TW201928334A - Spectral-image correlation-based confocal profilometric system and method - Google Patents

Spectral-image correlation-based confocal profilometric system and method Download PDF

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TW201928334A
TW201928334A TW106145927A TW106145927A TW201928334A TW 201928334 A TW201928334 A TW 201928334A TW 106145927 A TW106145927 A TW 106145927A TW 106145927 A TW106145927 A TW 106145927A TW 201928334 A TW201928334 A TW 201928334A
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light
spectral image
image pattern
confocal
spectral
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TWI653440B (en
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陳亮嘉
譚培汝
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國立臺灣大學
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Abstract

The invention provides a confocal microscope system and method of confocal surface and internal surface profilometry using spectral image patterns, wherein a vertical scanning on each calibrated depth is performed for establishing a database having a plurality of optical diffractive spectral patterns being corresponding to each calibrated depth, respectively. A control and calculation unit is utilized in the optical system to perform normalization calculation of cross correlation between the measured diffractive spectral pattern and a plurality of calibrated diffractive spectral patterns for determining the measured depth of the tested object surface and internal (including bottom) surface position in one-shot imaging manner. Meanwhile, the diffractive spectral image pattern can be converted from its digital discrete format to an analogue continuous one by interpolating the spectral distributing characteristics of the filtering elements in the filtering module. More accurate depth information can be determined by performing the normalization calculation of cross correlation between the measured diffractive spectral pattern and a plurality of calibrated diffractive spectral patterns for determining the measured depth of the tested object surface and internal (including bottom) surface position in one-shot imaging manner.

Description

光譜影像相關比對式共焦形貌量測系統及方法Spectral image correlation comparison type confocal topography measurement system and method

本發明為一種共焦偵測技術,特別是指一種可以降低量測中移動振動干擾而得到關於物件表面形貌之共焦系統及其共焦表面形貌偵測方法。The invention relates to a confocal detection technology, in particular to a confocal system and a method for detecting a confocal surface topography which can reduce the surface vibration of an object in a measurement.

彩色共焦顯微系統是量測物件表面形貌的方法之一,可以量測機械或半導體結構中的階高、線寬、溝槽寬度以及深度等資訊,進而作為製程改良或良率檢測的重要依據。本技術最早是由馬文·閔斯基(Marvin Minsky)在1957年提出。彩色共焦的原理是將入射光色散,形成具有不同連續聚焦深度的多個偵測光,形成光學式垂直掃描之量測機制,應用這種方式來偵測待測物,可以獲得不同深度之光學切片影像,藉由針孔(pinhole)進行失焦訊號之過濾,將聚焦區外之反射光與散射光濾除,保留聚焦面資訊,並由電腦將不同深度所得之光學切片影像重建起來,即可求得待測物之三度空間影像資訊。The color confocal microscopy system is one of the methods for measuring the surface topography of an object. It can measure the height, line width, groove width and depth of the mechanical or semiconductor structure, and is used as an important basis for process improvement or yield detection. . This technique was first proposed by Marvin Minsky in 1957. The principle of color confocal is to disperse the incident light to form a plurality of detection lights with different continuous depths of focus to form a measurement mechanism for optical vertical scanning. This method can be used to detect the object to be tested, and different depths can be obtained. The optical slice image is filtered by a pinhole to remove the reflected light and the scattered light outside the focus area, and the focus surface information is retained, and the optical slice image obtained by different depths is reconstructed by the computer. The three-dimensional image information of the object to be tested can be obtained.

雖然彩色共焦之偵測光因為具有不同的連續聚焦深度,而可以免除傳統垂直掃描時,因為垂直移動機構的運動對量測機台所造成的振動問題,但是仍然有幾個部分有待解決的部分:Although the color confocal detection light can be exempted from the traditional vertical scanning because of the different continuous depth of focus, because the motion of the vertical moving mechanism causes vibration problems caused by the measuring machine, there are still several parts to be solved. :

第一、失焦光和雜散光重疊而產生橫向干擾(cross talk)之雜訊問題,習用技術中,爲了減少光線間相互干擾的問題,多在光譜儀前面設置針孔(pinhole),然而此種方式雖可以減少干擾,但是如果是應用在量測物件二維表面形貌或者需要高解析度的量測時,則需要配合橫向移動的機制,如此一來會增加量測所需的時間以及振動對量測精度的影響,因此此種方式多半還是應用在單點量測的領域。First, the defocusing light and the stray light overlap to generate a cross talk noise problem. In the conventional technique, in order to reduce the mutual interference of light, a pinhole is often placed in front of the spectrometer. Although the method can reduce the interference, if it is applied to measure the two-dimensional surface topography of the object or requires high-resolution measurement, it needs to cooperate with the lateral movement mechanism, which will increase the time and vibration required for the measurement. The influence on the measurement accuracy, so this method is mostly applied in the field of single point measurement.

第二、光譜儀體積佔據空間以及解析光譜耗時的問題。習用技術中,爲了還原表面形貌,需要透過光譜儀偵測通過狹縫或者是針孔結構的光譜,進而找出對應偵測位置的光線波長與強度關係,而還原該位置對應的深度。利用光譜儀的方式有幾個有待克服的部分,首先是光譜儀的體積龐大或者售價昂貴,同時佔據大量空間。再者,由於光譜儀還原光譜資訊耗時不具量測效率,其主要的原因是對每一個量測位點而言,展開的光譜是一維度的光譜,如果對一個線性量測位置而言,展開的就是一個二維光譜。由此可知,每一個光譜儀進行一次性的解析,最多就是一個線性的量測區域,因此,如果要量測一個面,這就必須要透過橫向移動的掃描,如此一來不但增加量測的時間,更有可能因為橫向掃描運動對量測機台造成振動問題,而影響量測精度。Second, the spectrometer volume takes up space and the problem of analyzing the time-consuming spectrum. In the conventional technique, in order to reduce the surface topography, it is necessary to detect the spectrum of the slit or the pinhole structure through the spectrometer, thereby finding the relationship between the wavelength and the intensity of the light corresponding to the detected position, and restoring the depth corresponding to the position. There are several ways to overcome the spectrometer. First, the spectrometer is bulky or expensive, and it takes up a lot of space. Furthermore, since the spectrometer reduces the spectral information time and does not have measurement efficiency, the main reason is that for each measurement site, the unfolded spectrum is a one-dimensional spectrum, if for a linear measurement position, the expansion Is a two-dimensional spectrum. It can be seen that each spectrometer performs one-time analysis, which is at most a linear measurement area. Therefore, if one surface is to be measured, it is necessary to scan through the lateral movement, so that not only the measurement time is increased. It is more likely that the lateral scanning motion causes vibration problems on the measuring machine, which affects the measurement accuracy.

綜合上述,因此亟需一種光譜影像相關比對式共焦形貌量測系統及方法來解決習用技術所產生之問題。In summary, there is a need for a spectral image correlation comparison confocal topography measurement system and method to solve the problems caused by conventional techniques.

本發明提供一種應用光譜影像圖案之共焦形貌量測技術,來對物體表面或內部光反射介面(含物體之背面)三維形貌偵測之系統與方法。其係具有將濾波元件以及光強感測元件整合成一光訊號感測裝置,藉由該裝置一次性之全域拍攝(one-shot full field),即可一次性的還原測物光的光譜組成,進而重建待測物的表面形貌,以節省量測所需的時間以及減少共焦系統的體積。本技術可以應用於顯微物鏡,或者是色散物鏡,或者是顯位物鏡和色散模組組成的光學鏡組。The present invention provides a system and method for detecting a three-dimensional shape of an object surface or an internal light reflecting interface (including the back side of an object) using a confocal topography measurement technique of a spectral image pattern. The method comprises the steps of: integrating the filter component and the light intensity sensing component into an optical signal sensing device, and by using the one-shot full field of the device, the spectral composition of the measuring object light can be restored at one time. The surface topography of the object to be tested is then reconstructed to save time required for measurement and to reduce the volume of the confocal system. The technology can be applied to a microscope objective, or a dispersion objective lens, or an optical lens group composed of a display objective lens and a dispersion module.

本發明提供一種應用光譜影像相關比對式之共焦形貌量測系統及方法,對物體表面或內部光反射介面(含物體之背面)進行三維形貌偵測,透過深度位移進行各個深度所對應光譜影像圖案之紀錄,以建立具有複數個光譜影像圖案資料庫。再根據每一個感測陣列所得到的複數測物光所形成關於一位置之光譜影像圖案,與複數個光學比對樣本資訊之正歸化影像匹配運算,以決定對應該光譜影像圖案之位置的精密深度資訊。更進一步地,光譜影像圖案可以由濾波元件之波長分佈特性,由數位離散光學圖譜轉成類比連續光學圖譜,再進行量測光譜影像圖案與複數個光學比對樣本資訊之正歸化影像匹配運算,以決定對應該光譜影像圖案之位置的更精密的深度資訊。The invention provides a confocal topography measuring system and method for applying spectral image correlation comparison type, and performs three-dimensional shape detection on an object surface or an internal light reflection interface (including a back surface of an object), and performs depth processing through depth displacement. Corresponding to the record of the spectral image pattern to create a database with a plurality of spectral image patterns. Then, according to the complex object light obtained by each sensing array, a spectral image pattern about a position is formed, and a plurality of optical comparison normalized image matching operations of the sample information are used to determine the position of the corresponding spectral image pattern. Precision depth information. Further, the spectral image pattern can be converted from a wavelength-distributed characteristic of the filter element, from a digital discrete optical map to an analog continuous optical map, and then a normalized image matching operation is performed on the measured spectral image pattern and the plurality of optical alignment sample information. To determine more precise depth information corresponding to the location of the spectral image pattern.

本發明提供一種應用光譜影像相關比對式之共焦形貌量測系統及方法,以對物體表面或內部光反射介面(含物體之背面)三維形貌進行偵測,其係具有像素大小之數位控制的光開關元件,用以選擇性的控制入射光投射至待測物的位置,進而免除了橫向掃描的動作,不但可以降低機台振動對量測精度的影響,更可以降低失焦光和雜散光重疊而產生橫向干擾(cross talk)之雜訊問題。The invention provides a confocal topography measuring system and method for applying a spectral image correlation comparison method to detect a three-dimensional shape of an object surface or an internal light reflecting interface (including a back side of an object), which has a pixel size The digitally controlled optical switching element is used for selectively controlling the position of the incident light to be projected onto the object to be tested, thereby eliminating the lateral scanning action, not only reducing the influence of the vibration of the machine on the measurement accuracy, but also reducing the defocusing light. A noise problem that overlaps with stray light to cause cross talk.

本發明提供一種彩色共焦系統及其彩色共焦表面形貌偵測方法,透過數位調控單元將光反射兩次,第一次反射至色散物鏡,第二次則是反射至分光元件再投射至光感測裝置上。因此由數位調控單元所產生的模擬針孔效果可以增加共焦效果,亦即增加軸向(深度方向)的解析度。The invention provides a color confocal system and a color confocal surface topography detecting method, which reflects light twice through a digital control unit, firstly reflects to a dispersive objective lens, and secondly reflects to a spectroscopic element and then projects to On the light sensing device. Therefore, the effect of the analog pinhole generated by the digital control unit can increase the confocal effect, that is, increase the resolution of the axial direction (depth direction).

在一實施例中,本發明提供一種共焦形貌量測系統,包括有一光源模組、一顯微物鏡、一光感測裝置以及一處理單元。該光源模組,用以提供至少一寬頻調制光。該顯微物鏡,用以將每一寬頻調制光依放大特定倍率縮放後投射至一物件上,每一寬頻調制光從該物件之表面上之一特定位置反射形成一測物光。該光感測裝置,用以接收由該物件上該至少一特定位置所反射的至少一測物光,該光感測裝置更具有濾波模組,其係具有複數個濾波陣列用以接收反射的至少一測物光,每一個濾波陣列具有複數個濾波元件,分別允許一特定波長之測物光通過以及一光感測器,與該濾波模組相耦接,用以感測通過每一濾波元件的測物光強度而產生相應的一測物光訊號,以得到一光譜影像圖案。該處理單元,將該光譜影像圖案進行一演算,以決定相應每一測物光之特定位置的深度資訊。In one embodiment, the present invention provides a confocal topography measurement system including a light source module, a microscope objective, a light sensing device, and a processing unit. The light source module is configured to provide at least one broadband modulated light. The microscope objective is used for scaling each broadband modulated light to a specific magnification and projecting onto an object, and each broadband modulated light is reflected from a specific position on the surface of the object to form a test object light. The light sensing device is configured to receive at least one of the object light reflected by the at least one specific position on the object, the light sensing device further has a filtering module having a plurality of filtering arrays for receiving the reflection At least one of the object light, each filter array has a plurality of filter elements, respectively, allowing a specific wavelength of the object light to pass through and a light sensor coupled to the filter module for sensing each filter The measured light intensity of the component produces a corresponding object optical signal to obtain a spectral image pattern. The processing unit performs a calculation on the spectral image pattern to determine depth information corresponding to a specific position of each of the object light.

在一實施例中,本發明提供一種共焦形貌偵測方法,其係包括有下列步驟:首先,提供一共焦形貌量測系統,其係具有一光源、一顯微物鏡、具有複數個濾波陣列之一濾波模組、一光感測器以及一處理單元。接著以該光源產生之一光束投射至一數位調控單元而產生至少一寬頻調制光。然後,以該顯微物鏡將每一寬頻調制光依放大特定倍率縮放後投射至一物件上,每一寬頻調制光從該物件之表面上之一特定位置反射形成一測物光。接著,以該濾波模組,接收反射的至少一測物光,並對該至少一測物光進行濾光,其中,每一個濾波陣列具有複數個濾波元件分別允許一特定波長之測物光通過。再以該光感測器感測該至少一測物光以產生一光譜影像圖案。最後,以該處理單元將該光譜影像圖案進行演算,以決定對應每一測物光之特定位置的深度資訊。In one embodiment, the present invention provides a confocal topography detection method, which includes the following steps: First, a confocal topography measurement system is provided, which has a light source, a microscope objective, and a plurality of A filter module, a light sensor and a processing unit. Then, the light source is generated by the light source to be projected to a digital control unit to generate at least one broadband modulated light. Then, each of the broadband modulated light is scaled at a specific magnification by the microscope objective and projected onto an object, and each broadband modulated light is reflected from a specific position on the surface of the object to form a test object light. Then, the filter module receives the reflected at least one object light, and filters the at least one object light, wherein each filter array has a plurality of filter elements respectively allowing a specific wavelength of the object light to pass through . The at least one object light is sensed by the light sensor to generate a spectral image pattern. Finally, the spectral image pattern is calculated by the processing unit to determine depth information corresponding to a specific position of each object light.

請參閱圖1所示,該圖為本發明之彩色共焦系統架構示意圖。在本實施例中,該彩色共焦系統2包括有一光源模組20、一色散物鏡21、一光感測裝置22以及一處理單元23。該光源模組20,用以提供至少一寬頻調制光200。在本實施例中,該光源模組20具有一光源201以及一數位調控單元202。該光源201用以產生一光束90。在一實施例中,該光束90為含有複數種不同波長的光,例如:白光,但不以此為限制。在該光源201與該數位調控單元202之間更可以設置一準直鏡組203,用以將光源所產生的光束90準直化,而投射至該數位調控單元202。該數位調控單元202,具有複數個光控開關202a,每一個光控開關202a可以控制光束投射的方向。在一實施例中,該數位調控單元202為數位微型反射鏡元件(digital micromirror device, DMD),但不以此為限制,例如:矽基液晶元件 (liquid crystal on silicon, LCOS)也可以實施。此外,穿透式的液晶開關元件,例如:矽基液晶(liquid crystal on silicon, LCOS)也可以作為數位調控單元202的一個實施方式。Please refer to FIG. 1 , which is a schematic diagram of the color confocal system architecture of the present invention. In this embodiment, the color confocal system 2 includes a light source module 20, a dispersion objective lens 21, a light sensing device 22, and a processing unit 23. The light source module 20 is configured to provide at least one broadband modulated light 200. In this embodiment, the light source module 20 has a light source 201 and a digital control unit 202. The light source 201 is used to generate a light beam 90. In an embodiment, the light beam 90 is light containing a plurality of different wavelengths, such as white light, but is not limited thereto. A collimating mirror group 203 is further disposed between the light source 201 and the digital regulating unit 202 for collimating the light beam 90 generated by the light source and projecting to the digital regulating unit 202. The digital control unit 202 has a plurality of light control switches 202a, each of which can control the direction in which the light beam is projected. In one embodiment, the digital control unit 202 is a digital micromirror device (DMD), but is not limited thereto. For example, a liquid crystal on silicon (LCOS) can also be implemented. In addition, a transmissive liquid crystal switching element, such as liquid crystal on silicon (LCOS), can also be used as an embodiment of the digital control unit 202.

如圖2A與2B所示,該圖為數位調控單元控制光線方向示意圖,其中,圖2A中顯示的為數位調控單元所具有的光控開關立體示意圖。數位調控單元202具有複數個光控開關202a,圖2A僅以4個做說明。光控開關202a至少有開(on)以及關(off)狀態。光控開關202a可以透過電訊的控制改變其轉動的角度,進而呈現開或關的狀態。當有光投射至複數個光控開關202a時,根據其偏轉的方向會決定反射光的路徑。在一實施例中,如圖2B所示,當光控開關202a處開的狀態時,其反光元件會偏轉至一個角度,以將光反射至物鏡,而光控開關202a處於關的狀態時,其反光元件會將光反射至他處。該數位調控單元202與該處理單元23電性連接,透過處理單元23的調控,可以控制哪些光控開關將入射的光束90反射至待測物以形成單點或多點、單線或多線、單區域或多區域的寬頻調制光200。As shown in FIG. 2A and FIG. 2B, the figure is a schematic diagram of the direction of the light control by the digital control unit. FIG. 2A is a perspective view of the light control switch of the digital control unit. The digital control unit 202 has a plurality of light control switches 202a, and FIG. 2A is only described in four. The light control switch 202a has at least an on state and an off state. The light control switch 202a can change the angle of its rotation through the control of the telecommunication, thereby presenting an on or off state. When light is projected onto the plurality of light control switches 202a, the path of the reflected light is determined according to the direction in which the light is deflected. In an embodiment, as shown in FIG. 2B, when the light control switch 202a is in the open state, the light reflecting element is deflected to an angle to reflect the light to the objective lens, and the light control switch 202a is in the off state. Its reflective elements reflect light to other places. The digital control unit 202 is electrically connected to the processing unit 23, and through the regulation of the processing unit 23, it can control which light control switches reflect the incident light beam 90 to the object to be tested to form a single point or multiple points, single or multiple lines, Single-area or multi-region wide-band modulated light 200.

藉由數位調控單元202的特性,當數位調控單元202內的每一個光控開關202a與待測物的表面間的對應關係建立時,就可以透過控制光控開關202a的開(on)以及關(off)狀態,改變入射光的光路,形成多道寬頻調制光200投射至待測物上,進而控制掃描待測物表面的位置順序。如此一來,整個彩色共焦系統2就無需因改變掃描位置而必須進行水平(或橫向)方向移動(或掃描),例如:機台不動,待測物進行水平(或橫向)方向移動;或者是,待測物不動機台進行水平(或橫向)移動,進而免除機構移動所產生的振動或定位誤差等問題,而提升量測的精度。再者,也可以透過控制作動的數位調控元件的空間間隔作用,避免因為失焦光和雜散光重疊而產生橫向干擾(cross talk)之雜訊問題。例如,在一實施例中,如圖3A所示,在第一時間點時,光控開關202b將寬頻調制光反射至待測物,而在下一個時間點,如圖3B所示,光控開關202c則將寬頻調制光反射至待測物。透過圖3A與圖3B的光源控制方式,使得數位調控單元202模擬光源投射至針孔而場生的針孔光源效果,進而可以避免因為相鄰點光源之光線重疊而產生干擾。By the characteristics of the digital control unit 202, when the correspondence between each of the light control switches 202a in the digital control unit 202 and the surface of the object to be tested is established, the on and off of the light control switch 202a can be controlled. In the (off) state, the optical path of the incident light is changed, and a plurality of broadband modulated lights 200 are formed to be projected onto the object to be tested, thereby controlling the positional order of scanning the surface of the object to be tested. In this way, the entire color confocal system 2 does not need to be moved (or scanned) in a horizontal (or lateral) direction due to changing the scanning position, for example, the machine does not move, and the object to be tested is moved horizontally (or laterally); Yes, the object to be tested does not move horizontally (or laterally), thereby eliminating the vibration or positioning error caused by the movement of the mechanism, and improving the accuracy of the measurement. Furthermore, it is also possible to avoid the noise problem of cross talk due to the overlap of the defocused light and the stray light by controlling the spatial spacing of the actuated digital control elements. For example, in an embodiment, as shown in FIG. 3A, at the first time point, the light control switch 202b reflects the broadband modulated light to the object to be tested, and at the next time point, as shown in FIG. 3B, the light control switch 202c reflects the broadband modulated light to the object to be tested. Through the light source control mode of FIG. 3A and FIG. 3B, the digital control unit 202 simulates the effect of the pinhole light source generated by the light source being projected onto the pinhole, thereby avoiding interference due to overlapping of light of adjacent point light sources.

再回到圖1A所示,數位調控單元202將寬頻調制光200反射至一分光元件24,再經由一第一透鏡組25進入該色散物鏡21而在該色散物鏡21的聚焦面(focus plane)成像。色散物鏡21用以將每一寬頻調制光200色散,每一寬頻調制光200形成具有不同連續聚焦深度的多個偵測光205而投射至一物件8上,在本實施例中,該物件8的表面和該色散物鏡21光軸垂直,但不以此為限制。每一個偵測光205R、205G與205B對應一波長。以圖1以三個色散的偵測光205R、205G、205B為例,每一個色散的偵測光205R、205G、205B具有一聚焦深度,經過適當掃描獲取對應物件8表面深度的光波長及其強度的資訊,進而根據該些資訊還原物件8之表面形貌。透過色散的機制所形成的複數道不同深度的偵測光205R、205G與205B,即可取代傳統移動機台進行垂直掃描。因此,可以降低因為垂直掃描移機台上的機構所產生的振動或定位誤差等問題,而提升系統的量測精度。要說明的是,使用傳統的色散物鏡,由於光控開關反射角度以及從待測物或鏡面反射的角度之故,因此進入色散物鏡的光能量會減少,使得光感測裝置22感測影像,其影像區域中會有邊緣區域無法顯示出影像,而呈現圖像的外圍部分的亮度或飽和度比中心區域低(或稱光暈, Vignetting, 現象),導致解析物體表面形貌的有效區域降低。爲了 提升進入色散物鏡的進光量,使光感測裝置22可以產生全域影像,解決前述光暈的問題,在一實施例中,該色散物鏡21可以使用遠心鏡頭(telecentric lens)架構的色散物鏡。更進一步地,可以控制數位調控單元202在中間或邊緣個光控開關以準直的入射角度投射到物體的表面,以解決無法全域投射影像的問題。Returning to FIG. 1A, the digital control unit 202 reflects the broadband modulated light 200 to a beam splitting element 24, and then enters the dispersing objective lens 21 via a first lens group 25 at a focus plane of the dispersing objective lens 21. Imaging. The dispersion objective lens 21 is configured to disperse each of the broadband modulated lights 200, and each of the broadband modulated lights 200 forms a plurality of detection lights 205 having different continuous depths of focus and is projected onto an object 8, which in the embodiment is The surface is perpendicular to the optical axis of the dispersion objective 21, but is not limited thereto. Each of the detection lights 205R, 205G and 205B corresponds to a wavelength. Taking the three scattered detection lights 205R, 205G, and 205B as an example, each of the dispersion detecting lights 205R, 205G, and 205B has a depth of focus, and the wavelength of the light corresponding to the surface depth of the object 8 is appropriately scanned and The information of the intensity, and then the surface topography of the object 8 is restored according to the information. The plurality of different depth detection lights 205R, 205G and 205B formed by the dispersion mechanism can replace the conventional mobile machine for vertical scanning. Therefore, it is possible to reduce the vibration or positioning error caused by the mechanism on the vertical scanning transfer table, and improve the measurement accuracy of the system. It should be noted that, using a conventional dispersion objective lens, due to the angle of reflection of the light control switch and the angle of reflection from the object to be tested or the specular surface, the light energy entering the dispersion objective lens is reduced, so that the light sensing device 22 senses the image. In the image area, there is an edge area that cannot display an image, and the brightness or saturation of the peripheral portion of the rendered image is lower than the central area (or Vignetting, phenomenon), resulting in a reduction in the effective area of the surface topography of the object. . In order to increase the amount of light entering the dispersion objective lens, the light sensing device 22 can generate a global image to solve the aforementioned halo problem. In an embodiment, the dispersion objective lens 21 can use a dispersion objective lens of a telecentric lens architecture. Further, the digital control unit 202 can be controlled to project the surface of the object at a collimated angle of incidence at the intermediate or edge light control switch to solve the problem that the image cannot be completely projected.

經由物件8反射的測物光206經過色散物鏡21後,再經過分光元件24而投射至該光感測裝置22上。本實施例中,該光感測裝置22,用以接收由該物件8上反射的測物光206,該光感測裝置22更具有一濾波模組220以及一光感測器221。請參閱圖4A與圖4B所示,該濾波模組220具有複數個濾波陣列222,用以直接接收反射的測物光206,每一個濾波陣列222具有複數個濾波元件223,分別允許一特定波長之測物光通過。在本實施例中,該濾波模組220是一個 Fabry–Pérot濾波器,亦即,每一個濾波元件223係由複數個高度不同的稜鏡所構成。根據Fabry–Pérot的原理,光線入射和出射面之間的距離會決定出射光波長的大小,因此可以透過不同高度的稜鏡設計,決定出可以通過每一個濾波元件223的波長。以圖4A與圖4B所示的濾波模組220為例,每一個濾波陣列222為 4x4的陣列結構,具有16個濾波元件223, 每一個濾波元件223可對應一種波長,使得每一個濾波陣列222可以測得由16種波長所構成的寬頻範圍。至於波長的選擇,可以根據需求而定,並無特定的限制。要說明的是,濾波陣列222的大小並不以4x4為限制。The object light 206 reflected by the object 8 passes through the dispersion objective lens 21, and is then projected onto the light sensing device 22 via the beam splitting element 24. In this embodiment, the light sensing device 22 is configured to receive the object light 206 reflected by the object 8. The light sensing device 22 further includes a filter module 220 and a light sensor 221. Referring to FIG. 4A and FIG. 4B, the filter module 220 has a plurality of filter arrays 222 for directly receiving the reflected object light 206. Each filter array 222 has a plurality of filter elements 223, respectively, allowing a specific wavelength. The object light passes through. In this embodiment, the filter module 220 is a Fabry-Pérot filter, that is, each filter element 223 is composed of a plurality of turns of different heights. According to the principle of Fabry-Pérot, the distance between the incident and exit surfaces of the light determines the wavelength of the outgoing light, so that the wavelength of each filter element 223 can be determined by a different height design. Taking the filter module 220 shown in FIG. 4A and FIG. 4B as an example, each filter array 222 is a 4×4 array structure having 16 filter elements 223, and each filter element 223 can correspond to a wavelength such that each filter array 222 A wide frequency range consisting of 16 wavelengths can be measured. As for the choice of wavelength, it can be determined according to the needs, and there are no specific restrictions. It is to be noted that the size of the filter array 222 is not limited to 4x4.

請參閱圖1A與圖4B所示,該光感測器221,與該濾波模組220相耦接,用以感測通過每一濾波元件223的測物光強度而產生相應的一測物光訊號,以得到一光譜影像圖案。在本實施例中,該光感測器221,具有複數個與該複數個濾波陣列222對應的感測陣列224,每一個感測陣列224具有複數個感測元件225,分別對應相應濾波陣列222的濾波元件223,每一個感測元件225可以感測通過相應濾波元件223的測物光所具有的光強度,而產生相應的光強訊號。要說明的是,在一實施例中,如果每一濾波陣列222的濾波元件223數量有限,例如:如圖9A所示的16個,這代表每一個像素只能感測到16種波長的強度。如圖9B所示,其中X軸為對應其中之一濾波陣列222所展開的光譜波長,Y軸則是被相應感測陣列224所感測的光強度。由於能每一濾波陣列的感測波長數量有限,因此當通過濾波陣列222被相應的感測元件225所感測時,其所產生的光譜反應曲線為曲線A的情況下,就可以得到曲線峰值所對應到的波長,但是在某些情況下,例如:如圖9B所示的曲線B,當通過濾波陣列222所產生的光譜強反應曲線剛好非落在這十六種波長所涵蓋的區域時,此時就難以偵測而解析出來。因此,在一實施例中,可以透過改變接收該光束的該光控開關的數量,進而控制通過該濾波陣列所形成的光譜反應曲線。例如:當只有一個光控開關對應一濾波陣列時的,不但光感測器,例如:相機,的曝光感測時間可能較長,而且會產生難以解析的曲線B,反之,當數量增加時,例如從1x1變成2x2或3x3時,則此光譜反應曲線C範圍變寬,雖然會影響量測的深度解析度以及空間解析度,但是由於光譜反應曲線變寬,因此和數個已知偵測波長的位置將會有所交集,也就是可以偵測得知其相應的光強,因此當有超過3個以上的交集時,例如:曲線C和已知波長就有三個交集點,因此較容易重建出光譜反應曲線C,也可以順利找到曲線C的峰值所對應的波長。在一實施例中,該光譜反應曲線可合理約視為一常態分佈曲線。As shown in FIG. 1A and FIG. 4B , the photo sensor 221 is coupled to the filter module 220 for sensing the intensity of the object light passing through each filter element 223 to generate a corresponding object light. Signal to get a spectral image pattern. In this embodiment, the photo sensor 221 has a plurality of sensing arrays 224 corresponding to the plurality of filter arrays 222. Each of the sensing arrays 224 has a plurality of sensing elements 225 corresponding to the respective filtering arrays 222. Filter elements 223, each of which can sense the light intensity of the object light passing through the respective filter element 223, to generate a corresponding light intensity signal. It is to be noted that, in an embodiment, if the number of filter elements 223 of each filter array 222 is limited, for example, 16 as shown in FIG. 9A, this means that each pixel can only sense the intensity of 16 wavelengths. . As shown in FIG. 9B, wherein the X-axis is the spectral wavelength developed by one of the filter arrays 222, and the Y-axis is the light intensity sensed by the corresponding sensing array 224. Since the number of sensing wavelengths per filter array can be limited, when the filter array 222 is sensed by the corresponding sensing element 225, and the spectral response curve generated by the curve is A, the curve peak can be obtained. Corresponding to the wavelength, but in some cases, for example, as shown by curve B in FIG. 9B, when the spectrally strong response curve generated by the filter array 222 does not fall within the area covered by the sixteen wavelengths, At this point it is difficult to detect and resolve. Thus, in one embodiment, the spectral response curve formed by the filter array can be controlled by varying the number of light-controlled switches that receive the beam. For example, when only one light control switch corresponds to a filter array, not only the light sensor, such as a camera, may have a longer exposure sensing time, and may generate a curve B that is difficult to resolve, and vice versa, when the number increases, For example, when changing from 1x1 to 2x2 or 3x3, the spectral response curve C range is widened, although it affects the depth resolution and spatial resolution of the measurement, but because the spectral response curve is widened, and several known detection wavelengths The position will be mixed, that is, the corresponding light intensity can be detected, so when there are more than 3 intersections, for example, curve C and known wavelengths have three intersection points, so it is easier to reconstruct From the spectral response curve C, the wavelength corresponding to the peak of the curve C can also be found smoothly. In one embodiment, the spectral response curve can be reasonably considered to be a normal distribution curve.

要說明的是,每一個感測元件225所感測到的光強訊號,對應到影像則為像素的灰階光強,而感測元件225之數量決定該光感測器221的解析度,每一個濾波元件223可以對應一個或多個感測元件225。該光感測器221可以為CMOS感測器、CCD感測器或者是其他適合的光偵測器等。要說明的是,在一實施例中,本發明的光感測器221與該濾波模組220,可以進而整合成為單一元件,形成影像擷取裝置。此外,由於光感測器221的感測元件225數量固定,又因為每個濾波陣列222對應到物件上的一個偵測位置,因此每一個偵測位置需要由複數個感測元件225來量測,因此,量測待測物或許會犧牲解析度,不過因為半導體製程日新月異,根據本發明的架構,當未來更高解析度的光感測元件產生時,就可以用來提升影像的解析度。It should be noted that the intensity signal sensed by each of the sensing elements 225 corresponds to the grayscale intensity of the pixel, and the number of the sensing elements 225 determines the resolution of the photosensor 221. One filter element 223 can correspond to one or more sense elements 225. The photo sensor 221 can be a CMOS sensor, a CCD sensor, or other suitable photodetector or the like. It should be noted that, in an embodiment, the photo sensor 221 of the present invention and the filter module 220 can be integrated into a single component to form an image capturing device. In addition, since the number of sensing elements 225 of the photo sensor 221 is fixed, and since each filtering array 222 corresponds to a detecting position on the object, each detecting position needs to be measured by a plurality of sensing elements 225. Therefore, measuring the object to be tested may sacrifice the resolution, but because the semiconductor process is changing with each passing day, according to the architecture of the present invention, when a higher resolution light sensing element is generated in the future, it can be used to enhance the resolution of the image.

該光感測器221更和處理單元23電性連接,處理單元23將光譜影像圖案與儲存於資料庫內的複數個比對樣本資訊進行演算,以決定對應該光譜影像圖案之特定位置的深度資訊。在一實施例中,該演算為正歸化影像匹配運算。該比對樣本資訊可以為數位離散之比對樣本資訊或經由演算將該數位離散之比對樣本資訊轉換為一類比連續之比對樣本資訊。The photo sensor 221 is further electrically connected to the processing unit 23, and the processing unit 23 calculates the spectral image pattern and the plurality of comparison sample information stored in the database to determine the depth corresponding to the specific position of the spectral image pattern. News. In one embodiment, the calculus is a normalized image matching operation. The comparison sample information may be a digital discrete ratio sample information or a calculation of the digital discrete ratio sample information via an calculus into an analog-to-continuous comparison sample information.

請參閱圖1B所示,該圖為本發明之彩色共焦系統第二實施例示意圖。在本實施例中,該彩色共焦系統基本上與圖1A類似,差異的是,本實施例中具有第一鏡組,其配置的位置與圖1A不相同,本實施例中,該第一鏡組25設置在該數位調控單元202與該分光元件24之間的光路上。此外,圖1B中更具有一第二鏡組26,其設置在該分光元件24與該光感測裝置22之間的光路上。由於本實施例中具有第一與第二鏡組25與26,其中第一鏡組25用以準直來自於數位調控單元202的偵測光,而第二鏡組26用以形成影像在該光感測裝置22上,透過第一與第二鏡組25與26可以調整該光感測裝置22所形成的影像大小。Please refer to FIG. 1B, which is a schematic diagram of a second embodiment of a color confocal system of the present invention. In this embodiment, the color confocal system is substantially similar to that of FIG. 1A. The difference is that the first mirror group is disposed in the embodiment, and the position of the configuration is different from that in FIG. 1A. In this embodiment, the first The mirror group 25 is disposed on the optical path between the digital control unit 202 and the light splitting element 24. In addition, FIG. 1B further has a second mirror group 26 disposed on the optical path between the beam splitting element 24 and the light sensing device 22. Since the first and second mirror groups 25 and 26 are provided in the embodiment, the first mirror group 25 is used for collimating the detection light from the digital control unit 202, and the second mirror group 26 is used to form an image. The image sensing device 22 can adjust the image size formed by the light sensing device 22 through the first and second mirror groups 25 and 26.

此外,請參閱圖6所示,該圖為本發明之彩色共焦系統另一實施例示意圖。在本實施例中,基本上與圖1A與1B的實施例相近,差異的是本實施例中,該分光元件24設置在光源201與數位調控單元202之間, 其中寬頻調制光200被分光元件24導引至該數位調控單元202上,此架構中,是光束90被分光元件24導引至數位調控單元202,寬頻調製光200是指由202射出的光,在經過第一鏡組25將該寬頻調制光200準直而投射至該色散物鏡21。此外,由該物件8表面反射的測物光206經過原光路第二次投射至該數位調控單元202上,該數位調控單元202將該測物光206反射至該分光元件24,分光元件24將數位調控單元202反射的測物光分光導引至第二鏡組26後,再投射至光感測裝置22上。與圖1A與1B不同的是,圖6的實施例中,該數位調控單元202將光反射兩次,第一次反射至色散物鏡21,第二次則是反射至分光元件24再投射至光感測裝置22上。因此由數位調控單元202所產生的模擬針孔效果可以增加共焦效果,亦即增加軸向(深度方向)的解析度。In addition, please refer to FIG. 6, which is a schematic diagram of another embodiment of the color confocal system of the present invention. In this embodiment, substantially similar to the embodiment of FIGS. 1A and 1B, the difference is that in the embodiment, the light splitting element 24 is disposed between the light source 201 and the digital control unit 202, wherein the broadband modulated light 200 is split by the light splitting element. 24 is directed to the digital control unit 202. In this architecture, the beam 90 is directed by the beam splitting element 24 to the digital control unit 202. The broadband modulated light 200 refers to light emitted by the 202, which passes through the first mirror 25 The broadband modulated light 200 is collimated and projected onto the dispersion objective lens 21. In addition, the object light 206 reflected by the surface of the object 8 is projected onto the digital control unit 202 for a second time through the original optical path, and the digital control unit 202 reflects the object light 206 to the light splitting element 24, and the light splitting element 24 will The object light reflected by the digital control unit 202 is guided to the second mirror group 26 and then projected onto the light sensing device 22. 1A and 1B, in the embodiment of FIG. 6, the digital control unit 202 reflects the light twice, first to the dispersive objective lens 21, and the second time to the spectroscopic element 24 and then to the light. On the sensing device 22. Therefore, the effect of the analog pinhole generated by the digital control unit 202 can increase the confocal effect, that is, increase the resolution of the axial direction (depth direction).

在圖1A~1B與圖6中係為針對量測物體表面形貌深度的實施例,不過根據本發明利用繞射圖案還原待測面形貌的技術,並不限制於量測物體表面的形貌,在另一實施例中,可以進一歩利用具有穿透性的光源投射在待測物上,而量測到待測物內部光反射介面(含物體之背面)的形貌。所謂內部,可以為待測物與承載台接觸的下表面,或者是待測物內部的結構面,例如缺陷或者是中空結構等,如圖1C所示,在本實施例中係以圖1A的光學系統架構來說明,在本實施例中的光源所產生的入射光為對待測物具有穿透性的光源,在一實施例中,例如:光源選用紅外光,待測物為矽晶圓,在此架構下,穿透待測物8a,並在待測物8a的底面反射,形成測物光93a,再反射經過色散物鏡21而在光感測裝置22上形成對應該待測物底面的形貌深度的繞射影像。此外,在另一實施例中,在待測物體8a中, 如果有裂縫或者是內層的中空結構83,入射光在該裂縫表面或者是中空結構表面上會反射形成測物光93b,而在光感測裝置22上產生對應該裂縫表面或內層結構表面的光譜影像圖案。要說明的是,雖然圖1C係以圖1A的光學系統來說明,但並不以該光學系統為使用限制,圖1B和圖6的光學系統也可以應用。1A-1B and FIG. 6 are embodiments for measuring the surface topography depth of an object, but the technique for reducing the topography of the surface to be measured by using the diffraction pattern according to the present invention is not limited to measuring the shape of the surface of the object. In another embodiment, the light source that is penetrating is projected onto the object to be tested, and the topography of the light reflecting interface (including the back side of the object) inside the object to be tested is measured. The inside can be the lower surface of the object to be tested in contact with the carrier, or the structural surface inside the object to be tested, such as a defect or a hollow structure, as shown in FIG. 1C. In this embodiment, the structure of FIG. 1A is used. The optical system architecture is used to illustrate that the incident light generated by the light source in the embodiment is a light source having transparency to the object to be tested. In an embodiment, for example, the light source is selected from infrared light, and the object to be tested is a germanium wafer. Under this structure, the object to be tested 8a is penetrated and reflected on the bottom surface of the object to be tested 8a to form the object light 93a, and then reflected through the dispersion objective lens 21 to form a bottom surface corresponding to the object to be tested on the light sensing device 22. Diffraction image of depth of appearance. In addition, in another embodiment, in the object to be tested 8a, if there is a crack or an inner layer hollow structure 83, the incident light is reflected on the crack surface or the hollow structure surface to form the object light 93b, and A spectral image pattern corresponding to the surface of the crack or the surface of the inner structure is produced on the light sensing device 22. It is to be noted that although FIG. 1C is illustrated by the optical system of FIG. 1A, the optical system is not limited in use, and the optical systems of FIGS. 1B and 6 can also be applied.

接下來說明本發明光譜影像圖案的原理,在光學上,夫朗和斐繞射(Fraunhofer diffraction),又稱遠場繞射,是波動繞射的一種,在電磁波通過針孔或狹縫時發生,導致觀測到的成像大小有所改變,成因是觀測點的遠場位置,及通過針孔向外的繞射波有漸趨平面波的性質。在本發明中由於從數位調控單元202所產生的點光源至待測物8的距離,遠大於數位調控單元202中產生點光源的尺寸,例如2x2的光控開關的尺寸,因此,可以適用夫朗和斐繞射的原理。Next, the principle of the spectral image pattern of the present invention will be described. Optically, Fraunhofer diffraction, also known as far-field diffraction, is a kind of wave diffraction which occurs when electromagnetic waves pass through pinholes or slits. This results in a change in the size of the observed image due to the far field position of the observation point and the fact that the diffracted wave passing through the pinhole has a progressive plane wave. In the present invention, since the distance from the point light source generated by the digital regulating unit 202 to the object to be tested 8 is much larger than the size of the point light source generated in the digital control unit 202, for example, the size of the 2x2 light control switch, it is applicable to The principle of Lang and Fei diffraction.

在一實施例中,由於數位調控單元202中產生點光源的光控開關203陣列可視為矩形點光源,因此可用如圖1D所示的架構來分析。在圖1D中,S代表點光源平面,其中斜線區域代表將光反射至別處的光控開關203b,而空白區域則代表將光反射至色散物鏡21的光控開關203a。因此空白區域可以視為矩形的點光源。S’則代表光譜影像圖案的平面,根據上述的架構,透過該點光源在S’平面上產生的光譜影像圖案上每一個位置P的光場 u(x,y,z) 可以被表示為如式(1)所示:…..(1) 其中z為點光源至光學繞射圖案平面S’的距離,A為光源振幅,a, b為代表空白區域矩形點光源的尺寸。當原點改成矩形點光源的中心位置時,進行積分的結果,可以得到如式(2)所示:….. (2) 其中如下式(3)所示:….. (3) 其中如下式(4)所示:….. (4) 其中代表沿著Y方向的光學繞射角度。 根據圖1A的架構,當待測物和光源的距離改變,不同聚失焦(in and out focus) 的光譜影像圖案會被光感測裝置22所擷取,而該光譜影像圖案上每一個位置的強度分布則如式(5)所示:….. (5)In an embodiment, since the array of light control switches 203 that generate point sources in the digital control unit 202 can be regarded as a rectangular point source, it can be analyzed using the architecture shown in FIG. 1D. In Fig. 1D, S represents a point source plane, wherein the shaded area represents the light control switch 203b that reflects light to another location, and the blank area represents the light control switch 203a that reflects light to the dispersion objective 21. Therefore, the blank area can be regarded as a rectangular point source. S' represents the plane of the spectral image pattern. According to the above structure, the light field u(x, y, z) of each position P on the spectral image pattern generated on the S' plane through the point source can be expressed as Equation (1): ..... (1) where z is the distance from the point source to the optical diffraction pattern plane S', A is the source amplitude, and a, b is the size of the rectangular point source representing the blank area. When the origin is changed to the center position of the rectangular point source, the result of integration can be obtained as shown in equation (2): ..... (2) where As shown in the following formula (3): ..... (3) where As shown in the following formula (4): ..... (4) where Represents the optical diffraction angle along the Y direction. According to the architecture of FIG. 1A, when the distance between the object to be tested and the light source changes, different in and out focus spectral image patterns are captured by the light sensing device 22, and each position on the spectral image pattern The intensity distribution is as shown in equation (5): ..... (5)

再回到圖1A所示,處理單元23則可以根據待測物8的光譜影像圖案以及資料庫中的比對樣本資訊,決定待測物8表面上對應每一個點光源(寬頻調制光200)所投射到待測物8表面的特定位置的深度。亦即,與處理單元23電性連接的資料庫內存放有對應不同已知深度的複數個比對樣本資訊。在資料庫的另一實施例中,資料庫該內存放有對應數位調控單元202內單一或多個光控開關202a所產生的寬頻調制光200位置之已知深度的複數個比對樣本資訊。而光感測裝置22會產生一張光譜影像圖案,其上具有複數個對應不同位置之寬頻調制光200的子光譜影像圖案,因此處理單元23針對每一個子光譜影像圖案,將其與資料庫中對應相同點光源位置的複數個比對樣本資訊進行正規化互相關(NCC)演算,處理單元23可以根據演算的結果決定待測物表面上對應該點光源的位置所具有的深度。該演算法係為,將每一子光譜影像圖案中對應不同濾波元件223所感測到的光強度Ib 與相應的每一比對樣本資訊中相應濾波元件223的影像光強度Rb 進行演算。在一實施例中,更可以包括雜訊參數,其演算式如式(6)所示:…. (6) 其中b是相應每一個濾波元件對應的波長,I是擷取的光譜影像圖案光強度,亦即,Ib 指的是每一子光譜影像圖案中對應不同濾波元件223所感測到的光強度,R是比對樣本資訊的光強度,亦即,Rb 是相應的每一比對樣本資訊中相應濾波元件223的影像光強度,nI 是擷取的光譜影像圖案的雜訊,nR 是比對樣本資訊中的雜訊。Returning to FIG. 1A, the processing unit 23 can determine each point light source (wideband modulated light 200) on the surface of the object to be tested 8 according to the spectral image pattern of the object 8 to be tested and the comparison sample information in the database. The depth of a specific position projected onto the surface of the object to be tested 8. That is, a plurality of comparison sample information corresponding to different known depths are stored in the database electrically connected to the processing unit 23. In another embodiment of the database, the database stores therein a plurality of comparison sample information corresponding to a known depth of the position of the broadband modulated light 200 produced by the single or plurality of light control switches 202a in the digital control unit 202. The light sensing device 22 generates a spectral image pattern having a plurality of sub-spectral image patterns corresponding to the broadband modulated light 200 at different positions, so that the processing unit 23 maps each sub-spectral image pattern to the database. The normalized cross-correlation (NCC) calculation is performed on the plurality of comparison sample information corresponding to the position of the same point source, and the processing unit 23 may determine the depth of the position of the object to be tested corresponding to the position of the point source according to the calculation result. The algorithm is to calculate the light intensity I b corresponding to the different filter elements 223 in each sub-spectral image pattern and the image light intensity R b of the corresponding filter element 223 in each of the corresponding sample information. In an embodiment, the noise parameter may be further included, and the calculation formula is as shown in the formula (6): (6) where b is the wavelength corresponding to each of the filter elements, and I is the spectral intensity of the extracted spectral image pattern, that is, I b refers to the sensing of the corresponding different filter elements 223 in each of the sub-spectral image patterns. The intensity of the light, R is the light intensity of the comparison sample information, that is, R b is the image light intensity of the corresponding filter element 223 in each of the corresponding sample information, and n I is the impurity of the captured spectral image pattern. News, n R is the noise in the sample information.

再另一實施例中,擷取一光譜影像圖案之後,該處理單元23改變點光源的位置,每改變一次,就得到另一光譜影像圖案,再與相應點光源位置的複數個光學比對樣本資訊進行演算,可以得到待測物表面上相應改變位置的點光源的位置所具有的深度資訊。待收集到關於物體表面或內部光反射介面上複數個位置的光譜影像圖案,並進行演算得知其深度資訊後,即可以進而重建待測物表面三維形貌。要說明的是,是否要利用數位調控單元202改變點光源位置,可以根據重建影像解析度而定,如果點光源的數量夠多,也足夠構成偵測所需的解析度,則可以單次性擷取影像即可。此外,針對多次切換點光源位置的控制方式而言,由於控制光控開關改變點光源的位置速度很快,大於影像擷取裝置擷取影像的偵測率,因此影像擷取裝置的偵測率越快,則代表可以快速的完成物體表面或內部光反射介面的掃描。透過這樣的掃描方式,可以避免習用橫向掃描的機構動作,進而降低量測中震動的干擾,提升的完成表面三維形貌偵測的速度與準確性。In another embodiment, after capturing a spectral image pattern, the processing unit 23 changes the position of the point source, and each time it is changed, another spectrum image pattern is obtained, and the plurality of optical comparison samples with the position of the corresponding point source are compared. The information is calculated to obtain the depth information of the position of the point light source correspondingly changed on the surface of the object to be tested. After the spectral image pattern of a plurality of positions on the surface of the object or the internal light reflection interface is collected, and the depth information is calculated, the three-dimensional shape of the surface of the object to be tested can be reconstructed. It should be noted that whether to change the position of the point source by using the digital control unit 202 may be determined according to the resolution of the reconstructed image. If the number of point sources is sufficient, and the resolution required for the detection is sufficient, the unimorphism may be used. Capture the image. In addition, for the control mode of switching the position of the point light source multiple times, since the position of the point light source is changed by controlling the light control switch, the detection speed of the image capturing device is larger than that of the image capturing device, so the image capturing device detects The faster the rate, the faster the scanning of the surface of the object or the internal light reflecting interface can be done. Through such a scanning method, the mechanism of the horizontal scanning can be avoided, thereby reducing the interference of the vibration in the measurement, and improving the speed and accuracy of the surface three-dimensional shape detection.

請參閱圖7所示,接下來說利用前述之彩色共焦系統所進行的表面形貌偵測方法。在本實施例中,以圖1A的架構為例,該偵測方法4首先進行步驟40建立一資料庫,其係具有複數比對樣本資訊的資料庫,本實施例中,該比對樣本資訊為複數張光譜影像圖案,其係為對應至少一光波長的比對樣本資訊。其中,建立該光學比對樣本資訊的資料庫包括有下列步驟,如圖5所示,先將一平面鏡80放置承載台27上,再使該光源模組20產生至少一點光源,其係為白光光源,而經由該色物鏡投射至該平面鏡80上。在本步驟的實施例中,係以複數個二維陣列排列的點光源來做說明,亦即複數個經由數位調控單元202反射至物鏡21的入射光,從平面鏡80反射至光感測裝置22上。接著,控制該光感測裝置22擷取影像。要說明的是,由於本實施例具有複數個點光源,因此產生的單張光譜影像圖案中具有複數個相應每一個點光源的子光譜影像圖案。再將每一個子光譜影像圖案的位置與數位調控單元202的光控開關位置進行關聯。在一實施例中,由於本實施例的光感測裝置22具有16個波長的濾波元件,因此該單張光譜影像圖案可以進一步的分成16張相應不同波長的影像,進而以對比度最高的影像來進行位置關聯的演算。Referring to FIG. 7, the method of surface topography detection using the aforementioned color confocal system is described. In this embodiment, taking the architecture of FIG. 1A as an example, the detecting method 4 first performs step 40 to establish a database, which is a database with complex comparison sample information. In this embodiment, the comparison sample information The plurality of spectral image patterns are comparison sample information corresponding to at least one wavelength of light. The database for establishing the optical comparison sample information includes the following steps. As shown in FIG. 5, a plane mirror 80 is first placed on the carrying platform 27, and then the light source module 20 generates at least a light source, which is white light. The light source is projected onto the plane mirror 80 via the color objective lens. In the embodiment of the present step, a plurality of two-dimensional arrays of point light sources are illustrated, that is, a plurality of incident lights reflected by the digital control unit 202 to the objective lens 21 are reflected from the plane mirror 80 to the light sensing device 22 . on. Then, the light sensing device 22 is controlled to capture an image. It should be noted that, since the embodiment has a plurality of point light sources, the generated single spectral image pattern has a plurality of sub-spectral image patterns corresponding to each of the point light sources. The position of each of the sub-spectral image patterns is then associated with the position of the photo-controlled switch of the digital control unit 202. In an embodiment, since the light sensing device 22 of the embodiment has a filter element of 16 wavelengths, the single spectral image pattern can be further divided into 16 images of different wavelengths, and the image with the highest contrast is used. Perform a positional correlation calculation.

接下來,對該平面鏡80進行深度掃描並擷取相應深度的光學繞射影像。每一個深度h0 ~ hn 都取一相應的光譜影像圖案,每一張光譜影像圖案都具有複數個相對應點光源位置的子光譜影像圖案。例如,當影像擷取裝置22擷取到關於目前平面鏡位置 h0 的光譜影像圖案之後,接著改變該平面鏡的位置 h0 換至 h1 ,例如,透過壓電元件(PZT)調整至下一個位置 h1 之後,繼續擷取關於改變位置的光譜影像圖案。由於光學共焦之聚失焦效應,每一個點光源在每一個深度位置所產生的子光譜影像圖案是唯一。經過改變該平面鏡深度位置從 h0 至 hn 之後,亦即校正的深度範圍的所有深度均被完成時,對應每一個點光源的位置可以得到複數個對應不同已知深度的子光譜影像圖案,這些子光譜影像圖案可以作為將來判斷待測物表面深度的光學比對樣本資訊。因此,資料庫中儲存有關於複數個對應數位調控單元202所產生的點光源位置所具有的複數個比對樣本資訊,本實施例中所產生的比對樣本資訊屬於數位離散光學圖譜。Next, the plane mirror 80 is depth scanned and an optical diffraction image of a corresponding depth is captured. Each depth h 0 ~ h n takes a corresponding spectral image pattern, and each spectral image pattern has a plurality of sub-spectral image patterns corresponding to the position of the point source. For example, after the image capturing device 22 captures the spectral image pattern about the current plane position h 0 , then changes the position h 0 of the plane mirror to h 1 , for example, through the piezoelectric element (PZT) to the next position. After h 1 , continue to capture the spectral image pattern of the changed position. Due to the defocusing effect of the optical confocal, the sub-spectral image pattern produced by each point source at each depth position is unique. After changing the depth position of the plane mirror from h 0 to h n , that is, when all depths of the corrected depth range are completed, a plurality of sub-spectral image patterns corresponding to different known depths may be obtained corresponding to the position of each point source. These sub-spectral image patterns can be used as optical comparison sample information for judging the surface depth of the object to be tested in the future. Therefore, the database stores a plurality of comparison sample information about the position of the point source generated by the plurality of corresponding digit adjustment units 202. The comparison sample information generated in the embodiment belongs to the digital discrete optical spectrum.

接著進行步驟41,控制光源模組20中的光源201產生之一光束90投射至數位調控單元202而產生至少一寬頻調制光200。為了避免光線之間干擾的產生,在一實施例中,如圖3A所示,可以先讓數位調控單元202特定位置的光控開關202b反射光至色散物鏡,以形成多道寬頻調制光,每一個寬頻調制光之間具有適當的間隔,以形成複數道模擬的點光源,進而可以避免產生橫向干擾。要說明的是,點光源的大小可以根據需求而定,並不以圖3A所示的單一光控開關202b為限。如圖前述圖9B的關係,在步驟41中,更包括有改變接收該光束的該光控開關的數量,進而控制通過該濾波陣列所形成的光譜反應曲線的步驟。要說明的是,改變接收該光束的該光控開關的數量的步驟,並非必要的結構,也就是說,當技術演進讓每一濾波陣列的濾波元件數量增加時,就不一定要用前述知方式來調整光譜反應曲線的寬度範圍。Next, in step 41, the light source 201 in the light source module 20 is controlled to generate a light beam 90 that is projected to the digital control unit 202 to generate at least one broadband modulated light 200. In order to avoid the generation of interference between the light, in an embodiment, as shown in FIG. 3A, the light control switch 202b at a specific position of the digital control unit 202 may be first reflected to the dispersion objective lens to form a plurality of broadband modulated lights. A wide frequency modulated light has an appropriate spacing between the plurality of analog point sources to avoid lateral interference. It should be noted that the size of the point source may be determined according to requirements, and is not limited to the single light control switch 202b shown in FIG. 3A. As shown in the foregoing relationship of FIG. 9B, in step 41, there is further included a step of changing the number of the photo-controlled switches that receive the light beam, thereby controlling the spectral response curve formed by the filter array. It should be noted that the step of changing the number of the light control switches receiving the light beam is not a necessary structure, that is, when the technological evolution increases the number of filter elements of each filter array, it is not necessary to use the foregoing knowledge. The way to adjust the width of the spectral response curve.

接著,進行步驟41使該多道寬頻調制光200通過色散物鏡21,而將每一寬頻調制光200色散。由於寬頻調制光200為具有多種不同頻率的光線合成,因此經過色散之後的每一寬頻調制光200形成具有不同連續聚焦深度的多個偵測光205R、205G、205B而投射至物件8上,每一個偵測光205R、205G、205B對應一波長。又因為每一個偵測光205R、205G、205B的聚焦深度不同,因此投射到物件8上的特定位置之後,對應該位置所具有的深度的偵測光,在反射之後會具有最大的光強度。由該物件所反射的相對應複數個偵測光205R、205G、205B的測物光206,經過分光元件24的反射,會投射至整合有濾波模組220,以及光感測器221之光感測裝置22。Next, step 41 is performed to pass the multi-channel wide-band modulated light 200 through the dispersion objective lens 21 to disperse each of the broadband-modulated lights 200. Since the broadband modulated light 200 is a light composite having a plurality of different frequencies, each of the broadband modulated lights 200 after dispersion forms a plurality of detection lights 205R, 205G, 205B having different continuous depths of focus and is projected onto the object 8, each of which is projected onto the object 8, each A detection light 205R, 205G, 205B corresponds to a wavelength. Moreover, since the depth of focus of each of the detecting lights 205R, 205G, and 205B is different, after detecting a specific position on the object 8, the detected light corresponding to the depth of the position has the maximum light intensity after the reflection. The object light 206 corresponding to the plurality of detection lights 205R, 205G, and 205B reflected by the object is reflected by the beam splitting element 24, and is projected to the integrated filter module 220, and the light sensor 221 Measuring device 22.

接著進步驟42,使該多道測物光206通過濾波模組220進行濾光。要說明的是,由於濾波模組220具有複數個濾波陣列,而每一個濾波陣列具有複數個濾波元件分別允許一特定波長之測物光通過,因此,在一實施例中,可以透過適當的設計,讓每一個濾波陣列與每一道測物光對應,且每一個濾波陣列中複數個濾波元件所涵蓋的波長範圍對應寬頻調制光的波長範圍。透過這樣的設計,如圖8所示,可以讓反射回來的測物光206,通過相對應的濾波陣列222時,讓每一個濾波元件223,對通過的測物光206進行濾光。Next, proceeding to step 42, the plurality of object light 206 is filtered by the filter module 220. It is to be noted that, since the filter module 220 has a plurality of filter arrays, and each of the filter arrays has a plurality of filter elements respectively allowing a specific wavelength of the object light to pass through, in an embodiment, the appropriate design can be adopted. Each filter array corresponds to each of the object light, and a wavelength range covered by the plurality of filter elements in each filter array corresponds to a wavelength range of the broadband modulated light. Through such a design, as shown in FIG. 8, the reflected object light 206 can be passed through the corresponding filter array 222, and each of the filter elements 223 can filter the passing object light 206.

通過濾波元件223之後,接著進行步驟43,使光感測器感測每一道通過濾波元件之測物光的光強度。同樣參閱圖8所示,由於光感測器224係由複數個光感測元件225所構成,在本實施例中,每一個光感測元件225對應一個濾波元件223,但不以此為限,例如,在另一實施例中,每一個濾波元件也可以對應有複數個光感測元件。以每一個光感測元件225對應一個濾波元件223為例,每一個光感測元件225可以感測到通過對應濾波元件223的測物光206,進而感測到相應測物光206的光強度。在圖8中,標號7中代表通過每一個濾波陣列222中的複數個濾波元件223的測物光,其所具有的光強度,複數個光強度70a以及對應測物光波長的資訊會傳給處理單元23。After passing through the filter element 223, step 43 is followed to cause the photosensor to sense the light intensity of each of the object light passing through the filter element. As shown in FIG. 8 , since the photo sensor 224 is composed of a plurality of photo sensing elements 225 , in the embodiment, each of the photo sensing elements 225 corresponds to one filter element 223 , but not limited thereto. For example, in another embodiment, each filter element may also correspond to a plurality of light sensing elements. For example, each of the light sensing elements 225 corresponds to one filter element 223. Each of the light sensing elements 225 can sense the light of the object passing through the corresponding filter element 223, thereby sensing the light intensity of the corresponding object light 206. . In FIG. 8, reference numeral 7 represents the object light passing through a plurality of filter elements 223 in each filter array 222, and the light intensity, the plurality of light intensities 70a, and the information corresponding to the wavelength of the object light are transmitted to the object. Processing unit 23.

接著,進行步驟44,處理單元23根據每一個感測陣列所得到的複數測物光強度訊號(本實施例為16個)形成一張具有光譜影像圖案的影像。在本步驟44中,由於步驟43所產生的訊號都會傳輸至處理單元23,因此處理單元23可以根據回傳的光強度訊號中,產生光譜影像圖案的影像。請參閱圖1A和圖8來說明,對於偵測位置A而言,其對應個濾波陣列222,所偵測出來的16個光強度70a,每一光強度對應一波長,因此在光譜影像圖案的影像中相應每一濾波陣列222的濾波元件223都會具有一光強IbNext, in step 44, the processing unit 23 forms an image having a spectral image pattern according to the plurality of object light intensity signals (16 in this embodiment) obtained by each sensing array. In this step 44, since the signal generated in step 43 is transmitted to the processing unit 23, the processing unit 23 can generate an image of the spectral image pattern based on the returned light intensity signal. Referring to FIG. 1A and FIG. 8 , for the detection position A, the corresponding filter array 222 detects 16 light intensities 70 a , each of which corresponds to a wavelength, and thus is in a spectral image pattern. The filter element 223 of each filter array 222 in the image will have a light intensity I b .

接著,再進行步驟45透過正歸化影像匹配運算,例如正規化互相關(normalized cross correlation) 演算方式,來決定待測物上對應光控開關所產生點光源的深度。在本步驟中,首先從光譜影像圖案找出對應光控開關所產生點光源的位置所具有的子光譜影像圖案,然後從資料庫中選擇對應該子光譜影像圖案點光源位置所具有的複數個比對樣本資訊,每一個比對樣本資訊對應著一個已知深度。接下來,根據上述方程式(6),從對應每一個濾波陣列222的所量測到之光譜圖案中擷取出對應每一濾波元件223的複數個光強度Ib 。要說明的是,本實施例中,每一個濾波陣列222有16個濾波元件,其波長範圍為465nm~630nm,但不以此為限制。在一實施例中,16個波長分別為如圖9A所示的波長組合,但不以此為限制。Then, in step 45, a normalized cross correlation calculation method, such as a normalized cross correlation calculation method, is used to determine the depth of the point source generated by the corresponding light control switch on the object to be tested. In this step, first, the sub-spectral image pattern corresponding to the position of the point source generated by the photo-control switch is found from the spectral image pattern, and then the plurality of sub-spectral image position points corresponding to the sub-spectral image pattern are selected from the database. Comparing the sample information, each comparison sample information corresponds to a known depth. Next, according to the above equation (6), a plurality of light intensities I b corresponding to each of the filter elements 223 are extracted from the measured spectral patterns corresponding to each of the filter arrays 222. It should be noted that, in this embodiment, each filter array 222 has 16 filter elements whose wavelength ranges from 465 nm to 630 nm, but is not limited thereto. In one embodiment, the 16 wavelengths are respectively a combination of wavelengths as shown in FIG. 9A, but are not limited thereto.

再將量測之每一子光譜影像圖案所得到的複數個不同光強度Ib ,根據式(6) ,和每一深度位置相對應的比對樣本資訊所具有的相應之複數個光強度Rb 進行演算,以計算出量測之該子光譜影像圖案和每一個比對樣本資訊的一正規化互相關值(normalized cross correlation, NCC)。如圖10所示,其中標號50代表光感測裝置所產生對應一濾波陣列所具有的量測子之光譜影像圖案,亦即代表關於待測物表面上的特定位置被一點光源投射所反射的量測之子光譜影像圖案,而標號511至511n則代表資料庫中對應該點光源位置的多張比對樣本資訊511~511n,每一比對樣本資訊511~511n對應一個已知深度。本實施例中,量測的子光譜影像圖案50具有16個光強度Ib ,和每一個光學比對樣本資訊對應的光強度值Rb 之間透過方程式(6)進行演算,而得到一個NCC值。 因此,子光譜影像圖案50在和複數張比對樣本資訊511~511n進行運算之後,可以得到複數個NCC0~NCCn值。由於每一比對樣本資訊511至511n對應一個深度,因此每一個NCC 值同樣對應一個深度,藉由複數個NCC值NCC0~NCCn與其對應的深度,可以建構出如圖11所示的正規化互相關值與深度關係曲線。從曲線中可以看到其具有一最大值,該最大的NCC值代表待測物的子光譜影像圖案和對應該NCC值的比對樣本資訊兩者最接近。因此,最後一個步驟45,即為從該複數個NCC值NCC0~NCCn中,找出最大NCC值,並以相應該NCC值所的比對樣本資訊所對應的深度值,作為待測物上對應該子光譜影像圖案位置的深度。以圖11為例,其係為圖10的演算所得的正規化互相關值(NCC)與深度關係曲線。由圖11可以看出,在深度90 μm的地方其NCC值最大,因此可以代表待測物表面上對應該子光譜影像圖案50的位置其深度為90 μm。同理,其他點光源所對應的子光譜影像圖案也是根據前述的方式找出相應的深度。最後,根據對應多個點光源位置的深度,即可以透過單一次的光譜影像圖案擷取,進行物體表面或內部光反射介面全域式的形貌量測掃描,進而完整的重建待測物表面的二維或者是三維形貌。And measuring a plurality of different light intensities I b obtained by each sub-spectral image pattern according to formula (6), and corresponding to each of the depth positions, the corresponding plurality of light intensities R of the sample information b Performing a calculation to calculate a normalized cross correlation (NCC) of the sub-spectral image pattern of the measurement and each of the aligned sample information. As shown in FIG. 10, reference numeral 50 denotes a spectral image pattern of a measuring instrument corresponding to a filter array generated by the light sensing device, that is, a reflection of a specific position on the surface of the object to be tested reflected by a point light source. The sub-spectral image pattern is measured, and the reference numerals 511 to 511n represent a plurality of comparison sample information 511~511n corresponding to the position of the point source in the database, and each comparison sample information 511~511n corresponds to a known depth. In this embodiment, the measured sub-spectral image pattern 50 has 16 light intensities I b , and the optical intensity value R b corresponding to each optical comparison sample information is calculated by using equation (6) to obtain an NCC. value. Therefore, the sub-spectral image pattern 50 can obtain a plurality of NCC0~NCCn values after calculating the sample information 511~511n with the plurality of sheets. Since each comparison sample information 511 to 511n corresponds to a depth, each NCC value also corresponds to a depth. By a plurality of NCC values NCC0~NCCn and their corresponding depths, a normalized mutual interaction as shown in FIG. 11 can be constructed. Correlation value versus depth curve. It can be seen from the curve that it has a maximum value which represents the closest of the sub-spectral image pattern of the object to be tested and the comparison sample information corresponding to the NCC value. Therefore, the last step 45 is to find the maximum NCC value from the plurality of NCC values NCC0~NCCn, and use the depth value corresponding to the sample information corresponding to the NCC value as the object to be tested. The depth of the position of the sub-spectral image pattern should be. Taking FIG. 11 as an example, it is a normalized cross-correlation value (NCC) and a depth relationship curve obtained by the calculation of FIG. As can be seen from Fig. 11, the NCC value is the largest at a depth of 90 μm, so that it can represent the position of the sub-spectral image pattern 50 on the surface of the object to be tested, and its depth is 90 μm. Similarly, the sub-spectral image patterns corresponding to other point sources are also found to have corresponding depths according to the foregoing manner. Finally, according to the depth corresponding to the position of the plurality of point light sources, the single-layer spectral image pattern capture can be used to perform the whole-surface shape measurement scan of the surface of the object or the internal light reflection interface, thereby completely reconstructing the surface of the object to be tested. Two-dimensional or three-dimensional shape.

此外,要說明的是,如果要增加量測解析度,可以進行步驟46再一次變換點光源的位置,如圖3A所示,其中在第一時間點的時候,數位調控單元202中光控開關202b處於開的狀態時,亦即將光導引至物鏡,光控開關203a處關的狀態時,亦即將光導引至他處。當擷取完光譜影像圖案的時候,處理單元23控制數位調控單元202使其改變點光源的位置,形成如圖3B中的狀態,如此即可以對待測物表不同位置進行深度量測,以提高解析度。In addition, it should be noted that if the measurement resolution is to be increased, the position of the point source may be changed again in step 46, as shown in FIG. 3A, wherein at the first time point, the light control switch of the digital control unit 202 When the 202b is in the on state, the light is guided to the objective lens, and when the light control switch 203a is turned off, the light is guided to another place. When the spectral image pattern is captured, the processing unit 23 controls the digital control unit 202 to change the position of the point source to form a state as shown in FIG. 3B, so that depth measurement can be performed on different positions of the object to be measured to improve Resolution.

在另一實施例中,由於步驟45正歸化影像匹配運算為對應單一濾波陣列所得到的子光譜影像圖案,其解析度係隨著率波陣列的大小而定。由於在本實施例中每一光譜圖案具有16種波長,因此如果要增加量測的精度,有兩種方式,一種為將每一個陣列模組的矩陣增加,例如改成10x10或20x20等,另一種方式為利用週邊其他濾波陣列組成更大的濾波陣列所產生的子光譜影像圖案,來進行演算。以圖10為例,將環繞於量測子光譜影像圖案50 周圍的光譜影像圖案(斜線區域)組合成3x3的子光譜影像圖案。在另一實施例中,也可以向外在擴增成5x5的大小,其係根據需求而定。要說明的是,以3x3為例,相應於該量測子光譜影像圖案的尺寸,在步驟40建立光學比對樣本資訊也要採用相應尺寸的大小。建立的方式與前述步驟40相似,差異的是對應每一深度所擷取的影像不是單一濾波陣列所產生的子光譜影像圖案,而是3x3個濾波陣列所產生的子光譜影像圖案。In another embodiment, since the step 45 normalizes the image matching operation to the sub-spectral image pattern obtained by the corresponding single filter array, the resolution is determined by the size of the rate wave array. Since each spectral pattern has 16 wavelengths in this embodiment, if the accuracy of the measurement is to be increased, there are two ways, one is to increase the matrix of each array module, for example, to 10x10 or 20x20, etc., One way is to perform calculations by using sub-spectral image patterns generated by other filter arrays in the periphery to form a larger filter array. Taking FIG. 10 as an example, the spectral image patterns (hatched areas) surrounding the measurement sub-spectrum image pattern 50 are combined into a 3×3 sub-spectral image pattern. In another embodiment, it can also be expanded outward to a size of 5x5, depending on the needs. It should be noted that, taking 3x3 as an example, corresponding to the size of the spectral image of the measurement sub-spectrum, the optical comparison sample information is also used in step 40 to adopt the corresponding size. The manner of establishment is similar to the foregoing step 40. The difference is that the image captured for each depth is not a sub-spectral image pattern generated by a single filter array, but a sub-spectral image pattern generated by 3×3 filter arrays.

要說明的是,前述的量測子光譜影像圖案50與資料庫中的光學比對樣本資訊都是屬於數位離散光學圖譜之光譜影像圖案,以4x4濾波陣列222為例,主因為濾波陣列222能允許16種波長通過而被光感測器221感測。爲了提升深度(縱向)解析度,在另一實施例中,可以對離散光學圖譜進行數據擬合與差補,將離散光學圖譜轉換成類比連續光學圖譜。以圖12A所示的本發明之彩色共焦系統所進行的表面形貌偵測方法流程之另一實施例示意圖為例,在該流程4a中,步驟41a~44a與46a係與圖7相似,所差異的是,在圖7所示之步驟40資料庫,其係具有複數數位離散比對樣本資訊的資料庫,而在本實施例中步驟40a所建立的資料庫中,其所含有的比對樣本資訊為複數個對應不同光源位置以及不同深度的類比連續光學圖譜;以及本實施例的步驟45a是利用類比連續光學圖譜來進行深度位置演算。It should be noted that the foregoing measurement sub-spectrum image pattern 50 and the optical comparison sample information in the database are spectral image patterns belonging to the digital discrete optical spectrum, and the 4×4 filter array 222 is taken as an example, mainly because the filter array 222 can 16 wavelengths are allowed to pass and are sensed by the photo sensor 221. In order to increase the depth (longitudinal) resolution, in another embodiment, data fitting and subtraction can be performed on the discrete optical map, and the discrete optical map is converted into an analog continuous optical map. A schematic diagram of another embodiment of a process for detecting a surface topography performed by the color confocal system of the present invention shown in FIG. 12A is taken as an example. In the process 4a, steps 41a-44a and 46a are similar to FIG. The difference is that in the step 40 database shown in FIG. 7, which is a database having a plurality of discrete ratios of sample information, and in the database established in step 40a in this embodiment, the ratio is The sample information is a plurality of analog continuous optical maps corresponding to different light source positions and different depths; and step 45a of the present embodiment uses the analog continuous optical map to perform depth position calculation.

如圖12B所示,首先說明步驟40a中類比連續光學圖譜的方式的建立流程,首先以步驟401建立一光譜校正矩陣,在本步驟中,對每一組濾波陣列222做校正程序,校正程序是利用單色儀來產生波長範圍400-1000 nm且間格為1 nm 的離散光譜。讓單色儀產生的離散光譜通過每一組濾波陣列222的每一個濾波元件223,量測單一濾波元件223對每一個波長的量子效率(Quantum Efficiency, QE),整合每一個波長的量子效率成為一個濾波元件223的量子效率曲線,如圖13所示,其係為單一濾波元件223對波長範圍 400-1000 nm 所產生的量子效率曲線。因此對於每一個濾波陣列222而言,每一個濾波元件都會有一量子效率曲線,整合全部的量子效率曲線,即可構成濾波陣列的光譜校正矩陣,其結構如下式(7)所示。….(7) 此矩陣的行(column)代表濾波元件,而每一列(row)則表示對應每一濾波元件之對各個波長λ1n 的量子效率,以4x4濾波陣列為例,式(7)的矩陣為16*600的矩陣。要說明的是,產生光譜校正矩陣的光譜波長範圍並不以400~1000nm為限制,可以根據需求而定,例如也可以直接根據濾波陣列的波長範圍,例如 :465~630nm,來進行建立矩陣。As shown in FIG. 12B, the process of establishing the analog optical pattern in step 40a is first described. First, a spectral correction matrix is established in step 401. In this step, a calibration procedure is performed for each group of filter arrays 222, and the calibration procedure is A monochromator is used to generate discrete spectra with a wavelength range of 400-1000 nm and a spacing of 1 nm. Let the discrete spectrum generated by the monochromator pass through each filter element 223 of each set of filter arrays 222, measure the quantum efficiency (QE) of the single filter element 223 for each wavelength, and integrate the quantum efficiency of each wavelength into The quantum efficiency curve of a filter element 223, as shown in Figure 13, is the quantum efficiency curve produced by a single filter element 223 for a wavelength range of 400-1000 nm. Therefore, for each filter array 222, each filter element has a quantum efficiency curve, and the entire quantum efficiency curve is integrated to form a spectral correction matrix of the filter array, and the structure thereof is as shown in the following formula (7). ....(7) The row of this matrix represents the filter element, and each row represents the quantum efficiency of each filter element for each wavelength λ 1n , taking a 4x4 filter array as an example. The matrix of (7) is a matrix of 16*600. It should be noted that the spectral wavelength range in which the spectral correction matrix is generated is not limited to 400 to 1000 nm, and may be determined according to requirements. For example, the matrix may be established directly according to the wavelength range of the filter array, for example, 465 to 630 nm.

接著進行步驟402,從光譜校正矩陣(7)中取出相應濾波陣列的有效波長範圍內的值,其係根據選用的濾波陣列的波長範圍來選定,在本實施例中的濾波陣列其有效範圍是465-630 nm。接著進行步驟403,針對每一濾波元件,將每一波長的量子效率值除以有效範圍內量子效率的總和,可以獲得每一波長對其量子效率的貢獻比例。接著,進行步驟404,將步驟40a所獲得對應每一深度的每一比對樣本資訊中對應每一濾波元件所具有的光強度量測值乘上相對應的量子效率的貢獻比例分佈,則可以得到通過此濾波元件的連續量子效率。最後,進行步驟405,將每一濾波陣列中,每一濾波元件的相應於465~630波長範圍內每一個波長所具有的量子效率相加,可以組合獲得該濾波陣列的類比式連續光譜圖譜。以圖14為例,爲了方便說明,圖14係以2x2的濾波陣列222a來說明。圖14中顯示出,每一濾波元件223b所對應的量子效率的貢獻比例分佈曲線為波長0~波長3。將波長0~波長3所對應的Y座標的量子效率比例(%)相加,則會得到對應濾波陣列222a的類比式連續光譜圖譜。同理,回到4x4的濾波陣列,會有16組量子效率的貢獻比例分佈,相加之後,也會得到相應每一個濾波陣列的比對資訊樣本所具有的類比式連續光譜圖譜。因此,資料庫中的對應每一光源所具有不同已知深度之每一比對樣本資訊,透過前述401~405的處理,可以轉換成對應每一個不同已知深度的類比式連續光譜圖譜。Next, in step 402, the value in the effective wavelength range of the corresponding filter array is taken out from the spectral correction matrix (7), which is selected according to the wavelength range of the selected filter array. The effective range of the filter array in this embodiment is 465-630 nm. Next, in step 403, for each filter element, the quantum efficiency value of each wavelength is divided by the sum of the quantum efficiencies in the effective range, and the contribution ratio of each wavelength to its quantum efficiency can be obtained. Then, step 404 is performed, and the ratio of the light intensity measurement value corresponding to each filter element in each comparison sample information obtained in step 40a is multiplied by the corresponding quantum efficiency contribution ratio distribution. The continuous quantum efficiency through this filter element is obtained. Finally, in step 405, the quantum efficiencies of each filter element corresponding to each wavelength in the 465-630 wavelength range are added in each filter array, and the analog continuous spectrum of the filter array can be obtained in combination. Taking FIG. 14 as an example, for convenience of explanation, FIG. 14 is explained by a 2×2 filter array 222a. As shown in FIG. 14, the contribution ratio distribution curve of the quantum efficiency corresponding to each filter element 223b is wavelength 0 to wavelength 3. Adding the quantum efficiency ratio (%) of the Y coordinate corresponding to the wavelength 0 to the wavelength 3, the analog continuous spectrum of the corresponding filter array 222a is obtained. Similarly, back to the 4x4 filter array, there will be 16 sets of quantum efficiency contribution ratio distributions. After addition, the analog continuous spectrum of the corresponding information samples of each filter array will be obtained. Therefore, each of the comparison sample information of the different known depths corresponding to each light source in the database can be converted into an analog continuous spectrum map corresponding to each different known depth through the processing of 401 to 405 described above.

在步驟40a建立連續光譜圖譜資訊之後,同樣進行步驟41a~44a的檢測流程,其係如圖7所述,在此不作贅述。接著進行步驟45a,將步驟44a得到的光強度資訊所形成的一張具有光譜影像圖案的影像與步驟40a所得到的對應不同深度位置的類比式連續光譜圖譜進行演算。在步驟45a中,首先將步驟44a所得之數位離散之光譜影像圖案與式(7)之光譜校正矩陣進行演算,以轉成一類比連續之光譜影像圖案。以一濾波陣列為例,在取得該濾波陣列中,通過每一個濾波元件的光強度資訊之後,亦即由光譜影像圖案中取得對應該濾波陣列之子光譜影像圖案,將該子光譜影像圖案中的每一個光強度與式(7)的光譜校正矩陣進行演算,會得到16個演算結果,在將此16個演算結果相加,會得到對應該濾波陣列的一量測類比式連續光譜圖譜。然後,進行一正歸化影像匹配運算,其係由該類比連續之光譜影像圖案取出至少一相應於該測物光位置的子光譜影像圖案,亦即前述之量測類比式連續光譜圖譜。再將該量測類比式連續光譜圖譜與步驟40a所建立資料庫中對應該濾波陣列位置的每一個已知深度所具有的類比式連續光譜圖譜樣本進行正規化互相關值(NCC)演算,再由多個演算值中選取具有最大值的類比式連續光譜圖譜樣本所對應的已知深度,最為對應該濾波陣列所檢測的位置深度。由於具有複數個濾波陣列,每一個濾波陣列對應一個偵測光源,因此透過前述的方式,可以透過單一次的光譜影像圖案擷取,進行物體表面或內部光反射介面全域式的形貌量測掃描,進而完整的重建待測物表面的二維或者是三維形貌。After the continuous spectral map information is established in step 40a, the detection process of steps 41a to 44a is also performed, which is described in FIG. 7 and will not be described herein. Next, in step 45a, an image having a spectral image pattern formed by the light intensity information obtained in step 44a and an analog continuous spectrum corresponding to the different depth positions obtained in step 40a are calculated. In step 45a, the digital discrete spectral image pattern obtained in step 44a and the spectral correction matrix of equation (7) are first calculated to be converted into an analog spectral image pattern. Taking a filter array as an example, in the obtained filter array, after the light intensity information of each filter component is obtained, that is, the sub-spectral image pattern corresponding to the filter array is obtained from the spectral image pattern, and the sub-spectral image pattern is obtained in the sub-spectral image pattern. Each light intensity is calculated by the spectral correction matrix of equation (7), and 16 calculation results are obtained. When the 16 calculation results are added, a quantitative analog spectrum of the corresponding filter array is obtained. Then, a normalized image matching operation is performed, and the at least one sub-spectral image pattern corresponding to the light position of the object, that is, the aforementioned analog analog continuous spectrum map, is taken out from the analog spectral image pattern. The normalized cross-correlation spectrum (NCC) calculus is performed on the analog continuous spectrum map of the measurement and the analog continuum spectral samples of each known depth corresponding to the position of the filter array in the database established in step 40a, and then The known depth corresponding to the analog continuum spectral sample with the largest value is selected from the plurality of calculated values, and most corresponds to the depth of position detected by the filtering array. Since there are a plurality of filter arrays, each filter array corresponds to one detection light source. Therefore, through the foregoing method, a single-time spectral image pattern capture can be performed to perform a full-scale topographic measurement scan of the surface of the object or the internal light reflection interface. And then completely reconstruct the two-dimensional or three-dimensional shape of the surface of the object to be tested.

前述的實施例中的色散物鏡,在一實施例中,可以為一般顯微物鏡配合色散模組以將光色散。該色散模組可以為繞射式光學元件(diffractive optical element, DOE)或色散鏡組。In the foregoing embodiment, the dispersion objective lens may be a general microscope objective with a dispersion module to disperse light. The dispersion module can be a diffractive optical element (DOE) or a dispersive mirror group.

此外,在另一實施例中,如圖15所示,本實施例中,基本上與圖1A相近,差異的是圖1A中的色散物鏡21改為圖15的顯微物鏡21a,以圖1A為例,該色散物鏡21被置換成顯微物鏡,數位調控單元202將寬頻調制光200反射至一分光元件24,再經由顯微物鏡21a將每一寬頻調制光200依放大特定倍率縮放後所形成的偵測光205投射至物件8上,每一偵測光205從該物件8之表面上之一特定位置反射回來形成測物光206,而在顯微物鏡21a的聚焦面(focus plane)成像。每一寬頻調制光200聚焦並投射至一物件8上,運用垂直位移承載台27將物件8做垂直掃描,亦即改變物件8與該顯微物鏡21a之間的距離。垂直掃描的每一個深度位置會獲得物件8表面反射的測物光206,由光感測器22收為光譜影像圖案,因此每一個光譜影像圖案對應一個掃描的深度位置。由於使用一般顯微物鏡21a作為聚焦光線的元件,因此光譜影像圖案依照垂直掃描的位置反應出聚焦與失焦的光譜影像圖案。經由垂直掃描後,得到對應聚焦光譜影像的深度資訊,即可達到量測效果。在一實施例中,得到深度資訊的方式,由光感測器22中感測出的光譜影像與資料庫相比對,或是在另一實施例中,在經過垂直掃描之後所得的複數個光譜影像圖案中,依光強度或其他光譜特徵以辨識出聚焦的光譜影像圖案,藉由該聚焦的光譜影像圖案所對應的深度位置作為相對應該物件上相應該偵測光的深度資訊。In addition, in another embodiment, as shown in FIG. 15, in this embodiment, substantially similar to FIG. 1A, the difference is that the dispersion objective lens 21 in FIG. 1A is changed to the microscope objective lens 21a of FIG. For example, the dispersive objective lens 21 is replaced by a microscopic objective lens, and the digital control unit 202 reflects the broadband modulated light 200 to a beam splitting element 24, and then scales each broadband modulated light 200 by a microscope objective 21a at a specific magnification. The formed detection light 205 is projected onto the object 8, and each of the detection light 205 is reflected from a specific position on the surface of the object 8 to form the object light 206, and the focus plane of the microscope objective 21a. Imaging. Each of the broadband modulated lights 200 is focused and projected onto an object 8, and the object 8 is vertically scanned using a vertical displacement stage 27, i.e., the distance between the object 8 and the microscope objective 21a is varied. Each depth position of the vertical scan obtains the object light 206 reflected by the surface of the object 8, and is received by the photo sensor 22 as a spectral image pattern, so each spectral image pattern corresponds to a scanned depth position. Since the general microscope objective 21a is used as the component for focusing light, the spectral image pattern reflects the spectral image pattern of focus and out of focus in accordance with the position of the vertical scan. After the vertical scanning, the depth information corresponding to the focused spectrum image is obtained, and the measurement effect can be achieved. In one embodiment, the depth information is obtained by comparing the spectral image sensed by the light sensor 22 with the data library, or in another embodiment, after the vertical scanning. In the spectral image pattern, the focused spectral image pattern is identified by the light intensity or other spectral features, and the depth position corresponding to the focused spectral image pattern is used as the depth information corresponding to the detected light on the object.

傳統上,利用顯微物鏡以傳統的影像擷取裝置,例如:CCD或CMOS的攝影機所進行深度掃描所得到的對定各個不同深度的影像,每一張影像對應同一個深度掃描位置僅能得到單一的波長與光強度的聚焦深度曲線,如圖16所示,其係為習用深度掃描所得之聚焦深度所得影像其光譜與光強度關係曲線圖,在圖16中,雖然深度掃描中的聚焦影像具有峰值,但是由於受到雜訊的影像或干擾,曲線上往往會具有雜訊,如區域D所示,這些雜訊將會影響對於峰值的判斷,進而影響判斷聚焦影像或失焦影像的結果。Traditionally, a microscopic objective lens is used to perform depth scanning of a conventional image capturing device, such as a CCD or CMOS camera, to obtain images of different depths, and each image corresponds to the same depth scanning position. The focal depth curve of a single wavelength and light intensity, as shown in FIG. 16 , is a graph showing the relationship between the spectrum and the light intensity of the image obtained by the depth of focus obtained by conventional depth scanning. In FIG. 16 , the focused image in the depth scan is shown in FIG. 16 . It has a peak value, but due to the image or interference of the noise, the curve often has noise. As shown in the area D, these noises will affect the judgment of the peak value, and thus the result of judging the focus image or the out-of-focus image.

反觀,使用本發明之光感測裝置,如圖15的架構,由於濾波模組,其係具有複數個濾波陣列用以接收反射的至少一測物光,每一個濾波陣列具有多個濾波元件,因此當在進行深度掃描時,對每一個偵測位置而言,可以得到對應多個濾波元件的光譜波長與光強度關係的關係曲線,如圖17所示。圖17中,在一特定偵測位置上,具有複數個光譜波長與光強度曲線,每一個曲線對應一濾波元件。由於具有複數個曲線,因此在對於該特定偵測位置的複數張深度掃描的影像中,要預測出哪一張影像是聚焦影像或失焦影像,可以透過如圖17所示的多個曲線構成多樣豐富的資訊,進而可以得到更準確、穩定而且可靠的聚焦或失焦判斷結果。In contrast, using the light sensing device of the present invention, as in the architecture of FIG. 15, the filter module has a plurality of filter arrays for receiving reflected at least one object light, each filter array having a plurality of filter elements, Therefore, when performing the depth scan, for each detected position, a relationship curve between the spectral wavelengths of the plurality of filter elements and the light intensity can be obtained, as shown in FIG. In Fig. 17, at a specific detection position, there are a plurality of spectral wavelengths and light intensity curves, each of which corresponds to a filter element. Since there are a plurality of curves, in the image of the plurality of depth scans for the specific detection position, it is predicted whether the image is a focused image or an out-of-focus image, and can be formed by a plurality of curves as shown in FIG. A variety of rich information, in order to get more accurate, stable and reliable focus or out of focus judgment results.

以上所述,乃僅記載本發明為呈現解決問題所採用的技術手段之較佳實施方式或實施例而已,並非用來限定本發明專利實施之範圍。即凡與本發明專利申請範圍文義相符,或依本發明專利範圍所做的均等變化與修飾,皆為本發明專利範圍所涵蓋。The above description is only intended to describe the preferred embodiments or embodiments of the present invention, which are not intended to limit the scope of the invention. That is, the equivalent changes and modifications made in accordance with the scope of the patent application of the present invention or the scope of the invention are covered by the scope of the invention.

2‧‧‧彩色共焦系統2‧‧‧Color confocal system

20‧‧‧光源模組20‧‧‧Light source module

200‧‧‧寬頻調制光200‧‧‧Broadband modulated light

201‧‧‧光源201‧‧‧Light source

202‧‧‧數位調控單元202‧‧‧Digital Control Unit

203‧‧‧準直鏡組203‧‧‧ collimating mirror

202a、202b、202c‧‧‧光控開關202a, 202b, 202c‧‧‧ light switch

205‧‧‧偵測光205‧‧‧Detecting light

205R、205G、205B‧‧‧偵測光205R, 205G, 205B‧‧‧Detecting light

206‧‧‧測物光206‧‧‧Measure light

21‧‧‧色散物鏡21‧‧‧Dispersive objective

21a‧‧‧顯微物鏡21a‧‧‧Microscope objective

22‧‧‧光感測裝置22‧‧‧Light sensing device

220‧‧‧濾波模組220‧‧‧Filter module

221‧‧‧光感測器221‧‧‧Light sensor

222、222a‧‧‧濾波陣列 222, 222a‧‧‧Filter array

223、223a、223b‧‧‧濾波元件223, 223a, 223b‧‧‧ filter components

224‧‧‧感測陣列224‧‧‧Sensor array

225‧‧‧感測元件225‧‧‧Sensor components

23‧‧‧處理單元23‧‧‧Processing unit

24‧‧‧分光元件24‧‧‧Spectral components

25‧‧‧第一鏡組25‧‧‧ first mirror

26‧‧‧第二鏡組26‧‧‧Second mirror

27‧‧‧承載台27‧‧‧Loading station

4‧‧‧表面形貌偵測方法4‧‧‧ Surface topography detection method

40~46步驟40~46 steps

4a‧‧‧表面形貌偵測方法4a‧‧‧ Surface topography detection method

40a~46a步驟40a~46a steps

50‧‧‧光譜影像圖案50‧‧‧Spectral imagery

511~511n‧‧‧比對樣本資訊511~511n‧‧‧Comparative sample information

7‧‧‧光強度陣列7‧‧‧Light intensity array

70、70a‧‧‧光強度70, 70a‧‧‧ light intensity

8‧‧‧物件8‧‧‧ objects

90‧‧‧光束90‧‧‧ Beam

A‧‧‧偵測位置A‧‧‧Detection location

93a‧‧‧測物光93a‧‧‧Measurement light

93b‧‧‧測物光93b‧‧‧Measurement light

圖1A為本發明之彩色共焦系統架構第一實施例示意圖。 圖1B為本發明之彩色共焦系統架構第二實施例示意圖。 圖1C為本發明之彩色共焦系統架構第三實施例示意圖。 圖1D為為說明夫朗和斐繞射示意圖。 圖2A與2B為數位調控單元控制光線方向示意圖。 圖3A與3B為數位調控單元改變掃描位置示意圖。 圖4A與4B為濾波模組以及濾波陣列示意圖。 圖5係為建立資料庫改變量測深度示意圖。 圖6為本發明之彩色共焦系統另一實施例示意圖。 圖7為本發明之彩色共焦系統所進行的表面形貌偵測方法流程示意圖。 圖8為本發明之光感測裝置進行濾波以及感測光強度示意圖。 圖9A為濾波陣列中的每一個濾波元件所對應的波長示意圖。 圖9B為測物光通過每一濾波陣列的光譜反應曲線示意圖。 圖10為光譜影像圖案中之一子光譜影像圖案和對應的複數個光學比對樣本資訊進行演算關係示意圖。 圖11為正規化互相關值(NCC)與深度關係曲線示意圖。 圖12A為本發明之彩色共焦系統所進行的表面形貌偵測方法流程另一實施例示意圖。 圖12B為本發明建立類比連續光學圖譜之一實施例流程示意圖。 圖13為單一濾波元件對波長範圍400-1000nm所產生的量子效率曲線。 圖14顯示出每一濾波元件所對應的量子效率的貢獻比例分佈曲線。 圖15為本發明之共焦形貌量測系統架構另一實施例示意圖。 圖16為習用深度掃描所得之聚焦深度所得影像其光譜與光強度關係曲線圖。 圖17為本發明之深度掃描所得之聚焦深度所得影像其光譜與光強度關係曲線圖。1A is a schematic view showing a first embodiment of a color confocal system architecture of the present invention. FIG. 1B is a schematic diagram of a second embodiment of a color confocal system architecture of the present invention. 1C is a schematic view of a third embodiment of a color confocal system architecture of the present invention. FIG. 1D is a schematic diagram illustrating the diffraction of Frang and Fiji. 2A and 2B are schematic diagrams showing the direction of light control by a digital control unit. 3A and 3B are schematic diagrams showing changes in scanning position by a digital control unit. 4A and 4B are schematic diagrams of a filter module and a filter array. Figure 5 is a schematic diagram of establishing a database to change the measurement depth. 6 is a schematic view of another embodiment of a color confocal system of the present invention. FIG. 7 is a schematic flow chart of a surface topography detecting method performed by the color confocal system of the present invention. FIG. 8 is a schematic diagram of filtering and sensing light intensity of the light sensing device of the present invention. Figure 9A is a schematic illustration of the wavelengths corresponding to each of the filter elements in the filter array. Figure 9B is a schematic diagram of the spectral response curve of the object light passing through each of the filter arrays. FIG. 10 is a schematic diagram showing the relationship between a sub-spectral image pattern in a spectral image pattern and a corresponding plurality of optical alignment sample information. Figure 11 is a schematic diagram of a normalized cross-correlation value (NCC) versus depth curve. 12A is a schematic diagram of another embodiment of a process for detecting a surface topography performed by a color confocal system according to the present invention. 12B is a schematic flow chart of an embodiment of establishing an analog continuous optical spectrum according to the present invention. Figure 13 is a graph of the quantum efficiency produced by a single filter element over a wavelength range of 400-1000 nm. Figure 14 shows the contribution ratio distribution curve of the quantum efficiency corresponding to each filter element. FIG. 15 is a schematic diagram of another embodiment of a confocal topography measurement system architecture of the present invention. Fig. 16 is a graph showing the relationship between the spectrum and the light intensity of the image obtained by the depth of focus obtained by conventional depth scanning. Fig. 17 is a graph showing the relationship between the spectrum and the light intensity of the image obtained by the depth of focus obtained by the depth scan of the present invention.

Claims (23)

一種共焦形貌量測系統,包括有: 一光源模組,用以提供至少一寬頻調制光; 一顯微物鏡,用以將每一寬頻調制光依放大特定倍率縮放後投射至一物件上,每一寬頻調制光從該物件之表面上之一特定位置反射形成一測物光; 一光感測裝置,用以接收由該物件上該至少一特定位置所反射的至少一測物光,該光感測裝置更具有: 一濾波模組,其係具有複數個濾波陣列用以接收反射的至少一測物光,每一個濾波陣列具有複數個濾波元件,分別允許一特定波長之測物光通過;以及 一光感測器,與該濾波模組相耦接,用以感測通過每一濾波元件的測物光強度而產生相應的一測物光訊號,以得到一光譜影像圖案;一處理單元,將該光譜影像圖案進行一演算,以決定相應每一測物光之特定位置的深度資訊。A confocal topography measuring system includes: a light source module for providing at least one broadband modulated light; and a microscope objective for scaling each broadband modulated light to a specific magnification and projecting onto an object Each broadband modulated light is reflected from a specific position on a surface of the object to form a test object light; a light sensing device for receiving at least one of the object light reflected by the at least one specific position on the object, The light sensing device further has: a filter module having a plurality of filter arrays for receiving the reflected at least one object light, each filter array having a plurality of filter elements respectively allowing a specific wavelength of the object light And a light sensor coupled to the filter module for sensing a measured light intensity of each filter element to generate a corresponding object light signal to obtain a spectral image pattern; The processing unit performs a calculation on the spectral image pattern to determine depth information corresponding to a specific position of each of the object light. 如申請專利範圍第1項所述之共焦形貌量測系統,其中該光源模組更包括有: 一光源,用以產生一寬頻入射光;以及 一數位調控單元,用以將該寬頻入射光調制成該至少一寬頻調制光,而投射至該顯微物鏡。The confocal topography measuring system of claim 1, wherein the light source module further comprises: a light source for generating a broadband incident light; and a digital control unit for injecting the broadband Light is modulated into the at least one broadband modulated light and projected onto the microscope objective. 如申請專利範圍第2項所述之共焦系統,其中該數位調控單元具有複數個光控開關,藉由控制特定位置的至少一光控開關的ON或OFF,以模擬光源投射至針孔所產生的單個或多個針孔光源效果。The confocal system according to claim 2, wherein the digital control unit has a plurality of light control switches, and the analog light source is projected to the pinhole by controlling ON or OFF of at least one light control switch at a specific position. Single or multiple pinhole light source effects produced. 如申請專利範圍第2項所述之共焦系統,其中該光源模組更包括有: 一分光元件,設置在該數位調控單元與該顯微物鏡之間的光路上;以及 一第一鏡組,其係選擇設置在該數位調控單元與該分光元件之間或者是設置在該分光元件與該顯微物鏡之間的光路上。The confocal system of claim 2, wherein the light source module further comprises: a light splitting element disposed on an optical path between the digital control unit and the microscope objective; and a first lens group It is selected to be disposed between the digital control unit and the light splitting element or on an optical path between the light splitting element and the microscope objective. 如申請專利範圍第4項所述之共焦形貌量測系統,其中該光源模組更包括有一第二鏡組,設置在該分光元件與該光感測器之間。The confocal topography measuring system of claim 4, wherein the light source module further comprises a second mirror group disposed between the beam splitting element and the photo sensor. 如申請專利範圍第2項所述之共焦系統,其中該光源模組更包括有: 一分光元件,設置在該光源與該數位調控單元之間; 一第一鏡組,其係設置在該數位調控單元與該顯微物鏡之間的光路上;以及 一第二鏡組,其係設置於該分光元件與該光感測器之間的光路上。The confocal system of claim 2, wherein the light source module further comprises: a light splitting element disposed between the light source and the digital control unit; a first mirror set disposed in the An optical path between the digital control unit and the microscope objective; and a second lens group disposed on the optical path between the light splitting element and the light sensor. 如申請專利範圍第6項所述之共焦形貌量測系統,其中該數位調控單元將該至少一寬頻調制光投射至該顯微物鏡,該測物光通過該顯微物鏡而被該數位調控單元反射至該分光元件,該分光元件將該測物光分光投射至該光感測器。The confocal topography measuring system of claim 6, wherein the digital control unit projects the at least one broadband modulated light onto the microscope objective, and the object light passes through the microscope objective to be digitally The control unit is reflected to the light splitting element, and the light splitting element projects the light of the test object to the light sensor. 如申請專利範圍第1項所述之共焦系統,其中該處理單元於該演算中,於該光譜影像圖案中截取對每一個測物光之位置的一子光譜影像圖案,並與該複數個比對樣本資訊進行運算,使得每一子光譜影像圖案產生相對於該複數個比對樣本資訊之複數個正規化互相關值,該處理單元以最大的正規化互相關值所對應的比對樣本資訊所對應的已知深度,作為相應該子光譜影像圖案之測物光所對應之特定位置的深度資訊。The confocal system of claim 1, wherein the processing unit intercepts, in the calculation, a sub-spectral image pattern of the position of each of the object light in the spectral image pattern, and the plurality of Performing operations on the sample information such that each sub-spectral image pattern generates a plurality of normalized cross-correlation values relative to the plurality of comparison sample information, the processing unit aligning the samples corresponding to the largest normalized cross-correlation values The known depth corresponding to the information is the depth information of the specific position corresponding to the object light corresponding to the sub-spectral image pattern. 如申請專利範圍第1項所述之共焦形貌量測系統,其中該濾波模組為Fabry–Pérot濾波器,其中每一個濾波元件具有不同的厚度。The confocal topography measurement system of claim 1, wherein the filter module is a Fabry-Pérot filter, wherein each filter element has a different thickness. 如申請專利範圍第9項所述之共焦形貌量測系統,其中該濾波模組以及該光感測器感整合成一光學感測裝置。The confocal topography measurement system of claim 9, wherein the filter module and the photosensor are integrated into an optical sensing device. 如申請專利範圍第1項所述之共焦形貌量測系統,其中該比對樣本資訊為一數位離散光學圖譜或一類比連續光學圖譜,該光譜影像圖案為一數位離散之光譜影像圖案或一類比連續之光譜影像圖案。The confocal topography measurement system of claim 1, wherein the comparison sample information is a digital discrete optical spectrum or an analog continuous optical spectrum, wherein the spectral image pattern is a digital discrete spectral image pattern or A class of continuous spectral image patterns. 如申請專利範圍第1項所述之共焦形貌量測系統,其係更進一步進行一垂直掃描,該光譜影像圖案為經由垂直掃描後,對應不同垂直深度之光譜影像圖案,每一對應不同深度之光譜影像圖案具有一光強度。For example, the confocal topography measurement system described in claim 1 further performs a vertical scan, wherein the spectral image pattern is a spectral image pattern corresponding to different vertical depths after vertical scanning, each correspondingly different. The depth spectral image pattern has a light intensity. 如申請專利範圍第1至11項任何一項所述之共焦形貌量測系統,其中該顯微物鏡為一色散物鏡或該顯微物鏡更具有一色散模組,用以將每一寬頻調制光色散,每一寬頻調制光形成具有不同連續聚焦深度的多個偵測光而投射至該物件上,每一個偵測光對應一波長,每一寬頻調制光從該物件之表面上之特定位置反射形成該測物光。The confocal topography measuring system according to any one of claims 1 to 11, wherein the microscopic objective lens is a dispersive objective lens or the microscopic objective lens further has a dispersion module for each broadband Modulating the light dispersion, each broadband modulated light forming a plurality of detected lights having different continuous depths of focus and projecting onto the object, each detected light corresponding to a wavelength, each broadband modulated light being specific from the surface of the object The positional reflection forms the object light. 如申請專利範圍第13或項所述之共焦形貌量測系統,其係更具有一資料庫,具有複數個比對樣本資訊,每一比對樣本資訊對應一已知深度,該處理單元,將該光譜影像圖案與該複數個比對樣本資訊進行一演算,以決定相應每一測物光之特定位置的深度資訊。The confocal topography measurement system of claim 13 or claim further has a database having a plurality of comparison sample information, each comparison sample information corresponding to a known depth, the processing unit And performing the calculation on the spectral image pattern and the plurality of comparison sample information to determine depth information corresponding to a specific position of each of the object light. 如申請專利範圍第13項所述之共焦形貌量測系統,其中該色散物鏡係為遠心鏡頭(telecentric lens)架構的色散物鏡。The confocal topography measurement system of claim 13, wherein the dispersive objective lens is a dispersive objective lens of a telecentric lens architecture. 一種共焦形貌偵測方法,其係包括有下列步驟: 提供一共焦形貌量測系統,其係具有一光源、一顯微物鏡、具有複數個濾波陣列之一濾波模組、一光感測器以及一處理單元; 以該光源產生之一光束投射至一數位調控單元而產生至少一寬頻調制光; 以該顯微物鏡將每一寬頻調制光依放大特定倍率縮放後投射至一物件上,每一寬頻調制光從該物件之表面上之一特定位置反射形成一測物光; 以該濾波模組,接收反射的至少一測物光,並對該至少一測物光進行濾光,其中,每一個濾波陣列具有複數個濾波元件分別允許一特定波長之測物光通過; 以該光感測器感測該至少一測物光以產生一光譜影像圖案; 以及 以該處理單元將該光譜影像圖案進行演算,以決定對應每一測物光之特定位置的深度資訊。A confocal topography detecting method includes the following steps: providing a confocal topography measuring system having a light source, a microscope objective, a filter module having a plurality of filter arrays, and a light perception a detector and a processing unit; generating a light beam from the light source to a digital control unit to generate at least one broadband modulated light; and using the microscope objective to scale each broadband modulated light to a specific magnification and project it onto an object Each broadband modulated light is reflected from a specific position on a surface of the object to form a test object light; the filter module receives at least one of the reflected object light, and filters the at least one object light. Wherein each filter array has a plurality of filter elements respectively allowing a certain wavelength of the object light to pass; the at least one object light is sensed by the light sensor to generate a spectral image pattern; and the processing unit The spectral image pattern is calculated to determine depth information corresponding to a particular location of each of the object lights. 如申請專利範圍第16項所述之共焦表面形貌偵測方法,其係更具有一資料庫,具有複數個比對樣本資訊,每一比對樣本資訊對應一已知深度,該處理單元,將該光譜影像圖案與該複數個比對樣本資訊進行一演算,以決定相應每一測物光之特定位置的深度資訊。The method for detecting a confocal surface topography according to claim 16 of the patent application has a database having a plurality of comparison sample information, each comparison sample information corresponding to a known depth, the processing unit And performing the calculation on the spectral image pattern and the plurality of comparison sample information to determine depth information corresponding to a specific position of each of the object light. 如申請專利範圍第17項所述之共焦形貌偵測方法,其中該特定位置為該物件之表面、內部或底面的位置,而決定每一特定位置之深度資訊更包括有下列步驟: 進行一正歸化影像匹配運算,其係由該光譜影像圖案取出至少一相應於該測物光位置的子光譜影像圖案,將每一子光譜影像圖案和資料庫中之複數個比對樣本資訊進行運算,以產生複數個關於比對樣本資訊之互相關值;以及 以該複數個互相關值中最大值所對應的比對樣本資訊所對應的已知深度作為對應該子光譜影像圖案之特定位置的深度資訊。The confocal topography detecting method according to claim 17, wherein the specific position is a position of a surface, an inner surface or a bottom surface of the object, and determining depth information of each specific position further comprises the following steps: A normalized image matching operation is performed by extracting at least one sub-spectral image pattern corresponding to the light position of the object from the spectral image pattern, and performing a plurality of comparison sample information in each sub-spectral image pattern and the database. Computing to generate a plurality of cross-correlation values for comparing sample information; and using a known depth corresponding to the comparison sample information corresponding to the maximum value of the plurality of cross-correlation values as a specific position corresponding to the sub-spectral image pattern Depth information. 如申請專利範圍第17項所述之共焦形貌偵測方法,其係更包括有對每一濾波陣列建立一光譜校正矩陣之步驟,並將該光譜校正矩陣與每一比對樣本資訊,進行一轉換演算以將每一比對樣本資訊轉換成一類比連續之比對樣本資訊的步驟。The confocal topography detecting method according to claim 17, further comprising the step of establishing a spectral correction matrix for each filter array, and comparing the spectral correction matrix with each of the sample information. A conversion calculus is performed to convert each of the aligned sample information into an analogous sequence of sequential comparisons of sample information. 如申請專利範圍第19項所述之共焦形貌偵測方法,其中該光譜影像圖案為一數位離散之光譜影像圖案,該共焦形貌偵測方法更包括有將每一數位離散之光譜影像圖案與該光譜校正矩陣進行演算,以轉成一類比連續之光譜影像圖案的步驟。The confocal topography detecting method according to claim 19, wherein the spectral image pattern is a digital discrete spectral image pattern, and the confocal topography detecting method further comprises a discrete spectrum for each digit. The image pattern is calculated with the spectral correction matrix to be converted into an analogous sequence of spectral image patterns. 如申請專利範圍第20項所述之共焦表面形貌偵測方法,其中該特定位置為該物件之表面、內部或底面的位置,而決定每一特定位置之深度資訊更包括有下列步驟: 進行一正歸化影像匹配運算,其係由該類比連續之光譜影像圖案取出至少一相應於該測物光位置的子光譜影像圖案,將每一子光譜影像圖案和資料庫中之複數個類比連續之比對樣本資訊進行運算,以產生複數個關於類比連續之比對樣本資訊之互相關值;以及 以該複數個互相關值中最大值所對應的類比連續之比對樣本資訊所對應的已知深度作為對應該子光譜影像圖案之特定位置的深度資訊。The confocal surface topography detecting method according to claim 20, wherein the specific position is a position of a surface, an inner surface or a bottom surface of the object, and determining the depth information of each specific position further comprises the following steps: Performing a normalized image matching operation by extracting at least one sub-spectral image pattern corresponding to the light position of the object from the continuous spectral image pattern, and comparing each of the sub-spectral image patterns and the plurality of analogs in the database The continuous ratio is calculated on the sample information to generate a plurality of cross-correlation values for the sample information of the continuous analog ratio; and the ratio of the ratios of the maximum values of the plurality of cross-correlation values to the sample information Depth is known as depth information corresponding to a particular location of the sub-spectral image pattern. 如申請專利範圍第16項所述之共焦表面形貌偵測方法,其係更更包括有進行一垂直掃描之步驟,該垂直掃描係為使該物件與該顯微物鏡之間的距離改變,以取得對應不同垂直深度之光譜影像圖案,每一對應不同深度之光譜影像圖案具有一光強度。The method for detecting a confocal surface topography according to claim 16, further comprising the step of performing a vertical scan for changing a distance between the object and the microscope objective. To obtain spectral image patterns corresponding to different vertical depths, each of the spectral image patterns corresponding to different depths has a light intensity. 如申請專利範圍第16至22所述之任何一項共焦表面形貌偵測方法,其中該顯微物鏡為一色散物鏡或該顯微物鏡更具有一色散模組,用以將每一寬頻調制光色散,每一寬頻調制光形成具有不同連續聚焦深度的多個偵測光而投射至該物件上,每一個偵測光對應一波長,每一寬頻調制光從該物件之表面上之特定位置反射形成該測物光。A method for detecting a confocal surface topography according to any one of claims 16 to 22, wherein the microscope objective is a dispersion objective or the microscope objective has a dispersion module for each broadband Modulating the light dispersion, each broadband modulated light forming a plurality of detected lights having different continuous depths of focus and projecting onto the object, each detected light corresponding to a wavelength, each broadband modulated light being specific from the surface of the object The positional reflection forms the object light.
TW106145927A 2017-12-27 2017-12-27 Spectral-image correlation-based confocal profilometric system and method TWI653440B (en)

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TWI783896B (en) * 2022-04-08 2022-11-11 國立清華大學 Three-dimensional image reconstruction method and system for light element thin films
TWI793609B (en) * 2021-05-20 2023-02-21 盛翊興有限公司 Spectrum integration calibration method and multi-spectrum spectrometer

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* Cited by examiner, † Cited by third party
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TWI465683B (en) 2013-08-20 2014-12-21 Univ Nat Taiwan Differential filtering chromatic confocal microscopic system
CN106092891A (en) 2016-08-11 2016-11-09 广东工业大学 A kind of confocal three-dimensional spectrum micro imaging method and device

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TWI793609B (en) * 2021-05-20 2023-02-21 盛翊興有限公司 Spectrum integration calibration method and multi-spectrum spectrometer
TWI783896B (en) * 2022-04-08 2022-11-11 國立清華大學 Three-dimensional image reconstruction method and system for light element thin films

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