TW201743140A - Charged particle beam rendering device, charged particle beam rendering system, and rendering data generating method - Google Patents

Abstract

[Problem] To facilitate management of rendering data which was subjected to correction processing. [Solution] A charged particle beam rendering device 1 is provided with the following: a beam generating unit 7 that generates a charged particle beam; an aperture unit 16 that includes a plurality of openings and that allows a charged particle beam to pass through the openings thereby generating a multi-beam which includes a plurality of micro-beams; a projection system 4 that projects, in a reduced manner, the multi-beam onto a rendering subject; a blanking unit 17 that is interposed between the aperture unit and the projection unit and that carries out control so as to direct the plurality of micro-beams towards the projection system or a direction different from that of the projection system; a control unit 41 that controls the beam generating unit, the projection system, and the blanking unit; an acquisition unit 42 that acquires first rendering data of a vector format for performing rendering on the rendering subject; a first image conversion unit 43 that converts the first rendering data to second rendering data of a raster format; an image correction unit 44 that corrects the second rendering data in pixel units to generate third rendering data of a raster format; a second image conversion unit 45 that converts the third rendering data to fourth rendering data of a vector format; and a first storage control unit 46 that carries out control for saving the fourth rendering data in a first rendering data storage unit 47.

Description

Charged particle beam drawing device, charged particle beam drawing system, and drawing data generating method

The present disclosure relates to a charged particle beam drawing device, a charged particle beam drawing system, and a drawing data generating method that are drawn by multiple beams.

In the manufacturing process of a semiconductor device, when a fine pattern is drawn on a mask or a wafer, a charged particle beam drawing device is used. Recently, a charged particle beam drawing device of a multi-beam type in which a plurality of fine patterns are drawn in order to perform high-speed drawing and simultaneously irradiate a plurality of electron beams has been attracting attention.

The charged particle beam drawing device is drawn based on drawing data (hereinafter referred to as original drawing material) generated by a layout design tool or the like. The charged particle beam drawing device generally converts the original drawing data in the form of a vector known by the names of GDS or OASIS into a line-by-line drawing material and temporarily stores it, and then saves it based on the preservation. The drawing data in the form of a line is drawn (refer to Japanese Laid-Open Patent Publication No. 2012-527765).

The charged particle beam drawing device performs drawing based on the line-by-line drawing data, and switches the irradiation and non-irradiation of the electron beam in units of pixels. However, the size of the fine pattern included in the original drawing data does not necessarily correspond to the pixel. The interval is the same, and the beam diameter of the electron beam is also inconsistent with the pixel width. Therefore, it is necessary to correct the line-by-line drawing data before drawing.

However, the data drawn on a line-by-line basis has a large amount of data. After the line-by-line drawing data is corrected in pixels, if you want to save and manage the drawing data, you must have a large-capacity recording device, and it will take a lot of time to save. time.

In order to verify whether there is a problem in the descriptive data after the correction process, the process of transferring the descriptive data to the design center may be performed. However, due to the large amount of data on the line-by-line format, the transmission will take a lot of time. As a result, there is a problem that the verification of the drawing data after the correction processing cannot be performed promptly.

The present invention has been made in order to solve the above problems, and an object of the invention is to provide a charged particle beam drawing device, a charged particle beam drawing system, and a drawing data generating method which facilitate drawing management data after management correction processing.

In order to solve the above problems, an aspect of the present disclosure provides a charged particle beam drawing device including: a beam generating unit generates a charged particle beam; and an aperture portion having a plurality of openings for passing the charged particle beam An opening to generate a multi-beam comprising a plurality of micro-beams; and a projection system that reduces and projects the multi-beam to a drawing object; and a masking portion that is interposed between the aperture portion and the projection system, and controls the plurality of microbeams toward the projection system, or toward the projection system And a control unit that controls the beam generating unit, the projection system, and the masking unit; and an acquisition unit that acquires a first drawing material in a vector form for drawing the object to be drawn; and the first The image conversion unit converts the first drawing material into a second drawing material in a raster form; and the image correcting unit corrects the second drawing material in units of pixels to generate a third drawing material on a line-by-line basis And the second image conversion unit converts the third drawing material into a fourth drawing data in a vector form; and the first memory control unit performs control for storing the fourth drawing data in the first drawing data storage unit; The control unit controls the beam generating unit, the projection system, and the masking unit based on the third drawing material, and draws a drawing pattern on the object to be drawn.

The second image conversion unit may include a binarization unit that generates binary data obtained by binarizing the third drawing material, and a contour extracting unit that extracts contours of the binary data. The fourth drawing material is generated.

The inspection unit may perform an appearance inspection of the drawing of the object to be drawn after the drawing of the object to be drawn, and determine whether there is a problem in appearance; and the first memory control unit is provided by the inspection unit. When it is determined that there is a problem, the fourth drawing material in the vicinity of the problem is read from the first drawing data storage unit, and the comparing means is to read the fourth drawing data read by the first memory control unit. The correction problem determination unit compares the result of the comparison by the comparison means, and determines whether the first image conversion unit converts the first drawing material into the second drawing data. . The third image data includes pixel values for each of the plurality of pixels, and the second image conversion unit includes an area dividing unit that performs area division, and the area division system includes the third drawing data. The adjacent pixel ranges having the same pixel value are integrated into one divided region; and the vector conversion unit generates the fourth drawing data obtained by vectorizing the divided regions obtained by dividing the region.

The third image data includes a pixel value for each of the plurality of pixels, and the second image conversion unit includes a stored dose distribution acquisition unit that performs the charged particle beam based on the third image data. Forward scattering and backscattering Simulating to obtain a stored dose distribution; and a stored dose converting unit that converts the accumulated dose distribution into vector data; and a vertex number deleting unit that cuts the number of vertices of the vector data converted by the accumulated dose converting unit And the fourth drawing material described above is generated.

The inspection unit may perform an appearance inspection of the drawing of the object to be drawn after the drawing of the object to be drawn, and determine whether there is a problem in appearance; and the first memory control unit is provided by the inspection unit. When it is determined that there is a problem, the fourth drawing material in the vicinity of the problem is read from the first drawing data storage unit, and the comparing means is to read the fourth drawing data read by the first memory control unit. The correction problem determination unit compares the result of the comparison by the comparison means, and determines whether the processing performed by the image correction unit that generates the third drawing data by correcting the second drawing data is problem.

The third image conversion unit may convert the fourth drawing material stored in the first drawing data storage unit into a fifth line-shaped drawing material on a line-by-line basis, and the control unit may use the fifth drawing data based on the fifth drawing data. The beam generating unit, the projection system, and the masking unit are controlled to draw a drawing pattern on the object to be drawn.

The image correcting unit may correct the second drawing resource The third drawing material is generated by including the pixel value of the pixel of the corner of the drawing included in the material.

The pixels superimposed on the drawing pattern may have a larger pixel value than a pixel that is not superimposed on the drawing pattern, and the image correcting unit may display the drawing pattern included in the second drawing material. The pixel value of the pixel of the corner is corrected to a larger value, and the third drawing material is generated.

The image correcting unit may correct the pixel value of the plurality of pixels located at the boundary line of the drawing pattern included in the second drawing material to generate the third drawing material.

The second memory control unit may be configured to store the first drawing data in the second drawing data storage unit.

According to another aspect of the present disclosure, a charged particle beam drawing system includes: a beam generating unit that generates a charged particle beam; and an aperture portion that has a plurality of openings that pass the charged particle beam through the openings Generating a plurality of beams including a plurality of microbeams; and a projection system for projecting and projecting the plurality of beams onto the object to be drawn; and a masking portion interposed between the aperture portion and the projection system to control the plurality of tracks The microbeam is directed toward the projection system or in a direction different from the projection system; and the control unit controls the beam generating unit, the projection system, and the masking unit; and the acquisition unit to obtain the object to be drawn Vector form of object depiction The first image data conversion unit converts the first image data into a second drawing data in a raster form, and the image correction unit corrects the second image data in units of pixels. Generating a third drawing data in a line-by-line format; and the second image converting unit converts the third drawing material into a fourth drawing data in a vector form; and the first drawing data storage unit stores the fourth drawing data; After the drawing of the object to be drawn, the inspection unit performs an appearance inspection of the drawing of the object to be drawn, and determines whether there is a problem in appearance; and the correction problem determination unit determines that there is a problem by the inspection unit. Then, it is judged whether or not there is a problem in the correction processing in the image correcting unit.

According to another aspect of the present disclosure, a charged particle beam drawing system includes: a beam generating unit that generates a charged particle beam; and an aperture portion that has a plurality of openings that pass the charged particle beam through the openings Generating a plurality of beams including a plurality of microbeams; and a projection system for projecting and projecting the plurality of beams onto the object to be drawn; and a masking portion interposed between the aperture portion and the projection system to control the plurality of tracks The microbeam is directed toward the projection system or in a direction different from the projection system; and the control unit controls the beam generating unit, the projection system, and the masking unit; and the acquisition unit to obtain the object to be drawn Vector form of object depiction And a first image conversion unit that converts the first drawing material into a second drawing material in a raster form; and an image correcting unit that performs the second drawing data in pixel units The correction processing generates a third drawing data in a line-by-line format; and the second image converting unit converts the third drawing material into a fourth drawing material in a vector form; and the first drawing data storage unit stores the fourth drawing And the control unit controls the beam generating unit, the projection system, and the masking unit based on the third drawing data, and draws a drawing pattern on the drawing object; and the inspection unit objects the object to be drawn After the drawing, the visual inspection of the drawing of the object to be drawn is performed to determine whether there is a problem in appearance; and when the first regenerating unit determines that there is a problem by the inspection unit, the fourth drawing material is given And generating, by the second regenerating unit, the third drawing material in a line-by-line format by using the fourth regenerated fourth drawing data; and the control unit is based on the regenerating In the third drawing data, the beam generating unit, the projection system, and the masking unit are controlled to re-render the drawing object, and the second image converting unit performs the third rendering of the re-generation. The data is further converted into the fourth drawing data, and the first drawing data storage unit stores the re-transformed 4 depict the information.

In one aspect of the present disclosure, a method for generating a drawing data is provided in a charged particle beam drawing device that performs drawing of an object to be drawn using a multi-beam including a plurality of micro-beams generated by a charged particle beam. The method for generating a drawing data to be used includes a step of acquiring a first drawing material in a vector form for drawing the drawing object, and a step of converting the first drawing material into a second drawing material in a line-by-line format; And a step of correcting the second drawing data in units of pixels to generate a third drawing data on a line-by-line basis; and converting the third drawing material into a fourth drawing data in a vector form; and storing the fourth drawing data The first step of depicting the data storage unit.

The step of converting the third drawing data into the fourth drawing data may be to binarize the third drawing data to generate a binary data, and extract the outline of the binary data to generate the fourth drawing material.

After drawing the object to be drawn, the visual inspection of the drawing of the object to be drawn may be performed to determine whether there is a problem in appearance. If the above problem is determined, the above-mentioned problem may be present. The fourth drawing data is read from the first drawing data storage unit. The fourth drawing data read as described above is compared with the first drawing data, and based on the result of the comparison, it is determined whether or not there is a problem in the process of converting the first drawing material into the second drawing material.

The third drawing data may include a pixel value for each of the plurality of pixels, and the step of converting the pixel image to the fourth image is to perform region division, wherein the region segmentation system has the same in the third drawing material. The pixel range adjacent to the pixel value is integrated into one divided region, and the fourth drawing material obtained by vectorizing the divided region divided by the region is generated.

The third drawing data may include a pixel value for each of the plurality of pixels, and based on the third drawing data, perform a rendering simulation in which forward scattering and backscattering of the charged particle beam are taken into consideration to obtain an accumulation. The dose distribution converts the accumulated dose distribution into vector data, and subtracts the number of vertices of the transformed vector data to generate the fourth rendering material.

After drawing the object to be drawn, the visual inspection of the drawing of the object to be drawn may be performed to determine whether there is a problem in appearance. If the above problem is determined, the above-mentioned problem may be present. First The drawing data is read from the first drawing data storage unit, and the read fourth drawing data is compared with the first drawing data, and based on the result of the comparison, it is determined that the second drawing material is corrected to generate the third item. Describe whether there is a problem with the processing of the data.

According to the present disclosure, it is easy to manage the drawing data after the correction processing, and it is possible to easily and quickly determine whether there is a problem in the data conversion or the correction processing from the vector form to the line-by-line format.

1‧‧‧Charged particle beam depicting device

2‧‧‧Lighting system

3‧‧‧Multibeam generation system

4‧‧‧Projection system

5‧‧‧ platform

6a‧‧‧1st electromagnetic lens

6b‧‧‧2nd electromagnetic lens

6c‧‧‧3rd electromagnetic lens

7‧‧‧Electronic gun

8‧‧‧Extraction system

9‧‧‧ illumination lens

9a‧‧‧Without deflector

10‧‧‧Aperture member

11‧‧‧1st deflector

12‧‧‧2nd deflector

13‧‧‧Drawing objects

16‧‧‧Aperture plate

17‧‧‧ Covering board

18‧‧‧Ground electrode

19‧‧‧ deflection electrode

40‧‧‧Drawing a pattern

41‧‧‧Control Department

42‧‧‧Acquisition Department

43‧‧‧1st image conversion unit

44‧‧‧Image Correction Department

45‧‧‧2nd image conversion unit

47‧‧‧1st depicting the data memory department

49‧‧‧2nd depicting the data memory department

50‧‧‧Inspection Department

51‧‧‧Revised Problem Determination Department

52‧‧‧3rd image conversion unit

53‧‧‧1st Regeneration Department

54‧‧‧2nd Regeneration Department

Fig. 1 is a schematic view showing the configuration of a charged particle beam drawing device according to an embodiment.

FIG. 2 is a schematic diagram showing an example of a specific configuration of a multibeam generation system.

3] A plan view of a plurality of openings formed in the aperture plate and the mask plate as viewed from above the aperture plate.

Fig. 4 is a schematic block diagram showing an example of a specific internal configuration of a control system according to an embodiment.

FIG. 5A is an explanatory diagram of a first example of correction processing performed by the image correcting unit of FIG. 4. FIG.

FIG. 5B is an explanatory diagram of a first example of correction processing performed by the image correcting unit of FIG. 4. FIG.

Fig. 6 is an explanatory diagram showing a second example of correction processing performed by the image correcting unit of Fig. 4;

FIG. 7 is a second explanatory diagram of a correction process performed by the image correcting unit of FIG. 4. FIG.

FIG. 8 is a second explanatory diagram of a correction process performed by the image correcting unit of FIG. 4. FIG.

FIG. 9 is a second explanatory diagram of a correction process performed by the image correcting unit of FIG. 4. FIG.

Fig. 10 is a schematic block diagram showing a specific internal configuration of a control system according to a modification.

FIG. 11 is a schematic flow chart showing a first example of a processing procedure of a control system including image correction processing and error factor discrimination processing.

FIG. 12 is a schematic flow chart showing an example of a re-rendering process of the control system.

FIG. 13A is a schematic diagram showing an example of the third drawing material.

FIG. 13B is a schematic diagram showing an example in which the third drawing material of FIG. 13A is binarized.

[Fig. 14] A schematic diagram showing an example of extracting a contour based on the binary data of Fig. 13B.

FIG. 15 is a flow chart showing the detailed processing procedure of the case where the processing of step S9 of FIG. 11 is performed using the fourth drawing data generated by the first method of FIG.

[Fig. 16] Schematic diagram of the process of Fig. 15.

FIG. 17 is a schematic flow chart showing the processing procedure of the case of performing step S5 of FIG. 11 by the second method.

FIG. 18A is a schematic diagram showing an example of the third drawing material.

[Fig. 18B] The third drawing data of Fig. 18A is zoned in response to the dose. A schematic diagram of a domain segmentation.

FIG. 19 is a schematic diagram showing an example in which each divided region of FIG. 18B is converted into a fourth drawing material composed of polygonized vector data.

FIG. 20 is a flow chart showing the detailed processing procedure of the case where the processing of step S10 of FIG. 11 is performed using the fourth drawing data generated by the second method of FIG.

FIG. 21A is a model explanatory diagram of the process of FIG. 20. FIG.

FIG. 21B is a model explanatory diagram of the process of FIG. 20. FIG.

FIG. 22 is a fourth schematic view of the data generated by the process of FIG. 20 based on the third drawing data generated by the process of step S4 of FIG.

FIG. 23 is a schematic flow chart showing the processing procedure of the case of performing step S5 of FIG. 11 by the third method.

FIG. 24A is a schematic diagram showing an example of the third drawing material.

Fig. 24B is a schematic diagram showing the accumulation dose distribution obtained by performing the rendering simulation using the third drawing data of Fig. 24A.

FIG. 25A is a process explanatory diagram of steps S62 and S63 of FIG. 23.

FIG. 25B is a process explanatory diagram of steps S62 and S63 of FIG. 23.

FIG. 26 is a flow chart showing the detailed processing procedure of the case where the processing of step S10 of FIG. 11 is performed using the fourth drawing data generated by the third method of FIG.

FIG. 27 is a model explanatory diagram of the process of FIG. 26. FIG.

FIG. 28 is a schematic flow chart showing an example of the re-rendering process of the control system.

29 is a schematic diagram showing the internal structure of a control system for performing the process of FIG. Block diagram.

FIG. 30 is a schematic flow chart showing a second example of the processing procedure of the control system.

FIG. 31 is a block diagram of a control system according to a second example.

Hereinafter, embodiments of the present disclosure will be described in detail. Fig. 1 is a schematic view showing the schematic configuration of a charged particle beam drawing device 1 according to an embodiment. The charged particle beam drawing device 1 of Fig. 1 is used for the purpose of forming a fine pattern on an object to be drawn such as an exposure mask or a tantalum wafer.

The charged particle beam drawing device 1 of Fig. 1 is mainly provided with an illumination system 2, a multibeam generation system 3, a projection system 4, and a control system 35.

The illumination system 2 includes an electron gun (beam generation unit) 7, an extraction system 8, a deflector 9a, and an illumination lens 9. Electron gun 7, emitting electron beam (electronic line). Further, the charged particles for drawing by the charged particle beam drawing device 1 according to the present embodiment are not necessarily limited to the electron beams. For example, it may be a beam of various ions such as hydrogen ions or heavy ions, or a beam of charged atomic clusters or charged molecules. Here, the heavy ion means an ion of an element (for example, oxygen, nitrogen, or the like) that is heavier than carbon (C). Alternatively, the heavy ion means neon (Ne), argon (Ar), krypton (Kr), xenon (Xe) or the like. Hereinafter, an example in which an electron beam is used as a charged particle beam will be mainly described.

The deflector 9a controls the traveling direction 1a of the electron beam emitted from the electron gun 7. Illuminating lens 9, aligning the direction of travel of the electron beam Qi. The electron beam that has passed through the illumination lens 9 becomes a telecentric beam 1b that is wide and telecentric.

The multibeam generation system 3 generates a multibeam 1c containing a plurality of microbeams from the electron beam 1b that has passed through the illumination lens 9, as will be described later in detail.

The projection system 4 includes a first electromagnetic lens 6a, a first deflector 11, a second electromagnetic lens 6b, an aperture member 10, a third electromagnetic lens 6c, and a second deflector 12. The multi-beam 1c incident on the projection system 4 sequentially passes through the first electromagnetic lens 6a, the first deflector 11, and the second electromagnetic lens 6b. Thereafter, only the plurality of beams that have passed through the opening of the aperture member 10 sequentially pass through the third electromagnetic lens 6c and the second deflector 12, and then are irradiated onto the object 13 to be placed on the stage 5 to perform the irradiation. Depiction. The projection system 4 uses the first to third electromagnetic lenses 6a to 6c to reduce and project the multi-beam onto the object 13 to be drawn. The platform 5 is made movable in a two-dimensional direction of its setting surface. Therefore, while the stage 5 is moved, the multi-beam is reduced and projected onto the object 13 by the projection system 4, whereby any place on the object 13 can be drawn. The object 13 to be drawn is an exposure mask or a wafer or the like.

In addition, the projection system 4 also performs optical compensation for chromatic aberration and geometric aberration in the first to third electromagnetic lenses 6a to 6c and the first to second deflectors 11 and 12 in a wide range. Sexual treatment.

The control system 35 controls the illumination system 2, the multibeam generation system 3, and the projection system 4 as will be described in detail later. In addition to this, the control system 35 also performs an appearance inspection of the drawing pattern or a correction processing described later. Control, etc.

FIG. 2 is a schematic diagram showing an example of a specific configuration of the multibeam generation system 3. The multibeam generating system 3 of Fig. 2 has an aperture plate (aperture portion) 16 and a masking plate (covering portion) 17.

The aperture plate 16 has a protective layer 15 for protecting the protective plate 16 from electron beam collision, and a plurality of openings 16a for radiating the plurality of beams. The protective layer 15 is not necessarily a member, and may be omitted.

The shielding plate 17 has a plurality of openings 17a formed to fit the respective opening portions 16a of the aperture plate 16.

3 is a plan view of a plurality of openings 16a and 17a formed in the aperture plate 16 and the mask 17 as viewed from above the aperture plate 16. In the example of Fig. 3, a plurality of openings 16a are arranged at regular intervals in the two-dimensional direction of the surface direction of the aperture plate 16.

As shown in FIG. 2, a pair of electrodes, that is, a ground electrode 18 and a deflecting electrode 19 are provided adjacent to the opening portions 17a of the masking plate 17. By energizing the ground electrode 18 and the corresponding deflecting electrode 19, the electron beams passing through the corresponding opening portions 16a, 17a are deflected, and as shown by the arrow 21 in Fig. 2, the electron beam is not passed through the Aperture plate 10. On the other hand, when the ground electrode 18 is not energized with the corresponding deflecting electrode 19, the electron beam is not deflected, and as shown by the arrow 20 in Fig. 2, it passes through the aperture plate 10 of Fig. 1. The energization is performed by applying a voltage which is sufficiently different from the preset voltage in the non-conduction state between the ground electrode 18 and the deflection electrode 19. The preset voltage in the non-energized state is 0 V, and the ground electrode 18 and the deflecting electrode 19 have the same potential. Ground electrode 18 and partial The voltage control to the electrode 19 is performed by the control system 35.

In this manner, it is possible to control whether or not the electron beams are deflected with respect to each of the openings 17a of the shielding plate 17, so that the number of beams and the beam position of the multi-beam passing through the aperture plate 10 of Fig. 1 can be arbitrarily controlled.

In the case of the charged beamlet drawing device 1 of the single beam type, only one electron beam is irradiated onto the object 13 to be drawn, so that the cross-sectional shape can be processed into an arbitrary shape such as a rectangle, and the state can be adjusted to an arbitrary intensity. Under irradiation. Therefore, for example, it is also possible to draw a rectangular pattern on the surface to be exposed on the surface of the scanning rectangle. Therefore, the dimensional error does not occur, and the correct pattern formation can be performed, but the improvement of the drawing speed cannot be expected, so that the drawing time takes a long time.

On the other hand, in the case of the multi-beam type charged particle beam drawing device 1, there is an advantage that extremely high-speed drawing can be performed using a plurality of electron beams, but it is difficult to individually control the cross-sectional shape of each beam, or individually. Control the intensity of each beam. More specifically, it is not possible to provide a mechanism for individually forming each of the electron beams passing through the opening portion 16a of the fine aperture plate 16 or individually adjusting the intensity.

The charged particle beam drawing device 1 according to the general multi-beam method currently used can form a diameter on the exposure target surface. Many of the circular irradiation points are not formed into an arbitrary shape, and a method of drawing by ON/OFF control of each electron beam has to be employed. In view of this, in order to perform the drawing control of the charged particle beam drawing device 1 of the multi-beam method, the drawing data constituted by the two-dimensional pixel arrangement is used.

Further, according to the charged particle beam drawing device 1 of the multi-beam method, the intensity of a majority of electron beams cannot be individually controlled. However, by controlling the masking plate 17, each of the electron beams can be individually turned ON/OFF. In view of this, the respective electron beams irradiated by the respective irradiation reference points are individually ON/OFF controlled, and the exposure time is changed, thereby changing the exposure intensity. The control of such exposure time is actually performed in the form of control of the number of exposures. This is because the platform 5 is actually two-dimensionally moved (the horizontal direction and the front-rear direction of FIG. 1), and a plurality of electron beams are scanned two-dimensionally on the object 13 to be drawn.

For example, if it is designed to set the exposure time of about several nanoseconds in advance as the unit exposure time at the time of one electron beam irradiation, the electron beam irradiation is completed once, and the stage 5 is moved in the X-axis direction just at the interval d. Then, the next electron beam irradiation is performed, and for a specific irradiation reference point Q, exposure by a unit exposure time is performed by each different electron beam (adjacent electron beam). At this time, if individual ON/OFF control is performed for each of the electron beams, the stage type is used, but it is possible to set a unique exposure intensity for each of the irradiation reference points. As will be described later, by controlling the exposure intensity, it is possible to finely adjust the shape or pattern width of the drawing pattern.

Fig. 4 is a schematic block diagram showing an example of a specific internal configuration of the control system 35 of the embodiment. The control system 35 of FIG. 4 includes a control unit 41, an acquisition unit 42, a first image conversion unit 43, an image correction unit 44, a second image conversion unit 45, a first memory control unit 46, and a first drawing material. The memory unit 47, the second memory control unit 48, and the second picture data storage unit 49. In FIG. 4, the acquisition unit 42, the first image conversion unit 43, the image correction unit 44, the second image conversion unit 45, the first memory control unit 46, and the second memory control unit 48 are provided in the charged particle beam. The inside of the drawing device 1 is provided, and the first drawing data storage unit 47 and the second drawing data storage unit 49 are provided in a device (for example, an inspection device) separate from the charged particle beam drawing device 1. In the present specification, the charged particle beam drawing device 1 and the inspection device are collectively referred to as a charged particle beam drawing system.

The control unit 41 controls each unit in the charged particle beam drawing device 1. The control unit 41 can be configured by, for example, one or a plurality of computers, but the specific configuration of the control unit 41 is not particularly problematic. The control unit 41 may include at least a part of functions of the acquisition unit 42, the first image conversion unit 43, the image correction unit 44, and the second image conversion unit 45, which will be described later.

The acquisition unit 42 acquires the first drawing material in the vector form for drawing the object 13 to be drawn. Here, the so-called vector form means that the drawing data is managed by the line segment information and the direction information of the line. The acquisition unit 42 acquires the first drawing material generated by a layout design tool (not shown) or the like via a network or a recording medium such as a compact disc. The first drawing material is a drawing material of a general vector form such as GDS or OASIS.

The first image converting unit 43 converts the first drawing material acquired by the obtaining unit 42 into a second drawing material on a line-by-line basis. Here, the line-by-line format means that the drawing material is managed by the pixel data of the pixel unit.

The image correcting unit 44 corrects the second drawing resource in units of pixels The third drawing material in a line-by-line format is generated by bringing the second drawing material closer to the ideal drawing data. The reason why the image correcting unit 44 performs the correction processing on the line-by-line basis is that only the characteristic of the pattern image of the second drawing material is extracted and the correction processing is performed.

The second image converting unit 45 converts the third drawing material into the fourth drawing material in the vector form. The reason why the second image converting unit 45 converts the drawing material from the line-by-line format to the vector form is that if the line-by-line format is maintained, the amount of data becomes large and it is not suitable for storage.

The first drawing data storage unit 47 stores the fourth drawing material in the form of a vector obtained by the image conversion by the second image converting unit 45. The first memory control unit 46 performs control for storing the fourth drawing material in the first drawing data storage unit 47. Further, the second drawing data storage unit 49 stores the first drawing material in the vector form before the correction processing. The second memory control unit 48 performs control for storing the first drawing material in the second drawing data storage unit 49. Further, the second drawing data storage unit 49 may be omitted as long as it is an unnecessary component. The second drawing data storage unit 49 is advantageous in that it is possible to assist in exploring the cause of the problem when there is a problem in the visual inspection of the pattern drawn on the object 13 to be drawn, that is, when an error is determined. That is to say, in the visual inspection of the pattern, the cause of the error can be considered as a problem from the vector form to the line-by-line data conversion, correction processing (error), and data conversion and correction processing (error) ). In order to determine whether or not the correction processing is a problem, it is only necessary to compare the first drawing data before the correction processing with the fourth drawing data after the correction processing. Therefore, before the correction processing is stored in the second drawing data storage unit 49 The first depiction data can easily and quickly determine whether it is an error in the correction process.

FIG. 5 is a first explanatory diagram of a correction process performed by the image correcting unit 44 of FIG. 4. The corner portion 40a of the drawing pattern 40 drawn on the object 13 can be easily formed into a circular arc shape even when the actual drawing is a corner having a steep angle. This is because the beam shape of the electron beam has a circular arc, and the beam diameter of the electron beam may be larger than the width of the pixel, and the brightness of the electron beam is the highest in the center portion of the beam aperture, and the brightness is closer to the periphery. The gradient is weak and so on.

As a result, in the first example of the correction processing, the exposure intensity of the pixel corresponding to the corner portion 40a of the drawing pattern 40 is further improved, and the arc correction processing for suppressing the actual pattern shape is performed.

FIG. 5 is an enlarged view showing only one corner portion 40a of the drawing 40. Fig. 5(a) shows the first drawing material in the corner portion 40a and the second drawing material in the corner portion 40a. The first drawing data is a drawing data in a vector form, and includes line direction information and line length information of the drawing pattern 40. The second drawing data includes pixel value information of each pixel constituting the drawing pattern 40. Here, the pixel is a unit area in the drawing pattern 40, and the pixel value is a dose which is an irradiation amount of an electron beam per unit area in the drawing pattern 40.

In the example of Fig. 5, the angle of the two sides of the corner portion 40a of the drawing pattern 40 is 90 degrees, and the boundary line of the drawing pattern 40 passes through the center of each pixel. In this case, in the second drawing data, the pixel value of the pixel of the entire region in which the pattern 40 exists in the pixel is set to 15, and the drawing pattern 40 is stored. The pixel value of only half of the pixels in the pixel is set to 7, the pixel value of the pixel in which the corner portion 40a of the drawing pattern 40 exists is set to 4, and the pixel value of the pixel in which the drawing pattern 40 is not present in the pixel is set to zero. The pixel in which the corner portion 40a of the pattern 40 exists is drawn, and the drawing pattern 40 is present in the area of 1/4 of the pixel. Therefore, the pixel value is 15 × 1/4 = 3.75, and the rounding is four.

FIG. 5(b) shows the third drawing material after the correction processing by the image correcting unit 44. Before the correction processing, the pixel value of the pixel in which the corner portion 40a of the drawing pattern 40 is present is set to 4, but the pixel value of the pixel is changed to 15 by performing the correction processing. In this way, the fourth drawing data obtained by vector-transforming the third drawing data becomes the drawing material in which the corner portion 40a is enlarged into a rectangular shape. The first drawing data storage unit 47 stores the fourth drawing material. Since the fourth drawing data is in the form of a vector, the amount of stored data can be significantly reduced as compared with the third drawing data in which the line-by-line format is saved.

As shown in FIG. 5(b), when the corner portion 40a of the drawing pattern 40 is actually drawn in a rectangular shape, the arc of the corner portion 40a is suppressed, and the design is ideal. Depicted pattern 40.

In this manner, the image correcting unit 44 detects the corner portion 40a of the drawing pattern 40 from the second drawing data on the line-by-line basis of the drawing material of the drawing object 13, and corrects the pixel value of the corner portion 40a. The second image converting unit 45 converts the corrected third drawing material into a fourth drawing material in a vector form, and stores it in the first drawing data storage unit 47. Such a In this way, it is possible to manage the corrected drawing data with a small amount of data, so that it is possible to delete the amount of data when the corrected fourth drawing data is transmitted to the design center for verification, and it becomes easy to carry out the fourth. Demonstrate the verification of the data.

Further, the image correcting unit 44 performs the correction processing, and is not limited to the corner portion 40a of the drawing pattern 40. For example, correction processing may also be performed on the boundary line of the drawing pattern 40.

6 to 9 are explanatory diagrams of a second example of the correction processing performed by the image correcting unit 44 of Fig. 4 . In the case where one pixel has a wide pattern of 5 nm, the boundary line of the drawing pattern 40 passes through the boundary position of the pixel with respect to the drawing pattern 40 which is widened by the pattern which is divisible by 5. Fig. 6 shows an example of the third drawing material corresponding to the drawing pattern 40 of the pattern width (e.g., 20 nm) of the multiple of 5. In FIG. 6, the pixel value of the pixel in which the pattern 40 exists is set to 15, and the pixel value of the pixel in which the drawing pattern 40 does not exist is set to zero. In the example of Fig. 6, the boundary between the boundary line of the drawing pattern 40 and the pixel is identical.

On the other hand, for the drawing pattern 40 in which the pattern cannot be divided by 5, it is necessary to adjust the pixel value of the pixel located on the boundary line and shift the boundary line from the boundary position of the pixel. FIG. 7 discloses an example in which a drawing pattern 40 of a 19 nm pattern is to be drawn, and a pixel value of a pixel located at a boundary line of the drawing pattern 40 is set to 15.

It is assumed that the pattern width when drawing is performed using the third drawing material as shown in FIG. 7 is 19.5 nm. In this case, the pattern width must be further narrowed by 0.5 nm. Therefore, for example, as shown in FIG. 8, the pixel value of the pixel located at the boundary line of the drawing pattern 40 is set to a smaller value, that is, 13. The width of the pattern at this time is as shown in FIG. 8. If it is 18.5 nm, for example, as shown in FIG. 9, the pixel values of the pixels located at the boundary line of the drawing pattern 40 are alternately set to 13 and 14 along the boundary line. . The image correcting unit 44 performs the correction processing by repeating such correction so as to obtain an optimum pattern width.

In the case of FIG. 9, the pixel values in the direction along the boundary line are 13 and 14, and the fourth drawing data in the vector form in which the third drawing material is converted becomes a polygonal line shape. Even if the boundary line has a polygonal line shape, the difference in unevenness is about 0.5 nm, and there is no problem in practical use. However, in the fourth drawing data, the coordinates of each intersection point including the polygonal line and the length and direction of the polygonal line are increased, and the amount of data is increased as compared with the drawing pattern 40 having the linear boundary line. However, the amount of data is still much less than that of the third line of data on a line-by-line basis.

As a method of correcting whether or not there is an error in the third drawing material subjected to the correction processing by the verification image correcting unit 44, it is also conceivable to transmit the fourth drawing data obtained by vector-converting the third drawing data to the design center or the like. Verification is performed, but the presence or absence of an error can also be verified by the control system 35. In the error, the drawing object 13 is actually drawn based on the third drawing data, and the visual inspection of the drawing pattern 40 is performed using the fourth drawing material. As a factor for detecting an error, there is a problem in the case of the correction processing by the image correcting unit 44 and the case where the processing is other than the correction processing. Therefore, when an error is detected, the factor of the error must be identified.

Distinguishing the error factor by the control system 35 The block diagram configuration in the case of the above is shown in FIG. FIG. 10 is a view in which the inspection unit 50 and the correction problem determination unit 51 are added to FIG. 4. The inspection unit 50 performs an appearance inspection of the drawing pattern 40 drawn on the drawing object 13, and determines whether the cause of the problem lies in the correction processing by the image correcting unit 44. The correction problem determination unit 51 determines whether or not there is a problem in the correction processing by the image correction unit 44, and if there is a problem, instructs the image correction unit 44 to perform the correction processing again. In FIG. 10, the acquisition unit 42, the first image conversion unit 43, the image correction unit 44, the second image conversion unit 45, the first picture data storage unit 47, the second picture data storage unit 49, the inspection unit 50, and The correction problem determination unit 51 constitutes a drawing data verification device.

Fig. 11 is a schematic flow chart showing a first example of the processing procedure of the control system 35 including the image correction processing and the error factor discrimination processing.

First, the acquisition unit 42 acquires the first drawing material in the vector form for drawing on the object 13 to be drawn (step S1). The acquired first drawing data is stored in the second drawing data storage unit 49 (step S2). The processing of this step S2 is performed by the processing of steps S3 to S6 which will be described later. Next, the first image converting unit 43 converts the first drawing material into the second drawing material in a line-by-line format (step S3). Then, the image correcting unit 44 performs the correction processing of the second drawing material to generate the third drawing material in a line-by-line format (step S4). Next, the third image conversion unit 45 converts the third drawing material into the fourth drawing material in the vector form (step S5). The details of the processing of step S5 will be described later.

Next, the first memory control unit 46 performs control for storing the fourth drawing material in the first drawing data storage unit 47 (step S6). The first drawing data storage unit 47 is provided, for example, in a server (not shown) that performs information communication with the charged particle beam drawing device 1.

Next, the control unit 41 draws the drawing object 13 based on the third drawing material to form the drawing pattern 40 (step S7). The processing of the above steps S1 to S7 is performed by a charged particle beam drawing device. The processing of steps S8 to S11 described later is performed by the inspection device.

In step S8, the formed drawing pattern 40 is imaged by an imaging device (not shown), and the captured image is analyzed to perform an appearance check of the drawing pattern 40. In the visual inspection, for example, Die to Die inspection or Die to Database inspection. The Die to Die inspection is a test in which the cells of the same type are compared with each other on the drawing object 13 on which the drawing pattern 40 is formed. The unit is a basic pattern that constitutes the drawing pattern 40. A drawing pattern 40 is constructed by combining a plurality of units. Although there may be a plurality of types of cells having different shapes, the various types of cells are combined in exactly any number to form the drawing pattern 40. In the Die to Die inspection, the captured image of the inspection target unit is compared with the captured image of another unit of the same shape to perform visual inspection. On the other hand, in the Die to Database check, the photographed image of the drawing pattern 40 is compared with the first drawing material to perform visual inspection. The first drawing data used for comparison can be used to read from the second drawing data storage unit 49.

Next, as a result of the visual inspection, it is determined whether or not the drawing pattern 40 has an appearance problem (step S9). If there is no problem in appearance, the processing of FIG. 11 is ended, and if there is a problem in appearance, the fourth drawing material stored in the first drawing data storage unit 47 is stored in the second The comparison of the first drawing data of the drawing data storage unit 49 determines whether or not there is a problem with the correction processing by the image correcting unit 44 (step S10). The details of the processing of step S10 will be described later. If it is judged that there is no problem in the correction processing, it is determined that the problem is other than the correction processing, and the error processing set in advance is executed (step S11). If it is determined in step S10 that there is a problem with the correction processing, the process returns to step S4, and the correction processing of the second drawing material is redone.

To perform the processing of step S5, several methods can be considered. Hereinafter, the representative first method to third method will be described in order.

Fig. 12 is a flow chart showing the processing procedure of the first method. First, the third drawing material generated in step S4 of Fig. 11 is binarized (binary unit, step S21). Fig. 13A is a schematic diagram showing an example of the third drawing data, and Fig. 13B is a diagram showing an example of binarizing the third drawing material of Fig. 13A. The third drawing data of Fig. 13A is line-by-line data of a pixel unit of a minimum value of 0 and a maximum value of 15. In step S21 of FIG. 12, the threshold value is appropriately set, and the line-by-line data having the threshold value or more and the line-by-line data having the lower threshold value are set to 0 and binarized. The threshold value can be set to an arbitrary value, but FIG. 13B discloses an example in which the threshold value is set to 5 and is binarized. By this binarization, the data of the pixel unit can be expressed in one bit, so that the amount of data can be greatly reduced.

When the process of step S21 is performed, a plurality of threshold values of the different values may be set, and binary data is generated for each of the threshold values. Binary data, the amount of data is much smaller than the original third depiction data, so even if multiple binary data is set, there will be no extreme increase in data volume.

Then, based on the binarized data, extract the drawing pattern The contour is generated, that is, the fourth drawing data (the contour drawing unit, step S22). The generated fourth drawing data is stored in the first drawing data storage unit by step S6 of Fig. 11 .

Fig. 14 is a diagram showing an example of extracting a contour based on the binary data of Fig. 13B. The contour is extracted along the boundary between 1 and 0 to generate vector data containing contour information.

Fig. 15 is a flow chart showing the detailed processing procedure of the case where the processing of step S9 of Fig. 11 is performed using the fourth drawing data generated by the first method of Fig. 12 . When it is determined in step S9 of FIG. 11 that there is a problem with the drawing pattern, the fourth drawing material near the point where the problem is determined is read from the first drawing data storage unit (step S31).

Next, the fourth drawing material read in step S31 is compared with the first drawing material (step S32). As a result of the comparison, it is determined whether or not the data of the predetermined size or more has occurred (step S33). If the inconsistency is detected in step S33, it is determined that a certain problem has occurred when the first drawing material is converted to the second drawing material (step S34), and the process proceeds to step S3 of FIG. If the inconsistency is not detected in step S33, the error processing of step S11 of Fig. 11 is performed.

Figure 16 is a schematic illustration of the process of Figure 15. The solid line in Fig. 16 is the fourth drawing material, the broken line is the first drawing material, and × is the problem determined in step S9 of Fig. 11 . In the process of FIG. 15, the fourth drawing material in the vicinity of the position where the problem is determined in step S9 of FIG. 11 is read out and compared with the corresponding first drawing material, so that the drawing is not required. The fourth drawing information and the first drawing capital of the whole The comparison of the materials allows the problem to be checked at high speed.

As described above, when a plurality of fourth drawing data having different threshold values are stored in the first drawing data storage unit 47, each of the plurality of fourth drawing materials can be compared with the first drawing data to perform a problem. Check it out. In this way, the inspection of the problem can be performed with higher precision.

Fig. 17 is a flow chart showing the procedure of the process of performing the step S5 of Fig. 11 by the second method. First, the third drawing data generated in step S4 of FIG. 11 is divided into regions according to each pixel value (area dividing unit, step S41). Here, each pixel value of the third drawing material indicates the dose of the electron beam. In step S41, the adjacent pixel range having the same dose is set as one divided area.

Fig. 18A is a schematic diagram showing an example of the third drawing data, and Fig. 18B is a schematic view showing an example of dividing the third drawing data of Fig. 18A by the dose. In Fig. 18B, an example in which one divided region in which the dose is "15", three divided regions in which the dose is "7", and one divided region in which the dose is "4" is disclosed.

Next, the third drawing material in each divided area obtained by the area division is converted into the fourth drawing material which is the vector data (the vector converting unit, step S42). Fig. 19 is a view showing an example of converting the divided regions of Fig. 18B into fourth drawing data composed of polygonized vector data. For example, since the divided region d1 has a dose of "15", it is converted into a fourth drawing data including the value of "15" and the polygon information. The generated fourth drawing material is saved in the first step by step S6 of FIG. The data storage unit 47 is depicted.

FIG. 20 is a flow chart showing the detailed processing procedure of the case where the processing of step S10 of FIG. 11 is performed using the fourth drawing data generated by the second method of FIG. When it is determined that there is a problem in the drawing pattern in step S9 of FIG. 11, the fourth drawing material in the vicinity of the point where the problem is determined is read from the first drawing data storage unit 47 (step S51).

Next, the fourth drawing material read in step S51 is compared with the first drawing material (step S52). As a result of the comparison, it is determined whether or not the correction by the correction processing of step S4 of Fig. 11 is excessive (step S53). When it is determined that the correction is excessive, the result of the problem of the conversion from the second drawing material to the third drawing material by the step S4 of FIG. 11 is derived (the correction problem determining unit, step S54), and the error processing of step S11 of FIG. 11 is performed. If it is determined in step S53 that the correction is not excessive, the process proceeds to step S4 of Fig. 11 .

21A and 21B are model explanatory views of the process of Fig. 20. The solid line in Fig. 21 is the fourth drawing material, the broken line is the first drawing material, and × is the problem determined in step S9 of Fig. 11 . The problem at Fig. 21A is to depict the corners of the pattern. The problem at Fig. 21B is to depict the end of the pattern. In either case, by re-doing the correction processing of step S4 of Fig. 11 and adjusting the pixel value in the vicinity of ×, the problem can be eliminated.

Fig. 22 is a view showing a fourth drawing material generated by the processing of Fig. 20 based on the third drawing data generated by the process of step S4 of Fig. 11 when the problem of Fig. 21A is found. Comparing the fourth drawing data of Fig. 22 with Fig. 21A, it can be seen that the pixel value of the corner portion of the drawing pattern is received. change. As a result, the visual inspection of steps S8 and S9 of FIG. 11 is judged to be normal.

In the process of FIG. 20, the fourth drawing material in the vicinity of the point where the problem is determined in step S9 of FIG. 11 is read and compared with the corresponding first drawing material. Therefore, it is not necessary to perform the drawing of the entire pattern. 4 The comparison between the drawing data and the first drawing data enables the problem to be checked at a high speed.

Fig. 23 is a flow chart showing the procedure of the process of performing the step S5 of Fig. 11 by the third method. First, the third drawing data generated in step S4 of FIG. 11 is used to perform the drawing simulation in which the forward beam or the backscattering of the electron beam is taken into consideration, and the accumulated dose distribution (accumulated dose distribution acquiring unit is obtained, step S61). The term "forward scattering" refers to a scattering phenomenon in which the electron beam is irradiated not only to the target irradiation position but also to the periphery of the target irradiation position. The term "backscattering" refers to a scattering phenomenon in which a part of an electron beam penetrates a resist film and is reflected on a substrate of a substrate to be irradiated to a periphery of a target irradiation position. In step S61, by performing a drawing simulation in which forward scattering or backscattering is taken into consideration, the dose distribution of the electron beam irradiated to the periphery of the target irradiation position is obtained as the accumulated dose distribution.

Fig. 24A is a schematic diagram showing an example of the third drawing data, and Fig. 24B is a schematic diagram showing the accumulated dose distribution obtained by performing the drawing simulation using the third drawing data of Fig. 24A. The accumulated dose distribution is characterized in that the farther away from the target irradiation position, the more the dose is reduced.

Once the accumulated dose distribution is obtained in step S61 of FIG. 23, then the accumulated dose distribution is limited by an arbitrary threshold to generate a resist. The pattern image is converted into a vector data (accumulation dose conversion unit, step S62). Then, the rectangular data obtained by reducing the number of vertices of the vector data converted in step S62 is stored in the first drawing data storage unit as the fourth drawing material (the number of vertices deletion unit, step S63).

25A and 25B are explanatory views of the processing of steps S62 and S63 of Fig. 23. Among the accumulated dose distributions shown in Fig. 24B, for example, only pixels having a dose having a threshold of 5 or more are extracted, and vector data like Fig. 25A is obtained. The outline of this vector data is a curve as shown in Fig. 25A, and has a plurality of vertex data. Therefore, in step S63 of Fig. 23, the vector data of the contour line having the curve as shown in Fig. 25A is converted into the rectangular data having the straight contour line as shown in Fig. 25B. In this way, the fourth drawing data composed of the vector data obtained by reducing the number of vertices is obtained.

Fig. 26 is a flow chart showing the detailed processing procedure of the case where the processing of step S10 of Fig. 11 is performed using the fourth drawing data generated by the third method of Fig. 23 . When it is determined that there is a problem in the drawing pattern in step S9 of FIG. 11, the fourth drawing material in the vicinity of the problem is found, and is read from the first drawing data storage unit (step S71).

Next, the fourth drawing material read in step S71 and the first drawing material are compared (comparison unit, step S72). As a result of the comparison, it is determined whether or not the correction by the correction processing of step S4 of Fig. 11 is excessive (correction problem determination unit, step S73). If it is determined that the correction is excessive, the result of the problem of converting from the second drawing material to the third drawing material by the step S4 of FIG. 11 is derived (step S74), and the error of step S11 of FIG. 11 is performed. Mishandling. If it is determined in step S73 that the correction is not excessive, the process proceeds to step S4 of Fig. 11 .

Fig. 27 is a model explanatory diagram of the processing of Fig. 26; The solid line in Fig. 27 is the fourth drawing material, the broken line is the first drawing material, and × is the problem determined in step S9 of Fig. 11 . In the third method, the fourth drawing data is generated by considering the forward scattering or backscattering of the electron beam. Therefore, the accuracy of the fourth drawing material can be improved, and the problem of drawing the pattern can be inspected with high precision.

The third drawing data is deleted when the drawing of the drawing object is completed by the step S7 of Fig. 11 . However, the fourth drawing material stored in the first drawing data storage unit 47 can be used to re-render the object to be drawn. Further, it is assumed that the first drawing object (for example, a photomask) is defective after the drawing, or when a plurality of masks are requested to be manufactured by the customer's request. The case where it is necessary to re-render is, for example, the case of 1), 2) or 3) below.

1) When a mask is produced as the object 13 to be drawn, an electron-line photosensitive resist is applied to the mask blanks, and the pattern is drawn by an electron beam, and then the substrate is processed by development and etching. To make a mask. The produced photomask is subjected to visual inspection of the drawing pattern by step S8 of Fig. 11 . If it is found by visual inspection that the drawing pattern has not been processed into a desired shape, a new base plate for the mask is prepared and the drawing is performed again.

2) Applying a photosensitive resist to the substrate for the photomask The sub-line is drawn and developed, and if the pattern after development is found to be defective, the resist is peeled off, and the photosensitive resist is applied again on the same substrate, and then drawn again.

3) When a photomask is produced and shipped, when it is necessary to reproduce a photomask having the same pattern due to the request of the customer, the new photomask substrate is coated with the electron beam sensitivity under the same drawing conditions. The resist is redrawn.

In addition, in the case of re-drawing, there are cases where the drawing is performed in accordance with the same drawing pattern as before, and the drawing is performed in accordance with the drawing pattern in which the correction or correction is applied to the previous drawing pattern.

28 is a schematic flow chart showing an example of the re-rendering process of the control system 35, and FIG. 29 is a schematic block diagram showing the internal configuration of the control system 35 for performing the process of FIG. FIG. 29 is a view in which the third image conversion unit 52 is added to the configuration of FIG. The third image converting unit 52 converts the fourth drawing material stored in the first drawing data storage unit 47 into a fifth drawing material on a line-by-line basis. The control unit 41 controls the multi-beam generating system 3, the aperture member 10, the projection system 4, the deflector 9a, and the like based on the fifth rendering material, and re-renders the drawing of the drawing object.

In FIG. 28, first, the fourth drawing material stored in the first drawing data storage unit 47 is read and acquired (step S81). Next, the third image converting unit 52 converts the fourth drawing material into the fifth drawing material in a line-by-line format (step S82). Next, using the fifth drawing material, the control unit 41 draws a drawing pattern on the drawing object (step S83).

Fig. 30 is a schematic flow chart showing a second example of the processing procedure of the control system 35, and Fig. 31 is a block diagram showing the control system 35 according to the second example. In the second example, when it is determined that there is a problem in the drawing pattern and there is a problem in the correction processing of the second drawing material, the fourth drawing data is newly reproduced without repeating the correction processing of the second drawing data. As shown in FIG. 31, the control system 35 according to the second example includes a first regenerating unit 53 and a second regenerating unit 54 in addition to the configuration of FIG. When the correction problem determination unit 51 determines that there is a problem with the correction processing by the image correction unit 44, the first reconstruction unit 53 regenerates the fourth drawing material stored in the first image data storage unit 47. The second regenerating unit 54 regenerates the third drawing material on a line-by-line basis based on the regenerated fourth drawing material.

Steps S91 to S101 of FIG. 30 are common to steps S1 to S11 of FIG. When it is determined that there is a problem in the correction processing in step S100, the fourth drawing material stored in the first drawing data storage unit 47 is read, and the first regenerating unit 53 regenerates it (step S102). Then, based on the regenerated fourth drawing data, the third re-generating unit 54 regenerates the third drawing material in a line-by-line format (step S103). The regenerated third drawing material is used to draw the drawing pattern of step S97, and is used to convert to the fourth drawing material in step S95.

The re-generation processing of the fourth drawing material and the third drawing data in steps S102 and S103 of FIG. 30 is performed, for example, as follows. The fourth drawing material is read from the first drawing data storage unit 47, converted into a fifth drawing material on a line-by-line basis, and the fifth drawing data is subjected to correction processing again to eliminate the problem found in step S10 of FIG. generate The third drawing data. In addition, the third rendered data that has been regenerated is converted into vector data, and the fourth drawing material is regenerated and stored in the first drawing data storage unit 47.

In the present embodiment, the first drawing material to be drawn in the vector form of the drawing object 13 is converted into the second drawing material on the line-by-line basis, and then the drawing pattern 40 is determined based on the second drawing data. The corrected location is corrected in pixels, and the third depiction data is generated line by line. The third depiction data is difficult to directly transmit to the design center for verification because of the large amount of data. In the present embodiment, the fourth drawing material is converted into the fourth drawing data in the vector form, and is stored in the first drawing data storage unit 47 in a state where the amount of data is reduced. Therefore, it is possible to easily perform the verification by reading the fourth drawing material from the first drawing data storage unit 47 as necessary, and it is possible to easily and quickly determine whether or not the correction processing is accurate.

The aspects of the present disclosure are not limited to the above-described respective embodiments, and various modifications may be made by those skilled in the art, and the effects of the present disclosure are not limited to the above. In other words, various additions, modifications, and partial deletions can be made without departing from the spirit and scope of the present disclosure.

35‧‧‧Control system

41‧‧‧Control Department

42‧‧‧Acquisition Department

43‧‧‧1st image conversion unit

44‧‧‧Image Correction Department

45‧‧‧2nd image conversion unit

46‧‧‧First Memory Control Department

47‧‧‧1st depicting the data memory department

48‧‧‧Second Memory Control Department

49‧‧‧2nd depicting the data memory department

Claims (19)

A charged particle beam drawing device includes: a beam generating unit that generates a charged particle beam; and an aperture portion having a plurality of openings that pass the charged particle beam through the openings to generate a plurality of microbeams And a projection system that reduces and projects the plurality of beams onto the object to be drawn; and a masking portion interposed between the aperture portion and the projection system to control the plurality of microbeams toward the projection system or toward a direction different from the projection system; and a control unit that controls the beam generating unit, the projection system, and the masking unit; and an acquisition unit that acquires a first drawing material in a vector form for drawing the object to be drawn And the first image converting unit converts the first drawing material into a second drawing material in a raster form; and the image correcting unit corrects the second drawing material in pixel units to generate a line-by-line format a third drawing data; the second image converting unit converting the third drawing material into a fourth drawing data in a vector form; and the first memory control unit performing the fourth drawing The data is stored in the control of the first drawing data storage unit, and the control unit controls the beam generating unit, the projection system, and the masking unit based on the third drawing data, and draws a drawing pattern on the object to be drawn. The charged particle beam drawing device according to the first aspect of the invention, wherein the second image converting unit includes a binarization unit that generates a binary image of the third drawing data. The binary data; and the contour extracting unit extract the outline of the binary data to generate the fourth drawing data. The charged particle beam drawing device according to claim 2, further comprising: an inspection unit that performs an appearance inspection of the drawing of the object to be drawn after drawing the object to be drawn, and determines whether there is an appearance And the first memory control unit, if the inspection unit determines that there is a problem, the fourth drawing material in the vicinity of the problem is read from the first drawing data storage unit; and the comparison means The fourth image data read by the first memory control unit is compared with the first image data; and the correction problem determination unit determines that the first image conversion unit is based on the comparison result by the comparison means. Is there a problem in the process of converting the first drawing data into the second drawing data. The charged particle beam drawing device according to claim 1, wherein the third drawing material includes pixel values for each of the plurality of pixels. The second image conversion unit includes an area dividing unit that divides adjacent pixel ranges having the same pixel value in the third drawing material into one divided area, and a vector conversion unit. The fourth drawing material obtained by vectorizing the divided regions divided by the regions is generated. The charged particle beam drawing device according to claim 1, wherein the third image data includes pixel values for each of a plurality of pixels, and the second image conversion unit includes a stored dose distribution acquisition unit. And based on the third drawing data, performing a simulation simulation in which forward scattering and backscattering of the charged particle beam are taken into consideration to obtain a stored dose distribution; and a stored dose converting unit that converts the accumulated dose distribution into vector data; The vertex number subtraction unit divides the number of vertices of the vector data converted by the accumulated dose conversion unit to generate the fourth drawing material. The charged particle beam drawing device according to the fourth aspect of the invention, wherein the inspection unit is configured to perform an appearance inspection of the drawing of the object to be drawn after the drawing of the object to be drawn, and determine Whether there is a problem with appearance; and When the inspection unit determines that there is a problem, the first memory control unit reads the fourth drawing material in the vicinity of the problem from the first image data storage unit; and the comparison means 1 comparing the fourth drawing data read by the memory control unit with the first drawing data; and the correction problem determining unit determining, based on the comparison result by the comparison means, correcting the second drawing material to generate the third drawing material Whether the processing performed by the image correcting unit has a problem. The charged particle beam drawing device according to any one of the first aspect, wherein the third image conversion unit is stored in the fourth image data storage unit. The drawing data is converted into the fifth drawing data in a line-by-line format, and the control unit controls the beam generating unit, the projection system, and the masking unit based on the fifth drawing data, and re-drawing the drawing object to the drawing object. Depiction. The charged particle beam drawing device according to any one of the first aspect, wherein the image correcting unit corrects a pixel of a pixel of a corner of the drawing pattern included in the second drawing material. The third depiction data is generated as a value. The charged particle beam drawing device according to claim 8, wherein the pixels superimposed on the drawing pattern are set to have larger pixel values than pixels not overlapping the drawing pattern. The image correcting unit generates the third drawing material by correcting a pixel value of a pixel of a corner portion of the drawing pattern included in the second drawing material to a larger value. The charged particle beam drawing device according to any one of the preceding claims, wherein the image correcting unit corrects a boundary line of a drawing pattern included in the second drawing material. The third drawing material is generated by a plurality of pixel values of pixels. The charged particle beam drawing device according to any one of claims 1 to 10, further comprising: a second memory control unit configured to store the first drawing data in the second drawing data storage unit control. A charged particle beam drawing system comprising: a beam generating unit that generates a charged particle beam; and an aperture portion having a plurality of openings that pass the charged particle beam through the openings to generate a plurality of microbeams And a projection system that reduces and projects the plurality of beams onto the object to be drawn; and a masking portion interposed between the aperture portion and the projection system to control the plurality of microbeams toward the projection system or toward a direction different from the projection system; and a control unit that controls the beam generating unit, the projection system, and the masking unit; and an acquisition unit that acquires a first drawing material in a vector form for drawing the object to be drawn And the first image conversion unit converts the first drawing material into a line by line a second drawing data in the form of a raster; and an image correcting unit that corrects the second drawing material in units of pixels to generate a third drawing material on a line-by-line basis; and a second image conversion unit that reads the third drawing material The fourth drawing data converted into a vector form; and the first drawing data storage unit stores the fourth drawing data; and the inspection unit performs the visual inspection of the drawing of the drawing object after drawing the drawing object And determining whether there is a problem in appearance; and the correction problem determination unit determines whether there is a problem in the correction processing in the image correction unit when the inspection unit determines that there is a problem. A charged particle beam drawing system comprising: a beam generating unit that generates a charged particle beam; and an aperture portion having a plurality of openings that pass the charged particle beam through the openings to generate a plurality of microbeams And a projection system that reduces and projects the plurality of beams onto the object to be drawn; and a masking portion interposed between the aperture portion and the projection system to control the plurality of microbeams toward the projection system or toward a direction different from the projection system; and a control unit that controls the beam generating unit, the projection system, and the masking unit; and an acquisition unit that acquires a first drawing material in a vector form for drawing the object to be drawn And the first image conversion unit converts the first drawing material into a line by line a second drawing data in the form of a raster; and an image correcting unit that performs a correction process on the second drawing data in units of pixels to generate a third drawing material on a line-by-line basis; and a second image conversion unit that performs the above 3: The fourth drawing data is converted into a vector form; and the first drawing data storage unit stores the fourth drawing data; and the control unit controls the beam generating unit, the projection system, and the third drawing data. The obscuring unit draws a drawing on the drawing object; and the inspection unit performs an appearance check on the drawing of the drawing object after drawing the drawing object, and determines whether there is a problem in appearance; And the first regenerating unit regenerates the fourth drawing material when the inspection unit determines that there is a problem; and the second regenerating unit uses the regenerated fourth drawing material to form a line by line The third drawing data is regenerated; the control unit controls the beam generating unit, the projection system, and the mask based on the regenerated third drawing data. The second image conversion unit re-converts the regenerated third image data into the fourth image data, and the first image data storage unit stores the image. The fourth depiction data is transformed. A method for generating data, based on charged particle beams A method for generating a drawing material used in a charged particle beam drawing device that includes a plurality of beams of a plurality of microbeams for drawing an object to be drawn includes acquiring a vector for drawing the object to be drawn a step of first drawing data in a form; and a step of converting the first drawing material into a second drawing data on a line-by-line basis; and correcting the second drawing material in units of pixels to generate a third drawing data in a line-by-line format And a step of converting the third drawing data into a fourth drawing data in a vector form; and storing the fourth drawing data in the first drawing data storage unit. The method for generating a drawing data according to claim 14, wherein the step of converting the fourth drawing data is to binarize the third drawing data to generate binary data, and extracting the binary data. The outline is generated by the fourth depiction. The drawing data generating method according to the fifteenth aspect of the invention, wherein the drawing of the drawing object is performed, and then an appearance check of the drawing of the drawing object is performed to determine whether there is a problem in appearance, and if it is determined If the above problem occurs, the fourth drawing material in the vicinity of the problem is read from the first drawing data storage unit. The fourth drawing data read as described above is compared with the first drawing data, and based on the result of the comparison, it is determined whether or not there is a problem in the process of converting the first drawing material into the second drawing material. The method for generating a drawing data according to claim 14, wherein the third drawing material includes a pixel value for each of the plurality of pixels, and the step of converting the image into a fourth image is to perform region division. The area division unit integrates adjacent pixel ranges having the same pixel value in the third drawing data into one divided area, and generates the fourth drawing material obtained by vectorizing the divided area divided by the area. The drawing data generating method according to claim 14, wherein the third drawing material includes a pixel value for each of the plurality of pixels, and the positive direction of the charged particle beam is performed based on the third drawing data. Scattering and backscattering are included in the depiction simulation, and the accumulated dose distribution is obtained. The accumulated dose distribution is converted into vector data, and the number of vertices of the transformed vector data is deleted to generate the fourth drawing data. The drawing data generating method according to Item 17 or Item 18, wherein after the drawing of the object to be drawn, an appearance check of the drawing of the object to be drawn is performed to determine whether there is an appearance problem. When it is determined that the above problem is present, the fourth drawing material in the vicinity of the problem is read from the first drawing data storage unit, and the read fourth drawing data and the first drawing data are compared. Based on the result of the comparison, it is judged whether or not there is a problem in the process of correcting the second drawing material and generating the third drawing material.