TW201819085A - Laser machining system - Google Patents

Laser machining system Download PDF

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Publication number
TW201819085A
TW201819085A TW105139038A TW105139038A TW201819085A TW 201819085 A TW201819085 A TW 201819085A TW 105139038 A TW105139038 A TW 105139038A TW 105139038 A TW105139038 A TW 105139038A TW 201819085 A TW201819085 A TW 201819085A
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Taiwan
Prior art keywords
laser light
laser
coupling element
light source
processing system
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TW105139038A
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Chinese (zh)
Inventor
羅晏明
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盟立自動化股份有限公司
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Application filed by 盟立自動化股份有限公司 filed Critical 盟立自動化股份有限公司
Priority to TW105139038A priority Critical patent/TW201819085A/en
Priority to CN201611169817.7A priority patent/CN108127260A/en
Priority to CN201621385843.9U priority patent/CN206286713U/en
Publication of TW201819085A publication Critical patent/TW201819085A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms

Abstract

A laser machining system includes a first laser source, a second laser source, a wave plate, and a light combination component. The first laser source is used for emitting a first laser beam. The second laser source is used for emitting a second laser beam. The first laser beam and the second laser beam are two types of laser beams, respectively, and have two different characteristics. The wave plate is used for polarizing the second laser beam emitted from the second laser source. The light combination component is used for receiving and combining the first laser beam emitted from the first laser source and the second laser beam polarized by the wave plate, so as to output a third laser beam for machining a workpiece. In such a way, the laser machining system of the present invention can increase machining speed, improve machining quality and enhance absorption rate of material.

Description

雷射加工系統Laser processing system

本發明關於一種加工系統,尤指一種雷射加工系統。The invention relates to a processing system, in particular to a laser processing system.

雷射加工是利用雷射光聚焦形成的高功率光斑以移除材料,屬於一種常見的非接觸式的加工方式,其中雷射光依據其輸出方式可區分為連續波形式與脈衝形式。當雷射光以連續波形式或是長脈衝形式輸出以加工材料時,材料會吸收雷射光之能量,經由固態、液態、氣態之相變化形成缺口,然而連續波形式或是長脈衝形式的輸出方式雖加工速度快,但於加工過程中,雷射光之能量會使得材料溫度提升,熱效應所造成之材料熔化變形降低了加工精度;當雷射光以短脈衝形式輸出以加工材料時,雷射光可直接打斷材料原子或分子間的鍵結,使得材料來不及將熱傳遞出去就被汽化,因此有效地避免了材料熔化變形以提升加工精度,然而相較連續波形式或是長脈衝形式之雷射,短脈衝形式之雷射單次脈衝所能移除之材料較少,因此加工速度較慢。Laser processing is a high-power spot formed by laser light focusing to remove material. It belongs to a common non-contact processing method. Laser light can be divided into continuous wave form and pulse form according to its output mode. When laser light is output as a continuous wave or a long pulse to process a material, the material absorbs the energy of the laser light and forms a gap through the phase change of solid, liquid, and gaseous phases. However, the output mode of continuous wave or long pulse is Although the processing speed is fast, during the processing, the energy of the laser light will increase the temperature of the material, and the melting and deformation of the material caused by the thermal effect will reduce the processing accuracy. Breaking the bond between the atoms or molecules of the material, so that the material is vaporized before it can transfer heat, so the melting and deformation of the material is effectively avoided to improve the processing accuracy. However, compared with the continuous wave or long pulse laser, A short pulse of laser can remove less material in a single pulse, so the processing speed is slower.

因此,本發明之目的在於提供一種雷射加工系統,可同時兼顧加工速度以及加工精度,以解決上述問題。Therefore, an object of the present invention is to provide a laser processing system, which can simultaneously take into account processing speed and processing accuracy to solve the above problems.

為達成上述目的,本發明揭露一種雷射加工系統,包含有一第一雷射光源、一第二雷射光源、一偏振片以及一光耦合元件,該第一雷射光源用以發射一第一雷射光,該第二雷射光源用以發射一第二雷射光,該偏振片用以偏振由該第二雷射光源所發出之該第二雷射光,該光耦合元件用以接收且耦合由該第一雷射光源所發出之該第一雷射光與被該偏振片所偏振之該第二雷射光,以輸出一第三雷射光,藉以加工一工件。To achieve the above object, the present invention discloses a laser processing system including a first laser light source, a second laser light source, a polarizer, and an optical coupling element. The first laser light source is configured to emit a first laser light source. Laser light, the second laser light source is used to emit a second laser light, the polarizer is used to polarize the second laser light emitted by the second laser light source, and the optical coupling element is used to receive and couple The first laser light emitted by the first laser light source and the second laser light polarized by the polarizing plate are used to output a third laser light for processing a workpiece.

根據本發明其中之一實施例,該雷射加工系統另包含有一雷射擴束器以及一雷射加工頭,該雷射擴束器用以減少由該光耦合元件所發出之該第三雷射光之發散,該雷射加工頭用以聚焦由該雷射擴束器所發出之該第三雷射光,以加工該工件。According to one embodiment of the present invention, the laser processing system further includes a laser beam expander and a laser processing head. The laser beam expander is used to reduce the third laser light emitted by the optical coupling element. Divergence, the laser processing head is used to focus the third laser light emitted by the laser beam expander to process the workpiece.

根據本發明其中之一實施例,該雷射加工系統另包含有一第一反射組件,該第一反射組件用以將由該第一雷射光源所發出之該第一雷射光反射至該光耦合元件。According to one embodiment of the present invention, the laser processing system further includes a first reflection component for reflecting the first laser light emitted by the first laser light source to the optical coupling element. .

根據本發明其中之一實施例,該雷射加工系統另包含有一第二反射組件,該第二反射組件用以將由該第二雷射光源所發出之該第二雷射光反射穿過該偏振片至該光耦合元件。According to one embodiment of the present invention, the laser processing system further includes a second reflection component for reflecting the second laser light emitted by the second laser light source through the polarizer. To the optical coupling element.

根據本發明其中之一實施例,該雷射加工系統另包含有一第三反射組件,該第三反射組件用以將由該光耦合元件所發射之該第三雷射光反射至該雷射擴束器。According to one embodiment of the present invention, the laser processing system further includes a third reflective component, and the third reflective component is configured to reflect the third laser light emitted by the optical coupling element to the laser beam expander. .

根據本發明其中之一實施例,該光耦合元件為具有偏極性的一分光鏡。According to one embodiment of the present invention, the optical coupling element is a beam splitter having a polarized polarity.

根據本發明其中之一實施例,該第一雷射光具有一第一偏極特性,被該偏振片偏振後之該第二雷射光具有一第二偏極特性,該第一偏極特性與該第二偏極特性相異。According to one embodiment of the present invention, the first laser light has a first polarization characteristic, and the second laser light polarized by the polarizer has a second polarization characteristic, and the first polarization characteristic and the The second polar characteristics are different.

根據本發明其中之一實施例,該第一雷射光源以一第一脈衝發射該第一雷射光,該第二雷射光源以一第二脈衝發射該第二雷射光,該第二脈衝大於該第一脈衝。According to one embodiment of the present invention, the first laser light source emits the first laser light with a first pulse, the second laser light source emits the second laser light with a second pulse, and the second pulse is greater than The first pulse.

綜上所述,本發明係利用偏振片以及光耦合元件來耦合具有短脈衝之第一雷射光以及長脈衝之第二雷射光,以形成第三雷射光來加工工件,因此第三雷射光同時具有短脈衝之第一雷射光之高峰值能量以及長脈衝之第二雷射光之高脈衝能量,因此本發明之雷射加工系統於加工時,尤其是於加工硬脆性材料時,可同時提升加工速度、優化加工品質且可增加材料吸收率,進而達到避免漏孔或錯位之效果,故可提高良率和生產率。有關本發明之前述及其他技術內容、特點與功效,在以下配合參考圖式之實施例的詳細說明中,將可清楚的呈現。In summary, the present invention uses a polarizer and a light coupling element to couple a first laser light with a short pulse and a second laser light with a long pulse to form a third laser light to process a workpiece. Therefore, the third laser light is simultaneously The high peak energy of the first laser light with short pulses and the high pulse energy of the second laser light with long pulses. Therefore, the laser processing system of the present invention can simultaneously improve processing when processing, especially when processing hard and brittle materials. Speed, optimize processing quality and increase the material absorption rate, thereby achieving the effect of avoiding leaks or misalignment, so it can improve yield and productivity. The foregoing and other technical contents, features, and effects of the present invention will be clearly presented in the following detailed description of the embodiments with reference to the drawings.

請參閱第1圖,第1圖為本發明實施例雷射加工系統之元件配置圖。如第1圖所示,本發明之雷射加工系統1係用來加工一工件2,尤其適合用來加工由硬脆性材質(如陶瓷、藍寶石、玻璃等材料)所製成之工件2,雷射加工系統1包含有一第一雷射光源11、一第二雷射光源12、一偏振片13、一光耦合元件14、一雷射擴束器15、一雷射加工頭16、一第一反射組件17、一第二反射組件18以及一第三反射組件19。Please refer to FIG. 1. FIG. 1 is a component configuration diagram of a laser processing system according to an embodiment of the present invention. As shown in FIG. 1, the laser processing system 1 of the present invention is used to process a workpiece 2, and is particularly suitable for machining workpieces 2 made of hard and brittle materials (such as ceramics, sapphire, glass, etc.). The laser processing system 1 includes a first laser light source 11, a second laser light source 12, a polarizer 13, an optical coupling element 14, a laser beam expander 15, a laser processing head 16, and a first The reflective component 17, a second reflective component 18 and a third reflective component 19.

於此實施例中,第一雷射光源11以一第一脈衝寬度(pulse width)發射一第一雷射光L1,第二雷射光源12以一第二脈衝寬度發射一第二雷射光L2,該第二脈衝寬度可大於該第一脈衝寬度,也就是說,第一雷射光L1之峰值能量(peak power)較第二雷射光為高,但第二雷射光L2之脈衝能量(pulse energy)較第一雷射光L1為高,第一雷射光源11可為一短脈衝雷射光發射裝置,第二雷射光源12可為一長脈衝雷射光發射裝置,然本發明並不侷限於此。舉例來說,於另一實施例中,第二雷射光源12亦可為一連續波雷射光發射裝置,端視實際需求而定。此外,使用者另可依據工件2之材料特性調整第一雷射光L1與第二雷射光L2之功率(power)、重複率(repetition rate)、波長(wave length)、占空比(duty cycle)等參數,以達到不同的加工效果。例如使用者可依據工件2之材料特性將第一雷射光L1以及第二雷射光L2之波長調整至特定波長,有助於材料吸收第一雷射光L1以及第二雷射光L2。In this embodiment, the first laser light source 11 emits a first laser light L1 with a first pulse width, and the second laser light source 12 emits a second laser light L2 with a second pulse width. The second pulse width may be larger than the first pulse width, that is, the peak power of the first laser light L1 is higher than that of the second laser light, but the pulse energy of the second laser light L2 is Compared with the first laser light L1, the first laser light source 11 may be a short-pulse laser light emitting device, and the second laser light source 12 may be a long-pulse laser light emitting device, but the present invention is not limited thereto. For example, in another embodiment, the second laser light source 12 may also be a continuous wave laser light emitting device, which depends on actual needs. In addition, the user can also adjust the power, repetition rate, wave length, and duty cycle of the first laser light L1 and the second laser light L2 according to the material characteristics of the workpiece 2. And other parameters to achieve different processing results. For example, the user can adjust the wavelengths of the first laser light L1 and the second laser light L2 to a specific wavelength according to the material characteristics of the workpiece 2 to help the material absorb the first laser light L1 and the second laser light L2.

第一反射組件17設置於第一雷射光源11與光耦合元件14之間且用以改變第一雷射光L1之光路徑,以在特定的空間內將由第一雷射光源11所發出之第一雷射光L1反射至光耦合元件14。第二反射組件18設置於第二雷射光源12與偏振片13之間且用以改變第二雷射光L2之光路徑,以在特定的空間內將由第二雷射光源12所發出之第二雷射光L2反射至偏振片13。偏振片13用以偏振由第二反射組件18所反射之第二雷射光L2,光耦合元件14用以接收且耦合由第一反射組件17所反射之第一雷射光L1與被偏振片13所偏振之第二雷射光L2,以輸出一第三雷射光L3至第三反射組件19。第三反射組件19設置於光耦合元件14與雷射擴束器15之間且用以改變第三雷射光L3之光路徑,以在特定的空間內將由光耦合元件14所發出之第三雷射光L3反射至雷射擴束器15。由於從雷射光源所發出的雷射光具有一定的發散角,雷射擴束器15用以減少由光耦合元件14所發出之第三雷射光L3之發散,以使通過雷射擴束器15之第三雷射光近似於平行光束,雷射加工頭16用以聚焦由雷射擴束器15所發出之第三雷射光L3於工件2,而焦距端視實際加工需求而定。The first reflection component 17 is disposed between the first laser light source 11 and the optical coupling element 14 and is used to change the light path of the first laser light L1 so that the first A laser light L1 is reflected to the optical coupling element 14. The second reflecting component 18 is disposed between the second laser light source 12 and the polarizing plate 13 and is used to change the light path of the second laser light L2 so that the second laser light emitted by the second laser light source 12 will be emitted in a specific space. The laser light L2 is reflected to the polarizing plate 13. The polarizing plate 13 is used to polarize the second laser light L2 reflected by the second reflecting component 18, and the light coupling element 14 is used to receive and couple the first laser light L1 reflected by the first reflecting component 17 and the polarized plate 13 The polarized second laser light L2 is used to output a third laser light L3 to the third reflective component 19. The third reflection component 19 is disposed between the optical coupling element 14 and the laser beam expander 15 and is used to change the optical path of the third laser light L3 so that the third laser emitted by the optical coupling element 14 will be emitted in a specific space. The emitted light L3 is reflected to the laser beam expander 15. Since the laser light emitted from the laser light source has a certain divergence angle, the laser beam expander 15 is used to reduce the divergence of the third laser light L3 emitted from the optical coupling element 14 so as to pass the laser beam expander 15 The third laser light is approximately a parallel beam. The laser processing head 16 is used to focus the third laser light L3 emitted by the laser beam expander 15 on the workpiece 2. The focal length end depends on the actual processing requirements.

於此實施例中,光耦合元件14為具有偏極性的一分光鏡,然本發明並不侷限於此。再者,於此實施例中,第一反射組件17、第二反射組件18、第三反射組件19分別可包含有至少一平面鏡M,以反射相對應之雷射光,然本發明之反射組件並不侷限於此。再者,於另一實施例中,雷射加工系統1亦可不包含有第一反射組件17,意即光耦合元件14與第一雷射光源11係沿第一雷射光L1之前進方向設置,使得第一雷射光源11所發出之第一雷射光L1可直接朝光耦合元件14直線前進,而不需要經過第一反射組件17反射。同理,於其他實施例中,雷射加工系統1亦可透過改變第二雷射光源12與偏振片13間之設置關係或光耦合元件14與雷射擴束器15間之設置關係而不包含有第二反射組件18或第三反射組件19。此外,本發明之第一反射組件17、第二反射組件18、第三反射組件19之設置位置以及其所包含之平面鏡M數量並不侷限本發明實施例圖式所繪示,其端視實際設計需求而定。舉例來說,當偏振片13與光耦合元件14並非沿第二雷射光L2之前進方向設置時,第二反射組件18可另包含有設置於偏振片13與光耦合元件14之間之至少一平面鏡,以使通過偏振片13之第二雷射光L2可再經由該至少一平面鏡反射而朝光耦合元件14前進。In this embodiment, the light coupling element 14 is a beam splitter with a polarized polarity, but the present invention is not limited thereto. Furthermore, in this embodiment, the first reflective component 17, the second reflective component 18, and the third reflective component 19 may each include at least one plane mirror M to reflect the corresponding laser light. However, the reflective component of the present invention is not Not limited to this. Furthermore, in another embodiment, the laser processing system 1 may not include the first reflective component 17, which means that the optical coupling element 14 and the first laser light source 11 are disposed along the forward direction of the first laser light L1. In this way, the first laser light L1 emitted by the first laser light source 11 can directly proceed straight toward the optical coupling element 14 without being reflected by the first reflection component 17. Similarly, in other embodiments, the laser processing system 1 can also change the setting relationship between the second laser light source 12 and the polarizer 13 or the setting relationship between the optical coupling element 14 and the laser beam expander 15 without changing Contains a second reflective component 18 or a third reflective component 19. In addition, the installation positions of the first reflective component 17, the second reflective component 18, and the third reflective component 19 of the present invention and the number of the plane mirrors M included therein are not limited to those shown in the drawings of the embodiment of the present invention, and the ends thereof are actual. Design requirements. For example, when the polarizing plate 13 and the optical coupling element 14 are not disposed along the forward direction of the second laser light L2, the second reflection component 18 may further include at least one of the polarizing plate 13 and the optical coupling element 14 disposed between the polarizing plate 13 and the optical coupling element 14. A plane mirror, so that the second laser light L2 passing through the polarizing plate 13 can be reflected by the at least one plane mirror to advance toward the optical coupling element 14.

如第1圖所示,當欲利用雷射加工系統1加工由硬脆型材料所製成之工件2時,第一雷射光源11與第二雷射光源12分別朝第一反射組件17與第二反射組件18發出第一雷射光L1與第二雷射光L2,第一反射組件17將第一雷射光L1反射至光耦合元件14,第二反射組件18將第二雷射光L2反射至偏振片13。於此實施例中,由第一雷射光源11所發出之第一雷射光L1與由第二雷射光源12所發出之第二雷射光L2可皆具有一第一偏極特性,而被偏振片13偏振後之第二雷射光L2具有相異於該第一偏極特性之一第二偏極特性,以使光耦合元件14將由第一雷射光源11所發出且具有第一偏極特性的第一雷射光L1以及由第二雷射光源12所發出且具被偏振片13偏振後而具有第二偏極特性的第二雷射光L2耦合,其中該第一偏極特性與該第二偏極特性可分別為水平極化(P-polarized)與垂直極化(S-polarized),然本發明並不侷限於此。As shown in FIG. 1, when the laser processing system 1 is used to process a workpiece 2 made of a hard and brittle material, the first laser light source 11 and the second laser light source 12 face the first reflection component 17 and The second reflective component 18 emits the first laser light L1 and the second laser light L2, the first reflective component 17 reflects the first laser light L1 to the optical coupling element 14, and the second reflective component 18 reflects the second laser light L2 to polarization Sheet 13. In this embodiment, the first laser light L1 emitted by the first laser light source 11 and the second laser light L2 emitted by the second laser light source 12 may both have a first polarization characteristic and be polarized. The second laser light L2 polarized by the sheet 13 has a second polarization characteristic different from the first polarization characteristic, so that the optical coupling element 14 will be emitted by the first laser light source 11 and have the first polarization characteristic. Is coupled to the first laser light L1 and the second laser light L2 emitted by the second laser light source 12 and having a second polarization characteristic after being polarized by the polarizer 13, wherein the first polarization characteristic and the second The polarization characteristics can be horizontally polarized (P-polarized) and vertically polarized (S-polarized), but the present invention is not limited thereto.

當光耦合元件14接收來自第一反射組件17所反射之第一雷射光L1與被偏振片13偏振之第二雷射光L2時,由於第一雷射光L1與第二雷射光L2分別具有相異之該第一偏極特性與該第二偏極特性,因此具有該第一偏極特性之第一雷射光L1可直接被光耦合元件14反射至第三反射組件19,而被偏振片13偏振後之具有該第二偏極特性之第二雷射光L2則會穿透光耦合元件14朝第三反射組件19前進。換句話說,被光耦合元件14所反射之第一雷射光L1與穿透光耦合元件14之第二雷射光L2會互相重疊而耦合形成第三雷射光L3。接著,第三雷射光L3藉由第三反射組件19反射至雷射擴束器15,雷射擴束器15用以調整由第三反射組件19反射之第三雷射光L3,以使第三雷射光L3近似於平行光束,並將第三雷射光L3發射至雷射加工頭16,雷射加工頭16再將由雷射擴束器15所發出之第三雷射光L3聚焦於工件2,以進行加工。When the optical coupling element 14 receives the first laser light L1 reflected from the first reflecting component 17 and the second laser light L2 polarized by the polarizing plate 13, the first laser light L1 and the second laser light L2 are different from each other. The first polarization characteristic and the second polarization characteristic, therefore, the first laser light L1 having the first polarization characteristic can be directly reflected by the optical coupling element 14 to the third reflection component 19 and polarized by the polarizer 13 The second laser light L2 having the second polarization characteristic will pass through the optical coupling element 14 and proceed toward the third reflection component 19. In other words, the first laser light L1 reflected by the light coupling element 14 and the second laser light L2 passing through the light coupling element 14 overlap each other to form a third laser light L3. Then, the third laser light L3 is reflected to the laser beam expander 15 by the third reflection component 19, and the laser beam expander 15 is used to adjust the third laser light L3 reflected by the third reflection component 19 to make the third The laser light L3 is approximately a parallel beam, and emits the third laser light L3 to the laser processing head 16. The laser processing head 16 focuses the third laser light L3 emitted from the laser beam expander 15 on the workpiece 2 to For processing.

請參閱第2圖,第2圖為本發明實施例第三雷射光L3之時間T-功率P關係圖。如第2圖所示,由於第三雷射光L3實質上係由第一雷射光L1與第二雷射光L2耦合而成,因此當使用者利用第三雷射光L3加工工件2時,第三雷射光L3中具有該較短之第一脈衝寬度之第一雷射光L1具有較高之峰值能量,其可突破材料剝蝕門檻(ablation threshold)AT,瞬間直接移除被加熱之材料以減少熱效應擴散至他處,進而對材料表面進行改質與粗化,而第三雷射光L3中具有該較長之第二脈衝寬度之第二雷射光L2具有較高脈衝能量,其透過熔蝕(melting)或汽化(vaporization)材料,來達到快速加工工件之目的,藉此本發明之雷射加工系統1可提升加工速度、優化加工品質且可增加材料吸收率,進而達到避免漏孔或錯位效果,故可提高良率和生產率。然本發明並不侷限於本實施例,請參閱第3圖,第3圖本發明另一實施例一第三雷射光L3’之時間T-功率P關係圖。如第3圖所示,於另一實施例中,第三雷射光L3’實質上係由具有高峰值能量、短脈衝寬度之一第一雷射光L1’與具有高能量連續波之一第二雷射光L2’耦合而成,相似地,第三雷射光L3’中具有高峰值能量、短脈衝寬度之第一雷射光L1’可對材料表面進行改質與粗化,使得材料表面在受到第一雷射光L1’破壞後可更有效地吸收第三雷射光L3’中具有高能量連續波之第二雷射光L2’,進而提升加工速度。 相較於先前技術,本發明係利用偏振片以及光耦合元件來耦合具有短脈衝之第一雷射光以及長脈衝第二雷射光,以形成第三雷射光,再利用第三雷射光來加工工件,因此第三雷射光同時具有短脈衝之第一雷射光之高峰值能量以及長脈衝之第二雷射光之高脈衝能量,因此本發明之雷射加工系統於加工時,尤其是於加工硬脆性材料時,可同時提升加工速度、優化加工品質且可增加材料吸收率,進而達到避免漏孔或錯位之效果,故可提高良率和生產率。以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。Please refer to FIG. 2. FIG. 2 is a time T-power P relationship diagram of the third laser light L3 according to an embodiment of the present invention. As shown in Fig. 2, the third laser light L3 is substantially formed by coupling the first laser light L1 and the second laser light L2. Therefore, when the user uses the third laser light L3 to process the workpiece 2, the third laser light L3 The first laser light L1 having the shorter first pulse width in the light L3 has a higher peak energy, which can break through the ablation threshold AT of the material, and directly remove the heated material in an instant to reduce the diffusion of thermal effects to Elsewhere, the surface of the material is further modified and roughened, and the second laser light L2 having the longer second pulse width in the third laser light L3 has a higher pulse energy, which passes through melting or Vaporize the material to achieve the purpose of rapid processing of the workpiece, whereby the laser processing system 1 of the present invention can increase the processing speed, optimize the processing quality and increase the material absorption rate, thereby achieving the effect of avoiding leaks or misalignment. Improve yield and productivity. However, the present invention is not limited to this embodiment. Please refer to FIG. 3. FIG. 3 is a time T-power P relationship diagram of a third laser light L3 'according to another embodiment of the present invention. As shown in FIG. 3, in another embodiment, the third laser light L3 ′ is substantially composed of a first laser light L1 ′ having a high peak energy and a short pulse width and a second laser light having a high energy continuous wave. The laser light L2 'is coupled. Similarly, the first laser light L1' having a high peak energy and a short pulse width in the third laser light L3 'can modify and roughen the surface of the material, so that the surface of the material is subject to After the laser light L1 'is destroyed, the second laser light L2' having a high-energy continuous wave in the third laser light L3 'can be more effectively absorbed, thereby increasing the processing speed. Compared with the prior art, the present invention uses a polarizer and a light coupling element to couple the first laser light with a short pulse and the second laser light with a long pulse to form a third laser light, and then uses the third laser light to process the workpiece Therefore, the third laser light has both the high peak energy of the short pulse of the first laser light and the high pulse energy of the long pulse of the second laser light. Therefore, the laser processing system of the present invention is particularly hard and brittle during processing. When the material is used, the processing speed can be improved at the same time, the processing quality can be optimized, and the material absorption rate can be increased, thereby achieving the effect of avoiding leaks or misalignment, so the yield and productivity can be improved. The above description is only a preferred embodiment of the present invention, and all equivalent changes and modifications made in accordance with the scope of patent application of the present invention shall fall within the scope of the present invention.

1‧‧‧雷射加工系統1‧‧‧laser processing system

11‧‧‧第一雷射光源11‧‧‧The first laser light source

12‧‧‧第二雷射光源12‧‧‧second laser light source

13‧‧‧偏振片13‧‧‧Polarizer

14‧‧‧光耦合元件14‧‧‧Optical coupling element

15‧‧‧雷射擴束器15‧‧‧laser beam expander

16‧‧‧雷射加工頭16‧‧‧laser processing head

17‧‧‧第一反射組件17‧‧‧The first reflection component

18‧‧‧第二反射組件18‧‧‧Second reflective component

19 ‧‧‧第三反射組件19 ‧‧‧Third reflective component

2‧‧‧工件2‧‧‧ Workpiece

L1、L1’‧‧‧第一雷射光L1, L1’‧‧‧ first laser light

L2、L2’‧‧‧第二雷射光L2, L2’‧‧‧Second laser light

L3、L3’‧‧‧第三雷射光L3, L3’‧‧‧ The third laser light

M‧‧‧平面鏡M‧‧‧ flat mirror

P‧‧‧功率P‧‧‧Power

T‧‧‧時間T‧‧‧time

AT‧‧‧材料剝蝕門檻AT‧‧‧Threshold of material erosion

第1圖為本發明實施例雷射加工系統之元件配置圖。 第2圖為本發明實施例第三雷射光之時間-功率關係圖。 第3圖為本發明另一實施例第三雷射光之時間-功率關係圖。FIG. 1 is a component configuration diagram of a laser processing system according to an embodiment of the present invention. FIG. 2 is a time-power relationship diagram of the third laser light according to the embodiment of the present invention. FIG. 3 is a time-power relationship diagram of a third laser light according to another embodiment of the present invention.

Claims (8)

一種雷射加工系統,包含有: 一第一雷射光源,用以發射一第一雷射光; 一第二雷射光源,用以發射一第二雷射光; 一偏振片,用以偏振由該第二雷射光源所發出之該第二雷射光;以及 一光耦合元件,用以接收且耦合由該第一雷射光源所發出之該第一雷射光與被該偏振片所偏振之該第二雷射光,以輸出一第三雷射光,藉以加工一工件。A laser processing system includes: a first laser light source for emitting a first laser light; a second laser light source for emitting a second laser light; a polarizing plate for polarizing the light The second laser light emitted by the second laser light source; and a light coupling element for receiving and coupling the first laser light emitted by the first laser light source and the first laser light polarized by the polarizer Two laser lights to output a third laser light to process a workpiece. 如請求項1所述之雷射加工系統,另包含有: 一雷射擴束器,用以減少由該光耦合元件所發出之該第三雷射光之發散;以及 一雷射加工頭,用以聚焦由該雷射擴束器所發出之該第三雷射光,以加工該工件。The laser processing system according to claim 1, further comprising: a laser beam expander for reducing the divergence of the third laser light emitted by the optical coupling element; and a laser processing head for The third laser light emitted by the laser beam expander is focused to process the workpiece. 如請求項2所述之雷射加工系統,另包含有: 一第一反射組件,用以將由該第一雷射光源所發出之該第一雷射光反射至該光耦合元件。The laser processing system according to claim 2, further comprising: a first reflection component for reflecting the first laser light emitted by the first laser light source to the optical coupling element. 如請求項3所述之雷射加工系統,另包含有: 一第二反射組件,用以將由該第二雷射光源所發出之該第二雷射光反射穿過該偏振片至該光耦合元件。The laser processing system according to claim 3, further comprising: a second reflecting component for reflecting the second laser light emitted by the second laser light source through the polarizer to the optical coupling element . 如請求項4所述之雷射加工系統,另包含有: 一第三反射組件,用以將由該光耦合元件所發射之該第三雷射光反射至該雷射擴束器。The laser processing system according to claim 4, further comprising: a third reflecting component, configured to reflect the third laser light emitted by the optical coupling element to the laser beam expander. 如請求項1所述之雷射加工系統,其中該光耦合元件為具有偏極性的一分光鏡。The laser processing system according to claim 1, wherein the optical coupling element is a beam splitter having a polarization polarity. 如請求項1所述之雷射加工系統,其中該第一雷射光具有一第一偏極特性,被該偏振片偏振後之該第二雷射光具有一第二偏極特性,該第一偏極特性與該第二偏極特性相異。The laser processing system according to claim 1, wherein the first laser light has a first polarization characteristic, and the second laser light polarized by the polarizer has a second polarization characteristic, and the first polarization The polar characteristic is different from the second polarized characteristic. 如請求項1所述之雷射加工系統,其中該第一雷射光源以一第一脈衝寬度發射該第一雷射光,該第二雷射光源以一第二脈衝寬度發射該第二雷射光,該第二脈衝寬度大於該第一脈衝寬度。The laser processing system according to claim 1, wherein the first laser light source emits the first laser light with a first pulse width, and the second laser light source emits the second laser light with a second pulse width , The second pulse width is greater than the first pulse width.
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