TW201730511A - Apparatus and method of measuring straightness - Google Patents

Apparatus and method of measuring straightness Download PDF

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Publication number
TW201730511A
TW201730511A TW105129927A TW105129927A TW201730511A TW 201730511 A TW201730511 A TW 201730511A TW 105129927 A TW105129927 A TW 105129927A TW 105129927 A TW105129927 A TW 105129927A TW 201730511 A TW201730511 A TW 201730511A
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captured image
straightness
imaging unit
image
reference line
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TW105129927A
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Chinese (zh)
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TWI626421B (en
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許鎭
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Eo科技股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q17/00Arrangements for observing, indicating or measuring on machine tools
    • B23Q17/24Arrangements for observing, indicating or measuring on machine tools using optics or electromagnetic waves
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/04Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/08Measuring arrangements characterised by the use of optical techniques for measuring diameters
    • G01B11/10Measuring arrangements characterised by the use of optical techniques for measuring diameters of objects while moving

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

An apparatus for and a method of measuring straightness are provided. The method of measuring straightness includes the operation of acquiring a captured image of a reference line marked on an object while changing a location to be photographed according to a processing direction of the object and the operation of measuring straightness of the processing direction from a location of the reference line shown on the captured image.

Description

直線度測定裝置及方法Straightness measuring device and method

本發明是有關於一種測定對象物的加工方向的直線度的裝置及方法。The present invention relates to an apparatus and method for measuring the straightness of a processing direction of an object.

於對象物上形成標記圖案或切割對象物的加工製程有機械加工與雷射加工。通常,雷射加工製程是指向加工物的表面掃描雷射束而對加工物表面上的形狀或物理性質等進行加工的製程。The processing for forming a mark pattern or a cut object on an object is machined and laser processed. Generally, a laser processing process is a process of processing a shape or physical properties on a surface of a workpiece by scanning a laser beam toward a surface of the workpiece.

為了提高對象物的加工品質,重要的是使施加機械壓力的位置或雷射束的照射位置沿預加工線準確地移動。於通常的加工製程中,可藉由移動平台使對象物進行直線運動或使加工裝備進行直線運動而變更加工位置。In order to improve the processing quality of the object, it is important to accurately move the position where the mechanical pressure is applied or the irradiation position of the laser beam along the pre-processing line. In a usual processing process, the machining position can be changed by linearly moving the object or linearly moving the processing equipment by moving the platform.

然而,於變更上述加工位置時,因除振動以外的機械公差而移動平台的移動軌跡無法準確地沿理想的直線移動。將藉由加工形成的線脫離直線的程度稱為加工方向的直線度。於對象物的加工製程中,要求進行測定上述直線度而檢查加工錯誤的過程。However, when the above-described machining position is changed, the movement trajectory of the moving platform cannot be accurately moved along the ideal straight line due to mechanical tolerances other than vibration. The degree to which the line formed by the process is separated from the straight line is referred to as the straightness of the machine direction. In the processing of the object, it is required to measure the straightness and check the processing error.

[發明欲解決的課題][Question to be solved by the invention]

根據例示性的實施例,可提高測定對象物的加工方向的直線度的準確度。According to the exemplary embodiment, the accuracy of the straightness of the processing direction of the object to be measured can be improved.

[解決課題的手段][Means for solving the problem]

於一態樣中, 提供一種直線度測定方法,其是測定對象物的加工方向的直線度的方法,所述直線度測定方法包括如下步驟: 當根據對象物的加工方向改變拍攝的位置時,獲得標示於所述對象物上的參照線的拍攝圖像;以及 根據顯示於所述拍攝圖像的所述參照線的位置而測定所述加工方向的直線度的步驟;且 在獲得所述拍攝圖像的步驟中, 因所述拍攝位置移動而顯示至所述拍攝圖像的所述參照線的線寬小於拍攝部的解析度。In one aspect, a straightness measuring method is provided, which is a method of measuring the straightness of a machining direction of an object, and the straightness measuring method includes the following steps: when the position of the shooting is changed according to the processing direction of the object, Obtaining a captured image of a reference line indicated on the object; and measuring a straightness of the machining direction according to a position of the reference line displayed on the captured image; and obtaining the photographing In the step of the image, the line width of the reference line displayed to the captured image due to the movement of the photographing position is smaller than the resolution of the photographing unit.

上述拍攝部可使上述參照線的線寬變得小於上述拍攝部的解析度的1/2。The imaging unit may make the line width of the reference line smaller than 1/2 of the resolution of the imaging unit.

在獲得上述拍攝圖像的步驟中,拍攝上述拍攝圖像的曝光時間及移動上述拍攝位置的速度滿足等式1; V*E*tanθ<P/M…等式1 (V=加工位置移動速度,E=曝光時間,θ=加工方向與參照線之間的角度,P=像素尺寸,M=倍率)。In the step of obtaining the captured image, the exposure time of capturing the captured image and the speed of moving the shooting position satisfy Equation 1; V*E*tanθ<P/M... Equation 1 (V=machining speed of machining position) , E = exposure time, θ = angle between the machining direction and the reference line, P = pixel size, M = magnification).

在獲得上述拍攝圖像的步驟中,上述拍攝圖像的第一方向長度與第二方向長度不同。In the step of obtaining the above-described captured image, the length of the first direction of the captured image is different from the length of the second direction.

在獲得上述拍攝圖像的步驟中,上述拍攝圖像拍攝為線圖像。In the step of obtaining the above-described captured image, the captured image is captured as a line image.

測定上述直線度的步驟可包括如下步驟: 以上述拍攝圖像的亮度為基準而將上述拍攝圖像轉換成二進制圖像的步驟;以及根據上述二進制圖像而識別上述參照線的位置的步驟。The step of measuring the straightness may include the steps of: converting the captured image into a binary image based on the brightness of the captured image; and identifying the position of the reference line based on the binary image.

上述直線度測定方法可更包括藉由上述拍攝位置發生變化而產生脈衝訊號的步驟, 在獲得上述拍攝圖像的步驟中,藉由上述脈衝訊號同步化而獲得上述拍攝圖像。The straightness measuring method may further include the step of generating a pulse signal by changing the shooting position, and obtaining the captured image by synchronizing the pulse signal in the step of obtaining the captured image.

於另一態樣中, 提供一種直線度測定裝置,其是測定對象物的加工方向的直線度的裝置,上述直線度測定裝置包括: 拍攝部,用於獲得顯示於對象物的參照線的拍攝圖像; 移動平台,沿上述對象物的加工方向移動上述拍攝部的拍攝位置;以及 處理器,根據顯示於上述拍攝圖像的上述參照線的位置而測定上述加工方向的直線度;且 上述處理器使上述對象物旋轉,以便因上述拍攝位置移動而顯示至上述拍攝圖像的上述參照線的線寬小於拍攝上述拍攝部的解析度。In another aspect, a straightness measuring device for measuring a straightness of a machining direction of an object, wherein the straightness measuring device includes: an imaging unit for obtaining a reference line displayed on an object a moving platform that moves an imaging position of the imaging unit in a processing direction of the object; and a processor that measures a straightness of the processing direction based on a position of the reference line displayed on the captured image; and the processing The object rotates the object so that the line width of the reference line displayed to the captured image due to the movement of the imaging position is smaller than the resolution of the imaging unit.

上述處理器能夠以上述參照線的線寬小於上述拍攝部的解析度的1/2的方式來控制上述拍攝部。The processor can control the imaging unit such that a line width of the reference line is smaller than 1/2 of a resolution of the imaging unit.

上述處理器能夠以上述拍攝位置的移動速度及上述拍攝部的曝光時間滿足等式1的方式來控制上述拍攝部及移動平台; V*E*tanθ<P/M…等式1 (V=加工位置移動速度,E=曝光時間,θ=加工方向與參照線之間的角度,P=像素尺寸,M=倍率)。The processor can control the imaging unit and the moving platform such that the moving speed of the imaging position and the exposure time of the imaging unit satisfy Equation 1; V*E*tanθ<P/M... Equation 1 (V=Processing Position moving speed, E = exposure time, θ = angle between the machining direction and the reference line, P = pixel size, M = magnification).

上述拍攝部可使上述拍攝圖像的第一方向長度與第二方向長度不同。The imaging unit may have a length in the first direction of the captured image different from a length in the second direction.

上述拍攝部可將上述拍攝圖像拍攝為線圖像。The imaging unit can capture the captured image as a line image.

上述處理器能夠以上述拍攝圖像的亮度為基準而將上述拍攝圖像轉換成二進制圖像。The processor is capable of converting the captured image into a binary image based on the brightness of the captured image.

上述直線度測定裝置可更包括編碼器,其藉由上述拍攝位置發生變化而產生脈衝訊號, 上述拍攝部藉由使上述脈衝訊號同步化而獲得上述拍攝圖像。The straightness measuring device may further include an encoder that generates a pulse signal by changing the shooting position, and the imaging unit obtains the captured image by synchronizing the pulse signals.

[發明效果][Effect of the invention]

根據本實施例的直線度測定裝置可於拍攝位置沿加工方向移動的期間,拍攝顯示於對象物的參照線。因此,與於拍攝位置靜止的狀態下進行測定的情形不同,直線度測定裝置的直線度測定速度會較快。並且,直線度測定裝置可防止因拍攝位置移動而產生的圖像模糊現象引起的參照線位置不明確化。因此,可提高直線度測定裝置的拍攝準確度。According to the straightness measuring apparatus of the present embodiment, the reference line displayed on the object can be captured while the imaging position is moving in the machining direction. Therefore, unlike the case where the measurement is performed in a state where the imaging position is stationary, the straightness measurement device has a relatively high straightness measurement speed. Further, the straightness measuring device can prevent the position of the reference line from being blurred due to the image blurring phenomenon caused by the movement of the shooting position. Therefore, the photographing accuracy of the straightness measuring device can be improved.

於以下圖式中,相同的參照符號表示相同的構成要素,為了說明的明確性及便利性,可於圖中誇張地表示各構成要素的尺寸。另一方面,以下所說明的實施例僅為示例,可根據此種實施例實現各種變形。In the following drawings, the same reference numerals are given to the same components, and the size of each component may be exaggerated in the drawing for clarity and convenience of description. On the other hand, the embodiments described below are merely examples, and various modifications can be made according to such embodiments.

第一、第二等用語可用於說明各種構成要素,但構成要素不應受用語的限定。用語僅以將一個構成要素區別於其他構成要素為目的而使用。The first and second terms can be used to describe various constituent elements, but the constituent elements should not be limited by the terms. The term is used only for the purpose of distinguishing one component from another component.

若未於文中明確表示,則單數的表達包括複數的表達。並且,於記載為某個部分“包括”某個構成要素時,若無特別相反的記載,則是指可更包括其他構成要素,並非是指排除其他構成要素。If not explicitly indicated in the text, the singular expression includes the plural expression. In addition, when a part is "included" to a certain component, unless otherwise stated, it means that it may include other components, and does not mean that other components are excluded.

並且,說明書中所記載的“…部”、“模組”等用語是指對至少一個功能或動作進行處理的單位。Further, terms such as "parts" and "modules" described in the specification refer to units that process at least one function or operation.

圖1是例示性地表示對象物10的雷射加工製程的圖。FIG. 1 is a view exemplarily showing a laser processing process of the object 10.

參照圖1,可於夾盤20上安裝對象物10。光源112可向對象物10照射雷射束。可藉由移動平台130變更光源112向對象物10照射雷射束的位置。移動平台130可沿直線(y軸方向)移動安裝有對象物10的夾盤20。藉由移動平台130移動夾盤20使對象物10移動,從而可於對象物10上按照直線形成雷射標記圖案。Referring to Fig. 1, an object 10 can be attached to the chuck 20. The light source 112 can illuminate the object 10 with a laser beam. The position at which the light source 112 illuminates the object 10 with the laser beam can be changed by the moving platform 130. The moving platform 130 can move the chuck 20 on which the object 10 is mounted in a straight line (y-axis direction). The object 10 is moved by moving the chuck 20 by the moving platform 130, so that the laser mark pattern can be formed on the object 10 in a straight line.

於圖1中,例示性地表示雷射加工製程,但實施例可應用的加工製程並不限制於此。例如,本說明書中所記載的實施例亦可應用於機械刻槽(mechanical grooving)製程、切割製程等。In FIG. 1, the laser processing process is exemplarily shown, but the processing process applicable to the embodiment is not limited thereto. For example, the embodiments described in the present specification can also be applied to a mechanical grooving process, a cutting process, and the like.

對象物10作為成為拍攝對象的物體,可包括晶圓、半導體晶片等,並不限制於此。為了準確地實現對象物10的加工,需使對象物10的預加工線與對象物10的加工位置的移動方向一致。因此,可使於夾盤20上排列對象物10的方向與加工方向對準。The object 10 may include a wafer, a semiconductor wafer, or the like as an object to be photographed, and is not limited thereto. In order to accurately realize the processing of the object 10, it is necessary to make the pre-processing line of the object 10 coincide with the moving direction of the processing position of the object 10. Therefore, the direction in which the object 10 is arranged on the chuck 20 can be aligned with the machining direction.

圖2是例示性地表示對象物10的表面的圖。FIG. 2 is a view exemplarily showing the surface of the object 10.

參照圖2,對象物10可包括排列成方格形狀的多個半導體晶片11。可於對象物10的表面上顯示有可識別的參照線L、L'。參照線L、L'可為如預切割線L的直線,亦可為如半導體晶片11的邊緣L'的線段形態。即於拍攝圖像中,參照線L、L'可顯示為直線或線段形態的圖像。Referring to FIG. 2, the object 10 may include a plurality of semiconductor wafers 11 arranged in a checkered shape. Recognizable reference lines L, L' may be displayed on the surface of the object 10. The reference lines L, L' may be a straight line such as the pre-cut line L, or may be in the form of a line segment such as the edge L' of the semiconductor wafer 11. That is, in the captured image, the reference lines L, L' can be displayed as an image in the form of a straight line or a line segment.

於雷射加工製程中,可沿對象物10的參照線L、L'中的一部分照射雷射束。若沿參照線L、L'照射雷射束,則可將對象物10所包括的多個半導體晶片11分離成單個。所分離的半導體晶片11可由塑料包裝封裝。In the laser processing process, a portion of the reference lines L, L' of the object 10 may be irradiated with a laser beam. When the laser beam is irradiated along the reference lines L, L', the plurality of semiconductor wafers 11 included in the object 10 can be separated into a single body. The separated semiconductor wafer 11 can be packaged in a plastic package.

於加工製程中,為了防止半導體晶片11受損,需使雷射束的移動方向(y軸方向)與對象物10的參照線L、L'中的預切割線L平行。因此,可藉由調節對象物10的排列角度而使對象物10的參照線L、L'與雷射束的加工方向(y軸方向)接近平行。In order to prevent the semiconductor wafer 11 from being damaged during the processing, it is necessary to make the moving direction (y-axis direction) of the laser beam parallel to the pre-cut line L in the reference lines L, L' of the object 10. Therefore, the reference lines L, L' of the object 10 and the processing direction (y-axis direction) of the laser beam can be made nearly parallel by adjusting the arrangement angle of the object 10.

然而,即便以參照線L、L'為基準而調節對象物10的排列方向,雷射束亦會照射至脫離預切割線L的位置。例如,會因對準(align)過程中的誤差而導致照射雷射束的位置的移動方向(y軸方向)與預切割線L不完全平行。並且,移動平台130移動夾盤20的方向會並非完全地為直線。移動平台130本身會存在缺陷,且亦會於移動平台130移動夾盤20的過程中,在垂直於移動方向(y軸方向)的方向(x軸方向)上發生振動。因上述裝備缺陷或移動過程中發生的振動使雷射束的照射位置會如圖2所示般不完全沿直線移動。However, even if the arrangement direction of the object 10 is adjusted with reference to the reference lines L and L', the laser beam is irradiated to a position away from the pre-cut line L. For example, the moving direction (y-axis direction) of the position at which the laser beam is irradiated due to an error in the alignment process is not completely parallel with the pre-cut line L. Also, the direction in which the mobile platform 130 moves the chuck 20 may not be completely straight. The mobile platform 130 itself may have a defect, and vibration may also occur in a direction (x-axis direction) perpendicular to the moving direction (y-axis direction) during the movement of the chuck 20 by the moving platform 130. The irradiation position of the laser beam may not completely move in a straight line as shown in FIG. 2 due to the above-mentioned equipment defects or vibrations occurring during the movement.

將實際加工方向與理想的直線之間的差異稱為加工方向的直線度(straightness)。於通常的情況下,直線度可不為0。若直線度變得過大,則加工品質下降,對象物10所包括的半導體晶片11亦會因雷射束而受損。The difference between the actual machining direction and the ideal straight line is called the straightness of the machining direction. Under normal circumstances, the straightness may not be zero. When the straightness is too large, the processing quality is lowered, and the semiconductor wafer 11 included in the object 10 is also damaged by the laser beam.

圖3是概略性地表示例示性的實施例的直線度測定裝置100的圖。FIG. 3 is a view schematically showing a straightness measurement device 100 of an exemplary embodiment.

參照圖3,例示性的實施例的直線度測定裝置100可包括:拍攝部110,獲得顯示於對象物10的參照線L、L'的拍攝圖像;移動平台130,沿對象物10的加工方向移動拍攝部110的拍攝位置;以及處理器140,根據顯示於上述拍攝圖像中的參照線L、L'的位置而測定上述加工方向的直線度。Referring to Fig. 3, the straightness measuring apparatus 100 of the exemplary embodiment may include an imaging unit 110 that obtains a captured image of the reference lines L, L' displayed on the object 10, and a moving platform 130 along the processing of the object 10. The direction of movement of the imaging unit 110 is moved, and the processor 140 measures the straightness of the machining direction based on the positions of the reference lines L and L′ displayed on the captured image.

拍攝部110可拍攝對象物10的表面。拍攝部110可於藉由移動平台130而拍攝位置發生變化的期間,多次獲得拍攝圖像。拍攝部110可向處理器140傳輸所獲得的拍攝圖像資訊。於圖3中,將拍攝部110與處理器140表示為分離的構成,但實施例並不限制於此。例如,處理器140亦可內置於拍攝部110。並且,處理器140與拍攝部110可共用一部分硬體資源。The imaging unit 110 can image the surface of the object 10 . The imaging unit 110 can obtain a captured image a plurality of times while the imaging position is changed by the movement platform 130. The photographing section 110 may transmit the obtained photographed image information to the processor 140. In FIG. 3, the imaging unit 110 and the processor 140 are shown as separate configurations, but the embodiment is not limited thereto. For example, the processor 140 may also be built in the imaging unit 110. Moreover, the processor 140 and the imaging unit 110 can share a part of the hardware resources.

拍攝部110可接收自對象物10反射的光。拍攝部110亦可包括用於向對象物10照射光的光源112。例如,拍攝部110可利用光源112向對象物10照射照明光而確保充分的受光量。直線度測定裝置100可更包括設置於拍攝部110與對象物10之間的聚光光學系統114。聚光光學系統114可將自光源112照射的光聚光至拍攝部110的拍攝位置而提高拍攝部110的受光量。並且,可藉由聚光光學系統114減少光源112的消耗電力。The imaging unit 110 can receive light reflected from the object 10 . The imaging unit 110 may also include a light source 112 for illuminating the object 10 with light. For example, the imaging unit 110 can illuminate the object 10 with the illumination light by the light source 112 to ensure a sufficient amount of light received. The straightness measuring device 100 may further include a collecting optical system 114 provided between the imaging unit 110 and the object 10. The collecting optical system 114 can condense the light irradiated from the light source 112 to the imaging position of the imaging unit 110 to increase the amount of light received by the imaging unit 110. Also, the power consumption of the light source 112 can be reduced by the collecting optics 114.

移動平台130可變更拍攝部110拍攝對象物10的位置。移動平台130可藉由沿y軸方向變更拍攝部110與對象物10之間的相對位置而變更拍攝部110的拍攝位置。例如,移動平台130可藉由移動安裝有對象物10的夾盤20而移動拍攝部110的拍攝位置。然而,實施例並不限制於此。移動平台130可藉由變更拍攝部110的位置而變更拍攝部110的拍攝位置,亦可使拍攝部110及對象物10均移動。The moving platform 130 can change the position at which the imaging unit 110 captures the object 10 . The moving platform 130 can change the imaging position of the imaging unit 110 by changing the relative position between the imaging unit 110 and the object 10 in the y-axis direction. For example, the mobile platform 130 can move the photographing position of the photographing portion 110 by moving the chuck 20 on which the object 10 is mounted. However, the embodiment is not limited to this. The moving platform 130 can change the imaging position of the imaging unit 110 by changing the position of the imaging unit 110, and can move both the imaging unit 110 and the object 10.

處理器140可對拍攝部110及移動平台130進行控制。處理器140可控制拍攝部110的曝光時間。並且,可控制拍攝部110拍攝圖像的時間間隔。例如,於移動平台130按照固定的速度改變拍攝位置的期間,處理器140可使拍攝部110按照固定的時間間隔拍攝圖像。處理器140可根據拍攝到拍攝圖像的時點間的時間間隔資訊而導出拍攝位置的距離變化量。處理器140可對移動平台130是否進行動作及移動平台130移動拍攝位置的速度進行控制。The processor 140 can control the imaging unit 110 and the mobile platform 130. The processor 140 can control the exposure time of the imaging section 110. Further, the time interval at which the imaging unit 110 captures an image can be controlled. For example, while the mobile platform 130 changes the shooting position at a fixed speed, the processor 140 may cause the imaging unit 110 to take an image at a fixed time interval. The processor 140 can derive the amount of change in the distance of the shooting position based on the time interval information between the time points at which the captured image is captured. The processor 140 can control whether the mobile platform 130 is operating and the speed at which the mobile platform 130 moves the shooting position.

圖4是表示利用圖3所示的直線度測定裝置100的直線度測定方法的流程圖。FIG. 4 is a flowchart showing a method of measuring the straightness by the straightness measuring device 100 shown in FIG. 3.

參照圖4,實施例的直線度測定方法可包括如下步驟:當沿雷射的加工方向改變拍攝位置時,獲得標示於對象物10的參照線L、L'的拍攝圖像的步驟1110;以及根據顯示於拍攝圖像中的參照線L、L'的位置而測定加工方向的直線度的步驟1120。Referring to FIG. 4, the straightness measuring method of the embodiment may include the step of obtaining a photographed image of the reference lines L, L' indicated on the object 10 when the photographing position is changed along the processing direction of the laser; The step 1120 of measuring the straightness of the machining direction based on the positions of the reference lines L and L' displayed in the captured image.

於步驟1110中,拍攝部110可拍攝對象物10的表面。拍攝部110可拍攝顯示於對象物10的參照線L、L'。移動平台130可移動拍攝部110的拍攝位置。拍攝部110可於拍攝位置沿y軸方向移動的期間,多次獲得拍攝圖像。拍攝部110可於移動平台130變更拍攝位置的期間拍攝對象物10。於該情形時,與於移動平台130停止的狀態下進行拍攝的情形相比,可縮短於多個拍攝位置獲得拍攝圖像的時間。In step 1110, the imaging unit 110 can capture the surface of the object 10. The imaging unit 110 can capture the reference lines L and L′ displayed on the object 10 . The moving platform 130 can move the shooting position of the shooting section 110. The imaging unit 110 can obtain a captured image a plurality of times while the imaging position is moving in the y-axis direction. The imaging unit 110 can image the object 10 while the moving platform 130 changes the imaging position. In this case, the time at which the captured image is obtained at a plurality of shooting positions can be shortened as compared with the case where the shooting is performed in a state where the moving platform 130 is stopped.

處理器140可對拍攝部110的曝光時間及移動平台130移動拍攝位置的速度進行控制。處理器140可藉由控制上述曝光時間及速度而使顯示至拍攝圖像的參照線L、L'的線寬變得小於拍攝部110的解析度。以下,對因拍攝圖像的模糊(blur)現象引起的參照線L、L'的線寬增加進行說明。The processor 140 can control the exposure time of the imaging unit 110 and the speed at which the mobile platform 130 moves the shooting position. The processor 140 can control the line width of the reference lines L, L' displayed to the captured image to be smaller than the resolution of the imaging unit 110 by controlling the exposure time and speed. Hereinafter, the increase in the line width of the reference lines L and L' due to the blur phenomenon of the captured image will be described.

於加工方向與參照線L、L'、例如預切割線L準確地平行的情形時,即便拍攝位置向加工方向移動,參照線L、L'的線寬亦不會改變。然而,如上所述,會因對象物10的排列角度變形而無法使加工方向與參照線L、L'準確地一致。並且,會因於移動平台130發生的振動等而無法使移動平台130移動對象物10的方向與y軸準確地一致,因此加工方向會自參照線L、L'變形。When the machining direction is exactly parallel to the reference lines L and L' and, for example, the pre-cut line L, the line width of the reference lines L and L' does not change even if the imaging position moves in the machining direction. However, as described above, the machining direction cannot be accurately aligned with the reference lines L and L' due to the deformation of the arrangement angle of the object 10. Further, the direction in which the moving platform 130 moves the object 10 cannot be accurately aligned with the y-axis due to vibration or the like generated by the moving platform 130, and thus the machining direction is deformed from the reference lines L and L'.

圖5是用以說明上述參照線L、L'的線寬變化的圖。FIG. 5 is a view for explaining a change in line width of the above-described reference lines L and L'.

參照圖5,加工方向k與參照線L、L'可不完全平行。加工方向k與參照線L、L'之間的角度θ可根據對象物10的排列角度及於移動平台130的動作過程中發生的振動大小而改變。例如,角度θ可定義為加工方向k與預切割線L之間的角度。若一面沿加工方向k變更拍攝位置,一面拍攝對象物10,則於拍攝部110的曝光期間,參照線L、L'的位置會發生變更。因此,會因拍攝位置移動而於拍攝圖像中產生參照線L、L'變模糊(blur)的效果。Referring to Figure 5, the machine direction k and the reference lines L, L' may not be completely parallel. The angle θ between the machining direction k and the reference lines L, L' may vary depending on the arrangement angle of the object 10 and the magnitude of vibration occurring during the operation of the moving platform 130. For example, the angle θ can be defined as the angle between the machining direction k and the pre-cut line L. When the object 10 is imaged while changing the imaging position in the processing direction k, the positions of the reference lines L and L' are changed during the exposure period of the imaging unit 110. Therefore, the effect of blurring the reference lines L, L' in the captured image occurs due to the movement of the shooting position.

圖6是表示於曝光期間,因拍攝位置沿加工方向k移動而參照線L、L'的位置發生變化的圖。FIG. 6 is a view showing changes in the positions of the reference lines L and L' due to the movement of the imaging position in the machining direction k during the exposure period.

參照圖6,加工方向k與參照線L、L'可不彼此平行。拍攝部110可於特定的曝光期間拍攝對象物10。於曝光期間,對象物10與拍攝部110的相對位置發生變更而拍攝位置會沿加工方向k移動距離d。於拍攝位置移動距離d的期間,參照線L、L'的位置可向垂直於加工方向k的方向移動距離w。因此,會於拍攝圖像中模糊地拍攝參照線L、L'而參照線L、L'的線寬增加。Referring to Fig. 6, the machine direction k and the reference lines L, L' may not be parallel to each other. The imaging unit 110 can image the object 10 during a specific exposure period. During the exposure period, the relative position of the object 10 and the imaging unit 110 is changed, and the imaging position is moved by the distance d in the machining direction k. While the shooting position is moving by the distance d, the position of the reference lines L, L' can be moved by a distance w in a direction perpendicular to the machining direction k. Therefore, the reference lines L and L' are blurably captured in the captured image, and the line widths of the reference lines L and L' are increased.

圖7是表示於拍攝圖像中,參照線L、L'的線寬增加的圖。FIG. 7 is a view showing an increase in the line width of the reference lines L and L' in the captured image.

參照圖7,參照線L、L'的線寬會因拍攝部110的拍攝圖像變模糊的效果而增加。因於拍攝部110的曝光期間拍攝位置發生變化而參照線L、L'會向垂直於加工方向k的方向移動。因此,參照線L、L'的位置不會於拍攝圖像中準確地特定而參照線L、L'的線寬增加。Referring to Fig. 7, the line widths of the reference lines L, L' increase due to the effect of blurring of the captured image of the imaging unit 110. The reference lines L, L' move in a direction perpendicular to the machining direction k due to a change in the imaging position during the exposure of the imaging unit 110. Therefore, the positions of the reference lines L, L' are not accurately specified in the captured image, and the line widths of the reference lines L, L' are increased.

參照線L、L'的線寬可取決於加工方向k與參照線L、L'之間的角度θ、拍攝部120的曝光時間及拍攝位置的移動速度。例如,拍攝部120的曝光時間越大、拍攝位置的移動速度越大,則參照線L、L'的線寬越大。The line width of the reference lines L, L' may depend on the angle θ between the machining direction k and the reference lines L, L', the exposure time of the imaging unit 120, and the moving speed of the shooting position. For example, the larger the exposure time of the imaging unit 120 and the larger the moving speed of the imaging position, the larger the line width of the reference lines L and L'.

若參照線L、L'的線寬變得過大,則無法於拍攝圖像中容易地確定參照線L、L'的準確位置。若於拍攝圖像中參照線L、L'的位置誤差變大,則根據拍攝圖像讀取的加工方向k的直線度的值的誤差亦會變大。When the line widths of the reference lines L and L' become too large, the accurate positions of the reference lines L and L' cannot be easily determined in the captured image. When the position error of the reference lines L and L' in the captured image becomes large, the error of the value of the straightness of the machining direction k read from the captured image also increases.

一實施例的直線度測定方法可於步驟1110中,使藉由拍攝位置移動而顯示至拍攝圖像的上述參照線的線寬小於拍攝部110的解析度。此處,可根據拍攝部110的像素尺寸及倍率而確定拍攝部110的解析度。作為例示,可藉由等式1而確定拍攝部110的解析度。In the straightness measurement method of an embodiment, in step 1110, the line width of the reference line displayed to the captured image by the movement of the imaging position is smaller than the resolution of the imaging unit 110. Here, the resolution of the imaging unit 110 can be determined based on the pixel size and magnification of the imaging unit 110. As an example, the resolution of the imaging unit 110 can be determined by Equation 1.

[等式1] [Equation 1]

於等式1中,r是指拍攝部110的解析度。並且,P作為像素的尺寸,可指像素的長度或寬度的尺寸。另外,M是指拍攝部110的倍率。於雷射加工製程中所使用的相機裝置的情形時,上述解析度可為大致0.2 μm至0.3 μm左右。然而,上述數值僅為示例,並不限制實施例。In Equation 1, r is the resolution of the imaging unit 110. Also, P, as the size of the pixel, may refer to the size of the length or width of the pixel. In addition, M means the magnification of the imaging unit 110. In the case of a camera device used in a laser processing process, the above resolution may be approximately 0.2 μm to 0.3 μm. However, the above numerical values are merely examples and are not limitative of the embodiments.

處理器140可藉由調節拍攝部110的曝光時間及移動平台130移動拍攝位置的速度而使顯示至拍攝圖像的參照線L、L'的線寬變得小於拍攝部110的解析度r。若參照線L、L'的線寬變得小於拍攝部110的解析度r,則可於拍攝圖像中減少參照線L、L'的位置的誤差。另外,若參照線L、L'的位置的誤差減少,則亦可減少直線度的測定誤差。The processor 140 can make the line width of the reference lines L, L' displayed to the captured image smaller than the resolution r of the imaging unit 110 by adjusting the exposure time of the imaging unit 110 and the speed at which the moving platform 130 moves the imaging position. When the line width of the reference lines L and L' is smaller than the resolution r of the imaging unit 110, the error of the position of the reference lines L and L' can be reduced in the captured image. Further, if the error of the position of the reference lines L and L' is reduced, the measurement error of the straightness can be reduced.

作為例示,處理器140可藉由調節拍攝部110的曝光時間及移動平台130移動拍攝位置的速度而使顯示至拍攝圖像的參照線L、L'的線寬變得小於拍攝部110的解析度r的一半。若參照線L、L'的線寬變得小於拍攝部110的解析度r的一半,則於拍攝圖像中,參照線L、L'可僅顯示至一個像素。因此,可幾乎消除因動態拍攝產生的圖像模糊效果引起的誤差。By way of example, the processor 140 can make the line width of the reference lines L, L′ displayed to the captured image smaller than the resolution of the imaging unit 110 by adjusting the exposure time of the imaging unit 110 and the speed at which the mobile platform 130 moves the imaging position. Half of the degree r. When the line width of the reference lines L and L' is smaller than half of the resolution r of the imaging unit 110, the reference lines L and L' can be displayed to only one pixel in the captured image. Therefore, the error caused by the image blurring effect caused by the dynamic shooting can be almost eliminated.

處理器140可使拍攝部110的曝光時間E及移動平台130移動拍攝位置的速度V滿足等式2。The processor 140 can satisfy the exposure time E of the imaging unit 110 and the speed V at which the moving platform 130 moves the shooting position to satisfy Equation 2.

[等式2] [Equation 2]

於等式2中,V=加工位置移動速度,E=曝光時間,θ=加工方向k與參照線L、L'之間的角度,P=像素尺寸,M=倍率。In Equation 2, V = machining position moving speed, E = exposure time, θ = angle between the machining direction k and the reference lines L, L', P = pixel size, M = magnification.

參照等式2,V*E可與圖6所示的距離d對應。即,於曝光時間E期間,拍攝位置沿加工方向k移動的距離d可與曝光時間E與拍攝位置的移動速度V的乘積相同。並且,V*E*tanθ可與圖6所示的距離w對應。即,於曝光時間E期間,參照線L、L'的位置向垂直於加工方向k的方向移動的距離w可由拍攝位置所移動的距離d及加工方向k與參照線L、L'之間的角度θ確定。根據等式2,於曝光時間E期間,參照線L、L'的位置向垂直於加工方向k的方向移動的距離w可小於拍攝部110的解析度(r=P/M)。距離w可幾乎與因圖像的模糊效果形成的參照線L、L'的線寬相同。因此,參照線L、L'的線寬可變得更小於拍攝部110的解析度。Referring to Equation 2, V*E may correspond to the distance d shown in FIG. 6. That is, during the exposure time E, the distance d in which the photographing position moves in the processing direction k can be the same as the product of the exposure time E and the moving speed V of the photographing position. Further, V*E*tanθ may correspond to the distance w shown in FIG. 6. That is, during the exposure time E, the distance w between the positions of the reference lines L, L' moving in the direction perpendicular to the machining direction k can be moved by the distance d between the shooting position and the machining direction k and the reference line L, L' The angle θ is determined. According to Equation 2, during the exposure time E, the distance w of the position of the reference lines L, L' moving in the direction perpendicular to the machining direction k may be smaller than the resolution of the imaging unit 110 (r = P / M). The distance w can be almost the same as the line width of the reference lines L, L' formed by the blurring effect of the image. Therefore, the line width of the reference lines L, L' can become smaller than the resolution of the imaging section 110.

於通常的雷射加工製程中,tanθ可具有大致0至10-4 範圍的值。因此,於解析度P/M具有大致0.2 μm至0.3 μm的值的情形時,速度V及曝光時間E可大致滿足V*E≤100 μm。然而,若移動拍攝位置的速度V過小,則難以高速測定直線度,曝光時間E可大致滿足E<2 ms。上述數值僅為示例,並不限制實施例。In a typical laser processing process, tan θ may have a value in the range of approximately 0 to 10 -4 . Therefore, when the resolution P/M has a value of approximately 0.2 μm to 0.3 μm, the velocity V and the exposure time E can substantially satisfy V*E ≤ 100 μm. However, if the speed V of the moving photographing position is too small, it is difficult to measure the straightness at a high speed, and the exposure time E can substantially satisfy E < 2 ms. The above numerical values are merely examples and are not limitative of the embodiments.

圖8是表示由拍攝部110拍攝到的拍攝圖像的一實例的圖。FIG. 8 is a view showing an example of a captured image captured by the imaging unit 110.

參照圖8,可於拍攝部110的拍攝圖像中顯示參照線L、L'。參照線L、L'的線寬可小於拍攝部110的x軸方向的解析度。因此,參照線L、L'的x軸位置可於拍攝圖像中由一個像素位置定義。Referring to Fig. 8, reference lines L, L' can be displayed in the captured image of the imaging unit 110. The line width of the reference lines L, L' may be smaller than the resolution of the imaging unit 110 in the x-axis direction. Therefore, the x-axis position of the reference lines L, L' can be defined by one pixel position in the captured image.

每當拍攝位置發生變化時,拍攝部110均可獲得如圖8所示的拍攝圖像。可於多個拍攝圖像中,根據參照線L、L'的位置向x軸方向偏移(shift)的程度而確定加工方向的直線度。即,於拍攝圖像中,重要的是參照線L、L'是否向x軸方向偏移,故而於y軸方向上獲得對象物10的整體圖像的必要性會較少。因此,由拍攝部110拍攝的拍攝圖像的x軸方向尺寸與y軸方向尺寸會不同。The photographing section 110 can obtain a photographed image as shown in FIG. 8 every time the photographing position changes. The straightness of the machining direction can be determined in accordance with the degree of shifting of the position of the reference lines L and L' in the x-axis direction among the plurality of captured images. That is, it is important in the captured image whether or not the reference lines L and L' are shifted in the x-axis direction, so that the necessity of obtaining the entire image of the object 10 in the y-axis direction is small. Therefore, the size of the captured image captured by the imaging unit 110 in the x-axis direction and the size in the y-axis direction are different.

例如,拍攝圖像的y軸方向(藉由移動平台130而拍攝位置移動的方向)的長度可小於拍攝圖像的x軸方向的長度。拍攝部110可拍攝局部圖框,而並非拍攝對象物10的整個圖框。例如,拍攝部110可於藉由移動平台130而拍攝位置移動的方向(y軸方向)上僅拍攝對象物10的一部分圖框,於x軸方向上拍攝整個圖框。上述內容僅為示例,並不限定實施例。For example, the length of the y-axis direction of the captured image (the direction in which the photographing position is moved by moving the stage 130) may be smaller than the length of the captured image in the x-axis direction. The imaging unit 110 can capture a partial frame instead of the entire frame of the object 10 . For example, the imaging unit 110 can capture only a part of the frame of the object 10 in the direction in which the position of the position is moved by the moving platform 130 (y-axis direction), and the entire frame can be captured in the x-axis direction. The above is merely an example and is not intended to limit the embodiments.

若拍攝部110於y軸方向上僅拍攝一部分圖框,則拍攝部110於每小時可拍攝圖像的次數會增加。因此,可容易地將拍攝部110的曝光時間E調節地較小。不僅如此,因每單位時間獲得更多的圖像而參照線L、L'的位置變化的時間間隔會更短。若拍攝部110以更短的時間間隔獲得更多的拍攝圖像,則可更提高測定加工方向的直線度的準確度。When the imaging unit 110 captures only a part of the frame in the y-axis direction, the number of times the imaging unit 110 can capture an image per hour increases. Therefore, the exposure time E of the imaging section 110 can be easily adjusted to be small. Moreover, the time interval for changing the position of the reference lines L, L' is shorter because more images are obtained per unit time. If the imaging unit 110 obtains more captured images at shorter time intervals, the accuracy of measuring the straightness of the machining direction can be further improved.

作為例示,拍攝部110亦可拍攝線圖像。即,可於拍攝圖像中,在y軸方向上僅具備一個像素。若拍攝部110拍攝線圖像,則因於y軸方向上僅具備一個像素而拍攝部110的構成會變簡單。並且,於y軸方向上排列拍攝部110所包括的受光元件變容易,因此每單位像素的受光面積會變廣。因拍攝部110的每單位像素的受光面積變廣而可提高拍攝圖像的清晰度。As an example, the imaging unit 110 can also capture a line image. That is, only one pixel can be provided in the y-axis direction in the captured image. When the imaging unit 110 captures a line image, the configuration of the imaging unit 110 is simplified because only one pixel is provided in the y-axis direction. Further, since the light receiving elements included in the imaging unit 110 are easily arranged in the y-axis direction, the light receiving area per unit pixel is widened. Since the light receiving area per unit pixel of the imaging unit 110 is widened, the sharpness of the captured image can be improved.

再次參照圖4,於步驟1120中,處理器140可根據顯示於多個拍攝圖像的參照線L、L'的位置而測定加工方向k的直線度。處理器140可自拍攝部110接收多個拍攝圖像。多個拍攝圖像可為分別拍攝不同的拍攝位置所得者。於藉由移動平台130而光源112與對象物10之間的相對位置改變的期間,拍攝部110可獲得對象物10的拍攝圖像而傳輸至處理器140。處理器140可根據分別顯示於多個拍攝圖像的參照線L、L'的位置而測定加工方向k的直線度。Referring again to FIG. 4, in step 1120, the processor 140 may determine the straightness of the machining direction k based on the positions of the reference lines L, L' displayed on the plurality of captured images. The processor 140 may receive a plurality of captured images from the photographing section 110. A plurality of captured images may be obtained by separately shooting different shooting positions. While the relative position between the light source 112 and the object 10 is changed by the movement platform 130, the imaging unit 110 can obtain a captured image of the object 10 and transmit it to the processor 140. The processor 140 can measure the straightness of the machining direction k based on the positions of the reference lines L, L' respectively displayed on the plurality of captured images.

圖9是例示性地表示排列處理器140所接收到的多個拍攝圖像所得的圖。FIG. 9 is a view exemplarily showing a plurality of captured images received by the array processor 140.

參照圖9,處理器140可自拍攝部110接收多個拍攝圖像。例如,處理器140可分別於第一圖像a、第二圖像b、第三圖像c中識別參照線L、L'的位置。參照圖9,於第一圖像a與第二圖像b中,參照線L、L'的位置幾乎未改變,於第三圖像c中,參照線L、L'的位置可移動Δx。處理器140可根據參照線L、L'的x軸方向的位置偏移量Δx與於拍攝第一圖像a、第二圖像b及第三圖像c的期間藉由移動平台130而拍攝位置沿y軸方向移動的距離的比率,獲知加工方向k的直線度。Referring to FIG. 9, the processor 140 may receive a plurality of captured images from the photographing section 110. For example, the processor 140 may identify the positions of the reference lines L, L' in the first image a, the second image b, and the third image c, respectively. Referring to Fig. 9, in the first image a and the second image b, the positions of the reference lines L, L' are hardly changed, and in the third image c, the positions of the reference lines L, L' are movable by Δx. The processor 140 can capture the position offset amount Δx in the x-axis direction of the reference lines L, L′ and the moving platform 130 during the period of capturing the first image a, the second image b, and the third image c. The straightness of the machining direction k is obtained by the ratio of the distance of the position moving in the y-axis direction.

處理器140為了準確地獲知直線度,不僅需要參照線L、L'的x軸方向的位置偏移量Δx,而且會需要於拍攝第一圖像a、第二圖像b及第三圖像c的期間拍攝位置沿y軸方向移動的距離資訊。In order to accurately know the straightness, the processor 140 not only needs to refer to the positional shift amount Δx of the line L, L′ in the x-axis direction, but also needs to capture the first image a, the second image b, and the third image. The distance information of the position where c is moved along the y-axis during the period of c.

為了使處理器140容易地獲得拍攝位置的移動距離資訊,每當藉由移動平台130而拍攝位置改變特定距離時,拍攝部110均可拍攝對象物10。例如,拍攝部110可藉由每當移動平台130使對象物10或拍攝部110移動固定的距離時產生的脈衝訊號同步化而拍攝對象物10。In order for the processor 140 to easily obtain the moving distance information of the shooting position, the photographing unit 110 can photograph the object 10 every time the shooting position is changed by the moving platform 130 by a certain distance. For example, the imaging unit 110 can image the object 10 by synchronizing the pulse signals generated when the moving platform 130 moves the object 10 or the imaging unit 110 by a fixed distance.

再次參照圖3,實施例的直線度測定裝置100可更包括每當拍攝位置改變特定的距離時均產生脈衝訊號的編碼器135。編碼器135可與移動平台130連接而感測移動平台130的機械移動。編碼器135可感測移動平台130移動光源112或對象物10的距離。每當藉由移動平台130而拍攝部110的拍攝位置移動特定的間隔時,編碼器135均可產生脈衝訊號。於編碼器135中產生的脈衝訊號可傳輸至拍攝部110。Referring again to FIG. 3, the straightness determining apparatus 100 of the embodiment may further include an encoder 135 that generates a pulse signal each time the shooting position is changed by a specific distance. Encoder 135 can be coupled to mobile platform 130 to sense mechanical movement of mobile platform 130. The encoder 135 can sense the distance that the mobile platform 130 moves the light source 112 or the object 10. The encoder 135 can generate a pulse signal each time the shooting position of the imaging unit 110 is moved by a certain interval by the mobile platform 130. The pulse signal generated in the encoder 135 can be transmitted to the imaging unit 110.

拍攝部110的動作可藉由編碼器135的脈衝訊號而同步化。例如,拍攝部110若接收脈衝訊號,則可於曝光時間E期間拍攝對象物10。拍攝部110藉由編碼器135的脈衝訊號而同步化,故而每當拍攝位置沿y軸方向改變固定距離時,均可獲得拍攝圖像。另外,處理器140可於對拍攝圖像進行拍攝的期間,根據拍攝圖像的數量導出拍攝位置的變化量。The operation of the imaging unit 110 can be synchronized by the pulse signal of the encoder 135. For example, when the imaging unit 110 receives the pulse signal, the imaging unit 110 can image the object 10 during the exposure time E. The imaging unit 110 is synchronized by the pulse signal of the encoder 135, so that the captured image can be obtained every time the shooting position is changed by a fixed distance in the y-axis direction. In addition, the processor 140 may derive the amount of change in the shooting position according to the number of captured images during the shooting of the captured image.

於圖8及圖9中,可於拍攝圖像中相對容易地識別參照線L、L'。然而,根據拍攝圖像的品質而會存在難以識別參照線L、L'的情形。In FIGS. 8 and 9, the reference lines L, L' can be relatively easily recognized in the captured image. However, depending on the quality of the captured image, there may be cases where it is difficult to recognize the reference lines L, L'.

圖10是表示拍攝圖像的一實例的圖。Fig. 10 is a view showing an example of a captured image.

參照圖10,於拍攝圖像的亮度變化較少的情形時,會難以識別參照線L、L'。若處理器140難以識別參照線L、L',則會難以根據參照線L、L'的位置變化而測定直線度。Referring to Fig. 10, when the brightness of the captured image changes little, it is difficult to recognize the reference lines L, L'. If it is difficult for the processor 140 to recognize the reference lines L and L', it is difficult to measure the straightness based on the positional changes of the reference lines L and L'.

為了解決圖10所示的問題,處理器140能夠以亮度為基準而將自拍攝部110接收到的拍攝圖像二進制。處理器140可於拍攝圖像中分為亮度高於特定的基準值的區域與並非如此的區域兩者。處理器140可於拍攝圖像中將亮度高於基準值的區域處理成白色,將亮度低於基準值的區域處理成黑色。In order to solve the problem shown in FIG. 10, the processor 140 can binary the captured image received from the imaging unit 110 based on the luminance. The processor 140 may be divided into a region where the luminance is higher than a specific reference value and a region where it is not. The processor 140 may process an area in which the brightness is higher than the reference value into white in the captured image, and process an area in which the brightness is lower than the reference value into black.

圖11是表示將圖10所示的拍攝圖像二進制所得的圖。Fig. 11 is a view showing a binary image obtained by folding the captured image shown in Fig. 10.

參照圖11,處理器140可產生以亮度為基準而將圖10所示的拍攝圖像二進制所得的二進制圖像。於二進制圖像中,可容易地區分亮度高於基準值的區域與亮度低於基準值的區域。因此,可於二進制圖像中容易地識別參照線L、L'的位置。Referring to FIG. 11, the processor 140 may generate a binary image obtained by binarizing the captured image shown in FIG. 10 on the basis of luminance. In the binary image, it is easy to distinguish between a region where the luminance is higher than the reference value and a region where the luminance is lower than the reference value. Therefore, the positions of the reference lines L, L' can be easily recognized in the binary image.

於圖11中,處理器140以亮度為基準而將拍攝圖像二進制,但實施例並不限制於此。處理器140亦可按照既定的各亮度區間不連續地顯示拍攝圖像的亮度。例如,處理器140亦可於拍攝圖像中將具有處於第一範圍內的亮度值的區域統一成第一亮度而顯示,將具有處於第二範圍內的亮度值的區域統一成第二亮度而顯示,將具有處於第三範圍內的亮度值的區域統一成第三亮度而顯示。即,處理器140亦可將拍攝圖像顯示成n個(n為任意的自然數)亮度值。In FIG. 11, the processor 140 binars the captured image based on the luminance, but the embodiment is not limited thereto. The processor 140 may also display the brightness of the captured image discontinuously in accordance with the predetermined brightness intervals. For example, the processor 140 may also display a region having a luminance value within the first range into a first luminance and display the region having the luminance value in the second range into a second luminance in the captured image. Display is performed by unifying the area having the luminance value in the third range into the third brightness. That is, the processor 140 may also display the captured image as n (n is an arbitrary natural number) luminance value.

圖12是表示將圖10所示的拍攝圖像轉換成既定的多個亮度值所得的圖像。FIG. 12 is an image obtained by converting the captured image shown in FIG. 10 into a predetermined plurality of luminance values.

參照圖12,拍攝圖像可顯示成多個亮度值。於該情形時,可較拍攝圖像的原件更容易地識別參照線L、L'。並且,亦可於轉換圖像中顯示拍攝圖像的大致的亮度變化。Referring to FIG. 12, a captured image may be displayed in a plurality of luminance values. In this case, the reference lines L, L' can be identified more easily than the original of the captured image. Further, a substantial change in luminance of the captured image may be displayed in the converted image.

以上,參照圖1至圖12對例示性的實施例的直線度測定裝置及方法進行了說明。根據上述實施例,可於沿加工方向移動拍攝位置的期間,拍攝顯示於對象物10的參照線L、L'。因此,直線度測定速度會快於在拍攝位置靜止的狀態下進行測定的情形。並且,可防止因拍攝位置移動產生的圖像模糊現象使參照線L、L'的位置變得不明確的情形。因此,可提高測定直線度的準確度。The straightness measuring apparatus and method of the exemplary embodiment have been described above with reference to Figs. 1 to 12 . According to the above embodiment, the reference lines L, L' displayed on the object 10 can be captured while the imaging position is moved in the machining direction. Therefore, the straightness measurement speed is faster than the case where the measurement is performed while the shooting position is stationary. Further, it is possible to prevent the position of the reference lines L and L' from being unclear due to the image blurring phenomenon caused by the movement of the shooting position. Therefore, the accuracy of measuring the straightness can be improved.

於上述說明中,具體地記載有諸多事項,但這些事項並不限定發明的範圍,應解釋為較佳實施例的示例。因此,不應由所說明的實施例界定本發明的範圍,而應由申請專利範圍中所記載的技術思想界定。In the above description, various matters are specifically described, but these matters are not intended to limit the scope of the invention, and should be construed as an example of a preferred embodiment. Therefore, the scope of the invention should not be limited by the illustrated embodiments, but should be defined by the technical idea recited in the claims.

10‧‧‧對象物
11‧‧‧半導體晶片
20‧‧‧夾盤
100‧‧‧直線度測定裝置
110、120‧‧‧拍攝部
112‧‧‧光源
114‧‧‧聚光光學系統
130‧‧‧移動平台
135‧‧‧編碼器
140‧‧‧處理器
1110、1120‧‧‧步驟
d、w‧‧‧距離
k‧‧‧加工方向
L、L'‧‧‧參照線
θ‧‧‧加工方向與參照線之間的角度
Δx‧‧‧位置偏移量
10‧‧‧ objects
11‧‧‧Semiconductor wafer
20‧‧‧ chuck
100‧‧‧straightness measuring device
110, 120‧‧ ‧Photography Department
112‧‧‧Light source
114‧‧‧Concentrating optical system
130‧‧‧Mobile platform
135‧‧‧Encoder
140‧‧‧ processor
1110, 1120‧‧‧ steps
d, w‧‧‧ distance
k‧‧‧Processing direction
L, L'‧‧‧ reference line θ‧‧‧An angle between the machining direction and the reference line Δx‧‧‧ position offset

圖1是例示性地表示對象物的雷射加工製程的圖。 圖2是例示性地表示對象物的表面的圖。 圖3是概略性地表示例示性的實施例的直線度測定裝置的圖。 圖4是表示利用圖3所示的直線度測定裝置的直線度測定方法的流程圖。 圖5是用以說明上述參照線的線寬變化的圖。 圖6是表示於曝光期間中,因拍攝位置沿加工方向移動而參照線的位置發生變化的圖。 圖7是表示於拍攝圖像中,參照線的線寬增加的圖。 圖8是表示由拍攝部拍攝到的拍攝圖像的一實例的圖。 圖9是例示性地表示排列處理器所接收到的多個拍攝圖像所得的圖。 圖10是表示拍攝圖像的一實例的圖。 圖11是表示將圖10所示的拍攝圖像二進制所得的圖。 圖12是表示將圖10所示的拍攝圖像轉換成既定的多個亮度值所得的圖像。FIG. 1 is a view exemplarily showing a laser processing process of an object. FIG. 2 is a view exemplarily showing the surface of an object. Fig. 3 is a view schematically showing a straightness measuring device of an exemplary embodiment. 4 is a flow chart showing a method of measuring the straightness using the straightness measuring device shown in FIG. 3. Fig. 5 is a view for explaining a change in line width of the above reference line. FIG. 6 is a view showing a change in the position of the reference line when the imaging position moves in the machining direction during the exposure period. FIG. 7 is a view showing an increase in line width of a reference line in a captured image. 8 is a view showing an example of a captured image captured by an imaging unit. FIG. 9 is a view exemplarily showing a plurality of captured images received by the array processor. Fig. 10 is a view showing an example of a captured image. Fig. 11 is a view showing a binary image obtained by folding the captured image shown in Fig. 10. FIG. 12 is an image obtained by converting the captured image shown in FIG. 10 into a predetermined plurality of luminance values.

10‧‧‧對象物 10‧‧‧ objects

20‧‧‧夾盤 20‧‧‧ chuck

100‧‧‧直線度測定裝置 100‧‧‧straightness measuring device

110‧‧‧拍攝部 110‧‧‧Photography Department

112‧‧‧光源 112‧‧‧Light source

114‧‧‧聚光光學系統 114‧‧‧Concentrating optical system

130‧‧‧移動平台 130‧‧‧Mobile platform

135‧‧‧編碼器 135‧‧‧Encoder

140‧‧‧處理器 140‧‧‧ processor

Claims (14)

一種直線度測定方法,用以測定對象物的加工方向的直線度,包括: 當根據所述對象物的所述加工方向改變拍攝的位置時,獲得標示於所述對象物上的參照線的拍攝圖像;以及 根據顯示於所述拍攝圖像的所述參照線的位置而測定所述加工方向的直線度,且 於獲得所述拍攝圖像中,因拍攝位置移動而顯示至所述拍攝圖像的所述參照線的線寬小於拍攝部的解析度。A straightness measuring method for measuring a straightness of a machining direction of an object, comprising: obtaining a reference line marked on the object when a position of the image is changed according to the machining direction of the object And determining a straightness of the machining direction according to a position of the reference line displayed on the captured image, and displaying the captured image due to movement of the shooting position in obtaining the captured image The line width of the reference line of the image is smaller than the resolution of the imaging unit. 如申請專利範圍第1項所述的直線度測定方法,其中所述拍攝部使所述參照線的線寬變得小於所述拍攝部的解析度的1/2。The straightness measuring method according to claim 1, wherein the imaging unit makes a line width of the reference line smaller than 1/2 of a resolution of the imaging unit. 如申請專利範圍第1項所述的直線度測定方法,其中於獲得所述拍攝圖像中,拍攝所述拍攝圖像的曝光時間及所述拍攝位置的移動速度滿足等式1: V*E*tanθ<P/M…等式1, 其中V為加工位置移動速度,E為曝光時間,θ為加工方向與參照線之間的角度,P為像素尺寸,M為倍率。The straightness measurement method according to claim 1, wherein in obtaining the captured image, an exposure time of capturing the captured image and a moving speed of the shooting position satisfy Equation 1: V*E *tan θ < P / M ... Equation 1, where V is the machining position moving speed, E is the exposure time, θ is the angle between the machining direction and the reference line, P is the pixel size, and M is the magnification. 如申請專利範圍第1項所述的直線度測定方法,其中於獲得所述拍攝圖像中,所述拍攝圖像的第一方向長度與第二方向長度不同。The straightness measurement method according to claim 1, wherein in the obtained captured image, the first direction length of the captured image is different from the second direction length. 如申請專利範圍第4項所述的直線度測定方法,其中於獲得所述拍攝圖像中,將所述拍攝圖像拍攝為線圖像。The straightness measuring method according to the fourth aspect of the invention, wherein the captured image is taken as a line image in obtaining the captured image. 如申請專利範圍第1項所述的直線度測定方法,其中測定所述直線度的步驟包括: 以所述拍攝圖像的亮度為基準而將所述拍攝圖像轉換成二進制圖像;以及根據所述二進制圖像而識別所述參照線的位置。The straightness measuring method according to claim 1, wherein the measuring the straightness comprises: converting the captured image into a binary image based on a brightness of the captured image; The binary image identifies the location of the reference line. 如申請專利範圍第1項所述的直線度測定方法,其更包括:藉由使所述拍攝位置發生變化而產生脈衝訊號, 其中於獲得所述拍攝圖像中,藉由使所述脈衝訊號同步化而獲得所述拍攝圖像。The straightness measurement method according to claim 1, further comprising: generating a pulse signal by changing the photographing position, wherein the pulse signal is obtained by obtaining the photographed image The captured image is obtained by synchronizing. 一種直線度測定裝置,用以測定對象物的加工方向的直線度,包括: 拍攝部,用於獲得顯示於所述對象物的參照線的拍攝圖像; 移動平台,沿所述對象物的加工方向移動所述拍攝部的拍攝位置;以及 處理器,根據顯示於所述拍攝圖像的所述參照線的位置而測定所述加工方向的直線度,且 所述處理器以因所述拍攝位置移動而顯示至所述拍攝圖像的所述參照線的線寬小於所述拍攝部的解析度的方式控制所述拍攝部。A straightness measuring device for measuring a straightness of a machining direction of an object, comprising: an image capturing portion for obtaining a captured image of a reference line displayed on the object; a moving platform, processing along the object a direction of moving the imaging position of the imaging unit; and a processor determining a straightness of the machining direction according to a position of the reference line displayed on the captured image, and the processor is caused by the shooting position The imaging unit is controlled such that the line width of the reference line displayed to the captured image is smaller than the resolution of the imaging unit. 如申請專利範圍第8項所述的直線度測定裝置,其中所述處理器以所述參照線的線寬小於所述拍攝部的解析度的1/2的方式控制所述拍攝部。The straightness measuring apparatus according to claim 8, wherein the processor controls the imaging unit such that a line width of the reference line is smaller than 1/2 of a resolution of the imaging unit. 如申請專利範圍第8項所述的直線度測定裝置,其中所述處理器以所述拍攝位置的移動速度及所述拍攝部的曝光時間滿足等式1的方式控制所述拍攝部及所述移動平台: V*E*tanθ<P/M…等式1, 其中V為加工位置移動速度,E為曝光時間,θ為加工方向與參照線之間的角度,P為像素尺寸,M為倍率。The straightness measuring apparatus according to claim 8, wherein the processor controls the photographing unit and the photographing manner in such a manner that the moving speed of the photographing position and the exposure time of the photographing portion satisfy Equation 1 Mobile platform: V*E*tanθ<P/M... Equation 1, where V is the machining position moving speed, E is the exposure time, θ is the angle between the machining direction and the reference line, P is the pixel size, and M is the magnification . 如申請專利範圍第8項所述的直線度測定裝置,其中所述拍攝部使所述拍攝圖像的第一方向長度與第二方向長度不同。The straightness measurement device according to claim 8, wherein the imaging unit makes the first direction length of the captured image different from the second direction length. 如申請專利範圍第11項所述的直線度測定裝置,其中所述拍攝部將所述拍攝圖像拍攝為線圖像。The straightness measurement device according to claim 11, wherein the imaging unit captures the captured image as a line image. 如申請專利範圍第9項所述的直線度測定裝置,其中所述處理器以所述拍攝圖像的亮度為基準而將所述拍攝圖像轉換成二進制圖像。The straightness measuring apparatus according to claim 9, wherein the processor converts the captured image into a binary image based on a brightness of the captured image. 如申請專利範圍第8項所述的直線度測定裝置,其更包括編碼器,所述編碼器由於所述拍攝位置發生變化而產生脈衝訊號, 其中藉由使所述脈衝訊號同步化,所述拍攝部獲得所述拍攝圖像。The straightness measuring apparatus according to claim 8, further comprising an encoder that generates a pulse signal due to a change in the photographing position, wherein the pulse signal is synchronized by the pulse signal The photographing unit obtains the photographed image.
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