TW201920390A - Polymer thin film, film-form laminate, and method for producing polymer thin film - Google Patents

Polymer thin film, film-form laminate, and method for producing polymer thin film Download PDF

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TW201920390A
TW201920390A TW107129075A TW107129075A TW201920390A TW 201920390 A TW201920390 A TW 201920390A TW 107129075 A TW107129075 A TW 107129075A TW 107129075 A TW107129075 A TW 107129075A TW 201920390 A TW201920390 A TW 201920390A
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film
polymer
polymer film
norbornene
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TWI784041B (en
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平野千春
宮田壮
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日商琳得科股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C41/00Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
    • B29C41/02Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of definite length, i.e. discrete articles
    • B29C41/12Spreading-out the material on a substrate, e.g. on the surface of a liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/02Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings
    • C08F232/04Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings having one carbon-to-carbon double bond
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L45/00Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2345/00Characterised by the use of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Derivatives of such polymers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Laminated Bodies (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Moulding By Coating Moulds (AREA)

Abstract

This polymer thin film is characterized by containing a norbornene polymer (A) containing at least 10 mol% of a constituent unit represented by general formula (1), having a thickness of 10 nm to 1000 nm, and having self-supporting properties. (In general formula (1), X1 and X2 may be the same or different, and may respectively represent a hydrogen atom, a halogen atom, an optionally substituted alkyl group, an optionally substituted alkoxy group, an optionally substituted alkenyl group, a hydroxyl group, or a carboxyl group, and X1 and X2 may be bonded to one another to form a ring).

Description

高分子薄膜、膜狀層合體以及高分子薄膜的製造方法Polymer film, film-like laminate, and method for manufacturing polymer film

本發明有關高分子薄膜、膜狀層合體以及高分子薄膜的製造方法。The present invention relates to a polymer film, a film-like laminate, and a method for producing a polymer film.

由環狀烯烴系樹脂所成之膜已作為例如膜冷凝器(film condenser)用之介電體膜使用。   例如文獻1(日本特開2015-183181號公報)文獻中,記載以樹脂為主成分之高絕緣性膜。該高絕緣性膜中,前述樹脂係非晶性樹脂。且,將前述高絕緣性膜之面方向中折射率最小值設為Ny,將前述高絕緣性膜之面方向中與前述Ny正交之方向的折射率設為Nx,將前述高絕緣性膜之厚度設為d時,以下述式1表示之延遲(R)為10nm以下。   R=(Nx-Ny)・d (式1)   關於文獻文獻樹脂膜,厚度若為數十至數百nm之範圍,則有藉由靜電力及濡濕性,即使不使用接著劑等,亦可對被接著物密著之情況。   然而,文獻1中記載之高絕緣性膜對於被接著物無法密著。且,文獻1中,雖有記載平均厚度較好為0.5μm以上7.0μm以下,但依文獻1中記載之高絕緣性膜的製造方法,無法將膜厚度作成奈米等級。且文獻1中,例如雖對藉由溶液澆鑄法製作之膜實施延伸處理,但藉由該方法,亦無法使膜厚度成為奈米等級。A film made of a cyclic olefin-based resin has been used as, for example, a dielectric film for a film condenser. For example, Document 1 (Japanese Patent Application Laid-Open No. 2015-183181) document describes a highly insulating film mainly composed of a resin. In this highly insulating film, the resin-based amorphous resin is used. Further, the minimum refractive index in the plane direction of the highly insulating film is set to Ny, the refractive index in a direction orthogonal to the Ny in the plane direction of the highly insulating film is set to Nx, and the highly insulating film is When the thickness is d, the retardation (R) represented by the following formula 1 is 10 nm or less. R = (Nx-Ny) ・ d (Equation 1) About the literature, if the thickness of the resin film is in the range of several tens to several hundreds of nm, there are electrostatic forces and wettability, even without using an adhesive, etc. In the case of adherence to the adherend. However, the highly insulating film described in Document 1 cannot adhere to the adherend. In addition, although Document 1 states that the average thickness is preferably 0.5 μm or more and 7.0 μm or less, according to the method for manufacturing a highly insulating film described in Document 1, the film thickness cannot be made into a nanometer grade. Further, in Document 1, for example, although a film produced by a solution casting method is subjected to an extension treatment, by this method, the film thickness cannot be made into a nanometer grade.

本發明之目的在於提供不使用接著劑等,亦可對被接著物密著,且具有高撥水性之高分子薄膜、膜狀層合體及高分子薄膜的製造方法。   依據本發明之一態樣,提供一種高分子薄膜,其特徵為包含含有10mol%以上之下述通式(1)表示之構成單位的降冰片烯系聚合物(A),厚度為10nm以上1000nm以下,且具有自我支撐性。   又,下述通式(1)中,X1 及X2 為相同或不同,分別表示氫原子、鹵原子、經取代或無取代之烷基、經取代或無取代之烷氧基、經取代或無取代之烯基、羥基或羧基,X1 及X2 亦可互相結合形成環。前述本發明之一態樣中,較好前述降冰片烯系聚合物(A)係降冰片烯系共聚物。   前述本發明之一態樣中,較好前述高分子薄膜含有50質量%以上之前述降冰片烯系聚合物(A)。   前述本發明之一態樣中,較好前述降冰片烯系聚合物(A)之玻璃轉移點為140℃以下。   前述本發明之一態樣中,較好前述降冰片烯系聚合物(A)於溫度260℃、荷重2.16kgf下之熔融流動速率為20g/10min以上。   前述本發明之一態樣中,較好前述高分子薄膜之表面碳濃度為90原子%以上。   依據本發明之一態樣,提供一種膜狀層合體,其特徵係具備工程膜與形成於前述工程膜上之前述本發明一態樣之高分子薄膜。   前述本發明之一態樣中,較好前述工程膜之表面自由能為40mJ/m2 以下。   前述本發明之一態樣中,較好前述工程膜之表面算術平均粗糙度為40nm以下。   依據本發明之一態樣,提供一種高分子薄膜之製造方法,其係製造前述本發明一態樣之高分子薄膜者,其特徵為具備下述步驟:於工程膜上塗佈包含前述降冰片烯系聚合物(A)之高分子薄膜形成用溶液,並乾燥,形成前述高分子薄膜之步驟,及自前述工程膜剝離前述高分子薄膜之步驟。   前述本發明之一態樣中,較好前述工程膜之表面自由能為40mJ/m2 以下。   前述本發明之一態樣中,較好前述工程膜之表面算術平均粗糙度為40nm以下。   依據本發明,可提供不使用接著劑等,亦可對被接著物密著,且具有高撥水性之高分子薄膜、膜狀層合體及高分子薄膜的製造方法。An object of the present invention is to provide a polymer film, a film-like laminate, and a polymer film having high water repellency, which can be adhered to an adherend without using an adhesive or the like. According to one aspect of the present invention, there is provided a polymer film characterized by comprising a norbornene polymer (A) containing a constituent unit represented by the following general formula (1) in an amount of 10 mol% or more, and having a thickness of 10 nm or more and 1000 nm or less. Below, and self-supporting. In the following general formula (1), X 1 and X 2 are the same or different and each represents a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, or a substituted Or unsubstituted alkenyl, hydroxyl or carboxyl group, X 1 and X 2 may be combined with each other to form a ring. In one aspect of the present invention, the norbornene-based polymer (A) -based norbornene-based copolymer is preferable. In one aspect of the present invention, the polymer film preferably contains the norbornene-based polymer (A) in an amount of 50% by mass or more. In one aspect of the present invention, the glass transition point of the norbornene-based polymer (A) is preferably 140 ° C or lower. In one aspect of the present invention described above, the melt flow rate of the norbornene-based polymer (A) at a temperature of 260 ° C and a load of 2.16 kgf is preferably 20 g / 10 min or more. In one aspect of the present invention, the surface carbon concentration of the polymer film is preferably 90 atomic% or more. According to an aspect of the present invention, there is provided a film-like laminate, which is characterized by comprising an engineering film and the polymer film of the aforementioned aspect of the present invention formed on the aforementioned engineering film. In one aspect of the present invention, the surface free energy of the engineered film is preferably 40 mJ / m 2 or less. In one aspect of the present invention, it is preferred that the arithmetic mean roughness of the surface of the engineering film is 40 nm or less. According to one aspect of the present invention, a method for manufacturing a polymer film is provided. The method for manufacturing the polymer film according to one aspect of the present invention is characterized by having the following steps: coating the engineering film with the aforementioned norborneol A solution for forming a polymer film of the olefin polymer (A), and drying to form the polymer film; and a step of peeling the polymer film from the engineering film. In one aspect of the present invention, the surface free energy of the engineered film is preferably 40 mJ / m 2 or less. In one aspect of the present invention, it is preferred that the arithmetic mean roughness of the surface of the engineering film is 40 nm or less. According to the present invention, it is possible to provide a polymer film, a film-like laminate, and a polymer film having high water repellency without using an adhesive or the like, and which can be adhered to an adherend.

以下針對本發明舉實施形態為例,基於圖式予以說明。本發明不限定於實施形態之內容。又,圖式中,為了容易說明,而有放大或縮小加以圖示之部分。 [高分子薄膜]   本實施形態之高分子薄膜1,如圖1所示,係具有自我支撐性之薄膜。又,本說明書中所謂「自我支撐性」係指高分子薄膜1未層合於其他支撐體時,高分子薄膜1單獨可形成膜之性質,更具體而言,可說為膜強度為5mN/1mmφ以上。有,針對具有「自我支撐性」之膜,膜強度較好為10mN/1mmφ以上,更好為20mN/1mmφ以上。膜強度可藉由蠕變計(creep meter)(例如山電股份有限公司製的商品名「Creepmeter RE2-3305CYAMADEN」)測定。具體而言,可藉由後述實施例記載之方法測定。   高分子薄膜1之厚度必須為10nm以上1000nm以下。高分子薄膜1之厚度為10nm以上1000nm以下時,不使用接著劑等,即可貼合於皮膚等之期望被接著物。高分子薄膜1之厚度可藉由J.A. Woollam公司製之分光橢圓偏振儀(製品名「M-2000」)測定。   高分子薄膜1之厚度較好為30nm以上,更好為50nm以上,又更好為100nm以上,特佳為150nm以上。且,高分子薄膜1之厚度較好為900nm以下,更好為700nm以下,又更好為550nm以下,特佳為400nm以下。   基於撥水性之觀點,高分子薄膜1之表面碳濃度較好為90原子%以上,更好為95原子%以上,特佳為99原子%以上。表面碳濃度可藉由X射線光電子分光分析法(XPS)測定。   高分子薄膜1必須包含含有10mol%以上之下述通式(1)表示之構成單位的降冰片烯系聚合物(A)。降冰片烯系聚合物(A)未含有10mol%以上之下述通式(1)表示之構成單位時,無法獲得於期望厚度具有自我支撐性且具有高撥水性之高分子薄膜。高分子薄膜1中所佔之下述通式(1)表示之構成單位含量較好為20mol%以上,更好為50mol%以上。前述通式(1)中,X1 及X2 為相同或不同,分別表示氫原子、鹵原子、經取代或無取代之烷基、經取代或無取代之烷氧基、經取代或無取代之烯基、羥基或羧基,X1 及X2 亦可互相結合形成環。   作為烷基、烷氧基及烯基之取代基,舉例為鹵原子、羥基、羧基、丙烯醯基、甲基丙烯醯基及環氧基等。   烷基之碳數較好為1至5,更好為1至3。烷氧基之碳數較好為1至5,更好為1至3。烯基之碳數較好為2至5,更好為2至3。 (降冰片烯系聚合物(A))   降冰片烯系聚合物(A)只要含有10mol%之上述通式(1)表示之構成單位即可,可為降冰片烯系均聚物,亦可為降冰片烯系共聚物。   該降冰片烯系聚合物(A)係以降冰片烯系化合物為單體之至少一種的聚合物。   作為降冰片烯系化合物舉例為降冰片烯(雙環[2.2.1]庚-2-烯)、具有包含降冰片烯相關之雙環的環狀構造之化合物(例如二環戊二烯)及該等之衍生物。該等可單獨使用1種,亦可混合2種以上使用。   作為降冰片烯系化合物以外之單體,舉例為環戊二烯及四環十二碳烯等。該等可單獨使用1種,亦可混合2種以上使用。   藉由將降冰片烯系化合物設為單體之至少一種,使單體聚合所得之聚合物(均聚物或共聚物)具有前述通式(1)表示之構成單位。   作為降冰片烯系聚合物(A)舉例有降冰片烯系單體之開環複分解聚合物氫化聚合物(具體為以日本ZEON股份有限公司製ZEONEX(註冊商標)系列取得)、降冰片烯與乙烯之共聚物(具體為以POLYPLASTIC股份有限公司製TOPAS(註冊商標)系列取得)、基於二環戊二烯與四環戊十二碳烯之開環聚合的共聚物(具體為以日本ZEON股份有限公司製ZEONOR(註冊商標)系列取得)、乙烯與四環十二碳烯之共聚物(具體為以三井化學股份有限公司製APEL(註冊商標)系列取得)、以及以二環戊二烯及甲基丙烯酸酯為原料之含有極性基之環狀烯烴樹脂(具體為以JSR股份有限公司製ARTON(註冊商標)系列取得)等。該等可單獨使用1種,亦可混合2種以上使用。   降冰片烯系聚合物(A)可具有交聯構造。此處,造成交聯構造之交聯劑種類為任意。作為該交聯劑,舉例為有機過氧化物(例如二異丙苯基過氧化物等)及具有環氧基之化合物等。該等可單獨使用1種,亦可混合2種以上使用。   交聯劑可於構成降冰片烯系聚合物(A)之高分子之一種類彼此間交聯,亦可於不同種類高分子間交聯。交聯劑之結合部位亦為任意。亦可與構成降冰片烯系聚合物(A)之高分子中之構成主鏈之原子交聯,亦可與側鏈或官能基等之構成主鏈以外之原子交聯。交聯程度亦為任意,但交聯程度過度進行時,由於有包含降冰片烯系聚合物(A)之高分子薄膜1之加工性(尤其成形性)過度降低,高分子薄膜1之表面性狀過度劣化,高分子薄膜1之耐脆性降低之顧慮,故應侷限在不發生此等問題之範圍。   降冰片烯系聚合物(A)具備熱塑性。該熱塑性程度可以表示熔融時之黏度的熔融流動速率(MFR)表示。   降冰片烯系聚合物(A)於溫度260℃、荷重2.16kgf下之熔融流動速率(MFR)較好為20g/10min以上,更好為20g/10min以上,150g/10min以下,特佳為25g/10min以上,50g/10min以下。MFR若為前述範圍內,則熱塑性可充分提高,可提高成形等之加工性。MFR可依據ASTM D1238之記載測定。   降冰片烯系聚合物(A)之玻璃轉移點,基於高分子薄膜形成用溶液之塗佈性之觀點,較好為140℃以下,更好為30℃以上120℃以下。玻璃轉移點若為140℃以下,則更提高溶劑可溶性,另一方面,玻璃轉移點若為30℃以上,則即使於室溫亦具有自力膜形成能力。玻璃轉移點可使用示差掃描熱量計測定。例如使用示差掃描熱量計(TA Instruments公司製之「DSC(Q2000)」),以升溫速度10℃/min,自-40℃至200℃之溫度範圍實施測定,作成圖表,自該圖表確認拐點,可求出玻璃轉移點。 (降冰片烯系聚合物(A)以外之烯烴系聚合物(B))   高分子薄膜1亦可包含降冰片烯系聚合物(A)以外之烯烴系聚合物(B)(以下依情況稱為「非NB烯烴系聚合物(B)」)。   使用非NB烯烴系聚合物(B)時,基於自我支撐性及撥水性之觀點,降冰片烯系聚合物(A)含量,以聚合物總量基準,較好為50質量%以上,更好為70質量%以上,特佳為90質量%以上。   非NB烯烴系聚合物(B)可為直鏈狀,亦可具有側鏈。且,非NB烯烴系聚合物(B)只要不包含降冰片烯環亦可具有任何官能基,其種類及取代密度為任意。可為如烷基之反應性低的官能基,亦可為如羧酸基之反應性高的官能基。   非NB烯烴系聚合物(B)為將烯烴設為單體之至少一種的烯烴系聚合物,係不具有降冰片烯系化合物作為單體之烯烴系聚合物。因此,非NB烯烴系聚合物(B)只要於高分子中不含有降冰片烯環,則未特別限制,可為芳香族環式聚烯烴,亦可為非環式聚烯烴。作為芳香族環式聚烯烴,舉例為以具有芳香族環之環狀構造的烯烴作為單體之至少一種的聚烯烴。非NB烯烴系聚合物(B)可為均聚物,亦可為共聚物。 (被接著物)   高分子薄膜1即使不使用接著劑等,亦可對於被接著物密著。此處,作為被接著物,並未特別限定,但可舉例不鏽鋼、聚乙烯、聚丙烯、聚碳酸酯、玻璃、PTFE(聚四氟乙烯)、PVDF(聚偏氟化乙烯)及半導體電路基板等。藉由將該等作為被接著物,可簡便地對任意被接著物賦予撥水性。且,作為上述以外之被接著物,舉例為人、動物、衣類、帽子、鞋子及裝飾品等。以該等作為被接著物時,高分子薄膜1由於非常薄,故貼附部位不顯眼,且為輕量故而較佳。   又,高分子薄膜1由於具有高的撥水性,故對汗或雨等具有耐性。因此,高分子薄膜1可特別較好地使用於作為將穿戴終端等密著於皮膚等之膜。 [高分子薄膜之製造方法]   本實施形態之高分子薄膜之製造方法係製造高分子薄膜1之高分子薄膜的製造方法。因此,本實施形態之高分子薄膜之製造方法係具備下述步驟之方法:於工程膜上塗佈包含前述降冰片烯系聚合物(A)之高分子薄膜形成用溶液,並乾燥,形成前述高分子薄膜之步驟(高分子薄膜形成步驟),及自前述工程膜剝離前述高分子薄膜之步驟(剝離步驟)。 (高分子薄膜形成步驟)   圖2係顯示本實施形態之高分子薄膜之製造方法所用之工程膜2的剖面概略圖。工程膜2具有第一面2A及第二面2B。   高分子薄膜形成步驟中,如圖2所示之工程膜的第一面2A及第二面2B中,於第一面2A上,塗佈包含前述降冰片烯系聚合物(A)之高分子薄膜形成用溶液,並乾燥,形成高分子薄膜1,獲得如圖3所示之膜狀層合體100。   此處,針對高分子薄膜形成步驟所用之工程膜及高分子薄膜形成用溶液加以說明。 (工程膜)   作為工程膜2並未特別限制。例如基於處理容易之觀點,工程膜2較好具備剝離基材21及形成於剝離基材21之至少一面上之剝離劑層22。本實施形態中,剝離劑層22之表面相當於第一面2A,與剝離基材21之形成有剝離劑層22之面相反側之面相當於第二面2B。   作為剝離基材21,舉例為例如紙基材、於該紙基材上層合聚乙烯等之熱塑性樹脂而成之層合紙、以及塑膠膜等。   作為紙基材舉例為玻璃紙、上等紙、銅版紙及塗料紙等。作為塑膠膜舉例為例如聚酯膜(例如聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯及聚萘二甲酸乙二酯等),以及聚烯烴膜等(例如聚丙烯及聚乙烯等)。該等可單獨使用1種,亦可組合2種以上使用。   剝離劑層22亦可塗佈剝離劑而形成。作為剝離劑舉例為例如烯烴系樹脂、橡膠系彈性體(例如丁二烯系樹脂、異戊二烯系樹脂等)、長鏈烷基系樹脂、醇酸系樹脂、氟系樹脂及聚矽氧系樹脂。該等中,作為剝離劑較好為選自烯烴系樹脂、橡膠系彈性體(例如丁二烯系樹脂、異戊二烯系樹脂等)、長鏈烷基系樹脂、醇酸系樹脂及氟系樹脂所成之群中選擇之任一種剝離劑。該等可單獨使用1種,亦可組合2種以上使用。剝離劑層亦可進而含有抗靜電劑,亦可未含有抗靜電劑。   工程膜2較好藉由剝離劑層22,調整第一面2A之表面自由能及算術平均粗糙度。   工程膜2之第一面2A之表面自由能較好為40mJ/m2 以下,更好為20mJ/m2 以上40mJ/m2 以下。表面自由能若為20mJ/m2 以上,則於工程膜2上可良好地塗佈高分子薄膜形成用溶液,且表面自由能若為40mJ/m2 以下,則容易自工程膜2剝離高分子薄膜1,可提高生產性。表面自由能可測定各種液滴之接觸角(測定溫度:25℃),以其值為基礎藉由北崎・畑理論求得。   工程膜2之第一面2A的表面算術平均粗糙度(Ra)較好為40nm以下,更好為0.1nm以上30nm以下,特佳為0.5nm以上25nm以下。表面算術平均粗糙度若為前述範圍內,則可充分抑制形成於高分子薄膜1之凹凸,可提高高分子薄膜1之膜強度。算術平均粗糙度例如可使用Veeco Instruments公司製之光干涉顯微鏡NT1100測定。   工程膜2之厚度並未特別限定。工程膜2之厚度通常為20μm以上200μm以下,較好為25μm以上150μm以下。   剝離劑層22之厚度並未特別限定。於剝離基材上塗佈包含剝離劑之溶液形成剝離劑層22時,剝離劑層22之厚度較好為0.01μm以上2.0μm以下,更好為0.03μm以上1.0μm以下。   使用塑膠膜作為剝離基材21時,該塑膠膜之厚度較好為3μm以上50μm以下,更好為5μm以上90μm以下,特佳為10μm以上40μm以下。 (高分子薄膜形成用溶液)   高分子薄膜形成用溶液中作為溶質之高分子薄膜形成用的材料物質為降冰片烯系聚合物(A)。又,作為該材料物質亦可進而使用非NB烯烴系聚合物(B)。降冰片烯系聚合物(A)及非NB烯烴系聚合物(B)由於已予說明,故省略。   作為高分子薄膜形成用溶液之溶劑種類,若為可使高分子薄膜形成用的材料物質溶解或均一分散,且可藉由加熱蒸發之溶劑,則未特別限定。例如作為溶劑較好使用乙醇、丙醇、異丙醇、丙酮、甲苯、環己酮、乙酸乙酯、乙酸丁酯、四氫呋喃、甲基乙基酮、二氯甲烷及氯仿等。該等可單獨使用1種,亦可組合2種以上使用。   又,作為溶劑之沸點,較好設為30℃以上160℃以下之範圍內之值,更好為35℃以上120℃以下之範圍內之值。   又,高分子薄膜形成用溶液中的材料物質濃度較好設為0.1質量%以上20質量%以下之範圍內之值。   高分子薄膜形成用溶液中的材料物質濃度若為0.1質量%以上,則可抑制有無法獲得必要厚度之情況的缺點及無法使溶液黏度成最適之缺點。另一方面,高分子薄膜形成用溶液中的材料物質之濃度若為20質量%以下,則可抑制無法獲得均一塗膜之情況的缺點。   又,由上述觀點,高分子薄膜形成用溶液中的材料物質濃度更好設為0.3質量%以上15質量%以下之範圍內之值,又更好設為0.5質量%以上10質量%以下之範圍內之值。   且,高分子薄膜形成用溶液之黏度(測定溫度:25℃)較好設為1mPa・s以上500mPa・s以下之範圍內之值。   高分子薄膜形成用溶液之黏度若為1mPa・s以上,則可抑制塗膜發生不均之缺點。另一方面,高分子薄膜形成用溶液之黏度若為500mPa・s以下,則可抑制無法獲得均一塗膜之缺點。   且,基於上述觀點,高分子薄膜形成用溶液之黏度(測定溫度:25℃)更好設為1.5mPa・s以上400mPa・s以下之範圍內之值,又更好設為2mPa・s以上300mPa・s以下之範圍內之值。   又,高分子薄膜形成用溶液之黏度係依據JIS K7117-1之4.1(布魯克菲爾德型旋轉黏度計)測定者。   又,對形成於工程膜2上之高分子薄膜形成用溶液的塗佈層,用以成為高分子薄膜1之乾燥條件並未特別限定。塗佈層之乾燥較好以40℃以上120℃以下之溫度條件且6秒以上300秒以下之乾燥時間進行。   乾燥溫度若為40℃以上,則可抑制乾燥過於耗費時間或乾燥不足之缺點。另一方面,乾燥溫度若為120℃以下,則可抑制產生起皺或捲曲之缺點。   又,乾燥時間若為6秒以上,則可防止乾燥不足之缺點。另一方面,乾燥時間若為300秒以下,則可抑制產生起皺或捲曲之缺點。   又,基於上述觀點,對高分子薄膜形成用溶液的塗佈層用以成為高分子薄膜1之乾燥條件,更好設為50℃以上110℃以下之溫度條件且12秒以上180秒以下之乾燥時間,又更好設為60℃以上100℃以下之溫度條件且18秒以上120秒以下之乾燥時間。   又,高分子薄膜形成用溶液的塗佈較好藉由輥對輥(Roll to Roll)法進行。   其理由係若為輥對輥法,則可更有效率地形成具有特定厚度之高分子薄膜1,故而可更有效率地大量生產膜狀層合體100之故。   又,實施輥對輥法時,作為塗佈裝置,較好為棒塗佈器、凹版塗佈器或模嘴塗佈器,更好為逆凹版塗佈器或狹縫模嘴塗佈器。   其理由係若為該等塗佈裝置,則可更有效率地形成具有特定厚度之高分子薄膜1之故。   亦即,若為棒塗佈器、逆凹版塗佈器及狹縫模嘴塗佈器,則可不於表面產生皺紋且以均一厚度形成奈米等級厚之高分子薄膜1。而且,棒塗佈器、逆凹版塗佈器及狹縫模嘴塗佈器除了其構造簡單以外,經濟性亦優異。 (剝離步驟)   剝離步驟中,自工程膜2剝離圖3所示之膜狀層合體100之高分子薄膜1,獲得具有自我支撐性之高分子薄膜1。   剝離步驟中工程膜2之自高分子薄膜1之剝離力較好為5mN/20mm以上、100mN/20mm以下,更好為10mN/20mm以上、50mN/20mm以下,特佳為15mN/20mm以上、30mN/20mm以下。   上述剝離力若為5mN/20mm以上,則高分子薄膜形成步驟中,可抑制工程膜與高分子薄膜容易剝落之缺點。又,上述剝離力若為100mN/20mm以下,則剝離步驟中,可抑制工程膜不易自高分子薄膜剝離或高分子薄膜破裂之缺點。   上述剝離力例如可藉由變更工程膜2所用之剝離劑種類而調整。 [膜狀層合體]   本實施形態之膜狀層合體100係如圖3所示,具備高分子薄膜1與工程膜2。該膜狀層合體100係藉由於工程膜2上塗佈前述高分子薄膜形成用溶液,使塗佈層乾燥,形成高分子薄膜1而獲得。亦即,該膜狀層合體100可藉由前述本實施形態之高分子薄膜之製造方法中之高分子薄膜形成步驟而獲得。 (本實施形態之作用效果)   依據本實施形態,可發揮如下作用效果。   (1)可效率良好地製造包含含有10mol%以上之前述通式(1)表示之構成單位的降冰片烯系聚合物(A),厚度為10nm以上1000nm以下,且具有自我支撐性之高分子薄膜1。   (2)可提供即使不使用接著劑等,亦可對於被接著物密著,且具有高撥水性之高分子薄膜1。 [實施形態之變化]   本實施形態不限定於前述實施形態,在可達成本實施形態目的之範圍內的變化、改良等包含於本實施形態。   例如,前述實施形態中,雖使用具備剝離基材21及剝離劑層22之工程膜2,但不限定於此。例如於剝離基材21之表面自由能及表面算術平均粗糙度在適當範圍內時,亦可使用由剝離基材21所成之單層膜作為工程膜2。 實施例   以下列舉實施例進一步詳細說明本發明,但本發明絕非限定於該等實施例。 [試驗例1] 1.工程膜之選定 (1)工程膜之製造   試驗例1之工程膜具有剝離基材與設於剝離基材上之剝離劑層。   將聚矽氧改性醇酸樹脂與胺基樹脂之混合物(信越化學工業股份有限公司製:商品名「KS-882」) 100重量份與對-甲苯磺酸(硬化劑) 1重量份以甲苯稀釋,調製固形分濃度2質量%之塗佈液。   其次,於厚38μm之聚對苯二甲酸乙二酯(PET)膜(三菱化學股份有限公司製之「DIAFOIL T100」)上以馬亞棒塗佈所得塗佈液,於140℃、60秒加熱並乾燥,獲得形成有平均厚0.1μm之剝離劑層的工程膜。接著,所得工程膜之剝離劑層表面之表面自由能及算術平均粗糙度示於表1。 (2)高分子薄膜形成用溶液之調製   將環狀烯烴共聚物(三井化學股份有限公司製之「APEL6011T」、玻璃轉移點105℃、MFR 26g/10min)之溶液(固形分10質量%)以甲苯溶解,稀釋至固形分3質量%,製作高分子薄膜形成用溶液。 (3)膜狀層合體之形成   其次,使用逆凹版塗佈器,於準備好的工程膜上以使乾燥後之高分子薄膜厚度成為800nm之方式塗佈高分子薄膜形成用溶液後,於100℃乾燥60秒,獲得膜狀層合體。 2.測定・評價 (1)工程膜之表面自由能之測定   工程膜中之塗佈高分子薄膜形成用溶液之面(與高分子薄膜之接觸面)之表面自由能(mJ/m2 )係測定各種液滴之接觸角(測定溫度:25℃),以該值為基礎藉由北崎・畑理論求得。   亦即,將使用作為「分散成分」之二碘甲烷,作為「偶極成分」之1-溴萘,作為「氫鍵結成分」之蒸餾水作為液滴,使用協和界面科學(股)製之DM-70,藉由靜滴法,依據JIS R3257測定接觸角(測定溫度:25℃),以該值為基礎藉由北崎・畑理論求得表面自由能(mJ/m2 )。 (2)工程膜之算術平均粗糙度Ra之測定   剝離薄片中之塗佈高分子薄膜形成用溶液之面(與高分子薄膜之接觸面)之算術平均粗糙度Ra(nm)係使用Veeco Instruments公司製之光干涉顯微鏡NT1100,針對250,000μm2 (500μm×500μm)之區域進行觀察,求出算術平均粗糙度(Ra)。 (3)高分子薄膜形成用溶液對工程膜之塗佈性   評價形成膜狀層合體時之塗佈性。高分子薄膜形成用溶液可對於工程膜均一塗佈時判定為「A」,於工程膜發生不均等而無法均一塗佈時判定為「B」。所得結果示於表1。 (4)高分子薄膜之剝離性   評價膜狀層合體中自工程膜剝離高分子薄膜時之剝離性。容易自工程膜剝離高分子薄膜時判定為「A」,高分子薄膜破裂無法剝離時判定為「B」。所得結果示於表1。 [試驗例2]   試驗例2中,除了作為工程膜使用聚對苯二甲酸乙二酯膜(三菱化學股份有限公司製之「DIAFOIL T100」,厚38μm)以外,藉與試驗例1同樣方法,製造膜狀層合體及高分子薄膜,並評價。所得結果示於表1。且,試驗例2所用之工程膜表面的表面自由能及算術平均粗糙度示於表1。 [試驗例3]   試驗例3中,除了作為工程膜使用LINTEC股份有限公司製之「SP-PET381031」)以外,藉與試驗例1同樣方法,製造膜狀層合體及高分子薄膜,並評價。所得結果示於表1。且,試驗例3所用之工程膜之剝離劑層表面的表面自由能及算術平均粗糙度示於表1。 [試驗例4]   試驗例4中,除了作為工程膜使用LINTEC股份有限公司製之「SP-PET38T100X」)以外,藉與試驗例1同樣方法,製造膜狀層合體及高分子薄膜,並評價。所得結果示於表1。且,試驗例4所用之工程膜之剝離劑層表面的表面自由能及算術平均粗糙度示於表1。如由表1所示之結果所了解,可知使用含有環狀烯烴共聚物之高分子薄膜形成用溶液時,較好使用試驗例1所用之工程膜。因此,以下實施例及比較例中,使用試驗例1所用之工程膜。 [實施例1] 1.高分子薄膜之製造 (1)工程膜之製造   實施例1之工程膜具有基材及設於基材上之剝離劑層。   將聚矽氧改性醇酸樹脂與胺基樹脂之混合物(信越化學工業股份有限公司製:商品名「KS-882」) 100重量份與對-甲苯磺酸(硬化劑) 1重量份以甲苯稀釋,調製固形分濃度2質量%之塗佈液。   其次,於厚38μm之聚對苯二甲酸乙二酯(PET)膜(三菱化學股份有限公司製之「DIAFOIL T100」)上以馬亞棒塗佈所得塗佈液,於140℃、60秒加熱並乾燥,獲得形成有平均厚0.1μm之剝離劑層的工程膜。 (2)高分子薄膜形成用溶液之調製   將環狀烯烴共聚物(三井化學股份有限公司製之「APEL6011T」、玻璃轉移點105℃、MFR 26g/10min)之溶液(固形分10質量%)以甲苯溶解,稀釋至固形分3質量%,製作高分子薄膜形成用溶液(黏度2.4mPa・s)。而且,實施例1所用之環狀烯烴共聚物之玻璃轉移點(Tg )及MFR示於表2。 (3)膜狀層合體之形成   其次,使用逆凹版塗佈器,於準備好的工程膜上以使乾燥後之高分子薄膜厚度成為800nm之方式塗佈高分子薄膜形成用溶液後,於100℃乾燥60秒,獲得膜狀層合體。 (4)高分子薄膜之製造   其次,藉由剝離膜狀層合體之工程膜,獲得高分子薄膜。 2.測定・評價 (1)高分子薄膜之表面碳濃度   為了求出高分子薄膜之表面碳濃度,進行高分子薄膜之表面XPS測定。測定係使用PHI Quantera SXM(ULVAC-PHI股份有限公司製)。X射線源係使用單色化Al・Kα以光電子取出角度45°進行測定,算出表面存在之碳元素濃度(單位:原子%)。所得結果示於表2。 (2)高分子薄膜之剝離力   測定所得膜狀層合體之自工程膜剝離高分子薄膜時之剝離力。   亦即,對膜狀層合體之高分子薄膜貼合黏著膠帶(日東電工股份有限公司製,No.31B)後,測定貼合黏著膠帶之狀態的高分子薄膜自工程膜180°剝離時之剝離力(mN/20mm)。所得結果示於表2。 (3)高分子薄膜之貼附性   首先,於支撐基材(東洋紡股份有限公司製之「CRISPR 75K2323」)之四方端部貼附雙面膠帶,製作具有雙面膠帶貼附部之支撐體。其次,將該支撐體之雙面膠帶貼附部貼附於膜狀層合體之高分子薄膜上。接著,自工程膜剝離支撐體及高分子薄膜,高分子薄膜轉移至支撐體表面。其次,自經轉移高分子薄膜之支撐體切掉雙面膠帶貼附部,製作高分子薄膜與支撐基材之層合體。該層合體以使高分子薄膜側與下述被接著物接觸之方式配置於被接著物上,自支撐基材上往返2次2kg滾輪,壓著高分子薄膜與被接著物。評價此時之貼附性。壓著後,以高分子薄膜全面貼附於被接著物而未剝離時判定為「A」,壓著後,高分子薄膜未貼附於被接著物,而有浮起或剝落時判定為「B」。所得結果示於表2。   PP:聚丙烯板(日立化成股份有限公司製之「PP-N-BN」,大小2mm×70mm×150mm)   玻璃:浮法板玻璃(旭玻璃股份有限公司製之「浮法板玻璃R3202 絲面加工」,大小2mm×70mm×150mm) (4)高分子薄膜上之水接觸角   為了評價高分子薄膜之對水的濡濕性,進行高分子薄膜上之水接觸角之測定。測定係使用接觸角計(協和界面科學股份有限公司製,DM-701)。測定對水之接觸角(23℃,50%RH)。所得結果示於表2。 (5)高分子薄膜上之水滑落角   為了評估高分子薄膜對水之撥水性,進行高分子薄膜上之水滑落角測定。於水平設置之高分子薄膜上放置水滴,測定將高分子薄膜緩緩傾斜時水滴開始流動之高分子薄膜的角度作為滑落角。所得結果示於表2。 (6)膜強度   膜強度係以蠕變計(山電股份有限公司製之商品名「Creep Meter RE2-3305CYAMADEN」)測定。具體而言,於溫度23℃、濕度50%RH之環境下靜置24小時後之膜狀層合體之高分子薄膜面貼附於開孔直徑1cm的孔之治具,剝離工程膜。將直徑1mmφ之圓柱型柱塞進入高分子薄膜之與治具孔中心部對應之部位。又,柱塞之進入速度設為0.5mm/秒。測定柱塞於孔深度方向進入至深度5mm時之最大應力(單位:mN/1mmφ)。又,測定進行10次,將平均值設為高分子薄膜之膜強度。所得結果示於表2。 [實施例2~4]   除了如表2所示變更環狀烯烴共聚物種類及高分子薄膜厚度以外,以與實施例1同樣方法,製造膜狀層合體及高分子薄膜並評價。所得結果示於表2。又,實施例2~4所用之環狀烯烴共聚物之玻璃轉移點(Tg )、MFR及高分子薄膜形成用溶液之黏度示於表2。 [比較例1及2]   除了如表2所示變更環狀烯烴共聚物種類及高分子薄膜厚度以外,以與實施例1同樣方法,製造膜狀層合體及高分子薄膜並評價。所得結果示於表2。又,比較例1及2所用之環狀烯烴共聚物之玻璃轉移點(Tg )、MFR及高分子薄膜形成用溶液之黏度示於表2。又,比較例1中,無法將聚合物溶解至期望濃度,無法以與實施例1同樣方法製造膜狀層合體及高分子薄膜。如表2所示之結果,確認包含降冰片烯系聚合物(A)且厚度為10nm以上1000nm以下之高分子薄膜(實施例1~4)貼附性良好,水的接觸角大,水的滑落角小。由此確認實施例1~4所得之高分子薄膜即使不使用接著劑等,亦可對於被接著物密著,具有高的撥水性。且,實施例1~4所得之高分子薄膜確認膜強度高,且具有自我支撐性。The embodiment of the present invention will be described below as an example and described based on the drawings. The present invention is not limited to the contents of the embodiments. In addition, in the drawings, for ease of explanation, there are portions shown enlarged or reduced. [Polymer film] As shown in FIG. 1, the polymer film 1 of this embodiment is a film having self-supporting properties. The “self-supporting property” in this specification refers to the property that the polymer thin film 1 alone can form a film when the polymer thin film 1 is not laminated on another support, and more specifically, the film strength is 5 mN / 1mmφ or more. Yes, for a "self-supporting" film, the film strength is preferably 10 mN / 1 mmφ or more, and more preferably 20 mN / 1 mmφ or more. The film strength can be measured with a creep meter (for example, a trade name "Creepmeter RE2-3305CYAMADEN" manufactured by Yamaden Corporation). Specifically, it can measure by the method described in the Example mentioned later. The thickness of the polymer film 1 must be 10 nm to 1000 nm. When the thickness of the polymer film 1 is 10 nm or more and 1000 nm or less, a desired adherend such as skin can be adhered without using an adhesive or the like. The thickness of the polymer film 1 can be measured by a spectroscopic ellipsometer (product name "M-2000") manufactured by JA Woollam. The thickness of the polymer film 1 is preferably 30 nm or more, more preferably 50 nm or more, still more preferably 100 nm or more, and particularly preferably 150 nm or more. The thickness of the polymer film 1 is preferably 900 nm or less, more preferably 700 nm or less, still more preferably 550 nm or less, and particularly preferably 400 nm or less. From the viewpoint of water repellency, the surface carbon concentration of the polymer film 1 is preferably 90 atomic% or more, more preferably 95 atomic% or more, and particularly preferably 99 atomic% or more. The surface carbon concentration can be measured by X-ray photoelectron spectroscopy (XPS). The polymer film 1 must contain a norbornene-based polymer (A) containing 10 mol% or more of a constituent unit represented by the following general formula (1). When the norbornene-based polymer (A) does not contain a constituent unit represented by the following general formula (1) in an amount of 10 mol% or more, a polymer film having self-supporting properties and high water repellency at a desired thickness cannot be obtained. The content of the constituent units represented by the following general formula (1) occupied in the polymer film 1 is preferably 20 mol% or more, and more preferably 50 mol% or more. In the aforementioned general formula (1), X 1 and X 2 are the same or different, and represent a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted group, respectively. X 1 and X 2 may be bonded to each other to form a ring. Examples of the substituents of the alkyl group, the alkoxy group, and the alkenyl group include a halogen atom, a hydroxyl group, a carboxyl group, an allyl group, a methacryl group, and an epoxy group. The carbon number of the alkyl group is preferably from 1 to 5, more preferably from 1 to 3. The carbon number of the alkoxy group is preferably from 1 to 5, more preferably from 1 to 3. The carbon number of the alkenyl group is preferably 2 to 5, more preferably 2 to 3. (Norbornene-based polymer (A)) The norbornene-based polymer (A) only needs to contain 10 mol% of the constituent unit represented by the general formula (1), and may be a norbornene-based homopolymer or may be It is a norbornene-based copolymer. The norbornene-based polymer (A) is a polymer containing at least one kind of a norbornene-based compound as a monomer. Examples of norbornene-based compounds include norbornene (bicyclo [2.2.1] hept-2-ene), compounds having a cyclic structure containing a norbornene-related bicyclic ring (such as dicyclopentadiene), and the like Of its derivatives. These can be used alone or in combination of two or more. Examples of the monomer other than the norbornene-based compound include cyclopentadiene and tetracyclododecene. These can be used alone or in combination of two or more. A polymer (homopolymer or copolymer) obtained by polymerizing a monomer by using a norbornene-based compound as at least one monomer has a constituent unit represented by the aforementioned general formula (1). Examples of the norbornene-based polymer (A) include a ring-opening metathesis polymer hydrogenated polymer of a norbornene-based monomer (specifically obtained from the ZEONEX (registered trademark) series made by Japan Zeon Corporation), norbornene and Copolymers of ethylene (specifically obtained from TOPAS (registered trademark) series manufactured by POLYPLASTIC Co., Ltd.), copolymers based on ring-opening polymerization of dicyclopentadiene and tetracyclododecadiene (specifically, Japan Zeon shares Co., Ltd. (ZEONOR (registered trademark) series), copolymers of ethylene and tetracyclododecene (specifically, obtained from Mitsui Chemicals Co., Ltd. APEL (registered trademark) series), and dicyclopentadiene and Cyclic olefin resin containing a polar group as a raw material of methacrylate (specifically, it is obtained from ARTON (registered trademark) series manufactured by JSR Corporation) and the like. These can be used alone or in combination of two or more. The norbornene-based polymer (A) may have a crosslinked structure. Here, the kind of crosslinking agent which causes a crosslinking structure is arbitrary. Examples of the cross-linking agent include organic peroxides (for example, dicumyl peroxide, etc.) and compounds having an epoxy group. These can be used alone or in combination of two or more. The cross-linking agent may be cross-linked between one kind of polymers constituting the norbornene-based polymer (A), or may be cross-linked between different kinds of polymers. The binding site of the crosslinking agent is also arbitrary. It may be crosslinked with atoms constituting the main chain in the polymer constituting the norbornene-based polymer (A), and may be crosslinked with atoms other than the main chain constituting the side chain or the functional group. The degree of cross-linking is also arbitrary, but when the degree of cross-linking is excessive, the processability (especially moldability) of the polymer film 1 containing the norbornene-based polymer (A) is excessively reduced, and the surface properties of the polymer film 1 There is a concern that the degradation of the polymer film 1 due to excessive degradation will reduce the brittleness, so it should be limited to a range where such problems do not occur. The norbornene-based polymer (A) has thermoplasticity. This degree of thermoplasticity can be expressed by a melt flow rate (MFR), which indicates a viscosity at the time of melting. The melt flow rate (MFR) of the norbornene polymer (A) at a temperature of 260 ° C and a load of 2.16 kgf is preferably 20 g / 10 min or more, more preferably 20 g / 10 min or more, 150 g / 10 min or less, and particularly preferably 25 g Above / 10min, below 50g / 10min. When the MFR is within the above range, the thermoplasticity can be sufficiently improved, and processability such as molding can be improved. MFR can be measured according to the description of ASTM D1238. The glass transition point of the norbornene-based polymer (A) is preferably 140 ° C. or lower, more preferably 30 ° C. or higher and 120 ° C. or lower, from the viewpoint of the applicability of the solution for forming a polymer film. When the glass transition point is 140 ° C or lower, the solvent solubility is further improved. On the other hand, when the glass transition point is 30 ° C or higher, the film has the ability to form a self-supporting film even at room temperature. The glass transition point can be measured using a differential scanning calorimeter. For example, a differential scanning calorimeter ("DSC (Q2000)" manufactured by TA Instruments) is used to perform a measurement at a temperature rise rate of 10 ° C / min and a temperature range from -40 ° C to 200 ° C, and a graph is formed. The inflection point is confirmed from the graph. The glass transition point can be determined. (Olefin polymer (B) other than norbornene polymer (A)) The polymer film 1 may contain an olefin polymer (B) other than norbornene polymer (A) (hereinafter referred to as the case may be "Non-NB olefin polymer (B)"). When a non-NB olefin-based polymer (B) is used, the content of the norbornene-based polymer (A) is preferably 50% by mass or more based on the total amount of the polymer from the viewpoint of self-supporting property and water repellency. It is 70% by mass or more, and particularly preferably 90% by mass or more. The non-NB olefin polymer (B) may be linear or may have a side chain. In addition, the non-NB olefin polymer (B) may have any functional group as long as it does not contain a norbornene ring, and its kind and substitution density are arbitrary. It may be a functional group having a low reactivity such as an alkyl group, or a functional group having a high reactivity such as a carboxylic acid group. The non-NB olefin-based polymer (B) is an olefin-based polymer having at least one olefin as a monomer, and is an olefin-based polymer that does not have a norbornene-based compound as a monomer. Therefore, the non-NB olefin polymer (B) is not particularly limited as long as it does not contain a norbornene ring in the polymer, and may be an aromatic cyclic polyolefin or an acyclic polyolefin. Examples of the aromatic cyclic polyolefin include polyolefins having at least one kind of olefin having an cyclic structure of an aromatic ring as a monomer. The non-NB olefin-based polymer (B) may be a homopolymer or a copolymer. (Subject) The polymer film 1 can be adhered to the adherend without using an adhesive or the like. Here, the adherend is not particularly limited, but examples thereof include stainless steel, polyethylene, polypropylene, polycarbonate, glass, PTFE (polytetrafluoroethylene), PVDF (polyvinylidene fluoride), and a semiconductor circuit board. Wait. By using these as adherends, water repellency can be easily provided to any adherend. Examples of the adherend other than the above include humans, animals, clothing, hats, shoes, and accessories. When these are used as adherends, since the polymer film 1 is very thin, the attachment portion is not conspicuous, and it is preferable to be lightweight. Moreover, since the polymer film 1 has high water repellency, it is resistant to sweat, rain, and the like. Therefore, the polymer film 1 can be used particularly suitably as a film which adheres a wearable terminal etc. to the skin etc. [Manufacturing method of polymer film] The manufacturing method of polymer film of this embodiment is a manufacturing method of polymer film for manufacturing polymer film 1. Therefore, the method for manufacturing a polymer film according to this embodiment is a method including the steps of applying a polymer film-forming solution containing the aforementioned norbornene-based polymer (A) to an engineering film, and drying the solution to form the foregoing. A step of polymer film (polymer film forming step), and a step of peeling the polymer film from the engineering film (peeling step). (Polymer film forming step) FIG. 2 is a schematic cross-sectional view showing an engineering film 2 used in the method for manufacturing a polymer film according to the present embodiment. The engineering film 2 has a first surface 2A and a second surface 2B. In the polymer film formation step, the first surface 2A and the second surface 2B of the engineering film shown in FIG. 2 are coated on the first surface 2A with a polymer containing the aforementioned norbornene-based polymer (A). The film-forming solution is dried and formed into a polymer film 1 to obtain a film-like laminate 100 as shown in FIG. 3. Here, the engineering film used in the polymer film formation step and the polymer film formation solution will be described. (Engineered Film) The engineering film 2 is not particularly limited. For example, from the viewpoint of easy handling, the engineering film 2 preferably includes a release substrate 21 and a release agent layer 22 formed on at least one surface of the release substrate 21. In this embodiment, the surface of the release agent layer 22 corresponds to the first surface 2A, and the surface opposite to the surface of the release substrate 21 on which the release agent layer 22 is formed corresponds to the second surface 2B. Examples of the release substrate 21 include a paper substrate, a laminated paper in which a thermoplastic resin such as polyethylene is laminated on the paper substrate, and a plastic film. Examples of the paper substrate include cellophane, fine paper, coated paper and coated paper. Examples of plastic films include, for example, polyester films (such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate), and polyolefin films (such as polypropylene and polyethylene). Ethylene, etc.). These may be used individually by 1 type, and may be used in combination of 2 or more type. The release agent layer 22 may be formed by applying a release agent. Examples of the release agent include olefin-based resins, rubber-based elastomers (e.g., butadiene-based resins, isoprene-based resins, etc.), long-chain alkyl-based resins, alkyd-based resins, fluorine-based resins, and silicones. Department of resin. Among these, the release agent is preferably selected from olefin-based resins, rubber-based elastomers (for example, butadiene-based resins, isoprene-based resins, etc.), long-chain alkyl-based resins, alkyd-based resins, and fluorine. Any release agent selected from the group of resins. These may be used individually by 1 type, and may be used in combination of 2 or more type. The release agent layer may further contain an antistatic agent, or may not contain an antistatic agent. The engineered film 2 preferably adjusts the surface free energy and the arithmetic average roughness of the first surface 2A by the release agent layer 22. The surface free energy of the first surface 2A of the engineering film 2 is preferably 40 mJ / m 2 or less, more preferably 20 mJ / m 2 or more and 40 mJ / m 2 or less. If the surface free energy is 20 mJ / m 2 or more, the polymer film-forming solution can be well coated on the engineering film 2, and if the surface free energy is 40 mJ / m 2 or less, the polymer can be easily peeled from the engineering film 2 Film 1 can improve productivity. The surface free energy can be used to measure the contact angle (measurement temperature: 25 ° C) of various droplets, and the value can be obtained by the Kitazaki- 畑 theory based on the value. The surface arithmetic average roughness (Ra) of the first surface 2A of the engineering film 2 is preferably 40 nm or less, more preferably 0.1 nm or more and 30 nm or less, and particularly preferably 0.5 nm or more and 25 nm or less. If the surface arithmetic average roughness is within the aforementioned range, the unevenness formed on the polymer film 1 can be sufficiently suppressed, and the film strength of the polymer film 1 can be improved. The arithmetic average roughness can be measured using, for example, a light interference microscope NT1100 manufactured by Veeco Instruments. The thickness of the engineering film 2 is not particularly limited. The thickness of the engineering film 2 is usually 20 μm or more and 200 μm or less, and preferably 25 μm or more and 150 μm or less. The thickness of the release agent layer 22 is not particularly limited. When the release agent layer 22 is formed by applying a solution containing a release agent on a release substrate, the thickness of the release agent layer 22 is preferably 0.01 μm or more and 2.0 μm or less, and more preferably 0.03 μm or more and 1.0 μm or less. When a plastic film is used as the release substrate 21, the thickness of the plastic film is preferably 3 μm or more and 50 μm or less, more preferably 5 μm or more and 90 μm or less, and particularly preferably 10 μm or more and 40 μm or less. (Solution for Polymer Thin Film Formation) The material for polymer thin film formation as a solute in the polymer thin film formation solution is a norbornene-based polymer (A). Further, as the material substance, a non-NB olefin polymer (B) may be further used. Since the norbornene-based polymer (A) and the non-NB olefin-based polymer (B) have been described, they are omitted. The type of the solvent for the polymer film-forming solution is not particularly limited as long as it is a solvent that can dissolve or uniformly disperse the material material for polymer film formation and can be evaporated by heating. For example, as the solvent, ethanol, propanol, isopropanol, acetone, toluene, cyclohexanone, ethyl acetate, butyl acetate, tetrahydrofuran, methyl ethyl ketone, dichloromethane, chloroform, and the like are preferably used. These may be used individually by 1 type, and may be used in combination of 2 or more type. The boiling point of the solvent is preferably a value in a range of 30 ° C to 160 ° C, and more preferably a value in a range of 35 ° C to 120 ° C. The concentration of the material substance in the polymer film-forming solution is preferably set to a value in the range of 0.1% by mass to 20% by mass. If the concentration of the material substance in the solution for forming a polymer film is 0.1% by mass or more, the disadvantages that the necessary thickness cannot be obtained and the disadvantage that the solution viscosity cannot be optimized can be suppressed. On the other hand, if the concentration of the material substance in the solution for forming a polymer thin film is 20% by mass or less, the disadvantage that a uniform coating film cannot be obtained can be suppressed. From the above viewpoint, the concentration of the material substance in the solution for forming a polymer film is more preferably set to a value in a range of 0.3% by mass to 15% by mass, and more preferably set to a range of 0.5% by mass to 10% by mass. Within the value. In addition, the viscosity (measurement temperature: 25 ° C) of the solution for forming a polymer film is preferably set to a value within a range of 1 mPa · s to 500 mPa · s. If the viscosity of the polymer film-forming solution is 1 mPa · s or more, the disadvantage of unevenness in the coating film can be suppressed. On the other hand, if the viscosity of the polymer thin film forming solution is 500 mPa · s or less, the disadvantage that a uniform coating film cannot be obtained can be suppressed. From the above viewpoint, the viscosity (measurement temperature: 25 ° C) of the solution for forming a polymer film is more preferably set to a value within a range of 1.5 mPa · s or more and 400 mPa · s or less, and more preferably 2 mPa · s or more and 300 mPa.・ Values in the range below s. The viscosity of the polymer film-forming solution was measured in accordance with JIS K7117-1, 4.1 (Brookfield Rotary Viscometer). In addition, the drying conditions for the coating layer of the polymer film-forming solution formed on the engineering film 2 for forming the polymer film 1 are not particularly limited. The drying of the coating layer is preferably performed under a temperature condition of 40 ° C. to 120 ° C. and a drying time of 6 seconds to 300 seconds. If the drying temperature is 40 ° C or higher, the disadvantages of excessive drying or insufficient drying can be suppressed. On the other hand, if the drying temperature is 120 ° C or lower, the disadvantage of wrinkles or curling can be suppressed. If the drying time is 6 seconds or more, the disadvantage of insufficient drying can be prevented. On the other hand, if the drying time is 300 seconds or less, the occurrence of wrinkles and curls can be suppressed. Based on the above viewpoint, the coating layer of the solution for forming a polymer film is used as a drying condition for the polymer film 1, and is more preferably set to a temperature condition of 50 ° C or higher and 110 ° C or lower and a drying time of 12 seconds to 180 seconds. The time is more preferably set to a temperature condition of 60 ° C. to 100 ° C. and a drying time of 18 seconds to 120 seconds. The application of the polymer film-forming solution is preferably performed by a roll-to-roll method. The reason for this is that if the roll-to-roll method is used, the polymer film 1 having a specific thickness can be formed more efficiently, and thus the film-like laminate 100 can be produced more efficiently in large quantities. When the roll-to-roll method is performed, the coating device is preferably a bar coater, a gravure coater, or a die coater, and more preferably a reverse gravure coater or a slit die coater. The reason is that if such a coating device is used, the polymer film 1 having a specific thickness can be formed more efficiently. That is, if it is a bar coater, a reverse gravure coater, or a slit die coater, a nano-thick polymer film 1 can be formed with a uniform thickness without generating wrinkles on the surface. In addition, the bar coater, reverse gravure coater, and slot die coater are excellent in economy in addition to the simple structure. (Peeling step) In the peeling step, the polymer film 1 of the film-like laminate 100 shown in FIG. 3 is peeled from the engineering film 2 to obtain a polymer film 1 having a self-supporting property. In the peeling step, the peeling force of the engineering film 2 from the polymer film 1 is preferably 5 mN / 20 mm or more and 100 mN / 20 mm or less, more preferably 10 mN / 20 mm or more, 50 mN / 20 mm or less, and particularly preferably 15 mN / 20 mm or more and 30 mN. / 20mm or less. If the above-mentioned peeling force is 5 mN / 20 mm or more, in the step of forming the polymer film, the disadvantage that the engineering film and the polymer film are easily peeled off can be suppressed. In addition, if the peeling force is 100 mN / 20 mm or less, in the peeling step, it is possible to suppress the disadvantage that the engineered film is not easily peeled from the polymer film or the polymer film is cracked. The peeling force can be adjusted, for example, by changing the type of the release agent used in the engineering film 2. [Membrane-Laminated Body] As shown in FIG. 3, the film-laminar body 100 of this embodiment includes a polymer film 1 and an engineering film 2. The film-like laminate 100 is obtained by coating the engineering film 2 with the aforementioned polymer film-forming solution, drying the coating layer, and forming the polymer film 1. That is, the film-like laminate 100 can be obtained by the polymer thin film forming step in the method for manufacturing a polymer thin film according to the embodiment. (Effects of this embodiment) According to this embodiment, the following effects can be exhibited. (1) It is possible to efficiently produce a self-supporting polymer containing a norbornene-based polymer (A) containing a structural unit represented by the aforementioned general formula (1) in an amount of 10 mol% or more, having a thickness of 10 nm or more and 1000 nm or less. Film 1. (2) A polymer film 1 having a high water repellency and capable of being adhered to an adherend without using an adhesive or the like can be provided. [Changes of Embodiment] This embodiment is not limited to the foregoing embodiment, and changes, improvements, and the like within a range that can achieve the purpose of the embodiment are included in this embodiment. For example, although the engineering film 2 provided with the release base material 21 and the release agent layer 22 was used in the said embodiment, it is not limited to this. For example, when the surface free energy and the surface arithmetic average roughness of the peeling substrate 21 are within appropriate ranges, a single-layer film made of the peeling substrate 21 may be used as the engineering film 2. EXAMPLES The present invention will be described in more detail with reference to the following examples, but the present invention is by no means limited to these examples. [Test Example 1] 1. Selection of Engineering Film (1) Manufacturing of Engineering Film The engineering film of Test Example 1 has a release substrate and a release agent layer provided on the release substrate. 100 parts by weight of a mixture of a polysiloxane modified alkyd resin and an amine-based resin (made by Shin-Etsu Chemical Industry Co., Ltd .: trade name "KS-882") and 1 part by weight of p-toluenesulfonic acid (hardener) was toluene. Dilute to prepare a coating solution with a solid content concentration of 2% by mass. Next, the obtained coating solution was coated on a 38 μm thick polyethylene terephthalate (PET) film ("DIAFOIL T100" manufactured by Mitsubishi Chemical Corporation) with a Maya rod, and heated at 140 ° C for 60 seconds. Then, it was dried to obtain an engineered film having a release agent layer having an average thickness of 0.1 μm. Next, the surface free energy and arithmetic average roughness of the surface of the release agent layer of the obtained engineering film are shown in Table 1. (2) Preparation of polymer thin film forming solution A solution (solid content: 10% by mass) of a cyclic olefin copolymer ("APEL6011T" manufactured by Mitsui Chemicals Co., Ltd., a glass transition point of 105 ° C, and an MFR of 26g / 10min) The toluene was dissolved and diluted to a solid content of 3% by mass to prepare a solution for forming a polymer film. (3) Formation of a film-like laminate. Next, use a reverse gravure coater to apply a polymer film-forming solution on the prepared engineering film so that the thickness of the polymer film after drying becomes 800 nm. It dried at 60 degreeC for 60 second, and obtained the film-like laminated body. 2. Measurement and evaluation (1) Measurement of surface free energy of engineering film The surface free energy (mJ / m 2 ) of the surface (contact surface with polymer film) on which the solution for forming a polymer film is applied in the engineering film is measured The contact angles (measurement temperature: 25 ° C) of various droplets were measured, and based on this value, they were obtained by the Kitazaki- 畑 theory. That is, diiodomethane as a "dispersing component", 1-bromonaphthalene as a "dipolar component", and distilled water as a "hydrogen bonding component" are used as droplets, and DM manufactured by Kyowa Interface Science Co., Ltd. is used. -70. The contact angle (measurement temperature: 25 ° C) was measured by the static drop method in accordance with JIS R3257, and based on this value, the surface free energy (mJ / m 2 ) was calculated based on the Kitasaki- 畑 theory. (2) Measurement of the arithmetic mean roughness Ra of the engineering film The arithmetic mean roughness Ra (nm) of the surface (contact surface with the polymer film) coated with the solution for forming a polymer film in the release sheet is from Veeco Instruments The manufactured optical interference microscope NT1100 was observed on an area of 250,000 μm 2 (500 μm × 500 μm), and the arithmetic average roughness (Ra) was determined. (3) Evaluation of the applicability of the polymer film-forming solution to the engineered film The applicability when forming a film-like laminate. The solution for forming a polymer film can be judged as "A" when the engineering film is uniformly applied, and can be judged as "B" when the engineering film is not uniformly applied. The results obtained are shown in Table 1. (4) Evaluation of peelability of polymer film When the polymer film is peeled from the engineering film in the film-like laminate, the peelability is evaluated. When the polymer film is easily peeled from the engineering film, it is judged as "A", and when the polymer film is broken, it is judged as "B". The results obtained are shown in Table 1. [Test Example 2] In Test Example 2, except that a polyethylene terephthalate film ("DIAFOIL T100" manufactured by Mitsubishi Chemical Corporation, 38 µm thick) was used as an engineering film, the same method as in Test Example 1 was used. A film-like laminate and a polymer film were produced and evaluated. The results obtained are shown in Table 1. In addition, Table 1 shows the surface free energy and the arithmetic average roughness of the surface of the engineered film used in Test Example 2. [Test Example 3] In Test Example 3, except that "SP-PET381031" (manufactured by LINTEC Corporation) was used as an engineering film, a film-like laminate and a polymer film were produced and evaluated in the same manner as in Test Example 1. The results obtained are shown in Table 1. The surface free energy and arithmetic average roughness of the surface of the release agent layer of the engineering film used in Test Example 3 are shown in Table 1. [Test Example 4] In Test Example 4, except that "SP-PET38T100X" (manufactured by LINTEC Corporation) was used as an engineering film, a film-like laminate and a polymer film were produced and evaluated in the same manner as in Test Example 1. The results obtained are shown in Table 1. The surface free energy and arithmetic average roughness of the surface of the release agent layer of the engineering film used in Test Example 4 are shown in Table 1. As can be understood from the results shown in Table 1, when using a solution for forming a polymer film containing a cyclic olefin copolymer, it is understood that the engineered film used in Test Example 1 is preferably used. Therefore, in the following Examples and Comparative Examples, the engineered film used in Test Example 1 was used. [Example 1] 1. Manufacturing of polymer film (1) Manufacturing of engineering film The engineering film of Example 1 has a substrate and a release agent layer provided on the substrate. 100 parts by weight of a mixture of a polysiloxane modified alkyd resin and an amine-based resin (made by Shin-Etsu Chemical Industry Co., Ltd .: trade name "KS-882") and 1 part by weight of p-toluenesulfonic acid (hardener) was toluene. Dilute to prepare a coating solution with a solid content concentration of 2% by mass. Next, the obtained coating solution was coated on a 38 μm thick polyethylene terephthalate (PET) film ("DIAFOIL T100" manufactured by Mitsubishi Chemical Corporation) with a Maya rod, and heated at 140 ° C for 60 seconds. Then, it was dried to obtain an engineered film having a release agent layer having an average thickness of 0.1 μm. (2) Preparation of polymer thin film forming solution A solution (solid content: 10% by mass) of a cyclic olefin copolymer ("APEL6011T" manufactured by Mitsui Chemicals Co., Ltd., a glass transition point of 105 ° C, and an MFR of 26g / 10min) The toluene was dissolved and diluted to a solid content of 3% by mass to prepare a solution for forming a polymer film (viscosity 2.4 mPa · s). The glass transition point (T g ) and MFR of the cyclic olefin copolymer used in Example 1 are shown in Table 2. (3) Formation of a film-like laminate. Next, use a reverse gravure coater to apply a polymer film-forming solution on the prepared engineering film so that the thickness of the polymer film after drying becomes 800 nm. It dried at 60 degreeC for 60 second, and obtained the film-like laminated body. (4) Production of polymer film Next, the polymer film is obtained by peeling the engineering film of the film-like laminate. 2. Measurement and Evaluation (1) Surface carbon concentration of polymer film In order to obtain the surface carbon concentration of the polymer film, the surface XPS measurement of the polymer film was performed. As the measurement system, PHI Quantera SXM (manufactured by ULVAC-PHI Co., Ltd.) was used. The X-ray source was measured using a monochromatic Al · Kα at a photoelectron extraction angle of 45 ° to calculate the concentration of carbon elements (unit: atomic%) present on the surface. The results obtained are shown in Table 2. (2) Peeling force of polymer film The peeling force when the polymer film was peeled from the engineering film of the obtained film-like laminate was measured. That is, after the adhesive tape (the Nitto Denko Corporation, No. 31B) was adhered to the polymer film of the film-like laminate, the polymer film in the state where the adhesive tape was attached was measured for peeling at 180 ° from the engineering film. Force (mN / 20mm). The results obtained are shown in Table 2. (3) Adhesiveness of polymer film First, a double-sided tape is attached to a square end of a supporting substrate ("CRISPR 75K2323" manufactured by Toyobo Co., Ltd.) to produce a support having a double-sided tape attachment portion. Next, the double-sided tape attachment portion of the support is attached to the polymer film of the film-like laminate. Next, the support and the polymer film are peeled from the engineering film, and the polymer film is transferred to the surface of the support. Secondly, the support body of the polymer film is cut away from the double-sided adhesive tape attachment portion to produce a laminate of the polymer film and the support substrate. This laminate was placed on the adherend so that the polymer film side was in contact with the adherend described below, and a 2 kg roller was reciprocated twice from the self-supporting base material, and the polymer film and the adherend were pressed. The adhesion at this time was evaluated. After pressing, the polymer film was completely attached to the adherend without peeling, and it was judged as "A". After pressing, the polymer film was not attached to the adherend, and it was judged as "if it floated or peeled." B ". The results obtained are shown in Table 2. PP: Polypropylene sheet ("PP-N-BN" manufactured by Hitachi Chemical Co., Ltd., size 2mm × 70mm × 150mm) Glass: Float sheet glass ("Float sheet glass R3202 silk surface made by Asahi Glass Co., Ltd." Processing ", size 2mm × 70mm × 150mm) (4) Water contact angle on the polymer film In order to evaluate the wettability of the polymer film to water, the water contact angle on the polymer film was measured. The measurement system used a contact angle meter (produced by Kyowa Interface Science Co., Ltd., DM-701). The contact angle to water (23 ° C, 50% RH) was measured. The results obtained are shown in Table 2. (5) Water slip angle on the polymer film In order to evaluate the water repellency of the polymer film to water, the water slip angle on the polymer film was measured. Water droplets were placed on the horizontally-positioned polymer film, and the angle of the polymer film where the water droplets started to flow when the polymer film was slowly tilted was measured as the slip angle. The results obtained are shown in Table 2. (6) Film strength The film strength is measured with a creep meter (trade name "Creep Meter RE2-3305CYAMADEN" manufactured by Yamaden Corporation). Specifically, the polymer film surface of the film-like laminate after standing for 24 hours in an environment with a temperature of 23 ° C. and a humidity of 50% RH is attached to a jig with a hole having a diameter of 1 cm, and the engineering film is peeled off. A cylindrical plunger with a diameter of 1 mmφ is inserted into a portion of the polymer film corresponding to the center portion of the fixture hole. The plunger entering speed was set to 0.5 mm / sec. Measure the maximum stress (unit: mN / 1mmφ) when the plunger enters the hole depth direction to a depth of 5mm. The measurement was performed 10 times, and the average value was defined as the film strength of the polymer film. The results obtained are shown in Table 2. [Examples 2 to 4] A film-like laminate and a polymer film were produced and evaluated in the same manner as in Example 1 except that the type of the cyclic olefin copolymer and the thickness of the polymer film were changed as shown in Table 2. The results obtained are shown in Table 2. Table 2 shows the glass transition point (T g ), MFR, and viscosity of the polymer film-forming solution of the cyclic olefin copolymers used in Examples 2 to 4. [Comparative Examples 1 and 2] A film-like laminate and a polymer film were produced and evaluated in the same manner as in Example 1 except that the type of the cyclic olefin copolymer and the thickness of the polymer film were changed as shown in Table 2. The results obtained are shown in Table 2. Table 2 shows the glass transition point (T g ), MFR, and viscosity of the polymer film-forming solution of the cyclic olefin copolymers used in Comparative Examples 1 and 2. In Comparative Example 1, the polymer could not be dissolved to a desired concentration, and a film-like laminate and a polymer film could not be produced in the same manner as in Example 1. As shown in the results in Table 2, it was confirmed that the polymer film (Examples 1 to 4) containing norbornene polymer (A) and having a thickness of 10 nm to 1000 nm has good adhesion, a large contact angle with water, Small slip angle. From this, it was confirmed that the polymer films obtained in Examples 1 to 4 can be adhered to an adherend without using an adhesive or the like, and have high water repellency. In addition, the polymer films obtained in Examples 1 to 4 were confirmed to have high film strength and self-supporting properties.

1‧‧‧高分子薄膜1‧‧‧ polymer film

2‧‧‧工程膜2‧‧‧Engineering film

2A‧‧‧第一面2A‧‧‧First side

2B‧‧‧第二面2B‧‧‧Second Side

21‧‧‧剝離基材21‧‧‧ peeling substrate

22‧‧‧剝離劑層22‧‧‧Releasing agent layer

100‧‧‧膜狀層合體100‧‧‧ film laminate

圖1係顯示本發明實施形態之高分子薄膜的概略圖。   圖2係顯示於本發明實施形態之高分子薄膜的製造方法所用之工程膜的概略圖。   圖3係顯示於本發明實施形態之高分子薄膜的製造方法中,於工程膜上形成高分子薄膜,製作膜狀層合體之狀態的概略圖。FIG. 1 is a schematic view showing a polymer film according to an embodiment of the present invention. Fig. 2 is a schematic view showing an engineering film used in a method for manufacturing a polymer film according to an embodiment of the present invention. FIG. 3 is a schematic view showing a state in which a polymer thin film is formed on an engineering film to produce a film-like laminate in a method for manufacturing a polymer thin film according to an embodiment of the present invention.

Claims (12)

一種高分子薄膜,其特徵為包含含有10mol%以上之下述通式(1)表示之構成單位的降冰片烯系聚合物(A),厚度為10nm以上1000nm以下,且具有自我支撐性,(前述通式(1)中,X1 及X2 為相同或不同,分別表示氫原子、鹵原子、經取代或無取代之烷基、經取代或無取代之烷氧基、經取代或無取代之烯基、羥基或羧基,X1 及X2 亦可互相結合形成環)。A polymer film characterized by comprising a norbornene polymer (A) containing 10 mol% or more of a constituent unit represented by the following general formula (1), having a thickness of 10 nm or more and 1000 nm or less, and having self-supporting properties, (In the aforementioned general formula (1), X 1 and X 2 are the same or different and each represents a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted Substituted alkenyl, hydroxyl or carboxyl groups, X 1 and X 2 may also be combined with each other to form a ring). 如請求項1之高分子薄膜,其中前述降冰片烯系聚合物(A)係降冰片烯系共聚物。The polymer film according to claim 1, wherein the norbornene-based polymer (A) is a norbornene-based copolymer. 如請求項1之高分子薄膜,其中前述高分子薄膜含有50質量%以上之前述降冰片烯系聚合物(A)。The polymer film according to claim 1, wherein the polymer film contains 50% by mass or more of the norbornene-based polymer (A). 如請求項1之高分子薄膜,其中前述降冰片烯系聚合物(A)之玻璃轉移點為140℃以下。For example, the polymer film of claim 1, wherein the glass transition point of the norbornene-based polymer (A) is 140 ° C or lower. 如請求項1之高分子薄膜,其中前述降冰片烯系聚合物(A)於溫度260℃、荷重2.16kgf下之熔融流動速率為20g/10min以上。For example, the polymer film of claim 1, wherein the melt flow rate of the norbornene polymer (A) at a temperature of 260 ° C and a load of 2.16 kgf is 20 g / 10 min or more. 如請求項1至5中任一項之高分子薄膜,其中前述高分子薄膜之表面碳濃度為90原子%以上。The polymer film according to any one of claims 1 to 5, wherein the surface carbon concentration of the polymer film is 90 atomic% or more. 一種膜狀層合體,其特徵係具備工程膜與形成於前述工程膜上之如請求項1至6中任一項之高分子薄膜。A film-like laminate, which is characterized by comprising an engineering film and a polymer film according to any one of claims 1 to 6 formed on the aforementioned engineering film. 如請求項7之膜狀層合體,其中前述工程膜之表面自由能為40mJ/m2 以下。For example, the film-like laminate of claim 7, wherein the surface free energy of the aforementioned engineering film is 40 mJ / m 2 or less. 如請求項7或8之膜狀層合體,其中前述工程膜之表面算術平均粗糙度為40nm以下。For example, the film-like laminate of claim 7 or 8, wherein the arithmetic average roughness of the surface of the aforementioned engineering film is 40 nm or less. 一種高分子薄膜的製造方法,其係製造如請求項1至6中任一項之高分子薄膜者,其特徵為具備下述步驟:   於工程膜上塗佈包含前述降冰片烯系聚合物(A)之高分子薄膜形成用溶液,並乾燥,形成前述高分子薄膜之步驟,及   自前述工程膜剝離前述高分子薄膜之步驟。A method for manufacturing a polymer film, which is a polymer film manufacturer according to any one of claims 1 to 6, and is characterized by having the following steps: (1) coating an engineering film containing the aforementioned norbornene-based polymer ( A) A solution for forming a polymer film and drying to form the polymer film, and a step of peeling the polymer film from the engineering film. 如請求項10之高分子薄膜的製造方法,其中前述工程膜之表面自由能為40mJ/m2 以下。The method for manufacturing a polymer film according to claim 10, wherein the surface free energy of the aforementioned engineering film is 40 mJ / m 2 or less. 如請求項10或11之高分子薄膜的製造方法,其中前述工程膜之表面算術平均粗糙度為40nm以下。The method for manufacturing a polymer film according to claim 10 or 11, wherein the arithmetic average roughness of the surface of the aforementioned engineering film is 40 nm or less.
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