TW201622831A - Coating device and accumulated gas removing method - Google Patents

Coating device and accumulated gas removing method Download PDF

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TW201622831A
TW201622831A TW104135285A TW104135285A TW201622831A TW 201622831 A TW201622831 A TW 201622831A TW 104135285 A TW104135285 A TW 104135285A TW 104135285 A TW104135285 A TW 104135285A TW 201622831 A TW201622831 A TW 201622831A
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coating
liquid
coating liquid
pipe
tank
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TW104135285A
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Chinese (zh)
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Akio Suzuki
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Toray Eng Co Ltd
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  • Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Nonlinear Science (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Degasification And Air Bubble Elimination (AREA)
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Abstract

The invention provides a coating device and accumulated gas removing method capable of easily removing the accumulated gas in the pipe. The composition of the coating device according to the invention is that: a coating liquid tank storing coating liquid and a coating unit spraying the coating liquid are connected through a plurality of pipes, and the coating liquid of the coating liquid tank is sprayed through the coating unit. The aforesaid pipes are connected through the pipe connection part making the pipes to connect with each other, and is characterized by having a counter-flow liquid-sending device, which delivers the liquid toward the aforesaid coating liquid tank side through the aforesaid pipes, between the pipe connection part and the coating unit that are arranged in the position nearest the aforesaid coating unit.

Description

塗布裝置及蓄積氣體去除方法 Coating device and method for removing accumulated gas

本發明係關於一種將塗布液塗布於基板上之塗布裝置及蓄積氣體去除方法,尤其關於一種可容易地自塗布裝置中之塗布液槽去除存在於連結塗布噴嘴之配管內之氣體之塗布裝置及蓄積氣體去除方法。 The present invention relates to a coating apparatus and an accumulated gas removing method for applying a coating liquid onto a substrate, and more particularly to a coating apparatus capable of easily removing a gas existing in a pipe connecting the coating nozzles from a coating liquid tank in the coating apparatus and Accumulated gas removal method.

液晶顯示器或電漿顯示器等平板顯示器中使用於由玻璃等所構成之基板上塗布有抗蝕劑液者(稱為塗布基板)。該塗布基板係藉由將抗蝕劑液(以下稱為塗布液)均勻地塗布之塗布裝置而形成。即,塗布裝置具有載置基板之平台、及具有噴出塗布液之噴頭部之塗布單元,藉由進行一面自噴頭部之狹縫噴嘴噴出塗布液,一面使基板與塗布單元相對移動之塗布動作,而於基板上形成特定厚度之塗布膜。 In a flat panel display such as a liquid crystal display or a plasma display, a resist liquid (referred to as a coated substrate) is applied to a substrate made of glass or the like. This coated substrate is formed by a coating apparatus that uniformly applies a resist liquid (hereinafter referred to as a coating liquid). In other words, the coating apparatus includes a stage on which the substrate is placed, and a coating unit having a head portion that ejects the coating liquid, and the coating operation of moving the substrate and the coating unit while ejecting the coating liquid from the slit nozzle of the head portion is performed. A coating film of a specific thickness is formed on the substrate.

此處,圖6係表示塗布裝置之配管102路徑之圖。供給至塗布單元100之塗布液被貯存於塗布液槽101,且通過連結塗布液槽101與塗布單元100之管狀之配管102而供給。該配管102係利用配管102接頭或閥等連接配管102彼此之配管連結部103進行連結而形成。並且,藉由利用送液加壓裝置(未圖示)對塗布液槽101進行加壓,而將塗布液槽101之塗布液向設置於配管102路徑上之泵104輸送。繼而,藉由使泵104作動,自塗布單元100之噴頭部噴出塗布液而於基板上形成塗布膜。 Here, FIG. 6 is a view showing a path of the pipe 102 of the coating device. The coating liquid supplied to the coating unit 100 is stored in the coating liquid tank 101, and is supplied by connecting the coating liquid tank 101 and the tubular pipe 102 of the coating unit 100. The pipe 102 is formed by connecting the pipe connecting portions 103 of the connecting pipes 102 such as the pipe 102 joint or the valve. Then, the coating liquid tank 101 is pressurized by a liquid feeding pressurizing device (not shown), and the coating liquid of the coating liquid tank 101 is transported to the pump 104 provided on the path of the piping 102. Then, by operating the pump 104, the coating liquid is ejected from the head portion of the coating unit 100 to form a coating film on the substrate.

一般而言,於此種塗布裝置中,進行通液步驟作為進行塗布動作之準備步驟。該通液步驟係於乾燥狀態之配管102內流動塗布液而 於配管102內填充塗布液之步驟,於第一次使塗布裝置運轉之情形、或更換塗布液之情形時進行。具體而言,使放入有塗布液之塗布液槽101內為低壓而充分地進行塗布液之脫氣處理(例如參照下述專利文獻1)。藉此,可抑制若塗布液中存在氣體,則噴出塗布液時,因噴出壓力產生變動所引起之塗布不均之產生。繼而,自塗布液槽101通過配管102向塗布單元100側輸送塗布液(通液步驟)。藉此,存在於配管102內之蓄積氣體與塗布液一同被輸送至塗布單元100(噴頭部),自噴頭部之狹縫噴嘴與塗布液一同被廢棄。繼而,最終進行將殘存於噴頭部內之氣泡去除之氣體排出處理(例如,參照下述專利文獻2)。藉此,藉由於將塗布液中之氣體去除後,進行塗布動作,而於基板上形成穩定之塗布膜。 In general, in such a coating apparatus, a liquid passing step is performed as a preparation step for performing a coating operation. This liquid passing step is to flow the coating liquid in the pipe 102 in a dry state. The step of filling the coating liquid in the piping 102 is performed when the coating apparatus is operated for the first time or when the coating liquid is changed. Specifically, the inside of the coating liquid tank 101 in which the coating liquid is placed is a low pressure, and the coating liquid is sufficiently degassed (see, for example, Patent Document 1 below). Thereby, it is possible to suppress the occurrence of uneven coating due to fluctuations in the discharge pressure when the coating liquid is ejected when a gas is present in the coating liquid. Then, the coating liquid is sent from the coating liquid tank 101 to the coating unit 100 side through the pipe 102 (passing liquid step). As a result, the accumulated gas existing in the pipe 102 is sent to the coating unit 100 (head unit) together with the coating liquid, and the slit nozzle from the head portion is discarded together with the coating liquid. Then, the gas discharge processing for removing the air bubbles remaining in the head portion is finally performed (for example, refer to Patent Document 2 below). Thereby, a coating film is formed by removing the gas in the coating liquid, and a stable coating film is formed on the substrate.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2011-139972號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2011-139972

[專利文獻2]日本專利特開2005-144376號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2005-144376

然而,僅藉由上述脫氣處理及氣體排出處理難以將塗布液中之氣體澈底地去除。即,於配管102複數個位置設置有配管102接頭或閥等配管連結部103,於該配管連結部103形成有蓄積氣體。具體而言,如圖7所示般,由於在配管連結部103存在凹凸部或彎曲部等無效空間105,故而於該無效空間105容易形成蓄積氣體106(圖7(a))。因此,於通液步驟中,存在如下問題:即便輸送經上述脫氣處理過之塗布液107,配管102內之氣體亦會逃逸至無效空間105而形成蓄積氣體106。並且,一旦於無效空間105形成蓄積氣體106,則即便於送液中蓄積氣體106亦繼續滯留於無效空間105(圖B(b)),因此即便在送液動作完成 之後進行氣體排出處理亦無法將配管102內之蓄積氣體106去除,其結果對塗布精度造成影響。 However, it is difficult to remove the gas in the coating liquid by the above-described degassing treatment and gas discharge treatment. In other words, the pipe connecting portion 103 such as the pipe 102 joint or the valve is provided at a plurality of positions of the pipe 102, and the accumulated gas is formed in the pipe connecting portion 103. Specifically, as shown in FIG. 7 , the pipe connecting portion 103 has an ineffective space 105 such as a concavo-convex portion or a curved portion. Therefore, the accumulating gas 106 is easily formed in the ineffective space 105 ( FIG. 7( a )). Therefore, in the liquid passing step, there is a problem that even if the coating liquid 107 subjected to the deaeration treatment is conveyed, the gas in the pipe 102 escapes to the ineffective space 105 to form the accumulated gas 106. When the accumulated gas 106 is formed in the dead space 105, even if the accumulated gas 106 continues to remain in the dead space 105 (Fig. B(b)) during the liquid feeding, even if the liquid feeding operation is completed After the gas discharge treatment, the accumulated gas 106 in the pipe 102 cannot be removed, and as a result, the coating accuracy is affected.

本發明係鑒於上述問題而完成者,其目的在於提供一種可容易地將配管內之蓄積氣體去除之塗布裝置及蓄積氣體去除方法。 The present invention has been made in view of the above problems, and it is an object of the invention to provide a coating apparatus and an accumulating gas removing method which can easily remove an accumulated gas in a pipe.

為了解決上述課題,本發明之塗布裝置係藉由使複數個配管連結而將貯存塗布液之塗布液槽、與噴出塗布液之塗布單元連接,上述塗布液槽之塗布液通過上述塗布單元而噴出;該塗布裝置的特徵在於:上述配管係利用連結配管彼此之配管連結部而連結,於配置於最接近上述塗布單元之位置之上述配管連結部與上述塗布單元之間,具備通過上述配管向上述塗布液槽側送液之逆流送液裝置。 In order to solve the problem, the coating apparatus of the present invention connects a coating liquid tank for storing a coating liquid to a coating unit for discharging a coating liquid by connecting a plurality of pipes, and the coating liquid of the coating liquid tank is ejected by the coating unit. In the above-mentioned piping, the piping is connected to each other by a pipe connecting portion between the connecting pipes, and the pipe connecting portion and the coating unit disposed at a position closest to the coating unit are provided to the pipe through the pipe. A countercurrent liquid feeding device for feeding liquid on the coating liquid tank side.

由於上述塗布裝置設置有逆流送液裝置,故而可將通液步驟中之殘存於配管內之蓄積氣體去除。即,於通液步驟中藉由自塗布液槽向塗布液單元側(正流方向)輸送塗布液而由塗布液充滿配管內後,利用逆流送液裝置將配管內之塗布液輸送至塗布液槽側(逆流方向)。繼而,再次如向正流方向輸送塗布液般,正流方向及逆流方向交替地重複進行塗布液之送液,最終將塗布液自塗布液單元廢棄,藉此,可將滯留於配管連結部之無效空間之蓄積氣體去除。即,因向正流方向送液而於配管連結部之無效空間(凹凸部或彎曲部)受阻而滯留之蓄積氣體藉由向逆流方向送液而自固定方向(正流方向)之推壓解除,故而阻擋被解除而向逆流方向移動。繼而,再次藉由向正流方向送液,蓄積氣體以與向逆流方向移動相應之速度進行加速,穿過凹凸部或彎曲部,與塗布液一同被向正流方向輸送。並且,由於全部之配管連結部位於較逆流送液裝置更靠近塗布液槽側,故而可於全部之配管連結部獲得因逆流而引起之上述蓄積氣體之移動的效果。即便於在一次逆流方向之送液中無法穿過凹凸部或彎曲部之情形時,亦可藉由交替地重 複進行正流方向與逆流方向之送液,而使蓄積氣體穿過凹凸部或彎曲部,從而可容易地自無效空間去除蓄積氣體。 Since the coating device is provided with a reverse flow liquid supply device, the accumulated gas remaining in the pipe in the liquid passing step can be removed. In other words, in the liquid-passing step, the coating liquid is supplied from the coating liquid tank to the coating liquid unit side (positive flow direction), and the coating liquid is filled in the piping, and then the coating liquid in the piping is transferred to the coating liquid by the reverse flow liquid feeding device. Slot side (countercurrent direction). Then, as the coating liquid is conveyed in the forward flow direction, the liquid supply of the coating liquid is alternately repeated in the forward flow direction and the reverse flow direction, and finally the coating liquid is discarded from the coating liquid unit, whereby the storage portion can be retained in the piping connection portion. The accumulation of gas in the dead space is removed. In other words, the accumulated gas which is blocked in the ineffective space (concave portion or curved portion) of the pipe connection portion due to the liquid supply in the forward flow direction is released from the fixed direction (positive flow direction) by the liquid supply in the reverse flow direction. Therefore, the blockage is released and moved in the countercurrent direction. Then, by supplying the liquid in the forward flow direction again, the accumulated gas is accelerated at a speed corresponding to the movement in the countercurrent direction, passes through the uneven portion or the bent portion, and is conveyed in the forward flow direction together with the coating liquid. Further, since all the pipe connecting portions are located closer to the coating liquid tank than the countercurrent liquid feeding device, the effect of the movement of the accumulated gas due to the backflow can be obtained in all the pipe connecting portions. That is, when it is convenient to pass through the concave or convex portion or the curved portion in the liquid feeding in the countercurrent direction, it is also possible to alternately The liquid supply in the forward flow direction and the reverse flow direction is repeated, and the accumulated gas is passed through the uneven portion or the bent portion, so that the accumulated gas can be easily removed from the dead space.

又,作為具體之上述逆流送液裝置之態樣,上述逆流送液裝置亦可構成為具有:逆流用配管連結部,其配置於設置在最接近上述塗布單元之位置之上述配管連結部與上述塗布單元之間;逆流用槽,其經由配管連接於該逆流用配管連結部並供塗布液貯存;及送液加壓裝置,其對該逆流用槽賦予加壓力而使之送液。 Further, the backflow liquid supply device may be configured to include a counterflow pipe connecting portion that is disposed at the pipe connecting portion that is disposed closest to the coating unit, and the above-described Between the coating units, a counterflow tank connected to the counterflow piping connecting portion via a pipe and storing the coating liquid, and a liquid feeding pressurizing device that applies a pressing force to the counterflow tank to supply the liquid.

例如,藉由使用三向閥作為上述逆流配管連結部,可容易地切換逆流送液裝置與塗布槽之連通,及逆流送液裝置與塗布單元之連通,故而可利用簡單之構成將塗布液之流向切換為正流方向及逆流方向。 For example, by using the three-way valve as the counterflow pipe connecting portion, the communication between the countercurrent liquid feeding device and the coating tank can be easily switched, and the countercurrent liquid feeding device and the coating unit can communicate with each other. Therefore, the coating liquid can be formed by a simple configuration. The flow direction is switched to the positive flow direction and the reverse flow direction.

又,為了解決上述課題,本發明之蓄積氣體去除方法係如下塗布裝置之蓄積氣體去除方法,該塗布裝置係藉由利用使配管彼此連結之配管連結部使複數個配管連結而將貯存塗布液之塗布液槽、與噴出塗布液之塗布單元連接,且於配置於最接近上述塗布單元之位置之上述配管連結部與上述塗布單元之間連結有通過上述配管向上述塗布液槽側送液之逆流送液裝置;該塗布裝置之蓄積氣體去除方法之特徵在於具備:正流送液步驟,其自上述塗布槽向上述塗布單元輸送至少多於上述各配管連結部之容量中之最大容量之塗布液;逆流送液步驟,其自上述略流送液裝置向上述塗布槽輸送至少多於上述各配管連結部之容量中之最大容量之塗布液;氣體排出步驟,其將存在於上述塗布單元內之氣體排出;且交替地重複至少1次以上之上述正流送液步驟與上述逆流送液步驟後,進行上述氣體排出步驟。 In order to solve the problem, the method of removing an accumulated gas according to the present invention is a method for removing an accumulated gas in a coating apparatus that connects a plurality of pipes by a pipe connecting portion that connects pipes to each other to store a coating liquid. The coating liquid tank is connected to the coating unit that ejects the coating liquid, and a counterflow that feeds the liquid to the coating liquid tank through the pipe is connected between the pipe connecting portion disposed at a position closest to the coating unit and the coating unit. a liquid supply device; the method for removing accumulated gas in the coating device, comprising: a positive flow liquid supply step of conveying a coating liquid having a maximum capacity of at least more than a capacity of each of the pipe connection portions from the coating tank to the coating unit a countercurrent liquid feeding step for conveying a coating liquid having a maximum capacity of at least more than the capacity of each of the pipe connecting portions from the above-mentioned skip flow liquid feeding device to the coating tank; and a gas discharging step which is present in the coating unit The gas is discharged; and the above-mentioned positive-flow liquid feeding step and the above-mentioned counter-current liquid feeding are alternately repeated at least one time or more After the step, the above gas discharge step is performed.

根據上述蓄積氣體去除方法,藉由交替地重複至少1次以上之正流送液步驟與逆流送液步驟,而可將通液步驟中之殘存於配管內之蓄積氣體去除。即,因正流送液步驟塗布液於配管連結部之無效空間 (凹凸部或彎曲部)受阻而形成之蓄積氣體藉由利用逆流送液步驟將塗布液向逆流方向輸送而自固定方向(正流方向)之推壓解除,故而阻擋被解除而向逆流方向移動。此時,於正流送液步驟及逆流送液步驟中,藉由輸送至少多於配管連結部中之最大容量之塗布液,利用下一送液步驟(正流送液步驟或逆流送液步驟)蓄積氣體可確實地穿過配管連結部。即,藉由再次向正流方向送液,蓄積氣體以與向逆流方向移動相應之速度進行加速,穿過凹凸部或彎曲部,與塗布液一同被向正流方向輸送。即便於在一次逆流方向之送液中無法穿過凹凸部或彎曲部之情形時,亦可藉由交替地重複進行正流方向與逆流方向之送液,而使蓄積氣體穿過凹凸部或彎曲部,從而可容易地自無效空間將蓄積氣體去除。 According to the above-described accumulated gas removal method, the accumulated gas remaining in the pipe in the liquid passing step can be removed by alternately repeating at least one of the positive flow liquid supply step and the reverse flow liquid supply step. That is, due to the ineffective space of the coating liquid in the pipe connection portion due to the positive flow liquid feeding step The accumulated gas formed by the obstruction or the curved portion is transported in the countercurrent direction by the countercurrent liquid supply step, and the pressing force is released from the fixed direction (positive flow direction), so that the blocking is released and moved in the countercurrent direction. . At this time, in the positive flow liquid supply step and the reverse flow liquid supply step, the next liquid supply step (the positive flow liquid supply step or the counter current liquid supply step) is utilized by transporting at least the coating liquid having the largest capacity in the pipe joint portion. The accumulated gas can surely pass through the pipe joint. In other words, by supplying the liquid again in the forward flow direction, the accumulated gas is accelerated at a speed corresponding to the movement in the countercurrent direction, passes through the uneven portion or the bent portion, and is conveyed in the forward flow direction together with the coating liquid. That is, when it is difficult to pass through the uneven portion or the curved portion in the liquid feeding in the countercurrent direction, the liquid supply in the positive flow direction and the reverse flow direction may be alternately repeated, and the accumulated gas may be passed through the concave or convex portion or bent. And so that the accumulated gas can be easily removed from the ineffective space.

根據本發明之塗布裝置及蓄積氣體去除方法,可容易地將配管內之蓄積氣體去除。 According to the coating apparatus and the accumulated gas removing method of the present invention, the accumulated gas in the piping can be easily removed.

1‧‧‧塗布裝置 1‧‧‧ Coating device

2‧‧‧塗布液槽 2‧‧‧ coating tank

3‧‧‧塗布單元 3‧‧‧ Coating unit

4‧‧‧配管 4‧‧‧Pipe

5‧‧‧配管連結部 5‧‧‧Pipe connection

6‧‧‧塗布液泵 6‧‧‧ Coating liquid pump

7‧‧‧逆流送液裝置 7‧‧‧Countercurrent liquid feeding device

8‧‧‧逆流用配管連結部 8‧‧‧Reflow piping connection

9‧‧‧無效空間 9‧‧‧Invalid space

10‧‧‧塗布裝置本體 10‧‧‧ Coating device body

11‧‧‧平台 11‧‧‧ platform

21‧‧‧送液加壓裝置 21‧‧‧ Liquid feeding device

22‧‧‧溢流閥 22‧‧‧Overflow valve

31‧‧‧腳部 31‧‧‧ feet

34‧‧‧噴頭部 34‧‧‧Spray Department

34a‧‧‧狹縫噴嘴 34a‧‧‧Slit nozzle

51‧‧‧T字型配管接頭 51‧‧‧T-shaped pipe joint

52‧‧‧L字型配管接頭 52‧‧‧L type pipe joint

53‧‧‧抽吸閥 53‧‧‧ suction valve

54‧‧‧噴出閥 54‧‧‧Spray valve

71‧‧‧逆流用槽 71‧‧‧Reverse flow slot

72‧‧‧送液加壓裝置 72‧‧‧ Liquid feeding device

73‧‧‧溢流閥 73‧‧‧Relief valve

81‧‧‧三向閥 81‧‧‧Three-way valve

91‧‧‧蓄積氣體 91‧‧‧ accumulating gas

100‧‧‧塗布單元 100‧‧‧ Coating unit

101‧‧‧塗布液槽 101‧‧‧ coating tank

102‧‧‧配管 102‧‧‧Pipe

103‧‧‧配管連結部 103‧‧‧Pipe connection

104‧‧‧泵 104‧‧‧ pump

105‧‧‧無效空間 105‧‧‧Invalid space

106‧‧‧蓄積氣體 106‧‧‧ accumulating gas

107‧‧‧塗布液 107‧‧‧ Coating solution

S1~S5‧‧‧步驟 S1~S5‧‧‧Steps

W‧‧‧基板 W‧‧‧Substrate

圖1係概略性地表示本發明之塗布裝置之配管系統圖。 Fig. 1 is a view schematically showing a piping system of a coating apparatus of the present invention.

圖2係塗布裝置本體之概略性之立體圖。 Fig. 2 is a schematic perspective view of the main body of the coating apparatus.

圖3係表示塗布裝置之塗布單元之腳部附近之圖。 Fig. 3 is a view showing the vicinity of the leg portion of the coating unit of the coating device.

圖4係表示配管連結部中之無效空間及蓄積氣體之圖,(a)係表示藉由塗布液填充步驟於配管內剛填充塗布液後之圖,(b)係表示已向逆流方向送液之狀態之圖,(c)係表示已向正流方向送液之狀態之圖。 Fig. 4 is a view showing the ineffective space and the accumulated gas in the pipe connecting portion, wherein (a) shows a state in which the coating liquid is filled in the pipe immediately after the coating liquid is filled, and (b) shows that the liquid is supplied in the countercurrent direction. (c) is a diagram showing a state in which liquid is supplied to the positive flow direction.

圖5係表示本發明之蓄積氣體去除方法之流程圖。 Fig. 5 is a flow chart showing the method of removing accumulated gas of the present invention.

圖6係先前之塗布裝置之配管系統圖。 Figure 6 is a piping system diagram of a prior coating apparatus.

圖7係表示先前之配管連結部中之無效空間及蓄積氣體之圖,(a)係表示藉由通液步驟於配管內剛填充塗布液後之圖,(b)係表示自(a) 之狀態進一步送液之狀態之圖。 Fig. 7 is a view showing the dead space and the accumulated gas in the previous pipe connecting portion, wherein (a) shows a pattern immediately after filling the coating liquid in the pipe by the liquid passing step, and (b) shows the case from (a). A state in which the state of the liquid is further supplied.

使用圖示對本發明之實施形態進行說明。 Embodiments of the present invention will be described using the drawings.

圖1係概略性地表示本發明之塗布裝置之配管系統圖,圖2係塗布裝置本體之概略性之立體圖,圖3係表示塗布裝置之塗布單元之腳部附近之圖。 Fig. 1 is a schematic view showing a piping system of a coating apparatus according to the present invention, Fig. 2 is a schematic perspective view of the main body of the coating apparatus, and Fig. 3 is a view showing a vicinity of a leg portion of a coating unit of the coating apparatus.

如圖1~3所示般,塗布裝置1具有貯存塗布液之塗布液槽2、及具備將自該塗布液槽2供給之塗布液噴出之塗布單元3之塗布裝置本體10。該等塗布液槽2與塗布裝置本體10係分別使複數個配管4連結而連接,配管4彼此之連接部分藉由閥或配管接頭而連結。於本發明中,將用以使配管4彼此連結之閥或配管接頭等統稱為配管連結部5。並且,於塗布液槽2與塗布單元3之間,設置有塗布液泵6,藉由在自塗布液槽2對該塗布液泵6填充所需量之塗布液之後使塗布液泵6作動,而自塗布裝置本體10之塗布單元3噴出塗布液,於固定於塗布裝置本體10之基板上形成塗布膜。 As shown in FIGS. 1 to 3, the coating device 1 includes a coating liquid tank 2 for storing a coating liquid, and a coating device main body 10 including a coating unit 3 for discharging a coating liquid supplied from the coating liquid tank 2. The coating liquid tank 2 and the coating apparatus main body 10 are connected to each other by a plurality of pipes 4, and the connecting portions of the pipes 4 are connected by a valve or a pipe joint. In the present invention, a valve or a pipe joint or the like for connecting the pipes 4 to each other is collectively referred to as a pipe connecting portion 5. Further, a coating liquid pump 6 is provided between the coating liquid tank 2 and the coating unit 3, and the coating liquid pump 6 is actuated by filling the coating liquid pump 6 with a coating liquid of a desired amount from the coating liquid tank 2. On the other hand, the coating unit 3 of the coating apparatus main body 10 ejects the coating liquid, and forms a coating film on the substrate fixed to the coating apparatus main body 10.

塗布液槽2係貯存作為形成於基板W上之塗布膜之材料之化學藥品液或抗蝕劑液等液狀物(以下稱為塗布液)者。塗布液槽2具備氣泡去除機構而可防止所貯存之塗布液內混入氣泡等。於該塗布液槽2,設置有送液加壓裝置21,藉由使該送液加壓裝置21作動,可將塗布液槽2內之塗布液向下游側輸送。即,於塗布液槽2之底面部連接有配管4,利用送液加壓裝置21對塗布液槽2內加壓,藉此通過配管4向位於下游側之塗布液泵6、塗布單元3等輸送塗布液。於本實施形態中,作為送液加壓裝置21,向塗布液槽2內供給潔淨乾燥氣體(CDA),且藉由向塗布液槽2內供給CDA,塗布液槽2內被加壓而可輸送塗布液。又,於塗布液槽2設置有溢流閥22,藉由在對塗布液槽2內加壓之後打開溢流閥22而使塗布液槽2內恢復至大氣壓,藉此將塗布液槽2內開 放。 The coating liquid tank 2 is a liquid material (hereinafter referred to as a coating liquid) such as a chemical liquid or a resist liquid which is a material of a coating film formed on the substrate W. The coating liquid tank 2 is provided with a bubble removing mechanism to prevent air bubbles or the like from being mixed into the coating liquid to be stored. In the coating liquid tank 2, a liquid feeding pressurizing device 21 is provided, and by applying the liquid feeding pressurizing device 21, the coating liquid in the coating liquid tank 2 can be transported to the downstream side. In other words, the pipe 4 is connected to the bottom surface of the coating liquid tank 2, and the inside of the coating liquid tank 2 is pressurized by the liquid feeding and pressurizing device 21, thereby passing the pipe 4 to the coating liquid pump 6, the coating unit 3, and the like located on the downstream side. The coating liquid is delivered. In the present embodiment, the liquid-feeding pressurizing device 21 supplies a clean dry gas (CDA) to the coating liquid tank 2, and by supplying CDA into the coating liquid tank 2, the coating liquid tank 2 is pressurized. The coating liquid is delivered. Further, the coating liquid tank 2 is provided with a relief valve 22, and after the pressure in the coating liquid tank 2 is opened, the overflow valve 22 is opened to return the inside of the coating liquid tank 2 to atmospheric pressure, thereby applying the inside of the coating liquid tank 2. open put.

塗布裝置本體10係於基板W上形成化學藥品液或抗蝕劑液等液狀物(以下稱為塗布液)之塗布膜者,且具備用以載置基板W之平台11、及相對於該平台11可於特定方向上移動地構成之塗布單元3。 The coating apparatus main body 10 is formed by forming a coating film of a liquid material (hereinafter referred to as a coating liquid) such as a chemical liquid or a resist liquid on the substrate W, and includes a stage 11 on which the substrate W is placed, and The platform 11 can be configured to move the coating unit 3 in a specific direction.

又,塗布單元3係於基板W上噴出塗布液而形成塗布膜者。該塗布單元3如圖2、圖3所示般具有可於X軸方向移動之腳部31及沿Y軸方向延伸之噴頭部34,噴頭部34相對於保持於平台11之基板W可相接/分離地被支持。該噴頭部34係噴出塗布液而於基板W上形成塗布膜者。本實施形態之噴頭部34係具有沿一方向延伸之形狀之柱狀構件,以與塗布單元3之腳部31之移行方向大致正交之方式設置。並且,於該噴頭部34,形成有沿長度方向延伸之狹縫噴嘴34a,供給至噴頭部34之塗布液自狹縫噴嘴34a遍及長度方向均勻地噴出。 Moreover, the coating unit 3 is a method in which a coating liquid is discharged onto the substrate W to form a coating film. As shown in FIGS. 2 and 3, the coating unit 3 has a leg portion 31 movable in the X-axis direction and a head portion 34 extending in the Y-axis direction. The head portion 34 is connectable to the substrate W held by the stage 11. / Supported separately. The head portion 34 is a person who ejects a coating liquid to form a coating film on the substrate W. The head portion 34 of the present embodiment has a columnar member having a shape extending in one direction, and is provided to be substantially orthogonal to the traveling direction of the leg portion 31 of the coating unit 3. Further, the head portion 34 is formed with a slit nozzle 34a extending in the longitudinal direction, and the coating liquid supplied to the head portion 34 is uniformly discharged from the slit nozzle 34a in the longitudinal direction.

具體而言,於噴頭部34形成有貯存塗布液之歧管,可供自塗布液供給口所供給之塗布液暫時貯存。即,塗布液供給口與配管4連接,自下述塗布液泵6所輸送之塗布液通過塗布液供給口供給至歧管內,進而藉由使塗布液泵6作動,將歧管內之塗布液通過狹縫噴嘴34a噴出。因此,藉由於自該狹縫噴嘴34a噴出塗布液之狀態下使塗布單元3於X軸方向移行,而遍及狹縫噴嘴34a之長度方向於基板W上形成固定厚度之塗布膜。 Specifically, a manifold for storing the coating liquid is formed in the head portion 34, and the coating liquid supplied from the coating liquid supply port is temporarily stored. In other words, the coating liquid supply port is connected to the pipe 4, and the coating liquid conveyed from the coating liquid pump 6 described below is supplied into the manifold through the coating liquid supply port, and the coating liquid pump 6 is actuated to coat the inside of the manifold. The liquid is ejected through the slit nozzle 34a. Therefore, the coating unit 3 is moved in the X-axis direction while the coating liquid is ejected from the slit nozzle 34a, and a coating film having a constant thickness is formed on the substrate W in the longitudinal direction of the slit nozzle 34a.

又,於噴頭部34形成有氣體排出孔,貯存於歧管之塗布液中所含之氣泡或蓄積氣體等氣體藉由進行氣體排出處理而通過氣體排出孔排出。 Further, a gas discharge hole is formed in the shower head portion 34, and a gas such as a bubble or an accumulated gas contained in the coating liquid stored in the manifold is discharged through the gas discharge hole by performing a gas discharge process.

又,塗布液泵6係將自塗布液槽2所供給之塗布液輸送至塗布裝置本體10者。該塗布液泵6與配管4連接,且經由T字型配管接頭51即配管連結部5與塗布液槽2及塗布單元3連通且連接。於本實施形態中,設置有注射泵,藉由抽吸動作收容對1片基板所需之量之塗布 液,藉由噴出動作可將塗布液輸送至塗布裝置本體10。 Moreover, the coating liquid pump 6 conveys the coating liquid supplied from the coating liquid tank 2 to the coating apparatus main body 10. The coating liquid pump 6 is connected to the pipe 4, and is connected to and connected to the coating liquid tank 2 and the coating unit 3 via the pipe coupling portion 5 which is the T-shaped pipe joint 51. In the present embodiment, a syringe pump is provided, and the amount of coating required for one substrate is accommodated by a suction operation. The liquid can be transported to the coating device body 10 by a discharge operation.

又,塗布液槽2、塗布液泵6、塗布裝置本體10(塗布單元3)係使複數個配管4連結而連接。具體而言,複數個配管4利用閥或配管接頭等配管連結部5連結。於圖1之例中,於配管4路徑呈直角彎曲之部位設置有L字型配管接頭52,於與塗布液泵6之連接部分設置有T字型配管接頭51。即,藉由視需要設置適當之配管接頭,而形成將塗布液槽2、塗布液泵6、塗布裝置本體10連通之流路。 Further, the coating liquid tank 2, the coating liquid pump 6, and the coating apparatus main body 10 (coating unit 3) connect and connect a plurality of pipes 4 to each other. Specifically, the plurality of pipes 4 are connected by a pipe connecting portion 5 such as a valve or a pipe joint. In the example of Fig. 1, an L-shaped pipe joint 52 is provided at a portion where the path of the pipe 4 is bent at a right angle, and a T-shaped pipe joint 51 is provided at a portion to be connected to the coating liquid pump 6. In other words, a flow path for connecting the coating liquid tank 2, the coating liquid pump 6, and the coating apparatus main body 10 is formed by providing an appropriate piping joint as needed.

又,於配管4之路徑設置有閥,於圖1之例中,於塗布液槽2與塗布液泵6之間設置有抽吸閥53,於塗布液泵6與塗布裝置本體10之間設置有噴出閥54。該等抽吸閥53及噴出閥54例如使用膜片閥。藉由使該抽吸閥53及噴出閥54打開或關閉動作,可切換由配管4形成之流路。例如,藉由打開抽吸閥53,關閉噴出閥54,塗布液槽2與塗布液泵6連通並連接,故而可自塗布液槽2將塗布液供給至塗布液泵6。又,藉由關閉抽吸閥53,打開噴出閥54,塗布液泵6與塗布單元3連通並連接,故而可自塗布液泵6將塗布液供給至塗布單元3。 Further, a valve is provided in the path of the pipe 4, and in the example of Fig. 1, a suction valve 53 is provided between the coating liquid tank 2 and the coating liquid pump 6, and is disposed between the coating liquid pump 6 and the coating device body 10. There is a discharge valve 54. For the suction valve 53 and the discharge valve 54, for example, a diaphragm valve is used. By opening or closing the suction valve 53 and the discharge valve 54, the flow path formed by the pipe 4 can be switched. For example, by opening the suction valve 53, the discharge valve 54 is closed, and the coating liquid tank 2 is connected to and connected to the coating liquid pump 6, so that the coating liquid can be supplied from the coating liquid tank 2 to the coating liquid pump 6. Further, by closing the suction valve 53, the discharge valve 54 is opened, and the coating liquid pump 6 is connected to and connected to the coating unit 3, so that the coating liquid can be supplied from the coating liquid pump 6 to the coating unit 3.

又,本發明之塗布裝置1具備將塗布液向逆流方向輸送之逆流送液裝置7。該逆流送液裝置7係相對於塗布液自塗布液槽2側向塗布單元3側流動之正流方向,而向自塗布單元3側向塗布液槽2側之逆流方向輸送塗布液者。該逆流送液裝置7具有逆流用槽71、對逆流用槽71加壓之送液加壓裝置72、及逆流用配管連結部8。具體而言,於噴出閥54與塗布單元3之間設置有逆流用配管連結部8,且自該逆流用配管連結部8經由配管4連通並連接逆流用槽71。藉此,逆流用槽71之塗布液通過配管4被輸送至塗布液槽2側。 Moreover, the coating apparatus 1 of the present invention is provided with a countercurrent liquid feeding device 7 that transports the coating liquid in the countercurrent direction. The counter-current liquid supply device 7 transports the coating liquid to the counterflow direction from the coating unit 3 side to the coating liquid tank 2 side with respect to the positive flow direction in which the coating liquid flows from the coating liquid tank 2 side toward the coating unit 3 side. The reverse flow liquid supply device 7 includes a reverse flow tank 71, a liquid supply pressurizing device 72 for pressurizing the reverse flow tank 71, and a counterflow pipe connecting portion 8. Specifically, the counterflow pipe connecting portion 8 is provided between the discharge valve 54 and the coating unit 3, and the counterflow pipe connecting portion 8 communicates with the counterflow pipe connecting portion 8 via the pipe 4 to connect the counterflow groove 71. Thereby, the coating liquid of the counterflow tank 71 is conveyed to the coating liquid tank 2 side through the piping 4.

逆流用槽71係與上述塗布液槽2相同之構成,係貯存塗布液者。與塗布液槽2同樣地,具備氣泡去除機構而可防止所貯存之塗布液內混入氣泡等。並且,於該逆流用槽71,亦設置有送液加壓裝置72,藉 由使該送液加壓裝置72作動,可將逆流用槽71內之塗布液向上流側輸送。即,於塗布液槽2之底面部連接有配管4,藉由利用送液加壓裝置72對塗布液槽2內進行加壓,可通過配管4向位於上流側之塗布液槽2側輸送塗布液(使其逆流)。又,於逆流用槽71設置有溢流閥73,藉由對逆流用槽71內加壓後打開溢流閥73而使逆流用槽71內恢復至大氣壓,藉此逆流用槽71內被開放。 The counterflow tank 71 is the same as the above-described coating liquid tank 2, and is a storage liquid. Similarly to the coating liquid tank 2, a bubble removing mechanism is provided to prevent air bubbles or the like from being mixed into the coating liquid to be stored. Further, in the counterflow tank 71, a liquid supply pressurizing device 72 is also provided, When the liquid feeding and pressurizing device 72 is actuated, the coating liquid in the counterflow tank 71 can be transported to the upstream side. In other words, the pipe 4 is connected to the bottom surface of the coating liquid tank 2, and the inside of the coating liquid tank 2 is pressurized by the liquid feeding and pressurizing device 72, and can be conveyed and coated to the coating liquid tank 2 on the upstream side by the pipe 4. Liquid (to make it countercurrent). In the counterflow tank 71, the overflow valve 73 is provided, and after the counterflow tank 71 is pressurized, the relief valve 73 is opened to return the inside of the counterflow tank 71 to the atmospheric pressure, whereby the counterflow tank 71 is opened. .

又,逆流用配管連結部8係將連接至逆流用槽71之配管4、及將塗布液槽2及塗布單元3連接之配管4連通並連接,對連接逆流用槽71與塗布液槽2之流路、及連接逆流用槽71與塗布單元3之流路進行切換者。該逆流用配管連結部8與上述配管連結部5於連結配管方面共通,但於本發明中為不同之概念,僅為使逆流用槽71連接者。 Further, the pipe connecting portion 8 for the counterflow is connected and connected to the pipe 4 connected to the counterflow groove 71 and the pipe 4 connecting the coating liquid tank 2 and the coating unit 3, and is connected to the counter flow tank 71 and the coating liquid tank 2. The flow path and the flow path connecting the counterflow tank 71 and the coating unit 3 are switched. The counterflow pipe connecting portion 8 and the pipe connecting portion 5 are common to the connecting pipe. However, in the present invention, the concept is different, and only the counterflow groove 71 is connected.

該逆流用配管連結部8配置於設置在最接近塗布單元3之位置之噴出閥54(配管連結部5)與塗布單元3之間配置。即,於自逆流用槽71向塗布液槽2逆流之情形時,自逆流用槽71所輸送之塗布液係通過逆流用配管連結部8且通過位於較該逆流用配管連結部8更靠上流側(塗布液槽2側)之全部之配管連結部5而被輸送至塗布液槽2。 The counterflow pipe connecting portion 8 is disposed between the discharge valve 54 (pipe connecting portion 5) provided at a position closest to the coating unit 3 and the coating unit 3. In other words, when the counter-flowing tank 71 flows back to the coating liquid tank 2, the coating liquid conveyed from the counterflow tank 71 passes through the counterflow piping connecting portion 8 and is located above the counterflow piping connecting portion 8 All the pipe connecting portions 5 on the side (the side of the coating liquid tank 2) are conveyed to the coating liquid tank 2.

該逆流用配管連結部8於本實施形態中使用三向閥81,藉由該三向閥81而將逆流用槽71、塗布單元3、塗布液槽2連通並連接。即,藉由操作三向閥81,可切換逆流用槽71與塗布單元3之連接、及逆流用槽71與塗布液槽2之連接。再者,該逆流用配管連結部8亦可將T字型配管接頭51與膜片閥組合。即,於T字型配管接頭51分別連接來自塗布液槽2、塗布單元3、逆流用槽71之配管4,於逆流用槽71與T字型配管接頭51之間設置diamondphragm閥,藉此可切換逆流用槽71與塗布單元3之連接、及逆流用槽71與塗布液槽2之連接。 In the counterflow pipe connecting portion 8, the three-way valve 81 is used in the present embodiment, and the counterflow groove 71, the coating unit 3, and the coating liquid tank 2 are connected and connected by the three-way valve 81. In other words, by operating the three-way valve 81, the connection between the counterflow groove 71 and the coating unit 3, and the connection between the counterflow groove 71 and the coating liquid tank 2 can be switched. Further, the counterflow pipe connecting portion 8 can also combine the T-shaped pipe joint 51 and the diaphragm valve. In other words, the pipe 4 from the coating liquid tank 2, the coating unit 3, and the counterflow groove 71 is connected to the T-shaped pipe joint 51, and a diamondphragm valve is provided between the reverse flow groove 71 and the T-shaped pipe joint 51. The connection between the counterflow groove 71 and the coating unit 3, and the connection between the counterflow groove 71 and the coating liquid tank 2 are switched.

其次,基於圖5所示之流程圖對該塗布裝置1之蓄積氣體去除方法進行說明。該蓄積氣體去除可去除自全部之配管4被乾燥之狀態第 一次向塗布裝置1供給塗布液之情形時、或更換塗布液之情形時滯留於配管4內之蓄積氣體。 Next, the method of removing the accumulated gas of the coating device 1 will be described based on the flowchart shown in FIG. 5. The accumulated gas removal can be removed from the state in which all the pipes 4 are dried. When the coating liquid is supplied to the coating device 1 once, or when the coating liquid is exchanged, the accumulated gas remaining in the pipe 4 is accumulated.

首先,藉由步驟S1進行塗布液填充步驟(通液步驟)。該塗布液填充步驟係用以利用塗布液填滿充滿空氣之配管4內之處理步驟。於本實施形態中,將自逆流用槽71起至噴出閥54之流路之空氣排出後,階段性地使自塗布液槽2起至三向閥81之流路之空氣排出。具體而言,對貯存於逆流用槽71之塗布液進行脫氣處理後,將三向閥81向逆流方向(自逆流用槽71向塗布單元3方向關閉,向塗布液槽2方向打開)打開,將噴出閥54及抽吸閥53設為打開狀態並使逆流用槽71之加壓送液裝置作動而自逆流用槽71向塗布液槽2側(逆流方向)輸送塗布液。藉此,塗布液自逆流用槽71經由三向閥81向塗布液槽2側被輸送。此時,配管4內之空氣被塗布液向逆流方向推壓而向塗布液槽2排出。繼而,確認配管4內之送液狀況,於自逆流用槽71起至噴出閥54之配管4內填充有塗布液之狀態下,使逆流用槽71之加壓送液裝置停止後,將溢流閥73打開而使逆流用槽71向大氣開放。 First, the coating liquid filling step (liquid passing step) is performed by step S1. This coating liquid filling step is a processing step for filling the inside of the air-filled pipe 4 with the coating liquid. In the present embodiment, the air from the flow-reverse groove 71 to the flow path of the discharge valve 54 is discharged, and then the air from the coating liquid tank 2 to the flow path of the three-way valve 81 is intermittently discharged. Specifically, after the degassing treatment is performed on the coating liquid stored in the counterflow tank 71, the three-way valve 81 is opened in the counterflow direction (closed from the counterflow tank 71 in the direction of the coating unit 3, and opened in the direction of the coating liquid tank 2). The discharge valve 54 and the suction valve 53 are opened, and the pressurized liquid supply device of the reverse flow tank 71 is actuated to transport the coating liquid from the counterflow tank 71 to the coating liquid tank 2 side (countercurrent direction). Thereby, the coating liquid is conveyed from the counterflow tank 71 to the coating liquid tank 2 side via the three-way valve 81. At this time, the air in the pipe 4 is pressed by the coating liquid in the countercurrent direction and discharged to the coating liquid tank 2. Then, the liquid supply state in the piping 4 is confirmed, and the pressurized liquid supply device of the reverse flow tank 71 is stopped in a state where the coating liquid is filled in the piping 4 from the reverse flow tank 71 to the discharge valve 54. The flow valve 73 is opened to open the counterflow groove 71 to the atmosphere.

其次,向塗布液槽2供給塗布液並對貯存於塗布液槽2之塗布液進行脫氣處理後,將三向閥81以塗布液自塗布液槽2向塗布單元3側流動之方式進行切換。繼而,使塗布液槽2之加壓送液裝置作動,將塗布液向正流方向輸送。即,於因塗布液被向之前的逆流方向輸送而未由塗布液填滿之部分、即較噴出閥54更靠塗布液槽2側存在多量空氣,但是藉由將塗布液自塗布液槽2向正流方向輸送,塗布液與空氣一同經由塗布單元3之歧管自狹縫噴嘴排出。藉此,於自塗布液槽2起至逆流用槽71之配管4填充有塗布液。並且,使塗布液轉句之加壓送液裝置停止後,打開溢流閥22而使塗布液槽2向大氣開放。 Then, the coating liquid is supplied to the coating liquid tank 2, and the coating liquid stored in the coating liquid tank 2 is subjected to a degassing treatment, and then the three-way valve 81 is switched so that the coating liquid flows from the coating liquid tank 2 to the coating unit 3 side. . Then, the pressurized liquid supply device of the coating liquid tank 2 is operated to transport the coating liquid in the forward flow direction. In other words, a large amount of air is present on the side of the coating liquid tank 2 from the portion where the coating liquid is not transported by the coating liquid in the reverse flow direction in the previous direction, but the coating liquid is applied from the coating liquid tank 2 In the forward flow direction, the coating liquid is discharged from the slit nozzle through the manifold of the coating unit 3 together with the air. Thereby, the coating liquid 4 from the coating liquid tank 2 to the counterflow tank 71 is filled with the coating liquid. Then, after the pressurized liquid feeding device that turns the coating liquid is stopped, the overflow valve 22 is opened to open the coating liquid tank 2 to the atmosphere.

其次,藉由步驟S2進行逆流送液步驟。藉由該逆流送液步驟及接下來之正流送液步驟而進行配管4內之蓄積氣體之去除。即,藉由 上述塗布液填充步驟,存在於配管4內之空氣被去除而自塗布液槽2起至逆流用槽71之配管4內大體上由塗布液填充。然而,由於在配管連結部5之無效空間容易滯留空氣,略微形成蓄積氣體,故而必須排除該蓄積氣體。 Next, a countercurrent liquid feeding step is performed by step S2. The accumulation gas in the pipe 4 is removed by the reverse flow liquid supply step and the subsequent positive flow liquid supply step. That is, by In the coating liquid filling step, the air existing in the pipe 4 is removed, and the inside of the pipe 4 from the coating liquid tank 2 to the counterflow tank 71 is substantially filled with the coating liquid. However, since the air is easily trapped in the dead space of the pipe connecting portion 5 and the accumulated gas is slightly formed, it is necessary to exclude the accumulated gas.

具體而言,將三向閥81以設定為逆流方向而自逆流用槽71向塗布液槽2流動塗布液之方式進行設定。繼而,使逆流用槽71之送液加壓裝置72作動而將塗布液向逆流方向輸送。此時,關於送液量,乃輸送多於配管連結部5之最大容量之塗布液。此處,配管連結部5之容量係自作為配管連結部5之配管接頭或閥等之與一側之配管4之連結部分起至與另一側之配管4之連結部分為止之容量。並且,輸送多於配管4路徑所使用之全部之配管連結部5中之最多容量之塗布液。於圖1之例中,輸送噴出閥54、抽吸閥53、各配管接頭中之最多容量之塗布液。藉此,滯留於無效空間之蓄積氣體之氣體向逆流方向移動。 Specifically, the three-way valve 81 is set so as to flow the coating liquid from the counterflow groove 71 to the coating liquid tank 2 in the countercurrent direction. Then, the liquid feeding and pressurizing device 72 of the counterflow tank 71 is operated to transport the coating liquid in the countercurrent direction. At this time, the amount of liquid to be supplied is a coating liquid that is transported more than the maximum capacity of the pipe connecting portion 5. Here, the capacity of the pipe connecting portion 5 is the capacity from the connection portion of the pipe joint or the valve of the pipe connecting portion 5 to the connection portion with the pipe 4 of the other side. Further, the coating liquid having the largest capacity among all the pipe connecting portions 5 used in the path of the pipe 4 is transported. In the example of Fig. 1, the discharge valve 54, the suction valve 53, and the maximum volume of the coating liquid in each of the pipe joints are conveyed. Thereby, the gas of the accumulated gas remaining in the ineffective space moves in the countercurrent direction.

其次,藉由步驟S3進行正流送液步驟。具體而言,使逆流用槽71之送液加壓裝置72停止,打開溢流閥73後,將三向閥81以向正流方向、即自塗布液槽2向塗布單元3側流動之方式進行切換。繼而,使塗布液槽2之送液加壓裝置21作動,將塗布液向正流方向輸送。關於送液量,輸送多於配管連結部5之最大容量之塗布液。藉此,可自配管連結部5之無效空間將蓄積氣體91去除。即,如圖4所示般,藉由塗布液填充步驟輸送塗布液,若於配管連結部5之無效空間9形成蓄積氣體91,則蓄積氣體91於無效空間9受阻,即便向塗布液填充步驟中所輸送之方向進行送液,亦由於附加於蓄積氣體91之推壓方向相同而無法穿過無效空間9,而於該位置滯留蓄積氣體91(圖4(a))。因此,藉由利用逆流送液步驟於配管4內將塗布液向逆流方向輸送,而解除形成於無效空間9之蓄積氣體91之正流方向之推壓力,輸送多於配管連結部5中之最多容量之塗布液,藉此,向逆流方向上遠離無效空間9之位置 移動,無效空間9中之阻擋被解除(圖4(b))。繼而,藉由利用正流送液步驟於配管4內將塗布液向正流方向輸送,自無效空間9移動之蓄積氣體91向正流方向移動。此時,藉由輸送多於配管連結部5中之最多容量之塗布液,於逆流送液步驟中移動之蓄積氣體91與塗布液一同被向較之前阻擋之無效空間9之位置靠近正流方向側輸送,藉此可穿過之前阻擋之無效空間9(圖4(c))。又,由於逆流送液裝置7之三向閥81配置於設置在最接近塗布單元3之位置之配管連結部5與塗布單元3之間,且全部之配管連結部5位於較三向閥81更靠近塗布單元3側,故而於全部之配管連結部5中蓄積氣體91可穿過之前阻擋之無效空間9。並且,即便於在三向閥81(逆流用配管連結部8)之無效空間9形成有蓄積氣體91之情形時,亦可與配管連結部5同樣地獲得上述效果。 Next, a positive flow liquid feeding step is performed by step S3. Specifically, the liquid feeding and pressurizing device 72 of the counterflow tank 71 is stopped, and after the relief valve 73 is opened, the three-way valve 81 is flown in the positive flow direction, that is, from the coating liquid tank 2 to the coating unit 3 side. Switch. Then, the liquid supply pressurizing device 21 of the coating liquid tank 2 is operated to transport the coating liquid in the forward flow direction. Regarding the liquid supply amount, the coating liquid having a larger capacity than the maximum capacity of the pipe connecting portion 5 is transported. Thereby, the accumulated gas 91 can be removed from the dead space of the pipe connecting portion 5. In other words, as shown in FIG. 4, the coating liquid is transported by the coating liquid filling step, and when the accumulated gas 91 is formed in the dead space 9 of the pipe connecting portion 5, the accumulated gas 91 is blocked in the dead space 9, even if the coating liquid is filled. In the direction in which the medium is conveyed, the liquid supply is performed, and since the pressing direction added to the accumulated gas 91 is the same, the ineffective space 9 cannot be passed, and the accumulated gas 91 is retained at the position (Fig. 4(a)). Therefore, by applying the countercurrent liquid supply step to the counterflow direction in the pipe 4, the pressing force in the positive flow direction of the accumulating gas 91 formed in the ineffective space 9 is released, and the transport is more than the most in the pipe connecting portion 5. a coating liquid of a capacity, whereby the position in the countercurrent direction away from the ineffective space 9 Moving, the block in the invalid space 9 is released (Fig. 4(b)). Then, the coating liquid is conveyed in the forward flow direction in the pipe 4 by the positive flow liquid supply step, and the accumulated gas 91 moved from the ineffective space 9 is moved in the forward flow direction. At this time, by transporting the coating liquid having the largest capacity among the pipe connecting portions 5, the accumulated gas 91 moved in the counter-current liquid feeding step is brought closer to the positive flow direction toward the position of the previously blocked empty space 9 together with the coating liquid. The side is conveyed, whereby the previously ineffective void space 9 can be passed (Fig. 4(c)). Further, the three-way valve 81 of the counter-current liquid supply device 7 is disposed between the pipe connecting portion 5 provided at the position closest to the coating unit 3 and the coating unit 3, and all the pipe connecting portions 5 are located closer to the three-way valve 81. The gas 91 is accumulated in the entire pipe joint portion 5 so as to pass through the previously ineffective space 9 blocked. In addition, even when the accumulated gas 91 is formed in the dead space 9 of the three-way valve 81 (reverse flow pipe connecting portion 8), the above-described effects can be obtained in the same manner as the pipe connecting portion 5.

其次,對無效空間9中有無氣泡進行確認(步驟S4)。藉由上述逆流送液步驟及正流送液步驟,於在無效空間9存在氣泡之情形時,於步驟S4向No(否)方向行進,再次進行步驟S2之逆流送液步驟及步驟S3之正流送液步驟,反覆操作直至無效空間9之氣泡消失為止。並且,若於無效空間9氣泡消失則於步驟S4向Yes(是)方向行進,進行下一步驟之氣體排出步驟。再者,該確認步驟可以目視進行,亦可以設置感測器等來檢測無效空間9中有無氣泡之方式構成而進行確認。又,若根據事先之塗布裝置1之調整試驗可知藉由進行規定次數之逆流送液步驟及正流送液步驟而可自無效空間9去除氣泡,則亦可在重複該次數之逆流送液步驟及正流送液步驟後進入下一次步驟。藉由如此般重複複數次,即便於1次逆流送液步驟及正流送液步驟中,蓄積氣體91於無效空間9受阻之情形時,亦可提高蓄積氣體91穿過無效空間9之可能性並可將滯留於無效空間9之蓄積氣體91去除。 Next, it is confirmed whether or not there is a bubble in the invalid space 9 (step S4). When the air bubbles are present in the dead space 9 by the countercurrent liquid feeding step and the normal liquid feeding step, the step S4 proceeds to the No direction, and the reverse flow feeding step of the step S2 and the step S3 are performed again. The liquid feeding step is repeated until the bubbles of the dead space 9 disappear. Then, if the bubble disappears in the dead space 9, the process proceeds in the Yes direction in step S4, and the gas discharge step in the next step is performed. Further, the confirmation step may be performed visually, or may be performed by providing a sensor or the like to detect the presence or absence of a bubble in the dead space 9. Further, according to the adjustment test of the coating apparatus 1 in advance, it is understood that the bubble can be removed from the dead space 9 by performing the reverse flow liquid supply step and the normal flow liquid supply step a predetermined number of times, and the reverse flow liquid supply step of repeating the number of times can be repeated. And after the positive flow step, the next step is entered. By repeating the plurality of times as described above, even in the case of the reverse flow liquid supply step and the positive flow liquid supply step, the accumulation gas 91 can be prevented from passing through the dead space 9 when the dead space 9 is blocked. The accumulated gas 91 retained in the dead space 9 can be removed.

其次,藉由步驟S5進行氣體排出步驟。將三向閥81以向正流方向流動之方式進行切換後,自塗布液槽2輸送塗布液,自塗布單元3之 狹縫噴嘴使塗布液排出。此時,上述逆流送液步驟及正流送液步驟中已穿過無效空間9之蓄積氣體91與塗布液一同被輸送至塗布單元3之歧管,並自狹縫噴嘴或氣體排出孔排出。藉此,可於自塗布液槽2至塗布單元3之配管4中形成無蓄積氣體91之狀態。 Next, the gas discharge step is performed by step S5. After the three-way valve 81 is switched in the forward flow direction, the coating liquid is transferred from the coating liquid tank 2 from the coating unit 3 The slit nozzle discharges the coating liquid. At this time, the accumulating gas 91 having passed through the dead space 9 in the countercurrent liquid feeding step and the normal flow liquid feeding step is sent to the manifold of the coating unit 3 together with the coating liquid, and is discharged from the slit nozzle or the gas discharge hole. Thereby, the state in which the accumulated gas 91 is not formed can be formed in the piping 4 from the coating liquid tank 2 to the coating unit 3.

如上所述,藉由至少交替地重複1次以上之正流送液步驟與逆流送液步驟,而可將通液步驟中殘存於配管4內之蓄積氣體91去除。即,因正流送液步驟而塗布液於配管連結部5之無效空間9(凹凸部或彎曲部)受阻而形成之蓄積氣體91藉由利用逆流送液步驟將塗布液向逆流方向輸送,而自固定方向(正流方向)之推壓解除,故而阻擋被解除而向逆流方向移動。此時,藉由於正流送液步驟及逆流送液步驟中輸送至少多於配管連結部5中之最大容量之塗布液,而可利用接下來之送液步驟(正流送液步驟或逆流送液步驟)使蓄積氣體91確實地穿過配管連結部5。即,藉由再次向正流方向送液,蓄積氣體91以與向逆流方向移動相應之速度進行加速,穿過凹凸部或彎曲部,與塗布液一同被向正流方向輸送。即便於在一次之逆流方向之送液中無法穿過凹凸部或彎曲部之情形時,亦可藉由交替地重複進行正流方向與逆流方向之送液而使蓄積氣體91穿過凹凸部或彎曲部,從而可容易地自無效空間9去除蓄積氣體91。 As described above, the accumulating gas 91 remaining in the pipe 4 in the liquid passing step can be removed by repeating the positive flow liquid supply step and the reverse flow liquid supply step at least once alternately. In other words, the accumulating gas 91 formed by the coating liquid in the dead space 9 (concavo-convex portion or curved portion) of the pipe connecting portion 5 is prevented from being transported in the countercurrent direction by the countercurrent liquid feeding step. Since the pressing in the fixed direction (positive flow direction) is released, the blocking is released and moved in the reverse flow direction. At this time, by supplying the coating liquid having at least more than the maximum capacity in the pipe connecting portion 5 in the normal flow liquid feeding step and the reverse flow liquid feeding step, the next liquid feeding step (positive flow liquid feeding step or reverse flow feeding) can be utilized. In the liquid step), the accumulated gas 91 is surely passed through the pipe joint portion 5. In other words, by accumulating the liquid in the forward flow direction again, the accumulated gas 91 is accelerated at a speed corresponding to the movement in the countercurrent direction, passes through the uneven portion or the curved portion, and is conveyed in the forward flow direction together with the coating liquid. That is, in the case where it is not possible to pass through the uneven portion or the curved portion in the liquid feeding in the countercurrent direction, the accumulating gas 91 can be passed through the uneven portion or by alternately repeating the liquid feeding in the positive flow direction and the reverse flow direction. The bent portion is such that the accumulated gas 91 can be easily removed from the dead space 9.

又,於上述實施形態中,對於塗布液填充步驟之後,按照逆流送液步驟、正流送液步驟之順序進行之例進行說明,但亦可於塗布液填充步驟之後,按照正流送液步驟、逆流送液步驟之順序進行。 Further, in the above embodiment, after the coating liquid filling step, the reverse flow liquid feeding step and the normal flow liquid feeding step are sequentially described. However, after the coating liquid filling step, the positive liquid feeding step may be followed. The sequence of the countercurrent liquid feeding step is performed.

又,於上述實施形態中,對藉由重複步驟進行複數次逆流送液步驟與正流送液步驟之例進行說明,但於藉由僅進行1次逆流送液步驟與正流送液步驟而可將蓄積氣體91去除之情形時,亦可僅進行1次逆流送液步驟與正流送液步驟,省略上述步驟S4之確認步驟。 Further, in the above embodiment, an example in which a plurality of countercurrent liquid supply steps and a positive flow liquid supply step are performed by repeating the steps will be described, but by performing only one countercurrent liquid supply step and a positive current liquid supply step. When the accumulated gas 91 can be removed, only the reverse flow liquid supply step and the normal flow liquid supply step may be performed once, and the confirmation step of the above step S4 may be omitted.

1‧‧‧塗布裝置 1‧‧‧ Coating device

2‧‧‧塗布液槽 2‧‧‧ coating tank

3‧‧‧塗布單元 3‧‧‧ Coating unit

4‧‧‧配管 4‧‧‧Pipe

5‧‧‧配管連結部 5‧‧‧Pipe connection

6‧‧‧塗布液泵 6‧‧‧ Coating liquid pump

7‧‧‧逆流送液裝置 7‧‧‧Countercurrent liquid feeding device

8‧‧‧逆流用配管連結部 8‧‧‧Reflow piping connection

10‧‧‧塗布裝置本體 10‧‧‧ Coating device body

21‧‧‧送液加壓裝置 21‧‧‧ Liquid feeding device

22‧‧‧溢流閥 22‧‧‧Overflow valve

51‧‧‧T字型配管接頭 51‧‧‧T-shaped pipe joint

52‧‧‧L字型配管接頭 52‧‧‧L type pipe joint

53‧‧‧抽吸閥 53‧‧‧ suction valve

54‧‧‧噴出閥 54‧‧‧Spray valve

71‧‧‧逆流用槽 71‧‧‧Reverse flow slot

72‧‧‧送液加壓裝置 72‧‧‧ Liquid feeding device

73‧‧‧溢流閥 73‧‧‧Relief valve

81‧‧‧三向閥 81‧‧‧Three-way valve

W‧‧‧基板 W‧‧‧Substrate

Claims (3)

一種塗布裝置,其係藉由使複數個配管連結而將貯存塗布液之塗布液槽、與噴出塗布液之塗布單元連接,上述塗布液槽之塗布液通過上述塗布單元而噴出;其特徵在於:上述配管係藉由連結配管彼此之配管連結部而連結,於配置於最接近上述塗布單元之位置之上述配管連結部與上述塗布單元之間,具備通過上述配管向上述塗布液槽側送液之逆流送液裝置。 A coating apparatus that connects a coating liquid tank for storing a coating liquid to a coating unit that discharges a coating liquid by connecting a plurality of pipes, and the coating liquid of the coating liquid tank is discharged by the coating unit; The piping is connected by a pipe connecting portion between the connecting pipes, and the pipe connecting portion and the coating unit disposed at a position closest to the coating unit are provided with liquid to the coating liquid tank side through the pipe. Countercurrent liquid delivery device. 一種塗布裝置,其特徵在於:上述逆流送液裝置具有:逆流用配管連結部,其配置於設置在最接近上述塗布單元之位置之上述配管連結部與上述塗布單元之間;逆流用槽,其經由配管連接於該逆流用配管連結部且供塗布液貯存;及送液加壓裝置,其對該逆流用槽賦予加壓力而使之送液。 In a coating device, the countercurrent liquid supply device includes a counterflow pipe connecting portion disposed between the pipe connecting portion provided at a position closest to the coating unit and the coating unit, and a counterflow groove. The pipe for the counterflow pipe is connected to the counterflow pipe connecting portion via a pipe, and the liquid feeding pressurizing device applies a pressing force to the counterflow groove to supply the liquid. 一種塗布裝置之蓄積氣體去除方法,該塗布裝置係藉由利用使配管彼此連結之配管連結部使複數個配管連結而將貯存塗布液之塗布液槽、與噴出塗布液之塗布單元連接,且於配置於最接近上述塗布單元之位置之上述配管連結部與上述塗布單元之間,連結有通過上述配管向上述塗布液槽側送液之逆流送液裝置;其特徵在於具備:正流送液步驟,其自上述塗布槽向上述塗布單元,輸送至少多於各上述配管連結部之容量中之最大容量之塗布液;逆流送液步驟,其自上述逆流送液裝置向上述塗布槽,輸送至少多於各上述配管連結部之容量中之最大容量之塗布液;及氣體排出步驟,其將存在於上述塗布單元內之氣體排出;且於交替地重複至少1次以上之上述正流送液步驟與上述逆流送液步驟之後,進行上述氣體排出步驟。 A method for removing an accumulated gas in a coating device, wherein the coating device is connected to a coating unit for discharging a coating liquid by connecting a plurality of pipes by a pipe connecting portion that connects the pipes to each other, and A countercurrent liquid feeding device that supplies liquid to the coating liquid tank side through the pipe is connected between the pipe connecting portion disposed at a position closest to the coating unit and the coating unit, and is characterized in that: a positive flow feeding step is provided And conveying a coating liquid having a maximum capacity of at least more than the capacity of each of the pipe connecting portions from the coating tank to the coating unit; and a countercurrent liquid feeding step of conveying at least a plurality of the countercurrent liquid feeding device to the coating tank a coating liquid having a maximum capacity among the capacities of the respective pipe connecting portions; and a gas discharging step of discharging the gas existing in the coating unit; and repeating the positive current feeding step at least one time or more After the countercurrent liquid feeding step, the gas discharging step is performed.
TW104135285A 2014-11-05 2015-10-27 Coating device and accumulated gas removing method TW201622831A (en)

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JP2018008206A (en) * 2016-07-13 2018-01-18 東レエンジニアリング株式会社 Coating pretreatment method
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JP6808696B2 (en) * 2018-09-14 2021-01-06 株式会社Screenホールディングス Feeding device, coating device, and feeding method
CN117162358B (en) * 2023-11-02 2024-03-01 中电科风华信息装备股份有限公司 Full-automatic feeding and discharging bubble removing machine

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