TW201730093A - Reactive sealing gas for selective adaptation of the internal cavity pressure - Google Patents

Reactive sealing gas for selective adaptation of the internal cavity pressure Download PDF

Info

Publication number
TW201730093A
TW201730093A TW105140184A TW105140184A TW201730093A TW 201730093 A TW201730093 A TW 201730093A TW 105140184 A TW105140184 A TW 105140184A TW 105140184 A TW105140184 A TW 105140184A TW 201730093 A TW201730093 A TW 201730093A
Authority
TW
Taiwan
Prior art keywords
cavity
gas
pressure
substrate
particle
Prior art date
Application number
TW105140184A
Other languages
Chinese (zh)
Other versions
TWI721058B (en
Inventor
阿奇美 布萊林
法蘭克 萊賢巴哈
猶根 蘭穆斯
尤莉亞 雅木托
Original Assignee
羅伯特博斯奇股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 羅伯特博斯奇股份有限公司 filed Critical 羅伯特博斯奇股份有限公司
Publication of TW201730093A publication Critical patent/TW201730093A/en
Application granted granted Critical
Publication of TWI721058B publication Critical patent/TWI721058B/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/0802Details
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/02Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00119Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261Processes for packaging MEMS devices
    • B81C1/00277Processes for packaging MEMS devices for maintaining a controlled atmosphere inside of the cavity containing the MEMS
    • B81C1/00293Processes for packaging MEMS devices for maintaining a controlled atmosphere inside of the cavity containing the MEMS maintaining a controlled atmosphere with processes not provided for in B81C1/00285
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5783Mountings or housings not specific to any of the devices covered by groups G01C19/5607 - G01C19/5719
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P3/00Measuring linear or angular speed; Measuring differences of linear or angular speeds
    • G01P3/42Devices characterised by the use of electric or magnetic means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00Specific applications of microelectromechanical systems
    • B81B2201/02Sensors
    • B81B2201/0228Inertial sensors
    • B81B2201/0235Accelerometers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00Specific applications of microelectromechanical systems
    • B81B2201/02Sensors
    • B81B2201/0228Inertial sensors
    • B81B2201/0242Gyroscopes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00Basic microelectromechanical structures
    • B81B2203/03Static structures
    • B81B2203/0315Cavities
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/01Packaging MEMS
    • B81C2203/0145Hermetically sealing an opening in the lid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/01Packaging MEMS
    • B81C2203/0172Seals
    • B81C2203/019Seals characterised by the material or arrangement of seals between parts

Abstract

A method for producing a micromechanical component with a substrate and with a cap, which is connected to the substrate and encloses with the substrate a first cavity, is proposed, a first pressure prevailing and a first gas mixture with a first chemical composition being enclosed in the first cavity, wherein in a first method step, an access opening, which connects the first cavity to a surrounding space of the micromechanical component, is formed in the substrate or in the cap, wherein in a second method step, the first pressure and/or the first chemical composition is/are set in the first cavity, wherein in a third method step, the access opening is sealed by introducing energy or heat into an absorbent part of the substrate or of the cap with the aid of a laser, wherein in a fourth method step, a reactive gas for further setting the first pressure and/or the first chemical composition is introduced into the first cavity.

Description

用於選擇性的調適空腔內部壓力的反應性封閉氣體 Reactive closed gas for selective adaptation of the internal pressure of the cavity

關於一種微機械組件以及用於產生該微機械組件的方法。 A micromechanical assembly and method for producing the micromechanical assembly.

本發明係基於根據申請專利範圍第1項之序文的方法,此方法自WO 2015/120939 A1已知。若需要微機械組件之空腔中的特定內部壓力,或若具有特定化學組成之氣體混合物將被圍封於該空腔中,則通常在該微機械組件之加蓋期間或在基板晶圓與蓋晶圓之間的接合操作期間設定該內部壓力或該化學組成。在加蓋期間,例如,將蓋連接至基板,從而蓋與基板一起圍封空腔。藉由在加蓋期間設定存在於周圍空間中之大氣或壓力及/或氣體混合物之化學組成,可因此在空腔中設定特定內部壓力及/或特定化學組成。 The invention is based on the method according to the preamble of claim 1 of the patent application, which is known from WO 2015/120939 A1. If a specific internal pressure in the cavity of the micromechanical component is required, or if a gas mixture having a specific chemical composition is to be enclosed in the cavity, typically during the capping of the micromechanical component or on the substrate wafer The internal pressure or the chemical composition is set during the bonding operation between the cover wafers. During capping, for example, the cover is attached to the substrate such that the cover encloses the cavity with the substrate. By setting the chemical composition of the atmosphere or pressure and/or gas mixture present in the surrounding space during capping, a particular internal pressure and/or specific chemical composition can thus be set in the cavity.

藉由自WO 2015/120939 A1已知之方法,可特定地設定微機械組件之空腔中的內部壓力。藉由此方法,尤其有可能產生具有第一空腔之微機械組件,有可能在第一空腔中設定第一壓力及第一化學組成(其不同於加蓋時之第二壓力及第二化學組成)。 The internal pressure in the cavity of the micromechanical component can be specifically set by the method known from WO 2015/120939 A1. By this method, it is especially possible to produce a micromechanical component having a first cavity, possibly setting a first pressure and a first chemical composition in the first cavity (which is different from the second pressure and the second when capping) chemical components).

在根據WO 2015/120939 A1之用於特定設定微機械組件之空腔中之內部壓力的方法之情況下,在蓋或蓋晶圓或基板或感測器晶圓中產 生至空腔之狹窄接取通道。隨後,藉助於接取通道,藉由所要氣體及所要內部壓力充滿空腔。最後,藉由使用雷射局部加熱接取通道周圍之區,且基板材料局部液化且在其固化時氣密地封閉接取通道。 In the case of a method for specifically setting the internal pressure in a cavity of a micromechanical component according to WO 2015/120939 A1, in a cover or cover wafer or substrate or sensor wafer A narrow access channel to the cavity. Subsequently, the cavity is filled by the desired gas and the desired internal pressure by means of the access channel. Finally, the area around the channel is picked up by local heating using a laser, and the substrate material is partially liquefied and hermetically closed the access channel as it solidifies.

旋轉速率感測器(rate-of-rotation)之品質極其敏感地取決於內腔壓力。另外,在旋轉速率感測器之壽命內,儘可能穩定的品質對於其高偏移效能係必要的,此係由於品質與在校準期間判定校準參數時所採用的值之偏離導致旋轉速率感測器之偏移。為了在旋轉速率感測器之壽命內達成儘可能高且穩定之品質,在旋轉速率感測器之壽命內使旋轉速率感測器空腔之內部壓力穩定或保持恆定因此係重要的。在高品質(亦即,低內腔壓力)之旋轉速率感測器的情況下,通常在HT儲存時段(在相對較高的溫度儲存之時段)之後存在內部壓力之顯著增大,此係(例如)藉由釋氣或至空腔中之氣體擴散來產生。 The quality of the rate-of-rotation is extremely sensitive depending on the lumen pressure. In addition, as far as the life of the rotation rate sensor is concerned, the most stable quality is necessary for its high offset performance, which is due to the deviation of the quality from the value used in determining the calibration parameters during calibration. Offset of the device. In order to achieve the highest possible and stable quality over the life of the rotation rate sensor, it is important to stabilize or maintain the internal pressure of the rotation rate sensor cavity within the life of the rotation rate sensor. In the case of high quality (ie, low lumen pressure) rotation rate sensors, there is typically a significant increase in internal pressure after the HT storage period (the period of storage at relatively high temperatures), For example) generated by outgassing or gas diffusion into the cavity.

用於選擇性地設定微機械組件之空腔中之內部壓力的其他方法自US 8,546,928 B2、US 2015/0158720 A1及US 8,513,747 B1已知。用於判定滲漏速率之方法自US 7,739,900 B2已知。 Other methods for selectively setting the internal pressure in the cavity of the micromechanical component are known from US 8,546,928 B2, US 2015/0158720 A1 and US Pat. No. 8,513,747 B1. A method for determining the rate of leakage is known from US 7,739,900 B2.

本發明之目標為提供一種用於以與先前技術相比簡單且廉價的方式產生與先前技術相比具機械堅固性且具有長使用壽命之微機械組件的方法。本發明之目標亦為提供與先前技術相比緊密、具機械堅固性且具有長使用壽命之微機械組件。根據本發明,此尤其適用於具有(第一)空腔之微機械組件。藉由根據本發明之方法及根據本發明之微機械組件,亦有可能更進一步實現可在第一空腔中設定第一壓力及第一化學組成且可 在第二空腔中設定第二壓力及第二化學組成之微機械組件。此方法意欲(例如)用於產生第一壓力圍封於第一空腔中且第二壓力圍封於第二空腔中(該第一壓力意欲不同於該第二壓力)較為有利之微機械組件。舉例而言,每當欲將用於旋轉速率量測之第一感測器單元與用於加速度量測之第二感測器單元整合於微機械組件中時,情況即為如此。舉例而言,此處第一空腔與第二空腔僅藉由接合網彼此分離。詳言之,本發明之目標為使得微機械組件之壽命內的高品質成為可能。 It is an object of the present invention to provide a method for producing a micromechanical component that is mechanically robust and has a long service life compared to the prior art in a simple and inexpensive manner compared to the prior art. It is also an object of the present invention to provide a micromechanical assembly that is compact, mechanically robust, and has a long service life as compared to the prior art. According to the invention, this applies in particular to micromechanical components having a (first) cavity. By means of the method according to the invention and the micromechanical component according to the invention, it is also possible to further realize that the first pressure and the first chemical composition can be set in the first cavity and A second mechanical component of the second pressure and the second chemical composition is set in the second cavity. The method is intended to, for example, be used to generate a first pressure enclosure in the first cavity and a second pressure enclosing the second cavity (the first pressure is intended to be different from the second pressure). Component. This is the case, for example, whenever a first sensor unit for rotational rate measurement and a second sensor unit for acceleration measurement are to be integrated into the micromechanical assembly. For example, here the first cavity and the second cavity are separated from each other only by the joint mesh. In particular, it is an object of the present invention to enable high quality within the life of a micromechanical component.

該目標藉由在第四方法步驟中提供以下操作來達成:將用於進一步設定第一壓力及/或第一化學組成之反應氣體引入至第一空腔中。 This object is achieved by providing in a fourth method step the introduction of a reaction gas for further setting the first pressure and/or the first chemical composition into the first cavity.

此以簡單且廉價的方式提供用於產生微機械組件之方法,其中尤其在第一空腔為旋轉速率感測器之空腔的情況下,第一空腔中之第一壓力可在壽命內保持實質上恆定或穩定,或其中在第一壓力之臨時設定之後,可進一步減小第一壓力。此係(例如)藉由在壽命內自第一空腔內之材料脫氣或藉由氣體擴散(例如,經由基板或蓋或第一空腔與第二空腔之間的接合框或接合網)進入第一空腔的少量氣體由於反應氣體而反應或與先前或在封閉接取開口之前圍封於空腔中之氣體反應且以此方式能夠保持空腔之總內部壓力實質上恆定或減小而實現。以此方式,可使得(例如)尤其在忽略不同類型之氣體的不同阻尼因子之情況下(例如)旋轉速率感測器之阻尼及因此品質在第一近似值中保持不變成為可能。 This provides a method for producing a micromechanical component in a simple and inexpensive manner, wherein particularly in the case where the first cavity is a cavity of a rotation rate sensor, the first pressure in the first cavity can be within the lifetime The first pressure is further reduced by maintaining substantially constant or stable, or wherein after the temporary setting of the first pressure. This is done, for example, by degassing the material within the first cavity over a lifetime or by gas diffusion (eg, via a substrate or cover or a joint frame or joint mesh between the first cavity and the second cavity) a small amount of gas entering the first cavity reacts due to the reactive gas or reacts with the gas enclosed in the cavity prior to or prior to closing the opening and in this way maintains the total internal pressure of the cavity substantially constant or reduced Small and realized. In this way, it may be possible, for example, to ignore the different damping factors of different types of gases, for example, the damping of the rotation rate sensor and thus the quality remains unchanged in the first approximation.

根據本發明之方法的另一優點為,藉助於反應氣體,有可能抵消在常規接合製程期間或之後在空腔中出現之內部壓力不對應於在接合期間圍封之壓力。 A further advantage of the method according to the invention is that by means of the reaction gas it is possible to counteract that the internal pressure occurring in the cavity during or after the conventional joining process does not correspond to the pressure of the enclosure during the joining.

根據本發明,替代或另外地提供,在第四方法步驟中,將用於進一步設定第一壓力及/或第一化學組成之集氣劑引入至第一空腔中。根據本發明,亦提供反應氣體實質上包含集氣劑之性質。 According to the invention, alternatively or additionally, in a fourth method step, a gas-gathering agent for further setting the first pressure and/or the first chemical composition is introduced into the first cavity. According to the present invention, it is also provided that the reaction gas substantially contains a gas collector.

結合本發明,術語集氣劑應理解為意謂用於儘可能長地維持真空之目的的化學反應性材料。根據本發明,提供材料處於固態聚集態或處於液態聚集態或處於氣態聚集態。舉例而言,氣體分子與集氣劑之表面上的集氣劑材料之原子直接化學鍵結。然而,替代或另外地,亦規定氣體分子藉由吸附而牢固地固持於集氣劑材料上。以此方式,在集氣劑材料之表面中或上「俘獲」氣體分子。結合本發明,活化集氣劑與未活化集氣劑之間應有區別,與未活化集氣劑相比,活化集氣劑具有較高俘獲速率。俘獲速率在此處應理解為意謂(例如)每單位時間(例如,每秒)在集氣劑材料之表面中或上所俘獲的氣體分子之數目。另外,根據本發明,可逆集氣劑與不可逆集氣劑之間應有區別。根據本發明,可逆集氣劑包含至少部分可逆或主要可逆的集氣劑材料,且不可逆集氣劑包含至少部分不可逆或主要不可逆的集氣劑材料。然而,亦根據本發明提供,可逆集氣劑及不可逆集氣劑兩者分別包含至少部分可逆集氣劑材料及至少部分不可逆集氣劑材料。根據本發明,可逆集氣劑材料應理解為意謂在第一時間點或在第一時間段期間在集氣劑材料之表面中或上實質上俘獲或吸收氣體分子,且在第二時間點或在第二時間段期間將經俘獲氣體分子實質上釋放或放出至集氣劑材料之表面之外或自集氣劑材料之表面實質上釋放或放出的集氣劑材料。根據本發明,「實質上俘獲或吸收」應理解為意謂(例如)俘獲速率大於放出速率且吸附速率及吸收速率之第一總和大於解吸附速率。根據本發 明,「實質上釋放或放出」應理解為意謂(例如)俘獲速率小於放出速率且第一總和小於解吸附速率。吸附速率在此處應理解為意謂(例如)每單位時間(例如,每秒)在集氣劑材料之表面上所俘獲的氣體分子之數目。吸收速率在此處應理解為意謂(例如)每單位時間(例如,每秒)在集氣劑材料之表面上或在集氣劑材料之體積中所俘獲的氣體分子之數目。放出速率或解吸附速率在此處應理解為意謂(例如)每單位時間(例如,每秒)釋放或放出至集氣劑材料之表面之外或自集氣劑材料之表面釋放或放出的氣體分子之數目。根據本發明,可逆集氣劑可實質上再生或變換成具有高吸收準備度(readiness)及/或吸附準備度之初始狀態。根據本發明,吸收準備度或吸附準備度應理解為意謂在存在對應氣體分子之情況下提供高吸收速率或吸附速率。 In connection with the present invention, the term air entraining agent is understood to mean a chemically reactive material for the purpose of maintaining a vacuum for as long as possible. According to the present invention, the material is provided in a solid state or in a liquid state or in a gaseous state. For example, the gas molecules are directly chemically bonded to the atoms of the gas collector material on the surface of the gas collector. Alternatively or additionally, however, it is also provided that the gas molecules are firmly held on the gas accumulating material by adsorption. In this way, gas molecules are "captured" in or on the surface of the gas generant material. In conjunction with the present invention, there should be a distinction between the activated gassing agent and the unactivated gassing agent, and the activated gassing agent has a higher rate of capture than the unactivated gassing agent. The rate of capture is understood herein to mean, for example, the number of gas molecules trapped in or on the surface of the gas generant material per unit time (eg, per second). Further, according to the present invention, there should be a difference between the reversible air entraining agent and the irreversible air entraining agent. According to the invention, the reversible air entraining agent comprises at least partially reversible or predominantly reversible gas accumulator material, and the irreversible gas entraining agent comprises at least partially irreversible or predominantly irreversible gas accumulator material. However, it is also provided according to the invention that both the reversible air entraining agent and the irreversible air entraining agent comprise at least partially reversible air entrainer material and at least partially irreversible air entrainer material, respectively. According to the invention, a reversible air entrainer material is understood to mean substantially capturing or absorbing gas molecules in or on the surface of the gas generant material during a first time point or during a first time period, and at a second time point Or a gassing material that substantially releases or discharges trapped gas molecules to or from the surface of the gas accumulator material during the second time period. According to the invention, "substantially trapped or absorbed" is understood to mean, for example, that the rate of capture is greater than the rate of release and that the first sum of the rate of adsorption and the rate of absorption is greater than the rate of desorption. According to this issue It is to be understood that "substantially released or released" is understood to mean, for example, that the rate of capture is less than the rate of release and that the first sum is less than the rate of desorption. The rate of adsorption is understood herein to mean, for example, the number of gas molecules trapped on the surface of the collector material per unit time (eg, per second). The rate of absorption is understood herein to mean, for example, the number of gas molecules trapped on the surface of the collector material or in the volume of the collector material per unit time (eg, per second). The rate of release or desorption is understood herein to mean, for example, release or release to or from the surface of the collector material per unit time (eg, per second). The number of gas molecules. According to the present invention, the reversible air entraining agent can be substantially regenerated or converted into an initial state having high absorption readiness and/or adsorption readiness. According to the invention, absorption readiness or adsorption readiness is understood to mean providing a high absorption rate or adsorption rate in the presence of corresponding gas molecules.

根據本發明,粒子應較佳理解為意謂原子或原子之集合,諸如一分子或數個分子。結合本發明,粒子處於氣態聚集態、液態聚集態或固態聚集態,或為氣相、液相或固相之部分,且包含與圍繞其之空間的至少一個相邊界表面。詳言之,根據本發明,粒子應理解為意謂在微機械組件之規模上為小的本體,亦即,具有至多微機械組件之最大範圍之1/10的範圍之本體。 According to the invention, a particle is preferably understood to mean a collection of atoms or atoms, such as one molecule or several molecules. In connection with the present invention, the particles are in a gaseous, liquid or solid state, or are part of a gas phase, a liquid phase or a solid phase, and comprise at least one phase boundary surface with a space surrounding them. In particular, in accordance with the present invention, a particle is understood to mean a body that is small on the scale of the micromechanical component, that is, a body having a range of up to 1/10 of the maximum range of the micromechanical component.

結合本發明,術語「微機械組件」意欲理解為意謂該術語包含微機械組件及微機電組件兩者。 In connection with the present invention, the term "micromechanical component" is intended to be understood to mean that the term encompasses both micromechanical components and microelectromechanical components.

本發明較佳意欲用於產生具有一個空腔之微機械組件或用於具有一個空腔之微機械組件。然而,本發明(例如)亦意欲用於具有兩個空腔或具有多於兩個空腔(亦即,三個、四個、五個、六個或多於六個 空腔)之微機械組件。 The invention is preferably intended to produce a micromechanical component having a cavity or a micromechanical component having a cavity. However, the invention is, for example, also intended to have two cavities or to have more than two cavities (i.e., three, four, five, six or more than six) Micromechanical component of the cavity).

較佳地,藉由使用雷射將能量或熱引入至基板或蓋之吸收此能量或此熱的一部分而封閉接取開口。較佳地,此處連續地將能量或熱引入至(例如)一起產生於晶圓上之數個微機械組件之基板或蓋的各別吸收性部分中。然而,亦替代性地提供(例如)藉由使用數個雷射束或雷射裝置同時將能量或熱引入至數個微機械組件之基板或蓋的各別吸收性部分中。替代地,亦根據本發明提供,藉助於氧化物再封閉(reseal)製程或氧化物重封閉(resealing)製程封閉接取開口。此處,氧化物再封閉製程或氧化物重封閉製程為(例如)替代的封閉製程或雷射再封閉製程或雷射重封閉製程,且其中空腔之後續開口藉由氧化物罩蓋氣密地封閉,該氧化物罩蓋在低環境壓力下生長。 Preferably, the access opening is closed by the use of a laser to introduce energy or heat into the substrate or cover to absorb this energy or a portion of this heat. Preferably, energy or heat is continuously introduced herein, for example, together in separate absorbent portions of the substrate or cover of the plurality of micromechanical components on the wafer. However, it is also alternatively provided, for example, by using several laser beams or laser devices to simultaneously introduce energy or heat into the respective absorptive portions of the substrate or cover of the plurality of micromechanical components. Alternatively, it is also provided according to the invention to close the access opening by means of an oxide reseal process or an oxide resealing process. Here, the oxide reclosing process or the oxide reclosing process is, for example, an alternative closed process or a laser reclose process or a laser reclose process, and wherein the subsequent openings of the cavity are hermetically sealed by an oxide cap The ground cover is closed and the oxide cover is grown under low ambient pressure.

可自申請專利範圍附屬項及參考圖式之說明得出對本發明之有利改進及發展。 Advantageous improvements and developments of the present invention can be derived from the description of the appended claims and the description of the drawings.

根據一較佳發展,提供蓋與基板圍封第二空腔,第二盛行壓力(pressure prevailing)於第二空腔中,且具有第二化學組成之第二氣體混合物圍封於第二空腔中。 According to a preferred development, the cover and the substrate are provided to enclose the second cavity, the second pre-pressure is in the second cavity, and the second gas mixture having the second chemical composition is enclosed in the second cavity. in.

根據一較佳發展,提供以下情形,在第五方法步驟中,在反應氣體之至少一個第一粒子A與另一氣體之至少一個第二粒子B之間產生至少一個鍵,詳言之,至少一個化學鍵。此有利地使得在封閉接取開口之後已(例如)進入第一空腔之另一氣體的第二粒子B可藉助於反應氣體鍵結成為可能。 According to a preferred development, in the fifth method step, at least one bond is produced between at least one first particle A of the reactive gas and at least one second particle B of the other gas, in particular, at least A chemical bond. This advantageously makes it possible for the second particles B, which have, for example, entered another gas of the first cavity after the opening of the opening, can be bonded by means of reactive gases.

根據一較佳發展,提供以下情形,基於在至少一個第一粒子 A與至少一個第二粒子B之電子之間的相互作用,詳言之,靜電相互作用而產生至少一個鍵。以此方式,有利地使得至少一個第一粒子A與至少一個第二粒子B之間的化學鍵成為可能。 According to a preferred development, the following situation is provided based on at least one first particle The interaction between A and the electrons of at least one second particle B, in particular, electrostatic interaction produces at least one bond. In this way, a chemical bond between the at least one first particle A and the at least one second particle B is advantageously made possible.

根據一較佳發展,提供以下情形,藉助於鍵,以使得新的粒子C之化學組成為以下各者的方式產生新的粒子C:ABX或AB或AXB,其中x>1。以此方式,有利地使得在微機械組件之壽命內使內部壓力或第一壓力穩定及/或在接合製程期間選擇性地設定內部壓力或旋轉速率感測器之品質在低壓力下及/或藉由使用標準接合製程產生高品質系統及/或高度敏感且選擇性的氣體感測器成為可能。 According to a preferred development, it is provided that a new particle C is produced by means of a bond such that the chemical composition of the new particle C is in the following manner: AB X or AB or A X B, where x > 1. In this manner, it is advantageous to stabilize the internal pressure or the first pressure during the life of the micromechanical component and/or to selectively set the quality of the internal pressure or rotation rate sensor during the bonding process at a low pressure and/or It is possible to produce high quality systems and/or highly sensitive and selective gas sensors by using standard bonding processes.

根據一較佳發展,提供以使得新的粒子C處於固態聚集態或處於液態聚集態或處於氣態聚集態之方式產生新的粒子C。在新的粒子C處於固態聚集態或處於液態聚集態之情況下,(例如)有利地可能的是,微機械組件可用作極其敏感的氣體感測器,其中反應氣體與另一氣體反應以形成固體,且以此方式,不再促成空腔之內部氣體壓力。 According to a preferred development, new particles C are provided in such a way that the new particles C are in a solid state or in a liquid state or in a gaseous state. In the case where the new particles C are in a solid state or in a liquid state, it is advantageously possible, for example, that the micromechanical component can be used as an extremely sensitive gas sensor in which the reactant gas reacts with another gas. A solid is formed and in this way no longer contributes to the internal gas pressure of the cavity.

可基於微機械組件之品質的改變而極精確地建立壓力之此改變。取決於封閉氣體或反應氣體之反應機率,因此產生之氣體感測器對於特定氣體物質係選擇性的。並且,在新的粒子C處於固態聚集態或處於液態聚集態之情況下,(例如)有利地可能藉助於標準接合製程產生高品質系統,此係由於處於固態聚集態或處於液態聚集態之新的粒子C不實質上 促成第一壓力。在新的粒子C處於氣態聚集態之情況下,(例如)有利地可能在微機械組件之壽命內使第一壓力穩定及/或在接合製程期間選擇性地設定第一壓力或旋轉速率感測器之品質在低壓力下。 This change in pressure can be established very accurately based on changes in the quality of the micromechanical components. Depending on the probability of reaction of the enclosed gas or reactive gas, the resulting gas sensor is selective for a particular gaseous species. Moreover, in the case where the new particles C are in a solid state or in a liquid state, it is advantageous, for example, to produce a high quality system by means of a standard bonding process, which is new in the solid state or in a liquid state. Particle C is not substantially Promote the first pressure. Where the new particle C is in a gaseous state of aggregation, for example, it may be advantageous to stabilize the first pressure within the lifetime of the micromechanical component and/or selectively set the first pressure or rate of rotation sensing during the bonding process The quality of the device is under low pressure.

根據一較佳發展,提供以下情形,另一氣體包含氫氣。以此方式,有利地使得以下情形成為可能:尤其在於殘餘氣體分析中在空腔或第一空腔中發現氫氣之情況下,若反應性封閉氣體或與氫氣反應之反應氣體用於設定此壓力,則可在接合期間藉助於壓力特定地設定品質。以此方式,在接合期間或稍後釋放之氫氣由空腔或第一空腔中之反應性封閉氣體或反應氣體鍵結,且內部壓力保持(例如)穩定於接合期間設定之值。藉助於此方法,若反應氣體與所釋放氫氣反應以形成非氣態終產物,則系統之品質亦可升高至高水準。 According to a preferred development, the following situation is provided, the other gas comprising hydrogen. In this way, it is advantageously possible to make it possible, in particular in the case of residual gas analysis, in the case of hydrogen found in the cavity or in the first cavity, if a reactive blocking gas or a reaction gas which reacts with hydrogen is used to set this pressure Then, the quality can be specifically set by pressure during the joining. In this manner, hydrogen released during or after the engagement is bonded by the cavity or reactive gas or reactive gas in the first cavity, and the internal pressure is maintained, for example, at a value set during the bonding. By means of this method, if the reaction gas reacts with the released hydrogen to form a non-gaseous end product, the quality of the system can also be raised to a high level.

根據一較佳發展,提供以下情形,在第三方法步驟之前進行第四方法步驟。以此方式,有利地使得在封閉接取開口之前將反應氣體引入至第一空腔中成為可能。 According to a preferred development, the following situation is provided, the fourth method step being carried out before the third method step. In this way, it is advantageously made possible to introduce a reaction gas into the first cavity before closing the access opening.

根據一較佳發展,提供以下情形,在第四方法步驟之後進行第五方法步驟。以此方式,有利地使得在第一空腔內產生鍵成為可能。 According to a preferred development, the following situation is provided, after which the fifth method step is carried out. In this way, it is advantageously possible to create a bond in the first cavity.

根據進一步發展,提供以下情形,在第三方法步驟之後進行第五方法步驟。以此方式,有利地使得在接取開口封閉之情況下在微機械組件之壽命內可使第一壓力保持實質上穩定或可減小成為可能。 According to a further development, the following situation is provided, after which the fifth method step is carried out. In this way, it is advantageously possible to make the first pressure substantially stable or reduceable over the life of the micromechanical component with the access opening closed.

本發明之另一標的物為具有基板且具有蓋之微機械組件,蓋連接至基板且與基板圍封第一空腔,第一壓力盛行於第一空腔中,且具有化學組成之第一氣體混合物圍封於第一空腔中,基板或蓋包含封閉的接取 開口,用於進一步設定第一壓力及/或第一化學組成之反應氣體圍封於第一空腔中。以此方式,有利地提供具有經設定第一壓力之緊密、具機械堅固性且低成本的微機械組件。根據本發明之方法的所陳述優點亦對應地適用於根據本發明之微機械組件。 Another subject of the present invention is a micromechanical assembly having a substrate and having a cover attached to the substrate and enclosing the first cavity with the substrate, the first pressure prevailing in the first cavity and having a first chemical composition The gas mixture is enclosed in the first cavity, and the substrate or cover comprises a closed access And an opening for enclosing the first pressure and/or the first chemical composition of the reaction gas in the first cavity. In this way, it is advantageous to provide a compact, mechanically robust and low cost micromechanical assembly with a set first pressure. The stated advantages of the method according to the invention also apply correspondingly to the micromechanical component according to the invention.

根據一較佳發展,提供以下情形,由反應氣體之至少一個第一粒子A與另一氣體之至少一個第二粒子B之間的至少一個鍵(詳言之,由至少一個化學鍵)產生之新的粒子圍封於第一空腔中。 According to a preferred development, a new situation is provided for at least one bond (in particular, by at least one chemical bond) between at least one first particle A of the reactive gas and at least one second particle B of the other gas The particles are enclosed in the first cavity.

根據一較佳發展,提供新的粒子之化學組成為以下各者:ABX或AB或AXB,其中x>1。 According to a preferred development, the chemical composition of the new particles is provided as follows: AB X or AB or A X B, where x > 1.

根據一較佳發展,提供以下情形,蓋與基板圍封第二空腔,第二壓力盛行於第二空腔中,且具有第二化學組成之第二氣體混合物圍封於第二空腔中。以此方式,有利地提供具有經設定第一壓力及第二壓力之緊密、具機械堅固性且低成本的微機械組件。 According to a preferred development, the cover and the substrate enclose a second cavity, the second pressure prevails in the second cavity, and the second gas mixture having the second chemical composition is enclosed in the second cavity . In this way, it is advantageous to provide a compact, mechanically robust and low cost micromechanical assembly having a set first pressure and a second pressure.

根據一較佳發展,提供以下情形,第一壓力低於第二壓力,用於旋轉速率量測之第一感測器單元配置於第一空腔中且用於加速度量測之第二感測器單元配置於第二空腔中。以此方式,有利地提供具有用於第一感測器單元及用於第二感測器單元兩者之最佳操作條件之用於旋轉速率量測及加速度量測的具機械堅固性之微機械組件。 According to a preferred development, the first situation is provided, the first pressure being lower than the second pressure, the first sensor unit for the rotation rate measurement being disposed in the first cavity and the second sensing for the acceleration measurement The unit is disposed in the second cavity. In this way, it is advantageous to provide a mechanically robust micro-rotation rate measurement and acceleration measurement with optimal operating conditions for both the first sensor unit and the second sensor unit. Mechanical components.

本發明之另一標的物為微機械組件作為氣體感測器之用 途,該微機械組件包含薄膜。 Another subject of the invention is a micromechanical component for use as a gas sensor The micromechanical component comprises a film.

根據一較佳發展,提供以下情形,薄膜配置於第一空腔與微機械組件之周圍空間之間。根據一較佳發展,提供使薄膜形成為半滲透的。根據較佳發展,提供使薄膜形成為對第一粒子不可透且對第二粒子可透的。 According to a preferred development, the film is disposed between the first cavity and the surrounding space of the micromechanical component. According to a preferred development, it is provided that the film is formed to be semi-permeable. According to a preferred development, it is provided that the film is formed to be impermeable to the first particle and permeable to the second particle.

圖1在示意性表示中展示根據本發明之以實例形式給出的一實施方式之具有敞開的接取開口之微機械組件。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 shows, in a schematic representation, a micromechanical assembly having an open access opening in accordance with an embodiment of the present invention.

圖2在示意性表示中展示根據圖1之具有封閉的接取開口之微機械組件。 Figure 2 shows in a schematic representation a micromechanical assembly according to Figure 1 with a closed access opening.

圖3在示意性表示中展示根據本發明之以實例形式給出的一實施方式之用於產生微機械組件的方法。 Figure 3 shows a schematic representation generated micromechanical component according to an embodiment of a method of embodiment given by way of example of the present invention.

圖4在示意性表示中展示根據本發明之以實例形式給出的另一實施方式之微機械組件。 Figure 4 shows, in a schematic representation, a micromechanical assembly of another embodiment, given by way of example, in accordance with the present invention.

在各種圖式中,相同部分始終具備相同標示,且因此通常在每一情況下亦僅參考或提及一次。 In the various figures, the same parts are always provided with the same reference, and therefore are generally referred to or referred to only once in each case.

圖1圖2中,展示根據本發明之以實例形式給出的一實施方式之微機械組件1之示意性表示,微機械組件1在圖1中具有敞開的接取開口11且在圖2中具有封閉的接取開口11。此處,微機械組件1包含基板3及蓋7。基板3與蓋7較佳氣密地彼此連接,且一起圍封第一空腔5。舉例而言,微機械組件1以使得基板3與蓋7另外一起圍封第二空腔之方 式形成。然而,第二空腔並未表示於圖1圖2中。 In FIG 1 and FIG 2, shows a schematic of one embodiment of a micro embodiment given by way of example of the present invention is a mechanical assembly of said micromechanical component 1 has an open access opening 11 and is taken in FIG. 1 in FIG. 2 has a closed access opening 11. Here, the micromechanical component 1 includes a substrate 3 and a cover 7. The substrate 3 and the cover 7 are preferably airtightly connected to each other and enclose the first cavity 5 together. For example, the micromechanical assembly 1 is formed in such a manner that the substrate 3 and the cover 7 additionally enclose the second cavity. However, the second cavity is not shown in Figure 1 or Figure 2 .

舉例而言,第一壓力盛行於第一空腔5中(詳言之,在接取開口11封閉之情況下),如圖2中所表示。另外,具有第一化學組成之第一氣體混合物圍封於第一空腔5中。並且,舉例而言,第二壓力盛行於第二空腔中,且具有第二化學組成之第二氣體混合物圍封於第二空腔中。較佳地,接取開口11配置於基板3中或蓋7中。在此處涉及之例示性實施方式的情況下,接取開口11藉助於實例配置於蓋7中。然而,作為對此之替代方案,亦可根據本發明提供接取開口11配置於基板3中。 For example, a first pressure prevailing in the first cavity 5 (detail, in the acess opening of the case 11 is closed), as represented in FIG. Additionally, a first gas mixture having a first chemical composition is enclosed in the first cavity 5. Also, for example, a second pressure prevails in the second cavity, and a second gas mixture having a second chemical composition is enclosed in the second cavity. Preferably, the access opening 11 is disposed in the substrate 3 or in the cover 7. In the case of the exemplary embodiment referred to herein, the access opening 11 is configured in the cover 7 by way of example. However, as an alternative to this, it is also possible to provide the access opening 11 in the substrate 3 according to the invention.

舉例而言,提供以下情形,第一空腔5中之第一壓力低於第二空腔中之第二壓力。舉例而言,亦提供以下情形,圖1圖2中並未表示之用於旋轉速率量測的第一微機械感測器單元配置於第一空腔5中,且圖1圖2中並未表示之用於加速度量測的第二微機械感測器單元配置於第二空腔中。 For example, a situation is provided in which the first pressure in the first cavity 5 is lower than the second pressure in the second cavity. For example, the following case also, FIG. 1 or FIG. 2 are not represented in the measured rotation rate for a first micro-mechanical sensor unit disposed in the first cavity 5, and 2 in FIG. 1 or FIG. A second micromechanical sensor unit for acceleration measurement, not shown, is disposed in the second cavity.

圖3中,在示意性表示中展示根據本發明之以實例形式給出的一實施方式之用於產生微機械組件1的方法。此處,在第一方法步驟101中,將第一空腔5連接至微機械組件1之周圍空間9且特定言之狹窄的接取開口11形成於基板3中或蓋7中。圖1藉助於實例展示在第一方法步驟101之後的微機械組件1。另外,在第二方法步驟102中,在第一空腔5中設定第一壓力及/或第一化學組成,且藉助於接取通道藉由所要氣體及所要內部壓力充滿第一空腔5。另外,舉例而言,在第三方法步驟103中,藉由藉助於雷射將能量或熱引入至基板3或蓋 7之吸收性部分中而封閉接取開口11。舉例而言,亦替代性地提供以下情形,在第三方法步驟103中,僅較佳藉由雷射局部加熱接取通道周圍之區,且氣密地封閉接取通道。以此方式,有利地亦有可能藉由除雷射之外的用於封閉接取開口11之能源來提供根據本發明之方法。圖2藉助於實例展示在第三方法步驟103之後的微機械組件1。 In Fig. 3 , a method for producing a micromechanical component 1 according to an embodiment of the present invention, which is given by way of example, is shown in a schematic representation. Here, in a first method step 101, the first cavity 5 is connected to the surrounding space 9 of the micromechanical component 1 and in particular a narrow access opening 11 is formed in the substrate 3 or in the cover 7. Figure 1 shows by way of example, after the first method step 101 a micro-mechanical components. In addition, in a second method step 102, a first pressure and/or a first chemical composition is set in the first cavity 5, and the first cavity 5 is filled by the desired gas and the desired internal pressure by means of the access channel. In addition, for example, in a third method step 103, the access opening 11 is closed by introducing energy or heat into the absorptive portion of the substrate 3 or cover 7 by means of a laser. For example, it is alternatively provided that in the third method step 103, only the area around the channel is preferably taken up by laser local heating and the access channel is hermetically sealed. In this way, it is advantageously also possible to provide the method according to the invention by means of an energy source for closing the access opening 11 in addition to the laser. Figure 2 shows, by way of example, a micromechanical component 1 after a third method step 103.

在第三方法步驟103之後的時間,機械應力可發生於蓋7之背對空腔5的表面上之圖2中藉助於實例表示之橫向區15中,且發生於垂直於橫向區15至微機械組件1之表面上之投影的深度中,亦即沿接取開口11且在第一空腔5之方向上。此等機械應力(詳言之,局域機械應力)尤其盛行於蓋7的材料區13(其在第三方法步驟103中轉變成液態聚集態且在第三方法步驟103之後轉變成固態聚集態,且封閉接取開口11)與蓋7的殘餘區(其在第三方法步驟103期間仍處於固態聚集態)之間的邊界表面之處及附近。在圖2中蓋7之封閉接取開口11的材料區13應被視為僅具示意性或經示意性地表示,尤其關於其橫向範圍或塑形(詳言之,平行於表面延伸),且尤其關於其垂直於該橫向範圍延伸之範圍或組態(詳言之,垂直於表面)。 At a time after the third method step 103, mechanical stress can occur in the lateral region 15 of the cover 7 facing away from the surface of the cavity 5 by means of an example in FIG. 2 and occurring perpendicular to the transverse region 15 to micro The depth of projection on the surface of the mechanical component 1, that is, along the access opening 11 and in the direction of the first cavity 5. These mechanical stresses (in particular, local mechanical stresses) are particularly prevalent in the material zone 13 of the cover 7 (which is converted into a liquid state of aggregation in a third method step 103 and into a solid state of aggregation after a third method step 103). And closing and at the vicinity of the boundary surface between the access opening 11) and the residual region of the cover 7, which is still in a solid state of aggregation during the third method step 103. The material region 13 of the closure opening 11 of the cover 7 in FIG. 2 should be considered to be only schematically or schematically represented, in particular with regard to its lateral extent or shaping (in detail, parallel to the surface extension), And especially with respect to its extent or configuration extending perpendicular to the lateral extent (in detail, perpendicular to the surface).

圖4中,在示意性表示中展示根據本發明之以實例形式給出的另一實施方式之微機械組件。 In Fig. 4 , a micromechanical assembly according to another embodiment of the invention, given by way of example, is shown in a schematic representation.

舉例而言,在第四方法步驟中,將用於進一步設定第一壓力及/或第一化學組成之反應氣體801(示意性地表示於圖4中)引入至第一空腔5中。亦(例如)提供在第五方法步驟中,在反應氣體801之至少一個第 一粒子A與另一氣體803之至少一個第二粒子B之間產生至少一個鍵,詳言之,至少一個化學鍵。(例如)此處提供至少一個鍵係基於在至少一個第一粒子A與至少一個第二粒子B之電子之間的相互作用,詳言之,靜電相互作用而產生。另外,亦例如提供藉助於鍵,以使得新的粒子C之化學組成為以下各者的方式產生新的粒子C:ABX或AB或AXB,其中x>1。最終,(例如)提供以下情形,以使得新的粒子C處於固態聚集態或處於液態聚集態或處於氣態聚集態之方式產生新的粒子C。 For example, in a fourth method step, a reaction gas 801 (shown schematically in FIG. 4 ) for further setting the first pressure and/or the first chemical composition is introduced into the first cavity 5. Also provided, for example, in the fifth method step, at least one bond, in particular at least one chemical bond, is produced between at least one first particle A of the reactive gas 801 and at least one second particle B of the other gas 803. For example, it is provided herein that at least one bond is generated based on an interaction between at least one electron of at least one first particle A and at least one second particle B, in particular, electrostatic interaction. In addition, it is also possible, for example, to provide new particles C by means of a bond such that the chemical composition of the new particles C is in the following way: AB X or AB or A X B, where x > 1. Finally, for example, the following is provided to create new particles C in such a way that the new particles C are in a solid state of aggregation or in a liquid state of aggregation or in a gaseous state of aggregation.

圖4中藉助於實例所表示,用於進一步設定第一壓力及/或第一化學組成之反應氣體801圍封於第一空腔5中。(例如)此處提供由反應氣體801之至少一個第一粒子A與另一氣體803之至少一個第二粒子B之間的至少一個鍵(詳言之,由至少一個化學鍵)產生之新的粒子C圍封於第一空腔5中。 By way of example in FIG. 4 as indicated, for further setting a first pressure and / or the chemical composition of the first reaction gas 801 to the first enclosed cavity 5. For example, a new particle produced by at least one bond between at least one first particle A of the reactive gas 801 and at least one second particle B of another gas 803 (in detail, by at least one chemical bond) is provided herein. C is enclosed in the first cavity 5.

舉例而言,根據本發明設想藉助於封閉氣體或反應氣體801與另一組分(諸如,另一氣體803)之化學反應來控制第一空腔5中之內腔壓力或第一壓力。根據本發明,此尤其預期用於各種目標;取決於目標,不同要求皆適用於反應物或反應氣體801及另一氣體803及反應產物或包含新的粒子C之新的相。 By way of example, it is contemplated in accordance with the present invention to control the internal cavity pressure or first pressure in the first cavity 5 by means of a chemical reaction of a blocking gas or reactive gas 801 with another component, such as another gas 803. This is especially contemplated for various purposes in accordance with the present invention; depending on the target, different requirements apply to the reactant or reaction gas 801 and another gas 803 and the reaction product or a new phase comprising the new particle C.

舉例而言,設想以下目標: For example, imagine the following goals:

目標1:在壽命內使內部壓力穩定 Goal 1: Stabilize internal pressure over the life

目標2:在接合製程期間特定設定內部壓力/旋轉速率感測器之品質在低壓力下 Goal 2: Specific setting of the internal pressure/rotation rate sensor quality during the bonding process at low pressure

目標3:藉由使用標準接合製程產生高品質系統 Goal 3: Produce a high quality system by using a standard bonding process

目標4:高度敏感且選擇性的氣體感測器 Goal 4: Highly sensitive and selective gas sensor

關於目標1: About goal 1:

圖4中,藉助於實例表示氣體或其他氣體803之各種來源,其他氣體803能夠(例如)在微機械組件1之壽命內改變空腔之內部壓力或第一空腔5之第一壓力。此等其他氣體803可(例如)來自空腔內,諸如釋氣,或(例如)外部滲透至空腔或第一空腔5中,諸如氣體擴散或小滲漏路徑。此處,另一氣體803包含(例如)釋氣或至第一空腔5中之氣體擴散。(例如)此處提供以下情形,選擇反應氣體801,使得反應氣體801在壽命內以使得在反應之後的氣體粒子之總數目等於在反應之前的反應氣體801或第一粒子之粒子數目的方式與氣體或與另外出現在空腔或第一空腔5中之其他氣體803反應。此為尤其可能的,此係因為,在理想氣體之情況下,粒子之總數目起界定壓力之作用,該壓力意欲在壽命內保持恆定。舉例而言,提供以下情形,反應或反應方程式為A+B->AB或A+x×B->ABX,其中AB及ABX為氣態或處於氣態聚集態。舉例而言,亦提供以下情形,在反應之後圍封於第一空腔5中的氣體粒子數目實質上對應於初始數目或在反應之前反應氣體801在第一空腔5中之氣體粒子的數目。 In FIG. 4 , various sources of gas or other gas 803 are shown by way of example, and other gases 803 can change the internal pressure of the cavity or the first pressure of the first cavity 5, for example, over the life of the micromechanical component 1. These other gases 803 may, for example, come from within the cavity, such as outgassing, or, for example, externally penetrate into the cavity or first cavity 5, such as a gas diffusion or small leak path. Here, another gas 803 includes, for example, outgassing or gas diffusion into the first cavity 5. For example, the following case is provided in which the reaction gas 801 is selected such that the reaction gas 801 is in the lifetime such that the total number of gas particles after the reaction is equal to the number of particles of the reaction gas 801 or the first particles before the reaction The gas either reacts with other gases 803 that otherwise appear in the cavity or first cavity 5. This is especially possible because, in the case of an ideal gas, the total number of particles acts to define the pressure which is intended to remain constant over the lifetime. For example, the following situation is provided, the reaction or reaction equation is A+B->AB or A+x×B->AB X , where AB and AB X are in a gaseous state or in a gaseous state of aggregation. For example, a case is also provided in which the number of gas particles enclosed in the first cavity 5 after the reaction substantially corresponds to the initial number or the number of gas particles of the reaction gas 801 in the first cavity 5 before the reaction. .

關於目標2: About goal 2:

在接合期間及/或之後,(例如)存在釋氣,其在空腔或第一空腔5中留下不同壓力或第一壓力,該壓力不同於在接合製程期間設定或 在接合製程期間存在於周圍空間9中之壓力。此處,另一氣體803包含(例如)在接合製程期間之釋氣。舉例而言,釋氣量在製程或接合製程內相對劇烈地波動,此可具有微機械組件1之品質在極大值範圍內變化的影響。在反應氣體801之選擇性圍封的情況下,界定或設定對於高品質較佳之低分壓(例如,目標品質)。在接合製程期間或之後的釋氣(例如)完全由反應氣體801鍵結。為了能夠達成最高可能品質,(例如)提供以下情形,反應氣體之分壓儘可能低,但反應氣體亦具有足夠的對於釋氣的吸收容量。為了能夠滿足兩個要求,(例如)提供以下情形,反應氣體粒子或第一粒子A以使得反應氣體粒子或第一粒子A吸收數個釋氣物質粒子或數個第二粒子B之方式與釋氣氣體粒子或與第二粒子B反應。舉例而言,提供反應或反應方程式為A+x×B->ABX,其中AB及ABX為氣態或處於氣態聚集態。舉例而言,此處提供x>=1。舉例而言,亦提供在反應之後圍封於第一空腔5中的氣體粒子數目實質上對應於初始數目或在反應之前反應氣體801在第一空腔5中之氣體粒子的數目。 During and/or after engagement, for example, there is outgassing which leaves a different pressure or first pressure in the cavity or first cavity 5 that is different from that set during the bonding process or during the bonding process The pressure in the surrounding space 9. Here, another gas 803 includes, for example, outgas during the bonding process. For example, the outgassing amount fluctuates relatively sharply during the process or bonding process, which may have the effect that the quality of the micromechanical component 1 varies over a wide range of values. In the case of selective encapsulation of the reactive gas 801, a low partial pressure (e.g., target quality) that is preferred for high quality is defined or set. The outgas during or after the joining process is, for example, completely bonded by the reaction gas 801. In order to be able to achieve the highest possible quality, for example, the following conditions are provided, the partial pressure of the reaction gas is as low as possible, but the reaction gas also has sufficient absorption capacity for outgassing. In order to be able to satisfy two requirements, for example, the reaction gas particles or the first particles A are caused to cause the reaction gas particles or the first particles A to absorb a plurality of gassing material particles or a plurality of second particles B. The gas particles or react with the second particles B. For example, the reaction or reaction equation is provided as A+x×B->AB X , where AB and AB X are in a gaseous state or in a gaseous state of aggregation. For example, x>=1 is provided here. For example, it is also provided that the number of gas particles enclosed in the first cavity 5 after the reaction substantially corresponds to the initial number or the number of gas particles of the reaction gas 801 in the first cavity 5 before the reaction.

關於目標3: About goal 3:

在接合期間及/或之後,(例如)存在釋氣,其在空腔或第一空腔5中留下不同壓力或第一壓力,該壓力不同於在接合製程期間設定或在接合製程期間盛行於周圍空間9中之壓力。此處,另一氣體803包含(例如)在接合製程期間之釋氣。此(例如)導致品質顯著低於在接合期間將實際上產生之製程壓力。在反應氣體801之選擇性圍封的情況下,分壓(例如)經最佳化至由反應儘可能完全地消耗釋氣粒子量或第二粒子量的程度。換言之,(例如)提供在反應期間,儘可能多的第二粒子與第一粒子反 應。舉例而言,尤其為了使留下的反應氣體之量或第一粒子之數目產生儘可能低的壓力或儘可能高的品質,使用能夠鍵結釋氣氣體之數個氣體粒子或數個第二粒子的反應氣體801。因此,舉例而言,來自釋氣之氣體粒子或第二粒子儘可能完全地鍵結且例如以固體物質形式沈澱。換言之,新的粒子C處於固態聚集態。此有利地達成第一粒子及第二粒子不再促成氣體壓力或第一壓力之影響。為了能夠達成最高可能品質,(例如)提供以下情況,在反應之後的反應氣體801之分壓儘可能低於在反應之前在第一空腔5中之反應氣體801的分壓,或低於第一空腔5中之其他氣體803(在反應之前及/或之後)的分壓,或低於第二空腔及/或周圍空間9中之反應氣體801的分壓,或低於第二空腔及/或周圍空間9中之其他氣體803的分壓。舉例而言,然而,亦提供在接合期間所圍封之反應氣體801具有對於釋氣或其他氣體803的足夠的吸收容量。為了能夠滿足兩個要求,(例如)提供以下情況,反應氣體粒子或第一粒子A以使得反應氣體粒子或第一粒子吸收數個釋氣物質粒子或數個第二粒子B之方式與釋氣氣體粒子或與第二粒子反應。舉例而言,提供以下情況,反應或反應方程式為A+x×B->ABX,其中AB及ABX為固態或處於固態聚集態。舉例而言,此處提供x>=1。舉例而言,亦提供以下情況,以使得在反應之後在第一空腔5中剩餘之氣體粒子之數目最小的方式使得反應氣體801之氣體量匹配在接合期間釋氣之另一氣體803之量。舉例而言,此處提供反應氣體801及/或另一氣體處於實質上完全轉換成固體物質之狀態。 During and/or after engagement, for example, there is outgassing which leaves a different pressure or first pressure in the cavity or first cavity 5 that is different from being set during the bonding process or prevailing during the bonding process The pressure in the surrounding space 9. Here, another gas 803 includes, for example, outgas during the bonding process. This, for example, results in a quality that is significantly lower than the process pressure that would actually be produced during the bonding. In the case of selective encapsulation of the reactive gas 801, the partial pressure, for example, is optimized to the extent that the amount of outgassing particles or the amount of second particles is consumed as completely as possible by the reaction. In other words, for example, as much as possible of the second particles are reacted with the first particles during the reaction. For example, in particular, in order to produce as low a pressure as possible or as high a quality as possible of the amount of reaction gas remaining or the number of first particles, a plurality of gas particles or a plurality of seconds capable of bonding the outgassing gas are used. The reaction gas 801 of the particles. Thus, for example, the gas particles or the second particles from the outgassing are bonded as completely as possible and precipitate, for example in the form of solid substances. In other words, the new particle C is in a solid state. This advantageously achieves that the first particles and the second particles no longer contribute to the gas pressure or the first pressure. In order to be able to achieve the highest possible quality, for example, the partial pressure of the reaction gas 801 after the reaction is as low as possible, or lower than the partial pressure of the reaction gas 801 in the first cavity 5 before the reaction. The partial pressure of the other gas 803 in a cavity 5 (before and/or after the reaction) is lower than the partial pressure of the reaction gas 801 in the second cavity and/or the surrounding space 9, or lower than the second air. The partial pressure of the gas and other gas 803 in the surrounding space 9. For example, however, it is also provided that the reactive gas 801 enclosed during the bonding has sufficient absorption capacity for outgassing or other gases 803. In order to be able to satisfy two requirements, for example, the reaction gas particles or the first particles A are provided in such a manner that the reaction gas particles or the first particles absorb a plurality of gas releasing substance particles or a plurality of second particles B and outgassing. The gas particles react with or with the second particles. For example, the following is provided, the reaction or reaction equation is A+x×B->AB X , where AB and AB X are solid or in a solid state. For example, x>=1 is provided here. For example, the following is also provided such that the amount of gas particles remaining in the first cavity 5 after the reaction is minimized such that the amount of gas of the reactive gas 801 matches the amount of another gas 803 that is released during the joining. . For example, a state in which the reaction gas 801 and/or another gas is substantially completely converted into a solid matter is provided herein.

關於目標4: About goal 4:

舉例而言,旋轉速率感測器使用品質量測來使得對感測器空 腔之內部壓力或第一空腔5之第一壓力的高度敏感量測成為可能。此處,另一氣體803包含例如待偵測之氣體。若(例如)進入空腔或第一空腔5之氣體或另一氣體803導致總內部壓力或第一壓力改變,則此或壓力之改變可以極高精確度被量測到。若(例如)感測器具備僅對待偵測之氣體或另一氣體803可透的薄膜,則進入氣體或另一氣體803可藉助於上升的壓力或藉助於降低的品質而直接地被量測到。(例如)此處提供以下情況,進入氣體或另一氣體803以使得終產物或包含至少一個新的粒子C之產物以固體物質形式沈澱的方式與圍封於空腔或第一空腔5中之反應氣體801反應。此有利地使得壓力或第一壓力下降且品質提高成為可能。與較高壓力相比,較低壓力為有利的,此尤其係因為壓力量測在較低壓力下可能更精確。換言之,與上升壓力相比,優點在於品質愈高,壓力量測愈敏感。另外,(例如)提供以下情況,反應氣體801僅與另一氣體803反應,或可僅在至少一個第一粒子與至少一個第二粒子之間產生鍵。換言之,(例如)提供以下情況,由反應氣體801之選擇確保反應氣體801僅與特定氣體物質或與另一氣體803反應。此意謂(例如)即使其他氣體物質或第三氣體不合需要地進入空腔或第一空腔5,僅該等氣體物質或待偵測之另一氣體導致第一空腔5中之內部壓力或第一壓力降低或品質提高。以此方式有利地可能的是,感測器相對於待偵測之氣體物質或相對於另一氣體803為選擇性的。詳言之,以此方式確保感測器由薄膜及反應氣體雙重地防護。 For example, the rotation rate sensor uses a quality measurement to make the sensor empty. A highly sensitive measurement of the internal pressure of the chamber or the first pressure of the first cavity 5 is made possible. Here, another gas 803 contains, for example, a gas to be detected. If, for example, gas or another gas 803 entering the cavity or first cavity 5 causes the total internal pressure or first pressure to change, this or pressure change can be measured with very high precision. If, for example, the sensor is provided with a film that is only permeable to the gas to be detected or another gas 803, the incoming gas or another gas 803 can be directly measured by means of rising pressure or by means of reduced quality. To. The following is provided, for example, in the case of entering a gas or another gas 803 such that the final product or the product comprising at least one new particle C precipitates in the form of a solid material and encloses in the cavity or first cavity 5 The reaction gas 801 is reacted. This advantageously makes it possible to reduce the pressure or the first pressure and improve the quality. Lower pressures are advantageous compared to higher pressures, especially since pressure measurements may be more accurate at lower pressures. In other words, compared with the rising pressure, the advantage is that the higher the quality, the more sensitive the pressure measurement is. In addition, for example, the reaction gas 801 is only reacted with another gas 803, or a bond may be generated only between at least one first particle and at least one second particle. In other words, for example, it is provided that the selection of the reaction gas 801 ensures that the reaction gas 801 reacts only with a specific gas species or with another gas 803. This means, for example, that even if other gaseous substances or third gases enter the cavity or the first cavity 5 undesirably, only the gaseous substances or another gas to be detected causes internal pressure in the first cavity 5. Or the first pressure is reduced or the quality is improved. In this way, it is advantageously possible for the sensor to be selective with respect to the gaseous substance to be detected or with respect to the other gas 803. In particular, in this way it is ensured that the sensor is protected by both the film and the reactive gas.

舉例而言,可能藉由選擇性地定時兩個抵消效應以同時出現(具體言之,壓力由於另一氣體803進入第一空腔5而增加及壓力由於新的粒子C之形成而減小)來偵測另一氣體803。此為有利地可能的,即使在第 三氣體進入至空腔5中時及/或在第三氣體之第三粒子與反應氣體801之第一粒子的反應具有該反應所涉及之第三粒子不再促成第一壓力或第三氣體之分壓的影響時亦然。 For example, it is possible to simultaneously occur by selectively timing two cancellation effects (specifically, the pressure increases due to the entry of another gas 803 into the first cavity 5 and the pressure is reduced due to the formation of new particles C) To detect another gas 803. This is advantageously possible, even in the first When the three gases enter the cavity 5 and/or the third particles of the third gas react with the first particles of the reactive gas 801, the third particles involved in the reaction no longer contribute to the first pressure or the third gas The same applies to the effect of partial pressure.

另外,(例如)亦提供以下情況,在反應氣體801之完全飽和之後,執行一種重設。此有利地使得感測器或微機械組件1可重複地或在長時間段內用於偵測成為可能。舉例而言,提供以下情況,當執行重設時,感測器被加熱。換言之,在重設期間,尤其與室溫相比,微機械組件1之溫度升高。舉例而言,提供微機械組件之溫度增加至100℃與500℃之間的範圍內之溫度。舉例而言,藉由加熱感測器,終產物或新的粒子再次分解成兩個反應物或第一粒子A及第二粒子B。(例如)此處提供以下情況,待偵測之氣體或另一氣體803經由薄膜再次被驅出。舉例而言,另外或替代地提供以下情況,在反應氣體801與另一氣體803之間進行反應之後,另一反應氣體801引入至第一空腔5中,或在第五方法步驟之後再一次或多次進行第四方法步驟。換言之,進行反應氣體801之更新。(例如)為此提供以下情況,連接件或其類似者連接至旋轉速率感測器空腔或第一空腔5。 In addition, for example, a reset is also performed after the reaction gas 801 is completely saturated. This advantageously makes it possible for the sensor or micromechanical component 1 to be used for detection repeatedly or over a long period of time. For example, a case is provided in which the sensor is heated when the reset is performed. In other words, the temperature of the micromechanical component 1 rises during resetting, especially compared to room temperature. For example, the temperature of the micromechanical component is increased to a temperature in the range between 100 °C and 500 °C. For example, by heating the sensor, the final product or new particles are again broken down into two reactants or first particles A and second particles B. For example, the following is provided where the gas to be detected or another gas 803 is again driven out through the film. For example, additionally or alternatively, after the reaction between the reaction gas 801 and another gas 803 is carried out, another reaction gas 801 is introduced into the first cavity 5, or again after the fifth method step. Or the fourth method step is performed multiple times. In other words, the renewal of the reaction gas 801 is performed. For example, a connection is provided for this purpose, the connector or the like being connected to the rotation rate sensor cavity or the first cavity 5.

舉例而言,亦提供儘可能多的反應氣體粒子或第一粒子與偵測氣體粒子或第二粒子反應或產生鍵。此有利地達成感測器之尤其高的敏感度。 For example, as many reactive gas particles or first particles as possible are also provided to react with the detection gas particles or the second particles or to generate bonds. This advantageously achieves a particularly high sensitivity of the sensor.

舉例而言,提供反應或反應方程式為x×A+B->AXB,其中AXB及AB為固態或處於固態聚集態。舉例而言,此處提供x>=1。舉例而言,亦提供,當加熱時或當重設時或當執行重設時,反應或反應方程式為AXB->(熱)->A+x×B。舉例而言,亦提供以下情況,反應氣體801與另一氣體803 反應且因此第一空腔5中之總壓力或第一壓力有效地減小。 For example, the reaction or reaction equation is provided as x x A + B -> A X B, where A X B and AB are solid or in a solid state. For example, x>=1 is provided here. For example, it is also provided that the reaction or reaction equation is A X B->(heat)->A+x×B when heated or when reset or when resetting is performed. For example, it is also provided that the reaction gas 801 reacts with another gas 803 and thus the total pressure or the first pressure in the first cavity 5 is effectively reduced.

Claims (11)

一種用於產生一微機械組件(1)之方法該微機械組件(1)具有一基板(3)且具有一蓋(7),該蓋(7)連接至該基板(3)且與該基板(3)圍封一第一空腔(5),一第一壓力盛行(pressure prevailing)於該第一空腔(5)中,且具有一第一化學組成之一第一氣體混合物圍封於該第一空腔(5)中,其中在一第一方法步驟(101)中,將該第一空腔(5)連接至該微機械組件(1)之一周圍空間(9)的一接取開口(11)形成於該基板(3)或該蓋(7)中,其中在一第二方法步驟(102)中,在該第一空腔(5)中設定該第一壓力及/或該第一化學組成,其中在一第三方法步驟(103)中,藉由藉助於一雷射將能量或熱引入至該基板(3)或該蓋(7)之一吸收性部分中而封閉該接取開口(11),其特徵在於在一第四方法步驟中,將用於進一步設定該第一壓力及/或該第一化學組成之一反應氣體(801)引入至該第一空腔(5)中。 A method for producing a micromechanical component (1) having a substrate (3) and having a cover (7) connected to the substrate (3) and to the substrate (3) enclosing a first cavity (5), a first pressure prevailing in the first cavity (5), and having a first chemical composition, the first gas mixture is enclosed In the first cavity (5), wherein in a first method step (101), the first cavity (5) is connected to a connection of a space (9) around one of the micromechanical components (1) An opening (11) is formed in the substrate (3) or the cover (7), wherein in a second method step (102), the first pressure and/or is set in the first cavity (5) The first chemical composition, wherein in a third method step (103), the energy or heat is introduced into the substrate (3) or the absorbent portion of the cover (7) by means of a laser. The access opening (11) is characterized in that, in a fourth method step, a reaction gas (801) for further setting the first pressure and/or the first chemical composition is introduced into the first cavity (5) Medium. 如申請專利範圍第1項之方法,其中,在一第五方法步驟中,在該反應氣體(801)之至少一個第一粒子(A)與另一氣體(803)之至少一個第二粒子(B)之間產生至少一個鍵,詳言之,至少一個化學鍵。 The method of claim 1, wherein in a fifth method step, at least one first particle (A) of the reactive gas (801) and at least one second particle of another gas (803) ( B) produces at least one bond, in particular, at least one chemical bond. 如申請專利範圍第1項或第2項之方法,其中該至少一個鍵係基於在該至少一個第一粒子(A)與該至少一個第二粒子(B)之電子之間的相互作用,詳言之,靜電相互作用而產生。 The method of claim 1 or 2, wherein the at least one bond is based on an interaction between the electrons of the at least one first particle (A) and the at least one second particle (B), In other words, electrostatic interactions occur. 如申請專利範圍第1項至第3項中任一項之方法,其中,藉助於該鍵,以使得一新的粒子(C)之化學組成為以下各者的方式產生該新的粒子(C):ABX或AB或AXB,其中x>1。 The method of any one of the items 1 to 3, wherein the new particle is produced by means of the bond such that the chemical composition of a new particle (C) is the following ): ABX or AB or AXB, where x>1. 如申請專利範圍第1項至第4項中任一項之方法,其中以使得該新的粒子(C)處於一固態聚集態或處於一液態聚集態或處於一氣態聚集態之方式產生該新的粒子(C)。 The method of any one of clauses 1 to 4, wherein the new particle (C) is produced in a solid state or in a liquid state or in a gaseous state. Particle (C). 一種微機械組件(1),其具有一基板(3)且具有一蓋(7),該蓋(7)連接至該基板(3)且與該基板(3)圍封一第一空腔(5),一第一壓力盛行於該第一空腔(5)中,且具有一化學組成之一第一氣體混合物圍封於該第一空腔(5)中,該基板(3)或該蓋(7)包含一封閉的接取開口(11),其特徵在於用於進一步設定該第一壓力及/或該第一化學組成之一反應氣體(801)係圍封於該第一空腔(5)中。 A micromechanical component (1) having a substrate (3) and having a cover (7) connected to the substrate (3) and enclosing a first cavity with the substrate (3) 5) a first pressure is prevailing in the first cavity (5), and a first gas mixture having a chemical composition is enclosed in the first cavity (5), the substrate (3) or the The cover (7) includes a closed access opening (11), characterized in that a reaction gas (801) for further setting the first pressure and/or the first chemical composition is enclosed in the first cavity (5) Medium. 如申請專利範圍第6項之微機械組件(1),其中由該反應氣體(801)之至少一個第一粒子(A)與另一氣體(803)之至少一個第二粒子(B)之間的至少一個鍵產生之一新的粒子(C)圍封於該第一空腔(5)中,所述至少一個鍵詳言之為至少一個化學鍵。 The micromechanical component (1) of claim 6, wherein the at least one first particle (A) of the reactive gas (801) and the at least one second particle (B) of the other gas (803) are between At least one of the bonds produces a new particle (C) enclosed in the first cavity (5), the at least one bond being in particular at least one chemical bond. 如申請專利範圍第6項或第7項之微機械組件(1),其中該新的粒子 (C)之化學組成為ABX或AB或AXB,其中x>1。 Such as the micromechanical component (1) of claim 6 or 7, wherein the new particle The chemical composition of (C) is ABX or AB or AXB, where x>1. 如申請專利範圍第6項至第8項之微機械組件(1),其中該蓋(7)與該基板(3)圍封一第二空腔,一第二壓力盛行於該第二空腔中,且具有一第二化學組成之一第二氣體混合物圍封於該第二空腔中。 The micromechanical component (1) of claim 6 to 8, wherein the cover (7) and the substrate (3) enclose a second cavity, and a second pressure prevails in the second cavity And a second gas mixture having a second chemical composition is enclosed in the second cavity. 如申請專利範圍第6項至第9項之微機械組件(1),其中該第一壓力低於該第二壓力,用於旋轉速率量測之一第一感測器單元配置於該第一空腔(5)中且用於加速度量測之一第二感測器單元配置於該第二空腔中。 The micromechanical component (1) of claim 6 to 9, wherein the first pressure is lower than the second pressure, and one of the first sensor units for the rotation rate measurement is disposed in the first A second sensor unit in the cavity (5) and for acceleration measurement is disposed in the second cavity. 一種如申請專利範圍第6項至第10項之一微機械組件(1)作為一氣體感測器的用途,該微機械組件(1)包含一薄膜。 A use of a micromechanical component (1) according to one of claims 6 to 10 as a gas sensor, the micromechanical component (1) comprising a film.
TW105140184A 2015-12-08 2016-12-06 Reactive sealing gas for selective adaptation of the internal cavity pressure TWI721058B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102015224533.0A DE102015224533A1 (en) 2015-12-08 2015-12-08 Reactive sealing gas for the targeted adaptation of the cavity internal pressure
DE102015224533.0 2015-12-08

Publications (2)

Publication Number Publication Date
TW201730093A true TW201730093A (en) 2017-09-01
TWI721058B TWI721058B (en) 2021-03-11

Family

ID=58722888

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105140184A TWI721058B (en) 2015-12-08 2016-12-06 Reactive sealing gas for selective adaptation of the internal cavity pressure

Country Status (3)

Country Link
CN (1) CN106853956B (en)
DE (1) DE102015224533A1 (en)
TW (1) TWI721058B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018221108A1 (en) * 2018-12-06 2020-06-10 Robert Bosch Gmbh Method for setting a pressure in a cavern formed with the aid of a substrate and a substrate cap, semiconductor system, in particular wafer system
DE102020209936A1 (en) 2020-08-06 2022-02-10 Robert Bosch Gesellschaft mit beschränkter Haftung Micromechanical system, method for setting a partial pressure, wafer arrangement

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1831664B1 (en) 2004-12-07 2012-01-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for testing the leakage rate of vacuum capsulated devices
DE102005060870A1 (en) * 2005-12-20 2007-06-21 Robert Bosch Gmbh Method for closing an opening
DE102006016260A1 (en) 2006-04-06 2007-10-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Micromechanical housing with at least two cavities with different internal pressure and / or gas composition and method for their production
WO2010010721A1 (en) * 2008-07-25 2010-01-28 日本電気株式会社 Encapsulating package, printed circuit board, electronic device and method for manufacturing encapsulating package
JPWO2010095367A1 (en) * 2009-02-19 2012-08-23 日本電気株式会社 Vacuum sealed package, printed circuit board having vacuum sealed package, electronic device, and manufacturing method of vacuum sealed package
DE102009029180B4 (en) * 2009-09-03 2017-07-20 Robert Bosch Gmbh microsystems
CN102103106B (en) * 2009-12-18 2013-12-11 中国电子科技集团公司第四十九研究所 Manufacturing method of three-leg catalytic micro gas sensor with temperature modulation
US9718679B2 (en) 2011-06-27 2017-08-01 Invensense, Inc. Integrated heater for gettering or outgassing activation
CN102288644A (en) * 2011-07-08 2011-12-21 中国科学院上海微系统与信息技术研究所 Resistance gas sensor with four support cantilever beams and a four-layer structure and method
CN102322961B (en) * 2011-07-27 2017-02-22 中国科学院上海微系统与信息技术研究所 Micromachine thermopile infrared sensor with high duty cycle and manufacture method thereof
DE102011085723A1 (en) * 2011-11-03 2013-05-08 Continental Teves Ag & Co. Ohg Component and method for manufacturing a device
TWI486559B (en) * 2011-12-16 2015-06-01 Ind Tech Res Inst Sensing device and manufacturing method thereof
US8350346B1 (en) 2012-07-03 2013-01-08 Invensense, Inc. Integrated MEMS devices with controlled pressure environments by means of enclosed volumes
KR20150046598A (en) * 2013-10-22 2015-04-30 엘지이노텍 주식회사 Package for gas sensor
DE102013222517A1 (en) * 2013-11-06 2015-05-07 Robert Bosch Gmbh Micromechanical sensor unit and method for producing micromechanical sensor units
DE102014202801B4 (en) 2014-02-17 2023-08-24 Robert Bosch Gmbh Process for producing a micromechanical component

Also Published As

Publication number Publication date
TWI721058B (en) 2021-03-11
CN106853956B (en) 2022-01-11
DE102015224533A1 (en) 2017-06-08
CN106853956A (en) 2017-06-16

Similar Documents

Publication Publication Date Title
CA2588854C (en) Method for testing the leakage rate of vacuum encapsulated devices
US20140225206A1 (en) Pressure level adjustment in a cavity of a semiconductor die
US10384932B2 (en) Device including micromechanical components in cavities having different pressures and method for its manufacture
JP2008506936A (en) Operation method of gas sensor and getter pump
TWI715689B (en) Sensor element with laser-activated getter material
Sparks et al. Reliable vacuum packaging using nanogetters and glass frit bonding
TW201730093A (en) Reactive sealing gas for selective adaptation of the internal cavity pressure
EP2570874B1 (en) Atomic sensor device and method for gettering an atomic sensor
US11014807B2 (en) Method for producing a system including a first microelectromechanical element and a second microelectromechanical element, and a system
Hilton et al. Wafer-level vacuum packaging of microbolometer-based infrared imagers
TWI771434B (en) Micromechanical apparatus comprising a first cavity and a second cavity
US20170158489A1 (en) Additional surface for stabilizing the internal cavity pressure over the lifetime
TWI735488B (en) Mems component with two different internal pressures
Reinert et al. Assessment of vacuum lifetime in nL-packages
US10273146B2 (en) Micromechanical component
Garcia-Blanco et al. Hybrid wafer-level vacuum hermetic micropackaging technology for MOEMS-MEMS
US20240133802A1 (en) Method for enclosing reference gases in mems cells
Reinert et al. In-line critical leak rate testing of vacuum-sealed and backfilled resonating MEMS devices
KR20230169106A (en) How to capture reference gas in a MEMS cell
Reinert High-Vacuum Wafer Bonding Technology
Jin et al. Research on micro/nano film getters for vacuum maintenance of MEMS