TW201737042A - Detection device and display device - Google Patents

Detection device and display device Download PDF

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TW201737042A
TW201737042A TW106110709A TW106110709A TW201737042A TW 201737042 A TW201737042 A TW 201737042A TW 106110709 A TW106110709 A TW 106110709A TW 106110709 A TW106110709 A TW 106110709A TW 201737042 A TW201737042 A TW 201737042A
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conductive thin
strip
shaped region
region
width
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TW106110709A
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TWI617960B (en
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石崎剛司
倉澤隼人
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日本顯示器股份有限公司
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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B7/00—Insulated conductors or cables characterised by their form
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04105—Pressure sensors for measuring the pressure or force exerted on the touch surface without providing the touch position
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Abstract

A detection device includes a substrate; a plurality of first conductive thin wires provided in a plane parallel to the substrate and extending in a first direction; a plurality of second conductive thin wires provided in the same layer as that of the first conductive thin wires and extending in a second direction forming an angle with the first direction; first groups that are disposed in first strip-like regions respectively having a first width, each of the first groups including at least two of the first conductive thin wires displaced from one another in the second direction; and second groups that are disposed in second strip-like regions respectively having a second width, each of the second groups including at least two of the second conductive thin wires displaced from one another in the first direction.

Description

檢測裝置及顯示裝置Detection device and display device

本發明係關於可檢測外部接近物體之檢測裝置，尤其係關於可基於靜電電容之變化而檢測外部接近物體之檢測裝置及顯示裝置。The present invention relates to a detecting device capable of detecting an external approaching object, and more particularly to a detecting device and a display device capable of detecting an external approaching object based on a change in electrostatic capacitance.

近年來，稱作所謂觸控面板之可檢測外部接近物體之檢測裝置備受矚目。觸控面板係用於安裝於液晶顯示裝置等顯示裝置上或經一體化之附有觸控檢測功能之顯示裝置。並且，附有觸控檢測功能之顯示裝置藉由使各種按鈕圖像等顯示於顯示裝置，而能夠以觸控面板取代通常之機械式按鈕輸入資訊。由於具有此種觸控面板之附有觸控檢測功能之顯示裝置無需如鍵盤或滑鼠、按鍵等之輸入裝置，故除了電腦以外，於如行動電話之便攜式資訊終端等中亦有擴大使用之傾向。 作為觸控檢測裝置之方式，存在光學式、電阻式、靜電電容式等若干種方式。靜電電容式觸控檢測裝置使用於便攜式終端等，具有比較單純之構造，且可實現低耗電量。例如，於日本專利公開公報特開2010-197576號公報中，記載有透光性電極圖案之不可視化對策之觸控面板。 再者，於可檢測外部接近物體之檢測裝置中，為了薄型化、大畫面化或高精細化，而謀求檢測電極之低電阻化。檢測電極係使用ITO(Indium Tin Oxide：銦錫氧化物)等透光性導電氧化物作為透光性電極之材料。要使檢測電極為低電阻，使用金屬材料等導電性材料較為有效。但，若使用金屬材料等導電性材料，則可能因顯示裝置之像素與金屬材料等導電性材料之干擾而視認到疊紋。 因此，於日本專利公開公報特開2014-041589號公報中，記載有檢測電極即使使用金屬材料等導電性材料之檢測電極，仍可降低視認到疊紋之可能性之檢測裝置。於日本專利公開公報特開2014-041589號公報記載之檢測裝置中，雖可降低視認到疊紋之可能性，但當可視光入射時在複數個檢測電極中繞射或散射之光強度圖案會變得近似複數個散亂之光點，而有可能視認到光點。 本發明係鑑於該問題而完成者，其目的係提供一種可檢測外部接近物體之檢測裝置及顯示裝置，其可使用金屬材料等導電性材料之檢測電極，且降低視認到複數個散亂之光點之可能性。In recent years, a detecting device capable of detecting an external proximity object called a touch panel has been attracting attention. The touch panel is used for mounting on a display device such as a liquid crystal display device or an integrated display device with a touch detection function. Further, the display device with the touch detection function can replace the usual mechanical button input information with the touch panel by displaying various button images or the like on the display device. Since the display device with the touch detection function of the touch panel does not require an input device such as a keyboard, a mouse, a button, etc., in addition to the computer, it is also widely used in portable information terminals such as mobile phones. tendency. As a method of the touch detection device, there are several methods such as an optical type, a resistive type, and an electrostatic capacitance type. The capacitive touch detection device is used in a portable terminal or the like, and has a relatively simple structure and can realize low power consumption. For example, a touch panel having a countermeasure against invisibility of a translucent electrode pattern is described in Japanese Laid-Open Patent Publication No. 2010-197576. Further, in the detecting device capable of detecting an external approaching object, in order to reduce the thickness, the screen size, or the high definition, the resistance of the detecting electrode is reduced. As the detection electrode, a light-transmitting conductive oxide such as ITO (Indium Tin Oxide) is used as a material of the light-transmitting electrode. In order to make the detecting electrode low in resistance, it is effective to use a conductive material such as a metal material. However, when a conductive material such as a metal material is used, it is possible to visually recognize the moiré due to interference of a pixel of the display device with a conductive material such as a metal material. In the detection electrode, even if a detection electrode of a conductive material such as a metal material is used as the detection electrode, it is possible to reduce the possibility of visually recognizing the possibility of moiré. In the detecting device described in Japanese Laid-Open Patent Publication No. 2014-041589, the possibility of recognizing the moiré can be reduced, but the light intensity pattern that is diffracted or scattered in the plurality of detecting electrodes when the visible light is incident is It becomes a plurality of scattered light spots, and it is possible to recognize the light spots. The present invention has been made in view of the above problems, and an object thereof is to provide a detecting device and a display device capable of detecting an external proximity object, which can use a detecting electrode of a conductive material such as a metal material, and reduce a plurality of scattered lights. The possibility of point.

根據第1態樣，檢測裝置具備：基板；複數條第1導電性細線，其設置於與基板平行之面上，且於第1方向延伸；複數條第2導電性細線，其設置於與第1導電性細線同一層上，且在與第1方向形成角度之第2方向延伸；第1組群，其配置於第1寬度之第1帶狀區域，且至少包含於第2方向相互偏錯之2條第1導電性細線；及第2組群，其配置於第2寬度之第2帶狀區域，且至少包含於第1方向相互偏錯之2條第2導電性細線，於第1帶狀區域與第2帶狀區域之交叉區域中，第1導電性細線與第2導電性細線相接。 根據第2態樣，顯示裝置具備檢測裝置與顯示區域，且在與上述顯示區域重疊之區域，設有上述第1導電性細線與上述第2導電性細線。According to a first aspect, the detecting device includes: a substrate; a plurality of first conductive thin wires provided on a surface parallel to the substrate and extending in the first direction; and a plurality of second conductive thin wires provided in the first 1 conductive thin lines are on the same layer and extend in a second direction forming an angle with the first direction; the first group is disposed in the first strip-shaped region of the first width, and at least included in the second direction is mutually offset And the second group of the second conductive thin wires arranged in the second strip-shaped region of the second width and including at least two second conductive thin wires which are offset from each other in the first direction, and are in the first In the intersection region between the strip region and the second strip region, the first conductive thin line is in contact with the second conductive thin line. According to a second aspect, the display device includes the detecting device and the display region, and the first conductive thin wire and the second conductive thin wire are provided in a region overlapping the display region.

以下，針對用以實施發明之形態(實施形態)，一面參照圖式一面詳細說明。本發明不限於以下之實施形態所記載之內容。又，以下所記載之構成要素中包含本領域技術人員可容易設想者，或實質性相同者。再者，以下所記載之構成要素可適當組合。另，揭示僅為一例，本領域技術人員對於在確保發明主旨下進行適當變而可容易設想者，當然含在本發明之範圍內。又，為使說明更明確，圖式與實際之態樣相比，對於各部分之寬度、厚度、形狀等會有示意性顯示之情形，但僅為一例，並非限定本發明之解釋。又，本說明書與各圖中，對關於既有之圖式與上述者相同之要素，附加相同之符號，且適當省略詳細說明。 (實施形態1) 圖1係表示實施形態1之附有觸控檢測功能之顯示裝置之一構成例之方塊圖。附有觸控檢測功能之顯示裝置1具備：附有觸控檢測功能之顯示部10、控制部11、閘極驅動器12、源極驅動器13、驅動電極驅動器14、及觸控檢測部(亦簡稱作檢測部)40。附有觸控檢測功能之顯示部10係將稱作所謂液晶顯示裝置之顯示裝置20與靜電電容型檢測裝置30一體化而成之裝置。另，附有觸控檢測功能之顯示部10亦可為於顯示裝置20之上安裝有靜電電容型檢測裝置30之裝置。另，顯示裝置20亦可為例如有機EL(Electroluminescent：電致發光)顯示裝置。另，閘極驅動器12、源極驅動器13、或驅動電極驅動器14亦可設置於顯示部10。 如後述，顯示裝置20係按照自閘極驅動器12供給之掃描信號Vscan，按每1水平線依序掃描並進行顯示之裝置。控制部11係基於自外部供給之影像信號Vdisp，分別對閘極驅動器12、源極驅動器13、驅動電極驅動器14、及觸控檢測部40供給控制信號，以使該等相互同步動作之方式進行控制之電路(控制裝置)。 閘極驅動器12具有基於自控制部11供給之控制信號，依序選擇成為附有觸控檢測功能之顯示裝置10之顯示驅動之對象之1水平線之功能。 源極驅動器13係基於自控制部11供給之控制信號，對附有觸控檢測功能之顯示部10之後述各子像素SPix供給像素信號Vpix之電路。 驅動電極驅動器14係基於自控制部11供給之控制信號，對附有觸控檢測功能之顯示部10之後述驅動電極COML供給驅動信號Vcom之電路。 觸控檢測部40係如下之電路：基於自控制部11供給之控制信號、及自附有觸控檢測功能之顯示部10之檢測裝置30供給之檢測信號Vdet，檢測有無對檢測裝置30之觸控(後述之接觸或接近之狀態)，於有觸控時求出其於觸控檢測區域中之座標等。該觸控檢測部40具備：檢測信號放大部42、A/D轉換部43、信號處理部44、座標擷取部45、及檢測時序控制部46。 檢測信號放大部42將自檢測裝置30供給之檢測信號Vdet放大。檢測信號放大部42亦可具備低通類比濾波器，其去除檢測信號Vdet中所含之較高頻率成分(雜訊成分)而擷取觸控成分，並分別輸出該等成分。 (靜電電容型觸控檢測之基本原理) 檢測裝置30基於靜電電容型接近檢測之基本原理而動作，輸出檢測信號Vdet。參照圖1～圖6，針對實施形態1之附有觸控檢測功能之顯示裝置10之觸控檢測之基本原理進行說明。圖2係為了說明靜電電容型觸控檢測方式之基本原理，而顯示外部物體例如手指未接觸或接近之狀態之說明圖。圖3係顯示圖2所示之手指未接觸或接近之狀態之等價電路之例之說明圖。圖4係為了說明靜電電容型觸控檢測方式之基本原理，而表示手指接觸或接近之狀態之說明圖。圖5係顯示圖4所示之手指接觸或接近之狀態之等價電路之例之說明圖。圖6係表示驅動信號及檢測信號之波形之一例之圖。另，所謂外部物體，只要為產生後述之靜電電容之物體即可，例如可舉出上述手指或觸控筆。於本實施形態中，作為外部物體，以手指為例進行說明。 例如如圖3及圖5所示，電容元件C1及電容元件C1'具備驅動電極E1及檢測電極E2作為隔著介電質D而相互對向配置之一對電極。如圖3所示，電容元件C1其一端連接於交流信號源(驅動信號源)S，另一端連接於電壓檢測器(觸控檢測部)DET。電壓檢測器DET例如為圖1所示之檢測信號放大部42中所含之積分電路。 若自交流信號源S對驅動電極E1(電容元件C1之一端)施加特定頻率(例如數kHz至數百kHz左右)之交流矩形波Sg，則經由連接於檢測電極E2(電容元件C1之另一端)側之電壓檢測器DET，顯現輸出波形(檢測信號Vdet1)。 於手指未接觸(或接近)之狀態(非接觸狀態)下，如圖2及圖3所示，伴隨對於電容元件C1之充放電，與電容元件C1之電容值對應之電流I0 流動。如圖6所示，電壓檢測器DET將與交流矩形波Sg對應之電流I0 之變動轉換成電壓之變動(實線之波形V0 )。 另一方面，於手指接觸(或接近)之狀態(接觸狀態)下，如圖4所示，藉由手指而形成之靜電電容C2與檢測電極E2相接或位於其附近，而將於驅動電極E1及檢測電極E2之間之邊緣部分之靜電容量遮斷。因此，電容元件C1'之電容值變得小於電容元件C1之電容值。且，以圖5所示之等價電路觀察時，電流I1 流動於電容元件C1'。如圖6所示，電壓檢測器DET將與交流矩形波Sg對應之電流I1 之變動轉換成電壓之變動(虛線之波形V1 )。此時，波形V1 與上述波形V0 相比振幅變小。藉此，波形V0 與波形V1 之電壓差值之絕對值｜ΔV｜會根據手指等自外部接近之物體之影響而變化。另，電壓檢測器DET較佳為高精度地檢測波形V0 與波形V1 之電壓差值之絕對值｜ΔV｜。因此，進而較佳為藉由電路內之切換，配合交流矩形波Sg之頻率而設置重設電容器之充放電期間Reset。 圖1所示之檢測裝置30按照自驅動電極驅動器14供給之驅動信號Vcom，按每1檢測區塊依序掃描而進行觸控檢測。 檢測裝置30自複數個後述之檢測電極TDL經由圖3或圖5所示之電壓檢測器DET，按每檢測區塊輸出檢測信號Vdet1，供給至觸控檢測部40之A/D轉換部43。 A/D轉換部43係以與驅動信號Vcom同步之時序，分別對自檢測信號放大部42輸出之類比信號進行取樣，且將其轉換為數位信號之電路。 信號處理部44具備數位濾波器，其降低對A/D轉換部43之輸出信號中所含之驅動信號Vcom進行取樣之頻率以外之頻率成分(雜訊成分)。信號處理部44係基於A/D轉換部43之輸出信號，檢測有無對檢測裝置30之觸控之邏輯電路。信號處理部44進行僅提取由手指所引起之差值電壓之處理。由該手指所引起之差值電壓係上述波形V0 與波形V1 之差值之絕對值｜ΔV｜。信號處理部44亦可進行將每1檢測區塊之絕對值｜ΔV｜平均化之運算，而求得絕對值｜ΔV｜之平均值。藉此，信號處理部44可降低因雜訊所致之影響。信號處理部44將檢測出之由手指所引起之差值電壓與特定之臨限值電壓進行比較，若為該臨限值電壓以上，則判定為自外部接近之手指之接觸狀態，若小於臨限值電壓，則判定為手指之非接觸狀態。如此，觸控檢測部40可進行觸控檢測。 座標擷取部45係於信號處理部44中檢測出觸控時求出該觸控面板座標之邏輯電路。檢測時序控制部46以A/D轉換部43、信號處理部44、及座標擷取部45同步動作之方式進行控制。座標擷取部45將觸控面板座標作為信號輸出Vout輸出。 圖7及圖8係顯示安裝有實施形態1之附有觸控檢測功能之顯示裝置之模組之一例之俯視圖。圖7係顯示驅動電極之一例之俯視圖，圖8係顯示檢測電極之一例之俯視圖。 如圖7所示，附有觸控檢測功能之顯示裝置1具備TFT(Thin Film Transistor：薄膜電晶體)基板21、及可撓性印刷基板72。TFT基板21搭載COG(Chip On Glass：玻璃覆晶)19，且形成有與顯示裝置20(參照圖1)之顯示區域10a、及包圍顯示區域10a之邊框區域10b相對應之區域。COG19係安裝於TFT基板21之IC驅動器之晶片，且內置有圖1所示之控制部11、閘極驅動器12、源極驅動器13等顯示動作所需之各電路。又，於本實施形態中，閘極驅動器12、源極驅動器13或驅動電極驅動器14亦可形成於玻璃基板即TFT基板21。COG19及驅動電極驅動器14設於邊框區域10b。另，COG19亦可內置有驅動電極驅動器14。該情形時，可縮小邊框區域10b。可撓性印刷基板72與COG19連接，經由可撓性印刷基板72自外部對COG19供給影像信號Vdisp或電源電壓。 如圖7所示，附有觸控檢測功能之顯示部10於重疊於顯示區域10a之區域設有複數個驅動電極COML。複數個驅動電極COML各自於沿著顯示區域10a之一邊之方向延伸，在沿著與顯示區域10a之一邊相交之另一邊之方向上設置間隔而排列。複數個驅動電極COML各自與驅動電極驅動器14連接。 如圖8所示，附有觸控檢測功能之顯示裝置1進而具備基板31、及可撓性印刷基板71。於可撓性印刷基板71上搭載有上述觸控檢測部40。另，觸控檢測部40可搭載於可撓性印刷基板71，亦可搭載於可撓性印刷基板71所連接之另一基板。基板31例如為透光性玻璃基板，且於圖7所示之TFT基板21之表面之垂直方向上與TFT基板21對向。如圖8所示，附有觸控檢測功能之顯示部10在與顯示區域10a重疊之區域設有複數個檢測電極TDL。複數個檢測電極TDL各自在與圖7所示之驅動電極COML之延伸方向交叉之方向延伸。如圖8所示，於相鄰之檢測電極TDL之間有間隔SP。又，複數個檢測電極TDL於驅動電極COML之延伸方向上設置間隔而排列。即，複數個驅動電極COML與複數個檢測電極TDL以立體交叉之方式配置，於互相重疊之部分形成靜電電容。 如後述，附有觸控檢測功能之顯示裝置1於顯示動作時，按每1水平線依序進行掃描。即，附有觸控檢測功能之顯示裝置1係與沿著附有觸控檢測功能之顯示部10之一邊之方向平行地進行顯示掃描(參照圖8)。另一方面，附有觸控檢測功能之顯示裝置1於觸控檢測動作時，藉由自驅動電極驅動器14對驅動電極COML依序施加驅動信號Vcom，而每1檢測線依序進行掃描。即，附有觸控檢測功能之顯示部10係與沿著與附有觸控檢測功能之顯示部10之一邊相交之另一邊之方向平行地進行朝方向SCAN之掃描(參照圖7)。 如圖8所示，本實施形態之檢測電極TDL具有複數條第1導電性細線33U及複數條第2導電性細線33V。第1導電性細線33U及第2導電性細線33V各自相對於與顯示區域10a之一邊平行之方向互相於反方向傾斜。 複數條第1導電性細線33U及第2導電性細線33V各自為細幅，於顯示區域10a中，在與第1導電性細線33U及第2導電性細線33V之延伸方向交叉之方向(顯示區域10a之短邊方向)互相設置間隔而配置。複數條第1導電性細線33U及第2導電性細線33V之延伸方向之兩端連接於配置於邊框區域10b之連接配線34a、34b。藉此，複數條第1導電性細線33U及第2導電性細線33V互相電性連接，作為1個檢測電極TDL發揮功能。於複數條連接配線34a各自連接有配線37，檢測電極TDL與可撓性印刷基板71藉由配線37而連接。另，檢測電極TDL之一部分亦可配置於顯示區域10a外(邊框區域10b)。又，連接配線34a及連接配線34b亦可不配置於邊框區域10b，而配置於顯示區域10a內。複數條連接配線34a及連接配線34b亦可經由配線37而與觸控檢測部40連接，成為用以連接複數條第1導電性細線33U及第2導電性細線33V及觸控檢測部40之配線。 圖9係顯示附有觸控檢測功能之顯示裝置之概要剖面構造之剖面圖。如圖9所示，附有觸控檢測功能之顯示部10具備像素基板2、與垂直於該像素基板2之表面之方向對向配置之對向基板3、及設於像素基板2與對向基板3之間之液晶層6。 像素基板2包含：作為電路基板之TFT基板21、於該TFT基板21之上方陣列狀排列之複數個像素電極22、形成於TFT基板與像素電極22之間之複數個驅動電極COML、及將像素電極22與驅動電極COML絕緣之絕緣層24。於FTF基板21之下側經由接著層66而設有偏光板65。 對向基板3包含基板31、及形成於該基板31之一面之彩色濾光片32。於基板31之另一面，形成檢測裝置30之檢測電極TDL。如圖9所示，於基板31之上方設置檢測電極TDL。再者，於該檢測電極TDL之上，設有用以保護檢測電極TDL之第1導電性細線33U及第2導電性細線33V之保護層38。保護層38可使用丙烯酸系樹脂等透光性樹脂。於保護層38之上，經由接著層39設有偏光板35。 TFT基板21與基板31藉由間隔件61設置特定之間隔而對向配置。於由TFT基板21、基板31、及間隔件61所包圍之空間設置液晶層6。液晶層6係根據電場之狀態調變通過其層之光者，例如使用利用含FFS(邊緣場切換)之IPS(面內切換)等橫電場模式之液晶之顯示面板。另，亦可於圖9所示之液晶層6與像素基板2之間、及液晶層6與對向基板3之間，分別配設配向膜。 圖10係顯示實施形態1之附有觸控檢測功能之顯示裝置之像素配置之電路圖。於圖9所示之TFT基板21，形成有圖10所示之各子像素SPix之薄膜電晶體元件(以下稱FTF元件)Tr、對各像素電極22供給像素信號Vpix之像素信號線SGL、驅動各TFT元件Tr之掃描信號線GCL等配線。像素信號線SGL及掃描信號線GCL在與TFT基板21之表面平行之平面延伸。設圖10所示之與子像素SPix之排列方向正交之方向(掃描信號線GCL之延伸方向)為方向Dx，設子像素SPix之排列方向(像素信號線SGL之延伸方向)為方向Dy。於本實施形態中，方向Dy係人之視感度最高之色區域(後述)所排列之方向。方向Dx係在與對向基板3之表面平行之平面上相對於方向Dy正交之方向。 圖10所示之顯示裝置20具有陣列狀排列之複數個子像素SPix。子像素SPix各自具備TFT元件Tr及液晶元件LC。TFT元件Tr係由薄膜電晶體構成者，於該例中，以n通道MOS(Metal Oxide Semiconductor：金屬氧化物半導體)型TFT構成。TFT元件Tr之源極或汲極之一者連接於像素信號線SGL，閘極連接於掃描信號線GCL，源極或汲極之另一者連接於液晶元件LC之一端。液晶元件LC其一端連接於TFT元件Tr之源極或汲極之另一者，另一端連接於驅動電極COML。 子像素SPix藉由掃描信號線GCL與屬於顯示裝置20之相同列之另一子像素SPix互相連接。掃描信號線GCL連接於閘極驅動器12(參照圖1)，由閘極驅動器12供給掃描信號Vscan。又，子像素SPix藉由像素信號線SGL，與屬於顯示裝置20之相同行之另一子像素SPix互相連接。像素信號線SGL連接於源極驅動器13(參照圖1)，由源極驅動器13供給像素信號Vpix。再者，子像素SPix藉由驅動電極COML而與屬於相同列之另一子像素SPix互相連接。驅動電極COML連接於驅動電極驅動器14(參照圖1)。由驅動電極驅動器14供給驅動信號Vcom。即，於該例中，屬於相同列之複數個子像素SPix共有1條驅動電極COML。本實施形態之驅動電極COML之延伸方向與掃描信號線GCL之延伸方向平行。本實施形態之驅動電極COML之延伸方向並未限定於此。例如驅動電極COML之延伸方向亦可為與像素信號線SGL之延伸方向平行之方向。 圖1所示之閘極驅動器12以依序掃描掃描信號線GCL之方式進行驅動。經由掃描信號線GCL，對子像素SPix之TFT元件Tr之閘極施加掃描信號Vscan(參照圖1)，依序選擇子像素SPix中之1水平線作為顯示驅動之對象。又，附有觸控檢測功能之顯示裝置1係藉由源極驅動器13對屬於1水平線之子像素SPix供給像素信號Vpix，而按每1水平線進行顯示。進行該顯示動作時，驅動電極驅動器14針對對應於該1水平線之驅動電極COML施加驅動信號Vcom。 圖9所示之彩色濾光片32中，週期性排列有例如著色成紅(R)、綠(G)、藍(B)三色之彩色濾光片之色區域32R、色區域32G及色區域32B。於上述圖10所示之各子像素SPix中，以R、G、B三色之色區域32R、色區域32G及色區域32B為1組而相對應，子像素將色區域32R、色區域32G及色區域32B作為1組而構成像素Pix。如圖9所示，彩色濾光片32在與TFT基板21垂直之方向與液晶層對向。另，彩色濾光片32若著色成不同顏色，則亦可與其他顏色組合。又，彩色濾光片32並未限定於三色之組合，亦可為四色以上之組合。 圖11係實施形態1之檢測電極之俯視圖。圖11所示之檢測電極TDL係圖8所示之檢測電極TDL之部分放大圖。圖8所示之檢測電極TDL中，雖看似均等之平行四邊形，但實際之檢測電極TDL之形狀為圖11所示之形狀。 第1導電性細線33U及第2導電性細線33V係以選自鋁(Al)、銅(Cu)、銀(Ag)、鉬(Mo)、鉻(Cr)及鎢(W)之1種以上之金屬層形成。又，第1導電性細線33U及第2導電性細線33V係以含有選自鋁(Al)、銅(Cu)、銀(Ag)、鉬(Mo)、鉻(Cr)及鎢(W)之1種以上之金屬材料之合金形成。又，第1導電性細線33U及第2導電性細線33V亦可為積層有複數層選自該等鋁(Al)、銅(Cu)、銀(Ag)、鉬(Mo)、鉻(Cr)及鎢(W)之1種以上之金屬材料或含有1種以上之該等材料之合金之導電層之積層體。另，第1導電性細線33U及第2導電性細線33V除上述之金屬材料或金屬材料之合金之導電層外，亦可積層ITO((Indium Tin Oxide:氧化銦錫)等透光性導電氧化物之導電層。又，亦可積層組合有上述金屬材料及導電層之黑色化膜、黑色有機膜或黑色導電有機膜。 上述金屬材料之電阻較作為透明電極之材料之ITO等透光性導電氧化物更低。由於上述金屬材料與透光性導電氧化物相比具有遮光性，故透過率可能降低或可能視認到檢測電極TDL之圖案。於本實施形態中，1個檢測電極TDL具有複數條寬細之第1導電性細線33U及複數條第2導電性細線33V，第1導電性細線33U及第2導電性細線33V設置大於線寬之間隔而配置，從而可實現低電阻化與不可視化。其結果，檢測電極TDL低電阻化，可使附有觸控檢測功能之顯示裝置1薄型化、大畫面化或高精細化。 第1導電性細線33U及第2導電性細線33V之寬度較佳為1μm以上10 μm以下，更佳為1μm以上5μm以下之範圍。因為若第1導電性細線33U及第2導電性細線33V之寬度為10 μm以下，則顯示區域10a中覆蓋不以黑色矩陣或後述之掃描信號線GCL及像素信號線SGL抑制光之透過之區域即開口部之面積變小，有損開口率之可能性變低。又，因為若第1導電性細線33U及第2導電性細線33V之寬度為1 μm以上，則形狀穩定，斷線之可能性變低。 參照圖8、圖10及圖11進行說明，檢測電極TDL係以特定之間距配置有複數個第1導電性細線33U及第2導電性細線33V，檢測電極TDL整體在與彩色濾光片32之各色區域32R、色區域32G及色區域32B之延伸方向平行之方向延伸。即，檢測電極TDL在與圖10所示之像素信號線SGL延伸之方向Dy平行之方向延伸。以各第1導電性細線33U及第2導電性細線33V不對彩色濾光片32之特定之色區域遮光之方式，將第1導電性線33U及第2導電性細線33V構成為相互反向傾斜之細線片交叉連接之網眼狀。第1導電性細線33U及第2導電性細線33V相對於與色區域32R、色區域32G及色區域32B之延伸方向(方向Dy)平行之方向具有角度θ，且向互相反向之方向Du及方向Dv傾斜。第1導電性細線33U及第2導電性細線33V於電性連接之部位形成電性連接部33x。例如，角度θ為5度以上75度以下，較佳為25度以上40度以下，更佳為50度以上65度以下。 如此，檢測電極TDL包含向方向Du延伸之至少1條導電性細線33U，及與第1導電性細線33U交叉且朝方向Dv延伸之至少1條第2導電性細線33V。若複數條第1導電性細線33U與複數條第2導電性細線33V分別複數條交叉，則檢測電極TDL之1個網眼之形狀成為平行四邊形。 於本實施形態中，若設最接近連接配線34a之電性連接部33x為交界，則較最接近連接配線34a之電性連接部33x更接近連接配線34a之側、且最接近連接配線34a之電性連接部33x至連接配線34a之區域為檢測電極TDL之端部區域10c(參照圖11)。同樣地，較最接近連接配線34a之電性連接部33x更為遠離連接配線34a之側之區域為檢測電極TDL之主檢測區域10d。 連接配線34a周圍之檢測電極TDL之圖案與連接配線34b周圍之檢測電極之圖案線如圖8所示為對稱或點對稱。因此，以最接近連接配線34b之電性連接部33x為交界，較最接近連接配線34b之電性連接部33x更接近連接配線34b之側、且至連接配線34b為止之區域為檢測電極TDL之端部區域。同樣地，較最接近連接配線34b之電性連接部33x更為遠離連接配線34b之側之區域為檢測電極TDL之主檢測區域。 如圖11所示，於檢測電極TDL之端部區域10c，於第1導電性細線33U延長之位置配置導電性細線33a，連接配線34a與主檢測區域10d之第1導電性細線33U經由導電性細線33a而電性連接。 圖7及圖9所示之驅動電極COML作為對顯示裝置20之複數個像素電極22賦予共通之電位之共通電極發揮功能，且亦作為藉由檢測裝置30之相互靜電電容方式進行觸控檢測時之驅動電極發揮功能。檢測裝置30係由設於像素基板2之驅動電極COML，與設於對向基板3之檢測電極TDL構成。 將驅動電極COML分割成在與圖7所示之顯示區域10a之另一邊平行之方向延伸之複數個電極圖案。檢測電極TDL由具有在與驅動電極COML之電極圖案之延伸方向交叉之方向延伸之複數條金屬配線之電極圖案構成。並且，檢測電極TDL於相對於TFT基板21(參照圖9)之表面垂直之方向上，與驅動電極COML對向。檢測電極TDL之各電極圖案各自連接於觸控檢測部40之檢測信號放大部42之輸入(參照圖1)。由驅動電極COML與檢測電極TDL相互交叉而成之電極圖案於其交叉部分產生靜電電容。 驅動電極COML例如使用ITO等具有透光性之導電性材料。另，檢測電極TDL及驅動電極COML(驅動電極區塊)不限於分割成複數個陣列狀之形狀。例如，檢測電極TDL及驅動電極COML亦可為梳齒形狀。或檢測電極TDL及驅動電極COML只要分割成複數個即可，分割驅動電極COML之峽奉之形狀可為直線，亦可為曲線。 根據該構成，於檢測裝置30中，進行相互靜電電容方式之觸控檢測動作時，驅動電極驅動器14係以作為驅動電極區塊分時依序掃描之方式進行驅動，藉此依序選擇驅動電極COML之1檢測區塊。且，藉由自檢測電極TDL輸出檢測信號Vdet1，而進行1檢測區塊之觸控檢測。即，驅動電極區塊係與上述相互靜電電容方式之觸控檢測之基本原理之驅動電極E1對應，檢測電極TDL係與檢測電極E2對應者。檢測裝置30按照該基本原理檢測觸控輸入。互相立體交叉之檢測電極TDL及驅動電極COML將靜電電容式觸控感測器構成為陣列狀。藉此，藉由遍及檢測裝置30之觸控檢測面全體進行掃描，而可檢測產生來自外部之導體之接觸或接近之位置。 作為附有觸控檢測功能之顯示裝置1之動作方法之一例，附有觸控檢測功能之顯示裝置1分時進行觸控檢測動作(檢測期間)與顯示動作(顯示動作期間)。觸控檢測動作與顯示動作可分為任意方式進行。 另，於本實施形態中，由於驅動電極COML兼用顯示裝置20之共通電極，故於顯示動作期間，控制部11對經由驅動電極驅動器14選擇之驅動電極COML供給顯示用之共通電極電位即驅動信號Vcom。 於檢測期間不使用驅動電極COML，僅以檢測電極TDL進行檢測動作之情形時，例如基於後述之自身靜電電容方式之觸控檢測原理進行觸控檢測之情形時，驅動電極驅動器14亦可對檢測電極TDL供給觸控檢測用之驅動信號Vcom。 如此，檢測電極TDL之第1導電性細線33U及第2導電性細線33V之延伸方向相對於彩色濾光片32之各色區域32R、色區域32G及色區域32B之延伸方向(方向Dy)成角度θ。其結果，檢測電極TDL之第1導電性細線33U及第2導電性細線33V依序將彩色濾光片32之各色區域32R、色區域32G及色區域32B遮光，因此可抑制彩色濾光片32之特定色區域之透過率降低。其結果，實施形態1之檢測裝置不易具有明暗圖樣固定之週期，可降低視認到疊紋之可能性。 於JP-A-2014-041589記載之技術中，可視光入射時以複數個檢測電極繞射或散射之光強度圖案會變得近似複數個散亂之光點。視認者雖可藉由將檢測裝置自身傾斜而改變散射之複數個光強度圖案之光點之位置或數量，但難以降低複數個光強度圖案之光點之視認。於JP-A-2014-041589記載之技術中，相鄰之細線片a及細線片b所成之角度為隨機。因此認為，視認者藉由將檢測裝置自身傾斜，容易產生新的繞射或散射，而易發現散亂之複數個光強度圖案之光點。 與此相對，實施形態1之相對於第1導電性細線33U及第2導電性細線33V之方向Dy所成之角度θ為固定。因此，對第1導電性細線33U及第2導電性細線33V入射可視光時，在各個第1導電性細線33U及第2導電性細線33V繞射或散射之光強度圖案將不易擴散。再者，在各個第1導電性細線33U及第2導電性細線33V繞射或散射之光強度圖案易集中於個4方向，且易發現一定之指向性。並且，視認者藉由將實施形態1之檢測裝置30自身傾斜，而容易避免易發現光強度圖案之角度。 對此，將實施形態1之複數個第1導電性細線33U配置於特定寬度WU之第1帶狀區域UA，且形成有至少包含互相於方向Dv偏錯之2條第1導電性細線33U之複數個第1組群GU(參照圖11)。 同樣地，實施形態1之複數條第2導電性細線33V配置於特定寬度WV之第2帶狀區域VA，且形成有至少包含於方向Du偏錯之2條第2導電性細線33V之複數個第2組群GV(參照圖11)。另，於本實施形態中，亦將特定寬度WU稱作第1寬度、將特定寬度WV稱作第2寬度。 圖12係用以說明實施形態1之檢測電極之配置方法之步驟圖。圖1及圖12所示之複數條第1基準線33SU係於方向Dv等間距配置、且於方向Du延伸之假想線。第1基準線33SU係將第1帶狀區域UA於寬度方向(方向Dv)二等分之直線。同樣地，複數條第2基準線33SV係於方向Du等間距配置、且於方向Dv延伸之假想線。第2基準線33SV係將第2帶狀區域VA於寬度方向(方向Du)二等分之直線。以第1基準線33SU為中心之情形時，特定寬度WU為即使將第1導電性細線33U與第1基準線33SU偏錯亦可之寬度。將於方向Dv相鄰之2條第1基準線33SU間之長度作為第1基準長度SW1時，特定寬度WU為第1基準長度SW1之1/20以上1/5以下。例如特定寬度WU為10 μm以上30 μm以下。以第2基準線33SV為中心之情形時，特定寬度WV為亦可使第2導電性細線33V與第2基準線33SV偏錯之寬度。將於方向Du相鄰之2條第2基準線33SV間之長度作為第2基準長度SW2時，特定寬度WV為第2基準長度SW2之1/20以上1/5以下。例如特定寬度WV為10 μm以上30 μm以下。 即，第1導電性細線33U之長度為鄰接之上述第2基準線33SV間之長度(第2基準長度SW2)之2倍與第2帶狀區域VA之特定寬度WV之差以上。且第1導電性細線33U之長度為鄰接之第2基準線33SV間之長度(第2基準長度SW2)之2倍與第2帶狀區域VA之特定寬度WV之和以下。第2導電性細線33V之長度為鄰接之上述第1基準線33SU間之長度(第1基準長度SW1)之2倍與第1帶狀區域UA之特定寬度WU之差以上。且第2導電性細線33V之長度為鄰接之第1基準線33SU間之長度(第1基準長度SW1)之2倍與第1帶狀區域UA之特定寬度WU之和以下。 如圖12所示，以1條第1導電性細線33U之第1端部U11為基準點進行配置。於基準點中，將第1導電性細線33U相對於方向Dx所成之角度設為角度α。於自第1導電性細線33U之第1端部U11朝向方向Du之第2基準長度SW2之2倍±長度β之位置，配置第1導電性細線33U之第2端部U12。此處，長度β在特定寬度WV/2以內，且為隨機選擇之長度。若決定第1導電性細線33U之第2端部U12自位置，則於自第1導電性細線33U之第2端部U12之位置相對於方向Dx成(90°－α)之角度之方向，於特定寬度WU/2以內之長度、且偏錯隨機選擇之長度γ之位置，配置下一第1導電性細線33U之第1端部U11。重複上述之檢測電極TDL之配置方法，從而於沿著方向Du延伸之1個第1帶狀區域UA內，允許複數條第1導電性細線33U於方向Dv偏錯並進行配置。第2導電性細線33V亦可同樣配置。 如圖11所示，於第1帶狀區域UA與第2帶狀區域VA交叉之交叉區域AX，可成為第1導電性細線33U與第2導電性細線33V相接之電性連接部33x。於包含於方向Dv互相偏錯之2條第1導電性細線33U之交叉區域AX，2條第1導電性細線33U與1條第2導電性細線33V相接而具有2個電性連接部33x。於包含於方向Du互相偏錯之2條第2導電性細線33V之交叉區域AX，具有2條第2導電性細線33V與1條第1導電性細線33U相接之2個電性連接部33x。其結果，抑制第1導電性細線33U與第2導電性細線33V十字交叉之部位。 即，於1條第1導電性細線33U中產生4個電性連接部33x。即，與1條第1導電性細線33U相接之第2導電性細線33V之數量為4條。1條第1導電性細線33U於一端、另一端及中間之2處與第2導電性細線33V相接。 又，於1條第2導電性細線33V中產生4個電性連接部33x。即，與1條第2導電性細線33V相接之第1導電性細線33U之數量為4條。1條第2導電性細線33V於一端、另一端及中間之2處與第1導電性細線33U相接。 (實施形態2) 接著，針對實施形態2之檢測裝置進行說明。圖13係實施形態2之檢測電極之俯視圖。另，對與上述之實施形態1所說明者相同之構成要素附加相同符號，並省略重複說明。 如圖8所示，於相鄰之檢測電極TDL之間有間隔SP。為抑制由視認者視認出間隔SP，而如圖13所示，配置有虛設電極TDD。 於虛設電極TDD中，複數條第1導電性細線33U配置於特定寬度WU之第1帶狀區域UA，且形成有至少包含於方向Dv互相偏錯之2條第1導電性細線33U之複數個第1組群GU。 同樣地，於虛設電極TDD中，複數條第2導電性細線33V配置於特定寬度WV之第2帶狀區域VA，且形成有至少包含於方向Du互相偏錯之2條第2導電性細線33V之複數個第2組群GV。 於虛設電極TDD中，於第1導電性細線33U及第2導電性細線33V之各者設置具有縫隙SL。縫隙SL未形成有構成第1導電性細線33U及第2導電性細線33V之材料，或已藉由蝕刻等予以去除，而成為僅有絕緣性材料之部分。縫隙SL設於鄰接之電性連接部33x之間。電性連接部33x至縫隙SL之距離為固定，藉此可不易視認縫隙SL自身。 虛設電極TDD具備在與構成檢測電極TDL之第1導電性細線33U及第2導電性細線33V相同之方向延伸之構成要素，因此可使間隔SP不可視化，且可降低視認出檢測電極TDL之可能性。 (實施形態2之變形例1) 圖14係實施形態2之變形例1之檢測電極之俯視圖。如圖14所示，虛設電極TDD之隔著縫隙SL之第1導電性細線33U於方向Dv偏錯。同樣地，虛設電極TDD之隔著縫隙SL之第2導電性細線33V於方向Du偏錯。 (實施形態2之變形例2) 圖15係實施形態2之變形例2之檢測電極之俯視圖。如圖15所示，實施形態2之變形例2中，複數個縫隙SL配置於與方向Dy平行之直線LY1上、直線LY2上或直線LY3上。直線LY1係位於1個檢測電極TDL之方向Dx之一端之假想直線，直線LY2係位於1個檢測電極TDL之方向Dx之另一端之假想直線。直線LY3配置於直線LY1與直線LY2之間。例如，直線LY1至直線LY2之寬度WTDL為固定。藉此，隔著虛設電極TDD而鄰接之2個檢測電極TDL之寄生電容大致相同。另，亦可於直線LY1與直線LY2之間具有複數條直線LY3。即，於直線LY1與直線LY2之間之區域，亦可具有複數個以配置於同一直線上之複數個縫隙SL構成之行。 (實施形態3) 接著，針對實施形態3之檢測裝置進行說明。圖16係實施形態3之檢測電極之俯視圖。如圖16所示，於實施形態3中，第1導電性細線33U包含第1主細線331U與第1輔助細線332U。第2導電性細線33V包含第2主細線331V與第2輔助細線332V。另，對與上述實施形態1所說明者相同之構成要素附加相同符號，並省略重複說明。 如圖16所示，複數條第1主細線331U配置於特定寬度WU之第1主帶狀區域UAa。形成有至少包含於方向Dv互相偏錯之2條第1主細線331U之複數個第1主組群GU1。複數條第1輔助細線332U配置於特定寬度WU之第1輔助帶狀區域UAb。形成有至少包含於方向Dv互相偏錯之2條第1輔助細線332U之複數個第1輔助組群GU2。第1主帶狀區域UAa及第1輔助帶狀區域UAb於方向Dv交互以等間距配置。鄰接之第1主帶狀區域UAa與第1輔助帶狀區域UAb之間之長度為第1基準長度SW1。 如圖16所示，複數條第2主細線331V配置於特定寬度WV之第2主帶狀區域VAa。形成有至少包含於方向Du互相偏錯之2條第2主細線331V之複數個第2主組群GV1。複數條第2輔助細線332V配置於特定寬度WV之第2輔助帶狀區域VAb。形成有至少包含於方向Du互相偏錯之2條第2輔助細線332V之複數個第2輔助組群GV2。第2主帶狀區域VAa及第2輔助帶狀區域VAb於方向Du交互以等間距配置。鄰接之第2主帶狀區域VAa與第2輔助帶狀區域VAb之間之長度為第2基準長度SW2。 第1主細線331U之長度為第2基準長度SW2之2倍與特定寬度WV之差以上，且第2基準長度SW2之2倍與特定寬度WV之和以下。於1條第1主細線331U產生2個電性連接部33x。條第2輔助細線332V與第1主細線331U之一端相接，另一第2輔助細線332V與第1主細線331U之另一端相接。再者，於第1主細線331U之中間，2條第2主細線331V相接。即，對1條第1主細線331U相接2條第2主細線331V及2條第2輔助細線332V(4條第2導電性細線33V)。 第1輔助細線332U之長度為特定寬度WV以下。於1條第1輔助細線332U產生2個電性連接部33x。1條第2主細線331V與第1輔助細線332U之一端相接，另一第2主細線331V與第1輔助細線332U之另一端相接。即，對1條第1輔助細線332U相接2條第2主細線331V(2條第2導電性細線33V)。 第2主細線331V之長度為第1基準長度SW1與特定寬度WU之差以上，且第1基準長度SW1與特定寬度WU之和以下。於1條第2主細線331V產生2個電性連接部33x。1條第1主細線331U與第2主細線331V之一端相接，1條第1輔助細線332U與第2主細線331V之另一端相接。即，對1條第2主細線331V相接1條第1主細線331U及1條第1輔助細線332U(2條第1導電性細線33U)。 第2輔助細線332V之長度為特定寬度WU以下。於1條第2輔助細線332V生成2個電性連接部33x。1條第1主細線331U與第2輔助細線332V之一端相接，另一第1主細線331U與第2輔助細線332V之另一端相接。即，對1條第2輔助細線332V相接2條第1主細線331U(2條第1導電性細線33U)。 如圖16所示，於一部分交叉區域AX(交叉區域AX1)產生2個電性連接部33x。另一方面，於另一交叉區域AX(交叉區域AX2)不產生電性連接部33x。 於實施形態3中，與實施形態1相比，由第1導電性細線33U及第2導電性細線33V而形成之多角形之面積不易偏離。因此，於顯示區域10a中開口率易變得均一。 (實施形態4) 接著，針對實施形態4之檢測裝置進行說明。圖17係實施形態4之檢測電極之俯視圖。如圖17所示，於實施形態4中，檢測電極TDL包含第1導電性細線33U、第2導電性細線33V及第3導電性細線33Y。另，對與上述實施形態1說明者相同之構成要素附加相同符號，並省略重複說明。 如圖17所示，複數條第1導電性細線33U配置於特定寬度WU之第1帶狀區域UA。形成有至少包含於方向Dv互相偏錯之2條第1導電性細線33U之複數個第1組群GU。 複數條第2導電性細線33V配置於特定寬度WV之第2帶狀區域VA。形成有至少包含於方向Du互相偏錯之2條第2導電性細線33V之複數個第2組群GV。 複數條第3導電性細線33Y配置於特定寬度WY之第3帶狀區域YA。形成有至少包含於方向Dx互相偏錯之2條第3導電性細線33Y之複數個第3組群GY。另，於實施形態4中，亦將特定寬度WY稱作第3寬度。 複數條基準線33SY係於方向Dx等間距配置，且於方向Dy延伸之假想線。以基準線33SY為中心之情形時，特定寬度WY為即使將第3導電性細線33Y與基準線33SY偏錯亦可之寬度。若將於方向Dx相鄰之2條基準線33SY間之長度設為第3基準長度SW3時，則特定寬度WY為第3基準長度SW3之1/20以上1/5以下。例如特定寬度WY為10 μm以上30 μm以下。 檢測電極TDL之1個網眼之形狀為六角形。即，藉由2條第1導電性細線33U、2條第2導電性細線33V及2條第3導電性細線33Y而形成六角形。 第1帶狀區域UA、第2帶狀區域VA、及第3帶狀區域YA交叉之交叉區域AXX中，1條第1導電性細線33U、1條第2導電性細線33V及1條第3導電性細線33Y相接。即，第3導電性細線33Y與第1導電性細線33U和第2導電性細線33V之交點即電性連接部33xx相接。交叉區域AXX係六角形之區域。於一部分交叉區域AXX中，產生1個電性連接部33xx。另一方面，於其他交叉區域AXX中不產生電性連接部33xx。 如此，檢測電極TDL除第1導電性細線33U及第2導電性細線33V外，亦可具備在與第1導電性細線33U及第2導電性細線33V不同之方向延伸之第3導電性細線33Y。 (實施形態5) 圖18係實施形態5之檢測電極之俯視圖。另，對與上述實施形態1說明者相同之構成要素附加相同符號，並省略重複說明。 如圖18所示，第1帶狀區域UA包含以第1基準線33SU分隔之第1右區域UAa與第1左區域UAb。於實施形態5中，複數條第1導電性細線33U分別配置於第1右區域UAa及第1左區域UAb之任一者。第1導電性細線33U相對於第1基準線33SU之偏離量即長度γ係隨機地選自不含0之特定範圍內之值的值。即，作為長度γ所選擇之值之出現頻率相同。例如，長度γ係選自5 μm至15 μm之範圍內之值。 於1個第1帶狀區域UA中，配置於第1右區域UAa之第1導電性細線33U與配置於第1左區域UAb之第1導電性細線33U沿著方向Du交互排列。即，於1個第1帶狀區域UA中，配置於第1右區域UAa之第1導電性細線33U之相鄰之第1導電性細線33U係配置於第1左區域UAb，且配置於第1左區域UAb之第1導電性細線33U之相鄰之第1導電性細線33U係配置於第1右區域UAa。例如，第1導電性細線33U相對於第1基準線33SU之偏錯方向係由亂數決定。該亂數係由電腦生成。在設計1個第1帶狀區域UA中所含之第1導電性細線33U時，電腦以正值與負值沿著方向Du交互顯現之方式控制亂數。 如圖18所示，第2帶狀區域VA包含以第2基準線33SV分隔之第2右區域VAa與第2左區域VAb。於實施形態5中，複數個第2導電性細線33V分別配置於第2右區域VAa及第2左區域VAb之任一者。第2導電性細線33V相對於第2基準線33SV之偏離量即長度β係隨機地選自不含0之特定範圍內之值的值。即，作為長度β所選擇之值之出現頻率相同。例如，長度β係選自5 μm至15 μm之範圍內之值。 於1個第2帶狀區域VA中，配置於第2右區域VAa之第2導電性細線33V與配置於第2左區域VAb之第2導電性細線33V沿著方向Dv交互排列。即，於1個第2帶狀區域VA中，配置於第2右區域VAa之第2導電性細線33V之相鄰之第2導電性細線33V係配置於第2左區域VAb，且配置於第2左區域VAb之第2導電性細線33V之相鄰之第2導電性細線33V係配置於第2右區域VAa。例如，第2導電性細線33V相對於第2基準線33SV之偏錯方向係藉亂數決定。該亂數係由電腦生成。在設計1個第2帶狀區域VA中所含之第2導電性細線33V時，電腦以正值與負值沿著方向Dv交互顯現之方式控制亂數。 根據上述構成，如圖18所示，第1導電性細線33U及第2導電性細線33V不為十字交叉。因此，電性連接部33x之周邊區域之開口率與其他區域之開口率之間之差變小，因此視認性提高。 (實施形態6) 圖19係實施形態6之檢測電極之俯視圖。如圖19所示，實施形態6之檢測電極TDL具有包含複數條第1導電性細線33U及複數條第2導電性細線33V之複數個檢測區塊TDLB。例如，複數個檢測區塊TDLB陣列狀排列於與基板31平行之平面上。複數個檢測區塊TDLB各自藉由配線37而連接於可撓性印刷基板71(參照圖8)。實施形態6之檢測裝置30非為相互靜電電容方式，而進行自身靜電電容方式之觸控檢測動作。 接著，參照圖20，針對自身靜電電容方式之觸控檢測之基本原理進行說明。圖20係顯示自身靜電電容方式之觸控檢測之等價電路之一例之說明圖。 如圖20所示，於檢測電極E2連接有電壓檢測器DET。電壓檢測器DET係包含經虛短路之運算放大器之檢測電路。若對非反轉輸入部(+)施加特定頻率(例如數kHz至數百kHz左右)之交流矩形波Sg，則對檢測電極E2施加同電位之交流矩形波Sg。 於手指等導體未接觸或接近之狀態(非接觸狀態)下，流動與檢測電極E2所具有之電容Cx1對應之電流。電壓檢測器DET將與交流矩形波Sg對應之電流之變動轉換成電壓之變動(波形)。於手指等導體接觸或接近之狀態(接觸狀態)下，對檢測電極E2所具有之電容Cx1加入由接近檢測電極E2之手指產生之電容Cx2，流動與較非接觸狀態之電容更為增加之電容(Cx1+Cx2)對應之電流。電壓檢測器DET將與交流矩形波Sg對應之電流之變動轉換成電壓之變動(波形)。接觸狀態之波形之振幅與非接觸狀態之波形之振幅相比變大。藉此，接觸狀態之波形與非接觸狀態之波形之電壓差值之絕對值會根據手指等自外部接觸或接近之導體之影響而變化。開關SW於進行觸控檢測時成接通(打開)狀態，於不進行觸控檢測時成斷開(閉合)狀態，而進行電壓檢測器DET之重設動作。 又，應理解對於由上述實施形態所述之態樣所帶來之其他作用效果，由本說明書記載而明瞭者，或本領域技術人員可適當想到者，當然可藉由本發明獲得。 本發明可廣泛應用於以下態樣之檢測裝置及顯示裝置。 (1)一種檢測裝置，其具備：基板； 複數條第1導電性細線，其設置於與上述基板平行之面上，且於第1方向延伸； 複數條第2導電性細線，其設置於與上述第1導電性細線同一層上，且在與上述第1方向成角度之第2方向延伸； 第1組群，其配置於第1寬度之第1帶狀區域，且至少包含於上述第2方向互相偏錯之2條上述第1導電性細線；及 第2組群，其配置於第2寬度之第2帶狀區域，且至少包含於上述第1方向互相偏錯之2條上述第2導電性細線，且 於上述第1帶狀區域與上述第2帶狀區域之交叉區域中，上述第1導電性細線與上述第2導電性細線相接。 (2)如(1)之檢測裝置，其中 於上述第1帶狀區域與上述第2帶狀區域之交叉區域中，具有上述第1導電性細線與上述第2導電性細線相接之兩個連接部。 (3)如(1)或(2)之檢測裝置，其中 具有上述第1導電性細線與上述第2導電性細線相接之複數個連接部，於兩個連接部間之上述第1導電性細線或上述第2導電性細線具有縫隙。 (4)如(1)至(3)中任一項之檢測裝置，其中 上述第1導電性細線與上述第2導電性細線所包圍之1個網眼為平行四邊形。 (5)如(1)至(4)中任一項之檢測裝置，其中 設將上述第1帶狀區域於寬度方向二等分之直線為第1基準線，設將上述第2帶狀區域於寬度方向二等分之直線為第2基準線時， 上述第1導電性細線之長度為鄰接之上述第2基準線間之長度之2倍與上述第2帶狀區域之第2寬度之差以上，且為鄰接之上述第2基準線間之長度之2倍與上述第2帶狀區域之第2寬度之和以下， 上述第2導電性細線之長度為鄰接之上述第1基準線間之長度之2倍與上述第1帶狀區域之第1寬度之差以上，且為鄰接之上述第1基準線間之長度之2倍與上述第1帶狀區域之第1寬度之和以下。 (6)如(1)之檢測裝置，其中 上述第1導電性細線包含配置於第1寬度之第1主帶狀區域之第1主細線、及配置於第1寬度之第1輔助帶狀區域之第1輔助細線， 上述第2導電性細線包含配置於第2寬度之第2主帶狀區域之第2主細線、及配置於第2寬度之第2輔助帶狀區域之第2輔助細線， 1條上述第1主細線與2條上述第2主細線、及2條上述第2輔助細線相接， 1條上述第1輔助細線與2條上述第2主細線相接， 1條上述第2主細線與1條上述第1主細線、及1條上述第1輔助細線相接， 1條上述第2輔助細線與2條上述第1主細線相接。 (7)如(1)之檢測裝置，其中具備： 複數條第3導電性細線，其設置於與上述第1導電性細線同一層上，且在與上述第1方向及上述第2方向成角度之第3方向延伸；及 第3組群，其配置於第3寬度之第3帶狀區域，且至少包含於相對於上述第3方向正交之方向互相偏錯之2條上述第3導電性細線， 於上述第1帶狀區域、上述第2帶狀區域及上述第3帶狀區域之交叉區域中，上述第1導電性細線、上述第2導電性細線及上述第3導電性細線相接。 (8)如(1)之檢測裝置，其中 上述第1帶狀區域包含以將第1帶狀區域於上述第2方向二等分之第1基準線分隔之第1右區域及第1左區域， 於1個上述第1帶狀區域中，將配置於上述第1右區域之上述第1導電性細線，與配置於上述第1左區域之上述第1導電性細線沿著上述第1方向交替排列， 上述第2帶狀區域包含以將第2帶狀區域於上述第1方向二等分之第2基準線分隔之第2右區域及第2左區域， 於1個上述第2區域中，配置於上述第2右區域之上述第2導電性細線，與配置於上述第2左區域之上述第2導電性細線沿著上述第2方向交替排列。 (9)一種顯示裝置，其具備： 檢測裝置、及顯示區域，且 上述檢測裝置具備： 基板； 複數條第1導電性細線，其設置於與上述基板平行之面上，且於第1方向延伸； 複數條第2導電性細線，其設置於與上述第1導電性細線同一層上，且在與上述第1方向成角度之第2方向延伸； 第1組群，其配置於第1寬度之第1帶狀區域，且至少包含於上述第2方向互相偏錯之2條上述第1導電性細線； 第2組群，其配置於第2寬度之第2帶狀區域，且至少包含於上述第1方向互相偏錯之2條上述第2導電性細線，且 於上述第1帶狀區域與上述第2帶狀區域之交叉區域中，上述第1導電性細線與上述第2導電性細線相接，在與上述顯示裝置重疊之區域，設置上述第1導電性細線與上述第2導電性細線。 (10)如(9)之顯示裝置，其中 於上述第1帶狀區域與上述第2帶狀區域之交叉區域中，具有上述第1導電性細線與上述第2導電性細線相接之兩個連接部。 (11)如(9)或(11)之顯示裝置，其中 具有上述第1導電性細線與上述第2導電性細線相接之複數個連接部，於2個連接部間之上述第1導電性細線或上述第2導電性細線具有縫隙。 (12)如(9)至(11)中任一項之顯示裝置，其中 上述第1導電性細線與上述第2導電性細線所包圍之1個網眼為平行四邊形。 (13)如(9)至(12)中任一項之顯示裝置，其中 設將上述第1帶狀區域於寬度方向二等分之直線為第1基準線，設將上述第2帶狀區域於寬度方向二等分之直線為第2基準線時， 上述第1導電性細線之長度為鄰接之上述第2基準線間之長度之2倍與上述第2帶狀區域之第2寬度之差以上，且為鄰接之上述第2基準線間之長度之2倍與上述第2帶狀區域之第2寬度之和以下， 上述第2導電性細線之長度為鄰接之上述第1基準線間之長度之2倍與上述第1帶狀區域之第1寬度之差以上，且為鄰接之上述第1基準線間之長度之2倍與上述第1帶狀區域之第1寬度之和以下。 (14)如(9)之顯示裝置，其中 上述第1導電性細線包含配置於第1寬度之第1主帶狀區域之第1主細線、及配置於第1寬度之第1輔助帶狀區域之第1輔助細線， 上述第2導電性細線包含配置於第2寬度之第2主帶狀區域之第2主細線、及配置於第2寬度之第2輔助帶狀區域之第2輔助細線， 1條上述第1主細線與2條上述第2主細線、及2條上述第2輔助細線相接， 1條上述第1輔助細線與2條上述第2主細線相接， 1條上述第2主細線與1條上述第1主細線、及1條上述第1輔助細線相接， 1條上述第2輔助細線與2條上述第1主細線相接。 (15)如(9)之顯示裝置，其中具備： 複數條第3導電性細線，其設置於與上述第1導電性細線同一層上，在與上述第1方向及上述第2方向成角度之第3方向延伸；及 第3組群，其配置於第3寬度之第3帶狀區域，且至少包含於相對於上述第3方向正交之方向互相偏錯之2條上述第3導電性細線，且 於上述第1帶狀區域、上述第2帶狀區域及上述第3帶狀區域之交叉區域中，上述第1導電性細線、上述第2導電性細線及上述第3導電性細線相接。 (16)如(9)之顯示裝置，其中 上述第1帶狀區域包含以將上述第1帶狀區域於上述第2方向二等分之第1基準線分隔之第1右區域及第1左區域， 於1個上述第1帶狀區域中，配置於上述第1右區域之上述第1導電性細線，與配置於上述第1左區域之上述第1導電性細線沿著上述第1方向交替排列， 上述第2帶狀區域包含以將第2帶狀區域於上述第1方向二等分之第2基準線分隔之第2右區域及第2左區域， 於1個上述第2帶狀區域中，配置於上述第2右區域之上述第2導電性細線，與配置於上述第2左區域之上述第2導電性細線沿著上述第2方向交替排列。Hereinafter, the form (embodiment) for carrying out the invention will be described in detail with reference to the drawings. The present invention is not limited to the contents described in the following embodiments. Further, among the constituent elements described below, those skilled in the art can easily conceive or substantially the same. Furthermore, the constituent elements described below can be combined as appropriate. Further, the disclosure is merely an example, and those skilled in the art can easily conceive it by appropriately changing the spirit of the invention, and are of course included in the scope of the invention. Further, in order to clarify the description, the drawings have a schematic display of the width, thickness, shape, and the like of each portion as compared with the actual embodiment, but are merely examples and do not limit the explanation of the present invention. In the present specification, the same reference numerals are given to the same elements as those in the above description, and the detailed description is omitted as appropriate. (Embodiment 1) FIG. 1 is a block diagram showing a configuration example of a display device with a touch detection function according to Embodiment 1. The display device 1 with a touch detection function includes a display unit 10 with a touch detection function, a control unit 11, a gate driver 12, a source driver 13, a drive electrode driver 14, and a touch detection unit (also referred to as a touch detection unit). As a detecting unit) 40. The display unit 10 with a touch detection function is a device in which a display device 20 called a liquid crystal display device and an electrostatic capacitance type detection device 30 are integrated. Further, the display unit 10 with the touch detection function may be a device in which the capacitance type detecting device 30 is mounted on the display device 20. Further, the display device 20 may be, for example, an organic EL (Electroluminescent) display device. Further, the gate driver 12, the source driver 13, or the driving electrode driver 14 may be provided on the display unit 10. As will be described later, the display device 20 is a device that sequentially scans and displays each of the horizontal lines in accordance with the scanning signal Vscan supplied from the gate driver 12. The control unit 11 supplies control signals to the gate driver 12, the source driver 13, the drive electrode driver 14, and the touch detection unit 40 based on the image signal Vdisp supplied from the outside, so that the signals are synchronized with each other. Control circuit (control device). The gate driver 12 has a function of sequentially selecting one horizontal line to be the target of the display driving of the display device 10 with the touch detection function based on the control signal supplied from the control unit 11. The source driver 13 is a circuit that supplies the pixel signal Vpix to each of the sub-pixels SPix to be described later on the display unit 10 with the touch detection function based on the control signal supplied from the control unit 11. The drive electrode driver 14 is a circuit that supplies a drive signal Vcom to the drive electrode COML, which will be described later, on the display unit 10 with the touch detection function, based on a control signal supplied from the control unit 11. The touch detection unit 40 is a circuit that detects the presence or absence of a touch on the detection device 30 based on a control signal supplied from the control unit 11 and a detection signal Vdet supplied from the detection device 30 of the display unit 10 to which the touch detection function is attached. The control (the state of contact or proximity described later) finds the coordinates in the touch detection area when there is touch. The touch detection unit 40 includes a detection signal amplifying unit 42, an A/D conversion unit 43, a signal processing unit 44, a coordinate acquisition unit 45, and a detection timing control unit 46. The detection signal amplifying unit 42 amplifies the detection signal Vdet supplied from the detecting device 30. The detection signal amplifying unit 42 may further include a low-pass analog filter that removes a higher frequency component (noise component) included in the detection signal Vdet, extracts a touch component, and outputs the components. (Basic Principle of Capacitive Touch Detection) The detecting device 30 operates based on the basic principle of electrostatic capacitance type proximity detection, and outputs a detection signal Vdet. The basic principle of the touch detection of the display device 10 with the touch detection function according to the first embodiment will be described with reference to Figs. 1 to 6 . FIG. 2 is an explanatory diagram showing a state in which an external object such as a finger is not in contact or in proximity to explain the basic principle of the electrostatic capacitance type touch detection method. Fig. 3 is an explanatory view showing an example of an equivalent circuit in a state in which the finger shown in Fig. 2 is not in contact or in proximity. FIG. 4 is an explanatory view showing a state in which a finger is in contact or close to explain the basic principle of the electrostatic capacitance type touch detection method. Fig. 5 is an explanatory view showing an example of an equivalent circuit in a state in which the finger shown in Fig. 4 is in contact or in proximity. Fig. 6 is a view showing an example of waveforms of a drive signal and a detection signal. In addition, the external object may be an object that generates an electrostatic capacitance to be described later, and examples thereof include the above-described finger or stylus. In the present embodiment, a finger is taken as an example of an external object. For example, as shown in FIGS. 3 and 5, the capacitive element C1 and the capacitive element C1' include the drive electrode E1 and the detection electrode E2 as a pair of electrodes disposed opposite to each other with the dielectric D interposed therebetween. As shown in FIG. 3, the capacitive element C1 has one end connected to an AC signal source (drive signal source) S and the other end connected to a voltage detector (touch detection unit) DET. The voltage detector DET is, for example, an integrating circuit included in the detection signal amplifying portion 42 shown in FIG. When an AC rectangular wave Sg of a specific frequency (for example, several kHz to several hundreds of kHz) is applied to the driving electrode E1 (one end of the capacitive element C1) from the AC signal source S, it is connected to the detecting electrode E2 (the other end of the capacitive element C1). The side voltage detector DET exhibits an output waveform (detection signal Vdet1). In the state where the finger is not in contact (or close to) (non-contact state), as shown in FIGS. 2 and 3, the current I corresponding to the capacitance value of the capacitive element C1 is charged and discharged with respect to the capacitive element C1. 0 flow. As shown in FIG. 6, the voltage detector DET will have a current I corresponding to the alternating rectangular wave Sg. 0 The change is converted into a voltage change (solid line waveform V 0 ). On the other hand, in a state in which the finger is in contact (or close) (contact state), as shown in FIG. 4, the electrostatic capacitance C2 formed by the finger is in contact with or in the vicinity of the detecting electrode E2, and the driving electrode is to be driven. The electrostatic capacity of the edge portion between E1 and the detecting electrode E2 is interrupted. Therefore, the capacitance value of the capacitive element C1' becomes smaller than the capacitance value of the capacitive element C1. And, when observed by the equivalent circuit shown in FIG. 5, the current I 1 Flows to the capacitive element C1'. As shown in FIG. 6, the voltage detector DET will have a current I corresponding to the alternating rectangular wave Sg. 1 The change is converted into a voltage change (dashed waveform V 1 ). At this time, the waveform V 1 With the above waveform V 0 The amplitude is smaller than that. Thereby, the waveform V 0 With waveform V 1 The absolute value of the voltage difference |ΔV| varies depending on the influence of an object such as a finger that is approached from the outside. In addition, the voltage detector DET preferably detects the waveform V with high precision. 0 With waveform V 1 The absolute value of the voltage difference |ΔV|. Therefore, it is preferable to set the charge/discharge period Reset of the reset capacitor by the frequency of the alternating rectangular wave Sg by switching in the circuit. The detecting device 30 shown in FIG. 1 performs touch detection in accordance with the driving signal Vcom supplied from the driving electrode driver 14 in order of scanning for each detection block. The detection device 30 supplies the detection signal Vdet1 to each of the detection blocks from the plurality of detection electrodes TDL, which will be described later, via the voltage detector DET shown in FIG. 3 or FIG. 5, and supplies it to the A/D conversion unit 43 of the touch detection unit 40. The A/D conversion unit 43 samples the analog signal output from the detection signal amplifying unit 42 at a timing synchronized with the drive signal Vcom, and converts the analog signal into a digital signal circuit. The signal processing unit 44 includes a digital filter that reduces a frequency component (noise component) other than the frequency at which the drive signal Vcom included in the output signal of the A/D conversion unit 43 is sampled. The signal processing unit 44 detects the presence or absence of a logic circuit for touching the detection device 30 based on the output signal of the A/D conversion unit 43. The signal processing unit 44 performs a process of extracting only the difference voltage caused by the finger. The difference voltage caused by the finger is the above waveform V 0 With waveform V 1 The absolute value of the difference |ΔV|. The signal processing unit 44 may perform an operation of averaging the absolute value |ΔV| per one detection block, The average value of the absolute value |ΔV| is obtained. With this, The signal processing unit 44 can reduce the influence due to noise. The signal processing unit 44 compares the detected difference voltage caused by the finger with a specific threshold voltage. If it is above the threshold voltage, Then, it is determined that the contact state of the finger approaching from the outside, If it is less than the threshold voltage, Then it is determined that the finger is in a non-contact state. in this way, The touch detection unit 40 can perform touch detection. The coordinate capturing unit 45 is a logic circuit that determines the touch panel coordinates when the signal processing unit 44 detects the touch. The detection timing control unit 46 is an A/D conversion unit 43, Signal processing unit 44, The coordinates capturing unit 45 is controlled in synchronization. The coordinate capturing unit 45 outputs the touch panel coordinates as a signal output Vout. 7 and 8 are plan views showing an example of a module in which the display device with the touch detection function of the first embodiment is mounted. Figure 7 is a plan view showing an example of a driving electrode, Fig. 8 is a plan view showing an example of a detecting electrode. As shown in Figure 7, The display device 1 with a touch detection function is provided with a TFT (Thin Film Transistor: Thin film transistor) substrate 21, And a flexible printed circuit board 72. The TFT substrate 21 is equipped with COG (Chip On Glass: Glass flip chip)19, And a display area 10a formed with the display device 20 (refer to FIG. 1), And an area corresponding to the frame area 10b surrounding the display area 10a. The COG 19 is a chip mounted on an IC driver of the TFT substrate 21, And the control unit 11 shown in FIG. 1 is built in, Gate driver 12, The source driver 13 or the like displays each circuit required for the operation. also, In this embodiment, Gate driver 12, The source driver 13 or the drive electrode driver 14 may be formed on the TFT substrate 21 which is a glass substrate. The COG 19 and the drive electrode driver 14 are provided in the bezel area 10b. another, The COG 19 may also have a drive electrode driver 14 built therein. In this case, The frame area 10b can be reduced. The flexible printed circuit board 72 is connected to the COG 19, The video signal Vdisp or the power supply voltage is supplied to the COG 19 from the outside via the flexible printed circuit board 72. As shown in Figure 7, The display unit 10 with the touch detection function is provided with a plurality of drive electrodes COML in a region overlapping the display region 10a. Each of the plurality of driving electrodes COML extends in a direction along one of the sides of the display region 10a. Arranged in a direction along the other side intersecting one of the sides of the display area 10a. A plurality of drive electrodes COML are each connected to the drive electrode driver 14. As shown in Figure 8, The display device 1 with a touch detection function further includes a substrate 31, And a flexible printed circuit board 71. The touch detection unit 40 is mounted on the flexible printed circuit board 71. another, The touch detection unit 40 can be mounted on the flexible printed circuit board 71. It can also be mounted on another substrate to which the flexible printed circuit board 71 is connected. The substrate 31 is, for example, a translucent glass substrate. Further, it faces the TFT substrate 21 in the vertical direction of the surface of the TFT substrate 21 shown in FIG. As shown in Figure 8, The display unit 10 with the touch detection function is provided with a plurality of detection electrodes TDL in a region overlapping the display region 10a. Each of the plurality of detecting electrodes TDL extends in a direction crossing the extending direction of the driving electrode COML shown in FIG. As shown in Figure 8, There is a gap SP between adjacent detection electrodes TDL. also, The plurality of detecting electrodes TDL are arranged at intervals in the extending direction of the driving electrodes COML. which is, A plurality of driving electrodes COML and a plurality of detecting electrodes TDL are arranged in a three-dimensional intersection manner. The electrostatic capacitance is formed in the overlapping portions. As will be described later, When the display device 1 with the touch detection function is displayed, Scan in order of each horizontal line. which is, The display device 1 with the touch detection function performs display scanning in parallel with the direction along one side of the display unit 10 with the touch detection function (see FIG. 8). on the other hand, When the display device 1 with the touch detection function is in the touch detection operation, The drive signal Vcom is sequentially applied to the drive electrode COML by the self-driving electrode driver 14, And every 1 detection line is scanned sequentially. which is, The display unit 10 with the touch detection function performs scanning in the direction SCAN in parallel with the direction intersecting the other side of the display unit 10 with the touch detection function (see FIG. 7). As shown in Figure 8, The detecting electrode TDL of the present embodiment has a plurality of first conductive thin wires 33U and a plurality of second conductive thin wires 33V. Each of the first conductive thin wires 33U and the second conductive thin wires 33V is inclined in a direction opposite to each other with respect to a direction parallel to one side of the display region 10a. Each of the plurality of first conductive thin wires 33U and the second conductive thin wires 33V is thin. In the display area 10a, The direction intersecting the extending direction of the first conductive thin wires 33U and the second conductive thin wires 33V (the short side direction of the display region 10a) is arranged at intervals. Both ends of the plurality of first conductive thin wires 33U and the second conductive thin wires 33V in the extending direction are connected to the connection wiring 34a disposed in the frame region 10b, 34b. With this, The plurality of first conductive thin wires 33U and the second conductive thin wires 33V are electrically connected to each other. It functions as one detection electrode TDL. Wirings 37 are connected to each of the plurality of connection wires 34a. The detecting electrode TDL and the flexible printed circuit board 71 are connected by a wiring 37. another, A portion of the detecting electrode TDL may also be disposed outside the display region 10a (frame region 10b). also, The connection wiring 34a and the connection wiring 34b may not be disposed in the frame region 10b. It is disposed in the display area 10a. The plurality of connection wires 34a and the connection wires 34b may be connected to the touch detection unit 40 via the wires 37. The wiring for connecting the plurality of first conductive thin wires 33U and the second conductive thin wires 33V and the touch detecting portion 40. Fig. 9 is a cross-sectional view showing a schematic cross-sectional structure of a display device with a touch detection function. As shown in Figure 9, The display unit 10 with a touch detection function is provided with a pixel substrate 2 a counter substrate 3 disposed opposite to a direction perpendicular to a surface of the pixel substrate 2, And a liquid crystal layer 6 disposed between the pixel substrate 2 and the counter substrate 3. The pixel substrate 2 includes: a TFT substrate 21 as a circuit substrate, a plurality of pixel electrodes 22 arranged in an array above the TFT substrate 21, a plurality of driving electrodes COML formed between the TFT substrate and the pixel electrode 22, And an insulating layer 24 that insulates the pixel electrode 22 from the driving electrode COML. A polarizing plate 65 is provided on the lower side of the FTF substrate 21 via the bonding layer 66. The opposite substrate 3 includes a substrate 31, And a color filter 32 formed on one surface of the substrate 31. On the other side of the substrate 31, The detecting electrode TDL of the detecting device 30 is formed. As shown in Figure 9, A detecting electrode TDL is disposed above the substrate 31. Furthermore, Above the detection electrode TDL, A protective layer 38 for protecting the first conductive thin wires 33U and the second conductive thin wires 33V of the detecting electrode TDL is provided. As the protective layer 38, a light-transmitting resin such as an acrylic resin can be used. Above the protective layer 38, A polarizing plate 35 is provided via the adhesive layer 39. The TFT substrate 21 and the substrate 31 are disposed to face each other with a predetermined interval between the spacers 61. On the TFT substrate 21, Substrate 31, The liquid crystal layer 6 is provided in a space surrounded by the spacer 61. The liquid crystal layer 6 is modulated by the light of the layer according to the state of the electric field. For example, a display panel using a liquid crystal in a horizontal electric field mode such as IPS (Fringe Field Switching) including FFS (Fringe Field Switching) is used. another, It can also be between the liquid crystal layer 6 and the pixel substrate 2 shown in FIG. And between the liquid crystal layer 6 and the opposite substrate 3, An alignment film is provided separately. Fig. 10 is a circuit diagram showing a pixel arrangement of a display device with a touch detection function according to the first embodiment. In the TFT substrate 21 shown in FIG. 9, a thin film transistor element (hereinafter referred to as an FTF element) Tr having the sub-pixels SPix shown in FIG. 10 is formed, The pixel signal line SGL of the pixel signal Vpix is supplied to each of the pixel electrodes 22, Wiring such as the scanning signal line GCL of each TFT element Tr is driven. The pixel signal line SGL and the scanning signal line GCL extend in a plane parallel to the surface of the TFT substrate 21. It is assumed that the direction orthogonal to the arrangement direction of the sub-pixels SPix (the direction in which the scanning signal line GCL extends) is the direction Dx, It is assumed that the arrangement direction of the sub-pixels SPix (the direction in which the pixel signal line SGL extends) is the direction Dy. In this embodiment, Direction Dy is the direction in which the color regions with the highest visual acuity (described later) are arranged. The direction Dx is a direction orthogonal to the direction Dy on a plane parallel to the surface of the opposite substrate 3. The display device 20 shown in FIG. 10 has a plurality of sub-pixels SPix arranged in an array. Each of the sub-pixels SPix includes a TFT element Tr and a liquid crystal element LC. The TFT element Tr is composed of a thin film transistor, In this case, With n-channel MOS (Metal Oxide Semiconductor: A metal oxide semiconductor type TFT is formed. One of the source or the drain of the TFT element Tr is connected to the pixel signal line SGL, The gate is connected to the scanning signal line GCL, The other of the source or the drain is connected to one end of the liquid crystal element LC. One end of the liquid crystal element LC is connected to the other of the source or the drain of the TFT element Tr. The other end is connected to the drive electrode COML. The sub-pixel SPix is connected to another sub-pixel SPix belonging to the same column of the display device 20 by the scanning signal line GCL. The scanning signal line GCL is connected to the gate driver 12 (refer to FIG. 1), The scan signal Vscan is supplied from the gate driver 12. also, The sub-pixel SPix is by the pixel signal line SGL, Another sub-pixel SPix belonging to the same row as the display device 20 is connected to each other. The pixel signal line SGL is connected to the source driver 13 (refer to FIG. 1), The pixel signal Vpix is supplied from the source driver 13. Furthermore, The sub-pixel SPix is connected to another sub-pixel SPix belonging to the same column by the drive electrode COML. The drive electrode COML is connected to the drive electrode driver 14 (refer to FIG. 1). The drive signal Vcom is supplied from the drive electrode driver 14. which is, In this case, A plurality of sub-pixels SPix belonging to the same column share one drive electrode COML. The extending direction of the drive electrode COML of the present embodiment is parallel to the extending direction of the scanning signal line GCL. The extending direction of the drive electrode COML of the present embodiment is not limited to this. For example, the extending direction of the driving electrode COML may be a direction parallel to the extending direction of the pixel signal line SGL. The gate driver 12 shown in FIG. 1 is driven to sequentially scan the scanning signal line GCL. Via the scanning signal line GCL, A scan signal Vscan is applied to the gate of the TFT element Tr of the sub-pixel SPix (refer to FIG. 1), A horizontal line in the sub-pixel SPix is sequentially selected as an object of display driving. also, The display device 1 with the touch detection function supplies the pixel signal Vpix to the sub-pixel SPix belonging to one horizontal line by the source driver 13. And display every 1 horizontal line. When performing this display action, The drive electrode driver 14 applies a drive signal Vcom to the drive electrode COML corresponding to the one horizontal line. In the color filter 32 shown in FIG. 9, Periodically arranged, for example, colored to red (R), Green (G), Blue (B) three-color color filter color area 32R, The color area 32G and the color area 32B. In each of the sub-pixels SPix shown in FIG. 10 above, With R, G, B tricolor area 32R, The color area 32G and the color area 32B correspond to one set, The sub-pixel will have a color area 32R, The color area 32G and the color area 32B constitute a pixel Pix as one set. As shown in Figure 9, The color filter 32 faces the liquid crystal layer in a direction perpendicular to the TFT substrate 21. another, If the color filter 32 is colored in a different color, It can also be combined with other colors. also, The color filter 32 is not limited to a combination of three colors. It can also be a combination of four or more colors. Fig. 11 is a plan view showing the detecting electrode of the first embodiment. The detecting electrode TDL shown in FIG. 11 is a partially enlarged view of the detecting electrode TDL shown in FIG. In the detecting electrode TDL shown in FIG. 8, Although seemingly equal parallelograms, However, the shape of the actual detecting electrode TDL is the shape shown in FIG. The first conductive thin wire 33U and the second conductive thin wire 33V are selected from aluminum (Al), Copper (Cu), Silver (Ag), Molybdenum (Mo), One or more metal layers of chromium (Cr) and tungsten (W) are formed. also, The first conductive thin wire 33U and the second conductive thin wire 33V are selected from aluminum (Al), Copper (Cu), Silver (Ag), Molybdenum (Mo), An alloy of one or more kinds of metal materials of chromium (Cr) and tungsten (W) is formed. also, The first conductive thin wires 33U and the second conductive thin wires 33V may be laminated with a plurality of layers selected from the aluminum (Al), Copper (Cu), Silver (Ag), Molybdenum (Mo), A laminated body of one or more kinds of metal materials of chromium (Cr) and tungsten (W) or a conductive layer containing an alloy of one or more of these materials. another, The first conductive thin wire 33U and the second conductive thin wire 33V are in addition to the conductive layer of the metal material or the alloy of the metal material described above, It is also possible to laminate ITO ((Indium Tin Oxide: A conductive layer of a light-transmitting conductive oxide such as indium tin oxide. also, A blackening film in which the above metal material and the conductive layer are combined may be laminated, Black organic film or black conductive organic film. The electrical resistance of the above metal material is lower than that of a light-transmitting conductive oxide such as ITO which is a material of a transparent electrode. Since the above metal material is light-shielding compared to the light-transmitting conductive oxide, Therefore, the transmittance may be lowered or the pattern of the detecting electrode TDL may be recognized. In this embodiment, One of the detecting electrodes TDL has a plurality of first conductive thin wires 33U and a plurality of second conductive thin wires 33V. The first conductive thin wires 33U and the second conductive thin wires 33V are disposed at intervals larger than the line width, and are disposed. Thereby, low resistance and non-visualization can be achieved. the result, The detection electrode TDL is low in resistance, The display device 1 with the touch detection function can be made thinner, Large screen or high definition. The width of the first conductive thin wire 33U and the second conductive thin wire 33V is preferably 1 μm or more and 10 μm or less. More preferably, it is a range of 1 μm or more and 5 μm or less. When the width of the first conductive thin wire 33U and the second conductive thin wire 33V is 10 μm or less, The area of the display region 10a that covers the region where the light is not transmitted by the black matrix or the scanning signal line GCL and the pixel signal line SGL, which will be described later, is small, and the area of the opening is small. The possibility of loss of the aperture ratio becomes low. also, When the width of the first conductive thin wire 33U and the second conductive thin wire 33V is 1 μm or more, The shape is stable, The possibility of disconnection becomes lower. Referring to Figure 8, 10 and 11 are explained, The detecting electrode TDL is provided with a plurality of first conductive thin wires 33U and second conductive thin wires 33V at a predetermined interval. The detecting electrode TDL is entirely in the respective color regions 32R of the color filter 32, The extending direction of the color region 32G and the color region 32B extends in parallel. which is, The detecting electrode TDL extends in a direction parallel to the direction Dy in which the pixel signal line SGL shown in FIG. 10 extends. The first conductive thin wires 33U and the second conductive thin wires 33V do not block the specific color region of the color filter 32. The first conductive wire 33U and the second conductive thin wire 33V are formed in a mesh shape in which the thin wires which are inclined in opposite directions are cross-connected. The first conductive thin wire 33U and the second conductive thin wire 33V are opposed to the color region 32R, The direction in which the extending direction (direction Dy) of the color region 32G and the color region 32B are parallel has an angle θ, And it is inclined in the direction Du and the direction Dv which are opposite to each other. The first conductive thin wire 33U and the second conductive thin wire 33V form an electrical connection portion 33x at a portion where the electrical connection is electrically connected. E.g, The angle θ is 5 degrees or more and 75 degrees or less. It is preferably 25 degrees or more and 40 degrees or less. More preferably, it is 50 degrees or more and 65 degrees or less. in this way, The detecting electrode TDL includes at least one conductive thin wire 33U extending in the direction Du, And at least one second conductive thin line 33V that intersects with the first conductive thin line 33U and extends in the direction Dv. When a plurality of first conductive thin wires 33U and a plurality of second conductive thin wires 33V are respectively intersected, Then, the shape of one mesh of the detecting electrode TDL becomes a parallelogram. In this embodiment, If the electrical connection portion 33x closest to the connection wiring 34a is the boundary, The electrical connection portion 33x closest to the connection wiring 34a is closer to the side of the connection wiring 34a, The region closest to the electrical connection portion 33x of the connection wiring 34a to the connection wiring 34a is the end portion region 10c of the detection electrode TDL (see FIG. 11). Similarly, The region closer to the side of the connection wiring 34a than the electrical connection portion 33x closest to the connection wiring 34a is the main detection region 10d of the detection electrode TDL. The pattern of the detection electrode TDL around the connection wiring 34a and the pattern line of the detection electrode around the connection wiring 34b are symmetrical or point-symmetric as shown in FIG. therefore, The electrical connection portion 33x closest to the connection wiring 34b is at the boundary, The electrical connection portion 33x closest to the connection wiring 34b is closer to the side of the connection wiring 34b, The region up to the connection wiring 34b is an end region of the detection electrode TDL. Similarly, The area closer to the side of the connection wiring 34b than the electrical connection portion 33x closest to the connection wiring 34b is the main detection area of the detection electrode TDL. As shown in Figure 11, In the end region 10c of the detecting electrode TDL, The conductive thin wire 33a is disposed at a position where the first conductive thin wire 33U is extended. The connection wiring 34a and the first conductive thin wires 33U of the main detection region 10d are electrically connected via the conductive thin wires 33a. The drive electrode COML shown in FIGS. 7 and 9 functions as a common electrode that supplies a common potential to the plurality of pixel electrodes 22 of the display device 20, Moreover, the driving electrode functions as a driving electrode when the touch detection is performed by the mutual capacitance of the detecting device 30. The detecting device 30 is provided by a driving electrode COML provided on the pixel substrate 2, It is composed of a detection electrode TDL provided on the counter substrate 3. The drive electrode COML is divided into a plurality of electrode patterns extending in a direction parallel to the other side of the display region 10a shown in FIG. The detecting electrode TDL is composed of an electrode pattern having a plurality of metal wires extending in a direction crossing the extending direction of the electrode pattern of the driving electrode COML. and, The detecting electrode TDL is in a direction perpendicular to the surface of the TFT substrate 21 (refer to FIG. 9), Opposes the drive electrode COML. Each of the electrode patterns of the detecting electrode TDL is connected to an input of the detecting signal amplifying portion 42 of the touch detecting unit 40 (see FIG. 1). The electrode pattern formed by the intersection of the drive electrode COML and the detection electrode TDL generates an electrostatic capacitance at an intersection portion thereof. As the drive electrode COML, for example, a light-transmitting conductive material such as ITO is used. another, The detecting electrode TDL and the driving electrode COML (driving electrode block) are not limited to being divided into a plurality of array shapes. E.g, The detecting electrode TDL and the driving electrode COML may also have a comb shape. Or the detecting electrode TDL and the driving electrode COML may be divided into a plurality of pieces, The shape of the gap of the split drive electrode COML can be a straight line. It can also be a curve. According to this configuration, In the detecting device 30, When performing mutual touch detection of electrostatic capacitance, The driving electrode driver 14 is driven in a manner of sequential scanning as a driving electrode block. Thereby, the detection block of the drive electrode COML is sequentially selected. And, The detection signal Vdet1 is outputted from the detecting electrode TDL, And the touch detection of 1 detection block is performed. which is, The driving electrode block corresponds to the driving electrode E1 of the basic principle of the above-described electrostatic capacitance type touch detection, The detection electrode TDL is associated with the detection electrode E2. The detecting device 30 detects the touch input in accordance with the basic principle. The detecting electrodes TDL and the driving electrodes COML which are three-dimensionally intersected each other form the capacitive touch sensors in an array. With this, By scanning the entire touch detection surface of the detecting device 30, It is possible to detect the location of the contact or proximity of the conductor from the outside. As an example of the operation method of the display device 1 with the touch detection function, The display device 1 with the touch detection function performs a touch detection operation (detection period) and a display operation (display operation period) in a time division manner. The touch detection action and the display action can be performed in any manner. another, In this embodiment, Since the driving electrode COML also serves as a common electrode of the display device 20, Therefore, during the display action, The control unit 11 supplies a drive signal Vcom which is a common electrode potential for display to the drive electrode COML selected via the drive electrode driver 14. The drive electrode COML is not used during the test, When the detection electrode TDL is used for the detection operation only, For example, when the touch detection is performed based on the touch detection principle of the self-capacitance method described later, The drive electrode driver 14 can also supply the drive signal Vcom for touch detection to the detection electrode TDL. in this way, The extending direction of the first conductive thin wires 33U and the second conductive thin wires 33V of the detecting electrode TDL is opposite to the color regions 32R of the color filter 32, The extending direction (direction Dy) of the color region 32G and the color region 32B is at an angle θ. the result, The first conductive thin wires 33U and the second conductive thin wires 33V of the detecting electrode TDL sequentially connect the color regions 32R of the color filter 32, The color area 32G and the color area 32B are shielded from light. Therefore, it is possible to suppress a decrease in transmittance of a specific color region of the color filter 32. the result, The detecting device of the first embodiment is not easy to have a fixed period of the light and dark pattern, It reduces the possibility of visually recognizing the moiré. In the technique described in JP-A-2014-041589, When the visible light is incident, the pattern of light intensity diffracted or scattered by a plurality of detecting electrodes becomes approximately a plurality of scattered light spots. The viewer may change the position or number of light spots of the plurality of scattered light intensity patterns by tilting the detecting device itself. However, it is difficult to reduce the visibility of the light spots of a plurality of light intensity patterns. In the technique described in JP-A-2014-041589, The angle formed by the adjacent thin wire a and the thin wire b is random. So think that By viewing the detection device itself, the viewer Easy to generate new diffraction or scattering, It is easy to find the light spots of a plurality of scattered light intensity patterns. in comparison, The angle θ formed by the direction Dy of the first conductive thin wire 33U and the second conductive thin wire 33V in the first embodiment is fixed. therefore, When visible light is incident on the first conductive thin wire 33U and the second conductive thin wire 33V, The light intensity pattern that is diffracted or scattered by each of the first conductive thin wires 33U and the second conductive thin wires 33V is less likely to diffuse. Furthermore, The light intensity pattern diffracted or scattered by each of the first conductive thin wires 33U and the second conductive thin wires 33V tends to be concentrated in four directions. And easy to find a certain degree of directivity. and, The viewer recognizes the detecting device 30 of the first embodiment by itself. It is easy to avoid the angle at which the light intensity pattern is easily found. In this regard, The plurality of first conductive thin wires 33U of the first embodiment are disposed in the first strip-shaped region UA of the specific width WU, Further, a plurality of first group GUs (see FIG. 11) including at least two first conductive thin wires 33U which are offset from each other in the direction Dv are formed. Similarly, The plurality of second conductive thin wires 33V of the first embodiment are disposed in the second strip-shaped region VA of the specific width WV, Further, a plurality of second group GVs (see FIG. 11) including at least two second conductive thin wires 33V which are biased in the direction Du are formed. another, In this embodiment, The specific width WU is also referred to as the first width, The specific width WV is referred to as a second width. Fig. 12 is a view showing the steps of a method of arranging the detecting electrodes in the first embodiment. The plurality of first reference lines 33SU shown in FIG. 1 and FIG. 12 are arranged at equal intervals in the direction Dv. And an imaginary line extending in the direction Du. The first reference line 33SU is a straight line that bisects the first strip-shaped region UA in the width direction (direction Dv). Similarly, The plurality of second reference lines 33SV are arranged at equal intervals in the direction Du, And an imaginary line extending in the direction Dv. The second reference line 33SV is a straight line that bisects the second strip-shaped region VA in the width direction (direction Du). When the first reference line 33SU is centered, The specific width WU is a width that can be obtained by biasing the first conductive thin line 33U and the first reference line 33SU. When the length between the two first reference lines 33SU adjacent to the direction Dv is the first reference length SW1, The specific width WU is 1/20 or more and 1/5 or less of the first reference length SW1. For example, the specific width WU is 10 μm or more and 30 μm or less. When the second reference line 33SV is centered, The specific width WV is a width that can bias the second conductive thin line 33V and the second reference line 33SV. When the length between the two second reference lines 33SV adjacent in the direction Du is the second reference length SW2, The specific width WV is 1/20 or more and 1/5 or less of the second reference length SW2. For example, the specific width WV is 10 μm or more and 30 μm or less. which is, The length of the first conductive thin wire 33U is equal to or greater than the difference between the length between the adjacent second reference line 33SV (second reference length SW2) and the specific width WV of the second strip-shaped region VA. The length of the first conductive thin wire 33U is equal to or less than the sum of the length between the adjacent second reference line 33SV (second reference length SW2) and the specific width WV of the second strip-shaped region VA. The length of the second conductive thin wire 33V is equal to or greater than the difference between the length between the adjacent first reference line 33SU (the first reference length SW1) and the specific width WU of the first strip-shaped region UA. The length of the second conductive thin wire 33V is equal to or less than the sum of the length between the adjacent first reference line 33SU (the first reference length SW1) and the specific width WU of the first strip-shaped region UA. As shown in Figure 12, The first end portion U11 of the one first conductive thin wire 33U is disposed as a reference point. In the benchmark, The angle formed by the first conductive thin wire 33U with respect to the direction Dx is defined as an angle α. The position from the first end portion U11 of the first conductive thin line 33U to the second reference length SW2 of the direction Du is twice as long as the length β. The second end portion U12 of the first conductive thin wire 33U is disposed. Here, The length β is within a specific width WV/2, And the length is randomly selected. When the second end portion U12 of the first conductive thin wire 33U is determined from the position, Then, the position from the second end U12 of the first conductive thin line 33U is at an angle of (90°-α) with respect to the direction Dx, Within a certain width of WU/2, And the location of the length γ of the randomly selected error, The first end portion U11 of the next first conductive thin wire 33U is disposed. Repeating the above-described configuration method of the detecting electrode TDL, Therefore, in one first strip-shaped region UA extending along the direction Du, The plurality of first conductive thin wires 33U are allowed to be misaligned in the direction Dv and arranged. The second conductive thin wires 33V can also be arranged in the same manner. As shown in Figure 11, In the intersection area AX where the first strip-shaped region UA and the second strip-shaped region VA intersect, The electrical connection portion 33x that is in contact with the first conductive thin wire 33V and the second conductive thin wire 33V can be obtained. In the intersection area AX of the two first conductive thin wires 33U included in the direction Dv which are mutually offset, The two first conductive thin wires 33U are in contact with one of the second conductive thin wires 33V, and have two electrical connecting portions 33x. In the intersection area AX of the two second conductive thin wires 33V included in the direction Du which are mutually offset, The two electrical connecting portions 33x having the two second conductive thin wires 33V and the one first conductive thin wires 33U are in contact with each other. the result, The portion where the first conductive thin wire 33U and the second conductive thin wire 33V cross each other is suppressed. which is, Four electrical connecting portions 33x are generated in one of the first conductive thin wires 33U. which is, The number of the second conductive thin wires 33V that are in contact with the one first conductive thin wire 33U is four. 1 first conductive thin line 33U is at one end, The other end and the middle portion are in contact with the second conductive thin wire 33V. also, Four electrical connecting portions 33x are generated in one of the second conductive thin wires 33V. which is, The number of the first conductive thin wires 33U that are in contact with one of the second conductive thin wires 33V is four. One second conductive thin wire 33V is at one end, The other end and the middle portion are in contact with the first conductive thin wire 33U. (Embodiment 2) Next, The detection device of the second embodiment will be described. Fig. 13 is a plan view showing the detecting electrode of the second embodiment. another, The same components as those described in the first embodiment are denoted by the same reference numerals. Duplicate descriptions are omitted. As shown in Figure 8, There is a gap SP between adjacent detection electrodes TDL. In order to suppress the recognition of the interval SP by the visual recognizer, And as shown in Figure 13, The dummy electrode TDD is configured. In the dummy electrode TDD, The plurality of first conductive thin wires 33U are disposed in the first strip-shaped region UA of the specific width WU, Further, a plurality of first group GUs including at least two first conductive thin wires 33U in which the directions Dv are offset from each other are formed. Similarly, In the dummy electrode TDD, The plurality of second conductive thin wires 33V are disposed in the second strip-shaped region VA of the specific width WV, Further, a plurality of second group GVs including at least two second conductive thin wires 33V which are offset from each other in the direction Du are formed. In the dummy electrode TDD, Each of the first conductive thin wires 33U and the second conductive thin wires 33V is provided with a slit SL. The slit SL is not formed with a material constituting the first conductive thin wire 33U and the second conductive thin wire 33V. Or has been removed by etching, etc. It becomes part of the only insulating material. The slit SL is provided between the adjacent electrical connecting portions 33x. The distance between the electrical connection portion 33x and the slit SL is fixed. Thereby, the slit SL itself can be easily recognized. The dummy electrode TDD includes constituent elements extending in the same direction as the first conductive thin line 33U and the second conductive thin line 33V constituting the detecting electrode TDL. Therefore, the interval SP can be made invisible. Moreover, the possibility of visually recognizing the detection electrode TDL can be reduced. (Variation 1 of the second embodiment) Fig. 14 is a plan view showing a detecting electrode according to a first modification of the second embodiment. As shown in Figure 14, The first conductive thin line 33U of the dummy electrode TDD via the slit SL is misaligned in the direction Dv. Similarly, The second conductive thin line 33V of the dummy electrode TDD via the slit SL is misaligned in the direction Du. (Variation 2 of the second embodiment) Fig. 15 is a plan view showing a detecting electrode according to a second modification of the second embodiment. As shown in Figure 15, In the second modification of the second embodiment, The plurality of slits SL are disposed on a straight line LY1 parallel to the direction Dy, Straight line LY2 or straight line LY3. The straight line LY1 is an imaginary straight line located at one end of the direction Dx of one detecting electrode TDL. The straight line LY2 is an imaginary straight line located at the other end of the direction Dx of one detecting electrode TDL. The straight line LY3 is disposed between the straight line LY1 and the straight line LY2. E.g, The width WTDL of the straight line LY1 to the straight line LY2 is fixed. With this, The parasitic capacitances of the two detecting electrodes TDL adjacent to each other across the dummy electrode TDD are substantially the same. another, It is also possible to have a plurality of straight lines LY3 between the straight line LY1 and the straight line LY2. which is, In the area between the straight line LY1 and the straight line LY2, There may be a plurality of rows formed by a plurality of slits SL arranged on the same straight line. (Embodiment 3) Next, The detection device of the third embodiment will be described. Fig. 16 is a plan view showing a detecting electrode of the third embodiment. As shown in Figure 16, In the third embodiment, The first conductive thin wire 33U includes the first main thin wire 331U and the first auxiliary thin wire 332U. The second conductive thin line 33V includes the second main thin line 331V and the second auxiliary thin line 332V. another, The same components as those described in the first embodiment are denoted by the same reference numerals. Duplicate descriptions are omitted. As shown in Figure 16, The plurality of first main thin lines 331U are disposed in the first main strip-shaped area UAA of the specific width WU. A plurality of first main group groups GU1 including at least two first main thin lines 331U in which the directions Dv are offset from each other are formed. The plurality of first auxiliary thin wires 332U are disposed in the first auxiliary band-shaped region UAb of the specific width WU. A plurality of first auxiliary groups GU2 including at least two first auxiliary thin lines 332U that are offset from each other in the direction Dv are formed. The first main strip-shaped area UAA and the first auxiliary strip-shaped area UAb are alternately arranged in the direction Dv. The length between the adjacent first main strip-shaped region UAA and the first auxiliary strip-shaped region UAb is the first reference length SW1. As shown in Figure 16, The plurality of second main thin lines 331V are disposed in the second main strip-shaped region Vaa of the specific width WV. A plurality of second main group groups GV1 including at least two second main thin lines 331V that are offset from each other in the direction Du are formed. The plurality of second auxiliary thin wires 332V are disposed in the second auxiliary band-shaped region VAb of the specific width WV. A plurality of second auxiliary groups GV2 including at least two second auxiliary thin lines 332V that are offset from each other in the direction Du are formed. The second main strip-shaped region Vaa and the second auxiliary strip-shaped region VAb are alternately arranged in the direction Du. The length between the adjacent second main strip-shaped region Vaa and the second auxiliary strip-shaped region VAb is the second reference length SW2. The length of the first main thin line 331U is equal to or larger than the difference between the second reference length SW2 and the specific width WV. Further, the second reference length SW2 is equal to or less than the sum of the specific widths WV. Two electrical connecting portions 33x are generated in one first main thin line 331U. The second auxiliary thin wire 332V is connected to one end of the first main thin wire 331U, The other second auxiliary thin wire 332V is in contact with the other end of the first main thin wire 331U. Furthermore, In the middle of the first main thin line 331U, Two second main thin lines 331V are connected. which is, The two first main thin wires 331V and the two second auxiliary thin wires 332V (four second conductive thin wires 33V) are connected to one of the first main thin wires 331U. The length of the first auxiliary thin wire 332U is equal to or less than a specific width WV. Two electrical connecting portions 33x are generated in one first auxiliary thin wire 332U. One second main thin line 331V is connected to one end of the first auxiliary thin line 332U, The other second main thin line 331V is in contact with the other end of the first auxiliary thin line 332U. which is, The two first auxiliary thin wires 332U are connected to the two second main thin wires 331V (two second conductive thin wires 33V). The length of the second main thin line 331V is equal to or larger than the difference between the first reference length SW1 and the specific width WU. And the sum of the first reference length SW1 and the specific width WU is equal to or less. Two electrical connecting portions 33x are generated in one second main thin line 331V. One of the first main thin lines 331U is connected to one end of the second main thin line 331V, One of the first auxiliary thin wires 332U is in contact with the other end of the second main thin wire 331V. which is, One first main thin line 331U and one first auxiliary thin line 332U (two first conductive thin lines 33U) are connected to one second main thin line 331V. The length of the second auxiliary thin wire 332V is equal to or less than a specific width WU. Two electrical connecting portions 33x are formed in one second auxiliary thin wire 332V. One of the first main thin wires 331U is connected to one end of the second auxiliary thin wire 332V, The other first main thin line 331U is in contact with the other end of the second auxiliary thin line 332V. which is, Two first main thin wires 331U (two first conductive thin wires 33U) are connected to one second auxiliary thin wire 332V. As shown in Figure 16, Two electrical connection portions 33x are generated in a part of the intersection area AX (intersection area AX1). on the other hand, The electrical connection portion 33x is not generated in the other intersection area AX (intersection area AX2). In the third embodiment, Compared with the first embodiment, The area of the polygon formed by the first conductive thin wire 33U and the second conductive thin wire 33V is not easily deviated. therefore, The aperture ratio tends to be uniform in the display region 10a. (Embodiment 4) Next, The detection device of the fourth embodiment will be described. Figure 17 is a plan view showing a detecting electrode of the fourth embodiment. As shown in Figure 17, In the fourth embodiment, The detecting electrode TDL includes the first conductive thin wire 33U, The second conductive thin wire 33V and the third conductive thin wire 33Y. another, The same components as those described in the first embodiment are denoted by the same reference numerals. Duplicate descriptions are omitted. As shown in Figure 17, The plurality of first conductive thin wires 33U are disposed in the first strip-shaped region UA of the specific width WU. A plurality of first group groups GU including at least two first conductive thin wires 33U that are offset from each other in the direction Dv are formed. The plurality of second conductive thin wires 33V are disposed in the second strip-shaped region VA of the specific width WV. A plurality of second group GVs including at least two second conductive thin wires 33V that are offset from each other in the direction Du are formed. The plurality of third conductive thin wires 33Y are disposed in the third strip-shaped region YA of the specific width WY. A plurality of third group GYs including at least two third conductive thin wires 33Y which are offset from each other in the direction Dx are formed. another, In the fourth embodiment, The specific width WY is also referred to as a third width. A plurality of reference lines 33SY are arranged at equal intervals in the direction Dx. And an imaginary line extending in the direction Dy. When the reference line 33SY is centered, The specific width WY is a width that can be made even if the third conductive thin line 33Y and the reference line 33SY are offset. When the length between the two reference lines 33SY adjacent to the direction Dx is set to the third reference length SW3, The specific width WY is 1/20 or more and 1/5 or less of the third reference length SW3. For example, the specific width WY is 10 μm or more and 30 μm or less. The shape of one mesh of the detecting electrode TDL is hexagonal. which is, By two first conductive thin wires 33U, The two second conductive thin wires 33V and the two third conductive thin wires 33Y form a hexagonal shape. The first strip area UA, The second strip region VA, And in the intersection area AXX where the third strip-shaped region YA intersects, 1 first conductive thin line 33U, One of the second conductive thin wires 33V and one of the third conductive thin wires 33Y are in contact with each other. which is, The third conductive thin wire 33Y is in contact with the electrical connection portion 33xx which is the intersection of the first conductive thin wire 33U and the second conductive thin wire 33V. The intersection area AXX is a hexagonal area. In a part of the intersection area AXX, One electrical connection portion 33xx is generated. on the other hand, The electrical connection portion 33xx is not generated in the other intersection regions AXX. in this way, The detection electrode TDL is in addition to the first conductive thin line 33U and the second conductive thin line 33V, The third conductive thin wires 33Y extending in a direction different from the first conductive thin wires 33U and the second conductive thin wires 33V may be provided. (Fifth Embodiment) Fig. 18 is a plan view showing a detecting electrode of a fifth embodiment. another, The same components as those described in the first embodiment are denoted by the same reference numerals. Duplicate descriptions are omitted. As shown in Figure 18, The first band-shaped region UA includes a first right region Uaa and a first left region UAb separated by a first reference line 33SU. In the fifth embodiment, The plurality of first conductive thin wires 33U are disposed in any one of the first right area UAA and the first left area UAB. The length γ, which is the amount of deviation of the first conductive thin line 33U from the first reference line 33SU, is randomly selected from values that do not include values within a specific range of zero. which is, The values selected as the length γ appear at the same frequency. E.g, The length γ is selected from values in the range of 5 μm to 15 μm. In one first strip region UA, The first conductive thin wires 33U disposed in the first right region UAA and the first conductive thin wires 33U disposed in the first left region UAb are alternately arranged along the direction Du. which is, In one first strip region UA, The first conductive thin wires 33U adjacent to the first conductive thin wires 33U disposed in the first right region UAA are disposed in the first left region UAb. The first conductive thin wires 33U adjacent to the first conductive thin wires 33U disposed in the first left region UAb are disposed in the first right region UAA. E.g, The direction of the error of the first conductive thin line 33U with respect to the first reference line 33SU is determined by the random number. This random number is generated by a computer. When the first conductive thin line 33U included in one of the first strip-shaped regions UA is designed, The computer controls the random number in such a way that positive and negative values appear alternately along the direction Du. As shown in Figure 18, The second strip-shaped region VA includes a second right region Vaa and a second left region VAb that are separated by a second reference line 33SV. In the fifth embodiment, The plurality of second conductive thin wires 33V are respectively disposed in any one of the second right region Vaa and the second left region VAb. The length β which is the amount of deviation of the second conductive thin line 33V from the second reference line 33SV is randomly selected from values which do not include values within a specific range of 0. which is, The values selected as the length β appear at the same frequency. E.g, The length β is selected from values in the range of 5 μm to 15 μm. In one second strip-shaped region VA, The second conductive thin wires 33V disposed in the second right region VAa and the second conductive thin wires 33V disposed in the second left region VAb are alternately arranged along the direction Dv. which is, In one second strip-shaped region VA, The second conductive thin wires 33V adjacent to the second conductive thin wires 33V disposed in the second right region VVA are disposed in the second left region VAb. The second conductive thin wires 33V adjacent to the second conductive thin wires 33V disposed in the second left region VAb are disposed in the second right region Vaa. E.g, The direction in which the second conductive thin line 33V is offset with respect to the second reference line 33SV is determined by a random number. This random number is generated by a computer. When the second conductive thin line 33V included in one of the second strip-shaped regions VA is designed, The computer controls the random number in such a way that positive and negative values appear interactively along the direction Dv. According to the above composition, As shown in Figure 18, The first conductive thin wire 33U and the second conductive thin wire 33V are not crossed. therefore, The difference between the aperture ratio of the peripheral region of the electrical connection portion 33x and the aperture ratio of the other regions becomes small. Therefore, the visibility is improved. (Embodiment 6) Fig. 19 is a plan view showing a detecting electrode of a sixth embodiment. As shown in Figure 19, The detecting electrode TDL of the sixth embodiment has a plurality of detecting blocks TDLB including a plurality of first conductive thin wires 33U and a plurality of second conductive thin wires 33V. E.g, A plurality of detection blocks TDLB are arranged in an array on a plane parallel to the substrate 31. Each of the plurality of detection blocks TDLB is connected to the flexible printed circuit board 71 by wirings 37 (see FIG. 8). The detecting device 30 of the sixth embodiment is not a mutual electrostatic capacitance method. The touch detection action of the self-capacitance mode is performed. then, Referring to Figure 20, The basic principle of touch detection in its own electrostatic capacitance mode will be described. Fig. 20 is an explanatory diagram showing an example of an equivalent circuit of touch detection by its own electrostatic capacitance method. As shown in Figure 20, A voltage detector DET is connected to the detecting electrode E2. The voltage detector DET is a detection circuit including an operational amplifier of a virtual short circuit. When an AC rectangular wave Sg of a specific frequency (for example, several kHz to several hundreds of kHz) is applied to the non-inverting input unit (+), Then, an alternating rectangular wave Sg of the same potential is applied to the detecting electrode E2. In a state where the conductor such as a finger is not in contact or close (non-contact state), The current corresponding to the capacitance Cx1 of the detecting electrode E2 flows. The voltage detector DET converts the fluctuation of the current corresponding to the alternating-current rectangular wave Sg into a voltage variation (waveform). Under the state of contact or proximity of a conductor such as a finger (contact state), Adding a capacitance Cx1 generated by the finger of the detecting electrode E2 to the capacitance Cx1 of the detecting electrode E2, The current corresponding to the capacitance (Cx1+Cx2) that flows more than the capacitor in the non-contact state. The voltage detector DET converts the fluctuation of the current corresponding to the alternating-current rectangular wave Sg into a voltage variation (waveform). The amplitude of the waveform of the contact state becomes larger than the amplitude of the waveform of the non-contact state. With this, The absolute value of the voltage difference between the waveform of the contact state and the waveform of the non-contact state varies depending on the influence of a finger or the like from the external contact or the proximity of the conductor. The switch SW is turned on (opened) when the touch detection is performed. In the open (closed) state when the touch detection is not performed, The reset operation of the voltage detector DET is performed. also, It should be understood that other effects brought about by the aspects described in the above embodiments are As stated in the description of this manual, Or those skilled in the art may think of it, Of course, it can be obtained by the present invention. The present invention can be widely applied to the following detection devices and display devices. (1) A detecting device, It has: Substrate a plurality of first conductive thin wires, It is disposed on a plane parallel to the substrate, And extending in the first direction; a plurality of second conductive thin wires, It is disposed on the same layer as the first conductive thin wire. And extending in a second direction at an angle to the first direction; Group 1 group, It is disposed in the first strip-shaped region of the first width, And at least two of the first conductive thin wires that are offset from each other in the second direction; And the second group, It is disposed in the second strip-shaped region of the second width, And at least two of the second conductive thin wires which are offset from each other in the first direction, And in an intersection of the first strip-shaped region and the second strip-shaped region, The first conductive thin wire is in contact with the second conductive thin wire. (2) The detection device of (1), Wherein the intersection of the first strip-shaped region and the second strip-shaped region, The connection portion having the first conductive thin wire and the second conductive thin wire are in contact with each other. (3) A detection device such as (1) or (2), The plurality of connection portions each having the first conductive thin wire and the second conductive thin wire are in contact with each other; The first conductive thin wire or the second conductive thin wire between the two connecting portions has a slit. (4) The detecting device according to any one of (1) to (3), The first conductive thin wire and the one mesh surrounded by the second conductive thin wire are parallelograms. (5) The detecting device according to any one of (1) to (4), The straight line in which the first strip-shaped region is equally divided in the width direction is the first reference line. When the straight line in which the second strip-shaped region is equally divided in the width direction is the second reference line, The length of the first conductive thin wire is equal to or larger than a difference between twice the length between the adjacent second reference lines and the second width of the second band-shaped region. And the sum of the length between the second reference line adjacent to the second reference line and the second width of the second band-shaped area is equal to or less than The length of the second conductive thin wire is equal to or larger than a difference between twice the length between the adjacent first reference lines and the first width of the first band-shaped region. Further, it is equal to or less than the sum of the length between the first reference lines adjacent to each other and the first width of the first band-shaped region. (6) The detection device of (1), The first conductive thin wire includes a first main thin line disposed in the first main strip-shaped region of the first width, And a first auxiliary thin line disposed in the first auxiliary strip-shaped region of the first width, The second conductive thin wire includes a second main thin line disposed in the second main strip-shaped region of the second width, And a second auxiliary thin line disposed in the second auxiliary strip-shaped region of the second width, 1 first main thin line and two second main thin lines, And two of the above-mentioned second auxiliary thin wires are connected, One of the first auxiliary thin wires is connected to the two second main thin wires, 1 second main thin line and one first main thin line, And one of the first auxiliary thin wires mentioned above is connected, One of the second auxiliary thin wires is in contact with the two first main thin wires. (7) The detecting device of (1), Among them: a plurality of third conductive thin wires, It is disposed on the same layer as the first conductive thin wire. And extending in a third direction at an angle to the first direction and the second direction; And the third group, It is disposed in the third strip-shaped region of the third width, And at least two of the third conductive thin wires which are offset from each other in a direction orthogonal to the third direction, In the first band-shaped region, In the intersection of the second strip-shaped region and the third strip-shaped region, The first conductive thin wire, The second conductive thin wire and the third conductive thin wire are in contact with each other. (8) The detecting device of (1), The first band-shaped region includes a first right region and a first left region that are separated by a first reference line that bisects the first band-shaped region in the second direction. In one of the above first strip-shaped regions, The first conductive thin wire disposed in the first right region, The first conductive thin wires disposed in the first left region are alternately arranged along the first direction. The second band-shaped region includes a second right region and a second left region that are separated by a second reference line that bisects the second band-shaped region in the first direction. In one of the above second regions, The second conductive thin wire disposed in the second right region, The second conductive thin wires arranged in the second left region are alternately arranged along the second direction. (9) A display device, It has: Testing device, And the display area, And the above detection device has: Substrate a plurality of first conductive thin wires, It is disposed on a plane parallel to the substrate, And extending in the first direction; a plurality of second conductive thin wires, It is disposed on the same layer as the first conductive thin wire. And extending in a second direction at an angle to the first direction; Group 1 group, It is disposed in the first strip-shaped region of the first width, And at least two of the first conductive thin wires that are offset from each other in the second direction; Group 2, It is disposed in the second strip-shaped region of the second width, And at least two of the second conductive thin wires which are offset from each other in the first direction, And in an intersection of the first strip-shaped region and the second strip-shaped region, The first conductive thin wire is in contact with the second conductive thin wire. In an area overlapping with the above display device, The first conductive thin line and the second conductive thin line are provided. (10) A display device as in (9), Wherein the intersection of the first strip-shaped region and the second strip-shaped region, The connection portion having the first conductive thin wire and the second conductive thin wire are in contact with each other. (11) A display device such as (9) or (11), The plurality of connection portions each having the first conductive thin wire and the second conductive thin wire are in contact with each other; The first conductive thin wire or the second conductive thin wire between the two connecting portions has a slit. (12) The display device according to any one of (9) to (11), The first conductive thin wire and the one mesh surrounded by the second conductive thin wire are parallelograms. (13) The display device according to any one of (9) to (12), The straight line in which the first strip-shaped region is equally divided in the width direction is the first reference line. When the straight line in which the second strip-shaped region is equally divided in the width direction is the second reference line, The length of the first conductive thin wire is equal to or larger than a difference between twice the length between the adjacent second reference lines and the second width of the second band-shaped region. And the sum of the length between the second reference line adjacent to the second reference line and the second width of the second band-shaped area is equal to or less than The length of the second conductive thin wire is equal to or larger than a difference between twice the length between the adjacent first reference lines and the first width of the first band-shaped region. Further, it is equal to or less than the sum of the length between the first reference lines adjacent to each other and the first width of the first band-shaped region. (14) A display device as in (9), The first conductive thin wire includes a first main thin line disposed in the first main strip-shaped region of the first width, And a first auxiliary thin line disposed in the first auxiliary strip-shaped region of the first width, The second conductive thin wire includes a second main thin line disposed in the second main strip-shaped region of the second width, And a second auxiliary thin line disposed in the second auxiliary strip-shaped region of the second width, 1 first main thin line and two second main thin lines, And two of the above-mentioned second auxiliary thin wires are connected, One of the first auxiliary thin wires is connected to the two second main thin wires, 1 second main thin line and one first main thin line, And one of the first auxiliary thin wires mentioned above is connected, One of the second auxiliary thin wires is in contact with the two first main thin wires. (15) A display device as in (9), Among them: a plurality of third conductive thin wires, It is disposed on the same layer as the first conductive thin wire. Extending in a third direction at an angle to the first direction and the second direction; And the third group, It is disposed in the third strip-shaped region of the third width, And at least two of the third conductive thin wires which are offset from each other in a direction orthogonal to the third direction, And in the first band-shaped region, In the intersection of the second strip-shaped region and the third strip-shaped region, The first conductive thin wire, The second conductive thin wire and the third conductive thin wire are in contact with each other. (16) A display device as in (9), The first band-shaped region includes a first right region and a first left region that are separated by a first reference line that bisects the first band-shaped region in the second direction. In one of the above first strip-shaped regions, The first conductive thin wire disposed in the first right region, The first conductive thin wires disposed in the first left region are alternately arranged along the first direction. The second band-shaped region includes a second right region and a second left region that are separated by a second reference line that bisects the second band-shaped region in the first direction. In one of the above second strip-shaped regions, The second conductive thin wire disposed in the second right region, The second conductive thin wires arranged in the second left region are alternately arranged along the second direction.

1‧‧‧附有觸控檢測功能之顯示裝置
2‧‧‧像素基板
3‧‧‧對向基板
6‧‧‧液晶層
10‧‧‧附有觸控檢測功能之顯示部
10a‧‧‧顯示區域
10b‧‧‧邊框區域
10c‧‧‧端部區域
10d‧‧‧主檢測區域
11‧‧‧控制部
12‧‧‧閘極驅動器
13‧‧‧源極驅動器
14‧‧‧驅動電極驅動器
19‧‧‧COG
20‧‧‧顯示裝置
21‧‧‧TFT基板
22‧‧‧像素電極
24‧‧‧絕緣層
30‧‧‧檢測裝置
31‧‧‧基板
32‧‧‧彩色濾光片
32B、32G、32R‧‧‧色區域
33a‧‧‧導電性細線
33SU‧‧‧第1基準線
33SV‧‧‧第2基準線
33U‧‧‧第1導電性細線
33V‧‧‧第2導電性細線
33Y‧‧‧第3導電性細線
33x、33xx‧‧‧電性連接部
34a、34b‧‧‧連接配線
35‧‧‧偏光板
37‧‧‧配線
38‧‧‧保護層
39‧‧‧接著層
40‧‧‧觸控檢測部(檢測部)
42‧‧‧檢測信號放大部
43‧‧‧A/D轉換部
44‧‧‧信號處理部
45‧‧‧座標擷取部
46‧‧‧檢測時序控制部
61‧‧‧間隔件
65‧‧‧偏光板
66‧‧‧接著層
71、72‧‧‧可撓性印刷基板
331U‧‧‧第1主細線
331V‧‧‧第2主細線
332U‧‧‧第1輔助細線
332V‧‧‧第2輔助細線
AX、AXX‧‧‧交叉區域
C1、C1'‧‧‧電容元件
C2‧‧‧靜電電容
COML‧‧‧驅動電極
Cx1、Cx2‧‧‧電容
D‧‧‧介電質
DET‧‧‧電壓檢測器
Du‧‧‧方向
Dv‧‧‧方向
Dx‧‧‧方向
Dy‧‧‧方向
E1‧‧‧驅動電極
E2‧‧‧檢測電極
GCL‧‧‧掃描信號線
GU‧‧‧第1組群
GV‧‧‧第2組群
I0、I1‧‧‧電流
LC‧‧‧液晶元件
LY1‧‧‧直線
LY2‧‧‧直線
LY3‧‧‧直線
Pix‧‧‧像素
Reset‧‧‧充放電期間
S‧‧‧交流信號源
SCAN‧‧‧方向
Sg‧‧‧交流矩形波
SGL‧‧‧像素信號線
SL‧‧‧縫隙
SP‧‧‧間隔
SPix‧‧‧子像素
SW1‧‧‧第1基準長度
SW2‧‧‧第2基準長度
TDD‧‧‧虛設電極
TDL‧‧‧檢測電極
TDLB‧‧‧檢測區塊
Tr‧‧‧TFT元件
U11‧‧‧第1端部
U12‧‧‧第12端部
UA‧‧‧第1帶狀區域
UAa‧‧‧第1主帶狀區域
UAb‧‧‧第1輔助帶狀區域
V0、V1‧‧‧波形
VA‧‧‧第2帶狀區域
Vcom‧‧‧驅動信號
Vdet‧‧‧檢測信號
Vdet1‧‧‧輸出波形
Vdisp‧‧‧影像信號
Vout‧‧‧信號輸出
Vpix‧‧‧像素信號
Vscan‧‧‧掃描信號
WU‧‧‧特定寬度
WV‧‧‧特定寬度
YA‧‧‧第3帶狀區域
θ‧‧‧角度
β‧‧‧長度
γ‧‧‧長度
｜ΔV｜‧‧‧絕對值1‧‧‧Display device with touch detection function
2‧‧‧pixel substrate
3‧‧‧ opposite substrate
6‧‧‧Liquid layer
10‧‧‧Display with touch detection
10a‧‧‧Display area
10b‧‧‧Border area
10c‧‧‧End area
10d‧‧‧Main inspection area
11‧‧‧Control Department
12‧‧‧ gate driver
13‧‧‧Source Driver
14‧‧‧Drive electrode driver
19‧‧‧COG
20‧‧‧ display device
21‧‧‧TFT substrate
22‧‧‧pixel electrode
24‧‧‧Insulation
30‧‧‧Detection device
31‧‧‧Substrate
32‧‧‧Color filters
32B, 32G, 32R‧‧‧ color areas
33a‧‧‧Electrical thin wires
33SU‧‧‧1st baseline
33SV‧‧‧2nd baseline
33U‧‧‧1st conductive thin wire
33V‧‧‧2nd conductive thin wire
33Y‧‧‧3rd conductive thin wire
33x, 33xx‧‧‧Electrical connection
34a, 34b‧‧‧ connection wiring
35‧‧‧Polar plate
37‧‧‧Wiring
38‧‧‧Protective layer
39‧‧‧Next layer
40‧‧‧Touch detection department (detection department)
42‧‧‧Detection Signal Amplifier
43‧‧‧A/D conversion department
44‧‧‧Signal Processing Department
45‧‧‧Coordinates Acquisition Department
46‧‧‧Detection Timing Control Department
61‧‧‧ spacers
65‧‧‧Polar plate
66‧‧‧Next layer
71, 72‧‧‧Flexible printed circuit board
331U‧‧‧1st main thin line
331V‧‧‧2nd main thin line
332U‧‧‧1st auxiliary thin line
332V‧‧‧2nd auxiliary thin line
AX, AXX‧‧‧ intersection area
C1, C1'‧‧‧ Capacitance components
C2‧‧‧ electrostatic capacitor
COML‧‧‧ drive electrode
Cx1, Cx2‧‧‧ capacitor
D‧‧‧ dielectric
DET‧‧‧ voltage detector
Du‧‧‧ direction
Dv‧‧ direction
Dx‧‧ direction
Dy‧‧ direction
E1‧‧‧ drive electrode
E2‧‧‧Detection electrode
GCL‧‧‧ scan signal line
GU‧‧‧Group 1
GV‧‧‧Group 2
I 0 , I 1 ‧‧‧ current
LC‧‧‧Liquid Crystal Components
LY1‧‧‧ straight line
LY2‧‧‧ straight line
LY3‧‧‧ straight line
Pix‧‧ ‧ pixels
Reset‧‧‧Charging and discharging period
S‧‧‧ AC signal source
SCAN‧‧ direction
Sg‧‧‧AC rectangular wave
SGL‧‧‧pixel signal line
SL‧‧‧ gap
SP‧‧ ‧ interval
SPix‧‧‧ subpixel
SW1‧‧‧1st reference length
SW2‧‧‧2nd reference length
TDD‧‧‧Dummy electrode
TDL‧‧‧ detection electrode
TDLB‧‧‧ test block
Tr‧‧‧TFT components
U11‧‧‧1st end
U12‧‧‧12th end
UA‧‧‧1st strip zone
UAa‧‧‧1st main strip zone
UAb‧‧‧1st auxiliary band zone
V 0 , V 1 ‧‧‧ waveform
VA‧‧‧2nd strip zone
Vcom‧‧‧ drive signal
Vdet‧‧‧ detection signal
Vdet1‧‧‧ output waveform
Vdisp‧‧‧ image signal
Vout‧‧‧ signal output
Vpix‧‧‧ pixel signal
Vscan‧‧‧ scan signal
WU‧‧‧Specific width
WV‧‧‧Specific width
YA‧‧‧3rd banded area θ‧‧‧Angle β‧‧‧ Length γ‧‧‧Length|ΔV|‧‧‧ Absolute value

圖1係顯示實施形態1之附有觸控檢測功能之顯示裝置之一構成例之方塊圖。 圖2係為了說明靜電電容型觸控檢測方式之基本原理，而表示手指未接觸或接近之狀態之說明圖。 圖3係顯示圖2所示之手指未接觸或接近之狀態之等價電路之例之說明圖。 圖4係為了說明靜電電容型觸控檢測方式之基本原理，而表示手指接觸或接近之狀態之說明圖。 圖5係顯示圖4所示之手指接觸或接近之狀態之等價電路之例之說明圖。 圖6係顯示驅動信號及檢測信號之波形之一例之圖。 圖7係顯示安裝有附有觸控檢測功能之顯示裝置之模組之一例之圖。 圖8係顯示安裝有附有觸控檢測功能之顯示裝置之模組之一例之圖。 圖9係顯示實施形態1之附有觸控檢測功能之顯示裝置之概略剖面構造之剖面圖。 圖10係顯示實施形態1之附有觸控檢測功能之顯示裝置之像素配置之電路圖。 圖11係實施形態1之檢測電極之俯視圖。 圖12係用以說明實施形態1之檢測電極之配置方法之步驟圖。 圖13係實施形態2之檢測電極之俯視圖。 圖14係實施形態2之變化例1之檢測電極之俯視圖。 圖15係實施形態2之變化例2之檢測電極之俯視圖。 圖16係實施形態3之檢測電極之俯視圖。 圖17係實施形態4之檢測電極之俯視圖。 圖18係實施形態5之檢測電極之俯視圖。 圖19係實施形態6之檢測電極之俯視圖。 圖20係顯示自身靜電電容方式之觸控檢測之等價電路之一例之說明圖。Fig. 1 is a block diagram showing a configuration example of a display device with a touch detection function according to the first embodiment. 2 is an explanatory view showing a state in which a finger is not in contact or in proximity to explain the basic principle of the electrostatic capacitance type touch detection method. Fig. 3 is an explanatory view showing an example of an equivalent circuit in a state in which the finger shown in Fig. 2 is not in contact or in proximity. FIG. 4 is an explanatory view showing a state in which a finger is in contact or close to explain the basic principle of the electrostatic capacitance type touch detection method. Fig. 5 is an explanatory view showing an example of an equivalent circuit in a state in which the finger shown in Fig. 4 is in contact or in proximity. Fig. 6 is a view showing an example of waveforms of a drive signal and a detection signal. Fig. 7 is a view showing an example of a module in which a display device with a touch detection function is mounted. Fig. 8 is a view showing an example of a module in which a display device with a touch detection function is mounted. Fig. 9 is a cross-sectional view showing a schematic cross-sectional structure of a display device with a touch detection function according to the first embodiment. Fig. 10 is a circuit diagram showing a pixel arrangement of a display device with a touch detection function according to the first embodiment. Fig. 11 is a plan view showing the detecting electrode of the first embodiment. Fig. 12 is a view showing the steps of a method of arranging the detecting electrodes in the first embodiment. Fig. 13 is a plan view showing the detecting electrode of the second embodiment. Fig. 14 is a plan view showing a detecting electrode according to a first modification of the second embodiment. Fig. 15 is a plan view showing a detecting electrode according to a second modification of the second embodiment. Fig. 16 is a plan view showing a detecting electrode of the third embodiment. Figure 17 is a plan view showing a detecting electrode of the fourth embodiment. Fig. 18 is a plan view showing a detecting electrode of the fifth embodiment. Fig. 19 is a plan view showing the detecting electrode of the sixth embodiment. Fig. 20 is an explanatory diagram showing an example of an equivalent circuit of touch detection by its own electrostatic capacitance method.

10a‧‧‧顯示區域 10a‧‧‧Display area

10b‧‧‧邊框區域 10b‧‧‧Border area

10c‧‧‧端部區域 10c‧‧‧End area

10d‧‧‧主檢測區域 10d‧‧‧Main inspection area

33a‧‧‧導電性細線 33a‧‧‧Electrical thin wires

33SU‧‧‧第1基準線 33SU‧‧‧1st baseline

33SV‧‧‧第2基準線 33SV‧‧‧2nd baseline

33U‧‧‧第1導電性細線 33U‧‧‧1st conductive thin wire

33V‧‧‧第2導電性細線 33V‧‧‧2nd conductive thin wire

33x‧‧‧電性連接部 33x‧‧‧Electrical connection

34a‧‧‧連接配線 34a‧‧‧Connecting wiring

37‧‧‧配線 37‧‧‧Wiring

AX‧‧‧交叉區域 AX‧‧‧ intersection area

Du‧‧‧方向 Du‧‧‧ direction

Dv‧‧‧方向 Dv‧‧ direction

Dx‧‧‧方向 Dx‧‧ direction

Dy‧‧‧方向 Dy‧‧ direction

GU‧‧‧第1組群 GU‧‧‧Group 1

GV‧‧‧第2組群 GV‧‧‧Group 2

SW1‧‧‧第1基準長度 SW1‧‧‧1st reference length

SW2‧‧‧第2基準長度 SW2‧‧‧2nd reference length

UA‧‧‧第1帶狀區域 UA‧‧‧1st strip zone

VA‧‧‧第2帶狀區域 VA‧‧‧2nd strip zone

WU‧‧‧特定寬度 WU‧‧‧Specific width

WV‧‧‧特定寬度 WV‧‧‧Specific width

Claims (16)

一種檢測裝置，其具備： 基板； 複數條第1導電性細線，其設置於與上述基板平行之面上，且於第1方向延伸； 複數條第2導電性細線，其設置於與上述第1導電性細線同一層上，且在與上述第1方向成角度之第2方向延伸； 第1組群，其配置於第1寬度之第1帶狀區域，且至少包含於上述第2方向互相偏錯之2條上述第1導電性細線；及 第2組群，其配置於第2寬度之第2帶狀區域，且至少包含於上述第1方向互相偏錯之2條上述第2導電性細線，且 於上述第1帶狀區域與上述第2帶狀區域之交叉區域中，上述第1導電性細線與上述第2導電性細線相接。A detecting device comprising: a substrate; a plurality of first conductive thin wires provided on a surface parallel to the substrate and extending in a first direction; and a plurality of second conductive thin wires provided on the first The conductive thin wires are on the same layer and extend in a second direction at an angle to the first direction; the first group is disposed in the first band-shaped region of the first width, and at least includes the second direction being offset from each other Two of the first conductive thin wires and the second group are disposed in the second strip-shaped region of the second width, and at least two of the second conductive thin wires that are offset from each other in the first direction In the intersection of the first strip-shaped region and the second strip-shaped region, the first conductive thin wire is in contact with the second conductive thin wire. 如請求項1之檢測裝置，其中於上述第1帶狀區域與上述第2帶狀區域之交叉區域中，具有上述第1導電性細線與上述第2導電性細線相接之兩個連接部。The detecting device according to claim 1, wherein the first conductive strip and the second conductive thin line are in contact with each other in an intersection region between the first strip-shaped region and the second strip-shaped region. 如請求項1之檢測裝置，其中具有上述第1導電性細線與上述第2導電性細線相接之複數個連接部，於兩個連接部間之上述第1導電性細線或上述第2導電性細線具有縫隙。The detecting device according to claim 1, wherein the first conductive thin wire and the second conductive thin wire are connected to the first conductive thin wire or the second conductive portion between the two connecting portions Thin lines have gaps. 如請求項1之檢測裝置，其中上述第1導電性細線與上述第2導電性細線所包圍之1個網眼為平行四邊形。The detecting device according to claim 1, wherein the first conductive thin wire and the one mesh surrounded by the second conductive thin wire are parallelograms. 如請求項1之檢測裝置，其中 設將上述第1帶狀區域於寬度方向二等分之直線為第1基準線，設將上述第2帶狀區域於寬度方向二等分之直線為第2基準線時， 上述第1導電性細線之長度為鄰接之上述第2基準線間之長度之2倍與上述第2帶狀區域之第2寬度之差以上，且為鄰接之上述第2基準線間之長度之2倍與上述第2帶狀區域之第2寬度之和以下， 上述第2導電性細線之長度為鄰接之上述第1基準線間之長度之2倍與上述第1帶狀區域之第1寬度之差以上，且為鄰接之上述第1基準線間之長度之2倍與上述第1帶狀區域之第1寬度之和以下。The detecting device according to claim 1, wherein a straight line that bisects the first strip-shaped region in the width direction is a first reference line, and a line that bisects the second strip-shaped region in the width direction is a second In the case of the reference line, the length of the first conductive thin line is equal to or greater than a difference between twice the length between the adjacent second reference lines and the second width of the second strip-shaped region, and is adjacent to the second reference line The length of the second conductive thin line is twice the length between the adjacent first reference lines and the first strip-shaped area, and the length of the second conductive strip is equal to or less than the sum of the second width of the second strip-shaped region. The difference between the first width and the width is equal to or less than the sum of the length between the adjacent first reference lines and the first width of the first strip-shaped region. 如請求項1之檢測裝置，其中 上述第1導電性細線包含配置於第1寬度之第1主帶狀區域之第1主細線、及配置於第1寬度之第1輔助帶狀區域之第1輔助細線， 上述第2導電性細線包含配置於第2寬度之第2主帶狀區域之第2主細線、及配置於第2寬度之第2輔助帶狀區域之第2輔助細線， 1條上述第1主細線與2條上述第2主細線、及2條上述第2輔助細線相接， 1條上述第1輔助細線與2條上述第2主細線相接， 1條上述第2主細線與1條上述第1主細線、及1條上述第1輔助細線相接， 1條上述第2輔助細線與2條上述第1主細線相接。The detecting device according to claim 1, wherein the first conductive thin wire includes a first main thin line disposed in the first main strip-shaped region of the first width and a first main thin strip disposed in the first auxiliary strip-shaped region of the first width In the auxiliary thin wire, the second conductive thin wire includes a second main thin line disposed in the second main strip-shaped region of the second width, and a second auxiliary thin line disposed in the second auxiliary strip-shaped region of the second width, one of the above-mentioned The first main thin line is in contact with the two second main thin lines and the two second auxiliary thin lines, and one of the first auxiliary thin lines is in contact with two second main thin lines, and one of the second main thin lines is One of the first main thin wires and one of the first auxiliary thin wires are in contact with each other, and one of the second auxiliary thin wires is in contact with two of the first main thin wires. 如請求項1之檢測裝置，其中具備： 複數條第3導電性細線，其設置於與上述第1導電性細線同一層上，且在與上述第1方向及上述第2方向成角度之第3方向延伸；及 第3組群，其配置於第3寬度之第3帶狀區域，且至少包含於相對於上述第3方向正交之方向互相偏錯之2條上述第3導電性細線， 於上述第1帶狀區域、上述第2帶狀區域及上述第3帶狀區域之交叉區域中，上述第1導電性細線、上述第2導電性細線及上述第3導電性細線相接。The detecting device according to claim 1, further comprising: a plurality of third conductive thin wires provided on the same layer as the first conductive thin wires and having a third angle with respect to the first direction and the second direction And a third group group disposed in the third strip-shaped region of the third width and including at least two of the third conductive thin wires that are offset from each other in a direction orthogonal to the third direction, In the intersection of the first strip-shaped region, the second strip-shaped region, and the third strip-shaped region, the first conductive thin wire, the second conductive thin wire, and the third conductive thin wire are in contact with each other. 如請求項1之檢測裝置，其中 上述第1帶狀區域包含以將第1帶狀區域於上述第2方向二等分之第1基準線分隔之第1右區域及第1左區域， 於1個上述第1帶狀區域中，將配置於上述第1右區域之上述第1導電性細線，與配置於上述第1左區域之上述第1導電性細線沿著上述第1方向交替排列， 上述第2帶狀區域包含以將第2帶狀區域於上述第1方向二等分之第2基準線分隔之第2右區域及第2左區域， 於1個上述第2區域中，配置於上述第2右區域之上述第2導電性細線，與配置於上述第2左區域之上述第2導電性細線沿著上述第2方向交替排列。The detecting device according to claim 1, wherein the first band-shaped region includes a first right region and a first left region that are separated by a first reference line that bisects the first band-shaped region in the second direction, and is 1 In the first strip-shaped region, the first conductive thin wires disposed in the first right region and the first conductive thin wires disposed in the first left region are alternately arranged along the first direction. The second strip-shaped region includes a second right region and a second left region that are separated by a second reference line that bisects the second strip-shaped region in the first direction, and is disposed in the one of the second regions. The second conductive thin wires in the second right region are alternately arranged along the second direction with the second conductive thin wires disposed in the second left region. 一種顯示裝置，其具備： 檢測裝置、及 顯示區域，且 上述檢測裝置具備： 基板； 複數條第1導電性細線，其設置於與上述基板平行之面上，且於第1方向延伸； 複數條第2導電性細線，其設置於與上述第1導電性細線同一層上，且在與上述第1方向成角度之第2方向延伸； 第1組群，其配置於第1寬度之第1帶狀區域，且至少包含於上述第2方向互相偏錯之2條上述第1導電性細線； 第2組群，其配置於第2寬度之第2帶狀區域，且至少包含於上述第1方向互相偏錯之2條上述第2導電性細線，且 於上述第1帶狀區域與上述第2帶狀區域之交叉區域中，上述第1導電性細線與上述第2導電性細線相接，在與上述顯示裝置重疊之區域，設置上述第1導電性細線與上述第2導電性細線。A display device comprising: a detecting device and a display area, wherein the detecting device includes: a substrate; a plurality of first conductive thin wires provided on a surface parallel to the substrate and extending in a first direction; The second conductive thin wire is provided on the same layer as the first conductive thin wire and extends in a second direction at an angle to the first direction; and the first group is disposed in the first band of the first width And at least two first conductive thin wires which are offset from each other in the second direction; and the second group is disposed in the second strip-shaped region of the second width, and is included in at least the first direction The two second conductive thin wires which are offset from each other, and the first conductive thin wires are in contact with the second conductive thin wires in an intersection region between the first strip-shaped region and the second strip-shaped region. The first conductive thin line and the second conductive thin line are provided in a region overlapping the display device. 如請求項9之顯示裝置，其中於上述第1帶狀區域與上述第2帶狀區域之交叉區域中，具有上述第1導電性細線與上述第2導電性細線相接之兩個連接部。The display device according to claim 9, wherein the first conductive strip and the second conductive thin line are in contact with each other in an intersection region between the first strip-shaped region and the second strip-shaped region. 如請求項9之顯示裝置，其中具有上述第1導電性細線與上述第2導電性細線相接之複數個連接部，於2個連接部間之上述第1導電性細線或上述第2導電性細線具有縫隙。The display device according to claim 9, wherein the first conductive thin wire or the second conductive portion between the two connecting portions is provided in a plurality of connecting portions in which the first conductive thin wire and the second conductive thin wire are in contact with each other; Thin lines have gaps. 如請求項9之顯示裝置，其中上述第1導電性細線與上述第2導電性細線所包圍之1個網眼為平行四邊形。The display device according to claim 9, wherein the first conductive thin line and the one of the second conductive thin lines are parallelograms. 如請求項9之顯示裝置，其中 設將上述第1帶狀區域於寬度方向二等分之直線為第1基準線，設將上述第2帶狀區域於寬度方向二等分之直線為第2基準線時， 上述第1導電性細線之長度為鄰接之上述第2基準線間之長度之2倍與上述第2帶狀區域之第2寬度之差以上，且為鄰接之上述第2基準線間之長度之2倍與上述第2帶狀區域之第2寬度之和以下， 上述第2導電性細線之長度為鄰接之上述第1基準線間之長度之2倍與上述第1帶狀區域之第1寬度之差以上，且為鄰接之上述第1基準線間之長度之2倍與上述第1帶狀區域之第1寬度之和以下。The display device of claim 9, wherein a straight line that bisects the first strip-shaped region in the width direction is a first reference line, and a line that bisects the second strip-shaped region in the width direction is a second In the case of the reference line, the length of the first conductive thin line is equal to or greater than a difference between twice the length between the adjacent second reference lines and the second width of the second strip-shaped region, and is adjacent to the second reference line The length of the second conductive thin line is twice the length between the adjacent first reference lines and the first strip-shaped area, and the length of the second conductive strip is equal to or less than the sum of the second width of the second strip-shaped region. The difference between the first width and the width is equal to or less than the sum of the length between the adjacent first reference lines and the first width of the first strip-shaped region. 如請求項9之顯示裝置，其中 上述第1導電性細線包含配置於第1寬度之第1主帶狀區域之第1主細線、及配置於第1寬度之第1輔助帶狀區域之第1輔助細線， 上述第2導電性細線包含配置於第2寬度之第2主帶狀區域之第2主細線、及配置於第2寬度之第2輔助帶狀區域之第2輔助細線， 1條上述第1主細線與2條上述第2主細線、及2條上述第2輔助細線相接， 1條上述第1輔助細線與2條上述第2主細線相接， 1條上述第2主細線與1條上述第1主細線、及1條上述第1輔助細線相接， 1條上述第2輔助細線與2條上述第1主細線相接。The display device according to claim 9, wherein the first conductive thin wire includes a first main thin line disposed in the first main strip-shaped region of the first width and a first main thin strip disposed in the first auxiliary strip-shaped region of the first width In the auxiliary thin wire, the second conductive thin wire includes a second main thin line disposed in the second main strip-shaped region of the second width, and a second auxiliary thin line disposed in the second auxiliary strip-shaped region of the second width, one of the above-mentioned The first main thin line is in contact with the two second main thin lines and the two second auxiliary thin lines, and one of the first auxiliary thin lines is in contact with two second main thin lines, and one of the second main thin lines is One of the first main thin wires and one of the first auxiliary thin wires are in contact with each other, and one of the second auxiliary thin wires is in contact with two of the first main thin wires. 如請求項9之顯示裝置，其中具備： 複數條第3導電性細線，其設置於與上述第1導電性細線同一層上，在與上述第1方向及上述第2方向成角度之第3方向延伸；及 第3組群，其配置於第3寬度之第3帶狀區域，且至少包含於相對於上述第3方向正交之方向互相偏錯之2條上述第3導電性細線，且 於上述第1帶狀區域、上述第2帶狀區域及上述第3帶狀區域之交叉區域中，上述第1導電性細線、上述第2導電性細線及上述第3導電性細線相接。The display device according to claim 9, further comprising: a plurality of third conductive thin wires provided on the same layer as the first conductive thin wires and having a third direction at an angle to the first direction and the second direction And the third group group is disposed in the third strip-shaped region of the third width, and includes at least two of the third conductive thin wires which are offset from each other in a direction orthogonal to the third direction, and In the intersection of the first strip-shaped region, the second strip-shaped region, and the third strip-shaped region, the first conductive thin wire, the second conductive thin wire, and the third conductive thin wire are in contact with each other. 如請求項9之顯示裝置，其中 上述第1帶狀區域包含以將上述第1帶狀區域於上述第2方向二等分之第1基準線分隔之第1右區域及第1左區域， 於1個上述第1帶狀區域中，配置於上述第1右區域之上述第1導電性細線，與配置於上述第1左區域之上述第1導電性細線沿著上述第1方向交替排列， 上述第2帶狀區域包含以將第2帶狀區域於上述第1方向二等分之第2基準線分隔之第2右區域及第2左區域， 於1個上述第2帶狀區域中，配置於上述第2右區域之上述第2導電性細線，與配置於上述第2左區域之上述第2導電性細線沿著上述第2方向交替排列。The display device of claim 9, wherein the first band-shaped region includes a first right region and a first left region that are separated by a first reference line that bisects the first band-shaped region in the second direction, In the first strip-shaped region, the first conductive thin wires disposed in the first right region and the first conductive thin wires disposed in the first left region are alternately arranged along the first direction. The second strip-shaped region includes a second right region and a second left region that are separated by a second reference line that bisects the second strip-shaped region in the first direction, and is disposed in one of the second strip-shaped regions. The second conductive thin wires in the second right region are alternately arranged along the second direction with the second conductive thin wires disposed in the second left region.
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