TW201903686A - Wafer manufacturing management method and wafer manufacturing management system - Google Patents

Wafer manufacturing management method and wafer manufacturing management system Download PDF

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TW201903686A
TW201903686A TW106119609A TW106119609A TW201903686A TW 201903686 A TW201903686 A TW 201903686A TW 106119609 A TW106119609 A TW 106119609A TW 106119609 A TW106119609 A TW 106119609A TW 201903686 A TW201903686 A TW 201903686A
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data
yield
process data
wafer
abnormal
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TWI657402B (en
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李佳霖
王啟為
李孟樺
施英汝
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環球晶圓股份有限公司
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/30Computing systems specially adapted for manufacturing

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Abstract

A wafer manufacturing management method is provided. The wafer manufacturing management method includes following steps: according to a plurality of yield indicators, determining a plurality of processing data generated by the wafer products passing a plurality of processing equipment, to determine whether select at least one of the processing data to an abnormal processing data; integrating the process data to accumulate a plurality of cost data of the wafer product sequentially passing the processing equipment; according to the abnormal production data and the cost data, determining a cost of loss data corresponding to the cost data; and integrating the abnormal processing data and the cost of loss data to generate a warning data. In addition, a wafer manufacturing management system is also provided.

Description

晶圓製造管理方法以及晶圓製造管理系統Wafer manufacturing management method and wafer manufacturing management system

本發明是有關於一種管理方法以及管理系統,且特別是有關於一種晶圓製造管理方法以及晶圓製造管理系統。The invention relates to a management method and a management system, and in particular to a wafer manufacturing management method and a wafer manufacturing management system.

隨著科技的發展,由於各式電子產品的發展越來越多元,因此各式晶圓產品的需求也同樣增加。在晶圓製造的過程中,晶圓產品的製造需要經由多個製程設備依序進行處理。然而,每一個不同製程設備在對晶圓進行製程處理時,可能會造成部分晶圓損壞的情況,進而導致製程成本的浪費。並且,在目前的晶圓製造技術中,製程設備可能由於全天候且自動化的運作,而無法即時進行製程良率的監控以及自動判斷製程設備是否發生故障。With the development of technology, as the development of various electronic products becomes more and more diverse, the demand for various types of wafer products also increases. In the process of wafer manufacturing, the manufacturing of wafer products needs to be processed sequentially through multiple process equipment. However, when each different process equipment processes the wafer, it may cause part of the wafer to be damaged, resulting in a waste of process cost. Moreover, in the current wafer manufacturing technology, the process equipment may not be able to monitor the process yield in real time and automatically determine whether the process equipment is malfunctioning due to the all-weather and automated operation.

對此,在晶圓製造領域中,傳統的製程設備管理僅能獲得製程資訊,而無法有效即時監控產品良率和損失成本。因此,如何可以有效率地監控晶圓產品在製造過程中通過各製程設備的製程結果以及良率,並且可自動判斷各個製程設備的製程良率情形,以自動提供損失成本給管理者,是目前重要的課題。In this regard, in the field of wafer manufacturing, traditional process equipment management can only obtain process information, but cannot effectively monitor product yield and loss costs in real time. Therefore, how to efficiently monitor the process results and yields of wafer products passing through various process equipment during the manufacturing process, and can automatically determine the process yield rate of each process equipment to automatically provide loss costs to managers is currently Important subject.

本發明提供一種晶圓製造管理方法以及晶圓製造管理系統,可有效監控晶圓產品在製造過程中通過各製程設備的製程結果以及良率,並且可自動判斷及分析各個製程設備的製程良率情形,以提供損失成本。The invention provides a wafer manufacturing management method and a wafer manufacturing management system, which can effectively monitor the process results and yield of wafer products passing through various process equipment during the manufacturing process, and can automatically judge and analyze the process yield of each process equipment Situation to provide loss costs.

本發明的晶圓製造管理方法包括以下步驟:依據多個良率指標分別判斷晶圓產品通過多個製程設備後所產生的多個製程資料,以決定是否選擇這些製程資料的至少其中之一為異常製程資料;整合這些製程資料,以累計晶圓產品依序通過這些製程設備後的多個成本資料;依據異常製程資料以及這些成本資料決定對應於異常製程資料的損失成本資料;以及整合異常製程資料以及損失成本資料,以產生警示資料。The wafer manufacturing management method of the present invention includes the following steps: judging multiple process data generated after a wafer product passes through multiple process equipment according to multiple yield indicators, to determine whether to select at least one of these process data as Abnormal process data; integrate these process data to accumulate multiple cost data after the wafer products sequentially pass through these process equipment; determine the loss cost data corresponding to the abnormal process data based on the abnormal process data and these cost data; and integrate the abnormal process Data and loss cost data to generate warning data.

在本發明的一實施例中,上述的晶圓製造管理方法更包括:依據良率平均值以及良率標準差來決定這些良率指標的至少其中之一的主要良率指標;以及若這些製程資料的至少其中之一的良率低於主要良率指標,則選擇這些製程資料的至少其中之一為異常製程資料。In an embodiment of the invention, the above-mentioned wafer manufacturing management method further includes: determining the main yield index of at least one of these yield indexes based on the yield average value and the yield standard deviation; and if these processes If the yield of at least one of the data is lower than the main yield index, then at least one of these process data is selected as the abnormal process data.

在本發明的一實施例中,上述的晶圓製造管理方法更包括:依據良率平均值以及良率標準差來建立具有多個判斷界限的管制範圍;以及藉由這些判斷界限建立判斷條件,若這些製程資料的至少其中之一的良率符合判斷條件,則選擇這些製程資料的至少其中之一為異常製程資料。In an embodiment of the present invention, the above-mentioned wafer manufacturing management method further includes: establishing a control range with multiple judgment limits based on the yield average and yield standard deviation; and establishing judgment conditions by using these judgment limits, If the yield of at least one of the process data meets the judgment condition, then at least one of the process data is selected as abnormal process data.

在本發明的一實施例中,上述的管制範圍為六個良率標準差。In an embodiment of the present invention, the aforementioned regulatory range is six yield standard deviations.

在本發明的一實施例中,上述的晶圓製造管理方法更包括:依據晶圓產品的產品類型決定這些良率指標的至少其中之一;以及若這些製程資料的至少其中之一的良率低於此良率指標的至少其中之一,則選擇這些製程資料的至少其中之一為異常製程資料。In an embodiment of the invention, the above-mentioned wafer manufacturing management method further includes: determining at least one of these yield indicators according to the product type of the wafer product; and if the yield of at least one of the process data If it is lower than at least one of the yield indicators, then at least one of these process data is selected as abnormal process data.

在本發明的一實施例中,上述的晶圓製造管理方法更包括:藉由製造執行系統取得這些製程資料,並且這些製程資料各別包括產品規格資料以及不良模式資料。In an embodiment of the present invention, the above-mentioned wafer manufacturing management method further includes: obtaining these process data through a manufacturing execution system, and each of these process data includes product specification data and defective mode data.

在本發明的一實施例中,上述的晶圓製造管理方法更包括:依據異常製程資料所對應的不良模式資料,取得對應於異常製程資料的失效模式以及影響分析結果。In an embodiment of the present invention, the above wafer manufacturing management method further includes: obtaining failure modes corresponding to the abnormal process data and affecting the analysis result according to the defective mode data corresponding to the abnormal process data.

在本發明的一實施例中,上述的晶圓製造管理方法更包括:依據異常製程資料所對應的不良模式資料,判斷晶圓產品當中的至少一不良品是否可重新使用。In an embodiment of the invention, the above wafer manufacturing management method further includes: determining whether at least one defective product in the wafer product can be reused according to the defective mode data corresponding to the abnormal process data.

在本發明的一實施例中,上述的晶圓製造管理方法更包括:依據預設時間週期,週期性地產生警示資料,並且輸出警示資料,其中警示資料更包括異常製程資料的產品規格資料、良率、良率指標以及不良模式資料。In an embodiment of the present invention, the above wafer manufacturing management method further includes: periodically generating warning data according to a preset time period, and outputting the warning data, wherein the warning data further includes product specification data of abnormal process data, Yield, yield index, and bad model data.

本發明的晶圓製造管理系統包括製造執行系統(Manufacturing Execution System, MES)以及良率管理系統(Yield Management Solution, YMS)。製造執行系統用以提供晶圓產品通過多個製程設備後所產生的多個製程資料。良率管理系統耦接製造執行系統。良率管理系統用以接收對應於這些製程設備的多個良率指標、多個成本資料以及多個製程資料。良率管理系統依據這些良率指標分別判斷晶圓產品通過這些製程設備後所產生的這些製程資料,以決定是否選擇這些製程資料的至少其中之一為異常製程資料。良率管理系統整合這些製程資料,以累計晶圓產品依序通過這些製程設備後的多個成本資料。良率管理系統依據異常製程資料所對應的這些成本資料的其中之一決定對應於異常製程資料的損失成本資料。良率管理系統整合異常製程資料以及損失成本資料,以產生警示資料。The wafer manufacturing management system of the present invention includes a manufacturing execution system (Manufacturing Execution System, MES) and a yield management system (Yield Management Solution, YMS). The manufacturing execution system is used to provide multiple process data generated after the wafer product passes through multiple process equipment. The yield management system is coupled to the manufacturing execution system. The yield management system is used to receive multiple yield indicators, multiple cost data, and multiple process data corresponding to these process equipment. The yield management system judges the process data generated after the wafer product passes through the process equipment according to the yield indicators, and decides whether to select at least one of the process data as abnormal process data. The yield management system integrates these process data to accumulate multiple cost data after the wafer products pass through these process devices in sequence. The yield management system determines the loss cost data corresponding to the abnormal process data according to one of the cost data corresponding to the abnormal process data. The yield management system integrates abnormal process data and loss cost data to generate warning data.

基於上述,本發明的晶圓製造管理方法以及晶圓製造管理系統,可藉由製造執行系統收集晶圓產品經過多個製程設備後產生的製程資料,並且藉由良率管理系統判斷良率異常的製程資料且整合成本資料,以產生損失成本資料。因此,本發明的晶圓製造管理方法以及晶圓製造管理系統可即時提供損失成本資料,以使管理者可有效率地進行製程監控以及管理。Based on the above, the wafer manufacturing management method and wafer manufacturing management system of the present invention can collect process data generated by a wafer product after passing through multiple process equipments through the manufacturing execution system, and determine the abnormal yield rate by the yield management system Process data and integrate cost data to generate loss cost data. Therefore, the wafer manufacturing management method and wafer manufacturing management system of the present invention can provide loss cost data in real time, so that managers can efficiently perform process monitoring and management.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more obvious and understandable, the embodiments are specifically described below and described in detail in conjunction with the accompanying drawings.

為了使本發明之內容可以被更容易明瞭,以下特舉實施例做為本發明確實能夠據以實施的範例。另外,凡可能之處,在圖式及實施方式中使用相同標號的元件/構件/步驟,係代表相同或類似部件。In order to make the content of the present invention easier to understand, the following specific embodiments are taken as examples on which the present invention can indeed be implemented. In addition, wherever possible, elements / components / steps using the same reference numbers in the drawings and embodiments represent the same or similar components.

圖1繪示本發明一實施例的晶圓製造管理系統的方塊示意圖。晶圓製造管理系統100包括製造執行系統110(Manufacturing Execution System, MES)、成本資料111、良率指標112、良率管理系統120(Yield Management Solution, YMS)以及警示資料130。在本實施例中,製造執行系統110可管理並整合製程資料113以及不良模式資料114,其中製程資料113包括製程設備資料1131、產品規格資料1132。並且,晶圓製造管理系統100將製造執行系統110(Manufacturing Execution System, MES)、成本資料111、良率指標112的相關資料參數輸入至良率管理系統120。在本實施例中,當晶圓產品的良率出現異常,或是某一製程設備出現異常時,良率管理系統120可依據上述相關資料參數來產生警示資料130,並且可即時或依據預設的時間週期來提供給管理者。FIG. 1 is a block diagram of a wafer manufacturing management system according to an embodiment of the invention. The wafer manufacturing management system 100 includes a manufacturing execution system 110 (Manufacturing Execution System, MES), cost data 111, yield index 112, yield management system 120 (Yield Management Solution, YMS), and warning data 130. In this embodiment, the manufacturing execution system 110 can manage and integrate the process data 113 and the defect mode data 114, where the process data 113 includes process equipment data 1131 and product specification data 1132. In addition, the wafer manufacturing management system 100 inputs the relevant data parameters of the manufacturing execution system 110 (Manufacturing Execution System, MES), cost data 111, and yield index 112 to the yield management system 120. In this embodiment, when the yield of the wafer product is abnormal, or a certain process equipment is abnormal, the yield management system 120 can generate the warning data 130 according to the above-mentioned relevant data parameters, and can be real-time or according to the preset Time period to provide managers.

在一實施例中,晶圓製造管理系統100可透過無線或有線的傳輸方式,將警示資料130輸出至顯示裝置或外部的電子裝置,但本發明並不加以限制。舉例來說,晶圓製造管理系統100可將警示資料130以簡訊、電子郵件或電子報表等諸如此類的形式,將警示資料130提供給管理者的電子郵件信箱或手持式電子裝置等。也就是說,本實施例的晶圓製造管理系統100可即時或是於預設的時間週期來提供警示資料130給管理者,以使管理者可有效率地進行製程監控以及管理。In one embodiment, the wafer manufacturing management system 100 can output the warning data 130 to a display device or an external electronic device through wireless or wired transmission, but the invention is not limited thereto. For example, the wafer manufacturing management system 100 may provide the warning data 130 to the administrator's email mailbox or handheld electronic device in the form of text messages, emails, electronic reports, or the like. In other words, the wafer manufacturing management system 100 of this embodiment can provide the warning data 130 to the manager in real time or at a preset time period, so that the manager can efficiently monitor and manage the process.

在本實施例中,晶圓製造管理系統100可配置電子裝置中,並且以軟體程式形式或硬體電路形式實現之。在本實施例中,電子裝置可例如是具有運算能力的檔案伺服器、資料庫伺服器、應用程式伺服器、工作站或個人電腦等計算機裝置。並且,電子裝置可包括儲存裝置及處理器。儲存裝置可以是任何型態的固定式或可移動式隨機存取記憶體(Random Access Memory,RAM)、唯讀記憶體(Read-Only Memory,ROM)、快閃記憶體(Flash memory)或類似元件或上述元件的組合。In this embodiment, the wafer manufacturing management system 100 can be configured in an electronic device and implemented in the form of software programs or hardware circuits. In this embodiment, the electronic device may be, for example, a computing device such as a file server, database server, application server, workstation or personal computer. And, the electronic device may include a storage device and a processor. The storage device may be any type of fixed or removable random access memory (RAM), read-only memory (ROM), flash memory (Flash memory), or the like Element or a combination of the above elements.

在本實施例中,儲存裝置可用儲存成本資料111、良率指標112、製程設備資料1131、產品規格資料1132以及不良模式資料114。並且,儲存裝置還可用於儲存良率管理系統120當中的判斷異常資料模組121、損失成本計算模組122以及失效模式及影響分析模組123(Failure Mode and Effects Analysis, FMEA)。In this embodiment, the storage device may use storage cost data 111, yield index 112, process equipment data 1131, product specification data 1132, and bad mode data 114. In addition, the storage device can also be used to store the abnormal judgment data module 121, the loss cost calculation module 122, and the failure mode and effects analysis module 123 (FMEA) in the yield management system 120.

在本實施例中,處理器例如是中央處理單元(Central Processing Unit,CPU),或是其他可程式化之一般用途或特殊用途的微處理器(Microprocessor)、數位訊號處理器(Digital Signal Processor,DSP)、可程式化控制器、特殊應用積體電路(Application Specific Integrated Circuits,ASIC)、可程式化邏輯裝置(Programmable Logic Device,PLD)或其他類似裝置或這些裝置的組合。配置有晶圓製造管理系統100的電子裝置可耦接多個製程設備,以接收與建立本發明各實施例所述之各種資料。並且,晶圓製造管理系統100可藉由處理器執行上述各模組功能,以實現本發明各實施例所述之各種資料運算、整合、判斷以及分析。In this embodiment, the processor is, for example, a central processing unit (Central Processing Unit, CPU), or other programmable general-purpose or special-purpose microprocessor (Microprocessor), digital signal processor (Digital Signal Processor, DSP), programmable controller, application specific integrated circuits (ASIC), programmable logic device (Programmable Logic Device, PLD) or other similar devices or a combination of these devices. The electronic device equipped with the wafer manufacturing management system 100 can be coupled to a plurality of process equipment to receive and establish various data described in various embodiments of the present invention. In addition, the wafer manufacturing management system 100 can execute the above-mentioned various module functions by the processor to implement various data operations, integration, judgment, and analysis described in the embodiments of the present invention.

在本實施例中,製造執行系統110可連線多個製程設備,並且用以記錄晶圓產品分別通過這些製程設備的製程處理後的多個製程資料113。這些製程資料113可分別包括製程設備資料1131以及產品規格資料1132。在本實施例中,製程設備資料1131可代表各製程設備的機台資料,並且產品規格資料1132可例如是晶圓產品的名稱以及晶圓特性等。舉例來說,請參考以下表1。 表1In this embodiment, the manufacturing execution system 110 may be connected to a plurality of process equipment, and used to record a plurality of process data 113 after the wafer products are processed through the process of these process equipment. These process data 113 may include process equipment data 1131 and product specification data 1132, respectively. In this embodiment, the process equipment data 1131 can represent the machine data of each process equipment, and the product specification data 1132 can be, for example, the name of the wafer product and wafer characteristics. For example, please refer to Table 1 below. Table 1

在本實施例中,製程資料113可例如是呈現如表1所示之資料內容。在上述表1中,製程設備資料1131可例如包括站別名稱、站點結束時間以及傳單編號等,諸如此類的設備資料。產品規格資料1132可例如包括產品編號、產品名稱、晶向、電阻範圍以及切片厚度等,諸如此類的產品規格。也就是說,上述表1可用以表示當拋光片通過平坦度分類的製程設備後的相關設備資料以及產品規格。然而,上述表1的資料內容可依據不同產品類型或製程需求來決定之,或是經由管理者設定之,本發明並不限於此。In the present embodiment, the process data 113 may, for example, present the content shown in Table 1. In the above Table 1, the process equipment information 1131 may include, for example, station name, end time of the station, leaflet number, etc., and the like. The product specification data 1132 may include, for example, a product number, a product name, a crystal orientation, a resistance range, a slice thickness, etc., and the like. That is to say, the above Table 1 can be used to represent the relevant equipment information and product specifications after the polishing sheet passes through the process equipment classified by flatness. However, the data content of the above Table 1 can be determined according to different product types or process requirements, or set by the administrator, and the present invention is not limited to this.

在本實施例中,晶圓製造管理系統100可自外部接收或經由管理者輸入多個成本資料111以及多個良率指標112。在本實施例中,這些成本資料111用以表示晶圓產品通過這些製程設備所需的花費,例如:設備成本、物料成本或人員工時等,本發明並不加以限制。並且,這些良率指標112用於判斷晶圓產品通過這些製程設備後的良率是否異常。在本實施例中,不良模式資料114可表示晶圓產品通過這些製程設備後可能發生的晶圓損壞原因、報廢數量以及是否可重新使用的資料。舉例來說,請參考以下表2。 表2In this embodiment, the wafer manufacturing management system 100 may receive a plurality of cost data 111 and a plurality of yield indicators 112 from the outside or input through a manager. In this embodiment, the cost data 111 is used to represent the cost required for the wafer product to pass through the process equipment, such as equipment cost, material cost, staff time, etc. The present invention is not limited. In addition, these yield indicators 112 are used to determine whether the yield of wafer products after passing through these process equipment is abnormal. In this embodiment, the bad mode data 114 may represent the data of the cause of the wafer damage that may occur after the wafer products pass through these process equipment, the number of scraps, and whether they can be reused. For example, please refer to Table 2 below. Table 2

在本實施例中,不良模式資料114可整合製程設備資料1131以例如是呈現如表2所示之資料內容。在上述表2中,製程設備資料1131可例如包括站別名稱、站點編號以及傳單編號等,諸如此類的設備資料。不良模式資料114可例如包括不良原因、報廢數量以及是否可重新使用的資料。然而,上述表2的資料內容可依據不同產品類型或製程需求來決定之,或是經由管理者設定之,本發明並不限於此。In this embodiment, the bad mode data 114 can be integrated with the process equipment data 1131 to present the data content shown in Table 2, for example. In the above Table 2, the process equipment information 1131 may include, for example, station name, station number, leaflet number, etc., and the like. The bad pattern data 114 may include, for example, data on the cause of the defect, the number of scraps, and whether it can be reused. However, the data content of the above Table 2 can be determined according to different product types or process requirements, or set by the administrator. The present invention is not limited to this.

在本實施例中,良率管理系統120可包括判斷異常資料模組121、損失成本計算模組122以及失效模式及影響分析模組123。判斷異常資料模組121可用以依據良率指標112來分別判斷晶圓產品通過這些製程設備後的良率是否低於對應的良率指標112,以取出良率異常的製程資料作為異常製程資料。In this embodiment, the yield management system 120 may include an abnormal data judgment module 121, a loss cost calculation module 122, and a failure mode and impact analysis module 123. The abnormality determination module 121 can be used to determine whether the yield of the wafer product after passing through these process equipment is lower than the corresponding yield index 112 according to the yield index 112, and take out the abnormal process data as abnormal process data.

在本實施例中,良率指標112可包括主要良率指標以及次要良率指標。在本實施例中,良率指標112的主要良率指標可例如是依據製程設備的製程歷史來計算良率平均值以及良率標準差來決定之。舉例來說,請參考以下公式(1)以及公式(2)。…………(1)…………(2)In this embodiment, the yield index 112 may include a primary yield index and a secondary yield index. In this embodiment, the main yield index of the yield index 112 may be determined by calculating the average yield and the standard deviation of the yield based on the process history of the process equipment, for example. For example, please refer to the following formula (1) and formula (2). …………(1) …………(2)

在上述公式(1)中,μ為良率平均值,X1 、X2 、XN 為製程設備的某一時間區間(例如3個月、半年等)的歷史良率,其中N為大於零的正整數。在上述公式(2)中,σ為良率標準差,Xi 為製程設備的歷史良率。因此,在本實施例中,晶圓製造管理系統100可設定μ-3σ(良率平均值-3個良率標準差)為主要良率指標。若某一製程資料的良率低於對應的此主要良率指標(μ-3σ),則選擇此製程資料為一異常製程資料。須注意的是,不同製程設備的良率指標112皆不同。各製程設備的良率指標112可依據各別的製程歷史良率來決定之。In the above formula (1), μ is the average yield, X 1 , X 2 , and X N are the historical yields of a certain time interval (such as 3 months, half a year, etc.) of the process equipment, where N is greater than zero Positive integer. In the above formula (2), σ is the standard deviation yield, X i is the historical yield process equipment. Therefore, in this embodiment, the wafer manufacturing management system 100 may set μ-3σ (yield average value-3 yield standard deviations) as the main yield index. If the yield of a certain process data is lower than the corresponding main yield index (μ-3σ), then this process data is selected as an abnormal process data. It should be noted that the yield index 112 of different process equipment is different. The yield index 112 of each process equipment can be determined according to the respective process historical yield.

然而,在一實施例中,良率指標112的次要良率指標可依據上述之良率平均值μ以及良率標準差σ來建立具有多個判斷界限的管制範圍,並且藉由這些判斷界限建立判斷條件。舉例來說,請參考以下表3。 表3However, in an embodiment, the secondary yield index of the yield index 112 may be based on the above-described yield average μ and yield standard deviation σ to establish a control range with multiple judgment limits, and by these judgment limits Establish judgment conditions. For example, please refer to Table 3 below. table 3

在上述表3中,晶圓製造管理系統100可建立具有多個判斷界限的管制範圍,其中這些判斷界限可例如為第一區至第六區。也就是說,表3的管制範圍為六個良率標準差。晶圓製造管理系統100可設定判斷條件例如是某一製程設備的連續三個相同生產批次之製程資料中的其中至少兩個良率低於第六區或管制下限,或是連續五個製程資料中的其中至少四個良率低於第五區或第六區或管制下限,則良率管理系統120判斷這些連續的製程資料為異常製程資料。又或者,晶圓製造管理系統100可設定判斷條件例如某一製程設備的連續六個製程資料中的良率持續下降,則良率管理系統120判斷這些連續的製程資料為異常製程資料。In the above Table 3, the wafer manufacturing management system 100 may establish a control range with multiple determination limits, where the determination limits may be, for example, the first zone to the sixth zone. In other words, the control range in Table 3 is six standard deviations of yield. The wafer manufacturing management system 100 can set a judgment condition, for example, at least two of the process data of three consecutive production batches of a certain process equipment are lower than the sixth zone or the lower limit of the control, or five consecutive processes At least four of the yields in the data are lower than the fifth zone or the sixth zone or the lower control limit, then the yield management system 120 determines that these continuous process data are abnormal process data. Alternatively, the wafer manufacturing management system 100 may set a judgment condition such that the yield rate in the continuous six process data of a certain process equipment continues to decrease, and the yield management system 120 determines that the continuous process data is abnormal process data.

然而,在一實施例中,良率指標112亦可依據晶圓產品的產品類型決定之。例如,當前的晶圓產品為一副產品,則可此當前的晶圓產品於此製程設備的良率指標可參照屬於主產品的另一晶圓產品於此製程設備的良率指標,而不限於上述的良率指標的定義方式。However, in an embodiment, the yield index 112 can also be determined according to the product type of the wafer product. For example, if the current wafer product is a by-product, the yield index of the current wafer product in the process equipment can refer to the yield index of another wafer product belonging to the main product in the process equipment, and is not limited to The definition method of the above yield index.

在本實施例中,損失成本計算模組122可用以計算異常製程資料所對應的損失成本資料。在本實施例中,損失成本計算模組122可整合這些製程資料,並且累計晶圓產品依序通過這些製程設備後的多個成本資料111。損失成本計算模組122可依據成本資料111以及不良模式資料114,來決定對應於異常製程資料的損失成本資料。在本實施例中,成本資料111可例如是在單片晶圓產品通過單站的製程設備的製造成本,並且不良模式資料114可例如是不良品片數。舉例來說,請參考以下表4。 表4In this embodiment, the loss cost calculation module 122 can be used to calculate the loss cost data corresponding to the abnormal process data. In this embodiment, the loss cost calculation module 122 can integrate these process data, and accumulate multiple cost data 111 after the wafer product sequentially passes through these process equipment. The loss cost calculation module 122 can determine the loss cost data corresponding to the abnormal process data according to the cost data 111 and the bad pattern data 114. In this embodiment, the cost data 111 may be, for example, the manufacturing cost of a single wafer product passing through a single-station process equipment, and the bad mode data 114 may be, for example, the number of defective products. For example, please refer to Table 4 below. Table 4

上述表4可用於表示損失成本計算模組122所整合的這些製程資料結果、各個單站的單片成本資料以及不良品片數。在本實施例中,若晶圓產品於平坦度分類的站點發生良率低於良率指標的情況,則損失成本計算模組122可整合製程資料如上表4,並且累計晶圓產品依序通過這些製程設備後的多個成本資料。舉例來說,請參考以下表5。 表5The above Table 4 can be used to represent the results of the process data integrated by the loss cost calculation module 122, the single-chip cost data of each single station, and the number of defective products. In this embodiment, if the yield of the wafer product at the flatness classification site is lower than the yield index, the loss cost calculation module 122 may integrate the process data as shown in Table 4 above, and the cumulative wafer product order Multiple cost data after passing through these process equipments. For example, please refer to Table 5 below. table 5

上述表5可用於表示損失成本計算模組122所累計晶圓產品的單片晶圓依序通過這些製程設備後的多個成本資料的累計結果。在本實施例中,損失成本計算模組122可統計上述表4的不良品片數以及表5的單片的累計成本資料以計算異常製程資料的損失成本資料(例如10×89.1=891(NT))。也就是說,損失成本計算模組122可依據異常製程資料以及這些各個單站的成本資料決定對應於異常製程資料的損失成本資料。舉例來說,請參考以下表6。 表6The above Table 5 can be used to represent the cumulative results of multiple cost data after a single wafer of the wafer product accumulated by the loss cost calculation module 122 passes through these process equipments in sequence. In this embodiment, the loss cost calculation module 122 can count the number of defective pieces in Table 4 and the cumulative cost data of the single piece in Table 5 to calculate the loss cost data of abnormal process data (for example, 10 × 89.1 = 891 (NT )). In other words, the loss cost calculation module 122 may determine the loss cost data corresponding to the abnormal process data according to the abnormal process data and the cost data of each individual station. For example, please refer to Table 6 below. Table 6

本發明各實施例的損失成本資料以例如是呈現如表6所示之資料內容。在上述表6中,損失成本資料可例如包括損失成本、可重新使用的損失成本以及不可重新使用的損失成本等資料。然而,上述表6的資料內容可依據不同產品類型或製程需求來決定之,或是經由管理者設定之,本發明並不限於此。在本實施例中,良率管理系統120可藉由不良模式資料114判斷屬於不良品的晶圓產品是否可重新使用(可重工或不可重工)。舉例來說,若不良品的晶圓產品的厚度太厚、電阻過高/過低或晶圓受汙染,則屬於可重新使用或可經由其他製程處理後成為良品的類型,因此損失成本可能較低。然而,若不良品的晶圓產品的晶圓平坦度不良、晶圓表面出現線痕、晶圓厚度太薄或晶圓徑向電阻率不均勻,則屬於無不可重新使用或無法經由其他製程處理後成為良品的類型,因此損失成本可能較高。請參考以下表7。 表7The loss cost data of the embodiments of the present invention can be presented as shown in Table 6, for example. In Table 6 above, the loss cost data may include, for example, loss cost, reusable loss cost, and non-reusable loss cost. However, the content of the data in Table 6 above can be determined according to different product types or process requirements, or set by the administrator. The present invention is not limited to this. In this embodiment, the yield management system 120 can determine whether the wafer products belonging to the defective products can be reused (reworkable or non-reworkable) through the defective pattern data 114. For example, if the thickness of the defective wafer product is too thick, the resistance is too high / low, or the wafer is contaminated, it is a type that can be reused or processed through other processes to become a good product. low. However, if the wafer flatness of the defective wafer product is poor, the line marks appear on the wafer surface, the wafer thickness is too thin, or the radial resistivity of the wafer is not uniform, it is either irreusable or cannot be processed through other processes After becoming a good product type, the cost of loss may be higher. Please refer to Table 7 below. Table 7

在本實施例中,不良模式資料114可包括如表7所示的不良品晶圓是否可重新使用的資料,並且本實施例的良率管理系統120於計算如上述表6的損失成本資料時,良率管理系統120可判斷不良品晶圓的類型為晶圓平坦度不良,以依據表7判斷不良品晶圓是屬於不可重新使用的類型,來決定表6中的不良品晶圓為不可重新使用的損失成本。In this embodiment, the defect mode data 114 may include data on whether defective wafers can be reused as shown in Table 7, and the yield management system 120 of this embodiment calculates the loss cost data as shown in Table 6 above The yield management system 120 can determine that the type of defective wafer is defective wafer flatness. According to Table 7, it is determined that the defective wafer is a type that cannot be reused, and the defective wafer in Table 6 is determined to be unavailable. Lost cost of reuse.

在本實施例中,失效模式及影響分析模組123可以依據不良模式,來搜尋記錄在資料庫中的對應潛在原因以及預防機制。舉例來說,請參考以下表8。 表8In this embodiment, the failure mode and impact analysis module 123 can search for corresponding potential causes and prevention mechanisms recorded in the database according to the bad mode. For example, please refer to Table 8 below. Table 8

在本實施例中,失效模式及影響分析模組123可產生如上表8所示的失效分析資料。上表8的失效分析資料可例如包括潛在失效模式、潛在失效效應、嚴重度、潛在原因、預防管制以及檢測管制等。在本實施例中,良率管理系統120可輸出失效分析資料給管理者,以使管理者可有效率地對製程設備進行故障排除。然而,上述表8的資料內容可依據不同產品類型或製程需求來決定之,或是經由管理者設定之,本發明並不限於此。In this embodiment, the failure mode and impact analysis module 123 can generate failure analysis data as shown in Table 8 above. The failure analysis data in Table 8 above may include, for example, potential failure modes, potential failure effects, severity, potential causes, preventive control, and detection control. In this embodiment, the yield management system 120 can output failure analysis data to the manager, so that the manager can efficiently troubleshoot the process equipment. However, the data content of the above Table 8 can be determined according to different product types or process requirements, or set by the administrator, and the present invention is not limited to this.

在本實施例中,良率管理系統120可依據斷異常資料模組121、損失成本計算模組122以及失效模式及影響分析模組123的運算及分析結果產生警示資料130,其中警示資料130可包括關於異常製程資料的產品規格資料、良率、良率指標以及不良模式資料的至少其中之一。舉例來說,警示資料130可例如是包括如上述表1、表2、表6以及表8的資料。並且,在本實施例中,良率管理系統120可依據預設時間週期(例如是每六小時、日報、週報等),週期性地產生並且輸出警示資料130給管理者。In this embodiment, the yield management system 120 can generate warning data 130 according to the calculation and analysis results of the abnormal data module 121, the loss cost calculation module 122, and the failure mode and impact analysis module 123, wherein the warning data 130 can be It includes at least one of product specification data, yield, yield index, and bad mode data about abnormal process data. For example, the warning data 130 may include data such as Table 1, Table 2, Table 6, and Table 8 described above. Moreover, in this embodiment, the yield management system 120 may periodically generate and output warning data 130 to the manager according to a preset time period (for example, every six hours, daily report, weekly report, etc.).

圖2繪示本發明一實施例的多個製程設備的方塊示意圖,參考圖1、圖2。舉例來說,在圖2中,晶圓產品200可例如經由多個階段的多個製程設備的製程處理,例如切片設備310、磨平設備320、浸蝕設備330、拋光設備340。並且,這些製程設備可分別產生製程資料113_1~113_4。製造執行系統110可管理這些製程資料113_1~113_4,並且提供這些製程資料113_1~113_4以及多個對應的成本資料111、多個對應的良率指標112、多個對應的不良模式資料114至良率管理系統120。FIG. 2 is a block diagram of a plurality of process devices according to an embodiment of the present invention. Refer to FIGS. 1 and 2. For example, in FIG. 2, the wafer product 200 may be processed through multiple stages of multiple process equipment, such as slicing equipment 310, smoothing equipment 320, etching equipment 330, and polishing equipment 340, for example. Moreover, these process equipments can generate process data 113_1 ~ 113_4, respectively. The manufacturing execution system 110 can manage these process data 113_1 ~ 113_4, and provide these process data 113_1 ~ 113_4 and a plurality of corresponding cost data 111, a plurality of corresponding yield index 112, a plurality of corresponding bad mode data 114 to yield Management system 120.

在本實施例中,當良率管理系統120藉由判斷異常資料模組121判斷到晶圓產品200通過磨平設備320後的良率發生異常,則良率管理系統120藉由損失成本計算模組122計算晶圓產品200於通過磨平設備320後的損失成本。此外,良率管理系統120還可藉由失效模式及影響分析模組123產生如上述表8的失效分析資料。因此,在本實施例中,良率管理系統120可輸出至少包括損失成本資料以及失效分析資料的警示資料130給管理者。對此,管理者可於接收到此至少包括損失成本資料以及失效分析資料的警示資料130後,針對磨平設備320進行故障排除或是設備調整。也就是說,管理者透過晶圓製造管理系統100可有效率地管理這些製程設備。In this embodiment, when the yield management system 120 determines that the yield of the wafer product 200 passes through the leveling device 320 is abnormal by determining the abnormal data module 121, the yield management system 120 uses the loss cost calculation module 122 Calculate the lost cost of the wafer product 200 after passing through the leveling device 320. In addition, the yield management system 120 can also generate the failure analysis data as shown in Table 8 above through the failure mode and impact analysis module 123. Therefore, in this embodiment, the yield management system 120 may output warning data 130 that includes at least loss cost data and failure analysis data to the manager. In this regard, after receiving the warning data 130 including at least loss cost data and failure analysis data, the administrator may perform troubleshooting or equipment adjustment on the grinding equipment 320. In other words, the manager can efficiently manage these process equipments through the wafer manufacturing management system 100.

圖3繪示本發明一實施例的晶圓製造管理方法的流程圖。3 is a flowchart of a wafer manufacturing management method according to an embodiment of the invention.

參考圖1、圖3,本實施例的晶圓製造管理方法可至少適用於圖1的晶圓製造管理系統100。在步驟S410中,良率管理系統120可依據多個良率指標分別判斷至少一晶圓產品通過多個製程設備後所產生的多個製程資料,以決定是否選擇這些製程資料的至少其中之一為異常製程資料。在步驟S420中,良率管理系統120可整合這些製程資料,以累計晶圓產品依序通過這些製程設備後的多個成本資料。在步驟S430中,良率管理系統120可依據異常製程資料以及這些成本資料決定對應於異常製程資料的損失成本資料。在步驟S440中,良率管理系統120可整合異常製程資料以及損失成本資料,以產生警示資料。因此,本實施例的晶圓製造管理方法可有效監控晶圓產品在製造過程中通過各製程設備的製程結果以及良率,並且可自動判斷各製程設備的良率情況,以提供即時警示資料。然而,實現本實施例的晶圓製造管理方式的相關系統特徵以及資料處理方式,可參考上述圖1~2實施例的說明獲致足夠的教示、建議以及實施說明,因此不再贅述。Referring to FIGS. 1 and 3, the wafer manufacturing management method of this embodiment can be applied to at least the wafer manufacturing management system 100 of FIG. 1. In step S410, the yield management system 120 can separately determine a plurality of process data generated by at least one wafer product passing through a plurality of process equipment according to a plurality of yield indicators to determine whether to select at least one of the process data It is abnormal process data. In step S420, the yield management system 120 may integrate the process data to accumulate multiple cost data after the wafer products pass through the process equipment in sequence. In step S430, the yield management system 120 may determine the loss cost data corresponding to the abnormal process data according to the abnormal process data and the cost data. In step S440, the yield management system 120 may integrate abnormal process data and loss cost data to generate warning data. Therefore, the wafer manufacturing management method of this embodiment can effectively monitor the process results and yields of wafer products passing through each process equipment during the manufacturing process, and can automatically determine the yield rate of each process equipment to provide real-time warning data. However, the relevant system features and data processing methods for implementing the wafer manufacturing management method of this embodiment can be referred to the descriptions of the above embodiments of FIGS. 1 to 2 to obtain sufficient teaching, suggestions, and implementation instructions, and thus will not be repeated.

綜上所述,本發明的晶圓製造管理方法以及晶圓製造管理系統可藉由製造執行系統收集晶圓產品經過多個製程設備後產生的製程資料,並且藉由良率管理系統執行多個模組來判斷良率異常的製程資料,其中良率管理系統可藉由執行整合多個成本資料以及異常製程資料,以產生關於晶圓產品於這些製程設備的損失成本資料,並且良率管理系統還可藉由執行失效模式及影響分析模組產生失效分析資料。因此,本發明的晶圓製造管理方法以及晶圓製造管理系統除了可即時提供損失成本資料,還可提供相關於良率出現異常的製程設備的失效分析資料,以使管理者可有效率地進行晶圓製程監控以及製程管理。In summary, the wafer manufacturing management method and wafer manufacturing management system of the present invention can collect process data generated by a wafer product after passing through multiple process equipments through the manufacturing execution system, and execute multiple molds through the yield management system To determine the process data of abnormal yield, the yield management system can integrate multiple cost data and abnormal process data to generate cost information about the loss of wafer products in these process equipment, and the yield management system also Failure analysis data can be generated by executing failure modes and impact analysis modules. Therefore, the wafer manufacturing management method and the wafer manufacturing management system of the present invention can not only provide loss cost data in real time, but also provide failure analysis data related to process equipment with abnormal yields, so that managers can efficiently perform Wafer process monitoring and process management.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above with examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be subject to the scope defined in the appended patent application.

100‧‧‧晶圓製造管理系統100‧‧‧ Wafer Manufacturing Management System

110‧‧‧製造執行系統110‧‧‧Manufacturing execution system

111‧‧‧成本資料111‧‧‧ Cost information

112‧‧‧良率指標112‧‧‧ Yield index

1131‧‧‧製程設備資料1131‧‧‧Process equipment information

1132‧‧‧產品規格資料1132‧‧‧Product specifications

114‧‧‧不良模式資料114‧‧‧ Bad Mode Information

120‧‧‧良率管理系統120‧‧‧ Yield Management System

121‧‧‧判斷異常資訊模組121‧‧‧Judge Abnormal Information Module

122‧‧‧損失成本計算模組122‧‧‧ Loss cost calculation module

130‧‧‧警示資料130‧‧‧Warning information

200‧‧‧晶圓產品200‧‧‧ Wafer products

310‧‧‧切片設備310‧‧‧Slicing equipment

320‧‧‧磨平設備320‧‧‧Smoothing equipment

330‧‧‧浸蝕設備330‧‧‧Etching equipment

340‧‧‧拋光設備340‧‧‧Polishing equipment

113、113_1、113_2、113_3、113_4、113_5‧‧‧製程資料113, 113_1, 113_2, 113_3, 113_4, 113_5‧‧‧ process information

123‧‧‧失效模式及影響分析模組123‧‧‧ Failure Mode and Impact Analysis Module

S410、S420、S430、S440‧‧‧步驟S410, S420, S430, S440

圖1繪示本發明一實施例的晶圓製造管理系統的方塊示意圖。 圖2繪示本發明一實施例的多個製程設備的方塊示意圖。 圖3繪示本發明一實施例的晶圓製造管理方法的流程圖。FIG. 1 is a block diagram of a wafer manufacturing management system according to an embodiment of the invention. FIG. 2 is a block diagram of a plurality of process equipment according to an embodiment of the invention. 3 is a flowchart of a wafer manufacturing management method according to an embodiment of the invention.

Claims (10)

一種晶圓製造管理方法,包括: 依據多個良率指標分別判斷至少一晶圓產品通過多個製程設備後所產生的多個製程資料,以決定是否選擇該些製程資料的至少其中之一為一異常製程資料; 整合該些製程資料,以累計該晶圓產品依序通過該些製程設備後的多個成本資料; 依據該異常製程資料以及該些成本資料決定對應於該異常製程資料的一損失成本資料;以及 整合該異常製程資料以及該損失成本資料,以產生一警示資料。A wafer manufacturing management method includes: judging a plurality of process data generated after at least one wafer product passes through a plurality of process equipment according to a plurality of yield indicators, to decide whether to select at least one of the process data is An abnormal process data; integrate the process data to accumulate multiple cost data after the wafer product passes through the process equipment in sequence; based on the abnormal process data and the cost data, determine a corresponding to the abnormal process data Lost cost data; and integrate the abnormal process data and the lost cost data to generate a warning data. 如申請專利範圍第1項所述的晶圓製造管理方法,更包括: 依據一良率平均值以及一良率標準差來決定該些良率指標的至少其中之一的一主要良率指標;以及 若該些製程資料的至少其中之一的一良率低於該主要良率指標,則選擇該些製程資料的至少其中之一為該異常製程資料。The wafer manufacturing management method as described in item 1 of the patent application scope further includes: determining a main yield index of at least one of the yield indexes based on a yield average and a yield standard deviation; And if at least one of the process data has a yield rate lower than the main yield index, then at least one of the process data is selected as the abnormal process data. 如申請專利範圍第1項所述的晶圓製造管理方法,更包括: 依據一良率平均值以及一良率標準差來建立具有多個判斷界限的一管制範圍;以及 藉由該些判斷界限建立一判斷條件,若該些製程資料的至少其中之一的一良率符合該判斷條件,則選擇該些製程資料的至少其中之一為該異常製程資料。The wafer manufacturing management method as described in item 1 of the patent application scope further includes: establishing a control range with multiple judgment limits based on a yield average and a yield standard deviation; and by these judgment limits A judgment condition is established, and if a yield of at least one of the process data meets the judgment condition, at least one of the process data is selected as the abnormal process data. 如申請專利範圍第1項所述的晶圓製造管理方法,其中該管制範圍為六個良率標準差。The wafer manufacturing management method as described in item 1 of the patent application scope, wherein the control scope is six yield standard deviations. 如申請專利範圍第1項所述的晶圓製造管理方法,更包括: 依據該至少一晶圓產品的一產品類型決定該些良率指標的至少其中之一;以及 若該些製程資料的至少其中之一的一良率低於該良率指標的至少其中之一,則選擇該些製程資料的至少其中之一為該異常製程資料。The wafer manufacturing management method as described in item 1 of the patent application scope further includes: determining at least one of the yield indicators according to a product type of the at least one wafer product; and if at least the process data One of the yield rates is lower than at least one of the yield index, and at least one of the process data is selected as the abnormal process data. 如申請專利範圍第1項所述的晶圓製造管理方法,更包括: 藉由一製造執行系統取得該些製程資料,並且該些製程資料各別包括一產品規格資料以及一不良模式資料。The wafer manufacturing management method as described in item 1 of the patent application scope further includes: obtaining the manufacturing process data through a manufacturing execution system, and the manufacturing process data respectively include a product specification data and a defective mode data. 如申請專利範圍第6項所述的晶圓製造管理方法,更包括: 依據該異常製程資料所對應的該不良模式資料,取得對應於該異常製程資料的一失效分析資料。The wafer manufacturing management method as described in item 6 of the patent application scope further includes: obtaining a failure analysis data corresponding to the abnormal process data according to the defective mode data corresponding to the abnormal process data. 如申請專利範圍第6項所述的晶圓製造管理方法,更包括: 依據該異常製程資料所對應的該不良模式資料,判斷該至少一晶圓產品當中的至少一不良品是否可重新使用。The wafer manufacturing management method described in item 6 of the patent application scope further includes: judging whether at least one defective product in the at least one wafer product can be reused according to the defective mode data corresponding to the abnormal process data. 如申請專利範圍第1項所述的晶圓製造管理方法,更包括: 依據一預設時間週期,週期性地產生並且輸出該警示資料,其中該警示資料更包括該異常製程資料的一產品規格資料、一良率、一良率指標以及一不良模式資料。The wafer manufacturing management method as described in item 1 of the patent application scope further includes: periodically generating and outputting the warning data according to a preset time period, wherein the warning data further includes a product specification of the abnormal process data Data, a yield rate, a yield index, and a bad pattern data. 一種晶圓製造管理系統,包括: 一製造執行系統,用以提供至少一晶圓產品通過多個製程設備後所產生的多個製程資料;以及 一良率管理系統,耦接該製造執行系統,用以接收對應於該些製程設備的多個良率指標、多個成本資料以及多個製程資料, 其中該良率管理系統依據該些良率指標分別判斷該至少一晶圓產品通過該些製程設備後所產生的該些製程資料,以決定是否選擇該些製程資料的至少其中之一為一異常製程資料, 其中該良率管理系統整合該些製程資料,以累計該至少一晶圓產品依序通過該些製程設備後的多個成本資料, 其中該良率管理系統依據該異常製程資料所對應的該些成本資料的其中之一決定對應於該異常製程資料的一損失成本資料,並且該良率管理系統整合該異常製程資料以及該損失成本資料,以產生一警示資料。A wafer manufacturing management system includes: a manufacturing execution system for providing multiple process data generated by at least one wafer product passing through multiple process equipment; and a yield management system coupled to the manufacturing execution system, Used to receive a plurality of yield indicators, a plurality of cost data and a plurality of process data corresponding to the process equipment, wherein the yield management system respectively judges that the at least one wafer product passes the processes according to the yield indicators The process data generated after the equipment determines whether to select at least one of the process data as an abnormal process data, wherein the yield management system integrates the process data to accumulate the at least one wafer product according to Multiple cost data after passing through the process equipment in sequence, wherein the yield management system determines a loss cost data corresponding to the abnormal process data according to one of the cost data corresponding to the abnormal process data, and the The yield management system integrates the abnormal process data and the loss cost data to generate a warning data.
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