TW201723418A - An optical system and measuring methods for simultaneous absolute positioning distance and tilting angular measurements of a moving object - Google Patents

An optical system and measuring methods for simultaneous absolute positioning distance and tilting angular measurements of a moving object Download PDF

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TW201723418A
TW201723418A TW104143477A TW104143477A TW201723418A TW 201723418 A TW201723418 A TW 201723418A TW 104143477 A TW104143477 A TW 104143477A TW 104143477 A TW104143477 A TW 104143477A TW 201723418 A TW201723418 A TW 201723418A
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light
interference
optical
splitting
polarized
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TW104143477A
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Chinese (zh)
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TWI579525B (en
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陳亮嘉
尤澤龍
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國立臺灣大學
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/26Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02001Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007Two or more frequencies or sources used for interferometric measurement
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02015Interferometers characterised by the beam path configuration
    • G01B9/02017Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations

Abstract

An optical measuring system comprises a focus lens generating a focused beam, a birefringent beam splitter (BBS), and a beam splitter. The BBS divides the focused beam into a first and a second polarizing beams having polarization to be orthogonal each other. The beam splitter divides the first and second polarizing beams, respectively, into a first part of beams projecting onto an object underlying absolute distance and tilting angular (yaw/pitch) measurement and reflecting thereby to form a first and a second reflecting lights, and the other part of beams reflecting from the beam splitter thereby forming a first and a second reference lights, respectively. The first and second reflecting lights respectively interfere with the first and second references light thereby forming a first and a second interference lights and then be combined to form a combined light without any interference by the BBS. The optical detector can be further adapted in an optical interferometer for detecting positioning absolute distance and titling angle, and measurements of the moving object. Alternatively, a multi-wavelength measurement can be adapted for increasing the measurable detection range.

Description

運動物件之絕對定位距離與偏擺角度同步量測之光學系統與方法Optical system and method for simultaneous measurement of absolute positioning distance and yaw angle of moving objects

本發明為一種光學系統與方法,特別是指一種可以同時偵測絕對定位距離與偏擺角度的光學系統與量測方法。The invention relates to an optical system and a method, in particular to an optical system and a measuring method capable of simultaneously detecting an absolute positioning distance and a yaw angle.

隨著市場上的需求、光學元件和電子元件的蓬勃發展,建立具有奈米層級解析度的系統已非難事。目前市場上常看見的量測儀包括白光干涉儀、菲佐干涉儀和麥克森干涉儀,並搭配相移術及相位分析等技術便可讓解析度達到次微米或者奈米絕對距離量測之層級。With the market demand, optical components and electronic components booming, it is not difficult to build a system with nano-level resolution. The measuring instruments commonly seen on the market include white light interferometers, Fizeau interferometers and McKesson interferometers, and with phase shifting and phase analysis techniques, the resolution can be measured to submicron or nano absolute distance. Level.

在這些精密量測的系統中,如果環境或機台自身的機構運作而產生的振動、機台基準位置的校正或待測物放置位置的校正等條件沒有良好的調整與控制狀態下,可能讓量測的結果產生很大的誤差。而這些會影響量測結果的條件之中,機台位置與待測物放置的校正更是精密量測中不可或缺的重要要素。In these precision measurement systems, if the conditions such as the vibration generated by the environment or the machine's own mechanism, the correction of the machine's reference position, or the correction of the position of the object to be tested are not well adjusted and controlled, it may be The measurement results in a large error. Among these conditions, which affect the measurement results, the position of the machine and the correction of the placement of the object to be tested are indispensable elements in precision measurement.

因此,在習用技術中,例如中華民國專利公告第I452262號專利,其係揭露一種同時量測位移及傾角之干涉儀系統,其係包含一光源組、一干涉儀組、一視準儀及一訊號處理模組,該光源組設有一發射出非偏振光束的發射器,該干涉儀組設有一偏振分光鏡、一角隅稜鏡、兩一維位置靈敏感測器、一反射鏡板、兩波長延遲片及一偏振片,該視準儀接收該干涉儀組所產生的量測光束為光源且設有一鍍膜片、一二維位置靈敏感測器及一聚焦透鏡,該訊號處理模組接收兩一維位置靈敏感測器的訊號以及二維位置靈敏感測器的訊號,並分別以一訊號處理器進行訊號處理,可得到角隅稜鏡的位移以及傾角。Therefore, in the conventional technology, for example, the Patent No. I452262 of the Republic of China, discloses an interferometer system for simultaneously measuring displacement and inclination, which comprises a light source group, an interferometer group, a sight gauge and a a signal processing module, the light source group is provided with a transmitter that emits a non-polarized beam, the interferometer group is provided with a polarization beam splitter, a corner 隅稜鏡, a two-dimensional position sensitive sensor, a mirror plate, and two wavelength delays. And a polarizing plate, the collimator receives the measuring beam generated by the interferometer group as a light source and is provided with a plating film, a two-dimensional position sensitive sensor and a focusing lens, and the signal processing module receives two ones The signal of the position sensitive sensor and the signal of the two-dimensional position sensitive sensor are respectively processed by a signal processor to obtain the displacement and inclination of the corner.

此外,如Shyh-Tsong Lin 等人,所公開的相移與角度掃描式Savart剪切干涉儀論文中,(Angular scanning white light shearing interferometer, 15th International Conference on Experimental Mechanics, 22-27/July, 2012),公開了一種量測物件斜率輪廓的技術。在該技術中,如圖1所示,利用設置轉檯10上的Savart稜鏡11當做一個剪切機制,利用兩剪切波前所形成的光程差,同時運用由待測物12與Savart稜鏡11之夾角所產生相移。在本技術中,透過旋轉Savart稜鏡11角度Δα,檢偏板13穿透軸在X軸方向。光線沿著Z軸穿過起偏板14與分光鏡15後,光線會變呈線性偏極光,透過Savart稜鏡11,將光剪移為兩道光eo與oe,且剪切距離為S。當光由待測物12反射回來之後,再次經過Savart稜鏡11將兩道光合併,藉由分光鏡15導引至檢偏板13,進而產生干涉而被光感測器16感測。Furthermore, as Shyh-Tsong Lin et al., Disclosed the phase shift angle scanning Savart shearing interferometer paper, (Angular scanning white light shearing interferometer , 15 th International Conference on Experimental Mechanics, 22-27 / July, 2012 A technique for measuring the slope profile of an object is disclosed. In this technique, as shown in FIG. 1, the Savart 稜鏡 11 on the turntable 10 is used as a shearing mechanism, and the optical path difference formed by the two shear wavefronts is utilized, and the object to be tested 12 and the Savart edge are simultaneously used. The phase angle of the angle formed by the mirror 11 is shifted. In the present technique, by rotating the Savart 稜鏡 11 angle Δα, the analyzer 13 penetrates the axis in the X-axis direction. After the light passes through the polarizing plate 14 and the beam splitter 15 along the Z axis, the light becomes linearly polarized, and the light is sheared into two rays eo and oe through the Savart稜鏡11, and the cutting distance is S. After the light is reflected back from the object to be tested 12, the two lights are merged again by Savart稜鏡11, guided to the analyzer 13 by the beam splitter 15, and interference is generated and sensed by the photo sensor 16.

習用技術中也有利用馬達上之光學尺或陶瓷壓電元件之內部感測器來進行量測,但其精度及功能皆無法由使用者進行彈性修改。此外,習用技術的方式也無法即時得知待測物之傾斜角,需經過掃描及大量運算後才能得知,進而影響量測的效率。In the conventional technology, an internal measuring instrument using an optical scale or a ceramic piezoelectric element on a motor is also used for measurement, but the accuracy and function thereof cannot be flexibly modified by the user. In addition, the method of the conventional technology can not immediately know the tilt angle of the object to be tested, which needs to be scanned and a large number of operations to be known, thereby affecting the efficiency of the measurement.

本發明提供一種光學系統,其係利用雙折射元件之特性形成兩道相互正交的光路,並在兩道光路離開系統時,部分反射形成參考光以及部分穿透與形成測物光。當測物光由待測物反射回到系統時,由於測物光與參考光之間的光程差產生干涉,藉由該干涉資訊可以同時快速量測出物件上之兩位置的絕對距離、表面形貌與偏斜姿態,例如:翻滾(roll)、俯仰(pitch)與偏擺(yaw)。此外,根據距離與傾斜的資訊,可以用來調整物件於空間中的姿態並減少因傾斜而造成的誤差。由於絕對距離及傾斜度量測具有定位及阿貝誤差校正之優點,因此本發明的光學系統可應用於各式工具機之校正上,並使工具機之精度提升。The present invention provides an optical system that utilizes the characteristics of a birefringent element to form two mutually orthogonal optical paths, and that partially reflects and forms a reference light and partially penetrates and forms the object light as the two optical paths exit the system. When the object light is reflected back to the system by the object to be tested, due to the interference of the optical path difference between the object light and the reference light, the interference information can quickly measure the absolute distance between the two positions on the object, Surface topography and skewed poses such as roll, pitch and yaw. In addition, based on the distance and tilt information, it can be used to adjust the posture of the object in space and reduce the error caused by the tilt. Since the absolute distance and tilt measurement have the advantages of positioning and Abbe error correction, the optical system of the present invention can be applied to the correction of various machine tools, and the accuracy of the machine tool is improved.

本發明提供一種光學干涉系統,透過內有聚焦透鏡以及Savart稜鏡的光學系統,使得光束形成兩道偏極性相互正交的平行光,最後經過特殊鍍膜之分光鏡同時產生反射及穿透現象。而經穿透現象的光打到待測物後再反射回量測系統,如此便會使在量測系統出口反射回去的光與待測物反射回去的光進行干涉。之後,以此訊號偵測個別單一波長的光強度,並反推個別波長的相位值,便可利用這兩個資訊重建出等效波長的相位值,以得到等效波長的光程差,並以此作為光學系統與待測物之間的絕對距離。透過本發明的系統可以形成多點量測,進而測得物件的傾斜狀態。The invention provides an optical interference system, through which an optical system with a focusing lens and a Savart(R) is arranged, so that the beam forms two parallel rays whose polarization is orthogonal to each other, and finally the reflection and penetration phenomenon are simultaneously generated by the special coated beam splitter. The penetrating light is reflected back to the measuring system and then reflected back to the measuring system, so that the light reflected back at the outlet of the measuring system interferes with the light reflected back from the object to be tested. Then, by detecting the light intensity of the individual single wavelengths by using the signal and deducing the phase values of the individual wavelengths, the phase values of the equivalent wavelengths can be reconstructed by using the two information to obtain the optical path difference of the equivalent wavelength, and This serves as the absolute distance between the optical system and the object to be tested. Through the system of the present invention, a multi-point measurement can be formed to measure the tilt state of the object.

在一實施例中,本發明提供一種光學系統,包括有一聚焦透鏡、一雙折射分光元件以及一分光元件。該聚焦透鏡,用以聚焦一光束。該雙折射分光元件,用以將聚焦的光束分光,以形成偏極態相互正交之第一以及第二偏極光。該分光元件,用以將該第一與第二偏極光分光,使部分第一與第二偏極光由該分光元件反射形成一第一參考光以及一第二參考光,以及部分第一與第二偏極光穿透該分光元件投射至一物件上而反射形成一第一物光以及一第二物光,該第一物光與該第二物光進入該分光元件而分別與該第一參考光以及該第二參考光干涉形成一第一干涉光以及一第二干涉光,該第一與第二干涉光藉由該雙折射分光元件合光,形成不相互干涉的一合光光束。In one embodiment, the present invention provides an optical system including a focusing lens, a birefringent beam splitting element, and a beam splitting element. The focusing lens is used to focus a light beam. The birefringence beam splitting element is configured to split the focused beam to form first and second polarized lights whose polarization states are orthogonal to each other. The light splitting element is configured to split the first and second polarized lights, so that part of the first and second polarized lights are reflected by the light splitting element to form a first reference light and a second reference light, and part of the first and the first The second polarized light penetrates the light splitting element and is projected onto an object to reflect and form a first object light and a second object light, and the first object light and the second object light enter the light splitting element and respectively respectively with the first reference The light and the second reference light interfere to form a first interference light and a second interference light, and the first and second interference light are combined by the birefringence beam splitting element to form a combined light beam that does not interfere with each other.

在另一實施例中,本發明提供一種光學干涉系統,包括有:一光源、一導光元件以及一光學系統。該導光元件,與該光源偶接,用以導引該光源產生之光束。該光學系統,與該導光元件偶接,該光學系統更具有聚焦透鏡、雙折射分光元件以及分光元件。該聚焦透鏡,用以聚焦該光束。該雙折射分光元件,用以將聚焦的光束分光,以形成偏極態相互正交之第一以及第二偏極光。該分光元件,用以將該第一與第二偏極光分光,使部分第一與第二偏極光由該分光元件反射形成一第一參考光以及一第二參考光,以及部分第一與第二偏極光穿透該分光元件投射至一物件上而反射形成一第一物光以及一第二物光,該第一物光與該第二物光進入該分光元件而分別與該第一參考光以及該第二參考光干涉形成一第一干涉光以及一第二干涉光,該第一與第二干涉光藉由該雙折射分光元件合光,形成不相互干涉的一合光光束。In another embodiment, the present invention provides an optical interference system comprising: a light source, a light guiding element, and an optical system. The light guiding element is coupled to the light source for guiding the light beam generated by the light source. The optical system is coupled to the light guiding element, and the optical system further has a focusing lens, a birefringent beam splitting element, and a beam splitting element. The focusing lens is used to focus the beam. The birefringence beam splitting element is configured to split the focused beam to form first and second polarized lights whose polarization states are orthogonal to each other. The light splitting element is configured to split the first and second polarized lights, so that part of the first and second polarized lights are reflected by the light splitting element to form a first reference light and a second reference light, and part of the first and the first The second polarized light penetrates the light splitting element and is projected onto an object to reflect and form a first object light and a second object light, and the first object light and the second object light enter the light splitting element and respectively respectively with the first reference The light and the second reference light interfere to form a first interference light and a second interference light, and the first and second interference light are combined by the birefringence beam splitting element to form a combined light beam that does not interfere with each other.

在又一實施例中,本發明提供一種光學干涉系統,包括:一光源、一極化單元、一偶合器、一導光模組以及一光學系統。該光源,用以提供複數個光束,每一個光束具有一波長。該極化單元,用以將該複數個光束偏極化。該偶合器,用以將該複數個偏極化光束合成一偵測光束。該導光模組,與該偶合器相偶接,以導引該偵測光束。該光學系統,與該導光模組偶接,用以接收該偵測光束,該光學系統更具有一聚焦透鏡、一雙折射分光元件以及分光元件。該聚焦透鏡,用以聚焦該偵測光束。該雙折射分光元件,用以將聚焦的偵測光束分光,以形成偏極態相互正交之第一以及第二偏極光。該分光元件,用以將該第一與第二偏極光分光,使部分第一與第二偏極光由該分光元件反射形成一第一參考光以及一第二參考光,以及部分第一與第二偏極光穿透該分光元件投射至一物件上而反射形成一第一物光以及一第二物光,該第一物光與該第二物光進入該分光元件而分別與該第一參考光以及該第二參考光干涉形成一第一干涉光以及一第二干涉光,該第一與第二干涉光藉由該雙折射分光元件合光,形成不相互干涉的一合光光束。該光學系統更包括有一第一分光模組、一第二分光模組、一光感測模組以及一運算處理裝置。該第一分光模組,用以將該合光光束分成對應不同波長的分光光束。該第二分光模組,用以將不同波長的分光光束分成對應不同偏極態的第一干涉光以及第二干涉光。該光感測模組,用以感測不同波長的之第一與第二干涉光,以產生相應之干涉光強資訊。該運算處理裝置,根據該干涉光強資訊決定該物件上相應該第一與該第二干涉光之位置深度以及橫向相隔(lateral separation)距離,進而決定該物件之一傾斜擺角。In still another embodiment, the present invention provides an optical interference system including: a light source, a polarization unit, a coupler, a light guide module, and an optical system. The light source is configured to provide a plurality of beams each having a wavelength. The polarization unit is configured to polarize the plurality of beams. The coupler is configured to combine the plurality of polarized beams into a detection beam. The light guiding module is coupled to the coupling to guide the detecting beam. The optical system is coupled to the light guiding module for receiving the detecting beam. The optical system further has a focusing lens, a birefringent beam splitting component and a beam splitting component. The focusing lens is used to focus the detecting beam. The birefringence beam splitting element is configured to split the focused detecting beam to form first and second polarized lights whose polarization states are orthogonal to each other. The light splitting element is configured to split the first and second polarized lights, so that part of the first and second polarized lights are reflected by the light splitting element to form a first reference light and a second reference light, and part of the first and the first The second polarized light penetrates the light splitting element and is projected onto an object to reflect and form a first object light and a second object light, and the first object light and the second object light enter the light splitting element and respectively respectively with the first reference The light and the second reference light interfere to form a first interference light and a second interference light, and the first and second interference light are combined by the birefringence beam splitting element to form a combined light beam that does not interfere with each other. The optical system further includes a first beam splitting module, a second beam splitting module, a light sensing module and an arithmetic processing device. The first beam splitting module is configured to split the combined light beam into split beam beams corresponding to different wavelengths. The second beam splitting module is configured to split the split light beams of different wavelengths into first interference light and second interference light corresponding to different polarization states. The light sensing module is configured to sense first and second interference lights of different wavelengths to generate corresponding interference light intensity information. The arithmetic processing device determines a position depth and a lateral separation distance of the first and second interference lights on the object according to the interference light intensity information, thereby determining a tilt angle of the object.

在一實施例中,本發明提供一種絕對定位距離與偏擺角度同步量測之光學方法,其係包括有下列步驟:首先提供一聚焦光束,接著,利用一雙折射分光元件將該聚焦光束分光,形成偏極態相互正交之第一以及第二偏極光。然後再利用一分光元件以將該第一與第二偏極光分光,使部分第一與第二偏極光由該分光元件反射形成一第一參考光以及一第二參考光,以及部分第一與第二偏極光穿透該分光元件投射至一物件上,而反射形成一第一物光以及一第二物光,該物件反射的第一物光與該第二物光通過該分光元件而分別與該第一參考光以及該第二參考光干涉形成一第一干涉光以及一第二干涉光。接著,使該第一與第二干涉光藉由該雙折射分光元件合光,形成不相互干涉的一合光光束。然後,感測該合光光束中之第一與第二干涉光之干涉光強資訊。最後,根據該干涉光強資訊決定該物件上相應該第一與該第二干涉光之位置深度以及橫向相隔距離,進而決定該物件之一傾角。In one embodiment, the present invention provides an optical method for simultaneous measurement of absolute positioning distance and yaw angle, comprising the steps of first providing a focused beam, and then splitting the focused beam with a birefringent beam splitting element. And forming first and second polarized lights whose polarization states are orthogonal to each other. Then, a splitting element is further used to split the first and second polarized lights, so that part of the first and second polarized lights are reflected by the splitting element to form a first reference light and a second reference light, and a part of the first The second polarized light is projected through the light splitting element onto an object, and the reflection forms a first object light and a second object light, and the first object light reflected by the object and the second object light pass through the light splitting element respectively Interfering with the first reference light and the second reference light to form a first interference light and a second interference light. Next, the first and second interference lights are combined by the birefringence beam splitting element to form a combined light beam that does not interfere with each other. Then, the interference light intensity information of the first and second interference lights in the combined light beam is sensed. Finally, the positional depth and the lateral distance of the first and second interference lights on the object are determined according to the interference light intensity information, thereby determining an inclination of the object.

在另一實施例中,光源可以為多波長的光源,產生該多波長光源更包括有下列步驟,以一光源產生複數個光束,每一個光束具有一波長。接著將該複數個光束偏極化。然後將該複數個偏極化光束合成一偵測光束。最後,以一聚焦透鏡,用以將該偵測光束聚焦以形成該聚焦光束。而分析多波長的干涉光束更包括有下列步驟:使用一第一分光模組將該合光光束分成對應不同波長的分光光束。接著使用一第二分光模組將不同波長的分光光束分成對應不同偏極態的第一干涉光以及第二干涉光。在下一步驟中,利用光感測模組,用以感測不同波長的之第一與第二干涉光,以產生相對應之干涉光強資訊。最後使用一運算處理裝置,根據該干涉光強資訊決定該物件上相應該第一與該第二干涉光之位置深度以及橫向距離,進而決定該物件之一傾角。In another embodiment, the light source can be a multi-wavelength light source. The multi-wavelength light source further includes the steps of generating a plurality of light beams with a light source, each light beam having a wavelength. The plurality of beams are then polarized. The plurality of polarized beams are then combined into a detection beam. Finally, a focusing lens is used to focus the detection beam to form the focused beam. The analyzing the multi-wavelength interference beam further includes the following steps: dividing the combined beam into the beam splitting beams corresponding to different wavelengths by using a first beam splitting module. Then, a second beam splitting module is used to split the split light beams of different wavelengths into first interference light and second interference light corresponding to different polarization states. In the next step, the light sensing module is used to sense the first and second interference lights of different wavelengths to generate corresponding interference light intensity information. Finally, an operation processing device is used, and the position depth and the lateral distance of the first and second interference lights on the object are determined according to the interference light intensity information, thereby determining a tilt angle of the object.

請參閱圖2A所示,該圖為本發明之光學系統實施例示意圖。光學系統2包括有一聚焦透鏡20、一雙折射分光元件21以及一分光元件22。該聚焦透鏡20,設置於該光學系統2內部,用以聚焦一光束90。在一實施例中,該光束90係經由一光源發出,並經由偏極化元件之後,透過光纖300的導引而至該聚焦透鏡20。在一實施例中,該光源係為一紅外線光源,但不以此為限制。該雙折射分光元件21,設置於該光學系統2內部且位於該聚焦透鏡20之一側,用以將聚焦的光束分光,以形成偏極態相互正交以及光路相互平行之第一偏極光91a以及第二偏極光91b。該雙折射分光元件21係為雙折射性材料所構成,在本實施例中,該雙折射分光元件21可以為Savart稜鏡,但不以此為限制,如Wollaston稜鏡、Nomarski稜鏡及光柵等元件。如圖2B所示,當入射光90被偏極化之後,以45度極化態Ein,如圖2B(a)所示,進入到Savart稜鏡21會分成兩道偏極態相互垂直的光,分別是eo-偏極化光91a和oe-偏極化光91b,如圖2B(b)所示。而這兩道光在空間中會以相互平行的狀態前進,並保持其偏極態,且光強度個別為原本入射光的50%。Please refer to FIG. 2A, which is a schematic diagram of an embodiment of an optical system of the present invention. The optical system 2 includes a focusing lens 20, a birefringent beam splitting element 21, and a beam splitting element 22. The focusing lens 20 is disposed inside the optical system 2 for focusing a light beam 90. In one embodiment, the beam 90 is emitted via a source of light and is directed through the fiber 300 to the focusing lens 20 via the polarizing element. In an embodiment, the light source is an infrared light source, but is not limited thereto. The birefringence beam splitting element 21 is disposed inside the optical system 2 and located on one side of the focusing lens 20 for splitting the focused beam to form a first polarized light 91a whose polarization states are orthogonal to each other and the optical paths are parallel to each other. And a second polarized light 91b. The birefringent beam splitting element 21 is composed of a birefringent material. In the present embodiment, the birefringent beam splitting element 21 may be Savart稜鏡, but is not limited thereto, such as Wollaston稜鏡, Nomarski稜鏡, and grating. And other components. As shown in FIG. 2B, after the incident light 90 is polarized, the polarization state Ein is 45 degrees, as shown in FIG. 2B(a), and the Savart稜鏡21 is divided into two polarized lights that are perpendicular to each other. They are eo-polarized light 91a and oe-polarized light 91b, respectively, as shown in Fig. 2B(b). The two lights will advance in a parallel state in space and maintain their polar state, and the light intensity is 50% of the original incident light.

再回到圖2A所示,該分光元件22,設置在光學系統2之端部,使得該eo-偏極化光91a和oe-偏極化光91b離開該端部時,將該第一與第二偏極光91a與91b分光,使部分第一與第二偏極光91a與91b由該分光元件22反射形成一第一參考光92a以及一第二參考光92b,以及使部分第一與第二偏極光91a與91b穿透該分光元件22投射至物件8,進而反射形成一第一物光93a以及一第二物光93b。要說明的是,該分光元件22可以為與光學系統2整合在一起或者是兩個分離的元件。在一實施例中,該物件可以為光柵、待測樣品或者是外部的參考平面等。由該物件8表面反射的第一物光93a與該第二物光93b,再次進入該分光元件22而分別與該第一參考光92a以及該第二參考光92b干涉形成一第一干涉光以及一第二干涉光,該第一與第二干涉光沿原光路回到雙折射分光元件21之後,再次合光而形成一合光光束。由於該第一干涉光與該第二干涉光的偏極態相互正交,因此在合光之後兩光束並不相互干涉。要說明的是,以雙折射分光元件21為Savart稜鏡為例,當兩道第一物光93a以及第二物光93b,再度經過Savart稜鏡時,其結果會再度恢復成原本入射的偏極態,例如:45度偏極態。但其中需注意的是在行進過程中,兩道偏極態相互垂直的光不能有偏極態改變的現象,否則將會在入射Savart稜鏡時再度分開成兩道偏極態相互垂直的光。利用此原理,便可將兩道光以平行的方式分開並個別量測到橫向空間上的資訊,甚至也可利用反射後的可逆性,讓兩道光重新結合成一道偏極態為45度的光,且oe-偏極態和eo-偏極態不會相互干涉,保有原本的資訊。此外,由於兩道光一次性地同步取得物件表面之橫向空間距離,因此即使物件處於與光路同向的震動或運動,也可以不受其影響而取得到物件表面的橫向空間距離,進而得到對定位距離與偏擺角度的資訊。Returning to FIG. 2A, the beam splitting element 22 is disposed at an end of the optical system 2 such that the eo-polarized light 91a and the oe-polarized light 91b are separated from the end portion, and the first The second polarized lights 91a and 91b are split, so that the first and second polarized lights 91a and 91b are reflected by the light splitting element 22 to form a first reference light 92a and a second reference light 92b, and the first and second portions are made. The polarized lights 91a and 91b are projected through the beam splitting element 22 to the object 8, and are further reflected to form a first object light 93a and a second object light 93b. It is to be noted that the beam splitting element 22 may be integrated with the optical system 2 or be two separate components. In an embodiment, the object may be a grating, a sample to be tested, or an external reference plane or the like. The first object light 93a and the second object light 93b reflected by the surface of the object 8 again enter the beam splitting element 22 and interfere with the first reference light 92a and the second reference light 92b to form a first interference light and A second interference light, the first and second interference lights return to the birefringent beam splitting element 21 along the original optical path, and are combined again to form a combined light beam. Since the polarization states of the first interference light and the second interference light are orthogonal to each other, the two light beams do not interfere with each other after the light combination. It should be noted that, taking the birefringence beam splitting element 21 as Savart稜鏡 as an example, when the two first object light 93a and the second object light 93b pass through Savart稜鏡 again, the result is restored to the original incident bias again. Polar state, for example: 45 degree partial polar state. However, it should be noted that during the process of travel, the two mutually opposite polar lights cannot change in a polar state. Otherwise, they will be separated into two mutually perpendicular polar lights when incident Savart稜鏡. . By using this principle, the two lights can be separated and measured in parallel in the horizontal space, and even the reversibility after reflection can be used to recombine the two lights into a polarized light of 45 degrees. And the oe-polar and eo-polar states do not interfere with each other, retaining the original information. In addition, since the two lights simultaneously acquire the lateral space distance of the surface of the object at one time, even if the object is in the same direction of vibration or motion as the optical path, the lateral space distance of the surface of the object can be obtained without being affected, thereby obtaining the positioning. Distance and yaw angle information.

如圖3所示,該圖為本發明利用前述圖2A之光學系統所形成的光學干涉系統架構示意圖。在本實施中,該系統3中的光源模組30a產生的光束經過極化單元31a偏極化之後所形成的光束通過導光模組33a,本實施例為循環器(circulator),再進入到光學系統2產生兩道相距Δs的第一與第二偏極光束投射至物件8a。從物件8a反射之後,在光學系統2內和參考光束干涉後,再次合光形成合光光束。該合光光束離開光學系統2之後經由光纖傳導至導光模組33a,而被導引至極性分光元件(polarization beam splitter, PBS) 35a,用以將合光光束再次分離成第一干涉光以及第二干涉光。分光之後,第一與第二干涉光分別被光感測器36a與36b,例如光偵測器、CCD或CMOS感光元件,偵測出相應的光強度,透過運算處理裝置37a可以演算出個別波長的相位值,再用相移術解出單一波長干涉後在特定光程差之下的相位,並進一步用來反推光程差以得到物件偵測位置的距離d1與d2。在一實施例中,產生光程差的方式可以透過移動光學系統2帶動分光鏡(圖2A的元件22)移動,或者是單獨移動分光鏡的方式來達成。而相移術可以利用三步相移、四步相移、五步相移或 (N+1) 步相移來進行演算。最後再根據兩道光的距離Δs以及距離d1與d2即可以得知物件8a的傾斜角度。As shown in FIG. 3, the figure is a schematic diagram of an optical interference system structure formed by the optical system of FIG. 2A. In this embodiment, the light beam generated by the light source module 30a in the system 3 is polarized by the polarization unit 31a, and the light beam formed by the light source module 30a passes through the light guide module 33a. In this embodiment, the circulator is turned into a circulator. The optical system 2 generates two first and second polarized beams of a distance Δs projected onto the object 8a. After being reflected from the object 8a, after being interfered with the reference beam in the optical system 2, the combined light beam is again combined to form a combined light beam. After the light beam exits the optical system 2, it is transmitted to the light guiding module 33a via the optical fiber, and is guided to a polarization beam splitter (PBS) 35a for separating the combined light beam into the first interference light and Second interference light. After the splitting, the first and second interference lights are respectively detected by the photo sensors 36a and 36b, such as a photodetector, a CCD or a CMOS sensor, and the respective light intensities are detected, and the individual wavelengths can be calculated by the arithmetic processing device 37a. The phase value is then used to solve the phase under a specific optical path difference after a single wavelength interference, and is further used to reverse the optical path difference to obtain the distances d1 and d2 of the object detection position. In one embodiment, the manner in which the optical path difference is generated can be achieved by moving the spectroscope (element 22 of FIG. 2A) through the moving optical system 2, or by separately moving the spectroscope. Phase shifting can be performed using a three-step phase shift, a four-step phase shift, a five-step phase shift, or a (N+1) step phase shift. Finally, the angle of inclination of the object 8a can be known from the distance Δs of the two lights and the distances d1 and d2.

為增加量測階高或量測物件深度範圍之限制,可利用多波長干涉方式,並使用波長相當接近之兩個波長達成接近釐米等級之等效波長,如1569.18奈米和1564.68奈米的雙波長干涉,可產生545.61微米之等效波長,但不以此為限制,可以根據需求而定。在一實施例中,如圖4所示,其係為本發明之光學干涉系統架構實施例示意圖。在本實施例中,該光學干涉系統3包括有一光源模組30、一極化單元31、一偶合器32、一導光模組33以及光學系統2。在本實施例中的光源模組30為雙光源301與302所構成的模組,每一個光源301與302為紅外線光源,分別提供不同波長,但是兩波長相當接近的紅外線。本發明中所使用的多波長干涉術,可以應用於量測階高落差較大的標準階高塊上以擴大其量測的範圍。以雙波長為例,其應用方式首先針對兩種波長個別進行相移術,並求得其未知相位,得到未知相位後,將這兩個相位資訊進行相減,便可得到等效波長的相位資訊,其公式如式(1)。………..…..(1)In order to increase the measurement step height or limit the depth range of the object, multi-wavelength interference can be used, and two wavelengths close to the wavelength can be used to achieve equivalent wavelengths close to the centimeter level, such as 1569.18 nm and 1546.68 nm. Wavelength interference can produce an equivalent wavelength of 545.61 microns, but it is not limited by this and can be determined according to requirements. In an embodiment, as shown in FIG. 4, it is a schematic diagram of an embodiment of an optical interference system architecture of the present invention. In this embodiment, the optical interference system 3 includes a light source module 30, a polarization unit 31, a coupler 32, a light guide module 33, and an optical system 2. The light source module 30 in this embodiment is a module composed of dual light sources 301 and 302. Each of the light sources 301 and 302 is an infrared light source, and respectively provides different wavelengths, but two wavelengths are relatively close to infrared rays. The multi-wavelength interferometry used in the present invention can be applied to measure a standard step height block having a large step difference to expand the range of measurement. Taking dual wavelength as an example, the application method is first for two wavelengths. versus Perform phase shifting individually and find the unknown phase versus , get unknown phase versus After subtracting the two phase information, the phase information of the equivalent wavelength can be obtained. , the formula is as in formula (1). ………..…..(1)

其中則為等效波長,分別為兩種不同波長的相位資訊,則是等效波長的相位資訊。而的公式如下式(2)所示。…………….(2)among them Is the equivalent wavelength, versus Two different wavelengths versus Phase information, It is the phase information of the equivalent wavelength. and The formula is as shown in the following formula (2). …………….(2)

如圖5所示,多波長應用原理,以兩波長為例,是於兩種不同波長之間取公倍數的關係,當個別波長之間的週期不同,兩者之間的相位關係需經過共同公倍數的週期後才能重複出現一樣的相位關係,因此可利用這樣的原理而產生出等效波長,進而擴大量測的距離範圍。As shown in Figure 5, the principle of multi-wavelength application, taking two wavelengths as an example, is at two different wavelengths. versus Take a common multiple relationship between individual wavelengths versus The period between the two is different, and the phase relationship between the two needs to go through the cycle of the common multiple to repeat the same phase relationship, so the principle can be used to generate the equivalent wavelength. , thereby expanding the range of distance measured.

由光源301以及302所產生的不同波長的紅外線光束經由極化單元31而形成偏極化的光束。在本實施例中,極化單元31更具有第一極化元件310與第二極化元件311分別與該光源301與302偶接。本實施例中,所形成的兩道具有偏極態的光束所具有的偏極角度為45度,但不以此為限制。兩道極化的光束經由光纖300的導引至該偶合器32。經由偶合器32將該兩道極化的光束合成為一道可在光纖300內傳輸的偵測光束。在一實施例中,該偶合器32可以使用高密度波長分波多工器 (Dense Wavelength Division Multiplexing, DWDM)。該偶合器32與該導光模組33偶接,該導光模組33接收來自於偶合器32的合光光束。本實施例中,該導光模組33包括有光纖300與循環器33,其中之一光纖300連接該偶合器32與該循環器33,另一光纖300則連接該循環器33以及該光學系統2。循環器33用以提供讓偵測光束通過而進入到光學系統2。Different wavelengths produced by light sources 301 and 302 versus The infrared ray beam forms a polarized beam via the polarization unit 31. In this embodiment, the polarization unit 31 further has a first polarization element 310 and a second polarization element 311 coupled to the light sources 301 and 302, respectively. In this embodiment, the two polarized beams are formed to have a polarization angle of 45 degrees, but are not limited thereto. The two polarized beams are directed to the coupler 32 via the optical fiber 300. The two polarized beams are combined via a coupler 32 into a detected beam that can be transmitted within the fiber 300. In an embodiment, the coupler 32 can use a Dense Wavelength Division Multiplexing (DWDM). The coupling 32 is coupled to the light guiding module 33 , and the light guiding module 33 receives the combined light beam from the coupling 32 . In this embodiment, the light guiding module 33 includes an optical fiber 300 and a circulator 33, one of the optical fibers 300 is connected to the coupling 32 and the circulator 33, and the other optical fiber 300 is connected to the circulator 33 and the optical system. 2. The circulator 33 is provided to allow the detection beam to pass through to the optical system 2.

光學系統2的結構如圖2A所述,進入到光學系統2的偵測光束,會形成兩道偏極態相互正交的第一偏極化光(eo波)以及一第二偏極化光(oe波),且相距Δs,而投射至物件8a上。本實施例中所述的物件8a為一光柵,但不以此為限。由物件8a 反射形成第一物光以及第二物光分別保有原本第一與第二偏極光的偏極態,在進入到光學系統 2之後,分別與被光學系統2所具有的分光元件反射的第一參考光以及第二參考光相互干涉,以形成第一與第二干涉光。第一與第二干涉光經由光學系統2內的Savart稜鏡再次合光,形成不相互干涉的一合光光束。The structure of the optical system 2 is as shown in FIG. 2A. The detection beam entering the optical system 2 forms two first polarized lights (eo waves) and a second polarized light which are mutually orthogonal to each other. (oe wave), and spaced apart by Δs, onto the object 8a. The object 8a described in this embodiment is a grating, but is not limited thereto. The first object light is reflected by the object 8a and the second object light retains the polarization states of the first and second polarized lights, respectively, and after entering the optical system 2, respectively, is reflected by the beam splitting element of the optical system 2 The first reference light and the second reference light interfere with each other to form first and second interference lights. The first and second interference lights are again combined by Savart(R) in the optical system 2 to form a combined light beam that does not interfere with each other.

合光光束經過該循環器330被導引至第一分光模組34,用以將該合光光束,分成對應不同波長的第一與第二分光光束。在本實施例中,第一分光模組34為DWDM,使得其中的第一分光光束為對應光源301波長的分光光束,其內含對應該波長的第一干涉光以及第二干涉光;同樣地,第二分光光束則為對應光源302波長的分光光束,其內含有對應該波長的第一干涉光以及第二干涉光。The combined light beam is guided to the first beam splitting module 34 through the circulator 330 for splitting the combined light beam into first and second split light beams corresponding to different wavelengths. In this embodiment, the first beam splitting module 34 is a DWDM, such that the first splitting beam is the wavelength of the corresponding source 301. Spectroscopic beam containing the corresponding wavelength First interference light and second interference light; likewise, the second split light beam is corresponding to the wavelength of the light source 302 Spectroscopic beam containing corresponding wavelengths The first interference light and the second interference light.

隨後,第一分光光束經由光纖的導引至第二分光模組35,其係具有分光元件351以及分光元件352。其中,分光元件351經由光纖300與該第一分光模組34偶接,分光元件351用以將該第一合光光束分成對偏極態相互正交且對應波長的第一干涉光束以及第二干涉光束,而分光元件352經由光纖300與該第一分光模組34偶接,分光元件352用以將該第二干涉光束分成偏極態相互正交且對應波長的第一干涉光束以及第二干涉光束。第二分光模組35更進一步的與光感測模組36偶接,其中,光感測模組36具有複數個光感測單元360~363,分別感測對應波長的第一與第二干涉光束,進而產生相應的干涉光強資訊。在一實施例中,光感測單元為光偵測器、CCD或者是CMOS感測元件。Subsequently, the first beam splitting beam is guided via the optical fiber to the second beam splitting module 35, which has a beam splitting element 351 and a beam splitting element 352. The splitting element 351 is coupled to the first beam splitting module 34 via the optical fiber 300, and the splitting element 351 is configured to split the first combined light beam into mutually opposite polar states and corresponding wavelengths. First interference beam Second interference beam The splitting element 352 is coupled to the first beam splitting module 34 via the optical fiber 300, and the beam splitting element 352 is configured to divide the second interference beam into mutually orthogonal states and corresponding wavelengths. First interference beam Second interference beam . The second beam splitting module 35 is further coupled to the light sensing module 36. The light sensing module 36 has a plurality of light sensing units 360-363 for sensing corresponding wavelengths. versus The first and second interference beams, in turn, generate corresponding interference light intensity information. In an embodiment, the light sensing unit is a photodetector, a CCD, or a CMOS sensing element.

光感測模組36與一運算處理裝置37電性連接,該運算處理裝置37具有運算處理能力,可以為工作站或電腦的裝置,但不以此為限制。運算處理裝置37具有相位求解的基本演算法,例如:三步相移、四步相移、五步相移以及 (N+1) 步相移,用以根據干涉光強資訊解析出第一干涉光束以及第一干涉光束所對的物件高度d1與d2。由於經過Savart透鏡所形成的第一與第二偏極光束之間的距離Δs為已知,因此根據物件高度d1與d2以及距離Δs即可以得知物件的傾斜狀態。The optical sensing module 36 is electrically connected to an arithmetic processing device 37. The arithmetic processing device 37 has an arithmetic processing capability and can be a workstation or a computer device, but is not limited thereto. The arithmetic processing device 37 has a basic algorithm for solving the phase, for example, a three-step phase shift, a four-step phase shift, a five-step phase shift, and a (N+1) step phase shift for parsing the first interference based on the interference light intensity information. beam versus First interference beam versus The object heights are d1 and d2. Since the distance Δs between the first and second polarized beams formed by the Savart lens is known, the tilt state of the object can be known from the object heights d1 and d2 and the distance Δs.

綜合上述,本發明之運動物件之絕對定位距離與偏擺角度同步量測之光學系統與方法可以用單點量測之方式,達到同時以及快速的測出物件上之兩位置的絕對距離、表面形貌與偏斜姿態,因此具有用來定位及阿貝誤差校正之優點,可應用於各式工具機之校正上,並使工具機之精度提升。具有高精度及阿貝誤差校正之量測系統可增加工具機的量測物種類,甚至可用來當作晶圓曝光機等,提升產業之附加價值。In summary, the optical system and method for measuring the absolute positioning distance and the yaw angle of the moving object of the present invention can be used to measure the absolute distance and surface of the two positions on the object simultaneously and quickly by using a single point measurement method. The shape and the skewed posture have the advantages of positioning and Abbe error correction, and can be applied to the correction of various machine tools, and the accuracy of the machine tool is improved. The measurement system with high precision and Abbe error correction can increase the type of measuring object of the machine tool, and can even be used as a wafer exposure machine to enhance the added value of the industry.

以上所述,乃僅記載本發明為呈現解決問題所採用的技術手段之較佳實施方式或實施例而已,並非用來限定本發明專利實施之範圍。即凡與本發明專利申請範圍文義相符,或依本發明專利範圍所做的均等變化與修飾,皆為本發明專利範圍所涵蓋。The above description is only intended to describe the preferred embodiments or embodiments of the present invention, which are not intended to limit the scope of the invention. That is, the equivalent changes and modifications made in accordance with the scope of the patent application of the present invention or the scope of the invention are covered by the scope of the invention.

10‧‧‧轉檯
11‧‧‧Savart稜鏡
12‧‧‧待測物
13‧‧‧檢偏板
14‧‧‧起偏板
15‧‧‧分光鏡
16‧‧‧光感測器
2‧‧‧光學系統
20‧‧‧聚焦透鏡
21‧‧‧雙折射分光元件
22‧‧‧分光元件
300‧‧‧光纖
3、3a‧‧‧光學干涉系統
30、30a‧‧‧光學模組
301、302‧‧‧光源
31、31a‧‧‧極化單元
310‧‧‧第一極化元件
311‧‧‧第二極化元件
32‧‧‧偶合器
33、33a‧‧‧導光模組
330‧‧‧循環器
90‧‧‧光束
91a‧‧‧第一偏極光
34‧‧‧第一分光模組
35‧‧‧第二分光模組
351‧‧‧分光元件
352‧‧‧分光元件
36‧‧‧光感測模組
36a、36b‧‧‧光感測器
360~363‧‧‧光感測單元
37、37a‧‧‧運算處理裝置
91b‧‧‧第二偏極光
92a‧‧‧第一參考光
92b‧‧‧第二參考光
93a‧‧‧第一物光
93b‧‧‧第二物光
8、8a‧‧‧物件
10‧‧‧ turntable
11‧‧‧ Savart稜鏡
12‧‧‧Test object
13‧‧‧Check plate
14‧‧‧ deflecting plate
15‧‧‧beam splitter
16‧‧‧Light sensor
2‧‧‧Optical system
20‧‧‧focus lens
21‧‧‧Birefringence beam splitting element
22‧‧‧Spectral components
300‧‧‧ fiber
3. 3a‧‧‧Optical Interference System
30, 30a‧‧‧ Optical Module
301, 302‧‧‧ light source
31, 31a‧‧ ‧Polarization unit
310‧‧‧First Polarization Element
311‧‧‧second polarization element
32‧‧‧ coupling
33, 33a‧‧‧Light guide module
330‧‧‧Circulator
90‧‧‧ Beam
91a‧‧‧First Polar Light
34‧‧‧First beam splitting module
35‧‧‧Second splitting module
351‧‧‧ Spectroscopic components
352‧‧‧Spectral components
36‧‧‧Light sensing module
36a, 36b‧‧‧Photosensor
360~363‧‧‧Light sensing unit
37, 37a‧‧‧ arithmetic processing device
91b‧‧‧Second Polar Light
92a‧‧‧First reference light
92b‧‧‧second reference light
93a‧‧‧First light
93b‧‧‧Second light
8, 8a‧‧‧ objects

圖1為習用技術之表面曲度光學檢測架構示意圖; 圖2A為本發明之光學系統實施例示意圖; 圖2B為偏極態相互正交的第一與第二偏極光束示意圖; 圖3為本發明之利用光學系統所形成的光學干涉系統架構實施例示意圖; 圖4為本發明之光學干涉系統架構另一實施例示意圖;以及 圖5為雙波長所構成之等效波長示意圖。1 is a schematic diagram of a surface curvature optical detection architecture of the prior art; FIG. 2A is a schematic diagram of an embodiment of an optical system according to the present invention; FIG. 2B is a schematic diagram of first and second polarization beams orthogonal to each other; FIG. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 4 is a schematic diagram of another embodiment of an optical interference system architecture according to the present invention; and FIG. 5 is a schematic diagram of equivalent wavelengths formed by dual wavelengths.

2‧‧‧光學系統 2‧‧‧Optical system

20‧‧‧聚焦透鏡 20‧‧‧focus lens

21‧‧‧雙折射分光元件 21‧‧‧Birefringence beam splitting element

22‧‧‧分光元件 22‧‧‧Spectral components

300‧‧‧光纖 300‧‧‧ fiber

90‧‧‧光束 90‧‧‧ Beam

91a‧‧‧第一偏極光 91a‧‧‧First Polar Light

91b‧‧‧第二偏極光 91b‧‧‧Second Polar Light

92a‧‧‧第一參考光 92a‧‧‧First reference light

92b‧‧‧第二參考光 92b‧‧‧second reference light

93a‧‧‧第一物光 93a‧‧‧First light

93b‧‧‧第二物光 93b‧‧‧Second light

8‧‧‧物件 8‧‧‧ objects

Claims (21)

一種光學系統,包括有: 一聚焦透鏡,用以聚焦一光束; 一雙折射分光元件,用以將聚焦的光束分光,以形成偏極態相互正交之第一以及第二偏極光;以及 一分光元件,用以將該第一與第二偏極光分光,使部分第一與第二偏極光由該分光元件反射形成一第一參考光以及一第二參考光,以及部分第一與第二偏極光穿透該分光元件投射至一物件上,而反射形成一第一物光以及一第二物光,該第一物光與該第二物光進入該分光元件而分別與該第一參考光以及該第二參考光干涉形成一第一干涉光以及一第二干涉光,該第一與第二干涉光藉由該雙折射分光元件合光,形成不相互干涉的一合光光束。An optical system comprising: a focusing lens for focusing a beam; a birefringent beam splitting element for splitting the focused beam to form first and second polarized lights that are mutually orthogonal to each other; and The light splitting component is configured to split the first and second polarized lights, so that part of the first and second polarized lights are reflected by the light splitting component to form a first reference light and a second reference light, and part of the first and second The polarized light penetrates the light splitting element and is projected onto an object, and the reflection forms a first object light and a second object light, and the first object light and the second object light enter the light splitting element and respectively respectively with the first reference The light and the second reference light interfere to form a first interference light and a second interference light, and the first and second interference light are combined by the birefringence beam splitting element to form a combined light beam that does not interfere with each other. 如申請專利範圍第1項所述之光學系統,其中該分光元件為一雙折射晶體材料。The optical system of claim 1, wherein the optical splitting element is a birefringent crystalline material. 如申請專利範圍第1項所述之光學系統,其中該光束為紅外線或者是具有多波長之光束。The optical system of claim 1, wherein the light beam is infrared light or a light beam having multiple wavelengths. 一種光學干涉系統,包括有: 一光源模組,用以產生一偵測光束; 一導光元件,與該光源模組偶接,用以導引該偵測光束; 一光學系統,與該導光元件偶接,該光學系統更具有: 一聚焦透鏡,用以聚焦該偵測光束; 一雙折射分光元件,用以將聚焦的光束分光,以形成偏極態相互正交之第一以及第二偏極光;以及 一分光元件,用以將該第一與第二偏極光分光,使部分第一與第二偏極光由該分光元件反射形成一第一參考光以及一第二參考光,以及部分第一與第二偏極光穿透該分光元件投射至一物件上而反射形成一第一物光以及一第二物光,該第一物光與該第二物光進入該分光元件而分別與該第一參考光以及該第二參考光干涉形成一第一干涉光以及一第二干涉光,該第一與第二干涉光藉由該雙折射分光元件合光,形成不相互干涉的一合光光束。An optical interference system includes: a light source module for generating a detection beam; a light guiding element coupled to the light source module for guiding the detection beam; an optical system, and the guide The optical component is coupled, the optical system further includes: a focusing lens for focusing the detecting beam; and a birefringent beam splitting component for splitting the focused beam to form a first and a second orthogonal to each other a second polarized light; and a light splitting element for splitting the first and second polarized light, wherein the first and second polarized lights are reflected by the light splitting element to form a first reference light and a second reference light, and Part of the first and second polarized lights are projected through the light splitting element onto an object to reflect a first object light and a second object light, and the first object light and the second object light enter the light splitting element respectively Interfering with the first reference light and the second reference light to form a first interference light and a second interference light, wherein the first and second interference lights are combined by the birefringence beam splitting element to form a non-interference one Combined light beam. 如申請專利範圍第4項所述之光學干涉系統,其中該分光元件為一雙折射晶體材料。The optical interference system of claim 4, wherein the beam splitting element is a birefringent crystal material. 如申請專利範圍第4項所述之光學干涉系統,其中該導光元件為光纖。The optical interference system of claim 4, wherein the light guiding element is an optical fiber. 如申請專利範圍第4項所述之光學干涉系統,其係更包括有: 一光感測器,用以接收該第一與第二干涉光,以產生相應之干涉光強資訊;以及 一運算處理裝置,根據該干涉光強資訊決定該物件上相應該第一與該第二干涉光之位置深度以及橫向相隔距離,進而決定該物件之一傾角。The optical interference system of claim 4, further comprising: a light sensor for receiving the first and second interference lights to generate corresponding interference light intensity information; and an operation The processing device determines, according to the interference light intensity information, a position depth and a lateral distance of the first and second interference lights on the object, and further determines a tilt angle of the object. 如申請專利範圍第4項所述之光學干涉系統,其中該光源模組為紅外線光源模組或者是具有多波長之光束之光源模組。The optical interference system of claim 4, wherein the light source module is an infrared light source module or a light source module having a multi-wavelength beam. 如申請專利範圍第4項所述之光學干涉系統,其中該光源模組更包括有: 一光源,用以提供複數個光束,每一個光束具有一波長; 一極化單元,用以將該複數個光束偏極化; 一偶合器,用以將該複數個偏極化光束合成一偵測光束;以及 一導光模組,與該偶合器相偶接,以導引該偵測光束。The optical interference system of claim 4, wherein the light source module further comprises: a light source for providing a plurality of light beams, each of the light beams having a wavelength; and a polarization unit for the plurality of light sources The beam is polarized; a coupler is configured to combine the plurality of polarized beams into a detection beam; and a light guiding module is coupled to the coupling to guide the detecting beam. 如申請專利範圍第9項所述之光學干涉系統,其中該導光模組更包括有: 一第一光纖,與該偶合器偶接; 一循環器,與該第一光纖相偶接;以及 一第二光纖,與該循環器以及該光學系統相連接。The optical interference system of claim 9, wherein the light guiding module further comprises: a first optical fiber coupled to the coupling; a circulator coupled to the first optical fiber; A second optical fiber is coupled to the circulator and the optical system. 如申請專利範圍第10項所述之光學干涉系統,其係更包括有: 一第一分光模組,用以將該合光光束分成對應不同波長的分光光束; 一第二分光模組,用以將不同波長的分光光束分成對應不同偏極態的第一干涉光以及第二干涉光; 一光感測模組,用以感測不同波長的之第一與第二干涉光,以產生相對應之干涉光強資訊;以及 一運算處理裝置,根據該干涉光強資訊決定該物件上相應該第一與該第二干涉光之位置深度以及橫向距離,進而決定該物件之一傾角。The optical interference system of claim 10, further comprising: a first beam splitting module for splitting the combined beam into beams of light having different wavelengths; and a second beam splitting module Separating the splitting beams of different wavelengths into first interference light and second interference light corresponding to different polarization states; a light sensing module for sensing first and second interference lights of different wavelengths to generate phases Corresponding interference light intensity information; and an arithmetic processing device determining, according to the interference light intensity information, a position depth and a lateral distance of the first and second interference lights corresponding to the object, thereby determining an inclination of the object. 如申請專利範圍第11項所述之光學干涉系統,其中該第一分光模組為一高密度波長分波多工器。The optical interference system of claim 11, wherein the first beam splitting module is a high density wavelength wavelength division multiplexer. 如申請專利範圍第11項所述之光學干涉系統,其中該第二分光模組具有複數個偏極態分光器。The optical interference system of claim 11, wherein the second beam splitting module has a plurality of polarization plate splitters. 如申請專利範圍第9項所述之光學干涉系統,其中該偶合器為一高密度波長分波多工器。The optical interference system of claim 9, wherein the coupler is a high density wavelength wavelength division multiplexer. 一種絕對定位距離與偏擺角度同步量測之光學方法,其係包括有下列步驟: 提供一聚焦光束; 利用一雙折射分光元件將該聚焦光束分光,形成偏極態相互正交之第一以及第二偏極光; 利用一分光元件以將該第一與第二偏極光分光,使部分第一與第二偏極光由該分光元件反射形成一第一參考光以及一第二參考光,以及部分第一與第二偏極光穿透該分光元件投射至一物件上,而反射形成一第一物光以及一第二物光,該物件反射的第一物光與該第二物光通過該分光元件而分別與該第一參考光以及該第二參考光干涉形成一第一干涉光以及一第二干涉光;以及 使該第一與第二干涉光藉由該雙折射分光元件合光,形成不相互干涉的一合光光束。An optical method for measuring the absolute positioning distance and the yaw angle synchronously, comprising the steps of: providing a focused beam; splitting the focused beam by a birefringent beam splitting element to form a first phase of mutually orthogonal polar states; a second polarized light; using a light splitting element to split the first and second polarized light, so that a portion of the first and second polarized light are reflected by the light splitting element to form a first reference light and a second reference light, and a portion The first and second polarized light are projected through the light splitting element onto an object, and the reflection forms a first object light and a second object light, and the first object light reflected by the object and the second object light pass through the light splitting Interacting with the first reference light and the second reference light respectively to form a first interference light and a second interference light; and causing the first and second interference light to be combined by the birefringence beam splitting element to form A combined light beam that does not interfere with each other. 如申請專利範圍第15項所述之光學方法,其係更包括有下列步驟: 感測該合光光束中之第一與第二干涉光之干涉光強資訊; 根據該干涉光強資訊決定該物件上相應該第一與該第二干涉光之位置深度以及橫向相隔距離,進而決定該物件之一傾角。The optical method of claim 15, further comprising the steps of: sensing interference light intensity information of the first and second interference lights in the combined light beam; determining the light intensity information according to the interference light intensity information The position of the first and the second interference light is separated by a distance between the object and the lateral direction, thereby determining an inclination of the object. 如申請專利範圍第16項所述之光學方法,其中提供該聚焦光束更包括有下列步驟: 以一光源產生複數個光束,每一個光束具有一波長; 將該複數個光束偏極化; 將該複數個偏極化光束合成一偵測光束;以及 以一聚焦透鏡,用以將該偵測光束聚焦以形成該聚焦光束。The optical method of claim 16, wherein providing the focused beam further comprises the steps of: generating a plurality of beams with a light source, each beam having a wavelength; polarizing the plurality of beams; A plurality of polarized beams combine to form a detection beam; and a focusing lens is used to focus the detection beam to form the focused beam. 如申請專利範圍第17項所述之光學方法,其係更包括有下列步驟: 使用一第一分光模組將該合光光束分成對應不同波長的分光光束; 使用一第二分光模組將不同波長的分光光束分成對應不同偏極態的第一干涉光以及第二干涉光; 一光感測模組,用以感測不同波長的之第一與第二干涉光,以產生相對應之干涉光強資訊;以及 一運算處理裝置,根據該干涉光強資訊決定該物件上相應該第一與該第二干涉光之位置深度以及橫向距離,進而決定該物件之一傾角。The optical method of claim 17, further comprising the steps of: dividing the combined beam into a split beam corresponding to different wavelengths by using a first beam splitting module; using a second beam splitting module to be different The splitting beam of the wavelength is divided into the first interference light and the second interference light corresponding to different polarization states; a light sensing module is configured to sense the first and second interference lights of different wavelengths to generate corresponding interference And an operation processing device, determining, according to the interference light intensity information, a position depth and a lateral distance of the first and second interference lights on the object, thereby determining an inclination of the object. 如申請專利範圍第18項所述之光學方法,其中該第一分光模組為一高密度波長分波多工器。The optical method of claim 18, wherein the first beam splitting module is a high density wavelength wavelength division multiplexer. 如申請專利範圍第18項所述之光學方法,其中該第二分光模組具有複數個偏極態分光器。The optical method of claim 18, wherein the second beam splitting module has a plurality of polarized beam splitters. 如申請專利範圍第17項所述之光學方法,其中該光源更包括有一偶合器,其係為一高密度波長分波多工器。The optical method of claim 17, wherein the light source further comprises a coupler, which is a high-density wavelength-wavelength multiplexer.
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