TW201541457A - Electrical device and control method - Google Patents
Electrical device and control method Download PDFInfo
- Publication number
- TW201541457A TW201541457A TW103115301A TW103115301A TW201541457A TW 201541457 A TW201541457 A TW 201541457A TW 103115301 A TW103115301 A TW 103115301A TW 103115301 A TW103115301 A TW 103115301A TW 201541457 A TW201541457 A TW 201541457A
- Authority
- TW
- Taiwan
- Prior art keywords
- reference voltage
- flash memory
- level
- temperature
- voltage
- Prior art date
Links
Landscapes
- Read Only Memory (AREA)
Abstract
Description
本發明係有關於快閃記憶體,特別是一種可根據快閃記憶體之溫度調整參考電壓的快閃記憶體。 The present invention relates to a flash memory, and more particularly to a flash memory that can adjust a reference voltage according to the temperature of the flash memory.
近年來,由於快閃記憶體(Flash Memory)具有資料非揮發性、省電、體積小以及無機械結構等的特性,因此適合使用在各種電子裝置上,尤其是可攜式電子產品。 In recent years, Flash Memory is suitable for use in various electronic devices, especially portable electronic products, because of its non-volatile data, power saving, small size, and no mechanical structure.
傳統上快閃記憶體具有一記憶體陣列用以儲存資料。記憶體陣列具有複數儲存單元,每一儲存單元可用以儲存一位元之資料。隨著製程技術的進步每一儲存單元的體積越來越小,卻也使得儲存單元中所儲存之資料更容易受到溫度的影響,而產生可靠度的問題。 Traditionally, flash memory has a memory array for storing data. The memory array has a plurality of storage units, and each storage unit can be used to store one-bit data. With the advancement of process technology, the volume of each storage unit is getting smaller and smaller, but the data stored in the storage unit is more susceptible to temperature, resulting in reliability problems.
因此,需要去改善目前快閃記憶體由於溫度變化所產生的可靠度問題。 Therefore, there is a need to improve the reliability of current flash memory due to temperature variations.
本發明揭露一種電子裝置。電子裝置包括一快閃記憶體以及一控制器。快閃記憶體包括一儲存陣列以及一溫度感測器。儲存陣列具有至少一儲存單元,儲存單元具有一浮動閘極用以儲存資料,且儲存單元被讀取時,產生一讀取電壓。溫度感測器用以偵測快閃記憶體之溫度。控制器包括一參考電 壓產生電路、一處理單元以及一比較器。參考電壓產生電路用以輸出一參考電壓。處理單元根據快閃記憶體之溫度,調整參考電壓產生電路的參考電壓。比較器用以比較讀取電壓以及參考電壓,並當讀取電壓大於參考電壓時,輸出位於一第一準位之信號,且當讀取電壓小於參考電壓時,輸出位於一第二準位之信號,第一準位大於第二準位。 The invention discloses an electronic device. The electronic device includes a flash memory and a controller. The flash memory includes a storage array and a temperature sensor. The storage array has at least one storage unit, the storage unit has a floating gate for storing data, and when the storage unit is read, a read voltage is generated. The temperature sensor is used to detect the temperature of the flash memory. The controller includes a reference A voltage generating circuit, a processing unit, and a comparator. The reference voltage generating circuit is configured to output a reference voltage. The processing unit adjusts the reference voltage of the reference voltage generating circuit according to the temperature of the flash memory. The comparator is configured to compare the read voltage and the reference voltage, and when the read voltage is greater than the reference voltage, output a signal at a first level, and when the read voltage is less than the reference voltage, output a signal at a second level The first level is greater than the second level.
本發明揭露一種控制方法適用於一電子裝置,其中該電子裝置具有一快閃記憶體以及一控制器。控制方法包括:偵測快閃記憶體之溫度;根據快閃記憶體之溫度,調整一參考電壓產生電路所產生的一參考電壓;讀取快閃記憶體之一儲存單元的一讀取電壓;藉由控制器之一比較器將讀取電壓以及參考電壓進行比較;以及當讀取電壓大於參考電壓時,比較器輸出位於一第一準位之信號,且當讀取電壓小於參考電壓時,比較器輸出位於一第二準位之信號,其中第一準位大於第二準位。 The invention discloses a control method suitable for an electronic device, wherein the electronic device has a flash memory and a controller. The control method includes: detecting a temperature of the flash memory; adjusting a reference voltage generated by a reference voltage generating circuit according to the temperature of the flash memory; and reading a read voltage of the storage unit of the flash memory; Comparing the read voltage and the reference voltage by one of the controllers; and when the read voltage is greater than the reference voltage, the comparator outputs a signal at a first level, and when the read voltage is less than the reference voltage, The comparator outputs a signal at a second level, wherein the first level is greater than the second level.
5‧‧‧快閃記憶體裝置 5‧‧‧Flash memory device
10‧‧‧控制器 10‧‧‧ Controller
11‧‧‧處理單元 11‧‧‧Processing unit
12‧‧‧錯誤更正解碼器 12‧‧‧Error Correction Decoder
13‧‧‧參考電壓產生電路 13‧‧‧Reference voltage generating circuit
14‧‧‧比較器 14‧‧‧ Comparator
15‧‧‧記憶裝置 15‧‧‧ memory device
20‧‧‧快閃記憶體 20‧‧‧Flash memory
21‧‧‧儲存陣列 21‧‧‧ Storage Array
22‧‧‧溫度感測器 22‧‧‧ Temperature Sensor
31‧‧‧負回授運算放大器 31‧‧‧Negative feedback operational amplifier
B1‧‧‧匯流排 B1‧‧‧ busbar
Vd‧‧‧讀取電壓 Vd‧‧‧ reading voltage
Vref‧‧‧參考電壓 Vref‧‧‧reference voltage
Vo‧‧‧信號 Vo‧‧‧ signal
WL1-WLK‧‧‧字線 WL1-WLK‧‧‧ word line
BL1-BLN‧‧‧字元線 BL1-BLN‧‧‧ character line
M11-MKN‧‧‧儲存單元 M 11 -M KN ‧‧‧ storage unit
G‧‧‧閘極 G‧‧‧ gate
S‧‧‧源極 S‧‧‧ source
D‧‧‧汲極 D‧‧‧汲
CO‧‧‧控制氧化層 CO‧‧‧Control oxide layer
TO‧‧‧穿隧氧化層 TO‧‧‧Through Oxide Layer
FG‧‧‧浮動閘極 FG‧‧‧ floating gate
SR1-SRN‧‧‧電壓產生單元 SR1-SRN‧‧‧Voltage Generating Unit
SW1-SWN‧‧‧開關元件 SW1-SWN‧‧‧ Switching Components
R1-RN‧‧‧電阻 R1-RN‧‧‧ resistance
Iref‧‧‧參考電流源 Iref‧‧‧reference current source
S51-S52‧‧‧步驟 S51-S52‧‧‧Steps
第1圖為本發明所提供之快閃記憶體裝置的示意圖;第2圖為本發明所提供之儲存陣列的示意圖;第3圖為本發明所提供之儲存單元的示意圖;第4A-4B圖為本發明所提供之比較器的操作示意圖;第5A圖為本發明所提供之參考電壓產生電路的示意圖;第5B圖為本發明所提供之參考電壓產生電路的另一示意圖; 第6圖為本發明所提供之控制方法的流程圖; 1 is a schematic diagram of a flash memory device provided by the present invention; FIG. 2 is a schematic diagram of a memory array provided by the present invention; and FIG. 3 is a schematic diagram of a memory unit provided by the present invention; FIG. 4A-4B The schematic diagram of the operation of the comparator provided by the present invention; FIG. 5A is a schematic diagram of the reference voltage generating circuit provided by the present invention; FIG. 5B is another schematic diagram of the reference voltage generating circuit provided by the present invention; Figure 6 is a flow chart of the control method provided by the present invention;
以下將詳細討論本發明各種實施例之裝置及使用方法。然而值得注意的是,本發明所提供之許多可行的發明概念可實施在各種特定範圍中。這些特定實施例僅用於舉例說明本揭露之裝置及使用方法,但非用於限定本發明之範圍。 The apparatus and method of use of various embodiments of the present invention are discussed in detail below. However, it is to be noted that many of the possible inventive concepts provided by the present invention can be implemented in various specific ranges. These specific examples are only intended to illustrate the apparatus and methods of use of the present disclosure, but are not intended to limit the scope of the invention.
第1圖為根據本發明一實施例之快閃記憶體裝置的示意圖。如第1圖所示,快閃記憶體裝置5包括控制器10以及快閃記憶體20。快閃記憶體20具有一儲存陣列21以及一溫度感測器22。控制器10係用以存取快閃記憶體20的儲存陣列21。控制器10包括處理單元10、錯誤更正碼(Error Correction Code,ECC)解碼器12、參考電壓產生電路13、比較器14與記憶裝置15。 1 is a schematic diagram of a flash memory device in accordance with an embodiment of the present invention. As shown in FIG. 1, the flash memory device 5 includes a controller 10 and a flash memory 20. The flash memory 20 has a storage array 21 and a temperature sensor 22. The controller 10 is used to access the storage array 21 of the flash memory 20. The controller 10 includes a processing unit 10, an Error Correction Code (ECC) decoder 12, a reference voltage generating circuit 13, a comparator 14, and a memory device 15.
儲存陣列21具有複數儲存單元,每一儲存單元具有對應之位址。於本實施例中,控制器10之處理單元11與快閃記憶體20之間係經由匯流排B1進行位址與命令的傳輸。相應於來自控制器10的讀取命令,快閃記憶體20根據來自控制器10的讀取位址而提供對應於該讀取命令之資料至比較器14。於一實施例中,對應於該讀取命令之資料係由儲存在儲存陣列21中且對應於該讀取位址之複數位元組(byte)所組成,但並不以此為限。為便於說明,於本實施例中對應於該讀取命令之資料僅以一位元表示,但並不以此為限。於本實施例中,快閃記憶體20中對應於讀取位址之儲存單元被讀取時會產生一讀取電壓Vd,但並不以此為限。 The storage array 21 has a plurality of storage units, each storage unit having a corresponding address. In this embodiment, the processing unit 11 of the controller 10 and the flash memory 20 transmit the address and the command via the bus bar B1. Corresponding to the read command from the controller 10, the flash memory 20 supplies data corresponding to the read command to the comparator 14 in accordance with the read address from the controller 10. In one embodiment, the data corresponding to the read command is composed of a plurality of bytes stored in the storage array 21 and corresponding to the read address, but is not limited thereto. For convenience of description, the data corresponding to the read command in this embodiment is represented by only one bit, but is not limited thereto. In this embodiment, a read voltage Vd is generated when the memory cell corresponding to the read address in the flash memory 20 is read, but is not limited thereto.
比較器14根據讀取電壓Vd以及一參考電壓Vref,產生位於一第一準位之信號或是位於一第二準位之信號,其中第一準位與第二準位為相反的邏輯準位,但不限定於此。在某些實施例中,第一準位為高準位,第二準位為低準位。在某些實施例中,第一準位為低準位,第二準位為高準位。接著,錯誤更正碼解碼器12根據一錯誤更正碼(ECC_CODE)對第一準位之信號或第二準位之信號進行解碼,以提供解碼後之信號至處理單元11。處理單元11根據所接收到解碼後之信號來判斷第一準位之信號或第二準位之信號是否為有效資料。 The comparator 14 generates a signal at a first level or a signal at a second level according to the read voltage Vd and a reference voltage Vref, wherein the first level and the second level are opposite logic levels. However, it is not limited to this. In some embodiments, the first level is a high level and the second level is a low level. In some embodiments, the first level is a low level and the second level is a high level. Next, the error correction code decoder 12 decodes the signal of the first level or the signal of the second level according to an error correction code (ECC_CODE) to provide the decoded signal to the processing unit 11. The processing unit 11 determines whether the signal of the first level or the signal of the second level is valid data according to the received signal.
於本實施例中,處理單元11更經由匯流排B1接收快閃記憶體20之溫度感測器22所偵測到快閃記憶體20之溫度,並根據快閃記憶體20之溫度調整參考電壓Vref。於一實施例中,處理單元11可以根據記憶體裝置15所儲存之一查找表(lookup table)以及快閃記憶體20之溫度調整參考電壓Vref。舉例而言,查找表中會記錄溫度與對應的參考電壓,處理單元11則根據快閃記憶體20之溫度由查找表得到對應的參考電壓Vref。於另一實施例中,處理單元11則判斷快閃記憶體20之溫度是否大於第一溫度來決定是否調整參考電壓Vref,但並不以此為限。 In this embodiment, the processing unit 11 receives the temperature of the flash memory 20 detected by the temperature sensor 22 of the flash memory 20 via the bus bar B1, and adjusts the reference voltage according to the temperature of the flash memory 20. Vref. In an embodiment, the processing unit 11 can adjust the reference voltage Vref according to a lookup table stored in the memory device 15 and the temperature of the flash memory 20. For example, the temperature and the corresponding reference voltage are recorded in the lookup table, and the processing unit 11 obtains the corresponding reference voltage Vref from the lookup table according to the temperature of the flash memory 20. In another embodiment, the processing unit 11 determines whether the temperature of the flash memory 20 is greater than the first temperature to determine whether to adjust the reference voltage Vref, but is not limited thereto.
請參考第2圖,第2圖為第1圖之儲存陣列21的示意圖。如第2圖所示,儲存陣列21內具有複數儲存單元(M11、M12、...、MKN)。每一儲存單元為一金屬氧化物半導體,並且具有一浮動閘極用以儲存資料。於一實施例中,儲存單元為一位元之儲存單元,用以儲存代表0或1的數位資料,但並不以此 為限。於另一實施例中,儲存單元亦可為複數位元之儲存單元。於本實施例中,控制器10之處理單元11經由匯流排B1選取字線(word line)以及字元線(bit line)以便讀取儲存單元。舉例而言,處理單元11選取字線WL1以及位元線BL1至BLN,以產生對應於儲存單元M11、M12、...、M1N內所儲存之讀取電壓。 Please refer to FIG. 2, which is a schematic diagram of the storage array 21 of FIG. As shown in Fig. 2, the storage array 21 has a plurality of storage units (M 11 , M 12 , ..., M KN ). Each storage unit is a metal oxide semiconductor and has a floating gate for storing data. In one embodiment, the storage unit is a one-dimensional storage unit for storing digital data representing 0 or 1, but is not limited thereto. In another embodiment, the storage unit may also be a storage unit of a plurality of bits. In the present embodiment, the processing unit 11 of the controller 10 selects a word line and a bit line via the bus bar B1 to read the storage unit. For example, the processing unit 11 selects the word line WL1 and the bit lines BL1 to BLN to generate read voltages corresponding to those stored in the memory cells M 11 , M 12 , . . . , M 1N .
請參考第3圖,第3圖為第2圖中之儲存單元的示意圖。如第3圖所示,儲存單元為具有浮動閘極(floating gate)FG的金屬氧化物半導體(Metal-Oxide-Semiconductor Field-Effect Transistor)。於本實施例中,儲存單元的閘極(gate)G電性連接至字線、汲極(drain)D電性連接至位元線,並且源極(source)S電性連接至地(ground),但並不以此為限。舉例而言,儲存單元為第2圖中的儲存單元M11,則儲存單元M11的閘極G、汲極D以及源極S分別電性連接至字線WL1、位元線BL1以及地。 Please refer to FIG. 3, which is a schematic diagram of the storage unit in FIG. As shown in FIG. 3, the memory cell is a Metal-Oxide-Semiconductor Field-Effect Transistor having a floating gate FG. In this embodiment, the gate G of the storage unit is electrically connected to the word line, the drain D is electrically connected to the bit line, and the source S is electrically connected to the ground (ground) ), but not limited to this. For example, the storage unit is the storage unit M 11 in FIG. 2 , and the gate G, the drain D and the source S of the storage unit M 11 are electrically connected to the word line WL1 , the bit line BL1 and the ground, respectively.
如第3圖所示,儲存單元之浮動閘極FG藉由一控制氧化層(control oxide)CO與閘極G隔離,以及藉由一穿隧氧化層(tunnel oxide)TO與汲極D以及源極S隔離。 As shown in FIG. 3, the floating gate FG of the memory cell is isolated from the gate G by a control oxide CO, and by a tunnel oxide TO and a drain D and a source. Extreme S isolation.
於本實施例中,當控制器10要執行寫入程序(program process)將代表0的資料儲存至儲存單元M11時,處理單元11藉由匯流排B1選取字線WL1以及位元線BL1,使得字線WL1之電壓為一第一電壓且位元線BL1上具有一選擇電壓。字線WL1上施加於閘極G的第一電壓將使得儲存單元M11的汲極D以及源極S之間產生感應通道(induced channel),並且字線BL1上施加於汲極D的選擇電壓將使得部分電子穿過穿隧氧化層TO,注入到浮動閘極FG中。舉例而言,第一電壓會大於儲 存單元M11的臨界電壓。相反地,當控制器10要執行抹除程序(erass process)將代表1的資料儲存至儲存單元M11時,控制器10使得字線WL1之電壓為一第二電壓且第二電壓小於源極S以及汲極D之電壓,使得浮動閘極FG之負電子被移除,則儲存單元M11所儲存的資料即由0變為1。於本實施例中,第一電壓大於第二電壓。 In the present embodiment, when the controller 10 to perform writing to the program (program process) on behalf of the data storage unit to store 0 M 11, the processing unit 11 selected by the word line WL1 bus B1 and the bit line BL1, The voltage of the word line WL1 is made a first voltage and the bit line BL1 has a selection voltage. The first voltage applied to the gate G on the word line WL1 will cause an induced channel between the drain D and the source S of the memory cell M 11 and the selection voltage applied to the drain D on the word line BL1. Part of the electrons will pass through the tunneling oxide layer TO and be injected into the floating gate FG. For example, the first voltage may be greater than the threshold voltage of the storage unit M 11 . Conversely, when the controller 10 is to execute erasure of a program (erass process) representing a data storage 11, the controller 10 such that the voltage of the word line WL1 and the second voltage to a second voltage source storage unit is less than M The voltage of S and the drain D causes the negative electrons of the floating gate FG to be removed, and the data stored in the memory unit M 11 is changed from 0 to 1. In this embodiment, the first voltage is greater than the second voltage.
於本實施例中,當控制器10要讀取儲存單元M11所儲存的資料時,控制器10將字線WL1之電壓設為一第三電壓。當儲存單元M11的源級S與閘級G之間的電壓差大於儲存單元M11的臨界電壓時,汲極D以及源極S之間的通道會導通,並具有導通電流。於本實施例中,儲存單元M11的源級S接地,故當施加於閘極G之第三電壓大於儲存單元M11的臨界電壓時,儲存單元M11的汲極D以及源極S之間的通道會導通。需注意的是,於本實施例中,儲存單元M11的臨界電壓係由浮動閘極FG儲存之負電子所決定。舉例而言,浮動閘極FG儲存的負電子數量越多則儲存單元的臨界電壓越大。因此,當字線WL1上之第三電壓施加於儲存單元M11的閘極G時,則會根據浮動閘極FG之負電子,決定汲極D以及源極S之間的通道是否導通。於一實施例中,控制器10欲讀取儲存單元M11時,字線WL1以及位元線BL1同時被選取且分別具有第三電壓與偏壓電壓,且浮動閘極FG之負電子決定儲存單元M11的臨界電壓以及流過儲存單元M11的導通電流。控制器10則可以藉由導通電流判斷儲存單元M11所儲存之資料的內容。 In the present embodiment, when the controller 10 to read data storage means 11 stored in M, 10 the voltage of the word line WL1 is set to a third voltage controller. When the threshold voltage difference between the memory cell M 11 is a source electrode S and the gate G Class M 11 is greater than the storage unit, the channel between the drain D and the source S will be turned on, and having a conduction current. When the present embodiment, the memory cells M 11 source electrode S of the ground, so when a voltage is applied to the gate G of the third storage means is greater than the threshold voltage of M 11, M 11 of the storage unit of the drain D and the source S The channel between them will be turned on. It should be noted that, in this embodiment, the threshold voltage of the storage unit M 11 is determined by the negative electrons stored in the floating gate FG. For example, the greater the number of negative electrons stored by the floating gate FG, the larger the threshold voltage of the storage unit. Thus, when the third voltage is applied to the word line WL1 of the memory cell M 11 is the gate electrode G, will be in accordance with the floating gate electrode FG negative electrons determine whether the channel between the drain D and the source S is turned on. In one embodiment, the controller 10 reads the storage unit to be M 11, the word line WL1 and bit line BL1 are selected simultaneously and respectively the third voltage having a bias voltage, and the floating gate FG of the negative electron storage implementation decisions unit 11 and a threshold voltage M flows through the storage unit 11 conduct current M. The controller 10 can determine the content of the data stored by the storage unit M 11 by turning on the current.
舉例而言,若浮動閘極FG上具有負電荷(例如儲存 資料為0),則會使得臨界電壓升高。在控制器10讀取儲存單元M11時,會產生對應的第一導通電流。若浮動閘極FG不具有負電荷(例如儲存資料為1),則不會使得臨界電壓升高。當控制器10讀取儲存單元M11時,會產生對應的第二導通電流。於本實施例中,對應於儲存資料為1的第二導通電流大於對應於儲存資料為0之第一導通電流,但並不以此為限。 For example, if the floating gate FG has a negative charge (for example, the stored data is 0), the threshold voltage is raised. 11 the controller 10 reads the storage unit M, is generated corresponding to a first conduction current. If the floating gate FG does not have a negative charge (for example, the stored data is 1), the threshold voltage is not raised. When the second conductive current controller 10 reads the storage unit M 11, it will produce the corresponding. In this embodiment, the second on-current corresponding to the stored data being 1 is greater than the first on-current corresponding to the stored data being 0, but is not limited thereto.
於一實施例中,第一導通電流或第二導通電流會經由一電流電壓轉換器(未圖示)轉換為一讀取電壓Vd。舉例而言,電流電壓轉換器可以是電阻,使得第一/第二導通電流流過電阻時,於電阻之一端產生讀取電壓Vd,但並不以此為限。於本實施例中,儲存單元所儲存的資料為1所對應的第二導通電流大於儲存單元所儲存的資料為0所對應的第一導通電流。同理,儲存單元所儲存的資料為1所對應的讀取電壓Vd大於儲存單元所儲存的資料為0所對應的讀取電壓Vd。 In one embodiment, the first on current or the second on current is converted to a read voltage Vd via a current to voltage converter (not shown). For example, the current-voltage converter may be a resistor such that when the first/second conduction current flows through the resistor, the read voltage Vd is generated at one end of the resistor, but is not limited thereto. In this embodiment, the second on-current corresponding to the data stored in the storage unit is greater than the first on-current corresponding to the data stored in the storage unit. Similarly, the data stored in the storage unit is that the corresponding read voltage Vd is greater than the read voltage Vd corresponding to the data stored in the storage unit.
於另一實施例中,儲存單元亦可用以儲存複數位元的資料。舉例而言,儲存單元可以儲存00、01、10以及11等資料,但並不以此為限。舉例而言,控制器10可藉由控制字線的電壓,使得浮動閘極FG具有不同的負電子數目。當儲存單元的浮動閘極FG具有不同的負電子數目時,儲存單元亦會產生對應的臨界電壓。因此,控制器10讀取儲存單元之資料時,由於儲存單元之臨界電壓不同,所產生的導通電流亦會不同,故控制器10可根據導通電流的大小來判斷所儲存的資料為何。 In another embodiment, the storage unit can also be used to store data of a plurality of bits. For example, the storage unit can store data such as 00, 01, 10, and 11, but is not limited thereto. For example, the controller 10 can control the voltage of the word line such that the floating gate FG has a different number of negative electrons. When the floating gate FG of the storage unit has a different number of negative electrons, the storage unit also generates a corresponding threshold voltage. Therefore, when the controller 10 reads the data of the storage unit, since the threshold voltage of the storage unit is different, the generated conduction current is also different, so the controller 10 can determine the stored data according to the magnitude of the conduction current.
快閃記憶體20之儲存單元係藉由浮動閘極FG之負電子,來保存所儲存之資料。然而,浮動閘極FG所儲存的負電 子,於溫度升高時部分的負電子會穿過穿隧氧化層TO而流失,使得儲存單元之臨界電壓變小。因此,同一儲存單元於高溫時被讀取所產生的讀取電壓Vd會大於低溫時被讀取所產生的讀取電壓Vd。 The storage unit of the flash memory 20 stores the stored data by the negative electrons of the floating gate FG. However, the negative charge stored by the floating gate FG When a temperature rises, part of the negative electrons are lost through the tunneling oxide layer TO, so that the threshold voltage of the memory cell becomes small. Therefore, the read voltage Vd generated by the same memory cell being read at a high temperature is greater than the read voltage Vd generated by the read at a low temperature.
請參考第4圖,第4A-4B圖用以說明比較器14的操作方法。於一實施例中,比較器14用以比較讀取電壓Vd與參考電壓Vref(如第4A圖所示)。當讀取電壓Vd大於參考電壓Vref時,輸出位於一第一準位之信號Vo。當讀取電壓Vd小於參考電壓Vref時,輸出位於一第二準位之信號Vo,且第一準位之信號大於第二準位之信號(如第4B圖所示)。於一實施例中,當比較器14輸出位於第一準位之信號時,處理單元11判斷儲存單元所儲存的資料為1;當比較器14輸出位於第二準位之信號時,處理單元11判斷儲存單元所儲存的資料為0,但並不以此為限。 Please refer to FIG. 4, and FIG. 4A-4B is a diagram for explaining the operation method of the comparator 14. In one embodiment, the comparator 14 is used to compare the read voltage Vd with the reference voltage Vref (as shown in FIG. 4A). When the read voltage Vd is greater than the reference voltage Vref, the signal Vo at a first level is output. When the read voltage Vd is less than the reference voltage Vref, the signal Vo at a second level is output, and the signal of the first level is greater than the signal of the second level (as shown in FIG. 4B). In an embodiment, when the comparator 14 outputs the signal at the first level, the processing unit 11 determines that the data stored in the storage unit is 1; when the comparator 14 outputs the signal at the second level, the processing unit 11 It is judged that the data stored in the storage unit is 0, but not limited thereto.
請參考第5A圖,第5A圖根據本發明之一實施例之參考電壓產生電路13的示意圖。如第5A圖所示,參考電壓產生電路13包括複數電壓產生單元(SR1、SR2、...、SRN)以及一參考電流源Iref。電壓產生單元(SR1、SR2、...、SRN)並聯地連接於電流源Iref與接地之間。每一電壓產生單元具有串聯連接之一電阻與一開關元件。舉例而言,電壓產生單元SR1具有串聯連接之第一電阻R1以及開關元件SW1、電壓產生單元SR2具有串聯連接之第二電阻R2以及開關元件SW2,並以此類推。 Referring to FIG. 5A, FIG. 5A is a schematic diagram of a reference voltage generating circuit 13 according to an embodiment of the present invention. As shown in FIG. 5A, the reference voltage generating circuit 13 includes complex voltage generating units (SR1, SR2, ..., SRN) and a reference current source Iref. The voltage generating units (SR1, SR2, ..., SRN) are connected in parallel between the current source Iref and the ground. Each voltage generating unit has a resistor connected in series with a switching element. For example, the voltage generating unit SR1 has a first resistor R1 and a switching element SW1 connected in series, the voltage generating unit SR2 has a second resistor R2 connected in series, and a switching element SW2, and so on.
於本實施例中,第一電阻R1之阻值小於第二電阻R2之阻值、第二電阻R2之阻值小於第三電阻R3之阻值,並依此類推,但並不以此為限。因此,開關元件SW1導通時所產生 的參考電壓Vref小於開關元件SW2導通時所產生的參考電壓Vref、開關元件SW2導通時所產生的參考電壓Vref小於開關元件SW3導通時所產生的參考電壓Vref,並依此類推。於本實施例中,參考電流源Iref可由電流源(current source)產生,或是由快閃記憶體中的儲存單元所產生,但並不以此為限。 In this embodiment, the resistance of the first resistor R1 is smaller than the resistance of the second resistor R2, and the resistance of the second resistor R2 is smaller than the resistance of the third resistor R3, and so on, but not limited thereto. . Therefore, when the switching element SW1 is turned on The reference voltage Vref is smaller than the reference voltage Vref generated when the switching element SW2 is turned on, the reference voltage Vref generated when the switching element SW2 is turned on is smaller than the reference voltage Vref generated when the switching element SW3 is turned on, and so on. In this embodiment, the reference current source Iref may be generated by a current source or by a storage unit in the flash memory, but is not limited thereto.
需注意的是,本發明之處理單元11根據快閃記憶體之溫度,選擇所要導通的開關元件。舉例而言,當溫度感測器22所偵測到快閃記憶體20之溫度為20度時,開關元件SW1導通且其它開關元件SW2-SWN關閉,但並不以此為限。當溫度感測器22所偵測到快閃記憶體之溫度為30度時,開關元件SW2導通且其它開關元件SW1、SW3-SWN關閉,並依此類推。換言之,處理單元11於快閃記憶體20之溫度大於一第一溫度(例如20度或30度)時,調高參考電壓Vref。於另一實施例中,處理單元11則根據記憶裝置15所儲存的查找表以及快閃記憶體20之溫度控制開關元件SW1-SWN的導通,但並不以此為限。 It should be noted that the processing unit 11 of the present invention selects the switching element to be turned on according to the temperature of the flash memory. For example, when the temperature sensor 22 detects that the temperature of the flash memory 20 is 20 degrees, the switching element SW1 is turned on and the other switching elements SW2-SWN are turned off, but not limited thereto. When the temperature of the flash memory detected by the temperature sensor 22 is 30 degrees, the switching element SW2 is turned on and the other switching elements SW1, SW3-SWN are turned off, and so on. In other words, the processing unit 11 increases the reference voltage Vref when the temperature of the flash memory 20 is greater than a first temperature (eg, 20 degrees or 30 degrees). In another embodiment, the processing unit 11 controls the conduction of the switching elements SW1 - SWN according to the lookup table stored in the memory device 15 and the temperature of the flash memory 20, but is not limited thereto.
參考第5B圖,第5B圖為本發明之參考電壓產生電路的另一實施例。第5B圖之參考電壓產生電路131與第5A圖的參考電壓產生電路13類似,差別在於第5B圖的參考電壓產生電路131更包括一負回授運算放大器31。負回授運算放大器31耦接於參考電流源Iref與電壓產生單元(SR1、SR2、...、SRN)之間,並用以輸出參考電壓Vref。 Referring to Fig. 5B, Fig. 5B is another embodiment of the reference voltage generating circuit of the present invention. The reference voltage generating circuit 131 of FIG. 5B is similar to the reference voltage generating circuit 13 of FIG. 5A except that the reference voltage generating circuit 131 of FIG. 5B further includes a negative feedback operational amplifier 31. The negative feedback operational amplifier 31 is coupled between the reference current source Iref and the voltage generating unit (SR1, SR2, . . . , SRN) and is used to output the reference voltage Vref.
請參考第6圖,第6圖為根據本發明之控制方法的流程圖。流程開始於步驟S51,處理單元11接收來自溫度感測器22所偵測到快閃記憶體20之溫度,並進入步驟S52。於步驟 S52中,處理單元11根據快閃記憶體20之溫度,選擇所要導通的電壓產生單元(SR1、SR2、...、SRN)中的開關元件,並回到步驟S51。舉例而言,處理單元11可以根據查找表所記錄之溫度與參考電壓以及快閃記憶體20之溫度,選擇電壓產生單元(SR1、SR2、...、SRN)中所要導通的開關元件,但並不以此為限。 Please refer to FIG. 6, which is a flow chart of the control method according to the present invention. The flow starts in step S51, and the processing unit 11 receives the temperature detected by the temperature sensor 22 from the flash memory 20, and proceeds to step S52. In the steps In S52, the processing unit 11 selects the switching elements in the voltage generating units (SR1, SR2, ..., SRN) to be turned on based on the temperature of the flash memory 20, and returns to step S51. For example, the processing unit 11 can select the switching elements to be turned on in the voltage generating units (SR1, SR2, ..., SRN) according to the temperature and reference voltage recorded by the lookup table and the temperature of the flash memory 20, but Not limited to this.
綜上所述,快閃記憶體之儲存單元之浮動閘極所儲存的負電子於溫度升高而發生負電子流失,造成儲存單元被讀取時之讀取電壓亦產生變化。本發明之比較器的參考電壓可以根據溫度做調整,避免比較器發生錯誤判斷的情況。因此,快閃記憶體於記憶體溫度發生變化時所產生的可靠度問題可以被克服。 In summary, the negative electrons stored in the floating gate of the memory cell of the flash memory are negatively electron-induced, and the read voltage is also changed when the memory cell is read. The reference voltage of the comparator of the present invention can be adjusted according to the temperature to avoid erroneous judgment of the comparator. Therefore, the reliability problem caused by the flash memory when the temperature of the memory changes can be overcome.
S51-S52‧‧‧步驟 S51-S52‧‧‧Steps
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW103115301A TW201541457A (en) | 2014-04-29 | 2014-04-29 | Electrical device and control method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW103115301A TW201541457A (en) | 2014-04-29 | 2014-04-29 | Electrical device and control method |
Publications (1)
Publication Number | Publication Date |
---|---|
TW201541457A true TW201541457A (en) | 2015-11-01 |
Family
ID=55220546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103115301A TW201541457A (en) | 2014-04-29 | 2014-04-29 | Electrical device and control method |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW201541457A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108182957A (en) * | 2018-01-19 | 2018-06-19 | 上海磁宇信息科技有限公司 | A kind of MRAM reading circuits using reference voltage |
TWI765600B (en) * | 2021-03-10 | 2022-05-21 | 群聯電子股份有限公司 | Memory control method, memory storage device and memory control circuit unit |
US11714569B2 (en) | 2019-09-20 | 2023-08-01 | Kioxia Corporation | Storage controller, storage device, and program |
-
2014
- 2014-04-29 TW TW103115301A patent/TW201541457A/en unknown
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108182957A (en) * | 2018-01-19 | 2018-06-19 | 上海磁宇信息科技有限公司 | A kind of MRAM reading circuits using reference voltage |
CN108182957B (en) * | 2018-01-19 | 2023-10-03 | 上海磁宇信息科技有限公司 | MRAM readout circuit using reference voltage |
US11714569B2 (en) | 2019-09-20 | 2023-08-01 | Kioxia Corporation | Storage controller, storage device, and program |
TWI841689B (en) * | 2019-09-20 | 2024-05-11 | 日商鎧俠股份有限公司 | Storage controller, storage device and control method thereof |
TWI765600B (en) * | 2021-03-10 | 2022-05-21 | 群聯電子股份有限公司 | Memory control method, memory storage device and memory control circuit unit |
US11615848B2 (en) | 2021-03-10 | 2023-03-28 | Phison Electronics Corp. | Memory control method, memory storage device, and memory control circuit unit |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI518688B (en) | Semiconductor memory system and access method thereof | |
US8947928B2 (en) | Flash memory device and memory system including the same | |
KR101239690B1 (en) | Systematic error correction for multi-level flash memory | |
US8929127B2 (en) | Current generator for nonvolatile memory device and write and/or read currents calibrating method using the same | |
US9001588B2 (en) | Sense amplifier for nonvolatile semiconductor memory device | |
US20190221268A1 (en) | Semiconductor memory device for improving high temperature data retention | |
US20100110815A1 (en) | Non-Volatile Memory Device Having Temperature Compensator and Memory System Thereof | |
US9665426B2 (en) | Semiconductor device and reading method | |
US9466360B2 (en) | Semiconductor device and method of operating the same | |
US10580485B2 (en) | System and method for adjusting read levels in a storage device based on bias functions | |
TW200929222A (en) | Controlling a memory device responsive to degradation | |
JP2006107711A (en) | Nonvolatile memory device and high-speed verification method therefor | |
KR20180125807A (en) | Semiconductor memory device and operation method thereof | |
CN103680614A (en) | Semiconductor memory device and method of operating same | |
JP5406920B2 (en) | Method for electrical trimming of non-volatile memory reference cells | |
US20110267893A1 (en) | Non-volatile semiconductor memory and memory system | |
JP2004071012A (en) | Semiconductor memory device | |
TW201541457A (en) | Electrical device and control method | |
US20100182861A1 (en) | Sense amplifier with a compensating circuit | |
TWI571883B (en) | Non-volatile memory apparatus and operation method thereof | |
JP5271225B2 (en) | Semiconductor device and method for correcting memory state of memory cell | |
KR20090123506A (en) | Circuit of generating voltage and non volatile memory device having the same | |
US10783959B2 (en) | Method of compensating charge loss and source line bias in programing of non-volatile memory device | |
JP2006065945A (en) | Nonvolatile semiconductor storage device and semiconductor integrated circuit device | |
CN108511018B (en) | Semiconductor memory device and data reading method |