TW201540522A - Gas barrier laminate, member for electronic device, and electronic device - Google Patents

Gas barrier laminate, member for electronic device, and electronic device Download PDF

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Publication number
TW201540522A
TW201540522A TW104110189A TW104110189A TW201540522A TW 201540522 A TW201540522 A TW 201540522A TW 104110189 A TW104110189 A TW 104110189A TW 104110189 A TW104110189 A TW 104110189A TW 201540522 A TW201540522 A TW 201540522A
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gas barrier
layer
optical adjustment
adjustment layer
layered product
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TW104110189A
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Chinese (zh)
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TWI667140B (en
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Yuki NITO
Yuuta Suzuki
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Lintec Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/16Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/402Coloured
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/418Refractive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/724Permeability to gases, adsorption
    • B32B2307/7242Non-permeable
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/12Photovoltaic modules
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays

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  • Laminated Bodies (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The present invention is: a gas barrier laminate that is formed by laminating a substrate, a gas barrier layer, and an optical adjustment layer in this order, said gas barrier layer being adjacent to said optical adjustment layer, and said gas barrier laminate being characterized in that the refractive index of the gas barrier layer is 1.55-1.81, the refractive index of the optical adjustment layer is 1.20-1.60, and the b* value in the CIE L*a*b* color system specified in JIS Z 8729-1994 is in the range of -1.00 to 1.00; a member for an electronic device, said member comprising the gas barrier laminate; and an electronic device that is provided with said member for an electronic device. The present invention provides a gas barrier laminate having excellent gas barrier properties and colorless transparency, a member for an electronic device, said member comprising the gas barrier laminate, and an electronic device that is provided with said member for an electronic device.

Description

氣體阻障性積層體、電子裝置用構件及電子裝置 Gas barrier laminated body, member for electronic device, and electronic device

本發明係有關於一種具有優異的氣體阻障性及無色透明性之氣體阻障性積層體、及由該氣體阻障性積層體所構成電子裝置用構件、以及具備該電子裝置用構件之電子裝置。 The present invention relates to a gas barrier layered product having excellent gas barrier properties and colorless transparency, and a member for an electronic device comprising the gas barrier layered product, and an electronic device including the member for the electronic device. Device.

近年來,液晶顯示器、電致發光(electroluminescence,EL)顯示器等的顯示器,為了實現薄型化、輕量化、可撓性化等,係使用在透明塑膠薄膜上層積無機化合物層(氣體阻障層)而成之所謂氣體阻障膜來代替玻璃板。 In recent years, a display such as a liquid crystal display or an electroluminescence (EL) display has been used to laminate an inorganic compound layer (gas barrier layer) on a transparent plastic film in order to reduce the thickness, weight, and flexibility. A so-called gas barrier film is used instead of a glass plate.

例如,專利文獻1係記載一種透明氣體阻障積層膜,其係在由塑膠薄膜所構成之基材的一面或兩面,藉由乾式塗佈法而設置SiOx的x之值為1.8以上的高氧化度氧化矽層及在該高氧化度氧化矽層上設置SiOx的x值為1.0~1.6的低氧化度氧化矽層,而且在該低氧化度氧化矽層面,使用由氧、氮、氬、或氦的一種、或2種以上所構成之氣體施行電漿處理之後,在該低氧化度氧化矽層的電漿處理面層積聚合物層而成。 For example, Patent Document 1 describes a transparent gas barrier laminated film in which the value of x of SiO x is set to be higher than 1.8 on the one or both surfaces of a substrate made of a plastic film by a dry coating method. An oxidation degree ruthenium oxide layer and a low oxidation degree ruthenium oxide layer having an SiO x x value of 1.0 to 1.6 on the high oxidation degree ruthenium oxide layer, and using oxygen, nitrogen, and argon at the low oxidation degree ruthenium oxide layer After the plasma treatment is performed on one or two or more gases, the polymer layer is laminated on the plasma treatment surface of the low oxidation degree ruthenium oxide layer.

又,專利文獻2係記載一種透明氣體阻障基板,其係在透明樹脂基板的一面或兩面,將氧氮化矽層及氮化矽層依照此順序層積而成。 Further, Patent Document 2 describes a transparent gas barrier substrate which is formed by laminating a yttrium oxynitride layer and a tantalum nitride layer on one surface or both surfaces of a transparent resin substrate in this order.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

[專利文獻1]日本特開2004-351832號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2004-351832

[專利文獻2]日本特開2007-062305號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2007-062305

如上述,以往多數建議具有無機化合物層之氣體阻障膜作為氣體阻障層。 As described above, a gas barrier film having an inorganic compound layer has been proposed as a gas barrier layer.

但是,因為此種氣體阻障層,係通常具有高折射率,所以與鄰接的其他層之折射率差變大,短波長的光線在該等層的界面反射,而有氣體阻障膜呈現黃色之問題。 However, since such a gas barrier layer generally has a high refractive index, the refractive index difference with other adjacent layers becomes large, and short-wavelength light is reflected at the interface of the layers, and the gas barrier film is yellow. The problem.

本發明係鑒於此種實際情況而進行。其目的係提供一種氣體阻障性積層體、由該氣體阻障性積層體所構成之電子裝置用構件、以及具備該電子裝置用構件之電子裝置,其中該氣體阻障性積層體係具有優異的氣體阻障性及無色透明性。 The present invention has been made in view of such actual circumstances. It is an object of the present invention to provide a gas barrier layered product, an electronic device member comprising the gas barrier layered product, and an electronic device including the electronic device member, wherein the gas barrier layered system has excellent properties. Gas barrier and colorless transparency.

為了解決前述課題,本發明者等構想出在基材及氣體阻障層層積光學調整層而成之氣體阻障性積層體,且針對該氣體阻障性積層體深入研究。其結果,發現一種氣體阻障性積層體,係具有優異的無色透明性及氣體阻障性,而完成了本發明,其中該氣體阻障性積層體,係氣體阻障層與光學調整層為鄰接而形成,前述氣體阻障層及光學調整層係具有特定折射率之層;而且在CIE L*a*b*表色系之b*值為特定範圍。 In order to solve the above problems, the inventors of the present invention have conceived a gas barrier layered product in which an optical adjustment layer is laminated on a substrate and a gas barrier layer, and has intensively studied the gas barrier layered product. As a result, it has been found that a gas barrier layered body having excellent colorless transparency and gas barrier properties has been completed, wherein the gas barrier layered body, the gas barrier layer and the optical adjustment layer are Formed adjacent to each other, the gas barrier layer and the optical adjustment layer have a layer having a specific refractive index; and the b* value in the CIE L*a*b* color system is a specific range.

如此,依照本發明,係提供下述(1)~(8)的氣體阻障性積層體、(9)的電子裝置用構件、及(10)的電子裝置。 As described above, according to the present invention, the gas barrier layered product of the following (1) to (8), the member for an electronic device of (9), and the electronic device of (10) are provided.

(1)一種氣體阻障性積層體,係將基材、氣體阻障層及光學調整層依照此順序層積而成,且前述氣體阻障層與光學調整層為鄰接之氣體阻障性積層體,其特徵在於:前述氣體阻障層的折射率為1.55~1.81,前述光學調整層的折射率為1.20~1.60,而且在JIS Z 8729-1994所規定的CIE L*a*b*表色系之b*值為-1.00~1.00的範圍。 (1) A gas barrier layered product in which a substrate, a gas barrier layer, and an optical adjustment layer are laminated in this order, and the gas barrier layer and the optical adjustment layer are adjacent to each other in a gas barrier layer. The body is characterized in that the refractive index of the gas barrier layer is 1.55 to 1.81, the refractive index of the optical adjustment layer is 1.20 to 1.60, and the CIE L*a*b* color specified in JIS Z 8729-1994 The b* value is in the range of -1.00 to 1.00.

(2)如(1)所述之氣體阻障性積層體,其中前述氣體阻障層係含有選自由無機氧化物、無機氮氧化物、無機碳氧化物、及無機氮氧碳化物所組成群組之至少一種。 (2) The gas barrier layered product according to (1), wherein the gas barrier layer contains a group selected from the group consisting of inorganic oxides, inorganic nitrogen oxides, inorganic carbon oxides, and inorganic nitrogen oxides. At least one of the groups.

(3)如(1)所述之氣體阻障性積層體,其中前述氣體阻障層,係將含有聚矽氮烷化合物之層改質處理而得到之層。 (3) The gas barrier layered product according to (1), wherein the gas barrier layer is a layer obtained by modifying a layer containing a polyazide compound.

(4)如(1)所述之氣體阻障性積層體,其中前述氣體阻障層的厚度,係從10nm至10μm。 (4) The gas barrier layered product according to (1), wherein the gas barrier layer has a thickness of from 10 nm to 10 μm.

(5)如(1)所述之氣體阻障性積層體,其中前述光學調整層係由硬化性組成物的硬化物所構成者。 (5) The gas barrier layered product according to (1), wherein the optical adjustment layer is composed of a cured product of a curable composition.

(6)如(5)所述之氣體阻障性積層體,其中前述硬化性組成物係含有硬化性成分及填充劑者。 (6) The gas barrier layered product according to (5), wherein the curable composition contains a curable component and a filler.

(7)如(1)所述之氣體阻障性積層體,其中前述光學調整層的厚度為5~2500nm。 (7) The gas barrier layered product according to (1), wherein the optical adjustment layer has a thickness of 5 to 2,500 nm.

(8)如(1)所述之氣體阻障性積層體,其中前述光學調整層的光學膜厚(T)係滿足下述式(1)或(2)者,[數1] 121.43x-100≦T≦115.43x-37.33 (1) 760≦T≦2000 (2) (8) The gas barrier layered product according to (1), wherein the optical film thickness (T) of the optical adjustment layer satisfies the following formula (1) or (2), [number 1] 121.43x-100≦T≦115.43x-37.33 (1) 760≦T≦2000 (2)

(x係表示1~6的整數)。 (x is an integer from 1 to 6).

(9)一種電子裝置用構件,係由如前述(1)所述之氣體阻障性積層體所構成。 (9) A member for an electronic device comprising the gas barrier layered product according to (1) above.

(10)一種電子裝置,係具備如前述(9)所述之電子裝置用構件。 (10) An electronic device comprising the member for an electronic device according to (9) above.

依照本發明,能夠提供一種具有優異的氣體阻障性及無色透明性之氣體阻障性積層體、由該氣體阻障性積層體所構成之電子裝置用構件、及具備該電子裝置用構件之電子裝置。 According to the present invention, it is possible to provide a gas barrier layered product having excellent gas barrier properties and colorless transparency, a member for an electronic device comprising the gas barrier layered product, and a member for the electronic device. Electronic device.

1‧‧‧範圍1 1‧‧‧Scope 1

2‧‧‧範圍2 2‧‧‧Scope 2

3‧‧‧範圍3 3‧‧‧Scope 3

4‧‧‧範圍4 4‧‧‧Scope 4

5‧‧‧範圍5 5‧‧‧Scope 5

6‧‧‧範圍6 6‧‧‧Scope 6

第1圖係表示光學膜厚與b*的關係之圖。 Fig. 1 is a view showing the relationship between the optical film thickness and b*.

第2圖係表示較佳光學膜厚的範圍之圖。 Fig. 2 is a view showing a range of a preferred optical film thickness.

用以實施發明之形態 Form for implementing the invention

以下,分項成為1)氣體阻障性積層體、以及2)電子裝置用構件及電子裝置而詳細地說明本發明。 Hereinafter, the present invention will be described in detail with reference to 1) a gas barrier layered product, and 2) members for an electronic device and an electronic device.

1)氣體阻障性積層體 1) Gas barrier laminate

本發明的氣體阻障性積層體,係將基材、氣體阻障層及光學調整層依照此順序層積而成,且前述氣體阻障層與光學調整層為鄰接之氣體阻障性積層體,其特徵在於:前述氣體阻障層 的折射率為1.55~1.81,前述光學調整層的折射率為1.20~1.60,而且在JIS Z 8729-1994所規定的CIE L*a*b*表色系之b*值為-1.00~1.00的範圍。 In the gas barrier layered product of the present invention, the substrate, the gas barrier layer and the optical adjustment layer are laminated in this order, and the gas barrier layer and the optical adjustment layer are adjacent to each other. , characterized by: the gas barrier layer The refractive index of the optical adjustment layer is from 1.50 to 1.60, and the b* value of the CIE L*a*b* color system specified in JIS Z 8729-1994 is -1.00 to 1.00. range.

(1)基材 (1) Substrate

構成本發明的氣體阻障性積層體之基材,係只要能夠負載氣體阻障層及光學調整層且透明者,就沒有特別限定。 The base material constituting the gas barrier layered product of the present invention is not particularly limited as long as it can carry the gas barrier layer and the optical adjustment layer and is transparent.

所謂透明基材,係指使光線通過而能夠將本發明的氣體阻障性積層體使用作為光學薄膜的程度之基材。基材在380~780nm之光線透過率,係以80%以上為佳,以85%以上為較佳。 The transparent substrate refers to a substrate which can pass light rays and can use the gas barrier layered product of the present invention as an optical film. The light transmittance of the substrate at 380 to 780 nm is preferably 80% or more, and more preferably 85% or more.

基材的厚度係沒有特別限定,配合氣體阻障性積層體之目的而決定即可。基材的厚度係通常為0.5~500μm。較佳為1~100μm。 The thickness of the substrate is not particularly limited, and may be determined in accordance with the purpose of blending the gas barrier layered product. The thickness of the substrate is usually from 0.5 to 500 μm. It is preferably 1 to 100 μm.

作為基材,通常係使用樹脂薄膜。 As the substrate, a resin film is usually used.

作為樹脂薄膜的樹脂成分,可舉出聚醯亞胺、聚醯胺、聚醯胺醯亞胺、聚苯醚(polyphenylene ether)、聚醚酮、聚醚醚酮、聚烯烴、聚酯、聚碳酸酯、聚碸、聚醚碸、聚苯硫醚(polyphenylene sulfide)、丙烯酸系樹脂、環烯烴系聚合物、芳香族系聚合物等。 The resin component of the resin film may, for example, be a polyimine, a polyamine, a polyamidene, a polyphenylene ether, a polyether ketone, a polyetheretherketone, a polyolefin, a polyester, or a poly Carbonate, polyfluorene, polyether oxime, polyphenylene sulfide, acrylic resin, cycloolefin polymer, aromatic polymer, and the like.

該等之中,因為具有優異的透明性且具有泛用性,以聚酯、聚醯胺、聚碸、聚醚碸、聚苯硫醚或環烯烴系聚合物為較佳,以聚酯或環烯烴系聚合物為更佳。 Among these, polyester, polyamide, polyfluorene, polyether oxime, polyphenylene sulfide or cycloolefin polymer is preferred because of its excellent transparency and versatility. A cycloolefin type polymer is more preferable.

作為聚酯,可舉出聚對苯二甲酸乙二酯/聚對酞酸乙二酯(polyethylene terephthalate)、聚對苯二甲酸丁二酯/聚對 酞酸丁二酯(polybutylene terephthalate)、聚萘二甲酸乙二酯(polyethylene naphthalate)、聚芳香酯(polyarylate)等。 Examples of the polyester include polyethylene terephthalate/polyethylene terephthalate, polybutylene terephthalate/polypair. Polybutylene terephthalate, polyethylene naphthalate, polyarylate, and the like.

作為聚醯胺,可舉出全芳香族聚醯胺、耐綸6、耐綸66、耐綸共聚物等。 Examples of the polyamines include wholly aromatic polyamines, nylon 6, nylon 66, and nylon copolymers.

作為環烯烴系聚合物,可舉出降莰烯(norbornene)系聚合物、單環的環狀烯烴系聚合物、環狀共軛二烯系聚合物、乙烯基脂環式烴聚合物、及該等的氫化物。作為其具體例,可舉出APEL(三井化學公司製的乙烯-環烯烴共聚物)、ARTON(JSR公司製的降莰烯系聚合物)、ZEONOR(日本ZEON公司製的降莰烯系聚合物)等。 Examples of the cycloolefin polymer include a norbornene polymer, a monocyclic cyclic olefin polymer, a cyclic conjugated diene polymer, a vinyl alicyclic hydrocarbon polymer, and These hydrides. Specific examples thereof include APEL (ethylene-cycloolefin copolymer manufactured by Mitsui Chemicals Co., Ltd.), ARTON (northene-based polymer manufactured by JSR Corporation), and ZEONOR (northene-based polymer manufactured by Japan ZEON Co., Ltd.) )Wait.

在不妨礙本發明的效果之範圍,樹脂薄膜亦可含有各種添加劑。作為添加劑,可舉出紫外線吸收劑、抗靜電劑、安定劑、抗氧化劑、可塑劑、潤滑劑、著色顏料等。該等添加劑的含量,係配合目的而適當地決定即可。 The resin film may contain various additives insofar as it does not impair the effects of the present invention. Examples of the additive include an ultraviolet absorber, an antistatic agent, a stabilizer, an antioxidant, a plasticizer, a lubricant, a coloring pigment, and the like. The content of these additives may be appropriately determined depending on the purpose of the compounding.

樹脂薄膜係能夠藉由調製含有樹脂成分及依照需要的各種添加劑之樹脂組成物,且將其成形為薄膜狀而得到。成形方法係沒有特別限定,能夠利用鑄塑法、熔融擠製法等習知的方法。 The resin film can be obtained by preparing a resin composition containing a resin component and various additives as needed, and forming the film into a film shape. The molding method is not particularly limited, and a conventional method such as a casting method or a melt extrusion method can be used.

(2)氣體阻障層 (2) Gas barrier layer

構成本發明的氣體阻障性積層體之氣體阻障層,係具有抑制氧和水蒸氣等氣體透過的特性(氣體阻障性)之層。 The gas barrier layer constituting the gas barrier layered product of the present invention is a layer having a property (gas barrier property) for suppressing the transmission of gas such as oxygen and water vapor.

作為氣體阻障層,可舉出無機氧化物、無機氮氧化物、無機碳氧化物、無機氮氧碳化物等的無機化合物、及含有金屬之層。作為氣體阻障層,尤其是以含有選自由無機氧化 物、無機氮氧化物、無機碳氧化物、及無機氮氧碳化物所組成群組之至少一種為佳。 Examples of the gas barrier layer include inorganic compounds such as inorganic oxides, inorganic nitrogen oxides, inorganic carbon oxides, and inorganic nitrogen oxides, and layers containing metals. As a gas barrier layer, especially containing a selected from inorganic oxidation At least one of the group consisting of inorganic nitrogen oxides, inorganic carbon oxides, and inorganic nitrogen oxides is preferred.

作為此種氣體阻障層,可舉出無機蒸鍍膜、及對含有高分子化合物之層(以下,有稱為「高分子層」之情形)施行改質處理而得到者[此時,所謂氣體阻障層,不是只意味著透過離子植入處理等被改質後的區域,而是意味著「含有被改質後的區域之高分子層」]等。 Examples of such a gas barrier layer include an inorganic vapor deposition film and a layer obtained by modifying a layer containing a polymer compound (hereinafter referred to as a "polymer layer"). The barrier layer is not only a region that has been modified by ion implantation or the like, but means "a polymer layer containing a modified region"].

作為無機蒸鍍膜,可舉出無機化合物和金屬的蒸鍍膜。 As an inorganic vapor deposition film, the vapor deposition film of an inorganic compound and metal is mentioned.

作為無機化合物的蒸鍍膜之原料,可舉出氧化矽、氧化鋁、氧化鎂、氧化鋅、氧化銦、氧化錫等的無機氧化物;氮化矽、氮化鋁、氮化鈦等的無機氮化物;無機碳化物;無機硫化物;氮氧化矽等的無機氮氧化物;無機碳氧化物;無機碳氮化物;無機氮氧碳化物等。 Examples of the raw material of the vapor deposition film of the inorganic compound include inorganic oxides such as cerium oxide, aluminum oxide, magnesium oxide, zinc oxide, indium oxide, and tin oxide; and inorganic nitrogen such as tantalum nitride, aluminum nitride, and titanium nitride. Inorganic carbides; inorganic sulfides; inorganic nitrogen oxides such as bismuth oxynitride; inorganic carbon oxides; inorganic carbonitrides; inorganic nitrogen oxides.

作為金屬的蒸鍍膜之原料,可舉出鋁、鎂、鋅、及錫等。 Examples of the raw material of the vapor deposited film of metal include aluminum, magnesium, zinc, and tin.

該等係能夠單獨1種、或組合2種以上而使用。 These can be used alone or in combination of two or more.

該等之中,從氣體阻障性的觀點而言,係以將無機氧化物、無機氮化物或金屬作為原料之無機蒸鍍膜為佳,而且,從透明性的觀點而言,係以將無機氧化物或無機氮化物作為原料之無機蒸鍍膜為佳。 Among these, from the viewpoint of gas barrier properties, an inorganic deposited film containing an inorganic oxide, an inorganic nitride or a metal as a raw material is preferable, and from the viewpoint of transparency, inorganic is used. An inorganic deposited film having an oxide or an inorganic nitride as a raw material is preferred.

作為形成無機蒸鍍膜之方法,可舉出真空蒸鍍法、濺鍍法、離子噴鍍法等的PVD(物理氣相沉積)法、熱CVD(化學氣相沉積)法、電漿CVD法、光CVD法等的CVD法。 Examples of the method of forming the inorganic deposited film include a PVD (physical vapor deposition) method, a thermal CVD (chemical vapor deposition) method, a plasma CVD method, and the like, such as a vacuum deposition method, a sputtering method, and an ion plating method. A CVD method such as a photo CVD method.

無機蒸鍍膜的厚度,係依照所使用的無機化合物 而不同。從氣體阻障性及操作性的觀點而言,係以10~2000nm為佳,較佳為20~1000nm,較佳為30~500nm,更佳為40~200nm的範圍。 The thickness of the inorganic deposited film is based on the inorganic compound used. And different. From the viewpoint of gas barrier properties and handleability, it is preferably from 10 to 2,000 nm, more preferably from 20 to 1,000 nm, more preferably from 30 to 500 nm, still more preferably from 40 to 200 nm.

在對高分子層施行改質處理而得到的氣體阻障層,作為所使用的高分子化合物,可舉出含矽的高分子化合物、聚醯亞胺、聚醯胺、聚醯胺醯亞胺、聚苯醚、聚醚酮、聚醚醚酮、聚烯烴、聚酯、聚碳酸酯、聚碸、聚醚碸、聚苯硫醚、聚芳香酯(polyarylate)、丙烯酸系樹脂、環烯烴系聚合物、芳香族系聚合物等。 In the gas barrier layer obtained by modifying the polymer layer, examples of the polymer compound to be used include a polymer compound containing ruthenium, polyimine, polyamine, and polyamidimide. , polyphenylene ether, polyether ketone, polyether ether ketone, polyolefin, polyester, polycarbonate, polyfluorene, polyether oxime, polyphenylene sulfide, polyarylate, acrylic resin, cycloolefin A polymer, an aromatic polymer, or the like.

該等高分子化合物,係能夠單獨1種、或組合2種以上而使用。 These polymer compounds can be used alone or in combination of two or more.

該等之中,因為能夠得到具有更優異的氣體阻障性之氣體阻障層,作為高分子化合物,係以含矽的高分子化合物為佳。作為含矽的高分子化合物,可舉出聚矽氮烷系化合物、聚碳矽烷系化合物、聚矽烷系化合物、及聚有機矽氧烷系化合物等。因為能夠形成即便較薄亦具有優異的氣體阻障性之氣體阻障層,尤其是以聚矽氮烷系化合物為佳。藉由對含有聚矽氮烷系化合物之層施行改質處理,能夠形成具有以氧、氮、矽作為主構成原子之層(氧氮化矽層)。 Among these, a gas barrier layer having more excellent gas barrier properties can be obtained, and as the polymer compound, a polymer compound containing ruthenium is preferred. Examples of the ruthenium-containing polymer compound include a polyazane-based compound, a polycarbodecane-based compound, a polydecane-based compound, and a polyorganosiloxane compound. Since it is possible to form a gas barrier layer which is excellent in gas barrier properties even when it is thin, it is preferable to use a polyazane-based compound. By modifying the layer containing the polyazane-based compound, a layer (barium oxynitride layer) having oxygen, nitrogen, and antimony as main constituent atoms can be formed.

聚矽氮烷系化合物,係在分子內具有含有-Si-N-鍵(矽氮烷鍵)的重複單元之高分子化合物。具體而言係具有以式(1)[化1] The polyazane-based compound is a polymer compound having a repeating unit containing a -Si-N-bond (indolizane bond) in the molecule. Specifically, it has the formula (1) [Chemical 1]

表示的重複單元之化合物為佳。又,所使用的聚矽氮烷系化合物之數量平均分子量係沒有特別限定,以100~50,000為佳。 The compound of the repeating unit represented is preferred. Further, the number average molecular weight of the polyazane-based compound to be used is not particularly limited, and is preferably from 100 to 50,000.

前述式(1)中,n係表示任意的自然數。Rx、Ry、Rz係各自獨立且表示氫原子、未取代或是具有取代基之烷基、未取代或是具有取代基之環烷基、未取代或是具有取代基之烯基、未取代或是具有取代基之芳基或烷基矽烷基等的非水解性基。 In the above formula (1), n represents an arbitrary natural number. R x , R y , and R z each independently represent a hydrogen atom, an unsubstituted or substituted alkyl group, an unsubstituted or substituted cycloalkyl group, an unsubstituted or substituted alkenyl group, A non-hydrolyzable group which is unsubstituted or has a substituent such as an aryl group or an alkylalkylene group.

作為前述未取代或是具有取代基的烷基之烷基,例如,可舉出甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、異戊基、新戊基、正己基、正庚基、正辛基等碳數1~10的烷基。 Examples of the alkyl group of the unsubstituted or substituted alkyl group include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a second butyl group, and a third group. A C1-C10 alkyl group such as butyl, n-pentyl, isopentyl, neopentyl, n-hexyl, n-heptyl or n-octyl.

作為未取代或是具有取代基的環烷基之環烷基,可舉出環丁基、環戊基、環己基、環庚基等碳數3~10的環烷基。 Examples of the cycloalkyl group of the unsubstituted or substituted cycloalkyl group include a cycloalkyl group having 3 to 10 carbon atoms such as a cyclobutyl group, a cyclopentyl group, a cyclohexyl group and a cycloheptyl group.

作為未取代或是具有取代基的烯基之烯基,例如,可舉出乙烯基、1-丙烯基、2-丙烯基、1-丁烯基、2-丁烯基、3-丁烯基等碳數2~10的烯基。 Examples of the alkenyl group of the unsubstituted or substituted alkenyl group include a vinyl group, a 1-propenyl group, a 2-propenyl group, a 1-butenyl group, a 2-butenyl group, and a 3-butenyl group. An alkenyl group having 2 to 10 carbon atoms.

作為前述烷基、環烷基及烯基的取代基,可舉出氟原子、氯原子、溴原子、碘原子等的鹵素原子;羥基;硫醇基;環氧基;環氧丙氧基;(甲基)丙烯醯氧基;苯基、4-甲基 苯基、4-氯苯基等的未取代或是具有取代基之芳基等。 Examples of the substituent of the alkyl group, the cycloalkyl group and the alkenyl group include a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom; a hydroxyl group; a thiol group; an epoxy group; and a glycidoxy group; (methyl) propylene oxime; phenyl, 4-methyl An unsubstituted or substituted aryl group such as a phenyl group or a 4-chlorophenyl group.

作為未取代或是具有取代基的芳基之芳基,例如,可舉出苯基、1-萘基、2-萘基等碳數6~10的芳基。 Examples of the aryl group which is an unsubstituted or substituted aryl group include an aryl group having 6 to 10 carbon atoms such as a phenyl group, a 1-naphthyl group or a 2-naphthyl group.

作為前述芳基的取代基,可舉出氟原子、氯原子、溴原子、碘原子等的鹵素原子;甲基、乙基等的碳數1~6的烷基;甲氧基、乙氧基等碳數1~6的烷氧基;硝基;氰基;羥基;硫醇基;環氧基;環氧丙氧基;(甲基)丙烯醯氧基;苯基、4-甲基苯基、4-氯苯基等未取代或是具有取代基之芳基等。 Examples of the substituent of the aryl group include a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom; an alkyl group having 1 to 6 carbon atoms such as a methyl group or an ethyl group; and a methoxy group and an ethoxy group. Alkoxy group having 1 to 6 carbon atoms; nitro group; cyano group; hydroxyl group; thiol group; epoxy group; glycidoxy group; (meth) acryloxy group; phenyl group, 4-methylbenzene group An unsubstituted group such as a 4-chlorophenyl group or an aryl group having a substituent.

作為烷基矽烷基,可舉出三甲基矽烷基、三乙基矽烷基、三異丙基矽烷基、三第三丁基矽烷基、甲基二乙基矽烷基、二甲基矽烷基、二乙基矽烷基、甲基矽烷基、乙基矽烷基等。 Examples of the alkyl fluorenyl group include a trimethyl decyl group, a triethyl decyl group, a triisopropyl decyl group, a tri-tert-butyl fluorenyl group, a methyl diethyl decyl group, and a dimethyl decyl group. Diethyl decyl, methyl decyl, ethyl decyl, and the like.

該等之中,作為Rx、Ry、Rz,係以氫原子、碳數1~6的烷基、或苯基為佳,以氫原子為特佳。 Among these, R x , R y , and R z are preferably a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, and particularly preferably a hydrogen atom.

作為以前述式(1)表示之具有重複單元的聚矽氮烷系化合物,係Rx、Ry、Rz的全部為氫原子之無機聚矽氮烷、及Rx、Ry、Rz的至少1個不是氫原子之有機聚矽氮烷之任一者均可以。 As to represent the aforementioned formula (1) having a poly silicon silazane compound repeating units, based R x, R y, R z all poly inorganic hydrogen atom of silicon silazanes, and R x, R y, R z Any one of at least one organic polyazane which is not a hydrogen atom may be used.

又,在本發明,亦能夠使用聚矽氮烷改性物作為聚矽氮烷系化合物。作為聚矽氮烷改性物,例如,可舉出在特開昭62-195024號公報、特開平2-84437號公報、特開昭63-81122號公報、特開平1-138108號公報等、特開平2-175726號公報、特開平5-238827號公報、特開平5-238827號公報、特開平6-122852號公報、特開平6-306329號公報、特開平 6-299118號公報、特開平9-31333號公報、特開平5-345826號公報、特開平4-63833號公報等所記載者。 Further, in the present invention, a polyazane-modified product can also be used as the polyazane-based compound. For example, JP-A-62-195024, JP-A-2-84437, JP-A-63-81122, JP-A-1-138108, and the like, Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. It is described in the Japanese Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei.

該等之中,作為聚矽氮烷系化合物,從取得容易性、及能夠形成具有優異的氣體阻障性之離子植入層的觀點而言,係以Rx、Ry、Rz全部為氫原子之全氫聚矽氮烷為佳。 Among these, as the polyazane-based compound, all of R x , R y , and R z are used from the viewpoint of easiness of acquisition and formation of an ion-implanted layer having excellent gas barrier properties. It is preferred that the hydrogen atom is a perhydropolyazane.

又,作為聚矽氮烷系化合物,亦能夠使用市售作為玻璃塗佈材之市售品等。 Further, as the polyazane-based compound, a commercially available product such as a glass coating material can be used.

聚矽氮烷系化合物係能夠單獨1種、或組合2種以上而使用。 The polyazane-based compound can be used alone or in combination of two or more.

高分子層,係除了上述的高分子化合物以外,在不阻礙本發明的目的之範圍亦可含有其他成分。作為其他成分,可舉出硬化劑、抗老化劑、光安定劑、阻燃劑等。 The polymer layer may contain other components in addition to the above-described polymer compound, without departing from the object of the present invention. Examples of other components include a curing agent, an anti-aging agent, a photostabilizer, and a flame retardant.

高分子層中的高分子化合物之含量,因為能夠得到具有更優異的氣體阻障性之氣體阻障層,以50質量%以上為佳,以70質量%以上為較佳。 The content of the polymer compound in the polymer layer is preferably 50% by mass or more, and more preferably 70% by mass or more, because a gas barrier layer having more excellent gas barrier properties can be obtained.

高分子層的厚度係沒有特別限制,通常為從20nm至10μm,以30~500nm為佳,較佳為40~400nm。 The thickness of the polymer layer is not particularly limited, and is usually from 20 nm to 10 μm, preferably from 30 to 500 nm, and more preferably from 40 to 400 nm.

在本發明,即便高分子層的厚度為奈米等級,亦能夠得到具有充分的氣體阻障性之氣體阻障膜。 In the present invention, even if the thickness of the polymer layer is on the nanometer scale, a gas barrier film having sufficient gas barrier properties can be obtained.

形成高分子層之方法係沒有特別限定。例如,能夠藉由調製含有高分子化合物的至少一種、依照需要的其他成分、及溶劑等之高分子層形成用溶液,其次,將該高分子層形成用溶液,使用習知的方法進行塗佈且將所得到的塗膜乾燥,而形成高分子層。 The method of forming the polymer layer is not particularly limited. For example, a solution for forming a polymer layer containing at least one polymer compound, a component other than necessary, and a solvent, and the like, and a solution for forming a polymer layer can be applied by a conventional method. The obtained coating film was dried to form a polymer layer.

作為在高分子層形成用溶液所使用的溶劑,可舉出苯、甲苯等的芳香族烴系溶劑;乙酸乙酯、乙酸丁酯等的酯系溶劑;丙酮、甲基乙基酮、甲基異丁基酮等的酮系溶劑;正戊烷、正己烷、正庚烷等的脂肪族烴系溶劑;環戊烷、環己烷等的脂環式烴系溶劑等。 Examples of the solvent used for the solution for forming a polymer layer include an aromatic hydrocarbon solvent such as benzene or toluene; an ester solvent such as ethyl acetate or butyl acetate; acetone, methyl ethyl ketone, and methyl group. A ketone solvent such as isobutyl ketone; an aliphatic hydrocarbon solvent such as n-pentane, n-hexane or n-heptane; an alicyclic hydrocarbon solvent such as cyclopentane or cyclohexane.

該等溶劑係能夠單獨1種、或組合2種以上而使用。 These solvents can be used alone or in combination of two or more.

作為高分子層形成用溶液的塗佈方法,可舉出棒塗佈法、旋轉塗佈法、浸漬法、輥塗佈、凹版塗佈、刮刀塗佈、空氧刮刀塗佈、輥筒刮刀塗佈、模塗佈、網版印刷法、噴霧塗佈、凹版轉印法等。 Examples of the method for applying the solution for forming a polymer layer include a bar coating method, a spin coating method, a dipping method, a roll coating, a gravure coating, a doctor blade coating, an air oxygen blade coating, and a roller blade coating. Cloth, die coating, screen printing, spray coating, gravure transfer, and the like.

作為將所形成的塗膜乾燥之方法,能夠採用熱風乾燥、熱輥乾燥、紅外線照射等先前習知的乾燥方法。加熱溫度係通常為60~130℃的範圍。加熱時間係通常從數秒至數十分鐘。 As a method of drying the formed coating film, a conventional drying method such as hot air drying, hot roll drying, or infrared irradiation can be employed. The heating temperature is usually in the range of 60 to 130 °C. The heating time is usually from a few seconds to tens of minutes.

作為高分子層的改質處理,可舉出離子植入處理、電漿處理、紫外線照射處理、熱處理等。 Examples of the modification treatment of the polymer layer include ion implantation treatment, plasma treatment, ultraviolet irradiation treatment, and heat treatment.

離子植入處理,係如後述之將離子植入高分子層而將高分子層改質之方法。 The ion implantation treatment is a method of modifying a polymer layer by implanting ions into a polymer layer as will be described later.

電漿處理,係將高分子層暴露電漿中而將高分子層改質之方法。例如能夠依照在特開2012-106421號公報所記載之方法而進行電漿處理。 Plasma treatment is a method in which a polymer layer is exposed to a plasma to reform a polymer layer. For example, the plasma treatment can be carried out in accordance with the method described in JP-A-2012-106421.

紫外線照射處理,係對高分子層照射紫外線而將高分子層改質之方法。例如,能夠依照在特開2013-226757號公報所記載之方法而進行紫外線改質處理。 The ultraviolet irradiation treatment is a method of modifying the polymer layer by irradiating ultraviolet rays to the polymer layer. For example, the ultraviolet modification treatment can be carried out in accordance with the method described in JP-A-2013-226757.

該等之中,因為不會使高分子層的表面粗糙且效率良好地改質至其內部為止,而能夠形成具有更優異的氣體阻障性之氣體阻障層,以離子植入處理為佳。 Among these, since the surface of the polymer layer is not roughened and efficiently reformed to the inside thereof, a gas barrier layer having more excellent gas barrier properties can be formed, and ion implantation treatment is preferred. .

作為植入至高分子層之離子,可舉出氬、氦、氖、氪、氙等稀有氣體的離子;氟碳、氫、氮、氧、二氧化碳、氯、氟、硫等的離子;甲烷、乙烷等的烷系氣體類的離子;乙烯、丙烯等烯系氣體類的離子;戊二烯、丁二烯等二烯烴系氣體類的離子;乙炔等炔系氣體類的離子;苯、甲苯等芳香族烴系氣體類的離子;環丙烷等環烷系氣體類的離子;環戊烯等環烯系氣體類的離子;金屬的離子;有機矽化合物的離子等。 Examples of the ions implanted in the polymer layer include ions of rare gases such as argon, helium, neon, krypton, and xenon; ions such as fluorocarbon, hydrogen, nitrogen, oxygen, carbon dioxide, chlorine, fluorine, and sulfur; methane and B; An ion of an alkane gas such as an alkoxide; an ion of an olefinic gas such as ethylene or propylene; an ion of a diene-based gas such as pentadiene or butadiene; an ion of an acetylene gas such as acetylene; a benzene or a toluene; An ion of an aromatic hydrocarbon-based gas; an ion of a naphthenic gas such as cyclopropane; an ion of a cycloolefin-based gas such as cyclopentene; an ion of a metal; an ion of an organic ruthenium compound.

該等離子係能夠單獨1種、或組合2種以上而使用。 The plasma system can be used alone or in combination of two or more.

該等之中,因為能夠更簡便地植入離子,且能夠形成具有更優異的氣體阻障性之氣體阻障層,以氬、氦、氖、氪、氙等稀有氣體的離子為佳。 Among these, since it is possible to implant ions more easily and to form a gas barrier layer having more excellent gas barrier properties, it is preferable to use ions of a rare gas such as argon, helium, neon, krypton or xenon.

離子的植入量,係能夠配合積層體的使用目的(必要的氣體阻障性、透明性等)等而適當地決定。 The amount of ions to be implanted can be appropriately determined in accordance with the purpose of use of the laminate (necessary gas barrier properties, transparency, etc.).

作為植入離子之方法,可舉出照射被電場加速後的離子(離子射束)之方法、將電漿中的離子植入之方法等。因為在本發明能夠簡便地得到目標阻障層,尤其是以後者之植入電漿離子之方法為佳。 Examples of the method of implanting ions include a method of irradiating ions (ion beam) accelerated by an electric field, a method of implanting ions in a plasma, and the like. Since the target barrier layer can be easily obtained in the present invention, especially the latter method of implanting plasma ions is preferred.

電漿離子植入,係例如能夠藉由在含有稀有氣體等的電漿生成氣體之環境下使電漿產生,對高分子層施加負的高電壓脈衝,而將該電漿中的離子(陽離子)植入高分子層的表面部來進行。 The plasma ion implantation is, for example, capable of generating a plasma by generating a gas in a plasma containing a rare gas or the like, applying a negative high voltage pulse to the polymer layer, and ion (cation) in the plasma. The surface portion of the polymer layer is implanted.

藉由離子植入,離子所植入的區域之厚度係能夠藉由離子種類、施加電壓、處理時間等的植入條件來控制,按照高分子層的厚度、積層體的使用目的等而決定即可,通常為10~400nm。 By ion implantation, the thickness of the region in which the ions are implanted can be controlled by the implantation conditions such as the ion type, the applied voltage, and the processing time, and is determined according to the thickness of the polymer layer, the purpose of use of the laminate, and the like. Yes, usually 10~400nm.

氣體阻障層的厚度,通常為10nm至10μm,以10~2000nm為佳,以20~1000nm為較佳。 The thickness of the gas barrier layer is usually 10 nm to 10 μm, preferably 10 to 2000 nm, and preferably 20 to 1000 nm.

氣體阻障層的折射率為1.55~1.81,較佳為1.60~1.67。氣體阻障層的折射率小於1.55時,因為不容易發生氣體阻障性積層體呈現黃色之問題,所以缺乏利用本發明之必要性。氣體阻障層的折射率大於1.81時,變得不容易得到b*為1.00以下的氣體阻障性積層體。 The refractive index of the gas barrier layer is from 1.55 to 1.81, preferably from 1.60 to 1.67. When the refractive index of the gas barrier layer is less than 1.55, since the problem that the gas barrier laminate is yellow is unlikely to occur, the necessity of utilizing the present invention is lacking. When the refractive index of the gas barrier layer is more than 1.81, it becomes difficult to obtain a gas barrier layered product having b* of 1.00 or less.

又,氣體阻障層的折射率,係上述範圍即可,以大於後述的光學調整層之折射率為佳。氣體阻障層的折射率與光學調整層的折射率為此種關係時,能夠容易地得到b*為1.00以下的氣體阻障性積層體。 Further, the refractive index of the gas barrier layer may be in the above range, and is preferably larger than the refractive index of the optical adjustment layer to be described later. When the refractive index of the gas barrier layer is such a relationship with the refractive index of the optical adjustment layer, a gas barrier layered product having b* of 1.00 or less can be easily obtained.

在本發明,所謂折射率,係指在23℃所測定之波長為590nm的光線之折射率。 In the present invention, the refractive index means the refractive index of light having a wavelength of 590 nm measured at 23 °C.

(3)光學調整層 (3) Optical adjustment layer

構成本發明的氣體阻障性積層體之光學調整層,係調節氣體阻障性積層體的色相之層。 The optical adjustment layer constituting the gas barrier layered product of the present invention is a layer for adjusting the hue of the gas barrier layered product.

因為氣體阻障層係通常具有高折射率,所以與鄰接的其他層之折射率差變大且短波長的光線容易在該等層的界面產生反射。因此,先前的氣體阻障性積層體係有呈現黃色之傾向。 Since the gas barrier layer generally has a high refractive index, the difference in refractive index from the adjacent other layers becomes large and light of a short wavelength easily causes reflection at the interface of the layers. Therefore, the previous gas barrier laminate system has a tendency to appear yellow.

本發明的氣體阻障性積層體,係因為具有鄰接氣體阻障層 之光學調整層,所以能夠抑制呈現黃色且具有優異的無色透明性。 The gas barrier laminate of the present invention has an adjacent gas barrier layer Since the optical adjustment layer is formed, it is possible to suppress the appearance of yellow color and to have excellent colorless transparency.

作為光學調整層,只要具有後述的特性,其構成成分和形成方法就沒有特別限制,能夠使用習知者。作為光學調整層的材料,可舉出硬化性組成物的硬化物、聚酯系樹脂、聚胺酯系樹脂、丙烯酸系樹脂、聚碳酸酯系樹脂、氯乙烯/乙酸乙烯酯共聚物、聚乙烯基丁縮醛系樹脂、硝基纖維素系樹脂氟系樹脂等的樹脂類;無機氧化物、無機氮氧化物、無機碳氧化物、及無機氮氧碳化物等的無機物等。 The optical adjustment layer is not particularly limited as long as it has the characteristics described later, and a conventionally applicable one can be used. Examples of the material of the optical adjustment layer include a cured product of a curable composition, a polyester resin, a polyurethane resin, an acrylic resin, a polycarbonate resin, a vinyl chloride/vinyl acetate copolymer, and a polyvinyl butyl group. A resin such as an acetal resin or a nitrocellulose resin fluorine resin; an inorganic material such as an inorganic oxide, an inorganic nitrogen oxide, an inorganic carbon oxide, or an inorganic nitrogen oxide.

尤其是以硬化性組成物的硬化物、聚酯系樹脂、聚胺酯系樹脂、丙烯酸系樹脂、聚碳酸酯系樹脂、氯乙烯/乙酸乙烯酯共聚物、聚乙烯基丁縮醛系樹脂、硝基纖維素系樹脂氟系樹脂等的樹脂類為佳,以由硬化性組成物的硬化物所構成之層為更佳。光學調整層係由硬化性組成物的硬化物所構成之層時,除了調節氣體阻障性積層體的色相之功能以外,能夠對氣體阻障性積層體進一步賦予耐擦傷性。 In particular, it is a cured product of a curable composition, a polyester resin, a polyurethane resin, an acrylic resin, a polycarbonate resin, a vinyl chloride/vinyl acetate copolymer, a polyvinyl butyral resin, or a nitro group. A resin such as a cellulose resin fluororesin is preferable, and a layer composed of a cured product of a curable composition is more preferable. When the optical adjustment layer is a layer composed of a cured product of a curable composition, the gas barrier layered body can be further provided with scratch resistance in addition to the function of adjusting the hue of the gas barrier layered product.

前述硬化性組成物,係含有硬化性成分之化合物,且能夠藉由照射活性能量線和加熱而硬化之組成物。 The curable composition is a compound containing a curable component and capable of being cured by irradiation with an active energy ray and heating.

在能夠藉由照射活性能量線而硬化之組成物,作為硬化性成分,可舉出聚合性預聚合物和聚合性單體。 A composition which can be cured by irradiation with an active energy ray is a polymerizable prepolymer and a polymerizable monomer as a curable component.

作為聚合性預聚合物,可舉出藉由在兩末端具有羥基之聚酯寡聚物與(甲基)丙烯酸反應而得到之聚酯丙烯酸酯預聚合物、藉由低分子量的雙酚型環氧樹脂和酚醛清漆型環氧樹脂與(甲基)丙烯酸反應而得到之環氧丙烯酸酯預聚合物、藉由聚胺 酯寡聚物與(甲基)丙烯酸反應而得到之胺甲酸酯丙烯酸酯預聚合物、藉由聚醚多元醇與(甲基)丙烯酸反應而得到之多元醇丙烯酸酯系預聚合物等。 The polymerizable prepolymer includes a polyester acrylate prepolymer obtained by reacting a polyester oligomer having a hydroxyl group at both terminals with (meth)acrylic acid, and a bisphenol ring having a low molecular weight. An epoxy acrylate prepolymer obtained by reacting an oxygen resin and a novolac type epoxy resin with (meth)acrylic acid, by a polyamine A urethane acrylate prepolymer obtained by reacting an ester oligomer with (meth)acrylic acid, a polyol acrylate prepolymer obtained by reacting a polyether polyol with (meth)acrylic acid, or the like.

作為聚合性單體,可舉出1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、羥基三甲基乙酸酸新戊二醇二(甲基)丙烯酸酯、二環戊基二(甲基)丙烯酸酯、己內酯改性二環戊烯二(甲基)丙烯酸酯、環氧乙烷改性磷酸二(甲基)丙烯酸酯、烯丙基化環己基二(甲基)丙烯酸酯、異三聚氰酸酯二(甲基)丙烯酸酯等的2官能(甲基)丙烯酸酯;三羥甲基丙烷三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、丙酸改性二新戊四醇三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、環氧丙烷改性三羥甲基丙烷三(甲基)丙烯酸酯、參(丙烯醯氧基乙基)異三聚氰酸酯等的3官能(甲基)丙烯酸酯;丙酸改性二新戊四醇五(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯、己內酯改性二新戊四醇六(甲基)丙烯酸酯等4官能以上的(甲基)丙烯酸酯;乙二醇二乙烯醚、新戊四醇二乙烯醚、1,6-己二醇二乙烯醚、三羥甲基丙烷二乙烯醚、環氧乙烷改性氫醌二乙烯醚、環氧乙烷改性雙酚A二乙烯醚、新戊四醇三乙烯醚、二新戊四醇六乙烯醚、雙三羥甲基丙烷聚乙烯基醚等的乙烯系化合物等,但是未必被該等限定。 Examples of the polymerizable monomer include 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, and neopentyl glycol di(meth)acrylate. , polyethylene glycol di(meth) acrylate, hydroxytrimethyl acetic acid neopentyl glycol di (meth) acrylate, dicyclopentyl di (meth) acrylate, caprolactone modified bicyclic ring Pentene di(meth)acrylate, ethylene oxide modified di(meth)acrylate, allylated cyclohexyl di(meth)acrylate, isomeric cyanide di(methyl) Bifunctional (meth) acrylate such as acrylate; trimethylolpropane tri(meth) acrylate, neopentyl alcohol tri(meth) acrylate, propionic acid modified dipentaerythritol tris (A) Acrylate, neopentyl alcohol tri(meth) acrylate, propylene oxide modified trimethylolpropane tri(meth) acrylate, ginseng (propylene oxyethyl) isomeric cyanurate Equivalent trifunctional (meth) acrylate; propionic acid modified dine pentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, caprolactone modified dicotyl More than four functional groups such as hexa (meth) acrylate Acrylate; ethylene glycol divinyl ether, neopentyl alcohol divinyl ether, 1,6-hexanediol divinyl ether, trimethylolpropane divinyl ether, ethylene oxide modified hydroquinone divinyl ether a vinyl compound such as ethylene oxide-modified bisphenol A divinyl ether, neopentyl alcohol trivinyl ether, dipentaerythritol hexavinyl ether or ditrimethylolpropane polyvinyl ether, but may not necessarily It is limited by these.

該等聚合性化合物係能夠單獨一種、或組合二種以上而使用。 These polymerizable compounds can be used alone or in combination of two or more.

在此,(甲基)丙烯醯基之記載,其意思係包含丙烯醯基及 甲基丙烯醯基之雙方。 Here, the description of the (meth) acrylonitrile group means that the propylene group and the propylene group are contained. Both sides of the methacrylonitrile group.

又,在前述硬化性組成物中,亦可含有其本身不具有反應硬化性的高分子樹脂成分,例如丙烯酸樹脂。藉由添加高分子樹脂成分,能夠調整該組成物的黏度。 Further, the curable composition may contain a polymer resin component which does not have reaction-curing property itself, for example, an acrylic resin. The viscosity of the composition can be adjusted by adding a polymer resin component.

作為活性能量線,可舉出紫外線、電子束、α射線、β射線、γ射線等。該等之中,因為能夠使用比較簡便的裝置而使其產生,作為活性能量線,係以紫外線為佳。 Examples of the active energy ray include ultraviolet rays, electron beams, α rays, β rays, and γ rays. Among these, it is possible to use a relatively simple device, and it is preferable to use ultraviolet rays as the active energy ray.

使用紫外線作為活性能量線時,硬化型樹脂組成物係以含有光聚合起始劑為佳。 When ultraviolet rays are used as the active energy ray, the curable resin composition preferably contains a photopolymerization initiator.

光聚合起始劑,係只要藉由照射紫外線而使聚合反應開始者,就沒有特別限定。作為光聚合起始劑,可舉出苯偶姻(benzoin)、苯偶姻甲醚、苯偶姻乙醚、苯偶姻異丙醚、苯偶姻-正丁醚、苯偶姻異丁醚等的苯偶姻系聚合起始劑;苯乙酮、4’-二甲基胺基苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、2,2-二乙氧基-2-苯基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、1-羥基環己基苯基酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉-丙烷-1-酮、2-羥基-1-{4-[4-(2-羥基-2-甲基-丙醯基)-苄基]苯基}-2-甲基-丙烷-1-酮等的苯乙酮系聚合起始劑;二苯基酮、4-苯基二苯基酮、4,4’-二乙胺基二苯基酮、4,4’-二環二苯基酮等的二苯基酮系聚合起始劑;2-甲基蒽醌(anthraquinone)、2-乙基蒽醌、2-第三丁基蒽醌、2-胺基蒽醌等的蒽醌系聚合起始劑;2-甲基噻吨酮(methylthioxanthone)、2-乙基噻吨酮、2-氯噻吨酮、2,4-二甲基噻吨酮、2,4-二乙基噻吨酮等的噻吨酮(thioxanthone)系聚合起始劑等。 The photopolymerization initiator is not particularly limited as long as the polymerization reaction is started by irradiation of ultraviolet rays. Examples of the photopolymerization initiator include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin-n-butyl ether, benzoin isobutyl ether, and the like. Benzoin polymerization initiator; acetophenone, 4'-dimethylaminoacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy 2-phenylacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-[4-(A Thio)phenyl]-2-morpholine-propan-1-one, 2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propenyl)-benzyl]phenyl Acetophenone-based polymerization initiator such as }-2-methyl-propan-1-one; diphenyl ketone, 4-phenyldiphenyl ketone, 4,4'-diethylaminodiphenyl ketone a diphenyl ketone polymerization initiator such as 4,4'-bicyclodiphenyl ketone; 2-methyl oxime (anthraquinone), 2-ethyl hydrazine, 2-tert-butyl fluorene, a lanthanide polymerization initiator of 2-amino guanidine; etc.; 2-methylthioxanthone, 2-ethyl thioxanthone, 2-chlorothioxanthone, 2,4-dimethylthiophene A thioxanthone polymerization initiator such as ketone or 2,4-diethylthioxanthone.

光聚合起始劑,係能夠單獨1種、或組合2種以上而使用。光聚合起始劑的含量係沒有特別限定,通常係相對於前述硬化性成分,為0.2~30質量%,較佳為0.5~20質量%。 The photopolymerization initiator can be used alone or in combination of two or more. The content of the photopolymerization initiator is not particularly limited, but is usually 0.2 to 30% by mass, preferably 0.5 to 20% by mass based on the curable component.

作為能夠藉由加熱而硬化之組成物,可舉出含有上述聚合性預聚合物和聚合性單體且而且含有熱聚合起始劑作為硬化性成分之組成物;及含有水解縮合性化合物作為硬化性成分之組成物等。 The composition which can be hardened by heating is a composition containing the polymerizable prepolymer and the polymerizable monomer and further containing a thermal polymerization initiator as a curable component; and a hydrolyzable condensable compound as a hardening Composition of sexual components, etc.

熱聚合起始劑,係只要藉由加熱而產生自由基且使聚合反應開始者,就沒有特別限定。作為熱聚合起始劑,可舉出過氧化氫;過氧二硫酸銨、過氧二硫酸鈉、過氧二硫酸鉀等的過氧二硫酸鹽;2,2’-偶氮雙(2-脒基丙烷)二鹽酸鹽、4,4’-偶氮雙(4-氰基戊酸)、2,2’-偶氮雙異丁腈、2,2’-偶氮雙(4-甲氧基-2,4-二甲基戊腈)等的偶氮系化合物;過氧化苯甲醯、過氧化月桂醯、過乙酸、過琥珀酸、過氧化二-第三丁基、第三丁基過氧化氫、異丙苯過氧化氫等的有機過氧化物等。 The thermal polymerization initiator is not particularly limited as long as it generates a radical by heating and starts the polymerization reaction. Examples of the thermal polymerization initiator include hydrogen peroxide; peroxodisulfate such as ammonium peroxodisulfate, sodium peroxodisulfate or potassium peroxydisulfate; and 2,2'-azobis (2- Mercaptopropane) dihydrochloride, 4,4'-azobis(4-cyanovaleric acid), 2,2'-azobisisobutyronitrile, 2,2'-azobis(4-A An azo compound such as oxy-2,4-dimethylvaleronitrile; benzamidine peroxide, lauric acid peroxide, peracetic acid, persuccinic acid, di-tert-butyl peroxide, third butyl An organic peroxide such as hydrogen peroxide or cumene hydroperoxide.

熱聚合起始劑,係能夠單獨1種、或組合2種以上而使用。熱聚合起始劑的含量係沒有特別限定,通常係相對於前述硬化性成分,為0.2~30質量%,較佳為0.5~20質量%。 The thermal polymerization initiator can be used alone or in combination of two or more. The content of the thermal polymerization initiator is not particularly limited, but is usually 0.2 to 30% by mass, preferably 0.5 to 20% by mass based on the curable component.

作為水解縮合性化合物,可舉出具有水解性有機基之矽烷化合物、其寡聚物(oligomer)。 The hydrolyzable condensable compound may, for example, be a decane compound having a hydrolyzable organic group or an oligomer thereof.

作為具有水解性基之矽烷化合物,可舉出四甲氧基矽烷、四乙氧基矽烷、四-正丙氧基矽烷、四異丙氧基矽烷、四-正丁氧基矽烷、四異苯氧基矽烷、四-第二丁氧基矽烷、四-第三丁氧基矽烷等的四烷氧基矽烷;氫化三甲氧基矽烷、氫化三乙氧 基矽烷、氫化三丙氧基矽烷等的氫化三烷氧基矽烷等。 Examples of the decane compound having a hydrolyzable group include tetramethoxynonane, tetraethoxydecane, tetra-n-propoxydecane, tetraisopropoxydecane, tetra-n-butoxydecane, and tetraisobenzene. a tetraalkoxy decane such as oxydecane, tetra-second butoxy decane or tetra-butoxy decane; hydrogenated trimethoxy decane, hydrogenated triethoxy A hydrogenated trialkoxy decane such as a decane or a hydrogenated tripropoxy decane.

該等矽烷化合物,係能夠單獨1種、或組合2種以上而使用。又,亦可與該等矽烷化合物同時併用烷基三烷氧基矽烷。 These decane compounds can be used alone or in combination of two or more. Further, an alkyltrialkoxydecane may be used in combination with the above decane compounds.

硬化性組成物,係除了硬化性成分以外,以含有填充劑為佳。藉由含有填充劑,能夠效率良好地控制光學調整層的折射率。 The curable composition is preferably a filler in addition to the curable component. The refractive index of the optical adjustment layer can be efficiently controlled by containing a filler.

作為填充劑,可舉出氧化矽粒子、金屬氧化物粒子、聚合物粒子、矽酸烷酯(alkylsilicate)粒子等。 Examples of the filler include cerium oxide particles, metal oxide particles, polymer particles, and alkylsilicate particles.

作為氧化矽粒子,可舉出膠態氧化矽、中空氧化矽、反應性氧化矽填料等。 Examples of the cerium oxide particles include colloidal cerium oxide, hollow cerium oxide, and a reactive cerium oxide filler.

作為金屬氧化物粒子,可舉出氧化鈦、氧化鋅、氧化鋯、氧化鉭、氧化銦、氧化鉿、氧化錫、氧化鈮等的粒子。 Examples of the metal oxide particles include particles of titanium oxide, zinc oxide, zirconium oxide, cerium oxide, indium oxide, cerium oxide, tin oxide, and cerium oxide.

作為聚合物粒子,可舉出聚(五溴苯基甲基丙烯酸酯)、聚(五溴苯基丙烯酸酯)、聚(2,4,6-三溴苯基甲基丙烯酸酯)、聚(1-萘基甲基丙烯酸酯)、聚(2,6-二氯苯乙烯)、聚(2-氯苯乙烯)等由含有鹵素原子和芳香族基的聚合物所構成之粒子。 Examples of the polymer particles include poly(pentabromophenyl methacrylate), poly(pentabromophenyl acrylate), poly(2,4,6-tribromophenyl methacrylate), and poly( A particle composed of a polymer containing a halogen atom and an aromatic group, such as 1-naphthyl methacrylate), poly(2,6-dichlorostyrene), or poly(2-chlorostyrene).

作為矽酸烷酯粒子,可舉出以式:Ra-O[-{Si(ORb)2}-O-]n-Ra(式中,Ra及Rb係表示碳數1~10的烷基,n係表示1以上的整數)表示之矽酸烷酯的粒子。 The alkyl phthalate particles are represented by the formula: R a -O[-{Si(OR b ) 2 }-O-] n -R a (wherein R a and R b represent a carbon number of 1~) The alkyl group of 10, n is an integer of 1 or more and represents the particle of the alkyl phthalate.

該等之中,因為與硬化性成分的相溶性優異且能夠效率良好地控制光學調整層的折射率,以氧化矽粒子或矽酸烷酯粒子為佳。 Among these, it is preferable that the compatibility with the curable component is excellent and the refractive index of the optical adjustment layer can be efficiently controlled, and cerium oxide particles or alkyl citrate particles are preferable.

填充劑係能夠單獨1種、或組合2種以上而使用。 The fillers can be used alone or in combination of two or more.

填充劑為粒狀物時,其平均粒徑係以2~1500nm為佳 When the filler is a granule, the average particle size is preferably from 2 to 1500 nm.

硬化性組成物係含有填充劑時,其含量係相對於硬化性組成物的固體成分總量,以5~60質量%為佳,較佳為10~50質量%。 When the curable composition contains a filler, the content thereof is preferably 5 to 60% by mass, and more preferably 10 to 50% by mass based on the total amount of the solid content of the curable composition.

硬化性組成物係在不妨礙本發明的效果之範圍,亦可含有其他成分。 The curable composition may contain other components insofar as it does not impair the effects of the present invention.

作為其他成分,可舉出調平(leveling)劑、抗靜電劑、安定劑、抗氧化劑、可塑劑、潤滑劑等。該等的含量係配合目的而適當地決定即可。 As other components, a leveling agent, an antistatic agent, a stabilizer, an antioxidant, a plasticizer, a lubricant, etc. are mentioned. These contents may be appropriately determined depending on the purpose of the mixing.

形成光學調整層之方法係沒有特別限定。例如能夠藉由調製含有硬化性組成物及根據需要的溶劑之塗佈液,其次,將該塗佈液使用習知的方法塗佈在氣體阻障層上且使所得到的塗膜硬化,來形成光學調整層。又,亦可根據需要在使塗膜硬化之前施行乾燥處理。 The method of forming the optical adjustment layer is not particularly limited. For example, a coating liquid containing a curable composition and a solvent as needed can be prepared, and then the coating liquid can be applied onto the gas barrier layer by a known method, and the obtained coating film can be cured. An optical adjustment layer is formed. Further, a drying treatment may be performed before the coating film is cured as needed.

作為調製塗佈液所使用的溶劑,可舉出苯、甲苯等的芳香族烴系溶劑;乙酸乙酯、乙酸丁酯等的酯系溶劑;丙酮、甲基乙基酮、甲基異丁基酮等的酮系溶劑;正戊烷、正己烷、正庚烷等的脂肪族烴系溶劑;環戊烷。環己烷等的脂環式烴系溶劑等。 Examples of the solvent to be used in the preparation of the coating liquid include aromatic hydrocarbon solvents such as benzene and toluene; ester solvents such as ethyl acetate and butyl acetate; acetone, methyl ethyl ketone, and methyl isobutyl. a ketone solvent such as a ketone; an aliphatic hydrocarbon solvent such as n-pentane, n-hexane or n-heptane; or cyclopentane. An alicyclic hydrocarbon solvent such as cyclohexane or the like.

該等溶劑係能夠單獨1種、或組合2種以上而使用。 These solvents can be used alone or in combination of two or more.

作為塗佈方法,可舉出棒塗佈法、旋轉塗佈法、浸漬法、輥塗佈、凹版塗佈、刮刀塗佈、空氧刮刀塗佈、輥筒刮刀塗佈、模塗佈、網版印刷法、噴霧塗佈、凹版轉印法等。 Examples of the coating method include a bar coating method, a spin coating method, a dipping method, a roll coating method, a gravure coating method, a knife coating method, an air oxygen blade coating method, a roll blade coating method, a die coating method, and a net coating method. Printing method, spray coating, gravure transfer method, and the like.

使塗膜乾燥時,作為其乾燥方法,能夠採用熱風乾燥、熱輥乾燥、紅外線照射等先前習知的乾燥方法。乾燥溫 度係通常為60~130℃的範圍。乾燥時間係通常為數秒至數十分鐘。 When the coating film is dried, as a drying method, a conventional drying method such as hot air drying, hot roll drying, or infrared irradiation can be employed. Drying temperature The degree is usually in the range of 60 to 130 °C. The drying time is usually from several seconds to several tens of minutes.

塗膜的硬化係能夠配合所使用的硬化性組成物,藉由照射活性能量線、或加熱而進行。 The curing of the coating film can be carried out by irradiating the active energy ray or heating by blending the curable composition to be used.

例如,照射紫外線時,作為紫外線源,能夠使用超高壓水銀燈、高壓水銀燈、低壓水銀燈、碳弧(carbon arc)、黑光燈、金屬鹵素燈等的光源。紫外線的劑量係沒有特別限制,通常100mJ/cm2~1,000mJ/cm2。照射時間係通常數秒~數小時,照射溫度係通常為室溫~100℃ For example, when ultraviolet rays are irradiated, a light source such as an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc, a black light, or a metal halide lamp can be used as the ultraviolet light source. The dose of ultraviolet rays is not particularly limited and is usually from 100 mJ/cm 2 to 1,000 mJ/cm 2 . The irradiation time is usually several seconds to several hours, and the irradiation temperature is usually room temperature to 100 ° C.

光學調整層的厚度係通常為5~2500nm,較佳為10~2000nm。 The thickness of the optical adjustment layer is usually 5 to 2,500 nm, preferably 10 to 2000 nm.

光學調整層的折射率為1.20~1.60,較佳為1.35~1.55。 The refractive index of the optical adjustment layer is from 1.20 to 1.60, preferably from 1.35 to 1.55.

光學調整層的光學膜厚係通常為5~2000nm,較佳為10~1500nm。光學膜厚係將光學調整層的折射率設為n,將厚度設為d時,以n×d(=nd)表示之值。 The optical film thickness of the optical adjustment layer is usually 5 to 2,000 nm, preferably 10 to 1,500 nm. The optical film thickness is a value represented by n × d (= nd) when the refractive index of the optical adjustment layer is n and the thickness is d.

藉由將光學調整層的光學膜厚在上述範圍內適當地調節,能夠得到具有優異的無色透明性之氣體阻障性積層體。通常,已知b*係相對於光學調整層的光學膜厚之變化,而周期性地產生變化。本發明者等發現光學調整層的光學膜厚T係滿足特定的關係式時,能夠效率良好地得到b*值為-1.00~1.00的氣體阻障性積層體。 By appropriately adjusting the optical film thickness of the optical adjustment layer within the above range, a gas barrier layered product having excellent colorless transparency can be obtained. In general, it is known that the b* is periodically changed with respect to the change in the optical film thickness of the optical adjustment layer. When the inventors of the present invention found that the optical film thickness T of the optical adjustment layer satisfies a specific relationship, it is possible to efficiently obtain a gas barrier layered product having a b* value of -1.00 to 1.00.

將基材及氣體阻障層的種類及該等的膜厚為一定值時之光學調整層的光學膜厚與氣體阻障性積層體的b*之關係,顯示在第1圖。 The relationship between the optical film thickness of the optical adjustment layer and the b* of the gas barrier layered product when the type of the substrate and the gas barrier layer are constant and the film thicknesses of these are shown in Fig. 1 is shown in Fig. 1.

第1圖(a)的橫軸係採用光學調整層的光學膜厚,縱軸係採用氣體阻障性積層體的b*。光學調整層的光學膜厚小於760nm時,氣體阻障性積層體的b*係隨著光學調整層的光學膜厚増加,而顯示重複減少與増加之周期性變化。另一方面、得知光學調整層的光學膜厚為760nm以上時,氣體阻障性積層體的b*係落入-1~1之間,氣體阻障性積層體的b*係幾乎不依存於光學調整層的光學膜厚。 In the horizontal axis of Fig. 1(a), the optical thickness of the optical adjustment layer is used, and the vertical axis is b* of the gas barrier laminate. When the optical film thickness of the optical adjustment layer is less than 760 nm, the b* system of the gas barrier layered product is increased in accordance with the optical film thickness of the optical adjustment layer, and the periodic variation of the repetition reduction and the addition is exhibited. On the other hand, when the optical thickness of the optical adjustment layer is 760 nm or more, the b* system of the gas barrier laminate falls between -1 and 1, and the b* system of the gas barrier laminate is hardly dependent. The optical film thickness of the optical adjustment layer.

在第1圖(b),係顯示第1圖(a)中的光學膜厚為0~約900nm的範圍之擴大圖。從第1圖(b),在顯示周期性變化之範圍(光學調整層的光學膜厚小於760nm),氣體阻障性積層體的b*成為-1~1之光學膜厚的範圍係如以下。範圍1:30~100nm、範圍2:120~170nm、範圍3:280~310nm、範圍4:380~410nm、範圍5:520~550nm、範圍6:620~660nm。 In Fig. 1(b), an enlarged view showing a range in which the optical film thickness in Fig. 1(a) is from 0 to about 900 nm is shown. From the first graph (b), in the range in which the periodic change is displayed (the optical film thickness of the optical adjustment layer is less than 760 nm), the range of the b* of the gas barrier layered product to be -1 to 1 is as follows. . Range 1: 30 ~ 100nm, range 2: 120 ~ 170nm, range 3: 280 ~ 310nm, range 4: 380 ~ 410nm, range 5: 520 ~ 550nm, range 6: 620 ~ 660nm.

其次,各自標繪範圍1~6的最大值及最小值,且將各自表示最大值及最小值的近似直線之圖表顯示在第2圖。橫軸係採用範圍的號碼,縱軸係採用光學調整層的光學膜厚。 Next, the maximum and minimum values of the range 1 to 6 are plotted, and a graph showing the approximate straight line indicating the maximum value and the minimum value is shown in Fig. 2 . The horizontal axis is the number of the range, and the vertical axis is the optical film thickness of the optical adjustment layer.

從第2圖,得知在各自範圍之最大值的近似直線成為y=115.43x-37.3,最小值的近似直線成為y=121.43x-100。(x為1~6的整數,y為光學調整層的光學膜厚)。 From Fig. 2, it is found that the approximate straight line at the maximum value of each range becomes y = 115.43x - 37.3, and the approximate straight line of the minimum value becomes y = 12.14x - 100. (x is an integer from 1 to 6, and y is the optical film thickness of the optical adjustment layer).

從以上的情形,在範圍1~6的各自範圍,只要光學膜厚T係在上述最大值的近似曲線與上述最小值的近似曲線之間的範圍,就能夠效率良好地得到b*值為-1.00~1.00的氣體阻障性積層體。 From the above, in the respective ranges of the range of 1 to 6, as long as the optical film thickness T is in the range between the approximate curve of the maximum value and the approximate curve of the minimum value, the b* value can be efficiently obtained - A gas barrier laminate of 1.00 to 1.00.

亦即,藉由將光學整調層,以其光學膜厚T(nm) 為滿足以下述式(1)或(2)[數2]121.43x-100≦T≦115.43x-37.33 (1) 760≦T≦2000 (2) That is, by optically conditioning the layer with its optical film thickness T (nm) To satisfy the following formula (1) or (2) [number 2] 121.43x-100≦T≦115.43x-37.33 (1) 760≦T≦2000 (2)

(x係表示1~6的整數)之方式設置,能夠效率良好地得到b*值為-1.00~1.00的氣體阻障性積層體。 (x is an integer of 1 to 6), and it is possible to efficiently obtain a gas barrier layered product having a b* value of -1.00 to 1.00.

(4)氣體阻障性積層體 (4) Gas barrier laminate

本發明的氣體阻障性積層體係將基材、氣體阻障層及光學調整層依照此順序層積而成,且前述氣體阻障層與光學調整層為鄰接之氣體阻障性積層體,其特徵在於:前述氣體阻障層的折射率為1.55~1.81,前述光學調整層的折射率為1.20~1.60,而且在JIS Z 8729-1994所規定的CIE L*a*b*表色系之b*值為-1.00~1.00的範圍。 In the gas barrier layering system of the present invention, the substrate, the gas barrier layer and the optical adjustment layer are laminated in this order, and the gas barrier layer and the optical adjustment layer are adjacent to each other, and the gas barrier layer is adjacent to the gas barrier layer. The gas barrier layer has a refractive index of 1.55 to 1.81, and the optical adjustment layer has a refractive index of 1.20 to 1.60, and the CIE L*a*b* color system defined in JIS Z 8729-1994 *The value is in the range of -1.00 to 1.00.

藉由將具有上述折射率之氣體阻障層及光學調整層適當地組合而使用,利用在光學調整層的表面反射後的反射光、和在光學調整層與氣體阻障層的界面反射後的反射光之干涉現象,能夠效率良好地抑制氣體阻障性積層體呈現黃色。 By using a gas barrier layer and an optical adjustment layer having the above refractive index as appropriate, the reflected light reflected on the surface of the optical adjustment layer and the interface between the optical adjustment layer and the gas barrier layer are reflected. The interference phenomenon of the reflected light can effectively suppress the gas barrier layered body from appearing yellow.

本發明的氣體阻障性積層體之氣體阻障層和光學調整層,係可以各自具有1層,亦可以各自具有2層以上。 The gas barrier layer and the optical adjustment layer of the gas barrier layered product of the present invention may each have one layer or two or more layers.

本發明的氣體阻障性積層體,亦可具有基材、氣體阻障層、光學調整層以外之層。 The gas barrier layered product of the present invention may have a layer other than the substrate, the gas barrier layer, and the optical adjustment layer.

作為基材、氣體阻障層、光學調整層以外之層,可舉出用以使與基材的層間黏著性提升之底漆(primer)層、導電體層、 衝擊吸收層、黏著劑層、硬塗層、製程薄片等。又,製程薄片係在將積層體保存、搬運等之時,具有保護積層體之作用且在使用積層體時係被剝離。 Examples of the layer other than the substrate, the gas barrier layer, and the optical adjustment layer include a primer layer and a conductor layer for improving the interlayer adhesion to the substrate. Impact absorbing layer, adhesive layer, hard coat layer, process sheet, and the like. Further, the process sheet has a function of protecting the laminate when the laminate is stored and conveyed, and is peeled off when the laminate is used.

作為本發明的氣體阻障性積層體的層構成之例子,能夠舉出如以下之物,但是不被該等限定。 Examples of the layer constitution of the gas barrier layered product of the present invention include the following, but are not limited thereto.

(i)光學調整層/氣體阻障層/基材 (i) Optical adjustment layer / gas barrier layer / substrate

(ii)光學調整層/氣體阻障層/基材/硬塗層 (ii) Optical adjustment layer / gas barrier layer / substrate / hard coating

(iii)光學調整層/氣體阻障層/光學調整層/氣體阻障層/基材 (iii) Optical adjustment layer / gas barrier layer / optical adjustment layer / gas barrier layer / substrate

(iv)光學調整層/氣體阻障層/底漆層/基材 (iv) Optical adjustment layer / gas barrier layer / primer layer / substrate

(v)光學調整層/氣體阻障層/底漆層/基材/硬塗層 (v) Optical adjustment layer / gas barrier layer / primer layer / substrate / hard coating

本發明的氣體阻障性積層體,係例如能夠使用以下的方法來製造。 The gas barrier layered product of the present invention can be produced, for example, by the following method.

在基材上,使用在前面已說明的方法形成氣體阻障層。其次,藉由在所得到的氣體阻障層上,使用在前面已說明的方法形成光學調整層,而能夠得到具有光學調整層/氣體阻障層/基材的層構成之氣體阻障性積層體。 On the substrate, a gas barrier layer is formed using the method previously described. Next, by forming an optical adjustment layer on the obtained gas barrier layer by the method described above, a gas barrier layer having a layer of an optical adjustment layer/gas barrier layer/substrate can be obtained. body.

藉由同樣地進行且設置適當必要的步驟,而能夠得到具有前述(ii)~(v)的層構成之氣體阻障性積層體等。 A gas barrier layered product or the like having the layer structure of the above (ii) to (v) can be obtained by performing the same steps as necessary in the same manner.

本發明的氣體阻障性積層體的厚度,係沒有特別限定,以1~1000μm為佳,較佳為10~500μm,更佳為50~100μm。 The thickness of the gas barrier layered product of the present invention is not particularly limited, and is preferably 1 to 1000 μm, more preferably 10 to 500 μm, still more preferably 50 to 100 μm.

本發明的氣體阻障性積層體之在溫度40℃、相對濕度90%之水蒸氣透過率,係以0.1g/(m2.day)以下為佳,較佳 為0.05g/(m2.day)以下,更佳為0.03g/(m2.day)以下。下限值係沒有特別限定,越小越佳,但是通常為0.001g/(m2.day)以上。 The gas barrier layer of the gas barrier laminate of the present invention preferably has a water vapor transmission rate of 40 ° C and a relative humidity of 90%, preferably 0.1 g / (m 2 · day) or less, preferably 0.05 g / (m 2 . The following is more preferably 0.03 g/(m 2 .day) or less. The lower limit is not particularly limited, and is preferably as small as possible, but is usually 0.001 g/(m 2 .day) or more.

水蒸氣透過率係能夠使用在實施例所記載之方法來測定。 The water vapor transmission rate can be measured by the method described in the examples.

本發明的氣體阻障性積層體係在JIS Z 8729-1994所規定的CIE L*a*b*表色系之b*值,以-1.00~1.00為佳,較佳為-0.80~0.80。b*值係表示將顏色數值化後之呈現黃色及呈現藍色的程度。b*值為正值時係表示呈現黃色,負值時係表示呈現藍色。藉由b*值為上述範圍,該氣體阻障性積層體係呈現更靠近黃色與藍色的中間之色相。b*值係能夠藉由按照所形成的氣體阻障層之折射率,設置適當的光學膜厚之光學調整層來控制。 The gas barrier layered system of the present invention has a b* value of the CIE L*a*b* color system specified in JIS Z 8729-1994, preferably -1.00 to 1.00, more preferably -0.80 to 0.80. The b* value indicates the degree to which the color is yellowed and blued. When the b* value is positive, it means yellow, and when it is negative, it means blue. By the b* value being the above range, the gas barrier laminated system exhibits a hue closer to the middle of yellow and blue. The b* value can be controlled by providing an optical adjustment layer of an appropriate optical film thickness in accordance with the refractive index of the formed gas barrier layer.

又,本發明的氣體阻障性積層體係在JIS Z 8729-1994所規定的CIE L*a*b*表色系之a*值,以-1.00~1.00為佳,較佳為-0.80~0.80。a*值係表示將顏色數值化後之呈現紅色及呈現綠色的程度。a*值為正值時係表示呈現紅色,負值時係表示呈現綠色。藉由a*值為上述範圍,該氣體阻障性積層體係呈現更靠近紅色與綠色的中間之色相。此種氣體阻障性積層體係能夠適合使用作為具有發光元件之電子裝置用構件。 Further, the gas barrier layered system of the present invention has an a* value of the CIE L*a*b* color system specified in JIS Z 8729-1994, preferably -1.00 to 1.00, preferably -0.80 to 0.80. . The a* value indicates the degree to which the color is digitized to appear red and appear green. When the a* value is positive, it means red, and when it is negative, it means green. By the a* value being in the above range, the gas barrier laminated system exhibits a hue closer to the middle of red and green. Such a gas barrier layered system can be suitably used as a member for an electronic device having a light-emitting element.

a*值係能夠藉由適當地選擇所使用的樹脂和其他成分來控制。 The a* value can be controlled by appropriately selecting the resin and other components used.

在JIS Z 8729-1994所規定的CIE L*a*b*表色系之b*值和a*值,係能夠使用在實施例所記載的方法來測定。 The b* value and the a* value of the CIE L*a*b* color system defined in JIS Z 8729-1994 can be measured by the method described in the examples.

因為具有該等特性,所以本發明的氣體阻障性積層體係能夠適合使用作為電子裝置用構件。 Because of these characteristics, the gas barrier layered system of the present invention can be suitably used as a member for an electronic device.

2)電子裝置用構件及電子裝置 2) Components and electronic devices for electronic devices

本發明的電子裝置用構件,其特徵在於由本發明的氣體阻障性積層體所構成。因而,因為本發明的電子裝置用構件係具有優異的氣體阻障性,所以能夠防止因水蒸氣等的氣體所致之元件產生劣化。又,因為具有優異的無色透明性,所以適合作為液晶顯示器、EL顯示器等的顯示器構件等。 The member for an electronic device of the present invention is characterized by comprising the gas barrier layered product of the present invention. Therefore, since the member for an electronic device of the present invention has excellent gas barrier properties, it is possible to prevent deterioration of components due to gas such as water vapor. Moreover, since it has excellent colorless transparency, it is suitable as a display member of a liquid crystal display, an EL display, etc.

本發明的電子裝置係具備本發明的電子裝置用構件。作為具體例,可舉出液晶顯示器、有機EL顯示器、無機EL顯示器、電子紙、太陽電池等。 The electronic device of the present invention includes the member for an electronic device of the present invention. Specific examples thereof include a liquid crystal display, an organic EL display, an inorganic EL display, an electronic paper, a solar battery, and the like.

因為本發明的電子裝置係具備由本發明的氣體阻障性積層體所構成之電子裝置用構件,所以具有優異的氣體阻障性。 Since the electronic device of the present invention includes the member for an electronic device including the gas barrier layered product of the present invention, it has excellent gas barrier properties.

[實施例] [Examples]

以下,舉出實施例而更詳細地說明本發明。但是本發明係完全不被以下的實施例限定。 Hereinafter, the present invention will be described in more detail by way of examples. However, the present invention is not limited at all by the following examples.

各例中的份及%係只要未特別告知,就是質量基準。 The parts and % in each case are the quality basis unless otherwise specified.

(化合物) (compound)

將在各例所使用的化合物和材料顯示在以下。 The compounds and materials used in the respective examples are shown below.

.基材(1):聚對酞酸乙二酯薄膜(東洋紡織公司製、商品名:COSMOSHINE A4100、厚度50μm) . Substrate (1): Polyethylene terephthalate film (manufactured by Toyobo Co., Ltd., trade name: COSMOSHINE A4100, thickness 50 μm)

.聚矽氮烷化合物系塗佈劑(1):(CLARIANT JAPAN公司製、商品名:Aquamika NL110-20、固體成分20%) . Polyazide compound coating agent (1): (manufactured by CLARIANT JAPAN, trade name: Aquamika NL110-20, solid content 20%)

.硬化性成分(1):胺甲酸酯丙烯酸酯寡聚物(荒川工業股份公司製、商品名:Beamset 575VCB) . Hardening component (1): urethane acrylate oligomer (Arakawa Industrial Co., Ltd., trade name: Beamset 575VCB)

.硬化性成分(2):UV硬化型硬塗劑(大日精化工業公司 製、商品名:SEIKABEAM EXF-01L(NS)) . Hardening component (2): UV hardening type hard coating agent (Dai Ri Jinghua Industrial Co., Ltd. System, trade name: SEIKABEAM EXF-01L (NS))

.調平劑(1):丙烯酸系共聚物(BYK-Chemie Japan公司製、商品名:BYK 355) . Leveling agent (1): Acrylic copolymer (BYK-Chemie Japan, trade name: BYK 355)

.填充劑(1):中空狀氧化矽微粒子(日揮觸媒化成公司製、商品名:Thrulya4320) . Filler (1): hollow cerium oxide fine particles (manufactured by Nisshin Chemical Co., Ltd., trade name: Thrulya 4320)

.填充劑(2):氧化鋯(日產化學工業公司製、商品名:Nano Youth OZ-S 30K) . Filler (2): Zirconia (manufactured by Nissan Chemical Industries, Ltd., trade name: Nano Youth OZ-S 30K)

.光聚合起始劑(1):(BASF公司製、商品名:IRGACURE907) . Photopolymerization initiator (1): (manufactured by BASF Corporation, trade name: IRGACURE 907)

.光學調整層形成材料(2):UV硬化型硬塗劑(含有聚合性成分、作為填充劑之氧化矽微粒子、及光聚合起始劑之硬化性組成物、JSR公司製、商品名:Opstar Z 7530、硬化物的折射率:1.49) . Optical adjustment layer forming material (2): UV-curable hard coating agent (curable composition containing a polymerizable component, cerium oxide microparticles as a filler, and a photopolymerization initiator), manufactured by JSR Corporation, trade name: Opstar Z 7530, refractive index of hardened material: 1.49)

.光學調整層形成材料(3):矽氧烷系熱硬化型樹脂(COLCOAT公司製、商品名:COLCOAT P。硬化物的折射率:1.43) . Optical adjustment layer forming material (3): a siloxane-based thermosetting resin (manufactured by COLCOAT, trade name: COLCOAT P. Refractive index: 1.43)

(氣體阻障層及光學調整層的厚度的測定) (Measurement of Thickness of Gas Barrier Layer and Optical Adjustment Layer)

在實施例及比較例所得到的氣體阻障性積層體之氣體阻障層及光學調整層的厚度,係使用觸針式段差計(AMBIOS TECNOLOGY公司製、XP-1)而測定。 The thicknesses of the gas barrier layer and the optical adjustment layer of the gas barrier layered product obtained in the examples and the comparative examples were measured using a stylus type step meter (manufactured by AMBIOS TECNOLOGY, XP-1).

(氣體阻障層及光學調整層的折射率之測定) (Measurement of refractive index of gas barrier layer and optical adjustment layer)

在實施例及比較例所得到的氣體阻障性積層體之氣體阻障層及光學調整層的折射率,係使用橢圓偏光計(ellipsometer)(J.A.Woollam Japan公司製、商品名:分光 Ellipsometry-2000U)而測定。 The refractive index of the gas barrier layer and the optical adjustment layer of the gas barrier layered product obtained in the examples and the comparative examples was an ellipsometer (manufactured by J.A. Woollam Japan Co., Ltd., trade name: spectroscopic light). Determined by Ellipsometry-2000U).

[製造例1] [Manufacturing Example 1]

將硬化性成分(1)10份、調平劑(1)0.01份、填充劑(1)49份、光聚合起始劑(1)0.1份、甲基異丁基酮1250份、環己酮1250份均勻地混合,而得到光學調整層形成材料(1)。光學調整層形成材料(1)的硬化物之折射率為1.37。 10 parts of curable component (1), 0.01 part of leveling agent (1), 49 parts of filler (1), 0.1 part of photopolymerization initiator (1), 1,250 parts of methyl isobutyl ketone, cyclohexanone 1250 parts were uniformly mixed to obtain an optical adjustment layer forming material (1). The cured product of the optical adjustment layer forming material (1) had a refractive index of 1.37.

[製造例2] [Manufacturing Example 2]

將硬化性成分(2)10份、調平劑(1)0.01份、填充劑(2)133份、光聚合起始劑(1)0.3份、甲基異丁基酮1440份、環己酮1440份均勻地混合,而得到光學調整層形成材料(4)。光學調整層形成材料(4)的硬化物之折射率為1.61。 10 parts of curable component (2), 0.01 part of leveling agent (1), 133 parts of filler (2), 0.3 parts of photopolymerization initiator (1), 1440 parts of methyl isobutyl ketone, cyclohexanone 1440 parts were uniformly mixed to obtain an optical adjustment layer forming material (4). The cured product of the optical adjustment layer forming material (4) had a refractive index of 1.61.

[實施例1] [Example 1]

使用旋轉塗佈法在基材(1)上塗佈聚矽氮烷化合物系塗佈劑(1),將所得到的塗膜在120℃加熱2分鐘而形成厚度150nm之含有全氫聚矽氮烷之聚矽氮烷層。其次,使用電漿離子植入裝置而在聚矽氮烷層的表面,在下述的條件下將氬(Ar)電漿離子植入而形成氣體阻障層(折射率:1.62、厚度150nm)。 The polyazinane compound-based coating agent (1) was applied onto the substrate (1) by a spin coating method, and the obtained coating film was heated at 120 ° C for 2 minutes to form a perhydropolyazide nitrogen having a thickness of 150 nm. a polydecazane layer of an alkane. Next, an argon (Ar) plasma was ion-implanted on the surface of the polyazide layer using a plasma ion implantation apparatus under the following conditions to form a gas barrier layer (refractive index: 1.62, thickness 150 nm).

在氣體阻障層上,將在製造例1所得到的光學調整層形成材料(1)使用棒塗佈法塗佈且將所得到的塗膜在70℃乾燥1分鐘之後,使用UV光照射生產線而進行UV光照射(高壓水銀燈;生產線速度、20m/分鐘;累計劑量、100mJ/cm2;尖峰強度、1.466W;通過次數、2次),來形成光學調整層(膜厚:20nm、光學膜厚:28nm)而得到氣體阻障性積層體1。 On the gas barrier layer, the optical adjustment layer forming material (1) obtained in Production Example 1 was applied by a bar coating method and the obtained coating film was dried at 70 ° C for 1 minute, and then a UV light irradiation line was used. UV light irradiation (high pressure mercury lamp; production line speed, 20 m/min; cumulative dose, 100 mJ/cm 2 ; peak intensity, 1.466 W; number of passes, 2 times) was used to form an optical adjustment layer (film thickness: 20 nm, optical film). Thickness: 28 nm) to obtain a gas barrier layered body 1.

用以形成氣體阻障層所使用的電漿離子植入裝置 及離子植入條件係如以下。 Plasma ion implantation device used to form a gas barrier layer And ion implantation conditions are as follows.

(電漿離子植入裝置) (plasma ion implantation device)

RF電源:日本電子公司製、型號「RF」56000 RF power supply: Japan Electronics Corporation, model "RF" 56000

高電壓脈衝電源:栗田製作所公司製、「PV-3-HSHV-0835」 High-voltage pulse power supply: "PV-3-HSHV-0835" manufactured by Kurita Manufacturing Co., Ltd.

(電漿離子植入條件) (plasma ion implantation conditions)

處理室-內壓:0.2Pa Processing chamber - internal pressure: 0.2Pa

電漿生成氣體:氬 Plasma generating gas: argon

氣體流量:100sccm Gas flow: 100sccm

RF輸出功率:1000W RF output power: 1000W

RF頻率:1000Hz RF frequency: 1000Hz

RF脈衝幅度:50μsec RF pulse amplitude: 50μsec

RF delay:25μsec RF delay: 25μsec

DC電壓:-6kV DC voltage: -6kV

DC頻率:1000Hz DC frequency: 1000Hz

DC脈衝幅度:5μsec DC pulse amplitude: 5μsec

DC delay:50μsec DC delay: 50μsec

Duty比:0.5 Duty ratio: 0.5

處理時間:200sec Processing time: 200sec

[實施例2] [Embodiment 2]

除了使用光學調整層形成材料(2)代替在實施例1中的光學調整層形成材料(1)而形成光學調整層(膜厚:50nm、光學膜厚:75nm)以外,係使用與實施例1同樣的方法,來得到氣體阻障性積層體2。 The optical adjustment layer (film thickness: 50 nm, optical film thickness: 75 nm) was formed by using the optical adjustment layer forming material (2) instead of the optical adjustment layer forming material (1) in Example 1, and was used in the same manner as in Example 1. In the same manner, the gas barrier layered body 2 is obtained.

[實施例3] [Example 3]

除了將在實施例1中的光學調整層的膜厚變更成為90nm(光學膜厚:124nm)以外,係使用與實施例1同樣的方法,來得到氣體阻障性積層體3。 The gas barrier layered product 3 was obtained in the same manner as in Example 1 except that the film thickness of the optical adjustment layer in Example 1 was changed to 90 nm (optical film thickness: 124 nm).

[實施例4] [Example 4]

除了將在實施例1中的光學調整層的膜厚變更成為120nm(光學膜厚:165nm)以外,係使用與實施例1同樣的方法,來得到氣體阻障性積層體4。 The gas barrier layered product 4 was obtained in the same manner as in Example 1 except that the film thickness of the optical adjustment layer in Example 1 was changed to 120 nm (optical film thickness: 165 nm).

[實施例5] [Example 5]

除了藉由塗佈光學調整層形成材料(3)代替在實施例1中的光學調整層形成材料(1),將所得到的塗膜在100℃加熱1分鐘而使其硬化,來形成光學調整層(膜厚:200nm、光學膜厚:286nm)以外,係使用與實施例1同樣的方法而得到氣體阻障性積層體5。 The optical film was formed by coating the optical adjustment layer forming material (3) instead of the optical adjustment layer forming material (1) in Example 1, and heating the obtained coating film at 100 ° C for 1 minute to form an optical adjustment. The gas barrier layered product 5 was obtained in the same manner as in Example 1 except that the layer (film thickness: 200 nm, optical film thickness: 286 nm).

[實施例6] [Embodiment 6]

除了將在實施例1中的光學調整層的膜厚變更成為220nm(光學膜厚:302nm)以外,係使用與實施例1同樣的方法,來得到氣體阻障性積層體6。 The gas barrier layered product 6 was obtained in the same manner as in Example 1 except that the film thickness of the optical adjustment layer in Example 1 was changed to 220 nm (optical film thickness: 302 nm).

[實施例7] [Embodiment 7]

除了將在實施例1中的光學調整層的膜厚變更成為280nm(光學膜厚:385nm)以外,係使用與實施例1同樣的方法,來得到氣體阻障性積層體7。 The gas barrier layered product 7 was obtained in the same manner as in Example 1 except that the film thickness of the optical adjustment layer in Example 1 was changed to 280 nm (optical film thickness: 385 nm).

[實施例8] [Embodiment 8]

除了將在實施例1中的光學調整層的膜厚變更成為295nm(光學膜厚:405nm)以外,係使用與實施例1同樣的方 法,來得到氣體阻障性積層體8。 The same method as in Example 1 was used except that the film thickness of the optical adjustment layer in Example 1 was changed to 295 nm (optical film thickness: 405 nm). The gas barrier layer 8 is obtained by a method.

[實施例9] [Embodiment 9]

除了將在實施例1中的光學調整層的膜厚變更成為380nm(光學膜厚:522nm)以外,係使用與實施例1同樣的方法,來得到氣體阻障性積層體9。 The gas barrier layered product 9 was obtained in the same manner as in Example 1 except that the film thickness of the optical adjustment layer in Example 1 was changed to 380 nm (optical film thickness: 522 nm).

[實施例10] [Embodiment 10]

除了將在實施例1中的光學調整層的膜厚變更成為390nm(光學膜厚:536nm)以外,係使用與實施例1同樣的方法,來得到氣體阻障性積層體10。 The gas barrier layered product 10 was obtained in the same manner as in Example 1 except that the film thickness of the optical adjustment layer in Example 1 was changed to 390 nm (optical film thickness: 536 nm).

[實施例11] [Example 11]

除了將在實施例1中的光學調整層的膜厚變更成為460nm(光學膜厚:632nm)以外,係使用與實施例1同樣的方法,來得到氣體阻障性積層體11。 The gas barrier layered product 11 was obtained in the same manner as in Example 1 except that the film thickness of the optical adjustment layer in Example 1 was changed to 460 nm (optical film thickness: 632 nm).

[實施例12] [Embodiment 12]

除了將在實施例1中的光學調整層的膜厚變更成為475nm(光學膜厚:652nm)以外,係使用與實施例1同樣的方法,來得到氣體阻障性積層體12。 The gas barrier layered product 12 was obtained in the same manner as in Example 1 except that the film thickness of the optical adjustment layer in Example 1 was changed to 475 nm (optical film thickness: 652 nm).

[實施例13] [Example 13]

除了將在實施例1中的光學調整層的膜厚變更成為555nm(光學膜厚:762nm)以外,係使用與實施例1同樣的方法,來得到氣體阻障性積層體13。 The gas barrier layered product 13 was obtained in the same manner as in Example 1 except that the film thickness of the optical adjustment layer in Example 1 was changed to 555 nm (optical film thickness: 762 nm).

[比較例1] [Comparative Example 1]

將實施例1的氣體阻障性積層體1之製造中間體[由基材(1)與氣體阻障層所構成之薄膜]設作比較例1的氣體阻障性積層 體14。 The production intermediate of the gas barrier layered product 1 of Example 1 [film composed of the substrate (1) and the gas barrier layer] was used as the gas barrier layer of Comparative Example 1. Body 14.

[比較例2] [Comparative Example 2]

除了將在實施例5中的光學調整層的膜厚變更成為70nm(光學膜厚:100nm)以外,係使用與實施例5同樣的方法,來得到氣體阻障性積層體15。 The gas barrier layered product 15 was obtained in the same manner as in Example 5 except that the film thickness of the optical adjustment layer in Example 5 was changed to 70 nm (optical film thickness: 100 nm).

[比較例3] [Comparative Example 3]

除了將在實施例2中的光學調整層的膜厚變更成為150nm(光學膜厚:224nm)以外,係使用與實施例2同樣的方法,來得到氣體阻障性積層體16。 The gas barrier layered product 16 was obtained in the same manner as in Example 2 except that the film thickness of the optical adjustment layer in Example 2 was changed to 150 nm (optical film thickness: 224 nm).

[比較例4] [Comparative Example 4]

除了將在實施例1中的光學調整層的膜厚變更成為270nm(光學膜厚:371nm)以外,係使用與實施例1同樣的方法,來得到氣體阻障性積層體17。 The gas barrier layered product 17 was obtained in the same manner as in Example 1 except that the film thickness of the optical adjustment layer in Example 1 was changed to 270 nm (optical film thickness: 371 nm).

[比較例5] [Comparative Example 5]

除了將在實施例2中的光學調整層的膜厚變更成為300nm(光學膜厚:448nm)以外,係使用與實施例2同樣的方法,來得到氣體阻障性積層體18。 The gas barrier layered product 18 was obtained in the same manner as in Example 2 except that the film thickness of the optical adjustment layer in Example 2 was changed to 300 nm (optical film thickness: 448 nm).

[比較例6] [Comparative Example 6]

除了將在實施例2中的光學調整層的膜厚變更成為400nm(光學膜厚:597nm)以外,係使用與實施例2同樣的方法,來得到氣體阻障性積層體19。 The gas barrier layered product 19 was obtained in the same manner as in Example 2 except that the film thickness of the optical adjustment layer in Example 2 was changed to 400 nm (optical film thickness: 597 nm).

[比較例7] [Comparative Example 7]

除了將在實施例5中的光學調整層的膜厚變更成為505nm(光學膜厚:723nm)以外,係使用與實施例5同樣的方 法,來得到氣體阻障性積層體20。 The same method as in Example 5 was used except that the film thickness of the optical adjustment layer in Example 5 was changed to 505 nm (optical film thickness: 723 nm). The gas barrier layered body 20 is obtained by the method.

[比較例8] [Comparative Example 8]

除了將在實施例4中形成氣體阻障層時的DC電壓變更成為-9kV且形成折射率為1.82的氣體阻障層以外,係使用與實施例4同樣的方法,來得到阻障性積層體21。 A barrier layered body was obtained in the same manner as in Example 4 except that the DC voltage at the time of forming the gas barrier layer in Example 4 was changed to -9 kV and a gas barrier layer having a refractive index of 1.82 was formed. twenty one.

[比較例9] [Comparative Example 9]

除了使用光學調整層形成材料(4)代替在實施例5中的光學調整層形成材料(3)而形成光學調整層(膜厚:178nm、光學膜厚:286nm)以外,係使用與實施例5同樣的方法,來得到阻障性積層體22。 The optical adjustment layer (film thickness: 178 nm, optical film thickness: 286 nm) was formed by using the optical adjustment layer forming material (4) instead of the optical adjustment layer forming material (3) in Example 5, and was used in the same manner as in Example 5. In the same manner, the barrier laminate 22 is obtained.

[參考例1] [Reference Example 1]

係除了將在比較例1中的聚矽氮烷化合物系塗佈劑(1)的塗膜之加熱條件變更成為在120℃加熱30分鐘且形成折射率為1.54的氣體阻障層以外,係使用與比較例1同樣的方法來得到氣體阻障性積層體23。 In addition to changing the heating conditions of the coating film of the polyazide compound coating agent (1) in Comparative Example 1 to a gas barrier layer which was heated at 120 ° C for 30 minutes and formed to have a refractive index of 1.54, it was used. The gas barrier layered product 23 was obtained in the same manner as in Comparative Example 1.

針對氣體阻障性積層體1~23,進行以下的測定。 The following measurements were performed on the gas barrier laminates 1 to 23.

(水蒸氣透過率測定) (Measurement of water vapor transmission rate)

使用水蒸氣透過率測定裝置(mocon公司製、PERMATRAN-W3/33),測定在溫度40℃、相對濕度90%之氣體阻障性積層體1~20的水蒸氣透過率。 The water vapor transmission rate of the gas barrier laminates 1 to 20 at a temperature of 40 ° C and a relative humidity of 90% was measured using a water vapor transmission rate measuring device (manufactured by Mocon Co., Ltd., PERMATRAN-W3/33).

將測定結果顯示在第1表。 The measurement results are shown in the first table.

(色相評價) (Hue evaluation)

依據JIS Z 8729-1994且使用分光光度計(島津製作所公司製、UV-3600),測定氣體阻障性積層體1~23之依照CIE L*a*b* 表色系所規定的色彩值b*。 According to JIS Z 8729-1994 and using a spectrophotometer (manufactured by Shimadzu Corporation, UV-3600), the gas barrier laminates 1 to 23 are measured in accordance with CIE L*a*b* The color value b* specified by the color.

將測定結果顯示在第1表。 The measurement results are shown in the first table.

從第1表,得知以下的情形。實施例1~13的氣體阻障性積層體1~13係具有優異的氣體阻障性且能夠抑制呈現黃色。 From the first table, the following cases are known. The gas barrier laminates 1 to 13 of Examples 1 to 13 have excellent gas barrier properties and can suppress yellow color.

另一方面,比較例1~9的氣體阻障性積層體14~22之色彩值b*為小於-1或大於+1且呈現黃色或藍色。 On the other hand, the color value b* of the gas barrier laminates 14 to 22 of Comparative Examples 1 to 9 was less than -1 or greater than +1 and exhibited yellow or blue.

因為參考例1的氣體阻障性積層體23之氣體阻障層的折射率係較低而為1.54,即便未設置光學調整層亦能夠抑制呈現黃色。 Since the refractive index of the gas barrier layer of the gas barrier layered product 23 of Reference Example 1 is as low as 1.54, yellowing can be suppressed even if the optical adjustment layer is not provided.

另一方面,比較例8的氣體阻障性積層體21之氣體阻障層的折射率係相當高而為1.82,即便設置光學調整層,亦難以使b*成為1.00以下。 On the other hand, the gas barrier layer of the gas barrier layered product 21 of Comparative Example 8 has a relatively high refractive index of 1.82, and it is difficult to set b* to 1.00 or less even if an optical adjustment layer is provided.

又,因為比較例9的氣體阻障性積層體22之光學調整層的折射率太高,所以不能夠充分地執行作為光學調整層之功能。 In addition, since the refractive index of the optical adjustment layer of the gas barrier layered product 22 of Comparative Example 9 is too high, the function as an optical adjustment layer cannot be sufficiently performed.

1‧‧‧範圍1 1‧‧‧Scope 1

2‧‧‧範圍2 2‧‧‧Scope 2

3‧‧‧範圍3 3‧‧‧Scope 3

4‧‧‧範圍4 4‧‧‧Scope 4

5‧‧‧範圍5 5‧‧‧Scope 5

6‧‧‧範圍6 6‧‧‧Scope 6

Claims (10)

一種氣體阻障性積層體,係將基材、氣體阻障層及光學調整層依照此順序層積而成,且前述氣體阻障層與光學調整層為鄰接之氣體阻障性積層體,其特徵在於:前述氣體阻障層的折射率為1.55~1.81,前述光學調整層的折射率為1.20~1.60,而且在JIS Z 8729-1994所規定的CIE L*a*b*表色系之b*值為-1.00~1.00的範圍。 A gas barrier layered product in which a substrate, a gas barrier layer and an optical adjustment layer are laminated in this order, and the gas barrier layer and the optical adjustment layer are adjacent to each other, and the gas barrier layered body is adjacent to the gas barrier layer. The gas barrier layer has a refractive index of 1.55 to 1.81, and the optical adjustment layer has a refractive index of 1.20 to 1.60, and the CIE L*a*b* color system defined in JIS Z 8729-1994 *The value is in the range of -1.00 to 1.00. 如申請專利範圍第1項所述之氣體阻障性積層體,其中前述氣體阻障層係含有選自由無機氧化物、無機氮氧化物、無機碳氧化物、及無機氮氧碳化物所組成群組之至少一種。 The gas barrier layered product according to claim 1, wherein the gas barrier layer contains a group selected from the group consisting of inorganic oxides, inorganic nitrogen oxides, inorganic carbon oxides, and inorganic nitrogen oxides. At least one of the groups. 如申請專利範圍第1項所述之氣體阻障性積層體,其中前述氣體阻障層,係將含有聚矽氮烷化合物之層改質處理而得到之層。 The gas barrier layered product according to claim 1, wherein the gas barrier layer is a layer obtained by modifying a layer containing a polyazide compound. 如申請專利範圍第1項所述之氣體阻障性積層體,其中前述氣體阻障層的厚度,係從10nm至10μm。 The gas barrier laminate according to claim 1, wherein the gas barrier layer has a thickness of from 10 nm to 10 μm. 如申請專利範圍第1項所述之氣體阻障性積層體,其中前述光學調整層係由硬化性組成物的硬化物所構成者。 The gas barrier layered product according to claim 1, wherein the optical adjustment layer is composed of a cured product of a curable composition. 如申請專利範圍第5項所述之氣體阻障性積層體,其中前述硬化性組成物係含有硬化性成分及填充劑者。 The gas barrier layered product according to claim 5, wherein the curable composition contains a curable component and a filler. 如申請專利範圍第1項所述之氣體阻障性積層體,其中前述光學調整層的厚度為5~2500nm。 The gas barrier layered product according to claim 1, wherein the optical adjustment layer has a thickness of 5 to 2,500 nm. 如申請專利範圍第1項所述之氣體阻障性積層體,其中前述光學調整層的光學膜厚(T)係滿足下述式(1)或(2)者, [數3]121.43x-100≦T≦115.43x-37.33 (1) 760≦T≦2000 (2)(x係表示1~6的整數)。 The gas barrier layered product according to the first aspect of the invention, wherein the optical film thickness (T) of the optical adjustment layer satisfies the following formula (1) or (2), [Equation 3] 121.43x-100≦T≦115.43x-37.33 (1) 760≦T≦2000 (2) (x is an integer from 1 to 6). 一種電子裝置用構件,係由如申請專利範圍第1項所述之氣體阻障性積層體所構成。 A member for an electronic device comprising the gas barrier layered product according to claim 1 of the patent application. 一種電子裝置,係具備如申請專利範圍第9項所述之電子裝置用構件。 An electronic device comprising the member for an electronic device according to claim 9 of the patent application.
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