TW201806741A - Release film and method for manufacturing molded article - Google Patents

Release film and method for manufacturing molded article Download PDF

Info

Publication number
TW201806741A
TW201806741A TW106109049A TW106109049A TW201806741A TW 201806741 A TW201806741 A TW 201806741A TW 106109049 A TW106109049 A TW 106109049A TW 106109049 A TW106109049 A TW 106109049A TW 201806741 A TW201806741 A TW 201806741A
Authority
TW
Taiwan
Prior art keywords
release
release film
layer
particles
release layer
Prior art date
Application number
TW106109049A
Other languages
Chinese (zh)
Other versions
TWI781093B (en
Inventor
山本誠治
藤本貴博
Original Assignee
住友電木股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友電木股份有限公司 filed Critical 住友電木股份有限公司
Publication of TW201806741A publication Critical patent/TW201806741A/en
Application granted granted Critical
Publication of TWI781093B publication Critical patent/TWI781093B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/56Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/68Release sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32Component parts, details or accessories; Auxiliary operations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives

Abstract

A release film (10) having a laminated structure in which a first release layer (1) formed from a first thermoplastic resin material, a cushioning layer (2), and a second release layer (3) formed from a second thermoplastic resin material are laminated in that order in the thickness direction, wherein the thickness of the cushioning layer (2) is at least 10 [mu]m but not more than 200 [mu]m, if the total thickness of the release film (10) is deemed X and the thickness of the cushioning layer (2) is deemed Y, then Y/X is greater than 0.2 but less than 0.9, the first thermoplastic resin material and the second thermoplastic resin material each contain a thermoplastic resin and particles having an average particle size d50 of at least 4 [mu]m but not more than 60 [mu]m, the amount of particles relative to the total weight of the first release layer (1) is at least 0.5% by weight but not more than 15% by weight, and the amount of particles relative to the total weight of the second release layer (3) is at least 0.5% by weight but not more than 15% by weight.

Description

脫模薄膜及成型品之製造方法Method for producing release film and molded article

本發明係有關一種脫模薄膜及成型品之製造方法。The present invention relates to a method for manufacturing a release film and a molded article.

通常,在製造成型品時或製造貼合不同材料而成之積層體時,脫模薄膜大多以保護該種成型品或積層體的表面之目的而使用。 例如,在經由黏著劑藉由熱壓而將覆蓋層薄膜(以下,亦稱為“CL薄膜”。)黏結於有電路露出之撓性薄膜(以下,亦稱為“電路露出薄膜”。)來製造撓性印刷電路基板(以下,亦稱為“FPC”)時,脫模薄膜以藉由配置於該CL薄膜上來保護電路等之目的而使用。 一直以來,針對脫模薄膜要求提高以下說明之2個特性。Generally, when manufacturing a molded article or a laminated body formed by bonding different materials, a release film is often used for the purpose of protecting the surface of such a molded article or a laminated body. For example, a cover film (hereinafter, also referred to as a "CL film") is adhered to a flexible film with an exposed circuit (hereinafter, also referred to as a "circuit exposed film") through an adhesive by hot pressing. When manufacturing a flexible printed circuit board (hereinafter, also referred to as "FPC"), a release film is used for the purpose of protecting a circuit or the like by being disposed on the CL film. It has been required to improve two characteristics described below for release films.

首先要求之脫模薄膜的特性係製造成型品或積層體之後的該脫模薄膜的易剝離性、亦即脫模性。 其次要求之脫模薄膜的特性係該脫模薄膜相對於成型品或積層體的表面之黏附性、亦即追隨性。 一直以來,對提高該種脫模薄膜中的脫模性或追隨性之類的特性進行了各種研究。The characteristic of the release film requested | required first is the easy peeling property of this release film after manufacture of a molded article or a laminated body, ie, release property. The characteristic of the release film required next is the adhesion, that is, the followability, of the release film to the surface of the molded article or the laminate. Various studies have been conducted to improve characteristics such as mold release or followability in such a release film.

作為著眼於提高脫模薄膜的脫模性之技術、著眼於提高追隨性之技術,例如有以下者。As a technique focusing on improving the mold release property of a release film and a technique focusing on improving the followability, there are the following, for example.

專利文獻1中,公開了在表面具有形成有滿足特定條件之凹凸之聚酯層之脫模薄膜。Patent Document 1 discloses a release film having a polyester layer formed on the surface with unevenness that satisfies specific conditions.

並且,在撓性印刷電路基板的習知的製造製程中,通常對依次疊加紙或矽氧橡膠等緩衝材料、脫模薄膜、CL薄膜及電路露出薄膜而成之被衝壓物進行上述熱壓處理(專利文獻2等)。 [先前技術文獻] [專利文獻]Furthermore, in the conventional manufacturing process of a flexible printed circuit board, the above-mentioned hot-pressing treatment is usually performed on a stamped object obtained by sequentially stacking a buffer material such as paper or silicone rubber, a release film, a CL film, and a circuit exposed film. (Patent Document 2 and the like). [Prior Art Literature] [Patent Literature]

[專利文獻1]日本特開2009-90665號公報 [專利文獻2]日本特開2012-179827號公報[Patent Document 1] Japanese Patent Application Publication No. 2009-90665 [Patent Document 2] Japanese Patent Application Publication No. 2012-179827

然而,近年來針對脫模薄膜之各種特性所要求之技術水準日益提高。尤其,在脫模薄膜的脫模性這一觀點上,對專利文獻1、2等中記載之脫模薄膜要求進一步的改善。 另外,本發明者發現,使用習知的脫模薄膜製作成型品時,在所獲得之成型品中,有時會產生黏著劑滲出等有關成品外觀的不良情況。However, in recent years, the technical level required for various characteristics of the release film has been increasing. In particular, from the viewpoint of the releasability of the release film, further improvements are required for the release films described in Patent Documents 1, 2, and the like. In addition, the present inventors have found that, when a molded article is produced using a conventional release film, the obtained molded article may sometimes cause problems such as the appearance of a finished product, such as adhesive bleeding.

本發明提供一種在用於製作成品外觀良好的成型品時有用,且脫模性優異之脫模薄膜及使用上述脫模薄膜之成型品之製造方法。The present invention provides a release film which is useful for producing a molded article with a good appearance of a finished product, and has excellent mold release properties, and a method for producing a molded article using the release film.

依本發明,提供一種脫模薄膜,其具有積層結構,前述積層結構係包含第1熱塑性樹脂材料之第1脫模層、緩衝層、包含第2熱塑性樹脂材料之第2脫模層依次沿厚度方向積層而成,其中 前述第1脫模層配置於該脫模薄膜的一面, 前述第2脫模層配置於該脫模薄膜的另一面, 前述緩衝層的厚度為10μm以上200μm以下, 在將該脫模薄膜的總厚度設為Xμm,將前述緩衝層的厚度設為Yμm時,Y/X大於0.2小於0.9, 前述第1熱塑性樹脂材料和前述第2熱塑性樹脂材料均係包含熱塑性樹脂及平均粒徑d50為4μm以上60μm以下之粒子者, 前述粒子的含量相對於前述第1脫模層總量為0.5重量%以上15重量%以下,並且前述粒子的含量相對於前述第2脫模層總量為0.5重量%以上15重量%以下。According to the present invention, there is provided a release film having a laminated structure. The laminated structure includes a first release layer including a first thermoplastic resin material, a buffer layer, and a second release layer including a second thermoplastic resin material in order along the thickness. The first release layer is disposed on one side of the release film, the second release layer is disposed on the other side of the release film, and the thickness of the buffer layer is 10 μm or more and 200 μm or less. The total thickness of the release film is set to X μm. When the thickness of the buffer layer is set to Y μm, Y / X is greater than 0.2 and less than 0.9. The first thermoplastic resin material and the second thermoplastic resin material both include a thermoplastic resin and an average. For particles having a particle diameter d50 of 4 μm or more and 60 μm or less, the content of the particles is 0.5% by weight or more and 15% by weight or less with respect to the total amount of the first release layer, and the content of the particles is relative to the total amount of the second release layer. The amount is 0.5% by weight or more and 15% by weight or less.

並且,依本發明,提供一種脫模薄膜,其於至少一面具有由第1熱塑性樹脂材料形成之第1脫模層,其中 前述第1熱塑性樹脂材料包含熱塑性樹脂和粒子, 前述粒子的平均粒徑d50為20μm以上60μm以下, 前述球狀粒子的含量相對於前述脫模層總量為0.5重量%以上15重量%以下。Furthermore, according to the present invention, there is provided a release film having a first release layer formed of a first thermoplastic resin material on at least one side, wherein the first thermoplastic resin material includes a thermoplastic resin and particles, and an average particle diameter of the particles. d50 is 20 μm or more and 60 μm or less, and the content of the spherical particles is 0.5% by weight or more and 15% by weight or less based on the total amount of the release layer.

另外,依本發明,提供一種成型品之製造方法,其包括: 以上述脫模薄膜的前述第1脫模層成為對象物側之方式,於前述對象物上配置前述脫模薄膜之製程;及 對配置有前述脫模薄膜之前述對象物進行熱壓之製程, 在配置前述脫模薄膜之前述製程中,前述對象物的配置有前述脫模薄膜之面由包含熱硬化性樹脂之材料形成。 [發明效果]In addition, according to the present invention, there is provided a method for manufacturing a molded article, comprising: a process of disposing the release film on the object such that the first release layer of the release film becomes a target side; and A process of hot-pressing the object on which the release film is disposed. In the process of disposing the release film, a surface of the object on which the release film is disposed is formed of a material containing a thermosetting resin. [Inventive effect]

依本發明,能夠提供一種在用於製作成品外觀良好的成型品時有用,且脫模性優異之脫模薄膜及使用上述脫模薄膜之成型品之製造方法。According to the present invention, it is possible to provide a release film which is useful for producing a molded article with a good appearance of a finished product and has excellent mold releasability, and a method for producing a molded article using the release film.

以下,利用圖式對本發明的實施形態進行說明。另外,在所有圖式中,對相同的構成要件標註相同符號,並適當省略說明。Hereinafter, embodiments of the present invention will be described using drawings. In all drawings, the same constituent elements are denoted by the same reference numerals, and descriptions thereof are appropriately omitted.

[第1實施形態] <脫模薄膜> 圖1係本實施形態之脫模薄膜的剖面圖。 如圖1所示,本實施形態中的脫模薄膜10係具有包含第1熱塑性樹脂材料之第1脫模層1、緩衝層2、包含第2熱塑性樹脂材料之第2脫模層3依次沿厚度方向積層而成之積層結構者。 並且,第1脫模層1配置於脫模薄膜10的一面,第2脫模層3配置於脫模薄膜10的另一面。 在脫模薄膜10中,緩衝層2的厚度為10μm以上200μm以下,在將脫模薄膜10的總厚度設為Xμm,將緩衝層2的厚度設為Yμm時,Y/X大於0.2小於0.9。 並且,脫模薄膜10中,第1熱塑性樹脂材料和第2熱塑性樹脂材料均包含熱塑性樹脂及平均粒徑d50為4μm以上60μm以下之粒子。 另外,脫模薄膜10中,粒子的含量相對於第1脫模層1總量為0.5重量%以上15重量%以下,且粒子的含量相對於第2脫模層3總量為0.5重量%以上15重量%以下。[First Embodiment] <Release Film> FIG. 1 is a cross-sectional view of a release film according to this embodiment. As shown in FIG. 1, the release film 10 in this embodiment has a first release layer 1 including a first thermoplastic resin material, a buffer layer 2, and a second release layer 3 including a second thermoplastic resin material. Laminated structure made by stacking in the thickness direction. The first release layer 1 is disposed on one surface of the release film 10, and the second release layer 3 is disposed on the other surface of the release film 10. In the release film 10, the thickness of the buffer layer 2 is 10 μm or more and 200 μm or less. When the total thickness of the release film 10 is X μm and the thickness of the buffer layer 2 is Y μm, Y / X is greater than 0.2 and less than 0.9. In addition, in the release film 10, both the first thermoplastic resin material and the second thermoplastic resin material include a thermoplastic resin and particles having an average particle diameter d50 of 4 μm or more and 60 μm or less. In the release film 10, the content of particles is 0.5% by weight or more and 15% by weight or less with respect to the total amount of the first release layer 1, and the content of particles is 0.5% by weight or more of the total amount of the second release layer 3. 15% by weight or less.

以下,關於脫模薄膜10,將脫模薄膜10配置於具備電路等之成型對象物上時,將形成和該成型對象物接觸之一側的面之樹脂層設為第1脫模層1,將形成與和成型對象物接觸之一側的面相反側的面之樹脂層設為第2脫模層3來進行說明。 並且,以下將脫模薄膜10配置於對象物上時,將第1脫模層1中的與對象物接觸之一側的面亦示為“第1脫模面”。Hereinafter, regarding the release film 10, when the release film 10 is disposed on a molding object having a circuit or the like, a resin layer forming a surface on one side in contact with the molding object is referred to as a first release layer 1, The resin layer that forms the surface opposite to the surface that is in contact with the object to be molded will be described as the second release layer 3. In addition, when the release film 10 is arrange | positioned on an object hereafter, the surface in the 1st mold release layer 1 side which contacts the object is also shown as a "1st mold release surface."

並且,配置脫模薄膜10之前階段的成型對象物的表面通常由包含處於半硬化狀態之熱硬化性樹脂之材料形成。 本實施形態之脫模薄膜10配置於由包含處於上述半硬化狀態之熱硬化性樹脂之材料所形成之成型對象物的表面上而使用,並能夠在於成型對象物的表面配置有脫模薄膜10之狀態下,藉由熱壓而獲得所期望的成型品。In addition, the surface of the molding object at a stage before the release film 10 is disposed is usually formed of a material containing a thermosetting resin in a semi-cured state. The release film 10 of this embodiment is used by being disposed on the surface of a molding object formed of a material containing a thermosetting resin in the above-mentioned semi-cured state, and the release film 10 can be disposed on the surface of the molding object. In this state, a desired molded article is obtained by hot pressing.

另一方面,脫模薄膜10中的第2脫模層3係使用脫模薄膜10以上述方法進行熱壓時,形成與紙或矽氧橡膠等緩衝材料接觸之面之樹脂層。 並且,以下將脫模薄膜10的第2脫模層3側、亦即與第1脫模面相反側的面亦示為“第2脫模面”。On the other hand, the second release layer 3 in the release film 10 is a resin layer on the surface that comes into contact with a cushioning material such as paper or silicone rubber when the release film 10 is hot-pressed by the method described above. The second release layer 3 side of the release film 10, that is, the surface opposite to the first release surface is also referred to as a "second release surface" hereinafter.

脫模薄膜10係採用了同時滿足以下3個條件之構成者。 第1條件係,藉由包含熱塑性樹脂以及平均粒徑d50為4μm以上60μm以下之粒子之熱塑性樹脂材料形成第1脫模層1及第2脫模層3。 第2條件係,使上述粒子的含量相對於第1脫模層1總量為0.5重量%以上15重量%以下,且使上述粒子的含量相對於第2脫模層3總量為0.5重量%以上15重量%以下。 第3條件係,於將緩衝層2的厚度設為10μm以上200μm以下之前提下,控制緩衝層2的厚度與脫模薄膜10的總厚度的平衡。 因此,依據脫模薄膜10獲得以下效果。The release film 10 is a structure which satisfies the following three conditions simultaneously. The first condition is that the first release layer 1 and the second release layer 3 are formed of a thermoplastic resin material containing a thermoplastic resin and particles having an average particle diameter d50 of 4 μm to 60 μm. The second condition is that the content of the particles is 0.5% by weight or more and 15% by weight or less with respect to the total amount of the first release layer 1, and the content of the particles is 0.5% by weight relative to the total amount of the second release layer 3. Above 15% by weight. The third condition is that before the thickness of the buffer layer 2 is set to be 10 μm or more and 200 μm or less, the balance between the thickness of the buffer layer 2 and the total thickness of the release film 10 is controlled. Therefore, the following effects are obtained in accordance with the release film 10.

第1,依據脫模薄膜10,能夠顯現比習知的脫模薄膜良好的脫模性。而且,脫模薄膜10係如實施例中後述,兩個面均對對象物的脫模性優異者。First, according to the release film 10, it is possible to express a better releasability than a conventional release film. Further, the release film 10 is, as will be described later in the examples, one having excellent releasability from both sides to the object.

第2,依據脫模薄膜10,獲得成品外觀良好的成型品。 而且,如實施例中後述,從關於黏著劑滲出之形狀,其凹凸差小於100μm之方面考慮,使用脫模薄膜10製作之成型品獲得良好的成品外觀。Second, according to the release film 10, a molded article having a good appearance of the finished product is obtained. Further, as described later in the examples, the shape of the exuded adhesive has a difference in unevenness of less than 100 μm, and a molded article produced using the release film 10 has a good finished appearance.

第3,依據脫模薄膜10,製作成型品時,即使在對第1脫模層1的第1脫模面施加壓力之情況下,亦能夠抑制在成型品的表面產生皺紋。 具體而言,脫模薄膜10係在第1脫模層1與第2脫模層3兩者上各含有規定量的平均粒徑d50為4μm以上60μm以下之粒子者,因此係具備在第1脫模面與第2脫模面兩者上形成微細的凹凸之構成者。因此,依據脫模薄膜10,由於形成於脫模薄膜10的兩面之微細的凹凸所產生之影響,能夠有效地抑制在熱壓時產生壓力不均,其結果,能夠製作成品外觀良好的成型品。Third, according to the release film 10, when a molded product is produced, even when pressure is applied to the first release surface of the first release layer 1, the occurrence of wrinkles on the surface of the molded product can be suppressed. Specifically, the release film 10 is a first release layer 1 and a second release layer 3 each having a predetermined amount of particles having an average particle diameter d50 of 4 μm or more and 60 μm or less, and is therefore provided in the first A component in which fine unevenness is formed on both the release surface and the second release surface. Therefore, according to the release film 10, due to the influence of the fine unevenness formed on both sides of the release film 10, it is possible to effectively suppress the occurrence of pressure unevenness during hot pressing, and as a result, it is possible to produce a molded product with a good appearance. .

以下,對本實施形態之脫模薄膜10的構成進行說明。Hereinafter, the structure of the release film 10 of this embodiment is demonstrated.

在脫模薄膜10中,形成第1脫模層1之第1熱塑性樹脂材料中所包含之粒子的平均粒徑d50為4μm以上60μm以下,但較佳為5μm以上50μm以下,更佳為10μm以上30μm以下。 在脫模薄膜10中,當控制為使形成第1脫模層1之第1熱塑性樹脂材料中所包含之粒子的平均粒徑d50為上述下限值以上時,能夠提高脫模薄膜的剛性,並且能夠使脫模性與追隨性的平衡變得良好。 另一方面,在本實施形態中,第1熱塑性樹脂材料中所包含之粒子的平均粒徑d50為上述上限值以下時,能夠對第1脫模面賦予適當的凹凸,並且能夠製作成品外觀良好的成型品。In the release film 10, the average particle diameter d50 of the particles contained in the first thermoplastic resin material forming the first release layer 1 is 4 μm or more and 60 μm or less, but it is preferably 5 μm or more and 50 μm or less, and more preferably 10 μm or more. 30 μm or less. In the release film 10, when the average particle diameter d50 of the particles contained in the first thermoplastic resin material forming the first release layer 1 is controlled to be the above lower limit value or more, the rigidity of the release film can be increased. In addition, it is possible to achieve a good balance between mold release and followability. On the other hand, in the present embodiment, when the average particle diameter d50 of the particles contained in the first thermoplastic resin material is equal to or less than the above-mentioned upper limit value, it is possible to provide appropriate unevenness to the first release surface and to produce a finished product appearance. Good molded product.

在脫模薄膜10中,形成第2脫模層3之第2熱塑性樹脂材料中所包含之粒子的平均粒徑d50為4μm以上60μm以下。 從進一步提高第2脫模層3的脫模性之觀點考慮,粒子的平均粒徑d50較佳為20μm以上60μm以下,更佳為25μm以上55μm以下。 藉此,能夠對第2脫模面賦予所期望的大小的凹凸。尤其,控制為第2熱塑性樹脂材料中所包含之粒子的平均粒徑d50成為上述數值範圍內時,能夠減小使用脫模薄膜10以上述方法進行熱壓時與紙或矽氧橡膠等緩衝材料接觸之面積,並能夠針對第2脫模層3的第2脫模面形成具有能夠提高對該緩衝材料之脫模性之程度的大小之凹凸。In the release film 10, the average particle diameter d50 of the particles contained in the second thermoplastic resin material forming the second release layer 3 is 4 μm or more and 60 μm or less. From the viewpoint of further improving the releasability of the second release layer 3, the average particle diameter d50 of the particles is preferably 20 μm or more and 60 μm or less, and more preferably 25 μm or more and 55 μm or less. This makes it possible to impart unevenness of a desired size to the second release surface. In particular, when the average particle diameter d50 of the particles contained in the second thermoplastic resin material is controlled to fall within the above-mentioned numerical range, it is possible to reduce the impact on the cushioning material such as paper or silicone rubber when the hot-pressing is performed using the release film 10 in the above-mentioned method. The contact area can form unevenness on the second release surface of the second release layer 3 having a size that can improve the release property of the cushioning material.

並且,在本實施形態之脫模薄膜10中,粒子的含量相對於第1脫模層1總量為0.5重量%以上15重量%以下。 關於脫模薄膜10中的第1脫模層1,從提高脫模性與追隨性的平衡之觀點考慮,粒子的含量相對於第1脫模層1總量較佳為0.5重量%以上10重量%以下,進一步較佳為2重量%以上10重量%以下。藉此,亦能夠抑制在使用脫模薄膜10而製作之成型品中產生空隙。In the release film 10 according to this embodiment, the content of particles is 0.5% by weight or more and 15% by weight or less based on the total amount of the first release layer 1. Regarding the first release layer 1 in the release film 10, the content of particles is preferably 0.5% by weight or more and 10% by weight from the viewpoint of improving the balance between mold release and followability. % Or less, more preferably 2% by weight or more and 10% by weight or less. This also makes it possible to suppress the occurrence of voids in a molded article produced using the release film 10.

並且,在本實施形態之脫模薄膜10中,粒子的含量相對於第2脫模層3總量為0.5重量%以上15重量%以下。 從提高第2脫模面的脫模性之觀點考慮,粒子的含量相對於第2脫模層3總量較佳為5重量%以上15重量%以下,進一步較佳為8重量%以上13重量%以下。In the release film 10 according to this embodiment, the content of particles is 0.5% by weight or more and 15% by weight or less based on the total amount of the second release layer 3. From the viewpoint of improving the releasability of the second release surface, the content of the particles is preferably 5% to 15% by weight, and more preferably 8% to 13% by weight relative to the total amount of the second release layer 3. %the following.

並且,在本實施形態之脫模薄膜10中,將第1脫模層1的第1脫模面的表面10點平均粗糙度Rz設為A,將第2脫模層3的第2脫模面的表面10點平均粗糙度Rz設為B時,A-B的絕對值較佳為20以下,更佳為1以上18以下,進一步較佳為1.5以上16以下。藉此,能夠以高生產率製作成品外觀良好的成型品。In addition, in the release film 10 of this embodiment, the surface 10-point average roughness Rz of the first release surface of the first release layer 1 is set to A, and the second release of the second release layer 3 is released. When the 10-point average roughness Rz of the surface is set to B, the absolute value of AB is preferably 20 or less, more preferably 1 or more and 18 or less, and even more preferably 1.5 or more and 16 or less. This makes it possible to produce a molded article having a good appearance with a high productivity.

另外,A的值與B的值可相同,亦可不同,但從提高脫模性,並且製作成品外觀良好的成型品之觀點考慮,B的值、亦即第2脫模層3的第2脫模面的表面10點平均粗糙度Rz的值表示比A的值、亦即第1脫模層1的第1脫模面的表面10點平均粗糙度Rz的值更大的值為較佳。作為該理由,可列舉如下方面:製作成型品時,將與第2脫模層3的第2脫模面接觸之緩衝材料表面的形狀和與第1脫模層1的第1脫模面接觸之對象物表面的形狀進行對比時,緩衝材料表面的一方為凹凸較小的形狀。In addition, the value of A may be the same as or different from the value of B, but from the viewpoint of improving the mold release property and producing a molded article with a good appearance, the value of B, that is, the second of the second release layer 3 The value of the 10-point average roughness Rz of the surface of the mold release surface is preferably larger than the value of A, that is, the value of the surface 10-point average roughness Rz of the first mold release surface of the first release layer 1 is larger. . For this reason, the following aspects can be cited: when producing a molded product, the shape of the surface of the cushioning material that is in contact with the second release surface of the second release layer 3 and the first release surface of the first release layer 1 When the shape of the surface of the object is compared, one of the surfaces of the cushioning material has a shape with less unevenness.

從確保第1脫模層1的強度,並且使脫模性與追隨性的平衡變得良好之觀點考慮,第1脫模層1的第1脫模面的表面10點平均粗糙度Rz係0.5μm以上25μm以下為較佳,1μm以上20μm以下為更佳,1.6μm以上18μm以下為進一步較佳。 另外,第1脫模面的表面10點平均粗糙度Rz能夠依照JIS-B0601-1994進行測定。From the viewpoint of ensuring the strength of the first release layer 1 and improving the balance between the release property and the followability, the 10-point average roughness Rz of the surface of the first release surface of the first release layer 1 is 0.5. More preferably, it is more than 25 μm, more preferably 1 μm or more and 20 μm or less, and more preferably 1.6 μm or more and 18 μm or less. The 10-point average roughness Rz of the surface of the first release surface can be measured in accordance with JIS-B0601-1994.

從確保第2脫模層3的強度,並且使脫模性變得良好之觀點考慮,第2脫模層3的第2脫模面的表面10點平均粗糙度Rz較佳為0.5μm以上25μm以下,更佳為5μm以上23μm以下,進一步較佳為11.5μm以上22μm以下。 另外,第2脫模面的表面10點平均粗糙度Rz能夠依照JIS-B0601-1994進行測定。From the viewpoint of ensuring the strength of the second release layer 3 and improving the mold release property, the surface 10-point average roughness Rz of the second release surface of the second release layer 3 is preferably 0.5 μm or more and 25 μm or less. Hereinafter, it is more preferably 5 μm or more and 23 μm or less, and still more preferably 11.5 μm or more and 22 μm or less. The 10-point average roughness Rz of the surface of the second release surface can be measured in accordance with JIS-B0601-1994.

並且,在本實施形態之脫模薄膜10中,第1脫模層1的第1脫模面的剝離強度越是較低的值越較佳,但較佳為5N/50mm以下,更佳為3N/50mm以下,進一步較佳為1N/50mm以下。藉此,能夠提高針對成型對象物之脫模性。In addition, in the release film 10 of this embodiment, the lower the peel strength of the first release surface of the first release layer 1 is, the better the value is, but it is preferably 5 N / 50 mm or less, and more preferably 3N / 50mm or less, more preferably 1N / 50mm or less. Thereby, the mold release property with respect to a molding object can be improved.

另外,第1脫模面的剝離強度例如能夠藉由以下方法進行測定。 首先,針對經由黏著劑臨時固定有覆蓋層薄膜之電路露出薄膜,使脫模薄膜10中的第1脫模層1的第1脫模面與上述電路露出薄膜中的配置有覆蓋層薄膜之面對置,並將脫模薄膜10與電路露出薄膜貼合,於180℃、6MPa的條件下進行2分鐘的熱壓處理,藉此製作試驗片。此時,藉由不壓接試驗片的端部,使得能夠將脫模薄膜10的端部作為自由端來捏拿。之後,使用拉伸試驗機,從脫模薄膜10的該端部向180°方向以約1000mm/分鐘的速度對試驗片施加應力,並將第1脫模面與電路露出薄膜的覆蓋層薄膜進行剝離,藉此測定第1脫模面的剝離強度。另外,在實施熱壓處理之後立即實施剝離試驗為較佳。The peel strength of the first release surface can be measured, for example, by the following method. First, for a circuit-exposed film in which a coverlay film is temporarily fixed through an adhesive, the first release surface of the first release layer 1 in the release film 10 and the surface on which the coverlay film is disposed in the circuit-exposed film are made. The release film 10 was opposed to each other, and the circuit-exposed film was bonded to each other, and a heat-pressing treatment was performed at 180 ° C. and 6 MPa for 2 minutes to prepare a test piece. At this time, by not crimping the end portion of the test piece, the end portion of the release film 10 can be pinched as a free end. Then, using a tensile tester, stress was applied to the test piece from the end portion of the release film 10 in a 180 ° direction at a speed of about 1000 mm / minute, and the first release surface and the cover film of the circuit exposed film were subjected to Peeling was performed to measure the peel strength of the first release surface. In addition, it is preferable to perform a peeling test immediately after performing a hot pressing process.

並且,在本實施形態之脫模薄膜10中,第2脫模層3的第2脫模面的剝離強度越是較低的值越較佳,但較佳為3N/50mm以下,更佳為1N/50mm以下。藉此,能夠提高針對緩衝材料之脫模性。In addition, in the release film 10 of this embodiment, the lower the peel strength of the second release surface of the second release layer 3 is, the better the value is, but it is preferably 3N / 50mm or less, and more preferably 1N / 50mm or less. Thereby, the mold release property with respect to a cushioning material can be improved.

另外,第2脫模面的剝離強度例如能夠藉由以下方法進行測定。 首先,以使脫模薄膜10中的第2脫模層3的第2脫模面與矽橡膠片對置之方式貼合脫模薄膜10和矽橡膠片,並於180℃、6MPa的條件下進行2分鐘的熱壓處理,藉此製作試驗片。此時,藉由不壓接試驗片的端部,使得能夠將脫模薄膜10的端部作為自由端來捏拿。之後,使用拉伸試驗機,從脫模薄膜10的該端部向180°方向以約1000mm/分鐘的速度對試驗片施加應力,並將第2脫模面與矽橡膠片進行剝離,藉此測定第2脫模面的剝離強度。另外,在實施熱壓處理之後立即實施剝離試驗為較佳。The peel strength of the second release surface can be measured, for example, by the following method. First, the release film 10 and the silicone rubber sheet are bonded so that the second release surface of the second release layer 3 in the release film 10 faces the silicone rubber sheet, and the conditions are 180 ° C and 6 MPa. A test piece was produced by performing a hot pressing process for 2 minutes. At this time, by not crimping the end portion of the test piece, the end portion of the release film 10 can be pinched as a free end. Then, using a tensile tester, stress was applied to the test piece from the end portion of the release film 10 in a 180 ° direction at a speed of about 1000 mm / minute, and the second release surface and the silicone rubber sheet were peeled off, whereby the The peeling strength of the second release surface was measured. In addition, it is preferable to perform a peeling test immediately after performing a hot pressing process.

在本實施形態之脫模薄膜10中,用於形成第1脫模層1之第1熱塑性樹脂材料及用於形成第2脫模層3之第2熱塑性樹脂材料均係包含熱塑性樹脂及粒子者。In the release film 10 of this embodiment, the first thermoplastic resin material used to form the first release layer 1 and the second thermoplastic resin material used to form the second release layer 3 are both those containing thermoplastic resin and particles. .

在本實施形態中,從提高脫模薄膜10的剛性之觀點考慮,上述粒子係有機樹脂粒子為較佳,係交聯有機樹脂粒子為更佳。 作為上述有機樹脂粒子,例如可列舉聚苯乙烯粒子、丙烯酸粒子(丙烯酸珠)、聚醯亞胺粒子、聚酯粒子、聚矽氧粒子、聚丙烯粒子、聚乙烯粒子、氟樹脂粒子及核殼粒子等。該些可單獨使用,亦可併用2種以上。 從提高脫模性與追隨性的平衡,並且抑制成型品中產生空隙之觀點考慮,係聚苯乙烯粒子或丙烯酸粒子(丙烯酸珠)為較佳,具有交聯結構之聚苯乙烯粒子或丙烯酸粒子(丙烯酸珠)為更佳。In this embodiment, from the viewpoint of improving the rigidity of the release film 10, the above-mentioned particle-based organic resin particles are preferable, and the cross-linked organic resin particles are more preferable. Examples of the organic resin particles include polystyrene particles, acrylic particles (acrylic beads), polyimide particles, polyester particles, polysiloxane particles, polypropylene particles, polyethylene particles, fluororesin particles, and core-shells. Particles, etc. These can be used alone or in combination of two or more. Polystyrene particles or acrylic particles (acrylic beads) are preferred from the standpoint of improving the balance between mold release and followability, and suppressing the generation of voids in the molded product. Polystyrene particles or acrylic particles having a crosslinked structure are preferred. (Acrylic beads) is more preferred.

另外,所謂有機樹脂粒子係指將有機樹脂作為主成份包含之粒子。所謂交聯有機樹脂粒子係指將具有交聯結構之有機樹脂作為主成份包含之粒子。The organic resin particles are particles containing an organic resin as a main component. The crosslinked organic resin particles are particles containing an organic resin having a crosslinked structure as a main component.

在本實施形態中,作為用於形成第1脫模層1之第1熱塑性樹脂材料及用於形成第2脫模層3之第2熱塑性樹脂材料所包含之熱塑性樹脂,例如可列舉聚對苯二甲酸乙二酯樹脂(PET)、聚對苯二甲酸丁二酯樹脂(PBT)、聚對苯二甲酸丙二酯樹脂(PTT)、聚對苯二甲酸己二酯樹脂(PHT)等聚對苯二甲酸烷二酯(polyalkylene terephthalate)樹脂、聚-4-甲基-1-戊烯樹脂(TPX:以下,亦稱為聚甲基戊烯樹脂。)、間規聚苯乙烯樹脂(SPS)、聚丙烯樹脂(PP)及共聚合其他成分而成之共聚物樹脂。 該些可使用1種或亦可將2種以上組合使用。 其中,從提高第1脫模層1及第2脫模層3的脫模性之觀點考慮,使用選自聚甲基戊烯樹脂、聚對苯二甲酸丁二酯樹脂、間規聚苯乙烯樹脂及聚丙烯樹脂中之1種以上為較佳。In this embodiment, examples of the thermoplastic resin included in the first thermoplastic resin material for forming the first release layer 1 and the second thermoplastic resin material for forming the second release layer 3 include polyparaphenylene. Polyethylene terephthalate resin (PET), polybutylene terephthalate resin (PBT), polytrimethylene terephthalate resin (PTT), polyhexamethylene terephthalate resin (PHT) and other polymers Polyalkylene terephthalate resin, poly-4-methyl-1-pentene resin (TPX: hereinafter also referred to as polymethylpentene resin), syndiotactic polystyrene resin (SPS ), Polypropylene resin (PP) and copolymer resin made by copolymerizing other ingredients. These may be used singly or in combination of two or more kinds. Among them, from the viewpoint of improving the releasability of the first release layer 1 and the second release layer 3, a member selected from the group consisting of polymethylpentene resin, polybutylene terephthalate resin, and syndiotactic polystyrene is used. One or more of resins and polypropylene resins are preferred.

在本實施形態中,第1熱塑性樹脂材料及第2熱塑性樹脂材料,除了熱塑性樹脂以外,亦可含有抗氧化劑、助滑劑、抗黏連劑(anti-blocking agent)、抗靜電劑、染料及顏料等著色劑、穩定劑等添加劑、氟樹脂、矽氧橡膠等耐衝擊性賦予劑、氧化鈦、碳酸鈣、滑石等無機填充劑。In this embodiment, the first thermoplastic resin material and the second thermoplastic resin material may contain, in addition to the thermoplastic resin, antioxidants, slip agents, anti-blocking agents, antistatic agents, dyes, and Colorants such as pigments, additives such as stabilizers, impact resistance imparting agents such as fluororesin and silicone rubber, inorganic fillers such as titanium oxide, calcium carbonate, and talc.

從獲得適當的強度之觀點考慮,第1脫模層1的厚度較佳為10μm以上,更佳為20μm以上。另一方面,從針對成型品之嵌入性之觀點考慮,第1脫模層1的厚度較佳為50μm以下,更佳為40μm以下。From the viewpoint of obtaining appropriate strength, the thickness of the first release layer 1 is preferably 10 μm or more, and more preferably 20 μm or more. On the other hand, the thickness of the first release layer 1 is preferably 50 μm or less, and more preferably 40 μm or less, from the viewpoint of the embedding property of the molded article.

從獲得適當的強度之觀點考慮,第2脫模層3的厚度較佳為10μm以上,更佳為20μm以上。另一方面,從使成型品的成品外觀變得良好之觀點考慮,第2脫模層3的厚度較佳為50μm以下,更佳為40μm以下。From the viewpoint of obtaining appropriate strength, the thickness of the second release layer 3 is preferably 10 μm or more, and more preferably 20 μm or more. On the other hand, from the viewpoint of improving the appearance of the finished product, the thickness of the second release layer 3 is preferably 50 μm or less, and more preferably 40 μm or less.

第1脫模層1與第2脫模層3可由相同的材料構成,亦可由彼此不同之材料構成。第1脫模層1與第2脫模層3可以是相同的厚度,亦可以是彼此不同之厚度。並且,關於第1脫模層1及第2脫模層3各自所包含之粒子的粒徑及含量可以相同, 但從使藉由脫模薄膜10獲得之成型品的外觀變得良好之觀點考慮,係彼此不同之粒徑及含量為較佳。並且,第1脫模層1及第2脫模層3分別所包含之粒子可由相同材料構成,亦可由彼此不同之材料構成。The first release layer 1 and the second release layer 3 may be made of the same material or may be made of materials different from each other. The first release layer 1 and the second release layer 3 may have the same thickness or different thicknesses from each other. In addition, the particle size and content of the particles included in each of the first release layer 1 and the second release layer 3 may be the same, but from the standpoint of improving the appearance of the molded article obtained by the release film 10. It is preferable that the particle diameters and contents are different from each other. The particles included in the first release layer 1 and the second release layer 3 may be composed of the same material, or may be composed of materials different from each other.

脫模薄膜10的厚度為50μm以上。脫模薄膜10的厚度較佳為75μm以上,更佳為100μm以上。藉由設為上述下限值以上,能夠使脫模性與追隨性的平衡變得良好。 另一方面,脫模薄膜10的厚度為200μm以下。較佳為150μm以下。藉由設為上述上限值以下,在製作成型品時能夠將衝壓壓力均勻地施加於脫模薄膜10。The release film 10 has a thickness of 50 μm or more. The thickness of the release film 10 is preferably 75 μm or more, and more preferably 100 μm or more. By making it more than the said lower limit, the balance of mold release property and followability can be made favorable. On the other hand, the thickness of the release film 10 is 200 μm or less. It is preferably 150 μm or less. By making it into the said upper limit or less, a press pressure can be uniformly applied to the release film 10 at the time of manufacture of a molded article.

緩衝層2係含有具有柔軟性之樹脂者,並且係對整個脫模薄膜10賦予緩衝性者。藉此,使用脫模薄膜10時,來自熱壓板的熱及壓力容易均等地傳遞到被黏物,並能夠使脫模薄膜10與被黏物的黏附性及脫模薄膜10對被黏物的追隨性進一步變得良好。The buffer layer 2 is a resin containing a flexible resin, and a buffer layer is provided to the entire release film 10. With this, when the release film 10 is used, heat and pressure from the hot platen can be easily and evenly transmitted to the adherend, and the adhesion between the release film 10 and the adherend, and the release film 10 to the adherend can be easily transmitted. The followability has further improved.

緩衝層2的厚度為10μm以上200μm以下,較佳為20μm以上180μm以下,進一步較佳為30μm以上150μm以下。 緩衝層的厚度為上述下限值以上時,能夠抑制脫模薄膜的緩衝性降低。緩衝層的厚度為上述上限值以下時,能夠抑制脫模性的降低。The thickness of the buffer layer 2 is 10 μm or more and 200 μm or less, preferably 20 μm or more and 180 μm or less, and more preferably 30 μm or more and 150 μm or less. When the thickness of the buffer layer is equal to or more than the above-mentioned lower limit value, it is possible to suppress a decrease in the cushioning property of the release film. When the thickness of the buffer layer is equal to or less than the above-mentioned upper limit value, it is possible to suppress a decrease in mold release property.

並且,在本實施形態中,在將脫模薄膜10的總厚度設為Xμm,將緩衝層2的厚度設為Yμm時,如上述,Y/X的值大於0.2小於0.9,較佳為0.25以上0.8以下,進一步較佳為0.3以上0.75以下。 Y/X為上述下限值以上時,能夠抑制脫模薄膜10的緩衝性降低。Y/X為上述上限值以下時,能夠抑制脫模性的降低。Further, in this embodiment, when the total thickness of the release film 10 is set to X μm and the thickness of the buffer layer 2 is set to Y μm, as described above, the value of Y / X is greater than 0.2 and less than 0.9, and preferably 0.25 or more. 0.8 or less, more preferably 0.3 or more and 0.75 or less. When Y / X is at least the above lower limit value, it is possible to suppress a decrease in the cushioning property of the release film 10. When Y / X is equal to or less than the above upper limit value, it is possible to suppress a decrease in mold release property.

作為形成緩衝層2之樹脂材料的具體例,可列舉:聚乙烯、聚丙烯等α-烯烴系聚合物;具有乙烯、丙烯、丁烯、戊烯、己烯、甲基戊烯等作為共聚物成分之α-烯烴系共聚物、聚醚碸、聚苯硫醚等工程塑膠系樹脂等。該些可單獨使用1種,亦可併用2種以上。 其中,α-烯烴系共聚物為較佳。作為α-烯烴系共聚物,例如可列舉乙烯等α-烯烴與(甲基)丙烯酸酯之共聚物、乙烯與乙酸乙烯酯之共聚物、乙烯與(甲基)丙烯酸之共聚物、及該些之部分離子交聯物等。 另外,從獲得良好的緩衝功能之觀點考慮,係單獨使用乙烯等α-烯烴-(甲基)丙烯酸酯共聚物者、或聚對苯二甲酸丁二酯與1,4-環己二甲醇共聚合聚對苯二甲酸乙二酯之混合物、α-烯烴系聚合物與乙烯等α-烯烴-(甲基)丙烯酸酯共聚物之混合物為較佳。例如,乙烯與乙烯-甲基丙烯酸甲酯共聚物(EMMA)之混合物、聚丙烯(PP)與乙烯-甲基丙烯酸甲酯共聚物(EMMA)之混合物、聚對苯二甲酸丁二酯(PBT)與聚丙烯(PP)與乙烯-甲基丙烯酸甲酯共聚物(EMMA)之混合物等為更佳。Specific examples of the resin material forming the buffer layer 2 include α-olefin polymers such as polyethylene and polypropylene; and ethylene, propylene, butene, pentene, hexene, and methylpentene as copolymers. Ingredients such as α-olefin copolymers, polyether fluorene, polyphenylene sulfide and other engineering plastic resins. These may be used individually by 1 type, and may use 2 or more types together. Among these, an α-olefin-based copolymer is preferable. Examples of the α-olefin-based copolymer include a copolymer of an α-olefin such as ethylene and a (meth) acrylate, a copolymer of ethylene and vinyl acetate, a copolymer of ethylene and (meth) acrylic acid, and the like. Part of the ionic cross-links. In addition, from the standpoint of obtaining a good buffering function, it is one that uses an α-olefin- (meth) acrylate copolymer such as ethylene alone, or a copolymer of polybutylene terephthalate and 1,4-cyclohexanedimethanol. A mixture of a polymerized polyethylene terephthalate and a mixture of an α-olefin-based polymer and an α-olefin- (meth) acrylate copolymer such as ethylene is preferred. For example, a mixture of ethylene and ethylene-methyl methacrylate copolymer (EMMA), a mixture of polypropylene (PP) and ethylene-methyl methacrylate copolymer (EMMA), polybutylene terephthalate (PBT ) And a mixture of polypropylene (PP) and ethylene-methyl methacrylate copolymer (EMMA) are more preferred.

緩衝層2可還含有橡膠成分。作為橡膠成分,例如可列舉苯乙烯-丁二烯共聚物、苯乙烯-異戊二烯共聚物等苯乙烯系熱塑性彈性體、烯烴系熱塑性彈性體、醯胺系彈性體、聚酯系彈性體等熱塑性彈性體材料;天然橡膠、異戊二烯橡膠、氯丁二烯橡膠、矽氧橡膠等橡膠材料等。The buffer layer 2 may further contain a rubber component. Examples of the rubber component include a styrene-based thermoplastic elastomer such as a styrene-butadiene copolymer and a styrene-isoprene copolymer, an olefin-based thermoplastic elastomer, a fluorene-based elastomer, and a polyester-based elastomer. And other thermoplastic elastomer materials; natural rubber, isoprene rubber, chloroprene rubber, silicone rubber and other rubber materials.

緩衝層2可含有抗氧化劑、助滑劑、抗黏連劑、抗靜電劑、染料及顏料等著色劑、穩定劑等添加劑、氟樹脂、矽氧橡膠等耐衝擊性賦予劑、氧化鈦、碳酸鈣、滑石等無機填充劑。The buffer layer 2 may contain antioxidants, slip agents, antiblocking agents, antistatic agents, colorants such as dyes and pigments, additives such as stabilizers, impact resistance imparting agents such as fluororesin, silicone rubber, titanium oxide, and carbonic acid. Inorganic fillers such as calcium and talc.

作為形成緩衝層2之方法,例如可列舉空冷或水冷充氣擠製法、T模擠製法等公知的方法。Examples of the method for forming the buffer layer 2 include known methods such as an air-cooled or water-cooled inflation method, and a T-die method.

在本實施形態中,對脫模薄膜10係由第1脫模層1、緩衝層2、第2脫模層3依次積層而成之例進行了說明,但脫模薄膜10的積層結構不限於此。 例如,脫模薄膜10可以是層疊黏著層、阻氣層等而成之4層以上之結構。此時,作為黏著層、阻氣層並無特別限定,能夠使用公知者。In this embodiment, the example in which the release film 10 is laminated in the order of the first release layer 1, the buffer layer 2, and the second release layer 3 has been described, but the laminated structure of the release film 10 is not limited to this. this. For example, the release film 10 may have a structure of four or more layers in which an adhesive layer, a gas barrier layer, and the like are laminated. In this case, the adhesive layer and the gas barrier layer are not particularly limited, and a known one can be used.

<脫模薄膜10的製造方法> 本實施形態中的脫模薄膜10能夠使用共擠製法、擠製層壓法、乾式層壓法、充氣法等公知的方法來製作。 並且,可分別製造第1脫模層1、緩衝層2、第2脫模層3的各層之後藉由層合機等來接合脫模薄膜10,利用空冷式或水冷式共擠製充氣法、共擠製T模法來成膜為較佳。其中,從可優異地控制各層的厚度之觀點考慮,利用共擠製T模法成膜之方法為特佳。並且,可直接接合第1脫模層1、緩衝層2、第2脫模層3,亦可隔著黏著層而接合。<The manufacturing method of the release film 10> The release film 10 in this embodiment can be manufactured using well-known methods, such as a coextrusion method, an extrusion lamination method, a dry lamination method, and an inflation method. In addition, each layer of the first release layer 1, the buffer layer 2, and the second release layer 3 can be separately manufactured, and then the release film 10 can be joined by a laminator or the like, and an air-cooled or water-cooled co-extrusion inflation method can be used. Co-extrusion T-die method is preferred for film formation. Among them, a method of forming a film by a co-extrusion T-die method is particularly preferable from the viewpoint that the thickness of each layer can be excellently controlled. In addition, the first release layer 1, the buffer layer 2, and the second release layer 3 may be directly bonded, or may be bonded via an adhesive layer.

<成型品之製造方法> 接著,對本實施形態的成型品之製造方法進行說明。 本實施形態的成型品之製造方法包括以下製程。 第1製程係以脫模薄膜10的第1脫模層1的第1脫模面成為對象物側之方式,於對象物上配置脫模薄膜10之製程。 第2製程係針對配置有脫模薄膜10之對象物進行熱壓之製程。 以下,對各製程進行詳述。<The manufacturing method of a molded article> Next, the manufacturing method of the molded article of this embodiment is demonstrated. The manufacturing method of the molded article of this embodiment includes the following processes. The first process is a process in which the release film 10 is placed on the object such that the first release surface of the first release layer 1 of the release film 10 becomes the object side. The second process is a process of hot-pressing an object on which the release film 10 is disposed. Hereinafter, each process will be described in detail.

第1製程中,以脫模薄膜10的第1脫模面成為對象物側之方式配置。配置方法並無特別限定,能夠利用公知的方法配置。In the first process, the first release surface of the release film 10 is disposed so as to be the object side. The arrangement method is not particularly limited, and it can be arranged by a known method.

第2製程係對脫模薄膜10以及對象物進行熱壓者。熱壓能夠使用公知的衝壓機,並且,亦可藉由壓製衝壓模具製成所期望的形狀。加熱加壓條件能夠依據用途適當地設計,例如,衝壓裝置在開始加壓後歷時15分鐘從常溫升溫至170℃之後,維持該溫度35分鐘,之後,經50分鐘從170℃冷卻至常溫。此時的衝壓壓力可在5~15MPa下適當地調節。 並且,在進行熱壓之前,亦可於脫模薄膜10的第2脫模層3的第2脫模面上配置材料。藉此,在之後的熱壓時,即使在對象物的表面存在凹凸之情況下,亦能夠良好地黏附脫模薄膜10與對象物,並能夠對對象物均等地施加壓力。 作為材料,具有緩衝性者為較佳。作為材料,例如可列舉紙、橡膠、氟樹脂片、玻璃紙等或組合該些者。The second process is a process of hot pressing the release film 10 and the object. The hot pressing can use a known press, and can also be made into a desired shape by pressing a press die. The heating and pressurizing conditions can be appropriately designed according to the application. For example, after the pressurizing device starts heating from room temperature to 170 ° C. for 15 minutes, the temperature is maintained for 35 minutes, and then the temperature is cooled from 170 ° C. to room temperature in 50 minutes. The pressing pressure at this time can be appropriately adjusted at 5 to 15 MPa. Before the hot pressing, a material may be arranged on the second release surface of the second release layer 3 of the release film 10. Thereby, in the subsequent hot pressing, even when the surface of the object is uneven, the release film 10 and the object can be adhered well, and the object can be evenly pressed. As the material, those having cushioning properties are preferred. Examples of the material include paper, rubber, a fluororesin sheet, and cellophane, or a combination of these.

作為成型品,例如可列舉撓性印刷電路基板。此時,例如可在撓性印刷配線基板的製造製程之一之覆蓋層衝壓層壓製程中使用脫模薄膜10。 亦即,脫模薄膜10用於在進行熱壓時保護電路露出薄膜的電路,並於電路露出薄膜的電路圖案所產生之凹凸部黏附覆蓋層薄膜。 具體而言,首先,脫模薄膜10以使脫模薄膜10的第1脫模面成為覆蓋層薄膜側之方式,配置成包裹覆蓋層薄膜。藉此,脫模薄膜10介於覆蓋層薄膜與之後的衝壓機之間。此時,為了進一步提高緩衝性,可於脫模薄膜10與衝壓機之間夾雜上述材料。 接著,脫模薄膜10與電路露出薄膜及覆蓋層薄膜一同藉由衝壓機加壓加熱。 而且加壓加熱之後,從衝壓機中取出黏附有覆蓋層薄膜之電路露出薄膜、亦即撓性印刷電路基板,獲得所期望的成型品。Examples of the molded article include a flexible printed circuit board. At this time, for example, the release film 10 can be used in a cover-pressing layer pressing process which is one of the manufacturing processes of a flexible printed wiring board. That is, the release film 10 is used to protect the circuit of the circuit exposed film during hot pressing, and to adhere the coverlay film to the uneven portion generated by the circuit pattern of the circuit exposed film. Specifically, first, the release film 10 is arranged so as to cover the coverlay film so that the first release surface of the release film 10 becomes the coverlay film side. Thereby, the release film 10 is interposed between the coverlay film and the subsequent punch. In this case, in order to further improve the cushioning property, the aforementioned material may be interposed between the release film 10 and the press. Next, the release film 10 is heated under pressure together with the circuit exposure film and the cover film by a press. Furthermore, after the pressure heating, the circuit-exposed film, that is, the flexible printed circuit board with the cover film adhered thereon, was taken out from the press to obtain a desired molded product.

並且,上述中,作為成型品,對撓性印刷電路基板的例進行了說明,但作為成型品,可以係配置有對象物的脫模薄膜10之面由包含熱硬化性樹脂之材料形成者。 此時,該熱硬化性樹脂可以是半硬化狀態,亦可以是硬化狀態,若為半硬化狀態,則脫模薄膜10的作用效果變得更加顯著。尤其,熱硬化性樹脂為包含環氧樹脂之樹脂組成物時,該環氧樹脂處於硬化反應的中間階段、亦即處於B步驟狀態為較佳。 依據本實施形態的脫模薄膜10,配置有對象物的脫模薄膜10之面即使是由包含熱硬化性樹脂之材料形成者,亦可獲得外觀良好的成型品。Moreover, although the example of the flexible printed circuit board was demonstrated as a molded article mentioned above, as a molded article, the surface of the release film 10 in which the object was arrange | positioned may be formed from the material containing a thermosetting resin. In this case, the thermosetting resin may be in a semi-hardened state or a hardened state. If the semi-hardened state is used, the effect of the release film 10 becomes more significant. In particular, when the thermosetting resin is a resin composition containing an epoxy resin, it is preferable that the epoxy resin is in an intermediate stage of a curing reaction, that is, in a B-step state. According to the release film 10 according to this embodiment, even if the surface of the release film 10 on which the object is disposed is formed of a material containing a thermosetting resin, a molded article having a good appearance can be obtained.

<脫模薄膜10的使用> 脫模薄膜10包括以使脫模薄膜10的第1脫模層成為對象物側之方式,於對象物上配置脫模薄膜10之製程、及針對配置有脫模薄膜10之對象物進行熱壓之製程,能夠用於在該熱壓後獲得成型品。藉此,獲得外觀良好的成型品。 並且,對象物的配置有脫模薄膜10之面可以是由包含熱硬化性樹脂之材料所形成者。其中,熱硬化性樹脂為包含環氧樹脂之樹脂組成物時,該環氧樹脂處於硬化反應的中間階段、亦即處於B步驟狀態為較佳。<Usage of Release Film 10> The release film 10 includes a process of arranging the release film 10 on an object so that the first release layer of the release film 10 is on the object side, and a method for disposing the release film 10 The object of the film 10 is subjected to a hot pressing process, and can be used to obtain a molded article after the hot pressing. Thereby, a molded article having a good appearance is obtained. In addition, the surface of the object on which the release film 10 is disposed may be formed of a material containing a thermosetting resin. Among them, when the thermosetting resin is a resin composition containing an epoxy resin, it is preferable that the epoxy resin is in an intermediate stage of a curing reaction, that is, in a B-step state.

[第2實施形態] 在第1實施形態中,脫模薄膜10具有第1脫模層1、緩衝層2、第2脫模層3依次沿厚度方向積層而成之積層結構,緩衝層2的厚度為10μm以上200μm以下,在將脫模薄膜10的總厚度設為X,將緩衝層2的厚度設為Y時,Y/X大於0.2小於0.9,對脫模層1及脫模層3包含平均粒徑d50為4μm以上60μm以下之粒子者進行了說明,在第2實施形態中,對脫模薄膜20在至少一面具有第1脫模層21,粒子的平均粒徑d50為20μm以上60μm以下者進行說明。 以下,適當地省略關於與第1實施形態相同的構成、效果、製造方法等的說明。[Second Embodiment] In the first embodiment, the release film 10 has a laminated structure in which the first release layer 1, the buffer layer 2, and the second release layer 3 are sequentially laminated in the thickness direction. When the thickness is 10 μm or more and 200 μm or less, when the total thickness of the release film 10 is set to X and the thickness of the buffer layer 2 is set to Y, Y / X is greater than 0.2 and less than 0.9, and the release layer 1 and the release layer 3 are included. The particles having an average particle diameter d50 of 4 μm or more and 60 μm or less are described. In the second embodiment, the release film 20 has a first release layer 21 on at least one side, and the average particle diameter d50 of the particles is 20 μm or more and 60 μm or less. Person to explain. Hereinafter, descriptions of the same configuration, effect, manufacturing method, and the like as those of the first embodiment are appropriately omitted.

圖2係第2實施形態之脫模薄膜的剖面圖。 如圖2所示,脫模薄膜20具有包括第1熱塑性樹脂材料之第1脫模層21。第1熱塑性樹脂材料包含熱塑性材料及粒子。Fig. 2 is a sectional view of a release film according to a second embodiment. As shown in FIG. 2, the release film 20 includes a first release layer 21 including a first thermoplastic resin material. The first thermoplastic resin material includes a thermoplastic material and particles.

在本實施形態中,粒子的平均粒徑d50為20μm以上,較佳為23μm以上,更佳為25μm以上,進一步較佳為28μm以上。藉由在第1脫模層21中含有平均粒徑d50為上述下限值以上之粒子,能夠提高脫模薄膜20的剛性,並且能夠使脫模性與追隨性的平衡變得良好。 另一方面,粒子的平均粒徑d50的上限值為60μm以下,較佳為55μm以下,更佳為52μm以下,進一步較佳為51μm以下。藉由在第1脫模層21中含有平均粒徑d50為上述上限值以下之粒子,能夠平衡性良好地提高脫模性與追隨性。並且, 在本實施形態中,粒子的平均粒徑d50為上述上限值以下時,能夠製作成品外觀良好的成型品。In this embodiment, the average particle diameter d50 of the particles is 20 μm or more, preferably 23 μm or more, more preferably 25 μm or more, and still more preferably 28 μm or more. By including particles having an average particle diameter d50 of the above lower limit value or more in the first release layer 21, the rigidity of the release film 20 can be improved, and the balance between the mold release property and the followability can be improved. On the other hand, the upper limit value of the average particle diameter d50 of the particles is 60 μm or less, preferably 55 μm or less, more preferably 52 μm or less, and still more preferably 51 μm or less. By including particles having an average particle diameter d50 of the above-mentioned upper limit value or less in the first release layer 21, the release properties and the followability can be improved in a well-balanced manner. In addition, in this embodiment, when the average particle diameter d50 of the particles is equal to or less than the above-mentioned upper limit value, a molded article having a good appearance can be produced.

在本實施形態中,上述粒子係球狀為較佳。In this embodiment, the particles are preferably spherical.

作為構成粒子之材料,能夠使用與上述第1實施形態中說明者相同者。As the material constituting the particles, the same materials as those described in the first embodiment can be used.

在本實施形態中,在脫模薄膜20配置於對象物上時,第1脫模層21相當於脫模薄膜20中的對象物側之面(脫模面)。In the present embodiment, when the release film 20 is placed on an object, the first release layer 21 corresponds to the object-side surface (release surface) in the release film 20.

在本實施形態中,從確保第1脫模層21的強度,並且獲得穩定之脫模性之觀點考慮,第1脫模層21的脫模面的表面10點平均粗糙度(Rz)較佳為4μm以上,更佳為4.5μm以上,進一步較佳為5μm以上。 另一方面,從抑制追隨性降低之觀點考慮,脫模面的表面10點平均粗糙度(Rz)的上限值較佳為20μm以下,更佳為18μm以下,進一步較佳為16μm以下。 另外,第1脫模層21的表面10點平均粗糙度(Rz)能夠依照JIS-B0601-1994進行測定。並且,表面10點平均粗糙度(Rz)的值係指,在脫模薄膜20配置於對象物時,相當於脫模薄膜20中的對象物側之面(脫模面)的數值。In this embodiment, from the viewpoint of ensuring the strength of the first release layer 21 and obtaining stable release properties, the surface 10-point average roughness (Rz) of the release surface of the first release layer 21 is preferred. It is 4 μm or more, more preferably 4.5 μm or more, and still more preferably 5 μm or more. On the other hand, from the viewpoint of suppressing a decrease in followability, the upper limit value of the 10-point average roughness (Rz) of the surface of the release surface is preferably 20 μm or less, more preferably 18 μm or less, and still more preferably 16 μm or less. The 10-point average roughness (Rz) of the surface of the first release layer 21 can be measured in accordance with JIS-B0601-1994. The value of the 10-point average roughness (Rz) on the surface refers to a value corresponding to the surface (release surface) on the object side in the release film 20 when the release film 20 is placed on the object.

在本實施形態中,從確保第1脫模層21強度,並且獲得穩定的脫模性之觀點考慮,第1脫模層21的脫模面的凹凸的平均間隔(Sm)較佳為150μm以上,更佳為180μm以上。 另一方面,從抑制在成型品的表面產生皺紋之觀點考慮,第1脫模層21的脫模面的凹凸的平均間隔(Sm)的上限值較佳為500μm以下,更佳為450μm以下。 另外,第1脫模層21的凹凸的平均間隔(Sm)能夠依照JIS-B0601-1994進行測定。並且,凹凸的平均間隔(Sm)的值係指,脫模薄膜20配置於對象物時,相當於脫模薄膜20中的對象物側之面(脫模面)的數值。In this embodiment, from the viewpoint of ensuring the strength of the first release layer 21 and obtaining stable release properties, the average interval (Sm) of the unevenness on the release surface of the first release layer 21 is preferably 150 μm or more. , More preferably 180 μm or more. On the other hand, from the viewpoint of suppressing the occurrence of wrinkles on the surface of the molded product, the upper limit of the average interval (Sm) of the unevenness of the relief surface of the first release layer 21 is preferably 500 μm or less, and more preferably 450 μm or less. . The average interval (Sm) of the unevenness of the first release layer 21 can be measured in accordance with JIS-B0601-1994. In addition, the value of the average interval (Sm) of the unevenness refers to a value corresponding to the object-side surface (release surface) in the release film 20 when the release film 20 is disposed on the object.

在本實施形態中,從確保第1脫模層21的強度,並且獲得脫模性之觀點考慮, 第1脫模層21的脫模面的算術平均粗糙度(Ra)較佳為0.5μm以上,更佳為0.6μm以上。 另一方面,從抑制在成型品的表面產生皺紋之觀點考慮,第1脫模層21的脫模面的算術平均粗糙度(Ra)的上限值較佳為6μm以下,更佳為5μm以下。 另外,第1脫模層21的算術平均粗糙度(Ra)能夠依照JIS-B0601-1994進行測定。並且,算術平均粗糙度(Ra)係指,脫模薄膜20配置於對象物時,相當於脫模薄膜20中的對象物側之面(脫模面)的數值。In this embodiment, from the viewpoint of ensuring the strength of the first release layer 21 and obtaining the release property, the arithmetic average roughness (Ra) of the release surface of the first release layer 21 is preferably 0.5 μm or more. , More preferably 0.6 μm or more. On the other hand, from the viewpoint of suppressing the occurrence of wrinkles on the surface of the molded product, the upper limit value of the arithmetic mean roughness (Ra) of the release surface of the first release layer 21 is preferably 6 μm or less, and more preferably 5 μm or less. . The arithmetic mean roughness (Ra) of the first release layer 21 can be measured in accordance with JIS-B0601-1994. The arithmetic mean roughness (Ra) refers to a value corresponding to the surface (release surface) on the object side of the release film 20 when the release film 20 is disposed on the object.

在本實施形態中,第1脫模層21的脫模面的剝離強度較佳為3N/50mm以下,更佳為1N/50mm以下。藉此,能夠製成能夠顯現比習知的脫模薄膜良好的脫模性之脫模薄膜。In this embodiment, the peeling strength of the release surface of the first release layer 21 is preferably 3 N / 50 mm or less, and more preferably 1 N / 50 mm or less. Thereby, it is possible to produce a release film capable of exhibiting better release properties than a conventional release film.

另外,第1脫模層21的脫模面的剝離強度例如能夠藉由以下方法進行測定。 首先,製作了以使Arisawa Mfg. Co., Ltd.製的覆蓋層(CM類型)的塗佈有黏著劑之一側的面與電路露出薄膜的表面接觸之方式臨時固定有上述覆蓋層之試驗薄膜。接著,以脫模薄膜20中的第1脫模層21的脫模面與上述試驗薄膜的具有覆蓋層之一側的面對置之方式,將彼此貼合者作為試驗片來製作。之後,針對該試驗片,於195℃、6MPa的條件下實施2分鐘的熱壓處理。此時,藉由不壓接試驗片的端部,使得能夠將脫模薄膜20的端部作為自由端來捏拿。之後,使用拉伸試驗機,從脫模薄膜20的該端部向180°方向以約1000mm/分的速度將上述脫模薄膜20的第1脫模層21的脫模面與上述試驗薄膜的覆蓋層之間進行剝離,藉此測定第1脫模層21的脫模面的剝離強度。另外,在上述熱壓處理之後立即實施上述剝離強度的測定為較佳。The peel strength of the release surface of the first release layer 21 can be measured by the following method, for example. First, a test was carried out in which the cover layer was temporarily fixed so that the surface of one side of the cover layer (CM type) coated with an adhesive manufactured by Arisawa Mfg. Co., Ltd. was in contact with the surface of the circuit exposed film. film. Next, the release surface of the first release layer 21 in the release film 20 and the surface of one side of the test film having one of the cover layers were placed facing each other, and a test piece was produced by bonding them to each other. Thereafter, the test piece was subjected to a hot-pressing treatment under conditions of 195 ° C. and 6 MPa for 2 minutes. At this time, by not crimping the end portion of the test piece, the end portion of the release film 20 can be pinched as a free end. Then, using a tensile tester, the release surface of the first release layer 21 of the release film 20 and the test film were removed from the end portion of the release film 20 in a 180 ° direction at a speed of about 1000 mm / min. The cover layers were peeled to measure the peel strength of the release surface of the first release layer 21. In addition, it is preferable to perform the measurement of the peeling strength immediately after the hot-pressing treatment.

在本實施形態中,從提高針對成型品之嵌入性之觀點考慮,第1脫模層21的厚度較佳為15μm以上,更佳為20μm以上。 另一方面,從獲得適當的強度之觀點考慮,第1脫模層21的厚度較佳為100μm以下,更佳為75μm以下,最佳為50μm以下。In the present embodiment, the thickness of the first release layer 21 is preferably 15 μm or more, and more preferably 20 μm or more, from the viewpoint of improving the embedding property with respect to a molded article. On the other hand, from the viewpoint of obtaining appropriate strength, the thickness of the first release layer 21 is preferably 100 μm or less, more preferably 75 μm or less, and most preferably 50 μm or less.

脫模薄膜20係於至少一面具有包含熱塑性樹脂材料之第1脫模層21者。The release film 20 is one having a first release layer 21 containing a thermoplastic resin material on at least one side.

作為構成第1脫模層21之材料,能夠使用與上述第1實施形態中說明者相同者。As the material constituting the first release layer 21, the same ones as those described in the first embodiment can be used.

對第2實施形態的脫模薄膜20中的效果進行說明。The effect of the release film 20 of the second embodiment will be described.

本實施形態之脫模薄膜20係採用同時滿足以下2個條件之構成者。 第1條件係,藉由包含熱塑性樹脂以及平均粒徑d50為20μm以上60μm以下之粒子之熱塑性樹脂材料形成第1脫模層21。 第2條件係,控制成使粒子的含量相對於第1脫模層21總量為0.5重量%以上15重量%以下。 因此,依據脫模薄膜20獲得以下效果。The release film 20 of this embodiment is a structure which satisfies the following two conditions simultaneously. The first condition is that the first release layer 21 is formed of a thermoplastic resin material containing a thermoplastic resin and particles having an average particle diameter d50 of 20 μm to 60 μm. The second condition is controlled so that the content of particles is 0.5% by weight or more and 15% by weight or less based on the total amount of the first release layer 21. Therefore, the following effects are obtained in accordance with the release film 20.

第1,依據脫模薄膜20,能夠顯現比習知的脫模薄膜良好的脫模性。First, according to the release film 20, it is possible to express a better release property than a conventional release film.

第2,依據脫模薄膜20,能夠製作成品外觀良好的成型品。 而且,如實施例中進行後述,確認到如下:從關於黏著劑所滲出之形狀,其凹凸差小於100μm之方面考慮,使用脫模薄膜20製作之成型品成為良好的成品外觀。Second, according to the release film 20, a molded article having a good appearance can be produced. In addition, as described later in the examples, it was confirmed that the shape of the exuded shape of the adhesive had a difference in unevenness of less than 100 μm, and the molded article produced using the release film 20 had a good finished appearance.

第3,依據脫模薄膜20,製作成型品時,即使在對脫模薄膜20所具有之第1脫模層21的脫模面施加衝壓壓力之情況下,亦能夠抑制在上述成型品的表面產生皺紋。因此,依據脫模薄膜20,能夠製作成品外觀良好的成型品。Third, according to the release film 20, when a molded product is produced, it is possible to suppress the surface of the molded product even when a pressing pressure is applied to the release surface of the first release layer 21 of the release film 20. Wrinkles appear. Therefore, according to the release film 20, a molded article with a good appearance can be produced.

脫模薄膜20於至少一面具有包含熱塑性樹脂材料之第1脫模層21即可,但脫模薄膜20亦可以係具有在其厚度方向上積層於第1脫模層21之其他層者。 例如,如圖2所示,脫模薄膜20亦可以設為於另一面還具有第2脫模層23之構成。設為具有第2脫模層23之構成之情況下,使用脫模薄膜20時,藉由衝壓機熱壓脫模薄膜20時,與熱板的脫模性提高,並且能夠提高製造成形體或積層體時的生產率。 另外,如圖2所示,脫模薄膜20除了第2脫模層23之外還可具有賦予緩衝性之緩衝層22。 而且,脫模薄膜20可具有第1脫模層21、緩衝層22、第2脫模層23沿厚度方向依次積層而成之3層以上的積層結構。此時,第1脫模層21與第2脫模層23只要是包含熱塑性樹脂之材料,則可以是由相同的材料形成者,亦可以是由不同的材料形成者。另外,第1脫模層21與第2脫模層23可以是彼此不同的厚度。The release film 20 may have the first release layer 21 containing a thermoplastic resin material on at least one side, but the release film 20 may have other layers laminated on the first release layer 21 in the thickness direction. For example, as shown in FIG. 2, the release film 20 may be configured to further include a second release layer 23 on the other surface. In the case where the second release layer 23 is used, when the release film 20 is used, when the release film 20 is hot-pressed by a press, the releasability from the hot plate is improved, and it is possible to improve the production of a molded body or Productivity when laminated. In addition, as shown in FIG. 2, the release film 20 may include a buffer layer 22 that imparts cushioning properties in addition to the second release layer 23. The release film 20 may have a laminated structure of three or more layers in which the first release layer 21, the buffer layer 22, and the second release layer 23 are sequentially laminated in the thickness direction. At this time, as long as the first release layer 21 and the second release layer 23 are made of a material containing a thermoplastic resin, they may be formed of the same material or may be formed of different materials. The first release layer 21 and the second release layer 23 may have different thicknesses.

並且,此時,從獲得適當的強度之觀點考慮,第2脫模層23的厚度例如可設為15μm以上,亦可設為20μm以上。另一方面,從抑制追隨性降低之觀點考慮,第2脫模層23的厚度的上限值例如可設為100μm以下,亦可設為75μm以下,亦可設為50μm以下。In addition, in this case, from the viewpoint of obtaining appropriate strength, the thickness of the second release layer 23 may be, for example, 15 μm or more, and may be 20 μm or more. On the other hand, from the viewpoint of suppressing a decrease in the followability, the upper limit value of the thickness of the second release layer 23 may be, for example, 100 μm or less, 75 μm or less, or 50 μm or less.

作為構成第2脫模層23之材料,能夠使用與上述第1實施形態中說明者相同者。並且,第2脫模層23在不損害脫模薄膜20的效果之範圍內可包含粒子。As a material constituting the second release layer 23, the same materials as those described in the first embodiment can be used. In addition, the second release layer 23 may contain particles as long as the effect of the release film 20 is not impaired.

並且,此時,緩衝層22的厚度較佳為10μm以上100μm以下,更佳為20μm以上90μm以下,最佳為30μm以上70μm以下。若緩衝層22的厚度為上述下限值以上,則能夠抑制脫模薄膜20的緩衝性降低。若緩衝層23的厚度為上述上限值以下,則能夠抑制脫模性的降低。In this case, the thickness of the buffer layer 22 is preferably 10 μm or more and 100 μm or less, more preferably 20 μm or more and 90 μm or less, and most preferably 30 μm or more and 70 μm or less. When the thickness of the buffer layer 22 is equal to or more than the above-mentioned lower limit value, it is possible to suppress a reduction in the cushioning property of the release film 20. When the thickness of the buffer layer 23 is equal to or less than the above-mentioned upper limit value, it is possible to suppress a decrease in the mold release property.

作為構成緩衝層22之材料,能夠使用與上述第1實施形態中說明者相同者。As the material constituting the buffer layer 22, the same ones as those described in the first embodiment can be used.

以上,對本發明的實施形態進行了說明,但該些為本發明的例示,亦能夠採用上述以外的各種構成。 [實施例]As mentioned above, although embodiment of this invention was described, these are illustrations of this invention, and various structures other than the above can also be employ | adopted. [Example]

以下,藉由實施例及比較例說明本發明,但本發明並不限定於該些。Hereinafter, the present invention will be described by examples and comparative examples, but the present invention is not limited to these.

[實施例A] <實施例A-1> 使用包含聚甲基戊烯樹脂(TPX(註冊商標))(Mitsui Chemicals, Inc.製,TPXD X845)及作為交聯有機樹脂粒子之丙烯酸珠(SEKISUI PLASTICS CO.,Ltd.製,M BX-30)之熱塑性樹脂材料,利用擠製T模法製作TPX薄膜來獲得了第1脫模層。在此,製作第1脫模層時所使用之丙烯酸珠的平均粒徑d50為28.5μm。並且,製作上述第1脫模層時所使用之上述熱塑性樹脂材料使用了以上述丙烯酸珠的含量相對於第1脫模層總量成為4重量%之方式與上述TPX配合而成者。 使用包含聚甲基戊烯樹脂(TPX(註冊商標))(Mitsui Chemicals, Inc.製,TPXDX 845)及作為交聯有機樹脂粒子之丙烯酸珠(SEKISUI PLASTICS CO., Ltd.製,MB X-50)之熱塑性樹脂材料,利用擠製T模法製作TPX薄膜來獲得了第2脫模層。在此,製作第2脫模層時使用之丙烯酸珠的平均粒徑d50為53μm。並且,製作上述第2脫模層時使用之上述熱塑性樹脂材料使用了以上述丙烯酸珠的含量相對於第2脫模層總量成為10重量%之方式與上述TPX配合而成者。 接著,利用擠製T模法依次積層藉由上述方法獲得之第1脫模層、包含上述TPX、聚丙烯(SUN AROMA CO., LTD.製,PB270A)及改性聚乙烯(乙烯-甲基丙烯酸甲酯共聚物、Sumitomo Chemical Company, Limited製,WH102)之緩衝層(配合比率:TPX:聚丙烯:乙烯-甲基丙烯酸甲酯共聚物=30:40:30)、及第2脫模層,從而獲得了實施例1的脫模薄膜。所獲得之脫模薄膜係具有上述第1脫模層、上述緩衝層、上述第2脫模層沿厚度方向依次積層而成之3層結構者。並且,所獲得之脫模薄膜的厚度為120μm。而且,在所獲得之脫模薄膜中,上述第1脫模層與上述第2脫模層的厚度為30μm,上述緩衝層的厚度為60μm。[Example A] <Example A-1> Acrylic beads (SEKISUI) containing polymethylpentene resin (TPX (registered trademark)) (manufactured by Mitsui Chemicals, Inc., TPXD X845) and crosslinked organic resin particles were used. A thermoplastic resin material (M BX-30) manufactured by PLASTICS CO., Ltd. was used to produce a TPX film by an extrusion T-die method to obtain a first release layer. Here, the average particle diameter d50 of the acrylic beads used when producing the first release layer was 28.5 μm. In addition, the thermoplastic resin material used when producing the first release layer was formed by blending the content of the acrylic beads with the TPX so that the content of the acrylic beads becomes 4% by weight based on the total amount of the first release layer. A polymethylpentene resin (TPX (registered trademark)) (manufactured by Mitsui Chemicals, Inc., TPXDX 845) and acrylic beads (cross-linked organic resin particles) (manufactured by SEKISUI PLASTICS CO., Ltd., MB X-50) were used. ), A thermoplastic resin material, a TPX film was produced by an extrusion T-die method to obtain a second release layer. Here, the average particle diameter d50 of the acrylic beads used when preparing the second release layer was 53 μm. In addition, the thermoplastic resin material used in the production of the second release layer was prepared by blending the acrylic beads with the TPX so that the content of the acrylic beads becomes 10% by weight based on the total amount of the second release layer. Next, the first release layer obtained by the above method, including the above-mentioned TPX, polypropylene (PB270A made by SUN AROMA CO., LTD.), And modified polyethylene (ethylene-methyl Methyl acrylate copolymer, Sumitomo Chemical Company, Limited, WH102) buffer layer (combination ratio: TPX: polypropylene: ethylene-methyl methacrylate copolymer = 30:40:30), and a second release layer Thus, a release film of Example 1 was obtained. The obtained release film has a three-layer structure in which the first release layer, the buffer layer, and the second release layer are sequentially laminated in the thickness direction. The thickness of the obtained release film was 120 μm. In the obtained release film, the thickness of the first release layer and the second release layer was 30 μm, and the thickness of the buffer layer was 60 μm.

<實施例A-2> 使用以丙烯酸珠的含量相對於第1脫模層總量成為10重量%之方式與上述TPX配合而成之熱塑性樹脂材料製作了第1脫模層這一點、代替SEKISUI PLASTI CS CO., Ltd.製的MBX-50,作為丙烯酸珠使用SEKISUI PLASTICS CO., Ltd.製的MBX-30來製作第2脫模層這一點、及將緩衝層的厚度設為50μm這一點,除了上述點以外,以與實施例A-1相同的方法獲得了實施例A-2的脫模薄膜。<Example A-2> Instead of SEKISUI, the first release layer was produced using a thermoplastic resin material that was blended with the TPX described above so that the content of acrylic beads was 10% by weight based on the total amount of the first release layer. MBX-50 manufactured by PLASTI CS CO., Ltd. uses MBX-30 manufactured by SEKISUI PLASTICS CO., Ltd. as acrylic beads to form a second release layer, and the thickness of the buffer layer is set to 50 μm. Except for the above points, the release film of Example A-2 was obtained in the same manner as in Example A-1.

<實施例A-3> 代替SEKISUI PLASTICS CO.,Ltd.製的MBX-30,作為交聯有機樹脂粒子亦即丙烯酸珠使用平均粒徑d50為20.9μm之SEKISUI PLASTICS CO., Ltd.製的MBX -20來獲得第1脫模層這一點、將第1脫模層的厚度設為25μm這一點、代替SEKIS UI PLASTICS CO., Ltd.製的MBX-50,作為丙烯酸珠使用SEKISUI PLASTICS CO., Ltd.製的MBX-30,藉由以丙烯酸珠的含量相對於脫模層總量成為12重量%之方式與上述TPX配合而成之熱塑性樹脂材料製作厚度25μm的第2脫模層這一點、將緩衝層的厚度設為70μm這一點,除了上述點以外,以與實施例A-1相同的方法獲得了實施例A-3的脫模薄膜。<Example A-3> Instead of MBX-30 manufactured by SEKISUI PLASTICS CO., Ltd., MBX manufactured by SEKISUI PLASTICS CO., Ltd., having an average particle diameter d50 of 20.9 μm, was used as acrylic beads, which are crosslinked organic resin particles. -20 to obtain the first release layer, set the thickness of the first release layer to 25 μm, replace MBX-50 manufactured by SEKIS UI PLASTICS CO., Ltd., and use SEKISUI PLASTICS CO. As acrylic beads, Ltd. MBX-30 manufactured a second release layer with a thickness of 25 μm from a thermoplastic resin material blended with the TPX so that the content of acrylic beads is 12% by weight based on the total amount of the release layer. A release film of Example A-3 was obtained in the same manner as in Example A-1 except that the thickness of the buffer layer was set to 70 μm.

<實施例A-4> 代替SEKISUI PLASTICS CO., Ltd.製的MBX-30,作為交聯有機樹脂粒子亦即丙烯酸珠使用平均粒徑d50為10.2μm之JXTG NIPPON OIL & ENERGY CORP ORATION製的NMB-1020,藉由以丙烯酸珠的含量相對於脫模層總量成為2重量%之方式與上述TPX配合而成之熱塑性樹脂材料製作厚度40μm的第1脫模層這一點、將第2脫模層的厚度設為40μm這一點、將緩衝層的厚度設為40μm這一點,除了上述點以外,以與實施例A-1相同的方法獲得了實施例A-4的脫模薄膜。<Example A-4> Instead of MBX-30 manufactured by SEKISUI PLASTICS CO., Ltd., as the cross-linked organic resin particles, that is, acrylic beads, JXTG NIPPON OIL & ENERGY CORP ORATION manufactured by JXTG NIPPON OIL & ENERGY CORP ORATION with an average particle diameter d50 of 10.2 μm was used. -1020, the first release layer having a thickness of 40 μm is produced by using a thermoplastic resin material blended with the above TPX so that the content of the acrylic beads is 2% by weight relative to the total amount of the release layer, and the second release is performed. A release film of Example A-4 was obtained in the same manner as in Example A-1 except that the thickness of the layer was set to 40 μm and the thickness of the buffer layer was set to 40 μm.

<比較例A-1> 代替SEKISUI PLASTICS CO., Ltd.製的MBX-30,作為交聯有機樹脂粒子亦即丙烯酸珠使用平均粒徑d50為10.2μm之JXTG NIPPON OIL & ENERGY CORP ORATION製的NMB-1020,以丙烯酸珠的含量相對於脫模層總量成為2重量%之方式製作第1脫模層這一點、使用不含有丙烯酸珠之包含上述TPX之熱塑性樹脂材料製作了第2脫模層這一點,除了上述點以外,以與實施例A-1相同的方法獲得比較例A-1的脫模薄膜。<Comparative Example A-1> Instead of MBX-30 manufactured by SEKISUI PLASTICS CO., Ltd., as crosslinked organic resin particles, that is, acrylic beads, JXTG NIPPON OIL & ENERGY CORP ORATION manufactured by JXTG NIPPON OIL & ENERGY CORP ORATION with an average particle diameter d50 of 10.2 μm was used. -1020, the first release layer was made such that the content of acrylic beads was 2% by weight based on the total amount of the release layer, and the second release layer was produced using a thermoplastic resin material containing TPX without acrylic beads In this regard, a release film of Comparative Example A-1 was obtained in the same manner as in Example A-1 except for the points described above.

<比較例A-2> 代替SEKISUI PLASTICS CO., Ltd.製的MBX-30,作為交聯有機樹脂粒子亦即丙烯酸珠使用平均粒徑d50為61.2μm之TOYOBO CO., LTD.製的AR650MZ,藉由以丙烯酸珠的含量相對於脫模層總量成為15重量%之方式與上述TPX配合而成之熱塑性樹脂材料製作了第1脫模層這一點、代替SEKISUI PLASTICS CO., Ltd.製的MBX-50,作為交聯有機樹脂粒子亦即丙烯酸珠使用平均粒徑d50為61.2 μm之TOYOBO CO., LTD.製的AR650MZ,藉由以丙烯酸珠的含量相對於脫模層總量成為15重量%之方式與上述TPX配合而成之熱塑性樹脂材料製作了第2脫模層這一點、將緩衝層的厚度設為50μm這一點,除了上述點以外,以與實施例A-1相同的方法獲得了比較例A-2的脫模薄膜。<Comparative Example A-2> Instead of MBX-30 manufactured by SEKISUI PLASTICS CO., Ltd., as crosslinked organic resin particles, that is, acrylic beads, an AR650MZ manufactured by TOYOBO CO., LTD. Having an average particle diameter d50 of 61.2 μm, The first mold release layer was produced by using a thermoplastic resin material blended with the above-mentioned TPX so that the content of acrylic beads was 15% by weight based on the total amount of the release layer, instead of the product made by SEKISUI PLASTICS CO., Ltd. MBX-50 is used as crosslinked organic resin particles, that is, acrylic beads. AR650MZ manufactured by TOYOBO CO., LTD. With an average particle diameter d50 of 61.2 μm is used. The content of acrylic beads relative to the total amount of the release layer becomes 15 weight. The thermoplastic resin material combined with the above TPX method was used to produce a second release layer, and the thickness of the buffer layer was set to 50 μm. Except for the above points, it was obtained in the same manner as in Example A-1. The release film of Comparative Example A-2 was shown.

<比較例A-3> 代替SEKISUI PLASTICS CO., Ltd.製的MBX-30,作為交聯有機樹脂粒子亦即丙烯酸珠使用平均粒徑d50為2.8μm之Soken Chemical & Engineering Co., Ltd.製的MX-300,藉由以丙烯酸珠的含量相對於脫模層總量成為3重量%之方式與上述TPX配合而成之熱塑性樹脂材料製作了厚度25μm的第1脫模層這一點、代替SEKISUI PLASTICS CO., Ltd.製的MBX-50,作為交聯有機樹脂粒子亦即丙烯酸珠使用平均粒徑d50為2.8μm之Soken Chemical & Engineering Co., Ltd.製的MX- 300,藉由以丙烯酸珠的含量相對於脫模層總量成為3重量%之方式與上述TPX配合而成之熱塑性樹脂材料製作了厚度25μm的第2脫模層這一點、將緩衝層的厚度設為70μm這一點,除了上述點以外,以與實施例A-1相同的方法獲得了比較例A-3的脫模薄膜。<Comparative Example A-3> Instead of MBX-30 manufactured by SEKISUI PLASTICS CO., Ltd., acrylic resin beads which are cross-linked organic resin particles, that is, an average particle diameter d50 of 2.8 μm, were manufactured by Soken Chemical & Engineering Co., Ltd. MX-300 replaces SEKISUI by using a thermoplastic resin material made of the above-mentioned TPX in such a way that the content of acrylic beads is 3% by weight relative to the total amount of the release layer. MBX-50 manufactured by PLASTICS CO., Ltd. uses MX-300 manufactured by Soken Chemical & Engineering Co., Ltd. as the crosslinked organic resin particles, that is, acrylic beads, having an average particle diameter d50 of 2.8 μm. The thermoplastic resin material blended with the TPX in such a way that the content of the beads is 3% by weight based on the total amount of the release layer is a second release layer having a thickness of 25 μm and a thickness of the buffer layer is 70 μm. Except for the above, a release film of Comparative Example A-3 was obtained in the same manner as in Example A-1.

<比較例A-4> 將第1脫模層及第2脫模層的厚度分別設為40μm這一點、將緩衝層的厚度設為20μm這一點,除了上述點以外,以與實施例A-2相同的方法獲得了比較例A-4的脫模薄膜。<Comparative Example A-4> Except for the points described above, the thickness of the first release layer and the second release layer was set to 40 μm, and the thickness of the buffer layer was set to 20 μm. In the same manner, a release film of Comparative Example A-4 was obtained.

<比較例A-5> 將第1脫模層及第2脫模層的厚度分別設為10μm這一點、將緩衝層的厚度設為180μm這一點,除了上述點以外,以與實施例A-2相同的方法獲得了比較例A-5的脫模薄膜。<Comparative Example A-5> Except for the points described above, the thickness of the first release layer and the second release layer was set to 10 μm, and the thickness of the buffer layer was set to 180 μm. In the same manner, a release film of Comparative Example A-5 was obtained.

使用實施例A-1~A-4及比較例A-1~A-5的各脫模薄膜進行了以下評價。將結果示於表1。The following evaluations were performed using each of the release films of Examples A-1 to A-4 and Comparative Examples A-1 to A-5. The results are shown in Table 1.

<評價方法> ‧粒子(丙烯酸珠)的平均粒徑d50:使用雷射衍射式粒度分析儀(Malvern公司製,Mastersizer2000),依據溶劑使用水並使粒子分散來進行了粒度測定而得之結果,計算累積頻率達到50%之粒徑的值作為平均粒徑d50。另外,單位為μm。<Evaluation method> The average particle diameter d50 of the particles (acrylic beads): a result obtained by measuring the particle size using a laser diffraction particle size analyzer (manufactured by Malvern Co., Ltd., Mastersizer 2000) and using water as a solvent to disperse the particles, The value of the particle diameter with a cumulative frequency of 50% was calculated as the average particle diameter d50. The unit is μm.

‧第1脫模層的第1脫模面的表面10點平均粗糙度(Rz):關於所獲得之脫模薄膜中的第1脫模層的第1脫模面的表面,依照JIS-B0601-1994,使用TOKYO SEIMI TSU CO., LTD.製的Handy Surf E-35B,對中央n=3進行了測定。另外,單位為μm。‧ 10-point average roughness (Rz) on the surface of the first release surface of the first release layer: The surface of the first release surface of the first release layer in the obtained release film is in accordance with JIS-B0601 -1994, the center n = 3 was measured using Handy Surf E-35B manufactured by TOKYO SEIMI TSU CO., LTD. The unit is μm.

・第2脫模層的第2脫模面的表面10點平均粗糙度(Rz):關於脫模薄膜中的第2脫模層的第2脫模面的表面,依照JIS-B0601-1994,使用TOKYO SEIMITSU CO., LTD.製的Handy Surf E-35B,對中央n=3進行了測定。另外,單位為μm。・ 10-point average roughness (Rz) on the surface of the second release surface of the second release layer: Regarding the surface of the second release surface of the second release layer in the release film, in accordance with JIS-B0601-1994, The center n = 3 was measured using Handy Surf E-35B manufactured by TOKYO SEIMITSU CO., LTD. The unit is μm.

‧第1脫模層的第1脫模面的脫模性:首先,製作了以使Arisawa Mfg. Co., Ltd.製的覆蓋層(CM類型)的塗佈有黏著劑之一側的面與電路露出薄膜的表面接觸之方式臨時固定有上述覆蓋層之試驗薄膜。接著,作為試驗片獲得了以脫模薄膜中的第1脫模層的第1脫模面與上述試驗薄膜的具有覆蓋層之一側的面對置之方式將彼此貼合而成者。接著,關於該試驗片,於180℃、6MPa的條件下實施了2分鐘的熱壓處理之後,使用拉伸試驗機(A&D Company, Limited製Force gauge AD-4932A-50N),以在180°方向上約1000mm/分鐘的速度,測定了上述脫模薄膜的第1脫模層的第1脫模面與上述試驗薄膜的覆蓋層之間的剝離強度。在上述熱壓處理之後立即實施剝離強度的測定,並依據以下的基準評價了脫模性。 ◎:剝離強度為1N/50mm以下。 ○:剝離強度大於1N/50mm且為3N/50mm以下。 ×:剝離強度表示大於3N/50mm的值、或者不易剝離而形成試驗片之任一薄膜破裂。‧Releasability of the first release surface of the first release layer: First, a surface on the side coated with one of the adhesives (CM type) made by Arisawa Mfg. Co., Ltd. was produced. The test film having the above-mentioned cover layer was temporarily fixed in a manner of contacting the surface of the circuit exposed film. Next, a test piece was obtained in which the first release surface of the first release layer in the release film and the test film having one side of the cover layer facing each other were bonded to each other. Next, this test piece was subjected to a hot-pressing treatment at 180 ° C and 6 MPa for 2 minutes, and then a tensile tester (Force gauge AD-4932A-50N manufactured by A & D Company, Limited) was used so that the test piece was 180 ° The peeling strength between the first release surface of the first release layer of the release film and the cover layer of the test film was measured at a speed of about 1,000 mm / minute. The peel strength was measured immediately after the hot-pressing treatment, and the releasability was evaluated based on the following criteria. :: Peel strength is 1 N / 50 mm or less. (Circle): Peeling strength is more than 1N / 50mm and 3N / 50mm or less. ×: Peeling strength indicates a value greater than 3N / 50 mm, or any film that does not easily peel off and forms a test piece is cracked.

‧第2脫模層的第2脫模面的脫模性:作為試驗片獲得了以脫模薄膜中的第2脫模層的第2脫模面與矽橡膠片對置之方式將彼此貼合而成者。接著,關於該試驗片,於180℃、6MPa的條件下實施了2分鐘的熱壓處理之後,使用拉伸試驗機(A&D Company, Limited製Force gauge AD-4932A-50N),以在180°方向上約1000 mm/分鐘的速度,測定了上述脫模薄膜的第2脫模層的第2脫模面與矽氧橡膠片之間的剝離強度。在上述熱壓處理之後立即實施剝離強度的測定,依據以下基準評價了脫模性。 ○:剝離強度為1N/50mm以下。 ×:剝離強度表示大於1N/50mm的值。‧Releasability of the second release surface of the second release layer: As a test piece, the second release surface of the second release layer in the release film and the silicone rubber sheet were placed so as to face each other. Combined. Next, this test piece was subjected to a hot-pressing treatment at 180 ° C and 6 MPa for 2 minutes, and then a tensile tester (Force gauge AD-4932A-50N manufactured by A & D Company, Limited) was used so that the test piece was 180 ° The peeling strength between the second release surface of the second release layer of the release film and the silicone rubber sheet was measured at a speed of about 1,000 mm / min. The measurement of peel strength was performed immediately after the hot-pressing treatment, and the releasability was evaluated based on the following criteria. ○: Peel strength is 1 N / 50 mm or less. ×: Peel strength indicates a value greater than 1 N / 50 mm.

‧成型品的成品外觀1(黏著劑滲出形狀):首先,在Arisawa Mfg. Co., Ltd.製的覆蓋層(CM類型)製作了1mm四方的開口部。接著,製作了以使塗佈有黏著劑之一側的面與柔性配線板用包銅層板的表面接觸之方式臨時固定有具有上述開口部之覆蓋層之試驗片。接著,以脫模薄膜中的第1脫模層的第1脫模面與具有上述試驗片的覆蓋層之一側的面對置之方式,疊加上述脫模薄膜與上述試驗片之後,於180℃、6MPa的條件下實施2分鐘熱壓處理,獲得了成型品。關於這樣獲得之成型品,觀察塗佈於該覆蓋帶的表面之黏著劑從上述開口部的外緣部滲出至形成於覆蓋層之開口部內之形狀(黏著劑滲出形狀),並依據以下基準評價了成型品的成品外觀。 ○:黏著劑滲出形狀的凹凸差小於100μm。 ×:黏著劑滲出形狀的凹凸差為100μm以上。‧Finished product appearance 1 (adhesive exudation shape): First, a 1 mm square opening was made in a cover layer (CM type) made by Arisawa Mfg. Co., Ltd. Next, a test piece in which a cover layer having the above-mentioned opening portion was temporarily fixed so that the surface on one side to which the adhesive was applied was brought into contact with the surface of the copper-clad laminate for flexible wiring boards was produced. Next, the release film and the test piece were superimposed so that the first release surface of the first release layer in the release film and the side having the cover layer on one side of the test piece faced each other, and then 180 ° A hot-pressing treatment was performed for 2 minutes at a temperature of 6 ° C and a molded article. With regard to the molded article thus obtained, the adhesive applied to the surface of the cover tape was observed to extrude from the outer edge portion of the opening portion to the shape formed in the opening portion of the cover layer (adhesive oozing shape), and evaluated based on the following criteria The finished appearance of the molded product. (Circle): The unevenness | corrugation difference of the adhesive exudation shape is less than 100 micrometers. ×: The unevenness of the adhesive exudation shape is 100 μm or more.

‧成型品的成品外觀2(皺紋):製作了以使Arisawa Mfg. Co., Ltd.製的覆蓋層(CM類型)的塗佈有黏著劑之一側的面與柔性配線板用包銅層板的表面接觸之方式臨時固定有上述覆蓋層之試驗片。接著,以脫模薄膜中的第1脫模層的第1脫模面與具有上述試驗片的覆蓋層之一側的面對置之方式疊加上述脫模薄膜與上述試驗片之後,於180℃、6MPa的條件下實施2分鐘熱壓處理,從而獲得了成型品。關於FPC的外觀,利用基於JPCA規格“7.5.7.2項皺紋”之方法測定了每單位面積的皺紋產生率。關於所獲得之測定值,藉由以下基準進行了評價。 ○:皺紋產生率小於1.5%。 ×:皺紋產生率為1.5%以上。‧Finished Product Appearance 2 (Wrinkles): A side of the cover (CM type) made of Arisawa Mfg. Co., Ltd. coated with an adhesive and a copper-clad layer for a flexible wiring board were prepared. The test piece with the above-mentioned cover layer was temporarily fixed in a manner that the surface of the board was in contact. Next, the release film and the test piece were superimposed so that the first release surface of the first release layer in the release film and the surface having one side of the cover layer of the test piece faced each other, and then the temperature was 180 ° C. The molded product was obtained by performing hot-pressing treatment at a pressure of 6 MPa for 2 minutes. Regarding the appearance of the FPC, the wrinkle generation rate per unit area was measured by a method based on the JPCA standard "7.5.7.2 Wrinkles". The obtained measured values were evaluated based on the following criteria. (Circle): Wrinkle generation rate is less than 1.5%. ×: Wrinkle generation rate was 1.5% or more.

‧空隙的有無:首先,對柔性配線板用包銅層板的兩面的銅箔進行蝕刻,製作了3cm四方的開口部。接著,使Arisawa Mfg. Co., Ltd.社製的覆蓋層(CM類型)的塗佈有黏著劑之一側的面與形成於上述柔性配線板用包銅層板之開口部貼合,在其上以脫模薄膜的第1脫模層的第1脫模面成為覆蓋層側之方式重疊,於180℃、6MPa的條件下進行了2分鐘熱壓處理。之後,將脫模薄膜進行了剝離。在這樣獲得之成型品中,觀察從覆蓋帶的表面進入到柔性配線板用包銅層板中形成之開口部內之黏著劑中是否產生空隙,對空隙的有無進行了評價。‧Presence or absence of voids: First, copper foils on both sides of the copper-clad laminate for flexible wiring boards were etched to produce 3 cm square openings. Next, the surface of one side of the covering layer (CM type) coated with an adhesive manufactured by Arisawa Mfg. Co., Ltd. was bonded to the opening portion formed in the copper-clad laminate for flexible wiring boards, and It overlapped so that the 1st release surface of the 1st release layer of the release film may become a cover layer side, and performed the heat-pressing process at 180 degreeC and 6 MPa for 2 minutes. After that, the release film was peeled. In the thus-obtained molded article, it was observed whether voids were generated in the adhesive which entered from the surface of the cover tape into the opening formed in the copper-clad laminate for flexible wiring boards, and the presence or absence of voids was evaluated.

【表1】 【Table 1】

由上述表1亦可知,實施例A-1~A-4的脫模薄膜均係兩面脫模性均優異者。並且,確認到使用實施例A-1~A-4的脫模薄膜製作之成型品均係良好的成品外觀。It can also be seen from the above Table 1 that all of the release films of Examples A-1 to A-4 are excellent in release properties on both sides. In addition, it was confirmed that the molded articles produced using the release films of Examples A-1 to A-4 all had good finished product appearances.

[實施例B] <實施例B-1> 使用包含聚甲基戊烯樹脂(TPX(註冊商標))(Mitsui Chemicals, Inc.製,TPXD X845)及作為交聯有機樹脂粒子之丙烯酸珠(SEKISUI PLASTICS CO.,Ltd.製,M BX-30)之熱塑性樹脂材料,利用擠製T模法製作TPX薄膜來獲得了第1脫模層。在此,製作第1脫模層時所使用之丙烯酸珠的平均粒徑d50為28.5μm。並且,製作上述脫模層時所使用之上述熱塑性樹脂材料使用了以上述丙烯酸珠的含量相對於第1脫模層總量成為4重量%之方式與上述TPX配合而成者。 接著,利用擠製T模法依次積層藉由上述方法獲得之第1脫模層、包含上述TPX、聚丙烯(SUN AROMA CO., LTD.製,PB270A)及改性聚乙烯(乙烯-甲基丙烯酸甲酯共聚物、Sumitomo Chemical Company, Limited製,WH102)之緩衝層(配合比率:TPX:聚丙烯:乙烯-甲基丙烯酸甲酯共聚物=25:50:25)、及包含上述TPX之第2脫模層,從而獲得了實施例B-1的脫模薄膜。所獲得之脫模薄膜係具有上述第1脫模層、上述緩衝層、上述第2脫模層沿厚度方向依次積層而成之3層結構者。並且,所獲得之脫模薄膜的厚度為120μm。而且,在所獲得之脫模薄膜中,上述第1脫模層與上述第2脫模層的厚度分別為30μm,上述緩衝層的厚度為60 μm。[Example B] <Example B-1> Acrylic beads (SEKISUI) containing polymethylpentene resin (TPX (registered trademark)) (manufactured by Mitsui Chemicals, Inc., TPXD X845) and crosslinked organic resin particles were used. A thermoplastic resin material (M BX-30) manufactured by PLASTICS CO., Ltd. was used to produce a TPX film by an extrusion T-die method to obtain a first release layer. Here, the average particle diameter d50 of the acrylic beads used when producing the first release layer was 28.5 μm. In addition, the thermoplastic resin material used in the production of the release layer was prepared by blending the content of the acrylic beads with the TPX so that the content of the acrylic beads becomes 4% by weight based on the total amount of the first release layer. Next, the first release layer obtained by the above method, including the above-mentioned TPX, polypropylene (PB270A made by SUN AROMA CO., LTD.), And modified polyethylene (ethylene-methyl Methyl acrylate copolymer, Sumitomo Chemical Company, Limited, WH102) buffer layer (combination ratio: TPX: polypropylene: ethylene-methyl methacrylate copolymer = 25:50:25), and 2 release layer, thereby obtaining a release film of Example B-1. The obtained release film has a three-layer structure in which the first release layer, the buffer layer, and the second release layer are sequentially laminated in the thickness direction. The thickness of the obtained release film was 120 μm. In the obtained release film, the thickness of the first release layer and the second release layer were 30 μm, and the thickness of the buffer layer was 60 μm.

<實施例B-2> 使用以丙烯酸珠的含量相對於第1脫模層總量成為10重量%之方式與上述TPX配合而成之熱塑性樹脂材料製作了脫模層,除了這一點以外,以與實施例B-1相同的方法獲得了實施例B-2的脫模薄膜。<Example B-2> A mold release layer was prepared using a thermoplastic resin material that was blended with the TPX so that the content of the acrylic beads was 10% by weight based on the total amount of the first mold release layer. The release film of Example B-2 was obtained in the same manner as in Example B-1.

<實施例B-3> 作為交聯有機樹脂粒子亦即丙烯酸珠使用了平均粒徑d50為20.9μm之SEKIS UI PLASTICS CO., Ltd.製的MBX-20,除了這一點以外,以與實施例B-1相同的方法獲得了實施例B-3的脫模薄膜。<Example B-3> Except for this point, MBX-20 manufactured by SEKIS UI PLASTICS CO., Ltd. having an average particle diameter d50 of 20.9 μm was used as acrylic beads that are crosslinked organic resin particles. The release film of Example B-3 was obtained in the same manner as in B-1.

<實施例B-4> 作為交聯有機樹脂粒子亦即丙烯酸珠使用了平均粒徑d50為50.9μm之SEKIS UI PLASTICS CO., Ltd.製的MBX-50這一點、使用丙烯酸珠的含量相對於第1脫模層總量成為10重量%之方式與上述TPX配合而成之熱塑性樹脂材料製作了脫模層這一點,除了上述點以外,以與實施例B-1相同的方法獲得了實施例B-4的脫模薄膜。<Example B-4> As the crosslinked organic resin particles, that is, acrylic beads, MBX-50 manufactured by SEKIS UI PLASTICS CO., Ltd. with an average particle diameter d50 of 50.9 μm was used. A thermoplastic resin material prepared by blending the first release layer with a total amount of 10% by weight with the above-mentioned TPX was used to prepare a release layer. Except for the above points, Examples were obtained in the same manner as in Example B-1. B-4 release film.

<比較例B-1> 使用不含有丙烯酸珠之包含上述TPX之熱塑性樹脂材料製作了第1脫模層,除了這一點以外,以與實施例B-1相同的方法獲得了比較例B-1的脫模薄膜。<Comparative Example B-1> A Comparative Example B-1 was obtained in the same manner as in Example B-1 except that the first release layer was produced using a thermoplastic resin material containing the TPX without acrylic beads. Release film.

<比較例B-2> 作為丙烯酸珠使用了平均粒徑d50為61.2μm之TOYOBO CO., LTD.製的AR 650MZ這一點、使用以丙烯酸珠的含量相對於第1脫模層總量成為15重量%之方式與上述TPX配合而成之熱塑性樹脂材料製作了脫模層這一點,除了上述點以外,以與實施例B-1相同的方法獲得了比較例B-2的脫模薄膜。<Comparative Example B-2> As acrylic beads, AR 650MZ manufactured by TOYOBO CO., LTD. With an average particle diameter d50 of 61.2 μm was used. The content of acrylic beads was 15 relative to the total amount of the first release layer. The thermoplastic resin material compounded with the above TPX in a weight percent manner was used to prepare a release layer. Except for the foregoing, a release film of Comparative Example B-2 was obtained in the same manner as in Example B-1.

<比較例B-3> 作為丙烯酸珠使用了平均粒徑d50為10.2μm之SEKISUI PLASTICS CO., Ltd.製的SSX-110這一點、以第1脫模層與第2脫模層的厚度分別成為25μm且緩衝層的厚度成為70μm之方式製作了脫模薄膜這一點,除了上述點以外,以與實施例B-1相同的方法獲得了比較例B-3的脫模薄膜。<Comparative Example B-3> As the acrylic beads, SSX-110 manufactured by SEKISUI PLASTICS CO., Ltd. having an average particle diameter d50 of 10.2 μm was used. The thicknesses of the first release layer and the second release layer were respectively A release film was produced in such a manner that the thickness was 25 μm and the thickness of the buffer layer was 70 μm. Except for the above, a release film of Comparative Example B-3 was obtained in the same manner as in Example B-1.

使用實施例B-1~B-4及比較例B-1~B-3的各脫模薄膜進行了以下評價。將結果示於表2。The following evaluations were performed using each of the release films of Examples B-1 to B-4 and Comparative Examples B-1 to B-3. The results are shown in Table 2.

<評價方法> ‧球狀粒子(丙烯酸珠)的平均粒徑d50:使用雷射衍射式粒度分析儀(Malvern公司製,Mastersizer2000),依據溶劑使用水並使粒子分散來進行了粒度測定而得之結果,計算累積頻率達到50%之粒徑的值作為平均粒徑d50。另外,單位為μm。<Evaluation method> ‧ Average particle diameter d50 of spherical particles (acrylic beads): Obtained by using a laser diffraction particle size analyzer (manufactured by Malvern, Mastersizer 2000) to measure particle size by using water as a solvent and dispersing the particles. As a result, the value of the particle diameter with a cumulative frequency of 50% was calculated as the average particle diameter d50. The unit is μm.

‧第1脫模層的脫模面的表面10點平均粗糙度(Rz):關於所獲得之脫模薄膜中的第1脫模層的脫模面的表面,依照JIS B0601(1994年),使用“TOKYO SEIMITS U CO., LTD.製的Handy Surf E-35B”,對中央n=3進行了測定。另外,單位為μm。‧ 10-point average roughness (Rz) on the surface of the release surface of the first release layer: Regarding the surface of the release surface of the first release layer in the obtained release film, in accordance with JIS B0601 (1994), The center n = 3 was measured using "Handy Surf E-35B manufactured by TOKYO SEIMITS U CO., LTD." The unit is μm.

‧脫模性:首先,製作了Arisawa Mfg. Co., Ltd.製的覆蓋層(CM類型)的塗佈有黏著劑之一側的面與電路露出薄膜的表面接觸之方式臨時固定有上述覆蓋層之試驗薄膜。接著,作為試驗片獲得了以脫模薄膜中的第1脫模層的脫模面與上述試驗薄膜的具有覆蓋層之一側的面對置之方式將彼此貼合而成者。接著,關於該試驗片,於195℃、6MPa的條件下實施了2分鐘的熱壓處理之後,使用拉伸試驗機(A&D Company, Limited製Force gauge AD-4932A-50N),以在180°方向上約1000mm/分鐘的速度,測定了上述脫模薄膜的第1脫模層的脫模面與上述試驗薄膜的覆蓋層之間的剝離強度。在上述熱壓處理之後立即實施剝離強度的測定, 並依據以下的基準評價了脫模性。 ◎:剝離強度為1N/50mm以下。 ○:剝離強度大於1N/50mm且為3N/50mm以下。 ×:剝離強度表示大於3N/50mm的值、或者不易剝離而形成試驗片之任一薄膜破裂。‧Releasability: First, the surface of one side of the coating layer (CM type) made by Arisawa Mfg. Co., Ltd. on which the adhesive was applied was temporarily fixed to the surface of the circuit exposed film so that the cover was fixed Layer of test film. Next, a test piece was obtained in which the release surface of the first release layer in the release film and the surface of the test film having one side of the cover layer were placed facing each other. Next, this test piece was subjected to a hot-pressing treatment at 195 ° C and 6 MPa for 2 minutes, and then a tensile tester (Force gauge AD-4932A-50N manufactured by A & D Company, Limited) was used so that the test piece was 180 ° The peel strength between the release surface of the first release layer of the release film and the cover layer of the test film was measured at a speed of about 1,000 mm / minute. The measurement of peel strength was performed immediately after the hot-pressing treatment, and the releasability was evaluated based on the following criteria. :: Peel strength is 1 N / 50 mm or less. (Circle): Peeling strength is more than 1N / 50mm and 3N / 50mm or less. ×: Peeling strength indicates a value greater than 3N / 50 mm, or any film that does not easily peel off and forms a test piece is cracked.

‧成型品的成品外觀1(黏著劑滲出形狀):首先,在Arisawa Mfg. Co., Ltd.製的覆蓋層(CM類型)製作了1mm四方的開口部。接著,製作了以使塗佈有黏著劑之一側的面與柔性配線板用包銅層板的表面接觸之方式臨時固定有具有上述開口部之覆蓋層之試驗片。接著,以脫模薄膜中的第1脫模層的脫模面與具有上述試驗片的覆蓋層之一側的面對置之方式,疊加上述脫模薄膜與上述試驗片之後, 於195℃、6MPa的條件下實施2分鐘熱壓處理,獲得了成型品。關於這樣獲得之成型品,觀察塗佈於該覆蓋帶的表面之黏著劑從上述開口部的外緣部滲出至形成於覆蓋層之開口部內之形狀(黏著劑滲出形狀),並依據以下基準評價了成型品的成品外觀。 ○:黏著劑滲出形狀的凹凸差小於100μm。 ×:黏著劑滲出形狀的凹凸差為100μm以上。‧Finished product appearance 1 (adhesive exudation shape): First, a 1 mm square opening was made in a cover layer (CM type) made by Arisawa Mfg. Co., Ltd. Next, a test piece in which a cover layer having the above-mentioned opening portion was temporarily fixed so that the surface on one side to which the adhesive was applied was brought into contact with the surface of the copper-clad laminate for flexible wiring boards was produced. Next, the release film and the test piece were superimposed so that the release surface of the first release layer in the release film and the surface having one side of the cover layer of the test piece were superposed, and then the temperature was 195 ° C, A hot-pressing treatment was performed at 6 MPa for 2 minutes to obtain a molded product. With regard to the molded article thus obtained, the adhesive applied to the surface of the cover tape was observed to extrude from the outer edge portion of the opening portion to the shape formed in the opening portion of the cover layer (adhesive oozing shape), and evaluated based on the following criteria The finished appearance of the molded product. (Circle): The unevenness | corrugation difference of the adhesive exudation shape is less than 100 micrometers. ×: The unevenness of the adhesive exudation shape is 100 μm or more.

‧成型品的成品外觀2(皺紋):製作了以使Arisawa Mfg. Co., Ltd.製的覆蓋層(CM類型)的塗佈有黏著劑之一側的面與柔性配線板用包銅層板的表面接觸之方式臨時固定有上述覆蓋層之試驗片。接著,以脫模薄膜中的第1脫模層的脫模面與具有上述試驗片的覆蓋層之一側的面對置之方式疊加上述脫模薄膜與上述試驗片之後,於195℃、6MPa的條件下實施2分鐘熱壓處理,從而獲得了成型品。關於FPC的外觀,利用基於JPCA規格“7.5.7.2項皺紋”之方法測定了每單位面積的皺紋產生率。關於所獲得之測定值,藉由以下基準進行了評價。 ○:皺紋產生率小於1.5%。 ×:皺紋產生率為1.5%以上。‧Finished Product Appearance 2 (Wrinkles): A side of the cover (CM type) made of Arisawa Mfg. Co., Ltd. coated with an adhesive and a copper-clad layer for a flexible wiring board were prepared. The test piece with the above-mentioned cover layer was temporarily fixed in a manner that the surface of the board was in contact. Next, the release film and the test piece were superimposed so that the release surface of the first release layer in the release film and the surface having one side of the cover layer of the test piece faced each other, and then the temperature was 195 ° C and 6 MPa. The molded product was obtained by performing a hot-pressing treatment under the conditions of 2 minutes. Regarding the appearance of the FPC, the wrinkle generation rate per unit area was measured by a method based on the JPCA standard "7.5.7.2 Wrinkles". The obtained measured values were evaluated based on the following criteria. (Circle): Wrinkle generation rate is less than 1.5%. ×: Wrinkle generation rate was 1.5% or more.

‧空隙的有無:首先,對柔性配線板用包銅層板的兩面的銅箔進行蝕刻,製作了3cm四方的開口部。接著,使Arisawa Mfg. Co., Ltd.社製的覆蓋層(CM類型)的塗佈有黏著劑之一側的面與形成於上述柔性配線板用包銅層板之開口部貼合,在其上以脫模薄膜的第1脫模層的脫模面成為覆蓋層側之方式重疊,於195℃、6MPa的條件下進行了2分鐘熱壓處理。之後,將脫模薄膜進行了剝離。在這樣獲得之成型品中,觀察從覆蓋帶的表面進入到柔性配線板用包銅層板中形成之開口部內之黏著劑中是否產生空隙,對空隙的有無進行了評價。‧Presence or absence of voids: First, copper foils on both sides of the copper-clad laminate for flexible wiring boards were etched to produce 3 cm square openings. Next, the surface of one side of the covering layer (CM type) coated with an adhesive manufactured by Arisawa Mfg. Co., Ltd. was bonded to the opening portion formed in the copper-clad laminate for flexible wiring boards, and It was superimposed so that the release surface of the 1st release layer of a release film might be a cover layer side, and it heat-processed at 195 degreeC and 6 MPa for 2 minutes. After that, the release film was peeled. In the thus-obtained molded article, it was observed whether voids were generated in the adhesive which entered from the surface of the cover tape into the opening formed in the copper-clad laminate for flexible wiring boards, and the presence or absence of voids was evaluated.

【表2】 【Table 2】

由上述表2亦可知,實施例的脫模薄膜均係脫模性優異者。並且,確認到使用實施例B的脫模薄膜製作之成型品均係良好的成品外觀。As can also be seen from Table 2 above, all of the release films of the examples are those having excellent release properties. In addition, it was confirmed that the molded articles produced using the release film of Example B all had good finished product appearance.

本申請主張基於2016年3月30日於日本申請之特願2016-068457號及2016年8月1日於日本申請之特願2016-151462號的優先權,其公開之全部內容併入於此。This application claims the priority based on Japanese Patent Application No. 2016-068457 filed on March 30, 2016 and Japanese Patent Application No. 2016-151462 filed on August 1, 2016, the entire contents of which are incorporated herein .

1‧‧‧第1脫模層
2‧‧‧緩衝層
3‧‧‧第2脫模層
10‧‧‧脫模薄膜
20‧‧‧脫模薄膜
21‧‧‧第1脫模層
22‧‧‧緩衝層
23‧‧‧第2脫模層
1‧‧‧ the first release layer
2‧‧‧ buffer layer
3‧‧‧ 2nd release layer
10‧‧‧ release film
20‧‧‧ release film
21‧‧‧The first release layer
22‧‧‧ buffer layer
23‧‧‧The second release layer

上述目的及其他目的、特徵及優點,藉由以下所述之較佳的實施形態及與其關聯之以下圖式而變得更加明確。The above-mentioned objects and other objects, features, and advantages will be made clearer by the preferred embodiments described below and the following drawings associated therewith.

【圖1】係第1實施形態之脫模薄膜的剖面圖。 【圖2】係第2實施形態之脫模薄膜的剖面圖。Fig. 1 is a sectional view of a release film according to a first embodiment. Fig. 2 is a sectional view of a release film according to a second embodiment.

1‧‧‧第1脫模層 1‧‧‧ the first release layer

2‧‧‧緩衝層 2‧‧‧ buffer layer

3‧‧‧第2脫模層 3‧‧‧ 2nd release layer

10‧‧‧脫模薄膜 10‧‧‧ release film

Claims (17)

一種脫模薄膜,其具有積層結構,該積層結構係包含第1熱塑性樹脂材料之第1脫模層、緩衝層、包含第2熱塑性樹脂材料之第2脫模層依次沿厚度方向積層而成,其中 該第1脫模層配置於該脫模薄膜的一面, 該第2脫模層配置於該脫模薄膜的另一面, 該緩衝層的厚度為10μm以上200μm以下, 在將該脫模薄膜的總厚度設為X,將該緩衝層的厚度設為Y時,Y/X大於0.2小於0.9, 該第1熱塑性樹脂材料和該第2熱塑性樹脂材料均係包含熱塑性樹脂及平均粒徑d50為4μm以上60μm以下之粒子者, 該粒子的含量相對於該第1脫模層總量為0.5重量%以上15重量%以下,並且該粒子的含量相對於該第2脫模層總量為0.5重量%以上15重量%以下。A release film having a laminated structure. The laminated structure includes a first release layer including a first thermoplastic resin material, a buffer layer, and a second release layer including a second thermoplastic resin material. The first release layer is disposed on one side of the release film, the second release layer is disposed on the other side of the release film, and the thickness of the buffer layer is 10 μm or more and 200 μm or less. When the total thickness is set to X, and the thickness of the buffer layer is set to Y, Y / X is greater than 0.2 and less than 0.9. The first thermoplastic resin material and the second thermoplastic resin material both contain a thermoplastic resin and have an average particle diameter d50 of 4 μm. For particles of 60 μm or less, the content of the particles is 0.5% by weight or more and 15% by weight or less relative to the total amount of the first release layer, and the content of the particles is 0.5% by weight or more relative to the total amount of the second release layer. Above 15% by weight. 如申請專利範圍第1項所述之脫模薄膜,其中在將該第1脫模層的脫模面的表面10點平均粗糙度Rz設為A,將該第2脫模層的脫模面的表面10點平均粗糙度Rz設為B時,A-B的絕對值為20以下。The release film according to item 1 of the scope of patent application, wherein the 10-point average roughness Rz on the surface of the release surface of the first release layer is set to A, and the release surface of the second release layer is When the 10-point average roughness Rz of the surface is set to B, the absolute value of AB is 20 or less. 如申請專利範圍第1或2項所述之脫模薄膜,其中該第1脫模層的脫模面的表面10點平均粗糙度Rz為0.5μm以上25μm以下。The release film according to item 1 or 2 of the scope of patent application, wherein the 10-point average roughness Rz of the surface of the release surface of the first release layer is 0.5 μm or more and 25 μm or less. 如申請專利範圍第1或2項所述之脫模薄膜,其中該第2脫模層的脫模面的表面10點平均粗糙度Rz為0.5μm以上25μm以下。The release film according to item 1 or 2 of the scope of patent application, wherein the 10-point average roughness Rz of the surface of the release surface of the second release layer is 0.5 μm or more and 25 μm or less. 一種脫模薄膜,其於至少一面具有由第1熱塑性樹脂材料形成之第1脫模層,其中 該第1熱塑性樹脂材料包含熱塑性樹脂和粒子, 該粒子的平均粒徑d50為20μm以上60μm以下, 該球狀粒子的含量相對於該脫模層總量為0.5重量%以上15重量%以下。A release film having a first release layer formed of a first thermoplastic resin material on at least one side, wherein the first thermoplastic resin material includes a thermoplastic resin and particles, and an average particle diameter d50 of the particles is 20 μm or more and 60 μm or less, The content of the spherical particles is 0.5% by weight or more and 15% by weight or less based on the total amount of the release layer. 如申請專利範圍第5項所述之脫模薄膜,其中該第1脫模層的脫模面的表面10點平均粗糙度Rz為4μm以上20μm以下。The release film according to item 5 of the scope of patent application, wherein the 10-point average roughness Rz of the surface of the release surface of the first release layer is 4 μm or more and 20 μm or less. 如申請專利範圍第5或6項所述之脫模薄膜,其中該脫模薄膜的厚度為50μm以上150μm以下。The release film according to item 5 or 6 of the scope of application for a patent, wherein the thickness of the release film is 50 μm or more and 150 μm or less. 如申請專利範圍第5項所述之脫模薄膜,其中 該脫模薄膜還具有: 緩衝層;及 第2脫模層, 該第1脫模層、該緩衝層及該第2脫模層依次沿厚度方向積層。The release film according to item 5 of the scope of the patent application, wherein the release film further includes: a buffer layer; and a second release layer, the first release layer, the buffer layer, and the second release layer in this order Laminate in the thickness direction. 如申請專利範圍第1或5項所述之脫模薄膜,其中該熱塑性樹脂包含選自於由聚-4-甲基-1-戊烯樹脂、聚對苯二甲酸丁二酯樹脂、間規聚苯乙烯樹脂及聚丙烯樹脂構成之組群中的1種以上。The release film according to item 1 or 5 of the scope of the patent application, wherein the thermoplastic resin comprises a resin selected from the group consisting of poly-4-methyl-1-pentene resin, polybutylene terephthalate resin, syndiotactic One or more of the group consisting of a polystyrene resin and a polypropylene resin. 如申請專利範圍第1或5項所述之脫模薄膜,其中該粒子係有機樹脂粒子。The release film according to item 1 or 5 of the patent application scope, wherein the particles are organic resin particles. 如申請專利範圍第1或5項所述之脫模薄膜,其中該粒子係交聯有機樹脂粒子。The release film according to item 1 or 5 of the scope of patent application, wherein the particles are crosslinked organic resin particles. 如申請專利範圍第1或5項所述之脫模薄膜,其中該粒子包含選自於由聚苯乙烯粒子、丙烯酸粒子、聚醯亞胺粒子、聚酯粒子、聚矽氧粒子、聚丙烯粒子、聚乙烯粒子、氟樹脂粒子及核殼粒子構成之群組中的1種或2種以上的粒子。The release film according to item 1 or 5 of the scope of patent application, wherein the particles comprise a particle selected from the group consisting of polystyrene particles, acrylic particles, polyimide particles, polyester particles, polysiloxane particles, and polypropylene particles. One or two or more particles in the group consisting of polyethylene particles, fluororesin particles, and core-shell particles. 如申請專利範圍第1或8項之脫模薄膜,其中該緩衝層的厚度為10μm以上180μm以下,該脫模薄膜的厚度為50μm以上200μm以下。For example, the release film of item 1 or 8 of the patent application scope, wherein the thickness of the buffer layer is 10 μm to 180 μm, and the thickness of the release film is 50 μm to 200 μm. 一種成型品之製造方法,其包括: 以如申請專利範圍第1至4及8項中任一項之脫模薄膜的該第1脫模層成為對象物側之方式,於該對象物上配置該脫模薄膜之製程;及 對配置有該脫模薄膜之該對象物進行熱壓之製程, 在配置該脫模薄膜之該製程中,該對象物的配置有該脫模薄膜之面由包含熱硬化性樹脂之材料形成。A method for manufacturing a molded article, comprising: arranging on the object such that the first release layer of the release film according to any one of claims 1 to 4 and 8 is applied to the object side; A process of the release film; and a process of hot pressing the object on which the release film is disposed, in the process of disposing the release film, the surface of the object on which the release film is disposed is comprised of Made of a thermosetting resin. 如申請專利範圍第14項之成型品之製造方法,其還包括在進行該熱壓之該製程之前,於與該脫模薄膜的第1脫模層相反側的面上配置材料之製程。For example, the method for manufacturing a molded article under the scope of application for a patent No. 14 further includes a process of arranging a material on a surface opposite to the first release layer of the release film before the hot pressing process. 如申請專利範圍第14或15項之成型品之製造方法,其中該熱硬化性樹脂為半硬化狀態。For example, the method for manufacturing a molded article under the scope of claims 14 or 15, wherein the thermosetting resin is in a semi-hardened state. 一種脫模薄膜的使用,其包括: 以如申請專利範圍第1至4及8項中任一項之脫模薄膜的該第1脫模層成為對象物側之方式,於該對象物上配置該脫模薄膜之製程;及 對配置有該脫模薄膜之該對象物進行熱壓之製程, 並且用於在該熱壓後獲得成型品。Use of a release film, comprising: disposing on the object such that the first release layer of the release film according to any one of claims 1 to 4 and 8 becomes the object side A process of the release film; and a process of hot pressing the object on which the release film is arranged, and used to obtain a molded product after the hot pressing.
TW106109049A 2016-03-30 2017-03-20 Release film and method for manufacturing molded article TWI781093B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2016-068457 2016-03-30
JP2016068457 2016-03-30
JP2016-151462 2016-08-01
JP2016151462 2016-08-01

Publications (2)

Publication Number Publication Date
TW201806741A true TW201806741A (en) 2018-03-01
TWI781093B TWI781093B (en) 2022-10-21

Family

ID=59963064

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106109049A TWI781093B (en) 2016-03-30 2017-03-20 Release film and method for manufacturing molded article

Country Status (3)

Country Link
JP (1) JP6299933B2 (en)
TW (1) TWI781093B (en)
WO (1) WO2017169654A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113677494A (en) * 2019-03-20 2021-11-19 小林股份有限公司 Mold and release film combination, release film, mold, and molded body manufacturing method
TWI784191B (en) * 2018-08-24 2022-11-21 日商住友電木股份有限公司 Release film and method for manufacturing molded article

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7277092B2 (en) * 2017-08-31 2023-05-18 積水化学工業株式会社 release film
JP7243258B2 (en) * 2019-02-14 2023-03-22 住友ベークライト株式会社 release film
JP7298194B2 (en) * 2019-03-04 2023-06-27 住友ベークライト株式会社 Method for manufacturing release film and molded product
JP7331662B2 (en) * 2019-11-27 2023-08-23 住友電装株式会社 sensor device
JP7283639B2 (en) * 2020-08-12 2023-05-30 住友ベークライト株式会社 Method for manufacturing release film and molded product

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07199700A (en) * 1993-12-28 1995-08-04 Canon Inc Heat resistant film for heater and heater
JPH09227241A (en) * 1996-02-28 1997-09-02 Shin Etsu Chem Co Ltd Releasing sheet
JP2003001772A (en) * 2001-06-26 2003-01-08 Mitsui Chemicals Inc 4-methyl-1-pentene copolymer multilayerd film
JP4183558B2 (en) * 2003-05-26 2008-11-19 ヤマウチ株式会社 Heat press sheet
JP2006175637A (en) * 2004-12-21 2006-07-06 Mitsubishi Polyester Film Copp Mold release polyester film for hot press molding
JP5644791B2 (en) * 2011-10-31 2014-12-24 住友ベークライト株式会社 Release film
JP2013136208A (en) * 2011-12-28 2013-07-11 Teijin Dupont Films Japan Ltd Mold release film
JP2014151448A (en) * 2013-02-05 2014-08-25 Daicel Corp Method for producing release film and fiber-reinforced plastic
JP6520055B2 (en) * 2014-11-06 2019-05-29 日立化成株式会社 Semiconductor compression molding release sheet and semiconductor package molded using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI784191B (en) * 2018-08-24 2022-11-21 日商住友電木股份有限公司 Release film and method for manufacturing molded article
CN113677494A (en) * 2019-03-20 2021-11-19 小林股份有限公司 Mold and release film combination, release film, mold, and molded body manufacturing method

Also Published As

Publication number Publication date
JPWO2017169654A1 (en) 2018-04-05
JP6299933B2 (en) 2018-03-28
WO2017169654A1 (en) 2017-10-05
TWI781093B (en) 2022-10-21

Similar Documents

Publication Publication Date Title
TWI781093B (en) Release film and method for manufacturing molded article
JP6447216B2 (en) Release film and method for producing molded product
JP6575123B2 (en) Release film and method for producing molded product
JP5245497B2 (en) Release film
JP6500418B2 (en) Release film
KR20060029155A (en) Mold release film and process for producing flexible printed wiring board therewith
JP2006148081A (en) Mold release film and method of manufacturing circuit board
TW201434609A (en) Release film
JP2016168688A (en) Release film
TWI784191B (en) Release film and method for manufacturing molded article
JP5353217B2 (en) Release film, adhesion method using the same, and circuit board manufacturing method
WO2022091950A1 (en) Release film and method for manufacturing molded product
JP7298194B2 (en) Method for manufacturing release film and molded product
WO2022085363A1 (en) Mold release film and method for manufacturing molded product
CN116133848B (en) Mold release film and method for producing molded article
JP7243258B2 (en) release film
TW202043025A (en) Release film for production process of printed circuit board, production process of printed board, apparatus for producing printed board, and printed board
WO2022260003A1 (en) Release film and method for manufacturing molded product
CN114080866B (en) Release film and method for producing molded article
JP6870774B1 (en) Manufacturing method of release film and molded product
CN113924825A (en) Release film and method for producing molded article
KR20140004948A (en) Integrated release film for flexible printed circuit board process and manufacturing method thereof

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent