CN105845701A - Flexible display device and making method thereof - Google Patents
Flexible display device and making method thereof Download PDFInfo
- Publication number
- CN105845701A CN105845701A CN201510022260.3A CN201510022260A CN105845701A CN 105845701 A CN105845701 A CN 105845701A CN 201510022260 A CN201510022260 A CN 201510022260A CN 105845701 A CN105845701 A CN 105845701A
- Authority
- CN
- China
- Prior art keywords
- pixel region
- layer
- tft
- flex area
- flexible display
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroluminescent Light Sources (AREA)
Abstract
The invention discloses a flexible display device and a making method thereof. The method comprises the following steps: S1, dividing a flexible substrate into pixel regions and a bending region, wherein the bending region spaces the multiple rows of and multiple columns of pixel regions by rows and columns; S2, making a metal connection layer in the bending region of the flexible substrate; S3, making a TFT in the pixel regions of the flexible substrate; S4, after the completion of TFT making, making a flattening layer above the bending region between the pixel regions and above the pixel regions to fill the gaps between the pixel regions with the flattening layer, wherein the metal connection layer is across the flattening layer in the bending region to electrically connect the adjacent pixel regions; and S5, carrying out a subsequent OLED making process. When the flexible display device is bent in the bending region, the stress is concentrated in the bending region, so the risk that the characteristic of the TFT changes or the TFT is broken due to bending of the pixel regions is prevented.
Description
Technical field
Relevant a kind of flexible display apparatus of the present invention and preparation method thereof, particularly relates to that a kind of low cost, degree of crook be big and the flexible display apparatus that is difficult to make thin film transistor (TFT) rupture and preparation method thereof.
Background technology
At present, each Rotating fields of flexible base board of flexible display is inorganic matter or metal, and each layer thickness approximation, uniform due to stress distribution when bending, it is thus possible to TFT(Thin occurs
Film Transistor, thin film transistor (TFT)) position causes skew due to bending characteristic, fracture even occurs.
For solving the problems referred to above, prior art often use flexible material preferable, that be readily bent manufacture the display structure in flexible display apparatus, such as with oxide semiconductor (indium gallium zinc oxide, or Organic substance quasiconductor (such as CuPc, PcCu) etc. replaces the silicon-based semiconductor material of thin film transistor (TFT) active area IGZO).But, the most all of display structure can be by flexible substitution material manufacture, and its selection range is limited；Even and if have substitution material, cannot guarantee that its performance, cost etc. all reach the level of current material, therefore the use of substitution material is likely to result in the reduction of flexible display apparatus performance and the rising of cost；If it addition, use substitution material, then the structure of flexible display substrates, preparation technology etc. can occur significant change, thus cannot be prepared by existing technique and equipment.
Can also use elastomeric layer that the various display structures on flexible display substrates are packaged at present, to protect these structures from damage.But, though elastomeric layer can protect easy damage structure, but it also makes the deformation of flexible display substrates be restricted, thus causes the deformability of flexible display apparatus to reduce.
Summary of the invention
In view of this, present invention is primarily targeted at provide a kind of make simple, degree of crook big and the flexible display apparatus that is difficult to make TFT rupture and preparation method thereof.
For reaching above-mentioned purpose, the present invention provides the manufacture method of a kind of flexible display apparatus, and it comprises the steps:
Step one, flexible base board is divided into pixel region and flex area, described flex area in row and column fashion between be separated out the described pixel region of multiple lines and multiple rows；
Step 2, flex area on flexible substrates make metal connecting layer；
Step 3, pixel region on flexible substrates make TFT；
After step 4, the TFT that completes, flex area between each pixel region and each pixel region planarization layer fabricated above, carrying out the filling between each pixel region with planarization layer, the planarization layer of the described flex area of described metal connecting layer leap realizes the electrical connection in neighbor district；
Step 5, carry out follow-up OLED processing technology.
Described step 3 also includes following technique: make through hole at described pixel region, and the planarization layer of the described flex area of described metal connecting layer leap realizes the electrical connection in neighbor district by described through hole.
Described planarization layer material is polyimides.
The present invention also provides for a kind of flexible display apparatus, it includes flexible base board, described flexible base board is divided into flex area and multiple pixel regions, described pixel region is multiple lines and multiple rows distribution, it is described flex area between adjacent each pixel region, the flexible base board being positioned at described pixel region is provided with TFT, the flexible base board being positioned at described flex area is provided with metal connecting layer, it is electrically connected with by described metal connecting layer between adjacent each described pixel region, above each described pixel region and described flex area is provided with planarization layer, and described planarization layer is filled between each pixel region.
Described TFT includes metal level, grid layer and is located at the insulating barrier below metal level and grid layer, this insulating barrier is provided with the different through holes of the most corresponding metal level and grid layer, and described metal connecting layer is electrically connected metal level and the grid layer of adjacent described TFT by described through hole.
The material of described planarization layer is polyimides.
It is provided with cushion between described flexible base board and described TFT layer and between described flexible base board and described metal connecting layer.
The material of described cushion is silicon nitride or silicon oxide.
TFT is divided into pixel region and flex area by the present invention, owing to the planarization layer at flex area is Organic substance, Organic substance holds easy-to-bend area, therefore when flexible display apparatus is bent by flex area, stress is concentrated in flex area, thus prevents pixel region that the risk of TFT characteristic changing or fracture occurs because of bending.
Accompanying drawing explanation
Fig. 1 is the flow chart of steps of flexible display apparatus manufacture method of the present invention；
Fig. 2 is the sectional view of flexible display apparatus of the present invention；
Fig. 3 is the top view of flexible display apparatus of the present invention.
Detailed description of the invention
For ease of the structure of the present invention and method and the effect that reaches are had further understanding, describe in detail as follows in conjunction with the accompanying drawing preferred embodiment that develops simultaneously.
As it is shown in figure 1, flexible display apparatus manufacture method of the present invention comprises the steps:
Step one, first will mark off pixel region and flex area on flexible base board, this flex area in row and column fashion between be separated out the pixel region of multiple lines and multiple rows；
Step 2, the flex area subscribed on flexible substrates (i.e. between neighbor district) make metal connecting layer M3；
Step 3, pixel region on flexible substrates make TFT, each Rotating fields of the TFT that completes successively；
After step 4, the TFT that completes, the flex area between each pixel region and each pixel region planarization layer fabricated above, carry out the filling between each pixel region with planarization layer, the material of this planarization layer is Organic substance；Described metal connecting layer M3 is crossed over the planarization layer of flex area and is made to electrically connect between neighbor district；
Step 5, carry out follow-up OLED(Organic Light Emitting Diode) processing technology such as evaporation.
The step 3 of the present invention also includes following technique: when pixel region makes TFT, before making grid layer M1 and metal level M2, respectively the insulating barrier below the insulating barrier below grid layer M1 and metal level M2 is punched, make grid layer M1 and metal level M2 to be electrically connected with the different piece of metal connecting layer M3 by through hole respectively, i.e. metal connecting layer M3 of flex area realizes the electrical connection in neighbor district by through hole.
In the present invention, grid layer M1 and metal level M2 processing technology compared with technology in manufacturing process is identical, owing to the grid layer M1 of neighbor being cut off in flex area, the metal level M2 of neighbor is cut off simultaneously, therefore respectively the grid layer M1 and metal level M2 of neighbor are connected by metal connecting layer M3 in the present invention.
The present invention, before making metal connecting layer M3 and TFT, also can make cushion on flexible substrates, and the material of this cushion can be SiNx(silicon nitride) or SiOx(silicon oxide).The planarization layer of the present invention is Organic substance, the flex area being located between pixel region, in order to increase the bending degree of display device.
As shown in Figure 3, the present invention passes through said method, TFT substrate is divided into pixel region 20 and flex area 21, flex area is made up of with metal connecting layer planarization layer, planarization layer is Organic substance, easy bending, when bending, stress is concentrated in flex area, thus prevents pixel region that the risk of TFT characteristic changing or fracture occurs because of bending.
As in figure 2 it is shown, the flexible display apparatus of the present invention includes flexible base board 1, this flexible base board 1 is divided into flex area 21 and multiple pixel regions 20, and pixel region 20 is distributed in multiple lines and multiple rows, is flex area 21 between adjacent each pixel region 20, and each pixel region 20 has TFT
2, the flexible base board 1 being positioned at flex area 21 is provided with metal connecting layer 22, adjacent two pixel regions 20 are electrically connected with by the metal connecting layer 22 of flex area 21 between them, are provided with planarization layer 3 above each pixel region 20 and in flex area 21, and planarization layer 3 is filled between each pixel region 20.The material of the planarization layer 3 in the present invention is Organic substance, owing to Organic substance is easily bent, and bending property is preferable, therefore when flexible display apparatus is bent by flex area 21, stress is concentrated in flex area 21, thus prevents pixel region 20 that the risk of TFT characteristic changing or fracture occurs because of bending.Planarization layer 3 material of the present invention can be polyimides.
The TFT of pixel region 20 in the present invention
2, on insulating barrier below its metal level, through hole 23 can be provided with, it also is provided with through hole (not shown) on insulating barrier below grid layer simultaneously, the different piece of metal connecting layer 22 is connected with metal level and the grid layer of TFT 2 with the through hole below grid layer respectively by through hole 23, i.e. the metal connecting layer 22 of flex area 21 realizes the electrical connection in neighbor district 20 by through hole.
This flexible base board 1 and TFT
Also can be provided with cushion (not shown) between 2 and flexible base board 1 and metal connecting layer 22, its material is SiNx or SiOx.
The above, only presently preferred embodiments of the present invention, it is not intended to limit protection scope of the present invention.
Claims (8)
1. the manufacture method of a flexible display apparatus, it is characterised in that it comprises the steps:
Step one, flexible base board is divided into pixel region and flex area, described flex area in row and column fashion between be separated out the described pixel region of multiple lines and multiple rows；
Step 2, flex area on flexible substrates make metal connecting layer；
Step 3, pixel region on flexible substrates make TFT；
After step 4, the TFT that completes, flex area between each pixel region and each pixel region planarization layer fabricated above, carrying out the filling between each pixel region with planarization layer, the planarization layer of the described flex area of described metal connecting layer leap realizes the electrical connection in neighbor district；
Step 5, carry out follow-up OLED processing technology.
2. the manufacture method of flexible display apparatus as claimed in claim 1, it is characterized in that, described step 3 also includes following technique: make through hole at described pixel region, and the planarization layer of the described flex area of described metal connecting layer leap realizes the electrical connection in neighbor district by described through hole.
3. the manufacture method of flexible display apparatus as claimed in claim 1, it is characterised in that described planarization layer material is polyimides.
4. a flexible display apparatus, it is characterized in that, it includes flexible base board, described flexible base board is divided into flex area and multiple pixel regions, described pixel region is multiple lines and multiple rows distribution, it is described flex area between adjacent each described pixel region, the flexible base board being positioned at described pixel region is provided with TFT, the flexible base board being positioned at described flex area is provided with metal connecting layer, it is electrically connected with by described metal connecting layer between adjacent each described pixel region, above each described pixel region and described flex area is provided with planarization layer, and described planarization layer is filled between each pixel region.
5. flexible display apparatus as claimed in claim 4, it is characterized in that, described TFT includes metal level, grid layer and is located at the insulating barrier below metal level and grid layer, described insulating barrier is provided with the different through holes of the corresponding described metal level of difference and described grid layer, and described metal connecting layer is electrically connected the described metal level of adjacent described TFT and described grid layer by described through hole.
6. flexible display apparatus as claimed in claim 4, it is characterised in that the material of described planarization layer is polyimides.
7. flexible display apparatus as claimed in claim 4, it is characterised in that be provided with cushion between described flexible base board and described TFT and between described flexible base board and described metal connecting layer.
8. flexible display apparatus as claimed in claim 7, it is characterised in that the material of described cushion is silicon nitride or silicon oxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510022260.3A CN105845701A (en) | 2015-01-16 | 2015-01-16 | Flexible display device and making method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510022260.3A CN105845701A (en) | 2015-01-16 | 2015-01-16 | Flexible display device and making method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105845701A true CN105845701A (en) | 2016-08-10 |
Family
ID=56580133
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510022260.3A Pending CN105845701A (en) | 2015-01-16 | 2015-01-16 | Flexible display device and making method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105845701A (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106773384A (en) * | 2016-12-20 | 2017-05-31 | 深圳市华星光电技术有限公司 | Goa circuit structure |
| CN106783881A (en) * | 2016-12-26 | 2017-05-31 | 武汉华星光电技术有限公司 | A kind of flexible display panels and its manufacture method |
| CN107204357A (en) * | 2017-07-05 | 2017-09-26 | 武汉华星光电半导体显示技术有限公司 | A kind of flexible display panels and preparation method thereof, flexible display apparatus |
| WO2018107531A1 (en) * | 2016-12-15 | 2018-06-21 | 武汉华星光电技术有限公司 | Flexible display structure and manufacturing method thereof |
| CN108511479A (en) * | 2017-02-24 | 2018-09-07 | 上海和辉光电有限公司 | A kind of flexibility AMOLED structures and preparation method |
| CN109300964A (en) * | 2018-10-26 | 2019-02-01 | 武汉华星光电半导体显示技术有限公司 | Flexible OLED panel and preparation method thereof |
| WO2019109443A1 (en) * | 2017-12-07 | 2019-06-13 | 深圳市华星光电半导体显示技术有限公司 | Array substrate and manufacturing method thereof |
| WO2019144472A1 (en) * | 2018-01-24 | 2019-08-01 | 武汉华星光电半导体显示技术有限公司 | Method for manufacturing flexible display panel, and flexible display panel |
| US10411204B2 (en) | 2017-07-05 | 2019-09-10 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co.. Ltd. | Flexible display panel and method for fabricating thereof, flexible display apparatus |
| WO2019174116A1 (en) * | 2018-03-14 | 2019-09-19 | 昆山工研院新型平板显示技术中心有限公司 | Stretchable display device and manufacturing method thereof, and electronic device |
| WO2021017198A1 (en) * | 2019-08-01 | 2021-02-04 | 武汉华星光电半导体显示技术有限公司 | Flexible light-emitting panel, manufacturing method for flexible light-emitting panel, and display apparatus |
| US11121332B2 (en) | 2017-08-31 | 2021-09-14 | Kunshan Go-Visionox Opto-Electronics Co., Ltd. | Foldable array substrate, preparation method thereof and display device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001215483A (en) * | 2000-02-01 | 2001-08-10 | Nec Corp | Liquid crystal display device |
| CN102496684A (en) * | 2011-12-27 | 2012-06-13 | 昆山龙腾光电有限公司 | Flexible display |
| CN102969320A (en) * | 2012-12-10 | 2013-03-13 | 京东方科技集团股份有限公司 | Flexible display substrate and preparation method thereof as well as flexible display device |
| CN104022124A (en) * | 2014-05-26 | 2014-09-03 | 京东方科技集团股份有限公司 | Flexible display substrate, preparing method thereof, and flexible display device |
| CN104269417A (en) * | 2014-07-04 | 2015-01-07 | 友达光电股份有限公司 | Pixel Array Substrate And Panel |
-
2015
- 2015-01-16 CN CN201510022260.3A patent/CN105845701A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001215483A (en) * | 2000-02-01 | 2001-08-10 | Nec Corp | Liquid crystal display device |
| CN102496684A (en) * | 2011-12-27 | 2012-06-13 | 昆山龙腾光电有限公司 | Flexible display |
| CN102969320A (en) * | 2012-12-10 | 2013-03-13 | 京东方科技集团股份有限公司 | Flexible display substrate and preparation method thereof as well as flexible display device |
| CN104022124A (en) * | 2014-05-26 | 2014-09-03 | 京东方科技集团股份有限公司 | Flexible display substrate, preparing method thereof, and flexible display device |
| CN104269417A (en) * | 2014-07-04 | 2015-01-07 | 友达光电股份有限公司 | Pixel Array Substrate And Panel |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018107531A1 (en) * | 2016-12-15 | 2018-06-21 | 武汉华星光电技术有限公司 | Flexible display structure and manufacturing method thereof |
| CN106773384A (en) * | 2016-12-20 | 2017-05-31 | 深圳市华星光电技术有限公司 | Goa circuit structure |
| CN106783881A (en) * | 2016-12-26 | 2017-05-31 | 武汉华星光电技术有限公司 | A kind of flexible display panels and its manufacture method |
| CN108511479B (en) * | 2017-02-24 | 2021-06-22 | 上海和辉光电有限公司 | Flexible AMOLED structure and preparation method |
| CN108511479A (en) * | 2017-02-24 | 2018-09-07 | 上海和辉光电有限公司 | A kind of flexibility AMOLED structures and preparation method |
| CN107204357A (en) * | 2017-07-05 | 2017-09-26 | 武汉华星光电半导体显示技术有限公司 | A kind of flexible display panels and preparation method thereof, flexible display apparatus |
| WO2019006826A1 (en) * | 2017-07-05 | 2019-01-10 | 武汉华星光电半导体显示技术有限公司 | Flexible display panel and preparation method therefor, and flexible display apparatus |
| CN107204357B (en) * | 2017-07-05 | 2019-08-02 | 武汉华星光电半导体显示技术有限公司 | A kind of flexible display panels and preparation method thereof, flexible display apparatus |
| US10411204B2 (en) | 2017-07-05 | 2019-09-10 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co.. Ltd. | Flexible display panel and method for fabricating thereof, flexible display apparatus |
| US11121332B2 (en) | 2017-08-31 | 2021-09-14 | Kunshan Go-Visionox Opto-Electronics Co., Ltd. | Foldable array substrate, preparation method thereof and display device |
| WO2019109443A1 (en) * | 2017-12-07 | 2019-06-13 | 深圳市华星光电半导体显示技术有限公司 | Array substrate and manufacturing method thereof |
| WO2019144472A1 (en) * | 2018-01-24 | 2019-08-01 | 武汉华星光电半导体显示技术有限公司 | Method for manufacturing flexible display panel, and flexible display panel |
| US11114627B2 (en) | 2018-01-24 | 2021-09-07 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Manufacturing method for flexible display panel and flexible display panel comprising concave tapered organic layer |
| US11038130B2 (en) | 2018-03-14 | 2021-06-15 | Kunshan New Flat Panel Display Technology Center Co., Ltd. | Stretchable display devices |
| WO2019174116A1 (en) * | 2018-03-14 | 2019-09-19 | 昆山工研院新型平板显示技术中心有限公司 | Stretchable display device and manufacturing method thereof, and electronic device |
| CN109300964B (en) * | 2018-10-26 | 2020-10-16 | 武汉华星光电半导体显示技术有限公司 | Flexible OLED panel and manufacturing method thereof |
| CN109300964A (en) * | 2018-10-26 | 2019-02-01 | 武汉华星光电半导体显示技术有限公司 | Flexible OLED panel and preparation method thereof |
| US11196012B2 (en) | 2018-10-26 | 2021-12-07 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Flexible organic light-emitting panel and manufacturing method thereof |
| WO2021017198A1 (en) * | 2019-08-01 | 2021-02-04 | 武汉华星光电半导体显示技术有限公司 | Flexible light-emitting panel, manufacturing method for flexible light-emitting panel, and display apparatus |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105845701A (en) | Flexible display device and making method thereof | |
| CN107978627B (en) | Display device and its manufacturing method with micro- cap rock | |
| CN104600029B (en) | A kind of flexible display apparatus and preparation method thereof | |
| US9735184B2 (en) | Forming method for structure of crossing datalines and scanning lines in display device | |
| WO2008145999A4 (en) | Organic el device and manufacturing method thereof | |
| US10096794B2 (en) | OLED display having a sealant disposed on sealing substructures comprising through-portions therebetween | |
| CN103337479B (en) | The manufacture method of a kind of array base palte, display unit and array base palte | |
| US9490310B2 (en) | Manufacturing method and structure of thin film transistor backplane | |
| US20150372021A1 (en) | Display device, array substrate and method for manufacturing the same | |
| US9406701B2 (en) | Array substrate and method for fabricating the same, and display device | |
| CN104637955A (en) | Array substrate and preparation method thereof as well as display device | |
| TW200735229A (en) | Method for manufacturing thin film transistor display array with dual-layer metal | |
| US11296232B2 (en) | Oxide semiconductor thin-film transistor and method of fabricating the same | |
| CN104064601A (en) | TFT, TFT array substrate and manufacturing method thereof, display panel and display apparatus | |
| CN102945846A (en) | Array substrate, manufacturing method thereof and display device | |
| US9923067B2 (en) | Thin-film transistor and method for fabricating the same, array substrate and method for fabricating the same, and display device | |
| US9472578B2 (en) | Display substrate and fabricating method thereof, display panel, and display device | |
| KR102661120B1 (en) | Thin film transistor, manufacturing method thereof, and display device including thereof | |
| CN105304559A (en) | Array substrate manufacturing method, array substrate and display device | |
| CN105374827A (en) | Display device and method for manufacturing the same | |
| KR101808432B1 (en) | Oxide semiconductor thin film transistor and method of manufacturing the same | |
| US20160276368A1 (en) | Thin-Film Transistor Array Substrate And Method For Manufacturing Thin-Film Transistor Array Substrate | |
| CN105304720A (en) | Thin film transistor | |
| US20170040351A1 (en) | Array substrate and manufacturing method thereof, display device | |
| JP6261732B2 (en) | Thin film transistor substrate manufacturing method and thin film transistor substrate manufactured by the method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160810 |