TW201604869A - Resistance random access memory apparatus and operation method thereof - Google Patents

Resistance random access memory apparatus and operation method thereof Download PDF

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TW201604869A
TW201604869A TW103124961A TW103124961A TW201604869A TW 201604869 A TW201604869 A TW 201604869A TW 103124961 A TW103124961 A TW 103124961A TW 103124961 A TW103124961 A TW 103124961A TW 201604869 A TW201604869 A TW 201604869A
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random access
access memory
resistive random
memory cells
memory device
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TW103124961A
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TWI543162B (en
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林孟弘
沈鼎瀛
吳伯倫
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華邦電子股份有限公司
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Abstract

A resistance random access memory apparatus and an operation method thereof are provided. A default bias current is respectively provided to each resistance random access memory cell during a forming period, so as to uniform an impedance value of each resistance random access memory cell.

Description

電阻式隨機存取記憶體裝置及其操作方法 Resistive random access memory device and operation method thereof

本發明是有關於一種記憶體裝置,且特別是有關於一種電阻式隨機存取記憶體裝置及其操作方法。 The present invention relates to a memory device, and more particularly to a resistive random access memory device and method of operation thereof.

非揮發性記憶體具有存入的資料在斷電後也不會消失之優點,因此是許多電子產品維持正常操作所必備的記憶元件。目前,電阻式隨機存取記憶體(Resistive Random Access Memory;RRAM)是業界積極發展的一種非揮發性記憶體,其具有寫入操作電壓低、寫入抹除時間短、記憶時間長、非破壞性讀取、多狀態記憶、結構簡單以及所需面積小等優點,在未來個人電腦和電子設備上極具應用潛力。 Non-volatile memory has the advantage that the stored data will not disappear after power-off, so it is a necessary memory element for many electronic products to maintain normal operation. At present, Resistive Random Access Memory (RRAM) is a non-volatile memory actively developed in the industry, which has low write operation voltage, short write erase time, long memory time, and non-destructive memory. Sexual reading, multi-state memory, simple structure and small required area have great potential for application in personal computers and electronic devices in the future.

電阻式隨機存取記憶體為利用氧空缺(oxygen vacancies)或氧離子(oxygen ions)移動來形成導電絲狀物(conductive filament),透過外在施加電壓極性與電流值,促使導電狀物斷裂與再生成的現象,造成電阻值的差異。然而在半導體製程中經常發生製程變異的情況,例如若氧化層厚度或是離子參雜濃度不一 致,將導致電晶體的偏壓電位發生偏移,而使得形成的導電絲狀物的電阻值產生差異,進而影響位元的寫入。 Resistive random access memory uses oxygen vacancies or oxygen ions to form conductive filaments. Externally applied voltage polarity and current values cause the conductive material to break. The regenerated phenomenon causes a difference in resistance values. However, process variations often occur in semiconductor processes, such as oxide thickness or ion doping concentration. As a result, the bias potential of the transistor is shifted, and the resistance value of the formed conductive filament is different, thereby affecting the writing of the bit.

本發明提供一種電阻式隨機存取記憶體裝置及其操作方法,可提高資料存取的可靠性。 The invention provides a resistive random access memory device and an operation method thereof, which can improve the reliability of data access.

本發明的電阻式隨機存取記憶體裝置,包括多個電阻式隨機存取記憶胞以及多個電流源。其中多個電流源分別耦接於對應的位元線與對應的電阻式隨機存取記憶胞之間,於形成期間分別提供相同的預設偏壓電流至各個電阻式隨機存取記憶胞,以均勻化各電阻式隨機存取記憶胞的阻抗值。 The resistive random access memory device of the present invention comprises a plurality of resistive random access memory cells and a plurality of current sources. The plurality of current sources are respectively coupled between the corresponding bit line and the corresponding resistive random access memory cell, and respectively provide the same preset bias current to each resistive random access memory cell during formation, The impedance values of the respective resistive random access memory cells are homogenized.

在本發明的一實施例中,上述的預設偏壓電流為使電阻式隨機存取記憶胞皆形成低電阻態所需的最小電流。 In an embodiment of the invention, the predetermined bias current is a minimum current required for the resistive random access memory cells to form a low resistance state.

在本發明的一實施例中,上述各該電阻式隨機存取記憶胞包括可變阻抗單元與開關單元。其中可變阻抗單元耦接對應的電流源。開關單元耦接可變阻抗單元,受控於控制電壓而於形成期間被導通。 In an embodiment of the invention, each of the resistive random access memory cells includes a variable impedance unit and a switching unit. The variable impedance unit is coupled to the corresponding current source. The switching unit is coupled to the variable impedance unit and is controlled by the control voltage to be turned on during formation.

在本發明的一實施例中,上述的開關單元為電晶體,電晶體之閘極耦接至字元線,以接收控制電壓,電晶體之汲極耦接可變阻抗單元,電晶體之源極耦接至源極線。 In an embodiment of the invention, the switch unit is a transistor, and the gate of the transistor is coupled to the word line to receive the control voltage, and the drain of the transistor is coupled to the variable impedance unit, the source of the transistor. The pole is coupled to the source line.

本發明的實施例提供一電阻式隨機存取記憶體裝置的操作方法,其中電阻式隨機存取記憶體裝置包括多個電阻式隨機存 取記憶胞,電阻式隨機存取記憶體裝置的操作方法包括下列步驟。依據上述多個電阻式隨機存取記憶胞的製程差異設定預設偏壓電流。當進入形成期間時,分別提供相同的預設偏壓電流至各個電阻式隨機存取記憶胞,以均勻化各個電阻式隨機存取記憶胞的阻抗值。 Embodiments of the present invention provide a method of operating a resistive random access memory device, wherein the resistive random access memory device includes a plurality of resistive random access memories Taking the memory cell, the operation method of the resistive random access memory device includes the following steps. The preset bias current is set according to the process difference of the plurality of resistive random access memory cells. When entering the formation period, the same preset bias current is respectively supplied to each of the resistive random access memory cells to equalize the impedance values of the respective resistive random access memory cells.

在本發明的一實施例中,上述依據多個電阻式隨機存取記憶胞的製程差異設定預設偏壓電流的步驟包括下列步驟。偵測使上述多個電阻式隨機存取記憶胞皆形成低電阻態所需的最小電流。將此最小電流設定為預設偏壓電流。 In an embodiment of the invention, the step of setting the preset bias current according to the process difference of the plurality of resistive random access memory cells comprises the following steps. A minimum current required to cause the plurality of resistive random access memory cells to form a low resistance state is detected. Set this minimum current to the preset bias current.

在本發明的一實施例中,上述各個電阻式隨機存取記憶胞包括可變阻抗單元以及開關單元,其中可變阻抗單元耦接開關單元,電阻式隨機存取記憶體裝置的操作方法更包括,於形成期間提供控制電壓至開關單元以導通開關單元。 In an embodiment of the invention, each of the resistive random access memory cells includes a variable impedance unit and a switch unit, wherein the variable impedance unit is coupled to the switch unit, and the operation method of the resistive random access memory device further includes A control voltage is supplied to the switching unit to turn on the switching unit during formation.

在本發明的一實施例中,上述的開關單元為電晶體,電晶體之閘極耦接至字元線,以接收控制電壓,電晶體之汲極耦接可變阻抗單元,電晶體之源極耦接至源極線。 In an embodiment of the invention, the switch unit is a transistor, and the gate of the transistor is coupled to the word line to receive the control voltage, and the drain of the transistor is coupled to the variable impedance unit, the source of the transistor. The pole is coupled to the source line.

基於上述,本發明的實施例藉由在形成期間分別提供各個電阻式隨機存取記憶胞一預設偏壓電流,以均勻化各個電阻式隨機存取記憶胞的阻抗值,進而提高資料存取的可靠性。 Based on the above, the embodiment of the present invention provides a predetermined bias current for each resistive random access memory cell during formation to homogenize the impedance values of the respective resistive random access memory cells, thereby improving data access. Reliability.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the invention will be apparent from the following description.

102‧‧‧電阻式隨機存取記憶胞 102‧‧‧Resistive random access memory cells

104‧‧‧電流源 104‧‧‧current source

BL‧‧‧位元線 BL‧‧‧ bit line

Is‧‧‧預設偏壓電流 Is‧‧‧Preset bias current

202‧‧‧可變阻抗單元 202‧‧‧Variable impedance unit

204‧‧‧開關單元 204‧‧‧Switch unit

M1‧‧‧電晶體 M1‧‧‧O crystal

WL‧‧‧字元線 WL‧‧‧ character line

SL‧‧‧源極線 SL‧‧‧ source line

S302~S304‧‧‧電阻式隨機存取記憶體裝置的操作方法步驟 S302~S304‧‧‧Method of operation of resistive random access memory device

圖1繪示本發明一實施例之電阻式隨機存取記憶體裝置的示意圖。 1 is a schematic diagram of a resistive random access memory device according to an embodiment of the invention.

圖2繪示本發明另一實施例之電阻式隨機存取記憶體裝置的示意圖。 2 is a schematic diagram of a resistive random access memory device according to another embodiment of the present invention.

圖3繪示本發明一實施例之電阻式隨機存取記憶體裝置的操作方法的流程示意圖。 3 is a flow chart showing an operation method of a resistive random access memory device according to an embodiment of the present invention.

圖1繪示本發明一實施例之電阻式隨機存取記憶體裝置的示意圖,請參照圖1。電阻式隨機存取記憶體裝置包括多個電阻式隨機存取記憶胞102以及多個電流源104,電流源104分別耦接於對應的位元線BL與對應的電阻式隨機存取記憶胞102之間,為簡化說明,圖1僅繪示出單一個電阻式隨機存取記憶胞102以及其對應的電流源104。其中電阻式隨機存取記憶胞102的電阻值可依據所寫入資料的不同而被設定為低阻抗狀態(代表邏輯準位“1”)或高阻抗狀態(代表邏輯準位“0”)。在進行資料寫入前,電阻式隨機存取記憶胞102會在形成期間先被設定為低阻抗狀態,而後在設定期間再依據所寫入資料的不同改變電阻式隨機存取記憶胞102的阻抗狀態。 1 is a schematic diagram of a resistive random access memory device according to an embodiment of the invention. Please refer to FIG. 1. The resistive random access memory device includes a plurality of resistive random access memory cells 102 and a plurality of current sources 104. The current sources 104 are respectively coupled to the corresponding bit lines BL and the corresponding resistive random access memory cells 102. In order to simplify the description, FIG. 1 only shows a single resistive random access memory cell 102 and its corresponding current source 104. The resistance value of the resistive random access memory cell 102 can be set to a low impedance state (representing a logic level "1") or a high impedance state (representing a logic level "0") depending on the data to be written. Before the data is written, the resistive random access memory cell 102 is first set to a low impedance state during the formation period, and then the impedance of the resistive random access memory cell 102 is changed according to the written data during the set period. status.

在本實施例中,電流源104在形成期間將分別提供上述 多個電阻式隨機存取記憶胞相同的預設偏壓電流Is,其中預設偏壓電流Is為使電阻式隨機存取記憶體裝置中的各個電阻式隨機存取記憶胞102皆可形成低電阻態的情形下所需的最小電流。如此一來,便可避免流向各個電阻式隨機存取記憶胞102的電流因半導體製程的製程差異而有所不同,而可均勻化各個電阻式隨機存取記憶胞的阻抗值,進而提高電阻式隨機存取記憶體裝置的資料保存能力以及讀取可靠性。 In this embodiment, the current source 104 will provide the above separately during formation. The plurality of resistive random access memory cells have the same preset bias current Is, wherein the predetermined bias current Is is such that each of the resistive random access memory cells 102 in the resistive random access memory device can be formed low The minimum current required in the case of a resistive state. In this way, the current flowing to each of the resistive random access memory cells 102 can be prevented from being different due to the process variation of the semiconductor process, and the impedance values of the respective resistive random access memory cells can be uniformized, thereby improving the resistive type. Data storage capability and read reliability of random access memory devices.

圖2繪示本發明另一實施例之電阻式隨機存取記憶體裝置的示意圖,請參照圖2。詳細來說,上述之電阻式隨機存取記憶胞102可例如圖2所示,包括可變阻抗單元202以及開關單元204,其中可變阻抗單元202耦接開關單元204以及電阻式隨機存取記憶胞102對應的電流源104。在本實施例中,開關單元204為以一電晶體M1來實現,然並不以此為限。電晶體M1的閘極耦接至字元線WL,電晶體M1的汲極與源極則分別耦接可變阻抗單元202與源極線SL,其中可變阻抗單元202可例如為氧化物基礎(oxide-based)電阻式隨機存取記憶體。當電阻式隨機存取記憶胞102處於形成期間時,電晶體M1受控於來自字元線WL的控制電壓而被導通,同時電流源104提供預設偏壓電流Is給可變阻抗單元202,使得可變阻抗單元202中的氧離子被置換出而形成氧空缺(oxygen vacancies)而形成導電絲狀物。由於導電絲狀物的產生,可變阻抗單元202的阻抗值會大幅降低,亦即可變阻抗單元202被設定為低阻抗狀態(代表邏輯準位“1”)。 2 is a schematic diagram of a resistive random access memory device according to another embodiment of the present invention. Please refer to FIG. 2 . In detail, the resistive random access memory cell 102 can be, for example, as shown in FIG. 2, including a variable impedance unit 202 and a switch unit 204, wherein the variable impedance unit 202 is coupled to the switch unit 204 and the resistive random access memory. A current source 104 corresponding to cell 102. In this embodiment, the switch unit 204 is implemented by a transistor M1, but is not limited thereto. The gate of the transistor M1 is coupled to the word line WL, and the drain and the source of the transistor M1 are respectively coupled to the variable impedance unit 202 and the source line SL, wherein the variable impedance unit 202 can be, for example, an oxide base. (oxide-based) resistive random access memory. When the resistive random access memory cell 102 is in formation, the transistor M1 is turned on by the control voltage from the word line WL, while the current source 104 supplies the preset bias current Is to the variable impedance unit 202, The oxygen ions in the variable impedance unit 202 are displaced to form oxygen vacancies to form a conductive filament. Due to the generation of the conductive filaments, the impedance value of the variable impedance unit 202 is greatly reduced, that is, the variable impedance unit 202 is set to a low impedance state (representing a logic level "1").

此外,當電阻式隨機存取記憶胞102處於設定期間時,若欲將邏輯準位“0”寫入電阻式隨機存取記憶胞102,可施加偏壓電壓至源極線SL,此時電晶體M1亦接收來自字元線WL的控制電壓而處於導通狀態。因此,電流將自電晶體M1耦接源極線SL一端流向可變阻抗單元202,而使得氧離子移回可變阻抗單元202中,原本可變阻抗單元202中的氧空缺將會消失,亦即導電絲狀物會消失。由於導電絲狀物的消失,可變阻抗單元202的阻抗值會大幅提高,亦即可變阻抗單元202被設定為高阻抗狀態(代表邏輯準位“0”)。 In addition, when the resistive random access memory cell 102 is in the set period, if the logic level "0" is to be written into the resistive random access memory cell 102, a bias voltage can be applied to the source line SL. The crystal M1 also receives the control voltage from the word line WL and is in an on state. Therefore, the current will flow from the end of the transistor M1 coupled to the source line SL to the variable impedance unit 202, so that the oxygen ions move back into the variable impedance unit 202, and the oxygen vacancy in the original variable impedance unit 202 will disappear. That is, the conductive filaments will disappear. Due to the disappearance of the conductive filaments, the impedance value of the variable impedance unit 202 is greatly increased, that is, the variable impedance unit 202 is set to a high impedance state (representing a logic level "0").

其中,將可變阻抗單元202被設定為高阻抗狀態的方式並不限於施加偏壓電壓至源極線SL上,在部分實施例中,亦可透過電流源104來對電阻式隨機存取記憶胞102汲取電流的方式來將可變阻抗單元202設定為高阻抗狀態。此外,由於電流源104在形成期間提供的預設偏壓電流Is為使電阻式隨機存取記憶體裝置中的各個電阻式隨機存取記憶胞102皆可形成低電阻態的情形下所需的最小電流,因此可避免在設定期間將電阻式隨機存取記憶胞102設定為高阻抗狀態時,對源極線SL施加過高的偏壓電壓而造成導電絲狀物重新產生,而降低了電阻式隨機存取記憶體裝置的資料存取可靠性。 The manner in which the variable impedance unit 202 is set to the high impedance state is not limited to applying the bias voltage to the source line SL. In some embodiments, the resistive random access memory may also be transmitted through the current source 104. The cell 102 draws current to set the variable impedance unit 202 to a high impedance state. In addition, since the preset bias current Is provided during the formation of the current source 104 is such that each of the resistive random access memory cells 102 in the resistive random access memory device can form a low resistance state, The minimum current, so that when the resistive random access memory cell 102 is set to the high impedance state during the setting period, an excessive bias voltage is applied to the source line SL to cause the conductive filament to be regenerated, and the resistance is lowered. Data access reliability of a random access memory device.

圖3繪示本發明一實施例之電阻式隨機存取記憶體裝置的操作方法的流程示意圖,請參照圖3。由上述實施例可知,電阻式隨機存取記憶體裝置的操作方法至少包括下列步驟,首先,依 據多個電阻式隨機存取記憶胞的製程差異設定預設偏壓電流(步驟S302)。詳細來說,預設偏壓電流的決定方式可例如為,先偵測使上述多個電阻式隨機存取記憶胞皆形成低電阻態所需的最小電流(步驟S302A),然後再將此最小電流設定為預設偏壓電流(步驟S302B)。接著,當進入形成期間時,分別提供預設偏壓電流給各個電阻式隨機存取記憶胞,以均勻化各個電阻式隨機存取記憶胞的阻抗值(步驟S304)。詳細來說,各個電阻式隨機存取記憶胞可例如包括可變阻抗單元以及與可變阻抗單元耦接的開關單元,在形成期間可提供控制電壓至開關單元以導通開關單元,以均勻地在上述多個電阻式隨機存取記憶胞中的可變阻抗單元形成導電絲狀物。其中開關單元可例如為一電晶體,電晶體之閘極耦接至字元線,以接收控制電壓,電晶體之汲極與源極則分別耦接可變阻抗單元與源極線。 3 is a schematic flow chart showing an operation method of a resistive random access memory device according to an embodiment of the present invention. Please refer to FIG. 3. It can be seen from the above embodiments that the operation method of the resistive random access memory device includes at least the following steps. The preset bias current is set according to the process difference of the plurality of resistive random access memory cells (step S302). In detail, the preset bias current may be determined by, for example, first detecting a minimum current required to form the plurality of resistive random access memory cells into a low resistance state (step S302A), and then minimizing the current. The current is set to a preset bias current (step S302B). Next, when entering the formation period, preset bias currents are respectively supplied to the respective resistive random access memory cells to equalize the impedance values of the respective resistive random access memory cells (step S304). In detail, each of the resistive random access memory cells may include, for example, a variable impedance unit and a switching unit coupled to the variable impedance unit, during which a control voltage may be supplied to the switching unit to turn on the switching unit to uniformly The variable impedance unit of the plurality of resistive random access memory cells forms a conductive filament. The switching unit can be, for example, a transistor, and the gate of the transistor is coupled to the word line to receive the control voltage, and the drain and the source of the transistor are respectively coupled to the variable impedance unit and the source line.

綜上所述,本發明的實施例於形成期間分別提供各個電阻式隨機存取記憶胞一預設偏壓電流,以均勻化各個電阻式隨機存取記憶胞的阻抗值,進而提高資料存取的可靠性,其中預設偏壓電流為使電阻式隨機存取記憶體裝置中的各個電阻式隨機存取記憶胞皆可形成低電阻態的情形下所需的最小電流。 In summary, the embodiment of the present invention provides a predetermined bias current for each resistive random access memory cell during formation to homogenize the impedance values of the respective resistive random access memory cells, thereby improving data access. The reliability, wherein the preset bias current is a minimum current required in the case where each of the resistive random access memory cells in the resistive random access memory device can form a low resistance state.

102‧‧‧電阻式隨機存取記憶胞 102‧‧‧Resistive random access memory cells

104‧‧‧電流源 104‧‧‧current source

BL‧‧‧位元線 BL‧‧‧ bit line

Is‧‧‧預設偏壓電流 Is‧‧‧Preset bias current

Claims (8)

一種電阻式隨機存取記憶體裝置,包括:多個電阻式隨機存取記憶胞;以及多個電流源,分別耦接於對應的位元線與對應的該些電阻式隨機存取記憶胞之間,於一形成期間分別提供該些電阻式隨機存取記憶胞一預設偏壓電流,以均勻化各該電阻式隨機存取記憶胞的阻抗值。 A resistive random access memory device includes: a plurality of resistive random access memory cells; and a plurality of current sources respectively coupled to corresponding bit lines and corresponding resistive random access memory cells During the formation, the resistive random access memory cells are respectively provided with a predetermined bias current to equalize the impedance values of the resistive random access memory cells. 如申請專利範圍第1項所述之電阻式隨機存取記憶體裝置,其中該預設偏壓電流為使該些電阻式隨機存取記憶胞皆形成低電阻態所需的最小電流。 The resistive random access memory device of claim 1, wherein the predetermined bias current is a minimum current required for the resistive random access memory cells to form a low resistance state. 如申請專利範圍第1項所述之電阻式隨機存取記憶體裝置,其中各該電阻式隨機存取記憶胞包括:一可變阻抗單元,耦接對應的電流源;以及一開關單元,耦接該可變阻抗單元,於該形成期間受控於一控制電壓而被導通。 The resistive random access memory device of claim 1, wherein each of the resistive random access memory cells comprises: a variable impedance unit coupled to a corresponding current source; and a switching unit coupled The variable impedance unit is connected to be turned on by a control voltage during the formation. 如申請專利範圍第3項所述之電阻式隨機存取記憶體裝置,其中該開關單元為一電晶體,該電晶體之閘極耦接至一字元線,以接收該控制電壓,該電晶體之汲極耦接該可變阻抗單元,該電晶體之源極耦接至一源極線。 The resistive random access memory device of claim 3, wherein the switching unit is a transistor, and the gate of the transistor is coupled to a word line to receive the control voltage. The drain of the crystal is coupled to the variable impedance unit, and the source of the transistor is coupled to a source line. 一種電阻式隨機存取記憶體裝置的操作方法,該電阻式隨機存取記憶體裝置包括多個電阻式隨機存取記憶胞,該電阻式隨機存取記憶體裝置的操作方法包括: 依據該些電阻式隨機存取記憶胞的製程差異設定一預設偏壓電流;以及當進入一形成期間時,分別提供該些電阻式隨機存取記憶胞該預設偏壓電流,以均勻化各該電阻式隨機存取記憶胞的阻抗值。 A method for operating a resistive random access memory device, the resistive random access memory device comprising a plurality of resistive random access memory cells, the method of operating the resistive random access memory device comprising: And setting a preset bias current according to the process difference of the resistive random access memory cells; and providing the resistive random access memory cells to the predetermined bias current when entering a forming period to homogenize The impedance value of each of the resistive random access memory cells. 如申請專利範圍第5項所述之電阻式隨機存取記憶體裝置的操作方法,其中依據該些電阻式隨機存取記憶胞的製程差異設定該預設偏壓電流的步驟包括:偵測使該些電阻式隨機存取記憶胞皆形成低電阻態所需的最小電流;以及將該最小電流設定為該預設偏壓電流。 The method for operating a resistive random access memory device according to claim 5, wherein the step of setting the preset bias current according to a process variation of the resistive random access memory cells comprises: detecting The resistive random access memory cells each form a minimum current required for a low resistance state; and the minimum current is set to the preset bias current. 如申請專利範圍第5項所述之電阻式隨機存取記憶體裝置的操作方法,其中各該電阻式隨機存取記憶胞包括一可變阻抗單元以及一開關單元,其中該可變阻抗單元耦接該開關單元,該電阻式隨機存取記憶體裝置的操作方法更包括:於該形成期間提供一控制電壓至該開關單元以導通該開關單元。 The method of operating a resistive random access memory device according to claim 5, wherein each of the resistive random access memory cells comprises a variable impedance unit and a switching unit, wherein the variable impedance unit is coupled Connected to the switch unit, the method of operating the resistive random access memory device further includes: providing a control voltage to the switch unit to turn on the switch unit during the forming. 如申請專利範圍第7項所述之電阻式隨機存取記憶體裝置的操作方法,其中該開關單元為一電晶體,該電晶體之閘極耦接至一字元線,以接收該控制電壓,該電晶體之汲極耦接該可變阻抗單元,該電晶體之源極耦接至一源極線。 The method of operating a resistive random access memory device according to claim 7, wherein the switching unit is a transistor, and the gate of the transistor is coupled to a word line to receive the control voltage. The drain of the transistor is coupled to the variable impedance unit, and the source of the transistor is coupled to a source line.
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