TW201625811A - Reaction gas delivery device and chemical vapor deposition or epitaxial layer growth reactor - Google Patents

Abstract

The present invention discloses a gas delivery device for chemical vapor deposition or epitaxial layer growth reactors, comprising a spacer plate and a gas delivery plate; the spacer plate is formed thereon with a first gas diffusion zone, and a second gas diffusion zone is formed between the spacer plate and the gas delivery plate; longitudinally elongated first gas diffusion grooves and longitudinally elongated second gas diffusion grooves are alternately disposed in parallel to each other on an upper surface of the gas delivery plate, both the first and second gas diffusion grooves having bottoms respectively provided with a first gas outlet passage and a second gas outlet passage used for respectively transporting the gas in the first gas diffusion zone and the gas in the second gas diffusion zone to the processing area; the lower surface of the gas delivery plate between the adjacent first gas outlet passage and second gas outlet passage is curved or tip-tapered in shape.

Description

Reaction gas delivery device and chemical vapor deposition or epitaxial layer growth reactor

The present invention relates to the manufacture of semiconductor devices, and more particularly to an apparatus for growing an epitaxial layer or performing chemical vapor deposition on a substrate such as a substrate.

The design of the reactor is critical in production processes such as growing an epitaxial layer on a substrate or performing chemical vapor deposition. In the prior art, the reactor has various designs, including: a horizontal reactor in which the substrate is installed at an angle to the inflowing reaction gas; a planetary rotating horizontal reactor, the reactor a reaction gas level passing through the substrate; and a vertical reactor in which, when the reaction gas is injected down onto the substrate, the substrate is placed on the substrate carrier in the reaction chamber and rotated at a relatively high speed . This high speed rotating vertical reactor is one of the most commercially important MOCVD reactors.

The structure of the reaction gas delivery device in the vertical reactor is one of the most important designs. The epitaxial growth process or the chemical vapor deposition process usually requires at least two sets of reaction gases. In practical applications, preferably, the reaction gas enters the reaction. There is no mixing in front of the cavity, so various gas sprinkler designs have been proposed to ensure that the two sets of reactive gases remain isolated from each other before entering the reaction chamber. In addition, effective cooling of the gas shower head is also very helpful for the reaction process, and in many applications, fluids including water are used for cooling.

In the prior art, most of the gas delivery devices are designed to use gas delivery pipes to realize the transportation of different reaction gases, and welding many components together, which not only improves the difficulty of processing, but also because of the gas transmission pipes and the partition plates of different gases. The inter-sealing effect is not good, increasing the risk of gas leakage; in other designs, a gas delivery device is provided by welding a plurality of hollow elongated tubular gas distribution elements side by side and side by side, At the same time, components such as a gas diffuser and a cooling pipe are welded under the elongated tubular gas distribution element, but these welded components are liable to cause water leakage and air leakage, and in processing and welding, it is impossible to ensure that the respective air inlet components are identical. The shape and size of each gas delivery device cannot be ensured. In addition, after a certain process, the gas delivery device is easily deformed, resulting in different process effects of different substrates in the same reaction chamber. If the gas delivery devices cannot guarantee the same processing parameters during processing, the processing of different reactors will be different when placed in the reactor, which will seriously affect the uniformity of substrate processing in different reactors, resulting in a batch of substrates. The processing results (between the reaction chamber and the cavity) are different. Further, in these designs, there is also a problem that the gas delivered into the treatment region is uneven due to the difference in gas diffusion speed between the tubular gas distribution members.

Therefore, there is a need in the industry for a reaction gas delivery device that is capable of uniformly providing a reaction gas while having a simple structural design and good process stability.

One of the objects of the present invention is to provide a reaction gas delivery device which has a simple overall structure design, is simple to process, and does not undergo deformation after long-term processing, and can effectively prevent gas leakage before the reaction gas enters the treatment area. The cooling water leaks, and at the same time, the rate of the reaction gas entering the treatment area is ensured to be uniform and controllable, and the process of different substrates in each reaction chamber and the uniformity of the substrate processing between the reaction chamber and the reaction chamber are ensured.

According to an object of the present invention, the present invention provides a reaction gas delivery device for a chemical vapor deposition or epitaxial growth reactor comprising: a top plate, a separator, and a gas transport arranged in order from top to bottom a plate, the top plate and the partition plate are spaced apart from each other to form a first gas diffusion region therebetween, and the separator plate and the gas transport plate are spaced apart from each other to form a second gas diffusion region therebetween;

The gas conveying plate is an integrally formed plate body, and comprises an upper surface, wherein the upper surface is provided with a plurality of longitudinally elongated first gas diffusion grooves and a plurality of longitudinal lengths arranged in parallel with each other in a horizontal direction. Forming a second gas diffusion groove, and each of the first gas diffusion grooves and each of the second gas diffusion grooves are arranged at intervals with each other, and a vertically elongated first gas outlet is further connected below each of the first gas diffusion grooves. a channel and the two are connected to each other, and a second elongated gas outlet passage is connected under the second gas diffusion grooves and communicated with each other; the first gas diffusion grooves and the adjacent ones thereof An elongated gas guiding strip extends downwardly between the two gas diffusion grooves; and each of the elongated gas guiding strips is internally provided with an elongated cooling duct, and each of the elongated gas guides The lower surface of the flow bar is provided with a curved arc or a pointed cone;

Further, each of the first gas diffusion grooves is further connected with at least one first gas delivery pipe that communicates with the first gas diffusion region.

Preferably, each of the elongated first gas outlet passages and the longitudinally elongated second gas outlet passages are arranged in parallel with each other and are arranged at intervals.

Preferably, the elongated first gas outlet passage is a longitudinal slit passage.

Preferably, the elongated second gas outlet passage is an elongated slit passage.

Preferably, the elongated first gas outlet passage comprises a plurality of orifice passages, and the plurality of orifice passages integrally constitute a longitudinally-shaped outlet passage.

Preferably, the elongated second gas outlet passage comprises a plurality of orifice passages, and the plurality of orifice passages integrally constitute a longitudinally-shaped outlet passage.

Preferably, each of the elongated gas guiding strips is located between each of the elongated first gas outlet passages and each of the elongated second gas outlet passages.

Preferably, the lower surface of the elongated gas guiding strip is an arcuate surface that protrudes toward the reactive gas processing region.

Preferably, the lower surface of the elongated gas guiding strip is an arcuate surface that is recessed toward the reactive gas processing region.

Preferably, the arcuate surface recessed to the process processing region is curved at an intersection with the channel side of the first gas outlet passage and the second gas outlet passage.

Preferably, each of the longitudinal gas guiding strips is connected to a longitudinally elongated gas guiding strip on both sides thereof, and the gas guiding strip and the sub-gas guiding strip are parallel to each other and spaced apart from each other. The distance is disposed to form a sub-gas passage therebetween, and the sub-gas passage and the first gas outlet passage or the second gas outlet passage have an acute angle in a vertical cross-sectional direction.

Preferably, the first gas outlet passage is a longitudinal slit passage having a width smaller than a width of the first gas diffusion groove or a plurality of pore passages having a diameter smaller than a width of the first gas diffusion groove; the second gas outlet passage is A longitudinal slit passage having a width smaller than a width of the second gas diffusion groove or a plurality of pore passages having a diameter smaller than a width of the second gas diffusion groove.

Preferably, the gas delivery device comprises at least an edge region and a central region, a vertical length of a section of the first and second gas outlet channels located in the edge region, and first and second portions located in the central region The vertical lengths of the gas outlet passages are different or the same.

The gas delivery device includes at least an edge region and a central region, wherein the edge region and the first gas diffusion groove of the central region have a groove depression depth greater than a groove depression depth of the first gas diffusion groove of the central region, The groove recess depth of the second gas diffusion groove is greater than the groove recess depth of the second gas diffusion groove of the center region.

A second object of the present invention is to provide a chemical vapor deposition or epitaxial layer growth reactor, the reactor comprising a reactive gas delivery device, which can effectively control the rate and uniformity of reaction gases entering the treatment zone. The degree of separation between the two groups of gases can be ensured before entering the treatment zone, and at the same time, the deposition reaction of the reaction gas on the lower surface of the reaction gas delivery device can be reduced, and the pollution probability of the reaction chamber can be reduced.

A third object of the present invention is to provide a method of fabricating a gas delivery device, the method comprising the steps of:

Providing a plate having a certain thickness for forming a gas conveying plate, the plate having relatively parallel upper and lower surfaces;

Forming a first gas diffusion groove and a longitudinally elongated second gas diffusion groove which are parallel to each other and have a certain depth in a horizontal direction on the upper surface of the plate, the first gas diffusion groove and the first gas diffusion groove a second gas diffusion groove is alternately disposed; a longitudinally-shaped slit channel having a width smaller than a width of the first gas diffusion groove and a plurality of diameters smaller than a width of the first gas diffusion groove are cut in a groove bottom of the first gas diffusion groove a hole passage, the slit passage or the hole passage constitutes a first gas outlet passage, and a slit passage or diameter having a width smaller than a width of the second gas diffusion groove groove is cut in a groove bottom of the second gas diffusion groove a plurality of hole channels smaller than a width of the second gas diffusion groove, the gap channel or the hole channel forming a second gas outlet passage; a plate between the first outlet passages and the second gas outlet passages Forming a longitudinal gas guiding strip;

Forming a longitudinally-shaped cooling passage inside each gas guiding strip; the lower surface of the gas guiding strip is provided with a lower surface having a certain curvature or a tapered lower surface;

a sealing plate is tightly fixed on the surface of the finished gas conveying plate, and a region corresponding to the second gas diffusion groove is hollowed out on the sealing plate, and at least the position of each first gas diffusion groove is set on the sealing plate. a duct insertion interface;

A spacer is disposed at a distance above the gas transport plate, and a second gas diffusion region is formed between the partition plate and the gas transport plate, and a small position is set on the partition plate corresponding to each plug pipe interface Inserting a first gas delivery tube into the hole, each of the small holes and the corresponding delivery tube insertion surface, the first gas delivery tube being sealed with the small hole and the insertion surface of the delivery tube; and

A top plate is disposed at a distance above the partition plate, and a first gas diffusion region is formed between the top plate and the partition plate.

Preferably, when the gas conveying plate is formed, the groove depth of the first gas diffusion groove and the second gas diffusion groove disposed near the edge region of the gas conveying plate is greater than the first gas diffusion groove and the second gas diffusion near the central portion. The groove depth of the groove.

Preferably, when the lower surface of the gas conveying plate is formed, the lower surface of the elongated gas guiding strip is provided as a downwardly convex curved surface or an upwardly concave curved surface.

FIG. 1 is a schematic view showing a front cross-sectional surface of a reactor according to an embodiment of the present invention. The reactor can be used for chemical vapor deposition or epitaxial layer growth, but it should be understood that it is not limited to such applications.

The reactor 10 includes an outer wall 11 enclosing a reaction chamber and a top wall 12. At least one substrate carrier 15 and a supporting device 16 for supporting the substrate carrier 15 are disposed in the reactor 10 for chemical vapor deposition. In the epitaxial layer growth reactor, the supporting device 16 can drive the substrate carrier 15 to rotate to achieve a smooth deposition process or an epitaxial layer growth process. Above the substrate carrier 15, a reactive gas delivery device 100 is disposed below the top wall 12, and the reactive gas delivery device 100 is configured to deliver at least two different sets of reaction gases to the mixing reaction in the processing zone within the reactor 10, and to ensure The two sets of different reactive gases are isolated from each other before entering the treatment zone.

2, 3, and 4 illustrate a reaction gas delivery device according to an embodiment of the present invention, which is disposed in a reactor 10 for chemical vapor deposition or epitaxial growth as shown in FIG. 2 is a front cross-sectional schematic view of the reactive gas delivery device of the present embodiment, and FIG. 3 is a front cross-sectional schematic view showing the reaction gas delivery device of the present embodiment raised at a certain angle, and FIG. 4 is a reaction gas. In a bottom view of the delivery device, the reactive gas delivery device is located in a body portion 20. As can be clearly seen from the reaction gas delivery devices shown in FIGS. 2 and 3, the reaction gas delivery device 100 includes a top plate 130, a separator 120, and a gas delivery plate 110 from top to bottom, wherein the top plate The 130 and the separator 120 are spaced apart from each other to form a first gas diffusion region 128 therebetween, and the separator 120 and the gas transport plate 110 are spaced apart from each other to form a second gas diffusion region 118 therebetween. The first gas diffusion region 128 is connected to the first gas source 101 in FIG. 1 for providing a first reaction gas injection, and the second gas diffusion region 118 is connected to the second gas source 102 in FIG. A second reactive gas injection is provided.

The gas conveying plate 110 is an integrally formed plate body structure, and comprises an upper surface 110a and a lower surface 110b. The upper surface 110a is cut in a horizontal direction (such as in the X-axis direction of the drawing) to the lower surface 110b. a plurality of vertically elongated first gas diffusion grooves 111 and a plurality of longitudinally elongated second gas diffusion grooves 112 arranged in parallel with each other, and each of the first gas diffusion grooves 111 and each of the second gas diffusion grooves 112 are parallel to each other and mutually The interspersed arrangement is arranged such that the distance between them is a certain preset distance, and the distance of the interval may be the same or different as the case may be. A longitudinally-shaped first gas outlet passage 1111 is connected to each of the first gas diffusion grooves 111 and communicates with each other. A second elongated gas outlet passage 1121 is further connected to each of the second gas diffusion grooves 112. The persons are connected to each other for transporting the first gas and the second gas into the treatment area. An elongated gas guiding strip 50 is disposed or formed between the adjacent first gas outlet passage 1111 and the second gas outlet passage 1121. The lower surface of each gas guiding strip 50 is a surface 110b having a certain curvature. . One or a plurality of elongated cooling ducts 116 are disposed in each of the gas guiding strips 50 along the longitudinal direction of each of the gas guiding strips 50. The cooling duct 116 includes at least one coolant inlet 1161 (shown in FIG. 1). And a coolant outlet 1162 (shown in Figure 1), controlling the temperature of the gas delivery plate 110 by the circulation of the coolant, so that the reaction process is stable and uniform, and the first reaction gas and the second reaction gas can be avoided. A deposition reaction is performed on the lower surface 110b of the gas transfer plate 110 to generate deposition contaminants.

In the present embodiment, in order to ensure the uniformity of the gas flow, the curved lower surface 110b of each of the gas guiding strips 50 has the same shape, and the curved lower surface can reduce the deposition reaction on the surface due to the outflow of the gas out of the outlet passage. In order to avoid particle contamination caused by the reaction process. In some embodiments, the shape of the curved lower surface 110b between the different first gas outlet passage outlets and the second gas outlet passage outlets may be set to be different for different needs, by setting the difference of the lower surfaces. The shape is adjusted to adjust the reaction gas output rate or the gas distribution is different. It can be seen from Fig. 4 that the first gas outlet channel 1111 and the second gas outlet channel 1121 are respectively disposed on two sides of the longitudinal gas guiding strip, and the first gas outlet channel 1111 and the second gas outlet channel 1121 are alternately arranged in parallel, respectively A first gas and a second gas are supplied to the reaction zone.

As a preferred embodiment, the first gas outlet passage 1111 in the drawing is a slit-shaped passage having a width smaller than the groove width of the first gas diffusion groove 111, and the second gas outlet passage 1121 has a width smaller than the groove width of the second gas diffusion groove 112. The slit-shaped passages, in other embodiments, the two gas outlet passages may be of other constructions, as will be described in the following examples.

A plurality of small holes 125 are disposed on the separation plate 120 to allow the first gas delivery pipe 121 to pass, and the first gas delivery pipe 121 passes the first gas through the separation plate 120 to the first gas diffusion groove 111, each of the first gas The diffusion groove 111 corresponds to at least one first gas delivery pipe 121. In order to make the first gas diffusion in the gas diffusion channel 111 fast and uniform, a plurality of first gas delivery pipes 121 may be uniformly disposed on each of the first gas diffusion grooves 111. Since the first gas and the second gas need to be separated from each other when entering the processing region, the first gas delivery pipe 121 must ensure that the first gas is not mixed with the second gas during the process of conveying the first gas into the first gas diffusion groove 111. To this end, a sealing plate 113 is fixedly connected to the surface of the gas conveying plate 110, and the position of the sealing plate 113 corresponding to the second gas diffusion groove 112 is hollowed out, so that the second gas diffusion groove 112 communicates with the second gas diffusion region 118. The sealing plate 113 completely covers only the first gas diffusion groove 111. Preferably, in order to ensure the tightness of the covering, the sealing plate 113 and the upper surface 110a on both sides of the first gas diffusion groove 111 are provided with a gasket 1135. The sealing plate 113 is disposed at a position corresponding to the first gas delivery pipe 121 to allow the first gas to be injected into the delivery tube interposer 115. In the present embodiment, the delivery tube interposer 115 may allow the first gas delivery tube 121 to pass through, in addition In the embodiment, the gas delivery tube 121 does not pass through the insertion surface 115 of the delivery tube, and the end thereof abuts against the upper surface of the sealing plate 113, and only the first gas is injected into the first gas diffusion groove. A gas delivery tube 121 is sealed with a contact surface of the delivery tube interposer 115 of the sealing plate 113 to isolate the first gas from the second gas. If the first gas delivery tube 121 and the sealing plate 113 are made of metal, they can be welded. The method is sealed; if it is a non-metallic material, it can be sealed by means of a sealing ring. If each of the first gas diffusion grooves 111 corresponds to the plurality of first gas delivery tubes 121, a corresponding number of the delivery tube insertion surfaces 115 are required on the sealing plate 113, and each of the first gas delivery tubes 121 and the delivery tube insertion surface 115 The contact surfaces need to be sealed.

The reaction gas delivery device 100 of the present embodiment is placed in the reactor shown in FIG. 1. As a different embodiment, the reaction chamber top wall 12 can be directly used as the top plate and the separator 120 to form the first gas diffusion region. The reaction gas delivery device described in the embodiment shown in FIGS. 2-4 may be entirely placed under the top wall 12, and the first gas in the first gas source 101 is injected into the first gas diffusion region 128, and the second gas source 102 is The second gas is injected into the second gas diffusion region 118, and the first gas enters the first gas diffusion channel 111 through the first gas delivery tube 121 and enters the processing region above the substrate carrier 15 through the first gas outlet channel 1111. The gas enters the processing region above the substrate carrier 15 through the second gas diffusion channel 1121 through the second gas diffusion channel 112. The two gases are processed in the processing area to process the substrate above the substrate carrier 15.

In the foregoing embodiment, the isolation of the first gas from the second gas is achieved by providing the sealing plate 113. It should be understood that it is not limited to this design. For example, when the first gas diffusion groove 111 is opened on the upper surface of the reaction gas delivery device, the first gas diffusion groove 111 is directly drilled from a distance below the upper surface, so that the upper portion of the first gas diffusion groove 111 is not exposed. Instead of being disposed below the upper surface, the design no longer requires the additional provision of the sealing plate 113.

The reaction gas conveying device provided by the invention has a simple manufacturing method, and each size can be precisely controlled, and the manufacturing steps are:

An integrally formed panel 110 having a thickness is first provided for forming a gas delivery panel having relatively parallel upper and lower surfaces 110a, 110b; as an example, the sheet is formed into a generally cylindrical shape.

A vertically elongated first gas diffusion groove 111 having a certain depth and a vertically elongated second gas diffusion groove 112 are alternately drilled in parallel in a horizontal direction (such as the positive and negative directions of the X-axis) of the upper surface of the plate material. a slit passage having a width smaller than a width of the first gas diffusion groove or a plurality of hole passages having a diameter smaller than a width of the first gas diffusion groove is formed in the groove bottom of the first gas diffusion groove 111, and the slit channel or the hole channel is formed a first gas outlet passage 1111, a slit passage having a width smaller than a width of the second gas diffusion groove or a plurality of pore passages having a diameter smaller than a width of the second gas diffusion groove at a groove bottom of the second gas diffusion groove 112, The slit channel or the plurality of holes passages constitute a second gas outlet passage 1121; the plate between each of the first outlet passages and each of the second gas outlet passages becomes a longitudinal gas guide strip 50;

a cooling passage 116 is bored in each of the gas guiding strips 50; a lower surface of the gas guiding strip is provided with a lower surface having a certain curvature or a tapered lower surface;

A sealing plate 113 is tightly fixed on the surface of the finished gas conveying plate, and a region corresponding to the second gas diffusion groove 112 on the sealing plate is hollowed out, and at least one conveying is arranged on the sealing plate corresponding to the position of each of the first gas diffusion grooves. Pipe insertion interface 115;

A partitioning plate 120 is disposed at a distance above the gas conveying plate 110, and a second gas diffusion region 118 is formed between the partitioning plate 120 and the gas conveying plate 110, and a small position is set on the separating plate corresponding to each of the conveying pipe interposing surfaces 115. a first gas delivery tube 121 is disposed at each of the apertures 125 and each of the corresponding apertures 125, and the first gas delivery tube 121 is sealed with the apertures 125 and the interface of the delivery tube interface 115;

A top plate 130 is disposed at a distance above the partition plate, and a first gas diffusion region 128 is formed between the top plate 130 and the partition plate 120.

The reaction gas conveying device provided by the invention has simple processing and manufacturing, and the size of each groove and channel can be precisely controlled during machining, thereby ensuring the same shape, size and size of each reaction gas conveying device after processing, thereby ensuring the same. Yield of processing; the same reaction gas delivery device is placed in different reactors to achieve matching with different reactors, and processing between the reaction chamber and the reaction chamber can be ensured when processing a batch of substrates in a plurality of reactors The uniformity of the process improves the product qualification rate of the reactor. At the same time, since the gas diffusion tank, the gas outlet passage, the gas guiding block and the cooling duct are all disposed on one plate, the possibility of gas leakage and water leakage is greatly reduced, and the reliability of the use of the reaction gas conveying device is ensured.

The reaction gas conveying device of the invention minimizes the use of the pipeline design, reduces the number of seals at the pipeline and the sealing plate and the insulation plate, and improves the mutual isolation effect of the two gases before entering the treatment area, by adopting a gas conveying plate of a certain thickness. 110 and making a gas diffusion groove with an open upper surface on the gas conveying plate, the manufacturing difficulty is reduced, and the efficiency of gas transportation is improved. Since the number of the first gas delivery pipe is limited, the gas flow resistance to the second gas diffusion region is almost Neglected, the second gas can rapidly diffuse uniformly in the second gas diffusion region and enter the processing region through the second gas diffusion channel and the second gas outlet channel. By providing the lower surface 110b of the gas conveying plate to be curved, and simultaneously providing the cooling passage 116 close to the lower surface 110b, the pollution problem caused by the reaction of the two reaction gases just after exiting the gas outlet passage and depositing the reactant on the lower surface is reduced. .

FIG. 5 is a schematic front cross-sectional view showing the reaction gas delivery device of another embodiment raised at an angle. The reaction gas delivery device of the present embodiment is substantially the same as the structure of the above embodiment, so the same components are denoted by the same component symbols, except that the first gas outlet passage 1112 is smaller in diameter than the first gas diffusion groove in the embodiment. The plurality of aperture channels of the width form a longitudinally shaped aperture channel; the second gas outlet channel 1122 is a plurality of aperture channels having a diameter smaller than the width of the second gas diffusion slot, forming a longitudinally elongated aperture channel. The design can effectively control the gas outgassing rate, and at the same time, the phenomenon that the venting of the orifice passage produces a vortex is weak, so the reaction gas is not deposited on the lower surface of the gas conveying plate.

6 and 7 are views showing the structure of another embodiment of the present invention, wherein FIG. 6 is a front cross-sectional view of the reaction gas delivery device of the present embodiment, and FIG. 7 is the rear of the reaction gas delivery device of the present embodiment. The front view of the cross-sectional view of the embodiment is substantially the same as that of the above embodiment, so the same components are given the same component symbols, and the difference is: each longitudinal gas guide The two sides of the flow bar 50 are respectively connected with a longitudinal sub-gas guide bar. The gas guide bar 50 and the sub-gas guide bar are parallel to each other and spaced apart from each other, and a sub-gas passage is formed therebetween. The longitudinal gas-shaped gas guiding strips connected to the gas guiding strips 50 on both sides of the first gas diffusion groove are respectively 51a and 51b, and the sub-gas guiding strips 51a and the gas guiding strips 50 form a sub-gas passage 1113a. a sub-gas passage 1113b is formed between the sub-gas guide strip 51b and the gas guide strip 50, and the longitudinal sub-gas guide strips connected to the gas guide strip 50 on both sides of the second gas diffusion groove 112 are respectively 52a and 52b, sub-gas guide 1123a, 1123b is formed between the gas passage 50 the sub-sub-gas guide strip 52b is formed with gas guide bar 50 between the sub-gas passage 52a and the gas guide bar. The sub-gas passages 1113a and 1113b and the first gas outlet passage have an acute angle in a vertical cross-sectional direction, and the sub-gas passages 1123a and 1123b and the second gas outlet passage have an acute angle in a vertical cross-sectional direction. A connection between the sub-gas guiding strip and the gas guiding strip can be set to ensure the overall design of the gas conveying plate. The gas gas guiding strips are disposed on both sides of the gas guiding strip 50, which can increase the gas diffusion outlet, increase the diffusion rate of the gas from the gas diffusion groove to the processing region, and reduce the upper surface of the gas conveying plate 110 when the same gas outflow rate is required. The density of the gas diffusion groove reduces the manufacturing cost. The first gas and the second gas flow out through the sub-gas passage 1113b and the sub-gas passage 1123a, and the two gases collide with each other to quickly react on the surface of the substrate to realize processing of the substrate.

8 and 9 are views showing the structure of another embodiment of the present invention, wherein FIG. 8 is a front cross-sectional view of the reaction gas delivery device of the present embodiment, and FIG. 9 is the rear of the reaction gas delivery device of the present embodiment. The front view of the cross-sectional view of the embodiment is substantially the same as that of the above embodiment, so the same components are given the same component symbols, and the difference is: the first gas in this embodiment The gas conveying plate lower surface 110b' between the outlet passage 1111 and the second gas outlet passage 1121 is an arcuate surface recessed toward the treatment region, which is designed such that the lower surface 110b' of the gas conveying plate and the cooling passage 116 are The distance is closer. At the same time, the curved surface of the depression is far from the contact area of the two reaction gases, which can reduce the deposit of the two gases on the lower surface 110b' and reduce the probability of contamination to the reaction chamber.

FIG. 10 is a view showing a modified embodiment of the embodiment shown in FIG. 9 , wherein the first gas outlet passage 1111 and the second gas outlet passage 1121 are adjacent to the reaction region and are connected to the lower surface 110 b ′ in an arc shape. Surface 55. In this embodiment, the reaction gas flows out from the first gas outlet passage 1111 and the second gas outlet passage 1121, and is pre-reacted in the region 30 below the concave curved lower surface 110b', and is deposited on the surface of the substrate to increase the reaction rate.

11 is a view showing the structure of another embodiment of the present invention. In the present embodiment, the reaction gas delivery device is substantially the same as the structure of the above embodiment, so the same components are given the same component symbols, and the difference is: the implementation In the example, the lower surface 110b" of the gas guiding strip is a pointed cone protruding toward the processing region. With this design, the opening of the first gas outlet passage and the second gas outlet passage is gradually increased near the processing region. The eddy current effect of the reaction gas at the outlet of the two gas outlet passages is effectively reduced, the probability of deposition reaction of the two reaction gases at the lower surface 110b of the gas guide strip is reduced, and the pollution of the counter-deposited sediment particles in the reaction chamber is avoided.

12 and 13 illustrate the structure of another embodiment of the present invention. In the embodiment, the reactive gas delivery device includes at least a plurality of regions including a central region and an edge region, and the first gas in the edge region of the gas conveying plate 110. The depth of the groove of the diffusion groove 111' and the second gas diffusion groove 112' may be set to be the same or different from the depth of the groove of the first gas diffusion groove 111' and the second gas diffusion groove 112' in the central region. The vertical length of the cross section of the first gas outlet passage and the second gas outlet passage in the edge region is the same as or different from the vertical length of the first and second gas outlet passages located in the central region. For example, as shown in FIG. 12, in which the depths of the gas diffusion grooves of the central region and the edge regions are different, in the present embodiment, the first gas diffusion grooves 111' and the second gas diffusion grooves 112' of the edge regions may be disposed to have a depth greater than the center. The first gas diffusion groove 111 and the second gas diffusion groove 112 in the region are designed to reduce the depth of the gas outlet passage in the edge region by increasing the depth of the gas diffusion groove in the edge region according to the speed at which the reaction gas enters the reaction region. The speed of the reaction gas entering the reaction zone is accelerated. The design of the present invention is not limited to the depth of the gas diffusion groove in the edge region described in the embodiment, which is greater than the depth of the gas diffusion groove in the central region, and can be used as a gas outlet rate. In this way, the size of the central area and the edge area and the depth difference of the gas diffusion groove can be determined according to actual needs.

The present invention has been disclosed in the above preferred embodiments, but it is not intended to limit the invention, and it is possible to make possible variations and modifications without departing from the spirit and scope of the invention. The scope of the invention should be determined by the scope defined by the scope of the invention.

10‧‧‧Reactor
100‧‧‧Reactive gas delivery device
101‧‧‧First gas source
102‧‧‧second gas source
11‧‧‧ outer wall
110‧‧‧ gas conveying board
110a‧‧‧ upper surface
110b, 110b', 110b" ‧ ‧ lower surface
111, 111'‧‧‧First gas diffusion tank
1111, 1112, 1113‧‧‧ first gas outlet passage
1113a, 1113b, 1123a, 1123b‧‧‧ sub-gas channels
112, 112'‧‧‧Second gas diffusion tank
1121, 1122, 1123‧‧‧ second gas outlet passage
113‧‧‧ Sealing plate
1135‧‧‧ Seal
115‧‧‧Transport insertion interface
116‧‧‧Cooling pipe
1161, 1162‧‧‧ coolant inlet
118‧‧‧Second gas diffusion zone
12‧‧‧ top wall
120‧‧‧Isolation board
121‧‧‧First gas delivery tube
125‧‧‧ hole
128‧‧‧First gas diffusion zone
130‧‧‧ top board
15‧‧‧Substrate carrier
16‧‧‧Support device
30‧‧‧Under the area
50‧‧‧ gas guide strip
51a, 51b, 52a, 52b‧‧‧ gas gas guides
55‧‧‧ curved surface
x, y‧‧‧ axis

Other features, objects, and advantages of the present invention will become apparent from the Detailed Description of Description

1 is a schematic view showing a front cross-sectional surface of a reactor provided by the present invention;

2 is a front cross-sectional view showing a reaction gas delivery device of an embodiment;

FIG. 3 is a schematic front cross-sectional view showing the reaction gas delivery device of the embodiment shown in FIG. 2 raised at a certain angle; FIG.

Figure 4 is a bottom plan view showing the embodiment of Figure 2;

FIG. 5 is a schematic front cross-sectional view showing a state in which a reaction gas delivery device of the embodiment is lifted at a certain angle;

6 is a front cross-sectional view showing a reaction gas delivery device of an embodiment;

Figure 7 is a front cross-sectional view showing the reaction gas delivery device of the embodiment shown in Figure 6 raised at a certain angle;

8 is a front cross-sectional view showing a reaction gas delivery device of an embodiment;

Figure 9 is a front cross-sectional view showing the rear side of the reaction gas delivery device of the embodiment shown in Figure 8 raised at a certain angle;

Figure 10 is a view showing a modified embodiment of the embodiment shown in Figure 9;

11 is a front cross-sectional view showing a state in which a reaction gas delivery device of the embodiment is lifted at a certain angle;

Figure 12 is a front cross-sectional schematic view showing the reaction gas delivery device of the embodiment raised at an angle; and

Figure 13 is a schematic view showing the embodiment of Figure 11.

1111‧‧‧First gas outlet channel

1121‧‧‧Second gas outlet passage

20‧‧‧ Main body

50‧‧‧ gas guide strip

Claims (18)

A reaction gas delivery device for a chemical vapor deposition or epitaxial layer growth reactor, comprising: a top plate, a separator plate and a gas transport plate arranged in order from the top to the bottom, the top plate and the partition plate are spaced apart from each other Forming a first gas diffusion region therebetween, the spacer and the gas transport plate are spaced apart from each other to form a second gas diffusion region therebetween; the gas transport plate is a plate body integrally formed. The upper surface includes a plurality of longitudinally-shaped first gas diffusion grooves and a plurality of longitudinally-shaped second gas diffusion grooves arranged in parallel with each other in a horizontal direction, and each of the longitudinal lengths a first gas diffusion groove and each of the longitudinal second gas diffusion grooves are arranged at intervals, and each of the longitudinal first gas diffusion grooves is further connected with a longitudinal first gas outlet passage and Connected to each of the elongated second gas diffusion grooves and connected with a longitudinally elongated second gas outlet passage and connected to each other; each of the first gas diffusion grooves and adjacent thereto An elongated gas guiding strip extends downwardly between the elongated second gas diffusion grooves; each of the elongated gas guiding strips is internally provided with an elongated cooling pipe, each of which The lower surface of the longitudinal gas guiding strip is provided with a curved arc or a pointed cone; and each of the longitudinal first gas diffusion grooves is further connected with the first gas diffusion At least one first gas delivery tube in communication with the region. The reaction gas delivery device according to claim 1, wherein each of the elongated first gas outlet passages and each of the elongated second gas outlet passages are arranged in parallel with each other and are arranged at intervals. The reaction gas delivery device according to claim 1 or 2, wherein each of the elongated first gas outlet passages is a longitudinal slit passage. The reaction gas delivery device according to claim 1 or 2, wherein each of the elongated second gas outlet passages is a longitudinal slit passage. The reaction gas delivery device of claim 1 or 2, wherein each of the elongated first gas outlet passages comprises a plurality of orifice passages, the plurality of orifice passages integrally forming a longitudinal shape. Outlet passage. The reaction gas delivery device of claim 1 or 2, wherein each of the elongated second gas outlet passages comprises a plurality of orifice passages, the plurality of orifice passages integrally forming a longitudinal shape Outlet passage. The reaction gas delivery device of claim 1 or 2, wherein each of the elongated gas guiding strips is located in each of the elongated first gas outlet passages and each of the elongated shapes Between the second gas outlet passages. The reaction gas delivery device of claim 7, wherein the lower surface of the elongated gas guiding strip is an arcuate surface that protrudes toward the reactive gas processing region. The reaction gas delivery device of claim 7, wherein the lower surface of the elongated gas guiding strip is an arcuate surface that is recessed toward the reactive gas processing region. The reaction gas delivery device according to claim 9, wherein the curved surface of the process processing region recessed is connected to the longitudinal side first gas outlet passage and the longitudinal side second gas outlet passage. It is curved. The reaction gas delivery device of claim 1, wherein each of the elongated gas guiding strips is connected to a longitudinally-shaped gas guiding strip on each side thereof, the elongated gas guiding flow. The sub-gas guide strips of the strip and the longitudinal shape are parallel to each other and spaced apart from each other, and a sub-gas passage is formed therebetween, the sub-gas passage and the longitudinal first gas outlet passage or the elongated shape The second gas outlet passage has an acute angle in the vertical cross-sectional direction. The reaction gas delivery device of claim 1, wherein the elongated first gas outlet passage is a longitudinally narrow slit passage having a width smaller than a groove width of the longitudinal first gas diffusion groove or a diameter smaller than a plurality of hole passages of the slot width of the elongated first gas diffusion groove; the longitudinal second gas outlet passage is a longitudinal slit passage having a width smaller than a groove width of the longitudinal second gas diffusion groove or A plurality of pore passages having a diameter smaller than a groove width of the elongated second gas diffusion groove. The reaction gas delivery device of claim 1, wherein the reaction gas delivery device comprises at least an edge region and a central region, the elongated first gas outlet passage and the lengthwise length in the edge region. The vertical length of the section of the second gas outlet passage is different from or the same as the vertical length of the section of the elongated first gas outlet passage and the elongated second gas outlet passage located in the central region. The reaction gas delivery device of claim 1, wherein the reaction gas delivery device comprises at least an edge region and a central region, wherein the elongated first gas diffusion groove of the edge region has a groove depression depth greater than the a groove recess depth of the elongated first gas diffusion groove in the central region, the groove recess depth of the elongated second gas diffusion groove of the edge region being greater than the groove of the elongated second gas diffusion groove of the central region Depth depth. A chemical vapor deposition or epitaxial layer growth reactor comprising a reaction chamber in which a substrate carrier is disposed, and the substrate carrier is disposed above any one of items 1 to 14 of the patent application scope The reaction gas delivery device. A method of fabricating a gas delivery device, the method comprising the steps of: providing a plate having a thickness to form a gas delivery plate having relatively parallel upper and lower surfaces; along the upper surface of the plate Longitudinally forming a vertically elongated first gas diffusion groove and a longitudinally elongated second gas diffusion groove in a horizontal direction, the longitudinal first gas diffusion groove and the longitudinal second gas diffusion groove alternate Providing a longitudinally-shaped slit channel having a width smaller than a groove width of the longitudinal first gas diffusion groove or a diameter smaller than the longitudinal first gas diffusion groove at a groove bottom of the elongated first gas diffusion groove a plurality of hole passages having a groove width, the slit channel or the hole passage forming a first gas outlet passage, wherein a width of the groove bottom of the elongated second gas diffusion groove is smaller than a width of the longitudinal second gas diffusion groove groove a longitudinal slit passage or a plurality of orifice passages having a diameter smaller than a width of the longitudinal second gas diffusion groove, the slit passage or the orifice passage forming a second gas outlet a channel; each of the first gas outlet channel and each of the second gas outlet channels form a longitudinal gas guiding strip; and each of the gas guiding strips is provided with a longitudinal cooling channel Providing a lower surface or a tapered lower surface of each of the longitudinal gas guiding strips; a sealing plate is tightly fixed on the upper surface of the finished gas conveying plate, and the sealing is sealed The area corresponding to each of the elongated second gas diffusion grooves is hollowed out on the plate, and at least one conveying pipe insertion surface is disposed on the sealing plate corresponding to the position of each of the longitudinal first gas diffusion grooves; A spacer is disposed at a distance above the gas conveying plate, and a second gas diffusion region is formed between the partition plate and the gas conveying plate, and a small hole is disposed on the spacer plate corresponding to a position of each of the conveying pipe insertion interfaces, a first gas delivery tube is inserted into the small hole and the corresponding insertion surface of the delivery tube, and the first gas delivery tube is sealed with the small hole and the connection surface of the delivery tube; and a top of the isolation plate Distance setting a top plate forming a first diffusion region between the gas and the separator plate. The method of claim 16, wherein when the gas conveying plate is fabricated, the longitudinal first gas diffusion groove of the gas conveying plate near the edge region and the longitudinal second gas diffusion groove are disposed. The groove depth is greater than the groove depth of the elongated first gas diffusion groove and the elongated second gas diffusion groove near the central portion. The method of claim 16, wherein when the lower surface of the gas conveying plate is fabricated, the lower surface of the elongated gas guiding strip is provided with a downwardly convex curved surface or upwardly recessed. Curved surface.