TW201816792A - Semiconductor memory apparatus - Google Patents

Semiconductor memory apparatus Download PDF

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TW201816792A
TW201816792A TW106100753A TW106100753A TW201816792A TW 201816792 A TW201816792 A TW 201816792A TW 106100753 A TW106100753 A TW 106100753A TW 106100753 A TW106100753 A TW 106100753A TW 201816792 A TW201816792 A TW 201816792A
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voltage
bit line
power supply
sense amplifier
semiconductor memory
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TW106100753A
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TWI608481B (en
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倉盛文章
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力晶積成電子製造股份有限公司
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/4063Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing
    • G11C11/407Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing for memory cells of the field-effect type
    • G11C11/409Read-write [R-W] circuits 
    • G11C11/4091Sense or sense/refresh amplifiers, or associated sense circuitry, e.g. for coupled bit-line precharging, equalising or isolating
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/10Input/output [I/O] data interface arrangements, e.g. I/O data control circuits, I/O data buffers
    • G11C7/1051Data output circuits, e.g. read-out amplifiers, data output buffers, data output registers, data output level conversion circuits

Abstract

A semiconductor memory apparatus of the invention includes: a sense amplifier, connected to a word line and a bit line for reading data from a memory element; a first switching element, connected between a first source voltage and a first power intermediate node of the sense amplifier, being conducted when driven by the sense amplifier; a second switching element, connected between a second source voltage and a second power intermediate node of the sense amplifier, being conducted when driven by the sense amplifier; and an equalizer circuit for equalizing the first and second power intermediate nodes to an equalization voltage, which is a half level between a maximum of the first power intermediate node and a minimum of the second power intermediate node. The semiconductor memory apparatus includes a control circuit that is connected with the bit line and controls a voltage of the bit line as a predetermined value based on test signals.

Description

半導體記憶裝置Semiconductor memory device

本發明例如是有關於一種同步動態隨機存取記憶體(Synchronous Dynamic Random Access Memory,SDRAM)等半導體記憶裝置。The invention relates, for example, to a semiconductor memory device such as a synchronous dynamic random access memory (SDRAM).

圖1是表示習知SDRAM的記憶體電路的結構例的電路圖,圖2是表示圖1的記憶體電路的動作的時序圖(timing chart)。圖1中,習知的記憶體電路包含:用以記憶規定的資料值的記憶胞(memory cell)MC1、MC2;以及感測放大器(sense amplifier)11、12,其分別經由各一對位元線(bit line)BLT0、BLB0、BLT1、BLB1連接於所述記憶胞MC1、MC2,並從記憶胞MC1、MC2感測資料。FIG. 1 is a circuit diagram showing a configuration example of a memory circuit of a conventional SDRAM, and FIG. 2 is a timing chart showing an operation of the memory circuit of FIG. 1. In FIG. 1, a conventional memory circuit includes: memory cells MC1 and MC2 for memorizing predetermined data values; and sense amplifiers 11 and 12 which pass through a pair of bits respectively. Bit lines BLT0, BLB0, BLT1, and BLB1 are connected to the memory cells MC1, MC2, and data are sensed from the memory cells MC1, MC2.

圖1中,記憶胞MC1包括構成記憶體元件的記憶體電容器(memory capacitor)Ccell1以及選擇用金屬氧化物半導體(Metal Oxide Semiconductor,MOS)電晶體(transistor)Q21。記憶體電容器Ccell1的一端經由儲存節點(storage node)Ns1連接於MOS電晶體Q21的源極(source),其另一端連接於規定的電壓VCP。MOS電晶體Q21的閘極(gate)連接於字元線(word line)WL,其汲極(drain)例如連接於位元線BLB0。而且,記憶胞MC2包括構成記憶體元件的記憶體電容器Ccell2以及選擇用MOS電晶體Q22。記憶體電容器Ccell2的一端經由儲存節點Ns2連接於MOS電晶體Q22的源極,其另一端連接於規定的電壓VCP。MOS電晶體Q22的閘極連接於字元線WL,其汲極例如連接於位元線BLB1。此處,在SDRAM的記憶體電路中,多個記憶胞MC1、MC2在字元線WL的方向以及位元線BLT0、BLB0、BLT1、BLB1、…的方向上配置成格子形狀。In FIG. 1, the memory cell MC1 includes a memory capacitor Ccell1 constituting a memory element and a selective metal oxide semiconductor (MOS) transistor Q21. One end of the memory capacitor Ccell1 is connected to a source of the MOS transistor Q21 via a storage node Ns1, and the other end thereof is connected to a predetermined voltage VCP. A gate of the MOS transistor Q21 is connected to a word line WL, and a drain thereof is connected to the bit line BLB0, for example. Furthermore, the memory cell MC2 includes a memory capacitor Ccell2 constituting a memory element and a selection MOS transistor Q22. One end of the memory capacitor Ccell2 is connected to the source of the MOS transistor Q22 via a storage node Ns2, and the other end is connected to a predetermined voltage VCP. The gate of the MOS transistor Q22 is connected to the word line WL, and its drain is connected to the bit line BLB1, for example. Here, in the memory circuit of the SDRAM, a plurality of memory cells MC1 and MC2 are arranged in a grid shape in the direction of the word line WL and the direction of the bit lines BLT0, BLB0, BLT1, BLB1,....

感測放大器11是以包含MOS電晶體Q1、Q2的第1 CMOS反相器(inverter)與包含MOS電晶體Q3、Q4的第2 CMOS反相器構成正反饋迴路的正反器(flip-flop)的方式連接而成。MOS電晶體Q1、Q3的各源極連接於電源中間節點P1,電源中間節點P1經由作為開關元件的MOS電晶體Q5連接於陣列(array)電壓VARAY,此開關元件是以感測驅動信號/ACT來導通或斷開。而且,MOS電晶體Q2、Q4的各源極連接於電源中間節點P2,電源中間節點P2經由作為開關元件的MOS電晶體Q6而接地於接地電位VSS,此開關元件是以感測驅動信號ACT(感測驅動信號/ACT的反相信號)來導通或斷開。The sense amplifier 11 is a flip-flop including a first CMOS inverter including MOS transistors Q1 and Q2 and a second CMOS inverter including MOS transistors Q3 and Q4. ). Each source of the MOS transistors Q1 and Q3 is connected to the power supply intermediate node P1. The power supply intermediate node P1 is connected to the array voltage VARAY via the MOS transistor Q5 as a switching element. The switching element is a sensing driving signal / ACT To turn on or off. Further, each source of the MOS transistors Q2 and Q4 is connected to the power supply intermediate node P2, and the power supply intermediate node P2 is grounded to the ground potential VSS via the MOS transistor Q6 as a switching element. The switching element is a sensing driving signal ACT ( Sense the driving signal / the inverting signal of ACT) to turn on or off.

感測放大器12是以包含MOS電晶體Q11、Q12的第3 CMOS反相器與包含MOS電晶體Q13、Q14的第4 CMOS反相器構成正反饋迴路的正反器的方式連接而成。MOS電晶體Q11、Q13的各源極連接於電源中間節點P11,電源中間節點P11經由作為開關元件的MOS電晶體Q15連接於陣列電壓VARAY,此開關元件是以感測驅動信號/ACT來導通或斷開。而且,MOS電晶體Q12、Q14的各源極連接於電源中間節點P12,電源中間節點P12經由作為開關元件的MOS電晶體Q16而接地於接地電位VSS,此開關元件是以感測驅動信號ACT(感測驅動信號/ACT的反相信號)來導通或斷開。The sense amplifier 12 is connected in such a manner that a third CMOS inverter including MOS transistors Q11 and Q12 and a fourth CMOS inverter including MOS transistors Q13 and Q14 constitute a flip-flop having a positive feedback loop. Each source of the MOS transistors Q11 and Q13 is connected to the power supply intermediate node P11. The power supply intermediate node P11 is connected to the array voltage VARAY via a MOS transistor Q15 as a switching element. This switching element is turned on by a sensing driving signal / ACT or disconnect. In addition, each source of the MOS transistors Q12 and Q14 is connected to the power supply intermediate node P12, and the power supply intermediate node P12 is grounded to the ground potential VSS via the MOS transistor Q16 as a switching element. The switching element is a sensing driving signal ACT ( Sense the driving signal / the inverting signal of ACT) to turn on or off.

進而,感測放大器11具備等化器(equalizer)電路21,該等化器電路21包含MOS電晶體Q31~Q33,在待命(standby)時,基於等化信號VEQ,將位元線、BLT0、BLB0等化為陣列電壓VARAY的半值電壓VBL(以下稱作等化電壓VBL)。而且,感測放大器12具備等化器電路22,該等化器電路22包含MOS電晶體Q34~Q36,在待命時,基於等化信號VEQ,將位元線、BLT1、BLB1等化為等化電壓VBL。所述電壓VBL例如經由半導體積體電路上的觸點(contact)10連接於各等化器電路21、22。此處,感測放大器11是在MOS電晶體Q5、Q6、Q15、Q16基於感測驅動信號ACT、/ACT而導通時驅動。Furthermore, the sense amplifier 11 includes an equalizer circuit 21, which includes MOS transistors Q31 to Q33. During standby, based on the equalization signal VEQ, the bit line, BLT0, BLB0 is equalized to the half-value voltage VBL of the array voltage VARAY (hereinafter referred to as the equalized voltage VBL). In addition, the sense amplifier 12 includes an equalizer circuit 22 including MOS transistors Q34 to Q36. When it is on standby, the bit line, BLT1, BLB1, etc. are equalized based on the equalization signal VEQ. Voltage VBL. The voltage VBL is connected to each of the equalizer circuits 21 and 22 via a contact 10 on a semiconductor integrated circuit. Here, the sense amplifier 11 is driven when the MOS transistors Q5, Q6, Q15, and Q16 are turned on based on the sensing drive signals ACT, / ACT.

在以上述方式構成的感測放大器電路中,在等化狀態被解除的時刻(VEQ=L位準)之後,藉由字元線電壓VWL將選擇用MOS電晶體Q21、Q22導通以選擇記憶胞MC1、MC2,而將與記憶體電容器Ccell1、Ccell2的資料值對應的儲存節點Ns1、Ns2的電壓Vs1、Vs2經由MOS電晶體Q21、Q22傳播至例如位元線BLB0、BLB1,隨後,使MOS電晶體Q5、Q6、Q15、Q16導通以啟動感測放大器11、12,從而感測放大器11、12分別對傳播至位元線BLB0、BLB1的資料值的位元線電壓VBLB、VBLT進行放大。 [現有技術文獻]In the sense amplifier circuit configured as described above, after the time when the equalization state is released (VEQ = L level), the selection MOS transistors Q21 and Q22 are turned on by the word line voltage VWL to select the memory cell. MC1 and MC2, and the voltages Vs1 and Vs2 of the storage nodes Ns1 and Ns2 corresponding to the data values of the memory capacitors Ccell1 and Ccell2 are transmitted to, for example, the bit lines BLB0 and BLB1 via the MOS transistors Q21 and Q22. The crystals Q5, Q6, Q15, and Q16 are turned on to activate the sense amplifiers 11, 12 so that the sense amplifiers 11, 12 amplify the bit line voltages VBLB, VBLT of the data values transmitted to the bit lines BLB0, BLB1, respectively. [Prior Art Literature]

專利文獻: 專利文獻1:日本專利特開2001-344995號公報 專利文獻2:美國專利第6556491號說明書 專利文獻3:日本專利特開2007-188556號公報 專利文獻4:美國專利第7443748號說明書 專利文獻5:日本專利特開平11-288600號公報Patent Documents: Patent Document 1: Japanese Patent Laid-Open Publication No. 2001-344995 Patent Document 2: U.S. Patent No. 6565491 Specification Patent Literature 3: Japanese Patent Laid-Open Publication No. 2007-188556 Patent Literature 4: US Patent No. 7443748 Specification Patent Document 5: Japanese Patent Laid-Open No. 11-288600

[發明所欲解決之課題][Problems to be Solved by the Invention]

近來,為了大容量化與成本降低而縮小晶片尺寸(chip size),用於先前技術中所介紹的等化電路的電晶體亦進行微型化,連接於等化電壓VBL的觸點10未正常連接的情況(以下稱作故障狀態)大量發生。此時,如圖2所示,若位元線的等化時間(即,圖2的預充電時間tRP)變長,則會發生下述情況:由於缺乏等化電壓VBL的供給而因自然放電引起的位元線位準的下降造成的ΔV的變動,而發生讀取不良的情況。此時存在下述問題:由於因自然放電引起的位準變動是起因,因此需要長時間的等待時間,且需要大量時間來篩選(screening)該不良狀況。Recently, in order to reduce the chip size in order to increase the capacity and reduce the cost, the transistors used in the equalization circuit described in the prior art have also been miniaturized, and the contacts 10 connected to the equalization voltage VBL are not normally connected. There are many cases (hereinafter referred to as failure states). At this time, as shown in FIG. 2, if the equalization time of the bit line (that is, the precharge time tRP in FIG. 2) becomes long, the following occurs: natural discharge due to lack of supply of the equalization voltage VBL The change of ΔV caused by the drop of the bit line level caused by the bit line leads to poor reading. At this time, there is a problem that since the level change due to the natural discharge is the cause, a long waiting time is required, and a large amount of time is required to screen the bad condition.

本發明的目的在於解決以上的問題,而提供一種半導體記憶裝置,所述半導體記憶裝置可較現有技術在短時間檢測出例如因連接於等化電壓VBL的觸點10未正常連接的故障狀態所引起的等化電壓VBL的不良狀況。 [解決課題之手段]An object of the present invention is to solve the above problems, and to provide a semiconductor memory device that can detect a fault state such as that the contact 10 connected to the equalized voltage VBL is not normally connected in a short time compared with the prior art. Caused by the bad condition of the equalized voltage VBL. [Means for solving problems]

根據本發明一實施例的半導體記憶裝置,其包括: 感測放大器,連接於位元線,從記憶體元件讀出資料; 第1開關元件,連接於規定的第1電源電壓與所述感測放大器的第1電源中間節點之間,在所述感測放大器驅動時導通; 第2開關元件,連接於規定的第2電源電壓與所述感測放大器的第2電源中間節點之間,在所述感測放大器驅動時導通;以及 等化器電路,基於等化信號來使所述第1電源中間節點及第2電源中間節點等化於等化電壓,所述等化電壓是所述第1電源中間節點的最大值與所述第2電源中間節點的最小值之間的半值位準, 所述半導體記憶裝置的特徵在於包括: 控制電路,所述控制電路是連接於所述位元線的控制電路,且基於測試信號將所述位元線的電壓控制在規定的電壓值。A semiconductor memory device according to an embodiment of the present invention includes: a sense amplifier connected to a bit line to read data from a memory element; a first switching element connected to a predetermined first power supply voltage and the sense The first power supply intermediate node of the amplifier is turned on when the sense amplifier is driven. The second switching element is connected between a predetermined second power supply voltage and the second power supply intermediate node of the sense amplifier. The sense amplifier is turned on while driving; and an equalizer circuit that equalizes the first power intermediate node and the second power intermediate node to an equalized voltage based on the equalized signal, the equalized voltage being the first The half-value level between the maximum value of the power supply intermediate node and the minimum value of the second power supply intermediate node, the semiconductor memory device is characterized by comprising: a control circuit, the control circuit is connected to the bit line The control circuit controls a voltage of the bit line to a predetermined voltage value based on a test signal.

而且,其特徵在於,在所述半導體記憶裝置中,所述規定的電壓值為接地電位,所述控制電路將所述位元線的電壓下拉(pull down)至接地電位。Furthermore, in the semiconductor memory device, the predetermined voltage value is a ground potential, and the control circuit pulls down the voltage of the bit line to a ground potential.

進而,其特徵在於,在所述半導體記憶裝置中,所述規定的電壓值為規定的電源電壓,所述控制電路將所述位元線的電壓上拉(pull up)至規定的電源電壓。Furthermore, in the semiconductor memory device, the predetermined voltage value is a predetermined power supply voltage, and the control circuit pulls up the voltage of the bit line to a predetermined power supply voltage.

而且,進而其特徵在於,在所述半導體記憶裝置中,所述規定的電壓值為接地電位與規定的電源電壓,由所述控制電路進行控制,以將多個位元線中屬於第1群組(group)的位元線的電壓下拉至接地電位,且將所述多個位元線中的屬於第2群組的位元線的電壓上拉至電源電壓。Furthermore, in the semiconductor memory device, the predetermined voltage value is a ground potential and a predetermined power supply voltage, and is controlled by the control circuit so that the plurality of bit lines belong to the first group. The voltage of the bit lines of the group is pulled down to the ground potential, and the voltage of the bit lines belonging to the second group among the plurality of bit lines is pulled up to the power supply voltage.

而且,其特徵在於,在所述半導體記憶裝置中,所述測試信號是從所述等化信號產生後的預充電開始至所述感測放大器驅動時產生。Furthermore, in the semiconductor memory device, the test signal is generated from a precharge after the equalization signal is generated to a time when the sense amplifier is driven.

進而,其特徵在於,在所述半導體記憶裝置中,所述測試信號的產生時,所述等化器電路的動作中止。 [發明的效果]Furthermore, in the semiconductor memory device, when the test signal is generated, the operation of the equalizer circuit is suspended. [Effect of the invention]

因而,根據本發明的半導體記憶裝置,可較現有技術在短時間檢測出例如因連接於等化電壓VBL的觸點10未正常連接的故障狀態所引起的等化電壓VBL的不良狀況。藉此,藉由測試成本的下降,可實現製造成本的削減、確實的位準變動實施,從而可藉由檢測遺漏的降低而提高品質。Therefore, according to the semiconductor memory device of the present invention, it is possible to detect a defective state of the equalized voltage VBL in a short time compared with the prior art, for example, due to a fault state in which the contact 10 connected to the equalized voltage VBL is not normally connected. Thereby, by reducing the test cost, it is possible to reduce the manufacturing cost and implement the exact level change, thereby improving the quality by reducing the detection omission.

以下,參照圖式來說明本發明的實施例。另外,在以下的各實施例中,對於同樣的構成要素標註相同的符號。Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following embodiments, the same reference numerals are assigned to the same constituent elements.

在一實施例中,其特徵在於:為了較現有技術在短時間檢測出例如因連接於等化電壓VBL的觸點10未正常連接的故障狀態所引起的等化電壓VBL的不良狀況,使等化電壓VBL以該等化電壓VBL的變動以外的方法變動,不等待自然放電下的等化電壓VBL的變動而形成放電後的狀態,從而可實現短時間的不良狀況檢測。以下,對其詳細情況進行說明。 [實施例1]In one embodiment, it is characterized in that, in order to detect a defective condition of the equalized voltage VBL caused by a fault state in which the contact 10 connected to the equalized voltage VBL is not normally connected in a short time, compared with the prior art, The electrochemical voltage VBL is changed by a method other than the fluctuation of the equivalent voltage VBL, and it does not wait for the fluctuation of the equivalent voltage VBL under a natural discharge to form a state after discharge, thereby enabling detection of a short-term malfunction. The details are described below. [Example 1]

圖3是表示實施例1的SDRAM的記憶體電路的結構例的電路圖。而圖4是表示圖3的記憶體電路的通常狀態及故障狀態的動作例的時序圖。3 is a circuit diagram showing a configuration example of a memory circuit of the SDRAM of the first embodiment. FIG. 4 is a timing chart showing an operation example of the normal state and the failure state of the memory circuit of FIG. 3.

實施例1的記憶體電路與圖1的比較例的記憶體電路相比,其特徵在於更包括控制電路,該控制電路包含N通道MOS電晶體Q41~Q44,且在指示等化的等化信號VEQ之後的預充電期間tRP,基於測試信號TEST來使位元線BLB0、BLT0、BLB1、BLT1接地。Compared with the memory circuit of the comparative example in FIG. 1, the memory circuit of the embodiment 1 further includes a control circuit including an N-channel MOS transistor Q41 to Q44, and an equalized signal indicating an equalization. The precharge period tRP after VEQ grounds the bit lines BLB0, BLT0, BLB1, and BLT1 based on the test signal TEST.

圖3中,實施例1的記憶體電路包括:用於記憶規定的資料值的記憶胞MC1、MC2;感測放大器11、12,其分別經由各一對位元線BLT0、BLB0、BLT1、BLB1連接於所述記憶胞MC1、MC2,從記憶胞MC1、MC2感測資料;以及MOS電晶體Q41~Q44,其基於測試信號來使位元線BLB0、BLT0、BLB1、BLT1接地。In FIG. 3, the memory circuit of Embodiment 1 includes: memory cells MC1 and MC2 for memorizing predetermined data values; and sense amplifiers 11, 12 which pass through a pair of bit lines BLT0, BLB0, BLT1, BLB1, respectively Connected to the memory cells MC1, MC2, sensing data from the memory cells MC1, MC2; and MOS transistors Q41 to Q44, which ground the bit lines BLB0, BLT0, BLB1, BLT1 based on a test signal.

圖3中,記憶胞MC1包括構成記憶體元件的記憶體電容器Ccell1以及選擇用MOS電晶體Q21。記憶體電容器Ccell1的一端經由儲存節點Ns1連接於MOS電晶體Q21的源極,其另一端連接於規定的電壓VCP。MOS電晶體Q21的閘極連接於字元線WL,其汲極例如連接於位元線BLB0。而且,記憶胞MC2包括構成記憶體元件的記憶體電容器Ccell2以及選擇用MOS電晶體Q22。記憶體電容器Ccell2的一端經由儲存節點Ns2連接於MOS電晶體Q22的源極,其另一端連接於規定的電壓VCP。MOS電晶體Q22的閘極連接於字元線WL,其汲極例如連接於位元線BLB1。此處,在SDRAM的記憶體電路中,多個記憶胞MC1、MC2在字元線WL的方向以及位元線BLT0、BLB0、BLT1、BLB1、…的方向上配置成格子形狀。In FIG. 3, the memory cell MC1 includes a memory capacitor Ccell1 constituting a memory element and a selection MOS transistor Q21. One end of the memory capacitor Ccell1 is connected to the source of the MOS transistor Q21 via the storage node Ns1, and the other end thereof is connected to a predetermined voltage VCP. The gate of the MOS transistor Q21 is connected to the word line WL, and its drain is connected to the bit line BLB0, for example. Furthermore, the memory cell MC2 includes a memory capacitor Ccell2 constituting a memory element and a selection MOS transistor Q22. One end of the memory capacitor Ccell2 is connected to the source of the MOS transistor Q22 via a storage node Ns2, and the other end is connected to a predetermined voltage VCP. The gate of the MOS transistor Q22 is connected to the word line WL, and its drain is connected to the bit line BLB1, for example. Here, in the memory circuit of the SDRAM, a plurality of memory cells MC1 and MC2 are arranged in a grid shape in the direction of the word line WL and the direction of the bit lines BLT0, BLB0, BLT1, BLB1,....

感測放大器11是以包含MOS電晶體Q1、Q2的第1 CMOS反相器與包含MOS電晶體Q3、Q4的第2 CMOS反相器構成正反饋迴路的正反器的方式連接而成。MOS電晶體Q1、Q3的各源極連接於電源中間節點P1,此電源中間節點P1經由作為開關元件的MOS電晶體Q5而連接於陣列電壓VARAY,此開關元件是以感測驅動信號/ACT來導通或斷開。而且,MOS電晶體Q2、Q4的各源極連接於電源中間節點P2,此電源中間節點P2經由作為開關元件的MOS電晶體Q6接地於接地電位VSS,此開關元件是以感測驅動信號ACT(感測驅動信號/ACT的反相信號)來導通或斷開。The sense amplifier 11 is connected in such a manner that a first CMOS inverter including MOS transistors Q1 and Q2 and a second CMOS inverter including MOS transistors Q3 and Q4 constitute a flip-flop having a positive feedback loop. Each source of the MOS transistors Q1 and Q3 is connected to the power supply intermediate node P1. This power supply intermediate node P1 is connected to the array voltage VARAY via the MOS transistor Q5 as a switching element. This switching element is based on the sensing driving signal / ACT. On or off. In addition, each source of the MOS transistors Q2 and Q4 is connected to a power supply intermediate node P2. The power supply intermediate node P2 is grounded to the ground potential VSS via a MOS transistor Q6 as a switching element. The switching element is a sensing driving signal ACT ( Sense the driving signal / the inverting signal of ACT) to turn on or off.

感測放大器12是以包含MOS電晶體Q11、Q12的第3 CMOS反相器與包含MOS電晶體Q13、Q14的第4 CMOS反相器構成正反饋迴路的正反器的方式連接而成。MOS電晶體Q11、Q13的各源極連接於電源中間節點P11,此電源中間節點P11經由作為開關元件的MOS電晶體Q15而連接於陣列電壓VARAY,此開關元件是以感測驅動信號/ACT來導通或斷開。而且,MOS電晶體Q12、Q14的各源極連接於電源中間節點P12,此電源中間節點P12經由作為開關元件的MOS電晶體Q16接地於接地電位VSS,此開關元件是以感測驅動信號ACT(感測驅動信號/ACT的反相信號)來導通或斷開的。The sense amplifier 12 is connected in such a manner that a third CMOS inverter including MOS transistors Q11 and Q12 and a fourth CMOS inverter including MOS transistors Q13 and Q14 constitute a flip-flop having a positive feedback loop. Each source of the MOS transistors Q11 and Q13 is connected to the power supply intermediate node P11. This power supply intermediate node P11 is connected to the array voltage VARAY via the MOS transistor Q15 as a switching element. This switching element is driven by a sensing driving signal / ACT. On or off. In addition, each source of the MOS transistors Q12 and Q14 is connected to a power supply intermediate node P12. The power supply intermediate node P12 is grounded to the ground potential VSS via a MOS transistor Q16 as a switching element. The switching element is a sensing driving signal ACT ( Sense the driving signal / the inverting signal of ACT) to turn on or off.

進而,感測放大器11具備等化器電路21,該等化器電路21包含MOS電晶體Q31~Q33,在待命時,基於等化信號VEQ,將電源中間節點P1、P2等化為陣列電壓VARAY的半值電壓VBL。而且,感測放大器12具備等化器電路22,該等化器電路22包含MOS電晶體Q34~Q36,在待命時,基於等化信號VEQ,將電源中間節點P11、P12等化為等化電壓VBL。所述等化電壓VBL例如經由半導體積體電路上的觸點10連接於各等化器電路21、22。此處,感測放大器11是在MOS電晶體Q5、Q6、Q15、Q16基於感測驅動信號ACT、/ACT而導通時驅動。Furthermore, the sense amplifier 11 includes an equalizer circuit 21 including MOS transistors Q31 to Q33, and when on standby, based on the equalization signal VEQ, the power supply intermediate nodes P1 and P2 are equalized into the array voltage VARAY. The half-value voltage VBL. In addition, the sense amplifier 12 includes an equalizer circuit 22, which includes MOS transistors Q34 to Q36. When it is on standby, the power supply intermediate nodes P11 and P12 are equalized to an equalized voltage based on the equalized signal VEQ. VBL. The equalization voltage VBL is connected to each of the equalizer circuits 21 and 22 via a contact 10 on the semiconductor integrated circuit. Here, the sense amplifier 11 is driven when the MOS transistors Q5, Q6, Q15, and Q16 are turned on based on the sensing drive signals ACT, / ACT.

在位元線BLT0上,連接有基於測試信號TEST而導通的MOS電晶體Q41。此處,測試信號TEST被施加至MOS電晶體Q41的閘極,MOS電晶體Q41的汲極連接於位元線BLT0,MOS電晶體Q41的源極接地。而且,在位元線BLB0上,連接有基於測試信號TEST而導通的MOS電晶體Q42。此處,測試信號TEST被施加至MOS電晶體Q42的閘極,MOS電晶體Q42的汲極連接於位元線BLB0,MOS電晶體Q42的源極接地。A bit line BLT0 is connected to a MOS transistor Q41 that is turned on based on the test signal TEST. Here, the test signal TEST is applied to the gate of the MOS transistor Q41, the drain of the MOS transistor Q41 is connected to the bit line BLT0, and the source of the MOS transistor Q41 is grounded. The bit line BLB0 is connected to a MOS transistor Q42 that is turned on based on the test signal TEST. Here, the test signal TEST is applied to the gate of the MOS transistor Q42, the drain of the MOS transistor Q42 is connected to the bit line BLB0, and the source of the MOS transistor Q42 is grounded.

在位元線BLT1上,連接有基於測試信號TEST而導通的MOS電晶體Q43。此處,測試信號TEST被施加至MOS電晶體Q43的閘極,MOS電晶體Q43的汲極連接於位元線BLT1,MOS電晶體Q43的源極接地。而且,在位元線BLB1上,連接有基於測試信號TEST而導通的MOS電晶體Q44。此處,測試信號TEST被施加至MOS電晶體Q44的閘極,MOS電晶體Q44的汲極連接於位元線BLB1,MOS電晶體Q44的源極接地。A bit line BLT1 is connected to a MOS transistor Q43 that is turned on based on the test signal TEST. Here, the test signal TEST is applied to the gate of the MOS transistor Q43, the drain of the MOS transistor Q43 is connected to the bit line BLT1, and the source of the MOS transistor Q43 is grounded. The bit line BLB1 is connected to a MOS transistor Q44 that is turned on based on the test signal TEST. Here, the test signal TEST is applied to the gate of the MOS transistor Q44, the drain of the MOS transistor Q44 is connected to the bit line BLB1, and the source of the MOS transistor Q44 is grounded.

在以上述方式構成的感測放大器電路中,在等化狀態被解除的時刻t4(圖4的VEQ=L位準)之後,藉由字元線電壓VWL將選擇用MOS電晶體Q21、Q2導通以選擇記憶胞MC1、MC2,而將與記憶體電容器Ccell1、Ccell2的資料值對應的儲存節點Ns1、Ns2的電壓Vs1、Vs2經由MOS電晶體Q21、Q22而傳播至例如位元線BLB0、BLB1,隨後,使MOS電晶體Q5、Q6、Q15、Q16導通以啟動感測放大器11、12,從而感測放大器11、12分別對傳播至位元線BLB0、BLB1的資料值的位元線電壓VLBT、VBLB進行放大。In the sense amplifier circuit configured as described above, after the time t4 (VEQ = L level in FIG. 4) of the equalization state is released, the selection MOS transistors Q21 and Q2 are turned on by the word line voltage VWL. The memory cells MC1 and MC2 are selected, and the voltages Vs1 and Vs2 of the storage nodes Ns1 and Ns2 corresponding to the data values of the memory capacitors Ccell1 and Ccell2 are transmitted to, for example, the bit lines BLB0 and BLB1 via the MOS transistors Q21 and Q22. Subsequently, the MOS transistors Q5, Q6, Q15, and Q16 are turned on to activate the sense amplifiers 11, 12 so that the sense amplifiers 11, 12 respectively respond to the bit line voltages VLBT, VBLB to zoom in.

圖4中,從時刻t1至時刻t4是預充電期間tRP。僅在從等化信號VEQ之後的時刻t2至時刻t3的規定的測試時間,基於高位準的測試信號TEST將MOS電晶體Q41~Q44導通,藉此將位元線BLT0、BLB0、BLT1、BLB1接地。隨後,測試信號TEST成為低位準,基於等化信號VEQ,依存於等化電壓VBL的觸點10的有無而為如下所述。In FIG. 4, the precharge period tRP is from time t1 to time t4. The MOS transistors Q41 to Q44 are turned on based on the high-level test signal TEST only from a predetermined test time from the time t2 to the time t3 after the equalization signal VEQ, thereby grounding the bit lines BLT0, BLB0, BLT1, and BLB1. . Subsequently, the test signal TEST becomes a low level, and it is as follows depending on the presence or absence of the contact 10 of the equalization voltage VBL based on the equalization signal VEQ.

(1)通常狀態時,位元線電壓VLBT、VBLB恢復至等化電壓VBL,在時刻t4以後,可從記憶胞MC1、MC2正常讀出資料值。(1) In the normal state, the bit line voltages VLBT and VBLB are restored to the equalized voltage VBL. After time t4, the data values can be read out from the memory cells MC1 and MC2 normally.

(2)異常狀態時,位元線電壓VLBT、VBLB不會恢復至等化電壓VBL,因此仍保持接地電位(101)而不變動,在時刻t4以後,無法從記憶胞MC1、MC2正常讀出資料值。因此,對於造成等化電壓VBL異常的一對位元線BLT0、BLB0;BLT1、BLB1,可較現有技術在短時間實現觸點10的不良檢測。(2) In the abnormal state, the bit line voltages VLBT and VBLB will not return to the equalized voltage VBL. Therefore, the ground potential (101) remains unchanged and cannot be read normally from the memory cells MC1 and MC2 after time t4. Data value. Therefore, for a pair of bit lines BLT0, BLB0; BLT1, BLB1 that cause an abnormality in the equalized voltage VBL, the defective detection of the contact 10 can be achieved in a short time compared with the prior art.

另外,如圖4所示,當測試信號TEST為高位準時,等化信號VEQ成為低位準,使等化器電路21、22的動作停止。In addition, as shown in FIG. 4, when the test signal TEST is at a high level, the equalization signal VEQ becomes a low level, and the operation of the equalizer circuits 21 and 22 is stopped.

如以上所說明般,根據實施例1的記憶體電路,更包括控制電路,該控制電路包含MOS電晶體Q41~Q44,且在等化信號VEQ之後的預充電期間tRP,基於測試信號TEST來使位元線BLB0、BLT0、BLB1、BLT1接地,因此,可較現有技術在短時間檢測出例如因連接於等化電壓VBL的觸點10未正常連接的故障狀態所引起的等化電壓VBL的不良狀況。而且,藉由測試成本的下降,可實現製造成本的削減、確實的位準變動實施,從而可藉由檢測遺漏的降低而提高品質。 [實施例2]As explained above, the memory circuit according to the embodiment 1 further includes a control circuit including MOS transistors Q41 to Q44, and during the precharge period tRP after the equalization signal VEQ, based on the test signal TEST. The bit lines BLB0, BLT0, BLB1, and BLT1 are grounded. Therefore, it is possible to detect a defect in the equalized voltage VBL caused by a fault state in which the contact 10 connected to the equalized voltage VBL is not normally connected in a short time compared to the prior art. situation. In addition, by reducing the test cost, it is possible to reduce manufacturing costs and implement accurate level changes, thereby improving quality by reducing detection omissions. [Example 2]

圖5是表示實施例2的SDRAM的記憶體電路的結構例的電路圖。實施例2的記憶體電路與圖3的實施例1的記憶體電路相比,其特徵在於,包括基於反相測試信號/TEST而導通的P通道MOS電晶體Q51~Q54來代替N通道MOS電晶體Q41~Q44。以下針對電路結構的不同點進行說明。5 is a circuit diagram showing a configuration example of a memory circuit of the SDRAM of the second embodiment. Compared with the memory circuit of Embodiment 1 in FIG. 3, the memory circuit of Embodiment 2 is characterized in that it includes P-channel MOS transistors Q51 to Q54 that are turned on based on the inversion test signal / TEST instead of N-channel MOS transistors. Crystals Q41 to Q44. Differences in circuit structure are described below.

圖5中,在位元線BLT0上,連接有基於反相測試信號/TEST而導通的MOS電晶體Q51。此處,反相測試信號/TEST被施加至MOS電晶體Q51的閘極,MOS電晶體Q51的汲極連接於位元線BLT0,MOS電晶體Q51的源極連接於陣列電壓VARAY。而且,在位元線BLB0上,連接有基於反相測試信號/TEST而導通的MOS電晶體Q52。此處,反相測試信號/TEST被施加至MOS電晶體Q52的閘極,MOS電晶體Q52的汲極連接於位元線BLB0,MOS電晶體Q52的源極連接於陣列電壓VARAY。In FIG. 5, a bit line BLT0 is connected to a MOS transistor Q51 which is turned on based on the inversion test signal / TEST. Here, the inversion test signal / TEST is applied to the gate of the MOS transistor Q51, the drain of the MOS transistor Q51 is connected to the bit line BLT0, and the source of the MOS transistor Q51 is connected to the array voltage VARAY. The bit line BLB0 is connected to a MOS transistor Q52 that is turned on based on the inversion test signal / TEST. Here, the inversion test signal / TEST is applied to the gate of the MOS transistor Q52, the drain of the MOS transistor Q52 is connected to the bit line BLB0, and the source of the MOS transistor Q52 is connected to the array voltage VARAY.

在位元線BLT1上,連接有基於反相測試信號/TEST而導通的MOS電晶體Q53。此處,反相測試信號/TEST被施加至MOS電晶體Q53的閘極,MOS電晶體Q53的汲極連接於位元線BLT1,MOS電晶體Q53的源極連接於陣列電壓VARAY。而且,在位元線BLB1上,連接有基於反相測試信號/TEST而導通的MOS電晶體Q54。此處,反相測試信號/TEST被施加至MOS電晶體Q54的閘極,MOS電晶體Q54的汲極連接於位元線BLB1,MOS電晶體Q54的源極連接於陣列電壓VARAY。A bit line BLT1 is connected to a MOS transistor Q53 that is turned on based on the inverted test signal / TEST. Here, the inversion test signal / TEST is applied to the gate of the MOS transistor Q53, the drain of the MOS transistor Q53 is connected to the bit line BLT1, and the source of the MOS transistor Q53 is connected to the array voltage VARAY. The bit line BLB1 is connected to a MOS transistor Q54 that is turned on based on the inversion test signal / TEST. Here, the inversion test signal / TEST is applied to the gate of the MOS transistor Q54, the drain of the MOS transistor Q54 is connected to the bit line BLB1, and the source of the MOS transistor Q54 is connected to the array voltage VARAY.

以上述方式構成的實施例2的記憶體電路基於反相測試信號/TEST來將位元線BLT0、BLB0、BLT1、BLB1上拉至陣列電壓VARAY,除此以外,具有與實施例1的記憶體電路同樣的作用效果。另外,藉由基於反相測試信號/TEST來將位元線BLT0、BLB0、BLT1、BLB1上拉至陣列電壓VARAY,從而可使位元線BLT0、BLB0、BLT1、BLB1的電壓不發生變動。 [變形例]The memory circuit of the second embodiment configured as described above pulls the bit lines BLT0, BLB0, BLT1, and BLB1 to the array voltage VARAY based on the inversion test signal / TEST, and has the same memory as that of the first embodiment. The circuit has the same effect. In addition, the bit lines BLT0, BLB0, BLT1, and BLB1 are pulled up to the array voltage VARAY based on the inversion test signal / TEST, so that the voltages of the bit lines BLT0, BLB0, BLT1, and BLB1 do not change. [Modification]

在以上的各實施例的記憶體電路中,MOS電晶體Q6、Q16的源極連接於接地電位VSS,但本發明並不限於此,亦可不同於接地電位VSS,而連接於較陣列電壓VARAY為低的規定的其他電源電壓。In the memory circuits of the above embodiments, the sources of the MOS transistors Q6 and Q16 are connected to the ground potential VSS. However, the present invention is not limited to this, and may be different from the ground potential VSS and connected to the array voltage VARAY. Other low supply voltages are required.

以上的實施例中,藉由基於測試信號TEST來使MOS電晶體Q41~Q44導通,從而使位元線BLT0、BLB0、BLT1、BLB1接地,但本發明並不限於此,亦可使位元線BLT0、BLB0中的至少一者及位元線BLT1、BLB1中的至少一者接地。In the above embodiments, the MOS transistors Q41 to Q44 are turned on based on the test signal TEST, so that the bit lines BLT0, BLB0, BLT1, and BLB1 are grounded. However, the present invention is not limited to this, and the bit lines can also be At least one of BLT0 and BLB0 and at least one of bit lines BLT1 and BLB1 are grounded.

以上的實施例1中,基於測試信號TEST來使位元線BLT0、BLB0、BLT1、BLB1接地而下拉,實施例2中,基於反相測試信號/TEST來將位元線BLT0、BLB0、BLT1、BLB1上拉至陣列電壓VARAY。然而,本揭示並不限於此,亦可以位元線BLT0、BLB0、BLT1、BLB1的電壓位準不發生變化的方式,例如以設定為規定電壓值(並不限於接地電位或陣列電壓VARAY(規定的電源電壓),亦可為陣列電壓VARAY的半值電壓VBL、或接地電位與半值電壓VBL之間的電壓、陣列電壓VARAY或規定的電源電壓與半值電壓VBL之間的電壓)的方式進行控制。此處,所述規定的電壓值的控制亦可設定為,在SDARM內的多條位元線中,例如第1群組的位元線與第2群組的位元線中不同。In the above Embodiment 1, the bit lines BLT0, BLB0, BLT1, and BLB1 are grounded and pulled down based on the test signal TEST. In Embodiment 2, the bit lines BLT0, BLB0, BLT1, and BLT1 are based on the inversion test signal / TEST. BLB1 is pulled up to the array voltage VARAY. However, the present disclosure is not limited to this, and the voltage levels of the bit lines BLT0, BLB0, BLT1, and BLB1 may not be changed, for example, by setting to a predetermined voltage value (not limited to ground potential or array voltage VARAY (specific Power supply voltage), or the half-value voltage VBL of the array voltage VARAY, or the voltage between the ground potential and the half-value voltage VBL, the array voltage VARAY, or the voltage between the specified power supply voltage and the half-value voltage VBL) Take control. Here, the control of the predetermined voltage value may be set such that among a plurality of bit lines in the SDARM, for example, the bit lines of the first group are different from the bit lines of the second group.

以上的實施例中,實施例1具備MOS電晶體Q41~Q44、實施例2具備MOS電晶體Q51~Q54,但本發明並不限於此,亦可使用分別基於測試信號TEST來導通或斷開的開關元件來代替該些MOS電晶體。In the above embodiments, the first embodiment is provided with MOS transistors Q41 to Q44, and the second embodiment is provided with MOS transistors Q51 to Q54, but the present invention is not limited to this, and one which is turned on or off based on the test signal TEST may be used. Switching elements instead of these MOS transistors.

本申請案發明與專利文獻1~專利文獻5的不同點:Differences between the invention of this application and Patent Documents 1 to 5:

(1)與專利文獻1及專利文獻2的不同點:(1) Differences from Patent Documents 1 and 2:

專利文獻1及專利文獻2中,揭示了一種半導體記憶裝置,所述半導體記憶裝置大幅縮短起因於DRAM的朝向位元線方向的電荷洩漏(leak)的電荷保持時間特性檢查的檢查時間。該半導體記憶裝置具備:在字元線與位元線對的各交點處配置記憶胞而構成的記憶胞陣列;對應於每個所述各位元線對而設的多個感測放大器;用於對位元線對進行預充電、等化的多個位元線預充電電路;以及通常動作與測試模式的切換電路,且具備:字元線非活性部件,用於在測試模式時,將所述多條字元線全部設為非活性狀態;感測放大器非活性部件,用於在所述特定的測試模式時,將所述多個感測放大器全部設為非活性狀態;以及位元線對電位固定部件,在所述測試模式時進行動作,以使多個位元線對全部成為高位準或者低位準的同一邏輯位準。然而,專利文獻1及專利文獻2的發明中,既未揭示亦未教示在等化信號後的預充電期間tRP內基於測試信號將位元線控制為規定電壓值的控制電路。Patent Documents 1 and 2 disclose a semiconductor memory device that significantly shortens the inspection time of the charge retention time characteristic inspection due to a charge leak in the direction of the bit line of the DRAM. The semiconductor memory device includes: a memory cell array formed by arranging memory cells at each intersection of a word line and a bit line pair; a plurality of sense amplifiers corresponding to each of the bit line pairs; A plurality of bit line pre-charging circuits for pre-charging and equalizing bit line pairs; and a switching circuit for normal operation and test mode, and having: a word line inactive component for The plurality of word lines are all set to an inactive state; a sense amplifier inactive component is configured to set all of the plurality of sense amplifiers to an inactive state in the specific test mode; and a bit line The potential fixing component operates in the test mode so that all the bit line pairs become the same logic level of a high level or a low level. However, in the inventions of Patent Documents 1 and 2, neither a control circuit for controlling a bit line to a predetermined voltage value based on a test signal during a precharge period tRP after an equalization signal is disclosed or taught.

(2)與專利文獻3及專利文獻4的不同點:(2) Differences from Patent Documents 3 and 4:

專利文獻3及專利文獻4中,揭示了一種半導體記憶裝置,所述半導體記憶裝置即使在存在多個連接於位元線的等化元件的情況下,亦可在檢查步驟中檢測等化元件的故障。該半導體記憶裝置具備兩個等化元件,該兩個等化元件連接於同一位元線對,且藉由控制信號PDLN、PDLF的控制而導通/斷開,該半導體記憶裝置中,在測試時,在預充電期間,將其中一個控制信號(例如PDLN)設為高(HIGH)位準,將另一者(例如PDLF)設為低(LOW)位準,藉由個別地控制兩個等化元件的活性、非活性,從而可對藉由控制信號的控制而導通/斷開的等化元件不良的情況等故障進行檢測。然而,專利文獻3及專利文獻4的發明中,既未揭示亦未教示在等化信號後的預充電期間tRP內基於測試信號來將位元線控制為規定電壓值的控制電路。Patent Documents 3 and 4 disclose a semiconductor memory device that can detect the level of an equalizing element in an inspection step even when a plurality of equalizing elements connected to a bit line are present. malfunction. The semiconductor memory device is provided with two equalization elements, the two equalization elements are connected to the same bit line pair, and are turned on / off by the control of the control signals PDLN and PDLF. In the semiconductor memory device, during the test During the pre-charging period, one of the control signals (for example, PDLN) is set to the HIGH level, and the other (for example, PDLF) is set to the LOW level, by controlling the two equalizations individually The active and inactive elements can detect faults such as failure of the equalized element that is turned on / off by the control of the control signal. However, in the inventions of Patent Documents 3 and 4, neither a control circuit for controlling a bit line to a predetermined voltage value based on a test signal during a precharge period tRP after an equalization signal is disclosed or taught.

(3)與專利文獻5的不同點:(3) Differences from Patent Document 5:

專利文獻5中,揭示了一種半導體記憶裝置,所述半導體記憶裝置與相鄰的胞陣列共用位元線等化電路,可在短的測試時間內有效地篩選等化不良。該半導體記憶裝置中,左右兩個胞陣列ARY-R與ARY-L共用感測放大器電路部S/A、位元線對的等化電路部EQ以及與資料輸入/輸出相關的DQ閘極電路部DQC。φT閘極Tr1L、Tr2L、Tr1R、Tr2R被控制為對應於不同於等化期間的模式在將位元線電位傳遞至胞陣列ARY-L(或ARY-R)的被選擇記憶胞時,也將該位元線電位傳遞至胞陣列ARY-R(或ARY-L)所連接的位元線。然而,專利文獻5的發明中,既未揭示亦未教示在等化信號後的預充電期間tRP內基於測試信號來將位元線控制為規定電壓值的控制電路。 [產業上的可利用性]Patent Document 5 discloses a semiconductor memory device that shares a bit line equalization circuit with an adjacent cell array, and can effectively screen for poor equalization in a short test time. In this semiconductor memory device, the left and right cell arrays ARY-R and ARY-L share a sense amplifier circuit section S / A, a bit line pair equalization circuit section EQ, and a DQ gate circuit related to data input / output. Department of DQC. φT gates Tr1L, Tr2L, Tr1R, Tr2R are controlled to correspond to modes different from the equalization period. When the bit line potential is transferred to the selected memory cell of the cell array ARY-L (or ARY-R), The bit line potential is transferred to the bit line connected to the cell array ARY-R (or ARY-L). However, in the invention of Patent Document 5, neither a control circuit for controlling a bit line to a predetermined voltage value based on a test signal during a precharge period tRP after an equalization signal is disclosed or taught. [Industrial availability]

本發明的半導體記憶裝置並不限於SDRAM,亦可適用於例如快閃記憶體(flash memory)、SRAM等其他種類的半導體記憶裝置。The semiconductor memory device of the present invention is not limited to SDRAM, and can also be applied to other types of semiconductor memory devices such as flash memory and SRAM.

10‧‧‧觸點10‧‧‧ contact

11、12‧‧‧感測放大器11, 12‧‧‧ sense amplifier

21、22‧‧‧等化器電路21, 22‧‧‧ equalizer circuit

101‧‧‧接地電位101‧‧‧ ground potential

ACT、/ACT‧‧‧感測驅動信號ACT, / ACT‧‧‧Sense driving signal

BLB0、BLT0、BLB1、BLT1‧‧‧位元線BLB0, BLT0, BLB1, BLT1‧‧‧bit lines

Ccell1、Ccell2‧‧‧記憶體電容器Ccell1, Ccell2‧‧‧Memory capacitor

MC1、MC2‧‧‧記憶胞MC1, MC2‧‧‧Memory cells

Ns1、Ns2‧‧‧儲存節點Ns1, Ns2‧‧‧Storage nodes

P1、P2、P11、P12‧‧‧電源中間節點P1, P2, P11, P12‧‧‧ power intermediate nodes

Q1~Q54‧‧‧MOS電晶體Q1 ~ Q54‧‧‧MOS transistor

t1、t2、t3、t4‧‧‧時刻t1, t2, t3, t4‧‧‧time

TEST、/TEST‧‧‧測試信號TEST, / TEST‧‧‧test signal

tRP‧‧‧預充電期間tRP‧‧‧Precharge period

VARAY‧‧‧陣列電壓VARAY‧‧‧Array Voltage

VBL‧‧‧等化電壓VBL‧‧‧ equalized voltage

VBLB、VBLT‧‧‧位元線電壓VBLB, VBLT‧‧‧bit line voltage

VCP‧‧‧規定的電壓VCP‧‧‧ prescribed voltage

VEQ‧‧‧等化信號VEQ‧‧‧ equalized signal

Vs1、Vs2‧‧‧電壓Vs1, Vs2‧‧‧ Voltage

VWL‧‧‧字元線電壓VWL‧‧‧Word line voltage

WL‧‧‧字元線WL‧‧‧Character Line

圖1是表示現有例的SDRAM的記憶體電路的結構例的電路圖。 圖2是表示圖1的記憶體電路的通常狀態及故障狀態的動作例的時序圖。 圖3是表示實施例1的SDRAM的記憶體電路的結構例的電路圖。 圖4是表示圖3的記憶體電路的通常狀態及故障狀態的動作例的時序圖。 圖5是表示實施例2的SDRAM的記憶體電路的結構例的電路圖。FIG. 1 is a circuit diagram illustrating a configuration example of a memory circuit of a conventional SDRAM. FIG. 2 is a timing chart showing an operation example of a normal state and a failure state of the memory circuit of FIG. 1. 3 is a circuit diagram showing a configuration example of a memory circuit of the SDRAM of the first embodiment. FIG. 4 is a timing chart showing an operation example of a normal state and a failure state of the memory circuit of FIG. 3. 5 is a circuit diagram showing a configuration example of a memory circuit of the SDRAM of the second embodiment.

Claims (6)

一種半導體記憶裝置,包括: 感測放大器,連接於位元線,從記憶體元件讀出資料; 第1開關元件,連接於規定的第1電源電壓與所述感測放大器的第1電源中間節點之間,在所述感測放大器驅動時導通; 第2開關元件,連接於規定的第2電源電壓與所述感測放大器的第2電源中間節點之間,在所述感測放大器驅動時導通;以及 等化器電路,基於等化信號來使所述第1電源中間節點及第2電源中間節點等化於等化電壓,所述等化電壓是所述第1電源中間節點的最大值與所述第2電源中間節點的最小值之間的半值位準, 所述半導體記憶裝置的特徵在於包括: 控制電路,連接於所述位元線,且基於測試信號將所述位元線的電壓控制在規定的電壓值。A semiconductor memory device includes: a sense amplifier connected to a bit line to read data from a memory element; a first switching element connected to a predetermined first power supply voltage and a first power intermediate node of the sense amplifier Between the sense amplifiers is turned on when the sense amplifier is driven; the second switching element is connected between a predetermined second power supply voltage and a second power supply intermediate node of the sense amplifier, and is turned on when the sense amplifier is driven And an equalizer circuit that equalizes the first power intermediate node and the second power intermediate node to an equalized voltage based on an equalized signal, where the equalized voltage is a maximum value of the first power intermediate node and The half-value level between the minimum values of the second power supply intermediate nodes, the semiconductor memory device is characterized by comprising: a control circuit connected to the bit line, and based on a test signal, the bit line of the bit line is The voltage is controlled at a predetermined voltage value. 如申請專利範圍第1項所述的半導體記憶裝置,其中 所述規定的電壓值為接地電位,所述控制電路將所述位元線的電壓下拉至所述接地電位。The semiconductor memory device according to item 1 of the scope of patent application, wherein the predetermined voltage value is a ground potential, and the control circuit pulls down the voltage of the bit line to the ground potential. 如申請專利範圍第1項所述的半導體記憶裝置,其中 所述規定的電壓值為規定的電源電壓,所述控制電路將所述位元線的電壓上拉至所述規定的電源電壓。The semiconductor memory device according to item 1 of the scope of patent application, wherein the predetermined voltage value is a predetermined power supply voltage, and the control circuit pulls up the voltage of the bit line to the predetermined power supply voltage. 如申請專利範圍第1項所述的半導體記憶裝置,其中 所述規定的電壓值為接地電位與規定的電源電壓,由所述控制電路進行控制,以將多條位元線中屬於第1群組的位元線的電壓下拉至所述接地電位,以及將所述多個位元線中屬於第2群組的位元線的電壓上拉至所述電源電壓。The semiconductor memory device according to item 1 of the scope of the patent application, wherein the predetermined voltage value is a ground potential and a predetermined power supply voltage, and is controlled by the control circuit so that a plurality of bit lines belong to the first group The voltage of the bit lines of the group is pulled down to the ground potential, and the voltage of the bit lines belonging to the second group among the plurality of bit lines is pulled up to the power supply voltage. 如申請專利範圍第1項所述的半導體記憶裝置,其中 所述測試信號是從所述等化信號產生後的預充電開始至所述感測放大器驅動時產生。The semiconductor memory device according to item 1 of the scope of patent application, wherein the test signal is generated from a precharge after the equalization signal is generated to a time when the sense amplifier is driven. 如申請專利範圍第1項所述的半導體記憶裝置,其中 所述測試信號產生時,所述等化器電路的動作中止。The semiconductor memory device according to item 1 of the patent application scope, wherein when the test signal is generated, the operation of the equalizer circuit is suspended.
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