TW201712366A - Optical laminate - Google Patents

Optical laminate Download PDF

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TW201712366A
TW201712366A TW105125494A TW105125494A TW201712366A TW 201712366 A TW201712366 A TW 201712366A TW 105125494 A TW105125494 A TW 105125494A TW 105125494 A TW105125494 A TW 105125494A TW 201712366 A TW201712366 A TW 201712366A
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layer
film
resin
substrate
phase difference
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TW105125494A
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小島理
武田健太郎
村上奈穗
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日東電工股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/28Interference filters
    • G02B5/285Interference filters comprising deposited thin solid films
    • G02B5/286Interference filters comprising deposited thin solid films having four or fewer layers, e.g. for achieving a colour effect
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3083Birefringent or phase retarding elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Laminated Bodies (AREA)
  • Liquid Crystal (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

Provided is an optical laminate in which color unevenness resulting from an antireflection film is prevented, the optical laminate being thin and excellent in neutral black reflection hue. The optical laminate includes: a first substrate; a second substrate arranged on one side of the first substrate; an antireflection film arranged between the first substrate and the second substrate; and a resin layer arranged between the first substrate and the second substrate to cover the antireflection film, in which: the antireflection film includes a polarizer and a retardation layer bonded to the polarizer; and the resin layer has a storage modulus of elasticity at 25 DEG C of 1*10<SP>6</SP> Pa or more.

Description

光學積層體 Optical laminate

本發明係關於一種光學積層體。 The present invention relates to an optical laminate.

先前以來已經將各種光學膜用於以液晶顯示裝置及有機EL顯示裝置為代表之圖像顯示裝置,以實現視角特性、反射特性之改善。例如,於具有高反射性金屬層之有機EL顯示裝置中,易於出現外界光之反射或背景之反射等問題。因此,有時使用具有λ/4板之圓偏光板作為抗反射膜。 Various optical films have been used for image display devices typified by liquid crystal display devices and organic EL display devices to improve viewing angle characteristics and reflection characteristics. For example, in an organic EL display device having a highly reflective metal layer, problems such as reflection of external light or reflection of a background are apt to occur. Therefore, a circularly polarizing plate having a λ/4 plate is sometimes used as an antireflection film.

另一方面,於上述圖像顯示裝置中,歸因於多年使用之端部之顏色不均勻之出現成為問題。已知使用具有光彈性係數較小之光學膜防止由光學膜引起之顏色不均勻之方法,並且經常使用環烯烴系膜作為光彈性係數較小之光學膜。亦可使用環烯烴系膜作為λ/4板。然而,由於其材料中固有之波長分散性,環烯烴系膜涉及不能利用膜單獨獲得中性黑色反射色相(neutral black reflection hue)之問題。於使用環烯烴系膜之同時嘗試獲得中性黑色反射色相之情形時,需要進而使用起λ/2板之作用之光學膜,並且因此產生圖像顯示裝置之生產性降低並且其厚度增加之問題。 On the other hand, in the above image display device, the occurrence of color unevenness due to the end portion used for many years becomes a problem. It is known to use a method having an optical film having a small photoelastic coefficient to prevent color unevenness caused by an optical film, and a cycloolefin film is often used as an optical film having a small photoelastic coefficient. A cycloolefin film can also be used as the λ/4 plate. However, due to the wavelength dispersion inherent in the material, the cycloolefin film relates to the problem that the neutral black reflection hue cannot be obtained by using the film alone. When attempting to obtain a neutral black reflection hue while using a cycloolefin film, it is necessary to further use an optical film which functions as a λ/2 plate, and thus there is a problem that the productivity of the image display device is lowered and the thickness thereof is increased. .

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2011-154176號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2011-154176

本發明係為了解決上述先前之問題而進行者,並且本發明之主要目的在於提供一種光學積層體,其防止由抗反射膜引起之顏色不均勻,所述光學積層體較薄並且中性黑色反射色相優異。 The present invention has been made to solve the above-mentioned problems, and a main object of the present invention is to provide an optical laminate which prevents color unevenness caused by an anti-reflection film which is thin and neutral black reflection Excellent hue.

本發明之光學積層體具備:第一基板;第二基板,其配置於該第一基板之單側;抗反射膜,其配置於該第一基板與該第二基板之間;及樹脂層,其於該第一基板與該第二基板之間,以覆蓋該抗反射膜之方式配置;且該抗反射膜包括偏光元件及與該偏光元件接著之相位差層;並且該樹脂層之於25℃之儲存彈性模數為1×106Pa以上。 The optical layered body of the present invention includes: a first substrate; a second substrate disposed on one side of the first substrate; an antireflection film disposed between the first substrate and the second substrate; and a resin layer The first substrate and the second substrate are disposed to cover the anti-reflection film; and the anti-reflection film includes a polarizing element and a phase difference layer adjacent to the polarizing element; and the resin layer is 25 The storage elastic modulus of °C is 1 × 10 6 Pa or more.

於一個實施形態中,上述相位差層起λ/4板之作用。 In one embodiment, the phase difference layer functions as a λ/4 plate.

於一個實施形態中,上述相位差層顯示出逆分散波長特性。 In one embodiment, the phase difference layer exhibits an inverse dispersion wavelength characteristic.

於一個實施形態中,上述相位差層包括聚碳酸酯系樹脂膜。 In one embodiment, the retardation layer includes a polycarbonate resin film.

於一個實施形態中,上述相位差層含有光彈性係數30×10-12Pa以下之樹脂。 In one embodiment, the retardation layer contains a resin having a photoelastic coefficient of 30 × 10 -12 Pa or less.

於一個實施形態中,上述相位差層之遲相軸與上述偏光元件之吸收軸所成之角度為35°~55°。 In one embodiment, the angle between the slow phase axis of the retardation layer and the absorption axis of the polarizing element is 35° to 55°.

於一個實施形態中,上述偏光元件與上述相位差層經由接著劑層而積層,並且該接著劑層之厚度為1μm以下。 In one embodiment, the polarizing element and the retardation layer are laminated via an adhesive layer, and the thickness of the adhesive layer is 1 μm or less.

根據本發明,藉由具備包括偏光元件及與偏光元件接著之相位差層之抗反射膜,並且以用具有特定儲存彈性模數之樹脂層覆蓋該抗反射膜之方式而構成,可獲得薄型且防止顏色不均勻之光學積層體。另外,根據本發明,構成抗反射膜之相位差層之材料可選自寬範圍(例如,可使用光彈性係數相對較大之材料或可形成具有逆分散波長 特性之相位差層之材料)。因此,可獲得利用單層形成相位差層之同時中性黑色反射色相優異之光學積層體。 According to the present invention, by providing an anti-reflection film including a polarizing element and a retardation layer next to the polarizing element, and covering the anti-reflection film with a resin layer having a specific storage elastic modulus, a thin shape can be obtained. An optical laminate that prevents uneven color. Further, according to the present invention, the material constituting the phase difference layer of the antireflection film may be selected from a wide range (for example, a material having a relatively large photoelastic coefficient may be used or a reverse dispersion wavelength may be formed). The material of the phase difference layer of the characteristic). Therefore, an optical layered body excellent in neutral black reflection hue while forming a phase difference layer by a single layer can be obtained.

10‧‧‧第1基板 10‧‧‧1st substrate

20‧‧‧抗反射膜 20‧‧‧Anti-reflective film

21‧‧‧偏光元件 21‧‧‧Polarized components

22‧‧‧相位差層 22‧‧‧ phase difference layer

23‧‧‧黏著劑層 23‧‧‧Adhesive layer

24‧‧‧保護膜 24‧‧‧Protective film

30‧‧‧樹脂層 30‧‧‧ resin layer

40‧‧‧第2基板 40‧‧‧2nd substrate

100‧‧‧光學積層體 100‧‧‧Optical laminate

圖1係根據本發明之一個實施形態之光學積層體之概略剖面圖。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing an optical layered body according to an embodiment of the present invention.

以下,說明本發明之實施形態,但本發明不限於該等實施形態。 Hereinafter, embodiments of the present invention will be described, but the present invention is not limited to the embodiments.

(用語及記號之定義) (Definition of terms and symbols)

於本說明中使用之用語及記號之定義如以下所述。 The definitions of terms and symbols used in this specification are as follows.

(1)折射率(nx、ny、nz) (1) Refractive index (nx, ny, nz)

「nx」表示面內折射率為最大之方向(即遲相軸方向)之折射率,「ny」表示面內與遲相軸垂直之方向(即進相軸方向)之折射率,並且「nz」表示厚度方向之折射率。 "nx" represents the refractive index of the direction in which the in-plane refractive index is the largest (ie, the direction of the slow axis), and "ny" represents the refractive index of the direction perpendicular to the axis of the late phase (ie, the direction of the phase axis), and "nz" "Represents the refractive index in the thickness direction.

(2)面內相位差(Re) (2) In-plane phase difference (Re)

「Re(λ)」係指以於23℃下之波長λ nm之光測定之面內相位差。例如,「Re(550)」係指以於23℃下之波長550nm之光測定之面內相位差。於層(膜)之厚度由d(nm)表示時,Re(λ)根據等式:Re(λ)=(nx-ny)×d確定。 "Re(λ)" refers to the in-plane phase difference measured by light at a wavelength of λ nm at 23 °C. For example, "Re(550)" refers to the in-plane phase difference measured by light having a wavelength of 550 nm at 23 °C. When the thickness of the layer (film) is represented by d (nm), Re (λ) is determined according to the equation: Re (λ) = (nx - ny) × d.

(3)厚度方向之相位差(Rth) (3) Phase difference in the thickness direction (Rth)

「Rth(λ)」係指以於23℃下之波長λ nm之光測定之厚度方向的相位差。例如,「Rth(550)」係指以於23℃下之波長550nm之光測定之厚度方向的相位差。於層(膜)之厚度由d(nm)表示時,Rth(λ)根據等式:Rth(λ)=(nx-nz)×d確定。 "Rth(λ)" means a phase difference in the thickness direction measured by light having a wavelength of λ nm at 23 °C. For example, "Rth(550)" means a phase difference in the thickness direction measured by light having a wavelength of 550 nm at 23 °C. When the thickness of the layer (film) is represented by d (nm), Rth (λ) is determined according to the equation: Rth (λ) = (nx - nz) × d.

(4)Nz係數 (4) Nz coefficient

Nz係數根據等式Nz=Rth/Re確定。 The Nz coefficient is determined according to the equation Nz = Rth / Re.

(5)雙折射率(△nxy) (5) Birefringence (Δn xy )

雙折射率△nxy根據等式:△nxy=nx-ny確定。 The birefringence Δn xy is determined according to the equation: Δn xy = nx-ny.

A.光學積層體之整體構成A. The overall composition of the optical laminate

圖1係根據本發明之一個實施形態之光學積層體之概略剖面圖。本實施形態之光學積層體100具備:第一基板10;第二基板40,其配置於第一基板10之單側;抗反射膜20,其配置於第一基板10與第二基板40之間;及樹脂層30,其形成於第一基板10與第二基板40之間,覆蓋並且密封抗反射膜20。抗反射膜20包括:偏光元件21及相位差層22。相位差層22與偏光元件21接著。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing an optical layered body according to an embodiment of the present invention. The optical layered body 100 of the present embodiment includes a first substrate 10, a second substrate 40 disposed on one side of the first substrate 10, and an anti-reflection film 20 disposed between the first substrate 10 and the second substrate 40. And a resin layer 30 formed between the first substrate 10 and the second substrate 40 to cover and seal the anti-reflection film 20. The anti-reflection film 20 includes a polarizing element 21 and a phase difference layer 22. The phase difference layer 22 is followed by the polarizing element 21.

本發明之發明人已經發現,於先前之抗反射膜(即僅利用黏著劑層將相位差層及偏光元件彼此貼合而構成之抗反射膜)中,相位差層之相位差(尤其是端部之相位差)由於因溫度變化引起之相位差層之收縮而隨時間變化,並且該相位差之變化係造成顏色不均勻之原因。於本發明中,相位差層與偏光元件藉由接著而積層,並且包括相位差層之抗反射膜由樹脂層覆蓋。因此,可獲得防止顏色不均勻之光學積層體。更詳細而言,於具有如上所述構成之光學積層體中,抑制相位差層之變形,並且由溫度變化引起之相位差層之膨脹及收縮較小。於此種光學積層體中,相位差層之相位差之變化較小,並且防止隨時間出現之顏色不均勻。另外,如稍後描述,將樹脂層之儲存彈性模數E'設定於特定範圍內使此種效果更明顯。 The inventors of the present invention have found that the phase difference (especially the end) of the phase difference layer in the conventional anti-reflection film (i.e., the anti-reflection film formed by laminating the phase difference layer and the polarizing element with each other only by the adhesive layer) The phase difference of the portion varies with time due to shrinkage of the phase difference layer due to temperature change, and the change in the phase difference causes color unevenness. In the present invention, the phase difference layer and the polarizing element are laminated by the subsequent layer, and the anti-reflection film including the phase difference layer is covered with the resin layer. Therefore, an optical laminate which prevents color unevenness can be obtained. More specifically, in the optical layered body having the above configuration, the deformation of the phase difference layer is suppressed, and the expansion and contraction of the phase difference layer due to the temperature change are small. In such an optical laminate, the phase difference of the phase difference layer is small, and color unevenness occurring over time is prevented. Further, as described later, setting the storage elastic modulus E' of the resin layer to a specific range makes the effect more conspicuous.

較佳為相位差層與偏光元件彼此直接接著。即,較佳為於相位差層與偏光元件之間不存在除接著劑層以外之層(例如,保護膜等膜、黏著劑層等)。於本發明之光學積層體中,上述相位差層亦可起到偏光元件之保護層之作用。當如上所述之亦可起偏光元件之保護層之作用之相位差層直接與偏光元件接著時,可獲得薄型光學積層體。 Preferably, the phase difference layer and the polarizing element are directly adjacent to each other. That is, it is preferable that a layer other than the adhesive layer (for example, a film such as a protective film, an adhesive layer, or the like) is not present between the retardation layer and the polarizing element. In the optical laminate of the present invention, the retardation layer may function as a protective layer of the polarizing element. When the retardation layer which functions as a protective layer of the polarizing element as described above is directly followed by the polarizing element, a thin optical laminate can be obtained.

上述抗反射膜可經由黏著劑層23而積層於第一基板上。另外,上述抗反射膜20可具備保護膜24,其配置於偏光元件21之與相位差層22相反之側上。較佳為將上述抗反射膜20配置為使偏光元件21(及保 護膜24)可以相位差層22為基準之第二基板40側上。另外,於圖像顯示裝置等中使用本發明之光學積層體100之情形時,較佳為將上述抗反射膜20配置為使偏光元件21(及保護膜24)可以相位差層22為基準之觀察者側上。例如,於形成起λ/4板之作用之相位差層之情形時,可將偏光元件配置為與相位差層(λ/4板)相比更接近觀察者側。另外,可將第二基板40配置於觀察者側上之同時配置本發明之光學積層體100。 The anti-reflection film may be laminated on the first substrate via the adhesive layer 23. Further, the anti-reflection film 20 may include a protective film 24 disposed on the opposite side of the polarizing element 21 from the phase difference layer 22. Preferably, the anti-reflection film 20 is disposed such that the polarizing element 21 (and The protective film 24) can be on the side of the second substrate 40 with respect to the phase difference layer 22. When the optical layered body 100 of the present invention is used in an image display device or the like, it is preferable that the anti-reflection film 20 is disposed such that the polarizing element 21 (and the protective film 24) can be based on the phase difference layer 22 On the observer's side. For example, in the case of forming a phase difference layer functioning as a λ/4 plate, the polarizing element can be disposed closer to the observer side than the phase difference layer (λ/4 plate). Further, the optical layered body 100 of the present invention can be disposed while the second substrate 40 is disposed on the observer side.

B.抗反射膜B. Anti-reflection film

如上所述,抗反射膜包括偏光元件及相位差層。相位差層配置於偏光元件之單側上並且可起偏光元件之保護層之作用。於一個實施形態中,上述相位差層為單層。實際上,可將保護膜配置於偏光元件之與相位差層相反之側上。 As described above, the anti-reflection film includes a polarizing element and a phase difference layer. The phase difference layer is disposed on one side of the polarizing element and functions as a protective layer of the polarizing element. In one embodiment, the phase difference layer is a single layer. Actually, the protective film can be disposed on the side of the polarizing element opposite to the phase difference layer.

(偏光元件) (polarizing element)

可採用任何適合之偏光元件作為上述偏光元件。例如,用以形成偏光元件之樹脂膜可為單層樹脂膜,或者可為兩層以上之積層體。 Any suitable polarizing element can be employed as the above polarizing element. For example, the resin film for forming the polarizing element may be a single layer resin film, or may be a laminate of two or more layers.

作為包括單層樹脂膜之偏光元件之具體例,可列舉:藉由對聚乙烯醇(PVA)系樹脂膜、部分甲醛化PVA系樹脂膜、乙烯-乙酸乙烯酯共聚物系部分皂化膜等親水性高分子膜進行利用碘或二色性染料等二色性物質之染色處理以及延伸處理獲得之偏光元件;PVA之脫水處理產物或聚氯乙烯之脫氯化氫處理產物等多烯系配向膜。較佳為由於光學特性優異,故而使用藉由將PVA系樹脂膜用碘染色並且將所得物單軸延伸而獲得之偏光元件。 Specific examples of the polarizing element including the single-layer resin film include hydrophilicity of a polyvinyl alcohol (PVA) resin film, a partially formaldehydeized PVA resin film, and an ethylene-vinyl acetate copolymer partial saponified film. The polymer film is a polarizing element obtained by dyeing and stretching treatment of a dichroic substance such as iodine or a dichroic dye; a polyene-based alignment film such as a dehydrated product of PVA or a dehydrochlorination product of polyvinyl chloride. It is preferable to use a polarizing element obtained by dyeing a PVA-based resin film with iodine and uniaxially stretching the resultant, since it is excellent in optical characteristics.

上述利用碘之染色係藉由例如將PVA系樹脂膜浸漬於碘之水溶液中來進行。上述單軸延伸之延伸倍率較佳為3倍~7倍。延伸可於染色處理後進行,或者可一面染色一面進行。另外,染色可於已經進行延伸之後進行。根據需要對PVA系樹脂膜進行膨潤處理、交聯處理、洗淨處理、乾燥處理等。例如,於染色之前將PVA系樹脂膜浸入水中進 行水洗滌,藉此可將於PVA系樹脂膜之表面上之污染物或抗黏連劑洗淨,不僅如此,亦可使PVA系樹脂膜膨潤並且防止染色不均勻等。 The above dyeing by iodine is carried out, for example, by immersing a PVA-based resin film in an aqueous solution of iodine. The stretching ratio of the uniaxial stretching is preferably from 3 times to 7 times. The extension can be carried out after the dyeing treatment, or can be carried out while dyeing one side. In addition, the dyeing can be carried out after the stretching has been carried out. The PVA-based resin film is subjected to a swelling treatment, a crosslinking treatment, a washing treatment, a drying treatment, and the like as needed. For example, immersing the PVA resin film in water before dyeing By washing with water, the contaminant or anti-blocking agent on the surface of the PVA-based resin film can be washed, and the PVA-based resin film can be swollen and uneven dyeing can be prevented.

作為使用積層體獲得之偏光元件之具體例,可列舉使用樹脂基材與於樹脂基材上積層之PVA系樹脂層(PVA系樹脂膜)之積層體獲得之偏光元件,或樹脂基材與塗佈於樹脂基材上形成之PVA系樹脂層之積層體獲得之偏光元件。藉由使用樹脂基材與經由塗佈於樹脂基材上形成之PVA系樹脂層之積層體獲得之偏光元件可藉由例如以下方法製作,該方法包括:將PVA系樹脂溶液塗佈於樹脂基材上;將溶液乾燥以於樹脂基材上形成PVA系樹脂層,從而提供樹脂基材與PVA系樹脂層之積層體;將積層體延伸並染色以使PVA系樹脂層成為偏光元件。於本實施形態中,延伸通常包括將積層體浸入硼酸水溶液中之狀態下延伸積層體。延伸進而可包括,根據需要,於硼酸水溶液中延伸之前,積層體於高溫(例如,95℃以上)之空氣中延伸。所獲得之樹脂基材/偏光元件之積層體可原樣使用(即,樹脂基材可用作偏光元件之保護膜),亦可使用如下所述獲得之產物:將樹脂基材自樹脂基材/偏光元件之積層體剝離,並且將根據目的之任何適合之保護膜積層於該剝離面上。此種偏光元件之製造方法之細節記載於例如日本專利特開2012-73580號公報中。該公報之全部內容作為參考引用於本文中。 Specific examples of the polarizing element obtained by using the laminated body include a polarizing element obtained by using a laminate of a resin substrate and a PVA-based resin layer (PVA-based resin film) laminated on the resin substrate, or a resin substrate and a coating. A polarizing element obtained by laminating a PVA-based resin layer formed on a resin substrate. The polarizing element obtained by using a resin substrate and a laminate body via a PVA-based resin layer formed on the resin substrate can be produced, for example, by a method comprising: applying a PVA-based resin solution to a resin base The solution is dried to form a PVA-based resin layer on a resin substrate to provide a laminate of a resin substrate and a PVA-based resin layer, and the laminate is stretched and dyed to form a PVA-based resin layer as a polarizing element. In the present embodiment, the stretching generally includes extending the laminate in a state where the laminate is immersed in an aqueous boric acid solution. The extension may further comprise extending the laminate in air at a high temperature (e.g., above 95 °C) prior to extending in the aqueous boric acid solution as needed. The laminate of the obtained resin substrate/polarizing element can be used as it is (that is, the resin substrate can be used as a protective film for a polarizing element), and a product obtained as follows can be used: a resin substrate from a resin substrate/ The laminate of the polarizing element is peeled off, and any suitable protective film according to the purpose is laminated on the peeling surface. The details of the manufacturing method of such a polarizing element are described, for example, in Japanese Laid-Open Patent Publication No. 2012-73580. The entire contents of this publication are incorporated herein by reference.

上述偏光元件之厚度較佳為15μm以下,更佳為13μm以下,進而較佳為10μm以下,特別較佳為8μm以下。偏光元件之厚度之下限於一個實施形態中為2μm,並且於另一個實施形態中為3μm。 The thickness of the polarizing element is preferably 15 μm or less, more preferably 13 μm or less, further preferably 10 μm or less, and particularly preferably 8 μm or less. The thickness of the polarizing element is limited to 2 μm in one embodiment, and is 3 μm in another embodiment.

上述偏光元件較佳為於波長380nm~780nm之範圍中之任何波長均顯示出吸收二色性。偏光元件之單軸透射率較佳為44.0%~45.5%,更佳為44.5%~45.0%。 The polarizing element preferably exhibits absorption dichroism at any wavelength in the range of 380 nm to 780 nm. The uniaxial transmittance of the polarizing element is preferably from 44.0% to 45.5%, more preferably from 44.5% to 45.0%.

上述偏光元件之偏光度較佳為98%以上,更佳為98.5%以上,進而較佳為99%以上。 The polarizing element has a degree of polarization of preferably 98% or more, more preferably 98.5% or more, still more preferably 99% or more.

(相位差層) (phase difference layer)

相位差層可包括根據目的具有任何適合之光學特性及/或機械特性之相位差膜。相位差層代表性而言具有遲相軸。於一個實施形態中,於相位差層之遲相軸與偏光元件之吸收軸所成之角度θ較佳為35°~55°,更佳為38°~52°,進而較佳為42°~48°,特別較佳為約45°。於角度θ在此種範圍內時,藉由使用相位差層作為如稍後描述之λ/4板,可獲得具有極其優異之圓偏光特性(作為結果,非常優異之抗反射特性)之抗反射膜。 The retardation layer may comprise a retardation film having any suitable optical and/or mechanical properties depending on the purpose. The phase difference layer typically has a slow phase axis. In one embodiment, the angle θ between the slow phase axis of the phase difference layer and the absorption axis of the polarizing element is preferably 35° to 55°, more preferably 38° to 52°, and further preferably 42°. 48°, particularly preferably about 45°. When the angle θ is in such a range, by using the phase difference layer as the λ/4 plate as described later, antireflection having extremely excellent circularly polarized light characteristics (as a result, very excellent antireflection property) can be obtained. membrane.

上述相位差層之折射率特性較佳為顯示出nx>nynz之關係。於一個實施形態中,相位差層可起λ/4板之作用。於此種情形時,相位差層之面內相位差Re(550)較佳為80nm~200nm、更佳為100nm~180nm、進而較佳為110nm~170nm。再者此處「ny=nz」不僅包括ny與nz彼此完全相等之情形,而且包括ny與nz實質上相等之情形。因此,於不損害本發明之效果之範圍內,可為ny<nz之情形。 The refractive index characteristic of the phase difference layer is preferably such that nx>ny The relationship between nz. In one embodiment, the phase difference layer can function as a λ/4 plate. In this case, the in-plane retardation Re (550) of the retardation layer is preferably from 80 nm to 200 nm, more preferably from 100 nm to 180 nm, still more preferably from 110 nm to 170 nm. Furthermore, "ny=nz" here includes not only the case where ny and nz are completely equal to each other, but also the case where ny and nz are substantially equal. Therefore, it is possible to have a condition of ny < nz within a range not impairing the effects of the present invention.

上述相位差層之雙折射率△nxy較佳為0.0025以上,更佳為0.0028以上。另一方面,雙折射率△nxy之上限為例如0.0060,較佳為0.0050。於將雙折射率最佳化為此種範圍時,可獲得較薄並且具有所需光學特性之相位差層。 The birefringence Δn xy of the retardation layer is preferably 0.0025 or more, and more preferably 0.0028 or more. On the other hand, the upper limit of the birefringence Δn xy is , for example, 0.0060, preferably 0.0050. When the birefringence is optimized to such a range, a phase difference layer which is thin and has desired optical characteristics can be obtained.

上述相位差層之Nz係數較佳為0.9~3,更佳為0.9~2.5,進而較佳為0.9~1.5,特別較佳為0.9~1.3。於滿足此種關係時,於將獲得之光學積層體用於圖像顯示裝置之情形時,可實現非常優異之反射色相。 The Nz coefficient of the retardation layer is preferably from 0.9 to 3, more preferably from 0.9 to 2.5, still more preferably from 0.9 to 1.5, still more preferably from 0.9 to 1.3. When such a relationship is satisfied, a very excellent reflected hue can be achieved when the optical laminate obtained is used in an image display device.

上述相位差層可顯示出相位差值隨著測定光之波長之增加而增加之逆分散波長特性,可顯示出相位差值隨著測定光之波長之增加而降低之正波長分散特性,或者可顯示出甚至當測定光之波長變化時相位差值亦幾乎不變化之平坦波長分散特性。相位差層較佳為顯示出逆分散波長特性。於此情形時,相位差層之比率Re(450)/Re(550)較佳為 0.8以上且未達1,更佳為0.8以上且0.95以下。利用此種構成,可實現非常優異之抗反射特性,並且具體而言,可僅利用該相位差層單層實現中性黑色反射色。於本發明中,即便於形成顯示出逆分散波長特性之相位差層時,相位差層之相位差之變化亦較小並且防止隨時間出現之顏色不均勻。 The phase difference layer can exhibit an inverse dispersion wavelength characteristic in which the phase difference value increases as the wavelength of the measurement light increases, and can exhibit a positive wavelength dispersion characteristic in which the phase difference value decreases as the wavelength of the measurement light increases, or It shows a flat wavelength dispersion characteristic in which the phase difference value hardly changes even when the wavelength of the light is changed. The retardation layer preferably exhibits an inverse dispersion wavelength characteristic. In this case, the ratio of the retardation layer Re(450)/Re(550) is preferably 0.8 or more and less than 1, more preferably 0.8 or more and 0.95 or less. With such a configuration, very excellent anti-reflection characteristics can be achieved, and in particular, a neutral black reflection color can be realized by using only one single layer of the phase difference layer. In the present invention, even when a phase difference layer exhibiting an inverse dispersion wavelength characteristic is formed, a change in phase difference of the phase difference layer is small and color unevenness occurring over time is prevented.

上述相位差層含有光彈性係數較佳為30×10-12Pa以下,更佳為10×10-12Pa至20×10-12Pa,進而較佳為1×10-12Pa至10×10-12Pa之樹脂。只要光彈性係數在此種範圍內時,則可形成於加熱時產生收縮應力之情形時較不易產生相位差變化之相位差層。 The retardation layer contains a photoelastic coefficient of preferably 30 × 10 -12 Pa or less, more preferably 10 × 10 -12 Pa to 20 × 10 -12 Pa, and still more preferably 1 × 10 -12 Pa to 10 × 10 -12 Pa resin. When the photoelastic coefficient is within such a range, a phase difference layer which is less likely to cause a phase difference change when a contraction stress is generated during heating can be formed.

上述相位差層之厚度較佳為50μm以下,更佳為20μm~50μm。 The thickness of the retardation layer is preferably 50 μm or less, more preferably 20 μm to 50 μm.

上述相位差層可包括任何適合之樹脂膜。作為構成樹脂膜之樹脂之代表例,可列舉:環狀烯烴系樹脂、聚碳酸酯系樹脂、纖維素系樹脂、聚酯系樹脂、聚乙烯醇系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚醚系樹脂、聚苯乙烯系樹脂、丙烯酸系樹脂。其中,較佳為聚碳酸酯系樹脂。 The above retardation layer may include any suitable resin film. Typical examples of the resin constituting the resin film include a cyclic olefin resin, a polycarbonate resin, a cellulose resin, a polyester resin, a polyvinyl alcohol resin, a polyamine resin, and a polysiloxane. An amine resin, a polyether resin, a polystyrene resin, or an acrylic resin. Among them, a polycarbonate resin is preferred.

使用任何適合之聚碳酸酯系樹脂作為上述聚碳酸酯系樹脂。於一個實施形態中,可使用含有源自二羥基化合物之結構單元之聚碳酸酯系樹脂。作為二羥基化合物,例如,可列舉由以下通式(1)表示之二羥基化合物。 Any suitable polycarbonate resin is used as the above polycarbonate resin. In one embodiment, a polycarbonate-based resin containing a structural unit derived from a dihydroxy compound can be used. The dihydroxy compound is, for example, a dihydroxy compound represented by the following formula (1).

(於上述通式(1)中,R1~R4各自獨立地表示氫原子、經取代之或未經取代之碳數1~碳數20之烷基、經取代之或未經取代之碳數6~碳數20之環烷基、或者經取代或未經取代之碳數6~碳數20之芳基,X表示經取代之或未經取代之碳數~碳數10之伸烷基、經取代之或未經取代之碳數6~碳數20之伸環烷基、或者經取代之或未經取代之碳數6~碳數20之伸芳基,並且m及n分別獨立地表示0~5之整數。) (In the above formula (1), R 1 to R 4 each independently represent a hydrogen atom, a substituted or unsubstituted carbon number of 1 to 20 carbon atoms, a substituted or unsubstituted carbon a 6- to 20-membered cycloalkyl group, or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, and X represents a substituted or unsubstituted carbon number to a C 10 alkyl group a substituted or unsubstituted carbon 6 to a carbon number 20 cycloalkyl group, or a substituted or unsubstituted carbon number 6 to a carbon number 20 exoaryl group, and m and n are independently Indicates an integer from 0 to 5.)

作為由通式(1)表示之二羥基化合物之具體例,可列舉:9,9-雙(4-羥基苯基)芴、9,9-雙(4-羥基-3-甲基苯基)芴、9,9-雙(4-羥基-3-乙基苯基)芴、9,9-雙(4-羥基-3-正丙基苯基)芴、9,9-雙(4-羥基-3-異丙基苯基)芴、9,9-雙(4-羥基-3-正丁基苯基)芴、9,9-雙(4-羥基-3-第二丁基苯基)芴、9,9-雙(4-羥基-3-第三丁基苯基)芴、9,9-雙(4-羥基-3-環己基苯基)芴、9,9-雙(4-羥基-3-苯基苯基)芴、9,9-雙(4-(2-羥基乙氧基)苯基)芴、9,9-雙(4-(2-羥基乙氧基)-3-甲基苯基)芴、9,9-雙(4-(2-羥基乙氧基)-3-異丙基苯基)芴、9,9-雙(4-(2-羥基乙氧基)-3-異丁基苯基)芴、9,9-雙(4-(2-羥基乙氧基)-3-第三丁基苯基)芴、9,9-雙(4-(2-羥基乙氧基)-3-環己基苯基)芴、9,9-雙(4-(2-羥基乙氧基)-3-苯基苯基)芴、9,9-雙(4-(2-羥基乙氧基)-3,5-二甲基苯基)芴、9,9-雙(4-(2-羥基乙氧基)-3-第三丁基-6-甲基苯基)芴、9,9-雙(4-(3-羥基-2,2-二甲基丙氧基)苯基)芴。 Specific examples of the dihydroxy compound represented by the general formula (1) include 9,9-bis(4-hydroxyphenyl)fluorene and 9,9-bis(4-hydroxy-3-methylphenyl). Ruthenium, 9,9-bis(4-hydroxy-3-ethylphenyl)anthracene, 9,9-bis(4-hydroxy-3-n-propylphenyl)anthracene, 9,9-bis(4-hydroxyl 3-isopropylphenyl)anthracene, 9,9-bis(4-hydroxy-3-n-butylphenyl)anthracene, 9,9-bis(4-hydroxy-3-second butylphenyl) Indole, 9,9-bis(4-hydroxy-3-t-butylphenyl)anthracene, 9,9-bis(4-hydroxy-3-cyclohexylphenyl)anthracene, 9,9-bis(4- Hydroxy-3-phenylphenyl)anthracene, 9,9-bis(4-(2-hydroxyethoxy)phenyl)anthracene, 9,9-bis(4-(2-hydroxyethoxy)-3 -methylphenyl)anthracene, 9,9-bis(4-(2-hydroxyethoxy)-3-isopropylphenyl)anthracene, 9,9-bis(4-(2-hydroxyethoxy) )-3-isobutylphenyl)indole, 9,9-bis(4-(2-hydroxyethoxy)-3-tert-butylphenyl)anthracene, 9,9-bis(4-(2) -hydroxyethoxy)-3-cyclohexylphenyl)anthracene, 9,9-bis(4-(2-hydroxyethoxy)-3-phenylphenyl)anthracene, 9,9-bis(4- (2-hydroxyethoxy)-3,5-dimethylphenyl)anthracene, 9,9-bis(4-(2-hydroxyethoxy)-3-tert-butyl-6-methylbenzene芴,9,9-bis(4-(3-hydroxy-2,2-dimethylpropoxy)benzene ) Fluorene.

上述聚碳酸酯系樹脂除源自上述二羥基化合物之結構單元外,可含有異山梨醇(isosorbide)、異甘露醇(isomannide)、異艾杜醇(isoidide)、螺環二醇、二噁烷二醇、二乙二醇(DEG)、三乙二醇(TEG)、聚乙二醇(PEG)、雙酚等源自二羥基化合物之結構單元。 The polycarbonate resin may contain isosorbide, isomannide, isoidide, spiro diol, dioxane, in addition to the structural unit derived from the above dihydroxy compound. A structural unit derived from a dihydroxy compound such as a diol, diethylene glycol (DEG), triethylene glycol (TEG), polyethylene glycol (PEG), or bisphenol.

含有源自二羥基化合物之結構單元之聚碳酸酯系樹脂記載於例如日本專利5204200號、日本專利特開2012-67300號公報、日本專利第3325560號、WO2014/061677A中。該專利文獻之公開內容作為參考 引用於本文中。 A polycarbonate-based resin containing a structural unit derived from a dihydroxy compound is described in, for example, Japanese Patent No. 5204200, Japanese Patent Laid-Open No. Hei. No. 2012-67300, Japanese Patent No. 3325560, and WO2014/061677A. The disclosure of this patent document serves as a reference Quoted in this article.

於一個實施形態中,可使用含有低聚芴結構單元之聚碳酸酯系樹脂。作為含有低聚芴結構單元之聚碳酸酯系樹脂,例如,可列舉含有由以下通式(2)表示之結構單元及/或由以下通式(3)表示之結構單元之樹脂。 In one embodiment, a polycarbonate-based resin containing an oligomeric fluorene structural unit can be used. The polycarbonate resin containing an oligomeric fluorene structural unit is, for example, a resin containing a structural unit represented by the following general formula (2) and/or a structural unit represented by the following general formula (3).

(上述通式(2)及通式(3)中,R5及R6各自獨立地表示直接鍵、或者經取代或未經取代之碳數1~4之伸烷基(較佳為主鏈上之碳數為2~3之伸烷基),R7表示直接鍵、或者經取代之或未經取代之碳數1~4之伸烷基(較佳為主鏈上之碳數為1~2之伸烷基),R8~R13各自獨立地表示氫原子、經取代或未經取代之碳數1~10(較佳為1~4,更佳為1~2)之烷基、經取代或未經取代之碳數4~10(較佳為4~8,更佳為4~7)之芳基、經取代或未經取代之碳數1~10(較佳為1~4,更佳為1~2)之醯基、經取代或未經取代之碳數1~10(較佳為1~4,更佳為1~2)之烷氧基、經取代或未經取代之碳數1~10(較佳為1~4,更佳為1~ 2)之芳氧基、經取代或未經取代之碳數1~10(較佳為1~4,更佳為1~2)之醯氧基、經取代之或未經取代之胺基、經取代或未經取代之碳數1~10(較佳為1~4)之乙烯基、經取代之未取經代之碳數1~10(較佳為1~4)之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基,並且R8~R13中之至少兩個相鄰基可彼此結合以形成環。) (In the above formula (2) and formula (3), R 5 and R 6 each independently represent a direct bond or a substituted or unsubstituted alkylene group having 1 to 4 carbon atoms (preferably the main chain) The carbon number is 2 to 3 alkyl groups, and R 7 represents a direct bond or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms (preferably having a carbon number of 1 in the main chain) The alkyl group of ~2, R 8 to R 13 each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms (preferably 1 to 4, more preferably 1 to 2) carbon atoms. The substituted or unsubstituted carbon number of 4 to 10 (preferably 4 to 8, more preferably 4 to 7), substituted or unsubstituted carbon number 1 to 10 (preferably 1~) 4, more preferably 1 to 2) thiol, substituted or unsubstituted alkoxy group having 1 to 10 carbon atoms (preferably 1 to 4, more preferably 1 to 2), substituted or not The substituted aryloxy group having 1 to 10 carbon atoms (preferably 1 to 4, more preferably 1 to 2), substituted or unsubstituted carbon number 1 to 10 (preferably 1 to 4, more preferably 1 to 2) an anthracene group, a substituted or unsubstituted amine group, a substituted or unsubstituted carbon number of 1 to 10 (preferably 1 to 4), substituted by a substituted generation An ethynyl group having a carbon number of 1 to 10 (preferably 1 to 4), Sulfur atom of the substituted group, the substituent having a silicon atom, a halogen atom, a nitro group, or a cyano group, and R 8 ~ R 13 in at least two of adjacent groups may be combined with each other to form a ring.)

於一個實施形態中,低聚芴結構單元中所含之芴環具有全部R8~R13表示氫原子之結構,或者具有R8及/或R13各自表示選自由鹵素原子、醯基、硝基、氰基及磺基組成之群之任一者並且R9~R12表示氫原子之結構。 In one embodiment, the anthracene ring contained in the oligomeric fluorene structural unit has a structure in which all of R 8 to R 13 represent a hydrogen atom, or R 8 and/or R 13 each represent a halogen atom, a fluorenyl group, and a nitrate. Any of a group consisting of a cyano group, a cyano group, and a sulfo group, and R 9 to R 12 represent a structure of a hydrogen atom.

含有低聚芴結構單元之聚碳酸酯系樹脂例如記載於日本專利特開2015-212816號公報。該專利文獻之記載作為參考引用於本文中。 A polycarbonate-based resin containing an oligomeric fluorene structural unit is described, for example, in JP-A-2015-212816. The disclosure of this patent document is incorporated herein by reference.

上述聚碳酸酯系樹脂之玻璃轉移溫度較佳為110℃~150℃,更佳為120℃~140℃。若玻璃轉移溫度過低,則有樹脂之耐熱性變差之傾向並且樹脂可能會於膜成形後引起尺寸變化。若玻璃轉移溫度過高,則有樹脂於膜成形時之成形穩定性變差之情形,另外,有損害膜之透明性之情形。再者,玻璃轉移溫度根據JIS K 7121(1987)求得。 The glass transition temperature of the polycarbonate resin is preferably from 110 ° C to 150 ° C, more preferably from 120 ° C to 140 ° C. If the glass transition temperature is too low, the heat resistance of the resin tends to be deteriorated and the resin may cause dimensional change after the film is formed. If the glass transition temperature is too high, the molding stability of the resin at the time of film formation may be deteriorated, and the transparency of the film may be impaired. Further, the glass transition temperature was determined in accordance with JIS K 7121 (1987).

樹脂膜可利用任何適合之方法獲得。例如,可將未延伸之樹脂膜延伸而獲得上述樹脂膜。 The resin film can be obtained by any suitable method. For example, the resin film can be obtained by extending an unextended resin film.

上述延伸可採用任何適合之延伸方法、延伸條件(例如延伸溫度、延伸倍率、延伸方向)。具體而言,可單獨採用自由端延伸、固定端延伸、自由端收縮、固定端收縮等各種延伸方法,或者可同時或依次採用。關於延伸方向,可於長度方向、寬度方向、厚度方向、及傾斜方向等各個方向或維度上進行延伸。相對於樹脂膜之玻璃轉移溫度(Tg),延伸溫度較佳為Tg-30℃至Tg+60℃,更佳為Tg-10℃至Tg+50℃之範圍內。 The above extension may employ any suitable extension method, extension conditions (e.g., elongation temperature, extension ratio, direction of extension). Specifically, various extension methods such as free end extension, fixed end extension, free end contraction, and fixed end contraction may be used alone, or may be employed simultaneously or sequentially. The extending direction can be extended in each direction or dimension such as the longitudinal direction, the width direction, the thickness direction, and the oblique direction. The stretching temperature is preferably from Tg -30 ° C to Tg + 60 ° C, more preferably from Tg - 10 ° C to Tg + 50 ° C with respect to the glass transition temperature (Tg) of the resin film.

上述延伸方法可藉由適當選擇延伸條件而獲得具有上述所需光學特性(例如折射率特性、面內相位差、Nz係數)之樹脂膜。 The above stretching method can obtain a resin film having the above-described desired optical characteristics (for example, refractive index characteristics, in-plane retardation, Nz coefficient) by appropriately selecting the stretching conditions.

於一個實施形態中,樹脂膜係藉由對未延伸之樹脂膜進行單軸延伸或固定端單軸延伸而製作。作為固定端單軸延伸之具體例,可列舉一面使樹脂膜於其長度方向上前進一面將樹脂膜於其寬度方向(橫向)上延伸之方法。拉伸倍率較佳為1.1倍~3.5倍。 In one embodiment, the resin film is produced by uniaxially extending the unstretched resin film or uniaxially extending the fixed end. Specific examples of the uniaxial stretching of the fixed end include a method of extending the resin film in the width direction (lateral direction) while advancing the resin film in the longitudinal direction. The stretching ratio is preferably from 1.1 to 3.5 times.

於另一個實施形態中,可藉由相對於長度方向於上述角度θ之方向上對長條狀之樹脂膜連續地進行傾斜延伸而製作相位差膜。藉由採用傾斜延伸時,而獲得具有相對於膜之長度方向為角度θ之配向角(於角度θ之方向上具有遲相軸)之長條狀延伸膜,並且例如,可於其與偏光元件積層中進行捲對捲製造,並且可簡化製造步驟。角度θ可為於抗反射膜中之偏光元件之吸收軸與相位差層之遲相軸所成之角度。如上所述,角度θ較佳為38°~52°,更佳為42°~48°,進而較佳為約45°。 In another embodiment, the retardation film can be formed by continuously stretching the elongated resin film continuously in the direction of the angle θ with respect to the longitudinal direction. By using an oblique extension, an elongated stretch film having an alignment angle (having a slow phase axis in the direction of the angle θ) with respect to the longitudinal direction of the film is obtained, and can be used, for example, with a polarizing element. Roll-to-roll manufacturing is carried out in the laminate, and the manufacturing steps can be simplified. The angle θ may be an angle formed by the absorption axis of the polarizing element in the anti-reflection film and the slow phase axis of the phase difference layer. As described above, the angle θ is preferably from 38 to 52, more preferably from 42 to 48, still more preferably about 45.

作為用於傾斜延伸之延伸機,例如,可列舉於橫向及/或縱向方向上可附加左右不同速度之供給力、或拉伸力或引取力之拉幅式(tenter)延伸機。拉幅式延伸機包括橫向單軸延伸機、同步雙軸延伸機,並且可使用任何適合之延伸機,只要可對長條狀之樹脂膜連續進行傾斜延伸即可。 As the stretching machine for obliquely extending, for example, a tenter stretching machine which can add a supply force of a right and left different speed, or a tensile force or an extraction force in the lateral direction and/or the longitudinal direction can be cited. The tenter type extender includes a lateral uniaxial stretching machine, a synchronous biaxial stretching machine, and any suitable stretching machine can be used as long as the elongated resin film can be continuously extended obliquely.

藉由適當控制於上述延伸機中左右的速度,可獲得具有上述所需面內相位差並且於上述所需方向上具有遲相軸之相位差層(實質上為長條狀之相位差膜)。 By appropriately controlling the left and right speeds in the above-described stretching machine, a phase difference layer (substantially elongated retardation film) having the above-described desired in-plane phase difference and having a slow phase axis in the desired direction can be obtained. .

上述膜之延伸溫度可根據相位差層所需之面內相位差值及厚度、所使用之樹脂之種類、所使用之膜之厚度、及延伸倍率來改變。具體而言,延伸溫度較佳為Tg-30℃至Tg+30℃,進而較佳為Tg-15℃至Tg+15℃,最佳為Tg-10℃至Tg+10℃。藉由於此種溫度下 進行延伸,可獲得具有本發明中適合之特性之相位差層。再者,Tg係指構成膜之材料之玻璃轉移溫度。 The extension temperature of the film may be changed according to the in-plane retardation value and thickness required for the retardation layer, the kind of the resin to be used, the thickness of the film to be used, and the stretching ratio. Specifically, the stretching temperature is preferably from Tg-30 ° C to Tg + 30 ° C, further preferably from Tg - 15 ° C to Tg + 15 ° C, most preferably from Tg - 10 ° C to Tg + 10 ° C. By this temperature By extending, a phase difference layer having characteristics suitable for the present invention can be obtained. Further, Tg means the glass transition temperature of the material constituting the film.

(保護膜) (protective film)

上述保護膜由任何適當之樹脂形成。作為用以形成保護膜之樹脂之具例,例如可列舉:三乙醯基纖維素(TAC)等纖維素系樹脂;或聚酯系、聚乙烯醇系、聚碳酸酯系、聚醯胺系、聚醯亞胺系、聚醚碸系、聚碸系、聚苯乙烯系、聚降冰片烯系、聚烯烴系、(甲基)丙烯酸系、乙酸酯系等透明樹脂等。又亦可列舉:(甲基)丙烯酸系、胺基甲酸酯系、(甲基)丙烯酸胺基甲酸酯系、環氧系、有機矽系等熱硬化型樹脂或紫外線硬化型樹脂等。另外,亦可列舉矽氧烷系聚合物等玻璃質系聚合物。另外,亦可使用記載於日本專利特開2001-343529號公報(WO01/37007)中之聚合物膜。作為該膜之材料:例如可使用含有於其側鏈上具有經取代或經未取代之醯亞胺基之熱塑性樹脂以及於其側鏈上具有經取代或未經取代之苯基及腈基之熱塑性樹脂之樹脂組合物,例如可列舉具有包含異丁烯及N-甲基馬來醯亞胺之交替共聚物以及丙烯腈-苯乙烯共聚物之樹脂組合物。該聚合物膜可為例如上述樹脂組合物之擠出成形物。 The above protective film is formed of any suitable resin. Examples of the resin for forming the protective film include a cellulose resin such as triethylenesulfonyl cellulose (TAC); or a polyester resin, a polyvinyl alcohol resin, a polycarbonate resin, or a polyamido compound. A transparent resin such as a polyimide, a polyether, a polyfluorene, a polystyrene, a polynorbornene, a polyolefin, a (meth)acrylic or an acetate. Further, examples thereof include thermosetting resins such as (meth)acrylic acid, urethane-based, (meth)acrylic acid urethane-based, epoxy-based, and organofluorene-based resins, and ultraviolet curable resins. Further, a glass-based polymer such as a siloxane-based polymer may also be mentioned. Further, a polymer film described in JP-A-2001-343529 (WO01/37007) can also be used. As the material of the film: for example, a thermoplastic resin having a substituted or unsubstituted quinone imine group on its side chain and a substituted or unsubstituted phenyl and nitrile group on its side chain can be used. The resin composition of the thermoplastic resin may, for example, be a resin composition having an alternating copolymer of isobutylene and N-methylmaleimide and an acrylonitrile-styrene copolymer. The polymer film may be, for example, an extrusion molded article of the above resin composition.

只要獲得本發明之效果,則上述保護膜之厚度可採用任何適當之厚度。保護膜之厚度例如為20μm~40μm,較佳為25μm~35μm。 The thickness of the above protective film may be any suitable thickness as long as the effect of the present invention is obtained. The thickness of the protective film is, for example, 20 μm to 40 μm, preferably 25 μm to 35 μm.

(接著劑層) (adhesive layer)

上述偏光元件、上述相位差層及保護膜積層可經由接著劑層而積層。作為構成接著劑層之接著劑,可使用任何適當之接著劑。例如,接著劑層由聚乙烯醇系接著劑形成。 The polarizing element, the retardation layer, and the protective film laminate may be laminated via an adhesive layer. As the adhesive constituting the adhesive layer, any appropriate adhesive can be used. For example, the adhesive layer is formed of a polyvinyl alcohol-based adhesive.

接著劑層之厚度較佳為1μm以下,更佳為0.8μm以下。只要厚度在此種範圍內,則可獲得相位差層之相位差變化較小並且防止隨時間 出現之顏色不均勻之光學積層體。上述接著劑層之厚度之下限例如為0.01μm。 The thickness of the subsequent layer is preferably 1 μm or less, more preferably 0.8 μm or less. As long as the thickness is within this range, the phase difference variation of the phase difference layer can be obtained small and prevented over time An optical laminate that is uneven in color. The lower limit of the thickness of the above adhesive layer is, for example, 0.01 μm.

(黏著劑層) (adhesive layer)

如上所述,上述抗反射膜具備黏著劑層,並且可經由該黏著劑層而貼著於第一基板。使用任何適當之黏著劑作為構成黏著劑層之黏著劑。例如,黏著劑層由丙烯酸系黏著劑形成。 As described above, the antireflection film has an adhesive layer and can be attached to the first substrate via the adhesive layer. Any suitable adhesive is used as the adhesive constituting the adhesive layer. For example, the adhesive layer is formed of an acrylic adhesive.

上述黏著劑層之厚度較佳為5μm~30μm,更佳為5μm~15μm。於本發明中,藉由形成樹脂層,而抑制抗反射膜之膨脹及收縮,因此可防止黏著劑層之發泡及剝離。因此,可降低黏著劑層之厚度,並且因此可獲得薄型光學積層體。 The thickness of the above adhesive layer is preferably from 5 μm to 30 μm, more preferably from 5 μm to 15 μm. In the present invention, by forming the resin layer, expansion and contraction of the antireflection film are suppressed, so that foaming and peeling of the adhesive layer can be prevented. Therefore, the thickness of the adhesive layer can be reduced, and thus a thin optical laminate can be obtained.

(其他層) (other layers)

抗反射膜可進而具備其他層。作為其他層,例如,可列舉與上述相位差層不同之相位差層。於一個實施形態中,上述抗反射膜可進而包括具有nz>nx=ny之折射率分佈並且可起正C-板之作用之相位差層(相位差膜或液晶層)。此處「nx=ny」不僅包括nx與ny彼此完全相等之情形,而且亦包括nx與ny彼此實質相等之情形。即,意指Re未達10nm。可起正C-板之作用之相位差層之厚度方向相位差Rth較佳為-20nm~-200nm,進而較佳為-40nm~-180nm,特別較佳為-40nm~-160nm。可獲得此種Rth之相位差層之厚度可根據所使用之材料等發生變化。厚度較佳為0.5μm~60μm,更佳為0.5μm~50μm,最佳為0.5μm~40μm。 The antireflection film may further have other layers. As the other layer, for example, a phase difference layer different from the above-described phase difference layer can be cited. In one embodiment, the anti-reflection film may further include a retardation layer (retardation film or liquid crystal layer) having a refractive index distribution of nz>nx=ny and functioning as a positive C-plate. Here, "nx=ny" includes not only the case where nx and ny are completely equal to each other, but also the case where nx and ny are substantially equal to each other. That is, it means that Re is less than 10 nm. The thickness direction phase difference Rth of the phase difference layer which functions as a positive C-plate is preferably from -20 nm to -200 nm, further preferably from -40 nm to -180 nm, particularly preferably from -40 nm to -160 nm. The thickness of the phase difference layer in which such Rth can be obtained can vary depending on the materials used and the like. The thickness is preferably from 0.5 μm to 60 μm, more preferably from 0.5 μm to 50 μm, most preferably from 0.5 μm to 40 μm.

C.樹脂層C. Resin layer

上述樹脂層配置於第一基板與第二基板之間,覆蓋抗反射膜。此種樹脂層可例如於第一基板上積層抗反射膜,之後以密封抗反射膜之方式塗覆硬化性樹脂形成用組合物,並且其後使該樹脂層形成用組合物硬化而形成。另外,可將樹脂層形成用組合物塗覆至另一基材 上;之後使樹脂層形成用組合物成為半硬化狀態形成前體層;將該前體層轉移至第一基板與抗反射膜之積層體上;其後使該前體層硬化而形成樹脂層。 The resin layer is disposed between the first substrate and the second substrate and covers the anti-reflection film. Such a resin layer can be formed by laminating an antireflection film on the first substrate, for example, and then coating the composition for forming a curable resin so as to seal the antireflection film, and then curing the composition for forming the resin layer. In addition, the resin layer forming composition can be applied to another substrate Then, the resin layer forming composition is formed into a semi-hardened state to form a precursor layer; the precursor layer is transferred onto the laminate of the first substrate and the antireflection film; and thereafter, the precursor layer is cured to form a resin layer.

上述樹脂層形成用組合物含有硬化性合物(單體、低聚物)。作為硬化性化合物,可列舉:丙烯酸系化合物、環氧系化合物、胺基甲酸酯系化合物等。 The resin layer-forming composition contains a curable compound (monomer or oligomer). Examples of the curable compound include an acrylic compound, an epoxy compound, and a urethane compound.

上述丙烯酸系化合物較佳為具有羥基、羧基、氰基、胺基、醯胺基、雜環基、內酯環基、及/或異氰酸酯環基。只要使用含有具有此種官能基之丙烯酸系化合物之樹脂層形成用組合物,則能夠形成對第一基板及第二基板之接著性優異之樹脂層。 The acrylic compound preferably has a hydroxyl group, a carboxyl group, a cyano group, an amine group, a decylamino group, a heterocyclic group, a lactone ring group, and/or an isocyanate ring group. When a resin layer-forming composition containing an acrylic compound having such a functional group is used, a resin layer excellent in adhesion to the first substrate and the second substrate can be formed.

作為上述丙烯酸系化合物之具體例,例如可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、或(甲基)丙烯酸4-羥基丁酯等具有羥基之丙烯酸系化合物;丙烯酸、甲基丙烯酸等具有羧基之丙烯酸系化合物;丙烯腈、甲基丙烯腈等具有氰基之丙烯酸系化合物;(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸二甲基胺基丙酯、(甲基)丙烯酸二乙基胺基乙酯、(甲基)丙烯酸二異丙基胺基乙酯具有胺基之丙烯酸系化合物;丙烯醯胺、二甲基丙烯醯胺、二甲基胺基丙基丙烯醯胺、異丙基丙烯醯胺、二乙基丙烯醯胺、羥乙基丙烯醯胺、丙烯醯基嗎啉等具有醯胺基之丙烯酸系化合物;(甲基)丙烯酸四氫糠基酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸五甲基哌啶基酯、(甲基)丙烯酸四甲基哌啶基酯等具有雜環之丙烯酸系化合物;γ-丁內酯(甲基)丙烯酸酯單體等具有內酯環之丙烯酸系化合物;(甲基)丙烯酸2-異氰酸基乙酯單體等具有異氰酸酯基之丙烯酸系化合物等。丙烯酸系化合物可單獨使用或組合使用。 Specific examples of the acrylic compound include, for example, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, or 4-hydroxybutyl (meth)acrylate having a hydroxyl group. Acrylic compound; acrylic compound having a carboxyl group such as acrylic acid or methacrylic acid; acrylic compound having a cyano group such as acrylonitrile or methacrylonitrile; dimethylaminoethyl (meth)acrylate; Acrylic acid-based compound having dimethylaminopropyl acrylate, diethylaminoethyl (meth)acrylate, diisopropylaminoethyl (meth)acrylate, amine; acrylamide, dimethyl An acrylic compound having a guanamine group such as acrylamide, dimethylaminopropyl acrylamide, isopropyl acrylamide, diethyl acrylamide, hydroxyethyl acrylamide, acryl hydrazinomorph (tetramethyl methacrylate), glycidyl (meth)acrylate, pentamethylpiperidyl (meth)acrylate, tetramethylpiperidyl (meth)acrylate, etc. Acrylic compound; γ-butyrolactone (meth) acrylate monomer, etc. Rings acrylate compound; (meth) acrylate, 2-isocyanatoethyl acrylate monomer having the acrylic group of the isocyanate compound and the like. The acrylic compounds may be used singly or in combination.

上述樹脂層形成用組合物可含有多官能丙烯酸系單體(即具有複數個丙烯醯氧基之丙烯酸系單體)、源自多官能丙烯酸系單體之低聚 物、及/或源自多官能丙烯酸系單體之預聚物作為丙烯酸系化合物。作為多官能丙烯酸系單體,例如可列舉:三環癸烷二甲醇二丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、三羥甲基丙烷三丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二羥甲基丙烷四丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、1,6-己二醇(甲基)丙烯酸酯、1,9-壬二醇二丙烯酸酯、1,10-癸二醇(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、二丙二醇二丙烯酸酯、異氰脲酸三(甲基)丙烯酸酯、乙氧化甘油三丙烯酸酯、乙氧化四丙烯酸季戊四醇酯等。多官能丙烯酸系單體可單獨使用或組合使用複數種。 The resin layer-forming composition may contain a polyfunctional acrylic monomer (i.e., an acrylic monomer having a plurality of acryloxy groups), and an oligomerization derived from a polyfunctional acrylic monomer. And a prepolymer derived from a polyfunctional acrylic monomer as an acrylic compound. Examples of the polyfunctional acrylic monomer include tricyclodecane dimethanol diacrylate, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, trimethylolpropane triacrylate, and pentaerythritol. Tetra(meth)acrylate, dimethylolpropane tetraacrylate, dipentaerythritol hexa(meth) acrylate, 1,6-hexanediol (meth) acrylate, 1,9-nonanediol diacrylate Ester, 1,10-nonanediol (meth) acrylate, polyethylene glycol di(meth) acrylate, polypropylene glycol di(meth) acrylate, dipropylene glycol di acrylate, isocyanuric acid tri Methyl) acrylate, ethoxylated glycerin triacrylate, pentylene glycol tetraacrylate, and the like. The polyfunctional acrylic monomers may be used singly or in combination of plural kinds.

相對於100重量份之樹脂層形成用組合物中之硬化性化合物,上述樹脂層形成用組合物中之多官能丙烯酸系單體之含有比率較佳為5重量份以下,更佳為1重量份以下。於一個實施形態中,使用不含多官能丙烯酸系單體之樹脂層形成用組合物。只要使用此種樹脂組合物,則可抑制歸因於硬化過程之收縮,並且作為其結果,能夠形成與基板之密著性優異之樹脂層。 The content ratio of the polyfunctional acrylic monomer in the resin layer-forming composition is preferably 5 parts by weight or less, more preferably 1 part by weight, based on 100 parts by weight of the curable compound in the resin layer-forming composition. the following. In one embodiment, a composition for forming a resin layer containing no polyfunctional acrylic monomer is used. When such a resin composition is used, shrinkage due to the hardening process can be suppressed, and as a result, a resin layer excellent in adhesion to the substrate can be formed.

作為上述環氧系化合物,例如可列舉:雙酚A型、雙酚F型、雙酚S型、及該等之氫化產物雙酚型;苯酚酚醛清漆型或甲酚酚醛清漆型等酚醛清漆型;異氰脲酸三縮水甘油酯型或乙內醯脲型等含氮環型;脂環式型;脂肪族型;萘型;縮水甘油醚型或聯苯型低吸水性型;二環戊二烯型等二環型;酯型;醚酯型;及該等之改性型等環氧系化合物。作為雙酚型環氧化合物,例如可列舉:雙酚A之二縮水甘油醚、雙酚F之二縮水甘油醚、雙酚S之二縮水甘油醚等。作為脂環式環氧化合物,例如可列舉:3,4-環氧基環己基甲酸3,4-環氧基環己基甲基酯、3,4-環氧-6-甲基環己基甲酸3,4-環氧-6-甲基環己基甲基酯。作為脂肪族環氧化合物,例如可列舉:1,4-丁二醇之二縮水甘油醚、 1,6-己二醇之二縮水甘油醚、甘油之三縮水甘油醚、三羥甲基丙烷之三縮水甘油醚。 Examples of the epoxy-based compound include bisphenol A type, bisphenol F type, bisphenol S type, and hydrogenated product bisphenol type; and phenol novolak type such as phenol novolak type or cresol novolak type. a nitrogen-containing cyclic type such as an isocyanuric acid triglycidyl ester type or an urethane type; an alicyclic type; an aliphatic type; a naphthalene type; a glycidyl ether type or a biphenyl type low water absorption type; a dicyclic type such as a diene type; an ester type; an ether ester type; and an epoxy compound such as the modified type. Examples of the bisphenol epoxy compound include diglycidyl ether of bisphenol A, diglycidyl ether of bisphenol F, and diglycidyl ether of bisphenol S. Examples of the alicyclic epoxy compound include 3,4-epoxycyclohexylmethyl 3,4-epoxycyclohexylcarboxylate and 3,4-epoxy-6-methylcyclohexylcarboxylic acid 3. , 4-epoxy-6-methylcyclohexylmethyl ester. Examples of the aliphatic epoxy compound include diglycidyl ether of 1,4-butanediol. Diglycidyl ether of 1,6-hexanediol, triglycidyl ether of glycerol, triglycidyl ether of trimethylolpropane.

於一個實施形態中,併用環氧基系化合物及氧雜環丁烷系化合物。藉由添加氧雜環丁烷系化合物,可降低樹脂層形成用組合物之黏度或增加硬化速度。 In one embodiment, an epoxy-based compound and an oxetane-based compound are used in combination. By adding an oxetane-based compound, the viscosity of the resin layer-forming composition can be lowered or the curing rate can be increased.

上述樹脂層形成用組合物可含有胺基甲酸酯(甲基)丙烯酸酯及/或胺基甲酸酯(甲基)丙烯酸酯之低聚物作為胺基甲酸酯系化合物。上述胺基甲酸酯(甲基)丙烯酸酯可藉由對由(甲基)丙烯酸或(甲基)丙烯酸酯及多元醇獲得之(甲基)丙烯酸羥基酯進行與二異氰酸酯之反應而獲得。胺基甲酸酯(甲基)丙烯酸酯及胺基甲酸酯(甲基)丙烯酸酯之低聚物可單獨使用或組合複數個使用。 The resin layer-forming composition may contain an oligomer of a urethane (meth) acrylate and/or a urethane (meth) acrylate as an urethane-based compound. The above urethane (meth) acrylate can be obtained by reacting a hydroxy ester of (meth) acrylate obtained from (meth)acrylic acid or a (meth) acrylate and a polyhydric alcohol with a diisocyanate. The oligomer of urethane (meth) acrylate and urethane (meth) acrylate may be used singly or in combination of plural.

作為上述(甲基)丙烯酸酯,例如可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸環己酯。 Examples of the (meth) acrylate include methyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, and (methyl). Cyclohexyl acrylate.

作為上述多元醇,例如可列舉:乙二醇、1,3-丙二醇、1,2-丙二醇、二乙二醇、二丙二醇、新戊二醇、1,3-丁二醇、1,4-丁二醇、1,6-己二醇、1,9-壬二醇、1,10-癸二醇、2,2,4-三甲基-1,3-戊二醇、3-甲基-1,5-戊二醇、新戊二醇羥基新戊酸酯、三環癸烷二甲醇、1,4-環己二醇、螺環二醇、氫化雙酚A、雙酚A-環氧乙烷加合物、雙酚A-環氧丙烷加合物、三羥甲基乙烷、三羥甲基丙烷、甘油、3-甲基戊烷-1,3,5-三醇、季戊四醇、二季戊四醇、三季戊四醇、葡萄糖類等。 Examples of the polyhydric alcohol include ethylene glycol, 1,3-propanediol, 1,2-propanediol, diethylene glycol, dipropylene glycol, neopentyl glycol, 1,3-butanediol, and 1,4- Butylene glycol, 1,6-hexanediol, 1,9-nonanediol, 1,10-decanediol, 2,2,4-trimethyl-1,3-pentanediol, 3-methyl -1,5-pentanediol, neopentyl glycol hydroxypivalate, tricyclodecane dimethanol, 1,4-cyclohexanediol, spirodiol, hydrogenated bisphenol A, bisphenol A-ring Oxyethane adduct, bisphenol A-propylene oxide adduct, trimethylolethane, trimethylolpropane, glycerol, 3-methylpentane-1,3,5-triol, pentaerythritol , dipentaerythritol, tripentaerythritol, glucose, and the like.

例如,可使用芳香族、脂肪族、或脂環族各種二異氰酸酯類作為上述二異氰酸酯。作為二異氰酸酯之具體例,可列舉:四亞甲基二異氰酸酯、六亞甲基二異氰酸酯、異佛爾酮二異氰酸酯、2,4-甲苯二異氰酸酯、4,4-二苯基二異氰酸酯、1,5-萘二異氰酸酯、3,3-二甲基-4,4-二苯基二異氰酸酯、二甲苯二異氰酸酯、三甲基六亞甲基二異氰 酸酯、4,4-二苯基甲烷二異氰酸酯、及該等之氫化產物。 For example, an aromatic, aliphatic or alicyclic various diisocyanate can be used as the above diisocyanate. Specific examples of the diisocyanate include tetramethylene diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, 2,4-toluene diisocyanate, and 4,4-diphenyl diisocyanate. , 5-naphthalene diisocyanate, 3,3-dimethyl-4,4-diphenyl diisocyanate, xylene diisocyanate, trimethylhexamethylene diisocyanate An acid ester, 4,4-diphenylmethane diisocyanate, and such hydrogenated products.

上述樹脂層形成用組合物可含有或不含有溶劑。作為溶劑,例如可列舉:二丁基醚、二甲氧基甲烷、乙酸甲酯、乙酸乙酯、乙酸異丁酯、丙酸甲酯、丙酸乙酯、甲醇、乙醇、甲基異丁基酮(MIBK)等。該等可單獨使用或組合複數個使用。 The above resin layer-forming composition may or may not contain a solvent. Examples of the solvent include dibutyl ether, dimethoxymethane, methyl acetate, ethyl acetate, isobutyl acetate, methyl propionate, ethyl propionate, methanol, ethanol, and methyl isobutyl. Ketone (MIBK) and the like. These may be used alone or in combination.

上述樹脂層形成用組合物可進而含有任何適當之添加劑。作為添加劑,例如可列舉:聚合起始劑、交聯劑、均化劑、抗黏連劑、分散穩定劑、觸變劑、抗氧化劑、紫外線吸收劑、消泡劑、增黏劑、分散劑、界面活性劑、催化劑、填料、潤滑劑、抗靜電劑。 The above resin layer-forming composition may further contain any appropriate additives. Examples of the additive include a polymerization initiator, a crosslinking agent, a leveling agent, an anti-blocking agent, a dispersion stabilizer, a thixotropic agent, an antioxidant, an ultraviolet absorber, an antifoaming agent, a tackifier, and a dispersing agent. , surfactant, catalyst, filler, lubricant, antistatic agent.

於一個實施形態中,樹脂層形成用組合物含有偶合劑。含有偶合劑之樹脂層,就與第一基板、第二基板、及抗反射膜之密著性優異方面而言,較佳。作為偶合劑,可列舉:環氧封端之偶合劑、含胺基之偶合劑、含甲基丙烯醯基之偶合劑、含硫醇基之偶合劑。 In one embodiment, the resin layer-forming composition contains a coupling agent. The resin layer containing a coupling agent is preferable in terms of excellent adhesion to the first substrate, the second substrate, and the antireflection film. Examples of the coupling agent include an epoxy-terminated coupling agent, an amine group-containing coupling agent, a methacryl oxime group-containing coupling agent, and a thiol group-containing coupling agent.

作為樹脂層形成用組合物之塗佈方法,可採用任何適當之方法。例如可列舉:棒塗法、輥塗法、凹版塗佈法、桿塗(rod coating)法、狹縫孔塗佈法、幕塗法、淋幕式塗佈(fountain coating)法、逗點塗佈(comma coating)法。 As a coating method of the composition for forming a resin layer, any appropriate method can be employed. For example, a bar coating method, a roll coating method, a gravure coating method, a rod coating method, a slit hole coating method, a curtain coating method, a curtain coating method, and a comma coating method are mentioned. Comma coating method.

作為樹脂層形成用組合物之硬化方法,可採用任何適當之硬化處理。代表而言硬化處理係藉由紫外線照射而進行。紫外線照射之累積光量較佳為500mJ/cm2~5000mJ/cm2。另外,可藉由加熱將樹脂層形成用組合物硬化。於熱硬化時之加熱溫度例如為90℃~150℃。 As the hardening method of the composition for forming a resin layer, any appropriate hardening treatment can be employed. Representatively, the hardening treatment is carried out by ultraviolet irradiation. The cumulative amount of light by ultraviolet irradiation is preferably from 500 mJ/cm 2 to 5000 mJ/cm 2 . Further, the resin layer-forming composition can be cured by heating. The heating temperature at the time of thermal curing is, for example, 90 ° C to 150 ° C.

上述樹脂層之最薄部分之厚度(即,第二基板與抗反射膜之間之距離)較佳為1μm~300μm,更佳為1μm~100μm,進而較佳為1μm~30μm。只要在此種範圍內,則可有效地抑制相位差層之尺寸變化。 The thickness of the thinnest portion of the resin layer (i.e., the distance between the second substrate and the antireflection film) is preferably from 1 μm to 300 μm, more preferably from 1 μm to 100 μm, still more preferably from 1 μm to 30 μm. As long as it is within such a range, the dimensional change of the phase difference layer can be effectively suppressed.

樹脂層之於25℃下之儲存彈性模數E'較佳為1.0×106Pa以上,更 佳為1.0×107Pa以上,進而較佳為1.0×108Pa以上,特別較佳為1.0×109Pa至1.0×1011Pa。只要為此種範圍內,則可有效地抑制相位差層之尺寸變化。稍後描述儲存彈性模數E'之測定方法。 The storage elastic modulus E' of the resin layer at 25 ° C is preferably 1.0 × 10 6 Pa or more, more preferably 1.0 × 10 7 Pa or more, still more preferably 1.0 × 10 8 Pa or more, and particularly preferably 1.0. ×10 9 Pa to 1.0 × 10 11 Pa. As long as it is within such a range, the dimensional change of the phase difference layer can be effectively suppressed. The method of measuring the storage elastic modulus E' will be described later.

上述樹脂層之玻璃轉移溫度(Tg)較佳為10℃~200℃,更佳為20℃~150℃,進而較佳為40℃~130℃。 The glass transition temperature (Tg) of the above resin layer is preferably from 10 ° C to 200 ° C, more preferably from 20 ° C to 150 ° C, still more preferably from 40 ° C to 130 ° C.

D.第一基板、第二基板D. First substrate, second substrate

第一基板可包含任何適當之材料。作為構成第一基板之材料,例如可列舉:玻璃、樹脂膜。於一個實施形態中,第一基板可為構成圖像顯示面板(例如,有機EL面板)之最外層之基板斗於此種情形時,構成本發明之光學積層體之抗反射膜配置於圖像顯示面板之觀察者側表面上。 The first substrate can comprise any suitable material. Examples of the material constituting the first substrate include glass and a resin film. In one embodiment, the first substrate may be a substrate that constitutes the outermost layer of the image display panel (for example, an organic EL panel). In this case, the antireflection film constituting the optical laminate of the present invention is disposed on the image. On the viewer's side surface of the display panel.

上述第二基板可包含任何適當之材料。作為構成第二基板之材料,例如可列舉:玻璃、樹脂膜等。 The second substrate described above may comprise any suitable material. Examples of the material constituting the second substrate include glass, a resin film, and the like.

本發明之光學積層體可藉由以下方式形成:於第一基板上積層上述抗反射膜;其後以夾住抗反射膜之方式將包括第一基板及抗反射膜之積層體與第二基板經由樹脂層而接著。形成樹脂層之方法如上述C項中所說明。 The optical laminate of the present invention can be formed by laminating the anti-reflection film on the first substrate, and then laminating the first substrate and the anti-reflection film with the second substrate by sandwiching the anti-reflection film. This is followed by a resin layer. The method of forming the resin layer is as described in the above item C.

實施例 Example

以下,利用實施例具體地說明本發明,但本發明不受該等實施例限定。 Hereinafter, the present invention will be specifically described by examples, but the present invention is not limited by the examples.

[製造例1-1]構成相位差層之相位差膜A之製作 [Production Example 1-1] Production of retardation film A constituting the retardation layer

(聚碳酸酯樹脂膜之製作) (Production of polycarbonate resin film)

利用包含兩個各自具備攪拌葉片及控制為100℃之回流冷凝器之垂直反應器之分批聚合裝置進行聚合。將9,9-[4-(2-羥基乙氧基)苯基]芴(BHEPF)、異山梨醇(ISB)、二乙二醇(DEG)、碳酸二苯酯(DPC)、及四水合乙酸鎂加載至第一反應器,以莫耳比計使 BHEPF/ISB/DEG/DPC/乙酸鎂=0.348/0.490/0.162/1.005/1.00×10-5。於已經將反應器用氮(氧濃度:0.0005~0.001vol%)充分置換之後,用熱介質進行升溫並且於內溫變為100℃之時間點開始攪拌。於開始升溫之後40分鐘使內溫達到220℃,並且控制該反應器以保持溫度,同時,於溫度已經達到220℃之後以90分鐘開始減壓以將反應器中之壓力降低至13.3kPa。將作為與聚合反應相關之副產物產生之苯酚蒸氣引入至100℃之回流冷凝器中,將苯酚蒸氣中以一定量存在之單體組分返回至反應器,並且將未冷凝之苯酚蒸氣引入至45℃之冷凝器中並且回收。 The polymerization was carried out using a batch polymerization apparatus comprising two vertical reactors each having a stirring blade and a reflux condenser controlled at 100 °C. 9,9-[4-(2-hydroxyethoxy)phenyl]indole (BHEPF), isosorbide (ISB), diethylene glycol (DEG), diphenyl carbonate (DPC), and tetrahydrate Magnesium acetate was loaded into the first reactor at a molar ratio of BHEPF/ISB/DEG/DPC/magnesium acetate = 0.348/0.490/0.162/1.005/1.00 x 10 -5 . After the reactor was sufficiently substituted with nitrogen (oxygen concentration: 0.0005 to 0.001 vol%), the temperature was raised with a heat medium, and stirring was started at a time when the internal temperature became 100 °C. The internal temperature was brought to 220 ° C 40 minutes after the start of the temperature rise, and the reactor was controlled to maintain the temperature while starting the pressure reduction at 90 minutes after the temperature had reached 220 ° C to lower the pressure in the reactor to 13.3 kPa. The phenol vapor produced as a by-product related to the polymerization reaction is introduced into a reflux condenser at 100 ° C, the monomer component present in a certain amount in the phenol vapor is returned to the reactor, and the uncondensed phenol vapor is introduced to In a 45 ° C condenser and recovered.

將氮引入至第一反應器中立刻將壓力恢復至大氣壓。之後,將第一反應器內之低聚化之反應液體轉移至第二反應器。繼而,開始第二反應器內之升溫及減壓經過50分鐘將內溫及壓力分別設定為240℃及0.2kPa。其後,進行聚合,直至達到預定之攪拌動力。於達到預定動力之時間點,將氮導入至反應器中以將壓力恢復至大氣壓,並且以股之形式萃取反應液體,進行用旋轉切割器對其進行製粒化,獲得BHEPF/ISB/DEG=34.8/49.0/16.2[mol%]之共聚物組成之聚碳酸酯樹脂。該聚碳酸酯樹脂之還原黏度為0.430dL/g,玻璃轉移溫度為128℃。 The introduction of nitrogen into the first reactor immediately restores the pressure to atmospheric pressure. Thereafter, the oligomerized reaction liquid in the first reactor is transferred to the second reactor. Then, the temperature rise and the pressure reduction in the second reactor were started for 50 minutes, and the internal temperature and pressure were set to 240 ° C and 0.2 kPa, respectively. Thereafter, the polymerization is carried out until the predetermined stirring power is reached. At the point of time when the predetermined power is reached, nitrogen is introduced into the reactor to restore the pressure to atmospheric pressure, and the reaction liquid is extracted in the form of strands, which are granulated by a rotary cutter to obtain BHEPF/ISB/DEG= A polycarbonate resin composed of a copolymer of 34.8/49.0/16.2 [mol%]. The polycarbonate resin had a reduced viscosity of 0.430 dL/g and a glass transition temperature of 128 °C.

將所獲得之聚碳酸酯樹脂於80℃下真空乾燥5小時,並且之後使用具備單螺桿擠出機(由Isuzu Kakoki公司製造,螺桿直徑:25mm,缸預設溫度:220℃)、T模(寬度:900mm,預設溫度:220℃)、冷卻輥(預設溫度:120℃~130℃)、及拉緊單元之成膜裝置製作厚度140μm之聚碳酸酯樹脂膜。 The obtained polycarbonate resin was vacuum-dried at 80 ° C for 5 hours, and then used with a single-screw extruder (manufactured by Isuzu Kakoki Co., Ltd., screw diameter: 25 mm, cylinder preset temperature: 220 ° C), T-die ( Width: 900 mm, preset temperature: 220 ° C), cooling roll (preset temperature: 120 ° C to 130 ° C), and a film forming apparatus of the tensioning unit to produce a polycarbonate resin film having a thickness of 140 μm.

(相位差膜之製作) (production of retardation film)

將上述未延伸之改性聚碳酸酯膜傾斜延伸以提供相位差膜A(厚度:50μm,光彈性係數:30×10-12Pa,波長分散特性 Re(450)/Re(550):0.91)。此時,將延伸方向設定為相對於膜之長度方向為45°。另外,將延伸比率自2倍調節為3倍,從而相位差膜A表示λ/4之相位差。另外,將延伸溫度設定為133℃(即,未延伸之改性聚碳酸酯膜之Tg+5℃)。 The above unstretched modified polycarbonate film was obliquely extended to provide a retardation film A (thickness: 50 μm, photoelastic coefficient: 30 × 10 -12 Pa, wavelength dispersion property Re (450) / Re (550): 0.91) . At this time, the extending direction was set to be 45° with respect to the longitudinal direction of the film. Further, the elongation ratio is adjusted from 2 times to 3 times, so that the retardation film A represents a phase difference of λ/4. Further, the stretching temperature was set to 133 ° C (i.e., Tg + 5 ° C of the unstretched modified polycarbonate film).

[製造例1-2]構成相位差層之相位差膜B之製作 [Production Example 1-2] Production of retardation film B constituting a phase difference layer

(聚碳酸酯樹脂膜之製作) (Production of polycarbonate resin film)

將38.06重量份(0.059mol)之雙[9-(2-苯氧基羰基乙基)芴-9-基]甲烷、53.73重量份(0.368mol)之異山梨醇(由Roquette Frères公司製造,商品名:「POLYSORB」)、9.64重量份(0.067mol)之1,4-環己烷二甲醇(順式-反式混合物,由SK Chemicals公司製造)、81.28重量份(0.379mol)之碳酸二苯酯(由三菱化學公司製造)、及3.83×10-4重量份(2.17×10-6mol)之作為催化劑之一水合乙酸鈣投入至反應容器中,使反應裝置內進行減壓氮氣置換。於氮氣環境下,於150℃下一面攪拌約10分鐘一面使原料溶解。作為反應之第一步,經過30分鐘將溫度升溫至220℃,並且於常壓下使溶液進行反應60分鐘。繼而,經過90分鐘將壓力自常壓降低至13.3kPa,並且將壓力維持於13.3kPa歷時30分鐘,接著將所產生之苯酚萃取至反應體系外部。繼而,作為反應之第二步,於經過15分鐘一面將熱介質溫度升溫至240℃,一面經過15分鐘將壓力降低至0.10kPa以下,並且將所產生之苯酚萃取至反應體系外部。於已經達到預定之攪拌扭矩之後,藉由用氮使壓力恢復至常壓來停止反應,將所產生之聚酯碳酸酯擠出至水中並且將該股切割以提供聚碳酸酯樹脂粒料。 38.06 parts by weight (0.059 mol) of bis[9-(2-phenoxycarbonylethyl)fluoren-9-yl]methane, 53.73 parts by weight (0.368 mol) of isosorbide (manufactured by Roquette Frères, Name: "POLYSORB"), 9.64 parts by weight (0.067 mol) of 1,4-cyclohexanedimethanol (cis-trans mixture, manufactured by SK Chemicals), 81.28 parts by weight (0.379 mol) of diphenyl carbonate An ester (manufactured by Mitsubishi Chemical Corporation) and 3.83 × 10 -4 parts by weight (2.17 × 10 -6 mol) of one of the catalysts, calcium acetate hydrate, were placed in a reaction vessel, and the inside of the reaction apparatus was replaced with a reduced pressure nitrogen gas. The raw material was dissolved while stirring at 150 ° C for about 10 minutes under a nitrogen atmosphere. As a first step of the reaction, the temperature was raised to 220 ° C over 30 minutes, and the solution was allowed to react under normal pressure for 60 minutes. Then, the pressure was lowered from normal pressure to 13.3 kPa over 90 minutes, and the pressure was maintained at 13.3 kPa for 30 minutes, and then the produced phenol was extracted to the outside of the reaction system. Then, as a second step of the reaction, the temperature of the heat medium was raised to 240 ° C over 15 minutes, and the pressure was lowered to 0.10 kPa or less over 15 minutes, and the produced phenol was extracted to the outside of the reaction system. After the predetermined agitation torque has been reached, the reaction is stopped by returning the pressure to normal pressure with nitrogen, the resulting polyester carbonate is extruded into water and the strand is cut to provide polycarbonate resin pellets.

(相位差膜之製作) (production of retardation film)

將上述包括聚碳酸酯樹脂粒料之膜傾斜延伸以提供相位差膜B(厚度:50μm,光彈性係數:16×10-12Pa,波長分散特性Re(450)/Re(550):0.83)。此時,將延伸方向設定為相對於膜之長度方 向為45°。另外,將延伸倍率自2倍調節為3倍,從而相位差膜B表示λ/4之相位差。另外,將延伸溫度設定為148℃(即,未延伸之改性聚碳酸酯膜之Tg+5℃)。 The above film including the polycarbonate resin pellets was obliquely extended to provide a retardation film B (thickness: 50 μm, photoelastic coefficient: 16 × 10 -12 Pa, wavelength dispersion property Re (450) / Re (550): 0.83) . At this time, the extending direction was set to be 45° with respect to the longitudinal direction of the film. Further, the stretching ratio is adjusted from 2 times to 3 times, so that the retardation film B represents a phase difference of λ/4. Further, the extension temperature was set to 148 ° C (i.e., Tg + 5 ° C of the unstretched modified polycarbonate film).

[製造例2]偏光元件之製作 [Manufacturing Example 2] Production of a polarizing element

將聚合度2,400、皂化度99.9莫耳%、厚度30μm之PVA系樹脂膜浸入30℃之溫水中,一面使膜膨潤一面進行單軸延伸以使PVA系樹脂膜之長度變為其初始長度之2.0倍。繼而,將PVA系樹脂膜浸入以0.3重量%之濃度含有碘及碘化鉀(重量比:0.5:8)之混合物之水溶液(染色浴)中,並且一面使膜單軸延伸一面進行染色,以PVA系樹脂膜之長度變為初始長度之3.0倍。之後,一面將PVA系樹脂膜浸入含有5重量%硼酸及3重量%碘化鉀之水溶液(交聯浴1)中一面延伸PVA系樹脂膜,以使其長度變為初始長度之3.7倍。之後,於含有4重量%硼酸及5重量%碘化鉀之60℃之水溶液(交聯浴2)中延伸PVA系樹脂膜,以使其長度變為初始長度之6倍。進而,於含有3重量%碘化鉀之水溶液(碘浸漬浴)中對膜進行碘離子浸漬處理,並且之後於60℃之烘箱中乾燥4分鐘以獲得偏光元件。 The PVA-based resin film having a polymerization degree of 2,400, a degree of saponification of 99.9 mol%, and a thickness of 30 μm was immersed in warm water of 30° C., and the film was swollen while being uniaxially stretched so that the length of the PVA-based resin film became 2.0 of its original length. Times. Then, the PVA-based resin film was immersed in an aqueous solution (dye bath) containing a mixture of iodine and potassium iodide (weight ratio: 0.5:8) at a concentration of 0.3% by weight, and the film was uniaxially stretched while being dyed to a PVA system. The length of the resin film was changed to 3.0 times the initial length. After that, the PVA-based resin film was immersed in an aqueous solution (cross-linking bath 1) containing 5% by weight of boric acid and 3% by weight of potassium iodide to extend the PVA-based resin film so that the length thereof became 3.7 times the initial length. Thereafter, the PVA-based resin film was stretched in an aqueous solution (cross-linking bath 2) containing 4% by weight of boric acid and 5% by weight of potassium iodide to have a length of 6 times the original length. Further, the film was subjected to iodide ion immersion treatment in an aqueous solution containing 3 wt% of potassium iodide (iodine immersion bath), and then dried in an oven at 60 ° C for 4 minutes to obtain a polarizing element.

[製造例3-1]使用相位差膜A之抗反射膜之製作 [Production Example 3-1] Production of Antireflection Film Using Phase Difference Film A

經由包含聚乙烯醇系接著劑之接著劑層,於製造例2中製作之偏光元件之一個表面上積層製造例1-1中製作之相位差膜A,並且經由包含聚乙烯醇系接著劑之接著劑層,於該偏光元件之另一個表面上積層作為保護膜之三乙醯基纖維素(TAC)膜(由Konica Minolta公司製造,商品名:「KC2UA」,厚度:25μm),獲得抗反射膜A-I(保護膜/接著劑層/偏光元件/接著劑層/相位差層)。作為聚乙烯醇系接著劑,於30℃之溫度條件下將含有乙醯乙醯基之聚乙烯醇系樹脂(平均聚合度:1200,皂化度:98.5莫耳%,乙醯乙醯化度:5莫耳%)溶解於純水中;將溶液之固形物成分濃度調節為4%。 The retardation film A produced in Production Example 1-1 was laminated on one surface of the polarizing element produced in Production Example 2 via an adhesive layer containing a polyvinyl alcohol-based adhesive, and passed through a polyvinyl alcohol-based adhesive. Next, a layer of a triacetyl cellulose (TAC) film (manufactured by Konica Minolta Co., Ltd., trade name: "KC2UA", thickness: 25 μm) as a protective film was laminated on the other surface of the polarizing element to obtain antireflection. Film AI (protective film/adhesive layer/polarizing element/adhesive layer/phase difference layer). As a polyvinyl alcohol-based adhesive, a polyvinyl alcohol-based resin containing an ethyl acetonitrile group at a temperature of 30 ° C (average degree of polymerization: 1200, degree of saponification: 98.5 mol%, degree of acetylation: 5 mol%) was dissolved in pure water; the solid content concentration of the solution was adjusted to 4%.

[製造例3-2]使用相位差膜A之抗反射膜之製作 [Production Example 3-2] Production of Antireflection Film Using Phase Difference Film A

經由包含水性接著劑之接著劑層,於製造例2中製作之偏光元件之兩個表面積層作為保護膜之三乙醯基纖維素(TAC)膜(由Konica Minolta公司製造,商品名:「KC2UA」,厚度:25μm),獲得偏光板。經由包含丙烯酸系黏著劑之黏著劑層,於該偏光元件之一個表面上積層製造例1-1中製作之相位差膜A。藉此,獲得抗反射膜A-II(保護膜/接著劑層/偏光元件/接著劑層/保護膜/黏著劑層/相位差層)。 A triethylenesulfonated cellulose (TAC) film (manufactured by Konica Minolta Co., Ltd., trade name: "KC2UA", which is a protective film of two surface areas of the polarizing element produced in Production Example 2 via an adhesive layer containing an aqueous adhesive. "Thickness: 25 μm), and a polarizing plate was obtained. The retardation film A produced in Production Example 1-1 was laminated on one surface of the polarizing element via an adhesive layer containing an acrylic adhesive. Thereby, the antireflection film A-II (protective film/adhesive layer/polarizing element/adhesive layer/protective film/adhesive layer/phase difference layer) was obtained.

[製造例3-3]使用相位差膜B之抗反射膜之製作 [Manufacturing Example 3-3] Production of Antireflection Film Using Phase Difference Film B

經由包含聚乙烯醇系接著劑之接著劑層,於製造例2中製作之偏光元件之一個表面上積層製造例1-2中製作之相位差膜B,並且經由包含聚乙烯醇系接著劑之接著劑層,於該偏光元件之另一個表面上積層作為保護膜之三乙醯基纖維素(TAC)膜(由Konica Minolta公司製造,商品名:「KC2UA」,厚度:25μm),獲得抗反射膜B-I(保護膜/接著劑層/偏光元件/接著劑層/相位差層)。再者,作為聚乙烯醇系接著劑,於30℃之溫度條件下將含有乙醯乙醯基之聚乙烯醇系樹脂(平均聚合度:1200,皂化度:98.5莫耳%,乙醯乙醯化度:5莫耳%)溶解於純水中;將溶液之固形物成分濃度調節為4%。 The retardation film B produced in Production Example 1-2 was laminated on one surface of the polarizing element produced in Production Example 2 via an adhesive layer containing a polyvinyl alcohol-based adhesive, and passed through a polyvinyl alcohol-based adhesive. Next, a layer of a triacetyl cellulose (TAC) film (manufactured by Konica Minolta Co., Ltd., trade name: "KC2UA", thickness: 25 μm) as a protective film was laminated on the other surface of the polarizing element to obtain antireflection. Film BI (protective film/adhesive layer/polarizing element/adhesive layer/phase difference layer). Further, as a polyvinyl alcohol-based adhesive, a polyvinyl alcohol-based resin containing an ethyl acetonitrile group at a temperature of 30 ° C (average degree of polymerization: 1200, degree of saponification: 98.5 mol%, acetamidine) Degree of chemistry: 5 mol%) dissolved in pure water; the solid content concentration of the solution was adjusted to 4%.

[製造例3-4]使用相位差膜B之抗反射膜之製作 [Manufacturing Example 3-4] Production of Antireflection Film Using Phase Difference Film B

經由包含水系接著劑之接著劑層,於製造例2中製作之偏光元件之兩個表面積層作為保護膜之三乙醯基纖維素(TAC)膜(由Konica Minolta公司製造,商品名:「KC2UA」,厚度:25μm),獲得偏光板。經由包含丙烯酸系黏著劑之黏著劑層,於該偏光板之一個表面上積層製造例1-2中製作之相位差膜B,獲得抗反射膜B-II(保護膜/接著劑層/偏光元件/接著劑層/保護膜/黏著劑層/相位差層)。 A triethylenesulfonated cellulose (TAC) film (manufactured by Konica Minolta Co., Ltd., trade name: "KC2UA", which is a protective film of two surface areas of the polarizing element produced in Production Example 2, via an adhesive layer containing a water-based adhesive. "Thickness: 25 μm), and a polarizing plate was obtained. The retardation film B produced in Production Example 1-2 was laminated on one surface of the polarizing plate via an adhesive layer containing an acrylic adhesive to obtain an antireflection film B-II (protective film/adhesive layer/polarizing element) / adhesive layer / protective film / adhesive layer / phase difference layer).

[製造例4-1]樹脂層形成用組合物之製備 [Production Example 4-1] Preparation of Resin Layer Forming Composition

混合100重量份之2-羥乙基丙烯醯胺(由興人公司製造;在下文中 亦被稱為HEAA)、1重量份之光聚合起始劑(由BASF製造,商品名:「Irgacure 819」)製備樹脂層形成用組合物1。 Mix 100 parts by weight of 2-hydroxyethyl acrylamide (manufactured by Xingren Company; below) Also known as HEAA), 1 part by weight of a photopolymerization initiator (manufactured by BASF, trade name: "Irgacure 819") was used to prepare a composition 1 for forming a resin layer.

[製造例4-2]樹脂層形成用組合物之製備 [Production Example 4-2] Preparation of Resin Layer Forming Composition

除使用70重量份之HEAA及30重量份之丙烯酸4-羥基丁酯(由大阪有機化學工業公司製造;在下文中亦被稱為4-HBA)代替100重量份之HEAA以外,以與製造例4-1相同之方式製備樹脂層形成用組合物2。 In addition to using 70 parts by weight of HEAA and 30 parts by weight of 4-hydroxybutyl acrylate (manufactured by Osaka Organic Chemical Industry Co., Ltd.; hereinafter also referred to as 4-HBA) instead of 100 parts by weight of HEAA, and Production Example 4 Composition 2 for forming a resin layer was prepared in the same manner as in -1.

[製造例4-3]樹脂層形成用組合物之製備 [Production Example 4-3] Preparation of Resin Layer Forming Composition

除使用50重量份之HEAA及50重量份之4-HBA代替100重量份之HEAA,以與製造例4-1相同之方式製備樹脂層形成用組合物3。 The resin layer-forming composition 3 was prepared in the same manner as in Production Example 4-1, except that 50 parts by weight of HEAA and 50 parts by weight of 4-HBA were used instead of 100 parts by weight of HEAA.

[製造例4-4]樹脂層形成用組合物之製備 [Production Example 4-4] Preparation of Resin Layer Forming Composition

除使用30重量份之HEAA及70重量份之4-HBA代替100重量份之HEAA,以與製造例4-1相同之方式製備樹脂層形成用組合物4。 The resin layer-forming composition 4 was prepared in the same manner as in Production Example 4-1, except that 30 parts by weight of HEAA and 70 parts by weight of 4-HBA were used instead of 100 parts by weight of HEAA.

[製造例4-5]樹脂層形成用組合物之製備 [Production Example 4-5] Preparation of Resin Layer Forming Composition

除使用22重量份之HEAA及78重量份之4-HBA代替100重量份之HEAA,以與製造例4-1相同之方式製備樹脂層形成用組合物5。 The resin layer-forming composition 5 was prepared in the same manner as in Production Example 4-1, except that 22 parts by weight of HEAA and 78 parts by weight of 4-HBA were used instead of 100 parts by weight of HEAA.

[製造例4-6]樹脂層形成用組合物之製備 [Production Example 4-6] Preparation of Resin Layer Forming Composition

除使用15重量份之HEAA及85重量份之4-HBA代替100重量份之HEAA,以與製造例4-1相同之方式製備樹脂層形成用組合物6。 The resin layer-forming composition 6 was prepared in the same manner as in Production Example 4-1, except that 15 parts by weight of HEAA and 85 parts by weight of 4-HBA were used instead of 100 parts by weight of HEAA.

[製造例4-7]樹脂層形成用組合物之製備 [Production Example 4-7] Preparation of Resin Layer Forming Composition

除使用100重量份之4-HBA代替100重量份之HEAA外,以與製造例4-1相同之方式製備樹脂層形成用組合物7。 The resin layer-forming composition 7 was prepared in the same manner as in Production Example 4-1, except that 100 parts by weight of 4-HBA was used instead of 100 parts by weight of HEAA.

[製造例4-8]樹脂層形成用組合物之製備 [Production Example 4-8] Preparation of Resin Layer Forming Composition

除使用70重量份之4-丙烯醯基嗎啉(由興人公司製造;在下文中亦被稱為ACMO)及30重量份之丙烯酸四氫糠基酯(由大阪有機化學工業公司製造,商品名:「Viscoat#150」;在下文中亦被稱為THFA)代替100重量份之HEAA外,以與製造例4-1相同之方式製備樹脂組合物8。 In addition to 70 parts by weight of 4-propenylmercaptomorph (manufactured by Xingren Co., Ltd.; hereinafter also referred to as ACMO) and 30 parts by weight of tetrahydrofurfuryl acrylate (manufactured by Osaka Organic Chemical Industry Co., Ltd., trade name Resin composition 8 was prepared in the same manner as in Production Example 4-1 except that "Viscoat #150"; hereinafter also referred to as THFA) was used instead of 100 parts by weight of HEAA.

[製造例4-9]樹脂層形成用組合物之製備 [Production Example 4-9] Preparation of Resin Layer Forming Composition

除使用45重量份之ACMO及55重量份之THFA代替100重量份之HEAA,以與製造例4-1相同之方式製備樹脂組合物9。 Resin composition 9 was prepared in the same manner as in Production Example 4-1, except that 45 parts by weight of ACMO and 55 parts by weight of THFA were used instead of 100 parts by weight of HEAA.

[製造例4-10]樹脂層形成用組合物之製備 [Production Example 4-10] Preparation of Resin Layer Forming Composition

除使用25重量份之ACMO及75重量份之THFA代替100重量份之HEAA外,以與製造例4-1相同之方式製備樹脂組合物10。 Resin composition 10 was prepared in the same manner as in Production Example 4-1, except that 25 parts by weight of ACMO and 75 parts by weight of THFA were used instead of 100 parts by weight of HEAA.

[製造例5-1]樹脂層之組合物之製備 [Production Example 5-1] Preparation of Composition of Resin Layer

混合90重量份之環氧化合物(由共榮社化學公司製造,商品名「EPOLIGHT 80MF」)、10重量份之氧雜環丁烷化合物(由東亞合成公司製造,商品名「OXT-221」)、3重量份之光聚合起始劑(由San-Apro公司製造,商品名「CPI-100P」)、及0.5重量份增感劑(由川崎化成工業公司製造,商品名「UVS-1331」)製備樹脂層形成用組合物11。 90 parts by weight of an epoxy compound (manufactured by Kyoeisha Chemical Co., Ltd., trade name "EPOLIGHT 80MF"), and 10 parts by weight of an oxetane compound (manufactured by Toagosei Co., Ltd., trade name "OXT-221") 3 parts by weight of a photopolymerization initiator (manufactured by San-Apro Co., Ltd., trade name "CPI-100P"), and 0.5 part by weight of a sensitizer (manufactured by Kawasaki Kasei Kogyo Co., Ltd., trade name "UVS-1331") A composition 11 for forming a resin layer was prepared.

[製造例5-2]樹脂層形成用組合物之製備 [Production Example 5-2] Preparation of Resin Layer Forming Composition

除使用90重量份之環氧化合物(由共榮社化學公司製造,商品名「EPOLIGHT 100MF」)代替90重量份之環氧化合物(由共榮社化學公司製造,商品名:「EPOLIGHT 80MF」)外,以與製造例5-1相同之方式製備樹脂層形成用組合物12。 In place of 90 parts by weight of an epoxy compound (trade name "EPOLIGHT 100MF" manufactured by Kyoeisha Chemical Co., Ltd.), 90 parts by weight of an epoxy compound (manufactured by Kyoeisha Chemical Co., Ltd., trade name: "EPOLIGHT 80MF") was used. Further, the resin layer-forming composition 12 was prepared in the same manner as in Production Example 5-1.

[製備例5-3]樹脂層形成用組合物之製備 [Preparation Example 5-3] Preparation of Resin Layer Forming Composition

除使用90重量份之環氧化合物(由共榮社化學公司製造,商品名:「EPOLIGHT 40E」)代替90重量份之環氧化合物(由共榮社化學公司製造,商品名:「EPOLIGHT 80MF」),以與製造例5-1相同之方式製備樹脂層形成用組合物13。 In place of 90 parts by weight of an epoxy compound (trade name: "EPOLIGHT 40E" manufactured by Kyoeisha Chemical Co., Ltd.), 90 parts by weight of an epoxy compound (manufactured by Kyoeisha Chemical Co., Ltd., trade name: "EPOLIGHT 80MF") was used. The resin layer-forming composition 13 was prepared in the same manner as in Production Example 5-1.

[實施例1-1] [Example 1-1]

使用丙烯酸系玻璃(由松浪硝子工業公司製造)作為第一基板,並且經由包含丙烯酸系黏著劑之黏著劑層,於該第1基板上積層製造例 3-1中製作之抗反射膜A-I。此時,進行積層以使抗反射膜A-I之相位差層在第一基板側上。 An acrylic glass (manufactured by Matsuron Glass Industry Co., Ltd.) was used as the first substrate, and an adhesive layer was formed on the first substrate via an adhesive layer containing an acrylic adhesive. Anti-reflection film A-I made in 3-1. At this time, lamination is performed so that the retardation layer of the anti-reflection film A-I is on the first substrate side.

繼而,塗覆製造例4-1中製備之樹脂層形成用組合物1,以覆蓋抗反射膜A-I,進而於樹脂層形成用組合物1之塗覆層上積層第二基板(由松浪硝子工業公司製造之丙烯酸系玻璃)。其後,使用UV照射器照射紫外線(照射量:5J/cm2),於所形成之積層體,使樹脂層形成用組合物硬化,獲得圖1所示之構成之光學積層體。 Then, the composition 1 for forming a resin layer prepared in Production Example 4-1 was applied to cover the antireflection film AI, and further, a second substrate was laminated on the coating layer of the composition 1 for forming a resin layer (by Songlang Glass Industry) Acrylic glass manufactured by the company). Then, ultraviolet rays (irradiation amount: 5 J/cm 2 ) were irradiated with a UV irradiator, and the resin layer-forming composition was cured in the formed laminate to obtain an optical layered body having the configuration shown in Fig. 1 .

[實施例1-2~1-11、比較例1-1~1-2] [Examples 1-2 to 1-11, Comparative Examples 1-1 to 1-2]

除使用表1中所示之樹脂層形成用組合物代替樹脂層形成用組合物1外,以與實施例1-1相同之方式獲得光學積層體。 An optical layered body was obtained in the same manner as in Example 1-1, except that the composition for forming a resin layer shown in Table 1 was used instead of the composition for forming a resin layer.

[比較例1-3~1-15] [Comparative Example 1-3~1-15]

除使用表1中所示之樹脂層形成用組合物代替樹脂層形成用組合物1;並且使用製造例3-2中製作之抗反射膜A-II代替製造例3-1中製作之抗反射膜A-I外,以與實施例1-1相同之方式獲得光學積層體。 The resin layer-forming composition shown in Table 1 was used instead of the resin layer-forming composition 1; and the anti-reflection film A-II produced in Production Example 3-2 was used instead of the anti-reflection produced in Production Example 3-1. An optical laminate was obtained in the same manner as in Example 1-1 except for the film AI.

[比較例1-16] [Comparative Example 1-16]

除不使用樹脂層形成用組合物1;並且以於抗反射膜與第二基板之間存在空隙之狀態下使用隔體積層抗反射膜與第二基板外,以與實施例1-1相同之方式獲得光學積層體。 The composition 1 for resin layer formation is not used; and the barrier layer antireflection film and the second substrate are used in a state where a gap exists between the antireflection film and the second substrate, and is the same as in the embodiment 1-1. The optical laminate is obtained in a manner.

[實施例2-1] [Example 2-1]

除使用製造例3-3中製作之抗反射膜B-I代替製造例3-1中製作之抗反射膜A-I外,以與實施例1-1相同之方式獲得光學積層體。 An optical layered body was obtained in the same manner as in Example 1-1, except that the antireflection film B-I produced in Production Example 3-3 was used instead of the antireflection film A-I produced in Production Example 3-1.

[實施例2-2~2-11,比較例2-1~2-2] [Examples 2-2 to 2-11, Comparative Examples 2-1 to 2-2]

除使用表2中所示之樹脂層形成用組合物代替樹脂層形成用組合物1外,以與實施例2-1相同之方式獲得光學積層體。 An optical layered body was obtained in the same manner as in Example 2-1, except that the composition for forming a resin layer shown in Table 2 was used instead of the composition for forming a resin layer.

[比較例2-3~2-15] [Comparative Example 2-3~2-15]

除使用表2中所示之樹脂層形成用組合物代替樹脂層形成用組合 物1,並且使用製造例3-4中製作之抗反射膜B-II代替製造例3-3中製作之抗反射膜B-I外,以與實施例2-1相同之方式獲得光學積層體。 In addition to using the resin layer forming composition shown in Table 2, instead of the resin layer forming combination The optical layered body was obtained in the same manner as in Example 2-1 except that the antireflection film B-II produced in Production Example 3-4 was used instead of the antireflection film B-I produced in Production Example 3-3.

[比較例2-16] [Comparative Example 2-16]

除不使用樹脂層形成用組合物1;並且於抗反射膜與第二基板之間存在空隙之狀態下經由隔體積層抗反射膜及第二基板外,以與實施例2-1相同之方式獲得光學積層體。 The composition 1 for forming a resin layer was not used; and in the same manner as in Example 2-1, the gap between the antireflection film and the second substrate was passed through the barrier film antireflection film and the second substrate. An optical laminate is obtained.

<評價> <evaluation>

將實施例及比較例中獲得之光學積層體供於以下評價。結果示於表1及表2中。 The optical laminates obtained in the examples and the comparative examples were subjected to the following evaluations. The results are shown in Tables 1 and 2.

(1)儲存彈性模數E' (1) Storage elastic modulus E'

準備寬度5mm×長度30mm之相位差層(相位差膜)樣品,並且利用由TA Instruments製造之「DMA RSA-III」測量其於-40℃~120℃下之儲存彈性模數E'。測量條件如下:拉伸模式,升溫速度10℃/min,頻率1Hz,初始應變0.1%。 A phase difference layer (phase difference film) sample having a width of 5 mm × a length of 30 mm was prepared, and its storage elastic modulus E' at -40 ° C to 120 ° C was measured using "DMA RSA-III" manufactured by TA Instruments. The measurement conditions were as follows: a stretching mode, a heating rate of 10 ° C/min, a frequency of 1 Hz, and an initial strain of 0.1%.

(2)樹脂層之玻璃轉移溫度(Tg) (2) Glass transition temperature (Tg) of the resin layer

準備寬度5mm×長度30mm之樹脂層樣品,並且利用由TA Instruments製造之「DMA RSA-III」測量其於-40℃~120℃下之儲存彈性模數E'及損失彈性模數E",根據tanδ=E"/E'之峰值確定其玻璃轉移溫度Tg。測量條件如下:拉伸模式,升溫速率10℃/min,頻率1Hz,初始應變0.1%。 A resin layer sample having a width of 5 mm × a length of 30 mm was prepared, and the storage elastic modulus E' and the loss elastic modulus E" at -40 ° C to 120 ° C were measured by "DMA RSA-III" manufactured by TA Instruments, according to The peak of tan δ = E" / E' determines its glass transition temperature Tg. The measurement conditions were as follows: tensile mode, heating rate 10 ° C / min, frequency 1 Hz, initial strain 0.1%.

(3)加熱試驗後之外觀 (3) Appearance after heating test

將所獲得之光學積層體投入至85℃之烘箱中240小時,並且以目視觀察其外觀之變化。將試驗樣品至測量者之眼睛之距離設定為5cm、30cm、及60cm,並且通過以下標準進行評價。 The obtained optical layered body was placed in an oven at 85 ° C for 240 hours, and the change in appearance was visually observed. The distance from the test sample to the eyes of the measurer was set to 5 cm, 30 cm, and 60 cm, and evaluated by the following criteria.

◎◎:當試驗樣品至測量者之眼睛之距離為5cm時未觀察到顏色不均勻。 ◎ ◎: No color unevenness was observed when the distance between the test sample and the eye of the measurer was 5 cm.

◎:當試驗樣品至測量者之眼睛之距離為30cm時未觀察到顏色不均勻。 ◎: No color unevenness was observed when the distance between the test sample and the eye of the measurer was 30 cm.

○:當試驗樣品至測量者之眼睛之距離為30cm時略微觀察到顏色不均勻。 ○: Color unevenness was slightly observed when the distance between the test sample and the eye of the measurer was 30 cm.

×:當試驗樣品至測量者之眼睛之距離為60cm時觀察到顏色不均勻。 ×: Color unevenness was observed when the distance between the test sample and the eye of the measurer was 60 cm.

××:當試驗樣品至測量者之眼睛之距離為60cm時明顯觀察到顏色不均勻。 ××: Color unevenness was clearly observed when the distance between the test sample and the eye of the measurer was 60 cm.

(4)加熱試驗後之相位差不均勻 (4) Uneven phase difference after heating test

將所獲得之光學積層體投入至85℃之烘箱中240小時。於加熱之後,利用由王子計測公司製造之「KOBRA-PR」測定光學積層體之面內端部及面內中心部之相位差,並且根據等式(端部之相位差)-(中心部之相位差)來評價相位差不均勻。 The obtained optical laminate was placed in an oven at 85 ° C for 240 hours. After heating, the phase difference between the in-plane end portion and the in-plane center portion of the optical layered body was measured by "KOBRA-PR" manufactured by Oji Scientific Co., Ltd., and according to the equation (phase difference of the end portion) - (center portion Phase difference) to evaluate the phase difference unevenness.

(5)加熱試驗後之尺寸變化 (5) Dimensional change after heating test

將所獲得之光學積層體投入85℃之烘箱中240小時。利用由Mitutoyo Corporation製造之雙軸長度測量機器測定其抗反射膜於加熱前後之尺寸,並且評價由加熱導致之尺寸變化(於其偏光元件之延伸方向上之尺寸變化)。 The obtained optical laminate was placed in an oven at 85 ° C for 240 hours. The size of the antireflection film before and after heating was measured using a biaxial length measuring machine manufactured by Mitutoyo Corporation, and the dimensional change caused by heating (size change in the direction in which the polarizing element was extended) was evaluated.

[產業上之可利用性] [Industrial availability]

本發明之光學積層體適合用於液晶顯示裝置及有機EL顯示裝置之圖像顯示裝置。 The optical layered body of the present invention is suitably used for an image display device of a liquid crystal display device and an organic EL display device.

10‧‧‧第1基板 10‧‧‧1st substrate

20‧‧‧抗反射膜 20‧‧‧Anti-reflective film

21‧‧‧偏光元件 21‧‧‧Polarized components

22‧‧‧相位差層 22‧‧‧ phase difference layer

23‧‧‧黏著劑層 23‧‧‧Adhesive layer

24‧‧‧保護膜 24‧‧‧Protective film

30‧‧‧樹脂層 30‧‧‧ resin layer

40‧‧‧第2基板 40‧‧‧2nd substrate

100‧‧‧光學積層體 100‧‧‧Optical laminate

Claims (7)

一種光學積層體,其具備:第一基板;第二基板,其配置於該第一基板之單側;抗反射膜,其配置於第一基板與該第二基板之間;及樹脂層,其於該第一基板與該第二基板之間以覆蓋該抗反射膜之方式配置;且該抗反射膜包括偏光元件及與該偏光元件接著之相位差層;並且該樹脂層之於25℃下之儲存彈性模數為1×106Pa以上。 An optical laminate comprising: a first substrate; a second substrate disposed on one side of the first substrate; an anti-reflection film disposed between the first substrate and the second substrate; and a resin layer Arranging between the first substrate and the second substrate to cover the anti-reflection film; and the anti-reflection film includes a polarizing element and a phase difference layer adjacent to the polarizing element; and the resin layer is at 25 ° C The storage elastic modulus is 1 × 10 6 Pa or more. 如請求項1之光學積層體,其中上述相位差層起λ/4板之作用。 The optical layered body of claim 1, wherein the phase difference layer functions as a λ/4 plate. 如請求項1之光學積層體,其中上述相位差層顯示出逆分散波長特性。 The optical layered body of claim 1, wherein the phase difference layer exhibits an inverse dispersion wavelength characteristic. 如請求項1之光學積層體,其中上述相位差層包括聚碳酸酯系樹脂膜。 The optical layered body according to claim 1, wherein the phase difference layer comprises a polycarbonate resin film. 如請求項1之光學積層體,其中上述相位差層含有光彈性係數30×10-12Pa以下之樹脂。 The optical layered body according to claim 1, wherein the phase difference layer contains a resin having a photoelastic coefficient of 30 × 10 -12 Pa or less. 如請求項1之光學積層體,其中上述相位差層之遲相軸與上述偏光元件之吸收軸所成之角度為35°~55°。 The optical layered body according to claim 1, wherein the retardation axis of the phase difference layer and the absorption axis of the polarizing element form an angle of 35 to 55. 如請求項1之光學積層體,其中上述偏光元件與上述相位差層經由接著劑層而積層,並且該接著劑層之厚度為1μm以下。 The optical layered body according to claim 1, wherein the polarizing element and the retardation layer are laminated via an adhesive layer, and the thickness of the adhesive layer is 1 μm or less.
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