TW201921042A - Wavelength conversion member and light-emitting device - Google Patents

Wavelength conversion member and light-emitting device Download PDF

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TW201921042A
TW201921042A TW107127131A TW107127131A TW201921042A TW 201921042 A TW201921042 A TW 201921042A TW 107127131 A TW107127131 A TW 107127131A TW 107127131 A TW107127131 A TW 107127131A TW 201921042 A TW201921042 A TW 201921042A
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light
wavelength conversion
phosphor layer
phosphor
conversion member
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TW107127131A
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TWI760541B (en
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菊地俊光
傳井美史
阿部譽史
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日商日本特殊陶業股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/0239Combinations of electrical or optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements

Abstract

The purpose of the present invention is to provide a wavelength conversion member having little risk of performance degradation due to temperature quenching when used for high-power applications and capable of producing great light intensity with less energy. Provided is a wavelength conversion member 10 that includes a base material 12 and a phosphor layer 14 provided on the base material 12 and converts light having a wavelength within a specific range to light having a different wavelength, wherein: the thickness of the phosphor layer 14 is less than or equal to 200 [mu]m and less than or equal to a quarter of the thickness of the base material 12 in the stacking direction of the phosphor layer 14; the phosphor layer 14 is made up of a light-transmissive inorganic material and phosphor particles 16 bonded to the inorganic material; the material of the phosphor particle 16 is either YAG:Ce or LuAG:Ce; and the concentration of Ce in the phosphor particle 16 is between 0.03 at% and 0.60 at%, inclusive.

Description

波長轉換構件及發光裝置    Wavelength conversion member and light emitting device   

本發明係關於將特定範圍波長的光轉換成其他波長的光之波長轉換構件及發光裝置。 The present invention relates to a wavelength conversion member and a light emitting device that convert light of a specific range of wavelengths into light of other wavelengths.

作為發光元件,已知有例如以與藍色LED元件接觸之方式於以環氧或矽酮等為代表的樹脂配置分散有螢光體粒子而成的波長轉換構件。且近年來,取代LED,而使用能量效率高且容易因應小型化、高輸出化之雷射二極體(LD)的應用(application)也逐漸增加。 As a light-emitting element, for example, a wavelength conversion member in which phosphor particles are dispersed in a resin typified by epoxy, silicone, or the like so as to be in contact with a blue LED element is known. Moreover, in recent years, the use of laser diodes (LDs), which have high energy efficiency and are easy to cope with miniaturization and high output, has been increasing instead of LEDs.

由於雷射係局部性地照射高能量的光,所以被雷射光集中照射的樹脂,其照射部位會燒焦。對此,藉由使用無機黏合劑來取代樹脂,並適用僅由無機材料構成的螢光體板,解決了使用以雷射為首之能量高的激發源時的耐熱性課題(專利文獻1)。 Since the laser system irradiates high-energy light locally, the resin irradiated by the laser light concentratedly will burn the irradiated part. On the other hand, by using an inorganic adhesive instead of a resin and applying a phosphor plate composed of only an inorganic material, the problem of heat resistance when using an excitation source with a high energy such as laser is solved (Patent Document 1).

又揭示有以能獲得沒有偏差的白色發光為目的,將作為活化劑的Ce濃度設在既定範圍的YAG螢光體陶瓷燒結體(專利文獻2)。 Also disclosed is a YAG phosphor ceramic sintered body in which the Ce concentration as an activator is set in a predetermined range in order to obtain white light emission without deviation (Patent Document 2).

先前技術文獻Prior art literature 專利文獻Patent literature

專利文獻1 日本特開2015-038960號公報 Patent Document 1 Japanese Patent Application Publication No. 2015-038960

專利文獻2 日本特開2010-024278號公報 Patent Document 2 Japanese Patent Application Publication No. 2010-024278

專利文獻1揭示有藉由僅以無機材料構成螢光體板,來改善螢光體板的耐熱性。然而,依然會發生因為對於雷射功率(laser power)之發熱‧蓄熱的關係所致之螢光體本身的性能消失之稱為溫度淬滅(temperature quenching)的現象。 Patent Document 1 discloses that the heat resistance of a phosphor plate is improved by constituting the phosphor plate with only an inorganic material. However, a phenomenon called temperature quenching, in which the performance of the phosphor itself disappears due to the relationship of heat generation and thermal storage to laser power, still occurs.

又,專利文獻2揭示有藉由將材料粉末混合‧燒成,之後加以研磨而獲得的YAG螢光體陶瓷燒結體。然而,因為未考量到使用高能量激發源時的放熱性,所以會有因使用環境而引起蓄熱而發生溫度淬滅所致之性能降低之虞。 Further, Patent Document 2 discloses a YAG phosphor ceramic sintered body obtained by mixing and firing material powders and then grinding them. However, since the exothermicity when using a high-energy excitation source is not taken into consideration, there is a possibility that performance degradation due to temperature quenching due to heat accumulation due to the use environment may occur.

本發明係有鑑於此種情事而研創者,目的在提供一種於高功率用途中不易產生溫度淬滅所導致的性能降低,可以較少的能量得到較多的發光量之波長轉換構件及發光裝置。 The present invention has been developed in view of such circumstances, and an object thereof is to provide a wavelength conversion member and a light-emitting device that are less likely to cause performance degradation due to temperature quenching in high-power applications and can obtain a larger amount of light with less energy. .

(1)為了達成上述目的,本發明的波長轉換構件係具備基材與設置於前述基材上的螢光體層且將特定範圍波長的光轉換成其他波長的光,該波長轉換構件的特徵為:前述螢光體層的厚度為200μm以下且為前述螢光體層之積層方向的前述基材的厚度的4分1以下,前述螢光體層係由透光性的無機材料以及與前述無機材料結合的螢光體粒子所形成,前述螢光體粒子的材料為YAG:Ce或LuAG:Ce中任一者,前述螢光體粒子的Ce濃度為0.03at%以上0.60at%以下。 (1) In order to achieve the above object, the wavelength conversion member of the present invention includes a base material and a phosphor layer provided on the base material, and converts light of a specific range of wavelengths into light of other wavelengths. The characteristic of the wavelength conversion member is : The thickness of the phosphor layer is 200 μm or less and is less than 4 minutes 1 of the thickness of the substrate in the lamination direction of the phosphor layer; the phosphor layer is composed of a translucent inorganic material and a combination of the inorganic material and the inorganic material; It is formed of phosphor particles, and the material of the phosphor particles is either YAG: Ce or LuAG: Ce, and the Ce concentration of the phosphor particles is 0.03 at% or more and 0.60 at% or less.

如上述,藉由使用Ce濃度小的螢光體,可使在螢光體產生之熱的產生點分散,減少在螢光轉換時產生之熱的密度並提高放熱性,能夠防止螢光體層整體的溫度上升。其結果,即便在由具有高能量的雷射等所產生的激發中,也難以到達螢光體的發光性能降低之溫度,即便在高功率下也可維持高發光強度。又,藉由具有比螢光體層厚度還大的基材,因為發揮作為放熱板功能的基材佔了大的重量比,所以也可進行來自基材的放熱,能更進一步提高放熱性,並抑制因溫度淬滅所致之性能降低。 As described above, by using a phosphor having a small Ce concentration, it is possible to disperse the generation points of the heat generated by the phosphor, reduce the density of the heat generated during the fluorescence conversion and improve the heat release property, and prevent the entire phosphor layer. The temperature rises. As a result, it is difficult to reach a temperature at which the luminous performance of the phosphor decreases even during excitation by a laser or the like having a high energy, and high luminous intensity can be maintained even at high power. In addition, since the base material having a thickness larger than that of the phosphor layer has a large weight ratio as a base material functioning as a heat radiation plate, it is possible to perform heat radiation from the base material, which can further improve heat radiation properties, and Inhibits performance degradation due to temperature quenching.

(2)又,在本發明的波長轉換構件中,前述螢光體層的厚度為10μm以上,前述螢光體粒子的Ce濃度為0.12at%以上。藉此,因為螢光體層的厚度、Ce濃度不會太小,故可抑制發光效率的降低。 (2) In the wavelength conversion member of the present invention, the thickness of the phosphor layer is 10 μm or more, and the Ce concentration of the phosphor particles is 0.12 at% or more. Accordingly, since the thickness of the phosphor layer and the Ce concentration are not too small, it is possible to suppress a decrease in light emission efficiency.

(3)又,在本發明的波長轉換構件中,前述基材係由藍寶石形成。如此,可構成一種透射型波長轉換構件,其係使用藉由高的熱傳導率可期待良好的放熱性之透明材料的藍寶石作為基材,藉此當使用具有高能量的雷射等作為激發光時,能夠維持高發光強度。 (3) In the wavelength conversion member of the present invention, the substrate is made of sapphire. In this way, it is possible to construct a transmission-type wavelength conversion member that uses a sapphire of a transparent material that can be expected to have good heat release properties with a high thermal conductivity as a base material, thereby using a laser or the like having high energy as the excitation light , Can maintain high light emission intensity.

(4)又,在本發明的波長轉換構件中,前述基材係由鋁所形成。如此,可構成一種反射型波長轉換構件,其係使用藉由高的熱傳導率可期待良好的放熱性之反射材料的鋁作為基材,藉此當使用具有高能量的雷射等作為激發光時,能夠維持高發光強度。 (4) In the wavelength conversion member of the present invention, the base material is made of aluminum. In this way, it is possible to construct a reflection-type wavelength conversion member that uses aluminum as a base material of a reflective material that can expect good heat release properties with high thermal conductivity, thereby using a laser or the like having high energy as the excitation light. , Can maintain high light emission intensity.

(5)本發明的發光裝置,係具備產生特定範圍波長的光源光之光源,其特徵為:具備如上述(1)至(4)中任一者之波長轉換構件,以將前述光源光吸收且轉換成其他波長的光而發光。藉此,可構成即便在高功率下也可維持高的發光強度,並可抑制發光效率降低之發光裝置。 (5) The light-emitting device of the present invention is a light source provided with light source light having a specific range of wavelengths, and is characterized by including a wavelength conversion member according to any one of (1) to (4) above to absorb light from the light source The light is converted into light of another wavelength to emit light. This makes it possible to construct a light-emitting device that can maintain a high light-emitting intensity even at a high power and can suppress a decrease in light-emitting efficiency.

根據本發明,可構成在高功率的用途中難以產生因溫度淬滅所致之性能降低,能以少能量獲得多的發光量之波長轉換構件。 According to the present invention, in a high-power application, it is possible to constitute a wavelength conversion member that is hard to cause degradation in performance due to temperature quenching and can obtain a large amount of light emission with less energy.

10‧‧‧波長轉換構件 10‧‧‧ Wavelength Conversion Component

12‧‧‧基材 12‧‧‧ substrate

14‧‧‧螢光體層 14‧‧‧ phosphor layer

16‧‧‧螢光體粒子 16‧‧‧ phosphor particles

20‧‧‧結合材 20‧‧‧Combination

30‧‧‧透射型發光裝置 30‧‧‧ transmissive light-emitting device

40‧‧‧反射型發光裝置 40‧‧‧Reflective lighting device

50‧‧‧光源 50‧‧‧ light source

700‧‧‧評價系統 700‧‧‧ evaluation system

710‧‧‧光源 710‧‧‧light source

720‧‧‧平面凸透鏡 720‧‧‧ Plano Convex Lens

730‧‧‧雙凸透鏡 730‧‧‧Biconvex lens

735‧‧‧帶通濾波器 735‧‧‧Band Pass Filter

740‧‧‧功率表 740‧‧‧Power Meter

S‧‧‧試料 S‧‧‧ sample

圖1係表示本發明的波長轉換構件之示意圖。 FIG. 1 is a schematic diagram showing a wavelength conversion member of the present invention.

圖2(a)係表示本發明的透射型發光裝置之示意圖;圖2(b)係表示本發明的反射型發光裝置之示意圖。 FIG. 2 (a) is a schematic view showing a transmissive light-emitting device of the present invention; FIG. 2 (b) is a schematic view showing a reflective light-emitting device of the present invention.

圖3係表示本發明的波長轉換構件的製造方法之流程圖。 FIG. 3 is a flowchart showing a method of manufacturing a wavelength conversion member according to the present invention.

圖4係表示對於波長轉換構件之發光強度試驗用的透射型評價系統之剖面圖。 FIG. 4 is a cross-sectional view showing a transmission-type evaluation system for a light emission intensity test of a wavelength conversion member.

圖5係表示針對反射型試料1~5,以雷射功率密度(雷射輸入)作為橫軸時的發光強度之圖表。 FIG. 5 is a graph showing the luminous intensity when the laser power density (laser input) is used as the horizontal axis for reflective samples 1 to 5. FIG.

圖6係表示針對透射型試料6~10,以雷射功率密度(雷射輸入)作為橫軸時的發光強度之圖表。 FIG. 6 is a graph showing the luminous intensity when the laser power density (laser input) is used as the horizontal axis for the transmissive samples 6 to 10.

圖7係表示試料的各種條件、與峰值時的雷射輸入、峰值時的發光強度及3W時的發光強度(發光效率)各自的結果之表。 FIG. 7 is a table showing the results of various conditions of the sample, the laser input at the peak, the light emission intensity at the peak, and the light emission intensity (light emission efficiency) at 3W.

用以實施發明的形態A form for implementing the invention

接著,針對本發明的實施形態,一邊參照圖式一邊進行說明。為了易於理解說明,在各圖式中對於相同的構成要素係標註相同的參照符號,並省略重複說明。此外,在構成圖中,各構成要素的大小係概念性地表示,未必表示實際的尺寸比例。 Next, an embodiment of the present invention will be described with reference to the drawings. In order to facilitate understanding of the description, the same constituent elements are denoted by the same reference numerals in each drawing, and repeated description is omitted. In addition, the size of each component is shown conceptually in a configuration diagram, and does not necessarily show an actual dimensional ratio.

[波長轉換構件的構成]     [Configuration of wavelength conversion member]    

圖1係表示波長轉換構件10之示意圖。波長轉換構件10係在基材12上形成有螢光體層14。波長轉換構件10係一邊使自光源所照射出的光源光透射或反射,一邊吸收並激發光源光而產生波長不同的光。例如,一邊使藍色光的光源光透射或反射,一邊使經螢光體層14轉換後的轉換光放射,將轉換光和光源光合成或僅利用轉換光,可轉換成各種顏色的光。 FIG. 1 is a schematic diagram showing a wavelength conversion member 10. The wavelength conversion member 10 has a phosphor layer 14 formed on a base material 12. The wavelength conversion member 10 absorbs and excites the light source light while transmitting or reflecting the light source light emitted from the light source to generate light having different wavelengths. For example, while transmitting or reflecting the light source light of blue light, the converted light converted by the phosphor layer 14 is radiated, and the converted light and the light source light are combined or only converted light can be converted into light of various colors.

基材12的材料為透射型時,可使用藍寶石、玻璃等具有透光性的材料。從發光強度的觀點來看,光會透射的部分為至少難以吸收光源光的材料。又,因照射高能量的光會使溫度變高,所以宜為熱傳導性高者。因此,透射型基材較佳係以藍寶石形成。 When the material of the base material 12 is a transmissive type, a material having translucency such as sapphire or glass can be used. From a viewpoint of light emission intensity, a portion where light is transmitted is a material that is at least difficult to absorb light from a light source. In addition, since high-temperature light is radiated, the temperature becomes high, so it is preferable to have a high thermal conductivity. Therefore, the transmissive substrate is preferably formed of sapphire.

基材12的材料為反射型時,可使用鋁、鐵、銅等金屬。以反射型基材而言,可將全部的基材都用反射光的材料來製造,也可在具有透光性的材料或未考量光的反射之材料的一面,利用鍍敷等設置會反射光之銀 等材料。從發光強度的觀點來看,光會透射的部分為至少難以吸收光源光的材料。又,由於照射高能量的光會使溫度變高,所以宜為熱傳導性高者。因此,反射型基材較佳係以鋁形成。 When the material of the base material 12 is reflective, metals such as aluminum, iron, and copper can be used. For reflective substrates, all substrates can be made of materials that reflect light, or they can be set to reflect on the side of a material that has translucency or a material that does not consider light reflection, such as plating. Light of silver and other materials. From a viewpoint of light emission intensity, a portion where light is transmitted is a material that is at least difficult to absorb light from a light source. In addition, since high-temperature light is irradiated, the temperature becomes high, so it is preferable to have a high thermal conductivity. Therefore, the reflective substrate is preferably formed of aluminum.

螢光體層14係作成膜設置於基材12上,且藉由螢光體粒子16及結合材20(透光性無機材料)所形成。結合材20係將螢光體粒子16彼此及螢光體粒子16與基材12固定。藉此,對於高能量密度之光的照射,因為是與發揮作為放熱材功能的基材12接合,故可效率佳地放熱,可抑制螢光體的溫度淬滅。上述各自的固定因為是化學結合而可效率佳地放熱,故而較佳。 The phosphor layer 14 is formed on a substrate 12 as a film, and is formed by phosphor particles 16 and a bonding material 20 (transparent inorganic material). The bonding material 20 fixes the phosphor particles 16 to each other, and the phosphor particles 16 and the base material 12. Accordingly, since irradiation with light having a high energy density is bonded to the base material 12 which functions as a heat-radiating material, it is possible to efficiently radiate heat and suppress temperature quenching of the phosphor. The above-mentioned respective fixations are preferred because they are chemically bonded to efficiently release heat.

螢光體層14的厚度為200μm以下且為螢光體層之積層方向的基材厚度之4分1以下。藉此,因為發揮作為放熱板功能的基材係佔了大的重量比,所以可更確實地進行從螢光體層14朝基材12的放熱,可抑制溫度淬滅所致之性能降低。又,螢光體層14的厚度係以10μm以上較佳。藉此,由於螢光體層14的厚度不會過小,故可抑制發光效率降低。又,螢光體層14的厚度係以100μm以下較佳。 The thickness of the phosphor layer 14 is 200 μm or less and is not more than 1/4 of the thickness of the substrate in the lamination direction of the phosphor layer. Thereby, since the base material functioning as a heat radiation plate occupies a large weight ratio, the heat radiation from the phosphor layer 14 to the base material 12 can be performed more reliably, and the performance degradation due to temperature quenching can be suppressed. The thickness of the phosphor layer 14 is preferably 10 μm or more. Thereby, since the thickness of the phosphor layer 14 is not excessively small, it is possible to suppress a decrease in light emission efficiency. The thickness of the phosphor layer 14 is preferably 100 μm or less.

螢光體粒子16作為發光中心係由添加有鈰(Ce)的釔‧鋁‧石榴石系螢光體(YAG:Ce)或鎦‧鋁‧石榴石系螢光體(LuAG:Ce)中任一者所構成。此時,將發光中心的Ce濃度定義如下。亦即,YAG的組成式為Y3Al5O12,而將以Ce取代其中的釔(Y)的一部分所得的YAG表示為YAG:Ce,其組成式一般以(Y3-XCeX)Al5O12 表示。且,將Ce相對於組成式全體之原子數的比例以單位「at%」來表示。例如,X=0.1時,為0.1/(3+5+12)×100=0.5,將此定義為0.5at%。 The phosphor particles 16 are made of yttrium, aluminum, garnet-based phosphors (YAG: Ce) or thorium, aluminum, and garnet-based phosphors (LuAG: Ce) with cerium (Ce) as a light emitting center. Constituted by one. At this time, the Ce concentration of the emission center is defined as follows. That is, the composition formula of YAG is Y 3 Al 5 O 12 , and YAG obtained by replacing a part of yttrium (Y) with Ce is represented as YAG: Ce, and its composition formula is generally (Y 3-X Ce X ) Al 5 O 12 is represented. The ratio of Ce to the total number of atoms in the composition formula is expressed in the unit "at%". For example, when X = 0.1, it is 0.1 / (3 + 5 + 12) × 100 = 0.5, which is defined as 0.5at%.

LuAG係以鎦(Lu)來取代YAG所有的Y,組成式為Lu3Al5O12。因此,LuAG:Ce的Ce濃度亦以與上述相同方式定義,以單位「at%」來表示。 LuAG uses Y (Lu) to replace all Y in YAG, and the composition formula is Lu 3 Al 5 O 12 . Therefore, the Ce concentration of LuAG: Ce is also defined in the same manner as above, and is expressed in the unit "at%".

螢光體粒子16的Ce濃度為0.03at%以上0.60at%以下。如此,藉由使用Ce濃度小的螢光體,可使在螢光體產生之熱的產生點分散,可減少螢光轉換時所產生之熱的密度並可提高放熱性,可防止螢光體層全體的溫度上升。結果,在由具有高能量的雷射等所產生的激發中,難以到達螢光體的發光性能降低的溫度,即便在高功率下也可維持高的發光強度。又,螢光體粒子16的Ce濃度係以0.12at%以上較佳。藉此,由於Ce濃度不會過小,故可抑制發光效率降低。 The Ce concentration of the phosphor particles 16 is 0.03 at% or more and 0.60 at% or less. In this way, by using a phosphor with a small Ce concentration, the generation points of the heat generated by the phosphor can be dispersed, the density of the heat generated during fluorescence conversion can be reduced, and the exothermicity can be improved, and the phosphor layer can be prevented The overall temperature rises. As a result, it is difficult to reach a temperature at which the luminous performance of the phosphor is reduced during excitation by a laser or the like having a high energy, and a high luminous intensity can be maintained even at a high power. The Ce concentration of the phosphor particles 16 is preferably 0.12 at% or more. Thereby, since the Ce concentration does not become too small, it is possible to suppress a decrease in light emission efficiency.

螢光體粒子的Ce濃度係可利用ICP或XRF來分析。在任一方法中,Ce濃度均藉由使用已知的螢光體作為校準曲線來進行。Ce濃度亦可以複數次分析值的平均值求得。 The Ce concentration of the phosphor particles can be analyzed by ICP or XRF. In either method, Ce concentration is performed by using a known phosphor as a calibration curve. The Ce concentration can also be obtained by averaging the analysis values several times.

螢光體粒子16係吸收光源光(激發光),放射轉換光。YAG:Ce係吸收光源光(激發光),放射黃色的轉換光。LuAG:Ce係吸收光源光(激發光),放射綠色的轉換光。例如當光源光為藍色或紫色時,可將光源光和轉換光合成而放射白色的放射光。 The phosphor particles 16 absorb light from the light source (excitation light) and emit converted light. YAG: The Ce system absorbs light from the light source (excitation light) and emits yellow converted light. LuAG: Ce system absorbs light from the source (excitation light) and emits green converted light. For example, when the light source light is blue or purple, the light source light and the converted light may be combined to emit white radiation light.

螢光體粒子16的平均粒徑為1μm以上30μm以下,較佳為5μm以上20μm以下。原因在於:由於為1μm以上,故轉換光的發光強度變大,進而波長轉換構件10的發光強度會變大。此外,由於為30μm以下,故可將各個螢光體粒子16的溫度維持地較低,可抑制溫度淬滅。此外,在本說明書中,平均粒徑係指中位直徑(D50)、或者藉由SEM影像的解析所得之粒子的平均粒徑。為中位直徑(D50)的平均粒徑,係可使用雷射繞射/散射式粒徑分布測定裝置的乾式測定或濕式測定來量測。關於利用SEM影像的解析所得之粒子的平均粒徑,係可針對與螢光體層14的平面方向垂直方向的剖面,例如以1000倍進行剖面之SEM影像的取得,對所得到的SEM影像,進行二值化等的影像解析,從影像算出被辨識為螢光體粒子16之100個以上的粒子的剖面積,並由其累積分布求取平均粒徑。從影像算出被辨識為螢光體粒子之100個以上之粒子的剖面積時所使用的影像,係以針對螢光體層14所含的螢光體粒子16成為全體的平均粒徑的方式,取得螢光體層14之複數處的剖面影像(例如3張以上)。 The average particle diameter of the phosphor particles 16 is 1 μm or more and 30 μm or less, and preferably 5 μm or more and 20 μm or less. The reason is that since it is 1 μm or more, the light emission intensity of the converted light is increased, and the light emission intensity of the wavelength conversion member 10 is also increased. Moreover, since it is 30 micrometers or less, the temperature of each phosphor particle 16 can be maintained low, and temperature quenching can be suppressed. In addition, in this specification, an average particle diameter means a median diameter (D50), or the average particle diameter of the particle | grains obtained by analysis of an SEM image. It is the average particle diameter of the median diameter (D50), and it can be measured by a dry measurement or a wet measurement using a laser diffraction / scattering type particle size distribution measuring device. The average particle diameter of the particles obtained by the analysis of the SEM image can be obtained from a cross-section perpendicular to the plane direction of the phosphor layer 14, for example, by obtaining a SEM image of the cross-section at a magnification of 1000 times. In image analysis such as binarization, the cross-sectional area of 100 or more particles identified as phosphor particles 16 is calculated from the image, and the average particle diameter is obtained from the cumulative distribution. The image used when calculating the cross-sectional area of 100 or more particles identified as phosphor particles from the image is obtained so that the average particle diameter of the entire phosphor particles 16 contained in the phosphor layer 14 is obtained. A plurality of cross-sectional images (for example, three or more) of the phosphor layer 14.

結合材20係無機黏合劑經水解或氧化而形成,藉由具有透光性的無機材料構成。結合材20係由例如二氧化矽(SiO2)、磷酸鋁所構成。因為結合材20係由無機材料構成,所以即使照射雷射二極體等高能量的光也不會變質。此外,因為結合材20具有透光性,故可使光源光或轉換光透射。作為無機黏合劑,係可使用矽酸乙酯(ethyl silicate)、磷酸鋁水溶液等。 The bonding material 20 is an inorganic adhesive that is formed by hydrolysis or oxidation, and is made of a light-transmitting inorganic material. The bonding material 20 is made of, for example, silicon dioxide (SiO 2 ) or aluminum phosphate. Since the bonding material 20 is made of an inorganic material, it does not deteriorate even when irradiated with high-energy light such as a laser diode. In addition, since the bonding material 20 is translucent, the light source light or the converted light can be transmitted. As the inorganic adhesive, ethyl silicate, an aluminum phosphate aqueous solution, or the like can be used.

此外,所謂具有透光性的物質係指,對0.5mm的對象物質,在可見光的波長區域(λ=380~780nm)將光垂直射入時,具有從相反側穿過之光的放射束超過入射光的80%之特性的物質。 In addition, the so-called light-transmitting substance means that for a 0.5-mm target substance, when the light is vertically incident in the wavelength region of visible light (λ = 380 to 780 nm), the radiation beam with light passing through from the opposite side exceeds 80% of incident light.

波長轉換構件10藉由與光源組合,而可構成即便為高功率也可維持高的發光強度,並可抑制發光效率降低之發光裝置。尤其,波長轉換構件10由於螢光體粒子16的Ce濃度係在低的既定範圍,螢光體層14比發揮作為放熱板功能的基材12還薄,且螢光體層14由無機材料構成,所以可使用高輸出的雷射二極體作為光源,可構成高輸出的發光裝置。 The wavelength conversion member 10 can be combined with a light source to constitute a light-emitting device that can maintain a high light-emitting intensity even at a high power and can suppress a decrease in light-emitting efficiency. In particular, the wavelength conversion member 10 has a low Ce concentration in the phosphor particles 16, the phosphor layer 14 is thinner than the base material 12 functioning as a heat radiation plate, and the phosphor layer 14 is made of an inorganic material. A high-output laser diode can be used as a light source, and a high-output light-emitting device can be constructed.

[發光裝置的構成]     [Configuration of Light-Emitting Device]    

圖2的(a)、(b)係分別表示本發明的透射型及反射型的發光裝置之示意圖。透射型發光裝置30係具備光源50與透射型的波長轉換構件10。反射型發光裝置40係具備光源50與反射型的波長轉換構件10。光源50係可使用產生特定範圍波長的光源光之LED、雷射二極體等。波長轉換構件10由於即便為高功率也可維持高的發光強度,故光源50係以雷射二極體較佳。 (A) and (b) of FIG. 2 are schematic diagrams respectively showing a transmissive type and a reflective type light emitting device of the present invention. The transmissive light-emitting device 30 includes a light source 50 and a transmissive wavelength conversion member 10. The reflective light-emitting device 40 includes a light source 50 and a reflective wavelength conversion member 10. The light source 50 may be an LED, a laser diode, or the like that generates light source light having a specific range of wavelengths. Since the wavelength conversion member 10 can maintain a high light emission intensity even at a high power, the light source 50 is preferably a laser diode.

[波長轉換構件的製造方法]     [Manufacturing method of wavelength conversion member]    

說明波長轉換構件的製造方法的一例。圖3係表示本發明的波長轉換構件的製造方法之流程圖。最初,製作印刷用糊料。首先,準備具有既定的Ce濃度及平均粒 徑之螢光體粒子(步驟S1)。螢光體粒子係為YAG:Ce或LuAG:Ce中任一者。 An example of a method for manufacturing a wavelength conversion member will be described. FIG. 3 is a flowchart showing a method of manufacturing a wavelength conversion member according to the present invention. First, a printing paste is produced. First, phosphor particles having a predetermined Ce concentration and an average particle diameter are prepared (step S1). The phosphor particles are either YAG: Ce or LuAG: Ce.

其次,秤量所準備的螢光體粒子,使之分散於溶劑,與無機黏合劑混合,而製作印刷用糊料(步驟S2)。混合時可使用研磨機等。溶劑係可使用α-萜品醇、丁醇、異佛酮、甘油(glycerin)等的高沸點溶劑。 Next, the prepared phosphor particles are weighed, dispersed in a solvent, and mixed with an inorganic binder to prepare a printing paste (step S2). For mixing, a grinder or the like can be used. As the solvent, high-boiling solvents such as α-terpineol, butanol, isophorone, and glycerin can be used.

又,無機黏合劑係以矽酸乙酯等的有機矽酸鹽較佳。藉由使用有機矽酸鹽,使螢光體粒子分散於印刷用糊料全體,可製作適當的黏度的印刷用糊料。例如,使用矽酸乙酯作為無機黏合劑時,相對於水及觸媒的質量,係將矽酸乙酯設為70wt%以上100wt%以下的質量,較佳設為80wt%以上90wt%以下的質量。此外,無機黏合劑亦可為藉由使包含由經水解或氧化而成為氧化矽的氧化矽前驅物、矽氧化合物、二氧化矽及非晶形二氧化矽(amorphous silica)所構成的群組中的至少1種原料在常溫下反應、或者藉由以500℃以下的溫度進行熱處理而獲得者。作為氧化矽前驅物,係可列舉:以全氫聚矽氮烷(perhydropolysilazane)、矽酸乙酯、矽酸甲酯作為主成分者。 The inorganic binder is preferably an organic silicate such as ethyl silicate. By using an organosilicate to disperse phosphor particles throughout the printing paste, a printing paste having an appropriate viscosity can be produced. For example, when using ethyl silicate as an inorganic binder, the mass of ethyl silicate is 70% by weight to 100% by weight relative to the mass of water and catalyst, preferably 80% by weight to 90% by weight. quality. In addition, inorganic binders can also be included in the group consisting of silicon oxide precursors, silicon oxide compounds, silicon dioxide, and amorphous silica that are converted to silicon oxide by hydrolysis or oxidation. It is obtained by reacting at least one of the raw materials at room temperature or by performing heat treatment at a temperature of 500 ° C or lower. Examples of the silicon oxide precursor include those containing perhydropolysilazane, ethyl silicate, and methyl silicate as main components.

在印刷用糊料的製作後,於基材上塗布印刷用糊料而形成糊料層(步驟S3)。印刷用糊料的塗布係可使用:網版印刷法、噴霧法(spray rmethod)、利用點膠機(dispenser)的描繪法、噴射法。若使用網版印刷法,可穩定地形成厚度薄的糊料層,所以較佳。糊料層的厚度係以在燒成後調整成10μm以上200μm以下較佳。 After the printing paste is prepared, the printing paste is applied on the substrate to form a paste layer (step S3). The printing paste can be applied by a screen printing method, a spray method, a drawing method using a dispenser, and a spray method. It is preferable to use a screen printing method because a thin paste layer can be formed stably. The thickness of the paste layer is preferably adjusted to 10 μm or more and 200 μm or less after firing.

將形成有燒成糊料層的基材使用大氣爐進行燒成,來製作螢光體層(步驟S4)。燒成溫度宜為150℃以上500℃以下,燒成時間係以0.5小時以上2.0小時以下較佳。又,升溫速度係以50℃/h以上200℃/h以下較佳。又,亦可在燒成前設置乾燥工序。 The base material on which the fired paste layer is formed is fired using an atmospheric furnace to produce a phosphor layer (step S4). The firing temperature is preferably 150 ° C to 500 ° C, and the firing time is preferably 0.5 hours to 2.0 hours. The temperature increase rate is preferably 50 ° C / h or more and 200 ° C / h or less. A drying step may be provided before firing.

藉由此種製造工序,可容易地製造螢光體粒子均勻存在於螢光體層全體的波長轉換構件。所獲得的波長轉換構件即便為高功率也可維持高的發光強度,並可抑制發光效率降低。 With such a manufacturing process, it is possible to easily manufacture a wavelength conversion member in which phosphor particles are uniformly present in the entire phosphor layer. The obtained wavelength conversion member can maintain a high light emission intensity even when the power is high, and can suppress a decrease in light emission efficiency.

[實施例](試料的製作方法)     [Example] (Method for making sample)    

準備具有平均粒徑6μm、且0.03at%~0.90at%的Ce濃度之螢光體粒子(YAG:Ce粒子、及LuAG:Ce粒子)。秤量此等螢光體粒子,混合α-萜品醇(溶劑)來製作分散材,並混合矽酸乙酯(無機黏合劑)來製作印刷用糊料。 Fluorescent particles (YAG: Ce particles, and LuAG: Ce particles) having an average particle diameter of 6 μm and a Ce concentration of 0.03 at% to 0.90 at% were prepared. These phosphor particles were weighed, α-terpineol (solvent) was mixed to make a dispersion material, and ethyl silicate (inorganic binder) was mixed to make a printing paste.

其次,採用網版印刷法,以燒成後會成為8~220μm的厚度的方式,將印刷用糊料塗布在基材(藍寶石基材、或鋁上塗布有銀的鋁基材)上。塗布後於100℃下使之乾燥20分鐘後,以無機黏合劑進行封孔處理。最後使用大氣爐於150℃/h下升溫至350℃為止,燒成30分鐘而完成試料。 Next, a screen printing method is used to apply a printing paste to a substrate (a sapphire substrate or an aluminum substrate coated with silver on aluminum) so that the thickness becomes 8 to 220 μm after firing. After coating, it was dried at 100 ° C for 20 minutes, and then sealed with an inorganic adhesive. Finally, the temperature was increased to 350 ° C. at 150 ° C./h using an atmospheric furnace, and the sample was fired for 30 minutes.

上述試料的Ce濃度,係使用ICP且使用Ce濃度既知的螢光體作為校準曲線來進行。又,螢光體層的膜厚(厚度)係以1000倍的倍率拍攝各試料的SEM剖面照片,以等間隔畫出10條垂直線,測量從螢光體層的頂 面到基材的頂面之距離,由10條線的平均長度算出螢光體層的膜厚。 The Ce concentration of the above-mentioned sample was performed using ICP and using a phosphor having a known Ce concentration as a calibration curve. In addition, the film thickness (thickness) of the phosphor layer was taken at 1000 times the SEM cross-section photograph of each sample, and 10 vertical lines were drawn at equal intervals to measure the distance from the top surface of the phosphor layer to the top surface of the substrate. For the distance, the film thickness of the phosphor layer was calculated from the average length of 10 lines.

(試料的評價方法)     (Evaluation method of sample)    

對已完成的各試料,以由最大為24W的輸入之複數道雷射所產生的激發,進行反射型或透射型的發光強度試驗。光源光的波長為445nm,照射直徑藉聚光透鏡調整成0.15mm2。圖4係表示對波長轉換構件進行發光強度試驗用的透射型評價系統之剖面圖。如圖4所示,透射型的評價系統700,係由光源710、平面凸透鏡720、雙凸透鏡730、帶通濾波器(band pass filter)735、功率表(power meter)740所構成。以將來自波長轉換構件10的透射光聚光並進行測定,配置有各要素。 For each completed sample, a reflection-type or transmission-type light emission intensity test was performed with excitation generated by a plurality of lasers with an input of a maximum of 24 W. The wavelength of the light source light was 445 nm, and the irradiation diameter was adjusted to 0.15 mm 2 by a condenser lens. FIG. 4 is a cross-sectional view showing a transmission-type evaluation system for performing a light emission intensity test on a wavelength conversion member. As shown in FIG. 4, the transmission-type evaluation system 700 includes a light source 710, a plano-convex lens 720, a lenticular lens 730, a band pass filter 735, and a power meter 740. Each element is arranged so that the transmitted light from the wavelength conversion member 10 is collected and measured.

帶通濾波器735係以波長480nm作為閾值遮斷(cut)光的濾波器,測定所透射的光源光(吸收光)時係使用遮斷波長大者的濾波器。又,測定轉換光的發光強度時係使用遮斷波長小者的濾波器。如此,為了將所透射的光源光與轉換光分離,帶通濾波器735設置在雙凸透鏡與功率表之間。 The band-pass filter 735 is a filter that cuts light using a wavelength of 480 nm as a threshold. When measuring the transmitted light source light (absorbed light), a filter that cuts off the larger wavelength is used. When measuring the light emission intensity of the converted light, a filter that cuts off the wavelength is used. In this way, in order to separate the transmitted light source light from the converted light, the band-pass filter 735 is provided between the lenticular lens and the power meter.

在以此方式構成的系統中,進入平面凸透鏡720的光源光係朝波長轉換構件之試料S上的焦點被聚光。然後,將產生自試料S的放射光用雙凸透鏡730聚光,針對此經聚光的光用功率表740測定被帶通濾波器735所遮斷的光的強度。將此測定值設為轉換光的發光強度。藉由將雷射光以透鏡聚光,收斂照射面積,即便 為低輸出的雷射也可提升每單位面積的能量密度。將此能量密度設為雷射功率密度。又,關於反射型的評價系統,除了經聚光的光源光及轉換光藉試料的基材反射外,其餘可利用同樣的系統進行評價。 In the system configured in this manner, the light source light entering the plano-convex lens 720 is focused toward the focal point of the sample S of the wavelength conversion member. Then, the lenticular lens 730 for the emitted light generated from the sample S is condensed, and the intensity of the light blocked by the band-pass filter 735 is measured with the power meter 740 for the condensed light. This measured value is set to the light emission intensity of the converted light. By condensing the laser light with a lens and converging the irradiation area, even a low-output laser can increase the energy density per unit area. Let this energy density be the laser power density. In addition, regarding the reflection-type evaluation system, the same system can be used for evaluation except that the collected light source light and converted light are reflected by the substrate of the sample.

圖5及圖6係表示分別針對反射型的試料1~5及透射型的試料6~10,以雷射功率密度(雷射輸入)作為橫軸時的發光強度之圖表。對各試料,進行上述的發光強度試驗,算出峰值時的雷射輸入、峰值時的發光強度及3W時的發光強度。峰值時的雷射輸入係以雷射功率密度(雷射輸入)作為橫軸時的發光強度成為最大的雷射輸入。峰值時的發光強度係相對於峰值時的雷射輸入的發光強度。又,關於峰值時的發光強度及3W時的發光強度,反射型係以試料1的波長轉換構件的發光強度設為100時的相對值表示,透射型係以試料6的波長轉換構件的發光強度設為100時的相對值表示。又,圖7係表示試料的各種條件、與峰值時的雷射輸入、峰值時的發光強度及3W時的發光強度(發光效率)之各者的結果之表。關於試料11~20,亦利用與上述同樣的方式算出各值。 FIG. 5 and FIG. 6 are graphs showing luminous intensities when the laser power density (laser input) is used as the horizontal axis for the reflective samples 1 to 5 and the transmissive samples 6 to 10, respectively. The above-mentioned light emission intensity test was performed on each sample, and the laser input at the peak, the light emission intensity at the peak, and the light emission intensity at 3 W were calculated. The laser input at the peak is a laser input where the laser power density (laser input) becomes the maximum when the luminous intensity is the horizontal axis. The light emission intensity at the peak is the light emission intensity with respect to the laser input at the peak. In addition, regarding the light emission intensity at the peak and the light emission intensity at 3 W, the reflection type is represented by a relative value when the light emission intensity of the wavelength conversion member of Sample 1 is 100, and the transmission type is the light emission intensity of the wavelength conversion member of Sample 6. Relative value when set to 100. In addition, FIG. 7 is a table showing the results of various conditions of the sample, the laser input at the peak, the light emission intensity at the peak, and the light emission intensity (light emission efficiency) at 3W. For samples 11 to 20, each value was calculated in the same manner as described above.

如由觀看圖5及圖6的圖表可獲知般,得知按Ce濃度不同的各試料,在雷射功率密度低的既定範圍,發光強度係相對於雷射功率密度的增加呈直線式增加。因此,在此範圍中之圖表的傾斜度可被認為與發光效率對應。因此,將圖表所示的所有試料均成為直線的圖表之3W時的發光強度視為發光效率。 As can be seen from looking at the graphs of FIG. 5 and FIG. 6, it is learned that for samples with different Ce concentrations, in a predetermined range where the laser power density is low, the luminous intensity increases linearly with respect to the increase in laser power density. Therefore, the inclination of the graph in this range can be considered to correspond to the luminous efficiency. Therefore, the light emission intensity at 3 W of the graph in which all the samples shown in the graph are linear is regarded as the light emission efficiency.

將峰值時的雷射輸入大於3W者、峰值時的發光強度的相對值大於100者當作合格,在表中以○表示,不合格者則以×表示。又,3W時的發光強度(發光效率)係以相對值為35以上較佳,40以上更佳。原因在於:當發光效率小時,沒有被螢光體粒子吸收而透射或反射之光源光的比例會增加,故一旦此比例變過剩時,就有必要控制透射或反射而被放射之光源光。因此,將40以上者以○表示,將小於40者以△表示。 The laser input at the peak is greater than 3W, and the relative value of the luminous intensity at the peak is greater than 100 as a pass, which is indicated by ○ in the table, and those that fail are indicated by ×. The light emission intensity (light emission efficiency) at 3 W is preferably a relative value of 35 or more, and more preferably 40 or more. The reason is that when the luminous efficiency is small, the proportion of the light source light that is transmitted or reflected without being absorbed by the phosphor particles will increase. Therefore, once the ratio becomes excessive, it is necessary to control the transmitted or reflected light source light to be emitted. Therefore, those with 40 or more are represented by ○, and those with less than 40 are represented by △.

試料1~5係為反射型的波長轉換構件,使用YAG:Ce粒子作為螢光體粒子,將基材的厚度及螢光體層的厚度(膜厚)設為一定,而使Ce濃度改變之試料。試料1由於Ce濃度高,故在螢光體層內的熱分散無法有效率地進行,在3W的低輸入下會溫度淬滅。因此,無法使用高能量激發源。試料2~4由於為適當範圍的Ce濃度,故螢光體層內之熱的分散性得以提升,峰值時的雷射輸入及峰值時的發光強度得以提升。又,發光效率的相對值相對於成為反射型的基準之試料1,也是保持在40以上。試料5由於Ce濃度低,所以峰值時的雷射輸入及峰值時的發光強度雖有提升,但是發光效率的相對值低於40。 Samples 1 to 5 are reflection-type wavelength conversion members. YAG: Ce particles are used as phosphor particles, and the thickness of the substrate and the thickness (film thickness) of the phosphor layer are fixed to change the Ce concentration. . Since sample 1 has a high Ce concentration, thermal dispersion in the phosphor layer cannot be performed efficiently, and the temperature is quenched at a low input of 3W. Therefore, a high-energy excitation source cannot be used. Samples 2 to 4 have a Ce concentration in an appropriate range, so the heat dispersion in the phosphor layer is improved, and the laser input at the peak and the luminous intensity at the peak are improved. In addition, the relative value of the luminous efficiency is also maintained at 40 or more with respect to the reference sample 1 which is a reflection type reference. Sample 5 has a low Ce concentration, so although the laser input at the peak and the luminous intensity at the peak are improved, the relative value of the luminous efficiency is lower than 40.

試料6~10係為透射型的波長轉換構件,使用YAG:Ce粒子作為螢光體粒子,將基材的厚度及螢光體層的膜厚設為一定,而使Ce濃度改變之試料。試料6由於Ce濃度高,故在螢光體層內的熱分散無法有效率地進行,在3W下會發生溫度淬滅。因此,無法使用高能 量激發源。試料7~9由於為適當範圍的Ce濃度,故螢光體層內之熱的分散性得以提升,峰值時的雷射輸入及峰值時的發光強度得以提升。又,發光效率的相對值相對於成為透射型的基準之試料6,亦保持在40以上。試料10由於Ce濃度低,故峰值時的雷射輸入及峰值時的發光強度雖然提升,但發光效率的相對值低於35。透射型試料10之發光效率的相對值變得比反射型試料5低的原因被認為是因為:在反射型的情況下,最初未被螢光體粒子吸收的光源光反射回來時,有時會被螢光體粒子吸收。 Samples 6 to 10 are transmission-type wavelength conversion members, and YAG: Ce particles are used as phosphor particles. The thickness of the base material and the film thickness of the phosphor layer are fixed to change the Ce concentration. Since sample 6 has a high Ce concentration, thermal dispersion in the phosphor layer cannot be performed efficiently, and temperature quenching occurs at 3W. Therefore, high-energy excitation sources cannot be used. Samples 7 to 9 have a Ce concentration in an appropriate range, so the heat dispersion in the phosphor layer is improved, and the laser input at the peak and the luminous intensity at the peak are improved. In addition, the relative value of the luminous efficiency was also maintained at 40 or more with respect to the sample 6 which is a reference of the transmission type. Since the sample 10 has a low Ce concentration, although the laser input at the peak and the luminous intensity at the peak are increased, the relative value of the luminous efficiency is lower than 35. The reason why the relative value of the luminous efficiency of the transmissive sample 10 becomes lower than that of the reflective sample 5 is considered to be because, in the case of the reflective type, when the light source light that was not originally absorbed by the phosphor particles is reflected back, Absorbed by phosphor particles.

試料11、12及13、14係分別為透射型的波長轉換構件,且使用YAG:Ce粒子作為螢光體粒子,基材的厚度及Ce濃度設為一定,而使螢光體層的膜厚改變之試料。試料11由於膜厚薄,故發光效率降低。這是因為當膜厚過薄時,有助於發光的螢光體會減少的緣故。試料14由於膜厚相對於基材的厚度為4分之1以上,故峰值時的雷射輸入降低。此可認為是因為螢光體層變太厚,故基材的厚度相對於螢光體層的厚度之比例不足,螢光體層內的熱未有效率地藉基材放熱的緣故。 Samples 11, 12, 13, and 14 are transmission-type wavelength conversion members, and YAG: Ce particles are used as the phosphor particles. The thickness of the substrate and the Ce concentration are fixed to change the film thickness of the phosphor layer. Of the sample. Since the sample 11 has a thin film thickness, the luminous efficiency is reduced. This is because when the film thickness is too thin, the phosphors that contribute to light emission are reduced. Since the sample thickness of the sample 14 is at least one-fourth of the thickness of the base material, the laser input at the peak is reduced. This is considered to be because the phosphor layer became too thick, so the ratio of the thickness of the substrate to the thickness of the phosphor layer was insufficient, and the heat in the phosphor layer did not efficiently radiate heat from the substrate.

試料15、16為反射型的波長轉換構件,且使用YAG:Ce粒子作為螢光體粒子,Ce濃度設為一定,基材的厚度設為比試料1~5厚之後,使螢光體層的膜厚改變之試料。關於試料15,由於螢光體層的膜厚及基材的厚度與螢光體層的膜厚之比係在適當範圍,故結果均滿足基準。關於試料16,基材的厚度與螢光體層的膜厚 之比雖在適當範圍,但因螢光體層的膜厚太厚,所以峰值時的雷射輸入及峰值時的發光強度未滿足基準。這被認為是因為當膜厚太厚時,會產生超過Ce濃度的變更所致之螢光體層內之熱分散的效果之熱,螢光體層本身的放熱性降低,熱充滿於螢光體層。 Samples 15 and 16 are reflective wavelength conversion members, and YAG: Ce particles are used as the phosphor particles. The Ce concentration is constant, and the thickness of the substrate is 1 to 5 thicker than that of the sample. Then, the film of the phosphor layer is formed. Thick change sample. Regarding Sample 15, the film thickness of the phosphor layer and the ratio of the thickness of the base material to the film thickness of the phosphor layer are in a proper range, so the results all meet the criteria. Regarding Sample 16, although the ratio of the thickness of the base material to the film thickness of the phosphor layer was in an appropriate range, the film thickness of the phosphor layer was too thick, so the laser input at the peak and the light emission intensity at the peak did not meet the reference. This is considered to be because when the film thickness is too thick, heat exceeding the effect of thermal dispersion in the phosphor layer due to a change in Ce concentration is generated, the exothermic property of the phosphor layer itself is reduced, and the phosphor layer is filled with heat.

試料17~20為反射型的波長轉換構件,使用LuAG:Ce粒子作為螢光體粒子,基材的厚度及螢光體層的膜厚設為一定,使Ce濃度改變之試料。即便使用LuAG:Ce粒子,也與使用YAG:Ce粒子時同樣,為適當範圍的Ce濃度時,會提升螢光體層內之熱的分散性,會提升峰值時的雷射輸入及峰值時的發光強度。又,發光效率的相對值相對於成為反射型的基準之試料1亦維持在40以上。 Samples 17 to 20 are reflective wavelength conversion members, and LuAG: Ce particles are used as the phosphor particles. The thickness of the substrate and the film thickness of the phosphor layer are set to be constant, so that the Ce concentration is changed. Even when using LuAG: Ce particles, the same as when using YAG: Ce particles, when the Ce concentration is in a proper range, the heat dispersion in the phosphor layer will be improved, and the laser input at the peak and the light emission at the peak will be improved strength. In addition, the relative value of the luminous efficiency was also maintained at 40 or more with respect to the sample 1 which is a reference for reflection.

由以上的結果得知,本發明的波長轉換構件,在高功率的用途下,不易產生因溫度淬滅所致之性能降低,能夠以少能量獲得多的發光量。 From the above results, it is understood that the wavelength conversion member of the present invention is less likely to suffer from performance degradation due to temperature quenching in high-power applications, and can obtain a large amount of light with a small amount of energy.

Claims (5)

一種波長轉換構件,係具備基材與設置於前述基材上的螢光體層且將特定範圍波長的光轉換成其他波長的光,其特徵為:前述螢光體層的厚度為200μm以下且為前述螢光體層之積層方向的前述基材的厚度的4分1以下,前述螢光體層係由透光性的無機材料以及與前述無機材料結合的螢光體粒子所形成,前述螢光體粒子的材料為YAG:Ce或LuAG:Ce中任一者,前述螢光體粒子的Ce濃度為0.03at%以上0.60at%以下。     A wavelength conversion member comprising a base material and a phosphor layer provided on the base material and converting light of a specific range of wavelengths into light of other wavelengths, characterized in that the thickness of the phosphor layer is 200 μm or less and is the aforementioned The thickness of the base material in the lamination direction of the phosphor layer is less than 4 minutes 1; the phosphor layer is formed of a translucent inorganic material and phosphor particles combined with the inorganic material. The material is either YAG: Ce or LuAG: Ce, and the Ce concentration of the phosphor particles is 0.03 at% or more and 0.60 at% or less.     如請求項1之波長轉換構件,其中前述螢光體層的厚度為10μm以上,前述螢光體粒子的Ce濃度為0.12at%以上。     The wavelength conversion member according to claim 1, wherein the thickness of the phosphor layer is 10 μm or more, and the Ce concentration of the phosphor particles is 0.12 at% or more.     如請求項1或2之波長轉換構件,其中前述基材係由藍寶石形成。     The wavelength conversion member according to claim 1 or 2, wherein the aforementioned substrate is formed of sapphire.     如請求項1或2之波長轉換構件,其中前述基材係由鋁形成。     The wavelength conversion member according to claim 1 or 2, wherein the aforementioned substrate is formed of aluminum.     一種發光裝置,其係具備產生特定範圍波長的光源光之光源,其特徵為:具備如請求項1至4中任一項之波長轉換構件,以將前述光源光吸收且轉換成其他波長的光而發光。     A light-emitting device is provided with a light source that generates light source light of a specific range of wavelengths, and is characterized by having a wavelength conversion member according to any one of claims 1 to 4 to absorb and convert the light from the light source into light of other wavelengths While glowing.    
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