TW201721704A - Charged particle beam apparatus and scanning electron microscope capable of enhancing performance - Google Patents

Abstract

A charged particle beam device comprises: a charged particle source (11); an acceleration power supply (14) which is connected to the charged particle source (11) for accelerating a primary charged particle beam (12) emitted from the charged particle source (11); a first objective lens (18) disposed on the side of the sample (23) on which the primary charged particle beam (12) is incident for focusing the primary charged particle beam (12) on the sample (23); a second objective lens (26) disposed on the side of the sample (23) opposite to the side on which the primary charged particle beam (12) is incident for focusing the primary charged particle beam (12) on the sample (23); a first object-lens power supply (41) for changing the intensity of the first object lens (18); and, a second object-lens power supply (42) for changing the intensity of the second object lens (26); the sample (23) is disposed between the first object lens (18) and the second object lens (26) while only using the first object-lens power supply (41), and the distance of the second object lens (26) to the sample measuring surface is nearer than the distance of the first object lens (18) to the sample measuring surface.

Description

Charged particle line device and scanning electron microscope

The present invention relates to a charged particle beam device and a scanning electron microscope. More specifically, the present invention relates to a charged particle beam device and a scanning electron microscope which are expected to have improved performance.

The charged particle beam device includes a scanning electron microscope (hereinafter referred to as "SEM"), an electron probe microanalyzer (EPMA), an electron beam fusion splicer, and an electron beam drawing device. And ion beam microscopes.

In the conventional SEM, from the viewpoint of high decomposition energy, the short focus of the lens is particularly worked. In order to achieve high resolution, it is necessary to enhance B in the magnetic flux density distribution B(z) on the optical axis of the lens. Moreover, in order to achieve high decomposition energy, it is necessary to thin the thickness of the lens (i.e., the z width of the B distribution).

In the following Patent Document 1, an SEM having two objective lens lenses (a first objective lens and a second objective lens) is described (hereinafter, the lens on the electron gun side with respect to the sample is referred to as a first objective lens. The objective lens located on the opposite side of the electron gun is referred to as a second objective lens). More specifically, the second objective lens is used for a high decomposition energy observation mode at a low acceleration when the acceleration voltage Vacc is 0.5 to 5 kV. The first objective lens is used for the normal observation mode in which the accelerating voltage Vacc is 0.5 to 30 kV.

In Patent Document 1 below, the first objective lens and the second objective lens do not simultaneously operate. The first objective lens and the second objective lens switch each mode by mode switching means. Further, in the second embodiment (paragraph [0017]) of the following Patent Document 1, the magnetic pole of the second objective lens is described. A part of it is separated by a current potential of an electrical insulating portion. Then, a voltage Vdecel is applied to a portion of the magnetic pole and the sample.

In the first embodiment of the following Patent Document 1 (paragraphs [0010] to [0016]), the secondary electron (or reflected electron) detector is disposed closer to the electron gun side than the first objective lens. The secondary electrons (or reflected electrons) generated by the sample portion pass through the first objective lens and enter the detector.

The following Patent Document 2 also discloses the configuration of the SEM. The objective lens in the SEM of Patent Document 2 is disposed on the opposite side of the electron gun with respect to the sample. The secondary electrons are deflected by a guided electric field from the secondary electron detector and captured by the secondary electron detector.

[Previous Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Laid-Open Patent Publication No. 2007-250223

[Patent Document 2] Japanese Laid-Open Patent Publication No. Hei-6-181041

An object of the present invention is to provide a charged particle beam device and a scanning electron microscope which are expected to have improved performance.

In order to solve the above problems, a charged particle beam device according to the present invention includes: a charged particle source; an acceleration power source provided to accelerate a charged particle beam emitted from the charged particle source, and connected to the charged particle source; The objective lens is disposed on the incident side of the charged particle beam with respect to the sample, and focuses the charged particle beam on the sample; the second objective lens is disposed on the opposite side of the incident side of the charged particle beam with respect to the sample. The charged particle beam is focused on the sample; the first object a mirror lens power supply for converting the intensity of the first objective lens; and a second objective lens power supply for converting the intensity of the second objective lens; wherein, when only the first objective lens power source is used, the sample is disposed on the first objective lens Between the second objective lens and the second objective lens power supply, the distance between the second objective lens and the sample measurement surface is closer than the distance between the first objective lens and the sample measurement surface.

A charged particle beam apparatus according to another aspect of the present invention includes: a charged particle source; an acceleration power source provided to accelerate a charged particle beam emitted from the charged particle source, and connected to the charged particle source; and a first objective lens; The sample is placed on the incident side of the charged particle beam, and the charged particle beam is focused on the sample; and the second objective lens is disposed on the opposite side of the incident side of the charged particle beam with respect to the sample, and the charged particle is placed on the incident side of the charged particle beam. The line is focused on the sample; the first objective lens power supply converts the intensity of the first objective lens; the second objective lens power supply converts the intensity of the second objective lens; and the first control device controls the first objective lens power supply and The second objective lens power supply; wherein, when only the first objective lens power supply is used, the distance between the first objective lens and the sample measurement surface is closer than the distance between the second objective lens and the sample measurement surface; only the second objective lens is used; In the case of the lens power supply, the distance between the second objective lens and the sample measurement surface is closer than the distance between the first objective lens and the sample measurement surface.

Another charged particle beam apparatus according to an aspect of the present invention includes: a charged particle source; an acceleration power source provided to accelerate a charged particle beam emitted from the charged particle source, and connected to the charged particle source; the first objective lens, relative The sample is placed on the incident side of the charged particle beam, and the charged particle beam is focused on the sample; and the second objective lens is disposed on the opposite side of the incident side of the charged particle beam with respect to the sample, and the charged particle beam is placed on the incident side of the charged particle beam. Focusing on the sample; a first objective lens power supply, transforming the intensity of the first objective lens; a second objective lens power supply, converting the intensity of the second objective lens; and a first control device controlling the first objective lens power supply and the a second objective lens power supply; wherein the first control device has a function of independently controlling the intensity of the first objective lens and the intensity of the second objective lens and performing simultaneous control; using only the first objective lens power supply The distance between the first objective lens and the sample measurement surface is closer than the distance between the second objective lens and the sample measurement surface; only used In the second objective lens power supply, the distance between the second objective lens and the sample measurement surface is closer to the distance between the first objective lens and the sample measurement surface.

A charged particle beam apparatus according to another aspect of the present invention includes: a charged particle beam apparatus having: a charged particle source; an acceleration power source provided to accelerate a charged particle beam emitted from the charged particle source, and Connected to the charged particle source; and an objective lens, the charged particle beam is focused on the charged particle beam device of the sample. The objective lens includes a first objective lens that is disposed on an incident side of the charged particle beam with respect to a sample, and a second objective lens that is disposed on a side opposite to an incident side of the charged particle beam with respect to the sample. The charged particle beam device includes: a first objective lens power supply for converting the intensity of the first objective lens; a second objective lens power supply for converting the intensity of the second objective lens; and a first control device for controlling the first objective lens power supply With the second objective lens power supply. Wherein, the first control device has: a function of independently controlling the intensity of the first objective lens and the intensity of the second objective lens; and controlling the intensity of the first objective lens and the intensity of the second objective lens; Focusing the charged particle beam on the function of the sample by the first objective lens; focusing the charged particle beam on the function of the sample only by the second objective lens; and simultaneously using the first objective lens and the second objective lens The first objective lens is used to convert the angle of incidence of the charged particle beam incident on the sample such that the aperture angle is smaller than when the second particle lens is focused on the sample, thereby focusing on the function of the sample.

Preferably, the method comprises: a two-stage deflecting member, the second element scans the charged particle beam, and the two-stage deflecting member has an upper deflecting member and a lower deflecting member; the upper segment is biased toward the power source to change the strength or voltage of the upper deflecting member; and the lower segment biases the power source Transforming the strength or voltage of the lower deflection member; and controlling the upper deflection power supply and the lower deflection power supply; wherein, from the inside of the first objective lens, the upper deflection member and the lower deflection member And being disposed on the flying-in side of the charged particle beam; the second control device shifts a ratio of a used current or a used voltage of the upper-stage bias power source and the lower-stage bias power source.

Preferably, the method comprises: a two-stage deflecting member, the second element scans the charged particle beam, and the two-stage deflecting member has an upper deflecting member and a lower deflecting member; the upper segment is biased toward the power source to change the strength or voltage of the upper deflecting member; and the lower segment biases the power source Transforming the strength or voltage of the lower deflection member; and controlling the upper deflection power supply and the lower deflection power supply; wherein, from the inside of the first objective lens, the upper deflection member and the lower deflection member And being disposed on the fly-in side of the charged particle beam; the lower-direction deflecting member is a plurality of coils each having a different number of turns; and the second control device controls the use in the plurality of coils.

The deflecting member is preferably a deflecting coil or a deflecting electrode.

Preferably, the method includes a hysteresis power supply, and a negative potential is applied to the sample to decelerate the charged particle beam.

From the sample closest to the magnetic pole of the second objective lens, the second objective lens preferably focuses the charged particle beam accelerated by any of the acceleration power sources from -30 kV to -10 kV to 0 mm. The height position to any of 4.5 mm.

Preferably, the insulating plate is disposed on the second objective lens; and the conductive sample stage is disposed on the insulating plate; wherein the second objective lens and the conductive sample stage are insulated.

The conductive sample stage preferably has a shape separated from the insulating sheet near the edge portion.

Preferably, the insulating plate and the conductive sample stage are filled with an insulating material.

Preferably, the potential plate having an opening is disposed on an upper portion of the conductive sample stage, and a ground potential, a positive potential, or a negative potential is applied to the potential plate.

The opening of the potential plate is preferably a circular shape having a diameter of 2 mm to 20 mm or a mesh shape.

It is preferable that the potential plate has a shape separated from the conductive sample stage in a place other than the vicinity of the sample.

Preferably, the system comprises: a moving unit that moves the potential plate.

The mobile unit is preferably a platform connected to the potential plate; and the platform can carry the sample.

Preferably, the magnetic pole forming the second objective lens has a central magnetic pole whose central axis coincides with an ideal optical axis of the charged particle beam; an upper magnetic pole; a cylindrical side magnetic pole; and a disc-shaped lower magnetic pole; In the upper portion of the sample magnetic side of the center magnetic pole, the diameter near the upper portion is a small shape, and the lower portion of the central magnetic pole has a cylindrical shape; the upper magnetic pole forms a magnetic pole of a circular opening at the center, and is oriented toward the center The disk shape is close to the thin disc shape on the center side of the center pole.

The surface on the sample side of the center magnetic pole and the surface on the sample side of the upper magnetic pole are preferably at the same height.

The upper edge diameter D of the central magnetic pole is preferably larger than 6 mm and smaller than 14 mm, and the relationship between the diameter d of the circular opening portion of the upper magnetic pole and the upper edge diameter D of the central magnetic pole is d-D ≧ 4 mm.

It is preferred to use a thermoelectron source type element as the source of the charged particles.

A scanning electron microscope relating to one aspect of the present invention includes the above-described charged particle beam device.

According to the present invention, a charged particle beam device and a scanning electron microscope with improved performance can be expected.

11‧‧‧Electronic source

12‧‧‧One electronic line

13‧‧‧Weinite electrode

14‧‧‧Accelerated power supply

15‧‧‧ Concentrating lens

15a‧‧‧First concentrating lens

15b‧‧‧second stage condenser lens

16‧‧‧ Objective lens aperture

17‧‧‧Two-stage deflection coil

17a‧‧‧Upper deflection coil

17b‧‧‧lower deflection coil

18‧‧‧First objective lens

18a‧‧‧Inside magnetic pole

18b‧‧‧Outside magnetic pole

18c‧‧‧ Hole Department

19‧‧‧Secondary electronic detector

20‧‧‧Detector

21‧‧‧ Signal Electronics

21a‧‧‧Secondary electronics

21b‧‧‧Reflective electrons

22‧‧‧potential plate

23‧‧‧ samples

24‧‧‧Testing table

25‧‧‧Insulation board

26‧‧‧Second objective lens

26a‧‧‧Center magnetic pole

26b‧‧‧Upper magnetic pole

26c‧‧‧ side magnetic pole

26d‧‧‧lower magnetic pole

26e‧‧‧ coil

26f‧‧‧ Sealing Department

27‧‧‧hysteresis power supply

28‧‧‧potentiometer power supply

29‧‧‧Sampling platform plate

30‧‧‧Cylinder discharge prevention electrode

31‧‧‧Insulation

41‧‧‧First objective lens power supply

42‧‧‧Second objective lens power supply

43‧‧‧The upper section is biased towards the power supply

44‧‧‧The lower section is biased towards the power supply

45‧‧‧Control device

51‧‧‧Upper device

52‧‧‧ Lower device

61‧‧‧XYZ platform

720‧‧‧Detector

720a‧‧‧ Hole Department

Fig. 1 is a schematic cross-sectional view showing the configuration of an SEM according to a first embodiment of the present invention.

Fig. 2 is a schematic cross-sectional view showing a state in which reflected electrons and secondary electrons are detected using a first objective lens in the first embodiment of the present invention.

Fig. 3 is a schematic cross-sectional view showing a state in which secondary electrons are detected by using a second objective lens mainly in focusing on the first embodiment of the present invention.

Fig. 4 is a view for explaining a lens portion at the time of hysteresis in the first embodiment of the present invention, (a) illustrating an equipotential line at the time of hysteresis, and (b) explaining a magnetic flux density on the optical axis of the second objective lens. Distributions B(z), and (c) illustrate the velocity of the charged particles at the time of hysteresis.

Fig. 5 is a schematic cross-sectional view showing another configuration of an insulating portion and a sample stage in the first embodiment of the present invention.

Fig. 6 is a view for explaining the adjustment of the aperture angle α of the first objective lens according to the first embodiment of the present invention, wherein (a) corresponds to the simulation data 3 (Vacc = -1 kV), and (b) corresponds to the simulation. Data 4 (Vacc = -10 kV, Vdecel = -9 kV), and (c) correspond to analog data 5 (Vacc = -10 kV, Vdecel = -9 kV, using the first objective lens).

Fig. 7 is a view for explaining the intersection of the deflection in the first embodiment of the present invention, in which the intensity ratio of the upper and lower deflection coils of the deflection coil is adjusted.

Fig. 8 is a schematic cross-sectional view showing a simplified state in which the first objective lens is not provided in the second embodiment of the present invention.

Fig. 9 is a cross-sectional view showing an example of a device configuration of an SEM according to a fourth embodiment of the present invention.

Next, an embodiment of the present invention will be described with reference to the drawings. The following figures are shown, and it should be noted that the size or aspect ratio is different from reality.

Further, the embodiments of the present invention shown below are exemplified as apparatuses or methods for realizing the technical idea of the present invention. The technical idea of the present invention does not limit the material, shape, structure, arrangement, and the like of the constituent components to the following objects. The technical idea of the present invention can be variously changed within the technical scope of the patent application.

[First Embodiment]

A schematic configuration of an SEM in the first embodiment of the present invention will be described with reference to Fig. 1 .

This SEM system includes an electron source 11 (charged particle source), an acceleration power source 14, a collecting lens 15, an objective lens ring 16, a two-stage deflecting coil 17, an objective lens (a first objective lens 18, and a second objective lens 26), and The electron line device of the detector 20. The accelerating power source 14 accelerates the primary electron beam 12 (charged particle beam) emitted from the electron source 11. The collecting lens 15 focuses the accelerated primary electron line 12. The objective lens aperture 16 removes unnecessary portions of the primary electron line 12. The two-stage deflection coil 17 performs a secondary element scan on the sample 23 on the primary electron beam 12. The objective lens (the first objective lens 18 and the second objective lens 26) focuses the primary electron beam 12 on the sample 23. The detector 20 detects the signal electrons 21 (secondary electrons 21a and reflected electrons 21b) emitted from the sample 23.

In the SEM, the control unit of the electromagnetic lens includes a first objective lens power supply 41, a second objective lens power supply 42, and a control device 45. The first objective lens power supply 41 converts the intensity of the first objective lens 18. The second objective lens power supply 42 converts the intensity of the second objective lens 26. The control device 45 controls the first objective lens power supply 41 and the second objective lens power supply 42.

The control device 45 independently controls the intensity of the first objective lens 18 and the intensity of the second objective lens 26. The control device 45 can simultaneously control the two lenses. Further, although not shown, each power source is connected to the control device 45 and can be adjusted.

As the electron source 11, a thermal electron emission type (hot electron source type) or an electric field emission type (Schottky type or cold cathode type) can be used. In the first embodiment, a crystal electron source such as LaB6 of a thermal electron emission type or a tungsten wire is used for the electron source 11. Between the electron source 11 and the anode plate (ground potential), For example, an acceleration voltage of -0.5 kV to -30 kV is applied. In the Veneta electrode 13, the potential of the electron source 11 is given a more negative potential. Thereby, the amount of the primary electron line 12 generated from the electron source 11 is controlled. Then, in front of the electron source 11, a crossing path is made as the first minimum diameter of the primary electron line 12. This minimum diameter is called the size So of the electron source.

The accelerated primary electron line 12 is focused by the collecting lens 15. Thereby, the size So of the electron source is reduced. The reduction ratio and the current applied to the sample 23 (hereinafter referred to as a detection current) are adjusted by the condenser lens 15. Then, the unused orbital electrons are removed by the objective lens aperture 16. The aperture angle α of the beam incident on the sample 23 and the detection current are adjusted in accordance with the aperture of the objective lens aperture 16.

The primary electron beam 12 passing through the aperture 16 of the objective lens passes through the two-stage deflection coil 17 for scanning, and then passes through the first objective lens 18. The general SEM uses the first objective lens 18 to apply the focus of the primary electron beam 12 to the sample 23. The SEM of Figure 1 can also be used as such.

In FIG. 1, the upper device 51 that emits the primary electron beam 12 toward the sample 23 is configured by the configuration from the electron source 11 to the first objective lens 18. Further, the lower device 52 is constituted by the potential plate 22 and a member disposed below the potential plate 22. The sample 23 is held in the lower device 52. The upper device 51 has a hole portion 18c through which the charged particle beam inside is finally emitted from the hole portion 18c. The hole portion 18c in the first embodiment is present in the first objective lens 18. The detector 20 is disposed between the upper device 51 and the lower device 52. More specifically, the detector 20 is mounted below the hole portion 18c. The detector 20 also has an opening through the primary electron line 12. The detector 20 is attached to the lower portion of the first objective lens 18 such that the hole portion 18c overlaps the opening portion. A complex detector 20 can also be mounted on the lower portion of the first objective lens 18. The installation of the complex detector 20 is such that the track of the primary electron beam 12 is not blocked, and at the same time, the detecting portion of the detector 20 does not have a gap outside the hole portion 18c of the upper device 51.

2 shows an example of a case where the focus of the primary electron beam 12 is applied to the sample 23 using the first objective lens 18. In particular, the sample 23 having a thickness was observed in this way.

On the other hand, when the second objective lens 26 is mainly used, the primary electron beam 12 passing through the first objective lens 18 is reduced in focus at the second objective lens 26. The second objective lens 26 is configured to have a low-impedance lens in order to have a strong magnetic field distribution in the vicinity of the sample 23 (see FIG. 4(b)). Moreover, the first objective lens 18 controls the aperture angle α, and adjusts the reduction ratio or the shape of the lens, and adjusts the depth of focus so that the image is convenient for viewing. That is, the first objective lens 18 is used to optimize the respective control values described above. Moreover, in the case where the second objective lens 26 focuses the primary electron beam 12, the first objective lens 18 may be assisted for focusing the primary electron beam 12.

Referring to Fig. 3, an action regarding a case where there is no hysteresis will be described.

In the case of no hysteresis, the potential plate 22 of Fig. 1 can also be removed. The setting of the sample 23 is preferably as close as possible to the second objective lens 26. More specifically, the sample 23 is preferably disposed near the upper portion of the second objective lens 26 such that the distance between the sample 23 and the upper portion (upper surface) of the second objective lens 26 is 5 mm or less.

The primary electron beam 12 is scanned on the sample 23 by energy accelerated by the acceleration power source 14. The secondary electrons 21a at this time wind the magnetic flux by the magnetic field of the second objective lens 26, and rise while spiraling. When the secondary electrons 21a are separated from the surface of the sample 23, they are diverged by the rapid decrease in the magnetic flux density from the start of the rotation, and are deflected by the guided electric field from the secondary electron detector 19 to be captured by the secondary electron detection. 19. That is, the secondary electron detector 19 is disposed such that the electric field generated from the secondary electron detector 19 attracts secondary electrons emitted from the sample by the charged particle beam. In this way, the secondary electrons 21a entering the secondary electron detector 19 can be increased.

Next, an outline of the case of hysteresis will be described using FIG. 4. In Fig. 4, (a) shows the equipotential lines at the time of hysteresis, (b) shows the magnetic flux density distribution B(z) on the optical axis of the second objective lens, and (c) shows the velocity of the charged particles at the time of hysteresis.

As shown in (b) of FIG. 4, the magnetic flux density on the optical axis of the second objective lens 26 is strongly distributed in the vicinity of the sample, and the objective lens becomes a low aberration lens. Then, if the sample 23 is given a negative power The primary electron beam 12 is decelerated near the sample 23 (see Fig. 4(c)). Since the speed of the primary electron beam 12 is slow, it is easily affected by the magnetic field, and in the vicinity of the sample 23, the second objective lens 26 becomes a strong lens. Therefore, when the sample 23 is given a negative potential, the second objective lens 26 becomes a lens having a lower aberration.

Further, the signal electron 21 is accelerated by the electric field by the hysteresis voltage of the sample 23, and the energy is widened, and enters the detector 20. Therefore, the detector 20 becomes high in sensitivity. Because of such a configuration, an electron beam device having high decomposition energy can be realized.

Moreover, the distance between the first objective lens 18 and the second objective lens 26 is 10 mm to 200 mm. It is preferably 30 mm to 50 mm. When the distance between the first objective lens 18 and the second objective lens 26 is closer to 10 mm, the detector 20 disposed directly under the first objective lens 18 can detect the reflected electrons 21b. However, the secondary electrons 21a at the time of hysteresis become easy to enter the first objective lens 18. When the distance between the first objective lens 18 and the second objective lens 26 is more than 10 mm, the secondary electrons 21a are easily detected by the detector 20. Further, when the gap between the first objective lens 18 and the second objective lens 26 is about 30 mm, the entry and exit of the sample 23 is very easy.

Next, the configuration of each component will be described in detail. First, the shape of the second objective lens 26 will be described with reference to Fig. 1 .

The magnetic pole forming the second objective lens 26 is composed of a central magnetic pole 26a, an upper magnetic pole 26b, a cylindrical side magnetic pole 26c, and a lower magnetic pole 26d which are the same as the central axis of the ideal optical axis of the primary electron beam 12. The center magnetic pole 26a has a small diameter in the vicinity of the upper portion. The upper portion of the center pole 26a is, for example, in the shape of a truncated cone of one or two stages. The lower portion of the center pole 26a has a cylindrical shape. The central axis of the lower portion of the center magnetic pole 26a has no through hole. The upper magnetic pole 26b has a tapered shape toward the center, and the center magnetic pole 26a is thinned toward the center of gravity, and has a disk shape. An opening having an opening diameter d is bored in the center of the upper magnetic pole 26b. The outer diameter D of the center pole 26a is larger than 6 mm and smaller than 14 mm. The relationship between the opening diameter d and the outer diameter D is d-D ≧ 4 mm.

Next, a specific example of the magnetic pole is shown. The upper surface of the sample side of both the center magnetic pole 26a and the upper magnetic pole 26b has the same height. The lower outer diameter of the center pole 26a is 60 mm. If the outer diameter is small, the magnetic permeability is lowered, which is not good.

When the center magnetic pole 26a is D=8 mm, the opening diameter d of the upper magnetic pole 26b is preferably 12 mm to 32 mm. The opening diameter d is more preferably from 14 mm to 24 mm. The larger the opening diameter d, the more the magnetic flux density distribution on the optical axis becomes flat like a mountain, the width becomes wider, and the AT (the amperage: the number of coil turns N [T] and the electric sulfur I) necessary for the focusing of the primary electron beam 12 The product of [A] can be reduced in size. However, if the relationship between the opening diameter d and the outer diameter D is d>4D, the aberration coefficient becomes large. Here, the opening diameter d of the upper magnetic pole 26b is 20 mm, and the outer diameter of the side magnetic pole 26c is 150 mm. Further, a through hole may be formed in the center of the axis of the center magnetic pole 26a.

Here, for example, in the case of the sample 23 having a thickness of 5 mm, even in the case where the primary electron beam 12 is focused with a high acceleration voltage of 30 kV, the outer diameter D is preferably larger than 6 mm and smaller than 14 mm. If D is too small, the magnetic pole is saturated and the primary electron beam 12 cannot be focused. On the other hand, if D is too large, the performance deteriorates. Further, if the difference in size between d and D is smaller than 4 mm, the magnetic poles are too close to become saturated, and the primary electron beam 12 cannot be focused. Further, when the distance between the first objective lens 18 and the second objective lens 26 is 10 mm or less, the workability is deteriorated. If the distance is longer than 200 mm, the aperture angle α tends to become large. In this case, in order to optimize the aberration, it becomes necessary to use the first objective lens 18 to make the α adjustment small, so that the operability is deteriorated.

Further, for example, when only the acceleration voltage of 5 kV or less is used, and the thickness of the sample 23 is thin, the outer diameter D is preferably 6 mm or less. However, for example, in the case where the acceleration voltage is 5 kV, if D is 2 mm, d is 5 mm, and the thickness of the sample 23 is 5 mm, and only the second objective lens 26 is used, the magnetic pole is saturated, and the primary electron beam 12 cannot be focused. . However, as long as the sample 23 is limited to be thin, the lens can be made higher.

In the method of applying a potential to the sample 23, an electrical insulating portion is sandwiched between a part of the magnetic poles of the second objective lens 26, and a part of the magnetic poles are floated from the ground potential, thereby providing hysteresis to the sample 23 and a part of the magnetic pole. Voltage. However, in this case, if an object other than the magnetic body is sandwiched in the magnetic circuit, the magnetic lens becomes weak. Further, if the hysteresis voltage becomes high, a discharge occurs. If the electrical insulating portion is thick, there is a problem that the magnetic lens is weak.

As shown in FIG. 1, a sealing portion 26f (for example, copper or aluminum or a Monel alloy) formed of a non-magnetic material may be disposed between the upper magnetic pole 26b and the center magnetic pole 26a. The sealing portion 26f vacuum-tightens the upper magnetic pole 26b and the center magnetic pole 26a by an O-ring or brazing. In the second objective lens 26, the vacuum side and the atmosphere side are hermetically separated by the upper magnetic pole 26b, the sealing portion 26f, and the center magnetic pole 26a. Although the upper magnetic pole 26b and the vacuum container are not shown, they are combined to make the O-ring airtight. Thereby, the second objective lens 26 becomes exposed to the atmosphere except for the surface on the vacuum side. Therefore, it becomes easy to cool the second objective lens 26.

In the vacuum container, although the second objective lens 26 can be placed, the degree of vacuum is deteriorated. When the coil portion 26e is provided on the vacuum side, it becomes a gas emission source. Further, if such a vacuum side is not hermetically separated from the atmosphere side, there is a problem that the sample moves when the gas is connected to the insulating plate 25 through the second objective lens 26 when the vacuum is introduced.

For example, the coil portion 26e can form a coil current of 6000 AT. If the coil heats up and becomes high temperature, this causes the film of the coil to melt and cause a short circuit. The cooling efficiency is improved by exposing the second objective lens 26 to the atmosphere. For example, the lower platform of the second objective lens 26 is made of aluminum, and the platform can be utilized as heat dissipation. Then, it becomes possible to cool the second objective lens 26 with an air cooling fan or water cooling or the like. Because of such airtight separation, it becomes possible to become the second objective lens 26 which is strongly excited.

The hysteresis portion will be described with reference to Fig. 1 .

On the second objective lens 26, an insulating plate 25 is provided. For example, the insulating sheet 25 is a polyimide film or a polyester film having a thickness of about 0.1 mm to 0.5 mm. Then, on it, a sample stage 24 having non-magnetic conductivity is provided. For example, the sample stage 24 is an aluminum plate having a bottom surface of 250 μm thick, and its edge is shaped to have a curved shape away from the insulating plate 25 near the edge end. The sample stage 24 is preferably filled with an insulating material 31 in a gap between the curved surface portion and the insulating sheet 25. Thereby, the withstand voltage between the second objective lens 26 and the sample stage 24 can be improved, and it can be used stably. The flat shape of the sample stage 24 is circular, and may be a flat shape, a rectangular shape, or the like, and various planar shapes.

The sample 23 was placed on the sample stage 24. The sample stage 24 is connected to the hysteresis power source 27 in order to impart a hysteresis voltage. For example, power source 27 is a conversion power supply capable of applying a 0V to -30kV output. The sample stage 24 is connected to a sample stage plate 29 which is an insulator in order to be movable from a vacuum external position. Thereby, the position of the sample 23 can be changed. The sample stage platform plate 29 is connected to the XY stage (not shown) and can be moved from the outside of the vacuum.

A conductive plate (hereinafter referred to as a potential plate 22) having a circular opening portion is disposed on the sample 23. The potential plate 22 is disposed perpendicular to the optical axis of the second objective lens 26. This potential plate 22 is disposed to be insulated from the sample 23. The potential plate 22 is connected to the potential plate power supply 28. For example, the potential board power supply 28 is a conversion power supply of 0V and -10kV to +10kV output. The diameter of the circular opening of the potential plate 22 may be about 2 mm to 20 mm. The diameter of the opening portion is preferably as long as 4 mm to 12 mm. Alternatively, a portion of the potential plate 22 through which the primary electron beam 12 or the signal electrons 21 pass may be formed into a conductive mesh shape. The mesh portion of the net is preferably fine to allow electrons to pass easily, so that the aperture ratio becomes large. This potential plate 22 is connected to the XYZ stage 61 so that it can be moved from the outside of the vacuum for adjusting the center axis. The XYZ stage 61 holds the potential plate 22 and moves the potential plate 22 in the X direction, the Y direction, and the Z direction.

The edge of the sample stage 24 has a thickness on the side of the potential plate 22. For example, if the potential plate 22 is flat, the potential plate 22 becomes closer to the sample stage 24 at the edge of the sample stage 24. So it becomes easier to put Electricity. Since the potential plate 22 has a shape away from the conductive sample stage 24 in the vicinity of the sample 23, the withstand voltage of the sample stage 24 can be increased.

The potential plate 22 is disposed from the sample 23 by a distance of about 1 mm to 15 mm so that it does not discharge. However, it is better to leave only one point to configure. This purpose is to overlap the decelerating electric field at a position where the magnetic field generated by the second objective lens 26 is strong. If the potential plate 22 is disposed farther from the sample 23 or without the potential plate 22, the primary electron beam 12 is decelerated before the second objective lens 26 is focused, reducing the effect of reducing the aberration.

The above description will be described with reference to Fig. 4 (Fig. 4 is an explanatory diagram corresponding to the simulation data 4 described later). Fig. 4(a) is a view showing the equipotential lines at the time of hysteresis.

If the opening of the potential plate 22 is too large, the distance between the sample 23 and the potential plate 22 is very close, and the equipotential line greatly escaps and distributes near the electron gun side in the opening of the potential plate 22. In this case, the primary electrons have decelerated before reaching the potential plate 22. The smaller the opening diameter of the potential plate 22, the effect of reducing electric field leakage. However, it is necessary to prevent the signal electronics 21 from being absorbed by the potential plate 22. Therefore, it is important to appropriately select the opening diameter of the potential plate 22 by adjusting the distance between the sample 23 and the potential plate 22 while adjusting the potential difference between the sample 23 and the potential plate 22 in the range where the discharge is not caused.

(b) of FIG. 4 illustrates a magnetic flux density distribution B(z) on the optical axis of the second objective lens 26. The vertical axis is B (z), the horizontal axis is a coordinate, and the surface of the second objective lens 26 is the origin (-0). It is shown that B(z) is sharply enlarged near the second objective lens 26.

Fig. 4(c) is a view showing the velocity of charged particles at the time of hysteresis. The velocity of the charged particle beam is shown to continue to decelerate directly in front of the sample.

By placing the potential plate 22 in the vicinity of the sample 23, the speed of the primary electrons does not change much until the vicinity of the potential plate 22. Then, once the electrons are from the vicinity of the potential plate 22 to the vicinity of the sample 23, the speed becomes slow and it is easily affected by the magnetic field. Because the magnetic field of the second objective lens 26 is close to the sample 23 It also became strong, and the effects of the two were added together, so that the vicinity of the sample 23 became a strong lens, and the lens having a small image was changed.

When the accelerating voltage is made as large as possible while the accelerating voltage is as large as possible, the irradiation electron energy can be made small, and the depth at which electrons enter the sample 23 can be made shallow. Thereby, it becomes possible to observe the surface shape of the sample with high decomposition. Moreover, the aberration can also be made small, so that SEM with high decomposition energy and low acceleration can be achieved.

In the first embodiment, the withstand voltage of the sample 23 and the potential plate 22 can be easily increased. The first objective lens 18 and the second objective lens 26 can have a distance of 10 mm to 200 mm. Therefore, for example, if the sample 23 is flat, and the distance between the sample 23 and the potential plate 22 is about 5 mm, the potential difference of about 10 kV can be relatively easily applied to the sample 23 and the potential plate 22. In the case of the sample 23 having a sharp portion, in order not to discharge, it is necessary to appropriately select the distance or the opening diameter.

In Fig. 5, a different arrangement example of the sample is shown. Further, as shown in FIG. 5, the cylindrical discharge preventing electrode 30 having a cylindrical shape and having the upper surface R is placed around the sample 23 on the sample stage 24, so that discharge is not easy. The cylinder discharge preventing electrode 30 smoothes the equipotential lines on the sample, and also helps to alleviate the deviation of the focus point by the gap of the sample 23.

In the detector 20 of the first embodiment, the semiconductor detector 20, the microchannel plate detector 20 (MCP), or the Robinson detector 20 of the phosphor light emission type is used. At least one of these is disposed directly under the first objective lens 18. In order to collect the secondary electrons 21a, the secondary electron detector 19 is disposed so as to be suspended above the sample 23.

The semiconductor detector 20, the MCP detector 20, or the Robinson detector 20 is connected to the sample side of the first objective lens 18, and is disposed within 3 cm of the optical axis. Preferably, the center of the detecting portion is placed on the optical axis, the detector 20 is used, and an opening portion through which electrons are passed is provided at the center thereof. It is set within 3cm of the optical axis. When there is hysteresis, the signal electrons are close to the optical axis.

The primary electron line 12 scans the sample 23 by applying an electron charge to the acceleration voltage of the acceleration power source 14 (Vacc) to subtract the value of the hysteresis voltage Vdecel (i.e., - (Vacc - Vdecel) [V]). on. At this time, the signal electron 21 is emitted from the sample 23. By accelerating the voltage and the value of the hysteresis voltage, the influence of accepting electrons is different. The reflected electrons 21b are accelerated by the electric field between the sample 23 and the potential plate 22 while receiving the rotational force by the magnetic field of the second objective lens 26. Therefore, the extension of the radiation angle of the reflected electrons 21b is narrowed, and it becomes easy to be incident on the detector 20. Further, the secondary electrons 21a are also accelerated by the electric field between the sample 23 and the potential plate 22 by the magnetic field of the second objective lens 26, and are incident on the detector located under the first objective lens 18. 20. Both the secondary electrons 21a and the reflected electrons 21b are accelerated because the energy is broadened and incident on the detector 20, causing the signal to become large.

In a general-purpose SEM, electrons are usually focused by a lens such as the first objective lens 18. Generally, the first objective lens 18 is designed to have high decomposition energy when the sample 23 is brought close to the first objective lens 18. However, the semiconductor detector 20 or the like has a thickness which must be away from the sample 23 from the first objective lens 18. Further, if the sample 23 is too close to the first objective lens 18, it is difficult for the secondary electrons 21a to enter the secondary electron detector 19 located outside the first objective lens 18. Therefore, in the general-purpose SEM, the semiconductor detector 20 is disposed directly under the first objective lens 18, and a semiconductor detector 20 having a thin portion passing through the primary electrons and having a small thickness is used. The sample 23 is placed with a slight gap to avoid hitting the detector 20. Since the sample 23 slightly leaves the first objective lens 18, high performance becomes difficult.

In the first embodiment, when the second objective lens 26 is used as the main lens, the sample 23 can be placed close to the second objective lens 26. Then, the distance between the first objective lens 18 and the second objective lens 26 can be separated. For example, if 30 mm is separated, the MCP detector 20 having a thickness of about 10 mm can be disposed directly under the first objective lens 18. Further, of course, the Robinson type detector 20 or the semiconductor detector 20 can be provided. There is also a method in which a reflecting plate is provided so that the signal electrons 21 contact the reflecting plate and the electrons generated or reflected therefrom are detected by the second secondary electron detector. A detector 20 of various signal electronics having the same function can be provided.

Next, the aperture angle α relating to the performance of the lens optical system will be described.

The beam diameter when the primary electron beam 12 is in contact with the sample 23 is referred to as a detection path. Use the following mathematical formula as a mathematical formula for evaluating the path. In addition, in the following mathematical formula, the number connecting "^" is an index.

[Number 1] Detection path Dprobe=sqrt[Dg^2+Ds^2+Dc^2+Dd^2][nm]

[Number 2] Reduced diameter of light source Dg=M1‧M2‧M3‧So=M‧So[nm]

[Number 3] Spherical aberration Ds=0.5Cs‧α^3[nm]

[Number 4] chromatic aberration Dc = 0.5Cc‧α‧△V/Vi[nm]

[Number 5] diffraction aberration: Dd = 0.75 × 1.22 × Lambda / α [nm]

Here, the size of the electron source is So, the reduction ratio of the first-stage condenser lens 15a is M1, the reduction ratio of the second-stage condenser lens 15b is M2, and the lens formed by the first objective lens 18 and the second objective lens 26 The reduction ratio is M3, the total reduction ratio M=M1×M2×M3, the spherical aberration coefficient is Cs, the chromatic aberration coefficient is Cc, the aperture angle of the primary electron line 12 on the sample surface is α, and the irradiation voltage (corresponding to once The voltage of the energy when the electron collides with the sample 23 is Vi, the voltage corresponding to the energy extension of the primary electron beam 12 is ΔV, and the wavelength of the electron is Lambda.

An example of the performance of the SEM using a thermionic emission electron source is described using simulation data. The first objective lens 18 of Fig. 1 is of a general lens type.

The case where the first objective lens 18 focuses the primary electron line 12 is shown. It corresponds to a general SEM.

The ΔV of the primary electron line 12 is 1 V, and the size So of the electron source is 10 μm. M1 × M2 = 0.00282. An objective lens aperture 16 having a aperture of 30 microns is provided to remove unused orbital electrons. By the aperture of the objective lens aperture 16, the aperture angle α of the beam incident on the sample 23 and the detection current can be adjusted. The WD is 6 mm and the acceleration voltage Vacc = -30 kV (Vi = 30 kV). If the simulation is calculated,

(analog data 1)

Dprobe = 4.4 nm, Dg = 1.59, Ds = 3.81, Dc = 0.916, Dd = 1.25, Cs = 54.5 mm, Cc = 10.6 mm, α = 5.19 mrad, M3 = 0.0575.

Next, a case where the electron beam 12 is focused once by the second objective lens 26 is displayed.

In the configuration of Fig. 1, the distance between the second objective lens 26 and the first objective lens 18 is 40 mm. In the second objective lens 26, D = 8 mm, d = 20 mm, and the aperture of the objective lens ring 16 for adjusting α is 21.8 μm. At this time, the condensing lens 15 is weakened so that the amount of detected current does not change as compared with the case of the general SEM. The other conditions are the same. If you simulate the performance at Z=-4mm,

(analog data 2)

Dprobe=1.44 nm, Dg=0.928, Ds=0.657, Dc=0.503, Dd=0.729, Cs=1.87 mm, Cc=3.391 mm, α=8.89 mrad, M3=0.0249.

As described above, when the second objective lens 26 is used, it is found that the performance of the SEM is greatly improved.

Moreover, Dg becomes smaller when the second objective lens 26 is focused than when the first objective lens 18 is focused. In the case of the same detection path, the condensing lens 15 can be made weaker than when the first objective lens 18 is focused. Therefore, when the second objective lens 26 is used, it is found that the current can be detected with a large current as compared with the general SEM.

Next, a case will be described in which the first objective lens 18 is not used, and the second objective lens 26 is used, and the acceleration voltage Vacc is -1 kV (Vi = 1 kV) (the hysteresis voltage is 0 V). In order not to change the detection current, the condensing lens 15 is adjusted (however, the orbit and beam amount of the electron gun are the same as those at -30 kV). The other conditions are the same. The following is the simulation data.

(analog data 3)

The results are shown in Figure 6(a).

Dprobe = 15.6 nm, Dg = 0.192, Ds = 0.657, Dc = 15.1, Dd = 3.99, Cs = 1.87 mm, Cc = 3.39 mm, α = 8.89 mrad, M3 = 0.0249.

In this case, Cs, Cc, α, M3, Ds and analog data 2 are the same. Since ΔV/Vi becomes larger, the detection path also becomes very large.

Next, an example in which the potential plate 22 is placed on the upper portion of the sample 23 will be described. The opening diameter of the potential plate 22 was Φ5 mm, and the sample 23 was Φ6 mm. The sample measurement surface was Z = -4 mm (the distance from the second objective lens 26). The distance between the sample stage 24 and the potential plate 22 was 8 mm, and the interval between the sample measurement surface and the potential plate 22 was 5 mm.

The analog acceleration voltage Vacc was -10 kV, the potential plate 22 was at a potential of 0 V, and the sample 23 was hysteresis with Vdecel = -9 kV, and the value of Vi = 1 kV. Here, the first objective lens 18 is not used, and only the second objective lens 26 is used for focusing.

(analog data 4)

The results are shown in Figure 6(b).

Dprobe=5.72 nm, Dg=0.924, Ds=2.93, Dc=4.66, Dd=1.26, Cs=0.260 mm, Cc=0.330 mm, α=28.2 mrad, M3=0.0247.

If the hysteresis voltage Vdecel is -9 kV, the energy of the irradiated electron becomes 1 keV. The detection path is greatly improved compared to when the acceleration voltage is -1 kV.

Next, in this condition, the first objective lens 18 is additionally used, and the intensity is appropriately adjusted (it is adjusted to about 0.37 times the necessary AT (amperometer) in the simulation data 1).

(analog data 5)

The results are shown in Figure 6(c).

Dprobe=4.03 nm, Dg=1.60, Ds=0.682, Dc=2.92, Dd=2.17, Cs=0.312 mm, Cc=0.357 mm, α=16.3 mrad, M3=0.0430.

Here, it can be seen that Dprobe is reduced. In the simulation data 4, Dc (= 4.66) is significantly larger. Here, the first objective lens 18 is slightly increased to be smaller by α. Dc is known from the above [number 4] and is subject to Cc and alpha effects. Although Cc becomes slightly larger, α becomes quite small. Therefore, Dc becomes smaller. It is known from [number 1] that Dprobe can be made smaller by using the first objective lens 18.

With respect to α = 8.89 mrad in Fig. 6 (a), α = 28.2 mrad in Fig. 6 (b), and becomes a large value by hysteresis. That is, it is known that the lens becomes strong. Moreover, it is known that Dd is also small. In Fig. 6(c), α is adjusted by the first objective lens 18, and it is understood that α becomes small.

Here, the most important thing is that although the aperture of the objective lens aperture 16 can be reduced to adjust α, in this case, the detection current has been reduced. However, even if the first objective lens 18 is used to adjust α, the detection current does not decrease. Therefore, the secondary electrons 21a and the reflected electrons 21b generated from the sample 23 are not reduced.

Moreover, if the sensitivity of the detector 20 is improved by the application of the hysteresis voltage, the detection current can be reduced. Furthermore, by reducing the aperture of the objective lens aperture 16, it is also possible to reduce α. Further, the reduction ratio M1 × M2 can also be reduced by the condenser lens 15. Therefore, in order to balance the adjustment of Dg, Ds, Dc, and Dd, there is a case where the detection diameter can be reduced to a smaller extent. The objective lens aperture 16 and the first objective lens 18 are optimal for the detection path.

Further, for the sample 23, a lens having a shallow depth of focus is used, regardless of whether the upper surface and the bottom surface of the concave and convex portions are inconsistent. In such a case, even if the detection paths are the same, the smaller the α, the deeper the depth of focus becomes, and the same can be clearly seen. The use of the first objective lens 18 can also be optimized so that the image is easily seen.

Next, a specific example of various methods of use of the apparatus of the first embodiment will be described.

In Fig. 6(b), for example, although the acceleration voltage Vacc is shown to be -10 kV, the sample 23 is simulated with hysteresis of -9 kV, but the acceleration voltage Vacc is -4 kV, and the sample 23 is -3.9 kV, and Vi = 100V. The ratio of the accelerating voltage to the hysteresis voltage is close to about 1, and the aberration coefficient can be reduced. Further, in the above description, the magnetic poles of the second objective lens 26 are D=8 mm and d=20 mm. However, if D=2, d=6, etc., even if the sample height or the acceleration voltage is limited, it is possible to obtain more. Good performance.

Further, in the case where the acceleration voltage is -10 kV and there is no hysteresis, although the secondary electrons 21a can be detected by the secondary electron detector 19, the semiconductor detector 20 cannot detect them. However, as long as the accelerating voltage is -20 kV and the hysteresis voltage is -10 kV, the secondary electrons 21a enter the semiconductor detector 20 with an energy of about 10 keV, making detection possible.

Further, when the accelerating voltage is -10.5 kV and the hysteresis voltage is -0.5 kV, the secondary electrons 21a cannot detect the sensitivity by the semiconductor detector 20. However, at this time, the secondary electrons 21a can be detected by the secondary electron detector 19. In other words, the secondary electrons 21a can be captured by the secondary electron detector 19 at a low hysteresis voltage, and if the hysteresis voltage gradually rises, the amount that can be detected by the semiconductor detector 20 side increases. As described above, the secondary electron detector 19 is also useful when the focus is adjusted while the hysteresis voltage is adjusted while being concentrated on the side.

The second objective lens 26 of the first embodiment is designed to focus 30 keV of primary electrons at Z = -4.5 mm. As long as the sample position is close to the second objective lens 26, for example, in a position of Z = -0.5 mm, a primary electron of 100 keV can also be focused. In the case where there is no hysteresis, the insulating plate 25 (insulating film) may not be disposed above the second objective lens 26. Therefore, the second objective lens 26 in this case enables the acceleration voltage to sufficiently focus on the primary electron line 12 of -100 kV. From the viewpoint of the sample closest to the magnetic pole of the objective lens, it is preferable that the second objective lens 26 is designed to focus the charged particle beam accelerated by any of the acceleration power sources from -30 kV to -10 kV to 0 mm to The height position of any of 4.5 mm.

A case where the acceleration voltage is -15 kV, the sample 23 is -5 kV, and -6 kV is applied to the potential plate 22 will be described. When the sample is in contact with the sample 23 once, it becomes 10 keV. The energy of the secondary electrons 21a emitted from the sample 23 is 100 eV or less. Since the potential of the potential plate 22 is 1 kV lower than the potential of the sample 23, the secondary electrons 21a cannot exceed the potential plate 22. Therefore, the secondary electrons 21a cannot be detected. The reflected electrons 21b having an energy of 1 keV or more emitted from the sample 23 can pass through the potential plate 22. Further, there is a potential difference of 6 kV between the potential plate 22 and the detector 20 under the first objective lens 18, and the reflected electrons 21b are accelerated into the detector 20. borrow By adjusting the voltage of the potential plate 22, the potential plate 22 can be used as an energy filter, and the signal electrons 21 can be accelerated to enhance the sensitivity.

Next, the case of the height (for example, 7 mm) of the sample will be described.

At this time, even if there is hysteresis, the thickness is measured from the upper magnetic pole 26b to the thickness of the insulating plate 25 and the sample stage 24 (for example, at a position of about Z = -7.55 mm). In this case, only the second objective lens 26 cannot focus the 30 keV primary electron line 12. However, even if the acceleration voltage is not lowered, the primary electron beam 12 can be focused by the first objective lens 18.

Further, depending on the height of the sample 23, there is a case where the performance is excellent only by the method in which the first objective lens 18 is focused (see Fig. 2). Thus, the sample 23 can be used to select the most appropriate method of use.

In the above description, the case where the distance between the first objective lens 18 and the second objective lens 26 is 40 mm is described, and the distance may be either a fixed type or a movable type. The larger the distance between the first objective lens 18 and the second objective lens 26, the smaller the reduction ratio M3. Then, the aperture angle α can be made larger. In this method, α can be adjusted.

Further, the hysteresis voltage is high and the signal electrons 21 pass through the vicinity of the optical axis, and it is easy to enter the opening portion of the primary electrons for passing through the detector 20. Therefore, the opening of the detector 20 can be small. The opening of the detector 20 is about Φ1 to Φ2 mm, and the sensitivity is good. The method of adjusting the position of the potential plate 22 from the optical axis by adjusting the opening diameter or height of the potential plate 22, and adjusting the track of the signal electron 21 to increase the sensitivity in order to contact the signal electron 21 with the detector 20. Further, E cross B (E x B) which continuously applies an electric field and a magnetic field is added between the first objective lens 18 and the second objective lens 26 to slightly bend the signal electron 21. Since the direction in which the primary electrons proceed is opposite to the direction in which the signal electrons 21 are performed, a weak electric field and a magnetic field can be set for slightly bending the signal electrons 21. As long as it is slightly bent, it does not enter the opening of the center of the detector 20, and it becomes possible to detect. Further, the electric field can be laterally placed with respect to the optical axis simply between the first objective lens 18 and the second objective lens 26. Even so, an electron is hard to be affected, as long as There are horizontal deviations that have less impact on the portrait. For example, the track of the signal electronics 21 can also be controlled by the electric field of the collecting electrode or the like of the secondary electron detector 19.

In Fig. 3, the second objective lens 26 is used as a main lens. When the sample stage 24 is at the ground potential, the secondary electrons 21a are detected by the secondary electron detector 19. The reflected electrons 21b are detected by the semiconductor detector 20 or the Robinson detector 20 or the like. When the sample 23 is separated from the detector 20 by about 10 mm to 20 mm, the sensitivity can be detected. However, if the separation is 40 mm, the amount of reflected electrons 21b that cannot enter the detector 20 increases, and the amount of detection of the reflected electrons 21b decreases. At this time, when the hysteresis voltage is applied to the sample 23, the secondary electrons 21a can be detected by the semiconductor detector 20 or the Robinson detector 20 or the like. Further, after the hysteresis voltage is applied, the extension of the reflected electrons 21b is suppressed, and the semiconductor detector 20, the Robinson detector 20, and the like can be detected with high sensitivity. Hysteresis can also be used in the absence of such a potential plate 22.

In FIG. 2, in the case where the sample 23 is thick, the case where the first objective lens 18 is used as the objective lens is shown. In Fig. 2, the XYZ stage 61 using the moving potential plate 22 can be used as a sample platform. More specifically, instead of the potential plate 22, the sample stage 24 is connected to the XYZ stage 61, and the sample stage 24 is movable in the X direction, the Y direction, and the Z direction. This XYZ stage 61 can also move the sample stage 24 in a direction close to the first objective lens 18. Thereby, the device is used in a general-purpose SEM. The reflected electrons 21b are detected by the semiconductor detector 20 or the Robinson detector 20 or the like, and the secondary electrons 21a are detected by the secondary electron detector 19. In general, although the sample 23 is at the ground potential, simple hysteresis can be performed (the hysteresis can be performed without the potential plate 22).

In addition, in FIG. 2, since the sample stage 24 is connected to the XYZ stage 61, the potential plate 22 and the sample stage plate 29 shown in FIG. 1 are unnecessary.

The apparatus configured only when the second objective lens power supply 42 is used is such that the distance between the second objective lens 26 and the sample measurement surface is closer than the distance between the first objective lens 18 and the sample measurement surface: only used The first objective lens power supply 41 is configured such that the distance between the first objective lens 18 and the sample measurement surface is closer to the distance between the second objective lens 26 and the sample measurement surface.

Further, as long as the measurement performance of the low performance is not required, the distance between the first objective lens 18 and the sample measurement surface is not necessarily made larger than the second objective lens when the first objective lens power supply 41 is used. 26 is closer to the distance of the sample measurement surface. The distance between the second objective lens 26 and the sample measurement surface may be made closer to the distance between the first objective lens 18 and the sample measurement surface. That is, the sample 23 can be disposed between the first objective lens 18 and the second objective lens 26. For example, as long as the measurement is performed at a low magnification, the sample 23 is placed in the vicinity of the second objective lens 26, and the first objective lens power supply 41 is used, and only the first objective lens 18 may be used.

In the case of hysteresis in Fig. 1, the potential of the sample 23 becomes negative. It is also possible to keep the sample 23 at the GND level and apply a positive voltage to the potential plate 22 (this technique is called a Boosting method). It is also possible to apply a negative voltage to the sample 23 and apply a positive potential to the potential plate 22 as a low acceleration SEM with good performance. For example, the first objective lens 18 is at the ground potential, and +10 kV is applied to the potential plate 22 to explain that the sample 23 is at the ground potential. The acceleration voltage is -30kV. When one electron passes through the first objective lens 18, it is 30 keV, accelerates from the first objective lens 18 toward the potential plate 22, and decelerates from the vicinity of the potential plate 22 toward the sample 23. Below, the simulation data for this case is displayed. The shape of the sample 23 and the potential plate 22 is the same as the case of the simulation data 4.

(analog data 6)

Dprobe=1.31 nm, Dg=0.904, Ds=0.493, Dc=0.389, Dd=0.710, Cs=1.29 mm, Cc=2.56 mm, α=9.13 mrad, M3=0.0244.

According to the above results, the detection path is improved as compared with the case without Boosting (analog data 2).

Although the signal electronics 21 accelerates between the sample 23 and the potential plate 22, it decelerates between the potential plate 22 and the detector 20. In the case where the detector 20 has the semiconductor detector 20, although the detector 20 can detect the opposite The electrons 21b are emitted, but since the semiconductor detector 20 is at the ground potential, the secondary electrons 21a cannot be detected. The secondary electrons 21a are detected by the secondary electron detector 19. The secondary electrons 21a can be detected by the semiconductor detector 20 as long as a hysteresis voltage is applied to the sample 23.

Next, with reference to Fig. 7, the intersection of the deflection trajectory by the adjustment of the two-stage deflection coil 17 will be described. The sample 23 was scanned by a two-stage deflection coil 17 in a secondary element. The electron source side of the two-stage deflection coil 17 is referred to as an upper stage deflection coil 17a, and the sample side is referred to as a lower stage deflection coil 17b.

As shown in FIG. 1, the two-stage deflection coil 17 is biased toward the power source 43 by the upper portion of the intensity of the upper deflection coil 17a, the power supply 44 is deflected below the intensity of the lower deflection coil 17b, and the upper power supply 43 and the lower deflection power supply are controlled. The control device 45 of 44 controls.

When viewed from the inside of the first objective lens 18, the upper-stage deflection coil 17a and the lower-stage deflection coil 17b are provided on the flying-in side of the primary electron beam 12 (the upstream of the lens main surface of the first objective lens 18 or the deflection of the lower stage) The case where the member is provided at the position of the main surface of the lens is provided on the outer magnetic pole 18b (see Fig. 7 and the symbol 18a in Fig. 7 shows the inner magnetic pole). The use current ratio of the upper stage bias power source 43 and the lower stage bias power source 44 is converted by the control means 45.

In Fig. 7(a), electrons form a track passing through the vicinity of the intersection of the optical axis and the principal surface of the first objective lens 18 by the two-stage deflection coil 17. In the case where the first objective lens 18 is used as the main lens (Fig. 2), it is set as such. When the second objective lens 26 is used as the main lens, as shown in Fig. 7(a), the deflection aberration is increased, and the image having a low magnification is skewed. When the second objective lens 26 is used as the main lens, as shown in FIG. 7(b), the intensity ratio of the upper deflection coil 17a and the lower deflection coil 17b adjusts electrons to form the main surface and the optical axis passing through the second objective lens 26. The track near the intersection. The adjustment is performed by adjusting the operating current ratio of the upper stage bias power supply 43 to the lower stage bias power supply 44. In this way, the skew of the portrait is reduced. In addition, adjusting the current ratio is not to shift the intersection point (intersection point) of the off-track, but to switch the coils with different numbers of turns in a sequential manner (multiple coils with different number of turns will be used) The coil is switched in a manner controlled by the control device) or in the case of an electrostatic lens (the manner in which the voltage ratio is used).

As shown in FIG. 7, the deflection coil 17 may be disposed in a gap in the first objective lens 18. The deflection coil 17 may also be located in the first objective lens 18, as shown in Fig. 1, or may be disposed on the upstream side of the charged particle beam. In the case of electrostatic deflection, a biasing electrode is used instead of the deflection coil.

[Second embodiment]

Referring to Fig. 8, a simple device configuration without the first objective lens 18 will be described.

Here, the semiconductor detector 20 is disposed below the lower deflection coil 17b. In the case where the first objective lens 18 is absent, the distance between the lower deflection coil 17b and the second objective lens 26 can be shortened. Such a device is appropriately miniaturized. In the second embodiment, the same apparatus can be used except that the first objective lens 18 is used in comparison with the first embodiment. The distance between the detector 20 and the second objective lens 26 is set by 10 mm to 200 mm.

In the apparatus of Fig. 8, the upper device 51 that ejects the primary electron beam 12 toward the sample 23 is constituted by the configuration of the electron source 11 to the lower deflection coil 17b. Further, the lower device 52 is configured by the potential plate 22 and a member disposed below the potential plate 22. The sample 23 is held in the lower device 52. The upper device 51 has a hole portion through which the charged particle beam inside is finally emitted from the hole portion. This hole portion exists in the lower stage deflection coil 17b. The detector 20 is mounted below the hole portion. The detector 20 also has an opening through the primary electron beam 12, and the detector 20 is attached to the lower portion of the lower deflection coil 17b so that the hole overlaps the opening.

[Third embodiment]

In the third embodiment, an electric field emission type structure is used for the electron source 11. The electric field emission type has higher luminance than the thermal electron emission type, and the size of the light source is small, and the ΔV of the primary electron beam 12 is also small, and the chromatic aberration surface is also advantageous. In the third embodiment, the second-stage condenser lens 15b of the first embodiment is the same as that of the first embodiment, and the electron source portion is an electric field. The injection type has no first-stage condenser lens 15a. The ΔV of the primary electron line 12 is 0.5 eV, and the size of the electron source is So = 0.1 μm. If Z=-4 mm, the acceleration voltage Vacc is -30 kV, and the performance of the first objective lens 18 is OFF, it is as follows.

(analog data 7)

Dprobe=0.974 nm, Dg=0.071, Ds=0.591, Dc=0.248, Dd=0.730, Cs=1.69 mm, Cc=3.36 mm, α=8.88 mrad, M3=0.0249.

The electric field emission type electron source has higher luminance than the thermal electron emission type. Further, since the condensing lens 15 becomes a one-stage, the detection current is increased as compared with the case of the thermo-electronic emission type. Not only that, but the detection path becomes smaller. Dd is shown as the maximum value.

In the following example, the acceleration voltage Vacc is -1 kV (Vi = 1 kV). The first objective lens 18 is not used, and the second objective lens 26 is used to focus the electrons. The condensing lens 15 is adjusted so that the detection current does not change. In this case, as described below.

(analog data 8)

Dprobe=8.48 nm, Dg=0.071, Ds=0.591, Dc=7.45, Dd=4.00, Cs=1.68 mm, Cc=3.36 mm, α=8.88 mrad, M3=0.0249.

As described above, in the thermal electron emission type (analog data 3), since Dprobe = 15.6 nm, a method of obtaining an electric field emission type electron source is preferable.

Next, an example in which the potential plate 22 and the sample 23 are disposed as shown in FIG. 1 will be described. The measurement surface of the sample was Z = -4 mm.

The acceleration voltage Vacc was -10 kV, the potential plate 22 was at a potential of 0 V, and the sample 23 was -9 kV (Vi = 1 kV), and the calculation result was shown below. Here, the first objective lens 18 is not used, and only the second objective lens 26 is used for focusing.

(simulated data 9)

Dprobe=3.92 nm, Dg=0.071, Ds=2.90, Dc=2.32, Dd=1.26, Cs=0.260 mm, Cc=0.330 mm, α=28.1 mrad, M3=0.0248.

In the aberration, Ds is the largest value. Here, since the electron velocity close to the sample 23 is slow, it is easily affected by the magnetic field, and the magnetic flux density is close to the sample 23 and has a large value to form a strong lens close to the sample 23, and α becomes excessively large. Since Ds is proportional to the cube of α, Ds becomes larger. The first objective lens 18 can be used for improvement.

Next, data showing the case where the intensity is optimally adjusted using the first objective lens 18 (adjusted to about 0.31 times the AT (amperometer) in the analog data 1) is displayed.

(analog data 10)

Dpnobe=2.68 nm, Dg=0.103, Ds=1.03, Dc=1.68, Dd=1.82, Cs=0.279 mm, Cc=0.344 mm, α=19.5 mrad, M3=0.0358.

Although only the aberration coefficient is deteriorated, the detection path can be further improved by adjusting α.

Here, the aperture of the objective lens locus 16 is the same as 21.8 μm in comparison with the first embodiment. In the case of the electric field emission type, the aperture diameter can be made small because of the bright luminance and the condenser lens 15 which becomes one stage. Therefore, the diffraction aberration becomes the main aberration.

According to the present embodiment described above, the second objective lens 26 is used to perform hysteresis to form a lens system in which α is increased, and a lens system that reduces diffraction aberration is formed. That is, in the charged particle beam device, the second objective lens having low aberration can be realized. By detecting the signal electronics with high sensitivity, it is possible to achieve low-cost, high-decomposition energy.

According to this embodiment, since the signal electron does not pass through the first objective lens, the detecting portion can be formed into a simple structure. Since the magnetic flux density on the optical axis of the second objective lens is close to the strong distribution of the sample, the objective lens becomes a low aberration lens. A negative potential is applied to the sample to form a strong lens close to the sample, and the objective lens becomes a lower aberration lens. The electric field of the hysteresis voltage of the sample, because of the signal The electrons are accelerated, the energy is broadened and enters the detector, and the detector becomes highly sensitive. According to the above configuration, the charged particle beam device having high decomposition energy can be realized.

[Fourth embodiment]

Next, a device configuration of the SEM (an example of a charged particle device) according to the fourth embodiment will be described. In the following description, the same configurations as those of the above-described embodiment (including changes in the respective configurations) are denoted by the same reference numerals, and detailed description thereof will be omitted.

The general configuration of the first embodiment described above is also the same as that of the fourth embodiment described below. The upper device 51 is disposed in a configuration from the electron source 11 to the first objective lens 18. The primary electron beam 12 is emitted from the upper device 51 toward the sample 23. The lower device 52 is provided with a second objective lens 26. The sample 23 is held in the lower device 52. The secondary electron detector 19 and the detector 20 are also provided in the same manner. The secondary electron detector 19 is provided for detecting the signal electrons 21 of the secondary electrons 21a.

Fig. 9 is a cross-sectional view showing an example of a device configuration of an SEM according to a fourth embodiment of the present invention.

In the SEM shown in FIG. 9, the upper device 51, the second objective lens 26, the secondary electron detector 19, the potential plate 22, and the like are provided in the same manner as the configuration shown in FIG. In this SEM, hysteresis is performed. As described above, in the fourth embodiment, the SEM basically has the same configuration as that shown in FIG. 1. In the fourth embodiment, the SEM is different from the configuration shown in FIG. 1 in that the detector 720 for detecting the reflected electrons 21b is disposed on the lower surface of the potential plate 22 (the surface on the sample 23 side).

At the detector 720, a hole portion passing through the primary electron line 12 or the secondary electron 21a is provided. As far as the detector 720 is concerned, for example, a microchannel plate, a Robinson detector, a semiconductor detector or the like is used.

For example, in the apparatus shown in Fig. 9, the detector 720 is disposed at a position closer to the sample 23. Since the solid angle of the incident reflected electrons 21b is large and the detection sensitivity of the reflected electrons 21b is improved, the observation of the sample 23 can be performed with higher sensitivity.

In the fourth embodiment, the detector 20 may be disposed above the potential plate 22. The size of the hole portion 720a of the detector 720 can also be as small as the passage of the primary electron line 12. For example, the hole portion 720a is a circular through hole whose diameter is preferably, for example, about 1 mm to 2 mm. By reducing such a hole portion 720a, most of the reflected electrons 21b become unable to pass above the potential plate 22. Therefore, since most of the signal electrons 21 incident on the secondary electron detector 19 or the detector 20 become the secondary electrons 21a, they are not mixed with the reflected electron images, and a clear secondary electron image can be obtained.

〔other〕

The present invention has been described in the above embodiments, but it should be understood that the description and drawings are not intended to limit the invention. For example, a straight line is drawn from the map of the charged particle source to the orbit of the charged particle line of sample 23. However, if you enter an energy filter or the like, the track will bend. There are also cases where the orbital curvature of the charged particle beam is curved. Such a case is also included in the technical scope described in the patent application. Further, in the case of the charged particles of the negative ions in the ion beam microscope, the same considerations as the electrons can be applied in the same manner as in the first embodiment. In the case of ions, since the mass is heavy compared with electrons, the collecting lens 15 can be an electrostatic lens, the deflecting coil 17 is electrostatically deflected, and the first objective lens 18 is an electrostatic lens. Moreover, the objective lens 26 uses a magnetic lens.

According to the present invention described above, an ion beam apparatus such as an electron beam apparatus such as an EPMA or an electron beam drawing apparatus as a charged particle beam apparatus or an ion beam microscope can be easily applied. In the case of using charged particles of positive ions like a He ⁺ ion source, a positive accelerating power source 14 is used as an accelerating power source for the ion source. In the case where hysteresis is not performed, the same apparatus as that of the first embodiment can be constructed. In the case where the hysteresis is performed, the hysteresis power source 27 is switched to the positive power source, and the same device as the above-described embodiment can be constructed. At this time, as long as the potential plate 22 is at the ground potential, the signal electron 21 emitted from the sample 23 can be pulled back to the sample 23 because it is a negative charge. In this case, the potential plate power supply 28 can be adjusted such that the potential of the potential plate 22 becomes higher than the potential of the sample 23. For example, it is preferable that the accelerating power source 14 of the charged particle beam is +7 kV, the upper device 51 is at the ground potential, the potential plate 22 is +6 kV, and the sample 23 is +5 kV. If so, the signal electronics 21 can be detected by the detector 720 disposed at the position of the potential plate 22.

All the features disclosed in the above embodiments and variations are not to be considered as limiting. The scope of the present invention is not limited by the foregoing description, and all changes within the meaning and scope of the scope of the patent application are considered to be included in the scope of the patent application.

11‧‧‧Electronic source

12‧‧‧One electronic line

13‧‧‧Weinite electrode

14‧‧‧Accelerated power supply

15‧‧‧ Concentrating lens

15a‧‧‧First concentrating lens

15b‧‧‧second stage condenser lens

16‧‧‧ Objective lens aperture

17‧‧‧Two-stage deflection coil

17a‧‧‧Upper deflection coil

17b‧‧‧lower deflection coil

18‧‧‧First objective lens

18c‧‧‧ Hole Department

19‧‧‧Secondary electronic detector

20‧‧‧Detector

21‧‧‧ Signal Electronics

21a‧‧‧Secondary electronics

21b‧‧‧Reflective electrons

22‧‧‧potential plate

23‧‧‧ samples

24‧‧‧Testing table

25‧‧‧Insulation board

26‧‧‧Second objective lens

26a‧‧‧Center magnetic pole

26b‧‧‧Upper magnetic pole

26c‧‧‧ side magnetic pole

26d‧‧‧lower magnetic pole

26e‧‧‧ coil

26f‧‧‧ Sealing Department

27‧‧‧hysteresis power supply

28‧‧‧potentiometer power supply

29‧‧‧Sampling platform plate

31‧‧‧Insulation

41‧‧‧First objective lens power supply

42‧‧‧Second objective lens power supply

43‧‧‧The upper section is biased towards the power supply

44‧‧‧The lower section is biased towards the power supply

45‧‧‧Control device

51‧‧‧Upper device

52‧‧‧ Lower device

61‧‧‧XYZ platform

Claims (22)

A charged particle beam device comprising: a charged particle source; an acceleration power source provided to accelerate a charged particle beam emitted from the charged particle source and connected to the charged particle source; and a first objective lens disposed on the charged object relative to the sample a charged particle beam is focused on the sample on the incident side of the particle beam; the second objective lens is disposed on the opposite side of the incident side of the charged particle beam with respect to the sample, and the charged particle beam is focused on the sample; The objective lens power supply converts the intensity of the first objective lens; and the second objective lens power supply converts the intensity of the second objective lens; wherein, when only the first objective lens power source is used, the sample is disposed on the first objective lens Between the second objective lens and the second objective lens power supply, the distance between the second objective lens and the sample measurement surface is closer than the distance between the first objective lens and the sample measurement surface. A charged particle beam device comprising: a charged particle source; an acceleration power source provided to accelerate a charged particle beam emitted from the charged particle source and connected to the charged particle source; and a first objective lens disposed on the charged object relative to the sample a charged particle beam is focused on the sample on the incident side of the particle beam; the second objective lens is disposed on the opposite side of the incident side of the charged particle beam with respect to the sample, and the charged particle beam is focused on the sample; An objective lens power supply that transforms the intensity of the first objective lens; a second objective lens power supply for converting the intensity of the second objective lens; and a first control device for controlling the first objective lens power supply and the second objective lens power supply; wherein, when only the first objective lens power supply is used, the first The distance between the objective lens and the sample measurement surface is closer than the distance between the second objective lens and the sample measurement surface; when the second objective lens power supply is used, the distance between the second objective lens and the sample measurement surface is larger than that of the first objective lens The distance of the sample measurement surface is closer. A charged particle beam device comprising: a charged particle source; an acceleration power source provided to accelerate a charged particle beam emitted from the charged particle source and connected to the charged particle source; and a first objective lens disposed on the charged object relative to the sample a charged particle beam is focused on the sample on the incident side of the particle beam; the second objective lens is disposed on the opposite side of the incident side of the charged particle beam with respect to the sample, and the charged particle beam is focused on the sample; An objective lens power supply for transforming the intensity of the first objective lens; a second objective lens power supply for transforming the intensity of the second objective lens; and a first control device for controlling the first objective lens power supply and the second objective lens power supply; The first control device has a function of independently controlling the intensity of the first objective lens and the intensity of the second objective lens and performing simultaneous control; the first objective lens is only used when the first objective lens power source is used. The distance from the measurement surface of the sample is closer than the distance between the second objective lens and the measurement surface of the sample; When only the second objective lens power supply is used, the distance between the second objective lens and the sample measurement surface is closer than the distance between the first objective lens and the sample measurement surface. A charged particle beam device having: a charged particle source; an acceleration power source disposed to accelerate a charged particle beam emitted from the charged particle source and coupled to the charged particle source; and an objective lens to focus the charged particle beam a charged particle beam device of the sample; the objective lens includes: a first objective lens disposed on an incident side of the charged particle beam with respect to a sample; and a second objective lens disposed at an incident particle line with respect to the sample a side opposite to the side; the charged particle beam device includes: a first objective lens power supply that converts the intensity of the first objective lens; a second objective lens power supply that converts the intensity of the second objective lens; and a first control device that controls the a first objective lens power supply and the second objective lens power supply; wherein the first control device has: a function of independently controlling the intensity of the first objective lens and the intensity of the second objective lens; and simultaneously controlling the first objective lens The function of the intensity and the intensity of the second objective lens; focusing the charged particle beam on the sample only by the first objective lens Only the second objective lens focusing the charged particle beam on the function of the sample; and Simultaneously using the first objective lens and the second objective lens, and converting, by the first objective lens, an aperture angle of the charged particle beam incident on the sample, such that the aperture angle is focused on the charged particle beam only by the second objective lens The sample is smaller to focus on the function of the sample. The charged particle beam device according to any one of claims 1 to 4, comprising: a two-stage deflecting member that scans the charged particle beam by a secondary element, and the two-stage deflecting member has an upper deflecting member and a lower deflecting member; a power source that converts the strength or voltage of the upper deflection member; a lower stage biases the power source to change the strength or voltage of the lower deflection member; and a second control device that controls the upper deflection power source and the lower deflection power source; wherein, from the first objective lens As seen from the inside of the lens, the upper deflecting member and the lower deflecting member are disposed on the charged particle line flying-in side; and the second control device converts the used current ratio or the used voltage ratio of the upper-stage bias power source and the lower-stage bias power source. The charged particle beam device according to any one of claims 1 to 4, comprising: a two-stage deflecting member that scans the charged particle beam by a secondary element, and the two-stage deflecting member has an upper deflecting member and a lower deflecting member; a power source that converts the strength or voltage of the upper deflection member; a lower stage biases the power source to change the strength or voltage of the lower deflection member; and a second control device that controls the upper deflection power source and the lower deflection power source; wherein, from the first objective lens Viewed from the inside of the lens, the upper deflection member and the lower deflection member are disposed on the fly-in side of the charged particle beam; the lower deflection member is a plurality of coils each having a different number of turns; the second control device controls the plurality of coils use. The charged particle beam device according to claim 5 or 6, wherein the deflecting member is a deflecting coil or a deflecting electrode. The charged particle beam device according to any one of claims 1 to 7, comprising: a hysteresis power source, and a negative potential is applied to the sample to decelerate the charged particle beam. The charged particle beam device according to any one of claims 1 to 8, wherein the second objective lens can make the acceleration power source -30 kV to - from the sample closest to the magnetic pole of the second objective lens. The charged particle beam accelerated by either of 10 kV is focused on the height position of any of 0 mm to 4.5 mm. The charged particle beam device according to any one of claims 1 to 9, comprising: an insulating plate disposed on the second objective lens; and a conductive sample stage disposed on the insulating plate; wherein the second The objective lens and the conductive sample stage are insulated. The charged particle beam device according to claim 10, wherein the conductive sample stage has a shape separated from the insulating plate near the edge portion. The charged particle beam device according to claim 10 or 11, wherein an insulating material is filled between the insulating plate and the conductive sample stage. The charged particle beam device according to any one of claims 10 to 12, comprising: a potential plate having an opening, disposed in an upper portion of the conductive sample stage; wherein the potential plate is provided with a ground potential and positive Potential, or negative potential. The charged particle beam device according to claim 13, wherein the opening portion of the potential plate has a circular shape or a mesh shape having a diameter of 2 mm to 20 mm. In the charged particle beam apparatus according to claim 13 or 14, the potential plate has a shape separated from the conductive sample stage at a position other than the vicinity of the sample. The charged particle beam device according to any one of claims 13 to 15, comprising: a moving unit that moves the potential plate. The charged particle beam device of claim 16, wherein the mobile unit is a platform connected to the potential plate; and the platform can carry the sample. The charged particle beam device according to any one of claims 1 to 17, wherein the magnetic pole forming the second objective lens has a central magnetic pole whose central axis coincides with an ideal optical axis of the charged particle beam; an upper magnetic pole; a cylindrical shape a side magnetic pole; and a lower magnetic pole in the shape of a disk; wherein, in the upper portion of the sample side close to the central magnetic pole, a diameter near the upper portion is a small shape, and a lower portion of the central magnetic pole has a cylindrical shape; The center forms a magnetic pole of a circular opening portion and is in the shape of a disk having a thin disk shape toward the center toward the center of the center magnetic pole. The charged particle beam device according to claim 18, wherein the surface of the sample side of the center magnetic pole and the surface of the sample side of the upper magnetic pole have the same height. The charged particle beam device according to claim 18 or 19, wherein the upper edge diameter D of the central magnetic pole is larger than 6 mm and smaller than 14 mm, and the diameter d of the circular opening portion of the upper magnetic pole and the upper edge diameter of the central magnetic pole The relationship of D is: dD ≧ 4mm. The charged particle beam device according to any one of claims 1 to 20, wherein a thermoelectron source type element is used as the charged particle source. A scanning electron microscope comprising the charged particle beam device according to any one of claims 1 to 21.