TW201631712A - Sealing paste, brazing material and production method thereof, sealing lid member and production method thereof, and package sealing method - Google Patents

Sealing paste, brazing material and production method thereof, sealing lid member and production method thereof, and package sealing method Download PDF

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TW201631712A
TW201631712A TW104135847A TW104135847A TW201631712A TW 201631712 A TW201631712 A TW 201631712A TW 104135847 A TW104135847 A TW 104135847A TW 104135847 A TW104135847 A TW 104135847A TW 201631712 A TW201631712 A TW 201631712A
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powder
sealing
paste
hard
mass
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TW104135847A
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TWI655717B (en
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Masayuki Ishikawa
Yoshifumi Yamamoto
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Mitsubishi Materials Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/30Selection of soldering or welding materials proper with the principal constituent melting at less than 1550 degrees C
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/10Containers; Seals characterised by the material or arrangement of seals between parts, e.g. between cap and base of the container or between leads and walls of the container
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

This sealing paste contains a starting material powder and a binder, the starting material powder containing 5-40 mass% of a low melting point metal powder having a 0.5-20.0 [mu]m average particle diameter and a melting point or liquidus temperature of less than 240 DEG C, 40-90 mass% of an Ag powder having an average particle diameter of 0.1-10.0 [mu]m, and 5-50 mass% of a Cu powder having an average particle diameter of 0.1-10.0 [mu]m. The sealing paste can easily form a brazing material, the alloy composition of said brazing material can be changed easily, and the sealing paste can reliably seal a package hermetically without resulting in cracking.

Description

密封用糊膏、硬焊接合材料與其製造方法、密封用蓋材料與其製造方法、及封裝體密封方法 Sealing paste, hard soldering material, manufacturing method thereof, sealing cover material, manufacturing method thereof, and package sealing method

本發明係關於一種密封用糊膏、硬焊接合材料及封裝體密封方法,尤其,係關於一種使用供給的自由度高、組成容易控制之混合粉糊膏之密封用糊膏、硬焊接合材料及其製造方法、密封用蓋材料及其製造方法、以及封裝體密封方法。 The present invention relates to a sealing paste, a hard soldering material, and a package sealing method, and more particularly to a sealing paste and a hard soldering material using a mixed powder paste having a high degree of freedom in supply and easy composition control. And a manufacturing method thereof, a lid material for sealing, a method for producing the same, and a method for sealing a package.

本案係依據2014年10月31日所申請之特願2014-222900號、2015年8月24日所申請之特願2015-164700號、及2015年10月29日所申請之特願2015-213467號,主張優先權,在此援用其內容。 The case is based on the special request 2014-222900 filed on October 31, 2014, the special offer 2015-164700 applied for on August 24, 2015, and the special offer 2015-213467 applied on October 29, 2015. No., claiming priority, hereby invoke its contents.

一般,密封用材料係使用具有未達450℃之熔點的焊料,或使用具有450℃以上之熔點的硬焊材料。進一步為以蓋材料密封封裝體,亦有時使用以專利文獻1所記載之被稱為密封環者作為密封材料並挾住,於蓋材料或封裝體的密封部施予Ni(鎳)鍍覆處理者、或於密封環本身之密封部施予Ni鍍覆者。其他,亦有時使用玻璃或 樹脂作為密封材。 Generally, the material for sealing is a solder having a melting point of less than 450 ° C, or a brazing material having a melting point of 450 ° C or higher. Further, in order to seal the package with a lid material, a sealant called a seal ring described in Patent Document 1 may be used as a sealing material, and Ni (nickel) plating may be applied to the seal portion of the lid material or the package. The processor or the Ni plating is applied to the sealing portion of the seal ring itself. Other, sometimes using glass or The resin acts as a sealing material.

在焊料材中可使用Pb(鉛)-63質量% Sn(錫)或Sn-3質量% Ag(銀)-0.5質量% Cu(銅)等之無鉛焊料材、Pb-10質量% Sn或Au(金)-20質量% Sn之高溫焊料。硬焊材料主要可使用Ag硬焊、例如Ag-28質量% Cu作為料頭,含有Ag-22質量% Cu-17質量% Zn(鋅)-5質量% Sn、或Cd(鎘)或Ni之Ag硬焊合金。於密封環或蓋材料中係有鈷或42合金等,對此等施予Ni鍍覆處理。 A lead-free solder material such as Pb (lead) - 63% by mass of Sn (tin) or Sn - 3 mass % Ag (silver) - 0.5% by mass of Cu (copper), Pb - 10% by mass of Sn or Au can be used for the solder material. (Gold) -20% by mass of Sn high temperature solder. The brazing material can mainly be Ag brazed, for example, Ag-28 mass% Cu as a material head, and contains Ag-22 mass% Cu-17 mass% Zn(zinc)-5 mass% Sn, or Cd (cadmium) or Ni. Ag brazing alloy. Cobalt or a 42 alloy or the like is attached to the seal ring or the cover material, and Ni plating treatment is applied thereto.

使用密封環之密封法,當使用焊料材時,有時加工成環狀之焊料板與密封環一起挾入蓋材料與封裝體間,使用爐或烘箱而熔融/密封,或使用焊料糊膏等而於蓋材料形成環狀之焊料框,其後,與封裝體進行密封。另一方面,使用Ag硬焊時,將沖切出環狀之Ag硬焊板,與密封環一起挾入於蓋材料與封裝體間,使用有縫焊接機或雷射焊接機等而只密封部局部地形成高溫狀態而使Ag硬焊或形成於密封環之Ni鍍覆熔融,並密封。 In the sealing method using a seal ring, when a solder material is used, a solder plate processed into a ring shape may be interposed between the cap material and the package together with the seal ring, melted/sealed using a furnace or an oven, or a solder paste or the like may be used. The lid material is formed into a ring-shaped solder frame, and thereafter sealed with the package. On the other hand, when Ag brazing is used, a ring-shaped Ag brazing sheet is punched out, and is interposed between the cap material and the package together with the sealing ring, and is sealed only by a seam welding machine or a laser welding machine. The portion is locally formed in a high temperature state, and Ag is hard-welded or Ni-plated formed on the seal ring is melted and sealed.

使用密封環之密封法係密封環成為緩衝材,故可使用有縫焊接法等而使密封時的熱衝擊或機械應力緩和。 Since the sealing ring using the seal ring is a cushioning material, it is possible to use a seam welding method or the like to alleviate thermal shock or mechanical stress during sealing.

但,使用Ag硬焊與附Ni鍍覆的密封環而以焊接法密封時,必須挾入於蓋材與封裝體間進行密封,對位等效率差,非常麻煩。 However, when Ag brazing and a Ni-plated sealing ring are used for sealing by a welding method, it is necessary to break between the lid member and the package to perform sealing, and the efficiency such as alignment is poor, which is very troublesome.

因此,已提出一種使用Ag硬焊合金形成粉末 狀而糊膏化,印刷於蓋材料,進行熱處理而形成密封框之方法。 Therefore, it has been proposed to form a powder using an Ag brazing alloy. It is paste-formed, printed on a cover material, and heat-treated to form a sealing frame.

於專利文獻2中,在含有金屬粉末與有機溶劑而成之密封用金屬糊膏中,就金屬粉末而言,已揭示純度為99.9重量%以上、平均粒徑為0.1μm~1.0μm之金粉、銀粉、鉑粉或鈀粉所構成之金屬粉末85~93重量%、有機溶劑5~15重量%的比率調配而成之密封用金屬糊膏。使用此金屬糊膏之密封方法係已記載著使塗佈於糊膏構件或蓋體構件並使其乾燥之金屬糊膏,以80~300℃燒結而形成為金屬粉末燒結體之後,一邊加熱金屬粉末燒結體一邊加壓糊膏構件或帽體構件之方法。 In the metal paste for sealing, which contains a metal powder and an organic solvent, the metal powder has a purity of 99.9% by weight or more and an average particle diameter of 0.1 μm to 1.0 μm. A metal paste for sealing prepared by mixing a metal powder composed of silver powder, platinum powder or palladium powder in an amount of 85 to 93% by weight and an organic solvent of 5 to 15% by weight. In the sealing method using the metal paste, it is described that the metal paste applied to the paste member or the lid member is dried at 80 to 300 ° C to form a sintered metal powder, and the metal is heated. A method in which a powder sintered body pressurizes a paste member or a cap member.

專利文獻2記載之金屬糊膏係使用金粉、銀粉、鉑粉或鈀粉之單獨金屬粉者,並非使此等之金屬合金化者。 The metal paste described in Patent Document 2 is a metal powder of gold powder, silver powder, platinum powder or palladium powder, and is not a metal alloy.

於專利文獻3中已揭示含有由低熱膨脹金屬所構成之基材、及接合於該基材之至少一面的低溫型之銀系硬焊材料層而構成之銀硬焊包層材。此銀系硬焊材料層係於由低溫型的銀系硬焊材料所構成之金屬粉末中混合由溶劑與黏結劑所構成之介質而成之糊膏經塗佈後,進行加熱而使金屬粉熔融後急速冷卻凝固,進一步壓延加工而形成。具體之銀系硬焊材料可舉例如銀-銅-錫合金、銀-銅-銦合金、銀-銅-鋅合金。將此銀硬焊包層材沖切加工等而加工成預定尺寸,藉此,形成封裝體密封用蓋材料。 Patent Document 3 discloses a silver brazing clad material comprising a base material composed of a low thermal expansion metal and a low temperature type silver brazing material layer bonded to at least one surface of the base material. The silver brazing material layer is formed by mixing a paste composed of a solvent and a binder with a metal powder composed of a low-temperature silver brazing material, and then heating the metal powder to heat the metal powder. After melting, it is rapidly cooled and solidified, and further formed by rolling. Specific examples of the silver brazing material include silver-copper-tin alloy, silver-copper-indium alloy, and silver-copper-zinc alloy. The silver brazing clad material is subjected to die cutting or the like to be processed into a predetermined size, whereby a lid material for encapsulating the package is formed.

於專利文獻4中係已揭示一種並非銀系硬焊 材料,而將含有Au與Sn之糊膏狀硬焊材料組成物印刷於帽體的單面,然後,以Sn之熔點以上Au的熔點以下之溫度進行加熱處理,藉此,形成融接Au Sn硬焊材料之帽體,其帽體重疊於封裝體而進行融接之技術。 It has been disclosed in Patent Document 4 that it is not a silver brazing. a paste-like brazing material composition containing Au and Sn is printed on one surface of the cap body, and then heat-treated at a temperature equal to or lower than the melting point of Au above the melting point of Au, thereby forming a fusion Au Sn A cap body of a brazing material in which a cap body is superposed on a package body to be fused.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1:日本特開平9-293799號公報 Patent Document 1: Japanese Patent Publication No. 9-293799

專利文獻2:日本特開2008-28364號公報 Patent Document 2: JP-A-2008-28364

專利文獻3:日本特開2006-49595號公報 Patent Document 3: Japanese Laid-Open Patent Publication No. 2006-49595

專利文獻4:日本特開2003-163299號公報 Patent Document 4: Japanese Laid-Open Patent Publication No. 2003-163299

然而,Ag硬焊糊膏之情形,於形成密封框時必須以Ag硬焊的熔點以上之高溫進行熱處理,其後,密封時再度進行焊接處理。又,因使Ag硬焊合金的粉末進行造粉,故希望有相異之合金組成時,必須再度合金製造、造粉處理,造成非常麻煩。 However, in the case of the Ag brazing paste, it is necessary to heat-treat at a high temperature higher than the melting point of Ag brazing in forming the sealing frame, and thereafter, the welding process is again performed at the time of sealing. Further, since the powder of the Ag brazing alloy is pulverized, it is necessary to re-alloy the alloy and pulverize the powder when it is desired to have a different alloy composition, which is very troublesome.

又,不使用密封環之所謂直接有縫密封法之有縫焊接法、或使用雷射焊接法、電子束焊接法等而進行密封時,僅密封部形成局部高溫狀態而密封,故伴隨熱衝擊或機械性應力而於接合層或封裝體易產生龜裂。 Further, when the seam is welded by a so-called direct seam sealing method without using a seal ring or when sealing is performed by a laser welding method or an electron beam welding method, only the sealing portion is locally high-temperature and sealed, so that thermal shock is accompanied. Or mechanical stress is liable to cause cracks in the bonding layer or the package.

在本發明中,目的在於提供一種可容易形成 硬焊接合材料,且可容易地變更其硬焊接合材料之合金組成,以及不產生龜裂而可確實地氣密密封封裝體之密封用糊膏、硬焊接合材料及其製造方法、密封用蓋材料及其製造方法、及封裝體密封方法。 In the present invention, it is an object to provide an easily formed A hard-welded material, which can easily change the alloy composition of the hard-welded material, and a sealing paste, a hard-welded material, a method for producing the same, and a seal for reliably sealing the package without cracking Cover material and its manufacturing method, and package sealing method.

本發明之密封用糊膏,係包含原料粉末及黏結劑,而該原料粉末係含有平均粒徑0.5μm以上20.0μm以下且熔點或液相線溫度為未達240℃的低熔點金屬粉末5質量%以上40質量%以下、平均粒徑0.1μm以上10.0μm以下的Ag粉末40質量%以上90質量%以下、及平均粒徑0.1μm以上10.0μm以下之Cu粉末5質量%以上50質量%以下。 The sealing paste of the present invention comprises a raw material powder containing a raw material powder and a binder, and the raw material powder contains a low melting point metal powder having an average particle diameter of 0.5 μm or more and 20.0 μm or less and a melting point or a liquidus temperature of less than 240 ° C. Ag powder of 40% by mass or more and 40% by mass or less and 90% by mass or less of the Ag powder having an average particle diameter of 0.1 μm or more and 10.0 μm or less and 5% by mass or less and 50% by mass or less of the Cu powder having an average particle diameter of 0.1 μm or more and 10.0 μm or less.

在本發明之密封用糊膏中,前述低熔點金屬粉末之平均粒徑較佳係前述Ag粉末之平均粒徑的1倍以上10倍以下且前述Cu粉末之平均粒徑的1倍以上10倍以下。 In the paste for sealing of the present invention, the average particle diameter of the low-melting-point metal powder is preferably 1 time or more and 10 times or less the average particle diameter of the Ag powder, and 1 or more times and 10 times the average particle diameter of the Cu powder. the following.

在本發明之密封用糊膏中,前述低熔點金屬粉末之平均粒徑較佳係大於前述Ag粉末之平均粒徑及前述Cu粉末之平均粒徑。 In the paste for sealing of the present invention, the average particle diameter of the low-melting-point metal powder is preferably larger than the average particle diameter of the Ag powder and the average particle diameter of the Cu powder.

在本發明之密封用糊膏中,前述黏結劑之混合比率較佳係2質量%以上50質量%以下。 In the sealing paste of the present invention, the mixing ratio of the binder is preferably 2% by mass or more and 50% by mass or less.

在本發明之密封用糊膏中,前述低熔點金屬粉末可使用選自Su、In、Sn-Ag-Cu焊料合金、Sn-Cu焊 料合金、Sn-Bi焊料合金、Sn-In焊料合金之一種以上。 In the paste for sealing of the present invention, the low melting point metal powder may be selected from the group consisting of Su, In, Sn-Ag-Cu solder alloy, and Sn-Cu solder. One or more of alloys, Sn-Bi solder alloys, and Sn-In solder alloys.

在本發明之硬焊接合材料之製造方法,係具有:將前述密封用糊膏塗佈於載體上之糊膏塗佈步驟及熱處理步驟;而該熱處理步驟係使塗佈於前述載體之前述密封用糊膏以前述低熔點金屬的熔融溫度進行加熱而於前述Ag粉末及前述Cu粉末之間使前述低熔點金屬的液相滲透後冷卻固化,藉此,形成前述Ag粉末及前述Cu粉末藉由前述低熔點金屬所構成之結合層連結而成之氣孔率10%以上的硬焊接合材料。又,此硬焊接合材料為確保強度及密封性,較佳係形成為氣孔率35%以下。 The method for producing a hard-welded material according to the present invention includes: a paste application step and a heat treatment step of applying the paste for sealing onto a carrier; and the heat treatment step is to apply the seal to the carrier Heating the liquid phase of the low melting point metal between the Ag powder and the Cu powder by heating at a melting temperature of the low melting point metal, and then solidifying and solidifying the liquid phase of the low melting point metal, thereby forming and forming the Ag powder and the Cu powder. A hard-welded material having a porosity of 10% or more in which the bonding layer composed of the low-melting-point metal is bonded. Further, in order to secure strength and sealing properties, the hard-welded material is preferably formed to have a porosity of 35% or less.

本發明之硬焊接合材料,係具有:平均粒徑0.1μm以上10.0μm以下的Ag粉末、平均粒徑0.1μm以上10.0μm以下之Cu粉末、及、由熔點或液相線溫度為未達240℃之低熔點金屬所構成,且使前述Ag粉末及前述Cu粉末連結之結合層;氣孔率為10%以上,且質量比率係前述Ag粉末為40質量%以上90質量%以下、前述Cu粉末為5質量%以上50質量%以下、前述結合層為5質量%以上40質量%以下。 The hard-welded material of the present invention has Ag powder having an average particle diameter of 0.1 μm or more and 10.0 μm or less, Cu powder having an average particle diameter of 0.1 μm or more and 10.0 μm or less, and a melting point or a liquidus temperature of less than 240. a bonding layer in which the Ag powder and the Cu powder are bonded to each other, and a porosity of 10% or more, and the mass ratio is 40% by mass or more and 90% by mass or less of the Ag powder, and the Cu powder is 5 mass% or more and 50 mass% or less, and the said bonding layer is 5 mass % or more and 40 mass % or less.

本發明之密封用蓋材料之製造方法,係具有:將前述密封用糊膏塗佈於蓋體的表面之糊膏塗佈步驟、及熱處理步驟;而該熱處理步驟係使塗佈於前述蓋體之前述密封用糊膏以前述低熔點金屬的熔融溫度進行加熱而於前述Ag粉末及前述Cu粉末之間使前述低熔點金屬的液相滲透後冷卻固化,藉此,形成前述Ag粉末及前述 Cu粉末藉由前述低熔點金屬所構成之結合層連結而成之氣孔率10%以上的硬焊接合材料。又,此硬焊接合材料較佳係形成為氣孔率35%以下。 The method for producing a lid material for sealing according to the present invention includes: a paste application step of applying the paste for sealing onto a surface of a lid body; and a heat treatment step; and the heat treatment step is applied to the lid body The sealing paste is heated at a melting temperature of the low melting point metal, and a liquid phase of the low melting point metal is infiltrated between the Ag powder and the Cu powder, followed by cooling and solidifying, thereby forming the Ag powder and the foregoing The Cu powder is a hard-welded material having a porosity of 10% or more by a bonding layer composed of the low-melting-point metal. Further, the hard-welded material is preferably formed to have a porosity of 35% or less.

在本發明之密封用蓋材料之製造方法中,在前述熱處理步驟後,可具有除去將殘存於前述硬焊接合材料中之黏結劑之黏結劑除去步驟,又,其黏結劑除去步驟係可具有以洗淨液洗淨硬焊接合材料之洗淨步驟、及熱處理該洗淨處理後之前述硬焊接合材料之烘烤處理。 In the method for producing a sealing cap material of the present invention, after the heat treatment step, the binder removing step of removing the binder remaining in the hard solder material may be provided, and the binder removing step may have The washing step of washing the hard-welded material with the washing liquid, and the baking treatment of the hard-welded material after the washing treatment.

在此密封用蓋材料之製造方法中,在前述糊膏塗佈步驟中可形成複數個前述蓋體的大小之板材表面上塗佈前述密封用糊膏,以及於前述熱處理步驟之後,具有將前述板材分割成前述蓋體之個片化步驟。 In the method for producing a sealing cover material, the sealing paste is applied to a surface of a sheet material having a plurality of the lid bodies formed in the paste applying step, and after the heat treatment step, The sheet is divided into individual sheeting steps of the aforementioned cover.

本發明之密封用蓋材料係具有:蓋體、及設於前述蓋體表面之前述硬焊接合材料。 The sealing cover material of the present invention has a lid body and the above-mentioned hard-welded material provided on the surface of the lid body.

本發明之封裝體密封方法,係使封裝體與蓋體藉由硬焊合金接合,且具有:糊膏塗佈步驟、熱處理步驟及合金化步驟;該糊膏塗佈步驟,係將前述密封用糊膏塗佈於前述蓋體的表面;該熱處理步驟,係使塗佈於前述蓋體之前述密封用糊膏以前述低熔點金屬的熔融溫度進行加熱而於前述Ag粉末及前述Cu粉末之間使前述低熔點金屬的液相滲透後冷卻固化,藉此,形成前述Ag粉末及前述Cu粉末藉由前述低熔點金屬所構成之結合層連結而成之氣孔率10%以上的硬焊接合材料;該合金化步驟,係以將前述蓋體重疊於前述封裝體之狀態使前述硬焊接合材 料加熱熔融而合金化,並形成為前述硬焊合金。又,此硬焊接合材料為確保強度及密封性等,較佳係形成為氣孔率35%以下。 In the package sealing method of the present invention, the package body and the cover body are joined by a brazing alloy, and have a paste coating step, a heat treatment step, and an alloying step; the paste coating step is for the sealing a paste applied to the surface of the lid body; the heat treatment step of heating the paste for sealing applied to the lid body at a melting temperature of the low melting point metal between the Ag powder and the Cu powder After the liquid phase of the low-melting-point metal is infiltrated and then solidified by cooling, the Ag powder and the Cu powder are bonded to each other by a bonding layer composed of the low-melting-point metal, and the porosity is 10% or more; The alloying step is performed by superposing the lid body on the package body to form the hard solder joint material. The material is heated and melted and alloyed, and formed into the aforementioned brazing alloy. Further, the hard-welded material is preferably formed to have a porosity of 35% or less in order to secure strength and sealing properties.

在本發明之封裝體密封方法中,於前述熱處理步驟與前述合金化步驟之間,可具有除去殘存於前述硬焊接合材料中之黏結劑的黏結劑除去步驟,又,其黏結劑除去步驟係可具有:以洗淨液洗淨前述硬焊接合材料之洗淨處理;及,熱處理該洗淨處理後之前述硬焊接合材料的烘烤處理。 In the package sealing method of the present invention, between the heat treatment step and the alloying step, there may be a binder removing step of removing the binder remaining in the hard solder material, and the binder removing step is The cleaning treatment may be performed by washing the hard solder material with a cleaning liquid, and heat-treating the hard solder material after the cleaning treatment.

在本發明之封裝體密封方法中,在前述糊膏塗佈步驟中可形成複數個前述蓋體的大小之板材表面上塗佈前述密封用糊膏,以及於前述熱處理步驟之後,具有將前述板材分割成前述蓋體之個片化步驟。 In the package sealing method of the present invention, the sealing paste is coated on the surface of the sheet material which can form a plurality of the lid bodies in the paste coating step, and after the heat treatment step, the sheet material is provided Divided into individual sheeting steps of the aforementioned cover.

在本發明之封裝體密封方法中,於前述個片化步驟之後,可具有對前述蓋體之表面施予金屬鍍覆之鍍覆處理步驟。金屬鍍覆處理係施作為蓋體之金屬化,分割成蓋體後進行金屬鍍覆處理,可對蓋體之側壁施予金屬鍍覆,並可有效地防止側壁之腐蝕及生鏽。 In the package sealing method of the present invention, after the singulation step, a plating treatment step of applying a metal plating to the surface of the cover may be provided. The metal plating treatment is applied as a metallization of the lid body, and after being divided into a lid body and then subjected to metal plating treatment, metal plating can be applied to the side wall of the lid body, and corrosion and rust of the side wall can be effectively prevented.

本發明之封裝體密封方法,係於封裝體重疊蓋體而藉由硬焊合金接合,且進行糊膏塗佈步驟、熱處理步驟及合金化步驟;該糊膏塗佈步驟,係將前述密封用糊膏塗佈於載體上;該熱處理步驟,係使塗佈於前述載體之前述密封用糊膏以前述低熔點金屬的熔融溫度進行加熱而於前述Ag粉末及前述Cu粉末之間使前述低熔點金屬的 液相滲透後冷卻固化,藉此,形成前述Ag粉末及前述Cu粉末藉由前述低熔點金屬所構成之結合層連結而成之氣孔率10%以上的硬焊接合材料;該合金化步驟,係使前述硬焊接合材料積層於前述封裝體與前述蓋體之間後,使前述硬焊接合材料加熱熔融而合金化,形成為前述硬焊合金。又,前述硬焊接合材料較佳係形成為氣孔率35%以下。 The package sealing method of the present invention is characterized in that the package overlaps the cover and is joined by a brazing alloy, and performs a paste coating step, a heat treatment step, and an alloying step; the paste coating step is for the sealing The paste is applied to a carrier; the heat treatment step is performed by heating the paste for sealing applied to the carrier at a melting temperature of the low melting point metal to form the low melting point between the Ag powder and the Cu powder. Metallic After the liquid phase is infiltrated and then solidified by cooling, the Ag powder and the Cu powder are bonded to each other by a bonding layer composed of the low melting point metal, and the porosity is 10% or more. The alloying step is After the hard solder material is laminated between the package and the lid, the hard solder material is heated and melted and alloyed to form the brazing alloy. Further, the hard-welded material is preferably formed to have a porosity of 35% or less.

混合於本發明之密封用糊膏的原料混末,係含有熔點或液相線溫度未達240℃之低熔點金屬粉末、及熔點高於此低熔點金屬粉末之Ag粉末及Cu粉末者。繼而,如上述,各金屬粉末的平均粒徑或份量、黏結劑之份量經管控之密封用糊膏以低熔點金屬的熔融溫度加熱,藉此,所得之硬焊接合材料亦即在熱處理步驟中所得之硬焊接合材料,係使低熔點金屬粉末熔融時,高於低熔點金屬的熔點之Ag粉末與Cu粉末之大部分直接以固體殘存,於此等固體之Ag粉末與Cu粉末之間其低熔點金屬之液相會滲透而冷卻固化,藉此,Ag粉末與Cu粉末由低熔點金屬所構成之結合層成為相互黏結的狀態。此時,在以熱處理步驟進行加熱前於具有低熔點金屬粉末之處形成許多空隙,藉此,硬焊接合材料形成為氣孔率10%以上之多孔結構。 The raw material mixture to be mixed with the sealing paste of the present invention contains a low melting point metal powder having a melting point or a liquidus temperature of less than 240 ° C, and Ag powder and Cu powder having a melting point higher than that of the low melting point metal powder. Then, as described above, the average particle diameter or the amount of each metal powder, the amount of the binder, and the controlled sealing paste are heated at a melting temperature of the low melting point metal, whereby the obtained hard solder joint material is also in the heat treatment step. The obtained hard-welded material is such that when the low-melting-point metal powder is melted, most of the Ag powder and the Cu powder which are higher than the melting point of the low-melting-point metal are directly left as a solid, and between the solid Ag powder and the Cu powder The liquid phase of the low-melting-point metal penetrates and cools and solidifies, whereby the bonding layer of the Ag powder and the Cu powder composed of the low-melting-point metal is bonded to each other. At this time, a large number of voids are formed at the portion having the low-melting-point metal powder before the heating in the heat treatment step, whereby the hard-welded material is formed into a porous structure having a porosity of 10% or more.

使混合於密封用糊膏之原料粉末作為銀硬焊合金粉末時,當形成硬焊接合材料時,必須加熱至銀硬焊合金的熔融溫度(液相線溫度)以上。本發明之硬焊接合材料係利用低熔點金屬粉末之液相燒結而以低熔點金屬之 熔融溫度(未達240℃)加熱來形成,故爐等必須使用高溫用者,且與省能源有相關性。 When the raw material powder mixed in the sealing paste is used as the silver brazing alloy powder, it is necessary to heat the molten soldering material to a melting temperature (liquidus temperature) of the silver brazing alloy or more. The hard soldering material of the present invention utilizes liquid phase sintering of a low melting point metal powder to a low melting point metal Since the melting temperature (less than 240 ° C) is heated to form, the furnace or the like must be used at a high temperature, and is related to energy saving.

繼而,當使用本發明之硬焊接合材料而密封封裝體與蓋體時,即使在使用有縫焊接法或雷射焊接法、電子束焊接法等之僅使密封部局部形成高溫狀態之密封方法中,硬焊接合材料之多孔構造可緩和熱衝擊或機械應力,故可防止接合層或封裝體產生龜裂。又,硬焊接合材料係加熱至Ag粉末及Cu粉末之熔融溫度而使Ag及Cu與低熔點金屬合金化,藉此,可確實地氣密密封封裝體與蓋體。 Then, when the package body and the lid body are sealed by using the hard-welded material of the present invention, even a sealing method in which only the sealing portion is locally formed in a high temperature state using a seam welding method, a laser welding method, an electron beam welding method or the like is used. In the middle, the porous structure of the hard-welded material can alleviate thermal shock or mechanical stress, thereby preventing cracking of the joint layer or the package. Further, the hard-welded material is heated to a melting temperature of the Ag powder and the Cu powder to alloy the Ag and Cu with the low-melting-point metal, whereby the package and the lid can be hermetically sealed.

進一步,本發明之密封用糊膏係可藉印刷等之方法塗佈於載體或蓋體的表面,故可容易地形成所希望的形狀之硬焊接合材料(密封框)。於蓋體之表面形成本發明之硬焊接合材料時,係藉由經熔融之低熔點金屬於蓋體的表面固定硬焊接合材料,故可於蓋體的表面容易形成安定之硬焊接合材料,處理蓋體時無硬焊接合材料脫落。又,將接合有密封用蓋材之硬焊接合材料挾住以重疊於封裝體之狀態實施合金化步驟,可同時進行硬焊接合材料之合金化與密封,故很有效率。 Further, the sealing paste of the present invention can be applied to the surface of the carrier or the lid by printing or the like, so that a hard solder joint (sealing frame) having a desired shape can be easily formed. When the hard soldering material of the present invention is formed on the surface of the lid body, the hard solder material is fixed on the surface of the lid body by the molten low melting point metal, so that the hard solder joint material can be easily formed on the surface of the lid body. When the cover is processed, no hard welded material is peeled off. Moreover, the alloying step is carried out by sandwiching the hard-welded material to which the sealing cover material is bonded, and the alloying step is performed in a state of being superposed on the package, so that the alloying and sealing of the hard-welded material can be performed at the same time, which is very efficient.

混合於本發明之密封用糊膏的原料粉末,係組合複數之金屬粉末,故可容易變更各金屬粉末的份量或組合,且可容易變更合金組成。 The raw material powder to be mixed in the sealing paste of the present invention is a combination of a plurality of metal powders, so that the amount or combination of each metal powder can be easily changed, and the alloy composition can be easily changed.

混合於密封用糊膏的Ag粉末及Cu粉末的平均粒徑未達0.1μm時,所形成之硬焊接合材料的氣孔率成 為未達10%,難以得到緩和熱衝擊或機械應力之效果。另一方面,Ag粉末及Cu粉末的平均粒徑超過10μm時,所形成之硬焊接合材料的氣孔率變大,密封性變差。本發明之硬焊接合材料的氣孔率為10%以上,以35%以下為佳。若硬焊接合材料之氣孔率超過35%,有密封性降低之虞。 When the average particle diameter of the Ag powder and the Cu powder mixed in the sealing paste is less than 0.1 μm, the porosity of the formed hard-welded material is If it is less than 10%, it is difficult to obtain the effect of mitigating thermal shock or mechanical stress. On the other hand, when the average particle diameter of the Ag powder and the Cu powder exceeds 10 μm, the porosity of the formed hard-welded material increases, and the sealing property is deteriorated. The hard-welded material of the present invention has a porosity of 10% or more and preferably 35% or less. If the porosity of the hard-welded material exceeds 35%, there is a problem that the sealing property is lowered.

即使低熔點金屬粉末之平均粒徑未達0.5μm,所形成之硬焊接合材料的氣孔率成為未達10%,難以得到緩和熱衝擊或機械應力之效果,低熔點金屬粉末的平均粒徑超過20μm時,所形成之硬焊接合材料的氣孔率變大,密封性變差。 Even if the average particle diameter of the low-melting-point metal powder is less than 0.5 μm, the porosity of the formed hard-welded material becomes less than 10%, and it is difficult to obtain an effect of alleviating thermal shock or mechanical stress, and the average particle diameter of the low-melting-point metal powder exceeds At 20 μm, the porosity of the formed hard-welded material becomes large, and the sealing property is deteriorated.

在原料粉末全部中之Ag粉末的含有比率,因未達40質量%時,從Ag、Cu及低熔點金屬的共晶組成大幅偏離,故密封性降低,在超過90質量%時,用以除去黏結劑殘渣之洗淨時,從接合有硬焊接合材料之蓋體等有剝離之虞,進一步昂貴的Ag多,故成本高。 When the content ratio of the Ag powder in the entire raw material powder is less than 40% by mass, the eutectic composition of Ag, Cu, and the low melting point metal largely deviates, so that the sealing property is lowered, and when it exceeds 90% by mass, it is removed. When the binder residue is washed, there is a peeling of the lid body to which the hard-welded material is bonded, and the amount of Ag is more expensive, so the cost is high.

原料粉末全部之Cu粉末的含有比率為5質量%以上50質量%以下之範圍外時,亦即,未達5質量%,或超過50質量%時,從Ag、Cu及低熔點金屬之共晶組成大幅偏離,故密封性降低。 When the content ratio of all the Cu powders of the raw material powder is outside the range of 5 mass% or more and 50 mass% or less, that is, when it is less than 5% by mass or more than 50% by mass, the eutectic from Ag, Cu, and a low melting point metal The composition is largely deviated, so the sealing property is lowered.

原料粉末全部之低熔點金屬粉末的含有比率未達5質量%時,結合層的形成成為不充分而洗淨時從接合有硬焊接合材料之蓋體等有剝離之虞,超過40質量%時,過剩的低熔點金屬密封後(合金化後)亦殘留,具有較Ag、Cu及低熔點金屬之共晶溫度(例如Ag-Cu-Sn之 共晶溫度)低的熔點之低熔點溫度區域會產生於密封部,故至少期待450℃以上之熔點,相反地,在低熔點金屬之熔點(硬焊接合材料之熔融溫度以下)密封部之一部分有熔融之虞。又,此低熔點金屬粉末的含有比率超過40質量%時,從Ag、Cu及低熔點金屬之共晶組成大幅偏離,密封性亦降低。 When the content ratio of the low-melting-point metal powder of the raw material powder is less than 5% by mass, the formation of the bonding layer is insufficient, and when it is washed, it is peeled off from the lid body to which the hard-welded material is bonded, and when it exceeds 40% by mass, The excess low melting point metal is also sealed (after alloying) and has a eutectic temperature higher than that of Ag, Cu and a low melting point metal (for example, Ag-Cu-Sn The low melting point temperature region of the melting point where the eutectic temperature is low is generated in the sealing portion, so at least a melting point of 450 ° C or higher is expected, and conversely, a part of the sealing portion is at the melting point of the low melting point metal (below the melting temperature of the hard bonding material) There is melting enthalpy. In addition, when the content ratio of the low-melting-point metal powder exceeds 40% by mass, the eutectic composition of Ag, Cu, and a low-melting-point metal greatly deviates, and the sealing property also decreases.

黏結劑未達2質量%、或黏結劑超過50質量%時,即使與原料粉末混練,亦難以形成適於印刷工法之糊膏狀。又,尤其,黏結劑超過50質量%時,保持Ag粉末及Cu粉末之黏結劑受熱軟化而無法維持形狀,難以使硬焊接合材料形成所希望的形狀。 When the binder is less than 2% by mass or the binder exceeds 50% by mass, even if it is kneaded with the raw material powder, it is difficult to form a paste suitable for the printing method. In addition, when the amount of the binder exceeds 50% by mass, the binder of the Ag powder and the Cu powder is softened by heat and the shape cannot be maintained, and it is difficult to form the hard-bonded material into a desired shape.

若依據本發明,可容易變更硬焊合金組成,藉由具有多孔的結構之硬焊接合材料不會產生龜裂,可確實地氣密密封封裝體。 According to the present invention, the brazing alloy composition can be easily changed, and the hard welded material having a porous structure does not cause cracking, and the package can be hermetically sealed.

1‧‧‧蓋體 1‧‧‧ cover

2‧‧‧板材 2‧‧‧ plates

3‧‧‧載體 3‧‧‧ Carrier

4‧‧‧硬焊接合材料 4‧‧‧hard welded materials

5‧‧‧封裝體 5‧‧‧Package

6‧‧‧密封用蓋材 6‧‧‧Seal cover material

11‧‧‧輥電極 11‧‧‧roll electrode

20‧‧‧密封用糊膏 20‧‧‧Seal paste

21‧‧‧Ag粉末 21‧‧‧Ag powder

22‧‧‧Cu粉末 22‧‧‧Cu powder

23‧‧‧低熔點金屬粉末 23‧‧‧Low-melting metal powder

24‧‧‧結合層 24‧‧‧Combination layer

25‧‧‧黏結劑 25‧‧‧Adhesive

41‧‧‧空隙 41‧‧‧ gap

圖1A係說明本發明之密封用糊膏的構成之模式圖。 Fig. 1A is a schematic view showing the configuration of a sealing paste of the present invention.

圖1B係說明本發明之硬焊接合材料構成的模式圖。 Fig. 1B is a schematic view showing the constitution of the hard-welded material of the present invention.

圖2係關於本發明,表示於載體的表面塗佈密封用糊膏之狀態的平面圖。 Fig. 2 is a plan view showing a state in which a paste for sealing is applied to the surface of a carrier according to the present invention.

圖3係關於本發明,表示於蓋材料的表面形成硬焊接 合材料而成之密封用蓋材料的平面圖。 Figure 3 relates to the invention, showing the formation of a hard weld on the surface of the cover material A plan view of a sealing cover material made of a composite material.

圖4係關於本發明,表示印刷塗佈密封用糊膏之狀態的板材之重要部位之立體圖。 Fig. 4 is a perspective view showing an important part of a sheet material in a state in which a paste for printing and applying a seal is printed.

圖5A係關於本發明,表示將密封用蓋材積層於封裝體之步驟的正面圖。 Fig. 5A is a front elevational view showing a step of laminating a lid member for sealing to a package body according to the present invention.

圖5B係關於本發明,表示將所積層之密封用蓋材接合於封裝體的步驟之正面圖。 Fig. 5B is a front elevational view showing the step of joining the laminated cover material to the package in accordance with the present invention.

以下,參照圖面並說明本發明之實施形態。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

<密封用糊膏之構成> <Composition of sealing paste>

首先,說明有關使用於本發明之硬焊接合材料的製造方法或密封方法之本發明的密封用糊膏20。 First, the sealing paste 20 of the present invention used in the method for producing a hard-welded material of the present invention or the sealing method will be described.

密封用糊膏20係如圖1A所示,於原料粉末中混合黏結劑25而成者,而該原料粉末係含有熔點或液相線溫度為未達240℃之低熔點金屬粉末23、及熔點高於低熔點金屬粉末23之Ag粉末21及Cu粉末22。 The sealing paste 20 is obtained by mixing a binder 25 in a raw material powder, and the raw material powder contains a low melting point metal powder 23 having a melting point or a liquidus temperature of less than 240 ° C, and a melting point as shown in FIG. 1A. The Ag powder 21 and the Cu powder 22 are higher than the low melting point metal powder 23.

原料粉末係含有Ag粉末21為平均粒徑0.1μm以上10.0μm以下且40質量%以上90質量%以下,含有Cu粉末22為平均粒徑0.1μm以上10.0μm以下且5質量%以上50質量%以下,含有低熔點金屬粉末23為平均粒徑0.5μm以上20.0μm以下且5質量%以上40質量%以下者,將此等Ag粉末21、Cu粉末22、及低熔點金屬 粉末23在上述之數值範圍適宜混合者。又,此等Ag粉末21、Cu粉末22及低熔點金屬粉末23之各含有比率為相對於原料粉末之比率。 The raw material powder contains the Ag powder 21 in an average particle diameter of 0.1 μm or more and 10.0 μm or less and 40% by mass or more and 90% by mass or less, and the Cu powder 22 contains an average particle diameter of 0.1 μm or more and 10.0 μm or less and 5% by mass or more and 50% by mass or less. The low-melting-point metal powder 23 has an average particle diameter of 0.5 μm or more and 20.0 μm or less and 5% by mass or more and 40% by mass or less, and the Ag powder 21, the Cu powder 22, and the low melting point metal are used. The powder 23 is suitably mixed in the above numerical range. Moreover, the respective content ratios of the Ag powder 21, the Cu powder 22, and the low melting point metal powder 23 are ratios with respect to the raw material powder.

低熔點金屬粉末23係可使用選自Sn、In、Bi、Sn-Ag-Cu焊料合金、Sn-Cu焊料合金、Sn-Bi焊料合金、Sn-In焊料合金之一種以上。又,可使用來作為低熔點金屬粉末23之Sn-Ag-Cu焊料合金、Sn-Cu焊料合金、Sn-Bi焊料合金、Sn-In焊料合金係任一者均含有Sn者,例如96.5質量% Sn-3.0質量% Ag-0.5質量% Cu、99.3質量% Sn-0.7質量% Cu等之組成比。 The low-melting-point metal powder 23 may be one or more selected from the group consisting of Sn, In, Bi, Sn-Ag-Cu solder alloy, Sn-Cu solder alloy, Sn-Bi solder alloy, and Sn-In solder alloy. Further, any of the Sn-Ag-Cu solder alloy, the Sn-Cu solder alloy, the Sn-Bi solder alloy, and the Sn-In solder alloy used as the low-melting-point metal powder 23 may contain Sn, for example, 96.5 mass%. Sn-3.0% by mass Ag-0.5% by mass Cu, 99.3% by mass Sn-0.7% by mass Composition ratio of Cu or the like.

黏結劑25係由松脂、活性劑、溶劑、搖變劑、其他添加物之至少一種以上所構成。 The binder 25 is composed of at least one of rosin, an active agent, a solvent, a rocking agent, and other additives.

密封用糊膏20係將黏結劑25以2質量%以上50質量%以下之比率(糊膏中之比率)與原料粉末混合而構成。 The sealing paste 20 is formed by mixing the binder 25 at a ratio of 2% by mass or more and 50% by mass or less (ratio in the paste) to the raw material powder.

又,Ag粉末21及Cu粉末22之平均粒徑未達0.1μm時,使用密封用糊膏20所形成之硬焊接合材料的氣孔率未達10%,難以得到使熱衝擊或機械應力緩和的效果。另一方面,Ag粉末21及Cu粉末22之平均粒徑超過10μm時,所形成之硬焊接合材料的氣孔率變大,密封性變差。 When the average particle diameter of the Ag powder 21 and the Cu powder 22 is less than 0.1 μm, the porosity of the hard-welded material formed using the sealing paste 20 is less than 10%, and it is difficult to obtain thermal shock or mechanical stress relaxation. effect. On the other hand, when the average particle diameter of the Ag powder 21 and the Cu powder 22 exceeds 10 μm, the porosity of the formed hard-welded material increases, and the sealing property is deteriorated.

又,即使低熔點金屬粉末23之平均粒徑未達0.5μm,所形成之硬焊接合材料的氣孔率未達10%,難以得到使熱衝擊或機械應力緩和的效果。低熔點金屬粉末 23之平均粒徑超過20μm時,所形成之硬焊接合材料的氣孔率變大,密封性變差。 Further, even if the average particle diameter of the low-melting-point metal powder 23 is less than 0.5 μm, the porosity of the formed hard-welded material is less than 10%, and it is difficult to obtain an effect of alleviating thermal shock or mechanical stress. Low melting point metal powder When the average particle diameter of 23 exceeds 20 μm, the porosity of the formed hard-welded material increases, and the sealing property is deteriorated.

低熔點金屬粉末23之平均粒徑在0.5μm以上20.0μm以下之範圍內,與Ag粉末21及Cu粉末22之平均粒徑相同,或其以上為佳。具體上,低熔點金屬粉末23之平均粒徑係Ag粉末21及Cu粉末22之平均粒徑的1倍以上10倍以下為佳,以1倍以上5倍以下為更佳,以1.25倍以上5倍以下為再更佳。 The average particle diameter of the low-melting-point metal powder 23 is in the range of 0.5 μm or more and 20.0 μm or less, and is preferably the same as the average particle diameter of the Ag powder 21 and the Cu powder 22, or more preferably. Specifically, the average particle diameter of the low-melting-point metal powder 23 is preferably 1 time or more and 10 times or less the average particle diameter of the Ag powder 21 and the Cu powder 22, more preferably 1 time or more and 5 times or less, and more preferably 1.25 times or more. The following is better.

原料粉末全部中之Ag粉末21的含有比率未達40質量%時密封性降低,超過90質量%時,用以除去黏結劑殘渣之洗淨時產生剝離,進一步成本變高。又,Cu粉末22的含有比率為5質量%以上50質量%以下的範圍外時,亦即,未達5質量%,或超過50質量%時,密封性降低。進一步,低熔點金屬粉末23之含有比率未達5質量%時,洗淨時產生剝離,超過40質量%時,產生低熔點溫度區域而未達硬焊合金之熔融溫度下一部份有熔融之虞。又,低熔點金屬粉末23之含有比率超過40質量%時,密封性亦降低。 When the content ratio of the Ag powder 21 in the entire raw material powder is less than 40% by mass, the sealing property is lowered. When the content exceeds 90% by mass, peeling occurs during washing for removing the binder residue, and the cost is further increased. In addition, when the content ratio of the Cu powder 22 is outside the range of 5 mass% or more and 50 mass% or less, that is, when it is less than 5% by mass or more than 50% by mass, the sealing property is lowered. Further, when the content ratio of the low-melting-point metal powder 23 is less than 5% by mass, peeling occurs during washing, and when it exceeds 40% by mass, a low melting point temperature region is generated and the molten portion of the brazing alloy is not melted. Hey. When the content ratio of the low-melting-point metal powder 23 exceeds 40% by mass, the sealing property also decreases.

黏結劑對密封用糊膏20之含有比率未達2質量%、或超過50質量%時,即使與原料粉末混練,亦難以形成為適於印刷工法之糊膏狀。尤其,當黏結劑超過50質量%時,硬焊接合材料形成時,黏結劑完全押除Ag粉末及Cu粉末,難以使硬焊接合材料形成為所希望的形狀。 When the content ratio of the binder to the sealing paste 20 is less than 2% by mass or more than 50% by mass, even if it is kneaded with the raw material powder, it is difficult to form a paste suitable for the printing method. In particular, when the binder exceeds 50% by mass, when the hard-welded material is formed, the binder completely removes the Ag powder and the Cu powder, and it is difficult to form the hard-bonded material into a desired shape.

<硬焊接合材料之構成及製造方法> <Composition and manufacturing method of hard solder joint material>

使用以上之密封用糊膏20,製造硬焊接合材料4的方法,參照圖2而說明。 A method of manufacturing the hard-welded material 4 using the above-described sealing paste 20 will be described with reference to Fig. 2 .

硬焊接合材料4之製造方法係具有:將前述之密封用糊膏20印刷並塗佈於載體3上之糊膏塗佈步驟;將塗佈於載體3之密封用糊膏20以低熔點金屬粉末23的熔融溫度加熱的熱處理步驟;及,於此熱處理步驟後除去黏結劑之黏結劑除去步驟。 The method for producing the hard-welded material 4 includes a paste application step of printing and applying the above-described sealing paste 20 onto the carrier 3; and the sealing paste 20 applied to the carrier 3 as a low-melting-point metal a heat treatment step of heating the melting temperature of the powder 23; and a binder removal step of removing the binder after the heat treatment step.

〔糊膏塗佈步驟〕 [paste coating step]

準備硬焊材料不適合之陶瓷基板等的載體3,於其載體3之表面使前述的密封用糊膏20印刷塗佈於所希望的形狀例如符合與蓋體表面之封裝體重疊的周緣部之形狀的框狀或片狀(圖2)。密封用糊膏20係亦可藉由點膠機等吐出供給至載體3。 The carrier 3 such as a ceramic substrate to which the brazing material is not suitable is prepared, and the above-described sealing paste 20 is printed and applied on a surface of the carrier 3 in a desired shape, for example, in a shape of a peripheral portion overlapping the package on the surface of the lid. Frame or sheet (Figure 2). The sealing paste 20 can also be supplied to the carrier 3 by discharging it by a dispenser or the like.

〔熱處理步驟〕 [heat treatment step]

以塗佈有密封用糊膏20之載體3實施低溫回焊處理,形成硬焊接合材料4。具體上,將塗佈於載體3之密封用糊膏20在氮氣環境下加熱至密封用糊膏20中所含之低熔點金屬粉末23的熔融溫度以上亦即低熔點金屬粉末23之熔點或液相線溫度以上、且Ag及Cu之熔點以下、Ag粉末21及Cu粉末22不熔融的溫度,使低熔點金屬粉 末23熔融。此熱處理係只要使低熔點金屬粉末23熔融即足夠,故可藉由使用於一般之焊料材之爐或烘箱進行回焊(熱處理)來實施。更具體地,低熔點金屬粉末23為Sn粉末時,在Sn的熔點(232℃)以上、Ag的熔點(961℃)及Cu的熔點(1083℃)以下之溫度範圍內,以低熔點金屬之熔點+10℃~30℃的溫度進行熱處理。 The carrier 3 coated with the paste for sealing 20 is subjected to a low temperature reflow process to form a hard solder material 4. Specifically, the sealing paste 20 applied to the carrier 3 is heated in a nitrogen atmosphere to a melting temperature of the low melting point metal powder 23 contained in the sealing paste 20, that is, the melting point or liquid of the low melting point metal powder 23. a low melting point metal powder having a temperature equal to or higher than the phase line temperature and not higher than the melting point of Ag and Cu, and the Ag powder 21 and the Cu powder 22 are not melted. The last 23 melts. This heat treatment is sufficient as long as the low-melting-point metal powder 23 is melted, and therefore it can be carried out by reflow (heat treatment) using a furnace or an oven of a general solder material. More specifically, when the low-melting-point metal powder 23 is a Sn powder, it is a low-melting-point metal in a temperature range of a melting point (232° C.) or more of Sn, a melting point of Ag (961° C.), and a melting point of Cu (1083° C.). Heat treatment is carried out at a temperature of +10 ° C to 30 ° C.

若低熔點金屬粉末23熔融,在此熱處理之溫度下係在不熔融的高熔點金屬的Ag粉末21與Cu粉末22之間涵蓋低熔點金屬之液相。繼而,Ag粉末21與Cu粉末22之間滲透低熔點金屬之液相後進行冷卻而使低熔點金屬固化,藉此,如圖1B所示,形成低熔點金屬之結合層24互相連接高熔點金屬粉末(Ag粉末21與Cu粉末22)之狀態的硬焊接合材料4。此時,低熔點金屬與高熔點金屬亦有時一部分進行合金化,但高熔點金屬之大部分直接以原來的粉末殘存,故藉熱處理於加熱前在具有低熔點金屬粉末23之處形成多數空隙41,硬焊接合材料4係形成為氣孔率10%以上之多孔結構。 When the low-melting-point metal powder 23 is melted, the liquid phase of the low-melting-point metal is covered between the Ag powder 21 and the Cu powder 22 which are not melted at the temperature of the heat treatment. Then, the liquid phase of the low melting point metal is infiltrated between the Ag powder 21 and the Cu powder 22, and then cooled to solidify the low melting point metal. Thereby, as shown in FIG. 1B, the bonding layer 24 forming the low melting point metal is connected to the high melting point metal. A hard-welded material 4 in the state of a powder (Ag powder 21 and Cu powder 22). At this time, a part of the low-melting-point metal and the high-melting-point metal may be alloyed, but most of the high-melting-point metal remains directly in the original powder, so that a large gap is formed in the portion having the low-melting-point metal powder 23 by heat treatment before heating. 41. The hard-welded material 4 is formed into a porous structure having a porosity of 10% or more.

如此,在熱處理步驟中係相對於由密封用糊膏20中之高熔點金屬所構成的Ag粉末21與Cu粉末22,低熔點金屬熔融,成為液體狀態,以侵入於高熔點金屬粉末21、22間,進行液相燒結。藉此,可以低的熱處理溫度形成硬焊接合材料4。在此時點,不會成為低熔點金屬與高熔點金屬之硬焊合金。 In the heat treatment step, the Ag powder 21 and the Cu powder 22 composed of the high melting point metal in the sealing paste 20 are melted and the liquid is in a liquid state to invade the high melting point metal powder 21, 22 In the middle, liquid phase sintering is performed. Thereby, the hard solder material 4 can be formed at a low heat treatment temperature. At this point, it does not become a brazing alloy of a low melting point metal and a high melting point metal.

〔黏結劑除去步驟〕 [Binder removal step]

如前述,於密封用糊膏20中混合黏結劑25。因此,於熱處理步驟之後藉洗淨液除去殘留在硬焊接合材料4之黏結劑25的殘渣(洗淨處理)。此時,從載體剝離硬焊接合材料4之後,單獨洗淨硬焊接合材料4。洗淨液可使用荒川化學工業股份公司製精密零件洗淨劑(Pine Alpha Series)等。 As described above, the binder 25 is mixed in the sealing paste 20. Therefore, after the heat treatment step, the residue of the binder 25 remaining in the hard-welded material 4 is removed by the cleaning liquid (washing treatment). At this time, after the hard solder material 4 is peeled off from the carrier, the hard solder material 4 is separately washed. As the cleaning liquid, a precision parts cleaner (Pine Alpha Series) manufactured by Arakawa Chemical Industries Co., Ltd., or the like can be used.

藉洗淨液除去黏結劑25的殘渣(洗淨處理)後,依需要,亦可實施用以降低殘留於硬焊接合材料4之內部的有機物成分之處理。此處理係例如對硬焊接合材料4實施300℃以上1200℃以下、0.1小時以上24小時以下之熱處理,較佳係以600℃熱處理9小時,使有機物成分氣化而除去之烘烤處理。 After the residue of the binder 25 is removed by the cleaning liquid (washing treatment), a treatment for reducing the organic component remaining inside the hard-welded material 4 may be performed as needed. In the treatment, for example, the hard-welded material 4 is subjected to heat treatment at 300 ° C or more and 1200 ° C or less for 0.1 hour or longer and 24 hours or shorter, and is preferably a heat treatment at 600 ° C for 9 hours to vaporize and remove the organic component.

<密封用蓋材的構成及製造方法> <Configuration and Manufacturing Method of Sealing Cover Material>

在前述之硬焊接合材料4的製造方法中係說明有關於載體3上塗佈密封用糊膏20,單獨製造硬焊接合材料4之情形,但將使用於封裝體5與蓋體1之密封(參照圖5A、5B)之硬焊接合材料4預先形成於蓋體1之表面,亦可構成使蓋體1與硬焊接合材料4成為一體之密封用蓋材6。 In the method of manufacturing the hard-welded material 4 described above, the case where the sealing paste 20 is applied to the carrier 3 and the hard-welded material 4 is separately manufactured is described, but the sealing body 5 and the lid 1 are sealed. The hard-bonded material 4 (see FIGS. 5A and 5B) is formed in advance on the surface of the lid body 1, and may constitute a lid member 6 for sealing in which the lid body 1 and the hard-weld material 4 are integrated.

參照圖3而說明製造此密封用蓋材6之方法。 A method of manufacturing the sealing cover member 6 will be described with reference to Fig. 3 .

密封用蓋材6之製造方法係將前述硬焊接合材料4之 製造方法(圖2)中的載體3取代成蓋體1以外,其餘係與前述硬焊接合材料4之製造方法相同,具有:使密封用糊膏20印刷塗佈於蓋體1表面之糊膏塗佈步驟;塗佈於蓋體1之密封用糊膏20以低熔點金屬粉末23的熔融溫度進行加熱之熱處理步驟;及,於蓋體1表面形成硬焊接合材料4後除去黏結劑25的黏結劑除去步驟。 The manufacturing method of the sealing cover material 6 is the aforementioned hard soldering material 4 The carrier 3 in the manufacturing method (Fig. 2) is replaced with the lid 1 except for the method of manufacturing the hard solder material 4, and has a paste for applying the sealing paste 20 to the surface of the lid 1. a coating step; a heat treatment step of heating the sealing paste 20 applied to the lid body 1 at a melting temperature of the low melting point metal powder 23; and removing the binder 25 after the hard solder material 4 is formed on the surface of the lid body 1 Adhesive removal step.

〔糊膏塗佈步驟〕 [paste coating step]

蓋體1的材料係可使用鈷、42合金等,對表面施予Ni鍍覆(金屬鍍覆)。於此蓋體1之表面將前述之密封用糊膏20印刷塗佈成符合於與例如封裝體重疊的周緣部之形狀的框狀。又,此時,以點膠機等進行吐出供給,可於蓋體1塗佈密封用糊膏20。 The material of the lid body 1 can be Ni plating (metal plating) on the surface by using cobalt, a 42 alloy or the like. The sealing paste 20 described above is printed on the surface of the lid body 1 in a frame shape conforming to the shape of a peripheral portion overlapping the package body, for example. Moreover, at this time, the discharge supply is performed by a dispenser or the like, and the sealing paste 20 can be applied to the lid 1.

〔熱處理步驟〕 [heat treatment step]

其次,在塗佈有密封用糊膏20之蓋體1施予低溫回焊處理。具體上,使塗佈有密封用糊膏20之蓋體1在氮氣環境下,加熱至密封用糊膏20中所含之低熔點金屬粉末23的熔融溫度以上亦即低熔點金屬粉末23的熔點或液相線溫度以上且在Ag及Cu之熔點以下、Ag粉末21及Cu粉末22不熔融的溫度,使低熔點金屬粉末23熔融。繼而,在Ag粉末21及Cu粉末22之間使低熔點金屬的液相滲透後冷卻,以使低熔點金屬固化。藉此,可於蓋體1的表面構成設有硬焊接合材料4之密封用蓋材6,而硬 焊接合材料4係具有Ag粉末21及Cu粉末22藉由低熔點金屬所構成之結合層24連結而成的氣孔率10%以上之多孔結構。如此所形成之硬焊接合材料4係被固定於蓋體1的表面之狀態,故操作密封用蓋材6時並不會從蓋體1脫落。 Next, the lid body 1 to which the sealing paste 20 is applied is subjected to a low temperature reflow treatment. Specifically, the lid body 1 to which the sealing paste 20 is applied is heated in a nitrogen atmosphere to a melting temperature of the low melting point metal powder 23 contained in the sealing paste 20, that is, the melting point of the low melting point metal powder 23. The low-melting-point metal powder 23 is melted at a temperature equal to or higher than the liquidus temperature and not higher than the melting point of Ag and Cu, and the Ag powder 21 and the Cu powder 22 are not melted. Then, the liquid phase of the low melting point metal is infiltrated between the Ag powder 21 and the Cu powder 22, and then cooled to solidify the low melting point metal. Thereby, the sealing cover material 6 provided with the hard-welded material 4 can be formed on the surface of the lid body 1 and hard. The welded material 4 has a porous structure in which the porosity of the Ag powder 21 and the Cu powder 22 is 10% or more by the bonding layer 24 composed of a low melting point metal. Since the hard-welded material 4 thus formed is fixed to the surface of the lid body 1, the lid member 6 for sealing is not peeled off from the lid body 1 when the lid member 6 for sealing is operated.

〔黏結劑除去步驟〕 [Binder removal step]

如前述,於密封用糊膏20中係混合黏結劑25。因此,藉由洗淨液除去熱處理步驟後殘留之黏結劑25的殘渣。 As described above, the adhesive 25 is mixed in the sealing paste 20. Therefore, the residue of the binder 25 remaining after the heat treatment step is removed by the cleaning liquid.

即使此時,依需要,於黏結劑之洗淨處理後,亦可實施用以降低殘留於硬焊接合材料4之內部的有機物成分之步驟(例如對硬焊接合材料施予300℃以上1200℃以下、0.1小時以上24小時以下之熱處理,較佳係以600℃熱處理9小時,使有機物成分氣化而除去之烘烤處理)。 Even at this time, as needed, after the cleaning treatment of the binder, a step of reducing the organic component remaining inside the hard-welded material 4 may be performed (for example, applying 300 ° C or more to 1200 ° C to the hard-welded composite material) Hereinafter, the heat treatment of 0.1 hour or longer and 24 hours or shorter is preferably a baking treatment in which the organic component is vaporized and removed by heat treatment at 600 ° C for 9 hours.

<複數個密封用蓋材的製造方法> <Manufacturing method of a plurality of sealing cover materials>

在此密封用蓋材6的製造方法中,除了於各個蓋體1塗佈密封用糊膏20而施予熱處理以外,如圖4所示,其餘係預先準備可形成複數個蓋體1的大小之板材2,於板材2之表面形成複數硬焊接合材料4後,分割此板材2而個片化成複數蓋體1,藉此,亦可一次製造複數個密封用蓋材料6。 In the method for producing the lid member for sealing 6, the heat treatment is applied to the lid member 1 for applying the sealing paste 20, and as shown in Fig. 4, the remaining sheets are prepared in advance to form a plurality of lids 1. After the plurality of hard-welded materials 4 are formed on the surface of the sheet material 2, the sheet material 2 is divided into a plurality of sheets 1 into a plurality of sheets, whereby a plurality of sealing lid materials 6 can be produced at one time.

此時,密封用蓋材之製造方法係具有:使密封用糊膏20印刷塗佈於板材2表面之糊膏塗佈步驟;塗佈於板材2之密封用糊膏20以低熔點金屬粉末23的熔融溫度進行加熱而形成硬焊接合材料4之熱處理步驟;於板材2表面形成硬焊接合材料4後除去黏結劑25的黏結劑除去步驟;及,切割板材2而分割成密封用蓋材6之個片化步驟。又,依需要,於個片化步驟後,亦可具有對密封用蓋材6的表面施予金屬鍍覆之鍍覆處理步驟。 In this case, the method for producing a sealing cover material includes a paste application step of printing and applying the sealing paste 20 on the surface of the sheet material 2, and a sealing paste 20 applied to the sheet material 2 as a low melting point metal powder 23 a heat treatment step of heating the molten solder material 4 to form a hard solder material 4; a binder removal step of removing the binder 25 after forming the hard solder material 4 on the surface of the sheet material 2; and cutting the sheet material 2 to divide into a sealing lid material 6 The chipping step. Further, a plating treatment step of applying metal plating to the surface of the sealing cover member 6 may be provided after the individual sheeting step, as needed.

〔糊膏塗佈步驟〕 [paste coating step]

準備可整列複數個蓋體1而形成之大小的板材2,於其板材2的表面,將前述之密封用糊膏20對準重疊於密封用蓋材6的表面之封裝體5的周緣部之位置,印刷塗佈成框狀(圖示略)。此時,藉由以點膠機等所進行之吐出供給,可於板材2塗佈密封用糊膏20。板材2之材料可使用鈷、42合金等,於表面之雙面或單面施予Ni鍍覆(金屬鍍覆)。 The sheet material 2 having a size in which a plurality of lids 1 are formed is prepared, and the sealing paste 20 is placed on the surface of the sheet material 2 so as to be aligned with the peripheral portion of the package 5 which is superposed on the surface of the lid sheet 6 for sealing. The position is printed and printed in a frame shape (not shown). At this time, the sealing paste 20 can be applied to the sheet material 2 by the discharge supply by a dispenser or the like. The material of the sheet material 2 can be Ni plating (metal plating) on both sides or one side of the surface using cobalt, a 42 alloy or the like.

〔熱處理步驟〕 [heat treatment step]

在塗佈有密封用糊膏20之板材2(蓋體1)施予低溫回焊處理。具體上,使塗佈有密封用糊膏20之板材2在氮氣環境下,加熱至密封用糊膏20中所含之低熔點金屬粉末23的熔融溫度以上亦即低熔點金屬粉末23的熔點或液相線溫度以上且在Ag及Cu之熔點以下、Ag粉末21 及Cu粉末22不熔融的溫度,使低熔點金屬粉末23熔融。繼而,在Ag粉末21及Cu粉末22之間使低熔點金屬的液相滲透後冷卻,以使低熔點金屬固化。藉此,可於板材2(蓋體1)的表面形成硬焊接合材料4(圖4),而該硬焊接合材料4係具有Ag粉末21及Cu粉末22藉由低熔點金屬所構成之結合層24連結成的氣孔率10%以上之多孔結構。如此所形成之硬焊接合材料4係被固定於板材2(蓋體1)的表面之狀態,故處理板材2(蓋體1)時不會從蓋體1脫落。 The sheet material 2 (the lid body 1) to which the sealing paste 20 is applied is subjected to a low temperature reflow treatment. Specifically, the sheet material 2 to which the sealing paste 20 is applied is heated in a nitrogen atmosphere to a melting temperature of the low melting point metal powder 23 contained in the sealing paste 20, that is, the melting point of the low melting point metal powder 23 or Above the liquidus temperature and below the melting point of Ag and Cu, Ag powder 21 The low-melting-point metal powder 23 is melted at a temperature at which the Cu powder 22 does not melt. Then, the liquid phase of the low melting point metal is infiltrated between the Ag powder 21 and the Cu powder 22, and then cooled to solidify the low melting point metal. Thereby, a hard solder material 4 (FIG. 4) can be formed on the surface of the sheet material 2 (the lid body 1), and the hard solder joint material 4 has a combination of Ag powder 21 and Cu powder 22 by a low melting point metal. The layer 24 has a porous structure in which the porosity is 10% or more. Since the hard-welded material 4 thus formed is fixed to the surface of the sheet material 2 (the lid body 1), the sheet material 2 (the lid body 1) is not peeled off from the lid body 1 when it is processed.

〔黏結劑除去步驟〕 [Binder removal step]

如前述,於密封用糊膏20中係混合黏結劑25。因此,藉由洗淨液除去熱處理步驟後殘留之黏結劑25的殘渣(洗淨處理)。洗淨液可使用荒川化學工業股份公司製精密零件洗淨劑(Pine Alpha Series)等。 As described above, the adhesive 25 is mixed in the sealing paste 20. Therefore, the residue of the binder 25 remaining after the heat treatment step is removed by the cleaning liquid (washing treatment). As the cleaning liquid, a precision parts cleaner (Pine Alpha Series) manufactured by Arakawa Chemical Industries Co., Ltd., or the like can be used.

即使在此情形,藉由洗淨液除去黏結劑25的殘渣(洗淨處理)後,依需要,亦可實施用以降低殘留於硬焊接合材料4之內部的有機物成分之處理。此處理係例如對硬焊接合材料4施予300℃以上1200℃以下、0.1小時以上24小時以下之熱處理,較佳係以600℃熱處理9小時,使有機物成分氣化而除去之烘烤處理。 Even in this case, after the residue of the binder 25 is removed by the cleaning liquid (washing treatment), a treatment for reducing the organic component remaining inside the hard-welded material 4 may be performed as needed. In the treatment, for example, the hard-welded material 4 is subjected to heat treatment at 300 ° C or more and 1200 ° C or less for 0.1 hour or longer and 24 hours or shorter, and is preferably a heat treatment at 600 ° C for 9 hours to vaporize and remove the organic component.

〔個片化步驟〕 [segmentation step]

其次,切割形成有硬焊接合材料4之板材2,對各蓋 體1(密封用蓋材6)進行個片化。 Next, the sheet 2 formed with the hard-welded material 4 is cut, and each cover is The body 1 (sealing cover material 6) is diced.

〔鍍覆處理步驟〕 [plating treatment step]

如前述,於板材2之表面施予Ni鍍覆,但切割形成有硬焊接合材料4之板材2,對各蓋體1(密封用蓋材6)進行個片化後,亦可對其全部施予Ni鍍覆(金屬鍍覆)。藉此,亦對蓋體1(密封用蓋材6)的切割面(側面)施予Ni鍍覆,可防止於蓋體1(密封用蓋材6)之側壁進行腐蝕或生鏽等。關於Ni鍍覆可藉無電解鍍覆、電解鍍覆來形成,膜厚可為數μm。又,Ni鍍覆以外,亦可施予其他之金屬鍍覆。 As described above, Ni plating is applied to the surface of the sheet material 2, but the sheet material 2 of the hard-welded material 4 is cut and formed, and after the lid member 1 (sealing lid member 6) is diced, all of them may be used. Ni plating (metal plating) was applied. Thereby, Ni plating is applied to the cut surface (side surface) of the lid body 1 (sealing lid member 6), and corrosion or rusting of the side wall of the lid body 1 (sealing lid member 6) can be prevented. Ni plating can be formed by electroless plating or electrolytic plating, and the film thickness can be several μm. Further, other metal plating may be applied in addition to Ni plating.

<封裝體密封方法> <Package sealing method>

其次,參照圖5A、5B說明於封裝體接合蓋體之封裝體密封方法。 Next, a package sealing method for bonding a package to a package will be described with reference to FIGS. 5A and 5B.

此密封方法係具有:使前述之密封用糊膏20印刷塗佈於蓋體1表面之糊膏塗佈步驟;塗佈於蓋體1之密封用糊膏20以低熔點金屬粉末23的熔融溫度進行加熱之熱處理步驟;於蓋體1表面形成硬焊接合材料4後除去黏結劑25的黏結劑除去步驟;將除去黏結劑25後之蓋體1重疊於封裝體5,使硬焊接合材料4加熱熔融而合金化,形成為硬焊合金,以使蓋體1接合於封裝體5之合金化步驟;設為於前述之密封用蓋體6的製造方法追加合金化步驟的構成。封裝體密封方法依需要而具有個片化步驟及鍍覆處 理步驟。因此,在封裝體密封方法之說明中,係省略糊膏塗佈步驟、熱處理步驟、黏結劑除去步驟、個片化步驟及鍍覆處理步驟的說明,只說明於蓋體1的表面設有硬焊接合材料4的密封用蓋材6而進行封裝體5與蓋體1之接合的合金化步驟。 This sealing method has a paste application step of printing and applying the above-described sealing paste 20 on the surface of the lid 1; and the sealing paste 20 applied to the lid 1 is melted at a low melting point metal powder 23 a heat treatment step of heating; a binder removal step of removing the binder 25 after the hard solder material 4 is formed on the surface of the lid body 1; and the lid body 1 after removing the binder 25 is superposed on the package body 5 to make the hard solder joint material 4 The alloying step of heating and melting to form a brazing alloy to bond the lid 1 to the package 5 is a configuration in which the alloying step is added to the method for producing the sealing lid 6 described above. The package sealing method has a sheeting step and a plating place as needed Steps. Therefore, in the description of the package sealing method, the description of the paste application step, the heat treatment step, the binder removal step, the singulation step, and the plating treatment step is omitted, and only the surface of the lid 1 is provided with a hard surface. An alloying step of bonding the package 5 and the lid 1 to the sealing cover material 6 of the welded material 4 is performed.

〔合金化步驟〕 [alloying step]

於圖5A以箭號所示,以使硬焊接合材料4接觸封裝體5之方式重疊密封用蓋材6,如圖5B所示,藉由以附加預定的壓力之狀態進行加熱,藉此,使硬焊接合材料4熔融,冷卻固化而使蓋體1接合於封裝體5。封裝體5係由陶瓷等所構成,於與蓋體1之接合面形成例如鍍金層作為導電金屬層。 As shown by an arrow in FIG. 5A, the sealing cover material 6 is superimposed so that the hard-welded material 4 contacts the package 5, and as shown in FIG. 5B, heating is performed by adding a predetermined pressure. The hard solder material 4 is melted, cooled and solidified, and the lid 1 is bonded to the package 5. The package 5 is made of ceramic or the like, and a gold plating layer is formed as a conductive metal layer on the bonding surface with the lid 1.

硬焊接合材料4之加熱方法有:使用烘箱或輸送帶爐等而以硬焊材料之熔點以上的溫度進行處理之融接法(加熱密封法)、有縫焊接法(電阻焊接法)、雷射焊接法、電子束焊接法、超音波焊接法等。 The heating method of the hard-welded material 4 includes a fusion method (heat sealing method), a seam welding method (resistance welding method), and a treatment using an oven or a conveyor belt furnace at a temperature higher than a melting point of a brazing material. Injection welding method, electron beam welding method, ultrasonic welding method, and the like.

例如在有縫焊接法中如圖5B所示,以於封裝體5接觸硬焊接合材料4之方式重疊密封用蓋材6,從密封用蓋材6的蓋體1之上方抵接輥電極11,以附加預定的壓力之狀態流通電流,同時並沿著蓋體1之周緣部使輥電極11移動。藉由對應於輥電極11之電流值的焦耳熱而使硬焊接合材料4局部性熔融者,藉由適當設定電流值,瞬間加熱至高熔點金屬粉末(Ag粉末21及Cu粉末22) 的熔點以上之溫度而使此熔融。 For example, in the seam welding method, as shown in FIG. 5B, the sealing cover member 6 is superposed so that the package 5 contacts the hard bonding material 4, and the roller electrode 11 is abutted from above the lid body 1 of the sealing lid member 6. The current flows in a state in which a predetermined pressure is applied, and the roller electrode 11 is moved along the peripheral portion of the lid 1. When the hard-welded material 4 is partially melted by Joule heat corresponding to the current value of the roller electrode 11, by appropriately setting the current value, it is instantaneously heated to the high-melting-point metal powder (Ag powder 21 and Cu powder 22). The temperature above the melting point causes this to melt.

在雷射焊接法或電子束焊接法中,省略圖示,但以在封裝體5重疊密封用蓋材6的狀態,對於接合面照射雷射或電子束,可瞬間加熱硬焊接合材料4。 In the laser welding method or the electron beam welding method, although the illustration is omitted, the hard bonding material 4 can be instantaneously heated by irradiating the bonding surface with a laser or an electron beam in a state in which the sealing member 6 is sealed.

如此方式,藉由使高熔點金屬粉末21、22熔融,亦包含低熔點金屬而硬焊接合材料4全部成為熔融狀態,以所含有之各金屬形成硬焊合金,結束密封。例如,在含有Sn作為例如Ag、Cu、低熔點金屬之硬焊接合材料4中,成為Ag-Cu-Sn系硬焊合金,可使蓋體1與封裝體5接合。 In this manner, by melting the high-melting-point metal powders 21 and 22, the low-melting-point metal is also contained, and all of the hard-welded materials 4 are in a molten state, and a brazing alloy is formed from each of the contained metals to complete the sealing. For example, in the hard solder material 4 containing Sn as, for example, Ag, Cu, or a low-melting-point metal, an Ag-Cu-Sn-based brazing alloy is used, and the lid 1 and the package 5 can be joined.

在此合金化步驟中,使用有縫焊接法、雷射焊接法、電子束焊接法等僅使密封部形成局部性高溫狀態之加熱方法時,密封部之一部分依序局部性加熱,故其加熱部分及未加熱部分產生熱衝擊或機械性應力。此點,硬焊接合材料4係藉由內部具有空隙之氣孔率10%以上之多孔結構,可緩和焊接時之熱衝擊或機械應力。因此,可防止於封裝體5與蓋體1之間的接合層或封裝體5產生龜裂,並可使封裝體5與蓋體1氣密密封。又,若硬焊接合材料4之氣孔率變大,密封性降低,故氣孔率以設為35%以下為佳。 In the alloying step, when a heating method in which only a sealing portion is formed into a local high temperature state using a seam welding method, a laser welding method, an electron beam welding method, or the like, a part of the sealing portion is locally heated in order, so that it is heated. Partial and unheated parts generate thermal shock or mechanical stress. At this point, the hard-welded material 4 is a porous structure having a porosity of 10% or more inside the void, and the thermal shock or mechanical stress during welding can be alleviated. Therefore, cracking of the bonding layer or the package 5 between the package 5 and the lid 1 can be prevented, and the package 5 and the lid 1 can be hermetically sealed. Further, when the porosity of the hard-welded material 4 is increased, the sealing property is lowered, so that the porosity is preferably 35% or less.

硬焊接合材料4係形成為於內部具有空隙之多孔結構,但將硬焊接合材料4加熱至Ag粉末21及Cu粉末22之熔融溫度而使Ag及Cu與低熔點金屬熔融而被合金化時,亦即,藉由各種焊接法沿著蓋體1之周緣部而 加熱硬焊接合材料4時,硬焊接合材料4之熔融部分會依序移動,故隨著其熔融部分之移動而硬焊接合材料4內部的空隙被押出至外部,可使封裝體5與蓋體1確實地氣密密封。 The hard-welded material 4 is formed into a porous structure having voids therein, but when the hard-welded material 4 is heated to the melting temperature of the Ag powder 21 and the Cu powder 22, and Ag and Cu are melted and alloyed with the low-melting-point metal, , that is, along the peripheral portion of the cover 1 by various welding methods When the hard solder material 4 is heated, the molten portion of the hard solder material 4 is sequentially moved, so that the voids inside the hard solder material 4 are pushed out to the outside as the molten portion moves, so that the package 5 and the cover can be made. Body 1 is indeed hermetically sealed.

將此硬焊接合材料4當使用於例如基板與被搭載物之接合等之時,亦即,與封裝體5之密封用途相異,不須要氣密密封時,不須有合金化步驟。在硬焊接合材料4中不使Ag及Cu與低熔點金屬合金化,或使一部分合金化,又,亦可殘留多孔結構而接合基板與被搭載物。 When the hard solder material 4 is used for, for example, bonding of a substrate and a mounted object, that is, different from the sealing use of the package 5, it is not necessary to have an alloying step when it is not required to be hermetically sealed. In the hard-welded material 4, Ag and Cu are not alloyed with the low-melting-point metal, or a part of the alloy is alloyed, and the porous structure may remain, and the substrate and the object to be mounted may be bonded.

繼而,如此方式,在接合蓋體1與封裝體5而密封之方法中,於蓋體1事先形成硬焊接合材料4,故可使安定之硬焊接合材料4容易地形成於蓋體1的表面,密封用蓋材6的處理時硬焊接合材料4不會從蓋體1脫落,而容易處理。又,如前述,密封用糊膏20係可藉由印刷等之方法塗佈於載體3或蓋體1的表面,可容易地形成所希望的形狀之硬焊接合材料4(密封框)。繼而,硬焊接合材料4對此蓋體1之形成作業係可藉由低溫之熱處理來進行,較有效率。 Then, in such a manner, in the method of sealing the lid body 1 and the package 5, the hard solder material 4 is formed in advance on the lid body 1, so that the stable hard solder material 4 can be easily formed on the lid body 1. The surface of the sealing cover material 6 is not easily peeled off from the lid body 1 during the treatment of the lid member 6 for sealing, and is easy to handle. Further, as described above, the sealing paste 20 can be applied to the surface of the carrier 3 or the lid 1 by printing or the like, and the hard solder material 4 (sealing frame) having a desired shape can be easily formed. Then, the hard soldering material 4 can be formed by the heat treatment at a low temperature for the formation of the lid body 1, which is more efficient.

又,將熱處理步驟後之密封用蓋材6以挾住硬焊接合材料4而重疊於封裝體5之狀態實施合金化步驟,可同時進行硬焊接合材料4之合金化及密封,故較有效率。 Further, the sealing cover material 6 after the heat treatment step is subjected to an alloying step in a state in which the hard-welded material 4 is placed on the package 5, and the alloying and sealing of the hard-welded material 4 can be simultaneously performed. effectiveness.

進一步,被混合於密封用糊膏20之原料粉 末,因組合而含有複數之金屬粉末,故可容易變更各金屬粉末的份量或種類,可容易變更合金組成。 Further, the raw material powder mixed in the sealing paste 20 At the end, since a plurality of metal powders are contained by combination, the amount or type of each metal powder can be easily changed, and the alloy composition can be easily changed.

又,使被混合於密封用糊膏之原料粉末設為銀硬焊合金粉末時,當形成硬焊接合材料時,必須加熱至銀硬焊合金的熔融溫度(液相線溫度)以上,但本實施形態之硬焊接合材料4係利用低熔點金屬之液相燒結,而以低熔點金屬之熔融溫度(未達240℃)加熱來形成,故爐等係不須使用高溫規格者,可降低加工能量。 When the raw material powder to be mixed in the sealing paste is a silver brazing alloy powder, it is necessary to heat the molten solder to a melting temperature (liquidus temperature) of the silver brazing alloy. The hard solder joint material 4 of the embodiment is formed by liquid phase sintering of a low melting point metal and heating by a melting temperature of a low melting point metal (less than 240 ° C), so that the furnace or the like does not need to use a high temperature specification, and the processing can be reduced. energy.

進一步,封裝體密封方法係亦可採用:將預先作成之硬焊接合材料4積層於封裝體5與蓋體1之間後,加熱熔融硬焊接合材料4而合金化之方法(圖示略)。亦即,在此封裝體密封方法中,係進行糊膏塗佈步驟、熱處理步驟及合金化步驟;該糊膏塗佈步驟,係將密封用糊膏20塗佈於載體3上;該熱處理步驟,係使塗佈於載體3之密封用糊膏20以低熔點金屬的熔融溫度進行加熱而於Ag粉末21及Cu粉末22之間使低熔點金屬的液相滲透後冷卻固化,藉此,形成Ag粉末21及Cu粉末22藉由低熔點金屬所構成之結合層24連結而成之氣孔率10%以上的硬焊接合材料4;該合金化步驟,係使硬焊接合材料4積層於封裝體5與蓋體1之間後,使硬焊接合材料4加熱熔融而合金化,形成為硬焊合金。 Further, the package sealing method may be a method in which a pre-formed hard-welded material 4 is laminated between the package 5 and the lid 1 and then the molten hard-welded material 4 is heated and alloyed (not shown). . That is, in the package sealing method, a paste coating step, a heat treatment step, and an alloying step are performed; the paste coating step applies a sealing paste 20 to the carrier 3; the heat treatment step The sealing paste 20 applied to the carrier 3 is heated at a melting temperature of the low melting point metal, and the liquid phase of the low melting point metal is infiltrated between the Ag powder 21 and the Cu powder 22, followed by cooling and solidifying, thereby forming a paste. The Ag powder 21 and the Cu powder 22 are bonded to each other by a bonding layer 24 composed of a low melting point metal, and have a porosity of 10% or more. The alloying step is to laminate the hard solder material 4 to the package. After the gap between the lid body 1 and the lid body 1, the hard solder material 4 is heated and melted and alloyed to form a brazing alloy.

實施例 Example

關於實施例1~9、比較例1~11,係使用於實 驗之封裝體及蓋體(密封用蓋材)之試樣為各100個。封裝體係使用平面大小為3.2mm×2.5mm、厚0.5mm之陶瓷(氧化鋁製)者,金屬鍍覆(金屬化層)係於5μm之鍍Ni層上形成0.5μm的鍍Au層。蓋體係使用平面大小為3.1mm×2.4mm、厚0.1mm的鈷製板材,金屬鍍覆(金屬化層)係於5μm之鍍Ni層上形成0.1μm的鍍Au層。 Examples 1 to 9 and Comparative Examples 1 to 11 are used in the real The samples of the package and the lid (sealing lid) were each 100. For the package system, a ceramic (aluminum oxide) having a plane size of 3.2 mm × 2.5 mm and a thickness of 0.5 mm was used, and a metal plating (metallization layer) was formed on the 5 μm Ni plating layer to form a 0.5 μm Au plating layer. As the lid system, a cobalt plate material having a plane size of 3.1 mm × 2.4 mm and a thickness of 0.1 mm was used, and a metal plating layer (metallization layer) was formed on a 5 μm Ni plating layer to form a 0.1 μm Au plating layer.

形成實施例1~9及比較例1~10之各密封用蓋材的密封用糊膏係將表1所示之混合比率、平均粒徑之各金屬粉末混合的原料粉末、黏結劑進行混合而製作。表1中之SAC 305係Sn-3質量%Ag-0.5質量%Cu之Sn-Ag-Cu焊料合金。接著,將此等之密封用糊膏塗佈於各蓋體後,施予最高溫度240℃的熱處理而形成硬焊接合材料以形成密封用蓋材,為除去黏結劑,洗淨密封用蓋材料。 The sealing paste for forming the sealing cover materials of Examples 1 to 9 and Comparative Examples 1 to 10 was prepared by mixing the raw material powder and the binder in which the metal powders of the mixing ratio and the average particle diameter shown in Table 1 were mixed. Production. SAC 305 in Table 1 is a Sn-Ag-Cu solder alloy of Sn-3 mass% Ag-0.5 mass% Cu. Then, these sealing pastes are applied to the respective lids, and then subjected to a heat treatment at a maximum temperature of 240 ° C to form a hard-welded material to form a sealing lid member, and the sealing cover material is removed to remove the binder. .

有關各金屬粉末,係使用雷射繞射、散射式粒度分布測定裝置所測定的粒徑之中間值徑(D50)作為平均粒徑。 For each metal powder, the median diameter (D50) of the particle diameter measured by the laser diffraction or scattering type particle size distribution measuring apparatus was used as the average particle diameter.

比較例11之硬焊接合材料係使用不具有多孔結構之銀硬焊合金的壓延材(BAg-8:72質量%Ag-28質量%Cu)。 The hard-welded material of Comparative Example 11 was a rolled material (BAg-8: 72% by mass Ag-28% by mass Cu) of a silver brazing alloy having no porous structure.

於此等實施例1~9與比較例1~11之密封用蓋材所形成的硬焊接合材料,以其組成之混合粉(原料粉末)的理論密度作為ρ1,洗淨後之硬焊接合材料的密度藉阿基米德法所測定者作為ρ2時,使用氣孔率(%)=(ρ1-ρ2)/ρ1的計算式算出氣孔率。 The hard-welded composite material formed by the sealing cover materials of Examples 1 to 9 and Comparative Examples 1 to 11 has a theoretical density of the mixed powder (raw material powder) of the composition as ρ1, and the hard welded joint after washing. When the density of the material is ρ2 as measured by the Archimedes method, the porosity is calculated using a calculation formula of porosity (%) = (ρ1 - ρ2) / ρ1.

又,比較例7及比較例10之硬焊接合材料係在黏結劑除去步驟中產生剝離。又,比較例8之硬焊接合材料係在熱處理步驟中形狀崩壞,無法保持其形狀。因此,此等比較例7、8、10之硬焊接合材料係無法進行氣孔率之測定而以「-」記載氣孔率。 Further, the hard-welded materials of Comparative Example 7 and Comparative Example 10 were peeled off in the binder removal step. Further, the hard-welded material of Comparative Example 8 was broken in shape during the heat treatment step, and the shape could not be maintained. Therefore, in the hard-welded materials of Comparative Examples 7, 8, and 10, the porosity was not measured, and the porosity was described by "-".

其次,將各蓋體(密封用蓋材)重疊於封裝體而施予有縫焊接,進行氣密密封。 Next, each cover (sealing cover material) is superposed on the package, and is subjected to seam welding to perform hermetic sealing.

其後,以實體顯微鏡(×50倍)觀察封裝體與蓋體之接合部附近,研究有無龜裂。繼而,接合部附近之陶瓷封裝體無龜裂者設為合格(OK),產生龜裂者設為不合格(NG)(表2)。 Thereafter, the vicinity of the joint portion between the package and the lid was observed with a stereoscopic microscope (×50 times) to investigate the presence or absence of cracks. Then, the ceramic package in the vicinity of the joint portion was judged to be unacceptable (OK), and the crack was found to be unacceptable (NG) (Table 2).

又,對於各100個試樣實施He洩漏測試及液中起泡試驗的氣密密封試驗,依產生洩漏之個數研究氣密不良率。密封性之評估係在He洩漏測試及液中起泡試驗之兩者中若氣密不良率未達2%,設為合格(OK),在至少一者的測試中氣密不良率為2%以上者設為不合格(NG)(表2)。 Further, a hermetic sealing test of the He leakage test and the liquid foaming test was carried out for each of the 100 samples, and the airtight defect rate was examined in accordance with the number of leaks. The evaluation of the tightness is as follows: if the airtight defect rate is less than 2% in both the He leak test and the liquid foaming test, it is set to pass (OK), and the airtight defect rate is 2% in at least one of the tests. The above is assumed to be unqualified (NG) (Table 2).

將此等之結果表示於表2中。 The results of these are shown in Table 2.

從表1及表2明顯可知,就原料粉末而言,使用含有Ag粉末為平均粒徑0.1μm以上10.0μm以下且40質量%以上90質量%以下,含有Cu粉末為平均粒徑0.1μm以上10.0μm以下且5質量%以上50質量%以下,低熔點金屬粉末為平均粒徑0.5μm以上20.0μm以下且5質量%以上40質量%以下之密封用糊膏,而具有所設之氣孔率10%以上的多孔結構之硬焊接合材料,在實施例1~9的密封用蓋材中係任一者均不產生龜裂,又,封裝體之氣密性高且可進行良好地密封。 As is apparent from Tables 1 and 2, the raw material powder is an Ag powder containing an average particle diameter of 0.1 μm or more and 10.0 μm or less and 40% by mass or more and 90% by mass or less, and Cu powder is used as an average particle diameter of 0.1 μm or more and 10.0. 5% or less and 5% by mass or more and 50% by mass or less, and the low-melting-point metal powder is a sealing paste having an average particle diameter of 0.5 μm or more and 20.0 μm or less and 5% by mass or more and 40% by mass or less, and has a porosity of 10%. In the above-described hard-welded composite material having a porous structure, none of the sealing cover materials of Examples 1 to 9 is cracked, and the package has high airtightness and can be satisfactorily sealed.

被混合於密封用糊膏之Ag粉末及Cu粉末的平均粒徑為未達0.1μm,低熔點金屬粉末之平均粒徑為未達0.5μm時(比較例9),係使用此密封用糊膏所形成之硬焊接合材料的氣孔率為未達10%,封裝體及蓋體之接合 層或封裝體本身產生龜裂。另一方面,Ag粉末及Cu粉末的平均粒徑超過10μm時(比較例1),所形成之硬焊接合材料的氣孔率變大,密封性變差。又,低熔點金屬粉末之平均粒徑超過20μm時(比較例2),所形成之硬焊接合材料的氣孔率變大,密封性變差。 When the average particle diameter of the Ag powder and the Cu powder to be mixed in the sealing paste is less than 0.1 μm, and the average particle diameter of the low melting point metal powder is less than 0.5 μm (Comparative Example 9), the sealing paste is used. The formed hard solder joint has a porosity of less than 10%, and the joint between the package and the cover The layer or the package itself produces cracks. On the other hand, when the average particle diameter of the Ag powder and the Cu powder exceeds 10 μm (Comparative Example 1), the porosity of the formed hard-welded material increases, and the sealing property is deteriorated. When the average particle diameter of the low-melting-point metal powder exceeds 20 μm (Comparative Example 2), the porosity of the formed hard-welded material increases, and the sealing property is deteriorated.

Ag粉末之含有比率未達40質量%時(比較例3),密封性降低,超過90質量%時(比較例10),在黏結劑除去步驟產生剝離。Cu粉末的含有比率為5質量%以上50質量%以下之範圍外時,亦即,未達5質量%時(比較例4、10)、或超過50質量%時(比較例5、7),密封性會降低。低熔點金屬粉末之含有比率未達5質量%時(比較例7、10),在黏結劑除去步驟中產生剝離,超過40質量%時(比較例6),密封性會降低。 When the content ratio of the Ag powder was less than 40% by mass (Comparative Example 3), the sealing property was lowered, and when it exceeded 90% by mass (Comparative Example 10), peeling occurred in the binder removal step. When the content ratio of the Cu powder is outside the range of 5% by mass to 50% by mass, that is, when it is less than 5% by mass (Comparative Examples 4 and 10) or more than 50% by mass (Comparative Examples 5 and 7), The seal will be reduced. When the content ratio of the low-melting-point metal powder is less than 5% by mass (Comparative Examples 7 and 10), peeling occurs in the binder removal step, and when it exceeds 40% by mass (Comparative Example 6), the sealing property is lowered.

又,本發明係不限定於上述實施形態,在不超出本發明之旨意的範圍中,可加上各種變更。 Further, the present invention is not limited to the above-described embodiments, and various modifications can be added without departing from the scope of the invention.

產業上之利用可能性 Industrial use possibility

藉由可容易變更硬焊接合材料之合金組成,具有多孔結構之硬焊接合材料,不產生龜裂,可確實地使封裝體氣密密封。 The hard-welded material having a porous structure can be easily changed by the alloy composition of the hard-welded material, and cracks are not generated, so that the package can be hermetically sealed.

20‧‧‧密封用糊膏 20‧‧‧Seal paste

21‧‧‧Ag粉末 21‧‧‧Ag powder

22‧‧‧Cu粉末 22‧‧‧Cu powder

23‧‧‧低熔點金屬粉末 23‧‧‧Low-melting metal powder

25‧‧‧黏結劑 25‧‧‧Adhesive

Claims (18)

一種密封用糊膏,其特徵係包含原料粉末及黏結劑,而該原料粉末係含有平均粒徑0.5μm以上20.0μm以下且熔點或液相線溫度為未達240℃的低熔點金屬粉末5質量%以上40質量%以下、平均粒徑0.1μm以上10.0μm以下的Ag粉末40質量%以上90質量%以下、及平均粒徑0.1μm以上10.0μm以下之Cu粉末5質量%以上50質量%以下。 A paste for sealing comprising a raw material powder and a binder, wherein the raw material powder contains a low-melting metal powder having an average particle diameter of 0.5 μm or more and 20.0 μm or less and a melting point or a liquidus temperature of less than 240 ° C Ag powder of 40% by mass or more and 40% by mass or less and 90% by mass or less of the Ag powder having an average particle diameter of 0.1 μm or more and 10.0 μm or less and 5% by mass or less and 50% by mass or less of the Cu powder having an average particle diameter of 0.1 μm or more and 10.0 μm or less. 如申請專利範圍第1項之密封用糊膏,其中前述低熔點金屬粉末之平均粒徑係前述Ag粉末之平均粒徑的1倍以上10倍以下且前述Cu粉末之平均粒徑的1倍以上10倍以下。 The paste for sealing according to the first aspect of the invention, wherein the average particle diameter of the low-melting-point metal powder is 1 time or more and 10 times or less the average particle diameter of the Ag powder, and the average particle diameter of the Cu powder is at least 1 time. 10 times or less. 如申請專利範圍第1項之密封用糊膏,其中前述低熔點金屬粉末之平均粒徑係大於前述Ag粉末之平均粒徑及前述Cu粉末之平均粒徑。 The sealing paste according to claim 1, wherein the average particle diameter of the low melting point metal powder is larger than an average particle diameter of the Ag powder and an average particle diameter of the Cu powder. 如申請專利範圍第1項之密封用糊膏,其中前述黏結劑之混合比率為2質量%以上50質量%以下。 The sealing paste according to the first aspect of the invention, wherein the mixing ratio of the binder is 2% by mass or more and 50% by mass or less. 如申請專利範圍第1項之密封用糊膏,其中前述低熔點金屬粉末係選自Sn、In、Sn-Ag-Cu焊料合金、Sn-Cu焊料合金、Sn-Bi焊料合金、Sn-In焊料合金之一種以上。 The sealing paste according to claim 1, wherein the low melting point metal powder is selected from the group consisting of Sn, In, Sn-Ag-Cu solder alloy, Sn-Cu solder alloy, Sn-Bi solder alloy, and Sn-In solder. More than one type of alloy. 一種硬焊接合材料之製造方法,係具有:將如申請專利範圍第1項之前述密封用糊膏塗佈於載體上之糊膏塗佈步驟及熱處理步驟; 該熱處理步驟係使塗佈於前述載體之前述密封用糊膏以前述低熔點金屬的熔融溫度進行加熱而於前述Ag粉末及前述Cu粉末之間使前述低熔點金屬的液相滲透後冷卻固化,藉此,形成前述Ag粉末及前述Cu粉末藉由前述低熔點金屬所構成之結合層連結而成之氣孔率10%以上的硬焊接合材料。 A method for producing a hard-welded material, comprising: a paste coating step and a heat treatment step of applying the above-mentioned sealing paste according to claim 1 of the patent application to a carrier; In the heat treatment step, the sealing paste applied to the carrier is heated at a melting temperature of the low melting point metal, and the liquid phase of the low melting point metal is infiltrated between the Ag powder and the Cu powder, and then cooled and solidified. Thereby, a hard solder material having a porosity of 10% or more in which the Ag powder and the Cu powder are bonded by a bonding layer made of the low melting point metal is formed. 一種硬焊接合材料,其特徵係具有:平均粒徑0.1μm以上10.0μm以下的Ag粉末、平均粒徑0.1μm以上10.0μm以下之Cu粉末、及、由熔點或液相線溫度為未達240℃之低熔點金屬所構成,且使前述Ag粉末及前述Cu粉末連結之結合層;氣孔率為10%以上,且質量比率係前述Ag粉末為40質量%以上90質量%以下、前述Cu粉末為5質量%以上50質量%以下、前述結合層為5質量%以上40質量%以下。 A hard-welded material characterized by having Ag powder having an average particle diameter of 0.1 μm or more and 10.0 μm or less, Cu powder having an average particle diameter of 0.1 μm or more and 10.0 μm or less, and a melting point or a liquidus temperature of less than 240 a bonding layer in which the Ag powder and the Cu powder are bonded to each other, and a porosity of 10% or more, and the mass ratio is 40% by mass or more and 90% by mass or less of the Ag powder, and the Cu powder is 5 mass% or more and 50 mass% or less, and the said bonding layer is 5 mass % or more and 40 mass % or less. 一種密封用蓋材料之製造方法,係具有:將如申請專利範圍第1項之前述密封用糊膏塗佈於蓋體的表面之糊膏塗佈步驟、及熱處理步驟;該熱處理步驟係使塗佈於前述蓋體之前述密封用糊膏以前述低熔點金屬的熔融溫度進行加熱而於前述Ag粉末及前述Cu粉末之間使前述低熔點金屬的液相滲透後冷卻固化,藉此,形成前述Ag粉末及前述Cu粉末藉由前述低熔點金屬所構成之結合層連結而成之氣孔率10%以上的硬焊接合材料。 A method for producing a lid material for sealing, comprising: a paste application step of applying the paste for sealing according to claim 1 of the patent application to a surface of a lid body; and a heat treatment step; The sealing paste coated on the lid body is heated at a melting temperature of the low melting point metal, and a liquid phase of the low melting point metal is infiltrated between the Ag powder and the Cu powder, and then cooled and solidified, thereby forming the aforementioned The Ag powder and the Cu powder are a hard-welded material having a porosity of 10% or more which is connected by a bonding layer made of the low-melting-point metal. 如申請專利範圍第8項之密封用蓋材料之製造方法,其中在前述熱處理步驟後,具有除去將殘存於前述硬焊接合材料中之黏結劑之黏結劑除去步驟。 The method for producing a sealing cover material according to claim 8, wherein after the heat treatment step, a binder removal step of removing a binder remaining in the hard-bonded material is provided. 如申請專利範圍第9項之密封用蓋材料之製造方法,其中前述黏結劑除去步驟係具有以洗淨液洗淨前述硬焊接合材料之洗淨步驟、及熱處理該洗淨處理後之前述硬焊接合材料之烘烤處理。 The method for producing a sealing cap material according to claim 9, wherein the binder removing step includes a washing step of washing the hard solder material with a cleaning liquid, and a heat treatment after the washing treatment. Baking treatment of welded composite materials. 如申請專利範圍第8項之密封用蓋材料之製造方法,其中在前述糊膏塗佈步驟中可形成複數個前述蓋體的大小之板材表面上塗佈前述密封用糊膏,以及於前述熱處理步驟之後,具有將前述板材分割成前述蓋體之個片化步驟。 The method for producing a sealing cover material according to the eighth aspect of the invention, wherein the sealing paste is coated on a surface of a sheet material capable of forming a plurality of the lid bodies in the paste coating step, and the heat treatment is performed After the step, there is a sheet forming step of dividing the sheet material into the lid body. 一種密封用蓋材料,其特徵係具有:蓋體、及設於前述蓋體表面之如申請專利範圍第7項的硬焊接合材料。 A sealing cover material comprising: a cover body; and a hard-welded material according to item 7 of the patent application scope provided on the surface of the cover body. 一種封裝體密封方法,其係使封裝體與蓋體藉由硬焊合金接合,且具有:糊膏塗佈步驟、熱處理步驟及合金化步驟;該糊膏塗佈步驟,係將如申請專利範圍第1項之前述密封用糊膏塗佈於前述蓋體的表面;該熱處理步驟,係使塗佈於前述蓋體之前述密封用糊膏以前述低熔點金屬的熔融溫度進行加熱而於前述Ag粉末及前述Cu粉末之間使前述低熔點金屬的液相滲透後冷卻固化,藉此,形成前述Ag粉末及前述Cu粉末藉由前 述低熔點金屬所構成之結合層連結而成之氣孔率10%以上的硬焊接合材料;該合金化步驟,係以將前述蓋體重疊於前述封裝體之狀態使前述硬焊接合材料加熱熔融而合金化,並形成為前述硬焊合金。 A package sealing method for bonding a package body and a cover body by a brazing alloy, and having: a paste coating step, a heat treatment step, and an alloying step; the paste coating step is as claimed in the patent application The sealing paste according to the first aspect is applied to the surface of the lid body; and the heat treatment step is performed by heating the paste for sealing applied to the lid body at a melting temperature of the low melting point metal to the Ag The liquid phase of the low melting point metal is infiltrated between the powder and the Cu powder, and then cooled and solidified, whereby the Ag powder and the Cu powder are formed by the former a hard-welded material having a porosity of 10% or more in which a bonding layer composed of a low-melting-point metal is bonded; wherein the alloying step heats and melts the hard-welded material by superposing the lid on the package It is alloyed and formed into the aforementioned brazing alloy. 如申請專利範圍第13項之封裝體密封方法,其中於前述熱處理步驟與前述合金化步驟之間,具有除去殘存於前述硬焊接合材料中之黏結劑的黏結劑除去步驟。 The package sealing method of claim 13, wherein the binder removal step of removing the binder remaining in the hard-bonded material is between the heat treatment step and the alloying step. 如申請專利範圍第14項之封裝體密封方法,其中前述黏結劑除去步驟係具有:以洗淨液洗淨前述硬焊接合材料之洗淨處理;及,熱處理該洗淨處理後之前述硬焊接合材料的烘烤處理。 The method of sealing a package according to claim 14, wherein the removing step of the adhesive has a cleaning process of washing the hard solder material with a cleaning liquid; and heat-treating the hard solder after the cleaning process. Baking treatment of composite materials. 如申請專利範圍第13項之封裝體密封方法,其中在前述糊膏塗佈步驟中可形成複數個前述蓋體的大小之板材表面上塗佈前述密封用糊膏,以及於前述熱處理步驟之後,具有將前述板材分割成前述蓋體之個片化步驟。 The method of sealing a package according to claim 13, wherein the sealing paste is coated on the surface of the sheet in which the plurality of the lids are formed in the paste coating step, and after the heat treatment step, There is a singulation step of dividing the aforementioned sheet material into the above-mentioned lid body. 如申請專利範圍第16項之封裝體密封方法,其中於前述個片化步驟之後,具有對前述蓋體之表面施予金屬鍍覆之鍍覆處理步驟。 The package sealing method of claim 16, wherein after the singulating step, a plating treatment step of applying a metal plating to the surface of the cover is provided. 一種封裝體密封方法,係於封裝體重疊蓋體而藉由硬焊合金接合,其特徵係進行糊膏塗佈步驟、熱處理步驟及合金化步驟;該糊膏塗佈步驟,係將如申請專利範圍第1項之前述 密封用糊膏塗佈於載體上;該熱處理步驟,係使塗佈於前述載體之前述密封用糊膏以前述低熔點金屬的熔融溫度進行加熱而於前述Ag粉末及前述Cu粉末之間使前述低熔點金屬的液相滲透後冷卻固化,藉此,形成前述Ag粉末及前述Cu粉末藉由前述低熔點金屬所構成之結合層連結而成之氣孔率10%以上的硬焊接合材料;該合金化步驟,係使前述硬焊接合材料積層於前述封裝體與前述蓋體之間後,使前述硬焊接合材料加熱熔融而合金化,形成為前述硬焊合金。 A package sealing method is a method in which a package is overlapped with a cover and joined by a brazing alloy, characterized in that a paste coating step, a heat treatment step, and an alloying step are performed; the paste coating step is as claimed The aforementioned range of item 1 The sealing paste is applied to the carrier; the heat treatment step is such that the sealing paste applied to the carrier is heated at a melting temperature of the low melting point metal to form the aforementioned Ag powder and the Cu powder. a liquid-phase infiltration of a low-melting-point metal, followed by cooling and solidification, thereby forming a hard-welded material having a porosity of 10% or more in which the Ag powder and the Cu powder are bonded by a bonding layer composed of the low-melting-point metal; In the step of disposing the hard solder material between the package and the lid, the hard solder material is heated and melted and alloyed to form the brazing alloy.
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