TW201816812A - Hydrogen discharge component - Google Patents

Hydrogen discharge component Download PDF

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TW201816812A
TW201816812A TW106131368A TW106131368A TW201816812A TW 201816812 A TW201816812 A TW 201816812A TW 106131368 A TW106131368 A TW 106131368A TW 106131368 A TW106131368 A TW 106131368A TW 201816812 A TW201816812 A TW 201816812A
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hydrogen
hydrogen discharge
film
metal layer
alloy
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TW106131368A
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Chinese (zh)
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藤原圭子
石井恭子
福岡孝博
原田憲章
中村知洋
正木俊輔
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日商日東電工股份有限公司
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

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Abstract

The purpose of the present invention is to provide a hydrogen discharge component which is not susceptible to decrease in the hydrogen permeability even if used for a long period of time. A hydrogen discharge component according to the present invention is provided with a hydrogen discharge film having a metal layer, and is additionally provided with an adsorbent on at least the hydrogen introduction surface side of the hydrogen discharge film, said adsorbent adsorbing a sulfur compound.

Description

氫排出零件Hydrogen discharge parts

本發明係關於一種設置於電池、電容器(condenser)、電容器(capacitor)、及感測器等電化學元件之氫排出零件。The present invention relates to a hydrogen discharge component provided in an electrochemical element such as a battery, a capacitor, a capacitor, and a sensor.

近年來,於風力發電及太陽光發電等之換流器、蓄電池等大型電源等用途中使用鋁電解電容器。鋁電解電容器存在因反向電壓、過電壓、及過電流導致內部產生氫氣之情形,若產生大量氫氣,則有因內部壓力之上升導致包裝外殼破裂之虞。 又,作為行動電話、筆記型電腦、及汽車等之電池,廣泛使用鋰離子電池。近年來,對於鋰離子電池,除了高容量化或提高循環特性以外,對安全性之關心正高漲。尤其是已知鋰離子電池於電池單元內會產生氣體,而擔憂隨著內壓上升,電池組會膨脹或破裂。 因此,一般之鋁電解電容器或鋰離子電池中設置有具備氣體透過膜之安全閥。安全閥除了具有將電容器或電池內部之氫氣排出至外部之功能以外,亦具有於電容器或電池之內部壓力急遽上升之情形時自我破壞使內部壓力降低而防止電容器或電池本身破裂之功能。 作為此種安全閥,例如於專利文獻1中揭示有一種氣體透過構件,其具備使氣體透過之氣體透過片材、及保持上述氣體透過片材之保持體,且以如下方式安裝於表面開設有與內部空間連通之貫通孔之容器本體:藉由從上述開口插入而經由上述氣體透過片材於上述內部空間與上述容器本體之外部空間之間進行通氣。 又,作為設置於安全閥之氣體透過膜,例如專利文獻2中提出有具備如下箔帶之壓力調節膜,該箔帶係由使鈀中含有20 wt%(19.8 mol%)之Ag而成之鈀銀(Pd-Ag)合金所構成。 然而,專利文獻2之箔帶存在於50~60℃左右以下之環境下容易脆化而無法長時間維持作為壓力調節膜之功能之問題,而未實現實用化。 為了解決上述問題,專利文獻3中提出有包含Pd-Ag合金且Pd-Ag合金中之Ag之含量為20 mol%以上之氫排出膜。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特開2015-181153號公報 [專利文獻2]日本專利第4280014號說明書 [專利文獻3]國際公開第2014/098038號In recent years, aluminum electrolytic capacitors have been used in applications such as inverters for wind power generation and solar power generation, and large power sources such as batteries. Aluminum electrolytic capacitors may generate hydrogen internally due to reverse voltage, overvoltage, and overcurrent. If a large amount of hydrogen is generated, the packaging case may be broken due to an increase in internal pressure. In addition, lithium-ion batteries are widely used as batteries for mobile phones, notebook computers, and automobiles. In recent years, in addition to increasing the capacity and improving the cycle characteristics of lithium-ion batteries, concerns about safety have been increasing. In particular, lithium-ion batteries are known to generate gas in the battery cells, and there is a concern that the battery pack may expand or rupture as the internal pressure rises. Therefore, a general aluminum electrolytic capacitor or a lithium ion battery is provided with a safety valve having a gas-permeable membrane. In addition to the function of venting hydrogen inside the capacitor or battery to the outside, the safety valve also has the function of self-destructing to reduce the internal pressure and prevent the capacitor or battery from rupturing when the internal pressure of the capacitor or battery rises rapidly. As such a safety valve, for example, Patent Document 1 discloses a gas-permeable member that includes a gas-permeable sheet that allows gas to pass therethrough, and a holder that holds the gas-permeable sheet, and is mounted on a surface as follows: The container body of the through-hole communicating with the internal space: ventilation is performed between the internal space and the external space of the container body by inserting from the opening through the gas permeation sheet. In addition, as a gas-permeable membrane provided in a safety valve, for example, Patent Document 2 proposes a pressure-regulating membrane having a foil tape made of 20 wt% (19.8 mol%) of Ag in palladium. Made of palladium-silver (Pd-Ag) alloy. However, the foil tape of Patent Document 2 has a problem that it is easily embrittlement in an environment of about 50 to 60 ° C. or lower, and cannot maintain the function as a pressure regulating film for a long time, and has not been put into practical use. In order to solve the above-mentioned problems, Patent Document 3 proposes a hydrogen discharge film including a Pd-Ag alloy and an Ag content in the Pd-Ag alloy of 20 mol% or more. [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent Laid-Open Publication No. 2015-181153 [Patent Document 2] Japanese Patent No. 4280014 Specification [Patent Document 3] International Publication No. 2014/098038

[發明所欲解決之問題] 然而,由金屬形成之先前之氫排出膜、尤其是由Pd合金形成之氫排出膜存在氫透過性會因使用環境而逐漸降低之問題。 本發明係鑒於上述問題而完成者,其目的在於提供一種即便於長時間使用之情形時氫透過性亦不易降低之氫排出零件。又,本發明之目的在於提供一種具備該氫排出零件之電化學元件。 [解決問題之技術手段] 本發明係關於一種氫排出零件,其特徵在於:其係具備具有金屬層之氫排出膜者,且於上述氫排出膜之至少氫導入面側設置有吸附硫化合物之吸附材。 本發明者對設置於氫排出零件之先前之氫排出膜的氫透過性逐漸降低之原因進行了努力研究,結果發現:並非氫氣導致金屬層脆化,而是從電化學元件內部之構成構件(例如,管、電極引線材料、電解紙、固定材、及膠帶等)產生之含有硫化合物之氣體腐蝕(硫化等)氫排出膜之金屬層,導致金屬層劣化,由此導致氫透過性逐漸降低。此種現象於為了從混合氣體中分離高純度之氫氣而於400℃以上之高溫下使用之先前之氫氣精製用金屬膜中並未成為問題,並且使用金屬膜之氫排出膜並未實用化,因此至今業者並不知曉。 並且,本發明者基於上述見解而對解決方案進行了努力研究,結果發現:藉由在氫排出零件設置吸附氣體所含之硫化合物之吸附材而抑制硫化合物與氫排出膜之金屬層接觸,氫排出膜之金屬層變得不易被腐蝕,其結果,即使於長時間使用之情形時,氫透過性亦變得不易降低。 上述吸附材較佳為含有選自由二氧化矽、氧化鋁、矽鋁、沸石、二氧化鈦、氧化鋯、氧化鎂、氧化鋅、白土、黏土、矽藻土、及活性碳所組成之群中之至少1種。又,上述吸附材較佳為含有金屬擔載陶瓷者。藉由使用含有該等之吸附材,可有效地吸附氣體所含之硫化合物。 就氫透過性、耐氧化性、及吸藏氫時之耐脆化性優異之觀點而言,上述金屬層較佳為含有Pd合金之合金層。 上述Pd合金較佳為含有20~65 mol%之第11族元素。又,上述第11族元素較佳為選自由Au、Ag、及Cu所組成之群中之至少1種。 含有Pd-第11族元素合金之合金層具有如下功能:於膜表面將氫分子解離為氫原子並使氫原子固溶於膜內,使固溶之氫原子自高壓側擴散至低壓側,於低壓側之膜表面再次將氫原子轉換為氫分子並排出。於第11族元素之含量未達20 mol%之情形時,有合金之強度不充分,或不易表現出上述功能之傾向,於超過65 mol%之情形時,有氫透過速度降低之傾向。 上述氫排出膜較佳為於上述金屬層之單面或雙面具有支持體。支持體係為了於金屬層從安全閥脫落之情形時防止其掉落至電化學元件內而設置。又,金屬層必須具有於電化學元件之內部壓力成為特定值以上時自我破壞之作為安全閥之功能。於金屬層為薄膜之情形時,有金屬層之機械強度較低,因此於電化學元件之內部壓力成為特定值前自我破壞之虞,而無法發揮作為安全閥之功能。因此,於金屬層為薄膜之情形時,為了提昇機械強度,較佳為於金屬層之單面或雙面積層支持體。 又,本發明係關於具備上述氫排出零件之電化學元件。作為電化學元件,例如可列舉鋁電解電容器及鋰離子電池等。 又,本發明係關於使用上述氫排出零件之氫排出方法。 於本發明之氫排出方法中,較佳為使用上述氫排出零件於150℃以下之環境下將氫排出。 [發明之效果] 本發明之氫排出零件即使於長時間使用電化學元件之情形時,氫透過性亦不易降低,而可將氫氣穩定地排出。又,本發明之氫排出零件不僅可僅將電化學元件內部所產生之氫氣迅速排出至外部,而且可防止雜質從外部侵入至電化學元件內部。又,本發明之氫排出零件於電化學元件之內部壓力急遽上升之情形時可自我破壞而降低內部壓力,從而防止電化學元件本身之破裂。藉由該等效果,可長時間維持電化學元件之性能,而可謀求電化學元件之長壽命化。[Problems to be Solved by the Invention] However, the conventional hydrogen discharge film formed of a metal, especially a hydrogen discharge film formed of a Pd alloy, has a problem that hydrogen permeability gradually decreases depending on a use environment. The present invention has been made in view of the above-mentioned problems, and an object thereof is to provide a hydrogen exhaust component that is hardly reduced in hydrogen permeability even when it is used for a long time. It is another object of the present invention to provide an electrochemical device including the hydrogen discharge component. [Technical means for solving the problem] The present invention relates to a hydrogen discharge part, which is characterized in that it is provided with a hydrogen discharge film having a metal layer, and at least a hydrogen introduction surface side of the hydrogen discharge film is provided with an adsorbing sulfur compound Adsorption material. The present inventors made diligent research on the reason why the hydrogen permeability of the previous hydrogen discharge film provided on the hydrogen discharge part was gradually reduced, and found that the metal layer was not embrittled by hydrogen, but a constituent member from inside the electrochemical element ( For example, the gas containing sulfur compounds produced by tubes, electrode lead materials, electrolytic paper, fixing materials, and tapes etc. corrode (sulfurize, etc.) the metal layer of the hydrogen discharge film, causing the metal layer to deteriorate, thereby causing the hydrogen permeability to gradually decrease . This phenomenon has not become a problem in the conventional metal film for hydrogen purification used at a high temperature of 400 ° C or higher in order to separate high-purity hydrogen from a mixed gas, and a hydrogen discharge film using a metal film has not been put into practical use. Therefore, the industry does not know so far. In addition, the present inventors have worked hard on a solution based on the above findings, and have found that by providing an adsorbent for adsorbing a sulfur compound contained in a gas in a hydrogen exhaust part, the sulfur compound is prevented from contacting the metal layer of the hydrogen exhaust film. The metal layer of the hydrogen discharge film is less likely to be corroded. As a result, even when used for a long period of time, the hydrogen permeability is not easily reduced. The adsorbent preferably contains at least one selected from the group consisting of silica, alumina, silica-alumina, zeolite, titanium dioxide, zirconia, magnesia, zinc oxide, white clay, clay, diatomaceous earth, and activated carbon. 1 species. Moreover, it is preferable that the said adsorbent is a metal containing ceramic. By using such an adsorbent, the sulfur compounds contained in the gas can be efficiently adsorbed. From the viewpoint of excellent hydrogen permeability, oxidation resistance, and embrittlement resistance during storage of hydrogen, the metal layer is preferably an alloy layer containing a Pd alloy. The Pd alloy preferably contains 20 to 65 mol% of a Group 11 element. The Group 11 element is preferably at least one selected from the group consisting of Au, Ag, and Cu. The alloy layer containing Pd-group 11 element alloy has the following functions: dissociating hydrogen molecules into hydrogen atoms on the surface of the film and dissolving the hydrogen atoms in the film so that the dissolved hydrogen atoms diffuse from the high-pressure side to the low-pressure side, and The film surface on the low pressure side converts hydrogen atoms into hydrogen molecules again and discharges them. When the content of the Group 11 element is less than 20 mol%, the strength of the alloy may be insufficient, or the above-mentioned function may not be easily exhibited. When it exceeds 65 mol%, the hydrogen transmission rate tends to decrease. The hydrogen discharge film preferably has a support on one or both sides of the metal layer. The support system is provided to prevent the metal layer from falling into the electrochemical element when the metal layer falls off the safety valve. In addition, the metal layer must have a function as a safety valve that self-destructs when the internal pressure of the electrochemical device becomes a certain value or more. In the case where the metal layer is a thin film, the mechanical strength of the metal layer is low, so that the internal pressure of the electrochemical element may self-destruct before it becomes a specific value, and it cannot function as a safety valve. Therefore, when the metal layer is a thin film, in order to improve the mechanical strength, it is preferably on a single-sided or double-area layer support of the metal layer. Moreover, this invention relates to the electrochemical element provided with the said hydrogen discharge part. Examples of the electrochemical element include an aluminum electrolytic capacitor and a lithium ion battery. The present invention also relates to a hydrogen discharge method using the hydrogen discharge part. In the hydrogen discharge method of the present invention, it is preferable to use the above-mentioned hydrogen discharge part to discharge hydrogen under an environment of 150 ° C or lower. [Effects of the Invention] Even when the hydrogen discharge part of the present invention is used for a long period of time, the hydrogen permeability is not easily reduced, and the hydrogen can be stably discharged. In addition, the hydrogen discharge part of the present invention can not only quickly discharge hydrogen generated inside the electrochemical element to the outside, but also prevent impurities from entering the inside of the electrochemical element from the outside. In addition, the hydrogen discharge component of the present invention can self-destruct and reduce the internal pressure when the internal pressure of the electrochemical element sharply rises, thereby preventing the electrochemical element itself from being broken. By these effects, the performance of the electrochemical device can be maintained for a long period of time, and the longevity of the electrochemical device can be achieved.

以下,對本發明之實施形態進行說明。 本發明之氫排出零件至少具有具備金屬層之氫排出膜、及於上述氫排出膜之至少氫導入面側之吸附硫化合物之吸附材,其他構成構件並無特別限定。 上述氫排出膜至少具有金屬層。金屬層需為可僅將電化學元件內部所產生之氫氣排出至外部且可防止物質從外部侵入至電化學元件內部者,例如為實質上無微細之貫通孔之無孔體。 形成金屬層之金屬只要為單質形態下或藉由進行合金化而具有氫透過功能之金屬,則無特別限制,例如可列舉:Pd、Nb、V、Ta、Ni、Fe、Al、Cu、Ru、Re、Rh、Au、Pt、Ag、Cr、Co、Sn、Zr、Y、Ce、Ti、Ir、Mo及含有2種以上該等金屬之合金等。 上述金屬層較佳為含有Pd合金之合金層。形成Pd合金之其他金屬並無特別限制,較佳為使用第11族元素,更佳為選自由Au、Ag、及Cu所組成之群中之至少1種。尤其是Pd-Au合金對電化學元件內部之電解液或由構成構件產生之氣體成分之耐腐蝕性優異,故而較佳。Pd合金較佳為含有20~65 mol%之第11族元素,更佳為30~65 mol%,進而較佳為30~60 mol%,尤佳為40~60 mol%。又,含有Ag含量為20 mol%以上之Pd-Ag合金、Cu含量為30 mol%以上之Pd-Cu合金、或Au含量為20 mol%以上之Pd-Au合金之合金層即使於約50~60℃以下之低溫範圍內,亦不易因氫而脆化,故而較佳。又,Pd合金亦可於無損本發明之效果之範圍內含有IB族及/或IIIA族之金屬。 Pd合金不僅可為含有包括Pd在內之2種成分之合金,而且亦可為例如Pd-Au-Ag之含有3種成分之合金,亦可為Pd-Au-Cu之含有3種成分之合金。進而,亦可為Pd-Au-Ag-Cu之含有4種成分之合金。例如,於為含有Pd、Au及其他金屬之多成分系合金之情形時,Pd-Au合金中之Au與其他金屬之合計含量較佳為55 mol%以下,更佳為50 mol%以下,進而較佳為45 mol%以下,尤佳為40 mol%以下。 上述金屬層例如可藉由輥軋法、濺鍍法、真空蒸鍍法、離子鍍覆法、及鍍敷法等而製造,於製造膜厚較厚之金屬層之情形時,較佳為使用輥軋法,於製造膜厚較薄之金屬層之情形時,較佳為使用濺鍍法。 輥軋法可為熱軋、冷軋之任一方法。輥軋法係藉由使一對或複數對輥(roller)旋轉,並於輥間一面施加壓力一面使作為原料之金屬通過而將其加工為膜狀之方法。 藉由輥軋法獲得之金屬層之膜厚較佳為5~50 μm,更佳為10~30 μm。於膜厚未達5 μm之情形時,容易於製造時產生針孔或龜裂,或若吸藏氫則容易變形。另一方面,若膜厚超過50 μm,則使氫透過需要時間,因此氫透過性降低,或於成本方面較差,故而欠佳。 濺鍍法並無特別限定,可使用平行板型、單片型、通過型、DC(direct current,直流)濺鍍、及RF(radio frequency,射頻)濺鍍等之濺鍍裝置而進行。例如,於設置有金屬靶之濺鍍裝置上安裝基板後,對濺鍍裝置內進行真空排氣,並將氬氣(Ar)氣壓調整為特定值,對金屬靶通入特定之濺鍍電流,而於基板上形成金屬膜。其後,從基板剝離金屬膜而獲得金屬層。再者,作為靶,可根據所製造之金屬層而使用單一或複數個靶。 作為基板,例如可列舉:玻璃板、陶瓷板、矽晶圓、鋁及不鏽鋼等之金屬板。 藉由濺鍍法而獲得之金屬層之膜厚較佳為0.01~5 μm,更佳為0.05~2 μm。於膜厚未達0.01 μm之情形時,不僅有形成針孔之可能性,而且亦不易獲得所要求之機械強度。又,從基板剝離時容易破損,剝離後之操作亦較困難。另一方面,若膜厚超過5 μm,則製造金屬層需要時間,於成本方面較差,故而欠佳。 金屬層之膜面積可考慮氫透過量與膜厚而適當調整,但於用作氫排出零件之構成構件之情形時,為0.01~100 mm2 左右。再者,於本發明中,膜面積係金屬層中實質上排出氫之部分之面積,不包括下文所述之環狀之塗佈有接著劑之部分。 亦可於金屬層之表面設置塗層。藉由設置塗層,可防止污染物(例如,電解液)附著於氫排出膜之金屬層之表面而將其腐蝕。 塗層之原料較佳為可形成與水之接觸角為85°以上之表面者,例如可列舉:氟系化合物、橡膠系聚合物、聚矽氧系聚合物、胺基甲酸酯系聚合物、及聚酯系聚合物等。該等中,就與水之接觸角較大且不易阻礙氫排出膜之氫透過性之觀點而言,較佳為使用選自由氟系化合物、橡膠系聚合物、及聚矽氧系聚合物所組成之群中之至少1種化合物。 作為氟系化合物,例如可列舉:氟烷基羧酸鹽、氟烷基四級銨鹽、及氟烷基環氧乙烷加成物等含氟烷基之化合物;全氟烷基羧酸鹽、全氟烷基四級銨鹽、及全氟烷基環氧乙烷加成物等含全氟烷基之化合物;四氟乙烯/六氟丙烯共聚物、及四氟乙烯/全氟烷基乙烯醚共聚物等含氟碳基之化合物;四氟乙烯聚合物;偏二氟乙烯與四氟乙烯之共聚物;偏二氟乙烯與六氟丙烯之共聚物;含氟(甲基)丙烯酸酯;含氟(甲基)丙烯酸酯聚合物;含氟(甲基)丙烯酸烷基酯聚合物;含氟(甲基)丙烯酸酯與其他單體之共聚物等。該等可使用1種,亦可併用2種以上。 又,關於作為塗層之原料之氟系化合物,亦可使用HARVES公司製造之「DURASURF」系列、DAIKIN工業公司製造之「OPTOOL」系列、及信越化學工業公司製造之「KY-100」系列等。 作為橡膠系聚合物,例如可列舉:天然橡膠、苯乙烯丁二烯橡膠、丙烯腈丁二烯橡膠、氯丁二烯橡膠、聚異戊二烯橡膠、聚丁二烯橡膠、乙烯丙烯橡膠、乙烯-丙烯-二烯三元聚合物橡膠、氯磺化聚乙烯橡膠、及乙烯-乙酸乙烯酯共聚物橡膠等。該等可使用1種,亦可併用2種以上。 又,關於作為塗層之原料之橡膠系聚合物,亦可使用Nitto Shinko公司製造之「ELEP COAT」系列等。 作為聚矽氧系聚合物,例如可列舉:聚二甲基矽氧烷、烷基改性聚二甲基矽氧烷、羧基改性聚二甲基矽氧烷、胺基改性聚二甲基矽氧烷、環氧改性聚二甲基矽氧烷、氟改性聚二甲基矽氧烷、及(甲基)丙烯酸酯改性聚二甲基矽氧烷等。該等可使用1種,亦可併用2種以上。 塗層例如可藉由在金屬層上或設置於金屬層上之其他層上塗佈塗層原料組合物並使之硬化而形成。 塗佈方法並無特別限制,例如可列舉:輥塗法、旋轉塗佈法、浸漬塗佈法、噴塗法、棒式塗佈法、刮塗法、模嘴塗佈法、噴墨法、及凹版塗佈法等。 溶劑根據塗層之原料適當選擇即可。於使用氟系化合物作為塗層之原料之情形時,例如可單獨使用氟系溶劑、醇系溶劑、醚系溶劑、酯系溶劑、及烴系溶劑等溶劑,或將該等混合使用。該等中,較佳為單獨使用無引火性且迅速揮發之氟系溶劑,或將其與其他溶劑混合使用。 作為氟系溶劑,例如可列舉:氫氟醚、全氟聚醚、全氟烷烴、氫氟聚醚、氫氟碳、全氟環醚、全氟環烷烴、氫氟環烷烴、六氟二甲苯、氫氟氯碳、及全氟碳等。該等可使用1種,亦可併用2種以上。 塗層之厚度並無特別限制,下限值較佳為0.1 μm以上,更佳為0.3 μm以上,進而較佳為0.5 μm以上,尤佳為1.0 μm以上,上限值較佳為80 μm以下,更佳為50 μm以下,進而較佳為30 μm以下,進而較佳為20 μm以下,進而較佳為10 μm以下,尤佳為5 μm以下。 塗層之厚度可藉由塗層原料組合物之固形物成分濃度或塗佈次數加以調整。 為了防止來自氣體之污染物之透過,塗層較佳為無孔質層。 亦可於金屬層之單面或雙面設置支持體。尤其是藉由濺鍍法而獲得之金屬層由於膜厚較薄,因此較佳為為了提高機械強度,而於金屬層之單面或雙面積層支持體。 圖1及2係表示本發明之氫排出膜1之結構的概略剖視圖。氫排出膜1具有氫導入面6及氫排出面7。可如圖1(a)或(b)所示,使用環狀之接著劑3於金屬層2之單面或雙面積層支持體4,亦可如圖2(a)或(b)所示,使用夾具8而於金屬層2之單面或雙面積層支持體4。又,塗層5可設置於金屬層2上,亦可設置於支持體4上。 支持體4只要為具有氫透過性且可支持金屬層2者,則無特別限定,可為無孔質體,亦可為多孔質體。又,支持體4可為織布、不織布。作為支持體4之形成材料,例如可列舉:聚乙烯及聚丙烯等聚烯烴、聚對苯二甲酸乙二酯及聚萘二甲酸乙二酯等聚酯、聚碸及聚醚碸等聚芳醚碸、聚四氟乙烯及聚偏二氟乙烯等氟樹脂、環氧樹脂、聚醯胺、聚醯亞胺、聚醯胺醯亞胺等。該等中,較佳為使用化學穩定及熱穩定之聚碸、聚四氟乙烯、聚醯胺、聚醯亞胺、及聚醯胺醯亞胺。 支持體4較佳為平均孔徑為100 μm以下之多孔質體。若平均孔徑超過100 μm,則多孔質體之表面平滑性降低,因此於藉由濺鍍法等製造金屬層之情形時,不易於多孔質體上形成膜厚均勻之金屬層,或容易於金屬層產生針孔或龜裂。 支持體4之厚度並無特別限定,通常為5~1000 μm左右,較佳為10~300 μm。 於藉由濺鍍法製造金屬層2之情形時,若使用支持體4作為基板,則可於支持體4上直接形成金屬層2,可不使用接著劑3或夾具8而製造氫排出膜1,因此就氫排出膜1之物性及製造效率之觀點而言較佳。於該情形時,作為支持體4,較佳為使用平均孔徑100 μm以下之多孔質體,更佳為平均孔徑5 μm以下之多孔質體,尤佳為使用超過濾膜(UF膜,Ultrafiltration membrane)。 上述氫排出膜之形狀可為大致圓形,亦可為三角形、四角形、五角形等多角形。可製成適於下文所述之用途之任意形狀。 上述氫排出膜於低溫下不會脆化,因此有可於例如150℃以下之溫度、進而110℃以下之溫度下使用之優點。即,可較佳地用作不於高溫(例如400~500℃)下使用之鋁電解電容器或鋰離子電池之安全閥或氫排出閥。 上述吸附材之原料只要為吸附硫化合物者,則無特別限制,例如可列舉:二氧化矽、氧化鋁、矽鋁、沸石、二氧化鈦、氧化鋯、氧化鎂、氧化鋅、白土、黏土、矽藻土、及活性碳等。該等可使用1種,亦可併用2種以上。 又,亦可使用金屬擔載陶瓷作為上述吸附材之原料。金屬擔載陶瓷只要為吸附硫化合物者,則無特別限制,作為擔載之金屬,例如可列舉:銀、銅、鉑、鐵、鎳、錫、及鋅等,關於作為載體之陶瓷,例如可列舉:二氧化矽、氧化鋁、矽鋁、沸石、二氧化鈦、氧化鋯、氧化鎂、及氧化鋅等。該等可使用1種,亦可併用2種以上。 作為上述吸附材之形成方法,例如可列舉:煅燒上述原料之方法、於高壓下將上述原料壓固之方法、將上述原料填充至氣體透過性容器內之方法、加工成含有上述原料之纖維之方法、及將該纖維片材化之方法等。 上述吸附材之形態並無特別限制,可採用任意之形態,為了使其容易安裝於保持體等,較佳為含有吸附材之濾筒(cartridge)之形態。 圖3~5係表示本發明之氫排出零件之結構之一例的概略剖面立體圖或概略剖視圖。然而,本發明之氫排出零件之實施形態並不受圖3~5之實施形態任何限定,除了具有上述吸附材以外,可採用公知之氫排出零件之所有實施形態。以下,一面參照圖3一面對氫排出零件之結構進行說明。 氫排出零件9具有固定構件10、氫排出膜1、保持上述氫排出膜1之保持體(A)11、氣體透過膜12、保持上述氣體透過膜12之保持體(B)13、設置於上述保持體(B)13之內部之吸附材14、及彈性構件15。 此外,氫排出零件9係安裝於設置於電化學元件之封口體16之凹部17內,保持體(B)13之一部分係嵌入至設置於凹部17之與電化學元件內部相連之貫通孔18。 即,先前之氫排出零件具有於上述氫排出零件9中未設置吸附材14之形態,本發明之氫排出零件具有於先前之氫排出零件設置有吸附材14之形態。 固定構件10、保持體(A)11、及保持體(B)13之形成材料並無特別限制,例如可列舉:鋁、及不鏽鋼等金屬;酚系樹脂、PBT(polybutylene terephthalate,聚對苯二甲酸丁二酯)樹脂、PP(polypropylene,聚丙烯)樹脂、及PPS(polyphenylene sulfide,聚苯硫醚)樹脂等樹脂。又,該等之形狀亦無特別限制,可採用公知之形狀。 為了僅使電化學元件內部產生之氣體透過,並且為了防止吸附材14與氫排出膜1接觸而損傷氫排出膜1之表面,氣體透過膜12較佳為設置於保持體(B)13。 氣體透過膜12之形成材料並無特別限制,例如可列舉金屬、陶瓷、及樹脂等,就撥水性、耐熱性、及耐化學品性之觀點而言,較佳為氟樹脂。 彈性構件15係由橡膠等彈性材料所形成,係為了賦予密封性等而設置。 為了防止從電化學元件內部產生之含有硫化合物之氣體與氫排出膜1之金屬層接觸,而於氫排出膜1之至少氫導入面側(電化學元件內部與氫排出膜1之間)設置吸附材14。吸附材14可設置於保持體(B)13之下部或內部,或者亦可直接或經由其他構件而積層於氫排出膜1之氫導入面側。又,為了防止大氣中所含之硫化合物與氫排出膜1之金屬層接觸,可於氫排出膜1之氫排出面側亦設置吸附材14。 本發明之氫排出零件作為鋁電解電容器或鋰離子電池之安全閥而有用。又,本發明之氫排出零件亦可與安全閥不同體地作為氫排出閥而設置於電化學元件。 使用本發明之氫排出零件將電化學元件內部所產生之氫氣排出之方法並無特別限定,例如可於鋁電解電容器或鋰離子電池之外裝部分之一部分設置本發明之氫排出零件,將其用作外裝內部與外部之隔離構件。於該情形時,外裝內部與外部由氫排出零件之氫排出膜所隔離,氫排出膜不會使氫氣以外之氣體透過。外裝內部所產生之氫氣藉由壓力之上升而經由氫排出膜排出至外部,外裝內部不會上升至特定壓力以上。 本發明之氫排出膜係藉由適當調整其合金組成而在低溫下不會脆化,因此具有可於例如150℃以下之溫度、進而110℃以下之溫度下使用之優點。即,根據其用途,於不在高溫(例如400~500℃)下使用之鋁電解電容器或鋰離子電池之氫排出方法中,可尤佳地使用本發明之氫排出零件。 [實施例] 以下,列舉實施例對本發明進行說明,但本發明不受該等實施例任何限定。 製造例1 [利用濺鍍法之氫排出膜(Au含量50 mol%)之製作] 於安裝有Au含量為50 mol%之Pd-Au合金靶之RF磁控濺鍍裝置(Sanyu Electron公司製造)安裝作為支持體之聚醯胺醯亞胺/芳香族聚醯胺多孔質片材(日東電工公司製造,孔徑0.001~0.1 μm)。其後,將濺鍍裝置內真空排氣為1×10-5 Pa以下,於氬氣(Ar)氣壓1.0 Pa下對Pd-Au合金靶通入4.8 A之濺鍍電流,於支持體上形成厚度400 nm之Pd-Au合金層(Au含量50 mol%)。然後,藉由浸漬塗佈法於Pd-Au合金層上塗佈防污層原料組合物(HARVES公司製造,DURASURF DS-3302TH),並加以乾燥,形成防污層,從而製作氫排出膜。 實施例1 使用製造例1中所製作之氫排出膜,製作圖3所記載之形態之氫排出零件。作為吸附材,使用將沸石Ag(Tosoh公司製造,HSZ-941,粉體)填充至PP樹脂製之殼體中而製作之濾筒。然後,使用所製作之氫排出零件、及作為隔離件之麻紙等製作鋁電解電容器。 實施例2 使用製造例1中所製作之氫排出膜,製作圖3所記載之形態之氫排出零件。作為吸附材,使用將沸石Ag(Tosoh公司製造,HSZ-941,顆粒)填充至PP樹脂製之殼體中而製作之濾筒。然後,使用所製作之氫排出零件、及作為隔離件之麻紙等製作鋁電解電容器。 實施例3 使用製造例1中所製作之氫排出膜,製作圖3所記載之形態之氫排出零件。作為吸附材,使用將氧化鋁Cu(UNION SHOWA公司製造,GB217,粉體)填充至PP樹脂製之殼體中而製作之濾筒。然後,使用所製作之氫排出零件、及作為隔離件之麻紙等製作鋁電解電容器。 實施例4 使用製造例1中所製作之氫排出膜,製作圖3所記載之形態之氫排出零件。作為吸附材,使用將氧化鋁Cu(UNION SHOWA公司製造,GB217,顆粒B)填充至PP樹脂製之殼體中而製作之濾筒。然後,使用所製作之氫排出零件、及作為隔離件之麻紙等製作鋁電解電容器。 實施例5 使用製造例1中所製作之氫排出膜,製作圖3所記載之形態之氫排出零件。作為吸附材,使用將氧化鋁Cu(UNION SHOWA公司製造,GB217,顆粒G)填充至PP樹脂製之殼體中而製作之濾筒。然後,使用所製作之氫排出零件、及作為隔離件之麻紙等製作鋁電解電容器。 實施例6 使用製造例1中所製作之氫排出膜,製作圖3所記載之形態之氫排出零件。作為吸附材,使用將沸石Cu(Tosoh公司製造,HSZ-840CUA1、粉體)填充至PP樹脂製之殼體中而製作之濾筒。然後,使用所製作之氫排出零件、及作為隔離件之麻紙等製作鋁電解電容器。 實施例7 使用製造例1中所製作之氫排出膜,製作圖4所記載之形態之氫排出零件9。作為吸附材,使用將氧化鋁Cu(UNION SHOWA公司製造,GB217,粉體)填充至PP樹脂製之殼體13(保持體(B))中,並利用氣體透過膜12(日東電工股份有限公司製造,TEMISH,氟多孔膜)蓋於殼體13之上部而製作之濾筒。為了確保氣密性,而於濾筒與氫排出膜1之間設置聚矽氧製之方形環19,並且於濾筒與封口體(參照圖3之封口體16)之間設置聚矽氧製之彈性構件15(O環)。然後,使用所製作之氫排出零件、及作為隔離件之麻紙等製作鋁電解電容器。 實施例8 使用製造例1中所製作之氫排出膜,製作圖5所記載之形態之氫排出零件9。作為吸附材,使用藉由以下之方法所製作之濾筒。將氧化鋁Cu(UNION SHOWA公司製造,GB217,顆粒G)裝入PP樹脂製之殼體13(保持體(B))中,於氧化鋁Cu與殼體13之空隙中填充聚矽氧密封劑(信越化學公司製造,KE-1833)。於125℃下使聚矽氧密封劑硬化1小時後,使用針手鉗(pin vise)從殼體13之底部至氧化鋁Cu形成直徑0.5 mm之貫通孔而設置氣體流入口20。又,使用針手鉗從殼體13之上部至氧化鋁Cu形成直徑0.5 mm之貫通孔而設置氣體排出口21。然後,為了避免氧化鋁Cu從殼體13散落,於氣體流入口20及氣體排出口21上熔接氣體透過膜12(日東電工股份有限公司製造,TEMISH,氟多孔膜)而製作濾筒。為了確保氣密性,而於濾筒與氫排出膜1之間設置聚矽氧製之方形環19,並且於濾筒與封口體(參照圖3之封口體16)之間設置聚矽氧製之彈性構件15(O環)。然後,使用所製作之氫排出零件、及作為隔離件之麻紙等製作鋁電解電容器。 實施例9 於實施例8中,將上述貫通孔之直徑從0.5 mm變更為0.8 mm,除此以外,藉由與實施例8同樣之方法製作鋁電解電容器。 比較例1 使用製造例1中所製作之氫排出膜,製作圖3所記載之形態之氫排出零件。但不設置吸附材。然後,使用所製作之氫排出零件、及作為隔離件之麻紙等製作鋁電解電容器。 [測定及評價方法] (施加電壓前之氫排出膜之氫透過量之測定) 將製造例1中所製作之氫排出膜安裝於Swagelok公司製造之VCR(Vacuum Coupling Radius Seal,真空連接徑向密封)連接器,於單側安裝SUS管,製作經密封之空間(63.5 ml)。藉由真空泵將管內減壓後,以氫氣之壓力成為0.15 MPa之方式加以調整,監控於105℃之環境下之壓力變化。根據壓力變化可知透過氫排出膜之氫莫耳數(體積),因此將其換算為每天之透過量而算出氫透過量。例如,於在2小時內壓力從0.15 MPa變化為0.05 MPa之情形時(變化量0.10 MPa),透過氫排出膜之氫體積為63.5 ml。因此,每天之氫透過量成為63.5×24/2=762 ml/day。氫排出膜之氫透過量較佳為10 ml/day以上,更佳為40 ml/day以上,進而較佳為70 ml/day以上,尤佳為100 ml/day以上。 (鋁電解電容器之評價) 對實施例及比較例中所製作之鋁電解電容器,於環境溫度105℃下進行96小時之400 V之電壓施加。其後,目視確認鋁電解電容器之鋁殼體之變形,按照下述基準進行評價。 〇:鋁殼體無形狀變化 ×:鋁殼體有鼓出 (電壓施加後之氫排出膜之氫透過量之測定) 從96小時之電壓施加後之上述鋁電解電容器中取出氫排出膜,藉由與上述同樣之方法測定氫排出膜之氫透過量。 [表1] [產業上之可利用性] 本發明之氫排出零件可適宜地用作設置於電池、電容器(condenser)、電容器(capacitor)、及感測器等電化學元件之安全閥或氫排出閥。Hereinafter, embodiments of the present invention will be described. The hydrogen discharge part of the present invention has at least a hydrogen discharge film having a metal layer and an adsorbent for adsorbing a sulfur compound on at least the hydrogen introduction surface side of the hydrogen discharge film, and other constituent members are not particularly limited. The hydrogen discharge film includes at least a metal layer. The metal layer needs to be able to discharge only the hydrogen generated inside the electrochemical element to the outside and prevent substances from entering the inside of the electrochemical element from the outside. For example, the metal layer is a non-porous body without substantially fine through holes. The metal forming the metal layer is not particularly limited as long as it is a metal having a hydrogen permeation function in a simple substance form or by alloying, and examples thereof include Pd, Nb, V, Ta, Ni, Fe, Al, Cu, and Ru , Re, Rh, Au, Pt, Ag, Cr, Co, Sn, Zr, Y, Ce, Ti, Ir, Mo, and alloys containing two or more of these metals. The metal layer is preferably an alloy layer containing a Pd alloy. The other metals forming the Pd alloy are not particularly limited, and it is preferred to use a Group 11 element, and more preferably at least one selected from the group consisting of Au, Ag, and Cu. In particular, Pd-Au alloy is preferable because it has excellent corrosion resistance to the electrolytic solution inside the electrochemical element or the gas component generated by the constituent member. The Pd alloy preferably contains 20 to 65 mol% of the Group 11 element, more preferably 30 to 65 mol%, still more preferably 30 to 60 mol%, and even more preferably 40 to 60 mol%. In addition, the alloy layer containing Pd-Ag alloy with an Ag content of 20 mol% or more, Pd-Cu alloy with a Cu content of 30 mol% or more, or Pd-Au alloy with an Au content of 20 mol% or more is even about 50 to In the low temperature range below 60 ° C, it is also not easily embrittled by hydrogen, so it is preferable. In addition, the Pd alloy may contain a group IB and / or group IIIA metal within a range that does not impair the effects of the present invention. The Pd alloy may be not only an alloy containing two components including Pd, but also an alloy containing three components such as Pd-Au-Ag, and an alloy containing three components including Pd-Au-Cu. . Furthermore, Pd-Au-Ag-Cu may be an alloy containing four components. For example, in the case of a multi-component alloy containing Pd, Au, and other metals, the total content of Au and other metals in the Pd-Au alloy is preferably 55 mol% or less, and more preferably 50 mol% or less. It is preferably 45 mol% or less, and particularly preferably 40 mol% or less. The above-mentioned metal layer can be produced by, for example, a rolling method, a sputtering method, a vacuum evaporation method, an ion plating method, and a plating method, and is preferably used in the case of manufacturing a thick metal layer. The roll method is preferably a sputtering method when manufacturing a thin metal layer. The rolling method may be any of hot rolling and cold rolling. The rolling method is a method in which a pair or a plurality of pairs of rollers are rotated, and a metal as a raw material is passed through while applying pressure between the rollers to process the film into a film. The film thickness of the metal layer obtained by the rolling method is preferably 5 to 50 μm, and more preferably 10 to 30 μm. When the film thickness is less than 5 μm, pinholes or cracks are likely to occur during manufacture, or if hydrogen is stored, it is liable to deform. On the other hand, if the film thickness exceeds 50 μm, it takes time for hydrogen to pass through, so hydrogen permeability is lowered or the cost is poor, which is not good. The sputtering method is not particularly limited, and can be performed using sputtering devices such as a parallel plate type, a monolithic type, a through type, a DC (direct current) sputtering, and an RF (radio frequency) sputtering. For example, after a substrate is mounted on a sputtering device provided with a metal target, the inside of the sputtering device is evacuated, and the argon (Ar) gas pressure is adjusted to a specific value, and a specific sputtering current is passed to the metal target. A metal film is formed on the substrate. Thereafter, the metal film was peeled from the substrate to obtain a metal layer. As the target, a single or a plurality of targets may be used depending on the metal layer to be manufactured. Examples of the substrate include glass plates, ceramic plates, silicon wafers, metal plates such as aluminum and stainless steel. The film thickness of the metal layer obtained by the sputtering method is preferably 0.01 to 5 μm, and more preferably 0.05 to 2 μm. When the film thickness is less than 0.01 μm, it is not only possible to form pinholes, but it is also difficult to obtain the required mechanical strength. In addition, it is easy to break when peeled from the substrate, and the operation after peeling is also difficult. On the other hand, if the film thickness exceeds 5 μm, it takes time to manufacture the metal layer, which is inferior in terms of cost, which is not preferable. The film area of the metal layer can be appropriately adjusted in consideration of the hydrogen permeation amount and film thickness, but when it is used as a constituent member of a hydrogen discharge part, it is about 0.01 to 100 mm 2 . In addition, in the present invention, the film area refers to the area of the portion of the metal layer that substantially emits hydrogen, and does not include the ring-shaped portion coated with the adhesive described below. A coating can also be provided on the surface of the metal layer. By providing the coating layer, it is possible to prevent contaminants (for example, an electrolytic solution) from being attached to the surface of the metal layer of the hydrogen discharge film and corroding it. The raw material of the coating layer is preferably one that can form a surface with a contact angle of 85 ° or more with water. Examples include fluorine-based compounds, rubber-based polymers, polysiloxane-based polymers, and urethane-based polymers. And polyester polymers. Among these, it is preferable to use a material selected from the group consisting of a fluorine-based compound, a rubber-based polymer, and a polysiloxane-based polymer from the viewpoint that the contact angle with water is large and the hydrogen permeability of the hydrogen discharge film is not easily hindered. At least one compound in the group. Examples of the fluorine-based compound include a fluorine-containing alkyl compound such as a fluoroalkyl carboxylate, a fluoroalkyl quaternary ammonium salt, and a fluoroalkyl ethylene oxide adduct; a perfluoroalkyl carboxylate , Perfluoroalkyl quaternary ammonium salts, perfluoroalkyl ethylene oxide adducts and other compounds containing perfluoroalkyl groups; tetrafluoroethylene / hexafluoropropylene copolymers, and tetrafluoroethylene / perfluoroalkyl Fluorocarbon-based compounds such as vinyl ether copolymers; Tetrafluoroethylene polymers; Copolymers of vinylidene fluoride and tetrafluoroethylene; Copolymers of vinylidene fluoride and hexafluoropropylene; Fluorinated (meth) acrylates ; Fluorine-containing (meth) acrylate polymers; fluorine-containing (meth) acrylate alkyl ester polymers; copolymers of fluorine-containing (meth) acrylates and other monomers, and the like. These may be used singly or in combination of two or more kinds. As for the fluorine-based compound used as a raw material of the coating layer, "DURASURF" series manufactured by HARVES Corporation, "OPTOOL" series manufactured by Daikin Industries, and "KY-100" series manufactured by Shin-Etsu Chemical Industry Co., Ltd. can also be used. Examples of the rubber-based polymer include natural rubber, styrene butadiene rubber, acrylonitrile butadiene rubber, chloroprene rubber, polyisoprene rubber, polybutadiene rubber, ethylene propylene rubber, Ethylene-propylene-diene terpolymer rubber, chlorosulfonated polyethylene rubber, and ethylene-vinyl acetate copolymer rubber. These may be used singly or in combination of two or more kinds. As for the rubber-based polymer used as a raw material for the coating layer, the "ELEP COAT" series manufactured by Nitto Shinko can also be used. Examples of the polysiloxane polymer include polydimethylsiloxane, alkyl-modified polydimethylsiloxane, carboxy-modified polydimethylsiloxane, and amino-modified polydimethylsiloxane. Siloxane, epoxy-modified polydimethylsiloxane, fluorine-modified polydimethylsiloxane, and (meth) acrylate-modified polydimethylsiloxane. These may be used singly or in combination of two or more kinds. The coating layer can be formed, for example, by applying and curing a coating raw material composition on a metal layer or another layer provided on the metal layer. The coating method is not particularly limited, and examples thereof include a roll coating method, a spin coating method, a dip coating method, a spray coating method, a bar coating method, a blade coating method, a die coating method, an inkjet method, and Gravure coating method and the like. The solvent may be appropriately selected according to the coating material. When a fluorine-based compound is used as a raw material of the coating layer, for example, a fluorine-based solvent, an alcohol-based solvent, an ether-based solvent, an ester-based solvent, and a hydrocarbon-based solvent may be used alone, or a mixture of these may be used. Among these, it is preferable to use a non-pyrogenic fluorinated solvent alone or to mix it with other solvents. Examples of the fluorine-based solvent include hydrofluoroether, perfluoropolyether, perfluoroalkane, hydrofluoropolyether, hydrofluorocarbon, perfluorocyclic ether, perfluorocycloalkane, hydrofluorocycloalkane, and hexafluoroxylene. , Hydrochlorofluorocarbons, and perfluorocarbons. These may be used singly or in combination of two or more kinds. The thickness of the coating layer is not particularly limited, and the lower limit value is preferably 0.1 μm or more, more preferably 0.3 μm or more, still more preferably 0.5 μm or more, particularly preferably 1.0 μm or more, and the upper limit value is preferably 80 μm or less. It is more preferably 50 μm or less, still more preferably 30 μm or less, still more preferably 20 μm or less, still more preferably 10 μm or less, and even more preferably 5 μm or less. The thickness of the coating layer can be adjusted by the concentration of the solid content of the coating raw material composition or the number of coating times. In order to prevent permeation from gaseous pollutants, the coating is preferably a non-porous layer. A support can also be provided on one or both sides of the metal layer. In particular, since the metal layer obtained by the sputtering method has a thin film thickness, it is preferably a single-sided or double-area layer support on the metal layer in order to improve the mechanical strength. 1 and 2 are schematic cross-sectional views showing the structure of the hydrogen discharge film 1 of the present invention. The hydrogen discharge film 1 includes a hydrogen introduction surface 6 and a hydrogen discharge surface 7. As shown in Fig. 1 (a) or (b), a ring-shaped adhesive 3 is used on the single-sided or double-area-layer support 4 of the metal layer 2, or as shown in Fig. 2 (a) or (b) The holder 8 is used on the single-sided or double-area-layer support 4 of the metal layer 2. The coating 5 may be provided on the metal layer 2 or on the support 4. The support 4 is not particularly limited as long as it has hydrogen permeability and can support the metal layer 2, and may be a non-porous body or a porous body. The support 4 may be woven or non-woven. Examples of the forming material of the support 4 include polyolefins such as polyethylene and polypropylene, polyesters such as polyethylene terephthalate and polyethylene naphthalate, and polyaromatics such as polyfluorene and polyetherfluorene. Fluorine resins such as ether fluorene, polytetrafluoroethylene and polyvinylidene fluoride, epoxy resins, polyfluorene, polyfluorine, polyfluorene and so on. Among these, it is preferred to use chemically and thermally stable polyfluorene, polytetrafluoroethylene, polyfluorene, polyimide, and polyimide. The support 4 is preferably a porous body having an average pore diameter of 100 μm or less. If the average pore diameter exceeds 100 μm, the surface smoothness of the porous body is reduced. Therefore, when a metal layer is manufactured by a sputtering method or the like, it is not easy to form a metal layer with a uniform film thickness on the porous body, or it is easy to form a metal layer on the porous body. The layer has pinholes or cracks. The thickness of the support 4 is not particularly limited, but is usually about 5 to 1000 μm, and preferably 10 to 300 μm. When the metal layer 2 is manufactured by sputtering, if the support 4 is used as the substrate, the metal layer 2 can be directly formed on the support 4, and the hydrogen discharge film 1 can be manufactured without using the adhesive 3 or the jig 8. Therefore, it is preferable from the viewpoint of the physical properties and production efficiency of the hydrogen discharge film 1. In this case, as the support 4, it is preferable to use a porous body having an average pore diameter of 100 μm or less, more preferably a porous body having an average pore diameter of 5 μm or less, and it is particularly preferable to use an ultrafiltration membrane (UF membrane, Ultrafiltration membrane). ). The shape of the hydrogen discharge film may be substantially circular, or may be a polygon such as a triangle, a quadrangle, or a pentagon. It can be made into any shape suitable for the application described below. The hydrogen discharge film does not become brittle at a low temperature, and therefore has an advantage that it can be used at a temperature of 150 ° C. or lower, and further, a temperature of 110 ° C. or lower. That is, it can be preferably used as a safety valve or a hydrogen discharge valve for an aluminum electrolytic capacitor or a lithium ion battery that is not used at a high temperature (for example, 400 to 500 ° C). The raw material of the adsorption material is not particularly limited as long as it adsorbs sulfur compounds, and examples thereof include silicon dioxide, aluminum oxide, silicon aluminum, zeolite, titanium dioxide, zirconia, magnesium oxide, zinc oxide, white clay, clay, and diatoms. Soil, and activated carbon. These may be used singly or in combination of two or more kinds. Further, a metal-supported ceramic may be used as a raw material of the adsorbent. The metal-supporting ceramic is not particularly limited as long as it adsorbs sulfur compounds. Examples of the metal to be supported include silver, copper, platinum, iron, nickel, tin, and zinc. As a carrier ceramic, for example, Examples: silicon dioxide, aluminum oxide, silicon aluminum, zeolite, titanium dioxide, zirconia, magnesium oxide, and zinc oxide. These may be used singly or in combination of two or more kinds. Examples of the method for forming the adsorbent include a method of firing the raw material, a method of compacting the raw material under high pressure, a method of filling the raw material into a gas-permeable container, and processing into a fiber containing the raw material. A method, and a method of forming the fiber sheet. The form of the adsorbent is not particularly limited, and any form may be adopted. In order to make it easy to mount on a holder or the like, a form of a cartridge containing the adsorbent is preferred. 3 to 5 are a schematic cross-sectional perspective view or a schematic cross-sectional view showing an example of the structure of the hydrogen discharge part of the present invention. However, the embodiment of the hydrogen discharge part of the present invention is not limited in any way by the embodiments of FIGS. 3 to 5, and all known embodiments of the hydrogen discharge part can be used except for the above-mentioned adsorbent. Hereinafter, the structure of the hydrogen discharge part will be described with reference to FIG. 3. The hydrogen discharge part 9 includes a fixing member 10, a hydrogen discharge film 1, a holder (A) 11 holding the hydrogen discharge film 1, a gas permeable film 12, a holder (B) 13 holding the gas permeable film 12, and provided in the above. An adsorption material 14 and an elastic member 15 inside the holding body (B) 13. In addition, the hydrogen discharge part 9 is installed in the recessed part 17 provided in the sealing body 16 of the electrochemical element, and a part of the holding body (B) 13 is embedded in the through hole 18 provided in the recessed part 17 and connected to the inside of the electrochemical element. That is, the conventional hydrogen discharge part has a form in which the adsorbent 14 is not provided in the hydrogen discharge part 9, and the hydrogen discharge part of the present invention has a form in which the adsorbent 14 is provided in the previous hydrogen discharge part. The forming materials of the fixing member 10, the holder (A) 11, and the holder (B) 13 are not particularly limited, and examples thereof include metals such as aluminum and stainless steel; phenol-based resins, polybutylene terephthalate (PBT) Resin such as butyl formate) resin, PP (polypropylene) resin, and PPS (polyphenylene sulfide) resin. In addition, these shapes are not particularly limited, and known shapes can be used. In order to permeate only the gas generated inside the electrochemical element and to prevent the surface of the hydrogen discharge film 1 from being damaged by the contact between the adsorbent 14 and the hydrogen discharge film 1, the gas transmission film 12 is preferably provided on the holder (B) 13. The material for forming the gas-permeable membrane 12 is not particularly limited, and examples thereof include metals, ceramics, and resins. In terms of water repellency, heat resistance, and chemical resistance, fluororesins are preferred. The elastic member 15 is formed of an elastic material such as rubber, and is provided to provide sealing properties and the like. In order to prevent the gas containing sulfur compounds generated from the inside of the electrochemical element from coming into contact with the metal layer of the hydrogen discharge film 1, it is provided on at least the hydrogen introduction surface side of the hydrogen discharge film 1 (between the inside of the electrochemical element and the hydrogen discharge film 1). Sorption material 14. The adsorption material 14 may be provided below or inside the holding body (B) 13 or may be laminated on the hydrogen introduction surface side of the hydrogen discharge film 1 directly or via another member. In addition, in order to prevent the sulfur compounds contained in the atmosphere from coming into contact with the metal layer of the hydrogen discharge film 1, an adsorption material 14 may also be provided on the hydrogen discharge surface side of the hydrogen discharge film 1. The hydrogen discharge component of the present invention is useful as a safety valve for an aluminum electrolytic capacitor or a lithium ion battery. In addition, the hydrogen discharge part of the present invention may be provided on the electrochemical element as a hydrogen discharge valve separately from the safety valve. The method of using the hydrogen discharge part of the present invention to discharge hydrogen generated inside the electrochemical element is not particularly limited. For example, the hydrogen discharge part of the present invention may be provided in a part of an external part of an aluminum electrolytic capacitor or a lithium ion battery, and the hydrogen discharge part may be used. It is used as an isolation member for exterior and interior. In this case, the interior of the exterior is separated from the exterior by a hydrogen exhaust membrane of a hydrogen exhaust component, and the hydrogen exhaust membrane does not allow gases other than hydrogen to pass through. The hydrogen generated inside the exterior is discharged to the outside through the hydrogen discharge membrane by the increase in pressure, and the interior of the exterior will not rise above a certain pressure. The hydrogen discharge film of the present invention has an advantage that it can be used at a temperature of 150 ° C. or lower, and further at a temperature of 110 ° C. or lower, by not adjusting the alloy composition by appropriately adjusting the alloy composition. That is, depending on the application, in the hydrogen discharge method of an aluminum electrolytic capacitor or a lithium ion battery that is not used at a high temperature (for example, 400 to 500 ° C.), the hydrogen discharge component of the present invention can be particularly preferably used. [Examples] The present invention will be described below with reference to examples, but the present invention is not limited to these examples. Manufacturing Example 1 [Production of a hydrogen discharge film by sputtering method (Au content: 50 mol%)] An RF magnetron sputtering device (manufactured by Sanyu Electron) equipped with a Pd-Au alloy target having an Au content of 50 mol% A porous polyimide / aromatic polyimide sheet (manufactured by Nitto Denko Corporation, having a pore diameter of 0.001 to 0.1 μm) was mounted as a support. After that, the vacuum exhaust in the sputtering device was 1 × 10 -5 Pa or less, and a Pd-Au alloy target was passed with a sputtering current of 4.8 A under an argon (Ar) gas pressure of 1.0 Pa to form on the support. Pd-Au alloy layer (Au content 50 mol%) with a thickness of 400 nm. Then, an antifouling layer raw material composition (DURASURF DS-3302TH, manufactured by HARVES Co., Ltd.) was coated on the Pd-Au alloy layer by a dip coating method, and dried to form an antifouling layer, thereby producing a hydrogen emission film. Example 1 Using the hydrogen emission film produced in Production Example 1, a hydrogen emission part in the form described in FIG. 3 was produced. As the adsorbent, a filter cartridge prepared by filling zeolite Ag (manufactured by Tosoh Corporation, HSZ-941, powder) into a case made of PP resin was used. Then, an aluminum electrolytic capacitor is produced using the produced hydrogen discharge parts, and hemp paper as a separator. Example 2 Using the hydrogen emission film produced in Production Example 1, a hydrogen emission part in the form described in FIG. 3 was produced. As the adsorbent, a filter cartridge produced by filling zeolite Ag (manufactured by Tosoh Corporation, HSZ-941, pellets) in a case made of PP resin was used. Then, an aluminum electrolytic capacitor is produced using the produced hydrogen discharge parts, and hemp paper as a separator. Example 3 Using the hydrogen emission film produced in Production Example 1, a hydrogen emission part in the form described in FIG. 3 was produced. As the adsorbent, a filter cartridge was used in which alumina Cu (manufactured by UNION SHOWA, GB217, powder) was filled in a case made of PP resin. Then, an aluminum electrolytic capacitor is produced using the produced hydrogen discharge parts, and hemp paper as a separator. Example 4 Using the hydrogen emission film produced in Production Example 1, a hydrogen emission part in the form described in FIG. 3 was produced. As the adsorbent, a filter cartridge was used in which alumina Cu (manufactured by UNION SHOWA Co., Ltd., GB217, pellet B) was filled in a case made of PP resin. Then, an aluminum electrolytic capacitor is produced using the produced hydrogen discharge parts, and hemp paper as a separator. Example 5 Using the hydrogen emission film produced in Production Example 1, a hydrogen emission part in the form described in FIG. 3 was produced. As the adsorbent, a filter cartridge was used in which alumina Cu (manufactured by UNION SHOWA Co., Ltd., GB217, particle G) was filled in a case made of PP resin. Then, an aluminum electrolytic capacitor is produced using the produced hydrogen discharge parts, and hemp paper as a separator. Example 6 Using the hydrogen emission film produced in Production Example 1, a hydrogen emission part in the form described in FIG. 3 was produced. As the adsorbent, a filter cartridge prepared by filling zeolite Cu (manufactured by Tosoh Corporation, HSZ-840CUA1, powder) in a case made of PP resin was used. Then, an aluminum electrolytic capacitor is produced using the produced hydrogen discharge parts, and hemp paper as a separator. Example 7 Using the hydrogen emission film produced in Production Example 1, a hydrogen emission part 9 in the form described in FIG. 4 was produced. As the adsorbent, alumina Cu (manufactured by UNION SHOWA, GB217, powder) was used to fill a case 13 (retainer (B)) made of PP resin, and a gas-permeable membrane 12 was used (Nitto Denko Corporation) (Manufactured, TEMISH, fluorine porous membrane) is a filter cartridge manufactured by covering the upper part of the casing 13. In order to ensure air tightness, a polysilicon square ring 19 is provided between the filter cartridge and the hydrogen discharge membrane 1, and a polysilicon product is provided between the filter cartridge and the sealing body (refer to the sealing body 16 in FIG. 3). Flexible member 15 (O-ring). Then, an aluminum electrolytic capacitor is produced using the produced hydrogen discharge parts, and hemp paper as a separator. Example 8 Using the hydrogen emission film produced in Production Example 1, a hydrogen emission part 9 in the form described in FIG. 5 was produced. As the adsorbent, a filter cartridge produced by the following method was used. Alumina Cu (manufactured by UNION SHOWA Co., Ltd., GB217, granule G) was placed in a case 13 (retainer (B)) made of PP resin, and a silicone sealant was filled in the gap between the alumina Cu and the case 13 (Made by Shin-Etsu Chemical Co., KE-1833). After the polysiloxane sealant was cured at 125 ° C. for 1 hour, a pin vise was used to form a 0.5 mm diameter through hole from the bottom of the case 13 to the alumina Cu, and a gas inlet 20 was provided. In addition, a needle hole pliers was used to form a through hole having a diameter of 0.5 mm from the upper portion of the casing 13 to the alumina Cu, and a gas exhaust port 21 was provided. Then, in order to prevent the alumina Cu from scattering from the case 13, a gas transmission membrane 12 (manufactured by Nitto Denko Corporation, TEMISH, fluorine porous membrane) was welded to the gas inflow port 20 and the gas discharge port 21 to produce a filter cartridge. In order to ensure air tightness, a polysilicon square ring 19 is provided between the filter cartridge and the hydrogen discharge membrane 1, and a polysilicon product is provided between the filter cartridge and the sealing body (refer to the sealing body 16 in FIG. 3). Flexible member 15 (O-ring). Then, an aluminum electrolytic capacitor is produced using the produced hydrogen discharge parts, and hemp paper as a separator. Example 9 In Example 8, except that the diameter of the above-mentioned through hole was changed from 0.5 mm to 0.8 mm, an aluminum electrolytic capacitor was manufactured by the same method as in Example 8. Comparative Example 1 Using the hydrogen emission film produced in Production Example 1, a hydrogen emission part having the form described in FIG. 3 was produced. However, no adsorbent is provided. Then, an aluminum electrolytic capacitor is produced using the produced hydrogen discharge parts, and hemp paper as a separator. [Measurement and evaluation method] (Measurement of hydrogen permeation amount of hydrogen discharge film before voltage application) The hydrogen discharge film produced in Production Example 1 was mounted on a Vacuum Coupling Radius Seal (VCR) manufactured by Swagelok Company, and vacuum-connected radial seal ) Connector, install a SUS tube on one side to make a sealed space (63.5 ml). After the pressure in the tube was reduced by a vacuum pump, the pressure was adjusted so that the pressure of hydrogen became 0.15 MPa, and the pressure change under the environment of 105 ° C was monitored. The mole number (volume) of hydrogen permeating through the hydrogen discharge membrane is known from the pressure change. Therefore, it is converted into the permeation amount per day to calculate the hydrogen permeation amount. For example, when the pressure changes from 0.15 MPa to 0.05 MPa (change amount of 0.10 MPa) within 2 hours, the volume of hydrogen passing through the hydrogen discharge membrane is 63.5 ml. Therefore, the hydrogen permeation amount per day becomes 63.5 × 24/2 = 762 ml / day. The hydrogen permeation amount of the hydrogen discharge membrane is preferably 10 ml / day or more, more preferably 40 ml / day or more, even more preferably 70 ml / day or more, and even more preferably 100 ml / day or more. (Evaluation of Aluminum Electrolytic Capacitor) The aluminum electrolytic capacitors produced in the examples and comparative examples were subjected to a voltage of 400 V for 96 hours at an ambient temperature of 105 ° C. Thereafter, the deformation of the aluminum case of the aluminum electrolytic capacitor was visually confirmed, and evaluation was performed according to the following criteria. 〇: No change in the shape of the aluminum case ×: The aluminum case has a bulge (measurement of the hydrogen transmission amount of the hydrogen discharge film after the voltage is applied) Take out the hydrogen discharge film from the above aluminum electrolytic capacitor after the voltage is applied for 96 hours, and borrow The hydrogen permeation amount of the hydrogen discharge film was measured by the same method as described above. [Table 1] [Industrial Applicability] The hydrogen discharge component of the present invention can be suitably used as a safety valve or a hydrogen discharge valve provided in an electrochemical element such as a battery, a capacitor, a capacitor, and a sensor.

1‧‧‧氫排出膜1‧‧‧hydrogen exhaust membrane

2‧‧‧金屬層2‧‧‧ metal layer

3‧‧‧接著劑3‧‧‧ Adhesive

4‧‧‧支持體4‧‧‧ support

5‧‧‧塗層5‧‧‧ Coating

6‧‧‧氫導入面6‧‧‧ hydrogen introduction surface

7‧‧‧氫排出面7‧‧‧Hydrogen discharge surface

8‧‧‧夾具8‧‧‧ Fixture

9‧‧‧氫排出零件9‧‧‧ Hydrogen discharge parts

10‧‧‧固定構件10‧‧‧Fixed components

11‧‧‧保持體(A)11‧‧‧ Retainer (A)

12‧‧‧氣體透過膜12‧‧‧Gas transmission membrane

13‧‧‧保持體(B)13‧‧‧ holding body (B)

14‧‧‧吸附材14‧‧‧ Adsorbent

15‧‧‧彈性構件15‧‧‧ Elastic member

16‧‧‧封口體16‧‧‧Sealing body

17‧‧‧凹部17‧‧‧ recess

18‧‧‧貫通孔18‧‧‧through hole

19‧‧‧方形環19‧‧‧ square ring

20‧‧‧氣體流入口20‧‧‧Gas inlet

21‧‧‧氣體排出口21‧‧‧Gas exhaust port

圖1(a)、(b)係表示本發明之氫排出膜之結構的概略剖視圖。 圖2(a)、(b)係表示本發明之氫排出膜之另一結構的概略剖視圖。 圖3係表示本發明之氫排出零件之結構之一例的概略剖面立體圖。 圖4係表示本發明之氫排出零件之結構之一例的概略剖視圖。 圖5係表示本發明之氫排出零件之結構之一例的概略剖視圖。1 (a) and 1 (b) are schematic cross-sectional views showing the structure of a hydrogen discharge film of the present invention. 2 (a) and 2 (b) are schematic cross-sectional views showing another structure of the hydrogen discharge film of the present invention. Fig. 3 is a schematic cross-sectional perspective view showing an example of the structure of a hydrogen discharge part of the present invention. Fig. 4 is a schematic cross-sectional view showing an example of the structure of a hydrogen discharge part of the present invention. Fig. 5 is a schematic cross-sectional view showing an example of the structure of a hydrogen discharge part of the present invention.

Claims (11)

一種氫排出零件,其特徵在於:其係具備具有金屬層之氫排出膜者,且於上述氫排出膜之至少氫導入面側設置有吸附硫化合物之吸附材。A hydrogen discharge component is characterized by comprising a hydrogen discharge film having a metal layer, and an adsorption material that adsorbs sulfur compounds is provided on at least a hydrogen introduction surface side of the hydrogen discharge film. 如請求項1之氫排出零件,其中上述吸附材含有選自由二氧化矽、氧化鋁、矽鋁、沸石、二氧化鈦、氧化鋯、氧化鎂、氧化鋅、白土、黏土、矽藻土、及活性碳所組成之群中之至少1種。The hydrogen discharge part according to claim 1, wherein the adsorbent contains a material selected from the group consisting of silica, alumina, silica-alumina, zeolite, titania, zirconia, magnesia, zinc oxide, clay, clay, diatomaceous earth, and activated carbon At least one of the groups formed. 如請求項1之氫排出零件,其中上述吸附材含有金屬擔載陶瓷。The hydrogen discharge part according to claim 1, wherein the adsorbent contains a metal-supported ceramic. 如請求項1至3中任一項之氫排出零件,其中上述金屬層係含有Pd合金之合金層。The hydrogen discharge part according to any one of claims 1 to 3, wherein the metal layer is an alloy layer containing a Pd alloy. 如請求項4之氫排出零件,其中上述Pd合金含有20~65 mol%之第11族元素。The hydrogen discharge part according to claim 4, wherein the Pd alloy contains 20 to 65 mol% of a Group 11 element. 如請求項5之氫排出零件,其中上述第11族元素係選自由Au、Ag、及Cu所組成之群中之至少1種。For example, the hydrogen exhausting part of claim 5, wherein the group 11 element is at least one selected from the group consisting of Au, Ag, and Cu. 如請求項1至6中任一項之氫排出零件,其於上述金屬層之單面或雙面具有支持體。The hydrogen discharge part according to any one of claims 1 to 6, which has a support on one side or both sides of the metal layer. 一種電化學元件,其具備如請求項1至7中任一項之氫排出零件。An electrochemical element provided with the hydrogen discharge part according to any one of claims 1 to 7. 如請求項8之電化學元件,其中上述電化學元件為鋁電解電容器或鋰離子電池。The electrochemical element according to claim 8, wherein the electrochemical element is an aluminum electrolytic capacitor or a lithium ion battery. 一種氫排出方法,其係使用如請求項1至7中任一項之氫排出零件。A hydrogen discharge method using a hydrogen discharge part according to any one of claims 1 to 7. 如請求項10之氫排出方法,其係於150℃以下之環境下將氫排出。If the hydrogen exhaust method of claim 10 is used, the hydrogen is exhausted in an environment below 150 ° C.
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