TW201606430A - Photosensitive resin composition, cured product, black matrix and image display device - Google Patents

Photosensitive resin composition, cured product, black matrix and image display device Download PDF

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TW201606430A
TW201606430A TW104122601A TW104122601A TW201606430A TW 201606430 A TW201606430 A TW 201606430A TW 104122601 A TW104122601 A TW 104122601A TW 104122601 A TW104122601 A TW 104122601A TW 201606430 A TW201606430 A TW 201606430A
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TWI637237B (en
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石井宏明
上村次郎
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三菱化學股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

The present invention provides a photosensitive resin composition which is excellent in a dispersibility and capable of forming a high-definition fine line regardless of a content of color material in a photosensitive resin composition. The present invention relates to a photosensitive resin composition comprising (a) a coloring material, (b) a dispersant, (c) a photopolymerization initiator, (d) an alkali-soluble resin, (e) a solvent, wherein the dispersant (b) contains (b-1) a polyurethane dispersant having a solvophilic group and an adsorptive group, the polyurethane dispersant (b-1) contains a partial structure represented by the formula (i), and the photopolymerization initiator (c) contains an oxime ester photopolymerization initiator (c-1).

Description

感光性樹脂組成物、硬化物、黑色矩陣及影像顯示裝置 Photosensitive resin composition, cured product, black matrix, and image display device

本發明係關於感光性樹脂組成物、硬化物、黑色矩陣及影像顯示裝置。詳言之,係關於分散性、顯影性、耐熱性優越,可形成高精細之細線的感光性樹脂組成物。本發明之感光性樹脂組成物尤其具有高遮光性,適合於可形成高精細之細線的黑色矩陣(Black Matrix。以下有時簡稱為「BM」。)用的感光性樹脂組成物。又,本發明係關於此感光性樹脂組成物之硬化物、與其用途。 The present invention relates to a photosensitive resin composition, a cured product, a black matrix, and an image display device. In particular, it is a photosensitive resin composition which is excellent in dispersibility, developability, and heat resistance and can form fine lines of high definition. The photosensitive resin composition of the present invention has a high light-shielding property, and is suitable for a photosensitive resin composition for a black matrix (Black Matrix, hereinafter sometimes referred to as "BM") which can form fine lines of high definition. Further, the present invention relates to a cured product of the photosensitive resin composition and its use.

彩色濾光片通常係於玻璃或塑膠等之透明基板的表面上形成黑色之黑色矩陣,接著,依序將紅、綠或藍等3種以上的不同顏色之畫素,形成條紋狀或馬賽克狀等之圖案。圖案尺寸係視彩色濾光片的用途及各自的顏色而異,通常為5~700μm左右。 The color filter is usually formed on a surface of a transparent substrate such as glass or plastic to form a black matrix of black, and then three or more different color pixels such as red, green or blue are sequentially formed into a stripe shape or a mosaic shape. Wait for the pattern. The pattern size varies depending on the use of the color filter and the color of each color, and is usually about 5 to 700 μm.

作為彩色濾光片的代表性製造方法,目前已知有顏料分散法。在藉由顏料分散法製造彩色濾光片時,首先將含有黑色顏料之感光性樹脂組成物塗布於透明基板上後使其乾燥,進而進行影像曝光、顯影後,以200℃以上之高溫處理使其硬化,藉此形成BM。將此依紅、綠或藍等各色重複進行而形成彩色濾光片。 As a representative production method of a color filter, a pigment dispersion method is currently known. When a color filter is produced by a pigment dispersion method, a photosensitive resin composition containing a black pigment is first applied onto a transparent substrate, dried, and further subjected to image exposure and development, and then treated at a high temperature of 200 ° C or higher. It hardens, thereby forming a BM. This color is repeated in various colors such as red, green or blue to form a color filter.

BM一般係於紅、綠或藍等之畫素之間配置成格子狀、條紋狀或馬賽克狀,具有藉由抑制各畫素間之混色而提高對比 度或防止漏光的功能。因此,對BM係要求高遮光性。 BM is generally arranged in a lattice, stripe or mosaic between pixels of red, green or blue, and has a contrast by suppressing the color mixture between the pixels. Degree or function to prevent light leakage. Therefore, high opacity is required for the BM system.

再者,於BM形成後所形成之紅、綠或藍等之畫素的邊緣部,由於與此BM重疊,故受到BM膜厚的影響,在重疊部分形成段差。於此重疊部分,係畫素之平坦性受損,發生液晶格間隙之不均勻化或液晶配向混亂,引起顯示能力降低。 Further, since the edge portion of the pixel such as red, green, or blue formed after the formation of the BM overlaps with the BM, the BM film thickness is affected, and a step is formed in the overlapping portion. In this overlapping portion, the flatness of the pixels is impaired, unevenness of the liquid crystal lattice gap or disorder of the liquid crystal alignment occurs, and the display capability is lowered.

因此,近年來特別要求BM膜厚之薄膜化,為了在經薄膜化時仍表現充分之遮光性,有使感光性樹脂組成物中之顏料含有比例增加的傾向。 For this reason, in recent years, the thickness of the BM film is particularly required to be thinned, and in order to exhibit sufficient light-shielding properties when thinned, the proportion of the pigment contained in the photosensitive resin composition tends to increase.

另一方面,為了省能源化及攜帶式電池的長壽命化,有降低背光源之輸出的傾向,為了於此種條件下仍可依高輝度進行影像顯示,而進行屬於遮光部之BM的細線化。 On the other hand, in order to save energy and to extend the life of the portable battery, there is a tendency to reduce the output of the backlight, and in order to perform image display with high luminance under such conditions, the thin line of the BM belonging to the light shielding portion is performed. Chemical.

再者,近年來於液晶顯示器之市場中,平板電腦等之小型化成為主流,在大型電視方面則對高解析度的要求變高,基於此等理由,對BM之高細線化的期望亦變高。近年來,BM細線之線寬已由習知之10μm左右,進展為目前要求之6μm左右。 In addition, in recent years, in the market of liquid crystal displays, the miniaturization of tablet computers and the like has become mainstream, and the demand for high resolution has been increasing in large-scale televisions. For these reasons, the expectation of high-definition of BM has also changed. high. In recent years, the line width of the BM thin line has been about 10 μm from the conventional one, and has progressed to about 6 μm which is currently required.

一般而言,在製造使用於顏料分散法的感光性樹脂組成物時,首先將含有色材、分散劑或溶劑等的組成物,藉玻璃珠等進行分散而調製分散液。其後,將該分散液與鹼可溶性樹脂或光聚合起始劑等進行攪拌混合而調製感光性樹脂組成物。 In general, when a photosensitive resin composition used in a pigment dispersion method is produced, a composition containing a color material, a dispersant, or a solvent is first dispersed by glass beads or the like to prepare a dispersion. Then, the dispersion liquid is stirred and mixed with an alkali-soluble resin, a photopolymerization initiator, or the like to prepare a photosensitive resin composition.

作為彩色濾光片用之分散劑,已提案有丙烯酸系、聚胺基甲酸酯系、聚乙烯亞胺系或聚酯系等,又,在構造方面則有無規型、嵌段型或接枝型(梳形)等各式各樣者(例如專利文獻1~3)。 As a dispersing agent for a color filter, an acrylic type, a polyurethane type, a polyethyleneimine type, a polyester type, etc. are proposed, and the structure is a random type, a block type, or a connection. Various types such as a branch type (comb shape) (for example, Patent Documents 1 to 3).

此等之中,聚胺基甲酸酯系之分散劑由於可藉由胺基甲酸乙酯鍵於末端加成具有羧基、1、2級胺基或硫醇基的化合物, 故已開發有各種形態者作為分散劑(例如專利文獻4~9)。 Among these, the polyurethane dispersant is a compound having a carboxyl group, a 1, 2 amino group or a thiol group by terminal addition of a urethane bond. Therefore, various forms have been developed as dispersing agents (for example, Patent Documents 4 to 9).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

專利文獻1:日本專利特開2002-031713號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2002-031713

專利文獻2:日本專利第3509512號公報 Patent Document 2: Japanese Patent No. 3095512

專利文獻3:日本專利第3789965號公報 Patent Document 3: Japanese Patent No. 3789965

專利文獻4:日本專利特開昭57-162723號公報 Patent Document 4: Japanese Patent Laid-Open Publication No. SHO 57-162723

專利文獻5:日本專利特表2002-503746號公報 Patent Document 5: Japanese Patent Laid-Open Publication No. 2002-503746

專利文獻6:日本專利特表2003-506538號公報 Patent Document 6: Japanese Patent Laid-Open Publication No. 2003-506538

專利文獻7:日本專利特表2005-538192號公報 Patent Document 7: Japanese Patent Laid-Open Publication No. 2005-538192

專利文獻8:日本專利特表2010-511752號公報 Patent Document 8: Japanese Patent Laid-Open Publication No. 2010-511752

專利文獻9:日本專利特表2011-514411號公報 Patent Document 9: Japanese Patent Special Publication No. 2011-514411

本發明者等人經檢討後發現,專利文獻1~3記載之分散劑存在有視顏料種類等而無法分散、或分散後發生增黏、或若未選擇適當者或條件則無法獲得充分之分散效果等問題。又,此等習知之分散劑中即便使用高感度之起始劑,亦無法形成目前所要求之更加高細微的細線。 The inventors of the present invention have found that the dispersing agents described in Patent Documents 1 to 3 are not dispersible or dispersed after being dispersed depending on the type of the pigment, or are not sufficiently dispersed if not selected or the conditions are selected. Problems such as effects. Moreover, even if a high-sensitivity initiator is used in such conventional dispersants, it is impossible to form a finer fine line which is currently required.

又,專利文獻4~9記載之分散劑,係在目前所要求的更高遮光度條件下,亦即顏料含有比例較高之條件下,不足以形成更細的細線。 Further, the dispersing agents described in Patent Documents 4 to 9 are insufficient to form finer fine wires under the conditions of higher opacity required at present, that is, under a condition in which the pigment content is high.

因此,本發明之課題在於提供分散性優越,且不論色 材含有比例均可形成高精細之細線的感光性樹脂組成物,及使用此感光性樹脂組成物的硬化物、黑色矩陣及影像顯示裝置。 Therefore, the object of the present invention is to provide superior dispersibility and color A photosensitive resin composition which can form a high-definition fine line, and a cured product, a black matrix, and a video display device using the photosensitive resin composition.

本發明者等人為了解決上述課題而潛心研究,結果發現,藉由將具有某特定構造之聚胺基甲酸酯分散劑與高感度之光聚合起始劑組合,則不論感光性樹脂組成物中之色材含有比例,均可形成目前所要求之高細微之細線。 The inventors of the present invention have intensively studied to solve the above problems, and as a result, it has been found that a photosensitive resin composition can be used by combining a polyurethane dispersant having a specific structure with a high-sensitivity photopolymerization initiator. The medium color materials contain proportions, which can form the fine lines of high precision required by the present.

本發明係根據此種見解而達成者,其要旨如下。 The present invention has been achieved based on such findings, and the gist thereof is as follows.

1.一種感光性樹脂組成物,係含有色材(a)、分散劑(b)、光聚合起始劑(c)、鹼可溶性樹脂(d)及溶劑(e)者,其中,分散劑(b)係含有具親溶媒基及吸附基之聚胺基甲酸酯分散劑(b-1);該聚胺基甲酸酯分散劑(b-1)係含有下式(i)所示之部分構造;光聚合起始劑(c)係含有肟酯光聚合起始劑(c-1); A photosensitive resin composition comprising a color material (a), a dispersing agent (b), a photopolymerization initiator (c), an alkali-soluble resin (d), and a solvent (e), wherein a dispersing agent ( b) is a polyurethane dispersant (b-1) having a hydrophilic solvent group and an adsorption group; the polyurethane dispersant (b-1) contains the following formula (i) Partial configuration; photopolymerization initiator (c) containing oxime ester photopolymerization initiator (c-1);

[式(i)中,Ra表示亦可具有取代基之碳數1~20之伸烷基、碳數6~20之伸芳基、或上述伸烷基與上述伸芳基經連接之碳數7~20之基;*表示鍵結基]。 [In the formula (i), R a represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, an extended aryl group having 6 to 20 carbon atoms, or a carbon bonded to the above-mentioned extended aryl group. The number of 7 to 20; * indicates the bond base].

2.如前項1記載之感光性樹脂組成物,其中,上述聚胺基甲酸酯分散劑(b-1)係含有:含有上述親溶媒基之含親溶媒基部分構造、與含有上述吸附基之含吸附基部分構造;該含親溶媒基部分構造與該含吸附基部分構造係藉由上式(i) 所示之部分構造所連結。 2. The photosensitive resin composition according to the above-mentioned item 1, wherein the polyurethane dispersant (b-1) contains a structure containing a hydrophilic solvent group and a structure containing the above-mentioned adsorption group. The structure containing the adsorbing moiety; the structure containing the hydrophilic solvent moiety and the structure of the adsorbing moiety are by the above formula (i) Some of the structures shown are linked.

3.如前項1或2記載之感光性樹脂組成物,其中,上述聚胺基甲酸酯分散劑(b-1)係具有主鏈,該主鏈係含有上式(i)所示之部分構造。 3. The photosensitive resin composition according to the above item 1 or 2, wherein the polyurethane dispersant (b-1) has a main chain containing a moiety represented by the above formula (i) structure.

4.如前項1至3中任一項記載之感光性樹脂組成物,其中,上述親溶媒基係含有聚醚鏈及聚酯鏈之至少一者。 4. The photosensitive resin composition according to any one of the above items 1 to 3, wherein the hydrophilic solvent group contains at least one of a polyether chain and a polyester chain.

5.如前項1至4中任一項記載之感光性樹脂組成物,其中,上述吸附基係選自包含3級胺基、4級銨鹽基及含氮原子雜環基之群組中之至少1種。 The photosensitive resin composition according to any one of the above-mentioned items, wherein the adsorption group is selected from the group consisting of a tertiary amino group, a quaternary ammonium salt group, and a nitrogen atom-containing heterocyclic group. At least one.

6.如前項2至5中任一項記載之感光性樹脂組成物,其中,上述含吸附基部分構造係具有下式(1)所示之部分構造; The photosensitive resin composition according to any one of the above aspects, wherein the adsorption group-containing partial structure has a partial structure represented by the following formula (1);

[式(1)中,R1表示亦可具有取代基之烷基或芳基,R2及R3分別獨立表示亦可具有取代基之伸烷基、伸芳基伸烷基或伸芳基;*表示鍵結基]。 [In the formula (1), R 1 represents an alkyl group or an aryl group which may have a substituent, and R 2 and R 3 each independently represent an alkylene group, an extended arylalkyl group or an extended aryl group which may have a substituent; * indicates a bond base].

7.如前項2至6中任一項記載之感光性樹脂組成物,其中,上述含吸附基部分構造係具有下式(2-1)~(2-3)所示之至少1種之部分構造; The photosensitive resin composition according to any one of the above aspects, wherein the adsorption group-containing partial structure has at least one of the following formulas (2-1) to (2-3) structure;

[式(2-1)中,Rα及Rβ分別獨立表示亦可具有取代基之烷基或芳基;Rγ、Rδ及Rε分別獨立表示亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基;其中,在Rγ為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代;又,Rγ亦可經由-NH-(C=O)-基而與相鄰接之至少任一個N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結;*為鍵結基]; [In the formula (2-1), R α and R β each independently represent an alkyl group or an aryl group which may have a substituent; and R γ , R δ , and R ε each independently represent an alkylene group which may have a substituent, a aryl group having a substituent or a group in which the above alkyl group is bonded to the above aryl group; wherein, R γ is an alkyl group which may have a substituent, or the above alkyl group and the above-mentioned aryl group When the base is bonded, at least a part of the methylene group constituting the alkylene group may also be selected from the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, and a quinone bond. Substituting at least one bond in the group of ethyl thiocarbamate, thioether bond and thioester bond; further, R γ may also be adjacent to each other via -NH-(C=O)- group At least one of the N atoms is subjected to a urea bond together, or a guanamine bond is carried out via a carbonyl group; * is a bond group];

[式(2-2)中,Rα及Rβ分別獨立表示亦可具有取代基之烷基或芳基;Rγ及Rη分別獨立表示亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基;其中,在Rγ及Rη分別獨立為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代;又,Rγ及Rη亦可經由-NH-(C=O)-基而與相鄰接之至少 任一個N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結;*為鍵結基]; [In the formula (2-2), R α and R β each independently represent an alkyl group or an aryl group which may have a substituent; and R γ and R η each independently represent an alkylene group which may have a substituent, or may have a aryl group of a substituent or a group in which the above alkyl group is bonded to the above aryl group; wherein, R γ and R η are each independently an alkyl group which may have a substituent, or the above alkyl group and the above When the aryl group is bonded to the group, at least a part of the methylene group constituting the alkylene group may also be selected from the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, and a ruthenium bond. Substituting at least one bond in the group of an amine bond, an ethyl thioglycolate bond, a thioether bond, and a thioester bond; further, R γ and R η may also be via a -NH-(C=O)- group. And carrying out a urea bond together with at least one of the adjacent N atoms, or a guanamine bond via a carbonyl group; * is a bond group];

[式(2-3)中,Rα及Rβ分別獨立表示亦可具有取代基之烷基或芳基;Rγ'及Rδ分別獨立表示亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基;其中,在Rγ'為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代;又,Rγ'亦可經由-NH-(C=O)-基而與相鄰接之N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結;Rε'表示直接鍵結、亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基;Rζ表示氫原子、亦可具有取代基之烷基或芳基;其中,在Rζ為上述烷基或上述芳基時,其氫原子之至少一個亦可藉由3級胺基或含氮原子雜環基所取代;*為鍵結基]。 [In the formula (2-3), R α and R β each independently represent an alkyl group or an aryl group which may have a substituent; and R γ′ and R δ each independently represent an alkylene group which may have a substituent, and may also a aryl group having a substituent or a group in which the above alkyl group is bonded to the above aryl group; wherein, R γ ' is an alkyl group which may have a substituent, or an alkylene group and the above aryl group When the group is bonded, at least a part of the methylene group constituting the alkylene group may also be selected from the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, an oxime bond, Substituting at least one bond in the group of ethyl thiocarbamate, thioether bond and thioester bond; further, R γ ' may also be adjacent to each other via -NH-(C=O)- group The N atoms are bonded together by a urea bond, or a guanamine bond is carried out via a carbonyl group; R ε ' represents a direct bond, an alkyl group which may have a substituent, an extended aryl group which may have a substituent, or the above extension a group in which an alkyl group is bonded to the above-mentioned aryl group; R ζ represents a hydrogen atom, an alkyl group or an aryl group which may have a substituent; wherein, when R ζ is the above alkyl group or the above aryl group, a hydrogen atom thereof At least one of them may be substituted by a tertiary amino group or a nitrogen atom-containing heterocyclic group; * is a bonding group].

8.如前項1至7中任一項記載之感光性樹脂組成物,其中,肟酯光聚合起始劑(c-1)係具有亦可被取代之咔唑基。 The photosensitive resin composition of any one of the above-mentioned 1st to 7th, wherein the oxime ester photopolymerization initiator (c-1) has a carbazole group which may be substituted.

9.如前項1至8中任一項記載之感光性樹脂組成物,其中,鹼可溶性樹脂(d)係含有具有羧基及乙烯性不飽和基之至少一者的鹼可溶性樹脂(d-1)。 The photosensitive resin composition according to any one of the above aspects, wherein the alkali-soluble resin (d) contains an alkali-soluble resin (d-1) having at least one of a carboxyl group and an ethylenically unsaturated group. .

10.如前項9記載之感光性樹脂組成物,其中,鹼可溶性樹脂(d-1)為環氧基(甲基)丙烯酸酯樹脂。 10. The photosensitive resin composition according to the above item 9, wherein the alkali-soluble resin (d-1) is an epoxy (meth) acrylate resin.

11.如前項10記載之感光性樹脂組成物,其中,上述環氧基(甲基)丙烯酸酯樹脂係下述環氧基(甲基)丙烯酸酯樹脂(D1-1)及環氧基(甲基)丙烯酸酯樹脂(D1-2)之至少一者;(1)使α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯加成於環氧樹脂,進而使多元酸及其酐之至少一者進行反應而獲得的環氧基(甲基)丙烯酸酯樹脂(D1-1);(2)使α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯加成於環氧樹脂,進而使多元醇、與多元酸及其酐之至少一者進行反應而獲得的環氧基(甲基)丙烯酸酯樹脂(D1-2)。 The photosensitive resin composition according to the above item 10, wherein the epoxy (meth) acrylate resin is an epoxy (meth) acrylate resin (D1-1) and an epoxy group (A) At least one of an acrylate resin (D1-2); (1) adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, and further An epoxy (meth) acrylate resin (D1-1) obtained by reacting at least one of a polybasic acid and an anhydride thereof; (2) an α,β-unsaturated monocarboxylic acid or an α having a carboxyl group; An epoxy group (meth) acrylate resin (D1-2) obtained by adding a β-unsaturated monocarboxylic acid ester to an epoxy resin and further reacting a polyol with at least one of a polybasic acid and an anhydride thereof .

12.如前項1至11中任一項記載之感光性樹脂組成物,其中,色材(a)之平均一次粒徑為20~100nm。 The photosensitive resin composition according to any one of the items 1 to 11, wherein the color material (a) has an average primary particle diameter of 20 to 100 nm.

13.如前項1至12中任一項記載之感光性樹脂組成物,其中,色材(a)含有碳黑。 The photosensitive resin composition as described in any one of Claims 1 to 12, wherein the color material (a) contains carbon black.

14.如前項13記載之感光性樹脂組成物,其中,相對於總固形份,含有上述碳黑40質量%以上。 The photosensitive resin composition according to the above-mentioned item 13, wherein the carbon black is contained in an amount of 40% by mass or more based on the total solid content.

15.一種硬化物,係使前項1至14中任一項記載之感光性樹脂組成物硬化而成。 A cured product obtained by curing the photosensitive resin composition according to any one of the items 1 to 14 above.

16.一種黑色矩陣,係含有前項15之硬化物。 16. A black matrix comprising the cured product of item 15.

17.一種影像顯示裝置,係具備前項16記載之黑色矩陣。 A video display device comprising the black matrix described in the above item 16.

根據本發明,可提供分散性優越,且不論感光性樹脂組成物中之色材含有比例均可形成高精細之細線的感光性樹脂組成物。本發明之感光性樹脂組成物尤其為高遮光性,可用於作為可形成高精細之細線的黑色矩陣用之感光性樹脂組成物。 According to the present invention, it is possible to provide a photosensitive resin composition which is excellent in dispersibility and which can form fine lines of high fineness regardless of the color material content ratio in the photosensitive resin composition. The photosensitive resin composition of the present invention is particularly high in light-shielding property and can be used as a photosensitive resin composition for a black matrix which can form fine lines of high definition.

10‧‧‧透明支持基板 10‧‧‧Transparent support substrate

20‧‧‧畫素 20‧‧ ‧ pixels

30‧‧‧有機保護層 30‧‧‧Organic protective layer

40‧‧‧無機氧化膜 40‧‧‧Inorganic oxide film

50‧‧‧透明陽極 50‧‧‧Transparent anode

51‧‧‧電洞注入層 51‧‧‧ hole injection layer

52‧‧‧電洞輸送層 52‧‧‧ hole transport layer

53‧‧‧發光層 53‧‧‧Lighting layer

54‧‧‧電子注入層 54‧‧‧Electronic injection layer

55‧‧‧陰極 55‧‧‧ cathode

100‧‧‧有機EL元件 100‧‧‧Organic EL components

500‧‧‧有機發光體 500‧‧‧Organic emitters

圖1為表示具備本發明之彩色濾光片的有機EL元件之一例的剖面示意圖。 Fig. 1 is a schematic cross-sectional view showing an example of an organic EL device including the color filter of the present invention.

以下具體說明本發明之實施形態,但本發明並不限定於以下實施形態,在其要旨之範圍內可進行各種變更而實施。 The embodiments of the present invention are specifically described below, but the present invention is not limited to the following embodiments, and various modifications can be made without departing from the spirit and scope of the invention.

尚且,本發明中所謂「(甲基)丙烯酸」係指「丙烯酸及/或甲基丙烯酸」,關於「(甲基)丙烯酸酯」、「(甲基)丙烯醯基」亦相同。又,「酸(酐)」、「(無水)...酸」係指包括酸與其酐之兩者。 In the present invention, the term "(meth)acrylic acid" means "acrylic acid and/or methacrylic acid", and the same applies to "(meth)acrylate" and "(meth)acrylylene group". Further, "acid (anhydride)", "(anhydrous) ... acid" means both an acid and an anhydride thereof.

又,本發明中所謂「總固形份」係指感光性樹脂組成物中或後述油墨中所含之溶劑以外之所有成分。 In the present invention, the term "total solid content" means all components other than the solvent contained in the photosensitive resin composition or the ink described later.

又,本發明中,所謂數量平均分子量及重量平均分子量,係指由GPC(凝膠滲透層析)所得之聚苯乙烯換算的數量平均分子量(Mn)、重量平均分子量(Mw)。 In the present invention, the number average molecular weight and the weight average molecular weight refer to a polystyrene-equivalent number average molecular weight (Mn) and a weight average molecular weight (Mw) obtained by GPC (gel permeation chromatography).

又,本發明中,所謂「胺價」,在未特別限定之下,係表示有效固形份換算之胺價,為與分散劑之固形份每1g之鹼量呈當量的KOH重量所示的值。又,關於測定方法係如後述。另一方面,所謂「酸價」,在未特別限定之下係表示有效固形份換算之酸價,藉由中和滴定而算出。 In the present invention, the "amine valence" is an amine valence in terms of an effective solid content, and is a value indicated by the KOH weight equivalent to 1 g of the alkali amount of the solid content of the dispersant. . Further, the measurement method will be described later. On the other hand, the "acid value" is an acid value in terms of an effective solid content, which is not particularly limited, and is calculated by neutralization titration.

又,本說明書中,有時使用「*」表示鍵結基。 Further, in the present specification, "*" may be used to indicate a bonding group.

又,本說明書中所謂「聚胺基甲酸酯骨架」並不僅止於由聚胺基甲酸酯所構成之骨架,亦包括由聚胺基甲酸酯脲所構成之骨架的概念。同樣地,所謂「聚胺基甲酸酯分散劑」並不僅止於具有2個以上胺基甲酸乙酯鍵的分散劑,亦包括具有2個以上脲鍵之分散劑、具有胺基甲酸乙酯鍵及脲鍵之分散劑的概念。 In addition, the "polyurethane skeleton" in the present specification does not only terminate in a skeleton composed of a polyurethane, but also includes a skeleton composed of a polyurethane. Similarly, the "polyurethane dispersant" not only terminates in a dispersing agent having two or more urethane bonds, but also includes a dispersing agent having two or more urea bonds, and having an ethyl urethane. The concept of a bond and a dispersant of a urea bond.

[感光性樹脂組成物] [Photosensitive Resin Composition]

本發明之感光性樹脂組成物係含有:色材(a)、特定之分散劑(b)、特定之光聚合起始劑(c)、鹼可溶性樹脂(d)及溶劑(e)。 The photosensitive resin composition of the present invention contains a color material (a), a specific dispersing agent (b), a specific photopolymerization initiator (c), an alkali-soluble resin (d), and a solvent (e).

本發明之感光性樹脂組成物較佳係進一步含有光聚合性單體,進而視需要含有硫醇類、分散助劑(顏料衍生物)、密黏提升劑、塗佈性提升劑、顯影改良劑、紫外線吸收劑、抗氧化劑、界面活性劑等其他調配成分;通常,各調配成分係依溶解或分散於溶劑(e)之狀態使用。 The photosensitive resin composition of the present invention preferably further contains a photopolymerizable monomer, and further contains a mercaptan, a dispersing aid (pigment derivative), a dense adhesion promoter, a coating enhancer, and a development improver, as needed. Other compounding components such as an ultraviolet absorber, an antioxidant, and a surfactant; in general, each of the components is used in a state of being dissolved or dispersed in the solvent (e).

本發明之特徵在於,感光性樹脂組成物含有特定之聚胺基甲酸酯分散劑(b-1)作為分散劑,及含有肟酯光聚合起始劑(c-1)作為光聚合起始劑(c)。 The present invention is characterized in that the photosensitive resin composition contains a specific polyurethane dispersant (b-1) as a dispersing agent, and an oxime ester photopolymerization initiator (c-1) as a photopolymerization start. Agent (c).

[分散劑(b)] [dispersant (b)]

本發明之感光性樹脂組成物,其特徵在於,含有特定之聚胺基甲酸酯分散劑(b-1)作為分散劑(b)。 The photosensitive resin composition of the present invention contains a specific polyurethane dispersant (b-1) as a dispersing agent (b).

[聚胺基甲酸酯分散劑(b-1)] [Polyurethane dispersant (b-1)]

上述聚胺基甲酸酯分散劑(b-1)係具有親溶媒基及吸附基,進而含有下式(i)所示之部分構造。 The polyurethane dispersant (b-1) has a hydrophilic solvent group and an adsorption group, and further contains a partial structure represented by the following formula (i).

上式(i)中,Ra表示亦可具有取代基之碳數1~20之伸烷基、碳數6~20之伸芳基、或上述伸烷基與上述伸芳基經連接之碳數7~20之基;*表示鍵結基。 In the above formula (i), R a represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, an extended aryl group having 6 to 20 carbon atoms, or a carbon to which the above alkylene group and the above extended aryl group are bonded A number of 7 to 20; * indicates a bond base.

上式(i)中之亦可具有取代基之伸烷基的碳數若為1~20之範圍內則無特別限定,較佳為2以上、更佳為3以上,且較佳為15以下、更佳為10以下、再更佳為7以下。藉由設為上述下限值以上,有可使分散性良好之傾向;又,藉由設為上述上限值以下,有可防止高黏度化之傾向。 The number of carbon atoms of the alkylene group which may have a substituent in the above formula (i) is not particularly limited, and is preferably 2 or more, more preferably 3 or more, and preferably 15 or less. More preferably, it is 10 or less, and even more preferably 7 or less. When it is set to the above lower limit value, the dispersibility tends to be good, and when it is equal to or less than the above upper limit, it is possible to prevent high viscosity.

伸烷基可為鏈狀或環狀,又,亦可為鏈狀之伸烷基與環狀之伸烷基經連接者。由分散性之觀點而言,較佳係至少具有環狀部分者。 The alkyl group may be a chain or a ring, or may be a chain alkyl group and a cyclic alkyl group. From the viewpoint of dispersibility, it is preferred to have at least a cyclic portion.

作為伸烷基之具體例,可列舉三亞甲基、四亞甲基、五亞甲基、六亞甲基、伸辛基、癸亞甲基、伸環己基、伸環己基亞甲基及伸環己基亞甲基伸環己基等。由分散性良好之觀點而言,較 佳為四亞甲基、五亞甲基、六亞甲基、伸環己基、或伸環己基亞甲基伸環己基,更佳為五亞甲基、六亞甲基、伸環己基、或伸環己基亞甲基伸環己基。 Specific examples of the alkylene group include a trimethylene group, a tetramethylene group, a pentamethylene group, a hexamethylene group, a octyl group, a fluorenylene group, a cyclohexylene group, a cyclohexylenemethylene group, and a stretching group. Cyclohexylmethylene groups are extended to cyclohexyl and the like. From the point of view of good dispersion, Preferably, it is a tetramethylene group, a pentamethylene group, a hexamethylene group, a cyclohexylene group, or a cyclohexylmethylene group, and more preferably a pentamethylene group, a hexamethylene group, a cyclohexylene group, or The cyclohexylmethylene group is extended to a cyclohexyl group.

作為亦可具有取代基之伸烷基之具體例,可列舉以下者。 Specific examples of the alkylene group which may have a substituent include the following.

上式(i)中之亦可具有取代基之伸芳基之碳數若為6~20之範圍內則無特別限定,較佳為15以下、更佳為10以下、再更佳為8以下。藉由設為上述上限值以下,有可防止高黏度化之傾向。 The number of carbon atoms of the aryl group which may have a substituent in the above formula (i) is not particularly limited as long as it is in the range of 6 to 20, preferably 15 or less, more preferably 10 or less, still more preferably 8 or less. . When it is set to the above upper limit or less, it is possible to prevent a high viscosity.

作為伸芳基之具體例,可列舉以下者。 Specific examples of the aryl group include the following.

又,作為具有取代基之伸芳基的具體例,可列舉以下者。 Further, specific examples of the extended aryl group having a substituent include the following.

其中由分散性之觀點而言,較佳係上式(0-3)所示之 基。 From the viewpoint of dispersibility, it is preferably represented by the formula (0-3) base.

上式(i)中之亦可具有取代基之伸烷基、與亦可具有取代基之伸芳基經連接之基的碳數若為7~20之範圍內則無特別限定,較佳為8以上、更佳為9以上,且較佳為15以下、更佳為14以下、再更佳為13以下。藉由設為上述下限值以上,有可使分散性良好之傾向;又,藉由設為上述上限值以下,有可防止高黏度化之傾向。 The number of carbon atoms in the alkyl group which may have a substituent in the above formula (i) and the group in which the exoaryl group which may have a substituent is bonded is not particularly limited, and is preferably in the range of from 7 to 20. 8 or more, more preferably 9 or more, and preferably 15 or less, more preferably 14 or less, still more preferably 13 or less. When it is set to the above lower limit value, the dispersibility tends to be good, and when it is equal to or less than the above upper limit, it is possible to prevent high viscosity.

具有上述伸烷基與上述伸芳基經連接之基的伸芳基的數量,若為1以上則無特別限定,由分散性之觀點而言較佳為2以上、且較佳為3以下。又,若伸烷基之數量為1以上則無特別限定,由分散性之觀點而言較佳為3以下。 The number of the aryl groups having the above-mentioned alkyl group and the above-mentioned extended aryl group is not particularly limited as long as it is 1 or more, and is preferably 2 or more, and preferably 3 or less from the viewpoint of dispersibility. Further, the number of alkylene groups is not particularly limited as long as the number of alkylene groups is 1 or more, and is preferably 3 or less from the viewpoint of dispersibility.

具體而言,可列舉例如,亦可具有取代基之伸芳基1個與亦可具有取代基之伸烷基1個經連接之基;及使亦可具有取代基之伸芳基2個經由亦可具有取代基之伸烷基1個連接的基。 Specifically, for example, one of the extended aryl groups having a substituent and one alkyl group which may have a substituent may be attached; and two of the extended aryl groups which may have a substituent may be used. It may also have a linking group of one alkyl group of a substituent.

作為上述伸烷基與上述伸芳基經連接之基的具體例,可列舉以下者。 Specific examples of the group in which the alkylene group and the above-mentioned extended aryl group are bonded to each other include the following.

其中,由分散性之觀點而言,較佳為上式(0-5)所示之基。 Among them, from the viewpoint of dispersibility, the group represented by the above formula (0-5) is preferred.

作為此等之伸烷基、伸芳基、伸烷基與伸芳基經連接 之基亦可具有的取代基,並無特別限定,可列舉例如烷基、芳基、芳烷基等。 As such alkylene, aryl, alkyl and aryl groups are attached The substituent which the group may have is not particularly limited, and examples thereof include an alkyl group, an aryl group, and an aralkyl group.

上述烷基之碳數並無特別限定,較佳為1~20、更佳為1~10、再更佳為1~5。烷基可為直鏈狀、分岐鏈狀、或環狀。具體例可列舉甲基、乙基、環己基等。 The carbon number of the alkyl group is not particularly limited, but is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic. Specific examples thereof include a methyl group, an ethyl group, a cyclohexyl group and the like.

又,上述芳基之碳數並無特別限定,較佳為6~20、更佳為6~10。具體例可列舉苯基、萘基等。 Further, the carbon number of the aryl group is not particularly limited, but is preferably 6 to 20, more preferably 6 to 10. Specific examples thereof include a phenyl group and a naphthyl group.

又,上述芳烷基之碳數並無特別限定,較佳為7~20、更佳為7~10。具體例可列舉苄基等。 Further, the carbon number of the aralkyl group is not particularly limited, but is preferably 7 to 20, more preferably 7 to 10. Specific examples thereof include a benzyl group and the like.

此等之中,由操作容易或分散性的觀點而言,較佳為甲基。 Among these, a methyl group is preferable from the viewpoint of ease of handling or dispersibility.

此等之中,由分散性之觀點而言,更佳係Ra為上式(0-5)所示之基、上式(0-3)所示之基、或上式(0-1)所示之基。 Among these, from the viewpoint of dispersibility, it is more preferable that R a is a group represented by the above formula (0-5), a group represented by the above formula (0-3), or a above formula (0-1). ) The base shown.

另外,聚胺基甲酸酯分散劑(b-1)亦可後述之含親溶媒基部分構造彼此係藉由上式(i)所示之部分構造所連接。同樣地,亦可後述之含吸附基部分構造彼此係藉由上式(i)所示之部分構造所連接。又,亦可後述之含親溶媒基部分構造及後述之含吸附基部分構造係藉由上式(i)所示之部分構造所連接。 Further, the polyurethane dispersant (b-1) may be connected to each other by a partial structure shown by the above formula (i). Similarly, the structure containing the adsorption group described later may be connected to each other by a partial structure represented by the above formula (i). Further, the structure containing the hydrophilic solvent group to be described later and the structure containing the adsorption group described later are connected by a partial structure represented by the above formula (i).

如此,聚胺基甲酸酯分散劑(b-1)係藉由具有上式(i)所示之部分構造,可使含親溶媒基部分構造及含吸附基部分構造配置於直線上,並認為藉由此等部分構造之可動區域擴展而有可提高對溶媒之相溶性及對顏料之吸附性的傾向。 Thus, the polyurethane dispersant (b-1) has a partial structure represented by the above formula (i), and the structure containing the hydrophilic solvent group and the structure containing the adsorption group can be arranged on a straight line, and It is considered that the expansion of the movable region by such a partial structure tends to improve the compatibility with the solvent and the adsorption property to the pigment.

又,聚胺基甲酸酯分散劑(b-1)較佳係具有主鏈,該主鏈含有上式(i)所示之部分構造。如此,藉由採用上式(i)所示之高直線性的部分構造作為主鏈所含有之部分構造,可使含親溶媒基部分 構造及含吸附基部分構造配置於直線上,並認為藉由此等部分構造之可動區域擴展而有可提高對溶媒之相溶性及對顏料之吸附性的傾向。 Further, the polyurethane dispersant (b-1) preferably has a main chain containing a partial structure represented by the above formula (i). Thus, by using the highly linear partial structure represented by the above formula (i) as a partial structure contained in the main chain, the solvent-containing portion can be contained. The structure and the structure containing the adsorption group are arranged on a straight line, and it is considered that the expansion of the movable region by such a partial structure tends to improve the compatibility with the solvent and the adsorption property to the pigment.

尚且,本說明書中,所謂聚胺基甲酸酯分散劑(b-1)所具有之主鏈,係指由2個以上胺基甲酸乙酯鍵所連接的鏈,意指最長之鏈。 In the present specification, the main chain of the polyurethane dispersant (b-1) means a chain which is linked by two or more urethane bonds, and means the longest chain.

作為較佳實施形態,可列舉主鏈之聚胺基甲酸酯骨架為直鏈構造的形態。此時,主鏈中,除了與親溶媒基之鍵結部、吸附基及與吸附基之鍵結部以外,均成為直鏈構造。如此,在聚胺基甲酸酯骨架為直鏈時,有親溶媒基對溶媒之相溶性、或吸附基對顏料之吸附變得良好的傾向。尤其是藉由聚胺基甲酸酯骨架為直鏈,有促進胺基甲酸乙酯鍵之氮原子所進行之顏料吸附、分散性良好的傾向。 In a preferred embodiment, the polyurethane skeleton of the main chain has a linear structure. At this time, the main chain has a linear structure except for the bonding portion with the lyophilic solvent group, the adsorption group, and the bonding portion with the adsorption group. As described above, when the polyurethane skeleton is linear, the compatibility of the solvent-soluble solvent with the solvent or the adsorption of the adsorbing group to the pigment tends to be good. In particular, when the polyurethane skeleton is linear, the adsorption and dispersibility of the pigment by the nitrogen atom which promotes the urethane bond tend to be good.

又,聚胺基甲酸酯分散劑(b-1)中之上式(i)所示之部分構造的含有比例並無特別限定,由分散性之觀點而言,較佳為5莫耳%以上、更佳為10莫耳%以上,且較佳為90莫耳%以下、更佳為80莫耳%以下。 Further, the content ratio of the partial structure represented by the above formula (i) in the polyurethane dispersant (b-1) is not particularly limited, and is preferably 5 mol% from the viewpoint of dispersibility. The above, more preferably 10 mol% or more, and preferably 90 mol% or less, more preferably 80 mol% or less.

同樣地,由分散性之觀點而言,聚胺基甲酸酯分散劑(b-1)中之上式(i)所示之部分構造的含有比例,較佳為5質量%以上、更佳為10質量%以上,且較佳為90質量%以下、更佳為80質量%以下。 Similarly, from the viewpoint of dispersibility, the content ratio of the partial structure represented by the above formula (i) in the polyurethane dispersant (b-1) is preferably 5% by mass or more, more preferably It is 10% by mass or more, and preferably 90% by mass or less, more preferably 80% by mass or less.

(吸附基) (adsorption base)

聚胺基甲酸酯分散劑(b-1)所具有之吸附基並無特別限定,由分 散性之觀點而言,較佳為選自包含3級胺基、4級銨鹽基、及含氮原子雜環基之群組中之至少1種(以下有時簡記為「特定之吸附基」)。 The adsorption group of the polyurethane dispersant (b-1) is not particularly limited, and is determined by From the viewpoint of the dispersibility, it is preferably at least one selected from the group consisting of a tertiary amino group, a quaternary ammonium salt group, and a nitrogen atom-containing heterocyclic group (hereinafter sometimes abbreviated as "specific adsorption group" ").

又,在聚胺基甲酸酯分散劑(b-1)具有主鏈時,由分散性的觀點而言,吸附基較佳係主鏈中或與主鏈鍵結之選自包含3級胺基、4級銨鹽基、及含氮原子雜環基之群組中之至少1種。 Further, when the polyurethane dispersant (b-1) has a main chain, from the viewpoint of dispersibility, the adsorbing group is preferably selected from the main chain or bonded to the main chain and selected from the group consisting of a tertiary amine. At least one of the group of a quaternary group, a quaternary ammonium salt group, and a nitrogen atom-containing heterocyclic group.

聚胺基甲酸酯分散劑(b-1)較佳係含有包括上述吸附基之含吸附基部分構造;如上所述,由分散性的觀點而言,較佳係含吸附基部分構造彼此、或含吸附基部分構造與後述之含親溶媒基部分構造藉由上式(i)所示之部分構造連接者。 The polyurethane dispersant (b-1) preferably contains an adsorption group-containing moiety structure including the above-mentioned adsorption group; as described above, from the viewpoint of dispersibility, it is preferred that the adsorption group-containing moiety is configured to each other, The structure containing the adsorption group portion and the structure containing the hydrophilic solvent group described later are connected by a partial structure shown by the above formula (i).

(含吸附基部分構造1) (including adsorption group part structure 1)

關於含吸附基部分構造之具體之部分構造並無特別限定,較佳係下式(1)所示之部分構造。 The specific structure of the structure including the adsorption group portion is not particularly limited, and is preferably a partial structure represented by the following formula (1).

式(1)中,R1表示亦可具有取代基之烷基或芳基,R2及R3分別獨立表示亦可具有取代基之伸烷基、伸芳基伸烷基、或伸芳基。 In the formula (1), R 1 represents an alkyl group or an aryl group which may have a substituent, and R 2 and R 3 each independently represent an alkylene group, an extended arylalkyl group or an extended aryl group which may have a substituent.

*表示鍵結基。 * indicates the bond base.

R1之烷基的碳數並無特別限定,通常為1以上、較佳為2以上,且較佳為20以下、更佳為10以下、再更佳為6以下。若為上述範圍內,有分散性良好之傾向。具體而言,可列舉例如甲 基、乙基、丙基、丁基、戊基、己基、環戊基、環己基、環庚基及環辛基等。由分散性之觀點而言,較佳為甲基、乙基、丙基、環戊基、或環己基,更佳為甲基、乙基、或環己基,再更佳為甲基或環己基。 The carbon number of the alkyl group of R 1 is not particularly limited, but is usually 1 or more, preferably 2 or more, and is preferably 20 or less, more preferably 10 or less, still more preferably 6 or less. If it is in the above range, there is a tendency that the dispersibility is good. Specific examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. From the viewpoint of dispersibility, it is preferably a methyl group, an ethyl group, a propyl group, a cyclopentyl group or a cyclohexyl group, more preferably a methyl group, an ethyl group or a cyclohexyl group, still more preferably a methyl group or a cyclohexyl group. .

R1之芳基的碳數並無特別限定,通常為6以上,且較佳為30以下、更佳為20以下、再更佳為15以下。若為上述範圍內,有分散性良好之傾向。具體而言,可列舉例如苯基及萘基等,由分散性之觀點而言,較佳為苯基。 The carbon number of the aryl group of R 1 is not particularly limited, but is usually 6 or more, and is preferably 30 or less, more preferably 20 or less, still more preferably 15 or less. If it is in the above range, there is a tendency that the dispersibility is good. Specific examples thereof include a phenyl group and a naphthyl group, and a phenyl group is preferred from the viewpoint of dispersibility.

作為此等烷基、芳基亦可具有之取代基並無特別限定,可列舉羥基;羧基;甲基、乙基、丙基、環己基等之烷基;苯基等之芳基;苄基等之芳烷基等。 The substituent which the alkyl group and the aryl group may have is not particularly limited, and examples thereof include a hydroxyl group; a carboxyl group; an alkyl group such as a methyl group, an ethyl group, a propyl group or a cyclohexyl group; an aryl group such as a phenyl group; and a benzyl group. Etc. aralkyl and the like.

上述烷基之碳數並無特別限定,較佳為1~20、更佳為1~10、再更佳為1~5。烷基可為直鏈狀、分岐鏈狀、或環狀。具體例可列舉甲基、乙基、環己基等。 The carbon number of the alkyl group is not particularly limited, but is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic. Specific examples thereof include a methyl group, an ethyl group, a cyclohexyl group and the like.

又,上述芳基之碳數並無特別限定,較佳為6~20、更佳為6~10。具體例可列舉苯基、萘基等。 Further, the carbon number of the aryl group is not particularly limited, but is preferably 6 to 20, more preferably 6 to 10. Specific examples thereof include a phenyl group and a naphthyl group.

又,上述芳烷基之碳數並無特別限定,較佳為7~20、更佳為7~10。具體例可列舉苄基等。 Further, the carbon number of the aralkyl group is not particularly limited, but is preferably 7 to 20, more preferably 7 to 10. Specific examples thereof include a benzyl group and the like.

此等之中,由對顏料之吸附力的觀點而言,較佳為羥基、甲基或乙基。 Among these, from the viewpoint of the adsorption force to the pigment, a hydroxyl group, a methyl group or an ethyl group is preferred.

又,上述R1中,由分散性之觀點而言,R1較佳為烷基。 Further, in the above R 1 , R 1 is preferably an alkyl group from the viewpoint of dispersibility.

又,R2及R3中之伸烷基的碳數並無特別限定,通常為1以上、較佳為2以上,且較佳為20以下、更佳為15以下、再 更佳為7以下。若為上述範圍內,有分散性良好之傾向。具體而言,可列舉例如亞甲基、伸乙基、伸丙基、伸丁基、伸環戊基亞甲基、伸環己基亞甲基、伸環己基伸乙基及伸環己基伸丙基等。由分散性之觀點而言,較佳為亞甲基、伸乙基、或伸環己基亞甲基,更佳為伸乙基。 Further, the carbon number of the alkylene group in R 2 and R 3 is not particularly limited, but is usually 1 or more, preferably 2 or more, and preferably 20 or less, more preferably 15 or less, still more preferably 7 or less. . If it is in the above range, there is a tendency that the dispersibility is good. Specifically, for example, a methylene group, an ethylidene group, a propyl group, a butyl group, a cyclopentylmethylene group, a cyclohexylmethylene group, a cyclohexylethyl group, and a cyclohexyl group are mentioned. Base. From the viewpoint of dispersibility, a methylene group, an ethyl group, or a cyclohexylmethylene group is preferred, and an ethyl group is more preferred.

R2及R3中之伸芳基伸烷基(伸烷基與伸芳基經連接之基)的碳數並無特別限定,通常為7以上、較佳為8以上,且較佳為30以下、更佳為20以下、再更佳為15以下。若為上述範圍內,有分散性良好之傾向。具體而言,可列舉伸苯基亞甲基、伸苯基伸乙基及伸苯基伸丙基等。由分散性的觀點而言,較佳為伸苯基亞甲基。 The carbon number of the extended arylalkyl group (the alkyl group and the extended aryl group) in R 2 and R 3 is not particularly limited, but is usually 7 or more, preferably 8 or more, and preferably 30 or less. More preferably, it is 20 or less, and even more preferably 15 or less. If it is in the above range, there is a tendency that the dispersibility is good. Specific examples thereof include a phenylmethylene group, a phenylethyl group, and a phenylphenyl group. From the viewpoint of dispersibility, a phenylmethylene group is preferred.

R2及R3中之伸芳基的碳數並無特別限定,通常為6以上,且較佳為30以下、更佳為20以下、再更佳為15以下。若為上述範圍內,有分散性良好之傾向。具體而言,可列舉伸苯基及伸萘基等。由分散性的觀點而言,較佳為伸苯基。 The carbon number of the extended aryl group in R 2 and R 3 is not particularly limited, but is usually 6 or more, and is preferably 30 or less, more preferably 20 or less, still more preferably 15 or less. If it is in the above range, there is a tendency that the dispersibility is good. Specific examples thereof include a stretching phenyl group and a stretching naphthyl group. From the viewpoint of dispersibility, a phenyl group is preferred.

此等之伸烷基、伸芳基伸烷基及伸芳基亦可具有之取代基並無特別限定,可列舉例如羥基;羧基;甲基、乙基、丙基、環己基等之烷基;苯基等之芳基;苄基等之芳烷基等。 The substituents which may be contained in the alkylene group, the extended alkylene group and the extended aryl group are not particularly limited, and examples thereof include a hydroxyl group; a carboxyl group; an alkyl group such as a methyl group, an ethyl group, a propyl group or a cyclohexyl group; An aryl group such as a phenyl group; an aralkyl group such as a benzyl group; and the like.

上述烷基之碳數並無特別限定,較佳為1~20、更佳為1~10、再更佳為1~5。烷基可為直鏈狀、分岐鏈狀、或環狀。具體例可列舉甲基、乙基、環己基等。 The carbon number of the alkyl group is not particularly limited, but is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic. Specific examples thereof include a methyl group, an ethyl group, a cyclohexyl group and the like.

又,上述芳基之碳數並無特別限定,較佳為6~20、更佳為6~10。具體例可列舉苯基、萘基等。 Further, the carbon number of the aryl group is not particularly limited, but is preferably 6 to 20, more preferably 6 to 10. Specific examples thereof include a phenyl group and a naphthyl group.

又,上述芳烷基之碳數並無特別限定,較佳為7~20、更佳為 7~10。具體例可列舉苄基等。 Further, the carbon number of the aralkyl group is not particularly limited, but is preferably 7 to 20, more preferably 7~10. Specific examples thereof include a benzyl group and the like.

此等之中,由抑制分子間之立體障礙的觀點而言,較佳為羥基、甲基或乙基。 Among these, from the viewpoint of suppressing steric hindrance between molecules, a hydroxyl group, a methyl group or an ethyl group is preferred.

R2及R3可為相同或相異,由分散性之觀點而言,較佳為相同。此等之中,由分散性之觀點而言,R2及R3較佳係分別獨立為伸烷基。 R 2 and R 3 may be the same or different, and are preferably the same from the viewpoint of dispersibility. Among these, from the viewpoint of dispersibility, R 2 and R 3 are each preferably independently an alkylene group.

作為上式(1)所示之部分構造的具體例,可列舉以下者。 Specific examples of the partial structure shown in the above formula (1) include the following.

尚且,上式(1)所示之部分構造中,式(1)全體成為包含3級胺基的吸附基。又,藉由將式(1)所示之部分構造、與其他之含吸附基部分構造或含親溶媒基部分構造,以上式(i)所示之部分構造連接,可使式(1)所示之吸附基配置在聚胺基甲酸酯分散劑(b-1)之主鏈中。此時,上式(1)之*係表示主鏈之聚胺基甲酸酯骨架中之與胺基甲酸乙酯鍵之羰基間的鍵結基。 Further, in the partial structure represented by the above formula (1), the entire formula (1) is an adsorption group containing a tertiary amino group. Further, by the partial structure shown in the formula (1) and the other adsorption group-containing portion structure or the hydrophilic solvent-containing portion structure, the partial structure shown in the above formula (i) can be connected to obtain the formula (1). The adsorbent group shown is disposed in the main chain of the polyurethane dispersant (b-1). At this time, the * of the above formula (1) represents a bond group between the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

另外,作為其他例子,較佳為具有下式(1')所示之部分構造。 Further, as another example, it is preferable to have a partial structure represented by the following formula (1').

[化13] [Chemistry 13]

式(1')中,R1~R3及*係與上式(1)中之該等同義。RA表示亦可具有取代基之烷基或芳基。X-表示1價陰離子。 In the formula (1'), R 1 to R 3 and * are equivalent to those in the above formula (1). R A represents an alkyl group or an aryl group which may have a substituent. X - represents a monovalent anion.

作為RA之烷基或芳基,可較佳地採用作為R1所列舉者。 As the alkyl group or the aryl group of R A , those exemplified as R 1 can be preferably used.

X-若為1價陰離子則無特別限定,由分散性之觀點而言,X-較佳為氯陰離子等之鹵素陰離子、或甲基硫酸陰離子,更佳為鹵素陰離子,再更佳為氯陰離子。式(1')之4級銨鹽基可藉由對式(1)之3級胺基進行4級化而獲得,此時,有X-為來自4級化劑之陰離子的情形。 X - is a monovalent anion, and is not particularly limited. From the viewpoint of dispersibility, X - is preferably a halogen anion such as a chlorine anion or a methyl sulfate anion, more preferably a halogen anion, and even more preferably a chloride anion. . Formula (1 ') of the ammonium salt of 4-yl may be performed by three stages of the amine of formula (1) is obtained of this case, there is X - is the anion of 4 stages from the case of the agent.

尚且,上式(1')所示之部分構造中,式(1')全體成為包含4級銨鹽基之吸附基。又,藉由將式(1')所示之部分構造、與其他之含吸附基部分構造或含親溶媒基部分構造以上式(i)所示之部分構造連接,可將式(1')所示之吸附基配置於聚胺基甲酸酯分散劑(b-1)之主鏈中。 Further, in the partial structure represented by the above formula (1'), the entire formula (1') is an adsorption group containing a 4-stage ammonium salt group. Further, the formula (1') can be obtained by connecting a partial structure represented by the formula (1') to a part of the structure represented by the above formula (i) in the structure of the other adsorbing group-containing moiety or the containing solvent-containing moiety. The adsorbent group shown is disposed in the main chain of the polyurethane dispersant (b-1).

又,作為其他具體例,可列舉以下所示之部分構造。以下部分構造全體成為包含含氮原子雜環基的吸附基。包含含氮原子雜環基之吸附基,由於顯示與顏料間之離子性鍵結、及緊束效果所造成之疏水性鍵結,故認為發揮與3級胺基或4級銨鹽基相同的作用,顯示良好的顏料吸附性。 Moreover, as another specific example, the partial structure shown below is mentioned. The following partial structures are all an adsorption group containing a heterocyclic group containing a nitrogen atom. The adsorbing group containing a heterocyclic group containing a nitrogen atom is considered to be the same as the tertiary amine group or the tertiary ammonium salt group because it exhibits hydrophobic bonding due to ionic bonding with a pigment and a tight binding effect. Function, showing good pigment adsorption.

又,藉由將該部分構造、與其他之含吸附基部分構造或含親溶媒基部分構造,以上式(i)所示之部分構造連接,可將該部分構造所示之吸附基配置於聚胺基甲酸酯分散劑(b-1)的主鏈中。 Further, by the partial structure, the other adsorption group-containing partial structure or the affinity-containing medium-containing partial structure, the partial structure shown in the above formula (i) is connected, and the adsorption group shown in the partial structure can be disposed in the poly The urethane dispersant (b-1) is in the main chain.

上式中,*表示鍵結基。 In the above formula, * represents a bond group.

(含吸附基部分構造2) (including adsorption group part structure 2)

作為其他較佳例子,較佳為下式(2-1)~(2-3)所示之至少1種部分構造。藉由具有下式(2-1)~(2-3)所示之至少1種部分構造,有緩和吸附部分之立體障礙,且因提升吸附部之空間自由度而可有效率地吸附至顏料的傾向。 As another preferable example, at least one partial structure represented by the following formulas (2-1) to (2-3) is preferable. By having at least one partial structure represented by the following formulas (2-1) to (2-3), the steric hindrance of the adsorbed portion is alleviated, and the pigment can be efficiently adsorbed to the pigment by increasing the spatial freedom of the adsorbing portion. Propensity.

式(2-1)中,Rα及Rβ分別獨立表示亦可具有取代基之烷基或芳基。 In the formula (2-1), R α and R β each independently represent an alkyl group or an aryl group which may have a substituent.

Rγ、Rδ及Rε分別獨立表示亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基。其中,在Rγ為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取 代。又,Rγ亦可經由-NH-(C=O)-基而與相鄰接之至少任一個N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結。 R γ , R δ and R ε each independently represent an alkylene group which may have a substituent, an extended aryl group which may have a substituent, or a group in which the above-mentioned alkylene group is bonded to the above-mentioned extended aryl group. Wherein, when R γ is an alkyl group which may have a substituent, or a group in which the above alkyl group is bonded to the above-mentioned extended aryl group, at least a part of the methylene group constituting the above alkyl group may also be selected from At least one of the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, a quinone bond, a thiomethacrylate bond, a thioether bond, and a thioester bond Replaced. Further, R γ may be bonded to at least one of the adjacent N atoms via the —NH—(C=O)— group, or may be subjected to a guanamine bond via a carbonyl group.

*為鍵結基。 * is the bonding base.

式(2-2)中,Rα及Rβ分別獨立表示亦可具有取代基之烷基或芳基;Rγ及Rη分別獨立表示亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基。其中,在Rγ及Rη分別獨立為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代。又,Rγ及Rη亦可經由-NH-(C=O)-基而與相鄰接之至少任一個N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結。 In the formula (2-2), R α and R β each independently represent an alkyl group or an aryl group which may have a substituent; and R γ and R η each independently represent an alkyl group which may have a substituent, or may have a substitution. a aryl group or a group in which the above alkyl group is bonded to the above aryl group. Wherein, when R γ and R η are each independently an alkyl group which may have a substituent or a group in which the above alkyl group is bonded to the above-mentioned extended aryl group, at least a part of the methylene group constituting the above alkyl group is also By being selected from the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, a quinone bond, a thiocarbamate bond, a thioether bond, and a thioester bond Replaced by at least one key. Further, R γ and R η may be bonded to at least one of the adjacent N atoms via a -NH-(C=O)- group, or may be subjected to a guanamine bond via a carbonyl group.

*為鍵結基。 * is the bonding base.

式(2-3)中,Rα及Rβ分別獨立表示亦可具有取代基之烷基或芳基。 In the formula (2-3), R α and R β each independently represent an alkyl group or an aryl group which may have a substituent.

Rγ'及Rδ分別獨立表示亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基。其中,在Rγ'為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代。又,Rγ'亦可經由-NH-(C=O)-基而與相鄰接之N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結。 R γ ' and R δ each independently represent an alkylene group which may have a substituent, an extended aryl group which may have a substituent, or a group in which the above alkylene group is bonded to the above-mentioned extended aryl group. Wherein, when R γ' is an alkylene group which may have a substituent, or a group in which the above alkylene group is bonded to the above-mentioned extended aryl group, at least a part of the methylene group constituting the above alkylene group may also be selected At least one of the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, a quinone bond, an ethyl thioate bond, a thioether bond, and a thioester bond Replaced by the key. Further, R γ ' may be bonded to an adjacent N atom via a -NH-(C=O)- group, or a guanamine bond may be carried out via a carbonyl group.

Rε'表示直接鍵結、亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基。 R ε ' represents a direct bond, an alkyl group which may have a substituent, an extended aryl group which may have a substituent, or a group in which the above alkyl group is bonded to the above-mentioned extended aryl group.

Rζ表示氫原子、亦可具有取代基之烷基、或亦可具有取代基之芳基。其中,在Rζ為烷基或芳基時,其氫原子之至少一個亦可藉由3級胺基或含氮原子雜環基所取代。 R ζ represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. Wherein, when R ζ is an alkyl group or an aryl group, at least one of the hydrogen atoms thereof may be substituted by a tertiary amino group or a nitrogen atom-containing heterocyclic group.

*為鍵結基。 * is the bonding base.

上式(2-1)~(2-3)中,Rα、Rβ及Rζ之烷基的碳數並無特別限定,通常為1以上,且較佳為20以下、更佳為10以下、再更佳為2以下。若為上述範圍內,有分散性良好之傾向。 In the above formulas (2-1) to (2-3), the carbon number of the alkyl groups of R α , R β and R ζ is not particularly limited, but is usually 1 or more, and preferably 20 or less, more preferably 10 or less. The following, more preferably 2 or less. If it is in the above range, there is a tendency that the dispersibility is good.

具體而言,可列舉例如甲基、乙基、丙基、丁基、戊基、己基、環戊基、環己基、環庚基及環辛基等。由分散性之觀點而言,較佳為甲基、乙基、丙基、環戊基、或環己基,更佳為甲基、或乙基,再更佳為甲基。 Specific examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. From the viewpoint of dispersibility, a methyl group, an ethyl group, a propyl group, a cyclopentyl group or a cyclohexyl group is preferred, and a methyl group or an ethyl group is more preferred, and a methyl group is more preferred.

Rα、Rβ及Rζ之芳基的碳數並無特別限定,通常為6以上,且較佳為30以下、更佳為20以下、再更佳為15以下。若為上述範圍內,有分散性良好之傾向。具體而言,可列舉例如苯基 及萘基等,由分散性之觀點而言,較佳為苯基。 The carbon number of the aryl group of R α , R β and R ζ is not particularly limited, but is usually 6 or more, and is preferably 30 or less, more preferably 20 or less, still more preferably 15 or less. If it is in the above range, there is a tendency that the dispersibility is good. Specific examples thereof include a phenyl group and a naphthyl group, and a phenyl group is preferred from the viewpoint of dispersibility.

Rα及Rβ可為相同或相異,由分散性之觀點而言,較佳為相同。 R α and R β may be the same or different, and are preferably the same from the viewpoint of dispersibility.

作為此等烷基及芳基亦可具有之取代基並無特別限定,可列舉例如羥基;羧基;甲基、乙基、丙基、環己基等之烷基;苯基等之芳基;苄基等之芳烷基等。 The substituent which the alkyl group and the aryl group may have is not particularly limited, and examples thereof include a hydroxyl group; a carboxyl group; an alkyl group such as a methyl group, an ethyl group, a propyl group or a cyclohexyl group; an aryl group such as a phenyl group; and a benzyl group; An aralkyl group or the like.

上述烷基之碳數並無特別限定,較佳為1~20、更佳為1~10、再更佳為1~5。烷基可為直鏈狀、分岐鏈狀、或環狀。具體例可列舉甲基、乙基、環己基等。 The carbon number of the alkyl group is not particularly limited, but is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic. Specific examples thereof include a methyl group, an ethyl group, a cyclohexyl group and the like.

又,上述芳基之碳數並無特別限定,較佳為6~20、更佳為6~10。具體例可列舉苯基、萘基等。 Further, the carbon number of the aryl group is not particularly limited, but is preferably 6 to 20, more preferably 6 to 10. Specific examples thereof include a phenyl group and a naphthyl group.

又,上述芳烷基之碳數並無特別限定,較佳為7~20、更佳為7~10。具體例可列舉苄基等。 Further, the carbon number of the aralkyl group is not particularly limited, but is preferably 7 to 20, more preferably 7 to 10. Specific examples thereof include a benzyl group and the like.

此等之中,由不因分子間立體障礙而阻礙顏料吸附的觀點而言,較佳為羥基、甲基或乙基。 Among these, a hydroxyl group, a methyl group or an ethyl group is preferable from the viewpoint of not inhibiting the adsorption of the pigment by the intermolecular steric hindrance.

又,由分散性之觀點而言,Rα及Rβ較佳係分別獨立為烷基。又,由分散性之觀點而言,Rζ較佳為氫原子或烷基。 Further, from the viewpoint of dispersibility, R α and R β are each preferably independently an alkyl group. Further, R ζ is preferably a hydrogen atom or an alkyl group from the viewpoint of dispersibility.

上式(2-1)~(2-3)中,Rγ、Rγ'、Rδ、Rε、Rε'及Rη之亦可具有取代基之伸烷基的碳數並無特別限定,通常為1以上、較佳為2以上,且較佳為30以下、更佳為20以下、再更佳為15以下。若為上述範圍內,有分散性良好之傾向。 In the above formulas (2-1) to (2-3), the carbon number of the alkyl group of R γ , R γ′ , R δ , R ε , R ε′ and R η which may have a substituent is not particularly The limit is usually 1 or more, preferably 2 or more, and is preferably 30 or less, more preferably 20 or less, still more preferably 15 or less. If it is in the above range, there is a tendency that the dispersibility is good.

伸烷基可為鏈狀或環狀,又,亦可為鏈狀之伸烷基與環狀之伸烷基經連接者。由分散性之觀點而言,較佳係鏈狀之伸烷基。 The alkyl group may be a chain or a ring, or may be a chain alkyl group and a cyclic alkyl group. From the viewpoint of dispersibility, a chain-like alkyl group is preferred.

具體而言,可列舉例如亞甲基、二亞甲基、三亞甲基、四亞甲基、伸環戊基亞甲基、伸環己基亞甲基、伸環己基二亞甲基及伸環己基三亞甲基等。由分散性之觀點而言,較佳為亞甲基、二亞甲基、或三亞甲基,更佳為二亞甲基或三亞甲基。 Specific examples thereof include a methylene group, a dimethylene group, a trimethylene group, a tetramethylene group, a cyclopentylenemethylene group, a cyclohexylenemethylene group, a cyclohexylenemethylene group, and a stretching ring. Hexyltrimethylene and the like. From the viewpoint of dispersibility, a methylene group, a dimethylene group or a trimethylene group is preferred, and a dimethylene group or a trimethylene group is more preferred.

作為在Rγ、Rγ'、Rδ、Rε、Rε'及Rη為亦可具有取代基之伸烷基時之上式(2-1)~(2-3)的具體構造,可列舉例如以下構造。 The specific structure of the above formula (2-1) to (2-3) when R γ , R γ′ , R δ , R ε , R ε′ and R η are an alkylene group which may have a substituent, For example, the following structure can be mentioned.

上式(2-1)~(2-3)中,Rγ、Rγ'、Rδ、Rε、Rε'及Rη之亦可具有取代基之伸烷基、與亦可具有取代基之伸芳基經連接之基的碳數,並無特別限定,通常為6以上、較佳為7以上,且較佳為30以下、更佳為20以下、再更佳為15以下。若為上述範圍內,有分散性良好的傾向。又,若伸烷基之數量為1以上則無特別限定,由分散性之觀點而言較佳為3以下。 In the above formulas (2-1) to (2-3), R γ , R γ′ , R δ , R ε , R ε′ and R η may further have a substituent alkyl group and may also have a substitution. The number of carbon atoms of the aryl group to be bonded is not particularly limited, but is usually 6 or more, preferably 7 or more, and is preferably 30 or less, more preferably 20 or less, still more preferably 15 or less. If it is in the above range, there is a tendency that the dispersibility is good. Further, the number of alkylene groups is not particularly limited as long as the number of alkylene groups is 1 or more, and is preferably 3 or less from the viewpoint of dispersibility.

具體而言,可列舉例如:亦可具有取代基之伸芳基1個與亦可具有取代基之伸烷基1個經連接的基;亦可具有取代基之伸芳基2個經由亦可具有取代基之伸烷基1個所連接的基;亦可具有取代基之伸烷基2個經由亦可具有取代基之伸芳基1個所連接的基;以及使亦可具有取代基之伸烷基與亦可具有取代基之伸芳基交替連接的基。 Specifically, for example, one of the extended aryl groups which may have a substituent and one extended alkyl group which may have a substituent may be mentioned; or two of the extended aryl groups which may have a substituent may also be used. a group to which one alkyl group having a substituent has a substituent; a group of a pendant alkyl group which may have a substituent, which is bonded to one of the extended aryl groups which may have a substituent; and an alkylene group which may have a substituent A group which is alternately bonded to an extended aryl group which may have a substituent.

作為上述伸烷基與上述伸芳基經連接之基的具體例,可列舉以下者。 Specific examples of the group in which the alkylene group and the above-mentioned extended aryl group are bonded to each other include the following.

其中,由分散性之觀點而言,較佳為上式(b3)所示之基。 Among them, from the viewpoint of dispersibility, the group represented by the above formula (b3) is preferred.

作為在Rγ、Rγ'、Rδ、Rε、Rε'及Rη之至少任一者為上述伸烷基與上述伸芳基經連接之基時之上式(2-1)~(2-3)之具體構造,可列舉例如以下構造。 When at least one of R γ , R γ′ , R δ , R ε , R ε′ and R η is a group in which the above-mentioned alkylene group and the above-mentioned extended aryl group are bonded, the above formula (2-1)~ The specific structure of (2-3) is, for example, the following structure.

此等之中,由分散性之觀點而言,較佳係如(2-1-b)、(2-2-b)、(2-3-b)等般,Rγ或Rγ'為亦可具有取代基之伸烷基與亦可具有取代基之伸芳基經連接的基者。此時,由分散性之觀點而言,較 佳係Rδ、Rε、Rε'及Rη為伸烷基。 Among these, from the viewpoint of dispersibility, it is preferably such that (2-1-b), (2-2-b), (2-3-b), etc., R γ or R γ ' is The alkyl group having a substituent may be bonded to a base having a substituent having an extended aryl group. In this case, from the viewpoint of dispersibility, R δ , R ε , R ε ' and R η are preferably an alkylene group.

上式(2-1)~(2-3)中,Rγ、Rγ'、Rδ、Rε、Rε'及Rη之亦可具有取代基之伸芳基的碳數並無特別限定,通常為6以上,且較佳為30以下、更佳為20以下、再更佳為15以下。若為上述範圍內,有分散性良好之傾向。具體而言,可列舉例如伸苯基及伸萘基等,由分散性的觀點而言,較佳為伸苯基。 In the above formulas (2-1) to (2-3), the carbon number of the aryl group which may have a substituent of R γ , R γ′ , R δ , R ε , R ε′ and R η is not particularly The limit is usually 6 or more, and is preferably 30 or less, more preferably 20 or less, still more preferably 15 or less. If it is in the above range, there is a tendency that the dispersibility is good. Specific examples thereof include a phenylene group and a naphthyl group, and from the viewpoint of dispersibility, a phenyl group is preferred.

作為在Rγ、Rγ'、Rδ、Rε、Rε'及Rη之至少任一者為伸芳基時之上式(2-1)~(2-3)之具體構造,可列舉例如以下構造。 The specific structure of the above formula (2-1) to (2-3) when at least one of R γ , R γ′ , R δ , R ε , R ε′ and R η is an exoaryl group, For example, the following configurations are listed.

此等之中,由分散性之觀點而言,較佳係如(2-1-c)、(2-2-c)、(2-3-c)等般,Rγ或Rγ'為伸芳基者。 Among these, from the viewpoint of dispersibility, it is preferably (2-1-c), (2-2-c), (2-3-c), etc., and R γ or R γ ' is Yan Fangji.

上式(2-1)~(2-3)中,作為Rγ、Rγ'、Rδ、Rε、Rε'及Rη之伸烷基、伸芳基、伸烷基與伸芳基經連接之基亦可具有的取代基,並無特別限定,可列舉例如甲基、乙基、環己基等之烷基;苯基等之芳基;苄基等之芳烷基等。 In the above formula (2-1) to (2-3), as an alkyl group, an aryl group, an alkyl group and a aryl group as R γ , R γ ' , R δ , R ε , R ε ' and R η The substituent which the base group may have is not particularly limited, and examples thereof include an alkyl group such as a methyl group, an ethyl group or a cyclohexyl group; an aryl group such as a phenyl group; an aralkyl group such as a benzyl group; and the like.

上述烷基之碳數並無特別限定,較佳為1~20、更佳為1~10、 再更佳為1~5。烷基可為直鏈狀、分岐鏈狀、或環狀。具體例可列舉甲基、乙基、環己基等。 The carbon number of the alkyl group is not particularly limited, but is preferably 1 to 20, more preferably 1 to 10. More preferably, it is 1~5. The alkyl group may be linear, branched, or cyclic. Specific examples thereof include a methyl group, an ethyl group, a cyclohexyl group and the like.

又,上述芳基之碳數並無特別限定,較佳為6~20、更佳為6~10。具體例可列舉苯基、萘基等。 Further, the carbon number of the aryl group is not particularly limited, but is preferably 6 to 20, more preferably 6 to 10. Specific examples thereof include a phenyl group and a naphthyl group.

又,上述芳烷基之碳數並無特別限定,較佳為7~20、更佳為7~10。具體例可列舉苄基等。 Further, the carbon number of the aralkyl group is not particularly limited, but is preferably 7 to 20, more preferably 7 to 10. Specific examples thereof include a benzyl group and the like.

此等之中,由操作容易及分散性的觀點而言,較佳為甲基。 Among these, a methyl group is preferable from the viewpoint of ease of handling and dispersibility.

如上所述,在Rγ、Rγ'及Rη分別獨立為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代。此等之中,由分散性的觀點而言,作為較佳鍵結可列舉構成上述伸烷基之亞甲基之至少一部分係藉由胺基甲酸乙酯鍵或酯鍵所取代者。 As described above, when R γ , R γ ' and R η are each independently an alkyl group which may have a substituent, or a group in which the above alkyl group is bonded to the above-mentioned extended aryl group, the above-mentioned alkylene group is formed. At least a portion of the methyl group may also be selected from the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, a guanidine bond, a thiocarbamate bond, a thioether bond, and sulfur. At least one of the groups of ester bonds is replaced by at least one of the groups. Among these, from the viewpoint of dispersibility, as a preferred bond, at least a part of the methylene group constituting the above alkylene group is substituted by an urethane bond or an ester bond.

作為此時之上式(2-1)~(2-3)的具體構造,可列舉例如以下構造。 The specific structure of the above formulas (2-1) to (2-3) at this time includes, for example, the following structures.

[化22] [化22]

尤其是由分散性的觀點而言,較佳係上式(2-1)的Rγ為上述伸烷基與上述伸芳基經連接之基,且構成其伸烷基之亞甲基之一部分係如藉由胺基甲酸乙酯鍵所取代的上式(2-1-d')般者。 Particularly, from the viewpoint of dispersibility, R γ of the formula (2-1) is preferably a group in which the above alkyl group is bonded to the above-mentioned extended aryl group, and constitutes a part of the methylene group of the alkyl group. It is the above formula (2-1-d') which is substituted by a urethane bond.

又,由分散性之觀點而言,較佳係上式(2-2)之Rγ及Rη為伸烷基,且構成至少任一個伸烷基之亞甲基之至少一部分係如藉由酯鍵所取代的上式(2-2-d)或(2-2-d')般者。 Further, from the viewpoint of dispersibility, R γ and R η of the above formula (2-2) are preferably an alkylene group, and at least a part of a methylene group constituting at least one alkylene group is as The above formula (2-2-d) or (2-2-d') is substituted by an ester bond.

又,由分散性之觀點而言,較佳係如上式(2-3)之Rγ'、Rδ及Rε'之任一者均為無取代之伸烷基的上式(2-3-a)般者。又,亦可較佳地使用上式(2-3)之Rγ'為伸烷基、或上述伸烷基與上述伸芳基經連接之基,且構成其伸烷基之亞甲基之一部分係如藉由胺基甲酸乙酯鍵、硫胺基甲酸乙酯鍵、酯鍵或硫醚鍵所取代的上式(2-3-d)或(2-3-d')般者。 Further, from the viewpoint of dispersibility, it is preferred that any of R γ ' , R δ , and R ε ' in the above formula (2-3) is an unsubstituted alkylene group (2-3) -a) The same. Further, it is also preferred to use R γ ' of the above formula (2-3) as an alkylene group or a group in which the above alkyl group is bonded to the above-mentioned extended aryl group, and constitutes a methylene group of an alkyl group. A part is a compound of the above formula (2-3-d) or (2-3-d') which is substituted by a urethane bond, an thioglycolate bond, an ester bond or a thioether bond.

又,如上所述,Rγ亦可經由-NH-(C=O)-基而與相鄰接之至少任1個N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結。 Further, as described above, R γ may be bonded to at least one of the adjacent N atoms via the —NH—(C=O)— group, or may be subjected to a guanamine bond via a carbonyl group.

尤其是由分散性之觀點而言,較佳係上式(2-1)之Rγ與跟Rδ及Rε鍵結之N原子一起經由-NH-(C=O)-基進行脲鍵結。作為此時之上式(2-1)及(2-2)的具體構造,可列舉例如以下構造。 Particularly, from the viewpoint of dispersibility, it is preferred that R γ of the formula (2-1) and the N atom bonded to R δ and R ε together carry out a urea bond via the -NH-(C=O)- group. Knot. The specific structure of the above formulas (2-1) and (2-2) at this time includes, for example, the following structures.

又,如上所述,Rγ'亦可經由-NH-(C=O)-基而與相鄰接之N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結。作為此時之上式(2-3)的具體構造,可列舉例如以下構造。 Further, as described above, R γ ' may be bonded to an adjacent N atom via a -NH-(C=O)- group, or a guanamine bond may be carried out via a carbonyl group. The specific structure of the above formula (2-3) at this time includes, for example, the following structures.

同樣地,Rη亦可經由-NH-(C=O)-基而與相鄰接之N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結。作為此時之上式(2-2)的具體構造,可列舉例如以下構造。 Similarly, R η can also be bonded to an adjacent N atom via a -NH-(C=O)- group, or a guanamine linkage via a carbonyl group. The specific structure of the above formula (2-2) at this time includes, for example, the following structures.

[化25] [化25]

又,在Rζ為烷基或芳基時,其氫原子之至少1個亦可藉由3級胺基或含氮原子雜環基所取代。作為此時之上式(2-3)的具體構造,可列舉例如以下構造。 Further, when R ζ is an alkyl group or an aryl group, at least one of the hydrogen atoms may be substituted by a tertiary amino group or a nitrogen atom-containing heterocyclic group. The specific structure of the above formula (2-3) at this time includes, for example, the following structures.

以上所述之上式(2-1)~(2-3)中,由分散性的觀點而言,較佳為以下。 In the above formulas (2-1) to (2-3), from the viewpoint of dispersibility, the following is preferable.

上式(2-1)中,Rγ較佳為上述伸烷基與上述伸芳基經連接之基;此時,較佳係構成上述伸烷基之亞甲基之至少一部分藉由胺基甲酸乙酯鍵所取代,或經由-NH-(C=O)-基而與相鄰接之N原子一起進行脲鍵結。又,此時,Rδ、Rε較佳為伸烷基。作為此種具體例,可列舉以下所示之上式(2-1-e)。 In the above formula (2-1), R γ is preferably a group in which the above alkylene group is bonded to the above-mentioned extended aryl group; in this case, it is preferred that at least a part of the methylene group constituting the above alkyl group is made of an amine group. The ethyl formate bond is substituted or the urea bond is bonded to the adjacent N atom via the -NH-(C=O)- group. Further, in this case, R δ and R ε are preferably an alkylene group. As such a specific example, the above formula (2-1-e) is shown.

[化27] [化27]

又,上式(2-1)中,Rγ較佳為伸烷基;此時,較佳係構成伸烷基之亞甲基之至少一部分藉由酯鍵所取代。又,此時,Rδ、Rε較佳為伸烷基。作為此種具體例,可列舉以下所示之上式(2-1-d)。 Further, in the above formula (2-1), R γ is preferably an alkylene group; in this case, at least a part of the methylene group constituting the alkylene group is preferably substituted by an ester bond. Further, in this case, R δ and R ε are preferably an alkylene group. As such a specific example, the above formula (2-1-d) is shown below.

又,上式(2-2)中,Rγ較佳為上述伸烷基與上述伸芳基經連接之基;此時,較佳係構成上述伸烷基之亞甲基之至少一部分藉由胺基甲酸乙酯鍵所取代,或經由-NH-(C=O)-基而與相鄰接之N原子一起進行脲鍵結。又,此時,Rη較佳為伸烷基。作為此種具體例,可列舉以下所示之上式(2-2-e)。 Further, in the above formula (2-2), R γ is preferably a group in which the above alkyl group is bonded to the above-mentioned extended aryl group; in this case, at least a part of the methylene group constituting the above alkyl group is preferably used by The urethane bond is substituted or the urea bond is carried out together with the adjacent N atom via the -NH-(C=O)- group. Further, in this case, R η is preferably an alkylene group. As such a specific example, the above formula (2-2-e) is shown below.

又,上式(2-2)中,Rγ較佳為伸烷基;此時,較佳係構成上述伸烷基之亞甲基之至少一部分藉由酯鍵所取代。又,此時,Rη較佳為伸烷基。作為此種具體例,可列舉以下所示之上式(2-2-d)。 Further, in the above formula (2-2), R γ is preferably an alkylene group; in this case, at least a part of the methylene group constituting the above alkylene group is preferably substituted by an ester bond. Further, in this case, R η is preferably an alkylene group. As such a specific example, the above formula (2-2-d) is shown below.

[化30] [化30]

又,上式(2-2)中,Rγ較佳為伸烷基。又,此時,Rη較佳為伸烷基;較佳係構成上述伸烷基之亞甲基之至少一部分藉由酯鍵所取代。此種具體例,可列舉以下所示之上式(2-2-d')。 Further, in the above formula (2-2), R γ is preferably an alkylene group. Further, in this case, R η is preferably an alkylene group; preferably at least a part of the methylene group constituting the above alkylene group is substituted by an ester bond. Specific examples of such a compound include the above formula (2-2-d').

又,上式(2-3)中,Rγ'及Rδ較佳為伸烷基,Rε'較佳為直接鍵或伸烷基;此時Rζ較佳為氫原子。作為此種具體例,可列舉以下所示之上式(2-3-a)。 Further, in the above formula (2-3), R γ ' and R δ are preferably an alkylene group, and R ε ' is preferably a direct bond or an alkyl group; in this case, R ζ is preferably a hydrogen atom. As such a specific example, the above formula (2-3-a) is shown below.

又,上式(2-3)中,Rγ'較佳為上述伸烷基與上述伸芳基經連接之基;此時,較佳係構成上述伸烷基之亞甲基之至少一部分藉由胺基甲酸乙酯鍵及/或硫胺基甲酸乙酯鍵所取代。又,此時,Rδ較佳為伸烷基,Rε'較佳為直接鍵結。又,Rζ較佳為氫原子。作為此種具體例,可舉例如以下所示之上式(2-3-d)。 Further, in the above formula (2-3), R γ ' is preferably a group in which the above alkylene group is bonded to the above-mentioned extended aryl group; in this case, at least a part of the methylene group constituting the above alkylene group is preferably borrowed. It is replaced by a urethane bond and/or a urethane bond. Further, in this case, R δ is preferably an alkylene group, and R ε ' is preferably a direct bond. Further, R ζ is preferably a hydrogen atom. As such a specific example, the above formula (2-3-d) is shown below.

[化33] [化33]

又,上式(2-3)中,Rγ'較佳為伸烷基;此時,較佳係構成上述伸烷基之亞甲基之至少一部分藉由酯鍵、及硫醚鍵所取代。又,此時,Rδ較佳為伸烷基,Rε'較佳為直接鍵。又,Rζ較佳為氫原子。作為此種具體例,可列舉以下所示之上式(2-3-d')。 Further, in the above formula (2-3), R γ ' is preferably an alkylene group; in this case, at least a part of the methylene group constituting the above alkylene group is preferably replaced by an ester bond and a thioether bond. . Further, in this case, R δ is preferably an alkylene group, and R ε ' is preferably a direct bond. Further, R ζ is preferably a hydrogen atom. As such a specific example, the above formula (2-3-d') is shown below.

尚且,上式(2-1)中之Rα、Rβ、N及Rγ成為包含3級胺基的吸附基。同樣地,上式(2-2)中之Rα、Rβ、N及Rγ成為包含3級胺基的吸附基。又,上式(2-3)中之Rα、Rβ、N及Rγ'成為包含3級胺基的吸附基。此等情況下,式中之*表示聚胺基甲酸酯骨架中之與胺基甲酸乙酯鍵或脲鍵之羰基間的鍵結基。 Further, R α , R β , N and R γ in the above formula (2-1) are an adsorption group containing a tertiary amino group. Similarly, R α , R β , N and R γ in the above formula (2-2) become an adsorption group containing a tertiary amino group. Further, R α , R β , N and R γ′ in the above formula (2-3) are an adsorption group containing a tertiary amino group. In these cases, * in the formula represents a bonding group between a carbonyl group having a urethane bond or a urea bond in the polyurethane skeleton.

又,藉由將上式(2-1)~(2-3)所示之部分構造、與其他之含吸附基部分構造或含親溶媒基部分構造,以上式(i)所示之部分構造連接,可作成使式(2-1)~(2-3)所含之吸附基、與聚胺基甲酸酯分散劑(b-1)之主鏈經鍵結者。 Further, the partial structure shown by the above formula (i) is obtained by the partial structure shown in the above formulas (2-1) to (2-3) and the other adsorption group-containing portion structure or the hydrophilic solvent-containing portion structure. The linkage may be such that the adsorption group contained in the formulae (2-1) to (2-3) and the main chain of the polyurethane dispersant (b-1) are bonded.

又,作為其他較佳例,較佳係由下式(2-1')~(2-3')所示的部分構造。 Moreover, as another preferable example, it is preferable to have a partial structure shown by the following formula (2-1') - (2-3').

[化35] [化35]

式(2-1')中,Rα~Rε及*係與式(2-1)中之該等同義。RA及X-係與式(1')中之該等同義。 In the formula (2-1'), R α ~ R ε and * are equivalent to those in the formula (2-1). The R A and X - systems are equivalent to those in the formula (1').

式(2-2')中,Rα~Rη及*係與式(2-2)中之該等同義。RA及X-係與式(1')中之該等同義。 In the formula (2-2'), R α ~ R η and * are equivalent to those in the formula (2-2). The R A and X - systems are equivalent to those in the formula (1').

式(2-3')中,Rα~Rζ及*係與式(2-3)中之該等同義。RA及X-係與式(1')中之該等同義。 In the formula (2-3'), R α ~ R ζ and * are equivalent to those in the formula (2-3). The R A and X - systems are equivalent to those in the formula (1').

又,作為其他具體例,可列舉以下所示之部分構造。以下之部分構造中,含氮原子雜環基成為吸附基。 Moreover, as another specific example, the partial structure shown below is mentioned. In some of the following structures, the nitrogen atom-containing heterocyclic group becomes an adsorption group.

[化38] [化38]

上式中,*表示鍵結基。 In the above formula, * represents a bond group.

相較於使特定之吸附基存在於主鏈之聚胺基甲酸酯骨架中,較佳係使其依側鏈型式存在於主鏈之聚胺基甲酸酯骨架的懸掛型。特佳係吸附基中之氮原子為由主鏈之聚胺基甲酸酯骨架上最接近之原子隔著至少1個原子鍵結。亦即,較佳係與主鏈鍵結的吸附基。 In contrast to the fact that a specific adsorbing group is present in the polyurethane skeleton of the main chain, it is preferred to have a pendant type in the side chain type of the polyurethane skeleton of the main chain. The nitrogen atom in the particularly preferred adsorbent group is bonded by at least one atom from the closest atom on the backbone of the backbone of the backbone. That is, it is preferably an adsorption group bonded to the main chain.

更佳係特定之吸附基中之氮原子為由主鏈之聚胺基甲酸酯骨架上最接近之原子隔著至少2個原子,特佳係特定之吸附 基之氮原子為由主鏈之聚胺基甲酸酯骨架上最接近之原子隔著至少3個原子。 More preferably, the nitrogen atom in the specific adsorption group is separated by at least 2 atoms from the closest atom on the polyurethane skeleton of the main chain, and the specific adsorption is particularly preferred. The nitrogen atom of the base is at least 3 atoms separated by the closest atom on the backbone of the backbone.

吸附基中之氮原子較佳係由主鏈之聚胺基甲酸酯骨架上最接近之原子隔著20個以下之原子,更佳係隔著10個以下之原子。以下,有時將此主鏈之聚胺基甲酸酯骨架上最接近之原子與特定之吸附基之氮原子間的原子數,稱為「介存原子數」。 The nitrogen atom in the adsorbing group is preferably such that the atom closest to the atom on the backbone of the main chain is separated by 20 or less atoms, more preferably 10 or less atoms. Hereinafter, the number of atoms between the closest atom on the polyurethane skeleton of the main chain and the nitrogen atom of the specific adsorption group may be referred to as "the number of deposited atoms".

例如,在具有上式(2-3-a)之部分構造時,吸附基中之氮原子係如下述般,成為由聚胺基甲酸酯骨架中之次甲基之碳原子隔著1個碳原子者。 For example, in the partial structure of the above formula (2-3-a), the nitrogen atom in the adsorbing group is one via the carbon atom of the methine group in the polyurethane skeleton as follows. Carbon atom.

(含吸附基部分構造的含有比例) (Content ratio containing the structure of the adsorption group)

聚胺基甲酸酯分散劑(b-1)可作成為例如具有上述含吸附基部分構造者,可作成具有1種上述含吸附基部分構造者,亦可作成具有2種以上者。 The polyurethane dispersant (b-1) may be, for example, a structure having the above-described adsorption group-containing moiety, and may have a structure having one type of the above-mentioned adsorption group-containing moiety, or may have two or more types.

例如,可將所有吸附基作成為含3級胺基之部分構造,亦可同樣地將所有吸附基作成為含有4級銨鹽基之部分構造,或將所有吸附基作成為具有氮原子的含雜環基之部分構造。 For example, all of the adsorbing groups may be made into a partial structure containing a tertiary amine group, or all of the adsorbing groups may be similarly formed into a partial structure containing a tertiary ammonium salt group, or all adsorbing groups may be made to have a nitrogen atom. Partial construction of a heterocyclic group.

由分散性及相溶性的觀點而言,較佳係所有吸附基為3級胺基。此時,可作成具有2種以上之3級胺基者,但由分散性 的觀點而言,較佳為具有1種3級胺基,更佳係具有選自上式(1)及(2-1)~(2-3)之任一種含3級胺基的部分構造,再更佳係具有式(2-1)所示之含3級胺基的部分構造。 From the viewpoint of dispersibility and compatibility, it is preferred that all of the adsorbing groups are a 3-stage amine group. In this case, it is possible to form a metal base having two or more kinds of tertiary amines, but by dispersibility. In view of the above, it is preferred to have one type of tertiary amino group, and more preferably have a partial structure containing a tertiary amine group selected from any one of the above formulas (1) and (2-1) to (2-3). More preferably, it has a partial structure containing a tertiary amino group represented by the formula (2-1).

另一方面,由對鹼顯影液之顯影溶解性的觀點而言,較佳係所有吸附基為4級銨鹽基。其中,4級銨鹽基可藉由4級化劑對3級胺基進行4級銨鹽基化而作成,但由於若對所有3級胺基進行4級銨鹽基化,有來自4級化劑之雜質較多地生成的傾向,故由抑制雜質生成的觀點而言,大多使3級胺基部分殘存,而使3級胺基與4級銨鹽基並存。 On the other hand, from the viewpoint of developing solubility of the alkali developing solution, it is preferred that all of the adsorbing groups are a 4-stage ammonium salt group. Wherein, the 4-stage ammonium salt group can be prepared by subjecting the 3-stage amine group to 4-stage ammonium saltation by a 4-staged agent, but since the 4-stage ammonium group is subjected to the 4-stage ammonium saltation, there is a level 4 Since the impurities of the chemical agent tend to be formed in a large amount, from the viewpoint of suppressing the formation of impurities, the tertiary amino group portion is often left, and the tertiary amine group and the fourth-order ammonium salt group are coexistent.

從而,較佳係具有3級胺基與4級銨鹽基之兩者作為吸附基,由製造之效率化的觀點而言,更佳係選自上式(1)與(1')的組合、上式(2-1)與(2-1')的組合、上式(2-2)與(2-2')的組合、及上式(2-3)與(2-3')的組合的任一種組合;再更佳為上式(2-1)與(2-1')的組合。 Therefore, it is preferred to have both of the tertiary amine group and the tertiary ammonium salt group as the adsorption group, and more preferably selected from the combination of the above formulas (1) and (1') from the viewpoint of efficiency of production. Combination of the above formulas (2-1) and (2-1'), combinations of the above formulas (2-2) and (2-2'), and the above formulas (2-3) and (2-3') Any combination of the combinations; more preferably a combination of the above formulas (2-1) and (2-1').

在具有3級胺基與4級銨鹽基之兩者的情況,其含有比例並無特別限定,由分散性的觀點而言,含有4級銨鹽基之部分構造相對於含有3級胺基之部分構造的含有比例,較佳為1莫耳%以上、更佳為5莫耳%以上、再更佳為10莫耳%以上,且較佳為99莫耳%以下、更佳為95莫耳%以下、再更佳為80莫耳%以下、又更佳為60莫耳%以下、特佳為40莫耳%以下、最佳為30莫耳%以下。 In the case of having both the tertiary amine group and the tertiary ammonium salt group, the content ratio thereof is not particularly limited, and from the viewpoint of dispersibility, the partial structure containing the tertiary ammonium salt group is relative to the tertiary metal atomic group. The content ratio of the partial structure is preferably 1 mol% or more, more preferably 5 mol% or more, still more preferably 10 mol% or more, and preferably 99 mol% or less, more preferably 95 mol. The ear% or less, more preferably 80% by mole or less, more preferably 60% by mole or less, particularly preferably 40% by mole or less, and most preferably 30% by mole or less.

同樣地,由分散性之觀點而言,聚胺基甲酸酯分散劑(b-1)中之含吸附基部分構造的含有比例,較佳為5質量%以上、更佳為10質量%以上、再更佳為20質量%以上,且較佳為90質量% 以下、更佳為50質量%以下、再更佳為40質量%以下、特佳為30質量%以下。 In the same manner, the content of the structure containing the adsorbing moiety in the polyurethane dispersant (b-1) is preferably 5% by mass or more, more preferably 10% by mass or more, from the viewpoint of dispersibility. More preferably, it is 20% by mass or more, and preferably 90% by mass. The following is more preferably 50% by mass or less, still more preferably 40% by mass or less, and particularly preferably 30% by mass or less.

又,特定之吸附基的含有比例,係相對於100g之聚胺基甲酸酯分散劑(b-1)較佳為0.001莫耳以上、更佳為0.01莫耳以上、再更佳為0.05莫耳以上,且較佳為0.8莫耳以下、更佳為0.4莫耳以下、再更佳為0.2莫耳以下。以下,將此特定吸附基相對於100g聚胺基甲酸酯分散劑(b-1)的比例作為特定之吸附基含量,以「莫耳/100g」之單位表示。 Further, the content ratio of the specific adsorbing group is preferably 0.001 mol or more, more preferably 0.01 mol or more, and still more preferably 0.05 mol with respect to 100 g of the polyurethane dispersant (b-1). Above the ear, it is preferably 0.8 moles or less, more preferably 0.4 moles or less, still more preferably 0.2 moles or less. Hereinafter, the ratio of this specific adsorption group to 100 g of the polyurethane dispersant (b-1) is expressed as a unit of "mole/100 g" as a specific adsorption group content.

(親溶媒基) (pro-solvent base)

聚胺基甲酸酯分散劑(b-1)係含有親溶媒基。聚胺基甲酸酯分散劑(b-1)所具有之親溶媒基的種類若為顯示與溶媒之相溶性者,則無特別限定。親溶媒基由分散性的觀點而言,較佳為含有聚醚鏈及聚酯鏈之至少一者。又,在聚胺基甲酸酯分散劑(b-1)具有主鏈的情況,由分散性的觀點而言,較親和之溶媒基較佳係含有聚醚鏈及聚酯鏈之至少一者,且與主鏈鍵結者。 The polyurethane dispersant (b-1) contains a hydrophilic solvent group. The type of the lyophilic solvent which the polyurethane dispersing agent (b-1) has is not particularly limited as long as it exhibits compatibility with a solvent. The lyophilic medium preferably contains at least one of a polyether chain and a polyester chain from the viewpoint of dispersibility. Further, in the case where the polyurethane dispersant (b-1) has a main chain, from the viewpoint of dispersibility, the more compatible solvent group preferably contains at least one of a polyether chain and a polyester chain. And the key to the main chain.

聚胺基甲酸酯分散劑(b-1)較佳係含有含上述親溶媒基的含親溶媒基部分構造;如上述般由分散性的觀點而言,較佳係含親溶媒基部分構造彼此、或上述含吸附基部分構造與含親溶媒基部分構造藉由上式(i)所示之部分構造所連接者。 The polyurethane dispersant (b-1) preferably contains a structure containing a hydrophilic solvent group containing the above-mentioned lyophilic solvent; as described above, from the viewpoint of dispersibility, it is preferred to contain a hydrophilic solvent moiety structure. The structures of the adsorbent-containing moiety and the structure containing the hydrophilic solvent-containing moiety are connected to each other by a partial structure represented by the above formula (i).

關於含親溶媒基部分構造之具體的部分構造,並無特別限定,較佳為下式(3-1)~(3-3)所示的部分構造。式(3-1)~(3-3)中之Rθ與O原子為親溶媒基,除此以外為與親溶媒基的鍵結部。 The specific partial structure of the structure containing the hydrophilic solvent moiety is not particularly limited, and is preferably a partial structure represented by the following formulas (3-1) to (3-3). In the formulae (3-1) to (3-3), R θ and the O atom are a hydrophilic solvent group, and other than the bond portion with the lyophilic solvent group.

[化40] [化40]

式(3-1)中,Rθ表示聚醚鏈及/或聚酯鏈。 In the formula (3-1), R θ represents a polyether chain and/or a polyester chain.

Rγ、Rδ及Rε分別獨立表示亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基。其中,在Rγ為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代。又,Rγ亦可經由-NH-(C=O)-基而與相鄰接之1個N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結。 R γ , R δ and R ε each independently represent an alkylene group which may have a substituent, an extended aryl group which may have a substituent, or a group in which the above-mentioned alkylene group is bonded to the above-mentioned extended aryl group. Wherein, when R γ is an alkyl group which may have a substituent, or a group in which the above alkyl group is bonded to the above-mentioned extended aryl group, at least a part of the methylene group constituting the above alkyl group may also be selected from At least one of the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, a quinone bond, a thiomethacrylate bond, a thioether bond, and a thioester bond Replaced. Further, R γ may be urea-bonded together with an adjacent N atom via a -NH-(C=O)- group, or may be subjected to a guanamine bond via a carbonyl group.

又,Rγ亦可經由-NH-(C=O)-基而與相鄰接之1個O原子一起進行胺基甲酸乙酯鍵結,或經由羰基而進行酯鍵結。 Further, R γ may be bonded to the urethane bond together with an adjacent one of the O atoms via the —NH—(C=O)— group, or may be ester-bonded via a carbonyl group.

*表示鍵結基。 * indicates the bond base.

式(3-2)中,Rθ表示聚醚鏈及/或聚酯鏈。 In the formula (3-2), R θ represents a polyether chain and/or a polyester chain.

Rγ及Rη分別獨立表示亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基。其中,在Rγ及Rη分別獨立為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯 亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵取代。又,Rγ及Rη亦可經由-NH-(C=O)-基而與相鄰接之1個N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結。 R γ and R η each independently represent an alkylene group which may have a substituent, an extended aryl group which may have a substituent, or a group in which the above alkylene group is bonded to the above-mentioned extended aryl group. Wherein, when R γ and R η are each independently an alkyl group which may have a substituent or a group in which the above alkyl group is bonded to the above-mentioned extended aryl group, at least a part of the methylene group constituting the above alkyl group is also By being selected from the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, a quinone bond, a thiocarbamate bond, a thioether bond, and a thioester bond Replace with at least one key. Further, R γ and R η may be urea-bonded together with an adjacent N atom via a -NH-(C=O)- group, or a guanamine bond may be carried out via a carbonyl group.

又,Rγ亦可經由-NH-(C=O)-基而與相鄰接之1個O原子一起進行胺基甲酸乙酯鍵結,或經由羰基而進行酯鍵結。 Further, R γ may be bonded to the urethane bond together with an adjacent one of the O atoms via the —NH—(C=O)— group, or may be ester-bonded via a carbonyl group.

*表示鍵結基。 * indicates the bond base.

式(3-3)中,Rθ表示聚醚鏈及/或聚酯鏈。 In the formula (3-3), R θ represents a polyether chain and/or a polyester chain.

Rγ'及Rδ分別獨立表示亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基。其中,在Rγ'為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代。 R γ ' and R δ each independently represent an alkylene group which may have a substituent, an extended aryl group which may have a substituent, or a group in which the above alkylene group is bonded to the above-mentioned extended aryl group. Wherein, when R γ' is an alkylene group which may have a substituent, or a group in which the above alkylene group is bonded to the above-mentioned extended aryl group, at least a part of the methylene group constituting the above alkylene group may also be selected At least one of the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, a quinone bond, an ethyl thioate bond, a thioether bond, and a thioester bond Replaced by the key.

又,Rγ'亦可經由-NH-(C=O)-基而與相鄰接之1個O原子一起進行胺基甲酸乙酯鍵結,或經由羰基而進行酯鍵結。 Further, R γ ' may be bonded to an urethane bond together with an adjacent O atom via an -NH-(C=O)- group, or may be ester-bonded via a carbonyl group.

Rε'表示直接鍵、亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基。 R ε ' represents a direct bond, an alkylene group which may have a substituent, an extended aryl group which may have a substituent, or a group in which the above-mentioned alkylene group is bonded to the above-mentioned extended aryl group.

Rζ'表示氫原子、亦可具有取代基之烷基或亦可具有取代基之芳基。其中,Rζ'為亦可具有取代基之烷基或亦可具有取代基之芳基時,其氫原子之至少一個亦可由Rθ-O-Rγ'-所取代。 R ζ ' represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent. When R ζ ' is an alkyl group which may have a substituent or an aryl group which may have a substituent, at least one of hydrogen atoms may be substituted by R θ -OR γ' - .

*表示鍵結基。 * indicates the bond base.

Rγ、Rγ'、Rδ、Rε、Rε'及Rη中之亦可具有取代基之伸烷基的碳數並無特別限定,通常為1以上、較佳為2以上,且較佳為20以下、更佳為15以下、再更佳為7以下。若為上述範圍內,有分散性良好之傾向。具體而言,可列舉亞甲基、二亞甲基、三亞甲基、四亞甲基、五亞甲基、六亞甲基、七亞甲基、伸環戊基亞甲基、伸環己基亞甲基、伸環己基二亞甲基、伸環己基三亞甲基等;由分散性之觀點而言,較佳為二亞甲基、三亞甲基、四亞甲基、五亞甲基、或六亞甲基,更佳為三亞甲基、四亞甲基或五亞甲基。 The number of carbon atoms of the alkylene group which may have a substituent among R γ , R γ′ , R δ , R ε , R ε′ and R η is not particularly limited, but is usually 1 or more, preferably 2 or more, and It is preferably 20 or less, more preferably 15 or less, still more preferably 7 or less. If it is in the above range, there is a tendency that the dispersibility is good. Specific examples thereof include a methylene group, a dimethylene group, a trimethylene group, a tetramethylene group, a pentamethylene group, a hexamethylene group, a heptamethylene group, a cyclopentylenemethylene group, and a cyclohexylene group. Methylene, cyclohexyldimethylene, cyclohexyltrimethylene, etc.; from the viewpoint of dispersibility, dimethylene, trimethylene, tetramethylene, pentamethylene, Or hexamethylene, more preferably trimethylene, tetramethylene or pentamethylene.

上式(3-1)~(3-3)中,Rγ、Rγ'、Rδ、Rε、Rε'及Rη之上述伸烷基與上述伸芳基經連接之基的碳數並無特別限定,通常為6以上、較佳為7以上,且較佳為30以下、更佳為20以下、再更佳為15以下。若為上述範圍內,有分散性良好的傾向。又,若所具有之伸烷基之數量為1以上則無特別限定,由分散性之觀點而言較佳為3以下。 In the above formula (3-1) to (3-3), the carbon of the above-mentioned alkyl group of R γ , R γ′ , R δ , R ε , R ε′ and R η and the above-mentioned extended aryl group The number is not particularly limited, but is usually 6 or more, preferably 7 or more, and is preferably 30 or less, more preferably 20 or less, still more preferably 15 or less. If it is in the above range, there is a tendency that the dispersibility is good. In addition, the number of the alkylene groups to be contained is not particularly limited, and is preferably 3 or less from the viewpoint of dispersibility.

具體而言,可列舉例如:亦可具有取代基之伸芳基1個與亦可具有取代基之伸烷基1個經連接的基;亦可具有取代基之伸芳基2個經由亦可具有取代基之伸烷基1個所連接的基;亦可具有取代基之伸烷基2個經由亦可具有取代基之伸芳基1個所連接的基。作為上述伸烷基與上述伸芳基經連接之基的具體例,可列舉上式(b1)~(b5)所示之基。 Specifically, for example, one of the extended aryl groups which may have a substituent and one extended alkyl group which may have a substituent may be mentioned; or two of the extended aryl groups which may have a substituent may also be used. A group in which one alkyl group having a substituent is bonded; or a group in which two alkyl groups having a substituent are bonded via one of the extended aryl groups which may have a substituent. Specific examples of the group in which the alkylene group and the above-mentioned extended aryl group are bonded to each other include the groups represented by the above formulas (b1) to (b5).

Rγ、Rγ'、Rδ、Rε、Rε'及Rη之亦可具有取代基之伸芳基的碳數並無特別限定,通常為6以上,且較佳為30以下、更佳為20以下、再更佳為15以下。若為上述範圍內,有分散性良好之傾向。具體而言,可列舉伸苯基及伸萘基等,由分散性的觀點而言, 較佳為伸苯基。 The number of carbon atoms of the extended aryl group which may have a substituent of R γ , R γ′ , R δ , R ε , R ε′ and R η is not particularly limited, but is usually 6 or more, and preferably 30 or less, more preferably Preferably, it is 20 or less, and more preferably 15 or less. If it is in the above range, there is a tendency that the dispersibility is good. Specific examples thereof include a phenylene group and a naphthyl group, and from the viewpoint of dispersibility, a phenyl group is preferred.

此等之中,由分散性之觀點而言,較佳係Rγ、Rγ'為伸烷基、伸芳基、或上述伸烷基與上述伸芳基經連接之基;較佳係Rδ、Rε、Rε'及Rη為伸烷基。 Among these, from the viewpoint of dispersibility, it is preferred that R γ , R γ ' is an alkylene group, an aryl group, or a group in which the above alkyl group is bonded to the above aryl group; δ , R ε , R ε ' and R η are an alkylene group.

上式(3-1)~(3-3)中,作為Rγ、Rγ'、Rδ、Rε、Rε'及Rη之亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、上述伸烷基與上述伸芳基經連接之基亦可具有的取代基,並無特別限定,可列舉甲基、乙基、環己基等之烷基;苯基等之芳基;苄基等之芳烷基等。 In the above formulas (3-1) to (3-3), an alkyl group which may have a substituent, such as R γ , R γ′ , R δ , R ε , R ε′ and R η , may also have a substitution. The substituent which the aryl group and the above-mentioned alkyl group and the above-mentioned extended aryl group may have are not particularly limited, and examples thereof include an alkyl group such as a methyl group, an ethyl group or a cyclohexyl group; and a phenyl group or the like. An aryl group; an aralkyl group such as a benzyl group; and the like.

上述烷基之碳數並無特別限定,較佳為1~20、更佳為1~10、再更佳為1~5。烷基可為直鏈狀、分岐鏈狀、或環狀。具體例可列舉甲基、乙基、環己基等。 The carbon number of the alkyl group is not particularly limited, but is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic. Specific examples thereof include a methyl group, an ethyl group, a cyclohexyl group and the like.

又,上述芳基之碳數並無特別限定,較佳為6~20、更佳為6~10。具體例可列舉苯基、萘基等。 Further, the carbon number of the aryl group is not particularly limited, but is preferably 6 to 20, more preferably 6 to 10. Specific examples thereof include a phenyl group and a naphthyl group.

又,上述芳烷基之碳數並無特別限定,較佳為7~20、更佳7~10。具體例可舉例如苄基等。 Further, the carbon number of the aralkyl group is not particularly limited, but is preferably 7 to 20, more preferably 7 to 10. Specific examples thereof include a benzyl group and the like.

此等之中,由操作容易及分散性的觀點而言,較佳為烷基,更佳為甲基。 Among these, from the viewpoint of ease of handling and dispersibility, an alkyl group is preferred, and a methyl group is more preferred.

如上所述,在Rγ、Rγ'及Rη分別獨立為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代。 As described above, when R γ , R γ ' and R η are each independently an alkyl group which may have a substituent, or a group in which the above alkyl group is bonded to the above-mentioned extended aryl group, the above-mentioned alkylene group is formed. At least a portion of the methyl group may also be selected from the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, a guanidine bond, a thiocarbamate bond, a thioether bond, and sulfur. At least one of the groups of ester bonds is replaced by at least one of the groups.

此等之中,由分散性的觀點而言,作為較佳鍵結,於 Rγ中可列舉胺基甲酸乙酯鍵或酯鍵;Rγ'中可列舉硫胺基甲酸乙酯鍵、胺基甲酸乙酯鍵或酯鍵。又,Rη中較佳為未取代。尤其由分散性之觀點而言,較佳係上式(3-1)、(3-1)的Rγ為伸烷基、或上述伸烷基與上述伸芳基經連接之基,且構成其伸烷基之亞甲基之一部分係藉由胺基甲酸乙酯鍵、或酯鍵取代者。其具體例可列舉以下者。 Among these, from the viewpoint of dispersibility, as a preferred bond, a urethane bond or an ester bond may be mentioned as R γ , and an amine thiocarbamate bond or an amine may be mentioned as R γ' . Ethyl urethane bond or ester bond. Further, R η is preferably unsubstituted. Particularly preferably, from the viewpoint of dispersibility, R γ of the formula (3-1) or (3-1) is an alkylene group, or a group in which the above alkylene group is bonded to the above-mentioned extended aryl group, and is constituted. One of the methylene groups of the alkylene group is substituted by an urethane bond or an ester bond. Specific examples thereof include the following.

又,可列舉上式(3-3)中Rγ'為上述伸烷基與上述伸芳基經連接之基,且構成其伸烷基之亞甲基之一部分係藉由胺基甲酸乙酯鍵及/或硫胺基甲酸乙酯鍵取代者。其具體例可列舉以下者。 Further, R γ ' in the above formula (3-3) is a group in which the above alkyl group is bonded to the above-mentioned extended aryl group, and a part of the methylene group constituting the alkyl group thereof is derived from ethyl urethane. Key and / or urethane bond replacement. Specific examples thereof include the following.

又,如上所述,Rγ及Rη亦可分別獨立經由-NH-(C=O)-基而與相鄰接之N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結。 Further, as described above, R γ and R η may each independently undergo a urea bond together with an adjacent N atom via a -NH-(C=O)- group, or a guanamine bond via a carbonyl group.

此等之中,由分散性的觀點而言,作為較佳鍵結,於Rγ中較佳係經由-NH-(C=O)-基而與相鄰接之N原子一起進行脲鍵結;又,於Rη中較佳係與相鄰接之N原子之間未經由上述鍵結者。 Among these, from the viewpoint of dispersibility, as a preferred bond, it is preferred to carry out a urea bond together with an adjacent N atom via R- γ through a -NH-(C=O)- group. Further, it is preferred that R η is not bonded to the adjacent N atom via the above bond.

又,Rγ及Rγ'亦可分別獨立為經由-NH-(C=O)-基而與相鄰接之1個O原子一起進行胺基甲酸乙酯鍵結,或經由羰基而進行酯鍵結。 Further, R γ and R γ′ may each independently be bonded to an adjacent one O atom via an —NH—(C=O)— group, or may be esterified via a carbonyl group. Bonding.

尤其是由分散性的觀點而言,上式(3-1)、(3-2)之Rγ較佳為伸烷基或伸芳基,且經由-NH-(C=O)-基而與相鄰接之N原子一起進行脲鍵結。又,較佳係經由-NH-(C=O)-基而與相鄰接之1個O原子一起進行胺基甲酸乙酯鍵結,或經由羰基而進行酯鍵結。其具體例可列舉以下者。 Particularly, from the viewpoint of dispersibility, R γ of the above formulas (3-1) and (3-2) is preferably an alkylene group or an extended aryl group, and is via the -NH-(C=O)- group. The urea bond is carried out together with the adjacent N atoms. Further, it is preferred to carry out urethane bonding with an adjacent one of the O atoms via the -NH-(C=O)- group, or to carry out ester bonding via a carbonyl group. Specific examples thereof include the following.

又,上式(3-3)中,可列舉Rγ'為上述伸烷基與上述伸芳基經連接之基,構成其伸烷基之亞甲基之一部分係藉由硫胺基甲酸乙酯鍵取代,或經由-NH-(C=O)-基而與相鄰接之1個O原子一起進行脲鍵結。其具體例可列舉於以下。 Further, in the above formula (3-3), R γ ' is a group in which the above alkyl group is bonded to the above-mentioned extended aryl group, and a part of the methylene group constituting the alkyl group thereof is derived from thiocarbamate The ester bond is substituted or the urea bond is carried out together with an adjacent O atom via an -NH-(C=O)- group. Specific examples thereof can be exemplified below.

[化46] [Chem. 46]

Rζ表示氫原子、亦可具有取代基之烷基或亦可具有取代基之芳基。其中,在Rζ'為烷基或芳基時,其氫原子之至少1個亦可由Rθ-O-Rγ'-取代。 R ζ represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. However, when R ζ ' is an alkyl group or an aryl group, at least one of the hydrogen atoms may be substituted by R θ -OR γ' - .

Rζ'中之烷基的碳數並無特別限定,通常為1以上、較佳為2以上,且較佳為20以下、更佳為10以下、再更佳為6以下。若為上述範圍內則有分散性良好的傾向。 Carbon atoms R ζ 'in the alkyl group is not particularly limited and is usually 1 or more, preferably 2 or more, and preferably 20 or less, more preferably 10 or less, and still more preferably 6 or less. If it is in the above range, the dispersibility tends to be good.

具體而言,可列舉例如甲基、乙基、丙基、丁基、戊基、己基、環戊基、環己基、環庚基及環辛基等。由分散性之觀點而言,較佳為甲基、乙基、丙基、環戊基、或環己基,更佳為甲基、乙基或環己基,再更佳為甲基或環己基。 Specific examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. From the viewpoint of dispersibility, a methyl group, an ethyl group, a propyl group, a cyclopentyl group or a cyclohexyl group is preferred, and a methyl group, an ethyl group or a cyclohexyl group is more preferred, and a methyl group or a cyclohexyl group is more preferred.

Rζ'之芳基的碳數並無特別限定,通常為6以上,且較佳為30以下、更佳為20以下、再更佳為15以下。若為上述範圍內,有分散性良好之傾向。具體而言,可列舉例如苯基及萘基等,由分散性之觀點而言,較佳為苯基。 The carbon number of the aryl group of R ζ ' is not particularly limited, but is usually 6 or more, and is preferably 30 or less, more preferably 20 or less, still more preferably 15 or less. If it is in the above range, there is a tendency that the dispersibility is good. Specific examples thereof include a phenyl group and a naphthyl group, and a phenyl group is preferred from the viewpoint of dispersibility.

作為此等烷基、芳基亦可具有之取代基並無特別限定,可列舉例如羥基;羧基;甲基、乙基、丙基、環己基等之烷基;苯基等之芳基;苄基等之芳烷基等。 The substituent which the alkyl group and the aryl group may have is not particularly limited, and examples thereof include a hydroxyl group; a carboxyl group; an alkyl group such as a methyl group, an ethyl group, a propyl group or a cyclohexyl group; an aryl group such as a phenyl group; and a benzyl group; An aralkyl group or the like.

上述烷基之碳數並無特別限定,較佳為1~20、更佳為1~10、再更佳為1~5。烷基可為直鏈狀、分岐鏈狀、或環狀。具體例可列 舉甲基、乙基、環己基等。 The carbon number of the alkyl group is not particularly limited, but is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic. Specific examples can be listed Take methyl, ethyl, cyclohexyl and the like.

又,上述芳基之碳數並無特別限定,較佳為6~20、更佳為6~10。具體例可列舉苯基、萘基等。 Further, the carbon number of the aryl group is not particularly limited, but is preferably 6 to 20, more preferably 6 to 10. Specific examples thereof include a phenyl group and a naphthyl group.

又,上述芳烷基之碳數並無特別限定,較佳為7~20、更佳為7~10。具體例可列舉苄基等。 Further, the carbon number of the aralkyl group is not particularly limited, but is preferably 7 to 20, more preferably 7 to 10. Specific examples thereof include a benzyl group and the like.

此等之中,由抑制對顏料之吸附阻礙的觀點而言,較佳為羥基、甲基或乙基。 Among these, a hydroxyl group, a methyl group or an ethyl group is preferable from the viewpoint of suppressing the adsorption inhibition of the pigment.

又,上述Rζ'中,由分散性之觀點而言,Rζ'較佳為氫原子。 Further, in the above R ζ ' , R ζ ' is preferably a hydrogen atom from the viewpoint of dispersibility.

作為Rθ之聚醚鏈,可列舉例如下式(3-4)所示者。又,作為聚酯鏈,可列舉例如下式(3-5)或(3-6)所示者。 Examples of the polyether chain of R θ include those represented by the following formula (3-4). Further, examples of the polyester chain include those represented by the following formula (3-5) or (3-6).

上式(3-4)中,Rb表示亦可具有取代基之烷基,Rc表示亦可具有取代基之伸烷基。n表示1~100之整數。*表示與相鄰接之O原子間的鍵結基。 In the above formula (3-4), R b represents an alkyl group which may have a substituent, and R c represents an alkylene group which may have a substituent. n represents an integer from 1 to 100. * indicates a bonding group with an adjacent O atom.

又,上式(3-5)及(3-6)中,Rb'表示亦可具有取代基之烷基,Rc'表示亦可具有取代基之伸烷基。n表示1~100之整數。*表示與相鄰接之O原子間的鍵結基。 Further, in the above formulae (3-5) and (3-6), R b' represents an alkyl group which may have a substituent, and R c' represents an alkylene group which may have a substituent. n represents an integer from 1 to 100. * indicates a bonding group with an adjacent O atom.

Rb之烷基的碳數並無特別限定,通常為1以上,且較佳為50以下、更佳為10以下、再更佳為6以下。若為上述範圍內 則有分散性良好的傾向。 The carbon number of the alkyl group of R b is not particularly limited, but is usually 1 or more, and is preferably 50 or less, more preferably 10 or less, still more preferably 6 or less. If it is in the above range, the dispersibility tends to be good.

具體而言,可列舉甲基、乙基、丙基、異丙基、丁基、戊基、己基、環戊基、環己基、環庚基及環辛基等。由分散性之觀點而言,較佳為甲基、乙基、丙基、或丁基,更佳為甲基或乙基,再更佳為甲基。 Specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a pentyl group, a hexyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. From the viewpoint of dispersibility, a methyl group, an ethyl group, a propyl group or a butyl group is preferred, and a methyl group or an ethyl group is more preferred, and a methyl group is more preferred.

作為烷基亦可具有之取代基並無特別限定,可列舉例如羥基;羧基;甲基、乙基、丙基、環己基等之烷基;苯基等之芳基;苄基等之芳烷基等。 The substituent which the alkyl group may have is not particularly limited, and examples thereof include a hydroxyl group; a carboxyl group; an alkyl group such as a methyl group, an ethyl group, a propyl group or a cyclohexyl group; an aryl group such as a phenyl group; and an aralkyl group such as a benzyl group. Base.

上述烷基之碳數並無特別限定,較佳為1~20、更佳為1~10、再更佳為1~5。烷基可為直鏈狀、分岐鏈狀、或環狀。具體例有如甲基、乙基、環己基等。 The carbon number of the alkyl group is not particularly limited, but is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic. Specific examples are methyl, ethyl, cyclohexyl and the like.

又,上述芳基之碳數並無特別限定,較佳為6~20、更佳為6~10。具體例可列舉苯基、萘基等。 Further, the carbon number of the aryl group is not particularly limited, but is preferably 6 to 20, more preferably 6 to 10. Specific examples thereof include a phenyl group and a naphthyl group.

又,上述芳烷基之碳數並無特別限定,較佳為7~20、更佳為7~10。具體例可列舉苄基等。 Further, the carbon number of the aralkyl group is not particularly limited, but is preferably 7 to 20, more preferably 7 to 10. Specific examples thereof include a benzyl group and the like.

此等之中,由對鹼顯影性之助益、或對基板密黏之助益的觀點而言,較佳為羥基、甲基或乙基。 Among these, a hydroxyl group, a methyl group or an ethyl group is preferable from the viewpoint of the benefit of alkali developability or the benefit of adhesion to the substrate.

又,Rc中之伸烷基的碳數並無特別限定,通常為1以上、較佳為2以上,且較佳為20以下、更佳為15以下、再更佳為7以下。若為上述範圍內,有分散性良好之傾向。 Further, the carbon number of the alkylene group in R c is not particularly limited, but is usually 1 or more, preferably 2 or more, and is preferably 20 or less, more preferably 15 or less, still more preferably 7 or less. If it is in the above range, there is a tendency that the dispersibility is good.

具體而言,可列舉例如亞甲基、伸乙基、伸丙基、伸異丙基、伸丁基、伸環戊基亞甲基、伸環己基亞甲基、伸環己基伸乙基及伸環己基伸丙基等。由分散性之觀點而言,較佳為亞甲基、伸乙基、伸丙基、伸異丙基或伸丁基,更佳為伸乙基、伸丙基或伸 異丙基。 Specific examples thereof include a methylene group, an ethylidene group, a propyl group, an extended isopropyl group, a butyl group, a cyclopentylmethylene group, a cyclohexylenemethylene group, a cyclohexyl group-extended ethyl group, and Stretching cyclohexyl propyl and the like. From the viewpoint of dispersibility, it is preferably a methylene group, an ethyl group, a propyl group, an isopropyl group or a butyl group, and more preferably an ethyl group, a propyl group or a stretching group. Isopropyl.

伸烷基亦可具有之取代基並無特別限定,可列舉例如羥基;羧基;甲基、乙基、丙基、環己基等之烷基;苯基等之芳基;苄基等之芳烷基等。 The substituent which the alkylene group may have is not particularly limited, and examples thereof include a hydroxyl group; a carboxyl group; an alkyl group such as a methyl group, an ethyl group, a propyl group or a cyclohexyl group; an aryl group such as a phenyl group; and an aralkyl group such as a benzyl group. Base.

上述烷基之碳數並無特別限定,較佳為1~20、更佳為1~10、再更佳為1~5。烷基可為直鏈狀、分岐鏈狀、或環狀。具體例可列舉甲基、乙基、環己基等。 The carbon number of the alkyl group is not particularly limited, but is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic. Specific examples thereof include a methyl group, an ethyl group, a cyclohexyl group and the like.

又,上述芳基之碳數並無特別限定,較佳為6~20、更佳為6~10。具體例可列舉苯基、萘基等。 Further, the carbon number of the aryl group is not particularly limited, but is preferably 6 to 20, more preferably 6 to 10. Specific examples thereof include a phenyl group and a naphthyl group.

又,上述芳烷基之碳數並無特別限定,較佳為7~20、更佳為7~10。具體例可列舉苄基等。 Further, the carbon number of the aralkyl group is not particularly limited, but is preferably 7 to 20, more preferably 7 to 10. Specific examples thereof include a benzyl group and the like.

此等之中,由對鹼顯影性之助益、或對基板密黏之助益的觀點而言,較佳為羥基、甲基或乙基。 Among these, a hydroxyl group, a methyl group or an ethyl group is preferable from the viewpoint of the benefit of alkali developability or the benefit of adhesion to the substrate.

n為1~100之整數,但由分散性的觀點而言,較佳為4以上、更佳為6以上,且較佳為60以下、更佳為40以下。 n is an integer of from 1 to 100, but from the viewpoint of dispersibility, it is preferably 4 or more, more preferably 6 or more, and is preferably 60 or less, more preferably 40 or less.

Rb'之烷基的碳數並無特別限定,通常為1以上、較佳為2以上,且較佳為50以下、更佳為40以下。 The carbon number of the alkyl group of R b ' is not particularly limited, but is usually 1 or more, preferably 2 or more, and is preferably 50 or less, more preferably 40 or less.

又,Rb'之烷基的碳數亦可視感光性樹脂組成物所含之溶劑(e)的極性而改變。在溶劑(e)為極性溶媒時,Rb'之烷基之碳數較佳為1以上且12以下。另一方面,在溶劑(e)為非極性溶媒時,Rb'之烷基之碳數較佳為9以上且30以下。若為上述範圍內則有分散性良好的傾向。 Further, the carbon number of the alkyl group of R b ' may also vary depending on the polarity of the solvent (e) contained in the photosensitive resin composition. When the solvent (e) is a polar solvent, the number of carbon atoms of the alkyl group of R b ' is preferably 1 or more and 12 or less. On the other hand, when the solvent (e) is a non-polar solvent, the number of carbon atoms of the alkyl group of R b ' is preferably 9 or more and 30 or less. If it is in the above range, the dispersibility tends to be good.

具體而言,在溶劑(e)為極性溶媒時,較佳為甲基、乙基、丙基、異丙基、丁基、戊基、己基、庚基、辛基、壬烷-1-基、 癸烷-1-基、十一烷-1-基、或十二烷-1-基。 Specifically, when the solvent (e) is a polar solvent, it is preferably a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group or a decyl-1-yl group. , Decan-1-yl, undec-1-yl, or dodec-1-yl.

在溶劑(e)為非極性溶媒時,較佳為辛基、壬烷-1-基、癸烷-1-基、十一烷-1-基、十二烷-1-基、十三烷-1-基、十四烷-1-基、十五烷-1-基、廿烷-1-基或三十烷-1-基。 When the solvent (e) is a non-polar solvent, it is preferably an octyl group, a decane-1-yl group, a decane-1-yl group, an undec-1-yl group, a dodec-1-yl group, a tridecane group. 1-yl, tetradec-1-yl, pentadec-1-yl, dec-1-yl or triacon-1-yl.

又,在如丙二醇甲基醚乙酸酯般之中極性溶媒時,較佳為癸烷-1-基、十一烷-1-基、十二烷-1-基、或十三烷-1-基。 Further, in the case of a polar solvent such as propylene glycol methyl ether acetate, decane-1-yl, undec-1-yl, dodec-1-yl or tridecane-1 is preferred. -base.

作為烷基亦可具有之取代基並無特別限定,可列舉例如羥基;羧基;甲基、乙基、丙基、環己基等之烷基;苯基等之芳基;苄基等之芳烷基等。由對鹼顯影性之助益、或對基板密黏之助益的觀點而言,較佳為羥基、甲基或乙基。 The substituent which the alkyl group may have is not particularly limited, and examples thereof include a hydroxyl group; a carboxyl group; an alkyl group such as a methyl group, an ethyl group, a propyl group or a cyclohexyl group; an aryl group such as a phenyl group; and an aralkyl group such as a benzyl group. Base. From the viewpoint of the benefit of alkali developability or the benefit of adhesion to the substrate, a hydroxyl group, a methyl group or an ethyl group is preferred.

又,Rc'中之伸烷基的碳數並無特別限定,通常為1以上、較佳為2以上,且較佳為50以下、更佳為35以下、再更佳為26以下。 Further, the carbon number of the alkylene group in R c ' is not particularly limited, but is usually 1 or more, preferably 2 or more, and is preferably 50 or less, more preferably 35 or less, still more preferably 26 or less.

又,Rc'之伸烷基的碳數亦可視感光性樹脂組成物所含之溶劑(e)的極性而改變。在溶劑(e)為極性溶媒時,Rc'之烷基之碳數較佳為1以上且8以下。另一方面,在溶劑(e)為非極性溶媒時,Rc'之烷基之碳數較佳為9以上且26以下。若為上述範圍內則有分散性良好的傾向。 Further, the carbon number of the alkyl group of R c ' may also vary depending on the polarity of the solvent (e) contained in the photosensitive resin composition. When the solvent (e) is a polar solvent, the number of carbon atoms of the alkyl group of R c ' is preferably 1 or more and 8 or less. On the other hand, when the solvent (e) is a nonpolar solvent, the number of carbon atoms of the alkyl group of R c ' is preferably 9 or more and 26 or less. If it is in the above range, the dispersibility tends to be good.

具體而言,在溶劑(e)為極性溶媒時,較佳為亞甲基、伸乙基、伸丙基、伸異丙基、伸丁基、伸戊基、伸己基、伸庚基、或伸辛基(或八亞甲基)。 Specifically, when the solvent (e) is a polar solvent, it is preferably a methylene group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, or Extend octyl (or octamethylene).

在溶劑(e)為非極性溶媒時,較佳為八亞甲基、九亞甲基、十亞甲基、十一亞甲基、十二亞甲基、十三亞甲基、十四亞甲基、十五亞甲基、廿亞甲基、或三十亞甲基。視溶媒之極性,較佳 係組合此等。 When the solvent (e) is a non-polar solvent, it is preferably octamethylene, nonamethylene, decamethylene, undecylmethyl, dodecamethylene, thirteenmethylene, and tetradecene. A group, a fifteen methylene group, a methylene group, or a thirteen methylene group. Depending on the polarity of the solvent, it is preferred This is a combination of these.

又,在如丙二醇甲基醚乙酸酯般之中極性溶媒時,較佳為伸丙基、伸丁基、伸戊基或伸己基。 Further, in the case of a polar solvent such as propylene glycol methyl ether acetate, a propyl group, a butyl group, a pentyl group or a hexyl group is preferred.

如此,可列舉上式(3-5)或(3-6)所示者作為Rθ之聚酯鏈,但由合成容易度的觀點而言,較佳為上式(3-5)所示者。 In the above, the polyester chain represented by the above formula (3-5) or (3-6) is used as R θ , but from the viewpoint of easiness of synthesis, it is preferably represented by the above formula (3-5). By.

尚且,在聚胺基甲酸酯分散劑(b-1)具有主鏈的情況,式(3-1)~(3-3)係與主鏈鍵結之親溶媒基,式中之*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵或脲鍵的羰基間的鍵結基。 Further, in the case where the polyurethane dispersant (b-1) has a main chain, the formula (3-1) to (3-3) are a lyophilic group bonded to the main chain, wherein * represents A bonding group with a urethane bond or a urea bond carbonyl group in the polyurethane backbone of the main chain.

(親溶媒基的含有比例) (content ratio of hydrophilic solvent base)

聚胺基甲酸酯分散劑(b-1)可作成為例如具有上述含親溶媒基部分構造者,可作成具有1種上述含親溶媒基部分構造者,或可作成具有2種以上者。尤其是在同時具有具聚醚鏈之含親溶媒基部分構造、與具聚酯鏈之含親溶媒基部分構造時,分散效果更加增大,故較佳。 The polyurethane dispersing agent (b-1) may be, for example, a structure having the above-described portion containing the solvent-containing portion, and may be one having the above-described structure containing the above-mentioned containing solvent-containing portion, or two or more kinds thereof. In particular, when the structure containing the hydrophilic group having a polyether chain and the structure containing the hydrophilic group having a polyester chain are combined, the dispersion effect is further increased, which is preferable.

具聚酯鏈之含親溶媒基部分構造相對於具聚醚鏈之含親溶媒基部分構造的質量比率,較佳為1/99以上、更佳為3/97以上、再更佳為5/95以上,且較佳為99/1以下、更佳為97/3以下、再更佳為95/5以下。 The mass ratio of the structure containing the hydrophilic solvent group having a polyester chain to the structure containing the hydrophilic solvent group having a polyether chain is preferably 1/99 or more, more preferably 3/97 or more, still more preferably 5/. 95 or more, and preferably 99/1 or less, more preferably 97/3 or less, still more preferably 95/5 or less.

由分散性之觀點而言,聚胺基甲酸酯分散劑(b-1)較佳係具有選自上式(3-1)~(3-3)之任一種部分構造,更佳係具有式(3-1)所示之部分構造。 From the viewpoint of dispersibility, the polyurethane dispersant (b-1) preferably has a partial structure selected from any one of the above formulas (3-1) to (3-3), and more preferably has a partial structure. Part of the structure shown in formula (3-1).

同樣地,由分散性的觀點而言,聚胺基甲酸酯分散劑(b-1)中之含親溶媒基部分構造的含有比例,較佳為5質量%以上、 更佳為10質量%以上、再更佳為20質量%以上、又更佳為30質量%以上、特佳為40質量%以上、最佳為50質量%以上,且較佳為90質量%以下、更佳為80質量%以下、再更佳為70質量%以下。 Similarly, the content ratio of the structure containing the hydrophilic solvent moiety in the polyurethane dispersant (b-1) is preferably 5% by mass or more, from the viewpoint of dispersibility. More preferably, it is 10 mass% or more, further preferably 20 mass% or more, more preferably 30 mass% or more, particularly preferably 40 mass% or more, most preferably 50 mass% or more, and preferably 90 mass% or less. More preferably, it is 80% by mass or less, and even more preferably 70% by mass or less.

聚胺基甲酸酯分散劑(b-1)除了親溶媒基及吸附基以外,亦可具有其他官能基。作為其他官能基,可列舉例如活性能量射線硬化性不飽和基等。具體而言,可列舉例如乙烯基、丙烯醯基及甲基丙烯醯基等之不飽和基。 The polyurethane dispersant (b-1) may have other functional groups in addition to the lyophilic vehicle and the adsorbing group. Examples of the other functional group include an active energy ray-curable unsaturated group and the like. Specific examples thereof include an unsaturated group such as a vinyl group, an acryloyl group or a methacryl group.

如此,可認為藉由具有活性能量射線硬化性不飽和基,則有作成感光性組成物時提升感度的傾向;但另一方面,因認為在分散時此等官能基發生反應而有凝膠化之傾向,故由考慮到經時穩定性的顏料分散的觀點而言,較佳係不具有活性能量射線硬化性不飽和基。 In this way, it is considered that the active energy ray-curable unsaturated group tends to increase the sensitivity when the photosensitive composition is formed. On the other hand, it is considered that these functional groups react and gel at the time of dispersion. In view of the tendency of the pigment dispersion in consideration of the stability over time, it is preferred that the active energy ray-curable unsaturated group is not provided.

(發揮效果之理由) (The reason for the effect) <分散性提升效果> <Dispersibility improvement effect>

本發明所使用之聚胺基甲酸酯分散劑(b-1)的特徵在於含有上式(i)所示之部分構造。藉由含有上式(i)所示之部分構造,可將親溶媒基或吸附基、尤其是含親溶媒基部分構造或含吸附基部分構造配置於直線上,認為可提高對溶媒之相溶性及對顏料整體的吸附性。又,胺基甲酸乙酯鍵結部位中之氮原子亦有助於顏料吸附,可認為藉由與吸附基間的相乘效果,而使顏料吸附性更加良好。 The polyurethane dispersant (b-1) used in the present invention is characterized by containing a partial structure represented by the above formula (i). By containing a partial structure represented by the above formula (i), it is possible to arrange a hydrophilic solvent group or an adsorbing group, in particular, a structure containing an insoluble solvent group or a structure containing an adsorbing group, on a straight line, and it is considered that compatibility with a solvent can be improved. And the adsorption of the pigment as a whole. Further, the nitrogen atom in the urethane bonding site also contributes to the adsorption of the pigment, and it is considered that the pigment adsorption property is further improved by the synergistic effect with the adsorption group.

尤其是在將親溶媒基設為含有聚醚鏈及/或聚酯鏈者的情況,於其部位與感光性樹脂組成物中之溶劑(e)呈親和而擴展於溶媒中,於分散時若顏料將發生凝集,其成為立體障礙部,而有發 揮防止顏料凝集之機能的傾向。 In particular, when the hydrophilic solvent group is a polyether chain and/or a polyester chain, the solvent is added to the solvent in the solvent (e) in the photosensitive resin composition, and is dispersed in the solvent. The pigment will agglomerate, which becomes a steric obstacle and has hair The tendency to prevent the function of pigment agglutination.

另外,若依配合溶媒極性或感光性樹脂組成物中之後述鹼可溶性樹脂(d)或光聚合性單體之極性的方式,構成聚醚鏈與聚酯鏈的極性,則鏈部分容易於溶媒中擴展、立體障礙作用變大,有分散性良好之傾向。 In addition, when the polarities of the polyether chain and the polyester chain are formed so as to match the polarity of the solvent-soluble or photosensitive resin composition, the polarity of the alkali-soluble resin (d) or the photopolymerizable monomer, the chain portion is easily used as a solvent. In the expansion, the steric obstacles become larger and there is a tendency to be well dispersed.

特佳係具有具聚醚鏈之親溶媒基、與具聚酯鏈之親溶媒基兩者。可認為藉由具有此等兩者,則容易將親溶媒基之極性調整為配合溶媒極性,親溶媒基於溶媒中更加擴展,立體障礙作用更加增大,得到更良好的分散狀態,有即使經過長時間後仍可穩定保持分散狀態的傾向。 It is particularly preferred to have both a hydrophilic solvent group having a polyether chain and a hydrophilic solvent group having a polyester chain. It is considered that by having both of these, it is easy to adjust the polarity of the hydrophilic solvent group to match the polarity of the solvent, and the hydrophilic solvent is further expanded based on the solvent, and the steric hindrance effect is further increased, and a more dispersed state is obtained, even if it is long. The tendency to maintain a stable state after the time is still maintained.

再者,吸附基較佳係遠離主鏈之聚胺基甲酸酯骨架。可認為藉由使特定之吸附基遠離直鏈聚胺基甲酸酯骨架,則顏料吸附時之立體障礙變少,有顏料吸附性更加提升的傾向。 Further, the adsorbing group is preferably away from the polyurethane skeleton of the main chain. It is considered that when the specific adsorption group is kept away from the linear polyurethane skeleton, the steric hindrance at the time of adsorption of the pigment is reduced, and the pigment adsorption property tends to be further improved.

<鹼顯影處理耐性提升及耐熱性提升所造成之高細微細線的形成> <Formation of high fine lines caused by improvement in alkali development treatment resistance and heat resistance improvement>

藉由使用含有聚胺基甲酸酯分散劑(b-1)的感光性樹脂組成物,而製造應用於平板電腦或高精細顯示器等的高精細之彩色濾光片,尤其是即便於進行鹼顯影或高溫處理之步驟中亦可穩定形成細微之高細線。 By using a photosensitive resin composition containing a polyurethane dispersant (b-1), a high-definition color filter applied to a tablet computer or a high-definition display or the like is manufactured, especially even if a base is used. Fine or fine lines can be stably formed in the steps of development or high temperature treatment.

為了穩定形成細微之細線,必須在鹼顯影時穩定形成此細線形狀,且在其後之由200℃以上之高溫加熱處理所進行的硬化步驟中熱變形少、穩定保持其形狀。 In order to stably form a fine fine line, it is necessary to stably form the shape of the fine line at the time of alkali development, and the heat deformation in the subsequent hardening step by a high-temperature heat treatment of 200 ° C or more is small, and the shape is stably maintained.

可認為含有聚胺基甲酸酯分散劑(b-1)之感光性樹脂組成物,係因顏料與分散劑間之吸附力強而對鹼顯影液的耐性變 高,故在紫外線照射後之鹼顯影時,暫時形成之細微的細線係即使在進一步浸漬於鹼顯影液中的情況下,於該細線仍可抑制顯影液滲透至其與基板密黏之部分,而可防止插陷發生、剝離發生、因浸蝕所造成之楔形狀之變形。又,可認為在顯影後以200℃以上進行高溫處理使其硬化的情況下,亦是顏料與分散性間之吸附不變弱、熱變形少,故可穩定保持細微之細線形狀。 It is considered that the photosensitive resin composition containing the polyurethane dispersant (b-1) is resistant to alkali developer due to strong adsorption between the pigment and the dispersant. When the alkali is developed after the ultraviolet irradiation, the fine fine lines temporarily formed are prevented from penetrating into the portion where the developer adheres to the substrate even when further immersed in the alkali developing solution. It can prevent the occurrence of trapping, peeling, and deformation of the wedge shape caused by etching. In addition, when it is cured at a high temperature of 200 ° C or higher after curing, it is considered that the adsorption between the pigment and the dispersibility is not weak and the thermal deformation is small, so that the fine fine line shape can be stably maintained.

可認為聚胺基甲酸酯分散劑(b-1)由於具有上式(i)所示之部分構造,故如上所述,容易吸附於顏料全體,且於胺基甲酸乙酯鍵或吸附基之部分與顏料間強力吸附,可包覆顏料。 It is considered that since the polyurethane dispersant (b-1) has a partial structure represented by the above formula (i), it is easily adsorbed to the entire pigment as described above, and is bonded to the urethane bond or the adsorbent group. The part is strongly adsorbed between the pigments and can coat the pigment.

尤其是在將親溶媒基設為含有聚醚鏈及/或聚酯鏈者的情況,該親溶媒基具有朝顏料之外側擴展的機能,在製造彩色濾光片的步驟中,有與鹼可溶性樹脂或藉紫外線而交聯之光聚合性單體等良好地相溶、交纏的傾向。 In particular, when the lyophilic vehicle is used as a polyether chain and/or a polyester chain, the lyophilic solvent has a function of expanding toward the outer side of the pigment, and is soluble in alkali in the step of producing a color filter. The resin or the photopolymerizable monomer which is crosslinked by ultraviolet rays tends to be well compatible and entangled.

如此,可認為藉由聚胺基甲酸酯分散劑(b-1)之顏料吸附性及溶媒親和性,可改善對鹼顯影液之耐性及對高溫處理之耐性。尤其是在紫外線難以到達深部而使深部之硬化較弱、碳黑等之顏料含有比例較高的感光性樹脂組成物中較為有效。 Thus, it is considered that the resistance to alkali developing solution and the resistance to high-temperature treatment can be improved by the pigment adsorption property and the solvent affinity of the polyurethane dispersant (b-1). In particular, it is effective in a photosensitive resin composition in which it is difficult to reach the deep portion of the ultraviolet light and the hardening of the deep portion is weak, and the pigment content ratio such as carbon black is high.

尤其是在將作為後述之光聚合起始劑(c)之兼具有光吸收作用與自由基發生作用、少量時即具有高感度的肟酯光聚合起始劑(c-1),與聚胺基甲酸酯分散劑(b-1)組合使用的情況下,認為可促進光聚合性單體或鹼可溶性樹脂之由紫外線照射所造成的交聯,此等與聚胺基甲酸酯分散劑之親溶媒基間的交纏變得更加牢固,提升耐鹼顯影性及耐熱性,穩定形成細微之細線形狀。 In particular, an oxime ester photopolymerization initiator (c-1) which has a light absorbing action and a radical action as a photopolymerization initiator (c) to be described later, and which has a high sensitivity when it is small, is polymerized. When the urethane dispersant (b-1) is used in combination, it is considered that the crosslinking of the photopolymerizable monomer or the alkali-soluble resin by ultraviolet irradiation can be promoted, and the dispersion with the polyurethane is promoted. The intertwining between the dissolving agents of the agent is further enhanced, and the alkali-resistant developability and heat resistance are improved, and the fine fine line shape is stably formed.

尤其是在使用較多地含有芳香環之樹脂作為鹼可溶 性樹脂的情況,藉由起因於其芳香環的高耐熱性及高耐鹼性、或3維之較大立體障礙,亦使耐熱性及耐鹼性提升,而有可更加穩定地形成細微之細線形狀的傾向。 Especially in the case of using a resin containing a large amount of aromatic rings as an alkali soluble In the case of a resin, heat resistance and alkali resistance are also improved by the high heat resistance and high alkali resistance of the aromatic ring or the three-dimensional steric obstacle, and the fineness can be formed more stably. The tendency of thin line shapes.

再者,在使用碳黑等遮光劑的情況,其平均一次粒徑較小時,此聚胺基甲酸酯分散劑(b-1)越容易攝入顏料,更加提升耐鹼顯影性及耐熱性,而有可更加穩定地形成細微之細線形狀的傾向。 In the case where an opacifier such as carbon black is used, when the average primary particle diameter is small, the polyurethane dispersant (b-1) is more likely to ingest the pigment, and the alkali developability and heat resistance are further improved. Sexuality, and there is a tendency to form a fine fine line shape more stably.

在聚胺基甲酸酯分散劑(b-1)含有具聚醚鏈之親溶媒基與具聚酯鏈之親溶媒基的兩者時,此等係容易與高分子之鹼可溶性樹脂或藉紫外線而交聯之光聚合性單體相溶、更容易交纏,故有提升對鹼顯影液之耐性及對高溫處理之耐性的傾向。 When the polyurethane dispersant (b-1) contains both a hydrophilic solvent group having a polyether chain and a hydrophilic solvent group having a polyester chain, these are easily mixed with a polymer-soluble resin or a polymer. Since the photopolymerizable monomer which is crosslinked by ultraviolet rays is compatible and is more easily entangled, there is a tendency to improve resistance to an alkali developer and resistance to high temperature treatment.

又,進而在聚醚鏈為具有長鏈之環氧烷的情況,係與鹼可溶性樹脂或光聚合性單體更加相溶、且容易交纏,故提升耐鹼性及耐熱性,且更佳。 Further, when the polyether chain is a long-chain alkylene oxide, it is more compatible with an alkali-soluble resin or a photopolymerizable monomer, and is easily entangled, thereby improving alkali resistance and heat resistance, and is more preferable. .

另外,吸附基較佳係遠離主鏈之聚胺基甲酸酯骨架。藉由使吸附基遠離主鏈之聚胺基甲酸酯骨架,則使此吸附基在吸附於顏料時的立體障礙變小,聚胺基甲酸酯分散劑(b-1)容易攝入顏料,進而有對鹼顯影液之耐性及對高溫處理之耐性增加的傾向。 Further, the adsorbing group is preferably away from the polyurethane skeleton of the main chain. By moving the adsorbing group away from the polyurethane skeleton of the main chain, the steric hindrance of the adsorbing group upon adsorption to the pigment is reduced, and the polyurethane dispersing agent (b-1) is easy to ingest the pigment. Further, there is a tendency that the resistance to the alkali developer and the resistance to high temperature treatment increase.

[聚胺基甲酸酯分散劑(b-1)之製造方法] [Method for Producing Polyurethane Dispersant (b-1)]

聚胺基甲酸酯分散劑(b-1)係例如可使用二異氰酸酯化合物進行製造。又,吸附基可使用具有與異氰酸酯基進行反應之官能基的羥基、亞胺基或硫醇基2個,且具有不與該異氰酸酯基進行反應之吸附基1個以上的化合物(以下有時稱為「吸附基導入化合物」)而 獲得。 The polyurethane dispersant (b-1) can be produced, for example, using a diisocyanate compound. Further, as the adsorbing group, two hydroxyl groups, an imine group or a thiol group having a functional group reactive with an isocyanate group, and one or more compounds having an adsorbing group which does not react with the isocyanate group may be used (hereinafter sometimes referred to as For the "adsorption group introduction compound") obtain.

藉由上述吸附基導入化合物與二異氰酸酯化合物進行反應而鍵結,可形成直鏈構造之聚胺基甲酸酯骨架。又,該吸附基導入化合物中所含之吸附基,係對感光性樹脂組成物中之屬於色材(a)之顏料進行吸附的吸附基。 The above-mentioned adsorption group introduction compound is bonded to the diisocyanate compound to bond, and a linear structure of the polyurethane skeleton can be formed. Moreover, the adsorption group contained in the adsorption group introduction compound is an adsorption group for adsorbing the pigment belonging to the color material (a) in the photosensitive resin composition.

視上述吸附基導入化合物中之特定吸附基的構造,有該吸附基成為含於聚胺基甲酸酯骨架中的情形、與成為聚胺基甲酸酯骨架之側鏈而形成鍵結於主鏈之聚胺基甲酸酯骨架的懸掛型吸附基的情形。 The structure in which the adsorption group is introduced into a specific adsorption group in the compound is such that the adsorption group is contained in the polyurethane skeleton, and the side chain which becomes the polyurethane skeleton forms a bond to the main The case of a pendant adsorption group of a chain polyurethane skeleton.

聚胺基甲酸酯分散劑(b-1)之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵等雖然亦吸附於顏料,但藉由進一步具有吸附於顏料表面的吸附基,並使其組入至聚胺基甲酸酯骨架中、或成為聚胺基甲酸酯骨架之側鏈而形成懸掛型之吸附基,則顯示更良好的顏料吸附性。吸附基為懸掛型之吸附基時,有顏料吸附時之立體障礙較小的傾向,故較佳。關於此等細節將於後述。 The urethane bond or the like in the polyurethane skeleton of the polyurethane dispersant (b-1) is adsorbed to the pigment, but further has an adsorption group adsorbed on the surface of the pigment, and When it is incorporated into a polyurethane skeleton or a side chain of a polyurethane skeleton to form a pendant adsorption group, it exhibits better pigment adsorption properties. When the adsorption group is a suspension type adsorption group, the steric hindrance at the time of pigment adsorption tends to be small, which is preferable. Details regarding these will be described later.

聚胺基甲酸酯分散劑(b-1)所含有之親溶媒基,係藉由使用僅於其一末端具有羥基、亞胺基或硫醇基2個的化合物,使此2個基與異氰酸酯基進行反應而可鍵結於聚胺基甲酸酯骨架。 The lyophilic medium contained in the polyurethane dispersant (b-1) is obtained by using a compound having only one hydroxyl group, an imido group or a thiol group at one end thereof. The isocyanate group is reacted to bond to the polyurethane backbone.

聚胺基甲酸酯分散劑(b-1)所含有之較佳親溶媒基之聚醚鏈,係藉由使用僅於其一末端具有羥基、亞胺基或硫醇基2個的化合物,使此2個基與異氰酸酯基進行反應而可鍵結於聚胺基甲酸酯骨架。在另一末端具有與異氰酸酯進行反應之基時,較佳係將此基藉由烷基等取代而使其不與異氰酸酯基反應。 The polyether chain of the preferred lyophilic group contained in the polyurethane dispersant (b-1) is a compound having two hydroxyl groups, an imido group or a thiol group at one end thereof, The two groups are reacted with an isocyanate group to bond to the polyurethane skeleton. When the other end has a group reactive with an isocyanate, it is preferred that the group is not substituted with an isocyanate group by substitution with an alkyl group or the like.

如此,藉由僅於單末端與二異氰酸酯化合物鍵結,使 其鍵結成由主鏈之聚胺基甲酸酯骨架依側鏈之型式延伸般(以下稱為「橫方向」),可形成親溶媒基之聚醚側鏈。關於此等之細節將於後述。 Thus, by bonding only with a diisocyanate compound at the single end, It is bonded to a polyether side chain which is formed by a side chain of a backbone chain of a main chain (hereinafter referred to as "lateral direction") to form a hydrophilic solvent group. Details regarding these will be described later.

同樣地,親溶媒基所含有之較佳的聚酯鏈,亦藉由使用僅於其一末端具有羥基、亞胺基或硫醇基2個的化合物,使此2個基與異氰酸酯基進行反應而可鍵結於聚胺基甲酸酯骨架。在另一末端具有與異氰酸酯進行反應之基時,較佳係藉由取代而使其不與異氰酸酯基反應。 Similarly, a preferred polyester chain contained in the lyophilic medium also reacts the two groups with an isocyanate group by using a compound having only one hydroxyl group, an imido group or a thiol group at one end thereof. It can be bonded to the polyurethane backbone. When the other end has a group reactive with an isocyanate, it is preferably substituted with an isocyanate group by substitution.

如此,藉由僅於單末端與二異氰酸酯化合物鍵結,使其由主鏈之聚胺基甲酸酯骨架朝橫方向鍵結,可形成親溶媒基之聚酯側鏈。關於此等之細節將於後述。 Thus, the polyester side chain of the hydrophilic solvent group can be formed by bonding only the mono-terminal to the diisocyanate compound to bond in the transverse direction from the polyurethane skeleton of the main chain. Details regarding these will be described later.

[構成聚胺基甲酸酯分散劑(b-1)的化合物(b-a)、(b-b)、(b-c)] [Compound (b-a), (b-b), (b-c)] constituting the polyurethane dispersant (b-1)]

成為聚胺基甲酸酯分散劑(b-1)之主鏈的聚胺基甲酸酯骨架,較佳係本質上為直鏈。作為用於形成此直鏈之聚胺基甲酸酯骨架的聚異氰酸酯化合物,較佳係如上所述使用具有2個異氰酸酯基的二異氰酸酯化合物(b-a)。 The polyurethane skeleton which becomes the main chain of the polyurethane dispersant (b-1) is preferably linear in nature. As the polyisocyanate compound for forming the linear polyurethane skeleton, it is preferred to use a diisocyanate compound (b-a) having two isocyanate groups as described above.

藉由將上述二異氰酸酯化合物(b-a),與具有與異氰酸酯基進行反應之官能基2個、且具有1個以上吸附基的吸附基導入化合物(b-b),以及僅於一末端具有與異氰酸酯基進行反應之官能基2個、且含有親溶媒基的化合物(b-c)鍵結,可得到具有屬於主鏈之直鏈構造的胺基甲酸乙酯骨架、鍵結於該主鏈之親溶媒基、與吸附基的聚胺基甲酸酯分散劑(b-1)。 The diisocyanate compound (ba) is introduced into the compound (bb) by an adsorption group having two functional groups reactive with an isocyanate group and having one or more adsorption groups, and having an isocyanate group at only one terminal. Two compounds having a functional group and a compound (bc) containing a solvent group are bonded to each other to obtain a urethane skeleton having a linear structure of a main chain, a lyophilic group bonded to the main chain, and Adsorbent-based polyurethane dispersant (b-1).

聚胺基甲酸酯分散劑(b-1)係以聚胺基甲酸酯骨架作 為主幹聚合物、以親溶媒基作為分枝聚合物的接枝聚合體;較佳係具有於主幹聚合物之直鏈聚胺基甲酸酯骨架的主鏈中、或與主鏈鍵結的特定吸附基。 Polyurethane dispersant (b-1) is based on a polyurethane skeleton a backbone polymer, a graft polymer having a lyophilic vehicle as a branched polymer; preferably having a backbone of a linear polyurethane backbone of the backbone polymer or bonded to the backbone Specific adsorption groups.

[化合物(b-a);構成聚胺基甲酸酯骨架之二異氰酸酯化合物] [Compound (b-a); diisocyanate compound constituting a polyurethane skeleton]

作為上述二異氰酸酯化合物(b-a),較佳為甲苯二異氰酸酯(TDI)、異佛爾酮二異氰酸酯(IPDI)、己烷二異氰酸酯(HDI)、α,α-四甲基二甲苯二異氰酸酯(TMXDI)、二苯基甲烷-4,4'-二異氰酸酯(4,4'-MDI)、二苯基甲烷-2,4'-二異氰酸酯(2,4'-MDI)或二環己基甲烷-4,4'-二異氰酸酯(HMDI)等之二異氰酸酯化合物,或此等之二異氰酸酯化合物的混合物。 As the above diisocyanate compound (ba), toluene diisocyanate (TDI), isophorone diisocyanate (IPDI), hexane diisocyanate (HDI), α,α-tetramethylxylene diisocyanate (TMXDI) are preferred. ), diphenylmethane-4,4'-diisocyanate (4,4'-MDI), diphenylmethane-2,4'-diisocyanate (2,4'-MDI) or dicyclohexylmethane-4 a diisocyanate compound such as 4'-diisocyanate (HMDI) or a mixture of such diisocyanate compounds.

此等之中,較佳為TDI、IPDI及MDI之任一種,更佳為TDI及/或MDI。亦可使用上述具體例以外之二異氰酸酯化合物作為二異氰酸酯化合物(b-a)。 Among these, it is preferably any one of TDI, IPDI, and MDI, and more preferably TDI and/or MDI. A diisocyanate compound other than the above specific examples can also be used as the diisocyanate compound (b-a).

左下例示數個二異氰酸酯化合物(b-a)的化合物,藉此,可對聚胺基甲酸酯分散劑(b-1)導入右下之部分構造。 A compound of a plurality of diisocyanate compounds (b-a) is exemplified in the lower left side, whereby the polyurethane dispersant (b-1) can be introduced into the lower right part structure.

上式中,*表示與胺基甲酸乙酯鍵中之氧原子、或脲鍵中之氮原子間的鍵結基。 In the above formula, * represents a bond group with an oxygen atom in the urethane bond or a nitrogen atom in the urea bond.

上述以外,若為具有2個異氰酸酯的二異氰酸酯化合物,亦可應用作為將直鏈聚胺基甲酸酯構造導入至聚胺基甲酸酯分散劑(b-1)的二異氰酸酯化合物(b-a)。 In addition to the above, a diisocyanate compound having two isocyanates may be used as a diisocyanate compound (ba) which introduces a linear polyurethane structure into a polyurethane dispersant (b-1). .

[化合物(b-b);具有與異氰酸酯進行反應之官能基2個、且具有至少1個以上吸附基的化合物] [Compound (b-b); a compound having two functional groups reactive with an isocyanate and having at least one or more adsorbing groups]

聚胺基甲酸酯分散劑(b-1)中所含之吸附基,係為了與上述二異氰酸酯化合物(b-a)形成聚胺基甲酸酯骨架,可由具有與異氰酸酯基進行反應之官能基2個的吸附基導入化合物(b-b)獲得。 The adsorbing group contained in the polyurethane dispersing agent (b-1) is a functional group 2 having a reaction with an isocyanate group in order to form a polyurethane skeleton with the above diisocyanate compound (ba). The adsorption group was introduced into the compound (bb).

作為與異氰酸酯基進行反應之官能基,較佳為羥基或亞胺基。作為具有該官能基2個時的具體例,較佳係1個為羥基、且另一個為亞胺基的情況,或2個均為羥基的情形;更佳係2個均為羥基。 As the functional group which reacts with an isocyanate group, a hydroxyl group or an imide group is preferable. In the case of having two specific functional groups, it is preferred that one of them is a hydroxyl group and the other is an imine group, or both of them are hydroxyl groups; more preferably, both of them are hydroxyl groups.

在此化合物(b-b)除了與異氰酸酯基進行反應之官能基以外尚具有鹼性基的情況,此鹼性基較佳係設為不與異氰酸酯基反應者。作為具有此種鹼性基的化合物,可列舉例如脂肪族三級胺、受阻芳香族胺及脂環族或芳香族之氮雜環化合物。作為受阻芳香族胺,可列舉例如於其2位及/或6位具有立體障礙基的苯胺。 In the case where the compound (b-b) has a basic group in addition to the functional group which reacts with the isocyanate group, the basic group is preferably such that it does not react with the isocyanate group. Examples of the compound having such a basic group include an aliphatic tertiary amine, a hindered aromatic amine, and an alicyclic or aromatic nitrogen heterocyclic compound. Examples of the hindered aromatic amine include aniline having a steric hindrance group at the 2-position and/or the 6-position.

藉由此化合物(b-b)與二異氰酸酯化合物(b-a)所造成的胺基甲酸乙酯鍵及/或脲鍵,可將上式(1)、(2-1)、(2-2)或(2-3)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)。 By the urethane bond and/or the urea bond caused by the compound (bb) and the diisocyanate compound (ba), the above formula (1), (2-1), (2-2) or Part of the structure shown in 2-3) is introduced into the polyurethane dispersant (b-1).

可使式(1)所示之部分構造導入至聚胺基甲酸酯分散 劑(b-1)的化合物(b-b),可列舉與異氰酸酯基進行反應之2個官能基均為羥基者。此2個羥基與二異氰酸酯化合物(b-a)之2個異氰酸酯基係進行胺基甲酸乙酯鍵結。具體例將於後述。 Part of the structure shown in formula (1) can be introduced into the polyurethane dispersion The compound (b-b) of the agent (b-1) may be one in which both of the functional groups reactive with the isocyanate group are hydroxyl groups. The two hydroxyl groups are bonded to the two isocyanate groups of the diisocyanate compound (b-a) by urethane. Specific examples will be described later.

可使式(2-1)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)的化合物(b-b),可列舉與異氰酸酯基進行反應之2個官能基均為羥基者。此2個羥基與二異氰酸酯化合物(b-a)之2個異氰酸酯基係進行胺基甲酸乙酯鍵結。具體例將於後述。 A part of the structure represented by the formula (2-1) can be introduced into the compound (bb) of the polyurethane dispersant (b-1), and both of the functional groups reactive with the isocyanate group are hydroxyl groups. . The two hydroxyl groups are bonded to the two isocyanate groups of the diisocyanate compound (b-a) by urethane. Specific examples will be described later.

可使式(2-2)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)的化合物(b-b),可列舉具有式(2-2)所示之部分構造中之N原子之鍵結基與氫原子經鍵結的亞胺基、O原子之鍵結基與氫原子經鍵結的羥基者。此亞胺基及羥基、與二異氰酸酯化合物(b-a)之2個異氰酸酯基係分別進行脲鍵結及胺基甲酸乙酯鍵結。具體例將於後述。 A part of the structure represented by the formula (2-2) can be introduced into the compound (bb) of the polyurethane dispersant (b-1), and a part of the structure represented by the formula (2-2) can be mentioned. The bonding group of the N atom and the hydrogen atom are bonded to the imine group, the bonding group of the O atom, and the hydroxyl group bonded to the hydrogen atom. The imine group and the hydroxyl group are bonded to the two isocyanate groups of the diisocyanate compound (b-a) by urea bonding and urethane bonding, respectively. Specific examples will be described later.

可使式(2-3)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)的化合物(b-b),可列舉與異氰酸酯基進行反應之2個官能基均為羥基者。此2個羥基與二異氰酸酯化合物(b-a)之2個異氰酸酯基係進行胺基甲酸乙酯鍵結。具體例將於後述。 A part of the structure represented by the formula (2-3) can be introduced into the compound (bb) of the polyurethane dispersant (b-1), and both of the functional groups reactive with the isocyanate group are hydroxyl groups. . The two hydroxyl groups are bonded to the two isocyanate groups of the diisocyanate compound (b-a) by urethane. Specific examples will be described later.

[用於導入式(1)所示之部分構造的化合物(b-b)] [Compound (b-b) for introducing a part of the structure shown by the formula (1)]

在化合物(b-b)為將式(1)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)的化合物時,藉由化合物(b-b)之2個羥基、與二異氰酸酯化合物(b-a)之2個異氰酸酯的鍵結,使式(1)所示之部分構造全體之3級胺構造組入至聚胺基甲酸酯骨架。 When the compound (bb) is a compound having a partial structure represented by the formula (1) introduced into the polyurethane dispersant (b-1), the two hydroxyl groups of the compound (bb) and the diisocyanate compound are used. The bonding of the two isocyanates of (ba) allows the tertiary amine structure of the entire structure represented by the formula (1) to be incorporated into the polyurethane skeleton.

作為此情況之具體例,可列舉N-甲基二乙醇胺 (NMDA)及N-苯基二乙醇胺(NPDA)等。 Specific examples of this case include N-methyldiethanolamine. (NMDA) and N-phenyldiethanolamine (NPDA).

例如,藉由左下例示之化合物,可將右下例示之構造導入至聚胺基甲酸酯分散劑(b-1)中。此相當於上式(1)所示之部分構造。此外,若為含有式(1)所示之部分構造、且於其末端具有羥基者,亦可應用於聚胺基甲酸酯分散劑(b-1)的合成。又,藉由取代羥基而使用具有硫醇基或胺基等者,亦可得到類似之聚胺基甲酸酯化合物。 For example, the structure exemplified below can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below. This corresponds to a partial configuration shown in the above formula (1). Further, it is also applicable to the synthesis of the polyurethane dispersant (b-1) if it contains a partial structure represented by the formula (1) and has a hydroxyl group at its terminal. Further, a similar urethane compound can be obtained by using a thiol group or an amine group by substituting a hydroxyl group.

上式中,*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

[用於導入式(2-1)~(2-3)所示之部分構造的化合物(b-b)] [Compound (b-b) for introducing a part of the structure shown in (2-1) to (2-3)]

在吸附基導入化合物(b-b)為將上式(2-1)、(2-2)或(2-3)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)的化合物時,藉由與化合物(b-b)之異氰酸酯基進行反應之2個官能基、與二異氰酸酯化合物(b-a)之異氰酸酯基的鍵結,成為使屬於吸附基之式(2-1)、(2-2)或(2-3)中之Rα、Rβ、N及Rγ(Rγ')遠離聚胺基甲酸酯骨架而存在。 In the adsorption group introduction compound (bb), a partial structure represented by the above formula (2-1), (2-2) or (2-3) is introduced into the polyurethane dispersant (b-1). In the case of the compound, the two functional groups which are reacted with the isocyanate group of the compound (bb) and the isocyanate group of the diisocyanate compound (ba) are bonded to each other to form an adsorption group (2-1), (2). -2) or (2-3) of R α, R β, N, and R γ (R γ ') remote from the polyurethane backbone exist.

吸附基導入化合物(b-b)中,可將式(2-1)、(2-2)或(2-3)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)的化合物,係基於上述<分散性提升效果>及<耐鹼顯影液提升及耐熱性提升所造成之 高細微細線的形成>所記載之理由,故較佳。 In the adsorption group introduction compound (bb), a part of the structure represented by the formula (2-1), (2-2) or (2-3) can be introduced into the polyurethane dispersant (b-1). The compound is based on the above-mentioned <dispersibility enhancement effect> and < alkali-resistant developer promotion and heat resistance improvement The formation of high-fine fine lines is preferred because of the reasons described.

將式(2-1)、(2-2)或(2-3)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)的吸附基導入化合物(b-b),較佳係具有羥基及/或亞胺基,與二異氰酸酯化合物(b-a)之2個異氰酸酯基藉由胺基甲酸乙酯鍵及/或脲鍵進行鍵結,而形成聚胺基甲酸酯骨架。 The partial structure represented by the formula (2-1), (2-2) or (2-3) is introduced into the adsorption group introduction compound (bb) of the polyurethane dispersant (b-1), preferably It has a hydroxyl group and/or an imine group, and the two isocyanate groups of the diisocyanate compound (ba) are bonded by a urethane bond and/or a urea bond to form a polyurethane skeleton.

此時,式(2-1)、(2-2)或(2-3)所示之部分構造中之N原子、Rδ及Rε(Rε')、O、Rη、及C原子係組入至聚胺基甲酸酯骨架,但屬於3級胺之Rα、Rβ、N及Rγ(Rγ')的吸附基則藉由鍵結於聚胺基甲酸酯骨架而由聚胺基甲酸酯骨架遠離。其結果,3級胺之氮原子係由聚胺基甲酸酯骨架上之最接近之原子隔著至少1個原子。 At this time, N atoms, R δ and R ε (R ε' ), O, R η , and C atoms in a partial structure represented by the formula (2-1), (2-2) or (2-3) The group is incorporated into the polyurethane skeleton, but the adsorption groups of R α , R β , N and R γ (R γ′ ) belonging to the tertiary amine are bonded to the polyurethane skeleton. Keep away from the polyurethane backbone. As a result, the nitrogen atom of the tertiary amine is separated by at least one atom from the closest atom on the polyurethane skeleton.

如此,由主鏈之直鏈構造之聚胺基甲酸酯骨架遠離而朝橫方向鍵結的3級胺,有對顏料表面具有更良好之吸附機能的傾向。3級胺亦可一部分或全部進行4級化,作成為4級銨鹽。 Thus, the tertiary amine which is separated from the polyurethane structure of the linear structure of the main chain and which is bonded in the transverse direction tends to have a better adsorption function on the surface of the pigment. The tertiary amine may be partially or completely graded to form a grade 4 ammonium salt.

作為4級銨鹽,可列舉例如式(2-1')、(2-2')或(2-3')所示之部分構造中之屬於Rα、Rβ、RA、N+及Rγ(Rγ')的吸附基。 Examples of the fourth-order ammonium salt include R α , R β , R A , and N + in a partial structure represented by the formula (2-1′), (2-2′), or (2-3′). An adsorption group of R γ (R γ' ).

此時,上述吸附基係藉由鍵結於聚胺基甲酸酯骨架而由聚胺基甲酸酯骨架遠離,其結果,4級銨鹽基之氮原子係由聚胺基甲酸酯骨架上最接近之原子隔著至少1個原子。 At this time, the adsorption group is separated from the polyurethane skeleton by bonding to the polyurethane skeleton, and as a result, the nitrogen atom of the 4-stage ammonium salt group is composed of a polyurethane skeleton. The closest atom is separated by at least 1 atom.

此等吸附基導入化合物(b-b)中,可將式(2-1)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)中的化合物的具體例,可列舉如以下之例,但此外,若含有式(2-1)所示之部分構造、且於其末端具有與異氰酸酯基進行反應之官能基2個,則亦可應用於聚胺基甲酸酯分散劑(b-1)。 Specific examples of the compound in which the adsorption group is introduced into the compound (bb) and the partial structure represented by the formula (2-1) can be introduced into the polyurethane dispersant (b-1) can be exemplified as follows. However, if it contains a partial structure represented by Formula (2-1) and has two functional groups reactive with an isocyanate group at the terminal, it can also be applied to a polyurethane dispersing agent ( B-1).

式(2-1)所示之部分構造係由具有至少1個以上3級胺 基、且具有1個羥基的化合物(b-b1)等所獲得。其具體之反應例如以下所示。 Part of the structure shown in formula (2-1) is composed of at least one or more tertiary amines A compound (b-b1) having one hydroxyl group and the like is obtained. The specific reaction is as follows.

首先,使上述化合物(b-b1)之羥基,與甲苯二異氰酸酯等之含有2個異氰酸酯基之化合物的一個異氰酸酯基反應。接著,使另一個異氰酸酯基,與二乙醇胺等之含有1個2級胺基及至少2個活性羥基的化合物中的2級胺基反應。藉此,可於化合物(b-b1)中導入2個羥基。 First, the hydroxyl group of the above compound (b-b1) is allowed to react with one isocyanate group of a compound containing two isocyanate groups such as toluene diisocyanate. Next, another isocyanate group is allowed to react with a secondary amine group in a compound containing one secondary amino group and at least two active hydroxyl groups such as diethanolamine. Thereby, two hydroxyl groups can be introduced into the compound (b-b1).

例如,藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此相當於上式(2-1)所示之部分構造。 For example, the structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below. This corresponds to a partial structure shown in the above formula (2-1).

上式中,*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

又,導入式(2-1)所示之部分構造的化合物,亦可依以下方法獲得。具體而言,係使具有至少1個以上3級胺基、且具有乙烯性不飽和基之化合物,與二乙醇胺等之含有1個2級胺基及至少2個活性羥基的化合物的2級胺基進行邁可加成。 Further, a compound having a partial structure represented by the formula (2-1) can be obtained by the following method. Specifically, a compound having at least one or more tertiary amino groups and having an ethylenically unsaturated group, and a second-order amine having a compound of two amino groups and at least two active hydroxyl groups such as diethanolamine Base to carry out the Michael.

例如,藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此相當於上式(2-1)所示之部分構造。 For example, the structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below. This corresponds to a partial structure shown in the above formula (2-1).

[化51] [化51]

上式中,*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

又,導入式(2-1)所示之部分構造的化合物,亦可依以下方法獲得。例如,使具有3級胺基與1個羥基之化合物,與具有異氰酸酯基與丙烯醯氧基之化合物進行反應,藉由使羥基與異氰酸酯基進行胺基甲酸乙酯鍵結,可於具有3級胺基之化合物中導入不飽和基,再使其與二乙醇胺之2級胺基進行邁可加成的方法等。藉此方法,亦可導入2個羥基。 Further, a compound having a partial structure represented by the formula (2-1) can be obtained by the following method. For example, a compound having a 3-stage amine group and a hydroxyl group is reacted with a compound having an isocyanate group and a propylene methoxy group, and the hydroxy group and the isocyanate group are bonded to the urethane group to have a grade of 3 A method in which an unsaturated group is introduced into an amine group compound, and a secondary amine group of diethanolamine is subjected to a Michael addition. In this way, two hydroxyl groups can also be introduced.

又,作為導入式(2-1)所示之部分構造的化合物有如以下般之化合物。藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此亦相當於上式(2-1)所示之部分構造。此外,若含有式(2-1)所示之部分構造、且於其末端具有2個羥基,則亦可應用於聚胺基甲酸酯分散劑(b-1)的合成。 Further, the compound having a partial structure represented by the introduction formula (2-1) has the following compounds. The structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified in the lower left. This also corresponds to the partial structure shown in the above formula (2-1). Further, when a partial structure represented by the formula (2-1) is contained and two hydroxyl groups are present at the terminal, it can also be applied to the synthesis of the polyurethane dispersant (b-1).

上式中,*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

又,導入式(2-2)所示之部分構造的化合物,可依以下方法獲得。具體而言,係藉中於二甲胺基丙胺等之具有1個3級胺 基與1個1級胺基之化合物中,使丙烯酸羥乙酯等之具有1個羥基與乙烯性不飽和基的化合物進行邁可加成而獲得。藉此,得到具有藉由乙烯性不飽和基與1級胺基之邁可加成所獲得的亞胺基、與羥基的化合物。 Further, a compound having a partial structure represented by the formula (2-2) can be obtained by the following method. Specifically, it has a tertiary amine of dimethylaminopropylamine or the like. Among the compounds of the first-stage amine group, a compound having one hydroxyl group and an ethylenically unsaturated group, such as hydroxyethyl acrylate, is obtained by subjecting it to a Michael addition. Thereby, a compound having an imine group and a hydroxyl group obtained by the Michael addition of an ethylenically unsaturated group and a first-order amine group is obtained.

又,同樣地,藉由單乙醇胺等具有1個羥基與1級胺基的化合物,與2-(二甲胺基)-丙烯酸乙酯等具有1個3級胺基與乙烯性不飽和基的化合物的邁可加成,亦可得到具有3級胺基之吸附基、羥基及亞胺基的化合物。 In the same manner, a compound having one hydroxyl group and a primary amino group such as monoethanolamine, and a 3-amino group and an ethylenically unsaturated group such as 2-(dimethylamino)-ethyl acrylate or the like are used. The Michael addition of the compound also gives a compound having an adsorption group of a 3-stage amine group, a hydroxyl group and an imine group.

例如,藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此相當於上式(2-2)所示之部分構造。此外,若含有上式(2-2)所示之部分構造、且於其末端具有1個羥基及亞胺基,則亦可應用於聚胺基甲酸酯分散劑(b-1)。 For example, the structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below. This corresponds to a partial configuration shown in the above formula (2-2). In addition, when it contains a partial structure represented by the above formula (2-2) and has one hydroxyl group and an imine group at the terminal, it can also be applied to the polyurethane dispersing agent (b-1).

上式中,與氧原子鄰接之*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基;與氮原子鄰接之*表示與主鏈之聚胺基甲酸酯骨架中之脲鍵之羰基間的鍵結基。 In the above formula, * adjacent to the oxygen atom means a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain; * adjacent to the nitrogen atom means aggregation with the main chain A bonding group between carbonyl groups of a urea bond in a urethane skeleton.

又,作為具有式(2-3)所示之部分構造的化合物有如以下化合物。例如,藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此相當於上式(2-3)所示之部分構 造。 Further, the compound having a partial structure represented by the formula (2-3) is as follows. For example, the structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below. This is equivalent to the partial structure shown in the above formula (2-3) Made.

上式中,*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

此外,若含有上式(2-3)所示之部分構造、其末端具有2個羥基,則可應用於聚胺基甲酸酯分散劑(b-1)的合成。 Further, when a partial structure represented by the above formula (2-3) and a terminal having two hydroxyl groups are contained, it can be applied to the synthesis of the polyurethane dispersant (b-1).

例如,替代上述化合物之2個羥基,而取代了2個1級及/或2級胺基的化合物,亦可應用於聚胺基甲酸酯分散劑(b-1)的合成。其他,含有特定之吸附基1個以上、並取代了2個1級及/或2級胺基的化合物,亦可應用於聚胺基甲酸酯分散劑(b-1)的合成。又,可將僅具有1個羥基之化合物(b-b-1)、與來自硫甘油反應而由式(2-3)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1-1)。 For example, a compound in which two hydroxyl groups of the above compound are substituted and two primary and/or secondary amine groups are substituted may be used for the synthesis of the polyurethane dispersant (b-1). Further, a compound containing one or more specific adsorbing groups and substituting two first-order and/or second-order amine groups may be used for the synthesis of the polyurethane dispersant (b-1). Further, a compound having only one hydroxyl group (bb-1) and a part of the structure represented by the formula (2-3) which is reacted with thioglycerol can be introduced into the polyurethane dispersant (b-1- 1).

其具體之反應例係如以下所述。首先,使上述化合物(b-b1)的羥基,與甲苯二異氰酸酯等之含有2個異氰酸酯的化合物的一個異氰酸酯基進行反應。 Specific reaction examples thereof are as follows. First, the hydroxyl group of the above compound (b-b1) is allowed to react with one isocyanate group of a compound containing two isocyanates such as toluene diisocyanate.

接著,使另一個異氰酸酯基,與硫甘油等含有1個活性硫醇基及至少2個活性羥基的化合物的活性硫醇基進行反應。藉此,可於化合物(b-b1)導入2個羥基。 Next, another isocyanate group is allowed to react with an active thiol group of a compound containing one active thiol group and at least two active hydroxyl groups such as thioglycerol. Thereby, two hydroxyl groups can be introduced into the compound (b-b1).

例如,藉由左下例示之化合物,可於聚胺基甲酸酯分 散劑(b-1)中導入右下例示之構造。此相當於上式(2-3)所示之部分構造。 For example, by the compound exemplified in the lower left, the polyurethane can be divided into The powder (b-1) is introduced into the structure exemplified in the lower right. This corresponds to a partial configuration shown in the above formula (2-3).

上式中,*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

[用於導入含氮原子雜環基的化合物(b-b)] [Compound (b-b) for introducing a heterocyclic group containing a nitrogen atom]

藉由使用含有氮原子之雜環化合物作為化合物(b-b),可對聚胺基甲酸酯分散劑(b-1)賦予良好之顏料吸附機能。作為在使此等含有氮原子之雜環組入至聚胺基甲酸酯骨架時之用於導入該含氮原子之雜環基的化合物、與所導入之構造的具體例,可列舉如以下者。 By using a heterocyclic compound containing a nitrogen atom as the compound (b-b), the polyurethane dispersant (b-1) can be imparted with a good pigment adsorption function. Specific examples of the structure for introducing the nitrogen atom-containing heterocyclic group when the heterocyclic ring containing a nitrogen atom is incorporated into the polyurethane skeleton, and the structure to be introduced include the following By.

例如,藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此外,亦可使用與異氰酸酯基進行反應之2個官能基為直接鍵結於雜環上之相異位置、或經由1~10個原子鍵結於雜環上之相異位置的化合物。 For example, the structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below. Further, two functional groups reactive with an isocyanate group may be used as a compound which is directly bonded to a heterocyclic position at a hetero ring or a heterocyclic position bonded to a hetero ring via 1 to 10 atoms.

上式中,*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

又,在含氮原子雜環基為由主鏈之聚胺基甲酸酯骨架經由至少1個以上原子隔離時,可使用如以下般之化合物。例如,藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。 Further, when the nitrogen atom-containing heterocyclic group is isolated from at least one atom by the backbone skeleton of the main chain, the following compounds can be used. For example, the structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below.

此外,亦可使用含有在含氮原子之雜環化合物的環、與經由1~20個原子鍵結之1根側鏈之末端與異氰酸酯基進行反應之官能基2個的化合物。 Further, a compound containing a ring containing a heterocyclic compound containing a nitrogen atom and two functional groups reactive with an isocyanate group at the terminal of one side chain bonded via 1 to 20 atoms may be used.

[化57] [化57]

與氧原子鄰接之*係表示與聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基;與氮原子鄰接之*係表示與聚胺基甲酸酯骨架中之脲鍵之羰基間的鍵結基。 The * adjacent to the oxygen atom means a bonding group to the carbonyl group bonded to the urethane bond in the polyurethane skeleton; the * adjacent to the nitrogen atom means that it is in the polycarbamate skeleton A bonding group between carbonyl groups of a urea bond.

此等化合物亦可藉由與上式(2-1)或(2-2)所示之部分構造相同的方法而獲得。又,在相當於上式(2-3)所示之部分構造的3級胺基之部分為含有氮原子之雜環化合物之構造的情況,亦同樣有效,可應用於聚胺基甲酸酯分散劑(b-1)。 These compounds can also be obtained by the same method as the one shown in the above formula (2-1) or (2-2). Further, in the case where the portion corresponding to the tertiary amino group of the partial structure represented by the above formula (2-3) is a structure of a heterocyclic compound containing a nitrogen atom, it is also effective and can be applied to a polyurethane. Dispersant (b-1).

此等情況下,化合物(b-b)之含有氮原子之雜環化合物,係形成由聚胺基甲酸酯骨架遠離至少1個以上原子的懸掛型吸 附基。聚胺基甲酸酯化合物(b-1-1)含有此懸掛型吸附基者,係基於上述<分散性提升效果>及<耐鹼顯影液提升及耐熱性提升所造成之高細微細線的形成>所述之理由,故較佳。 In these cases, the heterocyclic compound containing a nitrogen atom of the compound (b-b) forms a suspended type which is separated from the at least one atom by the polyurethane skeleton. Attached to the base. The polyurethane compound (b-1-1) contains the suspension type adsorption base, and is based on the above-mentioned <dispersibility lifting effect> and the formation of high fine lines caused by the improvement of alkali-resistant developing solution and heat resistance. >The reason for the above is preferred.

用於聚胺基甲酸酯分散劑(b-1)合成的吸附基導入化合物(b-b),亦可藉由其他公知一般方法而獲得。 The adsorption group introduction compound (b-b) for the synthesis of the polyurethane dispersant (b-1) can also be obtained by other known general methods.

[導入4級銨鹽基的方法] [Method of introducing a 4-stage ammonium salt group]

作為於聚胺基甲酸酯分散劑(b-1)中導入4級銨鹽基的方法,可列舉例如,首先,藉由使用用於導入式(2-1)~(2-3)所示之部分構造的化合物,於聚胺基甲酸酯分散劑(b-1)中導入3級胺基,接著使用已知之任意4級化劑對該3級胺基進行4級化的方法。 As a method of introducing a 4-stage ammonium salt group into the polyurethane dispersant (b-1), for example, first, by using the formula (2-1) to (2-3) The compound of the partial structure shown is a method in which a tertiary amine group is introduced into the polyurethane dispersant (b-1), and then the tertiary amine group is subjected to a four-stage classification using any known fourth-ordering agent.

較佳之4級化劑有烷基鹵化物、芳烷基鹵化物、二烷基硫酸酯、二烷基碳酸酯或環氧化物。特佳之4級化劑為二甲基硫酸酯、氯化苄基或氧化苯乙烯。3級胺基可一部分4級銨鹽化,亦可全部之3級胺基進行4級銨鹽化。 Preferred grade 4 agents are alkyl halides, aralkyl halides, dialkyl sulfates, dialkyl carbonates or epoxides. A particularly preferred leveling agent is dimethyl sulfate, benzyl chloride or styrene oxide. The tertiary amine group can be partially ammonium-salted, and all of the tertiary amine groups can be subjected to 4-stage ammonium salting.

又,此等3級胺基亦可與已知之任意有機酸化合物形成鹽。較佳之有機酸化合物有乙烯基磺酸等有機磺酸化合物、磷酸二甲基丙烯醯氧基乙酯或苯膦酸等之有機磷酸化合物等。 Further, these tertiary amine groups may also form salts with any of the known organic acid compounds. Preferred organic acid compounds include organic sulfonic acid compounds such as vinyl sulfonic acid, organic phosphoric acid compounds such as dimethyl propylene methoxyethyl phosphate or phenylphosphonic acid, and the like.

[化合物(b-c);於單末端具有與異氰酸酯基進行反應之2個官能基,並含有親溶媒基的化合物] [Compound (b-c); a compound having two functional groups reactive with an isocyanate group at one terminal and containing a solvent group]

聚胺基甲酸酯分散劑(b-1)中之聚胺基甲酸酯骨架之主鏈、與鍵結於其側方之橫方向之親溶媒基的側鏈,可藉由使僅於單末端含有具有與異氰酸酯基進行反應之官能基2個之親溶媒基的化合物 (b-c)、與上述二異氰酸酯化合物(b-a)進行反應而獲得。 The main chain of the polyurethane skeleton in the polyurethane dispersant (b-1) and the side chain of the hydrophilic solvent group bonded in the lateral direction of the side may be made only by a compound having a hydrophilic solvent group having two functional groups reactive with an isocyanate group at one end (b-c) is obtained by reacting with the above diisocyanate compound (b-a).

作為與化合物(b-c)之異氰酸酯基進行反應之2個官能基,較佳為羥基及/或亞胺基,更佳係1個為羥基、且另一個為亞胺基,或2個均為羥基,再更佳係2個均為羥基。 The two functional groups which react with the isocyanate group of the compound (bc) are preferably a hydroxyl group and/or an imide group, more preferably one is a hydroxyl group, and the other is an imine group, or both are hydroxyl groups. More preferably, both of them are hydroxyl groups.

以下針對在聚胺基甲酸酯分散劑(b-1)之親溶媒基為含有聚醚鏈及/或聚酯鏈的情況,尤其是具有上式(3-1)~(3-3)所示之部分構造的情況進行詳述。 The following is a case where the hydrophilic solvent group in the polyurethane dispersant (b-1) contains a polyether chain and/or a polyester chain, and particularly has the above formula (3-1) to (3-3). The details of the partial construction shown are detailed.

藉由化合物(b-c)與二異氰酸酯化合物(b-a)的胺基甲酸乙酯鍵、或脲鍵,可將上式(3-1)、(3-2)或(3-3)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)。 The moiety represented by the above formula (3-1), (3-2) or (3-3) can be obtained by the urethane bond or the urea bond of the compound (bc) with the diisocyanate compound (ba). The structure was introduced into a polyurethane dispersant (b-1).

可使式(3-1)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)的化合物(b-c)中之與異氰酸酯基進行反應之2個官能基均為羥基,且此2個羥基與二異氰酸酯化合物(b-a)之2個異氰酸酯基係進行胺基甲酸乙酯鍵結。具體例將於後述。 a part of the structure represented by the formula (3-1) can be introduced into the compound (bc) of the polyurethane dispersant (b-1), and both of the functional groups reactive with the isocyanate group are hydroxyl groups, and The two hydroxyl groups are bonded to the two isocyanate groups of the diisocyanate compound (ba). Specific examples will be described later.

可使式(3-2)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)的化合物(b-c),與異氰酸酯基進行反應之2個官能基為亞胺基及羥基,亞胺基與異氰酸酯基進行脲鍵結,且羥基與異氰酸酯基進行胺基甲酸乙酯鍵結。具體例將於後述。 A part of the structure represented by the formula (3-2) can be introduced into the compound (bc) of the polyurethane dispersant (b-1), and the two functional groups reactive with the isocyanate group are an imido group and a hydroxyl group. The imido group is urea-bonded to the isocyanate group, and the hydroxyl group is bonded to the isocyanate group by urethane. Specific examples will be described later.

可使式(3-3)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)的化合物(b-c)之與異氰酸酯基進行反應之2個官能基均為羥基,且此2個羥基與二異氰酸酯化合物(b-a)之2個異氰酸酯基係進行胺基甲酸乙酯鍵結。具體例將於後述。 The two functional groups which react with the isocyanate group of the compound (bc) which introduces a part of the structure represented by the formula (3-3) into the polyurethane dispersant (b-1) are all hydroxyl groups, and this The two hydroxyl groups are bonded to the two isocyanate groups of the diisocyanate compound (ba). Specific examples will be described later.

接著,針對在聚胺基甲酸酯分散劑(b-1)中用於導入親溶媒基的化合物(b-c)進行說明。 Next, the compound (b-c) for introducing a hydrophilic solvent group in the polyurethane dispersant (b-1) will be described.

此化合物(b-c)若於兩末端含有與異氰酸酯基進行反應之官能基,則在聚胺基甲酸酯分散劑(b-1)之合成時,該官能基與其他殘留之異氰酸酯基鍵結,而有妨礙直鏈聚胺基甲酸酯骨架於側方鍵結之橫方向側鏈之形成的可能性。因此,化合物(b-c)較佳係於單末端之外不含有與異氰酸酯基進行反應之官能基。 When the compound (bc) contains a functional group reactive with an isocyanate group at both terminals, the functional group is bonded to other residual isocyanate groups in the synthesis of the polyurethane dispersant (b-1). There is a possibility of hindering the formation of the lateral side chain of the linear polyurethane skeleton in the side bond. Therefore, the compound (b-c) is preferably one which does not contain a functional group which reacts with an isocyanate group except a single terminal.

因此,在於與異氰酸酯基進行反應之2個官能基相反的末端,具有羥基等之與異氰酸酯基進行反應之官能基時,較佳係使該羥基等以不與異氰酸酯基進行反應的方式取代。更佳係使該羥基之氫原子以烷基取代,而成為烷氧基。 Therefore, when the terminal having the opposite of the two functional groups which react with the isocyanate group has a functional group which reacts with an isocyanate group, such as a hydroxyl group, it is preferable to substitute the hydroxyl group etc. so that it may not react with an isocyanate group. More preferably, the hydrogen atom of the hydroxyl group is substituted with an alkyl group to form an alkoxy group.

特佳係對上述羥基之氫原子進行取代之烷基為碳數1~50之烷基。烷基可為任意之分枝鏈的烷基或環烷基,亦可替代烷基而導入芳基或芳烷基。 The alkyl group which is particularly preferably substituted with the hydrogen atom of the above hydroxyl group is an alkyl group having 1 to 50 carbon atoms. The alkyl group may be an alkyl group or a cycloalkyl group of any of the branched chains, and may be substituted for an aryl group or an aralkyl group instead of the alkyl group.

作為環烷基,較佳為環丙基、環己基等之碳數3~6的環烷基。作為芳基,較佳為亦可藉鹵原子、碳數1~20之烷基或碳數1~20之烷氧基所取代的萘基、苯基等之碳數6~10的芳基。 The cycloalkyl group is preferably a cycloalkyl group having 3 to 6 carbon atoms such as a cyclopropyl group or a cyclohexyl group. The aryl group is preferably an aryl group having 6 to 10 carbon atoms such as a naphthyl group substituted by a halogen atom, an alkyl group having 1 to 20 carbon atoms or an alkoxy group having 1 to 20 carbon atoms, or a phenyl group.

作為芳烷基,較佳係氫原子亦可藉由鹵素、碳數1~20之烷基或碳數1~20之烷氧基所取代的2-苯乙基、或苄基。 The aralkyl group is preferably a 2-phenylethyl group or a benzyl group which may be substituted by a halogen, an alkyl group having 1 to 20 carbon atoms or an alkoxy group having 1 to 20 carbon atoms.

含有聚醚鏈及/或聚酯鏈之化合物的末端烷基的鏈長,可視感光性樹脂組成物所含之溶劑(e)的性質而適當選擇。例如,在(e)溶劑為極性有機溶劑時,上述末端烷基較佳係可為直鏈或分枝鏈的碳數1~12烷基。作為烷基之具體例,可列舉甲基、乙基、丙基及異丙基。 The chain length of the terminal alkyl group of the compound containing a polyether chain and/or a polyester chain can be suitably selected depending on the nature of the solvent (e) contained in the photosensitive resin composition. For example, when the solvent (e) is a polar organic solvent, the terminal alkyl group may preferably be a linear or branched chain having 1 to 12 carbon atoms. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and an isopropyl group.

在聚胺基甲酸酯分散劑(b-1)含有聚醚側鏈的情況,由容易自市場取得的觀點而言,較佳係末端烷基為碳數1~4之烷基, 更佳為甲基。另一方面,在(e)溶劑為非極性有機溶劑的情況,上述末端烷基之碳數較佳為8以上。 In the case where the polyurethane dispersant (b-1) contains a polyether side chain, it is preferred that the terminal alkyl group is an alkyl group having 1 to 4 carbon atoms from the viewpoint of easy availability from the market. More preferably, it is a methyl group. On the other hand, when the solvent (e) is a nonpolar organic solvent, the terminal alkyl group preferably has 8 or more carbon atoms.

親溶媒基所含之聚醚鏈之聚環氧烷鏈的部分(其中,不含末端烷基),較佳係碳數2~4聚環氧烷。碳數2~4之聚環氧烷所含之聚環氧烷的含量,由基板密黏性的觀點而言,較佳為60質量%以下、更佳為40質量%以下、特佳為20質量%以下,再更佳為不含有聚環氧烷。 The portion of the polyalkylene oxide chain of the polyether chain contained in the lyophilic medium (excluding the terminal alkyl group) is preferably a carbon number of 2 to 4 polyalkylene oxide. The content of the polyalkylene oxide contained in the polyalkylene oxide having 2 to 4 carbon atoms is preferably 60% by mass or less, more preferably 40% by mass or less, and particularly preferably 20% from the viewpoint of substrate adhesion. More preferably, the mass% or less is more preferably no polyalkylene oxide.

碳數2~4之聚環氧烷鏈部分,亦可藉由環氧乙烷、環氧丙烷或環氧丁烷等之環氧烷的(共)聚合、或由四氫呋喃而獲得。在共聚合的情況,可為無規共聚物或嵌段共聚物。又,聚環氧烷部分可為直鏈或分枝鏈。 The polyalkylene oxide chain portion having 2 to 4 carbon atoms may also be obtained by (co)polymerization of an alkylene oxide such as ethylene oxide, propylene oxide or butylene oxide or by tetrahydrofuran. In the case of copolymerization, it may be a random copolymer or a block copolymer. Further, the polyalkylene oxide moiety may be a straight chain or a branched chain.

聚環氧烷部分由提升分散經時穩定性的觀點而言,較佳為聚環氧丙烷。聚胺基甲酸酯分散劑(b-1)之親溶媒基所含之聚醚鏈,由提升分散性的觀點而言,較佳為具有碳數1~10之烷基作為末端烷基,且具有碳數2~4之聚環氧烷者;此時,末端烷基更佳為甲基、或丁基。 The polyalkylene oxide portion is preferably a polypropylene oxide from the viewpoint of improving the dispersion stability over time. The polyether chain contained in the lyophilic medium of the polyurethane dispersant (b-1) preferably has an alkyl group having 1 to 10 carbon atoms as a terminal alkyl group from the viewpoint of enhancing dispersibility. And having a polyalkylene oxide having a carbon number of 2 to 4; in this case, the terminal alkyl group is more preferably a methyl group or a butyl group.

屬於親溶媒基之聚酯鏈,較佳可由含有1~26個碳原子之羥基羧酸或其內酯而獲得。羥基羧酸之種類可視感光性樹脂組成物所含之溶劑(e)的性質而適當選擇。 The polyester chain belonging to the lyophilic group is preferably obtained from a hydroxycarboxylic acid having 1 to 26 carbon atoms or a lactone thereof. The kind of the hydroxycarboxylic acid can be appropriately selected depending on the nature of the solvent (e) contained in the photosensitive resin composition.

在(e)溶劑為極性有機溶劑時,羥基羧酸較佳係最多含有8個碳原子;在有機介質為非極性有機液體時,羥基羧酸較佳係含有超過8個碳原子。 When the solvent (e) is a polar organic solvent, the hydroxycarboxylic acid preferably contains at most 8 carbon atoms; and when the organic medium is a non-polar organic liquid, the hydroxycarboxylic acid preferably contains more than 8 carbon atoms.

聚酯鏈係為了有助於有機介質之溶解性,較佳係由2種以上相異之羥基羧酸或其內酯所獲得。羥基羧酸可為飽和或不飽 和,且可為直鏈或分枝鏈。 The polyester chain is preferably obtained from two or more different hydroxycarboxylic acids or lactones thereof in order to contribute to the solubility of the organic medium. Hydroxycarboxylic acid can be saturated or unsaturated And, and may be a straight chain or a branched chain.

適當之羥基羧酸的例子有乙醇酸、乳酸、5-羥基纈草酸、6-羥基己酸、蓖麻油酸、12-羥基硬脂酸、12-羥基十二烷酸、5-羥基十二烷酸、5-羥基癸酸及4-羥基癸酸。 Examples of suitable hydroxycarboxylic acids are glycolic acid, lactic acid, 5-hydroxyshikiic acid, 6-hydroxycaproic acid, ricinoleic acid, 12-hydroxystearic acid, 12-hydroxydodecanoic acid, 5-hydroxydodecane. Acid, 5-hydroxydecanoic acid and 4-hydroxydecanoic acid.

適當之內酯的例子有β-丙內酯及任意由碳數1~6之烷基所取代之δ-戊內酯及ε-己內酯。例如,β-甲基-δ-戊內酯、δ-戊內酯、ε-己內酯、2-甲基、3-甲基、4-甲基-、5-第三丁基、7-甲基-4,4,6-三甲基及4,6,6-三甲基-ε己內酯與此等之混合物。 Examples of suitable lactones are β-propiolactone and δ-valerolactone and ε-caprolactone optionally substituted by an alkyl group having 1 to 6 carbon atoms. For example, β-methyl-δ-valerolactone, δ-valerolactone, ε-caprolactone, 2-methyl, 3-methyl, 4-methyl-, 5-t-butyl, 7- Methyl-4,4,6-trimethyl and 4,6,6-trimethyl-ε-caprolactone and mixtures thereof.

由δ-戊內酯及ε-己內酯所衍生之聚酯鏈為特佳。 The polyester chain derived from δ-valerolactone and ε-caprolactone is particularly preferred.

屬於親溶媒基之聚醚鏈及/或聚酯鏈的橫方向側鏈,可由單一之單體所構成,或可由複數之單體成分所構成。又,聚醚鏈亦可含有聚酯部分,相反地,聚酯鏈亦可含有聚醚部分。 The lateral side chain of the polyether chain and/or the polyester chain belonging to the hydrophilic solvent group may be composed of a single monomer or may be composed of a plurality of monomer components. Further, the polyether chain may also contain a polyester moiety, and conversely, the polyester chain may also contain a polyether moiety.

聚胺基甲酸酯分散劑(b-1)中之親溶媒基之聚醚鏈及/或聚酯鏈的數量平均分子量,較佳為10,000以下、更佳為4,000以下、再更佳為2,500以下。聚醚鏈及/或聚酯鏈之數量平均分子量較佳為300以上、更佳為600以上、再更佳為800以上。藉由設為上述上限值以下,有可提升基板密黏性的傾向,又,藉由設為上述下限值以上,有可提升分散性的傾向。 The number average molecular weight of the polyether chain and/or the polyester chain of the hydrophilic solvent group in the polyurethane dispersant (b-1) is preferably 10,000 or less, more preferably 4,000 or less, still more preferably 2,500. the following. The number average molecular weight of the polyether chain and/or the polyester chain is preferably 300 or more, more preferably 600 or more, still more preferably 800 or more. When the value is equal to or less than the above-described upper limit, the adhesion of the substrate tends to be improved. Further, the above-mentioned lower limit value or more tends to improve the dispersibility.

接著,針對在化合物(b-c)之聚醚鏈及/或聚酯鏈之單末端導入與異氰酸酯基進行反應之2個官能基的方法進行說明。 Next, a method of introducing two functional groups reactive with an isocyanate group at a single terminal of the polyether chain and/or the polyester chain of the compound (b-c) will be described.

在聚醚鏈及/或聚酯鏈之單末端導入與化合物(b-a)之異氰酸酯基進行反應之2個官能基時,有數種方法。藉此,上述聚醚鏈及/或聚酯鏈係藉由單末端之2個官能基與二異氰酸酯化合物(b-a)鍵結而形成屬於聚胺基甲酸酯骨架的主鏈,並可形成聚醚鏈及 /或聚酯鏈之親溶媒基的側鏈。 When two functional groups which react with the isocyanate group of the compound (b-a) are introduced into a single terminal of the polyether chain and/or the polyester chain, there are several methods. Thereby, the polyether chain and/or the polyester chain are bonded to the diisocyanate compound (ba) by two functional groups at one terminal to form a main chain belonging to the polyurethane skeleton, and can form a poly Ether chain and / or the side chain of the lyophilic group of the polyester chain.

在橫方向親溶媒基之側鏈為含有聚醚鏈的情況,含有親溶媒基之聚醚鏈的化合物(b-c),較佳係於單末端具有與異氰酸酯基進行反應之2個羥基,或具有1個羥基及1個亞胺基。羥基及亞胺基較佳係最多相隔著6個碳原子。在化合物(b-c)含有與異氰酸酯基進行反應之2個羥基的情況,此等較佳係最多相隔著17個原子。 In the case where the side chain of the hydrophilic solvent group in the transverse direction is a polyether chain, the compound (bc) containing the polyether chain of the solvent group preferably has two hydroxyl groups which react with the isocyanate group at one terminal, or has 1 hydroxyl group and 1 imine group. Preferably, the hydroxyl group and the imine group are at most 6 carbon atoms apart. In the case where the compound (b-c) contains two hydroxyl groups which react with an isocyanate group, these are preferably at most 17 atoms apart.

作為與含有聚醚鏈之化合物(b-c)的異氰酸酯基進行反應的單末端之2個官能基,而導入2個均為羥基的方法,係使用與上述化合物(b-b)中導入2個羥基的方法相同的方法。 A method of introducing two hydroxyl groups into a single terminal at a single terminal reaction of an isocyanate group containing a polyether chain-containing compound (bc), and introducing a method of introducing two hydroxyl groups into the compound (bb) The same method.

用於將式(3-1)所示之部分構造導入至聚胺基甲酸酯分散劑(b-1)中的化合物(b-b)的具體例,可列舉如以下者。此外,若含有式(3-1)所示之部分構造、且其末端具有2個羥基,則可應用於聚胺基甲酸酯分散劑(b-1)之合成。 Specific examples of the compound (b-b) for introducing a part of the structure represented by the formula (3-1) into the polyurethane dispersant (b-1) include the following. Further, when the partial structure represented by the formula (3-1) is contained and the terminal has two hydroxyl groups, it can be applied to the synthesis of the polyurethane dispersant (b-1).

首先,使單末端經烷基醚化之碳數2~4之聚環氧烷鏈等的另一末端的羥基,與甲苯二異氰酸酯等之含有2個異氰酸酯基之化合物的一個異氰酸酯基進行反應。接著,使另一異氰酸酯基,與二乙醇胺等之含有1個2級胺基及至少2個活性羥基的化合物的2級胺基進行反應。藉此,可於聚環氧烷鏈之單末端中導入2個羥基。 First, a hydroxyl group at the other end of a polyalkylene oxide chain having a carbon number of 2 to 4 which is alkyl etherified at a single terminal is reacted with an isocyanate group of a compound containing two isocyanate groups such as toluene diisocyanate. Next, another isocyanate group is reacted with a secondary amine group of a compound containing one secondary amino group and at least two active hydroxyl groups such as diethanolamine. Thereby, two hydroxyl groups can be introduced into the single terminal of the polyalkylene oxide chain.

例如,藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此相當於式(3-1)所示之化學構造。 For example, the structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below. This corresponds to the chemical structure shown in the formula (3-1).

[化58] [化58]

上式中,*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

又,具有上式(3-1)所示之部分構造的化合物,亦可依以下方法獲得。作為於含有聚醚鏈之化合物(b-c)之單末端中導入2個羥基的方法,亦有於聚(環氧烷)丙烯酸酯中使二乙醇胺進行邁可加成的方法。其具體例係如下所述。 Further, a compound having a partial structure represented by the above formula (3-1) can also be obtained by the following method. As a method of introducing two hydroxyl groups into a single terminal of the polyether chain-containing compound (b-c), there is also a method of subjecting diethanolamine to a Michael addition in a poly(alkylene oxide) acrylate. Specific examples thereof are as follows.

藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此相當於上式(3-1)所示之部分構造。 The structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified in the lower left. This corresponds to a partial configuration shown in the above formula (3-1).

上式中,*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

又,在具有式(3-2)所示之部分構造的情況,亦可依以下方法獲得。 Further, in the case of having a partial structure represented by the formula (3-2), it can also be obtained by the following method.

在含有聚醚鏈之化合物(b-c)之與異氰酸酯基進行反應之單末端的2個官能基為1個羥基及1個亞胺基的情況,亦應用於上述化合物(b-b)中與導入1個羥基及1個亞胺基的方法相同的方法。具體而言,係藉由使丙烯酸羥乙酯等具有1個羥基與乙烯性不飽和基的化合物、與在聚環氧烷鏈之末端具有1個1級胺基的化合 物進行邁可加成而獲得。藉此,可得到藉由乙烯性不飽和基與胺基之邁可加成所獲得的亞胺基、與羥基丙烯酸酯中之1個羥基。 When the two functional groups at the single terminal of the reaction of the polyether chain-containing compound (bc) with the isocyanate group are one hydroxyl group and one imine group, the same applies to the above compound (bb) and one introduction. The same method as the method of the hydroxyl group and the one imine group. Specifically, a compound having one hydroxyl group and an ethylenically unsaturated group such as hydroxyethyl acrylate and a compound having one primary amino group at the terminal of the polyalkylene oxide chain is used. The material is obtained by the addition of Michael. Thereby, an imine group obtained by the Michael addition of an ethylenically unsaturated group and an amine group, and one hydroxyl group in a hydroxy acrylate can be obtained.

又,同樣地,藉由單乙醇胺等具有1個羥基與1級胺基的化合物、與對環氧烷鏈經酯鍵結之丙烯酸酯等之具有環氧烷鏈與乙烯性不飽和基的化合物的邁可加成,亦可得到環氧烷之親溶媒部及與異氰酸酯基進行反應之羥基與亞胺基。此種化合物有如以下者。 In the same manner, a compound having an alkylene chain and an ethylenically unsaturated group such as a compound having one hydroxyl group and a primary amino group such as monoethanolamine or an acrylate having an ester bond to an alkylene oxide chain; The addition of the Michael can also provide a solvent-soluble portion of the alkylene oxide and a hydroxyl group and an imine group which react with the isocyanate group. Such compounds are as follows.

例如,藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此相當於式(3-2)所示之部分構造。此外,若含有式(3-2)所示之部分構造、且具有1個羥基及1個亞胺基,則亦可應用於聚胺基甲酸酯分散劑(b-1)的合成。 For example, the structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below. This corresponds to a partial configuration shown by the formula (3-2). Further, when a partial structure represented by the formula (3-2) and one hydroxyl group and one imine group are contained, it can also be applied to the synthesis of the polyurethane dispersant (b-1).

與氧原子鄰接之*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基;與氮原子鄰接之*表示與主鏈之聚胺基甲酸酯骨架中之脲鍵之羰基間的鍵結基。 The * adjacent to the oxygen atom indicates a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain; the * adjacent to the nitrogen atom indicates the polyaminocarboxylic acid with the main chain A bond between the carbonyl groups of the urea bond in the ester backbone.

又,在相當於上式(3-3)所示之部分構造的構造的情況,亦同樣具有有效之效果,可應用於聚胺基甲酸酯分散劑(b-1-1)的合成。 Moreover, in the case of the structure corresponding to the partial structure shown by the above formula (3-3), it also has an effective effect, and can be applied to the synthesis of the polyurethane dispersant (b-1-1).

導入上式(3-3)所示之部分構造的化合物,係單末端具有2個羥基的化合物。上式(3-3)所示之部分構造係例如使用末端具有1個羥基的聚醚、與二異氰酸酯化合物及硫甘油而獲得。其具體 之反應例係如以下所述。 A compound having a partial structure represented by the above formula (3-3) is introduced, and is a compound having two hydroxyl groups at one terminal. The partial structure represented by the above formula (3-3) is obtained, for example, by using a polyether having one hydroxyl group at the terminal, a diisocyanate compound, and thioglycerol. Specific The reaction examples are as follows.

首先,使末端具有1個羥基之聚醚的羥基,與甲苯二異氰酸酯等之含有2個異氰酸酯的化合物的一個異氰酸酯基進行反應。接著,使另一個異氰酸酯基,與硫甘油等之含有1個活性硫醇基及至少2個活性羥基的化合物的活性硫醇基進行反應。藉此,可得到於聚醚之單末端中導入了2個羥基的化合物。 First, a hydroxyl group of a polyether having one hydroxyl group at the terminal is reacted with one isocyanate group of a compound containing two isocyanates such as toluene diisocyanate. Next, another isocyanate group is reacted with an active thiol group of a compound containing one active thiol group and at least two active hydroxyl groups such as thioglycerol. Thereby, a compound in which two hydroxyl groups are introduced into a single terminal of the polyether can be obtained.

例如,藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此相當於上式(3-3)所示之部分構造。 For example, the structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below. This corresponds to the partial configuration shown in the above formula (3-3).

上式中,*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

將上式(3-3)所示之構造導入至聚胺基甲酸酯分散劑(b-1)的化合物,係於單末端具有2個羥基的化合物,但將上式(3-3)所示之部分構造的2個氧原子藉由2個1級及/或2級胺基所取代的化合物,亦可應用作為用於聚胺基甲酸酯分散劑(b-1)之合成的化合物(b-c)。 A compound having a structure represented by the above formula (3-3) introduced into the polyurethane dispersant (b-1) is a compound having two hydroxyl groups at one terminal, but the above formula (3-3) A compound in which two oxygen atoms of the structure are substituted by two primary and/or secondary amine groups may also be used as a synthesis for the polyurethane dispersant (b-1). Compound (bc).

使用於親溶媒基為含有聚酯鏈之聚胺基甲酸酯分散劑(b-1)之合成的化合物(b-c),較佳係於含有聚酯鏈之化合物的一端,含有與異氰酸酯基進行反應之2個羥基。其羥基較佳係最多相隔著17個原子。2個羥基特佳係相隔著5個原子以上。 The compound (bc) used for the synthesis of the polyester chain-containing polyurethane dispersant (b-1) is preferably one end of a compound containing a polyester chain, and is contained with an isocyanate group. Two hydroxyl groups of the reaction. Preferably, the hydroxyl group is at most 17 atoms apart. The two hydroxyl groups are separated by more than 5 atoms.

在聚酯鏈之末端為羥基的情況、以及為羧基的情況的任一情況下,可將與異氰酸酯基進行反應之2個羥基導入至單末端。 In the case where the terminal of the polyester chain is a hydroxyl group or in the case of a carboxyl group, two hydroxyl groups which react with the isocyanate group can be introduced to the single terminal.

在聚酯鏈之末端為羥基的情況,可於後述屬於鏈停止化合物的含羥基化合物的存在下,使1種或複數之羥基羧酸或其內酯進行聚合而製造。 When the terminal of the polyester chain is a hydroxyl group, one or a plurality of hydroxycarboxylic acids or a lactone thereof may be polymerized in the presence of a hydroxyl group-containing compound which is a chain-stopping compound described later.

使用後述鏈停止化合物之含羥基化合物而獲得的聚酯,較佳係下式(4)所示者。 The polyester obtained by using the hydroxyl group-containing compound of the chain-stopping compound described later is preferably represented by the following formula (4).

R9O(OC-A-O)wH (4) R 9 O(OC-AO) w H (4)

式(4)中,w為5~150,R9為碳數1~50之烷基,A為碳數1~26之伸烷基、或碳數2~26之伸烯基。 In the formula (4), w is 5 to 150, R 9 is an alkyl group having 1 to 50 carbon atoms, and A is an alkylene group having 1 to 26 carbon atoms or an alkenyl group having 2 to 26 carbon atoms.

在對式(4)之化合物於單末端導入與異氰酸酯基進行反應之2個羥基時,可使用與上述之於聚醚之單末端中導入2個羥基之方法相同的方法。 When the compound of the formula (4) is introduced into a single terminal and two hydroxyl groups which react with an isocyanate group are introduced, the same method as the method of introducing two hydroxyl groups into the single terminal of the polyether described above can be used.

又,在對式(4)之化合物於單末端導入與異氰酸酯基進行反應之1個羥基與1個亞胺基時,亦可使用上述之對聚醚之單末端導入1個羥基與1個亞胺基之方法相同的方法。 Further, when a compound of the formula (4) is introduced into a single terminal and a hydroxyl group and an imino group are reacted with an isocyanate group, one of the hydroxyl groups and one sub-portion of the polyether may be introduced into the single terminal. The same method as the amine method.

例如,藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此相當於上式(3-1)所示之部分構造或式(3-2)所示之部分構造。此外,若含有上式(3-1)所示之部分構造或式(3-2)所示之部分構造,並於其末端具有與異氰酸酯基進行反應之羥基或亞胺基等之官能基僅2個,可應用於聚胺基甲酸酯分散劑(b-1)。 For example, the structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below. This corresponds to a partial structure shown in the above formula (3-1) or a partial structure shown in the formula (3-2). Further, when a partial structure represented by the above formula (3-1) or a partial structure represented by the formula (3-2) is contained, and a functional group such as a hydroxyl group or an imine group which reacts with an isocyanate group at the terminal is contained only Two can be applied to the polyurethane dispersant (b-1).

[化62] [化62]

與氧原子鄰接之*係表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基;與氮原子鄰接之*係表示與主鏈之聚胺基甲酸酯骨架中之脲鍵之羰基間的鍵結基。 The * adjacent to the oxygen atom means a bonding group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain; the * adjacent to the nitrogen atom means a polyamine group with the main chain A bond between the carbonyl groups of the urea bond in the formate skeleton.

又,在相當於上式(3-3)所示之部分構造的構造時,亦具有有效之效果,可應用於聚胺基甲酸酯分散劑(b-1)。 Further, in the structure corresponding to the partial structure shown by the above formula (3-3), it has an effective effect and can be applied to the polyurethane dispersant (b-1).

相當於含有聚酯鏈之上式(3-3)所示之部分構造的構造,亦可應用與相當於含有聚醚鏈之上式(3-3)所示之部分構造之構造所述者相同的構造。 The structure corresponding to the partial structure represented by the formula (3-3) on the polyester chain may be applied to the structure corresponding to the partial structure represented by the formula (3-3) containing the polyether chain. The same construction.

例如,藉由左下例示之化合物,可於聚胺基甲酸酯分 散劑(b-1)中導入右下例示之構造。此相當於上式(3-3)所示之部分構造。 For example, by the compound exemplified in the lower left, the polyurethane can be divided into The powder (b-1) is introduced into the structure exemplified in the lower right. This corresponds to the partial configuration shown in the above formula (3-3).

上式中,*表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

在聚酯鏈之末端為羧基的情況,可於後述屬於鏈停止化合物的含羧基化合物的存在下,使1種或複數之羥基羧酸或其內酯進行聚合而製造。 When the terminal of the polyester chain is a carboxyl group, one or a plurality of hydroxycarboxylic acids or a lactone thereof may be polymerized in the presence of a carboxyl group-containing compound which is a chain-stopping compound described later.

使用後述鏈停止化合物之含羧基化合物而獲得的聚酯,較佳係下式(5)所示者。 The polyester obtained by using the carboxyl group-containing compound of the chain-stopping compound described later is preferably represented by the following formula (5).

R9CO(O-A-CO)wOH (5) R 9 CO(OA-CO) w OH (5)

式(5)中,R9、A及w係與上式(4)之定義相同。 In the formula (5), R 9 , A and w are the same as defined in the above formula (4).

式(4)及/或(5)之聚酯,一般係使1種或複數之羥基羧酸,於惰性環境下,在酯化觸媒之存在下,依50~250℃,藉由與含羥基化合物或含羧基化合物一起反應而製造。典型之步驟條件記載於國際公開第2001/80987號公報。 The polyester of the formula (4) and/or (5) is generally one or more hydroxycarboxylic acids, in an inert environment, in the presence of an esterification catalyst, at 50 to 250 ° C, by inclusion The hydroxy compound or the carboxyl group-containing compound is produced by reacting together. Typical step conditions are described in International Publication No. 2001/80987.

在由上式(5)之化合物於單末端導入與異氰酸酯基進行反應之2個羥基時,將式(5)化合物、與乙二醇或丙二醇等二醇進行反應而轉換為單羥基化合物,對所得之單羥基衍生物,依與式(4)化合物相同的方法進行。 When two hydroxyl groups which react with an isocyanate group are introduced at the single terminal from the compound of the above formula (5), the compound of the formula (5) is reacted with a diol such as ethylene glycol or propylene glycol to be converted into a monohydroxy compound. The obtained monohydroxy derivative is carried out in the same manner as the compound of the formula (4).

例如,藉由左下例示之化合物,可於聚胺基甲酸酯分散劑(b-1)中導入右下例示之構造。此相當於上式(3-1)所示之部分構造或式(3-2)所示之部分構造。 For example, the structure exemplified in the lower right can be introduced into the polyurethane dispersant (b-1) by the compound exemplified below. This corresponds to a partial structure shown in the above formula (3-1) or a partial structure shown in the formula (3-2).

此外,若含有上式(3-1)所示之部分構造或式(3-2)所示之部分構造,並於其末端具有與異氰酸酯基進行反應之羥基或亞胺基等之官能基僅2個,可應用於聚胺基甲酸酯分散劑(b-1)之合成。 Further, when a partial structure represented by the above formula (3-1) or a partial structure represented by the formula (3-2) is contained, and a functional group such as a hydroxyl group or an imine group which reacts with an isocyanate group at the terminal is contained only Two can be applied to the synthesis of the polyurethane dispersant (b-1).

[化64] [化64]

上式中,與氧原子鄰接之*係表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基;與氮原子鄰接之*係表示與主鏈之聚胺基甲酸酯骨架中之脲鍵之羰基間的鍵結基。 In the above formula, the * adjacent to the oxygen atom represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain; the * adjacent to the nitrogen atom represents the main chain The bond between the carbonyl groups of the urea bond in the polyurethane skeleton.

又,在相當於上式(3-3)所示之部分構造的構造時,亦具有有效之效果,可應用於聚胺基甲酸酯分散劑(b-1)之合成。 Further, in the structure corresponding to the partial structure shown by the above formula (3-3), it has an effective effect and can be applied to the synthesis of the polyurethane dispersant (b-1).

相當於含有聚酯鏈之上式(3-3)所示之部分構造的構造,亦可應用與相當於含有聚醚鏈之上式(3-3)所示之部分構造之構造所述者相同的構造。 The structure corresponding to the partial structure represented by the formula (3-3) on the polyester chain may be applied to the structure corresponding to the partial structure represented by the formula (3-3) containing the polyether chain. The same construction.

又,於聚醚鏈及/或聚酯鏈之末端導入與異氰酸酯基進行反應之官能基的方法,亦可使用其他公知方法。例如,亦有對於單末端具有1個羥基之聚醚鏈或聚酯鏈,使具有異氰酸酯基與丙烯醯氧基之化合物反應,藉由進行胺基甲酸乙酯鍵結而可於具有聚醚鏈或聚酯鏈之化合物的單末端中導入不飽和基,將其與二乙醇胺進行邁可加成的方法等。藉由此方法,亦可於聚醚鏈或聚酯鏈之單末端導入2個羥基。 Further, a method of introducing a functional group reactive with an isocyanate group at the end of the polyether chain and/or the polyester chain may be carried out by other known methods. For example, there is also a polyether chain or a polyester chain having one hydroxyl group at one end, and reacting a compound having an isocyanate group and a acryloxy group, and having a polyether chain by performing urethane bonding Or a method in which an unsaturated group is introduced into a single terminal of a compound of a polyester chain, and it is subjected to a Michael addition to diethanolamine. By this method, two hydroxyl groups can also be introduced at the single end of the polyether chain or the polyester chain.

具有聚胺基甲酸酯骨架之主鏈、使聚醚鏈及/或聚酯鏈鍵結於側方之屬於親溶媒基的側鏈、與特定吸附基的聚胺基甲酸 酯化合物(b-1-1),係在不對其特性造成影響之範圍內,亦可使於單末端具有與異氰酸酯基進行反應之2個官能基的聚丙烯酸酯及/或聚烯烴進行反應而獲得。 a main chain having a polyurethane skeleton, a side chain belonging to a lyophilic group bonded to a polyether chain and/or a polyester chain, and a polyaminocarboxylic acid having a specific adsorption group The ester compound (b-1-1) may be reacted with a polyfunctional acid ester and/or a polyolefin having two functional groups reactive with an isocyanate group at a single end within a range not affecting its characteristics. obtain.

在聚丙烯酸及/或聚烯烴之單末端導入2個與異氰酸酯基進行反應之官能基時,係應用於上述聚醚鏈或聚酯鏈之末端導入2個羥基的方法或與導入1個羥基及1個亞胺基之情況相同的方法。 When two functional groups reactive with an isocyanate group are introduced at one end of the polyacrylic acid and/or the polyolefin, the method of introducing two hydroxyl groups into the terminal of the polyether chain or the polyester chain or introducing a hydroxyl group and The same method as in the case of one imine group.

另外,在合成聚丙烯酸酯及/或聚烯烴之聚合體時,可藉由使用具有2個羥基之聚合起始劑或硫甘油等之二羥基官能性鏈移動劑而獲得。 Further, in the case of synthesizing a polymer of a polyacrylate and/or a polyolefin, it can be obtained by using a polymerization initiator having two hydroxyl groups or a dihydroxy functional chain shifting agent such as thioglycerol.

藉由成為上述於單末端具有與異氰酸酯基進行反應之2個官能基的聚丙烯酸酯及/或聚烯烴的化合物、與二異氰酸酯化合物(b-a)之異氰酸酯基間的反應,可形成鍵結於聚胺基甲酸酯骨架之側方的橫方向之聚丙烯酸酯及/或聚烯烴鏈。 By forming a reaction between a compound of a polyacrylate and/or a polyolefin having two functional groups reactive with an isocyanate group at one end and an isocyanate group of a diisocyanate compound (ba), bonding can be formed in the poly A polyacrylate and/or a polyolefin chain in the lateral direction of the side of the urethane skeleton.

[聚胺基甲酸酯分散劑(b-1)亦可含有之任意之其他構造] [Polyurethane dispersant (b-1) may also contain any other structure]

聚胺基甲酸酯分散劑(b-1),另一方面,亦可含有藉由以下化合物(b-d)、(b-e)、(b-f)之胺基甲酸乙酯反應、脲反應所導入之構造。 The polyurethane dispersant (b-1), on the other hand, may also contain a structure in which a urea reaction is carried out by reacting the following compounds (bd), (be), (bf), and a urea reaction. .

‧化合物(b-d):具有與異氰酸酯基進行反應之2個官能基的化合物1種或2種以上。 ‧ Compound (b-d): One or two or more compounds having two functional groups reactive with an isocyanate group.

‧化合物(b-e):含有與異氰酸酯基進行反應之1個官能基,並作為鏈停止劑而作用的化合物1種或2種以上。 ‧ Compound (b-e): One or two or more compounds having one functional group reactive with an isocyanate group and acting as a chain stopper.

‧化合物(b-f):含有1個異氰酸酯基,並作為鏈停止劑而作用的化合物1種或2種以上。 ‧ Compound (b-f): One or two or more compounds which contain one isocyanate group and act as a chain stopper.

來自此等化合物(b-d)、(b-e)、(b-f)的構造,係藉由使此等化合物(b-d)、(b-e)、(b-f)與化合物(b-a)、(b-b)、(b-c)一起反應,而可被導入至聚胺基甲酸酯分散劑(b-1)的聚胺基甲酸酯骨架。 The structures derived from these compounds (bd), (be), and (bf) are obtained by bringing these compounds (bd), (be), (bf) together with the compounds (ba), (bb), and (bc). The reaction can be introduced into the polyurethane skeleton of the polyurethane dispersant (b-1).

更具體而言,來自化合物(b-d)之構造可被導入至聚胺基甲酸酯骨架中,來自化合物(b-e)、(b-f)之構造可被導入至聚胺基甲酸酯骨架的兩末端。 More specifically, the structure derived from the compound (bd) can be introduced into the polyurethane skeleton, and the structures from the compounds (be) and (bf) can be introduced to both ends of the polyurethane skeleton. .

上述化合物(b-d)較佳係含有與異氰酸酯基進行反應之官能基僅2個。 The above compound (b-d) preferably contains only two functional groups which react with an isocyanate group.

化合物(b-d)之較佳官能基為胺基或羥基,更佳為二胺或二醇,再更佳為二醇。化合物(b-d)主要係使用作為用於改變聚胺基甲酸酯聚合物之溶解性的鏈延長劑。化合物(b-d)之數量平均分子量並無特別限定,較佳為32~3,000。 The preferred functional group of the compound (b-d) is an amine group or a hydroxyl group, more preferably a diamine or a diol, still more preferably a diol. The compound (b-d) is mainly used as a chain extender for changing the solubility of the polyurethane polymer. The number average molecular weight of the compound (b-d) is not particularly limited, but is preferably from 32 to 3,000.

較佳之二胺的例子,有乙二胺、1,4-丁二胺及1,6-己二胺。較佳之二醇的例子有1,6-己二醇、1,4-環己烷二甲醇(CHDM)、1,2-十二烷二醇、2-苯基-1,2-丙二醇、1,4-苯二甲醇、1,4-丁二醇及新戊二醇。 Examples of preferred diamines are ethylenediamine, 1,4-butanediamine and 1,6-hexanediamine. Examples of preferred diols are 1,6-hexanediol, 1,4-cyclohexanedimethanol (CHDM), 1,2-dodecanediol, 2-phenyl-1,2-propanediol, 1 , 4-benzenedimethanol, 1,4-butanediol, and neopentyl glycol.

二醇亦可為聚(C2~4-烷二醇)、聚酯或聚丙烯酸二醇等之聚醚。聚烷二醇亦可為包括其混合物之含有反復乙烯氧基、丙烯氧基或丁烯氧基的無規或嵌段均聚物或共聚物。 The diol may also be a polyether such as poly(C2~4-alkanediol), polyester or polyacrylic acid diol. The polyalkylene glycol may also be a random or block homopolymer or copolymer containing a repeating vinyloxy, propyleneoxy or butenyloxy group, including mixtures thereof.

左下例示數個化合物(b-d),藉此,可於聚胺基甲酸酯化合物(b-1-1)中導入右下之部分構造。 A few compounds (b-d) are exemplified in the lower left, whereby a structure of the lower right part of the structure can be introduced into the polyurethane compound (b-1-1).

[化65] [化65]

上式中,與氧原子鄰接之*係表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基;與氮原子鄰接之*係表示與主鏈之聚胺基甲酸酯骨架中之脲鍵之羰基間的鍵結基。 In the above formula, the * adjacent to the oxygen atom represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain; the * adjacent to the nitrogen atom represents the main chain The bond between the carbonyl groups of the urea bond in the polyurethane skeleton.

此外,若具有與異氰酸酯基進行反應之官能基僅2個,則可應用作為將上述部分構造導入至聚胺基甲酸酯分散劑(b-1)的化合物(b-d)。 Further, when there are only two functional groups which react with the isocyanate group, the compound (b-d) which is introduced into the polyurethane dispersant (b-1) as the partial structure can be used.

聚胺基甲酸酯分散劑(b-1)中之聚胺基甲酸酯骨架較佳係本質上具有直鏈特性。然而,在成分之任一者中依雜質型式存在官能價大於2之多元醇或聚異氰酸酯的情況,有少量之分枝構造被導入的情形。 The polyurethane skeleton in the polyurethane dispersant (b-1) preferably has a linear character in nature. However, in the case where any of the components has a polyhydric alcohol or a polyisocyanate having a functional value of more than 2 depending on the impurity type, a small amount of branched structure is introduced.

如以下所揭示,屬於化合物(b-e)之鏈停止化合物,係具有與異氰酸酯基進行反應之1個官能基的單官能化合物。化合物(b-e)之單官能基較佳為胺基或羥基。化合物(b-e)係鍵結於聚胺基甲酸酯分散劑(b-1)之主鏈之聚胺基甲酸酯骨架的末端,成為末端基。 As disclosed below, the chain-stopping compound belonging to the compound (b-e) is a monofunctional compound having one functional group reactive with an isocyanate group. The monofunctional group of the compound (b-e) is preferably an amine group or a hydroxyl group. The compound (b-e) is bonded to the terminal of the polyurethane skeleton of the main chain of the polyurethane dispersant (b-1) to form a terminal group.

較佳之鏈停止化合物,可列舉與構成聚胺基甲酸酯分散劑(b-1)之化合物(b-c)中所使用者相同的聚環氧烷單烷基醚、聚環氧烷單烷基醚胺、或上式(4)所示之化合物之末端基為羥基的聚酯化合物。 Preferred chain-stopping compounds include the same polyalkylene oxide monoalkyl ethers and polyalkylene oxide monoalkyl groups as those used in the compound (bc) constituting the polyurethane dispersant (b-1). The etheramine or the polyester compound in which the terminal group of the compound represented by the above formula (4) is a hydroxyl group.

左下例示化合物(b-e),藉此,可於聚胺基甲酸酯分散 劑(b-1)中導入右下之部分構造。 The compound (b-e) is exemplified in the lower left, whereby the polyurethane can be dispersed. The lower part of the structure is introduced into the agent (b-1).

上式中,*係表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基。 In the above formula, * represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain.

此外,若於單末端具有與異氰酸酯基進行反應之官能基僅1個,則可應用作為可將上述部分構造導入至聚胺基甲酸酯分散劑(b-1)的化合物(b-e)。 Further, when only one functional group is allowed to react with the isocyanate group at the single terminal, the compound (b-e) which can introduce the above partial structure into the polyurethane dispersant (b-1) can be used.

化合物(b-e)由分散性、及分散經時穩定性的觀點而言,較佳為含有聚醚鏈及/或聚酯鏈的親溶媒基者;此外,若為僅具有1個羥基、1個1級胺基、1個2級胺基、或1個硫醇基的化合物,則具有鏈停止作用,可應用作為化合物(b-e)。 The compound (be) is preferably a solvent-soluble base containing a polyether chain and/or a polyester chain from the viewpoint of dispersibility and dispersion stability over time; and if it has only one hydroxyl group, one A compound having a 1-stage amine group, a 2-stage amine group, or a thiol group has a chain-stopping action and can be used as a compound (be).

作為上述化合物(b-e),可替代具有聚醚鏈及/或聚酯鏈之親溶媒基的化合物,而在不對聚胺基甲酸酯分散劑(b-1)之效果造成影響的範圍內,亦可應用具有與此相同構造的聚丙烯酸酯或聚烯烴。 As the above compound (be), a compound having a polyether chain and/or a lyophilic group of a polyester chain may be substituted, and within the range which does not affect the effect of the polyurethane displacing agent (b-1), Polyacrylates or polyolefins having the same construction as this can also be used.

化合物(b-f)之單異氰酸酯化合物亦作用為鏈停止化合物,鍵結於屬於聚胺基甲酸酯分散劑(b-1)之主鏈的直鏈聚胺基甲酸酯骨架的兩末端。作為化合物(b-f)之單異氰酸酯化合物的具體例,有苯基異氰酸酯,但由於其若殘留則有必須進行後處理的情 況,故較佳為藉由化合物(b-e)進行鏈停止。 The monoisocyanate compound of the compound (b-f) also functions as a chain stopping compound bonded to both ends of a linear polyurethane skeleton belonging to the main chain of the polyurethane dispersant (b-1). Specific examples of the monoisocyanate compound of the compound (b-f) include phenyl isocyanate, but if it remains, it is necessary to carry out post-treatment. In this case, chain stop is preferably carried out by the compound (b-e).

[聚胺基甲酸酯分散劑(b-1)之合成] [Synthesis of Polyurethane Dispersant (b-1)]

在合成聚胺基甲酸酯分散劑(b-1)時之典型之原料使用量,係相對於聚胺基甲酸酯分散劑(b-1)全體之原料的合計質量,為10~50質量%之化合物(b-a)、1~24質量%之化合物(b-b)、10~80質量%之化合物(b-c)、0~25質量%之化合物(b-d)、0~50質量%之化合物(b-e)、及0~20質量%之化合物(b-f)。 The amount of the raw material used in the synthesis of the polyurethane dispersant (b-1) is 10 to 50 based on the total mass of the raw materials of the polyurethane dispersant (b-1). % by mass of compound (ba), 1 to 24% by mass of compound (bb), 10 to 80% by mass of compound (bc), 0 to 25% by mass of compound (bd), 0 to 50% by mass of compound (be ), and 0 to 20% by mass of the compound (bf).

構成聚胺基甲酸酯分散劑(b-1)中之橫方向側鏈的化合物(b-c)、及構成聚胺基甲酸酯骨架之兩末端的化合物(b-e)的質量比例,較佳係聚胺基甲酸酯分散劑(b-1)全體之原料的合計質量的35%以上。 The mass ratio of the compound (bc) constituting the lateral side chain in the polyurethane dispersant (b-1) and the compound (be) constituting both ends of the polyurethane skeleton is preferably The total mass of the raw materials of the entire polyurethane dispersant (b-1) is 35% or more.

化合物(b-c)及化合物(b-e)之含有聚醚鏈的化合物與 含有聚酯鏈的化合物,可分別為單獨,但較佳為含有其兩者。含有聚醚鏈之化合物與含有聚酯鏈之化合物的質量比率,係相對於化合物(b-c)及化合物(b-e)的合計質量,較佳為1:99~99:1,更佳為3:97~97:3,再更佳為5:95~95:5。 a compound containing the polyether chain of the compound (b-c) and the compound (b-e) The compound containing a polyester chain may be individually, but preferably contains both of them. The mass ratio of the compound containing a polyether chain to the compound containing a polyester chain is preferably from 1:99 to 99:1, more preferably 3:97, based on the total mass of the compound (bc) and the compound (be). ~97:3, and even better 5:95~95:5.

聚胺基甲酸酯分散劑(b-1)為含有聚醚鏈及聚酯鏈作為親溶媒基的情況,在形成平板電腦或高細線彩色濾光片BM時,形成製程中之對鹼顯影液的耐性或高溫處理時的耐性變得更良好,故較佳。又,聚胺基甲酸酯分散劑(b-1)之吸附基為與主鏈鍵結之特定吸附基的情況,由於特定之吸附基良好地吸附於顏料,容易攝入具有對顯影液之耐性或高溫處理時之耐性的顏料,故特佳。 The polyurethane dispersant (b-1) is a case where a polyether chain and a polyester chain are contained as a lyophilic medium, and in the formation of a tablet computer or a high-fine-line color filter BM, an alkali development process is formed in the process. It is preferable that the resistance of the liquid or the resistance at the time of high-temperature treatment becomes better. Further, in the case where the adsorbing group of the polyurethane dispersant (b-1) is a specific adsorbing group bonded to the main chain, since the specific adsorbing group is well adsorbed to the pigment, it is easy to ingest and have a developing solution. It is particularly good for pigments that are resistant to patience or high temperature treatment.

聚胺基甲酸酯分散劑(b-1)可依本領域已知之任意公 知方法進行調製。一般而言,聚胺基甲酸酯分散劑(b-1)係於實質上無水之條件下,於一般0~130℃之溫度的惰性環境下,於任意之惰性溶媒的存在下、且任意之觸媒的存在下,使二異氰酸酯化合物(b-a)1種或2種以上,與至少化合物(b-b)1種或2種以上、及化合物(b-c)1種或2種以上進行反應而可獲得。 The polyurethane dispersant (b-1) can be any known in the art. Know the method to modulate. In general, the polyurethane dispersant (b-1) is in the presence of any inert solvent in an inert atmosphere at a temperature of generally from 0 to 130 ° C under substantially anhydrous conditions, and optionally In the presence of the catalyst, one or two or more kinds of the diisocyanate compound (ba) can be obtained by reacting at least one or two or more compounds (bb) and one or more compounds (bc). .

又,亦可任意地將作用為鏈延長劑之1種或複數之化合物(b-d)、及屬於化合物(b-e)及化合物(b-f)的作用為鏈停止化合物的任意1種或複數之化合物,一起實施反應。 Further, one or a plurality of compounds (bd) which act as a chain extender, and any one or a plurality of compounds which act as a chain stop compound may be used together with the compound (be) and the compound (bf). Implement the reaction.

惰性環境可藉由惰性氣體之任一者進行,較佳為氮氣。 The inert environment can be carried out by any of inert gases, preferably nitrogen.

聚胺基甲酸酯分散劑(b-1)之調製可於觸媒存在下實施。特佳之觸媒為二月桂酸二丁基錫(DBTDL)等之脂肪酸的錫錯合物或三級胺。 The preparation of the polyurethane dispersant (b-1) can be carried out in the presence of a catalyst. A particularly preferred catalyst is a tin complex or a tertiary amine of a fatty acid such as dibutyltin dilaurate (DBTDL).

聚胺基甲酸酯分散劑(b-1)之合成時,係在合成時所反應之化合物全體中,藉由調整異氰酸酯基、與異氰酸酯基進行反應之官能基的莫耳數的比例,而形成各種生成物。 In the synthesis of the polyurethane dispersant (b-1), the ratio of the number of moles of the functional group which reacts with the isocyanate group and the isocyanate group is adjusted in the entire compound which is reacted at the time of synthesis. Various products are formed.

於一種情況下,化合物(b-a)中之異氰酸酯基之合計莫耳數,可較化合物(b-b)、(b-c)以及視需要所使用之與化合物(b-d)、(b-e)的異氰酸酯基進行反應之官能基的合計莫耳數少。此時,任一末端異氰酸酯基均進行反應,有不殘存未反應末端異氰酸酯基的傾向。 In one case, the total number of moles of the isocyanate groups in the compound (ba) may be compared with the compounds (bb), (bc) and, if necessary, the isocyanate groups of the compounds (bd) and (be). The total number of moles of the functional groups is small. At this time, any of the terminal isocyanate groups are reacted, and there is a tendency that the unreacted terminal isocyanate groups remain.

或者,由化合物(b-a)及任意之化合物(b-f)所提供之異氰酸酯基的合計莫耳數,亦可較化合物(b-b)、(b-c)及視需要所使用之與化合物(b-d)、(b-e)的異氰酸酯基進行反應之官能基的合計莫耳 數多。此時,有所得之聚胺基甲酸酯化合物(b-1-1)成為含有殘留異氰酸酯基之預聚物的傾向。 Alternatively, the total number of moles of isocyanate groups provided by the compound (ba) and the optional compound (bf) may be compared with the compounds (bb), (bc) and, if necessary, the compound (bd), (be) The total number of functional groups of the isocyanate group reacting A lot. At this time, the obtained polyurethane compound (b-1-1) tends to be a prepolymer containing a residual isocyanate group.

從而,此預聚物可在溶解於任意溶媒中前,與使相異之預聚物鏈鍵結之化合物(b-d)等其他之鏈延長劑及/或屬於化合物(b-e)的鏈停止化合物進行反應。 Thus, the prepolymer can be subjected to a chain extender such as a compound (bd) which binds to a different prepolymer chain, and/or a chain stop compound belonging to the compound (be), before being dissolved in any solvent. reaction.

又,於存在含有殘留異氰酸酯基之預聚物的情況,鏈延長反應可藉由水本身實施。或者,可藉由多元醇、胺基-醇、第一或第二脂肪族、脂環式、芳香族、或雜環聚胺,尤其是二胺、肼或取代肼而實施。 Further, in the case where a prepolymer having a residual isocyanate group is present, the chain extension reaction can be carried out by water itself. Alternatively, it can be carried out by a polyol, an amino-alcohol, a first or second aliphatic, alicyclic, aromatic, or heterocyclic polyamine, especially a diamine, an anthracene or a substituted hydrazine.

作為鏈延長劑,一般可列舉例如以下之具有2個以上之與異氰酸酯基進行反應之官能基的鏈延長劑,但為了保持直鏈之胺基甲酸乙酯骨架,較佳係具有與異氰酸酯基進行反應之官能基僅2個的鏈延長劑。 As the chain extender, for example, a chain extender having two or more functional groups reactive with an isocyanate group is exemplified below, but in order to maintain a linear urethane skeleton, it is preferred to carry out the reaction with an isocyanate group. There are only two chain extenders for the functional groups of the reaction.

一般所使用之鏈延長劑,可列舉例如乙二胺、丙二胺、丁二胺、六亞甲二胺、環己二胺、哌、2-甲基哌、苯二胺、甲苯二胺、二甲苯二胺、4,4'-亞甲基雙(2-氯苯胺)、3,3'-二氯-4,4'-聯苯二胺、2,6-二胺基吡啶、4,4'-二胺基二苯甲烷、甲烷二胺、間二甲苯二胺、異佛爾酮二胺、肼、二甲肼等之吖等。 The chain extender to be used generally includes, for example, ethylenediamine, propylenediamine, butanediamine, hexamethylenediamine, cyclohexanediamine, and piperidine. 2-methylperazine , phenylenediamine, toluenediamine, xylene diamine, 4,4'-methylenebis(2-chloroaniline), 3,3'-dichloro-4,4'-biphenyldiamine, 2, 6-Diaminopyridine, 4,4'-diaminodiphenylmethane, methanediamine, m-xylenediamine, isophoronediamine, hydrazine, dimethylhydrazine, etc. Wait.

作為使用於具有直鏈聚胺基甲酸酯骨架之聚胺基甲酸酯分散劑(b-1)的合成的鏈延長劑,較佳為具有與異氰酸酯基進行反應之官能基僅2個的鏈延長劑,特佳為六亞甲二胺。 As a synthetic chain extender used for the polyurethane dispase (b-1) having a linear polyurethane skeleton, it is preferred to have only two functional groups reactive with an isocyanate group. A chain extender, particularly preferably hexamethylenediamine.

鏈延長反應可於高溫、低溫及室溫之任一種進行。較佳溫度為約5~95℃。 The chain extension reaction can be carried out at any of high temperature, low temperature and room temperature. The preferred temperature is about 5 to 95 °C.

於聚胺基甲酸酯分散劑(b-1)之調製中使用預聚物法 的情況,為了控制所得之聚胺基甲酸酯分散劑(b-1)的分子量,可調整鏈延長劑及鏈停止化合物的量。 Prepolymer method used in the preparation of polyurethane dispersant (b-1) In the case, in order to control the molecular weight of the obtained polyurethane dispersant (b-1), the amount of the chain extender and the chain stop compound can be adjusted.

在與鏈延長劑中之異氰酸酯基進行反應之官能基的莫耳數為與預聚物中之游離異氰酸酯基之莫耳數幾乎相等的情況,容易成為高分子量。為了得到低分子量之聚胺基甲酸酯分散劑(b-1),可於與聚胺基甲酸酯預聚物的反應中,在鏈延長劑與鏈停止劑的組合下使鏈停止劑增多等而予以調整。 The number of moles of the functional group which reacts with the isocyanate group in the chain extender is almost equal to the number of moles of the free isocyanate group in the prepolymer, and it is easy to become a high molecular weight. In order to obtain a low molecular weight polyurethane dispersant (b-1), a chain stopper can be used in combination with a chain extender in a reaction with a polyurethane prepolymer. Adjust and increase.

為了控制黏度,可於聚胺基甲酸酯分散劑(b-1)或其預聚物生成之前、其期間或其後,添加惰性溶媒。作為較佳溶媒,可列舉例如丙酮、甲基乙基酮、二甲基甲醯胺、二甲基乙醯胺、二甘二甲醚、N-甲基吡咯啶酮、醋酸丁酯、醋酸甲氧基丙酯、醋酸乙酯、乙二醇二乙酸酯及丙二醇二乙酸酯、乙二醇乙酸酯及丙二醇乙酸酯的烷基醚、甲苯、二甲苯及第三丁醇以及二丙酮醇等立體障礙醇。更佳溶媒為醋酸乙酯、醋酸丁酯、醋酸甲氧基丙酯及N-甲基吡咯啶酮。 In order to control the viscosity, an inert solvent may be added before, during or after the formation of the polyurethane dispersant (b-1) or its prepolymer. Preferred examples of the solvent include acetone, methyl ethyl ketone, dimethylformamide, dimethylacetamide, diglyme, N-methylpyrrolidone, butyl acetate, and acetic acid. Alkyl ethers of ethyl oxypropyl ester, ethyl acetate, ethylene glycol diacetate and propylene glycol diacetate, ethylene glycol acetate and propylene glycol acetate, toluene, xylene and tert-butanol, and A steric hindrance alcohol such as acetol. More preferred solvents are ethyl acetate, butyl acetate, methoxypropyl acetate and N-methylpyrrolidone.

[聚胺基甲酸酯分散劑(b-1)之物性] [Physical properties of polyurethane dispersant (b-1)]

聚胺基甲酸酯分散劑(b-1)之固形份1g中的胺價,由分散性的觀點而言,較佳為10mgKOH/g以上、更佳為20mgKOH/g以上。且,由分散性之觀點而言,較佳為180mgKOH/g以下、更佳為110mgKOH/g以下、再更佳為70mgKOH/g以下。 The amine value in 1 g of the solid content of the polyurethane dispersant (b-1) is preferably 10 mgKOH/g or more, and more preferably 20 mgKOH/g or more from the viewpoint of dispersibility. Further, from the viewpoint of dispersibility, it is preferably 180 mgKOH/g or less, more preferably 110 mgKOH/g or less, still more preferably 70 mgKOH/g or less.

聚胺基甲酸酯分散劑(b-1)之數量平均分子量,由分散效果的觀點而言,較佳為2,000以上、更佳為3,000以上、特佳為4,000以上,且由容易分散與低黏度化的觀點而言,較佳為50,000 以下、更佳為40,000以下、再更佳為30,000以下、特佳為20,000以下。 The number average molecular weight of the polyurethane dispersant (b-1) is preferably 2,000 or more, more preferably 3,000 or more, particularly preferably 4,000 or more, from the viewpoint of dispersion effect, and is easily dispersed and low. From the viewpoint of viscosity, it is preferably 50,000 The following is more preferably 40,000 or less, still more preferably 30,000 or less, and particularly preferably 20,000 or less.

又,相對於100g之聚胺基甲酸酯分散劑(b-1),親溶媒基較佳為0.001莫耳根以上、更佳為0.005莫耳根以上、再更佳為0.01莫耳根以上、特佳為0.02莫耳根以上;且較佳為0.5莫耳根以下、更佳為0.2莫耳根以下、再更佳為0.1莫耳根以下、特佳為0.08莫耳根以下。以下,將該親溶媒基之比例依親溶媒基含量計以「莫耳根/100g」的單位表示。 Further, the hydrophilic solvent group is preferably 0.001 mol or more, more preferably 0.005 mol or more, still more preferably 0.01 mol or more, more preferably 100 mol or more per 100 g of the polyurethane dispersant (b-1). It is 0.02 mol or more; and preferably 0.5 mol or less, more preferably 0.2 mol or less, still more preferably 0.1 mol or less, and particularly preferably 0.08 mol or less. Hereinafter, the ratio of the lyophilic vehicle is expressed in units of "mole root/100 g" in terms of the content of the hydrophilic solvent group.

其中,所謂親溶媒基之「莫耳根」,係指在合成時之填裝中,針對親溶媒基之原料,將其填裝量除以其數量平均分子量的值。又,使用該親溶媒基之「莫耳根」,將觸媒以外之填裝量固形份量全體中之相當於100g的值定義為親溶媒基之「莫耳根/100g」。 Here, the "mole root" of the lyophilic medium means a value obtained by dividing the amount of the raw material of the lyophilic medium by the amount of the average molecular weight thereof during the filling at the time of synthesis. Further, the "mole root" of the lyophilic medium was used, and the value corresponding to 100 g of the entire solid content of the filling amount other than the catalyst was defined as "mole root/100 g" of the hydrophilic solvent group.

<其他實施形態> <Other Embodiments>

作為本發明之聚胺基甲酸酯分散劑(b-1)的其他實施形態,可列舉具有非直鏈,即具有含分岐構造的主鏈者,亦即於主鏈中具有至少分岐了3個以上之分枝者。 Another embodiment of the polyurethane dispersant (b-1) of the present invention includes a non-linear chain, that is, a main chain having a bifurcated structure, that is, having at least 3 branches in the main chain. More than one branch.

本實施形態中,如後述般,除了於主鏈中具有至少分岐了3個以上之分枝構造1個以上的情況以外,主鏈之聚胺基甲酸酯骨架由於成為接近屬於直鏈構造的實施形態的構造,故可認為於感光性樹脂組成物中之分散性良好。又,在圖案化時之鹼顯影或200℃以上之高溫處理中,可認為組合肟酯光聚合起始劑(c-1)與鹼可溶性樹脂(d)等,使鹼耐性及耐熱性相乘性地提升,藉此可形成高細微 的細線。 In the present embodiment, as described below, the polyurethane skeleton of the main chain is close to a linear structure except that at least one of the branching structures having at least three or more branches is branched in the main chain. Since the structure of the embodiment is considered, the dispersibility in the photosensitive resin composition is considered to be good. Further, in the case of alkali development at the time of patterning or high-temperature treatment at 200 ° C or higher, it is considered that the combined oxime ester photopolymerization initiator (c-1) and the alkali-soluble resin (d) are multiplied by alkali resistance and heat resistance. Sexually promoted, thereby forming a high degree of fineness Thin line.

本實施形態之聚胺基甲酸酯分散劑(b-1)的主鏈,若與親溶媒基間之鍵結部、吸附基及與吸附基間之鍵結部以外為具有分岐構造者,則無特別限定;作為該分岐構造,可列舉例如下述一般式(ii)所示之部分構造。 The main chain of the polyurethane dispersant (b-1) of the present embodiment has a branching structure other than the bonding portion between the bonding portion, the adsorption group, and the adsorption group. It is not particularly limited, and examples of the branching structure include a partial structure shown by the following general formula (ii).

上式(ii)中,Re表示3價之醇化合物殘基,*表示鍵結基。又,所謂醇化合物殘基,意指由醇化合物之總羥基去除了氫原子的其殘基。 In the above formula (ii), R e represents a trivalent alcohol compound residue, and * represents a bond group. Further, the term "alcohol compound residue" means a residue obtained by removing a hydrogen atom from the total hydroxyl group of the alcohol compound.

上式(ii)中之3價之醇化合物殘基的碳數並無特別限定,較佳為1以上、更佳為2以上、再更佳為3以上,且較佳為100以下、更佳為50以下、再更佳為10以下。藉由設為上述下限值以上,有可具有良好擴展之分岐構造的傾向;又,藉由設為上述上限值以下,有可使分散性良好的傾向。 The carbon number of the residue of the trivalent alcohol compound in the above formula (ii) is not particularly limited, but is preferably 1 or more, more preferably 2 or more, still more preferably 3 or more, and is preferably 100 or less, more preferably It is 50 or less, and more preferably 10 or less. When it is set to the above lower limit value, the branching structure which has a good expansion tends to be formed, and if it is equal to or less than the above upper limit value, the dispersibility tends to be good.

作為3價之醇化合物殘基的具體例,可列舉三羥甲基乙烷、三羥甲基丙烷、1,2,3-丙三醇、1,3,5-戊三醇、1,5,10-癸三醇、1,2,3-三羥苯、1,2,4-三羥苯、1,3,5-三羥苯、及於末端具有3個羥基之呈3分岐的聚環氧烷化合物等之醇化合物殘基。由具有良好擴展之分岐性的觀點而言,較佳為三羥甲基乙烷、三羥甲基丙烷、1,2,3- 丙三醇、1,3,5-戊三醇之醇化合物殘基,更佳為三羥甲基乙烷、三羥甲基丙烷或1,2,3-丙三醇之醇化合物殘基。 Specific examples of the residue of the trivalent alcohol compound include trimethylolethane, trimethylolpropane, 1,2,3-propanetriol, 1,3,5-pentanetriol, and 1,5. , 10-triol, 1,2,3-trihydroxybenzene, 1,2,4-trihydroxybenzene, 1,3,5-trihydroxybenzene, and a mixture of 3 hydroxyl groups at the terminal An alcohol compound residue such as an alkylene oxide compound. From the viewpoint of having a well-developed branching property, trimethylolethane, trimethylolpropane, 1,2,3- are preferred. The residue of the alcohol compound of glycerol or 1,3,5-pentanetriol is more preferably an alcohol compound residue of trimethylolethane, trimethylolpropane or 1,2,3-propanetriol.

作為更佳之3價之醇化合物殘基的具體例,可列舉以下者。 Specific examples of the residue of the more preferable trivalent alcohol compound include the following.

此等之中,由具有良好擴展之分岐性的觀點而言,Re更佳為三羥甲基乙烷或三羥甲基丙烷之醇化合物殘基。 Among these, from the viewpoint of having a well-developed branching property, R e is more preferably an alcohol compound residue of trimethylolethane or trimethylolpropane.

又,本實施形態之聚胺基甲酸酯分散劑(b-1)的主鏈,係與親溶媒基間之鍵結部、吸附基及與吸附基間之鍵結部以外亦可含有直鏈構造。作為直鏈構造,可較佳地採用上式(i)所示之部分構造。 Further, the main chain of the polyurethane dispersant (b-1) of the present embodiment may contain a straight portion between the bonding portion and the adsorbing group and the bonding portion between the adsorbing group and the adsorbing group. Chain construction. As the linear structure, a partial configuration shown by the above formula (i) can be preferably employed.

此時,關於主鏈所含有之直鏈構造與分岐構造的比率並無特別限定,相對於直鏈構造與分岐構造的合計,分岐構造較佳為1質量%以上、更佳為5質量%以上,且較佳為100質量%以下、更佳為80質量%以下、再更佳為60質量%以下。 In this case, the ratio of the linear structure to the branching structure included in the main chain is not particularly limited, and the branching structure is preferably 1% by mass or more, and more preferably 5% by mass or more based on the total of the linear structure and the branching structure. It is preferably 100% by mass or less, more preferably 80% by mass or less, still more preferably 60% by mass or less.

藉由設為上述下限值以上,有可使由聚酯構造部位、或聚醚構造部位所造成之溶媒親和性提升的傾向;又,藉由設為上述上限值以下,有減低立體障礙、可有效率地吸附於顏料的傾向。 When it is set to the above lower limit value, the solvent affinity due to the polyester structure portion or the polyether structure portion tends to be improved, and the steric hindrance is reduced by setting it as the upper limit or less. The tendency to adsorb to the pigment efficiently.

又,關於本實施形態之聚胺基甲酸酯分散劑(b-1)的特定吸附基、吸附基之含有比例、特定親溶媒基、親溶媒基之含有比例、以及物性,可較佳地採用上述者。 Further, the specific adsorbing group of the polyurethane dispersing agent (b-1) of the present embodiment, the content ratio of the adsorbing group, the specific hydrophilic solvent group, the content ratio of the hydrophilic solvent group, and the physical properties are preferably Use the above.

又,本實施形態之聚胺基甲酸酯分散劑(b-1)的製造方法,除了於胺基甲酸乙酯形成反應中使用少量之三官能以上之單體的點以外,其餘與上述製造方法相同。藉由使用三官能以上之單體,於主鏈形成數個分枝點。 Further, the method for producing the polyurethane dispersant (b-1) of the present embodiment is the same as the above-described production except that a small amount of a trifunctional or higher monomer is used in the urethane formation reaction. The method is the same. By using a trifunctional or higher monomer, several branching points are formed in the main chain.

作為此處所使用之三官能以上之單體,可列舉多元醇、多胺或聚異氰酸酯,較佳為多元醇或多胺,特佳為多元醇。 The trifunctional or higher monomer used herein may, for example, be a polyhydric alcohol, a polyamine or a polyisocyanate, preferably a polyhydric alcohol or a polyamine, and particularly preferably a polyhydric alcohol.

本實施形態之聚胺基甲酸酯分散劑(b-1)由於有容易凝膠化之傾向,故較佳係以不發生凝膠化的方式進行合成。由此種觀點而言,聚胺基甲酸酯分散劑(b-1)之數量平均分子量較佳為40,000以下、更佳為30,000以下。另一方面,聚胺基甲酸酯分散劑(b-1)之數量平均分子量,由分散效果的觀點而言,較佳為至少3,000以上、更佳為至少5,000以上。 Since the polyurethane dispersant (b-1) of the present embodiment tends to be easily gelled, it is preferred to carry out the synthesis without causing gelation. From such a viewpoint, the number average molecular weight of the polyurethane dispersant (b-1) is preferably 40,000 or less, more preferably 30,000 or less. On the other hand, the number average molecular weight of the polyurethane dispersant (b-1) is preferably at least 3,000 or more, more preferably at least 5,000 or more from the viewpoint of the dispersion effect.

本實施形態之聚胺基甲酸酯分散劑(b-1)係於上述方法中替代化合物(b-a)及(b-d),使用化合物(b-a')及(b-d')而可合成。 The polyurethane dispersant (b-1) of the present embodiment can be synthesized by using the compounds (b-a') and (b-d') instead of the compounds (ba) and (bd) in the above method. .

[化合物(b-a'):聚異氰酸酯化合物] [Compound (b-a'): Polyisocyanate Compound]

聚異氰酸酯化合物(b-a')若含有具3個以上異氰酸酯基的化合物,則可將聚胺基甲酸酯骨架作成為分岐構造,但分岐較佳為低度。 When the polyisocyanate compound (b-a') contains a compound having three or more isocyanate groups, the polyurethane skeleton can be made into a branched structure, but the branching is preferably low.

於聚異氰酸酯化合物(b-a')中,不僅止於具有3個以上異氰酸酯基的化合物,亦可含有上述二異氰酸酯化合物(b-a)。又,在使用含有具有與異氰酸酯基進行反應之官能基3個以上之化合物者作為後述化合物(b-d')時,聚異氰酸酯化合物(b-a')亦可為僅包含二異氰酸酯化合物者。 The polyisocyanate compound (b-a') may contain not only the compound having three or more isocyanate groups but also the above-mentioned diisocyanate compound (b-a). In addition, when a compound containing three or more functional groups having a reaction with an isocyanate group is used as the compound (b-d') described later, the polyisocyanate compound (b-a') may be a compound containing only a diisocyanate compound.

聚異氰酸酯化合物(b-a')之平均官能基數較佳為2.0 以上,且較佳為2.5以下、更佳為2.2以下。又,在使用含有具有與異氰酸酯基進行反應之官能基3個以上之化合物者作為化合物(b-d')時,聚異氰酸酯化合物(b-a')之平均官能基數特佳為2.0。 The average number of functional groups of the polyisocyanate compound (b-a') is preferably 2.0. The above is preferably 2.5 or less, more preferably 2.2 or less. In addition, when a compound (b-d') containing three or more functional groups having a reaction with an isocyanate group is used, the average number of functional groups of the polyisocyanate compound (b-a') is particularly preferably 2.0.

於此,所謂平均官能基數,係在具有相異官能基數之化合物的混合物的情況,為其官能基數的平均值,並藉下式予以算出。 Here, the average functional group number is a mixture of compounds having a different number of functional groups, and is an average value of the number of functional groups, and is calculated by the following formula.

平均官能基數=[{(官能基數)×(具有其官能基數之化合物的莫耳數)}之總和]/(化合物之總莫耳數) The average number of functional groups = [{(functional number of bases) × (the number of moles of the compound having the number of functional groups thereof)} / (the total number of moles of the compound)

平均官能基數為2.0的化合物(b-a'),係與上述化合物(b-a)相同。 The compound (b-a') having an average functional group number of 2.0 is the same as the above compound (b-a).

[化合物(b-d'):具有與異氰酸酯基進行反應之官能基3個以上、對聚胺基甲酸酯骨架賦予分岐構造的化合物] [Compound (b-d'): a compound having three or more functional groups reactive with an isocyanate group and imparting a branching structure to the polyurethane skeleton]

上述化合物(b-d)係具有與異氰酸酯基進行反應之官能基2個以上,並形成直鏈之聚胺基甲酸酯骨架,但化合物(b-d')係至少含有具有與異氰酸酯基進行反應之官能基3個以上之化合物,藉此,可對主鏈之聚胺基甲酸酯骨架導入分岐構造。 The compound (bd) has two or more functional groups reactive with an isocyanate group and forms a linear polyurethane skeleton, but the compound (b-d') contains at least a reaction with an isocyanate group. By having three or more functional groups, a branched structure can be introduced into the polyurethane skeleton of the main chain.

化合物(b-d')亦可為具有與異氰酸酯基進行反應之官能基2個的化合物、與具有與異氰酸酯基進行反應之官能基3個以上的化合物的混合物。此時,與化合物(b-d')之異氰酸酯基進行反應之官能基的平均數,較佳為2.01以上、更佳為2.1以上,且較佳為4以下、更佳為3以下。 The compound (b-d') may be a mixture of two compounds having a functional group reactive with an isocyanate group and three or more compounds having a functional group reactive with an isocyanate group. In this case, the average number of functional groups which react with the isocyanate group of the compound (b-d') is preferably 2.01 or more, more preferably 2.1 or more, and is preferably 4 or less, more preferably 3 or less.

化合物(b-d')中之具有與異氰酸酯基進行反應之官能基3個以上的化合物,以及由此化合物所造成之聚胺基甲酸酯分散 劑(b-1)之部分構造的具體例,係如以下所述。 a compound having three or more functional groups reactive with an isocyanate group in the compound (b-d'), and a polyurethane dispersion caused by the compound Specific examples of the partial structure of the agent (b-1) are as follows.

作為具有3個以上羥基的低分子量多元醇,可列舉例如三羥甲基丙烷、季戊四醇及二季戊四醇等。作為具有3個以上胺基的多胺,可列舉例如二乙基三胺、參(2-胺乙基)胺、三乙四胺等。 Examples of the low molecular weight polyol having three or more hydroxyl groups include trimethylolpropane, pentaerythritol, and dipentaerythritol. Examples of the polyamine having three or more amine groups include diethyltriamine, ginxyl (2-aminoethyl)amine, and triethylenetetramine.

又,藉由使用具有3個、或4個羥基之化合物,進行聚烷二醇之合成或內酯之聚合,較佳可得到數量平均分子量為200~2,000之三元醇或四元醇之寡聚物化合物,亦可將此使用作為化合物(b-d')。作為化合物(b-d'),較佳為具有低分子之3個羥基的化合物。 Further, by using a compound having three or four hydroxyl groups to carry out the synthesis of a polyalkylene glycol or the polymerization of a lactone, it is preferred to obtain a trivalent or tetrahydric alcohol having a number average molecular weight of 200 to 2,000. The polymer compound can also be used as the compound (b-d'). The compound (b-d') is preferably a compound having three hydroxyl groups of a low molecular weight.

化合物(b-d')中之具有與異氰酸酯基進行反應之官能基3個以上的化合物的具體例係例示於左下,藉此,可於聚胺基甲酸酯分散劑(b-1)中導入右下之部分構造。 Specific examples of the compound having three or more functional groups reactive with an isocyanate group in the compound (b-d') are shown in the lower left, whereby the polyurethane dispersion (b-1) can be used. Import the lower right part of the structure.

[化69] [化69]

上式中,與氧原子鄰接之*係表示與主鏈之聚胺基甲酸酯骨架中之胺基甲酸乙酯鍵之羰基間的鍵結基;與氮原子鄰接之*係表示與主鏈之聚胺基甲酸酯骨架中之脲鍵之羰基間的鍵結基;與硫原子鄰接之*係表示與主鏈之聚胺基甲酸酯骨架中之硫脲鍵間的鍵結基。 In the above formula, the * adjacent to the oxygen atom represents a bond group to the carbonyl group of the urethane bond in the polyurethane skeleton of the main chain; the * adjacent to the nitrogen atom represents the main chain The bond between the carbonyl groups of the urea bond in the polyurethane skeleton; the * adjacent to the sulfur atom means a bond group with the thiourea bond in the polyurethane skeleton of the main chain.

此外,若為具有3個以上之羥基及/或1級、2級胺基的化合物,亦可應用作為化合物(b-d')。 Further, a compound (b-d') can also be used as a compound having three or more hydroxyl groups and/or one or two amine groups.

又,化合物(b-d')之數量平均分子量較佳為32~3,000,此等化合物可為1種,亦可使用複數。 Further, the number average molecular weight of the compound (b-d') is preferably from 32 to 3,000, and one type of these compounds may be used, and plural numbers may be used.

接著,針對化合物(b-a')、(b-b)、(b-c)、(b-d')、(b-e) 中之異氰酸酯基的量及與異氰酸酯基進行反應之官能基的量進行說明。 Next, for the compounds (b-a'), (b-b), (b-c), (b-d'), (b-e) The amount of the isocyanate group and the amount of the functional group reactive with the isocyanate group will be described.

本實施形態之聚胺基甲酸酯分散劑(b-1)中的異氰酸酯基,基本上係由化合物(b-a')所造成。相對於此,與異氰酸酯基進行反應之官能基係由化合物(b-b)、(b-c)、(b-d')、(b-e)所造成。此等之官能基的量較佳係依如以下般相等的方式使用。 The isocyanate group in the polyurethane dispersant (b-1) of the present embodiment is basically caused by the compound (b-a'). On the other hand, the functional group reactive with the isocyanate group is caused by the compounds (b-b), (b-c), (b-d'), and (b-e). The amount of such functional groups is preferably used in an equivalent manner as follows.

{(b-a')中之異氰酸酯基數}×{(b-a')之莫耳數}={與(b-b)中之異氰酸酯基進行反應之官能基數}×{(b-b)之莫耳數}+{與(b-c)中之異氰酸酯基進行反應之官能基數}×{(b-c)之莫耳數}+{與(b-d')中之異氰酸酯基進行反應之官能基數}×{(b-d')之莫耳數}+{與(b-e)中之異氰酸酯基進行反應之官能基數}×{(b-e)之莫耳數} {(b-a') isocyanate number} × {(b-a') molar number} = {number of functional groups reacting with isocyanate groups in (bb)} × {(bb) molar number }+{Number of functional groups reactive with isocyanate groups in (bc)}×{Mc of (bc)}+{Number of functional groups reactive with isocyanate groups in (b-d')}×{(b -d') Molar number} + {Number of functional groups reactive with isocyanate groups in (be)} × {(be) Moire number}

其中,在(b-a')~(b-e)之化合物為混合物時,係使用其混合物之官能基之平均官能基數及混合物的合計莫耳數。 Here, when the compound of (b-a') to (b-e) is a mixture, the average functional group number of the functional group of the mixture and the total number of moles of the mixture are used.

又,本實施形態之聚胺基甲酸酯分散劑(b-1)的較佳構造,可藉由使用以下化合物而獲得。 Further, a preferred structure of the polyurethane dispersant (b-1) of the present embodiment can be obtained by using the following compounds.

‧(b-a')中之異氰酸酯基數:2個 ‧(b-a') isocyanate group number: 2

‧與(b-b)中之異氰酸酯基進行反應之官能基數:2個 ‧ Number of functional groups reactive with isocyanate groups in (b-b): 2

‧與(b-c)中之異氰酸酯基進行反應之官能基數:2個 ‧ Number of functional groups reactive with isocyanate groups in (b-c): 2

‧與(b-d')中之異氰酸酯基進行反應之官能基數:包含2個與3個以上的混合物,平均官能基數至少多於2個。 ‧ Number of functional groups reactive with the isocyanate group in (b-d'): comprising a mixture of two or more, and having an average number of functional groups of at least two.

‧與(b-e)中之異氰酸酯基進行反應之官能基:1個 ‧The functional group reacting with the isocyanate group in (b-e): 1

本實施形態之聚胺基甲酸酯分散劑(b-1)的分岐構造較佳為低程度。所謂低程度,係由以下定義所表示。首先,於與異 氰酸酯基進行反應之官能基中,考慮作為鏈停止劑而作用之化合物(b-e)以外的化合物(b-b)、(b-c)、(b-d')的平均官能基數。將此定義為「與鏈停止劑以外之異氰酸酯基進行反應之官能基的平均數」。 The branching structure of the polyurethane dispersant (b-1) of the present embodiment is preferably low. The so-called low level is represented by the following definition. First, between and In the functional group in which the cyanate group is reacted, the average functional group number of the compounds (b-b), (b-c), and (b-d') other than the compound (b-e) which acts as a chain stopper is considered. This is defined as "the average number of functional groups reactive with an isocyanate group other than the chain stopper".

「與鏈停止劑以外之異氰酸酯基進行反應之官能基的平均數」=A/B "Average number of functional groups reactive with isocyanate groups other than chain stopper" = A/B

其中,A及B係如以下所述。 Among them, A and B are as follows.

A={與(b-b)中之異氰酸酯基進行反應之官能基數}×{(b-b)之莫耳數}+{與(b-c)中之異氰酸酯基進行反應之官能基數}×{(b-c)之莫耳數}+{與(b-d')中之異氰酸酯基進行反應之官能基數}×{(b-d')之莫耳數} A = {number of functional groups reactive with isocyanate groups in (bb)} × {mole of {(bb)} + {number of functional groups reactive with isocyanate groups in (bc)} × {(bc) Number of ears}+{Number of functional groups reactive with isocyanate groups in (b-d')}×{(b-d') molars}

B={(b-b)之莫耳數}+{(b-c)之莫耳數}+{(b-d')之莫耳數} B = {(b-b) mole number} + {(b-c) mole number} + {(b-d') mole number}

本實施形態之聚胺基甲酸酯分散劑(b-1)可設為「與鏈停止劑以外之異氰酸酯基進行反應之官能基的平均數」大於2的聚胺基甲酸酯化合物。為了使「與鏈停止劑以外之異氰酸酯基進行反應之官能基的平均數」大於2,較佳係使用與化合物(b-d')之異氰酸酯基進行反應之化合物的平均官能基數大於2者。因此,化合物(b-d')若設為含有具有與異氰酸酯基進行反應之官能基至少3個以上之化合物者即可。 The polyurethane dispersant (b-1) of the present embodiment can be a polyurethane compound having a "average number of functional groups reactive with an isocyanate group other than a chain stopper" of more than 2. In order to make the "average number of functional groups reactive with the isocyanate group other than the chain stopper" larger than 2, it is preferred to use a compound having a reaction with the isocyanate group of the compound (b-d') to have an average number of functional groups of more than 2. Therefore, the compound (b-d') may be a compound containing at least three or more functional groups having a reaction with an isocyanate group.

與化合物(b-d')之異氰酸酯基進行反應之官能基,較佳為羥基、胺基,特佳為羥基。化合物(b-d')亦可為數種化合物的混合物。 The functional group reactive with the isocyanate group of the compound (b-d') is preferably a hydroxyl group or an amine group, and particularly preferably a hydroxyl group. The compound (b-d') may also be a mixture of several compounds.

又,「與鏈停止劑以外之異氰酸酯基進行反應之官能基的平均數」較佳係超過2.0、且3.0以下。「與鏈停止劑以外之異氰酸酯基進行反應之官能基的平均數」較佳為2.6以下,更佳為2.4 以下,再更佳為2.3以下。 Further, the "average number of functional groups which react with an isocyanate group other than the chain stopper" is preferably more than 2.0 and not more than 3.0. The "average number of functional groups which react with an isocyanate group other than the chain stopper" is preferably 2.6 or less, more preferably 2.4. Hereinafter, it is more preferably 2.3 or less.

「與鏈停止劑以外之異氰酸酯基進行反應之官能基的平均數」較佳為低程度。藉由使「與鏈停止劑以外之異氰酸酯基進行反應之官能基的平均數」成為低程度,有可抑制因聚胺基甲酸酯分散劑(b-1)本身之纏結所造成之與溶劑或感光性樹脂組成物中之鹼可溶性樹脂或光聚合性單體間之相溶性惡化的傾向。又,可防止因分散劑之纏結而立體障礙變大之情況,有可抑制對顏料之吸附作用惡化的傾向。藉此,於溶劑中之分散性、細線形成時之耐鹼顯影液耐性及高溫處理時之耐熱性良好,有可充分發揮本發明效果之傾向。 The "average number of functional groups reactive with an isocyanate group other than the chain stopper" is preferably low. By making the "average number of functional groups reactive with the isocyanate group other than the chain stopper" low, it is possible to suppress the entanglement of the polyurethane dispersant (b-1) itself. The compatibility between the alkali-soluble resin or the photopolymerizable monomer in the solvent or the photosensitive resin composition tends to be deteriorated. Further, it is possible to prevent the steric obstacle from becoming large due to the entanglement of the dispersant, and it is possible to suppress the deterioration of the adsorption effect on the pigment. Thereby, the dispersibility in a solvent, the alkali-resistant developer resistance at the time of formation of a fine line, and the heat resistance at the time of high-temperature treatment are favorable, and the effect of this invention is fully exhibited.

尚且,本實施形態之聚胺基甲酸酯分散劑(b-1)的數量平均分子量,較佳為3,000以上、更佳為5,000以上,且較佳為40,000以下、更佳為30,000以下。 In addition, the number average molecular weight of the polyurethane dispersant (b-1) of the present embodiment is preferably 3,000 or more, more preferably 5,000 or more, and is preferably 40,000 or less, more preferably 30,000 or less.

<其他分散劑> <Other dispersants>

本發明之感光性樹脂組成物中之分散劑(b)係至少含有上述聚胺基甲酸酯分散劑(b-1),但在不影響藉由使用聚胺基甲酸酯分散劑(b-1)所得之本發明效果的範圍內,亦可併用聚胺基甲酸酯分散劑(b-1)以外之其他分散劑(b-2)。 The dispersing agent (b) in the photosensitive resin composition of the present invention contains at least the above-mentioned polyurethane dispersing agent (b-1), but does not affect the use of the polyurethane dispersing agent (b). -1) In the range of the effects of the present invention obtained, a dispersing agent (b-2) other than the polyurethane dispersing agent (b-1) may be used in combination.

作為其他分散劑(b-2),較佳為高分子分散劑,由分散穩定性方面而言,更佳係羧基;磷酸基;磺酸基;或此等之鹼;1級、2級或3級胺基;4級銨鹽基;吡啶、嘧啶或吡等之具有含氮原子雜環基等官能基的高分子分散劑。其中,特佳為1級、2級或3級胺基;4級銨鹽基;吡啶、嘧啶或吡等之具有含氮原子雜 環基等鹼性官能基的高分子分散劑。 The other dispersing agent (b-2) is preferably a polymer dispersing agent, and more preferably a carboxyl group; a phosphate group; a sulfonic acid group; or the like; or a base; Grade 3 amine; grade 4 ammonium; pyridine, pyrimidine or pyridyl A polymer dispersant having a functional group such as a nitrogen atom-containing heterocyclic group. Among them, particularly preferred is a grade 1, 2 or 3 amine group; a grade 4 ammonium salt; pyridine, pyrimidine or pyridyl A polymer dispersant having a basic functional group such as a nitrogen atom-containing heterocyclic group.

又,作為其他可併用之高分子分散劑,可列舉例如聚胺基甲酸酯分散劑(b-1)以外之胺基甲酸乙酯系分散劑、丙烯酸系分散劑、聚乙烯亞胺系分散劑、聚烯丙基胺系分散劑、包含具有胺基之單體與巨單體的分散劑、聚氧乙烯烷基醚系分散劑、聚氧乙烯二酯系分散劑、聚醚磷酸系分散劑、聚酯磷酸系分散劑、去水山梨醇脂肪族酯系分散劑及脂肪族改質聚酯系分散劑等。 In addition, as another polymer dispersing agent which can be used together, for example, a urethane dispersing agent other than the polyurethane dispersing agent (b-1), an acrylic dispersing agent, and a polyethyleneimine dispersion are mentioned. Agent, polyallylamine dispersant, dispersant containing monomer and macromonomer having an amine group, polyoxyethylene alkyl ether dispersant, polyoxyethylene diester dispersant, polyether phosphate dispersion Agent, polyester phosphate dispersant, sorbitan fatty ester dispersant, and aliphatic modified polyester dispersant.

作為此種其他可併用的分散劑的具體例,依商品名可列舉EFKA[註冊商標,以下相同。EFKA CHEMICALS BV(EFKA)公司製。]、Disperbyk(註冊商標,以下相同。BYK Chemie公司製。)、DISPARLON(註冊商標,以下相同。楠本化成公司製)、SOLSPERSE(註冊商標,以下相同。Lubrizol公司製。)、KP(信越化學工業公司製)、Polyflow或Flowlen(共榮社化學公司製)、Ajisper(註冊商標,以下相同。味之素Fine-techno公司製。)等。 Specific examples of such other dispersible agents that can be used together include EFKA [registered trademark, the same applies hereinafter. EFKA CHEMICALS BV (EFKA) company. ], Disperbyk (registered trademark, the same as below. BYK Chemie Co., Ltd.), DISPARLON (registered trademark, the same as the following.), SOLSPERSE (registered trademark, the same as the following. Lubrizol company.), KP (Shin-Etsu Chemical Industry) Company system), Polyflow or Flowlen (manufactured by Kyoeisha Chemical Co., Ltd.), Ajisper (registered trademark, the same as the following. Ajinomoto Fine-techno Co., Ltd.).

更具體而言,可列舉例如EFKA-4046、-4047(BASF公司製)、Disperbyk-111、-161、-162、-163、-166、-167、-182、-2000、-2001(BYK Chemie公司製)、DISPARLON DA-7301、ED-701(楠本化成公司製)、SOLSPERSE-22000、-24000、-28000(Lubrizol公司製)、Flowlen KDG-2400(共榮社化學公司製)及Ajisper-PB-821、-881(味之素Fine-techno公司製)等。 More specifically, for example, EFKA-4046, -4047 (manufactured by BASF Corporation), Disperbyk-111, -161, -162, -163, -166, -167, -182, -2000, -2001 (BYK Chemie) Company system), DISPARLON DA-7301, ED-701 (made by Nanben Chemical Co., Ltd.), SOLSPERSE-22000, -24000, -28000 (manufactured by Lubrizol), Flowlen KDG-2400 (manufactured by Kyoeisha Chemical Co., Ltd.), and Ajisper-PB -821, -881 (manufactured by Ajinomoto Fine-techno Co., Ltd.).

此等高分子分散劑可僅以1種與聚胺基甲酸酯分散劑(b-1)併用,亦可併用2種以上。 These polymer dispersants may be used alone or in combination with the polyurethane dispersant (b-1), or two or more kinds thereof may be used in combination.

此等其他之分散劑中,較佳係具有鹼性官能基之聚胺基甲酸酯分散劑(b-1)以外的胺基甲酸乙酯系高分子分散劑及/或丙 烯酸系高分子分散劑,特佳係胺基甲酸乙酯系高分子分散劑。又,具有鹼性官能基,並具有聚酯及/或聚醚鍵的高分子分散劑亦較佳。 Among these other dispersing agents, a urethane-based polymer dispersing agent other than the polyfunctional urethane dispersing agent (b-1) having a basic functional group and/or C is preferable. The olefinic polymer dispersing agent is particularly preferably an urethane-based polymer dispersing agent. Further, a polymer dispersing agent having a basic functional group and having a polyester and/or polyether bond is also preferred.

若具體例示作為胺基甲酸乙酯系高分子分散劑的較佳化學構造,可列舉例如:藉由使如甲苯二異氰酸酯三聚物般之具有3個以上異氰酸酯基的聚異氰酸酯化合物、分子內具有1個或2個羥基且具有數量平均分子量300~10,000之親溶媒基的化合物或具有鏈延長基的化合物、與同一分子內具有1個活性氫與3級胺基的化合物進行反應而獲得的重量平均分子量1,000~200,000的分散樹脂等。 Specifically, a preferred chemical structure of the urethane-based polymer dispersant is exemplified by a polyisocyanate compound having three or more isocyanate groups such as a toluene diisocyanate trimer. a weight obtained by reacting a compound having one or two hydroxyl groups and having a lyophilic group having a number average molecular weight of 300 to 10,000 or a compound having a chain extending group, and a compound having one active hydrogen and a tertiary amino group in the same molecule A dispersion resin having an average molecular weight of 1,000 to 200,000.

於此種樹脂中,同一分子內具有活性氫與3級胺基的化合物的導入量,較佳係控制於以反應後之胺價計為1~100mgKOH/g的範圍內。更佳係5~95mgKOH/g之範圍。 In such a resin, the amount of the compound having an active hydrogen and a tertiary amino group in the same molecule is preferably controlled in the range of 1 to 100 mgKOH/g based on the amine value after the reaction. More preferably, it is in the range of 5 to 95 mgKOH/g.

作為此種市售之分散劑,有Disperbyk-161、-162、-163、-166、-167、-182(BYK Chemie公司製)或EFKA-4046、-4047(BASF公司製等)。 As such a commercially available dispersing agent, there are Disperbyk-161, -162, -163, -166, -167, -182 (manufactured by BYK Chemie Co., Ltd.) or EFKA-4046, -4047 (manufactured by BASF Corporation, etc.).

本發明中,胺價係藉由酸對鹼性胺基進行中和滴定,對應酸價而由KOH之mg數所表示的值;具體而言,係依以下方法所測定。若胺價低於上述範圍,有分散能力降低的傾向;又,若超過上述範圍,則顯影性容易降低。 In the present invention, the amine valence is a value obtained by neutralization titration of a basic amine group with an acid, and is represented by the number of mg of KOH corresponding to the acid value; specifically, it is determined by the following method. When the amine value is less than the above range, the dispersibility is lowered, and if it exceeds the above range, the developability is liable to lower.

<胺價之測定方法> <Method for measuring amine price>

胺價係由分散劑試料中去除了溶劑之固形份每1g的鹼量與當量的KOH的質量所表示,可藉由下述方法進行測定。 The amine value is represented by the mass of the solvent in which the solid content of the solvent is removed from the dispersant sample, and the mass of KOH is equivalent, and can be measured by the following method.

於100mL燒杯精秤分散劑試料0.5~1.5g,以50mL醋 酸溶解。使用具備pH電極之自動滴定裝置,將此溶液以0.1mol/L之HClO4(過氯酸)醋酸溶液進行中和滴定。以滴定pH曲線之反曲點作為滴定終點,並由下式求得胺價。 In a 100mL beaker fine scale dispersant sample 0.5~1.5g, dissolved in 50mL acetic acid. This solution was neutralized and titrated with a 0.1 mol/L HClO 4 (perchloric acid) acetic acid solution using an automatic titrator equipped with a pH electrode. The inflection point of the pH curve was titrated as the end point of the titration, and the amine price was determined by the following formula.

胺價[mgKOH/g]=(561×V)/(W×S) Amine price [mgKOH/g] = (561 × V) / (W × S)

[其中,W:分散劑試料秤取量[g],V:滴定終點的滴定量[mL],S:分散劑試料之固形份濃度[質量%]。] [Where, W: dispersant sample weighing amount [g], V: titration end point titration [mL], S: solid content concentration [% by mass] of the dispersant sample. ]

[光聚合起始劑(c)] [Photopolymerization initiator (c)]

本發明之感光性樹脂組成物所含有的光聚合起始劑(c),其特徵為至少含有肟酯光聚合起始劑(c-1)。 The photopolymerization initiator (c) contained in the photosensitive resin composition of the present invention is characterized in that it contains at least an oxime ester photopolymerization initiator (c-1).

<肟酯光聚合起始劑(c-1)> <Hydrazine ester photopolymerization initiator (c-1)>

本發明中,以屬於肟衍生物類(肟系及酮肟系化合物)之肟酯作為光聚合起始劑(c)而有效的理由,係如下述。 In the present invention, the reason why the oxime esters belonging to the anthracene derivatives (anthracene and ketone oxime compounds) are effective as the photopolymerization initiator (c) is as follows.

亦即,本發明中使用作為分散劑(b)的特定聚胺基甲酸酯分散劑(b-1),係於感光性樹脂組成物中,在使用了肟酯光聚合起始劑(c-1)作為光聚合起始劑(c)時,於製作彩色濾光片時等,藉由提升對鹼顯影液之耐性,並抑制其後高溫硬化處理中之熱變形,而可容易形成目前市場所要求之高細微之細線。 That is, in the present invention, a specific polyurethane dispersant (b-1) as a dispersing agent (b) is used in a photosensitive resin composition, and an oxime ester photopolymerization initiator (c) is used. -1) When it is used as a photopolymerization initiator (c), it is easy to form the present at the time of producing a color filter, etc., by improving the resistance to the alkali developer and suppressing thermal deformation in the post-high-temperature hardening treatment. The fine lines that are required by the market.

本發明中所使用之聚胺基甲酸酯分散劑(b-1),係如上述般,於吸附基或胺基甲酸乙酯骨架之部位攝入顏料,於聚酯鏈或聚酯鏈之部位與感光性樹脂組成物中之樹脂或單體良好相溶並纏合,又,其後,藉由紫外線以光聚合起始劑(c)使感光性樹脂組成物之樹脂或單體進行交聯,藉此使本發明效果之耐鹼顯影性及耐熱性 更加提升。可認為此效果係藉由併用聚胺基甲酸酯分散劑(b-1)與肟酯光聚合起始劑(c-1)而更進一步提升。 The polyurethane dispersant (b-1) used in the present invention is obtained by ingesting a pigment at a site of an adsorbent group or a urethane skeleton as described above, in a polyester chain or a polyester chain. The portion is in good compatibility with and entangled with the resin or monomer in the photosensitive resin composition, and thereafter, the resin or monomer of the photosensitive resin composition is subjected to photopolymerization initiator (c) by ultraviolet light. In combination with the alkali developability and heat resistance of the present invention More improved. This effect is considered to be further enhanced by using the polyurethane dispersant (b-1) in combination with the oxime ester photopolymerization initiator (c-1).

尤其是在紫外線難以到達之基板與細線圖案之接黏部分或紫外線曝光時因遮罩使紫外線被遮光而變弱的細線圖案之側面部,藉由使肟酯光聚合起始劑(c-1)與聚胺基甲酸酯分散劑(b-1)共存,可使鹼顯影液耐性與耐熱性的效果相乘性地提升,可容易形成高細微之細線。 In particular, the side portion of the fine line pattern which is weakened by the ultraviolet light being blocked by the mask in the adhesion portion of the substrate which is hard to reach by ultraviolet rays or the ultraviolet light exposure, by the oxime ester photopolymerization initiator (c-1) When it coexists with the polyurethane dispersant (b-1), the alkali developer resistance can be multiplied by the effect of heat resistance, and a fine line of fineness can be easily formed.

另外,肟酯光聚合起始劑(c-1)由於於其構造中兼具有吸收紫外線之構造、傳達光能量之構造、與產生自由基之構造,故少量即感度高,且對熱反應呈穩定,依少量即可設計高感度之感光性樹脂組成物。尤其由對於曝光光源之i射線(365nm)之光吸收性的觀點而言,在具有亦可經取代之咔唑基(具有亦可經取代之咔唑環的基)的肟酯光聚合起始劑(c-1)的情況下,可良好地表現此構造特性,故更佳。 Further, the oxime ester photopolymerization initiator (c-1) has a structure for absorbing ultraviolet rays, a structure for transmitting light energy, and a structure for generating radicals in the structure, so that a small amount, that is, a high sensitivity and a reaction to heat It is stable, and a high-sensitivity photosensitive resin composition can be designed in a small amount. In particular, from the viewpoint of light absorption of i-rays (365 nm) for an exposure light source, photopolymerization initiation of an oxime ester having an optionally substituted carbazolyl group (having a group of a substituted carbazole ring) In the case of the agent (c-1), this structural property can be favorably exhibited, which is more preferable.

目前市場上係要求遮光度高,另一方面為薄膜的BM(黑色矩陣),顏料濃度亦逐漸增高。於此種狀況下,肟酯光聚合起始劑(c-1)可有效地發揮機能。 At present, the market requires high opacity, on the other hand, the film BM (black matrix), and the pigment concentration is gradually increased. Under such conditions, the oxime ester photopolymerization initiator (c-1) can effectively function.

作為肟酯光聚合起始劑(c-1)之肟系化合物,可列舉含有下述一般式(22)所示之構造部分的化合物,較佳可列舉下述一般式(23)所示之肟酯系化合物。 The oxime compound of the oxime ester photopolymerization initiator (c-1) may, for example, be a compound having a structural moiety represented by the following general formula (22), and is preferably represented by the following general formula (23). An oxime ester compound.

上式(22),R22表示亦可分別被取代之碳數2~12之烷 醯基、碳數1~20之雜芳基烷醯基、碳數3~25之烯醯基(alkenoyl)、碳數3~8之環烷醯基、碳數3~20之烷氧基羰基烷醯基、碳數8~20之苯氧基羰基烷醯基、碳數3~20之雜芳氧基羰基烷醯基、碳數2~10之胺基烷羰基、碳數7~20之芳醯基、碳數1~20之雜芳醯基、碳數2~10之烷氧基羰基、或碳數7~20之芳氧基羰基。 In the above formula (22), R 22 represents an alkanoyl group having 2 to 12 carbon atoms, a heteroarylalkyl fluorenyl group having 1 to 20 carbon atoms, and an alkenoyl group having 3 to 25 carbon atoms. , a cycloalkyl fluorenyl group having 3 to 8 carbon atoms, an alkoxycarbonylalkyl fluorenyl group having 3 to 20 carbon atoms, a phenoxycarbonylalkyl fluorenyl group having 8 to 20 carbon atoms, and a heteroaryloxy group having 3 to 20 carbon atoms. Carbonyl alkanoyl group, aminoalkylcarbonyl group having 2 to 10 carbon atoms, aryl fluorenyl group having 7 to 20 carbon atoms, heteroaryl fluorenyl group having 1 to 20 carbon atoms, alkoxycarbonyl group having 2 to 10 carbon atoms, or carbon Number of 7 to 20 aryloxycarbonyl groups.

上式(23)中,R21a表示氫原子、或亦可分別被取代之碳數1~20之烷基、碳數2~25之烯基、碳數6~20之芳基、碳數1~20之雜芳基烷基、碳數3~20之烷氧基羰基烷基、碳數8~20之苯氧基羰基烷基、碳數1~20之雜芳氧基羰基烷基或雜芳基硫烷基、碳數1~20之胺基烷基、碳數2~12之烷醯基、碳數3~25之烯醯基、碳數3~8之環烷醯基、碳數7~20之芳醯基、碳數1~20之雜芳醯基、碳數2~10之烷氧基羰基、碳數7~20之芳氧基羰基、或碳數6~20之環烷基烷基。 In the above formula (23), R 21a represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 25 carbon atoms, an aryl group having 6 to 20 carbon atoms, and a carbon number of 1 each independently substituted. ~20 heteroarylalkyl group, alkoxycarbonylalkyl group having 3 to 20 carbon atoms, phenoxycarbonylalkyl group having 8 to 20 carbon atoms, heteroaryloxycarbonylalkyl group having 1 to 20 carbon atoms or hetero Arylsulfanyl group, aminoalkyl group having 1 to 20 carbon atoms, alkanoyl group having 2 to 12 carbon atoms, olefinic group having 3 to 25 carbon atoms, cycloalkylidene group having 3 to 8 carbon atoms, carbon number 7~20 aryl fluorenyl group, heterocyclic fluorenyl group having 1 to 20 carbon atoms, alkoxycarbonyl group having 2 to 10 carbon atoms, aryloxycarbonyl group having 7 to 20 carbon atoms, or cycloalkane having 6 to 20 carbon atoms Alkyl group.

R21b表示含有芳香環或雜芳香環的任意取代基。 R 21b represents an arbitrary substituent containing an aromatic ring or a hetero aromatic ring.

尚且,R21a亦可與R21b一起形成環,其連接基可列舉亦可分別具有取代基之碳數1~10之伸烷基、聚乙烯基[-(CH=CH)r-]或聚乙炔基[-(C≡C)r-]或組合此等而成的基。又,r為0~3之整數。 Further, R 21a may form a ring together with R 21b , and the linking group may be an alkylene group having a carbon number of 1 to 10 each having a substituent, a polyvinyl group [-(CH=CH) r -] or a poly Ethynyl [-(C≡C) r -] or a combination of such groups. Also, r is an integer from 0 to 3.

R22a表示與上式(22)中之R22相同的基。 R 22a represents the same group as R 22 in the above formula (22).

此等之中,由感度的觀點而言,作為上述一般式(22)中之R22及上述一般式(23)中之R22a,較佳可列舉碳數2~12之烷醯基、碳數1~20之雜芳基烷醯基、碳數3~8之環烷醯基;更佳可列 舉碳數2~10之烷醯基;更佳可列舉碳數2~5之烷醯基。 Among these, from the viewpoint of sensitivity, R 22 in the above general formula (22) and R 22a in the above general formula (23) are preferably an alkane group having 2 to 12 carbon atoms or carbon. a heteroarylalkyl fluorenyl group having 1 to 20 carbon atoms and a cycloalkyl fluorenyl group having 3 to 8 carbon atoms; more preferably an alkyl fluorenyl group having 2 to 10 carbon atoms; more preferably an alkyl fluorenyl group having 2 to 5 carbon atoms. .

作為上述一般式(23)中之R21a,由對溶媒之溶解性、感度的觀點而言,較佳可列舉亦可被取代之碳數1~20之烷基、亦可被取代之碳數1~10之環烷基烷基、或亦可被取代之碳數6~20之芳基。更佳為甲基、乙基、丙基、環戊基乙基、4-(2-甲氧基-1-甲基)乙氧基-2-甲基苯基或由N-乙醯基-N-乙醯氧基胺基所取代的丙基。 R 21a in the above general formula (23) is preferably an alkyl group having 1 to 20 carbon atoms which may be substituted, or a carbon number which may be substituted, from the viewpoint of solubility to a solvent and sensitivity. a cycloalkylalkyl group of 1 to 10 or an aryl group having 6 to 20 carbon atoms which may be substituted. More preferably, it is methyl, ethyl, propyl, cyclopentylethyl, 4-(2-methoxy-1-methyl)ethoxy-2-methylphenyl or by N-ethenyl- a propyl group substituted with an N-acetoxyamino group.

另外,作為上述一般式(23)中之R21b,較佳可列舉亦可被取代之咔唑基、亦可被取代之9-氧硫基或亦可被取代之苯基硫醚基。在含有亦可被取代之咔唑基作為R21b時,由上述理由而言為更佳。又,含有具硝基之咔唑基的肟酯起始劑亦屬有效。 Further, as R 21b in the above general formula (23), preferred are oxazolyl groups which may be substituted, and 9-oxosulfuric which may be substituted. A phenyl thioether group which may or may be substituted. When the carbazolyl group which may be substituted is contained as R 21b , it is more preferable for the above reasons. Further, an oxime ester initiator containing a nitrocarbazole group is also effective.

作為肟酯光聚合起始劑(c-1),含有亦可被取代之咔唑基作為R21b者係基於上述理由為較佳。更佳係具有選自包含亦可被取代之碳數6~25之芳基、亦可被取代之碳數7~25之芳基羰基、亦可被取代之碳數5~25之雜芳基、亦可被取代之碳數6~25之雜芳基羰基、及硝基之群組中的至少1種基的咔唑基。由感度之觀點而言,特佳係具有選自包含苯甲醯基、甲苯甲醯基、萘甲醯基、噻吩基羰基、及硝基之群組中的至少1種基的咔唑基。若咔唑基所亦可具有之取代基為此等,則對光聚合起始劑之感度並無較大影響,即使稍有影響,仍可藉由調整曝光量、或調整光聚合起始劑之添加量,而有可形成所需之細線的傾向。 As the oxime ester photopolymerization initiator (c-1), it is preferred to include a carbazolyl group which may be substituted as R 21b for the above reasons. More preferably, it has an aryl group selected from carbon atoms 6 to 25 which may be substituted, and an arylcarbonyl group having 7 to 25 carbon atoms which may be substituted, and a heteroaryl group having 5 to 25 carbon atoms which may be substituted. Further, a heteroarylcarbonyl group having 6 to 25 carbon atoms and a carbazolyl group having at least one group in the group of nitro groups may be substituted. From the viewpoint of sensitivity, the ligament group has at least one group selected from the group consisting of a benzamidine group, a tolylmethyl group, a naphthylmethyl group, a thienylcarbonyl group, and a nitro group. If the carbazolyl group may have a substituent for this purpose, the sensitivity of the photopolymerization initiator is not greatly affected, and even if it is slightly affected, the amount of exposure can be adjusted, or the photopolymerization initiator can be adjusted. The amount of addition is there, and there is a tendency to form a desired fine line.

又,此等基由有效率地傳達所吸收之光能量的觀點而言,較佳係鍵結於咔唑基的3位。同樣地,上式(23)中之C原子較佳係鍵結於咔唑基的6位。 Further, these groups are preferably bonded to the 3-position of the carbazolyl group from the viewpoint of efficiently communicating the absorbed light energy. Similarly, the C atom in the above formula (23) is preferably bonded to the 6 position of the carbazolyl group.

又,鍵結於咔唑基之N原子的H原子,亦可由任意取代基所 取代,由對溶媒之溶解性的觀點而言,作為任意取代基較佳為碳數1~20之烷基,更佳為碳數1~10之烷基,再更佳為碳數1~5之烷基。 Further, the H atom bonded to the N atom of the carbazolyl group may be any substituent The substitution is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, and still more preferably 1 to 5 carbon atoms, from the viewpoint of solubility in a solvent. Alkyl group.

作為此種肟酯光聚合起始劑(c-1)的市售物,有BASF公司製之OXE-02、常州強力電子公司製之TR-PBG-304、TR-PBG-314或ADEKA公司製NCI-831等。 As a commercially available product of the oxime ester photopolymerization initiator (c-1), OXE-02 manufactured by BASF Corporation, TR-PBG-304 manufactured by Changzhou Strong Electronics Co., Ltd., TR-PBG-314 or ADEKA Co., Ltd. NCI-831 and so on.

作為肟酯光聚合起始劑(c-1),本發明中較佳之肟酯系化合物,具體而言,可列舉如以下所例示的化合物,但並不限定於此等化合物。 As the oxime ester photopolymerization initiator (c-1), a preferred oxime ester compound in the present invention may, for example, be a compound exemplified below, but is not limited thereto.

[化73] [化73]

[化75] [化75]

另一方面,作為肟酯光聚合起始劑(c-1)之酮肟酯系化合物,可列舉含有下述一般式(24)所示之構造部分的化合物,較佳可列舉下述一般式(25)所示之肟酯系化合物。 On the other hand, examples of the ketoxime ester-based compound of the oxime ester photopolymerization initiator (c-1) include a compound having a structural moiety represented by the following general formula (24), and the following general formula is preferred. The oxime ester compound shown in (25).

[化76] [化76]

上述一般式(24)中,R24係與上述一般式(22)中之R22同義。 In the above general formula (24), R 24 is synonymous with R 22 in the above general formula (22).

上述一般式(25)中,R23a亦可表示分別被取代之苯基、碳數1~20之烷基、碳數2~25之烯基、碳數1~20之雜芳基烷基、碳數3~20之烷氧基羰基烷基、碳數8~20之苯氧基羰基烷基、碳數2~20之烷基硫烷基、碳數1~20之雜芳氧基羰基烷基或雜芳基硫烷基、碳數1~20之胺基烷基、碳數2~12之烷醯基、碳數3~25之烯醯基、碳數3~8之環烷醯基、碳數7~20之芳醯基、碳數1~20之雜芳醯基、碳數2~10之烷氧基羰基、碳數7~20之芳氧基羰基、或碳數6~20之環烷基烷基。 In the above general formula (25), R 23a may also represent a substituted phenyl group, an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 25 carbon atoms, or a heteroarylalkyl group having 1 to 20 carbon atoms. Alkoxycarbonylalkyl group having 3 to 20 carbon atoms, phenoxycarbonylalkyl group having 8 to 20 carbon atoms, alkylsulfanyl group having 2 to 20 carbon atoms, heteroaryloxycarbonylalkyl group having 1 to 20 carbon atoms a heteroarylsulfanyl group, an aminoalkyl group having 1 to 20 carbon atoms, an alkanoyl group having 2 to 12 carbon atoms, an olefin group having 3 to 25 carbon atoms, and a cycloalkane group having 3 to 8 carbon atoms. , an aromatic fluorenyl group having 7 to 20 carbon atoms, a heteroaryl fluorenyl group having 1 to 20 carbon atoms, an alkoxycarbonyl group having 2 to 10 carbon atoms, an aryloxycarbonyl group having 7 to 20 carbon atoms, or a carbon number of 6 to 20 a cycloalkylalkyl group.

R23b表示含有芳香環或雜芳香環的任意取代基。 R 23b represents an arbitrary substituent containing an aromatic ring or a hetero aromatic ring.

尚且,R23a亦可與R23b一起形成環,其連接基可列舉亦可分別具有取代基之碳數1~10的伸烷基、聚乙烯基[-(CH=CH)r-]或聚乙炔基[-(C≡C)r-]或組合此等而成的基。又,r為0~3之整數。 Further, R 23a may form a ring together with R 23b , and the linking group may be an alkyl group having a carbon number of 1 to 10 each having a substituent, a polyvinyl group [-(CH=CH) r -] or a poly Ethynyl [-(C≡C) r -] or a combination of such groups. Also, r is an integer from 0 to 3.

R24a表示亦可分別被取代之碳數2~12之烷醯基、碳數3~25之烯醯基、碳數4~8之環烷醯基、碳數7~20之苯甲醯基、碳數3~20之雜芳醯基、碳數2~10之烷氧基羰基、碳數7~20之芳氧基羰基、碳數2~20之雜芳基、或碳數2~20之烷胺基羰基。 R 24a represents an alkanoyl group having 2 to 12 carbon atoms, an olefin group having 3 to 25 carbon atoms, a cycloalkane group having 4 to 8 carbon atoms, and a benzamidine group having 7 to 20 carbon atoms. , a heterocyclic fluorenyl group having 3 to 20 carbon atoms, an alkoxycarbonyl group having 2 to 10 carbon atoms, an aryloxycarbonyl group having 7 to 20 carbon atoms, a heteroaryl group having 2 to 20 carbon atoms, or a carbon number of 2 to 20 An alkylaminocarbonyl group.

作為上述一般式(24)中之R24及上述一般式(25)中之 R24a,較佳可列舉碳數2~12之烷醯基、碳數1~20之雜芳基烷醯基、碳數3~8之環烷醯基或碳數7~20之芳醯基。 R 24 in the above general formula (24) and R 24a in the above general formula (25) are preferably an alkanoyl group having 2 to 12 carbon atoms or a heteroarylalkyl fluorenyl group having 1 to 20 carbon atoms. A cycloalkyl fluorenyl group having 3 to 8 carbon atoms or an aromatic fluorenyl group having 7 to 20 carbon atoms.

作為上述一般式(25)中之R23a,較佳為無取代之乙基、丙基或丁基,或經甲氧基羰基所取代的乙基或丙基。又,作為上述一般式(25)中之R23b,較佳可列舉亦可被取代之咔唑基、亦可被取代之苯基硫醚基,但含有咔唑基作為R23b者係基於上述理由,故更佳。 R 23a in the above general formula (25) is preferably an unsubstituted ethyl group, a propyl group or a butyl group, or an ethyl group or a propyl group substituted by a methoxycarbonyl group. Further, as (25) in the general formula of R 23b, can preferably include the substituted carbazolyl, the phenyl group may be substituted with a thioether group, but contains a carbazole group R 23b are as described above is based on Reason, so better.

作為肟酯光聚合起始劑(c-1),本發明中較佳之酮肟酯系化合物,具體而言,可列舉如以下例示的化合物,但並不限定於此等化合物。 As the oxime ester photopolymerization initiator (c-1), a ketone oxime ester compound which is preferable in the present invention is specifically exemplified as the compound exemplified below, but is not limited thereto.

[化78] [化78]

作為此種肟酯光聚合起始劑(c-1)的市售物,有BASF 公司製之OXE-01或常州強力電子公司製之TR-PBG-305等。 As a commercial product of such an oxime ester photopolymerization initiator (c-1), there is BASF. OXE-01 made by the company or TR-PBG-305 made by Changzhou Power Electronics Co., Ltd.

此等肟及酮肟酯系化合物本身為公知化合物,例如屬於日本專利特開2000-80068號公報、或日本專利特開2006-36750號公報記載之一系列之化合物的一種。 The oxime ketone ester-based compound itself is a known compound, and is, for example, one of the compounds described in one of the series described in JP-A-2000-80068 or JP-A-2006-36750.

上述肟酯光聚合起始劑(c-1)可單獨使用1種,亦可併用2種以上。 The above-mentioned oxime ester photopolymerization initiator (c-1) may be used alone or in combination of two or more.

<其他之光聚合起始劑> <Other photopolymerization initiators>

本發明之光聚合起始劑(c)係至少含有上述肟酯光聚合起始劑(c-1)者,但在不影響藉由使用肟酯光聚合起始劑(c-1)所得之本發明效果的範圍內,亦可併用肟酯光聚合起始劑(c-1)以外之其他光聚合起始劑(c-2)。又,視需要亦可使用加速劑、增感色素等之加成劑。 The photopolymerization initiator (c) of the present invention contains at least the above-described oxime ester photopolymerization initiator (c-1), but does not affect the use of the oxime ester photopolymerization initiator (c-1). In the range of the effects of the present invention, other photopolymerization initiators (c-2) other than the oxime ester photopolymerization initiator (c-1) may be used in combination. Further, an additive such as an accelerator or a sensitizing dye may be used as needed.

作為其他光聚合起始劑(c-2),可列舉例如日本專利特開昭59-152396號公報、日本專利特開昭61-151197號公報記載之含有二茂鈦衍生物類的二茂金屬化合物;日本專利特開2000-56118號公報記載之聯咪唑衍生物;日本專利特開平10-39503號公報記載之鹵甲基化二唑衍生物、鹵甲基-s-三衍生物、N-苯基甘胺酸等之N-芳基-α-胺基酸類、N-芳基-α-胺基酸鹽類、N-芳基-α-胺基酸酯類等之自由基活性劑或α-胺基烷基苯乙酮衍生物等。 Examples of the other photopolymerization initiator (c-2) include a metallocene containing a titanocene derivative described in JP-A-59-152396, and JP-A-61-151197. a bi-imidazole derivative described in JP-A-2000-56118, and a halomethylation described in JP-A-10-39503 Diazole derivatives, halomethyl-s-three N-aryl-α-amino acids such as derivatives and N-phenylglycine, N-aryl-α-amino acid salts, N-aryl-α-amino acid esters, etc. A radical active agent or an α-aminoalkyl acetophenone derivative or the like.

具體而言,例如作為二鈦衍生物類,可列舉二環戊二烯基二氯化鈦、二環戊二烯基聯苯基鈦、二環戊二烯基雙(2,3,4,5,6-五氟苯-1-基)鈦、二環戊二烯基雙(2,3,5,6-四氟苯-1-基)鈦、二環戊二烯基雙(2,4,6-三氟苯-1-基)鈦、二環戊二烯基二(2,6-二氟苯-1-基)鈦、二環戊二烯基二(2,4-二氟苯-1-基)鈦、二(甲基環戊二烯基)雙 (2,3,4,5,6-五氟苯-1-基)鈦、二(甲基環戊二烯基)雙(2,6-二氟苯-1-基)鈦及二環戊二烯基[2,6-二-氟-3-(吡咯-1-基)-苯-1-基)鈦等。 Specifically, for example, as the dititanium derivative, dicyclopentadienyl titanium dichloride, dicyclopentadienyl biphenyl titanium, and dicyclopentadienyl bis (2, 3, 4, 5,6-pentafluorophenyl-1-yl)titanium, dicyclopentadienyl bis(2,3,5,6-tetrafluorophenyl-1-yl)titanium, dicyclopentadienyl bis (2, 4,6-trifluorophenyl-1-yl)titanium, dicyclopentadienylbis(2,6-difluorophenyl-1-yl)titanium, dicyclopentadienyldi(2,4-difluoro Benz-1-yl)titanium, bis(methylcyclopentadienyl) double (2,3,4,5,6-pentafluorophenyl-1-yl)titanium, bis(methylcyclopentadienyl)bis(2,6-difluorophenyl-1-yl)titanium and dicyclopentane Dienyl [2,6-di-fluoro-3-(pyrrol-1-yl)-phenyl-1-yl)titanium and the like.

又,作為聯咪唑衍生物類,可列舉例如2-(2'-氯苯基)-4,5-二苯基咪唑2聚物、2-(2'-氯苯基)-4,5-雙(3'-甲氧苯基)咪唑2聚物、2-(2'-氟苯基)-4,5-二苯基咪唑2聚物、2-(2'-甲氧苯基)-4,5-二苯基咪唑2聚物及(4'-甲氧苯基)-4,5-二苯基咪唑2聚物等。 Further, examples of the biimidazole derivative include 2-(2'-chlorophenyl)-4,5-diphenylimidazole 2 polymer and 2-(2'-chlorophenyl)-4,5-. Bis(3'-methoxyphenyl)imidazole 2 polymer, 2-(2'-fluorophenyl)-4,5-diphenylimidazole 2 polymer, 2-(2'-methoxyphenyl)- 4,5-diphenylimidazole 2 polymer and (4'-methoxyphenyl)-4,5-diphenylimidazole 2 polymer.

另外,作為鹵甲基化二唑衍生物類,可列舉例如2-三氯甲基-5-(2'-苯并呋喃基)-1,3,4-二唑、2-三氯甲基-5-[β-(2'-苯并呋喃基)乙烯基]-1,3,4-二唑、2-三氯甲基-5-[β-(2'-(6"-苯并呋喃基)乙烯基)]-1,3,4-二唑及2-三氯甲基-5-呋喃基-1,3,4-二唑等。 In addition, as a halomethylation Examples of the oxadiazole derivatives include 2-trichloromethyl-5-(2'-benzofuranyl)-1,3,4- Diazole, 2-trichloromethyl-5-[β-(2'-benzofuranyl)vinyl]-1,3,4- Diazole, 2-trichloromethyl-5-[β-(2'-(6"-benzofuranyl)vinyl)]-1,3,4- Diazole and 2-trichloromethyl-5-furanyl-1,3,4- Diazole and the like.

又,作為鹵甲基-s-三衍生物類,可列舉例如2-(4-甲氧基苯基)-4,6-雙(三氯甲基)-s-三、2-(4-甲氧基萘基)-4,6-雙(三氯甲基)-s-三、2-(4-乙氧基萘基)-4,6-雙(三氯甲基)-s-三、及2-(4-乙氧基羰基萘基)-4,6-雙(三氯甲基)-s-三等。 Also, as a halomethyl-s-three Examples of the derivative include 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-three. , 2-(4-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-three , 2-(4-ethoxynaphthyl)-4,6-bis(trichloromethyl)-s-three And 2-(4-ethoxycarbonylnaphthyl)-4,6-bis(trichloromethyl)-s-three Wait.

又,作為α-胺基烷基苯乙酮衍生物類,可列舉例如2-甲基-1[4-(甲硫基)苯基]-2-啉基丙烷-1-酮、2-苄基-2-二甲烷胺基-1-(4-啉基苯基)-丁酮-1、2-苄基-2-二甲胺基-1-(4-啉基苯基)丁烷-1-酮、4-二甲胺基苯甲酸乙酯、4-二甲胺基苯甲酸異戊酯、4-二乙胺基苯乙酮、4-二甲胺基丙醯苯、2-乙基己基-1,4-二甲胺基苯甲酸酯、2,5-雙(4-二乙胺基亞苄基)環己酮、7-二乙胺基-3-(4-二乙胺基苯甲醯基)香豆素及4-(二乙胺基)查耳酮等。 Further, examples of the α-aminoalkylacetophenone derivative include 2-methyl-1[4-(methylthio)phenyl]-2- Lolinylpropan-1-one, 2-benzyl-2-dimylamino-1-(4- Phenylphenyl)-butanone-1, 2-benzyl-2-dimethylamino-1-(4- Phenylphenyl)butan-1-one, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 4-diethylaminoacetophenone, 4-dimethylamine Propionylbenzene, 2-ethylhexyl-1,4-dimethylaminobenzoate, 2,5-bis(4-diethylaminobenzylidene)cyclohexanone, 7-diethylamino -3-(4-diethylaminobenzimidyl)coumarin and 4-(diethylamino)chalcone.

其他可列舉例如苯偶姻甲基醚、苯偶姻苯基醚、苯偶姻異丁基醚、苯偶姻異丙基醚等之苯偶姻烷基醚類;2-甲基蒽醌、2-乙基蒽醌、2-第三丁基蒽醌、1-氯蒽醌等之蒽醌衍生物類;二苯 基酮、米其勒酮、2-甲基二苯基酮、3-甲基二苯基酮、4-甲基二苯基酮、2-氯二苯基酮、4-溴二苯基酮、2-羧基二苯基酮等之二苯基酮衍生物類;2,2-二甲氧基-2-苯基苯乙酮、2,2-二乙氧基苯乙酮、1-羥基環己基苯基酮、α-羥基-2-甲基苯基丙酮、1-羥基-1-甲基乙基-(對異丙基苯基)酮、1-羥基-1-(對十二烷基苯基)酮、2-甲基-(4'-甲基硫苯基)-2-啉基-1-丙酮、1,1,1-三氯甲基-(對丁基苯基)酮等之苯乙酮衍生物類;9-氧硫、2-乙基9-氧硫、2-異丙基9-氧硫、2-氯9-氧硫、2,4-二甲基9-氧硫、2,4-二乙基9-氧硫、2,4-二異丙基9-氧硫等之9-氧硫衍生物類;對二甲胺基安息香酸乙酯、對二乙胺基安息香酸乙酯等之安息香酸乙酯衍生物類;9-苯基吖啶、9-(對甲氧基苯基)吖啶等之吖啶衍生物類;9,10-二甲基苯并啡等之啡衍生物類;苯并蒽酮等之蒽酮衍生物類等。 Other examples thereof include benzoin methyl ethers such as benzoin methyl ether, benzoin phenyl ether, benzoin isobutyl ether, and benzoin isopropyl ether; 2-methylindole, Anthracene derivatives such as 2-ethyl hydrazine, 2-tert-butyl fluorene, 1-chloroindole, etc.; diphenyl ketone, micactone, 2-methyldiphenyl ketone, 3- a diphenyl ketone derivative such as methyl diphenyl ketone, 4-methyl diphenyl ketone, 2-chlorodiphenyl ketone, 4-bromodiphenyl ketone or 2-carboxydiphenyl ketone; , 2-dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, α-hydroxy-2-methylphenylacetone, 1 -hydroxy-1-methylethyl-(p-isopropylphenyl)one, 1-hydroxy-1-(p-dodecylphenyl)one, 2-methyl-(4'-methylthiobenzene Base)-2- Acetophenone derivatives such as phenyl-1-propanone, 1,1,1-trichloromethyl-(p-butylphenyl) ketone, etc.; 9-oxosulfur 2-ethyl 9-oxosulfur 2-isopropyl 9-oxosulfur 2-chloro 9-oxosulfur 2,4-dimethyl 9-oxosulfur 2,4-diethyl 9-oxosulfur 2,4-diisopropyl 9-oxosulfur 9-oxosulfur Derivatives; ethyl benzoic acid derivatives such as ethyl dimethylaminobenzoate, ethyl p-diethylammonium benzoate, etc.; 9-phenyl acridine, 9-(p-methoxyphenyl) Acridine derivatives such as acridine; 9,10-dimethylbenzophenone Brown Derivatives; anthrone derivatives such as benzofluorenone and the like.

此等其他之光聚合起始劑可僅使用1種,亦可使用2種以上。 These other photopolymerization initiators may be used alone or in combination of two or more.

<加速劑> <accelerator>

作為加速劑,可列舉例如2-巰基苯并噻唑、2-巰基苯并唑、2-巰基苯并咪唑等之具雜環之巰基化合物或脂肪族多官能巰基化合物等。加速劑可單獨使用1種,亦可組合2種以上使用。 Examples of the accelerator include 2-mercaptobenzothiazole and 2-mercaptobenzoene. a heterocyclic fluorenyl compound or an aliphatic polyfunctional fluorenyl compound such as azole or 2-mercaptobenzimidazole. The accelerator may be used singly or in combination of two or more.

<增感色素> <sensitized pigment>

於光聚合起始劑(c)中,視需要依提高感應感度的目的,可併用配合了影像曝光光源之波長的增感色素。作為此等增感色素,可列 舉:日本專利特開平4-221958號公報、日本專利特開平4-219756號公報記載之色素;日本專利特開平3-239703號公報、日本專利特開平5-289335號公報記載之具雜環的香豆素色素;日本專利特開平3-239703號公報、日本專利特開平5-289335號公報記載之3-酮香豆素化合物、日本專利特開平6-19240號公報記載之吡咯次甲基色素;其他,日本專利特開昭47-2528號公報、日本專利特開昭54-155292號公報、日本專利特公昭45-37377號公報、日本專利特開昭48-84183號公報、日本專利特開昭52-112681號公報、日本專利特開昭58-15503號公報、日本專利特開昭60-88005號公報、日本專利特開昭59-56403號公報、日本專利特開平2-69號公報、日本專利特開昭57-168088號公報、日本專利特開平5-107761號公報、日本專利特開平5-210240號公報、日本專利特開平4-288818號公報記載之具有二烷基胺基苯骨格的色素等。 In the photopolymerization initiator (c), a sensitizing dye which blends with the wavelength of the image exposure light source may be used in combination as needed for the purpose of improving the sensitivity. Examples of such sensitizing dyes include those described in JP-A-4-221958 and JP-A-4-219756. Japanese Patent Laid-Open No. Hei 3-239703, Japanese Patent Application Laid-Open No. Hei No. Hei 5-289335 Japanese Patent Application Laid-Open No. Hei. Japanese Patent Publication No. Sho 45-37377, Japanese Patent Laid-Open No. SHO-48-84183, Japanese Patent Laid-Open No. SHO-52-112681, Japanese Patent Laid-Open Publication No. SHO-58-15503 Japanese Patent Laid-Open No. Hei 59-56403, Japanese Patent Laid-Open No. Hei 2-69, Japanese Patent Laid-Open No. Hei 57-168088, Japanese Patent Laid-Open No. Hei 5-170761, Japanese Patent A dye having a dialkylamino-based phenyl skeleton or the like described in Japanese Laid-Open Patent Publication No. Hei-4-288818.

此等增感色素中,較佳為含胺基之增感色素,更佳為同一分子內具有胺基及苯基的化合物。特佳為例如4,4'-二甲胺基二苯基酮、4,4'-二乙胺基二苯基酮、2-胺基二苯基酮、4-胺基二苯基酮、4,4'-二胺基二苯基酮、3,3'-二胺基二苯基酮、3,4-二胺基二苯基酮等之二苯基酮系化合物;2-(對二甲胺基苯基)苯并唑、2-(對二乙胺基苯基)苯并唑、2-(對二甲胺基苯基)苯并[4,5]苯并唑、2-(對二甲胺基苯基)苯并[6,7]苯并唑、2,5-雙(對二乙胺基苯基)1,3,4-唑、2-(對二甲胺基苯基)苯并噻唑、2-(對二乙胺基苯基)苯并曝唑、2-(對二甲胺基苯基)苯并咪唑、2-(對乙胺基苯基)苯并咪唑、2,5-雙(對二乙胺基苯基)1,3,4-噻二唑、(對二甲胺基苯基)吡啶、(對二乙胺基苯基)吡啶、(對二甲胺基苯基)喹啉、(對二乙胺基苯基) 喹啉、(對二甲胺基苯基)嘧啶、(對二乙胺基苯基)嘧啶等之含有對二烷胺基苯基的化合物等。 Among these sensitizing dyes, an amine group-containing sensitizing dye is preferred, and a compound having an amine group and a phenyl group in the same molecule is more preferred. Particularly preferred are, for example, 4,4'-dimethylaminodiphenyl ketone, 4,4'-diethylaminodiphenyl ketone, 2-aminodiphenyl ketone, 4-aminodiphenyl ketone, a diphenyl ketone compound such as 4,4'-diaminodiphenyl ketone, 3,3'-diaminodiphenyl ketone or 3,4-diaminodiphenyl ketone; 2-(pair Dimethylaminophenyl)benzo Oxazole, 2-(p-diethylaminophenyl) benzo Oxazole, 2-(p-dimethylaminophenyl)benzo[4,5]benzo Oxazole, 2-(p-dimethylaminophenyl)benzo[6,7]benzo Azole, 2,5-bis(p-diethylaminophenyl) 1,3,4- Oxazole, 2-(p-dimethylaminophenyl)benzothiazole, 2-(p-diethylaminophenyl)benzoxazole, 2-(p-dimethylaminophenyl)benzimidazole, 2- (p-ethylaminophenyl) benzimidazole, 2,5-bis(p-diethylaminophenyl) 1,3,4-thiadiazole, (p-dimethylaminophenyl)pyridine, (pair two Ethylaminophenyl)pyridine, (p-dimethylaminophenyl)quinoline, (p-diethylaminophenyl)quinoline, (p-dimethylaminophenyl)pyrimidine, (p-diethylaminobenzene) A compound containing a p-dialkylaminophenyl group such as a pyrimidine or the like.

其中,最佳為4,4'-二烷胺基二苯基酮。 Among them, the most preferred is 4,4'-dialkylaminodiphenyl ketone.

增感色素可單獨使用1種,亦可併用2種以上。 The sensitizing dye may be used singly or in combination of two or more.

[鹼可溶性樹脂(d)] [alkali soluble resin (d)]

作為本發明之感光性樹脂組成物所應用的樹脂,係應用鹼可溶性樹脂(d)。本發明所使用之鹼可溶性樹脂(d),若為在將含有其之本發明之感光性樹脂組成物進行塗佈、乾燥而得之膜予以曝光後,曝光部與非曝光部對鹼顯影液的溶解性發生變化者,則無特別限定,較佳係具有羧基及乙烯性不飽和基之至少一者的鹼可溶性樹脂(d-1),更佳係具有羧基與乙烯性不飽和基的鹼可溶性樹脂。 As the resin to which the photosensitive resin composition of the present invention is applied, an alkali-soluble resin (d) is used. The alkali-soluble resin (d) used in the present invention is obtained by exposing a film obtained by coating and drying the photosensitive resin composition of the present invention containing the same, and exposing the exposed portion to the non-exposed portion to the alkali developing solution. The solubility of the solvent is not particularly limited, and is preferably an alkali-soluble resin (d-1) having at least one of a carboxyl group and an ethylenically unsaturated group, and more preferably a base having a carboxyl group and an ethylenically unsaturated group. Soluble resin.

具體而言,可列舉例如具有羧基之環氧基(甲基)丙烯酸酯樹脂及丙烯酸共聚合樹脂。作為較佳者,更具體而言,可列舉作為後述之環氧基(甲基)丙烯酸酯樹脂(D1-1)、環氧基(甲基)丙烯酸酯樹脂(D1-2)、丙烯酸共聚合樹脂(D2-1)、丙烯酸共聚合樹脂(D2-2)、丙烯酸共聚合樹脂(D2-3)及丙烯酸共聚合樹脂(D2-4)所記載者。此等可使用1種或2種以上。 Specifically, for example, an epoxy group (meth) acrylate resin having a carboxyl group and an acrylic copolymer resin can be mentioned. More specifically, an epoxy group (meth) acrylate resin (D1-1), an epoxy (meth) acrylate resin (D1-2), and an acrylic acid copolymer which will be described later are mentioned. Resin (D2-1), acrylic copolymer resin (D2-2), acrylic copolymer resin (D2-3), and acrylic copolymer resin (D2-4). These may be used alone or in combination of two or more.

上述之中,特佳為具有羧基之環氧基(甲基)丙烯酸酯樹脂。其理由如以下所述。 Among the above, an epoxy group (meth) acrylate resin having a carboxyl group is particularly preferred. The reason is as follows.

鹼可溶性樹脂(d)係於本發明所使用之含有上述具胺基甲酸乙酯骨架與親溶媒基及吸附基的聚胺基甲酸酯分散劑(b-1)、與溶劑(e)的感光性樹脂組成物中,可良好地相溶,聚胺基甲酸酯分散劑(b-1)之聚醚鏈及/或聚酯鏈與高分子之鹼可溶性樹脂(d) 係成為防止色材(a)凝集的立體障礙部,保持良好的分散狀態。 The alkali-soluble resin (d) is a polyurethane dispersant (b-1) containing the above-described urethane skeleton and a solvate group and an adsorbing group used in the present invention, and a solvent (e) The photosensitive resin composition is well compatible, and the polyether chain and/or the polyester chain of the polyurethane dispersant (b-1) and the alkali-soluble resin of the polymer (d) It is a steric obstacle that prevents aggregation of the color material (a) and maintains a good dispersion state.

又,在製作彩色濾光片時,藉由良好相溶之聚胺基甲酸酯分散劑(b-1)的聚醚鏈及/或聚酯鏈與高分子之鹼可溶性樹脂(d)交纏,或者聚胺基甲酸酯分散劑(b-1)之吸附基或聚胺基甲酸酯骨架吸附於色材(a),而攝入耐性高之色材(a),則鹼顯影時或其後之高溫處理時,因鹼顯影液之浸蝕或熱所造成的變形較小。 Further, in the production of the color filter, the polyether chain and/or the polyester chain of the well-miscible polyurethane dispersant (b-1) is mixed with the alkali-soluble resin (d) of the polymer. The adsorption or the polyurethane skeleton of the entangled or polyurethane emulsifier (b-1) is adsorbed to the color material (a), and the color material (a) with high tolerance is ingested. At the time of high temperature treatment at or after the time, the deformation due to the etching or heat of the alkali developing solution is small.

又,在彩色濾光片製作時,在非曝光部溶解於鹼顯影液時,作為黏結劑樹脂,係應用具有羥基、羧基、磷酸基、磺酸基等酸性官能基的鹼可溶性樹脂。尤其在鹼可溶性樹脂具有羧基的情況,相較於具有羥基的情況,有更容易溶解於鹼顯影液的傾向。 Further, in the production of a color filter, when the non-exposed portion is dissolved in the alkali developing solution, an alkali-soluble resin having an acidic functional group such as a hydroxyl group, a carboxyl group, a phosphoric acid group or a sulfonic acid group is used as the binder resin. In particular, when the alkali-soluble resin has a carboxyl group, it tends to be more soluble in the alkali developer than in the case of having a hydroxyl group.

又,磷酸基或磺酸基係酸性度較羧基高,但容易與感光性樹脂組成物中之具有鹼性的光聚合起始劑、光聚合性單體、分散劑、其他添加劑反應,而有保存穩定性惡化的情形。 Further, the phosphate group or the sulfonic acid group has a higher acidity than the carboxyl group, but is easily reacted with a photopolymerization initiator, a photopolymerizable monomer, a dispersant, and other additives having a basicity in the photosensitive resin composition. The situation in which the stability is deteriorated.

又,在鹼可溶性樹脂之酸性基為羧基時,不致影響分散,與分散劑(b)呈弱親和,有抑制因鹼顯影時之鹼顯影液所造成的浸蝕、或其後之高溫處理時之熱所造成的變形的傾向。 Further, when the acidic group of the alkali-soluble resin is a carboxyl group, it does not affect the dispersion, and has a weak affinity with the dispersing agent (b), and suppresses the etching by the alkali developing solution during alkali development, or the subsequent high-temperature treatment. The tendency of deformation caused by heat.

再者,在鹼可溶性樹脂具有乙烯性不飽和基的情況,藉由紫外線照射進行交聯,上述聚胺基甲酸酯分散劑(b-1)之聚醚鏈及/或聚酯鏈與鹼可溶性樹脂(d)的交纏變得更加牢固,有紫外線照射部之鹼顯影液耐性及耐熱性變得非常大的傾向。 Further, in the case where the alkali-soluble resin has an ethylenically unsaturated group, crosslinking is carried out by ultraviolet irradiation, and the polyether chain and/or the polyester chain and the base of the above-mentioned polyurethane dispersant (b-1) are mixed. The entanglement of the soluble resin (d) is further enhanced, and the alkali developer resistance and heat resistance of the ultraviolet ray irradiation portion tend to be extremely large.

又,在鹼可溶性樹脂(d)具有乙烯性不飽和基的情況,可使因併用聚胺基甲酸酯分散劑(b-1)與肟酯光聚合起始劑(c-1)所得效果更加提升。 Further, in the case where the alkali-soluble resin (d) has an ethylenically unsaturated group, the effect of using the polyurethane dispersant (b-1) and the oxime ester photopolymerization initiator (c-1) can be obtained. More improved.

尤其是在紫外線不易到達之基板與細線圖案間之接 黏部分或在紫外線曝光時因遮罩使紫外線被遮光而變弱的細線圖案之側面部,藉由併用具有乙烯性不飽和基之鹼可溶性樹脂與聚胺基甲酸酯分散劑(b-1)及肟酯光聚合起始劑(c-1),有相乘性地提高鹼顯影液耐性與耐熱性、容易形成高細微之細線的傾向。 Especially in the connection between the substrate and the fine line pattern that is difficult to reach by ultraviolet rays. The side portion of the fine line pattern which is weakened by the ultraviolet light being blocked by the mask during the ultraviolet exposure, by using an alkali-soluble resin having an ethylenically unsaturated group and a polyurethane dispersant (b-1) And the oxime ester photopolymerization initiator (c-1) tends to multiply the alkali developer resistance and heat resistance, and tends to form fine lines.

又,在使用環氧基(甲基)丙烯酸酯樹脂作為具有羧基與乙烯性不飽和基的鹼可溶性樹脂時,可於樹脂中較多地加成不飽和基或羧基。又,可較多地導入芳香環構造、或導入立體體積較大的脂環式構造,而可更進一步提升耐鹼顯影液性及耐熱性。 Further, when an epoxy group (meth) acrylate resin is used as the alkali-soluble resin having a carboxyl group and an ethylenically unsaturated group, an unsaturated group or a carboxyl group can be added to the resin in a large amount. Further, the aromatic ring structure can be introduced in a large amount or the alicyclic structure having a large solid volume can be introduced, and the alkali-resistant developing liquid property and heat resistance can be further improved.

<環氧基(甲基)丙烯酸酯樹脂> <Epoxy (meth) acrylate resin>

作為具有羧基之環氧基(甲基)丙烯酸酯樹脂,可列舉例如以下之環氧基(甲基)丙烯酸酯樹脂(D1-1)及/或環氧基(甲基)丙烯酸酯樹脂(D1-2)。 Examples of the epoxy group-containing (meth) acrylate resin having a carboxyl group include the following epoxy (meth) acrylate resin (D1-1) and/or epoxy (meth) acrylate resin (D1). -2).

<環氧基(甲基)丙烯酸酯樹脂(D1-1)> <Epoxy (meth) acrylate resin (D1-1)>

藉由於環氧樹脂中使α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯加成,進而使多元酸及其酐之至少一者反應,所獲得之環氧基(甲基)丙烯酸酯樹脂。 A ring obtained by reacting an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group in an epoxy resin to further react at least one of a polybasic acid and an anhydride thereof An oxy (meth) acrylate resin.

<環氧基(甲基)丙烯酸酯樹脂(D1-2)> <Epoxy (meth) acrylate resin (D1-2)>

藉由於環氧樹脂中使α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯加成,進而使多元醇、與多元酸及其酐之至少一者反應,所獲得的環氧基(甲基)丙烯酸酯樹脂。 By reacting an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group in an epoxy resin, and further reacting at least one of a polyhydric alcohol and a polybasic acid and an anhydride thereof, The epoxy (meth) acrylate resin obtained.

作為成為環氧基(甲基)丙烯酸酯樹脂(D-1)及環氧基 (甲基)丙烯酸酯樹脂(D-2)之原料的環氧樹脂,可列舉例如雙酚A型環氧樹脂(例如三菱化學公司製之「Epikote(註冊商標。以下相同。)828」、「Epikote 1001」、「Epikote 1002」、「Epikote 1004」等)、藉由雙酚A型環氧樹脂之醇性羥基與表氯醇之反應所得的環氧基(例如,日本化藥公司製之「NER-1302」(環氧當量323,軟化點76℃))、雙酚F型樹脂(例如,三菱化學公司製之「Epikote 807」、「EP-4001」、「EP-4002」、「EP4004等」)、雙酚F型環氧樹脂之醇性羥基與表氯醇之反應所得的環氧樹脂(例如,日本化藥公司製之「NER-7406」(環氧當量350,軟化點66℃))、雙酚S型環氧樹脂、聯苯基環氧丙基醚(例如,三菱化學公司製之「YX-4000」)、酚系酚醛清漆型環氧樹脂(例如,日本化藥公司製之「EPPN-201」、三菱化學公司製之「EP-152」、「EP-154」、DOW CHEMICAL公司製之「DEN-438」)、(鄰,間,對-)甲酚酚醛清漆型環氧樹脂(例如,日本化藥公司製「EOCN(註冊商標。以下相同。)-102S」、「EOCN-1020」、「EOCN-104S」)、三環氧丙基三聚異氰酸酯(例如,日產化學公司製之「TEPIC(註冊商標)」、三酚甲烷型環氧樹脂(例如,日本化藥公司製之「EPPN(註冊商標。以下相同。)-501」、「EPN-502」、「EPPN-503」、脂環式環氧樹脂(DAICEL化學工業公司製之「Celloxide(註冊商標。以下相同。)2021P」、「Celloxide EHPE」)、將由二環戊二烯與酚之反應所得的酚樹脂進行環氧丙基化的環氧樹脂(例如,大日本油墨公司製之「EXA-7200」、日本化藥公司製之「NC-7300」)及下述一般式(d1)~(d4)所示之環氧樹脂等。 As the epoxy (meth) acrylate resin (D-1) and epoxy group For the epoxy resin of the raw material of the (meth) acrylate resin (D-2), for example, a bisphenol A type epoxy resin (for example, "Epikote (registered trademark. The same applies hereinafter) 828" manufactured by Mitsubishi Chemical Corporation, " Epikote 1001", "Epikote 1002", "Epikote 1004", etc.), an epoxy group obtained by the reaction of an alcoholic hydroxyl group of a bisphenol A type epoxy resin with epichlorohydrin (for example, manufactured by Nippon Kayaku Co., Ltd.) NER-1302" (epoxy equivalent 323, softening point 76 °C)), bisphenol F type resin (for example, "Epikote 807", "EP-4001", "EP-4002", "EP4004, etc., manufactured by Mitsubishi Chemical Corporation ") An epoxy resin obtained by the reaction of an alcoholic hydroxyl group of a bisphenol F-type epoxy resin with epichlorohydrin (for example, "NER-7406" manufactured by Nippon Kayaku Co., Ltd. (epoxy equivalent 350, softening point 66 ° C) ), bisphenol S type epoxy resin, biphenyl epoxy propyl ether (for example, "YX-4000" manufactured by Mitsubishi Chemical Corporation), and phenol novolak type epoxy resin (for example, manufactured by Nippon Kayaku Co., Ltd.) "EPPN-201", "EP-152" manufactured by Mitsubishi Chemical Corporation, "EP-154", "DEN-438" manufactured by DOW CHEMICAL), (oight, inter, and -) A novolac type epoxy resin (for example, "EOCN (registered trademark. The same as below) -102S", "EOCN-1020", "EOCN-104S") manufactured by Nippon Kayaku Co., Ltd., and triepoxypropyl trimeric isocyanate ( For example, "TEPIC (registered trademark)" manufactured by Nissan Chemical Co., Ltd., and a trisphenol-based epoxy resin (for example, "EPPN (registered trademark. The same applies below)-501" and "EPN-502" manufactured by Nippon Kayaku Co., Ltd. "EPPN-503", alicyclic epoxy resin ("Celloxide (registered trademark: the same below) 2021P", "Celloxide EHPE") manufactured by DAICEL Chemical Industry Co., Ltd., which is obtained by the reaction of dicyclopentadiene with phenol. Epoxy resin which is epoxidized by phenol resin (for example, "EXA-7200" manufactured by Dainippon Ink Co., Ltd., "NC-7300" manufactured by Nippon Kayaku Co., Ltd.) and the following general formula (d1)~( D4) The epoxy resin shown.

具體而言,可列舉例如,作為下述一般式(d1)所示之環氧樹脂的日本化藥公司製之「XD-1000」、下述一般式(d2)所示之 環氧樹脂的日本化藥公司製之「NC-3000」及下述一般式(d4)所示之環氧樹脂的新日鐵化學公司製之「ESF-300」等。 Specifically, for example, "XD-1000" manufactured by Nippon Kayaku Co., Ltd., which is an epoxy resin represented by the following general formula (d1), and the following general formula (d2) are shown. "NC-3000" manufactured by Nippon Kayaku Co., Ltd., and "ESF-300" manufactured by Nippon Steel Chemical Co., Ltd., which is an epoxy resin shown in the following general formula (d4).

上述一般式(d1)中,b11表示平均值、且表示0~10之數。R11表示氫原子、鹵原子、碳數1~8之烷基、碳數3~10之環烷基、苯基、萘基、或聯苯基。又,1分子中存在的複數的R11可彼此為相同或相異。 In the above general formula (d1), b11 represents an average value and represents a number of 0 to 10. R 11 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group or a biphenyl group. Further, the plural R 11 present in one molecule may be the same or different from each other.

上述一般式(d2)中,b12表示平均值、且表示0~10之數。R21表示氫原子、鹵原子、碳數1~8之烷基、碳數3~10之環烷基、苯基、萘基、或聯苯基。又,1分子中存在的複數的R21可彼此為相同或相異。 In the above general formula (d2), b12 represents an average value and represents a number of 0 to 10. R 21 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group or a biphenyl group. Further, the plural R 21 present in one molecule may be the same or different from each other.

上述一般式(d3)中,X表示下述一般式(d3-1)或(d3-2) 所示的連接基。其中,於分子構造中含有1個以上之金剛烷構造。b13表示2或3之整數。 In the above general formula (d3), X represents the following general formula (d3-1) or (d3-2) The linker shown. Among them, one or more adamantane structures are contained in the molecular structure. B13 represents an integer of 2 or 3.

上述一般式(d3-1)及(d3-2)中,R31~R34及R35~R37分別獨立表示亦可具有取代基之金剛烷基、氫原子、亦可具有取代基之碳數1~12之烷基、或亦可具有取代基之苯基。又,各式中之*記號係表示(d3)中之鍵結部位。 In the above general formulas (d3-1) and (d3-2), R 31 to R 34 and R 35 to R 37 each independently represent an adamantyl group which may have a substituent, a hydrogen atom, and a carbon which may have a substituent. An alkyl group having 1 to 12 alkyl groups or a phenyl group which may have a substituent. Further, the * mark in each formula indicates the bonding portion in (d3).

上述一般式(d4)中,p及q分別獨立表示0~4之整數,R41及R42分別獨立表示烷基或鹵原子。R43及R44分別獨立表示伸烷基。x及y分別獨立表示0以上的整數。 In the above general formula (d4), p and q each independently represent an integer of 0 to 4, and R 41 and R 42 each independently represent an alkyl group or a halogen atom. R 43 and R 44 each independently represent an alkylene group. x and y each independently represent an integer of 0 or more.

此等之中,較佳係使用一般式(d1)~(d4)之任一者所表示的環氧樹脂。 Among these, an epoxy resin represented by any one of the general formulas (d1) to (d4) is preferably used.

作為α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯,可列舉例如(甲基)丙烯酸、丁烯酸、鄰-、間-、對-乙烯基安息香酸、(甲基)丙烯酸之α位鹵烷基、烷氧基、鹵素、硝基、氰基取代物等之單羧酸、2-(甲基)丙烯醯氧基乙基琥珀酸、2-(甲基)丙烯醯氧基乙基己二酸、2-(甲基)丙烯醯氧基乙基酞酸、2-(甲基)丙烯醯 氧基乙基六氫酞酸、2-(甲基)丙烯醯氧基乙基順丁烯二酸、2-(甲基)丙烯醯氧基丙基琥珀酸、2-(甲基)丙烯醯氧基丙基己二酸、2-(甲基)丙烯醯氧基丙基四氫酞酸、2-(甲基)丙烯醯氧基丙基酞酸、2-(甲基)丙烯醯氧基丙基順丁烯二酸、2-(甲基)丙烯醯氧基丁基琥珀酸、2-(甲基)丙烯醯氧基丁基己二酸、2-(甲基)丙烯醯氧基丁基氫酞酸、2-(甲基)丙烯醯氧基丁基酞酸、2-(甲基)丙烯醯氧基丁基順丁烯二酸、於丙烯酸中加成了ε-己內酯、β-丙內酯、γ-丁內酯、δ-戊內酯等之內酯類的單體,或於羥烷基(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯中加成了琥珀酸(酐)、酞酸(酐)、順丁烯二酸(酐)等之酸(酐)的單體及(甲基)丙烯酸二聚物等。 Examples of the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group include (meth)acrylic acid, crotonic acid, o-, m-, p-vinylbenzoic acid. a monocarboxylic acid such as an α-haloalkyl group of an (meth)acrylic acid, an alkoxy group, a halogen, a nitro group, a cyano substituent, or the like, 2-(meth)acryloxyethyl succinic acid, 2-( Methyl) propylene methoxyethyl adipate, 2-(methyl) propylene methoxyethyl phthalic acid, 2-(methyl) propylene hydride Oxyethylhexahydrophthalic acid, 2-(methyl)propenyloxyethyl maleate, 2-(methyl)propenyloxypropyl succinic acid, 2-(methyl)acrylic acid Oxypropyl adipic acid, 2-(methyl) propylene methoxy propyl tetrahydro decanoic acid, 2-(methyl) propylene methoxy propyl decanoic acid, 2-(methyl) propylene fluorenyloxy Propyl maleic acid, 2-(methyl) propylene decyloxybutyl succinic acid, 2-(methyl) propylene methoxy butyl adipate, 2-(methyl) propylene oxy butyl Hydrogen hydrazine, 2-(methyl) propylene oxy butyl phthalic acid, 2-(methyl) propylene oxy butyl maleic acid, ε-caprolactone added to acrylic acid, β- a lactone monomer such as propyl lactone, γ-butyrolactone or δ-valerolactone, or succinic acid added to hydroxyalkyl (meth) acrylate or pentaerythritol tri (meth) acrylate A monomer (acid anhydride) such as (anhydride), citric acid (anhydride) or maleic acid (anhydride), and a (meth)acrylic acid dimer.

此等之中,由感度的觀點而言,特佳為(甲基)丙烯酸。 Among these, from the viewpoint of sensitivity, (meth)acrylic acid is particularly preferred.

作為對環氧樹脂加成α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯的方法,可使用公知手法。例如,可在酯化觸媒的存在下,依50~150℃之溫度,使α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯與環氧樹脂進行反應。 As a method of adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, a known method can be used. For example, an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid having a carboxyl group can be reacted with an epoxy resin in the presence of an esterification catalyst at a temperature of 50 to 150 ° C. .

作為此處所使用之酯化觸媒,可使用例如三乙胺、三甲胺、苄基二甲胺及苄基二乙胺等之3級胺,以及四甲基氯化銨、四乙基氯化銨、十二烷基三甲基氯化銨等之4級銨鹽等。 As the esterification catalyst used herein, a tertiary amine such as triethylamine, trimethylamine, benzyldimethylamine or benzyldiethylamine, and tetramethylammonium chloride or tetraethylchlorinated can be used. A grade 4 ammonium salt such as ammonium or dodecyltrimethylammonium chloride.

尚且,環氧樹脂、α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯,以及酯化觸媒,可單獨使用任1種,亦可併用2種以上。 Further, the epoxy resin, the α,β-unsaturated monocarboxylic acid, or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group, and the esterification catalyst may be used alone or in combination of two or more.

α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯的使用量,係相對於環氧樹脂之環氧基1當量,較佳為0.5~1.2當量之範圍、更佳為0.7~1.1當量之範圍。 The α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group is used in an amount of from 1 to 1.2 equivalents per 1 equivalent of the epoxy group of the epoxy resin. More preferably, it is in the range of 0.7 to 1.1 equivalents.

α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯的使用量若較少,則不飽和基之導入量不足,接著與多元酸及/或其酐的反應亦不足。 If the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group is used in a small amount, the amount of the unsaturated group introduced is insufficient, and then the reaction with the polybasic acid and/or its anhydride is carried out. Not enough.

又,殘存多量之環氧基的情況亦不利。另一方面,若該使用量較多,則α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯依未反應物之型式殘存。認定任一情況下均有硬化特性惡化的傾向。 Further, it is also disadvantageous in the case where a large amount of epoxy groups remain. On the other hand, when the amount used is large, the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group remains in the form of an unreacted product. It is considered that there is a tendency for the hardening characteristics to deteriorate in either case.

作為多元酸及/或其酐,可列舉例如選自順丁烯二酸、琥珀酸、伊康酸、酞酸、四氫酞酸、六氫酞酸、焦蜜石酸、偏苯三甲酸、二苯基酮四羧酸、甲基六氫酞酸、內亞甲基四氫酞酸、氯橋酸、甲基四氫酞酸及聯苯基四羧酸以及此等之酐等的1種或2種以上。 Examples of the polybasic acid and/or its anhydride include, but are selected from the group consisting of maleic acid, succinic acid, itaconic acid, citric acid, tetrahydrofurfuric acid, hexahydrophthalic acid, pyrogal acid, and trimellitic acid. One of diphenyl ketone tetracarboxylic acid, methyl hexahydrophthalic acid, endomethylene tetrahydrofurfuric acid, chlorohatchanoic acid, methyltetrahydrofurfuric acid, biphenyltetracarboxylic acid, and the like Or two or more.

較佳係順丁烯二酸、琥珀酸、伊康酸、酞酸、四氫酞酸、六氫酞酸、焦蜜石酸、偏苯三甲酸或聯苯基四羧酸、或此等之酐。特佳為四氫酞酸、聯苯基四羧酸、四氫酞酸酐、或聯苯基四羧酸二酐。 Preferred are maleic acid, succinic acid, itaconic acid, citric acid, tetrahydrofurfuric acid, hexahydrophthalic acid, pyrogalic acid, trimellitic acid or biphenyltetracarboxylic acid, or the like. anhydride. Particularly preferred is tetrahydrofurfuric acid, biphenyltetracarboxylic acid, tetrahydrophthalic anhydride, or biphenyltetracarboxylic dianhydride.

關於多元酸及/或其酐之加成反應,可使用公知手法,在與對環氧樹脂之α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯的加成反應相同的條件下,可繼續反應而得到目標物。 With respect to the addition reaction of the polybasic acid and/or its anhydride, a known method can be used, in addition to the α,β-unsaturated monocarboxylic acid of the epoxy resin or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group. Under the same conditions of the reaction, the reaction can be continued to obtain a target.

多元酸及/或其酐成分的加成量,較佳係所生成之含羧基之環氧基(甲基)丙烯酸酯樹脂的酸價為10~150mgKOH/g之範圍的程度,更佳係20~140mgKOH/g之範圍的程度。 The amount of addition of the polybasic acid and/or its anhydride component is preferably such that the acid value of the carboxyl group-containing epoxy (meth) acrylate resin formed is in the range of 10 to 150 mgKOH/g, more preferably 20 The extent of the range of ~140 mg KOH / g.

若含羧基之環氧基(甲基)丙烯酸酯樹脂的酸價為未滿上述範圍,有缺乏鹼顯影性之傾向,又,若超過上述範圍,認定 有硬化性能劣化的傾向。 When the acid value of the carboxyl group-containing epoxy (meth) acrylate resin is less than the above range, there is a tendency to lack alkali developability, and if it exceeds the above range, it is determined There is a tendency for the hardening property to deteriorate.

尚且,在多元酸及/或其酐之加成反應合成時,亦可添加三羥甲基丙烷、季戊四醇、二季戊四醇等之多元醇,作為經導入多分岐構造者。 Further, in the case of addition reaction of a polybasic acid and/or an anhydride thereof, a polyhydric alcohol such as trimethylolpropane, pentaerythritol or dipentaerythritol may be added as a structure into which a multi-tiller structure is introduced.

環氧基(甲基)丙烯酸酯樹脂(D1-1)、(D1-2)通常係藉由於環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯的反應物中,混合多元酸及/或其酐後,或者於環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之反應物中,混合多元酸及/或其酐及多元醇後,予以加溫而獲得。 The epoxy (meth) acrylate resins (D1-1) and (D1-2) are usually derived from an epoxy resin and an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid having a carboxyl group. The reactant of the acid ester, after mixing the polybasic acid and/or its anhydride, or in the reaction of the epoxy resin with the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group After mixing a polybasic acid and/or its anhydride and a polyhydric alcohol, it is obtained by heating.

此時,多元酸及/或其酐與多元醇的混合順序,並無特別限制。藉由加溫,對於環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯的反應物、及與多元醇的混合物中所存在的任一羥基,使多元酸及/或其酐進行加成反應。 At this time, the order of mixing the polybasic acid and/or its anhydride with the polyol is not particularly limited. By heating, any reactant of the epoxy resin and the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group, and any hydroxyl group present in the mixture with the polyol The polyacid and/or its anhydride are subjected to an addition reaction.

多元醇之使用量,若過少則效果較薄;若過多則有增黏或凝膠化之可能性,故相對於環氧樹脂與α,β-不飽和單羧酸或於酯部分與具有羧基之α,β-不飽和單羧酸酯的反應物,通常為0.01~0.5質量份左右、較佳為0.02~0.2質量倍左右。 If the amount of the polyol is too small, the effect is thin; if too much, there is a possibility of thickening or gelation, so the epoxy resin and the α,β-unsaturated monocarboxylic acid or the ester moiety and the carboxyl group are The reactant of the α,β-unsaturated monocarboxylic acid ester is usually about 0.01 to 0.5 parts by mass, preferably about 0.02 to 0.2 times by mass.

如此所得之環氧基(甲基)丙烯酸酯樹脂(D1-1)、(D1-2)的酸價,通常為10mgKOH/g以上、較佳為50mgKOH/g以上。酸價未滿10mgKOH/g時,有顯影性不足的情形。 The acid value of the epoxy group (meth) acrylate resins (D1-1) and (D1-2) thus obtained is usually 10 mgKOH/g or more, preferably 50 mgKOH/g or more. When the acid value is less than 10 mgKOH/g, the developability may be insufficient.

又,若酸價過高,有於感光性樹脂組成物之鹼耐性發生問題(亦即,視鹼性顯影液,發生圖案表面之粗面化或膜減少)的情形,故酸價較佳為200mgKOH/g以下、更佳為150mgKOH/g以下。 Further, when the acid value is too high, there is a problem that the alkali resistance of the photosensitive resin composition occurs (that is, depending on the alkaline developing solution, the surface of the pattern is roughened or the film is reduced), so the acid value is preferably 200 mgKOH/g or less, more preferably 150 mgKOH/g or less.

環氧基(甲基)丙烯酸酯樹脂(D1-1)、(D1-2)之凝膠滲 透層析(GPC)測定所得之聚苯乙烯換算的重量平均分子量(Mw),較佳為1,000以上、更佳為1,500以上。且,較佳為10,000以下、更佳為8,000以下、再更佳為6,000以下。重量平均分子量(Mw)若過小,有感度、塗膜強度或鹼耐性發生問題的可能性;若過大,有顯影性或再溶解性發生問題的情形。 Gel permeation of epoxy (meth) acrylate resins (D1-1) and (D1-2) The polystyrene-equivalent weight average molecular weight (Mw) obtained by a transmission chromatography (GPC) is preferably 1,000 or more, and more preferably 1,500 or more. Further, it is preferably 10,000 or less, more preferably 8,000 or less, still more preferably 6,000 or less. If the weight average molecular weight (Mw) is too small, there is a possibility that the sensitivity, the coating film strength or the alkali resistance may occur; if it is too large, there is a problem that developability or resolubility occurs.

<丙烯酸共聚合樹脂> <Acrylic copolymer resin>

作為丙烯酸共聚合樹脂,可使用例如日本專利特開平7-207211號公報、日本專利特開平8-259876號公報、日本專利特開平10-300922號公報、日本專利特開11-140144號公報、日本專利特開平11-174224號公報、日本專利特開2000-56118號公報、日本專利特開2003-233179號公報、日本專利特開2007-270147號公報等各公報所記載的各種高分子化合物;較佳可列舉以下之(D2-1)~(D2-4)之樹脂等。其中,(D2-1)~(D2-4)之樹脂中,較佳為(D2-1)與(D2-3)之樹脂。 As the acrylic copolymer resin, for example, Japanese Patent Laid-Open No. Hei 7-207211, Japanese Patent Laid-Open No. Hei 8-259876, Japanese Patent Laid-Open No. Hei 10-300922, Japanese Patent Laid-Open No. Hei 11-140144, and Japan Various polymer compounds described in each of the publications of JP-A-H07-174224, JP-A-2000-56118, JP-A-2003-233179, and JP-A-2007-270147; The following may be listed as the resin of (D2-1) to (D2-4). Among them, among the resins of (D2-1) to (D2-4), the resins of (D2-1) and (D2-3) are preferred.

(D2-1):對於含有環氧基之(甲基)丙烯酸酯、與其他自由基聚合性單體的共聚合體,於該共聚合體所具有之環氧基之至少一部分使不飽和一元酸加成而成的樹脂,或於藉該加成反應所產生之羥基之至少一部分使多元酸酐加成而得的樹脂(以下有時稱為「(D2-1)樹脂」。) (D2-1): a copolymer of an epoxy group-containing (meth) acrylate and another radical polymerizable monomer, wherein at least a part of the epoxy group of the copolymer has an unsaturated monobasic acid A resin obtained by adding a polybasic acid anhydride to at least a part of a hydroxyl group generated by the addition reaction (hereinafter referred to as "(D2-1) resin").

(D2-2):於主鏈含有羧基之直鏈狀鹼可溶性樹脂(以下有時稱為「(D2-2)樹脂」。) (D2-2): a linear alkali-soluble resin having a carboxyl group in its main chain (hereinafter sometimes referred to as "(D2-2) resin").

(D2-3):於上述(D2-2)樹脂之羧基部分,使含有環氧基之不飽和化 合物加成的樹脂(以下有時稱為「(D2-3)樹脂」。) (D2-3): Desaturation of an epoxy group in the carboxyl group of the above (D2-2) resin Resin added as a compound (hereinafter referred to as "(D2-3) resin").

(D2-4):(甲基)丙烯酸系樹脂(以下有時稱為「(D2-4)樹脂」。) (D2-4): (meth)acrylic resin (hereinafter referred to as "(D2-4) resin").

尚且,上述(D2-1)樹脂亦涵括於環氧基(甲基)丙烯酸酯樹脂之概念。 Further, the above (D2-1) resin is also included in the concept of an epoxy (meth) acrylate resin.

以下,針對此等之各樹脂進行說明。 Hereinafter, each of these resins will be described.

<(D2-1)樹脂> <(D2-1) Resin>

(D2-1)作為對於含有環氧基之(甲基)丙烯酸酯、與其他自由基聚合性單體的共聚合體,於該共聚合體所具有之環氧基之至少一部分使不飽和一元酸加成而成的樹脂,或於藉該加成反應所產生之羥基之至少一部分使多元酸酐加成而得的樹脂,更具體而言,可列舉「對於含有環氧基之(甲基)丙烯酸酯5~90莫耳%、與其他自由基聚合性單體10~95莫耳%的共聚合體,於該共聚合體所具有之環氧基之10~100莫耳%使不飽和一元酸加成而成的樹脂,或於藉該加成反應所產生之羥基之10~100莫耳%進一步使多元酸酐加成而得的樹脂」。 (D2-1) As a copolymer of an epoxy group-containing (meth) acrylate and another radical polymerizable monomer, at least a part of the epoxy group of the copolymer has an unsaturated monobasic acid The resin to be obtained, or a resin obtained by adding a polybasic acid anhydride to at least a part of the hydroxyl group generated by the addition reaction, more specifically, "for the epoxy group-containing (meth) acrylate a copolymer of 5 to 90 mol% and 10 to 95 mol% of other radical polymerizable monomers, and an unsaturated monobasic acid is added in an amount of 10 to 100 mol% of the epoxy group of the copolymer. The resin to be obtained, or a resin obtained by further adding a polybasic acid anhydride to 10 to 100 mol% of the hydroxyl group produced by the addition reaction.

作為構成(D2-1)樹脂的「含有環氧基之(甲基)丙烯酸酯」,可列舉例如(甲基)丙烯酸環氧丙酯、(甲基)丙烯酸3,4-環氧基丁酯、(甲基)丙烯酸(3,4-環氧基環己基)甲酯、(甲基)丙烯酸4-羥基丁酯環氧丙基醚等。其中,較佳為(甲基)丙烯酸環氧丙酯。此等之含有環氧基之(甲基)丙烯酸酯可單獨使用1種,亦可併用2種以上。 Examples of the "epoxy group-containing (meth) acrylate" constituting the (D2-1) resin include, for example, glycidyl (meth)acrylate and 3,4-epoxybutyl (meth)acrylate. And (3,4-epoxycyclohexyl)methyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, glycidyl ether, and the like. Among them, preferred is glycidyl (meth)acrylate. These epoxy group-containing (meth) acrylates may be used alone or in combination of two or more.

作為與上述含環氧基之(甲基)丙烯酸酯進行共聚合的其他之自由基聚合性單體,較佳係具有下述一般式(11)所示構造的單(甲基)丙烯酸酯。 The other radical polymerizable monomer which is copolymerized with the epoxy group-containing (meth) acrylate is preferably a mono(meth)acrylate having a structure represented by the following general formula (11).

上述一般式(11)中,R81~R88分別獨立表示氫原子、或碳數1~3之烷基,R87及R88亦可彼此連接形成環。上述一般式(11)中,R87與R88連接所形成之環較佳為脂肪族環,可為飽和或不飽和之任一種,碳數較佳為5~6。 In the general formula (11), R 81 ~ R 88 each independently represent a hydrogen atom, or an alkyl group having a carbon number of 1 to 3, R 87 and R 88 may also be connected to each other to form a ring. In the above general formula (11), the ring formed by linking R 87 and R 88 is preferably an aliphatic ring, and may be either saturated or unsaturated, and the carbon number is preferably from 5 to 6.

其中,作為上述一般式(11)所示之構造,較佳為下式(11a)、(11b)或(11c)所示之構造。 Among them, the structure represented by the above general formula (11) is preferably a structure represented by the following formula (11a), (11b) or (11c).

藉由於鹼可溶性樹脂中導入此等構造,在將本發明之感光性樹脂組成物使用於彩色濾光片或影像顯示裝置時,可提高其耐熱性及強度。 By introducing such a structure into the alkali-soluble resin, when the photosensitive resin composition of the present invention is used in a color filter or a video display device, heat resistance and strength can be improved.

作為具有上述一般式(11)所示構造的單(甲基)丙烯酸酯,在具有該構造之下可使用各種者,特佳為下述一般式(12)所示者。 As the mono(meth)acrylate having the structure represented by the above general formula (11), various structures can be used as long as it has such a structure, and it is particularly preferable to be as shown in the following general formula (12).

[化87] [化87]

上述一般式(12)中,R89表示氫原子或甲基,R90表示上述一般式(11)所示之構造。 In the above general formula (12), R 89 represents a hydrogen atom or a methyl group, and R 90 represents a structure represented by the above general formula (11).

於上述含有環氧基之(甲基)丙烯酸酯、與其他自由基聚合性單體的共聚合體中,來自具有上述一般式(11)所示構造之單(甲基)丙烯酸酯的重複單位,係於來自「其他自由基聚合性單體」的重複單位中,較佳為含有5~90莫耳%、特佳為含有15~50莫耳%。 In the copolymer of the epoxy group-containing (meth) acrylate and another radical polymerizable monomer, the repeating unit derived from the mono(meth) acrylate having the structure represented by the above general formula (11), In the repeating unit derived from "other radical polymerizable monomer", it is preferably contained in an amount of from 5 to 90 mol%, particularly preferably from 15 to 50 mol%.

尚且,作為具有上述一般式(11)所示構造之單(甲基)丙烯酸酯以外的「其他自由基聚合性單體」,並無特別限定。 In addition, the "other radical polymerizable monomer" other than the mono (meth) acrylate having the structure represented by the above general formula (11) is not particularly limited.

作為(D2-1)樹脂之上述含有環氧基之(甲基)丙烯酸酯與上述其他自由基聚合性單體的共聚合體,較佳係包含來自含有環氧基之(甲基)丙烯酸酯的重複單位5~90莫耳%、與來自其他自由基聚合性單體的重複單位10~95莫耳%者,特佳係包含前者30~70莫耳%、與後者70~30莫耳%者。 The copolymer of the epoxy group-containing (meth) acrylate and the other radical polymerizable monomer as the (D2-1) resin preferably contains an epoxy group-containing (meth) acrylate. The repeating unit is 5 to 90 mol%, and the repeating unit derived from other radical polymerizable monomers is 10 to 95 mol%, and the special system includes 30 to 70 mol% of the former and 70 to 30 mol% of the latter. .

(D2-1)樹脂中,係於上述含有環氧基之(甲基)丙烯酸酯與其他自由基聚合性單體的共聚合體的環氧基部分,使不飽和一元酸(聚合性成分)、與多元酸酐反應。 In the resin (D2-1), the epoxy group of the copolymer of the epoxy group-containing (meth) acrylate and another radical polymerizable monomer is an unsaturated monobasic acid (polymerizable component), Reacts with polybasic anhydrides.

於此,作為於環氧基中進行加成的「不飽和一元酸」,可使用各種者,可列舉例如具有乙烯性不飽和雙鍵的不飽和羧酸。作為具體例,可列舉藉(甲基)丙烯酸、丁烯酸、鄰-、間-或對-乙烯基安息香酸、α-位為鹵烷基、烷氧基、鹵原子、硝基或氰基等所取代的(甲基)丙烯酸等之單羧酸等。其中,較佳為(甲基)丙烯酸。此等可單獨使用1種,亦可併用2種以上。藉由使此種成分加成,可 對(D2-1)樹脂賦予聚合性。 Here, as the "unsaturated monobasic acid" to be added to the epoxy group, various types may be used, and examples thereof include an unsaturated carboxylic acid having an ethylenically unsaturated double bond. Specific examples thereof include (meth)acrylic acid, crotonic acid, o-, m- or p-vinylbenzoic acid, α-position haloalkyl, alkoxy group, halogen atom, nitro group or cyano group. A monocarboxylic acid or the like which is substituted with (meth)acrylic acid or the like. Among them, (meth)acrylic acid is preferred. These may be used alone or in combination of two or more. By adding such ingredients, The (D2-1) resin was imparted with polymerizability.

此等不飽和一元酸通常對上述共聚合體所具有之環氧基的10~100莫耳%進行加成,較佳係對50~100莫耳%進行加成。 These unsaturated monobasic acids are usually added to 10 to 100 mol% of the epoxy group of the above copolymer, and preferably 50 to 100 mol%.

再者,作為對在使不飽和一元酸加成至共聚合體之環氧基時所產生之羥基進行加成的「多元酸酐」,可使用各種者。可列舉例如順丁烯二酸酐、琥珀酸酐、伊康酸酐、酞酸酐、四氫酞酸酐、六氫酞酸酐及氯橋酸酐等之二元酸酐;偏苯三甲酸酐、焦蜜石酸酐、二苯基酮四羧酸酐及聯苯基四羧酸酐等之三元以上之酸的酐。其中,較佳為四氫酞酸酐及琥珀酸酐。此等多元酸酐可單獨使用1種,亦可併用2種以上。 Further, as the "polybasic acid anhydride" which is added to the hydroxyl group generated when the unsaturated monobasic acid is added to the epoxy group of the copolymer, various types can be used. Examples thereof include dibasic acid anhydrides such as maleic anhydride, succinic anhydride, itaconic anhydride, decanoic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, and chloro-hydro anhydride; trimellitic anhydride, pyrogallic anhydride, and diphenyl An anhydride of a trivalent or higher acid such as a ketone tetracarboxylic anhydride or a biphenyltetracarboxylic anhydride. Among them, tetrahydrophthalic anhydride and succinic anhydride are preferred. These polybasic acid anhydrides may be used alone or in combination of two or more.

藉由使此種成分加成,可對(D2-1)樹脂賦予鹼可溶性。 By adding such a component, alkali solubility can be given to the (D2-1) resin.

此等多元酸酐通常係對藉由使不飽和一元酸加成於上述共聚合體所具有之環氧基而產生之羥基的10~100莫耳%進行加成,但較佳係對30~80莫耳%進行加成。 These polybasic acid anhydrides are usually added in an amount of 10 to 100 mol% of a hydroxyl group produced by adding an unsaturated monobasic acid to the epoxy group of the above copolymer, but preferably 30 to 80 mol. Ear % is added.

<(D2-2)樹脂> <(D2-2) Resin>

(D2-2)作為於主鏈含有羧基之直鏈狀鹼可溶性樹脂,若具有羧基則無特別限定,通常係將含有羧基之聚合性單體進行聚合而獲得。 (D2-2) The linear alkali-soluble resin having a carboxyl group in the main chain is not particularly limited as long as it has a carboxyl group, and is usually obtained by polymerizing a carboxyl group-containing polymerizable monomer.

作為含羧基之聚合性單體,可列舉例如(甲基)丙烯酸、順丁烯二酸、丁烯酸、伊康酸、反丁烯二酸、2-(甲基)丙烯醯氧基乙基琥珀酸、2-(甲基)丙烯醯氧基乙基己二酸、2-(甲基)丙烯醯氧基乙基順丁烯二酸、2-(甲基)丙烯醯氧基乙基六氫酞酸、2-(甲基) 丙烯醯氧基乙基酞酸、2-(甲基)丙烯醯氧基丙基琥珀酸、2-(甲基)丙烯醯氧基丙基己二酸、2-(甲基)丙烯醯氧基丙基順丁烯二酸、2-(甲基)丙烯醯氧基丙基氫酞酸、2-(甲基)丙烯醯氧基丙基酞酸、2-(甲基)丙烯醯氧基丁基琥珀酸、2-(甲基)丙烯醯氧基丁基己二酸、2-(甲基)丙烯醯氧基丁基順丁烯二酸、2-(甲基)丙烯醯氧基丁基氫酞酸及2-(甲基)丙烯醯氧基丁基酞酸等之乙烯基系單體;於丙烯酸中加成了ε-己內酯、β-丙內酯、γ-丁內酯及δ-戊內酯等之內酯類的單體;於羥烷基(甲基)丙烯酸酯中加成了琥珀酸、順丁烯二酸及酞酸以及此等之酐等之酸或酐的單體等。此等可單獨使用1種,亦可併用2種以上。 Examples of the carboxyl group-containing polymerizable monomer include (meth)acrylic acid, maleic acid, crotonic acid, itaconic acid, fumaric acid, and 2-(methyl)acryloxyethyloxy group. Succinic acid, 2-(methyl) propylene methoxyethyl adipate, 2-(methyl) propylene oxiranyl ethyl maleate, 2-(methyl) propylene methoxyethyl hexa Hydrogen phthalic acid, 2-(methyl) Propylene methoxyethyl phthalate, 2-(methyl) propylene methoxy propyl succinic acid, 2-(methyl) propylene methoxy propyl adipic acid, 2-(methyl) propylene decyloxy Propyl maleic acid, 2-(methyl)propenyloxypropyl hydroquinone, 2-(methyl)propenyloxypropyl niobate, 2-(methyl)propenyloxybutyrate Succinic acid, 2-(methyl)propenyloxybutyl adipate, 2-(methyl)propenyloxybutyl maleate, 2-(methyl)propenyloxybutyl hydroquinone a vinyl monomer such as an acid or 2-(meth)acryloxybutyl phthalic acid; ε-caprolactone, β-propiolactone, γ-butyrolactone, and δ- added to acrylic acid a monomer of a lactone such as valerolactone; a monomer of an acid or anhydride such as succinic acid, maleic acid, and citric acid, and the like; Wait. These may be used alone or in combination of two or more.

其中,較佳為(甲基)丙烯酸或2-(甲基)丙烯醯氧基乙基琥珀酸,更佳為(甲基)丙烯酸。 Among them, (meth)acrylic acid or 2-(meth)acryloxyethyl succinic acid is preferred, and (meth)acrylic acid is more preferred.

又,(D2-2)樹脂亦可為於上述含羧基之聚合性單體中使不具有羧基之其他聚合性單體進行共聚合者。此時,作為其他之聚合性單體並無特別限定,可列舉日本專利特開2009-52010號公報所記載者等。又,此等聚合物單體中,由顏料分散性優越的觀點而言,特佳為含有(甲基)丙烯酸苄酯的共聚合體樹脂。 Further, the (D2-2) resin may be one obtained by copolymerizing another polymerizable monomer having no carboxyl group in the carboxyl group-containing polymerizable monomer. In this case, the other polymerizable monomer is not particularly limited, and those described in JP-A-2009-52010 can be cited. Further, among these polymer monomers, a copolymer resin containing benzyl (meth)acrylate is particularly preferred from the viewpoint of superior pigment dispersibility.

<(D2-3)樹脂> <(D2-3) Resin>

(D2-3)於上述(D2-2)樹脂之羧基部分,使含有環氧基之不飽和化合物加成的樹脂中,作為於(D2-2)樹脂之羧基部分進行加成的含環氧基之不飽和化合物,若為分子內具有乙烯性不飽和基及環氧基者,則無特別限定。 (D2-3) an epoxy group added as a carboxyl group of the (D2-2) resin in a resin obtained by adding an epoxy group-containing unsaturated compound to the carboxyl group of the above (D2-2) resin The ethylenically unsaturated compound is not particularly limited as long as it has an ethylenically unsaturated group and an epoxy group in the molecule.

作為此含有環氧基之不飽和化合物,可列舉例如(甲 基)丙烯酸環氧丙酯、烯丙基環氧丙基醚、環氧丙基-α-乙基丙烯酸酯、巴豆醯基環氧丙基醚、(異)丁烯酸環氧丙基醚、N-(3,5-二甲基-4-環氧丙基)苄基丙烯醯胺及4-羥基丁基(甲基)丙烯酸酯環氧丙基醚等之含有非環式環氧基之不飽和化合物。由耐熱性及顏料之分散性的觀點而言,較佳係以下記載之含有脂環式環氧基的不飽和化合物。 As the epoxy group-containing unsaturated compound, for example, (A Glycidyl acrylate, allyl epoxidized propyl ether, epoxypropyl-α-ethyl acrylate, crotonyl epoxidized propyl ether, (meth) epoxidized propyl propyl ether, N-(3,5-dimethyl-4-epoxypropyl)benzyl acrylamide and 4-hydroxybutyl (meth) acrylate epoxy propyl ether and the like containing an acyclic epoxy group Unsaturated compound. From the viewpoint of heat resistance and dispersibility of the pigment, an alicyclic epoxy group-containing unsaturated compound described below is preferred.

於此,作為含有脂環式環氧基之不飽和化合物的脂環式環氧基,可列舉例如2,3-環氧基環戊基、3,4-環氧基環己基及7,8-環氧基(三環[5.2.1.0]癸-2-基)等。又,作為乙烯性不飽和基,較佳為來自(甲基)丙烯醯基者。 Here, examples of the alicyclic epoxy group containing an alicyclic epoxy group-containing unsaturated compound include 2,3-epoxycyclopentyl group, 3,4-epoxycyclohexyl group, and 7,8. - an epoxy group (tricyclo[5.2.1.0]non-2-yl) and the like. Further, as the ethylenically unsaturated group, those derived from a (meth) acrylonitrile group are preferred.

<(D2-4)樹脂> <(D2-4) Resin>

作為(D2-4)(甲基)丙烯酸系樹脂,可列舉使以下述一般式(6)所示之化合物為必要的單體成分進行聚合而成的(甲基)丙烯酸系樹脂。 The (meth)acrylic resin obtained by polymerizing a monomer component which is a compound represented by the following general formula (6) as a (D2-4) (meth)acrylic resin is mentioned.

上述一般式(6)中,R71及R72分別獨立表示氫原子或亦可具有取代基之碳數1~25之烴基。 In the above general formula (6), R 71 and R 72 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.

以下,針對一般式(6)之化合物進行詳述。 Hereinafter, the compound of the general formula (6) will be described in detail.

一般式(6)所示之醚二聚物中,作為R71及R72所示之亦可具有取代基之碳數1~25的烴基,並無特別限制,可列舉例如甲基、乙基、正丙基、異丙基、正丁基、異丁基、第三丁基、第三 戊基、硬脂基、月桂基及2-乙基己基等之直鏈狀或分岐狀之烷基;苯基等之芳基;環己基、第三丁基環己基、二環戊二烯基、三環十二烷基、異基、金剛烷基及2-甲基-2-金剛烷基等之脂環式基;由1-甲氧基乙基及1-乙氧基乙基等之烷氧基所取代的烷基;由苄基等之芳基所取代的烷基等。此等之中,由耐熱性之觀點而言,特佳係如甲基、乙基、環己基及苄基等般之難以因酸或熱而脫離之具有1級或2級碳原子的取代基。又,R71及R72可為同種取代基,亦可為相異取代基。 In the ether dimer of the general formula (6), the hydrocarbon group having 1 to 25 carbon atoms which may have a substituent represented by R 71 and R 72 is not particularly limited, and examples thereof include a methyl group and an ethyl group. a linear or branched alkyl group such as n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, tert-pentyl, stearyl, lauryl or 2-ethylhexyl An aryl group such as a phenyl group; a cyclohexyl group, a tert-butylcyclohexyl group, a dicyclopentadienyl group, a tricyclododecyl group, an iso An alicyclic group such as an adamantyl group or a 2-methyl-2-adamantyl group; an alkyl group substituted with an alkoxy group such as a 1-methoxyethyl group or a 1-ethoxyethyl group; An alkyl group or the like substituted with an aryl group such as a benzyl group. Among these, from the viewpoint of heat resistance, a substituent having a primary or secondary carbon atom which is difficult to be removed by acid or heat, such as a methyl group, an ethyl group, a cyclohexyl group, and a benzyl group, is particularly preferable. . Further, R 71 and R 72 may be the same substituent or may be a different substituent.

作為一般式(6)所示之醚二聚物,特佳為二甲基-2,2'-[氧基雙(亞甲基)]雙-2-丙烯酸酯、二乙基-2,2'-[氧基雙(亞甲基)]雙-2-丙烯酸酯、二環己基-2,2'-[氧基雙(亞甲基)]雙-2-丙烯酸酯或二苄基-2,2'-[氧基雙(亞甲基)]雙-2-丙烯酸酯。此等醚二聚物可單獨使用1種,亦可併用2種以上。 As the ether dimer represented by the general formula (6), particularly preferred is dimethyl-2,2'-[oxybis(methylene)]bis-2-acrylate, diethyl-2,2 '-[Oxobis(methylene)]bis-2-acrylate, dicyclohexyl-2,2'-[oxybis(methylene)]bis-2-acrylate or dibenzyl-2 , 2'-[oxybis(methylene)]bis-2-acrylate. These ether dimers may be used alone or in combination of two or more.

獲得(D2-4)樹脂時,單體成分中之上述醚二聚物的比例並無特別限制,於總單體成分中,通常為2~60質量%、較佳為5~50質量%。 When the (D2-4) resin is obtained, the ratio of the above-mentioned ether dimer in the monomer component is not particularly limited, but is usually 2 to 60% by mass, preferably 5 to 50% by mass based on the total monomer component.

(D2-4)樹脂較佳為具有酸基。藉由具有酸基,使用此所得之本發明之感光性樹脂組成物可作成為藉由酸基與環氧基進行反應而形成酯鍵的交聯反應(以下有時簡稱為「酸-環氧基硬化」)而可硬化的感光性樹脂組成物,或可將未硬部藉由鹼顯影液進行顯影的感光性樹脂組成物。 The (D2-4) resin preferably has an acid group. By using the acid group, the photosensitive resin composition of the present invention obtained by the use of the present invention can be used as a crosslinking reaction by forming an ester bond by reacting an acid group with an epoxy group (hereinafter sometimes referred to simply as "acid-epoxy" A photosensitive resin composition which can be cured by a base hardening or a photosensitive resin composition which can develop the unhardened part by an alkali developing solution.

作為上述酸基並無特別限制,可列舉例如羧基、酚性羥基及羧酸酐基等。樹脂1分子中所含有之此等酸基可僅為1種,亦可為2種以上。 The acid group is not particularly limited, and examples thereof include a carboxyl group, a phenolic hydroxyl group, and a carboxylic acid anhydride group. These acid groups contained in one molecule of the resin may be one type or two or more types.

在(D2-4)樹脂中導入酸基時,若例如使用具有酸基之單體、及/或「於聚合後可賦予酸基之單體」(以下亦稱為「用於導入酸基之單體」)作為單體成分即可。又,在使用「於聚合後可賦予酸基之單體」作為單體成分時,必須於聚合後進行用於賦予酸基的處理。 When an acid group is introduced into the (D2-4) resin, for example, a monomer having an acid group and/or a "monomer capable of imparting an acid group after polymerization" (hereinafter also referred to as "introduction of an acid group" is used. The monomer ") may be used as a monomer component. In addition, when "a monomer which can provide an acid group after a polymerization" is used as a monomer component, it is necessary to carry out the process for providing an acid group after the polymerization.

作為上述具有酸基之單體,可列舉例如(甲基)丙烯酸或伊康酸等之具有羧基之單體;N-羥苯基順丁烯二醯亞胺等之具有酚性羥基的單體;順丁烯二酸酐或伊康酸酐等之具有羧酸酐基的單體等。此等之中,特佳為(甲基)丙烯酸。 Examples of the monomer having an acid group include a monomer having a carboxyl group such as (meth)acrylic acid or itaconic acid; and a monomer having a phenolic hydroxyl group such as N-hydroxyphenyl maleimide. a monomer having a carboxylic acid anhydride group such as maleic anhydride or itaconic anhydride. Among these, (meth)acrylic acid is particularly preferred.

作為上述於聚合後可賦予酸基的單體,可列舉例如(甲基)丙烯酸2-羥基乙基酯等之具有羥基的單體;(甲基)丙烯酸環氧丙基酯等之具有環氧基的單體;(甲基)丙烯酸2-異氰酸基乙酯等之具有異氰酸酯基的單體等。 Examples of the monomer capable of imparting an acid group after the polymerization include a monomer having a hydroxyl group such as 2-hydroxyethyl (meth)acrylate or an epoxy group such as a glycidyl (meth)acrylate. a monomer having a radical; a monomer having an isocyanate group such as 2-isocyanatoethyl (meth)acrylate; and the like.

此等用於導入酸基之單體,可單獨使用1種,亦可併用2種以上。 These monomers for introducing an acid group may be used singly or in combination of two or more.

在得到(D2-4)樹脂時之單體成分為含有上述用於導入酸基之單體的情況下,其含有比例通常於總單體成分中為5~70質量%、較佳10~60質量%。 When the monomer component in the case of obtaining the (D2-4) resin is a monomer containing the above-mentioned acid group, the content ratio is usually 5 to 70% by mass, preferably 10 to 60% in the total monomer component. quality%.

得到(D2-4)樹脂時之單體成分中,除了上述單體成分之外,視需要亦可含有其他可共聚合之單體。 The monomer component in the case of obtaining the (D2-4) resin may contain other copolymerizable monomers in addition to the above monomer components.

本發明之感光性樹脂組成物,作為鹼可溶性樹脂(d)較佳係含有上述環氧基(甲基)丙烯酸酯樹脂(D1-1)、環氧基(甲基)丙烯酸酯樹脂(D1-2)、(D2-1)樹脂、(D2-2)樹脂、(D2-3)樹脂及(D2-4)樹脂之任一者;更佳係含有環氧基(甲基)丙烯酸酯樹脂(D1-1)、環 氧基(甲基)丙烯酸酯樹脂(D1-2)、(D2-1)樹脂及(D2-3)樹脂之任一者;特佳為至少含有環氧基(甲基)丙烯酸酯樹脂(D1-1)及/或環氧基(甲基)丙烯酸酯樹脂(D1-2)。 The photosensitive resin composition of the present invention preferably contains the above epoxy group (meth) acrylate resin (D1-1) and epoxy (meth) acrylate resin (D1) as the alkali-soluble resin (d). 2), (D2-1) resin, (D2-2) resin, (D2-3) resin, and (D2-4) resin; more preferably an epoxy (meth) acrylate resin ( D1-1), ring Any one of an oxy (meth) acrylate resin (D1-2), a (D2-1) resin, and a (D2-3) resin; particularly preferably an epoxy (meth) acrylate resin (D1) -1) and/or epoxy (meth) acrylate resin (D1-2).

<其他鹼可溶性樹脂> <Other alkali soluble resins>

本發明之感光性樹脂組成物,除了上述環氧基(甲基)丙烯酸酯樹脂(D1-1)、環氧基(甲基)丙烯酸酯樹脂(D1-2)、(D2-1)~(D2-4)樹脂以外,亦可含有其他鹼可溶性樹脂之1種或2種以上作為鹼可溶性樹脂(d)。 The photosensitive resin composition of the present invention comprises, in addition to the above epoxy (meth) acrylate resin (D1-1), epoxy (meth) acrylate resin (D1-2), (D2-1)~ ( In addition to the resin, one or two or more kinds of other alkali-soluble resins may be contained as the alkali-soluble resin (d).

其他之鹼可溶性樹脂並無限制,若為選自於感光性樹脂組成物所通常使用的樹脂即可。可列舉例如日本專利特開2007-271727號公報、日本專利特開2007-316620號公報、日本專利特開2007-334290號公報等記載的鹼可溶性樹脂等。 The other alkali-soluble resin is not limited, and may be a resin which is usually selected from the group consisting of photosensitive resin compositions. An alkali-soluble resin described in, for example, Japanese Laid-Open Patent Publication No. 2007-316620, Japanese Patent Laid-Open No. Hei. No. 2007-316290, and the like.

[色材(a)] [color material (a)]

本發明之感光性樹脂組成物係含有色材(a)。色材(a)係指對本發明之感光性樹脂組成物進行著色者。作為色材(a),可使用染顏料,但由耐熱性及耐光性等觀點而言,較佳為顏料。 The photosensitive resin composition of the present invention contains a color material (a). The color material (a) is a coloring agent for the photosensitive resin composition of the present invention. As the color material (a), a dye can be used, but from the viewpoints of heat resistance, light resistance, and the like, a pigment is preferable.

作為顏料,可列舉例如藍色顏料、綠色顏料、紅色顏料、黃色顏料、紫色顏料、橙色顏料、棕色顏料或黑色顏料等各種色之顏料。又,其構造可列舉例如偶氮系、酞菁系、喹吖酮系、苯并咪唑酮系、異吲哚啉系、二系、陰丹士林系、苝系等之有機顏料,或其他各種無機顏料等。 Examples of the pigment include pigments of various colors such as a blue pigment, a green pigment, a red pigment, a yellow pigment, a violet pigment, an orange pigment, a brown pigment, or a black pigment. Further, examples of the structure include an azo system, a phthalocyanine system, a quinophthalone type, a benzimidazolone type, an isoporphyrin type, and Organic pigments such as linden, indanthrene, and lanthanide, or various other inorganic pigments.

以下以色素號表示本發明可使用之顏料的具體例。尚 且,以下列舉之「C.I.色素紅2」等用語,係指色指數(C.I.)。 Specific examples of the pigment usable in the present invention are shown below by the dye number. Yet Further, the terms "C.I. Pigment Red 2" listed below refer to the color index (C.I.).

作為紅色顏料可列舉例如C.I.色素紅1、2、3、4、5、6、7、8、9、12、14、15、16、17、21、22、23、31、32、37、38、41、47、48、48:1、48:2、48:3、48:4、49、49:1、49:2、50:1、52:1、52:2、53、53:1、53:2、53:3、57、57:1、57:2、58:4、60、63、63:1、63:2、64、64:1、68、69、81、81:1、81:2、81:3、81:4、83、88、90:1、101、101:1、104、108、108:1、109、112、113、114、122、123、144、146、147、149、151、166、168、169、170、172、173、174、175、176、177、178、179、181、184、185、187、188、190、193、194、200、202、206、207、208、209、210、214、216、220、221、224、230、231、232、233、235、236、237、238、239、242、243、245、247、249、250、251、253、254、255、256、257、258、259、260、262、263、264、265、266、267、268、269、270、271、272、273、274、275及276。其中,較佳為C.I.色素紅48:1、122、168、177、202、206、207、209、224、242或254;更佳可列舉C.I.色素紅177、209、224、254。 Examples of the red pigment include CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38. , 41, 47, 48, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53:1 , 53:2, 53:3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81:1 , 81:2, 81:3, 81:4, 83, 88, 90:1, 101, 101:1, 104, 108, 108:1, 109, 112, 113, 114, 122, 123, 144, 146 , 147, 149, 151, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202 , 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 235, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250 , 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, and 276. Among them, preferred are C.I. Pigment Red 48:1, 122, 168, 177, 202, 206, 207, 209, 224, 242 or 254; more preferably C.I. Pigment Red 177, 209, 224, 254.

作為藍色顏料,可列舉例如C.I.色素藍1、1:2、9、14、15、15:1、15:2、15:3、15:4、15:6、16、17、19、25、27、28、29、33、35、36、56、56:1、60、61、61:1、62、63、66、67、68、71、72、73、74、75、76、78及79。此等之中,較佳為C.I.色素藍15、15:1、15:2、15:3、15:4或15:6,更佳可列舉C.I.色素藍15:6。 Examples of the blue pigment include CI Pigment Blue 1, 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25 , 27, 28, 29, 33, 35, 36, 56, 56: 1, 60, 61, 61: 1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78 And 79. Among these, C.I. Pigment Blue 15, 15:1, 15:2, 15:3, 15:4 or 15:6 is preferred, and C.I. Pigment Blue 15:6 is more preferred.

作為綠色顏料,可列舉例如C.I.色素綠1、2、4、7、 8、10、13、14、15、17、18、19、26、36、45、48、50、51、54及55。其中,較佳可列舉C.I.色素綠7、36或58。 Examples of the green pigment include C.I. Pigment Green 1, 2, 4, and 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54 and 55. Among them, C.I. Pigment Green 7, 7, or 58 is preferred.

作為黃色顏料,可列舉例如C.I.色素黃1、1:1、2、3、4、5、6、9、10、12、13、14、16、17、24、31、32、34、35、35:1、36、36:1、37、37:1、40、41、42、43、48、53、55、61、62、62:1、63、65、73、74、75、81、83、87、93、94、95、97、100、101、104、105、108、109、110、111、116、117、119、120、126、127、127:1、128、129、133、134、136、138、139、142、147、148、150、151、153、154、155、157、158、159、160、161、162、163、164、165、166、167、168、169、170、172、173、174、175、176、180、181、182、183、184、185、188、189、190、191、191:1、192、193、194、195、196、197、198、199、200、202、203、204、205、206、207及208。其中,較佳可列舉C.I.色素黃83、117、129、138、139、150、154、155、180或185;更佳可列舉C.I.色素黃83、138、139、150或180。 Examples of the yellow pigment include CI Pigment Yellow 1, 1:1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, and 35. 35:1, 36, 36:1, 37, 37:1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62:1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 128, 129, 133, 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170,172,173,174,175,176,180,181,182,183,184,185,188,189,190,191,191:1,192,193,194,195,196 199, 200, 202, 203, 204, 205, 206, 207, and 208. Among them, preferred are C.I. Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180 or 185; more preferably C.I. Pigment Yellow 83, 138, 139, 150 or 180.

作為橙色顏料,可列舉例如C.I.色素橙1、2、5、13、16、17、19、20、21、22、23、24、34、36、38、39、43、46、48、49、61、62、64、65、67、68、69、70、71、72、73、74、75、77、78及79。其中,較佳可列舉C.I.色素橙38或71。 Examples of the orange pigment include CI Pigment Orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48, 49. 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78 and 79. Among them, C.I. Pigment Orange 38 or 71 is preferred.

作為紫色顏料,可列舉例如C.I.色素紫1、1:1、2、2:2、3、3:1、3:3、5、5:1、14、15、16、19、23、25、27、29、31、32、37、39、42、44、47、49及50。其中,較佳可列舉C.I.色素紫19或23,更佳可列舉C.I.色素紫23。 Examples of the violet pigment include CI Pigment Violet 1, 1:1, 2, 2:2, 3, 3:1, 3:3, 5, 5:1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49 and 50. Among them, C.I. Pigment Violet 19 or 23 is preferable, and C.I. Pigment Violet 23 is more preferable.

又,在本發明之感光性樹脂組成物為彩色濾光片之樹 脂黑色矩陣用感光性樹脂組成物時,可使用黑色色材作為色材(a)。黑色色材可為單獨之黑色色材,亦可為由紅、綠及藍等混合而成者。又,此等色材可由無機或有機之顏料、染料中適當選擇。 Further, the photosensitive resin composition of the present invention is a tree of color filters When a photosensitive resin composition is used for the fat black matrix, a black color material can be used as the color material (a). The black color material may be a single black color material, or may be a mixture of red, green, and blue. Further, these color materials may be appropriately selected from inorganic or organic pigments and dyes.

作為用於調製黑色色材而可混合使用的色材,可列舉例如維多利亞純藍(42595)、金胺O(41000)、Cathilon亮黃素(brilliant flavin)(鹼性13)、玫瑰紅6GCP(45160)、玫瑰紅B(45170)、番紅OK70:100(50240)、罌紅X(42080)、No.120/雷奧諾爾黃(Lionol Yellow)(21090)、雷奧諾爾黃GRO(21090)、斯姆勒堅牢黃(Symuler fast yellow)8GF(21105)、聯苯胺黃4T-564D(21095)、斯姆勒堅牢紅4015(12355)、雷奧諾爾紅7B4401(15850)、Fastogen藍TGR-L(74160)、雷奧諾爾藍SM(26150)、雷奧諾爾藍ES(顏料藍15:6)、Lionogen紅GD(顏料紅168)、雷奧諾爾綠2YS(顏料綠36)等(另外,上述( )內的數字意指色指數(C.I.))。 Examples of the color material which can be used in combination for modulating a black color material include Victoria Pure Blue (42595), Goldamine O (41000), Cathilon flavin (Basic 13), Rose Red 6GCP ( 45160), Rose Red B (45170), Safranin OK70: 100 (50240), Epilepsy X (42080), No. 120 / Lionol Yellow (21090), Leonor Yellow GRO (21090) ,Symuler fast yellow 8GF (21105), benzidine yellow 4T-564D (21095), Smeller fast red 4015 (12355), Leonor red 7B4401 (15850), Fastogen blue TGR-L (74160), Leonor Blue SM (26150), Leonor Blue ES (Pigment Blue 15:6), Lionogen Red GD (Pigment Red 168), Leonor Green 2YS (Pigment Green 36), etc. The number in ( ) means the color index (CI)).

另外,若藉由C.I.編號進一步表示其他可混合使用的顏料,可列舉例如C.I.黃色顏料20、24、86、93、109、110、117、125、137、138、147、148、153、154、166;C.I.橙色顏料36、43、51、55、59及61;C.I.紅色顏料9、97、122、123、149、168、177、180、192、215、216、217、220、223、224、226、227、228及240;C.I.紫色顏料19、23、29、30、37、40及50;C.I.藍色顏料15、15:1、15:4、22、60及64;C.I.綠色顏料7;及C.I.棕色顏料23、25及26等。 Further, if other pigments which can be used in combination are further indicated by the CI number, for example, CI yellow pigments 20, 24, 86, 93, 109, 110, 117, 125, 137, 138, 147, 148, 153, 154, 166; CI orange pigments 36, 43, 51, 55, 59 and 61; CI red pigments 9, 97, 122, 123, 149, 168, 177, 180, 192, 215, 216, 217, 220, 223, 224, 226, 227, 228 and 240; CI violet pigments 19, 23, 29, 30, 37, 40 and 50; CI blue pigments 15, 15: 1, 15: 4, 22, 60 and 64; CI green pigment 7; And CI brown pigments 23, 25 and 26, etc.

另外,作為可單獨使用的黑色色材,可列舉例如:碳黑、乙快黑、燈黑、骨黑(bone black)、石墨、鐵黑、苯胺黑、花青黑、鈦黑等。 Further, examples of the black color material that can be used alone include carbon black, B fast black, lamp black, bone black, graphite, iron black, nigrosine, cyanine black, and titanium black.

在使用黑色色材時,此等色材(a)中,由遮光率、影像特性的觀點而言,較佳為碳黑。作為碳黑的例子,可列舉如以下的碳黑。 When a black color material is used, among these color materials (a), carbon black is preferred from the viewpoint of light blocking ratio and image characteristics. Examples of the carbon black include carbon black as follows.

三菱化學公司製造:MA7、MA77、MA8、MA11、MA100、MA100R、MA220、MA230、MA600、#5、#10、#20、#25、#30、#32、#33、#40、#44、#45、#47、#50、#52、#55、#650、#750、#850、#950、#960、#970、#980、#990、#1000、#2200、#2300、#2350、#2400、#2600、#3050、#3150、#3250、#3600、#3750、#3950、#4000、#4010、OIL7B、OIL9B、OIL11B、OIL30B及OIL31B。 Mitsubishi Chemical Corporation manufactures: MA7, MA77, MA8, MA11, MA100, MA100R, MA220, MA230, MA600, #5, #10, #20, #25, #30, #32, #33, #40, #44, #45,#47,#50,#52,#55,#650,#750,#850,#950,#960,#970,#980,#990,#1000,#2200, #2300, #2350 #2400, #2600, #3050, #3150, #3250, #3600, #3750, #3950, #4000, #4010, OIL7B, OIL9B, OIL11B, OIL30B, and OIL31B.

DEGUSSA公司製造:Printex(註冊商標,以下相同)3、Printex3OP、Printex30、Printex30OP、Printex40、Printex45、Printex55、Printex60、Printex75、Printex80、Printex85、Printex90、PrintexA、PrintexL、PrintexG、PrintexP、PrintexU、PrintexV、PrintexG、SpecialBlack550、SpecialBlack350、SpecialBlack250、SpecialBlack100、SpecialBlack6、SpecialBlack5、SpecialBlack4、ColorBlackFW1、ColorBlackFW2、Coo0rBlackFW2V、ColorBlackFW18、ColorBlackFW18、ColorBlackFW200、ColorBlackS160、ColorBlackS170。 Made by DEGUSSA: Printex (registered trademark, the same below) 3, Printex3OP, Printex30, Printex30OP, Printex40, Printex45, Printex55, Printex60, Printex75, Printex80, Printex85, Printex90, PrintexA, PrintexL, PrintexG, PrintexP, PrintexU, PrintexV, PrintexG, Special Black 550, Special Black 350, Special Black 250, Special Black 100, Special Black 6, Special Black 5, Special Black 4, Color Black FW 1, Color Black FW 2, Coo Tr Black FW 2 V, Color Black FW 18, Color Black FW 18, Color Black FW 200, Color Black S 160, Color Black S 170.

Cabot公司製造:Monarch(註冊商標,以下相同)120、Monarch280、Monarch460、Monarch800、Monarch880、Monarch900、Monarch1000、Monarch1100、Monarch1300、Monarch1400、Monarch4630、REGAL(註冊商標,以下相同)99、REGAL99R、REGAL415、REGAL415R、REGAL250、REGAL250R、REGAL330、REGAL400R、REGAL55R0、REGAL660R、BLACKPEARLS480、 PEARLS130、VULCAN(註冊商標,以下相同)XC72R、ELFTEX(註冊商標)-8。 Cabot company: Monarch (registered trademark, the same below) 120, Monarch280, Monarch460, Monarch800, Monarch880, Monarch900, Monarch1000, Monarch1100, Monarch1300, Monarch1400, Monarch4630, REGAL (registered trademark, the same below) 99, REGAL99R, REGAL415, REGAL415R, REGAL250, REGAL250R, REGAL330, REGAL400R, REGAL55R0, REGAL660R, BLACKPEARLS480, PEARLS130, VULCAN (registered trademark, the same below) XC72R, ELFTEX (registered trademark)-8.

Columbian Carbon公司製造:RAVEN(註冊商標,以下相同)11、RAVEN14、RAVEN15、RAVEN16、RAVEN22、RAVEN30、RAVEN35、RAVEN40、RAVEN410、RAVEN420、RAVEN450、RAVEN500、RAVEN780、RAVEN850、RAVEN890H、RAVEN1000、RAVEN1020、RAVEN1040、RAVEN1060U、RAVEN1080U、RAVEN1170、RAVEN1190U、RAVEN1250、RAVEN1500、RAVEN2000、RAVEN2500U、RAVEN3500、RAVEN5000、RAVEN5250、RAVEN5750、RAVEN7000。 Made by Columbian Carbon: RAVEN (registered trademark, the same below) 11, RAVEN14, RAVEN15, RAVEN16, RAVEN22, RAVEN30, RAVEN35, RAVEN40, RAVEN410, RAVEN420, RAVEN450, RAVEN500, RAVEN780, RAVEN850, RAVEN890H, RAVEN1000, RAVEN1020, RAVEN1040, RAVEN1060U , RAVEN1080U, RAVEN1170, RAVEN1190U, RAVEN1250, RAVEN1500, RAVEN2000, RAVEN2500U, RAVEN3500, RAVEN5000, RAVEN5250, RAVEN5750, RAVEN7000.

碳黑亦可使用藉樹脂所被覆者。若使用藉樹脂所被覆之碳黑,則有使對玻璃基板之密黏性及體積電阻值提升的效果。作為藉樹脂所被覆之碳黑,可較佳地使用例如日本專利特開平09-71733號公報記載的碳黑等。 Carbon black can also be used by those covered by resin. When carbon black coated with a resin is used, there is an effect of improving the adhesion and volume resistance of the glass substrate. For example, carbon black or the like described in JP-A-H09-71733 is preferably used as the carbon black coated with the resin.

作為進行被覆處理之碳黑,較佳係Na與Ca的合計含量為100ppm以下。其理由如下。亦即,碳黑通常係依百分比之等級含有以由製造時之原料油或燃燒油(或氣體)、反應停止水或造粒水、或反應爐之爐材等所混合之Na、Ca、K、Mg、Al或Fe等為組成的灰份。其中,一般係Na及Ca分別含有數百ppm以上,但若此等存在較多,則有滲透至透明電極(ITO)或其他電極中,而成為電氣短路之原因的情形。 The carbon black to be subjected to the coating treatment preferably has a total content of Na and Ca of 100 ppm or less. The reason is as follows. That is, the carbon black usually contains Na, Ca, and K mixed by the raw material oil or the combustion oil (or gas) at the time of manufacture, the reaction stop water or the granulated water, or the furnace material of the reaction furnace. , Mg, Al or Fe, etc. are ash components. In particular, Na and Ca are each contained in a range of several hundred ppm or more. However, if there are many such cases, they may penetrate into a transparent electrode (ITO) or other electrodes, which may cause electrical short-circuiting.

作為減低碳黑中含有此等Na或Ca之灰份的含量的方法,可列舉嚴格選擇此等含量極少者作為製造碳黑時之原料油及燃料油(或氣體)及反應停止水,以及極力減少調整結構之鹼物質添 加量的方法。作為其他方法,可列舉對由爐所製成之碳黑以水或鹽酸等進行洗淨,藉此使Na或Ca溶解去除的方法。 As a method of reducing the content of the ash content of the Na or Ca in the carbon black, it is possible to strictly select the raw material oil, the fuel oil (or gas) and the reaction stop water in the case of producing carbon black, and the like. Reduce the adjustment of the structure of the alkali substance The method of adding amount. As another method, a method in which carbon black produced by a furnace is washed with water, hydrochloric acid or the like to dissolve or remove Na or Ca is exemplified.

作為其他黑色顏料之例子,可將鈦黑、苯胺黑、氧化鐵系黑色顏料、及紅色、綠色、藍色這三色的有機顏料混合而使用作為黑色顏料。 As an example of other black pigments, titanium black, aniline black, iron oxide black pigment, and organic pigments of three colors of red, green, and blue may be mixed and used as a black pigment.

另外,作為顏料,亦可使用硫酸鋇、硫酸鉛、氧化鈦、黃色鉛、鐵丹或氧化鉻等。 Further, as the pigment, barium sulfate, lead sulfate, titanium oxide, yellow lead, iron oxide or chromium oxide can also be used.

此等各種顏料亦可併用複數種。例如為了調整色度,可將綠色顏料與黃色顏料併用、或將藍色顏料與紫色顏料併用。 These various pigments may also be used in combination. For example, in order to adjust the chromaticity, a green pigment may be used in combination with a yellow pigment, or a blue pigment may be used in combination with a violet pigment.

<色材(a)之粒徑> <Particle size of color material (a)>

屬於本發明所使用之色材(a)的顏料的平均一次粒徑,在作為彩色濾光片之著色層時,若為可表現所需發色者即可,並無特別限定,亦視所使用之顏料種類而異,但較佳為10~100nm範圍內,更佳為10~70nm範圍內,再更佳為20~60nm範圍內。藉由使該顏料之平均一次粒徑為上述範圍,可將使用本發明之感光性樹脂組成物所製造的影像顯示裝置的色特性作成為高品質。又,顏料為碳黑時之平均一次粒徑較佳為100nm以下、更佳為80nm以下、再更佳為60nm以下、特佳為50nm以下。且,顏料為碳黑時之平均一次粒徑較佳為20nm以上、更佳為24nm以上、特佳為27nm以上。 The average primary particle diameter of the pigment of the color material (a) used in the present invention is not particularly limited as long as it is a coloring layer of the color filter, and is not particularly limited. The type of the pigment to be used varies, but is preferably in the range of 10 to 100 nm, more preferably in the range of 10 to 70 nm, still more preferably in the range of 20 to 60 nm. By setting the average primary particle diameter of the pigment to the above range, the color characteristics of the image display device produced by using the photosensitive resin composition of the present invention can be made high. Further, the average primary particle diameter when the pigment is carbon black is preferably 100 nm or less, more preferably 80 nm or less, still more preferably 60 nm or less, and particularly preferably 50 nm or less. Further, when the pigment is carbon black, the average primary particle diameter is preferably 20 nm or more, more preferably 24 nm or more, and particularly preferably 27 nm or more.

藉由設為上述上限值以下,有聚胺基甲酸酯分散劑(b-1)所進行之顏料攝入良好、提升耐鹼顯影性及耐熱性的傾向。另一方面,藉由設為上述下限值以上,有可抑制因分散劑(b)之量需要較多而造成分散性降低的傾向。 When it is set to the above upper limit value, the pigment obtained by the polyurethane dispersant (b-1) tends to have a good intake, and the alkali-resistant developability and heat resistance tend to be improved. On the other hand, when it is set to the above lower limit value, it is possible to suppress a decrease in dispersibility due to a large amount of the dispersant (b).

尚且,上述顏料之平均一次粒徑可藉由從電子顯微鏡照片對一次粒子之尺寸直接進行計測的方法所求得。具體而言,計測各個一次粒子之短軸徑與長軸徑,以其平均值作為該粒子之粒徑。接著,針對100個以上之粒子,依近似所求得粒徑之長方體求得各個粒子的體積(重量),並求得體積平均粒徑而將此作為平均一次粒徑。尚且,電子顯微鏡係不論使用穿透型(TEM)或掃描型(SEM)均可得到相同結果。 Further, the average primary particle diameter of the above pigment can be obtained by a method of directly measuring the size of primary particles from an electron micrograph. Specifically, the minor axis diameter and the major axis diameter of each primary particle are measured, and the average value thereof is used as the particle diameter of the particle. Next, for 100 or more particles, the volume (weight) of each particle was determined by approximating the rectangular body having the obtained particle diameter, and the volume average particle diameter was determined to obtain the average primary particle diameter. Furthermore, the electron microscope can obtain the same result regardless of whether it uses a penetrating type (TEM) or a scanning type (SEM).

本發明之感光性樹脂組成物較佳係含有顏料作為色材(a),但在不影響本發明效果之範圍內亦可併用染料。作為可併用之染料,可列舉例如偶氮系染料、蒽醌系染料、酞菁系染料、醌亞胺系染料、喹啉系染料、硝基系染料、羰基系染料、次甲基系染料等。 The photosensitive resin composition of the present invention preferably contains a pigment as the color material (a), but a dye may be used in combination within a range that does not impair the effects of the present invention. Examples of the dye that can be used together include an azo dye, an anthraquinone dye, a phthalocyanine dye, a quinone dye, a quinoline dye, a nitro dye, a carbonyl dye, a methine dye, and the like. .

作為偶氮系染料,可列舉例如C.I.酸性黃11、C.I.酸性橙7、C.I.酸性紅37、C.I.酸性紅180、C.I.酸性藍29、C.I.直接紅28、C.I.直接紅83、C.I.直接黃12、C.I.直接橙26、C.I.直接綠28、C.I.直接綠59、C.I.活性黃(reactive yellow)2、C.I.活性紅17、C.I.活性紅120、C.I.活性黑5、C.I.分散橙5、C.I.分散紅58、C.I.分散藍165、C.I.鹼性藍41、C.I.鹼性紅18、C.I.媒染紅(mordant red)7、C.I.媒染黃5、C.I.媒染黑7等。 Examples of the azo dye include CI Acid Yellow 11, CI Acid Orange 7, CI Acid Red 37, CI Acid Red 180, CI Acid Blue 29, CI Direct Red 28, CI Direct Red 83, CI Direct Yellow 12, CI. Direct Orange 26, CI Direct Green 28, CI Direct Green 59, CI Reactive Yellow 2, CI Reactive Red 17, CI Reactive Red 120, CI Reactive Black 5, CI Disperse Orange 5, CI Disperse Red 58, CI Dispersion Blue 165, CI alkaline blue 41, CI alkaline red 18, CI mordant red (mordant red) 7, CI mordant yellow 5, CI mord black 7 and so on.

作為蒽醌系染料,可列舉例如:C.I.還原藍4、C.I.酸性藍40、C.I.酸性綠25、C.I.活性藍19、C.I.活性藍49、C.I.分散紅60、C.I.分散藍56、C.I.分散藍60等。 Examples of the lanthanoid dyes include CI reduced blue 4, CI acid blue 40, CI acid green 25, CI reactive blue 19, CI reactive blue 49, CI dispersed red 60, CI dispersed blue 56, CI dispersed blue 60, and the like. .

作為酞菁系染料,可列舉例如C.I.還原藍5等。作為醌亞胺系染料,可列舉例如C.I.鹼性藍3及C.I.鹼性藍9等。 Examples of the phthalocyanine-based dye include C.I. reduced blue 5 and the like. Examples of the quinone imine dye include C.I. Basic Blue 3, C.I. Basic Blue 9, and the like.

作為喹啉系染料,可列舉例如:C.I.溶劑黃33、C.I.酸性黃3及C.I.分散黃64等。作為硝基系染料,可列舉例如:C.I.酸性黃1、C.I.酸性橙3及C.I.分散黃42等。 Examples of the quinoline dye include C.I. Solvent Yellow 33, C.I. Acid Yellow 3, and C.I. Disperse Yellow 64. Examples of the nitro dye include C.I. Acid Yellow 1, C.I. Acid Orange 3, and C.I. Disperse Yellow 42 and the like.

[光聚合性單體] [Photopolymerizable monomer]

本發明之感光性樹脂組成物,由感度等觀點而言,較佳為含有光聚合性單體。 The photosensitive resin composition of the present invention preferably contains a photopolymerizable monomer from the viewpoint of sensitivity and the like.

作為本發明所使用之光聚合性單體,可列舉於分子內具有至少1個乙烯性不飽和基之化合物(以下有時稱為「乙烯性單體」)。 The photopolymerizable monomer used in the present invention may be a compound having at least one ethylenically unsaturated group in the molecule (hereinafter sometimes referred to as "ethylenic monomer").

具體而言,可列舉例如(甲基)丙烯酸、(甲基)丙烯酸烷基酯、丙烯腈、苯乙烯、具有1個乙烯性不飽和鍵的羧酸、及多元或單元醇之單酯等。 Specific examples thereof include (meth)acrylic acid, alkyl (meth)acrylate, acrylonitrile, styrene, a carboxylic acid having one ethylenically unsaturated bond, and a monoester of a polyvalent or monohydric alcohol.

本發明中,特佳係使用於1分子中具有二個以上乙烯性不飽和基的多官能乙烯性單體。 In the present invention, a polyfunctional ethylenic monomer having two or more ethylenically unsaturated groups in one molecule is particularly preferably used.

作為此種多官能乙烯性單體,可列舉例如脂肪族多羥基化合物與不飽和羧酸的酯;芳香族多羥基化合物與不飽和羧酸的酯;脂肪族多羥基化合物、芳香族多羥基化合物等之多價羥基化合物,與不飽和羧酸及多元羧酸間之酯化反應所得的酯等。 Examples of such a polyfunctional ethylenic monomer include esters of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid; esters of an aromatic polyhydroxy compound with an unsaturated carboxylic acid; aliphatic polyhydroxy compounds and aromatic polyhydroxy compounds; An ester obtained by an esterification reaction between a polyvalent hydroxy compound and an unsaturated carboxylic acid or a polyvalent carboxylic acid.

作為上述脂肪族多羥基化合物與不飽和羧酸的酯,可列舉例如乙二醇二丙烯酸酯、三乙二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基乙烷三丙烯酸酯、季戊四醇二丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇四丙烯酸酯、二季戊四酯五丙烯酸酯、二季戊四酯六丙烯酸酯及甘油丙烯酸 酯等之脂肪族多羧基化合物的丙烯酸酯,以及將此等例示化合物之丙烯酸酯替代為甲基丙烯酸酯的甲基丙烯酸酯;同樣替代為伊康酸酯的伊康酸酯、替代為丁烯酸酯的丁烯酸酯及替代為順丁烯二酸酯的順丁烯二酸酯等。 Examples of the ester of the aliphatic polyhydroxy compound and the unsaturated carboxylic acid include ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, and trimethylolethane triacrylate. Ester, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate and glycerin acrylic acid An acrylate of an aliphatic polycarboxy compound such as an ester, and a methacrylate in which an acrylate of the above-exemplified compounds is replaced with a methacrylate; an imiconate which is also replaced by an itaconate, replaced with butene The butenoate of the acid ester is replaced by a maleic acid ester of maleic acid ester or the like.

作為芳香族多羥基化合物與不飽和羧酸的酯,可列舉例如氫醌二丙烯酸酯、氫醌二甲基丙烯酸酯、間苯二酚二丙烯酸酯、間苯二酚二甲基丙烯酸酯及焦五倍子酚三丙烯酸酯等之芳香族多羥基化合物的丙烯酸酯以及甲基丙烯酸酯等。 Examples of the ester of the aromatic polyhydroxy compound and the unsaturated carboxylic acid include hydroquinone diacrylate, hydroquinone dimethacrylate, resorcinol diacrylate, resorcin dimethacrylate, and coke. Acrylates and methacrylates of aromatic polyhydroxy compounds such as gallic phenol triacrylate.

作為藉由多元羧酸及不飽和羧酸、與多價羥基化合物之酯化反應所得的酯,並不一定為單一物,作為其代表性之具體例,可列舉丙烯酸、酞酸、及乙二醇之縮合物,丙烯酸、順丁烯二酸、及二乙二醇的縮合物,甲基丙烯酸、對苯二甲酸及季戊四醇之縮合物,以及丙烯酸、己二酸、丁二醇及甘油的縮合物等。 The ester obtained by the esterification reaction of a polyvalent carboxylic acid and an unsaturated carboxylic acid with a polyvalent hydroxy compound is not necessarily a single substance, and specific examples thereof include acrylic acid, citric acid, and ethylene. a condensate of an alcohol, a condensate of acrylic acid, maleic acid, and diethylene glycol, a condensate of methacrylic acid, terephthalic acid, and pentaerythritol, and a condensation of acrylic acid, adipic acid, butanediol, and glycerin Things and so on.

其他,作為本發明所使用之多官能乙烯性單體,例如:使聚異氰酸酯化合物與含羥基之(甲基)丙烯酸酯或聚異氰酸酯化合物與多元醇及含羥基之(甲基)丙烯酸酯進行反應而得般之胺基甲酸乙酯(甲基)丙烯酸酯類;多價環氧化合物與羥基(甲基)丙烯酸酯或(甲基)丙烯酸的加成反應般之環氧基丙烯酸酯類;乙烯雙丙烯醯胺等之丙烯醯胺類;酞酸二烯丙酯等之烯丙酯類;二乙烯基酞酸酯等之含乙烯基化合物等為有用。 Other, as the polyfunctional ethylenic monomer used in the present invention, for example, reacting a polyisocyanate compound with a hydroxyl group-containing (meth) acrylate or polyisocyanate compound with a polyol and a hydroxyl group-containing (meth) acrylate And the like of ethyl methacrylate (meth) acrylate; polyvalent epoxy compound and hydroxy (meth) acrylate or (meth) acrylic acid addition reaction like epoxy acrylate; ethylene A acrylamide such as bisacrylamide or the like; an allyl ester such as diallyl phthalate; a vinyl group-containing compound such as divinyl phthalate or the like is useful.

再者,作為本發明所使用之多官能乙烯性單體,例如為分子內具有己內酯構造與2個以上乙烯性不飽和基的化合物(以下有時稱為「含己內酯構造之多官能性單體」),由於可與本發明所使用之聚胺基甲酸酯分散劑(b-1)良好相溶,並進一步提升此等分 散劑所造成之效果,故為有用,且可較佳地使用。 In addition, the polyfunctional ethylenic monomer used in the present invention is, for example, a compound having a caprolactone structure and two or more ethylenically unsaturated groups in the molecule (hereinafter sometimes referred to as "caprolactone-containing structure" The functional monomer ") is well compatible with the polyurethane dispersant (b-1) used in the present invention, and further enhances the aliquot The effect of the powder is useful and can be preferably used.

作為含有己內酯構造之多官能性單體,可列舉例如藉由於三羥甲基乙烷、二(三羥甲基)乙烷、三羥甲基丙烷、二(三羥甲基)丙烷、季戊四醇、二季戊四醇、三季戊四醇、甘油、二甘油或三羥甲基三聚氰胺等之多元醇中,將ε-己內酯藉由開環加成反應而使開環骨架鍵結,於開環骨架之末端羥基使(甲基)丙烯醯基氯化物反應、或與(甲基)丙烯酸進行酯化反應而導入(甲基)丙烯醯基的公知方法,而可合成的含有ε-己內酯構造的多官能(甲基)丙烯酸酯。 Examples of the polyfunctional monomer having a caprolactone structure include trimethylolethane, bis(trimethylol)ethane, trimethylolpropane, and bis(trimethylol)propane. In a polyol such as pentaerythritol, dipentaerythritol, tripentaerythritol, glycerin, diglycerin or trimethylol melamine, ε-caprolactone is bonded to the ring-opening skeleton by a ring-opening addition reaction, and is opened to the ring skeleton. A known method in which a terminal hydroxyl group is reacted with a (meth) acrylonitrile-based chloride or a (meth)acrylic acid group is subjected to an esterification reaction with (meth)acrylic acid, and a synthetic ε-caprolactone-containing structure can be synthesized. Polyfunctional (meth) acrylate.

此種含有己內酯構造之多官能性單體,有如以下市售物。可列舉例如,作為使用二季戊四醇作為多元醇,並將其與丙烯酸與ε-己內酯進行酯化之物,係有由日本化藥(股)依KAYARAD DPCA系列所市售的DPCA-20、DPCA-30、DPCA-60及DPCA-120等,可較佳地使用作為本發明之感光性樹脂組成物的光聚合性單體。 Such a polyfunctional monomer having a caprolactone structure is as follows. For example, as a polyol which uses dipentaerythritol as a polyhydric alcohol and esterified with ε-caprolactone, it is a DPCA-20 which is marketed by the Nippon Kayaku Co., Ltd. according to the KAYARAD DPCA series. As the photopolymerizable monomer which is a photosensitive resin composition of the present invention, DPCA-30, DPCA-60, DPCA-120 and the like can be preferably used.

另外,作為ε-己內酯改質參-(2-丙烯醯氧基乙基)三聚異氰酸酯化合物的市售物,有新中村化學工業股份有限公司之A-9300-1CL(於1莫耳化合物中,具有1莫耳之ε-己內酯構造),於1莫耳化合物中具有此等ε-己內酯構造0.1~9莫耳、更佳為1~3莫耳者,亦可較佳地使用作為本發明之感光性樹脂組成物的光聚合性單體。 In addition, as a commercial product of ε-caprolactone modified ginseng-(2-propenyl methoxyethyl) trimeric isocyanate compound, there is A-9300-1CL of New Nakamura Chemical Industry Co., Ltd. (in 1 mol) The compound has a structure of 1 mol of ε-caprolactone, and has a structure of 0.1 to 9 mol, more preferably 1 to 3 mol, in the 1 mol compound. A photopolymerizable monomer which is a photosensitive resin composition of the present invention is preferably used.

又,使用季戊四醇作為多元醇,並將其與ε-己內酯經酯化後於末端羥基進一步使丙烯酸經酯化者,亦可較佳地使用作為本發明之感光性樹脂組成物的光聚合性單體。此等係於1莫耳化合物中具有ε-己內酯構造較佳為0.1~20莫耳者、更佳為1~12莫耳者、 特佳為1~4莫耳者。 Further, by using pentaerythritol as a polyol, esterifying it with ε-caprolactone, and further esterifying the acrylic acid at the terminal hydroxyl group, it is also preferred to use photopolymerization as the photosensitive resin composition of the present invention. Sexual monomer. These are those in which the ε-caprolactone structure is preferably 0.1 to 20 moles, more preferably 1 to 12 moles, in the 1 molar compound. Very good for 1 to 4 moles.

此等光聚合性單體可單獨使用1種,亦可併用2種以上。 These photopolymerizable monomers may be used alone or in combination of two or more.

[硫醇類] [thiol]

本發明之感光性樹脂組成物,為了高感度化、提升對基板之密黏性,較佳係亦含有硫醇類。 The photosensitive resin composition of the present invention preferably contains a mercaptan in order to increase the sensitivity and improve the adhesion to the substrate.

作為硫醇類之種類,可列舉例如己烷二硫酚、癸烷二硫酚、1,4-二甲基巰基苯、丁二醇雙硫丙酸酯、丁二醇雙硫乙醇酸酯、乙二醇雙硫乙醇酸酯、三羥甲基丙烷參硫乙醇酸酯、丁二醇雙硫丙酸酯、三羥甲基丙烷參硫丙酸酯、三羥甲基丙烷參硫乙醇酸酯、季戊四醇肆硫丙酸酯、季戊四醇肆硫乙醇酸酯、參羥基乙基參硫丙酸酯、乙二醇雙(3-巰基丁酸酯)、丙二醇雙(3-巰基丁酸酯)(簡稱PGMB)、丁二醇雙(3-巰基丁酸酯)、1,4-雙(3-巰基丁醯氧基)丁烷[商品名:Karenz(註冊商標,以下相同)MT BD1,昭和電工(股)製]、丁二醇三羥甲基丙烷參(3-巰基丁酸酯)、季戊四醇肆(3-巰基丁酸酯)(商品名:Karenz MT PE1,昭和電工(股)製)、季戊四醇參(3-巰基丁酸酯)、乙二醇雙(3-巰基異丁酸酯)、丁二醇雙(3-巰基異丁酸酯)、三羥甲基丙烷參(3-巰基異丁酸酯)、三羥甲基丙烷參(3-巰基丁酸酯)(簡稱TPMB)、三羥甲基丙烷參(2-巰基異丁酸酯)(簡稱TPMIB)及1,3,5-參(3-巰基丁氧基乙基)-1,3,5-三-2,4,6(1H,3H,5H)-三酮(商品名:Karenz MT NR1,昭和電工(股)製)等;此等各種可單獨使用1種,亦可混合2種以上使用。 Examples of the type of the mercaptan include hexane dithiol, decane dithiol, 1,4-dimethylnonylbenzene, butanediol dithiopropionate, butanediol dithioglycolate, and the like. Ethylene glycol dithioglycolate, trimethylolpropane thioglycolate, butanediol dithiopropionate, trimethylolpropane thiopropionate, trimethylolpropane thioglycolate , pentaerythritol thiopropionate, pentaerythritol thioglycolate, hydroxyethyl thiopropionate, ethylene glycol bis(3-mercaptobutyrate), propylene glycol bis(3-mercaptobutyrate) (abbreviation) PGMB), butanediol bis(3-mercaptobutyrate), 1,4-bis(3-mercaptobutyloxy)butane [trade name: Karenz (registered trademark, the same below) MT BD1, Showa Denko ( Co., Ltd.], butanediol trimethylolpropane ginseng (3-mercaptobutyrate), pentaerythritol bismuth (3-mercaptobutyrate) (trade name: Karenz MT PE1, manufactured by Showa Denko Co., Ltd.), pentaerythritol Ginseng (3-mercaptobutyrate), ethylene glycol bis(3-mercaptoisobutyrate), butanediol bis(3-mercaptoisobutyrate), trimethylolpropane ginseng (3-mercaptoisobutylate) Acid ester), trimethylolpropane ginseng (3-mercaptobutyrate) (abbreviation TPMB), trimethylolpropane ginseng (2-mercaptoisobutyrate) (TPMIB for short) and 1,3,5-gin(3-mercaptobutoxyethyl)-1,3,5-three -2,4,6(1H,3H,5H)-trione (trade name: Karenz MT NR1, manufactured by Showa Denko Co., Ltd.), etc.; these may be used alone or in combination of two or more.

較佳為上述PGMB、TPMB、TPMIB、Karenz MT BD1、 Karenz MT PE1、Karenz MT NR1等之多官能硫醇,其中更佳為Karenz MT BD1、Karenz MT PE1、Karenz MT NR1,特佳為Karenz MT PE1。 Preferably, the above PGMB, TPMB, TPMIB, Karenz MT BD1 A polyfunctional thiol such as Karenz MT PE1, Karenz MT NR1 or the like, more preferably Karenz MT BD1, Karenz MT PE1, Karenz MT NR1, and particularly preferably Karenz MT PE1.

此等硫醇類可單獨使用1種,亦可併用2種以上。 These thiols may be used alone or in combination of two or more.

[溶劑(e)] [solvent (e)]

本發明之感光性樹脂組成物通常係依鹼可溶性樹脂(d)、光聚合性單體、光聚合起始劑(c)、色材(a)、分散劑(b)及視需要所使用之各種材料,溶解或分散於溶劑(e)的狀態使用。 The photosensitive resin composition of the present invention is usually an alkali-soluble resin (d), a photopolymerizable monomer, a photopolymerization initiator (c), a color material (a), a dispersant (b), and optionally Various materials are used in a state of being dissolved or dispersed in the solvent (e).

作為本發明所使用之溶劑(e),較佳係選擇沸點(壓力1013.25[hPa]條件下,以下關於沸點均相同)為100~300℃之範圍的有機溶劑。更佳係具有120~280℃之沸點的有機溶劑。 The solvent (e) used in the present invention is preferably an organic solvent having a boiling point (under the pressure of 1013.25 [hPa], the following is the same with respect to the same boiling point) of 100 to 300 °C. More preferably, it is an organic solvent having a boiling point of 120 to 280 °C.

作為此種有機溶劑,可列舉例如下述者。 As such an organic solvent, the following are mentioned, for example.

乙二醇單甲基醚、乙二醇單乙基醚、乙二醇單丙基醚、乙二醇單丁基醚、丙二醇單甲基醚、丙二醇單乙基醚、丙二醇單正丁基醚、丙二醇第三丁基醚、二乙二醇單甲基醚、二乙二醇單乙基醚、二乙二醇單正丁基醚、甲氧基甲基戊醇、二丙二醇單乙基醚、二丙二醇單甲基醚、3-甲基-3-甲氧基丁醇、三乙二醇單甲基醚、三乙二醇單乙基醚及三丙二醇甲基醚般之二醇單烷基醚類;乙二醇二甲基醚、乙二醇二乙基醚、二乙二醇二甲基醚、二乙二醇二乙基醚、二乙二醇二丙基醚、二乙二醇二丁基醚及二丙二醇二甲基醚般之二醇二烷基醚類;乙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、乙二醇單正丁基醚乙酸酯、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚 乙酸酯、丙二醇單丙基醚乙酸酯、丙二醇單丁基醚乙酸酯、甲氧基丁基乙酸酯、3-甲氧基丁基乙酸酯、甲氧基戊基乙酸酯、2-乙二醇單甲基醚乙酸酯、二乙二醇單乙基醚乙酸酯、二乙二醇單正丁基醚乙酸酯、二丙二醇單甲基醚乙酸酯、三乙二醇單甲基醚乙酸酯、三乙二醇單乙基醚乙酸酯及3-甲基-3-甲氧基丁基乙酸酯般之二醇烷基醚乙酸酯類;乙二醇二乙酸酯、1,3-丁二醇二乙酸酯及1,6-己醇二乙酸酯等之二醇二乙酸酯類;環己醇乙酸酯等之烷基乙酸酯類;戊基醚、二乙基醚、二丙基醚、二異丙基醚、二丁基醚、二戊基醚、乙基異丁基醚及二己基醚般之醚類;丙酮、甲基乙基酮、甲基戊基酮、甲基異丙基酮、甲基異戊基酮、二異丙基酮、二異丁基酮、甲基異丁基酮、環己酮、乙基戊基酮、甲基丁基酮、甲基己基酮、甲基壬基酮及甲氧基甲基戊酮般之酮類;乙醇、丙醇、丁醇、己醇、環己醇、乙二醇、丙二醇、丁二醇、二乙二醇、二丙二醇、三乙二醇、甲氧基甲基戊醇、甘油及苄醇般之1價或多價醇類;正戊烷、正辛烷、二異丁烯、正己烷、己烯、異戊二烯、二戊烯及十二烷般之脂肪族烴類;環己烷、甲基環己烷、甲基環己烯及聯環己烷般之脂環式烴類;苯、甲苯、二甲苯及異丙苯般之芳香族烴類;甲酸戊酯、甲酸乙酯、醋酸乙酯、醋酸丁酯、醋酸丙 酯、醋酸戊酯、異丁酸甲酯、乙二醇乙酸酯、、丙酸乙酯、丙酸丙酯、丁酸丁酯、丁酸異丁酯、異丁酸甲酯、辛酸乙酯、硬脂酸丁酯、苯甲酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-甲氧基丙酸丙酯、3-甲氧基丙酸丁酯及γ-丁內酯般之鏈狀或環狀酯類;3-甲氧基丙酸及3-乙氧基丙酸般之烷氧基羧酸類;氯丁烷及氯戊烷般之鹵化烴類;甲氧基甲基戊酮般之醚酮類;乙腈、苯腈般之腈類等;作為上述該當之市售溶劑,可列舉例如礦油精、Varsol #2、Apco #18 Solvent、Apco Thinner、Socal Solvent No.1及No.2、Solvesso #150、Shell TS28、Solvent、卡必醇、乙基卡必醇、丁基卡必醇、甲基賽珞蘇(「賽珞蘇」為註冊商標,以下相同)、乙基賽珞蘇、乙基賽珞蘇乙酸酯、甲基賽珞蘇乙酸酯及二甘二甲醚(均為商品名)等。 Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether , propylene glycol tert-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, methoxymethylpentanol, dipropylene glycol monoethyl ether , dipropylene glycol monomethyl ether, 3-methyl-3-methoxybutanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether and tripropylene glycol methyl ether like glycol monoalkane Ether ether; ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene Alcohol dibutyl ether and dipropylene glycol dimethyl ether like glycol dialkyl ether; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl Ethyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether Acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate, methoxybutyl acetate, 3-methoxybutyl acetate, methoxypentyl acetate , 2-ethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol mono-n-butyl ether acetate, dipropylene glycol monomethyl ether acetate, three Ethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether acetate, and 3-methyl-3-methoxybutyl acetate-like glycol alkyl ether acetate; a glycol diacetate such as diol diacetate, 1,3-butylene glycol diacetate or 1,6-hexanol diacetate; an alkyl acetate such as cyclohexanol acetate a class of ethers such as amyl ether, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, dipentyl ether, ethyl isobutyl ether and dihexyl ether; acetone, Ethyl ketone, methyl amyl ketone, methyl isopropyl ketone, methyl isoamyl ketone, diisopropyl ketone, diisobutyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl Ethyl ketone, methyl butyl ketone, methyl hexyl ketone, methyl decyl ketone and methoxy methyl pentanone Ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, butanediol, diethylene glycol, dipropylene glycol, triethylene glycol, methoxymethylpentanol, glycerol and benzyl alcohol Monovalent or polyvalent alcohols; n-pentane, n-octane, diisobutylene, n-hexane, hexene, isoprene, dipentene and dodecane-like aliphatic hydrocarbons; cyclohexane, Methylcyclohexane, methylcyclohexene and cyclohexane-like alicyclic hydrocarbons; aromatic hydrocarbons such as benzene, toluene, xylene and cumene; amyl formate, ethyl formate, acetic acid Ethyl ester, butyl acetate, acrylic acid Ester, amyl acetate, methyl isobutyrate, ethylene glycol acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl octanoate , butyl stearate, ethyl benzoate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, 3-methoxypropionic acid Ester, 3-methoxypropionic acid propyl ester, butyl 3-methoxypropionate and γ-butyrolactone-like chain or cyclic esters; 3-methoxypropionic acid and 3-ethoxyl Propionic acid like alkoxycarboxylic acids; chlorobutane and chloropentane-like halogenated hydrocarbons; methoxymethyl pentanone-like ether ketones; acetonitrile, benzonitrile-like nitriles, etc.; Commercially available solvents include, for example, mineral spirits, Varsol #2, Apco #18 Solvent, Apco Thinner, Socal Solvent No. 1 and No. 2, Solvesso #150, Shell TS28, Solvent, carbitol, ethyl carbene Alcohol, butyl carbitol, methyl acesulfame ("Cerma" is a registered trademark, the same below), ethyl cyproterone, ethyl cyproterone acetate, methyl cyproterone acetate And diglyme (all are trade names) and the like.

此等有機溶劑,可單獨使用,亦可併用2種以上。 These organic solvents may be used singly or in combination of two or more.

在以光刻法形成彩色濾光片之畫素或黑色矩陣時,較佳係選擇沸點100~200℃之範圍者作為有機溶劑。更佳係具有120~170℃之沸點者。 When a pixel or a black matrix of a color filter is formed by photolithography, it is preferred to select a range of a boiling point of 100 to 200 ° C as an organic solvent. More preferred is a boiling point of 120 to 170 ° C.

上述有機溶劑中,由塗佈性、表面張力等之平衡良好、組成物中之構成成分的溶解度較高的觀點而言,較佳係二醇烷基醚乙酸酯類。 Among the above organic solvents, a glycol alkyl ether acetate is preferred because the balance between coatability and surface tension is good, and the solubility of constituent components in the composition is high.

又,二醇烷基醚乙酸酯類可單獨使用,亦可與其他有機溶劑併用。作為併用之有機溶劑,特佳為二醇單烷基醚類。其中, 由組成物中之構成成分之溶解性而言,特佳為丙二醇單甲基醚。 Further, the glycol alkyl ether acetates may be used singly or in combination with other organic solvents. As the organic solvent to be used in combination, a glycol monoalkyl ether is particularly preferred. among them, From the viewpoint of solubility of the constituent components in the composition, propylene glycol monomethyl ether is particularly preferred.

尚且,二醇單烷基醚類極性高,若添加量過多則有顏料等之色材(a)容易凝集、其後所得之感光性樹脂組成物的黏度上升等保存穩定性降低的傾向,故溶劑(e)中之二醇單烷基醚類的比例較佳為5~30質量%、更佳為5~20質量%。 In addition, the diol monoalkyl ether has a high polarity, and if the amount of the diol is too large, the color material (a) such as a pigment tends to aggregate, and the storage stability of the photosensitive resin composition obtained thereafter increases, and the storage stability tends to decrease. The proportion of the diol monoalkyl ether in the solvent (e) is preferably from 5 to 30% by mass, more preferably from 5 to 20% by mass.

又,作為溶劑(e),較佳亦可併用具有150℃以上之沸點的有機溶劑(以下有時稱為「高沸點溶劑」)。藉由併用此種高沸點溶劑,則感光性樹脂組成物難以乾燥,但具有防止組成物中色材(a)之均勻分散狀態因急遽乾燥而被破壞的效果。亦即,具有防止例如狹縫噴嘴前端之因色材(a)等之析出‧固化而造成之異物缺陷發生的效果。 Further, as the solvent (e), an organic solvent having a boiling point of 150 ° C or higher (hereinafter sometimes referred to as "high boiling point solvent") may preferably be used in combination. When such a high boiling point solvent is used in combination, the photosensitive resin composition is difficult to dry, but has an effect of preventing the uniform dispersion state of the color material (a) in the composition from being destroyed by rapid drying. That is, it has an effect of preventing, for example, the occurrence of foreign matter defects caused by precipitation of the color material (a) or the like at the tip end of the slit nozzle.

由此種效果較高的觀點而言,上述各種溶劑中,特佳為二乙二醇單正丁基醚、二乙二醇單正丁基醚乙酸酯、及二乙二醇單乙基醚乙酸酯。 From the viewpoint of such a high effect, among the above various solvents, particularly preferred are diethylene glycol mono-n-butyl ether, diethylene glycol mono-n-butyl ether acetate, and diethylene glycol monoethyl. Ether acetate.

溶劑(e)中之高沸點溶劑的含有比例,較佳為3~50質量%、更佳為5~40質量%、特佳為5~30質量%。若高沸點溶劑之量過少,有例如於狹縫噴嘴前端色材(a)等析出‧固化而引起異物缺陷的可能性;又,若過多,則組成物之乾燥溫度變慢,在後述之彩色濾光片製造步驟中,有引起減壓乾燥製程之效率不良、以及預烤之銷痕跡等問題之虞。 The content ratio of the high boiling point solvent in the solvent (e) is preferably from 3 to 50% by mass, more preferably from 5 to 40% by mass, even more preferably from 5 to 30% by mass. When the amount of the high-boiling solvent is too small, for example, the coloring material (a) at the tip end of the slit nozzle may be precipitated and solidified to cause foreign matter defects; if too large, the drying temperature of the composition may be slow, and color will be described later. In the filter manufacturing step, there are problems such as poor efficiency in causing the vacuum drying process and pre-baked pin marks.

尚且,沸點150℃以上之高沸點溶劑亦可為二醇烷基醚乙酸酯類、或二醇單烷基醚類,此時,亦可另外含有沸點150℃以上之高沸點溶劑。 Further, the high boiling point solvent having a boiling point of 150 ° C or higher may be a glycol alkyl ether acetate or a glycol monoalkyl ether. In this case, a high boiling point solvent having a boiling point of 150 ° C or higher may be additionally contained.

作為較佳之高沸點溶劑,例如上述各種溶劑中,可列舉二乙二 醇單正丁基醚乙酸酯、二乙二醇單乙基醚乙酸酯、二丙二醇甲基醚乙酸酯、1,3-丁二醇二乙酸酯、1,6-己醇二乙酸酯及三乙酸甘油酯等。 As a preferable high boiling point solvent, for example, among the above various solvents, diethyl 2 can be cited. Alcohol mono-n-butyl ether acetate, diethylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,6-hexanol Acetate and triacetin, etc.

[感光性樹脂組成物之其他調配成分] [Other compounding ingredients of photosensitive resin composition]

本發明之感光性樹脂組成物中,除了上述成分之外,可適當調配密黏提升劑、塗佈性提升劑、顯影改良劑、紫外線吸收劑、抗氧化劑、矽烷偶合劑、界面活性劑、顏料衍生物、聚合加速劑、光酸產生劑、交聯劑、可塑劑、保存穩定劑、表面保護劑、有機羧酸、有機羧酸酐、顯影改良劑或熱聚合防止劑等。 In the photosensitive resin composition of the present invention, in addition to the above components, a tackifier, a coating enhancer, a development improver, an ultraviolet absorber, an antioxidant, a decane coupling agent, a surfactant, and a pigment may be appropriately formulated. A derivative, a polymerization accelerator, a photoacid generator, a crosslinking agent, a plasticizer, a storage stabilizer, a surface protective agent, an organic carboxylic acid, an organic carboxylic anhydride, a development improver, or a thermal polymerization inhibitor.

<密黏提升劑> <Adhesive Lifting Agent>

為了改善與基板間之密黏性,亦可使密黏提升劑含於本發明之感光性樹脂組成物中。作為密黏提升劑,可列舉例如矽烷偶合劑、磷酸系密黏提升劑及其他之密黏提升劑等。 In order to improve the adhesion to the substrate, a dense adhesion promoter may be contained in the photosensitive resin composition of the present invention. Examples of the adhesion promoter include a decane coupling agent, a phosphoric acid adhesion promoter, and other dense adhesion promoters.

作為矽烷偶合劑之種類,可將環氧系、(甲基)丙烯酸系或胺基系等各種者單獨使用1種,或混合2種以上使用。 As the type of the decane coupling agent, one type of the epoxy group, the (meth)acrylic type, or the amine group may be used alone or two or more types may be used in combination.

作為較佳之矽烷偶合劑,可列舉例如3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷及3-甲基丙烯醯氧基丙基三甲氧基矽烷等之(甲基)丙烯醯氧基矽烷類;2-(3,4-環氧基環己基)乙基三甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷及3-環氧丙氧基丙基三乙氧基矽烷等之環氧矽烷類;3-脲丙基三乙氧基矽烷等之脲矽烷類;以及3-異氰酸酯丙基三乙氧基矽烷等之異氰酸酯矽烷類。特佳可列舉環氧矽烷類之矽烷偶合劑。 Preferred examples of the decane coupling agent include (meth)acryl oxime such as 3-methacryloxypropylmethyldimethoxydecane and 3-methylpropoxypropyltrimethoxydecane. Oxydecanes; 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropylmethyl Epoxy decanes such as diethoxy decane and 3-glycidoxypropyl triethoxy decane; urea decanes such as 3-ureidotriethoxy decane; and 3-isocyanate propyl trisole An isocyanate decane such as ethoxy decane. Particularly preferred are decane coupling agents for epoxy decanes.

作為磷酸系密黏提升劑,較佳為含有(甲基)丙烯醯氧 基之磷酸酯類,其中較佳為下述一般式(g1)、(g2)或(g3)所示者。 As the phosphate-based dense adhesion promoter, it is preferred to contain (meth) propylene oxime The phosphates of the group are preferably those represented by the following general formula (g1), (g2) or (g3).

上述一般式(g1)、(g2)或(g3)中,R51表示氫原子或甲基,l及l'為1~10之整數,m為1、2或3。 In the above general formula (g1), (g2) or (g3), R 51 represents a hydrogen atom or a methyl group, and l and l' are integers of 1 to 10, and m is 1, 2 or 3.

作為其他之密黏提升劑,可列舉例如TEGO*Add Bond LTH(Evonik公司製)等。 Other examples of the adhesion promoter include TEGO*Add Bond LTH (manufactured by Evonik Co., Ltd.).

此等磷酸系密黏提升劑及其他之密黏提升劑,可單獨使用1種,亦可組合2種以上使用。 These phosphoric acid-based adhesion promoters and other adhesion promoters may be used alone or in combination of two or more.

<界面活性劑> <Surfactant>

本發明之感光性樹脂組成物中,為了提升塗佈性,亦可含有界面活性劑。 The photosensitive resin composition of the present invention may contain a surfactant in order to improve coatability.

作為界面活性劑,可使用例如陰離子系、陽離子系、非離子系、兩性界面活性劑等各種者。其中,由對各種特性造成不良影響的可能性較低的觀點而言,較佳為使用非離子系界面活性劑,尤其是氟系或矽系之界面活性劑在塗佈性方面具有效果。 As the surfactant, various types such as an anionic system, a cationic system, a nonionic system, and an amphoteric surfactant can be used. Among them, from the viewpoint of a low possibility of adversely affecting various characteristics, it is preferred to use a nonionic surfactant, and particularly a fluorine- or lanthanide-based surfactant has an effect on coatability.

作為此種界面活性劑,可列舉例如TSF4460(GE東芝Silicone公司製)、DFX-18(NEOS公司製)、BYK-300、BYK-325、 BYK-330(BYK Chemie公司製)、KP340(信越Silicone公司製)、F-470、F-475、F-478、F-559(大日本油墨化學工業公司製)、SH7PA(東麗Silicone公司製)、DS-401(大金公司製)、L-77(日本Unicar公司製)及FC4430(住友3M公司製)等。 Examples of such a surfactant include TSF4460 (GE Toshiba Silicone Co., Ltd.), DFX-18 (manufactured by NEOS Co., Ltd.), BYK-300, and BYK-325. BYK-330 (manufactured by BYK Chemie Co., Ltd.), KP340 (manufactured by Shin-Etsu Silicone Co., Ltd.), F-470, F-475, F-478, F-559 (manufactured by Dainippon Ink and Chemicals, Inc.), SH7PA (manufactured by Toray Silicone Co., Ltd.) ), DS-401 (manufactured by Daikin Corporation), L-77 (manufactured by Unicar Corporation of Japan), and FC4430 (manufactured by Sumitomo 3M Co., Ltd.).

此等界面活性劑可使用1種,亦可依任意組合及比率併用2種以上。 These surfactants may be used alone or in combination of two or more kinds in any combination and in any ratio.

<顏料衍生物> <Pigment Derivative>

本發明之感光性樹脂組成物中,為了提升分散性、保存性,亦可含有顏料衍生物,尤其是由分散性提升之觀點而言,較佳為分散劑(b)與顏料衍生物之併用。 The photosensitive resin composition of the present invention may contain a pigment derivative in order to enhance dispersibility and preservability, and in particular, from the viewpoint of improving dispersibility, it is preferred to use a dispersant (b) in combination with a pigment derivative. .

作為顏料衍生物,可列舉例如偶氮系、酞菁系、喹吖酮系、苯并咪唑酮系、喹啉黃系、異吲哚啉系、二系、蒽醌系、陰丹士林系、苝系、芘酮系、二酮吡咯并吡咯系及二系。其中較佳為酞菁系或喹啉黃系。 Examples of the pigment derivative include an azo type, a phthalocyanine type, a quinophthalone type, a benzimidazolone type, a quinoline yellow type, an isoporphyrin type, and the like. Department, lanthanide, indanthrene, lanthanide, anthrone, diketopyrrolopyrrole and system. Among them, a phthalocyanine system or a quinoline yellow system is preferred.

作為顏料衍生物之取代基,可列舉例如磺酸基、磺醯胺基及其4級鹽、酞醯亞胺甲基、二烷胺基烷基、羥基、羧基或醯胺基等直接或經由烷基、芳基或雜環基等而鍵結於顏料骨架者;較佳為磺酸基。又,此等取代基亦可於1個顏料骨架中進行複數取代。 Examples of the substituent of the pigment derivative include a sulfonic acid group, a sulfonylamino group and a 4-stage salt thereof, a quinone imine methyl group, a dialkylaminoalkyl group, a hydroxyl group, a carboxyl group or a decylamino group, etc., directly or via An alkyl group, an aryl group or a heterocyclic group or the like bonded to a pigment skeleton; preferably a sulfonic acid group. Further, these substituents may be subjected to plural substitution in one pigment skeleton.

作為顏料衍生物之具體例,可列舉酞菁之磺酸衍生物、喹啉黃之磺酸衍生物、蒽醌之磺酸衍生物、喹吖酮之磺酸衍生物、二酮吡咯并吡咯之磺酸衍生物及二之磺酸衍生物等。 Specific examples of the pigment derivative include a sulfonic acid derivative of phthalocyanine, a sulfonic acid derivative of quinoline yellow, a sulfonic acid derivative of hydrazine, a sulfonic acid derivative of quinacridone, and a diketopyrrolopyrrole. Sulfonic acid derivative and two Sulfonic acid derivatives and the like.

此等可單獨使用1種,亦可併用2種以上。 These may be used alone or in combination of two or more.

[感光性樹脂組成物中之成分調配量] [Component Composition in Photosensitive Resin Composition]

本發明之感光性樹脂組成物之色材(a)的含有比例,係相對於感光性樹脂組成物中之總固形份量,通常為1質量%以上、較佳為5質量%以上、更佳為10質量%以上、再更佳為20質量%以上、又更佳為30質量%以上、特佳為40質量%以上;且通常為70質量%以下、較佳為65質量%以下、更佳為60質量%以下。藉由設為上述下限值以上,有可防止由於為了獲得既定色濃度而膜厚增厚所造成之液晶單元化時之間隙控制等的不良影響的傾向;又,藉由設為上述上限值以下,有容易得到充分之影像形成性的傾向。 The content ratio of the color material (a) of the photosensitive resin composition of the present invention is usually 1% by mass or more, preferably 5% by mass or more, more preferably 5% by mass or more based on the total solid content of the photosensitive resin composition. 10% by mass or more, more preferably 20% by mass or more, still more preferably 30% by mass or more, particularly preferably 40% by mass or more; and usually 70% by mass or less, preferably 65% by mass or less, more preferably 60% by mass or less. When the value is equal to or higher than the lower limit value, it is possible to prevent the adverse effect such as the gap control during the liquid crystal cell formation due to the increase in the film thickness in order to obtain a predetermined color density, and the upper limit is also set. Below the value, there is a tendency to easily obtain sufficient image formation properties.

本發明之感光性樹脂組成物係如上述般可使用於各種用途,由本發明之感光性樹脂組成物所造成之優越之影像形成性,係在使用於彩色濾光片用黑色矩陣之形成時特別具有效果。 The photosensitive resin composition of the present invention can be used for various purposes as described above, and the excellent image formation property by the photosensitive resin composition of the present invention is particularly useful when forming a black matrix for a color filter. Has an effect.

在將本發明之感光性樹脂組成物使用於黑色矩陣時,若使用上述碳黑或鈦黑等黑色色材作為色材(a),或將黑色以外之色材混合複數種類並調整為黑色使用即可。其中,由遮光性之觀點而言,特佳為使用碳黑。 When the photosensitive resin composition of the present invention is used in a black matrix, a black color material such as carbon black or titanium black is used as the color material (a), or a color material other than black is mixed and adjusted to black. Just fine. Among them, carbon black is particularly preferred from the viewpoint of light blocking properties.

本發明之感光性樹脂組成物所造成的效果,尤其在黑色顏料之顏料濃度變大的領域中可有效發揮。如上所述,近年來為了提升遮光度而必須提高黑色顏料濃度,但由具有大幅產生本發明效果之傾向的觀點而言,黑色顏料之含有比例,相對於感光性樹脂組成物之總固形份,較佳為40質量%以上、更佳為45質量%以上、再更佳為48質量%以上、特佳為50質量%以上。 The effect by the photosensitive resin composition of the present invention can be effectively exhibited particularly in the field of increasing the pigment concentration of the black pigment. As described above, in recent years, in order to increase the opacity, it is necessary to increase the black pigment concentration. However, from the viewpoint of having a tendency to greatly produce the effects of the present invention, the content ratio of the black pigment is relative to the total solid content of the photosensitive resin composition. It is preferably 40% by mass or more, more preferably 45% by mass or more, still more preferably 48% by mass or more, and particularly preferably 50% by mass or more.

本發明之感光性樹脂組成物中,藉由依上述範圍內含有黑色顏料,有可獲得遮光性(光學密度、OD值)高之著色感光性 樹脂組成物的傾向。具體而言,藉由將黑色顏料之含有比例設為相對於感光性樹脂組成物之總固形份為45質量%以上,在使用本發明之感光性樹脂組成物形成厚1μm之黑色矩陣時有使光學密度成為4.0以上之值的傾向。此光學密度更佳為4.2以上。 In the photosensitive resin composition of the present invention, by containing a black pigment in the above range, coloring sensitivity which is high in light-shielding property (optical density, OD value) can be obtained. The tendency of the resin composition. Specifically, when the content ratio of the black pigment is 45 mass% or more based on the total solid content of the photosensitive resin composition, when the photosensitive resin composition of the present invention is used to form a black matrix having a thickness of 1 μm, The optical density tends to be a value of 4.0 or more. This optical density is more preferably 4.2 or more.

一般而言,在遮光性較高的情況,紫外線難以穿透至膜深部,而有尤其是在基板與細線之密黏部分藉光聚合所進行之交聯變弱的傾向,但在使用本發明之感光性樹脂組成物時,即使顏料濃度較高,仍可顯著地確認到本發明效果。作為本發明之感光性樹脂組成物的顏料濃度,相對於固形份為40~65質量%特別有效果。 In general, in the case where the light-shielding property is high, it is difficult for the ultraviolet rays to penetrate to the deep portion of the film, and there is a tendency that the crosslinking by the photopolymerization is weakened particularly in the dense portion of the substrate and the fine line, but the present invention is used. In the case of the photosensitive resin composition, the effect of the present invention can be remarkably confirmed even when the pigment concentration is high. The pigment concentration of the photosensitive resin composition of the present invention is particularly effective in a solid content of 40 to 65 mass%.

尚且,本發明之感光性樹脂組成物並不限於顏料濃度較高之情況,即使在較低的情況下亦可發揮本發明效果。在感光性樹脂組成物中僅變更了顏料濃度時,視顏料濃度,有在顯影後之熱硬化處理時發生熱變形而細線之線寬稍微變粗或變細的情形,但藉由調整光聚合性單體或光聚合性起始劑等之成分量,或調整曝光量,可得到所需之線寬的細線。 Further, the photosensitive resin composition of the present invention is not limited to a case where the pigment concentration is high, and the effect of the present invention can be exhibited even at a low level. When only the pigment concentration is changed in the photosensitive resin composition, the pigment concentration may be thermally deformed during the heat curing treatment after development, and the line width of the fine line may be slightly thicker or thinner, but by adjusting the photopolymerization. The amount of the component such as a monomer or a photopolymerizable initiator or the amount of exposure can be adjusted to obtain a thin line having a desired line width.

本發明之感光性樹脂組成物之分散劑(b)的含有比例並無特別限定,於感光性樹脂組成物之總固形份中,通常為50質量%以下、較佳為30質量%以下、更佳為20質量%以下、再更佳為15質量%以下;且通常為1質量%以上、較佳為3質量%以上、更佳為5質量%以上、再更佳為8質量%以上。 The content ratio of the dispersing agent (b) of the photosensitive resin composition of the present invention is not particularly limited, and is usually 50% by mass or less, preferably 30% by mass or less, based on the total solid content of the photosensitive resin composition. It is preferably 20% by mass or less, more preferably 15% by mass or less, and usually 1% by mass or more, preferably 3% by mass or more, more preferably 5% by mass or more, still more preferably 8% by mass or more.

又,分散劑(b)之含有比例,相對於色材(a)100質量份,通常為5質量份以上、較佳為10質量份以上、更佳為15質量份以上,且通常為200質量份以下、較佳為80質量份以下、更佳為50質量份以下、再更佳為40質量份以下、特佳為30質量份以 下。藉由將分散劑(b)之含有比例設為上述下限值以上,有容易得到充分之分散性的傾向,藉由設為上述上限值以下,相對地可充分確保其他成分之含有比例,有容易得到所需之色濃度、所需之感度、所需之成膜性等的傾向。 In addition, the content ratio of the dispersing agent (b) is usually 5 parts by mass or more, preferably 10 parts by mass or more, more preferably 15 parts by mass or more, and usually 200% by mass based on 100 parts by mass of the color material (a). The amount is preferably 80 parts by mass or less, more preferably 50 parts by mass or less, still more preferably 40 parts by mass or less, and particularly preferably 30 parts by mass or less. under. When the content ratio of the dispersing agent (b) is at least the above lower limit value, it is easy to obtain sufficient dispersibility, and by setting it as the upper limit or less, it is possible to sufficiently ensure the content ratio of other components. There is a tendency to easily obtain a desired color density, a desired sensitivity, a desired film forming property, and the like.

尚且,分散劑(b)中所佔有之聚胺基甲酸酯分散劑(b-1)的比例,由更有效地獲得因使用聚胺基甲酸酯分散劑(b-1)所造成之本發明效果的觀點而言,較佳為50質量%以上、更佳為60質量%以上、再更佳為70質量%以上、又更佳為80質量%以上、特佳為90質量%以上;且通常為100質量%以下。 Further, the ratio of the polyurethane dispersant (b-1) occupied in the dispersing agent (b) is more effectively obtained by using the polyurethane dispersant (b-1). From the viewpoint of the effects of the present invention, it is preferably 50% by mass or more, more preferably 60% by mass or more, still more preferably 70% by mass or more, still more preferably 80% by mass or more, and particularly preferably 90% by mass or more; It is usually 100% by mass or less.

本發明之感光性樹脂組成物中,相對於鹼可溶性樹脂(d)100質量份,聚胺基甲酸酯分散劑(b-1)之含有比例通常為2質量份以上、較佳為5質量份以上、更佳為10質量份以上、再更佳為20質量份以上、又更佳為30質量份以上、特佳為40質量份以上。且,通常為500質量份以下、較佳為300質量份以下、更佳為100質量份以下、再更佳為80質量份以下、特佳為60質量份以下。 In the photosensitive resin composition of the present invention, the content of the polyurethane dispersant (b-1) is usually 2 parts by mass or more, preferably 5 parts by mass based on 100 parts by mass of the alkali-soluble resin (d). The amount is more than 10 parts by mass, more preferably 20 parts by mass or more, still more preferably 30 parts by mass or more, and particularly preferably 40 parts by mass or more. In general, it is usually 500 parts by mass or less, preferably 300 parts by mass or less, more preferably 100 parts by mass or less, still more preferably 80 parts by mass or less, and particularly preferably 60 parts by mass or less.

本發明之感光性樹脂組成物的光聚合起始劑(c)的含有比例,相對於本發明之感光性樹脂組成物的總固形份,通常為0.1質量%以上、較佳為0.5質量%以上、更佳為0.7質量%以上、再更佳為1質量%以上、又更佳為3質量%以上、特佳為5質量%以上;且通常為30質量%以下、較佳為20質量%以下、更佳為15質量%以下、再更佳為10質量%以下。藉由將光聚合起始劑(c)之含有比例設為上述下限值以上,有可得到充分感度的傾向;又,藉由設為上述上限值以下,有抑制未曝光部分對顯影液之溶解性降低、容易防止顯影不良的傾向。 The content ratio of the photopolymerization initiator (c) of the photosensitive resin composition of the present invention is usually 0.1% by mass or more, preferably 0.5% by mass or more based on the total solid content of the photosensitive resin composition of the present invention. More preferably, it is 0.7% by mass or more, more preferably 1% by mass or more, still more preferably 3% by mass or more, particularly preferably 5% by mass or more, and usually 30% by mass or less, preferably 20% by mass or less. More preferably, it is 15 mass% or less, and still more preferably 10 mass% or less. When the content ratio of the photopolymerization initiator (c) is at least the above lower limit value, sufficient sensitivity may be obtained. Further, by setting it as the upper limit or less, it is possible to suppress the unexposed portion to the developer. The solubility is lowered, and the development failure tends to be easily prevented.

尤其是光聚合起始劑(c)中所佔之肟酯光聚合起始劑(c-1)的比例,通常為10質量%以上、較佳為50質量%以上、更佳為90質量%以上;且通常為100質量%以下。藉由將肟酯光聚合起始劑(c-1)之含有比例設為上述下限值以上,則於本發明所使用之聚胺基甲酸酯分散劑(b-1)與鹼可溶性樹脂(d)的組合中,紫外線照射後、對鹼顯影液或高溫處理的耐性良好,可提升高細微之細線的形成性。 In particular, the proportion of the oxime ester photopolymerization initiator (c-1) in the photopolymerization initiator (c) is usually 10% by mass or more, preferably 50% by mass or more, and more preferably 90% by mass. The above; and usually 100% by mass or less. When the content ratio of the oxime ester photopolymerization initiator (c-1) is at least the above lower limit, the polyurethane dispersant (b-1) and the alkali-soluble resin used in the present invention are used. In the combination of (d), after the ultraviolet irradiation, the resistance to the alkali developer or the high-temperature treatment is good, and the formation of fine lines of fineness can be improved.

又,相對於聚胺基甲酸酯分散劑(b-1)與鹼可溶性樹脂(d)與光聚合性單體的合計量100質量份,光聚合起始劑(c)之含有比例通常為1質量份以上、較佳為2質量份以上、更佳為3質量份以上。且,通常為100質量份以下、更佳為60質量份以下、再更佳為40質量份以下。 In addition, the content ratio of the photopolymerization initiator (c) is usually 100 parts by mass based on 100 parts by mass of the total amount of the polyurethane-soluble dispersant (b-1) and the alkali-soluble resin (d) and the photopolymerizable monomer. 1 part by mass or more, preferably 2 parts by mass or more, more preferably 3 parts by mass or more. Further, it is usually 100 parts by mass or less, more preferably 60 parts by mass or less, still more preferably 40 parts by mass or less.

在與光聚合起始劑(c)一起使用加速劑的情況,加速劑的含有比例,相對於本發明之感光性樹脂組成物的總固形份,通常為0質量%以上、較佳為0.02質量%以上,且通常為10質量%以下、較佳為5質量%以下;加速劑係相對於光聚合起始劑(c),可依較佳0.1~50質量%、更佳為0.1~10質量%的比例使用。 In the case where an accelerator is used together with the photopolymerization initiator (c), the content ratio of the accelerator is usually 0% by mass or more, preferably 0.02% by mass based on the total solid content of the photosensitive resin composition of the present invention. % or more, and usually 10% by mass or less, preferably 5% by mass or less; and the accelerator may be preferably 0.1 to 50% by mass, more preferably 0.1 to 10% by mass based on the photopolymerization initiator (c). The percentage of % is used.

又,在使用增感色素的情況,本發明之感光性樹脂組成物中所含之增感色素的含有比例,於感光性樹脂組成物中之總固形份中,通常為0~20質量%、較佳為0~15質量%、更佳為0~10質量%。 In addition, when the sensitizing dye is used, the content ratio of the sensitizing dye contained in the photosensitive resin composition of the present invention is usually 0 to 20% by mass in the total solid content of the photosensitive resin composition. It is preferably 0 to 15% by mass, more preferably 0 to 10% by mass.

本發明之感光性樹脂組成物之鹼可溶性樹脂(d)的含有比例,相對於本發明之感光性樹脂組成物的總固形份,通常為5質量%以上、較佳為10質量%以上、更佳為15質量%以上、再更 佳為20質量%以上;且通常為85質量%以下、較佳為80質量%以下、更佳為70質量%以下、再更佳為60質量%以下、又更佳為50質量%以下、特佳為40質量%以下、最佳為30質量%以下。 The content ratio of the alkali-soluble resin (d) of the photosensitive resin composition of the present invention is usually 5% by mass or more, preferably 10% by mass or more, based on the total solid content of the photosensitive resin composition of the present invention. Good for 15% by mass or more, and even more It is preferably 20% by mass or more; and usually 85% by mass or less, preferably 80% by mass or less, more preferably 70% by mass or less, still more preferably 60% by mass or less, and still more preferably 50% by mass or less. It is preferably 40% by mass or less, and most preferably 30% by mass or less.

藉由將鹼可溶性樹脂(d)之含有比例設為上述下限值以上,有抑制未曝光部分對顯影液之溶解性降低、容易防止顯影不良誘發的傾向。又,藉由設為上述上限值以下,有可將顯影液對曝光部之滲透性維持為較低的傾向,且有容易提升畫素之銳性或密黏性的傾向。 When the content ratio of the alkali-soluble resin (d) is at least the above lower limit value, the solubility of the unexposed portion in the developer is suppressed from being lowered, and the development failure is easily prevented. In addition, the permeability of the developer to the exposed portion tends to be low, and the sharpness or adhesion of the pixel tends to be improved.

尚且,如上述般,本發明之感光性樹脂組成物作為鹼可溶性樹脂(d),較佳係含有上述環氧基(甲基)丙烯酸酯樹脂(D1-1)、環氧基(甲基)丙烯酸酯樹脂(D1-2)、(D2-1)樹脂、(D2-2)樹脂、(D2-3)樹脂及(D2-4)樹脂之至少一種;更佳係含有環氧基(甲基)丙烯酸酯樹脂(D1-1)、環氧基(甲基)丙烯酸酯樹脂(D1-2)樹脂、(D2-1)樹脂、(D2-3)樹脂;特佳為含有環氧基(甲基)丙烯酸酯樹脂(D1-1)及/或環氧基(甲基)丙烯酸酯樹脂(D1-2)。 In addition, as the alkali-soluble resin (d), the photosensitive resin composition of the present invention preferably contains the above epoxy (meth) acrylate resin (D1-1) and epoxy group (methyl). At least one of an acrylate resin (D1-2), a (D2-1) resin, a (D2-2) resin, a (D2-3) resin, and a (D2-4) resin; more preferably an epoxy group (methyl group) ) acrylate resin (D1-1), epoxy (meth) acrylate resin (D1-2) resin, (D2-1) resin, (D2-3) resin; particularly preferably contains epoxy group (A) Acrylate resin (D1-1) and/or epoxy (meth) acrylate resin (D1-2).

在鹼可溶性樹脂(d)為含有此等較佳樹脂以外之其他鹼可溶性樹脂時,其含有比例,相對於鹼可溶性樹脂(d)之合計,通常為20質量%以下、較佳為10質量%以下,且通常0質量%以上。 When the alkali-soluble resin (d) is an alkali-soluble resin other than the above-mentioned preferable resin, the content ratio thereof is usually 20% by mass or less, preferably 10% by mass based on the total of the alkali-soluble resin (d). Hereinafter, it is usually 0% by mass or more.

尚且,本發明之感光性樹脂組成物中,相對於色材(a)100質量份,鹼可溶性樹脂(d)的量通常為20質量份以上、較佳為30質量份以上、更佳為40質量份以上;且通常為500質量份以下、較佳為300質量份以下、更佳為200質量份以下、再更佳為100質量份以下、又更佳為80質量份以下、特佳為50質量份以下。藉由將鹼可溶性樹脂(d)相對於色材(a)的含有比例設為上述下限值以 上,有可抑制未曝光部分對顯影液之溶解性降低、可防止顯影不良誘發的傾向;又,藉由設為上述上限值以下,有容易得到所需畫素膜厚的傾向。 In the photosensitive resin composition of the present invention, the amount of the alkali-soluble resin (d) is usually 20 parts by mass or more, preferably 30 parts by mass or more, and more preferably 40% based on 100 parts by mass of the color material (a). It is usually 500 parts by mass or less, preferably 300 parts by mass or less, more preferably 200 parts by mass or less, still more preferably 100 parts by mass or less, still more preferably 80 parts by mass or less, and particularly preferably 50 parts by mass or less. Below the mass. By setting the content ratio of the alkali-soluble resin (d) to the color material (a) to the above lower limit value, In addition, it is possible to suppress the decrease in the solubility of the unexposed portion in the developer, and it is possible to prevent the development failure from being induced. Further, when the thickness is not more than the above upper limit, the desired pixel thickness tends to be easily obtained.

本發明之感光性樹脂組成物之光聚合性單體的含有比例,相對於本發明之感光性樹脂組成物的總固形份,通常為90質量%以下、較佳為80質量%以下、更佳為70質量%以下、再更佳為50質量%以下、又更佳為30質量%以下、特佳為20質量%以下。藉由將光聚合性單體之含量設為上述上限值以下,有顯影液對曝光部之滲透性變得適當、可得到良好影像的傾向。 The content ratio of the photopolymerizable monomer of the photosensitive resin composition of the present invention is usually 90% by mass or less, preferably 80% by mass or less, more preferably the total solid content of the photosensitive resin composition of the present invention. It is 70% by mass or less, more preferably 50% by mass or less, still more preferably 30% by mass or less, and particularly preferably 20% by mass or less. When the content of the photopolymerizable monomer is not more than the above upper limit value, the permeability of the developer to the exposed portion is appropriate, and a good image tends to be obtained.

光聚合性單體之含量的下限通常為1質量%以上、較佳為5質量%以上。藉由為上述下限以上,有提升由紫外線照射進行之光硬化且鹼顯影性亦良好的傾向。 The lower limit of the content of the photopolymerizable monomer is usually 1% by mass or more, preferably 5% by mass or more. When it is at least the above lower limit, there is a tendency that the photocuring by ultraviolet irradiation is improved and the alkali developability is also good.

又,相對於聚胺基甲酸酯分散劑(b-1)與鹼可溶性樹脂(d)之合計量100質量份,光聚合性單體的含有比例通常為2質量份以上、較佳為4質量份以上、更佳為6質量份以上。且,通常為500質量份以下、較佳為300質量份以下、更佳為200質量份以下。 In addition, the content ratio of the photopolymerizable monomer is usually 2 parts by mass or more, preferably 4, based on 100 parts by mass of the total amount of the polyurethane dispersant (b-1) and the alkali-soluble resin (d). More than or equal to the mass part, more preferably 6 parts by mass or more. Further, it is usually 500 parts by mass or less, preferably 300 parts by mass or less, more preferably 200 parts by mass or less.

藉由將聚胺基甲酸酯分散劑(b-1)、光聚合性單體、光聚合起始劑(c)相對於鹼可溶性樹脂的量設為上述下限值以上,於感光性樹脂組成物之溶液中,由於聚胺基甲酸酯分散劑(b-1)與鹼可溶性樹脂(d)之相溶性所造成之對於色材(a)之凝集的立體障礙性提升,而使分散性提升;或於彩色濾光片製作時,聚胺基甲酸酯分散劑(b-1)與鹼可溶性樹脂(d)藉由紫外線照射,使具有以光聚合起始劑(c)進行了交聯的乙烯性不飽和基的成分,更加增加交聯性,而有使屬於本發明效果之對鹼顯影液及高溫處理之耐性提升、容易形成高 細微之細線的傾向。 The amount of the polyurethane dispersant (b-1), the photopolymerizable monomer, and the photopolymerization initiator (c) relative to the alkali-soluble resin is at least the above lower limit value, and the photosensitive resin is used. In the solution of the composition, the steric hindrance of the agglomeration of the color material (a) due to the compatibility of the polyurethane dispersant (b-1) and the alkali-soluble resin (d) is dispersed Orientation; or in the production of a color filter, the polyurethane dispersant (b-1) and the alkali-soluble resin (d) are irradiated with ultraviolet light to have a photopolymerization initiator (c) The component of the crosslinked ethylenically unsaturated group further increases the crosslinkability, and the resistance to the alkali developer and the high temperature treatment which are the effects of the present invention is improved, and the formation is high. The tendency of subtle thin lines.

又,藉由將對鹼顯影液之溶解性有惡化之傾向的聚胺基甲酸酯分散劑(b-1)、光聚合性單體、光聚合起始劑(c)的量設為上述上限值以下,有提升紫外線未曝光部分對碱顯影液之溶解性、可減低基板上之顯影殘渣的傾向。 In addition, the amount of the polyurethane dispersant (b-1), the photopolymerizable monomer, and the photopolymerization initiator (c) which tends to deteriorate the solubility of the alkali developer is as described above. Below the upper limit, there is a tendency to improve the solubility of the unexposed portion of the ultraviolet light to the alkali developer and to reduce the development residue on the substrate.

又,在使用上述硫醇類的情況,硫醇類的含有比例,相對於本發明之感光性樹脂組成物的總固形份,通常為0.1質量%以上、較佳為0.3質量%以上、更佳為0.5質量%以上,且通常為10質量%以下、較佳為5質量%以下。若硫醇類之含量過少,則感度降低之提升效果不足;若過多,有保存穩定性惡化的情形。 In addition, when the thiol is used, the content of the thiol is usually 0.1% by mass or more, preferably 0.3% by mass or more, and more preferably the total solid content of the photosensitive resin composition of the present invention. It is 0.5% by mass or more, and usually 10% by mass or less, preferably 5% by mass or less. If the content of the mercaptan is too small, the effect of improving the sensitivity is insufficient; if it is too large, the storage stability is deteriorated.

在使本發明之感光性樹脂組成物含有顏料衍生物時,顏料衍生物之含有比例,相對於本發明之感光性樹脂組成物的總固形份,通常為0.1質量%以上,且通常為10質量%以下、較佳為5質量%以下。 When the photosensitive resin composition of the present invention contains a pigment derivative, the content ratio of the pigment derivative is usually 0.1% by mass or more, and usually 10% by mass based on the total solid content of the photosensitive resin composition of the present invention. % or less, preferably 5% by mass or less.

又,在使用界面活性劑時,其含有比例,相對於感光性樹脂組成物中之總固形份,通常為0.001質量%以上、較佳為0.005質量%以上、更佳為0.01質量%以上、再更佳為0.03質量%以上,且通常為10質量%以下、較佳為1質量%以下、更佳為0.5質量%以下、再更佳诙0.3質量%以下。藉由將界面活性劑之含有比例設為上述範圍內,有塗佈膜之平滑性、均勻性容易充分的傾向。 In addition, when the surfactant is used, the content of the surfactant is usually 0.001% by mass or more, preferably 0.005% by mass or more, more preferably 0.01% by mass or more, based on the total solid content of the photosensitive resin composition. It is more preferably 0.03 mass% or more, and is usually 10 mass% or less, preferably 1 mass% or less, more preferably 0.5 mass% or less, still more preferably 0.3 mass% or less. When the content ratio of the surfactant is within the above range, the smoothness and uniformity of the coating film tend to be sufficient.

尚且,本發明之感光性樹脂組成物係使用上述溶劑(e),其固形份濃度通常為5質量%以上、較佳為10質量%以上;且通常為50質量%以下、較佳為以成為30質量%的方式調液。藉由設為上述範圍內,有感光性樹脂組成物之塗佈性良好的傾向。 In the photosensitive resin composition of the present invention, the solvent (e) is used, and the solid content concentration thereof is usually 5% by mass or more, preferably 10% by mass or more, and usually 50% by mass or less, and more preferably 30% by mass way to adjust the liquid. When it is in the above range, the coating property of the photosensitive resin composition tends to be good.

[感光性樹脂組成物之製造方法] [Manufacturing Method of Photosensitive Resin Composition]

本發明之感光性樹脂組成物(以下有時稱為「抗蝕劑」),係依常法製造。 The photosensitive resin composition of the present invention (hereinafter sometimes referred to as "resist") is produced by a usual method.

通常,色材(a)較佳係事先使用塗料調理器、砂磨器、球磨器、輥磨器、石磨器、噴射磨器、均質器等進行分散處理。藉由分散處理使色材(a)微粒子化,故提升抗蝕劑的塗佈特性。又,在使用黑色色材作為色材(a)時,有助於提升遮光能力。 Usually, the color material (a) is preferably subjected to dispersion treatment using a paint conditioner, a sander, a ball mill, a roll mill, a stone grinder, a jet mill, a homogenizer or the like in advance. The color material (a) is microparticulated by the dispersion treatment, so that the coating properties of the resist are improved. Moreover, when a black color material is used as the color material (a), it contributes to the improvement of the light-shielding ability.

分散處理通常較佳係依併用了色材(a)、分散劑(b)、溶劑(e)及視需要之鹼可溶性樹脂(d)的一部分或全部的系統進行(以下有時將供於分散處理之混合物、及藉該處理所得之組成物稱為「油墨」或「顏料分散液」)。於此分散處理中,藉由使用本發明之聚胺基甲酸酯分散劑(b-1),可抑制所得油墨及抗蝕劑的經時性增黏(分散穩定性優越),故較佳。 The dispersion treatment is usually preferably carried out in accordance with a system in which a part or all of the color material (a), the dispersing agent (b), the solvent (e), and optionally the alkali-soluble resin (d) are used in combination (hereinafter, it is sometimes used for dispersion). The treated mixture and the composition obtained by the treatment are referred to as "ink" or "pigment dispersion"). In the dispersion treatment, by using the polyurethane dispersant (b-1) of the present invention, it is possible to suppress the time-dependent thickening of the obtained ink and the resist (excellent dispersion stability), so that it is preferred. .

尚且,在對含有調配於感光性樹脂組成物之所有成分的液進行分散處理時,由於在分散處理時產生之發熱,有高反應性之成分發生改質的可能性。從而,較佳係依含有上述成分之系統進行分散處理。 In addition, when the liquid containing all the components blended in the photosensitive resin composition is subjected to dispersion treatment, the components having high reactivity may be modified due to heat generated during the dispersion treatment. Therefore, it is preferred to carry out a dispersion treatment in accordance with a system containing the above components.

在以砂磨器使色材(a)分散時,可較佳地使用0.1~8mm左右之徑的玻璃珠或氧化鋯珠。分散處理條件係溫度通常為0℃至100℃,較佳為室溫至80℃之範圍。分散時間係視液之組成及分散處理裝置之尺寸等而適當時間相異,故予以適當調節。 When the color material (a) is dispersed by a sander, glass beads or zirconia beads having a diameter of about 0.1 to 8 mm can be preferably used. The dispersion treatment conditions are usually from 0 ° C to 100 ° C, preferably from room temperature to 80 ° C. The dispersion time is different depending on the composition of the liquid and the size of the dispersion processing apparatus, etc., and is appropriately adjusted.

分散的標準係以抗蝕劑之20度鏡面光澤度[JIS Z8741(1997年)]成為100~200之範圍的方式控制油墨光澤。在抗蝕 劑之光澤度較低時,分散處理不足而殘留粗糙顏料(色材)粒子的情況較多,有顯影性、密黏性、解析性等不足的可能性。又,若進行分散處理直到光澤度超過上述範圍,則顏料破碎而產生多數之超微粒子,故反而有損及分散穩定性的傾向。 The standard of dispersion is to control the gloss of the ink in such a manner that the 20 degree specular gloss of the resist [JIS Z8741 (1997)] becomes in the range of 100 to 200. In the resist When the glossiness of the agent is low, the dispersion treatment is insufficient and the coarse pigment (color material) particles remain, and there are cases where the developability, the adhesion, the resolution, and the like are insufficient. Further, when the dispersion treatment is carried out until the gloss exceeds the above range, the pigment is broken and a large number of ultrafine particles are generated, which tends to impair the dispersion stability.

接著,將藉上述分散處理所得之油墨、與抗蝕劑中所含之上述其他成分混合,作成均勻溶液。於抗蝕劑之製造步驟中,由於細微雜物混合於液中的情況較多,故所得抗蝕劑較佳係藉由過濾器等進行過濾處理。 Next, the ink obtained by the above dispersion treatment is mixed with the above-mentioned other components contained in the resist to prepare a uniform solution. In the step of producing the resist, since fine impurities are mixed in the liquid, the obtained resist is preferably subjected to filtration treatment by a filter or the like.

[硬化物] [hardened material]

藉由使本發明之感光性樹脂組成物硬化,可得到本發明之硬化物。將本發明之感光性樹脂組成物進行硬化而成的硬化物,可較佳地使用作為黑色矩陣或著色間隔件。 The cured product of the present invention can be obtained by curing the photosensitive resin composition of the present invention. The cured product obtained by curing the photosensitive resin composition of the present invention can be preferably used as a black matrix or a colored spacer.

[黑色矩陣] [black matrix]

接著,針對使用了本發明之感光性樹脂組成物的黑色矩陣,根據其製造方法進行說明。 Next, a black matrix using the photosensitive resin composition of the present invention will be described based on the production method.

(1)支撐體 (1) Support

作為用於形成黑色矩陣之支撐體,若具有適度強度,則其材質並無特別限定。作為支撐體,主要使用透明基板。作為材質,可列舉例如聚對苯二甲酸乙二酯等之聚酯系樹脂;聚丙烯、聚乙烯等之聚烯烴系樹脂;聚碳酸酯、聚甲基丙烯酸甲酯、聚碸等之熱可塑性樹脂製片材;環氧樹脂、不飽和聚酯樹脂、聚(甲基)丙烯酸系樹脂 等之熱硬化性樹脂片材;或各種玻璃等。其中,由耐熱性的觀點而言,較佳為玻璃、耐熱性樹脂。 The material for forming the black matrix is not particularly limited as long as it has moderate strength. As the support, a transparent substrate is mainly used. Examples of the material include a polyester resin such as polyethylene terephthalate; a polyolefin resin such as polypropylene or polyethylene; and thermoplasticity such as polycarbonate, polymethyl methacrylate or polyfluorene. Resin sheet; epoxy resin, unsaturated polyester resin, poly(meth)acrylic resin A thermosetting resin sheet or the like; or various glasses or the like. Among them, from the viewpoint of heat resistance, glass or a heat resistant resin is preferred.

又,亦有於基板表面成膜了ITO或IZO等透明電極的情況。除了透明基材以外,亦可形成於TFT陣列上。 Further, a case where a transparent electrode such as ITO or IZO is formed on the surface of the substrate may be used. In addition to the transparent substrate, it may be formed on the TFT array.

對於支撐體,為了改良接黏性等之表面物性,視需要亦可進行電暈放電處理、臭氧處理、矽烷偶合劑或胺基甲酸乙酯系樹脂等之各種樹脂的薄膜形成處理等。 In order to improve the surface physical properties such as adhesion, the support may be subjected to a film forming treatment of various resins such as a corona discharge treatment, an ozone treatment, a decane coupling agent, or a urethane resin.

支撐體之厚度通常設為0.05~10mm、較佳為0.1~7mm之範圍。又,在進行各種樹脂之薄膜形成處理時,其膜厚通常為0.01~10μm、較佳為0.05~5μm之範圍。 The thickness of the support is usually in the range of 0.05 to 10 mm, preferably 0.1 to 7 mm. Further, when the film formation treatment of various resins is carried out, the film thickness is usually in the range of 0.01 to 10 μm, preferably 0.05 to 5 μm.

(2)黑色矩陣 (2) Black matrix

藉由上述本發明之感光性樹脂組成物形成本發明之黑色矩陣時,係在透明基板等之支撐體上塗佈本發明之感光性樹脂組成物並乾燥後,於該塗膜上放置光罩,經由該光罩進行影像曝光、顯影,再視需要進行熱硬化或光硬化而形成黑色矩陣。 When the black matrix of the present invention is formed by the photosensitive resin composition of the present invention, the photosensitive resin composition of the present invention is applied onto a support such as a transparent substrate and dried, and then a photomask is placed on the coating film. The image is exposed and developed through the mask, and then thermally hardened or photohardened as needed to form a black matrix.

(3)黑色矩陣之形成 (3) Formation of black matrix (3-1)感光性樹脂組成物之塗佈 (3-1) Coating of photosensitive resin composition

黑色矩陣用感光性樹脂組成物對於透明基板等之支撐體上的塗佈,可藉由旋塗法、線棒法、流塗法、模塗法、輥塗法、或噴塗法等進行。其中,若為模塗法,可大幅削減塗佈液使用量,且完全沒有藉旋塗法時所附著之霧粒等的影響,可抑制異物發生等,由綜合觀點而言較佳。 The coating of the photosensitive resin composition for a black matrix on a support such as a transparent substrate can be carried out by a spin coating method, a wire bar method, a flow coating method, a die coating method, a roll coating method, a spray coating method, or the like. In addition, in the case of the die-coating method, the amount of the coating liquid to be used can be greatly reduced, and the influence of the mist or the like adhered by the spin coating method is not obtained at all, and the occurrence of foreign matter can be suppressed, and it is preferable from the viewpoint of the overall viewpoint.

塗膜之厚度若過厚,有圖案顯影困難、且液晶單元步驟中之間隙調整困難的情況;若過薄,有顏料濃度難以提高而無法進行所需之色表現的情形。塗膜之厚度係以乾燥後之膜厚計,通常較佳係設為0.2~10μm之範圍、更佳係0.5~6μm之範圍、再更佳係1~4μm之範圍。 If the thickness of the coating film is too thick, pattern development is difficult, and the gap adjustment in the liquid crystal cell step is difficult. If it is too thin, the pigment concentration is difficult to increase and the desired color expression cannot be performed. The thickness of the coating film is usually preferably in the range of 0.2 to 10 μm, more preferably in the range of 0.5 to 6 μm, and still more preferably in the range of 1 to 4 μm, in terms of the film thickness after drying.

(3-2)塗膜之乾燥 (3-2) Drying of the coating film

於支撐體塗佈了感光性樹脂組成物後的塗膜的乾燥,較佳係由使用了加熱板、IR爐、或對流烤箱的乾燥法所進行。乾燥條件可配合上述溶劑成分之種類、所使用之乾燥機的性能等而適當選擇。乾燥時間係配合溶劑成分之種類、所使用之乾燥機的性能等,通常係於40~200℃之溫度、15秒~5分鐘之範圍選擇,較佳係於50~130℃之溫度、30秒~3分鐘之範圍選擇。 The drying of the coating film after the photosensitive resin composition is applied to the support is preferably carried out by a drying method using a hot plate, an IR oven, or a convection oven. The drying conditions can be appropriately selected in accordance with the type of the above solvent component, the performance of the dryer to be used, and the like. The drying time is usually in the range of 40 to 200 ° C, 15 seconds to 5 minutes, preferably in the range of 50 to 130 ° C, 30 seconds. ~3 minutes range selection.

乾燥溫度越高,則使塗膜對支撐體之接黏性越提升,但若過高,則鹼可溶性樹脂分解,引發熱聚合而有產生顯影不良的情形。又,此塗膜之乾燥步驟,亦可為不提高溫度、於減壓室內進行乾燥的減壓乾燥法。 When the drying temperature is higher, the adhesion of the coating film to the support is increased. However, if the drying temperature is too high, the alkali-soluble resin is decomposed to cause thermal polymerization to cause development failure. Further, the drying step of the coating film may be a vacuum drying method in which drying is performed in a reduced pressure chamber without increasing the temperature.

(3-3)曝光 (3-3) exposure

影像曝光係於感光性樹脂組成物之塗膜上,重疊負型遮罩圖案,經由此遮罩圖案,照射紫外線或可見光線之光源而進行。此時,視需要為了防止因氧所造成之光聚合性層的感度降低,亦可於光聚合性之塗膜上形成聚乙烯醇層等之氧遮蔽層後進行曝光。 The image exposure is performed on the coating film of the photosensitive resin composition, and the negative mask pattern is superimposed, and the light source of the ultraviolet ray or the visible ray is irradiated through the mask pattern. In this case, in order to prevent the sensitivity of the photopolymerizable layer due to oxygen from being lowered, an oxygen shielding layer such as a polyvinyl alcohol layer may be formed on the photopolymerizable coating film and then exposed.

上述影像曝光所使用之光源並無特別限定。作為光 源,可列舉例如氙氣燈、鹵素燈、鎢燈、高壓水銀燈、超高壓水銀燈、金屬鹵素燈、中壓水銀燈、低壓水銀燈、碳弧及螢光燈等之燈光源,以及氬離子雷射、YAG雷射、準分子雷射、氮雷射、氦鎘雷射及半導體雷射等之雷射光源等。在使用照射特定波長光時,亦可利用光學濾波器。 The light source used for the above image exposure is not particularly limited. As light Examples of the source include a lamp source such as a xenon lamp, a halogen lamp, a tungsten lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a medium pressure mercury lamp, a low pressure mercury lamp, a carbon arc, and a fluorescent lamp, and an argon ion laser, YAG. Laser sources such as lasers, excimer lasers, nitrogen lasers, cadmium-cadmium lasers, and semiconductor lasers. An optical filter can also be utilized when illuminating a specific wavelength of light.

(3-4)顯影 (3-4) Development

本發明之黑色矩陣係在對感光性樹脂組成物之塗膜藉上述光源進行影像曝光後,藉由使用有機溶劑、或含有界面活性劑與鹼性化合物之水溶液的顯影,於基板上形成影像而可製作。於此水溶液中,可進一步含有有機溶劑、緩衝劑、錯化劑、染料或顏料。 In the black matrix of the present invention, after the image of the photosensitive resin composition is image-exposed by the light source, an image is formed on the substrate by using an organic solvent or an aqueous solution containing a surfactant and a basic compound. Can be made. The aqueous solution may further contain an organic solvent, a buffer, a distorer, a dye or a pigment.

作為鹼性化合物,可列舉例如氫氧化鈉、氫氧化鉀、氫氧化鋰、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀、矽酸鈉、矽酸鉀、偏矽酸鈉、磷酸鈉、磷酸鉀、磷酸氫鈉、磷酸氫鉀、磷酸二氫鈉、磷酸二氫鉀及氫氧化銨等無機鹼性化合物,以及單‧二或三乙醇胺、單‧二或三甲胺、單‧二或三乙胺、單或二異丙胺、正丁胺、單‧二或三異丙醇胺、乙烯亞胺、乙烯二亞胺、四甲基氫氧化銨(TMAH)及膽鹼等之有機鹼性化合物。此等鹼性化合物亦可為2種以上之混合物。 Examples of the basic compound include sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, potassium hydrogencarbonate, sodium citrate, potassium citrate, sodium metasilicate, and sodium phosphate. Inorganic basic compounds such as potassium phosphate, sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, and ammonium hydroxide, and mono- or di-ethanolamine, mono- or di-trimethylamine, single or two or three Organic basic compounds such as ethylamine, mono or diisopropylamine, n-butylamine, mono- or di-isopropanolamine, ethyleneimine, ethylenediimide, tetramethylammonium hydroxide (TMAH) and choline . These basic compounds may also be a mixture of two or more kinds.

作為界面活性劑,可列舉例如聚氧乙烯烷基醚類、聚氧乙烯烷基芳基醚類、聚氧乙烯烷基酯類去水、山梨醇烷基酯類及單甘油烷基酯類等之非離子系界面活性劑,烷基苯磺酸鹽類、烷基萘磺酸鹽類、烷基硫酸鹽類、烷基磺酸鹽類及磺酸基琥珀酸酯鹽類等之陰離子性界面活性劑,以及烷基甜菜鹼類及胺基酸等之兩性界 面活性劑。 Examples of the surfactant include polyoxyethylene alkyl ethers, polyoxyethylene alkyl aryl ethers, polyoxyethylene alkyl ester dehydration, sorbitol alkyl esters, and monoglyceryl alkyl esters. Anionic interfaces such as nonionic surfactants, alkylbenzenesulfonates, alkylnaphthalenesulfonates, alkyl sulfates, alkylsulfonates, and sulfosuccinates Active agents, as well as the amphoteric boundaries of alkylbetaines and amino acids Surfactant.

作為有機溶劑,可列舉例如異丙醇、苄醇、乙基賽珞蘇、丁基賽珞蘇、苯基賽珞蘇、丙二醇及二丙酮醇等。有機溶劑可單獨使用,亦可與水溶液併用。 Examples of the organic solvent include isopropyl alcohol, benzyl alcohol, ethyl cyproterone, butyl cyanidin, phenyl cyanidin, propylene glycol, and diacetone alcohol. The organic solvent may be used singly or in combination with an aqueous solution.

顯影處理之條件並無特別限制,通常,顯影溫度為10~50℃之範圍,其中較佳為15~45℃、特佳為20~40℃。顯影方法可由浸漬顯影法、噴霧顯影法、刷顯影法或超音波顯影法等之任一方法進行。 The conditions of the development treatment are not particularly limited. Usually, the development temperature is in the range of 10 to 50 ° C, preferably 15 to 45 ° C, particularly preferably 20 to 40 ° C. The developing method can be carried out by any one of a dipping development method, a spray development method, a brush development method, or an ultrasonic development method.

(3-5)熱硬化處理 (3-5) Thermal hardening treatment

對於顯影後之支撐體,係施行熱硬化處理或光硬化處理,較佳為熱硬化處理。此時之熱硬化處理條件,溫度為100~280℃之範圍、較佳為於150~250℃之範圍選擇,時間為於5~60分鐘之範圍選擇。 The developed support is subjected to a heat hardening treatment or a photohardening treatment, preferably a heat hardening treatment. The thermal hardening treatment conditions at this time are selected in the range of 100 to 280 ° C, preferably in the range of 150 to 250 ° C, and the time is selected in the range of 5 to 60 minutes.

依以上之方式所形成之黑色矩陣的底部的寬,通常為3~50μm、較佳為4~30μm,尤其在高細線的情況下較佳為4~8μm,高度通常為0.5~5μm、較佳為1~4μm。又,體積電阻率為1×1013Ω‧cm以上、較佳為1×1014Ω‧cm以上;相對電容率為6以下、較佳為5以下。又,每1μm厚度之光學濃度(OD)通常為3.0以上、較佳為3.5以上、更佳為4.0以上、特佳為4.2以上。 The width of the bottom of the black matrix formed in the above manner is usually 3 to 50 μm, preferably 4 to 30 μm, particularly preferably 4 to 8 μm in the case of high thin wires, and usually 0.5 to 5 μm in height, preferably It is 1~4μm. Further, the volume resistivity is 1 × 10 13 Ω ‧ cm or more, preferably 1 × 10 14 Ω ‧ cm or more, and the relative permittivity is 6 or less, preferably 5 or less. Further, the optical density (OD) per 1 μm thickness is usually 3.0 or more, preferably 3.5 or more, more preferably 4.0 or more, and particularly preferably 4.2 or more.

[其他之彩色濾光片影像的形成] [Formation of other color filter images]

在設有黑色矩陣的支撐體上,依與上述(3-1)~(3-5)相同製程塗佈含有紅色、綠色及藍色中一色之色材的感光性樹脂組成物,並予以乾燥後,於塗膜上重疊光罩,經由該光罩進行影像曝光、顯影, 視需要藉由熱硬化或光硬化而形成畫素影像,藉此可製作著色層。將此操作分別針對紅色、綠色及藍色之三色的感光性樹脂組成物進行,藉此可形成彩色濾光片影像。此等之順序並不限定於上述。 A photosensitive resin composition containing a color material of one of red, green, and blue is applied to a support having a black matrix and dried in the same manner as in the above (3-1) to (3-5). Thereafter, a mask is superposed on the coating film, and image exposure and development are performed through the mask. A colored image can be formed by forming a pixel image by heat hardening or photohardening as needed. This operation is performed on the photosensitive resin compositions of the three colors of red, green, and blue, respectively, whereby a color filter image can be formed. The order of these is not limited to the above.

[著色間隔件] [Coloring spacer]

本發明之感光性樹脂組成物除了黑色矩陣以外,亦可使用作為著色間隔件用的抗蝕劑。在將間隔件使用於TFT型LCD時,有因入射至TFT之光而使作為開關元件的TFT發生誤動作的情形,而著色間隔件係用於防止此情形;例如,日本專利特開平8-234212號公報記載將間隔件作成為遮光性。著色間隔件除了使用著色間隔件用之遮罩以外,可依與上述黑色矩陣相同的方法形成。 In addition to the black matrix, the photosensitive resin composition of the present invention may be used as a resist for a coloring spacer. When a spacer is used for a TFT type LCD, there is a case where a TFT as a switching element malfunctions due to light incident on the TFT, and a coloring spacer is used to prevent this; for example, Japanese Patent Laid-Open No. Hei 8-234212 The publication discloses that the spacer is made to have a light blocking property. The coloring spacer can be formed in the same manner as the black matrix described above except that a mask for the coloring spacer is used.

[透明電極之形成] [Formation of Transparent Electrode]

彩色濾光片係依其原有狀態於影像上形成ITO等透明電極,而使用作為彩色顯示器、液晶顯示裝置等之零件的一部分,但為了提高表面平滑性及耐久性,視需要亦可於影像上設置聚醯胺或聚醯亞胺等之頂塗層。又,於部分之平面配向型驅動方式(IPS模式)等用途中,亦有不形成透明電極的情形。 The color filter is formed as a transparent electrode such as ITO on the image according to its original state, and is used as a part of a color display or a liquid crystal display device. However, in order to improve surface smoothness and durability, the image may be used as needed. A top coat of polyamine or polyimine or the like is provided thereon. Further, in some applications such as a planar alignment type driving method (IPS mode), there is a case where a transparent electrode is not formed.

[影像顯示裝置] [Image display device]

本發明之影像顯示裝置若具備由本發明之感光性樹脂組成物所構成的黑色矩陣,並顯示影像或映像的裝置,則無特別限定,可列舉例如後述之液晶顯示裝置及有機EL顯示器等。 The image display device of the present invention is not particularly limited as long as it has a black matrix composed of the photosensitive resin composition of the present invention and displays an image or a map, and examples thereof include a liquid crystal display device and an organic EL display, which will be described later.

[液晶顯示裝置] [Liquid Crystal Display Device]

本發明之液晶顯示裝置係使用上述本發明之黑色矩陣而製作者,彩色畫素或黑色矩陣之形成順序或形成位置等並無特別限制。 The liquid crystal display device of the present invention is produced by using the black matrix of the present invention described above, and the order in which the color pixels or the black matrix are formed or the formation position is not particularly limited.

液晶顯示裝置通常係於彩色濾光片上形成配向膜,於該配向膜上散佈間隔件後,與對向基板貼合而形成液晶單元,對所形成之液晶單元注入液晶,接線至對向電極而完成。 A liquid crystal display device usually forms an alignment film on a color filter, and after dispersing a spacer on the alignment film, bonding the counter substrate to form a liquid crystal cell, injecting liquid crystal into the formed liquid crystal cell, and wiring the counter electrode And finished.

作為配向膜,較佳為聚醯亞胺等之樹脂膜。對於配向膜之形成,通常採用凹版印刷法及/或快乾印刷法,配向膜之厚度設為數10nm。在藉由熱燒成進行配向膜之硬化處理後,以紫外線照射或摩擦布之處理進行表面處理,而加工成為可調整液晶傾斜的表面狀態。 As the alignment film, a resin film such as polyimide or the like is preferable. For the formation of the alignment film, a gravure printing method and/or a quick-drying printing method are usually employed, and the thickness of the alignment film is set to several tens of nm. After the hardening treatment of the alignment film by thermal baking, the surface treatment is carried out by treatment with ultraviolet rays or a rubbing cloth, and the surface state is adjusted so that the liquid crystal is tilted.

作為間隔件,係使用配合了與對向基板間之間隙的尺寸者,通常較佳為2~8μm者。亦可於彩色濾光片基板上,藉由光刻法形成透明樹脂膜之光間隔件(PS),將此活用於替代間隔件。作為對向基板,通常使用陣列基板,特佳為TFT(薄膜電晶體)基板。 As the spacer, the size of the gap between the counter substrate and the counter substrate is used, and it is usually preferably 2 to 8 μm. The light spacer (PS) of the transparent resin film may also be formed on the color filter substrate by photolithography, and this may be used instead of the spacer. As the counter substrate, an array substrate is usually used, and a TFT (thin film transistor) substrate is particularly preferable.

與對向基板間貼合的間隙,係視液晶顯示裝置的用途而異,通常於2~8μm之範圍選擇。與對向基板貼合後,液晶注入口以外之部分係藉由環氧樹脂等之密封材進行密封。密封材係藉由紫外線(UV)照射及/或加熱而進行硬化,使液晶單元周邊被密封。 The gap to be bonded to the counter substrate differs depending on the application of the liquid crystal display device, and is usually selected in the range of 2 to 8 μm. After bonding to the counter substrate, the portion other than the liquid crystal injection port is sealed by a sealing material such as epoxy resin. The sealing material is cured by ultraviolet (UV) irradiation and/or heating to seal the periphery of the liquid crystal cell.

周邊經密封之液晶單元,係在切斷為面板單位後,於真空腔室內設為減壓,將上述液晶注入口浸漬於液晶後,藉由對腔室內進行漏壓,而使液晶注入至液晶單元內。 The liquid crystal cell sealed in the periphery is cut into a panel unit, and then decompressed in the vacuum chamber, the liquid crystal injection port is immersed in the liquid crystal, and the liquid crystal is injected into the liquid crystal by leaking pressure in the chamber. Within the unit.

液晶單元內之減壓度通常為1×10-2~1×10-7Pa,較佳為1×10-3~1×10-6Pa。又,減壓時較佳係對液晶單元進行加溫,加溫溫 度通常為30~100℃、更佳為50~90℃。 The degree of pressure reduction in the liquid crystal cell is usually from 1 × 10 -2 to 1 × 10 -7 Pa, preferably from 1 × 10 -3 to 1 × 10 -6 Pa. Further, when the pressure is reduced, the liquid crystal cell is preferably heated, and the heating temperature is usually 30 to 100 ° C, more preferably 50 to 90 ° C.

減壓時之加溫保持通常設為10~60分鐘之範圍,其後浸漬於液晶中。經注入液晶之液晶單元係藉由使UV硬化樹脂硬化而密封液晶注入口,藉此完成液晶顯示裝置(面板)。 The heating at the time of pressure reduction is usually set to a range of 10 to 60 minutes, and thereafter immersed in a liquid crystal. The liquid crystal cell in which the liquid crystal is injected is sealed by sealing the liquid crystal injection port by hardening the UV hardening resin, thereby completing the liquid crystal display device (panel).

液晶之種類並無特別限制,可為芳香族系、脂肪族系或多環狀化合物等習知所知之液晶,亦可為向液性液晶、向熱性液晶等之任一種。向熱性液晶已知有向列型液晶、層列型液晶及膽固醇型液晶等,但可為任一種。 The type of the liquid crystal is not particularly limited, and may be any known liquid crystal such as an aromatic type, an aliphatic type or a polycyclic compound, or may be a liquid crystal liquid or a thermal liquid crystal. A nematic liquid crystal, a smectic liquid crystal, a cholesteric liquid crystal, or the like is known to the thermal liquid crystal, but any of them may be used.

[有機EL顯示器] [Organic EL Display]

有機EL顯示器係例如圖1所示,首先,於透明支撐基板10上,製作由感光性樹脂組成物所形成之圖案[亦即,設於畫素20、及鄰接之畫素20之間的樹脂黑色矩陣(未圖示)]形成而成的彩色濾光片,於該彩色濾光片上經由有機保護層30及無機氧化膜40積層有機發光體500,藉此製作成有機EL元件100。 In the organic EL display, for example, as shown in FIG. 1, first, a pattern formed of a photosensitive resin composition is formed on the transparent supporting substrate 10 (that is, a resin provided between the pixel 20 and the adjacent pixel 20). A color filter formed of a black matrix (not shown) is formed on the color filter by laminating the organic light-emitting body 500 via the organic protective layer 30 and the inorganic oxide film 40 to form the organic EL element 100.

尚且,於畫素20及樹脂黑色矩陣內,至少黑色矩陣為使用本發明之感光性樹脂組成物所製作者。作為有機發光體500之積層方法,可列舉例如於彩色濾光片上面逐次形成透明陽極50、電洞注入層51、電洞輸送層52、發光層53、電子注入層54、及陰極55的方法,以及將在其他基板上所形成之有機發光體500貼合至無機氧化膜40上的方法等。 Further, in the pixel 20 and the resin black matrix, at least the black matrix is produced by using the photosensitive resin composition of the present invention. As a method of laminating the organic light-emitting body 500, for example, a method of sequentially forming the transparent anode 50, the hole injection layer 51, the hole transport layer 52, the light-emitting layer 53, the electron injection layer 54, and the cathode 55 on the color filter may be mentioned. And a method of bonding the organic light-emitting body 500 formed on another substrate to the inorganic oxide film 40, and the like.

使用依此方式所製作之有機EL元件100,並依例如「有機EL顯示器」(Ohmsha,2004年8月20日發行,時任靜士、安達千波矢、波田英幸著)記載之方法等,可製作有機EL顯示器。 The organic EL device 100 produced in this manner can be produced by, for example, the method described in "Organic EL Display" (Ohmsha, issued on August 20, 2004, at the time of Jing Shi, Anda Chiba, and Takada Kazuo). Organic EL display.

尚且,本發明之彩色濾光片亦可應用於被動驅動方式之有機EL顯示器或主動驅動方式之有機EL顯示器。 Furthermore, the color filter of the present invention can also be applied to an organic EL display of a passive driving type or an organic EL display of an active driving type.

<實施例> <Example>

以下列舉實施例及比較例,進一步具體說明本發明,但本發明在不超過其要旨之下,並不限定於以下之實施例。 The present invention will be specifically described below by way of examples and comparative examples, but the present invention is not limited to the following examples without departing from the spirit thereof.

<分散劑1> <Dispersant 1>

將經由以下(步驟1-1)~(步驟1-9)而得的聚胺基甲酸酯化合物1使用作為分散劑1。 The polyurethane compound 1 obtained through the following (Step 1-1) to (Step 1-9) was used as the dispersing agent 1.

化合物A:1-十二醇 Compound A: 1-dodecanol

化合物B:ε-己內酯 Compound B: ε-caprolactone

化合物C:丁氧化鋯觸媒 Compound C: zirconia catalyst

化合物D:甲苯二異氰酸酯(TDI) Compound D: Toluene diisocyanate (TDI)

化合物E:二乙醇胺 Compound E: Diethanolamine

3級胺基化合物1:3-(二乙胺基)-1,2-丙二醇 Grade 3 amine compound 1: 3-(diethylamino)-1,2-propanediol

聚醚化合物1:聚(丙二醇)單丁基醚(Mn=1100) Polyether compound 1: poly(propylene glycol) monobutyl ether (Mn=1100)

(步驟1-1)將化合物A(114.6質量份)與化合物B(912.3質量份)於氮環境下,依150℃混合並均勻化。 (Step 1-1) Compound A (114.6 parts by mass) and Compound B (912.3 parts by mass) were mixed and homogenized at 150 ° C under a nitrogen atmosphere.

(步驟1-2)於(步驟1-1)所得之混合物中添加化合物C(4.0質量份),並依180℃反應20小時。 (Step 1-2) Compound C (4.0 parts by mass) was added to the mixture obtained in (Step 1-1), and reacted at 180 ° C for 20 hours.

(步驟1-3)將(步驟1-2)所得之反應物冷卻至室溫,得到蠟狀之聚酯化合物1。 (Step 1-3) The reactant obtained in (Step 1-2) was cooled to room temperature to obtain a waxy polyester compound 1.

(步驟1-4)將化合物D(83.46質量份)於氮環境下,置入反應容器並加熱為50~60℃ (Step 1-4) Compound D (83.46 parts by mass) was placed in a reaction vessel under nitrogen atmosphere and heated to 50-60 ° C

(步驟1-5)將(步驟1-3)所得之聚酯化合物1之800質量份以50℃進行熔融,並於(步驟1-4)所得之加熱為50~60℃之化合物D中歷時2小時進行添加。 (Step 1-5) 800 parts by mass of the polyester compound 1 obtained in (Step 1-3) is melted at 50 ° C, and is heated in the compound D heated at 50 to 60 ° C in (Step 1-4) Add for 2 hours.

(步驟1-6)將(步驟1-5)所得之混合液,以60℃、1小時於攪拌下進行反應。 (Step 1-6) The mixed liquid obtained in (Step 1-5) was reacted at 60 ° C for 1 hour with stirring.

(步驟1-7)將(步驟1-6)所得之反應物冷卻為20℃,加入化合物E(50.37質量份)並依35℃進行反應直到殘留異氰酸酯消失為止,得到聚酯化合物2。 (Step 1-7) The reactant obtained in (Step 1-6) was cooled to 20 ° C, and Compound E (50.37 parts by mass) was added and reacted at 35 ° C until the residual isocyanate disappeared to obtain Polyester Compound 2.

(步驟1-8)將化合物D(26.68質量份)於氮環境下,置入反應容器中,接著,將溶媒之丙二醇甲基醚乙酸酯131質量份、3級胺基化合物1(17.12質量份)、(步驟1-7)所得之上述聚酯化合物2 57.68質量份加入,於攪拌下加熱至70℃。 (Step 1-8) Compound D (26.68 parts by mass) was placed in a reaction vessel under a nitrogen atmosphere, followed by a solvent of propylene glycol methyl ether acetate 131 parts by mass, and a tertiary amine compound 1 (17.12 mass) (Part 1), 57.68 parts by mass of the above polyester compound 2 obtained in (Step 1-7), and heated to 70 ° C with stirring.

(步驟1-9):於(步驟1-8)所得之混合液中進一步加入聚醚化合物1(17.00質量份),依70℃進行反應2小時直到殘留異氰酸酯消失為止,藉此得到依GPC分析顯示重量平均分子量(Mw)為22000、數量平均分子量(Mn)為8800的聚胺基甲酸酯化合物1。 (Step 1-9): Further, a polyether compound 1 (17.00 parts by mass) was further added to the mixed liquid obtained in (Step 1-8), and the reaction was carried out at 70 ° C for 2 hours until the residual isocyanate disappeared, thereby obtaining a GPC-based analysis. A polyurethane compound 1 having a weight average molecular weight (Mw) of 22,000 and a number average molecular weight (Mn) of 8,800 was shown.

<分散劑2> <Dispersant 2>

將經由以下(步驟2-1)~(步驟2-13)而得的聚胺基甲酸酯化合物2使用作為分散劑2。 The polyurethane compound 2 obtained through the following (Step 2-1) to (Step 2-13) was used as the dispersing agent 2.

化合物D:甲苯二異氰酸酯(TDI) Compound D: Toluene diisocyanate (TDI)

化合物E:二乙醇胺 Compound E: Diethanolamine

化合物F:二甲胺基丙胺 Compound F: dimethylaminopropylamine

化合物G:2-羥乙基丙烯酸酯 Compound G: 2-hydroxyethyl acrylate

化合物H:2,6-二第三丁基-4-甲酚 Compound H: 2,6-di-t-butyl-4-cresol

聚醚化合物1:聚(丙二醇)單丁基醚(Mn=1100) Polyether compound 1: poly(propylene glycol) monobutyl ether (Mn=1100)

聚酯化合物1:由上述(步驟1-3)所得。 Polyester Compound 1: Obtained from the above (Step 1-3).

聚酯化合物2:由上述(步驟1-7)所得。 Polyester Compound 2: obtained by the above (Step 1-7).

(步驟2-1)將化合物F(100質量份)、化合物G(113.8質量份)及化合物H(0.29質量份)依70℃、48小時,一起進行攪拌直到邁可加成反應完成為止,得到3級胺基化合物2。 (Step 2-1) Compound F (100 parts by mass), Compound G (113.8 parts by mass), and Compound H (0.29 parts by mass) were stirred at 70 ° C for 48 hours until the completion of the Michael addition reaction. Grade 3 amino compound 2.

(步驟2-2)於加熱至50℃之攪拌反應容器中,填充化合物D(25.0質量份)。 (Step 2-2) Compound D (25.0 parts by mass) was charged in a stirred reaction vessel heated to 50 °C.

(步驟2-3)將聚醚化合物1(125.0質量份,相對於TDI為約0.8莫耳當量)滴下填充至漏斗,維持為50~60℃之間的溫度,依4小時滴下至上述攪拌反應容器中。 (Step 2-3) Polyether compound 1 (125.0 parts by mass, relative to TDI of about 0.8 mole equivalent) was dropped and filled into a funnel, maintained at a temperature between 50 and 60 ° C, and dropped to the above stirring reaction for 4 hours. In the container.

(步驟2-4)將(步驟2-3)所得之反應物,依70℃保持60分鐘。 (Step 2-4) The reactant obtained in (Step 2-3) was kept at 70 ° C for 60 minutes.

(步驟2-5)藉由殘留異氰酸酯的滴定,決定反應之完成,將其反應混合物冷卻至20℃。 (Step 2-5) The completion of the reaction was determined by titration of residual isocyanate, and the reaction mixture was cooled to 20 °C.

(步驟2-6)於(步驟2-5)所得之反應混合物中,加入化合物E(24.14質量份,相對於TDI為約1.6莫耳當量),於室溫下保持直到藉由紅外分光分析可決定之異氰酸酯之殘留消失為止。 (Step 2-6) In the reaction mixture obtained in (Step 2-5), Compound E (24.14 parts by mass, about 1.6 mole equivalents relative to TDI) is added and kept at room temperature until analyzed by infrared spectrometry. The determined isocyanate residue disappears.

(步驟2-7)將(步驟2-6)所得之生成物的混合物(其含有二乙醇胺與TDI的二加成物)溶解於二乙基醚中,藉矽膠層析管柱進行洗提。 (Step 2-7) The mixture of the product obtained in (Step 2-6), which contains the diadduct of diethanolamine and TDI, was dissolved in diethyl ether, and eluted by a silica gel chromatography column.

(步驟2-8)將於(步驟2-7)進行洗提之管柱以二乙基醚洗淨3次,合併分液,然後於真空中去除溶媒,得到90質量份之聚醚化合物2的固形生成物。 (Step 2-8) The column to be eluted (Step 2-7) is washed three times with diethyl ether, and the liquid separation is carried out, and then the solvent is removed in a vacuum to obtain 90 parts by mass of the polyether compound 2 Solid product.

於上述(步驟2-7)及(步驟2-8)中去除二乙醇胺與TDI的二加成物。 The diadduct of diethanolamine and TDI is removed in the above (steps 2-7) and (steps 2-8).

(步驟2-9)將化合物D(26.68質量份)於氮環境下置入於反應器中。 (Step 2-9) Compound D (26.68 parts by mass) was placed in a reactor under a nitrogen atmosphere.

(步驟2-10)於含有上述化合物D之反應器中,添加作為溶媒之醋酸甲氧基丙酯(130.87質量份)、聚酯化合物2(15.23質量份)及聚醚化合物2(10.68質量份)及3級胺基化合物2(28.30質量份)。 (Step 2-10) In the reactor containing the above-mentioned compound D, methoxypropyl acetate (130.87 parts by mass), polyester compound 2 (15.23 parts by mass), and polyether compound 2 (10.68 parts by mass) were added as a solvent. And the tertiary amino compound 2 (28.30 parts by mass).

(步驟2-11)將(步驟2-10)所得之混合物於攪拌下加熱為70℃。 (Step 2-11) The mixture obtained in (Step 2-10) was heated to 70 ° C with stirring.

(步驟2-12)將聚酯化合物1(26.09質量份)加入至(步驟2-11)的反應混合物中,以70℃保持2小時。 (Step 2-12) Polyester Compound 1 (26.09 parts by mass) was added to the reaction mixture of (Step 2-11), and kept at 70 ° C for 2 hours.

(步驟2-13):確認於(步驟2-12)所得之反應混合物並無殘留異氰酸酯,得到依GPC分析顯示重量平均分子量(Mw)為20000、數量平均分子量(Mn)為8000的聚胺基甲酸酯化合物2。 (Step 2-13): It was confirmed that the reaction mixture obtained in (Step 2-12) had no residual isocyanate, and a polyamine group having a weight average molecular weight (Mw) of 20,000 and a number average molecular weight (Mn) of 8000 by GPC analysis was obtained. Formate compound 2.

<分散劑3> <Dispersant 3>

將經由以下(步驟3-1)而得的聚胺基甲酸酯化合物3使用作為分散劑3。 The polyurethane compound 3 obtained through the following (step 3-1) was used as the dispersing agent 3.

化合物I:氯化苄基 Compound I: benzyl chloride

(步驟3-1)於上述(步驟1-9)所得之反應液200質量份(聚胺基甲酸酯化合物1之含量為94.97質量份)中添加化合物I(2.35質量份,相當於反應物中之聚胺基甲酸酯化合物1中之3級胺的莫耳數之20%之 莫耳數的量),於70℃攪拌20小時,藉此得到聚胺基甲酸酯化合物1中之3級胺之一部分被4級化的聚胺基甲酸酯化合物3。 (Step 3-1) Compound I (2.35 parts by mass, equivalent to the reactant) is added to 200 parts by mass of the reaction liquid obtained in the above (Step 1-9) (the content of the polyurethane compound 1 is 94.97 parts by mass) 20% of the molar number of the tertiary amine in the polyurethane compound 1 The amount of the molar number was stirred at 70 ° C for 20 hours, whereby a polyurethane compound 3 in which one of the tertiary amines in the polyurethane compound 1 was 4-staged was obtained.

<分散劑4> <Dispersant 4>

將經由以下(步驟4-1)而得的聚胺基甲酸酯化合物4使用作為分散劑4。 The polyurethane compound 4 obtained through the following (Step 4-1) was used as the dispersing agent 4.

化合物E:二乙醇胺 Compound E: Diethanolamine

(步驟4-1)於上述(步驟1-8)中,除了替代3級胺化合物1(17.12質量份,0.12莫耳),而加入相同莫耳數之化合物E(二乙醇胺,12.62質量份,0.12莫耳)以外,其餘以與(步驟1-1)~(步驟1-9)同樣之方式進行,得到聚胺基甲酸酯化合物4。 (Step 4-1) In the above (Step 1-8), except for the substitution of the tertiary amine compound 1 (17.12 parts by mass, 0.12 moles), the same molar number of the compound E (diethanolamine, 12.62 parts by mass, Other than 0.12 moles, the same procedure as in (Step 1-1) to (Step 1-9) was carried out to obtain a polyurethane compound 4.

<分散劑5> <Dispersant 5>

將經由以下(步驟5-1)而得的聚胺基甲酸酯化合物5使用作為分散劑5。 The polyurethane compound 5 obtained through the following (step 5-1) was used as the dispersing agent 5.

化合物J:1,6-己二醇 Compound J: 1,6-hexanediol

(步驟5-1)於上述(步驟1-8)中,除了替代3級胺化合物1(17.12質量份,0.12莫耳),而加入相同莫耳數之化合物J(14.18質量份,0.12莫耳)以外,其餘以與(步驟1-1)~(步驟1-9)同樣之方式進行,得到聚胺基甲酸酯化合物5。 (Step 5-1) In the above (Step 1-8), except for the substitution of the tertiary amine compound 1 (17.12 parts by mass, 0.12 moles), the same molar number of the compound J (14.18 parts by mass, 0.12 moles) was added. Except for the other steps (Step 1-1) to (Step 1-9), the polyurethane compound 5 was obtained.

<分散劑6> <Dispersant 6>

將經由以下(步驟6-1)而得的聚胺基甲酸酯化合物6使用作為分散劑6。 The polyurethane compound 6 obtained through the following (Step 6-1) was used as the dispersing agent 6.

化合物K:三羥甲基丙烷 Compound K: Trimethylolpropane

(步驟6-1)除了於上述(步驟1-8)中,將化合物D增量為28.04質量份,加入化合物K(0.52質量份,0.004莫耳),於上述(步驟1-9)中,將聚醚化合物1增量為21.26質量份以外,其餘以與(步驟1-1)~(步驟1-9)同樣之方式進行,得到重量平均分子量(Mw)為23000、數量平均分子量(Mn)為9200的聚胺基甲酸酯化合物6。 (Step 6-1) In addition to the above (Step 1-8), Compound D is increased to 28.04 parts by mass, and Compound K (0.52 parts by mass, 0.004 moles) is added, in the above (Step 1-9), The polyether compound 1 was increased to 21.26 parts by mass, and the same procedure as in (Step 1-1) to (Step 1-9) was carried out to obtain a weight average molecular weight (Mw) of 23,000 and a number average molecular weight (Mn). It is a polyurethane compound 6 of 9,200.

將分散劑1~6之構成要素示於表1。 The constituent elements of the dispersing agents 1 to 6 are shown in Table 1.

<碳黑油墨1> <Carbon black ink 1>

依以下組成調配顏料、分散劑、分散助劑、溶劑,並依以下方法調製碳黑油墨1。 The pigment, the dispersant, the dispersing aid, and the solvent were formulated according to the following composition, and the carbon black ink 1 was prepared in the following manner.

首先,將顏料、分散劑、分散助劑之固形份依成為以下之方式進行調配。 First, the solid content of the pigment, the dispersant, and the dispersing aid is formulated in the following manner.

‧顏料SB350(DEGUSSA公司製碳黑):100質量份 ‧Pigment SB350 (carbon black manufactured by DEGUSSA): 100 parts by mass

‧分散劑 分散劑1:20質量份(固形份換算) ‧ Dispersant Dispersant 1: 20 parts by mass (solid content conversion)

‧分散助劑(顏料衍生物)S12000(Lubrizol公司製,具有酸性基之酞菁顏料衍生物):2質量份 ‧ Dispersing aid (pigment derivative) S12000 (manufactured by Lubrizol, phthalocyanine pigment derivative having an acidic group): 2 parts by mass

‧溶劑 丙二醇單甲基醚乙酸酯:226.6質量份 ‧Solvent Propylene glycol monomethyl ether acetate: 226.6 parts by mass

將上述各成分充分攪拌,並進行混合。 The above components were thoroughly stirred and mixed.

接著,藉由塗料調理器於25~45℃之範圍進行分散處理6小時,得到分散液。作為珠球,係使用直徑0.5mm之氧化鋯珠,加入分散液60質量份與珠球180質量份。分散結束後,藉由過濾器將珠球與分散液分離,調製成固形份35質量%的碳黑油墨1。 Then, dispersion treatment was carried out for 6 hours in a range of 25 to 45 ° C by a paint conditioner to obtain a dispersion. As the beads, zirconia beads having a diameter of 0.5 mm were used, and 60 parts by mass of the dispersion and 180 parts by mass of the beads were added. After the completion of the dispersion, the beads were separated from the dispersion by a filter to prepare a carbon black ink 1 having a solid content of 35% by mass.

<碳黑油墨2~14之調製> <Modulation of carbon black ink 2~14>

將碳黑油墨1之分散劑及顏料的種類變更為表2記載之分散劑及顏料,依與碳黑油墨1相同的方法進行攪拌、混合,以塗料調理器進行分散處理,調製成固形份35質量%的碳黑油墨2~14。 The dispersant and the pigment of the carbon black ink 1 were changed to the dispersant and the pigment described in Table 2, and the mixture was stirred and mixed in the same manner as the carbon black ink 1, and dispersed by a paint conditioner to prepare a solid portion 35. Mass% of carbon black ink 2~14.

表2中之各成分的細節係如下所述。 The details of the ingredients in Table 2 are as follows.

‧SB350:DEGUSSA公司製碳黑顏料,平均一次粒徑:31nm ‧SB350: Carbon black pigment made by DEGUSSA, average primary particle size: 31nm

‧MA77:三菱化學公司製碳黑顏料,平均一次粒徑:23nm ‧MA77: Carbon black pigment made by Mitsubishi Chemical Corporation, average primary particle size: 23nm

‧Disperbyk-161:BYK Chemie公司製分散劑,具有由甲苯二異氰酸酯多聚物所形成之聚胺基甲酸酯骨架藉骨架連接基所連接之構造的高分子量分散劑。具有鹼性官能基。 ‧Disperbyk-161: a dispersant made by BYK Chemie Co., Ltd. having a high molecular weight dispersant having a structure in which a polyurethane skeleton formed of a toluene diisocyanate polymer is linked by a backbone linking group. Has a basic functional group.

‧Disperbyk-167:BYK Chemie公司製分散劑,具有由甲苯二異氰酸酯多聚物所形成之聚胺基甲酸酯骨架藉骨架連接基所連接之構造的中~低分子量分散劑。具有鹼性官能基。 ‧Disperbyk-167: a dispersant made by BYK Chemie Co., Ltd., having a medium-low molecular weight dispersant having a structure in which a polyurethane skeleton formed of a toluene diisocyanate polymer is linked by a backbone linking group. Has a basic functional group.

‧Ajisper PB-821:味之素Fine、Techno公司製分散劑,具有 聚乙烯亞胺或聚乙烯/聚胺骨架的鹼性接枝聚合物。 ‧Ajisper PB-821: Ajinomoto Fine, a dispersant made by Techno, with Alkaline graft polymer of polyethyleneimine or polyethylene/polyamine backbone.

‧Flowlen KDG-2400:共榮社化學公司製分散劑,具有鹼性官能基之聚丙烯酸系接枝聚合物。 ‧Flowlen KDG-2400: a dispersant made by Kyoritsu Chemical Co., Ltd., a polyacrylic graft polymer having a basic functional group.

‧HIPLAAD ED-701:楠本化成公司製分散劑,具有聚乙烯亞胺或聚乙烯/聚胺骨架的鹼性接枝聚合物。 ‧ HIPLAAD ED-701: a dispersant made by Nanben Chemical Co., Ltd., an alkaline graft polymer with a polyethyleneimine or a polyethylene/polyamine backbone.

‧Disperbyk-2000:BYK Chemie公司製分散劑,3級胺之4級銨鹽改質丙烯酸系嵌段共聚合體。 ‧Disperbyk-2000: a dispersant made by BYK Chemie, a grade 4 amine ammonium salt modified acrylic block copolymer.

‧Disperbyk-2001:BYK Chemie公司製分散劑,3級胺之酸改質丙烯酸系嵌段共聚合體。 ‧Disperbyk-2001: Dispersant made by BYK Chemie, a grade 3 amine acid modified acrylic block copolymer.

<鹼可溶性樹脂(1):環氧基(甲基)丙烯酸酯樹脂(D1-2)> <Alkali-soluble resin (1): epoxy (meth) acrylate resin (D1-2)>

將上述構造之環氧化合物(環氧基當量264)50g、丙烯酸13.65g、甲氧基丁基乙酸酯60.5g、三苯膦0.936g、及對甲氧苯酚0.032g,置入於安裝有溫度計、攪拌機、冷卻管的燒瓶中,於攪拌下依90℃進行反應直到酸價成為5mgKOH/g以下為止。反應需要12小時,得到環氧基丙烯酸酯溶液(1)。 50 g of the epoxy compound (epoxy equivalent 264) having the above structure, 13.65 g of acrylic acid, 60.5 g of methoxybutyl acetate, 0.936 g of triphenylphosphine, and 0.032 g of p-methoxyphenol were placed therein. In a flask of a thermometer, a stirrer, and a cooling tube, the reaction was carried out at 90 ° C under stirring until the acid value became 5 mgKOH/g or less. The reaction took 12 hours to obtain an epoxy acrylate solution (1).

將上述環氧基丙烯酸酯溶液(1)25質量份、三羥甲基丙烷(TMP)0.76質量份、聯苯基四羧酸2酐(BPDA)3.3質量份、及四氫酞酸酐(THPA)3.5質量份,置入於安裝有溫度計、攪拌機、冷卻管的燒瓶中,於攪拌下緩慢升溫至105℃而進行反應。 25 parts by mass of the above epoxy acrylate solution (1), 0.76 parts by mass of trimethylolpropane (TMP), 3.3 parts by mass of biphenyltetracarboxylic acid anhydride (BPDA), and tetrahydrophthalic anhydride (THPA) 3.5 parts by mass was placed in a flask equipped with a thermometer, a stirrer, and a cooling tube, and the mixture was slowly heated to 105 ° C under stirring to carry out a reaction.

在樹脂溶液變成透明後,以甲氧乙酸基丁酯進行稀釋,以固形份成為50質量%的方式進行調整,得到酸價115mgKOH/g、以GPC所測定之聚苯乙烯換算的重量平均分子量(Mw)2600的鹼可溶性樹脂(1)。 After the resin solution became transparent, it was diluted with methoxybutyl butyl acrylate and adjusted so that the solid content was 50% by mass to obtain an acid value of 115 mg KOH/g and a weight average molecular weight in terms of polystyrene measured by GPC ( Mw) 2600 alkali-soluble resin (1).

<鹼可溶性樹脂(2):環氧基(甲基)丙烯酸酯樹脂(D1-2)> <alkali-soluble resin (2): epoxy (meth) acrylate resin (D1-2)>

以與鹼可溶性樹脂(1)之製造同樣的方式進行,使環氧化合物(環氧基當量264)、丙烯酸、甲氧基乙酸丁酯、三苯膦、及對甲氧苯酚進行反應,得到環氧基丙烯酸酯溶液(2)。 The epoxy compound (epoxy equivalent 264), acrylic acid, butyl methoxyacetate, triphenylphosphine, and p-methoxyphenol are reacted in the same manner as in the production of the alkali-soluble resin (1) to obtain a ring. Oxy acrylate solution (2).

將上述環氧基丙烯酸酯溶液(2)25質量份、三羥甲基丙烷(TMP)0.37質量份、聯苯基四羧酸2酐(BPDA)4.76質量份、及四氫酞酸酐(THPA)1.02質量份,置入於安裝有溫度計、攪拌機、冷卻管的燒瓶中,於攪拌下緩慢升溫至105℃而進行反應。 25 parts by mass of the above epoxy acrylate solution (2), 0.37 parts by mass of trimethylolpropane (TMP), 4.76 parts by mass of biphenyltetracarboxylic acid anhydride (BPDA), and tetrahydrophthalic anhydride (THPA) 1.02 parts by mass was placed in a flask equipped with a thermometer, a stirrer, and a cooling tube, and the mixture was slowly heated to 105 ° C under stirring to carry out a reaction.

在樹脂溶液變成透明後,以甲氧基乙酸丁酯進行稀釋,以固形份成為50質量%的方式進行調整,得到酸價100mgKOH/g、以GPC所測定之聚苯乙烯換算的重量平均分子量(Mw)10000的鹼可溶性樹脂(2)。 After the resin solution was made transparent, it was diluted with butyl methoxyacetate, and the solid content was adjusted to 50% by mass to obtain an acid value of 100 mgKOH/g and a weight average molecular weight in terms of polystyrene measured by GPC ( Mw) 10000 alkali-soluble resin (2).

<鹼可溶性樹脂(3):環氧基(甲基)丙烯酸酯樹脂(D1-1)> <Alkali-soluble resin (3): epoxy (meth) acrylate resin (D1-1)>

將日本化藥(股)製「XD1000」(二環戊二烯‧酚聚合物之聚環氧丙基醚,環氧基當量252)300質量份、甲基丙烯酸104質量份、對甲氧苯酚0.2質量份、三苯膦5質量份、及丙二醇單甲基醚乙酸酯255質量份,填裝於反應容器,依100℃進行攪拌直到酸價成為3.0mg-KOH/g為止。接著再添加四氫酞酸酐145質量份,以120℃ 反應4小時,得到固形份50質量%、酸價106mg-KOH/g、以GPC所測定之聚苯乙烯換算的重量平均分子量(Mw)1580的鹼可溶性樹脂(3)。 300 parts by mass of "XD1000" (polyepoxypropyl ether of dicyclopentadiene phenol polymer, epoxy equivalent 252), 104 parts by mass of methacrylic acid, p-methoxyphenol, manufactured by Nippon Kayaku Co., Ltd. 0.2 parts by mass, 5 parts by mass of triphenylphosphine, and 255 parts by mass of propylene glycol monomethyl ether acetate were placed in a reaction vessel and stirred at 100 ° C until the acid value became 3.0 mg-KOH/g. Then add 145 parts by mass of tetrahydrophthalic anhydride to 120 ° C After reacting for 4 hours, an alkali-soluble resin (3) having a solid content of 50% by mass, an acid value of 106 mg-KOH/g, and a polystyrene-equivalent weight average molecular weight (Mw) of 1,580 as measured by GPC was obtained.

<光聚合起始劑(1)> <Photopolymerization initiator (1)> (二酮體) (dione)

將乙基咔唑(5g、25.61mmol)與鄰萘甲醯氯(5.13g,26.89mmol)溶解於30ml之二氯甲烷,以冰水浴冷卻至2℃並攪拌,添加AlCl3(3.41g,25.61mmol)。再於室溫攪拌3小時後,於反應液中加入巴豆醯氯(2.81g,26.89mmol)之15ml二氯甲烷溶液,添加AlCl3(4.1g,30.73mmol),再攪拌1小時30分鐘。將反應液置於冰水200ml,添加二氯甲烷200ml並將有機層分液。將回收之有機層以無水硫酸鎂乾燥後,進行減壓下濃縮,得到白色固體(10g)之二酮體。 Ethyl oxazole (5 g, 25.61 mmol) and o-naphthoquinone chloride (5.13 g, 26.89 mmol) were dissolved in 30 ml of dichloromethane, cooled to 2 ° C with ice-water bath and stirred, and AlCl 3 (3.41 g, 25.61) was added. Mm). After stirring at room temperature for 3 hours, crotonic acyl chloride (2.81g, 26.89mmol) in 15ml of methylene chloride in the reaction solution was added AlCl 3 (4.1g, 30.73mmol), stirred for 1 hour 30 minutes. The reaction solution was placed in 200 ml of ice water, and dichloromethane (200 ml) was added and the organic layer was separated. The organic layer which was collected was dried over anhydrous magnesium sulfate and concentrated under reduced pressure to give a white solid (10 g).

(肟體) (肟体)

將二酮體(3.00g,7.19mmol)、NH2OH‧HCl(1.09g,15.81mmol)及醋酸鈉(1.23g,15.08mmol)混合至異丙醇30ml,迴流3小時。反應結束後,將反應液濃縮,於所得殘渣中加入醋酸乙酯30ml,以飽和碳酸氫鈉水溶液30ml、飽和食鹽水30ml洗淨,以無水硫酸鎂進行乾燥。過濾後,將有機層進行減壓下濃縮,得到固體1.82g。將其以管柱層析法進行精製,得到淡黃色固體2.22g之肟體。 A diketone (3.00 g, 7.19 mmol), NH 2 OH HCl (1.09 g, 15.81 mmol) and sodium acetate (1.23 g, 15.08 mmol) were mixed to 30 ml of isopropyl alcohol and refluxed for 3 hours. After the completion of the reaction, the reaction mixture was concentrated, and ethyl acetate (30 ml) was added, and the mixture was washed with 30 ml of saturated aqueous sodium hydrogen carbonate and 30 ml of saturated aqueous sodium chloride, and dried over anhydrous magnesium sulfate. After filtration, the organic layer was concentrated under reduced pressure toield. This was purified by column chromatography to give 2.22 g of a pale yellow solid.

(肟酯體) (肟 ester)

將肟體(2.22g,4.77mmol)與乙醯氯(1.34g,17.0mmol)加入至二氯甲烷20ml並冰冷,滴下三乙胺(1.77g,17.5mmol),直接反應1小時。藉由薄層層析法確認到原料消失後,加入水使反應停止。將反應液以飽和碳酸氫鈉水溶液5ml洗淨2次、以飽和食鹽水5ml洗淨2次,以無水硫酸鎂進行乾燥。過濾後,將有機層進行減壓下濃縮,將所得殘渣以管柱層析法(醋酸乙酯/己烷=2/1)進行精製,得到0.79g之淡黃色固體的光聚合起始劑(1)。將光聚合起始劑(1)之1H-NMR的化學位移示於以下。 The oxime (2.22 g, 4.77 mmol) and acetonitrile (1.34 g, 17.0 mmol) were added to dichloromethane (20 ml) and ice-cooled, and triethylamine (1.77 g, 17.5 mmol) was dropped and reacted for 1 hour. After confirming the disappearance of the starting material by thin layer chromatography, water was added to stop the reaction. The reaction solution was washed twice with 5 ml of a saturated aqueous sodium hydrogen carbonate solution, and then washed twice with 5 ml of saturated brine, and dried over anhydrous magnesium sulfate. After filtration, the organic layer was concentrated under reduced pressure, and the obtained residue was purified by column chromatography (ethyl acetate /hexane = 2 / 1) to give 0.79 g of a pale yellow solid. 1). The chemical shift of 1 H-NMR of the photopolymerization initiator (1) is shown below.

1H-NMR(CDCl3):σ1.17(d,3H),1.48(t,3H),1.53(s,3H),1.81(s,3H),2.16(s,3H),2.30(s,3H),3.17-3.32(m,2H),4.42(q,2H),4.78-4.94(br,1H),7.45-7.59(m,5H),7.65(dd,1H),7.95(m,2H),8.04(m,2H),8.14(dd,1H),8.42(d,1H),8.64(d,1H) 1 H-NMR (CDCl 3 ): σ 1.17 (d, 3H), 1.48 (t, 3H), 1.53 (s, 3H), 1.81 (s, 3H), 2.16 (s, 3H), 2.30 (s, 3H), 3.17-3.32 (m, 2H), 4.42 (q, 2H), 4.78-4.94 (br, 1H), 7.45-7.59 (m, 5H), 7.65 (dd, 1H), 7.95 (m, 2H) , 8.04 (m, 2H), 8.14 (dd, 1H), 8.42 (d, 1H), 8.64 (d, 1H)

光聚合起始劑(1)之構造係如以下。 The structure of the photopolymerization initiator (1) is as follows.

<實施例1> <Example 1> (抗蝕劑1(感光性樹脂組成物1)之調製) (Preparation of resist 1 (photosensitive resin composition 1))

使用先前所調製之碳黑油墨1,依成為表3所示比例之方式調配表3記載之各成分,藉攪拌子進行攪拌使其溶解,調製固形份濃度15質量%的抗蝕劑1。 Each of the components described in Table 3 was prepared by using the previously prepared carbon black ink 1 in the proportions shown in Table 3, and the mixture was stirred and dissolved by a stirrer to prepare a resist 1 having a solid content concentration of 15% by mass.

表3中之各成分的細節如以下。 The details of the ingredients in Table 3 are as follows.

‧PM21:含有甲基丙烯醯基之磷酸酯(日本化藥公司製,KAYAMER(註冊商標)PM21,密黏提升劑)。 ‧PM21: Phosphate containing methacryl oxime (KAYAMER (registered trademark) PM21, made by Nippon Kayaku Co., Ltd., dense adhesion promoter).

‧SH6040:環氧基矽烷偶合劑(東麗股份有限公司製,SH6040,密黏提升劑) ‧SH6040: Epoxy decane coupling agent (made by Toray Co., Ltd., SH6040, dense adhesion promoter)

‧F-559:界面活性劑(大日本油墨化學工業公司製,F559) ‧F-559: Surfactant (made by Dainippon Ink Chemical Industry Co., Ltd., F559)

<實施例2~7、比較例1~9> <Examples 2 to 7, Comparative Examples 1 to 9> (抗蝕劑2~16(感光性樹脂組成物2~16)之調製) (Preparation of resist 2 to 16 (photosensitive resin composition 2 to 16))

使用表4、5及6所示之碳黑油墨,將抗蝕劑1之各成分的種類變更為表4、5及6記載的各成分,將此等依成為表3所示比例之方式進行調配,依與抗蝕劑1相同的方法,藉攪拌子進行攪拌使其溶解,分別調製固形份濃度15質量%的抗蝕劑2~16。其中,抗蝕劑15之IRG907及DETX-S之固形份濃度的合計,係依與抗蝕劑1中之光聚合起始劑(1)之固形份濃度成為相同的方式以4:1之質量比率混合使用。 Using the carbon black inks shown in Tables 4, 5, and 6, the types of the respective components of the resist 1 were changed to the components described in Tables 4, 5, and 6, and the ratios shown in Table 3 were used. In the same manner as in the resist 1, the mixture was stirred and dissolved by a stirrer, and the resists 2 to 16 having a solid content concentration of 15% by mass were prepared. The total solid concentration of the IRG 907 and the DETX-S of the resist 15 is 4:1 in the same manner as the solid content concentration of the photopolymerization initiator (1) in the resist 1. The ratio is mixed.

表5及表6中之各成分的細節係如以下。 The details of the components in Tables 5 and 6 are as follows.

‧IRG907:IRGACURE907,Chiba Speciality Chemicals公司製,2-甲基-1-[4-(甲硫基)苯基]-2-啉基丙烷-1-酮。 ‧IRG907: IRGACURE907, manufactured by Chiba Speciality Chemicals, 2-methyl-1-[4-(methylthio)phenyl]-2- Lolinylpropan-1-one.

‧DETX-S:KAYACURE DETX-S,日本化藥(股)公司製,2,4-二甲基9-硫。於抗蝕劑15之固形份中含有1.6質量%。 ‧DETX-S: KAYACURE DETX-S, manufactured by Nippon Kayaku Co., Ltd., 2,4-dimethyl 9-sulfur . The solid content of the resist 15 contained 1.6% by mass.

‧光聚合起始劑(2):OXE02,BASF公司製。具有以下之化學構造。 ‧Photopolymerization initiator (2): OXE02, manufactured by BASF Corporation. It has the following chemical structure.

(油墨之評價) (evaluation of ink) (1)碳黑油墨之黏度評價 (1) Viscosity evaluation of carbon black ink

藉由黏度計(東機產業公司製,RE105L)測定所調製之碳黑油墨1~14的黏度。任一碳黑油墨之黏度均為10~20mPa‧s之範圍。測定碳黑油墨剛調製後(剛分散後)、與在室溫靜置1週後的油墨黏度,依以下基準進行分類判定。將結果記載於表7。 The viscosity of the prepared carbon black inks 1 to 14 was measured by a viscometer (RE105L, manufactured by Toki Sangyo Co., Ltd.). The viscosity of any carbon black ink is in the range of 10-20 mPa ‧ s. The viscosity of the ink immediately after preparation of the carbon black ink (just after dispersion) and after standing at room temperature for one week was determined by the following criteria. The results are shown in Table 7.

◎:油墨分散後,即使於室溫下放置1週亦幾乎無增黏。 ◎: After the ink was dispersed, it was almost tack-free even after being left at room temperature for one week.

○:油墨分散後,於室溫下放置1週雖有增黏,但穩定於20mPa‧s以內。 ○: After the ink was dispersed, it was thickened at room temperature for one week, but it was stable within 20 mPa·s.

△:油墨分散後,於室溫下放置1週持續增黏,超過20mPa‧s。 △: After the ink was dispersed, it was allowed to stand at room temperature for 1 week to continue to increase in viscosity, exceeding 20 mPa·s.

×:從油墨剛分散起後即大幅增黏,於3日以內超過20mPa‧s。 ×: The viscosity was greatly increased immediately after the ink was dispersed, and exceeded 20 mPa·s within 3 days.

(抗蝕劑之評價) (evaluation of resist) (1)抗蝕劑(感光性樹脂組成物)之黏度評價 (1) Viscosity evaluation of resist (photosensitive resin composition)

藉黏度計(東機產業公司製,RE105L)測定所調製之抗蝕劑1~15之黏度。任一抗蝕劑之黏度均為2~5mPa‧s之範圍。測定抗蝕劑剛調製後、與於室溫靜置1個月後之抗蝕劑的黏度,依以下基準進行分類判定。將結果記載於表7。 The viscosity of the prepared resists 1 to 15 was measured by a viscosity meter (manufactured by Toki Sangyo Co., Ltd., RE105L). The viscosity of any resist is in the range of 2 to 5 mPa ‧ s. The viscosity of the resist immediately after the resist was prepared and allowed to stand at room temperature for one month was measured and classified according to the following criteria. The results are shown in Table 7.

◎:抗蝕劑調製後,即使於室溫下放置1個月亦幾乎無增黏。 ◎: After the resist was prepared, it was almost tack-free even after being left at room temperature for one month.

○:抗蝕劑調製後,於室溫下放置1個月雖有增黏,但增黏程度為0.5mPa‧s以內。 ○: After the resist was prepared, it was thickened at room temperature for one month, but the degree of viscosity was within 0.5 mPa·s.

△:抗蝕劑調製後,於室溫下放置1個月發生增黏,增黏程度超過0.5mPa‧s。 △: After the resist was prepared, it was allowed to stick at room temperature for 1 month, and the viscosity increased to more than 0.5 mPa·s.

×:抗蝕劑調製後,於室溫下放置1週即發生增黏,增黏程度超過0.5mPa‧s。 X: After the resist was prepared, it was thickened at room temperature for one week, and the viscosity increased to more than 0.5 mPa·s.

抗蝕劑之黏度由於在塗佈時造成大幅影響,故相較於油墨依如 上述般之嚴格基準實施評價。 The viscosity of the resist is significantly different from that of the ink due to the large influence on the coating. The above-mentioned strict benchmark implementation evaluation.

(2)黑色矩陣(BM)之製作 (2) Production of black matrix (BM)

將所調製之抗蝕劑1~16藉旋塗器塗佈於玻璃基板,減壓乾燥後,以加熱板依100℃乾燥150秒。接著,對所得之乾燥塗佈膜,藉高壓水銀燈依30mJ,經由具有圖案寬度6μm及5μm之開口部的曝光遮罩進行圖案曝光後,於室溫(23℃)下,使用以超純水調製為0.04質量%之KOH水溶液作為鹼顯影液而進行噴霧顯影,去除未曝光部後,以超純水進行噴霧洗淨。接著,以230℃之爐進行後烘烤30分鐘,製作膜厚約1μm的BM。 The prepared resists 1 to 16 were applied onto a glass substrate by a spin coater, dried under reduced pressure, and dried at 100 ° C for 150 seconds on a hot plate. Next, the obtained dried coating film was subjected to pattern exposure by an exposure mask having an opening portion having a pattern width of 6 μm and 5 μm by a high-pressure mercury lamp at 30 mJ, and then prepared at room temperature (23 ° C) using ultrapure water. The KOH aqueous solution of 0.04% by mass was spray-developed as an alkali developing solution, and the unexposed portion was removed, and then spray-washed with ultrapure water. Subsequently, post-baking was performed in a furnace at 230 ° C for 30 minutes to prepare a BM having a film thickness of about 1 μm.

(3)BM之光學密度(OD值)與膜厚的評價 (3) Evaluation of optical density (OD value) and film thickness of BM

藉段差測定裝置Alpha-Step-500(KLA-Tencor公司)測定(2)所製作之BM膜厚,藉穿透濃度測定裝置GretagMacbeth D200-II(GretagMacbeth公司製)測定OD值。藉此求得每1μm之OD值(單位OD值)。抗蝕劑黏度評價結果為◎者及○者的單位OD值均為4.2/μm。 The BM film thickness produced in (2) was measured by a step-difference measuring apparatus Alpha-Step-500 (KLA-Tencor Co., Ltd.), and the OD value was measured by a penetration concentration measuring apparatus GretagMacbeth D200-II (manufactured by GretagMacbeth Co., Ltd.). Thereby, the OD value (unit OD value) per 1 μm was obtained. The results of the evaluation of the resist viscosity were ◎ and the unit OD values of both were 4.2/μm.

(4)6μm細線評價(顯影後) (4) 6 μm thin line evaluation (after development)

使用複數具有6μm開口(寬度為6μm之開口)的曝光遮罩,將顯影時間設定為以下條件,依與(2)相同之製程進行塗佈、曝光、顯影,製作BM細線。以下,將使用具有6μm開口之曝光遮罩所製作的BM細線簡記為「6μm細線」。 Using a plurality of exposure masks having openings of 6 μm (openings of 6 μm in width), the development time was set to the following conditions, and coating, exposure, and development were carried out in the same process as in (2) to prepare BM thin wires. Hereinafter, the BM thin line produced by using the exposure mask having an opening of 6 μm is simply referred to as “6 μm thin line”.

若鹼顯影時間過短,有發生鹼可溶性樹脂之溶解殘留 及顏料殘存、基板污染明顯的情形;另一方面,若過長則有BM細線逐漸被鹼顯影液浸蝕,並剝離的情形。又,最短溶解時間(可確認到基板上之圖案化的最短時間)係表示感光性樹脂組成物之鹼顯影容易度。 If the alkali development time is too short, there is a dissolution residue of the alkali-soluble resin. In the case where the pigment remains and the substrate contamination is obvious, on the other hand, if it is too long, the BM fine line is gradually etched by the alkali developing solution and peeled off. In addition, the shortest dissolution time (the shortest time for patterning on the substrate can be confirmed) indicates the ease of alkali development of the photosensitive resin composition.

進行BM細線評價時,不僅是最短溶解時間,亦有對最短溶解時間之數倍(例如1.5倍、2倍等)進行顯影時之BM線寬進行評價的情形,但隨著相對於最短溶解時間之倍數變大,線寬逐漸變細,或鹼顯影液滲透至基板與BM細線密黏之部分,而出現插陷部分,且容易剝離。又,隨著倍數變小,殘渣變得容易殘留。 When the BM thin line evaluation is performed, not only the shortest dissolution time but also the case where the BM line width at the time of development is several times (for example, 1.5 times, twice, etc.) of the shortest dissolution time is evaluated, but with respect to the shortest dissolution time The multiple is increased, the line width is gradually tapered, or the alkali developing solution penetrates to the portion where the substrate and the BM fine line are adhered to each other, and the depressed portion appears and is easily peeled off. Further, as the multiple becomes smaller, the residue tends to remain.

通常,在確認到圖案化時,由於來自曝光遮罩之折射光的影響而有BM線寬變粗的傾向,故為了於目標之線寬中進行評價,最短溶解時間之1.5倍之顯影時間為顯影適當點。又,視感光性樹脂組成物之組成而最短溶解時間相異,但若相對於最短溶解時間之倍數之值為相同的條件,則成為相同之顯影程度。 In general, when patterning is confirmed, the BM line width tends to become thick due to the influence of the refracted light from the exposure mask. Therefore, in order to evaluate the target line width, the development time of 1.5 times the minimum dissolution time is Develop the appropriate point. Moreover, the shortest dissolution time differs depending on the composition of the photosensitive resin composition, but the same development degree is obtained when the value of the multiple of the shortest dissolution time is the same.

抗蝕劑(感光性樹脂組成物)1~16之最短溶解時間分別為40~60秒,故依其個別之1.5倍之60~90秒之間的顯影時間製作數個樣本並進行以下評價。 The shortest dissolution time of the resist (photosensitive resin composition) 1 to 16 was 40 to 60 seconds, respectively, and several samples were prepared according to the development time between 1.5 and 60 seconds of the individual 1.5 times, and the following evaluations were performed.

(4-1)6μm細線之評價 (4-1) Evaluation of 6μm thin line

將上述(4)製造之樣本以光學顯微鏡於3處測定線寬。進而求得其平均值。將結果示於表7。 The sample prepared in the above (4) was measured for line width at three places by an optical microscope. Then find the average value. The results are shown in Table 7.

(4-2)6μm細線之直線性評價 (4-2) Linearity evaluation of 6μm thin line

細線係因鹼顯影液、或其後之水洗淋浴壓而被不均勻地浸蝕, 故有其直線性惡化的情形。藉由光學顯微鏡觀察,於基板上之3處觀察6μm細線的直線性,並依以下之方式進行分類。將結果記載於表7。 The fine thread is unevenly etched by the alkali developer, or the subsequent washing of the shower, Therefore, there is a case where the linearity deteriorates. The linearity of the 6 μm thin line was observed at three places on the substrate by observation under an optical microscope, and classified in the following manner. The results are shown in Table 7.

◎:所有之6μm細線的直線性非常良好。 ◎: The linearity of all 6 μm thin wires is very good.

○:可見到開始被鹼顯影液浸蝕之部分,但直線性惡化並不明顯。 ○: The portion which was initially etched by the alkali developing solution was observed, but the linearity deterioration was not remarkable.

△:全體可見到直線性惡化,亦可見到部分的缺陷等。 △: The linearity is deteriorated as a whole, and some defects and the like are also observed.

×:全體直線性非常差,缺陷亦多。 ×: The overall linearity is very poor and there are many defects.

(4-3)6μm細線之圖案插陷 (4-3) Pattern embedding of 6μm thin lines

將所製作之6μm細線之一部分切出3點的該剖面以SEM照片觀察。藉由剖面觀察,觀察基板與6μm細線圖案之接黏面是否被鹼顯影液浸蝕而有插陷,並依以下分類進行評價。將結果記載於表7。 This cross section in which one of the prepared 6 μm thin wires was cut out at 3 o'clock was observed by SEM photograph. From the cross-sectional observation, it was observed whether or not the adhesive surface of the substrate and the 6 μm fine line pattern was etched by the alkali developing solution, and was trapped, and evaluated according to the following classification. The results are shown in Table 7.

(插陷評價) (interpolation evaluation)

A:於所觀察之3點均無插陷且良好。 A: No damage was observed at the 3 points observed.

B:混合存在完全無插陷且良好的點、與雖未有插陷但觀察到密黏面開始被浸蝕的點。 B: The mixture has a point which is completely untrapped and is good, and a point where no adhesion is observed but the adhesion surface is observed to be etched.

C:於所觀察之3點,均觀察到雖未有插陷但密黏面開始被浸蝕。 C: At the 3 points observed, it was observed that the adhesive surface began to be etched although there was no insertion.

D:混合存在觀察到雖未有插陷但密黏面開始被浸蝕的點、與明顯有插陷的點。 D: The point where the mixture was not entangled but the viscous surface began to be etched and the point where the entanglement was apparent was observed.

E:於所觀察之3點均明顯見到插陷。 E: Insertion was clearly observed at the 3 points observed.

F:混合存在明顯見到插陷的點、與大幅插陷的點。 F: There are points where the insertion is clearly seen and the point of large insertion.

G:於所觀察之3點均發生大幅插陷。 G: A large intrusion occurred at the 3 points observed.

(5)6μm細線評價(熱處理後) (5) 6 μm thin line evaluation (after heat treatment)

進行了顯影處理之BM細線,係於其後進一步重疊塗佈紅、綠、藍之感光性樹脂組成物,故必須事先以高溫進行熱處理使其硬化。因此,對6μm細線以230℃進行熱處理30分鐘。藉由熱處理,由於未充分硬化之感光性樹脂組成物的流動、或殘留溶媒之脫離等,而有細線發生熱變形、線寬變粗的情形。 The BM thin wire subjected to the development treatment is further coated with a photosensitive resin composition of red, green, and blue, and then heat-treated at a high temperature to be cured. Therefore, the 6 μm thin wire was heat-treated at 230 ° C for 30 minutes. In the heat treatment, the flow of the photosensitive resin composition which is not sufficiently cured, or the detachment of the residual solvent, etc., may cause thermal deformation of the fine lines and thickening of the line width.

對熱處理後之6μm細線的線寬於3處進行測定。進而求得其平均值。又,由顯影後之線寬與熱處理後之線寬的差,求得增加線寬並設定以下之評價基準。將結果記載於表7。 The line width of the 6 μm fine line after the heat treatment was measured at three places. Then find the average value. Further, from the difference between the line width after development and the line width after heat treatment, the line width was increased and the following evaluation criteria were set. The results are shown in Table 7.

(線寬評價(平均值)) (line width evaluation (average value))

○:5.6~6.5μm之範圍內。 ○: Within the range of 5.6 to 6.5 μm.

×:5.6~6.5μm之範圍外。 ×: Outside the range of 5.6 to 6.5 μm.

(增加線寬評價) (Increase line width evaluation)

A:所觀察之3點均為0.1μm以下。 A: All three points observed were 0.1 μm or less.

B:所觀察之3點係混合存在0.1μm以下者、與超過0.1μm且0.3μm以下者。 B: The three points observed were mixed in an amount of 0.1 μm or less, and more than 0.1 μm and 0.3 μm or less.

C:所觀察之3點均超過0.1μm且0.3μm以下。 C: All three points observed exceeded 0.1 μm and 0.3 μm or less.

D:所觀察之3點係混合存在超過0.1μm且0.3μm以下者、與超過0.3μm且0.4μm以下者。 D: The three points observed were mixed in excess of 0.1 μm and 0.3 μm or less, and more than 0.3 μm and 0.4 μm or less.

E:所觀察之3點均超過0.3μm且0.4μm以下。 E: All three points observed exceeded 0.3 μm and 0.4 μm or less.

F:所觀察之3點係混合存在超過0.3μm且0.4μm以下者、與超過0.4μm者。 F: The three points observed were mixed in excess of 0.3 μm and 0.4 μm or less, and more than 0.4 μm.

G:所觀察之3點均超過0.4μm。 G: All three points observed exceeded 0.4 μm.

又,將熱處理後之6μm細線、經評價了線寬與增加 線寬的樣本的一部分切出3點,進行SEM觀察。細線之剖面為梯形。將對應於細線與基板之接觸面的下底之兩端的底角稱為錐角。依以下基準評價此錐角。結果記載於表7。 In addition, the 6 μm thin wire after heat treatment was evaluated for line width and increase. A part of the line width sample was cut out at 3 points and subjected to SEM observation. The profile of the thin line is trapezoidal. The bottom angle of both ends of the lower bottom corresponding to the contact surface of the thin line and the substrate is referred to as a taper angle. This cone angle was evaluated according to the following criteria. The results are shown in Table 7.

(錐角評價) (cone angle evaluation)

A:所觀察之3點均為73度以上。 A: All three points observed are 73 degrees or more.

B:混合存在73度以上之點、與63度以上且未滿73度的點。 B: A point where the mixture has a point of 73 degrees or more and a degree of 63 degrees or more and less than 73 degrees.

C:所觀察之3點均為63度以上且未滿73度。 C: All three points observed were 63 degrees or more and less than 73 degrees.

D:混合存在63度以上且未滿73度之點、與59度以上且未滿63度的點。 D: A point where 63 degrees or more and less than 73 degrees are mixed, and a point of 59 degrees or more and less than 63 degrees is mixed.

E:所觀察之3點均為59度以上且未滿63度。 E: All three points observed were 59 degrees or more and less than 63 degrees.

F:混合存在59度以上且未滿63度之點、與未滿59度的點。 F: The mixture has a point of 59 degrees or more and less than 63 degrees, and a point of less than 59 degrees.

G:所觀察之3點均為未滿59度。 G: All three points observed were less than 59 degrees.

如表7所示,實施例1~7之顯影後的6μm細線均直線性非常良好,且完全無插陷。另一方面,比較例1~9之顯影後之6μm細線可見到直線性惡化,於與基板間之接黏部可見到插陷。 As shown in Table 7, the 6 μm thin wires after development of Examples 1 to 7 were all very linear, and were completely free of traps. On the other hand, in the 6 μm thin wires after the development of Comparative Examples 1 to 9, the linearity was deteriorated, and the pinching was observed in the joint portion with the substrate.

又,實施例1~7之熱處理後之6μm細線,均係線寬維持在5.6μm~6.5μm的範圍內,可良好地形成6μm細線。增加線寬均抑制為0.3μm以下,錐角亦均為63度以上,故成為良好之細線。 Further, in the 6 μm thin wires after the heat treatment of Examples 1 to 7, the line width was maintained in the range of 5.6 μm to 6.5 μm, and the 6 μm thin wires were favorably formed. The line width is suppressed to 0.3 μm or less, and the taper angle is also 63 degrees or more, so that it is a good thin line.

另一方面,比較例1~9均為熱處理後之6μm細線,係增加線寬超過0.3μm,錐角亦為未滿63度,線寬超過6.5μm,無法形成5.6~6.5μm的6μm細線。尤其是使用了肟酯光聚合起始劑以外之起始劑的比較例9係顯影後與熱處理後均惡化。 On the other hand, Comparative Examples 1 to 9 were all 6 μm thin wires after heat treatment, and had a line width of more than 0.3 μm, a taper angle of less than 63 degrees, a line width of more than 6.5 μm, and a 6 μm thin wire of 5.6 to 6.5 μm could not be formed. In particular, Comparative Example 9 using an initiator other than the oxime ester photopolymerization initiator was deteriorated after development and after heat treatment.

(6)5μm細線評價(顯影後及熱處理後) (6) 5 μm thin line evaluation (after development and after heat treatment)

進而針對使用具有5μm開口之曝光遮罩所製作的BM細線(5μm細線),亦依與6μm細線同樣的評價方法及評價分類進行評價。將結果示於表8。 Further, the BM thin line (5 μm thin line) produced by using the exposure mask having an opening of 5 μm was also evaluated in the same evaluation method and evaluation classification as the 6 μm thin line. The results are shown in Table 8.

(線寬評價(平均值)) (line width evaluation (average value))

○:4.6~5.5μm之範圍內。 ○: Within the range of 4.6 to 5.5 μm.

×:4.6~5.5μm之範圍外。 ×: outside the range of 4.6 to 5.5 μm.

如表8所示,含有分散劑1、與肟酯光聚合起始劑之 感光性樹脂組成物的實施例1之顯影後的5μm細線,由於較6μm細線更細,故更容易受到鹼顯影液或熱處理之影響,多少可見到直線性降低的徵兆,或線寬稍微變粗0.1μm,錐角稍微變小5度,但可良好地形成4.6~5.5μm之5μm細線。 As shown in Table 8, containing dispersant 1, and oxime ester photopolymerization initiator The 5 μm thin wire after development of Example 1 of the photosensitive resin composition is more susceptible to alkali developing solution or heat treatment because it is thinner than the 6 μm thin wire, and the linear deterioration is somewhat observed, or the line width is slightly thicker. 0.1 μm, the taper angle was slightly reduced by 5 degrees, but a fine line of 5 μm of 4.6 to 5.5 μm was well formed.

又,可認為實施例6由於顏料之1次粒徑小至23nm且表面積較大,故分散劑容易吸附至顏料,隨此使吸附於顏料之分散劑之親溶媒基與鹼可溶性樹脂間有效地相溶,結果與6μm細線時同樣地,可形成直線性及插陷良好的5μm細線。 Further, it is considered that in Example 6, since the primary particle diameter of the pigment is as small as 23 nm and the surface area is large, the dispersant is easily adsorbed to the pigment, whereby the affinity between the lyophilic medium adsorbed to the dispersant of the pigment and the alkali-soluble resin is effectively When it is compatible, as a result, in the same manner as in the case of a 6 μm thin wire, a 5 μm thin wire having good linearity and good trapping can be formed.

本實施例之抗蝕劑所使用的聚胺基甲酸酯分散劑,由於與鹼可溶性樹脂之組合而使分散劑之親溶媒基與鹼可溶性樹脂良好地相溶並形成良好之立體障礙部,黏度與OD均良好且分散性亦佳。 The polyurethane dispersant used in the resist of the present embodiment, because of the combination with the alkali-soluble resin, allows the dissolving agent of the dispersing agent to be well compatible with the alkali-soluble resin to form a good steric barrier. Both viscosity and OD are good and dispersion is also good.

又,實施例中,係使用於1分子內具有紫外線吸收部位、能量傳達部位及自由基產生部位的肟酯光聚合起始劑,藉此,即使在紫外線難以到達之基板密黏面附近,亦可使鹼可溶性樹脂等有效地聚合。藉此,可認為鹼可溶性樹脂與聚胺基甲酸酯分散劑之親溶媒部的交纏變得更加牢固,在紫外線照射所進行之硬化時,亦抑制顏料凝集而可維持良好分散狀態,結果,來自顏料之耐鹼顯影性及耐熱性係於細線中均勻表現,直線性良好,插陷及因鹼顯影液所造成之浸蝕變少。 Further, in the examples, an oxime ester photopolymerization initiator having an ultraviolet absorbing portion, an energy transmitting portion, and a radical generating portion in one molecule is used, whereby even in the vicinity of the dense surface of the substrate which is difficult to reach by ultraviolet rays, An alkali-soluble resin or the like can be efficiently polymerized. Therefore, it is considered that the entanglement of the solvent-soluble portion of the alkali-soluble resin and the polyurethane dispersant becomes stronger, and when the curing by ultraviolet irradiation is performed, the aggregation of the pigment is also suppressed, and the dispersion state can be maintained. The alkali-resistant developability and heat resistance derived from the pigment are uniformly expressed in the fine line, and the linearity is good, and the trapping and the etching by the alkali developing solution are less.

又,可認為由於實施例1、2、3所使用之分散劑之吸附基全部為懸掛型,故與顏料間之吸附力提升、游離分散劑量減低。藉此,可認為於熱處理時,游離分散劑發揮如潤滑劑般之作用,可防止錐角降低、線寬增加的情形。 Further, it is considered that all of the adsorbing groups of the dispersing agents used in Examples 1, 2, and 3 are suspended, so that the adsorption force with the pigment is increased and the amount of free dispersion is reduced. Therefore, it is considered that the free dispersing agent acts as a lubricant during the heat treatment, and it is possible to prevent the taper angle from decreasing and the line width from increasing.

另一方面,可認為比較例9之感光性樹脂組成物係併用主要具有自由基產生部分之IRG907起始劑、與主要具有紫外線吸收部位之DETXS起始劑而產生自由基,但因使用2種之光聚合起始劑故自由基產生效率差,尤其在基板密黏面附近等紫外線難以到達之部分的聚合難以進行,隨此於熱處理時發生熱變形。 On the other hand, it is considered that the photosensitive resin composition of Comparative Example 9 is used together with an IRG907 initiator which mainly has a radical generating moiety, and a DETXS initiator which mainly has an ultraviolet absorbing site to generate a radical, but two kinds are used. The photopolymerization initiator has a poor radical generation efficiency, and it is difficult to carry out polymerization in a portion where ultraviolet rays are hard to reach, such as in the vicinity of the dense surface of the substrate, and thermal deformation occurs during heat treatment.

又,使用了不具吸附基之分散劑5的比較例1、以及使用了屬於聚胺基甲酸酯骨格以外之接枝聚合物的分散劑的比較例4、5及6,係與顏料間之吸附力弱,於抗蝕劑中之顏料的分散性不足。 Further, Comparative Examples 1 and 5 using a dispersing agent 5 having no adsorbing group, and Comparative Examples 4, 5 and 6 using a dispersing agent which is a graft polymer other than the polyurethane skeleton, were used between the pigments and the pigments. The adsorption force is weak, and the dispersibility of the pigment in the resist is insufficient.

因此,可認為於彩色濾光片製造時,在熱處理時顏料與分散劑間之鍵結變弱,發生顏料之凝集,來自顏料之耐鹼顯影性及耐熱性未充分表現,而發生熱變形。 Therefore, it is considered that when the color filter is produced, the bond between the pigment and the dispersant is weakened during the heat treatment, and aggregation of the pigment occurs, and the alkali-resistant developability and heat resistance from the pigment are not sufficiently expressed, and thermal deformation occurs.

又,使用了具有胺基甲酸乙酯鍵之市售分散劑的比較例2及3,由於係由具有3個以上異氰酸酯之甲苯二異氰酸酯的多聚物數個藉骨格連接基所連接的骨格、與數個親溶媒基或吸附基所構成的分散劑,故對顏料之包覆效果降低,此外亦產生對吸附基的立體障礙,故對顏料之吸附性能較低。此外,可認為親溶媒基之量或吸附基之量均較實施例所使用之聚胺基甲酸酯分散劑少,親溶媒基與鹼可溶性樹脂間之相溶不足,發生顏料凝集,來自顏料之耐鹼顯影性及耐熱性無法充分表現。 Further, Comparative Examples 2 and 3 using a commercially available dispersant having a urethane bond are a skeleton which is connected by a plurality of polymers of toluene diisocyanate having three or more isocyanates, The dispersing agent composed of a plurality of hydrophilic solvents or adsorbing groups reduces the coating effect on the pigment, and also causes steric hindrance to the adsorbing group, so that the adsorption performance to the pigment is low. Further, it is considered that the amount of the hydrophilic solvent group or the amount of the adsorbing group is smaller than that of the polyurethane dispersing agent used in the examples, and the compatibility between the solvent-soluble medium and the alkali-soluble resin is insufficient, and pigment aggregation occurs, and the pigment is derived from the pigment. The alkali-resistant developability and heat resistance cannot be sufficiently expressed.

進而,可認為使用了丙烯酸系AB嵌段型分散劑的比較例7及8,由於吸附基集中於分散劑之一方,故顏料吸附基彼此產生立體障礙而無法充分吸附於顏料,使游離分散劑量增加。因此,可認為於顏料與基板間無法充分獲得經由分散劑的基板密黏 力,鹼顯影耐性降低而難以得到圖案化。 Further, in Comparative Examples 7 and 8 in which an acrylic AB block type dispersant was used, since the adsorption group was concentrated on one of the dispersing agents, the pigment adsorbing groups were sterically hindered from each other and could not be sufficiently adsorbed to the pigment to cause a free dispersing amount. increase. Therefore, it can be considered that the substrate and the substrate are not sufficiently obtained to be densely adhered via the dispersant. Force, alkali development resistance is lowered and it is difficult to obtain patterning.

使用特定態樣詳細說明了本發明,但對於本領域中具有通常知識者而言,當知在未脫離本發明意圖與範圍之下可進行各種變更及變形。尚且,本申請案係根據2014年7月11日所申請之日本專利申請案(特願2014-143279),將其全體藉引用而援用於此。 The present invention has been described in detail with reference to the specific embodiments thereof. In addition, the present application is hereby incorporated by reference in its entirety in its entirety in its entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire content

10‧‧‧透明支持基板 10‧‧‧Transparent support substrate

20‧‧‧畫素 20‧‧ ‧ pixels

30‧‧‧有機保護層 30‧‧‧Organic protective layer

40‧‧‧無機氧化膜 40‧‧‧Inorganic oxide film

50‧‧‧透明陽極 50‧‧‧Transparent anode

51‧‧‧電洞注入層 51‧‧‧ hole injection layer

52‧‧‧電洞輸送層 52‧‧‧ hole transport layer

53‧‧‧發光層 53‧‧‧Lighting layer

54‧‧‧電子注入層 54‧‧‧Electronic injection layer

55‧‧‧陰極 55‧‧‧ cathode

100‧‧‧有機EL元件 100‧‧‧Organic EL components

500‧‧‧有機發光體 500‧‧‧Organic emitters

Claims (17)

一種感光性樹脂組成物,係含有色材(a)、分散劑(b)、光聚合起始劑(c)、鹼可溶性樹脂(d)及溶劑(e)者,其中,分散劑(b)係含有具親溶媒基及吸附基之聚胺基甲酸酯分散劑(b-1);該聚胺基甲酸酯分散劑(b-1)係含有下式(i)所示之部分構造;光聚合起始劑(c)係含有肟酯光聚合起始劑(c-1); [式(i)中,Ra表示亦可具有取代基之碳數1~20之伸烷基、碳數6~20之伸芳基、或上述伸烷基與上述伸芳基經連接之碳數7~20之基;*表示鍵結基]。 A photosensitive resin composition containing a color material (a), a dispersing agent (b), a photopolymerization initiator (c), an alkali-soluble resin (d), and a solvent (e), wherein the dispersing agent (b) A polyurethane dispersant (b-1) having an affinic solvent group and an adsorbing group; the polyurethane dispersant (b-1) containing a partial structure represented by the following formula (i) The photopolymerization initiator (c) contains an oxime ester photopolymerization initiator (c-1); [In the formula (i), R a represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, an extended aryl group having 6 to 20 carbon atoms, or a carbon bonded to the above-mentioned extended aryl group. The number of 7 to 20; * indicates the bond base]. 如申請專利範圍第1項之感光性樹脂組成物,其中,上述聚胺基甲酸酯分散劑(b-1)係含有:含有上述親溶媒基之含親溶媒基部分構造、與含有上述吸附基之含吸附基部分構造;該含親溶媒基部分構造與該含吸附基部分構造係藉由上式(i)所示之部分構造所連結。 The photosensitive resin composition of the first aspect of the invention, wherein the polyurethane dispersant (b-1) contains a structure containing a hydrophilic solvent group containing the lyophilic solvent, and contains the adsorption The base-containing adsorption moiety structure; the affinity-containing moiety structure and the adsorption group-containing moiety structure are linked by a partial structure represented by the above formula (i). 如申請專利範圍第1或2項之感光性樹脂組成物,其中,上述聚胺基甲酸酯分散劑(b-1)係具有主鏈,該主鏈係含有上式(i)所示之部分構造。 The photosensitive resin composition according to claim 1 or 2, wherein the polyurethane dispersant (b-1) has a main chain, and the main chain contains the formula (i) Partial construction. 如申請專利範圍第1至3項中任一項之感光性樹脂組成物,其中,上述親溶媒基係含有聚醚鏈及聚酯鏈之至少一者。 The photosensitive resin composition according to any one of claims 1 to 3, wherein the hydrophilic solvent group contains at least one of a polyether chain and a polyester chain. 如申請專利範圍第1至4項中任一項之感光性樹脂組成物,其中,上述吸附基係選自包含3級胺基、4級銨鹽基及含氮原子雜環基之群組中之至少1種。 The photosensitive resin composition according to any one of claims 1 to 4, wherein the adsorption group is selected from the group consisting of a tertiary amino group, a 4- toly ammonium group, and a nitrogen atom-containing heterocyclic group. At least one of them. 如申請專利範圍第2至5項中任一項之感光性樹脂組成物,其中,上述含吸附基部分構造係具有下式(1)所示之部分構造; [式(1)中,R1表示亦可具有取代基之烷基或芳基,R2及R3分別獨立表示亦可具有取代基之伸烷基、伸芳基伸烷基或伸芳基;*表示鍵結基]。 The photosensitive resin composition according to any one of claims 2 to 5, wherein the adsorption group-containing partial structure has a partial structure represented by the following formula (1); [In the formula (1), R 1 represents an alkyl group or an aryl group which may have a substituent, and R 2 and R 3 each independently represent an alkylene group, an extended arylalkyl group or an extended aryl group which may have a substituent; * indicates a bond base]. 如申請專利範圍第2至6項中任一項之感光性樹脂組成物,其中,上述含吸附基部分構造係具有下式(2-1)~(2-3)所示之至少1種之部分構造; [式(2-1)中,Rα及Rβ分別獨立表示亦可具有取代基之烷基或芳基;Rγ、Rδ及Rε分別獨立表示亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基;其中,在Rγ為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫 胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代;又,Rγ亦可經由-NH-(C=O)-基而與相鄰接之至少任一個N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結;*表示鍵結基;] [式(2-2)中,Rα及Rβ分別獨立表示亦可具有取代基之烷基或芳基;Rγ及Rη分別獨立表示亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基;其中,在Rγ及Rη分別獨立為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代;又,Rγ及Rη亦可經由-NH-(C=O)-基而與相鄰接之至少任一個N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結;*表示為鍵結基;] [式(2-3)中,Rα及Rβ分別獨立表示亦可具有取代基之烷基或芳基;Rγ'及Rδ分別獨立表示亦可具有取代基之伸烷基、亦可具有取代 基之伸芳基、或上述伸烷基與上述伸芳基經連接之基;其中,在Rγ'為亦可具有取代基之伸烷基、或上述伸烷基與上述伸芳基經連接之基時,構成上述伸烷基之亞甲基之至少一部分亦可藉由選自包含酯鍵、醚鍵、胺基甲酸乙酯鍵、脲鍵、醯胺鍵、醯亞胺鍵、硫胺基甲酸乙酯鍵、硫醚鍵及硫酯鍵之群組中之至少1個鍵所取代;又,Rγ'亦可經由-NH-(C=O)-基而與相鄰接之N原子一起進行脲鍵結,或經由羰基而進行醯胺鍵結;Rε'表示直接鍵結、亦可具有取代基之伸烷基、亦可具有取代基之伸芳基、或上述伸烷基與上述伸芳基經連接之基;Rζ表示氫原子、亦可具有取代基之烷基或亦可具有取代基之芳基;其中,在Rζ為烷基或芳基時,其氫原子之至少一個亦可藉由3級胺基或含氮原子雜環基所取代;*表示鍵結基]。 The photosensitive resin composition according to any one of the items (2) to (2-3), wherein the adsorption group-containing partial structure has at least one of the following formulas (2-1) to (2-3). Partial construction [In the formula (2-1), R α and R β each independently represent an alkyl group or an aryl group which may have a substituent; and R γ , R δ , and R ε each independently represent an alkylene group which may have a substituent, a aryl group having a substituent or a group in which the above alkyl group is bonded to the above aryl group; wherein, R γ is an alkyl group which may have a substituent, or the above alkyl group and the above-mentioned aryl group When the base is bonded, at least a part of the methylene group constituting the alkylene group may also be selected from the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, and a quinone bond. Substituting at least one bond in the group of ethyl thiocarbamate, thioether bond and thioester bond; further, R γ may also be adjacent to each other via -NH-(C=O)- group At least one of the N atoms is bonded together by a urea bond, or a guanamine bond is carried out via a carbonyl group; * represents a bond group; [In the formula (2-2), R α and R β each independently represent an alkyl group or an aryl group which may have a substituent; and R γ and R η each independently represent an alkylene group which may have a substituent, or may have a aryl group of a substituent or a group in which the above alkyl group is bonded to the above aryl group; wherein, R γ and R η are each independently an alkyl group which may have a substituent, or the above alkyl group and the above When the aryl group is bonded to the group, at least a part of the methylene group constituting the alkylene group may also be selected from the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, and a ruthenium bond. Substituting at least one bond in the group of an amine bond, an ethyl thioglycolate bond, a thioether bond, and a thioester bond; further, R γ and R η may also be via a -NH-(C=O)- group. And carrying out a urea bond together with at least one of the adjacent N atoms, or a guanamine bond via a carbonyl group; * is represented as a bond group; [In the formula (2-3), R α and R β each independently represent an alkyl group or an aryl group which may have a substituent; and R γ′ and R δ each independently represent an alkylene group which may have a substituent, and may also a aryl group having a substituent or a group in which the above alkyl group is bonded to the above aryl group; wherein, R γ ' is an alkyl group which may have a substituent, or an alkylene group and the above aryl group When the group is bonded, at least a part of the methylene group constituting the alkylene group may also be selected from the group consisting of an ester bond, an ether bond, a urethane bond, a urea bond, a guanamine bond, an oxime bond, Substituting at least one bond in the group of ethyl thiocarbamate, thioether bond and thioester bond; further, R γ ' may also be adjacent to each other via -NH-(C=O)- group The N atoms are bonded together by a urea bond, or a guanamine bond is carried out via a carbonyl group; R ε ' represents a direct bond, an alkyl group which may have a substituent, an extended aryl group which may have a substituent, or the above extension a group in which an alkyl group is bonded to the above-mentioned extended aryl group; R ζ represents a hydrogen atom, an alkyl group which may also have a substituent or an aryl group which may have a substituent; wherein, when R ζ is an alkyl group or an aryl group, At least one of its hydrogen atoms may also be substituted by a tertiary amino group or a nitrogen atom-containing heterocyclic group; * represents a bonding group]. 如申請專利範圍第1至7項中任一項之感光性樹脂組成物,其中,肟酯光聚合起始劑(c-1)係具有亦可被取代之咔唑基。 The photosensitive resin composition according to any one of claims 1 to 7, wherein the oxime ester photopolymerization initiator (c-1) has an oxazolyl group which may be substituted. 如申請專利範圍第1至8項中任一項之感光性樹脂組成物,其中,鹼可溶性樹脂(d)係含有具有羧基及乙烯性不飽和基之至少一者的鹼可溶性樹脂(d-1)。 The photosensitive resin composition of any one of Claims 1 to 8, wherein the alkali-soluble resin (d) contains an alkali-soluble resin (d-1) having at least one of a carboxyl group and an ethylenically unsaturated group. ). 如申請專利範圍第9項之感光性樹脂組成物,其中,鹼可溶性樹脂(d-1)為環氧基(甲基)丙烯酸酯樹脂。 The photosensitive resin composition of claim 9, wherein the alkali-soluble resin (d-1) is an epoxy (meth) acrylate resin. 如申請專利範圍第10項之感光性樹脂組成物,其中,上述環氧基(甲基)丙烯酸酯樹脂係下述環氧基(甲基)丙烯酸酯樹脂(D1-1)及環氧基(甲基)丙烯酸酯樹脂(D1-2)之至少一者;(1)使α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯加成於 環氧樹脂,進而使多元酸及其酐之至少一者進行反應而獲得的環氧基(甲基)丙烯酸酯樹脂(D1-1);(2)使α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯加成於環氧樹脂,進而使多元醇、與多元酸及其酐之至少一者進行反應而獲得的環氧基(甲基)丙烯酸酯樹脂(D1-2)。 The photosensitive resin composition of claim 10, wherein the epoxy (meth) acrylate resin is an epoxy (meth) acrylate resin (D1-1) and an epoxy group (hereinafter). At least one of a methyl acrylate resin (D1-2); (1) an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group is added thereto An epoxy group, an epoxy (meth) acrylate resin (D1-1) obtained by reacting at least one of a polybasic acid and an anhydride thereof, and (2) an α,β-unsaturated monocarboxylic acid or An epoxy (meth) acrylate resin obtained by adding an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, and further reacting a polyol with at least one of a polybasic acid and an anhydride thereof (D1-2). 如申請專利範圍第1至11項中任一項之感光性樹脂組成物,其中,色材(a)之平均一次粒徑為20~100nm。 The photosensitive resin composition according to any one of claims 1 to 11, wherein the color material (a) has an average primary particle diameter of 20 to 100 nm. 如申請專利範圍第1至12項中任一項之感光性樹脂組成物,其中,色材(a)含有碳黑。 The photosensitive resin composition according to any one of claims 1 to 12, wherein the color material (a) contains carbon black. 如申請專利範圍第13項之感光性樹脂組成物,其中,相對於總固形份,含有上述碳黑40質量%以上。 The photosensitive resin composition of claim 13, wherein the carbon black is contained in an amount of 40% by mass or more based on the total solid content. 一種硬化物,係使申請專利範圍第1至14項中任一項之感光性樹脂組成物硬化而成。 A cured product obtained by hardening a photosensitive resin composition according to any one of claims 1 to 14. 一種黑色矩陣,係含有申請專利範圍第15項之硬化物。 A black matrix containing a cured product of claim 15 of the patent application. 一種影像顯示裝置,係具備申請專利範圍第16項之黑色矩陣。 An image display device having a black matrix of claim 16 of the patent application.
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