TW201709556A - Light emitting element and light emitting device - Google Patents

Light emitting element and light emitting device Download PDF

Info

Publication number
TW201709556A
TW201709556A TW105117259A TW105117259A TW201709556A TW 201709556 A TW201709556 A TW 201709556A TW 105117259 A TW105117259 A TW 105117259A TW 105117259 A TW105117259 A TW 105117259A TW 201709556 A TW201709556 A TW 201709556A
Authority
TW
Taiwan
Prior art keywords
light
electrode
semiconductor layer
emitting element
side semiconductor
Prior art date
Application number
TW105117259A
Other languages
Chinese (zh)
Other versions
TWI690091B (en
Inventor
尺長功一
榎村恵滋
Original Assignee
日亞化學工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日亞化學工業股份有限公司 filed Critical 日亞化學工業股份有限公司
Publication of TW201709556A publication Critical patent/TW201709556A/en
Application granted granted Critical
Publication of TWI690091B publication Critical patent/TWI690091B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/0004Devices characterised by their operation
    • H01L33/0008Devices characterised by their operation having p-n or hi-lo junctions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • H01L33/382Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending partially in or entirely through the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • H01L33/387Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape with a plurality of electrode regions in direct contact with the semiconductor body and being electrically interconnected by another electrode layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/54Encapsulations having a particular shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12041LED

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)
  • Led Device Packages (AREA)

Abstract

A light emitting element with a hexagonal planar shape, has: an n-side semiconductor layer; a p-side semiconductor layer provided on the n-side semiconductor layer; a plurality of holes that are provided to an area excluding three corners at mutually diagonal positions of the p-side semiconductor layer in plan view, and expose the n-side semiconductor layer; a first p-electrode provided in contact with the p-side semiconductor layer; second p-electrodes provided to three corners on the first p-electrode; and an n-electrode that is provided on the first p-electrode and is electrically connected to the n-side semiconductor layer through the plurality of holes.

Description

發光元件及使用其之發光裝置 Light-emitting element and light-emitting device using the same

本發明係關於一種發光元件及使用其之發光裝置。 The present invention relates to a light-emitting element and a light-emitting device using the same.

先前以來,對光提取效率良好且用於獲得均勻發光之發光元件進行各種研究(例如,參照專利文獻1~3等)。 In the past, various studies have been conducted on light-emitting elements having excellent light extraction efficiency and obtaining uniform light emission (for example, refer to Patent Documents 1 to 3 and the like).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2010-251481號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-251481

[專利文獻2]日本專利特開2006-203058號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2006-203058

[專利文獻3]日本專利特開2008-524831號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2008-524831

本發明之目的在於提供一種可將發光元件之角部及其周邊部之發光限制於最小限度並且可進一步提高自上表面之光提取的發光元件及使用其之發光裝置。 It is an object of the present invention to provide a light-emitting element which can minimize light emission from a corner portion of a light-emitting element and its peripheral portion and which can further improve light extraction from the upper surface, and a light-emitting device using the same.

本發明之實施形態之發光元件係 Light-emitting element according to an embodiment of the present invention

(1)一種發光元件,其特徵在於其係平面形狀為六邊形者,且包括:n側半導體層; p側半導體層,其設置於上述n側半導體層上;複數個孔,其等於俯視下設置於上述p側半導體層之除彼此位於對角位置之3個角部以外之區域,使上述n側半導體層露出;第1p電極,其與上述p側半導體層相接地設置;第2p電極,其分別設置於上述第1p電極上之上述3個角部;及n電極,其設置於上述第1p電極上,且通過上述複數個孔而與上述n側半導體層電性連接。 (1) A light-emitting element characterized in that it has a hexagonal shape in plan view, and includes: an n-side semiconductor layer; a p-side semiconductor layer provided on the n-side semiconductor layer; a plurality of holes equal to a region of the p-side semiconductor layer disposed at a position other than a diagonal position of the p-side semiconductor layer in a plan view, such that the n-side The semiconductor layer is exposed; the first p-electrode is disposed in contact with the p-side semiconductor layer; the second p-electrode is disposed on each of the three corners of the first p-electrode; and the n-electrode is disposed on the first p- The electrode is electrically connected to the n-side semiconductor layer through the plurality of holes.

(2)一種發光元件,其特徵在於其係平面形狀為六邊形者,且包括:n側半導體層;p側半導體層,其設置於上述n側半導體層上;複數個孔,其等於俯視下設置於上述p側半導體層之除彼此相對且位於最遠位置之2個角部以外之區域,使上述n側半導體層露出;第1p電極,其與上述p側半導體層相接地設置;第2p電極,其分別設置於上述第1p電極上之上述3個角部;及n電極,其設置於上述第1p電極上,且通過上述複數個孔而與上述n側半導體層電性連接。 (2) A light-emitting element characterized in that it has a hexagonal shape in plan view, and includes: an n-side semiconductor layer; a p-side semiconductor layer provided on the n-side semiconductor layer; and a plurality of holes equal to a plan view Providing the n-side semiconductor layer in a region other than the two corner portions of the p-side semiconductor layer opposite to each other and located at the farthest position; wherein the first p-electrode is disposed in contact with the p-side semiconductor layer; The second p-electrode is provided on the three corners of the first p-electrode, and the n-electrode is provided on the first p-electrode, and is electrically connected to the n-side semiconductor layer through the plurality of holes.

本發明之實施形態之發光裝置係 The light-emitting device of the embodiment of the present invention is

(3)包括:上述發光元件;基體,其設置有上述發光元件;及半球狀之透光性構件,其覆蓋上述發光元件。 (3) comprising: the light-emitting element; a substrate provided with the light-emitting element; and a hemispherical light-transmitting member covering the light-emitting element.

根據本發明之實施形態,能夠實現可將發光元件之角部及其周邊部之發光限制於最小限度並且可進一步提高自上表面之光提取的發光元件及使用其之發光裝置。 According to the embodiment of the present invention, it is possible to realize a light-emitting element that can minimize light emission from the corner portion of the light-emitting element and its peripheral portion, and can further improve light extraction from the upper surface, and a light-emitting device using the same.

2n‧‧‧n側半導體層 2n‧‧‧n side semiconductor layer

3p‧‧‧p側半導體層 3p‧‧‧p side semiconductor layer

4a‧‧‧絕緣膜 4a‧‧‧Insulation film

4p‧‧‧第1p電極 4p‧‧‧1p electrode

5‧‧‧第2p電極 5‧‧‧2p electrode

5p‧‧‧第2p電極 5p‧‧‧2p electrode

6‧‧‧孔 6‧‧‧ hole

7n‧‧‧n電極 7n‧‧‧n electrode

7ni‧‧‧n電極之內周 7ni‧‧‧n inner circumference of the electrode

7no‧‧‧n電極之外周 7no‧‧‧n electrode outside the week

8‧‧‧藍寶石基板 8‧‧‧Sapphire substrate

9‧‧‧絕緣膜 9‧‧‧Insulation film

9a‧‧‧開口 9a‧‧‧ Opening

10‧‧‧發光元件 10‧‧‧Lighting elements

15‧‧‧第2p電極 15‧‧‧2p electrode

20‧‧‧發光元件 20‧‧‧Lighting elements

25‧‧‧第2p電極 25‧‧‧2p electrode

25p‧‧‧第2p電極 25p‧‧‧2p electrode

27n‧‧‧n電極 27n‧‧‧n electrode

30‧‧‧發光元件 30‧‧‧Lighting elements

35‧‧‧第2p電極 35‧‧‧2p electrode

40‧‧‧發光元件 40‧‧‧Lighting elements

45‧‧‧第2p電極 45‧‧‧2p electrode

45p‧‧‧第2p電極 45p‧‧‧2p electrode

47n‧‧‧n電極 47n‧‧‧n electrode

47ni‧‧‧n電極之內周 47ni‧‧‧n inner circumference of the electrode

47no‧‧‧n電極之外周 47no‧‧‧n electrode outside the week

50‧‧‧發光元件 50‧‧‧Lighting elements

55‧‧‧第2p電極 55‧‧‧2p electrode

60‧‧‧發光裝置 60‧‧‧Lighting device

61‧‧‧發光裝置 61‧‧‧Lighting device

65‧‧‧光源單元 65‧‧‧Light source unit

66‧‧‧光源單元 66‧‧‧Light source unit

70‧‧‧發光元件 70‧‧‧Lighting elements

80‧‧‧基體 80‧‧‧ base

81‧‧‧電路基板 81‧‧‧ circuit board

90‧‧‧透光性構件 90‧‧‧Transparent components

91‧‧‧透光性構件 91‧‧‧Transparent components

92‧‧‧螢光體層 92‧‧‧Fluorescent layer

93‧‧‧透鏡 93‧‧‧ lens

94‧‧‧菲涅爾透鏡 94‧‧‧Fresnel lens

A‧‧‧發光元件 A‧‧‧Lighting elements

Ac‧‧‧活性層 Ac‧‧‧active layer

B‧‧‧發光元件 B‧‧‧Lighting elements

BP‧‧‧凸塊 BP‧‧‧Bumps

C‧‧‧發光元件 C‧‧‧Lighting elements

D‧‧‧發光元件 D‧‧‧Lighting elements

E‧‧‧發光元件 E‧‧‧Lighting elements

R1‧‧‧角部 R1‧‧‧ corner

R2‧‧‧角部 R2‧‧‧ corner

R3‧‧‧角部 R3‧‧‧ corner

R4‧‧‧角部 R4‧‧‧ corner

R5‧‧‧角部 R5‧‧‧ corner

R6‧‧‧角部 R6‧‧‧ corner

圖1A係模式性地表示本發明一實施形態之發光元件之構成的概略俯視圖。 Fig. 1A is a schematic plan view schematically showing a configuration of a light-emitting element according to an embodiment of the present invention.

圖1B係將圖1A中之發光元件之主要部分放大所得之俯視圖。 Fig. 1B is a plan view showing an enlarged main portion of the light-emitting element of Fig. 1A.

圖1C係圖1A中之A-A'線剖視圖。 1C is a cross-sectional view taken along line AA' of FIG. 1A.

圖1D係圖1A中之B-B'線剖視圖。 Figure 1D is a cross-sectional view taken along line BB' of Figure 1A.

圖1E係模式性地表示包含圖1A之發光元件之本發明一實施形態之發光裝置之部分構成的概略俯視圖。 Fig. 1E is a schematic plan view schematically showing a partial configuration of a light-emitting device according to an embodiment of the present invention including the light-emitting element of Fig. 1A.

圖1F係圖1E中之A-A'線剖視圖。 Fig. 1F is a cross-sectional view taken along line AA' of Fig. 1E.

圖2係模式性地表示本發明另一實施形態之發光元件之構成的概略俯視圖。 Fig. 2 is a schematic plan view schematically showing the configuration of a light-emitting element according to another embodiment of the present invention.

圖3係模式性地表示本發明之又一實施形態之發光元件之構成的概略俯視圖。 Fig. 3 is a schematic plan view schematically showing the configuration of a light-emitting element according to still another embodiment of the present invention.

圖4A係模式性地表示本發明之又一實施形態之發光元件之構成的概略俯視圖。 Fig. 4A is a schematic plan view schematically showing a configuration of a light-emitting element according to still another embodiment of the present invention.

圖4B係將圖4A中之發光元件之主要部分放大所得之俯視圖。 Fig. 4B is a plan view showing an enlarged main portion of the light-emitting element of Fig. 4A.

圖4C係圖4A中之A-A'線剖視圖。 4C is a cross-sectional view taken along line AA' of FIG. 4A.

圖5係表示本發明之實施形態之發光元件之電流密度分佈之模擬結果的圖。 Fig. 5 is a view showing a simulation result of a current density distribution of a light-emitting element according to an embodiment of the present invention.

圖6A及B係表示用於參考之發光元件之電流密度分佈之模擬結果的圖。 6A and 6B are diagrams showing simulation results of current density distributions of light-emitting elements for reference.

圖7A~F係用於說明本發明之實施形態之發光元件中之第2p電極之位置的概略俯視圖。 7A to 7F are schematic plan views for explaining the position of the second p-electrode in the light-emitting device of the embodiment of the present invention.

圖8A係模式性地表示使用本發明之一實施形態之發光元件之發光裝置之構成的俯視圖。 Fig. 8A is a plan view schematically showing a configuration of a light-emitting device using a light-emitting element according to an embodiment of the present invention.

圖8B係圖8A中之A-A'線剖視圖。 Fig. 8B is a cross-sectional view taken along line AA' of Fig. 8A.

圖9A係模式性地表示使用本發明之一實施形態之發光元件之其 他發光裝置之構成的俯視圖。 9A is a view schematically showing a light-emitting element using an embodiment of the present invention; A top view of the composition of his illuminating device.

圖9B係圖9A中之A-A'線剖視圖。 Figure 9B is a cross-sectional view taken along line AA' of Figure 9A.

圖10A係模式性地表示使用本發明之一實施形態之圖9A之發光裝置之光源單元之構成的俯視圖。 Fig. 10A is a plan view schematically showing a configuration of a light source unit of the light-emitting device of Fig. 9A according to an embodiment of the present invention.

圖10B係圖10A中之A-A'線剖視圖。 Fig. 10B is a cross-sectional view taken along line AA' of Fig. 10A.

圖11A係模式性地表示使用本發明之一實施形態之圖9A之發光裝置之其他光源單元之構成的俯視圖。 Fig. 11A is a plan view schematically showing a configuration of another light source unit of the light-emitting device of Fig. 9A according to an embodiment of the present invention.

圖11B係圖11A中之A-A線'剖視圖。 Figure 11B is a cross-sectional view taken along line A-A of Figure 11A.

於以下之說明中,視需要使用表示特定之方向或位置之用語(例如,「上」、「下」、「右」、「左」及包含該等用語之其他用語)。該等用語之使用係為了容易參照圖式理解發明,並非利用該等用語之含義來限定本發明之技術範圍。複數個圖式中所示之相同符號表示相同之部分或構件。為了容易理解發明,而對複數個實施形態進行說明,但該等實施形態並非各自獨立,可共有之部分適用其他實施形態之說明。 In the following description, terms indicating a particular direction or position (eg, "upper", "lower", "right", "left", and other terms including those terms) are used as needed. The use of such terms is to facilitate the understanding of the invention with reference to the drawings, and is not intended to limit the technical scope of the invention. The same reference numerals are used in the plural drawings to indicate the same parts or components. In order to facilitate the understanding of the invention, a plurality of embodiments are described. However, the embodiments are not independent of each other, and the portions that can be shared are described in other embodiments.

實施形態1:發光元件 Embodiment 1: Light-emitting element

本實施形態之發光元件10如圖1A所示,平面形狀為六邊形。如圖1A及1B所示,發光元件10包括:n側半導體層2n;p側半導體層3p,其設置於n側半導體層2n上;複數個孔6,其等設置於p側半導體層3p中特定之位置;第1p電極4p,其與p側半導體層3p相接地設置;第2p電極5p,其分別設置於第1p電極4p上且未配置有複數個孔6之角部R1、R3及R5;及n電極7n,其經由複數個孔6與n側半導體層2n電性連接。複數個孔6係於俯視下設置於p側半導體層之除彼此位於對角位置之3個角部、例如圖1A中之R1、R3及R5以外之區域(換言之,圖1A中之角部R2、R4、R6、與各邊鄰接之區域以及相較其等更靠內側之區域)。 As shown in FIG. 1A, the light-emitting element 10 of the present embodiment has a hexagonal planar shape. As shown in FIGS. 1A and 1B, the light-emitting element 10 includes an n-side semiconductor layer 2n, a p-side semiconductor layer 3p disposed on the n-side semiconductor layer 2n, and a plurality of holes 6, which are disposed in the p-side semiconductor layer 3p. a specific position; the first p-electrode 4p is disposed in contact with the p-side semiconductor layer 3p; and the second p-electrode 5p is disposed on the first p-electrode 4p and is not provided with the corner portions R1, R3 of the plurality of holes 6 and R5; and an n-electrode 7n electrically connected to the n-side semiconductor layer 2n via a plurality of holes 6. The plurality of holes 6 are disposed in a region other than the corners of the p-side semiconductor layer at a diagonal position, such as R1, R3, and R5 in FIG. 1A (in other words, the corner portion R2 in FIG. 1A). , R4, R6, the area adjacent to each side, and the area closer to the inside than the other).

發光元件10將與外部連接之第2p電極5p配置於p側半導體層3p中之彼此位於對角位置之3個角部之區域上。另一方面,於除配置有上述第2p電極之3個角部R1、R3及R5以外之區域設置複數個孔6,並且經由複數個孔6將n電極7n與n側半導體層2n電性連接。藉此,抑制向半導體層供給之電流中、向配置有第2p電極5p之角部R1、R3、R5供給之電流,另一方面,能夠使向其等角部以外之區域、即配置有複數個孔6之與p側半導體層之邊鄰接之區域、以及相較角部R1、R3、R5更靠內側之區域供給的電流增加。其結果,能夠將發光元件10之角部R1、R3、R5及其周邊區域之發光限制於最小限度,並且能夠進一步提高自上述區域以外之發光元件10之上表面(尤其是,由角部R1、R3、R5包圍之內側區域)之光提取。 In the light-emitting element 10, the second p-electrode 5p connected to the outside is disposed in a region of the p-side semiconductor layer 3p which is located at three corners of the diagonal position. On the other hand, a plurality of holes 6 are provided in a region other than the three corner portions R1, R3, and R5 in which the second p-electrode is disposed, and the n-electrode 7n and the n-side semiconductor layer 2n are electrically connected via the plurality of holes 6. . Thereby, the current supplied to the corner portions R1, R3, and R5 where the second p-electrode 5p is disposed in the current supplied to the semiconductor layer is suppressed, and the region other than the equiangular portion, that is, the plural can be disposed. The area of the hole 6 adjacent to the side of the p-side semiconductor layer and the area supplied further to the inner side than the corner portions R1, R3, and R5 increase. As a result, the light emission of the corner portions R1, R3, and R5 of the light-emitting element 10 and the peripheral region thereof can be minimized, and the upper surface of the light-emitting element 10 other than the above-described region can be further improved (especially, by the corner portion R1) Light extraction from the inner region surrounded by R3 and R5.

此種發光元件10之平面形狀較佳為正六邊形,但亦容許6個角部之角度變動120度±5度左右。構成六邊形之各邊通常為直線,但亦可根據半導體層之加工精度等而稍微彎曲或撓曲。因此,考慮該等情況,發光元件之平面形狀亦包含正六邊形及近似於正六邊形之形狀。 The planar shape of the light-emitting element 10 is preferably a regular hexagon, but the angle of the six corners is also allowed to vary by about 120 degrees ± 5 degrees. Each side constituting the hexagon is usually a straight line, but may be slightly bent or bent depending on the processing precision of the semiconductor layer or the like. Therefore, in consideration of such a case, the planar shape of the light-emitting element also includes a regular hexagon and a shape similar to a regular hexagon.

此種平面形狀為六邊形之發光元件中,列舉例如一邊為300~2000μm左右之長度。換言之,列舉為將位於最遠位置之角部連結之對角線為600~4000μm左右之長度。進而換言之,列舉為發光元件之平面面積為0.2~10mm2左右。 In such a light-emitting element having a hexagonal planar shape, for example, one side has a length of about 300 to 2000 μm. In other words, the diagonal line connecting the corner portions located at the farthest position is a length of about 600 to 4000 μm. Further, in other words, the planar area of the light-emitting element is about 0.2 to 10 mm 2 .

(半導體層) (semiconductor layer)

半導體層至少包含n側半導體層2n與p側半導體層3p。又,較佳為於該等之間包含活性層。為了將發光元件之平面形狀形成為六邊形,n側半導體層2n及/或p側半導體層3p較佳為其等之外周之平面形狀為六邊形。但是,n側半導體層2n及/或p側半導體層3p亦可於外周之一部分及/或內側存在膜厚方向之一部分或全部被去除之部分。再者,以發光區域(本實施形態中,活性層相當於發光區域)為基準,連 接n電極之側之半導體為n側半導體層2n,連接p電極之側之半導體為p側半導體層3p。 The semiconductor layer includes at least an n-side semiconductor layer 2n and a p-side semiconductor layer 3p. Further, it is preferred to include an active layer between the two. In order to form the planar shape of the light-emitting element into a hexagonal shape, the n-side semiconductor layer 2n and/or the p-side semiconductor layer 3p preferably have a hexagonal shape in the outer periphery. However, the n-side semiconductor layer 2n and/or the p-side semiconductor layer 3p may have a portion in which one or all of the film thickness direction is removed in one or both of the outer circumferences. Furthermore, the light-emitting region (in the present embodiment, the active layer corresponds to the light-emitting region) is used as a reference. The semiconductor connected to the side of the n-electrode is the n-side semiconductor layer 2n, and the semiconductor to which the side of the p-electrode is connected is the p-side semiconductor layer 3p.

作為該等n側半導體層、活性層及p側半導體層,例如可使用由InXAlYGa1-X-YN(0≦X、0≦Y、X+Y<1)表示之氮化物半導體。構成半導體層之各層之膜厚及層構造可利用本領域中眾所周知者。 As the n-side semiconductor layer, the active layer, and the p-side semiconductor layer, for example, a nitride semiconductor represented by In X Al Y Ga 1-XY N (0≦X, 0≦Y, X+Y<1) can be used. The film thickness and layer structure of each layer constituting the semiconductor layer can be utilized as known in the art.

半導體層形成於半導體成長用之基板上。於對半導體層使用氮化物半導體之情形時,可使用由藍寶石(Al2O3)構成之基板。 The semiconductor layer is formed on a substrate for semiconductor growth. In the case where a nitride semiconductor is used for the semiconductor layer, a substrate made of sapphire (Al 2 O 3 ) can be used.

(孔) (hole)

複數個孔6係於俯視下,設置於p側半導體層之除彼此位於對角位置之3個角部以外之區域,使n側半導體層露出。 The plurality of holes 6 are provided in a region other than the three corner portions of the p-side semiconductor layer which are located at diagonal positions in plan view, and the n-side semiconductor layer is exposed.

此處,彼此位於對角位置之角部係指彼此不鄰接而位於相對之位置。再者,彼此位於對角位置之3個角部,於平面形狀為六邊形之p側半導體層之情形時,係指每隔一個之3個角部。 Here, the corner portions located at diagonal positions with each other mean that they are not adjacent to each other and are located at opposite positions. Further, in the case where the three corner portions located at the diagonal positions are in the form of a hexagonal p-side semiconductor layer, they refer to every other three corner portions.

孔6只要設置於除彼此位於對角位置之該3個角部以外之區域,則可形成於p側半導體層之任一區域。換言之,只要不形成於每隔一個之3個角部,則亦可不形成於包含每隔一個之3個角部在內之4個角部,亦可不形成於包含每隔一個之3個角部在內之5個角部,亦可不形成於所有角部。於該等情形中之任一情形時,均較佳為於角部以外之p側半導體層之區域、尤其是至少由3個角部包圍之內側區域設置孔,而能夠增加自發光元件之上表面提取之光。 The holes 6 may be formed in any region of the p-side semiconductor layer as long as they are provided in regions other than the three corner portions located at diagonal positions. In other words, as long as it is not formed in every other three corners, it may not be formed in four corners including every other three corners, or may not be formed in every other three corners. The five corners inside may not be formed at all corners. In any of these cases, it is preferable to provide a hole in a region of the p-side semiconductor layer other than the corner portion, in particular, an inner region surrounded by at least three corner portions, and it is possible to increase the self-luminous element. Surface extraction light.

例如,於圖7A所示之發光元件A中,孔6形成於每隔一個之3個角部即由R2、R4及R6所示之3個角部,而未形成於彼此位於對角位置之由R1、R3及R5所示之3個角部。於圖7B所示之發光元件B中,孔6未形成於彼此位於對角位置之由R1、R3及R5所示之3個角部,而且亦未形成於R2所示之角部,而形成於由R4與R6所示之2個角部。於圖7C所示之發光元件C中,孔6未形成於彼此位於對角位置之由R1、R3、R4 及R6所示之角部,而形成於由R2與R5所示之2個角部。於圖7D所示之發光元件D中,孔6形成於R6所示之1個角部,但未形成於彼此位於對角位置之由R1、R3及R5所示之3個角部,而且未形成於由R2及R4所示之2個角部。但是,此處,形成有孔6之角部可為R1至R6中之任一個。又,於圖7E所示之發光元件E中,孔6未形成於包含彼此位於對角位置之由R1、R3及R5所示之3個角部在內之任一角部。 For example, in the light-emitting element A shown in FIG. 7A, the holes 6 are formed at every other three corner portions, that is, three corner portions indicated by R2, R4, and R6, and are not formed at diagonal positions with each other. Three corners indicated by R1, R3 and R5. In the light-emitting element B shown in FIG. 7B, the holes 6 are not formed at three corner portions indicated by R1, R3, and R5 at diagonal positions, and are not formed at the corners indicated by R2, but are formed. At the two corners indicated by R4 and R6. In the light-emitting element C shown in FIG. 7C, the holes 6 are not formed at the diagonal positions from each other by R1, R3, and R4. And the corners indicated by R6 are formed at two corners indicated by R2 and R5. In the light-emitting element D shown in FIG. 7D, the holes 6 are formed at one corner portion indicated by R6, but are not formed at three corner portions indicated by R1, R3, and R5 which are located at diagonal positions with each other, and are not It is formed at two corners indicated by R2 and R4. However, here, the corner portion in which the hole 6 is formed may be any one of R1 to R6. Further, in the light-emitting element E shown in Fig. 7E, the holes 6 are not formed at any of the corner portions including the three corner portions indicated by R1, R3 and R5 which are located at diagonal positions.

於本案說明書中,所謂角部,係指如上述般於俯視下構成發光元件及/或n側半導體層及/或p側半導體層之外緣之2條線以120度±5度相交,將上述2條線作為兩邊而形成的扇形區域(參照圖1B中之7ni)。但是,只要包含該扇形之區域,則亦可為包含稍向內側延長之部位之區域(參照圖2中之27n及圖4B中之47ni)。上述2條線較佳為設為形成六邊形之邊之1/3左右以下之長度,更佳為設為1/4左右以下之長度。 In the present specification, the term "corner" means that two lines constituting the outer edge of the light-emitting element and/or the n-side semiconductor layer and/or the p-side semiconductor layer in plan view intersect at 120 degrees ± 5 degrees. The above two lines are fan-shaped regions formed on both sides (refer to 7ni in Fig. 1B). However, as long as the area including the sector is included, it may be a region including a portion slightly extended inward (see 27n in Fig. 2 and 47ni in Fig. 4B). The two lines are preferably formed to have a length of about 1/3 or less of the side forming the hexagon, and more preferably a length of about 1/4 or less.

如上所述,孔6為將n側半導體層露出之孔。藉由孔而露出之複數個n側半導體層可用於藉由下述之n電極一體地與n側半導體層電性連接。 As described above, the hole 6 is a hole in which the n-side semiconductor layer is exposed. The plurality of n-side semiconductor layers exposed by the holes can be used to be electrically connected to the n-side semiconductor layer integrally by the n-electrode described below.

孔之數量、大小、形狀、位置可根據意圖之發光元件之大小、形狀、連接狀態等而適當設定。 The number, size, shape, and position of the holes can be appropriately set depending on the size, shape, connection state, and the like of the intended light-emitting element.

孔更佳為全部以相同大小、相同形狀排列。藉此,能夠實現電流供給量之均勻化。其結果,作為發光元件之整體,能夠使發光強度均勻化而抑制亮度不均。 More preferably, the holes are all arranged in the same size and in the same shape. Thereby, the uniformity of the current supply amount can be achieved. As a result, as the entire light-emitting element, it is possible to uniformize the light-emission intensity and suppress unevenness in luminance.

孔之形狀於俯視下列舉圓或橢圓、三角形、矩形、六邊形等多邊形等,其中,較佳為圓形或橢圓形。孔之大小可根據半導體層之大小、所要求之發光元件之輸出、亮度等而適當調整。孔較佳為例如直徑(一邊)為數十~數百μm左右之長度。就另一觀點而言,直徑較佳為半導體層之一邊之1/20~1/5左右之長度。就又一觀點而言,例如可根據孔所占之總平面面積而適當調整。具體而言,總平面面積相對於上 述發光元件之平面面積而言,列舉1/100~1/20左右。換言之,列舉2000μm2~0.5mm2左右。孔之數量例如列舉2~100個左右,較佳為4~80個左右。 The shape of the hole is a circle or an ellipse, a triangle, a rectangle, a hexagon, or the like in a plan view, and is preferably a circle or an ellipse. The size of the holes can be appropriately adjusted depending on the size of the semiconductor layer, the output of the desired light-emitting element, the brightness, and the like. The pores are preferably, for example, a diameter (one side) of a length of several tens to several hundreds of micrometers. From another point of view, the diameter is preferably about 1/20 to 1/5 of the length of one side of the semiconductor layer. From another point of view, for example, it can be appropriately adjusted according to the total plane area occupied by the holes. Specifically, the total planar area is about 1/100 to 1/20 with respect to the plane area of the light-emitting element. In other words, about 2000 μm 2 to 0.5 mm 2 is listed. The number of holes is, for example, about 2 to 100, preferably about 4 to 80.

孔較佳為例如如圖1A所示,於俯視下沿著p側半導體層之邊排列配置複數個。該情形時,更佳為將鄰接之孔彼此等間隔地配置。但是,亦可於一部分孔間使其間隔不同。此處,所謂等間隔,係指不僅僅是孔彼此均以相同之間隔配置,而且其等之間隔容許±5%左右之範圍內之偏差。孔間之最短距離(以下,孔之中心間距離)例如列舉孔之大小(例如直徑)之2~8倍左右,較佳為4~6倍左右之距離。具體而言,於p側半導體層具有直徑50μm左右之孔之情形時,最短距離列舉100~400μm左右,較佳為200~300μm左右。 Preferably, for example, as shown in FIG. 1A, the holes are arranged in a plurality of planes along the sides of the p-side semiconductor layer in plan view. In this case, it is more preferable to arrange adjacent holes at equal intervals. However, it is also possible to make the spacing between the holes different. Here, the term "equal spacing" means that not only the holes are arranged at the same interval, but also the intervals therebetween are allowed to vary within a range of about ±5%. The shortest distance between the holes (hereinafter, the distance between the centers of the holes) is, for example, about 2 to 8 times the size (for example, the diameter) of the holes, and preferably about 4 to 6 times. Specifically, when the p-side semiconductor layer has a hole having a diameter of about 50 μm, the shortest distance is about 100 to 400 μm, preferably about 200 to 300 μm.

藉由如上所述之孔之配置,能夠控制向n側半導體層注入之電流,而謀求發光效率之改善。 By the arrangement of the holes as described above, it is possible to control the current injected into the n-side semiconductor layer, and to improve the luminous efficiency.

(第1p電極、第2p電極及n電極) (1st p electrode, 2p p electrode, and n electrode)

發光元件至少包含第1p電極4、第2p電極5及n電極7。 The light-emitting element includes at least the first p-electrode 4, the second p-electrode 5, and the n-electrode 7.

該等電極可由例如Ag、Au、Pt、Pd、Rh、Ni、W、Mo、Cr、Ti、Al及Cu等金屬或該等之合金形成,進而,亦可由包含選自由例如Zn、In、Sn、Ga及Mg所組成之群中之至少1種元素的透光性導電膜等單層膜或積層膜而形成。作為透光性導電膜,例如列舉ITO、ZnO、IZO、GZO、In2O3及SnO2等。 The electrodes may be formed of a metal such as Ag, Au, Pt, Pd, Rh, Ni, W, Mo, Cr, Ti, Al, Cu, or the like, or may be selected from, for example, selected from, for example, Zn, In, Sn. A single layer film or a laminated film such as a light-transmitting conductive film of at least one element selected from the group consisting of Ga and Mg. Examples of the light-transmitting conductive film include ITO, ZnO, IZO, GZO, In 2 O 3 , and SnO 2 .

第1p電極4於p側半導體層上與p側半導體層相接地設置。第1p電極為歐姆電極層,但亦能夠作為例如光反射電極層而發揮作用。因此,第1p電極與p側半導體層之接觸面積越大則越佳,例如更佳為形成於半導體層之平面面積之50%以上、60%以上、70%以上,進而較佳為形成於包含上述角部在內之大致整面。 The 1st p electrode 4 is provided on the p-side semiconductor layer in contact with the p-side semiconductor layer. The first p-electrode is an ohmic electrode layer, but can also function as, for example, a light-reflecting electrode layer. Therefore, the contact area between the first p-electrode and the p-side semiconductor layer is preferably larger, for example, more preferably 50% or more, 60% or more, or 70% or more of the planar area of the semiconductor layer, and further preferably formed in the inclusion. The above-mentioned corners are substantially the entire surface.

作為光反射電極層,可由包含Ag或Ag合金等之層(含Ag層)形 成。利用Ag或Ag合金形成之層較佳為與半導體層接觸或者配置於最靠近半導體層之位置。作為Ag合金,可使用本領域中眾所周知之材料中之任一材料。光反射電極層之厚度並無特別限定,列舉能夠有效地將自半導體層出射之光反射之厚度、例如20nm~1μm左右。為了防止Ag之遷移,較佳為配置有將其上表面(較佳為上表面及側面)被覆之進一步之導電層或絕緣層。 As the light-reflecting electrode layer, a layer (including an Ag layer) including Ag or an Ag alloy may be used. to make. The layer formed using Ag or an Ag alloy is preferably in contact with or disposed at a position closest to the semiconductor layer. As the Ag alloy, any of materials well known in the art can be used. The thickness of the light-reflecting electrode layer is not particularly limited, and the thickness which can effectively reflect the light emitted from the semiconductor layer is, for example, about 20 nm to 1 μm. In order to prevent the migration of Ag, it is preferable to provide a further conductive layer or insulating layer covering the upper surface (preferably the upper surface and the side surface).

此種進一步之導電層可由包含上述作為電極材料列舉之金屬或該等之合金之單層膜或積層膜形成。例如,列舉至少含有Al、Cu或Ni等金屬之單層膜及Ni/Ti/Ru或Ni/Ti/Pt等之積層膜。再者,為了有效地防止Ag之遷移,導電層之厚度列舉數百nm~數μm左右。 Such a further conductive layer may be formed of a single layer film or a laminate film comprising the above-described metal as an electrode material or alloys thereof. For example, a single layer film containing at least a metal such as Al, Cu, or Ni, and a laminated film of Ni/Ti/Ru or Ni/Ti/Pt are exemplified. Further, in order to effectively prevent the migration of Ag, the thickness of the conductive layer is about several hundred nm to several μm.

又,關於進一步之絕緣層,可藉由例如以於光反射電極層之上表面局部開口且被覆光反射電極層之側面的方式形成SiN或SiO2等之絕緣層,而防止Ag之遷移。再者,絕緣層可為單層膜或積層膜之任一種。 Further, in the insulating layer, for example, an insulating layer such as SiN or SiO 2 may be formed to partially open the surface of the light reflecting electrode layer and cover the side surface of the light reflecting electrode layer, thereby preventing migration of Ag. Furthermore, the insulating layer may be either a single layer film or a laminated film.

作為歐姆電極層,列舉由上述透光性導電膜構成之單層膜或積層膜。 As the ohmic electrode layer, a single layer film or a laminated film composed of the above-mentioned light-transmitting conductive film is exemplified.

第2p電極配置於第1p電極上且俯視下之角部。但是,第2p電極未配置於配置有孔之區域。第2p電極配置於如上述般未配置有孔且彼此位於對角位置之3個角部。但是,第2p電極只要配置於該等彼此位於對角位置之3個角部,則亦可進而配置於未配置有孔之角部。 The second p-electrode is disposed on the first p-electrode and at a corner portion in a plan view. However, the second p-electrode is not disposed in the region where the hole is disposed. The second p-electrode is disposed at three corner portions where the holes are not disposed as described above and are located at diagonal positions. However, the second p-electrode may be disposed at a corner portion where no hole is disposed as long as it is disposed at three corner portions which are located at diagonal positions.

即,第2p電極較佳為配置於發光元件之6個角部中之3個以上之角部。於第2p電極配置於3個角部之情形時,較佳為如圖7A所示,配置於彼此不鄰接之3個角部、換言之、彼此位於對角位置之3個角部。於第2p電極配置於4個角部之情形時,較佳為如圖7B所示,不僅配置於彼此位於對角位置之3個角部,而且配置於任意1個角部。於第2p電極配置於5個或6個角部之情形時,可如圖7D及圖7E所示,配置於 任意之角部,較佳為以未配置第2p電極之2個角部彼此不鄰接之方式配置(參照圖7B及7C)。其中,第2p電極更佳為配置於電流密度分佈之均勻性優異且彼此不鄰接之3個角部或6個角部,尤其是於配置於6個角部之情形時,能夠進一步提高自被角部包圍之內側區域之光提取,故而較佳。 In other words, the second p-electrode is preferably disposed at three or more corners of the six corners of the light-emitting element. When the second p-electrode is disposed at three corners, it is preferably arranged at three corner portions which are not adjacent to each other, in other words, at three corner portions which are not adjacent to each other, as shown in FIG. 7A. When the second p-electrode is disposed at four corners, as shown in FIG. 7B, it is preferably disposed not only at three corner portions located at diagonal positions but also at any one of the corner portions. When the second p-electrode is disposed at five or six corners, as shown in FIG. 7D and FIG. 7E, It is preferable that the arbitrary corner portions are disposed such that the two corner portions of the second p-electrode are not disposed adjacent to each other (see FIGS. 7B and 7C). In particular, the second p-electrode is preferably disposed at three corners or six corners which are excellent in uniformity of the current density distribution and are not adjacent to each other, and in particular, when disposed at six corners, the self-environment can be further improved. It is preferred that the light is extracted from the inner region surrounded by the corners.

第2p電極較佳為例如於俯視下具有角部即2條線以120度±5度相交而以該2條線為兩邊形成的扇形、近似於扇形之形狀或包含該等形狀之形狀(以下,有時記載為「扇形等」)。2條線列舉設為形成六邊形之邊之40%以下之長度,較佳為35%左右以下、30%左右以下、25%左右以下、20%左右以下、15%左右以下。換言之,列舉具有30~300μm左右之一邊或100~300μm左右之一邊之扇形等形狀。 The second p-electrode is preferably a fan shape having a corner portion, that is, two lines intersecting at 120 degrees ± 5 degrees in a plan view, and a shape formed by the two lines as two sides, a shape similar to a sector, or a shape including the shape (hereinafter, Sometimes it is described as "fan shape, etc."). The two lines are set to have a length of 40% or less of the side forming the hexagon, preferably about 35% or less, about 30% or less, about 25% or less, about 20% or less, and about 15% or less. In other words, a shape such as a sector having one side of about 30 to 300 μm or one side of about 100 to 300 μm is cited.

n電極設置於第1p電極上。n電極未設置於第2p電極上,而於俯視下與第2p電極相隔地配置。又,n電極通過上述複數個孔而與n側半導體層電性連接。n電極亦可分割為複數個,但為了能夠將安裝時之連接區域擴大而均勻地供給電流,較佳為將1個n電極通過複數個孔與n側半導體層連接。 The n electrode is disposed on the 1st p electrode. The n-electrode is not disposed on the second p-electrode, but is disposed apart from the second p-electrode in plan view. Further, the n-electrode is electrically connected to the n-side semiconductor layer through the plurality of holes. The n-electrode may be divided into a plurality of electrodes. However, in order to uniformly supply a current in the connection region at the time of mounting, it is preferable to connect one n-electrode to the n-side semiconductor layer through a plurality of holes.

具體而言,第2p電極及/或n電極由自半導體層側起為Ti/Rh/Au、Ti/Pt/Au、W/Pt/Au、Rh/Pt/Au、Ni/Pt/Au、Al-Cu合金/Ti/Pt/Au、Al-Si-Cu合金/Ti/Pt/Au、Ti/Rh、Ti/Rh/Ti/Pt/Au、Ag/Ni/Ti/Pt、Ti/ASC/Ti/Rt/Au(此處,ASC係指Al/Si/Cu合金)等形成。又,亦可於該等之積層構造之半導體層側配置上述透光性導電膜。 Specifically, the second p-electrode and/or the n-electrode are Ti/Rh/Au, Ti/Pt/Au, W/Pt/Au, Rh/Pt/Au, Ni/Pt/Au, Al from the semiconductor layer side. -Cu alloy/Ti/Pt/Au, Al-Si-Cu alloy/Ti/Pt/Au, Ti/Rh, Ti/Rh/Ti/Pt/Au, Ag/Ni/Ti/Pt, Ti/ASC/Ti /Rt/Au (here, ASC means Al/Si/Cu alloy) or the like. Moreover, the above-mentioned light-transmitting conductive film may be disposed on the side of the semiconductor layer of the laminated structure.

n電極較佳為介隔配置於自設置於上述p側半導體層之孔之底面即n側半導體層之露出面之一部分擴及至孔之側面(活性層及p側半導體層之側面)、p側半導體層上之區域的絕緣膜,自孔內配置至p側半導體層上。此處之絕緣膜較佳為將該領域中眾所周知之材料膜以單層膜或積層膜之形式以可確保電氣絕緣性之厚度使用。 Preferably, the n-electrode is partially interposed between the exposed surface of the n-side semiconductor layer provided on the bottom surface of the hole provided in the p-side semiconductor layer, and extends to the side surface of the hole (the side surface of the active layer and the p-side semiconductor layer), and the p side An insulating film in a region on the semiconductor layer is disposed from the inside of the hole to the p-side semiconductor layer. The insulating film herein is preferably a material film which is well known in the art and which is used in the form of a single layer film or a laminated film in a thickness which ensures electrical insulation.

n電極於俯視下,一部分或全部可略小於n側半導體層,亦可與n側半導體層同等,亦可略大於n側半導體層。又,n電極較佳為以於俯視下與第2p電極相隔之方式具有與扇形等對應之開口。 The n-electrode may be slightly smaller than the n-side semiconductor layer in plan view, or may be equivalent to the n-side semiconductor layer, or may be slightly larger than the n-side semiconductor layer. Further, it is preferable that the n-electrode has an opening corresponding to a sector or the like so as to be spaced apart from the second p-electrode in plan view.

又,亦可於n電極及第2p電極與n側半導體層及p側半導體層各自之間包含介電體多層膜、例如DBR(Distributed Bragg Reflector,分佈式布拉格反射器)膜。 Further, a dielectric multilayer film, for example, a DBR (Distributed Bragg Reflector) film may be included between the n-electrode and the second p-electrode, the n-side semiconductor layer, and the p-side semiconductor layer.

實施形態2:發光元件 Embodiment 2: Light-emitting element

於本實施形態2中,發光元件中之複數個孔6之位置及第2p電極之位置局部不同,除此以外,具有與實施形態1之發光元件實質上相同之構成。 In the second embodiment, the position of the plurality of holes 6 and the position of the second p-electrode in the light-emitting element are partially different, and the configuration is substantially the same as that of the light-emitting element of the first embodiment.

(孔) (hole)

於該發光元件中,複數個孔如圖7F所示,於俯視下設置於p側半導體層之除位於最遠位置之2個角部、例如圖7F中之R1與R4以外之區域,使n側半導體層露出。 In the light-emitting element, as shown in FIG. 7F, a plurality of holes are provided in a view of the p-side semiconductor layer at two corners located at the farthest position, such as R1 and R4 in FIG. 7F, in a plan view. The side semiconductor layer is exposed.

此處,位於最遠位置之2個角部係指配置於最長之對角線之兩端之角部。 Here, the two corner portions located at the farthest position refer to the corner portions disposed at both ends of the longest diagonal line.

孔6只要設置於除位於最遠位置之該2個角部以外之區域,則可形成於p側半導體層之任一區域。換言之,只要不形成於位於最遠位置之該2個角部,則可不形成於與該2個角部之任一個鄰接之角部,亦可不形成於包含位於最遠位置之該2個角部在內之5個角部,亦可不形成於所有角部。於該等情形中之任一情形時,均較佳為於角部以外之p側半導體層之區域、尤其是至少由2個角部夾著之內側區域設置孔,能夠增加自發光元件之上表面(尤其是由2個角部夾著之內側區域)提取之光。 The hole 6 can be formed in any region of the p-side semiconductor layer as long as it is provided in a region other than the two corner portions located at the farthest position. In other words, as long as it is not formed at the two corner portions located at the farthest position, it may not be formed at a corner portion adjacent to either of the two corner portions, or may not be formed at the two corner portions including the farthest position. The five corners inside may not be formed at all corners. In any of these cases, it is preferable that a hole is provided in a region of the p-side semiconductor layer other than the corner portion, in particular, an inner region sandwiched by at least two corner portions, and the self-luminous element can be added. Light extracted from the surface (especially the inner region sandwiched by the two corners).

例如,於圖7F所示之發光元件F中,孔6未形成於位於最遠位置之由R2及R5所示之2個角部,而形成於由R1、R3、R4及R6所示之4個 角部。又,於圖7B所示之發光元件B中,孔6未形成於位於最遠位置之由R2及R5所示之2個角部,而且亦未形成於由R1及R3所示之角部,而形成於由R4與R6所示之2個角部。又,於圖7C所示之發光元件C中,孔6未形成於位於最遠位置之由R3及R6所示之2個角部,而且亦未形成於由R1及R4所示之角部,而形成於由R2與R5所示之2個角部。又,於圖7D所示之發光元件D中,孔6形成於R6所示之1個角部,但未形成於位於最遠位置之由R2及R5或R1及R4所示之4個角部,而且亦未形成於R3所示之角部。但是,此處,形成有孔6之角部可為R1至R6中之任一角部。又,於圖7E所示之發光元件E中,孔6未形成於包含位於最遠位置之由R2及R5、R1及R4或R3及R6所示之6個角部在內之任一角部。 For example, in the light-emitting element F shown in FIG. 7F, the hole 6 is not formed at the two corners indicated by R2 and R5 at the farthest position, and is formed at 4 as indicated by R1, R3, R4 and R6. One Corner. Further, in the light-emitting element B shown in FIG. 7B, the hole 6 is not formed at the two corner portions indicated by R2 and R5 at the farthest position, and is not formed at the corner portion indicated by R1 and R3. It is formed at two corners indicated by R4 and R6. Further, in the light-emitting element C shown in FIG. 7C, the hole 6 is not formed at the two corner portions indicated by R3 and R6 at the farthest position, and is not formed at the corner portion indicated by R1 and R4. It is formed at two corners indicated by R2 and R5. Further, in the light-emitting element D shown in FIG. 7D, the hole 6 is formed at one corner shown by R6, but is not formed at the four corners indicated by R2 and R5 or R1 and R4 at the farthest position. And it is not formed at the corner shown by R3. However, here, the corner portion in which the hole 6 is formed may be any one of R1 to R6. Further, in the light-emitting element E shown in Fig. 7E, the hole 6 is not formed at any corner portion including R2 and R5, R1 and R4, or six corner portions indicated by R6 and R6 at the farthest position.

(第2p電極) (2p electrode)

第2p電極配置於第1p電極上之角部。但是,第2p電極未配置於配置有孔之區域。第2p電極配置於如上述般未配置有孔且位於最遠位置之2個角部。但是,第2p電極只要配置於位於最遠位置之2個角部,則亦可進而配置於未配置有孔之角部。 The second p electrode is disposed at a corner of the first p electrode. However, the second p-electrode is not disposed in the region where the hole is disposed. The second p-electrode is disposed at two corner portions which are not disposed with the holes and are located at the farthest position as described above. However, the second p-electrode may be disposed at a corner portion where the hole is not disposed as long as it is disposed at two corner portions located at the farthest position.

即,第2p電極較佳為配置於發光元件之6個角部中之2個以上之角部。於第2p電極配置於2個角部之情形時,較佳為如圖7F所示,配置於位於最遠位置之2個角部。於第2p電極配置於4個角部之情形時,較佳為如圖7B及7C所示,不僅配置於位於最遠位置之2個角部,而且配置於與該2個角部之任一角部鄰接之角部之任意2個角部。即,較佳為以未配置第2p電極之2個角部彼此不鄰接之方式配置第2側電極。於第2p電極配置於5個或6個角部之情形時,可如圖7D及圖7E所示,配置於任意角部。其中,第2p電極更佳為配置於6個角部。 In other words, the second p-electrode is preferably disposed at two or more corners of the six corners of the light-emitting element. When the second p-electrode is disposed at two corners, it is preferably arranged at two corners located at the farthest position as shown in FIG. 7F. When the second p-electrode is disposed at four corners, as shown in FIGS. 7B and 7C, it is preferably disposed not only at the two corner portions located at the farthest position but also at any corners of the two corner portions. Any two corners of the corners adjacent to each other. In other words, it is preferable that the second side electrode is disposed so that the two corner portions of the second p-electrode are not disposed adjacent to each other. When the 2pth electrode is disposed at five or six corners, it can be disposed at any corner as shown in FIGS. 7D and 7E. Among them, the 2pth electrode is more preferably disposed at six corners.

具有以上構成之實施形態2之發光元件能夠將配置有第2p電極之區域之角部及其周邊區域之發光限制於最小限度,並且能夠進一步提 高自發光元件之上表面之光提取。 The light-emitting element of the second embodiment having the above configuration can minimize the light emission of the corner portion of the region in which the second p-electrode is disposed and the peripheral region thereof, and can further improve Light extraction from the upper surface of the high self-luminous element.

實施形態3:發光裝置 Embodiment 3: Light-emitting device

本發明一實施形態之發光裝置如圖8A及8B所示,包括上述發光元件70、設置發光元件70之基體80、及覆蓋發光元件之半球狀之透光性構件90。 As shown in FIGS. 8A and 8B, the light-emitting device according to the embodiment of the present invention includes the light-emitting element 70, a base 80 on which the light-emitting element 70 is provided, and a hemispherical light-transmitting member 90 that covers the light-emitting element.

又,於該發光裝置中,亦可任意地於發光元件等之側面、上表面或下表面等(進而,基體之側面、上表面或下表面等)配置具有光反射性、透光性、遮光性、波長轉換性等之功能性構件。例如,亦可藉由電鍍、噴霧等於發光元件之側面及上表面形成螢光體層。又,亦可配置進而覆蓋透光性構件90之光學構件(例如透鏡)。 Further, in the light-emitting device, it is also possible to arrange light-reflecting, transmissive, and light-shielding on the side surface, the upper surface, or the lower surface of the light-emitting element or the like (and further, the side surface, the upper surface, or the lower surface of the substrate). Functional components such as properties and wavelength conversion properties. For example, a phosphor layer may be formed by plating or spraying equal to the side surface and the upper surface of the light-emitting element. Further, an optical member (for example, a lens) that covers the light transmissive member 90 may be disposed.

(基體) (matrix)

基體係於例如包含金屬、陶瓷、樹脂、介電體、紙漿、玻璃、紙或該等之複合材料(例如複合樹脂)、或者該等材料與導電材料(例如金屬、碳等)之複合材料等之基材之表面,任意地於內部及/或背面具有複數個配線圖案。 The base system comprises, for example, a metal, a ceramic, a resin, a dielectric, a pulp, a glass, a paper or a composite material thereof (for example, a composite resin), or a composite material of the material and a conductive material (for example, metal, carbon, etc.). The surface of the substrate has a plurality of wiring patterns arbitrarily inside and/or on the back surface.

配線圖案只要為可向發光元件供給電流者即可,以本領域中通常使用之材料、厚度、形狀等形成。再者,配線圖案只要包含與發光元件之電極(第2p電極及n電極)連接之正負一對圖案,則亦可具有獨立於正負一對圖案配置之其他圖案。 The wiring pattern may be formed of a material, a thickness, a shape, or the like which is generally used in the art as long as it can supply a current to the light-emitting element. Further, the wiring pattern may have another pattern that is disposed independently of the pair of positive and negative patterns as long as it includes a pair of positive and negative patterns connected to the electrodes (the second p-electrode and the n-electrode) of the light-emitting element.

又,發光元件於基體之安裝較佳為藉由例如凸塊、焊料等接合構件而進行。接合構件可使用本領域中眾所周知之任一材料。 Further, the mounting of the light-emitting element on the substrate is preferably performed by a bonding member such as a bump or solder. The joining member can use any material well known in the art.

(透光性構件) (transparent member)

透光性構件係被覆發光元件者,亦發揮作為透鏡之作用。因此,較佳為半球形狀。但是,該半球形狀可不為嚴格意義上之球、嚴格意義上之一半,亦可為扁球、長球、蛋形、紡錘形狀等之一部分切斷體等。 When the light transmissive member is coated with the light emitting element, it also functions as a lens. Therefore, it is preferably a hemispherical shape. However, the shape of the hemisphere may not be a ball in a strict sense, or a half in a strict sense, and may be a part of a cut body such as a spheroid, a long ball, an egg shape, or a spindle shape.

透光性構件亦可由玻璃等形成,但較佳為由樹脂形成。作為樹脂,列舉熱固性樹脂、熱塑性樹脂、該等之改性樹脂或含有該等樹脂中之1種以上之混合樹脂等。 The light transmissive member may be formed of glass or the like, but is preferably formed of a resin. Examples of the resin include a thermosetting resin, a thermoplastic resin, these modified resins, and a mixed resin containing one or more of these resins.

(功能性構件) (functional component)

作為功能性構件,例如列舉透鏡、螢光體層等能夠附加各種功能之構件。功能性構件既可相對於1個發光元件配置1個或複數個,亦可相對於複數個發光元件配置1個。 Examples of the functional member include members capable of attaching various functions such as a lens and a phosphor layer. The functional member may be disposed in one or a plurality of light-emitting elements, or may be disposed in one of a plurality of light-emitting elements.

作為透鏡,例如列舉凹凸透鏡、菲涅爾透鏡等。該等透鏡可使用利用本領域中眾所周知之材料利用眾所周知之製造方法製造之透鏡。透鏡亦可含有光擴散材等。作為光擴散材,列舉玻璃纖維、矽灰石等纖維狀填料、氮化鋁、碳等無機填料、氧化矽、氧化鈦、氧化鋯、氧化鎂、玻璃、螢光體之晶體或燒結體、螢光體與無機物之結合材之燒結體等。 Examples of the lens include a meniscus lens, a Fresnel lens, and the like. These lenses may use lenses made using well known manufacturing methods using materials well known in the art. The lens may also contain a light diffusing material or the like. Examples of the light-diffusing material include fibrous fillers such as glass fibers and ash, inorganic fillers such as aluminum nitride and carbon, crystals or sintered bodies of cerium oxide, titanium oxide, zirconium oxide, magnesium oxide, glass, and phosphors. A sintered body of a combination of a light body and an inorganic material.

亦可於透鏡之光入射面及/或光出射面形成有保護膜、反射膜、抗反射膜等。作為抗反射膜,可適用包含二氧化矽與二氧化鋯之4層構造者等。 A protective film, a reflective film, an anti-reflection film, or the like may be formed on the light incident surface and/or the light exit surface of the lens. As the antireflection film, a four-layer structure including cerium oxide and zirconium dioxide can be applied.

螢光體可使用本領域中眾所周知者。例如,亦可為以鈰活化之釔.鋁.石榴石(YAG,Yttrium Aluminum Garnet)系螢光體、以鈰活化之鑥.鋁.石榴石(LAG,Lutetium Aluminum Garnet)系螢光體、以銪及/或鉻活化之含氮鋁矽酸鈣(CaO-Al2O3-SiO2)系螢光體、以銪活化之矽酸鹽((Sr,Ba)2SiO4)系螢光體、β赛隆螢光體、CASN(CaAlSiN3:Eu)系或SCASN((Sr,Ca)AlSiN3:Eu)系螢光體等氮化物系螢光體、KSF系螢光體(K2SiF6:Mn)、硫化物系螢光體、所謂之奈米晶體、稱為量子點之發光物質。作為發光物質,列舉半導體材料、例如II-VI族、III-V族、IV-VI族半導體、具體而言、CdSe、核殼型之CdSxSe1-x/ZnS、GaP等奈米尺寸之高分散粒子。螢光體可將1種或2種以上組合使用。 Fluors can be used as is well known in the art. For example, it can also be activated by 铈. aluminum. YAG (Yttrium Aluminum Garnet) is a fluorescent body that is activated by yttrium. aluminum. Garnet (LAG, Lumetium Aluminum Garnet) is a phosphor, a nitrogen-containing aluminum aluminosilicate (CaO-Al 2 O 3 -SiO 2 )-based phosphor activated by cerium and/or chromium, and a ceric acid activated by cerium Salt ((Sr,Ba) 2 SiO 4 ) is a phosphor, a β-Sialon phosphor, a CASN (CaAlSiN 3 :Eu) system or a SCASN ((Sr,Ca)AlSiN 3 :Eu)-based phosphor A compound-based phosphor, a KSF-based phosphor (K 2 SiF 6 : Mn), a sulfide-based phosphor, a so-called nanocrystal, and a luminescent substance called a quantum dot. Examples of the luminescent material include semiconductor materials, for example, II-VI, III-V, IV-VI semiconductors, specifically, CdSe, core-shell type CdS x Se 1-x /ZnS, GaP, etc. Highly dispersed particles. One type or two or more types of phosphors can be used in combination.

隨著近年來之發光裝置之小型化、進而被覆發光元件之透光性構件之小型化,透光性構件之表面接近發光元件,其結果,無法獲得透光性構件之透鏡效果而直接朝發光裝置之側方穿過之光增大,擔憂無法以所期望之效率獲得自發光裝置之上方提取之光。相對於此,如本實施形態般,利用透光性構件被覆平面形狀為六邊形之發光元件之情形時,與具有相同之平面面積之平面形狀為四邊形之發光元件相比,能夠進一步確保發光元件與透光性構件之表面之距離。由此,能夠有效地利用透光性構件之透鏡效果。又,本實施形態之發光元件具有抑制其角部之發光之構造,換言之,具有代替抑制對角部之半導體層之電流供給而使向其角部以外之區域供給之電流增加的構造。藉此,可減少自容易接近透光性構件之表面之發光元件之角部直接朝發光裝置之側方穿過之光,從而更有效地利用透光性構件之透鏡效果而效率良好地朝發光裝置之上方提取光。 With the miniaturization of the light-emitting device in recent years and the miniaturization of the light-transmitting member that covers the light-emitting element, the surface of the light-transmitting member is close to the light-emitting element, and as a result, the lens effect of the light-transmitting member cannot be obtained and the light is directly emitted. The light passing through the side of the device is increased, and it is feared that the light extracted from above the self-illuminating device cannot be obtained with the desired efficiency. On the other hand, when the light-emitting element having a hexagonal planar shape is covered by the light-transmitting member as in the present embodiment, it is possible to further ensure light emission as compared with the light-emitting element having the same planar area and a quadrangular planar shape. The distance between the component and the surface of the light transmissive member. Thereby, the lens effect of a translucent member can be utilized effectively. Further, the light-emitting element of the present embodiment has a structure for suppressing light emission at the corner portion, in other words, a structure for increasing the current supplied to the region other than the corner portion instead of suppressing the current supply to the semiconductor layer of the diagonal portion. Thereby, it is possible to reduce light that is directly passed toward the side of the light-emitting device from the corner portion of the light-emitting element that is easily accessible to the surface of the light-transmitting member, thereby more effectively utilizing the lens effect of the light-transmitting member to efficiently illuminate toward the light-emitting member. Light is extracted above the device.

以下,基於圖式對發光元件及使用其之發光裝置之實施例詳細地進行說明。 Hereinafter, embodiments of a light-emitting element and a light-emitting device using the same will be described in detail based on the drawings.

實施例1:發光元件 Example 1: Light-emitting element

如圖1A~圖1D所示,本實施例之發光元件10之平面形狀為六邊形。此種發光元件10包括n側半導體層2n及p側半導體層3p、第1p電極4p、第2p電極5p及n電極7n。發光元件10之一邊長度約為1.2mm。 As shown in FIGS. 1A to 1D, the planar shape of the light-emitting element 10 of the present embodiment is hexagonal. Such a light-emitting element 10 includes an n-side semiconductor layer 2n and a p-side semiconductor layer 3p, a first p-electrode 4p, a second p-electrode 5p, and an n-electrode 7n. The length of one side of the light-emitting element 10 is about 1.2 mm.

半導體層係於六邊形之藍寶石基板8上依次積層n側半導體層2n、活性層Ac、p側半導體層3p而構成。半導體層係於其最外周具有將p側半導體層3p及活性層Ac之一部分去除而使n側半導體層2n露出之區域。 The semiconductor layer is formed by sequentially laminating an n-side semiconductor layer 2n, an active layer Ac, and a p-side semiconductor layer 3p on a hexagonal sapphire substrate 8. The semiconductor layer has a region where the p-side semiconductor layer 3p and the active layer Ac are partially removed and the n-side semiconductor layer 2n is exposed on the outermost periphery thereof.

p側半導體層3p具有複數個孔6。於孔6中,亦將存在於其下方之活性層Ac去除而使n側半導體層2n露出。但是,此處之p側半導體層3p於六邊形之彼此不鄰接之3個角部及其周邊未配置孔,而於除該等 角部及其周邊以外之區域具有複數個孔6。 The p-side semiconductor layer 3p has a plurality of holes 6. In the hole 6, the active layer Ac existing under it is also removed to expose the n-side semiconductor layer 2n. However, the p-side semiconductor layer 3p here is not provided with holes at the three corner portions of the hexagon which are not adjacent to each other, and the periphery thereof is disposed. The corner portion and its periphery have a plurality of holes 6.

孔6為大致圓形,其直徑約為27μm,且例如形成有58個。孔6係於俯視下相對於六邊形之邊大致平行地排列,其中心間距離約為300μm。孔6之總面積為半導體層之平面面積之0.92%左右,約為33000μm2The hole 6 is substantially circular and has a diameter of about 27 μm and is formed, for example, by 58 pieces. The holes 6 are arranged substantially in parallel with respect to the sides of the hexagon in plan view, and the distance between the centers is about 300 μm. The total area of the holes 6 is about 0.92% of the planar area of the semiconductor layer, which is about 33,000 μm 2 .

與p側半導體層3p相接地於除複數個孔6以外之大致整面配置有第1p電極4p。此處,大致整面係指p側半導體層3p之上表面之外緣及孔6附近之內緣以外之區域。例如,第1p電極4p較佳為設置於p側半導體層3p之上表面中90%以上之面。第1p電極4p包含:含Ag層,其形成於p側半導體層3p上之大致整面;被覆該含Ag層之上表面之層;及絕緣層4a,其進而被覆含Ag層之上表面之一部分及側面且包含SiN。被覆含Ag層之層由自半導體層側起為Ni層、Ti層及Pt層之積層膜形成。藉由此種積層構造,能夠將自活性層Ac出射之光朝藍寶石基板8側反射,而能夠提高光提取效率。又,藉由被覆含Ag層之層及絕緣層4a,能夠有效地防止Ag之遷移。 The first p-electrode 4p is disposed on substantially the entire surface except the plurality of holes 6 in contact with the p-side semiconductor layer 3p. Here, the substantially entire surface refers to a region other than the outer edge of the upper surface of the p-side semiconductor layer 3p and the inner edge of the vicinity of the hole 6. For example, the first p-electrode 4p is preferably provided on the surface of 90% or more of the upper surface of the p-side semiconductor layer 3p. The 1st p electrode 4p includes: an Ag-containing layer formed on substantially the entire surface of the p-side semiconductor layer 3p; a layer covering the upper surface of the Ag-containing layer; and an insulating layer 4a which is further coated with the upper surface of the Ag-containing layer Part and side and contain SiN. The layer covering the Ag layer is formed of a laminated film of a Ni layer, a Ti layer, and a Pt layer from the semiconductor layer side. According to such a laminated structure, the light emitted from the active layer Ac can be reflected toward the sapphire substrate 8 side, and the light extraction efficiency can be improved. Further, by coating the layer containing the Ag layer and the insulating layer 4a, migration of Ag can be effectively prevented.

於第1p電極4p上且包含未配置有上述孔6之3個角部及其周邊之區域配置有第2p電極5p。第2p電極5p具有扇形,該扇形具有與構成包含設置之角部及其周邊之區域之p側半導體層3p之2條邊中之一邊實質上平行之兩邊。扇形之兩邊分別為p側半導體層3p之一邊之長度之1/5左右,約為300μm。 The second p-electrode 5p is disposed on the first p-electrode 4p and includes a region where the three corners of the hole 6 are not disposed and the periphery thereof. The second p-electrode 5p has a sector shape having two sides substantially parallel to one of two sides of the p-side semiconductor layer 3p constituting the corner portion including the corner portion and the periphery thereof. Both sides of the sector are about 1/5 of the length of one side of the p-side semiconductor layer 3p, which is about 300 μm.

於第1p電極4p上配置有通過複數個孔6與n側半導體層2n電性連接之n電極7n。於圖1B中,將n電極7n之外周表示為7no,將內周表示為7ni。第1p電極4p介隔包含SiO2之絕緣膜9配置於第2p電極5p及其周邊以外之第1p電極4p之上方。絕緣膜9配置於孔6之側面、及露出之n側半導體層2n之一部分區域(n側半導體層2n上表面)上。絕緣膜9係於配置於p側半導體層3p上之第1p電極4p上之一部分區域上、即第 1p電極4p與第2p電極5p之連接部位具有將第1p電極4p之上表面露出之開口9a。又,絕緣膜9於發光元件10之最外周亦被覆將p側半導體層3p及活性層Ac之一部分去除而露出之n側半導體層2n。 An n-electrode 7n electrically connected to the n-side semiconductor layer 2n through a plurality of holes 6 is disposed on the first p-electrode 4p. In FIG. 1B, the outer circumference of the n-electrode 7n is represented as 7no, and the inner circumference is represented as 7ni. The first p electrode 4p is disposed above the first p electrode 5p other than the second p electrode 5p and the insulating film 9 including SiO 2 . The insulating film 9 is disposed on the side surface of the hole 6 and a partial region (the upper surface of the n-side semiconductor layer 2n) of the exposed n-side semiconductor layer 2n. The insulating film 9 is provided on a portion of the first p-electrode 3p disposed on the p-side semiconductor layer 3p, that is, the portion where the first p-electrode 4p and the second p-electrode 5p are connected, and has an opening 9a exposing the upper surface of the first p-electrode 4p. . Moreover, the insulating film 9 is also covered with the n-side semiconductor layer 2n in which the p-side semiconductor layer 3p and the active layer Ac are partially removed and exposed on the outermost periphery of the light-emitting element 10.

第2p電極5p及n電極7n均由自半導體層側起為Ti/Al-Si-Cu合金/Ti/Pt/Au之積層膜形成。 Each of the second p-electrode 5p and the n-electrode 7n is formed of a laminated film of Ti/Al-Si-Cu alloy/Ti/Pt/Au from the semiconductor layer side.

於使用此種發光元件10製造發光裝置之情形時,如圖1E及1F所示,將與第2p電極5p連接之凸塊電極BP相對於各第2p電極5p形成1個,將與電極7n連接之凸塊電極BP遍及整面均勻地形成複數個。與n電極7n連接之凸塊電極BP較佳為形成於俯視下不與孔6重疊之位置,以使絕緣膜9不因安裝發光元件10時之過重負荷而破壞。 When the light-emitting device is manufactured using the light-emitting device 10, as shown in FIGS. 1E and 1F, the bump electrode BP connected to the second p-electrode 5p is formed one by one with respect to each of the second p-electrodes 5p, and is connected to the electrode 7n. The bump electrode BP is uniformly formed over the entire surface. The bump electrode BP connected to the n-electrode 7n is preferably formed at a position that does not overlap the hole 6 in plan view, so that the insulating film 9 is not broken by the excessive load when the light-emitting element 10 is mounted.

實施例2:發光元件 Example 2: Light-emitting element

實施例2之發光元件20如圖2所示,第2p電極25p不為扇形,而具有包含自扇形朝內側略微延長之2個部位之形狀,除此以外,具有與實施例1之發光元件10實質上相同之構成。 As shown in FIG. 2, the light-emitting element 20 of the second embodiment has a shape in which the second p-electrode 25p is not fan-shaped and has two shapes extending slightly from the inner side toward the inner side, and has the light-emitting element 10 of the first embodiment. Substantially the same composition.

實施例3:發光元件 Example 3: Light-emitting element

實施例3之發光元件30如圖3所示,扇形之第2p電極5p配置於包含所有角部及其周邊之區域。伴隨於此,於包含p側半導體層3p之6個角部及其周邊之區域未配置孔6,而孔之數量成為55個。因此,孔6之總面積為半導體層之平面面積之0.87%左右,約為3100μm2As shown in FIG. 3, the light-emitting element 30 of the third embodiment has a sector-shaped second p-electrode 5p disposed in a region including all the corner portions and its periphery. Along with this, the holes 6 are not disposed in the corners including the six corner portions of the p-side semiconductor layer 3p and the periphery thereof, and the number of the holes is 55. Therefore, the total area of the holes 6 is about 0.87% of the planar area of the semiconductor layer, which is about 3100 μm 2 .

除了上述構成以外,具有與實施例1之發光元件10實質上相同之構成。 Other than the above configuration, it has substantially the same configuration as that of the light-emitting element 10 of the first embodiment.

實施例4:發光元件 Example 4: Light-emitting element

實施例4之發光元件40如圖4所示,於其最外周具有將p側半導體層3p及活性層Ac之一部分去除而使n側半導體層2n露出之區域,但於角部具有未由絕緣膜9被覆之區域。又,於包含所有角部及其周邊之區域配置有外側凹陷之大致扇形之第2p電極45p。而且,於配置有第 2p電極45p之角部,於未由絕緣膜9被覆之區域,n電極7n之一部分與n側半導體層2n接觸而電性連接。 As shown in FIG. 4, the light-emitting element 40 of the fourth embodiment has a region in which the p-side semiconductor layer 3p and the active layer Ac are partially removed to expose the n-side semiconductor layer 2n, but has no insulation at the corner portion. The area covered by the film 9. Further, a second sector-shaped second p-electrode 45p having a laterally concave shape is disposed in a region including all the corner portions and its periphery. Moreover, in the configuration At a corner portion of the 2p electrode 45p, a portion of the n-electrode 7n is in contact with and electrically connected to the n-side semiconductor layer 2n in a region not covered by the insulating film 9.

除了上述構成以外,具有與實施例3之發光元件30實質上相同之構成。 Other than the above configuration, it has substantially the same configuration as that of the light-emitting element 30 of the third embodiment.

<發光元件之評價> <Evaluation of light-emitting elements>

藉由使用有限元素法之模擬軟體對實施例1~3之發光元件10、20、30中之電流密度之分佈進行了解析。將其結果分別示於圖5A~5C中。於圖5A~5C中,表示濃淡越濃則電流密度越高之情況。 The distribution of the current density in the light-emitting elements 10, 20, and 30 of Examples 1 to 3 was analyzed by using the simulation software of the finite element method. The results are shown in Figures 5A to 5C, respectively. In Figs. 5A to 5C, the case where the darkness is richer, the current density is higher.

又,為了參考,亦針對如下之發光元件40對電流密度之分佈進行了解析,該發光元件40如圖6A所示,沿著一對對角線配置第2p電極55,除此以外,具有與發光元件10實質上相同之構成。將其結果示於圖6B中。 Further, for reference, the current density distribution is also analyzed for the light-emitting element 40, which has the second p-electrode 55 disposed along a pair of diagonal lines as shown in FIG. 6A, and has The light-emitting elements 10 are substantially identical in configuration. The results are shown in Fig. 6B.

根據圖5A~5C可知,發光元件10、20、30均能夠使配置有第2p電極5之區域中之電流密度比與半導體層之邊鄰接之區域及內側之區域中之電流密度低。 5A to 5C, the light-emitting elements 10, 20, and 30 can make the current density in the region where the second p-electrode 5 is disposed lower than the current density in the region adjacent to the side of the semiconductor layer and the inner region.

尤其是,於發光元件20中,隨著相較發光元件10增大第2p電極25之面積,能夠降低配置有第2p電極25之角部之電流密度,另一方面,能夠於內側之區域、尤其是半導體層之中央區域提高電流密度。 In particular, in the light-emitting element 20, as the area of the second p-electrode 25 is increased relative to the light-emitting element 10, the current density at the corner portion where the second p-electrode 25 is disposed can be reduced, and the inner region can be In particular, the central region of the semiconductor layer increases the current density.

又,於發光元件30中,隨著將第2p電極35之數量增加至6個,能夠於配置有第2p電極35之角部降低電流密度,另一方面,能夠於整個內側更均勻地提高電流密度。 Further, in the light-emitting element 30, as the number of the second p-electrodes 35 is increased to six, the current density can be lowered at the corner portion where the second p-electrode 35 is disposed, and the current can be more uniformly increased over the entire inner side. density.

該等現象表示,與發光元件50中之半導體層之角部及外周部分之電流密度分佈相比,可使電流密度分佈於半導體層之內側區域更顯著地增大。 These phenomena indicate that the current density distribution can be more significantly increased in the inner region of the semiconductor layer than the current density distribution of the corner portion and the outer peripheral portion of the semiconductor layer in the light-emitting element 50.

又,針對發光元件10、20、30,藉由使用有限元素法之模擬對施加電流350mA之電流之順向電壓Vf進行了解析。將其結果與孔之 個數、經由孔將n電極與n側半導體層連接之區域之總面積(n側接觸區域之面積)、第1p電極之面積(p側接觸區域之面積)一同示於表1中。再者,n側接觸區域及p側接觸區域之面積均將發光元件10之面積設為100%,而以其相對值來表示。 Further, with respect to the light-emitting elements 10, 20, and 30, the forward voltage Vf of a current of a current of 350 mA was analyzed by simulation using a finite element method. The result and the hole The total number of areas (the area of the n-side contact region) and the area of the first p-electrode (the area of the p-side contact region) of the region where the n-electrode is connected to the n-side semiconductor layer via the hole are shown in Table 1. Further, the areas of the n-side contact region and the p-side contact region each have an area of the light-emitting element 10 of 100%, and are represented by their relative values.

如表1所示,可確認到如下內容,即,相對於發光元件10,於發光元件20、30,Vf值分別降低了0.011V(約3.1%)、0.012V(約3.5%)。認為發光元件20與發光元件10相比,p側接觸區域之面積相同,但第2p電極之面積較大,而將第2p電極附近之電流集中緩和,其結果,Vf值降低。又,認為發光元件30與發光元件10及發光元件20相比,第2p電極之數量自3個增加至6個,而更均等地向半導體層供給電流,因此,Vf值降低。 As shown in Table 1, it was confirmed that the Vf values of the light-emitting elements 20 and 30 were reduced by 0.011 V (about 3.1%) and 0.012 V (about 3.5%) with respect to the light-emitting elements 10, respectively. It is considered that the light-emitting element 20 has the same area as the p-side contact region as compared with the light-emitting element 10, but the area of the second p-electrode is large, and the current concentration in the vicinity of the second p-electrode is moderated, and as a result, the Vf value is lowered. Further, in the light-emitting element 30, the number of the second p-electrodes is increased from three to six, and the current is supplied to the semiconductor layer more uniformly than the light-emitting element 10 and the light-emitting element 20. Therefore, the Vf value is lowered.

實施例5:發光裝置 Embodiment 5: Light emitting device

實施例5之發光裝置60如圖8A及8B所示,包括與實施形態1之發光元件10同樣地平面形狀為六邊形之發光元件70、及於表面具有正負一對配線圖案(未圖示)之基體80。 As shown in FIGS. 8A and 8B, the light-emitting device 60 of the fifth embodiment includes a light-emitting element 70 having a hexagonal planar shape as in the light-emitting element 10 of the first embodiment, and a pair of positive and negative wiring patterns on the surface (not shown). The base 80 of the base.

發光元件70面朝下安裝於基體80,發光元件70之n電極及p電極經由接合構件與基體80之配線圖案連接。又,發光元件70由包含聚矽氧樹脂等之半球狀之透光性構件90覆蓋。透光性構件90亦與發光元件70一同覆蓋基體80之上表面之一部分。 The light-emitting element 70 is mounted face down on the base 80, and the n-electrode and the p-electrode of the light-emitting element 70 are connected to the wiring pattern of the base 80 via the joint member. Further, the light-emitting element 70 is covered with a translucent member 90 including a hemispherical shape such as polyoxyn resin. The light transmissive member 90 also covers a portion of the upper surface of the base 80 together with the light emitting element 70.

此種發光裝置能夠更有效地利用透光性構件90之透鏡效果而效 率良好地朝發光裝置之上方提取光。 Such a light-emitting device can more effectively utilize the lens effect of the light transmissive member 90 The light is extracted well above the illuminating device.

實施例6:發光裝置 Example 6: Light emitting device

實施例6之發光裝置61如圖9A及9B所示,包括與實施形態1之發光元件10同樣地平面形狀為六邊形之發光元件70、及於表面具有正負一對配線圖案(未圖示)之基體80。發光元件70面朝下安裝於基體80,且其側面及作為光提取面之上表面由包含YAG等之螢光體層92覆蓋。又,由螢光體層92被覆之發光元件70之表面由包含聚矽氧樹脂等之透光性構件91呈大致四邊形之形狀覆蓋。 As shown in FIGS. 9A and 9B, the light-emitting device 61 of the sixth embodiment includes a light-emitting element 70 having a hexagonal planar shape as in the light-emitting element 10 of the first embodiment, and a pair of positive and negative wiring patterns on the surface (not shown). The base 80 of the base. The light-emitting element 70 is mounted face down on the base 80, and its side surface and the upper surface as the light extraction surface are covered by a phosphor layer 92 containing YAG or the like. Further, the surface of the light-emitting element 70 covered with the phosphor layer 92 is covered with a substantially quadrangular shape by a light-transmissive member 91 containing a polysiloxane resin or the like.

此種發光裝置能夠利用螢光體層92之波長轉換效果而效率良好地提取任意顏色之光。 Such a light-emitting device can efficiently extract light of any color by the wavelength conversion effect of the phosphor layer 92.

實施例7:光源單元 Embodiment 7: Light source unit

實施例7之光源單元65如圖10A及10B所示,包括電路基板81、彼此相隔地搭載於該電路基板81上之實施例6之複數個發光裝置61、及被覆各發光裝置61之透鏡93。此處之透鏡93例如如圖10A所示,具有能夠有效地利用來自發光裝置61之光之大致圓形。又,亦可於發光裝置61之上方且透鏡93之位於與發光裝置61對向之下表面之相反側之上表面,如圖10B所示地具有能夠將自發光裝置61出射之光擴散之凹部。 As shown in FIGS. 10A and 10B, the light source unit 65 of the seventh embodiment includes a circuit board 81, a plurality of light-emitting devices 61 of the sixth embodiment mounted on the circuit board 81 so as to be spaced apart from each other, and a lens 93 covering each of the light-emitting devices 61. . Here, as shown in FIG. 10A, the lens 93 has a substantially circular shape capable of effectively utilizing light from the light-emitting device 61. Further, it may be above the light-emitting device 61 and the lens 93 is located on the upper surface opposite to the lower surface of the light-emitting device 61, and has a concave portion capable of diffusing the light emitted from the light-emitting device 61 as shown in FIG. 10B. .

於此種光源單元,發光裝置可藉由縱向及/或橫向地、無規地或者有規律地配置,而用作背光光源、照明用之光源。 In such a light source unit, the light-emitting device can be used as a backlight source and a light source for illumination by being vertically and/or laterally, randomly or regularly arranged.

實施例8:光源單元 Embodiment 8: Light source unit

實施例8之光源單元66如圖11A及11B所示,包括電路基板81、彼此相隔地搭載於該電路基板81上之實施例6之發光裝置61、及被覆該發光裝置61之菲涅爾透鏡94。此處之菲涅爾透鏡94例如具備能夠將配置於發光裝置61內之發光元件或配置於其上之螢光體層之自外側之視認性降低的形狀。 As shown in FIGS. 11A and 11B, the light source unit 66 of the eighth embodiment includes a circuit board 81, a light-emitting device 61 of the sixth embodiment mounted on the circuit board 81, and a Fresnel lens covering the light-emitting device 61. 94. Here, the Fresnel lens 94 has a shape that can reduce the visibility from the outside of the light-emitting element disposed in the light-emitting device 61 or the phosphor layer disposed thereon.

此種光源單元可用作相機之閃光燈等。 Such a light source unit can be used as a flash of a camera or the like.

[產業上之可利用性] [Industrial availability]

本發明之實施形態及實施例之發光元件可用於各種照明器具、相機之閃光燈、液晶顯示器之背光光源、各種指示器用光源、車載用光源、感測器用光源、信號機、車載零件、看板用發光字等各種光源。 The light-emitting element according to the embodiment and the embodiment of the present invention can be used for various lighting fixtures, flashlights for cameras, backlight sources for liquid crystal displays, various indicator light sources, vehicle light sources, sensor light sources, signal machines, vehicle parts, and kanban illuminators. Various light sources such as words.

2n‧‧‧n側半導體層 2n‧‧‧n side semiconductor layer

3p‧‧‧p側半導體層 3p‧‧‧p side semiconductor layer

4p‧‧‧第1p電極 4p‧‧‧1p electrode

5p‧‧‧第2p電極 5p‧‧‧2p electrode

6‧‧‧孔 6‧‧‧ hole

7n‧‧‧n電極 7n‧‧‧n electrode

9a‧‧‧開口 9a‧‧‧ Opening

10‧‧‧發光元件 10‧‧‧Lighting elements

R1‧‧‧角部 R1‧‧‧ corner

R2‧‧‧角部 R2‧‧‧ corner

R3‧‧‧角部 R3‧‧‧ corner

R4‧‧‧角部 R4‧‧‧ corner

R5‧‧‧角部 R5‧‧‧ corner

R6‧‧‧角部 R6‧‧‧ corner

Claims (14)

一種發光元件,其特徵在於其係平面形狀為六邊形者,且包括:n側半導體層;p側半導體層,其設置於上述n側半導體層上;複數個孔,其等於俯視下設置於上述p側半導體層之除彼此位於對角位置之3個角部以外之區域,使上述n側半導體層露出;第1p電極,其與上述p側半導體層相接地設置;第2p電極,其分別設置於上述第1p電極上之上述3個角部;及n電極,其設置於上述第1p電極上,且通過上述複數個孔而與上述n側半導體層電性連接。 A light-emitting element characterized in that it has a hexagonal shape in plan view, and includes: an n-side semiconductor layer; a p-side semiconductor layer disposed on the n-side semiconductor layer; and a plurality of holes which are equal to The p-side semiconductor layer is exposed in a region other than the three corner portions of the diagonal position to expose the n-side semiconductor layer; the first p-electrode is provided in contact with the p-side semiconductor layer; and the second p-electrode is provided. The three corner portions respectively provided on the first p-electrode and the n-electrode are provided on the first p-electrode, and are electrically connected to the n-side semiconductor layer through the plurality of holes. 一種發光元件,其特徵在於其係平面形狀為六邊形者,且包括:n側半導體層;p側半導體層,其設置於上述n側半導體層上;複數個孔,其等於俯視下設置於上述p側半導體層之除位於最遠位置之2個角部以外之區域,使上述n側半導體層露出;第1p電極,其與上述p側半導體層相接地設置;第2p電極,其分別設置於上述第1p電極上之上述3個角部;及n電極,其設置於上述第1p電極上,且通過上述複數個孔而與上述n側半導體層電性連接。 A light-emitting element characterized in that it has a hexagonal shape in plan view, and includes: an n-side semiconductor layer; a p-side semiconductor layer disposed on the n-side semiconductor layer; and a plurality of holes which are equal to The n-side semiconductor layer is exposed in a region other than the two corner portions located at the farthest position of the p-side semiconductor layer; the first p-electrode is provided in contact with the p-side semiconductor layer; and the second p-electrode is respectively provided The three corner portions provided on the first p-electrode and the n-electrode are provided on the first p-electrode, and are electrically connected to the n-side semiconductor layer through the plurality of holes. 如請求項1或2之發光元件,其中上述複數個孔未設置於包含除上述彼此位於對角位置之3個角部以外之區域、或者除上述彼此相對且位於最遠位置之2個角部以外之區域的6個角部。 The light-emitting element of claim 1 or 2, wherein the plurality of holes are not provided in a region other than the three corner portions which are located at diagonal positions with respect to each other, or two corner portions which are apart from each other and are located at the farthest position 6 corners of the area outside. 如請求項3之發光元件,其中上述第2p電極分別設置於上述第1 p電極上之上述6個角部。 The light-emitting element of claim 3, wherein the second p-electrode is respectively disposed on the first The above six corners on the p electrode. 如請求項1或2之發光元件,其中上述第2p電極為具有與構成分別設置之上述角部之兩邊中之一邊平行之兩邊的扇形。 The light-emitting element according to claim 1 or 2, wherein the second p-electrode has a sector shape having two sides parallel to one of two sides constituting the corner portions respectively provided. 如請求項1或2之發光元件,其中上述複數個孔沿著上述p側半導體層之邊配置。 The light-emitting element of claim 1 or 2, wherein the plurality of holes are disposed along a side of the p-side semiconductor layer. 如請求項1或2之發光元件,其中上述n電極自與上述n側半導體層電性連接之部分介隔絕緣層設置至上述第1p電極上。 The light-emitting element of claim 1 or 2, wherein the n-electrode is provided on the first p-electrode from a portion of the insulating layer that is electrically connected to the n-side semiconductor layer. 如請求項7之發光元件,其中上述絕緣層為介電體多層膜。 The light-emitting element of claim 7, wherein the insulating layer is a dielectric multilayer film. 如請求項1或2之發光元件,其中上述第1p電極包含與上述p側半導體層相接之含銀層。 The light-emitting element of claim 1 or 2, wherein the first p-electrode comprises a silver-containing layer that is in contact with the p-side semiconductor layer. 如請求項1或2之發光元件,其中上述第1p電極為透光性導電膜。 The light-emitting element of claim 1 or 2, wherein the first p-electrode is a light-transmitting conductive film. 如請求項1或2之發光元件,其中上述n電極於上述複數個孔內分別經由與上述n側半導體層相接之透光性導電膜而與上述n側半導體層電性連接。 The light-emitting element according to claim 1 or 2, wherein the n-electrode is electrically connected to the n-side semiconductor layer via the light-transmitting conductive film that is in contact with the n-side semiconductor layer in the plurality of holes. 一種發光裝置,其包括:如請求項1至11中任一項之發光元件;基體,其設置有上述發光元件;及半球狀之透光性構件,其覆蓋上述發光元件。 A light-emitting device comprising: the light-emitting element according to any one of claims 1 to 11, a substrate provided with the light-emitting element; and a hemispherical light-transmitting member covering the light-emitting element. 如請求項12之發光裝置,其進而於上述發光元件與上述透光性構件之間包括螢光體層。 The light-emitting device of claim 12, further comprising a phosphor layer between the light-emitting element and the light-transmitting member. 如請求項12或13之發光裝置,其進而包括覆蓋上述透光性構件之光學構件。 The light-emitting device of claim 12 or 13, which further comprises an optical member covering the light transmissive member.
TW105117259A 2015-07-30 2016-06-01 Light emitting element and light emitting device TWI690091B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2015150828 2015-07-30
JP2015-150828 2015-07-30
JP2016100165A JP6696298B2 (en) 2015-07-30 2016-05-19 Light emitting device and light emitting device using the same
JP2016-100165 2016-05-19

Publications (2)

Publication Number Publication Date
TW201709556A true TW201709556A (en) 2017-03-01
TWI690091B TWI690091B (en) 2020-04-01

Family

ID=57988820

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105117259A TWI690091B (en) 2015-07-30 2016-06-01 Light emitting element and light emitting device

Country Status (4)

Country Link
JP (1) JP6696298B2 (en)
KR (1) KR102528843B1 (en)
CN (1) CN106410003B (en)
TW (1) TWI690091B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI817708B (en) * 2017-07-21 2023-10-01 日商日亞化學工業股份有限公司 Light source

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11024770B2 (en) 2017-09-25 2021-06-01 Nichia Corporation Light emitting element and light emitting device
US10658559B2 (en) * 2018-02-28 2020-05-19 Nichia Corporation Light emitting element and light emitting device

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1450415A3 (en) * 1993-04-28 2005-05-04 Nichia Corporation Gallium nitride-based III-V group compound semiconductor device
JP2001168395A (en) * 1999-12-09 2001-06-22 Showa Denko Kk Iii-v compound semiconductor light emitting diode
JP2006086469A (en) * 2004-09-17 2006-03-30 Matsushita Electric Ind Co Ltd Semiconductor light-emitting device, illumination module, illuminator, and method of manufacturing the semiconductor light-emitting device
JP3904585B2 (en) * 2004-10-07 2007-04-11 昭和電工株式会社 Manufacturing method of semiconductor device
JP4995722B2 (en) 2004-12-22 2012-08-08 パナソニック株式会社 Semiconductor light emitting device, lighting module, and lighting device
JP4367348B2 (en) 2005-01-21 2009-11-18 住友電気工業株式会社 Wafer and light emitting device manufacturing method
JP2010251481A (en) 2009-04-14 2010-11-04 Panasonic Electric Works Co Ltd Light-emitting device
JP2012044048A (en) * 2010-08-20 2012-03-01 Sharp Corp Method for manufacturing light emitting element package and light emitting element package
JP2014511132A (en) * 2010-09-03 2014-05-08 ザ プロクター アンド ギャンブル カンパニー Light emitting device
JP5050109B2 (en) * 2011-03-14 2012-10-17 株式会社東芝 Semiconductor light emitting device
JP4989773B1 (en) * 2011-05-16 2012-08-01 株式会社東芝 Semiconductor light emitting device
KR101276053B1 (en) * 2011-07-22 2013-06-17 삼성전자주식회사 Semiconductor light emitting device and light emitting apparatus
JP6024432B2 (en) * 2012-12-10 2016-11-16 日亜化学工業株式会社 Semiconductor light emitting device
JP2014127565A (en) * 2012-12-26 2014-07-07 Toyoda Gosei Co Ltd Semiconductor light-emitting element
KR102099439B1 (en) * 2013-10-08 2020-04-09 엘지이노텍 주식회사 Light emitting Device, and package including the deivce
KR20150064414A (en) * 2013-12-03 2015-06-11 삼성전자주식회사 Light emitting device and lighting appratus having the same
US20150179873A1 (en) * 2013-12-20 2015-06-25 Palo Alto Research Center Incorporated Small-sized light-emitting diode chiplets and method of fabrication thereof
KR102122358B1 (en) * 2014-01-20 2020-06-15 삼성전자주식회사 Semiconductor light emitting device
JP2016207725A (en) * 2015-04-17 2016-12-08 スタンレー電気株式会社 Light emitting diode device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI817708B (en) * 2017-07-21 2023-10-01 日商日亞化學工業股份有限公司 Light source

Also Published As

Publication number Publication date
JP6696298B2 (en) 2020-05-20
CN106410003A (en) 2017-02-15
KR20170015145A (en) 2017-02-08
CN106410003B (en) 2020-08-07
JP2017034231A (en) 2017-02-09
KR102528843B1 (en) 2023-05-03
TWI690091B (en) 2020-04-01

Similar Documents

Publication Publication Date Title
US9048404B2 (en) Thin flat solid state light source module
JP6299336B2 (en) Light emitting element and light emitting device using the same
US10361340B2 (en) Light emitting element and light emitting device
KR20170019630A (en) Light emitting device and display apparatus having thereof
JP2020141149A (en) Light-emitting device
JP2007266356A (en) Light-emitting device and illuminator using the same
EP2746645A2 (en) Lamp unit and vehicle lamp apparatus including the same
KR20190024753A (en) Light emitting device
JP6720220B2 (en) Optical lens, illumination module, and light unit including the same
JP4986608B2 (en) Light emitting device and lighting device
JP6959548B2 (en) Light emitting device and its manufacturing method
JP2019029386A (en) Light-emitting device and manufacturing method thereof
US10991859B2 (en) Light-emitting device and method of manufacturing the same
TWI690091B (en) Light emitting element and light emitting device
JP4707433B2 (en) Light emitting device and lighting device
US10700245B2 (en) Light-emitting device
US10283677B2 (en) LED structure and fabrication method
KR102425317B1 (en) Optical lens, light emitting module and light unit having thereof
KR101954203B1 (en) Lamp unit and vehicle lamp apparatus for using the same
CN110869665B (en) Lighting module
JP6196018B2 (en) Light emitting device
WO2023033006A1 (en) Led light emitting device
JP2024048958A (en) Manufacturing method of electronic components and method of detecting foreign matter
JP2018121021A (en) Light emitting device and lighting system