TW201835682A - Photosensitive colored composition, cured product, colored spacer, image display device - Google Patents

Photosensitive colored composition, cured product, colored spacer, image display device Download PDF

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TW201835682A
TW201835682A TW107105470A TW107105470A TW201835682A TW 201835682 A TW201835682 A TW 201835682A TW 107105470 A TW107105470 A TW 107105470A TW 107105470 A TW107105470 A TW 107105470A TW 201835682 A TW201835682 A TW 201835682A
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TWI759427B (en
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沢井良尚
斐麗華
伊藤敦哉
土谷達格
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日商三菱化學股份有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B5/00—Dyes with an anthracene nucleus condensed with one or more heterocyclic rings with or without carbocyclic rings
    • C09B5/24—Dyes with an anthracene nucleus condensed with one or more heterocyclic rings with or without carbocyclic rings the heterocyclic rings being only condensed with an anthraquinone nucleus in 1-2 or 2-3 position
    • C09B5/44—Azines of the anthracene series
    • C09B5/46—Para-diazines
    • C09B5/48—Bis-anthraquinonediazines (indanthrone)
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B7/00—Indigoid dyes

Abstract

Provided is a photosensitive colored composition having low light leakage at around a wavelength of 700 nm, superior transmittance of light at around a wavelength of 900 nm and superior electrical reliability after ultraviolet irradiation. The photosensitive colored composition of the present invention comprises (a) a coloring agent, (b) an alkali soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a solvent, and (f) a dispersant, wherein (a) the coloring agent comprises (al) an organic black pigment comprising at least one selected from the group consisting of a compound represented by the following general formula (I), a geometric isomer of the compound, a salt of the compound and a salt of a geometric isomer of the compound, (a2) C.I. pigment blue 60 and (a3) carbon black, wherein the content ratio of (al) the organic black pigment is equal to 150 parts by mass or more with respect to 100 parts by mass of (a3) the carbon black.

Description

感光性著色組合物、硬化物、著色間隔物、圖像顯示裝置Photosensitive coloring composition, cured product, colored spacer, image display device

本發明係關於一種感光性著色組合物等。詳細而言，關於一種於例如液晶顯示器等圖像顯示裝置中可較佳地用於形成著色間隔物等之感光性著色組合物、使該感光性著色組合物硬化而獲得之硬化物、由該硬化物所形成之著色間隔物、及具備該著色間隔物之圖像顯示裝置。 在此引用2017年2月15日向日本特許廳提出申請之日本專利特願2017-026369、及2017年8月31日向日本特許廳提出申請之日本專利特願2017-166318之說明書、專利申請範圍、圖式及摘要之全部內容、以及本說明書中引用之文獻等所揭示之部分或全部內容，作為本說明書之揭示內容而組入本文中。The present invention relates to a photosensitive coloring composition and the like. Specifically, a photosensitive coloring composition which can be preferably used for forming a colored spacer in an image display device such as a liquid crystal display, a cured product obtained by curing the photosensitive coloring composition, and the like A colored spacer formed of a cured material, and an image display device including the colored spacer. The specifications, scope of patent applications, and Japanese Patent Application No. 2017-166318 filed with Japan Patent Office on February 15, 2017, and Japanese Patent Application No. 2017-166318 filed with Japan Patent Office on August 31, 2017 are cited here The entire contents of the drawings and abstract, as well as some or all of the contents disclosed in the documents cited in this specification, are incorporated herein as the disclosure of this specification.

液晶顯示器(LCD)係利用藉由接通/斷開對液晶所施加之電壓而切換液晶分子之排列方式的性質。另一方面，構成LCD之單元之各構件多藉由以光微影法為代表之利用感光性組合物之方法而形成。該感光性組合物容易形成微細之構造，亦容易對大畫面用之基板進行處理，基於該等原因，今後其適用範圍有進一步擴大之傾向。 然而，使用感光性組合物所製造之LCD由於感光性組合物本身之電氣特性、或感光性組合物中所含之雜質之影響，而存在對液晶所施加之電壓未得以保持，由此產生顯示器之顯示不均等問題的情況。尤其對於彩色液晶顯示器中之靠近液晶層之構件、例如用以使液晶面板中2片基板之間隔保持固定之所謂柱狀間隔物、感光性間隔物等，其影響較大。 先前於TFT(Thin-Film Transistor，薄膜電晶體)型LCD中使用不具有遮光性之間隔物之情形時，存在因透過間隔物之光導致作為開關元件之TFT產生誤動作之情況。為了防止該情況，業界對使用具有遮光性之間隔物(著色間隔物)之方法進行研究。 另一方面，近年來隨著面板構造之變化，業界提出有藉由光微影法一次形成高度不同之著色間隔物之方法。例如專利文獻1中揭示有，藉由使用特定種類之黑色顏料，不僅遮光性、分散性、製版性優異，而且可實現充分低之相對介電常數。 又，專利文獻2中揭示有一種著色感光性樹脂組合物，其藉由使用複數種有機著色顏料作為顏料，不僅彈性回復率、解像度、耐化學性優異，而且亦使黑矩陣之特性得到滿足。 [先前技術文獻] [專利文獻] [專利文獻1]國際公開第2015/046178號 [專利文獻2]韓國公開專利第10-2014-0096423號公報Liquid crystal displays (LCDs) use the property of switching the arrangement of liquid crystal molecules by turning on / off the voltage applied to the liquid crystal. On the other hand, each member constituting a unit of an LCD is often formed by a method using a photosensitive composition typified by a photolithography method. This photosensitive composition is easy to form a fine structure, and it is also easy to handle a substrate for large screens. For these reasons, its application range tends to be further expanded in the future. However, an LCD manufactured using a photosensitive composition is not able to maintain the voltage applied to the liquid crystal due to the electrical characteristics of the photosensitive composition itself or the influence of impurities contained in the photosensitive composition, and thus a display is produced. It shows the situation of inequality. In particular, a member near a liquid crystal layer in a color liquid crystal display, such as a so-called columnar spacer and a photosensitive spacer used to keep a fixed interval between two substrates in a liquid crystal panel, has a great influence. Previously, when a spacer having no light-shielding property was used in a TFT (Thin-Film Transistor) type LCD, the TFT as a switching element may malfunction due to light transmitted through the spacer. In order to prevent this, the industry is researching a method using a light-shielding spacer (colored spacer). On the other hand, in recent years, with the change of the panel structure, the industry has proposed a method of forming colored spacers of different heights at one time by a photolithography method. For example, Patent Document 1 discloses that by using a specific type of black pigment, not only the light-shielding property, the dispersibility, and the plate-making property are excellent, but also a sufficiently low relative permittivity can be achieved. In addition, Patent Document 2 discloses a colored photosensitive resin composition which, by using a plurality of organic colored pigments as pigments, not only has excellent elastic recovery, resolution, and chemical resistance, but also satisfies the characteristics of a black matrix. [Prior Art Literature] [Patent Literature] [Patent Literature 1] International Publication No. 2015/046178 [Patent Literature 2] Korean Published Patent Publication No. 10-2014-0096423

[發明所欲解決之問題] 近年來，隨著面板構造之變化，存在對著色間隔物具有如下要求之情況：需於波長700 nm附近亦不會產生漏光，又，需確保波長900 nm附近之透過率以能夠辨識曝光時用於進行光罩位置對準之標記。 另一方面，為了提高液晶配向性，於製成液晶單元後進行紫外線照射之方法逐漸被廣泛運用。若進行紫外線照射，則有顏料或其處理劑等之一部分發生分解而產生雜質之傾向，但於該情形時亦要求保持充分之電性可靠性。 本發明者等人對專利文獻1中所記載之感光性著色組合物進行研究，結果發現，抑制波長700 nm附近之漏光與確保波長900 nm附近之透過率難以同時實現。 又，對專利文獻2中所記載之感光性著色組合物進行研究，結果發現，尤其於紫外線照射後難以確保電性可靠性。 因此，本發明係鑒於上述情況而成者，其目的在於提供一種波長700 nm附近之漏光較少、波長900m附近之透過率優異、且紫外線照射後之電性可靠性優異的感光性著色組合物。 [解決問題之技術手段] 本發明者等人為了解決上述課題，經過努力研究，結果發現，於感光性著色組合物中，使用特定之有機黑色顏料、C.I.顏料藍60及碳黑，且將特定之有機黑色顏料相對於碳黑之含有比率設為特定範圍，藉此可解決上述課題，從而完成本發明。 即，本發明具有以下之[1]～[12]之構成。 [1]一種感光性著色組合物，其係含有(a)著色劑、(b)鹼可溶性樹脂、(c)光聚合起始劑、(d)乙烯性不飽和化合物、(e)溶劑、及(f)分散劑者，並且 上述(a)著色劑含有(a1)包含選自由下述通式(I)所表示之化合物、上述化合物之幾何異構物、上述化合物之鹽、及上述化合物之幾何異構物之鹽所組成之群中之至少1種的有機黑色顏料、(a2)C.I.顏料藍60、以及(a3)碳黑， 上述(a1)有機黑色顏料相對於上述(a3)碳黑100質量份之含有比率為150質量份以上。 [化1](式(I)中，R1 及R6 分別獨立地為氫原子、CH3 、CF3 、氟原子或氯原子； R2 、R3 、R4 、R5 、R7 、R8 、R9 及R10 分別獨立地為氫原子、鹵素原子、R11 、COOH、COOR11 、COO- 、CONH2 、CONHR11 、CONR11 R12 、CN、OH、OR11 、COCR11 、OOCNH2 、OOCNHR11 、OOCNR11 R12 、NO2 、NH2 、NHR11 、NR11 R12 、NHCOR12 、NR11 COR12 、N=CH2 、N=CHR11 、N=CR11 R12 、SH、SR11 、SOR11 、SO2 R11 、SO3 R11 、SO3 H、SO3 - 、SO2 NH2 、SO2 NHR11 或SO2 NR11 R12 ；且 選自由R2 與R3 、R3 與R4 、R4 與R5 、R7 與R8 、R8 與R9 、及R9 與R10 所組成之群中之至少一個組合亦可相互直接鍵結，或者藉由氧原子、硫原子、NH或NR11 橋而相互鍵結； R11 及R12 分別獨立地為碳數1～12之烷基、碳數3～12之環烷基、碳數2～12之烯基、碳數3～12之環烯基或碳數2～12之炔基) [2]如[1]記載之感光性著色組合物，其中上述(a1)有機黑色顏料相對於上述(a3)碳黑100質量份之含有比率為200質量份以上。 [3]如[1]或[2]記載之感光性著色組合物，其中上述(a1)有機黑色顏料相對於上述(a3)碳黑100質量份之含有比率為210質量份以上。 [4]如[1]至[3]中任一項記載之感光性著色組合物，其中上述(a2)C.I.顏料藍60相對於上述(a3)碳黑100質量份之含有比率為200質量份以上。 [5]如[1]至[4]中任一項記載之感光性著色組合物，其中全部有機顏料相對於上述(a3)碳黑100質量份之含有比率之合計為550質量份以上。 [6]如[1]至[5]中任一項記載之感光性著色組合物，其中全部固形物成分中之上述(a)著色劑之含有比率為10質量%以上。 [7]如[1]至[6]中任一項記載之感光性著色組合物，其中全部固形物成分中之上述(a)著色劑之含有比率為45質量%以下。 [8]如[1]至[7]中任一項記載之感光性著色組合物，其中上述(b)鹼可溶性樹脂含有(b1)環氧(甲基)丙烯酸酯系樹脂。 [9]如[1]至[8]中任一項記載之感光性著色組合物，其中已硬化之塗膜之每1 μm膜厚之光學濃度為1.0以上。 [10]一種硬化物，其係使如[1]至[9]中任一項記載之感光性著色組合物硬化而獲得。 [11]一種著色間隔物，其係由如[10]記載之硬化物所形成。 [12]一種圖像顯示裝置，其具備如[11]記載之著色間隔物。 [發明之效果] 根據本發明，可提供一種波長700 nm附近之漏光較少、波長900 nm附近之透過率優異、且紫外線照射後之電性可靠性優異的感光性著色組合物、硬化物及著色間隔物，進而可提供一種具備此種著色間隔物之圖像顯示裝置。[Problems to be Solved by the Invention] In recent years, with the change of the panel structure, there are cases that the colored spacers have the following requirements: it is necessary to prevent light leakage near the wavelength of 700 nm, and it is necessary to ensure that the wavelength is around 900 nm. The transmittance is used to identify the mark used for mask alignment during exposure. On the other hand, in order to improve the alignment of the liquid crystal, a method of irradiating ultraviolet rays after being made into a liquid crystal cell is gradually widely used. When ultraviolet rays are irradiated, there is a tendency that a part of a pigment or a treating agent thereof is decomposed and impurities are generated, but in this case, it is also required to maintain sufficient electrical reliability. The present inventors have studied the photosensitive coloring composition described in Patent Document 1, and as a result, it has been found that it is difficult to achieve both suppression of light leakage near the wavelength of 700 nm and securing transmittance near the wavelength of 900 nm. Moreover, when examining the photosensitive coloring composition described in patent document 2, it was found that it is difficult to ensure electrical reliability especially after ultraviolet irradiation. Therefore, the present invention has been made in view of the above circumstances, and an object thereof is to provide a photosensitive coloring composition having less light leakage near a wavelength of 700 nm, excellent transmittance near a wavelength of 900 m, and excellent electrical reliability after ultraviolet irradiation. . [Technical means to solve the problem] In order to solve the above-mentioned problems, the inventors have made intensive studies and found that the photosensitive coloring composition uses a specific organic black pigment, CI Pigment Blue 60, and carbon black, and The content ratio of the organic black pigment to the carbon black is set to a specific range, thereby solving the above-mentioned problems and completing the present invention. That is, the present invention has the following structures [1] to [12]. [1] A photosensitive coloring composition comprising (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a solvent, and (f) a dispersant, and the (a) colorant contains (a1) a compound selected from the group consisting of a compound represented by the following general formula (I), a geometric isomer of the compound, a salt of the compound, and At least one type of organic black pigment, (a2) CI pigment blue 60, and (a3) carbon black in a group consisting of salts of geometric isomers. The (a1) organic black pigment is higher than the (a3) carbon black. The content ratio of 100 parts by mass is 150 parts by mass or more. [Chemical 1] (In formula (I), R 1 and R 6 are each independently a hydrogen atom, a CH 3 , a CF 3 , a fluorine atom, or a chlorine atom; R 2 , R 3 , R 4 , R 5 , R 7 , R 8 , R 9 and R 10 are each independently a hydrogen atom, a halogen atom, R 11, COOH, COOR 11 , COO -, CONH 2, CONHR 11, CONR 11 R 12, CN, OH, OR 11, COCR 11, OOCNH 2, OOCNHR 11 , OCNCR 11 R 12 , NO 2 , NH 2 , NHR 11 , NR 11 R 12 , NHCOR 12 , NR 11 COR 12 , N = CH 2 , N = CHR 11 , N = CR 11 R 12 , SH, SR 11 , SOR 11, SO 2 R 11 , SO 3 R 11, SO 3 H, SO 3 -, SO 2 NH 2, SO 2 NHR 11 or SO 2 NR 11 R 12; and selected from the group consisting of R 2 and R 3, R 3 And at least one combination of R 4 , R 4 and R 5 , R 7 and R 8 , R 8 and R 9 , and R 9 and R 10 may be directly bonded to each other, or through an oxygen atom, Sulfur atoms, NH or NR 11 bridge each other; R 11 and R 12 are each independently an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, (Cycloalkenyl group having 3 to 12 carbon atoms or alkynyl group having 2 to 12 carbon atoms) [2] The photosensitive coloring composition according to [1], wherein (a1) is organic The content ratio of a black pigment with respect to 100 mass parts of said (a3) carbon blacks is 200 mass parts or more. [3] The photosensitive coloring composition according to [1] or [2], wherein a content ratio of the (a1) organic black pigment to 100 parts by mass of the (a3) carbon black is 210 parts by mass or more. [4] The photosensitive coloring composition according to any one of [1] to [3], wherein the content ratio of the (a2) CI Pigment Blue 60 to 100 parts by mass of the (a3) carbon black is 200 parts by mass the above. [5] The photosensitive coloring composition according to any one of [1] to [4], wherein a total content ratio of all organic pigments to 100 parts by mass of the carbon black (a3) is 550 parts by mass or more. [6] The photosensitive coloring composition according to any one of [1] to [5], wherein the content ratio of the coloring agent (a) in the total solid component is 10% by mass or more. [7] The photosensitive coloring composition according to any one of [1] to [6], wherein the content ratio of the colorant (a) in the total solid component is 45% by mass or less. [8] The photosensitive coloring composition according to any one of [1] to [7], wherein the (b) alkali-soluble resin contains (b1) an epoxy (meth) acrylate resin. [9] The photosensitive coloring composition according to any one of [1] to [8], wherein the optical density per 1 μm film thickness of the cured coating film is 1.0 or more. [10] A cured product obtained by curing the photosensitive coloring composition according to any one of [1] to [9]. [11] A colored spacer formed of a hardened material as described in [10]. [12] An image display device including the colored spacer according to [11]. [Effects of the Invention] According to the present invention, it is possible to provide a photosensitive coloring composition, a cured product, which has less light leakage near a wavelength of 700 nm, excellent transmittance near a wavelength of 900 nm, and excellent electrical reliability after ultraviolet irradiation. The colored spacers can further provide an image display device having such colored spacers.

以下，具體地說明本發明之實施形態，但本發明並不限定於以下之實施形態，可於其主要旨之範圍內進行各種變更而實施。 再者，本發明中，所謂「(甲基)丙烯酸」意指「丙烯酸及/或甲基丙烯酸」，關於「(甲基)丙烯酸酯」、「(甲基)丙烯醯基」亦相同。 所謂「(共)聚合物」意指包含均聚物(homopolymer)與共聚物(copolymer)兩者，所謂「酸(酐)」、「(無水)…酸」意指包含酸與其酐兩者。又，本發明中，所謂「丙烯酸系樹脂」意指包含(甲基)丙烯酸之(共)聚合物、包含具有羧基之(甲基)丙烯酸酯之(共)聚合物。 又，本發明中，所謂「單體」係相對於所謂高分子物質(聚合物)而言之用語，除了指狹義之單體(monomer)以外，亦包括二聚物、三聚物、低聚物等在內。 本發明中，所謂「全部固形物成分」意指感光性著色組合物中或下述墨水中所含之除溶劑以外之全部成分。 本發明中，所謂「重量平均分子量」意指藉由GPC(凝膠滲透層析法)所測得之聚苯乙烯換算之重量平均分子量(Mw)。 又，本發明中，所謂「胺值」，只要無特別說明，表示有效固形物成分換算之胺值，是由與分散劑之固形物成分每1 g之鹼量等量之KOH之質量所表示之值。再者，測定方法於下文進行說明。另一方面，所謂「酸值」，只要無特別說明，表示有效固形物成分換算之酸值，藉由中和滴定而算出。 又，關於顏料，「C.I.」意指色指數。 又，於本說明書中，以「質量」表示之百分率或份與以「重量」表示之百分率或份含義相同。 [感光性著色組合物] 本發明之感光性著色組合物含有 (a)著色劑 (b)鹼可溶性樹脂 (c)光聚合起始劑 (d)乙烯性不飽和化合物 (e)溶劑 (f)分散劑作為必須成分，視需要進而含有矽烷偶合劑等密接提高劑、塗佈性提高劑、顯影改良劑、紫外線吸收劑、抗氧化劑、界面活性劑、顏料衍生物等其他調配成分，各調配成分通常以溶解或分散於溶劑中之狀態使用。 關於本發明之感光性著色組合物，(a)著色劑含有(a1)包含選自由下述通式(I)所表示之化合物、上述化合物之幾何異構物、上述化合物之鹽、及上述化合物之幾何異構物之鹽所組成之群中之至少1種的有機黑色顏料、(a2)C.I.顏料藍60、以及(a3)碳黑，上述(a1)有機黑色顏料相對於上述(a3)碳黑100質量份之含有比率為150質量份以上。以下詳細說明各成分。 ＜(a)著色劑＞ 本發明之感光性著色組合物中之(a)著色劑含有下述(a1)、(a2)及(a3)作為必須成分。 (a1)包含選自由下述通式(I)所表示之化合物、上述化合物之幾何異構物、上述化合物之鹽、及上述化合物之幾何異構物之鹽所組成之群中之至少1種的有機黑色顏料 (a2)C.I.顏料藍60 (a3)碳黑 該等顏料之中，(a1)及(a2)為有機顏料，(a3)為無機顏料。 ＜(a1)有機黑色顏料＞ 如上所述，本發明之感光性著色組合物所含之(a)著色劑含有(a1)包含選自由下述通式(I)所表示之化合物、上述化合物之幾何異構物、上述化合物之鹽、及上述化合物之幾何異構物之鹽所組成之群中之至少1種的有機黑色顏料(以下有時簡記為「(a1)有機黑色顏料」)作為必須成分。認為藉由含有(a1)有機黑色顏料，可確保遮光性，抑制液晶之電壓保持率之降低，又，抑制紫外線之吸收而容易控制形狀或階差。 [化2]式(I)中，R1 及R6 分別獨立地為氫原子、CH3 、CF3 、氟原子或氯原子； R2 、R3 、R4 、R5 、R7 、R8 、R9 及R10 分別獨立地為氫原子、鹵素原子、R11 、COOH、COOR11 、COO- 、CONH2 、CONHR11 、CONR11 R12 、CN、OH、OR11 、COCR11 、OOCNH2 、OOCNHR11 、OOCNR11 R12 、NO2 、NH2 、NHR11 、NR11 R12 、NHCOR12 、NR11 COR12 、N=CH2 、N=CHR11 、N=CR11 R12 、SH、SR11 、SOR11 、SO2 R11 、SO3 R11 、SO3 H、SO3 - 、SO2 NH2 、SO2 NHR11 或SO2 NR11 R12 ；且 選自由R2 與R3 、R3 與R4 、R4 與R5 、R7 與R8 、R8 與R9 、及R9 與R10 所組成之群中之至少一個組合亦可相互直接鍵結，或者藉由氧原子、硫原子、NH或NR11 橋而相互鍵結； R11 及R12 分別獨立地為碳數1～12之烷基、碳數3～12之環烷基、碳數2～12之烯基、碳數3～12之環烯基或碳數2～12之炔基。 通式(I)所表示之化合物或該化合物之幾何異構物具有以下之核心結構(其中，結構式中之取代基經省略)，最穩定者應為反式-反式異構物。 [化3]於通式(I)所表示之化合物為陰離子性之情形時，較佳為利用任意公知之適宜之陽離子對其進行電荷補償而獲得之鹽，該陽離子例如為金屬、有機、無機或金屬有機陽離子，具體而言，鹼金屬、鹼土金屬、過渡金屬、一級銨、二級銨、三烷基銨等三級銨、四烷基銨等四級銨或有機金屬錯合物。又，於通式(I)所表示之化合物之幾何異構物為陰離子性之情形時，較佳為相同之鹽。 於通式(I)之取代基及該等之定義中，就有遮蔽率變高之傾向而言，較佳為以下者。認為其原因在於：以下之取代基無吸收，不會對顏料之色相產生影響。 R2 、R4 、R5 、R7 、R9 及R10 較佳為分別獨立地為氫原子、氟原子、或氯原子，進而較佳為氫原子。 R3 及R8 較佳為分別獨立地為氫原子、NO2 、OCH3 、OC2 H5 、溴原子、氯原子、CH3 、C2 H5 、N(CH3 )2 、N(CH3 )(C2 H5 )、N(C2 H5 )2 、α-萘基、β-萘基、SO3 H或SO3 - ，進而較佳為氫原子或SO3 H。 R1 及R6 較佳為分別獨立地為氫原子、CH3 或CF3 ，進而較佳為氫原子。 較佳為選自由R1 與R6 、R2 與R7 、R3 與R8 、R4 與R9 、及R5 與R10 所組成之群中之至少一個組合係由相同之取代基構成，更佳為R1 為與R6 相同之取代基，R2 為與R7 相同之取代基，R3 為與R8 相同之取代基，R4 為與R9 相同之取代基，且R5 為與R10 相同之取代基。 碳數1～12之烷基例如為甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、2-甲基丁基、正戊基、2-戊基、3-戊基、2,2-二甲基丙基、正己基、庚基、正辛基、1,1,3,3-四甲基丁基、2-乙基己基、壬基、癸基、十一烷基或十二烷基。 碳數3～12之環烷基例如為環丙基、環丙基甲基、環丁基、環戊基、環己基、環己基甲基、三甲基環己基、側柏基(thujyl)、降基、基、降蒈基、蒈基、䓝基、降蒎基、蒎基、1-金剛烷基或2-金剛烷基。 碳數2～12之烯基例如為乙烯基、烯丙基、2-丙烯-2-基、2-丁烯-1-基、3-丁烯-1-基、1,3-丁二烯-2-基、2-戊烯-1-基、3-戊烯-2-基、2-䓝基-1-丁烯-3-基、2-甲基-3-丁烯-2-基、3-甲基-2-丁烯-1-基、1,4-戊二烯-3-基、己烯基、辛烯基、壬烯基、癸烯基或十二碳烯基。 碳數3～12之環烯基例如為2-環丁烯-1-基、2-環戊烯-1-基、2-環己烯-1-基、3-環己烯-1-基、2,4-環己二烯-1-基、1-對䓝烯-8-基、4(10)-側柏烯(thujene)-10-基、2-降烯-1-基、2,5-降二烯-1-基、7,7-二甲基-2,4-降蒈二烯-3-基或莰烯基(camphenyl)。 碳數2～12之炔基例如為1-丙炔-3-基、1-丁炔-4-基、1-戊炔-5-基、2-甲基-3-丁炔-2-基、1,4-戊二炔-3-基、1,3-戊二炔-5-基、1-己炔-6-基、順式-3-甲基-2-戊烯-4-炔-1-基、反式-3-甲基-2-戊烯-4-炔-1-基、1,3-己二炔-5-基、1-辛炔-8-基、1-壬炔-9-基、1-癸炔-10-基或1-十二炔-12-基。 鹵素原子例如為氟原子、氯原子、溴原子或碘原子。 上述(a1)有機黑色顏料只要包含選自由上述通式(I)所表示之化合物、上述化合物之幾何異構物、上述化合物之鹽、及上述化合物之幾何異構物之鹽所組成之群中之至少1種即可，亦可包含該等中之複數種。上述(a1)有機黑色顏料就遮光性或電性可靠性之觀點而言，較佳為包含選自由上述通式(I)所表示之化合物、上述化合物之幾何異構物、上述化合物之鹽、及上述化合物之幾何異構物之鹽所組成之群中之至少1種者。 上述(a1)有機黑色顏料較佳為下述通式(I-1)所表示之化合物及/或上述化合物之幾何異構物，更佳為下述通式(I-1)所表示之化合物。 [化4]作為此種有機黑色顏料之具體例，以商品名表示，可列舉：Irgaphor(註冊商標)Black S 0100 CF(BASF公司製造)。 該有機黑色顏料較佳為藉由下述分散劑、溶劑、方法進行分散後再使用。又，分散時若存在上述通式(I)所表示之化合物之磺酸衍生物(磺酸取代體)、尤其是上述通式(I-1)所表示之化合物之磺酸衍生物，則有分散性或保存性提高之情況，因此上述(a1)有機黑色顏料較佳為進而包含該等之磺酸衍生物。作為磺酸衍生物，例如可列舉如下者：於上述通式(I)中，選自由R2 、R3 、R4 、R5 、R7 、R8 、R9 及R10 所組成之群中之至少一者為SO3 H。 又，為了調整色度，上述(a1)有機黑色顏料較佳為進而包含下述通式(I-2)所表示之化合物及/或上述化合物之幾何異構物。 [化5]＜(a2)C.I.顏料藍60＞ 本發明之感光性著色組合物所含之(a)著色劑含有(a2)C.I.顏料藍60作為必須成分。 上述(a1)有機黑色顏料於波長650～750 nm附近之透過率較高，該波長區域之遮光性不充分，但(a2)C.I.顏料藍60於該波長區域具有吸收帶，因此認為，藉由併用(a2)C.I.顏料藍60，可降低於該波長區域之透過率。 又，相較於C.I.顏料藍15：6等其他藍色顏料，(a2)C.I.顏料藍60於300～400 nm附近之透過率較高，抑制紫外線之吸收而容易控制著色間隔物之形狀或階差。又，鮮有雜質溶出，電壓保持率較高，離子密度較低。認為尤其是由於較少地吸收紫外線，故而因紫外線照射引起之分解或雜質之溶出等亦鮮有發生，即便於用以提高液晶配向性之紫外線照射後，電壓保持率或離子密度之降低幅度亦較小，電性可靠性優異。 ＜(a3)碳黑＞ 本發明之感光性著色組合物所含之(a)著色劑含有(a3)碳黑作為必須成分。 (a3)碳黑全面地具有於可見光區域之各波長下之吸收光譜，且透過率亦較低，因此認為，藉由在含有(a1)有機黑色顏料、(a2)C.I.顏料藍60之基礎上進而含有(a3)碳黑，不僅可達成高遮光性，且亦可抑制漏光，又，可降低著色劑相對於全部固形物成分之含有比率，藉此可確保較高之電性可靠性。 作為碳黑之例，可列舉如下之碳黑。 三菱化學公司製造：MA7、MA8、MA11、MA77、MA100、MA100R、MA100S、MA220、MA230、MA600、MCF88，#5、#10、#20、#25、#30、#32、#33、#40、#44、#45、#47、#50、#52、#55、#650、#750、#850、#900、#950、#960、#970、#980、#990、#1000、#2200、#2300、#2350、#2400、#2600、#2650、#3030、#3050、#3150、#3250、#3400、#3600、#3750、#3950、#4000、#4010，OIL7B、OIL9B、OIL11B、OIL30B、OIL31B Degussa公司製造：Printex(註冊商標，以下相同)3、Printex 3OP、Printex 30、Printex 30OP、Printex 40、Printex 45、Printex 55、Printex 60、Printex 75、Printex 80、Printex 85、Printex 90、Printex A、Printex L、Printex G、Printex P、Printex U、Printex V，Special Black 550、Special Black 350、Special Black 250、Special Black 100、Special Black 6、Special Black 5、Special Black 4，Color Black FW1、Color Black FW2、Color Black FW2V、Color Black FW18、Color Black FW200、Color Black S160、Color Black S170 Cabot公司製造：Monarch(註冊商標，以下相同)120、Monarch 280、Monarch 460、Monarch 800、Monarch 880、Monarch 900、Monarch 1000、Monarch 1100、Monarch 1300、Monarch 1400、Monarch 4630，REGAL(註冊商標，以下相同)99、REGAL 99R、REGAL 415、REGAL 415R、REGAL 250、REGAL 250R、REGAL 330、REGAL 400R、REGAL 55R0、REGAL 660R，BLACK PEARLS480、PEARLS130、VULCAN(註冊商標)XC72R、ELFTEX(註冊商標)-8 Birla公司製造：RAVEN(註冊商標，以下相同)11、RAVEN 14、RAVEN 15、RAVEN 16、RAVEN 22RAVEN 30、RAVEN 35、RAVEN 40、RAVEN 410、RAVEN 420、RAVEN 450、RAVEN 500、RAVEN 780、RAVEN 850、RAVEN 890H、RAVEN 1000、RAVEN 1020、RAVEN 1040、RAVEN 1060U、RAVEN 1080U、RAVEN 1170、RAVEN 1190U、RAVEN 1250、RAVEN 1500、RAVEN 2000、RAVEN 2500U、RAVEN 3500、RAVEN 5000、RAVEN 5250、RAVEN 5750、RAVEN 7000 再者，本發明中使用之碳黑之表面之pH值並無特別限定，較佳為9以下，更佳為7以下，進而較佳為5以下，尤佳為4以下。藉由設為上述上限值以下，有分散劑易於附著、分散性變得良好之傾向。碳黑之表面之pH值越低越佳，但通常為2以上。 再者，碳黑之表面之pH值係藉由如下方式測定：使碳黑之粉體分散於水中，對該分散液進行水系之pH值測定。 又，碳黑之平均粒徑較佳為8 nm以上，更佳為17 nm以上，進而較佳為21 nm以上，又，較佳為100 nm以下，更佳為65 nm以下，進而較佳為40 nm以下，尤佳為32 nm以下。藉由設為上述上限值以下，有分散穩定性、保存性變得良好之傾向，又，藉由設為下限值以上，有遮光性變得良好之傾向。 本發明中之碳黑之平均粒徑意指數量平均粒徑。一般而言，碳黑之平均粒徑係藉由如下方式求出：於電子顯微鏡觀察下以數萬倍之倍率拍攝數個視野之照片，利用圖像處理裝置計測該等照片上之2000～3000個左右之粒子而進行粒子圖像解析。 又，碳黑亦可使用經樹脂被覆者。若使用經樹脂被覆之碳黑，則具有提高對玻璃基板之密接性或體積電阻率之效果。作為經樹脂被覆之碳黑，可較佳地使用例如日本專利特開平09-71733號公報中所記載之碳黑等。就體積電阻率或介電常數之方面而言，適宜使用樹脂被覆碳黑。 關於由樹脂進行被覆處理之碳黑，較佳為Na與Ca之合計含量為100 ppm以下。碳黑通常含有以自製造時之原料油或燃油(或燃氣)、反應終止水或造粒水、進而反應爐之爐材等混入之Na或Ca、K、Mg、Al、Fe等作為組成之灰分。其中，Na或Ca之含量一般分別達到數百ppm以上，藉由減少Na或Ca之含量，有可抑制該等向透明電極(ITO)或其他電極浸透而防止電性短路之傾向。 作為減少包含該等Na或Ca之灰分之含量之方法，可採用如下方法：嚴選該等之含量儘可能少之物質作為製造碳黑時之原料油或燃油(或燃氣)及反應終止水，以及儘可能減少調整結構之鹼性物質之添加量。作為其他方法，可列舉利用水或鹽酸等清洗自爐內產出之碳黑而溶解去除Na或Ca之方法。 具體而言，若使碳黑混合分散至水、鹽酸或過氧化氫水中後添加難溶於水之溶劑，則碳黑會向溶劑側移動而與水完全分離，另外，碳黑中存在之Na或Ca大部分會溶解於水或酸而被去除。單獨藉由嚴選碳黑製造過程中之原材料之方式、或單獨藉由水或酸溶解之方式，亦有可能實現將Na與Ca之合計量降低至100 ppm以下，但藉由將該兩種方式併用，則可更容易地使Na與Ca之合計量成為100 ppm以下。 又，樹脂被覆碳黑較佳為pH值6以下之所謂酸性碳黑。由於在水中之分散徑(聚結(agglomerate)徑)變小，故而能夠對包括微細組件(unit)在內進行被覆，從而較佳。進而，較佳為平均粒徑40 nm以下，鄰苯二甲酸二丁酯(DBP)吸收量140 mL/100 g以下。藉由設為上述範圍內，有獲得遮光性良好之塗膜之傾向。 製備經樹脂被覆之碳黑之方法並無特別限定，例如適當調整碳黑及樹脂之調配量後，可採用1.將樹脂與環己酮、甲苯、二甲苯等溶劑混合並進行加熱溶解，將所獲得之樹脂溶液與混合有碳黑及水之懸浮液進行混合攪拌，而使碳黑與水實現分離後，去除水並進行加熱混練而獲得組合物，將該組合物成形為片狀，加以粉碎後，使之乾燥的方法；2.將藉由與上述相同之方式製備之樹脂溶液與懸浮液進行混合攪拌，使碳黑及樹脂實現粒狀化後，分離所獲得之粒狀物並進行加熱，去除所殘存之溶劑及水的方法；3.使順丁烯二酸、反丁烯二酸等羧酸溶解於上述例示之溶劑，添加碳黑進行混合，並乾燥去除溶劑，而獲得添加有羧酸之碳黑後，以乾摻之方式於其中添加樹脂的方法；4.對構成被覆樹脂之含反應性基之單體成分與水進行高速攪拌而製備懸浮液，聚合後加以冷卻，而由聚合物懸浮液獲得含反應性基之樹脂後，於其中添加碳黑進行混練，使碳黑與反應性基反應(使碳黑接枝)，冷卻後進行粉碎的方法等。 進行被覆處理之樹脂之種類亦無特別限定，一般為合成樹脂，進而，結構中存在苯環之樹脂具有與兩性系界面活性劑相同之作用，因此就分散性及分散穩定性之方面而言較佳。 作為具體之合成樹脂，可使用酚樹脂、三聚氰胺樹脂、二甲苯樹脂、苯二甲酸二烯丙酯樹脂、甘酞樹脂、環氧樹脂、烷基苯樹脂等熱硬化性樹脂，或聚苯乙烯、聚碳酸酯、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、改性聚苯醚、聚碸、聚對伸苯基對苯二甲醯胺、聚醯胺醯亞胺、聚醯亞胺、聚胺基雙順丁烯二醯亞胺、聚醚磺基聚苯碸、聚芳酯、聚醚醚酮等熱塑性樹脂。被覆樹脂之量相對於碳黑與樹脂之合計量而較佳為1～30質量%。藉由設為上述下限值以上，有可實現充分之被覆之傾向。另一方面，藉由設為上述上限值以下，有可防止樹脂彼此黏著，優化分散性之傾向。 如此利用樹脂進行被覆處理而成之碳黑可根據常規方法用作著色間隔物之著色劑，可藉由常規方法製作以該著色間隔物作為構成要素之彩色濾光片。若使用此種碳黑，則有可低成本地形成高遮光率且表面反射率較低之著色間隔物之傾向。又，亦推測藉由利用樹脂被覆碳黑表面而具有將Na或Ca封入碳黑中之作用。 ＜其他著色劑＞ 本發明之感光性著色組合物所含之(a)著色劑除含有上述(a1)、(a2)及(a3)之顏料以外，亦可含有其他顏料或其他染料等其他著色劑。其他著色劑之顏色並無特別限制，可使用紅色、橙色、藍色、紫色、綠色、黃色等各色之著色劑。又，亦可使用上述(a1)及(a3)以外之黑色顏料。作為其他著色劑，就抑制液晶之電壓保持率之降低，又，抑制紫外線之吸收而容易控制著色間隔物之形狀或階差之觀點而言，較佳為使用有機顏料。 其他顏料之化學結構並無特別限定，可利用偶氮系、酞菁系、喹吖啶酮系、苯并咪唑酮系、異吲哚啉酮系、二㗁 系、陰丹士林系、苝系等之有機顏料，另外亦可利用各種無機顏料等。以下，以顏料編號表示可使用之有機顏料之具體例。 作為紅色顏料，可列舉：C.I.顏料紅1、2、3、4、5、6、7、8、9、12、14、15、16、17、21、22、23、31、32、37、38、41、47、48、48：1、48：2、48：3、48：4、49、49：1、49：2、50：1、52：1、52：2、53、53：1、53：2、53：3、57、57：1、57：2、58：4、60、63、63：1、63：2、64、64：1、68、69、81、81：1、81：2、81：3、81：4、83、88、90：1、101、101：1、104、108、108：1、109、112、113、114、122、123、144、146、147、149、151、166、168、169、170、172、173、174、175、176、177、178、179、181、184、185、187、188、190、193、194、200、202、206、207、208、209、210、214、216、220、221、224、230、231、232、233、235、236、237、238、239、242、243、245、247、249、250、251、253、254、255、256、257、258、259、260、262、263、264、265、266、267、268、269、270、271、272、273、274、275、276。其中，就遮光性、分散性之觀點而言，可較佳地列舉C.I.顏料紅48：1、122、149、168、177、179、194、202、206、207、209、224、242、254、272，可進而較佳地列舉C.I.顏料紅177、209、224、254、272，可尤佳地列舉C.I.顏料紅177、254、272。於利用紫外線進行硬化之情形時，作為紅色顏料，較佳為使用紫外線吸收率較低者，就該觀點而言，更佳為C.I.顏料紅254、272。 作為橙色(orange)顏料，可列舉：C.I.顏料橙1、2、5、13、16、17、19、20、21、22、23、24、34、36、38、39、43、46、48、49、61、62、64、65、67、68、69、70、71、72、73、74、75、77、78、79。再者，就分散性或遮光性之方面而言，較佳為C.I.顏料橙13、43、64、72，於利用紫外線進行硬化之情形時，作為橙色顏料，較佳為使用紫外線吸收率較低者，就該觀點而言，更佳為C.I.顏料橙64、72，進而較佳為C.I.顏料橙64。 作為藍色顏料，可列舉：C.I.顏料藍1、1：2、9、14、15、15：1、15：2、15：3、15：4、15：6、16、17、19、25、27、28、29、33、35、36、56、56：1、61、61：1、62、63、66、67、68、71、72、73、74、75、76、78、79。其中，就分散性或遮光性之方面而言，較佳為C.I.顏料藍15：6、16。 作為紫色顏料，可列舉：C.I.顏料紫1、1：1、2、2：2、3、3：1、3：3、5、5：1、14、15、16、19、23、25、27、29、31、32、37、39、42、44、47、49、50。其中，就遮光性之觀點而言，可較佳地列舉C.I.顏料紫19、23、29，可進而較佳地列舉C.I.顏料紫23、29。 再者，就分散性或遮光性之方面而言，較佳為C.I.顏料紫23、29，於利用紫外線進行硬化之情形時，作為紫色顏料，較佳為使用紫外線吸收率較低者，就該觀點而言，更佳為C.I.顏料紫29。又，就遮光性之觀點而言亦較佳為C.I.顏料紫29。 作為除紅色顏料、橙色顏料、藍色顏料、紫色顏料以外之可使用之有機著色顏料，例如可列舉綠色顏料、黃色顏料等。 作為綠色顏料，可列舉：C.I.顏料綠1、2、4、7、8、10、13、14、15、17、18、19、26、36、45、48、50、51、54、55。其中，可較佳地列舉C.I.顏料綠7、36。 作為黃色顏料，可列舉：C.I.顏料黃1、1：1、2、3、4、5、6、9、10、12、13、14、16、17、24、31、32、34、35、35：1、36、36：1、37、37：1、40、41、42、43、48、53、55、61、62、62：1、63、65、73、74、75、81、83、87、93、94、95、97、100、101、104、105、108、109、110、111、116、117、119、120、126、127、127：1、128、129、133、134、136、138、139、142、147、148、150、151、153、154、155、157、158、159、160、161、162、163、164、165、166、167、168、169、170、172、173、174、175、176、180、181、182、183、184、185、188、189、190、191、191：1、192、193、194、195、196、197、198、199、200、202、203、204、205、206、207、208。其中，就分散性、可靠性之觀點而言，可較佳地列舉C.I.顏料黃83、117、129、138、139、150、154、155、180、185，可進而較佳地列舉C.I.顏料黃83、138、139、150、180。 該等之中，就遮光性及可靠性之觀點而言，較佳為橙色顏料及/或紫色顏料，就遮光性之觀點而言，更佳為紫色顏料，進而較佳為C.I.顏料紫29。 作為(a1)及(a3)以外之黑色顏料，可列舉：乙炔黑、燈黑、骨黑、石墨、鐵黑、苯胺黑、花青黑、鈦黑、苝黑等。 又，作為其他染料，可列舉：偶氮系染料、蒽醌系染料、酞菁系染料、醌亞胺系染料、喹啉系染料、硝基系染料、羰基系染料、次甲基系染料等。 作為偶氮系染料，例如可列舉：C.I.酸性黃11、C.I.酸性橙7、C.I.酸性紅37、C.I.酸性紅180、C.I.酸性藍29、C.I.直接紅28、C.I.直接紅83、C.I.直接黃12、C.I.直接橙26、C.I.直接綠28、C.I.直接綠59、C.I.反應黃2、C.I.反應紅17、C.I.反應紅120、C.I.反應黑5、C.I.分散橙5、C.I.分散紅58、C.I.分散藍165、C.I.鹼性藍41、C.I.鹼性紅18、C.I.媒染紅7、C.I.媒染黃5、C.I.媒染黑7等。 作為蒽醌系染料，例如可列舉：C.I.還原藍4、C.I.酸性藍40、C.I.酸性綠25、C.I.反應藍19、C.I.反應藍49、C.I.分散紅60、C.I.分散藍56、C.I.分散藍60等。 此外，作為酞菁系染料，例如可列舉：C.I.還原藍5等，作為醌亞胺系染料，例如可列舉：C.I.鹼性藍3、C.I.鹼性藍9等，作為喹啉系染料，例如可列舉：C.I.溶劑黃33、C.I.酸性黃3、C.I.分散黃64等，作為硝基系染料，例如可列舉：C.I.酸性黃1、C.I.酸性橙3、C.I.分散黃42等。 上述(a1)、(a2)、(a3)、及其他顏料較佳為以使平均粒徑通常成為1 μm以下、較佳成為0.5 μm以下，進而較佳成為0.25 μm以下之方式進行分散後使用。此處，平均粒徑之基準為顏料粒子之個數。 再者，顏料之平均粒徑係根據藉由動態光散射法(DLS)所測得之顏料粒徑而求出之值。粒徑測定係針對經充分稀釋之感光性著色組合物(通常進行稀釋以將顏料濃度調整至0.005～0.2質量%左右。其中，若測定機器有其推薦使用之濃度，則依據該濃度)進行，於25℃下測定。 ＜(b)鹼可溶性樹脂＞ 作為本發明中使用之(b)鹼可溶性樹脂，只要為包含羧基或羥基之樹脂，則並無特別限定，例如可列舉：環氧(甲基)丙烯酸酯系樹脂、丙烯酸系樹脂、含羧基之環氧樹脂、含羧基之胺基甲酸酯樹脂、酚醛清漆系樹脂、聚乙烯基苯酚系樹脂等，其中，就優異之製版性之觀點而言，適宜使用 (b1)環氧(甲基)丙烯酸酯系樹脂 (b2)丙烯酸系共聚合樹脂。 該等可單獨使用1種，或將複數種混合使用。 ＜(b1)環氧(甲基)丙烯酸酯系樹脂＞ (b1)環氧(甲基)丙烯酸酯系樹脂係藉由如下方式獲得之樹脂：使環氧化合物(環氧樹脂)與α,β-不飽和單羧酸及/或酯部分具有羧基之α,β-不飽和單羧酸酯進行反應，進而使反應物中之因該反應生成之羥基與多元酸及/或其酐等具有2個以上之能夠與羥基反應之取代基的化合物進行反應。 又，上述(b1)環氧(甲基)丙烯酸酯系樹脂亦包括如下樹脂：於使羥基與上述多元酸及/或其酐進行反應之前，先與具有2個以上之能夠與該羥基反應之取代基的化合物進行反應，其後再與多元酸及/或其酐進行反應而獲得之樹脂。 又，上述(b1)環氧(甲基)丙烯酸酯系樹脂亦包括如下樹脂：使藉由上述反應獲得之樹脂之羧基進而與具有能夠反應之官能基之化合物進行反應而獲得之樹脂。 如此，環氧(甲基)丙烯酸酯系樹脂於化學結構中實質上不具有環氧基，且並不限定於「(甲基)丙烯酸酯」，但由於環氧化合物(環氧樹脂)為原料，且「(甲基)丙烯酸酯」為代表例，故而依習慣如此命名。 作為本發明中使用之(b1)環氧(甲基)丙烯酸酯系樹脂，就顯影性、可靠性之觀點而言，尤其適宜使用下述環氧(甲基)丙烯酸酯系樹脂(b1-1)及/或環氧(甲基)丙烯酸酯系樹脂(b1-2)(以下有時稱為「含羧基之環氧(甲基)丙烯酸酯系樹脂」)。 ＜環氧(甲基)丙烯酸酯系樹脂(b1-1)＞ 藉由對環氧樹脂加成α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯，進而使之與多元酸及/或其酐進行反應而獲得之鹼可溶性樹脂。 ＜環氧(甲基)丙烯酸酯系樹脂鹼可溶性樹脂(b1-2)＞ 藉由對環氧樹脂加成α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯，進而使之與多元醇、及多元酸及/或其酐進行反應而獲得之鹼可溶性樹脂。 此處，所謂環氧樹脂，亦包括藉由熱硬化而形成樹脂以前之原料化合物，作為該環氧樹脂，可自公知之環氧樹脂中適當選擇使用。又，環氧樹脂可使用使酚性化合物與表鹵醇進行反應而獲得之化合物。作為酚性化合物，較佳為2元或2元以上之具有酚性羥基之化合物，可為單體亦可為聚合物。 作為成為原料之環氧樹脂之種類，可適宜地使用：甲酚酚醛清漆型環氧樹脂、苯酚酚醛清漆型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、三苯酚甲烷型環氧樹脂、聯苯酚醛清漆型環氧樹脂、萘酚醛清漆型環氧樹脂、作為二環戊二烯與苯酚或甲酚之聚合加成反應物和表鹵醇之反應產物的環氧樹脂、含金剛烷基之環氧樹脂、茀型環氧樹脂等，可適宜地使用如此於主鏈上具有芳香族環者。 又，作為環氧樹脂之具體例，例如可適宜地使用：雙酚A型環氧樹脂(例如三菱化學公司製造之「jER(註冊商標，以下相同)828」、「jER1001」、「jER1002」、「jER1004」等)、藉由使雙酚A型環氧樹脂之醇性羥基與表氯醇進行反應而獲得之環氧樹脂(例如日本化藥公司製造之「NER-1302」(環氧當量323，軟化點76℃))、雙酚F型樹脂(例如三菱化學公司製造之「jER807」、「EP-4001」、「EP-4002」、「EP-4004」等)、藉由使雙酚F型環氧樹脂之醇性羥基與表氯醇進行反應而獲得之環氧樹脂(例如日本化藥公司製造之「NER-7406」(環氧當量350，軟化點66℃))、雙酚S型環氧樹脂、聯苯縮水甘油醚(例如三菱化學公司製造之「YX-4000」)、苯酚酚醛清漆型環氧樹脂(例如日本化藥公司製造之「EPPN-201」，三菱化學公司製造之「EP-152」、「EP-154」，Dow Chemical公司製造之「DEN-438」)、(鄰/間/對)甲酚酚醛清漆型環氧樹脂(例如日本化藥公司製造之「EOCN(註冊商標，以下相同)-102S」、「EOCN-1020」、「EOCN-104S」)、異氰尿酸三縮水甘油酯(例如日產化學公司製造之「TEPIC(註冊商標)」)、三苯酚甲烷型環氧樹脂(例如日本化藥公司製造之「EPPN(註冊商標，以下相同)-501」、「EPPN-502」、「EPPN-503」)、脂環式環氧樹脂(Diacel公司製造之「Celloxide(註冊商標，以下相同)2021P」、「Celloxide EHPE」)、將由二環戊二烯與苯酚之反應所獲得之酚樹脂進行縮水甘油基化而獲得之環氧樹脂(例如DIC公司製造之「EXA-7200」、日本化藥公司製造之「NC-7300」)、下述通式(B1)～(B4)所表示之環氧樹脂等。具體而言，作為下述通式(B1)所表示之環氧樹脂，可列舉日本化藥公司製造之「XD-1000」，作為下述通式(B2)所表示之環氧樹脂，可列舉日本化藥公司製造之「NC-3000」，作為下述通式(B4)所表示之環氧樹脂，可列舉新日鐵住金化學公司製造之「ESF-300」等。 [化6]上述通式(B1)中，a為平均值，表示0～10之數，R111 分別獨立地表示氫原子、鹵素原子、碳數1～8之烷基、碳數3～10之環烷基、苯基、萘基、或聯苯基。再者，1分子中所存在之複數個R111 分別可相同亦可不同。 [化7]上述通式(B2)中，b為平均值，表示0～10之數，R121 分別獨立地表示氫原子、鹵素原子、碳數1～8之烷基、碳數3～10之環烷基、苯基、萘基、或聯苯基。再者，1分子中所存在之複數個R121 分別可相同亦可不同。 [化8]上述通式(B3)中，X表示下述通式(B3-1)或(B3-2)所表示之連結基。其中，分子結構中包含1個以上之金剛烷結構。c表示2或3。 [化9]上述通式(B3-1)及(B3-2)中，R131 ～R134 及R135 ～R137 分別獨立地表示可具有取代基之金剛烷基、氫原子、可具有取代基之碳數1～12之烷基、或可具有取代基之苯基，*表示鍵結鍵。 [化10]上述通式(B4)中，p及q分別獨立地表示0～4之整數，R141 及R142 分別獨立地表示碳數1～4之烷基或鹵素原子，R143 及R144 分別獨立地表示碳數1～4之伸烷基，x及y分別獨立地表示0以上之整數。 該等之中，較佳為使用通式(B1)～(B4)之任一者所表示之環氧樹脂。 作為α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯，可列舉：(甲基)丙烯酸、丁烯酸、鄰、間或對乙烯基苯甲酸、(甲基)丙烯酸之α位鹵烷基、烷氧基、鹵素、硝基、氰基取代體等單羧酸，琥珀酸2-(甲基)丙烯醯氧基乙酯、己二酸2-(甲基)丙烯醯氧基乙酯、鄰苯二甲酸2-(甲基)丙烯醯氧基乙酯、六氫鄰苯二甲酸2-(甲基)丙烯醯氧基乙酯、順丁烯二酸2-(甲基)丙烯醯氧基乙酯、琥珀酸2-(甲基)丙烯醯氧基丙酯、己二酸2-(甲基)丙烯醯氧基丙酯、四氫鄰苯二甲酸2-(甲基)丙烯醯氧基丙酯、鄰苯二甲酸2-(甲基)丙烯醯氧基丙酯、順丁烯二酸2-(甲基)丙烯醯氧基丙酯、琥珀酸2-(甲基)丙烯醯氧基丁酯、己二酸2-(甲基)丙烯醯氧基丁酯、氫鄰苯二甲酸2-(甲基)丙烯醯氧基丁酯、鄰苯二甲酸2-(甲基)丙烯醯氧基丁酯、順丁烯二酸2-(甲基)丙烯醯氧基丁酯，對(甲基)丙烯酸加成ε-己內酯、β-丙內酯、γ-丁內酯、δ-戊內酯等內酯類而獲得之單體，或者對(甲基)丙烯酸羥基烷基酯、季戊四醇三(甲基)丙烯酸酯加成琥珀酸(酐)、鄰苯二甲酸(酐)、順丁烯二酸(酐)等酸(酐)而獲得之單體，(甲基)丙烯酸二聚物等。 該等之中，就感度方面而言，尤佳者為(甲基)丙烯酸。 作為對環氧樹脂加成α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之方法，可採用公知方法。例如可於酯化觸媒之存在下，於50～150℃之溫度下，使α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯與環氧樹脂進行反應。此處，作為所使用之酯化觸媒，可使用三乙基胺、三甲基胺、苄基二甲基胺、苄基二乙基胺等三級胺，氯化四甲基銨、氯化四乙基銨、氯化十二烷基三甲基銨等四級銨鹽等。 再者，關於環氧樹脂、α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯、及酯化觸媒各成分，分別可僅選擇使用1種，亦可將2種以上併用。 關於α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之使用量，相對於環氧樹脂之環氧基1當量，較佳為0.5～1.2當量之範圍，進而較佳為0.7～1.1當量之範圍。藉由將α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之使用量設為上述下限值以上，有可抑制不飽和基之導入量之不足，容易使後續與多元酸及/或其酐之反應充分進行之傾向。另一方面，藉由設為上述上限值以下，有可抑制α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之未反應物之殘存，容易優化硬化特性之傾向。 作為多元酸及/或其酐，可列舉選自順丁烯二酸、琥珀酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、二苯甲酮四羧酸、甲基六氫鄰苯二甲酸、內亞甲基四氫鄰苯二甲酸、氯菌酸、甲基四氫鄰苯二甲酸、聯苯四羧酸、及該等之酸酐等中之1種或2種以上。 較佳為順丁烯二酸、琥珀酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、聯苯四羧酸、或該等之酸酐。尤佳為四氫鄰苯二甲酸、聯苯四羧酸、四氫鄰苯二甲酸酐、或聯苯四羧酸二酐。 關於多元酸及/或其酐之加成反應，亦可採用公知方法，可於與對環氧樹脂加成α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之加成反應相同之條件下，繼續反應而獲得目標物。關於多元酸及/或其酐成分之加成量，較佳為如使所生成之含羧基之環氧(甲基)丙烯酸酯系樹脂之酸值成為10～150 mgKOH/g之範圍左右，進而較佳為如使酸值成為20～140 mgKOH/g之範圍左右。藉由設為上述下限值以上，有鹼性顯影性變得良好之傾向，又，藉由設為上述上限值以下，有硬化性能變得良好之傾向。 再者，於該多元酸及/或其酐之加成反應時，亦可添加三羥甲基丙烷、季戊四醇、二季戊四醇等多官能醇(多元醇)，而製成導入有多分支結構者。 含羧基之環氧(甲基)丙烯酸酯系樹脂通常藉由如下方式獲得：於環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之反應物中混合多元酸及/或其酐後，或者於環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之反應物中混合多元酸及/或其酐及多官能醇後，進行加溫。於該情形時，多元酸及/或其酐與多官能醇之混合順序並無特別限制。藉由加溫，針對環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之反應物和多官能醇之混合物中所存在之任意某個羥基，多元酸及/或其酐與之進行加成反應。 作為環氧(甲基)丙烯酸酯系樹脂，除上述者以外，可列舉韓國公開專利第10-2013-0022955號公報中記載者等。 環氧(甲基)丙烯酸酯系樹脂藉由凝膠滲透層析法(GPC)所測得之聚苯乙烯換算之重量平均分子量(Mw)通常為1000以上，較佳為1500以上，更佳為2000以上，更佳為3000以上，進而較佳為4000以上，尤佳為5000以上，又，通常為10000以下，較佳為8000以下，更佳為7000以下。藉由設為上述下限值以上，有可抑制於顯影液中之溶解性變得過高之傾向，藉由設為上述上限值以下，有容易使於顯影液中之溶解性變得良好之傾向。例如作為上限與下限之組合，可較佳地列舉1000～10000，可更佳地列舉1500～8000，可進而較佳地列舉2000～8000，可進而更佳地列舉3000～8000，可尤佳地列舉4000～8000，可最佳地列舉5000～7000。 環氧(甲基)丙烯酸酯系樹脂之酸值並無特別限定，較佳為10 mgKOH/g以上，更佳為20 mgKOH/g以上，進而較佳為40 mgKOH/g以上，進而更佳為50 mgKOH/g以上，又，較佳為200 mgKOH/g以下，更佳為150 mgKOH/g以下，進而較佳為120 mgKOH/g以下，尤佳為100 mgKOH/g以下。藉由設為上述下限值以上，有可獲得適度之顯影溶解性之傾向，又，藉由設為上述上限值以下，有可抑制因顯影過度進行而膜溶解之傾向。例如作為上限與下限之組合，可較佳地列舉10～200 mgKOH/g，可更佳地列舉20～150 mgKOH/g，可進而較佳地列舉40～100 mgKOH/g，可尤佳地列舉50～100 mgKOH/g。 環氧(甲基)丙烯酸酯系樹脂之化學結構並無特別限定，就顯影性、可靠性之觀點而言，較佳為含有具有下述通式(b1-I)所表示之部分結構之環氧(甲基)丙烯酸酯系樹脂(以下有時簡記為「(b1-I)環氧(甲基)丙烯酸酯系樹脂」)及/或具有下述通式(b1-II)所表示之部分結構之環氧(甲基)丙烯酸酯系樹脂(以下有時簡記為「(b1-II)環氧(甲基)丙烯酸酯系樹脂」)。 [化11]式(b1-I)中，R11 表示氫原子或甲基，R12 表示可具有取代基之2價烴基，*表示鍵結鍵。式(b1-I)中之苯環可進而經任意之取代基取代。 [化12]式(b1-II)中，R13 分別獨立地表示氫原子或甲基，R14 表示具有環狀烴基作為側鏈之2價烴基，R15 及R16 分別獨立地表示可具有取代基之2價脂肪族基，m及n分別獨立地表示0～2之整數，*表示鍵結鍵。 ＜(b1-I)環氧(甲基)丙烯酸酯系樹脂＞ 首先，對上述具有通式(b1-I)所表示之部分結構之環氧(甲基)丙烯酸酯系樹脂進行詳細說明。 [化13]式(b1-I)中，R11 表示氫原子或甲基，R12 表示可具有取代基之2價烴基，*表示鍵結鍵。式(b1-I)中之苯環可進而經任意之取代基取代。 (R12 ) 上述式(b1-I)中，R12 表示可具有取代基之2價烴基。 作為2價烴基，可列舉：2價脂肪族基、2價芳香族環基、由1個以上之2價脂肪族基與1個以上之2價芳香族環基連結而成之基。 2價脂肪族基可列舉直鏈狀、支鏈狀、環狀者。該等之中，就顯影溶解性之觀點而言，較佳為直鏈狀者。另一方面，就減輕顯影液向曝光部之浸透之觀點而言，較佳為環狀者。其碳數通常為1以上，較佳為3以上，更佳為6以上，又，較佳為20以下，更佳為15以下，進而較佳為10以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙、對基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向例如作為上限與下限之組合，可較佳地列舉1～20，可更佳地列舉3～15，可進而較佳地列舉6～10。 作為2價直鏈狀脂肪族基之具體例，可列舉：亞甲基、伸乙基、伸正丙基、伸正丁基、伸正戊基、伸正己基、伸正庚基等。該等之中，就骨架之剛性之觀點而言，較佳為亞甲基。 作為2價支鏈狀脂肪族基，可列舉於上述2價直鏈狀脂肪族基上具有甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基等作為側鏈之結構。 2價環狀脂肪族基所具有之環之數量並無特別限定，通常為1以上，較佳為2以上，又，通常為12以下，較佳為10以下。藉由設為上述下限值以上，有成為牢固之膜、基板密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。作為2價環狀脂肪族基之具體例，可列舉自環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環、二環戊二烯等環去除2個氫原子所獲得之基。該等之中，就骨架之剛性之觀點而言，較佳為自二環戊二烯環、金剛烷環去除2個氫原子所獲得之基。 作為2價脂肪族基可具有之取代基，可列舉：甲氧基、乙氧基等碳數1～5之烷氧基；羥基；硝基；氰基；羧基等。該等之中，就易合成性之觀點而言，較佳為未經取代。 又，作為2價芳香族環基，可列舉2價芳香族烴環基及2價芳香族雜環基。其碳數通常為4以上，較佳為5以上，更佳為6以上，又，較佳為20以下，更佳為15以下，進而較佳為10以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙、對基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉4～20，可更佳地列舉5～15，可進而較佳地列舉6～10。 作為2價芳香族烴環基中之芳香族烴環，可為單環，亦可為縮合環。作為芳香族烴環基，例如可列舉：具有2個自由原子價之苯環、萘環、蒽環、菲環、苝環、稠四苯環、芘環、苯并芘環、䓛環、聯三伸苯環、乙烷合萘環、螢蒽環、茀環等之基。 又，作為芳香族雜環基中之芳香族雜環，可為單環，亦可為縮合環。作為芳香族雜環基，例如可列舉：具有2個自由原子價之呋喃環、苯并呋喃環、噻吩環、苯并噻吩環、吡咯環、吡唑環、咪唑環、㗁二唑環、吲哚環、咔唑環、吡咯并咪唑環、吡咯并吡唑環、吡咯并吡咯環、噻吩并吡咯環、噻吩并噻吩環、呋喃并吡咯環、呋喃并呋喃環、噻吩并呋喃環、苯并異㗁唑環、苯并異噻唑環、苯并咪唑環、吡啶環、吡環、嗒環、嘧啶環、三環、喹啉環、異喹啉環、㖕啉環、喹㗁啉環、啡啶環、苯并咪唑環、呸啶環、喹唑啉環、喹唑啉酮環、薁環等之基。 該等之中，就圖案化特性之觀點而言，較佳為具有2個自由原子價之苯環或萘環，更佳為具有2個自由原子價之苯環。 作為2價芳香族環基可具有之取代基，可列舉：羥基、甲基、甲氧基、乙基、乙氧基、丙基、丙氧基等。該等之中，就顯影溶解性之觀點而言，較佳為未經取代。 又，作為由1個以上之2價脂肪族基與1個以上之2價芳香族環基連結而成之基，可列舉由1個以上之上述2價脂肪族基與1個以上之上述2價芳香族環基連結而成之基。 2價脂肪族基之數量並無特別限定，通常為1以上，較佳為2以上，又，通常10以下，較佳為5以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙、對基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～5，可進而較佳地列舉2～3。 2價芳香族環基之數量並無特別限定，通常為1以上，較佳為2以上，又，通常10以下，較佳為5以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙、對基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～5，可進而較佳地列舉2～3。 作為由1個以上之2價脂肪族基與1個以上之2價芳香族環基連結而成之基之具體例，可列舉下述式(b1-I-A)～(b1-I-F)所表示之基等。該等之中，就骨架之剛性與膜之疏水化之觀點而言，較佳為下述式(b1-I-A)所表示之基。 [化14]如上所述，式(b1-I)中之苯環可進而經任意之取代基取代。作為該取代基，例如可列舉：羥基、甲基、甲氧基、乙基、乙氧基、丙基、丙氧基等。取代基之數量亦無特別限定，可為1個，亦可為2個以上。 該等之中，就圖案化特性之觀點而言，較佳為未經取代。 又，上述式(b1-I)所表示之部分結構就易合成性之觀點而言，較佳為下述式(b1-I-1)所表示之部分結構。 [化15]式(b1-I-1)中，R11 及R12 與上述式(b1-I)中含義相同，RX 表示氫原子或多元酸殘基，*表示鍵結鍵。式(b1-I-1)中之苯環可進而經任意之取代基取代。 所謂多元酸殘基，意指自多元酸或其酐去除1個OH基而獲得之1價基。作為多元酸，可列舉：選自順丁烯二酸、琥珀酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、二苯甲酮四羧酸、甲基六氫鄰苯二甲酸、內亞甲基四氫鄰苯二甲酸、氯菌酸、甲基四氫鄰苯二甲酸、聯苯四羧酸中之1種或2種以上。 該等之中，就圖案化特性之觀點而言，較佳為順丁烯二酸、琥珀酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、聯苯四羧酸，更佳為四氫鄰苯二甲酸、聯苯四羧酸、聯苯四羧酸。 (b1-I)環氧(甲基)丙烯酸酯系樹脂1分子中所含之上述式(b1-I-1)所表示之部分結構可為1種，亦可為2種以上，例如，RX 為氫原子者與RX 為多元酸殘基者可混合存在。 又，(b1-I)環氧(甲基)丙烯酸酯系樹脂1分子中所含之上述式(b1-I)所表示之部分結構之數量並無特別限定，較佳為1以上，更佳為3以上，又，較佳為20以下，進而較佳為15以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～20，可更佳地列舉3～15。 (b1-I)環氧(甲基)丙烯酸酯系樹脂藉由凝膠滲透層析法(GPC)所測得之聚苯乙烯換算之重量平均分子量(Mw)並無特別限定，較佳為1000以上，更佳為1500以上，進而較佳為2000以上，進而更佳為3000以上，尤佳為4000以上，最佳為5000以上，又，較佳為30000以下，更佳為20000以下，進而較佳為10000以下，尤佳為8000以下。藉由設為上述下限值以上，有感光性著色組合物之殘膜率變得良好之傾向，又，藉由設為上述上限值以下，有解像性變得良好之傾向。例如作為上限與下限之組合，可較佳地列舉1000～30000，可更佳地列1500～20000，可進而較佳地列2000～10000，可進而更佳地列3000～10000，可尤佳地列4000～80000，可最佳地列舉5000～8000。 (b1-I)環氧(甲基)丙烯酸酯系樹脂之酸值並無特別限定，較佳為10 mgKOH/g以上，更佳為20 mgKOH/g以上，進而較佳為40 mgKOH/g以上，進而更佳為50 mgKOH/g以上，尤佳為80 mgKOH/g以上，又，較佳為200 mgKOH/g以下，更佳為150 mgKOH/g以下，進而更佳為130 mgKOH/g以下，尤佳為100 mgKOH/g以下。藉由設為上述下限值以上，有顯影溶解性提高、解像性變得良好之傾向，又，藉由設為上述上限值以下，有感光性著色組合物之殘膜率變得良好之傾向。例如作為上限與下限之組合，可較佳地列舉10～200 mgKOH/g，可更佳地列舉20～150 mgKOH/g，可進而較佳地列舉40～100 mgKOH/g，可進而更佳地列舉50～100 mgKOH/g，可尤佳地列舉80～100 mgKOH/g。 以下，列舉(b1-I)環氧(甲基)丙烯酸酯系樹脂之具體例。再者，例中之*表示鍵結鍵。 [化16][化17][化18][化19]＜(b1-II)環氧(甲基)丙烯酸酯系樹脂＞ 其次，對上述具有通式(b1-II)所表示之部分結構之環氧(甲基)丙烯酸酯系樹脂進行詳細說明。 [化20]式(b1-II)中，R13 分別獨立地表示氫原子或甲基，R14 表示具有環狀烴基作為側鏈之2價烴基，R15 及R16 分別獨立地表示可具有取代基之2價脂肪族基，m及n分別獨立地表示0～2之整數，*表示鍵結鍵。 (R14 ) 上述通式(b1-II)中，R14 表示具有環狀烴基作為側鏈之2價烴基。 作為環狀烴基，可列舉脂肪族環基或芳香族環基。 脂肪族環基所具有之環之數量並無特別限定，通常為1以上，較佳為2以上，又，通常為10以下，較佳為5以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～5，可進而較佳地列舉2～3。 又，脂肪族環基之碳數通常為4以上，較佳為6以上，更佳為8以上，又，較佳為40以下，更佳為30以下，進而較佳為20以下，尤佳為15以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉4～40，可更佳地列舉6～30，可進而較佳地列舉8～20。 作為脂肪族環基中之脂肪族環之具體例，可列舉：環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環等。該等之中，就感光性著色組合物之殘膜率與解像性之觀點而言，較佳為金剛烷環。 另一方面，芳香族環基所具有之環之數量並無特別限定，通常為1以上，較佳為2以上，更佳為3以上，又，通常為10以下，較佳為5以下，更佳為4以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～5，可進而較佳地列舉3～4。 作為芳香族環基，可列舉芳香族烴環基、芳香族雜環基。又，芳香族環基之碳數通常為4以上，較佳為6以上，更佳為8以上，進而更佳為10以上，尤佳為12以上，又，較佳為40以下，更佳為30以下，進而較佳為20以下，尤佳為15以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有圖案化特性變得良好之傾向。例如作為上限與下限之組合，可較佳地列舉4～40，可更佳地列舉6～30，可進而較佳地列舉8～20，可尤佳地列舉10～15。 作為芳香族環基中之芳香族環之具體例，可列舉：苯環、萘環、蒽環、菲環、苝環、稠四苯環、芘環、苯并芘環、䓛環、聯三伸苯環、乙烷合萘環、螢蒽環、茀環等。該等之中，就圖案化特性之觀點而言，較佳為茀環。 又，具有環狀烴基作為側鏈之2價烴基中之2價烴基並無特別限定，例如可列舉：2價脂肪族基、2價芳香族環基、由1個以上之2價脂肪族基與1個以上之2價芳香族環基連結而成之基。 2價脂肪族基可列舉直鏈狀、支鏈狀、環狀者。該等之中，就顯影溶解性之觀點而言，較佳為直鏈狀者，另一方面，就減輕顯影液向曝光部之浸透之觀點而言，較佳為環狀者。其碳數通常為1以上，較佳為3以上，更佳為6以上，又，較佳為25以下，更佳為20以下，進而較佳為15以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙、對基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～25，可更佳地列舉3～20，可進而較佳地列舉6～15。 作為2價直鏈狀脂肪族基之具體例，可列舉：亞甲基、伸乙基、伸正丙基、伸正丁基、伸正戊基、伸正己基、伸正庚基等。該等之中，就骨架之剛性之觀點而言，較佳為亞甲基。 作為2價支鏈狀脂肪族基，可列舉於上述2價直鏈狀脂肪族基上具有甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基等作為側鏈之結構。 2價環狀脂肪族基所具有之環之數量並無特別限定，通常為1以上，較佳為2以上，又，通常為10以下，較佳為5以下，進而較佳為3以下。藉由設為上述下限值以上，有成為牢固之膜、基板密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～5，可進而較佳地列舉2～3。 作為2價環狀脂肪族基之具體例，可列舉自環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環等環去除2個氫原子所獲得之基。該等之中，就骨架之剛性之觀點而言，較佳為自金剛烷環去除2個氫原子所獲得之基。 作為2價脂肪族基可具有之取代基，可列舉：甲氧基、乙氧基等碳數1～5之烷氧基；羥基；硝基；氰基；羧基等。該等之中，就易合成性之觀點而言，較佳為未經取代。 又，作為2價芳香族環基，可列舉2價芳香族烴環基及2價芳香族雜環基。其碳數通常為4以上，較佳為5以上，更佳為6以上，又，較佳為30以下，更佳為20以下，進而較佳為15以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙、對基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉4～30，可更佳地列舉5～20，可進而較佳地列舉6～15。 作為2價芳香族烴環基中之芳香族烴環，可為單環，亦可為縮合環。作為芳香族烴環基，例如可列舉：具有2個自由原子價之苯環、萘環、蒽環、菲環、苝環、稠四苯環、芘環、苯并芘環、䓛環、聯三伸苯環、乙烷合萘環、螢蒽環、茀環等之基。 又，作為芳香族雜環基中之芳香族雜環，可為單環，亦可為縮合環。作為芳香族雜環基，例如可列舉：具有2個自由原子價之呋喃環、苯并呋喃環、噻吩環、苯并噻吩環、吡咯環、吡唑環、咪唑環、㗁二唑環、吲哚環、咔唑環、吡咯并咪唑環、吡咯并吡唑環、吡咯并吡咯環、噻吩并吡咯環、噻吩并噻吩環、呋喃并吡咯環、呋喃并呋喃環、噻吩并呋喃環、苯并異㗁唑環、苯并異噻唑環、苯并咪唑環、吡啶環、吡環、嗒環、嘧啶環、三環、喹啉環、異喹啉環、㖕啉環、喹㗁啉環、啡啶環、苯并咪唑環、呸啶環、喹唑啉環、喹唑啉酮環、薁環等之基。該等之中，就圖案化特性之觀點而言，較佳為具有2個自由原子價之苯環或萘環，更佳為具有2個自由原子價之苯環。 作為2價芳香族環基可具有之取代基，可列舉：羥基、甲基、甲氧基、乙基、乙氧基、丙基、丙氧基等。該等之中，就顯影溶解性之觀點而言，較佳為未經取代。 又，作為由1個以上之2價脂肪族基與1個以上之2價芳香族環基連結而成之基，可列舉由1個以上之上述2價脂肪族基與1個以上之上述2價芳香族環基連結而成之基。 2價脂肪族基之數量並無特別限定，通常為1以上，較佳為2以上，又，通常為10以下，較佳為5以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙、對基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～5，可進而較佳地列舉2～3。 2價芳香族環基之數量並無特別限定，通常為1以上，較佳為2以上，又，通常為10以下，較佳為5以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙、對基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～5，可進而較佳地列舉2～3。 作為由1個以上之2價脂肪族基與1個以上之2價芳香族環基連結而成之基之具體例，可列舉上述式(b1-I-A)～(b1-I-F)所表示之基等。該等之中，就骨架之剛性與膜之疏水化之觀點而言，較佳為上述式(b1-I-C)所表示之基。 作為側鏈之環狀烴基於該等2價烴基上之鍵結態樣並無特別限定，例如可列舉：以該側鏈取代脂肪族基或芳香族環基之1個氫原子之態樣、或者將脂肪族基之1個碳原子包括在內而構成作為側鏈之環狀烴基之態樣。 (R15 、R16 ) 上述通式(b1-II)中，R15 及R16 分別獨立地表示可具有取代基之2價脂肪族基。 2價脂肪族基可列舉直鏈狀、支鏈狀、環狀者。該等之中，就顯影溶解性之觀點而言，較佳為直鏈狀者，另一方面，就減輕顯影液向曝光部之浸透之觀點而言，較佳為環狀者。其碳數通常為1以上，較佳為3以上，更佳為6以上，又，較佳為20以下，更佳為15以下，進而較佳為10以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙、對基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～20，可更佳地列舉3～15，可進而較佳地列舉6～10。 作為2價直鏈狀脂肪族基之具體例，可列舉：亞甲基、伸乙基、伸正丙基、伸正丁基、伸正戊基、伸正己基、伸正庚基等。該等之中，就骨架之剛性之觀點而言，較佳為亞甲基。 作為2價支鏈狀脂肪族基，可列舉於上述2價直鏈狀脂肪族基上具有甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基等作為側鏈之結構。 2價環狀脂肪族基所具有之環之數量並無特別限定，通常為1以上，較佳為2以上，又，通常為12以下，較佳為10以下。藉由設為上述下限值以上，有成為牢固之膜、基板密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～12，可更佳地列舉2～10。 作為2價環狀脂肪族基之具體例，可列舉自環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環、二環戊二烯等環去除2個氫原子所獲得之基。該等之中，就骨架之剛性之觀點而言，較佳為自二環戊二烯環、金剛烷環去除2個氫原子所獲得之基。 作為2價脂肪族基可具有之取代基，可列舉：甲氧基、乙氧基等碳數1～5之烷氧基；羥基；硝基；氰基；羧基等。該等之中，就易合成性之觀點而言，較佳為未經取代。 (m、n) 上述通式(b1-II)中，m及n分別獨立地表示0～2之整數。藉由設為上述下限值以上，有圖案化適合性變得良好、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有顯影性變得良好之傾向。就顯影性之觀點而言，m及n較佳為0。另一方面，就圖案化適合性、表面粗糙之觀點而言，m及n較佳為1以上。 又，上述通式(b1-II)所表示之部分結構就對基板之密接性之觀點而言，較佳為下述通式(b1-II-1)所表示之部分結構。 [化21]式(b1-II-1)中，R13 、R15 、R16 、m及n與上述式(b1-II)中含義相同，Rα 表示可具有取代基之1價環狀烴基，p為1以上之整數，*表示鍵結鍵。式(b1-II-1)中之苯環可進而經任意之取代基取代。 (Rα ) 上述通式(b1-II-1)中，Rα 表示可具有取代基之1價環狀烴基。 作為環狀烴基，可列舉脂肪族環基或芳香族環基。 脂肪族環基所具有之環之數量並無特別限定，通常為1以上，較佳為2以上，又，通常為6以下，較佳為4以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有圖案化特性變得良好之傾向。例如作為上限與下限之組合，可較佳地列舉1～6，可更佳地列舉2～4，可進而較佳地列舉2～3。 又，脂肪族環基之碳數通常為4以上，較佳為6以上，更佳為8以上，又，較佳為40以下，更佳為30以下，進而較佳為20以下，尤佳為15以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有圖案化特性變得良好之傾向。例如作為上限與下限之組合，可較佳地列舉4～40，可更佳地列舉6～30，可進而較佳地列舉8～20，可尤佳地列舉8～15。 作為脂肪族環基中之脂肪族環之具體例，可列舉：環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環等。該等之中，就牢固之膜特性之觀點而言，較佳為金剛烷環。 另一方面，芳香族環基所具有之環之數量並無特別限定，通常為1以上，較佳為2以上，更佳為3以上，又，通常為10以下，較佳為5以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有圖案化特性變得良好之傾向。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～5，可進而較佳地列舉3～5。 作為芳香族環基，可列舉芳香族烴環基、芳香族雜環基。又，芳香族環基之碳數通常為4以上，較佳為5以上，更佳為6以上，又，較佳為30以下，更佳為20以下，進而較佳為15以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有圖案化特性變得良好之傾向。例如作為上限與下限之組合，可較佳地列舉4～30，可更佳地列舉5～20，可進而較佳地列舉6～15。 作為芳香族環基中之芳香族環之具體例，可列舉：苯環、萘環、蒽環、菲環、茀環等。該等之中，就顯影溶解性之觀點而言，較佳為茀環。 作為環狀烴基可具有之取代基，可列舉：甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、戊基、異戊基等碳數1～5之烷基；甲氧基、乙氧基等碳數1～5之烷氧基；羥基；硝基；氰基；羧基等。該等之中，就易合成性之觀點而言，較佳為未經取代。 p表示1以上之整數，較佳為2以上，又，較佳為3以下。藉由設為上述下限值以上，有膜硬化度與殘膜率變得良好之傾向，又，藉由設為上述上限值以下，有顯影性變得良好之傾向。例如作為上限與下限之組合，可較佳地列舉1～3，可更佳地列舉2～3。 該等之中，就牢固之膜硬化度之觀點而言，Rα 較佳為1價脂肪族環基，更佳為金剛烷基。 如上所述，式(b1-II-1)中之苯環可進而經任意之取代基取代。作為該取代基，例如可列舉：羥基、甲基、甲氧基、乙基、乙氧基、丙基、丙氧基等。取代基之數量亦無特別限定，可為1個，亦可為2個以上。 該等之中，就圖案化特性之觀點而言，較佳為未經取代。 以下，列舉上述式(b1-II-1)所表示之部分結構之具體例。 [化22][化23][化24][化25][化26]又，上述通式(b1-II)所表示之部分結構就骨架之剛性及膜疏水化之觀點而言，較佳為下述通式(b1-II-2)所表示之部分結構。 [化27]式(b1-II-2)中，R13 、R15 、R16 、m及n與上述式(b1-II)中含義相同，Rβ 表示可具有取代基之2價環狀烴基，*表示鍵結鍵。式(b1-II-2)中之苯環可進而經任意之取代基取代。 (Rβ ) 上述式(b1-II-2)中，Rβ 表示可具有取代基之2價環狀烴基。 作為環狀烴基，可列舉脂肪族環基或芳香族環基。 脂肪族環基所具有之環之數量並無特別限定，通常為1以上，較佳為2以上，又，通常為10以下，較佳為5以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～5。 又，脂肪族環基之碳數通常為4以上，較佳為6以上，更佳為8以上，又，較佳為40以下，更佳為35以下，進而較佳為30以下。藉由設為上述下限值以上，有抑制顯影時之膜粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制顯影時膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉4～40，可更佳地列舉6～35，可進而較佳地列舉8～30。 作為脂肪族環基中之脂肪族環之具體例，可列舉：環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環等。該等之中，就顯影時之膜減少、解像性之觀點而言，較佳為金剛烷環。 另一方面，芳香族環基所具有之環之數量並無特別限定，通常為1以上，較佳為2以上，更佳為3以上，又，通常為10以下，較佳為5以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～5，可進而較佳地列舉3～5。 作為芳香族環基，可列舉芳香族烴環基、芳香族雜環基。又，芳香族環基之碳數通常為4以上，較佳為6以上，更佳為8以上，進而較佳為10以上，又，較佳為40以下，更佳為30以下，進而較佳為20以下，尤佳為15以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉4～40，可更佳地列舉6～30，可進而較佳地列舉8～20，可尤佳地列舉10～15。 作為芳香族環基中之芳香族環之具體例，可列舉：苯環、萘環、蒽環、菲環、茀環等。該等之中，就顯影性之觀點而言，較佳為茀環。 作為環狀烴基可具有之取代基，可列舉：甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、戊基、異戊基等碳數1～5之烷基；甲氧基、乙氧基等碳數1～5之烷氧基；羥基；硝基；氰基；羧基等。該等之中，就易合成性之觀點而言，較佳為未經取代。 該等之中，就抑制膜減少、解像性之觀點而言，Rβ 較佳為2價脂肪族環基，更佳為2價金剛烷環基。 另一方面，就圖案化特性之觀點而言，Rβ 較佳為2價芳香族環基，更佳為2價茀環基。 如上所述，式(b1-II-2)中之苯環可進而經任意之取代基取代。作為該取代基，例如可列舉：羥基、甲基、甲氧基、乙基、乙氧基、丙基、丙氧基等。取代基之數量亦無特別限定，可為1個，亦可為2個以上。 又，2個苯環可經由取代基而連結。作為該情形時之取代基，可列舉：-O-、-S-、-NH-、-CH2 -等2價基。 該等之中，就圖案化特性之觀點而言，較佳為未經取代。又，就不易產生膜減少等之觀點而言，較佳為經甲基取代。 以下，列舉上述式(b1-II-2)所表示之部分結構之具體例。再者，例中之*表示鍵結鍵。 [化28][化29][化30][化31]另一方面，上述式(b1-II)所表示之部分結構就塗膜殘膜率與圖案化特性之觀點而言，較佳為下述式(b1-II-3)所表示之部分結構。 [化32]式(b1-II-3)中，R13 、R14 、R15 、R16 、m及n與上述式(b1-II)中含義相同，RZ 表示氫原子或多元酸殘基。 所謂多元酸殘基，意指自多元酸或其酐去除1個OH基而獲得之1價基。再者，亦可進而再去除1個OH基而與式(b1-II-3)所表示之其他分子中之RZ 共用OH基，即，複數個式(b1-II-3)可經由RZ 而連結。 作為多元酸，可列舉選自順丁烯二酸、琥珀酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、二苯甲酮四羧酸、甲基六氫鄰苯二甲酸、內亞甲基四氫鄰苯二甲酸、氯菌酸、甲基四氫鄰苯二甲酸、聯苯四羧酸中之1種或2種以上。 該等之中，就圖案化特性之觀點而言，較佳為順丁烯二酸、琥珀酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、聯苯四羧酸，更佳為四氫鄰苯二甲酸、聯苯四羧酸、聯苯四羧酸。 (b1-II)環氧(甲基)丙烯酸酯系樹脂1分子中所含之上述式(b1-II-3)所表示之部分結構可為1種，亦可為2種以上，例如，RZ 為氫原子者與RZ 為多元酸殘基者可混合存在。 又，(b1-II)環氧(甲基)丙烯酸酯系樹脂1分子中所含之上述式(b1-II)所表示之部分結構之數量並無特別限定，較佳為1以上，更佳為3以上，又，較佳為20以下，更佳為15以下，進而較佳為10以下。藉由設為上述下限值以上，有容易獲得牢固之膜、不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度劣化或抑制膜減少，解像性有提高之傾向。例如作為上限與下限之組合，可較佳地列舉1～20，可更佳地列舉3～15，可進而較佳地列舉3～10。 (b1-II)環氧(甲基)丙烯酸酯系樹脂藉由凝膠滲透層析法(GPC)所測得之聚苯乙烯換算之重量平均分子量(Mw)並無特別限定，較佳為1000以上，更佳為2000以上，又，較佳為30000以下，更佳為20000以下，進而較佳為10000以下，進而更佳為7000以下，尤佳為5000以下。藉由設為上述下限值以上，有圖案化特性變得良好之傾向，又，藉由設為上述上限值以下，有容易獲得牢固之膜、不易產生表面粗糙之傾向。例如作為上限與下限之組合，可較佳地列舉1000～30000，可更佳地列舉1000～20000，可進而較佳地列舉2000～10000，可進而更佳地列舉2000～7000，可尤佳地列舉2000～5000。 (b1-II)環氧(甲基)丙烯酸酯系樹脂之酸值並無特別限定，較佳為10 mgKOH/g以上，更佳為20 mgKOH/g以上，進而較佳為40 mgKOH/g以上，進而更佳為60 mgKOH/g以上，尤佳為80 mgKOH/g以上，最佳為100 mgKOH/g以上，又，較佳為200 mgKOH/g以下，更佳為150 mgKOH/g以下，進而較佳為120gKOH/g以下。藉由設為上述下限值以上，有容易獲得牢固之膜之傾向，又，藉由設為上述上限值以下，有顯影溶解性提高、解像性變得良好之傾向。例如作為上限與下限之組合，可較佳地列舉10～200 mgKOH/g，可更佳地列舉20～150 mgKOH/g，可進而較佳地列舉40～150 mgKOH/g，可進而更佳地列舉60～120 mgKOH/g，可尤佳地列舉80～120 mgKOH/g。 環氧(甲基)丙烯酸酯系樹脂可單獨使用1種，亦可將2種以上之樹脂混合使用。 又，可將上述環氧(甲基)丙烯酸酯系樹脂之一部分換用為其他黏合劑樹脂。即，可將環氧(甲基)丙烯酸酯系樹脂與其他黏合劑樹脂併用。於該情形時，較佳為將(b)鹼可溶性樹脂中之環氧(甲基)丙烯酸酯系樹脂之比率設為50質量%以上，更佳為設為60質量%以上，進而較佳為設為70質量%以上，尤佳為設為80質量%以上，又，通常設為100質量%以下。 例如作為上限與下限之組合，可較佳地列舉50～100質量%，可更佳地列舉60～100質量%，可進而較佳地列舉70～100質量%，可尤佳地列舉80～100質量%。 能夠與環氧(甲基)丙烯酸酯系樹脂併用之其他黏合劑樹脂並無限制，自感光性著色組合物通常使用之樹脂中選擇即可。例如可列舉：日本專利特開2007-271727號公報、日本專利特開2007-316620號公報、日本專利特開2007-334290號公報等中所記載之黏合劑樹脂等。再者，其他黏合劑樹脂均可單獨使用1種或將2種以上組合使用。 又，作為(b)鹼可溶性樹脂，就與顏料或分散劑等之相溶性之觀點而言，較佳為使用(b2)丙烯酸系共聚合樹脂，可較佳地使用日本專利特開2014-137466號公報中記載者。 作為丙烯酸系共聚合樹脂，例如可列舉：具有1個以上之羧基之乙烯性不飽和單體(以下記為「不飽和單體(b2-1)」)與其他能夠進行共聚合之乙烯性不飽和單體(以下記為「不飽和單體(b2-2)」)的共聚合物。 作為不飽和單體(b2-1)，例如可列舉：(甲基)丙烯酸、丁烯酸、α-氯丙烯酸、桂皮酸等不飽和單羧酸；順丁烯二酸、順丁烯二酸酐、反丁烯二酸、檸康酸、檸康酸酐、中康酸等不飽和二羧酸或其酐；琥珀酸單[2-(甲基)丙烯醯氧基乙基]酯、鄰苯二甲酸單[2-(甲基)丙烯醯氧基乙基]酯等二元以上之多元羧酸之單[(甲基)丙烯醯氧基烷基]酯；ω-羧基聚己內酯單(甲基)丙烯酸酯等兩末端具有羧基與羥基之聚合物之單(甲基)丙烯酸酯；對乙烯基苯甲酸等。 該等不飽和單體(b2-1)可單獨使用或將2種以上混合使用。 又，作為不飽和單體(b2-2)，例如可列舉：N-苯基順丁烯二醯亞胺、N-環己基順丁烯二醯亞胺等N-取代順丁烯二醯亞胺； 苯乙烯、α-甲基苯乙烯、對羥基苯乙烯、對羥基-α-甲基苯乙烯、對乙烯基苄基縮水甘油醚、乙烯合萘等芳香族乙烯系化合物； (甲基)丙烯酸甲酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸苄酯、聚乙二醇(聚合度2～10)甲醚(甲基)丙烯酸酯、聚丙二醇(聚合度2～10)甲醚(甲基)丙烯酸酯、聚乙二醇(聚合度2～10)單(甲基)丙烯酸酯、聚丙二醇(聚合度2～10)單(甲基)丙烯酸酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸異酯、(甲基)丙烯酸三環[5.2.1.02,6 ]癸烷-8-基酯、二環戊烯基(甲基)丙烯酸酯、甘油單(甲基)丙烯酸酯、(甲基)丙烯酸4-羥基苯酯、對異丙苯基苯酚之環氧乙烷改性(甲基)丙烯酸酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸3,4-環氧環己基甲酯、3-[(甲基)丙烯醯氧基甲基]氧雜環丁烷、3-[(甲基)丙烯醯氧基甲基]-3-乙基氧雜環丁烷等(甲基)丙烯酸酯； 環己基乙烯醚、異基乙烯醚、三環[5.2.1.02,6 ]癸烷-8-基乙烯醚、五環十五烷基乙烯醚、3-(乙烯氧基甲基)-3-乙基氧雜環丁烷等乙烯醚； 聚苯乙烯、聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸正丁酯、聚矽氧烷等於聚合物分子鏈之末端具有單(甲基)丙烯醯基之巨單體等。 該等不飽和單體(b2-2)可單獨使用或將2種以上混合使用。 於不飽和單體(b2-1)與不飽和單體(b2-2)之共聚物中，該共聚物中之不飽和單體(b2-1)之共聚比率較佳為5～50質量%，更佳為10～40質量%。藉由使不飽和單體(b2-1)於此範圍內進行共聚，有可獲得鹼性顯影性及保存穩定性優異之感光性著色組合物之傾向。 作為不飽和單體(b2-1)與不飽和單體(b2-2)之共聚物之具體例，例如可列舉：日本專利特開平7-140654號公報、日本專利特開平8-259876號公報、日本專利特開平10-31308號公報、日本專利特開平10-300922號公報、日本專利特開平11-174224號公報、日本專利特開平11-258415號公報、日本專利特開2000-56118號公報、日本專利特開2004-101728號公報等中揭示之共聚物。 不飽和單體(b2-1)與不飽和單體(b2-2)之共聚物可藉由公知方法製造，亦可藉由例如日本專利特開2003-222717號公報、日本專利特開2006-259680號公報、國際公開第2007/029871號等中揭示之方法而控制其結構或Mw、Mw/Mn。 ＜(c)光聚合起始劑＞ (c)光聚合起始劑係具有直接吸收光而引發分解反應或奪氫反應，產生聚合活性自由基之功能之成分。視需要亦可添加使用聚合促進劑(鏈轉移劑)、增感色素等附加劑。 作為光聚合起始劑，例如可列舉：日本專利特開昭59-152396號公報、日本專利特開昭61-151197號公報中所記載之包含二茂鈦化合物之二茂金屬化合物；日本專利特開2000-56118號公報中所記載之六芳基聯咪唑衍生物；日本專利特開平10-39503號公報記載之鹵甲基化㗁二唑衍生物、鹵甲基均三衍生物；α-胺基烷基苯酮衍生物；日本專利特開2000-80068號公報、日本專利特開2006-36750號公報等中所記載之肟酯系化合物等。 具體而言，例如，作為二茂鈦衍生物類，可列舉：二氯化二環戊二烯基鈦、二環戊二烯基鈦聯苯、二環戊二烯基鈦雙(2,3,4,5,6-五氟苯-1-基)、二環戊二烯基鈦雙(2,3,5,6-四氟苯-1-基)、二環戊二烯基鈦雙(2,4,6-三氟苯-1-基)、二環戊二烯基鈦二(2,6-二氟苯-1-基)、二環戊二烯基鈦二(2,4-二氟苯-1-基)、二(甲基環戊二烯基)鈦雙(2,3,4,5,6-五氟苯-1-基)、二(甲基環戊二烯基)鈦雙(2,6-二氟苯-1-基)、二環戊二烯基鈦[2,6-二氟-3-(吡咯-1-基)-苯-1-基]等。 又，作為六芳基聯咪唑衍生物類，可列舉：2-(2'-氯苯基)-4,5-二苯基咪唑二聚物、2-(2'-氯苯基)-4,5-雙(3'-甲氧基苯基)咪唑二聚物、2-(2'-氟苯基)-4,5-二苯基咪唑二聚物、2-(2'-甲氧基苯基)-4,5-二苯基咪唑二聚物、(4'-甲氧基苯基)-4,5-二苯基咪唑二聚物等。 又，作為鹵甲基化㗁二唑衍生物類，可列舉：2-三氯甲基-5-(2'-苯并呋喃基)-1,3,4-㗁二唑、2-三氯甲基-5-[β-(2'-苯并呋喃基)乙烯基]-1,3,4-㗁二唑、2-三氯甲基-5-[β-(2'-(6''-苯并呋喃基)乙烯基)]-1,3,4-㗁二唑、2-三氯甲基-5-呋喃基-1,3,4-㗁二唑等。 又，作為鹵甲基均三衍生物類，可列舉：2-(4-甲氧基苯基)-4,6-雙(三氯甲基)均三、2-(4-甲氧基萘基)-4,6-雙(三氯甲基)均三、2-(4-乙氧基萘基)-4,6-雙(三氯甲基)均三、2-(4-乙氧基羰基萘基)-4,6-雙(三氯甲基)均三等。 又，作為α-胺基烷基苯酮衍生物類，可列舉：2-甲基-1-[4-(甲硫基)苯基]-2-啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-啉基苯基)-丁酮-1、2-苄基-2-二甲基胺基-1-(4-啉基苯基)丁烷-1-酮、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸異戊酯、4-二乙基胺基苯乙酮、4-二甲基胺基苯丙酮、1,4-二甲基胺基苯甲酸2-乙基己酯、2,5-雙(4-二乙基胺基亞苄基)環己酮、7-二乙基胺基-3-(4-二乙基胺基苯甲醯基)香豆素、4-(二乙基胺基)查耳酮等。 作為光聚合起始劑，尤其就感度或製版性之方面而言有效的是肟酯系化合物，於使用包含酚性羥基之鹼可溶性樹脂之情形等時，尤其是此種感度優異之肟酯系化合物有用。肟酯系化合物於其結構中同時具有吸收紫外線之結構、傳遞光能之結構及產生自由基之結構，因此以少量即可實現較高感度、且於熱反應時穩定，使用少量便能夠獲得高感度之感光性著色組合物。 作為肟酯系化合物，例如可列舉下述通式(IV)所表示之化合物。 [化33]上述式(IV)中，R21a 表示氫原子、可具有取代基之烷基、或可具有取代基之芳香族環基，R21b 表示包含芳香環或雜芳香環之任意之取代基，R22a 表示可具有取代基之烷醯基、或可具有取代基之芳醯基。 R21a 中之烷基之碳數並無特別限定，就於溶劑中之溶解性或感度之觀點而言，通常為1以上，較佳為2以上，又，通常為20以下，較佳為15以下，更佳為10以下。作為烷基之具體例，可列舉：甲基、乙基、丙基、環戊基乙基、丙基等。例如作為上限與下限之組合，可較佳地列舉1～20，可更佳地列舉2～15，可進而較佳地列舉2～10。 作為烷基可具有之取代基，可列舉：芳香族環基、羥基、羧基、鹵素原子、胺基、醯胺基、4-(2-甲氧基-1-甲基)乙氧基-2-甲基苯基或N-乙醯基-N-乙醯氧基胺基等，就易合成性之觀點而言，較佳為未經取代。 作為R21a 中之芳香族環基，可列舉芳香族烴環基及芳香族雜環基。芳香族環基之碳數並無特別限定，就於感光性著色組合物中之溶解性之觀點而言，較佳為5以上。又，就顯影性之觀點而言，較佳為30以下，更佳為20以下，進而較佳為12以下。例如作為上限與下限之組合，可較佳地列舉5～30，可更佳地列舉5～20，可進而較佳地列舉5～12。 作為芳香族環基之具體例，可列舉：苯基、萘基、吡啶基、呋喃基等，該等之中，就顯影性之觀點而言，較佳為苯基或萘基，更佳為苯基。 作為芳香族環基可具有之取代基，可列舉：羥基、羧基、鹵素原子、胺基、醯胺基、烷基、烷氧基、由該等取代基連結而成之基等，就顯影性之觀點而言，較佳為烷基、烷氧基、由該等連結而成之基，更佳為連結而成之烷氧基。 該等之中，就顯影性之觀點而言，R21a 較佳為可具有取代基之芳香族環基，進而較佳為取代基中具有連結而成之烷氧基之芳香族環基。 又，作為R21b ，可較佳地列舉：可經取代之咔唑基、可經取代之9-氧硫基或可經取代之二苯硫醚基。該等之中，就感度之觀點而言，較佳為可經取代之咔唑基。另一方面，就電性可靠性之觀點而言，較佳為可經取代之二苯硫醚基。 又，R22a 中之烷醯基之碳數並無特別限定，就於溶劑中之溶解性或感度之觀點而言，通常為2以上，較佳為3以上，又，通常為20以下，較佳為15以下，更佳為10以下，進而較佳為5以下。例如作為上限與下限之組合，可較佳地列舉2～20，可更佳地列舉2～15，可進而較佳地列舉3～10，可尤佳地列舉3～5。 作為烷醯基之具體例，可列舉：乙醯基、丙醯基、丁醯基等。 作為烷醯基可具有之取代基，可列舉：芳香族環基、羥基、羧基、鹵素原子、胺基、醯胺基等，就易合成性之觀點而言，較佳為未經取代。 又，R22a 中之芳醯基之碳數並無特別限定，就於溶劑中之溶解性或感度之觀點而言，通常為7以上，較佳為8以上，又，通常為20以下，較佳為15以下，更佳為10以下。作為芳醯基之具體例，可列舉：苯甲醯基、萘甲醯基等。例如作為上限與下限之組合，可較佳地列舉7～20，可更佳地列舉8～15，可進而較佳地列舉8～10。 作為芳醯基可具有之取代基，可列舉：羥基、羧基、鹵素原子、胺基、醯胺基、烷基等，就易合成性之觀點而言，較佳為未經取代。 該等之中，就感度之觀點而言，R22a 較佳為可具有取代基之烷醯基，更佳為未經取代之烷醯基，進而較佳為乙醯基。 光聚合起始劑可單獨使用1種，亦可將2種以上組合使用。 為了提高感應感度，視需要可於光聚合起始劑中調配與圖像曝光光源之波長對應之增感色素、聚合促進劑。作為增感色素，可列舉：日本專利特開平4-221958號公報、日本專利特開平4-219756號公報中所記載之色素，日本專利特開平3-239703號公報、日本專利特開平5-289335號公報中所記載之具有雜環之香豆素色素，日本專利特開平3-239703號公報、日本專利特開平5-289335號公報中所記載之3-酮基香豆素化合物，日本專利特開平6-19240號公報中所記載之吡咯亞甲基色素，以及日本專利特開昭47-2528號公報、日本專利特開昭54-155292號公報、日本專利特公昭45-37377號公報、日本專利特開昭48-84183號公報、日本專利特開昭52-112681號公報、日本專利特開昭58-15503號公報、日本專利特開昭60-88005號公報、日本專利特開昭59-56403號公報、日本專利特開平2-69號公報、日本專利特開昭57-168088號公報、日本專利特開平5-107761號公報、日本專利特開平5-210240號公報、日本專利特開平4-288818號公報中所記載之具有二烷基胺基苯骨架之色素等。 該等增感色素中之較佳者為含胺基之增感色素，更佳者為同一分子內具有胺基及苯基之化合物。尤佳者例如為4,4'-二甲基胺基二苯甲酮、4,4'-二乙基胺基二苯甲酮、2-胺基二苯甲酮、4-胺基二苯甲酮、4,4'-二胺基二苯甲酮、3,3'-二胺基二苯甲酮、3,4-二胺基二苯甲酮等二苯甲酮系化合物；2-(對二甲基胺基苯基)苯并㗁唑、2-(對二乙基胺基苯基)苯并㗁唑、2-(對二甲基胺基苯基)苯并[4,5]苯并㗁唑、2-(對二甲基胺基苯基)苯并[6,7]苯并㗁唑、2,5-雙(對二乙基胺基苯基)-1,3,4-㗁唑、2-(對二甲基胺基苯基)苯并噻唑、2-(對二乙基胺基苯基)苯并噻唑、2-(對二甲基胺基苯基)苯并咪唑、2-(對二乙基胺基苯基)苯并咪唑、2,5-雙(對二乙基胺基苯基)-1,3,4-噻二唑、(對二甲基胺基苯基)吡啶、(對二乙基胺基苯基)吡啶、(對二甲基胺基苯基)喹啉、(對二乙基胺基苯基)喹啉、(對二甲基胺基苯基)嘧啶、(對二乙基胺基苯基)嘧啶等含對二烷基胺基苯基之化合物等。其中，最佳者為4,4'-二烷基胺基二苯甲酮。 增感色素可單獨使用1種，亦可將2種以上併用。 作為聚合促進劑，例如可使用：對二甲基胺基苯甲酸乙酯、2-二甲基胺基苯甲酸乙酯等芳香族胺，正丁基胺、N-甲基二乙醇胺等脂肪族胺，下述巰基化合物等。聚合促進劑可單獨使用1種，亦可將2種以上併用。 ＜(d)乙烯性不飽和化合物＞ 本發明之感光性著色組合物含有(d)乙烯性不飽和化合物。藉由含有(d)乙烯性不飽和化合物，感度提高。 本發明中使用之乙烯性不飽和化合物係於分子內具有至少1個乙烯性不飽和基之化合物。具體而言，例如可列舉：(甲基)丙烯酸、(甲基)丙烯酸烷基酯、丙烯腈、苯乙烯、及具有1個乙烯性不飽和鍵之羧酸與多元或一元醇之單酯等。 本發明中，尤其理想的是使用1分子中具有2個以上之乙烯性不飽和基之多官能乙烯性單體。多官能乙烯性單體所具有之乙烯性不飽和基之數量並無特別限定，通常為2個以上，較佳為4個以上，更佳為5個以上，又，較佳為8個以下，更佳為7個以下。藉由設為上述下限值以上，有成為高感度之傾向，藉由設為上述上限值以下，有於溶劑中之溶解性提高之傾向。例如作為上限與下限之組合，可較佳地列舉2～8個，可更佳地列舉4～7個，可進而較佳地列舉5～7個。 作為多官能乙烯性單體之例，例如可列舉：脂肪族聚羥基化合物與不飽和羧酸之酯，芳香族聚羥基化合物與不飽和羧酸之酯，藉由脂肪族聚羥基化合物、芳香族聚羥基化合物等多價羥基化合物與不飽和羧酸及多元羧酸之酯化反應所獲得之酯等。 作為上述脂肪族聚羥基化合物與不飽和羧酸之酯，可列舉：乙二醇二丙烯酸酯、三乙二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基乙烷三丙烯酸酯、季戊四醇二丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六丙烯酸酯、甘油丙烯酸酯等脂肪族聚羥基化合物之丙烯酸酯，將該等例示化合物之丙烯酸酯替換為甲基丙烯酸酯而獲得之甲基丙烯酸酯，同樣地替換為伊康酸酯而獲得之伊康酸酯、替換為丁烯酸酯而獲得之丁烯酸酯、或替換為順丁烯二酸酯而獲得之順丁烯二酸酯等。 作為芳香族聚羥基化合物與不飽和羧酸之酯，可列舉：對苯二酚二丙烯酸酯、對苯二酚二甲基丙烯酸酯、間苯二酚二丙烯酸酯、間苯二酚二甲基丙烯酸酯、鄰苯三酚三丙烯酸酯等芳香族聚羥基化合物之丙烯酸酯及甲基丙烯酸酯等。 藉由多元羧酸及不飽和羧酸與多價羥基化合物之酯化反應所獲得之酯未必是單一物質，但若舉出代表性之具體例，則可列舉：丙烯酸、鄰苯二甲酸及乙二醇之縮合物，丙烯酸、順丁烯二酸及二乙二醇之縮合物，甲基丙烯酸、對苯二甲酸及季戊四醇之縮合物，丙烯酸、己二酸、丁二醇及甘油之縮合物等。 除此以外，作為本發明中可使用之多官能乙烯性單體之例，有用的是：如使聚異氰酸酯化合物與含羥基之(甲基)丙烯酸酯反應、或使聚異氰酸酯化合物與多元醇及含羥基之(甲基)丙烯酸酯反應而獲得之(甲基)丙烯酸胺基甲酸酯類；如多元環氧化合物與羥基(甲基)丙烯酸酯或(甲基)丙烯酸之加成反應物之環氧丙烯酸酯類；伸乙基雙丙烯醯胺等丙烯醯胺類；鄰苯二甲酸二烯丙酯等烯丙酯類；鄰苯二甲酸二乙烯酯等含乙烯基之化合物等。 作為上述(甲基)丙烯酸胺基甲酸酯類，例如可列舉：DPHA-40H、UX-5000、UX-5002D-P20、UX-5003D、UX-5005(日本化藥公司製造)，U-2PPA、U-6LPA、U-10PA、U-33H、UA-53H、UA-32P、UA-1100H(新中村化學工業公司製造)，UA-306H、UA-510H、UF-8001G(共榮社化學公司製造)，UV-1700B、UV-7600B、UV-7605B、UV-7630B、UV7640B(日本合成化學工業公司製造)等。 該等之中，就硬化性之觀點而言，作為(d)乙烯性不飽和化合物，較佳為使用(甲基)丙烯酸烷基酯，更佳為使用二季戊四醇六丙烯酸酯。 該等可單獨使用1種，亦可將2種以上併用。 ＜(e)溶劑＞ 本發明之感光性著色組合物含有(e)溶劑。藉由含有(e)溶劑，可使(a)著色劑溶解或分散於溶劑中，又，便於進行塗佈。 本發明之感光性著色組合物通常係以(a)著色劑、(b)鹼可溶性樹脂、(c)光聚合起始劑、(d)乙烯性不飽和化合物、(f)分散劑、及視需要使用之其他各種材料溶解或分散於溶劑中之狀態使用。溶劑之中，就分散性或塗佈性之觀點而言，較佳為有機溶劑。 有機溶劑之中，就塗佈性之觀點而言，較佳為選擇沸點為100～300℃之範圍者，更佳為選擇沸點為120～280℃之範圍者。再者，此處提及之沸點係指壓力1013.25 hPa下之沸點，關於以下沸點均相同。 作為此種有機溶劑，例如可列舉如下者。 乙二醇單甲醚、乙二醇單乙醚、乙二醇單丙醚、乙二醇單丁醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單正丁醚、丙二醇第三丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單正丁醚、甲氧基甲基戊醇、二丙二醇單乙醚、二丙二醇單甲醚、3-甲氧基丁醇、3-甲基-3-甲氧基丁醇、三乙二醇單甲醚、三乙二醇單乙醚、三丙二醇甲醚之類的二醇單烷基醚類； 乙二醇二甲醚、乙二醇二乙醚、二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇二丙醚、二乙二醇二丁醚、二丙二醇二甲醚之類的二醇二烷基醚類； 乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙二醇單正丁醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丙醚乙酸酯、丙二醇單丁醚乙酸酯、乙酸甲氧基丁酯、乙酸3-甲氧基丁酯、乙酸甲氧基戊酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、二乙二醇單正丁醚乙酸酯、二丙二醇單甲醚乙酸酯、三乙二醇單甲醚乙酸酯、三乙二醇單乙醚乙酸酯、乙酸3-甲基-3-甲氧基丁酯之類的二醇烷基醚乙酸酯類； 乙二醇二乙酸酯、1,3-丁二醇二乙酸酯、1,6-己醇二乙酸酯等二醇二乙酸酯類； 環己醇乙酸酯等烷基乙酸酯類； 戊醚、二乙醚、二丙醚、二異丙醚、二丁醚、二戊醚、乙基異丁醚、二己醚之類的醚類； 丙酮、甲基乙基酮、甲基戊基酮、甲基異丙基酮、甲基異戊基酮、二異丙基酮、二異丁基酮、甲基異丁基酮、環己酮、乙基戊基酮、甲基丁基酮、甲基己基酮、甲基壬基酮、甲氧基甲基戊酮之類的酮類； 乙醇、丙醇、丁醇、己醇、環己醇、乙二醇、丙二醇、丁二醇、二乙二醇、二丙二醇、三乙二醇、甲氧基甲基戊醇、甘油、苄醇之類的一元或多元醇類； 正戊烷、正辛烷、二異丁烯、正己烷、己烯、異戊二烯、二戊烯、十二烷之類的脂肪族烴類； 環己烷、甲基環己烷、甲基環己烯、聯環己基之類的脂環式烴類； 苯、甲苯、二甲苯、異丙苯之類的芳香族烴類； 甲酸戊酯、甲酸乙酯、乙酸乙酯、乙酸丁酯、乙酸丙酯、乙酸戊酯、異丁酸甲酯、乙二醇乙酸酯、丙酸乙酯、丙酸丙酯、丁酸丁酯、丁酸異丁酯、異丁酸甲酯、辛酸乙酯、硬脂酸丁酯、苯甲酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-甲氧基丙酸丙酯、3-甲氧基丙酸丁酯、γ-丁內酯之類的鏈狀或環狀酯類； 3-甲氧基丙酸、3-乙氧基丙酸之類的烷氧基羧酸類； 氯丁烷、氯戊烷之類的鹵化烴類； 甲氧基甲基戊酮之類的醚酮類； 乙腈、苯甲腈之類的腈類等。 作為相當於上述各者之市售有機溶劑，可列舉：礦油精、Varsol#2、Apco#18溶劑、Apco稀釋劑、Socal Solvent No.1及No.2、Solvesso#150、Shell TS28溶劑、卡必醇、乙基卡必醇、丁基卡必醇、甲基溶纖劑(「溶纖劑」為註冊商標。以下相同)、乙基溶纖劑、乙酸乙基溶纖劑、乙酸甲基溶纖劑、二乙二醇二甲醚(diglyme)(均為商品名)等。 該等有機溶劑可單獨使用，亦可將2種以上併用。 於藉由光微影法形成著色間隔物之情形時，作為有機溶劑，較佳為選擇沸點為100～200℃之範圍者。更佳為具有120～170℃之沸點者。 上述有機溶劑之中，就塗佈性、表面張力等之平衡性較佳，組合物中之構成成分之溶解度相對較高之方面而言，較佳為二醇烷基醚乙酸酯類。 又，二醇烷基醚乙酸酯類可單獨使用，但亦可與其他有機溶劑併用。作為併用之有機溶劑，尤佳為二醇單烷基醚類。其中，尤其就組合物中之構成成分之溶解性而言，較佳為丙二醇單甲醚。 再者，二醇單烷基醚類之極性較高，若添加量過多，則有顏料容易凝集，其後獲得之感光性著色組合物之黏度上升等保存穩定性降低之傾向，因此溶劑中之二醇單烷基醚類之比率較佳為5質量%～30質量%，更佳為5質量%～20質量%。 又，亦較佳為併用具有150℃以上之沸點之有機溶劑(以下有時稱為「高沸點溶劑」)。藉由併用此種高沸點溶劑，感光性著色組合物不易變乾，具有防止因急遽乾燥而破壞顏料於組合物中之均勻分散狀態之效果。即，例如具有防止於狹縫噴嘴前端部因著色劑等析出、固化而產生異物缺陷之效果。就此種效果較顯著之方面而言，上述各種溶劑之中，尤佳為二乙二醇單正丁醚、二乙二醇單正丁醚乙酸酯、及二乙二醇單乙醚乙酸酯。 於併用高沸點溶劑之情形時，有機溶劑中之高沸點溶劑之含有比率較佳為3質量%～50質量%，更佳為5質量%～40質量%，尤佳為5質量%～30質量%。藉由設為上述下限值以上，有例如可抑制於狹縫噴嘴前端部因色料等析出、固化而引起異物缺陷之傾向，又，藉由設為上述上限值以下，有可抑制組合物之乾燥溫度推遲，抑制減壓乾燥製程之工站時間(tact)不良、或預烘烤之銷痕跡等問題之傾向。 再者，沸點150℃以上之高沸點溶劑可為二醇烷基醚乙酸酯類，或亦可為二醇烷基醚類，於該情形時，可不再另外含有沸點150℃以上之高沸點溶劑。 作為較佳之高沸點溶劑，例如於上述各種溶劑之中，可列舉：二乙二醇單正丁醚乙酸酯、二乙二醇單乙醚乙酸酯、二丙二醇甲醚乙酸酯、1,3-丁二醇二乙酸酯、1,6-己醇二乙酸酯、三乙酸甘油酯等。 ＜(f)分散劑＞ 為了確保本發明之感光性著色組合物之品質穩定性，重要的是(a)著色劑之微細分散且其分散狀態之穩定化，因此本發明之感光性著色組合物含有(f)分散劑。 作為(f)分散劑，較佳為具有官能基之高分子分散劑，進而，就分散穩定性之方面而言，較佳為具有羧基，磷酸基、磺酸基、或該等之鹽基，一級、二級或三級胺基，四級銨鹽基，源自吡啶、嘧啶、吡等含氮雜環之基等官能基的高分子分散劑。其中，尤其就於使顏料分散時以少量之分散劑即可實現分散之觀點而言，尤佳為具有一級、二級或三級胺基，四級銨鹽基，源自吡啶、嘧啶、吡等含氮雜環之基等鹼性官能基的高分子分散劑。 又，作為高分子分散劑，例如可列舉：胺基甲酸酯系分散劑、丙烯酸系分散劑、聚伸乙基亞胺系分散劑、聚烯丙胺系分散劑、包含具有胺基之單體與巨單體之分散劑、聚氧乙烯烷基醚系分散劑、聚氧乙烯二酯系分散劑、聚醚磷酸系分散劑、聚酯磷酸系分散劑、山梨醇酐脂肪族酯系分散劑、脂肪族改性聚酯系分散劑等。 作為此種分散劑之具體例，以商品名表示，可列舉：EFKA(註冊商標，BASF公司製造)、DISPERBYK(註冊商標，BYK-Chemie公司製造)、Disbaron(註冊商標，楠本化成公司製造)、SOLSPERSE(註冊商標，Lubrizol公司製造)、KP(信越化學工業公司製造)、Polyflow(共榮社化學公司製造)、Ajisper(註冊商標，味之素公司製造)等。 該等高分子分散劑可單獨使用1種，亦可將2種以上併用。 高分子分散劑之重量平均分子量(Mw)通常為700以上，較佳為1000以上，又，通常為100000以下，較佳為50000以下。例如作為上限與下限之組合，可較佳地列舉700～100000，可更佳地列舉1000～50000。 該等之中，就顏料之分散性之觀點而言，(f)分散劑較佳為包含具有官能基之胺基甲酸酯系高分子分散劑及/或丙烯酸系高分子分散劑，尤佳為包含丙烯酸系高分子分散劑。 又，就分散性、保存性之方面而言，較佳為具有鹼性官能基、且具有聚酯鍵及/或聚醚鍵之高分子分散劑。 作為胺基甲酸酯系及丙烯酸系高分子分散劑，例如可列舉：DISPERBYK 160～166、182系列(均為胺基甲酸酯系)，DISPERBYK 2000、2001、BYK-LPN21116等(均為丙烯酸系)(以上全部由BYK-Chemie公司製造)。 作為胺基甲酸酯系高分子分散劑，若具體地例示較佳之化學結構，則例如可列舉：藉由使聚異氰酸酯化合物、與分子內具有1個或2個羥基之數量平均分子量300～10000之化合物、及分子內具有活性氫與三級胺基之化合物進行反應而獲得之重量平均分子量1000～200000之分散樹脂等。藉由利用苄基氯等四級化劑對該等加以處理，可使全部或部分之三級胺基變為四級銨鹽基。 作為上述聚異氰酸酯化合物之例，可列舉：對苯二異氰酸酯、2,4-甲苯二異氰酸酯、2,6-甲苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、萘-1,5-二異氰酸酯、聯甲苯胺二異氰酸酯等芳香族二異氰酸酯，六亞甲基二異氰酸酯、離胺酸甲酯二異氰酸酯、2,4,4-三甲基六亞甲基二異氰酸酯、二聚酸二異氰酸酯等脂肪族二異氰酸酯，異佛爾酮二異氰酸酯、4,4'-亞甲基雙(異氰酸環己酯)、ω,ω'-二異氰酸基二甲基環己烷等脂環族二異氰酸酯，苯二甲基二異氰酸酯、α,α,α',α'-四甲基苯二甲基二異氰酸酯等具有芳香環之脂肪族二異氰酸酯，離胺酸酯三異氰酸酯、1,6,11-十一烷三異氰酸酯、1,8-二異氰酸基-4-異氰酸基甲基辛烷、1,3,6-六亞甲基三異氰酸酯、聯環庚烷三異氰酸酯、三(異氰酸基苯基甲烷)、硫代磷酸三(異氰酸基苯基)酯等三異氰酸酯，及該等之三聚物、水加成物、及該等之多元醇加成物等。作為聚異氰酸酯，較佳為有機二異氰酸酯之三聚物，最佳為甲苯二異氰酸酯之三聚物與異佛爾酮二異氰酸酯之三聚物。該等可單獨使用1種，亦可將2種以上併用。 作為異氰酸酯之三聚物之製造方法，可列舉如下方法：對於上述聚異氰酸酯類，使用適宜之三量化觸媒，例如三級胺類、膦類、烷氧化物類、金屬氧化物、羧酸鹽類等而引起異氰酸基之部分性之三聚作用，藉由添加觸媒毒而中止三聚作用後，藉由溶劑萃取、薄膜蒸餾而去除未反應之聚異氰酸酯，從而獲得目標之含異氰尿酸基之聚異氰酸酯。 作為分子內具有1個或2個羥基之數量平均分子量300～10000之化合物，可列舉：聚醚二醇、聚酯二醇、聚碳酸酯二醇、聚烯烴二醇等，及利用碳數1～25之烷基將該等化合物之一末端羥基進行烷氧基化而獲得者，及該等2種以上之混合物。 作為聚醚二醇，可列舉：聚醚二醇(diol)、聚醚酯二醇(diol)、及該等2種以上之混合物。作為聚醚二醇(diol)，可列舉使環氧烷進行均聚或共聚而獲得者，例如聚乙二醇、聚丙二醇、聚乙二醇丙二醇、聚氧四亞甲基二醇、聚氧六亞甲基二醇、聚氧八亞甲基二醇及該等2種以上之混合物。 作為聚醚酯二醇(diol)，可列舉藉由使含醚基之二醇(diol)或和其他二醇之混合物與二羧酸或該等之酐進行反應、或者使聚酯二醇與環氧烷進行反應而獲得者，例如聚(聚氧四亞甲基)己二酸酯等。作為聚醚二醇，最佳為聚乙二醇、聚丙二醇、聚氧四亞甲基二醇，或利用碳數1～25之烷基將該等化合物之一末端羥基進行烷氧基化而獲得之化合物。 作為聚酯二醇，可列舉使二羧酸(琥珀酸、戊二酸、己二酸、癸二酸、反丁烯二酸、順丁烯二酸、鄰苯二甲酸等)或該等之酐與二醇(乙二醇、二乙二醇、三乙二醇、丙二醇、二丙二醇、三丙二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、2,3-丁二醇、3-甲基-1,5-戊二醇(diol)、新戊二醇、2-甲基-1,3-丙二醇(diol)、2-甲基-2-丙基-1,3-丙二醇(diol)、2-丁基-2-乙基-1,3-丙二醇(diol)、1,5-戊二醇(diol)、1,6-己二醇(diol)、2-甲基-2,4-戊二醇(diol)、2,2,4-三甲基-1,3-戊二醇(diol)、2-乙基-1,3-己二醇(diol)、2,5-二甲基-2,5-己二醇(diol)、1,8-八亞甲基二醇、2-甲基-1,8-八亞甲基二醇、1,9-壬二醇(diol)等脂肪族二醇，雙羥基甲基環己烷等脂環族二醇，苯二甲醇、雙羥基乙氧基苯等芳香族二醇，N-甲基二乙醇胺等N-烷基二烷醇胺等)進行縮聚所獲得者，例如聚己二酸乙二酯、聚己二酸丁二酯、聚六亞甲基己二酸酯、聚己二酸乙二醇丙二醇酯等；或可列舉使用上述二醇(diol)類或碳數1～25之一元醇作為起始劑而獲得之聚內酯二醇(diol)或聚內酯單醇，例如聚己內酯二醇、聚甲基戊內酯及該等2種以上之混合物。作為聚酯二醇，最佳為聚己內酯二醇或以碳數1～25之醇作為起始劑而獲得之聚己內酯。 作為聚碳酸酯二醇，可列舉：聚(1,6-伸己基)碳酸酯、聚(3-甲基-1,5-伸戊基)碳酸酯等；作為聚烯烴二醇，可列舉：聚丁二烯二醇、氫化型聚丁二烯二醇、氫化型聚異戊二烯二醇等。 該等可單獨使用1種，亦可將2種以上併用。 同一分子內具有1個或2個羥基之化合物之數量平均分子量通常為300～10000，較佳為500～6000，更佳為1000～4000。 對本發明中使用之同一分子內具有活性氫與三級胺基之化合物進行說明。 作為活性氫，即，直接鍵結於氧原子、氮原子或硫原子上之氫原子，可列舉羥基、胺基、硫醇基等官能基中之氫原子，其中，較佳為胺基、尤其是一級胺基之氫原子。 三級胺基並無特別限定，例如可列舉具有碳數1～4之烷基之胺基，或可列舉雜環結構，更具體而言咪唑環或三唑環等。 若例示此種同一分子內具有活性氫與三級胺基之化合物，則可列舉：N,N-二甲基-1,3-丙二胺、N,N-二乙基-1,3-丙二胺、N,N-二丙基-1,3-丙二胺、N,N-二丁基-1,3-丙二胺、N,N-二甲基乙二胺、N,N-二乙基乙二胺、N,N-二丙基乙二胺、N,N-二丁基乙二胺、N,N-二甲基-1,4-丁二胺、N,N-二乙基-1,4-丁二胺、N,N-二丙基-1,4-丁二胺、N,N-二丁基-1,4-丁二胺等。 又，作為三級胺基為含氮雜環結構之情形時之該含氮雜環，可列舉：吡唑環、咪唑環、三唑環、四唑環、吲哚環、咔唑環、吲唑環、苯并咪唑環、苯并三唑環、苯并㗁唑環、苯并噻唑環、苯并噻二唑環等含氮雜5員環，吡啶環、嗒環、嘧啶環、三環、喹啉環、吖啶環、異喹啉環等含氮雜6員環。該等含氮雜環之中，較佳為咪唑環或三唑環。 若具體地例示該等具有咪唑環與胺基之化合物，則可列舉：1-(3-胺基丙基)咪唑、組胺酸、2-胺基咪唑、1-(2-胺基乙基)咪唑等。又，若具體地例示具有三唑環與胺基之化合物，則可列舉：3-胺基-1,2,4-三唑、5-(2-胺基-5-氯苯基)-3-苯基-1H-1,2,4-三唑、4-胺基-4H-1,2,4-三唑-3,5-二醇、3-胺基-5-苯基-1H-1,3,4-三唑、5-胺基-1,4-二苯基-1,2,3-三唑、3-胺基-1-苄基-1H-2,4-三唑等。其中，較佳為N,N-二甲基-1,3-丙二胺、N,N-二乙基-1,3-丙二胺、1-(3-胺基丙基)咪唑、3-胺基-1,2,4-三唑。 該等可單獨使用1種，亦可將2種以上併用。 關於製造胺基甲酸酯系高分子分散劑時之原料之較佳調配比率，相對於聚異氰酸酯化合物100質量份，同一分子內具有1個或2個羥基之數量平均分子量300～10000之化合物為10～200質量份，較佳為20～190質量份，更佳為30～180質量份；同一分子內具有活性氫與三級胺基之化合物為0.2～25質量份，較佳為0.3～24質量份。 關於胺基甲酸酯系高分子分散劑之製造，可依據聚胺基甲酸酯樹脂之公知之製造方法進行。作為製造時之溶劑，通常使用：丙酮、甲基乙基酮、甲基異丁基酮、環戊酮、環己酮、異佛爾酮等酮類，乙酸乙酯、乙酸丁酯、乙酸溶纖劑等酯類，苯、甲苯、二甲苯、己烷等烴類，二丙酮醇、異丙醇、第二丁醇、第三丁醇等部分醇類，二氯甲烷、氯仿等氯化物，四氫呋喃、二乙醚等醚類，二甲基甲醯胺、N-甲基吡咯啶酮、二甲基亞碸等非質子性極性溶劑等。該等可單獨使用1種，亦可將2種以上併用。 上述製造時，通常使用胺基甲酸酯化反應觸媒。作為該觸媒，例如可列舉：二月桂酸二丁基錫、二月桂酸二辛基錫、二辛酸二丁基錫、辛酸亞錫等錫系，乙醯丙酮酸鐵、氯化鐵等鐵系，三乙胺、三乙二胺等三級胺系等。該等可單獨使用1種，亦可將2種以上併用。 同一分子內具有活性氫與三級胺基之化合物之導入量較佳為控制為以反應後之胺值計為1～100 mgKOH/g之範圍。更佳為5～95 mgKOH/g之範圍。胺值係利用酸中和滴定鹼性胺基時與酸值對應之以KOH之mg數表示之值。藉由設為上述下限值以上，有分散能力變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制顯影性之降低之傾向。 再者，於以上反應時高分子分散劑中殘存異氰酸基之情形時，若進而利用醇或胺基化合物消除異氰酸基，則生成物之經時穩定性變高，因此較佳。 胺基甲酸酯系高分子分散劑之重量平均分子量(Mw)通常為1000～200000，較佳為2000～100000，更佳為3000～50000之範圍。藉由設為上述下限值以上，有分散性及分散穩定性變得良好之傾向，藉由設為上述上限值以下，有容易抑制溶解性或分散性之降低之傾向。 另一方面，作為丙烯酸系高分子分散劑，較佳為使用具有官能基(此處所謂官能基係上述作為高分子分散劑所含有之官能基而說明之官能基)之含不飽和基之單體與不具有官能基之含不飽和基之單體的無規共聚物、接枝共聚物、嵌段共聚物。該等共聚物可藉由公知方法而製造。 作為具有官能基之含不飽和基之單體，作為具體例，可列舉：(甲基)丙烯酸、琥珀酸2-(甲基)丙烯醯氧基乙酯、鄰苯二甲酸2-(甲基)丙烯醯氧基乙酯、六氫鄰苯二甲酸2-(甲基)丙烯醯氧基乙酯、丙烯酸二聚物等具有羧基之不飽和單體，(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸二乙基胺基乙酯及該等之四級化物等具有三級胺基、四級銨鹽基之不飽和單體。該等可單獨使用1種，亦可將2種以上併用。 作為不具有官能基之含不飽和基之單體，可列舉：(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸苯酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸苯氧基甲酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸異酯、三環癸烷(甲基)丙烯酸酯、(甲基)丙烯酸四氫糠酯、N-乙烯基吡咯啶酮、苯乙烯及其衍生物、α-甲基苯乙烯、N-環己基順丁烯二醯亞胺、N-苯基順丁烯二醯亞胺、N-苄基順丁烯二醯亞胺等N-取代順丁烯二醯亞胺、丙烯腈、乙酸乙烯酯及聚(甲基)丙烯酸甲酯巨單體、聚苯乙烯巨單體、聚(甲基)丙烯酸2-羥基乙酯巨單體、聚乙二醇巨單體、聚丙二醇巨單體、聚己內酯巨單體等巨單體等。該等可單獨使用1種，亦可將2種以上併用。 丙烯酸系高分子分散劑尤佳為包含具有官能基之A嵌段與不具有官能基之B嵌段的A-B或B-A-B嵌段共聚物，於該情形時，A嵌段中除含有源自上述包含官能基之含不飽和基之單體的部分結構以外，亦可含有源自上述不含官能基之含不飽和基之單體的部分結構，該等可以無規共聚或嵌段共聚之任意態樣含有於該A嵌段中。又，不含官能基之部分結構於A嵌段中之含有比率通常為80質量%以下，較佳為50質量%以下，更佳為30質量%以下。 B嵌段含有源自上述不含官能基之含不飽和基之單體的部分結構，1個B嵌段中可含有源自2種以上之單體之部分結構，該等可以無規共聚或嵌段共聚之任意態樣含有於該B嵌段中。 該A-B或B-A-B嵌段共聚物例如藉由以下所示之活性聚合法製備。 關於活性聚合法，有陰離子活性聚合法、陽離子活性聚合法、自由基活性聚合法，其中，陰離子活性聚合法之聚合活性種為陰離子，例如以下述流程表示。 [化34]上述流程中，Ar1 為1價有機基，Ar2 為與Ar1 不同之1價有機基，M為金屬原子，s及t分別為1以上之整數。 自由基活性聚合法之聚合活性種為自由基，例如以下述流程表示。 [化35]上述流程中，Ar1 為1價有機基，Ar2 為與Ar1 不同之1價有機基，j及k分別為1以上之整數，Ra 為氫原子或1價有機基，Rb 為與Ra 不同之氫原子或1價有機基。 於合成該丙烯酸系高分子分散劑時，可採用日本專利特開平9-62002號公報；或P. Lutz, P. Masson et al, Polym. Bull. 12, 79(1984)；B.C. Anderson, G.D. Andrews et al, Macromolecules, 14, 1601(1981)；K. Hatada, K.Ute, et al, Polym. J. 17, 977(1985)、18, 1037(1986)；右手浩一、畑田耕一，高分子加工，36, 366(1987)；東村敏延、澤本光男，高分子論文集，46, 189(1989)；M. Kuroki, T. Aida, J. Am. Chem. Sic, 109, 4737(1987)；相田卓三、井上祥平，有機合成化學，43, 300(1985)；D.Y. Sogoh, W.R. Hertler et al, Macromolecules, 20, 1473(1987)等中所記載之公知方法。 本發明中可使用之丙烯酸系高分子分散劑可為A-B嵌段共聚物，亦可為B-A-B嵌段共聚物，構成該共聚物之A嵌段/B嵌段比較佳為1/99～80/20，尤佳為5/95～60/40(質量比)，藉由設為該範圍內，有可確保分散性與保存穩定性之平衡性之傾向。 又，本發明中可使用之A-B嵌段共聚物、B-A-B嵌段共聚物1 g中之四級銨鹽基之量通常較佳為0.1～10 mmol，藉由設為該範圍內，有可確保良好之分散性之傾向。 再者，此種嵌段共聚物中通常存在含有製造過程中產生之胺基之情況，其胺值為1～100 mgKOH/g左右，就分散性之觀點而言，較佳為10 mgKOH/g以上，更佳為30 mgKOH/g以上，進而較佳為50 mgKOH/g以上，又，較佳為90 mgKOH/g以下，更佳為80 mgKOH/g以下，進而較佳為75 mgKOH/g以下。例如作為上限與下限之組合，可較佳地列舉10～90 mgKOH/g，可更佳地列舉30～80 mgKOH/g，可列舉50～75 mgKOH/g。 此處，該等嵌段共聚物等分散劑之胺值係由與分散劑試樣中之除溶劑以外之固形物成分每1 g之鹼量等量之KOH之質量表示，並藉由以下方法進行測定。作為上限與下限之組合，可較佳地列舉10～90 mgKOH/g，可更佳地列舉30～80 mgKOH/g，可進而較佳地列舉50～75 mgKOH/g。 精確稱量0.5～1.5 g分散劑試樣置於100 mL之燒杯內，利用50 mL之乙酸進行溶解。使用具備pH電極之自動滴定裝置，利用0.1 mol/L之HClO4 乙酸溶液對該溶液進行中和滴定。以滴定pH曲線之反曲點作為滴定終點，根據下式求出胺值。 胺值[mgKOH/g]＝(561×V)/(W×S) [其中，W表示分散劑試樣稱取量[g]，V表示滴定終點時之滴定量[mL]，S表示分散劑試樣之固形物成分濃度[質量%]] 又，該嵌段共聚物之胺值取決於有無作為該酸值來源之酸性基及種類，一般宜較低，通常為10 mgKOH/g以下，其重量平均分子量(Mw)較佳為1000～100000之範圍。藉由設為上述範圍內，有可確保良好之分散性之傾向。 於丙烯酸系高分子分散劑具有四級銨鹽基作為官能基之情形時，丙烯酸系高分子分散劑之具體結構並無特別限定，就分散性之觀點而言，較佳為具有下述式(i)所表示之重複單元(以下有時記為「重複單元(i)」)。 [化36]上述式(i)中，R31 ～R33 分別獨立地為氫原子、可具有取代基之烷基、可具有取代基之芳基、或可具有取代基之芳烷基，R31 ～R33 中之兩者以上亦可相互鍵結而形成環狀結構，R34 為氫原子或甲基，X為2價連結基，Y- 為抗衡陰離子。 上述式(i)之R31 ～R33 中之可具有取代基之烷基之碳數並無特別限定，通常為1以上，又，較佳為10以下，更佳為6以下。作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉1～6。 作為烷基之具體例，可列舉：甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基等，該等之中，較佳為甲基、乙基、丙基、丁基、戊基、或己基，更佳為甲基、乙基、丙基、或丁基。又，可為直鏈狀、支鏈狀之任意形狀。又，亦可包含環己基、環己基甲基等環狀結構。 上述式(i)之R31 ～R33 中之可具有取代基之芳基之碳數並無特別限定，通常為6以上，又，較佳為16以下，更佳為12以下。作為上限與下限之組合，可較佳地列舉6～16，可更佳地列舉6～12。 作為芳基之具體例，可列舉：苯基、甲基苯基、乙基苯基、二甲基苯基、二乙基苯基、萘基、蒽基等，該等之中，較佳為苯基、甲基苯基、乙基苯基、二甲基苯基、或二乙基苯基，更佳為苯基、甲基苯基、或乙基苯基。 上述式(i)之R31 ～R33 中之可具有取代基之芳烷基之碳數並無特別限定，通常為7以上，又，較佳為16以下，更佳為12以下。作為上限與下限之組合，可較佳地列舉7～16，可更佳地列舉7～12。 作為芳烷基之具體例，可列舉：苯基甲基(苄基)、苯基乙基(苯乙基)、苯基丙基、苯基丁基、苯基異丙基等，該等之中，較佳為苯基甲基、苯基乙基、苯基丙基、或苯基丁基，更佳為苯基甲基、或苯基乙基。 該等之中，就分散性之觀點而言，R31 ～R33 較佳為分別獨立為烷基或芳烷基，具體而言，較佳為R31 及R33 分別獨立為甲基或乙基，且R32 為苯基亞甲基或苯基伸乙基，進而較佳為R31 及R33 為甲基，且R32 為苯基亞甲基。 又，於丙烯酸系高分子分散劑具有三級胺作為官能基之情形時，就分散性之觀點而言，較佳為具有下述式(ii)所表示之重複單元(以下有時記為「重複單元(ii)」)。 [化37]上述式(ii)中，R35 及R36 分別獨立地為氫原子、可具有取代基之烷基、可具有取代基之芳基、或可具有取代基之芳烷基，R35 及R36 亦可相互鍵結而形成環狀結構，R37 為氫原子或甲基，Z為2價連結基。 又，作為上述式(ii)之R35 及R36 中之可具有取代基之烷基，可較佳地採用作為上述式(i)之R31 ～R33 所例示者。 同樣地，作為上述式(ii)之R35 及R36 中之可具有取代基之芳基，可較佳地採用作為上述式(i)之R31 ～R33 所例示者。又，作為上述式(ii)之R35 及R36 中之可具有取代基之芳烷基，可較佳地採用作為上述式(i)之R31 ～R33 所例示者。 該等之中，R35 及R36 較佳為分別獨立為可具有取代基之烷基，更佳為甲基或乙基。 作為上述式(i)之R31 ～R33 以及上述式(ii)之R35 及R36 中之烷基、芳烷基或芳基可具有之取代基，可列舉：鹵素原子、烷氧基、苯甲醯基、羥基等。 上述式(i)及(ii)中，作為2價連結基X及Z，例如可列舉：碳數1～10之伸烷基、碳數6～12之伸芳基、-CONH-R43 -基、-COOR44 -基[其中，R43 及R44 為單鍵、碳數1～10之伸烷基、或碳數2～10之醚基(烷基氧基烷基)]等，較佳為-COO-R44 -基。 又，上述式(i)中，作為抗衡陰離子之Y- ，可列舉：Cl- 、Br- 、I- 、ClO4 - 、BF4 - 、CH3 COO- 、PF6 - 等。 上述式(i)所表示之重複單元之含有比率並無特別限定，就分散性之觀點而言，相對於上述式(i)所表示之重複單元之含有比率與上述式(ii)所表示之重複單元之含有比率的合計，較佳為60莫耳%以下，更佳為50莫耳%以下，進而較佳為40莫耳%以下，尤佳為35莫耳%以下，又，較佳為5莫耳%以上，更佳為10莫耳%以上，進而較佳為20莫耳%以上，尤佳為30莫耳%以上。例如作為上限與下限之組合，可較佳地列舉5～60莫耳%，可更佳地列舉10～50莫耳%，可進而較佳地列舉20～40莫耳%，可尤佳地列舉30～40莫耳%。 又，上述式(i)所表示之重複單元於高分子分散劑之全部重複單元中所占之含有比率並無特別限定，就分散性之觀點而言，較佳為1莫耳%以上，更佳為5莫耳%以上，進而較佳為10莫耳%以上，又，較佳為50莫耳%以下，更佳為30莫耳%以下，進而較佳為20莫耳%以下，尤佳為15莫耳%以下。例如作為上限與下限之組合，可較佳地列舉1～50莫耳%，可更佳地列舉5～30莫耳%，可進而較佳地10～20莫耳%，可尤佳地列舉10～15莫耳%。 又，上述式(ii)所表示之重複單元於高分子分散劑之全部重複單元中所占之含有比率並無特別限定，就分散性之觀點而言，較佳為5莫耳%以上，更佳為10莫耳%以上，進而較佳為15莫耳%以上，尤佳為20莫耳%以上，又，較佳為60莫耳%以下，更佳為40莫耳%以下，進而較佳為30莫耳%以下，尤佳為25莫耳%以下。例如作為上限與下限之組合，可較佳地列舉5～60莫耳%，可更佳地列舉10～40莫耳%，可進而較佳地列舉15～30莫耳%，可尤佳地列舉20～25莫耳%。 又，就提高與溶劑等黏合劑成分之相溶性、提高分散穩定性之觀點而言，高分子分散劑較佳為具有下述式(iii)所表示之重複單元(以下有時記為「重複單元(iii)」)。 [化38]上述式(iii)中，R40 為伸乙基或伸丙基，R41 為可具有取代基之烷基，R42 為氫原子或甲基，n為1～20之整數。 上述式(iii)之R41 中之可具有取代基之烷基之碳數並無特別限定，通常為1以上，較佳為2以上，又，較佳為10以下，更佳為6以下。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～6。 作為烷基之具體例，可列舉：甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基等，該等之中，較佳為甲基、乙基、丙基、丁基、戊基、或己基，更佳為甲基、乙基、丙基、或丁基。又，可為直鏈狀、支鏈狀之任意形狀。又，亦可包含環己基、環己基甲基等環狀結構。 又，就與溶劑等黏合劑成分之相溶性及分散性之觀點而言，上述式(iii)中之n較佳為1以上，更佳為2以上，又，較佳為10以下，更佳為5以下。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～5。 又，上述式(iii)所表示之重複單元於高分子分散劑之全部重複單元中所占之含有比率並無特別限定，較佳為1莫耳%以上，更佳為2莫耳%以上，進而較佳為4莫耳%以上，又，較佳為30莫耳%以下，更佳為20莫耳%以下，進而較佳為10莫耳%以下。若為上述範圍內，則有能夠兼備與溶劑等黏合劑成分之相溶性及分散穩定性之傾向。例如作為上限與下限之組合，可較佳地列舉1～30莫耳%，可更佳地列舉2～20莫耳%，可進而較佳地列舉4～10莫耳%。 又，就提高分散劑與溶劑等黏合劑成分之相溶性、提高分散穩定性之觀點而言，高分子分散劑較佳為具有下述式(iv)所表示之重複單元(以下有時記為「重複單元(iv)」)。 [化39]上述式(iv)中，R38 為可具有取代基之烷基、可具有取代基之芳基、或可具有取代基之芳烷基，R39 為氫原子或甲基。 上述式(iv)之R38 中之可具有取代基之烷基之碳數並無特別限定，通常為1以上，較佳為2以上，更佳為4以上，又，較佳為10以下，更佳為8以下。例如作為上限與下限之組合，可較佳地列舉1～10，可更佳地列舉2～8，可進而較佳地列舉4～8。 作為烷基之具體例，可列舉：甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基等，該等之中，較佳為甲基、乙基、丙基、丁基、戊基、或己基，更佳為甲基、乙基、丙基、或丁基。又，可為直鏈狀、支鏈狀之任意形狀。又，亦可包含環己基、環己基甲基等環狀結構。 上述式(iv)之R38 中之可具有取代基之芳基之碳數並無特別限定，通常為6以上，又，較佳為16以下，更佳為12以下，進而較佳為8以下。作為上限與下限之組合，可較佳地列舉6～16，可更佳地列舉6～12，可進而較佳地列舉6～8。 作為芳基之具體例，可列舉：苯基、甲基苯基、乙基苯基、二甲基苯基、二乙基苯基、萘基、蒽基等，該等之中，較佳為苯基、甲基苯基、乙基苯基、二甲基苯基、或二乙基苯基，更佳為苯基、甲基苯基、或乙基苯基。 上述式(iv)之R38 中之可具有取代基之芳烷基之碳數並無特別限定，通常為7以上，又，較佳為16以下，更佳為12以下，進而較佳為10以下。作為上限與下限之組合，可較佳地列舉7～16，可更佳地列舉7～12，可進而較佳地列舉7～10。 作為芳烷基之具體例，可列舉：苯基甲基、苯基乙基、苯基丙基、苯基丁基、苯基異丙基等，該等之中，較佳為苯基甲基、苯基乙基、苯基丙基、或苯基丁基，更佳為苯基甲基、或苯基乙基。 該等之中，就溶劑相溶性與分散穩定性之觀點而言，R38 較佳為烷基、或芳烷基，更佳為甲基、乙基、或苯基甲基。 作為R38 中之烷基可具有之取代基，可列舉：鹵素原子、烷氧基等。又，作為芳基或芳烷基可具有之取代基，可列舉：鏈狀烷基、鹵素原子、烷氧基等。又，R38 所表示鏈狀烷基包含直鏈狀及支鏈狀之任意者。 又，上述式(iv)所表示之重複單元於高分子分散劑之全部重複單元中所占之含有比率就分散性之觀點而言，較佳為30莫耳%以上，更佳為40莫耳%以上，進而較佳為50莫耳%以上，又，較佳為80莫耳%以下，更佳為70莫耳%以下。例如作為上限與下限之組合，可較佳地列舉30～80莫耳%，可更佳地列舉40～80莫耳%，可進而較佳地列舉50～70莫耳%。 高分子分散劑亦可具有重複單元(i)、重複單元(ii)、重複單元(iii)及重複單元(iv)以外之重複單元。作為此種重複單元之例，可列舉源自苯乙烯、α-甲基苯乙烯等苯乙烯系單體，(甲基)丙烯醯氯等(甲基)丙烯酸鹽系單體，(甲基)丙烯醯胺、N-羥甲基丙烯醯胺等(甲基)丙烯醯胺系單體，乙酸乙烯酯，丙烯腈，烯丙基縮水甘油醚、丁烯酸縮水甘油醚，N-甲基丙烯醯基口末啉等單體之重複單元。 高分子分散劑就進一步提高分散性之觀點而言，較佳為包含具有重複單元(i)及重複單元(ii)之A嵌段、與不具有重複單元(i)及重複單元(ii)之B嵌段的嵌段共聚物。該嵌段共聚物較佳為A-B嵌段共聚物或B-A-B嵌段共聚物。意外發現藉由對A嵌段導入四級銨鹽基並導入三級胺基而有分散劑之分散能力顯著提高之傾向。又，B嵌段較佳為具有重複單元(iii)，更佳為進而具有重複單元(iv)。 重複單元(i)及重複單元(ii)可以無規共聚或嵌段共聚之任意態樣含有於A嵌段中。又，1個A嵌段中可含有各為2種以上之重複單元(i)及重複單元(ii)，於該情形時，各重複單元可以無規共聚或嵌段共聚之任意態樣含有於該A嵌段中。 又，A嵌段中可含有重複單元(i)及重複單元(ii)以外之重複單元，作為此種重複單元之例，可列舉源自上述(甲基)丙烯酸酯系單體之重複單元等。重複單元(i)及重複單元(ii)以外之重複單元於A嵌段中之含量較佳為0～50莫耳%，更佳為0～20莫耳%，最佳為A嵌段中不含該重複單元。 B嵌段中可含有重複單元(iii)及(iv)以外之重複單元，作為此種重複單元之例，可列舉源自苯乙烯、α-甲基苯乙烯等苯乙烯系單體，(甲基)丙烯醯氯等(甲基)丙烯酸鹽系單體，(甲基)丙烯醯胺、N-羥甲基丙烯醯胺等(甲基)丙烯醯胺系單體，乙酸乙烯酯，丙烯腈，烯丙基縮水甘油醚、丁烯酸縮水甘油醚，N-甲基丙烯醯基口末啉等單體之重複單元。重複單元(iii)及重複單元(iv)以外之重複單元於B嵌段中之含有比率較佳為0～50莫耳%，更佳為0～20莫耳%，最佳為B嵌段中不含該重複單元。 又，就分散穩定性提高之方面而言，(f)分散劑較佳為與下述顏料衍生物併用。 ＜感光性著色組合物之其他調配成分＞ 本發明之感光性著色組合物中除上述成分以外，亦可適當調配矽烷偶合劑等密接提高劑、界面活性劑(塗佈性提高劑)、顏料衍生物、光酸產生劑、交聯劑、巰基化合物、聚合抑制劑、顯影改良劑、紫外線吸收劑、抗氧化劑等添加劑。 (1)密接提高劑 本發明之感光性著色組合物亦可含有密接提高劑，以改善與基板之密接性。作為密接提高劑，較佳為矽烷偶合劑、含磷酸基之化合物等。 作為矽烷偶合劑之種類，可單獨使用環氧系、(甲基)丙烯酸系、胺基系等各者中之1種，亦可將2種以上混合使用。 作為較佳之矽烷偶合劑，例如可列舉：3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷等(甲基)丙烯醯氧基矽烷類，2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷等環氧矽烷類，3-脲基丙基三乙氧基矽烷等脲基矽烷類，3-異氰酸基丙基三乙氧基矽烷等異氰酸基矽烷類；尤佳為環氧矽烷類之矽烷偶合劑。 作為含磷酸基之化合物，較佳為含(甲基)丙烯醯基之磷酸酯類，較佳為下述通式(g1)、(g2)或(g3)所表示者。 [化40]上述通式(g1)、(g2)及(g3)中，R51 表示氫原子或甲基，l及l'為1～10之整數，m為1、2或3。 該等含磷酸基之化合物可單獨使用1種，亦可將2種以上併用。 (2)界面活性劑 本發明之感光性著色組合物亦可含有界面活性劑，以提高塗佈性。 作為界面活性劑，例如可使用陰離子系、陽離子系、非離子系、兩性界面活性劑等各種界面活性劑。其中，就對各特性產生不良影響之可能性較低之方面而言，較佳為使用非離子系界面活性劑，其中，氟系或矽系之界面活性劑於塗佈性方面有效。 作為此種界面活性劑，例如可列舉：TSF4460(Momentive Performance Materials公司製造)，DFX-18(NEOS公司製造)，BYK-300、BYK-325、BYK-330(BYK-Chemie公司製造)，KP340(Shin-Etsu Silicone公司製造)，F-470、F-475、F-478、F-559(DIC公司製造)，SH7PA(Dow Corning Toray公司製造)，DS-401(Daikin公司製造)，L-77(Nippon Unicar公司製造)，FC4430(3M公司製造)等。 再者，界面活性劑可使用1種，亦可以任意之組合及比率將2種以上併用。 (3)顏料衍生物 本發明之感光性著色組合物亦可含有顏料衍生物作為分散助劑，以提高分散性、保存性。 作為顏料衍生物，可列舉：偶氮系、酞菁系、喹吖啶酮系、苯并咪唑酮系、喹酞酮系、異吲哚啉酮系、二㗁 系、蒽醌系、陰丹士林系、苝系、哌瑞酮系、吡咯并吡咯二酮系、二㗁 系等之衍生物，其中，較佳為酞菁系、喹酞酮系。 作為顏料衍生物之取代基，可列舉：磺酸基、磺醯胺基及其四級鹽、鄰苯二甲醯亞胺甲基、二烷基胺基烷基、羥基、羧基、醯胺基等直接或經由烷基、芳基、雜環基等鍵結於顏料骨架者，較佳為磺酸基。又，一個顏料骨架可經複數個該等取代基取代。 作為顏料衍生物之具體例，可列舉：酞菁之磺酸衍生物、喹酞酮之磺酸衍生物、蒽醌之磺酸衍生物、喹吖啶酮之磺酸衍生物、吡咯并吡咯二酮之磺酸衍生物、二㗁 之磺酸衍生物等。該等可單獨使用1種，亦可將2種以上併用。 (4)光酸產生劑 所謂光酸產生劑係可藉由紫外線而產生酸之化合物，藉由進行曝光時產生之酸之作用，並藉由存在例如三聚氰胺化合物等交聯劑，而進行交聯反應。該光酸產生劑之中，較佳為於溶劑中之溶解性、尤其是於感光性著色組合物所使用之溶劑中之溶解性較大者，例如可列舉：二苯基錪、二甲苯基錪、苯基(對大茴香基)錪、雙(間硝基苯基)錪、雙(對第三丁基苯基)錪、雙(對氯苯基)錪、雙(正十二烷基)錪、對異丁基苯基(對甲苯基)錪、對異丙基苯基(對甲苯基)錪等二芳基錪、或三苯基鋶等三芳基鋶之氯化物、溴化物、或氟硼化鹽、六氟磷酸鹽、六氟砷酸鹽、芳香族磺酸鹽、四(五氟苯基)硼酸鹽等、或二苯基苯甲醯甲基鋶(正丁基)三苯基硼酸鹽等鋶有機硼錯合物類、或2-甲基-4,6-雙三氯甲基三、2-(4-甲氧基苯基)-4,6-雙三氯甲基三等三化合物等，但並不限定於此。 (5)交聯劑 本發明之感光性著色組合物中可進而添加交聯劑，例如可使用三聚氰胺或胍胺系之化合物。作為該等交聯劑，例如可列舉下述通式(6)所表示之三聚氰胺或胍胺系之化合物。 [化41]式(6)中，R61 表示-NR66 R67 基或碳數6～12之芳基，於R61 為-NR66 R67 基之情形時，R62 、R63 、R64 、R65 、R66 及R67 中之一者表示-CH2 OR68 基，於R61 為碳數6～12之芳基之情形時，R62 、R63 、R64 及R65 中之一者表示-CH2 OR68 基，R62 、R63 、R64 、R65 、R66 及R67 中之其餘者相互獨立地表示氫或-CH2 OR68 基，R68 表示氫原子或碳數1～4之烷基。 此處，碳數6～12之芳基典型而言為苯基、1-萘基或2-萘基，該等苯基或萘基上可鍵結有烷基、烷氧基、鹵素原子等取代基。烷基及烷氧基之碳數分別可為1～6左右。R68 所表示之烷基較佳為上述中之甲基或乙基，尤其是甲基。 相當於通式(6)之三聚氰胺系化合物，即，下述通式(6-1)之化合物包含六羥甲基三聚氰胺、五羥甲基三聚氰胺、四羥甲基三聚氰胺、六甲氧基甲基三聚氰胺、五甲氧基甲基三聚氰胺、四甲氧基甲基三聚氰胺、六乙氧基甲基三聚氰胺等。 [化42]式(6-1)中，於R62 、R63 、R64 、R65 、R66 及R67 中之一者為芳基之情形時，R62 、R63 、R64 及R65 中之一者表示-CH2 OR68 基，R62 、R63 、R64 、R65 、R66 及R67 中之其餘者相互獨立地表示氫原子或-CH2 OR68 基，R68 表示氫原子或烷基。 又，相當於通式(6)之胍胺系化合物，即，通式(6)中之R61 為芳基之化合物包含四羥甲基苯并胍胺、四甲氧基甲基苯并胍胺、三甲氧基甲基苯并胍胺、四乙氧基甲基苯并胍胺等。 進而，亦可使用具有羥甲基或羥甲基烷基醚基之交聯劑。以下列舉其例。 2,6-雙(羥基甲基)-4-甲基苯酚、4-第三丁基-2,6-雙(羥基甲基)苯酚、5-乙基-1,3-雙(羥基甲基)全氫-1,3,5-三-2-酮(通稱N-乙基二羥甲基三酮)或其二甲醚體、二羥甲基三亞甲基脲或其二甲醚體、3,5-雙(羥基甲基)全氫-1,3,5-㗁二-4-酮(通稱二羥甲基脲)或其二甲醚體、四羥甲基乙二醛二烷基脲或其四甲醚體。 再者，該等交聯劑可單獨使用1種，亦可將2種以上併用。關於使用交聯劑時之量，於感光性著色組合物之全部固形物成分中，較佳為0.1～15質量%，尤佳為0.5～10質量%。 (6)巰基化合物 又，為了提高對基板之密接性，亦可添加巰基化合物作為聚合促進劑。 作為巰基化合物之種類，可列舉：2-巰基苯并噻唑、2-巰基苯并㗁唑、2-巰基苯并咪唑、己二硫醇、癸二硫醇、1,4-二甲基巰基苯、丁二醇雙硫代丙酸酯、丁二醇雙硫代乙醇酸酯、乙二醇雙硫代乙醇酸酯、三羥甲基丙烷三硫代乙醇酸酯、丁二醇雙硫代丙酸酯、三羥甲基丙烷三硫代丙酸酯、三羥甲基丙烷三硫代乙醇酸酯、季戊四醇四硫代丙酸酯、季戊四醇四硫代乙醇酸酯、三羥基乙基三硫代丙酸酯、乙二醇雙(3-巰基丁酸酯)、丁二醇雙(3-巰基丁酸酯)、1,4-雙(3-巰基丁醯氧基)丁烷、三羥甲基丙烷三(3-巰基丁酸酯)、季戊四醇四(3-巰基丁酸酯)、季戊四醇三(3-巰基丁酸酯)、乙二醇雙(3-巰基異丁酸酯)、丁二醇雙(3-巰基異丁酸酯)、三羥甲基丙烷三(3-巰基異丁酸酯)、1,3,5-三(3-巰基丁氧基乙基)-1,3,5-三-2,4,6(1H,3H,5H)-三酮等具有雜環之巰基化合物或脂肪族多官能巰基化合物等。該等各者可單獨使用1種，亦可將2種以上混合使用。 (7)聚合抑制劑 就形狀控制之觀點而言，本發明之感光性著色組合物亦可含有聚合抑制劑。認為藉由含有聚合抑制劑，其對塗佈膜下層之自由基聚合加以抑制，因此可控制錐角(硬化物剖面中之支持體與硬化物所成之角度)。 作為聚合抑制劑，可列舉：對苯二酚、對苯二酚單甲醚、甲基對苯二酚、甲氧基苯酚、2,6-二第三丁基-4-甲酚(BHT)等。該等之中，就形狀控制之觀點而言，較佳為2,6-二第三丁基-4-甲酚。又，就對人體之安全性之觀點而言，較佳為對苯二酚單甲醚、甲基對苯二酚。 聚合抑制劑較佳為含有1種或2種以上。存在於製造(b)鹼可溶性樹脂時該樹脂中包含聚合抑制劑之情況，可將其用作本發明之聚合抑制劑，亦可於製造感光性著色組合物時，除樹脂中之聚合抑制劑以外，另外再添加與其相同或不同之聚合抑制劑。 於感光性著色組合物包含聚合抑制劑之情形時，其含有比率並無特別限定，於感光性著色組合物之全部固形物成分中，通常為0.0005質量%以上，較佳為0.001質量%以上，更佳為0.01質量%以上，又，通常為0.3質量%以下，較佳為0.2質量%以下，更佳為0.1質量%以下。藉由設為上述下限值以上，有可進行形狀控制之傾向，又，藉由設為上述上限值以下，有可維持必要之感度之傾向。例如作為上限與下限之組合，可較佳地列舉0.0005～0.3質量%，可更佳地列舉0.001～0.2質量%，可進而較佳地列舉0.01～0.1質量%。 ＜感光性著色組合物中之各成分之含有比率＞ 本發明之感光性著色組合物中，(a)著色劑之含有比率並無特別限定，於感光性著色組合物中之全部固形物成分中，通常為10質量%以上，更佳為20質量%以上，進而較佳為25質量%以上，進而更佳為30質量%以上，尤佳為32質量%以上，最佳為35質量%以上，又，較佳為60質量%以下，更佳為50質量%以下，進而較佳為45質量%以下，進而更佳為40質量%以下，尤佳為38質量%以下，最佳為35質量%以下。藉由將(a)著色劑之含有比率設為上述下限值以上，有可獲得充分之遮光性之傾向，又，藉由設為上述上限值以下，有容易獲得充分之製版特性、且電性可靠性優異之傾向。例如作為上限與下限之組合，可較佳地列舉10～60質量%，可更佳地列舉20～50質量%，可進而較佳地列舉25～45質量%，可進而較佳地列舉30～40質量%，可進而更佳地列舉32～38質量%，可尤佳地列舉35～38質量%。 (a1)有機黑色顏料之含有比率並無特別限定，於感光性著色組合物之全部固形物成分中，較佳為5質量%以上，更佳為10質量%以上，進而較佳為15質量%以上，又，較佳為40質量%以下，更佳為30質量%以下，進而較佳為25質量%以下，尤佳為20質量%以下。藉由設為上述下限值以上，有可獲得充分之遮光性之傾向，藉由設為上述上限值以下，有電性可靠性變高之傾向。例如作為上限與下限之組合，可較佳地列舉5～40質量%，可更佳地列舉5～30質量%，可進而較佳地列舉10～25質量%，可尤佳地列舉15～20質量%。 (a2)C.I.顏料藍60之含有比率並無特別限定，於感光性著色組合物之全部固形物成分中，較佳為2質量%以上，更佳為3質量%以上，進而較佳為4質量%以上，進而更佳為6質量%以上，尤佳為8質量%以上，最佳為10質量%以上。又，較佳為15質量%以下，更佳為12質量%以下，進而較佳為10質量%以下，進而更佳為9質量%以下，尤佳為8質量%以下。藉由設為上述下限值以上，有於700 nm附近之透過率下降之傾向，藉由設為上述上限值以下，有電性可靠性變高，且容易獲得充分之製版特性之傾向。例如作為上限與下限之組合，可較佳地列舉2～15質量%，可更佳地列舉3～15質量%，可進而較佳地列舉4～12質量%，可尤佳地列舉6～12質量%。 (a3)碳黑之含有比率之含有比率並無特別限定，於感光性著色組合物之全部固形物成分中，較佳為1質量%以上，更佳為2質量%以上，進而較佳為3質量%以上，尤佳為4質量%以上，又，較佳為10質量%以下，更佳為9質量%以下，進而較佳為8質量%以下，進而更佳為7質量%以下，尤佳為5質量%以下。藉由設為上述下限值以上，有可獲得充分之遮光性之傾向，藉由設為上述上限值以下，有於近紅外區域之透過率變高之傾向。例如作為上限與下限之組合，可較佳地列舉1～10質量%，可更佳地列舉2～9質量%，可進而較佳地列舉3～8質量%，可進而更佳地列舉4～7質量%，可尤佳地列舉4～5質量%。 於感光性著色組合物含有紫色顏料作為其他著色劑之情形時，其含有比率並無特別限定，於感光性著色組合物之全部固形物成分中，較佳為1質量%以上，更佳為2質量%以上，進而較佳為3質量%以上，進而更佳為4質量%以上，尤佳為6質量%以上，最佳為7質量%以上，又，較佳為15質量%以下，更佳為12質量%以下，進而較佳為10質量%以下，尤佳為8質量%以下。藉由設為上述下限值以上，有可獲得充分之遮光性之傾向，又，藉由設為上述上限值以下，有電性可靠性變高之傾向。例如作為上限與下限之組合，可較佳地列舉1～15質量%，可更佳地列舉2～12質量%，可進而較佳地列舉3～10質量%，可進而更佳地列舉4～8質量%，可尤佳地列舉6～8質量%，可最佳地列舉7～8質量%。 又，(a1)有機黑色顏料相對於感光性著色組合物所含之全部著色劑即(a)著色劑的含有比率並無特別限定，較佳為20質量%以上，更佳為30質量%以上，進而較佳為40質量%以上，進而更佳為50質量%以上，尤佳為60質量%以上，又，較佳為80質量%以下，更佳為75質量%以下，進而較佳為70質量%以下，尤佳為65質量%以下。藉由設為上述下限值以上，有可獲得充分之遮光性之傾向，藉由設為上述上限值以下，有電性可靠性變高之傾向。例如作為上限與下限之組合，可較佳地列舉20～80質量%，可更佳地列舉30～80質量%，可更佳地列舉40～75質量%，可進而較佳地列舉50～70質量%。 又，(a2)C.I.顏料藍60相對於感光性著色組合物所含之全部著色劑即(a)著色劑的含有比率並無特別限定，較佳為10質量%以上，更佳為12質量%以上，進而較佳為15質量%以上，進而更佳為18質量%以上，尤其進而較佳為20質量%以上，尤其進而更佳為24質量%以上，尤佳為28質量%以上，又，較佳為50質量%以下，更佳為40質量%以下，進而較佳為35質量%以下，尤佳為30質量%以下。藉由設為上述下限值以上，有於700 nm附近之透過率下降之傾向，藉由設為上述上限值以下，有電性可靠性變高，且容易獲得充分之製版特性之傾向。例如作為上限與下限之組合，可較佳地列舉10～50質量%，可更佳地列舉10～40質量%，可進而較佳地列舉18～40質量%，可進而更佳地列舉24～35質量%，可尤佳地列舉28～35質量%。 又，(a3)碳黑相對於感光性著色組合物所含之全部著色劑即(a)著色劑的含有比率並無特別限定，較佳為10質量%以上，更佳為12質量%以上，進而較佳為15質量%以上，進而更佳為18質量%以上，尤佳為20質量%以上，又，較佳為35質量%以下，更佳為30質量%以下，進而較佳為25質量%以下，尤佳為20質量%以下。藉由設為上述下限值以上，有可獲得充分之遮光性之傾向，藉由設為上述上限值以下，有於近紅外區域之透過率變高之傾向。例如作為上限與下限之組合，可較佳地列舉10～35質量%，可更佳地列舉12～30質量%，可進而較佳地列舉15～25質量%，可尤佳地列舉18～20質量%。 另一方面，為了兼備於近紅外區域之透過率與電性可靠性，較佳為將(a1)有機黑色顏料與(a3)碳黑於黑色顏料中所占之含有比率調整為合適之值。碳黑於可見光區域具有較高之吸光度，因此有如下傾向：可有效降低於波長700 nm附近之透過率，進而亦可減少為了獲得特定遮光性所需之著色劑含有比率，電性可靠性變高。另一方面，碳黑於近紅外區域亦具有吸收，因此認為，藉由同時含有特定量之(a3)碳黑與(a1)有機黑色顏料，不僅可確保於波長900 nm附近之透過率，且可確保充分之遮光性。 (a1)有機黑色顏料相對於(a3)碳黑100質量份之含有比率通常為150質量份以上，較佳為180質量份以上，更佳為200質量份以上，進而較佳為210質量份以上，進而較佳為220質量份以上，進而更佳為250質量份以上，尤其進而較佳為300質量份以上，尤其進而更佳為350質量份以上，尤其進而更佳為400質量份以上，尤佳為450質量份以上，最佳為480質量份以上。又，較佳為1000質量份以下，更佳為800質量份以下，進而較佳為600質量份以下，尤佳為500質量份以下。藉由設為上述下限值以上，有於近紅外區域之透過率變高之傾向，藉由設為上述上限值以下，有電性可靠性變高之傾向。例如作為上限與下限之組合，可較佳地列舉150～1000質量份，可更佳地列舉180～800質量份，可進而較佳地列舉200～800質量份，可進而較佳地列舉210～600質量份，可進而更佳地列舉220～600質量份，可尤其進而較佳地列舉250～600質量份，可尤其進而更佳地列舉300～600質量份，可尤其進而更佳地列舉350～600質量份，可尤其進而更佳地列舉400～600質量份，可尤佳地列舉450～500質量份，可最佳地列舉480～500質量份。 又，就兼備遮光性與於波長900 nm附近之透過率之觀點而言，較佳為將全部有機顏料相對於(a3)碳黑之含有比率調整為合適之值。 全部有機顏料相對於(a3)碳黑100質量份之含有比率通常為300質量份以上，較佳為400質量份以上，更佳為500質量份以上，進而較佳為550質量份以上，進而更佳為600質量份以上，尤佳為620質量份以上，最佳為650質量份以上，又，較佳為900質量份以下，更佳為800質量份以下。藉由設為上述下限值以上，有於波長900 nm附近之透過率變高之傾向，又，藉由設為上述上限值以下，有可獲得充分之遮光性，且可抑制波長700 nm附近之漏光之傾向。例如作為上限與下限之組合，可較佳地列舉300～900質量份，可更佳地列舉400～900質量份，可進而較佳地列舉500～900質量份，可進而較佳地列舉550～800質量份，可進而更佳地列舉600～800質量份，可尤佳地列舉620～800質量份，可最佳地列舉650～800質量份。 又，就抑制波長700 nm附近之漏光之觀點而言，較佳為將(a2)C.I.顏料藍60相對於(a3)碳黑之含有比率調整為合適之值。 (a2)C.I.顏料藍60相對於(a3)碳黑100質量份之含有比率較佳為50質量份以上，更佳為100質量份以上，進而較佳為150質量份以上，進而更佳為180質量份以上，尤其進而較佳為200質量份以上，尤其進而更佳為210質量份以上，尤佳為220質量份以上，最佳為240質量份以上，又，較佳為400質量份以下，更佳為300質量份以下。藉由設為上述下限值以上，有可抑制波長700 nm附近之漏光之傾向，又，藉由設為上述上限值以下，有波長900 nm附近之透過率變高之傾向。例如作為上限與下限之組合，可較佳地列舉50～400質量份，可更佳地列舉100～400質量份，可進而較佳地列舉150～400質量份，可進而更佳地列舉200～300質量份，可尤佳地列舉220～300質量份，可最佳地列舉240～300質量份。 於感光性著色組合物含有紫色顏料作為其他著色劑之情形時，就遮光性之觀點而言，較佳為將紫色顏料相對於(a1)有機黑色顏料之含有比率調整為合適之值。 紫色顏料相對於(a1)有機黑色顏料100質量份之含有比率較佳為10質量份以上，更佳為20質量份以上，進而較佳為40質量份以上，進而更佳為55質量份以上，尤其進而較佳為60質量份以上，尤佳為65質量份以上，最佳為70質量份以上，又，較佳為100質量份以下，更佳為90質量份以下，進而較佳為80質量份以下，進而更佳為70質量份以下，尤佳為65質量份以下。藉由設為上述下限值以上，有可確保充分之遮光性，且可靠性提高之傾向，又，藉由設為上述上限值以下，有可抑制波長700 nm附近之漏光之傾向。例如作為上限與下限之組合，可較佳地列舉10～100質量份，可更佳地列舉20～100質量份，可進而較佳地列舉40～100質量份，可進而較佳地列舉55～100質量份，可進而更佳地列舉60～100質量份，可尤佳地列舉65～90質量份，可最佳地列舉70～90質量份。 (b)鹼可溶性樹脂之含有比率並無特別限定，於本發明之感光性著色組合物之全部固形物成分中，通常為5質量%以上，較佳為10質量%以上，更佳為20質量%以上，進而較佳為30質量%以上，尤佳為35質量%以上，又，通常為85質量%以下，較佳為80質量%以下，更佳為70質量%以下，進而較佳為60質量%以下，進而更佳為50質量%以下，尤佳為45質量%以下。藉由將(b)鹼可溶性樹脂之含有比率設為上述下限值以上，有可抑制未曝光部分於顯影液中之溶解性之降低，可抑制顯影不良之傾向。又，藉由設為上述上限值以下，有維持適度之感度，可抑制曝光部於顯影液中發生溶解，且可抑制像素之鮮明性或密接性之降低之傾向。例如作為上限與下限之組合，例如可較佳地列舉10～85質量%，可更佳地列舉20～80質量%，可進而較佳地列舉30～70質量%，可進而較佳地列舉35～60質量%，可進而更佳地列舉40～60質量%，可尤佳地列舉40～50質量%。 (b1)環氧(甲基)丙烯酸酯系樹脂之含有比率並無特別限定，於本發明之感光性著色組合物之全部固形物成分中，通常為5質量%以上，較佳為10質量%以上，更佳為15質量%以上，進而較佳為20質量%以上，尤佳為25質量%以上，又，通常為45質量%以下，較佳為40質量%以下，更佳為35質量%以下。藉由設為上述下限值以上，有可確保未曝光部分於顯影液中之溶解性之傾向，又，藉由設為上述上限值以下，有維持適度之感度，可抑制曝光部於顯影液中發生溶解，且可抑制像素之鮮明性或密接性之降低之傾向。例如作為上限與下限之組合，可較佳地列舉5～45質量%，可更佳地列舉10～40質量%，可進而較佳地列舉15～40質量%，可進而更佳地列舉20～35質量%，可尤佳地列舉25～35質量%。 (b)鹼可溶性樹脂中所含之(b1)環氧(甲基)丙烯酸酯系樹脂之含有比率並無特別限定，通常為20質量%以上，較佳為30質量%以上，更佳為40質量%以上，又，通常為90質量%以下，較佳為85質量%以下，更佳為80質量%以下。藉由設為上述下限值以上，有可確保未曝光部分於顯影液中之溶解性之傾向，又，藉由設為上述上限值以下，有維持適度之感度，可抑制曝光部於顯影液中發生溶解，且可抑制像素之鮮明性或密接性之降低之傾向。例如作為上限與下限之組合，可較佳地列舉20～90質量%，可更佳地列舉30～85質量%，可進而較佳地列舉40～80質量%。 (c)光聚合起始劑之含有比率並無特別限定，於本發明之感光性著色組合物之全部固形物成分中，通常為0.1質量%以上，較佳為0.5質量%以上，更佳為1質量%以上，進而較佳為2質量%以上，進而更佳為3質量%以上，尤佳為4質量%以上，又，通常為15質量%以下，較佳為10質量%以下，更佳為8質量%以下，進而較佳為7質量%以下。藉由將(c)光聚合起始劑之含有比率設為上述下限值以上，有可抑制感度降低之傾向，藉由設為上述上限值以下，有可抑制未曝光部分於顯影液中之溶解性之降低，可抑制顯影不良之傾向。例如作為上限與下限之組合，可較佳地列舉0.1～15質量%，可更佳地列舉0.5～10質量%，可進而較佳地列舉1～8質量%，可進而更佳地列舉2～8質量%，可尤佳地列舉3～8質量%，可最佳地列舉4～7質量%。 於與(c)光聚合起始劑一起使用聚合促進劑之情形時，聚合促進劑之含有比率並無特別限定，於本發明之感光性著色組合物之全部固形物成分中，較佳為0.05質量%以上，又，通常為10質量%以下，較佳為5質量%以下，聚合促進劑較佳為以相對於(c)光聚合起始劑100質量份而通常為0.1～50質量份、尤其是0.1～20質量份之比率使用。藉由將聚合促進劑之含有比率設為上述下限值以上，有可抑制對曝光光線之感度之降低之傾向，藉由設為上述上限值以下，有可抑制未曝光部分於顯影液中之溶解性之降低，可抑制顯影不良之傾向。 又，於與(c)光聚合起始劑一起使用增感色素之情形時，增感色素之含有比率並無特別限定，就感度之觀點而言，於感光性著色組合物中之全部固形物成分中，通常為20質量%以下，較佳為15質量%以下，更佳為10質量%以下。 (d)乙烯性不飽和化合物之含有比率並無特別限定，於本發明之感光性著色組合物之全部固形物成分中，通常為1質量%以上，較佳為5質量%以上，更佳為10質量%以上，又，通常為30質量%以下，較佳為20質量%以下，更佳為15質量%以下。藉由設為上述下限值以上，有維持適度之感度，可抑制曝光部於顯影液中發生溶解，且可抑制像素之鮮明性或密接性之降低之傾向，又，藉由設為上述上限值以下，有抑制顯影液向曝光部之浸透性變高，容易獲得良好之圖像之傾向。例如作為上限與下限之組合，可較佳地列舉1～30質量%，可更佳地列舉5～20質量%，可進而較佳地列舉10～15質量%。 再者，本發明之感光性著色組合物藉由使用(e)溶劑，而將全部固形物成分之含有比率調整為通常5質量%以上，較佳為10質量%以上，更佳為15質量%以上，又，通常為50質量%以下，較佳為30質量%以下，更佳為25質量%以下。例如作為上限與下限之組合，可較佳地列舉5～50質量%，可更佳地列舉10～30質量%，可進而較佳地列舉15～25質量%。 (f)分散劑之含有比率並無特別限定，於感光性著色組合物之全部固形物成分中，通常為1質量%以上，較佳為3質量%以上，更佳為5質量%以上，又，通常為30質量%以下，較佳為20質量%以下，更佳為15質量%以下，進而較佳為10質量%以下。藉由設為上述下限值以上，有容易獲得充分之分散性之傾向，藉由設為上述上限值以下，有可抑制因其他成分之比率相對減少而引起之感度、製版性等之降低之傾向。例如作為上限與下限之組合，可較佳地列舉1～30質量%，可更佳地列舉3～20質量%，可進而較佳地列舉5～15質量%，可尤佳地列舉5～10質量%。 又，(f)分散劑相對於(a)著色劑100質量份之含有比率通常為5質量份以上，更佳為10質量份以上，進而較佳為15質量份以上，又，通常為50質量份以下，尤佳為30質量份以下。藉由設為上述下限值以上，有容易獲得充分之分散性之傾向，藉由設為上述上限值以下，有可抑制因其他成分之比率相對減少而引起之感度、製版性等之降低之傾向。例如作為上限與下限之組合，可較佳地列舉5～50質量份，更佳為10～30質量份，可進而較佳地列舉15～30質量份。 另一方面，(b)鹼可溶性樹脂相對於(d)乙烯性不飽和化合物100質量份之含有比率通常為80質量份以上，較佳為100質量份以上，更佳為150質量份以上，進而較佳為200質量份以上，尤佳為250質量份以上，又，通常為700質量份以下，較佳為500質量份以下，更佳為400質量份以下，進而較佳為300質量份以下。藉由設為上述下限值以上，有溶解顯影狀態適度而無剝離等之傾向，又，藉由設為上述上限值以下，有可獲得對於顯影液而言恰當之溶解時間之傾向。又，例如作為上限與下限之組合，可較佳地列舉80～700質量份，可更佳地列舉100～500質量份，可進而較佳地列舉150～400質量份，可尤佳地列舉200～300質量份，可最佳地列舉250～300質量份。 於使用密接提高劑之情形時，其含有比率並無特別限定，於感光性著色組合物之全部固形物成分中，通常為0.1～5質量%，較佳為0.2～3質量%，進而較佳為0.4～2質量%。藉由將密接提高劑之含有比率設為上述下限值以上，有可充分獲得密接性之提高效果之傾向，藉由設為上述上限值以下，有可抑制感度降低、或抑制於顯影後留有殘渣而成為缺陷之傾向。 又，於使用界面活性劑之情形時，其含有比率並無特別限定，於感光性著色組合物之全部固形物成分中，通常為0.001～10質量%，較佳為0.005～1質量%，進而較佳為0.01～0.5質量%，最佳為0.03～0.3質量%。藉由將界面活性劑之含有比率設為上述下限值以上，有容易使塗佈膜表現出平滑性、均勻性之傾向，藉由設為上述上限值以下，有不僅容易使塗佈膜表現出平滑性、均勻性，且亦可抑制其他特性之劣化之傾向。 ＜感光性著色組合物之物性＞ 本發明之感光性著色組合物可較佳地用於形成著色間隔物，就用作著色間隔物之觀點而言，較佳為呈現黑色。又，其塗膜之每1 μm膜厚之光學濃度(OD)較佳為1.0以上，更佳為1.2以上，進而較佳為1.3以上，進而更佳為1.4以上，尤佳為1.5以上，最佳為1.8以上，又，通常為4.0以下，較佳為3.0以下，更佳為2.5以下。例如作為上限與下限之組合，可較佳地列舉1.0～4.0，可更佳地列舉1.2～3.0，可進而較佳地列舉1.3～3.0，可進而更佳地列舉1.4～3.0，可尤佳地列舉1.5～3.0，可最佳地列舉1.8～2.5。 又，本發明之感光性著色組合物於波長700 nm下之透過率較佳為2.5%以下，更佳為2.0%以下，進而較佳為1.5%以下，又，通常為0.01%以上。藉由設為上述上限值以下，有可抑制波長700 nm下之漏光，可抑制所顯示圖像發紅之傾向。作為上限與下限之組合，可較佳地列舉0.01～2.5%，可更佳地列舉0.01～2.0%，可進而較佳地列舉0.01～1.5%。 另一方面，本發明之感光性著色組合物於波長900 nm下之透過率較佳為10%以上，更佳為15%以上，進而較佳為20%以上，又，通常為100%以下。作為上限與下限之組合，可較佳地列舉10～100%，可更佳地列舉15～100%，可進而較佳地列舉20～100%。 一般而言，包含黑矩陣及像素之彩色濾光片係直接形成於玻璃基板上，因此，用以形成黑矩陣之光罩之位置對準不會成為問題。另一方面，著色間隔物存在形成於陣列基板(TFT側之基板)上之情況，於該情形時，需與基板上之TFT圖案之位置對準而形成著色間隔物。作為於特定位置形成著色間隔物之方法，可列舉利用波長900 nm附近之光讀取陣列基板上之標記而進行光罩之位置對準的方法，但於進行位置對準時，該標記被用以形成著色間隔物之塗膜被覆，因此該塗膜於波長900 nm下之透過率為特定值以上變得重要。因此，藉由將波長900 nm以上之透過率設為上述下限值以上，有標記之視認性提高，容易於特定位置形成著色間隔物之傾向。 關於感光性著色組合物於波長700 nm或900 nm下之透過率，只要使用該感光性著色組合物而形成膜厚2.5 μm之硬化膜，利用分光光度計測定波長700 nm或900 nm下之透過率即可。詳細之測定條件等並無特別限定，例如可藉由下述實施例中所記載之方法進行測定。 ＜感光性著色組合物之製造方法＞ 本發明之感光性著色組合物(以下有時稱為「抗蝕劑」)係依據常規方法而製造。 通常較佳為預先使用塗料調節器、砂磨機、球磨機、輥磨機、石磨機、噴射磨機、均質機等對(a)著色劑進行分散處理。(a)著色劑藉由分散處理而變得微粒子化，因此抗蝕劑之塗佈特性提高。 分散處理通常較佳為在併用有(a)著色劑、(e)溶劑、及(f)分散劑、以及部分或全部(b)鹼可溶性樹脂之系統中進行(以下，有時將供進行分散處理之混合物、及藉由該處理所獲得之組合物稱為「墨水」或「顏料分散液」)。尤其是若使用高分子分散劑作為(f)分散劑，則會抑制所獲得之墨水及抗蝕劑隨時間經過之黏度上升(分散穩定性優異)，因此較佳。 如此，於製造抗蝕劑之步驟中，較佳為製造至少含有(a)著色劑、(e)溶劑及(f)分散劑之顏料分散液。 作為顏料分散液中可使用之(a)著色劑、(e)有機溶劑及(f)分散劑，分別可較佳地採用作為感光性著色組合物中可使用之著色劑、溶劑及分散劑所記載之各者。又，關於顏料分散液中之(a)著色劑之各著色劑之含有比率，亦可較佳地採用作為感光性著色組合物中之含有比率所記載者。 再者，於對含有感光性著色組合物中所要調配之全部成分之液體進行分散處理之情形時，有因分散處理時之發熱而導致高反應性成分改性之可能性。因此，較佳為在包含高分子分散劑之系統中進行分散處理。 於利用砂磨機使(a)著色劑分散之情形時，較佳為使用粒徑0.1～8 mm左右之玻璃珠或氧化鋯珠。關於分散處理條件，溫度通常為0℃至100℃，較佳為室溫至80℃之範圍。適宜之分散時間根據液體組成及分散處理裝置之尺寸等而不同，因此適當加以調節。分散之標準係以抗蝕劑之20度鏡面光澤度(JIS Z8741)成為50～300之範圍之方式控制墨水之光澤。於抗蝕劑之光澤度較低之情形時，分散處理欠充分，粗糙之顏料(色料)粒子多有殘留，顯影性、密接性、解像性等有可能不充分。又，若進行分散處理直至光澤值超出上述範圍，則顏料破碎而產生大量超微粒子，因此反而有損害分散穩定性之傾向。 又，分散於墨水中之顏料之分散粒徑通常為0.03～0.3 μm，藉由動態光散射法等進行測定。 繼而，將藉由上述分散處理所獲得之墨水、與抗蝕劑中所要包含之上述其他成分進行混合，製成均勻之溶液。於抗蝕劑之製造步驟中，會有微細污物混入液中，因此較理想為利用過濾器等對所獲得之抗蝕劑進行過濾處理。 [硬化物] 藉由使本發明之感光性著色組合物硬化而可獲得硬化物。使感光性著色組合物硬化而成之硬化物可適宜地用作著色間隔物。 [著色間隔物] 其次，針對使用本發明之感光性著色組合物之著色間隔物，依據其製造方法進行說明。 (1)支持體 作為用以形成著色間隔物之支持體，只要具有適度之強度，則其材質並無特別限定。主要使用透明基板，作為材質，例如可列舉：聚對苯二甲酸乙二酯等聚酯系樹脂，聚丙烯、聚乙烯等聚烯烴系樹脂，聚碳酸酯、聚甲基丙烯酸甲酯、聚碸等熱塑性樹脂製片材；環氧樹脂、不飽和聚酯樹脂、聚(甲基)丙烯酸系樹脂等熱硬化性樹脂片材；或各種玻璃等。其中，就耐熱性之觀點而言，較佳為玻璃、耐熱性樹脂。又，亦有在基板之表面成膜ITO(Indium Tin Oxides，氧化銦錫)、IZO(Indium Zinc Oxide，氧化銦鋅)等透明電極之情況。除透明基板以外，亦可形成於TFT陣列上。 為了改良接著性等表面物性，視需要亦可對支持體進行電暈放電處理、臭氧處理、矽烷偶合劑、或使用胺基甲酸酯系樹脂等各種樹脂之薄膜形成處理等。 透明基板之厚度通常設為0.05～10 mm、較佳為0.1～7 mm之範圍。又，於進行各種樹脂之薄膜形成處理之情形時，其膜厚通常為0.01～10 μm，較佳為0.05～5 μm之範圍。 (2)著色間隔物 本發明之感光性著色組合物可用於與公知之彩色濾光片用感光性著色組合物相同之用途，以下針對作為著色間隔物(黑色感光性間隔物)使用之情形，基於使用本發明之感光性著色組合物之黑色感光性間隔物之形成方法之具體例進行說明。 通常藉由塗佈等方法將感光性著色組合物呈膜狀或圖案狀地供給至應設置黑色感光性間隔物之基板上，使溶劑乾燥。繼而，藉由進行曝光顯影之光微影法等方法進行圖案形成。其後，視需要進行追加曝光或熱硬化處理，藉此於該基板上形成黑色感光性間隔物。 (3)著色間隔物之形成 [1]向基板之供給方法 本發明之感光性著色組合物通常以溶解或分散於溶劑之狀態供給至基板上。作為其供給方法，可藉由先前公知之方法，例如旋轉塗佈法、線棒塗佈法、流塗法、模嘴塗佈法、輥式塗佈法、噴塗法等而進行。又，亦可藉由噴墨法或印刷法等而呈圖案狀地供給。其中，若採用模嘴塗佈法，則就可大幅削減塗佈液使用量，且完全不受採用旋轉塗佈法時所附著之霧(mist)等之影響，從而抑制異物產生等綜合觀點而言較佳。 塗佈量根據用途而異，例如於黑色感光性間隔物之情形時，作為乾燥膜厚，通常為0.5 μm～10 μm，較佳為1 μm～9 μm，尤佳為1 μm～7 μm之範圍。又，重要的是基板全域內之乾燥膜厚或最終形成之間隔物之高度均勻。於差異較大之情形時，液晶面板會產生不均缺陷。 其中，於使用本發明之感光性著色組合物，藉由光微影法一次性形成不同高度之黑色感光性間隔物之情形時，最終形成之黑色感光性間隔物之高度不同。 再者，作為基板，可使用玻璃基板等公知基板。又，基板表面宜為平面。 [2]乾燥方法 向基板上供給感光性著色組合物溶液後之乾燥較佳為藉由使用加熱板、IR烘箱、對流烘箱之乾燥方法而進行。又，亦可組合採用不提高溫度而於減壓室內進行乾燥之減壓乾燥法。 乾燥之條件可根據溶劑成分之種類、所使用之乾燥機之性能等而適當選擇。作為乾燥時間，根據溶劑成分之種類、所使用之乾燥機之性能等，通常於40℃～130℃之溫度下於15秒～5分鐘之範圍內選擇，較佳為於50℃～110℃之溫度下於30秒～3分鐘之範圍內選擇。 [3]曝光方法 曝光係藉由如下方式進行：於感光性著色組合物之塗佈膜上重疊負型之遮罩圖案，利用紫外線或可見光線之光源隔著該遮罩圖案進行照射。於使用曝光遮罩進行曝光之情形時，可採用：使曝光遮罩靠近感光性著色組合物之塗佈膜之方法；或將曝光遮罩配置於遠離感光性著色組合物之塗佈膜之位置，將通過該曝光遮罩之曝光之光進行投影之方法。又，亦可採用不使用遮罩圖案而利用雷射光進行掃描曝光之方式。此時，為了防止因氧氣引起之光聚合性層之感度降低，視需要可於脫氧環境下進行曝光，或可於光聚合性層上形成聚乙烯醇層等隔氧層後再進行曝光。 作為本發明之較佳態樣，於藉由光微影法同時形成不同高度之黑色感光性間隔物之情形時，例如使用具有遮光部(透過率0%)與複數個開口部之曝光遮罩，該複數個開口部具有相對於平均透過率最高之開口部(完全透過開口部)而言平均透過率較小之開口部(半透過開口部)。藉由該方法，利用半透過開口部與完全透過開口部之平均透過率之差、即曝光量之差，而使殘膜率產生差異。 關於半透過開口部，已知有例如利用具有微小之多邊形遮光組件之矩陣狀遮光圖案而製作之方法等。又，關於吸收體，已知有利用鉻系、鉬系、鎢系、矽系等材料之膜控制透過率而製作之方法等。 上述曝光所使用之光源並無特別限定。作為光源，例如可列舉：氙氣燈、鹵素燈、鎢絲燈、高壓水銀燈、超高壓水銀燈、金屬鹵化物燈、中壓水銀燈、低壓水銀燈、碳弧、螢光燈等燈光源，或氬離子雷射、YAG(Yttrium Aluminum Garnet，釔-鋁-石榴石)雷射、準分子雷射、氮氣雷射、氦-鎘雷射、藍紫色半導體雷射、近紅外半導體雷射等雷射光源等。於照射特定波長之光而使用之情形時，亦可利用光學濾光片。 作為光學濾光片，例如可為能夠控制曝光波長下之透過率之薄膜型，作為該情形時之材質，例如可列舉：Cr化合物(Cr之氧化物、氮化物、氮氧化物、氟化物等)、MoSi、Si、W、Al等。 作為曝光量，通常為1 mJ/cm2 以上，較佳為5 mJ/cm2 以上，更佳為10 mJ/cm2 以上，又，通常為300 mJ/cm2 以下，較佳為200 mJ/cm2 以下，更佳為150 mJ/cm2 以下。 又，於近接曝光方式之情形時，作為曝光對象與遮罩圖案之距離，通常為10 μm以上，較佳為50 μm以上，更佳為75 μm以上，又，通常為500 μm以下，較佳為400 μm以下，更佳為300 μm以下。 [4]顯影方法 於上述曝光後，使用鹼性化合物之水溶液或有機溶劑進行顯影，藉此可於基板上形成圖像圖案。該水溶液可進而包含界面活性劑、有機溶劑、緩衝劑、錯合劑、染料或顏料。 作為鹼性化合物，可列舉：氫氧化鈉、氫氧化鉀、氫氧化鋰、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀、矽酸鈉、矽酸鉀、偏矽酸鈉、磷酸鈉、磷酸鉀、磷酸氫鈉、磷酸氫鉀、磷酸二氫鈉、磷酸二氫鉀、氫氧化銨等無機鹼性化合物，或者單乙醇胺、二乙醇胺或三乙醇胺、單甲胺、二甲胺或三甲胺、單乙胺、二乙胺或三乙胺、單異丙胺或二異丙胺、正丁胺、單異丙醇胺、二異丙醇胺或三異丙醇胺、伸乙基亞胺、伸乙基二亞胺、氫氧化四甲基銨(TMAH)、膽鹼等有機鹼性化合物。該等鹼性化合物可為2種以上之混合物。 作為上述界面活性劑，例如可列舉：聚氧乙烯烷基醚類、聚氧乙烯烷基芳基醚類、聚氧乙烯烷基酯類、山梨醇酐烷基酯類、甘油單酸酯烷基酯類等非離子系界面活性劑，烷基苯磺酸鹽類、烷基萘磺酸鹽類、烷基硫酸鹽類、烷基磺酸鹽類、磺基琥珀酸酯鹽類等陰離子性界面活性劑，烷基甜菜鹼類、胺基酸類等兩性界面活性劑。 作為有機溶劑，例如可列舉：異丙醇、苄醇、乙基溶纖劑、丁基溶纖劑、苯基溶纖劑、丙二醇、二丙酮醇等。有機溶劑可單獨使用或與水溶液併用。 顯影處理之條件並無特別限制，通常，顯影溫度為10～50℃之範圍，其中，較佳為15～45℃，尤佳為20～40℃，顯影方法可採用浸漬顯影法、噴射顯影法、毛刷顯影法、超音波顯影法等任一方法。 [5]追加曝光及熱硬化處理 對於顯影後之基板，視需要可藉由與上述曝光方法相同之方法進行追加曝光，或可進行熱硬化處理。關於此時之熱硬化處理條件，溫度係於100℃～280℃之範圍、較佳為150℃～250℃之範圍內選擇，時間係於5分鐘～60分鐘之範圍內選擇。 本發明之著色間隔物之大小或形狀等係根據應用其之彩色濾光片之規格等而適當調整，本發明之感光性著色組合物尤其可用於藉由光微影法同時形成間隔物與副間隔物之高度不同之黑色感光性間隔物，於該情形時，間隔物之高度通常為2～7 μm左右，副間隔物之高度通常較間隔物低0.2～1.5 μm左右。 又，本發明之著色間隔物之每1 μm之光學濃度(OD)就遮光性之觀點而言，較佳為1.2以上，更佳為1.5以上，進而較佳為1.8以上，又，通常為4.0以下，較佳為3.0以下。此處，光學濃度(OD)係藉由下述方法測定之值。例如作為上限與下限之組合，可較佳地列舉1.2～4.0，可更佳地列舉1.5～3.0，可進而較佳地列舉1.8～3.0。 [彩色濾光片] 彩色濾光片可於液晶驅動基板(陣列基板)上形成紅色、綠色、藍色之像素著色層。或可於作為透明基板之玻璃基板上形成像素著色層。 [圖像顯示裝置] 本發明之圖像顯示裝置具備如上所述之本發明之著色間隔物。 例如於具有本發明之著色間隔物之液晶驅動基板(陣列基板)上形成配向膜，與相對電極基板進行貼合而形成液晶單元，向所形成之液晶單元內注入液晶，藉此可製造具備本發明之著色間隔物之液晶顯示裝置等圖像顯示裝置。 另一方面，於相對電極基板側設置本發明之著色間隔物，與液晶驅動基板(陣列基板)進行貼合而形成液晶單元，向所形成之液晶單元內注入液晶，藉此亦可製造具備本發明之著色間隔物之液晶顯示裝置等圖像顯示裝置。 又，例如，如日本專利特開2014-215614號公報所記載般，使用特定之配向物質，向液晶單元內注入液晶後，照射紫外線，藉此可提高液晶配向性。 [實施例] 其次，列舉實施例及比較例而更具體地說明本發明，但本發明只要未超出其主旨，則並不限定於以下之實施例。 以下之實施例及比較例中使用之感光性著色組合物之構成成分如下。 ＜鹼可溶性樹脂-I＞ 一面進行氮氣置換一面攪拌丙二醇單甲醚乙酸酯145質量份，升溫至120℃。於其中滴加苯乙烯10質量份、甲基丙烯酸縮水甘油酯85.2質量份及具有三環癸烷骨架之單甲基丙烯酸酯(日立化成公司製造之FA-513M)66質量份，並歷時3小時滴加2,2'-偶氮雙-2-甲基丁腈8.47質量份，進而於90℃下持續攪拌2小時。繼而，將反應容器內置換為空氣，對丙烯酸43.2質量份投入三二甲基胺基甲基苯酚0.7質量份及對苯二酚0.12質量份，於100℃下持續反應12小時。其後，添加四氫鄰苯二甲酸酐(THPA)56.2質量份、三乙胺0.7質量份，於100℃下反應3.5小時。如此獲得之鹼可溶性樹脂-I藉由GPC所測得之重量平均分子量Mw約為8400，酸值為80 mgKOH/g。 ＜鹼可溶性樹脂-II＞ 日本化藥公司製造之「ZCR-1664H」(Mw＝6500，酸值＝60 mgKOH/g) ＜顏料-I＞ BASF公司製造之「Irgaphor(註冊商標)Black S 0100 CF」(具有下述式(I-1)所表示之化學結構)。其相當於著色劑(a1)。 [化43]＜顏料-II＞ C.I.顏料藍60。其相當於著色劑(a2)。 ＜顏料-III＞ 碳黑。Birla公司製造之「RAVEN 1060U」(原Columbia公司製造「R1060」)。其相當於著色劑(a3)。 ＜顏料-IV＞ C.I.顏料藍15：6。 ＜顏料-V＞ C.I.顏料紫29。 ＜顏料-VI＞ BASF公司製造之「Paliogen(註冊商標)Black L0086」。苝黑。著色劑(a1)以外之有機黑色顏料。 ＜分散劑-I＞ BYK-Chemie公司製造之「BYK-LPN21116」(包含側鏈具有四級銨鹽基及三級胺基之A嵌段、與不具有四級銨鹽基及三級胺基之B嵌段的丙烯酸系A-B嵌段共聚物。胺值為70 mgKOH/g。酸值為1 mgKOH/g以下) 分散劑-I之A嵌段中包含下述式(1a)及(2a)之重複單元，B嵌段中包含下述式(3a)之重複單元。下述式(1a)、(2a)及(3a)之重複單元於分散劑-I之全部重複單元中所占之含有比率分別為11.1莫耳%、22.2莫耳%、6.7莫耳%。 [化44]＜分散劑-II＞ BYK-Chemie公司製造之「DISPERBYK-167」(胺基甲酸酯系高分子分散劑) ＜顏料衍生物＞ Lubrizol公司製造之「Solsperse12000」 ＜溶劑-I＞ PGMEA：丙二醇單甲醚乙酸酯 ＜溶劑-II＞ MB：3-甲氧基-1-丁醇 ＜光聚合起始劑-I＞ 具有以下記載之化學結構之肟酯起始劑。 [化45]＜光聚合性單體＞ DPHA：日本化藥公司製造之二季戊四醇六丙烯酸酯 ＜添加劑＞ 日本化藥公司製造之「KAYAMER PM-21」(含甲基丙烯醯基之磷酸酯) ＜界面活性劑＞ DIC公司製造之「MEGAFAC F-559」 ＜顏料分散液1、2、4、5及6之製備＞ 以成為表1記載之質量比之方式將表1記載之顏料、分散劑、分散助劑、鹼可溶性樹脂及溶劑進行混合。利用塗料振盪機，於25～45℃之範圍內對該混合液進行3小時之分散處理。作為珠粒，使用0.5 mmf之氧化鋯珠，添加質量為分散液之2.5倍。分散結束後，利用過濾器將珠粒與分散液進行分離，而製備顏料分散液1、2、4、5及6。再者，於與顏料分散液2相同之條件下使顏料-VI分散，結果黏度大幅增加，因此需將顏料分散液6中之分散劑相對於顏料之含有比率設定為較高。 [表1] ＜顏料分散液3之製備＞ 以成為表1記載之質量比之方式將表1記載之顏料、分散劑、分散助劑、鹼可溶性樹脂及溶劑進行混合，將分散處理時間變更為6小時，除此以外，藉由與顏料分散液1、2、4、5及6相同之方法進行分散，而製備顏料分散液3。 [實施例1～12及比較例1～5] 使用上述所製備之顏料分散液1～6，以固形物成分中之比率成為表2～5之調配比率之方式添加其他各成分，進而以全部固形物成分之含有比率成為19質量%之方式添加PGMEA，進行攪拌，使之溶解，而製備感光性著色組合物，並藉由以下方法進行評價。 ＜每單位膜厚之光學濃度(單位OD值)、透過率之測定＞ 每單位膜厚之光學濃度係藉由以下步驟而測定。 首先，使用旋轉塗佈機，以使後烘烤後之膜厚成為2.5 μm之方式於玻璃基板上塗佈所製備之各感光性著色組合物，經過1分鐘之減壓乾燥後，利用加熱板於90℃下乾燥90秒。其後，使用高壓水銀燈，於400 mJ/cm2 、照度45 mW/cm2 之曝光條件下進行整面曝光，於230℃下加熱(後烘烤)20分鐘，藉此獲得塗有抗蝕劑之基板。利用透過濃度計GretagMacbeth D200-II測定所獲得之基板之光學濃度(OD值)，利用Ryoka Systems公司製造之非接觸表面・層剖面形狀計測系統VertScan(R)2.0測定膜厚，由光學濃度(OD值)及膜厚而算出每單位膜厚(1 μm)之光學濃度(單位OD值)。再者，OD值係表示遮光能力之數值，數值越大表示遮光性越高。 又，使用相同之基板，利用分光光度計UV-3100(島津製作所公司製造)測定於波長700 nm及900 nm下之透過率。此時，將未塗佈感光性著色組合物之玻璃基板作為參考。 波長700 nm下之透過率係漏光之指標，數值越小越佳。有若為2.5%以下則較佳之傾向。 又，波長900 nm下之透過率係用以進行光罩位置對準之標記之讀取適合性之指標，數值越大越佳。有若為10%以上則較佳之傾向。 將單位OD值及透過率之測定結果示於表2～5。 ＜電壓保持率(VHR)、離子密度之評價＞ 藉由以下記載之方法，進行電壓保持率(VHR)、離子密度之評價。 (液晶單元之製作) 準備如下電極：於單面之整面上形成有ITO膜之電極基板A(EHC公司製造，單面整面經ITO片被覆之評價用玻璃)；於玻璃基板之單面中央部形成有與寬2 mm之取出電極(take-out electrode)連結之1 cm見方之ITO膜(2)的電極基板B(20)(EHC公司製造，評價用玻璃SZ-B111MIN(B))。圖1表示電極基板B(20)之上表面之模式圖。 於電極基板A之上塗佈各感光性著色組合物，進行1分鐘之真空乾燥後，於加熱板上以90℃預烘烤90秒，而獲得乾燥膜厚2.5 μm之塗佈膜。其後，將外緣部遮蓋2 mm，分別使用高壓水銀燈，於400 mJ/cm2 、照度45 mW/cm2 之曝光條件下實施圖像曝光。繼而，使用25℃之約0.1質量%之氫氧化鉀水溶液，於25℃下實施水壓0.15 MPa之噴淋顯影後，利用純水中止顯影，並噴水沖洗。噴淋顯影時間係於10～120秒之間調整，設為溶解去除未曝光之感光性著色組合物層所需時間(間斷時間(break time))之約1.6倍。 將如此形成有塗膜之電極基板A於230℃下後烘烤20分鐘，而獲得形成有著色硬化膜(3)之電極基板(抗蝕劑基板)。其後，於抗蝕劑基板上塗佈聚醯亞胺溶液，於加熱板上以70℃預烘烤2分鐘，以220℃後烘烤24分鐘。將如此獲得之抗蝕劑基板切割成2.5 cm見方之基板，而完成評價用電極基板A(8)。 另一方面，於電極基板B(20)之上亦塗佈聚醯亞胺溶液，於加熱板上以70℃預烘烤2分鐘，以220℃後烘烤24分鐘，而完成評價用電極基板B(9)。 其後，使用分注器，於評價用電極基板B(9)之外周上塗佈含有直徑5 μm之矽珠之環氧樹脂系密封劑(5)後，將評價用電極基板A(8)之塗佈面壓接於評價用電極基板B(9)之表側(密封劑側)而進行貼附，製成空單元。將所製成之空單元於熱風循環爐內進行180℃、2小時加熱。 向如此獲得之空單元內注入液晶(7)(Merck Japan公司製造之MLC-6608)，並利用UV硬化型密封劑(6)密封周邊部。對上述液晶單元進行退火處理(於熱風循環爐內進行105℃、2.5小時加熱)後，利用高壓水銀燈以18 J/cm2 、照度40 mW/cm2 照射紫外線，而完成測定用液晶單元(30)。於所製成之單元中，上述著色硬化膜為1.7 cm見方、電極部為1 cm見方。圖2表示所完成之測定用液晶單元(30)之側面之模式圖。 (電壓保持率(VHR)之評價) 於2.0 Hz、幀時間1667 msec之條件下所製成之測定用液晶單元施加電壓5 V，利用TOYO Corporation製造之「液晶物性評價裝置-6254型」測定電壓保持率，作為電性可靠性之指標而進行評價。再者，電壓保持率越高越佳。將結果示於表2～5。 又，將頻率變更為0.6 Hz，除此以外，於相同條件下測定電壓保持率。將結果示於表2、4及5。 () 離子密度之評價 離子密度例如可藉由International Display Workshop(IDW)‘06論文集LCT7-1中所記載之方法進行測定。離子密度測定時緩步地施加電壓，因此存在如下情況：可將離子波峰與液晶配向波峰區分開測定，而可測定出利用電壓保持率時難以出現之可靠性差異。雜質離子有可能導致液晶顯示裝置出現殘留圖像、閃爍(跳動)等顯示不良，離子密度測定對其評價有效。 於測定中，利用TOYO Corporation製造之「液晶物性評價裝置-6254型」，經時地測定對測定用液晶單元施加頻率0.1 Hz、±5 V之三角波時之電流，獲得電流隨時間變化之波形。測定波形中之雜質離子波峰部(13)之面積，求出離子密度。圖3表示以一個週期之時間作為橫軸時之施加電壓值(11)、測定電流值(12)及雜質離子波峰部(13)之概略圖。將測定結果示於表2、4及5。 [表2] [表3] [表4] [表5] 可確認，表2之實施例1～4、比較例1～4之感光性著色組合物中之各者之塗佈基板之單位OD值相同，即，具有同等之遮光特性，但其中，使用實施例1～4之感光性著色組合物之塗佈基板於波長700 nm下之透過率充分低，對長波長區域之可見光之遮光性優異，於波長900 nm下之透過率充分高，用以進行光罩位置對準之標記之讀取適合性良好。又，可確認，紫外線照射後之2.0 Hz下之電壓保持率較高，因此，即便採用於製作液晶單元後進行紫外線照射之面板製作方法，亦不會損害液晶驅動。 相對於此，可確認，使用比較例1之感光性著色組合物之塗佈基板於波長900 nm下之透過率較低，用以進行光罩位置對準之標記之讀取適合性不充分。 又，可確認，使用比較例2、3之感光性著色組合物之塗佈基板於波長700 nm下之透過率較高，對長波長區域之可見光之遮光性不充分，會產生漏光。又，可確認，使用比較例2之感光性著色組合物之塗佈基板於紫外線照射後於2.0 Hz下之電壓保持率較低，因此，會有損液晶驅動。 另一方面，可確認，使用比較例4之感光性著色組合物之塗佈基板於波長900 nm下之透過率及於波長700 nm下之透過率不成問題，但於紫外線照射後於2.0 Hz下之電壓保持率較低，因此，會有損液晶驅動。 於為了確保感光性著色組合物之遮光性而使用黑色顏料之情形時，黑色顏料中之碳黑於可見光之全波長區域範圍內之吸光度均較高，因此可充分降低波長700 nm下之透過率，但於紅外區域之吸光度亦較高而會使該區域中之透過率變低，因此，於如比較例1般(a1)有機黑色顏料相對於(a3)碳黑100質量份之含有比率較低之情形時，即，於(a3)碳黑於黑色顏料中所占之比率較高之情形時，會導致波長900 nm下之透過率變低。 另一方面，於如比較例2般不含(a3)碳黑之情形時，由於(a1)有機黑色顏料於波長700 nm下之透過率較高，故導致所獲得之塗佈基板於波長700 nm下之透過率亦變高。又，由於不含吸光度較高之碳黑，故導致實現特定OD值所需之顏料含有比率變高，因此，紫外線照射後於2.0 Hz下之電壓保持率劣化，電性可靠性變低。 又，於如比較例3般不含(a2)C.I.顏料藍60之情形時，亦會由於(a1)有機黑色顏料於波長700 nm下之透過率較高，故導致所獲得之塗佈基板於波長700 nm下之透過率亦變高。另一方面，雖然認為藉由進一步提高(a3)碳黑之含有比率而可降低於波長700 nm下之透過率，但預測會如比較例1般於波長900 nm下之透過率亦變低。因此，認為於不含(a2)C.I.顏料藍60之情形時，難以兼備波長700 nm透過率與波長900 nm透過率。 如此，添加藍色顏料對於改善波長700 nm下之漏光有效，但於如比較例4般未選擇適宜之顏料種類之情形時，紫外線照射後於2.0 Hz下之電壓保持率較低，電性可靠性變低。 相對於該等比較例，藉由如實施例1～4般將特定之有機黑色顏料、藍色顏料及碳黑併用，並將特定之有機黑色顏料與碳黑之比率調整為合適之值，不僅可使波長900 nm下之透過率充分高，光罩位置對準之標記之讀取適合性充分，且可使波長700 nm下之透過率充分低，不會產生漏光。尤其藉由選擇C.I.顏料藍60作為藍色顏料，紫外線照射後之2.0 Hz下之電壓保持率較高，而可提高電性可靠性。尤其藉由實施例2與實施例1之比較、進而實施例1與實施例3及4之比較可知，藉由提高全部有機顏料相對於碳黑100質量份之含有比率，可進一步提高波長900 nm下之透過率。 另一方面，可確認，表3之實施例5～8之感光性著色組合物中之各者之塗佈基板之單位OD值相同，即，具有同等之遮光特性，波長900 nm下之透過率及電性可靠性優異，其中，使用實施例7及8、尤其使用實施例8之感光性著色組合物之塗佈基板於波長700 nm下之透過率非常低，對長波長區域之可見光之遮光性特別優異。由此可知，藉由提高(a2)C.I.顏料藍60相對於碳黑100質量份之含有比率，可進一步降低波長700 nm下之透過率。 又，表4之實施例9～12之感光性著色組合物中，全部顏料之含有比率設為相同，但改變紫色顏料相對於(a1)有機黑色顏料100質量份之含有比率，可確認，其中之實施例10～12、尤其實施例11及12之感光性著色組合物之塗佈基板之單位OD值較高。由此可知，藉由提高紫色顏料相對於(a1)有機黑色顏料100質量份之含有比率，可提高單位OD值。 表5之實施例1與比較例5之感光性著色組合物除了有機黑色顏料之種類不同以外，其他組成相同，但實施例1之感光性著色組合物於紫外線照射後之2.0 Hz下之電壓保持率較高，因此可確認電性可靠性良好。由此可知，藉由使用(a1)有機黑色顏料作為有機黑色顏料，可優化電性可靠性。 [產業上之可利用性] 根據本發明之感光性著色組合物，可提供一種波長700 nm附近之漏光較少、波長900m附近之透過率優異、且紫外線照射後之電性可靠性優異的硬化物及著色間隔物，進而，可提供一種具備此種著色間隔物之圖像顯示裝置。因此，本發明於感光性著色組合物、硬化物、著色間隔物及圖像顯示裝置之各領域中具有極高之產業上之可利用性。Hereinafter, embodiments of the present invention will be specifically described, but the present invention is not limited to the following embodiments, and can be implemented with various changes within the scope of the main purpose thereof. In the present invention, "(meth) acrylic acid" means "acrylic and / or methacrylic acid", and the same applies to "(meth) acrylate" and "(meth) acrylfluorenyl". The "(co) polymer" means including both a homopolymer and a copolymer, and the "acid (anhydride)", "(anhydrous) ... acid" means including both an acid and its anhydride. In the present invention, the "acrylic resin" means a (co) polymer containing (meth) acrylic acid and a (co) polymer containing (meth) acrylate having a carboxyl group. In the present invention, the term "monomer" refers to a term referring to a so-called macromolecular substance (polymer), and includes a dimer, trimer, and oligomer in addition to a narrow monomer. Things included. In the present invention, the "all solid content component" means all components other than the solvent contained in the photosensitive coloring composition or the ink described below. In the present invention, the "weight average molecular weight" means a weight average molecular weight (Mw) in terms of polystyrene measured by GPC (gel permeation chromatography). In addition, in the present invention, the "amine value" means an amine value equivalent to the effective solid content content unless otherwise specified, and is expressed by the mass of KOH equivalent to the amount of alkali per 1 g of the solid content of the dispersant. Value. The measurement method is described below. On the other hand, the "acid value" indicates an acid value in terms of effective solid content conversion unless otherwise specified, and is calculated by neutralization titration. Regarding pigments, "C.I." means a color index. In addition, in this specification, the percentage or part represented by "mass" has the same meaning as the percentage or part represented by "weight". [Photosensitive coloring composition] The photosensitive coloring composition of the present invention contains (a) a colorant (b) an alkali-soluble resin (c) a photopolymerization initiator (d) an ethylenically unsaturated compound (e) a solvent (f) The dispersing agent is an essential component, and further contains other formulation ingredients such as adhesion improving agents such as a silane coupling agent, spreadability improving agents, development improving agents, ultraviolet absorbers, antioxidants, surfactants, and pigment derivatives, etc. It is usually used in a state of being dissolved or dispersed in a solvent. With regard to the photosensitive coloring composition of the present invention, (a) the colorant contains (a1) and contains a compound selected from the group consisting of a compound represented by the following general formula (I), a geometric isomer of the compound, a salt of the compound, and the compound At least one type of organic black pigment, (a2) CI pigment blue 60, and (a3) carbon black in the group consisting of salts of geometric isomers, the (a1) organic black pigment is higher than the (a3) carbon The content ratio of 100 parts by mass of black is 150 parts by mass or more. Each component is explained in detail below. <(A) Colorant> The (a) colorant in the photosensitive coloring composition of this invention contains the following (a1), (a2), and (a3) as an essential component. (a1) contains at least one selected from the group consisting of a compound represented by the following general formula (I), a geometric isomer of the compound, a salt of the compound, and a salt of the geometric isomer of the compound Of the organic black pigments (a2) CI pigment blue 60 (a3) carbon black, (a1) and (a2) are organic pigments, and (a3) are inorganic pigments. <(A1) Organic black pigment> As described above, (a) the colorant contained in the photosensitive coloring composition of the present invention contains (a1) a compound selected from the group consisting of a compound represented by the following general formula (I), At least one kind of organic black pigment (hereinafter sometimes simply referred to as "(a1) organic black pigment") in the group consisting of geometric isomers, salts of the above compounds, and salts of geometric isomers of the above compounds is required. ingredient. It is considered that by containing the (a1) organic black pigment, the light-shielding property can be ensured, the decrease in the voltage holding ratio of the liquid crystal can be suppressed, and the absorption of ultraviolet rays can be suppressed to control the shape or the step easily. [Chemical 2]In formula (I), R1 And R6 Are independently hydrogen atom, CH3 CF3 , Fluorine atom or chlorine atom; R2 , R3 , R4 , R5 , R7 , R8 , R9 And R10 Are independently hydrogen atom, halogen atom, R11 , COOH, COOR11 COO- , CONH2 CONHR11 , CONR11 R12 , CN, OH, OR11 COCR11 , OOCNH2 , OOCNHR11 , OOCNR11 R12 , NO2 , NH2 , NHR11 , NR11 R12 , NHCOR12 , NR11 COR12 , N = CH2 , N = CHR11 , N = CR11 R12 , SH, SR11 SOR11 , SO2 R11 , SO3 R11 , SO3 H, SO3 - , SO2 NH2 , SO2 NHR11 Or SO2 NR11 R12 ; And selected from R2 With R3 , R3 With R4 , R4 With R5 , R7 With R8 , R8 With R9 , And R9 With R10 At least one combination of the groups formed may also be directly bonded to each other, or through an oxygen atom, a sulfur atom, NH or NR11 Bridged to each other; R11 And R12 Are independently an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms or an alkynyl group having 2 to 12 carbon atoms . The compound represented by the general formula (I) or the geometric isomer of the compound has the following core structure (where the substituents in the structural formula are omitted), and the most stable one should be a trans-trans isomer. [Chemical 3]In the case where the compound represented by the general formula (I) is anionic, it is preferably a salt obtained by charge compensation using any known suitable cation, such as a metal, organic, inorganic or metal organic cation Specifically, alkali metals, alkaline earth metals, transition metals, primary ammonium, secondary ammonium, trialkylammonium and other tertiary ammonium, tetraalkylammonium and other quaternary ammonium or organometallic complexes. When the geometric isomer of the compound represented by the general formula (I) is anionic, the same salt is preferred. Among the substituents of the general formula (I) and the definitions of these, the following are preferred in terms of the tendency of the shielding ratio to increase. The reason is believed to be that the following substituents have no absorption and do not affect the hue of the pigment. R2 , R4 , R5 , R7 , R9 And R10 Preferably, they are each independently a hydrogen atom, a fluorine atom, or a chlorine atom, and still more preferably a hydrogen atom. R3 And R8 Preferably, each is independently a hydrogen atom, NO2 , OCH3 , OC2 H5 , Bromine atom, chlorine atom, CH3 , C2 H5 , N (CH3 )2 , N (CH3 ) (C2 H5 ), N (C2 H5 )2 , Α-naphthyl, β-naphthyl, SO3 H or SO3 - , And further preferably a hydrogen atom or SO3 H. R1 And R6 Preferably, they are each independently a hydrogen atom, CH3 Or CF3 And more preferably a hydrogen atom. Preferably selected from R1 With R6 , R2 With R7 , R3 With R8 , R4 With R9 , And R5 With R10 At least one combination in the group consists of the same substituents, more preferably R1 For R6 Identical substituents, R2 For R7 Identical substituents, R3 For R8 Identical substituents, R4 For R9 The same substituents, and R5 For R10 Identical substituents. Examples of the alkyl group having 1 to 12 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, isobutyl, third butyl, 2-methylbutyl, and n-butyl. Amyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, n-hexyl, heptyl, n-octyl, 1,1,3,3-tetramethylbutyl, 2-ethyl Hexyl, nonyl, decyl, undecyl or dodecyl. The cycloalkyl group having 3 to 12 carbon atoms is, for example, cyclopropyl, cyclopropylmethyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclohexylmethyl, trimethylcyclohexyl, thujyl, Nodyl, base, norbornyl, amidino, amidino, norbornyl, amidino, 1-adamantyl or 2-adamantyl. Alkenyl groups having 2 to 12 carbon atoms are, for example, vinyl, allyl, 2-propen-2-yl, 2-buten-1-yl, 3-buten-1-yl, 1,3-butadiene 2-yl, 2-penten-1-yl, 3-penten-2-yl, 2-fluorenyl-1-buten-3-yl, 2-methyl-3-buten-2-yl , 3-methyl-2-buten-1-yl, 1,4-pentadien-3-yl, hexenyl, octenyl, nonenyl, decenyl, or dodecenyl. The cycloalkenyl group having 3 to 12 carbon atoms is, for example, 2-cyclobuten-1-yl, 2-cyclopenten-1-yl, 2-cyclohexen-1-yl, 3-cyclohexen-1-yl , 2,4-cyclohexadiene-1-yl, 1-p-pinene-8-yl, 4 (10) -thujene-10-yl, 2-norene-1-yl, 2 , 5-nordien-1-yl, 7,7-dimethyl-2,4-norbornadien-3-yl or camphenyl. Examples of the alkynyl group having 2 to 12 carbon atoms are 1-propyn-3-yl, 1-butyn-4-yl, 1-pentyn-5-yl, and 2-methyl-3-butyn-2-yl. , 1,4-pentadiyne-3-yl, 1,3-pentadiyne-5-yl, 1-hexyne-6-yl, cis-3-methyl-2-pentene-4-yne -1-yl, trans-3-methyl-2-pentene-4-yn-1-yl, 1,3-hexadiyn-5-yl, 1-octyne-8-yl, 1-nonyl Alkyn-9-yl, 1-decyne-10-yl or 1-dodecyne-12-yl. The halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom. The aforementioned (a1) organic black pigment is only required to be selected from the group consisting of a compound represented by the general formula (I), a geometric isomer of the compound, a salt of the compound, and a salt of the geometric isomer of the compound At least one of them may be sufficient, and a plurality of these may be included. The (a1) organic black pigment preferably contains a compound selected from the compound represented by the general formula (I), a geometric isomer of the compound, a salt of the compound, And at least one of the group consisting of salts of geometric isomers of the above compounds. The (a1) organic black pigment is preferably a compound represented by the following general formula (I-1) and / or a geometric isomer of the compound, and more preferably a compound represented by the following general formula (I-1) . [Chemical 4]As a specific example of such an organic black pigment, as a trade name, Irgaphor (registered trademark) Black S 0100 CF (made by BASF) is mentioned. The organic black pigment is preferably used after being dispersed by the following dispersant, solvent, and method. In addition, if a sulfonic acid derivative (sulfonic acid substitution product) of the compound represented by the general formula (I) is present during the dispersion, especially a sulfonic acid derivative of the compound represented by the general formula (I-1), Since the dispersibility or storage stability is improved, it is preferred that the (a1) organic black pigment further contains such a sulfonic acid derivative. Examples of the sulfonic acid derivative include those selected from R in the general formula (I).2 , R3 , R4 , R5 , R7 , R8 , R9 And R10 At least one of the groups formed is SO3 H. In addition, in order to adjust the chromaticity, the (a1) organic black pigment preferably further contains a compound represented by the following general formula (I-2) and / or a geometric isomer of the compound. [Chemical 5]<(A2) C.I. Pigment Blue 60> The (a) colorant contained in the photosensitive coloring composition of the present invention contains (a2) C.I. Pigment Blue 60 as an essential component. The above (a1) organic black pigment has a high transmittance in the vicinity of a wavelength of 650 to 750 nm, and the light shielding properties in this wavelength region are insufficient. However, (a2) CI Pigment Blue 60 has an absorption band in this wavelength region. When (a2) CI Pigment Blue 60 is used in combination, the transmittance in this wavelength region can be reduced. In addition, compared to other blue pigments such as CI Pigment Blue 15: 6, (a2) CI Pigment Blue 60 has a higher transmittance near 300 to 400 nm, suppresses the absorption of ultraviolet rays, and easily controls the shape or order of the colored spacer. difference. In addition, few impurities are dissolved out, the voltage retention rate is high, and the ion density is low. It is thought that, particularly, due to less absorption of ultraviolet rays, decomposition due to ultraviolet irradiation or dissolution of impurities rarely occurs. Even after ultraviolet irradiation to improve the alignment of liquid crystals, the voltage retention rate or the decrease in ion density also decreases. Smaller, excellent electrical reliability. <(A3) carbon black> (a) The colorant contained in the photosensitive coloring composition of this invention contains (a3) carbon black as an essential component. (a3) Carbon black has an overall absorption spectrum at various wavelengths in the visible light region, and its transmittance is also low. Therefore, it is considered that based on the inclusion of (a1) organic black pigment and (a2) CI pigment blue 60 Containing (a3) carbon black not only achieves high light-shielding properties, but also suppresses light leakage, and also reduces the content ratio of the colorant with respect to all solid components, thereby ensuring high electrical reliability. Examples of the carbon black include the following carbon blacks. Manufactured by Mitsubishi Chemical Corporation: MA7, MA8, MA11, MA77, MA100, MA100R, MA100S, MA220, MA230, MA600, MCF88, # 5, # 10, # 20, # 25, # 30, # 32, # 33, # 40 # 44, # 45, # 47, # 50, # 52, # 55, # 650, # 750, # 850, # 900, # 950, # 960, # 970, # 980, # 990, # 1000, # 2200, # 2300, # 2350, # 2400, # 2600, # 2650, # 3030, # 3050, # 3150, # 3250, # 3400, # 3600, # 3750, # 3950, # 4000, # 4010, OIL7B, OIL9B , OIL11B, OIL30B, OIL31B Degussa: Printex (registered trademark, the same below) 3, Printex 3OP, Printex 30, Printex 30OP, Printex 40, Printex 45, Printex 55, Printex 60, Printex 75, Printex 80, Printex 85, Printex 90, Printex A, Printex L, Printex G, Printex P, Printex U, Printex V, Special Black 550, Special Black 350, Special Black 250, Special Black 100, Special Black 6, Special Black 5, Special Black 4, Color Black FW1, Color Black FW2, Color Black FW2V, Color Black FW18, Color Black FW200, Color Black S160, Color Black S170 Made by Cabot: Mo narch (registered trademark, the same below) 120, Monarch 280, Monarch 460, Monarch 800, Monarch 880, Monarch 900, Monarch 1000, Monarch 1100, Monarch 1300, Monarch 1400, Monarch 4630, REGAL (registered trademark, the same below) 99, REGAL 99R, REGAL 415, REGAL 415R, REGAL 250, REGAL 250R, REGAL 330, REGAL 400R, REGAL 55R0, REGAL 660R, BLACK PEARLS480, PEARLS130, VULCAN (registered trademark) XC72R, ELFTEX (registered trademark) -8 Made by Birla: RAVEN (registered trademark, the same below) 11, RAVEN 14, RAVEN 15, RAVEN 16, RAVEN 22, RAVEN 30, RAVEN 35, RAVEN 40, RAVEN 410, RAVEN 420, RAVEN 450, RAVEN 500, RAVEN 780, RAVEN 850, RAVEN 890H, RAVEN 1000, RAVEN 1020, RAVEN 1040, RAVEN 1060U, RAVEN 1080U, RAVEN 1170, RAVEN 1190U, RAVEN 1250, RAVEN 1500, RAVEN 2000, RAVEN 2500U, RAVEN 3500, RAVEN 5000, RAVEN 5250, RAVEN 5750, RAVEN 7000, and The pH of the surface of the carbon black used in the present invention is not particularly limited, but is preferably 9 or less, more preferably 7 or less, even more preferably 5 or less, and even more preferably 4 or less.By making it below the said upper limit, there exists a tendency for a dispersing agent to adhere easily, and a dispersibility becomes favorable. The lower the pH value of the carbon black surface, the better, but usually it is 2 or more. The pH value of the carbon black surface is measured by dispersing carbon black powder in water, and measuring the aqueous pH value of the dispersion. The average particle diameter of the carbon black is preferably 8 nm or more, more preferably 17 nm or more, still more preferably 21 nm or more, still more preferably 100 nm or less, even more preferably 65 nm or less, and even more preferably Below 40 nm, particularly preferably below 32 nm. When it is below the above upper limit value, dispersion stability and storage stability tend to be good, and when it is above the lower limit value, light shielding property tends to be good. The average particle diameter of the carbon black in the present invention means an exponential average particle diameter. In general, the average particle diameter of carbon black is obtained by taking photographs of several fields of view at tens of thousands of times under the observation of an electron microscope, and measuring 2000 to 3000 on these photographs using an image processing device. Particle image analysis for about a few particles. Carbon black can also be used as a resin coating. The use of resin-coated carbon black has the effect of improving the adhesion to the glass substrate or the volume resistivity. As the resin-coated carbon black, for example, the carbon black described in Japanese Patent Application Laid-Open No. 09-71733 can be preferably used. In terms of volume resistivity or dielectric constant, resin-coated carbon black is preferably used. Regarding the carbon black coated with a resin, the total content of Na and Ca is preferably 100 ppm or less. Carbon black usually contains Na or Ca, K, Mg, Al, Fe, etc. mixed with raw material oil or fuel oil (or gas), reaction termination water or granulated water, and furnace materials of the reaction furnace. Ash. Among them, the content of Na or Ca generally reaches hundreds of ppm or more, respectively. By reducing the content of Na or Ca, there is a tendency that such penetration into a transparent electrode (ITO) or other electrodes can be suppressed to prevent an electrical short circuit. As a method to reduce the content of ash containing these Na or Ca, the following methods can be used: carefully select these as low as possible as the raw material oil or fuel oil (or gas) and the reaction termination water when manufacturing carbon black , And to reduce the amount of alkaline substances to adjust the structure as much as possible. Other methods include a method of dissolving and removing Na or Ca by washing carbon black produced from the furnace with water, hydrochloric acid, or the like. Specifically, if carbon black is mixed and dispersed in water, hydrochloric acid, or hydrogen peroxide, and a solvent that is hardly soluble in water is added, the carbon black moves to the solvent side and is completely separated from water. In addition, the Na present in the carbon black is completely dispersed. Or most of Ca is dissolved in water or acid and removed. It is also possible to reduce the total amount of Na and Ca to less than 100 ppm by strictly selecting the raw materials in the carbon black manufacturing process or by dissolving it with water or acid alone. When the methods are used in combination, the total amount of Na and Ca can be more easily reduced to 100 ppm or less. The resin-coated carbon black is preferably a so-called acidic carbon black having a pH of 6 or less. Since the dispersed diameter (agglomerate diameter) in water becomes smaller, it is possible to cover a fine unit (unit), which is preferable. Furthermore, the average particle diameter is preferably 40 nm or less, and the absorption amount of dibutyl phthalate (DBP) is 140 mL / 100 g or less. By setting it as the said range, there exists a tendency for the coating film with favorable light-shielding property to be obtained. The method for preparing the resin-coated carbon black is not particularly limited. For example, after the carbon black and the amount of the resin are appropriately adjusted, the resin can be mixed with a solvent such as cyclohexanone, toluene, and xylene and dissolved by heating. The obtained resin solution is mixed and stirred with a suspension of carbon black and water to separate carbon black from water, and then the water is removed and kneaded by heating to obtain a composition. The composition is formed into a sheet shape, and then A method of drying after pulverization; 2. Mixing and stirring the resin solution and suspension prepared in the same manner as above to granulate carbon black and resin, and then separate the obtained granules and carry out Method for removing remaining solvent and water by heating; 3. Dissolving carboxylic acids such as maleic acid and fumaric acid in the solvent exemplified above, adding carbon black for mixing, and drying and removing the solvent to obtain an additive A method of adding a resin to carbon black having a carboxylic acid in a dry blending manner; 4. High-speed stirring of a monomer component containing a reactive group constituting the coating resin and water to prepare a suspension, and adding the polymer after polymerization Cooling, while the reactive group of the resin is obtained from a polymer-containing suspension, in which the carbon black is added and kneaded, so that reaction with the reactive group of carbon black (carbon black to make grafting), a method of crushing after cooling. The type of the resin to be coated is also not particularly limited. Generally, it is a synthetic resin, and further, a resin having a benzene ring in the structure has the same function as an amphoteric surfactant, so it is more dispersive and dispersion stable. good. As specific synthetic resins, thermosetting resins such as phenol resin, melamine resin, xylene resin, diallyl phthalate resin, glycine resin, epoxy resin, alkylbenzene resin, or polystyrene, Polycarbonate, polyethylene terephthalate, polybutylene terephthalate, modified polyphenylene ether, polyfluorene, polyparaphenylene terephthalamide, polyfluoreneimine, Thermoplastic resins such as polyimide, polyaminobiscis-butenediimide, polyethersulfopolyphenylenefluorene, polyarylate, and polyetheretherketone. The amount of the coating resin is preferably 1 to 30% by mass based on the total amount of the carbon black and the resin. By setting it to be more than the said lower limit, sufficient coverage tends to be achieved. On the other hand, by making it below the above-mentioned upper limit value, there is a tendency that the resins can be prevented from sticking to each other and the dispersibility can be optimized. The carbon black thus coated with the resin can be used as a coloring agent for a colored spacer according to a conventional method, and a color filter using the colored spacer as a constituent element can be produced by a conventional method. When such a carbon black is used, there is a tendency that a colored spacer having a high light shielding rate and a low surface reflectance can be formed at a low cost. In addition, it is also assumed that the surface of the carbon black is covered with a resin to seal Na or Ca into the carbon black. <Other colorants> In addition to the pigments (a1), (a2), and (a3) described above, the (a) colorant contained in the photosensitive coloring composition of the present invention may contain other pigments or other dyes and other colors. Agent. The color of other colorants is not particularly limited, and coloring agents such as red, orange, blue, purple, green, and yellow can be used. In addition, black pigments other than the above (a1) and (a3) may be used. As another colorant, it is preferable to use an organic pigment from the viewpoint of suppressing a decrease in the voltage retention of the liquid crystal, and suppressing the absorption of ultraviolet rays, and easily controlling the shape or step of the colored spacer. The chemical structure of other pigments is not particularly limited, and azo-based, phthalocyanine-based, quinacridone-based, benzimidazolone-based, isoindolinone-based, difluorene-based, indanthrene-based, and fluorene-based And other organic pigments, and various inorganic pigments can also be used. Hereinafter, specific examples of usable organic pigments are shown by pigment numbers. Examples of the red pigment include CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48: 1, 48: 2, 48: 3, 48: 4, 49, 49: 1, 49: 2, 50: 1, 52: 1, 52: 2, 53, 53: 1, 53: 2, 53: 3, 57, 57: 1, 57: 2, 58: 4, 60, 63, 63: 1, 63: 2, 64, 64: 1, 68, 69, 81, 81: 1, 81: 2, 81: 3, 81: 4, 83, 88, 90: 1, 101, 101: 1, 104, 108, 108: 1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 151, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 235, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276. Among these, from the viewpoint of light-shielding property and dispersibility, CI Pigment Red 48: 1, 122, 149, 168, 177, 179, 194, 202, 206, 207, 209, 224, 242, 254 can be preferably cited. , 272, and CI Pigment Red 177, 209, 224, 254, and 272 are more preferably listed, and CI Pigment Red 177, 254, and 272 are particularly preferably listed. In the case of curing by ultraviolet rays, as the red pigment, those having a lower ultraviolet absorption rate are preferably used. From this viewpoint, C.I. Pigment Red 254 and 272 are more preferable. Examples of orange pigments include CI pigment orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48. , 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79. Furthermore, in terms of dispersibility or light-shielding properties, CI pigment oranges 13, 43, 64, and 72 are preferred. In the case of curing with ultraviolet rays, it is preferable to use a low ultraviolet absorption rate as an orange pigment. From this viewpoint, CI pigment orange 64 and 72 are more preferable, and CI pigment orange 64 is more preferable. Examples of the blue pigment include CI Pigment Blue 1, 1: 2, 9, 14, 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 17, 19, 25 , 27, 28, 29, 33, 35, 36, 56, 56: 1, 61, 61: 1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78, 79 . Among these, C.I. Pigment Blue 15: 6, 16 is preferred in terms of dispersibility or light-shielding properties. Examples of the purple pigment include CI Pigment Violet 1, 1: 1,2, 2: 2, 3, 3: 1, 3: 3, 5, 5: 1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50. Among these, from the viewpoint of light-shielding properties, C.I. Pigment Violet 19, 23, and 29 can be preferably cited, and C.I. Pigment Violet 23 and 29 can be further preferably cited. Furthermore, in terms of dispersibility or light-shielding properties, CI pigment violets 23 and 29 are preferred. In the case of curing with ultraviolet rays, as a purple pigment, it is preferable to use a lower ultraviolet absorption rate. From a viewpoint, CI pigment violet 29 is more preferable. From the viewpoint of light-shielding properties, C.I. Pigment Violet 29 is also preferred. Examples of the organic coloring pigments that can be used in addition to the red pigment, orange pigment, blue pigment, and purple pigment include green pigments and yellow pigments. Examples of the green pigment include C.I. Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55. Among them, C.I. Pigment Green 7, 36 can be preferably cited. Examples of the yellow pigment include: CI Pigment Yellow 1, 1: 1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62: 1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 128, 129, 133, 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 172, 173, 174, 175, 176, 180, 181, 182, 183, 184, 185, 188, 189, 190, 191, 191: 1, 192, 193, 194, 195, 196, 197, 198, 199, 200, 202, 203, 204, 205, 206, 207, 208. Among them, from the viewpoints of dispersibility and reliability, CI Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, 185 can be preferably listed, and CI Pigment Yellow can be further preferably listed. 83, 138, 139, 150, 180. Among these, an orange pigment and / or a purple pigment are preferable from a viewpoint of light-shielding property and reliability, and a purple pigment is more preferable from a viewpoint of light-shielding property, and C.I. Pigment Violet 29 is more preferable. Examples of the black pigments other than (a1) and (a3) include acetylene black, lamp black, bone black, graphite, iron black, aniline black, cyanine black, titanium black, and perylene black. Examples of the other dyes include azo dyes, anthraquinone dyes, phthalocyanine dyes, quinimine dyes, quinoline dyes, nitro dyes, carbonyl dyes, and methine dyes. . Examples of the azo dye include: CI Acid Yellow 11, CI Acid Orange 7, CI Acid Red 37, CI Acid Red 180, CI Acid Blue 29, CI Direct Red 28, CI Direct Red 83, CI Direct Yellow 12, CI Direct Orange 26, CI Direct Green 28, CI Direct Green 59, CI Reaction Yellow 2, CI Reaction Red 17, CI Reaction Red 120, CI Reaction Black 5, CI Disperse Orange 5, CI Disperse Red 58, CI Disperse Blue 165, CI Basic Blue 41, CI Basic Red 18, CI Mordant Red 7, CI Mordant Yellow 5, CI Mordant Black 7, etc. Examples of the anthraquinone dye include CI reduction blue 4, CI acid blue 40, CI acid green 25, CI reaction blue 19, CI reaction blue 49, CI disperse red 60, CI disperse blue 56, CI disperse blue 60, and the like. . Examples of the phthalocyanine-based dyes include CI reduction blue 5 and the like, and examples of quinone imine-based dyes include CI basic blue 3 and CI basic blue 9. As quinoline dyes, for example, Examples include CI solvent yellow 33, CI acid yellow 3, CI disperse yellow 64, and the like. Examples of the nitro dye include CI acid yellow 1, CI acid orange 3, and CI disperse yellow 42. The above (a1), (a2), (a3), and other pigments are preferably used after being dispersed in such a manner that the average particle diameter is usually 1 μm or less, preferably 0.5 μm or less, and more preferably 0.25 μm or less. . Here, the standard of the average particle diameter is the number of pigment particles. In addition, the average particle diameter of a pigment is a value calculated | required from the pigment particle diameter measured by the dynamic light scattering method (DLS). The particle size measurement is performed on a sufficiently diluted photosensitive coloring composition (usually diluted to adjust the pigment concentration to about 0.005 to 0.2% by mass. Among them, if the measuring machine has its recommended concentration, it is based on this concentration), Measured at 25 ° C. <(B) Alkali-soluble resin> The (b) alkali-soluble resin used in the present invention is not particularly limited as long as it is a resin containing a carboxyl group or a hydroxyl group, and examples thereof include epoxy (meth) acrylate resins. , Acrylic resins, carboxyl-containing epoxy resins, carboxyl-containing urethane resins, novolac resins, polyvinylphenol resins, etc., among them, from the viewpoint of excellent plate-making properties, they are suitably used ( b1) epoxy (meth) acrylate resin (b2) acrylic copolymer resin. These can be used individually by 1 type or in mixture of multiple types. <(B1) epoxy (meth) acrylate resin> (b1) epoxy (meth) acrylate resin is a resin obtained by mixing an epoxy compound (epoxy resin) with α, β -The unsaturated monocarboxylic acid and / or the α, β-unsaturated monocarboxylic acid ester having a carboxyl group reacts, so that the hydroxyl group formed by the reaction in the reactant and the polybasic acid and / or its anhydride etc. have 2 More than one compound capable of reacting with a hydroxyl group is reacted. In addition, the (b1) epoxy (meth) acrylate resin also includes a resin that reacts with two or more hydroxyl groups before reacting the hydroxyl group with the polybasic acid and / or its anhydride. A resin obtained by reacting a compound having a substituent and then reacting with a polybasic acid and / or its anhydride. The (b1) epoxy (meth) acrylate resin also includes a resin obtained by reacting a carboxyl group of a resin obtained by the above reaction with a compound having a functional group capable of reacting. In this way, the epoxy (meth) acrylate resin does not substantially have an epoxy group in the chemical structure, and is not limited to "(meth) acrylate", but since the epoxy compound (epoxy resin) is used as a raw material , And "(meth) acrylate" is a representative example, so it is named as usual. As the (b1) epoxy (meth) acrylate resin used in the present invention, the following epoxy (meth) acrylate resin (b1-1) is particularly preferably used from the viewpoint of developability and reliability. ) And / or epoxy (meth) acrylate resin (b1-2) (hereinafter sometimes referred to as "carboxyl-containing epoxy (meth) acrylate resin"). <Epoxy (meth) acrylate resin (b1-1)> By adding an α, β-unsaturated monocarboxylic acid or an α, β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, and further An alkali-soluble resin obtained by reacting it with a polybasic acid and / or its anhydride. <Epoxy (meth) acrylate resin alkali-soluble resin (b1-2)> By adding an α, β-unsaturated monocarboxylic acid or an α, β-unsaturated monocarboxylic acid having a carboxyl group to an epoxy resin An ester-soluble alkali-soluble resin obtained by reacting it with a polyhydric alcohol and a polybasic acid and / or an anhydride thereof. Here, the "epoxy resin" also includes a raw material compound before the resin is formed by heat curing, and the epoxy resin can be appropriately selected and used from known epoxy resins. As the epoxy resin, a compound obtained by reacting a phenolic compound with epihalohydrin can be used. The phenolic compound is preferably a compound having a phenolic hydroxyl group of 2 or more members, and may be a monomer or a polymer. As the kind of epoxy resin used as a raw material, cresol novolac epoxy resin, phenol novolac epoxy resin, bisphenol A epoxy resin, bisphenol F epoxy resin, and triphenol can be suitably used. Methane type epoxy resin, biphenol novolac type epoxy resin, naphthol novolac type epoxy resin, epoxy resin which is a reaction product of polymerization addition reaction of dicyclopentadiene with phenol or cresol and epihalohydrin Resins, adamantyl group-containing epoxy resins, fluorene-type epoxy resins, and the like can be suitably used as having an aromatic ring in the main chain. As specific examples of the epoxy resin, for example, a bisphenol A epoxy resin (for example, "jER (registered trademark, the same below) 828", "jER1001", "jER1002", manufactured by Mitsubishi Chemical Corporation) can be suitably used. "JER1004", etc.), an epoxy resin obtained by reacting an alcoholic hydroxyl group of bisphenol A type epoxy resin with epichlorohydrin (e.g., "NER-1302" (epoxy equivalent 323 manufactured by Nippon Kayaku Co., Ltd.) , Softening point 76 ° C)), bisphenol F-type resin (such as "jER807", "EP-4001", "EP-4002", "EP-4004", etc., manufactured by Mitsubishi Chemical Corporation), Epoxy resin (such as "NER-7406" (epoxy equivalent 350, softening point 66 ° C) manufactured by Nippon Kayaku Co., Ltd.), bisphenol S type Epoxy resin, biphenyl glycidyl ether (such as "YX-4000" manufactured by Mitsubishi Chemical Corporation), phenol novolac type epoxy resin (such as "EPPN-201" manufactured by Nippon Kayaku Co., Ltd., "" "EP-152", "EP-154", "DEN-438" manufactured by Dow Chemical Co., Ltd., (o- / m- / p-cresol) Varnish-type epoxy resin (e.g. "EOCN (registered trademark, the same below) -102S", "EOCN-1020", "EOCN-104S") manufactured by Nippon Kayaku Co., Ltd. "TEPIC (registered trademark)" manufactured by the company), triphenol methane epoxy resin (such as "EPPN (registered trademark, the same below) -501", "EPPN-502", "EPPN-503" manufactured by Nippon Kayaku Co., Ltd. "), Alicyclic epoxy resin (" Celloxide (registered trademark, the same below) 2021P "," Celloxide EHPE "manufactured by Diacel), glycidol of phenol resin obtained by the reaction of dicyclopentadiene and phenol Basic epoxy resin (such as "EXA-7200" manufactured by DIC Corporation, "NC-7300" manufactured by Nippon Kayaku Co., Ltd.), and epoxy resins represented by the following general formulae (B1) to (B4) Wait. Specifically, as the epoxy resin represented by the following general formula (B1), "XD-1000" manufactured by Nippon Kayaku Co., Ltd., and as the epoxy resin represented by the following general formula (B2), As the "NC-3000" manufactured by Nippon Kayaku Co., Ltd., as the epoxy resin represented by the following general formula (B4), "ESF-300" manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd. can be cited. [Chemical 6]In the above general formula (B1), a is an average value, and represents a number from 0 to 10, and R is111 Each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. Furthermore, there are plural Rs in one molecule.111 They may be the same or different. [Chemical 7]In the above general formula (B2), b is an average value, and represents a number from 0 to 10, and R is121 Each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. Furthermore, there are plural Rs in one molecule.121 They may be the same or different. [Chemical 8]In the general formula (B3), X represents a linking group represented by the following general formula (B3-1) or (B3-2). Among them, the molecular structure includes one or more adamantane structures. c represents 2 or 3. [Chemical 9]In the general formulae (B3-1) and (B3-2), R131 ~ R134 And R135 ~ R137 Each independently represents an adamantyl group which may have a substituent, a hydrogen atom, an alkyl group having 1 to 12 carbon atoms which may have a substituent, or a phenyl group which may have a substituent, and * represents a bonding bond. [Chemical 10]In the general formula (B4), p and q each independently represent an integer of 0 to 4, and R141 And R142 Each independently represents an alkyl or halogen atom having 1 to 4 carbon atoms, and R143 And R144 Each independently represents an alkylene group having 1 to 4 carbon atoms, and x and y each independently represent an integer of 0 or more. Among these, it is preferable to use an epoxy resin represented by any one of the general formulae (B1) to (B4). Examples of the α, β-unsaturated monocarboxylic acid or an α, β-unsaturated monocarboxylic acid having a carboxyl group include (meth) acrylic acid, butenoic acid, o-, m- or p-vinylbenzoic acid, (methyl Mono-carboxylic acids such as α-haloalkyl, alkoxy, halogen, nitro, and cyano substituents of acrylic acid, 2- (meth) acryloxyethyl succinate, and 2- (methyl adipate) ) Acrylic ethoxyethyl, 2- (meth) acrylic ethoxyethyl phthalate, 2- (meth) acrylic ethoxyethyl hexahydrophthalate, maleic acid 2- (meth) acryloxyethyl ester, 2- (meth) acryloxypropyl succinate, 2- (meth) acryloxypropyl adipate, tetrahydrophthalic acid 2- (meth) acryloxypropyl propyl, 2- (meth) acryloxypropyl phthalate, maleic acid 2- (meth) acryloxypropyl, succinic acid 2- (meth) acryloxybutyl butyl, 2- (meth) acryloxybutyl adipate, 2- (meth) acryloxybutyl hydrophthalate, phthalate 2- (meth) acrylic acid oxybutyl formate, 2- (meth) acrylic acid oxybutyl maleate, p- (meth) acrylic acid addition ε- Lactone, β-propiolactone, γ-butyrolactone, δ-valerolactone and other lactones, or hydroxyalkyl (meth) acrylate, pentaerythritol tri (meth) acrylate A monomer obtained by adding an acid (anhydride) such as succinic acid (anhydride), phthalic acid (anhydride), maleic acid (anhydride), and a (meth) acrylic acid dimer. Among these, (meth) acrylic acid is particularly preferable in terms of sensitivity. As a method for adding an α, β-unsaturated monocarboxylic acid or an α, β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, a known method can be adopted. For example, an α, β-unsaturated monocarboxylic acid or an α, β-unsaturated monocarboxylic acid ester having a carboxyl group can be reacted with an epoxy resin in the presence of an esterification catalyst at a temperature of 50 to 150 ° C. . Here, as the esterification catalyst to be used, tertiary amines such as triethylamine, trimethylamine, benzyldimethylamine, benzyldiethylamine, tetramethylammonium chloride, and chlorine can be used. Tetraethylammonium salts such as tetraethylammonium chloride and dodecyltrimethylammonium chloride. In addition, as for each component of the epoxy resin, the α, β-unsaturated monocarboxylic acid or the α, β-unsaturated monocarboxylic acid having a carboxyl group, and the esterification catalyst, only one type may be selected and used, respectively. Use 2 or more types together. Regarding the amount of α, β-unsaturated monocarboxylic acid or α, β-unsaturated monocarboxylic acid ester having a carboxyl group, it is preferably in the range of 0.5 to 1.2 equivalents relative to 1 equivalent of the epoxy group of the epoxy resin. A more preferable range is 0.7 to 1.1 equivalents. By setting the amount of the α, β-unsaturated monocarboxylic acid or the α, β-unsaturated monocarboxylic acid ester having a carboxyl group to be equal to or more than the above-mentioned lower limit, there is a problem that the amount of the unsaturated group introduced can be suppressed, and it is easy The tendency for the subsequent reaction with the polybasic acid and / or its anhydride to proceed sufficiently. On the other hand, by making it below the above-mentioned upper limit value, it is possible to suppress the residue of unreacted α, β-unsaturated monocarboxylic acid or α, β-unsaturated monocarboxylic acid ester having a carboxyl group, and it is easy to optimize hardening. Characteristic tendency. Examples of the polybasic acid and / or its anhydride include those selected from maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, Trimellitic acid, benzophenone tetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chloramphenic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid One kind or two or more kinds of acids and anhydrides thereof. Preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid. , Or such anhydrides. Particularly preferred is tetrahydrophthalic acid, biphenyltetracarboxylic acid, tetrahydrophthalic anhydride, or biphenyltetracarboxylic dianhydride. Regarding the addition reaction of a polybasic acid and / or its anhydride, a well-known method can also be used. Under the same conditions as the ester addition reaction, the reaction was continued to obtain the target substance. Regarding the addition amount of the polybasic acid and / or its anhydride component, it is preferable that the acid value of the carboxyl-containing epoxy (meth) acrylate resin to be produced is in the range of about 10 to 150 mgKOH / g, and further It is preferable to set the acid value in the range of about 20 to 140 mgKOH / g. When it is more than the said lower limit value, there exists a tendency for alkaline developability to become favorable, and when it is below the said upper limit value, there exists a tendency for hardening performance to become favorable. In addition, during the addition reaction of the polybasic acid and / or its anhydride, a polyfunctional alcohol (polyol) such as trimethylolpropane, pentaerythritol, and dipentaerythritol may be added to prepare a multi-branched structure. A carboxyl group-containing epoxy (meth) acrylate resin is usually obtained by reacting an epoxy resin with an α, β-unsaturated monocarboxylic acid or an α, β-unsaturated monocarboxylic acid having a carboxyl group. After the polybasic acid and / or its anhydride are mixed in the mixture, or the polybasic acid and / After heating it or its anhydride and polyfunctional alcohol. In this case, the mixing order of the polybasic acid and / or its anhydride and the polyfunctional alcohol is not particularly limited. By heating, any hydroxyl group present in a mixture of an epoxy resin with an α, β-unsaturated monocarboxylic acid or a reactant of an α, β-unsaturated monocarboxylic acid ester having a carboxyl group and a polyfunctional alcohol is heated. The polyacid and / or its anhydride undergo an addition reaction with it. Examples of the epoxy (meth) acrylate resin include those described in Korean Laid-Open Patent Publication No. 10-2013-0022955 in addition to the above. The polystyrene-equivalent weight average molecular weight (Mw) of the epoxy (meth) acrylate resin measured by gel permeation chromatography (GPC) is generally 1,000 or more, preferably 1500 or more, and more preferably 2,000 or more, more preferably 3,000 or more, even more preferably 4,000 or more, particularly preferably 5,000 or more, and usually 10,000 or less, preferably 8,000 or less, and more preferably 7,000 or less. By setting it to be above the lower limit value, the solubility in the developing solution tends to be prevented from becoming too high. By setting it to be less than the above upper limit value, the solubility in the developing solution is likely to be made good. The tendency. For example, as a combination of the upper limit and the lower limit, 1,000 to 10,000 may be preferably listed, 1500 to 8000 may be more preferable, 2000 to 8000 may be further preferably listed, and 3000 to 8000 may be even more preferably listed, and particularly preferably 4000 to 8000 are listed, and 5000 to 7000 is most preferably listed. The acid value of the epoxy (meth) acrylate resin is not particularly limited, but it is preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more, even more preferably 40 mgKOH / g or more, and even more preferably 50 mgKOH / g or more, more preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, still more preferably 120 mgKOH / g or less, and even more preferably 100 mgKOH / g or less. When it is set to the above lower limit value or more, a moderate development solubility tends to be obtained, and when it is set to the above upper limit value or less, the film dissolution tends to be suppressed due to excessive development. For example, as a combination of the upper limit and the lower limit, 10 to 200 mgKOH / g is preferable, 20 to 150 mgKOH / g is more preferable, and 40 to 100 mgKOH / g is more preferable, and more preferably, 50 ～ 100 mgKOH / g. The chemical structure of the epoxy (meth) acrylate resin is not particularly limited. From the viewpoint of developability and reliability, it is preferable to contain a ring having a partial structure represented by the following general formula (b1-I). An oxygen (meth) acrylate resin (hereinafter sometimes simply referred to as "(b1-I) epoxy (meth) acrylate resin") and / or a portion represented by the following general formula (b1-II) An epoxy (meth) acrylate resin having a structure (hereinafter sometimes simply referred to as "(b1-II) epoxy (meth) acrylate resin"). [Chemical 11]In formula (b1-I), R11 Represents a hydrogen atom or a methyl group, R12 Represents a divalent hydrocarbon group which may have a substituent, and * represents a bonding bond. The benzene ring in the formula (b1-I) may be further substituted with an arbitrary substituent. [Chemical 12]In formula (b1-II), R13 Each independently represents a hydrogen atom or a methyl group, and R14 Represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain, R15 And R16 Each independently represents a divalent aliphatic group which may have a substituent, m and n each independently represent an integer of 0 to 2, and * represents a bonding bond. <(B1-I) epoxy (meth) acrylate resin> First, the epoxy (meth) acrylate resin which has the said partial structure represented by General formula (b1-I) is demonstrated in detail. [Chemical 13]In formula (b1-I), R11 Represents a hydrogen atom or a methyl group, R12 Represents a divalent hydrocarbon group which may have a substituent, and * represents a bonding bond. The benzene ring in the formula (b1-I) may be further substituted with an arbitrary substituent. (R12 ) In the above formula (b1-I), R12 Represents a divalent hydrocarbon group which may have a substituent. Examples of the divalent hydrocarbon group include a divalent aliphatic group, a divalent aromatic ring group, and a group in which one or more divalent aliphatic groups are connected to one or more divalent aromatic ring groups. Examples of the divalent aliphatic group include a linear, branched, and cyclic one. Among these, a linear one is preferable from a viewpoint of developing solubility. On the other hand, from the viewpoint of reducing the penetration of the developer into the exposed portion, a ring shape is preferred. Its carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, and more preferably 20 or less, more preferably 15 or less, and even more preferably 10 or less. When it is at least the above-mentioned lower limit value, it is easy to obtain a strong film, it is difficult to produce surface roughness, and the adhesiveness to the substrate is good. When it is at most the above-mentioned upper limit value, it is easy to suppress the deterioration of sensitivity. Or it is suppressed that the film is reduced during development and the resolution tends to be improved. For example, as a combination of the upper limit and the lower limit, 1 to 20 are more preferable, 3 to 15 are more preferable, and 6 to 10 are more preferable. Specific examples of the divalent linear aliphatic group include a methylene group, an ethyl group, an orthopropyl group, an orthobutyl group, an orthopentyl group, an orthohexyl group, or an orthoheptyl group. Among these, a methylene group is preferable from a viewpoint of rigidity of a skeleton. Examples of the divalent branched aliphatic group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, and second butyl groups on the divalent linear aliphatic group. And a third butyl group as a side chain structure. The number of rings of the divalent cyclic aliphatic group is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 12 or less, and preferably 10 or less. By setting it to be above the lower limit value, the film tends to be strong and the substrate adhesion is good. By setting it to be less than the upper limit value, it is easy to suppress sensitivity degradation or suppress film reduction during development. Imaging tends to improve. Specific examples of the divalent cyclic aliphatic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norane ring, an isoane ring, an adamantane ring, and a cyclodeca ring. Dialkyl ring, dicyclopentadiene and other rings obtained by removing two hydrogen atoms. Among these, from the viewpoint of rigidity of the skeleton, a group obtained by removing two hydrogen atoms from a dicyclopentadiene ring and an adamantane ring is preferred. Examples of the substituent which the divalent aliphatic group may have include an alkoxy group having 1 to 5 carbon atoms such as a methoxy group and an ethoxy group; a hydroxyl group; a nitro group; a cyano group; a carboxyl group and the like. Among these, from the viewpoint of easy synthesis, it is preferably unsubstituted. Examples of the divalent aromatic ring group include a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group. The carbon number is usually 4 or more, preferably 5 or more, more preferably 6 or more, and more preferably 20 or less, more preferably 15 or less, and even more preferably 10 or less. When it is at least the above-mentioned lower limit value, it is easy to obtain a strong film, it is difficult to produce surface roughness, and the adhesiveness to the substrate is good. When it is at most the above-mentioned upper limit value, it is easy to suppress the deterioration of sensitivity. Or, the film is reduced during development and the resolution tends to be improved. For example, as a combination of the upper limit and the lower limit, 4 to 20 are preferable, 5 to 15 are more preferable, and 6 to 10 are more preferable. The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a monocyclic ring or a condensed ring. Examples of the aromatic hydrocarbon ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorene ring, a condensed tetraphenyl ring, a fluorene ring, a benzofluorene ring, a fluorene ring, and a biphenyl ring having two free atomic valences. Triphenylene ring, ethane naphthalene ring, fluoranthene ring, fluorene ring, etc. The aromatic heterocyclic ring in the aromatic heterocyclic group may be a monocyclic ring or a condensed ring. Examples of the aromatic heterocyclic group include a furan ring having two free atomic valences, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, an oxadiazole ring, and an indene. Indole ring, carbazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furanopyrrole ring, furanofuran ring, thienofuran ring, benzo Isoxazole ring, benzoisothiazolyl ring, benzimidazole ring, pyridine ring, pyridine ring, data ring, pyrimidine ring, tricyclic ring, quinoline ring, isoquinoline ring, oxoline ring, quinoline ring, brown Pyrimidine ring, benzimidazole ring, pyrimidine ring, quinazoline ring, quinazolinone ring, fluorene ring and the like. Among these, from the viewpoint of patterning characteristics, a benzene ring or a naphthalene ring having two free atomic valences is preferred, and a benzene ring having two free atomic valences is more preferred. Examples of the substituent which the divalent aromatic ring group may have include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. Among these, from the viewpoint of developing solubility, it is preferably unsubstituted. Further, examples of the group obtained by linking one or more divalent aliphatic groups and one or more divalent aromatic ring groups include one or more of the above-mentioned divalent aliphatic groups and one or more of the aforementioned two A group in which a valence aromatic ring group is connected. The number of divalent aliphatic groups is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. When it is at least the above-mentioned lower limit value, it is easy to obtain a strong film, it is difficult to produce surface roughness, and the adhesiveness to the substrate is good. When it is at most the above-mentioned upper limit value, it is easy to suppress the deterioration of sensitivity. Or, the film is reduced during development and the resolution tends to be improved. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, 2 to 5 are more preferable, and 2 to 3 are more preferable. The number of divalent aromatic ring groups is not particularly limited, but it is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. When it is at least the above-mentioned lower limit value, it is easy to obtain a strong film, it is difficult to produce surface roughness, and the adhesiveness to the substrate is good. When it is at most the above-mentioned upper limit value, it is easy to suppress the deterioration of sensitivity. Or, the film is reduced during development and the resolution tends to be improved. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, 2 to 5 are more preferable, and 2 to 3 are more preferable. Specific examples of the group in which one or more divalent aliphatic groups are connected to one or more divalent aromatic ring groups include the following formulae (b1-IA) to (b1-IF) Base etc. Among these, a base represented by the following formula (b1-I-A) is preferable from the viewpoint of rigidity of the skeleton and hydrophobicity of the membrane. [Chemical 14]As described above, the benzene ring in the formula (b1-I) may be further substituted with an arbitrary substituent. Examples of the substituent include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. The number of substituents is also not particularly limited, and may be one or two or more. Among these, from the viewpoint of patterning characteristics, it is preferably unsubstituted. In addition, the partial structure represented by the formula (b1-I) is preferably a partial structure represented by the following formula (b1-I-1) in terms of ease of synthesis. [Chemical 15]In formula (b1-I-1), R11 And R12 Has the same meaning as in the above formula (b1-I), RX Indicates a hydrogen atom or a polyacid residue, and * indicates a bonding bond. The benzene ring in the formula (b1-I-1) may be further substituted with an arbitrary substituent. The polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or an anhydride thereof. Examples of the polybasic acid include those selected from the group consisting of maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid , Benzophenone tetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chloramphenic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid One or two or more. Among these, from the viewpoint of patterning characteristics, maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, Pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid, more preferably tetrahydrophthalic acid, biphenyltetracarboxylic acid, and biphenyltetracarboxylic acid. The partial structure represented by the formula (b1-I-1) contained in one molecule of the (b1-I) epoxy (meth) acrylate resin may be one type, or two or more types. For example, RX For hydrogen atom and RX Those that are polyacid residues can be mixed. The number of partial structures represented by the above formula (b1-I) contained in one molecule of (b1-I) epoxy (meth) acrylate resin is not particularly limited, but it is preferably 1 or more, and more preferably It is 3 or more, 20 or less is more preferable, and 15 or less is more preferable. When it is set to the above lower limit value, it is easy to obtain a firm film, and it is difficult to produce surface roughness. When it is set to the above upper limit value, it is easy to suppress sensitivity degradation or to suppress film reduction during development, and resolution Sex tends to improve. For example, as a combination of the upper limit and the lower limit, 1 to 20 is preferable, and 3 to 15 is more preferable. (b1-I) Epoxy (meth) acrylate resin The weight average molecular weight (Mw) in terms of polystyrene measured by gel permeation chromatography (GPC) is not particularly limited, but is preferably 1,000. Above, more preferably 1500 or more, further preferably 2,000 or more, even more preferably 3,000 or more, even more preferably 4,000 or more, most preferably 5,000 or more, still more preferably 30,000 or less, more preferably 20,000 or less, and more preferably It is preferably below 10,000, particularly preferably below 8000. When it is more than the said lower limit value, the residual film rate of a photosensitive coloring composition will tend to become favorable, and when it is below the said upper limit value, the resolvability will become favorable. For example, as a combination of the upper limit and the lower limit, 1,000 to 30,000 can be preferably listed, 1500 to 20,000 can be more preferably, 2,000 to 10,000 can be further preferably, and 3,000 to 10,000 can be even more preferably, particularly preferably. The columns are 4000 to 80,000, and 5000 to 8000 are the best examples. (b1-I) The acid value of the epoxy (meth) acrylate resin is not particularly limited, but preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more, and even more preferably 40 mgKOH / g or more , And more preferably 50 mgKOH / g or more, more preferably 80 mgKOH / g or more, more preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, and still more preferably 130 mgKOH / g or less, Especially preferred is 100 mgKOH / g or less. When it is more than the said lower limit, development solubility will improve and resolution will become favorable, and when it is below the said upper limit, the residual film rate of a photosensitive coloring composition will become favorable. The tendency. For example, as a combination of the upper limit and the lower limit, 10 to 200 mgKOH / g may be preferably listed, 20 to 150 mgKOH / g may be more preferably listed, and 40 to 100 mgKOH / g may be more preferably listed. 50 to 100 mgKOH / g is enumerated, and preferably 80 to 100 mgKOH / g is enumerated. Specific examples of the (b1-I) epoxy (meth) acrylate resin are listed below. Furthermore, * in the example indicates a bond key. [Chemical 16][Chemical 17][Chemical 18][Chemical 19]<(B1-II) epoxy (meth) acrylate resin> Next, the epoxy (meth) acrylate resin which has the said partial structure represented by General formula (b1-II) is demonstrated in detail. [Chemical 20]In formula (b1-II), R13 Each independently represents a hydrogen atom or a methyl group, and R14 Represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain, R15 And R16 Each independently represents a divalent aliphatic group which may have a substituent, m and n each independently represent an integer of 0 to 2, and * represents a bonding bond. (R14 ) In the general formula (b1-II), R14 A divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. Examples of the cyclic hydrocarbon group include an aliphatic cyclic group and an aromatic cyclic group. The number of rings of the aliphatic cyclic group is not particularly limited, but it is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. When it is set to the above lower limit value, it is easy to obtain a firm film, and it is difficult to produce surface roughness. When it is set to the above upper limit value, it is easy to suppress sensitivity degradation or to suppress film reduction during development, and resolution Sex tends to improve. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, 2 to 5 are more preferable, and 2 to 3 are more preferable. The number of carbon atoms of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and more preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, particularly preferably 15 or less. When it is set to the above lower limit value, it is easy to obtain a firm film, and it is difficult to produce surface roughness. When it is set to the above upper limit value, it is easy to suppress sensitivity degradation or to suppress film reduction during development, and resolution Sex tends to improve. For example, as a combination of the upper limit and the lower limit, 4 to 40 are preferable, 6 to 30 are more preferable, and 8 to 20 are more preferable. Specific examples of the aliphatic ring in the aliphatic cyclic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isoane ring, an adamantane ring, Cyclododecane ring and the like. Among these, an adamantane ring is preferable from a viewpoint of the residual-film rate and resolvability of a photosensitive coloring composition. On the other hand, the number of rings in the aromatic ring group is not particularly limited, but it is usually 1 or more, preferably 2 or more, more preferably 3 or more, and usually 10 or less, preferably 5 or less, more Preferably it is 4 or less. When it is set to the above lower limit value, it is easy to obtain a firm film, and it is difficult to produce surface roughness. When it is set to the above upper limit value, it is easy to suppress sensitivity degradation or to suppress film reduction during development, and resolution Sex tends to improve. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, 2 to 5 are more preferable, and 3 to 4 are more preferable. Examples of the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. The carbon number of the aromatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, still more preferably 10 or more, even more preferably 12 or more, and still more preferably 40 or less, more preferably 30 or less, more preferably 20 or less, and particularly preferably 15 or less. When it is more than the said lower limit value, a strong film is easy to be obtained, and surface roughness is less likely to occur, and when it is less than the said upper limit value, there exists a tendency for patterning characteristics to become favorable. For example, as a combination of the upper limit and the lower limit, 4 to 40 are preferable, 6 to 30 are more preferable, 8 to 20 are more preferable, and 10 to 15 are particularly preferable. Specific examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorene ring, a fused tetraphenyl ring, a fluorene ring, a benzofluorene ring, a fluorene ring, and a triphenylene ring. Benzene ring, ethane naphthalene ring, fluoranthene ring, fluorene ring, etc. Among these, from a viewpoint of a patterning characteristic, a ring is preferable. The divalent hydrocarbon group in the divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain is not particularly limited, and examples thereof include a divalent aliphatic group, a divalent aromatic ring group, and one or more divalent aliphatic groups. A group connected to one or more divalent aromatic ring groups. Examples of the divalent aliphatic group include a linear, branched, and cyclic one. Among these, a linear one is preferred from the viewpoint of development solubility, and a circular one is preferred from the viewpoint of reducing the penetration of the developer into the exposed portion. Its carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, and more preferably 25 or less, more preferably 20 or less, and even more preferably 15 or less. When it is at least the above-mentioned lower limit value, it is easy to obtain a strong film, it is difficult to produce surface roughness, and the adhesiveness to the substrate is good. When it is at most the above-mentioned upper limit value, it is easy to suppress the deterioration of sensitivity. Or, the film is reduced during development and the resolution tends to be improved. For example, as a combination of the upper limit and the lower limit, 1 to 25 are preferable, 3 to 20 are more preferable, and 6 to 15 are more preferable. Specific examples of the divalent linear aliphatic group include a methylene group, an ethyl group, an orthopropyl group, an orthobutyl group, an orthopentyl group, an orthohexyl group, or an orthoheptyl group. Among these, a methylene group is preferable from a viewpoint of rigidity of a skeleton. Examples of the divalent branched aliphatic group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, and second butyl groups on the divalent linear aliphatic group. And a third butyl group as a side chain structure. The number of rings of the divalent cyclic aliphatic group is not particularly limited, but it is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and further preferably 3 or less. By setting it to be above the lower limit value, the film tends to be strong and the substrate adhesion is good. By setting it to be less than the upper limit value, it is easy to suppress sensitivity degradation or suppress film reduction during development. Imaging tends to improve. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, 2 to 5 are more preferable, and 2 to 3 are more preferable. Specific examples of the divalent cyclic aliphatic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norane ring, an isoane ring, an adamantane ring, and a cyclodeca Dioxane ring and other rings obtained by removing two hydrogen atoms. Among these, from the viewpoint of the rigidity of the skeleton, a group obtained by removing two hydrogen atoms from the adamantane ring is preferred. Examples of the substituent which the divalent aliphatic group may have include an alkoxy group having 1 to 5 carbon atoms such as a methoxy group and an ethoxy group; a hydroxyl group; a nitro group; a cyano group; a carboxyl group and the like. Among these, from the viewpoint of easy synthesis, it is preferably unsubstituted. Examples of the divalent aromatic ring group include a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group. Its carbon number is usually 4 or more, preferably 5 or more, more preferably 6 or more, and further preferably 30 or less, more preferably 20 or less, and even more preferably 15 or less. When it is at least the above-mentioned lower limit value, it is easy to obtain a strong film, it is difficult to produce surface roughness, and the adhesiveness to the substrate is good. When it is at most the above-mentioned upper limit value, it is easy to suppress the deterioration of sensitivity. Or, the film is reduced during development and the resolution tends to be improved. For example, as a combination of the upper limit and the lower limit, 4 to 30 are preferable, 5 to 20 are more preferable, and 6 to 15 are more preferable. The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a monocyclic ring or a condensed ring. Examples of the aromatic hydrocarbon ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorene ring, a condensed tetraphenyl ring, a fluorene ring, a benzofluorene ring, a fluorene ring, and a biphenyl ring having two free atomic valences. Triphenylene ring, ethane naphthalene ring, fluoranthene ring, fluorene ring, etc. The aromatic heterocyclic ring in the aromatic heterocyclic group may be a monocyclic ring or a condensed ring. Examples of the aromatic heterocyclic group include a furan ring having two free atomic valences, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, an oxadiazole ring, and an indene. Indole ring, carbazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furanopyrrole ring, furanofuran ring, thienofuran ring, benzo Isoxazole ring, benzoisothiazolyl ring, benzimidazole ring, pyridine ring, pyridine ring, data ring, pyrimidine ring, tricyclic ring, quinoline ring, isoquinoline ring, oxoline ring, quinoline ring, brown Pyrimidine ring, benzimidazole ring, pyrimidine ring, quinazoline ring, quinazolinone ring, fluorene ring and the like. Among these, from the viewpoint of patterning characteristics, a benzene ring or a naphthalene ring having two free atomic valences is preferred, and a benzene ring having two free atomic valences is more preferred. Examples of the substituent which the divalent aromatic ring group may have include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. Among these, from the viewpoint of developing solubility, it is preferably unsubstituted. Further, examples of the group obtained by linking one or more divalent aliphatic groups and one or more divalent aromatic ring groups include one or more of the above-mentioned divalent aliphatic groups and one or more of the aforementioned two A group in which a valence aromatic ring group is connected. The number of divalent aliphatic groups is not particularly limited, but it is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. When it is at least the above-mentioned lower limit value, it is easy to obtain a strong film, it is difficult to produce surface roughness, and the adhesiveness to the substrate is good. When it is at most the above-mentioned upper limit value, it is easy to suppress the deterioration of sensitivity. Or, the film is reduced during development and the resolution tends to be improved. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, 2 to 5 are more preferable, and 2 to 3 are more preferable. The number of divalent aromatic ring groups is not particularly limited, but it is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. When it is at least the above-mentioned lower limit value, it is easy to obtain a strong film, it is difficult to produce surface roughness, and the adhesiveness to the substrate is good. When it is at most the above-mentioned upper limit value, it is easy to suppress the deterioration of sensitivity. Or, the film is reduced during development and the resolution tends to be improved. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, 2 to 5 are more preferable, and 2 to 3 are more preferable. Specific examples of the group in which one or more divalent aliphatic groups are connected to one or more divalent aromatic ring groups include the groups represented by the formulae (b1-IA) to (b1-IF). Wait. Among these, from the viewpoint of the rigidity of the skeleton and the hydrophobicity of the membrane, the base represented by the above formula (b1-I-C) is preferred. The cyclic hydrocarbon as a side chain is not particularly limited based on the bonding state on the divalent hydrocarbon group, and examples thereof include a state in which one hydrogen atom of an aliphatic group or an aromatic ring group is substituted with the side chain, Alternatively, one carbon atom of an aliphatic group is included to form a cyclic hydrocarbon group as a side chain. (R15 , R16 ) In the general formula (b1-II), R15 And R16 Each independently represents a divalent aliphatic group which may have a substituent. Examples of the divalent aliphatic group include a linear, branched, and cyclic one. Among these, a linear one is preferred from the viewpoint of development solubility, and a circular one is preferred from the viewpoint of reducing the penetration of the developer into the exposed portion. Its carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, and more preferably 20 or less, more preferably 15 or less, and even more preferably 10 or less. When it is at least the above-mentioned lower limit value, it is easy to obtain a strong film, it is difficult to produce surface roughness, and the adhesiveness to the substrate is good. When it is at most the above-mentioned upper limit value, it is easy to suppress the deterioration of sensitivity. Or, the film is reduced during development and the resolution tends to be improved. For example, as a combination of the upper limit and the lower limit, 1 to 20 may be preferably used, 3 to 15 may be more preferably used, and 6 to 10 may be more preferably used. Specific examples of the divalent linear aliphatic group include a methylene group, an ethyl group, an orthopropyl group, an orthobutyl group, an orthopentyl group, an orthohexyl group, or an orthoheptyl group. Among these, a methylene group is preferable from a viewpoint of rigidity of a skeleton. Examples of the divalent branched aliphatic group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, and second butyl groups on the divalent linear aliphatic group. And a third butyl group as a side chain structure. The number of rings of the divalent cyclic aliphatic group is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 12 or less, and preferably 10 or less. By setting it to be above the lower limit value, the film tends to be strong and the substrate adhesion is good. By setting it to be less than the upper limit value, it is easy to suppress sensitivity degradation or suppress film reduction during development. Imaging tends to improve. For example, as a combination of the upper limit and the lower limit, 1 to 12 are preferable, and 2 to 10 are more preferable. Specific examples of the divalent cyclic aliphatic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norane ring, an isoane ring, an adamantane ring, and a cyclodeca ring. Dialkyl ring, dicyclopentadiene and other rings obtained by removing two hydrogen atoms. Among these, from the viewpoint of rigidity of the skeleton, a group obtained by removing two hydrogen atoms from a dicyclopentadiene ring and an adamantane ring is preferred. Examples of the substituent which the divalent aliphatic group may have include an alkoxy group having 1 to 5 carbon atoms such as a methoxy group and an ethoxy group; a hydroxyl group; a nitro group; a cyano group; a carboxyl group and the like. Among these, from the viewpoint of easy synthesis, it is preferably unsubstituted. (m, n) In the general formula (b1-II), m and n each independently represent an integer of 0 to 2. When it is more than the said lower limit, patterning suitability will become favorable, and it will become difficult to produce surface roughness, and when it is below the said upper limit, there exists a tendency for developability to become favorable. From the viewpoint of developability, m and n are preferably 0. On the other hand, m and n are preferably 1 or more from the viewpoint of patterning suitability and rough surface. The partial structure represented by the general formula (b1-II) is preferably a partial structure represented by the following general formula (b1-II-1) from the viewpoint of adhesion to a substrate. [Chemical 21]In formula (b1-II-1), R13 , R15 , R16 , M and n have the same meanings as in the above formula (b1-II), Rα Represents a monovalent cyclic hydrocarbon group which may have a substituent, p is an integer of 1 or more, and * represents a bonding bond. The benzene ring in the formula (b1-II-1) may be further substituted with an arbitrary substituent. (Rα ) In the general formula (b1-II-1), Rα A monovalent cyclic hydrocarbon group which may have a substituent. Examples of the cyclic hydrocarbon group include an aliphatic cyclic group and an aromatic cyclic group. The number of rings of the aliphatic cyclic group is not particularly limited, but it is usually 1 or more, preferably 2 or more, and usually 6 or less, preferably 4 or less, and more preferably 3 or less. When it is more than the said lower limit value, a strong film is easy to be obtained, and surface roughness is less likely to occur, and when it is less than the said upper limit value, there exists a tendency for patterning characteristics to become favorable. For example, as a combination of the upper limit and the lower limit, 1 to 6 are preferable, 2 to 4 are more preferable, and 2 to 3 are more preferable. The number of carbon atoms of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and more preferably 40 or less, more preferably 30 or less, even more preferably 20 or less, particularly preferably 15 or less. When it is more than the said lower limit value, a strong film is easy to be obtained, and surface roughness is less likely to occur, and when it is less than the said upper limit value, there exists a tendency for patterning characteristics to become favorable. For example, as a combination of the upper limit and the lower limit, 4 to 40 are preferable, 6 to 30 are more preferable, 8 to 20 are more preferable, and 8 to 15 are particularly preferable. Specific examples of the aliphatic ring in the aliphatic cyclic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isoane ring, an adamantane ring, Cyclododecane ring and the like. Among these, an adamantane ring is preferred from the viewpoint of firm film characteristics. On the other hand, the number of rings in the aromatic ring group is not particularly limited, but it is usually 1 or more, preferably 2 or more, more preferably 3 or more, and usually 10 or less, and preferably 5 or less. When it is more than the said lower limit value, a strong film is easy to be obtained, and surface roughness is less likely to occur, and when it is less than the said upper limit value, there exists a tendency for patterning characteristics to become favorable. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, 2 to 5 are more preferable, and 3 to 5 are more preferable. Examples of the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. The number of carbon atoms of the aromatic ring group is usually 4 or more, preferably 5 or more, more preferably 6 or more, still more preferably 30 or less, more preferably 20 or less, and even more preferably 15 or less. When it is more than the said lower limit value, a strong film is easy to be obtained, and surface roughness is less likely to occur, and when it is less than the said upper limit value, there exists a tendency for patterning characteristics to become favorable. For example, as a combination of the upper limit and the lower limit, 4 to 30 are preferable, 5 to 20 are more preferable, and 6 to 15 are more preferable. Specific examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and a fluorene ring. Among these, from the standpoint of development solubility, fluorene ring is preferred. Examples of the substituent which the cyclic hydrocarbon group may have include carbon numbers such as methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, third butyl, pentyl, and isopentyl. Alkyl groups of 1 to 5; alkoxy groups of 1 to 5 carbons such as methoxy and ethoxy; hydroxyl groups; nitro groups; cyano groups; carboxyl groups and the like. Among these, from the viewpoint of easy synthesis, it is preferably unsubstituted. p represents an integer of 1 or more, preferably 2 or more, and more preferably 3 or less. When it is more than the said lower limit value, there exists a tendency for a film hardening degree and a residual film rate to become favorable, and when it is less than the said upper limit value, there exists a tendency for developability to become favorable. For example, as a combination of the upper limit and the lower limit, 1 to 3 is preferable, and 2 to 3 is more preferable. Among these, from the viewpoint of a firm film hardening degree, Rα A monovalent aliphatic cyclic group is preferred, and adamantyl is more preferred. As described above, the benzene ring in the formula (b1-II-1) may be further substituted with an arbitrary substituent. Examples of the substituent include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. The number of substituents is also not particularly limited, and may be one or two or more. Among these, from the viewpoint of patterning characteristics, it is preferably unsubstituted. Specific examples of the partial structure represented by the above formula (b1-II-1) are listed below. [Chemical 22][Chemical 23][Chemical 24][Chemical 25][Chemical 26]The partial structure represented by the general formula (b1-II) is preferably a partial structure represented by the following general formula (b1-II-2) from the viewpoints of rigidity of the skeleton and hydrophobicity of the membrane. [Chemical 27]In formula (b1-II-2), R13 , R15 , R16 , M and n have the same meanings as in the above formula (b1-II), Rβ Represents a divalent cyclic hydrocarbon group which may have a substituent, and * represents a bond. The benzene ring in the formula (b1-II-2) may be further substituted with an arbitrary substituent. (Rβ ) In the formula (b1-II-2), Rβ Represents a divalent cyclic hydrocarbon group which may have a substituent. Examples of the cyclic hydrocarbon group include an aliphatic cyclic group and an aromatic cyclic group. The number of rings of the aliphatic cyclic group is not particularly limited, but it is usually 1 or more, preferably 2 or more, and usually 10 or less, and preferably 5 or less. When it is set to the above lower limit value, it is easy to obtain a firm film, and it is difficult to produce surface roughness. When it is set to the above upper limit value, it is easy to suppress sensitivity degradation or to suppress film reduction during development, and resolution Sex tends to improve. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, and 2 to 5 are more preferable. The number of carbon atoms of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, still more preferably 40 or less, more preferably 35 or less, and even more preferably 30 or less. By setting it to be above the lower limit value, there is a tendency to suppress film roughness at the time of development, and by setting it to be less than the above upper limit value, it is easy to suppress sensitivity degradation or to suppress film reduction during development and improve resolution tendency. For example, as a combination of the upper limit and the lower limit, 4 to 40 are preferable, 6 to 35 are more preferable, and 8 to 30 are more preferable. Specific examples of the aliphatic ring in the aliphatic cyclic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isoane ring, an adamantane ring, Cyclododecane ring and the like. Among these, an adamantane ring is preferable from a viewpoint of the film reduction at the time of development, and resolvability. On the other hand, the number of rings in the aromatic ring group is not particularly limited, but it is usually 1 or more, preferably 2 or more, more preferably 3 or more, and usually 10 or less, and preferably 5 or less. When it is set to the above lower limit value, it is easy to obtain a strong film and it is difficult to cause surface roughness. When it is set to the above upper limit value, it is easy to suppress sensitivity degradation or suppress film reduction, and resolution is good. Increasing tendency. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, 2 to 5 are more preferable, and 3 to 5 are more preferable. Examples of the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. The number of carbon atoms of the aromatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, even more preferably 10 or more, still more preferably 40 or less, more preferably 30 or less, and even more preferably It is 20 or less, and particularly preferably 15 or less. When it is set to the above lower limit value, it is easy to obtain a strong film and it is difficult to cause surface roughness. When it is set to the above upper limit value, it is easy to suppress sensitivity degradation or suppress film reduction, and resolution is good. Increasing tendency. For example, as a combination of the upper limit and the lower limit, 4 to 40 are preferable, 6 to 30 are more preferable, 8 to 20 are more preferable, and 10 to 15 are particularly preferable. Specific examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and a fluorene ring. Among these, from the viewpoint of developability, a ring is preferable. Examples of the substituent which the cyclic hydrocarbon group may have include carbon numbers such as methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, third butyl, pentyl, and isopentyl. Alkyl groups of 1 to 5; alkoxy groups of 1 to 5 carbons such as methoxy and ethoxy; hydroxyl groups; nitro groups; cyano groups; carboxyl groups and the like. Among these, from the viewpoint of easy synthesis, it is preferably unsubstituted. Among these, from the viewpoint of suppressing film reduction and resolution, Rβ A divalent aliphatic cyclic group is preferable, and a divalent adamantyl ring group is more preferable. On the other hand, from the viewpoint of patterning characteristics, Rβ A divalent aromatic ring group is preferable, and a divalent fluorene ring group is more preferable. As described above, the benzene ring in the formula (b1-II-2) may be further substituted with an arbitrary substituent. Examples of the substituent include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. The number of substituents is also not particularly limited, and may be one or two or more. Moreover, two benzene rings may be connected via a substituent. Examples of the substituent in this case include: -O-, -S-, -NH-, -CH2 -Equivalent divalent base. Among these, from the viewpoint of patterning characteristics, it is preferably unsubstituted. Moreover, it is preferable that it is substituted with a methyl group from a viewpoint that a film reduction etc. do not occur easily. Specific examples of the partial structure represented by the formula (b1-II-2) are listed below. Furthermore, * in the example indicates a bond key. [Chemical 28][Chemical 29][Chemical 30][Chemical 31]On the other hand, the partial structure represented by the above-mentioned formula (b1-II) is preferably a partial structure represented by the following formula (b1-II-3) from the viewpoint of the coating film residual film rate and the patterning characteristics. [Chemical 32]In formula (b1-II-3), R13 , R14 , R15 , R16 , M and n have the same meanings as in the above formula (b1-II), RZ Represents a hydrogen atom or a polyacid residue. The polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or an anhydride thereof. Furthermore, it is possible to further remove one OH group and combine with R in other molecules represented by formula (b1-II-3)Z Common OH group, that is, plural formulas (b1-II-3) may pass through RZ While linking. Examples of the polybasic acid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, One of benzophenone tetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chloramphenic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid Or 2 or more. Among these, from the viewpoint of patterning characteristics, maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, Pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid, more preferably tetrahydrophthalic acid, biphenyltetracarboxylic acid, and biphenyltetracarboxylic acid. The partial structure represented by the formula (b1-II-3) contained in one molecule of (b1-II) epoxy (meth) acrylate resin may be one type or two or more types. For example, RZ For hydrogen atom and RZ Those that are polyacid residues can be mixed. The number of partial structures represented by the formula (b1-II) contained in 1 molecule of (b1-II) epoxy (meth) acrylate resin is not particularly limited, but it is preferably 1 or more, and more preferably It is 3 or more, more preferably 20 or less, more preferably 15 or less, and even more preferably 10 or less. When it is set to the above lower limit value, it is easy to obtain a strong film and it is difficult to cause surface roughness. When it is set to the above upper limit value, it is easy to suppress sensitivity degradation or suppress film reduction, and resolution is good. Increasing tendency. For example, as a combination of the upper limit and the lower limit, 1 to 20 are preferable, 3 to 15 are more preferable, and 3 to 10 are more preferable. (b1-II) The weight average molecular weight (Mw) of the polystyrene equivalent of the epoxy (meth) acrylate resin measured by gel permeation chromatography (GPC) is not particularly limited, but is preferably 1,000. The above is more preferably 2,000 or more, more preferably 30,000 or less, more preferably 20,000 or less, even more preferably 10,000 or less, even more preferably 7,000 or less, and even more preferably 5,000 or less. When it is more than the said lower limit value, there exists a tendency for a patterning characteristic to become favorable, and when it is less than the said upper limit value, it becomes easy to obtain a strong film, and there exists a tendency for surface roughness not to occur easily. For example, as a combination of the upper limit and the lower limit, 1,000 to 30,000 may be preferably listed, 1,000 to 20,000 may be more preferably listed, 2000 to 10,000 may be further preferred, and 2000 to 7000 may be further preferred, and may be even more preferably List 2000 to 5000. (b1-II) The acid value of the epoxy (meth) acrylate resin is not particularly limited, but preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more, and even more preferably 40 mgKOH / g or more It is more preferably 60 mgKOH / g or more, more preferably 80 mgKOH / g or more, most preferably 100 mgKOH / g or more, still more preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, further It is preferably 120 gKOH / g or less. When it is more than the said lower limit value, a strong film tends to be easy to obtain, and when it is less than the said upper limit value, developing solubility improves and the resolving property tends to become favorable. For example, as a combination of the upper limit and the lower limit, 10 to 200 mgKOH / g may be preferably listed, 20 to 150 mgKOH / g may be more preferably listed, and 40 to 150 mgKOH / g may be more preferably listed. 60 to 120 mgKOH / g is enumerated, and 80 to 120 mgKOH / g is particularly preferably enumerated. The epoxy (meth) acrylate resin may be used singly or in combination of two or more kinds thereof. In addition, a part of the epoxy (meth) acrylate resin may be replaced with another adhesive resin. That is, an epoxy (meth) acrylate resin can be used in combination with another binder resin. In this case, the ratio of the epoxy (meth) acrylate resin in the (b) alkali-soluble resin is preferably 50% by mass or more, more preferably 60% by mass or more, and even more preferably It is preferably 70% by mass or more, more preferably 80% by mass or more, and usually 100% by mass or less. For example, as a combination of the upper limit and the lower limit, 50 to 100% by mass is preferable, 60 to 100% by mass is more preferable, 70 to 100% by mass is even more preferable, and 80 to 100% is particularly preferable. quality%. There are no restrictions on other binder resins that can be used in combination with epoxy (meth) acrylate resins, and they may be selected from resins commonly used in photosensitive coloring compositions. For example, the binder resins described in Japanese Patent Laid-Open No. 2007-271727, Japanese Patent Laid-Open No. 2007-316620, and Japanese Patent Laid-Open No. 2007-334290 can be cited. In addition, other binder resins can be used individually by 1 type or in combination of 2 or more types. In addition, as the (b) alkali-soluble resin, from the viewpoint of compatibility with pigments, dispersants, and the like, it is preferable to use (b2) an acrylic copolymer resin, and Japanese Patent Laid-Open No. 2014-137466 can be preferably used. Those listed in the bulletin. Examples of the acrylic copolymer resin include an ethylenically unsaturated monomer having one or more carboxyl groups (hereinafter referred to as "unsaturated monomer (b2-1)") and other ethylenically unsaturated monomers capable of copolymerization. Copolymer of a saturated monomer (hereinafter referred to as "unsaturated monomer (b2-2)"). Examples of the unsaturated monomer (b2-1) include unsaturated monocarboxylic acids such as (meth) acrylic acid, butenoic acid, α-chloroacrylic acid, and cinnamic acid; maleic acid and maleic anhydride , Unsaturated dicarboxylic acids such as fumaric acid, citraconic acid, citraconic anhydride, mesaconic acid or their anhydrides; [2- (meth) acryloxyethyl] succinate, phthalic acid Mono [(meth) acryloxyalkyl] esters of polycarboxylic acids, such as mono [2- (meth) acryloxyethyl] formate; ω-carboxy polycaprolactone mono ( Mono (meth) acrylates of polymers having carboxyl and hydroxyl groups at both ends, such as (meth) acrylates; p-vinylbenzoic acid, etc. These unsaturated monomers (b2-1) can be used alone or as a mixture of two or more. Examples of the unsaturated monomer (b2-2) include N-substituted maleimidines such as N-phenyl maleimide diimide and N-cyclohexyl maleimide diimide. Amine; aromatic vinyl compounds such as styrene, α-methylstyrene, p-hydroxystyrene, p-hydroxy-α-methylstyrene, p-vinylbenzyl glycidyl ether, vinylnaphthalene; (methyl) Methyl acrylate, n-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, allyl (meth) acrylate, (meth) acrylic acid Benzyl ester, polyethylene glycol (degree of polymerization 2 to 10) methyl ether (meth) acrylate, polypropylene glycol (degree of polymerization 2 to 10) methyl ether (meth) acrylate, polyethylene glycol (degree of polymerization 2 to 10) 10) Mono (meth) acrylate, polypropylene glycol (degree of polymerization 2 to 10) mono (meth) acrylate, cyclohexyl (meth) acrylate, isomethacrylate (meth) acrylate, trimethacrylate Ring [5.2.1.02,6 ] Decane-8-yl ester, dicyclopentenyl (meth) acrylate, glycerol mono (meth) acrylate, 4-hydroxyphenyl (meth) acrylate, epoxy of p-cumylphenol Ethane-modified (meth) acrylate, glycidyl (meth) acrylate, 3,4-epoxycyclohexyl methyl (meth) acrylate, 3-[(meth) acryloxymethyl] (Meth) acrylates such as oxetane, 3-[(meth) propenyloxymethyl] -3-ethyloxetane; cyclohexyl vinyl ether, isoyl vinyl ether, tricyclic [5.2.1.02,6 ] Decane-8-yl vinyl ether, pentacyclopentadecyl vinyl ether, 3- (vinyloxymethyl) -3-ethyloxetane and other vinyl ethers; polystyrene, poly (methyl ) Methyl acrylate, poly (n-butyl) methacrylate, and polysiloxane are equivalent to macromonomers having a mono (meth) acrylfluorenyl group at the end of the molecular chain of the polymer, and the like. These unsaturated monomers (b2-2) can be used alone or as a mixture of two or more. In the copolymer of the unsaturated monomer (b2-1) and the unsaturated monomer (b2-2), the copolymerization ratio of the unsaturated monomer (b2-1) in the copolymer is preferably 5 to 50% by mass , More preferably 10 to 40% by mass. By copolymerizing the unsaturated monomer (b2-1) within this range, there is a tendency that a photosensitive coloring composition excellent in alkaline developability and storage stability can be obtained. Specific examples of the copolymer of the unsaturated monomer (b2-1) and the unsaturated monomer (b2-2) include, for example, Japanese Patent Laid-Open No. 7-140654 and Japanese Patent Laid-Open No. 8-259876. Japanese Patent Laid-Open No. 10-31308, Japanese Patent Laid-Open No. 10-300922, Japanese Patent Laid-Open No. 11-174224, Japanese Patent Laid-Open No. 11-258415, Japanese Patent Laid-Open No. 2000-56118 Copolymers disclosed in Japanese Patent Laid-Open No. 2004-101728. The copolymer of the unsaturated monomer (b2-1) and the unsaturated monomer (b2-2) can be produced by a known method, or it can be produced by, for example, Japanese Patent Laid-Open No. 2003-222717, Japanese Patent Laid-Open No. 2006- The methods disclosed in 259680, International Publication No. 2007/029871, and the like control the structure or Mw, Mw / Mn. <(C) Photopolymerization initiator> (c) The photopolymerization initiator is a component that has the function of directly absorbing light, initiating a decomposition reaction or a hydrogen abstraction reaction, and generating a polymerization-active radical. If necessary, additives such as a polymerization accelerator (chain transfer agent) and a sensitizing dye may be added and used. Examples of the photopolymerization initiator include a metallocene compound containing a titanocene compound described in Japanese Patent Laid-Open No. 59-152396 and Japanese Patent Laid-Open No. 61-151197; The hexaarylbiimidazole derivatives described in KOKAI Publication No. 2000-56118; the halomethylated oxadiazole derivatives and halomethyl trimerides described in Japanese Patent Laid-Open No. 10-39503; α-amine Alkyl phenone derivatives; oxime ester compounds described in Japanese Patent Laid-Open No. 2000-80068, Japanese Patent Laid-Open No. 2006-36750, and the like. Specifically, for example, as the titanocene derivatives, dicyclopentadienyl titanium dichloride, dicyclopentadienyl titanium biphenyl, and dicyclopentadienyl titanium bis (2,3 , 4,5,6-pentafluorophenyl-1-yl), dicyclopentadienyl titanium bis (2,3,5,6-tetrafluorophenyl-1-yl), dicyclopentadienyl titanium bis (2,4,6-trifluorophenyl-1-yl), dicyclopentadienyl titanium bis (2,6-difluorophenyl-1-yl), dicyclopentadienyl titanium bis (2,4 -Difluorobenzene-1-yl), bis (methylcyclopentadienyl) titanium bis (2,3,4,5,6-pentafluorophenyl-1-yl), bis (methylcyclopentadiene) Base) titanium bis (2,6-difluorophenyl-1-yl), titanium dicyclopentadienyl [2,6-difluoro-3- (pyrrole-1-yl) -benzene-1-yl], etc. . Examples of the hexaarylbiimidazole derivatives include 2- (2'-chlorophenyl) -4,5-diphenylimidazole dimer and 2- (2'-chlorophenyl) -4 , 5-bis (3'-methoxyphenyl) imidazole dimer, 2- (2'-fluorophenyl) -4,5-diphenylimidazole dimer, 2- (2'-methoxy Phenyl) -4,5-diphenylimidazole dimer, (4'-methoxyphenyl) -4,5-diphenylimidazole dimer, and the like. Examples of the halomethylated fluorenediazole derivatives include 2-trichloromethyl-5- (2'-benzofuranyl) -1,3,4-fluorenediazole and 2-trichloro Methyl-5- [β- (2'-benzofuranyl) vinyl] -1,3,4-fluorenediazole, 2-trichloromethyl-5- [β- (2 '-(6' '-Benzofuryl) vinyl)]-1,3,4-fluorenediazole, 2-trichloromethyl-5-furanyl-1,3,4-fluorenediazole, and the like. Examples of the halomethyl mesitane derivatives include 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) mesa, and 2- (4-methoxynaphthalene). Methyl) -4,6-bis (trichloromethyl) tris, 2- (4-ethoxynaphthyl) -4,6-bis (trichloromethyl) tris, 2- (4-ethoxy Carbonylcarbonylnaphthyl) -4,6-bis (trichloromethyl) are all equal. Examples of the α-aminoalkyl phenone derivatives include 2-methyl-1- [4- (methylthio) phenyl] -2-olinylpropane-1-one and 2-benzyl Methyl-2-dimethylamino-1- (4-olinylphenyl) -butanone-1, 2-benzyl-2-dimethylamino-1- (4-olinylphenyl) butyl Alkan-1-one, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 4-diethylaminoacetophenone, 4-dimethylaminobenzene Acetone, 2-ethylhexyl 1,4-dimethylaminobenzoate, 2,5-bis (4-diethylaminobenzylidene) cyclohexanone, 7-diethylamino-3 -(4-diethylaminobenzyl) coumarin, 4- (diethylamino) chalcone, and the like. As a photopolymerization initiator, an oxime ester compound is particularly effective in terms of sensitivity and plate-making properties. When an alkali-soluble resin containing a phenolic hydroxyl group is used, the oxime ester system is particularly excellent in such sensitivity. Compounds are useful. The oxime ester compound has both a structure that absorbs ultraviolet light, a structure that transmits light energy, and a structure that generates free radicals. Therefore, it can achieve high sensitivity with a small amount and is stable during thermal reactions. Using a small amount can achieve high Sensitive coloring composition. Examples of the oxime ester compound include compounds represented by the following general formula (IV). [Chemical 33]In the above formula (IV), R21a Represents a hydrogen atom, an alkyl group which may have a substituent, or an aromatic ring group which may have a substituent, R21b Represents an arbitrary substituent containing an aromatic ring or a heteroaromatic ring, R22a Represents an alkylfluorenyl group which may have a substituent, or an arylfluorenyl group which may have a substituent. R21a The number of carbon atoms in the alkyl group is not particularly limited. From the viewpoint of solubility or sensitivity in a solvent, it is usually 1 or more, preferably 2 or more, and usually 20 or less, and preferably 15 or less. More preferably, it is 10 or less. Specific examples of the alkyl group include methyl, ethyl, propyl, cyclopentylethyl, and propyl. For example, as a combination of the upper limit and the lower limit, 1 to 20 may be preferably used, 2 to 15 may be more preferably used, and 2 to 10 may be more preferably used. Examples of the substituent which the alkyl group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amine group, a fluorenylamino group, and 4- (2-methoxy-1-methyl) ethoxy-2. -Methylphenyl, N-ethenyl-N-ethenyloxyamino, and the like are preferably unsubstituted from the viewpoint of ease of synthesis. As R21a Examples of the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. The number of carbon atoms of the aromatic ring group is not particularly limited, but is preferably 5 or more from the viewpoint of solubility in the photosensitive coloring composition. From the viewpoint of developability, it is preferably 30 or less, more preferably 20 or less, and even more preferably 12 or less. For example, as a combination of the upper limit and the lower limit, 5 to 30 are preferable, 5 to 20 are more preferable, and 5 to 12 are more preferable. Specific examples of the aromatic ring group include a phenyl group, a naphthyl group, a pyridyl group, and a furyl group. Among these, from the viewpoint of developability, a phenyl group or a naphthyl group is more preferable, Phenyl. Examples of the substituent which the aromatic cyclic group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amine group, amidino group, an alkyl group, an alkoxy group, and a group formed by linking these substituents. From a viewpoint, an alkyl group, an alkoxy group, and these connected groups are preferable, and a connected alkoxy group is more preferable. Among these, from the viewpoint of developability, R21a The aromatic ring group which may have a substituent is preferable, and the aromatic ring group which has the alkoxy group connected in the substituent is more preferable. Again, as R21b Can be preferably listed as: a substituted carbazolyl group, a substituted 9-oxysulfurOr diphenyl sulfide group which may be substituted. Among these, from the viewpoint of sensitivity, a carbazolyl group which can be substituted is preferred. On the other hand, from the viewpoint of electrical reliability, a diphenylsulfide group which can be substituted is preferred. Again, R22a The number of carbon atoms in the alkyl group is not particularly limited. From the viewpoint of solubility or sensitivity in a solvent, it is usually 2 or more, preferably 3 or more, and usually 20 or less, and preferably 15 or less. , More preferably 10 or less, and even more preferably 5 or less. For example, as a combination of the upper limit and the lower limit, 2 to 20 are preferable, 2 to 15 are more preferable, 3 to 10 are more preferable, and 3 to 5 are particularly preferable. Specific examples of the alkylfluorenyl group include an ethylfluorenyl group, a propionyl group, and a butanyl group. Examples of the substituent which the alkylfluorenyl group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amine group, and a fluorenylamino group. From the viewpoint of ease of synthesis, it is preferably unsubstituted. Again, R22a There is no particular limitation on the number of carbon atoms of the arylfluorenyl group. In terms of solubility or sensitivity in a solvent, it is usually 7 or more, preferably 8 or more, and usually 20 or less, and preferably 15 or less. , More preferably 10 or less. Specific examples of the arylfluorenyl group include a benzamyl group, a naphthylmethyl group, and the like. For example, as a combination of the upper limit and the lower limit, 7 to 20 are preferable, 8 to 15 are more preferable, and 8 to 10 are more preferable. Examples of the substituent which the arylfluorenyl group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amine group, a fluorenylamino group, and an alkyl group. From the viewpoint of easy synthesis, it is preferably unsubstituted. Among these, in terms of sensitivity, R22a The alkyl fluorenyl group which may have a substituent is preferable, an unsubstituted alkyl fluorenyl group is more preferable, and an ethyl fluorenyl group is more preferable. The photopolymerization initiator may be used singly or in combination of two or more kinds. In order to improve the sensing sensitivity, a sensitizing dye and a polymerization accelerator corresponding to the wavelength of an image exposure light source may be blended in the photopolymerization initiator as needed. Examples of the sensitizing dye include those described in Japanese Patent Laid-Open No. 4-221958 and Japanese Patent Laid-Open No. 4-219756.Pigments, coumarin pigments having heterocyclic rings described in Japanese Patent Laid-Open No. 3-239703, Japanese Patent Laid-Open No. 5-289335, Japanese Patent Laid-Open No. 3-239703, and Japanese Patent Laid-Open No. 5-239703. 3-ketocoumarin compounds described in Japanese Patent No. 289335, pyrrole methylene pigments described in Japanese Patent Laid-Open No. 6-19240, and Japanese Patent Laid-Open No. 47-2528, Japanese Patent No. Japanese Patent Application Publication No. 54-155292, Japanese Patent Application Publication No. 45-37377, Japanese Patent Application Publication No. 48-84183, Japanese Patent Application Publication No. 52-112681, Japanese Patent Application Publication No. 58-15503 , Japanese Patent Laid-Open No. 60-88005, Japanese Patent Laid-Open No. 59-56403, Japanese Patent Laid-Open No. 2-69, Japanese Patent Laid-Open No. 57-168088, Japanese Patent Laid-Open No. 5- Pigments having a dialkylaminobenzene skeleton described in Japanese Patent Publication No. 107761, Japanese Patent Application Laid-Open No. 5-210240, and Japanese Patent Application Laid-Open No. 4-288818. Among these sensitizing dyes, preferred are amine-containing sensitizing dyes, and more preferred are compounds having an amine group and a phenyl group in the same molecule. Particularly preferred are, for example, 4,4'-dimethylaminobenzophenone, 4,4'-diethylaminobenzophenone, 2-aminobenzophenone, 4-aminobenzophenone Benzophenone-based compounds such as methanone, 4,4'-diaminobenzophenone, 3,3'-diaminobenzophenone, 3,4-diaminobenzophenone; 2- (P-dimethylaminophenyl) benzoxazole, 2- (p-diethylaminophenyl) benzoxazole, 2- (p-dimethylaminophenyl) benzo [4,5 ] Benzoxazole, 2- (p-dimethylaminophenyl) benzo [6,7] benzoxazole, 2,5-bis (p-diethylaminophenyl) -1,3, 4-oxazole, 2- (p-dimethylaminophenyl) benzothiazole, 2- (p-diethylaminophenyl) benzothiazole, 2- (p-dimethylaminophenyl) benzene Benzimidazole, 2- (p-diethylaminophenyl) benzimidazole, 2,5-bis (p-diethylaminophenyl) -1,3,4-thiadiazole, (p-dimethyl Aminophenyl) pyridine, (p-diethylaminophenyl) pyridine, (p-dimethylaminophenyl) quinoline, (p-diethylaminophenyl) quinoline, (p-dimethyl Compounds containing p-dialkylaminophenyl, such as aminophenyl) pyrimidine, (p-diethylaminophenyl) pyrimidine, and the like. Among them, 4,4'-dialkylaminobenzophenone is the best. The sensitizing dye may be used individually by 1 type, and may use 2 or more types together. As the polymerization accelerator, for example, aromatic amines such as ethyl p-dimethylaminobenzoate and ethyl 2-dimethylaminobenzoate, and aliphatics such as n-butylamine and N-methyldiethanolamine can be used. Amine, the following mercapto compounds and the like. A polymerization accelerator may be used individually by 1 type, and may use 2 or more types together. <(D) Ethylene unsaturated compound> The photosensitive coloring composition of this invention contains (d) an ethylenically unsaturated compound. By containing (d) an ethylenically unsaturated compound, sensitivity improves. The ethylenically unsaturated compound used in the present invention is a compound having at least one ethylenically unsaturated group in the molecule. Specific examples include (meth) acrylic acid, (meth) acrylic acid alkyl esters, acrylonitrile, styrene, and monoesters of a carboxylic acid and a polyhydric or monohydric alcohol having one ethylenically unsaturated bond, and the like. . In the present invention, it is particularly desirable to use a polyfunctional ethylenic monomer having two or more ethylenically unsaturated groups in one molecule. The number of ethylenically unsaturated groups in the polyfunctional ethylenic monomer is not particularly limited, but it is usually two or more, preferably four or more, more preferably five or more, and more preferably eight or less. It is more preferably 7 or less. If it is more than the said lower limit value, it will become high sensitivity, and if it is less than the said upper limit value, the solubility in a solvent will improve. For example, as a combination of the upper limit and the lower limit, 2 to 8 are preferable, 4 to 7 are more preferable, and 5 to 7 are more preferable. Examples of the polyfunctional ethylenic monomer include an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, an ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid, and an aliphatic polyhydroxy compound and an aromatic compound. An ester obtained by an esterification reaction of a polyvalent hydroxyl compound such as a polyhydroxy compound with an unsaturated carboxylic acid and a polycarboxylic acid. Examples of the ester of the aliphatic polyhydroxy compound and the unsaturated carboxylic acid include ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, and trimethylolethane triacrylate. Acrylates of aliphatic polyhydroxy compounds such as esters, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, glycerol acrylate, etc. The methacrylic acid ester obtained by replacing the acrylate of the exemplified compound with a methacrylic acid, the same is obtained by replacing the iconate obtained with the iconate, the butyrate obtained with the butyrate, Or maleic acid ester etc. obtained by substituting maleic acid ester. Examples of the ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid include hydroquinone diacrylate, hydroquinone dimethacrylate, resorcinol diacrylate, and resorcinol dimethyl. Acrylic esters and methacrylic esters of aromatic polyhydroxy compounds, such as acrylate and pyrogallol triacrylate. The ester obtained by the esterification reaction of a polycarboxylic acid and an unsaturated carboxylic acid with a polyvalent hydroxy compound is not necessarily a single substance, but if a representative specific example is given, acrylic acid, phthalic acid, and ethyl Condensates of diols, condensates of acrylic acid, maleic acid and diethylene glycol, condensates of methacrylic acid, terephthalic acid and pentaerythritol, condensates of acrylic acid, adipic acid, butanediol and glycerol Wait. In addition, as examples of the polyfunctional ethylenic monomer that can be used in the present invention, it is useful to react a polyisocyanate compound with a hydroxyl group-containing (meth) acrylate or a polyisocyanate compound with a polyol and (Meth) acrylic acid urethanes obtained by the reaction of hydroxyl-containing (meth) acrylates; such as the ring of addition reaction products of polyvalent epoxy compounds with hydroxyl (meth) acrylates or (meth) acrylic acid Oxyacrylic acid esters; acrylamides such as ethacrylamide; allyl esters such as diallyl phthalate; vinyl-containing compounds such as diethylene phthalate. Examples of the (meth) acrylic acid urethanes include DPHA-40H, UX-5000, UX-5002D-P20, UX-5003D, UX-5005 (manufactured by Nippon Kayaku Co., Ltd.), U-2PPA, U-6LPA, U-10PA, U-33H, UA-53H, UA-32P, UA-1100H (made by Shin Nakamura Chemical Industry Co., Ltd.), UA-306H, UA-510H, UF-8001G (made by Kyoeisha Chemical Co., Ltd. ), UV-1700B, UV-7600B, UV-7605B, UV-7630B, UV7640B (manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) and the like. Among these, from the viewpoint of hardenability, as the (d) ethylenically unsaturated compound, an alkyl (meth) acrylate is preferably used, and dipentaerythritol hexaacrylate is more preferably used. These may be used individually by 1 type, and may use 2 or more types together. <(E) Solvent> The photosensitive coloring composition of this invention contains (e) a solvent. By containing the (e) solvent, the (a) colorant can be dissolved or dispersed in the solvent, and coating is facilitated. The photosensitive coloring composition of the present invention is generally based on (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (f) a dispersant, and Various other materials to be used are used in a state of being dissolved or dispersed in a solvent. Among solvents, an organic solvent is preferred from the viewpoint of dispersibility or coating properties. Among organic solvents, from the viewpoint of coating properties, it is preferred to select a boiling point in the range of 100 to 300 ° C, and more preferred to select a boiling point in the range of 120 to 280 ° C. In addition, the boiling point mentioned here refers to the boiling point at a pressure of 1013.25 hPa, and is the same for the following boiling points. Examples of such an organic solvent include the following. Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether, propylene glycol third butyl ether, diethyl ether Glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, methoxymethylpentanol, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methoxybutanol, 3 -Glycol monoalkyl ethers such as methyl-3-methoxybutanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, and tripropylene glycol methyl ether; ethylene glycol dimethyl ether, ethyl Glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, dipropylene glycol dimethyl ether and the like Class; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropylene Ether acetate, propylene glycol monobutyl ether acetate, methoxybutyl acetate, 3-methoxybutyl acetate, methoxypentyl acetate, diethylene glycol monomethyl ether acetate, diethylene glycol Alcohol Ether acetate, diethylene glycol mono-n-butyl ether acetate, dipropylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether acetate, acetic acid 3- Glycol alkyl ether acetates such as methyl-3-methoxybutyl; ethylene glycol diacetate, 1,3-butanediol diacetate, 1,6-hexanol diethyl Glycol diacetates such as acid esters; alkyl acetates such as cyclohexanol acetate; pentyl ether, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, dipentyl ether, ethyl isobutyl Ethers such as ether and dihexyl ether; acetone, methyl ethyl ketone, methyl amyl ketone, methyl isopropyl ketone, methyl isoamyl ketone, diisopropyl ketone, diisobutyl ketone Ketones such as methyl isobutyl ketone, cyclohexanone, ethyl amyl ketone, methyl butyl ketone, methyl hexyl ketone, methyl nonyl ketone, methoxy methyl pentanone; ethanol, Propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, butanediol, diethylene glycol, dipropylene glycol, triethylene glycol, methoxymethylpentanol, glycerol, benzyl alcohol and the like Mono- or polyhydric alcohols; n-pentane, n-octane, diisobutene, n- Aliphatic hydrocarbons such as alkane, hexene, isoprene, dipentene, dodecane; alicyclics such as cyclohexane, methylcyclohexane, methylcyclohexene, and bicyclohexyl Hydrocarbons; aromatic hydrocarbons such as benzene, toluene, xylene, cumene; amyl formate, ethyl formate, ethyl acetate, butyl acetate, propyl acetate, amyl acetate, methyl isobutyrate , Ethylene glycol acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl octoate, butyl stearate, ethyl benzoate, Methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, Chain or cyclic esters such as butyl 3-methoxypropionate and γ-butyrolactone; alkoxycarboxylic acids such as 3-methoxypropionic acid and 3-ethoxypropionic acid; Halogenated hydrocarbons such as chlorobutane and chloropentane; ether ketones such as methoxymethylpentanone; nitriles such as acetonitrile and benzonitrile. Examples of commercially available organic solvents equivalent to the above include mineral spirits, Varsol # 2, Apco # 18 solvent, Apco thinner, Socal Solvent No. 1 and No. 2, Solvesso # 150, Shell TS28 solvent, Carbitol, ethyl carbitol, butyl carbitol, methyl cellosolve ("cellosolve" is a registered trademark. The same applies below), ethyl cellosolve, ethyl acetate cellosolve, methyl acetate Base cellosolve, diglyme (both trade names), and the like. These organic solvents may be used alone or in combination of two or more. In the case where the colored spacer is formed by the photolithography method, as the organic solvent, it is preferable to select a boiling point in the range of 100 to 200 ° C. More preferably, it has a boiling point of 120 to 170 ° C. Among the above-mentioned organic solvents, glycol alkyl ether acetates are preferred in terms of good balance between coating properties and surface tension, and relatively high solubility of constituent components in the composition. The glycol alkyl ether acetates may be used alone, or may be used in combination with other organic solvents. As the organic solvent used in combination, glycol monoalkyl ethers are particularly preferred. Among these, propylene glycol monomethyl ether is preferred in terms of the solubility of the constituents in the composition. Furthermore, glycol monoalkyl ethers have high polarity. If the amount is too large, pigments tend to aggregate, and the storage stability of the photosensitive coloring composition obtained thereafter tends to decrease, such as storage stability. The ratio of the diol monoalkyl ethers is preferably 5 to 30% by mass, and more preferably 5 to 20% by mass. In addition, it is also preferable to use an organic solvent having a boiling point of 150 ° C. or higher (hereinafter sometimes referred to as a “high boiling point solvent”). By using such a high-boiling-point solvent in combination, the photosensitive coloring composition does not easily dry out, and has the effect of preventing the uniform dispersion state of the pigment in the composition from being damaged by rapid drying. That is, for example, there is an effect of preventing foreign matter defects due to precipitation and curing of a colorant or the like at the tip of the slit nozzle. From the standpoint of this effect, among the above solvents, diethylene glycol mono-n-butyl ether, diethylene glycol mono-n-butyl ether acetate, and diethylene glycol monoethyl ether acetate are particularly preferred. . When a high boiling point solvent is used in combination, the content ratio of the high boiling point solvent in the organic solvent is preferably 3% to 50% by mass, more preferably 5% to 40% by mass, and even more preferably 5% to 30% by mass. %. By setting it to the above lower limit value, for example, it is possible to suppress the foreign matter defect caused by the precipitation and solidification of the color nozzle and the like at the front end of the slit nozzle, and by setting it to the above upper limit value, the combination can be suppressed. The drying temperature of the product is postponed, which suppresses the tendency of problems such as poor station time (tact) of the reduced pressure drying process or pre-baking pin marks. In addition, the high-boiling point solvent having a boiling point of 150 ° C or higher may be a glycol alkyl ether acetate or a glycol alkyl ether. In this case, a high-boiling point solvent having a boiling point of 150 ° C or higher may no longer be included. . As a preferable high boiling point solvent, for example, among the above-mentioned various solvents, diethylene glycol mono-n-butyl ether acetate, diethylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, 1, 3-butanediol diacetate, 1,6-hexanol diacetate, glycerol triacetate, and the like. <(F) Dispersant> In order to ensure the quality stability of the photosensitive coloring composition of the present invention, it is important that (a) the fine dispersion of the colorant and stabilization of its dispersion state, therefore, the photosensitive coloring composition of the present invention Contains (f) a dispersant. As the (f) dispersant, a polymer dispersant having a functional group is preferable, and in terms of dispersion stability, a carboxyl group, a phosphate group, a sulfonic acid group, or a salt group thereof is preferable, Primary, secondary or tertiary amine groups, quaternary ammonium salts, polymer dispersants derived from functional groups such as pyridine, pyrimidine, pyridine and other nitrogen-containing heterocyclic groups. Among them, especially from the viewpoint of dispersing the pigment with a small amount of dispersant when dispersing the pigment, it is particularly preferable to have a primary, secondary, or tertiary amine group and a quaternary ammonium salt group, which are derived from pyridine, pyrimidine, pyridine Polymer dispersants with basic functional groups such as nitrogen-containing heterocyclic groups. Examples of the polymer dispersant include a urethane-based dispersant, an acrylic-based dispersant, a polyethylenimine-based dispersant, a polyallylamine-based dispersant, and a monomer containing an amine group. Macromonomer dispersant, polyoxyethylene alkyl ether dispersant, polyoxyethylene diester dispersant, polyether phosphoric acid dispersant, polyester phosphoric acid dispersant, sorbitan fatty acid ester dispersant , Aliphatic modified polyester-based dispersant. As specific examples of such dispersants, they are represented by trade names, and include: EFKA (registered trademark, manufactured by BASF), DISPERBYK (registered trademark, manufactured by BYK-Chemie), Disbaron (registered trademark, manufactured by Kusumoto Chemical Co., Ltd.), SOLSPERSE (registered trademark, manufactured by Lubrizol), KP (made by Shin-Etsu Chemical Industry Co., Ltd.), Polyflow (made by Kyoeisha Chemical Co., Ltd.), Ajisper (registered trademark, manufactured by Ajinomoto Co., Ltd.), and the like. These polymer dispersants may be used individually by 1 type, and may use 2 or more types together. The weight average molecular weight (Mw) of the polymer dispersant is usually 700 or more, preferably 1,000 or more, and usually 100,000 or less, and preferably 50,000 or less. For example, as a combination of the upper limit and the lower limit, 700 to 100,000 is preferable, and 1,000 to 50,000 is more preferable. Among these, from the viewpoint of dispersibility of the pigment, (f) the dispersant is preferably a urethane-based polymer dispersant and / or an acrylic polymer dispersant including a functional group, and particularly preferably It contains an acrylic polymer dispersant. In terms of dispersibility and storage properties, a polymer dispersant having a basic functional group and having a polyester bond and / or a polyether bond is preferred. Examples of the urethane-based and acrylic polymer dispersants include: DISPERBYK 160-166, 182 series (both urethane-based), DISPERBYK 2000, 2001, BYK-LPN21116, etc. (all acrylic System) (all above are manufactured by BYK-Chemie). As a urethane-based polymer dispersant, if a preferable chemical structure is specifically exemplified, for example, a polyisocyanate compound having a number average molecular weight of 300 to 10,000 by having one or two hydroxyl groups in the molecule may be mentioned. A compound having a weight average molecular weight of 1,000 to 200,000 and a dispersion resin obtained by reacting a compound having an active hydrogen in the molecule with a tertiary amine group. By treating these with a quaternizing agent such as benzyl chloride, all or part of the tertiary amine group can be changed to a quaternary ammonium salt group. Examples of the polyisocyanate compound include p-phenylene diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, and naphthalene-1,5- Aromatic diisocyanates such as diisocyanate, ditoluidine diisocyanate, hexamethylene diisocyanate, methyl imidate diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, dimer acid diisocyanate And other aliphatic diisocyanates, isophorone diisocyanate, 4,4'-methylenebis (cyclohexyl isocyanate), alicyclics such as ω, ω'-diisocyanatodimethylcyclohexane Group diisocyanates, xylylene diisocyanate, α, α, α ', α'-tetramethylxylylene diisocyanate and other aliphatic diisocyanates with aromatic rings, lysine triisocyanates, 1,6 , 11-undecane triisocyanate, 1,8-diisocyanato-4-isocyanatomethyloctane, 1,3,6-hexamethylenetriisocyanate, bicycloheptane triisocyanate, Triisocyanates such as tris (isocyanatophenylmethane), tris (isocyanatophenyl) thiophosphate, and terpolymers, water adducts thereof, and These polyol adducts and the like. As the polyisocyanate, a terpolymer of an organic diisocyanate is preferred, and a terpolymer of toluene diisocyanate and a terpolymer of isophorone diisocyanate are most preferred. These may be used individually by 1 type, and may use 2 or more types together. As a method for producing an isocyanate trimer, the following methods can be cited: For the above-mentioned polyisocyanates, an appropriate three-quantity catalyst is used, such as tertiary amines, phosphines, alkoxides, metal oxides, and carboxylates. Partial trimerization of isocyanate caused by similar types, etc. After terminating the trimerization by adding catalyst poison, the unreacted polyisocyanate is removed by solvent extraction and thin film distillation to obtain the target isomeric content. Polyisocyanate based on cyanuric acid. Examples of compounds having a number average molecular weight of 300 to 10,000 having one or two hydroxyl groups in the molecule include polyether diols, polyester diols, polycarbonate diols, polyolefin diols, and the like, and the number of carbons used is 1 A -25 alkyl group is obtained by alkoxylating one terminal hydroxyl group of these compounds, and a mixture of two or more of these compounds. Examples of the polyether diol include polyether diol, polyether ester diol, and a mixture of two or more of these. Examples of the polyether diol include those obtained by homopolymerizing or copolymerizing an alkylene oxide, such as polyethylene glycol, polypropylene glycol, polyethylene glycol propylene glycol, polyoxytetramethylene glycol, and polyoxyethylene. Hexamethylene glycol, polyoxyoctamethylene glycol and mixtures of these two or more. Examples of the polyether ester diol include an ether group-containing diol or a mixture with another diol and a dicarboxylic acid or an anhydride thereof, or a polyester diol with For example, poly (polyoxytetramethylene) adipate is obtained by reacting an alkylene oxide. As the polyether glycol, polyethylene glycol, polypropylene glycol, polyoxytetramethylene glycol, or an alkyl group having 1 to 25 carbon atoms is used to alkoxylate one of the terminal hydroxyl groups of these compounds. The obtained compound. Examples of the polyester diol include a dicarboxylic acid (succinic acid, glutaric acid, adipic acid, sebacic acid, fumaric acid, maleic acid, phthalic acid, etc.) or the like. Anhydrides and glycols (ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol , 2,3-butanediol, 3-methyl-1,5-pentanediol (diol), neopentyl glycol, 2-methyl-1,3-propanediol (diol), 2-methyl-2 -Propyl-1,3-propanediol (diol), 2-butyl-2-ethyl-1,3-propanediol (diol), 1,5-pentanediol (diol), 1,6-hexanediol (diol), 2-methyl-2,4-pentanediol (diol), 2,2,4-trimethyl-1,3-pentanediol (diol), 2-ethyl-1,3- Hexanediol (diol), 2,5-dimethyl-2,5-hexanediol (diol), 1,8-octamethylene glycol, 2-methyl-1,8-octamethylene Aliphatic diols such as diols, 1,9-nonanediol (diol), alicyclic diols such as bishydroxymethylcyclohexane, aromatic diols such as benzyl alcohol, bishydroxyethoxybenzene, N -N-alkyldialkanolamines such as methyldiethanolamine, etc.), such as those obtained by polycondensation, such as polyethylene adipate, polybutylene adipate, polyhexamethylene Adipic acid ester, polyethylene glycol adipic acid propylene glycol ester, etc .; or a polylactone diol obtained by using the above diols or a monohydric alcohol having 1 to 25 carbons as a starter ) Or polylactone monools, such as polycaprolactone diol, polymethylvalerolactone, and mixtures of these two or more. The polyester diol is preferably a polycaprolactone diol or a polycaprolactone obtained using an alcohol having 1 to 25 carbon atoms as a starter. Examples of the polycarbonate diol include poly (1,6-hexyl) carbonate, poly (3-methyl-1,5-pentyl) carbonate, and the like; and examples of the polyolefin diol include: Polybutadiene glycol, hydrogenated polybutadiene glycol, hydrogenated polyisoprene glycol, and the like. These may be used individually by 1 type, and may use 2 or more types together. The number average molecular weight of a compound having one or two hydroxyl groups in the same molecule is usually 300 to 10,000, preferably 500 to 6000, and more preferably 1,000 to 4,000. The compound having an active hydrogen and a tertiary amine group in the same molecule used in the present invention will be described. The active hydrogen, that is, a hydrogen atom directly bonded to an oxygen atom, a nitrogen atom, or a sulfur atom, includes a hydrogen atom in a functional group such as a hydroxyl group, an amine group, or a thiol group. Among them, an amine group is preferred, and It is a hydrogen atom of a primary amine group. The tertiary amine group is not particularly limited, and examples thereof include an amine group having an alkyl group having 1 to 4 carbon atoms, or a heterocyclic structure, and more specifically, an imidazole ring or a triazole ring. Examples of such compounds having active hydrogen and tertiary amine groups in the same molecule include N, N-dimethyl-1,3-propanediamine, N, N-diethyl-1,3- Propylene diamine, N, N-dipropyl-1,3-propanediamine, N, N-dibutyl-1,3-propanediamine, N, N-dimethylethylenediamine, N, N -Diethylethylenediamine, N, N-dipropylethylenediamine, N, N-dibutylethylenediamine, N, N-dimethyl-1,4-butanediamine, N, N- Diethyl-1,4-butanediamine, N, N-dipropyl-1,4-butanediamine, N, N-dibutyl-1,4-butanediamine, and the like. Examples of the nitrogen-containing heterocyclic ring when the tertiary amine group has a nitrogen-containing heterocyclic ring structure include a pyrazole ring, an imidazole ring, a triazole ring, a tetrazole ring, an indole ring, a carbazole ring, and indene. Azo ring, benzimidazole ring, benzotriazole ring, benzoxazole ring, benzothiazole ring, benzothiadiazole ring and other nitrogen-containing 5-membered rings, pyridine ring, dadyl ring, pyrimidine ring, tricyclic ring , Quinoline ring, acridine ring, isoquinoline ring and other nitrogen-containing 6-membered rings. Among these nitrogen-containing heterocyclic rings, an imidazole ring or a triazole ring is preferred. If these compounds having an imidazole ring and an amine group are specifically exemplified, 1- (3-aminopropyl) imidazole, histidine, 2-aminoimidazole, 1- (2-aminoethyl) ) Imidazole and so on. Furthermore, if a compound having a triazole ring and an amine group is specifically exemplified, 3-amino-1,2,4-triazole, 5- (2-amino-5-chlorophenyl) -3 -Phenyl-1H-1,2,4-triazole, 4-amino-4H-1,2,4-triazole-3,5-diol, 3-amino-5-phenyl-1H- 1,3,4-triazole, 5-amino-1,4-diphenyl-1,2,3-triazole, 3-amino-1-benzyl-1H-2,4-triazole, etc. . Among these, N, N-dimethyl-1,3-propanediamine, N, N-diethyl-1,3-propanediamine, 1- (3-aminopropyl) imidazole, 3 -Amino-1,2,4-triazole. These may be used individually by 1 type, and may use 2 or more types together. Regarding the preferable blending ratio of the raw materials when manufacturing the urethane-based polymer dispersant, the compound having an average molecular weight of 300 to 10,000 having one or two hydroxyl groups in the same molecule is 100 parts by mass of the polyisocyanate compound. 10 to 200 parts by mass, preferably 20 to 190 parts by mass, more preferably 30 to 180 parts by mass; 0.2 to 25 parts by mass of a compound having active hydrogen and a tertiary amine group in the same molecule, preferably 0.3 to 24 Parts by mass. The production of the urethane-based polymer dispersant can be performed according to a known production method of a polyurethane resin. As the solvent during production, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone, isophorone and other ketones are commonly used. Ethyl acetate, butyl acetate, acetic acid Fiber esters and other esters, benzene, toluene, xylene, hexane and other hydrocarbons, diacetone alcohol, isopropanol, second butanol, third butanol and other alcohols, chlorides such as methylene chloride, chloroform, Ethers such as tetrahydrofuran and diethyl ether; aprotic polar solvents such as dimethylformamide, N-methylpyrrolidone, and dimethylsulfine. These may be used individually by 1 type, and may use 2 or more types together. In the above production, a urethane reaction catalyst is usually used. Examples of the catalyst include tin systems such as dibutyltin dilaurate, dioctyltin dilaurate, dibutyltin dioctoate, and stannous octoate; iron systems such as iron acetamate pyruvate and iron chloride; and triethyl Tertiary amines such as amine and triethylenediamine. These may be used individually by 1 type, and may use 2 or more types together. The introduction amount of the compound having an active hydrogen and a tertiary amine group in the same molecule is preferably controlled to a range of 1 to 100 mgKOH / g based on the amine value after the reaction. A more preferable range is 5 to 95 mgKOH / g. The amine value is a value expressed in mg of KOH corresponding to the acid value when the basic amine group is titrated by acid neutralization. When it is more than the said lower limit value, there exists a tendency for a dispersibility to become favorable, and when it is below the said upper limit value, there exists a tendency for the fall of the developability to be suppressed easily. Furthermore, when isocyanate groups remain in the polymer dispersant during the above reaction, if the isocyanate group is further eliminated by using an alcohol or an amine compound, the stability of the product over time is improved, which is preferable. The weight average molecular weight (Mw) of the urethane-based polymer dispersant is usually 1,000 to 200,000, preferably 2,000 to 100,000, and more preferably 3,000 to 50,000. When it is more than the said lower limit, dispersibility and dispersion stability tend to become favorable, and when it is below the said upper limit, there exists a tendency for the solubility or the fall of a dispersibility to be suppressed easily. On the other hand, as the acrylic polymer dispersant, it is preferable to use an unsaturated group-containing monomer having a functional group (the so-called functional group here is the functional group described as the functional group contained in the polymer dispersant). Random copolymers, graft copolymers, block copolymers of monomers and unsaturated monomers without functional groups. These copolymers can be produced by a known method. As the unsaturated group-containing monomer having a functional group, specific examples include (meth) acrylic acid, 2- (meth) acrylic acid ethoxyethyl succinate, and 2- (methyl phthalate). ) Unsaturated monomers having a carboxyl group, such as acrylic ethoxyethyl ester, 2- (meth) acrylic ethoxy ethyl hexahydrophthalate, acrylic dimer, dimethylamino (meth) acrylate Unsaturated monomers having a tertiary amine group and a quaternary ammonium salt group, such as ethyl ester, diethylaminoethyl (meth) acrylate, and quaternary compounds thereof. These may be used individually by 1 type, and may use 2 or more types together. Examples of the unsaturated group-containing monomer having no functional group include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, N-butyl (meth) acrylate, isobutyl (meth) acrylate, third butyl (meth) acrylate, benzyl (meth) acrylate, phenyl (meth) acrylate, (meth) acrylic ring Hexyl ester, phenoxyethyl (meth) acrylate, phenoxymethyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isomethacrylate (meth) acrylate, tricyclodecane ( (Meth) acrylates, tetrahydrofurfuryl (meth) acrylate, N-vinylpyrrolidone, styrene and its derivatives, α-methylstyrene, N-cyclohexylcis butylenediimine, N-substituted maleimide, N-phenyl maleimide, N-benzyl maleimide, acrylonitrile, vinyl acetate, and poly (meth) acrylate Macromonomers, polystyrene macromonomers, 2-hydroxyethyl (meth) acrylate macromonomers, polyethylene glycol macromonomers, polypropylene glycol macromonomers, polycaprolactone macromonomers, and other macromonomers体 等。 Body and so on. These may be used individually by 1 type, and may use 2 or more types together. The acrylic polymer dispersant is particularly preferably an AB or BAB block copolymer containing an A block having a functional group and a B block having no functional group. In this case, the A block contains The unsaturated group-containing monomer having a functional group may contain a partial structure derived from the unsaturated group-containing monomer having no functional group, and these may be in any state of random copolymerization or block copolymerization. Samples contained in the A block. The content ratio of the functional group-free partial structure in the A block is usually 80% by mass or less, preferably 50% by mass or less, and more preferably 30% by mass or less. The B block contains a partial structure derived from the above-mentioned unsaturated group-containing monomer having no functional group. One B block may contain a partial structure derived from two or more kinds of monomers, and these may be randomly copolymerized or Any aspect of the block copolymerization is contained in the B block. This A-B or B-A-B block copolymer is prepared by the living polymerization method shown below, for example. Regarding the living polymerization method, there are anionic living polymerization method, cationic living polymerization method, and radical living polymerization method. Among them, the polymerization active species of the anion living polymerization method is an anion, and is shown in the following scheme, for example. [Chem 34]In the above process, Ar1 Is a monovalent organic group, Ar2 For Ar1 For different monovalent organic groups, M is a metal atom, and s and t are integers of 1 or more. The polymerization active species of the radical living polymerization method is a radical, and is represented by the following scheme, for example. [Chemical 35]In the above process, Ar1 Is a monovalent organic group, Ar2 For Ar1 Different monovalent organic groups, j and k are integers of 1 or more, Ra Is a hydrogen atom or a monovalent organic group, Rb For Ra Different hydrogen atoms or monovalent organic groups. When synthesizing the acrylic polymer dispersant, Japanese Patent Laid-Open No. 9-62002 can be used; or P. Lutz, P. Masson et al, Polym. Bull. 12, 79 (1984); BC Anderson, GD Andrews et al, Macromolecules, 14, 1601 (1981); K. Hatada, K. Ute, et al, Polym. J. 17, 977 (1985), 18, 1037 (1986); Right Hand Koichi, Putian Koichi, Polymer Processing , 36, 366 (1987); Tomura Toshiyuki and Masahiro Sawamoto, Proceedings of Polymers, 46, 189 (1989); M. Kuroki, T. Aida, J. Am. Chem. Sic, 109, 4737 (1987); Aida Takusan, Inoue Inoue, Organic Synthetic Chemistry, 43, 300 (1985); DY Sogoh, WR Hertler et al, Macromolecules, 20, 1473 (1987) and other known methods. The acrylic polymer dispersant usable in the present invention may be an AB block copolymer or a BAB block copolymer. The A block / B block constituting the copolymer is preferably 1/99 to 80 / 20, particularly preferably 5/95 to 60/40 (mass ratio). By setting it within this range, there is a tendency to ensure the balance between dispersibility and storage stability. In addition, the amount of the quaternary ammonium salt group in 1 g of the AB block copolymer and the BAB block copolymer that can be used in the present invention is usually preferably 0.1 to 10 mmol. By setting it within this range, it is possible to ensure that Good dispersibility. In addition, such a block copolymer usually contains an amine group produced in the manufacturing process, and its amine value is about 1 to 100 mgKOH / g, and from the viewpoint of dispersibility, preferably 10 mgKOH / g Above, more preferably 30 mgKOH / g or more, more preferably 50 mgKOH / g or more, still more preferably 90 mgKOH / g or less, more preferably 80 mgKOH / g or less, and still more preferably 75 mgKOH / g or less . For example, as a combination of the upper limit and the lower limit, 10 to 90 mgKOH / g is preferable, 30 to 80 mgKOH / g is more preferable, and 50 to 75 mgKOH / g is more preferable. Here, the amine value of the dispersant such as these block copolymers is represented by the mass of KOH equal to the alkali amount per 1 g of the solid content component except the solvent in the dispersant sample, and the following method Perform the measurement. As a combination of the upper limit and the lower limit, 10 to 90 mgKOH / g is preferably listed, 30 to 80 mgKOH / g is more preferably listed, and 50 to 75 mgKOH / g is more preferably listed. A 0.5-1.5 g sample of the dispersant was accurately weighed and placed in a 100 mL beaker, and dissolved with 50 mL of acetic acid. Using an automatic titration device with a pH electrode, using 0.1 mol / L HClO4 The solution was subjected to neutralization titration with acetic acid solution. Using the inflection point of the titration pH curve as the end point of the titration, the amine value was obtained according to the following formula. Amine value [mgKOH / g] = (561 × V) / (W × S) [where W is the dispersant sample weighing amount [g], V is the titer at the end of the titration [mL], and S is the dispersion The solid content concentration [mass%] of the agent sample, and the amine value of the block copolymer depends on the presence or absence of the acidic group and type as the source of the acid value, and is generally lower, usually less than 10 mgKOH / g, The weight average molecular weight (Mw) is preferably in the range of 1,000 to 100,000. By setting it as the said range, there exists a tendency for favorable dispersibility to be ensured. When the acrylic polymer dispersant has a quaternary ammonium salt group as a functional group, the specific structure of the acrylic polymer dispersant is not particularly limited. From the viewpoint of dispersibility, it is preferable to have the following formula ( The repeating unit represented by i) (hereinafter sometimes referred to as "repeating unit (i)"). [Chemical 36]In the above formula (i), R31 ~ R33 Are each independently a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent, R31 ~ R33 Two or more of them may be bonded to each other to form a ring structure. R34 Is a hydrogen atom or a methyl group, X is a divalent linking group, and Y is- Is a counter anion. R of the above formula (i)31 ~ R33 The number of carbon atoms in the alkyl group which may have a substituent is not particularly limited, but it is usually 1 or more, preferably 10 or less, and more preferably 6 or less. The combination of the upper limit and the lower limit is preferably 1 to 10, and more preferably 1 to 6. Specific examples of the alkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, and octyl. Among these, methyl, ethyl, and propyl are preferred. , Butyl, pentyl, or hexyl, more preferably methyl, ethyl, propyl, or butyl. In addition, it may be in any shape of a linear shape or a branch shape. Moreover, it may contain cyclic structures, such as a cyclohexyl group and a cyclohexylmethyl group. R of the above formula (i)31 ~ R33 The number of carbon atoms in the aryl group which may have a substituent is not particularly limited, but it is usually 6 or more, preferably 16 or less, and more preferably 12 or less. As a combination of the upper limit and the lower limit, 6 to 16 are more preferable, and 6 to 12 are more preferable. Specific examples of the aryl group include phenyl, methylphenyl, ethylphenyl, dimethylphenyl, diethylphenyl, naphthyl, and anthracenyl. Among these, preferred is Phenyl, methylphenyl, ethylphenyl, dimethylphenyl, or diethylphenyl, more preferably phenyl, methylphenyl, or ethylphenyl. R of the above formula (i)31 ~ R33 The number of carbon atoms in the aralkyl group which may have a substituent is not particularly limited, but it is usually 7 or more, preferably 16 or less, and more preferably 12 or less. As the combination of the upper limit and the lower limit, 7 to 16 are preferably used, and 7 to 12 are more preferably used. Specific examples of the aralkyl group include phenylmethyl (benzyl), phenylethyl (phenethyl), phenylpropyl, phenylbutyl, and phenylisopropyl. Among them, phenylmethyl, phenylethyl, phenylpropyl, or phenylbutyl is preferred, and phenylmethyl or phenylethyl is more preferred. Among these, from the standpoint of dispersion, R31 ~ R33 Preferably, they are each independently an alkyl group or an aralkyl group, and specifically, R is preferable.31 And R33 Are independently methyl or ethyl, and R32 Is phenylmethylene or phenylethyl, more preferably R31 And R33 Is methyl, and R32 Is phenylmethylene. When the acrylic polymer dispersant has a tertiary amine as a functional group, from the viewpoint of dispersibility, it is preferable to have a repeating unit represented by the following formula (ii) (hereinafter sometimes referred to as " Repeating unit (ii) "). [Chemical 37]In the above formula (ii), R35 And R36 Are each independently a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent, R35 And R36 Can also be bonded to each other to form a ring structure, R37 Is a hydrogen atom or a methyl group, and Z is a divalent linking group. In addition, as R in the formula (ii),35 And R36 Among the alkyl groups which may have a substituent, R can be preferably used as R of the above formula (i).31 ~ R33 Illustrated. Similarly, as R in the above formula (ii)35 And R36 Among them, the aryl group which may have a substituent may be preferably used as R of the above formula (i)31 ~ R33 Illustrated. In addition, as R in the formula (ii),35 And R36 Among the aralkyl groups which may have a substituent, R as the above formula (i) may be preferably used.31 ~ R33 Illustrated. Of these, R35 And R36 It is preferably an alkyl group which may independently have a substituent, and more preferably a methyl group or an ethyl group. As R in the above formula (i)31 ~ R33 And R of formula (ii) above35 And R36 Examples of the substituent which the alkyl group, aralkyl group or aryl group may have include a halogen atom, an alkoxy group, a benzamidine group, a hydroxyl group, and the like. Examples of the divalent linking groups X and Z in the formulae (i) and (ii) include an alkylene group having 1 to 10 carbon atoms, an arylene group having 6 to 12 carbon atoms, and -CONH-R43 -Base, -COOR44 -基 [wherein R43 And R44 Is a single bond, an alkylene group having 1 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms, etc., and is preferably -COO-R44 -base. In the above formula (i), Y as a counter anion- , Can be listed: Cl- Br- , I- ClO4 - , BF4 - , CH3 COO- , PF6 - Wait. The content ratio of the repeating unit represented by the above formula (i) is not particularly limited, and from the viewpoint of dispersibility, the content ratio of the repeating unit represented by the above formula (i) and that represented by the above formula (ii) The total content of the repeating unit is preferably 60 mol% or less, more preferably 50 mol% or less, still more preferably 40 mol% or less, even more preferably 35 mol% or less, and more preferably 5 mol% or more, more preferably 10 mol% or more, still more preferably 20 mol% or more, and even more preferably 30 mol% or more. For example, as a combination of the upper limit and the lower limit, 5 to 60 mol% may be preferably listed, 10 to 50 mol% may be more preferably listed, and 20 to 40 mol% may be more preferably listed, particularly preferably. 30 to 40 mole%. In addition, the content ratio of the repeating unit represented by the formula (i) in all the repeating units of the polymer dispersant is not particularly limited, and from the viewpoint of dispersibility, it is preferably 1 mole% or more, more It is preferably 5 mol% or more, further preferably 10 mol% or more, and more preferably 50 mol% or less, more preferably 30 mol% or less, and still more preferably 20 mol% or less. It is 15 mol% or less. For example, as a combination of the upper limit and the lower limit, 1 to 50 mol% may be preferably cited, 5 to 30 mol% may be more preferable, 10 to 20 mol% may be further preferable, and 10 to 20 mol% may be particularly preferable. ~ 15 mole%. In addition, the content ratio of the repeating unit represented by the formula (ii) in all the repeating units of the polymer dispersant is not particularly limited, and from the viewpoint of dispersibility, it is preferably 5 mol% or more. It is preferably 10 mol% or more, further preferably 15 mol% or more, particularly preferably 20 mol% or more, and more preferably 60 mol% or less, more preferably 40 mol% or less, and more preferably It is 30 mol% or less, particularly preferably 25 mol% or less. For example, as a combination of the upper limit and the lower limit, 5 to 60 mol% may be preferably listed, 10 to 40 mol% may be more preferable, and 15 to 30 mol% may be more preferably listed, and even more preferably, 20 to 25 mole%. From the viewpoint of improving compatibility with a binder component such as a solvent and improving dispersion stability, the polymer dispersant preferably has a repeating unit represented by the following formula (iii) (hereinafter sometimes referred to as "repeated" Module (iii) "). [Chemical 38]In the above formula (iii), R40 Ethyl or propyl, R41 Is an alkyl group which may have a substituent, R42 Is a hydrogen atom or a methyl group, and n is an integer of 1-20. R of the above formula (iii)41 The number of carbon atoms in the alkyl group which may have a substituent is not particularly limited, but it is usually 1 or more, preferably 2 or more, and more preferably 10 or less, more preferably 6 or less. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, and 2 to 6 are more preferable. Specific examples of the alkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, and octyl. Among these, methyl, ethyl, and propyl are preferred. , Butyl, pentyl, or hexyl, more preferably methyl, ethyl, propyl, or butyl. In addition, it may be in any shape of a linear shape or a branch shape. Moreover, it may contain cyclic structures, such as a cyclohexyl group and a cyclohexylmethyl group. From the viewpoint of compatibility and dispersibility with a binder component such as a solvent, n in the formula (iii) is preferably 1 or more, more preferably 2 or more, and further preferably 10 or less, and more preferably It is 5 or less. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, and 2 to 5 are more preferable. The content ratio of the repeating unit represented by the above formula (iii) to all repeating units of the polymer dispersant is not particularly limited, but it is preferably 1 mole% or more, and more preferably 2 mole% or more. It is more preferably 4 mol% or more, more preferably 30 mol% or less, more preferably 20 mol% or less, and still more preferably 10 mol% or less. If it exists in the said range, there exists a tendency for compatibility with compatibility with a binder component, such as a solvent, and dispersion stability. For example, as a combination of the upper limit and the lower limit, 1 to 30 mol% is preferable, 2 to 20 mol% is more preferable, and 4 to 10 mol% is more preferable. From the viewpoint of improving the compatibility between the dispersant and a binder component such as a solvent and improving the dispersion stability, the polymer dispersant preferably has a repeating unit represented by the following formula (iv) (hereinafter sometimes referred to as "Repeat Unit (iv)"). [Chemical 39]In the above formula (iv), R38 Is an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent, R39 Is a hydrogen atom or a methyl group. R of the above formula (iv)38 The number of carbon atoms in the alkyl group which may have a substituent is not particularly limited, but it is usually 1 or more, preferably 2 or more, more preferably 4 or more, and more preferably 10 or less, more preferably 8 or less. For example, as a combination of the upper limit and the lower limit, 1 to 10 are preferable, 2 to 8 are more preferable, and 4 to 8 are more preferable. Specific examples of the alkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, and octyl. Among these, methyl, ethyl, and propyl are preferred. , Butyl, pentyl, or hexyl, more preferably methyl, ethyl, propyl, or butyl. In addition, it may be in any shape of a linear shape or a branch shape. Moreover, it may contain cyclic structures, such as a cyclohexyl group and a cyclohexylmethyl group. R of the above formula (iv)38 The number of carbon atoms in the aryl group which may have a substituent is not particularly limited, but it is usually 6 or more, preferably 16 or less, more preferably 12 or less, and even more preferably 8 or less. As a combination of an upper limit and a lower limit, 6 to 16 are preferable, 6 to 12 are more preferable, and 6 to 8 are more preferable. Specific examples of the aryl group include phenyl, methylphenyl, ethylphenyl, dimethylphenyl, diethylphenyl, naphthyl, and anthracenyl. Among these, preferred is Phenyl, methylphenyl, ethylphenyl, dimethylphenyl, or diethylphenyl, more preferably phenyl, methylphenyl, or ethylphenyl. R of the above formula (iv)38 The number of carbon atoms in the aralkyl group which may have a substituent is not particularly limited, but it is usually 7 or more, preferably 16 or less, more preferably 12 or less, and even more preferably 10 or less. As a combination of the upper limit and the lower limit, 7 to 16 are preferable, 7 to 12 are more preferable, and 7 to 10 are more preferable. Specific examples of the aralkyl group include phenylmethyl, phenylethyl, phenylpropyl, phenylbutyl, and phenylisopropyl. Among these, phenylmethyl is preferred. , Phenylethyl, phenylpropyl, or phenylbutyl, more preferably phenylmethyl or phenylethyl. Among these, from the viewpoint of solvent compatibility and dispersion stability, R38 An alkyl group or an aralkyl group is preferable, and a methyl group, an ethyl group, or a phenylmethyl group is more preferable. As R38 Examples of the substituent which the alkyl group may have include a halogen atom and an alkoxy group. Examples of the substituent which the aryl group or aralkyl group may have include a linear alkyl group, a halogen atom, and an alkoxy group. Again, R38 The linear alkyl group includes any of linear and branched ones. In addition, the content ratio of the repeating unit represented by the above formula (iv) in all the repeating units of the polymer dispersant is preferably 30 mol% or more, and more preferably 40 mol from the viewpoint of dispersibility. % Or more, more preferably 50 mol% or more, more preferably 80 mol% or less, and more preferably 70 mol% or less. For example, as a combination of the upper limit and the lower limit, 30 to 80 mol% is preferable, 40 to 80 mol% is more preferable, and 50 to 70 mol% is more preferable. The polymer dispersant may have repeating units other than repeating unit (i), repeating unit (ii), repeating unit (iii), and repeating unit (iv). Examples of such repeating units include styrene-based monomers such as styrene and α-methylstyrene, (meth) acrylic acid-based monomers such as (meth) acrylic acid chloride, and (meth) (Meth) acrylamide-based monomers such as acrylamide, N-methylol acrylamide, vinyl acetate, acrylonitrile, allyl glycidyl ether, butyric glycidyl ether, N-methacryl Recurring units of monomers such as fluorenyl endoline. From the viewpoint of further improving dispersibility, the polymer dispersant preferably includes an A block having repeating units (i) and repeating units (ii), and a polymer dispersant having no repeating units (i) and repeating units (ii). B block block copolymer. The block copolymer is preferably an A-B block copolymer or a B-A-B block copolymer. It has been unexpectedly found that by introducing a quaternary ammonium salt group and a tertiary amine group into the A block, the dispersing ability of the dispersant tends to be significantly improved. The B block preferably has a repeating unit (iii), and more preferably has a repeating unit (iv). The repeating unit (i) and the repeating unit (ii) may be contained in the A block in any form of random copolymerization or block copolymerization. In addition, one A block may contain two or more kinds of repeating units (i) and (ii). In this case, each repeating unit may be contained in any form of random copolymerization or block copolymerization. In the A block. The A block may contain repeating units other than the repeating unit (i) and the repeating unit (ii). Examples of such repeating units include repeating units derived from the (meth) acrylate-based monomer. . The content of the repeating unit (i) and repeating units other than the repeating unit (ii) in the A block is preferably 0 to 50 mol%, more preferably 0 to 20 mol%, and most preferably not in the A block. Contains this repeating unit. The B block may contain repeating units other than repeating units (iii) and (iv). Examples of such repeating units include styrene-based monomers such as styrene and α-methylstyrene. (Meth) acrylic acid monomers such as acrylic acid chloride, (meth) acrylic acid monomers such as (meth) acrylamide, N-methylol acrylamide, vinyl acetate, acrylonitrile , Allyl glycidyl ether, butyric acid glycidyl ether, N-methacryl fluorenyl terminal porphyrin and other monomer repeat units. The content of the repeating unit (iii) and repeating units other than the repeating unit (iv) in the B block is preferably 0 to 50 mol%, more preferably 0 to 20 mol%, and most preferably the B block. This repeat unit is not included. From the viewpoint of improving the dispersion stability, the (f) dispersant is preferably used in combination with the pigment derivative described below. <Other Formulation Ingredients of Photosensitive Coloring Composition> In addition to the above-mentioned components in the photosensitive coloring composition of the present invention, adhesion improving agents such as silane coupling agents, surfactants (coatability improving agents), and pigment derivatives may be appropriately blended. Additives, photoacid generators, crosslinkers, mercapto compounds, polymerization inhibitors, development improvers, ultraviolet absorbers, antioxidants and other additives. (1) Adhesion improving agent The photosensitive coloring composition of the present invention may contain an adhesion improving agent to improve the adhesion to the substrate. As the adhesion improving agent, a silane coupling agent, a phosphate group-containing compound, and the like are preferable. As the type of the silane coupling agent, one of epoxy type, (meth) acrylic type, and amine type may be used alone, or two or more types may be used in combination. Examples of preferred silane coupling agents include (meth) acrylic acid such as 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, and the like. Oxysilanes, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxy Epoxy silanes such as trisilane, 3-glycidyloxypropyltriethoxysilane, urea silanes such as 3-ureidopropyltriethoxysilane, 3-isocyanatopropyltriethoxy Isocyanosilanes such as silanes; especially silane coupling agents of epoxy silanes. The phosphate group-containing compound is preferably a (meth) acrylfluorenyl group-containing phosphate ester, and is preferably represented by the following general formula (g1), (g2), or (g3). [Chemical 40]In the general formulae (g1), (g2), and (g3), R51 Represents a hydrogen atom or a methyl group, l and l 'are integers of 1 to 10, and m is 1, 2 or 3. These phosphate group-containing compounds may be used alone or in combination of two or more. (2) Surfactant The photosensitive coloring composition of the present invention may also contain a surfactant to improve coatability. As the surfactant, for example, various surfactants such as anionic, cationic, nonionic, and amphoteric surfactants can be used. Among them, non-ionic surfactants are preferably used because of the low possibility of adversely affecting each characteristic. Among them, fluorine-based or silicon-based surfactants are effective in terms of coatability. Examples of such a surfactant include TSF4460 (manufactured by Momentive Performance Materials), DFX-18 (manufactured by NEOS), BYK-300, BYK-325, BYK-330 (by BYK-Chemie), KP340 ( (Made by Shin-Etsu Silicone), F-470, F-475, F-478, F-559 (made by DIC), SH7PA (made by Dow Corning Toray), DS-401 (made by Daikin), L-77 (Manufactured by Nippon Unicar), FC4430 (manufactured by 3M), and the like. The surfactant may be used singly or in combination of two or more kinds in any combination and ratio. (3) Pigment derivative The photosensitive coloring composition of the present invention may also contain a pigment derivative as a dispersing aid to improve dispersibility and storage stability. Examples of the pigment derivative include azo-based, phthalocyanine-based, quinacridone-based, benzimidazolone-based, quinophthalone-based, isoindolinone-based, difluorene-based, anthraquinone-based, and indigo Derivatives such as Shihlin system, hydrazone system, peridone system, pyrrolopyrrole dione system, difluorene system, etc. Among them, phthalocyanine system and quinophthalone system are preferred. Examples of the substituent of the pigment derivative include a sulfonic acid group, a sulfonamido group and a quaternary salt thereof, a phthalimidomethyl group, a dialkylamino group, a hydroxyl group, a carboxyl group, and a fluorenyl group. Those bonded to the pigment skeleton directly or via an alkyl group, aryl group, heterocyclic group, etc. are preferably a sulfonic acid group. Furthermore, one pigment skeleton may be substituted with a plurality of such substituents. Specific examples of the pigment derivative include sulfonic acid derivatives of phthalocyanine, sulfonic acid derivatives of quinophthalone, sulfonic acid derivatives of anthraquinone, sulfonic acid derivatives of quinacridone, and pyrrolopyrrole Sulfonic acid derivatives of ketones, sulfonic acid derivatives of difluorene, and the like. These may be used individually by 1 type, and may use 2 or more types together. (4) Photoacid generator The so-called photoacid generator is a compound capable of generating an acid by ultraviolet rays, and is crosslinked by the action of an acid generated during exposure, and by the presence of a crosslinking agent such as a melamine compound. reaction. Among the photoacid generators, those having a high solubility in a solvent, particularly those having a large solubility in a solvent used in the photosensitive coloring composition are preferred, and examples thereof include diphenylphosphonium and xylyl.錪, phenyl (p-anisyl) 錪, bis (m-nitrophenyl) 錪, bis (p-thirdbutylphenyl) 錪, bis (p-chlorophenyl) 錪, bis (n-dodecyl) ) 錪, diaryl fluorene such as p-isobutylphenyl (p-tolyl) fluorene, p-isopropylphenyl (p-tolyl) fluorene, or triaryl fluorene such as triphenyl fluorene, bromide, Or fluoroboride, hexafluorophosphate, hexafluoroarsenate, aromatic sulfonate, tetrakis (pentafluorophenyl) borate, etc., or diphenyl benzamidine methylsulfonium (n-butyl) tris Pyrene organoborates such as phenylborates, or 2-methyl-4,6-bistrichloromethyltri, 2- (4-methoxyphenyl) -4,6-bistrichloromethyl The third compound such as a triphenyl group is not limited thereto. (5) Crosslinking agent A crosslinking agent may be further added to the photosensitive coloring composition of the present invention. For example, a melamine or guanamine-based compound can be used. Examples of such a crosslinking agent include melamine or guanamine-based compounds represented by the following general formula (6). [Chemical 41]In formula (6), R61 Indicates -NR66 R67 Or an aryl group having 6 to 12 carbon atoms, in R61 For -NR66 R67 Base case, R62 , R63 , R64 , R65 , R66 And R67 One of them means -CH2 OR68 Base, in R61 In the case of an aryl group having 6 to 12 carbon atoms, R62 , R63 , R64 And R65 One of them means -CH2 OR68 Base, R62 , R63 , R64 , R65 , R66 And R67 The rest of them independently represent hydrogen or -CH2 OR68 Base, R68 Represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Here, the aryl group having 6 to 12 carbon atoms is typically a phenyl group, a 1-naphthyl group, or a 2-naphthyl group, and an alkyl group, an alkoxy group, a halogen atom, or the like may be bonded to the phenyl or naphthyl group. Substituents. The carbon number of the alkyl group and the alkoxy group may be about 1 to 6, respectively. R68 The alkyl group represented by the above is preferably a methyl group or an ethyl group, especially a methyl group. The melamine-based compound corresponding to the general formula (6), that is, the compound of the following general formula (6-1) includes hexamethylolmelamine, pentamethylolmelamine, tetramethylolmelamine, and hexamethoxymethylmelamine , Pentamethoxymethyl melamine, tetramethoxymethyl melamine, hexaethoxymethyl melamine, etc. [Chemical 42]In formula (6-1), in R62 , R63 , R64 , R65 , R66 And R67 When one of them is aryl, R62 , R63 , R64 And R65 One of them means -CH2 OR68 Base, R62 , R63 , R64 , R65 , R66 And R67 The rest of them independently represent a hydrogen atom or -CH2 OR68 Base, R68 Represents a hydrogen atom or an alkyl group. Also, it corresponds to a guanamine-based compound of the general formula (6), that is, R in the general formula (6)61 The aryl-containing compound includes tetramethylolbenzoguanamine, tetramethoxymethylbenzoguanamine, trimethoxymethylbenzoguanamine, tetraethoxymethylbenzoguanamine, and the like. Furthermore, a crosslinking agent having a methylol group or a methylol alkyl ether group may be used. Examples are given below. 2,6-bis (hydroxymethyl) -4-methylphenol, 4-tert-butyl-2,6-bis (hydroxymethyl) phenol, 5-ethyl-1,3-bis (hydroxymethyl) ) Perhydro-1,3,5-tri-2-one (commonly known as N-ethyldimethyloltrione) or its dimethyl ether body, dimethyloltrimethylene urea or its dimethyl ether body, 3,5-bis (hydroxymethyl) perhydro-1,3,5-fluorenedi-4-one (commonly known as dimethyl methyl urea) or its dimethyl ether body, tetramethylol glyoxal dialkyl Urea or its tetramethyl ether. In addition, these crosslinking agents may be used individually by 1 type, and may use 2 or more types together. Regarding the amount of the cross-linking agent used, the solid content of the photosensitive coloring composition is preferably 0. 1 to 15% by mass, particularly preferably 0. 5 to 10% by mass. (6) Mercapto compound In order to improve the adhesion to the substrate, a mercapto compound may be added as a polymerization accelerator. Examples of the type of the mercapto compound include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, hexamethylene dithiol, sebacyl mercaptan, and 1,4-dimethylmercaptobenzene , Butanediol dithiopropionate, butanediol dithioglycolate, ethylene glycol dithioglycolate, trimethylolpropane trithioglycolate, butanediol dithiopropionate Acid ester, trimethylolpropane trithiopropionate, trimethylolpropane trithioglycolate, pentaerythritol tetrathiopropionate, pentaerythritol tetrathioglycolate, trihydroxyethyl trithio Propionate, ethylene glycol bis (3-mercaptobutyrate), butanediol bis (3-mercaptobutyrate), 1,4-bis (3-mercaptobutyryloxy) butane, trimethylol Propane tris (3-mercaptobutyrate), pentaerythritol tetra (3-mercaptobutyrate), pentaerythritol tri (3-mercaptobutyrate), ethylene glycol bis (3-mercapto isobutyrate), succinic acid Alcohol bis (3-mercaptoisobutyrate), trimethylolpropane tris (3-mercaptoisobutyrate), 1,3,5-tris (3-mercaptobutoxyethyl) -1,3, 5-tri-2,4,6 (1H, 3H, 5H) -trione and other heterocyclic mercapto compounds or aliphatic polyfunctional mercapto compounds Wait. Each of these may be used singly or in combination of two or more kinds. (7) Polymerization inhibitor From the viewpoint of shape control, the photosensitive coloring composition of the present invention may contain a polymerization inhibitor. It is considered that by containing a polymerization inhibitor, the radical polymerization of the lower layer of the coating film is suppressed, so that the taper angle (the angle formed by the support and the cured product in the cross section of the cured product) can be controlled. Examples of the polymerization inhibitor include hydroquinone, hydroquinone monomethyl ether, methyl hydroquinone, methoxyphenol, and 2,6-di-tert-butyl-4-cresol (BHT). Wait. Among these, from the viewpoint of shape control, 2,6-di-tert-butyl-4-cresol is preferred. From the viewpoint of safety to the human body, hydroquinone monomethyl ether and methylhydroquinone are preferred. The polymerization inhibitor preferably contains one kind or two or more kinds. When the (b) alkali-soluble resin is produced, the resin may contain a polymerization inhibitor, and it may be used as the polymerization inhibitor of the present invention, or it may be removed from the resin when the photosensitive coloring composition is produced. In addition, the same or different polymerization inhibitor is added. In the case where the photosensitive coloring composition contains a polymerization inhibitor, its content ratio is not particularly limited, and it is usually 0 in all solid components of the photosensitive coloring composition. 0005 mass% or more, preferably 0. 001 mass% or more, more preferably 0. 01 mass% or more, and usually 0. 3% by mass or less, preferably 0. 2% by mass or less, more preferably 0. 1 mass% or less. When it is set to the above lower limit value or more, it is possible to control the shape, and when it is set to the upper limit value or less, the necessary sensitivity is maintained. For example, as a combination of the upper limit and the lower limit, 0 may be preferably listed. 0005 ～ 0. 3% by mass, more preferably 0. 001 ～ 0. 2% by mass, and may preferably be further enumerated 0. 01 ～ 0. 1% by mass. <Content ratio of each component in the photosensitive coloring composition> In the photosensitive coloring composition of the present invention, the content ratio of the (a) colorant is not particularly limited, and it is included in all solid matter components in the photosensitive coloring composition. It is usually 10 mass% or more, more preferably 20 mass% or more, further preferably 25 mass% or more, even more preferably 30 mass% or more, particularly preferably 32 mass% or more, and most preferably 35 mass% or more. It is preferably 60% by mass or less, more preferably 50% by mass or less, still more preferably 45% by mass or less, still more preferably 40% by mass or less, even more preferably 38% by mass or less, and most preferably 35% by mass. the following. By setting the content ratio of (a) the colorant to be greater than or equal to the above-mentioned lower limit, sufficient light-shielding properties tend to be obtained, and by being set to or below the above-mentioned upper limit, sufficient plate-making characteristics are easily obtained, and It tends to be excellent in electrical reliability. For example, as a combination of the upper limit and the lower limit, 10 to 60% by mass is preferable, 20 to 50% by mass is more preferable, 25 to 45% by mass is more preferable, and 30 to 45% by mass is further preferable. 40% by mass, more preferably 32 to 38% by mass, and even more preferably 35 to 38% by mass. (a1) The content ratio of the organic black pigment is not particularly limited, and it is preferably 5 mass% or more, more preferably 10 mass% or more, and still more preferably 15 mass% of the total solid content of the photosensitive coloring composition. The above is more preferably 40% by mass or less, more preferably 30% by mass or less, still more preferably 25% by mass or less, and even more preferably 20% by mass or less. When it is more than the said lower limit value, sufficient light-shielding property tends to be obtained, and when it is below the said upper limit value, electrical reliability tends to become high. For example, as a combination of the upper limit and the lower limit, 5 to 40% by mass is preferable, 5 to 30% by mass is more preferable, 10 to 25% by mass is even more preferable, and 15 to 20 is particularly preferable. quality%. (a2) C. I. The content ratio of Pigment Blue 60 is not particularly limited, and it is preferably 2% by mass or more, more preferably 3% by mass or more, and still more preferably 4% by mass or more, among the solid components of the photosensitive coloring composition. It is more preferably 6 mass% or more, particularly preferably 8 mass% or more, and most preferably 10 mass% or more. Moreover, it is preferably 15 mass% or less, more preferably 12 mass% or less, still more preferably 10 mass% or less, still more preferably 9 mass% or less, and even more preferably 8 mass% or less. By setting it to be above the lower limit value, the transmittance tends to decrease in the vicinity of 700 nm. By setting it to be below the upper limit value, electrical reliability tends to be high, and sufficient plate-making characteristics tend to be easily obtained. For example, as a combination of the upper limit and the lower limit, 2 to 15% by mass is preferred, 3 to 15% by mass is more preferred, 4 to 12% by mass is even more preferred, and 6 to 12 is particularly preferred. quality%. (a3) The content ratio of the carbon black content ratio is not particularly limited, and it is preferably 1% by mass or more, more preferably 2% by mass or more, and even more preferably 3% of the total solid content of the photosensitive coloring composition. At least 4% by mass, particularly preferably at least 4% by mass, more preferably at most 10% by mass, more preferably at most 9% by mass, still more preferably at least 8% by mass, even more preferably at most 7% by mass, particularly preferably It is 5 mass% or less. When it is set to the above lower limit value or more, sufficient light-shielding property tends to be obtained. When it is set to the above upper limit value or less, the transmittance in the near-infrared region tends to be high. For example, as a combination of the upper limit and the lower limit, 1 to 10% by mass is preferable, 2 to 9% by mass is more preferable, 3 to 8% by mass is even more preferable, and 4 to 4% is even more preferable. 7 mass%, 4 to 5 mass% is particularly preferred. When the photosensitive coloring composition contains a purple pigment as another colorant, the content ratio is not particularly limited, and it is preferably 1% by mass or more, and more preferably 2 in the total solid content of the photosensitive coloring composition. Above 3% by mass, more preferably above 3% by mass, even more preferably above 4% by mass, even more preferably at least 6% by mass, most preferably at least 7% by mass, and still more preferably below 15% by mass, more preferably It is 12% by mass or less, more preferably 10% by mass or less, and particularly preferably 8% by mass or less. When it is more than the said lower limit value, sufficient light-shielding property tends to be obtained, and when it is below the said upper limit value, electrical reliability tends to become high. For example, as a combination of the upper limit and the lower limit, 1 to 15% by mass is preferred, 2 to 12% by mass is more preferred, 3 to 10% by mass is even more preferred, and 4 to 10% is even more preferred. 8% by mass, particularly preferably 6 to 8% by mass, and most preferably 7 to 8% by mass. The content ratio of the (a1) organic black pigment to the total colorant (a) colorant contained in the photosensitive coloring composition is not particularly limited, but is preferably 20% by mass or more, and more preferably 30% by mass or more. It is more preferably 40% by mass or more, even more preferably 50% by mass or more, particularly preferably 60% by mass or more, more preferably 80% by mass or less, more preferably 75% by mass or less, and even more preferably 70% by mass. Mass% or less, particularly preferably 65 mass% or less. When it is more than the said lower limit value, sufficient light-shielding property tends to be obtained, and when it is below the said upper limit value, electrical reliability tends to become high. For example, as a combination of the upper limit and the lower limit, 20 to 80% by mass is preferable, 30 to 80% by mass may be more preferable, 40 to 75% by mass may be more preferable, and 50 to 70 may be further preferable. quality%. (A2) C. I. The content ratio of the pigment blue 60 to the total colorant (a) colorant contained in the photosensitive coloring composition is not particularly limited, but is preferably 10% by mass or more, more preferably 12% by mass or more, and even more preferably 15 mass% or more, more preferably 18 mass% or more, particularly still more preferably 20 mass% or more, particularly still more preferably 24 mass% or more, particularly preferably 28 mass% or more, and more preferably 50 mass% Hereinafter, it is more preferably 40% by mass or less, still more preferably 35% by mass or less, and even more preferably 30% by mass or less. By setting it to be above the lower limit value, the transmittance tends to decrease in the vicinity of 700 nm. By setting it to be below the upper limit value, electrical reliability tends to be high, and sufficient plate-making characteristics tend to be easily obtained. For example, as a combination of the upper limit and the lower limit, 10 to 50% by mass is preferable, 10 to 40% by mass is more preferable, 18 to 40% by mass is even more preferable, and 24-48% is even more preferable. 35 mass%, 28 to 35 mass% is particularly preferred. The content ratio of (a3) carbon black to (a) the total colorant contained in the photosensitive coloring composition is not particularly limited, but is preferably 10% by mass or more, and more preferably 12% by mass or more. It is more preferably 15% by mass or more, still more preferably 18% by mass or more, particularly preferably 20% by mass or more, still more preferably 35% by mass or less, still more preferably 30% by mass or less, and still more preferably 25% by mass. % Or less, particularly preferably 20% by mass or less. When it is set to the above lower limit value or more, sufficient light-shielding property tends to be obtained. When it is set to the above upper limit value or less, the transmittance in the near-infrared region tends to be high. For example, as a combination of the upper limit and the lower limit, 10 to 35% by mass is preferred, 12 to 30% by mass is more preferred, 15 to 25% by mass is even more preferred, and 18 to 20 is particularly preferred. quality%. On the other hand, in order to have both transmittance and electrical reliability in the near-infrared region, it is preferable to adjust the content ratios of the (a1) organic black pigment and (a3) carbon black in the black pigment to appropriate values. Carbon black has a high absorbance in the visible light region, so it has the following tendency: it can effectively reduce the transmittance around the wavelength of 700 nm, and can also reduce the content ratio of the coloring agent required to obtain a specific light-shielding property, and the electrical reliability changes. high. On the other hand, carbon black also has absorption in the near-infrared region. Therefore, it is considered that by containing a specific amount of (a3) carbon black and (a1) organic black pigment at the same time, not only the transmittance near the wavelength of 900 nm can be ensured, but also It can ensure sufficient light shielding. The content ratio of (a1) organic black pigment to 100 parts by mass of (a3) carbon black is usually 150 parts by mass or more, preferably 180 parts by mass or more, more preferably 200 parts by mass or more, and still more preferably 210 parts by mass or more It is more preferably 220 parts by mass or more, still more preferably 250 parts by mass or more, particularly still more preferably 300 parts by mass or more, even more preferably 350 parts by mass or more, even more preferably 400 parts by mass or more, especially It is preferably 450 parts by mass or more, and most preferably 480 parts by mass or more. Furthermore, it is preferably 1,000 parts by mass or less, more preferably 800 parts by mass or less, still more preferably 600 parts by mass or less, and even more preferably 500 parts by mass or less. When it is set to the above lower limit value or more, the transmittance in the near-infrared region tends to be high, and when it is set to the above upper limit value or less, the electrical reliability tends to be high. For example, as a combination of the upper limit and the lower limit, 150 to 1000 parts by mass may be preferably listed, 180 to 800 parts by mass may be more preferably listed, 200 to 800 parts by mass may be further listed, and 210 to 800 parts may be further preferred. 600 parts by mass, more preferably 220 to 600 parts by mass, particularly 250 to 600 parts by mass, more preferably 300 to 600 parts by mass, and even more preferably 350 It is particularly preferably from 600 to 600 parts by mass, more preferably from 400 to 600 parts by mass, more preferably from 450 to 500 parts by mass, and most preferably from 480 to 500 parts by mass. From the viewpoint of having both light-shielding properties and transmittance near a wavelength of 900 nm, it is preferable to adjust the content ratio of all organic pigments to (a3) carbon black to an appropriate value. The content ratio of all organic pigments to 100 parts by mass of (a3) carbon black is usually 300 parts by mass or more, preferably 400 parts by mass or more, more preferably 500 parts by mass or more, still more preferably 550 parts by mass or more, and more It is preferably 600 parts by mass or more, particularly preferably 620 parts by mass or more, most preferably 650 parts by mass or more, more preferably 900 parts by mass or less, and even more preferably 800 parts by mass or less. By setting it to be above the lower limit value, the transmittance tends to be higher near the wavelength of 900 nm, and by setting it to be less than the above upper limit value, sufficient light-shielding properties can be obtained, and the wavelength can be suppressed to 700 nm. The tendency to leak light nearby. For example, as a combination of the upper limit and the lower limit, 300 to 900 parts by mass may be preferably listed, 400 to 900 parts by mass may be more preferred, 500 to 900 parts by mass may be further preferred, and 550 to 900 may be further preferred. 800 parts by mass, more preferably 600 to 800 parts by mass, more preferably 620 to 800 parts by mass, and most preferably 650 to 800 parts by mass. In addition, from the viewpoint of suppressing light leakage around a wavelength of 700 nm, it is preferable that (a2) C. I. The content ratio of Pigment Blue 60 to (a3) carbon black is adjusted to an appropriate value. (a2) C. I. The content ratio of Pigment Blue 60 to 100 parts by mass of (a3) carbon black is preferably 50 parts by mass or more, more preferably 100 parts by mass or more, still more preferably 150 parts by mass or more, and still more preferably 180 parts by mass or more. In particular, it is more preferably 200 parts by mass or more, particularly still more preferably 210 parts by mass or more, particularly preferably 220 parts by mass or more, most preferably 240 parts by mass or more, still more preferably 400 parts by mass or less, more preferably 300 parts by mass. Mass parts or less. By setting it to be above the lower limit value, there is a tendency that light leakage near the wavelength of 700 nm can be suppressed, and by setting it to be less than the above upper limit value, the transmittance near the wavelength of 900 nm tends to be high. For example, as a combination of the upper limit and the lower limit, 50 to 400 parts by mass is preferable, 100 to 400 parts by mass is more preferable, 150 to 400 parts by mass is even more preferable, and 200 to 400 parts is even more preferable. 300 parts by mass, particularly preferably 220 to 300 parts by mass, and most preferably 240 to 300 parts by mass. When the photosensitive coloring composition contains a purple pigment as another colorant, it is preferable to adjust the content ratio of a purple pigment with respect to (a1) an organic black pigment to an appropriate value from a light-shielding viewpoint. The content ratio of the purple pigment to 100 parts by mass of the (a1) organic black pigment is preferably 10 parts by mass or more, more preferably 20 parts by mass or more, still more preferably 40 parts by mass or more, and even more preferably 55 parts by mass or more. In particular, it is more preferably 60 parts by mass or more, particularly preferably 65 parts by mass or more, most preferably 70 parts by mass or more, still more preferably 100 parts by mass or less, even more preferably 90 parts by mass or less, and still more preferably 80 parts by mass. It is more preferably 70 parts by mass or less, and even more preferably 65 parts by mass or less. When it is set to the above lower limit value, sufficient light-shielding property is ensured, and reliability is improved. When it is set to the above upper limit value, light leakage in the vicinity of a wavelength of 700 nm tends to be suppressed. For example, as a combination of the upper limit and the lower limit, 10 to 100 parts by mass may be preferably listed, 20 to 100 parts by mass may be more preferred, 40 to 100 parts by mass may be further preferred, and 55 to 100 parts may be further preferred. 100 to 100 parts by mass, more preferably 60 to 100 parts by mass, more preferably 65 to 90 parts by mass, and most preferably 70 to 90 parts by mass. (b) The content ratio of the alkali-soluble resin is not particularly limited, and it is usually 5 mass% or more, preferably 10 mass% or more, and more preferably 20 mass% in the total solid content of the photosensitive coloring composition of the present invention. 30% by mass or more, more preferably 35% by mass or more, and usually 85% by mass or less, preferably 80% by mass or less, more preferably 70% by mass or less, and still more preferably 60% by mass Mass% or less, more preferably 50 mass% or less, and even more preferably 45 mass% or less. By setting the content ratio of the (b) alkali-soluble resin to the above-mentioned lower limit value or more, it is possible to suppress the decrease in the solubility of the unexposed portion in the developing solution and to suppress the development failure. Furthermore, by setting it to be equal to or less than the above-mentioned upper limit value, it is possible to maintain a moderate sensitivity, prevent the exposed portion from dissolving in the developing solution, and reduce the sharpness and adhesion of the pixels. For example, as a combination of the upper limit and the lower limit, for example, 10 to 85% by mass is preferable, 20 to 80% by mass is more preferable, 30 to 70% by mass is even more preferable, and 35 to 70% by mass is even more preferable. -60% by mass, more preferably 40-60% by mass, and even more preferably 40-50% by mass. (b1) The content ratio of the epoxy (meth) acrylate resin is not particularly limited, and it is usually 5 mass% or more, and preferably 10 mass%, in the total solid content of the photosensitive coloring composition of the present invention. Above, more preferably 15% by mass or more, further preferably 20% by mass or more, particularly preferably 25% by mass or more, and usually 45% by mass or less, preferably 40% by mass or less, and more preferably 35% by mass the following. By setting it above the lower limit value, the solubility of the unexposed portion in the developing solution tends to be ensured, and by setting it below the above upper limit value, a moderate sensitivity is maintained, and the exposed portion can be suppressed from developing. Dissolution occurs in the liquid, and it is possible to suppress the tendency of the sharpness or the decrease of the adhesion of the pixels to be reduced. For example, as a combination of the upper limit and the lower limit, 5 to 45% by mass is preferable, 10 to 40% by mass is more preferable, 15 to 40% by mass is even more preferable, and 20 to 40% is further more preferable. 35 mass%, 25 to 35 mass% is particularly preferred. (b) The content ratio of (b1) epoxy (meth) acrylate resin contained in the alkali-soluble resin is not particularly limited, but is usually 20% by mass or more, preferably 30% by mass or more, and more preferably 40% by mass. It is usually 90% by mass or less, preferably 85% by mass or less, and more preferably 80% by mass or less. By setting it above the lower limit value, the solubility of the unexposed portion in the developing solution tends to be ensured, and by setting it below the above upper limit value, a moderate sensitivity is maintained, and the exposed portion can be suppressed from developing. Dissolution occurs in the liquid, and it is possible to suppress the tendency of the sharpness or the decrease of the adhesion of the pixels to be reduced. For example, as a combination of the upper limit and the lower limit, 20 to 90% by mass is preferable, 30 to 85% by mass is more preferable, and 40 to 80% by mass is more preferable. (c) The content ratio of the photopolymerization initiator is not particularly limited, and it is usually 0 in the total solid content of the photosensitive coloring composition of the present invention. 1 mass% or more, preferably 0. 5 mass% or more, more preferably 1 mass% or more, still more preferably 2 mass% or more, still more preferably 3 mass% or more, particularly preferably 4 mass% or more, and usually 15 mass% or less, preferably It is 10% by mass or less, more preferably 8% by mass or less, and even more preferably 7% by mass or less. When the content ratio of the (c) photopolymerization initiator is set to the above lower limit value or more, the sensitivity decrease tends to be suppressed. When the content ratio of the photopolymerization initiator is set to the above upper limit value or less, the unexposed portion in the developer can be suppressed. The lowered solubility reduces the tendency for poor development. For example, as a combination of the upper limit and the lower limit, 0 may be preferably listed. 1 to 15% by mass, more preferably 0. 5 to 10% by mass, more preferably 1 to 8% by mass, more preferably 2 to 8% by mass, even more preferably 3 to 8% by mass, and most preferably 4 to 7% by mass %. When a polymerization accelerator is used together with the (c) photopolymerization initiator, the content ratio of the polymerization accelerator is not particularly limited, and it is preferably 0 among all solid components of the photosensitive coloring composition of the present invention. . 05 mass% or more, and usually 10 mass% or less, preferably 5 mass% or less, the polymerization accelerator is preferably 100 parts by mass with respect to (c) the photopolymerization initiator and is usually 0. 1 to 50 parts by mass, especially 0. Use at a ratio of 1 to 20 parts by mass. By setting the content ratio of the polymerization accelerator to be above the lower limit value, there is a tendency that the decrease in sensitivity to exposure light can be suppressed. By setting it to be below the upper limit value, the unexposed portion can be suppressed from being contained in the developing solution. The lowered solubility reduces the tendency for poor development. When the sensitizing dye is used together with the (c) photopolymerization initiator, the content ratio of the sensitizing dye is not particularly limited. From the viewpoint of sensitivity, all solids in the photosensitive coloring composition are used. Among the components, it is usually 20% by mass or less, preferably 15% by mass or less, and more preferably 10% by mass or less. (d) The content ratio of the ethylenically unsaturated compound is not particularly limited, and it is usually 1% by mass or more, preferably 5% by mass or more, and more preferably 5% by mass or more in the total solid content of the photosensitive coloring composition of the present invention. It is 10% by mass or more, and usually 30% by mass or less, preferably 20% by mass or less, and more preferably 15% by mass or less. By setting it to be above the lower limit value, it is possible to maintain a moderate sensitivity, prevent the exposure portion from dissolving in the developing solution, and suppress the decrease in sharpness or adhesiveness of the pixel. Below the limit, there is a tendency that the permeability of the developer to the exposed portion is suppressed to be high, and a good image tends to be easily obtained. For example, as a combination of the upper limit and the lower limit, 1 to 30% by mass is preferable, 5 to 20% by mass is more preferable, and 10 to 15% by mass is more preferable. Furthermore, the photosensitive coloring composition of the present invention uses the (e) solvent to adjust the content ratio of all solid components to usually 5 mass% or more, preferably 10 mass% or more, and more preferably 15 mass%. The above is usually 50% by mass or less, preferably 30% by mass or less, and more preferably 25% by mass or less. For example, as a combination of the upper limit and the lower limit, 5 to 50% by mass is preferable, 10 to 30% by mass is more preferable, and 15 to 25% by mass is more preferable. (f) The content ratio of the dispersant is not particularly limited, and it is usually 1% by mass or more, preferably 3% by mass or more, and more preferably 5% by mass or more in the total solid content of the photosensitive coloring composition. It is usually 30% by mass or less, preferably 20% by mass or less, more preferably 15% by mass or less, and even more preferably 10% by mass or less. When it is set to the above lower limit value or more, sufficient dispersibility tends to be easily obtained. When it is set to the above upper limit value or less, it is possible to suppress a decrease in sensitivity, plate-making property, and the like caused by a relative decrease in the ratio of other components. The tendency. For example, as a combination of the upper limit and the lower limit, 1 to 30% by mass is preferable, 3 to 20% by mass is more preferable, 5 to 15% by mass is even more preferable, and 5 to 10 is particularly preferable. quality%. The content ratio of (f) dispersant to 100 parts by mass of (a) colorant is usually 5 parts by mass or more, more preferably 10 parts by mass or more, still more preferably 15 parts by mass or more, and usually 50 parts by mass It is particularly preferably 30 parts by mass or less. When it is set to the above lower limit value or more, sufficient dispersibility tends to be easily obtained. When it is set to the above upper limit value or less, it is possible to suppress a decrease in sensitivity, plate-making property, and the like caused by a relative decrease in the ratio of other components. The tendency. For example, as a combination of the upper limit and the lower limit, 5 to 50 parts by mass, more preferably 10 to 30 parts by mass, and even more preferably 15 to 30 parts by mass can be cited. On the other hand, the content ratio of (b) the alkali-soluble resin to 100 parts by mass of the (d) ethylenically unsaturated compound is usually 80 parts by mass or more, preferably 100 parts by mass or more, more preferably 150 parts by mass or more, and further It is preferably 200 parts by mass or more, particularly preferably 250 parts by mass or more, and usually 700 parts by mass or less, preferably 500 parts by mass or less, more preferably 400 parts by mass or less, and still more preferably 300 parts by mass or less. By setting it to be above the lower limit value, there is a tendency that the state of dissolution and development is moderate without peeling or the like, and by setting it to be below the upper limit value, there is a tendency that an appropriate dissolution time for the developer can be obtained. For example, as a combination of the upper limit and the lower limit, 80 to 700 parts by mass may be preferably used, 100 to 500 parts by mass may be more preferably used, and 150 to 400 parts by mass may be more preferably used, and 200 may be particularly preferably used. -300 parts by mass, preferably 250 to 300 parts by mass. In the case of using the adhesion improving agent, its content ratio is not particularly limited, and it is usually 0 in all solid matter components of the photosensitive coloring composition. 1 to 5 mass%, preferably 0. 2 to 3% by mass, more preferably 0. 4 to 2% by mass. When the content ratio of the adhesion-improving agent is set to the above lower limit value or more, there is a tendency that the effect of improving the adhesion can be sufficiently obtained. When it is set to the above-mentioned upper limit value or less, it is possible to suppress a decrease in sensitivity or to suppress after development. Residues tend to become defects. Also, in the case of using a surfactant, its content ratio is not particularly limited, and it is usually 0 in all solid components of the photosensitive coloring composition. 001 to 10% by mass, preferably 0. 005 ～ 1 mass%, more preferably 0. 01 ～ 0. 5% by mass, preferably 0. 03 ～ 0. 3% by mass. When the content ratio of the surfactant is set to the above lower limit value or more, the coating film tends to be smooth and uniform. By setting the content ratio to the upper limit value or less, the coating film is not only easily made. It exhibits smoothness, uniformity, and also suppresses the tendency of deterioration of other characteristics. <Physical properties of photosensitive coloring composition> The photosensitive coloring composition of the present invention can be preferably used to form a colored spacer, and from the viewpoint of use as a colored spacer, it is preferably black. Also, the optical density (OD) of the coating film per 1 μm film thickness is preferably 1. Above 0, more preferably 1. 2 or more, more preferably 1. 3 or more, more preferably 1. 4 or more, especially preferred 1. 5 or more, preferably 1. Above 8 and again, usually 4. 0 or less, preferably 3. 0 or less, more preferably 2. 5 or less. For example, as a combination of the upper limit and the lower limit, 1. 0 to 4. 0, can be better enumerated 1. 2 to 3. 0, which can be more preferably enumerated 1. 3 to 3. 0, which can be even better enumerated 1. 4 to 3. 0, particularly preferably 1. 5 ～ 3. 0, which is best enumerated 1. 8 to 2. 5. Also, the transmittance of the photosensitive coloring composition of the present invention at a wavelength of 700 nm is preferably 2. 5% or less, more preferably 2. 0% or less, further preferably 1. Below 5%, again, usually 0. 01% or more. By setting it below the above-mentioned upper limit value, there is a tendency that light leakage at a wavelength of 700 nm can be suppressed and redness of a displayed image can be suppressed. As a combination of the upper limit and the lower limit, 0 may be preferably cited. 01 ～ 2. 5%, better to enumerate 0. 01 ～ 2. 0%, which can be further preferably listed as 0. 01 ～ 1. 5%. On the other hand, the transmittance of the photosensitive coloring composition of the present invention at a wavelength of 900 nm is preferably 10% or more, more preferably 15% or more, still more preferably 20% or more, and usually 100% or less. The combination of the upper limit and the lower limit is preferably 10 to 100%, more preferably 15 to 100%, and even more preferably 20 to 100%. Generally speaking, a color filter including a black matrix and pixels is formed directly on a glass substrate, so the alignment of the mask used to form the black matrix will not be a problem. On the other hand, the colored spacers may be formed on the array substrate (the substrate on the TFT side). In this case, the colored spacers need to be aligned with the positions of the TFT patterns on the substrate. As a method for forming a colored spacer at a specific position, a method of aligning the position of a photomask by reading a mark on an array substrate using light near a wavelength of 900 nm may be mentioned. However, when performing position alignment, the mark is used for The coating film forming the colored spacer is coated, and therefore the transmittance of the coating film at a wavelength of 900 nm becomes important or more important. Therefore, by setting the transmittance at a wavelength of 900 nm or more to the above lower limit value, the visibility of the mark is improved, and a colored spacer tends to be easily formed at a specific position. Regarding the transmittance of the photosensitive coloring composition at a wavelength of 700 nm or 900 nm, as long as the photosensitive coloring composition is used to form a film thickness of 2. For a 5 μm hardened film, use a spectrophotometer to measure the transmittance at a wavelength of 700 nm or 900 nm. The detailed measurement conditions and the like are not particularly limited, and for example, the measurement can be performed by a method described in the following Examples. <The manufacturing method of a photosensitive coloring composition> The photosensitive coloring composition (henceforth a "resist") of this invention is manufactured according to a conventional method. In general, it is preferable to disperse the (a) colorant using a paint conditioner, a sand mill, a ball mill, a roll mill, a stone mill, a jet mill, a homogenizer, or the like in advance. (a) Since the colorant becomes micronized by the dispersion treatment, the coating characteristics of the resist are improved. The dispersion treatment is usually preferably performed in a system in which (a) a colorant, (e) a solvent, and (f) a dispersant, and part or all of (b) an alkali-soluble resin are used in combination (hereinafter, dispersion may be performed in some cases). The treated mixture and the composition obtained by this treatment are called "ink" or "pigment dispersion"). In particular, if a polymer dispersant is used as the (f) dispersant, it is preferable that the viscosity of the ink and resist obtained over time is prevented from increasing (excellent dispersion stability). As described above, in the step of producing the resist, it is preferable to produce a pigment dispersion liquid containing at least (a) a colorant, (e) a solvent, and (f) a dispersant. As the (a) colorant, (e) organic solvent, and (f) dispersant that can be used in the pigment dispersion liquid, respectively, it can be preferably used as a colorant, solvent, and dispersant that can be used in the photosensitive coloring composition. Each recorded. Regarding the content ratio of each colorant of the (a) colorant in the pigment dispersion liquid, those described as the content ratio in the photosensitive coloring composition can also be preferably used. Furthermore, when the liquid containing all the components to be blended in the photosensitive coloring composition is subjected to a dispersion treatment, there is a possibility that the highly reactive component may be modified due to heat generated during the dispersion treatment. Therefore, it is preferable to perform the dispersion treatment in a system containing a polymer dispersant. In the case of using a sand mill to disperse (a) colorant, it is preferred to use a particle size of 0. Glass beads or zirconia beads of about 1 to 8 mm. Regarding the dispersion treatment conditions, the temperature is usually in the range of 0 ° C to 100 ° C, preferably in the range of room temperature to 80 ° C. The appropriate dispersion time varies depending on the composition of the liquid and the size of the dispersion processing device, and so is appropriately adjusted. The standard for dispersion is to control the gloss of the ink so that the 20-degree specular gloss of the resist (JIS Z8741) is in the range of 50 to 300. When the gloss of the resist is low, the dispersion treatment is insufficient, and rough pigment (colorant) particles are often left, and the developability, adhesion, and resolution may be insufficient. In addition, if the dispersion treatment is performed until the gloss value exceeds the above-mentioned range, the pigment is broken and a large amount of ultrafine particles are generated, and therefore the dispersion stability tends to be impaired. Also, the dispersed particle size of the pigment dispersed in the ink is usually 0. 03 ～ 0. 3 μm, measured by a dynamic light scattering method or the like. Then, the ink obtained by the dispersion process is mixed with the other components to be contained in the resist to prepare a uniform solution. During the manufacturing process of the resist, fine dirt may be mixed into the liquid. Therefore, it is preferable to filter the obtained resist with a filter or the like. [Hardened product] The cured product can be obtained by hardening the photosensitive coloring composition of the present invention. A cured product obtained by curing the photosensitive coloring composition can be suitably used as a colored spacer. [Colored spacer] Next, a colored spacer using the photosensitive coloring composition of the present invention will be described based on its manufacturing method. (1) Support As a support for forming a colored spacer, the material is not particularly limited as long as it has a moderate strength. Transparent substrates are mainly used. Examples of the material include polyester resins such as polyethylene terephthalate, polyolefin resins such as polypropylene and polyethylene, polycarbonate, polymethyl methacrylate, and polyfluorene. And other thermoplastic resin sheets; epoxy resins, unsaturated polyester resins, poly (meth) acrylic resins and other thermosetting resin sheets; or various glass and so on. Among them, glass and a heat-resistant resin are preferred from the viewpoint of heat resistance. In addition, transparent electrodes such as ITO (Indium Tin Oxides) and IZO (Indium Zinc Oxide) may be formed on the surface of the substrate. Besides a transparent substrate, it may be formed on a TFT array. In order to improve surface properties such as adhesion, the support may be subjected to a corona discharge treatment, an ozone treatment, a silane coupling agent, or a film forming treatment using various resins such as a urethane resin, if necessary. The thickness of the transparent substrate is usually set to 0. 05 to 10 mm, preferably 0. 1 to 7 mm range. Also, in the case of a thin film forming treatment of various resins, its film thickness is usually 0. 01 ～ 10 μm, preferably 0. 05 to 5 μm. (2) Colored spacers The photosensitive colored composition of the present invention can be used for the same applications as the known photosensitive colored compositions for color filters. The following cases are used as colored spacers (black photosensitive spacers). The specific example of the method for forming a black photosensitive spacer using the photosensitive coloring composition of this invention is demonstrated. The photosensitive coloring composition is usually supplied to the substrate to be provided with a black photosensitive spacer in a film shape or a pattern by a method such as coating, and the solvent is dried. Then, pattern formation is performed by a method such as photolithography in which exposure and development are performed. After that, a black photosensitive spacer is formed on the substrate by performing additional exposure or thermosetting treatment if necessary. (3) Formation of colored spacers [1] Supply method to substrate The photosensitive coloring composition of the present invention is usually supplied to a substrate in a state of being dissolved or dispersed in a solvent. The supply method can be performed by a conventionally known method such as a spin coating method, a bar coating method, a flow coating method, a die coating method, a roll coating method, or a spray coating method. In addition, they may be supplied in a pattern by an inkjet method, a printing method, or the like. Among them, if the nozzle coating method is used, the amount of coating liquid used can be greatly reduced, and it is completely free from the influence of mist and the like attached when the spin coating method is used, thereby suppressing the comprehensive viewpoint of foreign matter generation and the like. Speak better. The coating amount varies depending on the application, for example, in the case of a black photosensitive spacer, as a dry film thickness, usually 0. 5 μm to 10 μm, preferably 1 μm to 9 μm, and most preferably 1 μm to 7 μm. In addition, it is important that the thickness of the dry film or the height of the spacers eventually formed is uniform throughout the substrate. When the difference is large, the LCD panel may have uneven defects. Among them, when the photosensitive coloring composition of the present invention is used to form black photosensitive spacers of different heights at one time by a photolithography method, the heights of the black photosensitive spacers finally formed are different. As the substrate, a known substrate such as a glass substrate can be used. The surface of the substrate should be flat. [2] Drying method The drying after the photosensitive coloring composition solution is supplied onto the substrate is preferably performed by a drying method using a hot plate, an IR oven, or a convection oven. In addition, a reduced-pressure drying method for drying in a reduced-pressure chamber without increasing the temperature may be used in combination. The drying conditions can be appropriately selected according to the type of the solvent component, the performance of the dryer used, and the like. As the drying time, it is usually selected in the range of 15 seconds to 5 minutes at a temperature of 40 ° C to 130 ° C, and preferably 50 ° C to 110 ° C, according to the type of the solvent component and the performance of the dryer used. The temperature can be selected from 30 seconds to 3 minutes. [3] Exposure method Exposure is performed by superposing a negative mask pattern on a coating film of a photosensitive coloring composition, and irradiating the mask pattern with a light source of ultraviolet or visible light through the mask pattern. In the case of using an exposure mask for exposure, a method of bringing the exposure mask close to the coating film of the photosensitive coloring composition; or arranging the exposure mask away from the coating film of the photosensitive coloring composition A method of projecting the light exposed through the exposure mask. It is also possible to adopt a method of scanning exposure using laser light without using a mask pattern. At this time, in order to prevent the sensitivity of the photopolymerizable layer from being reduced due to oxygen, if necessary, exposure can be performed in a deoxidized environment, or an oxygen barrier layer such as a polyvinyl alcohol layer can be formed on the photopolymerizable layer and then exposed. As a preferred aspect of the present invention, in the case where black photosensitive spacers of different heights are simultaneously formed by the photolithography method, for example, an exposure mask having a light-shielding portion (a transmittance of 0%) and a plurality of opening portions is used. The plurality of openings have openings (semi-transmissive openings) having a smaller average transmittance than the openings having the highest average transmittance (completely transmitting openings). According to this method, the difference in the residual film rate is caused by the difference between the average transmittance of the semi-transmissive opening and the fully-transmissive opening, that is, the difference in exposure. As for the semi-transmissive opening, for example, a method using a matrix-shaped light-shielding pattern having a minute polygonal light-shielding element is known. In addition, as the absorber, a method in which the transmittance is controlled by using a film of a material such as a chromium-based, molybdenum-based, tungsten-based, or silicon-based material is known. The light source used for the above exposure is not particularly limited. Examples of the light source include xenon lamps, halogen lamps, tungsten lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, medium-pressure mercury lamps, low-pressure mercury lamps, carbon arcs, and fluorescent lamps, or argon ion lightning Laser, YAG (Yttrium Aluminum Garnet) laser, excimer laser, nitrogen laser, helium-cadmium laser, blue-violet semiconductor laser, near-infrared semiconductor laser and other laser light sources. When using light of a specific wavelength, an optical filter can also be used. The optical filter may be, for example, a thin film type capable of controlling the transmittance at the exposure wavelength. Examples of the material used in this case include Cr compounds (such as oxides, nitrides, oxynitrides, and fluorides of Cr). ), MoSi, Si, W, Al, etc. As exposure, usually 1 mJ / cm2 Above, preferably 5 mJ / cm2 Above, more preferably 10 mJ / cm2 Above, again, usually 300 mJ / cm2 Below, preferably 200 mJ / cm2 Below, more preferably 150 mJ / cm2 the following. In the case of the proximity exposure method, the distance between the exposure target and the mask pattern is usually 10 μm or more, preferably 50 μm or more, more preferably 75 μm or more, and usually 500 μm or less, preferably It is 400 μm or less, and more preferably 300 μm or less. [4] Development method After the above exposure, an aqueous solution of an alkaline compound or an organic solvent is used for development, whereby an image pattern can be formed on a substrate. The aqueous solution may further contain a surfactant, an organic solvent, a buffer, a complexing agent, a dye, or a pigment. Examples of the basic compound include sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium silicate, potassium silicate, sodium metasilicate, sodium phosphate, Inorganic basic compounds such as potassium phosphate, sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, ammonium hydroxide, or monoethanolamine, diethanolamine or triethanolamine, monomethylamine, dimethylamine, or trimethylamine , Monoethylamine, diethylamine or triethylamine, monoisopropylamine or diisopropylamine, n-butylamine, monoisopropanolamine, diisopropanolamine or triisopropanolamine, ethyleneimine, Organic basic compounds such as ethyldiimide, tetramethylammonium hydroxide (TMAH), and choline. These basic compounds may be a mixture of two or more kinds. Examples of the surfactant include polyoxyethylene alkyl ethers, polyoxyethylene alkylaryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, and glycerol monoalkyl esters. Nonionic surfactants such as esters, anionic interfaces such as alkylbenzenesulfonates, alkylnaphthalenesulfonates, alkylsulfates, alkylsulfonates, sulfosuccinates, etc. Active agents, amphoteric surfactants such as alkyl betaines and amino acids. Examples of the organic solvent include isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol, and diacetone alcohol. The organic solvent may be used alone or in combination with an aqueous solution. The conditions for the development treatment are not particularly limited. Generally, the development temperature is in the range of 10 to 50 ° C. Among them, preferably 15 to 45 ° C, and particularly preferably 20 to 40 ° C. The development method may be a dip development method or a jet development method. , Brush development method, ultrasonic development method and any other method. [5] Additional exposure and thermal curing treatment For the substrate after development, if necessary, additional exposure can be performed by the same method as the above-mentioned exposure method, or thermal curing treatment can be performed. Regarding the heat curing treatment conditions at this time, the temperature is selected in the range of 100 ° C to 280 ° C, preferably 150 ° C to 250 ° C, and the time is selected in the range of 5 minutes to 60 minutes. The size or shape of the colored spacer of the present invention is appropriately adjusted according to the specifications of the color filter to which it is applied, and the photosensitive coloring composition of the present invention can be used to form spacers and sub-substrates at the same time by photolithography. Black photosensitive spacers having different heights of the spacers. In this case, the height of the spacers is usually about 2 to 7 μm, and the height of the sub-spacers is usually about 0.2 to 1.5 μm lower than the height of the spacers. In addition, the optical density (OD) per 1 μm of the colored spacer of the present invention is preferably 1.2 or more, more preferably 1.5 or more, and further preferably 1.8 or more from the viewpoint of light-shielding properties, and is usually 4.0. Hereinafter, it is preferably 3.0 or less. Here, the optical density (OD) is a value measured by the following method. For example, as a combination of the upper limit and the lower limit, 1.2 to 4.0 may be preferably used, 1.5 to 3.0 may be more preferably used, and 1.8 to 3.0 may be more preferably used. [Color filter] The color filter can form pixel colored layers of red, green, and blue on a liquid crystal drive substrate (array substrate). Alternatively, a pixel colored layer may be formed on a glass substrate as a transparent substrate. [Image display device] The image display device of the present invention includes the colored spacer of the present invention as described above. For example, an alignment film is formed on a liquid crystal drive substrate (array substrate) having the colored spacer of the present invention, and a liquid crystal cell is formed by bonding with an opposite electrode substrate, and liquid crystal is injected into the formed liquid crystal cell, thereby manufacturing the device having the present invention. An image display device such as a liquid crystal display device of the colored spacer of the invention. On the other hand, the colored spacer of the present invention is provided on the opposite electrode substrate side, and is bonded to a liquid crystal drive substrate (array substrate) to form a liquid crystal cell, and liquid crystal is injected into the formed liquid crystal cell. An image display device such as a liquid crystal display device of the colored spacer of the invention. For example, as described in Japanese Patent Application Laid-Open No. 2014-215614, liquid crystal is injected into a liquid crystal cell using a specific alignment substance, and then ultraviolet rays are irradiated to improve the alignment of the liquid crystal. [Examples] Next, the present invention will be described more specifically with reference to examples and comparative examples. However, the present invention is not limited to the following examples as long as they do not exceed the gist thereof. The constituents of the photosensitive coloring composition used in the following examples and comparative examples are as follows. <Alkali-soluble resin-I> Stir 145 parts by mass of propylene glycol monomethyl ether acetate while replacing with nitrogen, and heat up to 120 ° C. To this, 10 parts by mass of styrene, 85.2 parts by mass of glycidyl methacrylate, and 66 parts by mass of monomethacrylate (FA-513M manufactured by Hitachi Chemical Co., Ltd.) having a tricyclodecane skeleton were added dropwise, and it took 3 hours. 8.47 parts by mass of 2,2'-azobis-2-methylbutyronitrile was added dropwise, and stirring was continued at 90 ° C for 2 hours. Next, the inside of the reaction container was replaced with air, 0.7 parts by mass of tridimethylaminomethylphenol and 0.12 parts by mass of hydroquinone were added to 43.2 parts by mass of acrylic acid, and the reaction was continued at 100 ° C. for 12 hours. Thereafter, 56.2 parts by mass of tetrahydrophthalic anhydride (THPA) and 0.7 parts by mass of triethylamine were added, and the mixture was reacted at 100 ° C for 3.5 hours. The weight-average molecular weight Mw of the alkali-soluble resin-I thus obtained measured by GPC was about 8400, and the acid value was 80 mgKOH / g. <Alkali-soluble resin-II> "ZCR-1664H" (Mw = 6500, acid value = 60 mgKOH / g) manufactured by Nippon Kayaku Co., Ltd. <Pigment-I> "Irgaphor (registered trademark) Black S 0100 CF" manufactured by BASF "(Has a chemical structure represented by the following formula (I-1)). This corresponds to the colorant (a1). [Chemical 43]<Pigment-II> C.I. Pigment Blue 60. This corresponds to the colorant (a2). <Pigment-III> Carbon black. "RAVEN 1060U" manufactured by Birla (formerly "R1060" manufactured by Columbia). This corresponds to the colorant (a3). <Pigment-IV> C.I. Pigment Blue 15: 6. <Pigment-V> C.I. Pigment Violet 29. <Pigment-VI> "Paliogen (registered trademark) Black L0086" manufactured by BASF. Dark. An organic black pigment other than the colorant (a1). <Dispersant-I> "BYK-LPN21116" manufactured by BYK-Chemie (including A block having a quaternary ammonium salt group and a tertiary amine group in a side chain, and no quaternary ammonium salt group and a tertiary amine group B-block acrylic AB block copolymer. Amine value is 70 mgKOH / g. Acid value is 1 mgKOH / g or less) The A block of Dispersant-I contains the following formulae (1a) and (2a) The repeating unit includes a repeating unit of the following formula (3a) in the B block. The content ratios of the repeating units of the following formulae (1a), (2a), and (3a) to all the repeating units of the dispersant-I are 11.1 mole%, 22.2 mole%, and 6.7 mole%, respectively. [Chemical 44]<Dispersant-II> "DISPERBYK-167" (urethane-based polymer dispersant) manufactured by BYK-Chemie Corporation <Pigment Derivatives> "Solsperse 12000" manufactured by Lubrizol Corporation <Solvent-I> PGMEA: Propanediol Monomer Methyl ether acetate <solvent-II> MB: 3-methoxy-1-butanol <photopolymerization initiator-I> An oxime ester initiator having a chemical structure described below. [Chemical 45]<Photopolymerizable monomer> DPHA: Dipentaerythritol hexaacrylate manufactured by Nippon Kayaku Co., Ltd. <Additives> "KAYAMER PM-21" (methacryl fluorenyl phosphate-containing ester) manufactured by Nippon Kayaku Corporation <surfactant > "MEGAFAC F-559" manufactured by DIC Corporation <Preparation of Pigment Dispersions 1, 2, 4, 5, and 6> The pigments, dispersants, and dispersing aids described in Table 1 are made into the mass ratios described in Table 1. , Alkali soluble resin and solvent are mixed. Using a paint shaker, the mixed solution was dispersed for 3 hours in a range of 25 to 45 ° C. As the beads, 0.5 mmf zirconia beads were used, and the added mass was 2.5 times that of the dispersion. After the dispersion was completed, the beads and the dispersion liquid were separated by a filter to prepare pigment dispersion liquids 1, 2, 4, 5, and 6. Furthermore, the pigment-VI was dispersed under the same conditions as the pigment dispersion liquid 2, and as a result, the viscosity was greatly increased. Therefore, it is necessary to set the content ratio of the dispersant in the pigment dispersion liquid 6 to the pigment to be high. [Table 1] <Preparation of Pigment Dispersion Liquid 3> The pigments, dispersants, dispersing aids, alkali-soluble resins, and solvents described in Table 1 were mixed so as to have a mass ratio described in Table 1, and the dispersion treatment time was changed to 6 hours. Other than that, dispersion was performed by the same method as the pigment dispersion liquids 1, 2, 4, 5, and 6 to prepare a pigment dispersion liquid 3. [Examples 1 to 12 and Comparative Examples 1 to 5] Using the pigment dispersion liquids 1 to 6 prepared as described above, the other components were added so that the ratio of the solid component became the blending ratio of Tables 2 to 5, and all A PGMEA was added so that the content ratio of the solid component was 19% by mass, and the solution was stirred and dissolved to prepare a photosensitive coloring composition, which was evaluated by the following method. <Measurement of optical density (unit OD value) and transmittance per unit film thickness> The optical density per unit film thickness is measured by the following procedure. First, each of the prepared photosensitive coloring compositions was coated on a glass substrate using a spin coater so that the film thickness after post-baking became 2.5 μm. After drying under reduced pressure for 1 minute, a hot plate was used. Dry at 90 ° C for 90 seconds. Thereafter, a high-pressure mercury lamp was used at 400 mJ / cm2 , Illumination 45 mW / cm2 The entire surface was exposed under the exposure conditions, and the substrate was coated with a resist by heating (post-baking) at 230 ° C for 20 minutes. The optical density (OD value) of the obtained substrate was measured by a transmission densitometer GretagMacbeth D200-II, and the film thickness was measured by VertScan (R) 2.0, a non-contact surface / layer profile measurement system manufactured by Ryoka Systems, and the optical density (OD Value) and film thickness to calculate the optical density (unit OD value) per unit film thickness (1 μm). It should be noted that the OD value is a numerical value showing a light-shielding ability, and a larger value indicates a higher light-shielding property. In addition, using the same substrate, the transmittance at a wavelength of 700 nm and 900 nm was measured with a spectrophotometer UV-3100 (manufactured by Shimadzu Corporation). In this case, a glass substrate on which the photosensitive coloring composition is not applied is used as a reference. The transmittance at 700 nm is an indicator of light leakage. The smaller the value, the better. The tendency is preferably 2.5% or less. In addition, the transmittance at a wavelength of 900 nm is an indicator of the readability of a mark used to align the mask position, and the larger the value, the better. The tendency is preferably 10% or more. The measurement results of the unit OD value and the transmittance are shown in Tables 2 to 5. <Evaluation of Voltage Holding Ratio (VHR) and Ion Density> The voltage holding ratio (VHR) and the ion density were evaluated by the methods described below. (Manufacturing of liquid crystal cell) The following electrodes were prepared: electrode substrate A (made by EHC company, evaluation glass coated with ITO sheet on the entire surface of one side) with an ITO film formed on one surface of the entire surface; and one surface of a glass substrate An electrode substrate B (20) of 1 cm square ITO film (2) connected to a take-out electrode with a width of 2 mm is formed in the center (glass made by EHC for evaluation, SZ-B111MIN (B)) . FIG. 1 shows a schematic view of the upper surface of the electrode substrate B (20). Each photosensitive coloring composition was coated on the electrode substrate A and vacuum-dried for 1 minute, and then pre-baked on a hot plate at 90 ° C. for 90 seconds to obtain a coating film having a dry film thickness of 2.5 μm. After that, cover the outer edge by 2 mm, and use high-pressure mercury lamps at 400 mJ / cm.2 , Illumination 45 mW / cm2 Under the exposure conditions, image exposure is performed. Next, using about 0.1 mass% potassium hydroxide aqueous solution at 25 ° C, spray development was performed at 25 ° C with a water pressure of 0.15 MPa, and then the development was stopped with pure water, followed by spray washing. The shower development time is adjusted between 10 to 120 seconds, and is set to approximately 1.6 times the time (break time) required to dissolve and remove the unexposed photosensitive coloring composition layer. The electrode substrate A having the coating film formed in this way was post-baked at 230 ° C. for 20 minutes to obtain an electrode substrate (resist substrate) having the colored cured film (3) formed thereon. After that, a polyimide solution was coated on the resist substrate, pre-baked on a hot plate at 70 ° C for 2 minutes, and post-baked at 220 ° C for 24 minutes. The thus-obtained resist substrate was cut into a 2.5 cm square substrate to complete the evaluation electrode substrate A (8). On the other hand, a polyimide solution was also coated on the electrode substrate B (20), pre-baked on a hot plate at 70 ° C for 2 minutes, and post-baked at 220 ° C for 24 minutes to complete the evaluation electrode substrate. B (9). Thereafter, an epoxy-based sealant (5) containing silicon beads having a diameter of 5 μm was applied on the outer periphery of the evaluation electrode substrate B (9) using a dispenser, and then the evaluation electrode substrate A (8) was applied. The coated surface was pressure-bonded to the front side (sealant side) of the electrode substrate for evaluation B (9) and attached to make an empty cell. The prepared empty unit was heated in a hot air circulation furnace at 180 ° C for 2 hours. Liquid crystal (7) (MLC-6608 manufactured by Merck Japan) was injected into the empty cell thus obtained, and the peripheral portion was sealed with a UV-curable sealant (6). After the above liquid crystal cell was annealed (heated in a hot air circulation furnace at 105 ° C for 2.5 hours), it was heated at 18 J / cm by a high-pressure mercury lamp.2 , Illumination 40 mW / cm2 Irradiation with ultraviolet rays completes the liquid crystal cell (30) for measurement. In the manufactured unit, the colored hardened film was 1.7 cm square and the electrode portion was 1 cm square. Fig. 2 is a schematic view showing a side surface of the completed measurement liquid crystal cell (30). (Evaluation of Voltage Holding Ratio (VHR)) A voltage of 5 V was applied to a liquid crystal cell for measurement manufactured under conditions of 2.0 Hz and a frame time of 1667 msec, and the voltage was measured using a "liquid crystal property evaluation device-6254" manufactured by TOYO Corporation. The retention rate is evaluated as an index of electrical reliability. Furthermore, the higher the voltage holding ratio, the better. The results are shown in Tables 2 to 5. The voltage holding ratio was measured under the same conditions except that the frequency was changed to 0.6 Hz. The results are shown in Tables 2, 4, and 5. () Evaluation of ion density The ion density can be measured, for example, by a method described in International Display Workshop (IDW) '06 Proceedings LCT7-1. Voltage is applied slowly during the measurement of ion density, so there are cases in which the ion peak can be measured separately from the liquid crystal alignment peak, and the reliability difference that is difficult to occur when using the voltage holding ratio can be measured. Impurity ions may cause display defects such as a residual image and flicker (jump) in the liquid crystal display device, and the ion density measurement is effective for evaluation thereof. During the measurement, a "liquid crystal physical property evaluation device-6254" manufactured by TOYO Corporation was used to measure the current when a triangular wave having a frequency of 0.1 Hz and ± 5 V was applied to the liquid crystal cell for measurement, and a waveform of current change with time was obtained. The area of the peak portion (13) of the impurity ion in the waveform was measured to determine the ion density. FIG. 3 is a schematic diagram showing an applied voltage value (11), a measured current value (12), and an impurity ion peak portion (13) when one cycle time is used as the horizontal axis. The measurement results are shown in Tables 2, 4, and 5. [Table 2] [table 3] [Table 4] [table 5] It can be confirmed that the unit OD values of the coated substrates of each of the photosensitive coloring compositions of Examples 1 to 4 and Comparative Examples 1 to 4 in Table 2 have the same unit OD value, that is, they have the same light-shielding properties. The coated substrates of the photosensitive coloring compositions of Examples 1 to 4 have sufficiently low transmittance at a wavelength of 700 nm, excellent light-shielding properties for visible light in a long wavelength region, and sufficiently high transmittance at a wavelength of 900 nm. The readability of the alignment mark is good. In addition, it was confirmed that the voltage retention rate at 2.0 Hz after ultraviolet irradiation is high, and therefore, even if a panel manufacturing method is adopted in which ultraviolet irradiation is performed after the liquid crystal cell is manufactured, the liquid crystal drive is not damaged. In contrast, it was confirmed that the coated substrate using the photosensitive coloring composition of Comparative Example 1 had a low transmittance at a wavelength of 900 nm, and the readability of a mark for aligning a mask position was insufficient. In addition, it was confirmed that the coated substrates using the photosensitive coloring composition of Comparative Examples 2 and 3 had high transmittance at a wavelength of 700 nm, insufficient light shielding properties against visible light in a long wavelength region, and light leakage. In addition, it was confirmed that the coated substrate using the photosensitive coloring composition of Comparative Example 2 had a low voltage retention rate at 2.0 Hz after ultraviolet irradiation, and therefore, the liquid crystal drive was impaired. On the other hand, it was confirmed that the transmittance of the coated substrate using the photosensitive coloring composition of Comparative Example 4 at a wavelength of 900 nm and the transmittance at a wavelength of 700 nm were not a problem, but at 2.0 Hz after ultraviolet irradiation The voltage holding ratio is low, and therefore, the liquid crystal driving is impaired. When a black pigment is used to ensure the light-shielding property of the photosensitive coloring composition, the carbon black in the black pigment has a high absorbance in the entire wavelength range of visible light, so the transmittance at a wavelength of 700 nm can be sufficiently reduced. However, the absorbance in the infrared region is also high and the transmittance in this region will be lower. Therefore, the content ratio of (a1) organic black pigment to 100 parts by mass of (a3) carbon black is as in Comparative Example 1. When the ratio is low, that is, when the ratio of (a3) carbon black to the black pigment is high, the transmittance at a wavelength of 900 nm becomes low. On the other hand, when (a3) carbon black is not included as in Comparative Example 2, the (a1) organic black pigment has a high transmittance at a wavelength of 700 nm, which results in the obtained coated substrate at a wavelength of 700. The transmittance at nm also becomes higher. In addition, because it does not contain carbon black with high absorbance, the pigment content ratio required to achieve a specific OD value becomes higher. Therefore, the voltage retention rate at 2.0 Hz after UV irradiation is deteriorated, and the electrical reliability is lowered. In addition, when (a2) CI Pigment Blue 60 is not included as in Comparative Example 3, the transmittance of the (a1) organic black pigment at a wavelength of 700 nm is high, which results in the obtained coated substrate being The transmittance at a wavelength of 700 nm also becomes higher. On the other hand, although it is thought that the transmittance at a wavelength of 700 nm can be reduced by further increasing the content ratio of (a3) carbon black, the transmittance at a wavelength of 900 nm is expected to be lower as in Comparative Example 1. Therefore, it is considered that when (a2) C.I. Pigment Blue 60 is not included, it is difficult to have both a transmittance at a wavelength of 700 nm and a transmittance at a wavelength of 900 nm. In this way, the addition of a blue pigment is effective for improving light leakage at a wavelength of 700 nm, but when a suitable pigment type is not selected as in Comparative Example 4, the voltage retention rate at 2.0 Hz after UV irradiation is low, and the electricity is reliable. Sex becomes low. With respect to these comparative examples, by using the specific organic black pigment, blue pigment, and carbon black together as in Examples 1 to 4, and adjusting the ratio of the specific organic black pigment to carbon black to an appropriate value, not only The transmittance at a wavelength of 900 nm can be sufficiently high, and the readability of the mark aligned with the mask position is sufficient, and the transmittance at a wavelength of 700 nm can be sufficiently low without light leakage. In particular, by selecting C.I. Pigment Blue 60 as the blue pigment, the voltage retention rate at 2.0 Hz after UV irradiation is high, and electrical reliability can be improved. In particular, the comparison between Example 2 and Example 1 and the comparison between Example 1 and Examples 3 and 4 show that the wavelength of 900 nm can be further increased by increasing the content ratio of all organic pigments to 100 parts by mass of carbon black. Transmission. On the other hand, it was confirmed that the unit OD values of the coated substrates of each of the photosensitive coloring compositions of Examples 5 to 8 in Table 3 are the same, that is, they have the same light-shielding properties and transmittance at a wavelength of 900 nm. Excellent electrical reliability. Among them, the coated substrates using the photosensitive coloring composition of Examples 7 and 8 and particularly the transmittance of the coated substrate of Example 8 at a wavelength of 700 nm are very low, and are shielded from visible light in a long wavelength region. Especially good. From this, it can be seen that by increasing the content ratio of (a2) C.I. Pigment Blue 60 to 100 parts by mass of carbon black, the transmittance at a wavelength of 700 nm can be further reduced. In addition, in the photosensitive coloring compositions of Examples 9 to 12 in Table 4, the content ratios of all the pigments were set to be the same. However, it was confirmed that the content ratio of the purple pigment to 100 parts by mass of the (a1) organic black pigment was changed. The unit OD values of the coated substrates of the photosensitive coloring compositions of Examples 10 to 12, especially Examples 11 and 12, were high. From this, it can be seen that by increasing the content ratio of the purple pigment to 100 parts by mass of the (a1) organic black pigment, the unit OD value can be increased. The photosensitive coloring compositions of Example 1 and Comparative Example 5 in Table 5 have the same composition except that the types of the organic black pigments are different, but the photosensitive coloring composition of Example 1 has a voltage retention at 2.0 Hz after ultraviolet irradiation. It has a high rate, so it can be confirmed that the electrical reliability is good. From this, it can be seen that by using the (a1) organic black pigment as the organic black pigment, electrical reliability can be optimized. [Industrial Applicability] According to the photosensitive coloring composition of the present invention, it is possible to provide hardening with less light leakage near a wavelength of 700 nm, excellent transmittance near a wavelength of 900 m, and excellent electrical reliability after ultraviolet irradiation. Objects and colored spacers, and further, an image display device having such colored spacers can be provided. Therefore, the present invention has extremely high industrial applicability in various fields of the photosensitive coloring composition, cured product, colored spacer, and image display device.

1‧‧‧玻璃1‧‧‧ glass

2‧‧‧ITO膜2‧‧‧ITO film

3‧‧‧著色硬化膜3‧‧‧colored hardened film

4‧‧‧聚醯亞胺膜4‧‧‧Polyimide film

5‧‧‧環氧樹脂系密封劑5‧‧‧ epoxy resin sealant

6‧‧‧UV硬化型密封劑6‧‧‧UV hardening sealant

7‧‧‧液晶7‧‧‧ LCD

8‧‧‧評價用電極基板A8‧‧‧Evaluation electrode substrate A

9‧‧‧評價用電極基板B9‧‧‧ Evaluation electrode substrate B

11‧‧‧施加電壓值11‧‧‧ Applied voltage value

12‧‧‧測定電流值12‧‧‧Measured current value

13‧‧‧雜質離子波峰部13‧‧‧ Impurity ion peak

20‧‧‧電極基板B20‧‧‧ Electrode Substrate B

30‧‧‧測定用液晶單元30‧‧‧ liquid crystal cell for measurement

圖1係實施例中使用之電極基板B之上表面之模式圖。 圖2係實施例中使用之測定用液晶單元之側面之模式圖。 圖3係離子密度測定中之一個週期之施加電壓之波形之概略圖、與測定電流之波形之概略圖。FIG. 1 is a schematic view of the upper surface of the electrode substrate B used in the embodiment. Fig. 2 is a schematic view of a side surface of a liquid crystal cell for measurement used in the embodiment. FIG. 3 is a schematic diagram of a waveform of an applied voltage and a waveform of a measurement current in an ion density measurement.

Claims (12)

一種感光性著色組合物，其特徵在於：其係含有(a)著色劑、(b)鹼可溶性樹脂、(c)光聚合起始劑、(d)乙烯性不飽和化合物、(e)溶劑、及(f)分散劑者，並且 上述(a)著色劑含有(a1)包含選自由下述通式(I)所表示之化合物、上述化合物之幾何異構物、上述化合物之鹽、及上述化合物之幾何異構物之鹽所組成之群中之至少1種的有機黑色顏料、(a2)C.I.顏料藍60、以及(a3)碳黑， 上述(a1)有機黑色顏料相對於上述(a3)碳黑100質量份之含有比率為150質量份以上， [化1](式(I)中，R1 及R6 分別獨立地為氫原子、CH3 、CF3 、氟原子或氯原子； R2 、R3 、R4 、R5 、R7 、R8 、R9 及R10 分別獨立地為氫原子、鹵素原子、R11 、COOH、COOR11 、COO- 、CONH2 、CONHR11 、CONR11 R12 、CN、OH、OR11 、COCR11 、OOCNH2 、OOCNHR11 、OOCNR11 R12 、NO2 、NH2 、NHR11 、NR11 R12 、NHCOR12 、NR11 COR12 、N=CH2 、N=CHR11 、N=CR11 R12 、SH、SR11 、SOR11 、SO2 R11 、SO3 R11 、SO3 H、SO3 - 、SO2 NH2 、SO2 NHR11 或SO2 NR11 R12 ；且 選自由R2 與R3 、R3 與R4 、R4 與R5 、R7 與R8 、R8 與R9 、及R9 與R10 所組成之群中之至少一個組合亦可相互直接鍵結，或者藉由氧原子、硫原子、NH或NR11 橋而相互鍵結； R11 及R12 分別獨立地為碳數1～12之烷基、碳數3～12之環烷基、碳數2～12之烯基、碳數3～12之環烯基或碳數2～12之炔基)。A photosensitive coloring composition, characterized in that it contains (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a solvent, And (f) a dispersant, and the (a) coloring agent contains (a1) a compound selected from the group consisting of a compound represented by the following general formula (I), a geometric isomer of the compound, a salt of the compound, and the compound At least one kind of organic black pigment, (a2) CI pigment blue 60, and (a3) carbon black in the group consisting of salts of geometric isomers, the (a1) organic black pigment is higher than the (a3) carbon The content ratio of 100 parts by mass of black is 150 parts by mass or more. (In formula (I), R 1 and R 6 are each independently a hydrogen atom, a CH 3 , a CF 3 , a fluorine atom, or a chlorine atom; R 2 , R 3 , R 4 , R 5 , R 7 , R 8 , R 9 and R 10 are each independently a hydrogen atom, a halogen atom, R 11, COOH, COOR 11 , COO -, CONH 2, CONHR 11, CONR 11 R 12, CN, OH, OR 11, COCR 11, OOCNH 2, OOCNHR 11 , OCNCR 11 R 12 , NO 2 , NH 2 , NHR 11 , NR 11 R 12 , NHCOR 12 , NR 11 COR 12 , N = CH 2 , N = CHR 11 , N = CR 11 R 12 , SH, SR 11 , SOR 11, SO 2 R 11 , SO 3 R 11, SO 3 H, SO 3 -, SO 2 NH 2, SO 2 NHR 11 or SO 2 NR 11 R 12; and selected from the group consisting of R 2 and R 3, R 3 And at least one combination of R 4 , R 4 and R 5 , R 7 and R 8 , R 8 and R 9 , and R 9 and R 10 may be directly bonded to each other, or through an oxygen atom, Sulfur atoms, NH or NR 11 bridge each other; R 11 and R 12 are each independently an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, A cycloalkenyl group having 3 to 12 carbon atoms or an alkynyl group having 2 to 12 carbon atoms). 如請求項1之感光性著色組合物，其中上述(a1)有機黑色顏料相對於上述(a3)碳黑100質量份之含有比率為200質量份以上。The photosensitive coloring composition according to claim 1, wherein a content ratio of the (a1) organic black pigment to 100 parts by mass of the (a3) carbon black is 200 parts by mass or more. 如請求項1或2之感光性著色組合物，其中上述(a1)有機黑色顏料相對於上述(a3)碳黑100質量份之含有比率為210質量份以上。The photosensitive coloring composition according to claim 1 or 2, wherein the content ratio of the (a1) organic black pigment to the (a3) carbon black 100 parts by mass is 210 parts by mass or more. 如請求項1至3中任一項之感光性著色組合物，其中上述(a2)C.I.顏料藍60相對於上述(a3)碳黑100質量份之含有比率為200質量份以上。The photosensitive coloring composition according to any one of claims 1 to 3, wherein the content ratio of the (a2) C.I. Pigment Blue 60 to 100 parts by mass of the (a3) carbon black is 200 parts by mass or more. 如請求項1至4中任一項之感光性著色組合物，其中全部有機顏料相對於上述(a3)碳黑100質量份之含有比率之合計為550質量份以上。The photosensitive coloring composition according to any one of claims 1 to 4, wherein a total content ratio of all organic pigments to 100 parts by mass of (a3) carbon black is 550 parts by mass or more. 如請求項1至5中任一項之感光性著色組合物，其中全部固形物成分中之上述(a)著色劑之含有比率為10質量%以上。The photosensitive coloring composition according to any one of claims 1 to 5, wherein the content ratio of the coloring agent (a) in the total solid component is 10% by mass or more. 如請求項1至6中任一項之感光性著色組合物，其中全部固形物成分中之上述(a)著色劑之含有比率為45質量%以下。The photosensitive coloring composition according to any one of claims 1 to 6, wherein the content ratio of the colorant (a) in the total solid content is 45% by mass or less. 如請求項1至7中任一項之感光性著色組合物，其中上述(b)鹼可溶性樹脂含有(b1)環氧(甲基)丙烯酸酯系樹脂。The photosensitive coloring composition according to any one of claims 1 to 7, wherein the (b) alkali-soluble resin contains (b1) an epoxy (meth) acrylate resin. 如請求項1至8中任一項之感光性著色組合物，其中已硬化之塗膜之每1 μm膜厚之光學濃度為1.0以上。The photosensitive coloring composition according to any one of claims 1 to 8, wherein the optical concentration per 1 μm film thickness of the cured coating film is 1.0 or more. 一種硬化物，其係使如請求項1至9中任一項之感光性著色組合物硬化而獲得。A cured product obtained by curing the photosensitive coloring composition according to any one of claims 1 to 9. 一種著色間隔物，其係由如請求項10之硬化物所形成。A colored spacer formed of a hardened body as claimed in claim 10. 一種圖像顯示裝置，其具備如請求項11之著色間隔物。An image display device includes a colored spacer as claimed in claim 11.
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