TW201919879A - Optical body and window material - Google Patents

Optical body and window material Download PDF

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Publication number
TW201919879A
TW201919879A TW107131053A TW107131053A TW201919879A TW 201919879 A TW201919879 A TW 201919879A TW 107131053 A TW107131053 A TW 107131053A TW 107131053 A TW107131053 A TW 107131053A TW 201919879 A TW201919879 A TW 201919879A
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Taiwan
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transparent inorganic
inorganic layer
layer
optical body
thickness
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TW107131053A
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Chinese (zh)
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後藤一夫
和田豊
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日商迪睿合股份有限公司
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Publication of TW201919879A publication Critical patent/TW201919879A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • EFIXED CONSTRUCTIONS
    • E06DOORS, WINDOWS, SHUTTERS, OR ROLLER BLINDS IN GENERAL; LADDERS
    • E06BFIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES, FENCES OR LIKE ENCLOSURES IN GENERAL, e.g. DOORS, WINDOWS, BLINDS, GATES
    • E06B5/00Doors, windows, or like closures for special purposes; Border constructions therefor
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • EFIXED CONSTRUCTIONS
    • E06DOORS, WINDOWS, SHUTTERS, OR ROLLER BLINDS IN GENERAL; LADDERS
    • E06BFIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES, FENCES OR LIKE ENCLOSURES IN GENERAL, e.g. DOORS, WINDOWS, BLINDS, GATES
    • E06B3/00Window sashes, door leaves, or like elements for closing wall or like openings; Layout of fixed or moving closures, e.g. windows in wall or like openings; Features of rigidly-mounted outer frames relating to the mounting of wing frames
    • E06B3/66Units comprising two or more parallel glass or like panes permanently secured together

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Special Wing (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

Provided is an optical body which has excellent resistance to ultraviolet rays, while being suppressed in the color of reflected light and changes thereof. This optical body is provided with a base layer, a first transparent inorganic layer and a second transparent inorganic layer, and is characterized in that: the first transparent inorganic layer is composed of a transparent inorganic layer A, a transparent inorganic layer B, and an intermediate partition layer that is arranged between the transparent inorganic layer A and the transparent inorganic layer B; the first transparent inorganic layer is arranged on the base layer so that the transparent inorganic layer B is on the base layer side; and the second transparent inorganic layer is arranged on the first transparent inorganic layer.

Description

光學體與窗材Optical body and window material

本發明是有關於一種光學體與窗材,更具體而言,是有關於一種耐紫外線性優異且可減少反射光的色澤及其變化的光學體、以及包括光學體的窗材。The present invention relates to an optical body and a window material, and more particularly, to an optical body having excellent ultraviolet resistance and capable of reducing the color and change of reflected light, and a window material including the same.

近年來,於包含高層大樓或高層公寓等的建築物中,於所搭載的窗玻璃等上光進行反射,給其他鄰近的建築物的利用者帶來眩光的所謂的反射光危害頻繁成為問題。該問題於以下方面等亦成為一個原因:於都市部中玻璃鑲嵌的大樓增加而反射光自身增多的方面,以及容納大量住戶的高層公寓增加,遭受光危害的一側增多的方面。於此種狀況下,要求於建築物的建設時採取針對所述反射光危害的充分的對策。In recent years, in buildings including high-rise buildings, high-rise apartments, and the like, the so-called reflected light hazard, which reflects glare on the installed window glass and the like, and brings glare to users of other neighboring buildings, has frequently become a problem. This problem is also a cause in the following aspects: the increase in the number of glass-inlaid buildings in the Ministry of Urban Affairs and the increase in reflected light itself; Under such circumstances, it is required to take sufficient countermeasures against the hazard of the reflected light during the construction of the building.

此處,作為源自建築物的窗玻璃的反射光的眩光對策,例如可列舉於建築物的牆面設置百葉窗等來直接遮擋反射光的方法。但是,關於百葉窗的設置,工程為大規模且成本高,亦對建築物的設計性產生影響,故擁有者大多對其敬而遠之。Here, as a countermeasure against the glare of the reflected light originating from the window glass of the building, for example, a method of directly blocking the reflected light by installing a shutter or the like on the wall surface of the building is mentioned. However, regarding the installation of shutters, the project is large-scale and costly, and it also affects the design of the building, so the owners mostly stay away from it.

另一方面,作為提昇建築物的窗玻璃的防眩性的方法,除所述方法以外,可列舉將膜外貼於窗玻璃來改善反射特性的方法。On the other hand, as a method of improving the anti-glare property of a window glass of a building, in addition to the above-mentioned method, a method of externally attaching a film to the window glass to improve the reflection characteristics may be mentioned.

例如,作為可改善包括防眩性的反射特性的膜,專利文獻1中揭示可獲得如下的光學膜:於基材膜上使用紫外線硬化樹脂而無規形成具有凹凸形狀面的防眩(antiglare,AG)層,並且以使所述凹凸形狀平坦的方式形成包含低折射率樹脂的層,藉此可使可見光區域的反射率平緩,並於貼附於顯示器的情況下使黑色顯眼。For example, as a film capable of improving reflection characteristics including anti-glare properties, Patent Document 1 discloses that an optical film can be obtained by using an ultraviolet curable resin on a base film to randomly form an anti-glare surface having an uneven surface (AG) layer, and forming a layer containing a low-refractive index resin so that the uneven shape is flattened, whereby the reflectance in the visible light region can be smoothed, and black can be made prominent when attached to a display.

另外,專利文獻2中揭示可獲得如下的膜:於基材膜上使用紫外線硬化樹脂並對模具表面的凹凸進行轉印成形而獲得膜時,使用對規定粒徑的噴砂粒子進行擊打後的模具表面,藉此保持高的透過鮮明度,並減少眩光。 [現有技術文獻] [專利文獻]In addition, Patent Document 2 discloses that a film can be obtained by using a UV-curable resin on a base film and transferring the unevenness on the mold surface to obtain a film. The surface of the mold, thereby maintaining high transmittance and reducing glare. [Prior Art Literature] [Patent Literature]

[專利文獻1]國際公開2015/071943號 [專利文獻2]日本專利特開2016-012095號公報[Patent Document 1] International Publication No. 2015/071943 [Patent Document 2] Japanese Patent Laid-Open No. 2016-012095

[發明所欲解決之課題] 且說,外貼的膜有時亦用於暴露於大量的紫外線中之類的嚴酷的室外環境下所設置的窗玻璃,於所述情況下要求耐紫外線性特別高。另外,外貼於窗玻璃的膜亦有時所觀望的範圍非常廣,理想的是自各個角度的反射光的色澤接近中性。然而,所述現有技術僅著眼於防眩性或反射率等,於進一步兼顧高的耐紫外線性與色澤的減少的方面有改良的餘地。[Problems to be Solved by the Invention] In addition, an externally applied film is sometimes used for a window glass provided in a severe outdoor environment such as being exposed to a large amount of ultraviolet rays. In such a case, ultraviolet resistance is required to be particularly high. . In addition, the film to be attached to the window glass sometimes has a very wide viewing range, and it is desirable that the color of the reflected light from various angles is close to neutral. However, the above-mentioned conventional technology focuses only on anti-glare properties, reflectance, and the like, and there is room for improvement in terms of further achieving a balance between high ultraviolet resistance and reduction in color.

本發明的課題在於解決現有的所述各種問題,並達成以下的目的。即,本發明的目的在於提供一種耐紫外線性優異且可減少反射光的色澤及其變化的光學體、以及耐紫外線性優異且可減少反射光的色澤及其變化的窗材。An object of the present invention is to solve the above-mentioned various problems and achieve the following objects. That is, an object of the present invention is to provide an optical body having excellent ultraviolet resistance and capable of reducing the color and change of reflected light, and a window material having excellent ultraviolet resistance and capable of reducing the color and change of reflected light.

[解決課題之手段] 本發明者等人為了達成所述目的,並不限定於膜,進行了努力研究。結果發現,藉由製成特定的層構成,可兼顧高的耐紫外線性與色澤的減少,從而完成了本發明。[Means for Solving the Problem] In order to achieve the above-mentioned object, the present inventors and the like have conducted researches that are not limited to films. As a result, it was found that by forming a specific layer structure, both high UV resistance and reduction in color can be achieved, and the present invention has been completed.

本發明是基於本發明者等人的所述見解而成,用以解決所述課題的手段如以下般。即, <1>一種光學體,其包括:基底層、第1透明無機層、以及第2透明無機層,所述光學體的特徵在於: 所述第1透明無機層包含透明無機層A、透明無機層B、以及所述透明無機層A及所述透明無機層B之間的中間分割層, 所述第1透明無機層以所述透明無機層B成為基底層側的方式配置於所述基底層上, 所述第2透明無機層配置於所述第1透明無機層上。This invention is based on the said knowledge of this inventor, The means for solving the said subject are as follows. That is, <1> An optical body including a base layer, a first transparent inorganic layer, and a second transparent inorganic layer. The optical body is characterized in that the first transparent inorganic layer includes a transparent inorganic layer A and a transparent layer. The inorganic layer B and an intermediate division layer between the transparent inorganic layer A and the transparent inorganic layer B, and the first transparent inorganic layer is disposed on the substrate such that the transparent inorganic layer B becomes a substrate layer side. On the layer, the second transparent inorganic layer is disposed on the first transparent inorganic layer.

<2>如所述<1>所述的光學體,其中所述第1透明無機層含有ZnO及CeO2 的至少任一者, 所述第2透明無機層含有SiO2 、SiN、SiON及MgF2 的至少任一者。<2> The optical body according to the above <1>, wherein the first transparent inorganic layer contains at least any one of ZnO and CeO 2 , and the second transparent inorganic layer contains SiO 2 , SiN, SiON, and MgF any one of at least 2.

<3>如所述<1>或<2>所述的光學體,其中所述中間分割層僅包含SiO2<3> The optical body according to <1> or <2>, wherein the intermediate division layer contains only SiO 2 .

<4>如所述<1>至<3>中任一項所述的光學體,其中所述第1透明無機層的總厚中的所述透明無機層B的厚度的比例為30%以下。<4> The optical body according to any one of <1> to <3>, wherein a ratio of a thickness of the transparent inorganic layer B in a total thickness of the first transparent inorganic layer is 30% or less .

<5>如所述<1>至<4>中任一項所述的光學體,其於所述基底層與所述第1透明無機層之間進而包括密著層。<5> The optical body according to any one of <1> to <4>, further comprising an adhesion layer between the base layer and the first transparent inorganic layer.

<6>如所述<1>至<5>中任一項所述的光學體,其於所述第2透明無機層上進而包括第3透明無機層。<6> The optical body according to any one of <1> to <5>, further including a third transparent inorganic layer on the second transparent inorganic layer.

<7>如所述<1>至<6>中任一項所述的光學體,其中所述中間分割層的厚度為30 nm以上且60 nm以下。<7> The optical body according to any one of <1> to <6>, wherein a thickness of the intermediate division layer is 30 nm or more and 60 nm or less.

<8>一種窗材,其特徵在於包括:玻璃基板、及如所述<1>至<7>中任一項所述的光學體。<8> A window material comprising a glass substrate and the optical body according to any one of <1> to <7>.

[發明的效果] 根據本發明,可提供一種耐紫外線性優異且可減少反射光的色澤及其變化的光學體、以及耐紫外線性優異且可減少反射光的色澤及其變化的窗材。[Effects of the Invention] According to the present invention, it is possible to provide an optical body excellent in ultraviolet resistance and capable of reducing the color and change of reflected light, and a window material having excellent ultraviolet resistance and capable of reducing the color and change of reflected light.

(光學體) 如圖1所示,本發明的一實施形態的光學體(以下,有時稱為「本實施形態的光學體」)60至少包括:基底層63、第1透明無機層64、以及第2透明無機層65。另外,第1透明無機層64包含透明無機層A(64a)、透明無機層B(64b)、以及該些層之間的中間分割層64m,且以透明無機層B(64b)成為基底層63側的方式配置於基底層63上。即,本實施形態的光學體是將至少基底層63、透明無機層B(64b)、中間分割層64m、透明無機層A(64a)、第2透明無機層65依序積層而成。而且,本實施形態的光學體進而視需要可包括第3透明無機層、密著層、防污塗層、其他層等。 再者,本說明書中所謂「透明」或「具有透明性」,是指透過像鮮明度高,通過光學體而可明確地看到像。(Optical Body) As shown in FIG. 1, an optical body (hereinafter, sometimes referred to as “optical body of this embodiment”) 60 according to an embodiment of the present invention includes at least a base layer 63, a first transparent inorganic layer 64, And the second transparent inorganic layer 65. The first transparent inorganic layer 64 includes a transparent inorganic layer A (64a), a transparent inorganic layer B (64b), and an intermediate division layer 64m between these layers. The transparent inorganic layer B (64b) is used as the base layer 63. It is disposed on the base layer 63 in a lateral manner. That is, the optical body of this embodiment is formed by sequentially laminating at least the base layer 63, the transparent inorganic layer B (64b), the intermediate division layer 64m, the transparent inorganic layer A (64a), and the second transparent inorganic layer 65. Furthermore, the optical body of this embodiment may further include a third transparent inorganic layer, an adhesion layer, an antifouling coating, and other layers, if necessary. In addition, the term "transparent" or "having transparency" in this specification means that an image is clearly seen through an optical body through a high degree of sharpness of the image.

<基底層> 基底層是被定位為本實施形態的光學體的基礎的層。該基底層的材料並無特別限制,例如可列舉:聚對苯二甲酸乙二酯(Polyethylene terephthalate,PET)、聚碳酸酯(Polycarbonate,PC)、聚甲基丙烯酸甲酯(Polymethyl methacrylate,PMMA)、氯乙烯、氟樹脂等通常的光學膜的領域中所使用的塑膠材料,且亦可為玻璃。<Base layer> The base layer is a layer which is positioned as the base of the optical body of this embodiment. The material of the base layer is not particularly limited, and examples thereof include: polyethylene terephthalate (PET), polycarbonate (PC), and polymethyl methacrylate (PMMA) Plastic materials used in the field of general optical films such as vinyl chloride, vinyl chloride, and fluororesin, and glass may also be used.

再者,基底層的材料或具體的結構並無特別限制。其中,就提高防眩性的觀點而言,基底層63較佳為如圖2所示,具有微細凹凸表面。於該情況下,基底層63的表面的微細凹凸結構可以規則的圖案形成,亦可無規地形成。Moreover, the material or specific structure of the base layer is not particularly limited. Among these, from the viewpoint of improving the anti-glare property, the base layer 63 preferably has a fine uneven surface as shown in FIG. 2. In this case, the fine uneven structure on the surface of the base layer 63 may be formed in a regular pattern or may be formed randomly.

另外,具有微細凹凸表面的基底層63例如如圖2所示,可由基材61與具有微細凹凸結構的樹脂層62構成,或者亦可為於包含樹脂的基材上直接形成微細凹凸結構而成者(未圖示)。In addition, as shown in FIG. 2, the base layer 63 having a fine uneven surface may be composed of a base material 61 and a resin layer 62 having a fine uneven structure, or may be formed by directly forming a fine uneven structure on a resin-containing substrate. (Not shown).

此處,具有微細凹凸表面的基底層(以下,有時稱為「微細凹凸層」)例如可藉由形狀轉印法、相分離法、填料分散法等來形成。以下,作為一例,參照圖3來對利用形狀轉印法的微細凹凸層的形成方法進行說明。Here, the base layer having a fine uneven surface (hereinafter, sometimes referred to as a "fine uneven layer") can be formed by, for example, a shape transfer method, a phase separation method, a filler dispersion method, or the like. Hereinafter, as an example, a method for forming a fine uneven layer by a shape transfer method will be described with reference to FIG. 3.

圖3是表示用以形成本實施形態的光學體的微細凹凸層的方法的一例即形狀轉印法的示意圖。圖3所示的形狀轉印裝置1包括:原盤2、基材供給輥51、捲取輥52、引導輥53、引導輥54、夾持輥55、剝離輥56、塗佈裝置57、以及光源58。FIG. 3 is a schematic diagram showing a shape transfer method as an example of a method for forming a fine uneven layer of the optical body according to the embodiment. The shape transfer device 1 shown in FIG. 3 includes a master plate 2, a substrate supply roller 51, a take-up roller 52, a guide roller 53, a guide roller 54, a nip roller 55, a peeling roller 56, a coating device 57, and a light source 58.

基材供給輥51為將片狀基材61捲繞為卷狀的輥,捲取輥52為對將轉印有微細凹凸結構23的樹脂層62積層後的基材61進行捲取的輥。另外,引導輥53、引導輥54為搬送基材61的輥。夾持輥55為使積層有樹脂層62的基材61密著於圓筒形狀的原盤2的輥,剝離輥56為將微細凹凸結構23轉印至樹脂層62後將積層有樹脂層62的基材61自原盤2剝離的輥。此處,基材61例如可設為聚對苯二甲酸乙二酯(PET)或聚碳酸酯(PC)等塑膠製的基材,且可設為塑膠製的透明膜。The substrate supply roller 51 is a roller that winds the sheet-shaped substrate 61 into a roll shape, and the take-up roller 52 is a roller that winds the substrate 61 after laminating the resin layer 62 to which the fine uneven structure 23 is transferred. The guide roller 53 and the guide roller 54 are rollers that transport the substrate 61. The nip roller 55 is a roller that adheres the base material 61 on which the resin layer 62 is laminated to the cylindrical original plate 2, and the peeling roller 56 is a substrate on which the resin layer 62 is laminated after transferring the fine uneven structure 23 to the resin layer 62. Roller in which base material 61 is peeled from original plate 2. Here, the base material 61 may be a plastic base material such as polyethylene terephthalate (PET) or polycarbonate (PC), and may be a plastic transparent film.

塗佈裝置57包括塗佈機等塗佈機構,將包含紫外線硬化性樹脂的組成物(紫外線硬化性樹脂組成物)塗佈於基材61而形成樹脂層62。塗佈裝置57例如亦可為凹版塗佈機、線棒塗佈機或模塗佈機等。另外,光源58為發出紫外光的光源,例如可設為紫外線燈等。The coating device 57 includes a coating mechanism such as a coater, and applies a composition (ultraviolet curable resin composition) containing an ultraviolet curable resin to the substrate 61 to form a resin layer 62. The coating device 57 may be, for example, a gravure coater, a bar coater, a die coater, or the like. The light source 58 is a light source that emits ultraviolet light, and may be, for example, an ultraviolet lamp.

紫外線硬化性樹脂為藉由照射紫外線而流動性下降並進行硬化的樹脂,具體可列舉丙烯酸系樹脂等。另外,紫外線硬化性樹脂組成物視需要亦可含有起始劑、填料、功能性添加劑、溶劑、無機材料、顏料、抗靜電劑或增感色素等。The ultraviolet-curable resin is a resin that decreases its fluidity by being irradiated with ultraviolet rays and is cured, and specifically, acrylic resins and the like are mentioned. In addition, the ultraviolet curable resin composition may contain an initiator, a filler, a functional additive, a solvent, an inorganic material, a pigment, an antistatic agent, a sensitizing dye, and the like, as necessary.

形狀轉印裝置1中,首先,自基材供給輥51經由引導輥53而將片狀基材61連續地送出。利用塗佈裝置57將紫外線硬化性樹脂組成物塗佈於經送出的基材61,將樹脂層62積層於基材61。另外,積層有樹脂層62的基材61藉由夾持輥55而密著於原盤2。藉此,將形成於原盤2的外周面的微細凹凸結構23轉印至樹脂層62。於對微細凹凸結構23進行轉印後,樹脂層62藉由源自光源58的光的照射而進行硬化。繼而,將積層有經硬化的樹脂層62的基材61藉由剝離輥56而自原盤2剝離,並經由引導輥54,由捲取輥52進行捲取。 藉由此種形狀轉印裝置1,可連續地形成具有微細凹凸表面的微細凹凸層。此處,微細凹凸表面的結構例如可藉由適宜變更原盤2的微細凹凸結構23來調整。In the shape transfer device 1, first, a sheet-like substrate 61 is continuously fed out from a substrate supply roller 51 via a guide roller 53. The ultraviolet curable resin composition is applied to the substrate 61 that has been sent out by the application device 57, and the resin layer 62 is laminated on the substrate 61. In addition, the base material 61 on which the resin layer 62 is laminated is adhered to the original disk 2 by a nip roller 55. Thereby, the fine uneven structure 23 formed on the outer peripheral surface of the original disk 2 is transferred to the resin layer 62. After the fine uneven structure 23 is transferred, the resin layer 62 is hardened by irradiation of light from the light source 58. Then, the base material 61 on which the cured resin layer 62 is laminated is peeled from the original disk 2 by a peeling roller 56, and is wound by a winding roller 52 via a guide roller 54. With such a shape transfer device 1, a fine uneven layer having a fine uneven surface can be continuously formed. Here, the structure of the fine uneven surface can be adjusted, for example, by appropriately changing the fine uneven structure 23 of the original disk 2.

<第1透明無機層> 本實施形態的光學體包括第1透明無機層。另外,如圖1所示,第1透明無機層64包含透明無機層A(64a)、透明無機層B(64b)、以及該些層之間的中間分割層64m。本發明者等人發現,藉由將光學體中的第1透明無機層設為此種結構,紫外線吸收能有效地提昇,較第1透明無機層為單層的情況而言耐紫外線性得到提高,並且可減少反射光的色澤及其變化。該第1透明無機層具有透明性,並且可具有例如吸收規定波長的光的功能。另外,如圖1、圖2所示,該第1透明無機層64以透明無機層B(64b)成為基底層63側的方式配置於基底層63上(或者,於存在的情況下為密著層上)。而且,透明無機層A(64a)、中間分割層64m及透明無機層B(64b)分別可藉由例如濺鍍法、真空蒸鍍法或化學氣相沈積(chemical vapor deposition,CVD)法來形成。 再者,第1透明無機層64除透明無機層A(64a)及透明無機層B(64b)以外,亦可進而包括一層以上的透明無機層,且與其相應地,亦可於透明無機層之間進而包括一層以上的中間分割層。其中,就更確實地獲得所期望的效果的觀點而言,第1透明無機層64較佳為僅包含透明無機層A(64a)、中間分割層64m及透明無機層B(64b)。<First transparent inorganic layer> The optical body of this embodiment includes a first transparent inorganic layer. As shown in FIG. 1, the first transparent inorganic layer 64 includes a transparent inorganic layer A (64 a), a transparent inorganic layer B (64 b), and an intermediate division layer 64 m between these layers. The inventors have found that by setting the first transparent inorganic layer in the optical body to have such a structure, ultraviolet absorption can be effectively improved, and ultraviolet resistance can be improved compared to a case where the first transparent inorganic layer is a single layer. , And can reduce the color and change of reflected light. The first transparent inorganic layer has transparency and may have a function of absorbing light of a predetermined wavelength, for example. In addition, as shown in FIGS. 1 and 2, the first transparent inorganic layer 64 is disposed on the base layer 63 such that the transparent inorganic layer B (64 b) becomes the side of the base layer 63 (or, if it is present, it is closely adhered). Layer). Further, the transparent inorganic layer A (64a), the intermediate division layer 64m, and the transparent inorganic layer B (64b) can be formed by, for example, a sputtering method, a vacuum evaporation method, or a chemical vapor deposition (CVD) method. . In addition, the first transparent inorganic layer 64 may further include one or more transparent inorganic layers in addition to the transparent inorganic layer A (64a) and the transparent inorganic layer B (64b), and correspondingly, it may be applied to the transparent inorganic layer. The interval further includes more than one intermediate segmentation layer. Among them, from the viewpoint of more surely obtaining a desired effect, the first transparent inorganic layer 64 preferably includes only the transparent inorganic layer A (64a), the intermediate division layer 64m, and the transparent inorganic layer B (64b).

第1透明無機層較佳為含有ZnO及CeO2 的至少任一者。特別是根據後述明確般,透明無機層A及透明無機層B更佳為含有ZnO及CeO2 的至少任一者。 再者,本說明書中,「ZnO」設為包含藉由鋁(Al)進行了摻雜的ZnO、及藉由其他元素進行了摻雜的ZnO。 另外,本說明書中,「CeO2 」設為包含藉由釓(Gd)進行了摻雜的CeO2 (有時總稱為CeGdO2 )(Ce0.9 Gd0.1 O2 等)、藉由釤(Sm)進行了摻雜的CeO2 (有時總稱為CeSmO2 )、及藉由其他元素(例如,Zr、Y等)進行了摻雜的CeO2The first transparent inorganic layer preferably contains at least one of ZnO and CeO 2 . In particular, as will be clear from the description below, it is more preferable that the transparent inorganic layer A and the transparent inorganic layer B contain at least one of ZnO and CeO 2 . In this specification, "ZnO" is assumed to include ZnO doped with aluminum (Al) and ZnO doped with other elements. In this specification, “CeO 2 ” is assumed to include CeO 2 (sometimes collectively referred to as CeGdO 2 ) (Ce 0.9 Gd 0.1 O 2, etc.) doped with gadolinium (Gd), and gadolinium (Sm). It was doped CeO 2 (sometimes collectively referred CeSmO 2), and carried out by other elements (e.g., Zr, Y, etc.) doped CeO 2.

另外,第1透明無機層的總厚較佳為100 nm以上,且較佳為300 nm以下。藉由第1透明無機層的總厚為100 nm以上,可獲得充分高的耐紫外線性,且藉由為300 nm以下,可抑制生產性下降或裂紋產生的風險。就同樣的觀點而言,第1透明無機層的總厚更佳為120 nm以上,且更佳為200 nm以下。 再者,本實施形態的光學體中的第1透明無機層如所述般,雖具有多層結構,但較單層的情況而言耐紫外線性更優異。因此,可良好地維持耐紫外線,並且亦可較先前減少該第1透明無機層的厚度、進而減少光學體的厚度。The total thickness of the first transparent inorganic layer is preferably 100 nm or more, and more preferably 300 nm or less. When the total thickness of the first transparent inorganic layer is 100 nm or more, sufficiently high UV resistance can be obtained, and when it is 300 nm or less, the risk of lowering productivity or cracks can be suppressed. From the same viewpoint, the total thickness of the first transparent inorganic layer is more preferably 120 nm or more, and more preferably 200 nm or less. In addition, as described above, the first transparent inorganic layer in the optical body of the embodiment has a multilayer structure as described above, but is more excellent in ultraviolet resistance than the case of a single layer. Therefore, it is possible to maintain the ultraviolet resistance well, and it is also possible to reduce the thickness of the first transparent inorganic layer, and further reduce the thickness of the optical body.

如圖2所示,就有效地提高防眩性的觀點而言,第1透明無機層64(透明無機層A(64a)、中間分割層64m、及透明無機層B(64b))較佳為與基底層63一同具有微細凹凸表面。此種第1透明無機層例如可藉由利用濺鍍法、真空蒸鍍法或CVD法將規定成分積層於具有微細凹凸表面的基底層上來形成。As shown in FIG. 2, the first transparent inorganic layer 64 (the transparent inorganic layer A (64a), the intermediate division layer 64m, and the transparent inorganic layer B (64b)) is preferably from the viewpoint of effectively improving antiglare properties. Together with the base layer 63, it has a fine uneven surface. Such a first transparent inorganic layer can be formed by, for example, laminating a predetermined component on a base layer having a fine uneven surface by a sputtering method, a vacuum evaporation method, or a CVD method.

另外,第1透明無機層的波長320 nm的透光率較佳為6%以下,進而佳為3%以下。藉由第1透明無機層的波長320 nm的透光率為6%以下,可有效地抑制由紫外線引起的基材的黃變等劣化。 再者,第1透明無機層的波長320 nm的透光率例如可使用日本分光股份有限公司製造的「V-560」來測定。另外,第1透明無機層的波長320 nm的透光率的調節例如可藉由分別調整透明無機層A、中間分割層及透明無機層B的主成分、厚度等來進行。The light transmittance of the first transparent inorganic layer at a wavelength of 320 nm is preferably 6% or less, and more preferably 3% or less. Since the first transparent inorganic layer has a light transmittance at a wavelength of 320 nm of 6% or less, it is possible to effectively suppress deterioration of the substrate such as yellowing caused by ultraviolet rays. The light transmittance at a wavelength of 320 nm of the first transparent inorganic layer can be measured using, for example, "V-560" manufactured by JASCO Corporation. The light transmittance of the first transparent inorganic layer at a wavelength of 320 nm can be adjusted by, for example, adjusting the main components and thicknesses of the transparent inorganic layer A, the intermediate division layer, and the transparent inorganic layer B, respectively.

-透明無機層A- 透明無機層A的主成分較佳為具有2.8 eV以上且4.8 eV以下的帶隙的無機化合物。此處,帶隙表示吸收端的波長,廣義上表示吸收低於相當於帶隙的波長的光,並透過相當於帶隙的波長以上的光。而且,所述2.8 eV以上且4.8 eV以下的帶隙表示根據使用普朗克常數(6.626×10-34 J·s)及光速(2.998×108 m/s)所獲得的波長λ與帶隙能量E的關係式:「λ(nm)=1240/E(eV)」,大致於紫外區域與可見區域的邊界即260 nm以上且440 nm以下的範圍內存在吸收端的波長。因而,藉由將所述無機化合物用於透明無機層A,可兼顧透明性與紫外線吸收特性。就同樣的觀點而言,透明無機層A的主成分更佳為具有3.0 eV以上且3.7 eV以下(以波長換算計大約為340 nm以上且420 nm以下)的帶隙的無機化合物。另外,若亦根據為了抑制生產性下降或裂紋產生的風險而實現薄膜化,則透明無機層A的主成分更佳為具有3.0 eV以上且3.4 eV以下(以波長換算計大約為360 nm以上且420 nm以下)的帶隙的無機化合物。 再者,本說明書中所謂「主成分」,是指含量最多的成分。-Transparent inorganic layer A- The main component of the transparent inorganic layer A is preferably an inorganic compound having a band gap of 2.8 eV or more and 4.8 eV or less. Here, the band gap indicates the wavelength at the absorption end, and in a broad sense, it means that light that is lower than the wavelength corresponding to the band gap is absorbed, and light that is higher than the wavelength corresponding to the band gap is transmitted. In addition, the band gap above 2.8 eV and below 4.8 eV represents a wavelength λ and a band gap obtained by using Planck constant (6.626 × 10 -34 J · s) and light speed (2.998 × 10 8 m / s). The relational expression of the energy E: "λ (nm) = 1240 / E (eV)", which is approximately the wavelength at the absorption end in the range between 260 nm and 440 nm, which is the boundary between the ultraviolet region and the visible region. Therefore, by using the inorganic compound for the transparent inorganic layer A, it is possible to achieve both transparency and ultraviolet absorption characteristics. From the same viewpoint, the main component of the transparent inorganic layer A is more preferably an inorganic compound having a band gap of 3.0 eV or more and 3.7 eV or less (approximately 340 nm or more and 420 nm or less in wavelength conversion). In addition, if the thin film is also formed in order to suppress the risk of reduced productivity or cracks, the main component of the transparent inorganic layer A is more preferably 3.0 eV or more and 3.4 eV or less (approximately 360 nm or more in wavelength conversion and 420 nm or less) Band gap inorganic compound. The "main component" in this specification refers to a component having the largest content.

再者,作為具有2.8 eV以上且4.8 eV以下的帶隙的無機化合物,具體可列舉:ZnO、CeO2 、TiO2 、SnO2 、In2 O3 、Nb2 O5 、Ta2 O5 、SiC、ZnS等。另外,作為具有3.0 eV以上且3.7 eV以下的帶隙的無機化合物的例子,具體可列舉:ZnO、CeO2 、TiO2 、Nb2 O5 、SiC、ZnS等。進而,作為具有3.0 eV以上且3.4 eV以下的帶隙的無機化合物的例子,具體可列舉ZnO、CeO2 等。考慮到以上情況,透明無機層A較佳為含有ZnO及CeO2 的至少任一者,更佳為含有ZnO及CeO2 ,進而佳為僅包含ZnO及CeO2 。 該些無機化合物可以單獨一種用於透明無機層A,亦可將兩種以上加以組合而用於透明無機層A。 再者,本說明書中所謂「僅包含」,是指實質上僅包含所述成分,具體設為所述成分佔99.9質量%以上。Examples of the inorganic compound having a band gap of 2.8 eV to 4.8 eV include ZnO, CeO 2 , TiO 2 , SnO 2 , In 2 O 3 , Nb 2 O 5 , Ta 2 O 5 , and SiC. , ZnS, etc. Examples of the inorganic compound having a band gap of 3.0 eV or more and 3.7 eV or less include ZnO, CeO 2 , TiO 2 , Nb 2 O 5 , SiC, and ZnS. Furthermore, as examples of the inorganic compound having a band gap of 3.0 eV or more and 3.4 eV or less, specific examples include ZnO, CeO 2 and the like. View of the above, a transparent inorganic layer A is preferably at least any one of ZnO and CeO 2, and more preferably containing ZnO and CeO 2, and further comprising best only ZnO and CeO 2. These inorganic compounds may be used alone in the transparent inorganic layer A, or may be used in combination of two or more in the transparent inorganic layer A. In addition, in the present specification, "contains only" means that only the above-mentioned components are substantially included, and specifically, the above-mentioned components are 99.9% by mass or more.

-中間分割層- 中間分割層為藉由配置於透明無機層A與透明無機層B之間,而可提高光學體的耐紫外線性並且可調整反射光的色澤的層。-Intermediate Dividing Layer- The intermediate dividing layer is a layer that is arranged between the transparent inorganic layer A and the transparent inorganic layer B to improve the ultraviolet resistance of the optical body and to adjust the color of the reflected light.

中間分割層的主成分較佳為折射率較透明無機層A的主成分及透明無機層B的主成分更低者,並無特別限制,可列舉:SiO2 、SiN、SiON、MgF2 等無機化合物。換言之,中間分割層可含有SiO2 、SiN、SiON及MgF2 的至少任一者。另外,中間分割層較佳為至少含有SiO2 ,更佳為僅包含SiO2 。 該些無機化合物可以單獨一種用於中間分割層,亦可將兩種以上加以組合而用於中間分割層。The main component of the intermediate division layer is preferably one having a lower refractive index than the main component of the transparent inorganic layer A and the main component of the transparent inorganic layer B, and is not particularly limited, and examples thereof include inorganic materials such as SiO 2 , SiN, SiON, and MgF 2 Compound. In other words, the intermediate division layer may contain at least any one of SiO 2 , SiN, SiON, and MgF 2 . In addition, the intermediate division layer preferably contains at least SiO 2 , and more preferably contains only SiO 2 . These inorganic compounds may be used alone in the intermediate partition layer, or may be used in combination of two or more in the intermediate partition layer.

中間分割層的厚度較佳為30 nm以上,且較佳為60 nm以下。藉由中間分割層的厚度為30 nm以上,可有效地減少光學體中的透光率、特別是波長320 nm的透光率,並顯著地提高耐紫外線性。另外,藉由中間分割層的厚度為60 nm以下,可抑制由透明無機層A及透明無機層B引起的高紫外線吸收特性惡化的情況。The thickness of the intermediate division layer is preferably 30 nm or more, and preferably 60 nm or less. When the thickness of the intermediate division layer is 30 nm or more, the light transmittance in the optical body, especially the light transmittance at a wavelength of 320 nm, can be effectively reduced, and the ultraviolet resistance can be significantly improved. In addition, when the thickness of the intermediate division layer is 60 nm or less, deterioration of high ultraviolet absorption characteristics caused by the transparent inorganic layer A and the transparent inorganic layer B can be suppressed.

另外,第1透明無機層的總厚中的中間分割層的厚度的比例較佳為20%以上,且較佳為40%以下。藉由所述比例為20%以上,可減少光學體中的透光率、特別是波長320 nm的透光率,並顯著地提高耐紫外線性。另外,藉由所述比例為40%以下,可抑制由透明無機層A及透明無機層B引起的高紫外線吸收特性惡化的情況。In addition, the proportion of the thickness of the intermediate division layer in the total thickness of the first transparent inorganic layer is preferably 20% or more, and more preferably 40% or less. When the ratio is 20% or more, it is possible to reduce the light transmittance in the optical body, particularly the light transmittance at a wavelength of 320 nm, and significantly improve the ultraviolet resistance. In addition, when the ratio is 40% or less, deterioration of high ultraviolet absorption characteristics caused by the transparent inorganic layer A and the transparent inorganic layer B can be suppressed.

-透明無機層B- 透明無機層B的較佳主成分與透明無機層A中所述者相同。具體而言,透明無機層B較佳為含有ZnO及CeO2 的至少任一者,更佳為含有ZnO及CeO2 。另外,透明無機層B的組成較佳為與透明無機層A的組成相同。-Transparent Inorganic Layer B- A preferable main component of the transparent inorganic layer B is the same as that described in the transparent inorganic layer A. Specifically, a transparent inorganic layer B is preferably at least any one of ZnO and CeO 2, and more preferably of ZnO and CeO 2. The composition of the transparent inorganic layer B is preferably the same as the composition of the transparent inorganic layer A.

另外,第1透明無機層的總厚中的透明無機層B的厚度的比例較佳為30%以下。藉由所述比例為30%以下,可良好地維持耐紫外線性,並且a*b*表色系統中的a*的數值及b*的值更接近零,可使相對於自各個角度的光入射的反射光的色澤變得更中性。就同樣的觀點而言,第1透明無機層的總厚中的透明無機層B的厚度的比例更佳為20%以下,進而佳為10%以下。The ratio of the thickness of the transparent inorganic layer B in the total thickness of the first transparent inorganic layer is preferably 30% or less. By setting the ratio to 30% or less, the UV resistance can be maintained well, and the values of a * and b * in the a * b * color system are closer to zero, which can make light relative to light from various angles. The color of the incident reflected light becomes more neutral. From the same viewpoint, the ratio of the thickness of the transparent inorganic layer B in the total thickness of the first transparent inorganic layer is more preferably 20% or less, and even more preferably 10% or less.

另外,透明無機層A及透明無機層B的合計厚度中的透明無機層B的厚度的比例較佳為30%以下。藉由所述比例為30%以下,可良好地維持耐紫外線性,並且a*b*表色系統中的a*的數值及b*的數值更接近零,可使相對於自各個角度的光入射的反射光的色澤變得更中性。就同樣的觀點而言,第1透明無機層的總厚中的透明無機層B的厚度的比例更佳為20%以下,進而佳為10%以下。The ratio of the thickness of the transparent inorganic layer B in the total thickness of the transparent inorganic layer A and the transparent inorganic layer B is preferably 30% or less. When the ratio is 30% or less, the UV resistance can be maintained well, and the values of a * and b * in the a * b * color system are closer to zero, which can make the light relative to light from various angles. The color of the incident reflected light becomes more neutral. From the same viewpoint, the ratio of the thickness of the transparent inorganic layer B in the total thickness of the first transparent inorganic layer is more preferably 20% or less, and even more preferably 10% or less.

<第2透明無機層> 本實施形態的光學體包括第2透明無機層。該第2透明無機層具有透明性,並且可具有防止雨等引起的污垢於第1透明無機層的附著的功能或調整反射光的色澤的功能。另外,如圖1、圖2所示,該第2透明無機層65配置於第1透明無機層64上,例如可藉由濺鍍法、真空蒸鍍法或CVD法來形成。<The second transparent inorganic layer> The optical body of this embodiment includes a second transparent inorganic layer. The second transparent inorganic layer has transparency, and may have a function of preventing adhesion of dirt caused by rain or the like to the first transparent inorganic layer, or a function of adjusting the color of the reflected light. As shown in FIGS. 1 and 2, the second transparent inorganic layer 65 is disposed on the first transparent inorganic layer 64 and can be formed by, for example, a sputtering method, a vacuum evaporation method, or a CVD method.

第2透明無機層的主成分較佳為具有較第1透明無機層的主成分的帶隙更大的帶隙,更具體而言,較佳為具有較第1透明無機層的主成分的帶隙大4.0 eV以上的帶隙的無機化合物。藉由第2透明無機層的主成分的帶隙較第1透明無機層的主成分的帶隙大,較佳為大4.0 eV以上,除第1透明無機層的防污性的提昇以外,可提昇所獲得的光學體的防眩性。另外,第2透明無機層的主成分較佳為折射率較透明無機層A的主成分及透明無機層B的主成分更低者。 具體而言,作為較佳的第2透明無機層的主成分,可列舉:SiO2 、SiN、SiON、MgF2 等無機化合物。換言之,第2透明無機層較佳為含有SiO2 、SiN、SiON及MgF2 的至少任一者。另外,第2透明無機層更佳為至少含有SiO2 。 該些無機化合物可以單獨一種用於第2透明無機層,亦可將兩種以上加以組合而用於第2透明無機層。The main component of the second transparent inorganic layer is preferably a band gap having a larger band gap than the main component of the first transparent inorganic layer, and more specifically, a band having a main component that is larger than the main component of the first transparent inorganic layer. Inorganic compound with a band gap larger than 4.0 eV. The band gap of the main component of the second transparent inorganic layer is larger than the band gap of the main component of the first transparent inorganic layer, and is preferably greater than 4.0 eV. In addition to improving the antifouling property of the first transparent inorganic layer, The anti-glare property of the obtained optical body is improved. The main component of the second transparent inorganic layer is preferably one having a lower refractive index than the main component of the transparent inorganic layer A and the main component of the transparent inorganic layer B. Specifically, examples of the main component of the preferred second transparent inorganic layer include inorganic compounds such as SiO 2 , SiN, SiON, and MgF 2 . In other words, the second transparent inorganic layer preferably contains at least any one of SiO 2 , SiN, SiON, and MgF 2 . The second transparent inorganic layer more preferably contains at least SiO 2 . These inorganic compounds may be used alone in the second transparent inorganic layer, or may be used in combination of two or more in the second transparent inorganic layer.

第2透明無機層的厚度較佳為20 nm以上,且較佳為200 nm以下。藉由第2透明無機層的厚度為20 nm以上且200 nm以下,可充分地減少反射率,更有效地提昇防眩性。就同樣的觀點而言,第2透明無機層的厚度更佳為40 nm以上,且更佳為100 nm以下。The thickness of the second transparent inorganic layer is preferably 20 nm or more, and more preferably 200 nm or less. When the thickness of the second transparent inorganic layer is 20 nm or more and 200 nm or less, the reflectance can be sufficiently reduced, and the anti-glare property can be more effectively improved. From the same viewpoint, the thickness of the second transparent inorganic layer is more preferably 40 nm or more, and more preferably 100 nm or less.

如圖2所示,就有效地提高防眩性的觀點而言,第2透明無機層65較佳為與基底層63及第1透明無機層64一同具有微細凹凸表面。此種第2透明無機層例如可藉由於具有微細凹凸表面的基底層上利用濺鍍法、真空蒸鍍法或CVD法積層第1透明無機層後,利用濺鍍法、真空蒸鍍法或CVD法積層規定成分來形成。As shown in FIG. 2, the second transparent inorganic layer 65 preferably has a fine uneven surface together with the base layer 63 and the first transparent inorganic layer 64 from the viewpoint of effectively improving anti-glare properties. Such a second transparent inorganic layer can be formed by, for example, laminating a first transparent inorganic layer on a base layer having a fine uneven surface by a sputtering method, a vacuum evaporation method, or a CVD method, and then using a sputtering method, a vacuum evaporation method, or CVD. It is formed by stacking prescribed components.

<第3透明無機層> 如圖4所示,本實施形態的光學體較佳為除第1透明無機層64及第2透明無機層65以外,於第2透明無機層65上進而包括第3透明無機層66。藉由包括第3透明無機層,可防止雨等引起的污垢於第2透明無機層的附著。該第3透明無機層具有透明性,可為撥水性亦可為親水性,且例如可藉由濺鍍法、真空蒸鍍法或CVD法來形成。<Third Transparent Inorganic Layer> As shown in FIG. 4, in addition to the first transparent inorganic layer 64 and the second transparent inorganic layer 65, the optical body of this embodiment preferably includes a third transparent inorganic layer 65 on the second transparent inorganic layer 65. Transparent inorganic layer 66. By including the third transparent inorganic layer, adhesion of dirt caused by rain or the like to the second transparent inorganic layer can be prevented. The third transparent inorganic layer has transparency, may be water-repellent or hydrophilic, and may be formed by, for example, a sputtering method, a vacuum evaporation method, or a CVD method.

第3透明無機層可含有SiO2 作為主成分。另外,第3透明無機層較佳為進而含有ZrO2 。藉由第3透明無機層一同含有SiO2 與ZrO2 ,光學體的耐鹼性得到提昇,例如可較佳地用於設於可暴露於化學品中的環境下或嚴酷的室外環境下(可設想酸雨、自混凝土溶出的氫氧化鈣、鹽水、水+太陽光等)的窗玻璃等中。The third transparent inorganic layer may contain SiO 2 as a main component. The third transparent inorganic layer preferably further contains ZrO 2 . By containing the SiO 2 and ZrO 2 together in the third transparent inorganic layer, the alkali resistance of the optical body is improved. For example, the optical body can be preferably used in an environment exposed to chemicals or in a severe outdoor environment. Imagine acid rain, calcium hydroxide dissolved from concrete, salt water, water + sunlight, etc.) in window glass.

第3透明無機層中的ZrO2 的比例較佳為6質量%以上且50質量%以下。藉由ZrO2 的比例為6質量%以上,可充分地獲得耐化學品性、特別是耐鹼性的改善效果,且藉由為50質量%以下,可適度地保持與第2透明無機層的折射率差,可避免光學設計的困難化。就同樣的觀點而言,第3透明無機層中的ZrO2 的比例更佳為13質量%以上,進而佳為20質量%以上,且更佳為40質量%以下。The proportion of ZrO 2 in the third transparent inorganic layer is preferably 6 mass% or more and 50 mass% or less. When the proportion of ZrO 2 is 6% by mass or more, the improvement effect of chemical resistance, especially alkali resistance can be sufficiently obtained, and when it is 50% by mass or less, the bonding with the second transparent inorganic layer can be appropriately maintained. The refractive index difference can avoid the difficulty of optical design. From the same viewpoint, the proportion of ZrO 2 in the third transparent inorganic layer is more preferably 13% by mass or more, still more preferably 20% by mass or more, and even more preferably 40% by mass or less.

第3透明無機層的厚度較佳為20 nm以上。藉由第3透明無機層的厚度為20 nm以上,可進一步獲得充分高的耐化學品性。另外,第3透明無機層的厚度較佳為200 nm以下。藉由第3透明無機層的厚度為200 nm以下,可抑制生產性下降或裂紋產生的風險。就同樣的觀點而言,第3透明無機層的厚度更佳為100 nm以下。The thickness of the third transparent inorganic layer is preferably 20 nm or more. When the thickness of the third transparent inorganic layer is 20 nm or more, sufficiently high chemical resistance can be obtained. The thickness of the third transparent inorganic layer is preferably 200 nm or less. When the thickness of the third transparent inorganic layer is 200 nm or less, it is possible to suppress the risk of reduced productivity or cracks. From the same viewpoint, the thickness of the third transparent inorganic layer is more preferably 100 nm or less.

<密著層> 如圖5所示,為了使所述基底層63與第1透明無機層64牢固地密著,本實施形態的光學體較佳為於該些層之間進而包括密著層67。作為該密著層,例如可列舉SiOx 層,厚度例如可設為2 nm以上且10 nm以下,就避免著色的影響的觀點及利用必要最小限度的材料發揮功能的觀點而言,厚度較佳為8 nm以下,更佳為5 nm以下。該密著層例如可藉由濺鍍法、真空蒸鍍法或CVD法來形成。特別是於使用濺鍍法形成SiOx 層的情況下,可使用矽靶,以氧不足的狀態來進行成膜。<Adhesive Layer> As shown in FIG. 5, in order to firmly adhere the base layer 63 and the first transparent inorganic layer 64, the optical body of this embodiment preferably includes an adhesive layer between the layers. 67. Examples of the adhesion layer include a SiO x layer. The thickness can be, for example, 2 nm to 10 nm. From the viewpoint of avoiding the influence of coloring and the viewpoint of functioning with a minimum necessary material, the thickness is preferable. It is 8 nm or less, and more preferably 5 nm or less. The adhesion layer can be formed by, for example, a sputtering method, a vacuum evaporation method, or a CVD method. In particular, when a SiO x layer is formed by a sputtering method, a silicon target can be used to form a film in a state of insufficient oxygen.

<防污塗層> 本實施形態的光學體較佳為於所述第2透明無機層上的最表面包括防污塗層。具體而言,本實施形態的光學體較佳為於第2透明無機層上或第3透明無機層上包括防污塗層。藉由包括防污塗層,可減少污垢於光學體上的附著,並且可使所附著的污垢容易落下,從而光學體可更長期地發揮所期望的性能。 再者,就接著性高的觀點而言,較佳為於以SiO2 為主成分的第2透明無機層或第3透明無機層上包括防污塗層。<Antifouling Coating> The optical body of this embodiment preferably includes an antifouling coating on the outermost surface of the second transparent inorganic layer. Specifically, the optical body of the present embodiment preferably includes an antifouling coating on the second transparent inorganic layer or the third transparent inorganic layer. By including the antifouling coating, the adhesion of dirt to the optical body can be reduced, and the attached dirt can be easily dropped, so that the optical body can exhibit desired performance for a longer period of time. From the viewpoint of high adhesion, it is preferable to include an antifouling coating on the second transparent inorganic layer or the third transparent inorganic layer containing SiO 2 as a main component.

防污塗層的主成分可為撥水性亦可為親水性,且可為撥油性亦可為親油性。其中,就更有效地提高防污性的觀點而言,防污塗層的主成分較佳為撥水性且撥油性。若對撥水性進行具體說明,則防污塗層的純水接觸角較佳為110°以上,更佳為115°以上。作為具有該些性質者,防污塗層的主成分較佳為全氟聚醚。The main component of the antifouling coating may be water-repellent or hydrophilic, and may be oil-repellent or lipophilic. Among these, from the viewpoint of more effectively improving the antifouling property, the main component of the antifouling coating is preferably water-repellent and oil-repellent. If the water repellency is specifically described, the pure water contact angle of the antifouling coating is preferably 110 ° or more, and more preferably 115 ° or more. As those having these properties, the main component of the antifouling coating is preferably a perfluoropolyether.

防污塗層的厚度較佳為5 nm以上,且較佳為20 nm以下,例如為10 nm。藉由防污塗層的厚度為5 nm以上,可充分地提高光學體的防污性,且藉由為20 nm以下,可避免任意存在的微細凹凸結構的埋沒。The thickness of the antifouling coating is preferably 5 nm or more, and preferably 20 nm or less, such as 10 nm. When the thickness of the antifouling coating is 5 nm or more, the antifouling property of the optical body can be sufficiently improved, and when it is 20 nm or less, it is possible to avoid embedding of any fine uneven structure.

<其他層> 本實施形態的光學體並無特別限制,亦可包括所述層以外的其他層。<Other layers> The optical body of this embodiment is not particularly limited, and may include layers other than the above-mentioned layers.

例如,本實施形態的光學體較佳為於基底層的與配置有第1透明無機層的面為相反側的面包括吸收可見光的黏著層。藉由於與配置有第1透明無機層的面為相反側的面包括吸收可見光的黏著層,於圖6所示般的使玻璃基板81積層於該光學體的包括黏著層84的面而成的窗材80中,可效率良好地吸收透過第2透明無機層65、第1透明無機層64及微細凹凸層63並入射至黏著層84的可見光,以及透過第2透明無機層65、第1透明無機層64、微細凹凸層63及黏著層84後於玻璃基板81進行反射並入射至黏著層84的可見光等來減少可見光線透過率,進一步改善防眩性。此外,藉由使用可見光吸收率不同的黏著層,亦具有可使光澤度不同的商品系列容易對齊的優點。 再者,吸收可見光的黏著層例如可使用以任意的比例使吸收可見光的染料或顏料等著色劑分散於具有黏著性的材料中而成者來製備。 另一方面,例如於存在吸收可見光的染料或顏料的比例多、黏著力下降、或耐久性惡化等不良情況的情況下等,可使含有染料或顏料等著色劑的吸收可見光的基材或DLC等吸收可見光的無機膜積層於基底層上。For example, it is preferable that the optical body of this embodiment includes an adhesive layer that absorbs visible light on the surface of the base layer opposite to the surface on which the first transparent inorganic layer is disposed. Since the surface opposite to the surface on which the first transparent inorganic layer is disposed includes an adhesive layer that absorbs visible light, the glass substrate 81 is laminated on the surface of the optical body including the adhesive layer 84 as shown in FIG. 6. The window material 80 can efficiently absorb visible light transmitted through the second transparent inorganic layer 65, the first transparent inorganic layer 64 and the fine uneven layer 63 and incident on the adhesive layer 84, and transmitted through the second transparent inorganic layer 65 and the first transparent After the inorganic layer 64, the fine uneven layer 63, and the adhesive layer 84 are reflected on the glass substrate 81 and visible light incident on the adhesive layer 84, the visible light transmittance is reduced, and the anti-glare property is further improved. In addition, the use of adhesive layers with different visible light absorptivity also has the advantage that product lines with different gloss can be easily aligned. The adhesive layer that absorbs visible light can be prepared by, for example, dispersing a colorant such as a dye or pigment that absorbs visible light in an adhesive material at an arbitrary ratio. On the other hand, for example, when there are many problems such as a large proportion of dyes or pigments that absorb visible light, a decrease in adhesion, or deterioration in durability, etc., a visible light-absorbing substrate or DLC containing a colorant such as a dye or pigment can be used. An inorganic film that absorbs visible light is laminated on the base layer.

<光學體的特性> 另外,本實施形態的光學體的波長320 nm的透光率較佳為10%以下,更佳為6%以下,進而佳為3%以下。藉由光學體的波長320 nm的透光率為10%以下,可有效地抑制由紫外線引起的基材的黃變等劣化,並且可提昇基材與樹脂層的密著耐久性。 再者,光學體的波長320 nm的透光率例如可使用日本分光股份有限公司製造的「V-560」來測定。<Characteristics of Optical Body> In addition, the light transmittance of the optical body at a wavelength of 320 nm of the present embodiment is preferably 10% or less, more preferably 6% or less, and even more preferably 3% or less. The optical body has a light transmittance at a wavelength of 320 nm of 10% or less, which effectively suppresses deterioration of the substrate such as yellowing caused by ultraviolet rays, and improves the adhesion durability of the substrate and the resin layer. The light transmittance of the optical body at a wavelength of 320 nm can be measured using, for example, "V-560" manufactured by JASCO Corporation.

(窗材) 本發明的一實施形態的窗材(以下,有時稱為「本實施形態的窗材」)包括玻璃基板與所述光學體。具體而言,如圖7所示,本實施形態的窗材80可設為使所述光學體60與玻璃基板81以該光學體60的未配置第1透明無機層64的面與玻璃基板81相向的方式積層而成者。如此,本實施形態的窗材至少包括所述光學體,耐紫外線性優異,並且可減少反射光的色澤及其變化,因此可較佳地用作高層大樓或住宅等的建築用窗玻璃、車輛用窗玻璃等。 再者,本實施形態的窗材可僅於玻璃基板的單面包括所述光學體,亦可於兩面包括所述光學體。(Window material) A window material (hereinafter, sometimes referred to as a "window material of this embodiment") according to an embodiment of the present invention includes a glass substrate and the optical body. Specifically, as shown in FIG. 7, the window material 80 according to this embodiment may be such that the optical body 60 and the glass substrate 81 are formed on the surface of the optical body 60 on which the first transparent inorganic layer 64 is not disposed and the glass substrate 81. Layered in opposite ways. As described above, the window material of this embodiment includes at least the above-mentioned optical body, has excellent ultraviolet resistance, and can reduce the color and change of reflected light. Therefore, the window material can be suitably used as a window glass for a high-rise building, a house, or a vehicle. Use window glass, etc. In addition, the window material of this embodiment may include the optical body only on one side of the glass substrate, or may include the optical body on both sides.

本實施形態的窗材亦可為多層玻璃。此處,所謂多層玻璃,如圖8(a)~圖8(h)所示,通常是指具有多片玻璃基板(82、83)於周邊介隔間隔物85而進行積層並於各玻璃基板之間形成空間的結構的玻璃。 而且,作為多層玻璃的本實施形態的窗材80,如圖8(a)所示,作為窗玻璃設置於建築物等時,可僅於成為室外側的玻璃基板82的室外側的面設置光學體60,如圖8(b)~圖8(d)所示,可於成為室外側的玻璃基板82的室外側的面設置光學體60,並且亦於成為室內側的玻璃基板83的單面及/或兩面設置光學體60,進而如圖8(e)~圖8(h)所示,可於成為室外側的玻璃基板82的兩面設置光學體,並且任意地亦於成為室內側的玻璃基板83的單面及/或兩面設置光學體60。The window material of this embodiment may be a multilayer glass. Here, the so-called multilayer glass, as shown in FIGS. 8 (a) to 8 (h), generally means that a plurality of glass substrates (82, 83) are laminated on the peripheral substrate with spacers 85 interposed therebetween, and each glass substrate is laminated. Structure of glass forming a space between. Furthermore, as shown in FIG. 8 (a), as the window material 80 of the present embodiment as a multilayer glass, when it is installed as a window glass in a building or the like, the optical material can be provided only on the outdoor side surface of the glass substrate 82 serving as the outdoor side. As shown in FIGS. 8 (b) to 8 (d), the body 60 may be provided with an optical body 60 on the surface of the outdoor side of the glass substrate 82 serving as the outdoor side, and also on one side of the glass substrate 83 serving as the indoor side. Optical bodies 60 are provided on both sides, and as shown in FIGS. 8 (e) to 8 (h), the optical bodies can be provided on both sides of the glass substrate 82 that becomes the outdoor side, and optionally also becomes the glass that becomes the indoor side. An optical body 60 is provided on one side and / or both sides of the substrate 83.

另外,於本實施形態的窗材為多層玻璃,且作為窗玻璃設置於建築物等時,於成為室外側的玻璃基板的室外側的面設置光學體的情況下,特佳為於該光學體的與配置有第1透明無機層的面為相反側的面(更具體而言,於該光學體與玻璃基板之間)包括吸收可見光的黏著層。藉由包括此種吸收可見光的黏著層,可效率良好地吸收透過光學體並入射至黏著層的可見光、透過光學體及黏著層後於室外側的玻璃基板的室內側的面進行反射並入射至黏著層的可見光、以及透過光學體、黏著層及室外側的玻璃基板後於室內側的玻璃基板進行反射,透過室外側的玻璃基板並入射至黏著層的可見光等來減少可見光線透過率,於維持高的眺望性的狀態下消除多層玻璃可頻繁面臨的防眩性的問題。 [實施例]In addition, when the window material of the present embodiment is a multilayer glass and is installed as a window glass in a building or the like, an optical body is particularly preferably provided on the surface of the outdoor side of the glass substrate on the outdoor side. The surface opposite to the surface on which the first transparent inorganic layer is disposed (more specifically, between the optical body and the glass substrate) includes an adhesive layer that absorbs visible light. By including such an adhesive layer that absorbs visible light, it is possible to efficiently absorb visible light that passes through the optical body and enters the adhesive layer, and after passing through the optical body and the adhesive layer, it reflects on the indoor surface of the glass substrate on the outdoor side and is incident on The visible light of the adhesive layer and the glass substrate on the indoor side are reflected after passing through the optical body, the adhesive layer and the outdoor glass substrate, and the visible light transmitted through the outdoor glass substrate and incident on the adhesive layer to reduce the visible light transmittance. The problem of anti-glare that can be frequently encountered with multilayer glass is eliminated while maintaining a high viewability. [Example]

其次,列舉實施例來對本發明進行更具體的說明,但本發明並不限制於下述實施例。Next, the present invention will be described more specifically with reference to examples, but the present invention is not limited to the following examples.

(1)透明無機層的厚度與波長320 nm的透光率的關係 使用包含丙烯酸系紫外線硬化性樹脂的組成物,並利用形狀轉印法將具有微細凹凸表面的樹脂層形成於PET製基材(東洋紡股份有限公司製造,「A4300」,厚度75 μm)上,從而獲得基底層。繼而,利用濺鍍法將包含ZnO及CeO2 (ZnO:CeO2 =30:70(質量比))的第1透明無機層(單層)積層於該基底層的樹脂層的微細凹凸表面上,並利用濺鍍法將含有SiO2 的第2透明無機層積層於該第1透明無機層的表面上,從而獲得光學體。 此處,使用日本分光股份有限公司製造的「V-560」,依據JIS A 5759來對將第1透明無機層(單層)的厚度變更各種而獲得的多個所述光學體分別測定波長320 nm的透光率。而且,將第1透明無機層(單層)的厚度與波長320 nm的透光率的關係示於圖9中。 由圖9可知,第1透明無機層(單層)存在厚度變得越大,波長320 nm的透光率越下降、耐紫外線性變得越高的傾向。具體而言,若第1透明無機層的厚度為100 nm以上,則透過率大約為3%以下而較佳,若為120 nm以上,則透過率大約為2%以下而更佳。(1) Relationship between the thickness of the transparent inorganic layer and the light transmittance at a wavelength of 320 nm Using a composition containing an acrylic ultraviolet curable resin, a resin layer having a fine uneven surface was formed on a PET substrate using a shape transfer method (Manufactured by Toyobo Co., Ltd., "A4300", thickness 75 μm) to obtain a base layer. Then, a first transparent inorganic layer (single layer) containing ZnO and CeO 2 (ZnO: CeO 2 = 30: 70 (mass ratio)) was laminated on the fine uneven surface of the resin layer of the base layer by a sputtering method. Then, a second transparent inorganic layer containing SiO 2 was laminated on the surface of the first transparent inorganic layer by a sputtering method to obtain an optical body. Here, "V-560" manufactured by JASCO Corporation was used to measure a wavelength of 320 for each of the plurality of optical bodies obtained by varying the thickness of the first transparent inorganic layer (single layer) in accordance with JIS A 5759. Light transmittance in nm. The relationship between the thickness of the first transparent inorganic layer (single layer) and the light transmittance at a wavelength of 320 nm is shown in FIG. 9. As can be seen from FIG. 9, the larger the thickness of the first transparent inorganic layer (single layer), the lower the light transmittance at a wavelength of 320 nm, and the higher the ultraviolet resistance. Specifically, if the thickness of the first transparent inorganic layer is 100 nm or more, the transmittance is preferably about 3% or less, and if it is 120 nm or more, the transmittance is preferably about 2% or less.

(2)第1透明無機層中的中間分割層的厚度與波長320 nm的透光率的關係 使用包含丙烯酸系紫外線硬化性樹脂的組成物,並利用形狀轉印法將具有微細凹凸表面的樹脂層形成於PET製基材(東洋紡股份有限公司製造,「A4300」,厚度75 μm)上,從而獲得基底層。繼而,利用濺鍍法將包含ZnO及CeO2 (ZnO:CeO2 =30:70(質量比))的透明無機層B積層於該基底層的樹脂層的微細凹凸表面上,並利用濺鍍法將僅包含SiO2 的中間分割層積層於該透明無機層B的表面上,利用濺鍍法將具有與透明無機層B相同的組成的透明無機層A積層於該中間分割層的表面上,利用濺鍍法將含有SiO2 的第2透明無機層積層於該透明無機層A的表面上,從而獲得光學體。 此處,將第1透明無機層的總厚設為150 nm或170 nm,並將透明無機層A的厚度及透明無機層B的厚度設為相同後,與所述同樣地對將中間分割層的積層厚度變更各種而獲得的多個所述光學體分別測定波長320 nm的透光率。而且,將中間分割層的厚度與波長320 nm的透光率的關係示於圖10中。 由圖10可知,藉由設置中間分割層(設為厚度超過0),存在波長320 nm的透光率下降、耐紫外線性變高的傾向。且可知,特別是於中間分割層的厚度為40 nm~60 nm時,存在透過率進一步下降、耐紫外線性變得更高的傾向。(2) Relationship between the thickness of the intermediate division layer in the first transparent inorganic layer and the light transmittance at a wavelength of 320 nm. Using a composition containing an acrylic ultraviolet curable resin, a resin having a fine uneven surface was transferred by a shape transfer method. The layer was formed on a PET substrate (manufactured by Toyobo Co., Ltd., "A4300", thickness 75 μm) to obtain a base layer. Next, a transparent inorganic layer B containing ZnO and CeO 2 (ZnO: CeO 2 = 30: 70 (mass ratio)) was laminated on the fine uneven surface of the resin layer of the base layer by a sputtering method, and a sputtering method was used. An intermediate division layer containing only SiO 2 was laminated on the surface of the transparent inorganic layer B, and a transparent inorganic layer A having the same composition as the transparent inorganic layer B was laminated on the surface of the intermediate division layer by a sputtering method. A sputtering method is used to laminate a second transparent inorganic layer containing SiO 2 on the surface of the transparent inorganic layer A to obtain an optical body. Here, the total thickness of the first transparent inorganic layer is set to 150 nm or 170 nm, and the thickness of the transparent inorganic layer A and the thickness of the transparent inorganic layer B are set to be the same. A plurality of the optical bodies obtained by varying the thickness of the laminated layer were measured for the light transmittance at a wavelength of 320 nm. The relationship between the thickness of the intermediate division layer and the light transmittance at a wavelength of 320 nm is shown in FIG. 10. As can be seen from FIG. 10, by providing the intermediate division layer (those having a thickness exceeding 0), there is a tendency that the light transmittance at a wavelength of 320 nm decreases and the ultraviolet resistance increases. Moreover, it turns out that especially when the thickness of an intermediate division layer is 40 nm-60 nm, there exists a tendency for the transmittance | permeability to fall further and ultraviolet resistance to become higher.

(3)透明無機層B的厚度的比例與波長320 nm的透光率的關係 與所述(2)同樣地進行而獲得光學體。此處,將第1透明無機層的總厚設為150 nm,並將中間分割層的積層厚度設為10 nm後,與所述同樣地對將透明無機層B的積層厚度變更各種而獲得的多個所述光學體分別測定波長320 nm的透光率。而且,將透明無機層B的厚度與波長320 nm的透光率的關係示於圖11中。 由圖11可知,即便變更第1透明無機層的總厚中的透明無機層B的厚度,波長320 nm的透光率亦處於0.6%~0.8%的範圍內,並未對耐紫外線性產生大的影響。(3) The relationship between the ratio of the thickness of the transparent inorganic layer B and the light transmittance at a wavelength of 320 nm was performed in the same manner as in the above (2) to obtain an optical body. Here, the total thickness of the first transparent inorganic layer was set to 150 nm, and the laminated thickness of the intermediate division layer was set to 10 nm. A plurality of the optical bodies each measure a light transmittance at a wavelength of 320 nm. The relationship between the thickness of the transparent inorganic layer B and the light transmittance at a wavelength of 320 nm is shown in FIG. 11. As can be seen from FIG. 11, even if the thickness of the transparent inorganic layer B in the total thickness of the first transparent inorganic layer is changed, the light transmittance at a wavelength of 320 nm is in the range of 0.6% to 0.8%, and the ultraviolet resistance is not greatly increased. Impact.

(4)透明無機層B的厚度與反射光的a*及b*的關係 與所述(2)同樣地進行而獲得光學體。此處,將第1透明無機層的總厚設為150 nm,並將中間分割層的積層厚度設為10 nm後,對於將透明無機層B的積層厚度變更各種而獲得的多個所述光學體,根據使用分光光度計並於300 nm至800 nm的波長範圍進行測定而得的反射分光光度的資料,基於CIELAB色空間,算出相對於5°或60°的光入射的反射光的a*及b*。將透明無機層B的厚度與a*及b*的關係示於圖12中。 由圖12可知,即便變更第1透明無機層的總厚中的透明無機層B的厚度,至少相對於60°的光的入射的反射光的a*及b*的值推移至零附近。且可知,特別是於第1透明無機層的總厚中的透明無機層B的厚度的比例為30%以下的情況下,相對於5°及60°的光入射的反射光的a*及b*的值更接近零。 [產業上之可利用性](4) The relationship between the thickness of the transparent inorganic layer B and a * and b * of the reflected light is performed in the same manner as in (2) above to obtain an optical body. Here, after the total thickness of the first transparent inorganic layer is set to 150 nm, and the laminated thickness of the intermediate division layer is set to 10 nm, a plurality of the optical elements obtained by changing the laminated thickness of the transparent inorganic layer B in various ways are obtained. Based on the CIELAB color space, based on the CIELAB color space, calculate the a * of the reflected light incident on the light with 5 ° or 60 ° based on the reflection spectrophotometry data obtained using a spectrophotometer and measured in a wavelength range of 300 nm to 800 nm. And b *. The relationship between the thickness of the transparent inorganic layer B and a * and b * is shown in FIG. 12. As can be seen from FIG. 12, even if the thickness of the transparent inorganic layer B in the total thickness of the first transparent inorganic layer is changed, the values of a * and b * at least with respect to the incident reflected light of 60 ° light shift to near zero. Furthermore, it can be seen that, particularly when the ratio of the thickness of the transparent inorganic layer B in the total thickness of the first transparent inorganic layer is 30% or less, a * and b with respect to the reflected light incident on light of 5 ° and 60 ° The value of * is closer to zero. [Industrial availability]

根據本發明,可提供一種耐紫外線性優異且可減少反射光的色澤及其變化的光學體、以及耐紫外線性優異且可減少反射光的色澤及其變化的窗材。According to the present invention, it is possible to provide an optical body having excellent ultraviolet resistance and reducing the color and change of reflected light, and a window material having excellent ultraviolet resistance and reducing the color and change of reflected light.

1‧‧‧形狀轉印裝置1‧‧‧ Shape Transfer Device

2‧‧‧原盤2‧‧‧Original

23‧‧‧微細凹凸結構23‧‧‧fine uneven structure

51‧‧‧基材供給輥51‧‧‧ substrate supply roller

52‧‧‧捲取輥52‧‧‧ take-up roller

53、54‧‧‧引導輥53, 54‧‧‧Guide roller

55‧‧‧夾持輥55‧‧‧ pinch roller

56‧‧‧剝離輥56‧‧‧ peeling roller

57‧‧‧塗佈裝置57‧‧‧coating device

58‧‧‧光源58‧‧‧light source

60‧‧‧光學體60‧‧‧ Optics

61‧‧‧基材61‧‧‧ substrate

62‧‧‧樹脂層62‧‧‧resin layer

63‧‧‧基底層(微細凹凸層)63‧‧‧ basal layer (fine uneven layer)

64‧‧‧第1透明無機層64‧‧‧The first transparent inorganic layer

64a‧‧‧透明無機層A64a‧‧‧Transparent inorganic layer A

64b‧‧‧透明無機層B64b‧‧‧ transparent inorganic layer B

64m‧‧‧中間分割層64m‧‧‧ middle split layer

65‧‧‧第2透明無機層65‧‧‧ 2nd transparent inorganic layer

66‧‧‧第3透明無機層66‧‧‧ 3rd transparent inorganic layer

67‧‧‧密著層67‧‧‧ Adhesive layer

80‧‧‧窗材80‧‧‧Window

81、82、83‧‧‧玻璃基板81, 82, 83‧‧‧ glass substrate

84‧‧‧黏著層84‧‧‧ Adhesive layer

85‧‧‧間隔物85‧‧‧ spacer

圖1是表示本發明的一實施形態的光學體的構成例的示意剖面圖。 圖2是表示本發明的一實施形態的光學體的構成例的示意剖面圖。 圖3是表示用以形成本發明的一實施形態的光學體所包括的一例基底層的一例的方法的示意圖。 圖4是表示本發明的一實施形態的光學體的構成例的示意剖面圖。 圖5是表示本發明的一實施形態的光學體的構成例的示意剖面圖。 圖6是表示本發明的一實施形態的窗材的構成例的示意剖面圖。 圖7是表示本發明的一實施形態的窗材的構成例的示意剖面圖。 圖8(a)~圖8(h)是表示本發明的一實施形態的窗材的構成例的示意剖面圖。 圖9是表示第1透明無機層(單層)的厚度與波長320 nm的透光率的關係的圖。 圖10是表示中間分割層的厚度與波長320 nm的透光率的關係的圖。 圖11是表示透明無機層B的厚度與波長320 nm的透光率的關係的圖。 圖12是表示透明無機層B的厚度與a*及b*的關係的圖。FIG. 1 is a schematic cross-sectional view showing a configuration example of an optical body according to an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view showing a configuration example of an optical body according to an embodiment of the present invention. FIG. 3 is a schematic diagram illustrating an example of a method for forming an example of a base layer included in an optical body according to an embodiment of the present invention. 4 is a schematic cross-sectional view showing a configuration example of an optical body according to an embodiment of the present invention. 5 is a schematic cross-sectional view showing a configuration example of an optical body according to an embodiment of the present invention. 6 is a schematic cross-sectional view showing a configuration example of a window material according to an embodiment of the present invention. 7 is a schematic cross-sectional view showing a configuration example of a window material according to an embodiment of the present invention. 8 (a) to 8 (h) are schematic cross-sectional views illustrating a configuration example of a window material according to an embodiment of the present invention. FIG. 9 is a graph showing the relationship between the thickness of the first transparent inorganic layer (single layer) and the light transmittance at a wavelength of 320 nm. FIG. 10 is a diagram showing the relationship between the thickness of the intermediate division layer and the light transmittance at a wavelength of 320 nm. FIG. 11 is a graph showing the relationship between the thickness of the transparent inorganic layer B and the light transmittance at a wavelength of 320 nm. FIG. 12 is a diagram showing the relationship between the thickness of the transparent inorganic layer B and a * and b *.

Claims (8)

一種光學體,其包括:基底層、第1透明無機層以及第2透明無機層,所述光學體的特徵在於: 所述第1透明無機層包含透明無機層A、透明無機層B、以及所述透明無機層A及所述透明無機層B之間的中間分割層, 所述第1透明無機層以所述透明無機層B成為基底層側的方式配置於所述基底層上, 所述第2透明無機層配置於所述第1透明無機層上。An optical body includes a base layer, a first transparent inorganic layer, and a second transparent inorganic layer. The optical body is characterized in that: the first transparent inorganic layer includes a transparent inorganic layer A, a transparent inorganic layer B, and The intermediate divided layer between the transparent inorganic layer A and the transparent inorganic layer B, the first transparent inorganic layer is disposed on the base layer such that the transparent inorganic layer B becomes a base layer side, and the first 2 transparent inorganic layers are arranged on the first transparent inorganic layer. 如申請專利範圍第1項所述的光學體,其中所述第1透明無機層含有ZnO及CeO2 的至少任一者, 所述第2透明無機層含有SiO2 、SiN、SiON及MgF2 的至少任一者。The optical body according to item 1 of the scope of patent application, wherein the first transparent inorganic layer contains at least any one of ZnO and CeO 2 , and the second transparent inorganic layer contains SiO 2 , SiN, SiON, and MgF 2 At least either. 如申請專利範圍第1項或第2項所述的光學體,其中所述中間分割層僅包含SiO2The optical body according to item 1 or 2 of the scope of patent application, wherein the intermediate split layer contains only SiO 2 . 如申請專利範圍第1項至第3項中任一項所述的光學體,其中所述第1透明無機層的總厚中的所述透明無機層B的厚度的比例為30%以下。The optical body according to any one of claims 1 to 3, wherein a ratio of a thickness of the transparent inorganic layer B in a total thickness of the first transparent inorganic layer is 30% or less. 如申請專利範圍第1項至第4項中任一項所述的光學體,其於所述基底層與所述第1透明無機層之間進而包括密著層。The optical body according to any one of claims 1 to 4 of the patent application scope, further comprising an adhesion layer between the base layer and the first transparent inorganic layer. 如申請專利範圍第1項至第5項中任一項所述的光學體,其於所述第2透明無機層上進而包括第3透明無機層。The optical body according to any one of claims 1 to 5 of the patent application scope, further comprising a third transparent inorganic layer on the second transparent inorganic layer. 如申請專利範圍第1項至第6項中任一項所述的光學體,其中所述中間分割層的厚度為30 nm以上且60 nm以下。The optical body according to any one of claims 1 to 6, wherein the thickness of the intermediate division layer is 30 nm or more and 60 nm or less. 一種窗材,其特徵在於包括:玻璃基板、及如申請專利範圍第1項至第7項中任一項所述的光學體。A window material, comprising: a glass substrate; and the optical body according to any one of items 1 to 7 of the scope of patent application.
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