TW201825842A - Ultrapure water manufacturing device - Google Patents

Abstract

Provided is an ultrapure water manufacturing device that can reduce the heat source cost of a heat exchanger, said heat exchanger being for heating ultrapure water to produce warm ultrapure water. Secondary pure water from a subsystem 4 is heated with a heat exchanger 6 and a heat exchanger 10, and is sent to a use point. A heat source of the heat exchanger 6 is returning warm ultrapure water from the use point. A heat source fluid of the heat exchanger 10 is warm water that has been heated with a heat pump 20 and a vapor-type heat exchanger 15. Heat sources of the heat pump 20 are warm discharge water from the use point and a retentate of a UF membrane separation device 11A.

Description

   Ultra-pure water manufacturing device   

The present invention relates to an ultrapure water production device, and more particularly to an ultrapure water production device that heats ultrapure water from a secondary pure water production device with a heat exchanger and supplies it to the point of use as warm ultrapure water.

As shown in FIG. 7, ultrapure water used as semiconductor washing water is composed of a pretreatment system 50, a primary pure water production device 60, and a secondary pure water production device (referred to as a sub-system) 70. An ultrapure water manufacturing apparatus is used to process raw water (industrial water, domestic water, well water, etc.) and manufacture it (Patent Document 1). The functions of each system in FIG. 7 are as follows.

Removal of suspended matter or colloidal matter in raw water is performed in a pretreatment system 50 made up of an agglutination, pressure floating (precipitation), filtration (membrane filtration) device (the previous example is an agglutination filtration device). Moreover, polymer organic matter, hydrophobic organic matter, etc. can also be removed in this process.

In the pre-treated water tank 61, heat exchanger 65, reverse osmosis membrane processing device (RO device) 62, ion exchange device (mixed bed type or 4 bed 5 tower type, etc.) 63, tank 63A, ion exchange The apparatus 63B and the primary pure water production apparatus 60 of the degassing apparatus 64 remove ions or organic components in raw water. In addition, the higher the temperature of water, the lower the viscosity, and the permeability of the RO membrane will increase. Therefore, as shown in FIG. 7, the heat exchanger 65 is provided in the front stage of the reverse osmosis membrane processing apparatus 62, and water is heated so that the temperature of the water supplied to the reverse osmosis membrane processing apparatus 62 may become more than predetermined temperature. On the primary side of the heat exchanger 65, steam as a heat source fluid is supplied. The reverse osmosis membrane processing apparatus 62 removes salts and removes ionic and colloidal TOC. In the ion exchange devices 63 and 63B, salts and inorganic carbon (IC) are removed, and TOC components for adsorption or ion exchange are removed by an ion exchange resin. The degassing device 64 removes inorganic carbon (IC) and dissolved oxygen.

The primary pure water produced by the primary pure water producing device 60 is sent through a pipe 69 to a secondary pure water producing device 70 for producing ultra-pure water. The secondary pure water production device 70 includes a sub tank (also referred to as a pure water tank) 71, a pump 72, a low-pressure ultraviolet oxidation device (UV device) 74, and an ion exchange device 75. The low-pressure ultraviolet oxidizing device 74 decomposes TOC into organic acids and even CO ₂ by ultraviolet rays of 185 nm emitted by a low-pressure ultraviolet lamp. Organic matter and CO ₂ generated by the decomposition are removed by an ion exchange device 75 at a later stage.

The ultrapure water from the secondary pure water production device 70 is heated to about 70 to 80 ° C. by the front-stage heat exchanger 85 and the rear-stage heat exchanger 86 and supplied to a use point 90. The warm return water from the use point 90 is passed through the pipe 91 to flow to the heat source side of the front-stage-side heat exchanger 85. The temperature of the return water passing through the heat source side of the front-stage heat exchanger 85 is lowered to about 40 ° C., and returns to the sub tank 71 through the pipe 92. The rear-stage heat exchanger 86 uses steam as a heat source.

A part of the primary pure water from the primary pure water production device 60 is a secondary pure water production device 70 'for supplying water to normal temperature ultrapure water production. The secondary pure water production device 70 'includes a sub tank (also referred to as a pure water tank) 71', a pump 72 ', a heat exchanger 73', a low-pressure ultraviolet oxidation device (UV device) 74 ', and ions. The exchange device 75 'and the ultrafiltration membrane (UF membrane) separation device 76'. From the ultrafiltration membrane separation device 76 ', a pipe 88' is passed to the room temperature ultrapure water to be used at the point of use 90 '. The return water from the use point 90 'is returned to the sub tank 71' through the pipe 92 '.

FIG. 6 is a system diagram showing an ultrapure water production apparatus according to a reference example. In addition, although the water temperature is illustrated in the following description, each water temperature is only an example, and does not limit the present invention at all.

The primary pure water at about 25 ° C is introduced into the secondary system 4 through the piping 1, the auxiliary tank 2, and the piping 3, thereby producing ultrapure water at about 30 ° C. The manufactured ultrapure water flows through the pipe 5, the heat exchanger 6, the pipe 9, and the heat exchanger 10 in this order, and is heated to about 42 ° C by the heat exchanger 6 and heated to The temperature is about 75 ° C, and water is sent to the point of use through the pipe 11 as warm ultrapure water. A UF membrane separation device 11A is installed on the pipe 11 immediately before the point of use.

Into the heat source fluid flow path of the heat exchanger 6, a return temperature ultrapure water (return water) of about 75 ° C. from the point of use is introduced through the pipe 7. The reflux temperature ultrapure water is cooled to about 40 ° C. by heat exchange between the heat exchanger 6 and ultrapure water from the sub-system 4, and then sent to the sub-tank 2 through a pipe 8.

In the heat source fluid flow path of the heat exchanger 10, first medium water (water as a heat transfer medium) heated to about 80 ° C by the heat exchangers 13, 15 is circulated. That is, the first medium water at about 47 ° C. flowing out of the heat source fluid flow path outlet of the heat exchanger 10 is heated from the pipe 12 to about 49 ° C. through the heat exchanger 13, and then flows through the pipe 14 to exchange heat. The heater 15 and the piping 16 return to the heat source fluid flow path inlet of the heat exchanger 10.

The heat-source fluid flow path in the heat exchanger 13 is passed through the piping 17 to introduce warm water drainage at about 56 ° C. The warm drainage water cooled down to about 53 ° C. in the heat exchanger 13 flows out through the pipe 18 and is recovered as recovered water.

Steam (water vapor) from a boiler or the like flows through the heat source fluid flow path of the heat exchanger 15.

Although not shown in the drawing, a circulating pump is provided in the piping 12, 14 or 16.

In the ultrapure water production apparatus of FIG. 6, the heat exchanger 13 also heats the first medium water by using the heat retained by the warm water drainage. In comparison to the case of heating ultrapure water, the cost of the heat source used to obtain the temperature of the ultrapure water at a given temperature becomes cheaper. However, the heat recovery of the returning ultrapure water is insufficient, and further reduction of the cost of the heat source is expected.

[Patent Document 1] Japanese Patent Laid-Open No. 2013-202581

The purpose of the present invention is to provide an ultrapure water manufacturing device, which can reduce the cost of heat source for heating ultrapure water sent to the point of use to become a heat exchanger for warming ultrapure water.

One aspect of the present invention is an ultrapure water production device that supplies heated ultrapure water to a point of use, and includes: a primary pure water production device; and a method for treating primary pure water from the primary pure water production device. A secondary pure water production device for producing ultrapure water, a first heat exchanger for heating ultrapure water from the secondary pure water production device, and using return water from a point of use as a heat source; A heating means for further heating the ultrapure water heated by the first heat exchanger, the heating means includes means for circulating the ultrapure water heated in the first heat exchanger to a heated fluid flow path. A second heat exchanger, a first circulation flow path that circulates first medium water as a heat transfer medium in a heat source fluid flow path of the second heat exchanger, and a first medium that flows through the first circulation flow path A first medium water heating device in which water is heated by the heat of warm water drainage, and a third heat exchanger in which the first medium water heated by the first medium water heating device is heated by steam.

In one aspect of the present invention, the first medium water heating device includes a heat pump including a condenser, an evaporator, a pump, and an expansion valve, and the condenser is installed in the first circulation flow path to heat the The first medium water and the evaporator are provided in a second circulation flow path in which the second medium water is circulated. A second medium water heating device is provided in the second circulation flow path, and is used to drain water at the aforementioned temperature. Heat to heat the second medium water.

In one aspect of the present invention, the second medium water heating device is a fifth heat exchanger that passes the warm drain water to a heat source fluid flow path.

According to one aspect of the present invention, a sixth heat exchanger for heating the ultrapure water is provided between the first heat exchanger and the second heat exchanger, and a warm drainage flow path is provided. The warm drain water is passed to the sixth heat exchanger and then to the heat source fluid flow path of the fifth heat exchanger.

According to an aspect of the present invention, a flow path switching device is provided for switching between the first selected flow path in which the warm drain water flows to the fifth heat exchanger through the sixth heat exchanger, and the warm drain water. The second selected flow path that bypasses the sixth heat exchanger and flows to the fifth heat exchanger.

In one aspect of the present invention, a water quality sensor for measuring the water quality of the warm drainage water is provided, and a control device is provided. When the detected water quality of the water quality sensor is better than a predetermined value, the water quality sensor is set to the first The selected flow path is set as the second selected flow path described above when the water quality is detected to be worse than the predetermined value.

In one aspect of the present invention, the second medium water heating device is a fifth heat exchanger that circulates the third medium water to the heat source fluid flow path, and a heat source fluid flow path is provided in the fifth heat exchanger. A third circulation flow path common to the third medium water circulation flow is provided in the third circulation flow path with a seventh heat exchanger that heats the third medium water by the warm water drainage.

In one aspect of the present invention, a sixth heat exchanger for heating the ultrapure water is provided between the first heat exchanger and the second heat exchanger, and the third circulation flow path is provided so that The third medium water heated in the seventh heat exchanger flows through the heat source fluid flow path of the sixth heat exchanger to the heat source fluid flow path of the fifth heat exchanger.

In the ultrapure water producing apparatus of the present invention, the ultrapure water is heated in the first heat exchanger by using the heat retained by the point-return water. Then, the ultrapure water is further heated by the second heat exchanger as the heat source fluid, using the first medium water heated by the heat and steam of the warm drainage water. As a result, it is possible to reduce the cost of heating the ultrapure water sent to the point of use to a predetermined temperature to become a heat source for the ultrapure water.

The temperature of the point-of-use reflux water is usually 70 to 80 ° C, for example, about 75 ° C.

In the present invention, the so-called warm drainage means drainage used for washing at the point of use. Concentrated water of the UF membrane separation device installed immediately before the point of use can also be included in the warm drainage. The temperature of the warm drainage is usually 50 to 60 ° C, for example, about 56 ° C.

1‧‧‧ once pure water

2‧‧‧ auxiliary tank

3‧‧‧Piping

4‧‧‧ Subsystem

5‧‧‧Piping

6‧‧‧ heat exchanger

7‧‧‧Piping

8‧‧‧Piping

9‧‧‧Piping

10‧‧‧ heat exchanger

11‧‧‧Piping

11A‧‧‧UF membrane separation device

12‧‧‧Piping

13‧‧‧Heat exchanger

14‧‧‧Piping

15‧‧‧ heat exchanger

16‧‧‧Piping

17‧‧‧Piping

18‧‧‧Piping

FIG. 1 is a system diagram of an ultrapure water producing apparatus according to the embodiment.

FIG. 2 is a system diagram of an ultrapure water producing apparatus according to the embodiment.

Fig. 3 is a system diagram of an ultrapure water producing apparatus according to the embodiment.

Fig. 4 is a system diagram of an ultrapure water producing apparatus according to the embodiment.

Fig. 5 is a system diagram of an ultrapure water producing apparatus according to the embodiment.

FIG. 6 is a system diagram of an ultrapure water manufacturing apparatus according to a reference example.

FIG. 7 is a system diagram of the ultrapure water production apparatus of the previous example.

An ultrapure water producing apparatus of the present invention includes a primary pure water producing apparatus, a secondary pure water producing apparatus, and a heating means for heating ultrapure water.

A pretreatment device is usually provided at the front stage of the primary pure water production device. The pretreatment device is a pretreatment caused by filtering, agglomeration, and precision filtration membranes of raw water, mainly to remove suspended matter. By this pretreatment, the number of fine particles in water is usually set to ¹⁰³ / mL or less.

Primary pure water production equipment, including: reverse osmosis (RO) membrane separation device, degassing device, regenerative ion exchange device (mixed bed type or 4 bed 5 tower type, etc.), electrical deionization device, ultraviolet (UV) irradiation An oxidizing device, such as an oxidizing device, removes most of electrolytes, fine particles, germs, and the like in pretreated water. The primary pure water production device is composed of, for example, a heat exchanger, two or more RO membrane separation devices, a mixed-bed ion exchange device, and a degassing device.

Secondary pure water production equipment is composed of auxiliary tanks, water supply pumps, cooling heat exchangers, low-pressure ultraviolet oxidizers, sterilizers and other ultraviolet irradiation devices, non-regenerating mixed bed ion exchange devices or electrical deionization devices, and ultrafiltration (UF) Membrane filtration devices such as membrane separation devices or precision filtration (MF) membrane separation devices. However, there may be cases in which desalting devices such as membrane degassing devices, RO membrane separation devices, and electric deionization devices are further provided. In the secondary pure water production device, a low-pressure ultraviolet oxidation device is applied, and a mixed bed type ion exchange device is provided at the latter stage, thereby oxidizing and decomposing TOC in water with ultraviolet rays, and removing oxidative decomposition products by ion exchange. In the present specification, a portion of the secondary pure water production apparatus that is on the rear side of the sub tank is referred to as a sub system.

It is also possible to install a tertiary pure water production device at the rear stage of the secondary pure water production device and heat the ultrapure water from the tertiary pure water production device. The tertiary pure water production device has the same structure as the secondary pure water production device, and is a person producing ultra-pure water with higher purity.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. Fig. 2 is a system diagram showing an ultrapure water producing apparatus according to the first embodiment. In addition, although the water temperature is illustrated in the following description, each water temperature is only an example, and does not limit the present invention at all.

The primary pure water at about 25 ° C is introduced into the secondary system 4 through the piping 1, the auxiliary tank 2, and the piping 3, thereby producing ultrapure water at about 30 ° C. The manufactured ultrapure water flows through the pipe 5, the heat exchanger 6, the pipe 9, and the heat exchanger 10 in this order, and is heated to about 42 ° C by the heat exchanger 6 and heated to The temperature is about 75 ° C, and water is sent to the point of use through the pipe 11 as warm ultrapure water. A UF membrane separation device 11A is installed on the pipe 11 immediately before the point of use.

Into the heat source fluid flow path of the heat exchanger 6, a return temperature ultrapure water (return water) of about 75 ° C. from the point of use is introduced through the pipe 7. The reflux temperature ultrapure water is cooled to about 40 ° C. by heat exchange between the heat exchanger 6 and ultrapure water from the sub-system 4, and then sent to the sub-tank 2 through a pipe 8.

A first medium water (water as a heat transfer medium) heated by the heat pump 20 and the steam heat exchanger 15 is circulated through the heat source fluid flow path of the heat exchanger 10. That is, the first medium water at about 60 ° C. flowing from the heat exchanger 10 is heated to about 70 ° C. by the condenser 23 of the heat pump 20 of the first circulation flow path, and then heated to about 60 ° C. by the steam heat exchanger 15. 85 ° C and flowed into the heat exchanger 10.

Steam (water vapor) from a boiler or the like flows through the heat source fluid flow path of the heat exchanger 15.

The heat pump 20 is configured such that a heat medium such as a chlorofluorocarbon substitute from the evaporator 21 is compressed by the pump 22 and introduced into the condenser 23, and the heat medium from the condenser 23 is introduced into the evaporator 21 through the expansion valve 24. .

The first medium water from the heat exchanger 10 is introduced into the condenser 23 of the first circulation flow path (high-temperature-side flow path) through the pipe 12, and the first medium water heated in the condenser 23 is passed through the pipe 14 to Feed water to heat exchanger 15. A part of the first medium water from the condenser 23 is returned to the pipe 12 through the bypass pipe 19. As a result, the water temperature of the first medium water introduced into the condenser 23 becomes approximately 65 ° C. A flow regulating valve (not shown) is provided in the bypass pipe 19.

Although not shown in the drawing, a circulating pump is provided in the piping 12, 14 or 16. The same applies to the ultrapure water production apparatus of FIGS. 2 to 5 described later.

In order to circulate the second medium water through the heat source fluid flow path (low-temperature-side flow path) of the evaporator 21, a circulation flow path formed by a pipe 25, a heat exchanger 26, and a pipe 27 is provided. A bypass pipe 28 is provided between the pipes 25 and 27.

The heat source fluid flow path in the heat exchanger 26 is passed through the piping 29 to introduce warm water at about 56 ° C. The warm drainage water, which has been heat-exchanged with the second medium water and cooled down to about 25 ° C., flows out from the pipe 30 and is recovered as recovered water.

The second medium water heated to about 30 ° C. in the heat exchanger 26 is introduced into the heat source fluid flow path of the evaporator 21, exchanges heat with the heat medium of the heat pump 20 to reduce the temperature to about 20 ° C., and then passes through the pipe 25. And send water to the heat exchanger 26. A part of the second medium water flows from the pipe 25 to the pipe 27 through the bypass pipe 28. As a result, the water temperature of the second medium water flowing into the evaporator 21 becomes approximately 25 ° C. A flow regulating valve (not shown) is provided in the bypass pipe 28.

As a method of operating the heat pump 20, for example, the input power of the heat pump compressor and the circulating water flow rate are adjusted so that the outlet temperatures of the first medium water and the second medium water become constant temperatures, respectively. It is also possible to make the heat pump a plural series to control the number of units in accordance with the heat load. In addition, as shown in the figure, the high temperature side and / or low temperature side circulation system may be provided with a pipe bypassing the heat exchanger and a flow control valve to perform an operation capable of controlling the temperature of the inlet of the heat pump.

Fig. 2 shows an ultrapure water producing apparatus according to a second embodiment. This ultrapure water production device is an ultrapure water production device shown in FIG. 1. A heat exchanger 31 is provided in the middle of connecting ultrapure water pipes 9 of heat exchangers 6 and 10 to flow ultrapure water into the heat exchanger. 31 is heated, and hot water at about 56 ° C. is introduced into the heat source fluid flow path of the heat exchanger 31 through the pipe 32.

The warm water at about 56 ° C is supplied to the heat exchanger 26 through a pipe 29 after the ultra-pure water in the pipe 9 is heated to a temperature of about 47 ° C by the heat exchanger 31.

The other structures of FIG. 2 are the same as those of FIG. 1.

According to the ultrapure water production apparatus of FIG. 2, the amount of steam used can be reduced compared to the case of FIG. 1. However, due to the quality of the hot-drain water, the heat transfer surface of the additional heat exchanger 31 may be contaminated and the heat transfer performance may be reduced. In the manufacturing process of warm ultrapure water, in order to maintain the quality of warm ultrapure water, the decomposition and cleaning of the heat exchanger 31 cannot be performed. Therefore, the flow of FIG. 2 can be applied to the warm drainage without pollution (or the cleaning and pollution removal of the heat exchanger). For easy). As the heat exchanger 31, in order to completely prevent leakage or dissolution of impurities, it is preferable to use a full-welded or one-side welded titanium plate heat exchanger.

FIG. 3 is a configuration shown in FIG. 2, which can be switched to a selective flow path for directly passing warm water to the heat exchanger 26 and a selective flow path for passing warm water through the heat exchanger 31 to the heat exchanger 26.

That is, the warm water drainage pipe 33 is connected to the pipe 29 through the valve 34 and the pipe 35. The piping 33 is connected to the heat exchanger 31 through a piping 36, a valve 37, and a piping 38 that branch from the piping 33. When the valve 34 is opened and the valve 37 is closed, the warm drain water from the pipe 33 is directly passed to the heat exchanger 26.

By closing the valve 34 and opening the valve 37, the warm water from the pipe 33 is allowed to flow to the heat exchanger 31 and then to the heat exchanger 26.

In addition, a water quality sensor 39 such as a TOC meter or a resistivity meter is installed in the piping 33, and the detection value is input to a valve control device (not shown), and the valves 34 and 37 are controlled so that the water quality of the water discharged at a temperature is When it is good (for example, the TOC is lower than the predetermined concentration), the warm water is allowed to flow to the heat exchangers 31 and 26 in sequence; when the water quality is not good (for example, when the TOC concentration is higher than the predetermined value), the warm water is directly passed to the heat exchange. The device 26 is preferable.

In addition, the piping 40 for washing water is connected to the piping 33 through the valve 41, and the heat exchangers 31 and 26 or piping may be washed with chemicals or water as necessary.

The other structures of FIG. 3 are the same as those of FIG. 2.

According to the ultrapure water production apparatus of FIG. 3, efficient heating of ultrapure water and prevention (suppression) of contamination of a heat exchanger can be achieved.

FIG. 4 is formed by a heat exchanger 44, a pipe 45, a heat exchanger 31, a pipe 29, a heat exchanger 26, and a pipe 46 in order to circulate the third medium water to the heat source fluid flow path of the heat exchanger 26. In the circulating flow path, warm water at about 56 ° C. is passed through the pipe 47 to the heat source fluid flow path of the heat exchanger 44, and the outflow water at about 25 ° C. is recovered as recycled water through the pipe 48.

The third medium water heated to about 51 ° C. by the heated fluid flow path flowing through the heat exchanger 44 is a heat source fluid flow path flowing through the pipe 45 to the heat exchanger 31 to heat the flow through the pipe 9 Ultra pure water. The warm water that has been cooled to about 47 ° C by the heat exchanger 31 is a heat source fluid flow path that passes through the pipe 29 to the heat exchanger 26, and is cooled to about 20 ° C, and then returns to the heat exchanger 44 through the pipe 46. Heated fluid flow path. In the heat exchanger 26, the second medium water of about 15 ° C is heated to about 25 ° C.

The ultrapure water producing apparatus of FIG. 4 has good heating efficiency for the ultrapure water, and clean third medium water flows through the heat exchanger 31 of the ultrapure water pipe 9. Therefore, it can be suppressed in the heat exchanger 31. Risk of contamination.

FIG. 5 shows that in FIG. 1, the first medium water is heated by a plurality of heat pumps, and the concentrated water of the UF membrane separation device 11A installed immediately before the point of use is also used as warm water. The structure of the implementation.

In this embodiment, the first medium water of about 51 ° C. flowing out of the heat source fluid flow path outlet of the heat exchanger 10 is introduced into the relay tank 12 a through the pipe 12. Concentrated water from the UF membrane separation device 11A is also introduced into the relay tank 12a. The concentrated water has high cleanliness. The first medium water in the relay tank 12a flows through the pipe 12b to the condenser 23 of the first heat pump 20A and is heated to about 60 ° C, and then flows through the pipe 12c to the condenser 23 of the second heat pump 20B. After being heated to about 67 ° C., it flows through the pipe 14 to the steam heat exchanger 15 and is heated to about 75 to 76 ° C., and then circulates through the pipe 16 to the heat source fluid flow path inlet of the heat exchanger 10.

The structures of the heat pumps 20A and 20B are the same as those of the heat pump 20. A second medium water heated in the heat exchanger 26 flows through the evaporator 21 of each of the heat pumps 20A and 20B. The heated medium flow path passing through the heat exchanger 26 is thereby heated to about 40 ° C. and the second medium water is circulated to the condensers 21 through the piping 27 and the piping 27 a and 27 b branching therefrom, and is connected to the heat pump. 20A, 20B heat exchange medium to cool down. The second medium water at about 30 ° C. flowing from each condenser 21 is introduced into the confluence tank 25 c through the pipes 25 a and 25 b. The second medium water in the combining tank 25c returns to the heated fluid flow path of the heat exchanger 26 through the pump 25d and the piping 25e.

The warm water drainage of about 56 ° C. from the warm water drainage tank 95 is introduced into the heat source fluid flow path of the heat exchanger 26 through the pipe 29. The waste water which has been heat-exchanged in the heat exchanger 26 and cooled to about 32 ° C. is recovered as recovered water through the pipe 30.

The warm water drainage system discharged from the use point 90 is introduced into the warm water drainage tank 95. Further, in this embodiment, overflow water from the relay tank 12 a is also introduced into the warm water drainage tank 95.

Other structures in FIG. 5 are the same as those in FIG. 1, and the same reference numerals denote the same parts.

In each of the ultrapure water production apparatuses of FIGS. 1 to 6, the primary pure water temperature is 25 ° C, the ultrapure water temperature from the sub-system 4 is 30 ° C, the temperature of the ultrapure water is 60 ° C, and the temperature of the drainage water is 56 ° C. The temperature conditions of the temperature of 25 ° C. and the temperature of the first medium water from the steam-type heat exchanger 15 were 85 ° C., and simulation was performed under various flow conditions. As a result, when the heat source cost of the ultrapure water production apparatus of FIG. 6 is 100, the heat source cost of the ultrapure water production apparatus of FIG. 1 is 75%, the heat source cost of the ultrapure water production apparatus of FIG. 2 is 63%, The heat source cost in Figure 4 is 65%.

The embodiment described above is an example of the present invention, and the present invention may be in a form other than the one shown in the drawings. For example, a steam-type heat exchanger may be provided in the pipe 11 to heat the ultrapure water heated in the heat exchanger 10.

Although the present invention has been described in detail using specific aspects, it is apparent that various changes can be made by those skilled in the art without departing from the spirit of the present invention.

This application is based on Japanese Patent Application No. 2016-179640 filed on September 14, 2016, and is hereby incorporated by reference in its entirety.

Claims (8)

    An ultrapure water production device is a device that supplies heated ultrapure water to a point of use. The device includes: a primary pure water production device; A secondary pure water production device, a first heat exchanger for heating ultrapure water from the secondary pure water production device, and using return water from a point of use as a heat source, and a first heat exchanger The heating means for further heating the heated ultrapure water is characterized in that the heating means is provided with a flow of the ultrapure water heated in the first heat exchanger to a second flow path of the heated fluid. A heat exchanger, a first circulation flow path that circulates first medium water as a heat transfer medium in a heat source fluid flow path of the second heat exchanger, and borrows first medium water that flows through the first circulation flow path. A first medium water heating device that is heated by the heat of warm water drainage, and a third heat exchanger that heats the first medium water heated by the first medium water heating device with steam.         The ultrapure water production device according to claim 1, wherein the first medium water heating device is provided with a heat pump having a condenser, an evaporator, a pump, and an expansion valve, and the condenser is provided in the first section. 1 circulation flow path is used to heat the first medium water, and the evaporator is provided in the second circulation flow path in which the second medium water is circulated, and in the second circulation flow path, a second medium water heating device is provided. The second medium water is heated by the heat of the warm water drainage.         The ultrapure water production device according to claim 2, wherein the second medium water heating device is a fifth heat exchanger that circulates the warm water to the heat source fluid flow path.         The ultrapure water production device according to claim 3, wherein a sixth heat exchanger for heating the ultrapure water is provided between the first heat exchanger and the second heat exchanger, and a temperature The drainage flow path is used to circulate the warm water to the heat source fluid flow path of the sixth heat exchanger and then to the heat source fluid flow path of the fifth heat exchanger.         The ultrapure water production device according to claim 4, further comprising a flow path switching device for switching: a first option for passing the warm water and drainage to the fifth heat exchanger through the sixth heat exchanger. A flow path and a second selected flow path that allows warm water to flow around the sixth heat exchanger and flow to the fifth heat exchanger.         The ultrapure water manufacturing device according to claim 5, further comprising a water quality sensor for measuring the temperature of the warm water drainage, and a control device for detecting that the water quality of the water quality sensor is better than a predetermined value. In this case, the first selected flow path is set, and when the detected water quality is worse than the predetermined value, the second selected flow path is set.         The ultrapure water production device according to claim 2, wherein the second medium water heating device is a fifth heat exchanger that circulates the third medium water to the heat source fluid flow path, and The heat source fluid flow path is provided with a third circulation flow path in which the third medium water circulation flow is common. The third circulation flow path is provided with a seventh heat exchanger for heating the third medium water by the above-mentioned warm drainage.         The ultrapure water production device according to claim 7, wherein a sixth heat exchanger for heating the ultrapure water is provided between the first heat exchanger and the second heat exchanger, and the third cycle The flow path is a heat source fluid flow path provided so that the third medium water heated in the seventh heat exchanger flows through the heat source fluid flow path of the sixth heat exchanger to the fifth heat exchanger.