TW201908427A - Laminated body, printed wiring board using the same, flexible printed wiring board, and molded article - Google Patents
Laminated body, printed wiring board using the same, flexible printed wiring board, and molded articleInfo
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- TW201908427A TW201908427A TW107123638A TW107123638A TW201908427A TW 201908427 A TW201908427 A TW 201908427A TW 107123638 A TW107123638 A TW 107123638A TW 107123638 A TW107123638 A TW 107123638A TW 201908427 A TW201908427 A TW 201908427A
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/098—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising condensation resins of aldehydes, e.g. with phenols, ureas or melamines
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/16—Layered products comprising a layer of metal next to a particulate layer
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/042—Coating with two or more layers, where at least one layer of a composition contains a polymer binder
- C08J7/0423—Coating with two or more layers, where at least one layer of a composition contains a polymer binder with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/10—Esters; Ether-esters
- C08K5/12—Esters; Ether-esters of cyclic polycarboxylic acids
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D161/00—Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
- C09D161/04—Condensation polymers of aldehydes or ketones with phenols only
- C09D161/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D161/00—Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
- C09D161/34—Condensation polymers of aldehydes or ketones with monomers covered by at least two of the groups C09D161/04, C09D161/18 and C09D161/20
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
- C09D163/04—Epoxynovolacs
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D201/00—Coating compositions based on unspecified macromolecular compounds
- C09D201/02—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Laminated Bodies (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
本發明關於可用於印刷配線板、可撓性印刷配線板、成形品等之積層體。 The present invention relates to a laminated body that can be used for printed wiring boards, flexible printed wiring boards, and molded articles.
隨著電子機器之小型化、高速化,要求印刷配線基板之高密度化、高性能化,為了應付此要求,要求表面為平滑且具有充分薄的導電層(金屬層)之印刷配線板。又,作為構成此印刷配線基板者,已知有可撓性覆銅積層板(以下,簡稱「FCCL」)。FCCL主要係藉由使用環氧樹脂系接著劑來貼合耐熱性高分子薄膜與銅箔之方法而製造。 With the miniaturization and high speed of electronic devices, high density and high performance of printed wiring boards are required. To meet this demand, printed wiring boards with smooth surfaces and sufficiently thin conductive layers (metal layers) are required. Further, as a constituent of this printed wiring board, a flexible copper-clad laminated board (hereinafter, referred to as "FCCL") is known. FCCL is mainly manufactured by a method of bonding a heat-resistant polymer film and a copper foil using an epoxy-based adhesive.
然而,於使用此銅箔的FCCL中,由於一邊拉出經捲成捲筒狀的銅箔,一邊貼合,在操作上銅箔無法充分地減薄。再者,為了提高與高分子薄膜之密著性,必須將銅箔表面予以粗化,因此有在為了謀求印刷配線板的高密度化、高性能化所需的高頻率(GHz頻段)、高傳送速度(數十Gbps)範圍中發生傳送損失之問題。 However, in the FCCL using this copper foil, the copper foil cannot be sufficiently thin in operation because it is attached while pulling out the rolled copper foil. In addition, in order to improve the adhesion with the polymer film, the surface of the copper foil must be roughened. Therefore, there are high frequency (GHz band), high frequency required for high density and high performance of printed wiring boards. A problem of transmission loss occurs in a transmission speed (tens of Gbps) range.
此處,作為將FCCL的銅層予以薄膜化之方法,有提案藉由蒸鍍法或濺鍍法,在聚醯亞胺薄膜之表面上形成金屬薄膜後,在該金屬薄膜上以電鍍法、無 電解鍍敷法或組合兩者之方法,來形成銅之方法(例如,參照專利文獻1)。然而,於此方法中,為了形成金屬薄膜,使用蒸鍍法或濺鍍法,因此需要大規模的真空設備,有在設備上限定基材尺寸等之問題。 Here, as a method for thinning the copper layer of FCCL, there is a proposal to form a metal thin film on the surface of a polyimide film by a vapor deposition method or a sputtering method, and then use the plating method on the metal thin film, A method for forming copper by an electroless plating method or a combination of both methods (for example, refer to Patent Document 1). However, in this method, in order to form a metal thin film, a vapor deposition method or a sputtering method is used. Therefore, large-scale vacuum equipment is required, and there is a problem that the size of the substrate is limited on the equipment.
因此,要求可在不粗化銅箔等的金屬層之表面下,與高分子薄膜等的支撐體具有充分的密著性,且在該金屬層之形成時,不需要大規模的真空設備,能以簡便的方法製造之積層體。 Therefore, it is required to have sufficient adhesion with a support such as a polymer film under the surface of a metal layer such as a copper foil that is not roughened, and large-scale vacuum equipment is not required when the metal layer is formed. A laminated body that can be manufactured by a simple method.
又,以往作為向塑膠成形品的裝飾鍍敷,係使用於行動電話、個人電腦、鏡子、容器、各種開關、蓮蓬頭等。此等用途之支撐體係僅限定於丙烯腈-丁二烯-苯乙烯共聚物(以下,簡稱「ABS」)或ABS與聚碳酸酯之聚合物摻合物(以下,簡稱「ABS-PC」)。此之理由係為了確保基材與鍍敷膜之密著性,而必須將基材表面予以粗化,例如若為ABS,則能以六價鉻酸、過錳酸鹽等之強力氧化劑,蝕刻、去除聚丁二烯成分而表面粗化。然而,六價鉻酸等由於是環境負荷物質,較佳為不使用,替代方法已開發至今(例如,參照專利文獻2)。 In addition, conventionally, it is used for decorative plating of plastic molded articles in mobile phones, personal computers, mirrors, containers, various switches, shower heads, and the like. Support systems for these applications are limited to acrylonitrile-butadiene-styrene copolymers (hereinafter, referred to as "ABS") or polymer blends of ABS and polycarbonate (hereinafter, referred to as "ABS-PC") . The reason is that in order to ensure the adhesion between the substrate and the plating film, the surface of the substrate must be roughened. For example, if it is ABS, it can be etched with a strong oxidant such as hexavalent chromic acid and permanganate. 3. Remove the polybutadiene component and roughen the surface. However, since hexavalent chromic acid and the like are environmentally hazardous substances, they are preferably not used, and alternative methods have been developed so far (for example, refer to Patent Document 2).
如此地,於以向塑膠成形品的裝飾等為目的之鍍敷中,要求基材係不限定於ABS或ABS-PC,即使為其它種類的塑膠,也得到密著性優異的鍍敷膜,而且減低環境負荷物質之使用量。 In this way, in the plating for the purpose of decoration of plastic molded products, the base material is not limited to ABS or ABS-PC, and even if it is other types of plastic, a plating film with excellent adhesion is obtained. It also reduces the amount of environmentally hazardous substances used.
專利文獻1 日本特開2015-118044號公報 Patent Document 1 Japanese Patent Application Publication No. 2015-118044
專利文獻2 日本發明專利第5830807號公報 Patent Document 2 Japanese Patent Publication No. 5830807
本發明所欲解決的課題在於提供可在不粗化支撐體表面下,以簡便的方法製造,且支撐體與金屬層(金屬鍍敷層)之間的密著性優異之積層體、使用其之印刷配線板、可撓性印刷配線板及成形品。 The problem to be solved by the present invention is to provide a laminated body which can be manufactured by a simple method without roughening the surface of the support body, and which has excellent adhesion between the support body and a metal layer (metal plating layer), and use the same. Printed wiring boards, flexible printed wiring boards, and molded products.
本發明者們為了解決上述課題而專心致力地研究,結果發現在支撐體上,作為底漆層,設置含有具有胺基三環的化合物之層,在其上依順序積層有由金屬奈米粒子所形成的金屬層與金屬鍍敷層之積層體,係能解決上述課題,而完成本發明。 The present inventors have intensively studied in order to solve the above-mentioned problems, and as a result, have found that the support layer, as a primer layer, The layer of the cyclic compound has a laminated body formed of a metal layer and a metal plating layer formed of metal nano particles in this order, which solves the above-mentioned problems and completes the present invention.
即,本發明提供積層體、使用其之印刷配線板、可撓性印刷配線板及成形品,該積層體係於支撐體(A)之上依順序積層有底漆層(B)、金屬奈米粒子層(C)及金屬鍍敷層(D)之積層體,其特徵為前述底漆層(B)係含有具有胺基三環的化合物(b1)之層。 That is, the present invention provides a laminated body, a printed wiring board using the same, a flexible printed wiring board, and a molded article. The laminated system is sequentially laminated on the support (A) with a primer layer (B) and a metal nano. The laminated body of the particle layer (C) and the metal plating layer (D) is characterized in that the primer layer (B) contains A layer of the cyclic compound (b1).
本發明之積層體係即使不粗化支撐體表面,支撐體與金屬層(金屬鍍敷層)之間的密著性也優異。又,於該金屬層之薄膜化時,即使不使用大規模的真空設備,也為表面平滑且具有充分薄的金屬層之積層體。 Even if the laminated system of the present invention does not roughen the surface of the support, the adhesion between the support and the metal layer (metal plating layer) is excellent. In addition, when the metal layer is formed into a thin film, it is a laminated body having a smooth surface and a sufficiently thin metal layer without using a large-scale vacuum equipment.
又,本發明之積層體係藉由將金屬層圖案化,而例如可適用作為印刷配線板、可撓性印刷配線板、針對觸控面板的導電性薄膜、觸控面板用金屬網格、有機太陽能電池、有機EL元件、有機電晶體、非接觸IC卡等的RFID、電磁波屏障、LED照明基材、數位電子看板等之電子構件。特別地,最適合FCCL等之可撓性印刷配線板用途。 The multilayer system of the present invention is suitable for use as a printed wiring board, a flexible printed wiring board, a conductive film for a touch panel, a metal grid for a touch panel, or an organic solar cell by patterning a metal layer. Electronic components such as RFID for batteries, organic EL elements, organic transistors, non-contact IC cards, electromagnetic wave barriers, LED lighting substrates, and digital signage. In particular, it is most suitable for flexible printed wiring boards such as FCCL.
另外,藉由應用於成形品,可適宜使用於連接光通訊等的配線之連接器、電器構件、電動馬達周邊構件、電池構件等的電子構件;汽車用裝飾零件、燈反射器、行動電話、個人電腦、鏡子、容器、家電、各種開關、水龍頭零件、蓮蓬頭等之裝飾。 In addition, by applying it to molded products, it can be suitably used for electronic components such as connectors, electrical components, electric motor peripheral components, battery components, etc. for connecting optical communication wiring; automotive decorative parts, lamp reflectors, mobile phones, Decoration for personal computers, mirrors, containers, home appliances, various switches, faucet parts, shower heads, etc.
本發明之積層體係於支撐體(A)之上依順序積層有底漆層(B)、金屬奈米粒子層(C)及金屬鍍敷層(D)之積層體,其中前述底漆層(B)係含有具有胺基三環的化合物(b1)之層。 The laminated system of the present invention is a laminated body having a primer layer (B), a metal nanoparticle layer (C), and a metal plating layer (D) laminated on the support (A) in this order, wherein the aforementioned primer layer ( B) contains three amino groups A layer of the cyclic compound (b1).
本發明之積層體係可在為在前述支撐體(A)之單面依順序積層有底漆層(B)等之積層體,也可為在前述支撐體(A)之兩面依順序積層有底漆層(B)等之積層體。 The laminated system of the present invention may be a laminated body having a primer layer (B) and the like laminated in order on one side of the aforementioned support (A), or may be laminated on both sides of the aforementioned support (A) in order. Laminated body of lacquer layer (B).
作為前述支撐體(A),例如可舉出由聚醯亞胺、聚醯胺醯亞胺、聚醯胺、聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚碳酸酯、丙烯腈-丁二烯-苯乙烯(ABS)樹脂、ABS與聚碳酸酯之聚合物摻合物、聚(甲基)丙烯酸甲酯等之丙烯酸樹脂、聚四氟乙烯、聚偏二氟乙烯、聚氯乙烯、聚偏二氯乙烯、聚乙烯醇、聚碳酸酯、聚乙烯、聚丙烯、聚胺基甲酸酯、液晶聚合物(LCP)、聚醚醚酮(PEEK)、聚苯硫醚(PPS)、聚伸苯基碸(PPSU)、環氧樹脂、纖維素奈米纖維、矽、陶瓷、玻璃等所成之支撐體、由彼等所成之多孔質的支撐體、由鋼板、銅等的金屬所成之支撐體、對彼等的表面蒸鍍處理有碳化矽、類鑽石碳、鋁、銅、鈦等之支撐體等。 Examples of the support (A) include polyimide, polyimide, imine, polyimide, polyethylene terephthalate, polyethylene naphthalate, polycarbonate, and the like. Acrylonitrile-butadiene-styrene (ABS) resin, polymer blend of ABS and polycarbonate, acrylic resin such as poly (meth) acrylate, polytetrafluoroethylene, polyvinylidene fluoride, Polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, polycarbonate, polyethylene, polypropylene, polyurethane, liquid crystal polymer (LCP), polyetheretherketone (PEEK), polyphenylene sulfide (PPS), polyphenylene terephthalate (PPSU), epoxy resin, cellulose nanofiber, silicon, ceramic, glass, etc. support, porous support made of them, steel plate, Supports made of metals such as copper, and supports having silicon carbide, diamond-like carbon, aluminum, copper, titanium, and the like are vapor-deposited on their surfaces.
又,將本發明之積層體使用於印刷配線板等時,作為前述支撐體(A),較佳為使用由聚醯亞胺、聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、液晶聚合物(LCP)、聚醚醚酮(PEEK)、玻璃、纖維素奈米纖維等所構成之支撐體。 Moreover, when using the laminated body of this invention for a printed wiring board etc., as said support body (A), it is preferable to use polyimide, polyethylene terephthalate, and polyethylene naphthalate. , Liquid crystal polymer (LCP), polyether ether ketone (PEEK), glass, cellulose nanofiber, etc.
再者,將本發明之積層體使用於可撓性印刷配線板等時,作為前述支撐體(A),較佳為具有能折彎的柔軟性之薄膜狀或薄片狀支撐體。 Moreover, when using the laminated body of this invention for a flexible printed wiring board etc., as said support body (A), it is preferable that it is a film-shaped or sheet-shaped support body which has the flexibility which can be bend | folded.
當前述支撐體(A)之形狀為薄膜狀或薄片狀時,其厚度一般較佳為1μm以上5,000μm以下,更佳為1μm以上300μm以下,尤佳為1μm以上200μm以下。 When the shape of the support (A) is a film or a sheet, the thickness is generally preferably 1 μm or more and 5,000 μm or less, more preferably 1 μm or more and 300 μm or less, and even more preferably 1 μm or more and 200 μm or less.
又,從可更提高前述支撐體(A)與後述的底漆層(B)之密著性來看,視需要亦可在前述支撐體(A)之 表面上,形成不喪失平滑性之程度的微細凹凸,或洗淨其表面上所附著的污垢,或為了羥基、羰基、羧基等官能基之導入而予以表面處理。具體而言,可舉出電暈放電處理等之電漿放電處理,紫外線處理等之乾式處理,使用水、酸‧鹼等之水溶液或有機溶劑等之濕式處理等方法。 In addition, in order to further improve the adhesion between the support (A) and a primer layer (B) described later, if necessary, the surface of the support (A) can be formed to a degree without loss of smoothness. Fine unevenness, or cleaning the dirt attached to the surface, or surface treatment for the introduction of functional groups such as hydroxyl, carbonyl, and carboxyl groups. Specifically, methods such as plasma discharge treatment such as corona discharge treatment, dry treatment such as ultraviolet light treatment, and wet treatment using an aqueous solution such as water, acid, alkali or the like, or an organic solvent, can be mentioned.
前述底漆層(B)係含有具有胺基三環的化合物(b1)之層。前述具有胺基三環的化合物(b1)係可為低分子量的化合物,也可為更高分子量的樹脂。 The primer layer (B) contains A layer of the cyclic compound (b1). Amino Tris The cyclic compound (b1) may be a low molecular weight compound or a higher molecular weight resin.
作為前述具有胺基三環的低分子量化合物,可使用具有胺基三環的各種添加劑。作為市售品,可舉出2,4-二胺基-6-乙烯基-s-三(四國化成股份有限公司製「VT」)、四國化成股份有限公司製「VD-3」或「VD-4」(具有胺基三環與羥基的化合物)、四國化成股份有限公司製「VD-5」(具有胺基三環與乙氧基矽基的化合物)等。此等之添加劑係可使用1種,也可併用2種以上。 Amine tris Low molecular weight cyclic compounds. Various additives for the ring. Examples of commercially available products include 2,4-diamino-6-vinyl-s-tri ("VT" by Shikoku Chemical Co., Ltd.), "VD-3" or "VD-4" by Shikoku Chemical Co., Ltd. Ring and hydroxy compound), Shikoku Chemical Co., Ltd. "VD-5" (with amine tris Ring and ethoxysilyl compounds) and the like. These additives may be used singly or in combination of two or more kinds.
使用前述具有胺基三環的低分子量化合物時,較佳為使用形成前述底漆層(B)用的樹脂。作為此時使用的樹脂,例如可舉出胺基甲酸酯樹脂、丙烯酸樹脂、胺基甲酸酯-乙烯基複合樹脂、環氧樹脂、醯亞胺樹脂、醯胺樹脂、三聚氰胺樹脂、酚樹脂、尿素甲醛樹脂、使用苯酚作為封端劑之封端聚異氰酸酯、聚乙烯醇、聚乙烯吡咯啶酮等。此等之樹脂係可使用1種,也可併用2種以上。於此等之中,從能更提高密著性來看,較佳為環氧樹脂,更佳為併用酚醛清漆樹脂與環氧樹脂。 Use the aforementioned In the case of a cyclic low-molecular-weight compound, it is preferable to use a resin for forming the primer layer (B). Examples of the resin used at this time include a urethane resin, an acrylic resin, a urethane-vinyl composite resin, an epoxy resin, a fluorene imine resin, a fluorene resin, a melamine resin, and a phenol resin. , Urea formaldehyde resin, blocked polyisocyanate using phenol as a blocking agent, polyvinyl alcohol, polyvinylpyrrolidone and the like. These resins may be used singly or in combination of two or more kinds. Among these, from the viewpoint of further improving the adhesion, an epoxy resin is preferable, and a novolak resin and an epoxy resin are more preferably used in combination.
相對於100質量份的樹脂,前述具有胺基三環的低分子量化合物之使用量較佳為0.1質量份以上50質量份以下,更佳為0.5質量份以上10質量份以下。 The above-mentioned amine-based tris The use amount of the cyclic low-molecular-weight compound is preferably from 0.1 to 50 parts by mass, more preferably from 0.5 to 10 parts by mass.
作為前述具有胺基三環的樹脂,可舉出在樹脂的聚合物鏈中以共價鍵導入胺基三環者。具體而言,可舉出胺基三改質酚醛清漆樹脂(b1-1)。 Amine tris Examples of cyclic resins include the introduction of amine groups into the polymer chain of the resin by covalent bonds. Ringer. Specifically, aminotris Modified novolac resin (b1-1).
前述胺基三改質酚醛清漆樹脂(b1-1)係胺基三環結構與酚結構隔著亞甲基而鍵結之酚醛清漆樹脂。前述胺基三改質酚醛清漆樹脂(b1-1)例如可藉由使三聚氰胺、苯并胍胺、乙胍等之胺基三化合物、與苯酚、甲酚、丁基苯酚、雙酚A、苯基苯酚、萘酚、間苯二酚等之酚化合物、與甲醛,在烷基胺等的弱鹼性觸媒之存在下或無觸媒,在中性附近共縮合反應,或使甲基醚化三聚氰胺等的胺基三化合物之烷基醚化物與前述酚化合物反應而得。 Amino Tris Modified novolac resin (b1-1) based amino Novolak resin in which a ring structure and a phenol structure are bonded via a methylene group. Amino Tris The modified novolac resin (b1-1) can be obtained by, for example, melamine, benzoguanamine, and ethylguanidine. Amine tris Compounds, phenol compounds with phenol, cresol, butylphenol, bisphenol A, phenylphenol, naphthol, resorcinol, etc., and formaldehyde, in the presence of weakly basic catalysts such as alkylamines, or No catalyst, co-condensation reaction near neutrality, or methyl etherification of amine groups such as melamine The alkyl etherate of the compound is obtained by reacting the aforementioned phenol compound.
前述胺基三改質酚醛清漆樹脂(b1-1)較佳為實質上不具有羥甲基者。又,於前述胺基三改質酚醛清漆樹脂(b1-1)中,亦可包含在其製造時作為副生成物產生的僅胺基三結構以亞甲基鍵結之分子、僅酚結構以亞甲基鍵結之分子等。再者,亦可包含若干量的未反應原料。 Amino Tris The modified novolac resin (b1-1) is preferably one having substantially no methylol group. Moreover, in the aforementioned amine group The modified novolac resin (b1-1) may contain only the amine group three produced as a by-product during its production. A molecule having a methylene structure and a molecule having only a phenol structure having a methylene bond. Furthermore, a certain amount of unreacted raw materials may be included.
作為前述酚結構,例如可舉出苯酚殘基、甲酚殘基、丁基苯酚殘基、雙酚A殘基、苯基苯酚殘基、萘酚殘基、間苯二酚殘基等。又,此處所謂的殘基,就 是鍵結於芳香環之碳的氫原子經脫除至少1個之結構。例如,當為苯酚時,意指羥基苯基。 Examples of the phenol structure include a phenol residue, a cresol residue, a butylphenol residue, a bisphenol A residue, a phenylphenol residue, a naphthol residue, and a resorcinol residue. The term "residue" herein refers to a structure in which at least one hydrogen atom of a carbon bonded to an aromatic ring has been removed. For example, when it is phenol, it means hydroxyphenyl.
作為前述三結構,例如可舉出來自三聚氰胺、苯并胍胺、乙胍等之胺基三化合物之結構。 As the aforementioned three Examples of the structure include melamine, benzoguanamine, and ethylguanidine Amine tris Structure of the compound.
前述酚結構及前述三結構係各自可使用1種,也可併用2種以上。又,從能更提高密著性來看,作為前述酚結構,較佳為苯酚殘基,作為前述三結構,較佳為來自三聚氰胺之結構。 The aforementioned phenol structure and the aforementioned three Each of the structural systems may be used alone, or two or more of them may be used in combination. From the viewpoint of further improving the adhesion, the phenol structure is preferably a phenol residue. The structure is preferably a structure derived from melamine.
又,前述胺基三改質酚醛清漆樹脂(b1-1)之羥值,從能更提高密著性來看,較佳為50mgKOH/g以上200mgKOH/g以下,更佳為80mgKOH/g以上180mgKOH/g以下,尤佳為100mgKOH/g以上150mgKOH/g以下。 Moreover, the aforementioned amino group tri The hydroxyl value of the modified novolac resin (b1-1) is more preferably from 50 mgKOH / g to 200 mgKOH / g, and more preferably from 80 mgKOH / g to 180 mgKOH / g, and more preferably It is 100 mgKOH / g or more and 150 mgKOH / g or less.
前述胺基三改質酚醛清漆樹脂(b1-1)係可使用1種,也可併用2種以上。 Amino Tris The modified novolac resin (b1-1) may be used alone or in combination of two or more.
另外,作為前述具有胺基三環的化合物(b1),當使用胺基三改質酚醛清漆樹脂(b1-1)時,較佳為併用環氧樹脂(b2)。 In addition, as the aforementioned Cyclic compound (b1) when using aminotris When the novolak resin (b1-1) is modified, it is preferred to use an epoxy resin (b2) in combination.
作為前述環氧樹脂(b2),可舉出雙酚A型環氧樹脂、雙酚F型環氧樹脂、聯苯型環氧樹脂、甲酚酚醛清漆型環氧樹脂、苯酚酚醛清漆型環氧樹脂、雙酚A酚醛清漆型環氧樹脂、醇醚型環氧樹脂、四溴雙酚A型環氧樹脂、萘型環氧樹脂、具有來自9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物衍生物的結構之含磷環氧化合物、具有來自二環戊二烯衍生物的結構之環氧樹脂、環 氧化大豆油等油脂之環氧化物等。此等之環氧樹脂係可使用1種,也可併用2種以上。 Examples of the epoxy resin (b2) include bisphenol A epoxy resin, bisphenol F epoxy resin, biphenyl epoxy resin, cresol novolac epoxy resin, and phenol novolac epoxy resin. Resin, bisphenol A novolac type epoxy resin, alcohol ether type epoxy resin, tetrabromobisphenol A type epoxy resin, naphthalene type epoxy resin, has a source from 9,10-dihydro-9-oxa-10 -Phosphaphenanthrene-10-oxide derivatives containing phosphorus-containing epoxy compounds, epoxy resins having a structure derived from dicyclopentadiene derivatives, epoxides such as epoxidized soybean oil and the like. These epoxy resins may be used singly or in combination of two or more kinds.
於前述環氧樹脂(b2)之中,從能更提高密著性來看,較佳為雙酚A型環氧樹脂、雙酚F型環氧樹脂、聯苯型環氧樹脂、甲酚酚醛清漆型環氧樹脂、苯酚酚醛清漆型環氧樹脂、雙酚A酚醛清漆型環氧樹脂,特佳為雙酚A型環氧樹脂。 Among the aforementioned epoxy resins (b2), bisphenol A-type epoxy resin, bisphenol F-type epoxy resin, biphenyl-type epoxy resin, and cresol novolac are preferred from the viewpoint of further improving adhesion. Lacquer-type epoxy resin, phenol novolac-type epoxy resin, bisphenol A novolac-type epoxy resin, particularly preferably bisphenol A-type epoxy resin.
又,前述環氧樹脂(b2)之環氧當量,從能更提高密著性來看,較佳為100g/當量以上300g/當量以下,更佳為120g/當量以上250g/當量以下,尤佳為150g/當量以上200g/當量以下。 The epoxy equivalent of the epoxy resin (b2) is more preferably from 100 g / equivalent to 300 g / equivalent, and more preferably from 120 g / equivalent to 250 g / equivalent, and more preferably It is 150 g / equivalent or more and 200 g / equivalent or less.
當前述底漆層(B)為含有胺基三改質酚醛清漆樹脂(b1-1)及環氧樹脂(b2)之層時,從能更提高密著性來看,前述胺基三改質酚醛清漆樹脂(b1-1)中的酚性羥基(x)與前述環氧樹脂(b2)中的環氧基(y)之莫耳比[(y)/(x)]較佳為0.1以上5以下,更佳為0.2以上3以下,尤佳為0.3以上2以下。 When the aforementioned primer layer (B) contains amine group When the layer of the novolac resin (b1-1) and the epoxy resin (b2) is modified, from the viewpoint of improving the adhesion more, The molar ratio [(y) / (x)] of the phenolic hydroxyl group (x) in the modified novolac resin (b1-1) to the epoxy group (y) in the epoxy resin (b2) is preferably 0.1 or more and 5 or less, more preferably 0.2 or more and 3 or less, and particularly preferably 0.3 or more and 2 or less.
於前述底漆層(B)之形成中,係使用底漆組成物(b)。前述底漆組成物(b)含有前述具有胺基三環的化合物(b1)或環氧樹脂(b2),視需要亦可進一步含有交聯劑(b3)。作為前述交聯劑(b3),較佳為使用多元羧酸。作為前述多元羧酸,例如可舉出偏苯三甲酸酐、均苯四甲酸酐、馬來酸酐、琥珀酸等。此等之交聯劑係可使用1種,也可併用2種以上。又,於此等交聯劑之中,從能更提高密著性來看,較佳為偏苯三甲酸酐。 In the formation of the primer layer (B), a primer composition (b) is used. The said primer composition (b) contains the said amine group The cyclic compound (b1) or the epoxy resin (b2) may further contain a crosslinking agent (b3) as necessary. As the crosslinking agent (b3), a polycarboxylic acid is preferably used. Examples of the polycarboxylic acid include trimellitic anhydride, pyromellitic anhydride, maleic anhydride, and succinic acid. These crosslinking agents may be used singly or in combination of two or more kinds. Among these crosslinking agents, trimellitic anhydride is preferred from the viewpoint of further improving the adhesion.
再者,於前述底漆層(B)之形成用的底漆組成物(b)中,視需要亦可摻合其它的樹脂(b4)作為上述之成分(b1)~(b3)以外的成分。作為前述其它的樹脂(b4),例如可舉出胺基甲酸酯樹脂、丙烯酸樹脂、封端異氰酸酯樹脂、三聚氰胺樹脂、酚樹脂等。此等其它的樹脂係可使用1種,也可併用2種以上。 Furthermore, in the primer composition (b) for forming the primer layer (B), if necessary, other resins (b4) may be blended as components other than the above-mentioned components (b1) to (b3). . Examples of the other resin (b4) include a urethane resin, an acrylic resin, a blocked isocyanate resin, a melamine resin, and a phenol resin. These other resin systems may be used alone or in combination of two or more.
又,於前述底漆組成物(b)中,為了在向前述支撐體(A)塗布之際,成為容易塗布的黏度,較佳為摻合有機溶劑。作為前述有機溶劑,例如可舉出甲苯、乙酸乙酯、甲基乙基酮、甲基異丁基酮、環己酮、異丙醇等。 Moreover, in the said primer composition (b), it is preferable to mix | blend an organic solvent in order to make it easy to apply | coat viscosity when apply | coating to the said support (A). Examples of the organic solvent include toluene, ethyl acetate, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and isopropanol.
前述有機溶劑之使用量,較佳為按照後述的向前述支撐體(A)塗布之際所用的塗布方法、前述底漆層(B)之所欲的膜厚,而適宜調整。 The usage-amount of the said organic solvent is suitably adjusted according to the coating method used when apply | coating to the said support body (A) mentioned later, and the desired film thickness of the said primer layer (B).
另外,於前述底漆組成物(b)中,視需要亦可適宜添加皮膜形成助劑、調平劑、增黏劑、撥水劑、消泡劑、抗氧化劑等眾所周知之添加劑而使用。 In addition, in the primer composition (b), well-known additives such as a film-forming aid, a leveling agent, a thickener, a water-repellent agent, an antifoaming agent, and an antioxidant may be appropriately added and used as necessary.
前述底漆層(B)係可藉由在前述支撐體(A)之表面之一部分或全部,塗布前述底漆組成物(b),去除前述底漆組成物(b)中所含有的有機溶劑而形成。 The primer layer (B) can be applied to part or all of the surface of the support (A) to coat the primer composition (b) to remove the organic solvent contained in the primer composition (b). And formed.
作為將前述底漆組成物(b)塗布於前述支撐體(A)之表面的方法,例如可舉出凹版方式、塗覆方式、網版方式、輥方式、旋轉方式、噴霧方式、毛細管方式等方法。 Examples of the method for applying the primer composition (b) to the surface of the support (A) include a gravure method, a coating method, a screen method, a roll method, a rotation method, a spray method, and a capillary method. method.
將前述底漆組成物(b)塗布於前述支撐體(A)之表面後,作為去除該塗布層中所含有的有機溶劑之方法,例如一般為使用乾燥機進行乾燥,使有機溶劑揮發之方法。乾燥溫度只要是設定在能使所用的有機溶劑揮發,且對於前述支撐體(A)不造成熱變形等不良影響之範圍的溫度即可。 After the primer composition (b) is coated on the surface of the support (A), as a method for removing the organic solvent contained in the coating layer, for example, a method of drying with a dryer to volatilize the organic solvent is generally used. . The drying temperature may be set to a temperature within a range that allows the organic solvent used to volatilize and does not cause adverse effects such as thermal deformation to the support (A).
使用前述底漆組成物(b)所形成的底漆層(B)之膜厚,雖然取決於使用本發明之積層體的用途而不同,但是較佳為更提高前述支撐體(A)與後述的金屬奈米粒子層(C)之密著性的範圍,前述底漆層(B)之膜厚較佳為10nm以上30μm以下,更佳為10nm以上1μm以下,尤佳為10nm以上500nm以下。 Although the film thickness of the primer layer (B) formed by using the primer composition (b) is different depending on the use of the laminated body of the present invention, it is preferable to further increase the support (A) and to be described later. The thickness of the metal nanoparticle layer (C) ranges from 10 nm to 30 μm, more preferably 10 nm to 1 μm, and even more preferably 10 nm to 500 nm.
從能更提高與前述金屬奈米粒子層(C)之密著性來看,前述底漆層(B)之表面係視需要可藉由電暈放電處理法等之電漿放電處理法、紫外線處理法等之乾式處理法、使用水或酸性或鹼性藥液、有機溶劑等之濕式處理法,進行表面處理。 In order to further improve the adhesion with the metal nanoparticle layer (C), the surface of the primer layer (B) may be treated by a plasma discharge treatment method such as a corona discharge treatment method or ultraviolet rays as needed. Surface treatment is performed by a dry treatment method such as a treatment method, or a wet treatment method using water, an acidic or alkaline chemical solution, an organic solvent, or the like.
前述金屬奈米粒子層(C)係形成在前述底漆層(B)上者,作為構成前述金屬奈米粒子層(C)之金屬,可舉出過渡金屬或其化合物,其中較佳為離子性的過渡金屬。作為此離子性的過渡金屬,可舉出銅、銀、金、鎳、鈀、鉑、鈷等。於此等之中,從容易形成前述金屬鍍敷層(D)來看,較佳為銀。 The metal nanoparticle layer (C) is formed on the primer layer (B). As a metal constituting the metal nanoparticle layer (C), a transition metal or a compound thereof is mentioned, and among them, an ion is preferred. Sexual transition metal. Examples of the ionic transition metal include copper, silver, gold, nickel, palladium, platinum, and cobalt. Among these, silver is preferable because the metal plating layer (D) can be easily formed.
又,作為構成前述金屬鍍敷層(D)之金屬,可舉出銅、金、銀、鎳、鉻、鈷、錫等。於此等之中, 從電阻低,得到耐腐蝕的印刷配線板中可用之積層體來看,較佳為銅。 Examples of the metal constituting the metal plating layer (D) include copper, gold, silver, nickel, chromium, cobalt, and tin. Among these, from the viewpoint of obtaining a multilayer body usable in a printed wiring board having low resistance and corrosion resistance, copper is preferred.
作為本發明之積層體之製造方法,可舉出:首先在支撐體(A)之上,形成底漆層(B),然後塗布含有奈米尺寸的金屬奈米粒子(c)之流動體,藉由將流動體中所含的有機溶劑等乾燥而去除,形成金屬奈米粒子層(C)後,藉由電解鍍敷或無電解鍍敷或其兩者,形成前述金屬鍍敷層(D)之方法。 As a method for manufacturing the laminated body of the present invention, first, a primer layer (B) is formed on the support (A), and then a fluid body containing nano-sized metal nano particles (c) is applied, The metal nanoparticle layer (C) is formed by drying and removing the organic solvent and the like contained in the fluid, and then the metal plating layer (D) is formed by electrolytic plating, electroless plating, or both. ).
前述金屬奈米粒子層(C)之形成中所用的前述金屬奈米粒子(c)之形狀,較佳為粒子狀或纖維狀。又,前述金屬奈米粒子(c)之大小係使用奈米尺寸者,具體而言,當前述金屬奈米粒子(c)之形狀為粒子狀時,從可形成微細的導電性圖案,能更減低電阻值來看,平均粒徑較佳為1nm以上100nm以下,更佳為1nm以上50nm以下。還有,前述「平均粒徑」係以分散良溶劑稀釋前述導電性物質,藉由動態光散射法所測定之體積平均值。於此測定中,可使用Microtrac公司製「Nanotrac UPA-150」。 The shape of the metal nanoparticle (c) used in the formation of the metal nanoparticle layer (C) is preferably particulate or fibrous. In addition, the size of the metal nano particles (c) is a nano size. Specifically, when the shape of the metal nano particles (c) is particulate, a fine conductive pattern can be formed, and the size can be further improved. From the viewpoint of reducing the resistance value, the average particle diameter is preferably 1 nm to 100 nm, and more preferably 1 nm to 50 nm. The "average particle diameter" refers to a volume average value obtained by diluting the conductive material with a good dispersing solvent and measuring it by a dynamic light scattering method. For this measurement, "Nanotrac UPA-150" manufactured by Microtrac can be used.
另一方面,當前述金屬奈米粒子(c)之形狀為纖維狀時亦同,從可形成微細的導電性圖案,能更減低電阻值來看,纖維之直徑較佳為5nm以上100nm以下,更佳為5nm以上50nm以下。又,纖維之長度較佳為0.1μm以上100μm以下,更佳為0.1μm以上30μm以下。 On the other hand, it is the same when the shape of the metal nanoparticle (c) is fibrous. From the viewpoint of forming a fine conductive pattern and further reducing the resistance value, the diameter of the fiber is preferably 5 nm to 100 nm. More preferably, it is 5 nm or more and 50 nm or less. The length of the fiber is preferably from 0.1 μm to 100 μm, and more preferably from 0.1 μm to 30 μm.
前述流動體中的前述金屬奈米粒子(c)之含有率較佳為1質量%以上90質量%以下,更佳為1質量%以上60質量%以下,尤更佳為1質量%以上10質量%以下。 The content of the metal nanoparticle (c) in the fluid is preferably 1% by mass or more and 90% by mass or less, more preferably 1% by mass or more and 60% by mass or less, and even more preferably 1% by mass or more and 10% by mass. %the following.
作為在前述流動體中摻合的成分,可舉出用於使前述金屬奈米粒子(c)分散於溶劑中之分散劑或溶劑,還有視需要之後述的界面活性劑、調平劑、黏度調整劑、成膜助劑、消泡劑、防腐劑等。 Examples of the component to be blended in the fluid include a dispersant or a solvent for dispersing the metal nanoparticle (c) in a solvent, and a surfactant, a leveling agent, and the like described later if necessary. Viscosity adjuster, film-forming aid, defoamer, preservative, etc.
為了使前述金屬奈米粒子(c)分散於溶劑中,較佳為使用低分子量或高分子量的分散劑。作為前述分散劑,例如可舉出十二烷硫醇、1-辛烷硫醇、三苯基膦、十二胺、聚乙二醇、聚乙烯吡咯啶酮、聚乙烯亞胺、聚乙烯吡咯啶酮;肉豆蔻酸、辛酸、硬脂酸等之脂肪酸;膽酸、甘草酸、樅酸等之具有羧基的多環式烴化合物等。於此等之中,從能提高前述金屬奈米粒子層(C)與前述金屬鍍敷層(D)之密著性來看,較佳為高分子分散劑,作為此高分子分散劑,可舉出聚乙烯亞胺、聚丙烯亞胺等之聚烯亞胺、在前述聚烯亞胺加成有聚氧化烯之化合物、胺基甲酸酯樹脂、丙烯酸樹脂、在前述胺基甲酸酯樹脂或前述丙烯酸樹脂中含有磷酸基之化合物等。 In order to disperse the metal nanoparticle (c) in a solvent, it is preferable to use a low molecular weight or high molecular weight dispersant. Examples of the dispersant include dodecanethiol, 1-octanethiol, triphenylphosphine, dodecylamine, polyethylene glycol, polyvinylpyrrolidone, polyethyleneimine, and polyvinylpyrrole. Pyridone; fatty acids such as myristic acid, caprylic acid, stearic acid; polycyclic hydrocarbon compounds having a carboxyl group, such as cholic acid, glycyrrhizic acid, and abietic acid. Among these, from the viewpoint of improving the adhesion between the metal nanoparticle layer (C) and the metal plating layer (D), a polymer dispersant is preferred. As the polymer dispersant, Examples include polyethylenimines such as polyethyleneimine and polypropyleneimine, compounds obtained by adding polyoxyalkylenes to the polyeneimines, urethane resins, acrylic resins, and the aforementioned urethanes. The resin or the acrylic resin contains a phosphate group-containing compound and the like.
使前述金屬奈米粒子(c)分散所需要的前述分散劑之使用量,相對於100質量份的前述金屬奈米粒子(c),較佳為0.01質量份以上50質量份以下,更佳為0.01質量份以上10質量份以下。 The amount of the dispersant required to disperse the metal nano particles (c) is preferably 0.01 to 50 parts by mass, and more preferably 100 parts by mass of the metal nano particles (c). 0.01 to 10 parts by mass.
作為前述流動體中使用的溶劑,可使用水性介質或有機溶劑。作為前述水性介質,例如可舉出蒸餾水、離子交換水、純水、超純水等。又,作為前述有機溶劑,可舉出醇化合物、醚化合物、酯化合物、酮化合物等。 As the solvent used in the fluid body, an aqueous medium or an organic solvent can be used. Examples of the aqueous medium include distilled water, ion-exchanged water, pure water, and ultrapure water. Examples of the organic solvent include alcohol compounds, ether compounds, ester compounds, and ketone compounds.
作為前述醇化合物,例如可舉出:甲醇、乙醇、正丙醇、異丙醇、正丁醇、異丁基醇、第二丁醇、第三丁醇、庚醇、己醇、辛醇、壬醇、癸醇、十一醇、十二醇、十三醇、十四醇、十五醇、硬脂醇、烯丙醇、環己醇、萜品醇、松油醇、二氫松油醇、乙二醇單甲基醚、乙二醇單乙基醚、乙二醇單丁基醚、二乙二醇單乙基醚、二乙二醇單甲基醚、二乙二醇單丁基醚、四乙二醇單丁基醚、丙二醇單甲基醚、二丙二醇單甲基醚、三丙二醇單甲基醚、丙二醇單丙基醚、二丙二醇單丙基醚、丙二醇單丁基醚、二丙二醇單丁基醚、三丙二醇單丁基醚等。 Examples of the alcohol compound include methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutyl alcohol, second butanol, third butanol, heptanol, hexanol, octanol, Nonanol, decanol, undecanol, dodecanol, tridecanol, tetradecanol, pentadecanol, stearyl alcohol, allyl alcohol, cyclohexanol, terpineol, terpineol, dihydropine oil Alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether Ether, tetraethylene glycol monobutyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, propylene glycol monopropyl ether, dipropylene glycol monopropyl ether, propylene glycol monobutyl ether , Dipropylene glycol monobutyl ether, tripropylene glycol monobutyl ether, and the like.
又,於前述流動體中,除了前述金屬奈米粒子(c)、溶劑之外,視需要還可使用乙二醇、二乙二醇、1,3-丁二醇、異戊二醇等。 In addition, in the fluid body, in addition to the metal nanoparticle (c) and the solvent, ethylene glycol, diethylene glycol, 1,3-butanediol, isopentyl glycol, and the like can be used as necessary.
作為前述界面活性劑,可使用一般的界面活性劑,例如可舉出二-2-乙基己基磺基琥珀酸鹽、十二基苯磺酸鹽、烷基二苯基醚二磺酸鹽、烷基萘磺酸鹽、六偏磷酸鹽等。 As the surfactant, a general surfactant can be used, and examples thereof include di-2-ethylhexylsulfosuccinate, dodecylbenzenesulfonate, alkyldiphenyl ether disulfonate, Alkyl naphthalene sulfonate, hexametaphosphate, etc.
作為前述調平劑,可使用一般的調平劑,例如可舉出聚矽氧系化合物、炔二醇系化合物、氟系化合物等。 As said leveling agent, a general leveling agent can be used, For example, a polysiloxane type compound, an acetylene glycol type compound, a fluorine type compound, etc. are mentioned.
作為前述黏度調整劑,可使用一般的增黏劑,例如可舉出藉由調整至鹼性而能增黏的丙烯酸聚合物或合成橡膠乳膠、藉由分子締合而能增黏的胺基甲酸酯樹脂、羥乙基纖維素、羧甲基纖維素、甲基纖維素、聚乙烯醇、氫化蓖麻油、醯胺蠟、氧化聚乙烯、金屬皂、二亞苄基山梨糖醇等。 As the viscosity modifier, a general thickener can be used, and examples thereof include an acrylic polymer or a synthetic rubber latex that can be thickened by adjusting to alkalinity, and an amino methyl ester that can be thickened by molecular association. Ester resin, hydroxyethyl cellulose, carboxymethyl cellulose, methyl cellulose, polyvinyl alcohol, hydrogenated castor oil, ammonium wax, oxidized polyethylene, metal soap, dibenzylidene sorbitol, and the like.
作為前述成膜助劑,可使用一般的成膜助劑,例如可舉出陰離子系界面活性劑(磺基琥珀酸二辛酯鈉鹽等)、疏水性非離子系界面活性劑(山梨糖醇酐單油酸酯等)、聚醚改質矽氧烷、聚矽氧油等。 As the film-forming aid, a general film-forming aid can be used, and examples thereof include an anionic surfactant (such as sodium dioctyl sulfosuccinate), and a hydrophobic nonionic surfactant (sorbitol). Anhydride monooleate, etc.), polyether modified siloxane, polysiloxane, etc.
作為前述消泡劑,可使用一般的消泡劑,例如可舉出聚矽氧系消泡劑、非離子系界面活性劑、聚醚、高級醇、聚合物系界面活性劑等。 As the antifoaming agent, a general antifoaming agent can be used, and examples thereof include a polysiloxane-based antifoaming agent, a nonionic surfactant, a polyether, a higher alcohol, and a polymer-based surfactant.
作為前述防腐劑,可使用一般的防腐劑,例如可舉出異噻唑啉系防腐劑、三系防腐劑、咪唑系防腐劑、吡啶系防腐劑、唑系防腐劑、碘系防腐劑、吡啶硫酮(pyrithione)系防腐劑等。 As the preservative, a general preservative can be used, and examples thereof include an isothiazoline preservative, Preservatives, imidazole preservatives, pyridine preservatives, azole preservatives, iodine preservatives, pyrithione preservatives, etc.
前述流動體之黏度(在25℃使用B型黏度計所測定之值)較佳為0.1mPa‧s以上500,000mPa‧s以下,更佳為0.2mPa‧s以上10,000mPa‧s以下。又,藉由後述的噴墨印刷法、凸版反轉印刷等之方法塗布(印刷)前述流動體時,其黏度較佳為5mPa‧s以上20mPa‧s以下。 The viscosity of the aforementioned fluid (value measured using a B-type viscometer at 25 ° C) is preferably 0.1 mPa · s or more and 500,000 mPa · s or less, and more preferably 0.2 mPa · s or more and 10,000 mPa · s or less. In addition, when the fluid body is coated (printed) by a method such as an inkjet printing method or letterpress reverse printing described later, the viscosity is preferably 5 mPa · s or more and 20 mPa · s or less.
作為於前述底漆層(B)之上塗布或印刷前述流動體之方法,例如可舉出噴墨印刷法、反轉印刷法、 網版印刷法、平版印刷法、旋轉塗布法、噴霧塗布法、棒塗法、模塗法、狹縫塗布法、輥塗法、浸塗法、墊片印刷、柔版印刷法等。 Examples of a method for applying or printing the fluid on the primer layer (B) include an inkjet printing method, a reverse printing method, a screen printing method, a lithographic method, a spin coating method, and a spray coating method. , Bar coating method, die coating method, slit coating method, roll coating method, dip coating method, pad printing, flexographic printing method, etc.
於此等的塗布方法之中,當形成以實現電子電路等的高密度化時所要求的0.01~100μm左右之細線狀所圖案化的前述金屬奈米粒子層(C)時,較佳為使用噴墨印刷法、反轉印刷法。 Among these coating methods, when forming the aforementioned metal nanoparticle layer (C), which is patterned in a thin line of about 0.01 to 100 μm required to achieve high density of electronic circuits and the like, it is preferably used Inkjet printing method, reverse printing method.
作為前述噴墨印刷法,可使用一般稱為噴墨印表機者。具體而言,可舉出Konica-Minolta EB100、XY100(Konica-Minolta IJ股份有限公司製)、Dimatix-Material印表機DMP-3000、Dimatix-Material印表機DMP-2831(富士軟片股份有限公司製)等。 As the aforementioned inkjet printing method, what is generally called an inkjet printer can be used. Specific examples include Konica-Minolta EB100, XY100 (manufactured by Konica-Minolta IJ Co., Ltd.), Dimatix-Material Printer DMP-3000, and Dimatix-Material Printer DMP-2831 (manufactured by Fujifilm Corporation) )Wait.
又,作為反轉印刷法,已知凸版反轉印刷法、凹版反轉印刷法,例如可舉出在各種橡皮布之表面上塗布前述流動體,使其與非印刷部突出之版接觸,藉由使對應於前述非印刷部的流動體在前述版之表面上選擇地轉印,而在前述橡皮布等之表面上形成前述圖案,接著使前述圖案轉印到前述支撐體(A)之上(表面)的方法。 In addition, as a reverse printing method, a letterpress reverse printing method and a gravure reverse printing method are known. For example, the surface of various blankets may be coated with the above-mentioned fluid and brought into contact with a plate protruding from a non-printed portion. By selectively transferring the fluid corresponding to the non-printed portion on the surface of the plate, the pattern is formed on the surface of the blanket or the like, and then the pattern is transferred onto the support (A). (Surface) method.
另外,關於向立體成形品的圖案印刷,已知墊片印刷法。此係將印墨載置於凹版之上,以刮刀刮取而使印墨均勻地填充於凹部,於載置有印墨的版上,按壓矽橡膠或胺基甲酸酯橡膠製的墊片,將圖案轉印到墊片上,使其轉印到立體成形品之方法。 In addition, a pad printing method is known for pattern printing on a three-dimensional molded product. In this system, the ink is placed on the intaglio plate, and the ink is evenly filled in the concave portion by scraping with a scraper. On the plate on which the ink is placed, a pad made of silicone rubber or urethane rubber is pressed. , A method of transferring a pattern to a gasket and transferring it to a three-dimensional molded product.
前述金屬奈米粒子層(C)之每單位面積的質量較佳為1mg/m2以上30,000mg/m2以下,更佳為1mg/m2以上5,000mg/m2以下。前述金屬奈米粒子層(C)之厚度係可藉由控制前述金屬鍍敷層(D)之形成時的鍍敷處理步驟中之處理時間、電流密度、鍍敷用添加劑之使用量等而調整。 Mass per unit area of the metal nanoparticle layer (C) is preferably of 1mg / m 2 or more 30,000mg / m 2 or less, more preferably 1mg / m 2 or more 5,000mg / m 2 or less. The thickness of the metal nanoparticle layer (C) can be adjusted by controlling the processing time, current density, and the amount of plating additives used in the plating processing step when the metal plating layer (D) is formed. .
構成本發明之積層體的金屬鍍敷層(D),例如當將前述積層體使用於印刷配線板等時,係以在長期間中不發生斷線等,形成能維持良好的通電性之可靠性高的配線圖案為目的而設置之層。 The metal plating layer (D) constituting the laminated body of the present invention, for example, when the aforementioned laminated body is used in a printed wiring board or the like, does not cause disconnection or the like for a long period of time, and forms a reliability capable of maintaining good electrical conductivity. A layer provided with a highly efficient wiring pattern.
前述金屬鍍敷層(D)係形成在前述金屬奈米粒子層(C)之上的層,作為其形成方法,較佳為藉由鍍敷處理而形成之方法。作為此鍍敷處理,可舉出能簡便地形成前述金屬鍍敷層(D)之電解鍍敷法、無電解鍍敷法等的濕式鍍敷法。又,亦可組合2個以上的此等之鍍敷法。例如,可於施予無電解鍍敷後,施予電解鍍敷,而形成前述金屬鍍敷層(D)。 The metal plating layer (D) is a layer formed on the metal nanoparticle layer (C). As a method for forming the metal plating layer (D), a method of forming the metal plating layer by a plating treatment is preferred. Examples of the plating treatment include a wet plating method such as an electrolytic plating method and an electroless plating method that can easily form the metal plating layer (D). Furthermore, two or more of these plating methods may be combined. For example, after electroless plating is applied, electrolytic plating may be applied to form the aforementioned metal plating layer (D).
上述之無電解鍍敷法例如係藉由對於構成前述金屬奈米粒子層(C)的金屬,使無電解鍍敷液接觸,使無電解鍍敷液中所含有的銅等金屬析出,而形成由金屬皮膜所構成的無電解鍍敷層(皮膜)之方法。 The above-mentioned electroless plating method is formed, for example, by contacting an electroless plating solution with the metal constituting the metal nanoparticle layer (C), and depositing metals such as copper contained in the electroless plating solution. A method of an electroless plating layer (film) composed of a metal film.
作為前述無電解鍍敷液,例如可舉出含有銅、銀、金、鎳、鉻、鈷、錫等之金屬、還原劑與水性介質、有機溶劑等之溶劑者。 Examples of the electroless plating solution include solvents containing metals such as copper, silver, gold, nickel, chromium, cobalt, tin, a reducing agent, an aqueous medium, and an organic solvent.
作為前述還原劑,例如可舉出二甲基胺基硼烷、次磷酸、次磷酸鈉、二甲基胺硼烷、聯胺、甲醛、硼氫化鈉、苯酚等。 Examples of the reducing agent include dimethylaminoborane, hypophosphorous acid, sodium hypophosphite, dimethylamineborane, hydrazine, formaldehyde, sodium borohydride, and phenol.
又,作為前述無電解鍍敷液,視需要可使用含有乙酸、甲酸等之單羧酸;丙二酸、琥珀酸、己二酸、馬來酸、富馬酸等之二羧酸化合物;蘋果酸、乳酸、乙醇酸、葡萄糖酸、檸檬酸等之羥基羧酸化合物;甘胺酸、丙胺酸、亞胺基二乙酸、精胺酸、天冬胺酸、麩胺酸等之胺基酸化合物;亞胺基二乙酸、氮基三乙酸、乙二胺二乙酸、乙二胺四乙酸、二伸乙三胺五乙酸等之胺基多羧酸化合物等的有機酸、或此等的有機酸之可溶性鹽(鈉鹽、鉀鹽、銨鹽等)、乙二胺、二伸乙三胺、三伸乙四胺等之胺化合物等的錯合劑者。 In addition, as the electroless plating solution, a monocarboxylic acid containing acetic acid, formic acid, or the like; a dicarboxylic acid compound such as malonic acid, succinic acid, adipic acid, maleic acid, or fumaric acid can be used as needed; apple Acid, lactic acid, glycolic acid, gluconic acid, citric acid and other hydroxycarboxylic acid compounds; glycine, alanine, imino diacetic acid, arginine, aspartic acid, glutamic acid and other amino acid compounds ; Organic acids such as amine polycarboxylic acid compounds such as iminodiacetic acid, nitrotriacetic acid, ethylenediaminediacetic acid, ethylenediaminetetraacetic acid, diethylene glycol triaminepentaacetic acid, or the like Soluble salts (sodium salt, potassium salt, ammonium salt, etc.), amine compounds such as ethylenediamine, ethylenediamine, triethylenetetraamine, etc.
前述無電解鍍敷液較佳為以20℃以上98℃以下使用。 The electroless plating solution is preferably used at 20 ° C to 98 ° C.
前述電解鍍敷法例如係藉由在構成前述金屬奈米粒子層(C)的金屬、或由前述無電解處理所形成的無電解鍍敷層(皮膜)之表面,以接觸電解鍍敷液之狀態進行通電,而使前述電解鍍敷液中所含有的銅等金屬析出在設於陰極的構成前述金屬奈米粒子層(C)之導電性物質、或由前述無電解處理所形成的無電解鍍敷層(皮膜)之表面,形成電解鍍敷層(金屬皮膜)之方法。 The electrolytic plating method is to contact the surface of the electrolytic plating solution by contacting the surface of the electroless plating layer (film) formed on the metal constituting the metallic nanoparticle layer (C) or the electroless treatment. It is energized in a state to cause metals such as copper contained in the electrolytic plating solution to be deposited on a conductive material constituting the metallic nanoparticle layer (C) provided on a cathode, or electroless formed by the electroless treatment. A method for forming an electrolytic plating layer (metal film) on the surface of a plating layer (film).
作為前述電解鍍敷液,例如可舉出含有銅、鎳、鉻、鈷、錫等的金屬之硫化物、硫酸與水性介質者等。具體而言,可舉出含有硫酸銅、硫酸與水性介質者。 Examples of the electrolytic plating solution include sulfide, sulfuric acid, and an aqueous medium containing metals such as copper, nickel, chromium, cobalt, and tin. Specific examples include those containing copper sulfate, sulfuric acid, and an aqueous medium.
前述電解鍍敷液較佳為以20℃以上98℃以下使用。 The electrolytic plating solution is preferably used at 20 ° C to 98 ° C.
作為前述金屬鍍敷層(D)之形成方法,就容易將前述金屬鍍敷層(D)之膜厚從薄膜到厚膜中控制在所欲的膜厚來看,較佳為於施予無電解鍍敷後,施予電解鍍敷之方法。 As the method for forming the metal plating layer (D), it is easy to control the film thickness of the metal plating layer (D) from a thin film to a thick film to a desired film thickness. After electrolytic plating, a method of electrolytic plating is applied.
前述金屬鍍敷層(D)之膜厚較佳為1μm以上50μm以下。前述金屬鍍敷層(D)之膜厚係可藉由控制前述金屬鍍敷層(D)之形成時的鍍敷處理步驟中之處理時間、電流密度、鍍敷用添加劑之使用量等而調整。 The film thickness of the metal plating layer (D) is preferably 1 μm to 50 μm. The film thickness of the metal plating layer (D) can be adjusted by controlling the processing time, current density, and the amount of plating additives used in the plating treatment step when the metal plating layer (D) is formed. .
以下,藉由實施例來詳細地說明本發明。 Hereinafter, the present invention will be described in detail through examples.
於安裝有溫度計、冷卻管、分餾管、攪拌器之燒瓶中,添加750質量份的苯酚、75質量份的三聚氰胺、346質量份的41.5質量%福馬林及1.5質量份的三乙胺,一邊注意放熱,一邊升溫到100℃。於回流下在100℃反應2小時後,於常壓下邊去除水邊費2小時升溫到180℃。接著,於減壓下去除未反應的苯酚,得到胺基三改質酚醛清漆樹脂。羥基當量為120g/當量。 Add 750 parts by mass of phenol, 75 parts by mass of melamine, 346 parts by mass of 41.5% by mass of formalin, and 1.5 parts by mass of triethylamine to a flask equipped with a thermometer, cooling tube, fractionation tube, and stirrer. While exothermic, the temperature was raised to 100 ° C. After reacting at 100 ° C for 2 hours under reflux, the temperature was raised to 180 ° C over 2 hours while removing water under normal pressure. Next, unreacted phenol was removed under reduced pressure to obtain amine tris Modified novolac resin. The hydroxyl equivalent was 120 g / equivalent.
混合35質量份的酚醛清漆樹脂(DIC股份有限公司製「PHENOLITE TD-2131」,羥基當量104g/當量)、64 質量份的環氧樹脂(DIC股份有限公司製「EPICLON 850-S」;雙酚A型環氧樹脂,環氧當量188g/當量)及1質量份的2,4-二胺基-6-乙烯基-s-三(四國化成股份有限公司製「VT」)後,以甲基乙基酮稀釋到不揮發分成為2質量%,均勻地混合,藉此得到底漆組成物(1)。 35 parts by mass of a novolac resin ("PHENOLITE TD-2131" manufactured by DIC Corporation, hydroxyl equivalent 104 g / equivalent) and 64 parts by mass of an epoxy resin ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A-type epoxy resin, epoxy equivalent 188g / equivalent) and 1 part by mass of 2,4-diamino-6-vinyl-s-tri ("Shikoku Chemical Co., Ltd.""VT"), diluted with methyl ethyl ketone until the non-volatile content became 2% by mass, and uniformly mixed to obtain a primer composition (1).
混合35質量份的酚醛清漆樹脂(DIC股份有限公司製「PHENOLITE TD-2131」,羥基當量104g/當量)、64質量份的環氧樹脂(DIC股份有限公司製「EPICLON 850-S」;雙酚A型環氧樹脂,環氧當量188g/當量)及1質量份的具有三環之矽烷偶合劑(四國化成股份有限公司製「VD-5」)後,以甲基乙基酮稀釋到不揮發分成為2質量%,均勻地混合,藉此得到底漆組成物(2)。 35 parts by mass of a novolac resin ("PHENOLITE TD-2131" manufactured by DIC Corporation, hydroxyl equivalent 104 g / equivalent) and 64 parts by mass of an epoxy resin ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy equivalent 188g / equivalent) and 1 part by mass with three After the cyclosilane coupling agent ("VD-5" manufactured by Shikoku Chemical Co., Ltd.), it was diluted with methyl ethyl ketone to a non-volatile content of 2% by mass, and uniformly mixed to obtain a primer composition (2 ).
混合65質量份的製造例1所得之胺基三酚醛清漆樹脂及35質量份的環氧樹脂(DIC股份有限公司製「EPICLON 850-S」;雙酚A型環氧樹脂,環氧當量188g/當量)後,以甲基乙基酮稀釋到不揮發分成為2質量%,均勻地混合,藉此得到底漆組成物(3)。 65 parts by mass of the amine group three obtained in Production Example 1 Novolac resin and 35 parts by mass of epoxy resin ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy equivalent 188 g / equivalent), diluted with methyl ethyl ketone until The volatile matter became 2% by mass, and uniformly mixed to obtain a primer composition (3).
混合48質量份的製造例1所得之胺基三酚醛清漆樹脂及52質量份的環氧樹脂(DIC股份有限公司製 「EPICLON 850-S」;雙酚A型環氧樹脂,環氧當量188g/當量)後,以甲基乙基酮稀釋到不揮發分成為2質量%,均勻地混合,藉此得到底漆組成物(4)。 48 parts by mass of the amine tri group obtained in Production Example 1 Novolac resin and 52 parts by mass of epoxy resin ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A epoxy resin, epoxy equivalent 188 g / equivalent), diluted with methyl ethyl ketone The volatile matter became 2% by mass and was uniformly mixed to obtain a primer composition (4).
混合39質量份的製造例1所得之胺基三酚醛清漆樹脂及61質量份的環氧樹脂(DIC股份有限公司製「EPICLON 850-S」;雙酚A型環氧樹脂,環氧當量188g/當量)後,以甲基乙基酮稀釋到不揮發分成為2質量%,均勻地混合,藉此得到底漆組成物(5)。 39 parts by mass of the amine group three obtained in Production Example 1 Novolac resin and 61 parts by mass of epoxy resin ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy equivalent 188 g / equivalent), diluted with methyl ethyl ketone until The volatile matter became 2% by mass, and uniformly mixed to obtain a primer composition (5).
混合31質量份的製造例1所得之胺基三酚醛清漆樹脂及69質量份的環氧樹脂(DIC股份有限公司製「EPICLON 850-S」;雙酚A型環氧樹脂,環氧當量188g/當量)後,以甲基乙基酮稀釋到不揮發分成為2質量%,均勻地混合,藉此得到底漆組成物(6)。 31 parts by mass of the amine tri group obtained in Production Example 1 Novolac resin and 69 parts by mass of epoxy resin ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy equivalent 188 g / equivalent), diluted with methyl ethyl ketone until The volatile matter became 2% by mass and was uniformly mixed to obtain a primer composition (6).
混合47質量份的製造例1所得之胺基三酚醛清漆樹脂及52質量份的環氧樹脂(DIC股份有限公司製「EPICLON 850-S」;雙酚A型環氧樹脂,環氧當量188g/當量)、1質量份的偏苯三甲酸酐後,以甲基乙基酮稀釋到不揮發分成為2質量%,均勻地混合,藉此得到底漆組成物(7)。 47 parts by mass of the amine tri group obtained in Production Example 1 After novolac resin and 52 parts by mass of epoxy resin ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy equivalent 188 g / equivalent), and 1 part by mass of trimellitic anhydride, It was diluted with methyl ethyl ketone until the nonvolatile matter became 2% by mass, and uniformly mixed to obtain a primer composition (7).
將封端異氰酸酯樹脂(樹脂成分25質量%水溶液)以甲基乙基酮稀釋到不揮發分成為2質量%,得到底漆組成物(R1)。 The blocked isocyanate resin (resin component 25% by mass aqueous solution) was diluted with methyl ethyl ketone until the nonvolatile matter became 2% by mass to obtain a primer composition (R1).
將100質量份的環氧樹脂(DIC股份有限公司製「EPICLON 850-S」;雙酚A型環氧樹脂)以甲基乙基酮稀釋到不揮發分成為2質量%,均勻地混合,藉此得到底漆組成物(R2)。 100 parts by mass of epoxy resin ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin) was diluted with methyl ethyl ketone to a non-volatile content of 2% by mass, and uniformly mixed. This gave a primer composition (R2).
依照日本發明專利第4573138號公報記載之實施例1,得到由具有灰綠色金屬光澤的鱗片狀塊所構成之陽離子性銀奈米粒子,其係銀奈米粒子與具有陽離子性基(胺基)的有機化合物之複合體。然後,使此銀奈米粒子之粉末分散於45質量份的乙二醇與55質量份的離子交換水之混合溶劑中,調製陽離子性銀奈米粒子為5質量%之流動體(1)。 According to Example 1 described in Japanese Invention Patent No. 4573138, cationic silver nano particles composed of scaly blocks having a gray-green metallic luster were obtained, which are silver nano particles and have a cationic group (amine group). Complex of organic compounds. Then, the powder of this silver nanoparticle was dispersed in a mixed solvent of 45 parts by mass of ethylene glycol and 55 parts by mass of ion-exchanged water to prepare a cationic silver nanoparticle as a fluid (5) by mass (1).
於聚醯亞胺薄膜(東麗-杜邦股份有限公司製「Kapton 150EN-C」;厚度38μm)之表面上,使用桌上型小型塗布機(RK Print-Coat Instrument公司製「K Printing Proofer」),以乾燥後的厚度成為100nm之方式塗布調製例1所得之底漆組成物(1)。接著,藉由使用熱風乾燥機,在150℃乾燥5分鐘,而在聚醯亞胺薄膜之表面上形成底漆層。 On the surface of the polyimide film ("Kapton 150EN-C" manufactured by Toray-DuPont Co., Ltd .; thickness: 38 µm), a desktop compact coater ("K Printing Proofer" manufactured by RK Print-Coat Instrument) was used. The primer composition (1) obtained in Preparation Example 1 was applied so that the thickness after drying became 100 nm. Then, a primer layer was formed on the surface of the polyimide film by using a hot-air dryer and drying at 150 ° C. for 5 minutes.
於上述所形成的底漆層之表面上,使用棒塗機,塗布上述所得之流動體(1)。接著,藉由在150℃乾燥5分鐘,形成相當於前述金屬奈米粒子層(C)的銀層(膜厚20nm)。 On the surface of the primer layer formed above, a bar coater was used to apply the fluid body (1) obtained above. Then, it dried at 150 degreeC for 5 minutes, and the silver layer (film thickness 20nm) corresponding to the said metal nanoparticle layer (C) was formed.
將上述所形成的銀層在無電解鍍銅液(奥野製藥工業股份有限公司製「OIC Copper」,pH12.5)中,於45℃浸漬12分鐘,進行無電解鍍銅,形成由無電解鍍敷所造成之鍍銅層(膜厚0.2μm)。 The silver layer formed above was immersed in an electroless copper plating solution ("OIC Copper", manufactured by Okano Pharmaceutical Industry Co., Ltd., pH 12.5) at 45 ° C for 12 minutes, and electroless copper plating was performed. The copper plating layer (film thickness 0.2 μm) caused by the application.
將上述所得之由無電解鍍銅所造成之鍍銅層設定在陰極側,將含磷銅設定在陽極側,藉由使用含有硫酸銅的電解鍍敷液,以電流密度2.5A/dm2進行30分鐘電解鍍敷,於由無電解鍍銅所造成之鍍銅層的表面上,形成由電解鍍銅所造成之鍍銅層(膜厚15μm)。作為前述電解鍍敷液,係使用70g/L的硫酸銅、200g/L的硫酸、50mg/L的氯離子、5ml/L的添加劑(奥野製藥工業(股)製「Top Lucina SF-M」)。還有,合併有由無電解鍍銅所造成之鍍銅層及在其上所形成的由電解鍍銅所造成之鍍銅層者,係相當於前述金屬鍍敷層(D)。 The copper plating layer formed by the electroless copper plating obtained above was set on the cathode side, and phosphorus-containing copper was set on the anode side. The electrolytic plating solution containing copper sulfate was used at a current density of 2.5 A / dm 2 . For 30 minutes electrolytic plating, a copper plating layer (film thickness 15 μm) caused by electrolytic copper plating was formed on the surface of the copper plating layer caused by electroless copper plating. As the aforementioned electrolytic plating solution, 70 g / L of copper sulfate, 200 g / L of sulfuric acid, 50 mg / L of chloride ion, and 5 ml / L of additives ("Top Lucina SF-M" manufactured by Okano Pharmaceutical Industry Co., Ltd.) were used. . A copper plating layer formed by electroless copper plating and a copper plating layer formed by electrolytic copper plating formed thereon are equivalent to the aforementioned metal plating layer (D).
藉由以上之方法,得到依順序積層有支撐體(A)、底漆層(B)、金屬奈米粒子層(C)及金屬鍍敷層(D)之積層體(1)。 By the above method, a laminated body (1) having a support (A), a primer layer (B), a metal nanoparticle layer (C), and a metal plating layer (D) laminated in this order is obtained.
除了代替實施例1所用的底漆組成物(1),使用底漆組成物(2)~(7)、(R-1)或(R-2)以外,藉由與實施例1同樣之方法,得到積層體(2)~(7)、(R-1)或(R-2)。 Except that the primer composition (1) used in Example 1 was used instead of the primer composition (2) to (7), (R-1), or (R-2), the same method as in Example 1 was used. To obtain a multilayer body (2) to (7), (R-1), or (R-2).
對於上述實施例1~7及比較例1~2所得之積層體(1)~(7)、(R1)及(R2),進行下述之測定及評價。 The laminated bodies (1) to (7), (R1), and (R2) obtained in the above-mentioned Examples 1 to 7 and Comparative Examples 1 to 2 were subjected to the following measurements and evaluations.
對於上述所得之各積層體,使用島津製作所股份有限公司製「Autograph AGS-X 500N」,測定剝離強度。還有,測定中所用的引線寬度為5mm,其剝離角度設為90°。又,剝離強度係有金屬鍍敷層的厚度愈厚,顯示愈高的值之傾向,但是本發明中的剝離強度之測定係以金屬鍍敷層的厚度15μm之測定值作為基準而實施。 About each laminated body obtained above, the peeling strength was measured using "Autograph AGS-X 500N" made by Shimadzu Corporation. The lead width used in the measurement was 5 mm, and the peeling angle was 90 °. In addition, the peeling strength tends to show a higher value as the thickness of the metal plating layer becomes thicker. However, the measurement of the peeling strength in the present invention is performed based on a measurement value of the thickness of the metal plating layer of 15 μm.
從上述所測定之加熱前的剝離強度之值,依照下述基準來評價密著性。 From the value of the peel strength before heating measured as described above, adhesion was evaluated in accordance with the following criteria.
A:剝離強度之值為650N/m以上。 A: The value of the peeling strength is 650 N / m or more.
B:剝離強度之值為450N/m以上且小於650N/m。 B: The value of the peel strength is 450 N / m or more and less than 650 N / m.
C:剝離強度之值為250N/m以上且小於450N/m。 C: The value of the peel strength is 250 N / m or more and less than 450 N / m.
D:剝離強度之值小於250N/m。 D: The value of the peel strength is less than 250 N / m.
對於上述所得之各積層體,分別在設定於150℃的乾燥機內保管168小時,進行加熱。加熱後,以與上述同樣之方法測定剝離強度。 The laminates obtained as described above were each stored in a dryer set at 150 ° C. for 168 hours and heated. After heating, the peel strength was measured in the same manner as described above.
使用上述所測定之加熱前後的剝離強度值,算出加熱前後的保持率,依照下述基準來評價耐熱性。 Using the measured peel strength values before and after heating, the retention rate before and after heating was calculated, and the heat resistance was evaluated according to the following criteria.
A:保持率為85%以上。 A: The retention rate is 85% or more.
B:保持率為70%以上且小於85%。 B: The retention rate is 70% or more and less than 85%.
C:保持率為55%以上且小於70%。 C: The retention rate is 55% or more and less than 70%.
D:保持率小於55%。 D: The retention rate is less than 55%.
表1中顯示實施例1~4、比較例1及2所用的底漆組成物之組成、加熱前後的剝離強度之測定結果、密著性及耐熱性之評價結果。還有,底漆組成物之組成僅表示不揮發分。 Table 1 shows the composition of the primer compositions used in Examples 1 to 4 and Comparative Examples 1 and 2, measurement results of the peel strength before and after heating, and evaluation results of adhesion and heat resistance. The composition of the primer composition only indicates non-volatile content.
可確認本發明之積層體的實施例1~7所得之積層體(1)~(7),係初期(加熱前)的密著性充分高,還有加熱後的剝離強度之降低亦輕微,耐熱性亦優異。 It can be confirmed that the laminated bodies (1) to (7) obtained in Examples 1 to 7 of the laminated body of the present invention are sufficiently high in initial stage (before heating), and the decrease in peel strength after heating is also slight. It is also excellent in heat resistance.
另一方面,可確認比較例1及2所得之積層體(R1)及(R2),雖然初期(加熱前)的密著性為充分,但是加熱後的剝離強度之降低大,耐熱性有問題。 On the other hand, it was confirmed that the laminates (R1) and (R2) obtained in Comparative Examples 1 and 2 had sufficient adhesion at the initial stage (before heating), but had a large decrease in peel strength after heating and had problems with heat resistance .
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