hereinafter sometimes referred to as" the second composition ").

[化2]
[Chemical 2]

(式中,A係具有紫外線吸收功能之原子團,k表示1~10之整數)(In the formula, A is an atomic group having an ultraviolet absorption function, and k represents an integer of 1 to 10)

本發明係關於一種化合物以及使用其之紫外線吸收劑、組合物、其硬化物、硬化物之製造方法及第2組合物。以下,對該等進行詳細說明。The present invention relates to a compound, a UV absorber, a composition using the same, a hardened product, a method for producing the hardened product, and a second composition. These will be described in detail below.

A.化合物
首先,對本發明之化合物進行說明。
本發明之化合物係以下述通式(I-1)表示(以下亦將本發明之化合物稱為化合物I-1)。
A. Compound First, the compound of the present invention will be described.
The compound of the present invention is represented by the following general formula (I-1) (hereinafter, the compound of the present invention is also referred to as compound I-1).

[化3]
[Chemical 3]

(式中,A係具有紫外線吸收功能之原子團,B係光脫離基,k表示1~10之整數)(In the formula, A is an atomic group having an ultraviolet absorbing function, B is a photodissociation group, and k represents an integer of 1 to 10)

本發明之化合物I-1係原子團A具有紫外線吸收功能者。本發明之化合物I-1於光脫離基B脫離前紫外線吸收功能較低,於光脫離基B脫離後,基於原子團A而表現出優異之紫外線吸收功能。
因此,於將光脫離基B脫離前之化合物I-1例如添加於聚合系內之情形時,化合物I-1因紫外線吸收功能較低,故為了聚合而照射之光之吸收功能較低,不易阻礙聚合系之硬化。
另一方面,本發明之化合物I-1藉由照射光,光脫離基脫離而表現出優異之紫外線吸收功能。因此,藉由對含有化合物I-1之硬化物進行光照射,可容易地對該硬化物賦予紫外線吸收功能。化合物I-1無需為了表現其紫外線吸收功能而進行加熱處理,因此具有不易因加熱而對硬化物及基材等其周邊構件造成損傷之優點。
基於以上理由,上述化合物I-1例如硬化阻礙較少,可對硬化物容易地賦予紫外線吸收功能等。
The compound I-1 atomic group A of the present invention has a function of absorbing ultraviolet rays. The compound I-1 of the present invention has a low ultraviolet absorption function before the light-release group B is released, and after the light-release group B is released, it exhibits an excellent ultraviolet absorption function based on the atomic group A.
Therefore, in the case where the compound I-1 before addition of the light-releasing group B is added to the polymerization system, for example, the compound I-1 has a low ultraviolet absorption function, and therefore the light absorption function of the light irradiated for polymerization is low, which is not easy. Prevents the hardening of the polymerization system.
On the other hand, the compound I-1 of the present invention exhibits an excellent ultraviolet absorbing function by irradiating light so that the light-releasing group is detached. Therefore, by irradiating the cured product containing the compound I-1 with light, it is possible to easily provide an ultraviolet absorbing function to the cured product. Compound I-1 does not need to be subjected to heat treatment in order to exhibit its ultraviolet absorbing function, and therefore has the advantage that it is difficult to cause damage to peripheral components such as the hardened material and the substrate due to heating.
For the above reasons, the compound I-1 has, for example, less resistance to hardening, and can easily provide an ultraviolet absorbing function to a hardened material.

又,本發明之化合物I-1於光脫離基B脫離前,為了表現感光性而照射之光之吸收功能較低。因此,於將化合物I-1添加於對鹼性顯影液之溶解性會因光照射發生變化之感光性組合物中之情形時,可穩定地表現感光性。又,上述化合物I-1藉由對感光性組合物實施光脫離基可脫離之光照射,而可容易地賦予紫外線吸收功能等。
如上所述,上述化合物I-1對於感光性組合物而言,感光性之表現阻礙較少,可對感光性組合物容易地賦予紫外線吸收功能等。
In addition, the compound I-1 of the present invention has a low absorption function of light irradiated before the light-releasing group B is released in order to exhibit sensitivity. Therefore, when compound I-1 is added to a photosensitive composition whose solubility in an alkaline developing solution changes due to light irradiation, the sensitivity can be stably expressed. Moreover, the said compound I-1 can provide a ultraviolet absorption function etc. easily by irradiating the photosensitive composition with the light-releasable group detachable light.
As described above, the above-mentioned compound I-1 has less hindrance to the performance of the photosensitive composition, and can easily provide an ultraviolet absorbing function to the photosensitive composition.

進而,本發明之化合物I-1藉由具有光脫離基B,例如可容易地調整組合物中之分散或溶解穩定性。
化合物I-1藉由以與組合物所含之其他成分之親和性提高之方式選擇光脫離基B,而可賦予組合物中之優異之分散性。
因此,上述化合物I-1可對組合物賦予優異之紫外線吸收功能,並且亦可賦予使用前之保存時等之優異之分散穩定性。
Furthermore, the compound I-1 of the present invention can easily adjust the dispersion or dissolution stability in the composition by having a photo-release group B, for example.
The compound I-1 can impart excellent dispersibility in the composition by selecting the photo-releasing group B in such a manner as to improve the affinity with other components contained in the composition.
Therefore, the above-mentioned compound I-1 can provide an excellent ultraviolet absorbing function to the composition, and can also provide excellent dispersion stability during storage before use and the like.

以下,對本發明之化合物I-1進行詳細說明。Hereinafter, the compound I-1 of the present invention will be described in detail.

1.光脫離基B
本發明之化合物I-1具有光脫離基B。
本發明中之光脫離基可設為藉由照射特定波長之光而能夠自化合物I-1脫離之基。若對化合物I-1照射特定波長之光,則光脫離基B自化合物I-1脫離,生成下述通式(I-2)所表示之含有羥基與具有紫外線吸收功能之原子團A之化合物。
1. Light off radical B
The compound I-1 of the present invention has a photo-releasing group B.
The light-releasing group in the present invention may be a group capable of being released from the compound I-1 by irradiating light of a specific wavelength. When the compound I-1 is irradiated with light of a specific wavelength, the light-releasing group B is detached from the compound I-1 to generate a compound represented by the following general formula (I-2) containing a hydroxyl group and an atomic group A having an ultraviolet absorption function.

[化4]
[Chemical 4]

(式中,A表示具有紫外線吸收功能之原子團,k表示1~10之整數)(In the formula, A represents an atomic group having an ultraviolet absorption function, and k represents an integer of 1 to 10)

光脫離基B自化合物I-1脫離之光之波長例如為紫外線或可見光線之波長區域。具體而言,可設為包含365 nm之波長者,更具體而言,可設為包含250 nm以上且450 nm以下之波長之光者,較佳可設為包含280 nm以上且380 nm以下之波長之光者。
為了將光脫離基B自上述化合物I-1脫離而照射之光之累計光量例如可設為1000 mJ/cm2 以上且10000 mJ/cm2 以下,較佳為1000 mJ/cm2 以上且5000 mJ/cm2 以下,更佳為2000 mJ/cm2 以上且4000 mJ/cm2 以下。其原因在於:關於為了使含有聚合性化合物等之組合物硬化而照射之光之累計光量,通常可設為未達1000 mJ/cm2 。因此,藉由累計光量為上述範圍,例如於光硬化性組合物中之應用變得容易。
再者,所謂光脫離基B脫離,只要可賦予所需之紫外線吸收功能即可,例如光脫離基之脫離率可設為50%以上,其中較佳為成為80%以上。其原因在於:於光硬化性組合物中之應用變得容易。
另一方面,上述化合物I-1中作為抑制光脫離之累計光量,只要可獲得所需之硬化阻礙抑制效果即可,可設為未達1000 mJ/cm2 。其原因在於:於光硬化性組合物中之應用變得容易。
又,所謂抑制光脫離,只要可獲得所需之硬化阻礙抑制效果即可,例如光脫離基B之脫離率可設為未達50%,其中較佳為成為20%以下。其原因在於:於光硬化性組合物中之應用變得容易。
關於上述累計光量,可製備化合物I-1之0.01質量%乙腈溶液,使用與實施例所記載之脫離率之測定方法相同之方法進行測定。
The wavelength of the light from which the light-releasing group B is detached from the compound I-1 is, for example, a wavelength region of ultraviolet rays or visible rays. Specifically, it may be set to include a wavelength of 365 nm, more specifically, it may be set to include a wavelength of 250 nm or more and 450 nm or less, and preferably, it may be set to include a wavelength of 280 nm or more and 380 nm or less. Light of wavelength.
The cumulative light amount of light irradiated in order to release the light-releasing group B from the compound I-1 may be, for example, 1,000 mJ / cm 2 or more and 10,000 mJ / cm 2 or less, and preferably 1000 mJ / cm 2 or more and 5000 mJ. / cm 2 or less, more preferably 2000 mJ / cm 2 or more and 4000 mJ / cm 2 or less. The reason for this is that the cumulative light amount of light irradiated to harden a composition containing a polymerizable compound or the like can usually be set to less than 1000 mJ / cm 2 . Therefore, when the cumulative light amount is within the above range, application to, for example, a photocurable composition becomes easy.
It should be noted that the so-called light-releasing group B may be detached as long as it can provide a desired ultraviolet absorbing function. For example, the light-releasing group may have a removal rate of 50% or more, and more preferably 80% or more. The reason is that application to a photocurable composition becomes easy.
On the other hand, in the compound I-1, the cumulative amount of light for suppressing light detachment may be as long as the desired hardening inhibitory effect is obtained, and may be set to less than 1000 mJ / cm 2 . The reason is that application to a photocurable composition becomes easy.
In addition, the so-called suppression of light detachment is only required to obtain the desired effect of inhibiting hardening. For example, the detachment rate of the light detachment group B may be less than 50%, and preferably 20% or less. The reason is that application to a photocurable composition becomes easy.
About the said cumulative light quantity, the 0.01 mass% acetonitrile solution of the compound I-1 can be prepared and measured using the same method as the measurement method of the detachment rate described in an Example.

作為滿足上述要件之光脫離基B,具體而言,可列舉下述通式(B-1)、(B-2)、(B-3)、(B-4)、(B-5)、(B-6)、(B-7)及(B-8)所表示之基。其中,較佳為下述通式(B-1-a)、(B-2-a)、(B-3-a)、(B-4)、(B-5)、(B-6)、(B-7-a)、(B-7-b)及(B-8-a)所表示之基,較佳為下述通式(B-1-a)所表示之基。其原因在於:藉由採用該等光脫離基,可自化合物I-1容易地脫離,而可對硬化物容易地賦予紫外線吸收功能等。又,作為滿足上述要件之光脫離基B,具體而言,亦可列舉下述通式(B-9)及(B-10)所表示之基。Specific examples of the light-releasing group B satisfying the above requirements include the following general formulae (B-1), (B-2), (B-3), (B-4), (B-5), (B-6), (B-7) and (B-8). Among them, the following general formulae (B-1-a), (B-2-a), (B-3-a), (B-4), (B-5), and (B-6) are preferred. The group represented by (B-7-a), (B-7-b), and (B-8-a) is preferably a group represented by the following general formula (B-1-a). The reason is that by using such a light-releasing group, the compound I-1 can be easily detached, and a cured product can be easily provided with an ultraviolet absorbing function. Further, as the light-releasing group B that satisfies the above-mentioned requirements, specifically, groups represented by the following general formulae (B-9) and (B-10) may be mentioned.

[化5]
[Chemical 5]

[化6]
[Chemical 6]

(式中,R11 、R13 、R16 、R18 、R19 、R20 、R23 、R26 及R28 分別獨立地表示鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基,
R12 、R14 、R17 、R21 、R22 、R24 、R25 、R27 、R29 及R30 分別獨立地表示氫原子、鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基,
R15 表示碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基,
R11 、R12 、R13 、R14 、R15 、R16 、R17 、R18 、R19 、R20 、R21 、R22 、R23 、R24 、R25 、R26 、R27 、R28 、R29 及R30 所表示之烷基及芳基烷基中之亞甲基存在被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR'-、>P=O、-S-S-、-SO2 -或該等之組合之情形,
R'表示氫原子或碳原子數1~8之烷基,
存在複數個R11 彼此、複數個R13 彼此、複數個R16 彼此、複數個R18 彼此、複數個R19 彼此、複數個R20 彼此、複數個R23 彼此、複數個R26 彼此及複數個R28 彼此分別鍵結而形成苯環或萘環之情形,
複數個R11 、R12 、R13 、R14 、R16 、R17 、R18 、R19 、R20 、R23 、R25 、R26 、R27 、R28 、R29 及R30 有分別相同之情形,有互不相同之情形,
b1、b2、b3、b6、b7、b8及b9分別獨立地表示0~4之整數,
b4及b5分別獨立地表示0~5之整數,
**表示與上述A-O-之鍵結位置)
(In the formula, R 11 , R 13 , R 16 , R 18 , R 19 , R 20 , R 23 , R 26 and R 28 each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, and the number of carbon atoms. An alkyl group of 1 to 40, an aryl group of 6 to 20 carbon atoms, an arylalkyl group of 7 to 20 carbon atoms, or a heterocyclic group containing 2 to 20 carbon atoms,
R 12 , R 14 , R 17 , R 21 , R 22 , R 24 , R 25 , R 27 , R 29, and R 30 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, and a carbon atom. An alkyl group having 1 to 40 atoms, an aryl group having 6 to 20 carbon atoms, an aryl alkyl group having 7 to 20 carbon atoms or a heterocyclic group containing 2 to 20 carbon atoms,
R 15 represents an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms or a heterocyclic group containing 2 to 20 carbon atoms,
R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 , R 22 , R 23 , R 24 , R 25 , R 26 , R 27 The methylene group in the alkyl group and the arylalkyl group represented by R 28 , R 29, and R 30 is substituted with a carbon-carbon double bond, -O-, -S-, -CO-, -O-CO -, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S -, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-,> P = O, -SS-, -SO 2 -or a combination of these,
R 'represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
There are plural R 11 each other, plural R 13 each other, plural R 16 each other, plural R 18 each other, plural R 19 each other, plural R 20 each other, plural R 23 each other, plural R 26 each other and plural When R 28 are bonded to each other to form a benzene ring or a naphthalene ring,
A plurality of R 11 , R 12 , R 13 , R 14 , R 16 , R 17 , R 18 , R 19 , R 20 , R 23 , R 25 , R 26 , R 27 , R 28 , R 29 and R 30 have The same situation, different situations,
b1, b2, b3, b6, b7, b8, and b9 each independently represent an integer from 0 to 4,
b4 and b5 each independently represent an integer from 0 to 5,
** indicates the bonding position with the above AO-)

[化6A]
[化 6A]

(式中,R31 及R40 分別獨立地表示鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基,
R32 、R33 、R41 、R42 、R43 、R44 分別獨立地表示氫原子、鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基,
R31 、R32 、R33 、R40 、R41 、R42 、R43 及R44 所表示之烷基及芳基烷基中之亞甲基存在被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR'-、>P=O、-S-S-、-SO2 -或該等之組合之情形,
上述烷基、芳基、芳基烷基及含雜環基存在具有取代基之情形,
c1表示0~5之整數,
c2表示0~4之整數,
**表示與上述A-O-之鍵結位置)
(In the formula, R 31 and R 40 each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, and 7 carbon atoms. Arylalkyl of -20 or heterocyclic group containing 2 to 20 carbon atoms,
R 32 , R 33 , R 41 , R 42 , R 43 , and R 44 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, and a carbon number. An aryl group of 6 to 20, an arylalkyl group of 7 to 20 carbon atoms, or a heterocyclic group containing 2 to 20 carbon atoms,
The methylene group in the alkyl group and the arylalkyl group represented by R 31 , R 32 , R 33 , R 40 , R 41 , R 42 , R 43 and R 44 is substituted with a carbon-carbon double bond, -O -, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-,> P = O, -SS-, -SO 2 -or a combination of these,
When the above-mentioned alkyl group, aryl group, arylalkyl group and heterocyclic group have substituents,
c1 represents an integer from 0 to 5,
c2 represents an integer from 0 to 4,
** indicates the bonding position with the above AO-)

作為上述R11 、R12 、R13 、R14 、R15 、R16 、R17 、R18 、R19 、R20 、R21 、R22 、R23 、R24 、R25 、R26 、R27 、R28 、R29 、R30 、R31 、R32 、R33 、R40 、R41 、R42 、R43 及R44 (以下有時將該等官能基總稱為R11 等)所表示之碳原子數1~40之烷基,可列舉:甲基、乙基、丙基、異丙基、丁基、第二丁基、第三丁基、異丁基、戊基、異戊基、第三戊基、環戊基、己基、2-己基、3-己基、環己基、4-甲基環己基、庚基、2-庚基、3-庚基、異庚基、第三庚基、1-辛基、異辛基、第三辛基及金剛烷基等。R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 , R 22 , R 23 , R 24 , R 25 , R 26 , R 27 , R 28 , R 29 , R 30 , R 31 , R 32 , R 33 , R 40 , R 41 , R 42 , R 43, and R 44 (hereinafter, these functional groups are collectively referred to as R 11, etc.) Examples of the alkyl group having 1 to 40 carbon atoms include methyl, ethyl, propyl, isopropyl, butyl, second butyl, third butyl, isobutyl, pentyl, and iso. Pentyl, third pentyl, cyclopentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 4-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, isoheptyl, Triheptyl, 1-octyl, isooctyl, third octyl and adamantyl, etc.

作為上述R11 等所表示之碳原子數6~20之芳基,例如可列舉:苯基、萘基及蒽基等。Examples of the aryl group having 6 to 20 carbon atoms represented by R 11 and the like include a phenyl group, a naphthyl group, and an anthryl group.

作為上述R11 等所表示之碳原子數7~20之芳基烷基,例如可列舉:苄基、茀基、茚基及9-茀基甲基等。Examples of the arylalkyl group having 7 to 20 carbon atoms represented by R 11 and the like include a benzyl group, a fluorenyl group, an indenyl group, a 9-fluorenylmethyl group, and the like.

作為上述R11 等所表示之碳原子數2~20之含雜環基,例如可列舉:吡啶基、嘧啶基、嗒基、哌啶基、吡喃基、吡唑基、三基、吡咯基、喹啉基、異喹啉基、咪唑基、苯并咪唑基、三唑基、呋喃基(furyl)、呋喃基(furanyl)、苯并呋喃基、噻吩基(thienyl)、噻吩基(thiophenyl)、苯并噻吩基、噻二唑基、噻唑基、苯并噻唑基、㗁唑基、苯并㗁唑基、異噻唑基、異㗁唑基、吲哚基、2-吡咯啶酮-1-基、2-哌啶酮-1-基、2,4-二氧基咪唑啶-3-基及2,4-二氧基㗁唑啶-3-基等。Examples of the heterocyclic group having 2 to 20 carbon atoms represented by the aforementioned R 11 and the like include a pyridyl group, a pyrimidinyl group, a pyridyl group, a piperidinyl group, a pyranyl group, a pyrazolyl group, a triyl group, and a pyrrolyl group. , Quinolinyl, isoquinolinyl, imidazolyl, benzimidazolyl, triazolyl, furyl, furanyl, benzofuranyl, thienyl, thiophenyl , Benzothienyl, thiadiazolyl, thiazolyl, benzothiazolyl, oxazolyl, benzoxazolyl, isothiazolyl, isoxazolyl, indolyl, 2-pyrrolidone-1- Group, 2-piperidone-1-yl, 2,4-dioxyimidazolidin-3-yl, 2,4-dioxyoxazolidin-3-yl, and the like.

作為上述R'所表示之碳原子數1~8之烷基,可列舉作為R11 等所表示之烷基而例示者中碳原子數為1~8者。Examples of the alkyl group having 1 to 8 carbon atoms represented by the aforementioned R ′ include those having 1 to 8 carbon atoms exemplified as the alkyl group represented by R 11 and the like.

上述烷基、芳基、芳基烷基及含雜環基存在具有取代基之情形。本發明之化合物I-1只要無特別說明,則包括不具有取代基者及具有取代基者。The above-mentioned alkyl group, aryl group, arylalkyl group and heterocyclic group may have a substituent. The compound I-1 of the present invention includes those having no substituent and those having a substituent unless otherwise specified.

作為存在取代烷基、芳基、芳基烷基及含雜環基等之氫原子之情形之取代基,例如可列舉:乙烯基、烯丙基、丙烯酸基及甲基丙烯酸基等乙烯性不飽和基;氟、氯、溴及碘等鹵素原子;乙醯基、2-氯乙醯基、丙醯基、辛醯基、丙烯醯基、甲基丙烯醯基、苯基羰基(苯甲醯基)、鄰苯二甲醯基、4-三氟甲基苯甲醯基、特戊醯基、鄰羥苯甲醯基、草醯基、硬脂醯基、甲氧基羰基、乙氧基羰基、第三丁氧基羰基、正十八烷氧基羰基及胺甲醯基等醯基;乙醯氧基及苯甲醯氧基等醯氧基;胺基、乙基胺基、二甲胺基、二乙胺基、丁基胺基、環戊基胺基、2-乙基己基胺基、十二烷基胺基、苯胺基、氯苯基胺基、甲苯胺基、甲氧苯胺基、N-甲基-苯胺基、二苯基胺基、萘基胺基、2-吡啶基胺基、甲氧基羰基胺基、苯氧基羰基胺基、乙醯基胺基、苯甲醯基胺基、甲醯基胺基、特戊醯基胺基、月桂醯基胺基、胺甲醯基胺基、N,N-二甲胺基羰基胺基、N,N-二乙胺基羰基胺基、啉基羰基胺基、甲氧基羰基胺基、乙氧基羰基胺基、第三丁氧基羰基胺基、正十八烷氧基羰基胺基、N-甲基-甲氧基羰基胺基、苯氧基羰基胺基、胺磺醯基胺基、N,N-二甲胺基磺醯基胺基、甲磺醯基胺基、丁磺醯基胺基及苯磺醯基胺基等取代胺基;磺醯胺基、磺醯基、羧基、氰基、磺基、羥基、硝基、巰基、醯亞胺基、胺甲醯基、磺醯胺基、膦酸基、磷酸基或羧基、磺基、膦酸基、磷酸基之鹽等。Examples of the substituent in the case where a hydrogen atom such as an alkyl group, an aryl group, an arylalkyl group, and a heterocyclic group are substituted include vinyl, allyl, acrylic, and methacrylic groups. Saturated groups; halogen atoms such as fluorine, chlorine, bromine, and iodine; ethyl fluorenyl, 2-chloroethyl fluorenyl, propyl fluorenyl, octyl fluorenyl, propylene fluorenyl, methacryl fluorenyl, phenylcarbonyl (benzyl fluorenyl) Phthalate, 4-trifluoromethylbenzyl, pentamyl, o-hydroxybenzyl, oxalyl, stearyl, methoxycarbonyl, ethoxycarbonyl, Third butoxycarbonyl group, n-octadecyloxycarbonyl group and fluorenyl groups such as carbamoyl group; fluorenyl groups such as ethoxyl and benzyloxy groups; amine, ethylamino, dimethylamino , Diethylamino, butylamino, cyclopentylamino, 2-ethylhexylamino, dodecylamino, aniline, chlorophenylamine, tolylamine, methoxyaniline, N-methyl-aniline, diphenylamino, naphthylamino, 2-pyridylamino, methoxycarbonylamino, phenoxycarbonylamino, ethenylamino, benzamidine Amine, methylamino , Pentamylamino, Laurylamino, Aminomethylamino, N, N-Dimethylaminocarbonylamino, N, N-Diethylaminocarbonylamino, Phenylcarbonylamino , Methoxycarbonylamino, ethoxycarbonylamino, tertiary butoxycarbonylamino, n-octadecyloxycarbonylamino, N-methyl-methoxycarbonylamino, phenoxycarbonyl Substituted amino groups such as amine, sulfamoylamino, N, N-dimethylaminosulfoamidoamino, mesulphinomethylamino, butanesulfinoamino and benzenesulfinomethylamino; Amido, sulfoamido, carboxyl, cyano, sulfo, hydroxy, nitro, mercapto, amidoimino, carbamoamido, sulfoamido, phosphonic acid, phosphate or carboxyl, sulfo, Phosphonic acid, phosphate salts, etc.

於本發明中,基之碳原子數於基中之氫原子被取代基取代之情形時,規定該取代後之基之碳原子數。例如,於將上述碳原子數1~40之烷基之氫原子取代之情形時,所謂碳原子數1~40係指氫原子被取代後之碳原子數,而並不指氫原子被取代前之碳原子數。In the present invention, when the number of carbon atoms of a radical is substituted by a hydrogen atom in the radical by a substituent, the number of carbon atoms of the substituted radical is specified. For example, when a hydrogen atom of an alkyl group having 1 to 40 carbon atoms is replaced, the so-called 1 to 40 carbon atoms refers to the number of carbon atoms after the hydrogen atom is replaced, and does not mean that the hydrogen atom is replaced before the hydrogen atom is replaced. Of carbon atoms.

於本發明中,基之碳原子數於基中之亞甲基被取代為上述二價基之情形時,規定該取代後之基之碳原子數。例如,本說明書中於碳原子數1~40之烷基中之亞甲基被取代為上述二價基之情形時,該所謂「碳原子數1~40」係指亞甲基被取代後之碳原子數,而並不指亞甲基被取代前之碳原子數。因此,「-O-C40 H81 」相當於「末端之亞甲基被取代為-O-之碳原子數40之烷基(=碳原子數40之烷氧基)」。同樣地,「-CO-O-C39 H79 」相當於「末端之亞甲基被取代為-CO-O-之碳原子數40之烷基」。In the present invention, when the number of carbon atoms of the group is substituted by the above-mentioned divalent group when the methylene group in the group is substituted, the number of carbon atoms of the substituted group is specified. For example, in the present specification, when a methylene group in an alkyl group having 1 to 40 carbon atoms is substituted with the above-mentioned divalent group, the so-called "carbon number 1 to 40" refers to a group after the methylene group is substituted. The number of carbon atoms does not refer to the number of carbon atoms before the methylene group is replaced. Therefore, "-OC 40 H 81 " corresponds to "a terminal methylene group is substituted with -O- alkyl group having 40 carbon atoms (= alkoxy group having 40 carbon atoms)". Similarly, "-CO-OC 39 H 79 " corresponds to "the terminal methylene group is substituted with -CO-O- and a carbon atom having 40 carbon atoms".

R11 等中所使用之烷基及芳基烷基中之亞甲基存在被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR'-、>P=O、-S-S-、-SO2 -或該等之組合之情形。
再者,取代上述亞甲基之組合可設為氧原子不相鄰之條件下之組合。
The methylene groups in the alkyl and arylalkyl groups used in R 11 and the like are substituted with carbon-carbon double bonds, -O-, -S-, -CO-, -O-CO-, -CO- O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO- NH-, -NH-CO-, -NH-CO-O-, -NR'-,> P = O, -SS-, -SO 2 -or a combination of these.
In addition, the combination replacing the methylene group may be a combination under the condition that oxygen atoms are not adjacent.

R11 等所表示之碳原子數1~40之烷基存在基端側之末端之亞甲基被取代為-O-而形成烷氧基之情形。作為此種烷氧基,例如可列舉碳原子數1~10之烷氧基。具體而言,可列舉:甲氧基、乙氧基、異丙氧基、丁氧基、第二丁氧基、第三丁氧基、異丁氧基、戊氧基、異戊氧基、第三戊氧基、己氧基、2-己氧基、3-己氧基、環己氧基、4-甲基環己氧基、庚氧基、2-庚氧基、3-庚氧基、異庚氧基、第三庚氧基、1-辛氧基、異辛氧基及第三辛氧基等。When an alkyl group having 1 to 40 carbon atoms represented by R 11 and the like exists, the methylene group at the terminal of the base end side is substituted with -O- to form an alkoxy group. Examples of such an alkoxy group include an alkoxy group having 1 to 10 carbon atoms. Specific examples include methoxy, ethoxy, isopropoxy, butoxy, second butoxy, third butoxy, isobutoxy, pentoxy, isopentoxy, Third pentyloxy, hexyloxy, 2-hexyloxy, 3-hexyloxy, cyclohexyloxy, 4-methylcyclohexyloxy, heptyloxy, 2-heptyloxy, 3-heptyloxy Group, isoheptyloxy, third heptyloxy, 1-octyloxy, isooctyloxy, third octyloxy and the like.

上述R11 、R13 、R16 、R18 、R19 、R20 、R23 、R26 及R28 較佳為羥基以外之基,較佳為鹵素原子、氰基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基等。其原因在於:藉由設為羥基以外之基,光脫離基B變得容易自化合物I-1脫離,且化合物I-1之合成變得容易。
上述R11 及R23 尤佳為硝基、甲氧基等碳原子數1~10之烷氧基、甲基等碳原子數1~40之烷基、鹵素原子等。其原因在於:光脫離基B變得容易自化合物I-1脫離,且化合物I-1之合成變得容易。
上述R11 較佳為碳原子數1~10之烷氧基、碳原子數1~10之烷基或鹵素原子,更佳為碳原子數1~5之烷氧基、碳原子數1~5之烷基或鹵素原子,進而較佳為碳原子數1~5之烷氧基或鹵素原子,尤佳為碳原子數1~3之烷氧基、氯原子或溴原子。其原因在於:光脫離基B變得容易自化合物I-1脫離,且化合物I-1之合成變得容易。
上述R13 、R18 、R19 、R20 、R26 及R28 較佳為碳原子數1~40之烷基。其原因在於:光脫離基B變得容易自化合物I-1脫離,且化合物I-1之合成變得容易。
上述R16 較佳為鄰接之2個R16 彼此鍵結而形成苯環。其原因在於:光脫離基B變得容易自化合物I-1脫離,且化合物I-1之合成變得容易。
上述R31 及R40 較佳為羥基以外之基,較佳為鹵素原子、氰基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基等。其原因在於:藉由設為羥基以外之基,光脫離基B變得容易自化合物I-1脫離,且化合物I-1之合成變得容易。
上述R31 較佳為碳原子數1~40之烷基,更佳為碳原子數1~10之烷基,進而較佳為碳原子數1~5之烷基,尤佳為碳原子數1~3之烷基。
The aforementioned R 11 , R 13 , R 16 , R 18 , R 19 , R 20 , R 23 , R 26 and R 28 are preferably a group other than a hydroxyl group, and are preferably a halogen atom, a cyano group, a nitro group, a carboxyl group, and a carbon group. An alkyl group having 1 to 40 atoms, an aryl group having 6 to 20 carbon atoms, an aryl alkyl group having 7 to 20 carbon atoms or a heterocyclic group containing 2 to 20 carbon atoms, and the like. The reason is that by using a group other than a hydroxyl group, the photo-leaving group B can be easily detached from the compound I-1, and the synthesis of the compound I-1 is easy.
The R 11 and R 23 are particularly preferably an alkoxy group having 1 to 10 carbon atoms such as a nitro group and a methoxy group, an alkyl group having 1 to 40 carbon atoms such as a methyl group, a halogen atom, and the like. The reason is that the photo-leaving group B can be easily detached from the compound I-1, and the synthesis of the compound I-1 is easy.
The aforementioned R 11 is preferably an alkoxy group having 1 to 10 carbon atoms, an alkyl group having 1 to 10 carbon atoms or a halogen atom, more preferably an alkoxy group having 1 to 5 carbon atoms and 1 to 5 carbon atoms. The alkyl group or halogen atom is more preferably an alkoxy group or a halogen atom having 1 to 5 carbon atoms, and particularly preferably an alkoxy group, a chlorine atom, or a bromine atom having 1 to 3 carbon atoms. The reason is that the photo-leaving group B can be easily detached from the compound I-1, and the synthesis of the compound I-1 is easy.
The aforementioned R 13 , R 18 , R 19 , R 20 , R 26 and R 28 are preferably an alkyl group having 1 to 40 carbon atoms. The reason is that the photo-leaving group B can be easily detached from the compound I-1, and the synthesis of the compound I-1 is easy.
The aforementioned R 16 is preferably two adjacent R 16 bonded to each other to form a benzene ring. The reason is that the photo-leaving group B can be easily detached from the compound I-1, and the synthesis of the compound I-1 is easy.
The R 31 and R 40 are preferably a group other than a hydroxyl group, and are preferably a halogen atom, a cyano group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, and 7 to carbon atoms. An arylalkyl group of 20 or a heterocyclic group containing 2 to 20 carbon atoms, and the like. The reason is that by using a group other than a hydroxyl group, the photo-leaving group B can be easily detached from the compound I-1, and the synthesis of the compound I-1 is easy.
The R 31 is preferably an alkyl group having 1 to 40 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, still more preferably an alkyl group having 1 to 5 carbon atoms, and particularly preferably 1 carbon atom. ~ 3 alkyl.

於上述R18 及R19 所表示之烷基及芳基烷基中之亞甲基被取代為-O-之情形時,有時以分別中斷烷基及芳基烷基之方式含有取代上述亞甲基之-O-,即有時會取代烷基及芳基烷基之端部以外之亞甲基。In the case where the methylene group in the alkyl group and the arylalkyl group represented by R 18 and R 19 is substituted with -O-, the alkylene group and the arylalkyl group may be substituted to replace the above-mentioned methylene group. -O- of a methyl group, that is, a methylene group other than the terminal of an alkyl group and an arylalkyl group may be substituted.

上述R12 較佳為氫原子、羧基、碳原子數1~5之烷基,尤佳為氫原子、甲基。其原因在於:光脫離基B變得容易自化合物I-1脫離,且化合物I-1之合成變得容易。
關於上述R14 、R17 、R21 、R24 、R25 、R27 、R29 及R30 ,其中較佳為氫原子、碳原子數1~40之烷基,尤佳為氫原子。其原因在於:光脫離基B變得容易自化合物I-1脫離,且化合物I-1之合成變得容易。
上述R15 及R22 較佳為碳原子數1~5之烷基,尤佳為甲基。其原因在於:可提供硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。
上述R32 及R33 分別獨立,較佳為氫原子、羧基或碳原子數1~5之烷基,更佳為氫原子或甲基,尤佳為氫原子。其原因在於:可提供硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。
上述R41 ~R44 分別獨立,較佳為氫原子、羧基或碳原子數1~5之烷基,更佳為氫原子或甲基,尤佳為氫原子。其原因在於:可提供硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。
R 12 is preferably a hydrogen atom, a carboxyl group, and an alkyl group having 1 to 5 carbon atoms, and particularly preferably a hydrogen atom and a methyl group. The reason is that the photo-leaving group B can be easily detached from the compound I-1, and the synthesis of the compound I-1 is easy.
Regarding the above R 14 , R 17 , R 21 , R 24 , R 25 , R 27 , R 29 and R 30 , a hydrogen atom and an alkyl group having 1 to 40 carbon atoms are preferred, and a hydrogen atom is particularly preferred. The reason is that the photo-leaving group B can be easily detached from the compound I-1, and the synthesis of the compound I-1 is easy.
The aforementioned R 15 and R 22 are preferably an alkyl group having 1 to 5 carbon atoms, and particularly preferably a methyl group. The reason therefor is to provide a compound which has less resistance to hardening and can easily provide an ultraviolet absorbing function to a hardened material.
The aforementioned R 32 and R 33 are each independently, preferably a hydrogen atom, a carboxyl group or an alkyl group having 1 to 5 carbon atoms, more preferably a hydrogen atom or a methyl group, and even more preferably a hydrogen atom. The reason therefor is to provide a compound which has less resistance to hardening and can easily provide an ultraviolet absorbing function to a hardened material.
The aforementioned R 41 to R 44 are each independently, preferably a hydrogen atom, a carboxyl group or an alkyl group having 1 to 5 carbon atoms, more preferably a hydrogen atom or a methyl group, and even more preferably a hydrogen atom. The reason therefor is to provide a compound which has less resistance to hardening and can easily provide an ultraviolet absorbing function to a hardened material.

上述b1、b2、b3、b6、b7、b8及b9可分別獨立地設為0~4之整數,就合成之容易性之觀點而言,較佳為0~3之整數,更佳為0~2之整數,進而較佳為0~1,尤佳為0。其原因在於:可提供硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。
上述b4及b5可分別獨立地設為0~5之整數,就合成之容易性之觀點而言,較佳為0~3之整數,更佳為0~2之整數,進而較佳為0~1,尤佳為0。其原因在於:可提供硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。
上述c1可設為0~5之整數,就合成之容易性之觀點而言,較佳為0~3之整數,更佳為0~2之整數,進而較佳為0~1之整數,尤佳為1。其原因在於:可提供硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。
上述c2可設為0~4之整數,就合成之容易性之觀點而言,較佳為0~3之整數,更佳為0~2之整數,進而較佳為0~1之整數,尤佳為0。其原因在於:可提供硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。
The above b1, b2, b3, b6, b7, b8, and b9 can be independently set to integers of 0 to 4. From the viewpoint of ease of synthesis, the integers of 0 to 3 are preferred, and 0 to 4 are more preferred. An integer of 2 is more preferably 0 to 1, and even more preferably 0. The reason therefor is to provide a compound which has less resistance to hardening and can easily provide an ultraviolet absorbing function to a hardened material.
The above b4 and b5 can be independently set to integers of 0 to 5. In terms of ease of synthesis, an integer of 0 to 3 is preferred, an integer of 0 to 2 is more preferred, and an integer of 0 to 5 is further preferred. 1, particularly preferably 0. The reason therefor is to provide a compound which has less resistance to hardening and can easily provide an ultraviolet absorbing function to a hardened material.
The above c1 can be set to an integer of 0 to 5. In terms of ease of synthesis, an integer of 0 to 3 is preferred, an integer of 0 to 2 is more preferred, and an integer of 0 to 1 is further preferred. Better to be 1. The reason therefor is to provide a compound which has less resistance to hardening and can easily provide an ultraviolet absorbing function to a hardened material.
The above c2 can be set to an integer of 0 to 4. In terms of ease of synthesis, an integer of 0 to 3 is preferred, an integer of 0 to 2 is more preferred, and an integer of 0 to 1 is further preferred. It is preferably 0. The reason therefor is to provide a compound which has less resistance to hardening and can easily provide an ultraviolet absorbing function to a hardened material.

本發明之化合物I-1所含之光脫離基B之種類於k為2以上之情形時,有時各化合物I-1中為1種,有時為2種以上,就硬化阻礙較少,可對硬化物容易地賦予紫外線吸收功能等,且使化合物I-1之合成變得容易之觀點而言,較佳為1種。When the kind of the light-releasing group B contained in the compound I-1 of the present invention is k or more, there may be one kind of each compound I-1 and sometimes two or more kinds, so there is less hindering of hardening. From the viewpoint that the ultraviolet-absorbing function and the like can be easily imparted to the cured product and the synthesis of the compound I-1 is facilitated, one type is preferred.

上述光脫離基之含有數k為1~10之整數,就硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等觀點且就合成之容易性之觀點而言,較佳為1~5之整數,更佳為1~4之整數,尤佳為1~3之整數。The number k of the light-releasing group is an integer of 1 to 10, from the viewpoints of less resistance to hardening, the ability to easily provide a UV absorbing function to the cured material, and the viewpoint of ease of synthesis, it is preferably 1 to 5 The integer is more preferably an integer of 1 to 4, and even more preferably an integer of 1 to 3.

2.具有紫外線吸收功能之原子團A
原子團A係具有紫外線吸收功能之原子團。
本發明之化合物I-1藉由照射特定波長之光,光脫離基B脫離而生存具有羥基之化合物I-2。此外,藉由原子團A具有紫外線吸收功能,化合物I-2發揮出紫外線吸收功能。
2.Atomic group A with ultraviolet absorption function
The atomic group A is an atomic group having an ultraviolet absorption function.
The compound I-1 of the present invention survives the compound I-2 having a hydroxyl group by irradiating light of a specific wavelength, and the light-releasing group B is released. In addition, since the atomic group A has an ultraviolet absorption function, the compound I-2 exhibits an ultraviolet absorption function.

所謂「具有紫外線吸收功能」例如為可使具有紫外線吸收功能之化合物、具體而言為光脫離基B脫離後之化合物I-1、即化合物I-2變得可吸收波長為250 nm以上且450 nm以下之範圍之光。於本發明中具有紫外線吸收功能之原子團可設為具有紫外線吸收功能之基或至少含有一個具有紫外線吸收功能之基之原子之集合體。
更具體而言,所謂具有紫外線吸收功能係光脫離基B脫離後之化合物I-1、即化合物I-2於波長250 nm以上且600 nm以內之範圍內可吸收最大吸收波長為250 nm以上且400 nm以下之光,較佳為可吸收最大吸收波長為260 nm以上且390 nm以下之光,尤佳為吸收最大吸收波長為280 nm以上且380 nm以下之光。其原因在於:可提供硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。
光脫離基B脫離後之化合物I-1、即化合物I-2之最大吸收波長例如可藉由以下之測定方法進行測定。
作為評價用樣品,例如使用將光脫離基B脫離後之化合物I-1、即化合物I-2以成為0.01質量%之濃度之方式溶解於溶劑(乙腈)中而成者。此外,可藉由將評價用樣品填充至石英槽(光程長度10 mm、厚度1.25 mm)中,使用吸光光度計(例如U-3900(Hitachi High-Tech Science公司製造))測定吸光度而獲得。
The "having an ultraviolet absorbing function" is, for example, a compound I-1 capable of absorbing a compound having an ultraviolet absorbing function, specifically, the light-releasing group B after detachment, that is, the compound I-2 has an absorbable wavelength of 250 nm or more and 450 Light in the range below nm. The atomic group having an ultraviolet absorbing function in the present invention may be a group having an ultraviolet absorbing function or an aggregate containing at least one group having an ultraviolet absorbing group.
More specifically, the so-called compound I-1 having an ultraviolet absorbing function after the light-release group B is detached, that is, the maximum absorption wavelength of the compound I-2 within a range of 250 nm or more and 600 nm or less is 250 nm or more and The light having a maximum absorption wavelength of 400 nm or less is preferably light having a maximum absorption wavelength of 260 nm or more and 390 nm or less, and particularly preferably light having a maximum absorption wavelength of 280 nm or more and 380 nm or less. The reason therefor is to provide a compound which has less resistance to hardening and can easily provide an ultraviolet absorbing function to a hardened material.
The maximum absorption wavelength of the compound I-1, that is, the compound I-2 after the photo-releasing group B is removed, can be measured, for example, by the following measurement method.
As the sample for evaluation, for example, a compound (I-1) obtained by removing the photo-release group B, that is, a compound (I-2) dissolved in a solvent (acetonitrile) at a concentration of 0.01% by mass is used. In addition, it can be obtained by filling a sample for evaluation into a quartz cell (optical path length 10 mm, thickness 1.25 mm) and measuring the absorbance using an absorbance meter (for example, U-3900 (manufactured by Hitachi High-Tech Science)).

又,本發明之化合物I-1於將光脫離基B脫離前之化合物I-1之最大吸收波長與光脫離基B脫離後之化合物I-1(化合物I-2)之最大吸收波長進行比較時,較佳為於250 nm以上且600 nm以內之範圍內,光脫離基B脫離前之化合物I-1之最大吸收波長與化合物I-2之最大吸收波長相比為短波長。其原因在於:於光硬化性組合物中之應用變得容易。
上述化合物I-1之與上述光脫離基B脫離後之化合物I-2之最大吸收波長之差較佳為1 nm以上,更佳為1 nm以上且100 nm以下,尤佳為1 nm以上且50 nm以下。其原因在於:於光硬化性組合物中之應用變得容易。
In addition, the maximum absorption wavelength of the compound I-1 of the present invention before the light-releasing group B is separated from the maximum absorption wavelength of the compound I-1 (the compound I-2) after the light-releasing group B is removed In this case, it is preferable that the maximum absorption wavelength of the compound I-1 before the light release group B is released is shorter than the maximum absorption wavelength of the compound I-2 in a range of 250 nm or more and 600 nm or less. The reason is that application to a photocurable composition becomes easy.
The difference between the maximum absorption wavelengths of the compound I-1 and the compound I-2 after the photo-dissociating group B is removed is preferably 1 nm or more, more preferably 1 nm or more and 100 nm or less, even more preferably 1 nm or more and Below 50 nm. The reason is that application to a photocurable composition becomes easy.

作為此種原子團A,可設為與通常用於具有酚性羥基之紫外線吸收劑之原子團相同。即,上述化合物I-2係通常用作具有酚性羥基之紫外線吸收劑者。
具體而言,作為上述化合物I-2,可使用日本專利特開2017-008221號公報所記載之2-羥基二苯甲酮類、2-(2'-羥基苯基)苯并三唑類、苯甲酸酯類及三芳基三類等、或日本專利特開2002-97224號公報所記載之苯并三唑系紫外線吸收劑及二苯甲酮系紫外線吸收劑等。
Such an atomic group A can be the same as the atomic group generally used for the ultraviolet absorber which has a phenolic hydroxyl group. That is, the compound I-2 is generally used as an ultraviolet absorbent having a phenolic hydroxyl group.
Specifically, as the compound I-2, 2-hydroxybenzophenones, 2- (2'-hydroxyphenyl) benzotriazoles, etc. described in Japanese Patent Laid-Open No. 2017-008221 can be used, Benzoates and triaryls, etc., or benzotriazole-based ultraviolet absorbers and benzophenone-based ultraviolet absorbers described in Japanese Patent Laid-Open No. 2002-97224.

作為上述原子團A,例如可列舉酚性羥基受光脫離基B保護之酚結構、即含有直接鍵結上述B-O-之苯環者。具體而言,可列舉:含有B-O-直接鍵結之苯環與苯并三唑環之原子團;含有B-O-直接鍵結之二苯甲酮環之原子團;及含有B-O-直接鍵結之苯環與三環之原子團。較佳為含有苯并三唑基、二苯甲酮基及三基之至少1種基直接鍵結於上述酚結構所含之苯環之結構者,其中,較佳為苯并三唑基、二苯甲酮基及三基之至少1種基對苯環之鍵結位置相對於上述B-O-之鍵結位置為鄰位者。其原因在於:容易製成硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。Examples of the atomic group A include a phenolic structure in which a phenolic hydroxyl group is protected by a photo-releasing group B, that is, a benzene ring containing a B-O- group directly bonded thereto. Specific examples include: an atomic group containing a BO-directly bonded benzo ring and a benzotriazole ring; an atomic group containing a BO-directly bonded benzophenone ring; and a BO-directly bonded benzene ring With tricyclic radicals. A structure containing at least one type of a benzotriazole group, a benzophenone group, and a triphenyl group directly bonded to a benzene ring contained in the above phenol structure is preferred. Among them, a benzotriazole group, At least one of the benzophenone group and the tri-group has a bond position to the benzene ring relative to the bond position of the BO-. The reason is that it is easy to make a compound that has less resistance to hardening and can easily provide a UV-absorbing function to a cured material.

作為本案發明之化合物I-1,例如可列舉下述通式(A-1)、(A-2)及(A-3)所表示者。Examples of the compound I-1 of the present invention include those represented by the following general formulae (A-1), (A-2), and (A-3).

[化7]
[Chemical 7]

(式中,R1 及R2 分別獨立地表示氫原子、鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基、碳原子數2~20之含雜環基或上述-O-B,
R1 及R2 之至少一者為上述-O-B,
R3 、R4 、R5 、R6 、R7 及R8 分別獨立地表示鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基,
R1 、R2 、R3 、R4 、R5 、R6 、R7 及R8 所表示之烷基或芳基烷基中之亞甲基亦存在被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR'-、>P=O、-S-S-、-SO2 -或該等之組合之情形,
R'表示氫原子或碳原子數1~8之烷基,
存在複數個R3 彼此、複數個R4 彼此、複數個R5 彼此、複數個R6 彼此及複數個R7 彼此分別鍵結而形成苯環或萘環之情形,
複數個R3 、R4 、R5 、R6 、R7 及R8 有分別相同之情形,有互不相同之情形,
m1及m2分別獨立地表示1~10之整數,
n表示1~3之整數,
a1表示0~4之整數,
a2表示0~2之整數,
a3表示0~4之整數,
a4表示0~3之整數,
a5表示0~3之整數,
a6表示0~3-n之整數,
X1 及X2 分別表示m1價及m2價之鍵結基)
(In the formula, R 1 and R 2 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, and a carbon atom. An arylalkyl group having 7 to 20 atoms, a heterocyclic group containing 2 to 20 carbon atoms or the above-OB,
At least one of R 1 and R 2 is the above-OB,
R 3 , R 4 , R 5 , R 6 , R 7 and R 8 each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, and 6 to 20 carbon atoms. An aryl group, an arylalkyl group having 7 to 20 carbon atoms, or a heterocyclic group containing 2 to 20 carbon atoms,
The methylene group in the alkyl or arylalkyl group represented by R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7, and R 8 is also substituted with a carbon-carbon double bond,- O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S- , -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-,> P = O, -SS- , -SO 2 -or a combination of these,
R 'represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
There may be cases where a plurality of R 3 each other, a plurality of R 4 each other, a plurality of R 5 each other, a plurality of R 6 each other, and a plurality of R 7 are respectively bonded to each other to form a benzene ring or a naphthalene ring,
A plurality of R 3 , R 4 , R 5 , R 6 , R 7 and R 8 may be the same as each other, and may be different from each other.
m1 and m2 each independently represent an integer from 1 to 10,
n represents an integer from 1 to 3,
a1 represents an integer from 0 to 4,
a2 represents an integer from 0 to 2,
a3 represents an integer from 0 to 4,
a4 represents an integer from 0 to 3,
a5 represents an integer from 0 to 3,
a6 represents an integer from 0 to 3-n,
(X 1 and X 2 represent the bond groups of valence m1 and m2, respectively)

作為上述R1 、R2 、R3 、R4 、R5 、R6 、R7 及R8 所表示之碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基、碳原子數2~20之含雜環基、及R'所表示之碳原子數1~8之烷基,可列舉作為上述「1.光脫離基B」之項所記載之R11 等及R'所例示者。The above-mentioned R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 represent an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, and a carbon atom. Examples of the arylalkyl group having 7 to 20 carbon atoms, the heterocyclic group containing 2 to 20 carbon atoms, and the alkyl group having 1 to 8 carbon atoms represented by R ′ may be exemplified as the above-mentioned "1. Photodissociative group B" R 11 and the like described in this item and those exemplified by R '.

上述R1 及R2 之至少一者為上述-O-B。
上述R1 及R2 就合成容易之觀點而言,較佳為一者為上述-O-B。
上述R1 及R2 就使紫外線吸收功能之變化較大之觀點而言,較佳為R1 及R2 之兩者為上述-O-B。
上述R1 及R2 於僅一者為上述-O-B之情形時,另一者較佳為氫原子、羥基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基,更佳為氫原子或碳原子數1~40之烷基。其原因在於:藉由上述R1 及R2 之另一者為上述官能基,上述化合物I-1成為紫外線吸收功能之變化較大者。又,其原因在於:上述化合物I-1成為硬化阻礙較少者。
又,作為上述烷基及芳基烷基等,亦可較佳地使用例如亞甲基被-O-、-CO-等中斷者等。
At least one of the above R 1 and R 2 is the above-OB.
From the viewpoint of ease of synthesis, R 1 and R 2 are preferably -OB.
R 1 and R 2 above causes the ultraviolet absorbing function of the large variation of the viewpoint, preferably both of R 1 and R 2 above -OB.
When only one of the above-mentioned R 1 and R 2 is the above-OB, the other is preferably a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, and carbon. The arylalkyl group having 7 to 20 atoms or the heterocyclic group containing 2 to 20 carbon atoms is more preferably a hydrogen atom or an alkyl group having 1 to 40 carbon atoms. The reason for this is that, since the other of the R 1 and R 2 is the functional group, the compound I-1 has a large change in the ultraviolet absorption function. The reason is that the above-mentioned compound I-1 becomes one with less hindrance to hardening.
In addition, as the alkyl group, arylalkyl group, and the like, for example, those in which methylene is interrupted by -O-, -CO-, or the like can be preferably used.

上述R3 、R4 、R5 、R6 、R7 及R8 較佳為氰基、羥基、碳原子數1~40之烷基、碳原子數7~20之芳基烷基,更佳為氰基、羥基、碳原子數1~20之烷基、碳原子數7~10之芳基烷基,其中,更佳為碳原子數3~20之烷基,更佳為碳原子數3~10之烷基。其原因在於:本發明之化合物I-1之合成變得容易,化合物I-1於光脫離基B脫離後發揮出優異之紫外線吸收功能。The aforementioned R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are preferably a cyano group, a hydroxyl group, an alkyl group having 1 to 40 carbon atoms, and an arylalkyl group having 7 to 20 carbon atoms, and more preferably It is a cyano group, a hydroxyl group, an alkyl group having 1 to 20 carbon atoms, and an arylalkyl group having 7 to 10 carbon atoms. Among them, an alkyl group having 3 to 20 carbon atoms is more preferable, and an alkyl group having 3 carbon atoms is more preferable. ~ 10 alkyl. The reason is that the synthesis of the compound I-1 of the present invention becomes easy, and the compound I-1 exhibits an excellent ultraviolet absorbing function after the light-release group B is released.

又,就於光脫離基B脫離後能夠發揮出優異之紫外線吸收功能之觀點而言,R4 較佳為碳原子數3~15之具有支鏈結構之烷基,更佳為碳原子數5~12之具有支鏈結構之烷基,進而較佳為碳原子數6~11之具有支鏈結構之烷基,尤佳為碳原子數7~10之具有支鏈結構之烷基。
作為R4 於苯環中之鍵結部位,可鍵結於能夠鍵結之任意位置,較佳為相對於-O-B之鍵結部位為對位。其原因在於:化合物I-1於光脫離基B脫離後發揮出優異之紫外線吸收功能。
In addition, from the viewpoint of exhibiting an excellent ultraviolet absorbing function after the light-releasing group B is released, R 4 is preferably an alkyl group having a branched structure having 3 to 15 carbon atoms, and more preferably 5 having carbon atoms. The alkyl group having a branched structure of -12, more preferably an alkyl group having a branched structure of 6 to 11 carbon atoms, and particularly preferably an alkyl group having a branched structure of 7 to 10 carbon atoms.
As the bonding site of R 4 in the benzene ring, it can be bonded at any position capable of bonding, and it is preferably para-position relative to the bonding site of -OB. The reason is that the compound I-1 exhibits an excellent ultraviolet absorbing function after the light-release group B is released.

就於光脫離基B脫離後能夠發揮出優異之紫外線吸收功能之觀點而言,R5 及R6 較佳為苯環側末端之亞甲基被取代為-O-之碳原子數1~20之烷基、即碳原子數1~20之烷氧基,其中,較佳為碳原子數3~15之烷氧基,尤佳為碳原子數5~12之烷氧基。
作為R5 及R6 於苯環中之鍵結部位,可鍵結於能夠鍵結之任意位置,較佳為相對於-O-B之鍵結部位為間位。其原因在於:化合物I-1於光脫離基B脫離後發揮出優異之紫外線吸收功能。
From the standpoint of exhibiting an excellent ultraviolet absorbing function after the photo-leaving group B is detached, R 5 and R 6 are preferably those in which the methylene group on the side of the benzene ring side is substituted with -O- with 1 to 20 carbon atoms. The alkyl group, that is, the alkoxy group having 1 to 20 carbon atoms, is preferably an alkoxy group having 3 to 15 carbon atoms, and particularly preferably an alkoxy group having 5 to 12 carbon atoms.
The bonding sites of R 5 and R 6 in the benzene ring may be bonded at any position capable of bonding, and it is preferred that the bonding site with respect to -OB is meta. The reason is that the compound I-1 exhibits an excellent ultraviolet absorbing function after the light-release group B is released.

就於光脫離基B脫離後能夠發揮出優異之紫外線吸收功能之觀點而言,R7 較佳為苯環側末端之亞甲基被取代為-O-之碳原子數1~20之烷基、即碳原子數1~20之烷氧基,其中,較佳為苯環側末端以外之亞甲基鏈被取代為-O-、-O-CO-之碳原子數3~20之烷氧基,尤佳為苯環側末端以外之亞甲基鏈被取代為-O-、-O-CO-之碳原子數3~15之烷氧基,尤佳為苯環側末端以外之亞甲基鏈被取代為-O-、-O-CO-之碳原子數6~15之烷氧基,其中尤佳為苯環側末端以外之亞甲基鏈被取代為-O-、-O-CO-之碳原子數8~13之烷氧基。
作為R7 於苯環中之鍵結部位,可鍵結於能夠鍵結之任意位置,較佳為相對於-O-B之鍵結部位為間位。其原因在於:化合物I-1於光脫離基B脫離後發揮出優異之紫外線吸收功能。
就於光脫離基B脫離後能夠發揮出優異之紫外線吸收功能之觀點而言,R8較佳為碳原子數6~20之芳基,其中,較佳為碳原子數6~12之芳基,尤佳為存在具有取代基之情形之苯基。
From the standpoint that the photo-leaving group B can exhibit an excellent ultraviolet absorbing function after detachment, R 7 is preferably an alkyl group having 1 to 20 carbon atoms in which the methylene group at the benzene ring side end is substituted with -O- That is, an alkoxy group having 1 to 20 carbon atoms. Among them, a methylene chain other than a benzene ring side terminal is preferably substituted with an alkoxy group having 3 to 20 carbon atoms in -O-, -O-CO-. Group, particularly preferably a methylene chain other than the benzene ring side terminal is substituted with -O-, -O-CO- and an alkoxy group having 3 to 15 carbon atoms, particularly preferably a methylene group other than the benzene ring side terminal The base chain is substituted with an alkoxy group having 6 to 15 carbon atoms in -O-, -O-CO-, and particularly preferably a methylene chain other than a benzene ring side end is substituted with -O-, -O- CO- is an alkoxy group having 8 to 13 carbon atoms.
As the bonding site of R 7 in the benzene ring, it can be bonded at any position capable of bonding, and it is preferred that the bonding site with respect to -OB is meta. The reason is that the compound I-1 exhibits an excellent ultraviolet absorbing function after the light-release group B is released.
From the standpoint that the light-releasing group B can exhibit an excellent ultraviolet absorption function after detachment, R8 is preferably an aryl group having 6 to 20 carbon atoms, and among them, an aryl group having 6 to 12 carbon atoms is preferred, Particularly preferred is a phenyl group in the presence of a substituent.

又,作為上述烷基及上述芳基烷基,可較佳地使用亞甲基未被中斷者及被-O-、-CO-等所中斷者之任一者。Further, as the alkyl group and the arylalkyl group, any of those in which methylene is not interrupted and those in which -O-, -CO-, etc. are interrupted can be preferably used.

上述m1及m2表示1~10之整數。就合成之容易性之觀點而言,上述m1及m2分別獨立,較佳為1~6之整數,更佳為1~4之整數,尤佳為1~3之整數,其中尤佳為1~2之整數。其原因在於:上述化合物I-1之合成變得容易,化合物I-1於光脫離基B脫離後發揮出優異之紫外線吸收功能。
又,就化合物I-1於光脫離基B脫離後發揮出優異之紫外線吸收功能之觀點而言,m2較佳為1之整數。
The above m1 and m2 represent integers of 1 to 10. From the standpoint of ease of synthesis, the above m1 and m2 are independent of each other, preferably an integer of 1 to 6, more preferably an integer of 1 to 4, particularly preferably an integer of 1 to 3, and particularly preferably 1 to An integer of two. The reason is that the synthesis of the above-mentioned compound I-1 becomes easy, and the compound I-1 exhibits an excellent ultraviolet absorption function after the light-release group B is released.
In addition, from the viewpoint that the compound I-1 exhibits an excellent ultraviolet absorbing function after the light-releasing group B is released, m2 is preferably an integer of 1.

上述n表示1~3之整數。就化合物I-1成為紫外線吸收功能之變化較大者之觀點而言,上述n較佳為2~3之整數,尤佳為3。就化合物I-1於光脫離基B脫離後發揮出優異之紫外線吸收功能之觀點而言,上述n較佳為1~2之整數,尤佳為1。The above-mentioned n represents an integer of 1 to 3. From the viewpoint that the compound I-1 has a large change in the ultraviolet absorbing function, the above-mentioned n is preferably an integer of 2 to 3, particularly preferably 3. From the viewpoint that the compound I-1 exhibits an excellent ultraviolet absorbing function after the light-releasing group B is released, the above-mentioned n is preferably an integer of 1 to 2, and particularly preferably 1.

上述a1及a3分別獨立地表示0~4之整數。就合成之容易性之觀點而言,上述a1及a3分別獨立,較佳為0~3之整數,更佳為0~2之整數,尤佳為0~1之整數。其原因在於:可製成化合物I-1於光脫離基B脫離後發揮出優異之紫外線吸收功能之化合物。
上述a2表示0~2之整數之整數。就溶解性之觀點而言,上述a2較佳為1~2之整數。又,就化合物I-1於光脫離基B脫離後發揮出優異之紫外線吸收功能之觀點而言,上述a2較佳為1。
上述a4及a5分別獨立地表示0~3之整數。就合成之容易性之觀點而言,上述a4及a5較佳為0~2之整數,尤佳為1~2之整數,尤佳為1。其原因在於:可製成化合物I-1於光脫離基B脫離後發揮出優異之紫外線吸收功能之化合物。
上述a6表示0~3-n之整數。上述a6就化合物I-1於光脫離基B脫離後發揮出優異之紫外線吸收功能之觀點、合成之容易性之觀點而言,較佳為0~1之整數,較佳為0。
The above a1 and a3 each independently represent an integer of 0 to 4. From the standpoint of ease of synthesis, the above-mentioned a1 and a3 are independent, preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and even more preferably an integer of 0 to 1. The reason is that the compound I-1 can be made into a compound that exhibits an excellent ultraviolet absorption function after the light-release group B is released.
The a2 is an integer of an integer of 0 to 2. From the viewpoint of solubility, the a2 is preferably an integer of 1 to 2. From the viewpoint that the compound I-1 exhibits an excellent ultraviolet absorbing function after the light-releasing group B is released, the a2 is preferably 1.
The above a4 and a5 each independently represent an integer of 0 to 3. From the viewpoint of ease of synthesis, the above-mentioned a4 and a5 are preferably integers of 0 to 2, particularly preferably integers of 1 to 2, and even more preferably 1. The reason is that the compound I-1 can be made into a compound that exhibits an excellent ultraviolet absorption function after the light-release group B is released.
The above a6 represents an integer of 0 to 3-n. The above-mentioned a6 is preferably an integer of 0 to 1 and more preferably 0 in terms of the viewpoint that the compound I-1 exhibits an excellent ultraviolet absorbing function after detachment of the photo-release group B and the ease of synthesis.

上述通式(A-1)及(A-2)所表示之化合物I-1具有於X1 及X2 (以下有時稱為X)所表示之m1價或m2價(以下有時稱為m價)之特定之原子或基鍵結有m1個或m2個(以下有時稱為m個)特定之基之結構。該m個特定之基有互相相同之情形,有互不相同之情形。The compound I-1 represented by the above-mentioned general formulae (A-1) and (A-2) has an m1-valence or an m2-valence (hereinafter sometimes referred to as "X") represented by X 1 and X 2 (hereinafter sometimes referred to as "X"). A structure in which a specific atom or group of m is bonded to m1 or m2 (hereinafter sometimes referred to as m). The m specific bases may be the same or different from each other.

上述X表示m價之鍵結基。
作為上述鍵結基X,具體而言,表示直接鍵、氫原子、氮原子、氧原子、硫原子、磷原子、下述(II-a)或(II-b)所表示之基、>C=O、>NR53 、-OR53 、-SR53 、-NR53 R54 或者具有與m數值相同之價數之碳原子數1~120之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基,R53 及R54 分別獨立地表示氫原子、碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基,該脂肪族烴基、含芳香環烴基及含雜環基亦存在被-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NH-CO-O-、-NR' -、-S-S-、-SO2 -、氮原子或該等之組合所中斷之情形,上述芳香環或雜環亦存在與其他環縮合之情形。
其中,於X為氮原子、磷原子或下述(II-a)或(II-b)所表示之鍵結基之情形時,m為3,於X為氧原子或硫原子、>C=O、-NH-CO-、-CO-NH-或>NR53 之情形時,m為2,於X為-OR53 、-SR53 或-NR53 R54 之情形時,m為1,亦存在X與苯環一起形成環之情形。
The X represents a m-valent bond group.
Specifically, the bonding group X represents a direct bond, a hydrogen atom, a nitrogen atom, an oxygen atom, a sulfur atom, a phosphorus atom, a group represented by the following (II-a) or (II-b), and> C = O,> NR 53 , -OR 53 , -SR 53 , -NR 53 R 54 or an aliphatic hydrocarbon group having 1 to 120 carbon atoms and an aromatic group containing 6 to 35 carbon atoms having the same valence as m A cyclic hydrocarbon group or a heterocyclic group containing 2 to 35 carbon atoms, and R 53 and R 54 each independently represent a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic cyclic hydrocarbon group having 6 to 35 carbon atoms or Heterocyclic group containing 2 to 35 carbon atoms, the aliphatic hydrocarbon group, aromatic ring-containing hydrocarbon group and heterocyclic group also have -O-, -S-, -CO-, -O-CO-, -CO- O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO- NH-, -NH-CO-, -NH-CO-O-, -NH-CO-O-, -NR ' -, -SS-, -SO 2- , nitrogen atom or a combination of these The above aromatic ring or heterocyclic ring may also be condensed with other rings.
When X is a nitrogen atom, a phosphorus atom, or a bonding group represented by the following (II-a) or (II-b), m is 3, and X is an oxygen atom or a sulfur atom, and> C = In the case of O, -NH-CO-, -CO-NH-, or> NR 53 , m is 2; in the case of X is -OR 53 , -SR 53, or -NR 53 R 54 , m is 1, and There are cases where X forms a ring together with a benzene ring.

[化8]
[Chemical 8]

(*意指藉由*部分與鄰接之基鍵結)(* Means bonded to the adjacent base by * part)

上述鍵結基X所表示之具有與m數值相同之價數的碳原子數1~120之脂肪族烴基中,作為m為一價者,例如可列舉:甲基、乙基、丙基、異丙基、環丙基、丁基、第二丁基、第三丁基、異丁基、戊基、異戊基、第三戊基、環戊基、己基、2-己基、3-己基、環己基、聯環己基、1-甲基環己基、庚基、2-庚基、3-庚基、異庚基、第三庚基、正辛基、異辛基、第三辛基、2-乙基己基、壬基、異壬基及癸基等烷基;甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、第二丁氧基、第三丁氧基、異丁氧基、戊氧基、異戊氧基、第三戊氧基、己氧基、環己氧基、庚氧基、異庚氧基、第三庚氧基、正辛氧基、異辛氧基、第三辛氧基、2-乙基己氧基、壬氧基及癸氧基等烷氧基;甲硫基、乙硫基、丙硫基、異丙硫基、丁硫基、第二丁硫基、第三丁硫基、異丁硫基、戊硫基、異戊硫基、第三戊硫基、己硫基、環己硫基、庚硫基、異庚硫基、第三庚硫基、正辛硫基、異辛硫基、第三辛硫基及2-乙基己硫基等烷硫基;乙烯基、1-甲基乙烯基、2-甲基乙烯基、2-丙烯基、1-甲基-3-丙烯基、3-丁烯基、1-甲基-3-丁烯基、異丁烯基、3-戊烯基、4-己烯基、環己烯基、聯環己烯基、庚烯基、辛烯基、癸烯基、十五碳烯基、二十碳烯基及二十三碳烯基等烯基;以及該等基經下文所述之取代基取代而成之基等。Among the aliphatic hydrocarbon groups having 1 to 120 carbon atoms having the same valence as the value of m represented by the above-mentioned bonding group X, as m being monovalent, for example, methyl, ethyl, propyl, iso Propyl, cyclopropyl, butyl, second butyl, third butyl, isobutyl, pentyl, isopentyl, third pentyl, cyclopentyl, hexyl, 2-hexyl, 3-hexyl, Cyclohexyl, bicyclohexyl, 1-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, isoheptyl, third heptyl, n-octyl, isooctyl, third octyl, 2 -Alkyl groups such as ethylhexyl, nonyl, isononyl and decyl; methoxy, ethoxy, propoxy, isopropoxy, butoxy, second butoxy, third butoxy , Isobutoxy, pentyloxy, isopentyloxy, third pentyloxy, hexyloxy, cyclohexyloxy, heptyloxy, isoheptyloxy, third heptyloxy, n-octyloxy, Isooctyloxy, third octyloxy, 2-ethylhexyloxy, nonyloxy, decyloxy and other alkoxy groups; methylthio, ethylthio, propylthio, isopropylthio, butylthio Base, second butylthio, third butylthio, isobutylthio, pentylthio, isopentylthio Third pentylthio, hexylthio, cyclohexylthio, heptylthio, isoheptylthio, third heptylthio, n-octylthio, isooctylthio, third octylthio and 2-ethyl Alkylthio groups such as hexylthio; vinyl, 1-methylvinyl, 2-methylvinyl, 2-propenyl, 1-methyl-3-propenyl, 3-butenyl, 1-methyl -3-butenyl, isobutenyl, 3-pentenyl, 4-hexenyl, cyclohexenyl, bicyclohexenyl, heptenyl, octenyl, decenyl, pentadecenyl Alkenyl groups such as, icosenyl and tescosenyl; and groups in which these groups are substituted with substituents described below.

上述鍵結基X所表示之具有與m數值相同之價數的碳原子數1~120之脂肪族烴基中,作為m為二價者,可列舉:亞甲基、伸乙基、伸丙基、伸丁基及丁二基等伸烷基;上述伸烷基之亞甲基鏈被取代為-O-、-S-、-CO-O-、-O-CO-者;乙二醇、丙二醇、丁二醇、戊二醇、己二醇等二醇基之殘基;乙二硫醇、丙二硫醇、丁二硫醇、戊二硫醇、己二硫醇等二硫醇基之殘基及該等基經下文所述之取代基取代而成之基等。Among the aliphatic hydrocarbon groups having 1 to 120 carbon atoms having the same valence as the value of m represented by the above-mentioned bonding group X, as m being divalent, examples thereof include methylene, ethylene, and propyl Alkylene such as butylene, butylene and butadiyl; the methylene chain of the above alkylene is replaced with -O-, -S-, -CO-O-, -O-CO-; ethylene glycol, Residues of diol groups such as propylene glycol, butanediol, pentanediol, and hexanediol; dithiol groups such as ethylenedithiol, propylenedithiol, butanedithiol, pentanethiol, and hexanedithiol Residues, and those substituted with substituents described below.

上述鍵結基X所表示之具有與m數值相同之價數的碳原子數1~120之脂肪族烴基中,作為m為三價者,例如可列舉:次丙基及1,1,3-次丁基次丙基等次烷基;以及該等基經下文所述之取代基取代而成之基。Among the aliphatic hydrocarbon groups having 1 to 120 carbon atoms having the same valence as the value of m represented by the above-mentioned bonding group X, as m is trivalent, for example, propylidene and 1,1,3- An oxyalkylene group such as succinyl propylidene; and a group in which these groups are substituted with a substituent described below.

上述鍵結基X所表示之具有與m數值相同之價數的碳原子數6~35之含芳香環烴基中,作為m為一價者,可列舉:苄基、苯乙基、二苯基甲基、三苯基甲基、苯乙烯基及苯烯丙基等芳基烷基;苯基及萘基等芳基;苯氧基及萘氧基等芳氧基;苯硫基及萘硫基等芳硫基:以及該等基經下文所述之取代基取代而成之基等。Among the aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms having the same valence as that represented by the above-mentioned bonding group X, as the monovalent valence of m, benzyl, phenethyl, and diphenyl are listed. Arylalkyl groups such as methyl, triphenylmethyl, styryl, and phenallyl; aryl groups such as phenyl and naphthyl; aryloxy groups such as phenoxy and naphthyloxy; phenylthio and naphthylthio Arylthio, such as radicals: and radicals in which these radicals are substituted with substituents described below.

上述鍵結基X所表示之具有與m數值相同之價數的碳原子數6~35之含芳香環烴基中,作為m為二價者,可列舉:伸苯基及伸萘基等伸芳基;兒茶酚基、雙酚基等二官能酚基之殘基;2,4,8,10-四氧雜螺[5,5]十一烷基;以及該等基經下文所述之取代基取代而成之基。Among the aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms having the same valence as the value of m represented by the above-mentioned bonding group X, examples of those in which m is divalent include arylene such as phenylene and naphthyl Residues of bifunctional phenol groups such as catechol and bisphenol groups; 2,4,8,10-tetraoxaspiro [5,5] undecyl; and these groups are described below A base substituted with a substituent.

上述鍵結基X所表示之具有與m數值相同之價數的碳原子數6~35之含芳香環烴基中,作為m為三價者,可列舉苯基-1,3,5-三亞甲基及該基經下文所述之取代基取代而成之基。Among the aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms having the same valence as that represented by the above-mentioned bonding group X, m is trivalent, and phenyl-1,3,5-trimethylene may be mentioned And a base substituted with a substituent described below.

上述鍵結基X所表示之具有與m數值相同之價數的碳原子數2~35之含雜環基中,作為m為一價者,可列舉:吡啶基、嘧啶基、嗒基、哌啶基、吡喃基、吡唑基、三基、吡咯基、喹啉基、異喹啉基、咪唑基、苯并咪唑基、三唑基、呋喃基(furyl)、呋喃基(furanyl)、苯并呋喃基、噻吩基(thienyl)、噻吩基(thiophenyl)、苯并噻吩基、噻二唑基、噻唑基、苯并噻唑基、㗁唑基、苯并㗁唑基、異噻唑基、異㗁唑基、吲哚基、2-吡咯啶酮-1-基、2-哌啶酮-1-基、2,4-二氧基咪唑啶-3-基、2,4-二氧基㗁唑啶-3-基及苯并三唑基等;以及該等基經下文所述之取代基取代而成之基等。Among the heterocyclic groups containing 2 to 35 carbon atoms having the same valence as the value of m represented by the above-mentioned bonding group X, those in which m is monovalent include pyridyl, pyrimidinyl, daphthyl, and piperidine. Pyridyl, pyranyl, pyrazolyl, triyl, pyrrolyl, quinolinyl, isoquinolinyl, imidazolyl, benzimidazolyl, triazolyl, furyl, furanyl, Benzofuryl, thienyl, thiophenyl, benzothienyl, thiadiazolyl, thiazolyl, benzothiazolyl, oxazolyl, benzoxazolyl, isothiazolyl, iso Oxazolyl, indolyl, 2-pyrrolidinone-1-yl, 2-piperidone-1-yl, 2,4-dioxyimidazol-3-yl, 2,4-dioxyfluorene Amidazin-3-yl, benzotriazolyl, and the like; and groups in which these groups are substituted with substituents described below.

上述鍵結基X所表示之具有與m數值相同之價數的碳原子數2~35之含雜環基中,作為m為二價者,可列舉:具有吡啶環、嘧啶環、哌啶環、哌環、三環、呋喃環、噻吩環及吲哚環等之二價基;以及該等基經下文所述之取代基取代而成之基。Among the heterocyclic groups having 2 to 35 carbon atoms having the same valence as the value of m represented by the above-mentioned bonding group X, those in which m is divalent include a pyridine ring, a pyrimidine ring, and a piperidine ring , Piperidine, tricyclic, furan ring, thiophene ring, indole ring and the like; and these groups are substituted with substituents described below.

上述鍵結基X所表示之具有與m數值相同之價數的碳原子數2~35之含雜環基中,作為m為三價者,可列舉:具有異三聚氰酸環之三價基、具有三環之三價基及該等基經下文所述之取代基取代而成之基。Among the heterocyclic groups containing 2 to 35 carbon atoms having the same valence as the value of m represented by the above-mentioned bonding group X, those in which m is trivalent include trivalent isocyanuric rings Group, a trivalent group having a tricyclic ring, and a group in which these groups are substituted with a substituent described below.

作為R53 及R54 所表示之碳原子數1~35之脂肪族烴基,可列舉上述X所表示之脂肪族烴基或該脂肪族烴基經下文所述之取代基取代而成之基中碳原子數為1~35者。
作為R53 及R54 所表示之碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基,可列舉上述X所表示之碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基、或者該等基經下文所述之取代基取代而成之基。
Examples of the aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by R 53 and R 54 include the carbon atom in the aliphatic hydrocarbon group represented by the above X or the group in which the aliphatic hydrocarbon group is substituted with a substituent described below. The number is 1 to 35.
Examples of the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or the heterocyclic group containing 2 to 35 carbon atoms represented by R 53 and R 54 include the aromatic ring containing 6 to 35 carbon atoms represented by X described above. A hydrocarbon group or a heterocyclic group containing 2 to 35 carbon atoms, or a group in which these groups are substituted with a substituent described below.

上述脂肪族烴基、含芳香環烴基及含雜環基等各官能基存在具有取代基之情形。本發明之化合物I-1只要無特別說明,則包括不具有取代基者及具有取代基者。
作為此種脂肪族烴基、含芳香環烴基及含雜環基等之取代基,例如可列舉與取代R11 等中所使用之烷基等之氫原子之取代基相同者。
Each of the functional groups such as the aliphatic hydrocarbon group, the aromatic ring-containing hydrocarbon group, and the heterocyclic group may have a substituent. The compound I-1 of the present invention includes those having no substituent and those having a substituent unless otherwise specified.
Examples of such a substituent of an aliphatic hydrocarbon group, an aromatic ring-containing hydrocarbon group, a heterocyclic group, and the like include the same substituents as those used to substitute a hydrogen atom of an alkyl group used in R 11 and the like.

於上述通式(A-1)及(A-2)中,於m為2時,存在X表示下述通式(1)所表示之基之情形。In the general formulae (A-1) and (A-2), when m is 2, X may represent a group represented by the following general formula (1).

[化9]
[Chemical 9]

(上述通式(1)中,Y1 表示單鍵、-CR55 R56 -、-NR57 -、二價之碳原子數1~35之脂肪族烴基、二價之碳原子數6~35之含芳香環烴基、二價之碳原子數2~35之含雜環基、或下述(1-1)~(1-3)所表示之任一基,該脂肪族烴基、碳原子數6~35之含芳香環烴基及碳原子數2~35之含雜環基亦存在被-O-、-S-、-CO-、-COO-、-OCO-或-NH-、或者該等之組合之基中斷之情形,
R55 及R56 分別獨立地表示氫原子、碳原子數1~8之烷基、碳原子數6~20之芳基或碳原子數7~20之芳基烷基,
Z1 及Z2 分別獨立地表示直接鍵、-O-、-S-、>CO、-CO-O-、-O-CO-、-SO2 -、-SS-、-SO-、>NR57 或>PR58
R57 及R58 表示氫原子、碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基,
*意指藉由*部分與鄰接之基鍵結)
(In the general formula (1), Y 1 represents a single bond, -CR 55 R 56- , -NR 57- , a divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, and a divalent carbon atom having 6 to 35. An aromatic ring-containing hydrocarbon group, a divalent heterocyclic group having 2 to 35 carbon atoms, or any of the following groups (1-1) to (1-3), the aliphatic hydrocarbon group, carbon number Aromatic hydrocarbon groups containing 6 to 35 and heterocyclic groups containing 2 to 35 carbon atoms also exist as -O-, -S-, -CO-, -COO-, -OCO- or -NH-, or the like If the basis of the combination is interrupted,
R 55 and R 56 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 20 carbon atoms or an arylalkyl group having 7 to 20 carbon atoms,
Z 1 and Z 2 each independently represent a direct bond, -O-, -S-,> CO, -CO-O-, -O-CO-, -SO 2- , -SS-, -SO-,> NR 57 or> PR 58 ,
R 57 and R 58 represent a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a heterocyclic group containing 2 to 35 carbon atoms,
(* Means bonded to the adjacent base by * part)

[化10]
[Chemical 10]

(上述式中,R59 表示氫原子、亦存在具有取代基之情形之苯基、或亦存在具有取代基之情形之碳原子數3~10之環烷基,
R60 表示碳原子數1~10之烷基、碳原子數1~10之烷氧基、碳原子數2~10之烯基或鹵素原子,上述烷基、烷氧基及烯基亦存在具有取代基之情形,
c1表示0~5之整數,
*意指藉由*部分與鄰接之基鍵結)
(In the above formula, R 59 represents a hydrogen atom, a phenyl group having a substituent, or a cycloalkyl group having 3 to 10 carbon atoms when a substituent is also present.
R 60 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkenyl group or halogen atom having 2 to 10 carbon atoms, and the alkyl group, alkoxy group, and alkenyl group also exist. In the case of substituents,
c1 represents an integer from 0 to 5,
(* Means bonded to the adjacent base by * part)

[化11]
[Chemical 11]

(*意指藉由*部分與鄰接之基鍵結)(* Means bonded to the adjacent base by * part)

[化12]
[Chemical 12]

(上述式中,R61 及R62 分別獨立地表示碳原子數1~10之烷基、碳原子數6~20之芳基、碳原子數6~20之芳氧基、碳原子數6~20之芳硫基、碳原子數6~20之芳基烯基、碳原子數7~20之芳基烷基、碳原子數2~20之含雜環基或鹵素原子,該烷基及芳基烷基中之亞甲基亦存在被取代為不飽和鍵、-O-或-S-之情形,
R61 亦存在藉由鄰接之R61 彼此形成環之情形,
c2表示0~4之數,
c3表示0~8之數,
c4表示0~4之數,
c5表示0~4之數,
c4與c5之數之合計為2~4,
*意指藉由*部分與鄰接之基鍵結)
(In the above formula, R 61 and R 62 each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aryloxy group having 6 to 20 carbon atoms, and 6 to 20 carbon atoms. Arylthio group of 20, arylalkenyl group of 6 to 20 carbon atoms, arylalkyl group of 7 to 20 carbon atoms, heterocyclic group or halogen atom containing 2 to 20 carbon atoms, the alkyl group and aromatic group The methylene group in the alkyl group may be substituted with an unsaturated bond, -O- or -S-,
R 61 may also form a ring with adjacent R 61 ,
c2 represents a number from 0 to 4,
c3 represents a number from 0 to 8,
c4 is a number from 0 to 4,
c5 is a number from 0 to 4,
The total number of c4 and c5 is 2 to 4,
(* Means bonded to the adjacent base by * part)

[化13]
[Chemical 13]

(上述通式(2)中,Y11 表示三價之碳原子數3~35之脂肪族烴基、碳原子數3~35之脂環族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基,
Z1 、Z2 及Z3 分別獨立地表示直接鍵、-O-、-S-、>CO、-CO-O-、-O-CO-、-SO2 -、-SS-、-SO-、>NR62 、PR62 、碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基,
R62 表示氫原子、碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基,
該脂肪族烴基、碳原子數6~35之含芳香環烴基及碳原子數2~35之含雜環基存在被碳-碳雙鍵、-O-、-CO-、-O-CO-、-CO-O-或-SO2 -中斷之情形)
(In the general formula (2), Y 11 represents a trivalent aliphatic hydrocarbon group having 3 to 35 carbon atoms, an alicyclic hydrocarbon group having 3 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or Heterocyclic group containing 2 to 35 carbon atoms,
Z 1 , Z 2 and Z 3 each independently represent a direct bond, -O-, -S-,> CO, -CO-O-, -O-CO-, -SO 2- , -SS-, -SO- ,> NR 62 , PR 62 , aliphatic hydrocarbon group having 1 to 35 carbon atoms, aromatic ring hydrocarbon group having 6 to 35 carbon atoms or heterocyclic group containing 2 to 35 carbon atoms,
R 62 represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or a heterocyclic group containing 2 to 35 carbon atoms,
The aliphatic hydrocarbon group, the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic group containing 2 to 35 carbon atoms have carbon-carbon double bonds, -O-, -CO-, -O-CO-, -CO-O- or -SO 2 -In case of interruption)

[化14]
[Chemical 14]

(上述通式(3)中,Y12 表示碳原子、四價之碳原子數1~35之脂肪族烴基、四價之碳原子數6~35之含芳香環烴基、或四價之碳原子數2~35之含雜環基,該脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基存在被-COO-、-O-、-OCO-、-NHCO-、-NH-或-CONH-中斷之情形,Z1 ~Z4 分別獨立地表示與上述通式(2)中之Z1 ~Z3 所表示之基相同範圍之基)(In the general formula (3), Y 12 represents a carbon atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms having a tetravalent carbon number, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms having a tetravalent number, or a tetravalent carbon atom. A heterocyclic group containing 2 to 35, the aliphatic hydrocarbon group, an aromatic ring containing hydrocarbon group having 6 to 35 carbon atoms, or a heterocyclic group containing 2 to 35 carbon atoms are present as -COO-, -O-, -OCO In the case of-, -NHCO-, -NH-, or -CONH- interruption, Z 1 to Z 4 each independently represent a base in the same range as the base represented by Z 1 to Z 3 in the general formula (2))

[化15]
[Chemical 15]

(上述通式(4)中,Y13 表示五價之碳原子數2~35之脂肪族烴基、五價之碳原子數6~30之含芳香環烴基或五價之碳原子數2~30之含雜環基,該脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基亦存在被-COO-、-O-、-OCO-、-NHCO-、-NH-或-CONH-中斷之情形,Z1 ~Z5 分別獨立地表示與上述通式(2)中之Z1 ~Z3 所表示之基相同之基)(In the above general formula (4), Y 13 represents a pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, a pentavalent carbon atom having 6 to 30 aromatic ring-containing hydrocarbon groups, or a pentavalent carbon atom having 2 to 30 Heterocyclic groups, aliphatic hydrocarbon groups, aromatic ring hydrocarbon groups with 6 to 35 carbon atoms or heterocyclic groups with 2 to 35 carbon atoms also exist -COO-, -O-, -OCO-,- In the case of NHCO-, -NH- or -CONH- interruption, Z 1 to Z 5 each independently represent the same group as the group represented by Z 1 to Z 3 in the above general formula (2))

[化16]
[Chemical 16]

(上述通式(5)中,Y14 表示單鍵、六價之碳原子數2~35之脂肪族烴基、六價之碳原子數6~35之含芳香環烴基或六價之碳原子數2~35之含雜環基,該脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基存在被-COO-、-O-、-OCO-、-NHCO-、-NH-或-CONH-中斷之情形,Z1 ~Z6 分別獨立地表示與上述通式(7)中之Z1 ~Z3 所表示之基相同之基)(In the above general formula (5), Y 14 represents a single bond, an aliphatic hydrocarbon group having 2 to 35 carbon atoms in the hexavalent number, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms in the hexavalent group, or a carbon number in the hexavalent group. A heterocyclic group containing 2 to 35, the aliphatic hydrocarbon group, an aromatic ring containing hydrocarbon group having 6 to 35 carbon atoms, or a heterocyclic group containing 2 to 35 carbon atoms are present as -COO-, -O-, -OCO- In the case of interruption of -NHCO-, -NH-, or -CONH-, Z 1 to Z 6 each independently represent the same base as that represented by Z 1 to Z 3 in the above general formula (7))

作為上述通式(1)所表示之基中之Y1 所表示之二價之碳原子數1~35之脂肪族烴基,可列舉:甲烷、乙烷、丙烷、異丙烷、丁烷、第二丁烷、第三丁烷、異丁烷、己烷、2-甲基己烷、3-甲基己烷、庚烷、2-甲基庚烷、3-甲基庚烷、異庚烷、第三庚烷、1-甲基辛烷、異辛烷、第三辛烷、環丙烷、環丁烷、環戊烷、環己烷、環庚烷、2,4-二甲基環丁烷、4-甲基環己烷等經Z1 及Z2 取代而成之二價基。該等基存在被-O-、-S-、-CO-、-COO-、-OCO-、-NH-或將該等組合而成之基中斷之情形。Examples of the divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 1 in the group represented by the general formula (1) include methane, ethane, propane, isopropane, butane, and second Butane, third butane, isobutane, hexane, 2-methylhexane, 3-methylhexane, heptane, 2-methylheptane, 3-methylheptane, isoheptane, Third heptane, 1-methyloctane, isooctane, third octane, cyclopropane, cyclobutane, cyclopentane, cyclohexane, cycloheptane, 2,4-dimethylcyclobutane , 4-methylcyclohexane, and other divalent groups substituted with Z 1 and Z 2 . These groups may be interrupted by -O-, -S-, -CO-, -COO-, -OCO-, -NH- or a combination of these groups.

作為上述通式(1)所表示之基中之Y1 所表示的二價之碳原子數6~35之含芳香環烴基,可列舉伸苯基、伸萘基、聯苯基等基經Z1 及Z2 取代而成之二價基等。Examples of the divalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 1 in the group represented by the general formula (1) include a group such as phenylene, naphthyl, and biphenyl via Z Divalent radicals substituted by 1 and Z 2 .

作為上述通式(1)所表示之基中之Y1 所表示的二價之碳原子數2~35之含雜環基,可列舉吡啶、吡、哌啶、哌、嘧啶、嗒、三、六氫三、呋喃、四氫呋喃、烷、、噻吩、硫雜環戊烷等經Z1 及Z2 取代而成之二價基。Examples of the divalent heterocyclic group having 2 to 35 carbon atoms represented by Y 1 in the group represented by the general formula (1) include pyridine, pyridine, piperidine, piperidine, pyrimidine, da, tri, Hexahydrotrifuran, tetrahydrofuran, alkane, , Thiophene, thietane, etc. are divalent radicals substituted with Z 1 and Z 2 .

上述通式(1)所表示之基中之Y1 所表示之脂肪族烴基、含芳香環烴基及含雜環基存在經鹵素原子、氰基、硝基或碳原子數1~8之烷氧基取代之情形。
上述脂肪族烴基、含芳香環烴基及含雜環基等各官能基存在具有取代基之情形,只要無特別說明,則為不具有取代基之未經取代者或具有取代基者。
作為此種脂肪族烴基、含芳香環烴基及含雜環基等之取代基,可列舉與取代R11 等中所使用之烷基等之氫原子之取代基相同者。
Among the groups represented by the above general formula (1), an aliphatic hydrocarbon group, an aromatic ring-containing hydrocarbon group and a heterocyclic group represented by Y 1 have a halogen atom, a cyano group, a nitro group, or an alkoxy group having 1 to 8 carbon atoms. The case of radical substitution.
The functional groups such as the aliphatic hydrocarbon group, the aromatic ring-containing hydrocarbon group and the heterocyclic group may have substituents. Unless otherwise specified, they are unsubstituted or substituted without substituents.
Examples of such an aliphatic hydrocarbon group, an aromatic ring-containing hydrocarbon group, and a heterocyclic group-containing substituent include the same substituents as those substituted for a hydrogen atom such as an alkyl group used for R 11 and the like.

作為上述通式(1)所表示之基中之R55 及R56 所表示之碳原子數1~8之烷基,可列舉:甲基、乙基、丙基、異丙基、丁基、第二丁基、第三丁基、異丁基、戊基、異戊基、第三戊基、己基、2-己基、3-己基、環己基、4-甲基環己基、庚基、2-庚基、3-庚基、異庚基、第三庚基、1-辛基、異辛基及第三辛基等。Examples of the alkyl group having 1 to 8 carbon atoms represented by R 55 and R 56 among the groups represented by the general formula (1) include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, Second butyl, third butyl, isobutyl, pentyl, isopentyl, third pentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 4-methylcyclohexyl, heptyl, 2 -Heptyl, 3-heptyl, isoheptyl, third heptyl, 1-octyl, isooctyl, third octyl, etc.

作為上述通式(1)所表示之基中之R55 及R56 所表示之碳原子數6~20之芳基,可列舉:苯基、萘基、2-甲基苯基、3-甲基苯基、4-甲基苯基、4-乙烯基苯基、3-異丙基苯基、4-異丙基苯基、4-丁基苯基、4-異丁基苯基、4-第三丁基苯基、4-己基苯基、4-環己基苯基、4-辛基苯基、4-(2-乙基己基)苯基、2,3-二甲基苯基、2,4-二甲基苯基、2,5-二甲基苯基、2,6-二甲基苯基、3,4-二甲基苯基、3,5-二甲基苯基、2,4-二第三丁基苯基、2,5-二第三丁基苯基、2,6-二第三丁基苯基、2,4-二第三戊基苯基、2,5-二第三戊基苯基及2,4,5-三甲基苯基等。
作為上述通式(1)所表示之基中之R55 及R56 所表示之碳原子數7~20之芳基烷基,可列舉:苄基、苯乙基、2-苯基丙烷-2-基、二苯基甲基、三苯基甲基、苯乙烯基、苯烯丙基等。
Examples of the aryl group having 6 to 20 carbon atoms represented by R 55 and R 56 among the groups represented by the general formula (1) include a phenyl group, a naphthyl group, a 2-methylphenyl group, and a 3-methyl group. Phenyl, 4-methylphenyl, 4-vinylphenyl, 3-isopropylphenyl, 4-isopropylphenyl, 4-butylphenyl, 4-isobutylphenyl, 4 -Third butylphenyl, 4-hexylphenyl, 4-cyclohexylphenyl, 4-octylphenyl, 4- (2-ethylhexyl) phenyl, 2,3-dimethylphenyl, 2,4-dimethylphenyl, 2,5-dimethylphenyl, 2,6-dimethylphenyl, 3,4-dimethylphenyl, 3,5-dimethylphenyl, 2,4-di-tert-butylphenyl, 2,5-di-tert-butylphenyl, 2,6-di-tert-butylphenyl, 2,4-di-tert-pentylphenyl, 2, 5-Di-third-pentylphenyl, 2,4,5-trimethylphenyl and the like.
Examples of the arylalkyl group having 7 to 20 carbon atoms represented by R 55 and R 56 in the group represented by the general formula (1) include benzyl, phenethyl, and 2-phenylpropane-2. -Yl, diphenylmethyl, triphenylmethyl, styryl, phenylallyl, and the like.

上述通式(1)所表示之基中之R57 及R58 所表示之碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基可列舉與作為R53 及R54 所例示之基相同者。Among the groups represented by the general formula (1), R 57 and R 58 represent aliphatic hydrocarbon groups having 1 to 35 carbon atoms, aromatic ring hydrocarbon groups having 6 to 35 carbon atoms, or 2 to 35 carbon atoms. Examples of the heterocyclic group include the same as those exemplified for R 53 and R 54 .

作為上述通式(1-1)所表示之基中之R59 所表示之碳原子數3~10之環烷基,可列舉:環丙基、環丁基、環戊基、環庚基、環辛基等及該等基經碳原子數1~10之烷基或碳原子數1~10之烷氧基取代而成之基等。Examples of the cycloalkyl group having 3 to 10 carbon atoms represented by R 59 among the groups represented by the general formula (1-1) include cyclopropyl, cyclobutyl, cyclopentyl, cycloheptyl, A cyclooctyl group and the like are substituted by an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms.

作為上述通式(1-1)所表示之基中之R60 所表示之碳原子數1~10之烷基,可列舉上述「1.光脫離基B」之項中作為R11 等所表示之烷基所例示者中碳原子數為1~10者。
作為上述通式(1-1)所表示之基中之R60 所表示之碳原子數1~10之烷氧基,可列舉上述「1.光脫離基B」之項中作為R11 等所表示之烷氧基所例示者中碳原子數為1~10者。
作為上述通式(1-1)所表示之基中之R60 所表示之碳原子數2~10之烯基,可列舉:乙烯基、烯丙基、1-丙烯基、異丙烯基、2-丁烯基、1,3-丁二烯基、2-戊烯基及2-辛烯基等。
上述R60 所表示之烷基、烷氧基及烯基亦存在經鹵素原子取代之情形,其取代位置並無限制。
Examples of the alkyl group having 1 to 10 carbon atoms represented by R 60 in the group represented by the general formula (1-1) include R 11 and the like in the item of "1. Photodissociative group B". Examples of the alkyl group include those having 1 to 10 carbon atoms.
Examples of the alkoxy group having 1 to 10 carbon atoms represented by R 60 in the group represented by the general formula (1-1) include R 11 and the like in the item of "1. Photodissociation group B". The number of carbon atoms exemplified by the represented alkoxy group is 1 to 10.
Examples of the alkenyl group having 2 to 10 carbon atoms represented by R 60 in the group represented by the general formula (1-1) include vinyl, allyl, 1-propenyl, isopropenyl, 2 -Butenyl, 1,3-butadienyl, 2-pentenyl, 2-octenyl, and the like.
The alkyl group, alkoxy group, and alkenyl group represented by the above-mentioned R 60 may be substituted with a halogen atom, and the substitution position is not limited.

作為上述通式(1-3)所表示之基中之R61 及R62 所表示之碳原子數1~10之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基,可列舉上述「1.光脫離基B」之項中作為R11 等所例示者中滿足特定之碳原子數者。Among the groups represented by the general formula (1-3), R 61 and R 62 represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, and an alkyl group having 7 to 20 carbon atoms. Examples of the arylalkyl group include those satisfying a specific number of carbon atoms among those exemplified as R 11 in the item "1. Photodissociative group B" described above.

作為上述通式(1-3)所表示之基中之R61 及R62 所表示之碳原子數6~20之芳氧基,可列舉:苯氧基、萘氧基、2-甲基苯氧基、3-甲基苯氧基、4-甲基苯氧基、4-乙烯基苯基二氧基、3-異丙基苯氧基、4-異丙基苯氧基、4-丁基苯氧基、4-第三丁基苯氧基、4-己基苯氧基、4-環己基苯氧基、4-辛基苯氧基、4-(2-乙基己基)苯氧基、2,3-二甲基苯氧基、2,4-二甲基苯氧基、2,5-二甲基苯氧基、2,6-二甲基苯氧基、3,4-二甲基苯氧基、3,5-二甲基苯氧基、2,4-二第三丁基苯氧基、2,5-二第三丁基苯氧基、2,6-二第三丁基苯氧基、2,4-二第三戊基苯氧基、2,5-第三戊基苯氧基、4-環己基苯氧基、2,4,5-三甲基苯氧基及二茂鐵基氧基以及該等基經鹵素原子取代而成之基。Examples of the aryloxy group having 6 to 20 carbon atoms represented by R 61 and R 62 in the group represented by the general formula (1-3) include a phenoxy group, a naphthyloxy group, and 2-methylbenzene. Oxy, 3-methylphenoxy, 4-methylphenoxy, 4-vinylphenyldioxy, 3-isopropylphenoxy, 4-isopropylphenoxy, 4-but Phenoxy, 4-tert-butylphenoxy, 4-hexylphenoxy, 4-cyclohexylphenoxy, 4-octylphenoxy, 4- (2-ethylhexyl) phenoxy , 2,3-dimethylphenoxy, 2,4-dimethylphenoxy, 2,5-dimethylphenoxy, 2,6-dimethylphenoxy, 3,4-dimethyl Methylphenoxy, 3,5-dimethylphenoxy, 2,4-di-tert-butylphenoxy, 2,5-di-tert-butylphenoxy, 2,6-tertiary Butylphenoxy, 2,4-ditripentylphenoxy, 2,5-tertiarypentylphenoxy, 4-cyclohexylphenoxy, 2,4,5-trimethylphenoxy And ferrocenyloxy groups, and these groups are substituted with halogen atoms.

作為上述通式(1-3)所表示之基中之R61 及R62 所表示之碳原子數6~20之芳硫基,可列舉將上述存在經鹵素原子取代之情形之碳原子數6~20之芳氧基之氧原子取代為硫原子而成者。Examples of the arylthio group having 6 to 20 carbon atoms represented by R 61 and R 62 in the group represented by the general formula (1-3) include a carbon atom number 6 in the case where the halogen atom is substituted as described above. The aryloxy group of ~ 20 is substituted by a sulfur atom.

作為上述通式(1-3)所表示之基中之R61 及R62 所表示之碳原子數8~20之芳基烯基,可列舉將上述亦存在經鹵素原子取代之情形之碳原子數6-20之芳氧基之氧原子取代為乙烯基、烯丙基、1-丙烯基、異丙烯基、2-丁烯基、1,3-丁二烯基、2-戊烯基、2-辛烯基等烯基而成之基等。Examples of the arylalkenyl group having 8 to 20 carbon atoms represented by R 61 and R 62 in the group represented by the above-mentioned general formula (1-3) include the carbon atom in which the halogen atom is substituted as described above. The oxygen atom of the aryloxy group of 6-20 is substituted with vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl, 2-pentenyl, Alkenyl groups such as 2-octenyl.

作為上述通式(1-3)所表示之基中之R61 及R62 所表示之碳原子數2~20之含雜環基,可列舉:吡啶基、吡基、哌啶基、哌基、嘧啶基、嗒基、三基、六氫三基、呋喃基、四氫呋喃基、烷基、基、噻吩(thiophene)基及噻吩(thiofuran)基以及該等基經鹵素原子取代而成之基等。Examples of the heterocyclic group having 2 to 20 carbon atoms represented by R 61 and R 62 among the groups represented by the general formula (1-3) include pyridyl, pyridyl, piperidinyl, and piperidinyl , Pyrimidinyl, daphthyl, triyl, hexahydrotriyl, furyl, tetrahydrofuryl, alkyl, Group, thiophene group, thiofuran group, and the group in which these groups are substituted with a halogen atom, and the like.

上述通式(1-3)所表示之基中之R61 及R62 所表示之芳氧基、芳硫基、芳基烯基、含雜環基等各官能基存在具有取代基之情形,只要無特別說明,則為不具有取代基之未經取代者或具有取代基者。
作為取代芳氧基、芳硫基、芳基烯基、含雜環基等之氫原子之取代基,可設為與取代R11 等中所使用之烷基等之氫原子之取代基相同之內容。
When the functional groups such as the aryloxy group, arylthio group, arylalkenyl group, and heterocyclic group-containing group represented by R 61 and R 62 in the group represented by the general formula (1-3) have a substituent, Unless otherwise specified, they are unsubstituted or substituted.
As a substituent that substitutes for a hydrogen atom such as an aryloxy group, an arylthio group, an arylalkenyl group, and a heterocyclic group, it may be the same as a substituent that substitutes for a hydrogen atom such as an alkyl group used in R 11 and the like. content.

作為上述通式(2)所表示之基中之Y11 所表示的三價之碳原子數3~35之脂肪族烴基,可列舉上述通式(1)中之X之說明所例示之脂肪族烴基經Z1 、Z2 及Z3 取代而成之三價基,該等基存在經-O-、-S-、-CO-、-CO-O-、-O-CO-、-SO2 -、-NH-或將該等組合而成之基取代之情形。Examples of the trivalent aliphatic hydrocarbon group having 3 to 35 carbon atoms represented by Y 11 in the group represented by the general formula (2) include the aliphatic exemplified by the description of X in the general formula (1). A trivalent group substituted with a hydrocarbon group by Z 1 , Z 2 and Z 3. These groups exist in -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO 2 -, -NH- or a combination of these groups.

作為上述通式(2)所表示之基中之Y11 所表示的三價之碳原子數6~35之含芳香環烴基,可列舉上述通式(1)中之X之說明所例示之含芳香環烴基經Z1 、Z2 及Z3 取代而成之三價基。Examples of the trivalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 11 among the bases represented by the general formula (2) include those exemplified by the description of X in the general formula (1). A trivalent group in which an aromatic cyclic hydrocarbon group is substituted with Z 1 , Z 2 and Z 3 .

作為上述通式(2)所表示之基中之Y11 所表示的三價之碳原子數2~35之含雜環基,可列舉上述通式(1)中之X之說明所例示之含雜環基經Z1 、Z2 及Z3 取代而成之三價基。Examples of the trivalent heterocyclic group having 2 to 35 carbon atoms represented by Y 11 in the group represented by the general formula (2) include the groups exemplified by the description of X in the general formula (1). A trivalent group in which a heterocyclic group is substituted with Z 1 , Z 2 and Z 3 .

作為上述通式(2)所表示之基中之Z1 、Z2 及Z3 以及R62 所表示之碳原子數1~35之脂肪族烴基、碳原子數6~35之含芳香環烴基或碳原子數2~35之含雜環基,可列舉與上述作為R53 及R54 所例示之基相同者。Among the groups represented by the general formula (2), Z 1 , Z 2 and Z 3 and R 62 are an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or Examples of the heterocyclic group having 2 to 35 carbon atoms include the same groups as those exemplified as R 53 and R 54 described above.

作為上述通式(3)所表示之基中之Y12 所表示的四價之碳原子數1~35之脂肪族烴基,可列舉上述通式(1)中之X之說明所例示之脂肪族烴基經Z1 、Z2 、Z3 及Z4 取代而成之四價基,存在被-O-、-S-、-CO-、-COO-、-OCO-、-NH-或將該等組合而成之基中斷之情形。Examples of the tetravalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 12 in the group represented by the general formula (3) include the aliphatic exemplified by the description of X in the general formula (1). A tetravalent group in which a hydrocarbon group is substituted by Z 1 , Z 2 , Z 3 and Z 4. There are -O-, -S-, -CO-, -COO-, -OCO-, -NH- or the like. When the combined base is broken.

作為上述通式(3)所表示之基中之Y12 所表示的四價之碳原子數6~35之含芳香環烴基,可列舉上述通式(1)中之X之說明所例示之含芳香環烴基經Z1 、Z2 、Z3 及Z4 取代而成之四價基。Examples of the tetravalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 12 among the bases represented by the general formula (3) include those exemplified by the description of X in the general formula (1). A tetravalent group in which the aromatic cyclic hydrocarbon group is substituted with Z 1 , Z 2 , Z 3 and Z 4 .

作為上述通式(3)所表示之基中之Y12 所表示的四價之碳原子數2~35之含雜環基,可列舉上述通式(1)中之X之說明所例示之含雜環基經Z1 、Z2 、Z3 及Z4 取代而成之四價基。Examples of the tetravalent heterocyclic group having 2 to 35 carbon atoms represented by Y 12 in the group represented by the general formula (3) include the groups exemplified by the description of X in the general formula (1). A tetravalent group in which a heterocyclic group is substituted with Z 1 , Z 2 , Z 3 and Z 4 .

作為上述通式(4)所表示之基中之Y13 所表示的五價之碳原子數2~35之脂肪族烴基,可列舉上述通式(1)中之X之說明所例示之脂肪族烴基經Z1 、Z2 、Z3 、Z4 及Z5 取代而成之五價基,存在經-O-、-S-、-CO-、-CO-O-、-O-CO-、-SO2 -、-NH-或將該等組合而成之基取代之情形。Examples of the pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms represented by Y 13 in the group represented by the general formula (4) include the aliphatic exemplified by the description of X in the general formula (1). A pentavalent group substituted with a hydrocarbon group by Z 1 , Z 2 , Z 3 , Z 4 and Z 5. There are -O-, -S-, -CO-, -CO-O-, -O-CO-, In the case where -SO 2- , -NH- or a combination of these groups is substituted.

作為上述通式(4)所表示之基中之Y13 所表示的五價之碳原子數6~35之含芳香環烴基,可列舉上述通式(1)中之X之說明所例示之含芳香環烴基經Z1 、Z2 、Z3 、Z4 及Z5 取代而成之五價基。Examples of the pentavalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 13 among the groups represented by the general formula (4) include the groups exemplified by the description of X in the general formula (1). A pentavalent group in which the aromatic cyclic hydrocarbon group is substituted with Z 1 , Z 2 , Z 3 , Z 4 and Z 5 .

作為上述通式(4)所表示之基中之Y13 所表示的五價之碳原子數2~35之含雜環基,可列舉上述通式(1)中之X之說明所例示之含雜環基經Z1 、Z2 、Z3 、Z4 及Z5 取代而成之五價基。Examples of the pentavalent heterocyclic group having 2 to 35 carbon atoms represented by Y 13 in the group represented by the general formula (4) include the groups exemplified by the description of X in the general formula (1). A pentavalent group in which a heterocyclic group is substituted with Z 1 , Z 2 , Z 3 , Z 4 and Z 5 .

作為上述通式(5)中之Y14 所表示的六價之碳原子數2~35之脂肪族烴基,可列舉上述通式(1)中之X之說明所例示之脂肪族烴基經Z1 、Z2 、Z3 、Z4 、Z5 及Z6 取代而成之六價基,該基存在被-O-、-S-、-CO-、-COO-、-OCO-、-SO2 -、-NH-或將該等組合而成之基中斷之情形。The general formula Y (5) in the hexavalent of carbon 14 atoms represented by an aliphatic hydrocarbon group of 2 to 35, include the above described general formula of X (1) in the exemplified by the aliphatic hydrocarbon group Z 1 , Z 2, Z 3, Z 4, Z 5 and Z 6 are substituted with hexavalent radical of the group present is -O -, - S -, - CO -, - COO -, - OCO -, - SO 2 -, -NH- or the combination of these groups is broken.

作為上述通式(5)中之Y14 所表示的六價之碳原子數6~35之含芳香環烴基,可列舉上述通式(1)中之X之說明所例示之含芳香環烴基經Z1 、Z2 、Z3 、Z4 、Z5 及Z6 取代而成之六價基。Examples of the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms having a hexavalent number represented by Y 14 in the general formula (5) include the aromatic ring-containing hydrocarbon group exemplified by the description of X in the general formula (1). Hexavalent radicals substituted by Z 1 , Z 2 , Z 3 , Z 4 , Z 5 and Z 6 .

作為上述通式(5)中之Y14 所表示的六價之碳原子數2~35之含雜環基,可列舉上述通式(1)中之X之說明所例示之含雜環基經Z1 、Z2 、Z3 、Z4 、Z5 及Z6 取代而成之六價基。Examples of the hexavalent heterocyclic group containing 2 to 35 carbon atoms represented by Y 14 in the above general formula (5) include the heterocyclic group containing exemplified by the description of X in the general formula (1). Hexavalent radicals substituted by Z 1 , Z 2 , Z 3 , Z 4 , Z 5 and Z 6 .

上述鍵結基X於m為2之情形時,較佳為碳原子數1~120之脂肪族烴基,更佳為伸烷基或二醇之殘基,較佳為碳原子數1~10之伸烷基或碳原子數1~10之二醇殘基,其中,較佳為碳原子數1~5之伸烷基或碳原子數1~5之二醇殘基,尤佳為碳原子數1~3之伸烷基。其原因在於:可製成硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物,進而容易製造化合物I-1。When the above-mentioned bonding group X is m, it is preferably an aliphatic hydrocarbon group having 1 to 120 carbon atoms, more preferably a residue of an alkylene group or a diol, and more preferably 1 to 10 carbon atoms. An alkylene group or a diol residue having 1 to 10 carbon atoms, of which an alkylene group having 1 to 5 carbon atoms or a diol residue having 1 to 5 carbon atoms is preferred, and a carbon atom number is particularly preferred 1 to 3 alkylene. The reason for this is that it can be made into a compound that has less resistance to hardening and can easily provide a UV-absorbing function to the cured material, and it is easy to produce compound I-1.

作為上述鍵結基X與苯環之鍵結位置,可為苯環內能夠鍵結之任意位置,例如較佳為相對於R2 為鄰位或間位。其原因在於:可製成硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。The bonding position between the above-mentioned bonding group X and the benzene ring may be any position capable of bonding in the benzene ring, and is preferably ortho or meta with respect to R 2 , for example. The reason for this is that it can be made into a compound that has less resistance to hardening and can easily provide a UV-absorbing function to the hardened material.

上述X於m=1時,較佳為氫原子或與R2相同之基。When X is m = 1, it is preferably a hydrogen atom or the same group as R2.

上述原子團A可為含有酚性羥基者,即,化合物I-1可為含有未被光脫離基B保護之酚性羥基,酚性羥基之數較佳為2個以下,更佳為0個。其原因在於上述化合物I-1成為硬化阻礙較少者。The atomic group A may be a phenolic hydroxyl group, that is, the compound I-1 may contain a phenolic hydroxyl group that is not protected by a photo-leaving group B. The number of phenolic hydroxyl groups is preferably 2 or less, and more preferably 0. The reason for this is that the above-mentioned compound I-1 becomes one with less hindrance to hardening.

3.化合物
本發明之化合物為上述通式(I-1)所表示者即可,為上述通式(A-1)、(A-2)或(A-3)所表示之化合物,作為光脫離基B,較佳為含有上述通式(B-1-a)所表示者。其原因在於:合成較容易,進而,光脫離較容易。又,其原因在於:可對硬化物容易地賦予紫外線吸收功能等。又,其原因在於:化合物I-1為通式(A-1)、(A-2)或(A-3)所表示之化合物,因此能夠生成藉由光脫離基B之脫離而穩定地吸收紫外線區域之光之化合物。
3. Compound The compound of the present invention may be any one represented by the general formula (I-1), and is a compound represented by the general formula (A-1), (A-2), or (A-3). The leaving group B preferably contains one represented by the general formula (B-1-a). The reason is that the synthesis is easier, and further, the light detachment is easier. The reason is that an ultraviolet absorbing function and the like can be easily provided to the cured product. The reason is that the compound I-1 is a compound represented by the general formula (A-1), (A-2), or (A-3). Therefore, the compound I-1 can be stably absorbed by the detachment of the light detaching group B. A compound of light in the ultraviolet region.

作為上述化合物I-1之具體例,例如可列舉下述所表示之化合物。Specific examples of the compound I-1 include the compounds shown below.

[化17]
[Chemical 17]

[化18]
[Chemical 18]

[化19]
[Chemical 19]

[化19A]
[化 19A]

上述化合物I-1之分子量可根據化合物I-1之用途等而設定。上述化合物I-1之分子量例如較佳為250以上且5000以下,更佳為300以上且2500以下,尤佳為設為350以上且1500以下。其原因在於:可製成硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。
再者,上述化合物I-1之分子量於化合物I-1為含有重複結構作為其結構之聚合物之情形時,以重量平均分子量(Mw)表示。重量平均分子量(Mw)可藉由凝膠滲透層析法(GPC),作為標準聚苯乙烯換算值求出。
The molecular weight of the compound I-1 can be set according to the application of the compound I-1 and the like. The molecular weight of the compound I-1 is, for example, preferably from 250 to 5,000, more preferably from 300 to 2500, and even more preferably from 350 to 1500. The reason for this is that it can be made into a compound that has less resistance to hardening and can easily provide a UV-absorbing function to the hardened material.
The molecular weight of the compound I-1 is represented by the weight average molecular weight (Mw) when the compound I-1 is a polymer containing a repeating structure as its structure. The weight average molecular weight (Mw) can be calculated as a standard polystyrene conversion value by gel permeation chromatography (GPC).

上述重量平均分子量Mw例如可使用Tosoh股份有限公司製造之HLC-8120GPC,將溶出溶劑設為添加有0.01莫耳/升之溴化鋰之N-甲基吡咯啶酮,將校正曲線用聚苯乙烯標準設為Mw377400、210500、96000、50400、20650、10850、5460、2930、1300、580(以上為Polymer Laboratories公司製造之Easi PS-2系列)及Mw1090000(Tosoh股份有限公司製造),將測定管柱設為TSK-GEL ALPHA-M×2根(Tosoh股份有限公司製造)進行測定而獲得。又,測定溫度可設為40℃,流速可設為1.0 mL/min。The weight average molecular weight Mw can be, for example, HLC-8120GPC manufactured by Tosoh Co., Ltd., the dissolution solvent is set to N-methylpyrrolidone added with 0.01 mol / L lithium bromide, and the calibration curve is set using polystyrene standards Mw377400, 210500, 9600, 50400, 20650, 10850, 5460, 2930, 1300, 580 (the above are Easi PS-2 series manufactured by Polymer Laboratories) and Mw1090000 (manufactured by Tosoh Corporation). TSK-GEL ALPHA-M x 2 (manufactured by Tosoh Co., Ltd.) were measured and obtained. The measurement temperature can be set to 40 ° C, and the flow rate can be set to 1.0 mL / min.

上述化合物I-1之製造方法只要為可獲得所需之結構之方法,則無特別限定,例如可使藉由日本專利特開昭57-111375號公報、日本專利特開平3-173843號公報、日本專利特開平6-128195號公報、日本專利特開平7-206771號公報、日本專利特開平7-252191號公報或日本專利特表2004-501128號公報所記載之方法所製造之酚系化合物與烷基鹵化物化合物進行反應而獲得。The method for producing the compound I-1 is not particularly limited as long as it can obtain a desired structure. For example, it can be obtained by Japanese Patent Laid-Open No. 57-111375, Japanese Patent Laid-Open No. 3-173843, A phenolic compound produced by a method described in Japanese Patent Laid-Open No. 6-128195, Japanese Patent Laid-Open No. 7-206771, Japanese Patent Laid-Open No. 7-252191, or Japanese Patent Laid-Open No. 2004-501128. An alkyl halide compound is obtained by reaction.

上述化合物I-1於光照射前為不活性,光脫離基因光照射脫離,而生成具有酚性羥基之化合物I-2。
又,上述化合物I-2係發揮紫外線吸收功能者。
作為此種化合物I-1之用途,較佳為要求藉由光照射而發揮出紫外線吸收功能之用途,例如可列舉添加至組合物中使用之紫外線吸收劑等。
The above-mentioned compound I-1 is inactive before light irradiation, and the light detaches from the gene and is irradiated by light irradiation, thereby generating a compound I-2 having a phenolic hydroxyl group.
Moreover, the said compound I-2 is a person exhibiting a ultraviolet absorption function.
As the application of such a compound I-1, an application requiring an ultraviolet absorbing function by light irradiation is preferred, and examples thereof include an ultraviolet absorber added to the composition.

B.潛在性紫外線吸收劑
繼而,對本發明之潛在性紫外線吸收劑進行說明。
本發明之潛在性紫外線吸收劑含有本發明之化合物I-1。
B. Potential UV Absorbent Next, the potential UV absorber of the present invention will be described.
The potential ultraviolet absorbent of the present invention contains the compound I-1 of the present invention.

本發明之潛在性紫外線吸收劑藉由含有本發明之化合物I-1,例如硬化阻礙較少,可對硬化物容易地賦予紫外線吸收功能等。By containing the compound I-1 of the present invention, the latent ultraviolet absorbent of the present invention has, for example, less hardening resistance, and can easily provide an ultraviolet absorbing function to a cured product.

本發明之潛在性紫外線吸收劑中之化合物I-1之含量並無特別限制,可根據潛在性紫外線吸收劑之用途等而適當設定。
本發明之潛在性紫外線吸收劑可設為潛在性紫外線吸收劑100質量份中含有100質量份之化合物I-1者,即,上述潛在性紫外線吸收劑可設為僅包含上述化合物I-1者。
又,本發明之潛在性紫外線吸收劑存在除了化合物I-1以外還含有其他成分之情形。於本發明之潛在性紫外線吸收劑含有其他成分之情形時,化合物I-1之含量於潛在性紫外線吸收劑100質量份中,例如可設為超過20質量份且99質量份以下,較佳為25質量份以上且99質量份以下,更佳為50質量份以上且99質量份以下,尤佳為80質量份以上且99質量份以下。其原因在於:上述潛在性紫外線吸收劑可有效地發揮出硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等效果。
The content of the compound I-1 in the latent ultraviolet absorber of the present invention is not particularly limited, and can be appropriately set according to the use of the latent ultraviolet absorber and the like.
The latent ultraviolet absorbent of the present invention may be a compound containing the compound I-1 in 100 parts by mass of the latent ultraviolet absorbent, that is, the latent ultraviolet absorbent may be a compound containing only the compound I-1. .
In addition, the potential ultraviolet absorbent of the present invention may contain other components in addition to Compound I-1. When the latent ultraviolet absorbent of the present invention contains other components, the content of the compound I-1 may be 100 parts by mass of the latent ultraviolet absorber, for example, it may be more than 20 parts by mass and 99 parts by mass or less. 25 mass parts or more and 99 mass parts or less, more preferably 50 mass parts or more and 99 mass parts or less, and even more preferably 80 mass parts or more and 99 mass parts or less. The reason for this is that the above-mentioned latent ultraviolet absorbent can effectively exhibit effects such as less resistance to hardening and easy provision of a UV-absorbing function to a cured product.

上述潛在性紫外線吸收劑所含之上述化合物I-1之種類有時僅1種,有時為2種以上。於上述潛在性紫外線吸收劑含有數種化合物I-1之情形時,種類數例如可設為2種以上且5種以下。The types of the compound I-1 contained in the latent ultraviolet absorber may be only one kind, and may be two or more kinds. When the said latent ultraviolet absorber contains several types of compound I-1, the number of types may be 2 or more and 5 or less, for example.

再者,關於上述化合物I-1,可設為與「A.化合物」之項所記載之內容相同,因此此處省略說明。In addition, since the said compound I-1 can be set as the content described in the item of "A. compound", description is abbreviate | omitted here.

作為上述潛在性紫外線吸收劑所含之上述其他成分,例如可使用與下文所述之「C.組合物」之「2.其他成分」之項所記載之成分相同者。
上述潛在性紫外線吸收劑較佳為含有不具有聚合性基之聚合物等樹脂成分作為其他成分。其原因在於:能夠穩定地保持上述化合物I-1。
As the other component contained in the latent ultraviolet absorber, for example, the same component as described in the item "2. Other components" of "C. Composition" described below can be used.
It is preferable that the said latent ultraviolet absorber contains resin components, such as a polymer which does not have a polymerizable group, as another component. The reason is that the above-mentioned compound I-1 can be stably maintained.

上述潛在性紫外線吸收劑之形狀有時為粉末狀,有時為顆粒狀。
於為顆粒狀之情形時,作為上述潛在性紫外線吸收劑之製造方法,例如可使用如下方法:使用擠出機等將上述化合物I-1及樹脂成分加以混合後,成型為顆粒狀。
The shape of the above-mentioned latent ultraviolet absorbent may be powdery or granular.
In the case of pellets, as the method for producing the above-mentioned latent ultraviolet absorber, for example, a method can be used in which the compound I-1 and the resin component are mixed using an extruder or the like, and then molded into pellets.

C.組合物
繼而,對本發明之組合物進行說明。
本發明之組合物含有化合物I-1。
C. Composition Next, the composition of the present invention will be described.
The composition of the present invention contains compound I-1.

根據本發明之組合物,例如可提供一種硬化阻礙較少、可獲得優異之紫外線吸收功能硬化物之組合物。以下,對上述組合物之各成分進行說明。According to the composition of the present invention, for example, it is possible to provide a composition which has less resistance to hardening and can obtain a cured product having excellent ultraviolet absorption function. Hereinafter, each component of the said composition is demonstrated.

1.化合物
本發明之組合物中之化合物I-1之含量只要為可對組合物賦予所需之紫外線吸收功能等之量,則無特別限定。本發明之組合物中之化合物I-1之含量例如於組合物之固形物成分100質量中,可設為0.001質量份以上且20質量份以下,較佳為0.005質量份以上且10質量份以下。其原因在於:容易製成硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之組合物。
再者,所謂固形物成分包含溶劑以外之全部成分。
又,於本說明書中無特別說明之情形時,含量為質量基準。
上述化合物I-1之含量根據溶劑等之含量而有所不同,例如於組合物100質量份中,可設為0.001質量份以上且20質量份以下,其中,較佳為0.005質量份以上且10質量份以下。其原因在於:容易製成硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之組合物。
1. Compound The content of the compound I-1 in the composition of the present invention is not particularly limited as long as it can provide a desired ultraviolet absorbing function or the like to the composition. The content of the compound I-1 in the composition of the present invention may be, for example, 100 mass parts or more and 20 mass parts or less, preferably 0.005 mass parts or more and 10 mass parts or less, based on 100 mass parts of the solid content of the composition. . The reason for this is that it is easy to make a composition that has less resistance to hardening and can easily provide a UV-absorbing function to the cured material.
The solid component includes all components other than the solvent.
In addition, when there is no special description in this specification, content is a mass basis.
The content of the compound I-1 varies depending on the content of the solvent and the like. For example, it can be 0.001 to 20 parts by mass in 100 parts by mass of the composition. Among them, 0.005 to 10 parts by mass and 10 are preferred. Mass parts or less. The reason for this is that it is easy to make a composition that has less resistance to hardening and can easily provide a UV-absorbing function to the cured material.

上述組合物所含之上述化合物I-1之種類可僅為1種,亦可為2種以上。上述種類例如可設為2種以上且5種以下。The type of the compound I-1 contained in the composition may be only one kind, or two or more kinds. The above-mentioned types may be, for example, two or more and five or less.

再者,關於上述化合物I-1,可設為與「A.化合物」之項所記載之內容相同,因此此處省略說明。In addition, since the said compound I-1 can be set as the content described in the item of "A. compound", description is abbreviate | omitted here.

2.其他成分
上述組合物存在根據其用途等而含有上述化合物I-1以外之其他成分之情形。
作為上述其他成分,例如可列舉樹脂成分。其原因在於:藉由本發明之組合物除了化合物I-1以外還含有樹脂成分,例如可對上述組合物容易地賦予硬化性等。
又,本發明之組合物較佳為含有上述樹脂成分之同時含有聚合起始劑作為其他成分。其原因在於:藉由本發明之組合物含有樹脂成分及聚合起始劑作為其他成分,可對組合物容易地賦予硬化性等。
2. Other components The said composition may contain components other than the said compound I-1 depending on the use etc.
Examples of the other components include a resin component. The reason is that the composition of the present invention contains a resin component in addition to the compound I-1, and for example, it is possible to easily impart hardenability to the composition.
Moreover, it is preferable that the composition of this invention contains the said resin component, and also contains a polymerization initiator as another component. This is because the composition of the present invention contains a resin component and a polymerization initiator as other components, so that hardenability and the like can be easily imparted to the composition.

(1)樹脂成分
作為上述樹脂成分,可列舉能夠保持上述化合物I-1者,可根據組合物之用途等而適當設定,例如可列舉具有聚合性基之聚合性化合物及不具有聚合性基之聚合物等。
藉由含有聚合性化合物作為上述樹脂成分,上述組合物例如可用作光硬化性組合物或熱硬化性組合物。
(1) Resin component As the resin component, those capable of retaining the above-mentioned compound I-1 may be mentioned, and they may be appropriately set according to the use of the composition, and examples thereof include polymerizable compounds having a polymerizable group and those having no polymerizable group. Polymer, etc.
By containing a polymerizable compound as the resin component, the composition can be used, for example, as a photocurable composition or a thermosetting composition.

(a)聚合性化合物
聚合性化合物根據聚合性基之種類、即聚合反應之種類而有所不同,例如可列舉:自由基聚合性化合物、陽離子聚合性化合物、陰離子聚合性化合物等。
上述聚合性化合物就有效地發揮出硬化阻礙變少之效果之觀點而言,較佳為含有自由基聚合性化合物。
(a) Polymerizable compound The polymerizable compound varies depending on the type of the polymerizable group, that is, the type of the polymerization reaction, and examples thereof include a radical polymerizable compound, a cation polymerizable compound, and an anionic polymerizable compound.
The polymerizable compound preferably contains a radical polymerizable compound from the viewpoint of effectively exhibiting an effect of reducing hardening resistance.

(i)自由基聚合性化合物
上述自由基聚合性化合物只要為具有1種以上能夠進行自由基聚合之聚合性基者即可,亦可為含有2種以上者。
上述自由基聚合性化合物通常與自由基聚合起始劑一併使用。
作為能夠進行自由基聚合之聚合性基,例如可列舉(甲基)丙烯酸基、乙烯基等乙烯性不飽和雙鍵基。
再者,(甲基)丙烯酸系係以包含丙烯酸系及甲基丙烯酸系之含義使用。又,(甲基)丙烯酸酯係以包含丙烯酸酯及甲基丙烯酸酯之含義使用。
(i) Radical polymerizable compound The radical polymerizable compound may be one having one or more polymerizable groups capable of radical polymerization, and may include two or more polymerizable groups.
The radical polymerizable compound is usually used together with a radical polymerization initiator.
Examples of the polymerizable group capable of radical polymerization include ethylenically unsaturated double bond groups such as a (meth) acrylic group and a vinyl group.
In addition, (meth) acrylic type is used in the meaning which includes acrylic type and methacrylic type. Moreover, (meth) acrylate is used in the meaning which contains an acrylate and a methacrylate.

又,作為自由基聚合性化合物,可為具有酸值之化合物,亦可為不具有酸值之化合物。
作為具有酸值之化合物,例如可列舉具有羧基之化合物等。
上述組合物藉由含有具有酸值之化合物作為自由基聚合性化合物,光照射部位於鹼性顯影液中之溶解性降低。因此,上述組合物例如可作為於鹼性顯影液等溶劑中之溶解性於光照射前後發生變化之感光性組合物使用。更具體而言,上述組合物藉由含有具有酸值之化合物,而可作為負型組合物使用。
作為鹼性顯影液,可使用氫氧化四甲基銨(TMAH)水溶液、或氫氧化鉀水溶液等通常用作鹼性顯影液者。
The radically polymerizable compound may be a compound having an acid value or a compound having no acid value.
Examples of the compound having an acid value include a compound having a carboxyl group.
The composition described above contains a compound having an acid value as a radical polymerizable compound, and the solubility of the light-irradiated portion in the alkaline developer is reduced. Therefore, the above-mentioned composition can be used, for example, as a photosensitive composition whose solubility in a solvent such as an alkaline developer changes before and after light irradiation. More specifically, the above composition can be used as a negative composition by containing a compound having an acid value.
As the alkaline developer, an aqueous solution of tetramethylammonium hydroxide (TMAH), an aqueous solution of potassium hydroxide, or the like is generally used as the alkaline developer.

上述自由基聚合性化合物中,例如作為具有乙烯性不飽和雙鍵基且具有酸值之化合物,可列舉:(甲基)丙烯酸、α-氯丙烯酸、亞甲基丁二酸、順丁烯二酸、甲基順丁烯二酸、反丁烯二酸、雙環庚烯二甲酸、丁烯酸、異丁烯酸、乙烯基乙酸、烯丙基乙酸、肉桂酸、己二烯酸、甲基反丁烯二酸、丁二酸單[2-(甲基)丙烯醯氧基乙基]酯、鄰苯二甲酸單[2-(甲基)丙烯醯氧基乙基]酯及ω-羧基聚己內酯單(甲基)丙烯酸酯等於兩末端具有羧基與羥基之聚合物之單(甲基)丙烯酸酯;羥基乙基(甲基)丙烯酸酯/順丁烯二酸酯、羥基丙基(甲基)丙烯酸酯/順丁烯二酸酯、二環戊二烯/順丁烯二酸酯或具有1個羧基與2個以上之(甲基)丙烯醯基之多官能(甲基)丙烯酸酯等不飽和一元酸;苯酚酚醛清漆環氧樹脂及/或甲酚酚醛清漆環氧樹脂、具有聯苯骨架、萘骨架之酚醛清漆環氧樹脂、雙酚A酚醛清漆型環氧化合物、二環戊二烯酚醛清漆型環氧化合物等酚醛清漆型環氧化合物、具有多官能環氧基之聚苯基甲烷型環氧樹脂、使下述通式(III)所表示之環氧化合物等環氧樹脂之環氧基與不飽和一元酸作用而成之樹脂、使下述通式(III)所表示之環氧化合物等環氧樹脂之環氧基與不飽和一元酸作用且進而與多元酸酐作用所獲得之樹脂;作為季戊四醇三丙烯酸酯、二季戊四醇五丙烯酸酯等含羥基之多官能丙烯酸酯與丁二酸酐、鄰苯二甲酸酐、四氫鄰苯二甲酸酐等之二元酸酐之反應物的具有酸值之多官能丙烯酸酯等。Among the above-mentioned radically polymerizable compounds, for example, as the compound having an ethylenically unsaturated double bond group and having an acid value, (meth) acrylic acid, α-chloroacrylic acid, methylene succinic acid, and maleic acid Acid, methyl maleic acid, fumaric acid, dicycloheptenedioic acid, butenoic acid, methacrylic acid, vinyl acetic acid, allyl acetic acid, cinnamic acid, adipic acid, methyl fumaric acid , [2- (meth) acryloxyethyl] succinate, [2- (meth) acryloxyethyl] phthalate, and ω-carboxy polycaprolactone mono (Meth) acrylate is a mono (meth) acrylate of a polymer having a carboxyl group and a hydroxyl group at both ends; hydroxyethyl (meth) acrylate / maleate, hydroxypropyl (meth) acrylate Unsaturation such as esters / maleic acid esters, dicyclopentadiene / maleic acid esters, or polyfunctional (meth) acrylates having one carboxyl group and two or more (meth) acrylfluorenyl groups Monobasic acid; phenol novolac epoxy resin and / or cresol novolac epoxy resin, novolac epoxy resin with biphenyl skeleton, naphthalene skeleton, double A novolac epoxy compounds such as novolac epoxy compounds, dicyclopentadiene novolac epoxy compounds, polyphenylmethane epoxy resins having polyfunctional epoxy groups, and the following general formula (III Epoxy resins such as epoxy compounds represented by) and unsaturated monoacids, and epoxy resins such as epoxy compounds represented by the following general formula (III) Resin obtained by the action of saturated monobasic acid and then with polybasic acid anhydride; as a hydroxyl-containing polyfunctional acrylate such as pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and succinic anhydride, phthalic anhydride, tetrahydrophthalic acid A polyfunctional acrylate having an acid value as a reactant of a dibasic acid anhydride such as formic anhydride.

[化20]
[Chemical 20]

(式中,X41 表示直接鍵、碳原子數1~4之亞烷基、碳原子數3~20之脂環式烴基、-O-、-S-、-SO2 -、-SS-、-SO-、-CO-、-OCO-或上述(1-1)~(1-3)所表示之取代基,
R41 、R42 、R44 及R44 分別獨立地表示氫原子、碳原子數1~5之烷基、碳原子數1~8之烷氧基、碳原子數2~5之烯基或鹵素原子,
d為0~10之整數)
(In the formula, X 41 represents a direct bond, an alkylene group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 3 to 20 carbon atoms, -O-, -S-, -SO 2- , -SS-, -SO-, -CO-, -OCO- or the substituents represented by the above (1-1) to (1-3),
R 41 , R 42 , R 44 and R 44 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or a halogen atom,
d is an integer from 0 to 10)

作為R41 、R42 、R44 及R44 所表示之碳原子數1~5之烷基、碳原子數1~8之烷氧基及碳原子數2~5之烯基,可列舉上述「A.化合物」之項中作為R11 等所例示者中滿足特定之碳原子數者。
作為X41 所表示之碳原子數1~4之亞烷基,例如可列舉:亞甲基、亞乙基、亞丙基及亞丁基等。
作為X41 所表示之碳原子數3~20之脂環式烴基,可列舉:伸環丙基、伸環戊基、伸環己基及伸環庚基等。
上述烷基、烷氧基、烯基、亞烷基及脂環式烴基存在具有取代基之情形,只要無特別說明,則為不具有取代基之未經取代者或具有取代基者。作為該取代烷基、烷氧基、烯基、亞烷基及脂環式烴基之氫原子之取代基,可設為與取代R11 等中所使用之烷基等之氫原子之取代基相同之內容。
Examples of the alkyl group having 1 to 5 carbon atoms, the alkoxy group having 1 to 8 carbon atoms, and the alkenyl group having 2 to 5 carbon atoms represented by R 41 , R 42 , R 44 and R 44 include the above-mentioned ""A.Compound" among those exemplified as R 11 and the like satisfying a specific number of carbon atoms.
Examples of the alkylene group having 1 to 4 carbon atoms represented by X 41 include methylene, ethylene, propylene, and butylene.
Examples of the alicyclic hydrocarbon group having 3 to 20 carbon atoms represented by X 41 include a cyclopropyl group, a cyclopentyl group, a cyclohexyl group, and a cycloheptyl group.
The above-mentioned alkyl group, alkoxy group, alkenyl group, alkylene group, and alicyclic hydrocarbon group may have a substituent. Unless otherwise specified, they are unsubstituted or substituted without a substituent. The substituent of the hydrogen atom of the substituted alkyl, alkoxy, alkenyl, alkylene, and alicyclic hydrocarbon group may be the same as the substituent of the hydrogen atom of the alkyl group used in R 11 and the like. Content.

上述自由基聚合性化合物中,例如作為具有乙烯性不飽和雙鍵基且不具有酸值之化合物,可列舉:(甲基)丙烯酸-2-羥基乙酯、(甲基)丙烯酸-2-羥基丙酯、(甲基)丙烯酸縮水甘油酯、下述化合物No.A1~No.A4、(甲基)丙烯酸甲酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸二甲胺基甲酯、(甲基)丙烯酸二甲胺基乙酯、(甲基)丙烯酸胺基丙酯、(甲基)丙烯酸二甲胺基丙酯、(甲基)丙烯酸乙氧基乙酯、(甲基)丙烯酸聚(乙氧基)乙酯、(甲基)丙烯酸丁氧基乙氧基乙酯、(甲基)丙烯酸乙基己酯、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸四氫呋喃酯、(甲基)丙烯酸乙烯酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸苄酯、乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、三羥甲基乙烷三(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、三環癸烷二羥甲基二(甲基)丙烯酸酯、異氰脲酸三[(甲基)丙烯醯基乙基]酯、聚酯(甲基)丙烯酸酯低聚物等不飽和一元酸及多元醇或多酚之酯;(甲基)丙烯酸鋅、(甲基)丙烯酸鎂等不飽和多元酸之金屬鹽;順丁烯二酸酐、亞甲基丁二酸酐、甲基順丁烯二酸酐、甲基四氫鄰苯二甲酸酐、四氫鄰苯二甲酸酐、三烷基四氫鄰苯二甲酸酐、5-(2,5-二側氧四氫呋喃基)-3-甲基-3-環己烯-1,2-二羧酸酐、三烷基四氫鄰苯二甲酸酐-順丁烯二酸酐加成物、十二碳烯基丁二酸酐、甲基雙環庚烯二甲酸酐等不飽和多元酸之酸酐;(甲基)丙烯醯胺、亞甲基雙(甲基)丙烯醯胺、二伸乙基三胺三(甲基)丙烯醯胺、苯二甲基雙(甲基)丙烯醯胺、α-氯丙烯醯胺、N-2-羥基乙基(甲基)丙烯醯胺等不飽和一元酸及多胺之醯胺;丙烯醛等不飽和醛;(甲基)丙烯腈、α-氯丙烯腈、二氰亞乙烯、氰化烯丙基等不飽和腈;苯乙烯、4-甲基苯乙烯、4-乙基苯乙烯、4-甲氧基苯乙烯、4-羥基苯乙烯、4-氯苯乙烯、二乙烯基苯、乙烯基甲苯、乙烯基苯甲酸、乙烯基苯酚、乙烯基磺酸、4-乙烯基苯磺酸、乙烯基苄基甲醚、乙烯基苄基縮水甘油醚等不飽和芳香族化合物;甲基乙烯基酮等不飽和酮;乙烯基胺、烯丙基胺、N-乙烯基吡咯啶酮、乙烯基哌啶等不飽和胺化合物;乙烯基甲醚、乙烯基乙醚、正丁基乙烯基醚、異丁基乙烯基醚、烯丙基縮水甘油醚等乙烯基醚;順丁烯二醯亞胺、N-苯基順丁烯二醯亞胺、N-環己基順丁烯二醯亞胺等不飽和醯亞胺類;茚、1-甲基茚等茚類;1,3-丁二烯、異戊二烯、氯丁二烯等脂肪族共軛二烯類;聚苯乙烯、聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸正丁酯、聚矽氧烷等於聚合物分子鏈之末端具有單(甲基)丙烯醯基之巨單體類;(甲基)丙烯腈、乙烯、丙烯、丁烯、氯乙烯、乙酸乙烯酯等其他乙烯系化合物、及聚甲基丙烯酸甲酯巨單體、聚苯乙烯巨單體等巨單體類、三環癸烷骨架之單甲基丙烯酸酯、N-苯基順丁烯二醯亞胺、甲基丙烯醯氧基甲基-3-乙基氧雜環丁烷等與(甲基)丙烯酸之共聚物及使該等與如昭和電工股份有限公司製造之Karenz MOI、AOI之具有不飽和鍵之異氰酸酯化合物進行反應而獲得之(甲基)丙烯酸之共聚物、或氯乙烯、偏二氯乙烯、丁二酸二乙烯酯、鄰苯二甲酸二烯丙酯、磷酸三烯丙酯、異氰脲酸三烯丙酯、乙烯基硫醚、乙烯基咪唑、乙烯基㗁唑啉、乙烯基咔唑、乙烯基吡咯啶酮、乙烯基吡啶、含羥基之乙烯基單體及聚異氰酸酯化合物之乙烯基胺基甲酸酯化合物、含羥基之乙烯基單體及聚環氧化合物之乙烯基環氧化合物、季戊四醇三丙烯酸酯、二季戊四醇五丙烯酸酯等含羥基之多官能丙烯酸酯與甲苯二異氰酸酯、六亞甲基二異氰酸酯等多官能異氰酸酯之反應物等。Among the above-mentioned radically polymerizable compounds, for example, as the compound having an ethylenically unsaturated double bond group and not having an acid value, (meth) acrylic acid 2-hydroxyethyl ester and (meth) acrylic acid 2-hydroxy group can be cited. Propyl ester, glycidyl (meth) acrylate, the following compounds No. A1 to No. A4, methyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, (formyl) Base) tert-butyl acrylate, cyclohexyl (meth) acrylate, n-octyl (meth) acrylate, isooctyl (meth) acrylate, isononyl (meth) acrylate, hard (meth) acrylate Fatty ester, lauryl (meth) acrylate, methoxyethyl (meth) acrylate, dimethylaminomethyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, (meth) Aminopropyl acrylate, dimethylaminopropyl (meth) acrylate, ethoxyethyl (meth) acrylate, poly (ethoxy) ethyl (meth) acrylate, butoxy (meth) acrylate Ethoxyethyl, ethylhexyl (meth) acrylate, phenoxyethyl (meth) acrylate, tetrahydrofuran (meth) acrylate, vinyl (meth) acrylate, (meth) acrylic acid Allyl ester, benzyl (meth) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, polyethylene glycol Alcohol di (meth) acrylate, propylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, trihydroxy Methylethane tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, pentaerythritol tetra (methyl) ) Acrylate, pentaerythritol tri (meth) acrylate, tricyclodecane dimethylol di (meth) acrylate, tris [(meth) acrylfluorenylethyl] isocyanurate, polyester ( Unsaturated monobasic acids such as meth) acrylate oligomers and esters of polyhydric alcohols or polyphenols; metal salts of unsaturated polybasic acids such as zinc (meth) acrylate and magnesium (meth) acrylate; maleic anhydride, Methylene succinic anhydride, methyl maleic anhydride, methyl tetrahydrophthalic anhydride, tetrahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride, 5- (2,5 -Dioxo Tetrahydro Furanyl) -3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, trialkyltetrahydrophthalic anhydride-maleic anhydride adduct, dodecenyl succinic acid Acid anhydrides, anhydrides of unsaturated polybasic acids such as methylbicycloheptene dicarboxylic acid anhydride; (meth) acrylamide, methylenebis (meth) acrylamide, diethylene triamine tri (meth) propylene Ammonium amine, xylylene bis (meth) acrylamide, α-chloroacrylamide, N-2-hydroxyethyl (meth) acrylamide and other unsaturated monoacids and polyamines; ammonium Unsaturated aldehydes such as aldehydes; (meth) acrylonitrile, α-chloroacrylonitrile, dicyanethylene, allyl cyanide, etc .; unsaturated styrene, 4-methylstyrene, 4-ethylstyrene , 4-methoxystyrene, 4-hydroxystyrene, 4-chlorostyrene, divinylbenzene, vinyltoluene, vinylbenzoic acid, vinylphenol, vinylsulfonic acid, 4-vinylbenzenesulfonic acid Unsaturated aromatic compounds such as acids, vinyl benzyl methyl ether and vinyl benzyl glycidyl ether; unsaturated ketones such as methyl vinyl ketone; vinyl amine, allyl amine, N-vinyl pyrrolidone, Unsaturated amines such as vinylpiperidine Compounds; vinyl ethers such as vinyl methyl ether, vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, allyl glycidyl ether; cis-butylene diimide, N-phenylcis-butyl Unsaturated fluorene imines such as alkene diimide, N-cyclohexyl cis butene difluorene imine; indines such as indene, 1-methylindene; 1,3-butadiene, isoprene, chlorine Aliphatic conjugated diene such as butadiene; polystyrene, polymethyl (meth) acrylate, poly-n-butyl (meth) acrylate, polysiloxane is equivalent to a mono (methyl Base) macromonomers of acrylonitrile; (meth) acrylonitrile, ethylene, propylene, butene, vinyl chloride, vinyl acetate and other vinyl compounds, and polymethylmethacrylate macromonomers, polybenzene Macromonomers such as ethylene macromonomers, monomethacrylates with a tricyclodecane skeleton, N-phenylcis-butenedifluorene imine, methacryloxymethyl-3-ethyloxy heterocycle Copolymers of butane and the like with (meth) acrylic acid and reacting these with isocyanate compounds having unsaturated bonds such as Karenz MOI, AOI manufactured by Showa Denko Corporation Copolymer of (meth) acrylic acid obtained, or vinyl chloride, vinylidene chloride, divinyl succinate, diallyl phthalate, triallyl phosphate, triallyl isocyanurate , Vinyl sulfide, vinyl imidazole, vinyl oxazoline, vinyl carbazole, vinyl pyrrolidone, vinyl pyridine, hydroxyl-containing vinyl monomers, and vinyl carbamates of polyisocyanate compounds Compounds, hydroxyl-containing vinyl monomers and polyepoxy compounds, vinyl epoxy compounds, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and other polyfunctional acrylates containing toluene and toluene diisocyanate, hexamethylene diisocyanate And other polyfunctional isocyanate reactants.

[化21]
[Chemical 21]

[化22]
[Chemical 22]

[化23]
[Chemical 23]

[化24]
[Chemical 24]

上述自由基聚合性化合物可單獨使用或混合2種以上使用。又,自由基聚合性化合物可將具有乙烯性不飽和雙鍵基且具有酸值之化合物及具有乙烯性不飽和雙鍵基且不具有酸值之化合物組合使用。
自由基聚合性化合物於混合2種以上使用之情形時,可將該等預先進行共聚合而以共聚物之形式使用。
作為上述自由基聚合性化合物之含量,可根據組合物之用途等而適當設定,例如於組合物100質量份中,可設為1質量份以上且99質量份以下,較佳為10質量份以上且90質量份以下,其中,較佳為40質量份以上且80質量份以下。其原因在於:藉由上述含量為上述範圍,例如上述組合物可作為感度優異之負型組合物使用。又,其原因在於:可提供一種硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之組合物。
關於上述聚合性化合物之含量,只要可將上述組合物用作硬化性組合物即可,於化合物I-1及聚合性化合物之合計100質量份中,可設為1質量份以上且99質量份以下,較佳為50質量份以上且99質量份以下,其中,較佳為80質量份以上且99質量份以下,較佳為90質量份以上且98質量份以下。其原因在於:藉由上述含量為上述範圍,上述組合物可提供一種硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之組合物。
又,作為上述化合物I-1及自由基聚合性化合物之含量,可根據組合物之用途等而適當設定,例如於組合物100質量份中,可設為1質量份以上且99質量份以下,較佳為10質量份以上且90質量份以下,其中,較佳為40質量份以上且80質量份以下。其原因在於:藉由上述含量為上述範圍,例如上述組合物可作為感度優異之負型組合物使用。又,其原因在於:可提供一種硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之組合物。
The said radically polymerizable compound can be used individually or in mixture of 2 or more types. The radical polymerizable compound may be used in combination of a compound having an ethylenically unsaturated double bond group and an acid value and a compound having an ethylenically unsaturated double bond group and an acid value.
When two or more radical polymerizable compounds are used, they can be copolymerized in advance and used as a copolymer.
The content of the radically polymerizable compound can be appropriately set according to the use of the composition and the like. For example, it can be 1 part by mass or more and 99 parts by mass or less, and preferably 10 parts by mass or more in 100 parts by mass of the composition. And 90 mass parts or less, Among these, 40 mass parts or more and 80 mass parts or less are preferable. The reason is that when the content is within the above range, for example, the above composition can be used as a negative composition having excellent sensitivity. The reason therefor is to provide a composition which has less resistance to hardening and can easily provide a UV-absorbing function to a hardened material.
The content of the polymerizable compound may be any composition as long as the composition can be used as a curable composition. The total amount of the compound I-1 and the polymerizable compound may be 1 part by mass or more and 99 parts by mass. Hereinafter, it is preferably 50 parts by mass or more and 99 parts by mass or less, and among them, 80 parts by mass or more and 99 parts by mass or less is preferable, and 90 parts by mass or more and 98 parts by mass or less is preferable. The reason for this is that, when the content is within the above range, the composition can provide a composition that has less resistance to hardening and can easily provide a UV-absorbing function to the hardened material.
The content of the compound I-1 and the radically polymerizable compound can be appropriately set according to the use of the composition and the like. For example, it can be 1 part by mass or more and 99 parts by mass or less in 100 parts by mass of the composition. It is preferably 10 parts by mass or more and 90 parts by mass or less, and among these, 40 parts by mass or more and 80 parts by mass or less is preferable. The reason is that when the content is within the above range, for example, the above composition can be used as a negative composition having excellent sensitivity. The reason therefor is to provide a composition which has less resistance to hardening and can easily provide a UV-absorbing function to a hardened material.

(ii)陽離子聚合性化合物及陰離子聚合性化合物
上述陽離子聚合性化合物只要具有1種以上能夠進行陽離子聚合之聚合性基即可。
上述陽離子聚合性化合物通常與陽離子聚合起始劑一併使用。
作為能夠進行陽離子聚合之聚合性基,例如可列舉環氧基及氧雜環丁烷基等環狀醚基以及乙烯基醚基等。
即,作為陽離子聚合性化合物,可列舉環氧化合物及氧雜環丁烷化合物等環狀醚化合物以及乙烯基醚化合物等。
(ii) Cationic polymerizable compound and anionic polymerizable compound The cationic polymerizable compound may have at least one polymerizable group capable of cationic polymerization.
The above-mentioned cationically polymerizable compound is usually used together with a cation polymerization initiator.
Examples of the polymerizable group capable of cation polymerization include a cyclic ether group such as an epoxy group and an oxetanyl group, and a vinyl ether group.
That is, examples of the cationically polymerizable compound include cyclic ether compounds such as epoxy compounds and oxetane compounds, and vinyl ether compounds.

作為上述環氧化合物,例如可列舉:甲基縮水甘油醚、2-乙基己基縮水甘油醚、丁基縮水甘油醚、癸基縮水甘油醚、C12~13混合烷基縮水甘油醚、苯基-2-甲基縮水甘油醚、十六烷基縮水甘油醚、硬脂基縮水甘油醚、對第二丁基苯基縮水甘油醚、對第三丁基苯基縮水甘油醚、甲基丙烯酸縮水甘油酯、異丙基縮水甘油醚、烯丙基縮水甘油醚、乙基縮水甘油醚、2-甲基辛基縮水甘油醚、苯基縮水甘油醚、4-正丁基苯基縮水甘油醚、4-苯基苯酚縮水甘油醚、甲苯基縮水甘油醚、二溴甲苯基縮水甘油醚、癸基縮水甘油醚、甲氧基聚乙二醇單縮水甘油醚、乙氧基聚乙二醇單縮水甘油醚、丁氧基聚乙二醇單縮水甘油醚、苯氧基聚乙二醇單縮水甘油醚、二溴苯基縮水甘油醚、1,4-丁二醇二縮水甘油醚、1,5-戊二醇二縮水甘油醚、1,6-己二醇二縮水甘油醚、新戊二醇二縮水甘油醚、1,1,2,2-四(縮水甘油氧基苯基)乙烷及季戊四醇四縮水甘油醚等縮水甘油醚化物;乙酸縮水甘油酯、硬脂酸縮水甘油酯等縮水甘油酯類;2-(3,4-環氧環己基-5,5-螺-3,4-環氧)環己烷-間二㗁烷、亞甲基雙(3,4-環氧環己烷)、丙烷-2,2-二基-雙(3,4-環氧環己烷)、2,2-雙(3,4-環氧環己基)丙烷、雙(3,4-環氧環己烷羧酸)乙二酯、己二酸雙(3,4-環氧環己基甲基)酯、3,4-環氧環己烷羧酸3,4-環氧環己基甲酯、3,4-環氧-1-甲基己烷羧酸3,4-環氧-1-甲基環己酯、6-甲基-3,4-環氧環己烷羧酸6-甲基-3,4-環氧環己基甲酯、3,4-環氧-3-甲基環己烷羧酸3,4-環氧-3-甲基環己基甲酯、3,4-環氧-5-甲基環己烷羧酸3,4-環氧-5-甲基環己基甲酯、1-環氧乙基-3,4-環氧環己烷、1,2-環氧-2-環氧乙基環己烷、二環戊二烯二環氧化物、羧酸3,4-環氧-6-甲基環己酯、α-氧化蒎烯、苯環氧乙烷、環氧環己烷及環氧環戊烷等環氧環烷基型化合物及N-縮水甘油基鄰苯二甲醯亞胺等。Examples of the epoxy compound include methyl glycidyl ether, 2-ethylhexyl glycidyl ether, butyl glycidyl ether, decyl glycidyl ether, C12 to 13 mixed alkyl glycidyl ether, and phenyl- 2-methyl glycidyl ether, cetyl glycidyl ether, stearyl glycidyl ether, p-second butylphenyl glycidyl ether, p-third butylphenyl glycidyl ether, glycidyl methacrylate Ester, isopropyl glycidyl ether, allyl glycidyl ether, ethyl glycidyl ether, 2-methyloctyl glycidyl ether, phenyl glycidyl ether, 4-n-butylphenyl glycidyl ether, 4 -Phenylphenol glycidyl ether, tolyl glycidyl ether, dibromotolyl glycidyl ether, decyl glycidyl ether, methoxy polyethylene glycol monoglycidyl ether, ethoxy polyethylene glycol monoglycidyl ether Ether, butoxy polyethylene glycol monoglycidyl ether, phenoxy polyethylene glycol monoglycidyl ether, dibromophenyl glycidyl ether, 1,4-butanediol diglycidyl ether, 1,5- Pentylene glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, neopentyl glycol diglycidyl ether Glycidyl etherates such as oleyl ether, 1,1,2,2-tetra (glycidyloxyphenyl) ethane and pentaerythritol tetraglycidyl ether; glycidyl esters such as glycidyl acetate and glycidyl stearate ; 2- (3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy) cyclohexane-m-dioxane, methylenebis (3,4-epoxycyclohexane) , Propane-2,2-diyl-bis (3,4-epoxycyclohexane), 2,2-bis (3,4-epoxycyclohexyl) propane, bis (3,4-epoxycyclohexane) Alkanecarboxylic acid) ethylene glycol, bis (3,4-epoxycyclohexylmethyl) adipate, 3,4-epoxycyclohexanecarboxylic acid 3,4-epoxycyclohexylmethyl ester, 3, 4-epoxy-1-methylhexanecarboxylic acid 3,4-epoxy-1-methylcyclohexyl ester, 6-methyl-3,4-epoxycyclohexanecarboxylic acid 6-methyl-3 4,4-epoxycyclohexylmethyl ester, 3,4-epoxy-3-methylcyclohexanecarboxylic acid 3,4-epoxy-3-methylcyclohexylmethyl ester, 3,4-epoxy-5 -Methylcyclohexanecarboxylic acid 3,4-epoxy-5-methylcyclohexyl methyl ester, 1-epoxyethyl-3,4-epoxycyclohexane, 1,2-epoxy-2- Ethylene oxide cyclohexane, dicyclopentadiene diepoxide, carboxylic acid 3,4-epoxy-6-methylcyclohexyl ester, α-pinene oxide, phenylene oxide, epoxy ring Hexane and epoxy cyclopentane Epoxy cycloalkyl compounds and N-glycidylphthalimide.

又,作為上述環氧化合物,亦可使用環氧化聚烯烴。所謂環氧化聚烯烴係藉由含環氧基單體將聚烯烴改性而導入有環氧基之聚烯烴。可藉由利用共聚合法及接枝法之任一者使乙烯或碳數3~20之α-烯烴、含環氧基單體、及視需要之其他單體共聚合而製造。乙烯或碳數3~20之α-烯烴、含環氧基單體及其他單體可分別單獨聚合,亦可與其他單體以複數種聚合。又,亦可藉由過乙酸法將末端具有羥基之非共軛之聚丁二烯之雙鍵環氧化而獲得,亦可使用分子內具有羥基者。又,亦可藉由異氰酸酯將羥基胺基甲酸酯化,使其與含一級羥基之環氧化合物進行反應而導入環氧基。Moreover, as said epoxy compound, an epoxidized polyolefin can also be used. The so-called epoxidized polyolefin is a polyolefin having an epoxy group modified by an epoxy group-containing monomer. It can be produced by copolymerizing ethylene or an α-olefin having 3 to 20 carbon atoms, an epoxy-group-containing monomer, and other monomers as necessary by using either a copolymerization method or a grafting method. Ethylene or an α-olefin having 3 to 20 carbon atoms, an epoxy-containing monomer, and other monomers may be polymerized individually or in combination with other monomers in a plurality of types. In addition, it can also be obtained by epoxidizing the double bond of a non-conjugated polybutadiene having a hydroxyl group at its terminal by a peracetic acid method, or one having a hydroxyl group in the molecule may be used. Moreover, an epoxy group may be introduce | transduced by hydroxylating a urethane with an isocyanate, and making it react with an epoxy compound containing a primary hydroxyl group.

作為上述乙烯或碳數3~20之α-烯烴,可列舉:乙烯、丙烯、丁烯、異丁烯、1,3-丁二烯、1,4-丁二烯、1,3-戊二烯、2,3-二甲基-1,3-丁二烯、戊二烯、3-丁基-1,3-辛二烯及異戊二烯等。Examples of the ethylene or the α-olefin having 3 to 20 carbon atoms include ethylene, propylene, butene, isobutylene, 1,3-butadiene, 1,4-butadiene, 1,3-pentadiene, 2,3-dimethyl-1,3-butadiene, pentadiene, 3-butyl-1,3-octadiene, isoprene, etc.

作為上述含環氧基單體,例如可列舉α,β-不飽和酸之縮水甘油酯、乙烯基苄基縮水甘油醚及烯丙基縮水甘油醚等。作為α,β-不飽和酸之縮水甘油酯,具體而言,可列舉:丙烯酸縮水甘油酯、甲基丙烯酸縮水甘油酯及乙基丙烯酸縮水甘油酯等,尤佳為甲基丙烯酸縮水甘油酯。Examples of the epoxy-group-containing monomer include glycidyl esters of α, β-unsaturated acids, vinyl benzyl glycidyl ether, and allyl glycidyl ether. Specific examples of the glycidyl ester of an α, β-unsaturated acid include glycidyl acrylate, glycidyl methacrylate, and glycidyl ethacrylate. Particularly preferred is glycidyl methacrylate.

作為上述其他單體,可列舉:氯乙烯、偏二氯乙烯、偏二氟乙烯及四氟乙烯等不飽和脂肪族烴;(甲基)丙烯酸、α-氯丙烯酸、亞甲基丁二酸、順丁烯二酸、甲基順丁烯二酸、反丁烯二酸、雙環庚烯二甲酸、丁烯酸、異丁烯酸、乙烯基乙酸、烯丙基乙酸、肉桂酸、己二烯酸、甲基反丁烯二酸、丁二酸單[2-(甲基)丙烯醯氧基乙基]酯、鄰苯二甲酸單[2-(甲基)丙烯醯氧基乙基]酯、ω-羧基聚己內酯單(甲基)丙烯酸酯等於兩末端具有羧基與羥基之聚合物之單(甲基)丙烯酸酯、羥基乙基(甲基)丙烯酸酯/順丁烯二酸酯、羥基丙基(甲基)丙烯酸酯/順丁烯二酸酯、二環戊二烯/順丁烯二酸酯及具有1個羧基與2個以上之(甲基)丙烯醯基之多官能(甲基)丙烯酸酯等不飽和多元酸;(甲基)丙烯酸-2-羥基乙酯、(甲基)丙烯酸-2-羥基丙酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸二甲胺基甲酯、(甲基)丙烯酸二甲胺基乙酯、(甲基)丙烯酸胺基丙酯、(甲基)丙烯酸二甲胺基丙酯、(甲基)丙烯酸乙氧基乙酯、(甲基)丙烯酸聚(乙氧基)乙酯、(甲基)丙烯酸丁氧基乙氧基乙酯、(甲基)丙烯酸乙基己酯、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸四氫呋喃酯、(甲基)丙烯酸乙烯酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸苄酯、乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、三羥甲基乙烷三(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、三環癸烷二羥甲基二(甲基)丙烯酸酯、異氰脲酸三[(甲基)丙烯醯基乙基]酯及聚酯(甲基)丙烯酸酯低聚物等不飽和一元酸及多元醇或多酚之酯;(甲基)丙烯酸鋅、(甲基)丙烯酸鎂等不飽和多元酸之金屬鹽;順丁烯二酸酐、亞甲基丁二酸酐、甲基順丁烯二酸酐、甲基四氫鄰苯二甲酸酐、四氫鄰苯二甲酸酐、三烷基四氫鄰苯二甲酸酐、5-(2,5-二側氧四氫呋喃基)-3-甲基-3-環己烯-1,2-二羧酸酐、三烷基四氫鄰苯二甲酸酐-順丁烯二酸酐加成物、十二碳烯基丁二酸酐及甲基雙環庚烯二甲酸酐等不飽和多元酸之酸酐;(甲基)丙烯醯胺、亞甲基雙(甲基)丙烯醯胺、二伸乙基三胺三(甲基)丙烯醯胺、苯二甲基雙(甲基)丙烯醯胺、α-氯丙烯醯胺、N-2-羥基乙基(甲基)丙烯醯胺等不飽和一元酸及多胺之醯胺;丙烯醛等不飽和醛;(甲基)丙烯腈、α-氯丙烯腈、二氰亞乙烯、氰化烯丙基等不飽和腈;苯乙烯、4-甲基苯乙烯、4-乙基苯乙烯、4-甲氧基苯乙烯、4-羥基苯乙烯、4-氯苯乙烯、二乙烯基苯、乙烯基甲苯、乙烯基苯甲酸、乙烯基苯酚、乙烯基磺酸、4-乙烯基苯磺酸、乙烯基苄基甲醚及乙烯基萘等不飽和芳香族化合物;甲基乙烯基酮等不飽和酮;乙烯基胺、烯丙基胺、N-乙烯基吡咯啶酮及乙烯基哌啶等不飽和胺化合物;烯丙醇及巴豆醇等乙烯醇;乙烯基甲醚、乙烯基乙醚、正丁基乙烯基醚及異丁基乙烯基醚等乙烯基醚;順丁烯二醯亞胺、N-苯基順丁烯二醯亞胺及N-環己基順丁烯二醯亞胺等不飽和醯亞胺類;茚及1-甲基茚等茚類;聚苯乙烯、聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸正丁酯及聚矽氧烷等於聚合物分子鏈之末端具有單(甲基)丙烯醯基之巨單體類;氯乙烯、偏二氯乙烯、丁二酸二乙烯酯、鄰苯二甲酸二烯丙酯、磷酸三烯丙酯、異氰脲酸三烯丙酯、乙烯基硫醚、乙烯基咪唑、乙烯基㗁唑啉、乙烯基咔唑、乙烯基吡咯啶酮、乙烯基吡啶、含羥基之乙烯基單體及聚異氰酸酯化合物之乙烯基胺基甲酸酯化合物、含羥基之乙烯基單體及聚環氧化合物之乙烯基環氧化合物、季戊四醇三丙烯酸酯及二季戊四醇五丙烯酸酯等含羥基之多官能丙烯酸酯;甲苯二異氰酸酯及六亞甲基二異氰酸酯等多官能異氰酸酯之反應物;作為季戊四醇三丙烯酸酯及二季戊四醇五丙烯酸酯等含羥基之多官能丙烯酸酯與丁二酸酐、鄰苯二甲酸酐及四氫鄰苯二甲酸酐等二元酸酐之反應物的具有酸值之多官能丙烯酸酯。Examples of the other monomers include unsaturated aliphatic hydrocarbons such as vinyl chloride, vinylidene chloride, vinylidene fluoride, and tetrafluoroethylene; (meth) acrylic acid, α-chloroacrylic acid, methylene succinic acid, Maleic acid, methyl maleic acid, fumaric acid, dicycloheptenedioic acid, butenoic acid, methacrylic acid, vinylacetic acid, allylacetic acid, cinnamic acid, adipic acid, methyl trans Butenedioic acid, succinate mono [2- (meth) acryloxyethyl] ester, phthalate mono [2- (meth) acryloxyethyl] ester, ω-carboxy poly Caprolactone mono (meth) acrylate is equal to mono (meth) acrylate, hydroxyethyl (meth) acrylate / maleate, hydroxypropyl ( (Meth) acrylic acid esters / maleic acid esters, dicyclopentadiene / maleic acid esters, and polyfunctional (meth) acrylic acid having one carboxyl group and two or more (meth) acrylfluorenyl groups Unsaturated polybasic acids such as esters; 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, methyl (meth) acrylate, butyl (meth) acrylate, (meth) C) Isobutyl acid, third butyl (meth) acrylate, cyclohexyl (meth) acrylate, n-octyl (meth) acrylate, isooctyl (meth) acrylate, isononyl (meth) acrylate , Stearyl (meth) acrylate, lauryl (meth) acrylate, methoxyethyl (meth) acrylate, dimethylaminomethyl (meth) acrylate, dimethylamino (meth) acrylate Ethyl ester, aminopropyl (meth) acrylate, dimethylaminopropyl (meth) acrylate, ethoxyethyl (meth) acrylate, poly (ethoxy) ethyl (meth) acrylate, Butoxyethoxyethyl (meth) acrylate, ethylhexyl (meth) acrylate, phenoxyethyl (meth) acrylate, tetrahydrofuran (meth) acrylate, vinyl (meth) acrylate , Allyl (meth) acrylate, benzyl (meth) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) Acrylate, polyethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (methyl) ) Acrylate, Trimethylolethane Tris (methyl) Enoate, trimethylolpropane tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (methyl) Acrylate), tricyclodecane dimethylol di (meth) acrylate, tris [(meth) acrylmethylethyl] isocyanurate, and polyester (meth) acrylate oligomers And other unsaturated monobasic acids and esters of polyhydric alcohols or polyphenols; metal salts of unsaturated polybasic acids such as zinc (meth) acrylate and magnesium (meth) acrylate; maleic anhydride, methylene succinic anhydride, formic acid Methyl maleic anhydride, methyl tetrahydrophthalic anhydride, tetrahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride, 5- (2,5-dioxotetrahydrofuranyl)- 3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, trialkyltetrahydrophthalic anhydride-maleic anhydride adduct, dodecenyl succinic anhydride, and methyl Anhydrides of unsaturated polybasic acids such as dicycloheptene dicarboxylic acid anhydride; (meth) acrylamide, methylene bis (meth) acrylamide, diethylene triamine tri (meth) acrylamide, benzene Dimethylbis (a ) Unsaturated monoacids such as acrylamide, α-chloroacrylamide, N-2-hydroxyethyl (meth) acrylamide and polyamines; unsaturated aldehydes such as acrolein; (meth) propylene Unsaturated nitriles such as nitrile, α-chloroacrylonitrile, dicyanethylenevinyl, allyl cyanide; styrene, 4-methylstyrene, 4-ethylstyrene, 4-methoxystyrene, 4- Hydroxystyrene, 4-chlorostyrene, divinylbenzene, vinyltoluene, vinylbenzoic acid, vinylphenol, vinylsulfonic acid, 4-vinylbenzenesulfonic acid, vinylbenzyl methyl ether and vinyl Unsaturated aromatic compounds such as naphthalene; Unsaturated ketones such as methyl vinyl ketone; Unsaturated amine compounds such as vinyl amine, allyl amine, N-vinyl pyrrolidone and vinyl piperidine; allyl alcohol and croton Vinyl alcohols such as alcohols; vinyl ethers such as vinyl methyl ether, vinyl ether, n-butyl vinyl ether, and isobutyl vinyl ether; maleimide, N-phenylmaleimide Unsaturated fluorene imines such as amines and N-cyclohexyl cis-butene difluorene imine; indines such as indene and 1-methylindene; polystyrene, poly (meth) acrylate, poly (meth) N-butyl enoate and polysiloxane are equivalent to macromonomers with mono (meth) acrylfluorenyl groups at the ends of polymer molecular chains; vinyl chloride, vinylidene chloride, divinyl succinate, phthalate Diallyl formate, triallyl phosphate, triallyl isocyanurate, vinyl sulfide, vinyl imidazole, vinyl oxazoline, vinyl carbazole, vinyl pyrrolidone, vinyl pyridine , Vinyl urethane compounds containing hydroxyl-containing vinyl monomers and polyisocyanate compounds, vinyl epoxy compounds containing hydroxyl-containing vinyl monomers and polyepoxides, pentaerythritol triacrylate and dipentaerythritol pentaacrylate Polyfunctional acrylates containing hydroxyl groups such as esters; reactants of polyfunctional isocyanates such as toluene diisocyanate and hexamethylene diisocyanate; as polyfunctional acrylates containing hydroxyl groups such as pentaerythritol triacrylate and dipentaerythritol pentaacrylate and succinic acid Multifunctional acrylates with acid value, reactants of dibasic acid anhydrides such as acid anhydride, phthalic anhydride and tetrahydrophthalic anhydride.

作為上述環氧化聚烯烴,亦可使用市售品,例如可列舉:Epolead PB3600、Epolead PB4700(Daicel公司製造);BF-1000、FC-3000(ADEKA公司製造);Bondfast 2C、Bondfast E、Bondfast CG5001、Bondfast CG5004、Bondfast 2B、Bondfast 7B、Bondfast 7L、Bondfast 7M、Bondfast VC40(住友化學公司製造);JP-100、JP-200(日本曹達公司製造);Poly bd R-45HT、Poly bd R-15HT(出光興產公司製造)及Ricon657(Arkema 公司製造)等。Commercial products can also be used as the epoxidized polyolefin, for example, Epolead PB3600, Epolead PB4700 (manufactured by Daicel); BF-1000, FC-3000 (manufactured by ADEKA); Bondfast 2C, Bondfast E, Bondfast CG5001 , Bondfast CG5004, Bondfast 2B, Bondfast 7B, Bondfast 7L, Bondfast 7M, Bondfast VC40 (manufactured by Sumitomo Chemical Co., Ltd.); JP-100, JP-200 (manufactured by Soda Corporation of Japan); Poly bd R-45HT, Poly bd R-15HT (Manufactured by Idemitsu Kosan Co., Ltd.) and Ricon657 (manufactured by Arkema Co., Ltd.).

就耐熱性良好之方面而言,作為上述環氧化合物,更佳為使用具有上述通式(II)所表示之Cardo骨架之化合物。In terms of good heat resistance, it is more preferable to use a compound having a Cardo skeleton represented by the general formula (II) as the epoxy compound.

作為上述氧雜環丁烷化合物,例如可列舉:3,7-雙(3-氧雜環丁基)-5-氧雜-壬烷、1,4-雙[(3-乙基-3-氧雜環丁基甲氧基)甲基]苯、1,2-雙[(3-乙基-3-氧雜環丁基甲氧基)甲基]乙烷、1,3-雙[(3-乙基-3-氧雜環丁基甲氧基)甲基]丙烷、乙二醇雙(3-乙基-3-氧雜環丁基甲基)醚、三乙二醇雙(3-乙基-3-氧雜環丁基甲基)醚、四乙二醇雙(3-乙基-3-氧雜環丁基甲基)醚、1,4-雙(3-乙基-3-氧雜環丁基甲氧基)丁烷、1,6-雙(3-乙基-3-氧雜環丁基甲氧基)己烷、3-乙基-3-[(苯氧基)甲基]氧雜環丁烷、3-乙基-3-(己氧基甲基)氧雜環丁烷、3-乙基-3-(2-乙基己氧基甲基)氧雜環丁烷、3-乙基-3-(羥基甲基)氧雜環丁烷及3-乙基-3-(氯甲基)氧雜環丁烷等。Examples of the oxetane compound include 3,7-bis (3-oxetanyl) -5-oxe-nonane, and 1,4-bis [(3-ethyl-3- Oxetanylmethoxy) methyl] benzene, 1,2-bis [(3-ethyl-3-oxetanylmethoxy) methyl] ethane, 1,3-bis [(3-ethyl -3-oxetanylmethoxy) methyl] propane, ethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, triethylene glycol bis (3-ethyl-3-oxa Cyclobutylmethyl) ether, tetraethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, 1,4-bis (3-ethyl-3-oxetanylmethoxy) butane, 1,6-bis (3-ethyl-3-oxetanylmethoxy) hexane, 3-ethyl-3-[(phenoxy) methyl] oxetane, 3-ethyl- 3- (hexyloxymethyl) oxetane, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3- (hydroxymethyl ) Oxetane and 3-ethyl-3- (chloromethyl) oxetane and the like.

作為上述乙烯基醚化合物,例如可列舉:二乙二醇單乙烯基醚、三乙二醇二乙烯基醚、正十二烷基乙烯基醚、環己基乙烯基醚、2-乙基己基乙烯基醚、2-氯乙基乙烯基醚、乙基乙烯基醚、異丁基乙烯基醚、三乙二醇乙烯基醚、2-羥基乙基乙烯基醚、4-羥基丁基乙烯基醚、1,6-環己烷二甲醇單乙烯基醚、乙二醇二乙烯基醚、1,4-丁二醇二乙烯基醚及1,6-環己烷二甲醇二乙烯基醚等。Examples of the vinyl ether compound include diethylene glycol monovinyl ether, triethylene glycol divinyl ether, n-dodecyl vinyl ether, cyclohexyl vinyl ether, and 2-ethylhexyl ethylene. Ether, 2-chloroethyl vinyl ether, ethyl vinyl ether, isobutyl vinyl ether, triethylene glycol vinyl ether, 2-hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl ether 1,6-cyclohexanedimethanol monovinyl ether, ethylene glycol divinyl ether, 1,4-butanediol divinyl ether, 1,6-cyclohexanedimethanol divinyl ether, and the like.

作為上述陰離子聚合性化合物,只要具有1種以上能夠進行陰離子聚合之聚合性基即可。
上述陰離子聚合性化合物通常與陰離子聚合起始劑一併使用。
作為上述能夠進行陰離子聚合之聚合性基,例如可列舉:環氧基、內酯基、(甲基)丙烯酸基等。
即,作為上述陰離子聚合性化合物,可列舉:環氧化合物、內酯化合物、具有(甲基)丙烯酸基之化合物等。
作為上述內酯化合物,可列舉:β-丙內酯、ε-己內酯等。
再者,關於環氧化合物,可使用上述作為陽離子聚合性化合物所例示之環氧化合物。又,作為具有(甲基)丙烯酸基之化合物,可使用上述作為自由基聚合性化合物所例示者。
As said anionic polymerizable compound, what is necessary is just to have 1 or more types of polymerizable group which can be anionic polymerized.
The anionic polymerizable compound is usually used together with an anionic polymerization initiator.
Examples of the polymerizable group capable of anionic polymerization include an epoxy group, a lactone group, and a (meth) acrylic group.
That is, examples of the anionic polymerizable compound include an epoxy compound, a lactone compound, and a compound having a (meth) acrylic group.
Examples of the lactone compound include β-propiolactone and ε-caprolactone.
As the epoxy compound, the epoxy compounds exemplified as the cationically polymerizable compound described above can be used. In addition, as the compound having a (meth) acrylic group, those exemplified as the radical polymerizable compound described above can be used.

上述陽離子聚合性化合物及陰離子聚合性化合物可分別單獨使用或混合2種以上使用。The cationically polymerizable compound and the anionic polymerizable compound may be used alone or in combination of two or more kinds.

(b)不具有聚合性基之聚合物
作為可用於本發明之組合物之樹脂,如上所述,可使用不具有聚合性基之聚合物。
上述不具有聚合性基之聚合物之重量平均分子量(Mw)可根據組合物之用途等而適當設定,例如可設為1500以上,可設為1500以上且300000以下。
作為此種聚合物,為含有重複結構者即可,可列舉具有感光性之感光性樹脂、不具有感光性之非感光性樹脂等。
本發明之組合物例如藉由含有感光性樹脂作為樹脂成分,而可作為感光性組合物使用。
(b) Polymer without polymerizable group As the resin usable in the composition of the present invention, as described above, a polymer without polymerizable group can be used.
The weight-average molecular weight (Mw) of the polymer having no polymerizable group can be appropriately set according to the use of the composition and the like, and can be, for example, 1,500 or more, and 1,500 or more and 300,000 or less.
Examples of such a polymer include those having a repeating structure, and examples thereof include a photosensitive resin having a photosensitive property and a non-photosensitive resin having no photosensitive property.
The composition of the present invention can be used as a photosensitive composition by containing a photosensitive resin as a resin component, for example.

(i)感光性樹脂
上述感光性樹脂具有感光性,例如可列舉一種正型樹脂,該正型樹脂與酸產生劑一併使用,藉由酸之作用向酯基或縮醛基等之化學鍵之切斷等針對顯影液之溶解性增加之方向變化。
上述組合物藉由含有正型樹脂作為樹脂成分,光照射部位於鹼性顯影液中之溶解性增加。
因此,上述組合物例如可作為於鹼性顯影液等溶劑中之溶解性於光照射前後發生變化之感光性組合物、更具體而言作為正型組合物使用。
(i) Photosensitive resin The above-mentioned photosensitive resin has photosensitivity. For example, a positive resin may be used. The positive resin is used together with an acid generator, and is bonded to an ester group or an acetal group by the action of an acid. The direction in which the solubility of the developing solution increases, such as cutting, changes.
The composition contains a positive resin as a resin component, and the solubility of the light-irradiated portion in the alkaline developing solution is increased.
Therefore, the above composition can be used, for example, as a photosensitive composition whose solubility in a solvent such as an alkaline developer changes before and after light irradiation, and more specifically, as a positive composition.

作為上述正型樹脂,可使用以具有鹼性溶解控制功能之酸不穩定基部分取代高分子聚合物而成者。
作為上述高分子聚合物,可列舉:聚羥基苯乙烯及其衍生物;聚丙烯酸及其衍生物;聚甲基丙烯酸及其衍生物;自羥基苯乙烯、丙烯酸、甲基丙烯酸及該等之衍生物選擇而形成之2種以上之共聚物;自羥基苯乙烯、苯乙烯及該等之衍生物選擇而形成之2種以上之共聚物;選自環烯烴及其衍生物、順丁烯二酸酐、以及丙烯酸及其衍生物中之3種以上之共聚物;選自環烯烴及其衍生物、順丁烯二醯亞胺、以及丙烯酸及其衍生物中之3種以上之共聚物;聚降烯;選自由複分解開環聚合物所組成之一群中之1種以上之高分子聚合物等。
作為導入至上述高分子聚合物中之酸不穩定基,可列舉:三級烷基、三烷基矽烷基、側氧基烷基、芳基取代烷基、四氫吡喃-2-基等雜脂環基、三級烷基羰基、三級烷基羰基烷基、烷氧基羰基等。
As the positive resin, a polymer obtained by partially replacing an acid polymer with an acid-labile group having an alkaline dissolution control function can be used.
Examples of the above-mentioned polymer include polyhydroxystyrene and its derivatives; polyacrylic acid and its derivatives; polymethacrylic acid and its derivatives; derivatives derived from hydroxystyrene, acrylic acid, methacrylic acid, and the like Two or more copolymers formed by selecting materials; two or more copolymers formed by selecting from hydroxystyrene, styrene, and derivatives thereof; selected from cycloolefins and their derivatives, and maleic anhydride And three or more copolymers of acrylic acid and its derivatives; three or more copolymers selected from cycloolefins and their derivatives, maleimide, and acrylic acid and its derivatives; Olefin; one or more types of high molecular polymers selected from the group consisting of metathesis ring-opening polymers.
Examples of the acid-labile group introduced into the above-mentioned polymer include tertiary alkyl, trialkylsilyl, pendant oxyalkyl, aryl-substituted alkyl, and tetrahydropyran-2-yl. Heteroalicyclic, tertiary alkylcarbonyl, tertiary alkylcarbonylalkyl, alkoxycarbonyl and the like.

上述正型樹脂之詳細之具體例例如可設為與日本專利特開2003-192665號公報、日本專利特開2004-323704號公報之請求項3、日本專利特開平10-10733號公報等所記載之內容相同。Specific examples of the above-mentioned positive resin can be described in, for example, Japanese Patent Application Laid-Open No. 2003-192665, Japanese Patent Application Laid-Open No. 2004-323704, Claim 3, Japanese Patent Laid-Open No. 10-10733, and the like. The content is the same.

作為與上述正型樹脂一併使用之酸產生劑,可使用公知之酸產生劑。作為上述酸產生劑,具體而言,可列舉下文所述之光陽離子聚合起始劑、熱陽離子聚合起始劑等。As the acid generator used together with the positive resin, a known acid generator can be used. Specific examples of the acid generator include a photocationic polymerization initiator and a thermal cationic polymerization initiator described below.

(ii)非感光性樹脂
上述非感光性樹脂只要不具有感光性即可,例如可列舉:聚苯乙烯、聚甲基丙烯酸甲酯、甲基丙烯酸甲酯-丙烯酸乙酯共聚物、聚(甲基)丙烯酸、苯乙烯-(甲基)丙烯酸共聚物、(甲基)丙烯酸-甲基丙烯酸甲酯共聚物、乙烯-氯乙烯共聚物、乙烯-乙烯系共聚物、聚氯乙烯樹脂、ABS(acrylonitrile-butadiene-styrene,丙烯腈-丁二烯-苯乙烯)樹脂、尼龍6、尼龍66、尼龍12、胺基甲酸酯樹脂、聚碳酸酯聚乙烯縮丁醛、纖維素酯、聚丙烯醯胺、飽和聚酯、酚系樹脂、苯氧基樹脂、聚醯胺醯亞胺樹脂、聚醯胺酸樹脂、環氧樹脂等。
上述非感光性樹脂例如亦可使用上述聚合性化合物之聚合物。
(ii) Non-photosensitive resin The non-photosensitive resin may be any material as long as it does not have photosensitivity, and examples thereof include polystyrene, polymethyl methacrylate, methyl methacrylate-ethyl acrylate copolymer, and poly (methyl methacrylate). Base) acrylic acid, styrene- (meth) acrylic acid copolymer, (meth) acrylic acid-methyl methacrylate copolymer, ethylene-vinyl chloride copolymer, ethylene-vinyl copolymer, polyvinyl chloride resin, ABS ( acrylonitrile-butadiene-styrene) resin, nylon 6, nylon 66, nylon 12, urethane resin, polycarbonate polyvinyl butyral, cellulose ester, polypropylene Amines, saturated polyesters, phenol-based resins, phenoxy resins, polyamidoamine imine resins, polyamino acid resins, epoxy resins, and the like.
The non-photosensitive resin may be, for example, a polymer of the polymerizable compound.

(c)樹脂成分
本發明之組合物中之上述樹脂成分之含量可根據組合物之用途等而適當決定,例如於組合物之固形物成分100質量份中,較佳為設為1質量份以上且99質量份以下,更佳為20質量份以上且95質量份以下,尤佳為30質量份以上且90質量份以下。其原因在於:藉由上述含量為上述範圍,上述組合物例如可穩定地保持上述化合物I-1。
作為上述樹脂成分之含量,可根據組合物之用途等而適當設定,例如於組合物100質量份中,可設為1質量份以上且99質量份以下,較佳為10質量份以上且90質量份以下,其中,較佳為40質量份以上且80質量份以下。其原因在於:藉由上述含量為上述範圍,例如上述組合物可作為感度優異之負型組合物使用。又,其原因在於:可提供一種硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之組合物。
上述樹脂成分之含量根據組合物之用途等而有所不同,於化合物I-1及樹脂成分之合計100質量份中,可設為1質量份以上且99質量份以下,較佳為50質量份以上且99質量份以下,其中,較佳為80質量份以上且99質量份以下,較佳為90質量份以上且98質量份以下。其原因在於:藉由上述含量為上述範圍,上述組合物可提供可對硬化物容易地賦予紫外線吸收功能等之組合物。
又,作為上述化合物I-1及樹脂成分之含量,可根據組合物之用途等而適當設定,例如於組合物100質量份中,可設為1質量份以上且99質量份以下,較佳為10質量份以上且90質量份以下,其中,較佳為40質量份以上且80質量份以下。其原因在於:藉由上述含量為上述範圍,例如上述組合物可作為感度優異之負型組合物使用。又,其原因在於:可提供一種硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之組合物。
(c) Resin component The content of the resin component in the composition of the present invention can be appropriately determined according to the use of the composition and the like. For example, it is preferably set to 1 part by mass or more in 100 parts by mass of the solid component of the composition. It is 99 parts by mass or less, more preferably 20 parts by mass or more and 95 parts by mass or less, and even more preferably 30 parts by mass or more and 90 parts by mass or less. The reason is that, when the content is in the above range, the composition can stably maintain the compound I-1, for example.
The content of the resin component can be appropriately set according to the use of the composition and the like. For example, it can be 1 part by mass or more and 99 parts by mass or less, preferably 10 parts by mass or more and 90 parts by mass in 100 parts by mass of the composition. It is preferably 40 parts by mass or more and 80 parts by mass or less. The reason is that when the content is within the above range, for example, the above composition can be used as a negative composition having excellent sensitivity. The reason therefor is to provide a composition which has less resistance to hardening and can easily provide a UV-absorbing function to a hardened material.
The content of the above-mentioned resin component varies depending on the use of the composition and the like, and it can be set to 1 part by mass or more and 99 parts by mass or less, and preferably 50 parts by mass in 100 parts by mass of the total of the compound I-1 and the resin component. The amount is not less than 99 parts by mass, and preferably not less than 80 parts by mass and not more than 99 parts by mass, and more preferably not less than 90 parts by mass and not more than 98 parts by mass. The reason is that when the content is within the above range, the composition can provide a composition that can easily provide an ultraviolet absorbing function and the like to a cured product.
The content of the compound I-1 and the resin component can be appropriately set according to the use of the composition and the like. For example, it can be set to 1 part by mass or more and 99 parts by mass or less in 100 parts by mass of the composition. 10 mass parts or more and 90 mass parts or less, Among these, 40 mass parts or more and 80 mass parts or less are preferable. The reason is that when the content is within the above range, for example, the above composition can be used as a negative composition having excellent sensitivity. The reason therefor is to provide a composition which has less resistance to hardening and can easily provide a UV-absorbing function to a hardened material.

本發明之組合物所含之上述樹脂成分之種類可僅為1種,亦可為2種以上之組合。
上述樹脂成分例如可設為僅含有聚合性化合物及聚合物之任一者或含有兩者。
於上述樹脂成分含有聚合性化合物及不具有聚合性基之聚合物之兩者之情形時,作為上述聚合性化合物之含量,可根據組合物之用途等而適當設定,例如於聚合性化合物及聚合物100質量份中,可設為1質量份以上且99質量份以下。
The kind of the resin component contained in the composition of the present invention may be only one kind, or a combination of two or more kinds.
The said resin component can contain only either one of a polymerizable compound and a polymer, or both, for example.
When the resin component contains both a polymerizable compound and a polymer without a polymerizable group, the content of the polymerizable compound may be appropriately set according to the use of the composition, for example, the polymerizable compound and the polymer In 100 parts by mass of the product, the amount can be 1 part by mass or more and 99 parts by mass or less.

(2)聚合起始劑
上述聚合起始劑係作為硬化性成分而含有者,通常與聚合性化合物等一併使用。
作為上述聚合起始劑,只要能夠使聚合性化合物聚合即可,例如可列舉藉由受到光照射而能夠使聚合性化合物聚合之光聚合起始劑、藉由加熱而能夠使聚合性化合物聚合之熱聚合起始劑等。
上述聚合起始劑就上述化合物I-1有效地發揮出作為紫外線吸收劑而發揮功能之效果之觀點而言,較佳為光聚合起始劑。
(2) Polymerization initiator The polymerization initiator is contained as a curable component, and is usually used together with a polymerizable compound and the like.
The polymerization initiator may be any polymerizable compound, and examples thereof include a photopolymerization initiator capable of polymerizing a polymerizable compound upon irradiation with light, and a polymerizable compound capable of polymerizing upon heating. Thermal polymerization initiators and the like.
The said polymerization initiator is a photoinitiator from a viewpoint of the said compound I-1 exhibiting the effect which functions as an ultraviolet absorber effectively.

(a)光聚合起始劑
作為上述光聚合起始劑,只要為藉由受到光照射而能夠使聚合性化合物聚合者即可,例如可列舉:光自由基聚合起始劑、光陽離子聚合起始劑、光陰離子聚合起始劑等。
(a) Photopolymerization initiator As the photopolymerization initiator, any polymer that can polymerize a polymerizable compound by irradiation with light may be used, and examples thereof include a photoradical polymerization initiator and photocationic polymerization. Initiator, photoanionic polymerization initiator, and the like.

作為上述光自由基聚合起始劑,只要為藉由光照射而產生自由基者,則可無特別限制地使用先前已知之化合物。
作為上述光自由基聚合起始劑,例如可例示苯乙酮系化合物、苯偶醯系化合物、二苯甲酮系化合物、9-氧硫系化合物及肟酯系化合物等作為較佳者。
As the photo-radical polymerization initiator, as long as a radical is generated by light irradiation, a previously known compound can be used without particular limitation.
Examples of the photo-radical polymerization initiator include acetophenone-based compounds, benzophenone-based compounds, benzophenone-based compounds, and 9-oxosulfur. As the compound, an oxime ester compound and the like are preferable.

作為上述苯乙酮系化合物,例如可列舉:二乙氧基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、4'-異丙基-2-羥基-2-甲基苯丙酮、2-羥基甲基-2-甲基苯丙酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、對二甲胺基苯乙酮、對第三丁基二氯苯乙酮、對第三丁基三氯苯乙酮、對疊氮苯亞甲基苯乙酮、1-羥基環己基苯基酮、2-甲基-1-[4-(甲硫基)苯基]-2-啉基丙酮-1、2-苄基-2-二甲胺基-1-(4-啉基苯基)-丁酮-1、安息香、安息香甲醚、安息香乙醚、安息香異丙醚、安息香正丁醚、安息香異丁醚及1-[4-(2-羥基乙氧基)-苯基]-2-羥基-2-甲基-1-丙烷-1-酮等。Examples of the acetophenone-based compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, and 4'-isopropyl-2-hydroxy- 2-methylphenylacetone, 2-hydroxymethyl-2-methylphenylacetone, 2,2-dimethoxy-1,2-diphenylethane-1-one, p-dimethylaminophenethyl Ketone, p-tert-butyldichloroacetophenone, p-tert-butyltrichloroacetophenone, p-azidebenzylidene, 1-hydroxycyclohexylphenylketone, 2-methyl-1 -[4- (methylthio) phenyl] -2-olinylacetone-1, 2-benzyl-2-dimethylamino-1- (4-olinylphenyl) -butanone-1, benzoin , Benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether and 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl- 1-propane-1-one and the like.

作為上述苯偶醯系化合物,可列舉苯偶醯等。Examples of the benzophenazine-based compound include benzophenazine and the like.

作為上述二苯甲酮系化合物,例如可列舉:二苯甲酮、鄰苯甲醯基苯甲酸甲酯、米其勒酮、4,4'-雙(二乙胺基)二苯甲酮、4,4'-二氯二苯甲酮及4-苯甲醯基-4'-甲基二苯硫醚等。Examples of the benzophenone-based compound include benzophenone, methyl orthobenzoylbenzoate, Michelin, 4,4'-bis (diethylamino) benzophenone, 4,4'-dichlorobenzophenone and 4-benzylidene-4'-methyldiphenyl sulfide.

作為上述9-氧硫系化合物,可列舉:9-氧硫、2-甲基-9-氧硫、2-乙基-9-氧硫、2-氯-9-氧硫、2-異丙基-9-氧硫、2,4-二乙基-9-氧硫等。As the above 9-oxysulfur Compounds, 9-oxysulfur 2-methyl-9-oxysulfur , 2-ethyl-9-oxysulfur , 2-chloro-9-oxysulfur , 2-isopropyl-9-oxysulfur , 2,4-diethyl-9-oxysulfur Wait.

作為上述肟系化合物,例如可列舉下述通式(IV)所表示之化合物。Examples of the oxime-based compound include compounds represented by the following general formula (IV).

[化25]
[Chemical 25]

(式中,R71 及R72 分別獨立地表示氫原子、氰基、碳原子數1~20之烷基、碳原子數6~30之芳基、碳原子數7~30之芳基烷基或碳原子數2~20之含雜環基,
R73 及R74 分別獨立地表示鹵素原子、硝基、氰基、羥基、羧基、R75 、OR76 、SR77 、NR78 R79 、COR80 、SOR81 、SO2 R82 或CONR83 R84 ,R73 及R74 亦存在互相鍵結而形成環之情形,
R75 、R76 、R77 、R78 、R79 、R80 、R81 、R82 、R83 及R84 分別獨立地表示碳原子數1~20之烷基、碳原子數6~30之芳基、碳原子數7~30之芳基烷基或碳原子數2~20之含雜環基,
X3 表示氧原子、硫原子、硒原子、CR85 R86 、CO、NR87 或PR88
X4 表示單鍵或CO,
R85 、R86 、R87 及R88 分別獨立地表示氫原子、碳原子數1~20之烷基、碳原子數6~20之芳基或碳原子數7~20之芳基烷基,該烷基或芳基烷基中之亞甲基亦存在被取代為鹵素原子、硝基、氰基、羥基、羧基或含雜環基之情形,亦存在被取代為-O-之情形,
R73 及R74 亦存在分別獨立地與鄰接之任一苯環一起形成環之情形,
e1表示0~4之整數,
e2表示0~5之整數)
(In the formula, R 71 and R 72 each independently represent a hydrogen atom, a cyano group, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, and an aryl alkyl group having 7 to 30 carbon atoms. Or a heterocyclic group containing 2 to 20 carbon atoms,
R 73 and R 74 each independently represent a halogen atom, a nitro group, a cyano group, a hydroxyl group, a carboxyl group, R 75 , OR 76 , SR 77 , NR 78 R 79 , COR 80 , SOR 81 , SO 2 R 82 or CONR 83 R 84 , R 73 and R 74 are also bonded to each other to form a ring,
R 75 , R 76 , R 77 , R 78 , R 79 , R 80 , R 81 , R 82 , R 83, and R 84 each independently represent an alkyl group having 1 to 20 carbon atoms, and an alkyl group having 6 to 30 carbon atoms Aryl, arylalkyl having 7 to 30 carbon atoms or heterocyclic group containing 2 to 20 carbon atoms,
X 3 represents an oxygen atom, a sulfur atom, a selenium atom, CR 85 R 86 , CO, NR 87 or PR 88 ,
X 4 represents a single bond or CO,
R 85 , R 86 , R 87 and R 88 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms or an arylalkyl group having 7 to 20 carbon atoms, The methylene group in the alkyl group or the arylalkyl group may be substituted with a halogen atom, a nitro group, a cyano group, a hydroxyl group, a carboxyl group, or a heterocyclic group.
R 73 and R 74 may also form a ring with any adjacent benzene ring independently.
e1 represents an integer from 0 to 4,
e2 represents an integer from 0 to 5)

作為上述通式(IV)中之R71 、R72 、R75 、R76 、R77 、R78 、R79 、R80 、R85 、R86 、R87 及R88 所使用之碳原子數1~20之烷基、碳原子數6~30之芳基、碳原子數7~30之芳基烷基或碳原子數2~20之含雜環基及該等之取代基,可列舉上述「1.光脫離基B」之項中作為R11 等所例示之內容中滿足特定之碳原子數者。The number of carbon atoms used as R 71 , R 72 , R 75 , R 76 , R 77 , R 78 , R 79 , R 80 , R 85 , R 86 , R 87, and R 88 in the general formula (IV) Examples of the alkyl group having 1 to 20 carbon atoms, the aryl group having 6 to 30 carbon atoms, the aryl alkyl group having 7 to 30 carbon atoms, or the heterocyclic group containing 2 to 20 carbon atoms and the substituents include the above. In the item "1. Photodissociation group B", a specific number of carbon atoms is satisfied among the contents exemplified as R 11 and the like.

作為上述肟系化合物,例如可列舉:乙酮-1-[9-乙基-6-(2-甲基苯甲醯基-9H-咔唑-3-基]-1-(O-乙醯基肟)、1-[9-乙基-6-苯甲醯基-9H-咔唑-3-基-辛烷-1-酮肟-O-乙酸酯、1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-乙烷-1-酮肟-O-苯甲酸酯、1-[9-正丁基-6-(2-乙基苯甲醯基)-9H-咔唑-3-基]-乙烷-1-酮肟-O-苯甲酸酯、乙酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃基苯甲醯基)-9H-咔唑-3-基]-1-(O-乙醯基肟)、乙酮-1-[9-乙基-6-(2-甲基-4-四氫吡喃基苯甲醯基)-9H-咔唑-3-基]-1-(O-乙醯基肟)、乙酮-1-[9-乙基-6-(2-甲基-5-四氫呋喃基苯甲醯基)-9H-咔唑-3-基]-1-(O-乙醯基肟)、乙酮-1-[9-乙基-6-{2-甲基-4-(2,2-二甲基-1,3-二氧戊環基)甲氧基苯甲醯基}-9H-咔唑-3-基]-1-(O-乙醯基肟)、乙酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃基甲氧基苯甲醯基)-9H-咔唑-3-基]-1-(O-乙醯基肟)等具有咔唑結構之咔唑系肟酯化合物。Examples of the oxime-based compound include ethyl ketone-1- [9-ethyl-6- (2-methylbenzylidene-9H-carbazol-3-yl] -1- (O-acetamidine) Oxime), 1- [9-ethyl-6-benzylidene-9H-carbazol-3-yl-octane-1-oneoxime-O-acetate, 1- [9-ethyl- 6- (2-methylbenzyl) -9H-carbazol-3-yl] -ethane-1-oneoxime-O-benzoate, 1- [9-n-butyl-6- ( 2-ethylbenzyl) -9H-carbazol-3-yl] -ethane-1-oneoxime-O-benzoate, ethyl ketone-1- [9-ethyl-6- (2 -Methyl-4-tetrahydrofuranylbenzyl) -9H-carbazol-3-yl] -1- (O-ethylamidoxime), ethyl ketone-1- [9-ethyl-6- (2 -Methyl-4-tetrahydropyranylbenzyl) -9H-carbazol-3-yl] -1- (O-ethylfluorenyloxime), ethyl ketone-1- [9-ethyl-6 -(2-methyl-5-tetrahydrofurylbenzyl) -9H-carbazol-3-yl] -1- (O-ethylamidoxime), ethyl ketone-1- [9-ethyl-6 -{2-methyl-4- (2,2-dimethyl-1,3-dioxolyl) methoxybenzyl} -9H-carbazol-3-yl] -1- ( O-acetamidoxime), ethyl ketone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofurylmethoxybenzyl) -9H-carbazol-3-yl]- Carbazole-based oxime ester compounds having a carbazole structure such as 1- (O-acetamidooxime).

作為上述肟系化合物,例如亦可使用具有吲哚結構之吲哚系肟酯化合物。
作為吲哚系肟酯化合物,例如可列舉國際公開第2017/051680號所記載之下述通式(V)所表示之肟酯化合物等。
As the oxime-based compound, for example, an indole-based oxime ester compound having an indole structure can be used.
Examples of the indole-based oxime ester compound include an oxime ester compound represented by the following general formula (V) described in International Publication No. 2017/051680.

[化26]
[Chemical 26]

(式中,R201 及R202 分別獨立地表示R211 、OR211 、COR211 、SR211 、CONR212 R213 或CN,
R211 、R212 及R213 分別獨立地表示氫原子、碳原子數1~20之烷基、碳原子數6~30之芳基、碳原子數7~30之芳基烷基或碳原子數2~20之含雜環基,
R211 、R212 及R213 所表示之基之氫原子亦存在進一步被取代為R221 、OR221 、COR221 、SR221 、NR222 R223 、CONR222 R223 、NR222 OR223 、NCOR222 OCOR223 、NR222 COR221 、OCOR221 、COOR221 、SCOR221 、OCSR221 、COSR221 、CSOR221 、羥基、硝基、CN、鹵素原子、或COOR221 之情形,
R221 、R222 及R223 分別獨立地表示氫原子、碳原子數1~20之烷基、碳原子數6~30之芳基、碳原子數7~30之芳基烷基或碳原子數2~20之含雜環基,
R221 、R222 及R223 所表示之基之氫原子亦存在進一步被取代為羥基、硝基、CN、鹵素原子、羥基或羧基之情形,
R211 、R212 、R213 、R221 、R222 及R223 所表示之基之伸烷基部分之亞甲基亦存在被取代為-O-、-S-、-COO-、-OCO-、-OCOO-、-CONR224 -、-NR224 -、-NR224 CO-、-NR224 COO-、-OCONR224 -、-SCO-、-COS-、-OCS-或-SCOO-之情形,
R224 表示氫原子、碳原子數1~20之烷基、碳原子數6~30之芳基、碳原子數7~30之芳基烷基或碳原子數2~20之含雜環基,
R211 、R212 、R213 、R221 、R222 、R223 及R224 所表示之基之烷基部分亦存在具有支鏈側鏈之情形,亦存在為環狀烷基之情形,
R203 表示氫原子、碳原子數1~20之烷基、碳原子數6~30之芳基、碳原子數7~30之芳基烷基或碳原子數2~20之含雜環基,R203 所表示之基之烷基部分亦存在具有支鏈側鏈之情形,亦存在為環狀烷基之情形,又,R203 與R207 及R203 與R208 亦存在分別一起形成環之情形,
R203 所表示之基之氫原子亦存在進一步被取代為R221 、OR221 、COR221 、SR221 、NR222 R223 、CONR222 R223 、NR222 OR223 、NCOR222 OCOR223 、NR222 COR221 、OCOR221 、COOR221 、SCOR221 、OCSR221 、COSR221 、CSOR221 、羥基、硝基、CN、鹵素原子、或COOR221 之情形,
R204 、R205 、R206 及R207 分別獨立地表示R211 、OR211 、SR211 、COR214 、CONR215 R216 、NR212 COR211 、OCOR211 、COOR214 、SCOR211 、OCSR211 、COSR214 、CSOR211 、羥基、CN或鹵素原子,R204 與R205 、R205 與R206 及R206 與R207 亦存在分別一起形成環之情形,
R204 、R205 、R206 及R207 所表示之基之氫原子亦存在進一步被取代為R221 、OR221 、COR221 、SR221 、NR222 R223 、CONR222 R223 、NR222 OR223 、NCOR222 OCOR223 、NR222 COR221 、OCOR221 、COOR221 、SCOR221 、OCSR221 、COSR221 、CSOR221 、羥基、硝基、CN、鹵素原子或COOR221 之情形,
R214 、R215 及R216 表示氫原子或碳原子數1~20之烷基,
R214 、R215 及R216 所表示之基之烷基部分亦存在具有支鏈側鏈之情形,亦存在為環狀烷基之情形,
R208 表示R211 、OR211 、SR211 、COR211 、CONR212 R213 、NR212 COR211 、OCOR211 、COOR211 、SCOR211 、OCSR211 、COSR211 、CSOR211 、羥基、CN或鹵素原子,
n1表示0或1)
(In the formula, R 201 and R 202 each independently represent R 211 , OR 211 , COR 211 , SR 211 , CONR 212 R 213 or CN,
R 211 , R 212 and R 213 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or carbon number Heterocyclic group containing 2 to 20,
The hydrogen atom of the base represented by R 211 , R 212 and R 213 also exists and is further substituted with R 221 , OR 221 , COR 221 , SR 221 , NR 222 R 223 , CONR 222 R 223 , NR 222 OR 223 , NCOR 222 In the case of OCOR 223 , NR 222 COR 221 , OCOR 221 , COOR 221 , SCOR 221 , OCSR 221 , COSR 221 , CSOR 221 , hydroxyl, nitro, CN, halogen atom, or COOR 221 ,
R 221 , R 222 and R 223 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or carbon number Heterocyclic group containing 2 to 20,
The hydrogen atom of the group represented by R 221 , R 222 and R 223 may be further substituted with a hydroxyl group, a nitro group, a CN, a halogen atom, a hydroxyl group or a carboxyl group.
The methylene group of the alkylene part of the group represented by R 211 , R 212 , R 213 , R 221 , R 222 and R 223 is also substituted with -O-, -S-, -COO-, -OCO- , -OCOO -, - CONR 224 - , - NR 224 -, - NR 224 CO -, - NR 224 COO -, - OCONR 224 -, - SCO -, - COS -, - OCS- or -SCOO- the case,
R 224 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group containing 2 to 20 carbon atoms,
R 211 , R 212 , R 213 , R 221 , R 222 , R 223, and R 224 may have a branched side chain in the alkyl portion of the group represented by the alkyl portion, or a cyclic alkyl group.
R 203 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group containing 2 to 20 carbon atoms, The alkyl portion of the group represented by R 203 may have branched side chains or a cyclic alkyl group. Also, R 203 and R 207 and R 203 and R 208 may form a ring together. situation,
The hydrogen atom of the base represented by R 203 is also further substituted as R 221 , OR 221 , COR 221 , SR 221 , NR 222 R 223 , CONR 222 R 223 , NR 222 OR 223 , NCOR 222 OCOR 223 , NR 222 COR 221 , OCOR 221 , COOR 221 , SCOR 221 , OCSR 221 , COSR 221 , CSOR 221 , hydroxyl, nitro, CN, halogen atom, or COOR 221 ,
R 204 , R 205 , R 206, and R 207 each independently represent R 211 , OR 211 , SR 211 , COR 214 , CONR 215 R 216 , NR 212 COR 211 , OCOR 211 , COOR 214 , SCOR 211 , OCSR 211 , COSR 214 , CSOR 211 , hydroxyl, CN, or halogen atom, R 204 and R 205 , R 205 and R 206, and R 206 and R 207 may also form a ring together,
Hydrogen atoms of the radicals represented by R 204 , R 205 , R 206 and R 207 also exist and are further substituted with R 221 , OR 221 , COR 221 , SR 221 , NR 222 R 223 , CONR 222 R 223 , NR 222 OR 223 In the case of NCOR 222 OCOR 223 , NR 222 COR 221 , OCOR 221 , COOR 221 , SCOR 221 , OCSR 221 , COSR 221 , CSOR 221 , hydroxyl, nitro, CN, halogen atom or COOR 221 ,
R 214 , R 215 and R 216 represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms,
The alkyl portion of the group represented by R 214 , R 215, and R 216 may have a branched side chain or a cyclic alkyl group.
R 208 represents R 211 , OR 211 , SR 211 , COR 211 , CONR 212 R 213 , NR 212 COR 211 , OCOR 211 , COOR 211 , SCOR 211 , OCSR 211 , COSR 211 , CSOR 211 , hydroxyl, CN or halogen atom,
n1 means 0 or 1)

作為上述通式(V)中之R203 、R211 、R212 、R213 、R214 、R215 、R216 、R221 、R222 、R223 及R224 所使用之碳原子數1~20之烷基、碳原子數6~30之芳基、碳原子數7~30之芳基烷基或碳原子數2~20之含雜環基,可列舉上述「1.光脫離基B」之項中作為R11 等所例示之內容中滿足特定之碳原子數者。1 to 20 carbon atoms used as R 203 , R 211 , R 212 , R 213 , R 214 , R 215 , R 216 , R 221 , R 222 , R 223 and R 224 in the general formula (V) Examples of the alkyl group, aryl group having 6 to 30 carbon atoms, arylalkyl group having 7 to 30 carbon atoms, or heterocyclic group having 2 to 20 carbon atoms include the above-mentioned "1. Photodissociative group B" The item exemplified as R 11 in the item satisfies a specific number of carbon atoms.

作為其他自由基聚合起始劑,可列舉2,4,6-三甲基苯甲醯基二苯基氧化膦等氧化膦系化合物及雙(環戊二烯基)-雙[2,6-二氟-3-(吡咯-1-基)]鈦等二茂鈦系化合物等。Examples of other radical polymerization initiators include phosphine oxide compounds such as 2,4,6-trimethylbenzylidene diphenylphosphine oxide, and bis (cyclopentadienyl) -bis [2,6- Difluorocene compounds such as difluoro-3- (pyrrole-1-yl)] titanium and the like.

作為市售之自由基聚合起始劑,可列舉:Adeka Optomer N-1414、N-1717、N-1919、Adeka ARKLS NCI-831、NCI-930(ADEKA公司製造)、IRGACURE184、IRGACURE369、IRGACURE651、IRGACURE907、IRGACURE OXE 01、IRGACURE OXE 02、OXE 03、OXE 04、IRGACURE784(BASF公司製造)、TR-PBG-304、TR-PBG-305、TR-PBG-309及TR-PBG-314(Tronly公司製造)等。Examples of commercially available radical polymerization initiators include: Adeka Optomer N-1414, N-1717, N-1919, Adeka ARKLS NCI-831, NCI-930 (manufactured by ADEKA), IRGACURE184, IRGACURE369, IRGACURE651, IRGACURE907 , IRGACURE OXE 01, IRGACURE OXE 02, OXE 03, OXE 04, IRGACURE784 (made by BASF), TR-PBG-304, TR-PBG-305, TR-PBG-309, and TR-PBG-314 (made by Truly) Wait.

該等光自由基聚合起始劑可根據所需之性能調配1種或2種以上使用。
作為上述光自由基聚合起始劑之含量,只要可賦予所需之硬化性或感光性即可,例如相對於聚合性化合物100質量份,可設為0.001質量份以上且20質量份以下,較佳為0.1質量份以上且30質量份以下,較佳為0.5質量份以上且10質量份以下。其原因在於:藉由為上述含量,組合物之硬化性等優異,又,分散性等亦優異。
These photo-radical polymerization initiators can be used singly or in combination of two or more according to the required performance.
The content of the photo-radical polymerization initiator is only required to provide the desired curability or photosensitivity. For example, the content of the photo-radical polymerization initiator may be 0.001 to 20 parts by mass based on 100 parts by mass of the polymerizable compound. It is preferably from 0.1 to 30 parts by mass, more preferably from 0.5 to 10 parts by mass. The reason for this is that the composition has excellent curability and the like as well as excellent dispersibility and the like by the content.

作為上述光陽離子聚合起始劑,只要為能夠藉由光照射而釋放出使陽離子聚合開始之物質之化合物,則無特別限制,可使用既有之化合物,較佳為作為藉由能量線之照射而釋放出路易斯酸之鎓鹽之複鹽、或其衍生物。作為該化合物之代表性者,可列舉下述通式
[A1]r+ [B1]r-
所表示之陽離子與陰離子之鹽。
The photocationic polymerization initiator is not particularly limited as long as it is a compound capable of releasing a substance that initiates cationic polymerization by light irradiation. Existing compounds can be used, and it is preferably used as irradiation by energy rays. The double salt of the onium salt of Lewis acid, or a derivative thereof is released. As a representative of this compound, the following general formula is mentioned
[A1] r + [B1] r-
The indicated cation and anion salts.

上述陽離子[A1]r+ 較佳為鎓,其結構例如可以下述通式表示。
[(R101 )f1 Q]r+
The cation [A1] r + is preferably an onium, and its structure can be represented by the following general formula, for example.
[(R 101 ) f1 Q] r +

進而,此處,R101 係碳原子數為1~60且亦存在含有若干碳原子以外之原子之情形之有機基。f1為1~5之任一整數。e個R58 分別獨立,有相同之情形,有不同之情形。又,較佳為R101 之至少一者為具有芳香環之如上述之有機基。例如可列舉亦存在經烷基、烷氧基、羥基、羥基烷氧基、鹵素原子、苄基、硫代苯氧基、4-苯甲醯基苯硫基、2-氯-4-苯甲醯基苯硫基等取代之情形之苯基。Q係選自由S、N、Se、Te、P、As、Sb、Bi、O、I、Br、Cl、F、N=N所組成之群中之原子或原子團。又,於將陽離子[A1]r+ 中之Q之原子價設為q時,r=f1-q之關係必須成立(其中,N=N以原子價為0處理)。Furthermore, here, R 101 is an organic group in which the number of carbon atoms is 1 to 60 and there are atoms other than a few carbon atoms. f1 is any integer from 1 to 5. The e R 58 are independent and have the same situation and different situations. In addition, it is preferable that at least one of R 101 is an organic group having an aromatic ring as described above. Examples include alkyl, alkoxy, hydroxyl, hydroxyalkoxy, halogen atoms, benzyl, thiophenoxy, 4-benzylphenylphenylthio, 2-chloro-4-benzyl A phenyl group in the case of a substituted fluorenylphenylthio group. Q is an atom or a group of atoms selected from the group consisting of S, N, Se, Te, P, As, Sb, Bi, O, I, Br, Cl, F, N = N. When the atomic valence of Q in the cation [A1] r + is set to q, a relationship of r = f1−q must be established (where N = N is treated with an atomic valence of 0).

又,陰離子[B1]r- 較佳為鹵化物錯合物,其結構例如可以下述通式[LXf2 ]r- 表示。The anion [B1] r- is preferably a halide complex, and its structure can be represented, for example, by the following general formula [LX f2 ] r- .

進而,此處,L係作為鹵化物錯合物之中心原子之金屬或半金屬(Metalloid),為B、P、As、Sb、Fe、Sn、Bi、Al、Ca、In、Ti、Zn、Sc、V、Cr、Mn及Co等。
Xf2 為鹵素原子、或者存在經鹵素原子或烷氧基等取代之情形之苯基。f2為3~7之整數。
又,於將陰離子[B1]r- 中之L之原子價設為p時,r=f2-p之關係必須成立。
Furthermore, here, L is a metal or semimetal (Metalloid) as the central atom of the halide complex, and is B, P, As, Sb, Fe, Sn, Bi, Al, Ca, In, Ti, Zn, Sc, V, Cr, Mn and Co.
X f2 is a halogen atom or a phenyl group in the case where it is substituted with a halogen atom or an alkoxy group. f2 is an integer from 3 to 7.
When the atomic valence of L in the anion [B1] r- is set to p, the relationship of r = f2-p must be established.

作為上述通式之陰離子[LXf2 ]r- 之具體例,可列舉:四(五氟苯基)硼酸鹽、四(3,5-二氟-4-甲氧基苯基)硼酸鹽、四氟硼酸根(BF4 )- 、六氟磷酸根(PF6 )- 、六氟銻酸根(SbF6 )- 、六氟砷酸根(AsF6 )- 及六氯銻酸根(SbCl6 )- 等。Specific examples of the anion [LX f2 ] r- of the general formula include tetrakis (pentafluorophenyl) borate, tetra (3,5-difluoro-4-methoxyphenyl) borate, and tetrakis tetrafluoroborate (BF 4) -, hexafluorophosphate (PF 6) -, hexafluoroantimonate (SbF 6) -, hexafluoroarsenate (AsF 6) - and hexachloro antimonate (SbCl 6) - and the like.

又,陰離子[B1]r- 亦可較佳地使用下述通式
[LXf2 1 (OH)]r-
所表示之結構者。L、X、f2與上述相同。又,作為其他可使用之陰離子,可列舉:過氯酸根離子(ClO4 )- 、三氟甲基亞硫酸根離子(CF3 SO3 )- 、氟磺酸根離子(FSO3 )- 、甲苯磺酸根陰離子、三硝基苯磺酸根陰離子、樟腦磺酸鹽、九氟丁磺酸鹽、十六氟辛磺酸鹽、四芳基硼酸鹽及四(五氟苯基)硼酸鹽等。
In addition, the anion [B1] r- can also preferably use the following general formula
[LX f2 1 (OH)] r-
The represented structure. L, X, and f2 are the same as described above. Examples of other anions that can be used include perchlorate ion (ClO 4 ) - , trifluoromethylsulfite ion (CF 3 SO 3 ) - , fluorosulfonate ion (FSO 3 ) - , and tosylate Acid anion, trinitrobenzene sulfonate anion, camphor sulfonate, nonafluorobutane sulfonate, hexafluorooctane sulfonate, tetraaryl borate and tetrakis (pentafluorophenyl) borate.

於本發明中,此種鎓鹽中,使用下述之(甲)~(丙)之芳香族鎓鹽尤其有效,故而較佳。該等中,可單獨使用其中1種,或可混合2種以上使用。In the present invention, among such onium salts, it is particularly effective to use the following aromatic onium salts (A) to (C), and therefore it is preferable. Among these, one kind may be used alone, or two or more kinds may be used in combination.

(甲)苯基重氮鎓六氟磷酸鹽、4-甲氧基苯基重氮鎓六氟銻酸鹽及4-甲基苯基重氮鎓六氟磷酸鹽等芳基重氮鎓鹽。(A) Aryldiazonium salts such as phenyldiazonium hexafluorophosphate, 4-methoxyphenyldiazonium hexafluoroantimonate, and 4-methylphenyldiazonium hexafluorophosphate.

(乙)二苯基錪六氟銻酸鹽、二(4-甲基苯基)錪六氟磷酸鹽、二(4-第三丁基苯基)錪六氟磷酸鹽及甲苯基異丙苯基錪四(五氟苯基)硼酸鹽等二芳基錪鹽。(B) Diphenylphosphonium hexafluoroantimonate, bis (4-methylphenyl) phosphonium hexafluorophosphate, bis (4-thirdbutylphenyl) phosphonium hexafluorophosphate and tolyl cumene Diarylsulfonium salts such as tetrakis (pentafluorophenyl) borate.

(丙)下述群I或群II所表示之鋶陽離子與六氟銻離子、四(五氟苯基)硼酸根離子等之鋶鹽。(C) A sulfonium salt of a phosphonium cation and a hexafluoroantimony ion, a tetrakis (pentafluorophenyl) borate ion, and the like represented by the following Group I or Group II.

[化27]
<群I>
[Chemical 27]
< Group I >

[化28]
<群II>
[Chemical 28]
< Group II >

又,作為其他較佳者,亦可列舉:(η5-2,4-環戊二烯-1-基)[(1,2,3,4,5,6-η)-(1-甲基乙基)苯]-鐵-六氟磷酸鹽等鐵-芳烴錯合物;三(乙醯丙酮)鋁、三(乙基丙酮乙酸)鋁、三(水楊醛酸)鋁等鋁錯合物;與三苯基矽烷醇等矽烷醇類之混合物:等。As another preferred one, (η5-2,4-cyclopentadien-1-yl) [(1,2,3,4,5,6-η)-(1-methyl Ethyl) benzene] -iron-aromatic hydrocarbon complexes such as iron-hexafluorophosphate; aluminum tris (ethylacetone) aluminum, aluminum tris (ethylacetoneacetate), aluminum (salicylic acid) aluminum complexes ; Mixtures with silanols such as triphenylsilanol: etc.

作為上述光陽離子聚合起始劑,亦可使用市售品,例如可列舉:IRUGACURE261(BASF公司製造)、Adeka Optomer SP-150、SP-151、SP-152、SP-170、SP-171、SP-172(ADEKA公司製造)、UVE-1014(General Electronics公司製造)、CD-1012(Sartomer公司製造)、CI-2064、CI-2481(日本曹達公司製造)、Uvacure1590、1591(Daicel UCB)、CYRACUREUVI-6990(Union Carbide公司製造)、BBI-103、MPI-103、TPS-103、MDS-103、DTS-103、NAT-103及NDS-103(Midori Kagaku公司製造)等。As the photocationic polymerization initiator, commercially available products can also be used, and examples thereof include IRUGACURE261 (manufactured by BASF), Adeka Optomer SP-150, SP-151, SP-152, SP-170, SP-171, and SP -172 (manufactured by ADEKA), UVE-1014 (manufactured by General Electronics), CD-1012 (manufactured by Sartomer), CI-2064, CI-2481 (manufactured by Soda, Japan), Uvacure1590, 1591 (Daicel UCB), CYRACUREUVI -6990 (manufactured by Union Carbide), BBI-103, MPI-103, TPS-103, MDS-103, DTS-103, NAT-103, and NDS-103 (manufactured by Midori Kagaku).

該等中,就實用方面與光感度之觀點而言,較佳為使用芳香族錪鹽、芳香族鋶鹽、鐵-芳烴錯合物。Among these, in terms of practicality and light sensitivity, it is preferable to use an aromatic sulfonium salt, an aromatic sulfonium salt, and an iron-aromatic hydrocarbon complex.

作為上述光陰離子聚合起始劑,可使用藉由光而產生鹼者,可使用作為光陰離子聚合起始劑而公知者。
作為上述光陰離子聚合起始劑,例如可列舉:苯乙酮 O-芳醯基肟(acetophenone O-aroyloxime)、硝苯地平(nifedipine)等。
As the photo-anionic polymerization initiator, one that generates a base by light can be used, and a known one can be used as the photo-anionic polymerization initiator.
Examples of the photoanionic polymerization initiator include acetophenone O-aroyloxime, nifedipine, and the like.

(b)熱聚合起始劑
作為上述熱聚合起始劑,只要為藉由加熱而能夠使聚合性化合物聚合者即可,可列舉自由基聚合起始劑、陽離子聚合起始劑、陰離子聚合起始劑等。
(b) Thermal polymerization initiator The thermal polymerization initiator may be any polymer that can polymerize a polymerizable compound by heating, and examples thereof include a radical polymerization initiator, a cationic polymerization initiator, and anionic polymerization. Starting agent and so on.

作為上述熱自由基聚合起始劑,可使用藉由加熱而產生自由基者,可使用作為熱自由基聚合起始劑而公知者。
作為上述熱自由基聚合起始劑,例如可例示偶氮系化合物、過氧化物及過硫酸鹽等作為較佳者。
As the thermal radical polymerization initiator, those which generate radicals by heating can be used, and those known as thermal radical polymerization initiators can be used.
As said thermal radical polymerization initiator, for example, an azo compound, a peroxide, a persulfate, etc. are mentioned as a preferable thing.

作為上述偶氮系化合物,可列舉:2,2'-偶氮雙異丁腈、2,2'-偶氮雙(異丁酸甲酯)、2,2'-偶氮雙-2,4-二甲基戊腈、1,1'-偶氮雙(1-乙醯氧基-1-苯基乙烷)等。Examples of the azo-based compound include 2,2'-azobisisobutyronitrile, 2,2'-azobis (isobutyric acid methyl ester), and 2,2'-azobis-2,4. -Dimethylvaleronitrile, 1,1'-azobis (1-acetamido-1-phenylethane), and the like.

作為過氧化物,可列舉:過氧化苯甲醯、二(第三丁基)苯甲醯基過氧化物、過氧化特戊酸第三丁酯及過氧化二碳酸二(4-第三丁基環己基)酯等。Examples of the peroxide include benzamidine peroxide, bis (tertiary butyl) benzylidene peroxide, tert-butyl pervalerate and di (4-tert-butyl peroxydicarbonate) Cyclohexyl) ester and the like.

作為上述過硫酸鹽,可列舉過硫酸銨、過硫酸鈉及過硫酸鉀等過硫酸鹽等。Examples of the persulfate include persulfates such as ammonium persulfate, sodium persulfate, and potassium persulfate.

作為上述熱陽離子聚合起始劑,可使用藉由加熱而產生陽離子種或路易斯酸者,可使用作為熱陽離子聚合起始劑而公知者。
作為上述熱陽離子聚合起始劑,具體而言,可列舉:鋶鹽、噻吩鎓鹽、硫㖦鎓(thiolanium)鹽、苄基銨、吡啶鎓鹽及鹽等鹽;二伸乙基三胺、三伸乙基三胺及四伸乙基五胺等聚烷基聚胺類;1,2-二胺基環己烷、1,4-二胺基-3,6-二乙基環己烷及異佛爾酮二胺等脂環式聚胺類;間苯二甲胺、二胺基二苯基甲烷及二胺基二苯基碸等芳香族聚胺類;藉由利用常規方法使上述聚胺類與苯基縮水甘油醚、丁基縮水甘油醚、雙酚A-二縮水甘油醚及雙酚F-二縮水甘油醚等縮水甘油醚類或羧酸之縮水甘油酯類等各種環氧樹脂進行反應所製造之聚環氧加成改性物;藉由利用常規方法使上述有機聚胺類與鄰苯二甲酸、間苯二甲酸及二聚酸等羧酸類進行反應所製造之醯胺化改性物;藉由利用常規方法使上述聚胺類與甲醛等醛類及苯酚、甲酚、二甲苯酚、第三丁基苯酚及間苯二酚等核中具有至少一個醛化反應性位置之酚類進行反應所製造之曼尼希(Mannich)化改性物;多元羧酸(草酸、丙二酸、丁二酸、戊二酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸、十二烷二酸、2-甲基丁二酸、2-甲基己二酸、3-甲基己二酸、3-甲基戊二酸、2-甲基辛二酸、3,8-二甲基癸二酸、3,7-二甲基癸二酸、氫化二聚酸及二聚酸等脂肪族二羧酸類;鄰苯二甲酸、對苯二甲酸、間苯二甲酸及萘二甲酸等芳香族二羧酸類;環己烷二羧酸等脂環式二羧酸類;偏苯三甲酸、均苯三甲酸及蓖麻油脂肪酸等三聚物等之三羧酸類;均苯四甲酸等四羧酸類等)之酸酐;雙氰胺、咪唑類、羧酸酯、磺酸酯及胺醯亞胺等。
作為上述熱陽離子聚合起始劑,亦可使用市售品,例如可列舉:Adekaopton CP-77、Adekaopton CP-66(ADEKA公司製造)、CI-2639、CI-2624(日本曹達公司製造)、San-Aid SI-60L、San-Aid SI-80L、San-Aid SI-100L(三新化學工業公司製造)等。
As the thermal cationic polymerization initiator, one that generates a cationic species or a Lewis acid by heating can be used, and a known one can be used as the thermal cationic polymerization initiator.
Specific examples of the thermal cationic polymerization initiator include salts such as a sulfonium salt, a thienyl salt, a thiolanium salt, a benzyl ammonium, a pyridinium salt, and a salt; Polyalkyl polyamines such as triethylene triamine and tetra ethylene triamine; 1,2-diaminocyclohexane, 1,4-diamino-3,6-diethylcyclohexane And alicyclic polyamines such as isophorone diamine; aromatic polyamines such as m-xylylenediamine, diaminodiphenylmethane, and diaminodiphenylphosphonium; the above-mentioned methods are made by conventional methods Polyamines and various epoxy resins such as phenyl glycidyl ether, butyl glycidyl ether, bisphenol A-diglycidyl ether and bisphenol F-diglycidyl ether, or glycidyl esters of carboxylic acids Polyepoxy addition modified product produced by resin reaction; ammonium amine produced by reacting the above organic polyamines with carboxylic acids such as phthalic acid, isophthalic acid and dimer acid by a conventional method Modified product; by using conventional methods, the above polyamines and aldehydes such as formaldehyde and cores such as phenol, cresol, xylenol, third butylphenol, and resorcinol Mannich modification produced by reacting phenols with at least one aldehyde-forming reactive site; polycarboxylic acids (oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, heptane Diacid, suberic acid, azelaic acid, sebacic acid, dodecanedioic acid, 2-methylsuccinic acid, 2-methyladipate, 3-methyladipate, 3-methylpentane Aliphatic dicarboxylic acids such as diacid, 2-methylsuberic acid, 3,8-dimethylsebacic acid, 3,7-dimethylsebacic acid, hydrogenated dimer acid, and dimer acid; o-benzene Aromatic dicarboxylic acids such as dicarboxylic acid, terephthalic acid, isophthalic acid, and naphthalenedicarboxylic acid; alicyclic dicarboxylic acids such as cyclohexanedicarboxylic acid; trimellitic acid, trimesic acid, and castor oil fatty acids Tricarboxylic acids such as trimer and the like; anhydrides of tetracarboxylic acids such as pyromellitic acid; etc .; dicyandiamide, imidazoles, carboxylic acid esters, sulfonic acid esters, and amine imines.
As the thermal cationic polymerization initiator, commercially available products can also be used, and examples thereof include Adekaopton CP-77, Adekaopton CP-66 (manufactured by ADEKA), CI-2639, CI-2624 (manufactured by Soda Co., Ltd.), San -Aid SI-60L, San-Aid SI-80L, San-Aid SI-100L (manufactured by San Shin Chemical Industry Co., Ltd.), etc.

作為上述熱陰離子聚合起始劑,可使用藉由熱而產生鹼者,可使用作為熱陰離子聚合起始劑而公知者。
作為上述陰離子聚合起始劑,具體而言,可使用:脂肪族胺系化合物、芳香族胺系化合物、二級或三級胺系化合物、咪唑系化合物、聚硫醇系化合物、三氟化硼-胺錯合物、雙氰胺、有機醯肼等。
As the thermal anionic polymerization initiator, one that generates a base by heat can be used, and one known as a thermal anionic polymerization initiator can be used.
As the anionic polymerization initiator, specifically, an aliphatic amine-based compound, an aromatic amine-based compound, a secondary or tertiary amine-based compound, an imidazole-based compound, a polythiol-based compound, and boron trifluoride can be used. -Amine complexes, dicyandiamide, organic hydrazine, etc.

(c)聚合起始劑之含量
作為上述聚合起始劑之含量,只要可賦予所需之硬化性等即可,例如於固形物成分100質量份中,可設為0.1質量份以上且30質量份以下,較佳為0.5質量份以上且10質量份以下。其原因在於:藉由為上述含量,組合物之硬化性等優異,又,分散性等亦優異。
作為上述聚合起始劑之含量,只要可賦予所需之硬化性或感光性即可,例如相對於聚合性化合物100質量份,可設為0.001質量份以上且20質量份以下,較佳為0.1質量份以上且30質量份以下,較佳為0.5質量份以上且10質量份以下。其原因在於:藉由為上述含量,組合物之硬化性等優異,又,分散性等亦優異。
(c) Content of polymerization initiator As the content of the above-mentioned polymerization initiator, it is sufficient as long as it can impart desired hardenability, etc., for example, it can be set to 0.1 parts by mass or more and 30 parts by mass in 100 parts by mass of the solid component. It is preferably 0.5 parts by mass or more and 10 parts by mass or less. The reason for this is that the composition has excellent curability and the like as well as excellent dispersibility and the like by the content.
The content of the polymerization initiator is only required to impart desired curability or light sensitivity. For example, it may be 0.001 to 20 parts by mass, and preferably 0.1 to 100 parts by mass of the polymerizable compound. The mass is not less than 30 parts by mass, and preferably 0.5 part by mass or more and 10 parts by mass or less. The reason for this is that the composition has excellent curability and the like as well as excellent dispersibility and the like by the content.

(3)其他
作為上述其他成分,除了樹脂成分、聚合起始劑以外,可視需要包含著色劑、溶劑、鏈轉移劑、增感劑、界面活性劑、矽烷偶合劑、三聚氰胺化合物等。
又,上述其他成分除了該等以外,亦可視需要包含:對苯甲醚、對苯二酚、鄰苯二酚、第三丁基兒茶酚、啡噻等熱聚合抑制劑;塑化劑;接著促進劑;填充劑;消泡劑;調平劑;表面調整劑;酚系抗氧化劑、亞磷酸酯系抗氧化劑、硫醚系抗氧化劑等抗氧化劑;上述化合物I-1所表示之化合物以外之紫外線吸收劑;分散助劑;抗凝劑;觸媒;效果促進劑;交聯劑;增黏劑等添加劑。
(3) Others As the above other components, in addition to the resin component and the polymerization initiator, a colorant, a solvent, a chain transfer agent, a sensitizer, a surfactant, a silane coupling agent, a melamine compound, and the like may be included as necessary.
In addition, in addition to the above, the other components described above may optionally include: thermal polymerization inhibitors such as p-anisole, hydroquinone, catechol, third butyl catechol, and phenothion; a plasticizer; Next accelerators; fillers; defoamers; leveling agents; surface modifiers; antioxidants such as phenol-based antioxidants, phosphite-based antioxidants, and thioether-based antioxidants; other than those represented by compound I-1 UV absorber; dispersing aid; anticoagulant; catalyst; effect promoter; crosslinker; tackifier and other additives.

(a)著色劑
作為上述著色劑,只要可對例如組合物或其硬化物等賦予所需之著色即可,可列舉染料或顏料。
作為染料,可使用於380~1200 nm具有吸收之化合物,例如可列舉:偶氮化合物、蒽醌化合物、靛藍(indigoid)化合物、三芳基甲烷化合物、化合物、茜素化合物、吖啶化合物、茋化合物、噻唑化合物、萘酚化合物、喹啉化合物、硝基化合物、吲達胺化合物、㗁化合物、酞菁化合物、花青化合物、二亞銨化合物、氰基乙烯基化合物、二氰基苯乙烯化合物、若丹明化合物、苝化合物、多烯萘內醯胺(polyene naphtholactam)化合物、香豆素化合物、方酸鎓化合物、克酮鎓化合物、螺吡喃化合物、螺㗁化合物、部花青化合物、氧喏化合物、苯乙烯基化合物、吡喃鎓化合物、繞丹寧化合物、㗁唑啉酮化合物、鄰苯二甲醯亞胺化合物、㖕啉化合物、萘醌化合物、氮雜萘醌化合物、卟啉化合物、氮雜卟啉化合物、吡咯亞甲基化合物、喹吖啶酮化合物、吡咯并吡咯二酮化合物、靛藍(indigo)化合物、吖啶化合物、吖化合物、甲亞胺化合物、苯胺化合物、喹吖啶酮化合物、喹酞酮化合物、醌亞胺化合物、銥錯合物、銪錯合物等染料等,該等可混合使用複數種。
(a) Colorant As the colorant, as long as a desired color can be imparted to, for example, a composition or a cured product thereof, a dye or a pigment can be mentioned.
As the dye, a compound having absorption at 380 to 1200 nm can be used, and examples thereof include an azo compound, an anthraquinone compound, an indigoid compound, a triarylmethane compound, Compounds, alizarin compounds, acridine compounds, amidine compounds, thiazole compounds, naphthol compounds, quinoline compounds, nitro compounds, indamine compounds, amidine compounds, phthalocyanine compounds, cyanine compounds, diimmonium compounds, cyanide Vinyl compounds, dicyanostyrene compounds, rhodamine compounds, fluorene compounds, polyene naphtholactam compounds, coumarin compounds, squarylium compounds, ketonium compounds, spiropyrans Compounds, spironium compounds, merocyanine compounds, oxazonium compounds, styryl compounds, pyranium compounds, rhodanine compounds, oxazolinone compounds, phthalimide compounds, oxazoline compounds, naphthalenes Quinone compounds, azanaphthoquinone compounds, porphyrin compounds, azaporphyrin compounds, pyrrole methylene compounds, quinacridone compounds, pyrrolopyrrole dione compounds, indigo compounds, acridine compounds, acryl compounds , Methylimine compound, aniline compound, quinacridone compound, quinophthalone compound, quinone imine compound, iridium complex Dyes and other complexes can be used in combination.

作為顏料,可使用無機顏料或有機顏料,例如可使用:亞硝基化合物、硝基化合物、偶氮化合物、重氮化合物、化合物、喹啉化合物、蒽醌化合物、香豆素化合物、酞菁化合物、異吲哚啉酮化合物、異吲哚啉化合物、喹吖啶酮化合物、蒽締蒽酮化合物、芘化合物、苝化合物、吡咯并吡咯二酮化合物、硫靛藍化合物、二㗁化合物、三苯基甲烷化合物、喹酞酮化合物、萘四羧酸;偶氮染料、花青染料之金屬錯合物;色澱顏料;藉由爐法、導槽法、熱法獲得之碳黑、或乙炔黑、科琴黑或燈黑等碳黑;以環氧樹脂調整、被覆上述碳黑而成者、預先藉由樹脂於溶劑中對上述碳黑進行分散處理並使其吸附20~200 mg/g之樹脂而成者、對上述碳黑進行酸性或鹼性表面處理而成者、平均粒徑為8 nm以上且DBP(Dibutyl phthalate,鄰苯二甲酸二丁酯)吸油量為90 ml/100 g以下者、由950℃下之揮發成分中之CO、CO2 算出之總氧量相對於碳黑之表面積100 m2 為9 mg以上者;石墨、石墨化碳黑、活性碳、碳纖維、碳奈米管、螺旋碳纖維、碳奈米角、碳氣凝膠、富勒烯;苯胺黑、顏料黑7、鈦黑;疏水性樹脂、氧化鉻綠、米洛麗藍、鈷綠、鈷藍、錳系、亞鐵氰化物、磷酸鹽群青、鐵藍、群青、天藍、濃綠、翡翠綠、硫酸鉛、黃丹、鋅黃、鐵丹(紅色氧化鐵(III))、鎘紅、合成鐵黑、棕土等無機含量或有機顏料。該等顏料可單獨使用,或可混合複數種使用。As the pigment, an inorganic pigment or an organic pigment can be used, and for example, a nitroso compound, a nitro compound, an azo compound, a diazo compound, Compounds, quinoline compounds, anthraquinone compounds, coumarin compounds, phthalocyanine compounds, isoindolinone compounds, isoindolin compounds, quinacridone compounds, anthracene compounds, fluorene compounds, hydrazone compounds, Pyrrolopyrrole dione compound, thioindigo compound, dihydrazone compound, triphenylmethane compound, quinophthalone compound, naphthalene tetracarboxylic acid; metal complex of azo dye and cyanine dye; lake pigment; by Carbon black obtained by furnace method, channel method, thermal method, or carbon black such as acetylene black, Ketjen black, or lamp black; those prepared by adjusting and covering the carbon black with epoxy resin, and previously Carbon black is prepared by dispersing carbon black and adsorbing 20 to 200 mg / g of resin, or by acid or alkaline surface treatment of the carbon black. The average particle diameter is 8 nm or more and DBP (Dibutyl phthalate, Dibutyl phthalate) Oil absorption is 90 ml / 100 g or less, and the total oxygen amount calculated from CO and CO 2 in volatile components at 950 ° C is 9 mg or more relative to the surface area of carbon black 100 m 2 ; Graphite, graphitized carbon black, activated carbon, Carbon fiber, carbon nano tube, spiral carbon fiber, carbon nano angle, carbon aerogel, fullerene; aniline black, pigment black 7, titanium black; hydrophobic resin, chrome oxide green, milori blue, cobalt green, Cobalt Blue, Manganese, Ferrocyanide, Phosphate Ultramarine, Iron Blue, Ultramarine, Sky Blue, Dark Green, Emerald Green, Lead Sulfate, Yellow Dan, Zinc Yellow, Iron Dan (Red Iron (III) Oxide), Cadmium Red , Synthetic iron black, brown earth and other inorganic content or organic pigments. These pigments may be used singly or in combination.

作為上述無機顏料或有機顏料,可使用市售之顏料,例如可列舉:顏料紅1、2、3、9、10、14、17、22、23、31、38、41、48、49、88、90、97、112、119、122、123、144、149、166、168、169、170、171、177、179、180、184、185、192、200、202、209、215、216、217、220、223、224、226、227、228、240、254;顏料橙13、31、34、36、38、43、46、48、49、51、52、55、59、60、61、62、64、65、71;顏料黃1、3、12、13、14、16、17、20、24、55、60、73、81、83、86、93、95、97、98、100、109、110、113、114、117、120、125、126、127、129、137、138、139、147、148、150、151、152、153、154、166、168、175、180、185;顏料綠7、10、36;顏料藍15、15:1、15:2、15:3、15:4、15:5、15:6、22、24、56、60、61、62、64;顏料紫1、19、23、27、29、30、32、37、40、50等。As the inorganic pigment or organic pigment, a commercially available pigment can be used, and examples thereof include pigment red 1, 2, 3, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48, 49, and 88. , 90, 97, 112, 119, 122, 123, 144, 149, 166, 168, 169, 170, 171, 177, 179, 180, 184, 185, 192, 200, 202, 209, 215, 216, 217 , 220, 223, 224, 226, 227, 228, 240, 254; Pigment Orange 13, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62 , 64, 65, 71; Pigment Yellow 1, 3, 12, 13, 14, 16, 17, 20, 24, 55, 60, 73, 81, 83, 86, 93, 95, 97, 98, 100, 109 , 110, 113, 114, 117, 120, 125, 126, 127, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 166, 168, 175, 180, 185; pigments Green 7, 10, 36; Pigment Blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 5, 15: 6, 22, 24, 56, 60, 61, 62, 64; pigments Purple 1, 19, 23, 27, 29, 30, 32, 37, 40, 50 and so on.

作為上述著色劑之含量,可設為相對於組合物之固形物成分100質量份為0.01質量份以上且50質量份以下。
作為上述著色劑之含量,可設為於組合物100質量份中為0.01質量份以上且20質量份以下。
Content of the said coloring agent can be 0.01 mass part or more and 50 mass parts or less with respect to 100 mass parts of solid components of a composition.
The content of the colorant may be 0.01 to 20 parts by mass in 100 parts by mass of the composition.

(b)溶劑
作為上述溶劑,只要為可溶解或分散上述各成分者即可,例如可列舉:甲基乙基酮、甲基戊基酮、二乙基酮、丙酮、甲基異丙基酮、甲基異丁基酮、環己酮、2-庚酮等酮類;乙醚、二㗁烷、四氫呋喃、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷、二丙二醇二甲醚等醚系溶劑;乙酸甲酯、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸環己酯、乳酸乙酯、丁二酸二甲酯、TEXANOL等酯系溶劑;乙二醇單甲醚、乙二醇單乙醚等溶纖劑系溶劑;甲醇、乙醇、異或正丙醇、異或正丁醇、戊醇、二丙酮醇等醇系溶劑;乙二醇乙酸單甲酯、乙二醇乙酸單乙酯、丙二醇-1-單甲醚-2-乙酸酯(PGMEA)、二丙二醇單甲醚乙酸酯、乙酸3-甲氧基丁酯、丙酸乙氧基乙酯、1-第三丁氧基-2-丙醇、乙酸3-甲氧基丁酯、環己醇乙酸酯等醚酯系溶劑;苯、甲苯、二甲苯等BTX(Benzene-Toluene-Xylene,苯-甲苯-二甲苯)系溶劑;己烷、庚烷、辛烷、環己烷等脂肪族烴系溶劑;松節油、D-檸檬烯、蒎烯等萜烯系烴油;礦油精、Swasol#310(Cosmo Matsuyama Oil股份有限公司)、Solvesso#100(Exxon Chemical股份有限公司)等石蠟系溶劑;四氯化碳、氯仿、三氯乙烯、二氯甲烷、1,2-二氯乙烷等鹵化脂肪族烴系溶劑;氯苯等鹵化芳香族烴系溶劑;卡必醇系溶劑、苯胺、三乙基胺、吡啶、乙酸、乙腈、二硫化碳、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮、二甲基亞碸、水等,該等溶劑可以1種或2種以上之混合溶劑之形式使用。
作為上述溶劑之含量,根據上述組合物之用途等而有所不同,於組合物100質量份中,可設為1質量份以上且99質量份以下,較佳為10質量份以上且70質量份以下。其原因在於:容易製成塗佈性等優異者。
(b) Solvent The solvent may be any solvent that can dissolve or disperse the above components. Examples include methyl ethyl ketone, methyl amyl ketone, diethyl ketone, acetone, and methyl isopropyl ketone. , Ketones such as methyl isobutyl ketone, cyclohexanone, 2-heptanone; ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane, Ether solvents such as dipropylene glycol dimethyl ether; methyl acetate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, cyclohexyl acetate, ethyl lactate, dimethyl succinate, TEXANOL Ester-based solvents; Cellulolytic solvents such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Alcohol solvents such as methanol, ethanol, iso-or-propanol, iso-or-butanol, pentanol, and diacetone alcohol ; Ethylene glycol monomethyl acetate, ethylene glycol monoethyl acetate, propylene glycol-1-monomethyl ether-2-acetate (PGMEA), dipropylene glycol monomethyl ether acetate, 3-methoxybutyl acetate Ester solvents such as esters, ethoxyethyl propionate, 1-third butoxy-2-propanol, 3-methoxybutyl acetate, cyclohexanol acetate; benzene, toluene, xylene Waiting for BTX (Benzene-Toluene -Xylene, benzene-toluene-xylene) series solvents; aliphatic hydrocarbon solvents such as hexane, heptane, octane, cyclohexane; terpene hydrocarbon oils such as turpentine, D-limonene, and pinene; mineral spirits , Swasol # 310 (Cosmo Matsuyama Oil Co., Ltd.), Solvesso # 100 (Exxon Chemical Co., Ltd.) and other paraffin-based solvents; carbon tetrachloride, chloroform, trichloroethylene, dichloromethane, 1,2-dichloroethyl Halogenated aliphatic hydrocarbon solvents such as alkane; halogenated aromatic hydrocarbon solvents such as chlorobenzene; carbitol solvents, aniline, triethylamine, pyridine, acetic acid, acetonitrile, carbon disulfide, N, N-dimethylformamide , N, N-dimethylacetamidamine, N-methylpyrrolidone, dimethylsulfinium, water, etc. These solvents can be used in the form of one or two or more mixed solvents.
The content of the solvent varies depending on the use of the composition, etc., and it can be 1 part by mass or more and 99 parts by mass or less, preferably 10 parts by mass or more and 70 parts by mass in 100 parts by mass of the composition the following. The reason is that it is easy to make it excellent in coating properties and the like.

(c)鏈轉移劑及增感劑
作為上述鏈轉移劑、增感劑,可設為可調整組合物之感度等者,通常使用含硫原子之化合物。例如可列舉:硫代乙醇酸、硫代蘋果酸、硫代水楊酸、2-巰基丙酸、3-巰基丙酸、3-巰基丁酸、N-(2-巰基丙醯基)甘胺酸、2-巰基菸鹼酸、3-[N-(2-巰基乙基)胺甲醯基]丙酸、3-[N-(2-巰基乙基)胺基]丙酸、N-(3-巰基丙醯基)丙胺酸、2-巰基乙磺酸、3-巰基丙磺酸、4-巰基丁磺酸、十二烷基(4-甲硫基)苯基醚、2-巰基乙醇、3-巰基-1,2-丙二醇、1-巰基-2-丙醇、3-巰基-2-丁醇、巰基苯酚、2-巰基乙基胺、2-巰基咪唑、2-巰基苯并咪唑、2-巰基-3-吡啶醇、2-巰基苯并噻唑、巰基乙酸、三羥甲基丙烷三(3-巰基丙酸酯)、季戊四醇四(3-巰基丙酸酯)等巰基化合物、將該巰基化合物氧化所獲得之二硫醚化合物、碘乙酸、碘丙酸、2-碘乙醇、2-碘乙磺酸、3-碘丙磺酸等碘化烷基化合物、三羥甲基丙烷三(3-巰基異丁酸酯)、丁二醇雙(3-巰基異丁酸酯)、己二硫醇、癸二硫醇、1,4-二甲基巰基苯、丁二醇雙硫代丙酸酯、丁二醇雙硫代乙醇酸酯、乙二醇雙硫代乙醇酸酯、三羥甲基丙烷三硫代乙醇酸酯、丁二醇雙硫代丙酸酯、三羥甲基丙烷三硫代丙酸酯、三羥甲基丙烷三硫代乙醇酸酯、季戊四醇四硫代丙酸酯、季戊四醇四硫代乙醇酸酯、三羥乙基三硫代丙酸酯、下述化合物No.C1、三巰基丙酸三(2-羥基乙基)異氰脲酸酯等脂肪族多官能硫醇化合物、昭和電工公司製造之Karenz MT BD1、PE1、NR1 等。
(c) Chain transfer agent and sensitizer As the above-mentioned chain transfer agent and sensitizer, the sensitivity of the composition can be adjusted, and a compound containing a sulfur atom is usually used. Examples include: thioglycolic acid, thiomalic acid, thiosalicylic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, 3-mercaptobutyric acid, N- (2-mercaptopropionyl) glycine Acid, 2-mercaptonicotinic acid, 3- [N- (2-mercaptoethyl) aminomethane] propionic acid, 3- [N- (2-mercaptoethyl) amino] propionic acid, N- ( 3-mercaptopropionyl) alanine, 2-mercaptoethanesulfonic acid, 3-mercaptopropanesulfonic acid, 4-mercaptobutanesulfonic acid, dodecyl (4-methylthio) phenyl ether, 2-mercaptoethanol , 3-mercapto-1,2-propanediol, 1-mercapto-2-propanol, 3-mercapto-2-butanol, mercaptophenol, 2-mercaptoethylamine, 2-mercaptoimidazole, 2-mercaptobenzimidazole Mercapto compounds such as 2-mercapto-3-pyridinol, 2-mercaptobenzothiazole, thioglycolic acid, trimethylolpropane tris (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptopropionate), etc. Disulfide compounds obtained by oxidation of the mercapto compound, iodoacetic acid, iodopropionic acid, 2-iodoethanol, 2-iodoethanesulfonic acid, 3-iodopropanesulfonic acid and other iodinated alkyl compounds, trimethylolpropanetriol (3-mercaptoisobutyrate), butanediol bis (3-mercaptoisobutyrate), hexanedithiol, sebacylthiol, 1,4-dimethylmercaptobenzene, butane Alcohol dithiopropionate, butanediol dithioglycolate, ethylene glycol dithioglycolate, trimethylolpropane trithioglycolate, butanediol dithiopropionate, Trimethylolpropane trithiopropionate, trimethylolpropane trithioglycolate, pentaerythritol tetrathiopropionate, pentaerythritol tetrathioglycolate, trihydroxyethyl trithiopropionate And the following compound No. C1, aliphatic polyfunctional thiol compounds such as trimercaptopropionic acid tris (2-hydroxyethyl) isocyanurate, Karenz MT BD1, PE1, NR 1 and the like manufactured by Showa Denko Corporation.

[化29]
[Chemical 29]

(d)界面活性劑
作為上述界面活性劑,可使用能夠改善組合物之分散穩定性、塗敷性等者,可使用:全氟烷基磷酸酯、全氟烷基羧酸鹽等氟界面活性劑;高級脂肪酸鹼金屬鹽、烷基磺酸鹽、烷基硫酸鹽等陰離子系界面活性劑;高級胺鹵酸鹽、四級銨鹽等陽離子系界面活性劑;聚乙二醇烷基醚、聚乙二醇脂肪酸酯、山梨醇酐脂肪酸酯、脂肪酸單甘油酯等非離子界面活性劑;兩性界面活性劑;聚矽氧系界面活性劑等界面活性劑,該等可組合使用。
(d) Surfactants As the surfactants mentioned above, those which can improve the dispersion stability and coating properties of the composition can be used. Fluorine interfacial activities such as perfluoroalkyl phosphate and perfluoroalkyl carboxylate can be used. Agents; anionic surfactants such as higher fatty acid alkali metal salts, alkyl sulfonates, alkyl sulfates; cationic surfactants such as higher amine halide salts, quaternary ammonium salts; polyethylene glycol alkyl ethers , Polyethylene glycol fatty acid esters, sorbitan fatty acid esters, fatty acid monoglycerides and other non-ionic surfactants; amphoteric surfactants; polysiloxane surfactants and other surfactants, these can be used in combination.

(e)矽烷偶合劑
作為上述矽烷偶合劑,為具有與玻璃等無機材料進行化學結合之反應基及與合成樹脂等有機材料進行化學結合之反應基之矽烷化合物,可使用能夠改善組合物或其硬化物之密接性等者。作為矽烷偶合劑,例如可使用信越化學公司製造之矽烷偶合劑,其中,可適宜地使用KBE-9007、KBM-502、KBE-403等具有異氰酸酯基、甲基丙烯醯基、環氧基之矽烷偶合劑。
(e) Silane coupling agent As the above-mentioned silane coupling agent, a silane compound having a reactive group chemically bonded to an inorganic material such as glass and a reactive group chemically bonded to an organic material such as a synthetic resin can be used to improve the composition or Adhesiveness of hardened materials, etc. As the silane coupling agent, for example, a silane coupling agent manufactured by Shin-Etsu Chemical Co., Ltd. can be suitably used. Among them, silanes having isocyanate groups, methacryl groups, and epoxy groups such as KBE-9007, KBM-502, and KBE-403 can be suitably used. Coupling agent.

(f)三聚氰胺化合物
作為上述三聚氰胺化合物,可使用能夠改善硬化性者,例如可列舉:(聚)羥甲基三聚氰胺、(聚)羥甲基甘脲、(聚)羥甲基苯并胍胺、(聚)羥甲基脲等氮化合物中之活性羥甲基(CH2 OH基)之全部或一部分(至少2個)經烷基醚化而成之化合物。此處,作為構成烷基醚之烷基,可列舉甲基、乙基或丁基,有互相相同之情形,有互不相同之情形。又,未經烷基醚化之羥甲基可於一分子內進行自縮合,亦可於二分子間縮合,結果形成低聚物成分。具體而言,可使用六甲氧基甲基三聚氰胺、六丁氧基甲基三聚氰胺、四甲氧基甲基甘脲、四丁氧基甲基甘脲等。該等中,較佳為六甲氧基甲基三聚氰胺、六丁氧基甲基三聚氰胺等經烷基醚化之三聚氰胺。
(f) Melamine compound As the melamine compound, those which can improve the hardening property can be used, and examples thereof include (poly) methylol melamine, (poly) methylol glycoluril, (poly) methylol benzoguanamine, A compound in which all or a part (at least 2) of active methylol groups (CH 2 OH groups) in nitrogen compounds such as (poly) methylol urea are alkylated. Here, as an alkyl group which comprises an alkyl ether, a methyl group, an ethyl group, or a butyl group is mentioned, and may be mutually the same, and may be mutually different. In addition, the methylol group which is not alkyl etherified may be self-condensed in one molecule or may be condensed between two molecules, resulting in the formation of an oligomer component. Specifically, hexamethoxymethylmelamine, hexabutoxymethylmelamine, tetramethoxymethylglycol urea, tetrabutoxymethylglycol urea, and the like can be used. Among these, alkyl melamines such as hexamethoxymethylmelamine and hexabutoxymethylmelamine are preferred.

3.組合物
作為上述組合物之黏度,例如就設為具有塗敷性者之觀點而言,例如可設為200 mPa・s以下,可設為1 mPa・s以上且200 mPa・s以下。其原因在於:上述組合物之塗敷性優異。
上述黏度係指依照JIS Z 8803:2011,使用旋轉式黏度計(例如,Anton Paar公司製造,Physica MCR3 01等)所測定之值。又,本說明書中未特別指定溫度之處理、測定可於25℃下進行。
3. The viscosity of the composition as the composition may be, for example, from the viewpoint of having a coating property, for example, 200 mPa · s or less, and 1 mPa · s or more and 200 mPa · s or less. The reason is that the above-mentioned composition is excellent in coatability.
The above-mentioned viscosity refers to a value measured using a rotary viscometer (for example, manufactured by Anton Paar, Physica MCR 3 01, etc.) in accordance with JIS Z 8803: 2011. In addition, in this specification, processing and measurement which do not specifically specify temperature can be performed at 25 degreeC.

上述組合物之製造方法只要為能夠以所需之含量調配上述各成分之方法即可,可為同時添加上述各成分並加以混合之方法,亦可為一面依序添加各成分一面進行混合之方法。The method for producing the composition may be a method capable of formulating the above-mentioned components in a desired content, and may be a method of adding the above-mentioned components and mixing them simultaneously, or a method of mixing the components while sequentially adding the components. .

關於上述組合物之用途,可用於:熱硬化性塗料、光硬化性塗料或清漆;熱硬化性接著劑、光硬化性接著劑;印刷基板;或彩色電視、PC(Personal Computer,個人電腦)監視器、攜帶型資訊終端、數位相機等彩色顯示之液晶顯示面板中之彩色濾光片;CCD(Charge Coupled Device,電荷耦合元件)影像感測器之彩色濾光片;感光性間隔件、黑色柱狀間隔件;電漿顯示面板用之電極材料;觸控面板;觸控感測器;粉末塗覆;印刷油墨;印刷版;接著劑;牙科用組合物;光造形用樹脂;凝膠塗覆;電子工程學用之光阻劑;電鍍阻劑;蝕刻阻劑;液狀及乾燥膜之兩者;焊接阻劑;用以製造各種顯示用途用之彩色濾光片或電漿顯示面板、電氣發光顯示裝置、及LCD(liquid crystal display,液晶顯示裝置)之製造步驟中用以形成結構之抗蝕劑;用以封裝電氣及電子零件之組合物;阻焊劑;磁記錄材料;微機械零件;波導;光開關;鍍覆用遮罩;蝕刻遮罩;彩色試驗系統;玻璃纖維電纜塗覆;網版印刷用模板;用以藉由立體光刻製造立體物體之材料;全像記錄用材料;圖像記錄材料;微細電子電路;脫色材料;用於圖像記錄材料之脫色材料;使用微膠囊之圖像記錄材料用之脫色材料;印刷配線板用光阻材料;UV(Ultra Violet,紫外線)及可見光雷射直接圖像系統用之光阻材料;形成印刷電路基板之逐次積層中之介電層所使用之光阻材料;3D安裝用光阻材料或保護膜等各種用途,其用途並無特別限制。
又,作為上述用途,並不限定於作為製品使用時等要求針對紫外線之耐久性之用途,例如亦可適宜地用於製造過程中受到紫外線照射等之構件。
作為製造過程中受到紫外線照射等之構件,例如可列舉為了提高表面之潤濕性、提高密接性等謀求表面改質而受到紫外線等之照射之構件。
作為上述要求提高潤濕性、提高密接性等之構件,可列舉與其他構件積層之構件,例如可列舉作為構成電漿顯示面板、有機電致發光顯示裝置、液晶顯示裝置等各種圖像顯示器、觸控面板等各種感測器、電路基板等之構件的彩色濾光片、感光性間隔件、亮度提高板、導光板、TFT(thin-film transistor,薄膜電晶體)基板、配向膜、液晶層、絕緣膜、揚聲器等聲頻元件、拍攝用透鏡、鍵盤、HDD(hard disk drive,硬磁碟驅動機)用磁頭等製造過程中要求表面改質或構件之防劣化之構件。
作為上述製造過程中要求表面改質或構件之防劣化之構件,亦可列舉經由接著劑與其他構件積層之構件、藉由塗料等而被其他構件被覆之構件,例如亦可列舉汽車、飛機之內外裝構件等運輸機器、冰箱、洗衣機等家電製品、住宅建材等各種用途之構成構件。
又,於在基材上形成圖案狀之構件後,存在為了進行所露出之基材之表面改質等,而對基材以及上述構件一併實施紫外線照射等之情形。作為上述用途,亦可較佳地用於與此種製造過程中要求表面改質等之構件所一併使用之構件。作為上述用途,例如可列舉與塑膠膜或玻璃、矽晶圓、各種工程塑膠、光學透鏡、金屬表面、鍍覆、陶瓷、模具等要求表面洗淨或表面改質等之構件所一併使用之構件。
Regarding the use of the above composition, it can be used for: thermosetting coatings, photocuring coatings or varnishes; thermosetting adhesives, photocuring adhesives; printed substrates; or color televisions or PC (Personal Computer) monitoring Filters in liquid crystal display panels for color displays such as cameras, portable information terminals, digital cameras, etc .; color filters for CCD (Charge Coupled Device) image sensors; photosensitive spacers, black columns Spacers; electrode materials for plasma display panels; touch panels; touch sensors; powder coating; printing inks; printing plates; adhesives; dental compositions; photoforming resins; gel coating Photoresist for electronic engineering; electroplating resist; etching resist; both liquid and dry film; solder resist; color filters or plasma display panels for various display applications, electrical Light-emitting display device and LCD (liquid crystal display, liquid crystal display) manufacturing steps for forming a structure resist; a composition for packaging electrical and electronic parts; solder resist Magnetic recording materials; micromechanical parts; waveguides; optical switches; masks for plating; etching masks; color test systems; glass fiber cable coating; stencils for screen printing; Materials for Holographic Recording; Image Recording Materials; Microelectronic Circuits; Decoloring Materials; Decolorizing Materials for Image Recording Materials; Decolorizing Materials for Image Recording Materials Using Microcapsules; Photoresist for Printed Wiring Boards Materials; UV (Ultra Violet, ultraviolet) and visible light laser direct imaging system photoresistive materials; forming a printed circuit board in the successive layers of the dielectric layer used in photoresistive materials; 3D installation of photoresistive materials or protection There are no particular restrictions on the various uses such as films.
In addition, the use described above is not limited to applications requiring durability against ultraviolet rays, such as when used as a product, and may be suitably used for members that are exposed to ultraviolet rays or the like during the manufacturing process, for example.
Examples of members that are exposed to ultraviolet rays during the manufacturing process include members that are exposed to ultraviolet rays and the like in order to improve the surface wettability and improve the adhesion, for example, in order to improve the surface.
Examples of the components that require the improvement of wettability and adhesiveness include components that are laminated with other components. Examples of the components include plasma display panels, organic electroluminescence display devices, and liquid crystal display devices. Color filters, components for various sensors such as touch panels, circuit boards, photosensitive spacers, brightness enhancement boards, light guide plates, thin-film transistor (thin-film transistor) substrates, alignment films, and liquid crystal layers Audio components such as insulating films, speakers, photographic lenses, keyboards, magnetic heads for hard disk drives (hard disk drive), and other components that require surface modification or anti-deterioration during the manufacturing process.
Examples of components that require surface modification or deterioration prevention of the components in the above manufacturing process include components that are laminated with other components through an adhesive, and components that are covered with other components by coatings, for example, automobiles and aircraft. Internal and external components such as transportation equipment, refrigerators, washing machines and other household electrical appliances, residential building materials and other structural components.
In addition, after a pattern-shaped member is formed on the substrate, in order to modify the surface of the exposed substrate, etc., the substrate and the member may be collectively subjected to ultraviolet irradiation or the like. As the above-mentioned application, it can also be preferably used for a component used together with a component that requires surface modification or the like in such a manufacturing process. As the above application, for example, it can be used together with plastic film or glass, silicon wafers, various engineering plastics, optical lenses, metal surfaces, plating, ceramics, molds and other components that require surface cleaning or surface modification. member.

D.硬化物
繼而,對本發明之硬化物進行說明。
本發明之硬化物係含有本發明之化合物I-1與聚合性化合物之組合物之硬化物。
D. Hardened Product Next, the hardened product of the present invention will be described.
The hardened | cured material of this invention is a hardened | cured material containing the composition of the compound I-1 of this invention and a polymerizable compound.

本發明之組合物由於使用上述組合物,因此具有良好之紫外線吸收功能等。Since the composition of this invention uses the said composition, it has a good ultraviolet absorption function etc.

本發明之硬化物係使用上述組合物者。
以下,對本發明之硬化物進行詳細說明。
The hardened | cured material of this invention uses the said composition.
Hereinafter, the hardened | cured material of this invention is demonstrated in detail.

上述組合物係含有上述化合物I-1與聚合性化合物者。又,上述組合物亦可含有上述化合物I-1及聚合性化合物以外之成分。
關於此種組合物之各成分之內容,可設為與上述「C.組合物」之「2.其他成分」之項所記載之內容相同。
The said composition is a thing containing the said compound I-1 and a polymerizable compound. Moreover, the said composition may contain components other than the said compound I-1 and a polymerizable compound.
The content of each component of such a composition may be the same as that described in the item "2. Other components" of the above-mentioned "C. Composition".

上述組合物所含之上述化合物I-1於硬化物中,可為光脫離基B脫離前,亦可為脫離後,較佳為脫離後。其原因在於:上述硬化物成為具有優異之紫外線吸收功能者。The compound I-1 contained in the composition may be before the photo-release group B is detached in the hardened material, or may be after the detachment, preferably after detachment. The reason for this is that the above-mentioned hardened material has an excellent ultraviolet absorbing function.

上述硬化物通常含有聚合性化合物之聚合物。
作為上述硬化物所含之聚合性化合物之殘存量,可根據硬化物之用途等而適當設定,例如於硬化物100質量份中,為10質量份以下,較佳為1質量份以下。
The cured product usually contains a polymer of a polymerizable compound.
The remaining amount of the polymerizable compound contained in the hardened material can be appropriately set according to the application of the hardened material, and is, for example, 10 parts by mass or less, and preferably 1 part by mass or less, based on 100 parts by mass of the hardened substance.

作為上述硬化物,可設為實質上不含溶劑者。
作為上述硬化物所含之溶劑之含量,例如於硬化物100質量份中,可設為1質量份以下,可設為0.5質量份以下。
As said hardened | cured material, the thing which does not contain a solvent substantially can be used.
The content of the solvent contained in the hardened product may be, for example, 1 part by mass or less and may be 0.5 part by mass or less in 100 parts by mass of the hardened product.

上述硬化物之彈性模數通常高於上述組合物,例如可設為10-3 M以上,可設為10 MPa以上。其原因在於:藉由為上述彈性模數,上述硬化物可穩定地保持化合物I-1等。
關於上述彈性模數之上限,可根據硬化物之用途等而適當設定,例如可設為106 MPa以下。
再者,以下,彈性模數係指壓縮彈性模數,可依照JIS K7181,於23℃下進行測定。
關於測定樣品,例如可製作或切下一邊之長度為6 mm之立方體之試片,依照JIS K7181,於試驗速度1±0.2 mm/min之條件下測定。
The elastic modulus of the hardened material is usually higher than the composition, and it can be set to, for example, 10 -3 M or more and 10 MPa or more. The reason is that, by being the elastic modulus, the cured product can stably hold Compound I-1 and the like.
The upper limit of the above-mentioned elastic modulus can be appropriately set according to the use of the cured product, and can be, for example, 10 6 MPa or less.
In the following, the elastic modulus refers to a compressive elastic modulus, and can be measured at 23 ° C. in accordance with JIS K7181.
As for the measurement sample, for example, a cube test piece with a length of 6 mm on one side can be made or cut out, and measured under the condition of a test speed of 1 ± 0.2 mm / min in accordance with JIS K7181.

作為上述硬化物之製造方法,只要為可使上述組合物硬化之方法即可,例如可設為與下文所述之「F.硬化物之製造方法」之項所記載之方法相同。The manufacturing method of the said hardened | cured material may just be a method which hardens the said composition, For example, it can be set as the method described in the item of "F. hardened | cured material manufacturing method" mentioned later.

關於上述硬化物之用途等,可設為與上述「C.組合物」之項所記載之內容相同。Regarding the use and the like of the cured product, the content described in the item of "C. Composition" may be the same.

E.組合物
繼而,對本發明之第2組合物進行說明。
本發明之第2組合物之特徵在於包含下述通式(I-2)所表示之化合物(以下有時稱為「化合物I-2」)與源自光脫離基之脫離物(以下有時稱為「化合物B'」)。
E. Composition Next, the second composition of the present invention will be described.
The second composition of the present invention is characterized by comprising a compound represented by the following general formula (I-2) (hereinafter sometimes referred to as "compound I-2") and a release substance derived from a photo-release group (hereinafter sometimes referred to as "compound I-2"). Called "Compound B '").

[化30]
[Chemical 30]

(式中,A係具有紫外線吸收功能之原子團,k表示1~10之整數)(In the formula, A is an atomic group having an ultraviolet absorption function, and k represents an integer of 1 to 10)

根據本發明,上述第2組合物例如可使用上述組合物而容易地形成。又,上述第2組合物可容易地賦予紫外線吸收功能等。According to this invention, the said 2nd composition can be easily formed using the said composition, for example. Moreover, the said 2nd composition can provide an ultraviolet absorption function etc. easily.

本發明之第2組合物含有化合物I-2及化合物B'。
以下,對本發明之第2組合物進行詳細說明。
The second composition of the present invention contains Compound I-2 and Compound B '.
Hereinafter, the second composition of the present invention will be described in detail.

1.化合物I-2
上述化合物I-2係發揮紫外線吸收功能者。
上述化合物I-2係上述化合物I-1中之上述B-O-被取代為-OH基者。
關於此種化合物I-1之內容,可設為與上述「A.化合物」之項所記載之內容相同,因此此處省略說明。
1. Compound I-2
The above-mentioned compound I-2 is a person exhibiting an ultraviolet absorbing function.
The compound I-2 is a compound in which the BO- in the compound I-1 is substituted with an -OH group.
The content of such a compound I-1 may be the same as that described in the above-mentioned "A. Compound", so the description is omitted here.

作為上述化合物I-2於組合物中之含量,只要可賦予所需之紫外線吸收功能等即可,例如化合物I-2及化合物B'之合計可設為與上述「C.組合物」之項所記載之上述化合物I-1之固形物成分中之含量相同。As the content of the compound I-2 in the composition, it is sufficient as long as it can provide a desired ultraviolet absorption function. For example, the total of the compound I-2 and the compound B 'can be set as the item of the "C. composition" The contents of the solid components of the compound I-1 described above are the same.

2.化合物B'
上述化合物B'係源自光脫離基之脫離物。
又,光脫離基只要為可作為保護基而鍵結於酚性羥基之基即可,可設為與上述「A.化合物」之「1.光脫離基B」所記載之內容相同。
作為此種化合物B',只要為上述光脫離基自酚性羥基脫離後可採用者即可。
再者,自酚性羥基脫離後之光脫離基B通常反應性較高,可採用各種結構。
作為上述化合物B',於光脫離基B為上述通式(B-1-a)、(B-2)、(B-3)、(B-4)、(B-5)、(B-6)、(B-7)等所表示者之情形時,例如可分別含有下述通式(B-111-a)、(B-112)、(B-113)、(B-114)、(B-115)、(B-116)、(B-117)所表示之化合物等。
2. Compound B '
The above-mentioned compound B 'is a detachment derived from a photo-release group.
The photo-leaving group may be a group capable of binding to a phenolic hydroxyl group as a protective group, and may be the same as described in "1. Photo-Leaving Group B" of the "A. Compound".
As such a compound B ', any one can be used as long as the photo-releasing group is removed from the phenolic hydroxyl group.
In addition, the photo-releasing group B after detachment from a phenolic hydroxyl group is generally highly reactive, and various structures can be adopted.
As the compound B ′, the photo-releasing group B is the general formula (B-1-a), (B-2), (B-3), (B-4), (B-5), (B- 6), (B-7), etc., for example, the following general formulae (B-111-a), (B-112), (B-113), (B-114), Compounds represented by (B-115), (B-116), (B-117), and the like.

[化31]
[Chemical 31]

關於上述化合物B'所含之R11 、R12 、R13 、R14 、R15 、R16 、R17 、R18 、R19 、R20 、R21 、R22 、R23 、R24 、R25 、R26 及R27 及b1、b2、b3、b4、b5、b6、b7及b8,與上述「A.化合物」之項所記載之內容相同,因此此處省略說明。Regarding R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 , R 22 , R 23 , R 24 , R 25 , R 26, and R 27 and b1, b2, b3, b4, b5, b6, b7, and b8 are the same as those described in the item "A. Compound" above, and therefore descriptions are omitted here.

上述化合物B'之種類可僅為1種,亦可為2種以上之組合。The kind of the compound B ′ may be only one kind, or a combination of two or more kinds.

3.其他
上述第2組合物含有化合物I-2及化合物B',通常含有其他成分。
作為此種其他成分,可列舉上述「C.組合物」之「2.其他成分」之項所記載之內容等。
上述其他成分中,較佳為含有樹脂成分,尤佳為含有聚合性化合物之聚合物等不具有聚合性基之聚合物。其原因在於:上述第2組合物例如可有效地發揮出可對硬化物等容易地賦予紫外線吸收功能等之效果。
再者,樹脂成分之種類可僅為1種,亦可組合2種以上使用。
3. Other said 2nd composition contains the compound I-2 and the compound B ', and usually contains other components.
Examples of such other ingredients include those described in the item "2. Other ingredients" in the above-mentioned "C. Composition".
Among the other components described above, a resin component is preferable, and a polymer having a polymerizable compound, such as a polymer containing a polymerizable compound, is not particularly preferred. The reason is that the second composition described above can effectively exhibit an effect of easily providing an ultraviolet absorbing function or the like to a cured product or the like.
The type of the resin component may be only one, or two or more kinds may be used in combination.

上述第2組合物含有溶劑、聚合性化合物等,可為具有塗敷性者,作為該情形時之黏度,可設為與上述「C.組合物」之項所記載之內容相同。
又,於上述第2組合物為含有聚合性化合物之聚合物之硬化物之情形時,關於上述第2組合物之彈性模數,可設為與上述「D.硬化物」之項所記載之內容相同。
The second composition may include a solvent, a polymerizable compound, and the like, and may have a coating property, and the viscosity in this case may be the same as that described in the item of "C. Composition" above.
When the second composition is a hardened product of a polymer containing a polymerizable compound, the elastic modulus of the second composition may be the same as that described in the item "D. Hardened product". The content is the same.

關於上述第2組合物之用途等,可設為與上述「D.硬化物」之項所記載之內容相同。The use and the like of the second composition can be the same as those described in the item "D. Hardened product".

F.硬化物之製造方法
繼而,對本發明之硬化物之製造方法進行說明。
本發明之硬化物之製造方法包括:使上述包含化合物I-1與聚合性化合物之組合物硬化而形成硬化物之步驟;及對上述硬化物照射光而使上述化合物所含之光脫離基B脫離之步驟。
F. Manufacturing method of hardened | cured material Next, the manufacturing method of hardened | cured material of this invention is demonstrated.
The method for producing a cured product according to the present invention includes: a step of curing the composition containing Compound I-1 and a polymerizable compound to form a cured product; and irradiating the cured product with light to remove light contained in the compound from the group B. Steps to disengage.

根據本發明,上述製造方法藉由使用上述組合物且具有上述步驟,硬化容易,又,可容易地賦予紫外線吸收功能等。According to the present invention, by using the composition and having the above steps, the production method is easy to harden, and can easily provide an ultraviolet absorbing function.

本發明之製造方法包括形成硬化物之步驟及脫離之步驟。
以下,對本發明之製造方法之各步驟進行詳細說明。
The manufacturing method of the present invention includes a step of forming a hardened body and a step of detaching.
Hereinafter, each step of the manufacturing method of this invention is demonstrated in detail.

1.形成硬化物之步驟
上述形成硬化物之步驟係形成上述組合物之硬化物之步驟。
1. Step of Forming a Hardened Body The step of forming a hardened body described above is a step of forming a hardened body of the above composition.

作為本步驟中之形成組合物之硬化物之方法,只要為能夠形成所需硬度之硬化物之方法即可,根據組合物所含之成分而有所不同。
上述硬化方法例如於組合物含有聚合性化合物之同時含有作為聚合起始劑之光聚合起始劑之情形時,可使用對組合物進行光照射而使聚合性化合物彼此聚合之方法。
作為對組合物照射之光,可設為包含波長300 nm~450 nm之光者。
作為上述光照射之光源,例如可列舉:超高壓水銀、水銀蒸汽電弧、碳弧、氙弧等。
作為上述所照射之光,可使用雷射光。作為雷射光,可使用包含波長340~430 nm之光者。
作為雷射光之光源,亦可使用氬離子雷射、氦氖雷射、YAG(Yttrium Aluminum Garnet,釔鋁石榴石)雷射、及半導體雷射等發出可見光至紅外區域之光者。
再者,於使用該等雷射之情形時,上述組合物可含有吸收可見光至紅外之該區域之增感色素。
As the method for forming the hardened material of the composition in this step, any method may be used as long as it can form a hardened material having a desired hardness, and it varies depending on the components contained in the composition.
When the composition contains a polymerizable compound and a photopolymerization initiator as a polymerization initiator, for example, a method of polymerizing the polymerizable compounds by irradiating the composition with light may be used.
The light to be irradiated to the composition may be light containing a wavelength of 300 nm to 450 nm.
Examples of the light source for the light irradiation include ultra-high pressure mercury, mercury vapor arc, carbon arc, xenon arc, and the like.
As the above-mentioned irradiated light, laser light can be used. As the laser light, those having a wavelength of 340 to 430 nm can be used.
As a light source of the laser light, an argon ion laser, a helium-neon laser, a YAG (Yttrium Aluminum Garnet) laser, or a semiconductor laser can be used to emit light from the visible light to the infrared region.
Furthermore, in the case where such lasers are used, the above composition may contain a sensitizing pigment that absorbs visible light to the infrared region.

作為上述所照射之光之合計光量,較佳為可抑制光脫離基B之脫離,例如可設為未達1000 mJ/cm2 ,可設為800 mJ/cm2 以下,可設為500 mJ/cm2 以下。As the total light quantity of the above-mentioned irradiated light, it is preferable to suppress the light from detaching from the radical B. For example, it can be set to less than 1000 mJ / cm 2 , 800 mJ / cm 2 or less, and 500 mJ / cm 2 or less.

上述硬化方法例如於組合物含有聚合性化合物之同時含有作為聚合起始劑之熱聚合起始劑之情形時,可使用對組合物進行加熱處理而使聚合性化合物彼此聚合之方法。
作為加熱溫度,只要可使上述組合物穩定地硬化即可,可設為60℃以上,較佳可設為100℃以上且300℃以下。
再者,加熱溫度可設為組合物之塗膜表面之溫度。
作為加熱時間,可進行10秒~3小時左右。
The above-mentioned curing method can be used, for example, when the composition contains a polymerizable compound and a thermal polymerization initiator as a polymerization initiator, a method in which the polymerizable compounds are polymerized by subjecting the composition to a heat treatment.
The heating temperature may be any temperature as long as the composition can be stably cured, and may be 60 ° C or higher, and preferably 100 ° C or higher and 300 ° C or lower.
In addition, the heating temperature can be set to the temperature of the coating film surface of the composition.
The heating time may be about 10 seconds to 3 hours.

上述硬化方法之種類可僅包括1種,亦可包括2種以上。The types of the above-mentioned hardening methods may include only one type, or may include two or more types.

本步驟所使用之組合物係含有上述化合物I-1與聚合性化合物者。
又,上述組合物可含有上述化合物I-1及聚合性化合物以外之其他成分。
關於此種組合物之各成分之內容,可設為與上述「C.組合物」之「2.其他成分」之項所記載之內容相同,因此此處省略說明。
The composition used in this step is one containing the aforementioned compound I-1 and a polymerizable compound.
The composition may contain components other than the compound I-1 and the polymerizable compound.
The content of each component of such a composition may be the same as that described in the item "2. Other components" of the above-mentioned "C. Composition", and therefore description thereof is omitted here.

2.脫離之步驟
上述脫離之步驟係使上述化合物I-1所含之光脫離基B脫離之步驟。
作為使上述化合物I-1所含之光脫離基B脫離之方法,為對上述硬化物進行光照射之方法即可。
作為對硬化物照射之光及其合計光量,只要可使光脫離基B脫離,則無特別限定,可設為與上述「A.化合物」之「1.光脫離基B」之項所記載之內容相同。
再者,作為光照射之光源,可根據所照射之光之波長而適當選擇,例如可設為與上述「1.形成硬化物之步驟」之項所記載之內容相同。
2. Step of detachment The step of detachment is a step of detaching the light-release group B contained in the compound I-1.
As a method of removing the light-releasing group B contained in the compound I-1, a method of irradiating the cured product with light may be used.
The light to be irradiated to the hardened object and the total amount of light are not particularly limited as long as the light is released from the radical B, and may be the same as described in the item "1. Light-dissociative group B" of the "A. compound" described above. The content is the same.
The light source to be irradiated may be appropriately selected according to the wavelength of the light to be irradiated. For example, the light source may be the same as that described in the item "1. Step of forming a hardened body".

作為本步驟中之硬化物之溫度,可根據硬化物或支持硬化物之基材之耐熱性等而適當設定,例如可設為200℃以下,較佳為0℃以上且150℃以下,其中,較佳為0℃以上且100℃以下。其原因在於:藉由上述溫度為上述範圍,光脫離基B之脫離變得容易。又,其原因在於:其結果為例如可使加熱引起之對硬化物及基材等其周邊構件之損傷較少。
再者,上述硬化物之溫度係硬化物表面之溫度。
The temperature of the hardened material in this step can be appropriately set according to the heat resistance of the hardened material or the base material supporting the hardened material. For example, it can be set to 200 ° C or lower, preferably 0 ° C to 150 ° C. It is preferably 0 ° C or higher and 100 ° C or lower. The reason is that when the temperature is in the above-mentioned range, the detachment of the photo-detachment group B becomes easy. The reason for this is that, as a result, for example, damage to peripheral components such as the hardened material and the substrate due to heating can be reduced.
The temperature of the hardened material is the temperature of the surface of the hardened material.

3.其他步驟
上述製造方法包括形成硬化物之步驟及脫離之步驟,亦可視需要包括其他步驟。
作為上述其他步驟,例如可列舉將上述組合物塗佈於基材上之步驟等。
作為塗佈組合物之方法,可使用旋轉塗佈機、輥式塗佈機、棒式塗佈機、模嘴塗佈機、簾幕式塗佈機、各種印刷、浸漬等公知之方法。
作為上述基材,可根據硬化物之用途等而適當設定,可列舉含有鈉玻璃、石英玻璃、半導體基板、金屬、紙、塑膠等者。
又,上述硬化物於在基材上形成後,可自基材剝離而使用,亦可自基材轉印至其他被接著體使用。
3. Other steps The above manufacturing method includes a step of forming a hardened body and a step of detaching, and other steps may also be included as necessary.
Examples of the other steps include a step of applying the composition to a substrate, and the like.
As a method for applying the composition, a known method such as a spin coater, a roll coater, a bar coater, a die coater, a curtain coater, various printing, and dipping can be used.
The base material can be appropriately set depending on the application of the cured product, and examples thereof include those containing soda glass, quartz glass, semiconductor substrate, metal, paper, plastic, and the like.
Moreover, after the said hardened | cured material is formed on a base material, it can peel and use from a base material, and can also be used by transferring from a base material to another adherend.

4.其他
關於藉由上述製造方法所製造之硬化物及用途等,可設為與上述「D.硬化物」之項所記載之內容相同。
4. Other hardened materials and applications produced by the above-mentioned manufacturing method may be the same as those described in the above item "D. Hardened materials".

本發明並不限定於上述實施形態。上述實施形態為例示,具有與本發明所記載之技術思想實質上相同之構成、發揮同樣之作用效果者均包含於本發明之技術範圍內。
實施例
The invention is not limited to the embodiments described above. The embodiment described above is an example, and those having substantially the same configuration and exhibiting the same effect as the technical idea described in the present invention are included in the technical scope of the present invention.
Examples

以下,列舉實施例等進一步詳細說明本發明,但本發明並不限定於該等實施例。Hereinafter, the present invention will be described in more detail with examples, but the present invention is not limited to these examples.

[實施例1]
將下述之流程1中之酚化合物(化合物I-2)0.005 mol、碳酸鉀0.005 mol及DMF(dimethylformamide,二甲基甲醯胺)12 g加以混合,於氮氣環境下、室溫下滴加鄰硝基苄基氯0.0075 mol,於80℃下攪拌2小時,藉由下述反應而獲得相當於化合物I-1之化合物I-1-2。於反應液中添加乙酸乙酯50 g、離子交換水50 g進行油水分離。藉由無水硫酸鈉將有機層乾燥後,將溶劑蒸餾去除,藉由甲醇進行晶析。將所獲得之白色固體於45℃下減壓乾燥2小時,而獲得目標物(化合物I-1-2)。所獲得之白色固體為目標物係藉由H-NMR(nuclear magnetic resonance,核磁共振)、IR(infrared ray,紅外線)進行確認。
[Example 1]
0.005 mol of phenol compound (Compound I-2), 0.005 mol of potassium carbonate, and 12 g of DMF (dimethylformamide, dimethylformamide) in the following Scheme 1 were mixed, and added dropwise at room temperature under a nitrogen atmosphere. O-nitrobenzyl chloride was 0.0075 mol, stirred at 80 ° C. for 2 hours, and a compound I-1-2 corresponding to the compound I-1 was obtained by the following reaction. 50 g of ethyl acetate and 50 g of ion-exchanged water were added to the reaction solution, and oil-water separation was performed. After the organic layer was dried with anhydrous sodium sulfate, the solvent was distilled off, and crystallization was performed with methanol. The obtained white solid was dried under reduced pressure at 45 ° C for 2 hours to obtain the target compound (Compound I-1-2). The obtained white solid was identified as a target by H-NMR (nuclear magnetic resonance) and IR (infrared ray).

[化32]
[Chemical 32]

[實施例2~7]
除了變更鄰硝基苄基氯以外,以與實施例1同樣之方式獲得下述化合物I-1-3、I-1-40、I-1-32、I-1-35、I-1-28、I-1-34。具體而言,藉由下述之方法製造實施例2~7之化合物I-1-3、I-1-40、I-1-32、I-1-35、I-1-28及1-34。
又,實施例2~7中獲得之白色固體為目標物係藉由H-NMR進行確認。
[實施例2]
相對於2-乙基硝基苯而使用1.1當量之N-溴代丁二醯亞胺與0.01當量之AIBN(azobisisobutyronitrile,偶氮二異丁腈),於氯苯溶劑中在90℃下加熱攪拌4小時。藉由乙酸乙酯進行油水分離,水洗後藉由二氧化矽管柱加以精製,而獲得苄基溴化合物。使用該苄基溴化合物代替鄰硝基苄基氯,除此以外,以與實施例1同樣之方式獲得化合物I-1-3。所獲得之白色固體為目標物係藉由H-NMR進行確認。
[實施例3]
使用4-氯-2-硝基甲苯代替2-乙基硝基苯,除此以外,以與實施例2同樣之方式獲得化合物I-1-40。所獲得之白色固體為目標物係藉由H-NMR進行確認。
[實施例4]
使用4'-甲氧基苯醯甲基溴代替鄰硝基苄基氯,除此以外,以與實施例1同樣之方式獲得化合物I-1-32。所獲得之白色固體為目標物係藉由H-NMR進行確認。
[實施例5]
使用2-溴-2-苯基苯乙酮代替鄰硝基苄基氯,除此以外,以與實施例1同樣之方式獲得化合物I-1-35。所獲得之白色固體為目標物係藉由H-NMR進行確認。
[實施例6]
使用2-溴-2'-硝基苯乙酮代替鄰硝基苄基氯,除此以外,以與實施例1同樣之方式獲得化合物I-1-28。所獲得之白色固體為目標物係藉由H-NMR進行確認。
[實施例7]
使用4-溴甲基-7-甲氧基香豆素代替鄰硝基苄基氯,除此以外,以與實施例1同樣之方式獲得化合物I-1-34。所獲得之白色固體為目標物係藉由H-NMR進行確認。
[Examples 2 to 7]
The following compounds I-1-3, I-1-40, I-1-32, I-1-35, I-1- were obtained in the same manner as in Example 1 except that o-nitrobenzyl chloride was changed. 28, I-1-34. Specifically, the compounds I-1-3, I-1-40, I-1-32, I-1-35, I-1-28, and 1-1-3 of Examples 2 to 7 were produced by the following method. 34.
In addition, the white solids obtained in Examples 2 to 7 were confirmed by H-NMR as a target substance.
[Example 2]
Relative to 2-ethylnitrobenzene, 1.1 equivalents of N-bromosuccinimide and 0.01 equivalents of AIBN (azobisisobutyronitrile) were used, and the mixture was heated and stirred at 90 ° C in a chlorobenzene solvent. 4 hours. Oil-water separation was performed with ethyl acetate, and after washing with water, it was purified through a silica column to obtain a benzyl bromide compound. Compound I-1-3 was obtained in the same manner as in Example 1 except that the benzyl bromide compound was used instead of o-nitrobenzyl chloride. The obtained white solid was confirmed by H-NMR as a target substance.
[Example 3]
Compound I-1-40 was obtained in the same manner as in Example 2 except that 4-chloro-2-nitrotoluene was used instead of 2-ethylnitrobenzene. The obtained white solid was confirmed by H-NMR as a target substance.
[Example 4]
Compound I-1-32 was obtained in the same manner as in Example 1 except that 4'-methoxybenzyl methyl bromide was used instead of o-nitrobenzyl chloride. The obtained white solid was confirmed by H-NMR as a target substance.
[Example 5]
Compound I-1-35 was obtained in the same manner as in Example 1, except that 2-bromo-2-phenylacetophenone was used instead of o-nitrobenzyl chloride. The obtained white solid was confirmed by H-NMR as a target substance.
[Example 6]
Compound I-1-28 was obtained in the same manner as in Example 1, except that 2-bromo-2'-nitroacetophenone was used instead of o-nitrobenzyl chloride. The obtained white solid was confirmed by H-NMR as a target substance.
[Example 7]
Compound I-1-34 was obtained in the same manner as in Example 1, except that 4-bromomethyl-7-methoxycoumarin was used instead of o-nitrobenzyl chloride. The obtained white solid was confirmed by H-NMR as a target substance.

[化33]
[Chemical 33]

[實施例8]
相對於4-甲氧基-2-硝基甲苯而使用1.1當量之N-溴代丁二醯亞胺與0.01當量之AIBN,於氯苯溶劑中在90℃下加熱攪拌4小時。藉由乙酸乙酯進行油水分離,水洗後藉由二氧化矽管柱加以精製,而獲得相對應之苄基溴化合物。使用該苄基溴化合物代替鄰硝基苄基氯,除此以外,以與實施例1同樣之方式獲得化合物I-1-4。所獲得之白色固體為目標物係藉由H-NMR進行確認。
[實施例9]
使用3-氯-2-硝基甲苯代替4-甲氧基-2-硝基甲苯,除此以外,以與實施例8同樣之方式獲得化合物I-1-41。所獲得之白色固體為目標物係藉由H-NMR進行確認。
[實施例10]
使用3-甲氧基-2-硝基甲苯代替4-甲氧基-2-硝基甲苯,除此以外,以與實施例8同樣之方式獲得化合物I-1-42。所獲得之白色固體為目標物係藉由H-NMR進行確認。
[實施例11]
使用3-甲氧基-2-硝基-6-溴甲苯代替4-甲氧基-2-硝基甲苯,除此以外,以與實施例8同樣之方式獲得化合物I-1-43。所獲得之白色固體為目標物係藉由H-NMR進行確認。
[實施例12]
使用2-溴-2'-甲基苯乙酮代替鄰硝基苄基氯,除此以外,以與實施例1同樣之方式獲得化合物I-1-44。所獲得之白色固體為目標物係藉由H-NMR進行確認。
[Example 8]
With respect to 4-methoxy-2-nitrotoluene, 1.1 equivalents of N-bromosuccinimide and 0.01 equivalents of AIBN were used, and the mixture was heated and stirred at 90 ° C for 4 hours in a chlorobenzene solvent. Oil-water separation was performed with ethyl acetate, and after washing with water, it was purified through a silica column to obtain a corresponding benzyl bromide compound. Compound I-1-4 was obtained in the same manner as in Example 1 except that the benzyl bromide compound was used instead of o-nitrobenzyl chloride. The obtained white solid was confirmed by H-NMR as a target substance.
[Example 9]
Compound I-1-41 was obtained in the same manner as in Example 8 except that 3-chloro-2-nitrotoluene was used instead of 4-methoxy-2-nitrotoluene. The obtained white solid was confirmed by H-NMR as a target substance.
[Example 10]
Compound I-1-42 was obtained in the same manner as in Example 8 except that 3-methoxy-2-nitrotoluene was used instead of 4-methoxy-2-nitrotoluene. The obtained white solid was confirmed by H-NMR as a target substance.
[Example 11]
Compound I-1-43 was obtained in the same manner as in Example 8 except that 3-methoxy-2-nitro-6-bromotoluene was used instead of 4-methoxy-2-nitrotoluene. The obtained white solid was confirmed by H-NMR as a target substance.
[Example 12]
Compound I-1-44 was obtained in the same manner as in Example 1, except that 2-bromo-2'-methylacetophenone was used instead of o-nitrobenzyl chloride. The obtained white solid was confirmed by H-NMR as a target substance.

[實施例13]
使用碳酸4-(2-溴乙醯基)苯酯第三丁酯代替鄰硝基苄基氯,除此以外,以與實施例1同樣之方式獲得中間化合物。將該中間化合物0.0035 mol溶解於乙酸乙酯5 ml中,加入4 M之HCl乙酸乙酯溶液5 mL,於50℃下加熱攪拌10小時。將反應液之溶劑蒸餾去除,藉由二氧化矽管柱(乙酸乙酯:己烷=1:2)進行單離,而獲得目標物(化合物I-1-45)。藉由H-NMR確認所獲得之白色固體為目標物。
[實施例14]
將酚化合物(流程1中之酚化合物)0.004 mol溶解於吡啶40 mL中,滴加NPPOC-Cl(氯甲酸2-(2-硝基苯基)丙酯)0.006 mol,於室溫下攪拌6小時。於反應液中添加乙酸乙酯200 g、離子交換水50 g進行油水分離。藉由稀鹽酸將有機層洗淨2次,藉由離子交換水將有機層洗淨3次,將溶劑蒸餾去除,藉由二氧化矽管柱(乙酸乙酯:己烷=1:4)進行單離。利用己烷使所獲得之白色固體分散後,於45℃下減壓乾燥2小時,而獲得目標物(化合物I-1-46)。藉由H-NMR確認所獲得之白色固體為目標物。
[實施例15~17]
使用下述式(1)~(3)之化合物作為酚化合物,除此以外,以與實施例1同樣之方式獲得下述化合物I-1-8、I-1-47及I-1-48。
[Example 13]
An intermediate compound was obtained in the same manner as in Example 1, except that 4- (2-bromoethylfluorenyl) phenyl tert-butyl ester was used instead of o-nitrobenzyl chloride. 0.0035 mol of the intermediate compound was dissolved in 5 ml of ethyl acetate, 5 mL of a 4 M HCl ethyl acetate solution was added, and the mixture was heated and stirred at 50 ° C for 10 hours. The solvent of the reaction solution was distilled off, and the product was isolated through a silica column (ethyl acetate: hexane = 1: 2) to obtain the target compound (Compound I-1-45). The obtained white solid was confirmed to be the target by H-NMR.
[Example 14]
0.004 mol of phenol compound (phenol compound in Scheme 1) was dissolved in 40 mL of pyridine, and 0.006 mol of NPPOC-Cl (2- (2-nitrophenyl) propyl chloroformate) was added dropwise, and stirred at room temperature for 6 hour. 200 g of ethyl acetate and 50 g of ion-exchanged water were added to the reaction solution, and oil-water separation was performed. The organic layer was washed twice with dilute hydrochloric acid, and the organic layer was washed three times with ion-exchanged water, and the solvent was distilled off. Single. The obtained white solid was dispersed with hexane, and then dried under reduced pressure at 45 ° C for 2 hours to obtain the target compound (Compound I-1-46). The obtained white solid was confirmed to be the target by H-NMR.
[Examples 15 to 17]
The following compounds I-1-8, I-1-47, and I-1-48 were obtained in the same manner as in Example 1 except that the compounds of the following formulae (1) to (3) were used as phenol compounds. .

[化34]
[Chem 34]

[化35]
[Chemical 35]

[表1]
[Table 1]

[表2]
[Table 2]

[評價]
製備實施例1、2、5~9、12~14及16(化合物I-1-2、I-1-3、I-1-35、I-1-28、I-1-34、I-1-4、I-1-41、I-1-44、I-1-45、I-1-46及I-1-47)之0.01質量%乙腈溶液,加入至1 cm見方石英槽中。將超高壓水銀燈UL750(HOYA製造)調整為20 mW/cm2 ,對充滿溶液之石英槽照射100 mJ/cm2 、3000 mJ/cm2 、10000 mJ/cm2 之光量。
藉由高效液相層析法(HPLC)分析照射後之液,由以下之式算出脫離率。將結果示於下述表3。
再者,於利用HPLC之分析中,於來自化合物I-1之230 nm之波峰全部消失之情形時假定為100%脫離而算出。
脫離率(%)=酚化合物(化合物I-2)/酚化合物(化合物I-2+化合物I-1)×100
[Evaluation]
Production Examples 1, 2, 5-9, 12-14, and 16 (Compounds I-1-2, I-1-3, I-1-35, I-1-28, I-1-34, I- 1-4, I-1-41, I-1-44, I-1-45, I-1-46, and I-1-47) 0.01% by mass acetonitrile solution was added to a 1 cm square cristobalite tank. The ultra-high pressure mercury lamp UL750 (manufactured by HOYA) was adjusted to 20 mW / cm 2 , and the quartz cell filled with the solution was irradiated with a light amount of 100 mJ / cm 2 , 3000 mJ / cm 2 , and 10000 mJ / cm 2 .
The irradiated liquid was analyzed by high performance liquid chromatography (HPLC), and the removal rate was calculated from the following formula. The results are shown in Table 3 below.
In addition, in the analysis by HPLC, when all the 230 nm peaks from Compound I-1 disappeared, it was calculated assuming 100% detachment.
Release rate (%) = phenol compound (compound I-2) / phenol compound (compound I-2 + compound I-1) × 100

又,關於實施例1、2及7(化合物I-1-2、I-1-3及I-1-34),於光照射前(0 mJ/cm2 )及光照射後(10000 mJ/cm2 )確認波長250 nm以上且450 nm以下之範圍之光之吸收光譜。其結果為,可確認與光照射前相比,光照射後於波長250 nm以上且450 nm以下之範圍內可廣泛地吸收長波長側之光。又,將最大吸收波長(nm)之測定結果示於下述表3及4。In addition, regarding Examples 1, 2 and 7 (compounds I-1-2, I-1-3 and I-1-34), before light irradiation (0 mJ / cm 2 ) and after light irradiation (10000 mJ / cm 2 ) Confirm the absorption spectrum of light in a wavelength range of 250 nm to 450 nm. As a result, it was confirmed that the light on the long wavelength side can be widely absorbed after the light irradiation in a range of a wavelength of 250 nm or more and 450 nm or less after the light irradiation. The measurement results of the maximum absorption wavelength (nm) are shown in Tables 3 and 4 below.

[表3]
[table 3]

[表4]
[Table 4]

根據表3及4可確認,化合物I-1藉由光照射而光脫離基B脫離。
又,根據表3可確認,上述化合物I-1藉由光照射而可有效率地吸收波長250 nm以上且450 nm以下之範圍廣泛之波長之紫外線。又,與此相伴,確認到最大吸收波長向長波長側之位移。
根據以上可確認,化合物I-1於光照射前酚性羥基受光脫離基B保護而紫外線吸收功能受到抑制,可抑制硬化阻礙,並且藉由光照射而可容易地賦予紫外線吸收功能。
From Tables 3 and 4, it was confirmed that the compound I-1 was irradiated with light and the light-releasing group B was removed.
In addition, it is confirmed from Table 3 that the compound I-1 can efficiently absorb ultraviolet rays having a wide range of wavelengths from 250 nm to 450 nm by irradiation with light. Along with this, it was confirmed that the maximum absorption wavelength shifted toward the long wavelength side.
From the above, it was confirmed that the compound I-1 was protected by the photo-releasing group B before the light irradiation, and that the ultraviolet absorption function was suppressed, the curing resistance was suppressed, and the ultraviolet absorption function was easily imparted by light irradiation.

以下述表5所示之比率將表5所示之成分混合,而獲得實施例18~20以及比較例1及2之組合物。表5中之符號表示下述之化合物。再者,表中之數值表示質量份。The components shown in Table 5 were mixed at the ratio shown in the following Table 5, and the compositions of Examples 18 to 20 and Comparative Examples 1 and 2 were obtained. The symbols in Table 5 indicate the following compounds. In addition, the numerical value in a table | surface represents a mass part.

A-1:聚合性化合物(新中村化學工業公司製造之NK OLIGO EA-1020(雙酚A型環氧丙烯酸酯)
A-2:自由基聚合性化合物(日本化藥公司製造之Kayarad DPHA(二季戊四醇五及六丙烯酸酯之混合物))
B-1:BASF公司製造之Irgacure 907(自由基聚合起始劑)
C-1:信越化學工業公司製造之矽烷偶合劑KBE-403
D-1:2-丁酮
E-1:下述式(1)所表示之化合物(紫外線吸收劑)
F-1:化合物I-1-3
F-2:化合物I-1-35
F-3:化合物I-1-47
A-1: Polymerizable compound (NK OLIGO EA-1020 (bisphenol A epoxy acrylate) manufactured by Shin Nakamura Chemical Industry Co., Ltd.
A-2: Radical polymerizable compound (Kayarad DPHA (mixture of dipentaerythritol pentaerythritol pentaerythritol and hexaacrylate) manufactured by Nippon Kayaku Co., Ltd.)
B-1: Irgacure 907 (free radical polymerization initiator) manufactured by BASF
C-1: Silane coupling agent KBE-403 manufactured by Shin-Etsu Chemical Industry Co., Ltd.
D-1: 2-butanone
E-1: Compound (ultraviolet absorbent) represented by the following formula (1)
F-1: Compound I-1-3
F-2: Compound I-1-35
F-3: Compound I-1-47

[化36]
[Chemical 36]

藉由下述之方法評價所獲得之實施例18~20以及比較例1及2之組合物之硬化性及耐光性。The hardening properties and light resistance of the obtained compositions of Examples 18 to 20 and Comparative Examples 1 and 2 were evaluated by the following methods.

[硬化性]
藉由棒式塗佈機將實施例18~20以及比較例1及2之組合物分別以約3 μm之厚度塗佈於PET(polyethylene terephthalate,聚對苯二甲酸乙二酯)膜。繼而,於80℃下預烘烤3分鐘後,使用超高壓水銀燈(UL750)作為光源進行曝光(20 mW/cm2 )。再者,曝光係以曝光光量成為500 mJ/cm2 之方式進行。此時,為了可測定光感度,而使用以光透過率階段性地變少之方式製作之底片(以光學密度0.05作為第1階段、每1階段光學密度增加0.15之階段式曝光表)。繼而,使用異丙醇(IPA),於25℃之環境下歷經10秒清洗顯影後,於80℃下乾燥30分鐘。然後,測定形成於PET膜上之硬化物之階段式曝光表之段數,藉此評價光感度。階段式曝光表之段數越高,表示光感度越高,硬化性越良好。將結果示於下述表5。
[Sclerosis]
The compositions of Examples 18 to 20 and Comparative Examples 1 and 2 were each applied to a PET (polyethylene terephthalate) film with a thickness of about 3 μm by a bar coater. Next, after pre-baking at 80 ° C for 3 minutes, exposure was performed using an ultra-high pressure mercury lamp (UL750) as a light source (20 mW / cm 2 ). In addition, exposure was performed so that exposure light quantity might become 500 mJ / cm <2> . In this case, in order to measure the light sensitivity, a negative film (a stepwise exposure meter with an optical density of 0.05 as the first stage and an increase of 0.15 in each stage of optical density) was used in which the light transmittance was gradually decreased. Then, using isopropyl alcohol (IPA), washing and developing at 25 ° C for 10 seconds, and then drying at 80 ° C for 30 minutes. Then, the number of steps of the stepwise exposure meter of the hardened material formed on the PET film was measured to evaluate the light sensitivity. The higher the number of steps of the step-type exposure meter, the higher the light sensitivity and the better the hardenability. The results are shown in Table 5 below.

[耐光性]
藉由旋轉塗佈機將實施例18~20以及比較例1及2之組合物分別塗佈於玻璃基板,於80℃下預烘烤3分鐘後,使用超高壓水銀燈(UL750)作為光源進行曝光(20 mW/cm2 )。曝光係以曝光光量成為100 mJ/cm2 之方式進行。其後,進一步照射3000 mJ/cm2 ,製作耐光性評價用樣品。使用Suga Test Instruments製造之氙耐光性試驗機Table Sun XT-1500L,對評價用樣品實施24小時耐光性試驗。測定評價用樣品於耐光性試驗前後之波長470 nm下之透過率(%)之差((耐光性試驗前之透過率(%)-耐光性試驗後之透過率(%)),按照以下之基準進行耐光性評價。
〇:透過率差(%)相對於耐光性試驗前之透過率未達5%。
×:透過率差(%)相對於耐光性試驗前之透過率為5%以上。
若耐光性評價為「〇」,則表示硬化物之耐光性優異。將其結果示於下述表5。
[Light resistance]
The compositions of Examples 18 to 20 and Comparative Examples 1 and 2 were respectively coated on a glass substrate by a spin coater, pre-baked at 80 ° C for 3 minutes, and then exposed using an ultra-high pressure mercury lamp (UL750) as a light source. (20 mW / cm 2 ). The exposure is performed so that the exposure light amount becomes 100 mJ / cm 2 . Thereafter, it was further irradiated with 3000 mJ / cm 2 to prepare a sample for evaluating light resistance. The Xenon light resistance tester Table Sun XT-1500L manufactured by Suga Test Instruments was used to perform a 24-hour light resistance test on the samples for evaluation. The difference between the transmittance (%) of the sample for evaluation at a wavelength of 470 nm before and after the light resistance test ((transmittance before light resistance test (%)-transmittance (%) after light resistance test)) Lightfastness evaluation was performed on the basis.
〇: The transmittance difference (%) is less than 5% with respect to the transmittance before the light resistance test.
×: The transmittance difference (%) is 5% or more with respect to the transmittance before the light resistance test.
A light resistance evaluation of "0" indicates that the light resistance of the cured product is excellent. The results are shown in Table 5 below.

[表5]
[table 5]

根據表5,含有化合物I-1之實施例18~20之組合物與不含紫外線吸收劑之比較例1之組合物相比,耐光性較良好。又,實施例18~20之組合物與含有公知之紫外線吸收劑之比較例2之組合物相比,硬化性較良好。由此可知,藉由本發明,可獲得硬化阻礙較少、具有優異之耐光性之組合物。
產業上之可利用性
According to Table 5, the compositions of Examples 18 to 20 containing Compound I-1 had better light resistance than the composition of Comparative Example 1 without a UV absorber. In addition, the compositions of Examples 18 to 20 had better curability than the composition of Comparative Example 2 containing a known ultraviolet absorber. From this, it can be understood that the present invention can obtain a composition with less resistance to curing and excellent light resistance.
Industrial availability

藉由本發明之化合物,可提供硬化阻礙較少、可對硬化物容易地賦予紫外線吸收功能等之化合物。
本發明之潛在性紫外線吸收劑之硬化阻礙較少,可對硬化物容易地賦予紫外線吸收功能等。
藉由本發明之組合物,可提供硬化阻礙較少、可獲得具有優異之紫外線吸收功能之硬化物之組合物。
藉由本發明之硬化物,可提供具有優異之紫外線吸收功能之硬化物。
藉由本發明之硬化物之製造方法,可於不引起硬化阻礙之情況下製造具有優異之紫外線吸收功能等之硬化物。
藉由本發明之第2組合物,可提供可於不引起硬化阻礙之情況下獲得具有優異之紫外線吸收功能之硬化物之組合物。
The compound of the present invention can provide a compound which has less resistance to hardening and can easily provide an ultraviolet absorbing function to a cured product.
The latent ultraviolet absorbent of the present invention has less hindrance to curing, and can easily provide an ultraviolet absorbing function to the cured product.
The composition of the present invention can provide a composition which has less resistance to hardening and can obtain a hardened product having excellent ultraviolet absorption function.
By the hardened | cured material of this invention, the hardened | cured material which has the outstanding ultraviolet absorption function can be provided.
By the method for producing a cured product of the present invention, a cured product having excellent ultraviolet absorption function and the like can be produced without causing hardening hindrance.
The second composition of the present invention can provide a composition capable of obtaining a cured product having an excellent ultraviolet absorbing function without causing hardening hindrance.

Claims (9)

一種化合物,其係以下述通式(I-1)表示, (式中,A表示具有紫外線吸收功能之原子團,B表示光脫離基,k表示1~10之整數)。A compound represented by the following general formula (I-1), (In the formula, A represents an atomic group having an ultraviolet absorption function, B represents a light-releasing group, and k represents an integer of 1 to 10). 如請求項1之化合物,其中上述通式(I-1)中之B含有下述通式(B-1)、(B-2)、(B-3)、(B-4)、(B-5)、(B-6)、(B-7)、(B-8)、(B-9)及(B-10)所表示之基之至少1種, (式中,R11 、R13 、R16 、R18 、R19 、R20 、R23 、R26 及R28 分別獨立地表示鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基, R12 、R14 、R17 、R21 、R22 、R24 、R25 、R27 、R29 及R30 分別獨立地表示氫原子、鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基, R15 表示碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基, R11 、R12 、R13 、R14 、R15 、R16 、R17 、R18 、R19 、R20 、R21 、R22 、R23 、R24 、R25 、R26 、R27 、R28 、R29 及R30 所表示之烷基及芳基烷基中之亞甲基存在被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR'-、>P=O、-S-S-、-SO2 -或該等之組合之情形, 上述烷基、芳基、芳基烷基及含雜環基存在具有取代基之情形, R'表示氫原子或碳原子數1~8之烷基, 存在複數個R11 彼此、複數個R13 彼此、複數個R16 彼此、複數個R18 彼此、複數個R19 彼此、複數個R20 彼此、複數個R23 彼此、複數個R26 彼此及複數個R28 彼此分別鍵結而形成苯環或萘環之情形, 複數個R11 、R12 、R13 、R14 、R16 、R17 、R18 、R19 、R20 、R23 、R25 、R26 、R27 、R28 、R29 及R30 有分別相同之情形,有互不相同之情形, b1、b2、b3、b6、b7、b8及b9分別獨立地表示0~4之整數, b4及b5分別獨立地表示0~5之整數, **表示與上述A-O-之鍵結位置) (式中,R31 及R40 分別獨立地表示鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基, R32 、R33 、R41 、R42 、R43 及R44 分別獨立地表示氫原子、鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基, R31 、R32 、R33 、R40 、R41 、R42 、R43 及R44 所表示之烷基及芳基烷基中之亞甲基存在被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR'-、>P=O、-S-S-、-SO2 -或該等之組合之情形, 上述烷基、芳基、芳基烷基及含雜環基存在具有取代基之情形, c1表示0~5之整數, c2表示0~4之整數, **表示與上述A-O-之鍵結位置)。The compound according to claim 1, wherein B in the general formula (I-1) contains the following general formulae (B-1), (B-2), (B-3), (B-4), (B -5), (B-6), (B-7), (B-8), (B-9) and (B-10), (In the formula, R 11 , R 13 , R 16 , R 18 , R 19 , R 20 , R 23 , R 26 and R 28 each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, and the number of carbon atoms. An alkyl group of 1 to 40, an aryl group of 6 to 20 carbon atoms, an arylalkyl group of 7 to 20 carbon atoms, or a heterocyclic group containing 2 to 20 carbon atoms, R 12 , R 14 , R 17 , R 21 , R 22 , R 24 , R 25 , R 27 , R 29 and R 30 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, An aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms or a heterocyclic group containing 2 to 20 carbon atoms, R 15 represents an alkyl group having 1 to 40 carbon atoms and carbon atoms 6 to 20 aryl groups, 7 to 20 carbon atoms arylalkyl groups or 2 to 20 carbon atoms heterocyclic groups, R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R Alkyl and arylalkyl groups represented by 17 , R 18 , R 19 , R 20 , R 21 , R 22 , R 23 , R 24 , R 25 , R 26 , R 27 , R 28 , R 29, and R 30 The presence of methylene is replaced by carbon-carbon double bonds, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O- -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH In the case of -CO-O-, -NR'-,> P = O, -SS-, -SO 2- , or a combination thereof, the above alkyl, aryl, arylalkyl, and heterocyclic group-containing In the case of a substituent, R ′ represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and there are a plurality of R 11 each other, a plurality of R 13 each other, a plurality of R 16 each other, a plurality of R 18 each other, and a plurality of R 19 In the case where each other, a plurality of R 20 each other, a plurality of R 23 each other, a plurality of R 26 each other and a plurality of R 28 are bonded to each other to form a benzene ring or a naphthalene ring, a plurality of R 11 , R 12 , R 13 , R 14, R 16, R 17, R 18, R 19, R 20, R 23, R 25, R 26, R 27, R 28, R 29 and R 30 respectively have the same case, there is the case of different from each other, b1, b2, b3, b6, b7, b8, and b9 each independently represent an integer of 0 to 4, b4 and b5 each independently represent an integer of 0 to 5, and ** represents the bonding position with the above AO-) (In the formula, R 31 and R 40 each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, and 7 carbon atoms. An arylalkyl group of -20 or a heterocyclic group containing 2 to 20 carbon atoms, and R 32 , R 33 , R 41 , R 42 , R 43 and R 44 each independently represent a hydrogen atom, a halogen atom, a cyano group, Hydroxyl, nitro, carboxyl, alkyl having 1 to 40 carbon atoms, aryl having 6 to 20 carbon atoms, aryl alkyl having 7 to 20 carbon atoms or heterocyclic group containing 2 to 20 carbon atoms The methylene group in the alkyl group and the arylalkyl group represented by R 31 , R 32 , R 33 , R 40 , R 41 , R 42 , R 43 and R 44 is substituted with a carbon-carbon double bond,- O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S- , -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-,> P = O, -SS- In the case of -SO 2 -or a combination thereof, in the case where the alkyl, aryl, arylalkyl, and heterocyclic group have substituents, c1 represents an integer of 0 to 5, and c2 represents an integer of 0 to 4. Integer, ** indicates the bonding position with the above AO-). 如請求項2之化合物,其中上述通式(I-1)所表示之化合物為下述通式(A-1)、(A-2)或(A-3)所表示之化合物,且 作為上述光脫離基B,含有下述通式(B-1-a), (式中,R1 及R2 分別獨立地表示氫原子、鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基、碳原子數2~20之含雜環基或上述-O-B, R1 及R2 之至少一者為上述-O-B, R3 、R4 、R5 、R6 、R7 及R8 分別獨立地表示鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基, R1 、R2 、R3 、R4 、R5 、R6 、R7 及R8 所表示之烷基或芳基烷基中之亞甲基亦存在被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR'-、>P=O、-S-S-、-SO2 -或該等之組合之情形, 上述烷基、芳基、芳基烷基及含雜環基存在具有取代基之情形, R'表示氫原子或碳原子數1~8之烷基, 存在複數個R3 彼此、複數個R4 彼此、複數個R5 彼此、複數個R6 彼此及複數個R7 彼此分別鍵結而形成苯環或萘環之情形, 複數個R3 、R4 、R5 、R6 、R7 及R8 有分別相同之情形,有互不相同之情形, m1及m2分別獨立地表示1~10之整數, n表示1~3之整數, a1表示0~4之整數, a2表示0~2之整數, a3表示0~4之整數, a4表示0~3之整數, a5表示0~3之整數, a6表示0~3-n之整數, X1 及X2 分別表示m1價及m2價之鍵結基) (式中,R12 分別獨立地表示氫原子、鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基, R11 表示鹵素原子、氰基、羥基、硝基、羧基、碳原子數1~40之烷基、碳原子數6~20之芳基、碳原子數7~20之芳基烷基或碳原子數2~20之含雜環基, R11 及R12 所表示之烷基或芳基烷基中之亞甲基存在被取代為碳-碳雙鍵、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR'-、>P=O、-S-S-、-SO2 -或該等之組合之情形, 上述烷基、芳基、芳基烷基及含雜環基存在具有取代基之情形, R'表示氫原子或碳原子數1~8之烷基, 存在複數個R11 彼此鍵結而形成苯環或萘環之情形, R11 及R12 有分別相同之情形,有互不相同之情形, b1表示0~4之整數, **表示與上述A-O-之鍵結位置)。The compound according to claim 2, wherein the compound represented by the general formula (I-1) is a compound represented by the following general formula (A-1), (A-2), or (A-3) The photo-releasing group B contains the following general formula (B-1-a), (In the formula, R 1 and R 2 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, and a carbon atom. An arylalkyl group having 7 to 20 atoms, a heterocyclic group containing 2 to 20 carbon atoms, or the above-OB, at least one of R 1 and R 2 is the above-OB, R 3 , R 4 , R 5 , R 6 , R 7 and R 8 each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, and 7 to carbon atoms the alkyl group or an aryl group having 20 carbon atoms, heterocyclic group of 2 to 20, R 1, R 2, R 3, R 4, R 5, R 6, R 7 and R 8 represented by the alkyl or aryl group The methylene group in the alkyl group is also substituted with carbon-carbon double bonds, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH In the case of -CO-O-, -NR'-,> P = O, -SS-, -SO 2- , or a combination thereof, the above alkyl, aryl, arylalkyl, and heterocyclic group-containing In the case of a substituent, R ′ represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. In the case where a plurality of R 3 each other, a plurality of R 4 each other, a plurality of R 5 each other, a plurality of R 6 each other, and a plurality of R 7 are respectively bonded to each other to form a benzene ring or a naphthalene ring, a plurality of R 3 , R 4 , R 5 , R 6 , R 7 and R 8 may be the same or different from each other. M1 and m2 each independently represent an integer of 1 to 10, n represents an integer of 1 to 3, and a1 represents 0 to 4 An integer, a2 represents an integer from 0 to 2, a3 represents an integer from 0 to 4, a4 represents an integer from 0 to 3, a5 represents an integer from 0 to 3, a6 represents an integer from 0 to 3-n, X 1 and X 2 (M1 and m2 valence bond groups, respectively) (In the formula, R 12 independently represents a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, and 7 carbon atoms. Arylalkyl of 20 to 20 or heterocyclic group containing 2 to 20 carbon atoms, R 11 represents halogen atom, cyano, hydroxy, nitro, carboxyl, alkyl of 1 to 40 carbon, 6 carbon Aryl group of 20 to 20, arylalkyl group of 7 to 20 carbon atoms or heterocyclic group containing 2 to 20 carbon atoms, methylene group in the alkyl group or arylalkyl group represented by R 11 and R 12 Existence of carbon-carbon double bonds, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR In the case where '-,> P = O, -SS-, -SO 2 -or a combination thereof, in the case where the alkyl group, aryl group, arylalkyl group and heterocyclic group have substituents, R' represents A hydrogen atom or an alkyl group having 1 to 8 carbon atoms may have a plurality of R 11 bonded to each other to form a benzene ring or a naphthalene ring. R 11 and R 12 may be the same as each other and may be different from each other. B 1 Represents the integer from 0 to 4 ** represents the bonding position of the AO-). 一種潛在性紫外線吸收劑,其含有如請求項1之化合物。A potential ultraviolet absorbent containing a compound as claimed in claim 1. 一種組合物,其含有如請求項1之化合物。A composition containing a compound as claimed in claim 1. 如請求項5之組合物,其進而含有樹脂成分。The composition as claimed in claim 5, further comprising a resin component. 一種硬化物,其係含有如請求項1之化合物與聚合性化合物之組合物之硬化物。A hardened material which is a hardened material containing the composition of the compound of Claim 1 and a polymerizable compound. 一種硬化物之製造方法,其包括: 使含有如請求項1之化合物與聚合性化合物之組合物硬化而形成硬化物之步驟;及 對上述硬化物照射光而使上述化合物所含之光脫離基脫離之步驟。A method for manufacturing a hardened object, comprising: A step of hardening a composition containing a compound as claimed in claim 1 and a polymerizable compound to form a hardened body; and A step of irradiating the hardened material with light to remove light-releasing groups contained in the compound. 一種組合物,其含有下述通式(I-2)所表示之化合物與源自光脫離基之脫離物, (式中,A表示具有紫外線吸收功能之原子團,k表示1~10之整數)。A composition comprising a compound represented by the following general formula (I-2) and a release substance derived from a photodissociation group, (In the formula, A represents an atomic group having an ultraviolet absorbing function, and k represents an integer of 1 to 10).
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