TW201603247A - Pixel array substrate and panel - Google Patents

Pixel array substrate and panel Download PDF

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Publication number
TW201603247A
TW201603247A TW103123171A TW103123171A TW201603247A TW 201603247 A TW201603247 A TW 201603247A TW 103123171 A TW103123171 A TW 103123171A TW 103123171 A TW103123171 A TW 103123171A TW 201603247 A TW201603247 A TW 201603247A
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region
inorganic insulating
pixel
bendable
insulating pattern
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TW103123171A
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Chinese (zh)
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TWI553838B (en
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奎岳 陳
杜佳勳
林博揚
黃震鑠
蘇韋任
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友達光電股份有限公司
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Priority to CN201410512848.2A priority patent/CN104269417B/en
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Abstract

A pixel array substrate includes a substrate, a plurality of pixel units and an inorganic isolation layer. The substrate has an active region and a peripheral region located around the active region. The active region includes a plurality of pixel unit regions and a folding region located at least one side of the pixel unit regions. Each of the pixel units includes an active device and a pixel electrode electrically connected to the active device. The pixel electrodes are disposed corresponding in the pixel unit regions. The inorganic isolation layer includes a first inorganic pattern and a second inorganic pattern respectively disposed in the pixel unit regions and the folding region. A thickness of the first inorganic pattern is greater than a thickness of the second inorganic pattern.

Description

畫素陣列基板與面板 Pixel array substrate and panel

本發明是有關於一種畫素陣列基板與面板,且特別是有關於一種具有可撓曲特性的畫素陣列基板與面板。 The present invention relates to a pixel array substrate and a panel, and more particularly to a pixel array substrate and panel having flexible properties.

有鑒於有機發光二極體(organic light-emitting diode,OLED)的技術開發,對應發展的顯示器無須採用背光模組,不僅可以使顯示器達到輕薄的功效,更以「可撓曲」的特性作為未來顯示器開發重點。無機材料,即矽的氮氧化合物,如氮化矽(SiNx)、氧化矽(SiOx)及氮氧化矽(SiON),其具有抗擴散性、絕熱性及絕緣性佳的特性,因此廣泛應用於製作薄膜電晶體陣列結構的製程中。然而,無機材料在對抗拉伸應變時的能力差,因此當彎折可撓式面板的曲率過小時,則亦造成無機材料斷裂或脆裂,因此限制了有機發光二極體面板的顯示區域甚至是金屬走線區域的可撓曲程度。 In view of the development of the technology of organic light-emitting diode (OLED), the corresponding development of the display does not need to use a backlight module, not only can make the display light and thin, but also the "flexible" characteristics for the future The focus of display development. Inorganic materials, that is, niobium oxynitrides such as tantalum nitride (SiNx), yttrium oxide (SiOx), and yttrium oxynitride (SiON), which are excellent in diffusion resistance, heat insulation, and insulation properties, are widely used. In the process of fabricating a thin film transistor array structure. However, the inorganic material has a poor ability to resist tensile strain, so when the curvature of the flexural flexible panel is too small, the inorganic material is broken or brittle, thereby limiting the display area of the organic light-emitting diode panel. It is the degree of flexibility of the metal trace area.

本發明提供一種畫素陣列基板,其具有較佳的可撓曲特 性。 The invention provides a pixel array substrate with better flexibility Sex.

本發明另提供一種面板,其驅動電路區透過周邊可彎折區而彎折至主動區的背面,除了可達成無邊框顯示的效果之外,亦可以避免彎折時周邊的驅動線路產生碎裂或斷裂的問題,可具有較佳的結構可靠度。 The invention further provides a panel, wherein the driving circuit area is bent to the back surface of the active area through the peripheral bendable area, and in addition to the effect of the borderless display, the driving circuit of the periphery can be prevented from being broken when the bending is performed. Or the problem of fracture can have better structural reliability.

本發明的畫素陣列基板,其包括一基板、多個畫素單元以及一無機絕緣層。基板具有一主動區以及位於主動區周圍的一周邊區,其中主動區包括多個畫素單元區以及位於畫素單元區之至少一側的一可彎折區。每一畫素單元包括一主動元件以及與主動元件電性連接的一畫素電極,其中畫素電極對應設置在畫素單元區內。無機絕緣層包括一第一無機絕緣圖案以及一第二無機絕緣圖案,分別配置於畫素單元區以及可彎折區中。第一無機絕緣圖案的厚度大於第二無機絕緣圖案的厚度。 The pixel array substrate of the present invention comprises a substrate, a plurality of pixel units, and an inorganic insulating layer. The substrate has an active area and a peripheral area around the active area, wherein the active area includes a plurality of pixel unit areas and a bendable area on at least one side of the pixel unit area. Each pixel unit includes an active component and a pixel electrode electrically connected to the active component, wherein the pixel electrodes are correspondingly disposed in the pixel unit region. The inorganic insulating layer includes a first inorganic insulating pattern and a second inorganic insulating pattern respectively disposed in the pixel unit region and the bendable region. The thickness of the first inorganic insulating pattern is greater than the thickness of the second inorganic insulating pattern.

在本發明的一實施例中,上述的畫素陣列基板更包括多條第一訊號線以及多條第二訊號線,配置於基板上。每一畫素單元與其中一條第一訊號線以及其中一條第二訊號線電性連接,其中可彎折區位於其中一個畫素電極與下一條第一訊號線之間,或可彎折區位於其中一個畫素電極與下一條第二訊號線之間,或可彎折區位於其中一個畫素電極與下一條第一訊號線之間以及所述畫素電極與下一條第二訊號線之間。 In an embodiment of the invention, the pixel array substrate further includes a plurality of first signal lines and a plurality of second signal lines disposed on the substrate. Each pixel unit is electrically connected to one of the first signal lines and one of the second signal lines, wherein the bendable area is located between one of the pixel electrodes and the next first signal line, or the bendable area is located Between one of the pixel electrodes and the next second signal line, or the bendable region is between one of the pixel electrodes and the next first signal line and between the pixel electrode and the next second signal line .

在本發明的一實施例中,上述的第一訊號線與第二訊號線分別為掃描線、資料線與共用配線的其中二者。 In an embodiment of the invention, the first signal line and the second signal line are respectively two of a scan line, a data line and a shared line.

在本發明的一實施例中,上述的畫素陣列基板更包括一緩衝層,設置於基板與無機絕緣層之間,且緩衝層覆蓋畫素單元區與可彎折區,其中緩衝層的厚度介於500埃至1000埃。 In an embodiment of the invention, the pixel array substrate further includes a buffer layer disposed between the substrate and the inorganic insulating layer, and the buffer layer covers the pixel unit region and the bendable region, wherein the thickness of the buffer layer Between 500 angstroms and 1000 angstroms.

在本發明的一實施例中,上述的第一無機絕緣圖案的厚度介於4000埃至8000埃,而第二無機絕緣圖案的厚度介於0埃至1000埃。 In an embodiment of the invention, the first inorganic insulating pattern has a thickness of 4000 Å to 8000 Å, and the second inorganic insulating pattern has a thickness of 0 Å to 1000 Å.

在本發明的一實施例中,上述的基板之周邊區包括一驅動電路區以及位於驅動電路區與主動區之間的一周邊可彎折區。第一無機絕緣圖案更配置於驅動電路區,而第二無機絕緣圖案更配置於周邊可彎折區中。 In an embodiment of the invention, the peripheral region of the substrate includes a driving circuit region and a peripheral bendable region between the driving circuit region and the active region. The first inorganic insulating pattern is further disposed in the driving circuit region, and the second inorganic insulating pattern is disposed in the peripheral bendable region.

在本發明的一實施例中,上述的畫素陣列基板更包括一有機平坦層,覆蓋無機絕緣層,以使得位於畫素單元區之有機平坦層以及位於可彎折區內之有機平坦層共平面。 In an embodiment of the invention, the pixel array substrate further includes an organic flat layer covering the inorganic insulating layer such that the organic flat layer in the pixel unit region and the organic flat layer in the bendable region flat.

本發明的面板,其包括一基板、多個畫素單元、一驅動電路以及一無機絕緣層。基板具有一主動區以及位於主動區周圍的一周邊區。主動區包括多個畫素單元區,而周邊區包括一驅動電路區與位於驅動電路區與主動區之間的一周邊可彎折區。驅動電路區透過周邊可彎折區而彎折至主動區的背面。每一畫素單元包括一主動元件以及與主動元件電性連接的一畫素電極,其中畫素電極對應設置在畫素單元區內。驅動電路位於驅動電路區中,並位於畫素單元的背面。無機絕緣層包括一第一無機絕緣圖案以及一第二無機絕緣圖案。第一無機絕緣圖案配置於畫素單元區, 而第二無機絕緣圖案位於周邊可彎折區中,其中第一無機絕緣圖案的厚度大於第二無機絕緣圖案的厚度。 The panel of the present invention comprises a substrate, a plurality of pixel units, a driving circuit and an inorganic insulating layer. The substrate has an active area and a peripheral area located around the active area. The active area includes a plurality of pixel unit areas, and the peripheral area includes a driving circuit area and a peripheral bendable area between the driving circuit area and the active area. The drive circuit area is bent to the back of the active area through the peripheral bendable area. Each pixel unit includes an active component and a pixel electrode electrically connected to the active component, wherein the pixel electrodes are correspondingly disposed in the pixel unit region. The drive circuit is located in the drive circuit area and is located on the back of the pixel unit. The inorganic insulating layer includes a first inorganic insulating pattern and a second inorganic insulating pattern. The first inorganic insulation pattern is disposed in the pixel unit area, The second inorganic insulating pattern is located in the peripheral bendable region, wherein the thickness of the first inorganic insulating pattern is greater than the thickness of the second inorganic insulating pattern.

在本發明的一實施例中,上述的第一無機絕緣圖案的厚度介於4000埃至8000埃,而第二無機絕緣圖案的厚度介於0埃至1000埃。 In an embodiment of the invention, the first inorganic insulating pattern has a thickness of 4000 Å to 8000 Å, and the second inorganic insulating pattern has a thickness of 0 Å to 1000 Å.

在本發明的一實施例中,上述的第二無機絕緣層的厚度為零。 In an embodiment of the invention, the thickness of the second inorganic insulating layer is zero.

在本發明的一實施例中,上述的主動區更包括位於畫素單元區之至少一側的一可彎折區,且第二無機絕緣圖案位於可彎折區以及周邊可彎折區中。 In an embodiment of the invention, the active region further includes a bendable region on at least one side of the pixel unit region, and the second inorganic insulating pattern is located in the bendable region and the peripheral bendable region.

在本發明的一實施例中,上述的面板更包括多條第一訊號線以及多條第二訊號線,配置於基板上。每一畫素單元與其中一條第一訊號線以及其中一條第二訊號線電性連接,其中可彎折區位於其中一個畫素電極與下一條第一訊號線之間,或可彎折區位於其中一個畫素電極與下一條第二訊號線之間,或可彎折區位於其中一個畫素電極與下一條第一訊號線之間以及所述畫素電極與下一條第二訊號線之間。 In an embodiment of the invention, the panel further includes a plurality of first signal lines and a plurality of second signal lines disposed on the substrate. Each pixel unit is electrically connected to one of the first signal lines and one of the second signal lines, wherein the bendable area is located between one of the pixel electrodes and the next first signal line, or the bendable area is located Between one of the pixel electrodes and the next second signal line, or the bendable region is between one of the pixel electrodes and the next first signal line and between the pixel electrode and the next second signal line .

在本發明的一實施例中,上述的第一訊號線與第二訊號線分別為掃描線、資料線與共用配線的其中二者。 In an embodiment of the invention, the first signal line and the second signal line are respectively two of a scan line, a data line and a shared line.

在本發明的一實施例中,上述的面板更包括一緩衝層,設置於基板與無機絕緣層之間,且緩衝層位於主動區以及周邊區,其中緩衝層的厚度介於500埃至1000埃。 In an embodiment of the invention, the panel further includes a buffer layer disposed between the substrate and the inorganic insulating layer, and the buffer layer is located in the active region and the peripheral region, wherein the buffer layer has a thickness of 500 angstroms to 1000 angstroms. .

在本發明的一實施例中,上述的第一無機絕緣層更包括配置於基板的驅動電路區。 In an embodiment of the invention, the first inorganic insulating layer further includes a driving circuit region disposed on the substrate.

在本發明的一實施例中,上述的面板更包括一有機平坦層,覆蓋無機絕緣層,其中有機平坦層具有一平坦之頂表面。 In an embodiment of the invention, the panel further includes an organic flat layer covering the inorganic insulating layer, wherein the organic flat layer has a flat top surface.

基於上述,由於本發明的畫素陣列基板具有不同厚度的無機絕緣圖案,其中位於畫素單元區內的無機絕緣圖案的厚度大於位於可彎折區內的無機絕緣圖案的厚度。也就是說,無機絕緣圖案在可彎折區內較薄。如此一來,透過可彎折區而彎折畫素陣列基板時,可避免採用無機材料的無機絕緣層產生碎裂或斷裂的問題,進而使得本發明的畫素陣列基板可具有較佳的結構可靠度。另一方面,本發明的面板,其驅動電路區可透過周邊可彎折區而彎折至主動區的背面,而達成無邊框顯示的效果。再者,因為其無機絕緣圖案在畫素單元區的厚度大於在周邊可彎折區的厚度,因此可以避免彎折時驅動電路產生碎裂或斷裂的問題,可具有較佳的結構可靠度。 Based on the above, since the pixel array substrate of the present invention has inorganic insulating patterns of different thicknesses, the thickness of the inorganic insulating pattern located in the pixel unit region is larger than the thickness of the inorganic insulating pattern located in the bendable region. That is, the inorganic insulating pattern is thinner in the bendable region. Therefore, when the pixel array substrate is bent through the bendable region, the problem that the inorganic insulating layer of the inorganic material is broken or broken can be avoided, so that the pixel array substrate of the present invention can have a better structure. Reliability. On the other hand, in the panel of the present invention, the driving circuit area can be bent to the back surface of the active area through the peripheral bendable area, thereby achieving the effect of no border display. Furthermore, since the thickness of the inorganic insulating pattern in the pixel unit region is larger than the thickness of the peripheral bendable region, the problem of chipping or cracking of the driving circuit during bending can be avoided, and the structural reliability can be improved.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the invention will be apparent from the following description.

100a、100b‧‧‧畫素陣列基板 100a, 100b‧‧‧ pixel array substrate

110a、110b、210‧‧‧基板 110a, 110b, 210‧‧‧ substrates

112、212‧‧‧主動區 112, 212‧‧‧ active area

112a、212a‧‧‧畫素單元區 112a, 212a‧‧‧ pixel unit area

112b、212b‧‧‧可彎折區 112b, 212b‧‧‧ bendable area

114、114’、214‧‧‧周邊區 114, 114’, 214‧‧‧ surrounding area

114a、214a‧‧‧驅動電路區 114a, 214a‧‧‧ drive circuit area

114b、214b‧‧‧周邊可彎折區 114b, 214b‧‧‧ perimeter bendable area

120、220‧‧‧畫素單元 120, 220‧‧‧ pixel unit

122、222‧‧‧主動元件 122, 222‧‧‧ active components

124、224‧‧‧畫素電極 124, 224‧‧‧ pixel electrodes

130、130’、230‧‧‧無機絕緣層 130, 130', 230‧‧‧Inorganic insulation

132、232‧‧‧第一無機絕緣圖案 132, 232‧‧‧ first inorganic insulation pattern

134、234‧‧‧第二無機絕緣圖案 134, 234‧‧‧Second inorganic insulation pattern

140、240‧‧‧第一訊號線 140, 240‧‧‧ first signal line

150、250‧‧‧第二訊號線 150, 250‧‧‧second signal line

160、260‧‧‧緩衝層 160, 260‧‧‧ buffer layer

170、270‧‧‧有機平坦層 170, 270‧‧ organic flat layer

180、280‧‧‧驅動電路 180, 280‧‧‧ drive circuit

200、200’‧‧‧面板 200, 200’‧‧‧ panels

272‧‧‧頂表面 272‧‧‧ top surface

C‧‧‧共用配線 C‧‧‧Shared wiring

T、T1、T2、T3、T1’、T2’、T3’‧‧‧厚度 T, T1, T2, T3, T1', T2', T3'‧‧‧ thickness

W、W’‧‧‧水平寬度 W, W’‧‧‧ horizontal width

圖1A繪示為本發明的一實施例的一種畫素陣列基板的俯視的示意圖。 FIG. 1A is a schematic top plan view of a pixel array substrate according to an embodiment of the invention.

圖1B繪示為本發明的另一實施例的一種畫素陣列基板的俯視的示意圖。 FIG. 1B is a schematic top plan view of a pixel array substrate according to another embodiment of the present invention.

圖1C繪示為本發明的另一實施例的一種畫素陣列基板的俯視的示意圖。 FIG. 1C is a schematic top plan view of a pixel array substrate according to another embodiment of the invention.

圖1D繪示為本發明的另一實施例的一種畫素陣列基板的俯視的示意圖。 FIG. 1D is a schematic top plan view of a pixel array substrate according to another embodiment of the present invention.

圖2繪示為沿圖1A的線I-I的剖面示意圖。 2 is a cross-sectional view taken along line I-I of FIG. 1A.

圖3繪示為本發明的另一實施例的一種畫素陣列基板的俯視的示意圖。 3 is a schematic plan view of a pixel array substrate according to another embodiment of the present invention.

圖4繪示為沿圖3的線II-II的剖面示意圖。 4 is a cross-sectional view taken along line II-II of FIG. 3.

圖5A繪示為本發明的一實施例的一種面板的示意圖。 FIG. 5A is a schematic diagram of a panel according to an embodiment of the invention.

圖5B繪示為彎折圖5A的面板的示意圖。 FIG. 5B is a schematic view showing the panel of FIG. 5A being bent.

圖6繪示為圖5A的面板的局部剖面示意圖。 6 is a partial cross-sectional view of the panel of FIG. 5A.

圖7繪示為本發明的一實施例的一種面板的局部剖面示意圖。 FIG. 7 is a partial cross-sectional view of a panel according to an embodiment of the invention.

圖1A繪示為本發明的一實施例的一種畫素陣列基板的俯視的示意圖。圖2繪示為沿圖1A的線I-I的剖面示意圖。需說明的是,為了方便說明起見,圖1A省略繪示部分構件。請同時參考圖1A與圖2,在本實施例中,畫素陣列基板100a包括一基板110a、多個畫素單元120以及一無機絕緣層130。基板110a具有 一主動區112以及位於主動區112周圍的一周邊區114,其中主動區112包括多個畫素單元區112a以及位於畫素單元區112a之至少一側的一可彎折區112b。每一畫素單元120包括一主動元件122以及與主動元件122電性連接的一畫素電極124,其中畫素電極124對應設置在畫素單元區112a內。無機絕緣層130包括一第一無機絕緣圖案132以及一第二無機絕緣圖案134,分別配置於畫素單元區112a以及可彎折區112b中。特別是,第一無機絕緣圖案132的厚度T1大於第二無機絕緣圖案134的厚度T2。 FIG. 1A is a schematic top plan view of a pixel array substrate according to an embodiment of the invention. 2 is a cross-sectional view taken along line I-I of FIG. 1A. It should be noted that, for convenience of explanation, FIG. 1A omits part of the components. Referring to FIG. 1A and FIG. 2 simultaneously, in the embodiment, the pixel array substrate 100a includes a substrate 110a, a plurality of pixel units 120, and an inorganic insulating layer 130. The substrate 110a has An active region 112 and a peripheral region 114 located around the active region 112, wherein the active region 112 includes a plurality of pixel unit regions 112a and a bendable region 112b located on at least one side of the pixel unit region 112a. Each pixel unit 120 includes an active component 122 and a pixel electrode 124 electrically connected to the active component 122. The pixel electrode 124 is disposed in the pixel unit area 112a. The inorganic insulating layer 130 includes a first inorganic insulating pattern 132 and a second inorganic insulating pattern 134 disposed in the pixel unit region 112a and the bendable region 112b, respectively. In particular, the thickness T1 of the first inorganic insulating pattern 132 is greater than the thickness T2 of the second inorganic insulating pattern 134.

詳細來說,本實施例的基板110a例如是一可撓性基板,其中可撓性基板的材質例如是聚碳酸酯(Polycarbonate,PC)、聚乙烯對苯甲酸酯(Polyethylene Terephthalate,PET)、聚亞醯胺(Polyimide,PI)、聚醚碸(polyethersulfone,PES)、環烯烴共聚合物(Cyclic Olefin Copolymer,COC)、環烯烴聚合物(Cyclo Olefin Polymer,COP)或其組合,但並不以此為限。再者,本實施例的無機絕緣層130的材質例如是選自於氮化矽、氧化矽、氮氧化矽及其組合其中之一。也就是說,本實施例的無機絕緣層130可為一單一材質的結構層或多層不同材質的結構層,於此並不加以限制。此處,第一無機絕緣圖案132的厚度T1,較佳地,介於4000埃至8000埃,而第二無機絕緣圖案134的厚度T2,較佳地,介於0埃至1000埃。 In detail, the substrate 110a of the present embodiment is, for example, a flexible substrate, and the material of the flexible substrate is, for example, polycarbonate (Polycarbonate, PC), polyethylene terephthalate (PET), Polyimide (PI), polyethersulfone (PES), Cyclic Olefin Copolymer (COC), Cyclo Olefin Polymer (COP), or a combination thereof, but not This is limited to this. Furthermore, the material of the inorganic insulating layer 130 of the present embodiment is, for example, one selected from the group consisting of tantalum nitride, cerium oxide, cerium oxynitride, and a combination thereof. That is, the inorganic insulating layer 130 of the present embodiment may be a single material structural layer or a plurality of structural layers of different materials, and is not limited thereto. Here, the thickness T1 of the first inorganic insulating pattern 132 is preferably between 4,000 angstroms and 8,000 angstroms, and the thickness T2 of the second inorganic insulating pattern 134 is preferably from 0 angstroms to 1000 angstroms.

此外,如圖1A所示,本實施例的畫素陣列基板100a更包括多條第一訊號線140以及多條第二訊號線150,其中第一訊號 線140與第二訊號線150配置於基板110a上,且第一訊號線140與第二訊號線150垂直設置。更具體來說。畫素單元120呈陣列排列,且每一畫素單元120與其中一條第一訊號線140以及其中一條第二訊號線150電性連接。請參考圖1A,可彎折區112b可位於其中一個畫素電極124與下一條第二訊號線150之間;或者是,請參考圖1B,可彎折區112b可位於其中一個畫素電極124與下一條第一訊號線140之間;或者是,請參考圖1C,可彎折區112b可位於其中一個畫素電極124與下一條第一訊號線140之間以及所述畫素電極124與下一條第二訊號線150之間,於此並不加以限制。此處,第一訊號線140與第二訊號線150分別為掃描線、資料線與共用配線的其中二者。換言之,本實施例的可彎折區112b可位於兩相鄰的掃描線(如第一訊號線140)之間(如圖1B所示)、兩相鄰的資料線(如第二訊號線150)之間(如圖1A所示)、兩相鄰的共用配線C與掃描線(如第一訊號線140)之間(如圖1D所示)或兩相鄰的共用配線C與資料線(如第二訊號線150)之間。較佳地,可彎折區112b的曲率半徑小於5公釐,而可彎折區112b的水平寬度W介於0.3公釐至15.7公釐之間。 In addition, as shown in FIG. 1A, the pixel array substrate 100a of the embodiment further includes a plurality of first signal lines 140 and a plurality of second signal lines 150, wherein the first signal The line 140 and the second signal line 150 are disposed on the substrate 110a, and the first signal line 140 and the second signal line 150 are disposed perpendicular to each other. More specifically. The pixel units 120 are arranged in an array, and each of the pixel units 120 is electrically connected to one of the first signal lines 140 and one of the second signal lines 150. Referring to FIG. 1A, the bendable region 112b may be located between one of the pixel electrodes 124 and the next second signal line 150; or, referring to FIG. 1B, the bendable region 112b may be located at one of the pixel electrodes 124. Between the next first signal line 140; or, referring to FIG. 1C, the bendable region 112b can be located between one of the pixel electrodes 124 and the next first signal line 140 and the pixel electrode 124 and There is no limitation between the next second signal line 150. Here, the first signal line 140 and the second signal line 150 are respectively two of the scan line, the data line and the shared line. In other words, the bendable region 112b of the present embodiment can be located between two adjacent scan lines (such as the first signal line 140) (as shown in FIG. 1B) and two adjacent data lines (such as the second signal line 150). Between (as shown in FIG. 1A), between two adjacent common lines C and a scan line (such as the first signal line 140) (as shown in FIG. 1D) or two adjacent shared lines C and data lines ( As between the second signal line 150). Preferably, the bendable region 112b has a radius of curvature of less than 5 mm, and the bendable region 112b has a horizontal width W of between 0.3 mm and 15.7 mm.

另外,如圖2所示,為了有效保護基板110a,本實施例的畫素陣列基板100a更包括一緩衝層160,其中緩衝層160設置於基板110a與無機絕緣層130之間,且緩衝層160覆蓋畫素單元區112a與可彎折區112b。此處,緩衝層160的厚度T3,較佳地,介於500埃至1000埃,而緩衝層160的材質是選自於氮化矽、氧 化矽、氮氧化矽及其組合其中之一。也就是說,緩衝層160可為單一材質的結構層或多層不同材質的結構層,於此並不加以限制。再者,本實施例的畫素陣列基板100a可更包括一有機平坦層170,其中有機平坦層170覆蓋無機絕緣層130,以使得位於畫素單元區112a之有機平坦層170以及位於可彎折區112b內之有機平坦層170共平面。此處,有機平坦層170的材質例如是酚酫樹脂(phenol-formaldehyde resin)、環氧樹脂(epoxy resin)、及聚異戊二烯橡膠(polyisoprene rubber)等光阻劑(photoresist),但不此加以限制。 In addition, as shown in FIG. 2, in order to effectively protect the substrate 110a, the pixel array substrate 100a of the present embodiment further includes a buffer layer 160, wherein the buffer layer 160 is disposed between the substrate 110a and the inorganic insulating layer 130, and the buffer layer 160 The pixel unit area 112a and the bendable area 112b are covered. Here, the thickness T3 of the buffer layer 160 is preferably between 500 angstroms and 1000 angstroms, and the material of the buffer layer 160 is selected from tantalum nitride and oxygen. One of phlegm, bismuth oxynitride and combinations thereof. That is to say, the buffer layer 160 may be a structural layer of a single material or a structural layer of a plurality of layers of different materials, which is not limited herein. Furthermore, the pixel array substrate 100a of the present embodiment may further include an organic flat layer 170, wherein the organic flat layer 170 covers the inorganic insulating layer 130 such that the organic flat layer 170 located in the pixel unit region 112a is located at a bendable The organic planar layer 170 within region 112b is coplanar. Here, the material of the organic flat layer 170 is, for example, a photoresist such as a phenol-formaldehyde resin, an epoxy resin, or a polyisoprene rubber, but This is limited.

由於本實施例的畫素陣列基板100a具有不同厚度的第一無機絕緣圖案132與第二無機絕緣圖案134,其中位於畫素單元區112a內的第一無機絕緣圖案132的厚度T1大於位於可彎折區112b內的第二無機絕緣圖案134的厚度T2。也就是說,無機絕緣層130的第二無機絕緣圖案134在可彎折區112b內較薄。如此一來,透過可彎折區112b而彎折畫素陣列基板100a時,可避免採用無機材料的無機絕緣層130產生碎裂或斷裂的問題,進而使得本實施的畫素陣列基板100a可具有較佳的結構可靠度。另一方面,由於位於畫素單元區112a之有機平坦層170以及位於可彎折區112b內之有機平坦層170共平面,因此位於第一無機絕緣圖案132上的有機平坦層170的厚度小於位於第二無機絕緣圖案134上的有機平坦層170的厚度。也就是說,位於畫素電極124所在的畫素單元區112a內的有機平坦層170較薄而第一無機絕緣圖案132較 厚,因此較厚的無機絕緣層130的第一無機絕緣圖案132可有效避免水氣與氧氣進入於畫素單元120內,可有效提高元件的使用壽命。 Since the pixel array substrate 100a of the present embodiment has the first inorganic insulating pattern 132 and the second inorganic insulating pattern 134 of different thicknesses, the thickness T1 of the first inorganic insulating pattern 132 located in the pixel unit region 112a is larger than the bendable The thickness T2 of the second inorganic insulating pattern 134 in the folded region 112b. That is, the second inorganic insulating pattern 134 of the inorganic insulating layer 130 is thinner in the bendable region 112b. As a result, when the pixel array substrate 100a is bent through the bendable region 112b, the problem that the inorganic insulating layer 130 of the inorganic material is broken or broken can be avoided, so that the pixel array substrate 100a of the present embodiment can have Better structural reliability. On the other hand, since the organic flat layer 170 located in the pixel unit region 112a and the organic flat layer 170 located in the bendable region 112b are coplanar, the thickness of the organic flat layer 170 on the first inorganic insulating pattern 132 is less than The thickness of the organic flat layer 170 on the second inorganic insulating pattern 134. That is, the organic flat layer 170 located in the pixel unit region 112a where the pixel electrode 124 is located is thinner and the first inorganic insulating pattern 132 is thinner. Therefore, the first inorganic insulating pattern 132 of the thick inorganic insulating layer 130 can effectively prevent moisture and oxygen from entering the pixel unit 120, thereby effectively improving the service life of the component.

在此必須說明的是,下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。 It is to be noted that the following embodiments use the same reference numerals and parts of the above-mentioned embodiments, and the same reference numerals are used to refer to the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted portions, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.

圖3繪示為本發明的另一實施例的一種畫素陣列基板的俯視的示意圖。圖4繪示為沿圖3的線II-II的剖面示意圖。需說明的是,為了方便說明起見,圖3省略繪示部分構件。請同時參考圖1A與圖3,本實施例的畫素陣列基板100b與圖1A中的畫素陣列基板100a相似,惟二者主要差異之處在於:本實施例的基板110b之周邊區114’包括一驅動電路區114a以及位於驅動電路區114a與主動區112之間的一周邊可彎折區114b。特別是,本實施例的第一無機絕緣圖案132更配置於驅動電路區114a,而第二無機絕緣圖案134更配置於周邊可彎折區114b中。此處,如圖4所示,位於周邊可彎折區114b內的第二無機絕緣圖案134的厚度T明顯小於對於驅動電路區114a內的第一無機絕緣圖案132的厚度T4。更進一步來說,位於周邊可彎折區114b內的第二無機絕緣圖案134的厚度T可大於0且介於0埃至1000埃之間。當然,於其他未繪示的實施例中,位於周邊可彎折區114b內的第二無機絕緣圖案134的厚度T也可為零。另一方面,位於驅動電路區114a內 的第一無機絕緣圖案132的厚度T4與位於畫素單元區112a內的第一無機絕緣圖案132的厚度T1可相同或者是可不相同,於此並不加以限制,較佳地,介於4000埃至8000埃。 3 is a schematic plan view of a pixel array substrate according to another embodiment of the present invention. 4 is a cross-sectional view taken along line II-II of FIG. 3. It should be noted that, for convenience of explanation, FIG. 3 omits part of the components. Referring to FIG. 1A and FIG. 3 simultaneously, the pixel array substrate 100b of the present embodiment is similar to the pixel array substrate 100a of FIG. 1A, but the main difference is that the peripheral region 114' of the substrate 110b of the present embodiment A driver circuit region 114a and a peripheral bendable region 114b between the driver circuit region 114a and the active region 112 are included. In particular, the first inorganic insulating pattern 132 of the present embodiment is further disposed in the driving circuit region 114a, and the second inorganic insulating pattern 134 is disposed in the peripheral bendable region 114b. Here, as shown in FIG. 4, the thickness T of the second inorganic insulating pattern 134 located in the peripheral bendable region 114b is significantly smaller than the thickness T4 of the first inorganic insulating pattern 132 in the driving circuit region 114a. Furthermore, the thickness T of the second inorganic insulating pattern 134 located in the peripheral bendable region 114b may be greater than 0 and between 0 angstroms and 1000 angstroms. Of course, in other embodiments not shown, the thickness T of the second inorganic insulating pattern 134 located in the peripheral bendable region 114b may also be zero. On the other hand, located in the drive circuit area 114a The thickness T4 of the first inorganic insulating pattern 132 may be the same as or different from the thickness T1 of the first inorganic insulating pattern 132 located in the pixel unit region 112a, which is not limited thereto, and preferably, is between 4000 angstroms. To 8000 angstroms.

由於本實施例的畫素陣列基板100b具有不同厚度的第一無機絕緣圖案132與第二無機絕緣圖案134,其中位於驅動電路區114a內的第一無機絕緣圖案132的厚度T4大於位於周邊可彎折區114b內的第二無機絕緣圖案134的厚度T。也就是說,無機絕緣層130’的第二無機絕緣圖案134在周邊可彎折區114b內較薄。如此一來,透過周邊可彎折區114b而彎折畫素陣列基板100b時,可避免採用無機材料的無機絕緣層130’產生碎裂或斷裂的問題,進而使得本實施的畫素陣列基板100b可具有較佳的結構可靠度。另一方面,無機絕緣層130’的第一無機絕緣圖案132在畫素單元區112a及驅動電路區114a內較厚,因此可有效避免水氣與氧氣進入於畫素單元120及驅動電路(未繪示)內,可有效提高元件的使用壽命。 Since the pixel array substrate 100b of the present embodiment has the first inorganic insulating pattern 132 and the second inorganic insulating pattern 134 of different thicknesses, the thickness T4 of the first inorganic insulating pattern 132 located in the driving circuit region 114a is greater than that of the periphery. The thickness T of the second inorganic insulating pattern 134 in the folded region 114b. That is, the second inorganic insulating pattern 134 of the inorganic insulating layer 130' is thinner in the peripheral bendable region 114b. In this way, when the pixel array substrate 100b is bent through the peripheral bendable region 114b, the problem of chipping or breaking of the inorganic insulating layer 130' of the inorganic material can be avoided, and the pixel array substrate 100b of the present embodiment is further prevented. It can have better structural reliability. On the other hand, the first inorganic insulating pattern 132 of the inorganic insulating layer 130' is thicker in the pixel unit region 112a and the driving circuit region 114a, so that moisture and oxygen can be effectively prevented from entering the pixel unit 120 and the driving circuit (not In the drawing, it can effectively improve the service life of components.

圖5A繪示為本發明的一實施例的一種面板的示意圖。圖5B繪示為彎折圖5A的面板的示意圖。圖6繪示為圖5A的面板的局部剖面示意圖。需說明的是,為了方便說明起見,圖5B省略繪示部分構件。請同時參考圖5A、圖5B與圖6,在本實施例中,面板200包括一基板210、多個畫素單元220、一驅動電路280以及一無機絕緣層230。基板210具有一主動區212以及位於主動區212周圍的一周邊區214。主動區212包括多個畫素單元區212a, 而周邊區214包括一驅動電路區214a與位於驅動電路區214a與主動區212之間的一周邊可彎折區214b。驅動電路區214a透過周邊可彎折區214b而彎折至主動區212的背面。每一畫素單元220包括一主動元件222以及與主動元件222電性連接的一畫素電極224,其中畫素電極224對應設置在畫素單元區212a內。驅動電路280位於驅動電路區214a中,並可透過彎折而位於畫素單元220的背面。無機絕緣層230包括一第一無機絕緣圖案232以及一第二無機絕緣圖案234。第一無機絕緣圖案232配置於畫素單元區212a,而第二無機絕緣圖案234位於周邊可彎折區214b中,其中第一無機絕緣圖案232的厚度T1’大於第二無機絕緣圖案234的厚度T2’。較佳地,第一無機絕緣圖案232的厚度T1’介於4000埃至8000埃,而第二無機絕緣圖案234的厚度T2’介於0埃至1000埃。 FIG. 5A is a schematic diagram of a panel according to an embodiment of the invention. FIG. 5B is a schematic view showing the panel of FIG. 5A being bent. 6 is a partial cross-sectional view of the panel of FIG. 5A. It should be noted that, for convenience of explanation, FIG. 5B omits part of the components. Referring to FIG. 5A , FIG. 5B and FIG. 6 , in the embodiment, the panel 200 includes a substrate 210 , a plurality of pixel units 220 , a driving circuit 280 , and an inorganic insulating layer 230 . The substrate 210 has an active region 212 and a peripheral region 214 located around the active region 212. The active area 212 includes a plurality of pixel unit areas 212a. The peripheral zone 214 includes a drive circuit region 214a and a peripheral bendable region 214b between the drive circuit region 214a and the active region 212. The drive circuit region 214a is bent to the back surface of the active region 212 through the peripheral bendable region 214b. Each pixel unit 220 includes an active component 222 and a pixel electrode 224 electrically connected to the active component 222. The pixel electrode 224 is disposed in the pixel unit region 212a. The drive circuit 280 is located in the drive circuit region 214a and is located on the back side of the pixel unit 220 by bending. The inorganic insulating layer 230 includes a first inorganic insulating pattern 232 and a second inorganic insulating pattern 234. The first inorganic insulating pattern 232 is disposed in the pixel unit region 212a, and the second inorganic insulating pattern 234 is located in the peripheral bendable region 214b, wherein the thickness T1' of the first inorganic insulating pattern 232 is greater than the thickness of the second inorganic insulating pattern 234 T2'. Preferably, the first inorganic insulating pattern 232 has a thickness T1' of between 4,000 angstroms and 8,000 angstroms, and the second inorganic insulating pattern 234 has a thickness T2' of between 0 angstroms and 1000 angstroms.

更具體來說,在本實施例中,主動區212更包括位於畫素單元區212a之至少一側的一可彎折區212b,且第二無機絕緣圖案234位於可彎折區212b以及周邊可彎折區214b中。再者,本實施例的面板200更包括多條第一訊號線240以及多條第二訊號線250,其中第一訊號線240與第二訊號線250配置於基板210上,而第一訊號線240與第二訊號線250交錯設置,且第一訊號線240延伸經過周邊可彎折區214b,驅動電路280位於驅動電路區214a。每一畫素單元220與其中一條第一訊號線240以及其中一條第二訊號線250電性連接,其中可彎折區212b位於其中一個 畫素電極224與下一條第一訊號線240之間;或者是,可彎折區212b位於其中一個畫素電極224與下一條第二訊號線250之間;或者是可彎折區212b位於其中一個畫素電極224與下一條第一訊號線240之間以及所述畫素電極224與下一條第二訊號線250之間。此處,第一訊號線240與第二訊號線250分別為掃描線、資料線與共用配線的其中二者。換言之,本實施例的可彎折區212b可位於兩相鄰的掃描線之間、兩相鄰的資料線之間、兩相鄰的共用配線與掃描線之間或兩相鄰的共用配線與資料線之間。較佳地,可彎折區212b的曲率半徑小於5公釐,而可彎折區212b的水平寬度W’介於0.3公釐至15.7公釐之間。 More specifically, in the embodiment, the active region 212 further includes a bendable region 212b located on at least one side of the pixel unit region 212a, and the second inorganic insulating pattern 234 is located at the bendable region 212b and the periphery. In the bend zone 214b. Furthermore, the panel 200 of the present embodiment further includes a plurality of first signal lines 240 and a plurality of second signal lines 250. The first signal lines 240 and the second signal lines 250 are disposed on the substrate 210, and the first signal lines are disposed. 240 is interleaved with the second signal line 250, and the first signal line 240 extends through the peripheral bendable region 214b, and the driving circuit 280 is located in the driving circuit region 214a. Each pixel unit 220 is electrically connected to one of the first signal lines 240 and one of the second signal lines 250, wherein the bendable area 212b is located at one of them. Between the pixel electrode 224 and the next first signal line 240; or, the bendable region 212b is located between one of the pixel electrodes 224 and the next second signal line 250; or the bendable region 212b is located therein Between one pixel electrode 224 and the next first signal line 240 and between the pixel electrode 224 and the next second signal line 250. Here, the first signal line 240 and the second signal line 250 are respectively two of the scan line, the data line and the shared line. In other words, the bendable region 212b of the present embodiment can be located between two adjacent scan lines, between two adjacent data lines, between two adjacent common and scan lines, or between two adjacent common lines and Between data lines. Preferably, the bendable region 212b has a radius of curvature of less than 5 mm, and the bendable region 212b has a horizontal width W' of between 0.3 mm and 15.7 mm.

需說明的是,雖然在此的基板210的主動區212內包含有可彎折區212b,意即基板210的主動區212除了畫素單元區212a之外,亦具有可撓特性的可彎折區212b。但是,於其他未繪示的實施例中,基板的主動區內亦可不具有可彎折區,也就是說,基板的主動區僅具有畫素單元區且不具有可撓特性,此仍屬於本發明所欲保護之範圍。再者,如圖6所示,第二無機絕緣層234於可彎折區212b以及周邊可彎折區214b的厚度T2’具體化皆為大於0埃。但是,於其他實施例中,請參考圖7所繪示的面板200’,其中位於周邊可彎折區214b的第二無機絕緣圖案234的厚度具體化為零,此仍屬於本發明所欲保護之範圍。此外,本實施例的第一無機絕緣層232更包括配置於基板210的驅動電路區214a,而位於驅動電路區214a的第一無機絕緣圖案232的厚度T1’與位於 畫素單元區212a的第一無機絕緣圖案232的厚度T1’可相同(如圖6之實施例所繪示)或者是可不相同,於此並不加以限制。 It should be noted that although the active region 212 of the substrate 210 includes a bendable region 212b therein, that is, the active region 212 of the substrate 210 has a flexible characteristic bendable in addition to the pixel unit region 212a. Zone 212b. However, in other embodiments not shown, the active region of the substrate may not have a bendable region, that is, the active region of the substrate has only a pixel unit region and has no flexible property, which is still The scope of the invention to be protected. Moreover, as shown in FIG. 6, the thickness T2' of the second inorganic insulating layer 234 in the bendable region 212b and the peripheral bendable region 214b is more than 0 angstroms. However, in other embodiments, please refer to the panel 200 ′ illustrated in FIG. 7 , wherein the thickness of the second inorganic insulating pattern 234 located in the peripheral bendable region 214 b is embodied as zero, which is still to be protected by the present invention. The scope. In addition, the first inorganic insulating layer 232 of the present embodiment further includes a driving circuit region 214a disposed on the substrate 210, and the thickness T1' of the first inorganic insulating pattern 232 located in the driving circuit region 214a is located The thickness T1' of the first inorganic insulating pattern 232 of the pixel unit area 212a may be the same (as shown in the embodiment of FIG. 6) or may be different, and is not limited thereto.

另外,請再參考圖6,為了有效保護基板210,本實施例的面板200更包括一緩衝層260,其中緩衝層260設置於基板210與無機絕緣層230之間,且緩衝層260覆蓋主動區212與周邊區214。此處,緩衝層160的厚度T3’,較佳地,介於500埃至1000埃,而緩衝層260的材質是選自於氮化矽、氧化矽、氮氧化矽及其組合其中之一。也就是說,緩衝層260可為單一材質的結構層或多層不同材質的結構層,於此並不加以限制。再者,本實施例的面板200可更包括一有機平坦層270,其中有機平坦層270覆蓋無機絕緣層230且具有一平坦之頂表面272。此處,有機平坦層270的材質例如是酚酫樹脂(phenol-formaldehyde resin)、環氧樹脂(epoxy resin)、及聚異戊二烯橡膠(polyisoprene rubber)等光阻劑(photoresist),但不此加以限制。 In addition, referring to FIG. 6 , in order to effectively protect the substrate 210 , the panel 200 of the embodiment further includes a buffer layer 260 , wherein the buffer layer 260 is disposed between the substrate 210 and the inorganic insulating layer 230 , and the buffer layer 260 covers the active region. 212 and the surrounding area 214. Here, the thickness T3' of the buffer layer 160 is preferably between 500 angstroms and 1000 angstroms, and the material of the buffer layer 260 is selected from one of tantalum nitride, lanthanum oxide, lanthanum oxynitride, and combinations thereof. That is to say, the buffer layer 260 may be a structural layer of a single material or a structural layer of a plurality of layers of different materials, which is not limited herein. Furthermore, the panel 200 of the present embodiment may further include an organic flat layer 270, wherein the organic flat layer 270 covers the inorganic insulating layer 230 and has a flat top surface 272. Here, the material of the organic flat layer 270 is, for example, a photoresist such as a phenol-formaldehyde resin, an epoxy resin, or a polyisoprene rubber, but This is limited.

由於本實施例面板200,其驅動電路區214a可透過周邊可彎折區214b而彎折至主動區212的背面,因而可達成無邊框顯示的效果。再者,因為面板200的第一無機絕緣圖案232在畫素單元區212a的厚度T1’大於在周邊可彎折區214b的厚度T2’,因此可以避免彎折時驅動電路280產生碎裂或斷裂的問題,可具有較佳的結構可靠度。 Since the panel 200 of the embodiment has the driving circuit region 214a bent through the peripheral bendable region 214b to the back surface of the active region 212, the effect of the borderless display can be achieved. Moreover, since the thickness T1' of the first inorganic insulating pattern 232 of the panel 200 in the pixel unit region 212a is larger than the thickness T2' of the peripheral bendable region 214b, it is possible to avoid the chipping or breaking of the driving circuit 280 at the time of bending. The problem can have better structural reliability.

綜上所述,由於本發明的畫素陣列基板具有不同厚度的無機絕緣圖案,其中位於畫素單元區內的無機絕緣圖案的厚度大 於位於可彎折區內的無機絕緣圖案的厚度。也就是說,無機絕緣圖案在可彎折區內較薄。如此一來,透過可彎折區而彎折畫素陣列基板時,可避免採用無機材料的無機絕緣層產生碎裂或斷裂的問題,進而使得本發明的畫素陣列基板可具有較佳的結構可靠度。 In summary, since the pixel array substrate of the present invention has inorganic insulating patterns of different thicknesses, the thickness of the inorganic insulating pattern located in the pixel unit region is large. The thickness of the inorganic insulating pattern located in the bendable region. That is, the inorganic insulating pattern is thinner in the bendable region. Therefore, when the pixel array substrate is bent through the bendable region, the problem that the inorganic insulating layer of the inorganic material is broken or broken can be avoided, so that the pixel array substrate of the present invention can have a better structure. Reliability.

此外,本發明的面板,其驅動電路區可透過周邊可彎折區而彎折至主動區的背面,而達成無邊框顯示的效果。再者,因為其無機絕緣圖案在畫素單元區的厚度大於在周邊可彎折區的厚度,因此可以避免彎折時驅動電路產生碎裂或斷裂的問題,可具有較佳的結構可靠度。 In addition, in the panel of the present invention, the driving circuit area can be bent to the back surface of the active area through the peripheral bendable area, thereby achieving the effect of no border display. Furthermore, since the thickness of the inorganic insulating pattern in the pixel unit region is larger than the thickness of the peripheral bendable region, the problem of chipping or cracking of the driving circuit during bending can be avoided, and the structural reliability can be improved.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

100a‧‧‧畫素陣列基板 100a‧‧‧ pixel array substrate

110a‧‧‧基板 110a‧‧‧Substrate

112‧‧‧主動區 112‧‧‧active area

112a‧‧‧畫素單元區 112a‧‧‧ pixel unit

112b‧‧‧可彎折區 112b‧‧‧ bendable area

130‧‧‧無機絕緣層 130‧‧‧Inorganic insulation

132‧‧‧第一無機絕緣圖案 132‧‧‧First inorganic insulation pattern

134‧‧‧第二無機絕緣圖案 134‧‧‧Second inorganic insulation pattern

140‧‧‧第一訊號線 140‧‧‧First signal line

160‧‧‧緩衝層 160‧‧‧buffer layer

170‧‧‧有機平坦層 170‧‧‧Organic flat layer

T1、T2、T3‧‧‧厚度 T1, T2, T3‧‧‧ thickness

W‧‧‧水平寬度 W‧‧‧ horizontal width

Claims (16)

一種畫素陣列基板,包括:一基板,具有一主動區以及位於該主動區周圍的一周邊區,其中該主動區包括多個畫素單元區以及位於該些畫素單元區之至少一側的一可彎折區;多個畫素單元,每一畫素單元包括一主動元件以及與該主動元件電性連接的一畫素電極,其中該些畫素電極對應設置在該些畫素單元區內;以及一無機絕緣層,包括一第一無機絕緣圖案以及一第二無機絕緣圖案,分別配置於該些畫素單元區以及該可彎折區中,其中該第一無機絕緣圖案的厚度大於該第二無機絕緣圖案的厚度。 A pixel array substrate includes: a substrate having an active region and a peripheral region around the active region, wherein the active region includes a plurality of pixel unit regions and one of at least one side of the pixel unit regions a plurality of pixel units, each of the pixel units includes an active component and a pixel electrode electrically connected to the active component, wherein the pixel electrodes are correspondingly disposed in the pixel unit And an inorganic insulating layer, including a first inorganic insulating pattern and a second inorganic insulating pattern, respectively disposed in the pixel unit regions and the bendable region, wherein the first inorganic insulating pattern has a thickness greater than the The thickness of the second inorganic insulating pattern. 如申請專利範圍第1項所述的畫素陣列基板,更包括:多條第一訊號線以及多條第二訊號線,配置於該基板上,其中每一畫素單元與其中一條第一訊號線以及其中一條第二訊號線電性連接,其中該可彎折區位於其中一個畫素電極與下一條第一訊號線之間,該可彎折區位於其中一個畫素電極與下一條第二訊號線之間,或該可彎折區位於其中一個畫素電極與下一條第一訊號線之間以及所述畫素電極與下一條第二訊號線之間。 The pixel array substrate of claim 1, further comprising: a plurality of first signal lines and a plurality of second signal lines disposed on the substrate, wherein each pixel unit and one of the first signals The wire and one of the second signal wires are electrically connected, wherein the bendable region is located between one of the pixel electrodes and the next first signal line, and the bendable region is located at one of the pixel electrodes and the next second Between the signal lines, or the bendable area is between one of the pixel electrodes and the next first signal line and between the pixel electrode and the next second signal line. 如申請專利範圍第2項所述的畫素陣列基板,其中該些第 一訊號線與該些第二訊號線分別為掃描線、資料線與共用配線的其中二者。 The pixel array substrate of claim 2, wherein the The one signal line and the second signal lines are respectively two of the scan line, the data line and the shared line. 如申請專利範圍第1項所述的畫素陣列基板,更包括:一緩衝層,設置於該基板與該無機絕緣層之間,且該緩衝層覆蓋該些畫素單元區與該可彎折區,其中該緩衝層的厚度介於500埃至1000埃。 The pixel array substrate of claim 1, further comprising: a buffer layer disposed between the substrate and the inorganic insulating layer, wherein the buffer layer covers the pixel unit regions and the bendable layer a region wherein the buffer layer has a thickness of between 500 angstroms and 1000 angstroms. 如申請專利範圍第1項所述的畫素陣列基板,其中該第一無機絕緣圖案的厚度介於4000埃至8000埃,該第二無機絕緣圖案的厚度介於0埃至1000埃。 The pixel array substrate of claim 1, wherein the first inorganic insulating pattern has a thickness of 4000 Å to 8000 Å, and the second inorganic insulating pattern has a thickness of 0 Å to 1000 Å. 如申請專利範圍第1項所述的畫素陣列基板,其中該基板之該周邊區包括一驅動電路區以及位於該驅動電路區與該主動區之間的一周邊可彎折區,該第一無機絕緣圖案更配置於該驅動電路區,該第二無機絕緣圖案更配置於該周邊可彎折區中。 The pixel array substrate of claim 1, wherein the peripheral region of the substrate comprises a driving circuit region and a peripheral bendable region between the driving circuit region and the active region, the first The inorganic insulating pattern is further disposed in the driving circuit region, and the second inorganic insulating pattern is further disposed in the peripheral bendable region. 如申請專利範圍第1項所述的畫素陣列基板,更包括:一有機平坦層,覆蓋該無機絕緣層,以使得位於該些畫素單元區之該有機平坦層以及位於該可彎折區內之該有機平坦層共平面。 The pixel array substrate of claim 1, further comprising: an organic flat layer covering the inorganic insulating layer such that the organic flat layer located in the pixel unit regions and the bendable region The organic planar layer is coplanar. 一種面板,包括:一基板,具有一主動區以及位於該主動區周圍的一周邊區,其中該主動區包括多個畫素單元區,而該周邊區包括一驅動電路區與位於該驅動電路區與該主動區之間的一周邊可彎折區,且該驅動電路區透過該周邊可彎折區而彎折至該主動區的背面; 多個畫素單元,每一畫素單元包括一主動元件以及與該主動元件電性連接的一畫素電極,其中該些畫素電極對應設置在該些畫素單元區內;一驅動電路,位於該驅動電路區中,並位於該些畫素單元的背面;以及一無機絕緣層,包括一第一無機絕緣圖案以及一第二無機絕緣圖案,該第一無機絕緣圖案配置於該些畫素單元區,該第二無機絕緣圖案位於該周邊可彎折區中,其中該第一無機絕緣圖案的厚度大於該第二無機絕緣圖案的厚度。 A panel includes: a substrate having an active region and a peripheral region around the active region, wherein the active region includes a plurality of pixel unit regions, and the peripheral region includes a driving circuit region and is located in the driving circuit region a peripheral bendable region between the active regions, and the driving circuit region is bent to the back surface of the active region through the peripheral bendable region; a plurality of pixel units, each of the pixel units includes an active component and a pixel electrode electrically connected to the active component, wherein the pixel electrodes are disposed correspondingly in the pixel unit regions; a driving circuit The first inorganic insulating pattern is disposed on the pixels And a second inorganic insulating pattern is located in the peripheral bendable region, wherein a thickness of the first inorganic insulating pattern is greater than a thickness of the second inorganic insulating pattern. 如申請專利範圍第8項所述的面板,其中該第一無機絕緣圖案的厚度介於4000埃至8000埃,該第二無機絕緣圖案的厚度介於0埃至1000埃。 The panel of claim 8, wherein the first inorganic insulating pattern has a thickness of from 4000 angstroms to 8,000 angstroms, and the second inorganic insulating pattern has a thickness of from 0 angstroms to 1000 angstroms. 如申請專利範圍第9項所述的面板,其中該第二無機絕緣層的厚度為零。 The panel of claim 9, wherein the second inorganic insulating layer has a thickness of zero. 如申請專利範圍第8項所述的面板,其中該主動區更包括位於該些畫素單元區之至少一側的一可彎折區,且該第二無機絕緣圖案位於該可彎折區以及該周邊可彎折區中。 The panel of claim 8, wherein the active region further comprises a bendable region on at least one side of the pixel unit regions, and the second inorganic insulating pattern is located in the bendable region and The perimeter can be in the bend zone. 如申請專利範圍第11項所述的面板,更包括:多條第一訊號線以及多條第二訊號線,配置於該基板上,其中每一畫素單元與其中一條第一訊號線以及其中一條第二訊號線電性連接,其中該可彎折區位於其中一個畫素電極與下一條第一訊號線之 間,該可彎折區位於其中一個畫素電極與下一條第二訊號線之間,或該可彎折區位於其中一個畫素電極與下一條第一訊號線之間以及所述畫素電極與下一條第二訊號線之間。 The panel of claim 11, further comprising: a plurality of first signal lines and a plurality of second signal lines disposed on the substrate, wherein each pixel unit and one of the first signal lines and the middle thereof a second signal line is electrically connected, wherein the bendable area is located at one of the pixel electrodes and the next first signal line The bendable region is located between one of the pixel electrodes and the next second signal line, or the bendable region is between one of the pixel electrodes and the next first signal line and the pixel electrode Between the next second signal line. 如申請專利範圍第12項所述的面板,其中該些第一訊號線與該些第二訊號線分別為掃描線、資料線與共用配線的其中二者。 The panel of claim 12, wherein the first signal lines and the second signal lines are respectively two of a scan line, a data line and a shared line. 如申請專利範圍第8項所述的面板,更包括:一緩衝層,設置於該基板與該無機絕緣層之間,且該緩衝層位於該主動區以及該周邊區,其中該緩衝層的厚度介於500埃至1000埃。 The panel of claim 8, further comprising: a buffer layer disposed between the substrate and the inorganic insulating layer, wherein the buffer layer is located in the active region and the peripheral region, wherein a thickness of the buffer layer Between 500 angstroms and 1000 angstroms. 如申請專利範圍第8項所述的面板,其中該第一無機絕緣層更包括配置於該基板的該驅動電路區。 The panel of claim 8, wherein the first inorganic insulating layer further comprises the driving circuit region disposed on the substrate. 如申請專利範圍第8項所述的面板,更包括:一有機平坦層,覆蓋該無機絕緣層,其中該有機平坦層具有一平坦之頂表面。 The panel of claim 8, further comprising: an organic flat layer covering the inorganic insulating layer, wherein the organic flat layer has a flat top surface.
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