TW201709964A - Aerating device and gas processing system - Google Patents

Aerating device and gas processing system Download PDF

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TW201709964A
TW201709964A TW104130072A TW104130072A TW201709964A TW 201709964 A TW201709964 A TW 201709964A TW 104130072 A TW104130072 A TW 104130072A TW 104130072 A TW104130072 A TW 104130072A TW 201709964 A TW201709964 A TW 201709964A
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gas
accommodating space
spheres
aeration device
treatment liquid
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TW104130072A
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TWI549738B (en
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黃柏仁
黃燕桂
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中國鋼鐵股份有限公司
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Abstract

An aerating device and a gas processing system are provided. The aerating device includes a hollow body and a plurality of spheres. The hollow body has a space. A gas source and a tank at two sides of the hollow body are communicated with each other through the hollow body, so that a gas from the gas source can pass through the space and enter into a processed liquid in the tank. The spheres are disposed in the space, wherein the space is filled with the processed liquid. When the gas passes through the space, the spheres are perturbed by the gas and collided to each other in the processed liquid.

Description

曝氣裝置及處理氣體系統 Aeration device and process gas system

本發明係關於一種增加氣液接觸面積的裝置,特別是關於一種曝氣裝置及處理氣體系統。 The present invention relates to a device for increasing the gas-liquid contact area, and more particularly to an aeration device and a process gas system.

有不少製程所排放的廢氣中會夾帶揮發性有機物(volatile organic compounds;VOCs)的氣體或氣膠,甚至含有異味。一般處理方式,依其濃度範圍有不同的處理方式,如廢氣中的揮發性有機物屬於高濃度,例如大於5000毫克/立方公尺,其可採用冷凝回收法來進行異味處理;中高濃度的揮發性有機物,例如介於1000毫克/立方公尺至5000毫克/立方公尺,其可採冷凍法或廢氣燃燒焚化法;中低濃度的揮發性有機物,例如約略在50毫克/立方公尺至1000毫克/立方公尺,其可採用吸附法、生物法,或先濃縮再燃燒焚化等處理方法。 There are many processes that emit exhaust gases that contain volatile organic compounds (VOCs) or gas gels, and even contain odors. The general treatment method has different treatment methods according to the concentration range. For example, the volatile organic compounds in the exhaust gas belong to a high concentration, for example, more than 5000 mg/m ^ 3 , which can be treated by condensation recovery method for odor treatment; Organic matter, for example, between 1000 mg/m3 and 5000 mg/m3, which can be subjected to freezing or exhaust gas combustion incineration; medium to low concentrations of volatile organic compounds, for example, approximately 50 mg/m3 to 1000 mg / cubic meter, which can be treated by adsorption, biological methods, or first concentrated reburning incineration.

若廢氣中的揮發性有機物濃度極低(但仍有臭味產生),例如小於50毫克/立方公尺,其處理方式則相當具挑戰性。例如若是使用焚化破壞技術,由於廢氣幾乎無熱值,必須提供大量能源來升溫廢氣,導致處理成本偏高。若採用低成本之生物處理技術,也因為揮發性有機物濃度低,無法提供足夠的微生物生長代謝所須的碳源,必須再額外添加碳源,處理難度高,且成效不佳。 If the concentration of volatile organic compounds in the exhaust gas is extremely low (but there is still odor), for example less than 50 mg/m3, the handling is quite challenging. For example, if the incineration destruction technology is used, since the exhaust gas has almost no heating value, a large amount of energy must be supplied to raise the exhaust gas, resulting in high processing cost. If low-cost biological treatment technology is adopted, and because the concentration of volatile organic compounds is low, it is impossible to provide sufficient carbon source for microbial growth and metabolism, and additional carbon source must be added, which is difficult to handle and has poor results.

可有效處理此等極低濃度有機排氣之技術,包含氣相氧化處理技術,其是對廢氣直接混入如臭氧的氣態強氧化劑,但若廢氣中的揮發性有機物之碳碳均屬單鍵,臭氧無法對揮發性有機物成分進行臭氧化反應,而無法進一步將有機物分解。一般 是透過提高濕度讓臭氧與水分子在紫外線激發下,反應生成強氧化力的氫氧自由基分解有機物。另外,化學洗滌對水溶性或微水溶性的有機廢氣也具部分處理效果,但須先將揮發性有機物自廢氣洗入液體中,再藉液體中所添加的氧化劑氧化分解,適用於含異味廢氣的處理,但其中牽涉質傳與反應二大控制。 A technology capable of effectively treating such extremely low concentrations of organic exhaust gas, including a gas phase oxidation treatment technique, which is a gaseous strong oxidant directly mixed with exhaust gas such as ozone, but if the carbon and carbon of volatile organic compounds in the exhaust gas are single bonds, Ozone cannot ozonize volatile organic compounds, and it is impossible to further decompose organic matter. general It is a hydrogen radical that decomposes organic matter by reacting ozone and water molecules under ultraviolet excitation to generate strong oxidizing power. In addition, the chemical washing also has a partial treatment effect on the water-soluble or slightly water-soluble organic waste gas, but the volatile organic matter must first be washed into the liquid from the exhaust gas, and then oxidized and decomposed by the oxidant added in the liquid, and is suitable for the odor-containing exhaust gas. The treatment, but it involves the two major controls of quality and reaction.

對於這種揮發性有機物濃度極低的廢氣,傳統廢氣洗滌的填充塔、噴淋塔或板層塔等吸收塔對水溶性氣體可發揮部分氣液質傳之效果,如濕式排煙除硫裝置(FGD)可有效處理廢氣中二氧化硫(SO2)與酸性無機成份等。但對微溶性有機氣體、氣膠及異味成份效果不佳,而且可能因廢氣降溫所生成之具黏性有機氣膠,不僅會逐漸累積黏附在吸收塔內,且惡化氣液在吸收塔內部的分佈,終將衍生異味二次污染問題。 For such exhaust gas with extremely low concentration of volatile organic compounds, absorption towers such as packed towers, spray towers or laminar towers washed by conventional exhaust gases can exert partial gas-liquid mass transfer effects on water-soluble gases, such as wet exhaust sulfur removal. The device (FGD) can effectively treat sulfur dioxide (SO2) and acidic inorganic components in the exhaust gas. However, it has poor effect on the slightly soluble organic gas, gas glue and odor components, and may have a viscous organic gas glue generated by the exhaust gas cooling, which will not only accumulate and adhere to the absorption tower, but also deteriorate the gas and liquid in the absorption tower. Distribution, will eventually lead to the problem of secondary pollution of odor.

故,有必要提供一種曝氣裝置及處理氣體系統,以解決習用技術所存在的問題。 Therefore, it is necessary to provide an aeration device and a treatment gas system to solve the problems of the conventional technology.

本發明之主要目的在於提供一種曝氣裝置,其係在中空本體中具有多個球體,該些球體受輸入之氣體擾動後在處理液中碰撞,以使該氣體形成較小的氣泡,以增加該氣體與該處理液的接觸面積,進而提升質傳效果,且具黏性有機氣膠不會堆積在曝氣裝置。 The main object of the present invention is to provide an aeration device having a plurality of spheres in a hollow body, the spheres being disturbed by the input gas and colliding in the treatment liquid to cause the gas to form smaller bubbles to increase The contact area of the gas with the treatment liquid further enhances the mass transfer effect, and the adhesive organic gas glue does not accumulate in the aeration device.

本發明之次要目的在於提供一種處理氣體系統,其包含前述的曝氣裝置,以便系統化處理具有揮發性有機物的氣體。 A secondary object of the present invention is to provide a process gas system comprising the aeration device described above for systematically treating a gas having volatile organic compounds.

為達上述之一目的,本發明提供一種曝氣裝置,其包含:一中空本體及多個球體。該中空本體具有一容置空間,該中空本體之兩側連通一氣體來源及一槽體,以使來自該氣體來源之一氣體通過該容置空間而進入該槽體之一處理液中。該些球體設於該容置空間中,其中該處理液充滿該容置空間,當該氣體通過該容置空間時,該些球體受該氣體擾動而在該處理液中相互碰撞。 To achieve the above objective, the present invention provides an aeration device comprising: a hollow body and a plurality of spheres. The hollow body has an accommodating space. The two sides of the hollow body are connected to a gas source and a tank body, so that a gas from the gas source passes through the accommodating space and enters a treatment liquid of the tank body. The ball is disposed in the accommodating space, wherein the processing liquid fills the accommodating space, and when the gas passes through the accommodating space, the balls are disturbed by the gas to collide with each other in the processing liquid.

在本發明之一實施例中,該容置空間之體積係20至50立方公分。 In an embodiment of the invention, the volume of the accommodating space is 20 to 50 cubic centimeters.

在本發明之一實施例中,該些球體的數量係10至20個,且該些球體的直徑係1至5釐米。 In an embodiment of the invention, the number of the spheres is 10 to 20, and the spheres have a diameter of 1 to 5 cm.

在本發明之一實施例中,該中空本體具有一狹縫部,其具有多個狹縫,用以連通該槽體。 In an embodiment of the invention, the hollow body has a slit portion having a plurality of slits for communicating with the groove body.

在本發明之一實施例中,每一該些狹縫的面積係4至10平方公分且小於每一該些球體之一最大截面積。 In an embodiment of the invention, each of the slits has an area of 4 to 10 square centimeters and less than a maximum cross-sectional area of each of the spheres.

為達上述之另一目的,本發明提供一種處理氣體系統,其包含:一氣體來源、至少一槽體及至少一曝氣裝置。該氣體來源輸出一氣體。該槽體裝設有一處理液。該曝氣裝置包含一中空本體及多個球體。該中空本體具有一容置空間,該中空本體之兩側連通該氣體來源及該槽體,以使來自該氣體來源之該氣體通過該容置空間而進入該槽體之該處理液中。該些球體設於該容置空間中,其中該處理液充滿該容置空間,當該氣體通過該容置空間時,該些球體受該氣體擾動而在該處理液中相互碰撞。 To achieve the above other objects, the present invention provides a process gas system comprising: a gas source, at least one tank, and at least one aeration device. The gas source outputs a gas. The tank body is provided with a treatment liquid. The aeration device comprises a hollow body and a plurality of spheres. The hollow body has an accommodating space. The two sides of the hollow body communicate with the gas source and the tank body, so that the gas from the gas source passes through the accommodating space and enters the processing liquid of the tank body. The ball is disposed in the accommodating space, wherein the processing liquid fills the accommodating space, and when the gas passes through the accommodating space, the balls are disturbed by the gas to collide with each other in the processing liquid.

在本發明之一實施例中,更包含一冷卻裝置連接該氣體來源及該曝氣裝置,用以冷卻該氣體。 In an embodiment of the invention, a cooling device is further connected to the gas source and the aeration device for cooling the gas.

在本發明之一實施例中,更包含一補液裝置連通該槽體,用以補充該槽體中之該處理液。 In an embodiment of the invention, a refilling device is further connected to the tank to supplement the processing liquid in the tank.

在本發明之一實施例中,該處理液包含次氯酸鈉(NaOCl)、過氧化氫(H2O2)及氯化鐵之至少一種。 In an embodiment of the invention, the treatment liquid comprises at least one of sodium hypochlorite (NaOCl), hydrogen peroxide (H 2 O 2 ), and ferric chloride.

在本發明之一實施例中,更包含一後處理裝置連通該槽體,用以將一液體成分從經該處理液處理之該氣體中分離。 In an embodiment of the invention, a post-processing device is further included to communicate with the tank for separating a liquid component from the gas treated by the treatment liquid.

10‧‧‧曝氣裝置 10‧‧‧Aeration device

11‧‧‧中空本體 11‧‧‧ hollow body

12‧‧‧球體 12‧‧‧ sphere

13‧‧‧氣體來源 13‧‧‧ Gas source

14‧‧‧槽體 14‧‧‧

14A‧‧‧槽體 14A‧‧‧Slot

14B‧‧‧槽體 14B‧‧‧Slot

20‧‧‧處理氣體系統 20‧‧‧Processing gas system

21‧‧‧控制閥 21‧‧‧Control valve

22‧‧‧補液裝置 22‧‧‧Rehydration device

23‧‧‧排液槽 23‧‧‧Drain tank

24‧‧‧冷卻裝置 24‧‧‧Cooling device

25‧‧‧後處理裝置 25‧‧‧Reprocessing device

111‧‧‧容置空間 111‧‧‧ accommodating space

112‧‧‧狹縫部 112‧‧‧Slits

112A‧‧‧狹縫 112A‧‧‧Slit

131‧‧‧管路 131‧‧‧ pipeline

141‧‧‧處理液 141‧‧‧ treatment solution

211‧‧‧控制閥 211‧‧‧Control valve

221‧‧‧水泵 221‧‧‧Water pump

231‧‧‧控制閥 231‧‧‧Control valve

232‧‧‧水泵 232‧‧‧Water pump

251‧‧‧風車 251‧‧‧ windmill

第1A圖:本發明實施例之曝氣裝置的立體示意圖。 Fig. 1A is a perspective view of an aeration device according to an embodiment of the present invention.

第1B圖:本發明實施例之曝氣裝置的配置示意圖。 FIG. 1B is a schematic view showing the configuration of an aeration device according to an embodiment of the present invention.

第1C圖:本發明實施例之曝氣裝置的使用示意圖。 Fig. 1C is a schematic view showing the use of the aeration device of the embodiment of the present invention.

第2圖:本發明實施例之曝氣裝置應用於一處理氣體系統之示意圖。 Fig. 2 is a schematic view showing the application of the aeration device of the embodiment of the present invention to a process gas system.

第3A圖:實驗例的實驗結果曲線圖。 Fig. 3A is a graph showing the experimental results of the experimental examples.

第3B圖:比較例1的實驗結果曲線圖。 Fig. 3B is a graph showing the experimental results of Comparative Example 1.

第3C圖:比較例2的實驗結果曲線圖。 Fig. 3C is a graph showing the experimental results of Comparative Example 2.

為了讓本發明之上述及其他目的、特徵、優點能更明顯易懂,下文將特舉本發明較佳實施例,並配合所附圖式,作詳細說明如下。再者,本發明所提到的方向用語,例如上、下、頂、底、前、後、左、右、內、外、側面、周圍、中央、水平、橫向、垂直、縱向、軸向、徑向、最上層或最下層等,僅是參考附加圖式的方向。因此,使用的方向用語是用以說明及理解本發明,而非用以限制本發明。 The above and other objects, features and advantages of the present invention will become more <RTIgt; Furthermore, the directional terms mentioned in the present invention, such as upper, lower, top, bottom, front, rear, left, right, inner, outer, side, surrounding, central, horizontal, horizontal, vertical, longitudinal, axial, Radial, uppermost or lowermost, etc., only refer to the direction of the additional schema. Therefore, the directional terminology used is for the purpose of illustration and understanding of the invention.

請參照第1A至1C所示,第1A圖是本發明實施例之曝氣裝置的立體示意圖;第1B圖是本發明實施例之曝氣裝置的配置示意圖;及第1C圖是本發明實施例之曝氣裝置的使用示意圖。該曝氣裝置10包含中空本體11及多個球體12。該中空本體11可以是一個空心圓柱狀容器,其具有一容置空間111。在一實施例中,該容置空間111之體積係20至50立方公分。該中空本體11之兩側連通一氣體來源13及一槽體14。該氣體來源13可以透過一管路131連通到該中空本體11來傳輸一氣體。該槽體14主要用來盛裝一處理液141,用以處理該氣體中的揮發性有機物,以使減少或去除該氣體之臭味。在一實施例中,該處理液141可包含次氯酸鈉、過氧化氫及氯化鐵之至少一種。連通該槽體14之該中空本體11之一側可開設有一狹縫部112,其具有多個狹縫112A,用以連通該槽體14。 1A to 1C, FIG. 1A is a perspective view of an aeration device according to an embodiment of the present invention; FIG. 1B is a schematic view showing a configuration of an aeration device according to an embodiment of the present invention; and FIG. 1C is an embodiment of the present invention. Schematic diagram of the use of the aeration device. The aeration device 10 includes a hollow body 11 and a plurality of spheres 12. The hollow body 11 can be a hollow cylindrical container having an accommodating space 111. In an embodiment, the volume of the accommodating space 111 is 20 to 50 cubic centimeters. A gas source 13 and a tank body 14 are connected to both sides of the hollow body 11. The gas source 13 can be connected to the hollow body 11 through a conduit 131 for transporting a gas. The tank body 14 is mainly used for containing a treatment liquid 141 for treating volatile organic substances in the gas so as to reduce or remove the odor of the gas. In an embodiment, the treatment liquid 141 may include at least one of sodium hypochlorite, hydrogen peroxide, and ferric chloride. One side of the hollow body 11 that communicates with the groove body 14 may have a slit portion 112 having a plurality of slits 112A for communicating with the groove body 14.

該些球體12設於該容置空間111中,其中該處理液141充滿該容置空間111,當該氣體通過該容置空間111時,該些球體12受該氣體擾動而在該處理液141中相互碰撞,以使該氣體 形成比原有之該氣體更小的氣泡,以增加該氣體與該處理液141的接觸面積,進而提升質傳效果。再者,由於進行該些球體12不斷擾動會帶動該處理液141的流動,所以該氣體中具黏性的有機氣膠不會堆積在該曝氣裝置10中,故可解決習知技術的問題。在一實施例中,該些球體12的數量係10至20個,且該些球體12的直徑係1至5釐米。值得一提的是,該些球體12的設置數量需考量該些球體12佔該容置空間111的比例,因為需要保留該些球體12的相互活動空間,以使該氣體通過該容置空間111時,該些球體12受該氣體擾動而在該處理液141中相互碰撞。在另一實施例中,每一該些狹縫112A的面積係4至10平方公分且小於每一該些球體12之一最大截面積,以使該些球體12保留在該容置空間111中而不致受該氣體擾動而離開該容置空間111。 The spheroids 12 are disposed in the accommodating space 111. The processing liquid 141 is filled in the accommodating space 111. When the gas passes through the accommodating space 111, the spheroids 12 are disturbed by the gas in the processing liquid 141. Colliding with each other to make the gas A bubble smaller than the original gas is formed to increase the contact area between the gas and the treatment liquid 141, thereby improving the mass transfer effect. Furthermore, since the flow of the treatment liquid 141 is caused by the continuous disturbance of the spheres 12, the adhesive organic gas glue in the gas does not accumulate in the aeration device 10, so that the problems of the prior art can be solved. . In one embodiment, the number of the spheres 12 is 10 to 20, and the diameters of the spheres 12 are 1 to 5 cm. It is worth mentioning that the number of the spheres 12 needs to be considered as the ratio of the spheres 12 to the accommodating space 111, because the mutual movable space of the spheres 12 needs to be retained, so that the gas passes through the accommodating space 111. At this time, the spheres 12 are disturbed by the gas and collide with each other in the treatment liquid 141. In another embodiment, each of the slits 112A has an area of 4 to 10 square centimeters and is smaller than a maximum cross-sectional area of each of the plurality of spheres 12, so that the spheres 12 remain in the accommodating space 111. It is not disturbed by the gas to leave the accommodating space 111.

在一實施例中,該曝氣裝置10的數量可以是多個,例如2、3、4或5個以上,亦或是類似第1A及1B圖所示,多個曝氣裝置10依序平行排列且連通到同一個氣體來源13,但不限於此,也可以是每個曝氣裝置10分別連通各自的氣體來源13。 In an embodiment, the number of the aerators 10 may be plural, for example, 2, 3, 4 or 5, or similar to the 1A and 1B, the plurality of aerators 10 are sequentially parallel. The gas sources 13 are arranged and connected to each other, but are not limited thereto, and each aeration device 10 may be connected to a respective gas source 13 .

請一併參照第1A、1B、1C及2圖所示,第2圖係本發明實施例之曝氣裝置10應用於一處理氣體系統20之示意圖。該處理氣體系統20包含一氣體來源13、至少一槽體14(14A、14B)及至少一曝氣裝置10。在一實施例中,該槽體14的數量可以是2個或3個以上。在二個槽體14A與14B的情況下,若是該槽體14A中的該處理液141需要進行更換(例如根據使用時間、該處理液141的氧化還原電位或酸鹼值決定是否更換),則可以先透過一控制閥211來更換該氣體來源13所輸出的該氣體的輸出路徑,而使該氣體進入該槽體14B中,以使該氣體在該槽體14B中繼續進行處理。當該氣體在該槽體14B中進行處理時,可透過連通該槽體14A之一補液裝置22(及水泵221),用以補充或更換該槽體14A中之該處理液141,而廢棄的該處理液141可透過一控制閥231及一水泵232輸送到一排液槽23。同理,若是該槽體14B中 的該處理液141已不敷使用或無法產生有效處理效果時,則再透過該控制閥21來更換該氣體來源13所輸出的該氣體的輸出路徑,而使該氣體進入已更換該處理液141之該槽體14A中。然後透過連通該槽體14B之該補液裝置22補充或更換該槽體14B中之該處理液141。簡言之,具有二個槽體14A與14B的該處理氣體系統20可以連續地處理該氣體,以提高處理時效。 Referring to FIGS. 1A, 1B, 1C and 2 together, FIG. 2 is a schematic view showing the application of the aeration device 10 of the embodiment of the present invention to a process gas system 20. The process gas system 20 includes a gas source 13, at least one tank 14 (14A, 14B), and at least one aeration device 10. In an embodiment, the number of the tanks 14 may be two or more. In the case of the two tanks 14A and 14B, if the treatment liquid 141 in the tank body 14A needs to be replaced (for example, depending on the use time, the oxidation-reduction potential of the treatment liquid 141, or the pH value), The output path of the gas outputted by the gas source 13 may be first exchanged through a control valve 211 to cause the gas to enter the tank body 14B, so that the gas continues to be processed in the tank body 14B. When the gas is processed in the tank body 14B, the refilling device 22 (and the water pump 221) that communicates with the tank body 14A can be used to replenish or replace the treatment liquid 141 in the tank body 14A, and discarded. The treatment liquid 141 can be sent to a drain tank 23 through a control valve 231 and a water pump 232. Similarly, if it is in the tank body 14B When the treatment liquid 141 is no longer used or cannot produce an effective treatment effect, the output path of the gas outputted from the gas source 13 is replaced by the control valve 21, so that the gas enters the replaced treatment liquid 141. In the tank body 14A. The treatment liquid 141 in the tank body 14B is then replenished or replaced by the refilling device 22 that communicates with the tank body 14B. In short, the process gas system 20 having two tanks 14A and 14B can continuously treat the gas to improve processing aging.

在一實施例中,該處理氣體系統20可包含一冷卻裝置24,連接該氣體來源13及該曝氣裝置10,用以冷卻該氣體。詳言之,一般需要經過處理的該氣體通常是工業中製造產品時,必然地或不可避免所產生的廢氣,所以為了符合環保法規或是對人體的危害,所以需要經過處理後才能釋放到外界或大氣中。製造這些工業產品時所產生的廢氣,通常會具有較高的溫度,例如攝氏150度至攝氏180度之間。因此,可以在該氣體來源13及該曝氣裝置10之間設置該冷卻裝置24,以冷卻該氣體,例如降溫至攝氏40度至攝氏60度之間。 In one embodiment, the process gas system 20 can include a cooling device 24 coupled to the gas source 13 and the aeration device 10 for cooling the gas. In particular, the gas that is generally required to be treated is usually the exhaust gas that is inevitably or inevitably produced when the product is manufactured in the industry, so in order to comply with environmental regulations or harm to the human body, it needs to be processed before being released to the outside world. Or in the atmosphere. The exhaust gases produced in the manufacture of these industrial products usually have a relatively high temperature, for example between 150 degrees Celsius and 180 degrees Celsius. Therefore, the cooling device 24 can be disposed between the gas source 13 and the aeration device 10 to cool the gas, for example, to a temperature between 40 degrees Celsius and 60 degrees Celsius.

在一實施例中,該處理氣體系統20可包含一後處理裝置25。該後處理裝置25連通該槽體14(或該些槽體14A與14B),用以將一液體成分從經該處理液141處理之該氣體中分離。詳言之,該氣體在受到該些球體12碰撞而形成較小的氣泡後,該處理液141脫除或吸附該氣體中的一部分或全部的揮發性有機物。進行處理之後,該氣體脫離該處理液141之液面並輸送到該後處理裝置25中,用以脫除該氣體中殘留的該處理液141(即該液體成分)。在一實施例中,該後處理裝置25可與該排液槽23連通,該液體成分可排放至該排液槽23。另外,已脫除該液體成分的該氣體可通過該後處理裝置25之一風車251來將該氣體排放至外界。 In an embodiment, the process gas system 20 can include a post-treatment device 25. The post-processing device 25 communicates with the tank body 14 (or the tank bodies 14A and 14B) for separating a liquid component from the gas treated by the treatment liquid 141. In detail, after the gas collides with the spheres 12 to form smaller bubbles, the treatment liquid 141 removes or adsorbs some or all of the volatile organic compounds in the gas. After the treatment, the gas is separated from the liquid surface of the treatment liquid 141 and sent to the post-treatment device 25 for removing the treatment liquid 141 (i.e., the liquid component) remaining in the gas. In an embodiment, the aftertreatment device 25 can be in communication with the drain tank 23, and the liquid component can be discharged to the drain tank 23. Further, the gas from which the liquid component has been removed can be discharged to the outside through the windmill 251 of the post-processing device 25.

為了證明本發明實施例之曝氣裝置可有效增加氣液間的質傳效果。特舉出一實施例及數個比較例,如下所述。 In order to prove that the aeration device of the embodiment of the present invention can effectively increase the mass transfer effect between gas and liquid. An embodiment and several comparative examples are given as follows.

實施例: Example:

首先,提供次氯酸鈉作為處理液並容置於玻璃製的一容器瓶中。該容器瓶具有一氣體入口及一氣體出口,供一氣體進出。該氣體的流量維持180標準升/分(NL/min),且氣體來源提供之該氣體中的總碳氫化合物(THC)濃度控制在8至10ppm之間(以甲烷作為計算標準)。在該容器瓶中設有本發明實施例之曝氣裝置,該曝氣裝置連通該氣體入口,以使該氣體經該曝氣裝置中的多個球體碰撞而產生較原來的該氣體更小的氣泡,並經該處理液處理之後脫離液面且朝該氣體出口脫離而出。另外,實施例分別進行兩種液面高度的實驗,其高度分別為5公分及10公分。 First, sodium hypochlorite was supplied as a treatment liquid and placed in a container made of glass. The container bottle has a gas inlet and a gas outlet for a gas to enter and exit. The flow rate of the gas is maintained at 180 standard liters per minute (NL/min), and the total hydrocarbon (THC) concentration in the gas supplied by the gas source is controlled between 8 and 10 ppm (using methane as a calculation standard). An aeration device according to an embodiment of the present invention is provided in the container bottle, and the aeration device communicates with the gas inlet to cause the gas to collide with a plurality of spheres in the aeration device to generate a smaller gas than the original one. The bubbles are separated from the liquid surface by the treatment liquid and are discharged toward the gas outlet. In addition, the examples were carried out for two liquid level experiments, respectively, with heights of 5 cm and 10 cm, respectively.

比較例1:(板層法) Comparative Example 1: (Layer method)

首先,提供玻璃製的容器瓶中。該容器瓶具有一氣體入口及一氣體出口,供一氣體進出。該氣體的流量維持180標準升/分,且氣體來源提供之該氣體中的總碳氫化合物濃度控制在8至10ppm之間(以甲烷作為計算標準)。在該容器瓶中設有一多孔板層以將該容器瓶分成上下二部分,並且從該多孔板層的上方噴灑一處理液,以使該多孔板層的孔洞受該處理液覆蓋(該處理液透過表面張力的方式覆蓋孔洞。之後,提供一氣體管路,其連接氣體來源且依序穿過該氣體入口及該多孔板層,以使該氣體從該多孔板層之下方處穿過該多孔板層之孔洞,而受該處理液作用來脫除該氣體中之碳氫化合物。最後該氣體從該氣體出口脫離該容器瓶。另外,比較例1分別進行兩種孔徑大小(多孔板層的孔徑)的實驗,其孔徑大小分別為3毫米及5毫米。 First, a container made of glass is provided. The container bottle has a gas inlet and a gas outlet for a gas to enter and exit. The gas flow rate is maintained at 180 standard liters per minute, and the total hydrocarbon concentration in the gas provided by the gas source is controlled between 8 and 10 ppm (using methane as a calculation standard). A porous plate layer is disposed in the container bottle to divide the container bottle into upper and lower portions, and a treatment liquid is sprayed from above the porous plate layer so that the pores of the porous plate layer are covered by the treatment liquid (the treatment liquid The hole is covered by surface tension. Thereafter, a gas line is provided which is connected to the gas source and sequentially passes through the gas inlet and the porous plate layer so that the gas passes through the porous layer from below the porous plate layer. a hole in the plate layer, which is subjected to the treatment liquid to remove hydrocarbons in the gas. Finally, the gas is separated from the container via the gas outlet. In addition, Comparative Example 1 performs two kinds of pore sizes (porous layer The pore size experiment was performed with pore sizes of 3 mm and 5 mm, respectively.

比較例2:(噴淋法) Comparative Example 2: (spray method)

首先,提供玻璃製的容器瓶中。該容器瓶具有一氣體入口及一氣體出口,供一氣體進出。該氣體的流量維持180標準升/分,且氣體來源提供之該氣體中的總碳氫化合物濃度控制在8至10ppm之間(以甲烷作為計算標準)。一處理液從容器瓶上方處噴灑而下以淋灑該氣體。最後該氣體從該氣體出口脫離該容器瓶。另外,子較例2分別進行兩種噴嘴型式的實驗,其分別可噴 灑出中空圓錐狀的處理液及實心圓錐狀的處理液。 First, a container made of glass is provided. The container bottle has a gas inlet and a gas outlet for a gas to enter and exit. The gas flow rate is maintained at 180 standard liters per minute, and the total hydrocarbon concentration in the gas provided by the gas source is controlled between 8 and 10 ppm (using methane as a calculation standard). A treatment liquid is sprayed from above the container bottle to drip the gas. Finally the gas is detached from the container outlet from the gas outlet. In addition, the sub-example 2 experiments were carried out separately for the two nozzle types, which were respectively sprayable A hollow conical treatment liquid and a solid conical treatment liquid are sprinkled.

在進行實施例及比較例1與2時,以火焰離子偵測器之氣相層析儀器(中冠資訊公司;台灣)循環檢所標準方法(NIEA A723.72B)同步分析氣體入口的總碳氫化合物濃度(Cin),以及氣體出口的總碳氫化合物濃度(Cout)。其中,依據質量守恆,氣體出口的總碳氫化合物的減少量等於傳入處理液的總碳氫化合物。因此,以氣體入口及氣體出口的總碳氫化合物濃度差(即Cin及Cout的差值)乘上通氣量(Q),先求出氣相總碳氫化合物減少質量,再將總碳氫化合物減少質量除以容器瓶內填裝的處理液的體積(V),換算成處理液中理論總碳氫化合物濃度(x),所得之處理液中理論總碳氫化合物濃度再與時間軸作圖。 When carrying out the examples and Comparative Examples 1 and 2, the total carbon of the gas inlet was simultaneously analyzed by the gas chromatography apparatus of the flame ion detector (Zhongguan Information Co., Ltd.; Taiwan) Standard Test Method (NIEA A723.72B). Hydrogen concentration (C in ), and total hydrocarbon concentration (C out ) at the gas outlet. Among them, according to the conservation of mass, the total hydrocarbon reduction of the gas outlet is equal to the total hydrocarbons introduced into the treatment liquid. Therefore, multiplying the total hydrocarbon concentration difference (ie, the difference between C in and C out ) at the gas inlet and the gas outlet by the aeration amount (Q), first determine the total mass reduction of the gas phase, and then the total carbon. The mass of the hydrogen compound is divided by the volume (V) of the treatment liquid filled in the container bottle, converted into the theoretical total hydrocarbon concentration (x) in the treatment liquid, and the theoretical total hydrocarbon concentration in the treatment liquid obtained is then plotted against the time axis. Drawing.

請參照第3A至3C圖,分別為實驗例及比較例1與2的實驗結果曲線圖。從第3A至3C圖可得知,實驗例不論是在液面高度5公分或10公分,在約100分鐘之處就已經接近或達到9.0毫克/升的平衡濃度(以甲烷作為計算標準)。而從比較例1及2的實驗結果曲線圖中的趨勢可明顯看出距離達到平衡濃度還需要一段時間。由此可見,本發明實施例的曝氣裝置確實可有效增加氣液間的質傳效果。 Please refer to FIGS. 3A to 3C for the experimental results and the experimental results of Comparative Examples 1 and 2, respectively. It can be seen from Figures 3A to 3C that the experimental example, whether at a liquid level of 5 cm or 10 cm, has approached or reached an equilibrium concentration of 9.0 mg/liter at about 100 minutes (using methane as a calculation standard). From the trend in the experimental results of Comparative Examples 1 and 2, it is apparent that it takes a while for the distance to reach the equilibrium concentration. It can be seen that the aeration device of the embodiment of the invention can effectively increase the mass transfer effect between gas and liquid.

雖然本發明已以較佳實施例揭露,然其並非用以限制本發明,任何熟習此項技藝之人士,在不脫離本發明之精神和範圍內,當可作各種更動與修飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 The present invention has been disclosed in its preferred embodiments, and is not intended to limit the invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application.

11‧‧‧中空本體 11‧‧‧ hollow body

13‧‧‧氣體來源 13‧‧‧ Gas source

14‧‧‧槽體 14‧‧‧

22‧‧‧補液裝置 22‧‧‧Rehydration device

23‧‧‧排液槽 23‧‧‧Drain tank

25‧‧‧後處理裝置 25‧‧‧Reprocessing device

141‧‧‧處理液 141‧‧‧ treatment solution

Claims (10)

一種曝氣裝置,其包含:一中空本體,具有一容置空間,該中空本體之兩側連通一氣體來源及一槽體,以使來自該氣體來源之一氣體通過該容置空間而進入該槽體之一處理液中;以及多個球體,設於該容置空間中,其中該處理液充滿該容置空間,當該氣體通過該容置空間時,該些球體受該氣體擾動而在該處理液中相互碰撞。 An aeration device comprising: a hollow body having an accommodating space, the two sides of the hollow body being connected to a gas source and a tank body, so that a gas from the gas source enters the accommodating space a processing fluid in one of the tanks; and a plurality of spheres disposed in the accommodating space, wherein the processing liquid fills the accommodating space, and when the gas passes through the accommodating space, the spheres are disturbed by the gas The treatment liquid collides with each other. 如申請專利範圍第1項所述之曝氣裝置,其中該容置空間之體積係20至50立方公分。 The aeration device according to claim 1, wherein the volume of the accommodating space is 20 to 50 cubic centimeters. 如申請專利範圍第1項所述之曝氣裝置,其中該些球體的數量係10至20個,且該些球體的直徑係1至5釐米。 The aeration device of claim 1, wherein the number of the spheres is 10 to 20, and the spheres have a diameter of 1 to 5 cm. 如申請專利範圍第1項所述之曝氣裝置,其中該中空本體具有一狹縫部,其具有多個狹縫,用以連通該槽體。 The aeration device of claim 1, wherein the hollow body has a slit portion having a plurality of slits for communicating with the groove body. 如申請專利範圍第4項所述之曝氣裝置,其中每一該些狹縫的面積係4至10平方公分且小於每一該些球體之一最大截面積。 The aeration device of claim 4, wherein each of the slits has an area of 4 to 10 square centimeters and less than a maximum cross-sectional area of each of the plurality of spheres. 一種處理氣體系統,其包含:一氣體來源,輸出一氣體;至少一槽體,裝設有一處理液;以及至少一曝氣裝置,包含:一中空本體,具有一容置空間,該中空本體之兩側連通該氣體來源及該槽體,以使來自該氣體來源之該氣體通過該容置空間而進入該槽體之該處理液中;以及 多個球體,設於該容置空間中,其中該處理液充滿該容置空間,當該氣體通過該容置空間時,該些球體受該氣體擾動而在該處理液中相互碰撞。 A processing gas system comprising: a gas source, outputting a gas; at least one tank body provided with a treatment liquid; and at least one aeration device comprising: a hollow body having an accommodation space, the hollow body Connecting the gas source and the tank body on both sides to allow the gas from the gas source to pass through the accommodating space into the treatment liquid of the tank body; A plurality of spheres are disposed in the accommodating space, wherein the processing liquid fills the accommodating space, and when the gas passes through the accommodating space, the spheres are disturbed by the gas to collide with each other in the processing liquid. 如申請專利範圍第6項所述之處理氣體系統,更包含一冷卻裝置,連接該氣體來源及該曝氣裝置,用以冷卻該氣體。 The process gas system of claim 6, further comprising a cooling device connecting the gas source and the aeration device for cooling the gas. 如申請專利範圍第6項所述之處理氣體系統,更包含一補液裝置,連通該槽體,用以補充該槽體中之該處理液。 The process gas system of claim 6, further comprising a refilling device connected to the tank for replenishing the treatment liquid in the tank. 如申請專利範圍第6項所述之處理氣體系統,其中該處理液包含次氯酸鈉、過氧化氫及氯化鐵之至少一種。 The process gas system of claim 6, wherein the treatment liquid comprises at least one of sodium hypochlorite, hydrogen peroxide, and ferric chloride. 如申請專利範圍第6項所述之處理氣體系統,更包含一後處理裝置,連通該槽體,用以將一液體成分從經該處理液處理之該氣體中分離。 The process gas system of claim 6, further comprising a post-treatment device connected to the tank for separating a liquid component from the gas treated by the treatment liquid.
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