TW201929629A - Multi-DUT testing interposer module and manufacturing method thereof - Google Patents
Multi-DUT testing interposer module and manufacturing method thereof Download PDFInfo
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本發明係關於一種測試介面板及其製造方法,特別有關一種多晶粒測試介面模組及其製造方法。 The invention relates to a test medium panel and a manufacturing method thereof, in particular to a multi-die test interface module and a manufacturing method thereof.
一般未封裝的半導體半成品,如晶粒的良率測試,會利用測試介面板作為晶粒及測試機台之間的轉換介面。而對於已封裝的半導體成品的良率測試,如第1圖,係習知對單顆晶粒的晶粒測試結構,包含有連接測試設備的印刷電路板(未示圖中),及連接印刷電路板的測試載板10A。測試載板10A可連接有多個晶粒測試探針111A之探針測試座11A,以供測試移動載台13A上的晶粒14A,以及用以定位該測試載板10A的測試介面母板15A。該測試介面母板15A凸設有連接墊151A用以連接並固定該測試載板10A上的導電凸塊101A。此圖顯示為單晶粒測試,因此該測試載板10A為單晶粒測試介面板。此先前技術僅提供一次一顆晶粒的測試,測試效率不佳。 Generally, unpackaged semiconductor semi-finished products, such as die yield test, use a test interface panel as a conversion interface between the die and the test machine. For the yield test of the packaged semiconductor finished product, as shown in Fig. 1, it is a conventional die test structure for a single die, including a printed circuit board (not shown) connected to the test equipment, and connection printing. The test board 10A of the board. The test carrier 10A can be connected with a plurality of die test probes 11A of the die test probes 11A for testing the die 14A on the mobile carrier 13A, and a test interface motherboard 15A for positioning the test carrier 10A. . The test interface mother board 15A is provided with a connection pad 151A for connecting and fixing the conductive bumps 101A on the test carrier 10A. This figure is shown as a single die test, so the test carrier 10A is a single die test interface panel. This prior art only provides one die test at a time, and the test efficiency is not good.
市面有使用垂直探針卡通常具有一空間轉換器(Space Transformer,ST),或稱測試介面板。測試介面板(亦即ST)在測試上,一般採用單顆晶粒(Single DUT)或一對晶粒(Dual DUT)進行測試,但當I/O測點太多或應用多顆晶粒(Multi DUT)測試時,測試介面板ST的設計變得複雜,而必須透過增加層數來分散線路,成品也相對較厚,且也較不利於高速測試上 的信號及電源完整性的需求,相對也提高成本,交期也變長。 There are vertical probe cards in the market that usually have a Space Transformer (ST), or test interface panel. The test interface panel (also known as ST) is generally tested with a single die (Single DUT) or a pair of die (Dual DUT), but when there are too many I/O points or multiple die ( Multi DUT) When testing, the design of the test interface panel ST is complicated, and the circuit must be dispersed by increasing the number of layers. The finished product is also relatively thick and is not conducive to high-speed testing. The demand for signal and power integrity has also increased costs and delivery has become longer.
參見第2圖係另一習知應用於對多顆晶粒的晶粒測試結構,包含有連接測試設備的印刷電路板(未示圖中)、連接印刷電路板的數個測試載板10A、連接該等測試載板10A的探針測試座11A、晶粒14A、承載晶粒14A的測試移動載台(未示圖中),以及測試介面母板15A。其中為承載多晶粒進行測試,配合數個測試載板10A還包括一個承載介面座16A。該承載介面座16A上下兩側外凸設等距設立的金屬連接墊161A,藉錫球(未見圖示)焊接,可透過錫焊連接使數個測試載板10A固定於該承載介面座16A上,並使測試載板10A上之導電凸塊101A對應承載介面座16A上之金屬連接墊161A。採錫球焊接方式來構建測試載板10A與承載介面座16A之電性接點,進而使受測晶粒14A及測試設備之間兩者信號互連的設計。然而,這類的晶粒測試連接結構及製造方法有如下的缺失: Referring to FIG. 2, another conventional example is applied to a die test structure for a plurality of crystal grains, including a printed circuit board (not shown) connected to a test device, and a plurality of test carriers 10A connected to the printed circuit board. A probe test stand 11A, a die 14A, a test moving stage (not shown) carrying the die 14A, and a test interface mother board 15A are connected to the test carrier 10A. The test is carried out for carrying a plurality of dies, and the plurality of test carriers 10A further includes a carrier interface 16A. A metal connection pad 161A is formed on the upper and lower sides of the load-bearing interface seat 16A, and is soldered by a solder ball (not shown). The test carrier 10A can be fixed to the load-bearing interface seat 16A through a soldered connection. The conductive bumps 101A on the test carrier 10A are corresponding to the metal connection pads 161A on the carrier interface 16A. The solder ball soldering method is used to construct the electrical contact between the test carrier 10A and the carrier interface 16A, thereby designing the signal interconnection between the tested die 14A and the test device. However, such die test connection structures and manufacturing methods have the following drawbacks:
1.傳輸效能變差問題:由於在植錫球時須透過加熱板導熱,並從另一面傳熱到承載介面座16A處,尤其是無鉛焊料,製程時間較長,製程溫度也較高,容易損傷到測試載板10A。再者,需再透過一承載介面座16A做連接,該承載介面座勢必需再先做一定的平整性,才有利於後續測試載板的焊接,而且作為支撐該數個測試載板使用以及承受迴焊連接步驟時,最終該承載介面座整體厚度勢必相對變得更厚,如此一來,將導致傳輸路徑之增加;隨著產品厚度增加,則增設電感來改善的需求愈大,易有導致高頻訊號失真問題產生,進而導致傳輸效能變差。 1. The transmission performance deteriorates: Since the solder ball is required to conduct heat through the heating plate and heat transfer from the other side to the carrier interface 16A, especially lead-free solder, the process time is longer and the process temperature is higher. Damage to the test carrier 10A. Furthermore, it is necessary to connect through a load-bearing interface seat 16A, and the load-bearing interface seat must first have a certain level of flatness, which is beneficial to the subsequent test carrier welding, and serves as a support for the several test carriers. In the reflow soldering step, the overall thickness of the carrier interface is bound to become relatively thicker, which will lead to an increase in the transmission path. As the thickness of the product increases, the increase in the inductance is increased, which tends to result in High-frequency signal distortion problems occur, which in turn leads to poor transmission performance.
2.組配失敗的風險:為因應高精度晶片的設計及多晶粒(Multi-DUT)測試的需求,導致測試I/O點數遽增,少者千點,多者已達上萬 點,所以測試介面板/測試載板的尺寸必須愈做愈大,而焊接錫球(BGA焊點)的數量也隨之愈來愈多。如此,不論數個測試載板是同時或非同時焊接在同一承載介面座上,其平面度及空焊、短路等都是不易控制,都會降低組裝成功率。甚至,各該測試載板在進行迴焊時容易從預定位置稍微位移,造成焊接後該等測試載板相對位置無法對應於該承載介面座,或者無法對應於該等待測物(如探針測試座11A上的探針)之電性接點所排列之相對位置;倘若,探針測試座11A勉強調移配合各該測試載板焊時的移位,勢必造成其接設之探針的點測端高度參差不齊。如此,上述空間轉換器在設置探針時還必須再利用調整機構調整探針的位置及平整度,反而增加探針卡/探針測試座之製程的複雜度。 2. Risk of failure of assembly: In response to the demand for high-precision wafer design and multi-DUT testing, the number of test I/O points has increased, and the number of test I/O points has increased by a thousand. Therefore, the size of the test panel/test carrier must be increased, and the number of solder balls (BGA solder joints) will increase. Thus, regardless of whether several test carriers are soldered simultaneously or non-simultaneously on the same carrier interface, the flatness, air soldering, short circuit, etc. are not easily controlled, and the assembly success rate is reduced. In addition, each of the test carriers is easily displaced from the predetermined position during the reflow, so that the relative positions of the test carriers after welding cannot correspond to the bearing interface, or cannot correspond to the waiting object (such as probe testing). The relative position of the electrical contacts of the probe on the seat 11A; if the probe test seat 11A 勉 emphasizes the displacement of the test carrier during the welding, it is bound to cause the probe of the connected probe The height of the measuring end is uneven. In this way, when the probe is disposed, the space converter must further adjust the position and flatness of the probe by using the adjustment mechanism, thereby increasing the complexity of the process of the probe card/probe test socket.
3.製程複雜又難以控制問題:主要是在採焊接方式來構裝測試載板10A與承載介面座16A之電性接點,造成製程中測試載板、承載介面座、探針測試座都必須控制各自相對應的平面度,增加製程再加工的複雜性,及控制困難度問題。甚至,習知透過焊接做銜接所形成的測試介面板,導致層間的連接點面積跟著縮減。當測試介面板座的測點位置與實際晶粒測點位置有落差時,若拆卸重新迴焊,則造成解焊重工問題。具體地,錫球材料會因解焊高溫導致球面不一致,屆時必須吸錫後再重新植球,如此將再多受到一次熱衝擊問題。 3. The process is complicated and difficult to control: mainly in the welding method to construct the electrical contact between the test carrier 10A and the load-bearing interface seat 16A, so that the test carrier, the load-bearing interface seat and the probe test seat must be in the process. Control the corresponding flatness, increase the complexity of process rework, and control the difficulty. Even, it is conventional to form a test panel formed by soldering, resulting in a reduction in the area of the connection point between the layers. When there is a drop in the position of the test panel seat and the actual die point, if the re-reflow is removed, the problem of desoldering is caused. Specifically, the solder ball material will be inconsistent due to the high temperature of the soldering, and then the ball must be re-planted after the tin is sucked, so that there will be another thermal shock problem.
因此,在講求精準、快速又微利的時代,欲降低測試成本,需要提出能適用多顆晶粒測試的測試介面裝置,以及能提升電性傳輸品質與效能,降低信號被干擾的問題,並易於組立及控制,才能成為市場主流的多晶粒測試介面模組及其製造方法。 Therefore, in the era of precision, speed and meager profit, in order to reduce the test cost, it is necessary to propose a test interface device that can apply multiple die tests, and improve the quality and performance of electrical transmission, reduce the problem of signal interference, and is easy. In order to become the mainstream multi-die test interface module and its manufacturing method, it can be established and controlled.
本發明的一個目的在於提供一種多晶粒測試介面模組及其製造方法,特別有關於一種將多個載板整合成一薄型的測試介面模組,以解決習知技術中影響高頻訊號傳輸的技術問題。並透過測試介面模組的扇出佈線製程,達到縮減將訊號扇開的厚度,進而縮短傳輸路徑,以提供一次許多顆晶粒的測試(指一次測試由單一晶粒擴增為多晶粒),提供高效率的測試效果。 An object of the present invention is to provide a multi-die test interface module and a method of fabricating the same, and more particularly to integrating a plurality of carrier boards into a thin test interface module to solve the problem of affecting high-frequency signal transmission in the prior art. technical problem. And through the fan-out wiring process of the test interface module, the thickness of the signal fan is reduced, and the transmission path is shortened, so as to provide a test of a plurality of crystal grains at a time (in one test, a single crystal is expanded into a multi-die) , providing efficient test results.
本發明的另一個目的在於提供一種多晶粒測試介面模組及其製造方法,以解決習知技術中焊接構成連接,影響探針測試座組配及製程複雜又難以控制的技術問題。 Another object of the present invention is to provide a multi-die test interface module and a method for fabricating the same, which solves the technical problems in the prior art that the soldering is connected, affecting the probe test suite assembly and the process is complicated and difficult to control.
為達成上述目的,本發明一方面提供一種多晶粒測試介面模組的製造方法,包含如下步驟:提供一基板;形成貫穿該基板表面的貫通孔;在該基板之貫穿孔置入封裝載板;在該基板之表面及該貫通孔中形成介電層,該介電層包覆該封裝載板;在該介電層處形成連接孔;在該介電層和該連接孔中形成導電鍍層;以及對該導電鍍層進行刷磨,至少保留對應該連接孔位置的導電鍍層形成線路導體,該線路導體透過該連接孔與該封裝載板做電性連接。 In order to achieve the above object, an aspect of the present invention provides a method for manufacturing a multi-die test interface module, comprising the steps of: providing a substrate; forming a through hole penetrating the surface of the substrate; and inserting a package carrier in the through hole of the substrate Forming a dielectric layer on the surface of the substrate and the through hole, the dielectric layer covering the package carrier; forming a connection hole at the dielectric layer; forming a conductive plating layer in the dielectric layer and the connection hole And brushing the conductive plating layer to at least retain a conductive plating layer corresponding to the position of the connecting hole to form a line conductor, and the line conductor is electrically connected to the package carrier through the connecting hole.
本發明另一方面提供一種多晶粒測試介面模組的製造方法,包含如下步驟:提供一基板;形成貫穿該基板之第一表面和第二表面的貫通孔;在該基板之貫穿孔置入封裝載板;形成一第一介電層覆蓋該基板之第一表面,並形成第二介電層覆蓋該基板之第二表面,以及該貫通孔中填充有介電層,該介電層包覆該封裝載板;並依封裝載板上之線路或圖騰(Pattern), 在該第一介電層和第二介電層加工形成連接孔;在該第一介電層和第二介電層及該連接孔中形成導電鍍層;對該導電鍍層進行刷磨,至少保留對應該第一介電層的連接孔位置的第一導電鍍層,和對應該第二介電層的連接孔位置的第二導電鍍層;以及在對應該第一導電鍍層形成第一線路導體,和在對應該第二導電鍍層形成尺寸較該第一線路導體大的第二線路導體。 Another aspect of the present invention provides a method of fabricating a multi-die test interface module, comprising the steps of: providing a substrate; forming a through hole penetrating the first surface and the second surface of the substrate; and inserting the through hole in the substrate Forming a carrier layer; forming a first dielectric layer covering the first surface of the substrate, and forming a second dielectric layer covering the second surface of the substrate, and the through hole is filled with a dielectric layer, the dielectric layer package Overlying the package carrier; and depending on the wiring or pattern on the package carrier, Forming a connection hole in the first dielectric layer and the second dielectric layer; forming a conductive plating layer in the first dielectric layer and the second dielectric layer and the connection hole; brushing the conductive plating layer, at least retaining a first conductive plating layer corresponding to a position of the connection hole of the first dielectric layer, and a second conductive plating layer corresponding to a position of the connection hole of the second dielectric layer; and forming a first line conductor corresponding to the first conductive plating layer, and A second line conductor having a size larger than the first line conductor is formed corresponding to the second conductive plating layer.
依據本發明上述之實施例,基板由剛性材料製成,包括玻璃纖維、玻璃、陶瓷、剛性粒子、碳化矽纖維或藍寶石基板。貫通孔係利用蝕刻或機械加工或放電加工方式製成,且為複數個,以利裝配封裝載板。 In accordance with the above-described embodiments of the present invention, the substrate is made of a rigid material, including fiberglass, glass, ceramic, rigid particles, tantalum carbide or sapphire substrates. The through holes are made by etching or machining or electric discharge machining, and are plural, in order to assemble the package carrier.
依據本發明上述之實施例,在基板之表面及貫通孔中形成介電層的步驟中,位在基板之表面的該介電層的高度係高於該封裝載板上的金屬測點,以利包覆封裝載板。 According to the above embodiment of the present invention, in the step of forming a dielectric layer on the surface of the substrate and the through hole, the height of the dielectric layer on the surface of the substrate is higher than the metal measurement point on the package carrier. The package covers the package.
依據本發明上述之實施例,在基板內之封裝載板的頂面及底部都設有金屬測點,該介電層高於該封裝載板頂面金屬測點或底部金屬測點的高度,其係≦50um。 According to the above embodiment of the present invention, the top surface and the bottom of the package carrier in the substrate are provided with metal measuring points, and the dielectric layer is higher than the height of the metal measuring point or the bottom metal measuring point of the top surface of the package carrier. Its system is 50um.
依據本發明上述之實施例,在導電鍍層進行刷磨的步驟中,係將形成於基板外表面的導電鍍層進行刷磨整平製程,且該刷磨整平製程可依實際需求進行刷磨整平至該多晶粒測試介面模組所需之厚度。 According to the above embodiment of the present invention, in the step of performing the brushing of the conductive plating layer, the conductive plating layer formed on the outer surface of the substrate is subjected to a brushing and leveling process, and the brushing and leveling process can be brushed and finished according to actual needs. The thickness required for the multi-die test interface module.
依據本發明上述之實施例,該線路導體係採用加成法製得,且可依實際需求進行不同尺寸的製得,以利待測晶粒經由該線路導體透過連接孔填滿導電鍍層而與封裝載板的金屬測點形成電性連接。 According to the above embodiment of the present invention, the line guiding system is obtained by an additive method, and can be made of different sizes according to actual needs, so that the die to be tested is filled with the conductive plating layer through the connecting hole through the line conductor. The metal measuring points of the package carrier form an electrical connection.
本發明又一方面提供一種多晶粒測試介面模組的結構設計,包含:基板,設有貫通孔;數個封裝載板,嵌設於該基板之貫通孔內;至少 一介電層,覆設在該基板之表面及該貫通孔中;連接孔,設於該介電層上;至少一導電鍍層,覆設在該介電層和該連接孔中;以及線路導體,設於對應連接孔的位置,該線路導體透過該連接孔與封裝載板做電性連接。 A further aspect of the present invention provides a structural design of a multi-die test interface module, comprising: a substrate provided with a through hole; and a plurality of package carrier plates embedded in the through hole of the substrate; a dielectric layer is disposed on the surface of the substrate and the through hole; a connection hole is disposed on the dielectric layer; at least one conductive plating layer is disposed on the dielectric layer and the connection hole; and the line conductor And disposed at a position corresponding to the connection hole, the line conductor is electrically connected to the package carrier through the connection hole.
本發明再一方面提供一種多晶粒測試介面模組的結構設計,包含:基板,設有貫通孔,貫穿該基板的第一表面和第二表面;數個封裝載板,嵌設於該基板之貫穿孔上;第一介電層覆設於該基板之第一表面,第二介電層覆設該基板之第二表面,且該第一介電層及第二介電層並對應該貫通孔而覆蓋該封裝載板;連接孔,分別設於該第一介電層和第二介電層處;第一導電鍍層,設在該第一介電層上對應該連接孔位置,第二導電鍍層,設在該第二介電層上對應該連接孔位置;以及第一線路導體,設在第一導電鍍層且對應該連接孔位置,以及第二線路導體,設在第二導電鍍層且對應該連接孔位置,該第二線路導體尺寸大於該第一線路導體尺寸。 According to still another aspect of the present invention, a structural design of a multi-die test interface module includes: a substrate having a through hole extending through the first surface and the second surface of the substrate; and a plurality of package carriers mounted on the substrate The first dielectric layer is disposed on the first surface of the substrate, the second dielectric layer covers the second surface of the substrate, and the first dielectric layer and the second dielectric layer are correspondingly The through hole covers the package carrier; the connection holes are respectively disposed at the first dielectric layer and the second dielectric layer; the first conductive plating layer is disposed on the first dielectric layer corresponding to the position of the connection hole, a second conductive plating layer disposed on the second dielectric layer corresponding to the position of the connection hole; and a first line conductor disposed on the first conductive plating layer and corresponding to the connection hole position, and the second line conductor disposed on the second conductive plating layer And corresponding to the location of the connection hole, the second line conductor size is larger than the first line conductor size.
依據本發明上述之實施例,該介電層包含了兩個以上的介電層,更包含一延長尺寸的線路導體,位於該兩介電層之間。 According to the above embodiments of the present invention, the dielectric layer comprises more than two dielectric layers, and further comprises an extended size line conductor between the two dielectric layers.
本發明的多晶粒測試介面模組,具有以下功效;在剛性基板上設有多個貫穿的貫通孔,該貫通孔可用來嵌設多個封裝載板,再藉由介電層、佈孔、導電鍍層、刷磨、訊號的扇出佈線等步驟建構整合成一薄型的測試介面模組,達到縮減將訊號扇開的厚度,進而縮短傳輸路徑,從而能夠解決習知技術中測試介面板需要焊接導致成品厚度變厚而而影響高頻訊號傳輸效能變差的技術問題。並且,本發明能提升在測試介面板上的訊號完整性(Signal Integration,SI)及電源完整性(Power Integration,PI)的電性表現,符合高頻高速測試的應用。再者,本發明除可提升線路的結合力和線路的可靠度 外,也能提升測試介面模組平面度,利於探針測試座組配,亦有助於產品製程的良率提升。 The multi-die test interface module of the present invention has the following effects; a plurality of through-holes are formed in the rigid substrate, and the through-holes can be used to embed a plurality of package carriers, and then through the dielectric layer and the cloth holes Steps such as conductive plating, brushing, and fan-out wiring of the signal are integrated into a thin test interface module, which reduces the thickness of the signal fan and shortens the transmission path, thereby solving the problem that the test interface panel needs to be soldered in the prior art. The technical problem that the thickness of the finished product becomes thick and the high-frequency signal transmission performance is deteriorated. Moreover, the present invention can improve the electrical performance of Signal Integration (SI) and Power Integration (PI) on the test interface panel, and is suitable for applications of high frequency and high speed testing. Furthermore, the present invention can improve the bonding strength of the line and the reliability of the line. In addition, it can also improve the flatness of the test interface module, which is beneficial to the probe test set assembly, and also contributes to the improvement of the yield of the product process.
再者,本發明實施例,藉由測試介面模組的線路導體的佈線製程做延伸,可使其測點位置符合實際晶粒測點位置,不需透過焊接做銜接,可解決習知影響後續組裝的耐熱衝擊問題。是以,本發明只要具有多個載板或封裝載板,且每一載板外露設有金屬測點或板上具有線路或圖騰(Pattern)都可作為測點,即可透過本案上述的製造方法(製程)將多個載板佈建整合成一薄型的測試介面模組或空間轉換模組,利於該測試介面模組的扇出佈線製程,達到縮減將訊號扇開的厚度,進而縮短傳輸路徑,以提供一次許多顆晶粒的測試,可由一次測試單一晶粒擴增為多晶粒,提供高效率的測試功效。 Furthermore, in the embodiment of the present invention, by extending the wiring process of the line conductor of the test interface module, the position of the measuring point can be made to conform to the position of the actual grain measuring point, and the connection is not required by welding, and the conventional influence can be solved. Thermal shock resistance of assembly. Therefore, the present invention can be manufactured by the above-mentioned manufacturing as long as it has a plurality of carrier boards or package carrier boards, and each of the carrier boards is provided with a metal measuring point or a circuit having a circuit or a pattern as a measuring point. The method (process) integrates a plurality of carrier boards into a thin test interface module or a space conversion module, which facilitates the fan-out wiring process of the test interface module, thereby reducing the thickness of the signal fan opening, thereby shortening the transmission path. In order to provide a test of many grains at a time, it is possible to expand a single crystal into a multi-grain in one test, providing high-efficiency test efficiency.
10A‧‧‧測試載板 10A‧‧‧ test carrier
101A‧‧‧導電凸塊 101A‧‧‧conductive bumps
11A‧‧‧探針測試座 11A‧‧‧ probe test seat
111A‧‧‧探針 111A‧‧‧Probe
13A‧‧‧測試移動載台 13A‧‧‧Test mobile stage
14A‧‧‧晶粒 14A‧‧‧ grain
141A‧‧‧測點 141A‧‧‧Measurement points
15A‧‧‧測試介面母板 15A‧‧‧Test Interface Motherboard
151A‧‧‧連接墊 151A‧‧‧ connection pad
16A‧‧‧承載介面座 16A‧‧‧ Carrying interface seat
161A‧‧‧金屬連接墊 161A‧‧‧Metal connection pad
2、2’‧‧‧測試介面模組 2, 2'‧‧‧ test interface module
20‧‧‧剛性基板 20‧‧‧Rigid substrate
21‧‧‧貫通孔 21‧‧‧through holes
22‧‧‧配置凹槽 22‧‧‧Configure the groove
30‧‧‧封裝載板 30‧‧‧Package carrier
31‧‧‧金屬測點 31‧‧‧Metal measuring points
40‧‧‧介電層 40‧‧‧ dielectric layer
41‧‧‧第一介電層 41‧‧‧First dielectric layer
42‧‧‧第二介電層 42‧‧‧Second dielectric layer
44‧‧‧連接孔 44‧‧‧connection hole
45‧‧‧第一連接孔 45‧‧‧First connection hole
46‧‧‧第二連接孔 46‧‧‧Second connection hole
45’‧‧‧第一填充有導電鍍層的連接孔 45'‧‧‧ first connection hole filled with conductive plating
46’‧‧‧第二填充有導電鍍層的連接孔 46'‧‧‧Second connection hole filled with conductive plating
50‧‧‧導電鍍層 50‧‧‧ Conductive coating
51‧‧‧第一導電鍍層 51‧‧‧First conductive coating
52‧‧‧第二導電鍍層 52‧‧‧Second conductive coating
51’‧‧‧第一導電鍍層(如底面導電線路圖案) 51'‧‧‧First conductive coating (such as the bottom conductive trace pattern)
52’‧‧‧第二導電鍍層(如頂面導電線路圖案) 52'‧‧‧Second conductive coating (such as top conductive trace pattern)
71、71’‧‧‧第一線路導體 71, 71'‧‧‧ First line conductor
72‧‧‧第二線路導體 72‧‧‧Second line conductor
第1圖顯示習知的單晶粒測試架構的示意圖。 Figure 1 shows a schematic diagram of a conventional single-die test architecture.
第2圖顯示習知的多晶粒測試架構的示意圖。 Figure 2 shows a schematic of a conventional multi-die test architecture.
第3A~3H圖顯示本發明多晶粒測試介面模組的製造方法的流程示意圖。 3A-3H are schematic flow charts showing the manufacturing method of the multi-die test interface module of the present invention.
第4圖顯示本發明的多晶粒測試介面模組的結構示意圖。 Figure 4 is a block diagram showing the structure of the multi-die test interface module of the present invention.
第5圖顯示本發明的多晶粒測試介面模組的俯視示意圖。 Figure 5 is a top plan view of the multi-die test interface module of the present invention.
第6圖顯示本發明中將多晶粒測試介面模組與晶粒組立的部份剖視示意圖。 Figure 6 is a partial cross-sectional view showing the multi-die test interface module and the die set in the present invention.
第7圖顯示本發明中將多晶粒測試介面模組作為垂直式探測結構與多 個晶粒組立的示意圖。 Figure 7 shows the multi-die test interface module as a vertical detection structure and more in the present invention. A schematic diagram of the formation of individual grains.
為使本發明的目的、技術方案及效果更加清楚、明確,以下參照圖式並舉實施例對本發明進一步詳細說明。本發明說明書和所附申請專利範圍中所使用的冠詞「一」一般地可以被解釋為意指「一個或多個」,除非另外指定或從上下文可以清楚確定單數形式。並且,在所附圖式中,結構、功能相似或相同的元件是以相同元件標號來表示。 The present invention will be further described in detail below with reference to the drawings and embodiments. The article "a" or "an" is used in the claims Also, in the figures, elements that are structurally, functionally similar or identical are denoted by the same reference numerals.
首先,本發明是在一個剛性且平整的基板材料上,製作而貫穿多個貫通孔,用來嵌設多個封裝載板。在因應該封裝載板的尺寸時,會先利用蝕刻或機械加工或放電加工方式製成複數個貫通孔。對於封裝載板崁設置於該貫通孔內的方式有很多,具體地,先以一載體乘載剛性基板再將多個封裝載板對位正確後,即可將封裝載板埋入而定位於貫穿孔內,利於進行後續的增層的加入介電材料等等製程步驟,但不侷限前述配置方式。再者,剛性基板的高度,具體地,與封裝載板上外露的金屬測點的高度同高,或者微高些,但不侷限前述高度設計。 First, the present invention is fabricated on a rigid and flat substrate material through a plurality of through holes for embedding a plurality of package carriers. When the size of the carrier is to be packaged, a plurality of through holes are first formed by etching or machining or electrical discharge machining. There are many ways for the package carrier to be disposed in the through hole. Specifically, after the carrier is loaded with a rigid substrate and the plurality of package carriers are aligned correctly, the package carrier can be buried and positioned. Throughout the hole, it is advantageous to carry out the subsequent step of adding the dielectric material and the like, but the above configuration is not limited. Furthermore, the height of the rigid substrate, in particular, is the same as the height of the exposed metal measuring points on the package carrier, or slightly higher, but is not limited to the aforementioned height design.
另外,在本發明中,該封裝載板可為單一晶粒載板,而且封裝載板的底、頂面的金屬測點的配置數量及間距僅為便利本案說明,都不侷限之,只要能提供多個載板,且每一載板外露設有金屬測點或板上具有線路或圖騰(Pattern)都能作為測點,可透過本發明的製造方法(製程)將多個載板建構整合成一薄型的測試介面模組或空間轉換模組,利於該測試介面模組的扇出佈線製程。而且多個封裝載板30完成最後製程步驟的配置後,其兩側端藉助剛性基板做為支撐,其中只需對增層步驟進行厚度控制,即能有效控 制整合成一體後的厚度,達到縮減將訊號扇開的厚度,進而縮短傳輸路徑,以提供一次許多顆晶粒的測試,提供高效率的測試功效。 In addition, in the present invention, the package carrier can be a single-die carrier, and the number and spacing of the metal measuring points on the bottom and top surfaces of the package carrier are only convenient for the description of the present invention, and are not limited, as long as A plurality of carrier boards are provided, and each of the carrier boards is provided with a metal measuring point or a circuit with a circuit or a pattern as a measuring point, and the plurality of carrier boards can be integrated and integrated by the manufacturing method (process) of the present invention. Forming a thin test interface module or a space conversion module facilitates the fan-out wiring process of the test interface module. Moreover, after the plurality of package carriers 30 are configured in the final process step, the two sides of the package are supported by a rigid substrate, wherein only thickness control of the layering step is required, that is, effective control The thickness of the integrated system is reduced to reduce the thickness of the signal, thereby shortening the transmission path to provide a test of many grains at a time, providing high efficiency test efficiency.
請參閱第3A~3H圖,其顯示本發明的測試介面模組的製造方法的流程示意圖。 Please refer to FIGS. 3A-3H for a schematic flow chart showing a method of manufacturing the test interface module of the present invention.
首先,如第3A圖所示,提供一基板20,基板20為硬質(剛性)且平整的材料,本實施例可採用玻璃纖維(Glass fiber)之有機基板、玻璃、碳化矽纖維(Silicon carbide,SiC)、陶瓷(Ceramic)、藍寶石基板(Sapphire)等等。 First, as shown in FIG. 3A, a substrate 20 is provided. The substrate 20 is a hard (rigid) and flat material. In this embodiment, an organic substrate of glass fiber, glass, and silicon carbide can be used. SiC), ceramic (Ceramic), sapphire substrate (Sapphire) and the like.
如第3B圖所示,形成一或多個貫通孔21,貫通孔21貫穿該剛性基板20的第一表面(如下表面)和第二表面(如上表面)。可根據材料的特性,採取濕式鑽孔或乾式鑽孔來製作貫通孔21,達到上下導通結果。濕式鑽孔可採用例如:化學藥水蝕刻、感光成孔等等;乾式鑽孔可採用例如:機械鑽孔、雷射鑽孔、電漿鑽孔、噴砂鑽孔、超音波鑽孔,以及放電加工等等。前述僅為舉例說明,但不侷限之。 As shown in FIG. 3B, one or a plurality of through holes 21 are formed, and the through holes 21 penetrate the first surface (the surface) and the second surface (the upper surface) of the rigid substrate 20. According to the characteristics of the material, the through hole 21 can be formed by wet drilling or dry drilling to achieve the upper and lower conduction results. Wet drilling can be performed, for example, by chemical etch, sensitization, etc.; dry drilling can be performed, for example, mechanical drilling, laser drilling, plasma drilling, sand blasting, ultrasonic drilling, and discharging. Processing and so on. The foregoing is illustrative only, but not limiting.
如第3C圖所示,在剛性基板20之貫穿孔21內置入封裝載板30。具體地,完成崁配封裝載板30於貫穿孔21內,封裝載板30外露的金屬測點31的高度可與剛性基板20同高,但不侷限之。在此步驟中,封裝載板可為單一晶粒載板,或為其他載板,只要能提供每一載板外露設有金屬測點或板上具有線路或圖騰(Pattern)都能作為測點,內部具細密佈線設計,足以傳輸訊號即可。 As shown in FIG. 3C, the package carrier 30 is built in the through hole 21 of the rigid substrate 20. Specifically, the packaged carrier 30 is completed in the through hole 21, and the height of the metal measuring point 31 exposed by the package carrier 30 can be the same as that of the rigid substrate 20, but is not limited. In this step, the package carrier can be a single die carrier, or other carrier, as long as each carrier is exposed with a metal measuring point or a circuit with a line or a pattern can be used as a measuring point. The interior has a fine wiring design that is sufficient to transmit signals.
如第3D圖所示,為增層步驟;分別於剛性基板20的第一表面(如下表面)和第二表面(如上表面)上使用絕緣材料進行增層40,於第一表面上形成第一介電層41,於第二表面上形成第二介電層42。增層法製作的介電 層40也會填充於貫通孔21中並覆蓋封裝載板30。具體地,本案以增層法製作的介電層可透過PCB熱壓合、塗佈、濺鍍或原子層沉積(Atomic layer deposition,ALD)等等方式產生。其絕緣物料可為固體(如乾式介電材料、靶材)、或液料(如濕式介電材料)等。最主要在該剛性基板之表面及該貫通孔中形成介電層的步驟中,位在剛性基板之表面的該介電層的高度係高於封裝載板上的金屬測點,以利包覆該封裝載板。 As shown in FIG. 3D, it is a build-up step; forming a build-up layer 40 on the first surface (such as the surface) and the second surface (such as the surface) of the rigid substrate 20, respectively, to form a first layer on the first surface. The dielectric layer 41 forms a second dielectric layer 42 on the second surface. Dielectric produced by the layering method The layer 40 is also filled in the through holes 21 and covers the package carrier 30. Specifically, the dielectric layer produced by the build-up method in the present invention can be produced by thermal compression bonding, coating, sputtering, or atomic layer deposition (ALD) of the PCB. The insulating material may be a solid (such as a dry dielectric material, a target), or a liquid material (such as a wet dielectric material). In the step of forming a dielectric layer mainly on the surface of the rigid substrate and the through hole, the height of the dielectric layer on the surface of the rigid substrate is higher than the metal measuring point on the package carrier to cover The package carrier.
在此步驟中,第一介電層41覆蓋第一表面,第二介電層42覆蓋第二表面後,介電層40微高於封裝載板30的頂面的金屬測點31的高度(或底面的金屬測點31的高度),一般來說是不超過50um(即,≦50um)。因此,對於剛性基板20下、上兩表面所覆蓋的第一介電層41、第二介電層42只對封裝載板30的底、頂面的金屬測點31大約總共增加於100um。換言之,前述多個封裝載板30的配置方式主要是其兩側藉助剛性基板20做支撐,只需對此增層步驟進行厚度控制,即能有效控制整合成一體後的厚度。 In this step, the first dielectric layer 41 covers the first surface, and after the second dielectric layer 42 covers the second surface, the dielectric layer 40 is slightly higher than the height of the metal measuring point 31 of the top surface of the package carrier 30 ( Or the height of the metal measuring point 31 on the bottom surface, generally no more than 50um (ie, ≦50um). Therefore, the first dielectric layer 41 and the second dielectric layer 42 covered by the lower and upper surfaces of the rigid substrate 20 are only increased by about 100 um to the metal measuring points 31 of the bottom and top surfaces of the package carrier 30. In other words, the arrangement of the plurality of package carriers 30 is mainly supported by the rigid substrate 20 on both sides thereof, and only the thickness control of the layering step is required, that is, the thickness after integration is effectively controlled.
如第3E圖所示,為佈孔步驟;在第一介電層41和第二介電層42處製作連接孔。在此步驟中,分為第一連接孔45(位在底面)、第二連接孔46(位在頂面),其主要是用作分別將第一介電層41、第二介電層42貫穿而連通於封裝載板30的底面、頂面的金屬測點31處。第一、第二連接孔45、46的成孔方式,例如可透過濕式蝕刻(如化學藥水蝕刻)或乾式蝕刻(如雷射、電漿、噴砂、超音波、放電加工製程等等)的方式製得。 As shown in FIG. 3E, it is a cloth hole step; a connection hole is formed at the first dielectric layer 41 and the second dielectric layer 42. In this step, the first connection hole 45 (located on the bottom surface) and the second connection hole 46 (located on the top surface) are mainly used to respectively serve the first dielectric layer 41 and the second dielectric layer 42. The metal measuring points 31 are connected to the bottom surface and the top surface of the package carrier 30. The first and second connecting holes 45, 46 are formed by a wet etching (such as chemical etch) or dry etching (such as laser, plasma, sand blasting, ultrasonic, electric discharge machining, etc.). Made by the way.
如第3F圖所示,為導電鍍層步驟;在第一介電層41和第二介電層42上覆蓋有導電鍍層50,以及分別對第一、第二連接孔45、46中形成有導電鍍層50,亦即形成第一、第二填充有導電物質的連接孔45’、46’(見第3G 圖),其主要用作將導電鍍層50與封裝載板30上的金屬測點31(見第3G圖)電性連接。在前述情況下,第一、第二填充有導電物質的連接孔45’、46’也可電性連接位在導電鍍層50上的金屬線路導體或金屬層,也可用來連接金屬層和位於最外層的金屬墊。在此步驟中,導電鍍層50形成於介電層40曝露的表面上及第一、第二連接孔45、46內。該導電鍍層50之一個可行的製作法,先用濺鍍方式在介電層40和連接孔45、46的壁面鍍上一層薄的電極層,之後將剛性基板40放入電解液中,進行氧化還原電解,來形成導電鍍層50。關於導電鍍層50的製作,也可以採用離子鍍膜、化學鍍膜、或一般化學置換沉積等方式。 As shown in FIG. 3F, it is a conductive plating step; the first dielectric layer 41 and the second dielectric layer 42 are covered with a conductive plating layer 50, and conductive layers are formed in the first and second connection holes 45, 46, respectively. The plating layer 50, that is, the first and second connection holes 45', 46' filled with the conductive material (see the 3G) FIG.) is mainly used to electrically connect the conductive plating layer 50 with the metal measuring points 31 (see FIG. 3G) on the package carrier 30. In the foregoing case, the first and second conductive-filled connection holes 45', 46' can also be electrically connected to the metal line conductor or metal layer on the conductive plating layer 50, and can also be used to connect the metal layer and be located at the most Metal pad on the outer layer. In this step, the conductive plating layer 50 is formed on the exposed surface of the dielectric layer 40 and in the first and second connection holes 45, 46. A possible fabrication method of the conductive coating 50 is to first deposit a thin electrode layer on the wall surface of the dielectric layer 40 and the connection holes 45, 46 by sputtering, and then place the rigid substrate 40 in the electrolyte for oxidation. The electrolysis is reduced to form the electroconductive plating layer 50. Regarding the production of the conductive plating layer 50, an ion plating film, an electroless plating film, or a general chemical displacement deposition method may be employed.
如第3G圖所示,為刷磨平整步驟;在剛性基板40的第一表面和第二表面進行平整式刷磨,即以第一表面和第二表面為基準,對高出於第一表面和第二表面的導電鍍層50進行刷磨使其為薄層並加以平整其平面度。如此一來,對於板面的平面度可得到較佳的控制,將更有助於後續測試應用的組配效果。在此步驟中,例如保留對應該第一介電層41的第一連接孔45位置形成第一導電鍍層51’(如底面導電線路圖案),和對應該第二介電層42的第二連接孔46位置形成第二導電鍍層52’(如頂面導電線路圖案)。第一導電鍍層51’和第二導電鍍層52’分別對應剛性基板20內的封裝載板30底、頂面的金屬測點31的位置,而且是相互電性連接的。 As shown in FIG. 3G, the brushing and flattening step is performed on the first surface and the second surface of the rigid substrate 40, that is, the first surface and the second surface are referenced to be higher than the first surface. The conductive coating 50 on the second surface is brushed to a thin layer and flattened to its flatness. In this way, the flatness of the board surface can be better controlled, which will be more helpful for the assembly effect of subsequent test applications. In this step, for example, the first conductive via 51' corresponding to the first dielectric layer 41 is left to form a first conductive plating layer 51' (such as a bottom conductive trace pattern), and a second connection corresponding to the second dielectric layer 42 is formed. The location of the aperture 46 forms a second conductive coating 52' (e.g., a top conductive trace pattern). The first conductive plating layer 51' and the second conductive plating layer 52' respectively correspond to the positions of the metal measuring points 31 of the bottom and top surfaces of the package carrier 30 in the rigid substrate 20, and are electrically connected to each other.
如第3H圖所示,為佈線步驟;在對應第一導電鍍層51’的位置形成第一線路導體71,和在對應該第二導電鍍層52’的位置形成尺寸較該第一線路導體71大的第二線路導體72,其中,第一線路導體71之間的間距也小於第二線路導體72之間的間距。因此,配合參見第5圖所示,前述製程步 驟能夠將多個載板整合而建構成一薄型的測試介面模組2。在此步驟中,亦可以採用加成法(或減去法)來製作第一線路導體71,且可依實際需求進行不同尺寸的製得。另外,當該線路導體位於該兩介電層41、41之間時,並可依實際需求而增大線路導體的尺寸。上述的加成法(或減去法)為一種習知製作法,故在此不另加贅述。 As shown in FIG. 3H, it is a wiring step; the first line conductor 71 is formed at a position corresponding to the first conductive plating layer 51', and the size is formed larger than the first line conductor 71 at a position corresponding to the second conductive plating layer 52'. The second line conductor 72, wherein the spacing between the first line conductors 71 is also less than the spacing between the second line conductors 72. Therefore, as shown in Figure 5, the aforementioned process steps A plurality of carrier boards can be integrated to form a thin test interface module 2. In this step, the first line conductor 71 can also be fabricated by an additive method (or subtraction method), and can be made of different sizes according to actual needs. In addition, when the line conductor is located between the two dielectric layers 41, 41, the size of the line conductor can be increased according to actual needs. The above-mentioned addition method (or subtraction method) is a conventional production method, and therefore will not be further described herein.
如第4圖所示,該測試介面模組2的第一線路導體71的尺寸和間距較小,係用來與探針測試座11A上的探針111A連接。第二線路導體72的尺寸和間距較大,係用來與印刷電路板(未圖示)的接點相連接,從而藉由薄型的測試介面模組2達到空間轉換的效果。另外,本發明的封裝載板屬單一晶粒載板,也可以是具有外露的金屬測點或板上具有線路或圖騰(Pattern)都能作為測點的載板(內部具有細密線路設計),可透過本發明的製造方法將多個載板建構整合成一薄型的測試介面模組2,利於測試介面模組2的扇出佈線製程,達到縮減將訊號扇開的厚度,進而縮短傳輸路徑,以提供一次許多顆晶粒的測試,可由一次測試單一晶粒擴增為多晶粒,提供高效率的測試功效。 As shown in FIG. 4, the first line conductor 71 of the test interface module 2 has a small size and pitch for connection to the probe 111A on the probe test stand 11A. The second line conductor 72 has a large size and spacing for connection to a contact of a printed circuit board (not shown), thereby achieving a space conversion effect by the thin test interface module 2. In addition, the package carrier of the present invention is a single-grain carrier, and may also be a carrier having an exposed metal measuring point or a circuit having a line or a pattern as a measuring point (with a fine circuit design inside). The plurality of carrier boards can be integrated into a thin test interface module 2 by the manufacturing method of the present invention, which facilitates testing the fan-out wiring process of the interface module 2, thereby reducing the thickness of the signal fan opening, thereby shortening the transmission path. Provides testing of many grains at a time, which can be expanded into multiple grains by testing a single grain at a time, providing high efficiency test efficiency.
對於上述關於增層步驟的層數是以製作上下各一層來作說明,也就是說,第一介電層41和第二介電層42的數量各以一層來例示說明。可以理解的是,第一介電層41和第二介電層42可以各包含不止一層的介電層。一般來說,第二介電層42的數量僅需一至兩層介電層即可,而當第一介電層41因需要進行小尺寸至大尺寸(或大尺寸至小尺寸)的空間轉換,其介電層數量相對較多,視實際情況需求,可配置多層介電層。如第6圖、第7圖所示,於相鄰上下兩個介電層41、41之間可在上述佈線步驟中將第一線路導體 71’延長其尺寸大小,以形成類似金屬層或金屬線路,作為電路的一部分(如第6圖、第7圖所示)。但,若實際進行測試時有其他應用需求(例如增加信號路徑量測點、或調協電路等方面)時,是能以增加層數或修改線路設計來達到需求。亦即,對於上述增層步驟、佈孔步驟、佈線步驟,相應地做增加層數(增加該增層步驟的數量)、修改相鄰上下層電性連接的數量、位置與方式、以及修改相鄰上下層電性佈線的數量與位置等等相關設計,但基本上並不脫離上述的製造方法的步驟。 The number of layers for the build-up step described above is described by making the upper and lower layers, that is, the number of the first dielectric layer 41 and the second dielectric layer 42 is exemplified by one layer. It can be understood that the first dielectric layer 41 and the second dielectric layer 42 can each comprise more than one dielectric layer. Generally, the number of the second dielectric layers 42 only needs one to two dielectric layers, and when the first dielectric layer 41 needs to be converted into a small size to a large size (or a large size to a small size) The number of dielectric layers is relatively large, and a plurality of dielectric layers can be disposed according to actual needs. As shown in FIG. 6 and FIG. 7, the first line conductor can be connected between the adjacent upper and lower dielectric layers 41, 41 in the above wiring step. The 71' is extended in size to form a metal-like or metal-like line as part of the circuit (as shown in Figures 6 and 7). However, if there are other application requirements (such as adding signal path measurement points or tuning circuits) when actually testing, it is possible to increase the number of layers or modify the circuit design to meet the demand. That is, for the above-mentioned layering step, the cloth hole step, and the wiring step, the number of layers is increased correspondingly (the number of the layer-adding steps is increased), the number, position and mode of the adjacent upper and lower layers are modified, and the phase is modified. The number of adjacent upper and lower electrical wirings is designed in relation to the position and the like, but basically does not deviate from the steps of the above manufacturing method.
亦即,在上述佈線步驟中,當封裝載板30的金屬測點31位置與實際的晶粒14A的測點141A位置有落差,該線路導體位於該兩介電層41、41之間時,可依實際需求而增大其尺寸。參見第6圖所示,當第一線路導體的測點位置與實際的晶粒14A的測點141A位置為不同時,可在佈線步驟中進行延長為大尺寸的第一線路導體71’,即可順利符合實際的晶粒14A的測點141A位置而順利達成電性接觸。 That is, in the above wiring step, when the position of the metal measuring point 31 of the package carrier 30 is different from the position of the measuring point 141A of the actual die 14A, the line conductor is located between the two dielectric layers 41, 41. The size can be increased according to actual needs. Referring to FIG. 6, when the position of the measuring point of the first line conductor is different from the position of the measuring point 141A of the actual die 14A, the first line conductor 71' extended to a large size may be performed in the wiring step, that is, The electrical contact can be smoothly achieved by smoothly meeting the position of the measuring point 141A of the actual die 14A.
承上所述,本發明係以剛性基板20的底、頂兩面皆形成線路導體(即第一線路導體71和第二線路導體72)來作說明,但也可僅針對小尺吋的第一線路導體71在上述佈線步驟中改製成為大尺吋的第二線路導體,而省去佈建第一線路導體。而第二線路導體係可用來佈建空間轉換所需的線路或扇出(Fan-out)線路。也就是說,第一線路導體和第二線路導體的某些部分都用來佈建空間轉換所需的線路或扇出(Fan-out)線路,這樣可以充分利用剛性基板20底、頂兩面的線路導體來作線路Fan-out,如此也可以大為減少層數,有效縮減板厚。 As described above, the present invention is described by forming the line conductors (i.e., the first line conductor 71 and the second line conductor 72) on both the bottom and the top of the rigid substrate 20, but it is also possible only for the first of the small scales. The line conductor 71 is modified into a second line conductor of a large size in the above-described wiring step, and the first line conductor is omitted. The second line guidance system can be used to construct the line or fan-out line required for space conversion. That is to say, some parts of the first line conductor and the second line conductor are used to construct a line or fan-out line required for space conversion, so that the bottom and top sides of the rigid substrate 20 can be fully utilized. The line conductor is used as the line Fan-out, which can also greatly reduce the number of layers and effectively reduce the thickness of the board.
再者,如第7圖所示,當本發明測試介面模組作為垂直式探 測結構與多個晶粒組立時,封裝載板30的金屬測點31位置與實際的晶粒14A的測點141A位置有落,只需在佈線步驟中將測試介面模組2頂面的第一線路導體71’進行延長大尺寸製作,之後依序往上增加有一增層步驟形成另一第一介電層41、一佈孔步驟形成另一第一填充有導電物質的連接孔45’、一導電鍍層及刷磨平整步驟形成另一第一導電鍍層51’、一佈線步驟形成另一第一線路導體71,如此即快速地形成一垂直式多晶粒探測的測試介面模組2’。最終以最上方的第一線路導體71順利配合實際多晶粒14A的多個測點141A位置而達成電性接觸的測試功效(如第7圖所示)。 Furthermore, as shown in FIG. 7, when the test interface module of the present invention is used as a vertical probe When the measuring structure and the plurality of crystal grains are assembled, the position of the metal measuring point 31 of the package carrier 30 and the position of the measuring point 141A of the actual die 14A fall, and only the top surface of the test interface module 2 is to be tested in the wiring step. A line conductor 71' is made to be elongated and large-sized, and then sequentially added with a step of adding a layer to form another first dielectric layer 41, and a step of forming a hole to form another first connecting hole 45' filled with a conductive substance, A conductive plating and brushing flattening step forms another first conductive plating layer 51', and a wiring step forms another first line conductor 71, thus rapidly forming a vertical multi-die detecting test interface module 2'. Finally, the test performance of the electrical contact is achieved by smoothly matching the position of the plurality of measuring points 141A of the actual multi-die 14A with the uppermost first line conductor 71 (as shown in FIG. 7).
本發明並提供一種測試介面模組2的結構設計,其可利用如上描述的方法製得。參見第4圖及第5圖所示,本發明的測試介面模組2包含:一剛性基板20、崁設有多個封裝載板30的一或多個貫通孔21、至少一第一介電層41、第二介電層42、多個連接孔44、至少一經過導電鍍層及刷磨平整步驟的導電鍍層50’、第一線路導體71以及第二線路導體72。 The present invention also provides a structural design of the test interface module 2 that can be made using the method described above. As shown in FIG. 4 and FIG. 5 , the test interface module 2 of the present invention comprises: a rigid substrate 20 , one or more through holes 21 provided with a plurality of package carriers 30 , and at least one first dielectric The layer 41, the second dielectric layer 42, the plurality of connection holes 44, the at least one conductive plating layer 50' subjected to the conductive plating and the brushing and flattening step, the first line conductor 71 and the second line conductor 72.
其中,該貫通孔21設有一或多個,且每一貫通孔21貫穿剛性基板20的第一表面(如底部表面)和第二表面(如頂部表面)。這些貫通孔21的深度足以封裝載板30位於其內,達成多個封裝載板30崁置於剛性基板之貫穿孔內(如第5圖所示),使封裝載板30外露的金屬測點31的高度可與剛性基板20同高或微略低些。 The through hole 21 is provided with one or more, and each through hole 21 penetrates through a first surface (such as a bottom surface) of the rigid substrate 20 and a second surface (such as a top surface). The depth of the through holes 21 is sufficient for the package carrier 30 to be located therein, and the plurality of package carriers 30 are placed in the through holes of the rigid substrate (as shown in FIG. 5) to expose the metal points of the package carrier 30. The height of 31 may be the same as or slightly lower than the rigid substrate 20.
其中,第一介電層41覆設於剛性基板20之第一表面,第二介電層42覆設於剛性基板20之第二表面,第一介電層41及第二介電層42並對應貫通孔21而覆蓋於封裝載板30底、頂兩面的金屬測點31處,使第一介電層41(或第二介電層42)微高於封裝載板30的底面的金屬測點31的高度(或頂面 的金屬測點31的高度),亦即不超過50um(即≦50um),因此,第一介電層41、第二介電層42只對封裝載板30的底/頂面的金屬測點31大約總共只增加100um。也就是,多個封裝載板30崁置於貫穿孔21並經過增設第一、二介電層41、42之後,主要是封裝載板30藉助剛性基板20做剛性支撐。以及,分別在第一介電層41和第二介電層42設有第一連接孔45(位在底面)、第二連接孔46(位在頂面),用作分別將第一介電層41、第二介電層42貫穿而連通於封裝載板30的底面、頂面的金屬測點31處。 The first dielectric layer 41 is disposed on the first surface of the rigid substrate 20, and the second dielectric layer 42 is disposed on the second surface of the rigid substrate 20, and the first dielectric layer 41 and the second dielectric layer 42 are Corresponding to the through hole 21 and covering the metal measuring points 31 on the bottom and top surfaces of the package carrier 30, the first dielectric layer 41 (or the second dielectric layer 42) is slightly higher than the metal surface of the package carrier 30. Point 31 height (or top surface) The height of the metal measuring point 31), that is, no more than 50um (ie, 50um), therefore, the first dielectric layer 41 and the second dielectric layer 42 only have metal points on the bottom/top surface of the package carrier 30. 31 is only about 100um in total. That is, after the plurality of package carriers 30 are placed in the through holes 21 and the first and second dielectric layers 41 and 42 are added, the package carrier 30 is mainly rigidly supported by the rigid substrate 20. And the first dielectric layer 41 and the second dielectric layer 42 are respectively provided with a first connection hole 45 (located on the bottom surface) and a second connection hole 46 (located on the top surface) for respectively serving the first dielectric layer The layer 41 and the second dielectric layer 42 penetrate and communicate with the metal measuring points 31 of the bottom surface and the top surface of the package carrier 30.
其中,該至少一經過導電鍍層及刷磨平整步驟的導電鍍層50’,配合參見第3G圖所示,在第一介電層41及第二介電層42上設有第一導電鍍層51’(如底面導電線路圖案)、第二導電鍍層52’(如頂面導電線路圖案),並使第一導電鍍層51’(如底面導電線路圖案)、第二導電鍍層52’(如頂面導電線路圖案)分別對應第一填充有導電物質的連接孔45’位置、第二填充有導電物質的連接孔46’位置處。且第一導電鍍層51’和第二導電鍍層52’也是分別對應於剛性基板20內的封裝載板30的底、頂面的金屬測點31位置,而且能分別透過該第一填充有導電物質的連接孔45’位置、該第二填充有導電物質的連接孔46’而與封裝載板30的底、頂面的金屬測點31相互電性連接。 The at least one conductive plating layer 50' that has undergone the conductive plating and the brushing and flattening step is provided with a first conductive plating layer 51' on the first dielectric layer 41 and the second dielectric layer 42 as shown in FIG. 3G. (such as the bottom conductive trace pattern), the second conductive plating 52' (such as the top conductive trace pattern), and the first conductive plating 51' (such as the bottom conductive trace pattern), the second conductive plating 52' (such as the top conductive The line patterns respectively correspond to the positions of the first connection hole 45' filled with the conductive material and the second connection hole 46' filled with the conductive material. The first conductive plating layer 51' and the second conductive plating layer 52' also correspond to the positions of the metal measuring points 31 of the bottom and top surfaces of the package carrier 30 in the rigid substrate 20, and can respectively pass through the first filled conductive material. The connection hole 45' is located at the second connection with the conductive substance connection hole 46' and is electrically connected to the metal measuring point 31 of the bottom and top surfaces of the package carrier 30.
配合參見第3G圖及第3H圖所示,其中,第一線路導體71,形成於第一導電鍍層51’(如底面導電線路圖案)上且對應該第一填充有導電物質的連接孔45’位置;第二線路導體72,形成於第二導電鍍層52’(如頂面導電線路圖案)上且對應該第二填充有導電物質的連接孔46’位置。第二線路導體52的尺寸大於該第一線路導體51的尺寸,第二線路導體52之間的間距也大於第一線路導體51之間的間距。第一線路導體51用來與探針測試座 11A(具探針111A)連接,第二線路導體52用來與印刷電路板(未圖示)的接點連接。使得測試介面模組2達到可作為測試時的空間轉換功效。本發明測試介面模組2透過上述結構將多個封裝載板建構整合成一薄型的測試介面模組,可達到縮減將訊號扇開的厚度,進而縮短傳輸路徑,以提供一次許多顆晶粒的測試,可由一次測試單一晶粒擴增為多晶粒,提供高效率的測試效果。 For the cooperation, as shown in FIG. 3G and FIG. 3H, the first line conductor 71 is formed on the first conductive plating layer 51' (such as the bottom conductive circuit pattern) and corresponds to the first filling hole 45' filled with the conductive material. The second line conductor 72 is formed on the second conductive plating 52' (such as the top conductive wiring pattern) and corresponds to the position of the second insulating material-filled connection hole 46'. The size of the second line conductor 52 is larger than the size of the first line conductor 51, and the spacing between the second line conductors 52 is also greater than the spacing between the first line conductors 51. The first line conductor 51 is used for the probe test seat 11A (with probe 111A) is connected and second line conductor 52 is used to connect to a contact of a printed circuit board (not shown). The test interface module 2 is made to achieve space conversion efficiency as a test. The test interface module 2 of the present invention integrates a plurality of package carrier boards into a thin test interface module through the above structure, thereby reducing the thickness of the fan-opening, thereby shortening the transmission path, and providing a test of a plurality of crystal grains at a time. It can be expanded into multiple grains by testing a single grain at a time, providing a highly efficient test effect.
於一實施例中,測試介面模組2所崁置的封裝載板30應為單一晶粒載板,也可以是具有外露的金屬測點31的載板或板上具有線路或圖騰(Pattern)都能作為測點的載板(內部具細密線路設計),可透過本發明的製造方法(製程)將多個載板佈建整合成一薄型的測試介面模組2(或空間轉換模組)。 In one embodiment, the package carrier 30 disposed on the test interface module 2 should be a single die carrier, or a carrier or board with exposed metal dots 31 having a line or a pattern. The carrier board can be used as a measuring point (with a fine circuit design inside), and a plurality of carrier boards can be integrated into a thin test interface module 2 (or a space conversion module) through the manufacturing method (process) of the present invention.
於一實施例中,如第6圖所示,其顯示本發明中將測試介面模組與晶粒組立的部份剖視示意圖。當封裝載板30的金屬測點31位置與實際的晶粒14A的測點141A位置有落,亦即測試介面模組2的該第一線路導體71的測點位置與實際晶粒14A的測點141A位置為不同時,經上述佈線步驟可設計延長大尺寸為第一線路導體71’(即依實際需而延長不同尺寸),即可順利配合實際晶粒14A的測點141A位置而達成電性接觸。 In one embodiment, as shown in FIG. 6, it shows a partial cross-sectional view of the test interface module and the die assembly in the present invention. When the position of the metal measuring point 31 of the package carrier 30 and the position of the measuring point 141A of the actual die 14A are dropped, that is, the measuring position of the first line conductor 71 of the test interface module 2 and the actual die 14A are measured. When the position of the point 141A is different, the first line conductor 71' can be designed to be extended by the above-mentioned wiring step (that is, the different sizes are extended according to actual needs), and the position of the measuring point 141A of the actual crystal grain 14A can be smoothly matched to achieve electric power. Sexual contact.
於一實施例中,如第7圖所示,其顯示本發明測試介面模組作為垂直式探測結構與多個晶粒組立的示意圖。當封裝載板30的金屬測點31位置與實際的晶粒14A的測點141A位置有落,測試介面模組2的該至少一第一介電層41進一步是包含了兩個第一介電層41、41,測試介面模組對應該兩個第一介電層41、41之間所設置的是延長大尺寸的第一線路導體71’,具 體地是類似金屬層或金屬線路,作為電路的一部分。於本圖中,為配合多個晶粒的14A的多個測點141A實際位置,在該兩個第一介電層41之間設置有經佈線步驟時將延長不同尺寸的多個第一線路導體71’(即依實際需求而延長不同尺寸),並於最上方的第一介電層41依序再設有另一第一填充有導電物質的連接孔45’、一經過導電鍍層及刷磨平整步驟的另一第一導電鍍層51’以及另一第一線路導體71,如此即可快速地建構整合成一垂直式多晶粒探測的測試介面模組2’(或空間轉換模組),最終以最上方的第一線路導體71順利配合多個晶粒14A的多數個測點141A實際位置而達成電性接觸,提供高測試的使用效率。 In an embodiment, as shown in FIG. 7, it shows a schematic diagram of the test interface module of the present invention as a vertical detection structure and a plurality of crystal grains. When the position of the metal measuring point 31 of the package carrier 30 and the position of the measuring point 141A of the actual die 14A fall, the at least one first dielectric layer 41 of the test interface module 2 further includes two first dielectrics. The layers 41, 41 and the test interface module are disposed between the two first dielectric layers 41, 41 to extend the large-sized first line conductor 71'. The body is similar to a metal layer or a metal line as part of the circuit. In the figure, in order to match the actual positions of the plurality of measuring points 141A of the plurality of die 14A, a plurality of first lines extending in different sizes are provided between the two first dielectric layers 41. The conductor 71' (ie, different sizes are extended according to actual needs), and another first dielectric layer 41 filled with a conductive material is sequentially disposed on the uppermost first dielectric layer 41, and a conductive plating layer and a brush are provided. Another first conductive plating layer 51' and another first line conductor 71 are grounded, so that the test interface module 2' (or space conversion module) integrated into a vertical multi-die detection can be quickly constructed. Finally, the first line conductor 71 at the top is smoothly matched with the actual positions of the plurality of measuring points 141A of the plurality of crystal grains 14A to achieve electrical contact, thereby providing high test efficiency.
亦即,如上所述,對於垂直式探測結構而言,本發明最主要是在剛性基板配置嵌設多個封裝載板,透過此方式而使多個封裝載板30配置後其兩側端藉助剛性基板20做為支撐,已能達到縮減其厚度,後續再藉助設有介電增層和佈孔、導電鍍層、刷磨平整以及線路導體的佈線等設計,藉線路導體透過該連接孔與該封裝載板做電性連接,形成一個基本型的薄型測試介面模組2。倘若,依實際測試時有其他應用需求(例如增加信號路徑量測點、或調協電路等方面)時,是能以增加層數或修改線路設計來達到需求。亦即,對於上述增層步驟、佈孔步驟、佈線步驟,相應地做增加層數(增加該增層步驟的數量)、修改相鄰上下層電性連接的數量、位置與方式、以及修改相鄰上下層電性佈線的數量與位置等等相關設計,但基本上並不脫離上述的製造方法的步驟。參見第7圖所示,其結構設計是在增加層數時,只需將前述基本型的薄型測試介面模組2在佈線步驟中將頂面的第一線路導體71進行延長大尺寸,之後再進行增設另一薄型第一介電層41(可控制厚 度)、另一第一填充有導電物質的連接孔45’、另一第一導電鍍層51’、另一第一線路導體71,如此即快速地形成一種垂直式多晶粒探測的測試介面模組2’。最終以最上方的第一線路導體71順利配合實際多晶粒14A的多個測點141A位置而達成電性接觸的測試功效(如第7圖所示)。以此類推,即能完成增設多個層數。如此一來,即能夠有效控制整體的厚度,從而建構整合成一測試介面模組2’(或空間轉換模組)。 That is, as described above, for the vertical detecting structure, the present invention is mainly to embed a plurality of package carriers in a rigid substrate configuration, and in this manner, the plurality of package carriers 30 are disposed with the two ends thereof The rigid substrate 20 is supported as a support, and the thickness thereof can be reduced, and then designed by means of a dielectric layer and a cloth hole, a conductive plating layer, a brushing flattening, and a wiring of a line conductor, through which the line conductor passes. The package carrier is electrically connected to form a basic thin test interface module 2. If there are other application requirements (such as adding signal path measurement points, or tuning circuit) in actual testing, it is possible to increase the number of layers or modify the circuit design to meet the demand. That is, for the above-mentioned layering step, the cloth hole step, and the wiring step, the number of layers is increased correspondingly (the number of the layer-adding steps is increased), the number, position and mode of the adjacent upper and lower layers are modified, and the phase is modified. The number of adjacent upper and lower electrical wirings is designed in relation to the position and the like, but basically does not deviate from the steps of the above manufacturing method. Referring to FIG. 7, the structural design is such that when the number of layers is increased, the basic type thin test interface module 2 is required to extend the top line of the first line conductor 71 in the wiring step, and then Add another thin first dielectric layer 41 (controllable thickness) a first connection hole 45' filled with a conductive material, another first conductive plating layer 51', and another first line conductor 71, thus rapidly forming a test interface mode for vertical multi-die detection Group 2'. Finally, the test performance of the electrical contact is achieved by smoothly matching the position of the plurality of measuring points 141A of the actual multi-die 14A with the uppermost first line conductor 71 (as shown in FIG. 7). By analogy, it is possible to add multiple layers. In this way, the overall thickness can be effectively controlled to construct a test interface module 2' (or space conversion module).
本發明具有如下優點:本發明的多晶粒測試介面模組在剛性基板配置嵌設多個封裝載板,透過此方式而使多個封裝載板30配置後其兩側端藉助剛性基板20做為支撐,再藉助介電增層和佈孔、導電鍍層、刷磨平整以及線路導體,使線路導體透過該連接孔與該封裝載板做電性連接,其中只需對增層步驟進行厚度控制,即能夠有效控制整合成一體後的厚度,如此就建構整合成一薄型的測試介面模組(或空間轉換模組),達到縮減將訊號扇開的厚度,進而縮短傳輸路徑,以提供一次許多顆晶粒的測試,可由一次測試單一晶粒擴增為多晶粒,提供高效率的測試效果。甚至,在縮短訊號傳輸的路徑下,提升在多晶粒測試介面模組上的訊號完整性(Signal Integration,SI)、及電源完整性(Power Integration,PI)的電性表現,提供較佳的電性品質,亦符合高頻高速測試應用。本發明隨著有效控制整體厚變薄,電感反應降低,提升電性表現,從而能夠解決習知技術中測試介面板產生高電感或因習知迴焊所帶來的影響進而干擾高頻訊號傳輸的技術問題。而且,由於電源的傳輸路徑縮短,因此可減少習知在長路徑中需放置電容的需求,也避免了放置電容使得層數增多而導致高電感的問題發生,再者,因可減少習知迴焊所帶來的影響,也避免了製程複雜又難以控制等問題。 The present invention has the following advantages: the multi-die test interface module of the present invention has a plurality of package carrier plates embedded in a rigid substrate, and in this manner, the plurality of package carrier plates 30 are disposed, and the two sides thereof are made by the rigid substrate 20 For the support, the dielectric layer is electrically connected to the package carrier through the connection hole through the dielectric layer and the hole, the conductive coating, the brushing and the line conductor, wherein only the thickness adjustment step is performed. That is, it can effectively control the thickness of the integrated integrated body, so that it can be integrated into a thin test interface module (or space conversion module), thereby reducing the thickness of the signal fan, thereby shortening the transmission path to provide a plurality of times. The test of the crystal grains can be expanded into a single crystal by a single crystal in one test, providing a high-efficiency test effect. Even better, improve the signal integrity (SI) and power integrity (PI) electrical performance on the multi-die test interface module under the path of shortening the signal transmission, providing better performance. Electrical quality is also in line with high-frequency high-speed test applications. The invention effectively reduces the overall thickness and thickness, reduces the inductance response, and improves the electrical performance, thereby being able to solve the problem that the high-inductance of the test interface panel in the prior art or the influence of the conventional reflow is performed to interfere with the high-frequency signal transmission. technical problem. Moreover, since the transmission path of the power source is shortened, the need to place a capacitor in a long path can be reduced, and the problem of placing a capacitor to increase the number of layers and causing high inductance is avoided, and further, the conventional feedback can be reduced. The impact of welding also avoids problems such as complicated process and difficult to control.
再者,本發明以嵌置配設方式將多個封裝載板建構整合為一測試介面模組的架構,可解決習知多個以迴焊接合問題,此外,相對製程加工時間變短,亦可提升線路的結合力和線路的可靠度外,也有助於產品製作之便利性及良率提升,更能因應快速發展的半導體測試需求,提升競爭力。 Furthermore, the present invention integrates a plurality of package carrier structures into a test interface module in an embedded arrangement manner, which can solve the conventional problem of multiple solder joints, and the processing time is shorter. In addition to improving the bonding strength of the line and the reliability of the line, it also contributes to the convenience and yield improvement of the product, and is more capable of improving the competitiveness in response to the rapidly developing semiconductor testing needs.
以上所述僅為本發明較佳實施例揭露,然其並非用以限定本發明,本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,等效替換,仍落入本發明的專利保護範圍內。 The above description is only for the preferred embodiment of the present invention, and is not intended to limit the present invention. Those skilled in the art can make various changes without departing from the spirit and scope of the present invention. And the replacement, equivalent replacement, still fall within the scope of the patent protection of the present invention.
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TWI780813B (en) * | 2021-07-13 | 2022-10-11 | 美商全球連接器科技有限公司 | Electrical testing carrier board device with shielding effect |
TWI832538B (en) * | 2022-08-19 | 2024-02-11 | 大陸商昆山聯滔電子有限公司 | Bidirectional testing device |
Also Published As
Publication number | Publication date |
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TWI680705B (en) | 2019-12-21 |
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