TW201710521A - Aluminum alloy extruded material having positive electrode oxide film and excellent external appearance quality and production method therefor - Google Patents

Aluminum alloy extruded material having positive electrode oxide film and excellent external appearance quality and production method therefor Download PDF

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TW201710521A
TW201710521A TW105121143A TW105121143A TW201710521A TW 201710521 A TW201710521 A TW 201710521A TW 105121143 A TW105121143 A TW 105121143A TW 105121143 A TW105121143 A TW 105121143A TW 201710521 A TW201710521 A TW 201710521A
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extruded material
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Masato YATSUKURA
Hiroaki Miyaura
Takashi Fujii
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Nippon Light Metal Co
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C21/00Alloys based on aluminium
    • C22C21/10Alloys based on aluminium with zinc as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C21/00Alloys based on aluminium
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21CMANUFACTURE OF METAL SHEETS, WIRE, RODS, TUBES OR PROFILES, OTHERWISE THAN BY ROLLING; AUXILIARY OPERATIONS USED IN CONNECTION WITH METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL
    • B21C23/00Extruding metal; Impact extrusion
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/04Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon
    • C22F1/053Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon of alloys with zinc as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/04Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
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  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Extrusion Of Metal (AREA)

Abstract

The purpose of the present invention is to provide a 7000-series aluminum alloy extruded material having a desired strength and being unlikely to have a streak pattern formed on the surface of a positive electrode oxide film. The present invention provides: an aluminum alloy extruded material having excellent external appearance quality and having a positive electrode oxide film having a metal composition being a re-crystalized composition; and a production method therefor. The aluminum alloy extruded material contains 4.0%-7.5% by mass Zn, 1.0%-2.2% by mass Mg, 0.05%-0.20% by mass Fe, no more than 0.30% by mass Cu, 0.005%-0.04% by mass Ti, 0.001%-0.02% by mass B, no more than 0.15% by mass Si, no more than 0.05% by mass Zr, no more than 0.05% by mass Mn, no more than 0.05% by mass Cr, and no more than 0.05% by mass V. The total Zr, Mn, Cr, V, and Ti content expressed by [Zr + Mn + Cr + V + Ti] fulfils the relationship [Zr + Mn + Cr + V + Ti] <= 0.10% by mass. The remainder comprises aluminum and unavoidable impurities, except when the Zn content is no more than 6.0% by mass and the Mg content is no more than 1.2% by mass.

Description

具有陽極氧化被膜且外觀品質良好的鋁合金擠製材料及其製造方法Aluminum alloy extruded material having anodized film and good appearance quality and manufacturing method thereof

本發明係關於具有陽極氧化被膜且外觀品質良好的鋁合金擠製材料及其製造方法,特別是關於陽極氧化被膜性良好之電子設備框體用鋁合金擠製材料及其製造方法。The present invention relates to an aluminum alloy extruded material having an anodized film and having good appearance quality, and a method for producing the same, and more particularly to an aluminum alloy extruded material for an electronic device frame having good anodizing film properties and a method for producing the same.

攜帶用電腦等係年年持續地進行小型化、薄壁化及輕量化。伴隨於此而要求框體材料之薄壁化。為了能夠承受薄壁化,框體材料逐漸採用將鋁合金中強度最高之7000系鋁合金經陽極氧化被膜處理而得之擠製材料。The portable computer and the like are continuously miniaturized, thinned, and lightweighted. Along with this, the thinning of the frame material is required. In order to be able to withstand thinning, the frame material is gradually obtained by subjecting the 7000 series aluminum alloy having the highest strength among the aluminum alloys to an anodized film to obtain an extruded material.

然而,若對於7000系鋁合金擠製材料進行陽極氧化被膜處理,會出現與擠製方向平行之條紋圖案,有美觀上之問題。該條紋圖案據認為是在擠製加工時鑄造組織沿擠製方向受伸展而成為了纖維狀(Fiber)組織者,由於陽極氧化被膜處理而凸顯出來。例如在專利文獻1中,擠製材料之金屬組織成為再結晶組織。However, if the 7000 series aluminum alloy extruded material is subjected to anodizing film treatment, a stripe pattern parallel to the extrusion direction may occur, which is aesthetically pleasing. The stripe pattern is believed to be formed when the cast structure is stretched in the extrusion direction during the extrusion process for the fibrous tissue, and is highlighted by the anodized film treatment. For example, in Patent Document 1, the metal structure of the extruded material becomes a recrystallized structure.

專利文獻1:日本特開2012-246555號公報Patent Document 1: Japanese Laid-Open Patent Publication No. 2012-246555

然而,金屬組織成為再結晶組織雖然減少了條紋圖案,但未獲得令人滿意之美觀性。本案發明者對關於條紋圖案之原因進行深入研究,而得知不僅是金屬組織之結晶形狀,結晶內部及晶粒邊界中鋁以外之元素的濃度偏析、化合物之結晶狀態及再結晶組織彼此間之粒徑的差亦有很大之影響。However, the metal structure becomes a recrystallized structure although the streak pattern is reduced, but satisfactory aesthetics are not obtained. The inventors of the present invention conducted intensive studies on the cause of the stripe pattern, and learned that not only the crystal shape of the metal structure, the concentration segregation of elements other than aluminum in the crystal interior and the grain boundary, the crystal state of the compound, and the recrystallized structure therebetween The difference in particle size also has a large effect.

鋁以外之元素為偏析之部分或有結晶物之處,相較於其他部分有較難形成陽極氧化被膜之趨勢。認為其原因為濃度偏析之影響導致電性質不相同。也就是說,包晶系元素在結晶粒內濃度增大,共晶系元素被掃出到晶粒邊界,而在結晶粒內及晶粒邊界產生濃度偏析。在擠製加工時,濃度偏析部分也與鑄造組織之結晶粒一樣地會沿擠製方向受伸展,而使Zn、Mn之主要元素之濃度偏析薄的層形成為條紋狀,陽極氧化被膜之厚度造成顏色的濃淡,據認為這是使得在陽極氧化被膜之表面看到條紋的原因。Where the element other than aluminum is a part of segregation or crystallized, it is more difficult to form an anodized film than other parts. The reason is considered to be that the influence of concentration segregation results in different electrical properties. That is to say, the concentration of the peritectic elements in the crystal grains increases, and the eutectic elements are swept out to the grain boundaries, and concentration segregation occurs in the crystal grains and grain boundaries. In the extrusion processing, the concentration segregation portion is also stretched in the extrusion direction like the crystal grains of the cast structure, and the thin layer in which the concentration of the main elements of Zn and Mn is segregated is formed into a stripe shape, and the thickness of the anodized film is formed. The color is caused to be shaded, which is believed to be the cause of streaking on the surface of the anodized film.

又,除此之外也有結晶物存在,因為擠製加工伴隨使得結晶粒伸展,如此之結晶物散布於擠製方向上也成為可看到條紋之原因。Further, in addition to this, crystals are present because the extrusion process is accompanied by stretching of the crystal grains, and the fact that the crystal grains are dispersed in the extrusion direction also becomes a cause of streaking.

藉由擠製加工,使鑄造組織伸展成為纖維狀之組織,但此時濃度偏析部或結晶物也會伸展。據認為即使進行再結晶化,使結晶組織從纖維狀之組織成為係等軸晶之再結晶組織,仍因為留下之濃度偏析部或結晶物相仍維持著伸展後之狀態,進行陽極氧化被膜處理時可看見條紋。 此外,已知道在再結晶組織中,混雜有結晶粒徑差大之結晶之處看起來也是條紋狀。The extruded structure is stretched into a fibrous structure by extrusion processing, but at this time, the concentration segregation portion or the crystal body is also stretched. It is considered that even if recrystallization is performed, the crystal structure is changed from a fibrous structure to a recrystallized structure of an equiaxed crystal, and the anodized film is still left because the concentration segregation portion or the crystal phase remains after stretching. Stripes are visible during processing. Further, it has been known that in the recrystallized structure, crystals having a large crystal grain size difference are also striped.

以如上述之事情為鑑深入研究之結果,本案發明者找到具有耐力380MPa以上之高強度而且抑制濃度偏析或化合物之過剩之結晶析出及再結晶組織之結晶粒徑的差之最適當的合金組成的範圍。Based on the results of the above-mentioned research, the inventors of the present invention found the most suitable alloy composition having a high strength of 380 MPa or more and suppressing concentration segregation or excessive crystal precipitation of the compound and crystal grain size of the recrystallized structure. The scope.

本發明之目的為提供具有期望之強度而且在陽極氧化被膜之表面不容易出現條紋圖案之7000系鋁合金擠製材料。SUMMARY OF THE INVENTION An object of the present invention is to provide a 7000-series aluminum alloy extruded material having a desired strength and having no streaky pattern on the surface of an anodized film.

根據本發明,提供一種具有陽極氧化被膜且外觀品質良好的鋁合金擠製材料,其含有: Zn:4.0質量%以上7.5質量%以下、 Mg:1.0質量%以上2.2質量%以下、 Fe:0.05質量%以上0.20質量%以下、 Cu:0.30質量%以下、 Ti:0.005質量%以上0.04質量%以下、 B:0.001質量%以上0.02質量%以下、 Si:0.15質量%以下、 Zr:0.05質量%以下、 Mn:0.05質量%以下、 Cr:0.05質量%以下、 V:0.05質量%以下, 且為Zr、Mn、Cr、V及Ti之含量合計之[Zr+Mn+Cr+V+Ti]滿足 [Zr+Mn+Cr+V+Ti]≦0.10質量%之關係, 除了Zn之含量為6.0質量%以下且Mg之含量為1.2質量%以下之範圍,剩餘部份由鋁及無法避免之雜質構成,且金屬組織為再結晶組織。According to the present invention, there is provided an aluminum alloy extruded material having an anodized film and having good appearance quality, comprising: Zn: 4.0% by mass or more and 7.5% by mass or less, Mg: 1.0% by mass or more and 2.2% by mass or less, Fe: 0.05 mass % or more and 0.20 mass% or less, Cu: 0.30 mass% or less, Ti: 0.005 mass% or more and 0.04 mass% or less, B: 0.001 mass% or more and 0.02 mass% or less, Si: 0.15 mass% or less, and Zr: 0.05 mass% or less. Mn: 0.05% by mass or less, Cr: 0.05% by mass or less, V: 0.05% by mass or less, and the total content of Zr, Mn, Cr, V, and Ti [Zr+Mn+Cr+V+Ti] satisfies [Zr +Mn+Cr+V+Ti] ≦0.10% by mass, except that the content of Zn is 6.0% by mass or less and the content of Mg is 1.2% by mass or less, and the remainder is composed of aluminum and unavoidable impurities, and The metal structure is a recrystallized structure.

根據本發明之一態樣,其特徵為在上述之鋁合金擠製材料中,在陽極氧化處理面,Zn高濃度相及Zn低濃度相平行於擠製方向,且在垂直於擠製方向之方向而以層狀存在,於寬0.1mm以上3mm以下之範圍,Zn濃度差為1%以下。According to an aspect of the present invention, in the above-mentioned aluminum alloy extruded material, on the anodized surface, the Zn high concentration phase and the Zn low concentration phase are parallel to the extrusion direction, and are perpendicular to the extrusion direction. The direction is in the form of a layer, and the difference in Zn concentration is 1% or less in a range of 0.1 mm or more and 3 mm or less.

根據本發明之一態樣,其特徵為在上述之鋁合金擠製材料中,陽極氧化被膜處理面之再結晶組織之結晶粒大小,按平均值計,為200μm以下,最大結晶粒大小為1mm以下。According to an aspect of the present invention, in the above-mentioned aluminum alloy extruded material, the crystal grain size of the recrystallized structure of the anodized film-treated surface is 200 μm or less on an average value, and the maximum crystal grain size is 1 mm. the following.

根據本發明之一態樣,其特徵為在上述之鋁合金擠製材料中,金屬間化合物(結晶物)佔陽極氧化處理面之面積率未達2%。According to an aspect of the present invention, in the above-mentioned aluminum alloy extruded material, the area ratio of the intermetallic compound (crystal) to the anodized surface is less than 2%.

根據本發明之一態樣,提供一種鋁合金擠製材料之製造方法,其特徵為將鑄造材以均質化處理之維持條件為400~560℃下,進行1~24小時處理,在擠製步驟中以擠製比超過20進行擠製加工,使擠製加工中之型材的溫度成為420℃以上的方式進行擠製,且時效處理步驟為在100~180℃處理1~30小時。According to an aspect of the present invention, a method for producing an aluminum alloy extruded material is provided, characterized in that the casting material is subjected to homogenization treatment at a temperature of 400 to 560 ° C for 1 to 24 hours, in an extrusion step. In the middle, the extrusion ratio is over 20, and the extrusion process is performed so that the temperature of the profile in the extrusion process is 420 ° C or higher, and the aging treatment step is performed at 100 to 180 ° C for 1 to 30 hours.

根據本發明提供具有期望之強度,而且陽極氧化被膜之表面不容易產生條紋圖案且外觀品質良好的7000系鋁合金擠製材料及其製造方法。According to the present invention, there is provided a 7000-series aluminum alloy extruded material having a desired strength and having a surface of an anodized film which is less likely to generate a streak pattern and which is excellent in appearance quality, and a method for producing the same.

以下說明本發明之實施形態。Embodiments of the present invention will be described below.

[鋁合金擠製材料] 關於本實施形態之具有陽極氧化被膜之鋁合金擠製材料其特徵為,該鋁合金擠製材料含有: Zn:4.0質量%以上7.5質量%以下、 Mg:1.0質量%以上2.2質量%以下、 Fe:0.05質量%以上0.20質量%以下、 Cu:0.30質量%以下、 Ti:0.005質量%以上0.04質量%以下、 B:0.001質量%以上0.02質量%以下、 Si:0.15質量%以下、 Zr:0.05質量%以下、 Mn:0.05質量%以下、 Cr:0.05質量%以下、 V:0.05質量%以下, 且為Zr、Mn、Cr、V及Ti之含量合計之[Zr+Mn+Cr+V+Ti]滿足 [Zr+Mn+Cr+V+Ti]≦0.10質量%之關係, 除了Zn之含量為6.0質量%以下且Mg之含量為1.2質量%以下之範圍,剩餘部份由鋁及無法避免之雜質構成,且金屬組織為再結晶組織。[Aluminum alloy extruded material] The aluminum alloy extruded material having an anodized film according to the present embodiment is characterized in that the aluminum alloy extruded material contains: Zn: 4.0% by mass or more and 7.5% by mass or less, Mg: 1.0% by mass 2.2 mass% or less, Fe: 0.05 mass% or more and 0.20 mass% or less, Cu: 0.30 mass% or less, Ti: 0.005 mass% or more and 0.04 mass% or less, B: 0.001 mass% or more and 0.02 mass% or less, Si: 0.15 mass % or less, Zr: 0.05% by mass or less, Mn: 0.05% by mass or less, Cr: 0.05% by mass or less, V: 0.05% by mass or less, and the total content of Zr, Mn, Cr, V, and Ti [Zr+Mn +Cr+V+Ti] satisfies the relationship of [Zr+Mn+Cr+V+Ti]≦0.10% by mass, except for the content of Zn of 6.0% by mass or less and the content of Mg of 1.2% by mass or less, the remainder It consists of aluminum and unavoidable impurities, and the metal structure is a recrystallized structure.

由上述組成構成之鋁合金擠製材料具有期望之強度,而且具有陽極氧化被膜之表面不容易出現條紋圖案之效果。 以下針對關於本實施形態之鋁合金擠製材料之各元素進行說明。The aluminum alloy extruded material composed of the above composition has a desired strength, and has an effect that the surface of the anodized film is less likely to have a streak pattern. Hereinafter, each element of the aluminum alloy extruded material of the present embodiment will be described.

(Zn:鋅) Zn及Mn係作為Zn-Mg相析出,貢獻於合金之高強度化。Zn之含量為4.0質量%以上時,可獲得充分之強度,Zn之含量若為7.5質量%以下,可獲得良好之耐蝕性。 關於本實施形態之鋁合金擠製材料,Zn之含量為4.0質量%以上7.5質量%以下,更宜為4.0質量%以上7.0質量%以下,進一步宜為4.0質量%以上6.0質量%以下,更進一步宜為4.0質量%以上未達5.5質量%,最理想為4.0質量%以上5.0質量%以下。(Zn: Zinc) Zn and Mn are precipitated as a Zn-Mg phase, contributing to the high strength of the alloy. When the content of Zn is 4.0% by mass or more, sufficient strength can be obtained, and if the content of Zn is 7.5% by mass or less, good corrosion resistance can be obtained. In the aluminum alloy extruded material of the present embodiment, the content of Zn is 4.0% by mass or more and 7.5% by mass or less, more preferably 4.0% by mass or more and 7.0% by mass or less, and further preferably 4.0% by mass or more and 6.0% by mass or less. Further, further It is preferably 4.0% by mass or more and less than 5.5% by mass, and most preferably 4.0% by mass or more and 5.0% by mass or less.

(Mg:鎂) Mg之含量若為1.0質量%以上,可獲得充分之強度,Mg之含量若為2.2質量%以下,可獲得良好之擠製加工性。 關於本實施形態之鋁合金擠製材料,Mg之含量為1.0質量%以上2.2質量%以下,更宜為1.2質量%以上2.2質量%以下,進一步宜為1.3質量%以上2.2質量%以下,更進一步宜為1.4質量%以上2.2質量%以下,最理想為1.5質量%以上2.2質量%以下。 惟,Zn含量為6.0%質量以下時,宜使Mg之含量為1.2質量%以上,Zn含量為未達5.5質量%時,宜使Mg之含量為1.6質量%以上。(Mg: Magnesium) When the content of Mg is 1.0% by mass or more, sufficient strength can be obtained, and if the content of Mg is 2.2% by mass or less, good extrusion processability can be obtained. In the aluminum alloy extruded material of the present embodiment, the content of Mg is 1.0% by mass or more and 2.2% by mass or less, more preferably 1.2% by mass or more and 2.2% by mass or less, and further preferably 1.3% by mass or more and 2.2% by mass or less. Further, further It is preferably 1.4% by mass or more and 2.2% by mass or less, and most preferably 1.5% by mass or more and 2.2% by mass or less. When the Zn content is 6.0% by mass or less, the content of Mg is preferably 1.2% by mass or more, and when the Zn content is less than 5.5% by mass, the content of Mg is preferably 1.6% by mass or more.

(Fe:鐵) 關於本實施形態之鋁合金擠製材料係Fe之含量為0.05質量%以上0.20質量%以下。(Fe: Iron) The content of Fe in the aluminum alloy extruded material of the present embodiment is 0.05% by mass or more and 0.20% by mass or less.

Fe之含量若為0.05質量%以上,在均質化處理時,可使鑄造組織之大型再結晶化受到抑制。鑄塊中若有大型的結晶組織,在擠製加工時容易產生不均勻之變形,使擠製材料之尺寸難獲得指定之大小(精確度、扭曲或彎曲)。進一步地若小胚(billet)中有大型的結晶組織,在擠製後之再結晶化時,即使為等軸之再結晶組織,仍容易混雜大小不相同之再結晶粒組織。如此之組織若排列為層狀會成為色調差成為條紋狀的原因。若Fe之含量為0.20質量%以下,可使Fe與其他元素形成化合物之過剩結晶物的形成受到抑制,使條紋圖案之產生受到抑制。Fe之含量更宜為0.15質量%以下,若為此範圍內可更提高上述之效果。When the content of Fe is 0.05% by mass or more, large-scale recrystallization of the cast structure can be suppressed during the homogenization treatment. If there is a large crystal structure in the ingot, uneven deformation is likely to occur during the extrusion process, making it difficult to obtain the specified size (accuracy, distortion or bending) of the extruded material. Further, if there is a large crystal structure in the billet, it is easy to mix recrystallized grain structures having different sizes even if it is an equiaxed recrystallized structure after recrystallization after extrusion. If such a structure is arranged in a layered shape, the difference in hue will be a streak. When the content of Fe is 0.20% by mass or less, formation of excess crystals of Fe and other element forming compounds can be suppressed, and generation of a stripe pattern can be suppressed. The content of Fe is more preferably 0.15% by mass or less, and the above effects can be further improved in the range.

(Cu:銅) 關於本實施形態之鋁合金擠製材料,Cu之含量為0.30質量%以下。Cu之含量若超過0.30質量%,陽極氧化被膜容易泛黃,此外耐蝕性也容易惡化。(Cu: Copper) The aluminum alloy extruded material of the present embodiment has a Cu content of 0.30% by mass or less. When the content of Cu exceeds 0.30% by mass, the anodized film is easily yellowed, and the corrosion resistance is also likely to deteriorate.

此外,若Cu之含量超過0.15質量%,機械強度及耐應力腐蝕龜裂性(SCC)提高。Further, when the content of Cu exceeds 0.15% by mass, mechanical strength and stress corrosion cracking resistance (SCC) are improved.

(Ti:鈦、B:硼) 關於本實施形態之鋁合金擠製材料,Ti之含量為0.005質量%以上0.04質量%以下。此外,關於本實施形態之鋁合金擠製材料,B之含量為0.001質量%以上0.02質量%以下。(Ti: Titanium, B: Boron) The aluminum alloy extruded material of the present embodiment has a Ti content of 0.005 mass% or more and 0.04 mass% or less. Further, in the aluminum alloy extruded material of the present embodiment, the content of B is 0.001% by mass or more and 0.02% by mass or less.

若合金中之鑄造組織之結晶大,則擠製成形時容易產生不均勻之變形,同時也容易產生濃度偏析及再結晶組織之粒徑的不均勻化,故在鑄造之時添加Ti、B作為結晶粒之微細化劑。 只添加Ti時,會於母相中固溶,作為微細化劑之作用變小。此外,因為容易產生朝結晶內部之濃度偏析,宜將桿硬化劑(rod hardener)作為微細化劑使用並以TiB2 化合物的形式添加較為理想。另一方面,Ti或B若添加過量則會以化合物之形式過量地析出結晶,成為形成條紋圖案之原因,故有必要規定添加量之上限。If the crystal of the cast structure in the alloy is large, uneven deformation is likely to occur during extrusion, and concentration segregation and unevenness of the grain size of the recrystallized structure are likely to occur, so Ti and B are added as casting. A refining agent for crystal grains. When only Ti is added, it is solid-solved in the matrix phase, and the effect as a refining agent becomes small. Further, since segregation of concentration toward the inside of the crystal is likely to occur, it is preferable to use a rod hardener as a refining agent and to add it as a TiB 2 compound. On the other hand, when Ti or B is excessively added, crystals are excessively precipitated in the form of a compound, which causes the formation of a striped pattern. Therefore, it is necessary to define the upper limit of the amount of addition.

(Si:矽) 關於本實施形態之鋁合金擠製材料,Si之含量為0.15質量%以下。Si因為會與Mg形成Mg-Si系化合物而成為形成條紋圖案的原因之一,故規定其為0.15%以下較為理想。 此外,Si之含量更宜為0.1質量%以下,若Si之含量為該範圍,可更提高上述之效果。(Si: 矽) The aluminum alloy extruded material of the present embodiment has a Si content of 0.15% by mass or less. Si is one of the causes of forming a striped pattern by forming a Mg-Si-based compound with Mg. Therefore, it is preferably 0.15% or less. Further, the content of Si is more preferably 0.1% by mass or less, and if the content of Si is within this range, the above effects can be further enhanced.

(Zr:鋯、Mn:錳、Cr:鉻、V:釩) Zr、Mn、Cr、V因為有抑制擠製加工時之再結晶化之作用,故各別之含量宜為0.05質量%以下,更宜為0.02質量%以下。此外,此等之元素也有抑制Zn之擴散之作用。(Zr: zirconium, Mn: manganese, Cr: chromium, V: vanadium) Since Zr, Mn, Cr, and V have an effect of suppressing recrystallization during extrusion processing, the respective contents are preferably 0.05% by mass or less. More preferably, it is 0.02 mass% or less. In addition, these elements also have the effect of inhibiting the diffusion of Zn.

此外,因為上述元素難以利用熱處理(HO或擠製時之鑄塊加熱、擠製加工發熱)進行擴散,容易產生濃度偏析,若超過規定範圍,會成為陽極氧化被膜處理時形成條紋圖案之原因。In addition, since it is difficult to diffuse the above-mentioned elements by heat treatment (HO or ingot heating during extrusion, heat generation by extrusion), concentration segregation is likely to occur, and if it exceeds a predetermined range, a stripe pattern is formed when the anodized film is processed.

此外,為Zr、Mn、Cr、V及Ti之含量合計的[Zr+Mn+Cr+V+Ti]宜滿足[Zr+Mn+Cr+V+Ti]≦0.10質量%之關係。 此等之添加量添加了超過規定範圍時,抑制再結晶化並形成非再結晶組織,或成為引起結晶粒成長之原因,進一步成為形成大型之過剩的結晶物之原因,故即使全部合計,含量宜為0.10質量%以下,更宜為0.09質量%以下,進一步宜為0.08質量%以下,更進一步宜為0.07質量%以下,最理想為0.05質量%以下。Further, [Zr+Mn+Cr+V+Ti] which is a total content of Zr, Mn, Cr, V, and Ti preferably satisfies the relationship of [Zr+Mn+Cr+V+Ti]≦0.10% by mass. When the amount added is more than the predetermined range, the recrystallization is suppressed to form a non-recrystallized structure, or the crystal grains are caused to grow, and further large crystal excess crystals are formed. The amount is preferably 0.10% by mass or less, more preferably 0.09% by mass or less, further preferably 0.08% by mass or less, further preferably 0.07% by mass or less, and most preferably 0.05% by mass or less.

(再結晶組織) 進行陽極氧化被膜處理時,纖維狀之組織會成為在陽極氧化被膜之表面產生條紋圖案之原因。因此,結晶組織宜為結晶粒徑齊一之再結晶組織。為了形成如此之微細的再結晶組織,會控制合金成分、鑄造HO條件、擠製條件。結晶組織之形態可藉由以氟硼酸水溶液進行被膜處理,在偏光顯微鏡下觀察之方法進行確認。(Recrystallized Structure) When the anodized film is treated, the fibrous structure causes a streak pattern to be formed on the surface of the anodized film. Therefore, the crystal structure is preferably a recrystallized structure having a uniform crystal grain size. In order to form such a fine recrystallized structure, the alloy composition, the casting HO condition, and the extrusion conditions are controlled. The form of the crystal structure can be confirmed by a method of coating with a fluoroboric acid aqueous solution and observing it under a polarizing microscope.

其中,因為條紋圖案會造成問題的是陽極氧化被膜面,故只要該面係再結晶即可。Among them, since the stripe pattern causes an anodized film surface, the surface may be recrystallized.

(Zn之高濃度部及低濃度部之濃度差) 於陽極氧化處理面,平行於擠製方向而以層狀存在的Zn高濃度層及Zn低濃度層之寬為超過0.1mm、3mm以下之範圍內之Zn濃度差超過1%之情況,在進行陽極氧化被膜處理時,於高濃度部及低濃度部之被膜形態會產生差異,該差異容易看起來為條紋圖案。在0.1mm寬之範圍內的濃度偏析因為寬度過窄,難以辨認為條紋。此外,超過3mm之和緩的濃度偏析也不容易被辨識為條紋。(Difference in concentration between the high-concentration portion and the low-concentration portion of Zn) The width of the Zn high-concentration layer and the Zn low-concentration layer which are layered in parallel with the extrusion direction on the anodized surface is more than 0.1 mm and 3 mm or less. When the Zn concentration difference in the range exceeds 1%, when the anodized film is treated, the film form of the high concentration portion and the low concentration portion is different, and the difference is likely to appear as a stripe pattern. Concentration segregation in the range of 0.1 mm width is too narrow to be considered as streaks. In addition, concentration segregation of more than 3 mm is not easily recognized as streaks.

(平均再結晶組織大小200μm以下,最大結晶粒大小1mm以下) 若陽極氧化被膜處理面之再結晶組織之結晶粒大小不均勻,則於該處會產生濃度偏析,看起來為條紋圖案狀。(The average recrystallized structure size is 200 μm or less, and the maximum crystal grain size is 1 mm or less.) When the crystal grain size of the recrystallized structure of the anodized film-treated surface is not uniform, concentration segregation occurs at this point, and it appears as a stripe pattern.

(結晶物之面積率未達2%) 若金屬間化合物(結晶物)佔陽極氧化處理面之面積率為2%以上,在擠製加工時結晶粒受伸展後,移動成平行於擠製方向散布之金屬間化合物(結晶物)看起來為條紋圖案狀。(The area ratio of the crystallized material is less than 2%.) If the area ratio of the intermetallic compound (crystal) to the anodized surface is 2% or more, the crystal grains are stretched in the extrusion process and moved parallel to the extrusion direction. The interspersed intermetallic compound (crystal) appears to be striped.

關於本實施形態之鋁合金擠製材料,陽極氧化被膜性良好,宜使用作為電子設備之框體用材料。In the aluminum alloy extruded material of the present embodiment, the anodizing film property is good, and it is preferable to use a material for a frame body as an electronic device.

[鋁合金擠製材料之製造方法] 此外,根據本發明提供鋁合金擠製材料之製造方法。下述之實施形態與上述實施形態基本上為同樣之組成。[Manufacturing Method of Aluminum Alloy Extruded Material] Further, a method of producing an aluminum alloy extruded material is provided according to the present invention. The embodiment described below basically has the same composition as the above embodiment.

關於本發明之其他實施形態之鋁合金擠製材料之製造方法係為一種具有陽極氧化被膜之鋁合金擠製材料之製造方法,該鋁合金擠製材料含有: Zn:4.0質量%以上7.5質量%以下、Mg:1.0質量%以上2.2質量%以下、Fe:0.05質量%以上0.20質量%以下、Cu:0.30質量%以下、Ti:0.005質量%以上0.04質量%以下、B:0.001質量%以上0.02質量%以下、Si:0.15質量%以下、Zr:0.05質量%以下、Mn:0.05質量%以下、Cr:0.05質量%以下、V:0.05質量%以下, 且為Zr、Mn、Cr、V及Ti之含量合計之[Zr+Mn+Cr+V+Ti]滿足 [Zr+Mn+Cr+V+Ti]≦0.10質量%之關係, 除了Zn之含量為6.0質量%以下且Mg之含量為1.2質量%以下之範圍,剩餘部份由鋁及無法避免之雜質構成,且金屬組織為再結晶組織;該製造方法係特徵為: 將鑄造材料以均質化之維持條件為400~560℃進行1~24小時處理, 在擠製步驟中以擠製比為超過20進行擠製加工,使擠製加工中之型材之溫度成為420℃以上之方式進行擠製, 且時效處理步驟為在100~180℃處理1~30小時。The method for producing an aluminum alloy extruded material according to another embodiment of the present invention is a method for producing an aluminum alloy extruded material having an anodized film, the aluminum alloy extruded material comprising: Zn: 4.0% by mass or more and 7.5% by mass Hereinafter, Mg: 1.0% by mass or more and 2.2% by mass or less, Fe: 0.05% by mass or more and 0.20% by mass or less, Cu: 0.30% by mass or less, Ti: 0.005% by mass or more and 0.04% by mass or less, and B: 0.001% by mass or more and 0.02% by mass % or less, Si: 0.15 mass% or less, Zr: 0.05 mass% or less, Mn: 0.05 mass% or less, Cr: 0.05 mass% or less, V: 0.05 mass% or less, and Zr, Mn, Cr, V, and Ti The total content of [Zr+Mn+Cr+V+Ti] satisfies the relationship of [Zr+Mn+Cr+V+Ti]≦0.10% by mass, except that the content of Zn is 6.0% by mass or less and the content of Mg is 1.2% by mass. In the following range, the remainder is composed of aluminum and unavoidable impurities, and the metal structure is a recrystallized structure; the manufacturing method is characterized by: the casting material is homogenized at a temperature of 400 to 560 ° C for 1 to 24 hours. Processing, in the extrusion step, the extrusion processing is performed at an extrusion ratio of more than 20 The temperature profile of the processing system to become more than 420 ℃ manner of extrusion, and the aging process in step 100 ~ 180 ℃ 1 ~ 30 hours.

(鑄造) 於鑄造步驟,準備具有上述合金組成之鋁合金熔液,進行脫渣處理或脫氣處理、過濾等公知之熔液處理。接著,藉由DC鑄造法等獲得圓柱狀之鑄塊(小胚)。(Casting) In the casting step, an aluminum alloy melt having the above alloy composition is prepared, and a known melt treatment such as slag removal treatment, deaeration treatment, and filtration is performed. Next, a cylindrical ingot (small embryo) is obtained by a DC casting method or the like.

鑄造中,在將熔液加至鑄模前,宜於熔液中添加由Al-Ti-B合金構成之微細化劑(桿硬化劑)。添加至熔液中之微細化劑宜為合金組成中Ti、V不超過上述之範圍。為了使鑄造組織盡可能地均質,將熔液均質地注入鑄模中且使鑄模內之鑄造溫度均勻較理想。例如,宜使用熱頂(HOT TOP)鑄造等。In the casting, it is preferable to add a refiner (rod hardener) composed of an Al-Ti-B alloy to the melt before adding the melt to the mold. The refining agent to be added to the melt is preferably such that Ti and V in the alloy composition do not exceed the above range. In order to homogenize the cast structure as much as possible, the melt is homogeneously injected into the mold and the casting temperature in the mold is uniformly uniform. For example, hot top (HOT TOP) casting or the like is preferably used.

小胚徑係小,宜為直徑為14英吋以下。若小胚徑大則小胚中心部之冷卻慢,小胚中心部之組織容易大型化。鑄造組織若為大型不僅均質化處理時濃度偏析的消除變得困難,也容易使擠製加工之結晶組織的微細化不充分。The small embryo diameter is small, preferably less than 14 inches in diameter. If the small embryo diameter is large, the cooling of the central portion of the small embryo is slow, and the tissue at the center of the small embryo is easily enlarged. When the cast structure is large, it is difficult to eliminate concentration segregation during the homogenization treatment, and it is easy to make the crystal structure of the extrusion process insufficient.

(均質化處理) 對於藉由上述之鑄造步驟獲得之小胚施以均質化處理(HO處理)。藉由均質化處理,元素之濃度偏析清除,結晶物減少。(Homogenization Treatment) The small embryos obtained by the above casting step were subjected to homogenization treatment (HO treatment). By homogenization treatment, the concentration of the element is segregated and the crystals are reduced.

均質化處理溫度宜在400~560℃進行1小時以上24小時以內。均質化處理之條件若為在該範圍內,可充分地進行均質化。24小時均質化處理溫度若超過560℃則使鑄塊的結晶成長,擠製加工性低落,或使擠製材料之結晶粒大型化,且同時會使再結晶組織局部地大型化,再結晶組織之粒徑差變大,使其於陽極氧化被膜時產生圖案。The homogenization treatment temperature should be carried out at 400 to 560 ° C for 1 hour or more and 24 hours or less. When the conditions of the homogenization treatment are within this range, the homogenization can be sufficiently performed. When the temperature of the homogenization treatment exceeds 560 ° C, the crystal of the ingot is grown, the extrusion processability is lowered, or the crystal grains of the extruded material are enlarged, and the recrystallized structure is locally enlarged, and the recrystallized structure is recrystallized. The difference in particle diameter is increased to cause a pattern to be formed when the film is anodized.

均質化處理溫度更宜為540℃以下。均質化處理即使進行超過24小時,也無法期望更佳之效果,僅會增加製造成本。The homogenization treatment temperature is preferably 540 ° C or less. Even if the homogenization treatment is carried out for more than 24 hours, a better effect cannot be expected, and only the manufacturing cost is increased.

為了促使濃度偏析的消除及結晶物之固溶,均質化處理宜於470℃以上進行,更宜於500℃進行均質化處理。若均質化處理後之冷卻速度慢的話,已固溶之元素容易析出,故宜以HO溫度~150℃為止之平均冷卻速度為100℃/h以上之條件進行冷卻較為理想。In order to promote the elimination of concentration segregation and the solid solution of the crystal, the homogenization treatment is preferably carried out at 470 ° C or higher, and more preferably at 500 ° C for homogenization treatment. If the cooling rate after the homogenization treatment is slow, the elements which have been solid-dissolved are likely to be precipitated. Therefore, it is preferred to carry out the cooling at an average cooling rate of from 100 ° C to 150 ° C.

(擠製加工) 擠製步驟係對於經均質化處理之小胚施以擠製加工,而製成指定之加工材。 擠製加工之擠製比宜為20以上。擠製加工之擠製比更宜為40以上。這是為了藉由使結晶延伸,讓濃度變化(若高濃度部分之間或低濃度部分之間的間隔密則濃度偏析容易改善)變得緩和,而使陽極氧化被膜後之外觀上難以產生條紋圖案。(Extrusion Processing) The extrusion step is performed by subjecting the homogenized small embryo to extrusion processing to produce a designated processed material. The extrusion ratio of the extrusion processing is preferably 20 or more. The extrusion ratio of the extrusion process is preferably 40 or more. This is to make the concentration change (if the interval between the high concentration portions or the low concentration portions is easy to be improved, the concentration segregation is easily improved) by stretching the crystal, and it is difficult to produce streaks after the anodization of the film. pattern.

此外,藉由使因為擠製加工條件而變化之再結晶組織的平均粒徑為200μm以下,最大結晶粒大小為1mm以下,可以抑制結晶組織差導致之條紋圖案的形成。因為以小胚溫度越低溫的條件進行擠製則擠製材料之結晶大小變得越為微細,故期望小胚溫度也考慮擠製壓力及型材溫度進行設定,宜為480℃以下。In addition, by setting the average particle diameter of the recrystallized structure which is changed by the extrusion processing conditions to 200 μm or less and the maximum crystal grain size to 1 mm or less, the formation of the striped pattern due to the difference in crystal structure can be suppressed. Since the crystal size of the extruded material becomes finer as it is extruded under conditions of a lower temperature of the small embryo, it is desirable that the small embryo temperature is also set in consideration of the extrusion pressure and the profile temperature, and is preferably 480 ° C or lower.

使得模頭出口之溫度為400℃以上的方式,來決定擠製條件(小胚溫度、模頭溫度、容器溫度、擠製壓力、擠製速度等)較為理想。若擠製材料在模頭出口之溫度低,有無法獲得高強度之虞。 從模頭出來後的擠製材料係以使擠製後~200℃之溫度範圍之冷卻速度為0.3~20℃/s的方式進行冷卻。只要冷卻速度滿足該條件,可獲得高強度且可獲得良好之耐應力腐蝕龜裂性。It is preferable to determine the extrusion conditions (small embryo temperature, die temperature, container temperature, extrusion pressure, extrusion speed, etc.) so that the temperature at the outlet of the die is 400 ° C or higher. If the temperature of the extruded material at the exit of the die is low, there is a possibility that high strength cannot be obtained. The extruded material from the die is cooled so that the cooling rate in the temperature range of -200 ° C after extrusion is 0.3 to 20 ° C / s. As long as the cooling rate satisfies this condition, high strength can be obtained and good stress corrosion cracking resistance can be obtained.

(時效處理) 將經擠製加工之加工材料進行時效處理。在時效處理步驟中,在保持溫度為100~180℃之條件下處理1~30小時。此外,針對時效處理,為了獲得更高強度、耐應力腐蝕龜裂性,可進行2階段之時效處理。(Aging treatment) The processed material is subjected to aging treatment. In the aging treatment step, the treatment is carried out for 1 to 30 hours while maintaining the temperature at 100 to 180 °C. In addition, for aging treatment, in order to obtain higher strength and resistance to stress corrosion cracking, a two-stage aging treatment can be performed.

(陽極氧化被膜處理) 將藉由依序經鑄造步驟、均質化處理步驟、擠製步驟、時效處理步驟而獲得之擠製材料切削加工為指定之形狀後,施以陽極氧化被膜處理。陽極氧化被膜處理係以公知條件進行。(Anodic Oxide Film Treatment) The extruded material obtained by sequentially performing the casting step, the homogenization treatment step, the extrusion step, and the aging treatment step is subjected to a predetermined shape, and then subjected to an anodized film treatment. The anodizing film treatment is carried out under known conditions.

本發明之其他實施形態係提供具有陽極氧化被膜之鋁合金擠製材料之製造方法,其特徵為,於上述之鋁合金擠製材料之製造方法中,均質化處理步驟在保持溫度400℃~560℃之條件下進行,且擠製步驟係於擠製比20以上,擠製材料之模具出口溫度420℃以上,擠製後~200℃之間的冷卻速度為0.3~20℃/s之條件進行,且時效處理步驟在保持溫度100℃~180℃之條件下進行。 [實施例]According to another embodiment of the present invention, there is provided a method for producing an aluminum alloy extruded material having an anodized film, wherein in the method for producing an aluminum alloy extruded material, the homogenization treatment step is maintained at a temperature of 400 ° C to 560 Under the condition of °C, and the extrusion step is based on the extrusion ratio of 20 or more, the extrusion temperature of the extrusion material is 420 ° C or more, and the cooling rate between extrusion and 200 ° C is 0.3 to 20 ° C / s. And the aging treatment step is carried out under the conditions of maintaining the temperature of 100 ° C to 180 ° C. [Examples]

以下使用實施例來針對本發明進行說明,但本發明並非僅限定於此等之實施例。Hereinafter, the invention will be described using the examples, but the invention is not limited to the examples.

(鋁合金試驗材料之製作) 獲得下述【表1】之實驗例A~N之成分的小胚。小胚之直徑為325mm。將此等小胚以【表2】之條件進行HO處理後,以【表2】之條件進行擠製加工。擠製加工係在小胚溫度400℃之條件進行,且以(a)為寬100mm、厚10mm之扁條(flat bar)、(b)為寬120mm、厚25mm之扁條之兩種擠製形狀進行。(Production of Aluminum Alloy Test Material) Small embryos of the components of Experimental Examples A to N of the following [Table 1] were obtained. The small embryo has a diameter of 325 mm. These small embryos were subjected to HO treatment under the conditions of [Table 2], and then subjected to extrusion processing under the conditions of [Table 2]. The extrusion process is carried out at a small embryo temperature of 400 ° C, and is extruded in two types: (a) a flat bar having a width of 100 mm and a thickness of 10 mm, and (b) a flat strip having a width of 120 mm and a thickness of 25 mm. The shape is carried out.

接著,依照表2記載之條件進行熱處理。熱處理後A~J及L~N以T5(擠製加工後,人工時效)之條件,K以T6(熔體化處理後,人工時效)之條件進行調質。Next, heat treatment was performed in accordance with the conditions described in Table 2. After heat treatment, A~J and L~N are tempered under the conditions of T6 (manual aging after extrusion processing) and K under conditions of T6 (melting treatment, artificial aging).

【表1】 【Table 1】

【表1】中,藉由交線法測定鑄造後及HO後之結晶粒大小,具有超過1mm大小之結晶粒者評為×。其中交線法係對於藉由光學顯微鏡拍攝之照片朝任意方向畫直線,令與該直線交錯之晶粒邊界數為n,將直線長度除以(n-1),算出平均結晶粒徑之方法。In [Table 1], the crystal grain size after casting and after HO was measured by the intersection method, and the crystal grain having a size of more than 1 mm was evaluated as ×. The intersection method is a method for calculating a mean crystal grain size by drawing a straight line in an arbitrary direction with a photo taken by an optical microscope, and dividing the number of crystal grain boundaries which are interlaced with the straight line by n, and dividing the length of the straight line by (n-1). .

於【表2】及【表3】中記載實驗例A~N之各種測定結果及觀察結果。Various measurement results and observation results of Experimental Examples A to N are described in [Table 2] and [Table 3].

【表2】 【Table 2】

【表3】 【table 3】

(伸展試驗) 將擠製材料加工成為JIS 14B號試驗片,實施伸展試驗。伸展試驗中0.2%耐力≧380MPa者評為合格。(Extension test) The extruded material was processed into a test piece of JIS 14B, and a stretching test was carried out. 0.2% endurance ≧ 380 MPa in the extension test was rated as qualified.

(色調與條紋圖案之觀察) 將鋁合金試驗材料之表面平面切削(拋光研磨)對應於壁厚之20%的量,並對於平面切削面實施陽極氧化被膜處理。陽極氧化被膜處理之處理條件係設為:於20℃、在15%硫酸水溶液中以1.5A/dm2 進行使被膜厚度成為約5μm。(Observation of Hue and Stripe Pattern) The surface of the aluminum alloy test material was planarly cut (polished) to correspond to an amount of 20% of the wall thickness, and an anodized film treatment was performed on the plane cut surface. The treatment conditions for the anodizing film treatment were such that the film thickness was about 5 μm at 15 ° C in a 15% sulfuric acid aqueous solution at 1.5 A/dm 2 .

色調係以處理前後之光澤度的保持率為40%以上,獲得L值78以上、b值1以下的情況作為基準來進行判斷。定義滿足上述值者為○,不滿足者為×。此外,對於是否有條紋圖案產生進行評價。「○」係幾乎沒有產生條紋圖案,「△」係於限定之部位觀察到細條紋圖案。「×」則為有產生粗條紋圖案。色調係以JIS Z8730之值作為基準。In the hue, the retention ratio of the gloss before and after the treatment is 40% or more, and the case where the L value is 78 or more and the b value is 1 or less is determined as a reference. The definition of the above value is ○, and the unsatisfied is ×. In addition, it is evaluated whether or not there is a streak pattern generation. In the "○" system, a stripe pattern was hardly generated, and "△" was observed in a limited area. "X" is a pattern that produces a thick stripe. The hue is based on the value of JIS Z8730.

(擠製材料之組織的觀察) 將鋁合金試驗材料之表面平面切削對應於壁厚之20%的量,在研磨為鏡面後於氟硼酸水溶液中進行被膜處理,藉由偏光顯微鏡觀察組織對於組織進行判定。觀察面係L-LT面(平行於擠製方向之面中寬廣的面)。(Observation of the structure of the extruded material) The surface of the aluminum alloy test material was planarly cut to an amount corresponding to 20% of the wall thickness, and after being polished into a mirror surface, the film was treated in an aqueous solution of fluoroboric acid, and the tissue was observed by a polarizing microscope. Make a decision. Observe the surface of the L-LT surface (a wide surface parallel to the plane of the extrusion direction).

A~G、L~N係觀察其再結晶組織,縱橫比(擠製長度方向平均結晶徑/擠製直角方向平均結晶徑)為2以下之等軸晶。H~K係纖維狀之結晶組織。然而,觀察了A~E及G、M、N的再結晶組織,具有以交線法測定之結晶的平均粒徑200μm以下之均勻微細的結晶,但於F、L存在著超過1mm之大型的結晶粒。在F、L之HO後的鑄塊組織確認了結晶成長,而有此影響。A~G and L~N are observed as recrystallized structures, and the aspect ratio (average crystal diameter in the longitudinal direction of extrusion/average crystal diameter in the direction of extrusion) is an equiaxed crystal of 2 or less. H~K is a fibrous crystal structure. However, the recrystallized structure of A to E and G, M, and N was observed, and the crystal having an average particle diameter of 200 μm or less as measured by the intersection method has a uniform fine crystal. However, F and L have a large size of more than 1 mm. Crystal grain. The ingot structure after the HO of F and L confirmed the crystal growth and had this effect.

(結晶物佔有面積率) 將鋁合金試驗材料之表面平面切削對應於壁厚之20%的量,在研磨為鏡面後藉由圖像解析裝置及光學顯微鏡,測定結晶物之佔有面積。觀察面係L-LT面平行於擠製方向之面中,寬廣的面)。(Crystal Area Ratio) The surface of the aluminum alloy test material was cut in a plane corresponding to 20% of the wall thickness, and after grinding to a mirror surface, the area occupied by the crystallized material was measured by an image analysis apparatus and an optical microscope. Observe that the face is L-LT face parallel to the direction of the extrusion direction, the wide face).

(應力腐蝕龜裂試驗) 僅針對A~E、M、N,根據JIS H8711實施應力腐蝕龜裂試驗。應力腐蝕龜裂係沿擠製方向及直角方向給予對應其0.2%耐力之50%之應力。腐蝕液係3.5%NaCl,定義在25℃浸漬10分鐘後乾燥50分鐘為1個循環。進行30天的試驗,沒有龜裂之材料評為合格「○」。A、M、N在SCC試驗之結果較差,據認為是因為Cu含量少的緣故。(Stress Corrosion Crack Test) The stress corrosion crack test was performed only for A~E, M, and N according to JIS H8711. The stress corrosion cracking system imparts a stress corresponding to 50% of its 0.2% proof force along the extrusion direction and the right angle direction. The etching solution was 3.5% NaCl, which was defined to be immersed at 25 ° C for 10 minutes and then dried for 50 minutes for 1 cycle. After 30 days of testing, the material without cracks was rated as "○". The results of A, M, and N in the SCC test were poor, and it was considered that the content of Cu was small.

(元素濃度之分析) 將鋁合金試驗材料之表面平面切削3mm,於研磨後使用島津製作所製EPMA-1610,以下述條件進行元素分析。為了測量Zn之濃度,該測定中使用Zn含量不相同之標準品,預先作好Zn之檢量線,以檢量線法進行定量化。定義於線上測定而得之元素濃度值的最高值與最低值的差為濃度偏析值。(Analysis of elemental concentration) The surface of the aluminum alloy test material was cut in a plane of 3 mm, and after polishing, EPMA-1610 manufactured by Shimadzu Corporation was used, and elemental analysis was carried out under the following conditions. In order to measure the concentration of Zn, a standard product having a different Zn content was used in the measurement, and a calibration curve of Zn was prepared in advance and quantified by a calibration line method. The difference between the highest value and the lowest value of the element concentration value determined by the determination on the line is the concentration segregation value.

(測定條件) 加速電壓:15kV 照射電流:200nA 光束徑:1μm(最小) sweep condition:LINE x3000 (電子束掃描條件:在垂直於前進方向為3000倍(100μm左右))之範圍中,邊以線狀掃描電子束邊進行測定) 數據數量:300點 步距:10μm 長度:3000μm(3mm) 測定時間:2秒/點(Measurement conditions) Acceleration voltage: 15kV Irradiation current: 200nA Beam diameter: 1μm (minimum) Sweep condition: LINE x3000 (Electron beam scanning condition: 3000 times (100 μm or so perpendicular to the direction of advancement), side by line Measurement by scanning electron beam side) Number of data: 300 steps: 10 μm Length: 3000 μm (3 mm) Measurement time: 2 seconds / point

圖1之(a)及(b)係將實驗例B(發明例)之結晶組織藉由偏光顯微鏡進行觀察而得者。觀察到均質之再結晶組織。(a) and (b) of Fig. 1 are obtained by observing the crystal structure of Experimental Example B (Inventive Example) by a polarizing microscope. A homogeneous recrystallized structure was observed.

圖2係觀察實驗例B(發明例)之微觀組織而得者。得知未觀察到結晶物擴散、極端之化合物的連續性等。Fig. 2 is a view showing the microstructure of Experimental Example B (invention example). It was found that no crystal diffusion, continuity of extreme compounds, and the like were observed.

圖3之(a)及(b)係將實驗例L(比較例)之試料截面之結晶組織藉由偏光顯微鏡觀察而得者。得知根據觀察處,結晶粒之大小有差異,於部分有形成大型之結晶粒。這是因為依存於HO處理之溫度條件,再結晶組織局部地大型化。(a) and (b) of FIG. 3 are obtained by observing the crystal structure of the cross section of the sample of Experimental Example L (Comparative Example) by a polarizing microscope. It was found that depending on the observation point, the size of the crystal grains was different, and large crystal grains were formed in some portions. This is because the recrystallized structure is locally enlarged depending on the temperature conditions of the HO treatment.

圖4係觀察實驗例H(比較例)之結晶組織而得者。得知其結晶組織纖維組織化。 圖5係觀察實驗例K(比較例)之微觀組織而得者。Fe、Cu、Mg、Cr之含量多,結晶物偏析之處因為擠製加工而伸展,可看得到為條紋狀之化合物的連續性。Fig. 4 is a view showing the crystal structure of Experimental Example H (Comparative Example). It is known that its crystalline tissue fibers are organized. Fig. 5 is a view showing the microstructure of Experimental Example K (Comparative Example). The content of Fe, Cu, Mg, and Cr is large, and the segregation of crystals is extended by extrusion processing, and the continuity of the compound in a stripe shape can be seen.

圖6至圖8係(a)在陽極氧化被膜處理面之垂直於擠製加工之擠製方向之方向,長度為3mm左右進行濃度分析。(b)係同個區域之Zn元素的映射圖。 圖6係展示實驗例B(發明例)之Zn濃度分析及映射圖之圖。於3mm寬之Zn濃度偏析為1.0質量%以下。此外圖7係實驗例G(比較例)之濃度分布,圖8係展示實驗例H(比較例)之Zn濃度分布及映射圖之圖。得知為比較例之實驗例G、H於3mm寬之間的Zn濃度有產生超過1.0質量%之濃度偏析之處。此外,藉由映射圖而得知濃度偏析成為層狀。6 to 8 are (a) concentration analysis in the direction perpendicular to the extrusion direction of the extrusion processing of the anodized film-treated surface, and having a length of about 3 mm. (b) A map of Zn elements in the same region. Fig. 6 is a view showing a Zn concentration analysis and a map of Experimental Example B (Inventive Example). The segregation of the Zn concentration at a width of 3 mm was 1.0% by mass or less. 7 is a concentration distribution of Experimental Example G (Comparative Example), and FIG. 8 is a view showing a Zn concentration distribution and a map of Experimental Example H (Comparative Example). It was found that the Zn concentrations of the experimental examples G and H of the comparative example at a concentration of more than 1.0% by mass were segregated at a concentration of more than 1.0% by mass. Further, it was found from the map that the concentration segregation was layered.

從上述之實驗結果,可了解A~E、M、N係具有期望之強度,同時於陽極氧化被膜之表面不容易產生條紋圖案。因此,滿足此等條件之鋁合金擠製材料可理想地使用於攜帶用電腦或行動電話及智慧型手機等電子設備之框體。 其中,A~D、M、N之擠製比相較於E大,也就是加工度高,故其結果表面之均勻性較高。From the above experimental results, it is understood that the A~E, M, and N series have desired strength, and at the same time, the stripe pattern is not easily generated on the surface of the anodized film. Therefore, the aluminum alloy extruded material satisfying these conditions can be suitably used for a casing such as a portable computer or an electronic device such as a mobile phone or a smart phone. Among them, the extrusion ratio of A~D, M, and N is larger than that of E, that is, the processing degree is high, so the uniformity of the surface is high.

針對F,因為Fe少,於HO中在鑄塊的一部分之結晶大型化,於擠製材料中,亦有一部分存在著超過1mm之結晶粒,形成了不均勻之結晶組織,故在擠製材料之陽極氧化被膜處理後產生了條紋。In the case of F, since the Fe is small, the crystal of a part of the ingot is enlarged in the HO, and in the extruded material, a part of the crystal grains exceeding 1 mm exists, and a non-uniform crystal structure is formed, so that the extruded material is formed. The anodized film is treated to produce streaks.

針對G,係為鑄造中為結晶微細化劑之Ti及B不足,鑄造後之鑄塊組織大型化。此影響導致即使進行均質化處理,仍無法充分地消除Zn之濃度偏析,產生在超過0.1mm、3mm以下之範圍中Zn濃度差超過1%之濃度偏析,而在擠製材料之陽極氧化被膜處理後產生了條紋。In the case of G, Ti and B which are crystal refining agents in casting are insufficient, and the ingot structure after casting is increased in size. This effect causes the concentration segregation of Zn to be sufficiently eliminated even if the homogenization treatment is performed, and concentration segregation in which the Zn concentration difference exceeds 1% in the range of more than 0.1 mm and 3 mm or less is generated, and the anodized film is processed in the extruded material. After the generation of stripes.

針對H、I,Zr添加量超過上限值,因為釘扎效果(pinning)導致擠製材料之結晶組織維持為纖維組織,且因為Zr而妨礙了Zn之擴散,即使進行均質化處理,仍無法充分地消除Zn之濃度偏析,而在擠製材料之陽極氧化被膜處理後產生了條紋。另外針對I,雖然Zn之含量多,因為Mg之含量低,即使為纖維組織其機械強度仍低。The amount of addition of H, I, and Zr exceeds the upper limit value, because the pinning causes the crystal structure of the extruded material to maintain the fiber structure, and Zr hinders the diffusion of Zn, even if homogenization is performed, The concentration segregation of Zn is sufficiently eliminated, and streaks are generated after the anodized film of the extruded material is treated. Further, for I, although the content of Zn is large, since the content of Mg is low, the mechanical strength is low even for the fiber structure.

針對J,也為Zr添加量、Cr添加量及Mn添加量超過上限值,因為釘扎效果導致擠製材料之結晶組織維持為纖維組織,且因為Zr而妨礙了Zn之擴散,即使進行均質化處理,仍無法充分地消除Zn之濃度偏析,產生在超過0.1mm、3mm以下之範圍中Zn濃度差超過1%之濃度偏析,而在擠製材料之陽極氧化被膜處理後產生了條紋。For J, the addition amount of Zr, the amount of Cr added, and the amount of Mn added exceed the upper limit value, because the pinning effect causes the crystal structure of the extruded material to maintain the fiber structure, and Zr hinders the diffusion of Zn, even if homogenization is performed. In the treatment, the concentration segregation of Zn was not sufficiently eliminated, and concentration segregation in which the Zn concentration difference exceeded 1% in the range of more than 0.1 mm and 3 mm or less was generated, and streaks were generated after the anodized film treatment of the extruded material.

此外,針對J,雖然Mg含量多,因為Zn含量低,即使為纖維組織其機械強度低。此外Mn之含量多,因為釘扎效果導致擠製材料之結晶組織維持為纖維組織,且因為Mn而妨礙了Zn之擴散,即使進行均質化處理,仍無法充分地消除Zn之濃度偏析,產生在超過0.1mm、3mm以下之範圍中Zn濃度差超過1%之濃度偏析,而在擠製材料之陽極氧化被膜處理後產生了條紋。Further, with respect to J, although the Mg content is large, since the Zn content is low, the mechanical strength is low even for the fiber structure. In addition, the content of Mn is large, because the pinning effect causes the crystal structure of the extruded material to maintain the fiber structure, and since Mn hinders the diffusion of Zn, even if the homogenization treatment is performed, the concentration segregation of Zn cannot be sufficiently eliminated, resulting in The concentration of the Zn concentration difference exceeding 1% in the range of more than 0.1 mm and 3 mm or less is segregated, and streaks are generated after the anodized film of the extruded material is treated.

針對K,Fe、Cu、Mg、Cr超過本發明中規定之範圍,產生多量結晶物,擠製材料之陽極氧化被膜處理後產生了條紋。進一步地因為Cr之釘扎效果導致擠製材料之結晶組織維持為纖維組織,且因為Cr而妨礙了Zn之擴散,即使進行均質化處理,仍無法充分地消除Zn之濃度偏析,產生在超過0.1mm、3mm以下之範圍中Zn濃度差超過1%之濃度偏析,而在擠製材料之陽極氧化被膜處理後產生了條紋。此外,Cu超過本發明中規定之範圍,使L、b值成為規定值之外。With respect to K, Fe, Cu, Mg, and Cr exceed the range specified in the present invention, a large amount of crystals are generated, and the anodic oxide film of the extruded material is treated to form streaks. Further, since the pinning effect of Cr causes the crystal structure of the extruded material to maintain the fiber structure, and since Cr inhibits the diffusion of Zn, even if the homogenization treatment is performed, the concentration segregation of Zn cannot be sufficiently eliminated, resulting in more than 0.1. In the range of mm or less, the concentration of Zn in the range of more than 1% is segregated, and streaks are generated after the anodized film of the extruded material is treated. Further, Cu exceeds the range specified in the present invention, and the L and b values are outside the predetermined value.

針對L,因為HO溫度超過上限溫度,鑄塊之結晶組織成長,其影響使得即使在擠製材料之結晶組織中亦有一部分產生超過1mm之結晶粒,擠製材料之結晶粒大小不均勻,故陽極氧化被膜處理後產生了條紋。For L, since the HO temperature exceeds the upper limit temperature, the crystal structure of the ingot grows, and the influence thereof causes a crystal grain of more than 1 mm to be generated in a part of the crystal structure of the extruded material, and the crystal grain size of the extruded material is not uniform, so The anodized film was treated to produce streaks.

【圖1】(a)(b)以偏光顯微鏡拍攝實驗例B之結晶組織所得之照片。 【圖2】拍攝實驗例B之微觀組織所得之照片。 【圖3】(a)(b)以偏光顯微鏡拍攝實驗例L之結晶組織所得之照片。 【圖4】以偏光顯微鏡拍攝實驗例H之結晶組織所得之照片。 【圖5】拍攝實驗例K之微觀組織所得之照片。 【圖6】(a)展示實驗例B之濃度分析的圖及(b)輿圖(mapping)。 【圖7】展示實驗例G之濃度分析的圖 【圖8】(a)展示實驗例H之濃度分析的圖及(b)輿圖。Fig. 1 (a) (b) A photograph obtained by photographing the crystal structure of Experimental Example B with a polarizing microscope. Fig. 2 is a photograph obtained by photographing the microstructure of Experimental Example B. Fig. 3 (a) (b) A photograph obtained by photographing the crystal structure of Experimental Example L with a polarizing microscope. Fig. 4 is a photograph of a crystal structure of Experimental Example H taken by a polarizing microscope. Fig. 5 is a photograph obtained by photographing the microstructure of Experimental Example K. Fig. 6 (a) shows a graph of concentration analysis of Experimental Example B and (b) a mapping. Fig. 7 is a graph showing the concentration analysis of Experimental Example G. Fig. 8 (a) is a view showing the concentration analysis of Experimental Example H and (b) a map.

no

Claims (7)

一種具有陽極氧化被膜且外觀品質良好的鋁合金擠製材料,其含有: Zn:4.0質量%以上7.5質量%以下、 Mg:1.0質量%以上2.2質量%以下、 Fe:0.05質量%以上0.20質量%以下、 Cu:0.30質量%以下、 Ti:0.005質量%以上0.04質量%以下、 B:0.001質量%以上0.02質量%以下、 Si:0.15質量%以下、 Zr:0.05質量%以下、 Mn:0.05質量%以下、 Cr:0.05質量%以下、 V:0.05質量%以下, 且為Zr、Mn、Cr、V及Ti之含量合計之[Zr+Mn+Cr+V+Ti]滿足 [Zr+Mn+Cr+V+Ti]≦0.10質量%之關係, 除了Zn之含量為6.0質量%以下且Mg之含量為1.2質量%以下之範圍,剩餘部份由鋁及無法避免之雜質構成,且金屬組織為再結晶組織。An aluminum alloy extruded material having an anodized film and having good appearance quality, comprising: Zn: 4.0% by mass or more and 7.5% by mass or less, Mg: 1.0% by mass or more and 2.2% by mass or less, and Fe: 0.05% by mass or more and 0.20% by mass; Hereinafter, Cu: 0.30% by mass or less, Ti: 0.005% by mass or more and 0.04% by mass or less, B: 0.001% by mass or more and 0.02% by mass or less, Si: 0.15% by mass or less, Zr: 0.05% by mass or less, and Mn: 0.05% by mass Hereinafter, Cr: 0.05% by mass or less, V: 0.05% by mass or less, and [Zr+Mn+Cr+V+Ti] which is a total content of Zr, Mn, Cr, V, and Ti satisfies [Zr+Mn+Cr+ V+Ti] ≦ 0.10% by mass, except that the content of Zn is 6.0% by mass or less and the content of Mg is 1.2% by mass or less, the remainder is composed of aluminum and unavoidable impurities, and the metal structure is recrystallized. organization. 如申請專利範圍第1項之具有陽極氧化被膜且外觀品質良好的鋁合金擠製材料,其中,Zn之含量為4.0質量%以上未達5.5質量%。An aluminum alloy extruded material having an anodized film and having an excellent appearance quality according to the first aspect of the invention, wherein the content of Zn is 4.0% by mass or more and less than 5.5% by mass. 如申請專利範圍第1或2項之具有陽極氧化被膜且外觀品質良好的鋁合金擠製材料,其中,Mg之含量為1.0質量%以上1.6質量%以下。An aluminum alloy extruded material having an anodized film and having an excellent appearance quality according to the first or second aspect of the patent application, wherein the content of Mg is 1.0% by mass or more and 1.6% by mass or less. 如申請專利範圍第1或2項之具有陽極氧化被膜且外觀品質良好的鋁合金擠製材料,其中,在陽極氧化處理面,Zn高濃度相及Zn低濃度相平行於擠製方向,且在垂直於擠製方向之方向而以層狀存在,於寬0.1mm以上3mm以下之範圍,Zn濃度差為1%以下。An aluminum alloy extruded material having an anodized film and having a good appearance quality according to the first or second aspect of the patent application, wherein, on the anodized surface, the Zn high concentration phase and the Zn low concentration phase are parallel to the extrusion direction, and It exists in a layer form perpendicularly to the direction of the extrusion direction, and has a Zn concentration difference of 1% or less in a range of 0.1 mm or more and 3 mm or less in width. 如申請專利範圍第1或2項之具有陽極氧化被膜且外觀品質良好的鋁合金擠製材料,其中,陽極氧化被膜處理面之再結晶組織之結晶粒大小,按平均值計,為200μm以下,最大結晶粒大小為1mm以下。An aluminum alloy extruded material having an anodized film and having an excellent appearance quality according to the first or second aspect of the patent application, wherein the crystal grain size of the recrystallized structure of the anodized film-treated surface is 200 μm or less on average. The maximum crystal grain size is 1 mm or less. 如申請專利範圍第1或2項之具有陽極氧化被膜且外觀品質良好的鋁合金擠製材料,其中,結晶物佔陽極氧化處理面之面積率未達2%。An aluminum alloy extruded material having an anodized film and having an excellent appearance quality as in the first or second aspect of the patent application, wherein the area ratio of the crystals to the anodized surface is less than 2%. 一種如申請專利範圍第1至6項中任一項之具有陽極氧化被膜且外觀品質良好的鋁合金擠製材料之製造方法,其特徵為: 將鑄造材料以均質化處理之維持條件為400~560℃,進行1~24小時處理, 在擠製步驟中以擠製比超過20進行擠製加工,使擠製加工中的型材之溫度成為420℃以上的方式進行擠製, 且時效處理步驟係在100~180℃處理1~30小時。A method for producing an aluminum alloy extruded material having an anodized film and having good appearance quality according to any one of claims 1 to 6, characterized in that the condition for maintaining the casting material by homogenization is 400~ 560 ° C, 1 to 24 hours of treatment, extrusion in the extrusion process with an extrusion ratio of more than 20, so that the temperature of the profile in the extrusion process is 420 ° C or more, and the aging process is Treat at 100~180 °C for 1~30 hours.
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