TW201619593A - Illumination intensity control apparatus and method, and optical inspection system - Google Patents

Illumination intensity control apparatus and method, and optical inspection system Download PDF

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TW201619593A
TW201619593A TW104138937A TW104138937A TW201619593A TW 201619593 A TW201619593 A TW 201619593A TW 104138937 A TW104138937 A TW 104138937A TW 104138937 A TW104138937 A TW 104138937A TW 201619593 A TW201619593 A TW 201619593A
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illumination
illumination source
pulses
intensity control
voltage supply
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TW104138937A
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TWI756165B (en
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歐佛 沙飛爾
亞柯 達維帝
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奧寶科技股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21SNON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S2/00Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction
    • F21S2/005Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction of modular construction
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V23/00Arrangement of electric circuit elements in or on lighting devices
    • F21V23/04Arrangement of electric circuit elements in or on lighting devices the elements being switches
    • F21V23/0442Arrangement of electric circuit elements in or on lighting devices the elements being switches activated by means of a sensor, e.g. motion or photodetectors
    • F21V23/0464Arrangement of electric circuit elements in or on lighting devices the elements being switches activated by means of a sensor, e.g. motion or photodetectors the sensor sensing the level of ambient illumination, e.g. dawn or dusk sensors
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21YINDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2115/00Light-generating elements of semiconductor light sources
    • F21Y2115/10Light-emitting diodes [LED]
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21YINDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2115/00Light-generating elements of semiconductor light sources
    • F21Y2115/30Semiconductor lasers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/061Sources
    • G01N2201/06113Coherent sources; lasers
    • G01N2201/0612Laser diodes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/062LED's
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B20/00Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
    • Y02B20/30Semiconductor lamps, e.g. solid state lamps [SSL] light emitting diodes [LED] or organic LED [OLED]

Abstract

An optical inspection system and an illumination intensity control apparatus and method for the same are provided, The apparatus (10) includes a solid state illumination source (15) for inspection of objects, and circuitry (20, 64, 68, 22, 43, 45, 50, 55) that is configured to perform an initial calibration process that selects a fixed voltage supply level for application to the solid state illumination source, and to apply to the solid state illumination source a sequence of voltage pulses (110) having the selected fixed voltage supply level, thus causing the solid state illumination source to generate a sequence of fixed-intensity illumination pulses for inspecting the objects.

Description

照射強度控制設備與方法、以及光學檢驗系統 Irradiation intensity control device and method, and optical inspection system

本發明概言之是關於照射源,且具體而言是關於用於照射強度控制之方法及系統。 SUMMARY OF THE INVENTION The present invention relates generally to illumination sources, and more particularly to methods and systems for illumination intensity control.

先前技術中已知用於控制照射源(諸如雷射二極體及發光二極體(light emitting diode;LED))之各種電路。舉例而言,美國第6,323,598號專利闡述各自包含至少一個發光二極體之複數個照射源,該等照射源由一開關電路依據一所施加輸入電壓而串聯地或並聯地連接。該美國專利之揭露內容以引用方式併入本文中。當在遍曆所施加輸入電壓之運行範圍之過程中所施加輸入電壓跨過一臨限值時,該開關電路將照射源自串聯連接切換至並聯連接,或反之亦然。由於照射源內之發光二極體是在一所定義轉折點(kick-over point)處被從串聯連接切換至並聯連接,因此電壓-亮度特性在該轉折點之相反側上改變。所得之整體電壓-亮度特性跨所施加輸入電壓之整個運行範圍具有較大亮度可變性,且亮度變異數並不僅限於運行範圍之一部分。 Various circuits for controlling illumination sources such as laser diodes and light emitting diodes (LEDs) are known in the prior art. For example, U.S. Patent No. 6,323,598 describes a plurality of illumination sources each comprising at least one light-emitting diode, which are connected in series or in parallel by a switching circuit in accordance with an applied input voltage. The disclosure of this U.S. patent is incorporated herein by reference. When the applied input voltage crosses a threshold during the traversing of the operating range of the applied input voltage, the switching circuit switches the illumination from the series connection to the parallel connection, or vice versa. Since the light-emitting diodes within the illumination source are switched from a series connection to a parallel connection at a defined kick-over point, the voltage-luminance characteristic changes on the opposite side of the inflection point. The resulting overall voltage-luminance characteristic has greater brightness variability across the entire operating range of the applied input voltage, and the number of luminance variations is not limited to only one portion of the operating range.

美國第7,356,058號專利闡述一種自適應性雷射二極體驅動器,該驅動器能夠驅動各種雷射二極體類型以及來自同一類型之不同雷射二極體,同時確保在二極體之壽命內及在其溫度改變時皆具有最佳光學效能。該美國專利之揭露內容以引用方式併入本文中。該驅動器自適應性地改變輸入資料訊號之電壓位準,以在極端調變條件下達成全電流切換以及短上升時間及下降時間。此是藉由不斷地監測一雷射二極體之輸出訊號而執行。基於所監測訊號,調整一調變電流,且作為回應,設定輸入資料訊號之低位準及高位準。根據一實施例,該自適應性雷射二極體驅動器可被整合於一被動光學網路(passive optical network;PON)之一光學線路終端(optical line terminal;OLT)或一光學網路單元(optical network unit;ONU)中。 U.S. Patent No. 7,356,058 describes an adaptive laser diode driver capable of driving various laser diode types and different laser diodes of the same type while ensuring the lifetime of the diode and It has the best optical performance when its temperature changes. The disclosure of this U.S. patent is incorporated herein by reference. The driver adaptively changes the voltage level of the input data signal to achieve full current switching and short rise and fall times under extreme modulation conditions. This is performed by continuously monitoring the output signal of a laser diode. Based on the monitored signal, a modulated current is adjusted, and in response, the low level and the high level of the input data signal are set. According to an embodiment, the adaptive laser diode driver can be integrated into an optical line terminal (OLT) or an optical network unit (passive optical network (PON)) ( Optical network unit; ONU).

美國第7,899,098號專利闡述一種用於一發射機或收發機之雷射二極體驅動器積體電路(integrated circuit;IC),該積體電路具有用於監測該發射機或收發機之一或複數個雷射二極體之正向電壓之電路,以使得能夠即時地評定該或該等雷射二極體之工作狀況(health)。該美國專利之揭露內容以引用方式併入本文中。 US Patent No. 7,899,098 describes a laser diode driver integrated circuit (IC) for a transmitter or transceiver having one or more of a plurality of transmitters or transceivers for monitoring the transmitter or transceiver A circuit of forward voltages of the laser diodes to enable an immediate assessment of the operating conditions of the or the laser diodes. The disclosure of this U.S. patent is incorporated herein by reference.

本發明之一實施例提供一種設備,其包含用於檢驗物件之一固態照射源、及一電路。該電路用以:執行一初始校準過程,該初始校準過程選擇用於施加至該固態照射源之一固定電壓供應位準;以及對該固態照射源施加具有該所選固定電壓供應位準之複數個電壓脈衝之一序列,由此使該固態照射源產生複數個固定強度照射脈衝之一序列以用於檢驗該等物件。 One embodiment of the present invention provides an apparatus comprising a solid state illumination source for inspecting an object, and an electrical circuit. The circuit is configured to: perform an initial calibration process selected to apply to a fixed voltage supply level of the solid state illumination source; and apply a complex number of the selected fixed voltage supply level to the solid state illumination source A sequence of voltage pulses, thereby causing the solid state illumination source to generate a sequence of a plurality of fixed intensity illumination pulses for use in verifying the objects.

在某些實施例中,該電路包含一電容器,且用以在各該電壓脈衝之前將該電容器充電至該所選固定電壓供應位準,並藉由經由該固態照射源使該經充電電容器放電而產生各該電壓脈衝。在其他實施例中,該電路在該等照射脈衝之該序列期間不重新校準該固定電壓供應位準。 In some embodiments, the circuit includes a capacitor for charging the capacitor to the selected fixed voltage supply level prior to each of the voltage pulses and discharging the charged capacitor by the solid state illumination source Each of the voltage pulses is generated. In other embodiments, the circuit does not recalibrate the fixed voltage supply level during the sequence of the illumination pulses.

在某些實施例中,該固態照射源為其中該電壓供應位準與所發射光學強度間之一關係在個別照射源之中變化之一類型之照射源,且該電路用以藉由執行該初始校準過程來補償該關係之一變化。在其他實施例中,該固態照射源包含一發光二極體及一開關,且該電路包含一驅動器電路,該驅動器電路用以對該開關施加該等電壓脈衝之該序列以使該發光二極體產生該等照射脈衝。 In some embodiments, the solid state illumination source is an illumination source in which one of the voltage supply levels and the emitted optical intensity changes among the individual illumination sources, and the circuit is configured to perform the An initial calibration process to compensate for one of the changes in the relationship. In other embodiments, the solid state illumination source includes a light emitting diode and a switch, and the circuit includes a driver circuit for applying the sequence of the voltage pulses to the switch to cause the light emitting diode The body produces these illumination pulses.

在某些實施例中,該電路用以量測自該等被檢驗物件反射之光之一光學強度,並依據該所量測光學強度而選擇該固定電壓供應位準。在其他實施例中,該電路包含用以獲取該等被檢驗物件之影像之一成像偵測器及用以藉由處理該等影像來量測該光學強度之一處理器。在某些實施例中,該電路包含用以直接量測該固態照射源之該強度之一成像偵測器及用以藉由處理該等影像來量測該光學強度之一處理器。在替代實施例中,該電路用以對流過該固態照射源之一電流進行數位化,並依據該經數位化電流而選擇該固定電壓供應位準。 In some embodiments, the circuit is configured to measure an optical intensity of light reflected from the object under test and select the fixed voltage supply level based on the measured optical intensity. In other embodiments, the circuit includes an image detector for acquiring images of the objects to be inspected and a processor for measuring the optical intensity by processing the images. In some embodiments, the circuit includes an imaging detector for directly measuring the intensity of the solid state illumination source and a processor for measuring the optical intensity by processing the images. In an alternative embodiment, the circuit is operative to digitize a current flowing through the solid state illumination source and select the fixed voltage supply level based on the digitized current.

在某些實施例中,該固態照射源包含一或多個發光二極體。在其他實施例中,該固態照射源包含一或多個雷射二極體。 In certain embodiments, the solid state illumination source comprises one or more light emitting diodes. In other embodiments, the solid state illumination source comprises one or more laser diodes.

在某些實施例中,該電路用以選擇該電壓供應位準及該等電壓脈衝之一相應持續時間二者。在其他實施例中,該電路用以選擇多個電壓供應位準及多個相應類型之該等電壓脈衝之持續時間。在又一些實施例 中,該電路用以選擇使該等照射脈衝提供一預定義照射強度之一最短持續時間。 In some embodiments, the circuit is operative to select both the voltage supply level and a respective duration of one of the voltage pulses. In other embodiments, the circuit is operative to select a plurality of voltage supply levels and durations of the plurality of respective types of voltage pulses. In still other embodiments The circuit is operative to select such illumination pulses to provide one of a predefined illumination intensity for a minimum duration.

根據本發明之一實施例,亦提供一種方法,其包含運行用於檢驗物件之一固態照射源。執行一初始校準過程,該初始校準過程選擇用於施加至該固態照射源之一固定電壓供應位準。對該固態照射源施加具有該所選固定電壓供應位準之複數個電壓脈衝之一序列,由此使該固態照射源產生複數個固定強度照射脈衝之一序列以用於檢驗該等物件。 In accordance with an embodiment of the present invention, a method is also provided that includes operating a solid state illumination source for verifying an object. An initial calibration process is performed that is selected for application to one of the solid state illumination sources for a fixed voltage supply level. A sequence of a plurality of voltage pulses having the selected fixed voltage supply level is applied to the solid state illumination source, thereby causing the solid state illumination source to generate a sequence of a plurality of fixed intensity illumination pulses for use in verifying the objects.

根據本發明之一實施例,亦提供一種光學檢驗系統,其包含一電路、一成像偵測器及一固態照射源。該固態照射源用以照射供檢驗之物件。該成像偵測器用以獲取該等被照射物件之影像。該電路用以:量測自該等被檢驗物件反射之光之一光學強度;執行一初始校準過程,該初始校準過程依據該所量測光學強度而選擇施加至該固態照射源之一固定電壓供應位準;以及對該固態照射源施加具有該所選固定電壓供應位準之複數個電壓脈衝之一序列以用於檢驗該等物件。 According to an embodiment of the invention, an optical inspection system is also provided, comprising a circuit, an imaging detector and a solid illumination source. The solid state illumination source is used to illuminate the item for inspection. The imaging detector is configured to acquire images of the illuminated objects. The circuit is configured to: measure an optical intensity of one of the light reflected from the object to be inspected; perform an initial calibration process, the initial calibration process selecting a fixed voltage applied to the solid-state illumination source according to the measured optical intensity Supplying a level; and applying a sequence of a plurality of voltage pulses having the selected fixed voltage supply level to the solid state illumination source for verifying the objects.

在某些實施例中,該電路用以在具有一已知反射率之一物件的由該成像偵測器獲取之至少一個影像中量測該光學強度。在其他實施例中,該電路用以在複數個該等被檢驗物件的由該成像偵測器獲取之複數個影像中量測該光學強度,並在該等物件內對該所量測光學強度求平均。 In some embodiments, the circuitry is operative to measure the optical intensity in at least one image acquired by the imaging detector having an object of known reflectivity. In other embodiments, the circuit is configured to measure the optical intensity in a plurality of images of the plurality of objects to be inspected acquired by the imaging detector, and measure the optical intensity in the objects. Average.

10‧‧‧檢驗系統 10‧‧‧Inspection system

15‧‧‧脈衝式固態照射源 15‧‧‧pulse solid-state illumination source

20‧‧‧照相機 20‧‧‧ camera

22‧‧‧處理器 22‧‧‧ Processor

25‧‧‧固態光學器件/光學二極體 25‧‧‧Solid Optics / Optical Diodes

26‧‧‧光學器件 26‧‧‧Optical devices

30‧‧‧電容器 30‧‧‧ Capacitors

35‧‧‧功率場效電晶體開關 35‧‧‧Power field effect transistor switch

43‧‧‧邏輯/定時控制電路 43‧‧‧Logic/Timing Control Circuit

45‧‧‧可調式調節器 45‧‧‧Adjustable regulator

50‧‧‧電源供應器 50‧‧‧Power supply

55‧‧‧驅動器 55‧‧‧ drive

64‧‧‧濾波器 64‧‧‧ filter

68‧‧‧類比至數位轉換器 68‧‧‧ Analog to Digital Converter

110‧‧‧脈衝 110‧‧‧pulse

120‧‧‧標記 120‧‧‧ mark

130‧‧‧標記 130‧‧‧ mark

200~216‧‧‧步驟 200~216‧‧‧Steps

VHI‧‧‧電壓 VHI‧‧‧ voltage

VLO‧‧‧電壓 VLO‧‧‧ voltage

連同圖式一起閱讀以下對本發明實施例之詳細說明,將更全面地理解本發明,在圖式中:第1a圖為一方塊圖,其示意性地例示根據本發明一實施例用於控制一 脈衝式照射源之強度之一系統;第1b圖顯示其中光學器件被串聯連接之脈衝式照射源之一實例;第1c圖顯示其中光學器件被並聯連接之脈衝式照射源之一實例;第2圖為一曲線圖,其顯示根據本發明一實施例用於控制一脈衝式照射源之強度之一系統中之訊號波形;以及第3圖為一流程圖,其示意性地例示根據本發明一實施例用於校準一脈衝式照射源之一方法。 The invention will be more fully understood from the following detailed description of embodiments of the invention, in which: FIG. 1a is a block diagram schematically illustrating an embodiment for controlling one in accordance with an embodiment of the present invention. One of the intensities of the pulsed illumination source; Figure 1b shows an example of a pulsed illumination source in which the optical devices are connected in series; Figure 1c shows an example of a pulsed illumination source in which the optical devices are connected in parallel; The figure is a graph showing a signal waveform in a system for controlling the intensity of a pulsed illumination source according to an embodiment of the invention; and FIG. 3 is a flow chart schematically illustrating a method according to the present invention. An embodiment is a method for calibrating a pulsed illumination source.

概述 Overview

某些光學檢驗系統使用了脈衝式光學照射源。在一典型之檢驗系統中,將一系列欲檢驗之物件(例如,平板顯示器或半導體晶圓)放置於一移動載台上,並藉由諸如一照相機之一成像偵測器對該等物件進行成像。該等物件相對於該照相機移動,同時來自該源之光脈衝以一短脈衝間隔照射該等移動物件。檢驗系統分析所獲取影像,例如,以偵測製造缺陷。此種類之脈衝式成像有助於防止因物件移動而使所獲取影像模糊。 Some optical inspection systems use pulsed optical illumination sources. In a typical inspection system, a series of objects to be inspected (for example, a flat panel display or a semiconductor wafer) are placed on a moving stage, and the objects are processed by an image detector such as a camera. Imaging. The objects move relative to the camera while light pulses from the source illuminate the moving objects at short pulse intervals. The inspection system analyzes the acquired image, for example, to detect manufacturing defects. This type of pulsed imaging helps prevent blurring of acquired images due to object movement.

在一典型檢驗系統中,維持對脈衝式照射源之照射強度之準確控制是重要的。一種控制照射強度之可能方式為對流過照射源之電流施加電流控制,乃因在固態照射源中,所發射光學功率與電流成比例。然而,維持穿過源之一固定電流通常涉及複雜且昂貴之高速電流回饋機制。 In a typical inspection system, it is important to maintain accurate control of the intensity of the illumination of the pulsed illumination source. One possible way to control the intensity of the illumination is to apply current control to the current flowing through the source of illumination, since in the solid state source the emitted optical power is proportional to the current. However, maintaining a fixed current through one of the sources typically involves a complex and expensive high speed current feedback mechanism.

本文所述之本發明實施例提供用於照射強度控制之經改良 方法及系統。所揭示技術使用電壓控制而非電流控制來維持恆定照射強度。雖然電壓與照射強度間之關係可在不同照射源間變化,但發明人已發現此關係在極長時間週期內保持穩定。與光學二極體器件相關聯之特性電壓(例如,導通拐點電壓(turn on knee voltage))可隨著加熱或隨著製造變化而變化。然而,一旦電壓及脈衝持續時間被首先校準,其便既在複數個脈衝內又在複數個長脈衝序列內保持穩定。因此,此可能夠避免在長照射脈衝序列期間重新校準固定電壓供應位準。 Embodiments of the invention described herein provide improved illumination intensity control Method and system. The disclosed technique uses voltage control rather than current control to maintain a constant illumination intensity. Although the relationship between voltage and illumination intensity can vary between different illumination sources, the inventors have found that this relationship remains stable over a very long period of time. The characteristic voltage associated with the optical diode device (eg, turn on knee voltage) may vary with heating or as manufacturing changes. However, once the voltage and pulse duration are first calibrated, they remain stable over a plurality of pulses and within a plurality of long pulse trains. Therefore, this can avoid recalibrating the fixed voltage supply level during long illumination pulse sequences.

在本文所述之某些實施例中,照射源被連接至一電路。在一初始校準過程中,該電路用以在評定出光學輸出是處於使檢驗系統有效運行之適當功率位準之後選擇欲施加至照射源之一固定電壓供應位準。 In some embodiments described herein, the illumination source is coupled to a circuit. During an initial calibration process, the circuit is used to select a fixed voltage supply level to be applied to the illumination source after assessing that the optical output is at an appropriate power level for the inspection system to operate effectively.

在一實例性實施例中,該電路使用檢驗系統之(已存在)照相機來量測照射強度,並使用此等量測值來校準照射源電壓位準。另外或另一選擇為,該電路可能在低通濾波之後對流過固態照射源之電流進行數位化,並基於經數位化電流而校準照射源電壓位準。 In an exemplary embodiment, the circuit uses an (existing) camera of the inspection system to measure the intensity of the illumination and uses the measurements to calibrate the source voltage level. Alternatively or in addition, the circuit may digitize the current flowing through the solid state illumination source after low pass filtering and calibrate the source voltage level based on the digitized current.

通常,由於電壓與照射強度間之關係之長期穩定性,僅稀少地需要進行此種類之重新校準。在一實例性實施方案中,在一檢驗批次開始時執行電壓校準。在校準之後,產生一長脈衝序列,而無需進行一重新校準。該長脈衝序列可用於檢驗多個物件。 In general, this type of recalibration is only rarely required due to the long-term stability of the relationship between voltage and illumination intensity. In an exemplary embodiment, voltage calibration is performed at the beginning of an inspection lot. After calibration, a long pulse train is generated without a recalibration. This long pulse train can be used to inspect multiple objects.

與電流控制方案相較,所揭示電壓控制機制具有以下優點:實施更簡單、使用更少印刷電路板面積、成本更少,且更不易於引起電磁干擾。 Compared to current control schemes, the disclosed voltage control mechanism has the advantages of simpler implementation, less printed circuit board area, less cost, and less prone to electromagnetic interference.

系統說明 instructions

第1a圖為一方塊圖,其示意性地例示根據本發明一實施例用於控制一脈衝式固態照射源(solid state illumination source;SSIS)15之強度之一系統10。固態照射源15包含耦合至一功率場效電晶體(field effect transistor;FET)開關35之一固態光學器件25,諸如一雷射二極體(laser diode;LD)或發光二極體(light emitting diode;LED)。來自器件25之光學訊號照射一欲檢驗之物件(圖中未顯示),且被照射物件由一成像偵測器(例如,一照相機20)成像。 1a is a block diagram schematically illustrating a system 10 for controlling the intensity of a solid state illumination source (SSIS) 15 in accordance with an embodiment of the present invention. Solid state illumination source 15 includes solid state optics 25 coupled to a power field effect transistor (FET) switch 35, such as a laser diode (LD) or a light emitting diode (light emitting diode) Diode; LED). The optical signal from device 25 illuminates an object to be inspected (not shown) and the illuminated object is imaged by an imaging detector (e.g., a camera 20).

在本實例中,系統10為用於在平板顯示器中找出缺陷之一檢驗系統之一部分。然而,另一選擇為,所揭示技術可用於任何其他適合應用中。 In the present example, system 10 is part of an inspection system for finding defects in a flat panel display. However, another option is that the disclosed techniques can be used in any other suitable application.

一處理器22分析藉由系統10進行缺陷識別之物件的且由照相機20獲取之複數個影像。在某些實施例中,如下文詳細所述,處理器22量測自被成像物件反射之光強度,且此強度量測被用作對照射源強度進行之初始校準過程之一部分。在其他實施例中,系統10包含一類比至數位轉換器(Analog-to-Digital Converter;ADC)68,類比至數位轉換器68對流過固態照射源15之電流進行取樣及數位化。在第1圖之實例中,藉由感測該固態照射源中之一適合電阻器二端之電壓來感測電流。一濾波器64,通常為一低通濾波器(low-pass filter;LPF),對所感測電流進行濾波並將其提供至類比至數位轉換器68以進行數位化。如下文將闡述,經數位化電流被回饋至處理器22且用於初始校準。 A processor 22 analyzes a plurality of images of the object identified by the system 10 for defect recognition and acquired by the camera 20. In some embodiments, processor 22 measures the intensity of light reflected from the imaged object as described in detail below, and this intensity measurement is used as part of an initial calibration process for the intensity of the illumination source. In other embodiments, system 10 includes an Analog-to-Digital Converter (ADC) 68 that is analogous to digital converter 68 to sample and digitize the current flowing through solid-state illumination source 15. In the example of Figure 1, the current is sensed by sensing one of the solid state illumination sources that is suitable for the voltage across the resistor. A filter 64, typically a low-pass filter (LPF), filters the sensed current and provides it to an analog to digital converter 68 for digitization. As will be explained below, the digitized current is fed back to the processor 22 and used for initial calibration.

第1a圖之實例顯示二種類型之感測器(照相機20及類比至數位轉換器68),其皆可用作用於對照射源強度進行初始校準之回饋輸入。在各種實施方案中,可僅使用照相機、僅使用類比至數位轉換器或使用其二 者來執行校準。 The example of Figure 1a shows two types of sensors (camera 20 and analog to digital converter 68), all of which can be used as feedback inputs for initial calibration of the intensity of the illumination source. In various embodiments, only cameras, only analog to digital converters, or two To perform the calibration.

在某些實施例中,處理器22經由一邏輯/定時控制電路43來控制照射脈衝。處理器22通常自照相機獲取資訊並實施下文所述之校準演算法。邏輯/定時控制電路43包含自檢驗系統接收移動物件之位置資訊之快速及即時電子器件,例如,一控制器、現場可程式化閘陣列(field programmable gate array;FPGA)、數位訊號處理器(digital signal processor;DSP)器件。如稍後將進一步闡述,邏輯/定時控制電路43亦控制照相機觸發及照射脈衝持續時間。 In some embodiments, processor 22 controls the illumination pulses via a logic/timing control circuit 43. Processor 22 typically acquires information from the camera and implements the calibration algorithm described below. The logic/timing control circuit 43 includes fast and instant electronic devices that receive location information of the moving object from the inspection system, for example, a controller, a field programmable gate array (FPGA), and a digital signal processor (digital). Signal processor; DSP) device. As will be explained further below, the logic/timing control circuit 43 also controls the camera trigger and illumination pulse duration.

處理器22輸出一數位值,該數位值經由邏輯/定時控制電路43被發送至一可調式調節器45。可調式調節器45之輸出調節一電源供應器50之電壓。此電壓可給一選用電容器30充電。 Processor 22 outputs a digital value that is sent to an adjustable regulator 45 via logic/timing control circuit 43. The output of the adjustable regulator 45 regulates the voltage of a power supply 50. This voltage can charge a capacitor 30 of choice.

邏輯/定時控制電路43較佳地經由驅動器55用以對場效電晶體35之閘極施加複數個電壓脈衝。該等電壓脈衝對穿過光學器件25之電流進行雙態導通及切斷,此會產生脈衝式輸出光學訊號。當場效電晶體35在一脈衝之開頭開始傳導時,電壓經由光學器件25放電,從而使照射源產生一照射脈衝。 Logic/timing control circuit 43 is preferably used via driver 55 to apply a plurality of voltage pulses to the gate of field effect transistor 35. The voltage pulses are bi-directionally turned on and off by the current passing through the optics 25, which produces a pulsed output optical signal. When the field effect transistor 35 begins to conduct at the beginning of a pulse, the voltage is discharged via the optical device 25, thereby causing the illumination source to generate an illumination pulse.

場效電晶體35達到一電開關之作用。當該開關斷開(即,該場效電晶體不容許電流自汲極傳遞至源極)且無電流流過光學二極體25時,由可調式調節器45設定之固定電壓供應位準可給電容器30充電。當該開關閉合(即,該場效電晶體傳導電流)時,電壓放電且電流流過光學二極體25,從而產生光。 The field effect transistor 35 reaches the role of an electrical switch. When the switch is turned off (ie, the field effect transistor does not allow current to pass from the drain to the source) and no current flows through the optical diode 25, the fixed voltage supply level set by the adjustable regulator 45 can be The capacitor 30 is charged. When the switch is closed (i.e., the field effect transistor conducts current), the voltage discharges and current flows through the optical diode 25, thereby generating light.

當場效電晶體35傳導時,光學二極體25及場效電晶體35(例 如,第1a圖所示之光學照射源15)二端之電壓之和為可調式調節器45之輸出,可調式調節器45充當本文中所指代之電壓控制源。在第1a圖中顯示為場效電晶體35之電開關可由任一適合開關器件來實施且並不限於場效電晶體(例如,雙極電晶體)。 When the field effect transistor 35 conducts, the optical diode 25 and the field effect transistor 35 (for example) For example, the sum of the voltages at the two terminals of the optical illumination source 15) shown in Figure 1a is the output of the adjustable regulator 45, which acts as a voltage control source as referred to herein. The electrical switch shown in Figure 1a as field effect transistor 35 can be implemented by any suitable switching device and is not limited to field effect transistors (e.g., bipolar transistors).

對於在用於光學檢驗系統之脈衝式光學照射源15中所使用之典型光學二極體25,在脈衝介於自0.1微秒至1000微秒之範圍內時,穿過二極體25之電流位準可介於自0.01安至20安之範圍內。通常自用於檢驗系統之源15產生每秒10個至5000個脈衝。 For a typical optical diode 25 used in a pulsed optical illumination source 15 for an optical inspection system, the current through the diode 25 is varied when the pulse is in the range from 0.1 microseconds to 1000 microseconds. The level can range from 0.01 amps to 20 amps. Source 15 from the test system typically produces 10 to 5000 pulses per second.

穿過光學二極體25之電流之脈衝間穩定性是由若干個參數固定。舉例而言,此等參數包含來自調節器輸出之固定電壓供應位準、光學二極體之電流-電壓特性、場效電晶體35之閘極處之脈衝持續時間、及在電流傳導期間場效電晶體35二端之電壓降。場效電晶體35二端之電壓降主要相依於場效電晶體35之汲極端子與源極端子間之等效電阻。 The interpulse stability of the current passing through the optical diode 25 is fixed by several parameters. For example, such parameters include a fixed voltage supply level from the regulator output, a current-voltage characteristic of the optical diode, a pulse duration at the gate of the field effect transistor 35, and a field effect during current conduction. The voltage drop across the two ends of the transistor 35. The voltage drop at the two ends of the field effect transistor 35 is mainly dependent on the equivalent resistance between the 汲 terminal and the source terminal of the field effect transistor 35.

發明人已發現,由源15產生的在脈衝持續時間內積分之照射功率在長時間週期內保持穩定。光學源脈衝間功率可在幾周之週期內保持穩定。換言之,對於一既定電壓輸出及施加至開關35之電壓脈衝之一既定脈衝持續時間(本文中稱作照射控制參數),具有一極高脈衝間穩定性之電流流過光學二極體。 The inventors have found that the illumination power generated by source 15 that is integrated over the duration of the pulse remains stable over a long period of time. The power between the optical source pulses can be stabilized over a period of several weeks. In other words, for a given voltage output and one of the voltage pulses applied to the switch 35 for a given pulse duration (referred to herein as the illumination control parameter), a current having a very high interpulse stability flows through the optical diode.

雖然電壓及脈衝持續時間與照射強度間之關係為穩定的,但實際關係可能在不同照射源間變化。因此,在某些實施例中,處理器22執行一初始校準過程,此過程設定適當電壓及脈衝持續時間。 Although the relationship between voltage and pulse duration and illumination intensity is stable, the actual relationship may vary between different illumination sources. Thus, in some embodiments, processor 22 performs an initial calibration process that sets the appropriate voltage and pulse duration.

在一典型校準過程中,處理器22藉由以下操作而開始:設定 一低電壓位準,且逐漸地增加電壓供應位準直至自源15量測到用於使檢驗系統有效運行之一預定義功率位準為止。在某些實施例中,使用照相機20來執行該量測。在一實施例中,該系統包含多個照相機,且該校準過程對於確保使所有多個照相機中之照射位準相同而言是重要的。另外或另一選擇為,可使用濾波器64及類比至數位轉換器68來執行該量測。 In a typical calibration process, processor 22 begins by: setting A low voltage level is gradually increased and the voltage supply level is gradually increased until a predetermined power level for valid operation of the verification system is measured from source 15. In some embodiments, the camera 20 is used to perform the measurement. In one embodiment, the system includes a plurality of cameras, and the calibration process is important to ensure that the illumination levels in all of the plurality of cameras are the same. Alternatively or in addition, filter 64 and analog to digital converter 68 can be used to perform the measurement.

處理器22經由邏輯/定時控制電路43、使用可調式調節器45之「電壓控制」輸入(例如,所選固定電壓供應位準)及驅動器55之「脈衝持續時間控制」輸入在穩態系統10處施加所選驅動條件。隨後,在一或多個連續光學檢驗場次(session)中使用此等參數,直至出現脈衝式功率位準輸出之一漂移(drift)為止。隨後,重新校準該等驅動條件。在其他實施例中,處理器22監測長時間間隔內之平均照射功率,並在偵測到照射功率改變之情形下修改輸出電壓。 The processor 22 is input to the steady state system 10 via a logic/timing control circuit 43, a "voltage control" input using an adjustable regulator 45 (eg, a selected fixed voltage supply level), and a "pulse duration control" of the driver 55. The selected drive condition is applied. These parameters are then used in one or more consecutive optical inspection sessions until a drift of the pulsed power level output occurs. These drive conditions are then recalibrated. In other embodiments, processor 22 monitors the average illumination power over a long time interval and modifies the output voltage if a change in illumination power is detected.

第1a圖所示系統10之組態為一實例性組態,該實例性組態僅是為了使概念清晰起見而並非是以限制本發明實施例之方式繪示的。另一選擇為,可使用任一適合元件組態來執行本文所述系統10之功能。該實例性組態中之源15並不限於光學器件25及開關35,而是可包含複數個電元件及/或光學元件之任一適合組合。用於校準及控制源15之照射強度之各種組件(包含處理器22、電路43、照相機20、可調式調節器45、驅動器55、濾波器64、類比至數位轉換器68及相關聯組件)在本文中統稱作電路。在替代實施例中,可使用任一其他適合電路組態。 The configuration of the system 10 shown in Fig. 1a is an exemplary configuration, which is for the sake of clarity of the concept and is not intended to limit the embodiments of the invention. Alternatively, any suitable component configuration can be used to perform the functions of system 10 described herein. The source 15 in this exemplary configuration is not limited to optics 25 and switch 35, but may comprise any suitable combination of a plurality of electrical and/or optical components. Various components for calibrating and controlling the illumination intensity of source 15 (including processor 22, circuit 43, camera 20, adjustable regulator 45, driver 55, filter 64, analog to digital converter 68, and associated components) are This document is collectively referred to as a circuit. In alternate embodiments, any other suitable circuit configuration can be used.

在某些實施例中,第1a圖所示電路可用於同時驅動一或多個光學照射源15,例如,被串聯連接且設置於一小印刷電路板(printed circuit board;PCB)上之複數個源。在其他實施例中,一或多個源各自被以單獨 電路分別地進行驅動,該一或多個源其中之每一者被以其相應穩態驅動條件來分別地校準。 In some embodiments, the circuit of Figure 1a can be used to simultaneously drive one or more optical illumination sources 15, for example, a plurality of optically connected sources connected in series and disposed on a small printed circuit board (PCB). source. In other embodiments, one or more sources are each individually The circuits are driven separately, each of the one or more sources being individually calibrated with their respective steady state drive conditions.

系統10之元件之全部或任何部分可在一印刷電路板或任一適合基板上用單獨元件以硬體形式來實施、或者可以一或多個應用專用積體電路(Application-Specific Integrated Circuit;ASIC)或現場可程式化閘陣列(Field Programmable Gate Array;FPGA)來實施。另外或另一選擇為,系統10之某些元件可使用軟體、或者硬體或軟體之任一適合組合來實施。 All or any portion of the components of system 10 may be implemented in a hardware form on a printed circuit board or any suitable substrate, or may be one or more application-specific integrated circuits (ASICs). Or implement a Field Programmable Gate Array (FPGA). Additionally or alternatively, some of the components of system 10 can be implemented using software, or any suitable combination of hardware or software.

在又一些實施例中,舉例而言,可在系統10之任一部分中使用處理器22來執行或協調本文所述系統10之功能其中之任一者,諸如用於分析所獲取影像。處理器22通常包含被以軟體形式程式化為執行本文所述功能之一通用電腦。可例如經由一網路以電子形式將軟體下載至電腦,或者另一選擇為或另外,可在非暫時性有形媒體(諸如,磁性記憶體、光學記憶體或電子記憶體)上提供及/或儲存軟體。 In still other embodiments, for example, processor 22 can be used in any portion of system 10 to perform or coordinate any of the functions of system 10 described herein, such as for analyzing acquired images. Processor 22 typically includes a general purpose computer that is programmed in software to perform one of the functions described herein. The software can be downloaded to the computer in electronic form, for example via a network, or alternatively or additionally, can be provided on non-transitory tangible media (such as magnetic memory, optical memory or electronic memory) and/or Store software.

第1b圖顯示其中照射固態源26被串聯連接之固態照射源(solid state illumination source;SSIS)15之一實例。可串聯地連接若干照射源。在此實例中,穿過所有不同固態源之電流皆相等。 Figure 1b shows an example of a solid state illumination source (SSIS) 15 in which the illuminating solid state source 26 is connected in series. Several illumination sources can be connected in series. In this example, the current through all of the different solid state sources is equal.

第1c圖顯示其中照射固態源26被並聯連接之固態照射源(solid state illumination source;SSIS)15之一實例。可並聯地連接若干照射源。在此實例中,穿過所有不同固態源之電壓皆相等。 Figure 1c shows an example of a solid state illumination source (SSIS) 15 in which the illuminating solid state source 26 is connected in parallel. Several illumination sources can be connected in parallel. In this example, the voltage across all of the different solid state sources is equal.

第2圖為一曲線圖,其示意性地例示根據本發明一實施例用於控制脈衝式照射源15之強度之系統10中之複數個訊號波形。 2 is a graph schematically illustrating a plurality of signal waveforms in a system 10 for controlling the intensity of a pulsed illumination source 15 in accordance with an embodiment of the present invention.

此實例中顯示了四個脈衝110。即,經由驅動器55施加至場 效電晶體35(圖1中之電開關)之閘極之一脈衝列(pulse train)。所示之TTL位準是自VHI(開關斷開)至VLO(開關閉合),其中VHI及VLO為任何適合之TTL電壓。自一標記120至一標記130之脈衝寬度闡述導通脈衝且可具有自0.1微秒至1毫秒及更高之典型值。脈衝間之時間間隔可依據脈衝持續時間而變動,且提供如第2圖所示之脈衝工作循環。 Four pulses 110 are shown in this example. That is, applied to the field via the driver 55 A pulse train of the gate of the effect transistor 35 (the electrical switch in Fig. 1). The TTL levels shown are from VHI (switch open) to VLO (switch closed), where VHI and VLO are any suitable TTL voltages. The pulse width from a mark 120 to a mark 130 illustrates the on pulse and may have a typical value from 0.1 microseconds to 1 millisecond and above. The time interval between pulses can vary depending on the pulse duration and provides a pulse duty cycle as shown in FIG.

檢驗系統校準方案 Inspection system calibration scheme

第3圖為一流程圖,其示意性地例示根據本發明一實施例用於校準系統10中之脈衝式照射源15之一方法。以下說明以遇到一種新類型之一供檢驗物件開始,此需要設定一新檢驗方案(且具體而言是一新脈衝電壓位準)。 3 is a flow chart that schematically illustrates one method for calibrating a pulsed illumination source 15 in system 10 in accordance with an embodiment of the present invention. The following description begins with the inspection of an object in response to one of the new types, which requires the setting of a new inspection protocol (and in particular a new pulse voltage level).

在一典型實施例中,檢驗過程涉及檢驗多種類型之物件(且因此涉及多個方案)。在此種情形中,對每一物件類型重複第3圖之方法。該物件可包含正被檢驗之實際樣本(例如,平板顯示器、印刷電路板、晶圓)中之一區域、或者具有已知反射率之一目標。 In an exemplary embodiment, the inspection process involves examining multiple types of items (and thus involving multiple scenarios). In this case, the method of Fig. 3 is repeated for each object type. The article can include one of the actual samples being tested (eg, a flat panel display, a printed circuit board, a wafer), or one of the targets having a known reflectivity.

該方法以系統10(通常為處理器22或控制電路43)在一電壓調整步驟200處將電壓脈衝位準設定至某一初始值而開始。藉由控制可調式調節器45來設定該電壓位準。 The method begins with system 10 (typically processor 22 or control circuit 43) setting a voltage pulse level to a certain initial value at a voltage adjustment step 200. This voltage level is set by controlling the adjustable regulator 45.

隨後,在一量測步驟208處,系統10量測自物件反射之脈衝之照射強度。如上所述,可藉由使用照相機20獲取一或多個影像並由處理器22處理該等影像以估計照射強度來執行強度量測。另外或另一選擇為,可藉由使用類比至數位轉換器68對流過SSIS 15之電流進行數位化並將經數位化電流回饋至處理器22來執行該量測。 Subsequently, at a measurement step 208, system 10 measures the intensity of the illumination from the pulses reflected by the object. As described above, the intensity measurement can be performed by acquiring one or more images using the camera 20 and processing the images by the processor 22 to estimate the illumination intensity. Alternatively or in addition, the measurement can be performed by digitizing the current flowing through the SSIS 15 using an analog to digital converter 68 and feeding back the digitized current to the processor 22.

隨後,在一檢查步驟212處,系統檢查目前照射強度是否充足。若不充足,則方法循環回至以上步驟200,在此步驟中,系統按需要調整脈衝電壓位準(即,若所量測強度過低,則增加脈衝電壓位準,且反之亦然)。 Subsequently, at an inspection step 212, the system checks if the current illumination intensity is sufficient. If not, the method loops back to step 200 above, in which the system adjusts the pulse voltage level as needed (ie, if the measured intensity is too low, the pulse voltage level is increased, and vice versa).

若所量測照射強度適合,則系統繼續進行至在一檢驗步驟216處檢驗所討論類型之物件。通常,在檢驗階段期間,系統不時地重新評估照射強度(例如,藉由分支至步驟208)。若有必要,則系統調整脈衝電壓位準以維持適合照射強度。 If the measured illumination intensity is appropriate, the system proceeds to verify an item of the type in question at a test step 216. Typically, during the inspection phase, the system re-evaluates the intensity of the illumination from time to time (e.g., by branching to step 208). If necessary, the system adjusts the pulse voltage level to maintain the appropriate illumination intensity.

在某些實施例中,檢驗系統10中之電路可用以校準並使用二或更多個照射強度(即,二或更多個脈衝長度與電壓對)。舉例而言,系統10可在同一掃描中對被檢驗物件上數個不同類型之區域進行成像,俾使每一類型之區域是使用一不同照射強度(不同脈衝長度/電壓對)被成像。 In some embodiments, circuitry in inspection system 10 can be used to calibrate and use two or more illumination intensities (ie, two or more pulse lengths versus voltage pairs). For example, system 10 can image several different types of areas on the object being inspected in the same scan such that each type of area is imaged using a different illumination intensity (different pulse length/voltage pair).

在某些實施例中,系統10之電路控制電壓及脈衝持續時間二者。此種雙重控制使得能夠設定各種效能折衷。 In some embodiments, the circuitry of system 10 controls both voltage and pulse duration. This dual control makes it possible to set various performance tradeoffs.

在使用照相機20之輸出作為一照射強度指示之實施例中,處理器22可以各種方式來確定照射強度。在某些實施例中,系統10可在校準過程期間對具有已知反射率之一專用被檢驗物件(「目標」)進行成像。另一選擇為,可對欲檢驗之實際物件執行校準。另一選擇為,如第1a圖中所見,照相機可直視照射源之輸出、或照射源之輸出之一部分(例如,經由一局部分束器(partial beam splitter))。 In embodiments where the output of camera 20 is used as an indication of illumination intensity, processor 22 can determine the illumination intensity in a variety of ways. In some embodiments, system 10 can image a particular object under inspection ("target") having a known reflectivity during the calibration process. Alternatively, calibration can be performed on the actual object to be inspected. Alternatively, as seen in Figure 1a, the camera can look directly at the output of the illumination source, or a portion of the output of the illumination source (e.g., via a partial beam splitter).

雖然本文中所述之實施例主要論及光學檢驗系統中之脈衝式照射控制,但本文所述之方法及系統亦可用於其中使用脈衝式照射源之 其他應用中,例如用於雷射材料處理中。 Although the embodiments described herein primarily address pulsed illumination control in an optical inspection system, the methods and systems described herein can also be used in which a pulsed illumination source is used. In other applications, for example in laser material processing.

因此,將瞭解,上文所述之實施例僅是以舉例方式引述,且本發明並不限於上文中已具體顯示及闡述之內容。反之,本發明之範圍包含上文所述各種特徵之組合及子組合二者、以及本發明所屬技術領域中具有通常知識者在閱讀上述說明後將會聯想到且在先前技術中未揭示之變化及潤飾。以引用方式併入本專利申請案中之文件應被視為本申請案之一整體部分,只不過,當任何術語在此等所併入文件中是以與本說明書中所明確或暗含地作出之定義相衝突之一方式被定義時,應僅考慮本說明書中之定義。 Therefore, it is to be understood that the above-described embodiments are cited by way of example only, and the invention is not limited to what has been specifically shown and described herein. Rather, the scope of the present invention encompasses combinations and sub-combinations of the various features described above, as well as variations that would be apparent to those of ordinary skill in the art And retouching. The documents incorporated by reference in this patent application are hereby incorporated by reference in its entirety in the entire application in the application in When one of the definition conflicts is defined, only the definitions in this specification should be considered.

10‧‧‧檢驗系統 10‧‧‧Inspection system

15‧‧‧脈衝式固態照射源 15‧‧‧pulse solid-state illumination source

20‧‧‧照相機 20‧‧‧ camera

22‧‧‧處理器 22‧‧‧ Processor

25‧‧‧固態光學器件/光學二極體 25‧‧‧Solid Optics / Optical Diodes

30‧‧‧電容器 30‧‧‧ Capacitors

35‧‧‧功率場效電晶體開關 35‧‧‧Power field effect transistor switch

43‧‧‧邏輯/定時控制電路 43‧‧‧Logic/Timing Control Circuit

45‧‧‧可調式調節器 45‧‧‧Adjustable regulator

50‧‧‧電源供應器 50‧‧‧Power supply

55‧‧‧驅動器 55‧‧‧ drive

64‧‧‧濾波器 64‧‧‧ filter

68‧‧‧類比至數位轉換器 68‧‧‧ Analog to Digital Converter

Claims (30)

一種照射強度控制設備,包含:一固態照射源,用於檢驗物件;以及一電路,用以:執行一初始校準過程,該初始校準過程選擇用於施加至該固態照射源之一固定電壓供應位準;以及對該固態照射源施加具有該所選固定電壓供應位準之複數個電壓脈衝之一序列,由此使該固態照射源產生複數個固定強度照射脈衝之一序列以用於檢驗該等物件。 An illumination intensity control apparatus comprising: a solid-state illumination source for inspecting an object; and a circuit for performing an initial calibration process for selecting a fixed voltage supply bit for application to the solid-state illumination source And applying a sequence of a plurality of voltage pulses having the selected fixed voltage supply level to the solid state illumination source, thereby causing the solid state illumination source to generate a sequence of a plurality of fixed intensity illumination pulses for verifying such object. 如請求項1所述之照射強度控制設備,其中該電路包含一電容器,且用以在各該電壓脈衝之前將該電容器充電至該所選固定電壓供應位準,並藉由經由該固態照射源使該經充電電容器放電而產生各該電壓脈衝。 The illumination intensity control device of claim 1, wherein the circuit includes a capacitor and is configured to charge the capacitor to the selected fixed voltage supply level prior to each of the voltage pulses, and by using the solid state illumination source The charged capacitor is discharged to generate each of the voltage pulses. 如請求項1或2所述之照射強度控制設備,其中該電路在該等照射脈衝之該序列期間不重新校準該固定電壓供應位準。 The illumination intensity control device of claim 1 or 2, wherein the circuit does not recalibrate the fixed voltage supply level during the sequence of the illumination pulses. 如請求項1或2所述之照射強度控制設備,其中該固態照射源為其中該電壓供應位準與所發射光學強度間之一關係在個別照射源之中變化之一類型之照射源,且其中該電路用以藉由執行該初始校準過程來補償該關係之一變化。 The illumination intensity control device according to claim 1 or 2, wherein the solid-state illumination source is an illumination source in which one of the voltage supply levels and the emitted optical intensity is changed among the individual illumination sources, and Wherein the circuit is operative to compensate for a change in the relationship by performing the initial calibration process. 如請求項1或2所述之照射強度控制設備,其中該固態照射源包含一發光二極體及一開關,且其中該電路包含一驅動器電路,該驅動器電路用以對該開關施加該等電壓脈衝之該序列以使該發光二極體產生該等照射脈衝。 The illumination intensity control device according to claim 1 or 2, wherein the solid-state illumination source comprises a light-emitting diode and a switch, and wherein the circuit comprises a driver circuit, the driver circuit is configured to apply the voltage to the switch The sequence of pulses is such that the illumination diode produces the illumination pulses. 如請求項1或2所述之照射強度控制設備,其中該電路用以量測自該等被檢驗物件反射之光之一光學強度,並依據該所量測光學強度而選擇該固 定電壓供應位準。 The illumination intensity control device according to claim 1 or 2, wherein the circuit is configured to measure optical intensity of one of the light reflected from the object to be inspected, and select the solid according to the measured optical intensity Constant voltage supply level. 如請求項6所述之照射強度控制設備,其中該電路包含用以獲取該等被檢驗物件之影像之一成像偵測器及用以藉由處理該等影像來量測該光學強度之一處理器。 The illumination intensity control device of claim 6, wherein the circuit includes an image detector for acquiring images of the objects to be inspected and processing for measuring the optical intensity by processing the images. Device. 如請求項6所述之照射強度控制設備,其中該電路包含用以直接量測該固態照射源之該強度之一成像偵測器及用以藉由處理該等影像來量測該光學強度之一處理器。 The illumination intensity control device of claim 6, wherein the circuit comprises an imaging detector for directly measuring the intensity of the solid state illumination source and for measuring the optical intensity by processing the images. A processor. 如請求項1或2所述之照射強度控制設備,其中該電路用以對流過該固態照射源之一電流進行數位化,並依據該經數位化電流而選擇該固定電壓供應位準。 The illumination intensity control device according to claim 1 or 2, wherein the circuit is configured to digitize a current flowing through the solid-state illumination source, and select the fixed voltage supply level according to the digitized current. 如請求項1或2所述之照射強度控制設備,其中該固態照射源包含一或多個發光二極體。 The illumination intensity control device of claim 1 or 2, wherein the solid state illumination source comprises one or more light emitting diodes. 如請求項1或2所述之照射強度控制設備,其中該固態照射源包含一或多個雷射二極體。 The illumination intensity control device of claim 1 or 2, wherein the solid state illumination source comprises one or more laser diodes. 如請求項1或2所述之照射強度控制設備,其中該電路用以選擇該電壓供應位準及該等電壓脈衝之一相應持續時間二者。 The illumination intensity control device of claim 1 or 2, wherein the circuit is configured to select the voltage supply level and a corresponding duration of one of the voltage pulses. 如請求項1或2所述之照射強度控制設備,其中該電路用以選擇多個電壓供應位準及多個相應類型之該等電壓脈衝之持續時間。 The illumination intensity control device of claim 1 or 2, wherein the circuit is configured to select a plurality of voltage supply levels and durations of the plurality of respective types of the voltage pulses. 如請求項1或2所述之照射強度控制設備,其中該電路用以選擇使該等照射脈衝提供一預定義照射強度之一最短持續時間。 The illumination intensity control device of claim 1 or 2, wherein the circuitry is operative to select the illumination pulses to provide one of a predefined illumination intensity for a minimum duration. 一種照射強度控制方法,包含:運行用於檢驗物件之一固態照射源; 執行一初始校準過程,該初始校準過程選擇用於施加至該固態照射源之一固定電壓供應位準;以及對該固態照射源施加具有該所選固定電壓供應位準之複數個電壓脈衝之一序列,由此使該固態照射源產生複數個固定強度照射脈衝之一序列以用於檢驗該等物件。 An illumination intensity control method comprising: operating a solid-state illumination source for detecting an object; Performing an initial calibration process that selects a fixed voltage supply level for application to the solid state illumination source; and applies one of a plurality of voltage pulses having the selected fixed voltage supply level to the solid state illumination source A sequence whereby the solid state illumination source produces a sequence of a plurality of fixed intensity illumination pulses for use in testing the objects. 如請求項15所述之照射強度控制方法,其中施加該等電壓脈衝之該序列之步驟包含在各該電壓脈衝之前將一電容器充電至該所選固定電壓供應位準,並藉由經由該固態照射源使該經充電電容器放電而產生各該電壓脈衝。 The illumination intensity control method of claim 15, wherein the step of applying the sequence of the voltage pulses comprises charging a capacitor to the selected fixed voltage supply level before each of the voltage pulses, and by using the solid state An illumination source discharges the charged capacitor to generate each of the voltage pulses. 如請求項15或16所述之照射強度控制方法,包含在該等照射脈衝之該序列期間避免重新校準該固定電壓供應位準。 The illumination intensity control method of claim 15 or 16, comprising avoiding recalibrating the fixed voltage supply level during the sequence of the illumination pulses. 如請求項15或16所述之照射強度控制方法,其中該固態照射源為其中該電壓供應位準與所發射光學強度間之一關係在個別照射源之中變化之一類型之照射源,且其中執行該初始校準過程之步驟包含補償該關係之一變化。 The illumination intensity control method according to claim 15 or 16, wherein the solid-state illumination source is an illumination source in which one of the voltage supply levels and the emitted optical intensity changes among the individual illumination sources, and The step of performing the initial calibration process includes compensating for a change in the relationship. 如請求項15或16所述之照射強度控制方法,其中該固態照射源包含一發光二極體及一開關,且其中施加該等電壓脈衝之該序列之步驟包含對該開關施加該等電壓脈衝之該序列以使該發光二極體產生該等照射脈衝。 The illumination intensity control method of claim 15 or 16, wherein the solid-state illumination source comprises a light-emitting diode and a switch, and wherein the step of applying the sequence of the voltage pulses comprises applying the voltage pulse to the switch The sequence is such that the illumination diode produces the illumination pulses. 如請求項15或16所述之照射強度控制方法,其中執行該初始校準過程之步驟包含量測自該等被檢驗物件反射之光之一光學強度,並依據該所量測光學強度而選擇該固定電壓供應位準。 The illumination intensity control method of claim 15 or 16, wherein the step of performing the initial calibration process comprises measuring optical intensity of one of the light reflected from the object to be inspected, and selecting the optical intensity according to the measured optical intensity Fixed voltage supply level. 如請求項20所述之照射強度控制方法,其中量測該光學強度之步驟包含 處理由對該等被檢驗物件進行成像之一成像偵測器獲取之影像。 The illumination intensity control method of claim 20, wherein the step of measuring the optical intensity comprises Processing an image acquired by an imaging detector that images the object being inspected. 如請求項15或16所述之照射強度控制方法,其中執行該初始校準過程之步驟包含對流過該固態照射源之一電流進行數位化,並依據該經數位化電流而選擇該固定電壓供應位準。 The illumination intensity control method of claim 15 or 16, wherein the step of performing the initial calibration process comprises digitizing a current flowing through the solid-state illumination source, and selecting the fixed voltage supply bit according to the digitized current quasi. 如請求項15或16所述之照射強度控制方法,其中該固態照射源包含一或多個發光二極體。 The method of controlling the intensity of illumination according to claim 15 or 16, wherein the solid-state illumination source comprises one or more light-emitting diodes. 如請求項15或16所述之照射強度控制方法,其中該固態照射源包含一或多個雷射二極體。 The illumination intensity control method of claim 15 or 16, wherein the solid state illumination source comprises one or more laser diodes. 如請求項15或16所述之照射強度控制方法,其中執行該初始校準過程之步驟包含選擇該電壓供應位準及該等電壓脈衝之一相應持續時間二者。 The illumination intensity control method of claim 15 or 16, wherein the step of performing the initial calibration process comprises selecting the voltage supply level and a respective duration of one of the voltage pulses. 如請求項15或16所述之照射強度控制方法,其中執行該初始校準過程之步驟包含選擇多個電壓供應位準及多個相應類型之該等電壓脈衝之持續時間。 The illumination intensity control method of claim 15 or 16, wherein the step of performing the initial calibration process comprises selecting a plurality of voltage supply levels and durations of the plurality of respective types of the voltage pulses. 如請求項15或16所述之照射強度控制方法,其中執行該初始校準過程之步驟包含選擇使該等照射脈衝提供一預定義照射強度之一最短持續時間。 The illumination intensity control method of claim 15 or 16, wherein the step of performing the initial calibration process comprises selecting to cause the illumination pulses to provide one of a predefined illumination intensity for a minimum duration. 一種光學檢驗系統,包含:一固態照射源,用以照射供檢驗之物件;一成像偵測器,用以獲取該等被照射物件之影像;以及一電路,用以:量測自該等被檢驗物件反射之光之一光學強度;執行一初始校準過程,該初始校準過程依據該所量測光學強度而選擇施加至該固態照射源之一固定電壓供應位準;以及對該固態照射源施加具有 該所選固定電壓供應位準之複數個電壓脈衝之一序列以用於檢驗該等物件。 An optical inspection system comprising: a solid-state illumination source for illuminating an object for inspection; an imaging detector for acquiring an image of the illuminated object; and a circuit for: measuring from the Detecting an optical intensity of one of the light reflected by the object; performing an initial calibration process that selects a fixed voltage supply level applied to the solid state illumination source in accordance with the measured optical intensity; and applying the solid state illumination source have A sequence of a plurality of voltage pulses of the selected fixed voltage supply level is used to verify the objects. 如請求項28所述之光學檢驗系統,其中該電路用以在具有一已知反射率之一物件的由該成像偵測器獲取之至少一個影像中量測該光學強度。 The optical inspection system of claim 28, wherein the circuitry is operative to measure the optical intensity in at least one image acquired by the imaging detector having an object of a known reflectivity. 如請求項28所述之光學檢驗系統,其中該電路用以在複數個該等被檢驗物件的由該成像偵測器獲取之複數個影像中量測該光學強度,並在該等物件內對該所量測光學強度求平均。 The optical inspection system of claim 28, wherein the circuit is configured to measure the optical intensity in a plurality of images of the plurality of objects to be inspected acquired by the imaging detector, and to be in the objects The measured optical intensity is averaged.
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