TW201927884A - Substrate composition and substrate prepared therefrom - Google Patents

Substrate composition and substrate prepared therefrom Download PDF

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TW201927884A
TW201927884A TW107121300A TW107121300A TW201927884A TW 201927884 A TW201927884 A TW 201927884A TW 107121300 A TW107121300 A TW 107121300A TW 107121300 A TW107121300 A TW 107121300A TW 201927884 A TW201927884 A TW 201927884A
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substrate
substrate composition
compound
weight
parts
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TW107121300A
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TWI695033B (en
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黃仕穎
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財團法人工業技術研究院
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Priority to US16/116,706 priority patent/US10640637B2/en
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Abstract

A substrate composition and a substrate prepared from the substrate composition are provided. The substrate composition includes 25-80 parts by weight of a polymer, 20-75 parts by weight of an inorganic filler, and 0.015-0.7 parts by weight of a compound. The total weight of the polymer and the inorganic filler are 100 parts by weight. The polymer is selected from a group consisting of polytetrafluoroethylene (PTFE) and perfluoroalkoxy alkane (PFA). The compound has at least three terminal vinyl groups.

Description

基板組成物及由其所製備之基板 Substrate composition and substrate prepared therefrom

本揭露關於一種基板組成物、及由該基板組成物所製備之基板。 The present disclosure relates to a substrate composition and a substrate prepared from the substrate composition.

新世紀之電子產品趨向輕、薄、短、小,且以高頻傳輸,使得印刷電路板之配線必須高密度化,來提升傳輸速度,同時保持訊號完整性。電子產品採用了多層化的半導體元件與精密的封裝技術,藉由進步的接合安裝技術達到多層電路板的高密度化。 In the new century, electronic products tend to be light, thin, short, and small, and are transmitted at high frequencies, so that the wiring of printed circuit boards must be high-density to increase the transmission speed while maintaining signal integrity. The electronic products use multi-layered semiconductor components and precision packaging technology to achieve high density of multilayer boards by advanced bonding and mounting technology.

在電子構件領域中,對能高頻率的通訊器材已有急迫的需求,因此最近已需要相關的電子構件材料,諸如具有低介電常數的半導體密封材料及具有低介電損失因子之材料,以能夠快速傳送資料,並且不會在傳送的過程造成資料的損失或被干擾。 In the field of electronic components, there is an urgent need for high-frequency communication equipment. Therefore, related electronic component materials such as semiconductor sealing materials having a low dielectric constant and materials having a low dielectric loss factor have recently been required to The ability to transfer data quickly and without the loss or interference of data during the transfer process.

聚四氟乙烯(PTFE)由於其較低的介電常數及介電損失因子,已普遍使用作為高頻基板材料。然而,聚四氟乙烯(PTFE)其材料本身剛性不足,除了較不易進行後續加工外,所得之基板的機械強度也較差。 Polytetrafluoroethylene (PTFE) has been commonly used as a high-frequency substrate material due to its low dielectric constant and dielectric loss factor. However, polytetrafluoroethylene (PTFE) is inherently insufficient in rigidity, and in addition to being less susceptible to subsequent processing, the resulting substrate is also less mechanically strong.

基於上述,業界需要一種具有低介電常數、低損失因子、耐熱性佳及高機械強度的基板材料,以解決先前技術所遭遇到的問題。 Based on the above, there is a need in the industry for a substrate material having a low dielectric constant, a low loss factor, good heat resistance, and high mechanical strength to solve the problems encountered in the prior art.

根據本揭露實施例,本揭露提供一種基板組成物,該基板組成物可包含25-80重量份之聚合物,其中該聚合物可擇自由聚四氟乙烯(polytetrafluoroethylene、PTFE)及全氟烷氧基烷烴(perfluoroalkoxy alkane、PFA)所組成之族群;20-75重量份之無機填充劑,其中該聚合物及該無機填充劑的總合可為100重量份;以及,0.015-0.7重量份之化合物,其中該化合物係可具有至少三個末端烯基(terminal vinyl group)。 According to an embodiment of the present disclosure, the present disclosure provides a substrate composition, which may comprise 25-80 parts by weight of a polymer, wherein the polymer may be selected from polytetrafluoroethylene (PTFE) and perfluoroalkoxy. a group consisting of perfluoroalkoxy alkane (PFA); 20-75 parts by weight of an inorganic filler, wherein the total of the polymer and the inorganic filler may be 100 parts by weight; and, 0.015-0.7 parts by weight of the compound Wherein the compound may have at least three terminal vinyl groups.

根據本揭露實施例,本揭露亦提供一種基板。該基板包含一膜層,其中該膜層係本揭露上述基板組成物所形成之固化物。 According to an embodiment of the disclosure, the present disclosure also provides a substrate. The substrate comprises a film layer, wherein the film layer is a cured product formed by the above substrate composition.

100‧‧‧基板 100‧‧‧Substrate

110‧‧‧膜層 110‧‧‧ film layer

120‧‧‧第一金屬箔 120‧‧‧First metal foil

130‧‧‧第二金屬箔 130‧‧‧Second metal foil

第1圖係本揭露一實施例所述基板之示意圖。 1 is a schematic view of a substrate according to an embodiment of the present invention.

第2圖係本揭露另一實施例所述基板之示意圖。 Figure 2 is a schematic view of a substrate according to another embodiment of the present invention.

本揭露實施例提供一種基板組成物及由該基板組成物所製備之基板。本揭露所述之基板組成物同時包含特定的聚合物、無機填充物及具有至少三個末端烯基的化合物,且上 述成份以一特定比例構成該基板組成物。藉由該具有至少三個末端烯基的化合物的添加,可在不影響介電特性(例如介電常數及損耗因子)的前提下,提昇該基板組成物的可加工性,並增加由該基板組成物所製備而得之基板的機械強度。 The disclosed embodiments provide a substrate composition and a substrate prepared from the substrate composition. The substrate composition of the present disclosure includes a specific polymer, an inorganic filler, and a compound having at least three terminal alkenyl groups, and The composition constitutes the substrate composition in a specific ratio. By adding the compound having at least three terminal alkenyl groups, the processability of the substrate composition can be improved without increasing the dielectric properties (for example, dielectric constant and loss factor), and the substrate can be increased by the substrate. The mechanical strength of the substrate prepared from the composition.

根據本揭露實施例,本揭露提供一種基板組成物,該基板組成物可包含25-80重量份(例如30-75重量份、或35-70重量份)之聚合物;20-75重量份(例如25-70重量份、或30-65重量份)之無機填充劑,其中該聚合物及該無機填充劑的總合可為100重量份;以及,0.015-0.7重量份的化合物,其中該化合物係可具有至少三個末端烯基(terminal vinyl group)。 According to an embodiment of the present disclosure, the present disclosure provides a substrate composition which may comprise 25-80 parts by weight (for example, 30-75 parts by weight, or 35-70 parts by weight) of a polymer; 20-75 parts by weight ( For example, 25 to 70 parts by weight, or 30 to 65 parts by weight, of the inorganic filler, wherein the total of the polymer and the inorganic filler may be 100 parts by weight; and, 0.015 to 0.7 parts by weight of the compound, wherein the compound It may have at least three terminal vinyl groups.

根據本揭露實施例,該聚合物可擇自由聚四氟乙烯(polytetrafluoroethylene、PTFE)及全氟烷氧基烷烴(perfluoroalkoxy alkane、PFA)所組成之族群。此外,該聚合物之數目平均分子量(number average molecular weight)可為約數十萬至數百萬。 According to an embodiment of the present disclosure, the polymer may be selected from the group consisting of polytetrafluoroethylene (PTFE) and perfluoroalkoxy alkane (PFA). Further, the number average molecular weight of the polymer may range from about several hundred thousand to several millions.

根據本揭露實施例,該無機填充劑可例如為二氧化矽、氧化鋁、氧化鎂、碳酸鈣、碳化矽、碳酸鈉、二氧化鈦、氧化鋅、氧化鋯、石墨、碳酸鎂、硫酸鋇、或上述之組合。該無機填充劑之平均粒徑可為約500nm至3000nm。 According to an embodiment of the present disclosure, the inorganic filler may be, for example, ceria, alumina, magnesia, calcium carbonate, barium carbide, sodium carbonate, titanium dioxide, zinc oxide, zirconium oxide, graphite, magnesium carbonate, barium sulfate, or the like. The combination. The inorganic filler may have an average particle diameter of about 500 nm to 3000 nm.

根據本揭露實施例,該具有至少三個末端烯基之化合物的添加量對於本揭露所述基板組成物(以及由該基板組成物所製備而得之基板)的性質具有很大的影響。根據本揭露 實施例,該具有至少三個末端烯基之化合物的添加量係被控制在0.015-0.7重量份的範圍內(例如0.018-0.65重量份、0.018-0.6重量份、或0.015-0.6重量份)。若具有至少三個末端烯基之化合物的添加量過低或過高,則無法提昇基板組成物的加工性以及所得基板的機械強度。此外,若具有至少三個末端烯基之化合物的添加量超過0.7重量份,易造成所得之基板組成物介電常數及損耗因子增加。 According to an embodiment of the present disclosure, the addition amount of the compound having at least three terminal alkenyl groups has a great influence on the properties of the substrate composition (and the substrate prepared from the substrate composition) of the present disclosure. According to the disclosure In the embodiment, the amount of the compound having at least three terminal alkenyl groups is controlled in the range of 0.015 to 0.7 parts by weight (for example, 0.018 to 0.65 parts by weight, 0.018 to 0.6 parts by weight, or 0.015 to 0.6 parts by weight). If the amount of the compound having at least three terminal alkenyl groups is too low or too high, the processability of the substrate composition and the mechanical strength of the obtained substrate cannot be improved. Further, if the compound having at least three terminal alkenyl groups is added in an amount exceeding 0.7 part by weight, the dielectric constant and the loss factor of the obtained substrate composition are likely to increase.

根據本揭露實施例,該具有至少三個末端烯基之化合物可包含三烯丙基異氰脲酸酯(triallyl isocyanurate、TAIC)、三甲基烯丙基異氰脲酸酯(trimethallyl isocyanurate、TMAIC)、三聚氰酸三烯丙酯(triallyl cyanurate、TAC)、四乙烯基四甲基環四矽氧烷(tetravinyltetramethylcyclotetrasiloxane)、八乙烯基八聚倍半硅氧烷(octavinyl octasilsesquioxane)、或上述之組合。此外,根據本揭露實施例,該具有至少三個末端烯基之化合物可擇自由三烯丙基異氰脲酸酯(triallyl isocyanurate、TAIC)、三甲基烯丙基異氰脲酸酯(trimethallyl isocyanurate、TMAIC)、三聚氰酸三烯丙酯(triallyl cyanurate、TAC)、四乙烯基四甲基環四矽氧烷(tetravinyltetramethylcyclotetrasiloxane)及八乙烯基八聚倍半硅氧烷(octavinyl octasilsesquioxane)所組成之族群。 According to an embodiment of the present disclosure, the compound having at least three terminal alkenyl groups may comprise triallyl isocyanurate (TAIC), trimethallyl isocyanurate (TMAIC). ), triallyl cyanurate (TAC), tetravinyltetramethylcyclotetrasiloxane, octavinyl octasilesquioxane, or the like combination. Furthermore, according to an embodiment of the present disclosure, the compound having at least three terminal alkenyl groups may be selected from triallyl isocyanurate (TAIC), trimethallyl isocyanurate (trimethallyl). Isocyanurate, TMAIC), triallyl cyanurate (TAC), tetravinyltetramethylcyclotetrasiloxane and octavinyl octasilsesquioxane The group of people.

根據本揭露實施例,本揭露所述之基板組成物可更包含0.01-10重量份添加劑,其中該添加劑可為起始劑、平坦 劑、色料、消泡劑、耐燃劑、或上述之組合。 According to an embodiment of the present disclosure, the substrate composition of the present disclosure may further comprise 0.01-10 parts by weight of an additive, wherein the additive may be an initiator, flat Agent, colorant, antifoaming agent, flame retardant, or a combination thereof.

根據本揭露實施例,本揭露所述之基板組成物可更包含一溶劑,以使上述聚合物、無機填充劑、化合物及/或添加劑均勻分散於該溶劑中。該溶劑可例如為甲乙酮、乙酸丙二醇甲酯(PGMEA)、乙基-2-乙氧基乙醇乙酸酯、3-乙氧基丙酸乙酯、乙酸異戊酯、苯、甲苯、二甲苯、環己烷、或上述之組合。 According to an embodiment of the present disclosure, the substrate composition of the present disclosure may further comprise a solvent to uniformly disperse the above polymer, inorganic filler, compound and/or additive in the solvent. The solvent may, for example, be methyl ethyl ketone, methyl propylene glycol (PGMEA), ethyl-2-ethoxyethanol acetate, ethyl 3-ethoxypropionate, isoamyl acetate, benzene, toluene, xylene, Cyclohexane, or a combination of the above.

根據本揭露實施例,該起始劑可為過氧化物起始劑,例如苯甲醯基過氧化物(benzoyl peroxide)、1,1-雙(第三丁基過氧基)環己烷(1,1-bis(tert-butylperoxy)cyclohexane)、2,5-雙(第三丁基過氧基)-2,5-二甲基環己烷(2,5-bis(tert-butylperoxy)-2,5-dimethylcyclohexane)、2,5-雙(第三丁基過氧基)-2,5-二甲基-3-環己炔(2,5-bis(tert-butylperoxy)-2,5-dimethyl-3-cyclohexyne)、雙(1-(第三丁基過氧基)-1-甲基乙基)苯(bis(1-(tert-butylpeorxy)-1-methy-ethyl)benzene)、第三丁基過氧化氫(tert-butyl hydroperoxide)、第三丁基過氧化物(tert-butyl peroxide)、第三丁基過氧基苯甲酸(tert-butyl peroxybenzoate)、茴香基過氧化氫(cumene hydroperoxide)、環己酮基過氧化物(cyclohexanone peroxide)、二茴香基過氧化物(dicumyl peroxide)、月桂基過氧化物(lauroyl peroxide)、或上述之組合。 According to an embodiment of the present disclosure, the initiator may be a peroxide initiator such as benzoyl peroxide, 1,1-bis(t-butylperoxy)cyclohexane ( 1,1-bis(tert-butylperoxy)cyclohexane), 2,5-bis(t-butylperoxy)-2,5-dimethylcyclohexane (2,5-bis(tert-butylperoxy)- 2,5-dimethylcyclohexane), 2,5-bis(t-butylperoxy)-2,5-dimethyl-3-cyclohexyne (2,5-bis(tert-butylperoxy)-2,5 -dimethyl-3-cyclohexyne), bis(1-(tert-butylpeorxy)-1-methy-ethyl)benzene, Tert-butyl hydroperoxide, tert-butyl peroxide, tert-butyl peroxybenzoate, anisyl hydrogen peroxide ( Cumene hydroperoxide), cyclohexanone peroxide, dicumyl peroxide, lauroyl peroxide, or a combination thereof.

根據本揭露實施例,本揭露亦提供一種基板。該 基板包含一膜層,其中該膜層係本揭露所述基板組成物所形成之固化物。根據本揭露實施例,該基板製備方式可包含以下步驟:將上述基板組成物在80至120℃下烘乾(移除溶劑),在以滾輪輾壓製程形成一薄片。接著,將該薄片在150至300℃下烘烤,得到該膜層。根據本揭露實施例,本揭露所述基板100可更包含一第一金屬箔120配置於該膜層110上,請參照第1圖。根據本揭露實施例,該第一金屬箔可為銅箔或鋁箔。 According to an embodiment of the disclosure, the present disclosure also provides a substrate. The The substrate comprises a film layer, wherein the film layer is a cured product formed by the substrate composition. According to an embodiment of the present disclosure, the substrate preparation method may include the steps of: drying the above substrate composition at 80 to 120 ° C (removing the solvent), and forming a sheet by a roll press process. Next, the sheet was baked at 150 to 300 ° C to obtain the film layer. According to an embodiment of the present disclosure, the substrate 100 of the present disclosure may further include a first metal foil 120 disposed on the film layer 110. Please refer to FIG. According to an embodiment of the present disclosure, the first metal foil may be a copper foil or an aluminum foil.

根據本揭露實施例,除了該第一金屬箔120及該膜層110,本揭露所述基板100可更包含一第二金屬箔130。其中,該膜層110係置於該第一金屬箔120及該第二金屬箔130之間,請參照第2圖。根據本揭露實施例,該第二金屬箔可為銅箔或鋁箔。 According to the embodiment of the present disclosure, in addition to the first metal foil 120 and the film layer 110, the substrate 100 may further include a second metal foil 130. The film layer 110 is placed between the first metal foil 120 and the second metal foil 130. Please refer to FIG. 2 . According to an embodiment of the present disclosure, the second metal foil may be a copper foil or an aluminum foil.

根據本揭露實施例,本揭露所述基板具有低介電常數、低損失因子、及高機械強度,可為作印刷電路板、積體電路載板、或高頻基板。 According to the disclosed embodiment, the substrate has a low dielectric constant, a low loss factor, and high mechanical strength, and can be used as a printed circuit board, an integrated circuit carrier, or a high frequency substrate.

為了讓本揭露之上述和其他目的、特徵、和優點能更明顯易懂,下文特舉數實施例及比較實施例,作詳細說明如下: The above and other objects, features and advantages of the present invention will become more apparent and understood.

基板組合物Substrate composition

實施例1: Example 1:

首先,將4克之三甲基烯丙基異氰脲酸酯(trimethallyl isocyanurate、TMAIC)(購自於Hunan Farida Technology Co.,Ltd.)及1.2克之二茴香基過氧化物(dicumyl peroxide)溶於36克之之甲乙酮(methyl ethyl ketone)中,得到一 含三甲基烯丙基異氰脲酸酯溶液(TMAIC溶液)。接著,將27.5克之二氧化矽(平均粒徑為25nm、購自於US Silica)、37.5克之聚四氟乙烯分散液(PTFE dispersion)(購自於杜邦,其中PTFE含量為60%(22.5克))、以及0.1克之上述含三甲基烯丙基異氰脲酸酯溶液(其中三甲基烯丙基異氰脲酸酯含量為0.0097克)進行混合。經過烘乾去除部份溶劑後,得到基板組合物(1)。 First, 4 g of trimethallyl isocyanurate (TMAIC) (purchased from Hunan Farida Technology Co., Ltd.) and 1.2 g of dicumyl peroxide were dissolved. In 36 grams of methyl ethyl ketone, one is obtained A solution containing trimethylallyl isocyanurate (TMAIC solution). Next, 27.5 g of cerium oxide (average particle size 25 nm, available from US Silica), 37.5 g of PTFE dispersion (purchased from DuPont, in which the PTFE content was 60% (22.5 g)) And 0.1 g of the above-mentioned solution containing trimethylallyl isocyanurate (wherein the content of trimethylallyl isocyanurate was 0.0097 g) was mixed. After drying to remove a part of the solvent, the substrate composition (1) was obtained.

實施例2: Example 2:

依實施例1所述基板組合物(1)的製備方式進行,除了將含三甲基烯丙基異氰脲酸酯溶液由0.1克增加至0.25克,得到基板組合物(2)。 The substrate composition (1) was prepared in the same manner as in Example 1, except that the solution containing trimethylallyl isocyanurate was increased from 0.1 g to 0.25 g to obtain a substrate composition (2).

實施例3: Example 3:

依實施例1所述基板組合物(1)的製備方式進行,除了將含三甲基烯丙基異氰脲酸酯溶液由0.1克增加至0.5克,得到基板組合物(3)。 The substrate composition (1) was prepared in the same manner as in Example 1, except that the solution containing the trimethylallyl isocyanurate was increased from 0.1 g to 0.5 g to obtain a substrate composition (3).

實施例4: Example 4:

依實施例1所述基板組合物(1)的製備方式進行,除了將含三甲基烯丙基異氰脲酸酯溶液由0.1克增加至1克,得到基板組合物(4)。 The substrate composition (1) was prepared in the same manner as in Example 1, except that the solution containing the trimethylallyl isocyanurate was increased from 0.1 g to 1 g to obtain a substrate composition (4).

實施例5: Example 5:

依實施例1所述基板組合物(1)的製備方式進行,除了將含三甲基烯丙基異氰脲酸酯溶液由0.1克增加至3克,得到基板組合物(5)。 This was carried out in the manner of preparation of the substrate composition (1) described in Example 1, except that the solution containing trimethylallyl isocyanurate was increased from 0.1 g to 3 g to obtain a substrate composition (5).

比較例1: Comparative Example 1:

依實施例1所述基板組合物(1)的製備方式進行,除了不添加三甲基烯丙基異氰脲酸酯溶液,得到基板組合物(6)。 The substrate composition (1) was prepared in the same manner as in Example 1, except that the trimethylallyl isocyanurate solution was not added, and the substrate composition (6) was obtained.

比較例2: Comparative Example 2:

依實施例1所述基板組合物(1)的製備方式進行,除了將含三甲基烯丙基異氰脲酸酯溶液由0.1克增加至5克,得到基板組合物(7)。 The substrate composition (1) was prepared in the same manner as in Example 1, except that the solution containing trimethylallyl isocyanurate was increased from 0.1 g to 5 g to obtain a substrate composition (7).

實施例6: Example 6

首先,將4克之四乙烯基四甲基環四矽氧烷(tetravinyltetramethylcyclotetrasiloxane)(購自於公隆化學代理進口Gelest Inc.)及1.2克之二茴香基過氧化物(dicumyl peroxide)溶於36克之甲乙酮(methyl ethyl ketone)中,得到一含四乙烯基四甲基環四矽氧烷溶液。接著,將27.5克之二氧化矽(平均粒徑為25μm、購自於US Silica)、37.5克之聚四氟乙烯分散液(PTFE dispersion)(購自於杜邦,其中PTFE含量為60%(22.5克))、以及1克之上述四乙烯基四甲基環四矽氧烷溶液(其中四乙烯基四甲基環四矽氧烷含量為0.097克)進行混合。經過烘乾去除部份溶劑後,得到基板組合物(8)。 First, 4 g of tetravinyltetramethylcyclotetrasiloxane (available from Gonglong Chemical Co., Ltd. imported Gelest Inc.) and 1.2 g of dicumyl peroxide were dissolved in 36 g of methyl ethyl ketone ( In methyl ethyl ketone), a solution containing tetravinyltetramethylcyclotetraoxane was obtained. Next, 27.5 g of cerium oxide (average particle size 25 μm, purchased from US Silica), 37.5 g of PTFE dispersion (purchased from DuPont, in which the PTFE content was 60% (22.5 g)) And 1 g of the above tetravinyltetramethylcyclotetraoxane solution (in which the tetravinyltetramethylcyclotetraoxane content was 0.097 g) was mixed. After a part of the solvent was removed by drying, a substrate composition (8) was obtained.

實施例7: Example 7

首先,將4克之八乙烯基八聚倍半硅氧烷(octavinyl octasilsesquioxane)(購自於Gelest Inc.)及1.2克之二茴香基過氧化物(dicumyl peroxide)溶於36克之之甲乙酮(methyl ethyl ketone)中,得到一含八乙烯基八聚倍半硅氧烷溶液。接著,將 27.5克之二氧化矽(平均粒徑為25μm、購自於US Silica)、37.5克之聚四氟乙烯分散液(PTFE dispersion)(購自於杜邦,其中PTFE含量為60%(22.5克))、以及1克之上述八乙烯基八聚倍半硅氧烷溶液(其中八乙烯基八聚倍半硅氧烷含量為0.097克)進行混合。經過烘乾去除部份溶劑後,得到基板組合物(9)。 First, 4 grams of octavinyl octasilesquioxane (available from Gelest Inc.) and 1.2 grams of dicumyl peroxide were dissolved in 36 grams of methyl ethyl ketone. In the case, a solution containing octavinyl octaquid silsesquioxane is obtained. Next, will 27.5 g of cerium oxide (average particle size 25 μm, available from US Silica), 37.5 g of PTFE dispersion (purchased from DuPont with a PTFE content of 60% (22.5 g)), and One gram of the above octavinyl octaquid silsesquioxane solution in which the octavinyl octaquid silsesquioxane content was 0.097 g was mixed. After a part of the solvent was removed by drying, a substrate composition (9) was obtained.

基板的製備及性質量測Substrate preparation and quality measurement

實施例8 Example 8

分別將實施例1-5及比較例1-2所述基板組合物在120℃下烘烤以去除溶劑。接著,將烘烤後的產物使用滾輪輾壓形成一薄片。接著,將該薄片在150至300℃下烘烤固化,形成一膜層(1)-(7)(厚度約為300μm)。最後,將所得膜層(1)-(7)分別與銅箔(購自於福田,厚度為18μm)壓合後,得到基板(1)-(7)。 The substrate compositions described in Examples 1-5 and Comparative Examples 1-2 were each baked at 120 ° C to remove the solvent. Next, the baked product is rolled using a roller to form a sheet. Next, the sheet was baked and cured at 150 to 300 ° C to form a film layer (1) to (7) (having a thickness of about 300 μm). Finally, the obtained film layers (1) to (7) were respectively pressed together with a copper foil (purchased from Fukuda and having a thickness of 18 μm) to obtain substrates (1) to (7).

接著,將銅箔蝕刻移除後,量測膜層(1)-(7)的介電常數(dielectric coefficient、Dk)、介電損失因子(dielectric loss factor、Df)、彈性模數(elastic modulus)、黏性模數(viscosity modulus)、以及複合模數(complex modulus),結果如表1所示。其中,介電常數(dielectric coefficient、Dk)及介電損失因子(dielectric loss factor、Df)係使用微波誘電分析儀(microwave dielectrometer,購自AET公司)於10GHz頻率下量測;而彈性模數(elastic modulus)、黏性模數(viscosity modulus)、以及複合模數(complex modulus)的量測方式係在50℃使用粘度分析仪 參照ASTM D 5992-96進行。 Next, after the copper foil is removed by etching, the dielectric constant (Dk), dielectric loss factor (Df), and elastic modulus (elastic modulus) of the film layers (1)-(7) are measured. ), viscosity modulus, and complex modulus. The results are shown in Table 1. Among them, the dielectric constant (Dk) and the dielectric loss factor (Df) are measured at a frequency of 10 GHz using a microwave dielectrometer (available from AET); and the elastic modulus ( Elastic modulus), viscosity modulus, and complex modulus are measured at 50 ° C using a viscosity analyzer This is carried out in accordance with ASTM D 5992-96.

實施例9 Example 9

將實施例6所述基板組合物在120℃下烘烤以去除溶劑。接著,將烘烤後的產物使用滾輪輾壓形成一薄片。接著,將該薄片在150至300℃下烘烤固化,形成一膜層(8)(厚度約為300μm)。將所得膜層(8)與銅箔(購自於福田,厚度為18μm)壓合後,得到基板(8)。接著,將銅箔蝕刻移除後,量測膜層(8)的介電常數(dielectric coefficient、Dk)、介電損失因子(dielectric loss factor、Df)、彈性模數(elastic modulus)、黏性模數(viscosity modulus)、以及複合模數(complex modulus),結 果如表2所示。 The substrate composition described in Example 6 was baked at 120 ° C to remove the solvent. Next, the baked product is rolled using a roller to form a sheet. Next, the sheet was baked and cured at 150 to 300 ° C to form a film layer (8) (having a thickness of about 300 μm). The obtained film layer (8) and a copper foil (purchased from Fukuda, thickness: 18 μm) were pressed together to obtain a substrate (8). Next, after the copper foil is removed by etching, the dielectric constant (Dk), the dielectric loss factor (Df), the elastic modulus, and the viscosity of the film layer (8) are measured. Modulus modulus, and complex modulus, knot As shown in Table 2.

由表1-2可得知,由於實施例1-6所述基板組成物添加了約0.0194重量份至0.582重量份的具有至少三個末端烯基化合物(例如三甲基烯丙基異氰脲酸酯(TMAIC)、或四乙烯基四甲基環四矽氧烷)(相對於100重量份的無機填充劑及聚合物),因此以本揭露所述基板組成物所形成的膜層,除了仍具有低介電常數及低介電損失因子外,其彈性模數、黏性模數、以及複合模數與比較例1(不添加具有至少三個末端烯基化合物)所述膜層相比亦大幅提昇。此外,當添加過量三甲基烯丙基異氰脲酸酯時(即比較例2),其所得膜層的楊氏模數反而較比較例1(不添加三甲基烯丙基異氰脲酸酯)所述膜層來得低。 As can be seen from Table 1-2, since the substrate composition described in Examples 1-6 is added with about 0.0194 parts by weight to 0.582 parts by weight of at least three terminal alkenyl compounds (for example, trimethylallyl isocyanuramide) An acid ester (TMAIC), or tetravinyltetramethylcyclotetraoxane) (relative to 100 parts by weight of an inorganic filler and a polymer), thus forming a film layer formed by the substrate composition of the present invention In addition to the low dielectric constant and low dielectric loss factor, the elastic modulus, viscous modulus, and composite modulus are comparable to those of Comparative Example 1 (without addition of at least three terminal alkenyl compounds). It has also been greatly improved. Further, when an excessive amount of trimethylallyl isocyanurate was added (i.e., Comparative Example 2), the Young's modulus of the obtained film layer was lower than that of Comparative Example 1 (no added trimethylallyl isocyanurate) The ester layer is low in the film layer.

雖然本揭露已以數個實施例揭露如上,然其並非用以限定本揭露,任何本技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作任意之更動與潤飾,因此本揭露之保護範圍當視後附之申請專利範圍所界定者為準。 The present disclosure has been disclosed in the above several embodiments, but it is not intended to limit the disclosure, and any one skilled in the art can make any changes and refinements without departing from the spirit and scope of the disclosure. Therefore, the scope of protection of this disclosure is subject to the definition of the scope of the patent application.

Claims (13)

一種基板組成物,包含:25-80重量份之聚合物,其中該聚合物係擇自由聚四氟乙烯(polytetrafluoroethylene、PTFE)及全氟烷氧基烷烴(perfluoroalkoxy alkane、PFA)所組成之族群;20-75重量份之無機填充劑,其中該聚合物及該無機填充劑的總合為100重量份;以及0.015-0.7重量份之化合物,其中該化合物係具有至少三個末端烯基(terminal vinyl group)。 A substrate composition comprising: 25-80 parts by weight of a polymer, wherein the polymer is selected from the group consisting of polytetrafluoroethylene (PTFE) and perfluoroalkoxy alkane (PFA); 20 to 75 parts by weight of the inorganic filler, wherein the total of the polymer and the inorganic filler is 100 parts by weight; and 0.015 to 0.7 parts by weight of the compound, wherein the compound has at least three terminal alkenyl groups (terminal vinyl Group). 如申請專利範圍第1項所述之基板組成物,其中該無機填充劑係二氧化矽、氧化鋁、氧化鎂、碳酸鈣、碳化矽、碳酸鈉、二氧化鈦、氧化鋅、氧化鋯、石墨、碳酸鎂、硫酸鋇、或上述之組合。 The substrate composition according to claim 1, wherein the inorganic filler is cerium oxide, aluminum oxide, magnesium oxide, calcium carbonate, cerium carbide, sodium carbonate, titanium oxide, zinc oxide, zirconium oxide, graphite, carbonic acid. Magnesium, barium sulfate, or a combination of the above. 如申請專利範圍第1項所述之基板組成物,其中該化合物係三烯丙基異氰脲酸酯(triallyl isocyanurate、TAIC)。 The substrate composition according to claim 1, wherein the compound is triallyl isocyanurate (TAIC). 如申請專利範圍第1項所述之基板組成物,其中該化合物係三甲基烯丙基異氰脲酸酯(trimethallyl isocyanurate、TMAIC)。 The substrate composition according to claim 1, wherein the compound is trimethallyl isocyanurate (TMAIC). 如申請專利範圍第1項所述之基板組成物,其中該化合物係三聚氰酸三烯丙酯(triallyl cyanurate、TAC)。 The substrate composition according to claim 1, wherein the compound is triallyl cyanurate (TAC). 如申請專利範圍第1項所述之基板組成物,其中該化合物係四乙烯基四甲基環四矽氧烷(tetravinyltetramethylcyclotetrasiloxane)。 The substrate composition according to claim 1, wherein the compound is tetravinyltetramethylcyclotetrasiloxane. 如申請專利範圍第1項所述之基板組成物,其中該化合物係 八乙烯基八聚倍半硅氧烷(octavinyl octasilsesquioxane)。 The substrate composition according to claim 1, wherein the compound is Octavinyl octasilsesquioxane (octavinyl octasilsesquioxane). 如申請專利範圍第1項所述之基板組成物,更包含0.01-10重量份之添加劑。 The substrate composition according to claim 1, further comprising 0.01 to 10 parts by weight of an additive. 如申請專利範圍第8項所述之基板組成物,其中該添加劑係起始劑、平坦劑、色料、消泡劑、耐燃劑、或上述之組合。 The substrate composition according to claim 8, wherein the additive is an initiator, a flat agent, a colorant, an antifoaming agent, a flame retardant, or a combination thereof. 一種基板,包含:一膜層,其中該膜層係申請專利範圍第1項所述基板組成物所形成之固化物。 A substrate comprising: a film layer, wherein the film layer is a cured product formed by the substrate composition described in claim 1 of the patent application. 如申請專利範圍第10項所述之基板,更包含:一第一金屬箔配置於該膜層上。 The substrate of claim 10, further comprising: a first metal foil disposed on the film layer. 如申請專利範圍第11項所述之基板,更包含:一第二金屬箔,其中該膜層置於該第一金屬箔及該第二金屬箔之間。 The substrate of claim 11, further comprising: a second metal foil, wherein the film layer is disposed between the first metal foil and the second metal foil. 如申請專利範圍第10項所述之基板,其中該基板係為印刷電路板、積體電路載板、或高頻基板。 The substrate of claim 10, wherein the substrate is a printed circuit board, an integrated circuit carrier, or a high frequency substrate.
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