TW201903209A - Electrode base material, and electrode catalyst and electrolysis apparatus each using same - Google Patents

Electrode base material, and electrode catalyst and electrolysis apparatus each using same Download PDF

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TW201903209A
TW201903209A TW107110485A TW107110485A TW201903209A TW 201903209 A TW201903209 A TW 201903209A TW 107110485 A TW107110485 A TW 107110485A TW 107110485 A TW107110485 A TW 107110485A TW 201903209 A TW201903209 A TW 201903209A
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copper
catalyst
substrate
electrode
layer
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TWI753143B (en
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関根可織
谷俊夫
會澤英樹
風間吉則
稲森康次郎
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日商古河電氣工業股份有限公司
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/02Hydrogen or oxygen
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B3/00Electrolytic production of organic compounds
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    • C25B3/25Reduction
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/36Hydrogen production from non-carbon containing sources, e.g. by water electrolysis

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Abstract

The purpose of the present invention is to provide: a copper-based base material which is suitable for use as a base material for catalysts for hydrogen generation by means of electrolysis of water or catalysts for conversion of carbon dioxide into a carbon-containing substance by means of cathodic reduction, and which is capable of improving the catalytic performance of the catalysts; and an electrode catalyst and an electrolysis apparatus, each of which uses this copper-based base material. An electrode base material according to the present invention comprises: a substrate which is formed of copper or a copper alloy; and a diffusion prevention layer which is formed on the surface of the substrate directly or with an oxide layer being interposed therebetween, and which is formed from an organic material.

Description

電極基材、及使用其的電極觸媒與電解裝置Electrode substrate, electrode catalyst and electrolysis device using same

本發明係關於電極基材、及使用其的電極觸媒與電解裝置。The present invention relates to an electrode substrate, and an electrode catalyst and an electrolysis device using the same.

能源資源缺乏的日本,今後有規劃製作氫並使用於各種燃料的計畫。增加太陽電池、水力、風力等生成的可再生能源,並利用水或水蒸氣的電解而製造氫,替代化石燃料(fossil fuel)使用。In Japan, where energy resources are scarce, there are plans to produce hydrogen and use it for various fuels in the future. Increase the renewable energy generated by solar cells, water, wind, etc., and use hydrogen from water or steam to produce hydrogen instead of fossil fuel.

再者,最近因地球暖化所造成的不良影響已給地球環境帶來各種變化,發現有諸多問題現象。原因有認為暖化氣體,特別是佔其大部分的二氧化碳的濃度上升所致。為降低二氧化碳濃度,不僅利用陸地新造林、海洋藻類而增加光合作用量,還必需積極吸收回收二氧化碳,再將其碳使用為有機化合物的原料碳源化,並固定於有價物10年以上。具體而言,必需將二氧化碳還原,轉換為一氧化碳、甲烷、甲醇、蟻酸等,作為可成為有機物合成原料的材料而使用。Furthermore, the recent adverse effects caused by global warming have brought about various changes in the global environment, and many problems have been discovered. The reason is that warm gas, especially the concentration of carbon dioxide, which accounts for most of it, rises. In order to reduce the concentration of carbon dioxide, not only the use of new land afforestation and marine algae to increase the amount of photosynthesis, but also the active absorption and recovery of carbon dioxide, and the use of carbon as a raw material for organic compounds, and fixed to valuables for more than 10 years. Specifically, it is necessary to reduce carbon dioxide and convert it into carbon monoxide, methane, methanol, formic acid, etc., and use it as a material which can be used as a raw material for organic synthesis.

近年,在如上述的二氧化碳的還原反應中,廣泛使用光觸媒、電極觸媒等觸媒,期待開發觸媒性能更優異的觸媒。In recent years, in the reduction reaction of carbon dioxide as described above, a catalyst such as a photocatalyst or an electrode catalyst is widely used, and it is expected to develop a catalyst having more excellent catalyst performance.

針對二氧化碳還原反應所使用的觸媒,不僅講求反應效率,亦要求對特定反應的選擇性,就從此種觀點,材料的選擇成為重要(非專利文獻1)。例如就使效率佳地還原生成一氧化碳,提高還原物質中的比例而言,觸媒材料推薦使用金、銀,若使效率佳地還原生成甲烷、乙烷、乙烯等碳氫化合物,則觸媒材料推薦使用銅。特別是銅,因為亦可生成乙烯等高階有機物,因而作為二氧化碳的陰極還原電極觸媒而備受矚目。The catalyst used for the carbon dioxide reduction reaction is not only a reaction efficiency but also a selectivity to a specific reaction, and from this viewpoint, the selection of materials is important (Non-Patent Document 1). For example, in order to reduce the carbon monoxide efficiently and increase the proportion of the reducing substance, it is recommended to use gold or silver for the catalyst material, and if it is efficiently reduced to produce hydrocarbons such as methane, ethane or ethylene, the catalytic material is used. Copper is recommended. In particular, copper is also attracting attention as a cathode reduction electrode catalyst for carbon dioxide because it can also generate a high-order organic substance such as ethylene.

作為此種銅的還原電極觸媒,除銅板、銅箔等平面式之外,尚有提案篩網、多孔質形狀之物(專利文獻1與2),此外亦有使用利用電沉積或蒸鍍在基材上將觸媒材料固定形成的銅電極觸媒。但是,此種銅電極觸媒,基材上固定形成的觸媒材料,與構成基材的原子之間,隨時間經過會進行反應或相互擴散,導致與基材呈一體化或改質,造成無法揮發作為觸媒材料時所期待的觸媒性能的情況。 [先前技術文獻]As a reduction electrode catalyst for such a copper, in addition to a flat type such as a copper plate or a copper foil, a sieve or a porous shape is proposed (Patent Documents 1 and 2), and electrodeposition or evaporation is also used. A copper electrode catalyst formed by immobilizing a catalyst material on a substrate. However, such a copper electrode catalyst, the catalyst material formed on the substrate and the atoms constituting the substrate react or diffuse with each other over time, resulting in integration or modification with the substrate, resulting in The case where the catalyst performance expected as a catalyst material cannot be volatilized. [Previous Technical Literature]

[專利文獻1] 日本特開2001-97894號公報 [專利文獻2] 日本專利第5683883號公報 [非專利文獻][Patent Document 1] Japanese Laid-Open Patent Publication No. 2001-97894 [Patent Document 2] Japanese Patent No. 5,683,883 [Non-Patent Document]

[非專利文獻1] Y Hori「Electrochemical reduction of CO at a Copper Electrode.」 J. Phys. Chem. B. 101(36). 7075-7081(1997)[Non-Patent Document 1] Y Hori "Electrochemical reduction of CO at a Copper Electrode." J. Phys. Chem. B. 101(36). 7075-7081 (1997)

(發明所欲解決之課題)(The subject to be solved by the invention)

本發明是有鑑於上述問題而完成,目的在於提供適用於利用水電解生成氫、或將二氧化碳施行陰極還原而轉換為含碳物質用的觸媒基材,能提升該觸媒之觸媒性能的電極基材、以及使用其之電極觸媒及電解裝置。 (解決課題之手段)The present invention has been made in view of the above problems, and an object thereof is to provide a catalyst substrate suitable for hydrogen generation by water electrolysis or cathode reduction of carbon dioxide to be converted into a carbonaceous material, which can improve the catalytic performance of the catalyst. An electrode substrate, and an electrode catalyst and an electrolysis device using the same. (means to solve the problem)

本發明者等為解決上述課題經深入鑽研,結果發現將具有由銅或銅系合金所構成基體;及在該基體表面上直接或隔著氧化物層形成,由有機系材料所構成擴散防止層的銅系基材,使用為利用水電解生成氫、或將二氧化碳施行陰極還原而轉換為含碳物質的觸媒基材,便可抑制或防止在基材上所形成觸媒材料的經時變化,能獲得發揮優異觸媒性能的觸媒,根據此項發現遂完成本發明。In order to solve the above problems, the inventors of the present invention have intensively studied and found that a matrix composed of copper or a copper alloy is formed, and a diffusion preventing layer composed of an organic material is formed directly or via an oxide layer on the surface of the substrate. The copper-based substrate can be used to suppress or prevent the change of the catalyst material formed on the substrate by using a catalyst substrate which is converted into a carbonaceous material by electrolysis of water or by cathodic reduction of carbon dioxide. The catalyst for exhibiting excellent catalyst performance can be obtained, and the present invention has been completed based on this finding.

即,本發明主旨構成如下。 [1] 一種電極基材,具備基體與擴散防止層,其中,該基體由銅或銅系合金構成;該擴散防止層在該基體表面上直接或隔著氧化物層形成,且含有有機系材料。 [2] 一種電極基材,是使用為供利用水電解生成氫、或將二氧化碳施行陰極還原而轉換為含碳物質之觸媒的構成基材。 [3] 如上述[1]或[2]所記載的電極基材,其中,上述有機系材料是唑類化合物。 [4] 如上述[1]~[3]中任一項所記載的電極基材,其中,電雙層電容之倒數值為0.3~5cm2 /μF。 [5] 一種電極觸媒,具有電極基材與觸媒層,其中,該電極基材是如上述[1]~[4]中任一項所記載的電極基材;該觸媒層是形成於該電極基材的上述擴散防止層上,且含有具金屬團簇的觸媒材料。 [6] 如上述[5]所記載的電極觸媒,其中,上述金屬團簇是由銅或銅系合金構成的團簇。 [7] 一種電解裝置,具備上述[1]~[4]中任一項所記載的銅系基材、或上述[5]或[6]所記載的電極觸媒。 [8] 一種電解裝置,具備:使用上述[1]~[4]中任一項所記載銅系基材的陰極、陰極電解液、陽極、上述陽極電解液、以及設置於上述陰極與上述陽極間的離子交換膜。 [發明效果]That is, the gist of the present invention is as follows. [1] An electrode substrate comprising a substrate and a diffusion preventing layer, wherein the substrate is made of copper or a copper alloy; the diffusion preventing layer is formed directly or via an oxide layer on the surface of the substrate, and contains an organic material. . [2] An electrode substrate which is a constituent substrate which is used to generate hydrogen by electrolysis using water or to reduce carbon dioxide by catalytic reduction of carbon dioxide. [3] The electrode substrate according to the above [1], wherein the organic material is an azole compound. [4] The electrode substrate according to any one of [1] to [3] wherein the electric double layer capacitance has a reciprocal value of 0.3 to 5 cm 2 /μF. [5] An electrode substrate having an electrode substrate and a catalyst layer, wherein the electrode substrate is the electrode substrate according to any one of the above [1] to [4]; On the diffusion preventing layer of the electrode substrate, a catalyst material having a metal cluster is contained. [6] The electrode catalyst according to the above [5], wherein the metal cluster is a cluster composed of copper or a copper-based alloy. [7] The copper-based substrate according to any one of the above [1] to [4], wherein the electrode catalyst according to the above [5] or [6] is provided. [8] An electrolysis apparatus comprising: a cathode, a catholyte, an anode, the anolyte, and the anode and the anode provided in the copper substrate according to any one of the above [1] to [4] Inter-ion exchange membrane. [Effect of the invention]

根據本發明,適用於利用水電解生成氫、或將二氧化碳施行陰極還原而轉換為含碳物質用的觸媒之基材。根據此種電極基材,可獲得對水電解、二氧化碳的陰極還原能發揮良好觸媒性能的觸媒。According to the present invention, it is suitable for a substrate which is converted into a catalyst for a carbonaceous material by hydrogen production by water electrolysis or by cathodic reduction of carbon dioxide. According to such an electrode substrate, a catalyst which exhibits good catalyst performance for water electrolysis and cathode reduction of carbon dioxide can be obtained.

針對本發明的電極基材、以及使用其的電極觸媒及電解裝置之實施形態,詳細說明如下。Embodiments of the electrode substrate of the present invention, and an electrode catalyst and an electrolysis device using the same will be described in detail below.

本實施形態的電極基材具備由銅或銅系合金構成之基體與在該基體表面上直接或隔著氧化物層形成,且由有機系材料構成之擴散防止層。是是此種銅系電極基材適合用作構成水電解生成氫、或將二氧化基材進行陰極還原轉換為含碳物質的觸媒的銅系電極基材。The electrode substrate of the present embodiment includes a substrate made of copper or a copper-based alloy, and a diffusion preventing layer formed of an organic material directly or via an oxide layer on the surface of the substrate. The copper-based electrode substrate is suitably used as a copper-based electrode substrate which constitutes a catalyst for hydrolyzing hydrogen in water or a catalyst for catalytically reducing a cathode to a carbonaceous material.

作為本實施形態的銅系基材一例,圖1顯示本實施形態的銅系基材的截面的示意概略剖面圖。如圖1所示,本發明的銅系基材1a是具備有基體11、以及直接形成在該基體11上的擴散防止層13。又,圖2所示是本實施形態的銅系基材另一例,圖2顯示銅系基材1b是在基體11與擴散防止層13之間設有氧化物層12。另外,以下在無必要特別區分的前提下,將圖1所示銅系基材1a與圖2所示銅系基材1b,簡稱為「銅系基材1」。Fig. 1 is a schematic cross-sectional view showing a cross section of a copper-based substrate of the present embodiment. As shown in FIG. 1, the copper base material 1a of the present invention is provided with a base 11 and a diffusion preventing layer 13 formed directly on the base 11. 2 shows another example of the copper base material of the present embodiment, and FIG. 2 shows that the copper base material 1b is provided with the oxide layer 12 between the base 11 and the diffusion preventing layer 13. In the following, the copper base material 1a shown in FIG. 1 and the copper base material 1b shown in FIG. 2 are simply referred to as "copper base material 1" unless otherwise specified.

再者,當將本實施形態的銅系基材使用於作為構成觸媒的基材時,可列舉例如圖3所示的使用態樣。圖3顯示將本實施形態的銅系基材使用為觸媒基材時的一例,使用圖1所示銅系基材1a的觸媒3之截面示意概略剖面圖。圖3顯示觸媒3是觸媒層31形成於銅系基材1a的擴散防止層13上。另外,雖無特別圖示,將圖2所示銅系基材1b使用為基材時,亦與圖3所示觸媒3同樣,觸媒層31是形成於銅系基材1b的擴散防止層13上。In addition, when the copper-based substrate of the present embodiment is used as a substrate constituting a catalyst, for example, the use form shown in FIG. 3 can be mentioned. FIG. 3 is a schematic cross-sectional view showing a cross section of the catalyst 3 using the copper base material 1a shown in FIG. 1 as an example of the case where the copper base material of the present embodiment is used as a catalyst base material. 3 shows that the catalyst 3 is formed on the diffusion preventing layer 13 of the copper-based substrate 1a. In addition, when the copper base material 1b shown in FIG. 2 is used as a base material, similarly to the catalyst 3 shown in FIG. 3, the catalyst layer 31 is formed to prevent diffusion of the copper base material 1b. On layer 13.

依此所使用的本實施形態的銅系基材1,藉由具有直接在基體11上、或隔著氧化物層12形成的擴散防止層13,當使用作為觸媒3的基材時,便不會使觸媒層31的觸媒性能劣化。即,根據銅系基材1,因為觸媒層31形成於擴散防止層13上,因而構成觸媒層31的觸媒材料、與基體11、氧化物層12等的構成成分並不會直接接觸。所以,能有效防止在與構成基體11、氧化物層12等的原子間的經時反應或相互擴散。結果,使用本實施形態的銅系基材1,便可有效抑制習知基材之觸媒材料與基材一體化、或因改質導致經時劣化的問題,所以能充分且持續發揮觸媒材料特有的觸媒性能。The copper-based substrate 1 of the present embodiment used as described above has a diffusion preventing layer 13 formed directly on the substrate 11 or via the oxide layer 12, and when a substrate as the catalyst 3 is used, The catalyst performance of the catalyst layer 31 is not deteriorated. In other words, according to the copper-based substrate 1, since the catalyst layer 31 is formed on the diffusion preventing layer 13, the catalyst material constituting the catalyst layer 31 does not directly contact the constituent components of the substrate 11, the oxide layer 12, and the like. . Therefore, it is possible to effectively prevent temporal reaction or mutual diffusion with atoms constituting the substrate 11, the oxide layer 12, and the like. As a result, the use of the copper-based substrate 1 of the present embodiment can effectively suppress the problem that the catalyst material of the conventional substrate is integrated with the substrate or deteriorates over time due to the modification, so that the catalyst material can be sufficiently and continuously exhibited. Catalyst performance.

擴散防止層13是由有機系材料構成。此處,有機系材料是當將銅系基材1使用作為觸媒3的基材時,能有效防止在構成觸媒層31的觸媒材料與基體11、氧化物層12等的構成成分之間,發生經時反應或相互擴散的有機系材料即可,更佳是能阻礙在基體11、氧化物層12等與觸媒層31間的成分移動的材料。此種材料,可列舉例如:三唑類、噻唑類及咪唑類等唑類;硫醇類、三乙醇胺類等化合物。其中,從與銅間的親和性佳(例如配位鍵結於銅)的觀點,較佳是唑類、更佳是三唑類、特佳是苯并三唑類。另外,苯并三唑類化合物較佳是例如苯并三唑。The diffusion preventing layer 13 is made of an organic material. When the copper-based substrate 1 is used as a substrate of the catalyst 3, the organic material can effectively prevent the constituent materials of the catalyst material constituting the catalyst layer 31, the substrate 11, the oxide layer 12, and the like. An organic material which undergoes a reaction with time or a mutual diffusion may be used, and a material which can block the movement of a component between the substrate 11 and the oxide layer 12 and the catalyst layer 31 is more preferable. Examples of such a material include azoles such as triazoles, thiazoles, and imidazoles; and compounds such as thiols and triethanolamines. Among them, from the viewpoint of good affinity with copper (for example, coordination bonding to copper), azoles, more preferably triazoles, and particularly preferably benzotriazoles are preferred. Further, the benzotriazole compound is preferably, for example, benzotriazole.

擴散防止層13的形成狀態並無特別的限定,可配合基體11的形狀、使用形態再行適當選擇,只要至少形成於基材11之一表面便可,亦可形成覆蓋基材11表面整面的狀態。The formation state of the diffusion preventing layer 13 is not particularly limited, and may be appropriately selected in accordance with the shape and use form of the substrate 11, and may be formed on at least one surface of the substrate 11, or may be formed to cover the entire surface of the substrate 11. status.

再者,擴散防止層13的厚度是依電雙層電容的倒數值定量地表示。 具體而言,表示擴散防止層13厚度的電雙層電容倒數值,是使用市售的直讀式電雙層電容測定器(例如阻抗分析儀 C儀、日置電機股份有限公司製),測定基體表面的電雙層電容(C:μF),並依下式(1)計算出倒數值(1/C)。 1/C=A‧d+B……(1) (d是在基體上所形成的電雙層的厚度,A、B是常數)Furthermore, the thickness of the diffusion preventing layer 13 is quantitatively expressed in terms of the inverse value of the electric double layer capacitor. Specifically, the electric double layer capacitance reciprocal value indicating the thickness of the diffusion preventing layer 13 is measured using a commercially available direct reading type electric double layer capacitance measuring device (for example, impedance analyzer C, manufactured by Hioki Electric Co., Ltd.). The electric double layer capacitance (C: μF) of the surface, and the inverse value (1/C) is calculated according to the following formula (1). 1/C=A‧d+B (1) (d is the thickness of the electric double layer formed on the substrate, A and B are constant)

上式(1)所求得的電雙層電容的倒數值,與基體上所形成的電雙層的厚度d,即擴散防止層13的厚度成正比誘發。因此,此種電雙層電容的倒數值較佳是0.3~5cm2 /μF、更佳是0.5~1.5cm2 /μF。藉由設在上述範圍內,當使用為觸媒的基體時,便可獲得能發揮優異觸媒性能的觸媒。另外,當電雙層電容的倒數值是0.3~5cm2 /μF時,若利用電子顯微鏡測定擴散防止層13的厚度,為平均4~75nm程度。The reciprocal value of the electric double layer capacitor obtained by the above formula (1) is induced in proportion to the thickness d of the electric double layer formed on the substrate, that is, the thickness of the diffusion preventing layer 13. Therefore, the reciprocal value of such an electric double layer capacitor is preferably 0.3 to 5 cm 2 /μF, more preferably 0.5 to 1.5 cm 2 /μF. By setting it within the above range, when a substrate which is a catalyst is used, a catalyst capable of exhibiting excellent catalyst performance can be obtained. Further, when the reciprocal value of the electric double layer capacitor is 0.3 to 5 cm 2 /μF, the thickness of the diffusion preventing layer 13 is measured by an electron microscope to an average of 4 to 75 nm.

基體11是由銅或銅系合金構成。當基體11由銅(純銅)構成的情況,可使用例如將精煉銅TPC、磷脫氧銅PDC、無氧銅OFC加工為各種形狀者、或電解銅箔。又,當基體11是由銅系合金構成的情形,可使用例如:銅-錫系合金、銅-鐵系合金、銅-鋯系合金、銅-鉻系合金等銅基稀釋合金,此外亦可使用卡遜合金(Corson alloy)系等等的第二成分以後的成分為0.01質量%~5質量%程度,經固溶或析出強化的銅基稀釋合金。另外,合金系電極的情況,除銀以外的成分的添加量越增加,則導電率越低,會有導致成為基材電極時的基本特性降低之傾向,故除銀以外的成分添加量越少越好。又,基體11的形狀並無特別的限定,除平板狀之外,亦可使用篩網、多孔質形狀,尤其較佳是平板狀。The base 11 is made of copper or a copper alloy. When the base 11 is made of copper (pure copper), for example, a refined copper TPC, a phosphorus deoxidized copper PDC, an oxygen-free copper OFC may be processed into various shapes, or an electrolytic copper foil may be used. Further, when the base 11 is made of a copper-based alloy, for example, a copper-based diluted alloy such as a copper-tin alloy, a copper-iron alloy, a copper-zirconium alloy, or a copper-chromium alloy may be used, or A copper-based diluted alloy which is solidified or precipitated and strengthened by using a composition of a second component such as a Corson alloy or the like in an amount of from 0.01% by mass to 5% by mass. In addition, in the case of the alloy-based electrode, the amount of the component other than the silver is increased, the lower the conductivity, the lower the basic characteristics when the substrate electrode is formed, and the smaller the amount of components other than silver. The better. Further, the shape of the base 11 is not particularly limited, and a mesh or a porous shape may be used in addition to the flat plate shape, and a flat plate shape is particularly preferable.

氧化物層12是以任意層形成於基體11與擴散防止層12之間。此種氧化物層12較佳是例如由金屬氧化物層構成,其中更佳是含有從過渡金屬中選擇至少1種金屬的氧化物,特佳是含銅的氧化物。銅氧化物,例如氧化亞銅(Cu2 O)、氧化銅(CuO)之外,尚可例如不定比氧化銅等。特別是氧化物層12較佳是含有氧化亞銅或氧化銅中之至少其中一者。The oxide layer 12 is formed between the substrate 11 and the diffusion preventing layer 12 in an arbitrary layer. The oxide layer 12 is preferably composed of, for example, a metal oxide layer, and more preferably contains an oxide of at least one metal selected from the transition metals, particularly preferably a copper-containing oxide. In addition to copper oxide, such as cuprous oxide (Cu 2 O) or copper oxide (CuO), for example, copper oxide or the like may be determined. In particular, the oxide layer 12 preferably contains at least one of cuprous oxide or copper oxide.

再者,氧化物層12可由1層氧化物層構成的單層、亦可由2層以上氧化物層構成的複層。又,當氧化物層12是由1層氧化物層構成的單層時,可由1種氧化物構成的層、亦可由2種以上氧化物混雜的層。又,當氧化物層12是由2層以上氧化物層構成的複層時,各層未必為明確的個別層,在2個層的邊界部分處亦可混雜構成各層的各氧化物。又,在氧化物層12中,除各種氧化物之外,亦可以500~1000ppm程度內含有上述有機系材料、構成基體的金屬或合金。Further, the oxide layer 12 may be a single layer composed of one oxide layer or a multiple layer composed of two or more oxide layers. Further, when the oxide layer 12 is a single layer composed of one oxide layer, a layer composed of one type of oxide or a layer in which two or more kinds of oxides are mixed may be used. Further, when the oxide layer 12 is a composite layer composed of two or more oxide layers, each layer is not necessarily an individual layer, and the respective oxides constituting each layer may be mixed at the boundary portion of the two layers. Further, in the oxide layer 12, in addition to various oxides, the organic material or the metal or alloy constituting the substrate may be contained in an amount of about 500 to 1000 ppm.

再者,氧化物層12較佳是至少含有氧化亞銅或氧化銅。此種氧化物層12可列舉例如:含有氧化亞銅及氧化銅中之至少其中一者的單層、或含有由氧化亞銅所構成層(以下稱「氧化亞銅層」)、及由氧化銅所構成層(以下稱「氧化銅層」)中之至少其中一者的複層。Further, the oxide layer 12 preferably contains at least cuprous oxide or copper oxide. The oxide layer 12 may, for example, be a single layer containing at least one of cuprous oxide and copper oxide, or a layer composed of cuprous oxide (hereinafter referred to as "copper oxide layer"), and oxidized. A multilayer of at least one of the layers of copper (hereinafter referred to as "copper oxide layer").

再者,氧化物層12較佳是由具有銅氧化數互異的2層以上的銅氧化物層構成、更佳是由氧化亞銅層與氧化銅層構成。又,此種2層以上的銅氧化物層較佳是越位於表面側的層之銅氧化數越大。Further, the oxide layer 12 is preferably composed of two or more copper oxide layers having different copper oxidation numbers, and more preferably composed of a cuprous oxide layer and a copper oxide layer. Moreover, it is preferable that the copper oxide layer of the two or more layers has a larger copper oxidation number of the layer located on the surface side.

就氧化物層12是複層情況之一例,圖2顯示本實施形態的銅系基材1b的剖面之示意概略剖面圖。圖2所示銅系基材1b中,氧化物層12是由具有互異銅氧化數的第1銅氧化物層121與第2銅氧化物層122構成。此處,位於較第1銅氧化物層121更靠表面側的第2銅氧化物層122之銅氧化數,較佳是大於第1銅氧化物層121。In the case where the oxide layer 12 is a stratified layer, FIG. 2 is a schematic cross-sectional view showing a cross section of the copper-based substrate 1b of the present embodiment. In the copper base material 1b shown in Fig. 2, the oxide layer 12 is composed of a first copper oxide layer 121 and a second copper oxide layer 122 having mutually different copper oxidation numbers. Here, the copper oxidation number of the second copper oxide layer 122 located on the surface side of the first copper oxide layer 121 is preferably larger than that of the first copper oxide layer 121.

例如圖2中,當第1銅氧化物層121是氧化亞銅層、而第2銅氧化物層122是氧化銅層時,氧化銅層較佳是較氧化亞銅層位於更外層。又,氧化亞銅層相對於氧化銅層的厚度比率,較佳是0.0001~10000、更佳是1~10000。For example, in FIG. 2, when the first copper oxide layer 121 is a cuprous oxide layer and the second copper oxide layer 122 is a copper oxide layer, the copper oxide layer is preferably located on the outermost layer than the cuprous oxide layer. Further, the thickness ratio of the cuprous oxide layer to the copper oxide layer is preferably 0.0001 to 10,000, more preferably 1 to 10,000.

其次,針對本實施形態的銅系基材的較佳製造方法進行說明。本實施形態的銅系基材的製造方法,包括在基體表面上形成擴散防止層的步驟。又,視需要亦可更進一步包括:前處理步驟、形成氧化物層的步驟。以下,進行具體說明。Next, a preferred method of producing the copper-based substrate of the present embodiment will be described. The method for producing a copper-based substrate of the present embodiment includes the step of forming a diffusion preventing layer on the surface of the substrate. Moreover, the method further includes a pre-processing step and a step of forming an oxide layer. Hereinafter, specific description will be given.

(前處理步驟) 首先,準備由銅或銅系合金構成的基體,施行該基體的表面洗淨。藉由對基體表面施行潔淨化,便可在後步驟中,於基體表面上均質地形成擴散防止層,可提升基體與擴散防止層間之密接性。表面洗淨可依照公知方法實施,但以在施行浸漬脫脂或陰極電解脫脂之後更施行酸洗淨(中和)為佳。(Pre-Processing Step) First, a substrate made of copper or a copper-based alloy is prepared, and the surface of the substrate is washed. By purifying the surface of the substrate, a diffusion preventing layer can be uniformly formed on the surface of the substrate in the subsequent step, and the adhesion between the substrate and the diffusion preventing layer can be improved. The surface washing can be carried out in accordance with a known method, but it is preferred to carry out acid washing (neutralization) after performing immersion degreasing or cathodic electrolytic degreasing.

(形成擴散防止層的步驟) 在已完成前處理的基體表面上形成擴散防止層。具體而言,將基體浸漬於含有欲形成擴散防止層的有機系材料之溶液中,藉由使其乾燥,在基體上形成擴散防止層。(Step of Forming Diffusion Preventing Layer) A diffusion preventing layer is formed on the surface of the substrate which has been subjected to the pretreatment. Specifically, the substrate is immersed in a solution containing an organic material to form a diffusion preventing layer, and dried to form a diffusion preventing layer on the substrate.

有機系材料可使用上述有機系材料。又,含有機系材料的溶液之溶劑可使用例如水、醇等公知溶劑。又,浸漬基體時,亦可將含有上述有機系材料的溶液溫度設為60~100℃、浸漬時間設為1.5~4分鐘程度,亦可將乾燥溫度設為60~90℃。另外,擴散防止層的厚度,能夠利用有機系材料的種類、溶液濃度、重複浸漬與乾燥步驟的次數而調節。As the organic material, the above organic material can be used. Further, as the solvent of the solution containing the organic material, a known solvent such as water or alcohol can be used. Further, when the substrate is immersed, the temperature of the solution containing the organic material may be 60 to 100 ° C, the immersion time may be 1.5 to 4 minutes, or the drying temperature may be 60 to 90 °C. Further, the thickness of the diffusion preventing layer can be adjusted by the type of the organic material, the solution concentration, and the number of times of the immersion and drying steps.

再者,當在基體與擴散防止層之間形成氧化物層的情形時,在施行形成擴散防止層的步驟之前,便施行形成氧化物層的步驟。形成氧化物層的步驟,以對待形成擴散防止層前的基體施行例如:浸漬處理、陽極氧化處理及加熱氧化處理中之任一項處理的步驟為佳。Further, in the case where an oxide layer is formed between the substrate and the diffusion preventing layer, the step of forming an oxide layer is performed before the step of forming the diffusion preventing layer. The step of forming the oxide layer is preferably carried out by subjecting the substrate before the diffusion preventing layer to a treatment such as an immersion treatment, an anodizing treatment, and a heating oxidation treatment.

其次,針對使用本實施形態的銅系基材的觸媒進行說明。 本實施形態的觸媒較佳具備:上述本實施形態的銅系基材、以及形成於該銅系基材的擴散防止層上、含有觸媒材料的觸媒層。圖3顯示就本實施形態的觸媒一例,使用圖1所示銅系基材1a的觸媒3。Next, a catalyst using the copper base material of the present embodiment will be described. The catalyst of the present embodiment preferably includes the copper-based substrate of the present embodiment and a catalyst layer containing a catalyst material formed on the diffusion preventing layer of the copper-based substrate. Fig. 3 shows a catalyst 3 using the copper base material 1a shown in Fig. 1 as an example of the catalyst of the present embodiment.

如圖3所示,本實施形態的觸媒3是在銅系基材1的擴散防止層13上,具有含觸媒材料的觸媒層31。就觸媒3而言,觸媒反應主要是發生於觸媒層31的表面、其表面附近。根據此種觸媒3,因為可有效地防止觸媒層31的構成成分與構成銅系基材1的基體11、任意形成的氧化物層12之構成成分等產生反應、或擴散,因而可使由觸媒層31進行的觸媒反應之反應效率不會經時降低。As shown in FIG. 3, the catalyst 3 of the present embodiment has a catalyst layer 31 containing a catalyst material on the diffusion preventing layer 13 of the copper base material 1. In the case of the catalyst 3, the catalyst reaction mainly occurs on the surface of the catalyst layer 31 and in the vicinity of its surface. According to the catalyst 3, it is possible to effectively prevent the constituent components of the catalyst layer 31 from reacting or diffusing with the matrix 11 constituting the copper-based substrate 1, the constituent components of the oxide layer 12 which is arbitrarily formed, and the like. The reaction efficiency of the catalyst reaction by the catalyst layer 31 does not decrease over time.

構成觸媒層31的觸媒材料,可列舉例如含有金屬團簇的團簇觸媒、奈米粒子等。其中,從觸媒性能高的觀點,特別較佳是含有金屬團簇的觸媒材料。The catalyst material constituting the catalyst layer 31 may, for example, be a cluster catalyst containing a metal cluster, or a nanoparticle. Among them, a catalyst material containing a metal cluster is particularly preferable from the viewpoint of high catalyst performance.

但是,當觸媒材料含有金屬團簇的情況,若使用未設有本實施形態的擴散防止層13的習知基材,則觸媒層31中所含的金屬團簇、與構成基材的銅成分會相互擴散、融合,導致出現無法充分發揮團簇觸媒特有性能的問題。However, when the catalyst material contains a metal cluster, if a conventional substrate in which the diffusion preventing layer 13 of the present embodiment is not provided is used, the metal cluster contained in the catalyst layer 31 and the copper component constituting the substrate are used. Will spread and merge with each other, leading to the problem of not being able to fully utilize the unique performance of the cluster catalyst.

相對於此,根據本實施形態設有擴散防止層13的銅系基材1,即便觸媒材料含有金屬團簇的情況,仍可有效地防止原子擴散,因而不會使團簇觸媒的性能劣化。即,本實施形態的銅系基材1,特別適用於作為由含金屬團簇的觸媒材料所構成觸媒層用之基材。On the other hand, according to the copper-based substrate 1 provided with the diffusion preventing layer 13 in the present embodiment, even when the catalyst material contains a metal cluster, atomic diffusion can be effectively prevented, so that the performance of the cluster catalyst is not caused. Deterioration. In other words, the copper base material 1 of the present embodiment is particularly suitably used as a base material for a catalyst layer composed of a catalyst material containing a metal cluster.

另外,本發明中所謂「團簇」是指由金屬原子2~100個程度集合之物。其中,較佳是由金屬原子10~40個集合之物。又,金屬團簇所含的金屬可列舉從白金(Pt)、金(Au)、銀(Ag)、銅(Cu)、鈀(Pd)及鐵(Fe)中選擇1種或2種以上的金屬之物,其中,較佳是含有銅、更佳是由銅或銅系合金構成者。含金屬團簇的觸媒材料亦可以30質量%程度在觸媒材料中含有團簇以外的金屬粒子。In the present invention, the term "cluster" means a mixture of 2 to 100 metal atoms. Among them, it is preferably a collection of 10 to 40 metal atoms. Further, the metal contained in the metal cluster may be one or more selected from the group consisting of platinum (Pt), gold (Au), silver (Ag), copper (Cu), palladium (Pd), and iron (Fe). The metal material preferably contains copper, more preferably copper or a copper alloy. The catalyst material containing a metal cluster may contain metal particles other than the cluster in the catalyst material to the extent of 30% by mass.

其次,針對使用本實施形態的銅系基材的觸媒的製造方法進行說明。以下,就形成由含金屬團簇之觸媒材料所構成觸媒層的情況為例,針對觸媒的製造方法一例進行說明。 本實施形態的觸媒的製造方法,包括在本實施形態的銅系基材的擴散防止層表面上,形成觸媒層的步驟。又,視需要亦可更進一步具有在觸媒層的表面上形成表面保護層的步驟。以下進行具體說明。Next, a method of producing a catalyst using the copper-based substrate of the present embodiment will be described. Hereinafter, a case where a catalyst layer composed of a catalyst material containing a metal cluster is formed will be described as an example, and an example of a method for producing a catalyst will be described. The method for producing a catalyst according to the present embodiment includes the step of forming a catalyst layer on the surface of the diffusion preventing layer of the copper-based substrate of the present embodiment. Further, it is also possible to further have a step of forming a surface protective layer on the surface of the catalyst layer as needed. The details will be described below.

首先,準備上述本實施形態的銅系基材。其次,在銅系基材的擴散防止層上形成由含金屬團簇的觸媒材料所構成的觸媒層。此種觸媒層是藉由使團簇觸媒蒸鍍於銅系基材的擴散防止層上便可形成。團簇觸媒的形成方法並無特別的限定,可列舉例如國際公開第2014/192703號說明書所記載的方法等。First, the copper-based substrate of the above embodiment is prepared. Next, a catalyst layer composed of a catalyst material containing a metal cluster is formed on the diffusion preventing layer of the copper-based substrate. Such a catalyst layer can be formed by vapor-depositing a cluster catalyst on a diffusion preventing layer of a copper-based substrate. The method for forming the cluster catalyst is not particularly limited, and examples thereof include those described in the specification of International Publication No. 2014/192703.

具體而言,能夠利用直流電源的磁控濺鍍法等形成。此種方法是使用具備:已抽真空的腔、在該腔內所設置的團簇成長槽、以及在該團簇成長槽內所設置的濺鍍源(磁控濺鍍源)的裝置,製作團簇觸媒。該團簇成長槽是由液態氮夾套包圍其周圍,並以在該液態氮夾套內流通液態氮(N2 )狀態的方式構成。為了使電漿產生而對濺鍍源供應氬氣(Ar),並對團簇成長槽內供應氦氣(He)。由濺鍍源用脈衝電源供應脈衝電力,使靶材朝氦氣中釋放出源自靶材的中性原子及離子等濺鍍粒子。將由該等濺鍍源產生的金屬原子、金屬離子等予以冷卻,再利用前述氦氣使其凝聚生成團簇觸媒。Specifically, it can be formed by a magnetron sputtering method using a DC power source or the like. In this method, a device having a vacuum chamber, a cluster growth tank provided in the chamber, and a sputtering source (magnetron sputtering source) provided in the growth chamber of the cluster are used. Cluster catalyst. The cluster growth tank is surrounded by a liquid nitrogen jacket and is configured to flow a liquid nitrogen (N 2 ) state in the liquid nitrogen jacket. Argon gas (Ar) is supplied to the sputtering source for plasma generation, and helium gas (He) is supplied to the cluster growth tank. The pulsed power is supplied from the sputtering source to supply the pulsed power, so that the target releases the sputtering particles such as neutral atoms and ions derived from the target into the helium gas. The metal atoms, metal ions, and the like generated by the sputtering sources are cooled, and the helium gas is used to agglomerate to form a cluster catalyst.

此種本發明的觸媒特別適用為電極觸媒。即,本實施形態的電極觸媒較佳具備本實施形態的銅系基材、以及形成於該銅系基材的上述擴散防止層上且由含金屬團簇的觸媒材料所構成的觸媒層。此種電極觸媒適用於作為後述二氧化碳還原裝置的陰極電極。特別是當使用作為陰極電極時,因為可減小陰極還原的反應過電壓,因而可降低所需要的外部偏壓電壓(外部電力)。即,在陰極還原中,能提高反應的電流效率、提生產率與生產性。Such a catalyst of the invention is particularly useful as an electrode catalyst. In other words, the electrode catalyst of the present embodiment preferably includes the copper-based substrate of the present embodiment and a catalyst formed of a catalyst material containing a metal cluster formed on the diffusion preventing layer of the copper-based substrate. Floor. Such an electrode catalyst is suitably used as a cathode electrode as a carbon dioxide reduction device to be described later. In particular, when used as a cathode electrode, since the reaction overvoltage of cathode reduction can be reduced, the external bias voltage (external power) required can be lowered. That is, in the cathode reduction, the current efficiency of the reaction, the productivity, and the productivity can be improved.

本實施形態的電解裝置以使用本實施形態的銅系基材或本實施形態的電極觸媒為佳。裝置的形成方法並無特別的限定,可利用公知方法實施。電解裝置可列舉例如:二氧化碳的還原裝置、水的電解裝置等。In the electrolysis device of the present embodiment, it is preferable to use the copper base material of the present embodiment or the electrode catalyst of the present embodiment. The method of forming the device is not particularly limited, and it can be carried out by a known method. Examples of the electrolysis device include a reduction device for carbon dioxide, an electrolysis device for water, and the like.

以下,針對使用本實施形態的銅系基材的電極觸媒,用於作為二氧化碳電化學還原(電解還原、陰極還原)之陰極電極用的情況的一例進行說明。In the following, an example of a case where the electrode catalyst using the copper-based substrate of the present embodiment is used as a cathode electrode for electrochemical reduction (electrolytic reduction, cathodic reduction) of carbon dioxide will be described.

圖4顯示施行二氧化碳電化學還原的電解裝置3之構造方塊圖。電解裝置3主要由:電源31、電解槽33、氣體回收裝置35、電解液循環裝置37、二氧化碳供應部39等構成。Fig. 4 is a block diagram showing the construction of an electrolysis device 3 for performing electrochemical reduction of carbon dioxide. The electrolysis device 3 is mainly composed of a power source 31, an electrolytic cell 33, a gas recovery device 35, an electrolyte circulation device 37, a carbon dioxide supply unit 39, and the like.

電解槽33是將對象物質進行還原的部位,亦是含有本實施形態的陰極電極的部位,將二氧化碳(亦包含溶液中,除溶存二氧化碳外,尚含有碳酸氫離子的情況。以下,簡稱為「二氧化碳等」)進行還原的部位。由電源31朝電解槽33供應電力。The electrolytic cell 33 is a site where the target material is reduced, and is a portion containing the cathode electrode of the present embodiment, and carbon dioxide (including a case where the carbon dioxide ion is contained in the solution in addition to the dissolved carbon dioxide). Hereinafter, it is simply referred to as " Carbon dioxide, etc.") The site where the reduction takes place. Power is supplied from the power source 31 to the electrolytic cell 33.

電解液循環裝置37是使陰極側電解液對電解槽33的陰極電極進行循環的部位。電解液循環裝置37是例如槽與泵,從二氧化碳供應部39依成為既定二氧化碳濃度的方式,供應二氧化碳等並溶解於電解液中,且能在與電解槽33之間循環電解液。The electrolyte circulation device 37 is a portion that circulates the cathode-side electrolyte to the cathode electrode of the electrolytic cell 33. The electrolyte circulation device 37 is, for example, a tank and a pump. The carbon dioxide supply unit 39 supplies carbon dioxide or the like so as to be dissolved in the electrolytic solution so as to be a predetermined carbon dioxide concentration, and can circulate the electrolyte between the electrolytic cell 33 and the electrolytic cell 33.

氣體回收裝置35是回收由電解槽33還原、產生氣體的部位。氣體回收裝置35能夠捕集由電解槽33的陰極電極所產生之碳氫化合物等氣體。另外,氣體回收裝置35中,亦可依照氣體種類分離每種氣體。The gas recovery device 35 recovers a portion where the gas is reduced by the electrolytic cell 33 to generate gas. The gas recovery device 35 is capable of trapping a gas such as a hydrocarbon generated by the cathode electrode of the electrolytic cell 33. Further, in the gas recovery device 35, each gas may be separated depending on the type of gas.

電解裝置3是具有如下的機能。如前述,電解槽33是由電源31賦予電解電位。利用電解液循環裝置37對電解槽33的陰極電極供應電解液(圖中箭頭A)。在電解槽33的陰極電極處,所供應電解液中的二氧化碳等會被還原。二氧化碳等被還原,主要生成乙烷、乙烯等碳氫化合物。The electrolysis device 3 has the following functions. As described above, the electrolytic cell 33 is given an electrolytic potential by the power source 31. The electrolyte solution (arrow A in the figure) is supplied to the cathode electrode of the electrolytic cell 33 by the electrolytic solution circulation device 37. At the cathode electrode of the electrolytic cell 33, carbon dioxide or the like in the supplied electrolyte is reduced. Carbon dioxide or the like is reduced to mainly form hydrocarbons such as ethane and ethylene.

由陰極電極生成的碳氫化合物氣體是利用氣體回收裝置35予以回收(圖中箭頭B)。在氣體回收裝置35中,視需要可分離氣體並儲存。The hydrocarbon gas generated by the cathode electrode is recovered by the gas recovery device 35 (arrow B in the figure). In the gas recovery device 35, the gas can be separated and stored as needed.

在陰極電極處二氧化碳等被還原而消耗掉,所以電解液中的二氧化碳等之濃度會減少。經常補充因還原反應而減少的二氧化碳等,使濃度經常保持於既定範圍內。具體而言,利用電解液循環裝置37回收部分電解液(圖中箭頭C),經常供應既定濃度的電解液(圖中箭頭A)。藉由上述,在電解槽33中便可經常依一定的條件生成碳氫化合物。Since carbon dioxide or the like is reduced at the cathode electrode and consumed, the concentration of carbon dioxide or the like in the electrolyte is reduced. Carbon dioxide or the like which is reduced by the reduction reaction is often replenished so that the concentration is often kept within a predetermined range. Specifically, a part of the electrolytic solution (arrow C in the drawing) is recovered by the electrolytic solution circulation device 37, and a predetermined concentration of the electrolytic solution (arrow A in the figure) is often supplied. By the above, hydrocarbons can be generated in the electrolytic cell 33 under certain conditions.

其次,針對電解槽33進行說明。圖5顯示電解槽33的構造圖。電解槽33主要是由:陰極槽的槽316a、金屬篩網317、陰極電極319、陽離子交換膜321、陽極電極320、以及陽極槽的槽316b等構成。Next, the electrolytic cell 33 will be described. FIG. 5 shows a configuration diagram of the electrolytic cell 33. The electrolytic cell 33 is mainly composed of a tank 316a of a cathode tank, a metal mesh 317, a cathode electrode 319, a cation exchange membrane 321, an anode electrode 320, and a tank 316b of an anode tank.

在槽316a、316b中分別保持著電解液315a、315b。在靠陰極電極側的槽316a上部形成供回收生成氣體用的孔,連接於省略圖示的氣體回收裝置。即,由陰極電極生成的氣體被從該孔中回收。又,槽316a連接有配管等,並連接於省略圖示的電解液循環裝置37。即,槽316a內的電解液315a利用電解液循環裝置37而可經常循環。另外,視需要,槽315b側的電解液亦同樣能進行循環。The electrolytes 315a and 315b are held in the grooves 316a and 316b, respectively. A hole for collecting a generated gas is formed on the upper portion of the groove 316a on the cathode electrode side, and is connected to a gas recovery device (not shown). That is, the gas generated by the cathode electrode is recovered from the pore. Further, a pipe or the like is connected to the groove 316a, and is connected to an electrolytic solution circulation device 37 (not shown). That is, the electrolytic solution 315a in the tank 316a can be circulated frequently by the electrolytic solution circulation device 37. Further, the electrolyte on the side of the groove 315b can also be circulated as needed.

作為陰極電解液的電解液315a,較佳是能大量溶解二氧化碳等的電解液,可使用例如:氫氧化鈉水溶液、氫氧化鉀水溶液、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等鹼性溶液;單甲醇胺、甲胺、其他液態胺、或該等液態胺與電解質水溶液的混合液等。又,亦可使用例如:乙腈、苯甲腈、二氯甲烷、四氫呋喃、碳酸丙烯酯、二甲基甲醯胺、二甲亞碸、甲醇、乙醇等。又,目的為氫生成的水電解時,適當的水溶液亦可使用純水。The electrolytic solution 315a as the catholyte is preferably an electrolytic solution capable of dissolving a large amount of carbon dioxide or the like, and for example, an alkali solution such as a sodium hydroxide aqueous solution, a potassium hydroxide aqueous solution, sodium carbonate, potassium carbonate, sodium hydrogencarbonate or potassium hydrogencarbonate can be used. A solution of monomethanolamine, methylamine, other liquid amines, or a mixture of such liquid amines and an aqueous electrolyte solution. Further, for example, acetonitrile, benzonitrile, dichloromethane, tetrahydrofuran, propylene carbonate, dimethylformamide, dimethyl hydrazine, methanol, ethanol or the like can be used. Further, in the case of water electrolysis for the purpose of hydrogen generation, pure water may be used as a suitable aqueous solution.

再者,作為陽極電解液的電解液315b,可使用上述陰極電解液、或者適當的純水、水溶液。Further, as the electrolytic solution 315b as the anolyte, the above-described catholyte or appropriate pure water or an aqueous solution can be used.

金屬篩網317與參考電極318一起連接於電源31的負極側,是對陰極電極319通電用的構件。作為金屬篩網317例如銅製篩網、不銹鋼製篩網,參考電極318可使用銀/氯化銀電極等。The metal mesh 317 is connected to the negative electrode side of the power source 31 together with the reference electrode 318, and is a member for energizing the cathode electrode 319. As the metal mesh 317 such as a copper mesh or a stainless steel mesh, a reference electrode 318 may be a silver/silver chloride electrode or the like.

作為陽離子交換膜321,可使用例如公知的全氟磺酸(Nafion)系等。利用陽極反應可使氧與所生成的氫離子一起朝陰極移動。As the cation exchange membrane 321, for example, a well-known perfluorosulfonic acid (Nafion) system or the like can be used. Oxygen is used to move the cathode together with the generated hydrogen ions toward the cathode.

陽極電極320連接於電源31的正極。作為陽極電極320,能夠使用氧產生過電壓較小的電極,例如:在鈦、不銹鋼等基材上被覆著氧化銥、白金、銠等的電極、或氧化物電極、不銹鋼電極、鉛電極等。The anode electrode 320 is connected to the anode of the power source 31. As the anode electrode 320, an electrode having a small overvoltage due to oxygen can be used. For example, an electrode such as ruthenium oxide, platinum, or rhodium, or an oxide electrode, a stainless steel electrode, or a lead electrode can be coated on a substrate such as titanium or stainless steel.

又,陽極電極320亦能夠利用光觸媒、半導體電極觸媒構成。即,能夠藉由照射光便可產生電動勢。如此地,對陽極電極照射太陽光等光而使其生成電動勢,便可將該電動勢利用為電解槽33的電解電位。Further, the anode electrode 320 can also be formed by a photocatalyst or a semiconductor electrode catalyst. That is, the electromotive force can be generated by irradiating light. In this manner, when the anode electrode is irradiated with light such as sunlight to generate an electromotive force, the electromotive force can be utilized as the electrolysis potential of the electrolytic cell 33.

在陰極電極319處,電解液中的二氧化碳等會被還原。二氧化碳溶解於水中,以溶存二氧化碳、碳酸氫離子的狀態存在於電解液中,並供應給陰極電極。通常由銅系以外的材料構成陰極電極時,會有生成較多氫、一氧化碳的傾向,幾乎沒有生成碳氫化合物。相對於此,由銅系材料構成陰極電極的情況,能較有效率生成碳氫化合物。At the cathode electrode 319, carbon dioxide or the like in the electrolytic solution is reduced. Carbon dioxide is dissolved in water, is present in the electrolyte in the state of dissolving carbon dioxide and hydrogen carbonate ions, and is supplied to the cathode electrode. When a cathode electrode is usually made of a material other than copper, a large amount of hydrogen and carbon monoxide tend to be formed, and almost no hydrocarbon is formed. On the other hand, when a cathode electrode is made of a copper-based material, hydrocarbons can be produced more efficiently.

本實施形態的陰極電極319是由本實施形態的電極觸媒構成。即,陰極電極319在本實施形態的銅系基材上形成有觸媒層。藉由使用此種陰極電極,便能夠效率佳的將二氧化碳分解還原,以高能量效率生成能使用為能量的有用的碳氫化合物。The cathode electrode 319 of the present embodiment is constituted by the electrode catalyst of the present embodiment. That is, the cathode electrode 319 has a catalyst layer formed on the copper base material of the present embodiment. By using such a cathode electrode, carbon dioxide can be efficiently decomposed and reduced, and a useful hydrocarbon which can be used as energy can be generated with high energy efficiency.

以上,針對本發明一實施形態進行說明,惟本發明並不侷限於上述實施形態,而是涵蓋本實施形態概念及申請專利範圍所包含的所有態樣,在本發明範圍內均可進行各種改變。 [實施例]The embodiments of the present invention have been described above, but the present invention is not limited to the above embodiments, but encompasses all aspects of the present embodiment and the scope of the claims, and various changes can be made within the scope of the present invention. . [Examples]

其次,為更明確本發明效果,針對實施例與比較例進行說明,惟本發明並不侷限於該等實施例。Next, the embodiments and comparative examples will be described in order to clarify the effects of the present invention, but the present invention is not limited to the embodiments.

(實施例1) 首先,基體是準備TPC銅板(古河電氣工業股份有限公司製、10mm×10mm×0.1mm)。其次,針對所準備的基體施行前處理,該項處理是使用清洗劑160(Meltex股份有限公司製)水溶液、施行陰極脫脂,經水洗後,使用稀硫酸水溶液(硫酸濃度10質量%)施行酸洗中和後,再施行水洗。 其次,準備苯并三唑(城北化學工業股份有限公司製)的2質量%水溶液(以下簡稱「2質量%BTA溶液」),將上述經前處理後的基體在2質量%BTA溶液中,依80℃、2分鐘的條件施行浸漬處理,然後以80℃乾燥,便製得在基體表面上設有擴散防止層的銅系基材。 然後,在所獲得銅系基材的擴散防止層上,依照國際公開第2014/192703號說明書所記載方法,以Cu顆粒為原料,利用磁控濺鍍生成銅奈米團簇離子,而獲得銅團簇電極觸媒。(Example 1) First, a base material was prepared by a TPC copper plate (manufactured by Furukawa Electric Co., Ltd., 10 mm × 10 mm × 0.1 mm). Next, pretreatment was carried out on the prepared substrate, which was subjected to cathode degreasing using an aqueous solution of a cleaning agent 160 (manufactured by Meltex Co., Ltd.), and washed with water, and then subjected to pickling using a dilute sulfuric acid aqueous solution (sulfuric acid concentration: 10% by mass). After neutralization, water washing is carried out. Next, a 2% by mass aqueous solution (hereinafter referred to as "2% by mass of BTA solution") of benzotriazole (manufactured by Seibu Chemical Industry Co., Ltd.) was prepared, and the pretreated substrate was placed in a 2% by mass BTA solution. The immersion treatment was carried out at 80 ° C for 2 minutes, and then dried at 80 ° C to obtain a copper-based substrate having a diffusion preventing layer on the surface of the substrate. Then, on the diffusion preventing layer of the obtained copper-based substrate, copper nanoparticle was used as a raw material to form copper nano-cluster ions by magnetron sputtering in accordance with the method described in the specification of International Publication No. 2014/192703, and copper was obtained. Cluster electrode catalyst.

(實施例2) 在實施例2中,除替代2質量%BTA溶液,改為使用苯并三唑(城北化學工業股份有限公司製)的0.5質量%水溶液(以下簡稱「0.5質量%BTA溶液」)之外,其餘均依照與實施例1同樣的方法製作銅系基材、及使用其的電極觸媒。(Example 2) In Example 2, instead of the 2% by mass BTA solution, a 0.5% by mass aqueous solution of benzotriazole (manufactured by Seongbuk Chemical Industry Co., Ltd.) (hereinafter referred to as "0.5 mass% BTA solution" was used instead. A copper-based substrate and an electrode catalyst using the same were produced in the same manner as in Example 1 except for the above.

(實施例3) 在實施例3中,除了將使用0.5質量%BTA溶液的浸漬處理以80℃乾燥包夾的方式、在施行期間重複施行複數次,直到獲得表1所示電雙層電容倒數為止之外,其餘均依照與實施例2同樣的方法製作銅系基材、及使用其的電極觸媒。(Example 3) In Example 3, except that the immersion treatment using a 0.5 mass% BTA solution was carried out by drying at 80 ° C, the application was repeated several times during the execution until the electric double layer capacitance countdown shown in Table 1 was obtained. A copper-based substrate and an electrode catalyst using the same were produced in the same manner as in Example 2 except for the above.

(實施例4~6) 在實施例4~6中,除了將使用2質量%BTA溶液的浸漬處理以80℃乾燥包夾的方式、在施行期間重複施行複數次,直到獲得表1所示電雙層電容倒數為止之外,其餘均依照與實施例1同樣的方法分別製作銅系基材、及使用其的電極觸媒。(Examples 4 to 6) In Examples 4 to 6, except that the immersion treatment using a 2% by mass BTA solution was carried out by drying at 80 ° C, the application was repeated several times during the execution until the electricity shown in Table 1 was obtained. A copper-based substrate and an electrode catalyst using the same were produced in the same manner as in Example 1 except that the double-layer capacitance was counted down.

(實施例7) 在實施例7中,除替代2質量%BTA溶液,改為使用甲苯基三唑(tolyltriazole)(城北化學工業股份有限公司製)的2.5質量%水溶液(以下簡稱「2.5質量%TTA溶液」),且將使用2.5質量%TTA溶液的浸漬處理條件設為60℃、2分鐘,並將後續的乾燥條件設為60℃之外,其餘均依照與實施例1同樣的方法製作銅系基材、及使用其的電極觸媒。(Example 7) In Example 7, a 2.5% by mass aqueous solution (hereinafter referred to as "2.5 mass%") of tolyltriazole (manufactured by Seongbuk Chemical Industry Co., Ltd.) was used instead of the 2% by mass BTA solution. The TTA solution was prepared in the same manner as in Example 1 except that the immersion treatment conditions using the 2.5% by mass TTA solution were 60 ° C for 2 minutes, and the subsequent drying conditions were changed to 60 ° C. A substrate, and an electrode catalyst using the same.

(實施例8) 在實施例8中,除替代2.5質量%TTA溶液,改為使用咪唑(城北化學工業股份有限公司製)的2.5質量%水溶液之外,其餘均依照與實施例7同樣的方法製作銅系基材、及使用其的電極觸媒。(Example 8) In the same manner as in Example 7, except that the 2.5% by mass TTA solution was used instead of the 2.5% by mass aqueous solution of imidazole (manufactured by Seongbuk Chemical Industry Co., Ltd.). A copper-based substrate and an electrode catalyst using the same are produced.

(實施例9) 在實施例9中,除替代2.5質量%TTA溶液,改為使用含有苯并三唑(城北化學工業股份有限公司製)1質量%與三唑(城北化學工業股份有限公司製)1.5質量%的水溶液之外,其餘均依照與實施例7同樣的方法製作銅系基材、及使用其的電極觸媒。(Example 9) In Example 9, in place of the 2.5% by mass TTA solution, 1% by mass of benzotriazole (manufactured by Seongbuk Chemical Industry Co., Ltd.) and triazole (manufactured by Seibu Chemical Industry Co., Ltd.) were used instead. A copper-based substrate and an electrode catalyst using the same were prepared in the same manner as in Example 7 except for the 1.5% by mass aqueous solution.

(比較例1) 在比較例1中,除沒有形成擴散防止層,而是在經前處理後的基體表面上直接蒸鍍銅團簇之外,其餘均依照與實施例1同樣的方法獲得電極觸媒。(Comparative Example 1) In Comparative Example 1, an electrode was obtained in the same manner as in Example 1 except that the diffusion preventing layer was not formed, but the copper cluster was directly vapor-deposited on the surface of the pretreated substrate. catalyst.

(比較例2) 在比較例2中,除替代2質量%BTA溶液,改為準備無機材料的二氧化矽微粉末之5質量%水溶液,並在該二氧化矽溶液中,於30℃、1分鐘的條件下,將上述經前處理後的基體施行浸漬處理,然後以80℃乾燥,而在基體表面上形成擴散防止層之外,其餘均依照與實施例1同樣的方法製作銅系基材、及使用其的電極觸媒。(Comparative Example 2) In Comparative Example 2, in place of the 2% by mass BTA solution, a 5 mass% aqueous solution of an inorganic material ceria fine powder was prepared, and in the ceria solution, at 30 ° C, 1 The copper substrate was produced in the same manner as in Example 1 except that the pretreated substrate was subjected to an immersion treatment under a minute condition, and then dried at 80 ° C to form a diffusion preventing layer on the surface of the substrate. And the electrode catalyst using it.

(實施例10) 在實施例10中,依照與實施例1同樣的方法製作銅系基材,再於所獲得銅系基材的擴散防止層上,依照國際公開第2014/192703號說明書所記載的方法,以鈀(Pd)顆粒為原料,利用磁控濺鍍生成Pd奈米團簇離子,而獲得Pd團簇電極觸媒。(Example 10) In Example 10, a copper-based substrate was produced in the same manner as in Example 1, and the diffusion-preventing layer of the obtained copper-based substrate was described in the specification of International Publication No. 2014/192703. The Pd (Pd) particles are used as raw materials, and Pd nano-cluster ions are generated by magnetron sputtering to obtain a Pd cluster electrode catalyst.

[評價] 使用上述實施例與比較例的銅系基材及電極觸媒,施行下述所示的特性評價。各特性的評價條件如下述。結果如表1與2所示。[Evaluation] Using the copper base material and the electrode catalyst of the above-described examples and comparative examples, the following characteristics were evaluated. The evaluation conditions of each characteristic are as follows. The results are shown in Tables 1 and 2.

[1] 電雙層電容之倒數值 針對實施例1~10與比較例2的銅系基材,測定擴散防止層形成前後的表面(擴散防止層形成前:前處理後的基體表面、擴散防止層形成後:所製作銅系基材的表面)之電雙層電容,並計算出倒數(1/C)。測定裝置是使用直讀式電雙層電容測定器(阻抗分析儀 C儀、日置電機股份有限公司製),電解液是使用0.1N硝酸鉀水溶液,依照階躍電流50μA/cm2 的條件,每個試料各測定2處(N=2),求取平均值。另外,針對比較例2,因測定極限的緣故,無法檢測電雙層電容。[1] Inversion of the electric double layer capacitor The surface of the copper base material of Examples 1 to 10 and Comparative Example 2 was measured before and after the formation of the diffusion preventing layer (before the formation of the diffusion preventing layer: the surface of the substrate after the pretreatment, and the diffusion prevention) After the layer was formed: the surface of the copper-based substrate, the electric double layer capacitance was calculated, and the reciprocal (1/C) was calculated. The measuring device was a direct-reading electric double-layer capacitance measuring device (impedance analyzer C instrument, manufactured by Hioki Electric Co., Ltd.), and the electrolytic solution was a 0.1 N potassium nitrate aqueous solution, and the conditions were in accordance with a step current of 50 μA/cm 2 . Each sample was measured at two places (N=2), and an average value was obtained. Further, in Comparative Example 2, the electric double layer capacitance could not be detected due to the measurement limit.

[2] 二氧化碳的還原測試 將實施例1~10、及比較例1與2的電極觸媒,使用作為二氧化碳的陰極還原裝置之陰極電極,施行二氧化碳的還原測試。二氧化碳的陰極還原裝置概略是如上述(圖5)所示。另外,電解液是使用50mM碳酸氫鉀水溶液,各槽316a、316b分別使用30mL。陽極電極320是使用在鈦基材上被覆白金的白金電極(田中貴金屬工業股份有限公司製)。電解是在電流2mA、電壓2.8V的條件施行60分鐘。又,電解中,利用供應管以10mL/分將二氧化碳氣體施行發泡(圖中箭頭A方向)。又,由陰極產生的氣體,利用分析管323收集(圖中箭頭B方向),再利用氣相色層分析儀進行分析。管柱是使用SUPELCO CARBOXEN 1010PLOT 30m×032mmID,檢測機是使用FID(Sigma-Aldrich社製)。[2] Reduction test of carbon dioxide The electrode catalysts of Examples 1 to 10 and Comparative Examples 1 and 2 were subjected to reduction test of carbon dioxide using a cathode electrode of a cathode reduction apparatus as carbon dioxide. The cathode reduction apparatus for carbon dioxide is roughly as shown above (Fig. 5). Further, a 50 mM aqueous solution of potassium hydrogencarbonate was used as the electrolytic solution, and 30 mL of each of the tanks 316a and 316b was used. The anode electrode 320 is a platinum electrode (manufactured by Tanaka Precious Metal Industries Co., Ltd.) which is coated with platinum on a titanium substrate. Electrolysis was carried out for 60 minutes under the conditions of a current of 2 mA and a voltage of 2.8V. Further, in the electrolysis, carbon dioxide gas was foamed at 10 mL/min by a supply pipe (in the direction of arrow A in the figure). Further, the gas generated by the cathode is collected by the analysis tube 323 (in the direction of the arrow B in the drawing), and analyzed by a gas chromatography layer analyzer. The column was SUPELCO CARBOXEN 1010 PLOT 30 m × 032 mm ID, and the detector was FID (manufactured by Sigma-Aldrich Co., Ltd.).

另外,陰極的反應是著眼於以下所示的甲烷、乙烯、乙烷生成。 CO2 +8H+ +8e- →CH4 +2H2 O CO2 +12H+ +12e- →C2 H4 +4H2 O CO2 +14H+ +14e- →C2 H6 +4H2 O 結果如表3所示。另外,本實施例中,將甲烷氣體濃度達40ppm以上、乙烯氣體濃度達30ppm以上、乙烷氣體濃度達10ppm以上者,評為合格水準。Further, the reaction of the cathode is focused on the formation of methane, ethylene, and ethane shown below. CO 2 +8H + +8e - →CH 4 +2H 2 O CO 2 +12H + +12e - →C 2 H 4 +4H 2 O CO 2 +14H + +14e - →C 2 H 6 +4H 2 O as shown in Table 3. Further, in the present embodiment, when the methane gas concentration is 40 ppm or more, the ethylene gas concentration is 30 ppm or more, and the ethane gas concentration is 10 ppm or more, the pass level is evaluated as a pass level.

[表1] [Table 1]

[3] 水的電解測試 利用上述二氧化碳的還原測試所使用的裝置,將電解液替代為離子交換水,施行水的電解測試。另外,本測試是將實施例1、2及6分別使用作為陰極電極的情況實施。又,電解的條件設為電流2mA、電壓2.8V、60分鐘。結果如表2所示。[3] Electrolytic test of water The electrolysis test of water was carried out by replacing the electrolyte with ion-exchanged water by using the apparatus used for the reduction test of carbon dioxide described above. In addition, this test was carried out using each of Examples 1, 2, and 6 as a cathode electrode. Further, the conditions of electrolysis were set to a current of 2 mA, a voltage of 2.8 V, and 60 minutes. The results are shown in Table 2.

[表2] [Table 2]

如表1所示,上述實施形態的實施例1~10之銅系基材,因為在由銅構成的基體上,直接形成由有機系材料構成的擴散防止層,因而將其使用為觸媒電極的基材時,確認到能夠獲得能對二氧化碳的陰極還原發揮良好觸媒性能的電極觸媒。又,如表2所示,使用本發明銅系基材(實施例1、2及6)的觸媒電極,即便在水的電解,仍可確認到發揮氫氣濃度達600ppm以上的良好觸媒特性。As shown in Table 1, in the copper-based substrate of Examples 1 to 10 of the above-described embodiment, since a diffusion preventing layer made of an organic material is directly formed on a substrate made of copper, it is used as a catalyst electrode. In the case of the substrate, it was confirmed that an electrode catalyst capable of exhibiting good catalytic performance against cathodic reduction of carbon dioxide was obtained. Further, as shown in Table 2, using the catalyst electrode of the copper-based substrate (Examples 1, 2, and 6) of the present invention, even when electrolyzed with water, it was confirmed that the catalyst concentration exhibiting a hydrogen gas concentration of 600 ppm or more was observed. .

相對於此,比較例1~2的銅系基材,因為在由銅構成的基體上並未設有由有機系材料構成的擴散防止層,因而使用其的電極觸媒,相較於本發明實施例1~10的電極觸媒,確認到二氧化碳的陰極還原時的觸媒活性差。理由可推測因為比較例1~2的銅系基材並沒有形成有機系材料的擴散防止層,因此構成基體的銅、與Cu團簇進行融合,導致作為團簇觸媒時的活性降低之緣故所致。On the other hand, in the copper base materials of Comparative Examples 1 and 2, since the diffusion preventing layer made of an organic material is not provided on the substrate made of copper, the electrode catalyst using the same is compared with the present invention. In the electrode catalysts of Examples 1 to 10, it was confirmed that the catalyst activity at the time of cathode reduction of carbon dioxide was poor. The reason is that the copper-based base material of Comparative Examples 1 and 2 does not form a diffusion preventing layer of an organic material, and therefore copper constituting the matrix and the Cu cluster are fused, resulting in a decrease in activity as a cluster catalyst. Caused.

1‧‧‧銅系基材1‧‧‧ copper substrate

11‧‧‧基體11‧‧‧ base

12‧‧‧氧化物層12‧‧‧Oxide layer

121‧‧‧氧化亞銅層121‧‧‧ cuprous oxide layer

122‧‧‧氧化銅層122‧‧‧ copper oxide layer

13‧‧‧擴散防止層13‧‧‧Diffusion prevention layer

3‧‧‧電解裝置3‧‧‧Electrolytic device

31‧‧‧電源31‧‧‧Power supply

33‧‧‧電解槽(CO2陰極還原測試裝置)33‧‧‧ Electrolytic cell (CO 2 cathode reduction test device)

35‧‧‧氣體回收裝置35‧‧‧ gas recovery unit

37‧‧‧電解液循環裝置37‧‧‧Electrolyte circulation device

39‧‧‧二氧化碳供應部39‧‧‧Carbon Supply Department

315a、315b‧‧‧電解液315a, 315b‧‧‧ electrolyte

316a、316b‧‧‧槽316a, 316b‧‧‧ slots

317‧‧‧金屬篩網317‧‧‧Metal screen

318‧‧‧參考電極(銀/氯化銀)318‧‧‧Reference electrode (silver/silver chloride)

319‧‧‧陰極電極319‧‧‧Cathode electrode

320‧‧‧陽極電極320‧‧‧Anode electrode

321‧‧‧陽離子交換膜321‧‧‧Cation exchange membrane

323‧‧‧分析管323‧‧‧Analysis tube

325‧‧‧供應管325‧‧‧Supply tube

327‧‧‧密封構件327‧‧‧ Sealing members

圖1是本發明之銅系基材一例的概略剖面圖。 圖2是本發明之銅系基材另一例的概略剖面圖。 圖3是使用本發明之銅系基材的觸媒一例概略剖面圖。 圖4是電解裝置的概略構造圖。 圖5是圖4所示電解裝置中,電解槽(二氧化碳還原槽、或水分解槽裝置)構造的概略剖面圖。Fig. 1 is a schematic cross-sectional view showing an example of a copper-based substrate of the present invention. Fig. 2 is a schematic cross-sectional view showing another example of the copper-based substrate of the present invention. Fig. 3 is a schematic cross-sectional view showing an example of a catalyst using the copper-based substrate of the present invention. 4 is a schematic structural view of an electrolysis device. Fig. 5 is a schematic cross-sectional view showing the structure of an electrolytic cell (carbon dioxide reduction tank or water decomposition tank device) in the electrolysis device shown in Fig. 4.

Claims (8)

一種電極基材,係具備基體與擴散防止層,其中,該基體係由銅或銅系合金形成;該擴散防止層係在該基體表面上直接或隔著氧化物層形成,且含有有機系材料。An electrode substrate comprising a substrate and a diffusion preventing layer, wherein the base system is formed of copper or a copper alloy; the diffusion preventing layer is formed on the surface of the substrate directly or via an oxide layer, and contains an organic material. . 如申請專利範圍第1項所述之電極基材,其中,係使用為供利用水電解生成氫、或將二氧化碳施行陰極還原而轉換為含碳物質之觸媒的構成基材之銅系基材。The electrode substrate according to the first aspect of the invention, wherein the copper substrate is a constituent substrate which is a catalyst for converting hydrogen into a catalyst containing a carbonaceous material by electrolysis of water to produce hydrogen or catalytic reduction of carbon dioxide. . 如申請專利範圍第1或2項所述之電極基材,其中,上述有機系材料係唑類化合物。The electrode substrate according to claim 1 or 2, wherein the organic material is an azole compound. 如申請專利範圍第1至3項中任一項所述之電極基材,其中,電雙層電容之倒數值係0.3~5cm2 /μF。The electrode substrate according to any one of claims 1 to 3, wherein the electric double layer capacitance has a reversed value of 0.3 to 5 cm 2 /μF. 一種電極觸媒,係具備: 電極基材,係如申請專利範圍第1至4項中任一項所述之電極基材;以及 觸媒層,係形成於該電極基材的上述擴散防止層,含有金屬團簇的觸媒材料。An electrode substrate comprising: an electrode substrate according to any one of claims 1 to 4; and a catalyst layer formed on the diffusion preventing layer of the electrode substrate a catalyst material containing a metal cluster. 如申請專利範圍第5項所述之電極觸媒,其中,上述金屬團簇係由銅或銅系合金形成的團簇。The electrode catalyst according to claim 5, wherein the metal cluster is a cluster formed of copper or a copper alloy. 一種電解裝置,係具備如申請專利範圍第1至4項中任一項所述之電極基材、或如申請專利範圍第5或6項所述之電極觸媒。An electrolysis device comprising the electrode substrate according to any one of claims 1 to 4, or the electrode catalyst according to claim 5 or 6. 一種電解裝置,係具備有: 陰極,係具備如申請專利範圍第1至4項中任一項所述之銅系基材; 陰極電解液; 陽極; 上述陽極電解液;以及 離子交換膜,係設置於上述陰極與上述陽極之間。An electrolysis device comprising: a cathode comprising the copper-based substrate according to any one of claims 1 to 4; a catholyte; an anode; the anolyte; and an ion exchange membrane It is disposed between the cathode and the anode.
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