TW201840675A - Resin composition for printed wiring board, prepreg, resin sheet, laminate, metal foil-clad laminate, printed wiring board, and multi-layered printed wiring board - Google Patents

Resin composition for printed wiring board, prepreg, resin sheet, laminate, metal foil-clad laminate, printed wiring board, and multi-layered printed wiring board Download PDF

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TW201840675A
TW201840675A TW106146093A TW106146093A TW201840675A TW 201840675 A TW201840675 A TW 201840675A TW 106146093 A TW106146093 A TW 106146093A TW 106146093 A TW106146093 A TW 106146093A TW 201840675 A TW201840675 A TW 201840675A
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printed circuit
circuit board
resin composition
compound
resin
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TWI798194B (en
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久保孝史
濱嶌知樹
山口翔平
伊藤環
志賀英祐
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日商三菱瓦斯化學股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/02Layered products essentially comprising sheet glass, or glass, slag, or like fibres in the form of fibres or filaments
    • B32B17/04Layered products essentially comprising sheet glass, or glass, slag, or like fibres in the form of fibres or filaments bonded with or embedded in a plastic substance
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B5/00Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
    • B32B5/22Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
    • B32B5/24Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B5/00Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
    • B32B5/22Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
    • B32B5/24Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
    • B32B5/28Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer impregnated with or embedded in a plastic substance
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/4007Curing agents not provided for by the groups C08G59/42 - C08G59/66
    • C08G59/4014Nitrogen containing compounds
    • C08G59/4028Isocyanates; Thioisocyanates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • C08G59/621Phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/04Reinforcing macromolecular compounds with loose or coherent fibrous material
    • C08J5/0405Reinforcing macromolecular compounds with loose or coherent fibrous material with inorganic fibres
    • C08J5/043Reinforcing macromolecular compounds with loose or coherent fibrous material with inorganic fibres with glass fibres
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/13Phenols; Phenolates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00Use of ingredients characterised by shape
    • C08K7/02Fibres or whiskers
    • C08K7/04Fibres or whiskers inorganic
    • C08K7/14Glass
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L65/00Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/02Polyamines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0366Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Reinforced Plastic Materials (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

This invention aims to provide a resin composition for printed wiring board, a prepreg, a resin sheet, a laminate, a metal foil-clad laminate, a printed wiring board and a multi-layered printed wiring board without clear glass-transition temperature (Tg-less), and capable of sufficiently reducing the warpage of printed wiring board and, particularly, the warpage of multi-layered coreless substrate (achieving the object of low warpage). To this end, the resin composition according to this invention includes an allylphenol compound (A), a maleimide compound (B), a cyanate ester compound (C) and/or an epoxy compound (D). Besides, the content of allylphenol compound (A) is 10 to 50 parts by mass with respect to 100 parts by mass of the resin solid content in the resin composition for printed wiring board, and the content of maleimide compound (B) is 40 to 80 parts by mass with respect to 100 parts by mass of the resin solid content in the resin composition for printed wiring board.

Description

印刷電路板用樹脂組成物、預浸體、樹脂片、疊層板、覆金屬箔疊層板、印刷電路板、及多層印刷電路板Resin composition for printed circuit board, prepreg, resin sheet, laminated board, metal foil-clad laminated board, printed circuit board, and multilayer printed circuit board

本發明係關於印刷電路板用樹脂組成物、預浸體、樹脂片、疊層板、覆金屬箔疊層板、印刷電路板、及多層印刷電路板。The present invention relates to a resin composition for a printed circuit board, a prepreg, a resin sheet, a laminated board, a metal foil-clad laminated board, a printed circuit board, and a multilayer printed circuit board.

近年來在電子設備、通訊器材、個人電腦等廣泛使用的半導體封裝體之高功能化、小型化進步,伴隨於此,半導體封裝體用之各零件之高整合化、高密度安裝化近年日益加速。伴隨於此,對於半導體封裝體用之印刷電路板要求的各種特性變得越來越嚴格。對於該印刷電路板要求的特性,例如:低吸水性、吸濕耐熱性、阻燃性、低介電常數、低介電正切、低熱膨脹率、耐熱性、耐藥品性、高鍍敷剝離強度等。又,除此以外,抑制印刷電路板翹曲,尤其抑制多層無核心基板之翹曲(達成低翹曲),近來成為重要課題,已採取了各種各樣的對策。In recent years, semiconductor packages that have been widely used in electronic equipment, communication equipment, personal computers, and the like have advanced in function and miniaturization. With this, the high integration and high-density mounting of various components used in semiconductor packages have accelerated in recent years. . Along with this, various characteristics required for a printed circuit board for a semiconductor package have become stricter. For the characteristics required for this printed circuit board, for example: low water absorption, moisture absorption heat resistance, flame retardancy, low dielectric constant, low dielectric tangent, low thermal expansion coefficient, heat resistance, chemical resistance, high plating peel strength Wait. In addition, suppressing warpage of printed circuit boards, especially suppressing warpage of multilayer multilayer coreless substrates (to achieve low warpage) has recently become an important issue, and various countermeasures have been taken.

作為其中一對策,可列舉印刷電路板中使用的絕緣層之低熱膨脹化。其係藉由使印刷電路板之熱膨脹率接近半導體元件之熱膨脹率以抑制翹曲的方法,現在已積極地採用(例如參照專利文獻1~3)。One of the countermeasures is to reduce the thermal expansion of the insulating layer used in the printed wiring board. This is a method of suppressing warpage by making the thermal expansion coefficient of a printed circuit board close to the thermal expansion coefficient of a semiconductor device, and has been actively adopted (for example, refer to Patent Documents 1 to 3).

作為抑制半導體塑膠封裝體之翹曲之方法而言,除了印刷電路板的低熱膨脹化以外,尚有人探討提高疊層板之剛性(高剛性化)、提高疊層板之玻璃轉移溫度(高Tg化)(例如參照專利文獻4及5)。 [先前技術文獻] [專利文獻]As a method for suppressing the warpage of semiconductor plastic packages, in addition to the low thermal expansion of printed circuit boards, there have been discussions to improve the rigidity (high rigidity) of the laminated board and increase the glass transition temperature (high Tg of the laminated board). (See, for example, Patent Documents 4 and 5). [Prior Art Literature] [Patent Literature]

專利文獻1:日本特開2013-216884號公報 專利文獻2:日本專利第3173332號公報 專利文獻3:日本特開2009-035728號公報 專利文獻4:日本特開2013-001807號公報 專利文獻5:日本特開2011-178992號公報Patent Document 1: Japanese Patent Application Publication No. 2013-216884 Patent Document 2: Japanese Patent Application Publication No. 3173332 Patent Document 3: Japanese Patent Application Publication No. 2009-035728 Patent Document 4: Japanese Patent Application Publication No. 2013-001807 Patent Document 5: Japanese Patent Laid-Open No. 2011-178992

但是依照本案發明人等的詳細研究,即使是上述習知技術仍無法充分減小印刷電路板尤其多層無核心基板之翹曲,希望更進一步的改良。However, according to the detailed research by the inventors of the present case, even the above-mentioned conventional technologies are still unable to sufficiently reduce the warpage of printed circuit boards, especially multilayer non-core substrates, and further improvements are desired.

亦即,本發明的目的為提供一種印刷電路板用樹脂組成物、及使用了該印刷電路板用樹脂組成物之預浸體、樹脂片、疊層板、覆金屬箔疊層板、印刷電路板、及多層印刷電路板,其不存在明確的玻璃轉移溫度(Tg)(亦即無Tg),且能夠達成印刷電路板尤其多層無核心基板之翹曲的充分減小(達成低翹曲)。That is, an object of the present invention is to provide a resin composition for a printed circuit board, and a prepreg, a resin sheet, a laminate, a metal-clad laminate, and a printed circuit using the resin composition for the printed circuit board. Boards and multilayer printed circuit boards, which do not have a clear glass transition temperature (Tg) (that is, no Tg), and can achieve sufficient reduction of warpage of printed circuit boards, especially multilayer non-core substrates (achieving low warpage) .

本案發明人等為了解決上述課題而努力,鑽研結果發現關於以往半導體塑膠封裝體用之印刷電路板之翹曲行為,雖據認為能達成預浸體之硬化物中有更大熱貯藏彈性模數、及更高彈性模數維持率之樹脂組成物係有效,但不一定限於如此。再者,本案發明人等努力研究的結果,發現藉由除了使用烯丙基苯酚化合物及馬來醯亞胺化合物更使用氰酸酯化合物及/或環氧化合物,則可解決上述問題,乃完成本發明。The inventors of this case worked hard to solve the above-mentioned problems. As a result of research, it was found that the warpage behavior of printed circuit boards used in conventional semiconductor plastic packages has a greater thermal storage elastic modulus in the hardened material of the prepreg. Resin compositions having a high modulus of elasticity and higher are effective, but they are not necessarily limited to this. In addition, as a result of intensive research by the inventors of the present case, it was found that the use of a cyanate compound and / or an epoxy compound in addition to the allylphenol compound and the maleimide compound can solve the above-mentioned problems. this invention.

亦即,本發明如下。 [1] 一種印刷電路板用樹脂組成物,含有 烯丙基苯酚化合物(A)、 馬來醯亞胺化合物(B)、及 氰酸酯化合物(C)及/或環氧化合物(D), 相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該烯丙基苯酚化合物(A)之含量為10~50質量份, 相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該馬來醯亞胺化合物(B)之含量為40~80質量份。That is, the present invention is as follows. [1] a resin composition for a printed circuit board, comprising an allylphenol compound (A), a maleimide compound (B), and a cyanate compound (C) and / or an epoxy compound (D), The content of the allylphenol compound (A) is 10 to 50 parts by mass with respect to 100 parts by mass of the resin solid content in the resin composition for printed circuit boards, and the resin in the resin composition for printed circuit boards The solid content is 100 parts by mass, and the content of the maleimide compound (B) is 40 to 80 parts by mass.

[2] 如[1]之印刷電路板用樹脂組成物,其中, 相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該氰酸酯化合物(C)及該環氧化合物(D)之合計含量為5~45質量份。[2] The resin composition for a printed circuit board according to [1], wherein the cyanate ester compound (C) and the epoxy compound are 100 parts by mass of a resin solid content in the resin composition for a printed circuit board. The total content of (D) is 5 to 45 parts by mass.

[3] 如[1]或[2]之印刷電路板用樹脂組成物,其中, 相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該氰酸酯化合物(C)之含量為0~25質量份。[3] The resin composition for a printed circuit board according to [1] or [2], wherein the cyanate ester compound (C) is 100 parts by mass of the resin solid content in the resin composition for the printed circuit board. The content is 0 to 25 parts by mass.

[4] 如[1]或[2]之印刷電路板用樹脂組成物,其中, 相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該環氧化合物(D)之含量為0~25質量份。[4] The resin composition for a printed circuit board according to [1] or [2], wherein the content of the epoxy compound (D) is 100 parts by mass based on 100 parts by mass of the resin solid content in the resin composition for a printed circuit board. It is 0 to 25 parts by mass.

[5] 如[1]~[4]中任一項印刷電路板用樹脂組成物,更含有填充材(E)。[5] The resin composition for a printed wiring board according to any one of [1] to [4], further containing a filler (E).

[6] 如[5]之印刷電路板用樹脂組成物,其中,該填充材(E)係選自於由二氧化矽、氧化鋁、及軟水鋁石構成之群組中之至少1種。[6] The resin composition for a printed circuit board according to [5], wherein the filler (E) is at least one selected from the group consisting of silica, alumina, and boehmite.

[7] 如[5]或[6]之印刷電路板用樹脂組成物,其中,相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該填充材(E)之含量為120~250質量份。[7] The resin composition for a printed circuit board according to [5] or [6], wherein the content of the filler (E) is 100 parts by mass based on 100 parts by mass of the resin solid content in the resin composition for a printed circuit board. 120 to 250 parts by mass.

[8] 如[1]~[7]中任一項之印刷電路板用樹脂組成物,其中,該烯丙基苯酚化合物(A)包括下式(I)~(III)中之任一者表示之化合物:[8] The resin composition for a printed circuit board according to any one of [1] to [7], wherein the allylphenol compound (A) includes any one of the following formulae (I) to (III) Compounds represented:

【化1】 [Chemical 1]

式(I)中,R1 及R2 各自獨立地表示氫原子、甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、或苯基;In formula (I), R 1 and R 2 each independently represent a hydrogen atom, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, Or phenyl

【化2】 [Chemical 2]

【化3】 [Chemical 3]

[9] 如[1]~[8]中任一項之印刷電路板用樹脂組成物,其中,該馬來醯亞胺化合物(B)包括選自於由雙(4-馬來醯亞胺苯基)甲烷、2,2-雙{4-(4-馬來醯亞胺苯氧基)-苯基}丙烷、雙(3-乙基-5-甲基-4-馬來醯亞胺苯基)甲烷及下式(1)表示之馬來醯亞胺化合物構成之群組中之至少1種化合物;[9] The resin composition for a printed circuit board according to any one of [1] to [8], wherein the maleimide compound (B) is selected from the group consisting of bis (4-maleimide) Phenyl) methane, 2,2-bis {4- (4-maleimide phenoxy) -phenyl} propane, bis (3-ethyl-5-methyl-4-maleimide At least one compound in the group consisting of phenyl) methane and a maleimide compound represented by the following formula (1);

【化4】 [Chemical 4]

式(1)中,R5 各自獨立地表示氫原子或甲基,n1 表示1以上之整數。In the formula (1), R 5 each independently represents a hydrogen atom or a methyl group, and n 1 represents an integer of 1 or more.

[10] 如[1]~[9]中任一項之印刷電路板用樹脂組成物,其中,該氰酸酯化合物(C)包括下式(2)及/或(3)表示之化合物;[10] The resin composition for a printed circuit board according to any one of [1] to [9], wherein the cyanate ester compound (C) includes a compound represented by the following formulae (2) and / or (3);

【化5】 [Chemical 5]

式(2)中,R6 各自獨立地表示氫原子或甲基,n2 表示1以上之整數;In formula (2), R 6 each independently represents a hydrogen atom or a methyl group, and n 2 represents an integer of 1 or more;

【化6】 [Chemical 6]

式(3)中,R7 各自獨立地表示氫原子或甲基,n3 表示1以上之整數。In the formula (3), R 7 each independently represents a hydrogen atom or a methyl group, and n 3 represents an integer of 1 or more.

[11] 如[1]~[10]中任一項之印刷電路板用樹脂組成物,其中, 使含有該印刷電路板用樹脂組成物與基材之預浸體於230℃及100分鐘之條件熱硬化而獲得之硬化物符合下式(4)~(8)表示之關於機械特性之物性參數之數値範圍; E’(200℃)/E’(30℃)≦0.90…(4) E’(260℃)/E’(30℃)≦0.85…(5) E’(330℃)/E’(30℃)≦0.80…(6) E”max/E’(30℃)≦3.0%…(7) E”min/E’(30℃)≧0.5%…(8) 各式中, E’表示該硬化物在括弧內所示之溫度之貯藏彈性模數, E”max表示該硬化物在30℃至330℃之溫度範圍之損失彈性模數之最大値,E”min表示該硬化物在30℃至330℃之溫度範圍之損失彈性模數之最小値。[11] The resin composition for a printed circuit board according to any one of [1] to [10], wherein the prepreg containing the resin composition for a printed circuit board and a substrate is heated at 230 ° C. for 100 minutes. The hardened material obtained under the condition of thermal hardening conforms to the range of the physical property parameters of the mechanical properties represented by the following formulas (4) to (8); E '(200 ℃) / E' (30 ℃) ≦ 0.90… (4) E '(260 ℃) / E' (30 ℃) ≦ 0.85… (5) E '(330 ℃) / E' (30 ℃) ≦ 0.80… (6) E ”max / E '(30 ℃) ≦ 3.0 %… (7) E ”min / E '(30 ℃) ≧ 0.5%… (8) In each formula, E ′ represents the storage elastic modulus of the hardened material at the temperature shown in the brackets, and E ″ max represents the The maximum loss elastic modulus of the hardened material in the temperature range of 30 ° C to 330 ° C, E "min represents the minimum loss elastic modulus of the hardened material in the temperature range of 30 ° C to 330 ° C.

[12] 一種預浸體,具有: 基材;及 含浸或塗佈於該基材之如[1]~[11]中任一項之印刷電路板用樹脂組成物。[12] A prepreg, comprising: a substrate; and the resin composition for a printed circuit board according to any one of [1] to [11] impregnated or coated on the substrate.

[13] 如[12]之預浸體,其中,該基材係以選自於由E玻璃纖維、D玻璃纖維、S玻璃纖維、T玻璃纖維、Q玻璃纖維、L玻璃纖維、NE玻璃纖維、HME玻璃纖維、及有機纖維構成之群組中之1種以上之纖維構成。[13] The prepreg according to [12], wherein the substrate is selected from the group consisting of E glass fiber, D glass fiber, S glass fiber, T glass fiber, Q glass fiber, L glass fiber, and NE glass fiber. , HME glass fibers, and organic fibers in a group consisting of one or more fibers.

[14] 一種樹脂片,具有: 支持體;及 疊層在該支持體之單面或兩面的如[1]~[11]中任一項之印刷電路板用樹脂組成物。[14] A resin sheet comprising: a support; and the resin composition for a printed circuit board according to any one of [1] to [11] laminated on one or both sides of the support.

[15] 一種疊層板,具有疊層了至少1片以上之選自由如[12]及[13]之預浸體、及如[14]之樹脂片構成之群組中之至少1種。[15] A laminated board comprising at least one selected from the group consisting of a prepreg such as [12] and [13], and a resin sheet such as [14] in which at least one sheet is laminated.

[16] 一種覆金屬箔疊層板,具有: 疊層了至少1片以上之選自由如[12]及[13]之預浸體、及如[14]之樹脂片構成之群組中之至少1種;及 配置在選自由該預浸體及該樹脂片構成之群組中之至少1種之單面或兩面之金屬箔。[16] A metal foil-clad laminate having: at least one sheet laminated on the sheet selected from the group consisting of a prepreg such as [12] and [13], and a resin sheet such as [14] At least one type; and a single-sided or double-sided metal foil arranged in at least one selected from the group consisting of the prepreg and the resin sheet.

[17] 一種印刷電路板,具有絕緣層,以及形成在該絕緣層之表面之導體層; 該絕緣層含有如[1]~[11]任一項之印刷電路板用樹脂組成物。[17] A printed circuit board having an insulating layer and a conductor layer formed on a surface of the insulating layer; the insulating layer containing the resin composition for a printed circuit board according to any one of [1] to [11].

[18] 一種多層印刷電路板,具有多數絕緣層及多數導體層, 該多數絕緣層係由第1絕緣層及第2絕緣層構成,該第1絕緣層以疊層了至少1片以上之選自由如[12]及[13]之預浸體、及如[14]之樹脂片構成之群組中之至少1種形成,該第2絕緣層以在該第1絕緣層之單面方向疊層了至少1片以上之選自由如[12]及[13]之預浸體、及如[14]之樹脂片構成之群組中之至少1種選自由如[12]及[13]之預浸體、及如[14]之樹脂片構成之群組中之至少1種形成;及 該多數導體層係由第1導體層及第2導體層構成,該第1導體層配置在該多數絕緣層的各絕緣層之間,該第2導體層配置在該多數絕緣層的最外層之表面。 [發明之效果][18] A multilayer printed circuit board having a plurality of insulating layers and a plurality of conductor layers, wherein the plurality of insulating layers are composed of a first insulating layer and a second insulating layer, and the first insulating layer is selected by laminating at least one piece or more It is free to form at least one of the group consisting of the prepregs such as [12] and [13], and the resin sheet such as [14], and the second insulating layer is stacked on one side of the first insulating layer. At least one selected from the group consisting of prepregs such as [12] and [13], and resin sheets such as [14], having at least one layer laminated thereon, selected from the group consisting of [12] and [13] The prepreg and at least one of the group consisting of the resin sheet of [14] are formed; and the plurality of conductor layers are composed of a first conductor layer and a second conductor layer, and the first conductor layer is disposed in the majority Between the insulating layers of the insulating layer, the second conductor layer is disposed on the surface of the outermost layer of the plurality of insulating layers. [Effect of the invention]

依照本發明,能夠提供不存在明確的玻璃轉移溫度(無Tg)且能將印刷電路板尤其多層無核心基板之翹曲充分減小(達成低翹曲)的印刷電路板用樹脂組成物、及使用了該印刷電路板用樹脂組成物之預浸體、樹脂片、疊層板、覆金屬箔疊層板、印刷電路板、及多層印刷電路板。According to the present invention, it is possible to provide a resin composition for a printed circuit board that does not have a clear glass transition temperature (no Tg), and that can sufficiently reduce warpage of printed circuit boards, especially multilayer non-core substrates (to achieve low warpage), and A prepreg, a resin sheet, a laminate, a metal foil-clad laminate, a printed circuit board, and a multilayer printed circuit board using the resin composition for a printed circuit board are used.

以下針對本實施方式(以下稱為「本實施形態」)詳細説明,但本發明不限於此,在不脫離其要旨的範圍內可以有各種各樣的變形。又,本實施形態中,「樹脂固體成分」,若未特別指明,則指印刷電路板用樹脂組成物中之溶劑、及填充材以外的成分,「樹脂固體成分100質量份」,係指印刷電路板用樹脂組成物中之溶劑、及填充材以外的成分之合計為100質量份。Hereinafter, this embodiment (hereinafter referred to as "this embodiment") will be described in detail, but the present invention is not limited to this, and various modifications can be made without departing from the gist thereof. In this embodiment, "resin solid content" means a component other than a solvent and a filler in a resin composition for a printed circuit board unless otherwise specified, and "100 parts by mass of a resin solid content" means printing. The total of the solvent in the resin composition for a circuit board and components other than the filler is 100 parts by mass.

[印刷電路板用樹脂組成物] 本實施形態之印刷電路板用樹脂組成物含有烯丙基苯酚化合物(A)、馬來醯亞胺化合物(B)、以及氰酸酯化合物(C)及/或環氧樹脂(D)。印刷電路板用樹脂組成物藉由含有如此的組成,例如使預浸體硬化而成之硬化物中,不存在明確的玻璃轉移溫度(無Tg)且有能充分減小印刷電路板尤其多層無核心基板之翹(達成低翹曲)之傾向。[Resin composition for printed wiring board] The resin composition for printed wiring board of this embodiment contains an allylphenol compound (A), a maleimide compound (B), a cyanate compound (C), and / Or epoxy (D). The resin composition for a printed circuit board contains such a composition, for example, a hardened material obtained by hardening a prepreg. There is no clear glass transition temperature (no Tg), and a printed circuit board can be sufficiently reduced. The tendency of the core substrate to warp (to achieve low warpage).

[烯丙基苯酚化合物(A)] 烯丙基苯酚化合物(A)只要是在芳香環至少分別直接鍵結了1個以上烯丙基及羥基的化合物即不特別限定,例如:芳香環之氫原子取代成烯丙基的雙酚。該雙酚不特別限定,例如:雙酚A、雙酚AP、雙酚AF、雙酚B、雙酚BP、雙酚C、雙酚C、雙酚E、雙酚F、雙酚G、雙酚M、雙酚S、雙酚P、雙酚PH、雙酚TMC、雙酚Z。其中又以雙酚A較理想,烯丙基苯酚化合物(A)宜為二烯丙基雙酚A更佳,下式(I)或式(II)表示之化合物更理想。藉由使用如此的烯丙基苯酚化合物(A)之,有彎曲強度、彎曲彈性模數、熱膨脹率、熱傳導率、及銅箔剝離強度更好的傾向。[Allylphenol compound (A)] The allylphenol compound (A) is not particularly limited as long as it is a compound having at least one allyl group and a hydroxyl group directly bonded to the aromatic ring, for example, hydrogen of the aromatic ring Atomic substituted bisphenols. The bisphenol is not particularly limited, for example: bisphenol A, bisphenol AP, bisphenol AF, bisphenol B, bisphenol BP, bisphenol C, bisphenol C, bisphenol E, bisphenol F, bisphenol G, bis Phenol M, Bisphenol S, Bisphenol P, Bisphenol PH, Bisphenol TMC, Bisphenol Z. Among them, bisphenol A is more preferable, and the allylphenol compound (A) is more preferably diallyl bisphenol A, and the compound represented by the following formula (I) or formula (II) is more preferable. By using such an allylphenol compound (A), the bending strength, the bending elastic modulus, the thermal expansion coefficient, the thermal conductivity, and the copper foil peeling strength tend to be better.

【化7】 [Chemical 7]

在此,式(I)中,R1 及R2 各自獨立地表示氫原子、甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、或苯基。Here, in Formula (I), R 1 and R 2 each independently represent a hydrogen atom, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third Butyl, or phenyl.

【化8】 [Chemical 8]

【化9】 [Chemical 9]

在此,式(I)至(III)中,烯丙基及羥基各自1個逐一地獨立地鍵結於苯環之Bis鍵結部以外的位置。Here, in the formulae (I) to (III), the allyl group and the hydroxyl group are each independently bonded to a position other than the Bis bonding portion of the benzene ring.

又,烯丙基苯酚化合物(A)也可更具有烯丙基及羥基以外之反應性官能基。又,也可為直接鍵結於芳香環的羥基經烯丙基及羥基以外之反應性官能基改性而得的化合物。烯丙基及羥基以外之反應性官能基不特別限定,例如:氰酸酯基(cyanate ester group)、環氧基、胺基、異氰酸酯基、環氧丙基、及磷酸基。藉由有這些基,會有彎曲強度、彎曲彈性模數、熱膨脹率、及熱傳導率更好的傾向。烯丙基苯酚化合物(A)可以單獨使用1種也可以併用2種以上。併用2種以上時,烯丙基及羥基以外之反應性官能基可相同也可不同。The allylphenol compound (A) may further have a reactive functional group other than an allyl group and a hydroxyl group. Moreover, it may be a compound obtained by modifying a hydroxyl group directly bonded to an aromatic ring with a reactive functional group other than an allyl group and a hydroxyl group. Reactive functional groups other than allyl and hydroxyl are not particularly limited, and examples thereof include a cyanate ester group, an epoxy group, an amine group, an isocyanate group, an epoxy group, and a phosphate group. These bases tend to have better bending strength, bending elastic modulus, thermal expansion coefficient, and thermal conductivity. Allylphenol compound (A) may be used individually by 1 type, and may use 2 or more types together. When two or more types are used in combination, reactive functional groups other than allyl and hydroxyl groups may be the same or different.

烯丙基苯酚化合物(A)1分子中之烯丙基之基數較佳為1~5,更佳為2~4,又更佳為2。烯丙基苯酚化合物(A)1分子中之烯丙基之基數藉由為上述範圍內,會有彎曲強度、彎曲彈性模數、及銅箔剝離強度更好且熱膨脹係數低、熱傳導率優異的傾向。The number of allyl groups in one molecule of the allylphenol compound (A) is preferably 1 to 5, more preferably 2 to 4, and even more preferably 2. When the number of allyl groups in one molecule of the allylphenol compound (A) is within the above range, the bending strength, the bending elastic modulus, and the copper foil peeling strength are better, the thermal expansion coefficient is low, and the thermal conductivity is excellent. tendency.

烯丙基苯酚化合物(A)具有直接鍵結在芳香環的羥基時,烯丙基苯酚化合物(A)1分子中之該羥基之基數較佳為1~5,更佳為2~4,又更佳為2。烯丙基苯酚化合物(A)1分子中之該羥基之基數藉由為上述範圍內,會有彎曲強度、彎曲彈性模數、及銅箔剝離強度更好,熱膨脹係數低、熱傳導率優異之傾向。When the allylphenol compound (A) has a hydroxyl group directly bonded to an aromatic ring, the number of the hydroxyl groups in one molecule of the allylphenol compound (A) is preferably 1 to 5, more preferably 2 to 4, and More preferably, it is 2. When the number of the hydroxyl groups in the molecule of the allylphenol compound (A) is within the above range, the bending strength, the bending elastic modulus, and the copper foil peeling strength are better, the thermal expansion coefficient is low, and the thermal conductivity tends to be excellent. .

烯丙基苯酚化合物(A)具有上述烯丙基及羥基以外之反應性官能基時,烯丙基苯酚化合物(A)1分子中之烯丙基及羥基以外之反應性官能基數較佳為1~5,更佳為2~4,又更佳為2。烯丙基苯酚化合物(A)1分子中之烯丙基及羥基以外之反應性官能基數藉由為上述範圍內,會有彎曲強度、彎曲彈性模數、及銅箔剝離強度更好、熱膨脹係數低、熱傳導率優異之傾向。When the allylphenol compound (A) has a reactive functional group other than the allyl group and the hydroxyl group, the number of reactive functional groups other than the allyl group and the hydroxyl group in one molecule of the allylphenol compound (A) is preferably 1 ~ 5, more preferably 2 to 4, and even more preferably 2. The number of reactive functional groups other than the allyl group and the hydroxyl group in the molecule of the allylphenol compound (A) is within the above range, and the flexural strength, flexural modulus of elasticity, and copper foil peel strength are better, and the coefficient of thermal expansion It tends to be low and excellent in thermal conductivity.

烯丙基苯酚化合物(A)之含量,相對於印刷電路板用樹脂組成物中之樹脂固體成分100質量份為10~50質量份,較佳為10~35質量份,更佳為15~30質量份。烯丙基苯酚化合物(A)之含量藉由為上述範圍內,有獲得之硬化物之柔軟性、彎曲強度、彎曲彈性模數、熱膨脹率、熱傳導率、及銅箔剝離強度更好的傾向。The content of the allylphenol compound (A) is 10 to 50 parts by mass, preferably 10 to 35 parts by mass, and more preferably 15 to 30 parts by mass based on 100 parts by mass of the resin solid content in the resin composition for a printed circuit board. Parts by mass. When the content of the allylphenol compound (A) is within the above range, the softness, flexural strength, flexural modulus of elasticity, thermal expansion coefficient, thermal conductivity, and copper foil peeling strength of the obtained cured product tend to be better.

[馬來醯亞胺化合物(B)] 馬來醯亞胺化合物(B)只要是在分子中有1個以上之馬來醯亞胺基之化合物即不特別限定,例如:N-苯基馬來醯亞胺、N-羥基苯基馬來醯亞胺、雙(4-馬來醯亞胺苯基)甲烷、2,2-雙{4-(4-馬來醯亞胺苯氧基)-苯基}丙烷、雙(3,5-二甲基-4-馬來醯亞胺苯基)甲烷、雙(3-乙基-5-甲基-4-馬來醯亞胺苯基)甲烷、雙(3,5-二乙基-4-馬來醯亞胺苯基)甲烷、下式(1)表示之馬來醯亞胺化合物、此等馬來醯亞胺化合物之預聚物、或馬來醯亞胺化合物與胺化合物之預聚物。其中又以選自由雙(4-馬來醯亞胺苯基)甲烷、2,2-雙{4-(4-馬來醯亞胺苯氧基)-苯基}丙烷、雙(3-乙基-5-甲基-4-馬來醯亞胺苯基)甲烷、及下式(1)表示之馬來醯亞胺化合物構成之群組中之至少1種較理想,考量容易獲得不存在明確的玻璃轉移溫度(無Tg)的樹脂組成物的觀點,下式(1)表示之馬來醯亞胺化合物尤佳。藉由含有上述馬來醯亞胺化合物(B),會有獲得之硬化物之熱膨脹率更低,且耐熱性、玻璃轉移溫度(Tg)更好的傾向。馬來醯亞胺化合物(B)可以單獨使用1種也可以併用2種以上。[Maleimide compound (B)] The maleimide compound (B) is not particularly limited as long as it is a compound having at least one maleimide group in the molecule, for example: N-phenyl horse Laimide, N-hydroxyphenylmaleimide, bis (4-maleimidephenyl) methane, 2,2-bis {4- (4-maleimidephenoxy) -Phenyl} propane, bis (3,5-dimethyl-4-maleimidephenyl) methane, bis (3-ethyl-5-methyl-4-maleimidephenyl) Methane, bis (3,5-diethyl-4-maleimidephenyl) methane, maleimide compounds represented by the following formula (1), prepolymers of these maleimide compounds , Or a prepolymer of a maleimidine imine compound and an amine compound. Among them, it is selected from the group consisting of bis (4-maleimidephenyl) methane, 2,2-bis {4- (4-maleimidephenyloxy) -phenyl} propane, and bis (3-ethyl At least one of the group consisting of methyl-5-methyl-4-maleimide phenyl) methane and the maleimide imide compound represented by the following formula (1) is preferable, and it is easy to obtain the absence of From the viewpoint of a clear glass transition temperature (no Tg) resin composition, a maleimide compound represented by the following formula (1) is particularly preferred. By containing the said maleimidine imine compound (B), the hardened | cured material obtained will tend to have a lower thermal expansion rate, and heat resistance and a glass transition temperature (Tg) will become better. The maleimide compound (B) may be used alone or in combination of two or more.

【化10】 [Chemical 10]

在此,式(1)中,R5 各自獨立地表示氫原子或甲基,較佳為氫原子。又,式(1)中,n1 表示1以上之整數,較佳為10以下之整數,更佳為7以下之整數。Here, in Formula (1), R 5 each independently represents a hydrogen atom or a methyl group, and is preferably a hydrogen atom. In formula (1), n 1 represents an integer of 1 or more, preferably an integer of 10 or less, and more preferably an integer of 7 or less.

馬來醯亞胺化合物(B)之含量,相對於印刷電路板用樹脂組成物中之樹脂固體成分100質量份為40~80質量份,較佳為40~70質量份,更佳為45~65質量份。馬來醯亞胺化合物(B)之含量藉由為上述範圍內,有獲得之硬化物之熱膨脹率更低、耐熱性更好的傾向。The content of the maleimide compound (B) is 40 to 80 parts by mass, preferably 40 to 70 parts by mass, and more preferably 45 to 100 parts by mass based on 100 parts by mass of the resin solid content in the resin composition for a printed circuit board. 65 parts by mass. When the content of the maleimide compound (B) is within the above range, the cured product obtained has a lower thermal expansion coefficient and a higher heat resistance.

[氰酸酯化合物(C)及/或環氧化合物(D)] 本實施形態之印刷電路板用樹脂組成物含有氰酸酯化合物(C)及/或環氧化合物(D)。藉由將氰酸酯化合物(C)及/或環氧化合物(D)與上述烯丙基苯酚化合物(A)、馬來醯亞胺化合物(B)一起使用,有成為在例如使預浸體硬化而得之硬化物中,不存在明確的玻璃轉移溫度(無Tg)且能充分減小印刷電路板尤其多層無核心基板之翹曲(達成低翹曲)之樹脂組成物之傾向。[Cyanate Compound (C) and / or Epoxy Compound (D)] The resin composition for a printed wiring board of this embodiment contains a cyanate compound (C) and / or an epoxy compound (D). By using a cyanate compound (C) and / or an epoxy compound (D) together with the allylphenol compound (A) and the maleimide compound (B), it is possible to make a prepreg, for example. There is no tendency for a resin composition having a clear glass transition temperature (no Tg) and a warpage (to achieve low warpage) of a printed circuit board, especially a multilayer non-core substrate, to be sufficiently hardened.

(氰酸酯化合物(C)) 氰酸酯化合物(C)不特別限定,例如:下式(2)表示之萘酚芳烷基型氰酸酯、下式(3)表示之酚醛清漆型氰酸酯、聯苯芳烷基型氰酸酯、雙(3,5-二甲基4-氰氧基苯基)甲烷、雙(4-氰氧基苯基)甲烷、1,3-二氰氧基苯、1,4-二氰氧基苯、1,3,5-三氰氧基苯、1,3-二氰氧基萘、1,4-二氰氧基萘、1,6-二氰氧基萘、1,8-二氰氧基萘、2,6-二氰氧基萘、2、7-二氰氧基萘、1,3,6-三氰氧基萘、4、4’-二氰氧基聯苯、雙(4-氰氧基苯基)醚、雙(4-氰氧基苯基)硫醚、雙(4-氰氧基苯基)碸、及2、2’-雙(4-氰氧基苯基)丙烷;此等氰酸酯之預聚物等。該等氰酸酯化合物(C)可單獨使用1種或組合使用2種以上。(Cyanate compound (C)) The cyanate compound (C) is not particularly limited, and examples thereof include a naphthol aralkyl type cyanate represented by the following formula (2), and a novolac type cyanide represented by the following formula (3) Acid ester, biphenylaralkyl cyanate, bis (3,5-dimethyl 4-cyanooxyphenyl) methane, bis (4-cyanooxyphenyl) methane, 1,3-dicyanide Oxybenzene, 1,4-dicyanoxybenzene, 1,3,5-tricyanooxybenzene, 1,3-dicyanoxynaphthalene, 1,4-dicyanoxynaphthalene, 1,6- Dicyanoxynaphthalene, 1,8-dicyanoxynaphthalene, 2,6-dicyanoxynaphthalene, 2,7-dicyanoxynaphthalene, 1,3,6-tricyanoxynaphthalene, 4, 4'-dicyanooxybiphenyl, bis (4-cyanoxyphenyl) ether, bis (4-cyanoxyphenyl) sulfide, bis (4-cyanoxyphenyl) fluorene, and 2, 2'-bis (4-cyanooxyphenyl) propane; prepolymers of these cyanates and the like. These cyanate ester compounds (C) may be used individually by 1 type, and may use 2 or more types together.

【化11】 [Chemical 11]

式(2)中,R6 各自獨立地表示氫原子或甲基,其中,氫原子較佳。又,式(2)中,n2 表示1以上之整數。n2 之上限値通常為10,較佳為6。In the formula (2), each of R 6 independently represents a hydrogen atom or a methyl group, and among them, a hydrogen atom is preferred. In formula (2), n 2 represents an integer of 1 or more. The upper limit 値 of n 2 is usually 10, and preferably 6.

【化12】 [Chemical 12]

式(3)中,R7 各自獨立地表示氫原子或甲基,其中,氫原子較佳。又,式(3)中,n3 表示1以上之整數。n3 之上限値通常為10,較佳為7。In the formula (3), R 7 each independently represents a hydrogen atom or a methyl group, and among them, a hydrogen atom is preferred. In formula (3), n 3 represents an integer of 1 or more. The upper limit 値 of n 3 is usually 10, preferably 7.

該等其中,氰酸酯化合物(C)宜含有選自於由式(2)表示之萘酚芳烷基型氰酸酯、式(3)表示之酚醛清漆型氰酸酯、及聯苯芳烷基型氰酸酯構成之群組中之1種以上較佳,含有選自於由式(2)表示之萘酚芳烷基型氰酸酯及式(3)表示之酚醛清漆型氰酸酯構成之群組中之1種以上更佳。藉由使用如此的氰酸酯化合物(C),有可獲得阻燃性更優良、硬化性更高、且熱膨脹係數更低的硬化物的傾向。Among them, the cyanate compound (C) preferably contains a naphthol aralkyl type cyanate represented by the formula (2), a novolac type cyanate represented by the formula (3), and a biphenyl aromatic One or more of the group consisting of alkyl cyanate esters are preferred, and they are selected from naphthol aralkyl cyanates represented by formula (2) and novolac cyanates represented by formula (3) One or more members of the group consisting of esters are more preferred. By using such a cyanate ester compound (C), there is a tendency that a cured product having better flame retardancy, higher curability, and a lower thermal expansion coefficient can be obtained.

該等氰酸酯化合物(C)之製造方法不特別限定,可使用公知之方法作為氰酸酯化合物之合成方法。公知之方法不特別限定,例如使酚醛樹脂與鹵化氰在鈍性有機溶劑中,於鹼性化合物存在下反應之方法、使酚醛樹脂與鹼性化合物之鹽形成於含水之溶液中,之後使獲得之鹽與鹵化氰進行2相系界面反應之方法。The manufacturing method of these cyanate ester compounds (C) is not specifically limited, A well-known method can be used as a synthesis method of a cyanate ester compound. The known method is not particularly limited, for example, a method in which a phenol resin and a cyanogen halide are reacted in a passive organic solvent in the presence of a basic compound, a salt of the phenol resin and the basic compound is formed in an aqueous solution, and then obtained A method in which a salt and a cyanogen halide undergo a 2-phase interfacial reaction.

成為該等氰酸酯化合物(C)之原料的酚醛樹脂不特別限定,例如:下式(9)表示之萘酚芳烷基型酚醛樹脂、酚醛清漆型酚醛樹脂、聯苯芳烷基型酚醛樹脂。The phenol resin used as a raw material of the cyanate compound (C) is not particularly limited, and examples thereof include a naphthol aralkyl phenol resin, a novolac phenol resin, and a biphenylaralkyl phenol resin represented by the following formula (9). Resin.

【化13】 [Chemical 13]

式(9)中,R8 各自獨立地表示氫原子或甲基,其中又以氫原子為較佳。又,式(9)中,n4 表示1以上之整數。n4 之上限値通常為10,較佳為6。In the formula (9), each of R 8 independently represents a hydrogen atom or a methyl group, and among them, a hydrogen atom is more preferable. In formula (9), n 4 represents an integer of 1 or more. The upper limit 値 of n 4 is usually 10, preferably 6.

式(9)表示之萘酚芳烷基型酚醛樹脂可藉由使萘酚芳烷基樹脂與氰酸縮合而獲得。萘酚芳烷基型酚醛樹脂不特別限定,例如:使α-萘酚及β-萘酚等萘酚類,與對亞二甲苯二醇、α,α’-二甲氧基-對二甲苯、及1,4-二(2-羥基-2-丙基)苯等苯類反應而獲得者。萘酚芳烷基型氰酸酯,可從如上述獲得之使萘酚芳烷基樹脂與氰酸縮合而獲得者當中選擇。The naphthol aralkyl type phenol resin represented by the formula (9) can be obtained by condensing a naphthol aralkyl resin and cyanic acid. The naphthol aralkyl-type phenol resin is not particularly limited. For example, naphthols such as α-naphthol and β-naphthol, and p-xylylene glycol and α, α'-dimethoxy-p-xylene And 1,4-bis (2-hydroxy-2-propyl) benzene and other benzenes. The naphthol aralkyl cyanate can be selected from those obtained by condensing a naphthol aralkyl resin with cyanic acid as described above.

氰酸酯化合物(C)之含量,相對於印刷電路板用樹脂組成物中之樹脂固體成分100質量份較佳為0~25質量份,更佳為0~20質量份。氰酸酯化合物之含量藉由為上述範圍內,有獲得之硬化物之耐熱性與耐藥品性更好的傾向。The content of the cyanate ester compound (C) is preferably 0 to 25 parts by mass, and more preferably 0 to 20 parts by mass based on 100 parts by mass of the resin solid content in the resin composition for a printed circuit board. When the content of the cyanate ester compound is within the above range, the heat resistance and chemical resistance of the obtained cured product tend to be better.

(環氧化合物(D)) 環氧化合物(D)只要是在1分子中有2個以上之環氧基之化合物即不特別限定,例如:雙酚A型環氧樹脂、雙酚E型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、苯酚酚醛清漆型環氧樹脂、雙酚A酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、聯苯型環氧樹脂、萘型環氧樹脂、蒽型環氧樹脂、3官能苯酚型環氧樹脂、4官能苯酚型環氧樹脂、環氧丙酯型環氧樹脂、苯酚芳烷基型環氧樹脂、聯苯芳烷基型環氧樹脂、芳烷基酚醛清漆型環氧樹脂、萘酚芳烷基型環氧樹脂、二環戊二烯型環氧樹脂、多元醇型環氧樹脂、含有異氰尿酸酯環之環氧樹脂、或該等之鹵化物。又,環氧化合物(D)宜為非鹵化環氧化合物(非含鹵素之環氧化合物、不含鹵素之環氧化合物)更理想。又,烯丙基苯酚化合物(A)含有環氧基時,環氧化合物(D)係具環氧基之烯丙基苯酚化合物(A)以外者。(Epoxy Compound (D)) The epoxy compound (D) is not particularly limited as long as it is a compound having two or more epoxy groups in one molecule, such as a bisphenol A-type epoxy resin and a bisphenol E-type ring. Oxygen resin, bisphenol F epoxy resin, bisphenol S epoxy resin, phenol novolac epoxy resin, bisphenol A novolac epoxy resin, cresol novolac epoxy resin, biphenyl ring Oxygen resin, naphthalene epoxy resin, anthracene epoxy resin, trifunctional phenol epoxy resin, 4-functional phenol epoxy resin, propylene oxide epoxy resin, phenol aralkyl epoxy resin, Benzoaralkyl type epoxy resin, aralkyl novolac type epoxy resin, naphthol aralkyl type epoxy resin, dicyclopentadiene type epoxy resin, polyhydric alcohol type epoxy resin, containing isocyanuric acid Ester ring epoxy resins, or these halides. The epoxy compound (D) is more preferably a non-halogenated epoxy compound (non-halogen-containing epoxy compound, halogen-free epoxy compound). When the allylphenol compound (A) contains an epoxy group, the epoxy compound (D) is other than the allylphenol compound (A) having an epoxy group.

環氧化合物(D)之含量,相對於印刷電路板用樹脂組成物中之樹脂固體成分100質量份為較佳為0~25質量份,更佳為0~20質量份。環氧化合物(D)之含量藉由為上述範圍內,有獲得之硬化物之柔軟性、銅箔剝離強度、耐藥品性、及耐除膠渣性更好的傾向。The content of the epoxy compound (D) is preferably 0 to 25 parts by mass, and more preferably 0 to 20 parts by mass based on 100 parts by mass of the resin solid content in the resin composition for a printed circuit board. When the content of the epoxy compound (D) is within the above range, the softness of the obtained hardened product, copper foil peeling strength, chemical resistance, and deslagging resistance tend to be better.

又,如上所述,本實施形態之印刷電路板用樹脂組成物含有氰酸酯化合物(C)及/或環氧化合物(D)的情形,若含有氰酸酯化合物(C)及環氧化合物(D)兩者,印刷電路板用樹脂組成物中,相對於樹脂固體成分100質量份之氰酸酯化合物(C)及環氧化合物(D)之合計含量較佳為5~45質量份,更佳為5~40質量份,又更佳為10~30質量份。氰酸酯化合物(C)及環氧化合物(D)之合計含量藉由為上述範圍內,有獲得之硬化物之柔軟性、銅箔剝離強度、耐熱性、耐藥品性、及耐除膠渣性更好的傾向。又,氰酸酯化合物(C)及環氧化合物(D)之合計含量藉由為上述範圍內,有成為例如使預浸體硬化而得之硬化物中,不存在明確的玻璃轉移溫度(無Tg)且能更減小印刷電路板尤其多層無核心基板之翹曲(達成低翹曲)之樹脂組成物的傾向。As described above, when the resin composition for a printed wiring board of the present embodiment contains a cyanate compound (C) and / or an epoxy compound (D), if the cyanate compound (C) and the epoxy compound are contained (D) In both cases, the total content of the cyanate compound (C) and the epoxy compound (D) in the resin composition for a printed circuit board is preferably from 5 to 45 parts by mass based on 100 parts by mass of the resin solid content. It is more preferably 5 to 40 parts by mass, and even more preferably 10 to 30 parts by mass. When the total content of the cyanate ester compound (C) and the epoxy compound (D) is within the above range, the softness of the hardened material obtained, the peeling strength of the copper foil, heat resistance, chemical resistance, and resistance to dross removal Sexual orientation. In addition, if the total content of the cyanate compound (C) and the epoxy compound (D) is within the above range, there may be, for example, a hardened material obtained by hardening a prepreg, and there is no clear glass transition temperature (no Tg), and the tendency of the resin composition of printed circuit boards, especially multilayer coreless substrates, to be reduced (to achieve low warpage) can be further reduced.

[填充材(E)] 本實施形態之印刷電路板用樹脂組成物宜更含有填充材(E)較佳。填充材(E)不特別限定,例如:無機填充材及有機填充材,兩者之中,宜含有無機填充材較佳,有機填充材宜和無機填充材一起使用較理想。無機填充材不特別限定,例如:天然二氧化矽、熔融二氧化矽、合成二氧化矽、非晶質二氧化矽、Aerosil、中空二氧化矽等二氧化矽類;白碳等矽化合物;鈦白、氧化鋅、氧化鎂、氧化鋯等金屬氧化物;氮化硼、凝聚氮化硼、氮化矽、氮化鋁等金屬氮化物;硫酸鋇等金屬硫氧化物;氫氧化鋁、氫氧化鋁加熱處理品(氫氧化鋁進行加熱處理並減去了一部分結晶水者)、軟水鋁石、氫氧化鎂等金屬水合物;氧化鉬、鉬酸鋅等鉬化合物;硼酸鋅、錫酸鋅等鋅化合物;氧化鋁、黏土、高嶺土、滑石、煅燒黏土、煅燒高嶺土、煅燒滑石、雲母、E-玻璃、A-玻璃、NE-玻璃、C-玻璃、L-玻璃、D-玻璃、S-玻璃、M-玻璃G20、玻璃短纖維(包括E玻璃、T玻璃、D玻璃、S玻璃、Q玻璃等玻璃微粉末類)、中空玻璃、球狀玻璃等。又,有機填充材不特別限定,例如:苯乙烯型粉末、丁二烯型粉末、丙烯酸型粉末等橡膠粉末;核殼型橡膠粉末;聚矽氧樹脂粉末;聚矽氧橡膠粉末;聚矽氧複合粉末等。填充材(E)可單獨使用1種也可併用2種以上。[Filling Material (E)] The resin composition for a printed circuit board of the present embodiment preferably contains the filler (E) more. The filler (E) is not particularly limited. For example, an inorganic filler and an organic filler are preferred. Among them, an inorganic filler is preferred, and an organic filler is preferably used together with an inorganic filler. The inorganic filler is not particularly limited, for example: natural silicon dioxide, fused silicon dioxide, synthetic silicon dioxide, amorphous silicon dioxide, Aerosil, hollow silicon dioxide and other silicon dioxides; silicon compounds such as white carbon; titanium Metal oxides such as white, zinc oxide, magnesium oxide, and zirconia; metal nitrides such as boron nitride, condensed boron nitride, silicon nitride, and aluminum nitride; metal sulfur oxides such as barium sulfate; aluminum hydroxide and hydroxide Aluminum heat-treated products (those that have undergone heat treatment with aluminum hydroxide minus some crystal water), metal hydrates such as boehmite and magnesium hydroxide; molybdenum compounds such as molybdenum oxide and zinc molybdate; zinc borate and zinc stannate Zinc compounds; alumina, clay, kaolin, talc, calcined clay, calcined kaolin, calcined talc, mica, E-glass, A-glass, NE-glass, C-glass, L-glass, D-glass, S-glass , M-glass G20, glass short fiber (including glass micro powders such as E glass, T glass, D glass, S glass, Q glass), hollow glass, spherical glass, etc. In addition, the organic filler is not particularly limited, for example: styrene-based powder, butadiene-based powder, acrylic-based powder, and other rubber powders; core-shell rubber powders; polysiloxane resin powders; polysiloxane rubber powders; and polysiloxanes. Composite powder and so on. The filler (E) may be used individually by 1 type, and may use 2 or more types together.

其中又以含有選自由無機填充材、二氧化矽、氧化鋁、氧化鎂、氫氧化鋁、軟水鋁石、氮化硼、凝聚氮化硼、氮化矽、及氮化鋁構成之群組中之至少1種較佳,二氧化矽、氧化鋁、及軟水鋁石構成之群組中之至少1種更佳。藉由使用如此的填充材(E),有獲得之硬化物的高剛性化、低翹曲化更好的傾向。It also contains a group selected from the group consisting of inorganic fillers, silicon dioxide, aluminum oxide, magnesium oxide, aluminum hydroxide, boehmite, boron nitride, agglomerated boron nitride, silicon nitride, and aluminum nitride. At least one of them is preferred, and at least one of the groups consisting of silica, alumina, and boehmite is more preferred. By using such a filler (E), the hardened | cured material obtained will tend to become high rigidity and low warpage.

印刷電路板用樹脂組成物中,相對於樹脂固體成分100質量份,填充材(E)(尤其無機填充材)之含量較佳為120~250質量份,更佳為150~230質量份,又更佳為180~220質量份。填充材(E)之含量藉由為上述範圍內,有獲得之硬化物之高剛性化、低翹曲化更好之傾向。In the resin composition for a printed circuit board, the content of the filler (E) (especially an inorganic filler) is preferably 120 to 250 parts by mass, more preferably 150 to 230 parts by mass, with respect to 100 parts by mass of the resin solid content. It is more preferably 180 to 220 parts by mass. When the content of the filler (E) is within the above range, the obtained hardened product tends to have higher rigidity and lower warpage.

[矽烷偶聯劑及濕潤分散劑] 本實施形態之印刷電路板用樹脂組成物,也可更含有矽烷偶聯劑、濕潤分散劑。藉由含有矽烷偶聯劑、濕潤分散劑,有上述填充材(E)之分散性、樹脂成分、填充材(E)、及後述基材之黏著強度更好的傾向。[Silane coupling agent and wetting and dispersing agent] The resin composition for a printed circuit board of this embodiment may further contain a silane coupling agent and a wetting and dispersing agent. By including a silane coupling agent and a wetting and dispersing agent, the dispersibility of the filler (E), the resin component, the filler (E), and the adhesive strength of the substrate described later tend to be better.

矽烷偶聯劑只要是一般使用在無機物之表面處理之矽烷偶聯劑即不特別限定,例如:γ-胺基丙基三乙氧基矽烷、N-β-(胺基乙基)-γ-胺基丙基三甲氧基矽烷等胺基矽烷系化合物;γ-環氧丙氧基丙基三甲氧基矽烷等環氧矽烷系化合物;γ-丙烯醯氧基丙基三甲氧基矽烷等丙烯酸基矽烷系化合物;N-β-(N-乙烯基苄胺基乙基)-γ-胺基丙基三甲氧基矽烷鹽酸鹽等陽離子性矽烷系化合物;苯基矽烷系化合物等。矽烷偶聯劑可單獨使用1種也可併用2種以上。The silane coupling agent is not particularly limited as long as it is a silane coupling agent generally used for the surface treatment of inorganic substances, for example: γ-aminopropyltriethoxysilane, N-β- (aminoethyl) -γ- Aminosilane compounds such as aminopropyltrimethoxysilane; γ-glycidoxypropyltrimethoxysilane; silane-based epoxy compounds; γ-acrylic acid propyltrimethoxysilane; acrylic groups Silane-based compounds; cationic silane-based compounds such as N-β- (N-vinylbenzylaminoethyl) -γ-aminopropyltrimethoxysilane hydrochloride; phenylsilane-based compounds and the like. The silane coupling agent may be used singly or in combination of two or more kinds.

濕潤分散劑只要是塗料用途使用之分散安定劑即不特別限定,例如:BYK Chemie Japan(股)製之DISPER BYK-110、111、118、180、161、BYK-W996、W9010、W903等。The wetting and dispersing agent is not particularly limited as long as it is a dispersing stabilizer used for coating applications, for example, DISPER BYK-110, 111, 118, 180, 161, BYK-W996, W9010, W903, etc., manufactured by BYK Chemie Japan.

[其他樹脂等] 本實施形態之印刷電路板用樹脂組成物中,視需要也可更含有選自由上述烯丙基苯酚化合物(A)以外之含烯丙基之化合物(以下也稱為「其他之含烯丙基之化合物」)、酚醛樹脂、氧雜環丁烷樹脂、苯并 化合物、及具可聚合之不飽和基之化合物構成之群組中之1種或2種以上。藉由含有如此的其他樹脂等,有獲得之硬化物之銅箔剝離強度、彎曲強度、及彎曲彈性模數等更好的傾向。[Other resins] The resin composition for a printed circuit board of the present embodiment may further contain an allyl-containing compound (hereinafter also referred to as "others") selected from the allylphenol compound (A) as necessary. Allyl-containing compounds ''), phenolic resins, oxetane resins, benzo One or two or more of the group consisting of a compound and a compound having a polymerizable unsaturated group. By containing such other resins, the copper foil peeling strength, bending strength, and bending elastic modulus of the obtained cured product tend to be better.

[其他之含烯丙基之化合物] 其他之含烯丙基之化合物不特別限定,例如:氯丙烯、乙酸烯丙酯、烯丙醚、丙烯、氰尿酸三烯丙酯、異氰尿酸三烯丙酯、鄰苯二甲酸二烯丙酯、間苯二甲酸二烯丙酯、馬來酸二烯丙酯等。[Other allyl-containing compounds] Other allyl-containing compounds are not particularly limited, for example: chloropropylene, allyl acetate, allyl ether, propylene, triallyl cyanurate, triene isocyanurate Propyl ester, diallyl phthalate, diallyl isophthalate, diallyl maleate, and the like.

其他之含烯丙基之化合物之含量,相對於印刷電路板用樹脂組成物中之樹脂固體成分100質量份較佳為0~50質量份,更佳為10~45質量份,又更佳為15~45質量份,更佳為20~35質量份。其他之含烯丙基之化合物之含量藉由為上述範圍內,有獲得之硬化物之彎曲強度、彎曲彈性模數、耐熱性、耐藥品性更好的傾向。The content of the other allyl-containing compound is preferably 0 to 50 parts by mass, more preferably 10 to 45 parts by mass, and even more preferably 100 parts by mass of the resin solid content in the resin composition for a printed circuit board. 15 to 45 parts by mass, more preferably 20 to 35 parts by mass. When the content of the other allyl-containing compound is within the above range, the flexural strength, flexural modulus, heat resistance, and chemical resistance of the obtained hardened product tend to be better.

[酚醛樹脂(phenolic resin)] 酚醛樹脂只要是在1分子中有2個以上之羥基之酚醛樹脂即可,使用一般公知者,其種類無特殊限制。其具體例可列舉雙酚A型酚醛樹脂、雙酚E型酚醛樹脂、雙酚F型酚醛樹脂、雙酚S型酚醛樹脂、苯酚酚醛清漆樹脂、雙酚A酚醛清漆型酚醛樹脂、環氧丙酯型酚醛樹脂、芳烷基酚醛清漆型酚醛樹脂、聯苯芳烷基型酚醛樹脂、甲酚酚醛清漆型酚醛樹脂、多官能酚醛樹脂、萘酚樹脂、萘酚酚醛清漆樹脂、多官能萘酚樹脂、蒽型酚醛樹脂、萘骨架改性酚醛清漆型酚醛樹脂、苯酚芳烷基型酚醛樹脂、萘酚芳烷基型酚醛樹脂、二環戊二烯型酚醛樹脂、聯苯型酚醛樹脂、脂環族酚醛樹脂、多元醇型酚醛樹脂、含磷之酚醛樹脂、含羥基之聚矽氧樹脂類等,但無特殊限制。該等酚醛樹脂可單獨使用1種或組合使用2種以上。藉由含有如此的酚醛樹脂,有獲得之硬化物之黏著性、可撓性等更優良的傾向。[Phenolic resin] The phenolic resin may be a phenolic resin having two or more hydroxyl groups in one molecule, and generally known ones are used, and the type is not particularly limited. Specific examples thereof include bisphenol A-type phenol resin, bisphenol E-type phenol resin, bisphenol F-type phenol resin, bisphenol S-type phenol resin, phenol novolac resin, bisphenol A novolac phenol resin, and propylene oxide Ester-type phenolic resin, aralkyl novolac-type phenolic resin, biphenylaralkyl-type phenolic resin, cresol novolac-type phenolic resin, polyfunctional phenolic resin, naphthol resin, naphthol novolac resin, polyfunctional naphthol Resin, anthracene phenolic resin, naphthalene skeleton modified novolac phenolic resin, phenol aralkyl phenolic resin, naphthol aralkyl phenolic resin, dicyclopentadiene phenolic resin, biphenyl phenolic resin, grease Cyclic phenolic resins, polyhydric alcohol phenolic resins, phosphorus-containing phenolic resins, and hydroxyl-containing silicone resins are not particularly limited. These phenol resins can be used individually by 1 type or in combination of 2 or more types. By containing such a phenol resin, the obtained cured product tends to have better adhesion, flexibility, and the like.

酚醛樹脂之含量,相對於印刷電路板用樹脂組成物中之樹脂固體成分100質量份較佳為0~99質量份,更佳為1~90質量份,又更佳為3~80質量份。酚醛樹脂之含量藉由為上述範圍內,有獲得之硬化物之黏著性、可撓性等更優良的傾向。The content of the phenol resin is preferably 0 to 99 parts by mass, more preferably 1 to 90 parts by mass, and even more preferably 3 to 80 parts by mass, with respect to 100 parts by mass of the resin solid content in the resin composition for a printed circuit board. When the content of the phenol resin is within the above range, the adhesiveness and flexibility of the obtained hardened product tend to be more excellent.

[氧雜環丁烷樹脂] 氧雜環丁烷樹脂可使用一般公知者,種類無特殊限制。其具體例可列舉氧雜環丁烷、2-甲基氧雜環丁烷、2,2-二甲基氧雜環丁烷、3-甲基氧雜環丁烷、3,3-二甲基氧雜環丁烷等烷基氧雜環丁烷、3-甲基-3-甲氧基甲基氧雜環丁烷、3,3’-二(三氟甲基)全氟氧雜環丁烷、2-氯甲基氧雜環丁烷、3,3-雙(氯甲基)氧雜環丁烷、聯苯型氧雜環丁烷、OXT-101(東亞合成製商品名)、OXT-121(東亞合成製商品名)等。該等氧雜環丁烷樹脂可使用1種或組合使用2種以上。藉由含有如此的氧雜環丁烷樹脂,有獲得之硬化物之黏著性、可撓性等更優良的傾向。[Xetane resin] As the oxetane resin, generally known ones can be used, and the kind is not particularly limited. Specific examples include oxetane, 2-methyloxetane, 2,2-dimethyloxetane, 3-methyloxetane, 3,3-dimethyl Alkyloxetane such as oxetane, 3-methyl-3-methoxymethyloxetane, 3,3'-bis (trifluoromethyl) perfluorooxane Butane, 2-chloromethyloxetane, 3,3-bis (chloromethyl) oxetane, biphenyl type oxetane, OXT-101 (trade name of Toa Synthetic), OXT-121 (trade name of East Asia Synthetic) and the like. These oxetane resins can be used singly or in combination of two or more kinds. By containing such an oxetane resin, there is a tendency that the obtained cured product has better adhesion, flexibility, and the like.

氧雜環丁烷樹脂之含量,相對於印刷電路板用樹脂組成物中之樹脂固體成分100質量份為較佳為0~99質量份,更佳為1~90質量份,又更佳為3~80質量份。氧雜環丁烷樹脂之含量藉由為上述範圍內,有獲得之硬化物之密合性、可撓性等更優良的傾向。The content of the oxetane resin is preferably from 0 to 99 parts by mass, more preferably from 1 to 90 parts by mass, and even more preferably 3 to 100 parts by mass of the resin solid content in the resin composition for a printed circuit board. ~ 80 parts by mass. When the content of the oxetane resin is within the above range, the adhesiveness and flexibility of the obtained cured product tend to be more excellent.

[苯并 化合物] 苯并 化合物只要是在1分子中有2個以上之二氫苯并 環之化合物即可,可使用一般公知者,種類無特殊限制。其具體例可列舉雙酚A型苯并 BA-BXZ(小西化學製商品名)雙酚F型苯并 BF-BXZ(小西化學製商品名)、雙酚S型苯并 BS-BXZ(小西化學製商品名)等。該等苯并 化合物可使用1種或混用2種以上。藉由含有如此的苯并 化合物,有獲得之硬化物之阻燃性、耐熱性、低吸水性、低介電等更優良的傾向。[Benzo Compound] benzo As long as the compound is two or more dihydrobenzo in one molecule A ring compound is sufficient, and generally known ones can be used, and the type is not particularly limited. Specific examples thereof include bisphenol A benzo BA-BXZ (trade name, manufactured by Konishi Chemical) bisphenol F type benzo BF-BXZ (trade name manufactured by Konishi Chemical), bisphenol S type benzo BS-BXZ (trade name of Konishi Chemical Co., Ltd.) and the like. Benzo The compounds may be used singly or in combination of two or more. By containing such benzo The compound tends to be more excellent in flame retardancy, heat resistance, low water absorption, and low dielectric properties of the obtained cured product.

苯并 化合物之含量,相對於印刷電路板用樹脂組成物中之樹脂固體成分100質量份較佳為0~99質量份,更佳為1~90質量份,又更佳為3~80質量份。苯并 化合物之含量藉由為上述範圍內,有獲得之硬化物之耐熱性等更優良的傾向。Benzo The content of the compound is preferably 0 to 99 parts by mass, more preferably 1 to 90 parts by mass, and still more preferably 3 to 80 parts by mass with respect to 100 parts by mass of the resin solid content in the resin composition for a printed circuit board. Benzo When the content of the compound is within the above range, the heat resistance of the obtained hardened product tends to be more excellent.

[具可聚合之不飽和基之化合物] 具可聚合之不飽和基之化合物可使用一般公知者,其種類無特殊限制。其具體例可列舉乙烯、丙烯、苯乙烯、二乙烯基苯、二乙烯基聯苯等乙烯基化合物;(甲基)丙烯酸甲酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、二(甲基)丙烯酸聚丙二醇酯、三羥甲基丙烷二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、六(甲基)丙烯酸二新戊四醇酯等一元或多元醇之(甲基)丙烯酸酯類;雙酚A型環氧(甲基)丙烯酸酯、雙酚F型環氧(甲基)丙烯酸酯等環氧(甲基)丙烯酸酯類;苯并環丁烯樹脂;(雙)馬來醯亞胺樹脂等。該等具可聚合之不飽和基之化合物可使用1種或混用2種以上。藉由含有如此的具可聚合之不飽和基之化合物,有獲得之硬化物之耐熱性、靱性等更優良的傾向。[Compound Having Polymerizable Unsaturated Group] The compound having polymerizable unsaturated group can be generally known, and its kind is not particularly limited. Specific examples thereof include vinyl compounds such as ethylene, propylene, styrene, divinylbenzene, and divinylbiphenyl; methyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, and (meth) 2-hydroxypropyl acrylate, polypropylene glycol di (meth) acrylate, trimethylolpropane di (meth) acrylate, trimethylolpropane tri (meth) acrylate, neopentaerythritol tetra (methyl) (Meth) acrylates, mono- or polyhydric alcohols (meth) acrylates, such as bis (pentaerythritol) hexa (meth) acrylate; bisphenol A epoxy (meth) acrylate, bisphenol F epoxy Epoxy (meth) acrylates such as (meth) acrylates; benzocyclobutene resins; (bis) maleimide resins and the like. These polymerizable unsaturated compounds may be used singly or in combination of two or more kinds. By containing such a polymerizable unsaturated group-containing compound, there is a tendency that the obtained cured product is more excellent in heat resistance and alkali resistance.

具可聚合之不飽和基之化合物之含量,相對於印刷電路板用樹脂組成物中之樹脂固體成分100質量份較佳為0~99質量份,更佳為1~90質量份,又更佳為3~80質量份。具可聚合之不飽和基之化合物之含量藉由為上述範圍內,有獲得之硬化物之耐熱性、靱性等更優良的傾向。The content of the compound having a polymerizable unsaturated group is preferably 0 to 99 parts by mass, more preferably 1 to 90 parts by mass, and more preferably 100 parts by mass of the resin solid content in the resin composition for a printed circuit board. It is 3 to 80 parts by mass. When the content of the compound having a polymerizable unsaturated group is within the above range, the heat resistance and heat resistance of the obtained hardened product tend to be more excellent.

[硬化促進劑] 本實施形態之印刷電路板用樹脂組成物也可更含有硬化促進劑。硬化促進劑不特別限定,例如:三苯基咪唑等咪唑類;過氧化苯甲醯、過氧化月桂醯、過氧化乙醯、對氯過氧化苯甲醯、二過氧化鄰苯二甲酸二第三丁酯等有機過氧化物;偶氮雙腈等偶氮化合物;N,N-二甲基苄胺、N,N-二甲基苯胺、N,N-二甲基甲苯胺、N,N-二甲基吡啶、2-N-乙基苯胺基乙醇、三正丁胺、吡啶、喹啉、N-甲基啉、三乙醇胺、三乙二胺、四甲基丁二胺、N-甲基哌啶等三級胺類;苯酚、二甲酚、甲酚、間苯二酚、兒茶酚等苯酚類;環烷酸鉛、硬脂酸鉛、環烷酸鋅、辛酸鋅、油酸錫、蘋果酸二丁基錫、環烷酸錳、環烷酸鈷、乙醯基丙酮鐵等有機金屬鹽;此等有機金屬鹽溶於苯酚、雙酚等含羥基之化合物而成者;氯化錫、氯化鋅、氯化鋁等無機金屬鹽;二辛基氧化錫、其他之烷基錫、烷基氧化錫等有機錫化合物等。該等之中,三苯基咪唑會促進硬化反應且有熱膨脹率優良的傾向,故特別理想。[Hardening Accelerator] The resin composition for a printed wiring board of this embodiment may further contain a hardening accelerator. The hardening accelerator is not particularly limited, for example: imidazoles such as triphenylimidazole; benzamidine peroxide, laurel oxide, acetamidine peroxide, benzamidine peroxychloride, and diperoxyphthalate Organic peroxides such as tributyl ester; azo compounds such as azobisnitrile; N, N-dimethylbenzylamine, N, N-dimethylaniline, N, N-dimethyltoluidine, N, N -Dimethylpyridine, 2-N-ethylaniline ethanol, tri-n-butylamine, pyridine, quinoline, N-methyl Tertiary amines such as phosphine, triethanolamine, triethylenediamine, tetramethylbutanediamine, N-methylpiperidine; phenols such as phenol, xylenol, cresol, resorcinol, and catechol; Organometallic salts such as lead naphthenate, lead stearate, zinc naphthenate, zinc octoate, tin oleate, dibutyltin malate, manganese naphthenate, cobalt naphthenate, iron ethylacetonate; etc. Metal salts dissolved in hydroxyl-containing compounds such as phenol and bisphenol; inorganic metal salts such as tin chloride, zinc chloride, and aluminum chloride; dioctyl tin oxide, other alkyl tin, and alkyl tin oxide Organotin compounds, etc. Among these, triphenylimidazole is particularly preferable because it promotes a curing reaction and tends to have an excellent thermal expansion rate.

[溶劑] 本實施形態之印刷電路板用樹脂組成物也可更含有溶劑。藉由含有溶劑,印刷電路板用樹脂組成物之製備時之黏度下降,操作性更好且有對於後述基材之含浸性更好的傾向。[Solvent] The resin composition for a printed wiring board of this embodiment may further contain a solvent. By containing a solvent, the viscosity at the time of preparation of the resin composition for printed wiring boards will fall, workability will become better, and the impregnation property with respect to the base material mentioned later tends to become better.

溶劑只要是能溶解印刷電路板用樹脂組成物中之樹脂成分之一部分或全部即可,不特別限定,例如:丙酮、甲乙酮、甲基賽珞蘇等酮類;甲苯、二甲苯等芳香族烴類;二甲基甲醯胺等醯胺類;丙二醇單甲醚及其乙酸酯等。溶劑可單獨使用1種也可併用2種以上。The solvent is not particularly limited as long as it can dissolve part or all of the resin components in the resin composition for printed circuit boards, for example, ketones such as acetone, methyl ethyl ketone, and methyl cyperidine; aromatic hydrocarbons such as toluene and xylene Amines such as dimethylformamide; propylene glycol monomethyl ether and its acetate. The solvents may be used singly or in combination of two or more kinds.

[印刷電路板用樹脂組成物之製造方法] 本實施形態之印刷電路板用樹脂組成物之製造方法不特別限定,例如將各成分按順序摻合於溶劑並充分攪拌的方法。此時,為了使各成分均勻地溶解或分散,可實施攪拌、混合、混練處理等公知之處理。具體而言,藉由使用附設有適當攪拌能力之攪拌機的攪拌槽實施攪拌分散處理,能使填充材(E)對於印刷電路板用樹脂組成物之分散性更好。上述攪拌、混合、混練處理,例如可使用球磨機、珠磨機以等混合為目的的裝置、或公轉或自轉型之混合裝置等公知之裝置適當實施。[Manufacturing method of the resin composition for printed wiring boards] The manufacturing method of the resin composition for printed wiring boards in this embodiment is not particularly limited, and for example, a method in which each component is sequentially mixed with a solvent and sufficiently stirred. In this case, in order to dissolve or disperse each component uniformly, a known treatment such as stirring, mixing, and kneading may be performed. Specifically, the dispersibility of the filler (E) with respect to the resin composition for a printed circuit board can be improved by performing the stirring and dispersing treatment using a stirring tank equipped with a stirrer having an appropriate stirring ability. The above-mentioned stirring, mixing, and kneading processes can be appropriately performed using, for example, a device for mixing such as a ball mill and a bead mill, or a known device such as a revolving or self-converting mixing device.

又,本實施形態之印刷電路板用樹脂組成物製備時,視需要可使用有機溶劑。有機溶劑之種類只要可溶解印刷電路板用樹脂組成物中之樹脂即無特殊限制。其具體例如上所述。Moreover, when preparing the resin composition for printed wiring boards of this embodiment, you may use an organic solvent as needed. The type of the organic solvent is not particularly limited as long as it can dissolve the resin in the resin composition for a printed circuit board. Specific examples are as described above.

[印刷電路板用樹脂組成物之特性] 本實施形態之印刷電路板用樹脂組成物,將含有此組成物與基材之預浸體在230℃及100分鐘之條件熱硬化而獲得之硬化物宜符合下式(4)~(8)表示之關於機械特性之物性參數之數値範圍,符合下式(4A)~(8A)表示之關於機械特性之物性參數之數値範圍更理想。[Characteristics of the resin composition for a printed circuit board] The resin composition for a printed circuit board according to this embodiment is a cured product obtained by thermally curing a prepreg containing the composition and a substrate at 230 ° C and 100 minutes. It should be in accordance with the range of the physical property parameters related to the mechanical characteristics represented by the following formulae (4) to (8), and more preferably in the range of the physical property parameters related to the mechanical properties represented by the following formulae (4A) to (8A).

E’(200℃)/E’(30℃)≦0.90…(4) E’(260℃)/E’(30℃)≦0.85…(5) E’(330℃)/E’(30℃)≦0.80…(6) E”max/E’(30℃)≦3.0%…(7) E”min/E’(30℃)≧0.5%…(8) 0.40≦E’(200℃)/E’(30℃)≦0.90…(4A) 0.40≦E’(260℃)/E’(30℃)≦0.85…(5A) 0.40≦E’(330℃)/E’(30℃)≦0.80…(6A) 0.5%≦E”max/E’(30℃)≦3.0%…(7A) 3.0%≧E”min/E’(30℃)≧0.5%…(8A)E '(200 ℃) / E' (30 ℃) ≦ 0.90… (4) E '(260 ℃) / E' (30 ℃) ≦ 0.85… (5) E '(330 ℃) / E' (30 ℃ ) ≦ 0.80… (6) E ”max / E '(30 ℃) ≦ 3.0%… (7) E” min / E' (30 ℃) ≧ 0.5%… (8) 0.40 ≦ E '(200 ℃) / E '(30 ℃) ≦ 0.90… (4A) 0.40 ≦ E' (260 ℃) / E '(30 ℃) ≦ 0.85… (5A) 0.40 ≦ E' (330 ℃) / E '(30 ℃) ≦ 0.80 … (6A) 0.5% ≦ E ”max / E '(30 ℃) ≦ 3.0%… (7A) 3.0% ≧ E” min / E' (30 ℃) ≧ 0.5%… (8A)

在此,各式中,E’表示硬化物在括弧內所示溫度之貯藏彈性模數,E”max表示硬化物在30℃至330℃之溫度範圍之損失彈性模數之最大値,E”min表示硬化物在30℃至330℃之溫度範圍之損失彈性模數之最小値(E”表示硬化物之損失彈性模數。)。Here, in each formula, E ′ represents the storage elastic modulus of the hardened material at the temperature shown in the brackets, and E ″ max represents the maximum loss elastic modulus of the hardened material in the temperature range of 30 ° C to 330 ° C, E ” min represents the minimum loss modulus of the hardened material in the temperature range of 30 ° C to 330 ° C (E "represents the loss modulus of the hardened material.).

以往,關於印刷電路板之翹曲行為,據認為預浸體之硬化物可達成較大之熱貯藏彈性模數、及較高彈性模數維持率之樹脂組成物係有效,但不一定為如此,藉由使預浸體於230℃及100分鐘之條件熱硬化而獲得之硬化物之關於機械特性之物性參數之數値為上式(4)~(8)之範圍內,較佳為式(4A)~(8A)之範圍內,能充分地提高玻璃轉移溫度(Tg),且能使疊層板、覆金屬箔疊層板、印刷電路板尤其多層無核心基板本身的翹曲量充分減小。In the past, with regard to the warping behavior of printed circuit boards, it is believed that a cured composition of a prepreg can achieve a large thermal storage modulus of elasticity and a resin composition having a high modulus of elasticity retention, but this is not necessarily the case , The number of physical property parameters of mechanical properties of the hardened material obtained by thermally curing the prepreg at 230 ° C and 100 minutes is in the range of the above formulas (4) to (8), and is preferably the formula In the range of (4A) to (8A), the glass transition temperature (Tg) can be sufficiently increased, and the warpage amount of the laminated board, metal foil-clad laminated board, and printed circuit board, especially the multilayer coreless substrate itself can be sufficiently increased. Decrease.

換言之,藉由使預浸體於230℃及100分之條件熱硬化而獲得之硬化物之關於機械特性之物性參數之數値為上式(4)~(8)之範圍內,較佳為式(4A)~(8A)之範圍內,可理想地不存在明確的玻璃轉移溫度(無Tg),且能使印刷電路板(尤其多層無核心基板)之翹曲充分減小(達成低翹曲)。亦即,符合損失彈性模數相關的式(7)及(8),較佳符合式(7A)及(8A)的話,可以說和不存在明確的玻璃轉移溫度(Tg)(無Tg)為同義,若硬化物僅符合式(7)及(8)較佳為符合式(7A)及(8A)且不符合式(4)~(6)較佳為不符合式(4A)~(6A),損失彈性模數本身小而不易伸長,但當製成印刷電路板時,此伸長難度會導致不易達成低翹曲。反觀若硬化物不僅符合式(7)及(8)較佳為式(7A)及(8A),且也符合式(4)~(8)較佳為式(4A)及(8A),則會由於無Tg而不易伸長且有印刷電路板易達成低翹曲的傾向。In other words, the number of physical property parameters of mechanical properties of the hardened material obtained by thermally hardening the prepreg at 230 ° C and 100 minutes is in the range of the above formulas (4) to (8), and more preferably In the range of formulas (4A) to (8A), it is desirable that a clear glass transition temperature (without Tg) does not exist, and the warpage of printed circuit boards (especially multilayered coreless substrates) can be sufficiently reduced (achieving low warpage) song). That is, if the formulas (7) and (8) related to the loss elastic modulus are met, and if the formulas (7A) and (8A) are better matched, it can be said that there is no clear glass transition temperature (Tg) (no Tg) as Synonymously, if the hardened product only conforms to the formulae (7) and (8), it preferably conforms to the formulae (7A) and (8A) and does not conform to the formulae (4) to (6), and preferably does not conform to the formulae (4A) to (6A). ), The loss of elastic modulus itself is small and it is not easy to elongate, but when it is made into a printed circuit board, this elongation difficulty will cause it to be difficult to achieve low warpage. In contrast, if the hardened material not only conforms to the formulae (7) and (8), preferably the formulae (7A) and (8A), but also conforms to the formulae (4) to (8), and preferably the formulae (4A) and (8A), then Since it does not have Tg, it is not easy to stretch and the printed circuit board tends to achieve low warpage.

預浸體之硬化物之機械特性(貯藏彈性模數E’及損失彈性模數E”)之測定方法不特別限定,例如可依下列方法測定。亦即,在預浸體1片之上下兩面配置銅箔(3EC-VLP、三井金屬礦業(股)製,厚度12μm),於壓力30kgf/cm2 、溫度230℃實施100分鐘之疊層成形(熱硬化),獲得預定之絕緣層厚度之覆銅箔疊層板。然後將獲得之覆銅箔疊層板以切割鋸切成尺寸5.0mm×20mm後,利用蝕刻去除表面的銅箔,獲得測定用樣本。使用此測定用樣本,依據JIS C6481使用動態黏彈性分析裝置(TA INSTRUMENT製),以DMA法能夠測定機械特性(貯藏彈性模數E’及損失彈性模數E”)。此時亦可求出n=3之平均値。The measurement method of the mechanical properties (storage elastic modulus E 'and loss elastic modulus E ") of the hardened body of the prepreg is not particularly limited, and it can be measured, for example, by the following method. That is, on the top and bottom sides of one prepreg A copper foil (3EC-VLP, made by Mitsui Metals Mining Co., Ltd., thickness 12 μm) is arranged, and laminated molding (thermosetting) is performed at a pressure of 30 kgf / cm 2 and a temperature of 230 ° C. for 100 minutes to obtain a coating with a predetermined insulation layer thickness. Copper foil laminate. The obtained copper-clad laminate was cut with a saw to a size of 5.0 mm × 20 mm, and then the copper foil on the surface was removed by etching to obtain a sample for measurement. Using this sample for measurement, conform to JIS C6481 Using a dynamic viscoelasticity analyzer (manufactured by TA Instruments), the mechanical properties (storage elastic modulus E 'and loss elastic modulus E ") can be measured by the DMA method. At this time, an average 値 of n = 3 can also be obtained.

[用途] 本實施形態之印刷電路板用樹脂組成物適合作為預浸體、樹脂片、絕緣層、疊層板、覆金屬箔疊層板、印刷電路板、或多層印刷電路板使用。以下針對預浸體、樹脂片、疊層板、覆金屬箔疊層板、及印刷電路板(包括多層印刷電路板)説明。[Application] The resin composition for a printed circuit board of this embodiment is suitable for use as a prepreg, a resin sheet, an insulating layer, a laminated board, a metal foil-clad laminated board, a printed circuit board, or a multilayer printed circuit board. The following is a description of prepregs, resin sheets, laminated boards, metal foil-clad laminated boards, and printed circuit boards (including multilayer printed circuit boards).

[預浸體] 本實施形態之預浸體含有基材及含浸或塗佈於該基材之印刷電路板用樹脂組成物。預浸體之製造方法可依照常法進行,無特殊限制。例如:藉由將本實施形態中之印刷電路板用樹脂組成物含浸或塗佈於基材後,於100~200℃之乾燥機中加熱1~30分鐘等而使其半硬化(B階段化),可製作本實施形態之預浸體。[Prepreg] The prepreg according to this embodiment includes a substrate and a resin composition for a printed circuit board impregnated or coated on the substrate. The manufacturing method of the prepreg can be carried out according to a conventional method, and there is no particular limitation. For example, after impregnating or coating the resin composition for a printed circuit board in this embodiment with a substrate, heating it in a dryer at 100 to 200 ° C for 1 to 30 minutes, etc. to make it semi-hardened (B-staged) ) To produce a prepreg according to this embodiment.

本實施形態之預浸體中,印刷電路板用樹脂組成物(包括填充材(E))之含量,相對於預浸體之總量較佳為30~90體積%,更佳為35~85體積%,又更佳為40~80體積%。樹脂組成物之含量藉由為上述範圍內,有成形性更好的傾向。The content of the resin composition (including the filler (E)) for the printed circuit board in the prepreg of this embodiment is preferably 30 to 90% by volume, more preferably 35 to 85, relative to the total amount of the prepreg. The volume% is more preferably 40 to 80 volume%. When the content of the resin composition is within the above range, the moldability tends to be better.

基材不特別限定,可依據目的之用途、性能適當選用各種使用在印刷電路板材料的公知基材。基材,例如:玻璃基材、玻璃以外之無機基材、有機基材等,其中,考量高剛性、及加熱尺寸安定性之觀點,玻璃基材特別理想。構成該等基材之纖維之具體例不特別限定,玻璃基材例如可列舉選自由E玻璃、D玻璃、S玻璃、T玻璃、Q玻璃、L玻璃、NE玻璃、HME玻璃構成之群組中之1種以上之玻璃之纖維。又,玻璃以外之無機基材,可列舉石英等玻璃以外之無機纖維。再者,有機基材可列舉聚對苯二甲醯對苯二胺(Poly-paraphenylene terephthalamide)(KEVLAR(註冊商標)、杜邦(股)公司製)、共聚對苯二甲醯對苯二胺・對苯二甲醯3,4’氧基二苯二胺(copoly-(paraphenlene/3,4-oxydiphenylene terephthalamide)(Technora(註冊商標)、TEIJIN TECHNO PRODUCTS(股)公司製)等全芳香族聚醯胺;2,6-羥基萘甲酸・對羥基苯甲酸(Vectran(註冊商標)、可樂麗(股)公司製)、Zxion(註冊商標、KB seiren製)等聚酯;聚對伸苯基苯并雙唑(poly(p-phenylene-2,6-benzobisoxazole)(Zylon(註冊商標)、東洋紡(股)公司製)、聚醯亞胺等有機纖維。此等基材可單獨使用1種也可併用2種以上。The substrate is not particularly limited, and various known substrates used in printed circuit board materials can be appropriately selected depending on the purpose and performance of the purpose. The substrate is, for example, a glass substrate, an inorganic substrate other than glass, an organic substrate, and the like. Among them, a glass substrate is particularly preferable from the viewpoints of high rigidity and stability of heating dimensions. Specific examples of the fibers constituting these substrates are not particularly limited. For example, the glass substrate may be selected from the group consisting of E glass, D glass, S glass, T glass, Q glass, L glass, NE glass, and HME glass. Fiber of more than one kind of glass. Examples of the inorganic substrate other than glass include inorganic fibers other than glass such as quartz. Examples of the organic substrate include poly-paraphenylene terephthalamide (KEVLAR (registered trademark), manufactured by DuPont), and copolymerized para-phenylene terephthalamide. Fully aromatic polyfluorene such as copoly- (paraphenlene / 3,4-oxydiphenylene terephthalamide) (Technora (registered trademark), TEIJIN TECHNO PRODUCTS (shares) company) Amine; Polyesters such as 2,6-hydroxynaphthoic acid and p-hydroxybenzoic acid (Vectran (registered trademark), Kuraray Co., Ltd.), Zxion (registered trademark, manufactured by KB Seiren); polyparaphenylene benzo double Organic fibers such as poly (p-phenylene-2,6-benzobisoxazole) (Zylon (registered trademark), manufactured by Toyobo Co., Ltd.), polyimide, etc. These substrates can be used alone or in combination. 2 More than that.

基材之形狀不特別限定,可列舉例如:織布、不織布、粗紗、切股氈、表面氈等。織布之織法不特別限定,例如:平織、斜子織(basket weave)、斜紋織(twill weave)等為已知,可從此等公知法依目的之用途、性能適當選用。又,將此等予以開纖處理者或以矽烷偶聯劑等表面處理之玻璃織布可理想地使用。基材之厚度、質量不特別限定,通常為約0.01~0.3mm者係合適。尤其考量強度與吸水性之觀點,基材為厚度200μm以下、質量250g/m2以下之玻璃織布較理想,由E玻璃、S玻璃、及T玻璃之玻璃纖維構成之玻璃織布更理想。The shape of the substrate is not particularly limited, and examples thereof include woven fabrics, non-woven fabrics, rovings, cut felts, and surface felts. The weaving method of the weaving cloth is not particularly limited. For example, plain weaving, basket weave, twill weave, etc. are known, and these publicly known laws can be appropriately selected according to the purpose and performance of the purpose. In addition, a glass woven fabric which has been subjected to a fiber opening treatment or a surface treatment with a silane coupling agent can be preferably used. The thickness and quality of the base material are not particularly limited, but usually about 0.01 to 0.3 mm is suitable. Especially considering the viewpoint of strength and water absorption, it is preferable that the substrate is a glass woven fabric having a thickness of 200 μm or less and a mass of 250 g / m 2 or less, and a glass woven fabric composed of glass fibers of E glass, S glass, and T glass is more preferable.

又,如上所述,本實施形態之預浸體,將其於230℃及100分之條件熱硬化而獲得之硬化物若符合上式(4)~(8)較佳為式(4A)~(8A)表示之關於機械特性之物性參數之數値範圍,則疊層板、覆金屬箔疊層板、印刷電路板、或多層印刷電路板不存在明確的玻璃轉移溫度(無Tg)且有能充分減小翹曲(達成低翹曲),故較理想。As described above, the prepreg of this embodiment is preferably a formula (4) to (8) if the cured product obtained by thermally curing the prepreg at 230 ° C and 100 minutes meets the formulae (4) to (8). (8A) The range of the physical parameter about the mechanical characteristics indicated, the laminated board, metal foil-clad laminated board, printed circuit board, or multilayer printed circuit board does not have a clear glass transition temperature (no Tg) and there is It can reduce warpage sufficiently (to achieve low warpage), so it is ideal.

[樹脂片] 本實施形態之樹脂片,具有:片狀基材(支持體),及疊層於該片狀基材之單面或兩面之上述印刷電路板用樹脂組成物。樹脂片使用為薄片化的一種方法,例如可藉由在金屬箔、薄膜等支持體直接塗佈預浸體等中使用的熱硬化性樹脂(包括填充材(E))並乾燥而製造。[Resin sheet] The resin sheet according to this embodiment includes a sheet-like substrate (support) and the above-mentioned resin composition for a printed circuit board laminated on one or both sides of the sheet-like substrate. The resin sheet is used as a method of thinning, and can be produced, for example, by directly coating a thermosetting resin (including a filler (E)) used in a prepreg or the like on a support such as a metal foil or a film, and drying it.

片狀基材不特別限定,可使用可採用為各種印刷電路板材料的公知物。例如聚醯亞胺薄膜、聚醯胺薄膜、聚酯薄膜、聚對苯二甲酸乙二醇酯(PET)薄膜、聚對苯二甲酸丁二醇酯(PBT)薄膜、聚丙烯(PP)薄膜、聚乙烯(PE)薄膜、鋁箔、銅箔、金箔等。其中電解銅箔、PET薄膜較佳。The sheet-like substrate is not particularly limited, and known materials that can be used as various printed circuit board materials can be used. For example, polyimide film, polyimide film, polyester film, polyethylene terephthalate (PET) film, polybutylene terephthalate (PBT) film, polypropylene (PP) film , Polyethylene (PE) film, aluminum foil, copper foil, gold foil, etc. Among them, electrolytic copper foil and PET film are preferred.

塗佈方法,例如:將本實施形態之印刷電路板用樹脂組成物溶於溶劑獲得溶液後,利用塗佈棒、模塗機、刮刀、貝克塗抹器等塗佈在片狀基材上的方法。The coating method is, for example, a method in which the resin composition for a printed circuit board of the present embodiment is dissolved in a solvent to obtain a solution, and then coated on a sheet-shaped substrate by a coating rod, a die coater, a doctor blade, a Baker applicator, or the like. .

樹脂片,宜為將上述印刷電路板用樹脂組成物塗佈於片狀基材後使其半硬化(B階段化)而得者較佳。具體而言,例如:將上述印刷電路板用樹脂組成物塗佈於銅箔等片狀基材後,利用於100~200℃之乾燥機中加熱1~60分鐘之方法等使其半硬化並製造樹脂片之方法等。印刷電路板用樹脂組成物對於片狀基材之附著量,按樹脂片之樹脂厚計,宜為1~300μm之範圍較佳。The resin sheet is preferably one obtained by applying the resin composition for a printed circuit board to a sheet-like substrate and then semi-hardening (B-stage). Specifically, for example, the resin composition for a printed circuit board is coated on a sheet-like substrate such as copper foil, and then semi-hardened by heating in a dryer at 100 to 200 ° C for 1 to 60 minutes. Method for manufacturing resin sheet and the like. The adhesion amount of the resin composition for a printed circuit board to a sheet-like substrate is preferably in the range of 1 to 300 μm based on the resin thickness of the resin sheet.

[疊層板及覆金屬箔疊層板] 本實施形態之疊層板,具有疊層了至少1片以上之本實施形態之上述預浸體及/或本實施形態之上述樹脂片。又,本實施形態之覆金屬箔疊層板,具有:本實施形態之疊層板(亦即,疊層了至少1片以上之本實施形態之上述預浸體及/或本實施形態之上述樹脂片),以及配置在此疊層板之單面或兩面之金屬箔(導體層)。[Laminated Sheet and Metal-Foil Laminated Sheet] The laminated sheet according to this embodiment includes at least one sheet of the prepreg of the present embodiment and / or the resin sheet of the present embodiment. The metal foil-clad laminate according to this embodiment includes the laminate according to this embodiment (that is, at least one sheet of the prepreg according to this embodiment and / or the above-mentioned prepreg according to this embodiment are laminated. Resin sheet), and metal foil (conductor layer) disposed on one or both sides of the laminated board.

導體層可為銅、鋁等金屬箔。在此使用之金屬箔,只要是印刷電路板材料中使用者即可,不特別限定,宜為壓延銅箔、電解銅箔等公知之銅箔較佳。又,導體層之厚度不特別限定,1~70μm較理想,更佳為1.5~35μm。The conductor layer may be a metal foil such as copper or aluminum. The metal foil used here is not particularly limited as long as it is a user in a printed circuit board material, and is preferably a known copper foil such as a rolled copper foil or an electrolytic copper foil. The thickness of the conductive layer is not particularly limited, but is preferably 1 to 70 μm, and more preferably 1.5 to 35 μm.

疊層板或覆金屬箔疊層板之成形方法及其成形條件不特別限定,可採用一般的印刷電路板用疊層板及多層板的方法及條件。例如:疊層板或覆金屬箔疊層板成形時可使用多段壓製機、多段真空壓製機、連續成形機、高壓釜成形機等。又,疊層板或覆金屬箔疊層板之成形(疊層成形)中,一般而言,溫度為100~300℃、壓力為面壓2~100kgf/cm2 、加熱時間為0.05~5小時之範圍。再者,視需要也可於150~300℃之溫度進行後硬化。尤其使用多段壓製機時,考量充分促進預浸體/或樹脂片之硬化之觀點,溫度200℃~250℃、壓力10~40kgf/cm2 、加熱時間80分~130分較理想,溫度215℃~235℃、壓力25~35kgf/cm2 、加熱時間90分~120分更理想。又,也可藉由將上述預浸體及/或樹脂片與另外製作之內層用之配線板組合並疊層成形,而製成多層板。The method for forming a laminated board or a metal foil-clad laminated board and the forming conditions thereof are not particularly limited, and methods and conditions for a general laminated board for a printed circuit board and a multilayer board can be used. For example, multi-stage presses, multi-stage vacuum presses, continuous forming machines, autoclave forming machines, etc. can be used for forming laminated plates or metal-clad laminated plates. In addition, in forming a laminated plate or a metal-clad laminated plate (laminate forming), generally, the temperature is 100 to 300 ° C., the pressure is 2 to 100 kgf / cm 2 , and the heating time is 0.05 to 5 hours. Range. Further, if necessary, post-curing may be performed at a temperature of 150 to 300 ° C. Especially when using a multi-stage press, consider the viewpoint of fully promoting the hardening of the prepreg and / or resin sheet. The temperature is 200 ° C to 250 ° C, the pressure is 10 to 40kgf / cm 2 , and the heating time is 80 minutes to 130 minutes. The temperature is 215 ° C. It is more preferable to be -235 ° C, a pressure of 25 to 35 kgf / cm 2 , and a heating time of 90 minutes to 120 minutes. Furthermore, a multilayer board can also be produced by combining the prepreg and / or resin sheet and a wiring board for an inner layer that is separately produced, and forming a multilayer board.

[印刷電路板] 本實施形態之印刷電路板具有絕緣層及形成在該絕緣層之表面之導體層,絕緣層含有上述印刷電路板用樹脂組成物。例如藉由在上述覆金屬箔疊層板形成預定之配線圖案,可理想地作為印刷電路板。如上述,使用了本實施形態之印刷電路板用樹脂組成物之覆金屬箔疊層板,有不存在明確的玻璃轉移溫度(無Tg)且能充分減小翹曲(達成低翹曲)的傾向,故作為要求如此的性能的印刷電路板特別有效。[Printed Circuit Board] The printed circuit board of this embodiment includes an insulating layer and a conductor layer formed on the surface of the insulating layer, and the insulating layer contains the resin composition for a printed circuit board described above. For example, by forming a predetermined wiring pattern on the metal foil-clad laminate, it can be ideally used as a printed circuit board. As described above, the metal foil-clad laminate using the resin composition for a printed circuit board of the present embodiment has no clear glass transition temperature (no Tg) and can sufficiently reduce warpage (to achieve low warpage). Tends to be particularly effective as a printed wiring board requiring such performance.

本實施形態之印刷電路板,具體而言例如可依以下方法製造。首先準備上述覆金屬箔疊層板(覆銅疊層板等)。對於覆金屬箔疊層板之表面實施蝕刻處理,形成內層電路,製作內層基板。對於此內層基板之內層電路表面視需要實施為了提高黏著強度之表面處理,然後於此內層電路表面疊層需要片數的上述預浸體及/或樹脂片,再於其外側疊層外層電路用之金屬箔,加熱加壓並一體成形(疊層成形)。依此方式,製造於內層電路與外層電路用之金屬箔之間形成了基材及由熱硬化性樹脂組成物之硬化物構成之絕緣層的多層疊層板。疊層成形的方法及其成形條件,與上述疊層板或覆金屬箔疊層板同樣。然後,對於此多層疊層板施加通孔、介層孔用之開孔加工後,為了去除來自硬化物層中含有之樹脂成分之樹脂之殘渣即膠渣,進行除膠渣處理。之後在此孔的壁面形成使內層電路與外層電路用之金屬箔導通之鍍敷金屬皮膜,再對於外層電路用之金屬箔實施蝕刻處理,形成外層電路,製造印刷電路板。Specifically, the printed wiring board of this embodiment can be manufactured by the following method, for example. First, the above-mentioned metal-clad laminate (copper-clad laminate, etc.) is prepared. The surface of the metal foil-clad laminate is etched to form an inner-layer circuit, and an inner-layer substrate is produced. The inner layer circuit surface of this inner layer substrate is optionally subjected to a surface treatment to improve the adhesive strength, and then the above-mentioned prepreg and / or resin sheet of the required number are laminated on the inner circuit surface, and then laminated on the outer side thereof The metal foil for the outer layer circuit is heated and pressurized and formed integrally (laminated). In this manner, a multilayer laminated board having a base material and an insulating layer made of a cured product of a thermosetting resin composition between the inner layer circuit and the metal foil for the outer layer circuit is manufactured. The method of lamination forming and the forming conditions thereof are the same as those of the above-mentioned laminated plate or metal foil-clad laminated plate. Then, after applying through-hole processing for the through-holes and interlayer holes to this multilayer laminated board, in order to remove the slag, which is a residue from the resin component resin contained in the hardened material layer, a slag removal treatment is performed. After that, a plating metal film is formed on the wall surface of the hole to allow the inner layer circuit and the outer layer metal foil to be conducted, and then the metal foil for the outer layer circuit is etched to form an outer layer circuit to manufacture a printed circuit board.

例如:上述預浸體(基材及附著於基材的上述印刷電路板用樹脂組成物)、覆金屬箔疊層板之樹脂組成物層(由上述印刷電路板用樹脂組成物構成之層),構成上述含有印刷電路板用樹脂組成物之絕緣層。For example: the prepreg (the substrate and the resin composition for a printed circuit board attached to the substrate), and a resin composition layer (a layer composed of the resin composition for a printed circuit board) of a metal foil-clad laminate To form the insulating layer containing the resin composition for a printed circuit board.

又,不使用覆金屬箔疊層板時,也可在上述預浸體或由上述印刷電路板用樹脂組成物構成者形成成為電路的導體層,並製作印刷電路板。此時,導體層之形成亦可使用無電解鍍敷的方法。When a metal foil-clad laminate is not used, a conductor layer to be a circuit may be formed on the prepreg or the resin composition for a printed wiring board, and a printed wiring board may be produced. In this case, the formation of the conductive layer may also be performed by an electroless plating method.

再者,本實施形態之印刷電路板,如圖9所示,宜具有多數絕緣層及多數導體層,該多數絕緣層係由第1絕緣層(1)及第2絕緣層(2)構成,該第1絕緣層(1)以疊層了至少1片以上之選自由上述預浸體及樹脂片構成之群組中之至少1種形成,該第2絕緣層(2)以在該第1絕緣層(1)之單面方向(圖示下面方向)疊層了至少1片以上之選自由上述預浸體及樹脂片構成之群組中之至少1種形成; 該多數導體層係由第1導體層(3)及第2導體層(3)構成,該第1導體層(3)配置在此等多數絕緣層(1,2)的各絕緣層之間,該第2導體層(3)配置在此等多數絕緣層(1,2)的最外層。In addition, as shown in FIG. 9, the printed circuit board of this embodiment preferably has a plurality of insulating layers and a plurality of conductor layers, and the plurality of insulating layers are composed of a first insulating layer (1) and a second insulating layer (2). The first insulating layer (1) is formed by laminating at least one piece of at least one selected from the group consisting of the above-mentioned prepreg and resin sheet, and the second insulating layer (2) is formed on the first The insulating layer (1) is formed by laminating at least one piece or more of at least one selected from the group consisting of the above-mentioned prepreg and resin sheet on one side of the insulating layer (the direction below the figure); the majority of the conductor layers are formed by The first conductor layer (3) and the second conductor layer (3) are configured. The first conductor layer (3) is disposed between the insulating layers of the plurality of insulating layers (1,2). The second conductor layer (3) ) Is disposed on the outermost layer of most of these insulating layers (1,2).

依照本案發明人等的知識見解,通常的疊層板,例如係藉由在選自由一核心基板即預浸體及樹脂片構成之群組中之至少1種的兩面方向疊層其他選自由預浸體及樹脂片構成之群組中之至少1種以形成多層印刷電路板,但是確認了本實施形態之選自由預浸體及樹脂片構成之群組中之至少1種,對於僅在形成第1絕緣層(1)之選自由一預浸體及樹脂片構成之群組中之至少1種之單面方向疊層形成第2絕緣層(2)之另一選自由預浸體及樹脂片構成之群組中之至少1種,藉此製造之無核心型的多層印刷電路板(多層無核心基板)尤其有效。According to the knowledge and knowledge of the inventors of the present case, a general laminated board is, for example, laminated on both sides of at least one selected from the group consisting of a core substrate, that is, a prepreg and a resin sheet. At least one of the group consisting of a immersion body and a resin sheet is used to form a multilayer printed circuit board, but it has been confirmed that at least one of the groups selected from the group consisting of a prepreg and a resin sheet is used in this embodiment. At least one of the first insulating layer (1) selected from the group consisting of a prepreg and a resin sheet is laminated on one side to form a second insulating layer (2). The other is selected from a prepreg and a resin. A coreless multilayer printed circuit board (multilayer coreless substrate) manufactured by using at least one of the group consisting of sheets is particularly effective.

換言之,本實施形態之預浸體、樹脂片、及印刷電路板用樹脂組成物使用在印刷電路板時,能夠有效地減少其翹曲量,雖無特殊限定,但印刷電路板之中又以多層無核心基板尤其有效。亦即,通常的印刷電路板一般係採兩面對稱的結構,有不易翹曲的傾向,而多層無核心基板容易成為兩面非對稱的結構,因此比起通常的印刷電路板,有較易翹曲的傾向。因此藉由使用本實施形態之預浸體、樹脂片、及印刷電路板用樹脂組成物,能特別有效地減少以往有易翹曲的傾向的多層無核心基板之翹曲量。In other words, when the prepreg, the resin sheet, and the resin composition for a printed circuit board of this embodiment are used in a printed circuit board, the amount of warpage can be effectively reduced. Multi-layer coreless substrates are particularly effective. That is, the general printed circuit board generally adopts a symmetrical structure on both sides, which tends to be difficult to warp, and the multilayer non-core substrate is prone to become asymmetrical on both sides. Therefore, it is more likely to warp than a normal printed circuit board Propensity. Therefore, by using the prepreg, the resin sheet, and the resin composition for a printed circuit board of this embodiment, the amount of warpage of a multilayer coreless substrate that has tended to tend to warp in the past can be particularly effectively reduced.

又,圖9中顯示1片第1絕緣層(1)上疊層了2片第2絕緣層(2)的結構(亦即多數絕緣層為3層的結構),但第2絕緣層(2)可為1片也可為2片以上。因此第1導體層(3)可為1層也可為2層以上。9 shows a structure in which two pieces of the second insulating layer (2) are laminated on one piece of the first insulating layer (1) (that is, a structure in which most of the insulating layers are three layers), but the second insulating layer (2 ) May be 1 piece or 2 or more pieces. Therefore, the first conductor layer (3) may be one layer or two or more layers.

如上,具有上述構成之本實施形態之印刷電路板,藉由上述本實施形態之印刷電路板用樹脂組成物可將例如使預浸體硬化而得之硬化物中,熱貯藏彈性模數、損失彈性模數等機械特性控制在適合低翹曲的特定範圍,藉此,不存在明確的玻璃轉移溫度(無Tg)、且可充分減小印刷電路板尤其多層無核心基板的翹曲(達成低翹曲),故能有效地使用於作為半導體封裝體用印刷電路板及多層無核心基板。 [實施例]As described above, the printed circuit board of the present embodiment having the above-mentioned structure can be subjected to the thermal storage elastic modulus and loss of the hardened material obtained by hardening the prepreg, for example, by using the resin composition for a printed circuit board of the present embodiment. Mechanical properties such as elastic modulus are controlled in a specific range suitable for low warpage. Thereby, there is no clear glass transition temperature (no Tg), and the warpage of printed circuit boards, especially multilayer coreless substrates can be sufficiently reduced (achieving low Warpage), so it can be effectively used as printed circuit boards for semiconductor packages and multilayer coreless substrates. [Example]

以下使用實施例及比較例更具體説明本發明。惟本發明不受下列實施例限定。Hereinafter, the present invention will be described more specifically using examples and comparative examples. However, the present invention is not limited to the following examples.

[合成例1]α-萘酚芳烷基型氰酸酯化合物(SN495VCN)之合成 於反應器內,使α-萘酚芳烷基樹脂(SN495V、OH基當量:236g/eq.、新日鐵化學(股)製:含有萘酚芳烷基之重複單元數n為1~5者。)0.47莫耳(OH基換算)溶於氯仿500ml,於此溶液中添加三乙胺0.7莫耳。維持溫度為-10℃的狀態,於反應器內費時1.5小時滴加0.93莫耳的氯化氰的氯仿溶液300g,滴加結束後攪拌30分鐘。之後再滴加0.1莫耳之三乙胺與氯仿30g之混合溶液於反應器內,攪拌30分鐘使反應結束。將副生的三乙胺的鹽酸鹽從反應液分濾掉後,將獲得之濾液以0.1N鹽酸500ml洗淨,之後以水500ml重複洗淨4次。將其以硫酸鈉乾燥後,於75℃進行蒸發,再於90℃進行減壓脱氣,獲得上式(2)表示之α-萘酚芳烷基型氰酸酯化合物(式中之R6 皆為氫原子)。利用紅外吸收光譜分析獲得之α-萘酚芳烷基型氰酸酯化合物,確認在2264cm-1 附近有氰酸酯基之吸收。[Synthesis Example 1] Synthesis of α-naphthol aralkyl cyanate compound (SN495VCN) in a reactor, and α-naphthol aralkyl resin (SN495V, OH group equivalent: 236 g / eq., Nissin Made by ferrochemical (stock): those containing naphthol aralkyl repeating units n is 1 to 5.) 0.47 mole (in terms of OH group) is dissolved in 500 ml of chloroform, and 0.7 mole of triethylamine is added to this solution. While maintaining the temperature at -10 ° C, 300 g of a 0.93 mole of cyanogen chloride chloroform solution was added dropwise in the reactor over 1.5 hours, and stirred for 30 minutes after the dropwise addition was completed. Then, a mixed solution of 0.1 mol of triethylamine and 30 g of chloroform was added dropwise to the reactor, and the reaction was completed by stirring for 30 minutes. After the by-product triethylamine hydrochloride was separated and filtered from the reaction solution, the obtained filtrate was washed with 500 ml of 0.1 N hydrochloric acid, and then washed repeatedly with 500 ml of water four times. This was dried over sodium sulfate, evaporated at 75 ° C, and degassed at 90 ° C under reduced pressure to obtain an α-naphthol aralkyl cyanate compound represented by the above formula (2) (wherein R 6 Are all hydrogen atoms). The obtained α-naphthol aralkyl type cyanate compound was analyzed by infrared absorption spectrum, and absorption of a cyanate group was confirmed in the vicinity of 2264 cm -1 .

[實施例1] 將係烯丙基苯酚化合物(A)之二烯丙基雙酚A(DABPA、大和化成工業(股)製、羥基當量:154g/eq.)24.1質量份、馬來醯亞胺化合物(B)(BMI-2300、大和化成工業(股)製、馬來醯亞胺當量:186g/eq.)60.9質量份、係氰酸酯化合物之(C)合成例1之α-萘酚芳烷基型氰酸酯化合物(SN495VCN、氰酸酯當量:261g/eq.)5.0質量份、環氧化合物(D)(NC-3000FH、日本化藥(股)製、環氧當量:328g/eq.)10.0質量份、係填充材(E)之二氧化矽漿液(SC-2050MB、Admatechs(股)製)200質量份及同聚矽氧複合粉末(KMP-605M、信越化學工業(股)製)25質量份、矽烷偶聯劑(KBM-403、信越化學工業(股)製)5質量份、及係硬化促進劑之三苯基咪唑(東京化成工業(股)製)0.5質量份混合,以甲乙酮稀釋,獲得清漆。將此清漆含浸塗佈於E玻璃織布,於160℃進行3分鐘加熱乾燥,獲得印刷電路板用樹脂組成物含量73體積%之預浸體。[Example 1] 24.1 parts by mass of diallyl bisphenol A (DABPA, manufactured by Daiwa Chemical Industry Co., Ltd., hydroxyl equivalent: 154 g / eq.), Allyl phenol compound (A) 60.9 parts by mass of amine compound (B) (BMI-2300, manufactured by Daiwa Chemical Industry Co., Ltd., maleimide equivalent: 186 g / eq.), Α-naphthalene of (C) Synthesis Example 1 of a cyanate compound 5.0 parts by mass of a phenol aralkyl cyanate compound (SN495VCN, cyanate equivalent: 261 g / eq.), Epoxy compound (D) (NC-3000FH, manufactured by Nippon Kayaku Co., Ltd.), epoxy equivalent: 328 g / eq.) 10.0 parts by mass, 200 parts by mass of silica dioxide slurry (SC-2050MB, manufactured by Admatechs), and filler material (E), and polysilicone composite powder (KMP-605M, Shin-Etsu Chemical Industry Co., Ltd. ) 25 parts by mass, 5 parts by mass of a silane coupling agent (KBM-403, manufactured by Shin-Etsu Chemical Co., Ltd.), and 0.5 parts by mass of triphenylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd.) as a hardening accelerator. Mix and dilute with methyl ethyl ketone to obtain a varnish. This varnish was impregnated and coated on an E glass woven fabric, and heated and dried at 160 ° C. for 3 minutes to obtain a prepreg having a resin composition content of 73% by volume for a printed circuit board.

[實施例2] 將烯丙基苯酚化合物(A)(DABPA)改為19.9質量份、馬來醯亞胺化合物(B)(BMI-2300)改為50.1質量份、氰酸酯化合物(C)(SN495VCN)改為10.0質量份、及環氧化合物(D)(NC-3000FH)改為20.0質量份,除此以外依與實施例1同樣的方法,獲得印刷電路板用樹脂組成物含量73體積%之預浸體。[Example 2] The allylphenol compound (A) (DABPA) was changed to 19.9 parts by mass, the maleimide compound (B) (BMI-2300) was changed to 50.1 parts by mass, and the cyanate compound (C) (SN495VCN) was changed to 10.0 parts by mass, and the epoxy compound (D) (NC-3000FH) was changed to 20.0 parts by mass. In the same manner as in Example 1, the resin composition content for the printed circuit board was 73 vol. % Of prepreg.

[實施例3] 不使用氰酸酯化合物(C)(SN495VCN),環氧化合物(D)(NC-3000FH)改為15.0質量份,除此以外依和實施例1同樣的方法,獲得印刷電路板用樹脂組成物含量73體積%之預浸體。[Example 3] A printed circuit was obtained in the same manner as in Example 1 except that the cyanate compound (C) (SN495VCN) was not used, and the epoxy compound (D) (NC-3000FH) was changed to 15.0 parts by mass. A prepreg with a resin composition content of 73% by volume.

[實施例4] 氰酸酯化合物(C)(SN495VCN)改為15.0質量份,不使用環氧化合物(D)(NC-3000FH),除此以外依和實施例1同樣的方法,獲得印刷電路板用樹脂組成物含量73體積%之預浸體。[Example 4] A cyanate ester compound (C) (SN495VCN) was changed to 15.0 parts by mass, and an epoxy compound (D) (NC-3000FH) was not used. A printed circuit was obtained by the same method as in Example 1. A prepreg with a resin composition content of 73% by volume.

[比較例1] 烯丙基苯酚化合物(A)(DABPA)改為28.4質量份、馬來醯亞胺化合物(B)(BMI-2300)改為71.6質量份,不使用氰酸酯化合物(C)(SN495VCN),不使用環氧化合物(D)(NC-3000FH),除此以外依和實施例1同樣的方法,獲得印刷電路板用樹脂組成物含量73體積%之預浸體。[Comparative Example 1] The allylphenol compound (A) (DABPA) was changed to 28.4 parts by mass, the maleimide compound (B) (BMI-2300) was changed to 71.6 parts by mass, and the cyanate compound (C ) (SN495VCN), except that epoxy compound (D) (NC-3000FH) was not used, and a prepreg having a resin composition content of 73 vol% for a printed circuit board was obtained in the same manner as in Example 1.

[比較例2] 烯丙基苯酚化合物(A)(DABPA)改為60.0質量份、馬來醯亞胺化合物(B)(BMI-2300)改為32.1質量份、氰酸酯化合物(C)(SN495VCN)改為2.6質量份,環氧化合物(D)(NC-3000FH)改為5.3質量份,除此以外依和實施例1同樣的方法,獲得印刷電路板用樹脂組成物含量73體積%之預浸體。[Comparative Example 2] The allylphenol compound (A) (DABPA) was changed to 60.0 parts by mass, the maleimide compound (B) (BMI-2300) was changed to 32.1 parts by mass, and the cyanate compound (C) ( SN495VCN) was changed to 2.6 parts by mass, and the epoxy compound (D) (NC-3000FH) was changed to 5.3 parts by mass. In the same manner as in Example 1, the resin composition content of the printed circuit board was 73% by volume. Prepreg.

[比較例3] 烯丙基苯酚化合物(A)(DABPA)改為12.7質量份、馬來醯亞胺化合物(B)(BMI-2300)改為32.1質量份、氰酸酯化合物(C)(SN495VCN)改為50.0質量份,且環氧化合物(D)(NC-3000FH)改為5.2質量份,除此以外依和實施例1同樣的方法,獲得印刷電路板用樹脂組成物含量73體積%之預浸體。[Comparative Example 3] The allylphenol compound (A) (DABPA) was changed to 12.7 parts by mass, the maleimide compound (B) (BMI-2300) was changed to 32.1 parts by mass, and the cyanate compound (C) ( SN495VCN) was changed to 50.0 parts by mass and the epoxy compound (D) (NC-3000FH) was changed to 5.2 parts by mass. In the same manner as in Example 1, the content of the resin composition for a printed circuit board was 73% by volume. Prepreg.

[比較例4] 烯丙基苯酚化合物(A)(DABPA)改為5.0質量份、馬來醯亞胺化合物(B)(BMI-2300)改為85.0質量份、氰酸酯化合物(C)(SN495VCN)改為5.0質量份,且環氧化合物(D)(NC-3000FH)改為5.0質量份,除此以外依和實施例1同樣的方法,獲得印刷電路板用樹脂組成物含量73體積%之預浸體。[Comparative Example 4] The allylphenol compound (A) (DABPA) was changed to 5.0 parts by mass, the maleimide compound (B) (BMI-2300) was changed to 85.0 parts by mass, and the cyanate compound (C) ( SN495VCN) was changed to 5.0 parts by mass, and the epoxy compound (D) (NC-3000FH) was changed to 5.0 parts by mass. In the same manner as in Example 1, the content of the resin composition for a printed circuit board was 73% by volume. Prepreg.

[物性測定評價] 使用實施例1~4及比較例1~4獲得之預浸體,依以下之各項目所示之程序製作物性測定評價用之樣本,測定評價機械特性(貯藏彈性模數、及損失彈性模數)、式(4)~(8)及式(4A)~(8A)中之關於機械特性之物性參數、玻璃轉移溫度(Tg)、及翹曲量(3種)。實施例之結果彙整於表1,比較例之結果彙整於表2。[Physical property measurement evaluation] Using the prepregs obtained in Examples 1 to 4 and Comparative Examples 1 to 4, a sample for physical property measurement evaluation was prepared according to the procedure shown in each of the following items, and the mechanical properties (storage elastic modulus, storage elastic modulus, And loss modulus of elasticity), physical property parameters related to mechanical properties in formulas (4) to (8) and formulas (4A) to (8A), glass transition temperature (Tg), and warpage amount (three types). The results of the examples are summarized in Table 1, and the results of the comparative examples are summarized in Table 2.

[機械特性] 在實施例1~4及比較例1~4獲得之預浸體1片之上下兩面配置銅箔(3EC-VLP、三井金屬礦業(股)製,厚度12μm),以壓力30kgf/cm2 、溫度230℃的條件實施100分鐘之疊層成形(熱硬化),獲得絕緣層厚度0.1mm之覆銅箔疊層板。將獲得之覆銅箔疊層板以切割鋸切斷為尺寸20mm×5mm後,利用蝕刻去除表面的銅箔,獲得測定用樣本。使用此測定用樣本,依據JISC6481以動態黏彈性分析裝置(TA INSTRUMENT製),依DMA法測定機械特性(貯藏彈性模數E’及損失彈性模數E”)(n=3之平均値)。[Mechanical properties] Copper foil (3EC-VLP, Mitsui Metals Mining Co., Ltd., thickness 12 μm) was placed on the upper and lower sides of one prepreg obtained in Examples 1 to 4 and Comparative Examples 1 to 4, and the pressure was 30 kgf / Lamination (thermal curing) was performed for 100 minutes under conditions of cm 2 and a temperature of 230 ° C. to obtain a copper-clad laminate with an insulation layer thickness of 0.1 mm. The obtained copper-clad laminate was cut with a dicing saw to a size of 20 mm × 5 mm, and then the copper foil on the surface was removed by etching to obtain a sample for measurement. Using this sample for measurement, the mechanical properties (storage elastic modulus E 'and loss elastic modulus E ") were measured by a dynamic viscoelasticity analyzer (manufactured by TA Instruments) in accordance with JIS C6481 according to the DMA method (n = 3 average 値).

[玻璃轉移溫度(Tg)] 在實施例1~4及比較例1~4獲得之預浸體1片之上下兩面配置銅箔(3EC-VLP、三井金屬礦業(股)製,厚度12μm),以壓力30kgf/cm2 、溫度230℃的條件實施100分鐘之疊層成形(熱硬化),獲得絕緣層厚度0.1mm之覆銅箔疊層板。將獲得之覆銅箔疊層板以切割鋸切斷成尺寸12.7×2.5mm後,利用蝕刻去除表面的銅箔,獲得測定用樣本。使用此測定用樣本,依據JISC6481以動態黏彈性分析裝置(TA INSTRUMENT製),利用DMA法測定玻璃轉移溫度(Tg)(n=3之平均値)。[Glass transition temperature (Tg)] Copper foils (3EC-VLP, made by Mitsui Metals Mining Co., Ltd., thickness 12 μm) are arranged on the upper and lower sides of one prepreg obtained in Examples 1 to 4 and Comparative Examples 1 to 4, Lamination (thermal curing) was performed for 100 minutes under conditions of a pressure of 30 kgf / cm 2 and a temperature of 230 ° C. to obtain a copper-clad laminated board having an insulation layer thickness of 0.1 mm. The obtained copper-clad laminate was cut with a dicing saw to a size of 12.7 × 2.5 mm, and then the copper foil on the surface was removed by etching to obtain a sample for measurement. Using this measurement sample, the glass transition temperature (Tg) (n = 3 average 値) was measured by a DMA method using a dynamic viscoelasticity analyzer (manufactured by TA Instruments) in accordance with JISC6481.

[翹曲量:雙金屬法] 首先,在實施例1~4及比較例1~4獲得之預浸體1片之上下兩面配置銅箔(3EC-VLP、三井金屬礦業(股)製,厚度12μm),以壓力30kgf/cm2 、溫度220℃實施120分鐘之疊層成形,獲得覆銅箔疊層板。然後從獲得之覆銅箔疊層板去除上述銅箔。其次,在已去除銅箔的疊層板的單面進一步配置實施例1~4及比較例1~4獲得之預浸體1片,並於其上下兩面配置上述銅箔(3EC-VLP、三井金屬礦業(股)製,厚度12μm),以壓力30kgf/cm2 、溫度220℃的條件實施120分鐘之疊層成形,獲得覆銅箔疊層板。再者,從獲得之覆銅箔疊層板去除上述銅箔,獲得疊層板。並且,從獲得之疊層板切出條狀的20mm×200mm的板片,使疊層在第2片的預浸體的面朝上,以金屬尺測定縱方向兩端之翹曲量之最大値,定義此平均値為以雙金屬法測得的「翹曲量」。[Warpage: Bimetal Method] First, copper foil (3EC-VLP, made by Mitsui Metals Mining Co., Ltd.) was placed on the upper and lower sides of one of the prepregs obtained in Examples 1 to 4 and Comparative Examples 1 to 4, and the thickness 12 μm), lamination was performed at a pressure of 30 kgf / cm 2 and a temperature of 220 ° C. for 120 minutes to obtain a copper-clad laminate. The copper foil was then removed from the obtained copper-clad laminate. Next, one sheet of the prepreg obtained in Examples 1 to 4 and Comparative Examples 1 to 4 was further arranged on one side of the laminated board from which copper foil was removed, and the above-mentioned copper foil (3EC-VLP, Mitsui It was made by metal mining (stock) (thickness: 12 μm), and laminated for 120 minutes at a pressure of 30 kgf / cm 2 and a temperature of 220 ° C. to obtain a copper-clad laminate. Furthermore, the copper foil was removed from the obtained copper-clad laminated sheet to obtain a laminated sheet. Then, a strip-shaped 20 mm × 200 mm plate was cut out from the obtained laminated plate, and the surface of the second prepreg was laminated upward, and the maximum amount of warpage at both ends in the longitudinal direction was measured with a metal ruler.値, this average 値 is defined as the "warpage amount" measured by the bimetal method.

[翹曲量:多層無核心基板] 首先,如圖1所示,在成為支持體(a)之預浸體之兩面將附設載體之極薄銅箔(b1)(MT18Ex、三井金屬礦業(股)製,厚度5μm)的載體銅箔面朝向預浸體側配置,於其上進一步配置實施例1~4及比較例1~4獲得之預浸體(c1),並於其上進一步配置銅箔(d)(3EC-VLP、三井金屬礦業(股)製,厚度12μm),以壓力30kgf/cm2 、溫度220℃的條件實施120分鐘之疊層成形,獲得圖2所示之覆銅箔疊層板。[Warpage: Multi-layer coreless substrate] First, as shown in FIG. 1, ultra-thin copper foil (b1) (MT18Ex, Mitsui Metals Mining Co., Ltd.) with a carrier will be attached to both sides of the prepreg that becomes the support (a). ), The thickness of the carrier copper foil is 5). The copper foil surface of the carrier is arranged facing the prepreg side, and the prepregs (c1) obtained in Examples 1 to 4 and Comparative Examples 1 to 4 are further arranged thereon, and copper is further arranged thereon. Foil (d) (3EC-VLP, manufactured by Mitsui Metals Mining Co., Ltd., thickness 12 μm), laminated for 120 minutes at a pressure of 30 kgf / cm 2 and a temperature of 220 ° C. to obtain a copper-clad foil as shown in FIG. 2 Laminated boards.

其次,將獲得之圖2所示之覆銅箔疊層板之上述銅箔(d),例如依圖3所示,蝕刻成預定之配線圖案,而形成導體層(d’)。然後,在已形成導體層(d’)之圖3所示之疊層板之上,如圖4所示,配置實施例1~4及比較例1~4獲得之預浸體(c2),於其上進一步配置附設載體之極薄銅箔(b2)(MT18Ex、三井金屬礦業(股)製,厚度5μm),以壓力30kgf/cm2 、溫度230℃的條件實施120分鐘之疊層成形,獲得圖5所示之覆銅箔疊層板。Next, the copper foil (d) of the obtained copper-clad laminate shown in FIG. 2 is etched into a predetermined wiring pattern as shown in FIG. 3 to form a conductor layer (d ′). Then, as shown in FIG. 4, the prepreg (c2) obtained in Examples 1 to 4 and Comparative Examples 1 to 4 was arranged on the laminated board shown in FIG. 3 where the conductor layer (d ′) was formed. An ultra-thin copper foil (b2) with a carrier (MT18Ex, manufactured by Mitsui Metals Mining Co., Ltd., 5 μm thick) was further disposed thereon, and laminated for 120 minutes under a condition of a pressure of 30 kgf / cm 2 and a temperature of 230 ° C. A copper-clad laminate shown in FIG. 5 was obtained.

其次,將圖5所示之覆銅箔疊層板中之配置於支持體(a)(硬化的支持體用預浸體)的附設載體之極薄銅箔(b1)的載體銅箔與極薄銅箔予以剝離,以如圖6所示,從支持體(a)將2片疊層板剝離,進一步從此等各疊層板中之上部之附設載體之極薄銅箔(b2)將載體銅箔剝離。然後,在獲得之各疊層板之上下之極薄銅箔上實施利用雷射加工機所為之加工,如圖7所示,以化學銅鍍敷形成預定之通孔(v)。然後,例如圖8所示,蝕刻為預定之配線圖案,形成導體層,獲得多層無核心基板之面板(尺寸:500mm×400mm)。然後,以金屬尺測定獲得之面板的4個角及4邊中央部分之合計8處的翹曲量,定義其平均値為多層無核心基板之面板之「翹曲量」。Next, in the copper-clad laminate shown in FIG. 5, the carrier copper foil and the electrode of the ultra-thin copper foil (b1) with a carrier arrange | positioned on the support body (a) (prepreg for hardened support body) are arrange | positioned. The thin copper foil was peeled to peel off the two laminates from the support (a) as shown in FIG. 6, and the carrier was further removed from the ultra-thin copper foil (b2) with a carrier in the upper part of each of these laminates. The copper foil was peeled. Then, the obtained ultra-thin copper foils on each of the obtained laminates were processed by a laser processing machine, and as shown in FIG. 7, predetermined through holes (v) were formed by electroless copper plating. Then, for example, as shown in FIG. 8, a predetermined wiring pattern is etched to form a conductor layer to obtain a multilayer coreless panel (size: 500 mm × 400 mm). Then, the total amount of warpage at the four corners of the panel and the center of the four sides was measured with a metal ruler, and the average value was defined as the "warpage" of the multi-layer, non-core substrate panel.

[回流步驟前後基板收縮率] 在實施例1~4及比較例1~4獲得之預浸體1片之上下兩面配置銅箔(3EC-VLP、三井金屬礦業(股)製,厚度12μm),以壓力30kgf/cm2 、溫度220℃的條件實施120分鐘的疊層成形,獲得覆銅箔疊層板。然後,對於獲得之覆銅箔疊層板以鑽機以格子狀均等地實施9點的開孔加工後,去除上述銅箔。[Substrate shrinkage ratio before and after the reflow step] Copper foils (3EC-VLP, made by Mitsui Metals Mining Co., Ltd., thickness 12 μm) are arranged on the upper and lower sides of one prepreg obtained in Examples 1 to 4 and Comparative Examples 1 to 4, Lamination was performed under conditions of a pressure of 30 kgf / cm 2 and a temperature of 220 ° C. for 120 minutes to obtain a copper-clad laminate. Then, the obtained copper-clad laminate was uniformly drilled at 9 o'clock in a grid pattern using a drill, and then the copper foil was removed.

然後,首先,測定已去除銅箔之疊層板之孔間的距離(距離I)。然後對於此疊層板,以SALAMANDER回流裝置,設260℃為最高溫度,實施回流處理。之後,再度測定疊層板中之孔間之距離(距離II)。然後,將測得的距離I與距離II代入到下式(I),求出回流處理之基板之尺寸變化率,定義此値為回流步驟前後基板收縮率。 ((距離I)-(距離II))/距離I×100…式(I)Then, first, the distance (distance I) between the holes of the laminated plate from which the copper foil was removed was measured. Then, this laminated board was subjected to a reflow treatment using a SALAMANDER reflow device at a maximum temperature of 260 ° C. After that, the distance (distance II) between the holes in the laminated plate was measured again. Then, the measured distance I and distance II are substituted into the following formula (I), and the dimensional change rate of the substrate subjected to the reflow process is determined. This is defined as the shrinkage rate of the substrate before and after the reflow step. ((Distance I)-(distance II)) / distance I × 100 ... Formula (I)

【表1】 【Table 1】

【表2】[產業利用性]【Table 2】 [Industrial availability]

本實施形態之印刷電路板用樹脂組成物,作為預浸體、樹脂片、疊層板、覆金屬箔疊層板、印刷電路板、或多層印刷電路板之材料具有產業利用性。又,本申請案係基於2016年12月28日提申的日本專利申請號2016-255272,其記載內容在此援用。The resin composition for a printed circuit board of this embodiment has industrial applicability as a material of a prepreg, a resin sheet, a laminated board, a metal-clad laminated board, a printed circuit board, or a multilayer printed circuit board. The present application is based on Japanese Patent Application No. 2016-255272 filed on December 28, 2016, and the contents thereof are incorporated herein by reference.

1‧‧‧第1絕緣層1‧‧‧The first insulation layer

2‧‧‧第2絕緣層2‧‧‧ 2nd insulating layer

3‧‧‧導體層3‧‧‧conductor layer

a‧‧‧支持體a‧‧‧ support

b1‧‧‧極薄銅箔b1‧‧‧ ultra-thin copper foil

b2‧‧‧極薄銅箔b2‧‧‧thin copper foil

c1‧‧‧預浸體c1‧‧‧prepreg

c2‧‧‧預浸體c2‧‧‧prepreg

d‧‧‧銅箔d‧‧‧copper foil

d’‧‧‧導體層d’ ‧‧‧conductor layer

V‧‧‧通孔V‧‧‧through hole

圖1顯示製作多層無核心基板之面板之程序之一例之處理流程圖(惟多層無核心基板之製造方法不限定於此。以下之圖2~圖8中為同樣。)。 圖2顯示製作多層無核心基板之面板之程序之一例之處理流程圖。 圖3顯示製作多層無核心基板之面板之程序之一例之處理流程圖。 圖4顯示製作多層無核心基板之面板之程序之一例之處理流程圖。 圖5顯示製作多層無核心基板之面板之程序之一例之處理流程圖。 圖6顯示製作多層無核心基板之面板之程序之一例之處理流程圖。 圖7顯示製作多層無核心基板之面板之程序之一例之處理流程圖。 圖8顯示製作多層無核心基板之面板之程序之一例之處理流程圖。 圖9顯示多層無核心基板之面板之一例之結構之部分剖面圖。FIG. 1 shows a processing flowchart of an example of a process for manufacturing a multi-layer coreless substrate panel (however, the manufacturing method of a multi-layer coreless substrate is not limited to this. The same is shown in FIGS. 2 to 8 below). FIG. 2 shows a processing flowchart of an example of a process for manufacturing a multi-layer panel without a core substrate. FIG. 3 shows a processing flowchart of an example of a procedure for manufacturing a multi-layer coreless panel. FIG. 4 shows a processing flowchart of an example of a procedure for manufacturing a multi-layered coreless panel. FIG. 5 shows a processing flowchart of an example of a process for manufacturing a multi-layer panel without a core substrate. FIG. 6 shows a processing flowchart of an example of a procedure for manufacturing a multi-layered coreless panel. FIG. 7 shows a processing flowchart of an example of a process for manufacturing a multi-layer panel without a core substrate. FIG. 8 shows a processing flowchart of an example of a procedure for manufacturing a multi-layer coreless panel. FIG. 9 is a partial cross-sectional view showing the structure of an example of a multi-layer coreless panel.

Claims (21)

一種印刷電路板用樹脂組成物,含有 烯丙基苯酚化合物(A)、 馬來醯亞胺化合物(B)、及 氰酸酯化合物(C)及/或環氧化合物(D), 相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該烯丙基苯酚化合物(A)之含量為10~50質量份, 相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該馬來醯亞胺化合物(B)之含量為40~80質量份。A resin composition for a printed circuit board comprising an allylphenol compound (A), a maleimide compound (B), and a cyanate compound (C) and / or an epoxy compound (D). 100 parts by mass of the resin solid content in the resin composition for a printed circuit board, and the content of the allylphenol compound (A) is 10 to 50 parts by mass, relative to 100 parts of the resin solid content in the resin composition for the printed circuit board The content of the maleimidine imine compound (B) is 40 to 80 parts by mass. 如申請專利範圍第1項之印刷電路板用樹脂組成物,其中, 相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該氰酸酯化合物(C)及該環氧化合物(D)之合計含量為5~45質量份。For example, the resin composition for a printed circuit board according to item 1 of the patent application, wherein the cyanate ester compound (C) and the epoxy compound are 100 parts by mass of the resin solid content in the resin composition for the printed circuit board. The total content of (D) is 5 to 45 parts by mass. 如申請專利範圍第1或2項之印刷電路板用樹脂組成物,其中, 相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該氰酸酯化合物(C)之含量為0~25質量份。For example, if the resin composition for a printed circuit board according to item 1 or 2 of the patent application scope is, the content of the cyanate ester compound (C) is 100 parts by mass with respect to 100 parts by mass of the resin solid content in the resin composition for the printed circuit board. 0 to 25 parts by mass. 如申請專利範圍第1或2項之印刷電路板用樹脂組成物,其中, 相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該環氧化合物(D)之含量為0~25質量份。For example, the resin composition for a printed circuit board according to item 1 or 2 of the patent application scope, wherein the content of the epoxy compound (D) is 0 with respect to 100 parts by mass of the resin solid content in the resin composition for the printed circuit board. ~ 25 parts by mass. 如申請專利範圍第1或2項之印刷電路板用樹脂組成物,更含有填充材(E)。For example, the resin composition for a printed circuit board in the scope of the patent application No. 1 or 2 further contains a filler (E). 如申請專利範圍第5項之印刷電路板用樹脂組成物,其中,該填充材(E)係選自於由二氧化矽、氧化鋁、及軟水鋁石構成之群組中之至少1種。For example, the resin composition for a printed circuit board according to item 5 of the patent application, wherein the filler (E) is at least one selected from the group consisting of silica, alumina, and boehmite. 如申請專利範圍第5項之印刷電路板用樹脂組成物,其中,相對於該印刷電路板用樹脂組成物中之樹脂固體成分100質量份,該填充材(E)之含量為120~250質量份。For example, the resin composition for a printed circuit board according to the scope of application for a patent No. 5 wherein the content of the filler (E) is 120 to 250 masses with respect to 100 parts by mass of the resin solid content in the resin composition for the printed circuit board. Serving. 如申請專利範圍第1或2項之印刷電路板用樹脂組成物,其中,該烯丙基苯酚化合物(A)包括下式(I)~(III)中之任一者表示之化合物: [化1]式(I)中,R1 及R2 各自獨立地表示氫原子、甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、或苯基; [化2][化3]For example, the resin composition for a printed circuit board of claim 1 or 2, wherein the allylphenol compound (A) includes a compound represented by any one of the following formulae (I) to (III): [化1] In formula (I), R 1 and R 2 each independently represent a hydrogen atom, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, Or phenyl; [Chemical 3] . 如申請專利範圍第1或2項之印刷電路板用樹脂組成物,其中,該馬來醯亞胺化合物(B)包括選自於由雙(4-馬來醯亞胺苯基)甲烷、2,2-雙{4-(4-馬來醯亞胺苯氧基)-苯基}丙烷、雙(3-乙基-5-甲基-4-馬來醯亞胺苯基)甲烷及下式(1)表示之馬來醯亞胺化合物構成之群組中之至少1種化合物; [化4]式(1)中,R5 各自獨立地表示氫原子或甲基,n1 表示1以上之整數。For example, the resin composition for a printed circuit board according to item 1 or 2 of the patent application scope, wherein the maleimide compound (B) includes a compound selected from bis (4-maleimidephenyl) methane, 2 , 2-bis {4- (4-maleimidephenoxy) -phenyl} propane, bis (3-ethyl-5-methyl-4-maleimidephenyl) methane and the following At least one compound in the group consisting of a maleimidine imine compound represented by formula (1); In the formula (1), R 5 each independently represents a hydrogen atom or a methyl group, and n 1 represents an integer of 1 or more. 如申請專利範圍第1或2項之印刷電路板用樹脂組成物,其中,該氰酸酯化合物(C)包括下式(2)及/或(3)表示之化合物; [化5]式(2)中,R6 各自獨立地表示氫原子或甲基,n2 表示1以上之整數; [化6]式(3)中,R7 各自獨立地表示氫原子或甲基,n3 表示1以上之整數。For example, the resin composition for a printed circuit board according to item 1 or 2 of the patent application scope, wherein the cyanate ester compound (C) includes a compound represented by the following formula (2) and / or (3); In formula (2), R 6 each independently represents a hydrogen atom or a methyl group, and n 2 represents an integer of 1 or more; In the formula (3), R 7 each independently represents a hydrogen atom or a methyl group, and n 3 represents an integer of 1 or more. 如申請專利範圍第1或2項之印刷電路板用樹脂組成物,其中, 使含有該印刷電路板用樹脂組成物與基材之預浸體於230℃及100分鐘之條件熱硬化而獲得之硬化物符合下式(4)~(8)表示之關於機械特性之物性參數之數値範圍; E’(200℃)/E’(30℃)≦0.90…(4) E’(260℃)/E’(30℃)≦0.85…(5) E’(330℃)/E’(30℃)≦0.80…(6) E”max/E’(30℃)≦3.0%…(7) E”min/E’(30℃)≧0.5%…(8) 各式中, E’表示該硬化物在括弧內所示之溫度之貯藏彈性模數, E”max表示該硬化物在30℃至330℃之溫度範圍之損失彈性模數之最大値,E”min表示該硬化物在30℃至330℃之溫度範圍之損失彈性模數之最小値。For example, the resin composition for a printed circuit board for which the scope of the patent application is item 1 or 2 is obtained by thermally curing a prepreg containing the resin composition for a printed circuit board and a substrate at 230 ° C and 100 minutes. The hardened material conforms to the range of the physical property parameters related to the mechanical characteristics expressed by the following formulae (4) to (8); E '(200 ℃) / E' (30 ℃) ≦ 0.90… (4) E '(260 ℃) /E'(30℃)≦0.85…(5) E '(330 ℃) / E' (30 ℃) ≦ 0.80… (6) E ”max / E '(30 ℃) ≦ 3.0%… (7) E ”Min / E '(30 ℃) ≧ 0.5%… (8) In each formula, E ′ represents the storage elastic modulus of the hardened material at the temperature shown in parentheses, and E” max represents the hardened material at 30 ℃ to The maximum loss modulus of the elastic modulus in the temperature range of 330 ° C, E ”min represents the minimum loss modulus of the cured product in the temperature range of 30 ° C to 330 ° C. 一種預浸體,具有: 基材;及 含浸或塗佈於該基材之如申請專利範圍第1至11項中任一項之印刷電路板用樹脂組成物。A prepreg comprising: a substrate; and the resin composition for a printed circuit board according to any one of claims 1 to 11 impregnated or coated on the substrate. 如申請專利範圍第12項之預浸體,其中,該基材係以選自於由E玻璃纖維、D玻璃纖維、S玻璃纖維、T玻璃纖維、Q玻璃纖維、L玻璃纖維、NE玻璃纖維、HME玻璃纖維、及有機纖維構成之群組中之1種以上之纖維構成。For example, the prepreg according to item 12 of the application, wherein the substrate is selected from the group consisting of E glass fiber, D glass fiber, S glass fiber, T glass fiber, Q glass fiber, L glass fiber, and NE glass fiber. , HME glass fibers, and organic fibers in a group consisting of one or more fibers. 一種樹脂片,具有: 支持體;及 疊層在該支持體之單面或兩面的如申請專利範圍第1至11項中任一項之印刷電路板用樹脂組成物。A resin sheet comprising: a support; and a resin composition for a printed circuit board according to any one of claims 1 to 11 laminated on one or both sides of the support. 一種疊層板,具有疊層了至少1片以上之如申請專利範圍第12項之預浸體。A laminated board having at least one piece of prepreg according to item 12 of the patent application scope. 一種疊層板,具有疊層了至少1片以上之如申請專利範圍第14項之樹脂片。A laminated board has at least one resin sheet laminated as described in claim 14 of the patent application scope. 一種覆金屬箔疊層板,具有: 疊層了至少1片以上之如申請專利範圍第12項之預浸體;及 配置在該預浸體之單面或兩面之金屬箔。A metal foil-clad laminated board includes: at least one piece of prepreg as described in item 12 of the scope of patent application; and a metal foil disposed on one or both sides of the prepreg. 一種覆金屬箔疊層板,具有: 疊層了至少1片以上之如申請專利範圍第14項之樹脂片;及 配置在該樹脂片之單面或兩面之金屬箔。A metal foil-clad laminated board includes: at least one resin sheet laminated as described in the scope of claim 14 in the patent application; and a metal foil disposed on one or both sides of the resin sheet. 一種印刷電路板,具有絕緣層,以及形成在該絕緣層之表面之導體層; 該絕緣層含有如申請專利範圍第1至11項中任一項之印刷電路板用樹脂組成物。A printed circuit board has an insulating layer and a conductor layer formed on a surface of the insulating layer; the insulating layer contains the resin composition for a printed circuit board according to any one of claims 1 to 11 of the scope of patent application. 一種多層印刷電路板,具有多數絕緣層及多數導體層, 該多數絕緣層係由第1絕緣層及第2絕緣層構成,該第1絕緣層以疊層了至少1片以上之如申請專利範圍第12項之預浸體形成,該第2絕緣層以在該第1絕緣層之單面方向疊層了至少1片以上之該預浸體形成;及 該多數導體層係由第1導體層及第2導體層構成,該第1導體層配置在該多數絕緣層的各絕緣層之間,該第2導體層配置在該多數絕緣層的最外層之表面。A multi-layer printed circuit board having a plurality of insulating layers and a plurality of conductor layers. The plurality of insulating layers are composed of a first insulating layer and a second insulating layer. The prepreg of item 12, wherein the second insulating layer is formed by laminating at least one piece of the prepreg on one side of the first insulating layer; and the majority of the conductor layers are composed of the first conductor layer And a second conductor layer, the first conductor layer is disposed between the insulating layers of the plurality of insulating layers, and the second conductor layer is disposed on the surface of the outermost layer of the plurality of insulating layers. 一種多層印刷電路板,具有多數絕緣層及多數導體層, 該多數絕緣層係由第1絕緣層及第2絕緣層構成,該第1絕緣層以疊層了至少1片以上之如申請專利範圍第14項之樹脂片形成,該第2絕緣層以在該第1絕緣層之單面方向疊層了至少1片以上之該樹脂片形成;及 該多數導體層係由第1導體層及第2導體層構成,該第1導體層配置在該多數絕緣層的各絕緣層之間,該第2導體層配置在該多數絕緣層的最外層之表面。A multi-layer printed circuit board having a plurality of insulating layers and a plurality of conductor layers. The plurality of insulating layers are composed of a first insulating layer and a second insulating layer. The resin sheet according to item 14, wherein the second insulating layer is formed by laminating at least one resin sheet on one side of the first insulating layer; and the plurality of conductor layers are composed of the first conductor layer and the first conductor layer. It has a two-conductor layer. The first conductor layer is disposed between the insulating layers of the plurality of insulating layers, and the second conductor layer is disposed on the surface of the outermost layer of the plurality of insulating layers.
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