TW201920021A - Cutting device for glass substrate, cutting method, program, and storage medium - Google Patents
Cutting device for glass substrate, cutting method, program, and storage medium Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/10—Glass-cutting tools, e.g. scoring tools
- C03B33/102—Glass-cutting tools, e.g. scoring tools involving a focussed radiation beam, e.g. lasers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/0222—Scoring using a focussed radiation beam, e.g. laser
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/037—Controlling or regulating
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
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Abstract
Description
本發明係關於一種玻璃基板的切斷裝置。The present invention relates to a cutting device for a glass substrate.
先前已知一種藉由沿玻璃基板之切斷方向掃描雷射光而產生切斷線,並就該切斷線切斷玻璃基板的切斷裝置(例如,專利文獻1)。藉由該裝置可比較高速地切斷較大之玻璃基板。 [先前技術文獻] [專利文獻]A cutting device is known that generates a cutting line by scanning laser light in a cutting direction of a glass substrate and cuts the glass substrate with respect to the cutting line (for example, Patent Document 1). With this device, it is possible to cut a relatively large glass substrate at a relatively high speed. [Prior Art Literature] [Patent Literature]
[專利文獻1]日本特開平4-224091號公報[Patent Document 1] Japanese Unexamined Patent Publication No. 4-224091
[發明所欲解決之問題][Problems to be solved by the invention]
於上述裝置中,在切斷玻璃基板時,僅使雷射光在玻璃基板上往復移動,而不進行與朝玻璃基板照射之雷射光相關之其他控制。例如,在上述之裝置中,無論是否於玻璃基板形成切斷線,雷射光在玻璃基板上之掃描範圍不變。其結果為,即便在照射有充分之雷射光而已形成切斷線之部位仍浪費地持續照射雷射光。In the above device, when the glass substrate is cut, only the laser light is reciprocated on the glass substrate, and no other control related to the laser light irradiated onto the glass substrate is performed. For example, in the above-mentioned device, the scanning range of the laser light on the glass substrate does not change whether or not a cutting line is formed on the glass substrate. As a result, the laser light is continuously irradiated wastefully even at a portion where a cutting line has been formed even if sufficient laser light is irradiated.
本發明之目的在於:在藉由照射光切斷玻璃基板之裝置中,朝欲形成玻璃基板之切斷線之部位高效率地照射該光。 [解決問題之技術手段]An object of the present invention is to efficiently irradiate light to a portion where a cutting line of a glass substrate is to be formed in a device for cutting a glass substrate by irradiating light. [Technical means to solve the problem]
以下,作為用於解決問題之手段而對複數個樣態進行說明。該等樣態可根據需要任意組合。 本發明之一觀點之玻璃基板的切斷裝置具備光產生裝置及光掃描裝置。光產生裝置輸出切斷玻璃基板之切斷光。光掃描裝置係使切斷光之光點沿玻璃基板之切斷方向往復移動之裝置。光掃描裝置將切斷光之光點之往復移動範圍限制在未形成玻璃基板之切斷線之未切斷區域。Hereinafter, a plurality of aspects will be described as a means for solving the problem. These aspects can be arbitrarily combined as required. A cutting device for a glass substrate according to an aspect of the present invention includes a light generating device and a light scanning device. The light generating device outputs cut light that cuts the glass substrate. The light scanning device is a device that reciprocates the light spot of the cut light in the cut direction of the glass substrate. The light scanning device limits the reciprocating range of the light spot of the cut light to the uncut area where the cut line of the glass substrate is not formed.
在上述之玻璃基板的切斷裝置中,光掃描裝置將用於切斷玻璃基板之切斷光之光點在玻璃基板上之往復移動之範圍限制在未形成玻璃基板之切斷線之未切斷區域。藉此,可僅朝應當形成玻璃基板之切斷線之區域照射切斷光。其結果為,可在不浪費切斷光之能量下高效率地朝應當形成玻璃基板之切斷線之區域照射自光產生裝置產生之切斷光。In the above-mentioned glass substrate cutting device, the light scanning device restricts the range of the reciprocating movement of the light spot of the cutting light for cutting the glass substrate on the glass substrate to the uncut portion where the cutting line of the glass substrate is not formed. Off zone. Thereby, the cutting light can be irradiated only to the area where the cutting line of the glass substrate should be formed. As a result, it is possible to efficiently irradiate the cutting light generated from the light generating device to the area where the cutting line of the glass substrate should be formed without wasting the energy of the cutting light.
玻璃基板的切斷裝置可更具備透鏡裝置。透鏡裝置調節切斷光之光點在玻璃基板上之尺寸。藉此,可朝應當形成玻璃基板之切斷線之區域高效率地照射具有可高效率地形成切斷線之最佳能量密度之切斷光。The glass substrate cutting device may further include a lens device. The lens device adjusts the size of the light spot of the cut light on the glass substrate. Thereby, it is possible to efficiently irradiate the cutting light having the optimum energy density capable of efficiently forming the cutting line toward the region where the cutting line of the glass substrate should be formed.
透鏡裝置亦可使玻璃基板上之切斷光之光點之尺寸依據未切斷區域在切斷方向上之長度而變化。藉此,可朝應當形成玻璃基板之切斷線之區域高效率地照射具有可高效率地形成切斷線之最佳能量密度之切斷光。The lens device can also change the size of the light spot of the cut light on the glass substrate according to the length of the uncut area in the cut direction. Thereby, it is possible to efficiently irradiate the cutting light having the optimum energy density capable of efficiently forming the cutting line toward the region where the cutting line of the glass substrate should be formed.
透鏡裝置可隨著未切斷區域在切斷方向上之長度變短,而增大切斷光之光點之尺寸,藉此,可抑制切斷光以過量之能量密度朝在切斷方向上之長度變短之未切斷區域照射。The lens device can increase the size of the light spot of the cutting light as the length of the uncut area becomes shorter in the cutting direction, thereby suppressing the cutting light from moving toward the cutting direction with an excessive energy density. Irradiate the uncut area with a shortened length.
玻璃基板的切斷裝置可更具備光修正裝置。光修正裝置使切斷光之光點朝與切斷方向垂直之修正方向移動。藉此,藉由使其移動方向偏離切斷方向的切斷光之光點朝修正方向移動,而可使切斷光之光點沿適切之切斷方向往復移動。 [發明之效果]The glass substrate cutting device may further include a light correction device. The light correction device moves the light spot of the cut light in a correction direction perpendicular to the cut direction. Thereby, by moving the light spot of the cutting light away from the cutting direction toward the correction direction, the light spot of the cutting light can be reciprocated in the appropriate cutting direction. [Effect of the invention]
可在不浪費該切斷光之能量下高效率地朝應當形成玻璃基板之切斷線之區域照射自光產生裝置產生之切斷光。It is possible to efficiently irradiate the cutting light generated from the light generating device to the area where the cutting line of the glass substrate should be formed without wasting the energy of the cutting light.
1.第1實施形態 (1)切斷裝置 以下,利用圖1說明本發明之一實施形態之玻璃基板G之切斷裝置100之整體構成。圖1係第1實施形態之切斷裝置之俯視圖。切斷裝置100係藉由沿玻璃基板G之切斷方向照射具有特定之光點尺寸之光(以下稱為切斷光L),而沿該切斷方向於玻璃基板G形成切斷線C之龜裂之裝置。玻璃基板G藉由該切斷線C之龜裂而被切斷。1. First Embodiment (1) Cutting device The overall configuration of a cutting device 100 for a glass substrate G according to an embodiment of the present invention will be described below with reference to FIG. 1. Fig. 1 is a plan view of a cutting device according to a first embodiment. The cutting device 100 irradiates light having a specific spot size in the cutting direction of the glass substrate G (hereinafter referred to as cutting light L), and forms a cutting line C on the glass substrate G in the cutting direction. Cracked device. The glass substrate G is cut by the crack of the cutting line C.
玻璃基板G例如可舉出,用於顯示器或儀錶板等之鈉玻璃、無鹼玻璃,但種類不限定於此。玻璃基板G一面由基板搬送裝置10搬送,一面由切斷裝置100切斷。因此,本實施形態之切斷裝置100在切斷玻璃基板G時,朝與玻璃基板G之搬送方向同一方向、以與玻璃基板G之搬送速度為同一速度移動。玻璃基板G之搬送方向例如為圖1之y軸之負方向(在圖1中為紙面之下方向)。Examples of the glass substrate G include soda glass and alkali-free glass used in displays and instrument panels, but the type is not limited to this. The glass substrate G is transferred by the substrate transfer device 10 while being cut by the cutting device 100. Therefore, when the cutting device 100 of this embodiment cuts the glass substrate G, it moves in the same direction as the conveyance direction of the glass substrate G, and moves at the same speed as the conveyance speed of the glass substrate G. The conveyance direction of the glass substrate G is, for example, the negative direction of the y-axis in FIG. 1 (the direction below the paper surface in FIG. 1).
又,在本實施形態中,玻璃基板G之切斷方向如圖1所示般為與x軸方向平行之方向。亦即,本實施形態之切斷裝置100係應用於例如通過降流製造之玻璃基板G之橫切(玻璃基板G之寬度方向之切斷)者。In this embodiment, the cutting direction of the glass substrate G is a direction parallel to the x-axis direction as shown in FIG. 1. That is, the cutting device 100 according to this embodiment is applied to, for example, cross-cutting (cutting in the width direction of the glass substrate G) of the glass substrate G manufactured by downflow.
切斷裝置100具備:光產生裝置1、光掃描裝置3、透鏡裝置5、及光修正裝置7,經由透鏡裝置5、光掃描裝置3及光修正裝置7朝玻璃基板G照射於光產生裝置1產生之切斷光L而在玻璃基板G之表面形成切斷光L之光點S,並使切斷光L之光點S沿玻璃基板G之切斷方向移動。The cutting device 100 includes a light generating device 1, a light scanning device 3, a lens device 5, and a light correction device 7, and the light generation device 1 is irradiated onto the glass substrate G through the lens device 5, the light scanning device 3, and the light correction device 7. The generated cutting light L forms a light spot S of the cutting light L on the surface of the glass substrate G, and moves the light spot S of the cutting light L in the cutting direction of the glass substrate G.
切斷裝置100具備光產生裝置1。光產生裝置1係產生上述之切斷光L之裝置。作為光產生裝置1,例如可使用能夠輸出具有可於玻璃基板G形成能夠切斷玻璃基板G的切斷線C之龜裂之程度之能量的切斷光L之光源。作為如此般之光源,例如有CO2 雷射振盪器等。The cutting device 100 includes a light generating device 1. The light generating device 1 is a device that generates the above-mentioned cut-off light L. As the light generating device 1, for example, a light source capable of outputting the cutting light L having a degree of energy capable of forming a crack on the glass substrate G that can cut the cutting line C of the glass substrate G can be used. Examples of such a light source include a CO 2 laser oscillator.
切斷裝置100具備光掃描裝置3。光掃描裝置3使自光產生裝置1輸出之切斷光L之光點S沿切斷方向往復移動。本實施形態之光掃描裝置3係具有反射切斷光L之反射鏡、及使該反射鏡繞z軸旋轉之旋轉機構之裝置。上述旋轉機構為例如於自該反射鏡朝z軸方向延伸之軸連接有輸出旋轉軸之馬達。作為如此般之裝置,例如有檢流計掃描儀。The cutting device 100 includes a light scanning device 3. The light scanning device 3 reciprocates the light spot S of the cut light L output from the light generating device 1 in the cut direction. The light scanning device 3 of this embodiment is a device having a reflecting mirror that reflects the cut-off light L, and a rotating mechanism that rotates the reflecting mirror about the z-axis. The rotation mechanism is, for example, a motor having an output rotation shaft connected to an axis extending from the mirror in the z-axis direction. An example of such a device is a galvanometer scanner.
上述之光掃描裝置3設置於切斷光L之光路上。因此,如圖1所示般,切斷光L經光掃描裝置3之反射鏡反射。光掃描裝置3藉由使上述反射鏡繞z軸旋轉而變更切斷光L朝向該反射鏡之入射角(亦即切斷光於該反射鏡之反射角),而可朝由該入射角決定之玻璃基板G上之位置照射切斷光L之光點S。The above-mentioned light scanning device 3 is provided on the light path that cuts off the light L. Therefore, as shown in FIG. 1, the cut light L is reflected by the mirror of the light scanning device 3. The light scanning device 3 can change the incident angle of the cut light L toward the mirror by rotating the above-mentioned mirror around the z-axis (that is, the reflection angle of the cut light at the mirror), and can be determined by the incident angle. A position on the glass substrate G irradiates a light spot S of the cut light L.
具體而言,例如,如圖2A所示般,若使光掃描裝置3之反射鏡繞z軸右旋轉,則切斷光L朝該反射鏡之入射角(亦即,切斷光L於該反射鏡之反射角)變大。藉此,切斷光L朝光修正裝置7之反射鏡之x軸之負方向(圖2A之紙面之左方向)側入射。Specifically, for example, as shown in FIG. 2A, if the mirror of the light scanning device 3 is rotated right around the z-axis, the incident angle of the cut light L toward the mirror (that is, the cut light L is at the The reflection angle of the mirror is increased. Thereby, the cut-off light L is made incident on the negative direction of the x-axis of the mirror of the light correction device 7 (the left direction of the paper surface in FIG. 2A).
藉由切斷光L朝光修正裝置之反射鏡之x軸之負方向側入射,切斷光L如圖2A所示般被該反射鏡朝x軸之負方向側反射。其結果為,切斷光L之光點S在玻璃基板G上到達x軸之負方向側。圖2A係顯示光掃描裝置之切斷光之移動方法之一例之圖。When the cut-off light L is incident toward the negative direction side of the x-axis of the mirror of the light correction device, the cut-off light L is reflected by the mirror toward the negative direction side of the x-axis as shown in FIG. 2A. As a result, the light spot S of the cut light L reaches the negative direction side of the x-axis on the glass substrate G. FIG. 2A is a diagram showing an example of a moving method of cutting light of the light scanning device.
另一方面,如圖2B所示般,若使光掃描裝置3之反射鏡繞z軸左旋轉,則切斷光L朝該反射鏡之入射角變小。藉此,切斷光L朝光修正裝置7之反射鏡之x軸之正方向(圖2A之紙面之右方向)側入射。On the other hand, as shown in FIG. 2B, if the mirror of the light scanning device 3 is rotated left about the z-axis, the incident angle of the cut light L toward the mirror becomes small. Thereby, the cut-off light L is incident toward the positive direction of the x-axis of the mirror of the light correction device 7 (the right direction of the paper surface in FIG. 2A).
藉由切斷光L朝光修正裝置之反射鏡之x軸之正方向側入射,而切斷光L如圖2B所示般被該反射鏡朝x軸之正方向側反射。其結果為,切斷光L之光點S在玻璃基板G上到達x軸之正方向側。圖2B係顯示光掃描裝置之切斷光之移動方法之另一例之圖。The cut-off light L is incident on the x-axis positive direction side of the mirror of the light correction device, and the cut-off light L is reflected by the mirror toward the x-axis positive direction side as shown in FIG. 2B. As a result, the light spot S of the cut light L reaches the positive direction side of the x-axis on the glass substrate G. FIG. 2B is a diagram showing another example of a moving method of cutting light of the light scanning device.
利用上述之原理,藉由使光掃描裝置3之反射鏡繞z軸在特定之角度範圍內高速地右旋轉及左旋轉,而可使切斷光L之光點S在玻璃基板G上,在沿切斷方向的切斷光之往復移動軌跡(圖1)上高速地往復移動。By using the above-mentioned principle, by rotating the mirror of the optical scanning device 3 right and left at a high speed within a specific angle range around the z-axis, the light spot S of the cut light L can be on the glass substrate G. The reciprocating trajectory (Fig. 1) of the cutting light along the cutting direction reciprocates at high speed.
切斷裝置100具備透鏡裝置5。透鏡裝置5係調節切斷光L在玻璃基板G側之焦點位置,而在玻璃基板G上形成切斷光L之光點S之裝置。具體而言,透鏡裝置5具有第1透鏡51及第2透鏡53。The cutting device 100 includes a lens device 5. The lens device 5 is a device that adjusts the focal position of the cut light L on the glass substrate G side, and forms a light spot S of the cut light L on the glass substrate G. Specifically, the lens device 5 includes a first lens 51 and a second lens 53.
第1透鏡51係擴大自光產生裝置1輸出之切斷光L之徑之透鏡。如圖1所示般,本實施形態之光產生裝置1朝x軸方向輸出切斷光L。因此,第1透鏡51可沿傳遞切斷光L之x軸方向移動。第1透鏡51係例如發散透鏡。第2透鏡53係入射通過第1透鏡51之切斷光L,且在與第1透鏡51相反側之光路上之特定位置聚焦切斷光L之焦點。The first lens 51 is a lens that enlarges the diameter of the cut light L output from the light generating device 1. As shown in FIG. 1, the light generating device 1 of this embodiment outputs cut-off light L in the x-axis direction. Therefore, the first lens 51 can move in the x-axis direction in which the cut-off light L is transmitted. The first lens 51 is, for example, a diverging lens. The second lens 53 is the cut light L incident through the first lens 51 and focuses the focal point of the cut light L at a specific position on the optical path opposite to the first lens 51.
上述所說明之具有第1透鏡51與第2透鏡53之透鏡裝置5,具體而言係使第1透鏡51在x軸方向上之位置變化,使由第1透鏡51聚焦之切斷光L之焦點位置變化,藉此使位於相對於第2透鏡53與第1透鏡51為相反側之切斷光L之焦點位置變化。The lens device 5 having the first lens 51 and the second lens 53 described above specifically changes the position of the first lens 51 in the x-axis direction, and causes the cut light L focused by the first lens 51 to change. The focus position is changed, thereby changing the focus position of the cut light L located on the opposite side from the second lens 53 and the first lens 51.
例如,在圖1中,使第1透鏡51朝x軸之負方向移動而使第1透鏡51靠近第2透鏡53,從而使由第1透鏡51聚焦之切斷光L之焦點位置靠近第2透鏡53,藉此可使切斷光L之焦點聚焦於相對於第2透鏡53與第1透鏡51為相反側之光路上之較遠之位置。For example, in FIG. 1, the first lens 51 is moved in the negative direction of the x-axis to bring the first lens 51 closer to the second lens 53, so that the focal position of the cut light L focused by the first lens 51 is closer to the second The lens 53 can thereby focus the focal point of the cut-off light L on a position farther away from the optical path than the second lens 53 and the first lens 51.
另一方面,使第1透鏡51朝x軸之正方向移動而使第1透鏡51遠離第2透鏡53,從而使由第1透鏡51聚焦之切斷光L之焦點位置遠離第2透鏡53,藉此可使切斷光L之焦點聚焦於相對於第2透鏡53與第1透鏡51為相反側之光路上之較近之位置。On the other hand, the first lens 51 is moved in the positive direction of the x-axis to move the first lens 51 away from the second lens 53 so that the focal position of the cut light L focused by the first lens 51 is far away from the second lens 53. Thereby, the focal point of the cut-off light L can be focused at a position closer to the optical path on the opposite side from the second lens 53 and the first lens 51.
如圖3所示般,例如,自透鏡裝置5至玻璃基板G表面之x軸方向上之切斷光L之光路長,在自光掃描裝置3朝玻璃基板G在z軸方向(高度方向)畫出垂線時該垂線與玻璃基板G之交點在x軸方向之位置處為最小。又,在x軸方向上距玻璃基板G之端部愈近,切斷光L在x軸方向上之光路長愈長。圖3係示意性地顯示切斷光L在x軸方向上之光路長變化之情形之圖,為了便於說明而省略光修正裝置7。As shown in FIG. 3, for example, the optical path length of the cutting light L in the x-axis direction from the lens device 5 to the surface of the glass substrate G is toward the glass substrate G in the z-axis direction (height direction) from the optical scanning device 3. When the vertical line is drawn, the intersection of the vertical line and the glass substrate G is the smallest at the position in the x-axis direction. The closer to the end of the glass substrate G in the x-axis direction, the longer the optical path length of the cut light L in the x-axis direction. FIG. 3 is a diagram schematically showing a change in the optical path length of the cut light L in the x-axis direction, and the light correction device 7 is omitted for convenience of explanation.
其結果為,例如,若以在光路長為最小時玻璃基板G之表面上之切斷光L之光點S之尺寸為最佳之方式調整切斷光L之焦點位置,則當切斷光L到達玻璃基板G上之其他位置時,該焦點位置非為在玻璃基板G上之該其他位置形成最佳尺寸之光點S之位置。As a result, for example, if the focal position of the cutting light L is adjusted so that the size of the light spot S of the cutting light L on the surface of the glass substrate G is optimal when the optical path length is minimized, When L reaches other positions on the glass substrate G, the focal position is not the position where the light spot S of the optimal size is formed at the other positions on the glass substrate G.
因此,在本實施形態中,控制器9(後述)相應於玻璃基板G上之切斷光L之光點S之位置,使第1透鏡51移動而調整切斷光L之焦點位置。藉此,與玻璃基板G上之切斷光L之光點S之位置無關地,可將玻璃基板G上之切斷光L之光點S之尺寸始終設為最佳。Therefore, in this embodiment, the controller 9 (to be described later) adjusts the focal position of the cut light L by moving the first lens 51 in accordance with the position of the light spot S of the cut light L on the glass substrate G. Thereby, regardless of the position of the light spot S of the cut light L on the glass substrate G, the size of the light spot S of the cut light L on the glass substrate G can always be set to the optimum.
切斷裝置100具備光修正裝置7。光修正裝置7係具有使切斷光L反射之反射鏡、及使該反射鏡繞x軸旋轉之旋轉機構之裝置。上述之旋轉機構係例如於自該反射鏡朝x軸方向延伸之軸連接有輸出旋轉軸之馬達。作為如此般之裝置,例如可使用檢流計掃描儀。The cutting device 100 includes a light correction device 7. The light correction device 7 is a device having a reflecting mirror for reflecting the cut light L, and a rotating mechanism for rotating the reflecting mirror about the x-axis. The above-mentioned rotating mechanism is, for example, a motor having an output rotating shaft connected to an axis extending from the mirror in the x-axis direction. As such a device, for example, a galvanometer scanner can be used.
如圖1所示般,光修正裝置7在x軸方向上配置於與光掃描裝置3之x軸方向上之配置位置相同之位置。又,在z軸方向(高度方向)上,亦配置於與光掃描裝置3大致相同之位置。另一方面,在y軸方向,配置於距光掃描裝置3特定距離之位置。又,如圖4所示般,光修正裝置7之反射鏡以反射面之法線朝向z軸方向之負方向(下方向)之方式傾斜特定之角度。圖4係自x軸方向觀察切斷裝置時之側視圖。As shown in FIG. 1, the light correction device 7 is arranged in the x-axis direction at the same position as the arrangement position in the x-axis direction of the light scanning device 3. Moreover, it is arrange | positioned in the z-axis direction (height direction) at substantially the same position as the optical scanning device 3. On the other hand, it is arranged at a predetermined distance from the optical scanning device 3 in the y-axis direction. As shown in FIG. 4, the mirror of the light correction device 7 is inclined at a specific angle so that the normal of the reflection surface faces the negative direction (downward direction) of the z-axis direction. Fig. 4 is a side view when the cutting device is viewed from the x-axis direction.
如此般配置之光修正裝置7使自光掃描裝置3入射之切斷光L由反射鏡反射,而使切斷光L之光點S到達玻璃基板G上。The light correction device 7 configured in this way reflects the cut light L incident from the light scanning device 3 by a reflector, and causes the light spot S of the cut light L to reach the glass substrate G.
光修正裝置7之反射鏡可繞x軸旋轉。因此,光修正裝置7藉由使反射鏡繞x軸之旋轉角度變化,而可使切斷光L之光點S在y軸方向移動。在本實施形態中,y軸方向與玻璃基板G之切斷方向即x軸方向垂直。以下,將本實施形態之y軸方向稱為「修正方向」。The mirror of the light correction device 7 is rotatable around the x-axis. Therefore, by changing the rotation angle of the mirror about the x-axis, the light correction device 7 can move the light spot S of the cut light L in the y-axis direction. In this embodiment, the y-axis direction is perpendicular to the x-axis direction, which is the cutting direction of the glass substrate G. Hereinafter, the y-axis direction of this embodiment is referred to as a "correction direction".
具體而言,例如,當使光修正裝置7之反射鏡之旋轉角度自圖4所示之角度右旋轉而變化時,如圖5A所示般,切斷光L朝該反射鏡之入射角變大。其結果為,切斷光L之光點S自圖4所示之位置朝y軸之負方向(圖5A中為紙面左方向)移動。圖5A係顯示光修正裝置所致之切斷光之移動之一例之圖。Specifically, for example, when the rotation angle of the mirror of the light correction device 7 is changed from the angle shown in FIG. 4 to the right, as shown in FIG. 5A, the incident angle of the cut light L toward the mirror is changed. Big. As a result, the light spot S of the cut-off light L moves from the position shown in FIG. 4 to the negative direction of the y-axis (the left direction of the paper surface in FIG. 5A). FIG. 5A is a diagram showing an example of the movement of cut-off light by the light correction device.
另一方面,當使光修正裝置7之反射鏡之旋轉角度自圖4所示之角度左旋轉而變化時,如圖5B所示般,切斷光L朝該反射鏡之入射角變小。其結果為,切斷光L之光點S自圖4所示之位置朝y軸之正方向(圖5B中為紙面右方向)移動。圖5B係顯示光修正裝置所致之切斷光之移動之另一例之圖。On the other hand, when the rotation angle of the mirror of the light correction device 7 is changed from the angle shown in FIG. 4 to the left, as shown in FIG. 5B, the incident angle of the cut light L toward the mirror becomes smaller. As a result, the light spot S of the cut light L moves from the position shown in FIG. 4 toward the positive direction of the y-axis (the right direction on the paper surface in FIG. 5B). FIG. 5B is a diagram showing another example of the movement of the cut-off light by the light correction device.
切斷裝置100具備控制器9。控制器9係具有處理器(例如,CPU)、記憶裝置(例如,ROM、RAM、HDD、SSD等)、及各種介面(例如,A/D轉換器、D/A轉換器、通訊介面等)之電腦系統。控制器9藉由執行保存於記憶部(對應於記憶裝置之記憶區域之一部分或全部)之程式而進行各種控制動作。The cutting device 100 includes a controller 9. The controller 9 has a processor (for example, a CPU), a memory device (for example, ROM, RAM, HDD, SSD, etc.), and various interfaces (for example, A / D converter, D / A converter, communication interface, etc.) Computer system. The controller 9 performs various control operations by executing programs stored in the memory (corresponding to a part or all of the memory area of the memory device).
控制器9可由單一處理器構成,亦可由用於進行各控制而獨立的複數個處理器構成。The controller 9 may be constituted by a single processor, or may be constituted by a plurality of processors that are independent for each control.
控制器9可控制光產生裝置1、光掃描裝置3、透鏡裝置5之第1透鏡51、及光修正裝置7。又,控制器9亦可控制基板搬送裝置10、及切斷裝置100之移動。The controller 9 can control the light generating device 1, the light scanning device 3, the first lens 51 of the lens device 5, and the light correction device 7. The controller 9 may also control the movement of the substrate transfer device 10 and the cutting device 100.
雖未圖示,於控制器9連接有用於檢測各裝置之狀態之感測器及開關、以及資訊輸入裝置。又,雖未圖示,於控制器9亦可連接有檢測形成於玻璃基板G之切斷線C之龜裂長度之感測器及/或照相機。Although not shown, a sensor and a switch for detecting the status of each device, and an information input device are connected to the controller 9. Also, although not shown, a sensor and / or a camera may be connected to the controller 9 to detect the crack length of the cutting line C formed on the glass substrate G.
藉由具有上述之構成,切斷裝置100可使自光產生裝置1產生之切斷光L之光點S在x軸、y軸、及z軸之3軸方向上移動。亦即,切斷裝置100可使在玻璃基板G上形成切斷線C之龜裂之切斷光L之光點S以所期望之尺寸到達玻璃基板G上之所期望之位置。With the above-mentioned configuration, the cutting device 100 can move the light point S of the cutting light L generated from the light generating device 1 in three directions of the x-axis, the y-axis, and the z-axis. That is, the cutting device 100 can reach the desired position on the glass substrate G with a desired size of the light spot S of the cutting light L that forms a crack on the cutting line C on the glass substrate G.
(2)切斷裝置之動作 以下,對切斷由基板搬送裝置10搬送之玻璃基板G時之切斷裝置100之動作進行說明。 首先,於玻璃基板G之切斷方向(x軸方向)之端部形成被稱為「初始龜裂」之、藉由切斷光L形成之成為玻璃基板G之切斷開始點之龜裂。該初始龜裂例如使用金剛石切刀、陶瓷切刀等切刀實體地形成。(2) Operation of the cutting device The operation of the cutting device 100 when cutting the glass substrate G transferred by the substrate transfer device 10 will be described below. First, at the end of the cutting direction (x-axis direction) of the glass substrate G, a crack called "initial crack", which is formed by the cutting light L and forms the cutting start point of the glass substrate G, is formed. This initial crack is physically formed using a cutter such as a diamond cutter or a ceramic cutter.
另外,亦可藉由將能量密度經提高之切斷光L之光點S朝欲形成玻璃基板G之切斷方向之端部之初始龜裂側集中照射而形成初始龜裂。具體而言,例如,在形成正式之切斷線C之龜裂前,控制器9調整第1透鏡51之位置而使切斷光L在玻璃基板G之該端部之附近聚焦,其後,控制光掃描裝置3,使切斷光L之光點S在玻璃基板G之該端部附近之x軸方向之狹窄範圍內往復移動,或者於玻璃基板G之該端部停止。In addition, the initial crack can also be formed by concentratingly irradiating the light spot S of the cutting light L having an increased energy density toward the initial crack side of the end in the cutting direction of the glass substrate G to be formed. Specifically, for example, the controller 9 adjusts the position of the first lens 51 so that the cutting light L is focused near the end of the glass substrate G before the crack of the formal cutting line C is formed, and thereafter, The light scanning device 3 is controlled so that the light spot S of the cut light L reciprocates within a narrow range in the x-axis direction near the end portion of the glass substrate G, or stops at the end portion of the glass substrate G.
當在玻璃基板G之端部形成初始龜裂後,藉由使切斷光L之光點在與切斷方向(x軸方向)平行之往復移動軌跡上自形成有初始龜裂之端部至相反側之端部往復移動而加熱玻璃基板G,使玻璃基板G產生熱應力而使龜裂自初始龜裂延展,而於玻璃基板G形成切斷線C之龜裂。After the initial crack is formed at the end of the glass substrate G, the light spot of the cutting light L is moved from the end where the initial crack is formed to a reciprocating trajectory parallel to the cutting direction (x-axis direction) to The opposite end portion reciprocates to heat the glass substrate G, which causes thermal stress on the glass substrate G to cause cracks to extend from the initial cracks, and forms cracks on the glass substrate G at the cutting line C.
當使切斷光L之光點S在切斷方向往復移動時,隨著切斷線C之龜裂之形成,在未形成切斷線C之龜裂之範圍內縮小切斷光L之光點S之往復移動之範圍。切斷光L之光點S之往復移動之範圍可檢測已形成切斷線C之龜裂之範圍而決定,亦可以在實驗中預先測定切斷線C之龜裂之延展速度,基於該測定結果逐漸縮小切斷光L之光點S之往復移動範圍之方式使切斷裝置100動作。When the light spot S of the cutting light L is reciprocated in the cutting direction, as the crack of the cutting line C is formed, the light of the cutting light L is reduced within a range where the crack of the cutting line C is not formed. Range of reciprocating movement of point S. The range of the reciprocating movement of the light point S of the cutting light L can be determined by detecting the range of the crack that has formed the cutting line C. The extension speed of the crack of the cutting line C can also be measured in advance in the experiment. Based on this measurement As a result, the cutting device 100 is operated by gradually reducing the reciprocating range of the light spot S of the cutting light L.
具體而言,控制器9掌握當前形成於玻璃基板G之切斷線C之龜裂之長度。切斷線C之龜裂之長度可藉由下述方式而掌握,例如,在利用照相機等拍攝形成切斷線C之龜裂的過程中之玻璃基板G後,利用圖像辨識等識別切斷線C之龜裂,且藉由圖像處理等測定切斷線C之龜裂之長度。Specifically, the controller 9 grasps the length of the crack of the cutting line C currently formed on the glass substrate G. The length of the crack of the cutting line C can be grasped in the following manner. For example, after the glass substrate G in the process of forming the crack of the cutting line C is captured by a camera or the like, the cutting is identified by image recognition or the like. The crack of the line C is measured, and the length of the crack of the cut line C is measured by image processing or the like.
在其他實施形態中,控制器9亦可使用例如光感測器,基於通過切斷線C之龜裂(不存在玻璃基板G之部位)之光之強度與通過玻璃基板G之光之強度之不同,而掌握切斷線C之龜裂之長度。In other embodiments, the controller 9 may use, for example, a light sensor based on the intensity of the light passing through the crack (the portion where the glass substrate G does not exist) passing through the cutting line C and the intensity of the light passing through the glass substrate G. Different, but grasp the length of the crack of the cutting line C.
在又一實施形態中,例如,可在預先模擬或在實驗中預先掌握切斷裝置100之切斷線C之形成過程,算出自切斷線C之龜裂之形成開始之經過時刻與切斷線C之龜裂之關係(龜裂之延展速度),由控制器9根據自開始切斷光L之光點S往復移動起之經過時刻與上述之關係(亦即,龜裂之延展速度)算出所形成之切斷線C之龜裂之長度。In another embodiment, for example, the formation process of the cutting line C of the cutting device 100 can be grasped in advance by simulation or experiments in advance, and the elapsed time and cutting time from the start of the formation of the crack of the cutting line C can be calculated. The relationship between the cracks of the line C (the spreading speed of the cracks) is determined by the controller 9 based on the elapsed time since the light point S that started to cut off the light L reciprocates (ie, the spreading speed of the cracks) Calculate the length of the cracks in the cutting line C formed.
掌握所形成之切斷線C之龜裂之當前長度後,控制器9決定使切斷光L之光點S在往復移動軌跡上往復移動之範圍。控制器9將自未形成上述之初始龜裂側之玻璃基板G之端部之x軸座標值、至已形成切斷線C之龜裂之端部之x軸座標值決定為切斷光L之光點S在切斷方向(x軸方向)上之往復移動之範圍。亦即,控制器9將切斷光L之光點S之往復移動之範圍作為玻璃基板G之未形成切斷線C之龜裂之範圍(稱為未切斷區域)。After grasping the current length of the crack of the formed cutting line C, the controller 9 determines a range in which the light point S of the cutting light L reciprocates on the reciprocating trajectory. The controller 9 determines the x-axis coordinate value from the end portion of the glass substrate G on which the initial crack side is not formed to the x-axis coordinate value of the end portion where the cut line C has been formed as the cut light L The range in which the light spot S reciprocates in the cutting direction (x-axis direction). That is, the controller 9 uses the range of the reciprocating movement of the light spot S of the cut light L as a range of the glass substrate G where the cut line C is not formed (referred to as an uncut area).
已形成之切斷線C之龜裂之端部的x座標值例如,可作為形成玻璃基板G之初始龜裂側之x座標值與上述已算出之切斷線C之龜裂之當前之長度之差分而算出。The x-coordinate value of the cracked end of the formed cutting line C can be, for example, the x-coordinate value of the initial cracked side forming the glass substrate G and the current length of the cracked cut line C calculated above. The difference is calculated.
在其他實施形態中,使切斷光L之光點S往復移動之範圍亦可與已形成之切斷線C之龜裂之一部分重複。亦即,控制器9亦可使切斷光L之光點S往復移動之範圍較未切斷區域在x軸方向之長度稍寬廣。藉此,可使切斷光L朝未形成切斷線C之龜裂之未切斷區域確實地照射。In other embodiments, the range in which the light spot S of the cutting light L is reciprocated may be overlapped with a part of the crack of the cutting line C that has been formed. That is, the controller 9 can make the range of the light spot S of the cut light L reciprocating slightly wider than the length of the uncut area in the x-axis direction. Thereby, the cutting light L can be reliably irradiated to the uncut area where the crack of the cutting line C is not formed.
在算出使切斷光L之光點S往復移動之範圍之兩端之x座標值後,控制器9根據該兩端之x座標值算出光掃描裝置3之反射鏡之旋轉角度範圍,並朝光掃描裝置3輸出使反射鏡在該旋轉角度範圍內正反旋轉之控制信號。藉此,切斷光L之光點S在未切斷區域沿切斷方向往復移動。After calculating the x-coordinate values at both ends of the range where the light point S of the cut-off light L is reciprocated, the controller 9 calculates the rotation angle range of the mirror of the optical scanning device 3 according to the x-coordinate values at the two ends, and The optical scanning device 3 outputs a control signal that rotates the mirror forward and backward within the rotation angle range. Thereby, the light spot S of the cutting light L is reciprocated in the cutting direction in the uncut area.
重複掌握上述之切斷線C之龜裂之長度、決定切斷光L之光點S之往復移動範圍、以及變更切斷光L之光點S之往復移動範圍,直至切斷線C之龜裂遍及玻璃基板G在x軸方向(寬度方向)之大致整個區域。Repeatedly grasp the length of the crack of the cutting line C, determine the reciprocating range of the light point S of the cutting light L, and change the reciprocating range of the light point S of the cutting light L until the turtle of the cutting line C The crack is spread over substantially the entire area of the glass substrate G in the x-axis direction (width direction).
藉此,如圖6之(1)~(4)所示般,隨著切斷線C之龜裂之形成,控制器9可將切斷光L之光點S之往復移動範圍由L1朝L4(L1>L2>L3>L4)縮小。亦即,可將切斷光L在玻璃基板G上之往復移動範圍僅限制在未切斷區域。其結果為,可使自光產生裝置1產生之切斷光L在不浪費切斷光L之能量下高效率地朝應當形成玻璃基板G之切斷線C之龜裂之區域集中照射。圖6係示意性地顯示第1實施形態之切斷裝置之朝玻璃基板的切斷光之照射方法之圖。Thereby, as shown in (1) to (4) of FIG. 6, as the crack of the cutting line C is formed, the controller 9 can change the reciprocating range of the light point S of the cutting light L from L1 toward L4 (L1> L2> L3> L4) is reduced. That is, the reciprocating range of the cutting light L on the glass substrate G can be limited to only the uncut area. As a result, it is possible to efficiently irradiate the cutting light L generated from the light generating device 1 to a region where the crack of the cutting line C of the glass substrate G should be formed without wasting the energy of the cutting light L. FIG. 6 is a diagram schematically showing a method of irradiating cutting light to a glass substrate of the cutting device according to the first embodiment.
在本實施形態中,控制器9藉由使光掃描裝置3之反射鏡以一定之旋轉速度旋轉,而使切斷光L之光點S在玻璃基板G上以一定之速度往復移動。因此,藉由隨著切斷線C之龜裂之形成而縮小切斷光L之光點S之往復移動範圍,而可增加切斷光L之光點S在未切斷區域內之特定位置之通過頻度。亦即,未切斷區域愈狹窄,可以愈高之能量密度L朝玻璃基板G之表面照射切斷光。In this embodiment, the controller 9 causes the mirror of the light scanning device 3 to rotate at a constant rotation speed, so that the light spot S of the cut light L is reciprocated at a constant speed on the glass substrate G. Therefore, by reducing the reciprocating range of the light spot S of the cutting light L as the crack of the cutting line C is formed, the specific position of the light spot S of the cutting light L in the uncut area can be increased. The frequency of passage. That is, the narrower the uncut region, the higher the energy density L can be irradiated to the surface of the glass substrate G with the cutting light.
由於未切斷區域愈狹窄,可以愈高之能量密度朝玻璃基板G之表面照射切斷光L,因此本實施形態之切斷裝置100特別地,可實現在開始玻璃基板G之切斷後經過時間愈長,愈增大切斷線C之龜裂之延展速度。其結果為,與即便形成切斷線C之龜裂但朝玻璃基板之寬度方向之整個區域照射切斷光之情形相比,可以更短時間切斷玻璃基板G。The narrower the uncut region, the higher the energy density can be irradiated with the cutting light L toward the surface of the glass substrate G. Therefore, the cutting device 100 of this embodiment can realize the elapsed time after the cutting of the glass substrate G is started. The longer the crack propagation speed of the cutting line C is increased. As a result, the glass substrate G can be cut in a shorter time as compared with the case where the cutting light is irradiated to the entire area in the width direction of the glass substrate even if a crack of the cutting line C is formed.
惟,當朝未切斷區域以過量之能量密度照射切斷光L時,存在因該過量能量而在玻璃基板G產生非意圖之損傷之情況。因此,在本實施形態之切斷裝置100中,控制器9以根據未切斷區域在切斷方向(x軸方向)之長度使在玻璃基板G上之切斷光L之光點S之尺寸變化之方式使第1透鏡51移動。However, when the cutting light L is irradiated with an excessive energy density toward the uncut area, the glass substrate G may be damaged unintentionally due to the excessive energy. Therefore, in the cutting device 100 of the present embodiment, the controller 9 makes the size of the light spot S of the cutting light L on the glass substrate G according to the length of the uncut area in the cutting direction (x-axis direction). The changed manner moves the first lens 51.
具體而言,如圖6之(1)~(4)所示般,控制器9以使切斷光L之光點S之尺寸無關於光點S在x軸方向之位置而設為一定,且根據未切斷區域在切斷方向之長度自L1朝L4變短而使切斷光L之光點S之尺寸自S1朝S4(S1<S2<S3<S4)增加之方式調整第1透鏡51之位置。藉此,抑制切斷光L以過量之能量密度朝切斷方向之長度變短之未切斷區域照射,而可防止於玻璃基板G產生非意圖之損傷。Specifically, as shown in (1) to (4) of FIG. 6, the controller 9 makes the size of the light spot S of the cut-off light L constant regardless of the position of the light spot S in the x-axis direction. And adjust the first lens in such a way that the length of the uncut area in the cutting direction becomes shorter from L1 to L4, and the size of the light spot S of the cutting light L increases from S1 to S4 (S1 <S2 <S3 <S4) 51 的 位置。 51 position. This prevents the cutting light L from being irradiated to the uncut area where the length of the cutting direction becomes short with an excessive energy density, and prevents the glass substrate G from being damaged unintentionally.
2.第2實施形態 上述所說明之第1實施形態之切斷裝置100所具備之光修正裝置7在切斷玻璃基板G步驟中,僅使切斷光L之光點S到達玻璃基板G之表面。然而,可如第1實施形態所說明般,光修正裝置7使切斷光L之光點S在與切斷線C之龜裂之形成方向(切斷方向)垂直之y軸方向移動。2. Second Embodiment In the light correction device 7 included in the cutting device 100 according to the first embodiment described above, in the step of cutting the glass substrate G, only the light spot S of the cutting light L reaches the glass substrate G. surface. However, as described in the first embodiment, the light correction device 7 may move the light spot S of the cutting light L in the y-axis direction perpendicular to the direction (cutting direction) in which the cracks on the cutting line C are formed.
在切斷裝置100中,當使光掃描裝置3之反射鏡以特定之角度範圍正反旋轉,及/或調整第1透鏡51之位置,使切斷光L之光點S在玻璃基板G上沿切斷方向往復移動時,存在切斷光L之光點S如圖7所示般偏離原本之往復移動軌跡之情形。具體而言,切斷光L之光點S之往復移動軌跡自原本之往復移動軌跡朝y軸方向偏移。圖7係顯示偏離原本之往復移動軌跡之切斷光之光點S在玻璃基板上之軌跡之一例之圖。In the cutting device 100, when the mirror of the light scanning device 3 is rotated forward and backward in a specific angle range, and / or the position of the first lens 51 is adjusted, the light spot S of the cutting light L is on the glass substrate G. When reciprocating in the cutting direction, the light spot S of the cutting light L may deviate from the original reciprocating trajectory as shown in FIG. 7. Specifically, the reciprocating trajectory of the light point S of the cut-off light L is shifted from the original reciprocating trajectory in the y-axis direction. FIG. 7 is a diagram showing an example of the trajectory of the light spot S of the cut light on the glass substrate which deviates from the original reciprocating trajectory.
該軌跡之偏移之原因為光掃描裝置3及/或透鏡裝置5之設置狀況、構造上之誤差等,僅藉由調整光掃描裝置3及/或透鏡裝置5而消除或者有所困難,或者在調整上需要較多時間。The reason for the deviation of the trajectory is the installation conditions and structural errors of the light scanning device 3 and / or the lens device 5, which are eliminated or difficult only by adjusting the light scanning device 3 and / or the lens device 5, or It takes more time to adjust.
因此,在第2實施形態中,藉由控制器9在玻璃基板G之切斷步驟中,依據原本之往復移動軌跡與切斷光L之光點S往復移動時實際之軌跡之偏移量,使切斷光L之光點S朝修正方向移動,而修正上述之軌跡之偏移。Therefore, in the second embodiment, in the cutting step of the glass substrate G by the controller 9, based on the offset amount of the actual trajectory when the original reciprocating trajectory and the light spot S of the cutting light L are reciprocated, The light spot S of the cut-off light L is moved in the correction direction, and the above-mentioned offset of the trajectory is corrected.
具體而言,如以下般修正切斷光L之光點S之軌跡之偏移。首先,例如藉由在固定光修正裝置7之反射鏡之角度後,使光掃描裝置3之反射鏡在特定之角度範圍內正反旋轉,且調整第1透鏡51之位置使切斷光L之光點S實際在切斷方向上往復移動而掌握使切斷光L在y軸方向不移動時之軌跡與原本之往復移動軌跡之偏移量。Specifically, the deviation of the locus of the light spot S of the cut-off light L is corrected as follows. First, for example, after the angle of the mirror of the light correction device 7 is fixed, the mirror of the light scanning device 3 is rotated forward and backward within a specific angle range, and the position of the first lens 51 is adjusted to cut off the light L. The light spot S actually moves back and forth in the cutting direction to grasp the offset between the trajectory when the cutting light L does not move in the y-axis direction and the original reciprocating movement trajectory.
如上述般在掌握切斷光L之光點S在y軸方向之偏移量後,將切斷光L之光點S之x座標值、與各x座標值的切斷光L之光點S在y軸方向之偏移量之關係例如作為x座標值之函數而預先算出。As described above, after grasping the shift amount of the light point S of the cutting light L in the y-axis direction, the x-coordinate value of the light point S of the cutting light L and the light point of the cutting light L of each x-coordinate value are determined. The relationship of the shift amount of S in the y-axis direction is calculated in advance as a function of the x-coordinate value, for example.
在算出上述之關係後,控制器9在為了切斷玻璃基板G而使切斷光L往復移動之期間,利用切斷光L之光點S當前之x座標值與上述之函數,算出位於當前之x座標值之切斷光L之光點S在y軸方向之偏移量。After calculating the above-mentioned relationship, the controller 9 uses the function of the current x-coordinate of the light point S of the cutting light L and the above-mentioned function to calculate the current position during the reciprocating movement of the cutting light L in order to cut the glass substrate G. The amount of shift in the y-axis direction of the light spot S of the cut light L at the x-coordinate value.
其後,控制器9藉由一面使切斷光L之光點S往復移動,一面使光修正裝置7之反射鏡旋轉與上述所算出之在y軸方向之偏移量相應之角度,而使切斷光L之光點S在y軸方向移動,可如圖8所示般使切斷光L之光點S在原本之往復移動軌跡上往復移動。圖8係示意性地顯示切斷光之往復移動軌跡之修正方法之一例之圖。Thereafter, the controller 9 causes the light spot S of the cut light L to reciprocate while rotating the mirror of the light correction device 7 by an angle corresponding to the calculated offset in the y-axis direction, so that The light spot S of the cutting light L is moved in the y-axis direction, and the light spot S of the cutting light L can be reciprocated on the original reciprocating trajectory as shown in FIG. 8. FIG. 8 is a diagram schematically showing an example of a method of correcting the reciprocating trajectory of cut-off light.
如上述般,在第2實施形態中,可修正以光掃描裝置3及/或透鏡裝置5之設置狀況、構造上之誤差等為原因的切斷光L之光點S之軌跡在y軸方向之偏移。其結果為,可在不進行光掃描裝置3及/或透鏡裝置5之調整下,使切斷光L之光點S沿適切之切斷方向往復移動。As described above, in the second embodiment, the trajectory of the light spot S of the cut-off light L due to the installation conditions and structural errors of the optical scanning device 3 and / or the lens device 5 can be corrected in the y-axis direction. Of the offset. As a result, without adjusting the optical scanning device 3 and / or the lens device 5, the light spot S of the cut light L can be reciprocated in a proper cutting direction.
3.實施形態之共通事項 上述第1及第2實施形態共通具有下述之構成及功能。 第1實施形態及第2實施形態之玻璃基板G(玻璃基板之一例)之切斷裝置100(切斷裝置之一例)具備光產生裝置1(光產生裝置之一例)、及光掃描裝置3(光掃描裝置之一例)。光產生裝置1輸出切斷玻璃基板G之切斷光L(切斷光之一例)。光掃描裝置3係使切斷光L之光點S(切斷光之光點之一例)沿玻璃基板G之切斷方向往復移動之裝置。光掃描裝置3將切斷光L之光點S之往復移動之範圍限制在玻璃基板G之切斷線C之龜裂(切斷線C之一例)未形成之未切斷區域。3. Common aspects of the embodiments The above-mentioned first and second embodiments have the following structures and functions in common. The cutting device 100 (an example of a cutting device) of the glass substrate G (an example of a glass substrate) of the first and second embodiments includes a light generating device 1 (an example of a light generating device) and a light scanning device 3 ( An example of an optical scanning device). The light generating device 1 outputs cut light L (an example of cut light) that cuts the glass substrate G. The optical scanning device 3 is a device that reciprocates the light spot S of the cut light L (an example of the light spot of the cut light) in the cutting direction of the glass substrate G. The optical scanning device 3 limits the range of the reciprocating movement of the light spot S of the cut light L to an uncut area where a crack (a example of the cut line C) of the cut line C of the glass substrate G is not formed.
在切斷裝置100中,光掃描裝置3將用於切斷玻璃基板G的切斷光L之光點S在玻璃基板G上之往復移動之範圍限制在玻璃基板G之切斷線C之龜裂未形成之未切斷區域。藉此,可僅朝應當形成玻璃基板G之切斷線C之龜裂之區域照射切斷光L。其結果為,可在不浪費該切斷光L之能量下,朝應當形成玻璃基板G之切斷線C之龜裂之區域高效率地照射自光產生裝置1產生之切斷光L。In the cutting device 100, the light scanning device 3 limits the range of the reciprocating movement of the light spot S of the cutting light L on the glass substrate G to the cutting line C of the glass substrate G to the turtle of the cutting line C of the glass substrate G. Uncut areas that are not formed. Thereby, the cutting light L can be irradiated only to the area where the crack of the cutting line C of the glass substrate G should be formed. As a result, the cutting light L generated from the light generating device 1 can be efficiently irradiated to a region where the crack of the cutting line C of the glass substrate G should be formed without wasting the energy of the cutting light L.
4.其他實施形態 以上說明了本發明之複數個實施形態,但本發明並不限定於上述實施形態,在不脫離發明之要旨之範圍內可進行各種變更。特別是,本說明書中所述之複數個實施形態及變化例可根據需要任意地組合。 (A)若透鏡裝置5可變更切斷光L之焦點位置,則亦可由1個透鏡構成。作為如上述之可變更光之焦點位置(焦點距離)之透鏡,可使用例如藉由電信號等變更該透鏡之曲率而使焦點距離為可變之電子焦點可變透鏡。4. Other Embodiments A plurality of embodiments of the present invention have been described above, but the present invention is not limited to the above embodiments, and various changes can be made without departing from the gist of the invention. In particular, a plurality of embodiments and modifications described in this specification can be arbitrarily combined as required. (A) If the lens device 5 can change the focal position of the cut-off light L, it can also be comprised by one lens. As the lens that can change the focal position (focus distance) of light as described above, for example, an electronic focus variable lens whose focal distance can be changed by changing the curvature of the lens by an electric signal or the like can be used.
(B)在上述之第1實施形態及第2實施形態中,除了玻璃基板G利用基板搬送裝置10在y軸方向移動以外,亦使切斷裝置100在y軸方向移動。但是,並不限定於此,例如,在可藉由短時間之切斷光L之照射切斷玻璃基板G時(例如,玻璃基板G之寬度尺寸較小、玻璃基板G之搬送速度較慢時等),光修正裝置7亦可隨著玻璃基板G在y軸方向之搬送,使切斷光L之光點S在y周方向移動。藉此,無須將切斷裝置100在y軸方向移動。 [產業上之可利用性](B) In the first and second embodiments described above, in addition to the glass substrate G being moved in the y-axis direction by the substrate transfer device 10, the cutting device 100 is also moved in the y-axis direction. However, it is not limited to this. For example, when the glass substrate G can be cut by irradiation with the cutting light L for a short time (for example, when the width dimension of the glass substrate G is small and the glass substrate G has a slower conveying speed) Etc.), the light correction device 7 may move the light spot S of the cut light L in the y-peripheral direction as the glass substrate G is conveyed in the y-axis direction. This eliminates the need to move the cutting device 100 in the y-axis direction. [Industrial availability]
本發明可廣泛應用於玻璃基板的切斷裝置。The invention can be widely applied to a cutting device for a glass substrate.
1‧‧‧光產生裝置 1‧‧‧light generating device
3‧‧‧光掃描裝置 3‧‧‧ light scanning device
5‧‧‧透鏡裝置 5‧‧‧ lens device
7‧‧‧光修正裝置 7‧‧‧ light correction device
9‧‧‧控制器 9‧‧‧ Controller
10‧‧‧搬送裝置 10‧‧‧ transport device
51‧‧‧第1透鏡 51‧‧‧1st lens
53‧‧‧第2透鏡 53‧‧‧ 2nd lens
100‧‧‧切斷裝置 100‧‧‧ cutting device
C‧‧‧切斷線 C‧‧‧cut line
G‧‧‧玻璃基板 G‧‧‧ glass substrate
L‧‧‧切斷光 L‧‧‧ Cut off light
L1~L4‧‧‧往復移動範圍 L1 ~ L4‧‧‧‧Reciprocating range
S‧‧‧光點 S‧‧‧light spot
S1~S4‧‧‧光點尺寸 S1 ~ S4‧‧‧ Light spot size
圖1係第1實施形態之切斷裝置之俯視圖。 圖2A係顯示光掃描裝置之切斷光之移動方法之一例之圖。 圖2B係顯示光掃描裝置之切斷光之移動方法之另一例之圖。 圖3係示意性地顯示切斷光L在x軸方向之光路長發生變化之樣態之圖。 圖4係自x軸方向觀察切斷裝置時之側視圖。 圖5A係顯示光修正裝置所致之切斷光之移動之一例之圖。 圖5B係顯示光修正裝置所致之切斷光之移動之另一例之圖。 圖6(1)~圖6(4)係示意性地顯示第1實施形態之切斷裝置之朝玻璃基板的切斷光之照射方法之圖。 圖7係顯示偏離原本之往復移動軌跡之切斷光在玻璃基板上之軌跡之一例之圖。 圖8係示意性地顯示切斷光之往復移動軌跡之修正方法之一例之圖。Fig. 1 is a plan view of a cutting device according to a first embodiment. FIG. 2A is a diagram showing an example of a moving method of cutting light of the light scanning device. FIG. 2B is a diagram showing another example of a moving method of cutting light of the light scanning device. FIG. 3 is a diagram schematically showing a state in which the optical path length of the cut light L in the x-axis direction is changed. Fig. 4 is a side view when the cutting device is viewed from the x-axis direction. FIG. 5A is a diagram showing an example of the movement of cut-off light by the light correction device. FIG. 5B is a diagram showing another example of the movement of the cut-off light by the light correction device. FIGS. 6 (1) to 6 (4) are diagrams schematically showing a method of irradiating cutting light to a glass substrate in the cutting device of the first embodiment. FIG. 7 is a diagram showing an example of the trajectory of the cut light on the glass substrate which deviates from the original reciprocating trajectory. FIG. 8 is a diagram schematically showing an example of a method of correcting the reciprocating trajectory of cut-off light.
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US5132505A (en) | 1990-03-21 | 1992-07-21 | U.S. Philips Corporation | Method of cleaving a brittle plate and device for carrying out the method |
JPH1119784A (en) * | 1997-07-02 | 1999-01-26 | Matsushita Electric Ind Co Ltd | Method and device for cutting brittle material |
CN201737838U (en) * | 2010-05-06 | 2011-02-09 | 湖北扬子江光电仪器有限公司 | Ultraviolet laser cutting device |
JP5409711B2 (en) * | 2011-06-29 | 2014-02-05 | 三星ダイヤモンド工業株式会社 | Laser beam workpiece processing equipment |
JP2013078780A (en) * | 2011-10-04 | 2013-05-02 | Mitsuboshi Diamond Industrial Co Ltd | Laser beam machining apparatus |
JP5922906B2 (en) * | 2011-10-18 | 2016-05-24 | 三星ダイヤモンド工業株式会社 | Glass substrate processing equipment by laser beam |
JP5879106B2 (en) * | 2011-11-25 | 2016-03-08 | 三星ダイヤモンド工業株式会社 | Method for scribing a brittle material substrate |
KR101388181B1 (en) * | 2012-09-04 | 2014-04-30 | (주)하드램 | Laser cutting apparatus for glass substrate and method for cutting glass substrate |
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JP2014231071A (en) * | 2013-05-29 | 2014-12-11 | 三星ダイヤモンド工業株式会社 | Substrate cutting device by using laser beam |
US10017411B2 (en) * | 2014-11-19 | 2018-07-10 | Corning Incorporated | Methods of separating a glass web |
US11008244B2 (en) * | 2015-11-25 | 2021-05-18 | Corning Incorporated | Methods of separating a glass web |
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